TWI780230B - Process for preparing s-containing pyrimidinium compounds - Google Patents
Process for preparing s-containing pyrimidinium compounds Download PDFInfo
- Publication number
- TWI780230B TWI780230B TW107134482A TW107134482A TWI780230B TW I780230 B TWI780230 B TW I780230B TW 107134482 A TW107134482 A TW 107134482A TW 107134482 A TW107134482 A TW 107134482A TW I780230 B TWI780230 B TW I780230B
- Authority
- TW
- Taiwan
- Prior art keywords
- formula
- compound
- alkyl
- halogen
- substituted
- Prior art date
Links
Landscapes
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Nitrogen Condensed Heterocyclic Rings (AREA)
Abstract
Description
本發明係關於一種根據以下反應順序製備式X之含S嘧啶鎓化合物的方法: The present invention relates to a method for preparing the S-containing pyrimidinium compound of formula X according to the following reaction sequence:
自WO2014/167084中獲知,式X之嘧啶鎓化合物具有殺昆蟲特性。然而,製備式X之光學活性含S嘧啶鎓化合物的方法未描述於先前技術中。本發明製備式X之光學增濃含S嘧啶鎓化合物係基於式VI之環亞胺的不對稱轉移氫化。另外,自文獻中已知對映異構體可呈現不同範圍的殺有害生物或殺昆蟲活性。亦有可能雖然一種特定的對映異構體顯示出殺昆蟲活性,但其對應物可能對昆蟲完全無活性。因此,任何核准施用之嚴格要求為僅以其相應的活性對映異構體形式使用具有殺有害生物或殺昆蟲活性的對掌性化合物。因此,需要一種經由較短途徑製備具有大於90%對映異構體過量及高產率之式X之光學活性化合物的方法。It is known from WO 2014/167084 that pyrimidinium compounds of formula X have insecticidal properties. However, methods of preparing optically active S-containing pyrimidinium compounds of formula X have not been described in the prior art. The preparation of optically enriched S-containing pyrimidinium compounds of formula X in the present invention is based on the asymmetric transfer hydrogenation of cyclic imines of formula VI. In addition, it is known from the literature that enantiomers may exhibit different ranges of pesticidal or insecticidal activity. It is also possible that although a particular enantiomer shows insecticidal activity, its counterpart may be completely inactive against insects. Therefore, it is a stringent requirement for any approved application to use an antichiral compound having pesticidal or insecticidal activity only in the form of its corresponding active enantiomer. Therefore, there is a need for a method for the preparation of optically active compounds of formula X with greater than 90% enantiomeric excess and high yields via a shorter route.
本發明係關於一種用於製備式X之含S嘧啶鎓化合物的方法。此目的係藉由下文詳細描述之方法來達成。The present invention relates to a process for the preparation of S-containing pyrimidinium compounds of formula X. This object is achieved by the method described in detail below.
本發明之第一態樣係關於一種用於製備式X之含S嘧啶鎓化合物的方法, 其中 C*為S或R-組態之不對稱碳原子; R1 為C1 -C4 烷基、C3 -C6 環烷基、C2 -C4 烯基或-CH2 -苯基,該等基團未經取代或經鹵素或C1 -C4 烷基取代; R2 為5員或6員飽和、部分不飽和或芳族碳環或雜環,其中該環未經取代或經R2a 取代; Het係選自D-1、D-2及D-3: 其中 Ra 各自獨立地為鹵素、C1 -C4 鹵烷基、C1 -C4 烷氧基、C1 -C4 烷硫基或苯基; n為0、1或2,及 #表示式X中之鍵; R2a 為鹵素、C1 -C6 鹵烷基、C1 -C6 鹵烷氧基、ORc 、C(=O)ORc 、C(=O)NRb Rc 、苯基或吡啶基,其未經取代或經鹵素、C1 -C6 鹵烷基或C1 -C6 鹵烷氧基取代; Rb 為氫、C1 -C6 烷基、C1 -C6 鹵烷基、C1 -C6 烷氧基或C1 -C6 鹵烷氧基; Rc 為氫、C1 -C4 烷基、C1 -C4 鹵烷基或C1 -C6 環烷基; 其中兩個偕鍵結之基團Rc Rb 與其所鍵結之原子一起可形成3員至7員飽和、部分不飽和或芳族雜環; 其包含至少以下步驟: (A) 使式III化合物, 其中 W為鹵素、O-對甲苯磺醯基、O-甲烷磺醯基或O-三氟甲烷磺醯基; Het係如上述式X化合物中所定義; 與M2 ORAC 反應,其中M2 係選自鋰、鈉、鉀、鋁、鋇、銫、鈣及鎂;RAC 為C(=O)C1 -C4 烷基; 以獲得式IV化合物, 其中Het及RAC 係如本文所定義; (B) 在酸或鹼存在下水解如本文所定義之式IV化合物,以獲得式V化合物, 其中Het係如式IV化合物中所定義; (C) 使式V化合物與X2 SO2 NH2 反應,其中X2 為鹵素, 以獲得式VI化合物 其中Het係如式V化合物中所定義, (D) 式VI化合物 在氫化催化劑MXLn(ƞ-芳烴)m , 其中 M為來自元素週期表第VIII族至第XII族之過渡金屬; X為陰離子; m為0或1; Ln為Ln1或Ln2, 其中 Ln1為式Ln1之對掌性配體 其中 C*為S或R-組態之不對稱碳原子; R10 為OH或NH-SO2 -R11 ;其中 R11 為未經取代或經鹵素、C1 -C10 烷基、C1 -C4 烷氧基、C3 -C6 環烷基、SO3 H或SO3 Na取代之芳基; 或 C1 -C10 全氟烷基,或R13 R14 N,其中R13 及R14 獨立地表示未經取代或經C6 -C10 芳基取代之C1 -C10 烷基,或R13 及R14 各自獨立地表示C6 -C10 環烷基; R12 獨立地表示芳基或C6 -C10 環烷基環,其中該環未經取代或彼此獨立地經鹵素、C1 -C10 烷基、C1 -C4 烷氧基、C3 -C6 環烷基、SO3 H或SO3 Na取代,或兩個R12 連接在一起以形成3員至6員碳環或5員至10員部分不飽和碳環; Ln2為對掌性磷配體; 及選自以下之氫源存在下氫化:a)氫氣;b) N(R)3 與HCOOH之混合物,其中R為H或C1 -C6 烷基;c) HCOONa或HCOOK;d) C1 -C8 醇及t-BuOK、t-BuONa或t-BuOLi之混合物;及e) a)至d)中之兩者或更多者之組合; 以獲得式VII化合物 其中 C*為S或R-組態之不對稱碳原子; Het係如式VI化合物中所定義, (E) 使式VII化合物, 其中 C*為S或R-組態之不對稱碳原子; Het係如本文所定義; 與R1 NCS在鹼存在下反應,其中R1 為C1 -C4 烷基、C3 -C6 環烷基、C2 -C4 烯基或-CH2 -苯基,該等基團未經取代或經鹵素或C1 -C4 烷基取代; 以獲得式VIII化合物, 其中 C*及Het係如式VII化合物中所定義; R1 係如本文所定義, (F) 使如本文所定義之式VIII化合物與式IX化合物反應 其中, LG為選自鹵素、ORu 及SRu 之離去基;其中 Ru 為C1 -C6 烷基或芳基,其未經取代或經鹵素取代; R2 係如式X化合物中所定義; 以獲得如本文所定義之式X化合物。The first aspect of the present invention relates to a method for preparing an S-containing pyrimidinium compound of formula X, wherein C* is an asymmetric carbon atom in S or R-configuration; R 1 is C 1 -C 4 alkyl, C 3 -C 6 cycloalkyl, C 2 -C 4 alkenyl or -CH 2 -phenyl, These groups are unsubstituted or substituted by halogen or C 1 -C 4 alkyl; R 2 is a 5- or 6-membered saturated, partially unsaturated or aromatic carbocyclic or heterocyclic ring, wherein the ring is unsubstituted or substituted R 2a is substituted; Het is selected from D-1, D-2 and D-3: wherein R a is independently halogen, C 1 -C 4 haloalkyl, C 1 -C 4 alkoxy, C 1 -C 4 alkylthio or phenyl; n is 0, 1 or 2, and # represents A bond in formula X; R 2a is halogen, C 1 -C 6 haloalkyl, C 1 -C 6 haloalkoxy, OR c , C(=O)OR c , C(=O)NR b R c , phenyl or pyridyl, which are unsubstituted or substituted by halogen, C 1 -C 6 haloalkyl or C 1 -C 6 haloalkoxy; R b is hydrogen, C 1 -C 6 alkyl, C 1 -C 6 haloalkyl, C 1 -C 6 alkoxy or C 1 -C 6 haloalkoxy; R c is hydrogen, C 1 -C 4 alkyl, C 1 -C 4 haloalkyl or C 1 -C 6 cycloalkyl group; wherein two ge-bonded groups R c R b together with their bonded atoms can form 3 to 7 saturated, partially unsaturated or aromatic heterocyclic rings; it comprises at least the following steps : (A) make formula III compound, Wherein W is halogen, O-p-toluenesulfonyl, O-methanesulfonyl or O-trifluoromethanesulfonyl; Het is as defined in the above-mentioned compound of formula X; reacts with M 2 OR AC , wherein M 2 Be selected from lithium, sodium, potassium, aluminum, barium, cesium, calcium and magnesium; R AC is C (=O) C 1 -C 4 alkyl; To obtain the compound of formula IV, wherein Het and R AC are as defined herein; (B) hydrolyzing a compound of formula IV as defined herein in the presence of an acid or base to obtain a compound of formula V, wherein Het is as defined in the compound of formula IV; (C) reacting the compound of formula V with X 2 SO 2 NH 2 , wherein X 2 is halogen, to obtain the compound of formula VI Wherein Het is as defined in the compound of formula V, (D) the compound of formula VI is in the hydrogenation catalyst MXLn(ƞ-arene) m , wherein M is a transition metal from Group VIII to Group XII of the Periodic Table of Elements; X is an anion; m is 0 or 1; Ln is Ln1 or Ln2, wherein Ln1 is the chiral ligand of formula Ln1 Where C* is an asymmetric carbon atom in S or R-configuration; R 10 is OH or NH-SO 2 -R 11 ; where R 11 is unsubstituted or halogenated, C 1 -C 10 alkyl, C 1 -C 4 alkoxy, C 3 -C 6 cycloalkyl, SO 3 H or SO 3 Na substituted aryl; or C 1 -C 10 perfluoroalkyl, or R 13 R 14 N, wherein R 13 and R 14 independently represents C 1 -C 10 alkyl unsubstituted or substituted by C 6 -C 10 aryl, or R 13 and R 14 each independently represent C 6 -C 10 cycloalkyl; R 12 independently Represents an aryl group or a C 6 -C 10 cycloalkyl ring, wherein the ring is unsubstituted or independently replaced by halogen, C 1 -C 10 alkyl, C 1 -C 4 alkoxy, C 3 -C 6 ring Alkyl, SO 3 H or SO 3 Na substitution, or two R 12 are connected together to form a 3-6-membered carbocycle or a 5-10-membered partially unsaturated carbocycle; Ln2 is an chiral phosphorus ligand; and hydrogenation in the presence of a hydrogen source selected from the following: a) hydrogen; b) a mixture of N(R) 3 and HCOOH, wherein R is H or C 1 -C 6 alkyl; c) HCOONa or HCOOK; d) C 1 -C Alcohol and the mixture of t-BuOK, t-BuONa or t- BuOLi ; And e) a) to d) in the combination of two or more; To obtain the compound of formula VII Wherein C* is an asymmetric carbon atom of S or R-configuration; Het is as defined in the compound of formula VI, (E) makes the compound of formula VII, Wherein C* is an asymmetric carbon atom of S or R-configuration; Het is as defined herein; Reaction with R 1 NCS in the presence of a base, wherein R 1 is C 1 -C 4 alkyl, C 3 -C 6 Cycloalkyl, C 2 -C 4 alkenyl or -CH 2 -phenyl, these groups are unsubstituted or substituted by halogen or C 1 -C 4 alkyl; to obtain the compound of formula VIII, wherein C* and Het are as defined in the compound of formula VII; R is as defined herein, (F) reacting a compound of formula VIII as defined herein with a compound of formula IX Among them, LG is a leaving group selected from halogen, OR u and SR u ; wherein R u is C 1 -C 6 alkyl or aryl, which is unsubstituted or substituted by halogen; R 2 is as in the compound of formula X defined; to obtain a compound of formula X as defined herein.
製備式X化合物之方法視情況進一步包含藉由至少以下步驟製備式III化合物之方法: (G) 使式I化合物 其中W係如本文所定義,且X1 為鹵素; 與NH(RQ )(Rp ).HCl在鹼存在下反應,其中RQ 及Rp 獨立地為C1 -C6 烷基或C1 -C6 烷氧基,或RQ 及Rp 連接在一起以形成5員至7員碳環或雜環; 以獲得式II化合物, 其中RQ 、Rp 及W係如本文所定義; (H) 使如本文所定義之Het與如本文所定義之式II化合物在RL MgX1 或RL Li;其中RL 為C1 -C6 烷基;X1 為鹵素; 及金屬鹵化物存在下反應,其中金屬為鋰、鈉、鉀或鎂; 以獲得式III化合物, 其中Het及W係如本文所定義。The method for preparing a compound of formula X optionally further comprises a method for preparing a compound of formula III by at least the following steps: (G) making a compound of formula I wherein W is as defined herein, and X 1 is halogen; reacted with NH(R Q )(R p ).HCl in the presence of a base, wherein R Q and R p are independently C 1 -C 6 alkyl or C 1 -C 6 alkoxyl group, or R Q and R p link together to form 5 to 7 member carbocycle or heterocycle; Obtain formula II compound, wherein R Q , R p and W are as defined herein; (H) make Het as defined herein and a compound of formula II as defined herein in R L MgX 1 or R L Li; wherein R L is C 1 - C 6 alkyl; X 1 is a halogen; and react in the presence of a metal halide, wherein the metal is lithium, sodium, potassium or magnesium; to obtain a compound of formula III, wherein Het and W are as defined herein.
式III化合物亦可與如本文所述之方法或WO 2014/167084中已知的方法或文獻中已知的其他方法類似地製備。Compounds of formula III can also be prepared analogously to methods as described herein or methods known in WO 2014/167084 or other methods known in the literature.
方法中所用之起始物質為市售的或可藉由文獻中已知的方法製備。The starting materials used in the methods are either commercially available or can be prepared by methods known in the literature.
本發明之另一態樣係關於一種製備如本文所定義之式X化合物的方法,其包含如本文所述之步驟(A)、(B)、(C)、(D)、(E)、(F)、(G)及(H)中之一或多者,較佳為如本文所述之順序(H)→(G)→(A)→(B)→(C)→(D)→(E)→(F)。Another aspect of the present invention relates to a process for the preparation of a compound of formula X as defined herein, comprising steps (A), (B), (C), (D), (E), as described herein One or more of (F), (G) and (H), preferably in the order (H)→(G)→(A)→(B)→(C)→(D) as described herein →(E)→(F).
式VI化合物可用作製備式VII之光學增濃環胺衍生物的通用中間物。因此,需要開發一種用於製備式VI化合物之方法。此目的藉由提供式VI化合物及用於製備式VI化合物之方法來達成。Compounds of formula VI are useful as versatile intermediates for the preparation of optically enriched cyclic amine derivatives of formula VII. Therefore, there is a need to develop a process for the preparation of compounds of formula VI. This object is achieved by providing compounds of formula VI and processes for the preparation of compounds of formula VI.
本發明之另一態樣係關於製備如本文所定義之式VI化合物的方法, 其包含 使如本文所定義之式V化合物, 與X1 SO2 NH2 反應,其中X1 為鹵素,如本文步驟(C)中所述。Another aspect of the invention relates to a process for the preparation of a compound of formula VI as defined herein, It comprises a compound of formula V as defined herein, Reaction with X1SO2NH2 , where X1 is halogen, as described herein in step (C ) .
本發明之其他態樣係關於式VI化合物或其鹽及N-氧化物。 Other aspects of the invention relate to compounds of formula VI or salts and N-oxides thereof.
其中Het係如本文所定義。wherein Het is as defined herein.
式VII化合物,尤其式VII之光學增濃化合物,可用作製備醫藥及農用化學中間物或活性成分的通用中間物。此外,式VII化合物可用於製備殺有害生物劑或含N雜環部分,例如式VIII化合物或式X化合物,其自WO 2014/167084已知尤其可用於對抗無脊椎有害生物。然而,製備如本文所定義之式VII之光學增濃化合物的方法為未知的。Compounds of formula VII, especially optically enriching compounds of formula VII, are useful as universal intermediates for the preparation of pharmaceutical and agrochemical intermediates or active ingredients. Furthermore, compounds of formula VII are useful for the preparation of pesticides or N-containing heterocyclic moieties, such as compounds of formula VIII or compounds of formula X, which are known from WO 2014/167084 to be especially useful against invertebrate pests. However, methods of preparing optically enriching compounds of formula VII as defined herein are unknown.
因此,需要開發一種用於製備式VII之光學活性化合物的方法,更具體言之,一種用於製備對映異構體過量較佳>70%、更佳>85%、最佳>95%之式VII之光學活性化合物的方法。此目的係藉由提供式VII之光學活性化合物及用於製備對映異構體過量較佳>95%之式VII之光學活性化合物的方法來達成。Therefore, there is a need to develop a method for the preparation of optically active compounds of formula VII, more specifically, a method for the preparation of enantiomeric excess preferably > 70%, more preferably > 85%, most preferably > 95%. Methods for Optically Active Compounds of Formula VII. This object is achieved by providing an optically active compound of formula VII and a process for the preparation of an optically active compound of formula VII in an enantiomeric excess preferably >95%.
本發明之其他態樣係關於製備如本文所定義之式VII化合物的方法, 其係藉由氫化如本文所定義之式VI化合物, 如本文步驟(D)中所述。Other aspects of the invention relate to processes for the preparation of compounds of formula VII as defined herein, by hydrogenating a compound of formula VI as defined herein, As described herein in step (D).
本發明之其他態樣係關於式VII之光學活性化合物或其鹽及N-氧化物。 Other aspects of the invention relate to optically active compounds of formula VII or salts and N-oxides thereof.
其中C*及Het係如本文所定義。wherein C* and Het are as defined herein.
另外,式VIII之光學活性胺化合物可用作製備具有胺衍生物或含N雜環部分之殺有害生物劑的通用中間化合物,該等殺有害生物劑為例如式X化合物,自WO 2014/167084已知尤其可用於對抗無脊椎有害生物。然而,製備式VIII之光學活性化合物的方法為未知的。In addition, optically active amine compounds of formula VIII can be used as versatile intermediate compounds for the preparation of pesticides having amine derivatives or N-containing heterocyclic moieties, such as compounds of formula X, which have been disclosed since WO 2014/167084 It is known to be especially useful against invertebrate pests. However, methods of preparing optically active compounds of formula VIII are unknown.
因此,需要開發一種用於製備式VIII之光學活性化合物的方法,更具體言之,一種用於製備對映異構體過量較佳>80%、更佳>95%之式VIII之光學活性化合物的方法。Therefore, there is a need to develop a method for preparing an optically active compound of formula VIII, more specifically, a method for preparing an optically active compound of formula VIII having an enantiomeric excess of preferably >80%, more preferably >95%. Methods.
此目的係藉由提供式VIII之光學活性化合物及用於製備對映異構體過量較佳>95%之式VIII之光學活性化合物的方法來達成。This object is achieved by providing an optically active compound of formula VIII and a process for the preparation of an optically active compound of formula VIII in preferably >95% enantiomeric excess.
本發明之其他態樣係關於製備如本文所定義之式VIII化合物的方法, 其包含 使如本文所定義之式VII化合物與R1 NCS在鹼存在下反應,其中R1 係如本文所定義, 如本文步驟(E)中所述。Other aspects of the invention relate to processes for the preparation of compounds of formula VIII as defined herein, It comprises reacting a compound of formula VII as defined herein with R 1 NCS in the presence of a base, wherein R 1 is as defined herein, As described herein in step (E).
本發明之其他態樣係關於式VIII之光學活性化合物或其鹽及N-氧化物。 Other aspects of the invention relate to optically active compounds of formula VIII or salts and N-oxides thereof.
其中C*、Het及R1 係如本文所定義。wherein C * , Het and R1 are as defined herein.
本發明之其他態樣係關於製備如本文所定義之式X化合物的方法,其係如本文步驟(F)中所述,使如本文所定義之式VIII化合物與如本文所定義之式IX化合物反應。Another aspect of the present invention relates to a process for the preparation of a compound of formula X as defined herein by combining a compound of formula VIII as defined herein with a compound of formula IX as defined herein, as described herein in step (F) reaction.
式X化合物之分子結構可以不同等電子式存在,各等電子式在不同原子上具有形式正電荷及負電荷,如下所示。本發明擴展至製備式X化合物之所有代表性等電子結構的方法。 The molecular structure of the compound of formula X can exist in different isoelectronic forms, each isoelectronic form having formal positive and negative charges on different atoms, as shown below. The invention extends to methods of preparing all representative isoelectronic structures of compounds of formula X.
「本發明」、「發明」或「本發明方法」係指步驟(A)、(B)、(C)、(D)、(E)、(F)、(G)及(H)中之一或多者,較佳指步驟(A)、(B)、(C)、(D)、(E)及(F)中之一或多者。「本發明化合物」或「根據本發明之化合物」,亦即如本文所定義之式VI、VII或VIII化合物,包含化合物本身以及其鹽、互變異構體或N-氧化物,若此等衍生物之形成為可能的。"Invention", "invention" or "method of the present invention" refers to steps (A), (B), (C), (D), (E), (F), (G) and (H) One or more, preferably refers to one or more of steps (A), (B), (C), (D), (E) and (F). "Compounds of the present invention" or "compounds according to the present invention", ie compounds of formula VI, VII or VIII as defined herein, include the compounds themselves as well as their salts, tautomers or N-oxides, if such derivatives The formation of things becomes possible.
術語「立體異構體」涵蓋光學異構體,諸如對映異構體或非對映異構體,後者由於分子中多於一個對掌性中心而存在,以及幾何異構體(順/反異構體)。本發明或本發明化合物係關於本發明化合物之每種可能的立體異構體,亦即單一對映異構體或非對映異構體,以及其混合物。The term "stereoisomer" encompasses optical isomers, such as enantiomers or diastereomers, which exist as a result of more than one chiral center in the molecule, as well as geometric isomers (cis/trans isomer). The invention or compounds of the invention relate to each possible stereoisomer, ie individual enantiomers or diastereomers, of the compounds of the invention, as well as mixtures thereof.
根據本發明之化合物可為非晶形的或可以一或多種不同的結晶狀態(多晶型)存在,其可具有不同的宏觀特性,諸如穩定性或顯示出不同的生物特性,諸如活性。本發明係關於根據本發明之非晶形及結晶化合物、根據本發明之各個化合物之不同結晶狀態的混合物以及其非晶形鹽或結晶鹽。The compounds according to the invention may be amorphous or may exist in one or more different crystalline states (polymorphs), which may have different macroscopic properties, such as stability, or exhibit different biological properties, such as activity. The present invention relates to amorphous and crystalline compounds according to the invention, mixtures of different crystalline states of the individual compounds according to the invention and amorphous or crystalline salts thereof.
根據本發明之化合物的鹽可以習用方式形成,例如若根據本發明之化合物具有鹼性官能基,則藉由使化合物與所討論之陰離子的酸反應,或藉由使根據本發明之酸性化合物與適合之鹼反應。根據本發明之化合物的鹽較佳為農業上及/或獸醫學上可接受之鹽,較佳農業上可接受之鹽。Salts of the compounds according to the invention can be formed in customary manner, for example by reacting the compound with the acid of the anion in question if the compound according to the invention has a basic functional group, or by reacting an acidic compound according to the invention with an acidic compound according to the invention Suitable for alkali reaction. The salts of the compounds according to the invention are preferably agriculturally and/or veterinarily acceptable salts, preferably agriculturally acceptable salts.
術語「N-氧化物」包括具有至少一個氧化成N-氧化物部分之三級氮原子的任何本發明化合物。The term "N-oxide" includes any compound of the invention having at least one tertiary nitrogen atom oxidized to an N-oxide moiety.
如本文所用,術語「氫化催化劑」涵蓋均相氫化催化劑。此項技術中已知,銠、釕、銥、鉑、鈀、鐵或鎳形成高活性催化劑。下文進一步提供根據本發明之較佳氫化催化劑。As used herein, the term "hydrogenation catalyst" encompasses homogeneous hydrogenation catalysts. It is known in the art that rhodium, ruthenium, iridium, platinum, palladium, iron or nickel form highly active catalysts. Preferred hydrogenation catalysts according to the present invention are provided further below.
有用的酸加成鹽的陰離子主要為鹵離子,諸如氯離子、溴離子及氟離子;硫酸氫根、硫酸根、磷酸二氫根、磷酸氫根、磷酸根、硝酸根、碳酸氫根、碳酸根、六氟矽酸根、六氟磷酸根、苯甲酸根及C1 -C4 烷酸之陰離子,較佳甲酸根、乙酸根、丙酸根及丁酸根。其可藉由使M或MLn與相應陰離子之酸,較佳鹽酸、氫溴酸、硫酸、磷酸或硝酸反應來形成。The anions of useful acid addition salts are primarily halides such as chloride, bromide and fluoride; hydrogen sulfate, sulfate, dihydrogen phosphate, hydrogen phosphate, phosphate, nitrate, bicarbonate, carbonic acid Anion of C 1 -C 4 alkanoic acid, hexafluorosilicate, hexafluorophosphate, benzoate, preferably formate, acetate, propionate and butyrate. It can be formed by reacting M or MLn with an acid of the corresponding anion, preferably hydrochloric, hydrobromic, sulfuric, phosphoric or nitric acid.
上文變數定義中提及之有機部分基團(如術語鹵素)為個別基團成員之個別清單的集合術語。在各情況下,字首Cn -Cm 指示基團中之可能碳原子數。The organic moiety groups mentioned above in the variable definitions (eg the term halogen) are collective terms for individual listings of individual group members. In each case, the prefix Cn - Cm indicates the possible number of carbon atoms in the group.
「鹵素」將意謂氟、氯、溴及碘。"Halogen" shall mean fluorine, chlorine, bromine and iodine.
術語「部分或完全鹵化」意謂給定基團之1或多個,例如1、2、3、4或5個或所有氫原子已經鹵素原子置換,尤其經氟或氯置換。The term "partially or fully halogenated" means that 1 or more, eg 1, 2, 3, 4 or 5 or all of the hydrogen atoms of a given group have been replaced by halogen atoms, especially by fluorine or chlorine.
如本文所用(以及在Cn -Cm 烷基胺基、二-Cn -Cm 烷基胺基、Cn -Cm 烷胺基羰基、二-(Cn -Cm 烷基胺基)羰基、Cn -Cm 烷硫基、Cn -Cm 烷基亞磺醯基及Cn -Cm 烷基磺醯基中)之術語「Cn -Cm 烷基」係指具有n至m個,例如1至10個碳原子,較佳1至6個碳原子的分支鏈或未分支鏈飽和烴基,例如甲基、乙基、丙基、1-甲基乙基、丁基、1-甲基丙基、2-甲基丙基、1,1-二甲基乙基、戊基、1-甲基丁基、2-甲基丁基、3-甲基丁基、2,2-二甲基丙基、1-乙基丙基、己基、1,1-二甲基丙基、1,2-二甲基丙基、1-甲基戊基、2-甲基戊基、3-甲基戊基、4-甲基戊基、1,1-二甲基丁基、1,2-二甲基丁基、1,3-二甲基丁基、2,2-二甲基丁基、2,3-二甲基丁基、3,3-二甲基丁基、1-乙基丁基、2-乙基丁基、1,1,2-三甲基丙基、1,2,2-三甲基丙基、1-乙基-1-甲基丙基、1-乙基-2-甲基丙基、庚基、辛基、2-乙基己基、壬基及癸基及其異構體。C1 -C4 烷基意謂例如甲基、乙基、丙基、1-甲基乙基、丁基、1-甲基丙基、2-甲基丙基或1,1-二甲基乙基。As used herein (and in the context of Cn - Cmalkylamino , di- Cn - Cmalkylamino , Cn - Cmalkylaminocarbonyl , di-( Cn - Cmalkylamino ) carbonyl, C n -C m alkylthio, C n -C m alkylsulfinyl and C n -C m alkylsulfonyl) the term "C n -C m alkyl" means n to m, such as 1 to 10 carbon atoms, preferably 1 to 6 carbon atoms, branched or unbranched saturated hydrocarbon groups, such as methyl, ethyl, propyl, 1-methylethyl, butyl , 1-methylpropyl, 2-methylpropyl, 1,1-dimethylethyl, pentyl, 1-methylbutyl, 2-methylbutyl, 3-methylbutyl, 2 ,2-Dimethylpropyl, 1-ethylpropyl, hexyl, 1,1-dimethylpropyl, 1,2-dimethylpropyl, 1-methylpentyl, 2-methylpentyl Base, 3-methylpentyl, 4-methylpentyl, 1,1-dimethylbutyl, 1,2-dimethylbutyl, 1,3-dimethylbutyl, 2,2- Dimethylbutyl, 2,3-dimethylbutyl, 3,3-dimethylbutyl, 1-ethylbutyl, 2-ethylbutyl, 1,1,2-trimethylpropyl Base, 1,2,2-trimethylpropyl, 1-ethyl-1-methylpropyl, 1-ethyl-2-methylpropyl, heptyl, octyl, 2-ethylhexyl, Nonyl and decyl and their isomers. C 1 -C 4 Alkyl means for example methyl, ethyl, propyl, 1-methylethyl, butyl, 1-methylpropyl, 2-methylpropyl or 1,1-dimethyl ethyl.
如本文所用(以及在Cn -Cm 鹵烷基亞磺醯基及Cn -Cm 鹵烷磺醯基中)之術語「Cn -Cm 鹵烷基」係指具有n至m個碳原子,例如1至10個,尤其1至6個碳原子之直鏈或分支鏈烷基(如上文所提及),其中此等基團中之一些或全部氫原子可經如上文所提及之鹵素原子置換,例如C1 -C4 鹵烷基,諸如氯甲基、溴甲基、二氯甲基、三氯甲基、氟甲基、二氟甲基、三氟甲基、氯氟甲基、二氯氟甲基、氯二氟甲基、1-氯乙基、1-溴乙基、1-氟乙基、2-氟乙基、2,2-二氟乙基、2,2,2-三氟乙基、2-氯-2-氟乙基、2-氯-2,2-二氟乙基、2,2-二氯-2-氟乙基、2,2,2-三氯乙基、五氟乙基及其類似基團。術語C1 -C10 鹵烷基特別包含C1 -C2 氟烷基,其與1、2、3、4或5個氫原子經氟原子取代之甲基或乙基同義,諸如氟甲基、二氟甲基、三氟甲基、1-氟乙基、2-氟乙基、2,2-二氟乙基、2,2,2-三氟乙基及五氟甲基。The term "C n -C m haloalkyl" as used herein (and in C n -C m haloalkylsulfinyl and C n -C m haloalkylsulfinyl) refers to a group having n to m Carbon atoms, such as 1 to 10, especially 1 to 6 straight chain or branched chain alkyl groups (as mentioned above) of carbon atoms, wherein some or all of the hydrogen atoms in these groups can be modified as mentioned above And halogen atom replacement, such as C 1 -C 4 haloalkyl, such as chloromethyl, bromomethyl, dichloromethyl, trichloromethyl, fluoromethyl, difluoromethyl, trifluoromethyl, chlorine Fluoromethyl, dichlorofluoromethyl, chlorodifluoromethyl, 1-chloroethyl, 1-bromoethyl, 1-fluoroethyl, 2-fluoroethyl, 2,2-difluoroethyl, 2 ,2,2-trifluoroethyl, 2-chloro-2-fluoroethyl, 2-chloro-2,2-difluoroethyl, 2,2-dichloro-2-fluoroethyl, 2,2, 2-trichloroethyl, pentafluoroethyl and the like. The term C 1 -C 10 haloalkyl especially includes C 1 -C 2 fluoroalkyl, which is synonymous with methyl or ethyl in which 1, 2, 3, 4 or 5 hydrogen atoms are replaced by fluorine atoms, such as fluoromethyl , difluoromethyl, trifluoromethyl, 1-fluoroethyl, 2-fluoroethyl, 2,2-difluoroethyl, 2,2,2-trifluoroethyl and pentafluoromethyl.
類似地,「Cn -Cm 烷氧基」及「Cn -Cm 烷硫基」(或Cn -Cm 烷基次磺醯基,分別)係指在烷基中之任何鍵處經由氧(或硫鍵聯,分別)鍵結的具有n至m個碳原子,例如1至10個,尤其1至6個或1至4個碳原子的直鏈或分支鏈烷基(如上文所提及)。實例包括C1 -C4 烷氧基,諸如甲氧基、乙氧基、丙氧基、異丙氧基、丁氧基、第二丁氧基、異丁氧基及第三丁氧基,另外C1 -C4 烷硫基,諸如甲硫基、乙硫基、丙硫基、異丙硫基及正丁硫基。Similarly, "C n -C m alkoxy" and "C n -C m alkylthio" (or C n -C m alkylsulfenyl, respectively) refer to any bond in the alkyl group Straight-chain or branched-chain alkyl groups (as above) having n to m carbon atoms, for example 1 to 10, especially 1 to 6 or 1 to 4 carbon atoms, bonded via oxygen (or sulfur linkage, respectively) mentioned). Examples include C 1 -C 4 alkoxy, such as methoxy, ethoxy, propoxy, isopropoxy, butoxy, sec-butoxy, isobutoxy and tert-butoxy, Also C 1 -C 4 alkylthio, such as methylthio, ethylthio, propylthio, isopropylthio and n-butylthio.
因此,術語「Cn -Cm 鹵烷氧基」及「Cn -Cm 鹵烷基硫基」(或Cn -Cm 鹵烷基次磺醯基分別)係指在烷基中之任何鍵處分別經由氧或硫鍵聯鍵結的具有n至m個碳原子,例如1至10個,尤其1至6個或1至4個碳原子的直鏈或分支鏈烷基(如上文所提及),其中此等基團中之一些或全部氫原子可經如上文所提及之鹵素原子置換,例如C1 -C2 鹵烷氧基,諸如氯甲氧基、溴甲氧基、二氯甲氧基、三氯甲氧基、氟甲氧基、二氟甲氧基、三氟甲氧基、氯氟甲氧基、二氯氟甲氧基、氯二氟甲氧基、1-氯乙氧基、1-溴乙氧基、1-氟乙氧基、2-氟乙氧基、2,2-二氟乙氧基、2,2,2-三氟乙氧基、2-氯-2-氟乙氧基、2-氯-2,2-二氟乙氧基、2,2-二氯-2-氟乙氧基、2,2,2-三氯乙氧基及五氟乙氧基,另外C1 -C2 鹵烷基硫基,諸如氯甲硫基、溴甲硫基、二氯甲硫基、三氯甲硫基、氟甲硫基、二氟甲硫基、三氟甲基硫基、氯氟甲硫基、二氯氟甲硫基、氯二氟甲硫基、1-氯乙硫基、1-溴乙硫基、1-氟乙硫基、2-氟乙硫基、2,2-二氟乙硫基、2,2,2-三氟乙硫基、2-氯-2-氟乙硫基、2-氯-2,2-二氟乙硫基、2,2-二氯-2-氟乙硫基、2,2,2-三氯乙硫基及五氟乙硫基及其類似基團。類似地,術語C1 -C2 氟烷氧基及C1 -C2 氟烷硫基分別係指經由氧原子或硫原子與分子之其餘部分鍵結的C1 -C2 氟烷基。Thus, the terms "C n -C m haloalkoxy" and "C n -C m haloalkylthio" (or C n -C m haloalkylsulfenyl, respectively) refer to the Straight-chain or branched chain alkyl groups (as above) having n to m carbon atoms, for example 1 to 10, especially 1 to 6 or 1 to 4 carbon atoms, bonded at any bond via oxygen or sulfur linkages respectively mentioned), wherein some or all of the hydrogen atoms in these groups may be replaced by halogen atoms as mentioned above, for example C 1 -C 2 haloalkoxy, such as chloromethoxy, bromomethoxy , dichloromethoxy, trichloromethoxy, fluoromethoxy, difluoromethoxy, trifluoromethoxy, chlorofluoromethoxy, dichlorofluoromethoxy, chlorodifluoromethoxy, 1-chloroethoxy, 1-bromoethoxy, 1-fluoroethoxy, 2-fluoroethoxy, 2,2-difluoroethoxy, 2,2,2-trifluoroethoxy, 2-Chloro-2-fluoroethoxy, 2-chloro-2,2-difluoroethoxy, 2,2-dichloro-2-fluoroethoxy, 2,2,2-trichloroethoxy And pentafluoroethoxy, in addition C 1 -C 2 haloalkylthio, such as chloromethylthio, bromomethylthio, dichloromethylthio, trichloromethylthio, fluoromethylthio, difluoromethyl Thio, trifluoromethylthio, chlorofluoromethylthio, dichlorofluoromethylthio, chlorodifluoromethylthio, 1-chloroethylthio, 1-bromoethylthio, 1-fluoroethylthio , 2-fluoroethylthio, 2,2-difluoroethylthio, 2,2,2-trifluoroethylthio, 2-chloro-2-fluoroethylthio, 2-chloro-2,2-two Fluoroethylthio, 2,2-dichloro-2-fluoroethylthio, 2,2,2-trichloroethylthio, pentafluoroethylthio and the like. Similarly, the terms C 1 -C 2 fluoroalkoxy and C 1 -C 2 fluoroalkylthio refer to a C 1 -C 2 fluoroalkyl bonded to the rest of the molecule via an oxygen or sulfur atom, respectively.
如本文所用之術語「C2 -Cm 烯基」意指具有2至m個,例如2至10個或2至6個碳原子及在任何位置之雙鍵的分支鏈或未分支鏈不飽和烴基,諸如乙烯基、1-丙烯基、2-丙烯基、1-甲基-乙烯基、1-丁烯基、2-丁烯基、3-丁烯基、1-甲基-1-丙烯基、2-甲基-1-丙烯基、1-甲基-2-丙烯基、2-甲基-2-丙烯基、1-戊烯基、2-戊烯基、3-戊烯基、4-戊烯基、1-甲基-1-丁烯基、2-甲基-1-丁烯基、3-甲基-1-丁烯基、1-甲基-2-丁烯基、2-甲基-2-丁烯基、3-甲基-2-丁烯基、1-甲基-3-丁烯基、2-甲基-3-丁烯基、3-甲基-3-丁烯基、1,1-二甲基-2-丙烯基、1,2-二甲基-1-丙烯基、1,2-二甲基-2-丙烯基、1-乙基-1-丙烯基、1-乙基-2-丙烯基、1-己烯基、2-己烯基、3-己烯基、4-己烯基、5-己烯基、1-甲基-1-戊烯基、2-甲基-1-戊烯基、3-甲基-1-戊烯基、4-甲基-1-戊烯基、1-甲基-2-戊烯基、2-甲基-2-戊烯基、3-甲基-2-戊烯基、4-甲基-2-戊烯基、1-甲基-3-戊烯基、2-甲基-3-戊烯基、3-甲基-3-戊烯基、4-甲基-3-戊烯基、1-甲基-4-戊烯基、2-甲基-4-戊烯基、3-甲基-4-戊烯基、4-甲基-4-戊烯基、1,1-二甲基-2-丁烯基、1,1-二甲基-3-丁烯基、1,2-二甲基-1-丁烯基、1,2-二甲基-2-丁烯基、1,2-二甲基-3-丁烯基、1,3-二甲基-1-丁烯基、1,3-二甲基-2-丁烯基、1,3-二甲基-3-丁烯基、2,2-二甲基-3-丁烯基、2,3-二甲基-1-丁烯基、2,3-二甲基-2-丁烯基、2,3-二甲基-3-丁烯基、3,3-二甲基-1-丁烯基、3,3-二甲基-2-丁烯基、1-乙基-1-丁烯基、1-乙基-2-丁烯基、1-乙基-3-丁烯基、2-乙基-1-丁烯基、2-乙基-2-丁烯基、2-乙基-3-丁烯基、1,1,2-三甲基-2-丙烯基、1-乙基-1-甲基-2-丙烯基、1-乙基-2-甲基-1-丙烯基及1-乙基-2-甲基-2-丙烯基。The term "C 2 -C m alkenyl" as used herein means branched or unbranched chain unsaturation having 2 to m, for example 2 to 10 or 2 to 6 carbon atoms and a double bond in any position Hydrocarbyl, such as vinyl, 1-propenyl, 2-propenyl, 1-methyl-vinyl, 1-butenyl, 2-butenyl, 3-butenyl, 1-methyl-1-propene Base, 2-methyl-1-propenyl, 1-methyl-2-propenyl, 2-methyl-2-propenyl, 1-pentenyl, 2-pentenyl, 3-pentenyl, 4-pentenyl, 1-methyl-1-butenyl, 2-methyl-1-butenyl, 3-methyl-1-butenyl, 1-methyl-2-butenyl, 2-methyl-2-butenyl, 3-methyl-2-butenyl, 1-methyl-3-butenyl, 2-methyl-3-butenyl, 3-methyl-3 -butenyl, 1,1-dimethyl-2-propenyl, 1,2-dimethyl-1-propenyl, 1,2-dimethyl-2-propenyl, 1-ethyl-1 -propenyl, 1-ethyl-2-propenyl, 1-hexenyl, 2-hexenyl, 3-hexenyl, 4-hexenyl, 5-hexenyl, 1-methyl-1 -pentenyl, 2-methyl-1-pentenyl, 3-methyl-1-pentenyl, 4-methyl-1-pentenyl, 1-methyl-2-pentenyl, 2 -Methyl-2-pentenyl, 3-methyl-2-pentenyl, 4-methyl-2-pentenyl, 1-methyl-3-pentenyl, 2-methyl-3- Pentenyl, 3-methyl-3-pentenyl, 4-methyl-3-pentenyl, 1-methyl-4-pentenyl, 2-methyl-4-pentenyl, 3- Methyl-4-pentenyl, 4-methyl-4-pentenyl, 1,1-dimethyl-2-butenyl, 1,1-dimethyl-3-butenyl, 1, 2-Dimethyl-1-butenyl, 1,2-dimethyl-2-butenyl, 1,2-dimethyl-3-butenyl, 1,3-dimethyl-1- Butenyl, 1,3-dimethyl-2-butenyl, 1,3-dimethyl-3-butenyl, 2,2-dimethyl-3-butenyl, 2,3- Dimethyl-1-butenyl, 2,3-dimethyl-2-butenyl, 2,3-dimethyl-3-butenyl, 3,3-dimethyl-1-butene base, 3,3-dimethyl-2-butenyl, 1-ethyl-1-butenyl, 1-ethyl-2-butenyl, 1-ethyl-3-butenyl, 2 -Ethyl-1-butenyl, 2-ethyl-2-butenyl, 2-ethyl-3-butenyl, 1,1,2-trimethyl-2-propenyl, 1-ethyl Base-1-methyl-2-propenyl, 1-ethyl-2-methyl-1-propenyl and 1-ethyl-2-methyl-2-propenyl.
如本文所用之術語「C2 -Cm 炔基」係指具有2至m個,例如2至10個或2至6個碳原子且含有至少一個參鍵的分支鏈或未分支鏈不飽和烴基,諸如乙炔基、丙炔基、1-丁炔基、2-丁炔基及其類似基團。The term "C 2 -C alkynyl" as used herein refers to a branched or unbranched unsaturated hydrocarbon group having 2 to m , such as 2 to 10 or 2 to 6 carbon atoms, and containing at least one double bond , such as ethynyl, propynyl, 1-butynyl, 2-butynyl and the like.
基團之字尾「-羰基」或「C(=O)」在各情況下表示該基團經由羰基C=O基團與分子之其餘部分鍵結。此係例如在烷基羰基、鹵烷基羰基、胺基羰基、烷基胺基羰基、二烷基胺基羰基、烷氧基羰基、鹵烷氧基羰基中之情況。The suffix "-carbonyl" or "C(=O)" of a group in each case indicates that the group is bonded to the rest of the molecule via a carbonyl C=O group. This is the case, for example, in alkylcarbonyl, haloalkylcarbonyl, aminocarbonyl, alkylaminocarbonyl, dialkylaminocarbonyl, alkoxycarbonyl, haloalkoxycarbonyl.
如本文所用之術語「芳基」係指單環、雙環或三環芳族烴基,諸如苯基或萘基,尤其苯基(作為取代基亦指C6 H5 )。The term "aryl" as used herein refers to a monocyclic, bicyclic or tricyclic aromatic hydrocarbon group, such as phenyl or naphthyl, especially phenyl (as a substituent also refers to C 6 H 5 ).
術語「環系統」表示兩個或更多個直接連接的環。The term "ring system" means two or more directly connected rings.
如本文所用之術語「C3 -Cm 環烷基」係指3員至m員單環飽和環脂族基團,例如環丙基、環丁基、環戊基、環己基、環庚基、環辛基及環癸基。As used herein, the term "C 3 -C m cycloalkyl" refers to a 3-membered to m-membered monocyclic saturated cycloaliphatic group, such as cyclopropyl, cyclobutyl, cyclopentyl, cyclohexyl, cycloheptyl , cyclooctyl and cyclodecyl.
如本文所用之術語「5員至10員部分不飽和碳環」係指含有5至10個碳原子之部分不飽和單環或雙環,例如茚滿。The term "5- to 10-membered partially unsaturated carbocycle" as used herein refers to a partially unsaturated monocyclic or bicyclic ring containing 5 to 10 carbon atoms, such as indane.
如本文所用之術語「3員至7員碳環」係指環丙烷、環丁烷、環戊烷、環己烷及環庚烷環。The term "3- to 7-membered carbocycle" as used herein refers to cyclopropane, cyclobutane, cyclopentane, cyclohexane and cycloheptane rings.
術語「雜環」係指「3員、4員、5員、6員或7員飽和、部分不飽和環或芳族雜環,其可含有1、2、3或4個雜原子」或「含雜原子基團」,其中彼等雜原子(基團)係選自N (N取代之基團)、O及S (S取代之基團),如本文所用之雜環基團係指單環基團,該等單環基團為飽和的、部分不飽和的或芳族的(完全不飽和的)。雜環基團可經由碳環成員或經由氮環成員與分子之其餘部分連接。The term "heterocycle" refers to a "3-, 4-, 5-, 6- or 7-membered saturated, partially unsaturated or aromatic heterocycle which may contain 1, 2, 3 or 4 heteroatoms" or " "Heteroatom-containing group", wherein these heteroatoms (groups) are selected from N (N-substituted group), O and S (S-substituted group), as used herein, the heterocyclic group refers to a single Cyclic groups, such monocyclic groups are saturated, partially unsaturated or aromatic (fully unsaturated). A heterocyclic group can be attached to the rest of the molecule via a carbocyclic member or via a nitrogen ring member.
3員、4員、5員、6員或7員飽和雜環基或雜環之實例包括:環氧乙烷基、氮丙啶基、氮雜環丁烷基、2-四氫呋喃基、3-四氫呋喃基、2-四氫噻吩基、3-四氫噻吩基、2-吡咯啶基、3-吡咯啶基、3-吡唑啶基、4-吡唑啶基、5-吡唑啶基、2-咪唑啶基、4-咪唑啶基、2-噁唑啶基、4-噁唑啶基、5-噁唑啶基、3-異噁唑啶基、4-異噁唑啶基、5-異噁唑啶基、2-噻唑啶基、4-噻唑啶基、5-噻唑啶基、3-異噻唑啶基、4-異噻唑啶基、5-異噻唑啶基、1,2,4-噁二唑啶-3-基、1,2,4-噁二唑啶-5-基、1,2,4-噻二唑啶-3-基、1,2,4-噻二唑啶-5-基、1,2,4-三唑啶-3-基、1,3,4-噁二唑啶-2-基、1,3,4-噻二唑啶-2-基、1,3,4-三唑啶-2-基、2-四氫哌喃基、4-四氫哌喃基、1,3-二噁烷-5-基、1,4-二噁烷-2-基、2-哌啶基、3-哌啶基、4-哌啶基、3-六氫嗒嗪基、4-六氫嗒嗪基、2-六氫嘧啶基、4-六氫嘧啶基、5-六氫嘧啶基、2-哌嗪基、1,3,5-六氫三嗪-2-基及1,2,4-六氫三嗪-3-基、2-嗎啉基、3-嗎啉基、2-硫代嗎啉基、3-硫代嗎啉基、1-側氧基硫代嗎啉-2-基、1-側氧基硫代嗎啉-3-基、1,1-二側氧基硫代嗎啉-2-基、1,1-二側氧基硫代嗎啉-3-基、六氫氮呯-1-、-2-、-3-或-4-基、六氫氧呯基、六氫-1,3-二氮呯基、六氫-1,4-二氮呯基、六氫-1,3-噁氮呯基、六氫-1,4-噁氮呯基、六氫-1,3-二氧呯基、六氫-1,4-二氧呯基及其類似基團。Examples of 3-membered, 4-membered, 5-membered, 6-membered or 7-membered saturated heterocyclyl or heterocycle include: oxiranyl, aziridinyl, azetidinyl, 2-tetrahydrofuranyl, 3- Tetrahydrofuryl, 2-tetrahydrothienyl, 3-tetrahydrothienyl, 2-pyrrolidinyl, 3-pyrrolidinyl, 3-pyrazolidinyl, 4-pyrazolidinyl, 5-pyrazolidinyl, 2-imidazolidinyl, 4-imidazolidinyl, 2-oxazolidine, 4-oxazolidine, 5-oxazolidine, 3-isoxazolidine, 4-isoxazolidine, 5 -Isoxazolidinyl, 2-thiazolidinyl, 4-thiazolidinyl, 5-thiazolidinyl, 3-isothiazolidinyl, 4-isothiazolidinyl, 5-isothiazolidinyl, 1,2, 4-oxadiazolidin-3-yl, 1,2,4-oxadiazolidin-5-yl, 1,2,4-thiadiazolidin-3-yl, 1,2,4-thiadiazole Pyridin-5-yl, 1,2,4-triazolidine-3-yl, 1,3,4-oxadiazolidin-2-yl, 1,3,4-thiadiazolidin-2-yl, 1,3,4-Triazolidin-2-yl, 2-tetrahydropyranyl, 4-tetrahydropyranyl, 1,3-dioxan-5-yl, 1,4-dioxan- 2-yl, 2-piperidinyl, 3-piperidinyl, 4-piperidinyl, 3-hexahydropyridazinyl, 4-hexahydropyridazinyl, 2-hexahydropyrimidinyl, 4-hexahydropyrimidine Base, 5-hexahydropyrimidinyl, 2-piperazinyl, 1,3,5-hexahydrotriazin-2-yl and 1,2,4-hexahydrotriazin-3-yl, 2-morpholinyl , 3-morpholinyl, 2-thiomorpholinyl, 3-thiomorpholinyl, 1-oxothiomorpholin-2-yl, 1-oxothiomorpholin-3-yl , 1,1-dioxothiomorpholin-2-yl, 1,1-dioxothiomorpholin-3-yl, hexahydronitrogen-1-, -2-, -3- Or-4-yl, hexahydroxyl, hexahydro-1,3-diazyl, hexahydro-1,4-diazyl, hexahydro-1,3-oxazyl, hexahydro -1,4-oxazanyl, hexahydro-1,3-dioxanyl, hexahydro-1,4-dioxanyl and the like.
3員、4員、5員、6員或7員部分不飽和雜環基或雜環之實例包括:2,3-二氫呋喃-2-基、2,3-二氫呋喃-3-基、2,4-二氫呋喃-2-基、2,4-二氫呋喃-3-基、2,3-二氫噻吩-2-基、2,3-二氫噻吩-3-基、2,4-二氫噻吩-2-基、2,4-二氫噻吩-3-基、2-吡咯啉-2-基、2-吡咯啉-3-基、3-吡咯啉-2-基、3-吡咯啉-3-基、2-異噁唑啉-3-基、3-異噁唑啉-3-基、4-異噁唑啉-3-基、2-異噁唑啉-4-基、3-異噁唑啉-4-基、4-異噁唑啉-4-基、2-異噁唑啉-5-基、3-異噁唑啉-5-基、4-異噁唑啉-5-基、2-異噻唑啉-3-基、3-異噻唑啉-3-基、4-異噻唑啉-3-基、2-異噻唑啉-4-基、3-異噻唑啉-4-基、4-異噻唑啉-4-基、2-異噻唑啉-5-基、3-異噻唑啉-5-基、4-異噻唑啉-5-基、2,3-二氫吡唑-1-基、2,3-二氫吡唑-2-基、2,3-二氫吡唑-3-基、2,3-二氫吡唑-4-基、2,3-二氫吡唑-5-基、3,4-二氫吡唑-1-基、3,4-二氫吡唑-3-基、3,4-二氫吡唑-4-基、3,4-二氫吡唑-5-基、4,5-二氫吡唑-1-基、4,5-二氫吡唑-3-基、4,5-二氫吡唑-4-基、4,5-二氫吡唑-5-基、2,3-二氫噁唑-2-基、2,3-二氫噁唑-3-基、2,3-二氫噁唑-4-基、2,3-二氫噁唑-5-基、3,4-二氫噁唑-2-基、3,4-二氫噁唑-3-基、3,4-二氫噁唑-4-基、3,4-二氫噁唑-5-基、3,4-二氫噁唑-2-基、3,4-二氫噁唑-3-基、3,4-二氫噁唑-4-基、2-、3-、4-、5-或6-二氫吡啶基或四氫吡啶基、3-二氫嗒嗪基或四氫嗒嗪基、4-二氫嗒嗪基或四氫嗒嗪基、2-二氫嘧啶基或四氫嘧啶基、4-二氫嘧啶基或四氫嘧啶基、5-二氫嘧啶基或四氫嘧啶基、二氫吡嗪基或四氫吡嗪基、1,3,5-二氫三嗪或四氫三嗪-2-基、1,2,4-二氫三嗪或四氫三嗪-3-基、2,3,4,5-四氫[1H]氮呯-1-、-2-、-3-、-4-、-5-、-6-或-7-基、3,4,5,6-四氫[2H]氮呯-2-、-3-、-4-、-5-、-6-或-7-基、2,3,4,7-四氫[1H]氮呯-1-、-2-、-3-、-4-、-5-、-6-或-7-基、2,3,6,7-四氫[1H]氮呯-1-、-2-、-3-、-4-、-5-、-6-或-7-基、四氫氧呯基,諸如2,3,4,5-四氫[1H]氧呯-2-、-3-、-4-、-5-、-6-或-7-基、2,3,4,7-四氫[1H]氧呯-2-、-3-、-4-、-5-、-6-或-7-基、2,3,6,7-四氫[1H]氧呯-2-、-3-、-4-、-5-、-6-或-7-基、四氫-1,3-二氮呯基、四氫-1,4-二氮呯基、四氫-1,3-噁氮呯基、四氫-1,4-噁氮呯基、四氫-1,3-二氧呯基及四氫-1,4-二氧呯基。Examples of 3-, 4-, 5-, 6- or 7-membered partially unsaturated heterocyclic groups or heterocycles include: 2,3-dihydrofuran-2-yl, 2,3-dihydrofuran-3-yl , 2,4-dihydrofuran-2-yl, 2,4-dihydrofuran-3-yl, 2,3-dihydrothiophen-2-yl, 2,3-dihydrothiophen-3-yl, 2 ,4-dihydrothiophen-2-yl, 2,4-dihydrothiophen-3-yl, 2-pyrroline-2-yl, 2-pyrroline-3-yl, 3-pyrroline-2-yl, 3-pyrroline-3-yl, 2-isoxazolin-3-yl, 3-isoxazolin-3-yl, 4-isoxazolin-3-yl, 2-isoxazolin-4 -yl, 3-isoxazolin-4-yl, 4-isoxazolin-4-yl, 2-isoxazolin-5-yl, 3-isoxazolin-5-yl, 4-iso Oxazolin-5-yl, 2-isothiazolin-3-yl, 3-isothiazolin-3-yl, 4-isothiazolin-3-yl, 2-isothiazolin-4-yl, 3- Isothiazolin-4-yl, 4-isothiazolin-4-yl, 2-isothiazolin-5-yl, 3-isothiazolin-5-yl, 4-isothiazolin-5-yl, 2, 3-dihydropyrazol-1-yl, 2,3-dihydropyrazol-2-yl, 2,3-dihydropyrazol-3-yl, 2,3-dihydropyrazol-4-yl, 2,3-dihydropyrazol-5-yl, 3,4-dihydropyrazol-1-yl, 3,4-dihydropyrazol-3-yl, 3,4-dihydropyrazol-4- Base, 3,4-dihydropyrazol-5-yl, 4,5-dihydropyrazol-1-yl, 4,5-dihydropyrazol-3-yl, 4,5-dihydropyrazol- 4-yl, 4,5-dihydropyrazol-5-yl, 2,3-dihydrooxazol-2-yl, 2,3-dihydrooxazol-3-yl, 2,3-dihydrooxazol Azol-4-yl, 2,3-dihydrooxazol-5-yl, 3,4-dihydrooxazol-2-yl, 3,4-dihydrooxazol-3-yl, 3,4-di Hydroxazol-4-yl, 3,4-dihydrooxazol-5-yl, 3,4-dihydrooxazol-2-yl, 3,4-dihydrooxazol-3-yl, 3,4 -Dihydrooxazol-4-yl, 2-, 3-, 4-, 5- or 6-dihydropyridyl or tetrahydropyridyl, 3-dihydropyridazinyl or tetrahydropyridazinyl, 4- Dihydropyrimidinyl or tetrahydropyrimidinyl, 2-dihydropyrimidinyl or tetrahydropyrimidinyl, 4-dihydropyrimidinyl or tetrahydropyrimidinyl, 5-dihydropyrimidinyl or tetrahydropyrimidinyl, dihydropyrimidinyl Pyrazinyl or tetrahydropyrazinyl, 1,3,5-dihydrotriazine or tetrahydrotriazin-2-yl, 1,2,4-dihydrotriazine or tetrahydrotriazin-3-yl, 2,3,4,5-Tetrahydro[1H]nitrogen-1-, -2-, -3-, -4-, -5-, -6- or -7-yl, 3,4,5, 6-Tetrahydro[2H]nitrogen-2-, -3-, -4-, -5-, -6- or -7-yl, 2,3,4,7-tetrahydro[1H]nitrogen- 1-, -2-, -3-, -4-, -5-, -6- or -7-yl, 2,3,6,7-tetrahydro[1H]nitrogen-1-, -2- , -3-, -4-, -5-, -6- or -7-yl, tetrahydroxyl, such as 2,3,4,5-tetrahydro[1H]oxo-2-, -3-, -4-, -5-, -6- Or -7-yl, 2,3,4,7-tetrahydro[1H]oxo-2-, -3-, -4-, -5-, -6- or -7-yl, 2,3, 6,7-Tetrahydro[1H]oxane-2-, -3-, -4-, -5-, -6- or -7-yl, tetrahydro-1,3-diazoxyl, tetrahydro -1,4-diazoxanyl, tetrahydro-1,3-oxazanyl, tetrahydro-1,4-oxazanyl, tetrahydro-1,3-dioxanyl and tetrahydro-1 , 4-dioxanyl.
5員或6員芳族雜環基(雜芳基)或雜芳環之實例為:2-呋喃基、3-呋喃基、2-噻吩基、3-噻吩基、2-吡咯基、3-吡咯基、3-吡唑基、4-吡唑基、5-吡唑基、2-噁唑基、4-噁唑基、5-噁唑基、2-噻唑基、4-噻唑基、5-噻唑基、2-咪唑基、4-咪唑基、1,3,4-三唑-2-基、2-吡啶基、3-吡啶基、4-吡啶基、3-嗒嗪基、4-嗒嗪基、2-嘧啶基、4-嘧啶基、5-嘧啶基及2-吡嗪基。Examples of 5-membered or 6-membered aromatic heterocyclic groups (heteroaryl) or heteroaryl rings are: 2-furyl, 3-furyl, 2-thienyl, 3-thienyl, 2-pyrrolyl, 3- Pyrrolyl, 3-pyrazolyl, 4-pyrazolyl, 5-pyrazolyl, 2-oxazolyl, 4-oxazolyl, 5-oxazolyl, 2-thiazolyl, 4-thiazolyl, 5 -thiazolyl, 2-imidazolyl, 4-imidazolyl, 1,3,4-triazol-2-yl, 2-pyridyl, 3-pyridyl, 4-pyridyl, 3-pyridazinyl, 4- pyrazinyl, 2-pyrimidinyl, 4-pyrimidinyl, 5-pyrimidinyl and 2-pyrazinyl.
若未另外規定,則術語「經取代」係指經1個、2個或最大可能數目之取代基取代。若如式I化合物中所定義之取代基多於一個,若未另外提及,則該等取代基彼此獨立地相同或不同。If not otherwise specified, the term "substituted" means substituted with 1, 2 or the maximum possible number of substituents. If there is more than one substituent as defined in a compound of formula I, these substituents are, independently of one another, the same or different, if not mentioned otherwise.
本文未定義之術語的含義一般為熟習此項技術者已知或文獻中所知。The meanings of terms not defined herein are generally known to those skilled in the art or known in the literature.
下文描述本發明之較佳實施例。Preferred embodiments of the present invention are described below.
優先選擇 在一個實施例中,R1 為C1 -C4 烷基、C3 -C6 環烷基或C2 -C4 烯基,其未經取代或經鹵素取代。Preference In one embodiment, R 1 is C 1 -C 4 alkyl, C 3 -C 6 cycloalkyl or C 2 -C 4 alkenyl, which is unsubstituted or substituted with halogen.
在另一個實施例中,R1 為C1 -C4 烷基。In another embodiment, R 1 is C 1 -C 4 alkyl.
在另一個實施例中,R1 為甲基或乙基。In another embodiment, R 1 is methyl or ethyl.
在另一個實施例中,R1 為甲基。In another embodiment, R 1 is methyl.
在一個實施例中,R2 為苯基、吡啶基或噻吩基,其未經取代或經R2a 取代。In one embodiment, R 2 is phenyl, pyridyl or thienyl, which is unsubstituted or substituted with R 2a .
在另一個實施例中,R2 為苯基,其未經取代或經R2a 取代,其中R2a 為鹵素、C1 -C6 鹵烷基、C1 -C6 鹵烷氧基、ORc 、C(=O)ORc 、C(=O)NRb Rc 、苯基或吡啶基,其可經鹵素、C1 -C6 鹵烷基或C1 -C6 鹵烷氧基取代。In another embodiment, R 2 is phenyl, which is unsubstituted or substituted with R 2a , wherein R 2a is halogen, C 1 -C 6 haloalkyl, C 1 -C 6 haloalkoxy, OR c , C(=O)OR c , C(=O)NR b R c , phenyl or pyridyl, which may be substituted by halogen, C 1 -C 6 haloalkyl or C 1 -C 6 haloalkoxy.
在另一個實施例中,R2 為苯基,其未經取代或經鹵素、C1 -C4 烷基或C1 -C3 鹵烷基取代。In another embodiment, R 2 is phenyl, which is unsubstituted or substituted with halogen, C 1 -C 4 alkyl or C 1 -C 3 haloalkyl.
在另一個實施例中,R2 為苯基,其未經取代或經三氟甲基或鹵素取代,較佳經氯取代; In another embodiment, R is phenyl, which is unsubstituted or substituted with trifluoromethyl or halogen, preferably substituted with chlorine;
在另一個實施例中,R2 為苯基、3,5-二氯苯基、3-三氟甲基苯基。In another embodiment, R 2 is phenyl, 3,5-dichlorophenyl, 3-trifluoromethylphenyl.
在另一個實施例中,R2 為苯基。 In another embodiment, R2 is phenyl.
在另一個實施例中,R2 為3,5-二氯苯基。In another embodiment, R 2 is 3,5-dichlorophenyl.
在另一個實施例中,R2 為3-三氟甲基苯基。In another embodiment, R 2 is 3-trifluoromethylphenyl.
在一個實施例中,Ra 為鹵素、C1 -C4 鹵烷基、C1 -C4 烷氧基、C1 -C4 烷硫基或苯基。In one embodiment, R a is halogen, C 1 -C 4 haloalkyl, C 1 -C 4 alkoxy, C 1 -C 4 alkylthio or phenyl.
在一個更佳實施例中,Ra 為鹵素或C1 -C4 鹵烷基;In a more preferred embodiment, R a is halogen or C 1 -C 4 haloalkyl;
在一個最佳實施例中,Ra 為鹵素,較佳Cl。In a preferred embodiment, R a is halogen, preferably Cl.
在另一個較佳實施例中,Ra 為苯基。In another preferred embodiment, R a is phenyl.
在一個實施例中,n為0。In one embodiment, n is zero.
在另一個實施例中,n為1。In another embodiment, n is 1.
在另一個實施例中,n為2。In another embodiment, n is 2.
在本發明之一個實施例中,Het為D-2;In one embodiment of the invention, Het is D-2;
在本發明之一個實施例中,Het係選自D-1、D-2及D-3,其中 Ra 為氯, n為1。In one embodiment of the present invention, Het is selected from D-1, D-2 and D-3, wherein R a is chlorine, and n is 1.
在另一個實施例中,Het為D-1a、D-2a及D-3a: In another embodiment, Het is D-1a, D-2a and D-3a:
在另一個實施例中,Het為D-1a。In another embodiment, Het is D-1a.
在另一個實施例中,Het為D-2a。In another embodiment, Het is D-2a.
在另一個實施例中,Het為D-3a。In another embodiment, Het is D-3a.
在本發明之一個實施例中,式X化合物為以下化合物X-1至X-6中之一者:
在本發明之一個實施例中,式X化合物為化合物X-1。In one embodiment of the present invention, the compound of formula X is compound X-1.
在本發明之另一個實施例中,式X化合物為化合物X-2。In another embodiment of the present invention, the compound of formula X is compound X-2.
在本發明之另一個實施例中,式X化合物為化合物X-3。In another embodiment of the present invention, the compound of formula X is compound X-3.
在本發明之另一個實施例中,式X化合物為化合物X-4。In another embodiment of the present invention, the compound of formula X is compound X-4.
在本發明之另一個實施例中,式X化合物為化合物X-5。In another embodiment of the present invention, the compound of formula X is compound X-5.
在本發明之另一個實施例中,式X化合物為化合物X-6。In another embodiment of the present invention, the compound of formula X is compound X-6.
在一個實施例中,W為鹵素、羥基、O-對甲苯磺醯基、O-甲烷磺醯基或O-三氟甲烷磺醯基。In one embodiment, W is halogen, hydroxy, O-p-toluenesulfonyl, O-methanesulfonyl, or O-trifluoromethanesulfonyl.
在一個較佳實施例中,W為鹵素、O-對甲苯磺醯基、O-甲烷磺醯基或O-三氟甲烷磺醯基。In a preferred embodiment, W is halogen, O-p-toluenesulfonyl, O-methanesulfonyl or O-trifluoromethanesulfonyl.
在一個更佳實施例中,W為鹵素。In a more preferred embodiment, W is halogen.
在另一個更佳實施例中,W為羥基。In another more preferred embodiment, W is hydroxyl.
關於本發明之步驟(A)、(B)、(C)、(D)、(E)及(F)之較佳實施例在下文中描述。Preferred embodiments of steps (A), (B), (C), (D), (E) and (F) of the present invention are described below.
一般而言,如下文中詳細描述之在步驟(A)、(B)、(C)、(D)、(E)及(F)中進行之反應步驟係在慣用於此類反應之反應容器中進行,該等反應以連續、半連續或分批方式進行。In general, the reaction steps in steps (A), (B), (C), (D), (E) and (F), as described in detail below, are carried out in reaction vessels customary for such reactions These reactions are carried out in a continuous, semi-continuous or batch manner.
一般而言,特定反應將在大氣壓下進行。然而,反應亦可在減壓下進行。In general, a particular reaction will be carried out at atmospheric pressure. However, the reaction can also be carried out under reduced pressure.
一般而言,藉由反應步驟(D)、(E)及(F)中之任一者獲得的產物導致對映異構體過量。然而,在對映異構體之分離、純化(例如結晶)期間,以及在產物使用期間或之後,可進一步增加對映異構體過量。In general, the product obtained by any of reaction steps (D), (E) and (F) results in enantiomeric excess. However, enantiomeric excesses may be further increased during separation, purification (eg crystallization) of enantiomers, and during or after use of the product.
熟習此項技術者自類似反應知曉,反應之溫度及持續時間可在寬範圍內變化。溫度通常視溶劑之回流溫度而定。其他反應較佳在室溫下,亦即在約25℃下進行,或在冰冷卻下,亦即在約0℃下進行。反應結束可藉由熟習此項技術者已知之方法監測,例如薄層層析或HPLC。Those skilled in the art know from similar reactions that the temperature and duration of the reaction can vary widely. The temperature usually depends on the reflux temperature of the solvent. Other reactions are preferably carried out at room temperature, ie at about 25°C, or under ice cooling, ie at about 0°C. The completion of the reaction can be monitored by methods known to those skilled in the art, such as thin layer chromatography or HPLC.
若未另外指明,則反應中使用之反應物的莫耳比在0.2:1至1:0.2,較佳0.5:1至1:0.5,更佳0.8:1至1:0.8範圍內。較佳使用等莫耳量。If not specified otherwise, the molar ratio of the reactants used in the reaction is in the range of 0.2:1 to 1:0.2, preferably 0.5:1 to 1:0.5, more preferably 0.8:1 to 1:0.8. Preferably equimolar amounts are used.
若未另外指明,則反應物原則上可以任何所需順序彼此接觸。If not stated otherwise, the reactants can in principle be brought into contact with one another in any desired order.
熟習此項技術者知曉反應物或試劑何時對濕度敏感,因此反應應在保護性氣體下,諸如在氮氣氛圍下進行,且應使用無水溶劑。Those skilled in the art know when reactants or reagents are sensitive to humidity, so reactions should be performed under a protective atmosphere, such as nitrogen, and anhydrous solvents should be used.
熟習此項技術者亦知曉反應結束後反應混合物之最佳處理。Those skilled in the art also know the best handling of the reaction mixture after the reaction is complete.
在下文中,提供關於本發明之步驟(A)的較佳實施例。應理解,上述較佳實施例及仍將在下文本發明之步驟(A)中說明的較佳實施例應理解為較佳單獨或彼此組合。Hereinafter, preferred examples concerning the step (A) of the present invention are provided. It should be understood that the above-mentioned preferred embodiments and the preferred embodiments that will still be described in step (A) of the present invention below should be understood as being preferably alone or in combination with each other.
在一個實施例中,M2 係選自鋰、鈉、鉀、鋁、鋇、銫、鈣及鎂;In one embodiment, M is selected from lithium, sodium , potassium, aluminum, barium, cesium, calcium and magnesium;
在一個較佳實施例中,M2 為鋰;In a preferred embodiment, M 2 is lithium;
在另一個較佳實施例中,M2 為鈉;In another preferred embodiment, M 2 is sodium;
在另一個較佳實施例中,M2 為鉀;In another preferred embodiment, M 2 is potassium;
在另一個較佳實施例中,M2 為鋁;In another preferred embodiment, M 2 is aluminum;
在另一個較佳實施例中,M2 為鋇;In another preferred embodiment, M 2 is barium;
在另一個較佳實施例中,M2 為銫;In another preferred embodiment, M 2 is cesium;
在另一個較佳實施例中,M2 為鈣;In another preferred embodiment, M 2 is calcium;
在另一個較佳實施例中,M2 為鎂;In another preferred embodiment, M 2 is magnesium;
在一個實施例中,RAC 為C(=O)C1 -C4 烷基;In one embodiment, R AC is C(=O)C 1 -C 4 alkyl;
在另一個實施例中,RAC 為C(=O)C1 -C3 烷基;較佳C(=O)甲基、C(=O)乙基、C(=O)正丙基或C(=O)異丙基;更佳C(=O)甲基;In another embodiment, R AC is C(=O)C 1 -C 3 alkyl; preferably C(=O)methyl, C(=O)ethyl, C(=O)n-propyl or C(=O)isopropyl; more preferably C(=O)methyl;
在一個實施例中,步驟(A)中之反應溫度保持在0至120℃之範圍內,較佳在20至100℃之範圍內,更佳在20至60℃之範圍內。In one embodiment, the reaction temperature in step (A) is kept in the range of 0 to 120°C, preferably in the range of 20 to 100°C, more preferably in the range of 20 to 60°C.
在一個實施例中,步驟(A)在無溶劑存在下進行。In one embodiment, step (A) is performed in the absence of solvent.
在另一個實施例中,步驟(A)在溶劑中進行。In another embodiment, step (A) is performed in a solvent.
適合之溶劑包括水及脂族烴,諸如戊烷、己烷、環己烷及石油醚;芳族烴,諸如甲苯、鄰二甲苯、間二甲苯及對二甲苯;鹵化烴,諸如二氯甲烷、氯仿及氯苯;醇,諸如甲醇、乙醇、正丙醇、異丙醇、正丁醇及第三丁醇;C2 -C4 烷二醇,諸如乙二醇或丙二醇;醚烷醇,諸如二乙二醇;羧酸酯,諸如乙酸乙酯;N-甲基吡咯啶酮;二甲基甲醯胺;二甲基乙醯胺;及醚,包括開鏈醚及環醚,尤其乙醚、甲基第三丁基醚(MTBE)、2-甲氧基-2-甲基丁烷、環戊基甲基醚、1,4-二噁烷、四氫呋喃及2-甲基四氫呋喃,尤其四氫呋喃、MTBE及2-甲基四氫呋喃。亦可使用該等溶劑之混合物。Suitable solvents include water and aliphatic hydrocarbons such as pentane, hexane, cyclohexane, and petroleum ether; aromatic hydrocarbons such as toluene, o-xylene, m-xylene, and p-xylene; halogenated hydrocarbons such as methylene chloride , chloroform and chlorobenzene; alcohols such as methanol, ethanol, n-propanol, isopropanol, n-butanol and tert-butanol; C 2 -C 4 alkanediols such as ethylene glycol or propylene glycol; ether alkanols, such as diethylene glycol; carboxylic acid esters such as ethyl acetate; N-methylpyrrolidone; dimethylformamide; dimethylacetamide; and ethers, including open-chain ethers and cyclic ethers, especially diethyl ether , methyl tertiary butyl ether (MTBE), 2-methoxy-2-methylbutane, cyclopentyl methyl ether, 1,4-dioxane, tetrahydrofuran and 2-methyltetrahydrofuran, especially tetrahydrofuran , MTBE and 2-methyltetrahydrofuran. Mixtures of such solvents may also be used.
在一個較佳實施例中,溶劑係選自水、C2 -C6 烷二醇、C1 -C6 鹵烷、鹵苯、羧酸酯、N-甲基吡咯啶酮;二甲基甲醯胺;二甲基乙醯胺及醚,包括開鏈醚及環醚,或其兩種或更多種之混合物。In a preferred embodiment, the solvent is selected from water, C 2 -C 6 alkanediol, C 1 -C 6 haloalkane, halobenzene, carboxylate, N-methylpyrrolidone; Amides; dimethylacetamides and ethers, including open-chain ethers and cyclic ethers, or mixtures of two or more thereof.
在另一個較佳實施例中,溶劑係選自二甲基甲醯胺、四氫呋喃、2-甲基四氫呋喃、N-甲基吡咯啶酮、二甲基乙醯胺或其兩種或更多種之混合物。In another preferred embodiment, the solvent is selected from dimethylformamide, tetrahydrofuran, 2-methyltetrahydrofuran, N-methylpyrrolidone, dimethylacetamide, or two or more thereof the mixture.
在一個實施例中,式III化合物與溶劑之體積比在1:30至1:0之範圍內。In one embodiment, the volume ratio of the compound of formula III to the solvent is in the range of 1:30 to 1:0.
在另一個實施例中,式III化合物與溶劑之體積比在1:20至1:10之範圍內。In another embodiment, the volume ratio of the compound of formula III to the solvent is in the range of 1:20 to 1:10.
在一個較佳實施例中,式III化合物與溶劑之體積比在1:10至1:0之範圍內。In a preferred embodiment, the volume ratio of the compound of formula III to the solvent is in the range of 1:10 to 1:0.
在下文中,提供關於本發明之步驟(B)的較佳實施例。應理解,上述較佳實施例及仍將在下文本發明之步驟(B)中說明的較佳實施例應理解為較佳單獨或彼此組合。Hereinafter, preferred examples regarding step (B) of the present invention are provided. It should be understood that the above-mentioned preferred embodiments and the preferred embodiments still to be described in step (B) of the present invention below should be understood as being preferably alone or in combination with each other.
在一個實施例中,步驟(B)在酸存在下進行;In one embodiment, step (B) is carried out in the presence of an acid;
在一個實施例中,適合之酸通常為無機酸,諸如氫氟酸、鹽酸、氫溴酸、氫碘酸、硫酸、磷酸、高氯酸或其一或多種之混合物。In one embodiment, suitable acids are typically mineral acids such as hydrofluoric acid, hydrochloric acid, hydrobromic acid, hydroiodic acid, sulfuric acid, phosphoric acid, perchloric acid, or mixtures of one or more thereof.
在一個較佳實施例中,酸為鹽酸、硫酸、磷酸、氫碘酸或其一或多種之混合物。In a preferred embodiment, the acid is hydrochloric acid, sulfuric acid, phosphoric acid, hydroiodic acid or a mixture of one or more thereof.
在另一個實施例中,適合之酸為路易斯酸(Lewis acid),諸如三氟化硼、三氯化鋁、氯化鐵(III)、氯化錫(IV)、氯化鈦(IV)及氯化鋅(II)。In another embodiment, suitable acids are Lewis acids such as boron trifluoride, aluminum trichloride, iron(III) chloride, tin(IV) chloride, titanium(IV) chloride and Zinc(II) chloride.
在另一個實施例中,適合之酸通常為有機酸,諸如甲酸、C1 -C8 烷基-(COOH)y 或C1 -C8 鹵烷基-(COOH)y ,其中y為1或2;CH3 SO3 H、檸檬酸、草酸、對甲苯磺酸乙酸、丙酸、草酸、甲苯磺酸、苯磺酸、樟腦磺酸、檸檬酸及三氟乙酸或其一或多種之混合物。In another embodiment, suitable acids are typically organic acids such as formic acid, C 1 -C 8 alkyl-(COOH) y or C 1 -C 8 haloalkyl-(COOH) y , where y is 1 or 2; CH 3 SO 3 H, citric acid, oxalic acid, p-toluenesulfonic acid acetic acid, propionic acid, oxalic acid, toluenesulfonic acid, benzenesulfonic acid, camphorsulfonic acid, citric acid and trifluoroacetic acid or a mixture of one or more.
在一個較佳實施例中,酸為C1 -C8 烷基-(COOH)y 、C1 -C8 鹵烷基-(COOH)y ,其中y為1或2;CH3 SO3 H、檸檬酸、草酸、對甲苯磺酸或其兩種或更多種之混合物。In a preferred embodiment, the acid is C 1 -C 8 alkyl-(COOH) y , C 1 -C 8 haloalkyl-(COOH) y , wherein y is 1 or 2; CH 3 SO 3 H, Citric acid, oxalic acid, p-toluenesulfonic acid or a mixture of two or more thereof.
在另一個實施例中,步驟(B)中之酸係選自鹽酸、硫酸、磷酸、聚磷酸、氫碘酸、C1 -C8 烷基-(COOH)y 、C1 -C8 鹵烷基-(COOH)y、CH3 SO3 H、檸檬酸、草酸、對甲苯磺酸或其兩種或更多種之混合物;其中y為1或2。In another embodiment, the acid in step (B) is selected from hydrochloric acid, sulfuric acid, phosphoric acid, polyphosphoric acid, hydroiodic acid, C 1 -C 8 alkyl-(COOH) y , C 1 -C 8 haloalkane Group-(COOH)y, CH 3 SO 3 H, citric acid, oxalic acid, p-toluenesulfonic acid or a mixture of two or more thereof; wherein y is 1 or 2.
在一個尤其較佳實施例中,步驟(B)中之酸為鹽酸。In an especially preferred embodiment, the acid in step (B) is hydrochloric acid.
酸通常以等莫耳量使用;然而,其亦可以催化量、過量使用或若適宜,作為溶劑使用。The acids are generally used in equimolar amounts; however, they can also be used in catalytic amounts, in excess or, if appropriate, as solvents.
在另一個實施例中,步驟(B)在酸及緩衝劑存在下進行。In another embodiment, step (B) is performed in the presence of an acid and a buffer.
緩衝劑包括水性及非水性緩衝劑,且較佳為非水性緩衝劑。較佳緩衝劑包括基於乙酸鹽、磷酸鹽或甲酸鹽之緩衝劑,例如乙酸鈉、磷酸氫鉀、磷酸二氫鉀或甲酸銨。在一個實施例中,步驟(B)在鹼存在下進行;Buffers include aqueous and non-aqueous buffers, and are preferably non-aqueous buffers. Preferred buffers include acetate, phosphate or formate based buffers such as sodium acetate, potassium hydrogen phosphate, potassium dihydrogen phosphate or ammonium formate. In one embodiment, step (B) is carried out in the presence of a base;
適合之鹼通常為無機化合物,諸如鹼金屬及鹼土金屬氫氧化物,諸如氫氧化鋰、氫氧化鈉、氫氧化鉀及氫氧化鈣,Suitable bases are generally inorganic compounds such as alkali metal and alkaline earth metal hydroxides, such as lithium hydroxide, sodium hydroxide, potassium hydroxide and calcium hydroxide,
鹼金屬及鹼土金屬氧化物,諸如氧化鋰、氧化鈉、氧化鈣及氧化鎂,Alkali and alkaline earth metal oxides, such as lithium oxide, sodium oxide, calcium oxide and magnesium oxide,
鹼金屬及鹼土金屬碳酸鹽,諸如碳酸鋰、碳酸鉀及碳酸鈣,以及Alkali and alkaline earth metal carbonates, such as lithium carbonate, potassium carbonate and calcium carbonate, and
在一個尤其較佳實施例中,鹼係選自鹼金屬及鹼土金屬氫氧化物,尤其選自由氫氧化鋰、氫氧化鈉、氫氧化鎂、氫氧化鉀及氫氧化鈣組成之群。In a particularly preferred embodiment, the base is selected from alkali metal and alkaline earth metal hydroxides, especially from the group consisting of lithium hydroxide, sodium hydroxide, magnesium hydroxide, potassium hydroxide and calcium hydroxide.
在另一個尤其較佳實施例中,鹼係選自鹼金屬及鹼土金屬氧化物,尤其選自由氧化鋰、氧化鈉、氧化鈣及氧化鎂組成之群。In another particularly preferred embodiment, the base is selected from alkali metal and alkaline earth metal oxides, especially from the group consisting of lithium oxide, sodium oxide, calcium oxide and magnesium oxide.
鹼通常以等莫耳量使用;然而,其亦可以催化量或過量使用。The base is usually used in equimolar amounts; however, it can also be used in catalytic amounts or in excess.
在一個實施例中,步驟(B)中之水解反應溫度保持在0至120℃之範圍內,較佳在20至100℃之範圍內,更佳在20至60℃之範圍內。In one embodiment, the temperature of the hydrolysis reaction in step (B) is kept in the range of 0 to 120°C, preferably in the range of 20 to 100°C, more preferably in the range of 20 to 60°C.
在一個實施例中,步驟(B)中之水解在無溶劑存在下進行。In one embodiment, the hydrolysis in step (B) is carried out in the absence of solvent.
在另一個實施例中,步驟(B)中之水解在溶劑中進行。In another embodiment, the hydrolysis in step (B) is performed in a solvent.
適合之溶劑包括水及脂族烴,諸如戊烷、己烷、環己烷及石油醚;芳族烴,諸如甲苯、鄰二甲苯、間二甲苯及對二甲苯;鹵化烴,諸如二氯甲烷、氯仿及氯苯;醇,諸如甲醇、乙醇、正丙醇、異丙醇、正丁醇及第三丁醇;C2 -C4 烷二醇,諸如乙二醇或丙二醇;醚烷醇,諸如二乙二醇;羧酸酯,諸如乙酸乙酯;N-甲基吡咯啶酮;二甲基甲醯胺;及醚,包括開鏈醚及環醚,尤其乙醚、甲基第三丁基醚(MTBE)、2-甲氧基-2-甲基丁烷、環戊基甲基醚、1,4-二噁烷、四氫呋喃及2-甲基四氫呋喃,尤其四氫呋喃、MTBE及2-甲基四氫呋喃。亦可使用該等溶劑之混合物。Suitable solvents include water and aliphatic hydrocarbons such as pentane, hexane, cyclohexane, and petroleum ether; aromatic hydrocarbons such as toluene, o-xylene, m-xylene, and p-xylene; halogenated hydrocarbons such as methylene chloride , chloroform and chlorobenzene; alcohols such as methanol, ethanol, n-propanol, isopropanol, n-butanol and tert-butanol; C 2 -C 4 alkanediols such as ethylene glycol or propylene glycol; ether alkanols, such as diethylene glycol; carboxylic acid esters such as ethyl acetate; N-methylpyrrolidone; dimethylformamide; and ethers, including open-chain ethers and cyclic ethers, especially diethyl ether, methyl tertiary butyl ether (MTBE), 2-methoxy-2-methylbutane, cyclopentylmethyl ether, 1,4-dioxane, tetrahydrofuran and 2-methyltetrahydrofuran, especially tetrahydrofuran, MTBE and 2-methyltetrahydrofuran Tetrahydrofuran. Mixtures of such solvents may also be used.
在另一個實施例中,溶劑係選自C1 -C6 醇、水、C2 -C6 烷二醇、羧酸酯、N-甲基吡咯啶酮、二甲基甲醯胺及包括開鏈醚及環醚之醚,或其兩種或更多種之混合物。In another embodiment, the solvent is selected from C 1 -C 6 alcohol, water, C 2 -C 6 alkanediol, carboxylate, N-methylpyrrolidone, dimethylformamide and Ethers of chain ethers and cyclic ethers, or mixtures of two or more thereof.
在另一個實施例中,溶劑係選自水、二甲基甲醯胺、N-甲基吡咯啶酮、甲基第三丁基醚、甲醇、乙醇、異丙醇或其兩種或更多種之混合物。In another embodiment, the solvent is selected from water, dimethylformamide, N-methylpyrrolidone, methyl tertiary butyl ether, methanol, ethanol, isopropanol or two or more thereof mixture of species.
較佳溶劑為質子性溶劑,較佳選自由諸如甲醇、乙醇、正丙醇、異丙醇、正丁醇及第三丁醇組成之群的醇。Preferred solvents are protic solvents, preferably alcohols selected from the group consisting of methanol, ethanol, n-propanol, isopropanol, n-butanol and tert-butanol.
在一個較佳實施例中,溶劑為C1 -C4 醇,尤其甲醇。In a preferred embodiment, the solvent is a C 1 -C 4 alcohol, especially methanol.
在一個實施例中,式VI化合物與溶劑之體積比在1:30至1:0之範圍內。In one embodiment, the volume ratio of the compound of formula VI to the solvent is in the range of 1:30 to 1:0.
在另一個實施例中,式VI化合物與溶劑之體積比在1:20至1:10之範圍內。In another embodiment, the volume ratio of the compound of formula VI to the solvent is in the range of 1:20 to 1:10.
在一個較佳實施例中,式VI化合物與溶劑之體積比在1:10至1:0之範圍內。In a preferred embodiment, the volume ratio of the compound of formula VI to the solvent is in the range of 1:10 to 1:0.
在下文中,提供關於本發明之步驟(C)的較佳實施例。應理解,上述較佳實施例及仍將在下文本發明之步驟(C)中說明的較佳實施例應理解為較佳單獨或彼此組合。Hereinafter, preferred examples of step (C) of the present invention are provided. It should be understood that the above-mentioned preferred embodiments and the preferred embodiments that will still be described in the step (C) of the present invention below should be understood as preferably alone or in combination with each other.
在一個實施例中,X1 為選自Cl、Br、I及F之鹵素;In one embodiment, X is a halogen selected from Cl, Br, I and F;
在一個較佳實施例中,X1 為Cl;In a preferred embodiment, X 1 is Cl;
在另一個較佳實施例中,X1 為Br;In another preferred embodiment, X 1 is Br;
在另一個較佳實施例中,X1 為I;In another preferred embodiment, X is I ;
在另一個較佳實施例中,X1 為F;In another preferred embodiment, X is F ;
在一個實施例中,步驟(C)在酸存在下進行;In one embodiment, step (c) is carried out in the presence of an acid;
在一個實施例中,適合之酸通常為無機酸,諸如氫氟酸、鹽酸、氫溴酸、氫碘酸、硫酸、磷酸、高氯酸或其一或多種之混合物。In one embodiment, suitable acids are typically mineral acids such as hydrofluoric acid, hydrochloric acid, hydrobromic acid, hydroiodic acid, sulfuric acid, phosphoric acid, perchloric acid, or mixtures of one or more thereof.
在一個較佳實施例中,酸為鹽酸、硫酸、磷酸、氫碘酸或其一或多種之混合物。In a preferred embodiment, the acid is hydrochloric acid, sulfuric acid, phosphoric acid, hydroiodic acid or a mixture of one or more thereof.
在另一個實施例中,適合之酸為路易斯酸,諸如三氟化硼、三氯化鋁、氯化鐵(III)、氯化錫(IV)、氯化鈦(IV)及氯化鋅(II)。In another embodiment, suitable acids are Lewis acids such as boron trifluoride, aluminum trichloride, iron(III) chloride, tin(IV) chloride, titanium(IV) chloride, and zinc chloride ( II).
在另一個實施例中,適合之酸通常為有機酸,諸如甲酸、C1 -C8 烷基-(COOH)y 或C1 -C8 鹵烷基-(COOH)y ,其中y為1或2;CH3 SO3 H、檸檬酸、草酸、對甲苯磺酸乙酸、丙酸、草酸、甲苯磺酸、苯磺酸、樟腦磺酸、檸檬酸及三氟乙酸或其一或多種之混合物。In another embodiment, suitable acids are typically organic acids such as formic acid, C 1 -C 8 alkyl-(COOH) y or C 1 -C 8 haloalkyl-(COOH) y , where y is 1 or 2; CH 3 SO 3 H, citric acid, oxalic acid, p-toluenesulfonic acid acetic acid, propionic acid, oxalic acid, toluenesulfonic acid, benzenesulfonic acid, camphorsulfonic acid, citric acid and trifluoroacetic acid or a mixture of one or more.
在一個較佳實施例中,酸為C1 -C8 烷基-(COOH)y 、C1 -C8 鹵烷基-(COOH)y ,其中y為1或2;CH3 SO3 H、檸檬酸、草酸、對甲苯磺酸或其兩種或更多種之混合物。In a preferred embodiment, the acid is C 1 -C 8 alkyl-(COOH) y , C 1 -C 8 haloalkyl-(COOH) y , wherein y is 1 or 2; CH 3 SO 3 H, Citric acid, oxalic acid, p-toluenesulfonic acid or a mixture of two or more thereof.
在另一個實施例中,步驟(C)中之酸係選自鹽酸、硫酸、磷酸、聚磷酸、氫碘酸、C1 -C8 烷基-(COOH)y 、C1 -C8 鹵烷基-(COOH)y、CH3 SO3 H、檸檬酸、草酸、對甲苯磺酸或其兩種或更多種之混合物;其中y為1或2。In another embodiment, the acid in step (C) is selected from hydrochloric acid, sulfuric acid, phosphoric acid, polyphosphoric acid, hydroiodic acid, C 1 -C 8 alkyl-(COOH) y , C 1 -C 8 haloalkane Group-(COOH)y, CH 3 SO 3 H, citric acid, oxalic acid, p-toluenesulfonic acid or a mixture of two or more thereof; wherein y is 1 or 2.
在一個尤其較佳實施例中,步驟(C)中之酸為對甲苯磺酸。In an especially preferred embodiment, the acid in step (C) is p-toluenesulfonic acid.
酸通常以等莫耳量使用;然而,其亦可以催化量、過量使用或若適宜,作為溶劑使用。The acids are generally used in equimolar amounts; however, they can also be used in catalytic amounts, in excess or, if appropriate, as solvents.
在另一個實施例中,步驟(C)在酸及緩衝劑存在下進行。In another embodiment, step (C) is performed in the presence of an acid and a buffer.
緩衝劑包括水性及非水性緩衝劑,且較佳為非水性緩衝劑。較佳緩衝劑包括基於乙酸鹽、磷酸鹽或甲酸鹽之緩衝劑,例如乙酸鈉、磷酸氫鉀、磷酸二氫鉀或甲酸銨。Buffers include aqueous and non-aqueous buffers, and are preferably non-aqueous buffers. Preferred buffers include acetate, phosphate or formate based buffers such as sodium acetate, potassium hydrogen phosphate, potassium dihydrogen phosphate or ammonium formate.
在一個實施例中,步驟(C)中之反應溫度保持在0至150℃之範圍內,較佳在20至120℃之範圍內,更佳在30至100℃之範圍內。In one embodiment, the reaction temperature in step (C) is kept in the range of 0 to 150°C, preferably in the range of 20 to 120°C, more preferably in the range of 30 to 100°C.
在一個實施例中,步驟(C)中之水解在無溶劑存在下進行。In one embodiment, the hydrolysis in step (C) is performed in the absence of solvent.
在另一個實施例中,步驟(C)中之水解在溶劑中進行。In another embodiment, the hydrolysis in step (C) is performed in a solvent.
適合之溶劑包括水及脂族烴,諸如戊烷、己烷、環己烷及石油醚;芳族烴,諸如甲苯、氯苯、鄰二甲苯、間二甲苯及對二甲苯;鹵化烴,諸如二氯甲烷、氯仿及氯苯;醇,諸如甲醇、乙醇、正丙醇、異丙醇、正丁醇及第三丁醇;C2 -C4 烷二醇,諸如乙二醇或丙二醇;醚烷醇,諸如二乙二醇;羧酸酯,諸如乙酸乙酯;N-甲基吡咯啶酮;二甲基甲醯胺;及醚,包括開鏈醚及環醚,尤其乙醚、甲基第三丁基醚(MTBE)、2-甲氧基-2-甲基丁烷、環戊基甲基醚、1,4-二噁烷、四氫呋喃及2-甲基四氫呋喃,尤其四氫呋喃、MTBE及2-甲基四氫呋喃。亦可使用該等溶劑之混合物。Suitable solvents include water and aliphatic hydrocarbons such as pentane, hexane, cyclohexane, and petroleum ether; aromatic hydrocarbons such as toluene, chlorobenzene, o-xylene, m-xylene, and p-xylene; halogenated hydrocarbons such as Dichloromethane, chloroform, and chlorobenzene; alcohols, such as methanol, ethanol, n-propanol, isopropanol, n-butanol, and tert-butanol; C2 - C4 alkanediols, such as ethylene glycol or propylene glycol; ethers Alkanols, such as diethylene glycol; carboxylic acid esters, such as ethyl acetate; N-methylpyrrolidone; Dimethylformamide; and ethers, including open chain ethers and cyclic ethers, especially diethyl ether, methyl ether Tributyl ether (MTBE), 2-methoxy-2-methylbutane, cyclopentyl methyl ether, 1,4-dioxane, tetrahydrofuran and 2-methyltetrahydrofuran, especially tetrahydrofuran, MTBE and 2 - Methyltetrahydrofuran. Mixtures of such solvents may also be used.
在另一個實施例中,溶劑係選自C1 -C6 醇、水、C2 -C6 烷二醇、羧酸酯、N-甲基吡咯啶酮、二甲基甲醯胺及包括開鏈醚及環醚之醚,或其兩種或更多種之混合物。In another embodiment, the solvent is selected from C 1 -C 6 alcohol, water, C 2 -C 6 alkanediol, carboxylate, N-methylpyrrolidone, dimethylformamide and Ethers of chain ethers and cyclic ethers, or mixtures of two or more thereof.
在另一個實施例中,溶劑係選自水、二甲基甲醯胺、N-甲基吡咯啶酮、甲基第三丁基醚、甲醇、乙醇、異丙醇或其兩種或更多種之混合物。In another embodiment, the solvent is selected from water, dimethylformamide, N-methylpyrrolidone, methyl tertiary butyl ether, methanol, ethanol, isopropanol or two or more thereof mixture of species.
較佳溶劑為脂族烴,諸如戊烷、己烷、環己烷及石油醚;芳族烴,諸如甲苯、氯苯、鄰二甲苯、間二甲苯及對二甲苯。Preferred solvents are aliphatic hydrocarbons, such as pentane, hexane, cyclohexane, and petroleum ether; aromatic hydrocarbons, such as toluene, chlorobenzene, o-xylene, m-xylene, and p-xylene.
在一個尤其較佳實施例中,溶劑為甲苯。In an especially preferred embodiment, the solvent is toluene.
在一個實施例中,式V化合物與溶劑之體積比在1:30至1:0之範圍內。In one embodiment, the volume ratio of the compound of formula V to the solvent is in the range of 1:30 to 1:0.
在另一個實施例中,式V化合物與溶劑之體積比在1:20至1:10之範圍內。In another embodiment, the volume ratio of the compound of formula V to the solvent is in the range of 1:20 to 1:10.
在一個較佳實施例中,式V化合物與溶劑之體積比在1:10至1:0之範圍內。In a preferred embodiment, the volume ratio of the compound of formula V to the solvent is in the range of 1:10 to 1:0.
在下文中,提供關於本發明之步驟(D)的較佳實施例。應理解,上述較佳實施例及仍將在下文本發明之步驟(D)中說明的較佳實施例應理解為較佳單獨或彼此組合。Hereinafter, preferred examples concerning the step (D) of the present invention are provided. It should be understood that the above-mentioned preferred embodiments and the preferred embodiments still to be described in the step (D) of the present invention below should be understood as being preferably alone or in combination with each other.
在一個實施例中,氫源選自b) N(R)3 與HCOOH之混合物,其中R為H或C1 -C6 烷基,c) HCOONa及d)異丙醇與t -BuOK或t -BuONa或t -BuOLi之混合物;In one embodiment, the hydrogen source is selected from b) a mixture of N(R) 3 and HCOOH, wherein R is H or C 1 -C 6 alkyl, c) HCOONa and d) isopropanol and t -BuOK or t - Mixtures of BuONa or t -BuOLi;
在一個實施例中,氫源為N(R)3 與HCOOH之混合物。In one embodiment, the hydrogen source is a mixture of N(R) 3 and HCOOH.
在一個實施例中,R為H;In one embodiment, R is H;
在另一個實施例中,R為C1 -C6 烷基In another embodiment, R is C 1 -C 6 alkyl
在另一個實施例中,R為C1 -C4 烷基,諸如甲基、乙基、異丙基、正丙基、第三丁基。In another embodiment, R is C 1 -C 4 alkyl, such as methyl, ethyl, isopropyl, n-propyl, tert-butyl.
在一個較佳實施例中,R為H、乙基、異丙基或第三丁基。In a preferred embodiment, R is H, ethyl, isopropyl or tert-butyl.
在一個更佳實施例中,R為H或乙基。In a more preferred embodiment, R is H or ethyl.
在一個最佳實施例中,R為乙基。In a preferred embodiment, R is ethyl.
在一個實施例中,N(R)3 與HCOOH之體積比在1:2至1:10之範圍內。In one embodiment, the volume ratio of N(R) 3 to HCOOH is in the range of 1:2 to 1:10.
在一個較佳實施例中,N(R)3 與HCOOH之體積比在1:1至1:4之範圍內。In a preferred embodiment, the volume ratio of N(R) 3 to HCOOH is in the range of 1:1 to 1:4.
在更佳實施例中,N(R)3 與HCOOH之體積比在1:1至1:3之範圍內。In a more preferred embodiment, the volume ratio of N(R) 3 to HCOOH is in the range of 1:1 to 1:3.
在另一個實施例中,氫源為HCOONa。In another embodiment, the hydrogen source is HCOONa.
在另一個實施例中,氫源為HCOOK。In another embodiment, the hydrogen source is HCOOK.
在另一個實施例中,氫源為異丙醇與t -BuOK之混合物。In another embodiment, the hydrogen source is a mixture of isopropanol and t -BuOK.
在另一個實施例中,氫源為異丙醇與t -BuONa之混合物。In another embodiment, the hydrogen source is a mixture of isopropanol and t -BuONa.
在一個實施例中,m為0;In one embodiment, m is 0;
在一個實施例中,m為1;In one embodiment, m is 1;
在一個實施例中,氫化催化劑為MXLn(ƞ-芳烴)m ,其中m為1且ƞ-芳烴為未經取代或經C1 -C4 烷基取代之芳基環。In one embodiment, the hydrogenation catalyst is MXLn(ƞ-arene) m , where m is 1 and ƞ-arene is an unsubstituted or C 1 -C 4 alkyl substituted aryl ring.
在一個實施例中,氫化催化劑為MXLn(ƞ-芳烴)m ,其中m為1且ƞ-芳烴係選自苯、對異丙基甲苯、均三甲苯、2,4,6-三乙基苯、六甲苯、苯甲醚、1,5-環辛二烯、環戊二烯基(Cp)、降冰片二烯及五甲基環戊二烯基(Cp*)。In one embodiment, the hydrogenation catalyst is MXLn(ƞ-arene) m , where m is 1 and the ƞ-arene is selected from benzene, p-cymene, mesitylene, 2,4,6-triethylbenzene , Hexamethylbenzene, Anisole, 1,5-Cyclooctadiene, Cyclopentadienyl (Cp), Norbornadiene, and Pentamethylcyclopentadienyl (Cp*).
在一個實施例中,氫化催化劑為MXLn(ƞ-芳烴)m ,其中m為1且ƞ-芳烴係選自苯、對異丙基甲苯、均三甲苯、2,4,6-三乙基苯、六甲苯、苯甲醚、1,5-環辛二烯、環戊二烯基(Cp)及五甲基環戊二烯基(Cp*)。In one embodiment, the hydrogenation catalyst is MXLn(ƞ-arene) m , where m is 1 and the ƞ-arene is selected from benzene, p-cymene, mesitylene, 2,4,6-triethylbenzene , Hexamethylbenzene, Anisole, 1,5-Cyclooctadiene, Cyclopentadienyl (Cp) and Pentamethylcyclopentadienyl (Cp*).
在另一個實施例中,氫化催化劑為MXLn(ƞ-芳烴)m ,其中m為1且ƞ-芳烴係選自環戊二烯基(Cp)及五甲基環戊二烯基(Cp*)。In another embodiment, the hydrogenation catalyst is MXLn(ƞ-arene) m , where m is 1 and the ƞ-arene is selected from cyclopentadienyl (Cp) and pentamethylcyclopentadienyl (Cp*) .
在另一個實施例中,氫化催化劑為MXLn(ƞ-芳烴)m ,其中m為1且ƞ-芳烴係選自環戊二烯基(Cp)。In another embodiment, the hydrogenation catalyst is MXLn(ƞ-arene) m , where m is 1 and the ƞ-arene is selected from cyclopentadienyl (Cp).
在另一個實施例中,氫化催化劑為MXLn(ƞ-芳烴)m ,其中m為1且ƞ-芳烴為五甲基環戊二烯基(Cp*)。In another embodiment, the hydrogenation catalyst is MXLn(ƞ-arene) m , where m is 1 and the ƞ-arene is pentamethylcyclopentadienyl (Cp*).
在另一個實施例中,氫化催化劑為MXLn(ƞ-芳烴)m ,其中m為1且ƞ-芳烴係選自苯、對異丙基甲苯、均三甲苯、2,4,6-三乙基苯、六甲苯、苯甲醚及1,5-環辛二烯。In another embodiment, the hydrogenation catalyst is MXLn(ƞ-arene) m , where m is 1 and the ƞ-arene is selected from benzene, p-cymene, mesitylene, 2,4,6-triethyl Benzene, hexamethylbenzene, anisole and 1,5-cyclooctadiene.
在一個實施例中,X為陰離子,其係藉由使M或MLn與相應陰離子之酸,較佳鹽酸、氫溴酸、氫碘酸、四氟硼酸或六氟磷酸反應形成。In one embodiment, X is an anion formed by reacting M or MLn with an acid of the corresponding anion, preferably hydrochloric acid, hydrobromic acid, hydroiodic acid, tetrafluoroboric acid or hexafluorophosphoric acid.
在另一個實施例中,X係選自鹵離子,六氟矽酸根、六氟磷酸根、苯甲酸根、磺酸根及C1 -C6 烷酸之陰離子,較佳甲酸根、乙酸根、丙酸根及丁酸根。In another embodiment, X is an anion selected from halide, hexafluorosilicate, hexafluorophosphate, benzoate, sulfonate and C 1 -C 6 alkanoic acid, preferably formate, acetate, propane acid and butyrate.
在另一個實施例中,X為選自氯離子、溴離子及碘離子之鹵離子。In another embodiment, X is a halide ion selected from chloride, bromide and iodide.
在另一個實施例中,X為氯離子或溴離子。In another embodiment, X is chloride or bromide.
在另一個實施例中,X為氯離子。In another embodiment, X is chloride.
在另一個實施例中,X為四氟硼酸根。In another embodiment, X is tetrafluoroborate.
在另一個實施例中,Ln為Ln1,其中R10 為NH-SO2 -R11 且其中R12 及R11 獨立地為未經取代或經取代之芳基。In another embodiment, Ln is Ln1, wherein R 10 is NH-SO 2 -R 11 and wherein R 12 and R 11 are independently unsubstituted or substituted aryl.
在另一個實施例中,Ln為Ln1,其中R10 為NH-SO2 -R11 且其中R12 及R11 獨立地為經取代之芳基。In another embodiment, Ln is Ln1, wherein R 10 is NH-SO 2 -R 11 and wherein R 12 and R 11 are independently substituted aryl.
在另一個實施例中,Ln為Ln1,其中R10 為NH-SO2 -R11 且其中R12 及R11 獨立地為未經取代之芳基。In another embodiment, Ln is Ln1, wherein R 10 is NH-SO 2 -R 11 and wherein R 12 and R 11 are independently unsubstituted aryl.
在另一個實施例中,Ln為Ln1,其中R10 為NH-SO2 -R11 ,其中R11 為經取代之芳基且R12 為C6 -C10 環烷基。In another embodiment, Ln is Ln1, wherein R 10 is NH-SO 2 -R 11 , wherein R 11 is substituted aryl and R 12 is C 6 -C 10 cycloalkyl.
在另一個實施例中,Ln為Ln1,其中R10 為NH-SO2 -R11 ;其中R11 為經取代之芳基且R12 為未經取代之芳基。In another embodiment, Ln is Ln1, wherein R 10 is NH—SO 2 —R 11 ; wherein R 11 is substituted aryl and R 12 is unsubstituted aryl.
在另一個實施例中,Ln為Ln1,其中R10 為NH-SO2 -R11 ;其中R11 為未經取代之芳基且R12 為經取代之芳基。In another embodiment, Ln is Ln1, wherein R 10 is NH—SO 2 —R 11 ; wherein R 11 is unsubstituted aryl and R 12 is substituted aryl.
在另一個實施例中,Ln為Ln1,其中R10 為NH-SO2 -R11 ,其中R11 為未經取代或經取代之芳基且兩個R12 連接在一起以形成3員至6員碳環或5員至10員部分不飽和碳環。In another embodiment, Ln is Ln1, wherein R 10 is NH-SO 2 -R 11 , wherein R 11 is unsubstituted or substituted aryl and two R 12 are joined together to form 3-6 1-membered carbocycle or 5- to 10-membered partially unsaturated carbocycle.
在另一個實施例中,MXLn(ƞ-芳烴)m 為MXLn1(ƞ-芳烴)m ,其中R10 為NH-SO2 -R11 ;且R12 及R11 獨立地為苯基,其未經取代或經1或2個選自鹵素、C1 -C4 烷基、C1 -C4 烷氧基、C3 -C6 環烷基、SO3 H及SO3 Na之取代基取代。In another embodiment, MXLn(ƞ-arene) m is MXLn1(ƞ-arene) m , wherein R 10 is NH-SO 2 -R 11 ; and R 12 and R 11 are independently phenyl, which have not been Substituted or substituted with 1 or 2 substituents selected from halogen, C 1 -C 4 alkyl, C 1 -C 4 alkoxy, C 3 -C 6 cycloalkyl, SO 3 H and SO 3 Na.
在另一個實施例中,MXLn(ƞ-芳烴)m 為MXLn1(ƞ-芳烴)m ,其中X為鹵離子;R12 獨立地為苯基、2-甲基苯基、3-甲基苯基、4-甲基苯基或4-甲氧基苯基;R10 為NH-SO2 -R11 且-SO2 -R11 為對甲苯磺醯基、甲烷磺醯基、4-苯磺醯基、4-三氟甲基苯基-磺醯基或五氟苯基-磺醯基。In another embodiment, MXLn(ƞ-arene) m is MXLn1(ƞ-arene) m , wherein X is a halide ion; R 12 are independently phenyl, 2-methylphenyl, 3-methylphenyl , 4-methylphenyl or 4-methoxyphenyl; R 10 is NH-SO 2 -R 11 and -SO 2 -R 11 is p-toluenesulfonyl, methanesulfonyl, 4-benzenesulfonyl , 4-trifluoromethylphenyl-sulfonyl or pentafluorophenyl-sulfonyl.
在另一個實施例中,Ln為Ln1,其中R10 為OH且R12 為未經取代或經取代之芳基。In another embodiment, Ln is Ln1, wherein R 10 is OH and R 12 is unsubstituted or substituted aryl.
在另一個實施例中,Ln為Ln1,其中R10 為OH且R12 為經取代之芳基。In another embodiment, Ln is Ln1, wherein R 10 is OH and R 12 is substituted aryl.
在另一個實施例中,Ln為Ln1,其中R10 為OH且R12 為未經取代之芳基。In another embodiment, Ln is Ln1, wherein R 10 is OH and R 12 is unsubstituted aryl.
在另一個實施例中,Ln為Ln1,其中R10 為OH且R12 為C6 -C10 環烷基。In another embodiment, Ln is Ln1, wherein R 10 is OH and R 12 is C 6 -C 10 cycloalkyl.
在另一個實施例中,Ln為Ln1,其中R10 為OH且兩個R12 連接在一起以形成3員至6員碳環或5員至10員部分不飽和碳環。In another embodiment, Ln is Ln1, wherein R 10 is OH and two R 12 are joined together to form a 3-6 membered carbocycle or a 5-10 membered partially unsaturated carbocycle.
在另一實施例中,Ln1負載於矽膠、樹枝狀聚合物、聚苯乙烯或中孔矽質泡沫上,例如Haraguchi, N., Tsuru, K., Arakawa, Y., Isuno, S.Org. Biomol. Chem. 2009, 7 , 69中所述。In another embodiment, Ln1 is supported on silica gel, dendrimers, polystyrene or mesoporous siliceous foams, such as Haraguchi, N., Tsuru, K., Arakawa, Y., Isuno, S. Org. Biomol. Chem. 2009 , 7 , 69 described.
在一個實施例中,M為銠、釕、銥、鉑、鈀、鐵或鎳。In one embodiment, M is rhodium, ruthenium, iridium, platinum, palladium, iron or nickel.
在另一個實施例中,M為銠、釕、銥或鉑。In another embodiment, M is rhodium, ruthenium, iridium or platinum.
在另一個實施例中,M為銠、釕或鉑。In another embodiment, M is rhodium, ruthenium or platinum.
在另一個實施例中,M為銠、銥或鉑。In another embodiment, M is rhodium, iridium or platinum.
在另一個實施例中,M為銠、釕或銥。In another embodiment, M is rhodium, ruthenium or iridium.
在另一個實施例中,M為銠或釕。In another embodiment, M is rhodium or ruthenium.
在另一個實施例中,M為銠或銥。In another embodiment, M is rhodium or iridium.
在另一個實施例中,M為釕或銥。In another embodiment, M is ruthenium or iridium.
在另一個實施例中,M為鈀、鐵或鎳。In another embodiment, M is palladium, iron or nickel.
在另一個實施例中,M為鈀或鎳。In another embodiment, M is palladium or nickel.
在另一個實施例中,M為鐵或鎳。In another embodiment, M is iron or nickel.
在另一個實施例中,M為鈀或鐵。In another embodiment, M is palladium or iron.
在一個較佳實施例中,M為銠。In a preferred embodiment, M is rhodium.
在另一個較佳實施例中,M為釕。In another preferred embodiment, M is ruthenium.
在另一個較佳實施例中,M為銥。In another preferred embodiment, M is iridium.
在另一個較佳實施例中,M為鈀。In another preferred embodiment, M is palladium.
在另一個較佳實施例中,M為鐵。In another preferred embodiment, M is iron.
在另一個較佳實施例中,M為鎳。In another preferred embodiment, M is nickel.
在另一個較佳實施例中,M為鉑。In another preferred embodiment, M is platinum.
在另一個實施例中,m為1且MXLn(ƞ-芳烴)m 具有式MXLnCp*,其中M為銠、釕、銥、鉑、鈀、鐵或鎳。 In another embodiment, m is 1 and MXLn(ƞ-arene) m has the formula MXLnCp*, wherein M is rhodium, ruthenium, iridium, platinum, palladium, iron or nickel.
在另一個實施例中,Ln為Ln2,其為對掌性磷配體。In another embodiment, Ln is Ln2, which is a chiral phosphorus ligand.
在另一個實施例中,對掌性磷配體Ln2係選自對掌性單齒或二齒磷化氫或亞磷酸酯配體。In another embodiment, the chiral phosphorus ligand Ln2 is selected from chiral monodentate or bidentate phosphine or phosphite ligands.
在另一個實施例中,對掌性磷配體係選自下表A中所列之配體或選自其相應的對映異構體。
表A:其中Cy=環己基且Ph=苯基
在另一個實施例中,對掌性磷配體係選自(R )-BINAP、(S )-BINAP、(R )TolBINAP、(S)-TolBINAP、(R,R )-DIPAMP、(S,S) -DIPAMP、(R )-(S) -Josiphos,或選自其相應的對映異構體。In another embodiment, the chiral phosphorus ligand system is selected from ( R )-BINAP, ( S )-BINAP, ( R ) TolBINAP, (S)-TolBINAP, ( R,R )-DIPAMP, (S,S ) -DIPAMP, ( R )- (S) -Josiphos, or selected from the corresponding enantiomers thereof.
在一個實施例中,式III化合物與MXLn(ƞ-芳烴)m 之莫耳比在1:0.0001至1:0.001之範圍內。In one embodiment, the molar ratio of the compound of formula III to MXLn(ƞ-arene) m is in the range of 1:0.0001 to 1:0.001.
在一個較佳實施例中,式III化合物與MXLn(ƞ-芳烴)m 之莫耳比在1:0.001至1:0.01之範圍內。In a preferred embodiment, the molar ratio of the compound of formula III to MXLn(ƞ-arene) m is in the range of 1:0.001 to 1:0.01.
在一個更佳實施例中,式III化合物與MXLn(ƞ-芳烴)m 之莫耳比在1:0.001至1:0.05之範圍內。In a more preferred embodiment, the molar ratio of the compound of formula III to MXLn(ƞ-arene) m is in the range of 1:0.001 to 1:0.05.
在一個實施例中,步驟(D)中之氫化反應溫度保持在0至120℃之範圍內,較佳在0至85℃之範圍內,較佳在20至85℃之範圍內,更佳在20至50℃之範圍內,亦更佳在0至30℃之範圍內,亦更佳在0℃下。In one embodiment, the hydrogenation reaction temperature in step (D) is kept in the range of 0 to 120°C, preferably in the range of 0 to 85°C, preferably in the range of 20 to 85°C, more preferably in the range of In the range of 20 to 50°C, more preferably in the range of 0 to 30°C, more preferably at 0°C.
在一個實施例中,步驟(D)中之氫化反應在低於0℃之溫度下進行。In one embodiment, the hydrogenation reaction in step (D) is performed at a temperature below 0°C.
在一個實施例中,步驟(D)中之氫化在無溶劑存在下進行。In one embodiment, the hydrogenation in step (D) is carried out in the absence of solvent.
在另一個實施例中,步驟(D)中之氫化在溶劑中進行。In another embodiment, the hydrogenation in step (D) is performed in a solvent.
適合之溶劑包括水及脂族烴,諸如戊烷、己烷、環己烷及石油醚;芳族烴,諸如甲苯、鄰二甲苯、間二甲苯及對二甲苯;鹵化烴,諸如二氯甲烷、氯仿、1,2-二氯乙烷及氯苯;醇,諸如甲醇、乙醇、正丙醇、異丙醇、正丁醇及第三丁醇;C2 -C4 烷二醇,諸如乙二醇或丙二醇;酮,諸如丙酮、2-丁酮;醚烷醇,諸如二乙二醇;羧酸酯,諸如乙酸乙酯;N-甲基吡咯啶酮;二甲基甲醯胺;二甲基乙醯胺;及醚,包括開鏈醚及環醚,尤其乙醚、甲基第三丁基醚(MTBE)、2-甲氧基-2-甲基丁烷、環戊基甲基醚、1,4-二噁烷、四氫呋喃及2-甲基四氫呋喃,尤其四氫呋喃、MTBE及2-甲基四氫呋喃。亦可使用該等溶劑之混合物。Suitable solvents include water and aliphatic hydrocarbons such as pentane, hexane, cyclohexane, and petroleum ether; aromatic hydrocarbons such as toluene, o-xylene, m-xylene, and p-xylene; halogenated hydrocarbons such as methylene chloride , chloroform, 1,2-dichloroethane, and chlorobenzene; alcohols, such as methanol, ethanol, n-propanol, isopropanol, n-butanol, and tert-butanol; C 2 -C 4 alkanediols, such as ethyl Diol or propylene glycol; Ketones, such as acetone, 2-butanone; Ether alkanols, such as diethylene glycol; Carboxylate esters, such as ethyl acetate; N-methylpyrrolidone; Dimethylformamide; Methylacetamide; and ethers, including open-chain ethers and cyclic ethers, especially diethyl ether, methyl tertiary butyl ether (MTBE), 2-methoxy-2-methylbutane, cyclopentyl methyl ether , 1,4-dioxane, tetrahydrofuran and 2-methyltetrahydrofuran, especially tetrahydrofuran, MTBE and 2-methyltetrahydrofuran. Mixtures of such solvents may also be used.
在一個較佳實施例中,溶劑係選自水、C2 -C6 烷二醇、C1 -C6 鹵烷、鹵苯、羧酸酯、N-甲基吡咯啶酮;二甲基甲醯胺;甲苯、二甲基乙醯胺及醚,包括開鏈醚及環醚,或其兩種或更多種之混合物。In a preferred embodiment, the solvent is selected from water, C 2 -C 6 alkanediol, C 1 -C 6 haloalkane, halobenzene, carboxylate, N-methylpyrrolidone; Amides; toluene, dimethylacetamide and ethers, including open-chain ethers and cyclic ethers, or mixtures of two or more thereof.
在另一個較佳實施例中,溶劑係選自水、二甲基甲醯胺、四氫呋喃、N-甲基吡咯啶酮、二甲基乙醯胺或其兩種或更多種之混合物。In another preferred embodiment, the solvent is selected from water, dimethylformamide, tetrahydrofuran, N-methylpyrrolidone, dimethylacetamide or a mixture of two or more thereof.
在一個實施例中,式VI化合物與溶劑之體積比在1:40至1:0之範圍內。In one embodiment, the volume ratio of the compound of formula VI to the solvent is in the range of 1:40 to 1:0.
在另一個實施例中,式VI化合物與溶劑之體積比在1:30至1:5之範圍內。In another embodiment, the volume ratio of the compound of formula VI to the solvent is in the range of 1:30 to 1:5.
在一個較佳實施例中,式VI化合物與溶劑之體積比在1:20至1:10、較佳1:1之範圍內。In a preferred embodiment, the volume ratio of the compound of formula VI to the solvent is in the range of 1:20 to 1:10, preferably 1:1.
步驟(D)中之反應時間可在寬範圍內變化。較佳反應時間為5分鐘至1天,較佳15分鐘至6小時,更佳15分鐘至3小時,例如1至2小時。The reaction time in step (D) can vary within wide limits. The preferred reaction time is 5 minutes to 1 day, preferably 15 minutes to 6 hours, more preferably 15 minutes to 3 hours, for example 1 to 2 hours.
在一個實施例中,步驟(D)可在界面活性劑N(Rs )4 Xa 存在下進行,其中Rs 獨立地為C1 -C22 烷基、C1 -C22 環烷基或芳基,其未經取代或經鹵素取代,且Xa 為氯、溴、碘、硫酸氫鹽、磷酸鹽、六氟磷酸鹽、乙酸鹽、苯甲酸鹽或四氟硼酸鹽。In one embodiment, step (D) can be carried out in the presence of a surfactant N(R s ) 4 X a , wherein R s are independently C 1 -C 22 alkyl, C 1 -C 22 cycloalkyl or Aryl, which is unsubstituted or substituted with halogen, and Xa is chlorine, bromine, iodine, bisulfate, phosphate, hexafluorophosphate, acetate, benzoate or tetrafluoroborate.
進一步較佳的是,反應在保護性或惰性氣體氛圍中進行,例如在氮氣或氬氣下進行。Further preferably, the reaction is carried out in a protective or inert gas atmosphere, such as nitrogen or argon.
進一步較佳的是,反應在減壓下進行。Further preferably, the reaction is carried out under reduced pressure.
在另一個實施例中,反應在氫氣氛圍下進行。In another embodiment, the reaction is performed under a hydrogen atmosphere.
在一個較佳實施例中,藉由步驟(D)獲得之式VII化合物的對映異構體過量>80%。In a preferred embodiment, the enantiomeric excess of the compound of formula VII obtained by step (D) is >80%.
在下文中,提供關於本發明之步驟(E)的較佳實施例。應理解,上述較佳實施例及仍將在下文本發明之步驟(E)中說明的較佳實施例應理解為較佳單獨或彼此組合。Hereinafter, preferred examples of step (E) of the present invention are provided. It should be understood that the above-mentioned preferred embodiments and the preferred embodiments that will still be described in step (E) of the present invention below should be understood as being preferably alone or in combination with each other.
在一個實施例中,步驟(E)在鹼存在下進行;In one embodiment, step (E) is carried out in the presence of a base;
適合之鹼通常為無機化合物,諸如鹼金屬及鹼土金屬氫氧化物,諸如氫氧化鋰、氫氧化鈉、氫氧化鉀及氫氧化鈣,Suitable bases are generally inorganic compounds such as alkali metal and alkaline earth metal hydroxides, such as lithium hydroxide, sodium hydroxide, potassium hydroxide and calcium hydroxide,
鹼金屬及鹼土金屬氧化物,諸如氧化鋰、氧化鈉、氧化鈣及氧化鎂,Alkali and alkaline earth metal oxides, such as lithium oxide, sodium oxide, calcium oxide and magnesium oxide,
鹼金屬及鹼土金屬之烷基氧化物,諸如甲醇鈉、甲醇鉀、乙醇鈉、乙醇鉀、第三丁醇鈉及第三丁醇鉀,Alkoxides of alkali metals and alkaline earth metals, such as sodium methoxide, potassium methoxide, sodium ethoxide, potassium ethoxide, sodium tert-butoxide and potassium tert-butoxide,
鹼金屬及鹼土金屬碳酸鹽,諸如碳酸鋰、碳酸鉀及碳酸鈣,以及Alkali and alkaline earth metal carbonates, such as lithium carbonate, potassium carbonate and calcium carbonate, and
鹼金屬碳酸氫鹽,諸如碳酸氫鈉,Alkali metal bicarbonates, such as sodium bicarbonate,
此外,有機鹼,例如三級胺,諸如三甲胺、三乙胺、三異丙基乙胺、N-甲基嗎啉及N-甲基哌啶、吡啶、經取代之吡啶,諸如三甲基吡啶、二甲基吡啶及4-二甲胺基吡啶,以及雙環胺,諸如1,8-二氮雜二環[5.4.0]十一-7-烯及1,4-二氮雜二環[2.2.2]辛烷In addition, organic bases such as tertiary amines such as trimethylamine, triethylamine, triisopropylethylamine, N-methylmorpholine and N-methylpiperidine, pyridine, substituted pyridines such as trimethyl Pyridine, lutidine and 4-dimethylaminopyridine, and bicyclic amines such as 1,8-diazabicyclo[5.4.0]undec-7-ene and 1,4-diazabicyclo [2.2.2] Octane
在一個尤其較佳實施例中,鹼係選自鹼金屬及鹼土金屬氫氧化物,尤其選自由氫氧化鋰、氫氧化鈉、氫氧化鎂、氫氧化鉀及氫氧化鈣組成之群。In a particularly preferred embodiment, the base is selected from alkali metal and alkaline earth metal hydroxides, especially from the group consisting of lithium hydroxide, sodium hydroxide, magnesium hydroxide, potassium hydroxide and calcium hydroxide.
在另一個尤其較佳實施例中,鹼係選自鹼金屬及鹼土金屬氧化物,尤其選自由氧化鋰、氧化鈉、氧化鈣及氧化鎂組成之群。In another particularly preferred embodiment, the base is selected from alkali metal and alkaline earth metal oxides, especially from the group consisting of lithium oxide, sodium oxide, calcium oxide and magnesium oxide.
在另一個尤其較佳實施例中,鹼係選自鹼金屬及鹼土金屬碳酸鹽,尤其選自由碳酸鋰及碳酸鈣組成之群。In another particularly preferred embodiment, the base is selected from alkali metal and alkaline earth metal carbonates, especially from the group consisting of lithium carbonate and calcium carbonate.
在另一個尤其較佳實施例中,鹼係選自鹼金屬碳酸氫鹽,且較佳為碳酸氫鈉。In another particularly preferred embodiment, the base is selected from alkali metal bicarbonates, and is preferably sodium bicarbonate.
在另一個尤其較佳實施例中,鹼係選自烷基鹼金屬,尤其選自由甲基鋰、丁基鋰及苯基鋰組成之群。In another particularly preferred embodiment, the base is selected from alkali metal alkyls, especially from the group consisting of methyllithium, butyllithium and phenyllithium.
在另一個尤其較佳實施例中,鹼係選自烷基鎂鹵化物,且較佳為氯化異丙基鎂。In another particularly preferred embodiment, the base is selected from alkylmagnesium halides, and preferably isopropylmagnesium chloride.
在另一個尤其較佳實施例中,鹼係選自三甲胺、三乙胺、三異丙基乙胺、正三丁胺及N-甲基哌啶、吡啶、經取代之吡啶,諸如三甲基吡啶、二甲基吡啶及4-二甲胺基吡啶,以及雙環胺。In another particularly preferred embodiment, the base is selected from trimethylamine, triethylamine, triisopropylethylamine, n-tributylamine and N-methylpiperidine, pyridine, substituted pyridines such as trimethyl Pyridine, lutidine and 4-dimethylaminopyridine, and bicyclic amine.
在更尤其較佳實施例中,鹼為正三丁胺或三乙胺。In a more particularly preferred embodiment, the base is n-tributylamine or triethylamine.
鹼通常以等莫耳量使用;然而,其亦可以催化量、過量使用或若適宜,作為溶劑使用。The base is generally used in equimolar amounts; however, it can also be used in catalytic amounts, in excess or, if appropriate, as a solvent.
在一個實施例中,步驟(E)中之水解反應溫度保持在0至120℃之範圍內,較佳在20至85℃之範圍內,更佳在20至60℃之範圍內。In one embodiment, the hydrolysis reaction temperature in step (E) is kept in the range of 0 to 120°C, preferably in the range of 20 to 85°C, more preferably in the range of 20 to 60°C.
在一個實施例中,步驟(E)在無溶劑存在下進行。In one embodiment, step (E) is performed in the absence of solvent.
在另一個實施例中,步驟(E)在溶劑中進行。In another embodiment, step (E) is performed in a solvent.
適合之溶劑包括水及脂族烴,諸如己烷、環己烷及石油醚;芳族烴,諸如甲苯、鄰二甲苯、間二甲苯及對二甲苯;鹵化烴,諸如二氯甲烷、氯仿、1,2-二氯乙烷及氯苯;醇,諸如甲醇、乙醇、正丙醇、異丙醇、正丁醇、異丁醇及第三丁醇;C2 -C4 烷二醇,諸如乙二醇或丙二醇;醚烷醇,諸如二乙二醇;酮,諸如丙酮、2-丁酮;羧酸酯,諸如乙酸乙酯;羧醯胺,諸如N-甲基吡咯啶酮;二甲基甲醯胺;及醚,包括開鏈醚及環醚,尤其乙醚、甲基第三丁基醚(MTBE)、2-甲氧基-2-甲基丁烷、環戊基甲基醚、1,4-二噁烷、四氫呋喃及2-甲基四氫呋喃,尤其四氫呋喃、MTBE及2-甲基四氫呋喃。亦可使用該等溶劑之混合物。Suitable solvents include water and aliphatic hydrocarbons such as hexane, cyclohexane, and petroleum ether; aromatic hydrocarbons such as toluene, o-xylene, m-xylene, and p-xylene; halogenated hydrocarbons such as dichloromethane, chloroform, 1,2-Dichloroethane and chlorobenzene; alcohols such as methanol, ethanol, n-propanol, isopropanol, n-butanol, isobutanol and tert-butanol; C2 - C4 alkanediols such as Ethylene glycol or propylene glycol; ether alkanols such as diethylene glycol; ketones such as acetone, 2-butanone; carboxylates such as ethyl acetate; carboxamides such as N-methylpyrrolidone; dimethyl and ethers, including open-chain ethers and cyclic ethers, especially diethyl ether, methyl tertiary butyl ether (MTBE), 2-methoxy-2-methylbutane, cyclopentyl methyl ether, 1,4-Dioxane, tetrahydrofuran and 2-methyltetrahydrofuran, especially tetrahydrofuran, MTBE and 2-methyltetrahydrofuran. Mixtures of such solvents may also be used.
在另一個實施例中,溶劑係選自C1 -C6 醇、水、C2 -C6 烷二醇、羧酸酯、N-甲基吡咯啶酮、二甲基甲醯胺及包括開鏈醚及環醚之醚,或其兩種或更多種之混合物。In another embodiment, the solvent is selected from C 1 -C 6 alcohol, water, C 2 -C 6 alkanediol, carboxylate, N-methylpyrrolidone, dimethylformamide and Ethers of chain ethers and cyclic ethers, or mixtures of two or more thereof.
在另一個實施例中,溶劑係選自水、二甲基甲醯胺、N-甲基吡咯啶酮、甲基第三丁基醚、甲醇、乙醇、異丙醇或其兩種或更多種之混合物。In another embodiment, the solvent is selected from water, dimethylformamide, N-methylpyrrolidone, methyl tertiary butyl ether, methanol, ethanol, isopropanol or two or more thereof mixture of species.
較佳溶劑為質子性溶劑,較佳選自由諸如甲醇、乙醇、正丙醇、異丙醇、正丁醇及第三丁醇組成之群的醇。Preferred solvents are protic solvents, preferably alcohols selected from the group consisting of methanol, ethanol, n-propanol, isopropanol, n-butanol and tert-butanol.
在一個較佳實施例中,溶劑為C1 -C4 醇,尤其乙醇。In a preferred embodiment, the solvent is C 1 -C 4 alcohol, especially ethanol.
在一個實施例中,式VII化合物與溶劑之體積比在1:30至1:0之範圍內。In one embodiment, the volume ratio of the compound of formula VII to the solvent is in the range of 1:30 to 1:0.
在另一個實施例中,式VII化合物與溶劑之體積比在1:20至1:5之範圍內。In another embodiment, the volume ratio of the compound of formula VII to the solvent is in the range of 1:20 to 1:5.
在一個較佳實施例中,式VII化合物與溶劑之體積比在1:20至1:10之範圍內。In a preferred embodiment, the volume ratio of the compound of formula VII to the solvent is in the range of 1:20 to 1:10.
在下文中,提供關於本發明之步驟(F)的較佳實施例。應理解,上述較佳實施例及仍將在下文本發明之步驟(F)中說明的較佳實施例應理解為較佳單獨或彼此組合。Hereinafter, preferred examples concerning step (F) of the present invention are provided. It should be understood that the above-mentioned preferred embodiments and the preferred embodiments still to be described in step (F) of the present invention below should be understood as being preferably alone or in combination with each other.
在一個實施例中,LG為ORu ;In one embodiment, LG is OR u ;
在另一個實施例中,LG為SRu ;In another embodiment, LG is SRu ;
在一個實施例中,Ru 為未經取代之C1 -C6 烷基;In one embodiment, R u is unsubstituted C 1 -C 6 alkyl;
在另一個實施例中,Ru 為經鹵素取代之C1 -C6 烷基;In another embodiment, R u is C 1 -C 6 alkyl substituted with halogen;
在另一個實施例中,Ru 為未經取代之芳基;In another embodiment, R u is unsubstituted aryl;
在另一個實施例中,Ru 為經鹵素取代之芳基;In another embodiment, R is aryl substituted with halogen;
在一個實施例中,步驟(F)中之反應溫度保持在20至130℃之範圍內,較佳在20至100℃之範圍內,更佳在70至100℃之範圍內。In one embodiment, the reaction temperature in step (F) is kept in the range of 20 to 130°C, preferably in the range of 20 to 100°C, more preferably in the range of 70 to 100°C.
在一個實施例中,步驟(F)在無溶劑存在下進行。In one embodiment, step (F) is performed in the absence of solvent.
在另一個實施例中,步驟(F)在溶劑中進行。In another embodiment, step (F) is performed in a solvent.
適合之溶劑包括脂族烴,諸如己烷、庚烷、環己烷及石油醚;芳族烴,諸如甲苯、鄰二甲苯、間二甲苯及對二甲苯;鹵化烴,諸如二氯甲烷、氯仿、1,2-二氯乙烷及氯苯;醇,諸如甲醇、乙醇、正丙醇、異丙醇、正丁醇及第三丁醇;C2 -C4 烷二醇,諸如乙二醇或丙二醇;酮,諸如丙酮或2-丁酮;醚烷醇,諸如二乙二醇;羧酸酯,諸如乙酸乙酯;N-甲基吡咯啶酮;二甲基甲醯胺;及醚,包括開鏈醚及環醚,尤其乙醚、甲基第三丁基醚(MTBE)、2-甲氧基-2-甲基丁烷、環戊基甲基醚、1,4-二噁烷、四氫呋喃及2-甲基四氫呋喃,尤其四氫呋喃、MTBE及2-甲基四氫呋喃。亦可使用該等溶劑之混合物。Suitable solvents include aliphatic hydrocarbons such as hexane, heptane, cyclohexane, and petroleum ether; aromatic hydrocarbons such as toluene, o-xylene, m-xylene, and p-xylene; halogenated hydrocarbons such as methylene chloride, chloroform , 1,2-dichloroethane and chlorobenzene; alcohols such as methanol, ethanol, n-propanol, isopropanol, n-butanol and tert-butanol; C 2 -C 4 alkanediols such as ethylene glycol or propylene glycol; ketones, such as acetone or 2-butanone; ether alkanols, such as diethylene glycol; carboxylates, such as ethyl acetate; N-methylpyrrolidone; dimethylformamide; and ethers, Including open-chain ethers and cyclic ethers, especially diethyl ether, methyl tertiary butyl ether (MTBE), 2-methoxy-2-methylbutane, cyclopentyl methyl ether, 1,4-dioxane, Tetrahydrofuran and 2-methyltetrahydrofuran, especially tetrahydrofuran, MTBE and 2-methyltetrahydrofuran. Mixtures of such solvents may also be used.
在另一個實施例中,溶劑係選自二甲基甲醯胺、N-甲基吡咯啶酮、甲苯、二甲苯、單氯苯或其兩種或更多種之混合物。In another embodiment, the solvent is selected from dimethylformamide, N-methylpyrrolidone, toluene, xylene, monochlorobenzene or a mixture of two or more thereof.
較佳溶劑為芳族烴,較佳甲苯、鄰二甲苯、間二甲苯及對二甲苯、單氯苯。在一個較佳實施例中,溶劑為甲苯。Preferred solvents are aromatic hydrocarbons, preferably toluene, o-xylene, m-xylene and p-xylene, and monochlorobenzene. In a preferred embodiment, the solvent is toluene.
在一個實施例中,反應物與溶劑之體積比在1:40至1:0之範圍內。In one embodiment, the volume ratio of reactants to solvent is in the range of 1:40 to 1:0.
在另一個實施例中,反應物與溶劑之體積比在1:40至1:5之範圍內。In another embodiment, the volume ratio of reactants to solvent is in the range of 1:40 to 1:5.
在一個較佳實施例中,反應物與溶劑之體積比在1:30至1:10之範圍內。In a preferred embodiment, the volume ratio of the reactant to the solvent is in the range of 1:30 to 1:10.
在一個較佳實施例中,反應物與溶劑之體積比在1:20至1:10、較佳1:5之範圍內。In a preferred embodiment, the volume ratio of the reactant to the solvent is in the range of 1:20 to 1:10, preferably 1:5.
在一個較佳實施例中,藉由步驟(F)獲得之式X化合物的對映異構體過量>95%。In a preferred embodiment, the enantiomeric excess of the compound of formula X obtained by step (F) is >95%.
在本發明之另一個實施例中,用於製備具有以下如式X-R中之立體化學的式X化合物的方法,或用於製備具有對映異構體過量R-對映異構體(亦即化合物X-R)之式X化合物的方法, 其中Het、R1 及R2 係如本文所定義; 包含至少以下步驟, (A) 使式III化合物, 其中Het及W係如本文所定義; 與M2 ORAC 反應,其中M2 及RAC 係如本文所定義; 以獲得式IV化合物, 其中Het及RAC 係如本文所定義; (B) 在酸或鹼存在下水解如本文所定義之式IV化合物,以獲得式V化合物, 其中Het係如式IV化合物中所定義; (C) 使式V化合物與X1 SO2 NH2 反應,其中X1 為鹵素; 以獲得式VI化合物, 其中Het係如式V化合物中所定義。 (D) 式VI化合物 在氫化催化劑MXLnCp*,其中M為銠、釕、銥、鈀、鐵、鉑或鎳, 及選自以下之氫源存在下氫化:a)氫氣;b) N(R)3 與HCOOH之混合物,其中R為H或C1 -C6 烷基;c) HCOONa或HCOOK;d) C1 -C8 醇及t-BuOK、t-BuONa或t-BuOLi之混合物;及e) a)至d)中之兩者或更多者之組合; 以獲得具有以下如式VII-R中之立體化學的式VII化合物, 其中Het如式VI化合物中所定義; (E) 使式VII-R化合物與R1 NCS在鹼存在下反應,其中R1 係如本文所定義, 以獲得具有以下如式VIII-R中之立體化學的式VIII化合物, 其中Het及R1 係如式VII-R化合物中所定義; (D) 使式VIII-R化合物與式IX化合物反應, 其中LG及R2 係如本文所定義, 以獲得式X-R化合物。In another embodiment of the present invention, the process for the preparation of a compound of formula X having the following stereochemistry as in formula XR, or for the preparation of the R-enantiomer with enantiomeric excess (i.e. Compound XR) the method of the compound of formula X, Wherein Het, R 1 and R 2 are as defined herein; comprising at least the following steps, (A) making the compound of formula III, wherein Het and W are as defined herein; reacting with M 2 OR AC , wherein M 2 and R AC are as defined herein; to obtain a compound of formula IV, wherein Het and R AC are as defined herein; (B) hydrolyzing a compound of formula IV as defined herein in the presence of an acid or base to obtain a compound of formula V, wherein Het is as defined in the compound of formula IV; (C) reacting the compound of formula V with X 1 SO 2 NH 2 , wherein X 1 is halogen; to obtain the compound of formula VI, wherein Het is as defined in the compound of formula V. (D) formula VI compound is in hydrogenation catalyst MXLnCp*, wherein M is rhodium, ruthenium, iridium, palladium, iron, platinum or nickel, and hydrogenation in the presence of a hydrogen source selected from the following: a) hydrogen; b) a mixture of N(R) 3 and HCOOH, wherein R is H or C 1 -C 6 alkyl; c) HCOONa or HCOOK; d) C 1 -C Alcohol and the mixture of t-BuOK, t-BuONa or t- BuOLi ; and e) a) to d) in the combination of two or more; chemical compound of formula VII, wherein Het is as defined in the compound of formula VI; (E) reacting the compound of formula VII-R with R 1 NCS in the presence of a base, wherein R 1 is as defined herein, to obtain the following stereo as in formula VIII-R chemical compound of formula VIII, wherein Het and R are as defined in the compound of formula VII-R; (D) reacting the compound of formula VIII-R with the compound of formula IX, wherein LG and R are as defined herein to obtain compounds of formula XR.
實例 : 表徵可藉由耦聯的高效液相層析/質譜分析(HPLC/MS)、氣相層析(GC)、藉由NMR或藉由其熔點來進行。 HPLC方法:Agilent Eclipse Plus C18, 150mmx4.6mm IDx5um 梯度A=0.1% TFA/水,B= 0.1% TFA/乙腈。 流速= 1.4 ml/min.,管柱烘箱溫度= 30℃ 梯度程式= 10% B - 100% B - 5min,保持2min,3min - 10% B。 運行時間 = 10 min LCMS方法1:C18管柱(50 mm×3.0 mm× 3µ) 梯度A= 10 Mm甲酸銨/水,B= 0.1%甲酸/乙腈 流速= 1.2 ml/min.,管柱烘箱溫度= 40℃ 梯度程式= 在1.5 min內10% B至100% B,保持1 min 100% B,1 min - 10% B 運行時間:3.75 min 對掌性HPLC方法1:ChiralPak IA管柱,150 mm×4.6 mm× 5µ 移動相A=庚烷,B=異丙醇, 流速= 1.0 ml/min,管柱烘箱溫度= 40℃ 梯度程式= 10% B等度;運行時間:20 min 對掌性HPLC方法3:ChiralPak IA管柱,150 mm×4.6 mm× 5µ 移動相A=庚烷,B=異丙醇, 流速= 1.0 ml/min,管柱烘箱溫度= 40℃ 梯度程式= 40% B等度;運行時間:20 min1 H-NMR:信號係藉由相對於四甲基矽烷之化學位移(ppm)、其多重性及其積分(給定的相對氫原子數)表徵。以下縮寫用於表徵信號之多重性:m = 多重峰,q = 四重峰,t = 三重峰,d = 二重峰且s = 單峰。 Example : Characterization can be performed by coupled high performance liquid chromatography/mass spectrometry (HPLC/MS), gas chromatography (GC), by NMR or by its melting point. HPLC method: Agilent Eclipse Plus C18, 150mmx4.6mm IDx5um gradient A=0.1% TFA/water, B=0.1% TFA/acetonitrile. Flow rate = 1.4 ml/min., Column oven temperature = 30°C Gradient program = 10% B - 100% B - 5min, hold 2min, 3min - 10% B. Run time = 10 min LCMS method 1: C18 column (50 mm × 3.0 mm × 3µ) Gradient A = 10 Mm ammonium formate/water, B = 0.1% formic acid/acetonitrile Flow rate = 1.2 ml/min., column oven temperature = 40°C Gradient program = 10% B to 100% B in 1.5 min, hold 1 min 100% B, 1 min - 10% B Run time: 3.75 min Chiral HPLC method 1: ChiralPak IA column, 150 mm ×4.6 mm× 5µ Mobile phase A=heptane, B=isopropanol, flow rate=1.0 ml/min, column oven temperature=40℃, gradient program=10% B isocratic; running time: 20 min for chiral HPLC Method 3: ChiralPak IA column, 150 mm×4.6 mm×5µ mobile phase A=heptane, B=isopropanol, flow rate=1.0 ml/min, column oven temperature=40℃, gradient program=40% B isocratic ; run time: 20 min 1 H-NMR: signal is characterized by chemical shift (ppm) relative to tetramethylsilane, its multiplicity and its integral (given relative number of hydrogen atoms). The following abbreviations are used to characterize the multiplicity of signals: m = multiplet, q = quartet, t = triplet, d = doublet and s = singlet.
使用的縮寫為:h表示小時,min表示分鐘,rt表示滯留時間且環境溫度表示20-25℃。The abbreviations used are: h for hours, min for minutes, rt for residence time and ambient temperature for 20-25°C.
本發明現藉由以下實例進一步詳細描述,而不對其強加任何限制。The present invention is now described in further detail by the following examples without imposing any limitation thereon.
藉由適當修飾起始物質,可使用以下實例中所描述之程序獲得其他式V、VI、VII、VIII或X化合物。By appropriate modification of the starting materials, other compounds of formula V, VI, VII, VIII or X can be obtained using the procedures described in the Examples below.
實例1:製備(3R)-3-(2-氯噻唑-5-基)-8-甲基-7-側氧基-6-苯基-2,3-二氫噻唑并[3,2-a]嘧啶-4-鎓-5-醇鹽: 步驟1:製備2-氯-N-甲氧基-N-甲基-乙醯胺:Example 1: Preparation of (3R)-3-(2-chlorothiazol-5-yl)-8-methyl-7-oxo-6-phenyl-2,3-dihydrothiazolo[3,2- a] pyrimidin-4-ium-5-alcohol salt: Step 1: Preparation of 2-chloro-N-methoxy-N-methyl-acetamide:
向配備有鐵氟龍(Teflon)葉片攪拌器、回流冷凝器及熱袋之3 L四頸燒瓶中饋入N-甲氧基甲胺鹽酸鹽(345 g)、水(1.6公升),且將所得反應混合物冷卻至0至-5℃。隨後將碳酸鉀(1466 g)分批添加至上述反應混合物中,隨後添加甲基第三丁基醚(1.4公升)。將氯乙醯氯(400 g)溶解於第三丁基甲基醚(0.2公升)中且在-5℃至0℃下逐滴添加至上述保持的反應混合物中,並將反應混合物在0℃下攪拌2小時。使反應混合物達到環境溫度且分離兩相。將有機層經硫酸鈉乾燥,過濾且蒸發,得到呈白色固體狀之2-氯-N-甲氧基-N-甲基-乙醯胺(440 g,90%產率,HPLC純度為98.0面積%)。N-methoxymethylamine hydrochloride (345 g), water (1.6 liters), and The resulting reaction mixture was cooled to 0 to -5°C. Potassium carbonate (1466 g) was then added portionwise to the above reaction mixture, followed by methyl tert-butyl ether (1.4 L). Chloroacetyl chloride (400 g) was dissolved in tert-butyl methyl ether (0.2 L) and added dropwise to the above kept reaction mixture at -5°C to 0°C, and the reaction mixture was stirred at 0°C 2 hours. The reaction mixture was allowed to reach ambient temperature and the two phases were separated. The organic layer was dried over sodium sulfate, filtered and evaporated to give 2-chloro-N-methoxy-N-methyl-acetamide as a white solid (440 g, 90% yield, HPLC purity 98.0 area %).
步驟2:製備2-氯-1-(2-氯噻唑-5-基)乙烯酮: 向配備有鐵氟龍葉片攪拌器、回流冷凝器及熱袋之5 L四頸燒瓶中饋入2-氯噻唑(250 g)、THF (0.75 L),且將所得反應混合物冷卻至0至-5℃。隨後在0至-5℃下經0.5小時將異丙基氯化鎂氯化鋰(1.929 L,1.3 M THF溶液)添加至上述保持的反應混合物中。隨後將反應混合物加熱至40℃且在40℃下繼續反應2小時。藉由用碘淬滅反應混合物之少量等分試樣且藉由GC分析監測2-氯-5-碘-噻唑之形成(藉由GC分析觀察到96%轉化率)來確認氯-(2-氯噻唑-5-基)鎂物種的形成。將反應混合物冷卻至0至-5℃,且逐滴添加2-氯-N-甲氧基-N-甲基-乙醯胺(343 g)於THF (0.25 L)中之溶液。在-5至0℃下繼續反應1小時,且藉由HPLC監測反應進程。將反應混合物在-5至0℃下用1.5 N HCl水溶液(1 L)淬滅且隨後升溫至環境溫度。分離兩相且用甲基第三丁基醚(2 × 300 mL)萃取水相。合併之有機層經硫酸鈉乾燥,過濾且蒸發,獲得粗殘餘物。在環境溫度下將粗產物溶解於甲基第三丁基醚(0.7 L)中,且添加活性炭(4 g)及二氧化矽(80 g,60-120目)。將漿液攪拌0.5小時,經由布赫納漏斗(Buchner funnel)過濾且用甲基第三丁基醚(0.3 L)洗滌。蒸發濾液,獲得呈淺棕色油狀之2-氯-1-(2-氯噻唑-5-基)乙酮(409 g,HPLC純度為46面積%)Step 2: Preparation of 2-chloro-1-(2-chlorothiazol-5-yl)ketene: Into a 5 L four-necked flask equipped with a Teflon blade stirrer, reflux condenser, and heat pack was fed 2-chlorothiazole (250 g), THF (0.75 L), and the resulting reaction mixture was cooled to 0 to - 5°C. Lithium chloride isopropylmagnesium chloride (1.929 L, 1.3 M in THF) was then added to the above held reaction mixture at 0 to -5 °C over 0.5 h. The reaction mixture was then heated to 40°C and the reaction was continued at 40°C for 2 hours. Chloro-(2-chloro-(2- Formation of chlorothiazol-5-yl)magnesium species. The reaction mixture was cooled to 0 to -5 °C, and a solution of 2-chloro-N-methoxy-N-methyl-acetamide (343 g) in THF (0.25 L) was added dropwise. The reaction was continued for 1 hour at -5 to 0°C, and the progress of the reaction was monitored by HPLC. The reaction mixture was quenched with 1.5 N aqueous HCl (1 L) at -5 to 0 °C and then warmed to ambient temperature. The two phases were separated and the aqueous phase was extracted with methyl tert-butyl ether (2 x 300 mL). The combined organic layers were dried over sodium sulfate, filtered and evaporated to give a crude residue. The crude product was dissolved in methyl tert-butyl ether (0.7 L) at ambient temperature, and activated carbon (4 g) and silica (80 g, 60-120 mesh) were added. The slurry was stirred for 0.5 h, filtered through a Buchner funnel and washed with methyl tert-butyl ether (0.3 L). Evaporation of the filtrate afforded 2-chloro-1-(2-chlorothiazol-5-yl)ethanone (409 g, HPLC purity 46 area %) as a light brown oil
步驟3:製備乙酸[2-(2-氯噻唑-5-基)-2-側氧基-乙基]酯: 在環境溫度下,向配備有鐵氟龍葉片攪拌器、回流冷凝器及熱袋之0.25 L三頸燒瓶中饋入2-氯-1-(2-氯噻唑-5-基)乙酮(15 g,46面積% HPLC純度)及二甲基甲醯胺(45 mL)。隨後將乙酸鈉(12.55 g)分數份添加且在環境溫度下繼續反應4小時。藉由HPLC監測反應進程(藉由HPLC確定轉化率>95%)。將反應物用水(50 mL)淬滅且用甲基第三丁基醚(3×100 mL)萃取。分離兩相,合併之有機相經硫酸鈉乾燥,過濾且蒸發,獲得粗殘餘物(17 g)。藉由矽膠管柱層析純化粗產物,獲得呈黃色固體狀之乙酸[2-(2-氯噻唑-5-基)-2-側氧基-乙基]酯(7.5 g)。Step 3: Preparation of [2-(2-chlorothiazol-5-yl)-2-oxo-ethyl] acetate: At ambient temperature, 2-chloro-1-(2-chlorothiazol-5-yl)ethanone (15 g, 46 area % HPLC purity) and dimethylformamide (45 mL). Sodium acetate (12.55 g) was then added in portions and the reaction was continued for 4 hours at ambient temperature. The progress of the reaction was monitored by HPLC (conversion >95% by HPLC). The reaction was quenched with water (50 mL) and extracted with methyl tert-butyl ether (3 x 100 mL). The two phases were separated and the combined organic phases were dried over sodium sulfate, filtered and evaporated to give a crude residue (17 g). The crude product was purified by silica gel column chromatography to obtain [2-(2-chlorothiazol-5-yl)-2-oxo-ethyl] acetate (7.5 g) as a yellow solid.
步驟4:製備1-(2-氯噻唑-5-基)-2-羥基-乙酮: 向配備有磁性攪拌器、回流冷凝器及熱袋之250 mL三頸燒瓶中饋入乙酸[2-(2-氯噻唑-5-基)-2-側氧基-乙基]酯(7.5 g)及含1 N HCl之MeOH (50 mL)。將所得溶液攪拌5小時且藉由TLC監測反應進程。真空蒸餾反應混合物中之甲醇,且藉由管柱層析純化所得粗殘餘物,獲得呈淺黃色固體狀之1-(2-氯噻唑-5-基)-2-羥基-乙酮(2.8 g,84面積% HPLC純度)。Step 4: Preparation of 1-(2-chlorothiazol-5-yl)-2-hydroxy-ethanone: Feed [2-(2-chlorothiazol-5-yl)-2-oxo-ethyl] acetate (7.5 g ) and 1 N HCl in MeOH (50 mL). The resulting solution was stirred for 5 hours and the progress of the reaction was monitored by TLC. The methanol in the reaction mixture was distilled in vacuo, and the resulting crude residue was purified by column chromatography to obtain 1-(2-chlorothiazol-5-yl)-2-hydroxy-ethanone (2.8 g , 84 area % HPLC purity).
步驟5:製備4-(2-氯噻唑-5-基)-5H-噁噻唑2,2-二氧化物 向配備有磁性攪拌器、回流冷凝器及熱袋之100 mL三頸燒瓶中饋入1-(2-氯噻唑-5-基)-2-羥基-乙酮(1 g)、甲苯(20 mL)、氯磺醯胺(0.975 g)及對甲苯磺酸(0.214 g)。將所得溶液加熱至100℃且攪拌1小時。藉由HPLC監測反應進程(>95%轉化率)。反應混合物用水淬滅且用MTBE (15 mL × 2)萃取。分離兩相,蒸發有機相且藉由管柱層析來純化4-(2-氯噻唑-5-基)-5H-噁噻唑2,2-二氧化物(0.42 g)。Step 5: Preparation of 4-(2-chlorothiazol-5-yl)-5H-oxthiazole 2,2-dioxide 1-(2-chlorothiazol-5-yl)-2-hydroxy-ethanone (1 g), toluene (20 mL ), chlorosulfonamide (0.975 g) and p-toluenesulfonic acid (0.214 g). The resulting solution was heated to 100°C and stirred for 1 hour. Reaction progress (>95% conversion) was monitored by HPLC. The reaction mixture was quenched with water and extracted with MTBE (15 mL x 2). The two phases were separated, the organic phase was evaporated and 4-(2-chlorothiazol-5-yl)-5H-oxthiazole 2,2-dioxide (0.42 g) was purified by column chromatography.
步驟6:製備(4R)-4-(2-氯噻唑-5-基)氧雜噻唑啶2,2-二氧化物a) 製備銠催化劑 - RhCl[(R,R)-TsDPEN]Cp*:Step 6: Preparation of (4R)-4-(2-chlorothiazol-5-yl)oxathiazolidine 2,2-dioxide a) Preparation of rhodium catalyst - RhCl[(R,R)-TsDPEN]Cp*:
在氮氣氛圍下,向配備有鐵氟龍葉片攪拌器、氮氣入口及熱袋之250 mL三頸燒瓶中饋入[RhCl2 Cp*]2 (2.0 g)、(1R, 2R)-N-對甲苯磺醯基-1,2-二苯基乙二胺(2.38 g)、二氯甲烷(68 mL)及三乙胺(1.72 ml)。將所得漿液在22-27℃下攪拌0.5小時,且添加蒸餾水(40 mL)。分離兩相,有機相用水(40 mL)洗滌。有機相經硫酸鈉乾燥,過濾且蒸發,得到棕色固體殘餘物。將棕色殘餘物用正庚烷(20 mL)濕磨,過濾且在氮氣氛圍下乾燥,得到呈紅色固體狀之RhCl [(R, R)-TsDPEN]Cp* (3.4 g)。Under a nitrogen atmosphere, [RhCl 2 Cp*] 2 (2.0 g), (1R, 2R)-N-pair Tosyl-1,2-diphenylethylenediamine (2.38 g), dichloromethane (68 mL) and triethylamine (1.72 ml). The resulting slurry was stirred at 22-27 °C for 0.5 h, and distilled water (40 mL) was added. The two phases were separated and the organic phase was washed with water (40 mL). The organic phase was dried over sodium sulfate, filtered and evaporated to give a brown solid residue. The brown residue was triturated with n-heptane (20 mL), filtered and dried under nitrogen to afford RhCl[(R,R)-TsDPEN]Cp* (3.4 g) as a red solid.
b) 製備HCOOH-NEt3 混合物: 在2公升3頸圓底燒瓶中添加甲酸(275 mL,>= 99% w/w)且冷卻至0℃。在0℃下,向其中緩慢添加三乙胺250 mL,>=99%w/w)且立即用於反應。 b) Preparation of HCOOH-NEt 3 mixture: In a 2 liter 3 neck round bottom flask was added formic acid (275 mL, >= 99% w/w) and cooled to 0 °C. At 0°C, triethylamine 250 mL, >=99% w/w) was slowly added thereto and used for the reaction immediately.
c) 製備(4R)-4-(2-氯噻唑-5-基)氧雜噻唑啶2,2-二氧化物: 向配備有磁性攪拌器、冷凝器及熱袋之100 ml二頸燒瓶中饋入4-(2-氯噻唑-5-基)-5H-噁噻唑2,2-二氧化物(0.5 g)及二甲基甲醯胺(15 mL,30 V),用氮氣脫氣10分鐘。隨後添加RhCl[(R,R)-TsDPEN]Cp* (27 mg),接著逐滴添加HCOOH-NEt3 (2.5 mL,比率為5:2)。將所得混合物攪拌2小時。HPLC顯示>97%轉化率。將反應混合物用水(15 ml)淬滅且用甲基第三丁基醚(3×50 mL)萃取。蒸發合併之有機相,獲得(4R)-4-(2-氯噻唑-5-基)氧雜噻唑啶2,2-二氧化物(500 mg;90面積% HPLC純度(rt= 3.645 min.),>99% ee,對掌性HPLC方法1)。 c) Preparation of (4R)-4-(2-chlorothiazol-5-yl)oxathiazolidine 2,2-dioxide: Into a 100 ml two-necked flask equipped with a magnetic stirrer, condenser and heat pack Feed in 4-(2-chlorothiazol-5-yl)-5H-oxathiazole 2,2-dioxide (0.5 g) and dimethylformamide (15 mL, 30 V), degas with nitrogen for 10 minute. RhCl[(R,R)-TsDPEN]Cp* (27 mg) was then added followed by HCOOH-NEt 3 (2.5 mL, ratio 5:2) dropwise. The resulting mixture was stirred for 2 hours. HPLC showed >97% conversion. The reaction mixture was quenched with water (15 ml) and extracted with methyl tert-butyl ether (3 x 50 mL). The combined organic phases were evaporated to obtain (4R)-4-(2-chlorothiazol-5-yl)oxathiazolidine 2,2-dioxide (500 mg; 90 area % HPLC purity (rt=3.645 min.) , >99% ee, for chiral HPLC method 1).
步驟7:製備(4R)-4-(2-氯噻唑-5-基)-N-甲基-噻唑啶-2-亞胺 在環境溫度下,向配備有磁性攪拌器、回流冷凝器及熱袋之100 mL三頸燒瓶中饋入(4R)-4-(2-氯噻唑-5-基)氧雜噻唑啶2,2-二氧化物(0.5 g,99% ee)、乙醇(2 ml)、異硫氰酸甲酯(0.228 g)及三乙胺(0.56 ml)。將所得混合物在22-27℃下攪拌14小時。隨後真空移除有機揮發物,且將氫氧化鈉(0.2 g)及水(2 mL)添加至反應燒瓶中。將反應混合物加熱至100℃且攪拌2小時。將反應物用水(2 mL)稀釋且用甲基第三丁基醚(2 × 50 mL)萃取。有機相經硫酸鈉乾燥且真空蒸發,得到呈棕色油狀之(4R)-4-(2-氯噻唑-5-基)-N-甲基-噻唑啶-2-亞胺[0.34 g,m/z = 234 amu (M+H+ )]。Step 7: Preparation of (4R)-4-(2-Chlorothiazol-5-yl)-N-methyl-thiazolidine-2-imine (4R)-4-(2-chlorothiazol-5-yl)oxathiazolidine 2,2-dioxide (0.5 g, 99% ee), ethanol (2 ml ), methyl isothiocyanate (0.228 g) and triethylamine (0.56 ml). The resulting mixture was stirred at 22-27°C for 14 hours. Organic volatiles were then removed in vacuo, and sodium hydroxide (0.2 g) and water (2 mL) were added to the reaction flask. The reaction mixture was heated to 100 °C and stirred for 2 hours. The reaction was diluted with water (2 mL) and extracted with methyl tert-butyl ether (2 x 50 mL). The organic phase was dried over sodium sulfate and evaporated in vacuo to give (4R)-4-(2-chlorothiazol-5-yl)-N-methyl-thiazolidine-2-imine as a brown oil [0.34 g, m /z = 234 amu (M+H + )].
步驟8:製備(3R)-3-(2-氯噻唑-5-基)-8-甲基-7-側氧基-6-苯基-2,3-二氫噻唑并[3,2-a]嘧啶-4-鎓-5-醇鹽: 在氮氣氛圍下,向配備有磁性攪拌器、回流冷凝器及熱袋之50 mL三頸燒瓶中饋入(E,4R)-4-(2-氯噻唑-5-基)-N-甲基-噻唑啶-2-亞胺(0.34 g)、甲苯(2 mL)且加熱至110℃。隨後將2-苯基丙二酸雙(2,4,6-三氯苯基)酯(0.857 g)分批添加至保持在110℃下之反應物料中。在110℃下攪拌2小時後,HPLC顯示>99%之轉化率。將反應物冷卻至50℃以下,經由燒結漏斗過濾沈澱的淺黃色固體,隨後用甲基第三丁基醚(4 mL)洗滌固體殘餘物且真空乾燥,得到(3R)-3-(2-氯噻唑-5-基)-8-甲基-7-側氧基-6-苯基-2,3-二氫噻唑并[3,2-a]嘧啶-4-鎓-5-醇鹽(110 mg, m/z = 378 amu (M+H+ )及95.2%對映異構體過量,對掌性HPLC方法3)。1 H NMR (300 MHz, DMSO-d6): 3.42(s, 3H), 3.94(d, J= 12 Hz, 1H), 4.25-4.32(m, 1H), 6.48 (d, J=8.1 Hz, 1H), 7.06-7.11(m, 1H), 7.21-7.26(m, 2H), 7.6(d, J= 7.5 Hz, 1H), 7.96(s, 1H)。Step 8: Preparation of (3R)-3-(2-chlorothiazol-5-yl)-8-methyl-7-oxo-6-phenyl-2,3-dihydrothiazolo[3,2- a] Pyrimidin-4-ium-5-alkoxide: Under nitrogen atmosphere, feed (E,4R)-4-(2 -chlorothiazol-5-yl)-N-methyl-thiazolidine-2-imine (0.34 g), toluene (2 mL) and heated to 110 °C. Bis(2,4,6-trichlorophenyl)-2-phenylmalonate (0.857 g) was then added in portions to the reaction mass kept at 110°C. After stirring at 110°C for 2 hours, HPLC showed >99% conversion. The reaction was cooled below 50 °C, the precipitated light yellow solid was filtered through a sintered funnel, and the solid residue was washed with methyl tert-butyl ether (4 mL) and dried in vacuo to give (3R)-3-(2- Chlorothiazol-5-yl)-8-methyl-7-oxo-6-phenyl-2,3-dihydrothiazolo[3,2-a]pyrimidin-4-ium-5-alcohol salt ( 110 mg, m/z = 378 amu (M+H + ) and 95.2% enantiomeric excess, chiral HPLC method 3). 1 H NMR (300 MHz, DMSO-d6): 3.42(s, 3H), 3.94(d, J=12 Hz, 1H), 4.25-4.32(m, 1H), 6.48 (d, J=8.1 Hz, 1H ), 7.06-7.11(m, 1H), 7.21-7.26(m, 2H), 7.6(d, J= 7.5 Hz, 1H), 7.96(s, 1H).
實例2:製備(3R)-3-(2-氯噻唑-5-基)-8-甲基-7-側氧基-6-苯基-2,3-二氫噻唑并[3,2-a]嘧啶-4-鎓-5-醇鹽: 步驟1:製備(4R)-4-(2-氯噻唑-5-基)氧雜噻唑啶2,2-二氧化物Example 2: Preparation of (3R)-3-(2-chlorothiazol-5-yl)-8-methyl-7-oxo-6-phenyl-2,3-dihydrothiazolo[3,2- a] pyrimidin-4-ium-5-alcohol salt: Step 1: Preparation of (4R)-4-(2-chlorothiazol-5-yl)oxathiazolidine 2,2-dioxide
a) 製備HCOOH-NEt3 混合物:如實例1之步驟4中所述製備。a) Preparation of HCOOH-NEt 3 mixture: Prepared as described in step 4 of Example 1.
b) 製備(4R)-4-(2-氯噻唑-5-基)氧雜噻唑啶2,2-二氧化物: 向1 L 3頸圓底燒瓶中饋入4-(2-氯噻唑-5-基)-5H-噁噻唑2,2-二氧化物(50 g)、二甲基甲醯胺(100 ml)、甲苯(100 ml)且用氮氣脫氣10分鐘。隨後,在氮氣氛圍下,在環境溫度下添加氯化五甲基環戊二烯基銠二聚體(120 mg)及(1R, 2R)-N-對甲苯磺醯基-1,2-二苯基乙二胺(136 mg)。將所得混合物冷卻至0至5℃,添加新製備之HCOOH-NEt3 (12 mL,比率為1.1:1)且攪拌2小時。反應物藉由HPLC監測,用水(100 mL)淬滅且用甲苯(200 mL)萃取。合併之有機相用水(3 × 20 ml)洗滌且蒸發,獲得(4R)-4-(2-氯噻唑-5-基)氧雜噻唑啶2,2-二氧化物(49 g,98% ee,對掌性HPLC方法1)。b) Preparation of (4R)-4-(2-chlorothiazol-5-yl)oxathiazolidine 2,2-dioxide: Into a 1 L 3-neck round bottom flask was charged 4-(2-chlorothiazol- 5-yl)-5H-oxthiazole 2,2-dioxide (50 g), dimethylformamide (100 ml), toluene (100 ml) and degassed with nitrogen for 10 minutes. Subsequently, pentamethylcyclopentadienyl rhodium chloride dimer (120 mg) and (1R,2R)-N-p-toluenesulfonyl-1,2-di Phenylethylenediamine (136 mg). The resulting mixture was cooled to 0-5 °C, freshly prepared HCOOH- NEt3 (12 mL, ratio 1.1:1) was added and stirred for 2 h. The reaction was monitored by HPLC, quenched with water (100 mL) and extracted with toluene (200 mL). The combined organic phases were washed with water (3 x 20 ml) and evaporated to give (4R)-4-(2-chlorothiazol-5-yl)oxathiazolidine 2,2-dioxide (49 g, 98% ee , for chiral HPLC method 1).
步驟2:製備(4R)-4-(2-氯噻唑-5-基)-N-甲基-噻唑啶-2-亞胺 在環境溫度下,向配備有磁性攪拌器、回流冷凝器及熱袋之1 L三頸燒瓶中饋入(4R)-4-(2-氯噻唑-5-基)氧雜噻唑啶2,2-二氧化物(49 g,98% ee)、乙醇(196 ml)、異硫氰酸甲酯(22.5 g)及三乙胺(56 ml)。將所得混合物在22-27℃下攪拌14小時。隨後真空移除有機揮發物,且將氫氧化鈉(0.2 g)及水(2 mL)添加至反應燒瓶中。將反應混合物加熱至70℃且攪拌2小時。反應物用水(2 mL)稀釋且用甲苯(2 × 500 mL)萃取。有機相經硫酸鈉乾燥且真空蒸發,得到呈棕色油狀之(4R)-4-(2-氯噻唑-5-基)-N-甲基-噻唑啶-2-亞胺[44.7 g,m/z = 234 amu (M+H+ )]。Step 2: Preparation of (4R)-4-(2-chlorothiazol-5-yl)-N-methyl-thiazolidine-2-imine at ambient temperature, (4R)-4-(2-chlorothiazol-5-yl)oxathiazolidine 2,2-dioxide (49 g, 98% ee), ethanol (196 ml ), methyl isothiocyanate (22.5 g) and triethylamine (56 ml). The resulting mixture was stirred at 22-27°C for 14 hours. Organic volatiles were then removed in vacuo, and sodium hydroxide (0.2 g) and water (2 mL) were added to the reaction flask. The reaction mixture was heated to 70 °C and stirred for 2 hours. The reaction was diluted with water (2 mL) and extracted with toluene (2 x 500 mL). The organic phase was dried over sodium sulfate and evaporated in vacuo to give (4R)-4-(2-chlorothiazol-5-yl)-N-methyl-thiazolidine-2-imine as a brown oil [44.7 g, m /z = 234 amu (M+H + )].
步驟3:製備(3R)-3-(2-氯噻唑-5-基)-8-甲基-7-側氧基-6-苯基-2,3-二氫噻唑并[3,2-a]嘧啶-4-鎓-5-醇鹽: 在氮氣氛圍下,向配備有磁性攪拌器、回流冷凝器及熱袋之500 mL三頸燒瓶中饋入(E,4R)-4-(2-氯噻唑-5-基)-N-甲基-噻唑啶-2-亞胺(35 g)、甲苯(70 mL)且加熱至80℃。隨後在45℃下將2-苯基丙二酸雙(4-氯苯基)酯(60 g)溶解於甲苯(70 ml)中,且逐滴添加至保持在80℃下之反應物料中。在100℃下攪拌1小時後,HPLC顯示>99%之轉化率。將反應物冷卻至50℃以下,過濾沈澱的淺黃色固體,用甲苯(3 × 70 mL)洗滌且真空乾燥,得到(3R)-3-(2-氯噻唑-5-基)-8-甲基-7-側氧基-6-苯基-2,3-二氫噻唑并[3,2-a]嘧啶-4-鎓-5-醇鹽作為第1批(29 g,m/z = 378 amu (M+H+ )及99%對映異構體過量,對掌性HPLC方法3);將合併之母液轉移至反應器中,添加丙酮(105 ml)且在22-27℃下攪拌1小時。過濾沈澱的淺黃色固體且用甲苯(70 ml × 3)洗滌,獲得(3R)-3-(2-氯噻唑-5-基)-8-甲基-7-側氧基-6-苯基-2,3-二氫噻唑并[3,2-a]嘧啶-4-鎓-5-醇鹽作為第2批(13 g,99面積% HPLC純度及98.7%對映異構體過量,對掌性HPLC方法3)。Step 3: Preparation of (3R)-3-(2-chlorothiazol-5-yl)-8-methyl-7-oxo-6-phenyl-2,3-dihydrothiazolo[3,2- a] Pyrimidin-4-ium-5-alkoxide: Under nitrogen atmosphere, feed (E,4R)-4-(2 -chlorothiazol-5-yl)-N-methyl-thiazolidine-2-imine (35 g), toluene (70 mL) and heated to 80 °C. Bis(4-chlorophenyl) 2-phenylmalonate (60 g) was then dissolved in toluene (70 ml) at 45°C and added dropwise to the reaction mass kept at 80°C. After stirring at 100°C for 1 hour, HPLC showed >99% conversion. The reaction was cooled below 50 °C, the precipitated pale yellow solid was filtered, washed with toluene (3 x 70 mL) and dried in vacuo to afford (3R)-3-(2-chlorothiazol-5-yl)-8-methanol yl-7-oxo-6-phenyl-2,3-dihydrothiazolo[3,2-a]pyrimidin-4-ium-5-alkoxide as batch 1 (29 g, m/z = 378 amu (M+H + ) and 99% enantiomeric excess, chiral HPLC method 3); the combined mother liquors were transferred to a reactor, acetone (105 ml) was added and stirred at 22-27°C 1 hour. The precipitated pale yellow solid was filtered and washed with toluene (70 ml x 3) to afford (3R)-3-(2-chlorothiazol-5-yl)-8-methyl-7-oxo-6-phenyl -2,3-dihydrothiazolo[3,2-a]pyrimidin-4-ium-5-alkoxide as batch 2 (13 g, 99 area % HPLC purity and 98.7% enantiomeric excess, for Chiral HPLC Method 3).
Claims (15)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW107134482A TWI780230B (en) | 2018-09-28 | 2018-09-28 | Process for preparing s-containing pyrimidinium compounds |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW107134482A TWI780230B (en) | 2018-09-28 | 2018-09-28 | Process for preparing s-containing pyrimidinium compounds |
Publications (2)
Publication Number | Publication Date |
---|---|
TW202012416A TW202012416A (en) | 2020-04-01 |
TWI780230B true TWI780230B (en) | 2022-10-11 |
Family
ID=71130532
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW107134482A TWI780230B (en) | 2018-09-28 | 2018-09-28 | Process for preparing s-containing pyrimidinium compounds |
Country Status (1)
Country | Link |
---|---|
TW (1) | TWI780230B (en) |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2014134341A1 (en) * | 2013-03-01 | 2014-09-04 | Amgen Inc. | Perfluorinated 5,6-dihydro-4h-1,3-oxazin-2-amine compounds as beta-secretase inhibitors and methods of use |
CN105121441A (en) * | 2013-04-11 | 2015-12-02 | 巴斯夫欧洲公司 | Substituted pyrimidinium compounds and derivatives for combating animal pests |
-
2018
- 2018-09-28 TW TW107134482A patent/TWI780230B/en active
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2014134341A1 (en) * | 2013-03-01 | 2014-09-04 | Amgen Inc. | Perfluorinated 5,6-dihydro-4h-1,3-oxazin-2-amine compounds as beta-secretase inhibitors and methods of use |
CN105121441A (en) * | 2013-04-11 | 2015-12-02 | 巴斯夫欧洲公司 | Substituted pyrimidinium compounds and derivatives for combating animal pests |
Also Published As
Publication number | Publication date |
---|---|
TW202012416A (en) | 2020-04-01 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
CN110621677B (en) | Process for preparing chiral 2, 3-dihydrothiazolo [3,2-A ] pyrimidin-4-ium compounds | |
CN110546153B (en) | Process for preparing optically active 2, 3-dihydrothiazolo [3,2-A ] pyrimidin-4-ium compounds | |
IL278754B2 (en) | A novel process for the preparation of anthranilic diamides | |
TWI780230B (en) | Process for preparing s-containing pyrimidinium compounds | |
TWI797167B (en) | Process for preparing an optically active pyrimidinium compounds | |
EP3823953B1 (en) | A novel process for the preparation of anthranilic diamides | |
EP2496560B1 (en) | Process for preparing 1,3-disubstituted pyrazole compounds | |
JP2016520539A (en) | Process for the preparation of sulfimines and their in-situ conversion to N- (2-amino-benzoyl) -sulfimines | |
JP2016522234A (en) | Method for producing pyridylpyrazole compounds and derivatives thereof from pyridylhydrazine | |
BR112019022741B1 (en) | PROCESS FOR PREPARING COMPOUND AND OPTICALLY ACTIVE COMPOUND | |
US8362273B2 (en) | Process for preparing aminale and their use for preparing 1,3-disubstituted pyrazole compounds | |
BR112019021122B1 (en) | PROCESS FOR PREPARING AN OPTICALLY ACTIVE PYRIMIDINIUM COMPOUND AND OPTICALLY ACTIVE COMPOUNDS |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
GD4A | Issue of patent certificate for granted invention patent |