TWI771798B - Gas supply system and gas delivery method thereof, and plasma processing device - Google Patents

Abstract

The embodiment of the present invention discloses a gas supply system, which includes a plurality of gas input pipelines and gas output pipelines, the gas input pipeline includes a first gas output branch and a second gas output branch connected in parallel, and the gas output pipeline includes A first gas output pipeline and a second gas output pipeline, the output end of the first gas output pipeline is connected with the input end of the second gas output pipeline, and the output end of the second gas output pipeline is used for plasma treatment The chamber of the equipment transports gas, the first gas output pipeline is communicated with the output end of the first gas output branch of the plurality of gas input pipelines, and the second gas output pipeline is connected to the first gas input pipeline of the plurality of gas input pipelines. The output ends of the two gas output branches are connected, so that the first gas and the second gas with different flow requirements are output in the plurality of gas input pipelines, so as to solve the improvement effect of the second gas with small flow requirements on the plasma treatment process more limited question.

Description

Gas supply system and gas delivery method thereof, and plasma processing device

The present invention relates to the technical field of plasma processing, and in particular, to a gas supply system, a gas delivery method thereof, and a plasma processing device.

The fabrication of semiconductor devices, such as microelectronic devices, involves several different stages, each of which includes a variety of processes. When using plasma processing equipment to process semiconductor devices, it may be necessary to introduce multiple gases at the same stage, such as mixing a small flow of conditioning gas into a large flow of process gas to improve the process of plasma processing of semiconductor devices. During specific work, the various gases are transported to the same gas output pipeline through their respective gas input pipelines, and then sent to the chamber of the plasma processing equipment through the gas output pipeline, where they are ionized into plasma for processing on the semiconductor device to be processed. . However, when the existing plasma processing equipment processes the semiconductor device to be processed, the improvement effect of the gas conditioning on the plasma processing process is relatively limited.

In order to solve the above technical problem, an embodiment of the present invention provides a gas supply system, so as to solve the problem that the improvement effect of adjusting the gas on the plasma treatment process is relatively limited.

In order to solve the above problems, the embodiments of the present invention provide the following technical solutions:

A gas supply system for delivering gas to a chamber of a plasma processing device, the gas supply system comprising: a plurality of gas input pipelines, the gas input pipelines comprising a first gas output branch and a second gas output branch connected in parallel Gas output pipeline, the gas output pipeline includes a first gas output pipeline and a second gas output pipeline, the output end of the first gas output pipeline is connected with the input end of the second gas output pipeline, and the second gas output pipeline The output end of the output pipeline is used to deliver gas to the chamber of the plasma processing equipment; the control elements correspond to the gas input pipelines one-to-one, and the control elements include a first control element for controlling the on-off of the first gas output branch and a control The second control element for on-off of the second gas output branch; wherein, the first gas output pipeline is communicated with the output end of the first gas output branch in the plurality of gas input pipelines, and the second gas output pipeline is connected to The output ends of the second gas output branches in the plurality of gas input pipelines are connected; the plurality of gas input pipelines include a first gas input pipeline and a second gas input pipeline, and the first gas input pipeline outputs the first gas input pipeline. A gas, the second gas is output from the second gas input pipeline, the flow demand of the first gas is greater than the flow demand of the second gas, and the first gas is output to the gas through the first gas output branch in the first gas input pipeline output line.

Preferably, the plurality of gas input pipelines include a first group of gas input pipelines and a second group of gas input pipelines, wherein the first group of gas input pipelines includes at least one gas input pipeline arranged along the first direction. , the second group of gas input pipelines includes at least one gas input pipeline arranged along the first direction, the first group of gas input pipelines and the second group of gas input pipelines are arranged along the second direction, and the second direction is perpendicular to first direction.

Preferably, along the second direction, the gas output line is located between the first group of gas input lines and the second group of gas input lines.

The present invention further provides a gas delivery method, which is applied to any one of the above-mentioned gas supply systems. The gas delivery method includes: obtaining gas flow requirements output from a plurality of gas input pipelines, wherein the plurality of gas input pipelines contain a first gas The input pipeline and the second gas input pipeline, the first gas input pipeline outputs the first gas, the second gas output pipeline outputs the second gas, and the flow demand of the first gas is greater than the flow demand of the second gas; controlling The first gas output branch in the first gas input pipeline is opened, the second gas output branch in the first gas input pipeline is closed, and the first gas output branch in the first gas input pipeline is used to output the first gas output. gas to the gas output line.

Preferably, the second gas is output into the gas output pipeline by using the second gas output branch in the second gas input pipeline.

Preferably, the plurality of gas input pipelines include a third gas input pipeline, the third gas input pipeline outputs a third gas, and the flow rate requirement of the third gas is greater than the flow rate requirement of the second gas and smaller than the flow rate requirement of the first gas. , the gas delivery method further comprises: using the second gas output branch in the third gas input pipeline to output the third gas to the gas output pipeline.

Preferably, if the relative positions of the first gas input pipeline and the second gas input pipeline satisfy the first condition, the first gas output branch or the second gas output branch in the second gas input pipeline is used to output the first gas output. Two gas to the gas output pipeline; if the relative position of the first gas input pipeline and the second gas input pipeline does not meet the first condition, use the second gas output branch in the second gas input pipeline to output the second gas gas to the gas output pipeline; wherein, the first condition includes: along the third direction, between the connection end of the first gas output branch and the gas output pipeline in the gas input pipeline with a large flow demand to the preset position The distance is greater than the distance between the connection end of the first gas output branch in the gas input pipeline with the small flow demand and the gas pipeline output pipe to the preset position, and the preset position is the gas output pipeline output to the plasma treatment One end of the chamber of the device, and the third direction is the gas flow direction in the gas output pipeline.

Preferably, the plurality of gas input pipelines include a third gas input pipeline, the third gas input pipeline outputs a third gas, and the flow rate requirement of the third gas is greater than the flow rate requirement of the second gas and smaller than the flow rate requirement of the first gas. .

Preferably, the gas delivery method further comprises: if the third gas input pipeline and the first gas input pipeline do not satisfy the first condition, outputting the third gas by using the second gas output branch in the third gas input pipeline into the gas output line.

Preferably, the gas delivery method further comprises: if the third gas input pipeline and the first gas input pipeline satisfy the first condition, using the first gas output branch or the second gas output in the third gas input pipeline The branch circuit outputs the third gas to the gas output pipeline.

The present invention further provides a plasma processing apparatus, comprising a vacuum reaction chamber and the above-mentioned gas supply system, wherein the gas supply system is used for delivering process gas to the vacuum reaction chamber.

Compared with the prior art, the above technical solution has the following advantages:

The gas supply system provided by the embodiment of the present invention includes a plurality of gas input pipelines and gas output pipelines, wherein the gas input pipeline includes a first gas output branch and a second gas output branch connected in parallel, and the gas output pipeline It includes a first gas output pipeline and a second gas output pipeline, the output end of the first gas output pipeline is connected with the input end of the second gas output pipeline, and the output end of the second gas output pipeline is used to send the plasma to the plasma The chamber of the processing equipment transports gas, the first gas output pipeline is communicated with the output end of the first gas output branch of the plurality of gas input pipelines, and the second gas output pipeline is connected to the plurality of gas input pipelines. The output ends of the second gas output branch are connected, so that when the first gas and the second gas with different flow requirements are output from a plurality of gas input pipelines, the first gas with a large flow requirement can be input to the first gas output In the pipeline, the first gas with a large flow demand is used to push the second gas with a small flow demand to flow in the direction of the chamber of the plasma processing equipment, so as to avoid the output of the first gas with a large flow demand and the second gas with a small flow demand to the plasma processing equipment. After the gas output pipeline, the first gas with a large flow demand blocks the second gas with a small flow demand in the gas output pipeline, resulting in the problem that the improvement effect of the second gas with a small flow demand on the plasma treatment process is relatively limited. .

The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only a part of the embodiments of the present invention, but not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those with ordinary knowledge in the art without creative work shall fall within the protection scope of the present invention.

Many specific details are set forth in the following description to facilitate a full understanding of the present invention, but the present invention can also be implemented in other ways different from those described herein, and those with ordinary knowledge in the art can do so without departing from the connotation of the present invention. Similar deductions are made under the circumstances, so the present invention is not limited by the specific embodiments disclosed below.

As mentioned in the prior art section, when the existing plasma processing equipment processes the semiconductor device to be processed, the effect of the conditioning gas on the plasma processing process is limited.

As shown in FIG. 1, FIG. 1 shows a schematic structural diagram of a gas supply device in the prior art. Various gases input by the gas supply device are transported to the same gas output pipeline 10 through their respective gas input pipelines, and the gas is output through the gas supply pipeline. The pipeline 10 is transported to the chamber of the plasma processing equipment, if the gas input pipeline _GS6 for delivering the first gas required for a large flow (such as CF4 gas with a gas flow of 100sccm) is located close to the common gas output pipeline 10 When the gas input pipeline GS1 for delivering the second gas with a small flow demand (such as O ₂ with a gas flow rate of 4 sccm) is located away from the output end of the common gas output pipeline 10, then the large flow demand After the first gas required for a small flow rate and the second gas required for a small flow rate are output into the gas output pipeline 10, the first gas required for a large flow rate blocks the second gas required for a small flow rate in the gas output pipeline 10, so that most of the gas is small. The flow-required second gas is limited to its own gas input pipeline GS1 and cannot come out, resulting in the problem that the improvement effect of the small flow-required second gas on the plasma processing process is relatively limited.

However, in practical application, in different processes, the flow requirements of different gases are different. Therefore, it is very difficult to control the operability of the gas input pipeline for each gas input according to the flow requirements of each gas.

In view of this, as shown in FIG. 2 , an embodiment of the present invention provides a gas supply system for delivering gas to a chamber of a plasma processing device, the gas supply system comprising: a plurality of gas input pipelines (ie Gas Stick , referred to as GS), the gas input pipeline GS includes a first gas output branch and a second gas output branch in parallel; the gas output pipeline 100, the gas output pipeline 100 includes a first gas output pipeline 101 and a second gas output pipeline 101 The output pipeline 102, the output end of the first gas output pipeline 101 is connected with the input end of the second gas output pipeline 102, and the output end of the second gas output pipeline 102 is used for delivering gas to the chamber of the plasma processing equipment a control element corresponding to the gas input pipeline GS, the control element includes a first control element that controls the on-off of the first gas output branch and a second control element that controls the on-off of the second gas output branch; wherein, the first control element A gas output pipeline 101 communicates with the output end of the first gas output branch of the plurality of gas input pipelines GS, and the second gas output pipeline 102 is connected to the second gas output branch of the plurality of gas input pipelines GS The output ends of the gas input pipelines are connected; the plurality of gas input pipelines GS include a first gas input pipeline GS1 and a second gas input pipeline GS2, the first gas input pipeline GS1 outputs the first gas, and the second gas input pipeline The second gas is output in GS2, the flow demand of the first gas is greater than the flow demand of the second gas, and the first gas is output to the gas output pipeline through the first gas output branch GS11 in the first gas input pipeline GS1.

It should be noted that, in an embodiment of the present invention, the first control element is a first pneumatic valve (ie First Valve, FV for short), the second control element is a second pneumatic valve (ie Second Valve, SV for short), The present invention does not limit this, and in other embodiments of the present invention, the first control element and the second control element may also be other types of control elements, depending on the situation.

Specifically, as shown in FIG. 2, the first gas output branch GS11 in the first gas input pipeline GS1 corresponds to the first control element FV1, and the second gas output branch GS12 in the first gas input pipeline GS1 corresponds to The second control element SV1, the first gas output branch GS21 in the second gas input pipeline GS2 corresponds to the first control element FV2, and the second gas output branch GS22 in the second gas input pipeline GS2 corresponds to the second control element SV2.

The gas supply system provided by the embodiment of the present invention includes a plurality of gas input pipelines and gas output pipelines, wherein the gas input pipeline includes a first gas output branch and a second gas output branch connected in parallel, and the gas output pipeline It includes a first gas output pipeline and a second gas output pipeline, the output end of the first gas output pipeline is connected with the input end of the second gas output pipeline, and the output end of the second gas output pipeline is used to send the plasma to the plasma The chamber of the processing equipment transports gas, the first gas output pipeline is communicated with the output end of the first gas output branch of the plurality of gas input pipelines, and the second gas output pipeline is connected to the plurality of gas input pipelines. The output ends of the second gas output branch are connected, so that when the first gas and the second gas with different flow requirements are output from a plurality of gas input pipelines, the first gas with a large flow requirement can be input to the first gas output In the pipeline, use the first gas with large flow requirements to push the second gas with small flow requirements to flow in the direction of the chamber of the plasma processing equipment, so as to avoid the output of the first gas with large flow requirements into the gas output pipeline, and then put Most of the second gas with small flow requirements is blocked in its own gas input pipeline, resulting in the problem that the improvement effect of the second gas with small flow requirements on the plasma processing process is relatively limited.

On the basis of any of the above embodiments, in an embodiment of the present invention, if the relative positions of the first gas input pipeline GS1 and the second gas input pipeline GS2 satisfy the first condition, the second gas permeates the second gas The first gas output branch GS21 in the input pipeline GS2 is output to the gas output pipeline 100, wherein the first condition includes: along the third direction Z, the first gas output in the gas input pipeline with a large flow demand The distance between the connection end of the branch and the gas output pipeline and the preset position is greater than the distance between the connection end of the first gas output branch and the gas output pipeline 100 in the gas input pipeline with small flow demand and the preset position 3, the distance between the first gas output branch GS11 in the first gas input pipeline GS1 and the connection end B of the gas output pipeline 100 to the preset position C is greater than that of the second gas input The distance between the connection end A of the first gas output branch GS21 in the pipeline GS2 and the gas output pipeline 100 and the preset position C. Wherein, the preset position C is one end of the gas output pipeline 100 output to the chamber of the plasma processing equipment, and the third direction Z is the gas flow direction in the gas output pipeline 100, so as to be driven by the first gas with a large flow demand The second gas with a small flow requirement flows in the direction of the chamber of the plasma processing apparatus.

In another embodiment of the present invention, continuing as shown in FIG. 3 , if the relative positions of the first gas input pipeline GS1 and the second gas input pipeline GS2 satisfy the first condition, the second gas can also permeate the second gas The second gas output branch GS22 in the input pipeline GS2 is output to the gas output pipeline, so that the second gas is output to the second gas output pipeline 102 and the first gas is output to the first gas output pipeline 101 , so that the position of the second gas output to the gas output pipeline 100 is closer to the output of the gas output pipeline 100 to the plasma processing equipment chamber than the position of the first gas output to the gas output pipeline 100 At the same time, it can also shorten the delivery path of the second gas, so as to quickly deliver the second gas to the in the chamber of the plasma processing equipment. The present invention does not limit this, and it depends on the specific situation.

On the basis of any of the above embodiments, in an embodiment of the present invention, if the relative positions of the first gas input pipeline GS1 and the second gas input pipeline GS2 do not satisfy the first condition, as shown in FIG. 2 and FIG. 4 As shown, that is, the distance between the connection end B of the first gas output branch GS11 and the gas output pipeline 100 in the first gas input pipeline GS1 and the preset position C is less than (or equal to) the second gas input pipeline GS2 The distance between the connection end A of the first gas output branch GS21 and the gas output pipeline 100 and the preset position C, the second gas passes through the second gas output branch GS22 in the second gas input pipeline GS2 output to the gas output pipeline 100, so that the second gas is output to the second gas output pipeline 102, and the first gas is output to the first gas output pipeline 101, so that the second gas is output to the gas output pipeline The position in 100 is closer to the output end of the gas output pipeline 100 for delivering gas to the plasma processing equipment chamber than the position where the first gas is output to the gas output pipeline 100 , so as to use the first gas with large flow requirements to push While the second gas with a small flow requirement flows toward the chamber of the plasma processing apparatus, the delivery path of the second gas can be shortened, so as to quickly deliver the second gas to the chamber of the plasma processing apparatus.

It should be noted that, in other embodiments of the present invention, the connection between the connection end B of the first gas output branch GS11 in the first gas input pipeline GS1 and the gas output pipeline 100 and the preset position C may not be considered. The relationship between the distance and the distance between the first gas output branch GS21 of the second gas input pipeline GS2 and the connection end A of the gas output pipeline 100 to the preset position C, the second gas is always passed through the second gas input The second gas output branch in the pipeline GS2 is output to the gas output pipeline 100, so that the second gas is output to the second gas output pipeline 102, the first gas is output to the first gas output pipeline 101, Therefore, the position of the second gas output to the gas output pipeline 100 is closer to the output end of the gas output pipeline 100 for delivering gas to the plasma processing equipment chamber than the position of the first gas output to the gas output pipeline 100 , and then use the first gas with a large flow demand to push the second gas with a small flow demand to flow in the direction of the chamber of the plasma processing equipment, and at the same time shorten the delivery path of the second gas, so as to quickly transport the second gas to the electricity in the chamber of the pulp processing equipment. The present invention does not limit this, and it depends on the specific situation.

As shown in FIGS. 4 to 5 , wherein, FIG. 4 shows a simplified structural diagram of a gas supply system provided in an embodiment of the present invention, and FIG. 5 shows a structure of a gas supply system provided in an embodiment of the present invention Schematic.

On the basis of any of the above embodiments, in an embodiment of the present invention, the plurality of gas input pipelines further include a third gas input pipeline GS3, the third gas input pipeline GS3 outputs a third gas, and the third gas input pipeline GS3 outputs a third gas. The flow demand of the gas is greater than the flow demand of the second gas and less than the flow demand of the first gas.

On the basis of the above embodiment, in an embodiment of the present invention, the third gas is always output to the gas output pipeline 100 through the second gas output branch in the third gas input pipeline GS3, so that the first The third gas and the second gas are output to the second gas output pipeline 102 , and the first gas is output to the first gas output pipeline 101 , so that the third gas and the second gas are output to the positions in the gas output pipeline 100 Compared with the position where the first gas is output to the gas output pipeline 100, it is closer to the output end of the gas output pipeline 100 to deliver the gas to the plasma processing equipment chamber, so that the first gas with a large flow demand is used to promote the small flow demanded gas. When the second gas and the third gas flow in the direction of the chamber of the plasma processing apparatus, the delivery path of the third gas can also be shortened, so as to quickly deliver the second gas to the chamber of the plasma processing apparatus.

On the basis of the above embodiment, in another embodiment of the present invention, if the third gas input line GS3 and the first gas input line GS1 satisfy the first condition, the third gas permeates the third gas input line GS3 The first gas output branch or the second gas output branch is output to the gas output pipeline 100, so that the position of the third gas and the second gas output to the gas output pipeline 100 is compared with that of the first gas output The position in the gas output pipeline 100 is closer to the output end of the gas output pipeline for delivering gas to the plasma processing equipment chamber, so as to use the first gas with a large flow demand to push the second gas and the third gas with a small flow demand to the electricity. The slurry treatment equipment flows in the direction of the chamber to avoid blocking most of the second gas and third gas required for a small flow in its own gas input pipeline after the first gas required for a large flow is output into the gas output pipeline. Among them, there is a problem that the improvement effect of the second gas and the third gas on the plasma processing process is relatively limited due to the small flow requirements.

On the basis of the above embodiment, in an embodiment of the present invention, if the third gas input pipe GS3 and the first gas input pipe GS1 do not meet the first condition, the third gas can only pass through the third gas input pipe The second gas output branch in the route GS3 is output to the gas output pipeline 100, so as to utilize the relative positional relationship between the first gas output pipeline and the second gas output pipeline, so that the third gas is output to the gas output pipeline 100 Compared with the position in which the first gas is output to the gas output pipeline 100, the position in the gas output pipeline 100 is closer to the output end of the gas output pipeline 100 to deliver the gas to the plasma processing equipment chamber, so as to utilize the large flow of the first gas to push the small gas. The third gas with the flow requirement flows in the direction of the chamber of the plasma processing apparatus.

Continuing as shown in FIGS. 4 to 5 , on the basis of the above embodiments, in an embodiment of the present invention, the plurality of gas input pipelines GS may further include a fourth gas input pipeline GS4 and a fifth gas input pipeline There are more gas input pipelines such as the pipeline GS5 and the sixth gas input pipeline GS6, which are not limited in the present invention, and depend on the specific situation. The fourth gas input pipeline GS4 outputs the fourth gas, the fifth gas input pipeline GS5 outputs the fifth gas, and the sixth gas input pipeline outputs the sixth gas.

It should be noted that when the plurality of gas input pipelines GS includes at least four gas input pipelines GS, the gas flow requirements output from different gas input pipelines GS are not exactly the same. Specifically, if the first gas is the gas with the largest flow demand among the gases output from the plurality of gas input pipelines GS, then in an embodiment of the present invention, the first gas permeates the first gas in the first gas input pipeline GS1. The gas output branch GS11 is input into the gas output pipeline 100, and the rest of the gas is input into the gas output pipeline 100 through the second gas output branch in the respective gas input pipeline GS; if the first gas is not a plurality of gas input pipes If the gas with the largest flow demand among the gases output from the gas input pipeline GS is the gas with the largest flow demand, the gas with the largest flow demand among the gases output by the plurality of gas input pipelines GS is input to the gas through the first gas output branch in the corresponding gas input pipeline GS. In the output pipeline 100, the rest of the gas is input into the gas output pipeline 100 through the second gas output branch in the respective gas input pipeline GS, so as to use the gas with the maximum flow requirement to push the gas with other flow requirements to the plasma treatment Flow in the chamber direction of the device.

In another embodiment of the present invention, the gas with the largest flow demand is output to the gas output pipeline 100 through the first gas output branch in the corresponding gas input pipeline GS. The distance between the first gas output branch in the gas input pipeline GS and the connection end of the gas output pipeline 100 to the preset position and the first gas output branch in the gas input pipeline GS with the largest flow demand are the same as The relationship between the distance between the connection end of the gas pipeline output pipe 100 and the preset position determines that the gas is input into the gas output pipeline 100 through the first gas output branch in the corresponding gas input pipeline GS, It is also input into the gas output pipeline 100 through the second gas output branch in the corresponding gas input pipeline GS.

Specifically, if the distance between the first gas output branch in the gas input pipeline GS corresponding to the gas and the connection end of the gas output pipeline 100 to the preset position and the first gas input pipeline with the largest flow demand The distance between a gas output branch and the connection end of the gas pipeline output pipe 100 and the preset position satisfies the first condition, then the gas can pass through the first gas output branch in the corresponding gas input pipeline GS or The second gas output branch is input into the gas output pipeline 100; if the distance between the connection end of the first gas output branch and the gas output pipeline 100 in the gas input pipeline GS corresponding to the gas to the preset position If the distance from the first gas output branch in the gas input pipeline GS with the largest flow demand to the connection end of the gas output pipeline 100 and the preset position does not satisfy the first condition, the gas can only pass through its corresponding The second gas output branch in the gas input pipeline GS is input into the gas output pipeline 100 to ensure that the gas is always located on the transmission path of the gas with the greatest flow demand, so that the gas with the greatest flow demand can push the gas to the electricity The flow in the chamber direction of the pulp processing equipment.

On the basis of any of the above embodiments, in an embodiment of the present invention, a plurality of gas input pipes GS are arranged side by side along a preset direction. It should be noted that the gas supply system in the present invention includes a plurality of gas input pipes If a plurality of gas input pipelines GS are arranged side by side according to the preset direction, the gas supply system will occupy a large space in the preset direction.

In view of this, on the basis of the above-mentioned embodiment, in an embodiment of the present invention, as shown in FIG. 4 to FIG. 5 , the plurality of gas input pipelines GS includes a first group of gas input pipelines 201 and a second A group of gas input pipelines 202, wherein the first group of gas input pipelines 201 includes at least one gas input pipeline GS arranged along the first direction X, and the second group of gas input pipelines 202 includes at least one gas input pipeline GS along the first direction X Arranged gas input pipelines GS, the first group of gas input pipelines 201 and the second group of gas input pipelines 202 are arranged along the second direction Y, and the second direction Y is perpendicular to the first direction X, so that the entire gas supply The structure of the system is compact, and the space occupied by the plurality of gas input pipelines GS in the first direction is reduced.

On the basis of the above-mentioned embodiment, in an embodiment of the present invention, as shown in FIGS. 4 to 5 , along the second direction Y, the gas output pipeline GS is located between the first group of gas input pipelines 201 and the first group of gas input pipelines 201 Between the two groups of gas input pipelines 202, the length of the gas input pipeline GS is shortened on the basis of ensuring that the output end of the gas input pipeline GS is connected with the gas output pipeline.

It should be noted that, in the embodiment of the present invention, the gas supply system further includes a manual valve (manual valve, MV for short). Specifically, during use, the manual valve MV is in a normally open state so that the corresponding gas is input into the gas input pipeline GS.

On the basis of the above embodiment, in an embodiment of the present invention, the gas supply system further includes a mass flow controller (ie, Mass Flow Controller, MFC for short), and the mass flow controller MFC is located in the first gas output branch and Between the common end of the second gas output branch and the manual valve MV, it is used to provide the required stable gas flow to the first gas output branch or the second gas output branch.

On the basis of the above embodiment, in an embodiment of the present invention, the gas supply system further includes a third pneumatic valve (ie, Third Valve, TV for short), and the third pneumatic valve TV is located at the mass flow control meter MFC and the manual valve MV In between, it is used to control the gas flow rate input from the gas input pipeline into the gas output pipeline in conjunction with the mass flow controller MFC.

On the basis of the above-mentioned embodiment, in an embodiment of the present invention, the gas supply system further includes a pressure regulator located between the manual valve MV and the third pneumatic valve TV along the direction of the gas delivery path of the gas input pipeline GS. Regulator (RG for short), pressure gauge (Pressure Gauge, PG for short) and filter (Filter, F for short), wherein the pressure regulator RG is used to input the gas input from the input end of the gas pipeline GS. The pressure is adjusted to the applicable range of the mass flow control meter MFC, and the pressure of the input gas can also be stabilized to the range required by the mass flow control meter MFC, so that the gas input pipeline can provide stable input gas; pressure gauge The PG is used to measure the pressure of the input gas so as to read the pressure of the input gas; the filter F is used to filter the input gas so as to obtain pure input gas.

On the basis of any of the above embodiments, in an embodiment of the present invention, the provided gas supply system further includes: a box body encapsulating a plurality of gas input pipelines GS, gas output pipelines 100 and control elements and other devices . It should be noted that, since the gas supply system includes devices that require frequent maintenance (for example, a mass flow control meter MFC), in an optional embodiment of the present invention, the frequently maintained devices such as the mass flow control meter MFC are set in the The vicinity of the door of the box body allows maintenance personnel to see it as soon as the door is opened, which is convenient for maintenance.

It can be seen from the above that the gas supply system provided by the embodiment of the present invention can make the gas with the small flow always be located on the transmission path of the gas with the maximum flow demand, so that the gas with the maximum flow demand can push the gas with the small flow to the plasma processing equipment. Flow in the direction of the chamber to prevent the gas with a large flow requirement from being output into the gas output pipeline, block most of the gas with a small flow requirement in its own gas input pipeline, resulting in the plasma treatment of the gas with a small flow requirement The improvement effect of the process is relatively limited.

Correspondingly, an embodiment of the present invention also provides a gas delivery method, which is applied to the gas supply system in any of the above embodiments. As shown in FIG. 6 , the gas delivery method includes: obtaining output from a plurality of gas input pipelines According to the gas flow requirements, the plurality of gas input pipelines include a first gas input pipeline and a second gas input pipeline. The first gas input pipeline outputs the first gas, and the second gas output pipeline outputs the second gas. The flow demand of the first gas is greater than the flow demand of the second gas; the first gas output branch in the first gas input pipeline is controlled to open, the second gas output branch in the first gas input pipeline is closed, and the first gas output branch in the first gas input pipeline is controlled to be closed. The first gas output branch in the gas input pipeline outputs the first gas into the gas output pipeline.

The gas delivery method provided by the embodiment of the present invention obtains the gas flow requirements output from a plurality of gas input pipelines, wherein the plurality of gas input pipelines include a first gas input pipeline and a second gas input pipeline, and the first gas input pipeline The first gas is output from the input pipeline, the second gas is output from the second gas output pipeline, the flow demand of the first gas is greater than the flow demand of the second gas, and the first gas output branch in the first gas input pipeline is controlled Open, the second gas output branch in the first gas input pipeline is closed, and the first gas output branch in the first gas input pipeline is used to output the first gas to the gas output pipeline, so that the plurality of gas When the first gas and the second gas with different flow requirements are output from the input pipeline, the first gas with a large flow demand can be input into the first gas output pipeline, so as to use the first gas with a large flow demand to promote the small flow demand The second gas flows in the direction of the chamber of the plasma processing equipment to avoid blocking most of the second gas with small flow requirements in its own gas input after the first gas with large flow requirements is output into the gas output pipeline. In the pipeline, the effect of improving the plasma treatment process of the second gas with a small flow requirement is relatively limited.

The gas delivery method provided by the embodiment of the present invention will be described below with reference to specific embodiments.

Example 1:

On the basis of any of the above embodiments, in an embodiment of the present invention, the gas delivery method includes: outputting the second gas to the gas output pipeline by using the second gas output branch in the second gas input pipeline, so that the second gas is output to the second gas output pipeline, and the first gas is output to the first gas output pipeline, so that the position of the second gas output to the gas output pipeline is compared with that of the first gas output The position in the gas output pipeline is closer to the output end of the gas output pipeline that delivers the gas to the plasma processing equipment chamber, and then the first gas with a large flow demand is used to push the second gas with a small flow demand to the cavity of the plasma processing equipment flow in the direction of the chamber.

On the basis of any of the above embodiments, in an embodiment of the present invention, the plurality of gas input pipelines include a third gas input pipeline, the third gas input pipeline outputs a third gas, and the flow rate of the third gas is required. is greater than the flow rate requirement of the second gas and is smaller than the flow rate requirement of the first gas, in the embodiment of the present invention, the gas delivery method further includes: using the second gas output branch in the third gas input pipeline to output the third gas to the gas in the output pipeline, so that the third gas and the second gas are output into the second gas output pipeline, and the first gas is output into the first gas output pipeline, so that the second gas and the third gas are output into the gas output pipeline The position in the pipeline is closer to the output end of the gas output pipeline to deliver the gas to the plasma processing equipment chamber than the position where the first gas is output to the gas output pipeline, so as to utilize the first gas required for a large flow to push a small flow The required second gas and third gas flow toward the chamber of the plasma processing apparatus.

On the basis of the above embodiment, in an embodiment of the present invention, the plurality of gas input pipelines further include more gas such as a fourth gas input pipeline, a fifth gas input pipeline, and a sixth gas input pipeline. The input pipeline, which is not limited in the present invention, depends on the specific situation. The fourth gas input pipeline outputs the fourth gas, the fifth gas input pipeline outputs the fifth gas, and the sixth gas input pipeline outputs the sixth gas.

It should be noted that when the plurality of gas input pipelines include at least four gas input pipelines, the gas flow requirements output from different gas input pipelines are not exactly the same. Specifically, if the first gas is the gas with the largest flow requirement among the gases output from the plurality of gas input pipelines, in an embodiment of the present invention, the method utilizes the first gas output branch in the first gas input pipeline output the first gas to the gas output pipeline, and use the second gas output branch in the remaining gas input pipeline to output the remaining gas to the gas output pipeline; if the first gas is not the gas output from multiple gas input pipelines For the gas with the largest flow demand among the multiple gas input pipelines, the first gas output branch in the gas input pipeline with the largest flow demand is used to output the gas with the largest flow demand to the gas output pipeline, and the remaining gases are used. The second gas output branch in the input pipeline outputs the remaining gas to the gas output pipeline, so as to use the gas with the maximum flow demand to push the gas with the other flow demand to flow toward the chamber of the plasma processing apparatus.

It can be seen from the above that the gas supply system provided by the embodiment of the present invention can make the gas with the small flow always be located on the transmission path of the gas with the maximum flow demand, so that the gas with the maximum flow demand can push the gas with the small flow to the plasma processing equipment. Flow in the direction of the chamber to prevent the gas with a large flow requirement from being output into the gas output pipeline, block most of the gas with a small flow requirement in its own gas input pipeline, resulting in the plasma treatment of the gas with a small flow requirement The improvement effect of the process is relatively limited.

Embodiment 2:

Specifically, in an embodiment of the present invention, if the relative position of the first gas input pipeline and the second gas input pipeline satisfies the first condition, the method further includes: using the first gas input pipeline in the second gas input pipeline. The gas output branch outputs the second gas to the gas output pipeline, wherein the first condition includes: along the third direction, the connection end of the first gas output branch and the gas output pipeline in the gas input pipeline with large flow demand The distance to the preset position is greater than the distance between the connection end of the first gas output branch and the output pipe of the gas pipeline in the gas input pipeline with small flow demand to the preset position, and the preset position is the gas output pipeline output to one end of the chamber of the plasma processing equipment, and the third direction is the gas flow direction in the gas output pipeline, so as to use the first gas with a large flow demand to push the second gas with a small flow demand to the cavity of the plasma processing equipment flow in the direction of the chamber.

In another embodiment of the present invention, if the relative positions of the first gas input pipeline and the second gas input pipeline satisfy the first condition, the method further comprises: utilizing the second gas output in the second gas input pipeline The branch outputs the second gas to the gas output line, so that the second gas is output to the second gas output line, and the first gas is output to the first gas output line, so that the second gas is output to the gas output line The position in the pipeline is closer to the output end of the gas output pipeline to deliver the gas to the plasma processing equipment chamber than the position where the first gas is output to the gas output pipeline, so as to utilize the first gas required for a large flow to push a small flow When the required second gas flows in the direction of the chamber of the plasma processing device, the conveying path of the second gas can also be shortened, so as to quickly transport the second gas into the chamber of the plasma processing device.

On the basis of the above embodiments, in an embodiment of the present invention, if the relative positions of the first gas input pipeline and the second gas input pipeline do not satisfy the first condition, the method further includes: using the second gas input The second gas output branch in the pipeline outputs the second gas to the gas output pipeline, so as to use the first gas with a large flow demand to push the second gas with a small flow demand to flow toward the chamber of the plasma processing equipment;

On the basis of any of the above embodiments, in an embodiment of the present invention, the plurality of gas input pipelines include a third gas input pipeline, the third gas input pipeline outputs a third gas, and the flow rate of the third gas is required. Greater than the flow requirement of the second gas and less than the flow requirement of the first gas.

On the basis of the above embodiments, in an embodiment of the present invention, the gas delivery method further comprises: if the third gas input pipeline and the first gas input pipeline do not meet the first condition, using the third gas input pipeline The second gas output branch in the pipeline outputs the third gas to the gas output pipeline, so that the third gas and the second gas are output to the second gas output pipeline, and the first gas is output to the first gas output pipeline , so that the positions of the second gas and the third gas output to the gas output pipeline are closer to the position where the gas output pipeline delivers gas to the plasma processing equipment chamber than the position where the first gas is output to the gas output pipeline. At the output end, the second gas and the third gas with a small flow demand are used to push the second gas and the third gas with a small flow demand to the direction of the chamber of the plasma processing equipment, and the delivery path of the third gas can also be shortened to quickly The second gas and the third gas are delivered into the chamber of the plasma processing apparatus.

In another embodiment of the present invention, the gas delivery method further comprises: if the third gas input pipeline and the first gas input pipeline satisfy the first condition, using the first gas output branch in the third gas input pipeline The second gas output branch or the second gas output branch outputs the third gas to the gas output pipeline, so as to use the first gas with a large flow requirement to push the third gas with a small flow requirement to flow toward the chamber of the plasma processing apparatus.

It should be noted that when the plurality of gas input pipelines include at least four gas input pipelines, the gas flow requirements output from different gas input pipelines are not exactly the same. Specifically, if the first gas is the gas with the largest flow requirement among the gases output from the plurality of gas input pipelines, in an embodiment of the present invention, the method includes: using the first gas in the first gas input pipeline The gas output branch outputs the first gas to the gas output pipeline. As for the remaining gases, the connection end between the first gas output branch and the gas output pipeline in the gas input pipeline corresponding to the remaining gases can be adjusted to the preset position. The relationship between the distance and the distance between the first gas output branch in the first gas input pipeline and the connection end of the gas pipeline output pipe to the preset position, it is determined that the gas passes through its corresponding gas input pipeline The first gas output branch is input into the gas output pipeline, or it is input into the gas output pipeline through the second gas output branch in the corresponding gas input pipeline.

If the first gas is not the gas with the greatest flow demand among the gases output in the plurality of gas input lines, the method includes: utilizing the first gas output in the gas input line with the greatest flow demand in the plurality of gas input lines The branch circuit outputs the gas with the largest flow demand to the gas output pipeline. As for the remaining gases, the connection between the first gas output branch and the gas output pipeline in the gas input pipeline corresponding to the remaining gases can be adjusted to the preset position. The relationship between the distance and the distance between the first gas output branch in the gas input pipeline with the largest flow demand and the connection end of the gas pipeline output pipe to the preset position, it is determined that the gas is input through its corresponding gas input Whether the first gas output branch in the pipeline is input into the gas output pipeline, or is input into the gas output pipeline through the second gas output branch in the corresponding gas input pipeline.

Specifically, if the distance between the first gas output branch in the gas input pipeline corresponding to the gas and the connection end of the gas output pipeline to the preset position and the first gas in the gas input pipeline with the largest flow demand If the distance between the connection end of the output branch and the output pipe of the gas pipeline and the preset position satisfies the first condition, the first gas output branch or the second gas output branch in the gas input pipeline GS corresponding to the gas is used. output the gas to the gas output pipeline; if the distance between the first gas output branch in the gas input pipeline corresponding to the gas and the connection end of the gas output pipeline to the preset position and the gas with the largest flow demand If the distance between the first gas output branch in the input pipeline and the connection end of the gas output pipeline and the preset position does not satisfy the first condition, the second gas output branch in the gas input pipeline corresponding to the gas is used The gas is outputted into the gas output pipeline to ensure that the gas is always located on the transmission path of the gas with the largest flow demand, so that the gas with the maximum flow demand can push the gas to flow toward the chamber of the plasma processing equipment.

It can be seen from the above that the gas delivery method provided by the embodiment of the present invention can make the gas with a small flow always located on the transmission path of the gas with the maximum flow demand, so that the gas with the maximum flow demand can push the gas with a small flow to the plasma processing equipment. Flow in the direction of the chamber to prevent the gas with a large flow requirement from being output into the gas output pipeline, block most of the gas with a small flow requirement in its own gas input pipeline, resulting in the plasma treatment of the gas with a small flow requirement The improvement effect of the process is relatively limited.

On the basis of the above embodiments, in an embodiment of the present invention, the gas supply system further includes a manual valve (MV for short), and the manual valve MV is located at the input end of the gas input pipeline. Correspondingly, the gas delivery The method further includes: using the manual valve MV to control the on-off of the gas input pipeline. Specifically, during the use process, the manual valve MV is in a normally open state so that the corresponding gas is input into the gas input pipeline.

On the basis of the above embodiment, in an embodiment of the present invention, the gas supply system further includes a mass flow controller (ie, Mass Flow Controller, MFC for short), and the mass flow controller MFC is located in the first gas output branch and Between the common end of the second gas output branch and the manual valve MV, correspondingly, the gas delivery method further includes: using a mass flow control meter MFC to control the gas flow output from the gas input pipeline to the gas output pipeline, to the first A gas output branch or a second gas output branch provides the required steady flow.

On the basis of the above embodiment, in an embodiment of the present invention, the gas supply system further includes a third pneumatic valve (ie, Third Valve, TV for short), and the third pneumatic valve TV is located at the mass flow control meter MFC and the manual valve MV Correspondingly, the gas delivery method further includes: using the third pneumatic valve TV to be linked with the mass flow control meter MFC to control the gas flow rate input from the gas input pipeline to the gas output pipeline.

On the basis of the above-mentioned embodiment, in an embodiment of the present invention, the gas supply system further comprises a pressure regulator (namely Regulator, RG for short), pressure gauge (Pressure Gauge, PG for short) and filter (Filter, F for short). Correspondingly, the gas delivery method also includes: using the pressure regulator RG to input the gas into the gas input from the input end of the pipeline The pressure of the input gas can be adjusted to the applicable range of the mass flow controller MFC, and the pressure of the input gas can also be regulated to the range required by the mass flow controller MFC to provide stable input gas; use the pressure gauge PG to detect The pressure of the input gas is used to obtain the pressure of the input gas; the input gas is filtered by a filter, so as to obtain the pure input gas.

Correspondingly, an embodiment of the present invention also provides a plasma processing apparatus. As shown in FIG. 7 , the plasma processing apparatus includes: a vacuum reaction chamber 1 ; a gas supply system 2 , and the gas supply system 2 is any of the above-mentioned embodiments The gas supply system provided in the gas supply system 2 is used to deliver the process gas to the vacuum reaction chamber 1 .

To sum up, the gas supply system, the gas delivery method, and the plasma processing device provided by the embodiments of the present invention can make the gas with the small flow always be located on the transmission path of the gas with the maximum flow demand, so that the gas with the maximum flow demand can push the gas with the maximum flow demand. The gas with the flow rate flows in the direction of the chamber of the plasma processing equipment, so as to prevent the gas with a large flow demand from being output into the gas output pipeline, and block most of the gas with a small flow demand in its own gas input pipeline, resulting in The improvement effect of the gas with small flow requirements on the plasma processing process is relatively limited.

Each part in this specification is described in a juxtaposed and progressive manner, and each part focuses on explaining the differences from other parts, and the same and similar parts between the various parts can be referred to each other.

The above description of the disclosed embodiments enables those of ordinary skill in the art to make or use the present invention. Various modifications to these embodiments will be readily apparent to those skilled in the art, and the generic principles defined herein may be implemented in other embodiments without departing from the spirit or scope of the invention. Thus, the present invention is not intended to be limited to the embodiments shown herein, but is to be accorded the widest scope consistent with the principles and novel features disclosed herein.

1: Vacuum reaction chamber 2: Gas supply system 10,100: Gas output line 101: The first gas output pipeline 102: Second gas output pipeline 201: The first group of gas input pipelines 202: The second group of gas input pipelines A, B: connection end C: Preset position GS1~GS6: Gas input pipeline GS11, GS21: The first gas output branch GS12, GS22: The second gas output branch MV, MV1~MV6: Manual valve RG1~RG6: Pressure regulator PG, PG1~PG6: pressure gauge F, F1~F6: filter FV1~FV6: The first pneumatic valve MFC, MFC1~MFC6: Mass Flow Control Meter SV1~SV6: The second pneumatic valve TV, TV1~TV6: The third pneumatic valve X: first direction Y: the second direction Z: third direction S10, S20: Steps

In order to illustrate the embodiments of the present invention or the technical solutions in the prior art more clearly, the following briefly introduces the accompanying drawings that need to be used in the description of the embodiments or the prior art. Obviously, the drawings in the following description are only the For some embodiments of the invention, for those with ordinary knowledge in the art, other drawings can also be obtained according to these drawings without any creative effort. 1 is a schematic structural diagram of a gas supply device provided in the prior art; 2 is a simplified structural diagram of a gas supply system provided in an embodiment of the present invention; 3 is a simplified structural diagram of another gas supply system provided in an embodiment of the present invention; 4 is a simplified structural diagram of another gas supply system provided in an embodiment of the present invention; 5 is a schematic structural diagram of a gas supply system provided in an embodiment of the present invention; 6 is a schematic flowchart of a gas delivery method provided in an embodiment of the present invention; FIG. 7 is a schematic diagram of a plasma processing apparatus provided in an embodiment of the present invention.

100: Gas output pipeline

101: The first gas output pipeline

102: Second gas output pipeline

A, B: connection end

C: Preset position

GS1, GS2: Gas input line

GS11, GS21: The first gas output branch

GS12, GS22: The second gas output branch

FV1, FV2: The first pneumatic valve

SV1, SV2: The second pneumatic valve

Z: third direction

Claims (11)

A gas supply system for supplying gas to a chamber of a plasma processing apparatus, wherein the gas supply system comprises: a first gas input pipeline and a second gas input pipeline, respectively including a first gas input pipeline connected in parallel A gas output branch and a second gas output branch; a gas output pipeline, the gas output pipeline includes a first gas output pipeline and a second gas output pipeline, the first gas output pipeline The output end is connected with the input end of the second gas output pipeline, and the output end of the second gas output pipeline is used to deliver gas to the chamber of the plasma processing equipment; it is connected with the first gas input pipeline and the first gas input pipeline. A control element corresponding to the two gas input lines, the control element includes a first control element for controlling the on-off of the first gas output branch and a second control element for controlling the on-off of the second gas output branch ; wherein, the first gas output pipeline is communicated with the output end of the first gas output branch in the first gas input pipeline and the second gas input pipeline, and the second gas output pipeline is connected with the The first gas input pipeline is communicated with the output end of the second gas output branch in the second gas input pipeline; the first gas input pipeline outputs a first gas, and the second gas input pipeline A second gas is output in the middle, the flow demand of the first gas is greater than the flow demand of the second gas, and the first gas is output to the gas output pipe through the first gas output branch in the first gas input pipeline road. The gas supply system according to claim 1, wherein the first gas input line comprises at least one gas input line arranged in a first direction, and the second gas input line comprises at least one gas input line along the first direction Gas Inputs for Arrangement Settings The pipeline, the first gas input pipeline and the second gas input pipeline are arranged along a second direction, and the second direction is perpendicular to the first direction. The gas supply system of claim 2, wherein, along the second direction, the gas output line is located between the first gas input line and the second gas input line. A gas delivery method, which is applied to the gas supply system described in any one of claim 1 to claim 3, the gas delivery method comprising: acquiring the first gas input pipeline and the second gas input pipeline The gas flow requirement output in the middle, the plurality of gas input pipelines include the first gas input pipeline and the second gas input pipeline, the first gas input pipeline outputs the first gas, and the second gas output Output the second gas in the pipeline, the flow demand of the first gas is greater than the flow demand of the second gas; control the first gas output branch in the first gas input pipeline to open, the first gas input pipe The second gas output branch in the pipeline is closed, and the first gas output branch in the first gas input pipeline is used to output the first gas to the gas output pipeline. The gas delivery method according to claim 4, wherein the second gas is output into the gas output pipeline by using the second gas output branch in the second gas input pipeline. The gas delivery method according to claim 5, wherein the gas supply system further comprises a third gas input pipeline, and a third gas is outputted from the third gas input pipeline, and the flow demand of the third gas is greater than that of the The flow demand of the second gas is smaller than the flow demand of the first gas, and the gas delivery method further includes: outputting the third gas through the second gas output branch in the third gas input pipeline gas into the gas output line. The gas delivery method according to claim 4, wherein, if the relative positions of the first gas input line and the second gas input line satisfy the first condition, use the second gas input line in the second gas input line A gas output branch or the second gas output branch outputs the second gas to the gas output pipeline; if the relative position of the first gas input pipeline and the second gas input pipeline does not satisfy the first gas input pipeline Condition, use the second gas output branch in the second gas input pipeline to output the second gas to the gas output pipeline; wherein, the first condition includes: along the third direction, the gas with large flow demand The distance between the first gas output branch in the input pipeline and the connection end of the gas output pipeline to the preset position is greater than the distance between the first gas output branch and the gas in the gas input pipeline with small flow requirements the distance between the connection end of the output pipeline and the preset position, where the preset position is one end of the gas output pipeline output to the chamber of the plasma processing equipment, and the third direction is in the gas output pipeline direction of gas flow. The gas delivery method according to claim 7, wherein the gas supply system further comprises a third gas input pipeline, the third gas input pipeline outputs a third gas, and the flow demand of the third gas is greater than that of the first gas. The flow requirement of the second gas is smaller than the flow requirement of the first gas. The gas delivery method according to claim 8, wherein the gas delivery method further comprises: if the third gas input line and the first gas input line do not satisfy the first condition, using the third gas input line The second gas output branch in the pipeline outputs the third gas to the gas output pipeline. The gas delivery method according to claim 8, wherein the gas delivery method further comprises: if the third gas input line and the first gas input line satisfy the first condition, using the third gas input line The first gas output branch circuit or the second gas output branch circuit in the output circuit outputs the third gas to the gas output pipeline. A plasma processing apparatus, comprising: a vacuum reaction chamber and a gas supply system according to any one of claim 1 to claim 3, the gas supply system being used to deliver process gas to the vacuum reaction chamber .

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