TWI781381B - X-ray imaging method and system thereof - Google Patents
X-ray imaging method and system thereof Download PDFInfo
- Publication number
- TWI781381B TWI781381B TW109107443A TW109107443A TWI781381B TW I781381 B TWI781381 B TW I781381B TW 109107443 A TW109107443 A TW 109107443A TW 109107443 A TW109107443 A TW 109107443A TW I781381 B TWI781381 B TW I781381B
- Authority
- TW
- Taiwan
- Prior art keywords
- sample
- ray
- thickness
- image
- symbol
- Prior art date
Links
Images
Landscapes
- Analysing Materials By The Use Of Radiation (AREA)
- Apparatus For Radiation Diagnosis (AREA)
Abstract
Description
本發明是關於一種X射線照影方法及系統,特別是利用X射線測量物體厚度、質量、以及吸收劑量的方法及系統。 The present invention relates to an X-ray radiography method and system, in particular to a method and system for measuring object thickness, mass, and absorbed dose by using X-rays.
一般而言,現行用於X光影像對於物體進行輻射劑量量測時,皆須使用特定的劑量量測儀器,如:游離腔、比例偵測器等高價設備,此等設備價格昂貴,若於二維影像或電腦斷層影像上配備此些劑量量測設備則會增加材料成本。 Generally speaking, when X-ray images are currently used to measure the radiation dose of objects, specific dose measurement instruments must be used, such as high-priced equipment such as free chambers and proportional detectors. Such equipment is expensive. Equipping these dose measuring devices on the 2D image or computer tomography image will increase the cost of materials.
此外,若採用熱發光劑量器(Thermo Luminescent Dosimeter,TLD)進行量測,則可能因為其原理限制無法獲得即時劑量。另外,亦有其他估算輻射劑量之方式,例如應用蒙地卡羅模擬,但使用蒙地卡羅進行模擬以計算劑量與物體體厚之方式,須使用高階電腦進行運算,其運算相當耗時。 In addition, if a thermoluminescent dosimeter (Thermo Luminescent Dosimeter, TLD) is used for measurement, it may not be possible to obtain an instant dose due to the limitation of its principle. In addition, there are other methods of estimating radiation dose, such as using Monte Carlo simulation, but the method of using Monte Carlo simulation to calculate the dose and the thickness of an object requires the use of a high-end computer for calculation, and the calculation is quite time-consuming.
為了解決上述的問題,本揭露內容之一態樣提供了一種X射線照影方法,包含複數個步驟:(a)執行一第一物體照影,藉由偵 測穿過一第一物體的一X射線,獲得一第一物體強度訊號;(b)執行一基準照影,藉由偵測該第一物體不在一照影範圍時該X射線,獲得一基準強度訊號;以及(c)由該第一物體強度訊號、該基準強度訊號及該第一物體的一第一衰減係數進行運算,獲得該第一物體的一第一厚度。 In order to solve the above problems, an aspect of the present disclosure provides an X-ray radiography method, which includes a plurality of steps: (a) performing a first object radiography, by detecting Measure an X-ray passing through a first object to obtain a first object intensity signal; (b) perform a reference radiography, and obtain a reference by detecting the X-ray when the first object is not in an imaging range an intensity signal; and (c) performing calculations on the first object intensity signal, the reference intensity signal and a first attenuation coefficient of the first object to obtain a first thickness of the first object.
本發明之又一態樣係於提供一種X射線照影方法,包含複數個步驟:(a)執行一第一物體照影,藉由偵測穿過一第一物體的一X射線,獲得一第一物體強度訊號;(b)執行一基準照影,藉由偵測該第一物體不在一照影範圍中時該X射線,獲得一基準強度訊號;以及(c)執行一第二物體照影,藉由偵測穿過一第二物體的該X射線,獲得一第二物體強度訊號;(d)由該第一物體強度訊號與該第二物體強度訊號進行運算,獲得一樣本強度訊號,其中該第一物體係一載台,該第二物體包含一樣本及該載台;以及(e)由該樣本強度訊號、該基準強度訊號及一樣本衰減係數進行運算,獲得一樣本厚度。 Another aspect of the present invention is to provide an X-ray radiography method, which includes a plurality of steps: (a) performing a first object radiography, by detecting an X-ray passing through a first object, and obtaining a First object intensity signal; (b) perform a reference radiography, by detecting the X-ray when the first object is not in a radiography range, obtain a reference intensity signal; and (c) perform a second object irradiance Obtain a second object intensity signal by detecting the X-ray passing through a second object; (d) perform calculations from the first object intensity signal and the second object intensity signal to obtain a sample intensity signal , wherein the first object is a stage, the second object includes a sample and the stage; and (e) performing calculations from the sample intensity signal, the reference intensity signal and a sample attenuation coefficient to obtain a sample thickness.
本發明之再一態樣係於提供一種X射線照影系統包含一X射線源、一偵測器以及一處理器。X射線源配置於產生一X射線。偵測器配置於偵測該X射線。處理器,耦接於該偵測器,該處理器配置於執行X射線照影方法。 Another aspect of the present invention is to provide an X-ray radiography system including an X-ray source, a detector and a processor. The X-ray source is configured to generate an X-ray. The detector is configured to detect the X-rays. A processor, coupled to the detector, is configured to execute an X-ray radiography method.
本發明所示之X射線照影系統及估算物體資訊的方法,透過偵測器上之訊號數值進行物體體厚運算以及輻射劑量計算,藉由此運算能夠直接從影像上得知物體厚度以及物體內所吸收之輻射劑量,此技術可以應用至即時提供當下X射線源給予的劑量率、累積劑量以及物體所吸收之平均劑量,於實際應用中操作者能 夠透過X光拍攝的當下得知物體體厚且無須另外加裝昂貴的輻射偵測器即可得知目前輻射劑量率以及物體所吸收之平均劑量。 The X-ray radiography system and the method for estimating object information shown in the present invention perform object thickness calculation and radiation dose calculation through the signal value on the detector, and through this calculation, the object thickness and object thickness can be directly obtained from the image. The radiation dose absorbed in the body, this technology can be applied to provide the dose rate given by the current X-ray source, the cumulative dose and the average dose absorbed by the object in real time. In practical applications, the operator can The current radiation dose rate and the average dose absorbed by the object can be known by knowing the thickness of the object through X-ray shooting without additional expensive radiation detectors.
100、200:X射線照影方法 100, 200: X-ray Radiography Methods
110~130、210~220、620~640、910~950:步驟 110~130, 210~220, 620~640, 910~950: steps
x:樣本厚度 x: sample thickness
k:像素 k: pixel
OBJ:樣本 OBJ: sample
DT:偵測器 DT: detector
SRX:射線源 SRX: ray source
PC:處理器 PC: Processor
IMG:二維投影影像 IMG: 2D projection image
TB:載台 TB: carrier
GRY:灰階區塊 GRY: gray scale block
600:應用X射線估計物體厚度的方法 600: Method for Estimating Thickness of Objects Using X-rays
900:計算樣本吸收劑量方法 900: Calculation of sample absorbed dose method
第1圖係依照本發明一實施例繪示X射線照影方法之流程圖。 FIG. 1 is a flowchart illustrating an X-ray radiography method according to an embodiment of the present invention.
第2圖係依照本發明一實施例X射線照影方法之流程圖。 Fig. 2 is a flowchart of an X-ray radiography method according to an embodiment of the present invention.
第3A~3C圖係依照本發明一實施例繪示X射線照影系統之示意圖。 3A-3C are schematic diagrams illustrating an X-ray radiography system according to an embodiment of the present invention.
第4圖係依照本發明一實施例繪示X射線能量-光子數之示意圖。 FIG. 4 is a schematic diagram showing X-ray energy-photon number according to an embodiment of the present invention.
第5圖係依照本發明一實施例繪示厚度特徵曲線之示意圖。 Fig. 5 is a schematic diagram showing a thickness characteristic curve according to an embodiment of the present invention.
第6圖係依照本發明一實施例繪示應用X射線運算物體厚度的方法之流程圖。 FIG. 6 is a flow chart illustrating a method for calculating the thickness of an object using X-rays according to an embodiment of the present invention.
第7圖係依照本發明一實施例繪示衰減係數之示意圖。 FIG. 7 is a schematic diagram showing the attenuation coefficient according to an embodiment of the present invention.
第8圖係依照本發明一實施例繪示樣本吸收係數之示意圖。 Fig. 8 is a schematic diagram showing the absorption coefficient of a sample according to an embodiment of the present invention.
第9圖係依照本發明一實施例繪示計算樣本吸收劑量方法之示意圖。 FIG. 9 is a schematic diagram illustrating a method for calculating absorbed dose of a sample according to an embodiment of the present invention.
以下說明係為完成發明的較佳實現方式,其目的在於描述本發明的基本精神,但並不用以限定本發明。實際的發明內容必須參考之後的權利要求範圍。 The following description is a preferred implementation of the invention, and its purpose is to describe the basic spirit of the invention, but not to limit the invention. For the actual content of the invention, reference must be made to the scope of the claims that follow.
必須了解的是,使用於本說明書中的”包含”、”包括”等詞,係用以表示存在特定的技術特徵、數值、方法步驟、作業處理、元件以及/或組件,但並不排除可加上更多的技術特徵、數值、方法步驟、作業處理、元件、組件,或以上的任意組合。 It must be understood that words such as "comprising" and "comprising" used in this specification are used to indicate the existence of specific technical features, values, method steps, operations, components and/or components, but do not exclude possible Add more technical characteristics, values, method steps, operation processes, components, components, or any combination of the above.
於權利要求中使用如”第一”、"第二"、"第三"等詞係用來修飾權利要求中的元件,並非用來表示之間具有優先權順序,先行關係,或者是一個元件先於另一個元件,或者是執行方法步驟時的時間先後順序,僅用來區別具有相同名字的元件。 Words such as "first", "second", and "third" used in the claims are used to modify the elements in the claims, and are not used to indicate that there is an order of priority, an antecedent relationship, or an element An element preceding another element, or a chronological order in performing method steps, is only used to distinguish elements with the same name.
請一併參照第1、2、3A~3C圖,第1圖係依照本發明一實施例繪示X射線照影方法100之流程圖。第2圖係依照本發明一實施例繪示X射線照影方法200之流程圖。第3A~3C圖係依照本發明一實施例繪示X射線照影系統之示意圖。
Please refer to FIGS. 1 , 2 , and 3A to 3C together. FIG. 1 is a flow chart of an
請先參閱第3A圖,於第3A圖中,X射線照影系統至少包含X射線源SR、偵測器DT及處理器PC。 Please refer to FIG. 3A first. In FIG. 3A , the X-ray radiography system at least includes an X-ray source SR, a detector DT and a processor PC.
於一實施例中,X射線源SR用以產生X射線。 In one embodiment, the X-ray source SR is used to generate X-rays.
於一實施例中,偵測器DT對應配置於X射線源SR發射出X射線方向,用以偵測穿過介質(如氣體、固體、液體)的X射線。 In one embodiment, the detector DT is correspondingly disposed in the direction of the X-rays emitted by the X-ray source SR, for detecting X-rays passing through a medium (such as gas, solid, liquid).
於一實施例中,處理器PC用以進行運算,處理器PC亦可為微控制單元(microcontroller)、微處理器(microprocessor)、數位訊號處理器(digital signal processor)、特殊應用積體電路(application specific integrated circuit,ASIC)或邏輯電路實現之,但並不限於此。 In one embodiment, the processor PC is used for computing, and the processor PC can also be a microcontroller, a microprocessor, a digital signal processor, or an application-specific integrated circuit ( application specific integrated circuit (ASIC) or logic circuit, but not limited thereto.
以下透過第1圖,敘述X射線照影方法100的流程。
The flow of the
於步驟110中,X射線源SR執行物體照影,偵測器DT藉由偵測穿過物體的X射線,以獲得物體強度訊號。
In
於一實施例中,X射線源SR執行物體照影時,偵測器DT接收到X射線,產生物體強度訊號,並將物體強度訊號傳送到處理器PC,物體強度訊號可為X光影像,X光影像可由二維投影影像IMG的方式呈現之。 In one embodiment, when the X-ray source SR performs object imaging, the detector DT receives the X-rays, generates an object intensity signal, and transmits the object intensity signal to the processor PC. The object intensity signal can be an X-ray image, The X-ray image can be presented in the form of a two-dimensional projection image IMG.
於一實施例中,處理器PC耦接於偵測器DT,用以接收由偵測器DT產生的物體強度訊號,此物體強度訊號與偵測到的X射線相關。 In one embodiment, the processor PC is coupled to the detector DT for receiving an object intensity signal generated by the detector DT, and the object intensity signal is related to the detected X-rays.
於步驟120中,X射線源SR執行基準照影,偵測器DT藉由偵測物體不在照影範圍時的X射線,獲得基準強度訊號。
In
於步驟130中,處理器PC基於物體強度訊號和基準強度訊號,估計物體的厚度。
In
於一實施例中,第1圖所述的物體可以為載台。於另一實施例中,第1圖所述的物體可以為載台及樣本的組合(換言之,載台上放置樣本的組合視為第1圖中所述的物體)。於一實施例中,步驟120所述的物體不在照影範圍內,代表照影範圍內沒有放置載台及樣本,X射線直接打到偵測器DT上的空拍情況,為基準照影。
In one embodiment, the object described in FIG. 1 may be a carrier. In another embodiment, the object described in FIG. 1 may be a combination of a stage and a sample (in other words, the combination of a sample placed on the stage is regarded as the object described in FIG. 1 ). In one embodiment, the object described in
以下詳細敘述空拍情況(下稱物體不在照影範圍)、物體為載台TB(下稱第一物體)、物體為載台TB及樣本OBJ的組合(下稱第二物體)此三種類型的照影情形。然,本發明對於第一物體及第二物體的定義並不限於此。 The following is a detailed description of the three types of aerial photography (hereinafter referred to as the object not in the photographing range), the object is the platform TB (hereinafter referred to as the first object), and the object is the combination of the platform TB and the sample OBJ (hereinafter referred to as the second object) photo situation. However, the definition of the first object and the second object in the present invention is not limited thereto.
於步驟210中,X射線源SR執行基準照影,偵測器DT藉由偵測第一物體不在一照影範圍時的X射線,獲得基準強度訊號。 In step 210, the X-ray source SR executes the reference radiography, and the detector DT obtains the reference intensity signal by detecting the X-rays when the first object is not in a radiography range.
於一實施例中,如第3A圖所示,照影範圍內不放任何物體,偵測器DT偵測物體不在照影範圍中時偵測X射線,如偵測器DT上沒有放置載台TB也沒有放置樣本,並由X射線照影系統進行基準照影(baseline imaging)程序,獲得基準強度訊號(baseline intensity signal)。基準強度訊號亦稱為空拍影像(blank image)。X射線光子數在X射線源能量範圍內分布狀況稱為X光能譜(如圖4),可透過已知查找表、量測或計算得到X光能譜。偵測器DT獲得的基準強度訊號本身是數值,為X光能譜下偵測器DT收到的X射線總和。 In one embodiment, as shown in FIG. 3A, no object is placed within the imaging range, and the detector DT detects X-rays when the object is not in the imaging range. For example, no stage is placed on the detector DT There is no sample placed in the TB, and the baseline imaging procedure is performed by the X-ray radiography system to obtain the baseline intensity signal. The reference intensity signal is also called a blank image. The distribution of the number of X-ray photons within the energy range of the X-ray source is called the X-ray energy spectrum (as shown in Figure 4). The X-ray energy spectrum can be obtained through a known look-up table, measurement or calculation. The reference intensity signal obtained by the detector DT itself is a numerical value, which is the sum of the X-rays received by the detector DT under the X-ray energy spectrum.
於步驟212中,將第一物體(如載台TB)進入照影範圍,如第3B圖所示,X射線源SR執行第一物體照影,偵測器DT藉由偵測穿過第一物體的X射線,以獲得第一物體強度訊號。
In
更具體而言,X射線源SR提供X射線,並針對第一物體進行照影。然後由偵測器DT偵測到第一物體強度訊號(object intensity signal),將此第一物體強度訊號傳給處理器PC。 More specifically, the X-ray source SR provides X-rays and performs imaging on the first object. Then the first object intensity signal is detected by the detector DT, and the first object intensity signal is sent to the processor PC.
於步驟214中,如第3C圖所示,將第二物體(如載台TB及樣本OBJ的組合)進入照影範圍,X射線源SR執行第二物體照影,偵測器DT藉由偵測穿過第二物體的X射線,獲得第二物體強度訊號。 In step 214, as shown in Figure 3C, the second object (such as the combination of the stage TB and the sample OBJ) is brought into the imaging range, the X-ray source SR executes the second object imaging, and the detector DT detects The X-ray passing through the second object is measured to obtain the intensity signal of the second object.
更具體而言,將樣本OBJ設置於載台TB上,X射線源SR提供X射線束,並針對載台TB及樣本OBJ進行照影。然後由偵 測器DT偵測並獲得第二物體強度訊號,將此第二物體強度訊號傳給處理器PC。其中,第一物體強度訊號與第二物體強度訊號為X射線光子訊號,如第3C圖之二維投影影像IMG的方式呈現之,二維投影影像IMG中的灰階區塊GRY代表穿過第二物體的X射線區塊。 More specifically, the sample OBJ is placed on the stage TB, and the X-ray source SR provides an X-ray beam to take images on the stage TB and the sample OBJ. Then by detective The detector DT detects and obtains the second object intensity signal, and transmits the second object intensity signal to the processor PC. Wherein, the first object intensity signal and the second object intensity signal are X-ray photon signals, as shown in the two-dimensional projection image IMG in Fig. 3C, the gray-scale block GRY in the two-dimensional projection image IMG represents X-ray blocks of two objects.
於一實施例中,例如偵測器DT的像素k接收到最低量的X射線,代表像素k對應到樣本OBJ之體厚最厚的位置。 In one embodiment, for example, the pixel k of the detector DT receives the lowest amount of X-rays, which means that the pixel k corresponds to the thickest position of the sample OBJ.
上述的步驟210~214無先後順序的限制。於一實施例中,偵測器DT接收到X射線的區域稱為照影範圍。 The above steps 210 to 214 are not limited in sequence. In one embodiment, the area where the detector DT receives the X-rays is called the irradiated area.
於步驟220中,處理器PC將第一物體強度訊號與第二物體強度訊號運算後得到樣本強度訊號,並依據樣本厚度特徵曲線,以取得對應樣本強度訊號的樣本厚度x。於一實施例中,處理器PC將第一物體強度訊號與第二物體強度訊號相減後得到樣本強度訊號。 In step 220, the processor PC calculates the first object intensity signal and the second object intensity signal to obtain the sample intensity signal, and obtains the sample thickness x corresponding to the sample intensity signal according to the sample thickness characteristic curve. In one embodiment, the processor PC subtracts the first object intensity signal from the second object intensity signal to obtain the sample intensity signal.
於一實施例中,處理器PC根據基準強度訊號、X光能譜、樣本的衰減係數得出樣本厚度特徵曲線。 In one embodiment, the processor PC obtains a sample thickness characteristic curve according to the reference intensity signal, the X-ray energy spectrum, and the attenuation coefficient of the sample.
於一實施例中,厚度特徵曲線包含樣本厚度特徵曲線、第一厚度特徵曲線、第二厚度特徵曲線皆可以由下述函式(1)比爾定律(Beer-Lambert Law)計算而得。 In one embodiment, the thickness characteristic curve including the sample thickness characteristic curve, the first thickness characteristic curve, and the second thickness characteristic curve can be calculated by the following function (1) Beer-Lambert Law.
於一實施例中,基於基準強度訊號、X光能譜及衰減係數運算而獲得厚度特徵曲線。其中,運算包含離散(discrete)後各自相乘所得結果,再將各結果加總的運算。 In one embodiment, the thickness characteristic curve is obtained based on the reference intensity signal, X-ray energy spectrum and attenuation coefficient calculation. Wherein, the operation includes a discrete (discrete) multiplication of the respective results obtained, and then summing up the results.
於一實施例中,某一造影參數(包含X射線源能量與X射線源管電流,或可加上不同種類之濾片…等)於不放置任何物體時先空拍一張二維投影影像,爾後放上任一已知材質之物體,已知 材質例如:水、實驗動物、壓克力…等,使用相同造影參數進行二維投影影像之物體(下述的物體可以是指第一物體或第二物體)拍攝,並由偵測器DT上獲得二維投影影像訊號,透過下列函式(1)計算,可由偵測器DT上的訊號強度值推算所放置物體厚度之關係式。 In one embodiment, a certain radiography parameter (including X-ray source energy and X-ray source tube current, or different types of filters can be added, etc.) is first air-shot a two-dimensional projection image without placing any objects, and then Put any object of known material, known Materials such as: water, experimental animals, acrylic, etc., objects that use the same imaging parameters for two-dimensional projection images (the following objects can refer to the first object or the second object) are photographed, and are captured by the detector DT The two-dimensional projected image signal is obtained, calculated by the following function (1), and the relational expression of the thickness of the placed object can be estimated from the signal strength value on the detector DT.
更具體而言,上述函式(1)可以展開為函式(2),第4圖係依照本發明一實施例繪示X射線能量-光子數之示意圖,處理器PC將X光能譜資訊導入比爾定律(Beer's Law)。如第4圖所示,第4圖的橫軸為X射線能量,縱軸為光子數,其中X光能譜資訊會根據濾片材質、厚度以及X光球管最大管電壓而有不同光子通量分布。如第4圖中實線代表X光球管最大管電壓數值為50keV不附加濾片的能譜資訊,虛線為最大管電壓數值為50keV加上0.5mm鋁濾片的能譜資訊,處理器PC根據選擇之參數包含X光球管能量、X光球管管電流或加裝濾片之搭配,可由模擬、計算或實際量測之X光能譜 推估像素之能譜分布。更具體而言,藉由以下函式(2),可得到如第5圖所示之物體厚度與物體強度訊號的曲線(厚度特徵曲線)。第5圖係依照本發明一實施例繪示厚度特徵曲線之示意圖。 More specifically, the above-mentioned function (1) can be expanded into function (2). Figure 4 is a schematic diagram showing X-ray energy-photon number according to an embodiment of the present invention. The processor PC converts the X-ray energy spectrum information into Import Beer's Law. As shown in Figure 4, the horizontal axis in Figure 4 is the X-ray energy, and the vertical axis is the number of photons, where the X-ray energy spectrum information will vary according to the filter material, thickness and the maximum tube voltage of the X-ray tube. volume distribution. As shown in Figure 4, the solid line represents the energy spectrum information of the X-ray tube with a maximum tube voltage value of 50keV without an additional filter, the dotted line represents the energy spectrum information of a maximum tube voltage value of 50keV plus a 0.5mm aluminum filter, and the processor PC According to the selected parameters including X-ray tube energy, X-ray tube current or the combination of adding filters, the X-ray energy spectrum can be simulated, calculated or actually measured Estimate the spectral distribution of pixels. More specifically, by using the following function (2), the curve (thickness characteristic curve) of the object thickness and the object intensity signal as shown in FIG. 5 can be obtained. Fig. 5 is a schematic diagram showing a thickness characteristic curve according to an embodiment of the present invention.
第5圖係依照本發明一實施例繪示厚度特徵曲線之示意圖,第5圖中的實線為由函式(2)估算厚度特徵曲線,第5圖的橫軸為物體強度訊號,縱軸為單位厚度(單位例如為公分)。因此,處理器PC從偵測到的物體強度訊號,可以透過厚度特徵曲線換算得到物體厚度。藉由函式(2)可以算出220步驟所述的物體厚度x。 Fig. 5 is a schematic diagram showing the thickness characteristic curve according to an embodiment of the present invention. The solid line in Fig. 5 is the thickness characteristic curve estimated by the function (2), the horizontal axis of Fig. 5 is the object intensity signal, and the vertical axis is the unit thickness (the unit is, for example, centimeter). Therefore, the processor PC can convert the detected object intensity signal through the thickness characteristic curve to obtain the object thickness. The thickness x of the object described in step 220 can be calculated by the function (2).
請參閱第6圖,第6圖係依照本發明一實施例繪示應用X射線運算物體厚度的方法600之流程圖,第6圖中的步驟610、612、614分別與第2圖中的步驟210、212、214相同,因此不再贅述之。
Please refer to FIG. 6. FIG. 6 is a flow chart illustrating a
於一實施例中,處理器PC執行基於第一物體強度訊號和基準強度訊號,估計第一物體的第一厚度。更具體而言,於步驟620中,處理器PC根據基準強度訊號的X光能譜及第一物體的第一衰減係數進行運算而獲得第一厚度特徵曲線,並且根據第一厚度特徵曲線及物體強度訊號估算第一物體的第一厚度。
In one embodiment, the processor PC executes estimating a first thickness of the first object based on the first object intensity signal and the reference intensity signal. More specifically, in
於一實施例中,處理器PC執行基於第二物體強度訊號和基準強度訊號,估計第二物體的第二厚度。更具體而言,於步驟630中,處理器PC根據基準強度訊號的X光能譜及第二物體的第二衰減係數進行運算而獲得第二厚度特徵曲線,並根據第二厚度特徵曲線及第二物體強度訊號運算獲得第二物體的第二厚度。
In one embodiment, the processor PC estimates the second thickness of the second object based on the second object intensity signal and the reference intensity signal. More specifically, in
於步驟640中,處理器PC將第二厚度減去第一厚度,以得到樣本厚度x。其中,第一物體包含載台TB,第二物體包含樣本OBJ及載台TB。 In step 640, the processor PC subtracts the first thickness from the second thickness to obtain the sample thickness x. Wherein, the first object includes the stage TB, and the second object includes the sample OBJ and the stage TB.
於一實施例中,在已知拍攝材料之物質(如樣本OBJ)時,即可得知其密度od,且由上述函式獲得樣本OBJ的體厚x,再加上偵測器DT上的像數所代表的樣本大小(pixel size),可以透過以下函式(3)計算此拍攝樣本之照影範圍質量。 In one embodiment, when the substance of the imaging material (such as the sample OBJ) is known, its density od can be known, and the thickness x of the sample OBJ can be obtained from the above function, plus the detector DT The sample size (pixel size) represented by the number of pixels can be used to calculate the image range quality of this shooting sample through the following function (3).
wk=(psL*psW)*x * od..............(3) w k =(psL*psW)*x * od..........(3)
基於上述步驟,處理器PC基於樣本厚度x、樣本的密度及樣本在照影範圍中所佔的面積,以估計照影範圍中的樣本的質量。 Based on the above steps, the processor PC estimates the quality of the sample in the irradiated range based on the thickness x of the sample, the density of the sample and the area occupied by the sample in the irradiated range.
舉例而言,當處理器PC收到基準強度訊號(空拍影像)之後,利用上述函式(1)導入X光能譜、樣本的衰減係數(linear attenuation coefficient)及基準強度訊號,得出樣本厚度特徵曲線。其中,衰減係數如第7圖所示,第7圖係依照本發明一實施例繪示衰減係數之示意圖,其橫軸為X射線能量(keV),縱軸為衰減係數(μ)。衰減係數的單位為cm-1。X射線照影系統透過上述步驟220的方法得到樣本厚度特徵曲線,並依據樣本厚度特徵曲線以取得對應樣本強度訊號的樣本厚度x,將樣本厚度x帶入函式(3)與樣本密度及影像上灰階區塊所代表的樣本像素面積進行運算,可算出此像素面積代表的樣本質量(樣本像素面積x樣本厚度x樣本密度=樣本質量),當有多個樣本像素面積時,將所有樣本質量相加,即為樣本質量。 For example, after the processor PC receives the reference intensity signal (air-shot image), use the above function (1) to import the X-ray energy spectrum, the linear attenuation coefficient of the sample and the reference intensity signal to obtain the sample Thickness characteristic curve. Wherein, the attenuation coefficient is shown in Fig. 7, which is a schematic diagram showing the attenuation coefficient according to an embodiment of the present invention, the horizontal axis is X-ray energy (keV), and the vertical axis is the attenuation coefficient (μ). The unit of the attenuation coefficient is cm -1 . The X-ray radiography system obtains the sample thickness characteristic curve through the method of the above step 220, and obtains the sample thickness x corresponding to the sample intensity signal according to the sample thickness characteristic curve, and brings the sample thickness x into the function (3) and the sample density and image The sample pixel area represented by the upper gray scale block can be calculated to calculate the sample quality represented by this pixel area (sample pixel area x sample thickness x sample density = sample quality). When there are multiple sample pixel areas, all samples The sum of the masses is the sample mass.
於一實施例中,X射線照影系統算出樣本質量後,可進一步計算物體吸收劑量。下述以計算樣本吸收劑量為例,然而當下述函式(5)、(6)所帶入的數值為載床TB及/或樣本OBJ的參數時,則會對應算出載床TB及/或樣本OBJ的吸收劑量。 In one embodiment, after the X-ray radiography system calculates the mass of the sample, it can further calculate the absorbed dose of the object. The following is an example of calculating the absorbed dose of the sample. However, when the values brought in by the following functions (5) and (6) are the parameters of the load bed TB and/or the sample OBJ, the load bed TB and/or The absorbed dose of the sample OBJ.
於一實施例中,可以由以下函式(5)~(6)計算出樣本吸收光子數: In one embodiment, the number of photons absorbed by the sample can be calculated by the following functions (5)-(6):
其中,為X光能譜之特定能量i之X光穿過樣本厚度x且被樣本吸收後的剩餘光子數,單位為光子數(count)。為一像素(pixel)的基準強度訊號,單位為光子數(count),此像素例如為第3C圖中的像素k,i為X光能譜之特定能量,最大值為E單位 (keV)。為X光為穿過樣本厚度x,於特定X光能量i該樣本的吸收光子數。為樣本之吸收係數(absorption coefficient),i為X光能譜之特定能量,其μ en 根據X光能量i有不同之數值。關於樣本之吸收係數,請參閱第8圖,第8圖係依照本發明一實施例繪示樣本吸收係數之示意圖。第8圖的橫軸為X射線能量(keV),縱軸為樣本之吸收係數(μ en )。據此,處理器PC可依據基準強度訊號、樣本之吸收係數及樣本厚度運算得到被樣本吸收後剩餘光子數,將基準強度訊號減去被樣本吸收後剩餘光子數,藉此得知樣本的吸收光子數。 in, It is the number of remaining photons after the X-ray with a specific energy i of the X-ray energy spectrum passes through the sample thickness x and is absorbed by the sample, and the unit is the number of photons (count). is the reference intensity signal of a pixel (pixel), and the unit is photon count (count). This pixel is, for example, pixel k in FIG. 3C, i is the specific energy of the X-ray energy spectrum, and the maximum value is E unit (keV). is the number of photons absorbed by the sample at a specific X-ray energy i when the X-ray passes through the sample thickness x. is the absorption coefficient of the sample, i is the specific energy of the X-ray energy spectrum, and μ en has different values according to the X-ray energy i . Regarding the absorption coefficient of the sample, please refer to FIG. 8, which is a schematic diagram showing the absorption coefficient of the sample according to an embodiment of the present invention. In Figure 8, the horizontal axis is the X-ray energy (keV), and the vertical axis is the absorption coefficient of the sample ( μ en ). Accordingly, the processor PC can calculate the number of photons remaining after being absorbed by the sample based on the reference intensity signal, the absorption coefficient of the sample and the thickness of the sample, and subtract the number of photons remaining after being absorbed by the sample from the reference intensity signal to obtain the absorption of the sample photon count.
於一實施例中,X射線照影系統計算樣本強度訊號的像素k(如第3C圖所示)上方X光穿過樣本厚度x,於此樣本厚度x路徑中將X光能譜之特定能量i的吸收光子數轉換成吸收能量可以由函式(7)計算,再經由函式(8)可算出物體的平均吸收劑量Object Dose(單位:Gy,J/kG): In one embodiment, the x-ray system computes the sample intensity signal above pixel k (as shown in FIG. 3C ) where the x-ray passes through the sample thickness x, and in this sample thickness x path, a specific energy of the x-ray energy spectrum is The number of absorbed photons of i can be converted into absorbed energy by function (7), and then the average absorbed dose Object Dose (unit: Gy, J/kG) can be calculated by function (8):
於一實施例中,請參閱第9圖,第9圖係依照本發明一實施例繪示計算樣本吸收劑量方法900之流程圖。
In an embodiment, please refer to FIG. 9 , which is a flowchart illustrating a
於步驟910中,處理器PC接收基準強度訊號。
In
於步驟920中,處理器PC根據樣本厚度x以及樣本吸收係數計算於X光能譜之特定能量i之X光穿過樣本厚度x且被樣本吸收後的剩餘光子數。於一實施例中,處理器PC應用函式(3)以計算出於X光能譜之特定能量i之X光穿過樣本厚度x且被樣本吸收後的剩餘光子數。 In step 920 , the processor PC calculates the number of remaining photons after the X-ray with a specific energy i in the X-ray energy spectrum passes through the sample thickness x and is absorbed by the sample according to the sample thickness x and the sample absorption coefficient. In one embodiment, the processor PC applies the function (3) to calculate the number of remaining photons after the X-ray with a specific energy i in the X-ray energy spectrum passes through the sample thickness x and is absorbed by the sample.
於步驟930中,處理器PC計算樣本厚度x於X光能譜之特定能量i該樣本的吸收光子數。於一實施例中,處理器PC應用函式(6)以計算出樣本厚度x於X光能譜之特定能量i該樣本的吸收光子數。
In
於步驟940中,處理器PC將X光能譜之特定能量i下的吸收光子數轉換成吸收能量。於一實施例中,處理器PC應用函式(7)以計算出吸收能量。
In
於步驟950中,處理器PC將偵測器DT上所有像素上方樣本厚度所吸收的能量相加後,除以樣本質量,以算出樣本的平均吸收劑量。於一實施例中,處理器PC應用函式(8)以計算出樣本的平均吸收劑量。 In step 950, the processor PC sums the energy absorbed by the thickness of the sample above all the pixels on the detector DT and divides it by the mass of the sample to calculate the average absorbed dose of the sample. In one embodiment, the processor PC applies the function (8) to calculate the average absorbed dose of the sample.
於一實施例中,X射線照影系統可藉由方法900計算出X射線源SR發出的X射線劑量率,如樣本模擬為輻射偵測器(圖未示),輻射偵測器的游離腔中例如充滿空氣,於函式(3)至(8)帶入已
知的游離腔厚度x及樣本吸收係數(空氣吸收係數),據此獲得輻射偵測器的平均吸收劑量,即為X射線源SR發出的X射線劑量率。
In one embodiment, the X-ray radiography system can calculate the X-ray dose rate emitted by the X-ray source SR through the
本發明所示之X射線照影方法及系統,透過偵測器上之訊號數值進行物體體厚運算以及輻射劑量計算,藉由此運算能夠直接從影像上得知物體厚度、質量以及物體內所吸收之輻射劑量,此技術可以應用至即時提供當下X射線源給予的劑量率、累積劑量以及物體所吸收之平均劑量,於實際應用中操作者能夠透過X光拍攝的當下得知物體體厚且無須另外加裝昂貴的輻射偵測器即可得知當下的X射線劑量率以及物體所吸收之平均劑量。 The X-ray radiography method and system shown in the present invention can calculate the thickness of the object and calculate the radiation dose through the signal value on the detector. Through this operation, the thickness, quality and the content of the object can be directly obtained from the image. The absorbed radiation dose, this technology can be applied to provide the dose rate given by the current X-ray source, the cumulative dose and the average dose absorbed by the object in real time. In practical applications, the operator can know the thickness and The current X-ray dose rate and the average dose absorbed by the object can be known without installing additional expensive radiation detectors.
本發明之方法,或特定型態或其部份,可以以程式碼的型態存在。程式碼可以包含於實體媒體,如軟碟、光碟片、硬碟、或是任何其他機器可讀取(如電腦可讀取)儲存媒體,亦或不限於外在形式之電腦程式產品,其中,當程式碼被機器,如電腦載入且執行時,此機器變成用以參與本發明之裝置。程式碼也可以透過一些傳送媒體,如電線或電纜、光纖、或是任何傳輸型態進行傳送,其中,當程式碼被機器,如電腦接收、載入且執行時,此機器變成用以參與本發明之裝置。當在一般用途處理單元實作時,程式碼結合處理單元提供一操作類似於應用特定邏輯電路之獨特裝置。 The methods of the present invention, or specific forms or parts thereof, may exist in the form of program codes. The code may be contained in a physical medium, such as a floppy disk, compact disc, hard disk, or any other machine-readable (such as computer-readable) storage medium, or a computer program product without limitation in external form, wherein, When the program code is loaded and executed by a machine, such as a computer, the machine becomes a device for participating in the present invention. Code may also be sent via some transmission medium, such as wire or cable, optical fiber, or any type of transmission in which when the code is received, loaded, and executed by a machine, such as a computer, that machine becomes the Invented device. When implemented on a general-purpose processing unit, the code combines with the processing unit to provide a unique device that operates similarly to application-specific logic circuits.
雖然本發明已以實施方式揭露如上,然其並非用以限定本發明,任何熟習此技藝者,在不脫離本發明之精神和範圍內,當可作各種之更動與潤飾,因此本發明之保護範圍當視後附之申請專利範圍所界定者為準。 Although the present invention has been disclosed above in terms of implementation, it is not intended to limit the present invention. Anyone skilled in this art can make various changes and modifications without departing from the spirit and scope of the present invention. Therefore, the protection of the present invention The scope shall be defined by the appended patent application scope.
100:X射線照影方法 100: X-ray Radiography Methods
110~130:步驟 110~130: Steps
Claims (8)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW109107443A TWI781381B (en) | 2020-03-06 | 2020-03-06 | X-ray imaging method and system thereof |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW109107443A TWI781381B (en) | 2020-03-06 | 2020-03-06 | X-ray imaging method and system thereof |
Publications (2)
Publication Number | Publication Date |
---|---|
TW202134642A TW202134642A (en) | 2021-09-16 |
TWI781381B true TWI781381B (en) | 2022-10-21 |
Family
ID=78777276
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW109107443A TWI781381B (en) | 2020-03-06 | 2020-03-06 | X-ray imaging method and system thereof |
Country Status (1)
Country | Link |
---|---|
TW (1) | TWI781381B (en) |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2010249691A (en) * | 2009-04-16 | 2010-11-04 | Nittetsu Elex Co Ltd | Creation method of calibration curve |
TW201435301A (en) * | 2013-03-14 | 2014-09-16 | Tokyo Electron Ltd | X-ray nondestructive testing device |
CN104136885A (en) * | 2012-09-10 | 2014-11-05 | 株式会社东芝 | X ray thickness meter |
CN109997029A (en) * | 2016-11-29 | 2019-07-09 | 莱特拉姆有限责任公司 | The multi-energy X-ray detected to the foreign matter on conveyer absorbs imaging |
-
2020
- 2020-03-06 TW TW109107443A patent/TWI781381B/en active
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2010249691A (en) * | 2009-04-16 | 2010-11-04 | Nittetsu Elex Co Ltd | Creation method of calibration curve |
CN104136885A (en) * | 2012-09-10 | 2014-11-05 | 株式会社东芝 | X ray thickness meter |
TW201435301A (en) * | 2013-03-14 | 2014-09-16 | Tokyo Electron Ltd | X-ray nondestructive testing device |
CN109997029A (en) * | 2016-11-29 | 2019-07-09 | 莱特拉姆有限责任公司 | The multi-energy X-ray detected to the foreign matter on conveyer absorbs imaging |
Also Published As
Publication number | Publication date |
---|---|
TW202134642A (en) | 2021-09-16 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
Gravel et al. | A method for modeling noise in medical images | |
JP6133231B2 (en) | X-ray energy spectrum measuring method, X-ray energy spectrum measuring apparatus and X-ray CT apparatus | |
Monnin et al. | Image quality assessment in digital mammography: part II. NPWE as a validated alternative for contrast detail analysis | |
Mackenzie et al. | Image simulation and a model of noise power spectra across a range of mammographic beam qualities | |
US20090052762A1 (en) | Multi-energy radiographic system for estimating effective atomic number using multiple ratios | |
US8054940B2 (en) | Image capturing system for medical use, image processing apparatus, and image processing method | |
Panta et al. | First human imaging with MARS photon-counting CT | |
US20100027743A1 (en) | Apparatus and method for determiining a detector energy weighting function of a detection unit | |
JP6567094B2 (en) | Radiation image processing method and radiation imaging system | |
Ghetti et al. | Physical characteristics of GE Senographe Essential and DS digital mammography detectors | |
Ducote et al. | Scatter correction in digital mammography based on image deconvolution | |
JP2022084954A (en) | Image processing device, image processing method, and program | |
JP7190344B2 (en) | Image processing device, image processing method and program | |
JP6751143B2 (en) | Device for determining the effective energy spectrum of an X-ray tube | |
Nillius et al. | Light output measurements and computational models of microcolumnar CsI scintillators for x‐ray imaging | |
JP4994225B2 (en) | Two-parameter spectrum processing method and apparatus | |
JP6676337B2 (en) | Radiation imaging system, radiation image information processing apparatus, radiation image information processing method, and program therefor | |
TWI781381B (en) | X-ray imaging method and system thereof | |
JP7271496B2 (en) | X-ray imaging method and system | |
Liaparinos et al. | The Monte Carlo evaluation of noise and resolution properties of granular phosphor screens | |
Gillis et al. | A partial-volume correction for quantitative spectral X-ray radiography | |
JP2021122674A (en) | Image processing device, method and program | |
Reims et al. | Modelling of scintillator based flat-panel detectors with Monte-Carlo simulations | |
Mångård et al. | Modelling of an X-ray image-intensifier-based radiography system | |
US20200174142A1 (en) | Linear fitting of multi-threshold counting data |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
GD4A | Issue of patent certificate for granted invention patent |