TWI778897B - Temperature adjustment method for pressure oven and pressure oven - Google Patents
Temperature adjustment method for pressure oven and pressure oven Download PDFInfo
- Publication number
- TWI778897B TWI778897B TW110148655A TW110148655A TWI778897B TW I778897 B TWI778897 B TW I778897B TW 110148655 A TW110148655 A TW 110148655A TW 110148655 A TW110148655 A TW 110148655A TW I778897 B TWI778897 B TW I778897B
- Authority
- TW
- Taiwan
- Prior art keywords
- pressure
- cavity
- gas
- temperature
- cooling
- Prior art date
Links
Images
Landscapes
- Measuring Fluid Pressure (AREA)
- Furnace Details (AREA)
- Blow-Moulding Or Thermoforming Of Plastics Or The Like (AREA)
- Re-Forming, After-Treatment, Cutting And Transporting Of Glass Products (AREA)
- Slot Machines And Peripheral Devices (AREA)
Abstract
Description
本發明是有關於一種烤箱及一種溫度調整方式,且特別是有關於一種壓力烤箱以及用於此壓力烤箱的溫度調整方式。The present invention relates to an oven and a temperature adjustment method, and in particular to a pressure oven and a temperature adjustment method for the pressure oven.
在工業製程之中,經常需要在不同的溫度環境中進行作業。因此,加熱製程以及冷卻製程的速率將會影響製程的效率,加熱和/或冷卻速率愈快,則製程效率愈高。In industrial processes, it is often necessary to operate in different temperature environments. Therefore, the rate of the heating process and the cooling process will affect the efficiency of the process, and the faster the heating and/or cooling rate, the higher the process efficiency.
習知的冷卻製程包括非回授式及回授式冷卻製程。習知的非回授式冷卻製程,例如,將原本的高溫氣體排空後再通入低溫的氣體以使腔體冷卻。但此方法將耗費大量的氣體而導致冷卻成本提高。習知的回授式冷卻製程,例如,透過額外的管路將原本的高溫氣體在腔體外部冷卻後再回授至腔體內而使腔體冷卻。儘管回授式冷卻製程可以重複利用氣體而降低氣體成本,但其冷卻速度仍有改善空間。因此,如何兼顧非回授式及回授式冷卻製程的優點,開發具有快速冷卻且降低氣體成本的冷卻製程為本領域亟需解決的問題。Conventional cooling processes include non-regenerating and regenerative cooling processes. In the conventional non-feedback cooling process, for example, the original high temperature gas is evacuated and then the low temperature gas is introduced to cool the cavity. However, this method will consume a large amount of gas and lead to increased cooling costs. In the conventional feedback cooling process, for example, the original high-temperature gas is cooled outside the cavity through an additional pipeline, and then fed back into the cavity to cool the cavity. Although the feedback cooling process can reuse the gas and reduce the gas cost, there is still room for improvement in the cooling rate. Therefore, how to take into account the advantages of the non-feedback cooling process and the feedback cooling process, and develop a cooling process with rapid cooling and reduced gas cost is an urgent problem to be solved in the art.
本發明提供一種壓力烤箱的溫度調整方式,在壓力烤箱的降溫程序之前,開啟洩壓閥以執行洩壓程序,洩去部分的氣體,且使腔體內的氣壓仍大於等於一大氣壓。接著,將腔體內剩餘的氣體流入腔體外的冷卻回流管路而降溫,並經由冷卻回流管路使剩餘的氣體再次回到腔體內而使腔體降溫,以達到使腔體快速降溫且降低氣體成本的目標。The present invention provides a temperature adjustment method for a pressure oven. Before the cooling procedure of the pressure oven, the pressure relief valve is opened to perform the pressure relief procedure, and part of the gas is released, and the air pressure in the cavity is still greater than or equal to one atmosphere. Next, the remaining gas in the cavity flows into the cooling return line outside the cavity to cool down, and the remaining gas is returned to the cavity through the cooling return line to cool the cavity, so as to quickly cool the cavity and reduce the gas cost target.
本發明提供一種壓力烤箱,腔體設有洩壓閥且腔體外設有冷卻回流管路,在腔體透過洩壓閥洩出一部分氣體而使腔體內的氣壓大於一大氣壓下,透過冷卻回流管路冷卻氣體而使腔體降溫,使壓力烤箱據在高壓環境下進行降溫的功能,且縮短腔體的降溫所需的時間。The invention provides a pressure oven. The cavity is provided with a pressure relief valve and a cooling return line is arranged outside the cavity. When a part of the gas is released from the cavity through the pressure relief valve and the air pressure in the cavity is greater than atmospheric pressure, the cooling return pipe is passed through the cavity. The cooling gas is used to cool the cavity, so that the pressure oven can be cooled in a high-pressure environment, and the time required for the cooling of the cavity is shortened.
本發明為一種壓力烤箱的溫度調整方式,包括:提供一壓力烤箱,壓力烤箱包括一腔體、設置於腔體內的一加熱器、連通於腔體的一進氣單元、設置於該腔體的一洩壓閥以及位於該腔體外且可開關地連通於該腔體的一冷卻回流管路。運作進氣單元,以對腔體填充一氣體,而使腔體內的一氣壓為一第一壓力,第一壓力大於一大氣壓。在腔體內的氣壓大於一大氣壓下,運作加熱器,以對該腔體進行一升溫程序,而使腔體內的溫度由一第一溫度增加至一第二溫度。在升溫程序之後,開啟洩壓閥,以對該腔體進行一洩壓程序,使腔體內的氣體的一部分洩出,而使氣壓下降至第二壓力。關閉洩壓閥,以進行一降溫程序,使腔體內的氣體的至少一部分流入冷卻回流管路而降溫,且經由冷卻回流管路再度回到腔體內,以使腔體內的溫度下降至第三溫度。The present invention relates to a temperature adjustment method of a pressure oven, which includes: providing a pressure oven, the pressure oven includes a cavity, a heater arranged in the cavity, an air intake unit communicated with the cavity, and a heater arranged in the cavity. A pressure relief valve and a cooling return line located outside the cavity and switchably connected to the cavity. The air inlet unit is operated to fill the cavity with a gas, so that an air pressure in the cavity is a first pressure, and the first pressure is greater than one atmosphere. When the air pressure in the cavity is greater than one atmosphere, the heater is operated to perform a heating program for the cavity to increase the temperature in the cavity from a first temperature to a second temperature. After the heating procedure, the pressure relief valve is opened to perform a pressure relief procedure for the cavity, so that a part of the gas in the cavity is released, and the air pressure is lowered to the second pressure. Close the pressure relief valve to perform a cooling procedure, so that at least a part of the gas in the cavity flows into the cooling return line to cool down, and returns to the cavity through the cooling return line again, so that the temperature in the cavity drops to the third temperature .
在本發明的一實施例中,氣體的至少一部分是腔體內的氣體在被洩壓閥洩出之後的剩餘部分。In an embodiment of the present invention, at least a part of the gas is the remaining part of the gas in the cavity after being released by the pressure relief valve.
在本發明的一實施例中,第二壓力大於一大氣壓。In an embodiment of the present invention, the second pressure is greater than one atmosphere.
在本發明的一實施例中,第二壓力與第一壓力的比值介於10%至90%之間。In an embodiment of the present invention, the ratio of the second pressure to the first pressure is between 10% and 90%.
在本發明的一實施例中,第二壓力與第一壓力的比值介於30%至70%之間。In an embodiment of the present invention, the ratio of the second pressure to the first pressure is between 30% and 70%.
在本發明的一實施例中,在氣體流入冷卻回流管路之前,還包括將外部氣體填充至腔體,而使氣壓由第二壓力增加至第三壓力。外部氣體的溫度低於第二溫度。In an embodiment of the present invention, before the gas flows into the cooling return line, the method further includes filling the cavity with external gas, and increasing the gas pressure from the second pressure to the third pressure. The temperature of the outside air is lower than the second temperature.
在本發明的一實施例中,外部氣體與氣體在被洩壓閥洩出之後的剩餘部分一起流入冷卻回流管路而降溫,且經由冷卻回流管路再度回到腔體內。In an embodiment of the present invention, the external gas and the remaining part of the gas after being discharged by the pressure relief valve flow into the cooling return line to cool down, and then return to the cavity through the cooling return line.
在本發明的一實施例中,第二壓力大於等於一大氣壓。In an embodiment of the present invention, the second pressure is greater than or equal to one atmosphere.
在本發明的一實施例中,第三壓力小於等於第一壓力。In an embodiment of the present invention, the third pressure is less than or equal to the first pressure.
本發明的一種壓力烤箱,包括:一腔體、一加熱器、一風扇、一進氣單元、一洩壓閥以及一冷卻回流管路。加熱器設置於腔體,以使腔體升溫。風扇設置於腔體。進氣單元連通於腔體,以對腔體充氣而增壓。洩壓閥設置於腔體,以將腔體內的氣體排出而減壓。冷卻回流管路,位於腔體外且可開關地連通於腔體。A pressure oven of the present invention includes: a cavity, a heater, a fan, an air intake unit, a pressure relief valve and a cooling return line. The heater is arranged in the cavity to heat up the cavity. The fan is arranged in the cavity. The air intake unit is communicated with the cavity to inflate and pressurize the cavity. The pressure relief valve is arranged in the cavity to discharge the gas in the cavity to reduce the pressure. The cooling return line is located outside the cavity and is switchably connected to the cavity.
基於上述,在本發明的壓力烤箱的溫度調整方式中,在降溫程序之前先執行洩壓程序,以洩出腔體內的部分熱能,且使腔體內的氣壓保持大於或等於一大氣壓。接著,將腔體內的氣體的至少一部分流入腔體外的冷卻回流管路以執行降溫程序,使腔體內的溫度從第二溫度快速下降至第三溫度,以達到使腔體快速降溫的目標。另外,在本發明的壓力烤箱中,透過進氣單元對腔體增壓,在腔體內的氣壓大於一大氣壓下,藉由腔體內的加熱器對腔體執行升溫程序且在升溫程序之後藉由洩壓閥對腔體執行洩壓程序,而使腔體內的氣壓大於或等於一大氣壓。接著,藉由腔體外的冷卻回流管路執行降溫程序,以使腔體內的溫度下降至第三溫度。由此可知,本發明的壓力烤箱具備在高壓環境下進行升溫及降溫的功能,且透過本發明的壓力烤箱的溫度調整方式,可縮短製程所需的時間。Based on the above, in the temperature adjustment method of the pressure oven of the present invention, the pressure relief procedure is performed before the cooling procedure to release part of the thermal energy in the cavity and keep the air pressure in the cavity greater than or equal to one atmosphere. Next, at least a part of the gas in the cavity flows into the cooling return line outside the cavity to perform a cooling procedure, so that the temperature in the cavity is rapidly lowered from the second temperature to the third temperature, so as to achieve the goal of rapidly cooling the cavity. In addition, in the pressure oven of the present invention, the cavity is pressurized through the air intake unit, and when the air pressure in the cavity is greater than one atmosphere, the heating process is performed on the cavity by the heater in the cavity, and after the heating process, the cavity is heated by The pressure relief valve performs a pressure relief procedure on the cavity, so that the air pressure in the cavity is greater than or equal to one atmosphere. Next, a cooling procedure is performed through the cooling return line outside the cavity, so that the temperature in the cavity is lowered to a third temperature. It can be seen that the pressure oven of the present invention has the functions of heating and cooling in a high-pressure environment, and the time required for the manufacturing process can be shortened through the temperature adjustment method of the pressure oven of the present invention.
為了讓本發明的上述特徵及優點能夠更明顯易懂,下文特舉實施例,並配合所附圖式詳細說明如下。In order to make the above-mentioned features and advantages of the present invention more obvious and easy to understand, the following embodiments are given and described in detail with the accompanying drawings as follows.
參照本實施例之圖式以更全面地闡述本發明。然而,本發明亦可以各種不同的形式體現,而不應限於本文中所述之實施例。相同或相似之標號表示相同或相似之元件,以下段落將不再一一贅述。The present invention is more fully described with reference to the drawings of this embodiment. However, the present invention may be embodied in various forms and should not be limited to the embodiments described herein. The same or similar reference numerals denote the same or similar elements, and will not be repeated in the following paragraphs.
圖1是根據本發明的一實施例的壓力烤箱的示意圖。為了清楚表示壓力烤箱200的元件設置關係,圖1的壓力烤箱200的各元件未依比例繪製,且省略部分元件。FIG. 1 is a schematic diagram of a pressure oven according to an embodiment of the present invention. In order to clearly show the arrangement relationship of the elements of the
請參閱圖1,本實施例的壓力烤箱200包括一腔體210、一加熱器220、一風扇230、一進氣單元240、一冷卻回流管路250以及一洩壓閥260。加熱器220及風扇230設置於腔體210,加熱器220適於以使腔體210升溫且風扇230適於使腔體210內的溫度均勻分布。Referring to FIG. 1 , the
進氣單元240連通於腔體210,適於對腔體210填充一氣體310以使腔體210增壓。洩壓閥260設置於腔體210,適於將腔體210內的氣體310的一部分洩出。冷卻回流管路250位於腔體210外且可開關地連通於腔體210。The
壓力烤箱200還包括設置於冷卻回流管路250的一冷卻裝置254。本實施例的冷卻裝置254包括一冷卻器256以及一風扇258,但本發明不限於此。冷卻器256適於使氣體320(圖5)降溫,風扇258適於在冷卻裝置254及腔體210之間形成一壓差,而使降溫後的氣體320沿冷卻回流管路250回到腔體210內以使腔體210內的溫度下降。The
本實施例的風扇230包括一中央部232、多個扇葉234、一轉軸236以及一驅動馬達238。扇葉234從中央部232延伸且扇葉234的轉動範圍為有風區。扇葉234適於吹動腔體210內的氣體310,而使氣體310在腔體210內流動。轉軸236連接中央部232及驅動馬達238,以透過驅動馬達238使扇葉234轉動。The
如圖1所示,本實施例的加熱器220配置於風扇230的前側且風扇230的尺寸小於加熱器220的尺寸。加熱器220對風扇230所在的平面上的投影至少部分重疊於風扇230,特別是部分重疊於風扇230的扇葉234部分(有風區)。當然,在其他實施例中,風扇230的尺寸也可以等於或大於加熱器220的尺寸。As shown in FIG. 1 , the
壓力烤箱200可選擇地包括一壓力感應裝置280、一溫度控制器290以及一壓力控制器270,但本發明不限於此。洩壓閥260設置於腔體210,以將腔體210內的氣體310排出而減壓。壓力感應裝置280適於感測腔體210內的氣壓。溫度控制器290適於確認腔體210內的溫度,以監測腔體210的降溫速率。壓力控制器270適於控制充入腔體210內的氣體310。The
本實施例的壓力烤箱200可應用於需要快速升溫及降溫的製程,例如除泡製程。透過壓力烤箱200去除腔體210內的元件(未示出)在晶粒黏著(die attached)、 灌注封膠(potting)、底部填膠(underfill)、印刷塗膠(printing)或光學膜貼附(OCA lamination)等製程工藝中產生的氣泡(void),且透過一種溫度調整方式使得壓力烤箱200的腔體210快速降溫,以增進製程效率。The
圖2是根據本發明的一實施例的壓力烤箱的溫度調整方式的流程圖。請同時參閱圖1及圖2,圖1對應於圖2的步驟S110。運作進氣單元240以執行一增壓程序(步驟S110)。如圖1所示,進氣單元240透過一管路242將氣體310充入腔體210中。FIG. 2 is a flowchart of a temperature adjustment method of a pressure oven according to an embodiment of the present invention. Please refer to FIG. 1 and FIG. 2 at the same time. FIG. 1 corresponds to step S110 of FIG. 2 . The
請參閱圖1,此時腔體210內的氣體分子數量為一第一氣體分子數量N1,而使腔體210內的一氣壓為一第一壓力P1,第一壓力P1大於一大氣壓。本實施例的第一壓力P1例如是9大氣壓,但本實施例不以此為限。在此,腔體210內的溫度為一第一溫度T1。Referring to FIG. 1 , the number of gas molecules in the
圖3是圖1的壓力烤箱在升溫程序期間的腔體內的氣體流動的示意圖。請同時參閱圖2及圖3,圖3對應於圖2的步驟S120。在腔體210內的氣壓大於一大氣壓下,運作加熱器220及風扇230以對腔體進行一升溫程序(步驟S120)。加熱器220加熱氣體310,且風扇230使氣體310沿箭頭方向在腔體210內流動,而使腔體210內的溫度均勻地由第一溫度T1(圖1)上升至一第二溫度T2(步驟S120)。此時腔體210內的氣體分子數量保持第一氣體分子數量N1,而使腔體210內的氣壓大於一大氣壓。在此階段,位於腔體210內的待加熱元件(未示出)可快速地被加熱。FIG. 3 is a schematic diagram of the gas flow in the cavity of the pressure oven of FIG. 1 during a temperature rise program. Please refer to FIG. 2 and FIG. 3 at the same time. FIG. 3 corresponds to step S120 of FIG. 2 . When the air pressure in the
圖4是圖1的壓力烤箱在洩壓程序期間的洩壓閥的管路內的氣體流動的示意圖。請同時參閱圖4及圖2,圖4對應於圖2的步驟S130。在升溫程序(步驟S120)結束且腔體210需要降溫時,關閉加熱器220且開啟洩壓閥260以執行一洩壓程序(步驟S130)。藉由洩壓閥260將腔體210內的具有高熱能的氣體310的一部分透過一管路262從腔體210內洩出。FIG. 4 is a schematic diagram of gas flow in the piping of the pressure relief valve of the pressure oven of FIG. 1 during a pressure relief procedure. Please refer to FIG. 4 and FIG. 2 at the same time. FIG. 4 corresponds to step S130 of FIG. 2 . When the heating procedure (step S120 ) ends and the
如圖4所示,氣體310的一部分沿箭頭方向在管路262中流動至洩壓閥260,並透過洩壓閥260離開腔體210,而使腔體210內的氣體分子數量下降,直到腔體210內的氣體分子數量下降至一第二氣體分子數量N2,而使腔體210內的氣壓下降至一第二壓力P2時,關閉洩壓閥260(步驟S130)。此處的第二壓力P2大於等於一大氣壓。在本實施例中,第二壓力P2例如是6大氣壓,但本發明不以此為限。在其他實施例中,第二壓力P2例如是一大氣壓。As shown in FIG. 4 , a part of the
由於具有高熱能的氣體310的一部分被洩壓閥260洩出,故步驟S130的腔體210(圖4)內的熱能小於或等於步驟S120的腔體210(圖3)內的熱能。在本實施例中,第二壓力P2與第一壓力P1的比值介於10%至90%之間,但本發明不限於此。例如,在其他實施例中,第二壓力P2與第一壓力P1的比值介於30%至70%之間。Since a part of the
圖5是圖4的壓力烤箱在降溫程序期間的冷卻回流管路內的氣體流動的示意圖。請同時參閱圖2及圖5,圖5對應於圖2的步驟S140、S150。此處的氣體320為氣體310在被洩壓閥260洩出之後的剩餘部分。將冷卻回流管路250及腔體210連通以執行一降溫程序(步驟S140),以使具有高熱能的氣體320從腔體210流入冷卻回流管路250中。FIG. 5 is a schematic diagram of the gas flow in the cooling return line of the pressure oven of FIG. 4 during a cooling procedure. Please refer to FIG. 2 and FIG. 5 at the same time. FIG. 5 corresponds to steps S140 and S150 of FIG. 2 . The
如圖5所示,氣體320沿箭頭方向在冷卻回流管路250中流動且進入冷卻裝置254。氣體320的氣體分子與冷卻裝置254的冷卻器256進行熱交換而使氣體320降溫。接著,將降溫後的氣體320透過冷卻回流管路250送回腔體210內(步驟S150)。As shown in FIG. 5 , the
氣體320在腔體210及冷卻回流管路250內不斷循環,直到腔體210內的溫度下降至第三溫度T3(步驟S160)。此時腔體210內的氣體分子數量維持第二氣體分子數量N2,腔體210內的氣壓大於或等於一大氣壓。The
由此可知,本實施例的壓力烤箱200為開放迴路,充入腔體210內的氣體310(圖1)的一部分可透過洩壓閥260洩出。在本實施例的壓力烤箱200的升溫程序(步驟S120)、洩壓程序(步驟S130)及降溫程序(步驟S140)期間,腔體210內的氣壓始終大於一大氣壓。換言之,壓力烤箱200是在正壓狀態下進行升溫及降溫,而可增加升溫與降溫的速率及效能。It can be seen from this that the
此外,在本實施例的降溫程序中,腔體210的降溫是依靠氣體320在冷卻回流管路250中與冷卻裝置254進行熱交換後再回到腔體210內而使腔體210降溫。因此,氣體320的氣體分子數量大於一大氣壓的分子數量而可提升腔體210的降溫效能。In addition, in the cooling process of the present embodiment, the temperature of the
另外,由於在本實施例的洩壓程序中僅洩出一部分的氣體310,因此可縮短下一次的升溫程序的準備時間,例如,僅需要充入少量氣體使腔體210內的氣壓達到第一壓力P1(圖1)後,即可進行升溫程序,以增進壓力烤箱200的製程效率。In addition, since only a part of the
圖6A是圖4的壓力烤箱在加壓程序期間的進氣單元的管路內的氣體流動的示意圖。請同時參閱圖2及圖6A,圖6A對應於圖2的步驟S160。壓力烤箱200的溫度調整方式可選擇的包括一加壓程序(步驟S160)。FIG. 6A is a schematic diagram of the gas flow in the piping of the air intake unit during the pressurization procedure of the pressure oven of FIG. 4 . Please refer to FIG. 2 and FIG. 6A at the same time. FIG. 6A corresponds to step S160 of FIG. 2 . The temperature adjustment method of the
在關閉洩壓閥260(步驟S130)之後且在降溫程序(S162)之前,藉由進氣單元240將一外部氣體330填充至腔體210內,直到腔體210內的氣體分子數量從第二氣體分子數量N2上升至一第三氣體分子數量N3,而使氣壓由第二壓力P2增加至一第三壓力P3(步驟S160)後,關閉進氣單元240。After closing the pressure relief valve 260 (step S130 ) and before the cooling process ( S162 ), an
本實施例的第三壓力P3大於一大氣壓,且第三壓力P3小於等於第一壓力P1。第三壓力P3例如是9大氣壓,但本發明不以此為限。例如,在其他實施例中,第三壓力P3大於第一壓力P1。The third pressure P3 in this embodiment is greater than one atmosphere, and the third pressure P3 is less than or equal to the first pressure P1. The third pressure P3 is, for example, 9 atmospheres, but the present invention is not limited to this. For example, in other embodiments, the third pressure P3 is greater than the first pressure P1.
圖6B是圖6A的壓力烤箱在降溫程序期間的冷卻回流管路內的氣體流動的示意圖。請參閱圖2及圖6B,圖6B對應於圖2的步驟S162、S150。在加壓程序(步驟S160)之後執行降溫程序(步驟S162)。在此,一氣體340包括外部氣體330與氣體310(圖1)在被洩壓閥260洩出之後的剩餘部分。將冷卻回流管路250與腔體210連通以執行降溫程序(步驟S162)。FIG. 6B is a schematic diagram of the gas flow in the cooling return line of the pressure oven of FIG. 6A during a cooling procedure. Please refer to FIG. 2 and FIG. 6B . FIG. 6B corresponds to steps S162 and S150 of FIG. 2 . The cooling process (step S162 ) is performed after the pressurization process (step S160 ). Here, a
氣體340從腔體210流入冷卻回流管路250,且透過冷卻裝置254降溫。最終,降溫後的氣體340經由冷卻回流管路250再度回到腔體210內(步驟S162),直到腔體210內的溫度下降至第三溫度T3(步驟S150)。此時腔體210內的氣體分子數量維持第三氣體分子數量N3,而使腔體210內的氣壓大於一大氣壓。The
在本實施例中,外部氣體330的溫度低於第二溫度T2。換言之,在透過冷卻回流管路250進行降溫之前,先透過具有低熱能的外部氣體330與具有高熱能的氣體320混合以形成氣體340,使腔體210內的熱能降低之後再執行降溫程序,以增進腔體210的降溫效率。In this embodiment, the temperature of the
值得一提的是,請回到圖2,本實施例在降溫程序(步驟S162)之前還包括了加壓程序(步驟S160)。由於步驟S160將外部氣體330充入腔體210(圖6A)內,因此相較於前一實施例所描述地由步驟S130、S140到步驟S150的降溫方法,步驟S162的腔體210內的氣體分子數量(第三氣體分子數量N3)大於步驟S130中所提到的腔體210內的氣體分子數量(第二氣體分子數量N2)。It is worth mentioning that, please go back to FIG. 2 , this embodiment also includes a pressurizing process (step S160 ) before the cooling process (step S162 ). Since the
由於降溫程序的降溫效能與氣體320、340的氣體分子數量有關,且第三氣體分子數量N3大於第二氣體分子數量N2,因此步驟S162的腔體210具有較多的氣體分子可與冷卻器256進行熱交換,而可具有較佳的降溫效能。無論是由步驟S130、S140直接到步驟S150或是由步驟S130、S160、S162到步驟S150,均具有有助於降溫的優點。Since the cooling efficiency of the cooling process is related to the number of gas molecules in the
需要注意的是,由於在步驟S160中需要額外充入額外的外部氣體330,因此在步驟S160中還包括額外的等待時間以使腔體210內的氣體分子數量上升至第三氣體分子數量N3後,才能進行降溫程序,操作者可視需求選擇所需操作的步驟。It should be noted that since additional
綜上所述,在本發明的壓力烤箱的溫度調整方式中,在降溫程序之前先執行洩壓程序,以洩出腔體的部分熱能而縮短降溫程序所需要的時間,增進製程效率。在降溫程序期間的腔體的氣壓(例如,第二壓力、第三壓力) 大於或等於一大氣壓,而使腔體在降溫程序結束後可快速的再次執行升溫程序,以增進壓力烤箱的製程效率。To sum up, in the temperature adjustment method of the pressure oven of the present invention, the pressure relief procedure is performed before the cooling procedure to release part of the thermal energy of the cavity, thereby shortening the time required for the cooling procedure and improving the process efficiency. During the cooling process, the air pressure of the cavity (eg, the second pressure, the third pressure) is greater than or equal to one atmosphere, so that the cavity can quickly perform the heating process again after the cooling process, so as to improve the process efficiency of the pressure oven .
雖然本發明已以實施例揭露如上,然其並非用以限定本發明,任何所屬技術領域中具有通常知識者,在不脫離本發明的精神和範圍內,當可作些許的更動與潤飾,故本發明的保護範圍當視後附的申請專利範圍所界定者為準。Although the present invention has been disclosed above by the embodiments, it is not intended to limit the present invention. Anyone with ordinary knowledge in the technical field can make some changes and modifications without departing from the spirit and scope of the present invention. Therefore, The protection scope of the present invention shall be determined by the scope of the appended patent application.
N1:第一氣體分子數量N1: Number of first gas molecules
N2:第二氣體分子數量N2: Number of second gas molecules
N3:第三氣體分子數量N3: Number of third gas molecules
P1:第一壓力P1: First pressure
P2:第二壓力P2: Second pressure
P3:第三壓力P3: Third pressure
S110、S120、S130、S140、S150、S160、S162:步驟S110, S120, S130, S140, S150, S160, S162: Steps
T1:第一溫度T1: first temperature
T2:第二溫度T2: Second temperature
T3:第三溫度T3: The third temperature
200:壓力烤箱200: Pressure Oven
210:腔體210: Cavity
220:加熱器220: Heater
230:風扇230: Fan
232:中央部232: Central Department
234:扇葉234: Fan Leaf
236:轉軸236: Spindle
238:驅動馬達238: Drive Motor
240:進氣單元240: Intake unit
242、262:管路242, 262: pipeline
250:冷卻回流管路250: Cooling return line
254:冷卻裝置254: Cooling device
256:冷卻器256: Cooler
258:風扇258: Fan
260:洩壓閥260: Pressure relief valve
270:壓力控制器270: Pressure Controller
280:壓力感應裝置280: Pressure Sensing Device
290:溫度控制器290: Temperature Controller
310、320、340:氣體310, 320, 340: Gas
330:外部氣體330: External gas
圖1是根據本發明的一實施例的壓力烤箱的示意圖。 圖2是根據本發明的一實施例的壓力烤箱的溫度調整方式的流程圖。 圖3是圖1的壓力烤箱在升溫程序期間的腔體內的氣體流動的示意圖。 圖4是圖1的壓力烤箱在洩壓程序期間的洩壓閥的管路內的氣體流動的示意圖。 圖5是圖4的壓力烤箱在降溫程序期間的冷卻回流管路內的氣體流動的示意圖。 圖6A是圖4的壓力烤箱在加壓程序期間的進氣單元的管路內的氣體流動的示意圖。 圖6B是圖6A的壓力烤箱在降溫程序期間的冷卻回流管路內的氣體流動的示意圖。 FIG. 1 is a schematic diagram of a pressure oven according to an embodiment of the present invention. FIG. 2 is a flowchart of a temperature adjustment method of a pressure oven according to an embodiment of the present invention. FIG. 3 is a schematic diagram of the gas flow in the cavity of the pressure oven of FIG. 1 during a temperature rise program. FIG. 4 is a schematic diagram of gas flow in the piping of the pressure relief valve of the pressure oven of FIG. 1 during a pressure relief procedure. FIG. 5 is a schematic diagram of the gas flow in the cooling return line of the pressure oven of FIG. 4 during a cooling procedure. FIG. 6A is a schematic diagram of the gas flow in the piping of the air intake unit during the pressurization procedure of the pressure oven of FIG. 4 . FIG. 6B is a schematic diagram of the gas flow in the cooling return line of the pressure oven of FIG. 6A during a cooling procedure.
N1:第一氣體分子數量 N1: Number of first gas molecules
P1:第一壓力 P1: First pressure
T1:第一溫度 T1: first temperature
200:壓力烤箱 200: Pressure Oven
210:腔體 210: Cavity
220:加熱器 220: Heater
230:風扇 230: Fan
232:中央部 232: Central Department
234:扇葉 234: Fan Leaf
236:轉軸 236: Spindle
238:驅動馬達 238: Drive Motor
240:進氣單元 240: Intake unit
242、262:管路 242, 262: pipeline
250:冷卻回流管路 250: Cooling return line
254:冷卻裝置 254: Cooling device
256:冷卻器 256: Cooler
258:風扇 258: Fan
260:洩壓閥 260: Pressure relief valve
270:壓力控制器 270: Pressure Controller
280:壓力感應裝置 280: Pressure Sensing Device
290:溫度控制器 290: Temperature Controller
310:氣體 310: Gas
Claims (8)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW110148655A TWI778897B (en) | 2021-12-24 | 2021-12-24 | Temperature adjustment method for pressure oven and pressure oven |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW110148655A TWI778897B (en) | 2021-12-24 | 2021-12-24 | Temperature adjustment method for pressure oven and pressure oven |
Publications (2)
Publication Number | Publication Date |
---|---|
TWI778897B true TWI778897B (en) | 2022-09-21 |
TW202325202A TW202325202A (en) | 2023-07-01 |
Family
ID=84958390
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW110148655A TWI778897B (en) | 2021-12-24 | 2021-12-24 | Temperature adjustment method for pressure oven and pressure oven |
Country Status (1)
Country | Link |
---|---|
TW (1) | TWI778897B (en) |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN105054812A (en) * | 2015-09-10 | 2015-11-18 | 东莞市金河田实业有限公司 | Oven with refrigerating and freshness keeping functions |
CN106998931A (en) * | 2014-11-04 | 2017-08-01 | 米克瓦科股份公司 | The method and baking box cooked for vacuum |
-
2021
- 2021-12-24 TW TW110148655A patent/TWI778897B/en active
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN106998931A (en) * | 2014-11-04 | 2017-08-01 | 米克瓦科股份公司 | The method and baking box cooked for vacuum |
CN105054812A (en) * | 2015-09-10 | 2015-11-18 | 东莞市金河田实业有限公司 | Oven with refrigerating and freshness keeping functions |
Also Published As
Publication number | Publication date |
---|---|
TW202325202A (en) | 2023-07-01 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
WO2012102253A1 (en) | Fuel cell power generation system, and method for control of fuel cell power generation system | |
JP2009140902A (en) | Cooling-water temperature adjusting device for fuel cell vehicle | |
TWI778897B (en) | Temperature adjustment method for pressure oven and pressure oven | |
JP2015189467A (en) | Cabin and battery heating system | |
JP2020055342A (en) | Heat management system of vehicle | |
JP2019156108A (en) | Temperature control device of vehicle | |
US20090126378A1 (en) | Chiller of etch equipment for semiconductor processing | |
WO2020133679A1 (en) | Heat exchange-power generation integrated system using liquid nitrogen and control method | |
CN114251922B (en) | Temperature adjusting method of pressure oven and pressure oven | |
TWI783836B (en) | Temperature adjustment method for pressure oven and pressure oven | |
TWI738490B (en) | Material processing apparatus and operating method thereof | |
CA2530567A1 (en) | Multi-range cross defrosting heat pump system | |
JP2023095836A (en) | Temperature control method and pressure oven | |
US20220053670A1 (en) | Cooling device, cooling system, and cooling method | |
CN203745795U (en) | Mask version cooling device of lithography machine | |
CN204221298U (en) | A kind of part automatic heating device | |
CN112161435A (en) | Rapid cooling vacuum drying device and method | |
JPH0650106A (en) | Cooling/heating device for steam turbine | |
WO2018181685A1 (en) | Method and device for manufacturing steam-treated product | |
CN110297530B (en) | Cooling method using liquefied gas | |
CN111397002A (en) | Controller radiating assembly, control method and air conditioner | |
JP6857934B2 (en) | Cooling method for autoclave molding equipment | |
US11214122B2 (en) | Air conditioning device for fuel cell vehicle | |
CN115956693B (en) | Heating system for cigar drying room and control mode thereof | |
JP2005044520A (en) | Fuel cell system |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
GD4A | Issue of patent certificate for granted invention patent |