TWI770058B - Dye compound - Google Patents

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TWI770058B
TWI770058B TW106130644A TW106130644A TWI770058B TW I770058 B TWI770058 B TW I770058B TW 106130644 A TW106130644 A TW 106130644A TW 106130644 A TW106130644 A TW 106130644A TW I770058 B TWI770058 B TW I770058B
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TW201900774A (en
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青木
真鍋陽介
青井宏尚
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日商山田化學工業股份有限公司
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    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09BORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B57/00Other synthetic dyes of known constitution
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D239/00Heterocyclic compounds containing 1,3-diazine or hydrogenated 1,3-diazine rings
    • C07D239/02Heterocyclic compounds containing 1,3-diazine or hydrogenated 1,3-diazine rings not condensed with other rings
    • C07D239/24Heterocyclic compounds containing 1,3-diazine or hydrogenated 1,3-diazine rings not condensed with other rings having three or more double bonds between ring members or between ring members and non-ring members
    • C07D239/28Heterocyclic compounds containing 1,3-diazine or hydrogenated 1,3-diazine rings not condensed with other rings having three or more double bonds between ring members or between ring members and non-ring members with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, directly attached to ring carbon atoms
    • C07D239/32One oxygen, sulfur or nitrogen atom
    • C07D239/42One nitrogen atom
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/20Filters
    • G02B5/22Absorbing filters
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/20Filters
    • G02B5/28Interference filters

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Abstract

本發明之課題在於提供一種400nm附近之吸光度高之化合物。 An object of the present invention is to provide a compound having a high absorbance in the vicinity of 400 nm.

本發明係一種通式(1)表示之化合物。 The present invention is a compound represented by the general formula (1).

Figure 106130644-A0202-11-0001-1
Figure 106130644-A0202-11-0001-1

通式(1)中,m表示1~6之整數,Q1於m為1時表示氫原子,於m為2~6時表示2~6價之連結基,D1表示自通式(2)表示之化合物中脫去1個氫原子之基,於m為2~6時,多個D1可全部相同,亦可不同。 In the general formula (1), m represents an integer of 1 to 6, Q 1 represents a hydrogen atom when m is 1, and a linking group of 2 to 6 valences when m is 2 to 6, and D 1 represents the self-general formula (2 In the compound represented by ), a group from which one hydrogen atom is removed, when m is 2 to 6, a plurality of D 1 may all be the same or different.

Figure 106130644-A0202-11-0001-2
Figure 106130644-A0202-11-0001-2

通式(2)中,R1表示氫原子等,R2表示氫原子、氰基等。R3表示氫原子等。R402~R405相同或不同,表示氫原子、烷基等。 In the general formula (2), R 1 represents a hydrogen atom or the like, and R 2 represents a hydrogen atom, a cyano group or the like. R 3 represents a hydrogen atom or the like. R 402 to R 405 are the same or different, and represent a hydrogen atom, an alkyl group, or the like.

Description

色素化合物 pigment compounds

本發明係關於一種可用作色素之化合物等。 The present invention relates to a compound and the like which can be used as a pigment.

紫外線或藍光具有較強之能量,存在對視網膜造成損傷而造成眼疾之情形。因此,謀求可用作紫外線吸收劑或藍光截止用色料等之化合物。作為紫外線吸收劑,例如提出有使用次甲基系化合物代替二苯甲酮系或苯并三唑系紫外線吸收劑(專利文獻1及2)。 Ultraviolet rays or blue light have strong energy, and may damage the retina and cause eye diseases. Therefore, a compound that can be used as an ultraviolet absorber, a blue light cut-off colorant, or the like has been sought. As an ultraviolet absorber, it is proposed to use a methine type compound instead of a benzophenone type or a benzotriazole type ultraviolet absorber, for example (Patent Documents 1 and 2).

[專利文獻1]日本專利特開2009-067973號公報 [Patent Document 1] Japanese Patent Laid-Open No. 2009-067973

[專利文獻2]日本專利特開2011-184414號公報 [Patent Document 2] Japanese Patent Laid-Open No. 2011-184414

以往之次甲基系化合物由於可見光區域附近的吸光度低,故為了減少藍光,必須增加添加量。因此,於吸收光譜形狀或吸光度之方面需求改良。 Since the absorbance of the conventional methine-based compound is low in the vicinity of the visible light region, it is necessary to increase the amount of addition in order to reduce blue light. Therefore, there is a need for improvement in the shape or absorbance of the absorption spectrum.

本發明之主要目的在於提供一種400nm附近之吸光度高之化合物。 The main object of the present invention is to provide a compound having a high absorbance around 400 nm.

本發明人等為了解決上述課題而進行了努力研究,結果發現,下述通式(1)表示之具有含氮芳香環及拉電子性基的具有次甲基結構之化合物於400nm附近具有最大吸收,且400nm附近之吸光度高。本發明人等基於該見解進而反覆進行研究,從而完成了本發明。 As a result of diligent studies to solve the above-mentioned problems, the present inventors found that a compound having a nitrogen-containing aromatic ring and an electron-withdrawing group and having a methine structure represented by the following general formula (1) has an absorption maximum around 400 nm , and the absorbance near 400nm is high. Based on this knowledge, the inventors of the present invention conducted repeated studies and completed the present invention.

即,本發明之化合物之特徵在於由下述通式(1)表示。 That is, the compound of the present invention is characterized by being represented by the following general formula (1).

Figure 106130644-A0202-12-0002-3
Figure 106130644-A0202-12-0002-3

(通式(1)中,m表示1~6之整數,Q1於m為1時表示氫原子,於m為2~6時表示2~6價之連結基,D1表示自下述通式(2)表示之化合物中脫去1個氫原子之基,於m為2~6時,多個D1可全部相同,亦可不同;

Figure 106130644-A0202-12-0002-4
(In the general formula (1), m represents an integer of 1 to 6, Q 1 represents a hydrogen atom when m is 1, and a linking group of 2 to 6 valences when m is 2 to 6, and D 1 represents the following general In the compound represented by the formula (2), one hydrogen atom is removed, and when m is 2 to 6, a plurality of D 1 may all be the same or different;
Figure 106130644-A0202-12-0002-4

(通式(2)中,R1表示氫原子、可具有取代基之烷基或可具有取代基之芳基;R2表示氫原子、氰基、硝基、三氟甲基、含雜環之基、 -C(O)-R7或-SO2-R8;R7表示羥基或-OR71,R8表示鹵素原子、羥基、-OR81、-NR82R83或-R84;R71及R81~R84相同或不同,表示氫原子、可具有取代基之烷基或可具有取代基之芳基;R3表示氫原子、鹵素原子、氰基、可具有取代基之烷基或可具有取代基之芳基;R402及R403相同或不同,表示氫原子、鹵素原子、可具有取代基之烷基、可具有取代基之芳基、-NR406R407、-OR408、氰基、-C(O)R409、-O-C(O)R410或-C(O)OR411,R404~R411相同或不同,表示氫原子、可具有取代基之烷基或可具有取代基之芳基;亦可由R404與R405與R404及R405所鍵結之氮原子形成可具有取代基之4~8員之含氮雜環)) (In the general formula (2), R 1 represents a hydrogen atom, an alkyl group which may have a substituent or an aryl group which may have a substituent; R 2 represents a hydrogen atom, a cyano group, a nitro group, a trifluoromethyl group, a heterocyclic ring-containing group base, -C(O)-R 7 or -SO 2 -R 8 ; R 7 represents hydroxyl or -OR 71 , R 8 represents halogen atom, hydroxyl, -OR 81 , -NR 82 R 83 or -R 84 ; R 71 and R 81 to R 84 are the same or different, and represent a hydrogen atom, an alkyl group that may have a substituent or an aryl group that may have a substituent; R 3 represents a hydrogen atom, a halogen atom, a cyano group, an alkane that may have a substituent R 402 and R 403 are the same or different, and represent a hydrogen atom, a halogen atom, an alkyl group that may have a substituent, an aryl group that may have a substituent, -NR 406 R 407 , -OR 408 , cyano group, -C(O)R 409 , -OC(O)R 410 or -C(O)OR 411 , R 404 to R 411 are the same or different, and represent a hydrogen atom, an alkyl group which may have a substituent or Aryl which may have a substituent; a nitrogen-containing heterocycle of 4-8 members which may have a substituent may also be formed by the nitrogen atom bounded by R 404 and R 405 and R 404 and R 405 ))

於本發明中,較佳上述通式(1)中之m為1或2。 In the present invention, m in the above general formula (1) is preferably 1 or 2.

上述通式(1)表示之化合物較佳為下述通式(3)表示之化合物。 The compound represented by the above general formula (1) is preferably a compound represented by the following general formula (3).

Figure 106130644-A0202-12-0003-5
Figure 106130644-A0202-12-0003-5

(通式(3)中,R1a表示氫原子、可具有取代基之碳數1~20之烷基或可具有取代基之碳數6~20之芳基,R2a表示氫原子、氰基、硝基、三氟甲基、含雜環之基、-C(O)-R7a或-SO2-R8a;R7a表示羥基或-OR71a,R8a 表示鹵素原子、羥基、-OR81a、-NR82aR83a或-R84a;R71a及R81a~R84a相同或不同,表示氫原子、可具有取代基之碳數1~20之烷基或可具有取代基之碳數6~20之芳基;R3a表示氫原子、鹵素原子、氰基、可具有取代基之碳數1~20之烷基或可具有取代基之碳數6~20之芳基;R402a表示氫原子、鹵素原子、可具有取代基之碳數1~20之烷基、可具有取代基之碳數6~20之芳基、-NR406aR407a、-OR408a、氰基、-C(O)R409a、-O-C(O)R410a或-C(O)OR411a,R404a~R411a相同或不同,表示氫原子、可具有取代基之碳數1~20之烷基或可具有取代基之碳數6~20之芳基;亦可由R404a與R405a與R404a及R405a所鍵結之氮原子形成可具有取代基之4~8員之含氮雜環;R413表示氫原子、可具有取代基之碳數1~20之烷基、可具有取代基之碳數6~20之芳基,或者表示下述通式(4)表示之基;

Figure 106130644-A0202-12-0004-7
(In the general formula (3), R 1a represents a hydrogen atom, an alkyl group having 1 to 20 carbon atoms that may have a substituent, or an aryl group that may have a substituent group having 6 to 20 carbon atoms, and R 2a represents a hydrogen atom, a cyano group , nitro, trifluoromethyl, heterocyclic group, -C(O)-R 7a or -SO 2 -R 8a ; R 7a represents hydroxyl or -OR 71a , R 8a represents halogen atom, hydroxyl, -OR 81a , -NR 82a R 83a or -R 84a ; R 71a and R 81a to R 84a are the same or different, and represent a hydrogen atom, an alkyl group with 1 to 20 carbon atoms that may have a substituent, or a carbon number 6 that may have a substituent group Aryl group of ~20; R 3a represents a hydrogen atom, a halogen atom, a cyano group, an alkyl group with 1 to 20 carbon atoms which may have a substituent or an aryl group with 6 to 20 carbon atoms that may have a substituent; R 402a represents hydrogen Atom, halogen atom, alkyl group with 1 to 20 carbon atoms which may have a substituent, aryl group with 6 to 20 carbon atoms which may have a substituent, -NR 406a R 407a , -OR 408a , cyano group, -C(O ) R 409a , -OC(O)R 410a or -C(O)OR 411a , R 404a ~R 411a are the same or different, and represent a hydrogen atom, an alkyl group with 1 to 20 carbon atoms that may have a substituent or a substituent The aryl group of the carbon number of the base is 6~20; it can also form a nitrogen-containing heterocyclic ring with 4~8 members that can have substituents by the nitrogen atoms bonded by R 404a and R 405a and R 404a and R 405a ; R 413 represents hydrogen Atom, an optionally substituted alkyl group with 1 to 20 carbon atoms, an optionally substituted aryl group with 6 to 20 carbon atoms, or a group represented by the following general formula (4);
Figure 106130644-A0202-12-0004-7

(通式(4)中,Q2表示可具有取代基之碳數1~20之2價烴基,*表示與通式(3)之鍵結部位;R1b表示氫原子、可具有取代基之碳數1~20之烷基或可具有取代基之碳數6~20之芳基,R2b表示氫原子、氰基、硝基、三氟甲基、含雜環之基、-C(O)-R7b或-SO2-R8b;R7b表示羥基或-OR71b,R8b表示鹵素原子、羥基、-OR81b、 -NR82bR83b或-R84b;R71b及R81b~R84b相同或不同,表示氫原子、可具有取代基之碳數1~20之烷基或可具有取代基之碳數6~20之芳基;R3b表示氫原子、鹵素原子、氰基、可具有取代基之碳數1~20之烷基或可具有取代基之碳數6~20之芳基;R402b表示氫原子、鹵素原子、可具有取代基之碳數1~20之烷基、可具有取代基之碳數6~20之芳基、-NR406bR407b、-OR408b、氰基、-C(O)R409b、-O-C(O)R410b或-C(O)OR411b,R404b~R411b相同或不同,表示氫原子、可具有取代基之碳數1~20之烷基或可具有取代基之碳數6~20之芳基;亦可由R404b與R405b與R404b及R405b所鍵結之氮原子形成可具有取代基之4~8員之含氮雜環)) (In the general formula (4), Q 2 represents a divalent hydrocarbon group with 1 to 20 carbon atoms which may have a substituent, * represents a bonding site with the general formula (3); R 1b represents a hydrogen atom, which may have a substituent Alkyl with 1 to 20 carbon atoms or aryl group with 6 to 20 carbon atoms that may have substituents, R 2b represents a hydrogen atom, a cyano group, a nitro group, a trifluoromethyl group, a group containing a heterocyclic ring, -C(O )-R 7b or -SO 2 -R 8b ; R 7b represents a hydroxyl group or -OR 71b , R 8b represents a halogen atom, a hydroxyl group, -OR 81b , -NR 82b R 83b or -R 84b ; R 71b and R 81b ~R 84b are the same or different, and represent a hydrogen atom, an alkyl group with a carbon number of 1 to 20 that may have a substituent or an aryl group with a carbon number of 6 to 20 that may have a substituent; R 3b represents a hydrogen atom, a halogen atom, a cyano group, C 1-20 alkyl group with substituent or aryl group with carbon number 6-20 which may have substituent; R 402b represents hydrogen atom, halogen atom, alkyl group with 1-20 carbon number which may have substituent, Aryl with 6 to 20 carbon atoms, -NR 406b R 407b , -OR 408b , cyano group, -C(O)R 409b , -OC(O)R 410b or -C(O)OR 411b , R 404b ~ R 411b are the same or different, and represent a hydrogen atom, an alkyl group with a carbon number of 1 to 20 that can have a substituent or an aryl group with a carbon number of 6 to 20 that can have a substituent; R 404b and R 405b and The nitrogen atoms that R 404b and R 405b are bonded to form a nitrogen-containing heterocycle of 4 to 8 members which may have substituents))

於本發明之一態樣中,較佳上述R413為上述通式(4)表示之基。 In one aspect of the present invention, preferably, the above R 413 is a group represented by the above general formula (4).

上述通式(1)表示之化合物亦較佳為下述通式(5)表示之化合物。

Figure 106130644-A0202-12-0005-8
The compound represented by the above general formula (1) is also preferably a compound represented by the following general formula (5).
Figure 106130644-A0202-12-0005-8

(通式(5)中,R2c表示氫原子、氰基、硝基、三氟甲基、含雜環之基、-C(O)-R7c或-SO2-R8c;R7c表示羥基或-OR71c,R8c表示鹵素原子、羥基、-OR81c、-NR82cR83c或-R84c;R71c及R81c~R84c相同或不同,表示氫原子、 可具有取代基之碳數1~20之烷基或可具有取代基之碳數6~20之芳基;R3c表示氫原子、鹵素原子、氰基、可具有取代基之碳數1~20之烷基或可具有取代基之碳數6~20之芳基;R402c及R403c相同或不同,表示氫原子、鹵素原子、可具有取代基之碳數1~20之烷基、可具有取代基之碳數6~20之芳基、-NR406cR407c、-OR408c、氰基、-C(O)R409c、-O-C(O)R410c或-C(O)OR411c,R404c~R411c相同或不同,表示氫原子、可具有取代基之碳數1~20之烷基或可具有取代基之碳數6~20之芳基。亦可由R404c與R405c與R404c及R405c所鍵結之氮原子形成可具有取代基之4~8員之含氮雜環;R501表示氫原子、可具有取代基之碳數1~20之烷基、可具有取代基之碳數6~20之芳基或下述通式(6)表示之基;

Figure 106130644-A0202-12-0006-9
(In the general formula (5), R 2c represents a hydrogen atom, a cyano group, a nitro group, a trifluoromethyl group, a group containing a heterocyclic ring, -C(O)-R 7c or -SO 2 -R 8c ; R 7c represents Hydroxyl or -OR 71c , R 8c represents a halogen atom, hydroxyl, -OR 81c , -NR 82c R 83c or -R 84c ; R 71c and R 81c to R 84c are the same or different, represent a hydrogen atom, a carbon that may have a substituent Alkyl with 1 to 20 carbon atoms or aryl group with 6 to 20 carbon atoms that may have substituents; R 3c represents hydrogen atom, halogen atom, cyano group, alkyl group with 1 to 20 carbon atoms that may have substituents or may have The aryl group with 6~20 carbon atoms of the substituent; R 402c and R 403c are the same or different, and represent a hydrogen atom, a halogen atom, an alkyl group with a carbon number of 1~20 that may have a substituent, and a carbon number 6 that may have a substituent Aryl group of ~20, -NR 406c R 407c , -OR 408c , cyano group, -C(O)R 409c , -OC(O)R 410c or -C(O)OR 411c , R 404c ~R 411c are the same or Differently, it represents a hydrogen atom, an alkyl group with a carbon number of 1 to 20 that may have a substituent, or an aryl group with a carbon number of 6 to 20 that may have a substituent. The nitrogen atom forms a nitrogen-containing heterocyclic ring with 4 to 8 members that may have a substituent; R 501 represents a hydrogen atom, an alkyl group with a carbon number of 1 to 20 that may have a substituent, and an alkyl group with a carbon number of 6 to 20 that may have a substituent. An aryl group or a group represented by the following general formula (6);
Figure 106130644-A0202-12-0006-9

(通式(6)中,Q3表示可具有取代基之碳數1~20之2價烴基,*表示與通式(5)之鍵結部位;R2d表示氫原子、氰基、硝基、三氟甲基、含雜環之基、-C(O)-R7d或-SO2-R8d;R7d表示羥基或-OR71d;R8d表示鹵素原子、羥基、-OR81d、-NR82dR83d或-R84d;R71d及R81d~R84d相同或不同,表示氫原子、可具有取代基之碳數1~20之烷基或可具有取代基之碳數6~20之芳基; R3d表示氫原子、鹵素原子、氰基、可具有取代基之碳數1~20之烷基或可具有取代基之碳數6~20之芳基;R402d及R403d相同或不同,表示氫原子、鹵素原子、可具有取代基之碳數1~20之烷基、可具有取代基之碳數6~20之芳基、-NR406dR407d、-OR408d、氰基、-C(O)R409d、-O-C(O)R410d或-C(O)OR411d,R404d~R411d相同或不同,表示氫原子、可具有取代基之碳數1~20之烷基或可具有取代基之碳數6~20之芳基;亦可由R404d與R405d與R404d及R405d所鍵結之氮原子形成可具有取代基之4~8員之含氮雜環)) (In the general formula (6), Q 3 represents a divalent hydrocarbon group having 1 to 20 carbon atoms which may have a substituent, * represents a bonding site with the general formula (5); R 2d represents a hydrogen atom, a cyano group, a nitro group , trifluoromethyl, group containing a heterocyclic ring, -C(O)-R 7d or -SO 2 -R 8d ; R 7d represents hydroxyl or -OR 71d ; R 8d represents halogen atom, hydroxyl, -OR 81d , - NR 82d R 83d or -R 84d ; R 71d and R 81d to R 84d are the same or different, and represent a hydrogen atom, an alkyl group with 1 to 20 carbon atoms that may have a substituent, or an alkyl group with 6 to 20 carbon atoms that may have a substituent Aryl; R 3d represents a hydrogen atom, a halogen atom, a cyano group, an alkyl group with 1 to 20 carbon atoms that may have a substituent or an aryl group with 6 to 20 carbon atoms that may have a substituent; R 402d and R 403d are the same or Different, it represents a hydrogen atom, a halogen atom, an alkyl group with 1 to 20 carbon atoms that may have a substituent, an aryl group with 6 to 20 carbon atoms that may have a substituent, -NR 406d R 407d , -OR 408d , cyano group, -C(O)R 409d , -OC(O)R 410d or -C(O)OR 411d , R 404d to R 411d are the same or different, and represent a hydrogen atom, an alkyl group having 1 to 20 carbon atoms that may have a substituent Or an aryl group with a carbon number of 6 to 20 that may have a substituent; a nitrogen-containing heterocyclic ring with 4 to 8 members that may have a substituent can also be formed from the nitrogen atoms bound by R 404d and R 405d and R 404d and R 405d ) )

於本發明之一態樣中,上述R501較佳為上述通式(6)表示之基。 In one aspect of the present invention, the above-mentioned R 501 is preferably a group represented by the above-mentioned general formula (6).

本發明之色素組成物之特徵在於含有本發明之化合物。 The pigment composition of the present invention is characterized by containing the compound of the present invention.

本發明之藍光屏蔽成形體之特徵在於含有本發明之化合物。 The blue light shielding molded body of the present invention is characterized by containing the compound of the present invention.

本發明之紫外線吸收劑之特徵在於含有本發明之化合物。 The ultraviolet absorber of the present invention is characterized by containing the compound of the present invention.

根據本發明,可提供一種400nm附近之吸光度高之化合物。本發明之化合物可合適地用作藍光屏蔽成形體等之色素等。 According to the present invention, a compound having a high absorbance around 400 nm can be provided. The compound of the present invention can be suitably used as a dye or the like for a blue light shielding molded body or the like.

本發明之化合物係上述通式(1)表示之化合物。於本說明書中,將上述通式(1)表示之化合物亦稱為化合物(1)。其他式編號之化合物亦相同,例如將通式(2)表示之化合物亦稱為化合物(2)。 The compound of the present invention is a compound represented by the above-mentioned general formula (1). In this specification, the compound represented by the said general formula (1) is also called compound (1). The same applies to compounds numbered by other formulae. For example, the compound represented by general formula (2) is also referred to as compound (2).

於本發明之化合物(1)中存在幾何學異構之情形時,本發明包含其幾何學異構物之任一者。又,於本發明之化合物(1)中存在1個以上之不對稱碳原子之情形時,本發明包含各個不對稱碳原子為R配置之化合物、為S配置之化合物及該等之任意組合之化合物之任一者。又,該等之外消旋化合物(racemic compound)、外消旋混合物、單一之鏡像異構物(enantiomer)、非鏡像異構物(diastereomer)混合物之任一者均包含於本發明中。 When there is geometric isomerism in the compound (1) of the present invention, the present invention includes any one of the geometric isomers. In addition, when there is one or more asymmetric carbon atoms in the compound (1) of the present invention, the present invention includes compounds in which each asymmetric carbon atom is arranged in R, compounds in which it is arranged in S, and any combination thereof. any of the compounds. In addition, any of these racemic compounds, racemic mixtures, single enantiomers, and diastereomer mixtures are included in the present invention.

上述通式(1)中,m表示1~6之整數。若m為2~6,則化合物(1)之耐熱性提高,故而較佳。於本發明之一態樣中,m較佳為1或2,更佳為2。 In the above general formula (1), m represents an integer of 1 to 6. When m is 2 to 6, since the heat resistance of the compound (1) is improved, it is preferable. In one aspect of the present invention, m is preferably 1 or 2, more preferably 2.

Q1於m為1時表示氫原子,於m為2~6時表示2~6價之連結基。 When m is 1, Q 1 represents a hydrogen atom, and when m is 2 to 6, it represents a 2- to 6-valent linking group.

作為2~6價之連結基,例如可列舉可具有取代基之碳數1~20之2~6價之烴基、-SO2-等。 Examples of the divalent to hexavalent linking group include a 2 to hexavalent hydrocarbon group having 1 to 20 carbon atoms which may have a substituent, -SO 2 -, and the like.

作為可具有取代基之碳數1~20之2~6價之烴基,可列舉可具有取代基之碳數1~20之直鏈、分支或環狀之2~6價之烷基、可具有取代基之碳數6~20之2~6價之伸芳基。Q1較佳為氫原子或2價之連結基。 Examples of the 2- to 6-valent hydrocarbon group having 1 to 20 carbon atoms which may have a substituent include a linear, branched or cyclic 2-6 valent alkyl group having 1 to 20 carbon atoms which may have a substituent; A 2- to 6-valent extended aryl group with 6 to 20 carbon atoms in the substituent. Q 1 is preferably a hydrogen atom or a divalent linking group.

作為2價之連結基,較佳為可具有取代基之碳數1~20之2價烴基、-SO2-等,更佳為可具有取代基之碳數1~20之2價烴基。可具有取代基之碳數1~20之2價烴基較佳為可具有取代基之碳數1~20之直鏈、分支或環狀之2價烷基、可具有取代基之碳數6~20之2價伸芳基。 The divalent linking group is preferably a divalent hydrocarbon group having 1 to 20 carbon atoms which may have a substituent, -SO 2 - and the like, and more preferably a divalent hydrocarbon group having 1 to 20 carbon atoms which may have a substituent. The divalent hydrocarbon group with 1 to 20 carbon atoms which may have a substituent is preferably a linear, branched or cyclic divalent alkyl group with 1 to 20 carbon atoms which may have a substituent, and a 6~20 carbon group which may have a substituent 20 of the 2-valent aryl extended.

碳數1~20之直鏈、分支或環狀之2價烷基亦可為於碳-碳間插入有氧原子、硫原子或可具有取代基之伸芳基之2價烷基,較佳為-(CH2)k1-(k1表 示1~20之整數)表示之碳數1~20之直鏈狀之2價烷基,例如可列舉亞甲基、伸乙基、伸丙基、伸丁基、伸戊基、伸己基、伸庚基、伸辛基、伸癸基等。又,亦較佳為經1個以上之鹵素原子取代之2價烷基,例如可列舉雙(三氟甲基)亞甲基等。直鏈狀之2價烷基之碳數更佳為2~10(上述式中之k1為2~10),進而較佳為4~8(上述式中之k1為4~8)。 The linear, branched or cyclic divalent alkyl group with 1 to 20 carbon atoms can also be a divalent alkyl group in which an oxygen atom, a sulfur atom or an aryl extended group which may have a substituent is inserted between carbon-carbon, preferably It is a linear divalent alkyl group with 1 to 20 carbon atoms represented by -(CH 2 ) k1 -(k1 represents an integer of 1 to 20), for example, methylene group, ethylidene group, propylidene group, ethylene group Butyl, pentyl, hexyl, heptyl, octyl, decyl, etc. Moreover, a divalent alkyl group substituted with one or more halogen atoms is also preferable, and examples thereof include bis(trifluoromethyl)methylene and the like. The carbon number of the linear divalent alkyl group is more preferably 2 to 10 (k1 in the above formula is 2 to 10), more preferably 4 to 8 (k1 in the above formula is 4 to 8).

作為可具有取代基之碳數6~20之2價伸芳基,例如較佳為下述通式(20)表示之基。 As the divalent aryl extended group having 6 to 20 carbon atoms which may have a substituent, for example, a group represented by the following general formula (20) is preferable.

Figure 106130644-A0202-12-0009-10
Figure 106130644-A0202-12-0009-10

上述通式(20)中,X相互獨立地表示鹵素原子、硝基、羥基、磺基、碳數1~3之烷基或碳數1~3之烷氧基,s表示0~4之整數。苯環之2處結合鍵可為o-、m-、p-配向之任一種。又,較佳為苯環不具有取代基(s=0)。 In the above general formula (20), X independently represents a halogen atom, a nitro group, a hydroxyl group, a sulfo group, an alkyl group having 1 to 3 carbon atoms or an alkoxy group having 1 to 3 carbon atoms, and s represents an integer of 0 to 4. . The 2-position bond of the benzene ring can be any of o-, m-, and p-alignments. Moreover, it is preferable that a benzene ring does not have a substituent (s=0).

通式(1)中,D1表示自化合物(2)中脫去1個氫原子之基。自化合物(2)中脫去1個氫原子之基亦可稱為自化合物(2)中去掉1個氫原子之基。化合物(2)含有含氮芳香環及拉電子性基,且含有可成為色素之次甲基結構。化合物(1)由於含有此種次甲基結構,因此可用作色素化合物。於m為2~6時,多個D1可全部相同,亦可不同。於一態樣中,較佳為多個D1全部相同。 In the general formula (1), D 1 represents a group from which one hydrogen atom is removed from the compound (2). The group from which one hydrogen atom is removed from the compound (2) may also be referred to as a group from which one hydrogen atom is removed from the compound (2). The compound (2) contains a nitrogen-containing aromatic ring and an electron-withdrawing group, and contains a methine structure that can become a dye. Since the compound (1) contains such a methine structure, it can be used as a dye compound. When m is 2 to 6, the plurality of D 1 may all be the same or different. In one aspect, it is preferred that the plurality of D 1s are all the same.

通式(1)中,m為1之化合物(1)係化合物(2)。將m為1之化合 物(1)亦稱為單體化合物。m為2~6之化合物(1)係具有藉由連結基(Q1)將自化合物(2)中脫去氫原子之基連結2~6個而成的2~6聚物結構之化合物。亦可將m為2~6之化合物(1)稱為2~6聚物化合物。 In the general formula (1), the compound (1) in which m is 1 is the compound (2). The compound (1) in which m is 1 is also referred to as a monomer compound. The compound (1) in which m is 2 to 6 is a compound having a 2 to 6-mer structure in which 2 to 6 groups from which a hydrogen atom is removed from the compound (2) are connected by a linking group (Q 1 ). The compound (1) in which m is 2 to 6 may also be referred to as a 2 to 6 polymer compound.

D1較佳為自化合物(2)之R1、R403或R404中脫去1個氫原子之基(於R1為氫原子之情形時,係脫去R1之基),更佳為自R1或R403中脫去1個氫原子之基。換言之,於通式(1)中,Q1較佳鍵結於通式(2)中之R1、R403或R404之部分,更佳鍵結於R1或R403之部分。 D 1 is preferably a group from which one hydrogen atom is removed from R 1 , R 403 or R 404 of compound (2) (in the case where R 1 is a hydrogen atom, the group from which R 1 is removed), more preferably It is a base for removing 1 hydrogen atom from R 1 or R 403 . In other words, in the general formula (1), Q 1 is preferably bonded to a part of R 1 , R 403 or R 404 in the general formula (2), more preferably a part of R 1 or R 403 .

通式(2)中,R1表示氫原子、可具有取代基之烷基或可具有取代基之芳基。作為可具有取代基之烷基,可列舉可具有取代基之碳數1~20之烷基。作為可具有取代基之芳基,可列舉可具有取代基之碳數6~20之芳基。通式(2)中之-C(O)-O-R1為拉電子性基。R1較佳為可具有取代基之碳數1~20之烷基或可具有取代基之碳數6~20之芳基,更佳為可具有取代基之碳數1~20之烷基。 In the general formula (2), R 1 represents a hydrogen atom, an optionally substituted alkyl group, or an optionally substituted aryl group. As an alkyl group which may have a substituent, the alkyl group of C1-C20 which may have a substituent is mentioned. As an aryl group which may have a substituent, the C6-C20 aryl group which may have a substituent is mentioned. -C(O)-OR 1 in the general formula (2) is an electron-withdrawing group. R 1 is preferably an optionally substituted alkyl group having 1 to 20 carbon atoms or an optionally substituted aryl group having 6 to 20 carbon atoms, more preferably an optionally substituted alkyl group having 1 to 20 carbon atoms.

R2表示氫原子、氰基、硝基、三氟甲基(CF3基)、含雜環之基、-C(O)-R7或-SO2-R8。R7表示羥基或-OR71,R8表示鹵素原子、羥基、-OR81、-NR82R83或-R84。R71及R81~R84相同或不同,表示氫原子、可具有取代基之烷基或可具有取代基之芳基。 R 2 represents a hydrogen atom, a cyano group, a nitro group, a trifluoromethyl group (CF 3 group), a group containing a heterocyclic ring, -C(O)-R 7 or -SO 2 -R 8 . R 7 represents a hydroxyl group or -OR 71 , and R 8 represents a halogen atom, a hydroxyl group, -OR 81 , -NR 82 R 83 or -R 84 . R 71 and R 81 to R 84 are the same or different, and represent a hydrogen atom, an optionally substituted alkyl group, or an optionally substituted aryl group.

作為R2中之含雜環之基,可列舉:吡咯環、吡啶環、喹啉環、嘧啶環、嗒

Figure 106130644-A0202-12-0010-38
環、吡
Figure 106130644-A0202-12-0010-39
環、咪唑環、苯并咪唑環、三
Figure 106130644-A0202-12-0010-40
環、三唑環、四唑環等含氮雜環;呋喃環、苯并呋喃環等含氧雜環;噻吩環、苯并噻吩環等含硫雜環;
Figure 106130644-A0202-12-0010-41
唑環、苯并
Figure 106130644-A0202-12-0010-42
唑環等含有氧原子及氮原子之雜環;噻唑環、苯并噻唑環、噻二唑環等含硫雜環等;該等環亦可進而與其他碳環(例 如苯環)或雜環(例如吡啶環)形成縮合環,較佳為
Figure 106130644-A0202-12-0011-43
唑環、苯并
Figure 106130644-A0202-12-0011-44
唑環。 Examples of the group containing a heterocyclic ring in R 2 include pyrrole ring, pyridine ring, quinoline ring, pyrimidine ring, pyridine ring, and pyridine ring.
Figure 106130644-A0202-12-0010-38
Cyclo, pyridine
Figure 106130644-A0202-12-0010-39
ring, imidazole ring, benzimidazole ring, three
Figure 106130644-A0202-12-0010-40
Nitrogen-containing heterocycles such as ring, triazole ring and tetrazole ring; oxygen-containing heterocycles such as furan ring and benzofuran ring; sulfur-containing heterocycles such as thiophene ring and benzothiophene ring;
Figure 106130644-A0202-12-0010-41
azole ring, benzo
Figure 106130644-A0202-12-0010-42
Heterocycles containing oxygen atoms and nitrogen atoms such as azole rings; sulfur-containing heterocycles such as thiazole rings, benzothiazole rings, thiadiazole rings, etc.; these rings can also be further combined with other carbon rings (such as benzene rings) or heterocycles (such as a pyridine ring) to form a condensed ring, preferably
Figure 106130644-A0202-12-0011-43
azole ring, benzo
Figure 106130644-A0202-12-0011-44
azole ring.

於本發明之一態樣中,作為R2中之含雜環之基,較佳為自苯并

Figure 106130644-A0202-12-0011-45
唑環或
Figure 106130644-A0202-12-0011-46
唑環之氮與氧之間的碳(2位)脫去氫原子之基(亦可稱為去掉氫原子之基),更佳為自苯并
Figure 106130644-A0202-12-0011-47
唑環之氮與氧之間的碳(2位)脫去氫原子之基。 In one aspect of the present invention, as the group containing a heterocyclic ring in R 2 , it is preferably from benzo
Figure 106130644-A0202-12-0011-45
azole ring or
Figure 106130644-A0202-12-0011-46
The carbon (2-position) between the nitrogen and oxygen of the azole ring is a base from which a hydrogen atom is removed (also called a base from which a hydrogen atom is removed), more preferably from benzo
Figure 106130644-A0202-12-0011-47
The carbon (2-position) between the nitrogen and oxygen of the azole ring removes the hydrogen atom.

又,例如,於通式(1)中,m為2~6,R2為自苯并

Figure 106130644-A0202-12-0011-48
唑環或
Figure 106130644-A0202-12-0011-49
唑環中脫去氫原子之基,於Q1與D1於化合物(2)之R2之部位鍵結之情形時,R2較佳為以苯并
Figure 106130644-A0202-12-0011-50
唑環或
Figure 106130644-A0202-12-0011-51
唑環之氮與氧之間的碳(2位)以外之碳原子與Q1鍵結。 Also, for example, in the general formula (1), m is 2 to 6, and R 2 is from benzo
Figure 106130644-A0202-12-0011-48
azole ring or
Figure 106130644-A0202-12-0011-49
In the base of dehydrogen atom in the azole ring, when Q 1 and D 1 are bonded at the position of R 2 of compound (2), R 2 is preferably benzo
Figure 106130644-A0202-12-0011-50
azole ring or
Figure 106130644-A0202-12-0011-51
A carbon atom other than the carbon (2-position) between nitrogen and oxygen of the azole ring is bonded to Q 1 .

作為R1、R71、R81、R82、R83及R84中之可具有取代基之烷基,可列舉可具有取代基之碳數1~20之烷基。作為可具有取代基之碳數1~20之烷基,可列舉下述可具有取代基之碳數1~20之直鏈、分支或環狀之烷基。於本發明之一態樣中,可具有取代基之碳數1~20之烷基較佳為碳數4~20之直鏈、分支或環狀之烷基,較佳為碳數為4以上之分支或環狀之立體性體積大之烷基,更佳為碳數6~20之環狀之烷基,尤佳為可具有直鏈或分支烷基作為取代基之環狀之烷基。作為R1、R71、R81、R82、R83及R84中之碳數1~20之烷基,例如較佳為甲基、乙基、正丙基、異丙基、正丁基、異丁基、第三丁基、正己基、環己基、正辛基、2-乙基己基、4-第三丁基環己基、2,6-二-第三丁基-4-甲基環己基等,更佳為第三丁基、環己基、4-第三丁基環己基、2,6-二-第三丁基-4-甲基環己基等,進而較佳為4-第三丁基環己基、2,6-二-第三丁基-4-甲基環己基等。 Examples of the optionally substituted alkyl group among R 1 , R 71 , R 81 , R 82 , R 83 and R 84 include optionally substituted alkyl groups having 1 to 20 carbon atoms. Examples of the alkyl group having 1 to 20 carbon atoms which may have a substituent include the following linear, branched or cyclic alkyl groups having 1 to 20 carbon atoms which may have a substituent. In one aspect of the present invention, the alkyl group with 1 to 20 carbon atoms that may have a substituent is preferably a straight-chain, branched or cyclic alkyl group with 4 to 20 carbon atoms, preferably 4 or more carbon atoms. The branched or cyclic sterically bulky alkyl group is more preferably a cyclic alkyl group having 6 to 20 carbon atoms, and particularly preferably a cyclic alkyl group which may have a straight-chain or branched alkyl group as a substituent. As the alkyl group having 1 to 20 carbon atoms in R 1 , R 71 , R 81 , R 82 , R 83 and R 84 , for example, methyl, ethyl, n-propyl, isopropyl, n-butyl are preferred , isobutyl, tert-butyl, n-hexyl, cyclohexyl, n-octyl, 2-ethylhexyl, 4-tert-butylcyclohexyl, 2,6-di-tert-butyl-4-methyl Cyclohexyl, etc., more preferably tert-butyl, cyclohexyl, 4-tert-butylcyclohexyl, 2,6-di-tert-butyl-4-methylcyclohexyl, etc., more preferably 4-tert-butylcyclohexyl Tributylcyclohexyl, 2,6-di-tert-butyl-4-methylcyclohexyl, etc.

作為R1、R71、R81、R82、R83及R84中之可具有取代基之芳基,可列舉可 具有取代基之碳數6~20之芳基。作為可具有取代基之碳數6~20之芳基,可列舉下述可具有取代基之碳數6~20之芳基,例如較佳為可經烷基取代之苯基(例如苯基、3-甲基苯基、2,6-二甲基苯基等)等。 Among R 1 , R 71 , R 81 , R 82 , R 83 and R 84 , the optionally substituted aryl group includes an optionally substituted aryl group having 6 to 20 carbon atoms. Examples of the aryl group having 6 to 20 carbon atoms which may have a substituent include the following aryl groups having 6 to 20 carbon atoms which may have a substituent, for example, preferably a phenyl group which may be substituted with an alkyl group (for example, phenyl, 3-methylphenyl, 2,6-dimethylphenyl, etc.) and the like.

R1較佳為正丁基、第二丁基、異丁基、第三丁基、正戊基、正己基、環己基、正辛基、2-乙基己基、4-第三丁基環己基、2,6-二-第三丁基-4-甲基環己基等,更佳為4-第三丁基環己基、2,6-二-第三丁基-4-甲基環己基等。 R 1 is preferably n-butyl, sec-butyl, isobutyl, tert-butyl, n-pentyl, n-hexyl, cyclohexyl, n-octyl, 2-ethylhexyl, 4-tert-butyl ring Hexyl, 2,6-di-tert-butyl-4-methylcyclohexyl, etc., more preferably 4-tert-butylcyclohexyl, 2,6-di-tert-butyl-4-methylcyclohexyl Wait.

R2較佳為氰基、硝基、三氟甲基、含雜環之基、-C(O)-R7或-SO2-R8,更佳為氰基、含雜環之基或-C(O)-R7,進而較佳為氰基或-C(O)-OR71R 2 is preferably a cyano group, a nitro group, a trifluoromethyl group, a group containing a heterocyclic ring, -C(O)-R 7 or -SO 2 -R 8 , more preferably a cyano group, a group containing a heterocyclic ring or -C(O)-R 7 , more preferably cyano or -C(O)-OR 71 .

R71及R81相同或不同,例如較佳為甲基、乙基、正丙基、異丙基、正丁基、第二丁基、異丁基、第三丁基、正戊基、正己基、環己基、正辛基、2-乙基己基、4-第三丁基環己基、2,6-二-第三丁基-4-甲基環己基等,更佳為4-第三丁基環己基、2,6-二-第三丁基-4-甲基環己基等。R82較佳為氫原子。R83較佳為氫原子、苯基、3-甲基苯基或2,6-二甲基苯基。R84較佳為甲基、乙基、第三丁基、環己基、苯基、萘基等。 R 71 and R 81 are the same or different, for example, preferably methyl, ethyl, n-propyl, isopropyl, n-butyl, sec-butyl, isobutyl, tert-butyl, n-pentyl, n-hexyl cyclohexyl, cyclohexyl, n-octyl, 2-ethylhexyl, 4-tert-butylcyclohexyl, 2,6-di-tert-butyl-4-methylcyclohexyl, etc., more preferably 4-tertiary Butylcyclohexyl, 2,6-di-tert-butyl-4-methylcyclohexyl, etc. R 82 is preferably a hydrogen atom. R 83 is preferably a hydrogen atom, phenyl, 3-methylphenyl or 2,6-dimethylphenyl. R 84 is preferably methyl, ethyl, tert-butyl, cyclohexyl, phenyl, naphthyl and the like.

通式(2)中,R3表示氫原子、鹵素原子、氰基、可具有取代基之烷基或可具有取代基之芳基。 In the general formula (2), R 3 represents a hydrogen atom, a halogen atom, a cyano group, an optionally substituted alkyl group, or an optionally substituted aryl group.

R402及R403相同或不同,表示氫原子、鹵素原子、可具有取代基之烷基、可具有取代基之芳基、-NR406R407、-OR408、氰基、-C(O)R409、-O-C(O)R410或-C(O)OR411R 402 and R 403 are the same or different, and represent a hydrogen atom, a halogen atom, an alkyl group which may have a substituent, an aryl group which may have a substituent, -NR 406 R 407 , -OR 408 , a cyano group, -C(O) R 409 , -OC(O)R 410 or -C(O)OR 411 .

R404~R411相同或不同,表示氫原子、可具有取代基之烷基或可具有取代基之芳基。亦可由R404與R405與R404及R405所鍵結之氮原子形成可具有取代基 之4~8員之含氮雜環。 R 404 to R 411 are the same or different and represent a hydrogen atom, an alkyl group which may have a substituent, or an aryl group which may have a substituent. A nitrogen-containing heterocycle of 4 to 8 members which may have a substituent can also be formed from the nitrogen atom to which R 404 and R 405 are bonded to R 404 and R 405 .

作為R3、R402及R403中之烷基,例如可列舉碳數1~20之直鏈、分支或環狀之烷基。作為碳數1~20之直鏈、分支或環狀之烷基,具體而言可列舉:甲基、乙基、正丙基、異丙基、正丁基、異丁基、第二丁基、第三丁基、正戊基、2-甲基丁基、1-甲基丁基、新戊基、1,2-二甲基丙基、1,1-二甲基丙基、環戊基、正己基、4-甲基戊基、3-甲基戊基、2-甲基戊基、1-甲基戊基、3,3-二甲基丁基、2,3-二甲基丁基、1,3-二甲基丁基、2,2-二甲基丁基、1,2-二甲基丁基、1,1-二甲基丁基、2-乙基丁基、1-乙基丁基、1,1,2-三甲基丁基、1-乙基-2-甲基丙基、環己基、正庚基、2-甲基己基、3-甲基己基、4-甲基己基、5-甲基己基、2,4-二甲基戊基、正辛基、2-乙基己基、2,5-二甲基己基、2,4-二甲基己基、2,2,4-三甲基戊基、第三辛基、正壬基、3,5,5-三甲基己基、正癸基、4-乙基辛基、4-乙基-4,5-二甲基己基、4-第三丁基環己基、正十一烷基、正十二烷基、1,3,5,7-四甲基辛基、4-丁基辛基、6,6-二乙基辛基、正十三烷基、6-甲基-4-丁基辛基、正十四烷基、正十五烷基、3,5-二甲基十七烷基、2,6-二甲基十七烷基、2,4-二甲基十七烷基、2,2,5,5-四甲基己基、1-環戊基-2,2-二甲基丙基、1-環己基-2,2-二甲基丙基、2,6-二-第三丁基-4-甲基環己基、正十八烷基等。 Examples of the alkyl group among R 3 , R 402 and R 403 include linear, branched, or cyclic alkyl groups having 1 to 20 carbon atoms. Specific examples of linear, branched or cyclic alkyl groups having 1 to 20 carbon atoms include methyl, ethyl, n-propyl, isopropyl, n-butyl, isobutyl, and sec-butyl. , tert-butyl, n-pentyl, 2-methylbutyl, 1-methylbutyl, neopentyl, 1,2-dimethylpropyl, 1,1-dimethylpropyl, cyclopentyl base, n-hexyl, 4-methylpentyl, 3-methylpentyl, 2-methylpentyl, 1-methylpentyl, 3,3-dimethylbutyl, 2,3-dimethyl Butyl, 1,3-dimethylbutyl, 2,2-dimethylbutyl, 1,2-dimethylbutyl, 1,1-dimethylbutyl, 2-ethylbutyl, 1-ethylbutyl, 1,1,2-trimethylbutyl, 1-ethyl-2-methylpropyl, cyclohexyl, n-heptyl, 2-methylhexyl, 3-methylhexyl, 4-methylhexyl, 5-methylhexyl, 2,4-dimethylpentyl, n-octyl, 2-ethylhexyl, 2,5-dimethylhexyl, 2,4-dimethylhexyl, 2,2,4-trimethylpentyl, tert-octyl, n-nonyl, 3,5,5-trimethylhexyl, n-decyl, 4-ethyloctyl, 4-ethyl-4, 5-dimethylhexyl, 4-tert-butylcyclohexyl, n-undecyl, n-dodecyl, 1,3,5,7-tetramethyloctyl, 4-butyloctyl, 6 ,6-Diethyloctyl, n-tridecyl, 6-methyl-4-butyloctyl, n-tetradecyl, n-pentadecyl, 3,5-dimethylheptadecyl , 2,6-dimethylheptadecyl, 2,4-dimethylheptadecyl, 2,2,5,5-tetramethylhexyl, 1-cyclopentyl-2,2-dimethyl propylpropyl, 1-cyclohexyl-2,2-dimethylpropyl, 2,6-di-tert-butyl-4-methylcyclohexyl, n-octadecyl, etc.

可具有取代基之烷基中之取代基並無特別限定,可列舉碳數6~10之單環或多環之芳香環基(苯基、萘基等)、碳數1~8之直鏈、分支或環狀之烷氧基、胺基、單-或二-烷基胺基(烷基之碳數為1~8)、鹵素原子、氰基、羥基、硝基、羧基、碳數1~8之烷氧基羰基、碳數2~10之醯基(例如乙醯基、丙醯基、丁醯基、戊醯基、三甲基乙醯基、丙烯醯基、 甲基丙烯醯基、苯甲醯基、甲苯甲醯基、桂皮醯基、甲氧苯甲醯基、萘甲醯基等)、碳數2~10之醯氧基等。 The substituents in the alkyl group which may have a substituent are not particularly limited, and examples include monocyclic or polycyclic aromatic ring groups (phenyl, naphthyl, etc.) with 6 to 10 carbon atoms, and straight chain with 1 to 8 carbon atoms. , branched or cyclic alkoxy group, amine group, mono- or di-alkylamine group (the carbon number of the alkyl group is 1~8), halogen atom, cyano group, hydroxyl group, nitro group, carboxyl group, carbon number 1 ~8 alkoxycarbonyl group, carbon number 2~10 acyl group (such as acetyl group, propionyl group, butyryl group, pentamyl group, trimethylacetyl group, acrylyl group, methacrylyl group, benzene carboxyl, tolyl carboxyl, cinnamonyl, methoxybenzyl, naphthyl, etc.), carbon number 2-10 carboxyloxy, etc.

作為R3、R402及R403中之芳基,可列舉碳數6~20之單環或多環之芳香環基。作為碳數6~20之單環或多環之芳香環基,具體而言,可列舉:苯基等單環之芳香族烴基;萘基、蒽基(anthracenyl)、稠四苯基(naphthacenyl)、稠五苯基(pentacenyl)、菲基(phenanthrenyl)、芘基等多環之芳香族烴基。 Examples of the aryl group in R 3 , R 402 and R 403 include monocyclic or polycyclic aromatic ring groups having 6 to 20 carbon atoms. Specific examples of the monocyclic or polycyclic aromatic ring group having 6 to 20 carbon atoms include monocyclic aromatic hydrocarbon groups such as phenyl; naphthyl, anthracenyl, and naphthacenyl , Polycyclic aromatic hydrocarbon groups such as pentacenyl, phenanthrenyl, and pyrene.

可具有取代基之芳基中之取代基並無特別限定,例如可列舉碳數1~8之直鏈、分支或環狀之烷基、碳數1~8之烷氧基、胺基、單-或二-烷基胺基(烷基之碳數為1~8)、鹵素原子、氰基、羥基、硝基、碳數1~8之鹵化烴基、羧基、碳數1~8之烷氧基羰基等。較佳為碳數1~8之直鏈、分支或環狀之烷基。例如若列舉具有取代基之苯基及萘基之一例,則可列舉硝基苯基、氰基苯基、羥基苯基、甲基苯基、二甲基苯基、三甲基苯基、氟苯基、氯苯基、二氯苯基、溴苯基、甲氧基苯基、乙氧基苯基、三氟甲基苯基、N,N-二甲基胺基苯基、硝基萘基、氰基萘基、羥萘基、甲基萘基、氟萘基、氯萘基、溴萘基、三氟甲基萘基等。 The substituents in the optionally substituted aryl group are not particularly limited, for example, linear, branched or cyclic alkyl groups with 1 to 8 carbon atoms, alkoxy groups with 1 to 8 carbon atoms, amine groups, mono- - or di-alkylamino group (the carbon number of the alkyl group is 1~8), halogen atom, cyano group, hydroxyl group, nitro group, halogenated hydrocarbon group with 1~8 carbon number, carboxyl group, alkoxy group with 1~8 carbon number carbonyl, etc. It is preferably a linear, branched or cyclic alkyl group having 1 to 8 carbon atoms. For example, nitrophenyl, cyanophenyl, hydroxyphenyl, methylphenyl, dimethylphenyl, trimethylphenyl, fluorine, etc. Phenyl, chlorophenyl, dichlorophenyl, bromophenyl, methoxyphenyl, ethoxyphenyl, trifluoromethylphenyl, N,N-dimethylaminophenyl, nitronaphthalene Naphthyl, cyano naphthyl, hydroxynaphthyl, methyl naphthyl, fluoronaphthyl, chloronaphthyl, bromonaphthyl, trifluoromethyl naphthyl and the like.

於通式(2)中,由R404與R405與R404及R405所鍵結之氮原子形成之4~8員之含氮雜環亦可為含有氧原子之含氮雜環。作為含氮雜環,可列舉非芳香族性含氮雜環。作為4~8員之含氮雜環,例如可列舉吡咯啶環、哌啶環、哌

Figure 106130644-A0202-12-0014-52
環、嗎福啉環等非芳香族性含氮雜環。 In the general formula (2), the 4- to 8-membered nitrogen-containing heterocycle formed by R 404 and R 405 and the nitrogen atom to which R 404 and R 405 are bonded may also be a nitrogen-containing heterocycle containing an oxygen atom. As the nitrogen-containing heterocyclic ring, a non-aromatic nitrogen-containing heterocyclic ring is exemplified. As the nitrogen-containing heterocyclic ring having 4 to 8 members, for example, a pyrrolidine ring, a piperidine ring, a piperidine ring, a
Figure 106130644-A0202-12-0014-52
Non-aromatic nitrogen-containing heterocycles such as ring, morpholine ring, etc.

可具有取代基之4~8員之含氮雜環中之取代基並無特別限定,例如可列舉碳數1~8之直鏈、分支或環狀之烷基、碳數1~8之烷氧基、胺基、單 -或二-烷基胺基(烷基之碳數為1~8)、鹵素原子、氰基、羥基、硝基、碳數1~8之鹵化烴基、羧基、碳數1~8之烷氧基羰基等。較佳為碳數1~8之直鏈、分支或環狀之烷基。 The substituents in the nitrogen-containing heterocyclic ring with 4 to 8 members which may have substituents are not particularly limited, for example, straight-chain, branched or cyclic alkyl groups with 1 to 8 carbon atoms, and alkanes with 1 to 8 carbon atoms are exemplified. Oxygen group, amino group, mono- or di-alkylamine group (the carbon number of the alkyl group is 1~8), halogen atom, cyano group, hydroxyl group, nitro group, halogenated hydrocarbon group with carbon number 1~8, carboxyl group, carbon group Alkoxycarbonyl groups from 1 to 8, etc. It is preferably a linear, branched or cyclic alkyl group having 1 to 8 carbon atoms.

於烷基、芳基、含氮雜環、雜環等環具有取代基之情形時,於取代基有2個以上之情形時,各個取代基可相同,亦可不同。 When a ring such as an alkyl group, an aryl group, a nitrogen-containing heterocycle, and a heterocycle has a substituent, when there are two or more substituents, each substituent may be the same or different.

對通式(2)中之各基之較佳態樣進一步進行說明。 The preferred aspect of each group in the general formula (2) will be further described.

R3較佳為氫原子、可具有取代基之碳數1~20之烷基或氰基,更佳為氫原子或可具有取代基之碳數1~5之烷基,進而較佳為氫原子或碳數1~3之烷基,尤佳為氫原子。 R 3 is preferably a hydrogen atom, an alkyl group having 1 to 20 carbon atoms or a cyano group that may have a substituent, more preferably a hydrogen atom or an alkyl group having 1 to 5 carbon atoms that may have a substituent group, and more preferably hydrogen atom or an alkyl group having 1 to 3 carbon atoms, particularly preferably a hydrogen atom.

R402較佳為氫原子、可具有取代基之碳數1~20之烷基、可具有取代基之碳數6~20之芳基或烷氧基,更佳為可具有取代基之碳數1~20之烷基。更佳為氫原子或可具有取代基之碳數1~5之烷基,進而較佳為氫原子或碳數1~3之烷基,尤佳為甲基。 R 402 is preferably a hydrogen atom, an alkyl group with a carbon number of 1 to 20 that may have a substituent, an aryl group or an alkoxy group with a carbon number of 6 to 20 that may have a substituent, more preferably a carbon number that may have a substituent 1~20 alkyl. More preferably, it is a hydrogen atom or an alkyl group having 1 to 5 carbon atoms which may have a substituent, more preferably a hydrogen atom or an alkyl group having 1 to 3 carbon atoms, and particularly preferably a methyl group.

R403較佳為-OR408。R408較佳為氫原子、可具有取代基之碳數1~20之烷基或可具有取代基之碳數6~20之芳基,更佳為氫原子或可具有取代基之碳數1~5之烷基,進而較佳為碳數1~3之烷基,尤佳為乙基。 R 403 is preferably -OR 408 . R 408 is preferably a hydrogen atom, an alkyl group with 1 to 20 carbon atoms that may have a substituent, or an aryl group with 6 to 20 carbon atoms that may have a substituent, more preferably a hydrogen atom or an alkyl group with 1 to 20 carbon atoms that may have a substituent An alkyl group of ~5 is more preferably an alkyl group having 1 to 3 carbon atoms, and an ethyl group is particularly preferred.

於本發明之一態樣中,較佳為R402及R403之至少任一者為氫原子以外之取代基,更佳為R402及R403相同或不同,且為氫原子以外之取代基。 In one aspect of the present invention, preferably at least one of R 402 and R 403 is a substituent other than a hydrogen atom, more preferably R 402 and R 403 are the same or different, and are a substituent other than a hydrogen atom .

R404及R405相同或不同,較佳為可具有取代基之碳數1~20之烷基或可具有取代基之碳數6~20之芳基,更佳為碳數1~10之烷基或碳數6~10之芳基,進而較佳為碳數1~10之烷基,尤佳為甲基、乙基、正丙基、正丁基。 R 404 and R 405 are the same or different, preferably an alkyl group having 1 to 20 carbon atoms which may have a substituent or an aryl group having 6 to 20 carbon atoms that may have a substituent, more preferably an alkane having 1 to 10 carbon atoms group or an aryl group having 6 to 10 carbon atoms, more preferably an alkyl group having 1 to 10 carbon atoms, particularly preferably a methyl group, an ethyl group, an n-propyl group, and an n-butyl group.

R406、R407、R408、R409、R410及R411相同或不同,較佳為可具有取代基之碳數1~20之烷基或可具有取代基之碳數6~20之芳基。 R 406 , R 407 , R 408 , R 409 , R 410 and R 411 are the same or different, preferably an alkyl group with 1 to 20 carbon atoms which may have a substituent or an aryl group with 6 to 20 carbon atoms which may have a substituent base.

作為通式(1)中m為1或2之化合物,較佳為上述通式(3)表示之化合物(化合物(3))、通式(5)表示之化合物(化合物(5))等。 As the compound in which m is 1 or 2 in the general formula (1), the compound represented by the above-mentioned general formula (3) (compound (3)), the compound represented by the general formula (5) (compound (5)), and the like are preferable.

於本發明之一態樣中,作為化合物(1),較佳為化合物(3)。化合物(3)由於耐光性優異故而較佳。 In one aspect of the present invention, the compound (1) is preferably the compound (3). Compound (3) is preferable because it is excellent in light resistance.

通式(3)中,R1a表示氫原子、可具有取代基之碳數1~20之烷基或可具有取代基之碳數6~20之芳基,R2a表示氫原子、氰基、硝基、三氟甲基、含雜環之基、-C(O)-R7a或-SO2-R8a。R7a表示羥基或-OR71a,R8a表示鹵素原子、羥基、-OR81a、-NR82aR83a或-R84a。R71a及R81a~R84a相同或不同,表示氫原子、可具有取代基之碳數1~20之烷基或可具有取代基之碳數6~20之芳基。 In the general formula (3), R 1a represents a hydrogen atom, an alkyl group having 1 to 20 carbon atoms that may have a substituent, or an aryl group that may have a substituent group having 6 to 20 carbon atoms, and R 2a represents a hydrogen atom, a cyano group, Nitro, trifluoromethyl, heterocycle-containing group, -C(O)-R 7a or -SO 2 -R 8a . R 7a represents a hydroxyl group or -OR 71a , and R 8a represents a halogen atom, a hydroxyl group, -OR 81a , -NR 82a R 83a or -R 84a . R 71a and R 81a to R 84a are the same or different, and represent a hydrogen atom, an optionally substituted alkyl group having 1 to 20 carbon atoms, or an optionally substituted aryl group having 6 to 20 carbon atoms.

R1a之較佳態樣與上述R1之較佳態樣相同。 The preferred aspect of R 1a is the same as the preferred aspect of R 1 described above.

R2a較佳為氰基、含雜環之基或-C(O)-R7a,更佳為氰基或-C(O)-OR71a。R71a、R81a、R82a、R83a及R84a之較佳態樣與上述R71、R81、R82、R83及R84之較佳態樣分別相同。 R 2a is preferably a cyano group, a heterocyclic-containing group or -C(O)-R 7a , more preferably a cyano group or -C(O)-OR 71a . Preferred embodiments of R 71a , R 81a , R 82a , R 83a and R 84a are the same as the preferred embodiments of R 71 , R 81 , R 82 , R 83 and R 84 described above, respectively.

通式(3)中,R3a表示氫原子、鹵素原子、氰基、可具有取代基之碳數1~20之烷基或可具有取代基之碳數6~20之芳基。 In the general formula (3), R 3a represents a hydrogen atom, a halogen atom, a cyano group, an optionally substituted alkyl group having 1 to 20 carbon atoms, or an optionally substituted aryl group having 6 to 20 carbon atoms.

R402a表示氫原子、鹵素原子、可具有取代基之碳數1~20之烷基、可具有取代基之碳數6~20之芳基、-NR406aR407a、-OR408a、氰基、-C(O)R409a、-O-C(O)R410a或-C(O)OR411a,R404a~R411a相同或不同,表示氫原子、可具有取代基之碳數1~20之烷基或可具有取代基之碳數6~20之芳基。亦可由R404a與R405a與R404a及R405a所鍵結之氮原子形成可具有取代基之4~8員之含氮雜環。 R 402a represents a hydrogen atom, a halogen atom, an optionally substituted alkyl group having 1 to 20 carbon atoms, an optionally substituted aryl group having 6 to 20 carbon atoms, -NR 406a R 407a , -OR 408a , cyano, -C(O)R 409a , -OC(O)R 410a or -C(O)OR 411a , R 404a to R 411a are the same or different, and represent a hydrogen atom, an alkyl group having 1 to 20 carbon atoms that may have a substituent Or an aryl group having 6 to 20 carbon atoms which may have a substituent. A nitrogen-containing heterocycle of 4 to 8 members which may have a substituent may also be formed from the nitrogen atom to which R 404a and R 405a and R 404a and R 405a are bonded.

R3a、R402a、R404a、R405a、R406a、R407a、R408a、R409a、R410a及R411a之較佳態樣與上述R3、R402、R404、R405、R406、R407、R408、R409、R410及R411之較佳態樣分別相同。 Preferred embodiments of R 3a , R 402a , R 404a , R 405a , R 406a , R 407a , R 408a , R 409a , R 410a and R 411a are the same as those of the above R 3 , R 402 , R 404 , R 405 , R 406 The preferred aspects of R 407 , R 408 , R 409 , R 410 and R4 11 are respectively the same.

通式(3)中,R413表示氫原子、可具有取代基之碳數1~20之烷基、可具有取代基之碳數6~20之芳基,或者表示上述通式(4)表示之基。R413較佳為可具有取代基之碳數1~5之烷基或通式(4)表示之基,更佳為碳數1~3之烷基或通式(4)表示之基,進而較佳為乙基或上述通式(4)表示之基。於本發明之一態樣中,R413較佳為通式(4)表示之基。 In the general formula (3), R 413 represents a hydrogen atom, an optionally substituted alkyl group having 1 to 20 carbon atoms, an optionally substituted aryl group having 6 to 20 carbon atoms, or the above general formula (4). foundation. R 413 is preferably an alkyl group having 1 to 5 carbon atoms or a group represented by the general formula (4) that may have a substituent, more preferably an alkyl group having 1 to 3 carbon atoms or a group represented by the general formula (4), and further Preferably, it is an ethyl group or a group represented by the above-mentioned general formula (4). In one aspect of the present invention, R 413 is preferably a group represented by the general formula (4).

通式(4)中,Q2表示可具有取代基之碳數1~20之2價烴基,*表示與通式(3)之鍵結部位。於通式(4)中,Q2鍵結於通式(3)。Q2中之可具有取代基之碳數1~20之2價烴基及其較佳態樣與上述Q1中之可具有取代基之碳數1~20之2價烴基及其較佳態樣相同。 In the general formula (4), Q 2 represents a divalent hydrocarbon group having 1 to 20 carbon atoms which may have a substituent, and * represents a bonding site to the general formula (3). In the general formula (4), Q 2 is bonded to the general formula (3). The divalent hydrocarbon group with 1 to 20 carbon atoms that may have a substituent in Q 2 and its preferred embodiments and the divalent hydrocarbon group with 1 to 20 carbon atoms that can have a substituent in the above-mentioned Q 1 and its preferred embodiments same.

通式(4)中,R1b表示氫原子、可具有取代基之碳數1~20之烷基或可具有取代基之碳數6~20之芳基,R2b表示氫原子、氰基、硝基、三氟甲基、含雜環之基、-C(O)-R7b或-SO2-R8b;R7b表示羥基或-OR71b,R8b表示鹵素原子、羥基、-OR81b、-NR82bR83b或-R84b;R71b及R81b~R84b相同或不同,表示氫原子、可具有取代基之碳數1~20之烷基或可具有取代基之碳數6~20之芳基。 In the general formula (4), R 1b represents a hydrogen atom, an alkyl group having 1 to 20 carbon atoms that may have a substituent, or an aryl group that may have a substituent group having 6 to 20 carbon atoms, and R 2b represents a hydrogen atom, a cyano group, Nitro, trifluoromethyl, heterocyclic group, -C(O)-R 7b or -SO 2 -R 8b ; R 7b represents hydroxyl or -OR 71b , R 8b represents halogen atom, hydroxyl, -OR 81b , -NR 82b R 83b or -R 84b ; R 71b and R 81b ~R 84b are the same or different, and represent a hydrogen atom, an alkyl group with a carbon number of 1 to 20 that may have a substituent or an alkyl group with a carbon number of 6 to 20 that may have a substituent Aryl of 20.

R1b之較佳態樣與上述R1之較佳態樣相同。 The preferred aspect of R 1b is the same as the preferred aspect of R 1 described above.

R2b較佳為氰基、含雜環之基或-C(O)-R7b,更佳為氰基或-C(O)-OR71b。R71b、R81b、R82b、R83b及R84b之較佳態樣與上述R71、R81、R82、R83及R84之較佳態樣分別相同。 R 2b is preferably a cyano group, a heterocyclic-containing group or -C(O)-R 7b , more preferably a cyano group or -C(O)-OR 71b . Preferred embodiments of R 71b , R 81b , R 82b , R 83b and R 84b are the same as the preferred embodiments of R 71 , R 81 , R 82 , R 83 and R 84 described above, respectively.

通式(4)中,R3b表示氫原子、鹵素原子、氰基、可具有取代基之碳數1~20之烷基或可具有取代基之碳數6~20之芳基。 In the general formula (4), R 3b represents a hydrogen atom, a halogen atom, a cyano group, an optionally substituted alkyl group having 1 to 20 carbon atoms, or an optionally substituted aryl group having 6 to 20 carbon atoms.

R402b表示氫原子、鹵素原子、可具有取代基之碳數1~20之烷基、可具有取代基之碳數6~20之芳基、-NR406bR407b、-OR408b、氰基、-C(O)R409b、-O-C(O)R410b或-C(O)OR411b,R404b~R411b相同或不同,表示氫原子、可具有取代基之碳數1~20之烷基或可具有取代基之碳數6~20之芳基。亦可由R404b與R405b與R404b及R405b所鍵結之氮原子形成可具有取代基之4~8員之含氮雜環。 R 402b represents a hydrogen atom, a halogen atom, an optionally substituted alkyl group having 1 to 20 carbon atoms, an optionally substituted aryl group having 6 to 20 carbon atoms, -NR 406b R 407b , -OR 408b , cyano, -C(O)R 409b , -OC(O)R 410b or -C(O)OR 411b , R 404b to R 411b are the same or different, and represent a hydrogen atom, an alkyl group having 1 to 20 carbon atoms that may have a substituent Or an aryl group having 6 to 20 carbon atoms which may have a substituent. A nitrogen-containing heterocycle of 4 to 8 members which may have a substituent may also be formed from the nitrogen atom to which R 404b and R 405b and R 404b and R 405b are bonded.

R3b、R402b、R404b、R405a、R406b、R407b、R408b、R409b、R410b及R411b之較佳態樣與上述R3、R402、R404、R405、R406、R407、R408、R409、R410及R411之較佳態樣分別相同。 Preferred embodiments of R 3b , R 402b , R 404b , R 405a , R 406b , R 407b , R 408b , R 409b , R 410b and R 411b are the same as the above-mentioned R 3 , R 402 , R 404 , R 405 , R 406 , R 407 , R 408 , R 409 , R 410 and R 411 have the same preferred aspects, respectively.

作為化合物(1),亦較佳為化合物(5)。 As compound (1), compound (5) is also preferable.

通式(5)中,R2c表示氫原子、氰基、硝基、三氟甲基、含雜環之基、-C(O)-R7c或-SO2-R8c。R7c表示羥基或-OR71c,R8c表示鹵素原子、羥基、-OR81c、-NR82cR83c或-R84c。R71c及R81c~R84c相同或不同,表示氫原子、可具有取代基之碳數1~20之烷基或可具有取代基之碳數6~20之芳基。R2c較佳為氰基、含雜環之基或-C(O)-R7c,更佳為氰基或-C(O)-OR71cIn the general formula (5), R 2c represents a hydrogen atom, a cyano group, a nitro group, a trifluoromethyl group, a group containing a heterocyclic ring, -C(O)-R 7c or -SO 2 -R 8c . R 7c represents a hydroxyl group or -OR 71c , and R 8c represents a halogen atom, a hydroxyl group, -OR 81c , -NR 82c R 83c or -R 84c . R 71c and R 81c to R 84c are the same or different, and represent a hydrogen atom, an optionally substituted alkyl group having 1 to 20 carbon atoms, or an optionally substituted aryl group having 6 to 20 carbon atoms. R 2c is preferably a cyano group, a heterocyclic ring-containing group or -C(O)-R 7c , more preferably a cyano group or -C(O)-OR 71c .

R71c、R81c、R82c、R83c及R84c之較佳態樣與上述R71、R81、R82、R83及R84之較佳態樣分別相同。 Preferred embodiments of R 71c , R 81c , R 82c , R 83c and R 84c are the same as the preferred embodiments of R 71 , R 81 , R 82 , R 83 and R 84 described above, respectively.

通式(5)中,R3c表示氫原子、鹵素原子、氰基、可具有取代基之碳數1~20之烷基或可具有取代基之碳數6~20之芳基。 In the general formula (5), R 3c represents a hydrogen atom, a halogen atom, a cyano group, an optionally substituted alkyl group having 1 to 20 carbon atoms, or an optionally substituted aryl group having 6 to 20 carbon atoms.

R402c及R403c相同或不同,表示氫原子、鹵素原子、可具有取代基之碳數 1~20之烷基、可具有取代基之碳數6~20之芳基、-NR406cR407c、-OR408c、氰基、-C(O)R409c、-O-C(O)R410c或-C(O)OR411c,R404c~R411c相同或不同,表示氫原子、可具有取代基之碳數1~20之烷基或可具有取代基之碳數6~20之芳基。亦可由R404c與R405c與R404c及R405c所鍵結之氮原子形成可具有取代基之4~8員之含氮雜環。 R 402c and R 403c are the same or different, and represent a hydrogen atom, a halogen atom, an alkyl group with 1 to 20 carbon atoms that may have a substituent, an aryl group with 6 to 20 carbon atoms that may have a substituent, -NR 406c R 407c , -OR 408c , cyano group, -C(O)R 409c , -OC(O)R 410c or -C(O)OR 411c , R 404c ~ R 411c are the same or different, and represent a hydrogen atom and a carbon that may have a substituent An alkyl group having 1 to 20 carbon atoms or an aryl group having 6 to 20 carbon atoms which may have a substituent. A nitrogen-containing heterocycle of 4 to 8 members which may have a substituent may also be formed from the nitrogen atom to which R 404c and R 405c and R 404c and R 405c are bonded.

R3c、R402c、R403c、R404c、R405c、R406c、R407c、R408c、R409c、R410c及R411c之較佳態樣與上述R3、R402、R403、R404、R405、R406、R407、R408、R409、R410及R411之較佳態樣分別相同。 Preferred embodiments of R 3c , R 402c , R 403c , R 404c , R 405c , R 406c , R 407c , R 408c , R 409c , R 410c and R 411c are the same as the above-mentioned R 3 , R 402 , R 403 , R 404 The preferred embodiments of R 405 , R 406 , R 407 , R 408 , R 409 , R 410 and R 411 are respectively the same.

通式(5)中,R501表示氫原子、可具有取代基之碳數1~20之烷基、可具有取代基之碳數6~20之芳基或上述通式(6)表示之基。R501較佳為可具有取代基之碳數1~20之烷基(例如甲基、乙基、第三丁基、環己基、4-第三丁基環己基、2,6-二-第三丁基-4-甲基環己基等)、可具有取代基之碳數6~20之芳基(例如苯基、甲基苯基、二甲基苯基、三甲基苯基等)、或上述通式(6)表示之基。於本發明之一態樣中,R501較佳為上述通式(6)表示之基。 In the general formula (5), R 501 represents a hydrogen atom, an optionally substituted alkyl group having 1 to 20 carbon atoms, an optionally substituted aryl group having 6 to 20 carbon atoms, or a group represented by the above general formula (6) . R 501 is preferably an alkyl group having 1 to 20 carbon atoms (such as methyl, ethyl, tert-butyl, cyclohexyl, 4-tert-butylcyclohexyl, 2,6-di- tributyl-4-methylcyclohexyl, etc.), aryl groups with 6 to 20 carbon atoms that may have substituents (such as phenyl, methylphenyl, dimethylphenyl, trimethylphenyl, etc.), or a group represented by the above general formula (6). In one aspect of the present invention, R 501 is preferably a group represented by the aforementioned general formula (6).

通式(6)中,Q3表示可具有取代基之碳數1~20之2價烴基,*表示與通式(5)之鍵結部位。於通式(6)中,Q3鍵結於通式(5)。Q3中之可具有取代基之碳數1~20之2價烴基及其較佳態樣與上述Q1中之可具有取代基之碳數1~20之2價烴基及其較佳態樣相同。於一態樣中,Q3更佳為由上述通式(20)表示且s為0之2價芳基。 In the general formula (6), Q 3 represents a divalent hydrocarbon group having 1 to 20 carbon atoms which may have a substituent, and * represents a bonding site to the general formula (5). In the general formula (6), Q 3 is bonded to the general formula (5). The divalent hydrocarbon group with 1 to 20 carbon atoms that may have a substituent in Q 3 and its preferred embodiments and the divalent hydrocarbon group with 1 to 20 carbon atoms that can have a substituent in the above-mentioned Q 1 and its preferred embodiments same. In one aspect, Q 3 is more preferably a divalent aryl group represented by the above general formula (20) and s is 0.

通式(6)中,R2d表示氫原子、氰基、硝基、三氟甲基、含雜環之基、-C(O)-R7d或-SO2-R8d。R7d表示羥基或-OR71d,R8d表示鹵素原子、羥 基、-OR81d、-NR82dR83d或-R84d。R71d及R81d~R84d相同或不同,表示氫原子、可具有取代基之碳數1~20之烷基或可具有取代基之碳數6~20之芳基。 In the general formula (6), R 2d represents a hydrogen atom, a cyano group, a nitro group, a trifluoromethyl group, a group containing a heterocyclic ring, -C(O)-R 7d or -SO 2 -R 8d . R 7d represents a hydroxyl group or -OR 71d , and R 8d represents a halogen atom, a hydroxyl group, -OR 81d , -NR 82d R 83d or -R 84d . R 71d and R 81d to R 84d are the same or different, and represent a hydrogen atom, an optionally substituted alkyl group having 1 to 20 carbon atoms, or an optionally substituted aryl group having 6 to 20 carbon atoms.

R2d較佳為氰基、含雜環之基或-C(O)-R7d,更佳為氰基或-C(O)-OR71d。R71d、R81d、R82d、R83d及R84d之較佳態樣與上述R71、R81、R82、R83及R84之較佳態樣分別相同。 R 2d is preferably a cyano group, a heterocyclic-containing group or -C(O)-R 7d , more preferably a cyano group or -C(O)-OR 71d . Preferred embodiments of R 71d , R 81d , R 82d , R 83d and R 84d are the same as the preferred embodiments of R 71 , R 81 , R 82 , R 83 and R 84 described above, respectively.

R3d表示氫原子、鹵素原子、氰基、可具有取代基之碳數1~20之烷基或可具有取代基之碳數6~20之芳基。 R 3d represents a hydrogen atom, a halogen atom, a cyano group, an optionally substituted alkyl group having 1 to 20 carbon atoms, or an optionally substituted aryl group having 6 to 20 carbon atoms.

R402d及R403d相同或不同,表示氫原子、鹵素原子、可具有取代基之碳數1~20之烷基、可具有取代基之碳數6~20之芳基、-NR406dR407d、-OR408d、氰基、-C(O)R409d、-O-C(O)R410d或-C(O)OR411d,R404d~R411d相同或不同,表示氫原子、可具有取代基之碳數1~20之烷基或可具有取代基之碳數6~20之芳基。亦可由R404d與R405d與R404d及R405d所鍵結之氮原子形成可具有取代基之4~8員之含氮雜環。 R 402d and R 403d are the same or different, and represent a hydrogen atom, a halogen atom, an alkyl group with 1 to 20 carbon atoms that may have a substituent, an aryl group with 6 to 20 carbon atoms that may have a substituent, -NR 406d R 407d , -OR 408d , cyano group, -C(O)R 409d , -OC(O)R 410d or -C(O)OR 411d , R 404d to R 411d are the same or different, and represent a hydrogen atom and a carbon that may have a substituent An alkyl group having 1 to 20 carbon atoms or an aryl group having 6 to 20 carbon atoms which may have a substituent. A 4- to 8-membered nitrogen-containing heterocycle which may have a substituent can also be formed from the nitrogen atom to which R 404d and R 405d are bonded to R 404d and R 405d .

R3d、R402d、R403d、R404d、R405d、R406d、R407d、R408d、R409d、R410d及R411d之較佳態樣與上述R3、R402、R403、R404、R405、R406、R407、R408、R409、R410及R411之較佳態樣分別相同。 Preferred embodiments of R 3d , R 402d , R 403d , R 404d , R 405d , R 406d , R 407d , R 408d , R 409d , R 410d and R 411d are the same as the above-mentioned R 3 , R 402 , R 403 , R 404 The preferred embodiments of R 405 , R 406 , R 407 , R 408 , R 409 , R 410 and R 411 are respectively the same.

化合物(3)於R413為通式(4)表示之基之情形時,係具有於通式(1)中Q1為Q2(可具有取代基之碳數1~20之2價烴基),且通式(3)表示之基及通式(4)表示之基藉由該Q2連結於兩側之二聚物結構的化合物。通式(3)表示之基及通式(4)表示之基包含次甲基結構,均係成為色素之結構。藉由此種成為色素之結構成為二聚物結構而分子量增大,故而化合物不易昇華,而成為耐熱性優異之色素化合物。R413為通式(4) 表示之基之化合物(3)係下述通式(3-1)表示之化合物。 In the compound (3), when R 413 is a group represented by the general formula (4), in the general formula (1) Q 1 is Q 2 (a divalent hydrocarbon group having 1 to 20 carbon atoms which may have a substituent) , and the group represented by the general formula (3) and the group represented by the general formula (4) are connected to the compound of the dimer structure on both sides through the Q 2 . The group represented by the general formula (3) and the group represented by the general formula (4) include a methine structure, and both are structures that become a dye. Since the structure which becomes the dye becomes a dimer structure and the molecular weight increases, the compound is not easily sublimated, and it becomes a dye compound excellent in heat resistance. The compound (3) in which R 413 is a group represented by the general formula (4) is a compound represented by the following general formula (3-1).

Figure 106130644-A0202-12-0021-11
Figure 106130644-A0202-12-0021-11

上述式(3-1)中,R1a、R2a、R3a、R402a、R404a及R405a、以及Q2、R1b、R2b、R3b、R402b、R404b及R405b分別與上述為相同意義。 In the above formula (3-1), R 1a , R 2a , R 3a , R 402a , R 404a and R 405a , and Q 2 , R 1b , R 2b , R 3b , R 402b , R 404b and R 405b are respectively The above has the same meaning.

化合物(5)於R501為通式(6)表示之基之情形時,係具有於通式(1)中Q1為Q3(可具有取代基之碳數1~20之2價烴基),且通式(5)表示之基及通式(6)表示之基藉由該Q3連結於兩側之二聚物結構的化合物。通式(5)表示之基及通式(6)表示之結構包含次甲基結構,係成為色素之結構。藉由此種成為色素之結構成為二聚物結構而分子量增大,故而化合物不易昇華,而成為耐熱性優異之色素化合物。 In the compound (5), when R 501 is a group represented by the general formula (6), in the general formula (1) Q 1 is Q 3 (a divalent hydrocarbon group having 1 to 20 carbon atoms which may have a substituent) , and the group represented by the general formula (5) and the group represented by the general formula (6) are connected to the compound of the dimer structure on both sides through the Q 3 . The group represented by the general formula (5) and the structure represented by the general formula (6) include a methine structure, and become a structure of a dye. Since the structure which becomes the dye becomes a dimer structure and the molecular weight increases, the compound is not easily sublimated, and it becomes a dye compound excellent in heat resistance.

R501為通式(6)表示之基之化合物(5)係下述通式(5-1)表示之化合物。 The compound (5) in which R 501 is a group represented by the general formula (6) is a compound represented by the following general formula (5-1).

Figure 106130644-A0202-12-0022-12
Figure 106130644-A0202-12-0022-12

上述通式(5-1)中,R2c、R3c、R402c、R403c、R404c及R405c、以及Q3、R2d、R3d、R402d、R403d、R404d及R405d與上述為相同意義。 In the above general formula (5-1), R 2c , R 3c , R 402c , R 403c , R 404c and R 405c , and Q 3 , R 2d , R 3d , R 402d , R 403d , R 404d and R 405d and The above has the same meaning.

作為本發明之化合物(1)之較佳態樣之一例,例如可列舉實施例中所製造之化合物C1~C5等。其中,就耐光性較高之方面而言,較佳為化合物C1、C2及C5。就耐熱性高之方面而言,較佳為化合物C1~C3。就對有機溶劑之溶解度高之方面而言,較佳為化合物C1~C5。化合物C1~C5係化合物(3)之一例。 As an example of a preferable aspect of the compound (1) of this invention, the compound C1-C5 etc. which were produced in an Example are mentioned, for example. Among them, compounds C1, C2, and C5 are preferred in terms of high light resistance. In terms of high heat resistance, compounds C1 to C3 are preferred. Compounds C1 to C5 are preferred in terms of high solubility in organic solvents. Compounds C1 to C5 are examples of compounds (3).

本發明之化合物(1)之製造方法並無特別限定,例如可藉由以下之方法製造。關於本發明之化合物之製造方法,以下列舉合成方法之一例進行說明,但本發明之化合物(1)之製造方法並不限定於下述方法。又,於進行下述反應時,亦可視需要預先藉由適當之保護基對該部位以外之官能基進行保護,並於適當之階段將其脫保護。 The manufacturing method of the compound (1) of this invention is not specifically limited, For example, it can manufacture by the following method. The production method of the compound of the present invention will be described below with an example of a synthesis method, but the production method of the compound (1) of the present invention is not limited to the following method. In addition, when the following reaction is carried out, functional groups other than the site may be protected by an appropriate protecting group in advance, and deprotected at an appropriate stage.

作為本發明之一態樣,於通式(1)表示之化合物為下述通式(11)表示之化合物(化合物(11))之情形時,例如可藉由以下般之方法合成。化合物(11)為本發明之化合物(1)之一例,係於通式(1)中m為2之化合物(二聚物化合物)。化合物(11)亦可謂於化合物(3)中R413為通式(4)表示之基之化合物之一例。下文中,藉由使化合物(M21)與化合物(M4)進行脫水縮合反應而獲得化合物(11)。 As an aspect of the present invention, when the compound represented by the general formula (1) is a compound represented by the following general formula (11) (compound (11)), it can be synthesized, for example, by the following method. The compound (11) is an example of the compound (1) of the present invention, and is a compound (dimer compound) in which m is 2 in the general formula (1). The compound (11) can also be described as an example of the compound in which R 413 is a group represented by the general formula (4) in the compound (3). Hereinafter, compound (11) is obtained by subjecting compound (M21) to a dehydration condensation reaction with compound (M4).

Figure 106130644-A0202-12-0023-14
Figure 106130644-A0202-12-0023-14

上述反應式中,Qf表示2價之連結基。R1f、R2f及該等之較佳態樣與上述R1、R2及該等之較佳態樣分別相同。R402f、R404f及R405f以及該等之較佳態樣與上述R402、R404及R405以及該等之較佳態樣分別相同。Qf中之2價之連結基與Q1中之2價之連結基相同。Qf較佳為可具有取代基之碳數1~20之2價烴基。 In the above reaction formula, Q f represents a divalent linking group. Preferred aspects of R 1f , R 2f and these are the same as the preferred aspects of R 1 , R 2 and these described above, respectively. R 402f , R 404f and R 405f and preferred aspects of these are the same as the above-mentioned R 402 , R 404 and R 405 and preferred aspects of these, respectively. The 2-valent linking group in Q f is the same as the 2-valent linking group in Q 1 . Q f is preferably a divalent hydrocarbon group having 1 to 20 carbon atoms which may have a substituent.

Figure 106130644-A0202-12-0023-15
Figure 106130644-A0202-12-0023-15

波浪線為單鍵,並且表示與其所鍵結之雙鍵相關之立體配置分別獨立地為E配置或者Z配置或該等之混合。以下亦相同。 The wavy line is a single bond, and indicates that the steric configuration relative to the double bond to which it is bonded is independently an E configuration or a Z configuration or a mixture of these. The following is also the same.

化合物(M4)例如可藉由使二鹵化烷基化合物與下述通式(M1)表示之化合物(M1)反應而將化合物(M1)之羥基加以烷氧基化 而獲得。化合物(M1)可依據Journal of the Chemical Society 1957,4845所記載之方法獲得。 The compound (M4) can be obtained, for example, by reacting a dihalogenated alkyl compound with a compound (M1) represented by the following general formula (M1) to alkoxylate the hydroxyl group of the compound (M1). Compound (M1) can be obtained according to the method described in Journal of the Chemical Society 1957, 4845.

Figure 106130644-A0202-12-0024-16
Figure 106130644-A0202-12-0024-16

上述通式(M1)中,R402f、R404f及R405f與上述為相同意義。 In the above general formula (M1), R 402f , R 404f and R 405f have the same meanings as described above.

又,化合物(11)亦可於使化合物(M1)與化合物(M21)進行脫水縮合後,藉由烷氧基化進行二聚化而獲得。 Moreover, the compound (11) can also be obtained by carrying out the dehydration condensation of the compound (M1) and the compound (M21), followed by dimerization by alkoxylation.

於通式(1)表示之化合物為下述通式(12)表示之化合物(化合物(12))之情形時,例如可藉由以下般之方法合成。化合物(12)為本發明之化合物(1)之一例,係二聚物化合物。化合物(12)亦可謂於化合物(5)中R501為通式(6)表示之基之化合物之一例。下文中,藉由使化合物(M22)與化合物(M2-1)進行脫水縮合反應而獲得化合物(12)。 When the compound represented by the general formula (1) is a compound represented by the following general formula (12) (compound (12)), it can be synthesized, for example, by the following method. Compound (12) is an example of compound (1) of the present invention, and is a dimer compound. The compound (12) can also be described as an example of the compound in which R 501 is a group represented by the general formula (6) in the compound (5). Hereinafter, compound (12) is obtained by subjecting compound (M22) to a dehydration condensation reaction with compound (M2-1).

Figure 106130644-A0202-12-0025-17
Figure 106130644-A0202-12-0025-17

上述反應式中,R2g及其較佳態樣與上述R2c及該等之較佳態樣分別相同。Wg表示-C(O)-O-Qg-O-C(O)-,Qg表示2價之連結基。Qg中之2價之連結基與Q1中之2價之連結基相同。Qg較佳為可具有取代基之碳數1~20之2價烴基。R402g、R403g、R404g及R405g以及該等之較佳態樣與上述R402、R403、R404及R405以及該等之較佳態樣分別相同。 In the above reaction formula, R 2g and its preferred aspects are the same as the above-mentioned R 2c and their preferred aspects, respectively. W g represents -C(O)-OQ g -OC(O)-, and Q g represents a divalent linking group. The divalent linking group in Q g is the same as the divalent linking group in Q 1 . Q g is preferably a divalent hydrocarbon group having 1 to 20 carbon atoms which may have a substituent. R 402g , R 403g , R 404g and R 405g and preferred aspects of these are the same as the above-mentioned R 402 , R 403 , R 404 and R 405 and preferred aspects of these, respectively.

化合物(M2-1)及下述化合物(M2-2)例如可藉由將上述化合物(M1)之羥基加以烷氧基化而獲得。 The compound (M2-1) and the following compound (M2-2) can be obtained, for example, by alkoxylating the hydroxyl group of the above-mentioned compound (M1).

又,化合物(12)亦可於使上述化合物(M21)與化合物(M2-1)進行脫水縮合後,利用R1f使其等連結並以Wg之形式進行二聚化而獲得。 Moreover, the compound (12) can also be obtained by dehydrating and condensing the above-mentioned compound (M21) and the compound ( M2-1 ).

於通式(1)表示之化合物為下述通式(13)表示之化合物(化合物(13))之情形時,例如可藉由以下般之方法合成。化合物(13)為本發明之化合物(1)之一例,係單體化合物(通式(1)中之m為1)。化合物(13)亦為於化合物(3)中R413表示氫原子、可具有取代基之碳數1~20之烷基或可具有取代基之碳數6~20之芳基之化合物之一例。下文中,藉由使化合物(M23)與化合物(M2-2)進行脫水縮合反應而獲得化合物(13)。 When the compound represented by the general formula (1) is a compound represented by the following general formula (13) (compound (13)), it can be synthesized, for example, by the following method. The compound (13) is an example of the compound (1) of the present invention, and is a monomer compound (m in the general formula (1) is 1). Compound (13) is also an example of a compound in which R 413 in compound (3) represents a hydrogen atom, an optionally substituted alkyl group having 1 to 20 carbon atoms, or an optionally substituted aryl group having 6 to 20 carbon atoms. Hereinafter, compound (13) is obtained by subjecting compound (M23) to a dehydration condensation reaction with compound (M2-2).

Figure 106130644-A0202-12-0026-19
Figure 106130644-A0202-12-0026-19

上述式中,R402h、R403h、R404h及R405h以及該等之較佳態樣與上述R402、R403、R404及R405以及該等之較佳態樣分別相同。R1h、R2h及該等之較佳態樣與上述R1、R2及該等之較佳態樣分別相同。 In the above formula, R 402h , R 403h , R 404h and R 405h and their preferred embodiments are the same as the above-mentioned R 402 , R 403 , R 404 and R 405 and their preferred embodiments, respectively. Preferred aspects of R 1h , R 2h and these are the same as the preferred aspects of R 1 , R 2 and these described above, respectively.

上述製造方法中之各產物之單離或精製可將通常之有機合成所使用之方法、例如過濾、萃取、洗淨、乾燥、濃縮、結晶化、各種層析等適當組合而進行。又,中間物亦可不特別進行精製而供於後續反應。 The isolation or purification of each product in the above-mentioned production method can be carried out by appropriately combining methods used in ordinary organic synthesis, such as filtration, extraction, washing, drying, concentration, crystallization, and various types of chromatography. In addition, the intermediate product may be used for the subsequent reaction without being particularly purified.

本發明之化合物(1)通常於360~430nm具有最大吸收波長。若於360~430nm具有最大吸收波長,則可選擇性地吸收紫外線、藍色之光。本發明之化合物(1)較佳於370~420nm具有最大吸收波長,更佳於380~400nm具有最大吸收波長。又,本發明之化合物(1)亦較佳400nm之克吸光係數為30以上。最大吸收波長及克吸光係數可利用實施例所記載之方法進行測量。 The compound (1) of the present invention usually has a maximum absorption wavelength at 360 to 430 nm. If it has a maximum absorption wavelength at 360~430nm, it can selectively absorb ultraviolet and blue light. The compound (1) of the present invention preferably has a maximum absorption wavelength at 370 to 420 nm, and more preferably has a maximum absorption wavelength at 380 to 400 nm. In addition, the compound (1) of the present invention also preferably has a gram absorption coefficient at 400 nm of 30 or more. The maximum absorption wavelength and the gram absorption coefficient can be measured by the methods described in the examples.

又,本發明之化合物(1)通常對有機溶劑之溶解性良好。 In addition, the compound (1) of the present invention generally has good solubility in organic solvents.

本發明之化合物(1)較佳為溶解於以下之有機溶劑中之化合物。 The compound (1) of the present invention is preferably a compound dissolved in the following organic solvent.

作為有機溶劑,例如可列舉:芳香族烴類(例如甲苯、二甲苯等)、酮類(甲基乙基酮、丙酮、環己酮、2-庚酮、3-庚酮等)、醚類(例如丙二醇 單甲醚乙酸酯、乙酸甲賽璐蘇(methyl cellosolve acetate)、乙酸乙賽璐蘇(ethyl cellosolve acetate)、丙二醇單甲醚等)、酯類(例如3-乙氧基丙酸甲酯、3-乙氧基丙酸乙酯、乳酸乙酯、乙酸乙酯、乙酸丁酯、3-甲氧基丙酸甲酯等)及該等之2種以上之混合溶劑。 Examples of the organic solvent include aromatic hydrocarbons (for example, toluene, xylene, etc.), ketones (methyl ethyl ketone, acetone, cyclohexanone, 2-heptanone, 3-heptanone, etc.), ethers (eg propylene glycol monomethyl ether acetate, methyl cellosolve acetate, ethyl cellosolve acetate, propylene glycol monomethyl ether, etc.), esters (eg 3-ethoxypropionic acid) methyl ester, ethyl 3-ethoxypropionate, ethyl lactate, ethyl acetate, butyl acetate, methyl 3-methoxypropionate, etc.) and a mixed solvent of two or more of these.

化合物(1)較佳相對於上述有機溶劑之至少1種而溶解0.1質量%以上,例如較佳為溶解0.1質量%以上且50質量%以下,更佳為溶解1質量%以上且40質量%以下,進而較佳為溶解3質量%以上且30質量%以下。更佳為20℃之對有機溶劑之溶解性處於此種範圍。若對有機溶劑之溶解性處於此種範圍,則於將本發明之化合物(1)用於製造例如藍光屏蔽透鏡等時,製造性良好,故而較佳。 The compound (1) is preferably dissolved in at least one of the above-mentioned organic solvents by 0.1 mass % or more, for example, preferably 0.1 mass % or more and 50 mass % or less, more preferably 1 mass % or more and 40 mass % or less. , more preferably 3 mass % or more and 30 mass % or less are dissolved. More preferably, the solubility to an organic solvent at 20°C is in this range. When the solubility to an organic solvent is in such a range, when the compound (1) of the present invention is used for the production of, for example, a blue light shielding lens, the manufacturability is good, which is preferable.

本發明之化合物(1)較佳為其熱分解溫度為200℃以上,更佳為210℃以上,例如較佳為250~400℃。熱分解溫度可藉由熱重量測量裝置進行測量。 The compound (1) of the present invention preferably has a thermal decomposition temperature of 200°C or higher, more preferably 210°C or higher, for example, preferably 250 to 400°C. The thermal decomposition temperature can be measured by a thermogravimetric measuring device.

本發明之化合物(1)通常於360~430nm具有最大吸收波長,而可有效地吸收該波長之光。本發明之化合物(1)可有效地吸收400nm附近之光。作為一態樣,本發明之化合物(1)若為2~6聚物化合物(於通式(1)中m為2~6),則可提高耐熱性。又,於本發明之較佳態樣中,本發明之化合物(1)對有機溶劑之溶解性優異。因此,本發明之化合物(1)例如可合適地用於藍光屏蔽透鏡等藍光屏蔽材料;紫外線吸收劑;記錄媒體之記錄材料等。又,本發明之化合物(1)亦可合適地用作彩色濾光片、色轉換濾光片等光學濾光片用色素等。 The compound (1) of the present invention usually has a maximum absorption wavelength at 360-430 nm, and can effectively absorb light of this wavelength. The compound (1) of the present invention can effectively absorb light in the vicinity of 400 nm. As an aspect, if the compound (1) of the present invention is a 2-6 polymer compound (m is 2-6 in the general formula (1)), heat resistance can be improved. Moreover, in the preferable aspect of this invention, the compound (1) of this invention is excellent in the solubility to an organic solvent. Therefore, the compound (1) of the present invention can be suitably used, for example, for blue light shielding materials such as blue light shielding lenses; ultraviolet absorbers; recording materials for recording media, and the like. Moreover, the compound (1) of this invention can also be used suitably as a pigment|dye etc. for optical filters, such as a color filter and a color conversion filter.

本發明之化合物(1)例如可藉由與樹脂等進行混合而製成 色素組成物。色素組成物可合適地用作著色組成物。 The compound (1) of the present invention can be prepared as a pigment composition by, for example, mixing with a resin or the like. The coloring composition can be suitably used as the coloring composition.

上述樹脂並無特別限定,只要根據著色組成物之用途等而適當選擇熱塑性樹脂、光硬化性樹脂、熱硬化性樹脂等即可。例如可列舉:丙烯酸樹脂、聚碳酸酯樹脂、聚苯乙烯樹脂、低密度聚乙烯樹脂、聚丙烯樹脂、聚胺酯樹脂、聚醯胺樹脂、聚縮醛樹脂、聚苯硫醚樹脂、聚對酞酸乙二酯樹脂、聚對酞酸丁二酯樹脂、聚環烯烴樹脂、聚碸樹脂、聚醚碸樹脂、氟樹脂、聚矽氧樹脂、聚酯樹脂、環氧樹脂、酚樹脂、三聚氰胺樹脂等樹脂。該等可僅使用1種,亦可將2種以上組合使用。 The said resin is not specifically limited, What is necessary is just to select a thermoplastic resin, a photocurable resin, a thermosetting resin, etc. suitably according to the application etc. of a coloring composition. For example, acrylic resin, polycarbonate resin, polystyrene resin, low density polyethylene resin, polypropylene resin, polyurethane resin, polyamide resin, polyacetal resin, polyphenylene sulfide resin, polyterephthalic acid can be mentioned. Ethylene glycol resin, polybutylene terephthalate resin, polycyclic olefin resin, polysilicon resin, polyether resin, fluorine resin, polysiloxane resin, polyester resin, epoxy resin, phenol resin, melamine resin, etc. resin. Only one type of these may be used, or two or more types may be used in combination.

色素組成物中之化合物(1)之摻合量例如較佳相對於色素組成物之總固形物成分而化合物(1)為0.001~50質量%,更佳為0.01~40質量%。 The compounding amount of the compound (1) in the dye composition is, for example, preferably 0.001 to 50 mass %, more preferably 0.01 to 40 mass %, with respect to the total solid content of the dye composition.

色素組成物亦可根據其用途等而含有本發明之化合物(1)及樹脂以外之任意成分。作為任意成分,例如可列舉抗氧化劑、消泡劑、其他色素(染料、顏料等)、紅外線吸收劑、聚合性單體、聚合起始劑、增感劑等。又,亦可含有化合物(1)以外之紫外線吸收劑。 The coloring matter composition may contain optional components other than the compound (1) of the present invention and the resin according to the application and the like. Examples of optional components include antioxidants, antifoaming agents, other dyes (dyes, pigments, etc.), infrared absorbers, polymerizable monomers, polymerization initiators, sensitizers, and the like. Moreover, ultraviolet absorbers other than compound (1) may be contained.

色素組成物之製造方法並無特別限定,例如只要將本發明之化合物(1)及樹脂、以及根據需要而摻合之任意成分進行混合即可。 The manufacturing method of a coloring matter composition is not specifically limited, For example, what is necessary is just to mix the compound (1) of this invention, resin, and the arbitrary components mixed as needed.

本發明之化合物(1)、以及含有本發明之化合物(1)之色素組成物例如可合適地用於製造藍光屏蔽材料、紫外線吸收劑、記錄材料、化妝品。 The compound (1) of the present invention and the pigment composition containing the compound (1) of the present invention can be suitably used for the production of, for example, blue light shielding materials, ultraviolet absorbers, recording materials, and cosmetics.

含有本發明之化合物(1)之藍光屏蔽材料、紫外線吸收劑、記錄材料、化妝品亦包含於本發明中。藍光屏蔽材料、紫外線吸收劑、記錄材料、化 妝品只要含有化合物(1)即可,其構成並無特別限定。 Blue light shielding materials, ultraviolet absorbers, recording materials, and cosmetics containing the compound (1) of the present invention are also included in the present invention. The blue light shielding material, the ultraviolet absorber, the recording material, and the cosmetic only need to contain the compound (1), and the composition thereof is not particularly limited.

藍光屏蔽材料並無特別限定,例如可列舉:藍光截止膜;藍光截止用眼鏡之透鏡或隱形眼鏡等藍光阻斷透鏡等。該等藍光屏蔽材料可為使含有本發明之化合物(1)之材料成形而成之藍光屏蔽成形體。 The blue light blocking material is not particularly limited, and examples thereof include blue light blocking films, blue light blocking lenses such as lenses for blue light blocking glasses and contact lenses, and the like. These blue light shielding materials may be blue light shielding molded bodies formed by molding a material containing the compound (1) of the present invention.

作為製造作為藍光屏蔽材料之一例的透鏡之方法,例如可採用以下之方法:於透明樹脂中混練本發明之化合物(1)並藉由射出成形法、壓縮成形法、擠出成形法等而進行成形之方法;或於下述支持體上形成含有本發明之化合物(1)之光學功能層的方法等各種方法。 As a method of manufacturing a lens as an example of a blue light shielding material, for example, the following method can be adopted: kneading the compound (1) of the present invention in a transparent resin, and performing injection molding, compression molding, extrusion molding, etc. Various methods, such as the method of shaping|molding, and the method of forming the optical function layer containing the compound (1) of this invention on the following support.

紫外線吸收劑可用於玻璃、塑膠、纖維、紙、塗料、墨水、化妝品等各種材料中。紫外線吸收劑可混合於各種材料中使用,可分散於該材料中,亦可溶解於該材料中。又,紫外線吸收劑亦可以化學或物理方式擔載於各種材料。 UV absorbers can be used in various materials such as glass, plastic, fiber, paper, paint, ink, cosmetics, etc. The ultraviolet absorber can be used in a mixture of various materials, can be dispersed in the material, and can also be dissolved in the material. In addition, the ultraviolet absorber may be chemically or physically supported on various materials.

作為含有本發明之化合物(1)之記錄材料,可列舉光碟等。 An optical disc etc. are mentioned as a recording material containing the compound (1) of this invention.

本發明之化合物(1)以及含有本發明之化合物(1)的光學濾光片用色素及色素組成物例如可合適地用於製造光學濾光片。 The compound (1) of this invention, and the dye for optical filters containing the compound (1) of this invention, and a dye composition can be suitably used for manufacture of an optical filter, for example.

光學濾光片只要含有本發明之化合物(1)即可,例如可與以往者同樣地具有支持體,且視需要具有光學功能層等。於光學濾光片中,本發明之化合物(1)較佳於支持體或光學功能層中含有。 The optical filter should just contain the compound (1) of this invention, for example, it may have a support similarly to the conventional one, and may have an optical functional layer etc. as needed. In the optical filter, the compound (1) of the present invention is preferably contained in the support or the optical functional layer.

支持體及光學功能層之構成亦並無特別限定。例如支持體通常使用透明樹脂而形成。作為透明樹脂,例如可列舉:環狀烯烴系樹脂、芳香族聚醚系樹脂、聚醯亞胺系樹脂、茀聚碳酸酯系樹脂、茀聚酯系樹脂、聚碳酸酯系樹脂、聚醯胺(聚芳醯胺)系樹脂、聚芳酯系樹脂、聚碸系樹 脂、聚醚碸系樹脂、聚對苯系樹脂、聚醯胺醯亞胺系樹脂、聚萘二甲酸乙二酯(PEN)系樹脂、氟化芳香族聚合物系樹脂、(改質)丙烯酸系樹脂、環氧系樹脂等。 The structures of the support and the optical functional layer are also not particularly limited. For example, the support is usually formed using a transparent resin. Examples of transparent resins include cyclic olefin-based resins, aromatic polyether-based resins, polyimide-based resins, fluoride polycarbonate-based resins, fluoride-based polyester-based resins, polycarbonate-based resins, and polyamides. (polyarylate) resin, polyarylate resin, polyether resin, polyether resin, polyparaphenylene resin, polyamide imide resin, polyethylene naphthalate (PEN ) series resins, fluorinated aromatic polymer series resins, (modified) acrylic series resins, epoxy series resins, and the like.

光學濾光片之製造方法並無特別限定。例如作為於支持體上形成含有本發明之化合物(1)之光學功能層的方法,可列舉如下方法:於使本發明之化合物(1)及黏合劑樹脂等溶解或分散於溶劑中後,藉由浸漬塗佈法、氣刀塗佈法、簾塗佈法、滾筒塗佈法、線棒式塗佈法、凹版塗佈法、旋轉塗佈法、擠壓塗佈法等塗佈方法於支持體上形成塗膜。作為上述溶劑,並無特別限制,可列舉上述有機溶劑等。 The manufacturing method of an optical filter is not specifically limited. For example, as a method of forming an optically functional layer containing the compound (1) of the present invention on a support, a method of dissolving or dispersing the compound (1) of the present invention, a binder resin, etc. in a solvent, and then using It is supported by coating methods such as dip coating, air knife coating, curtain coating, roller coating, wire bar coating, gravure coating, spin coating, and extrusion coating. A coating film is formed on the body. It does not specifically limit as said solvent, The said organic solvent etc. are mentioned.

又,作為含有本發明之化合物(1)之光學功能層或支持體之製造方法,亦可於將本發明之化合物(1)與光硬化性樹脂及/或熱硬化性樹脂以及光聚合起始劑及/或熱聚合起始劑混合後,藉由光照射及/或加熱處理而形成硬化膜,並將其作為光學功能層或支持體。 In addition, as a method for producing an optical functional layer or a support containing the compound (1) of the present invention, the compound (1) of the present invention can also be started with a photocurable resin and/or a thermosetting resin and photopolymerization After mixing the agent and/or the thermal polymerization initiator, a cured film is formed by light irradiation and/or heat treatment, and this is used as an optical functional layer or a support.

光學濾光片例如可作為彩色濾光片、色轉換濾光片等光學濾光片而合適地用於攝像裝置、照明用具或窗玻璃等之防蟲(抑制具有向光性之飛翔昆蟲飛來)材料等。 Optical filters can be suitably used as optical filters such as color filters, color conversion filters, etc., for insect repellants (suppression of phototropic flying insects) for imaging devices, lighting fixtures, window glass, and the like. ) materials, etc.

[實施例] [Example]

以下,示出更具體地說明本發明之實施例,但本發明並不限定於該等實施例。 Hereinafter, although the Example which demonstrates this invention more concretely is shown, this invention is not limited to these Examples.

以下,測量所獲得之化合物之物性時所使用之機器及測量條件如下所述。 Hereinafter, the apparatus and measurement conditions used for measuring the physical properties of the obtained compound are as follows.

(GC-MS) (GC-MS)

島津製作所股份有限公司製造氣相層析質譜儀GCMS-QP2010Plus(EI法) Gas chromatography mass spectrometer GCMS-QP2010Plus (EI method) manufactured by Shimadzu Corporation

(LC/MS) (LC/MS)

島津製作所股份有限公司製造高效液相層析質譜儀LCMS-2010EV(ESI法) High performance liquid chromatography mass spectrometer LCMS-2010EV (ESI method) manufactured by Shimadzu Corporation

<製造例1> <Production Example 1>

化合物IM3、化合物IM5及化合物IM6之合成 Synthesis of Compound IM3, Compound IM5 and Compound IM6

化合物IM3係利用以下之方法合成。以下示出反應式。 Compound IM3 was synthesized by the following method. The reaction formula is shown below.

Figure 106130644-A0202-12-0031-20
Figure 106130644-A0202-12-0031-20

(化合物IM2之合成) (Synthesis of compound IM2)

於附有冷凝管及溫度計之1L四口燒瓶中,於Journal of American Chemical Society 1954,76,1879所記載之2-二甲基胺基-4-羥基-6-甲基嘧啶之合 成中,將N,N-二甲基胍硫酸鹽替換成與BE639386所記載之方法同樣地獲得之1,1-二丁基胍鹽酸鹽,除此以外,以相同之方式獲得化合物IM1。使用化合物IM1,以與Journal of the Chemical Society 1957,4845所記載之方法相同之順序藉由李莫-帝曼(Reimer-Tiemann)反應而甲醯基化,獲得化合物IM2(18.4g,產率69%)。 In a 1L four-necked flask with a condenser tube and a thermometer, in the synthesis of 2-dimethylamino-4-hydroxy-6-methylpyrimidine described in Journal of American Chemical Society 1954, 76, 1879, the Compound IM1 was obtained in the same manner, except that N,N-dimethylguanidine sulfate was replaced with 1,1-dibutylguanidine hydrochloride obtained in the same manner as the method described in BE639386. Using compound IM1, in the same order as the method described in Journal of the Chemical Society 1957, 4845, methylation was performed by Reimer-Tiemann reaction to obtain compound IM2 (18.4 g, yield 69 %).

GC-MS:m/z=265([M]+) GC-MS: m/z=265([M] + )

(化合物IM3之合成) (Synthesis of compound IM3)

於附有冷凝管及溫度計之100mL四口燒瓶中,將化合物IM2(15.8g)、碘乙烷(14g)(東京化成工業股份有限公司製造)、碳酸鉀(14g)、二甲基甲醯胺(DMF)(60mL)之混合液於70℃攪拌3小時後,放置冷卻至室溫為止。將反應液排出至水(300mL)中,並利用甲苯(300mL)進行萃取。藉由對有機層進行減壓濃縮而獲得化合物IM3(17.3g,產率99%)。 In a 100mL four-neck flask with a condenser tube and a thermometer, compound IM2 (15.8g), iodoethane (14g) (manufactured by Tokyo Chemical Industry Co., Ltd.), potassium carbonate (14g), dimethylformamide The mixture of (DMF) (60 mL) was stirred at 70° C. for 3 hours, and then left to cool to room temperature. The reaction liquid was drained into water (300 mL), and extracted with toluene (300 mL). Compound IM3 (17.3 g, 99% yield) was obtained by concentrating the organic layer under reduced pressure.

GC-MS:m/z=293([M]+) GC-MS: m/z=293([M] + )

化合物IM5及化合物IM6係利用以下之方法合成。以下示出反應式。下述式中之p為5之化合物係化合物IM5,p為6之化合物係化合物IM6。 Compound IM5 and compound IM6 were synthesized by the following method. The reaction formula is shown below. In the following formula, the compound in which p is 5 is compound IM5, and the compound in which p is 6 is compound IM6.

Figure 106130644-A0202-12-0033-22
Figure 106130644-A0202-12-0033-22

(化合物IM5之合成) (Synthesis of compound IM5)

於附有冷凝管及溫度計之50mL四口燒瓶中添加化合物IM2(2.7g)、1,5-二溴戊烷(1.1g)(東京化成工業股份有限公司製造)、碳酸鉀(1.7g)、DMF(20mL),並於80℃攪拌2.5小時。將反應液排出至水中,對析出之結晶進行過濾而取出。利用甲醇將該結晶洗淨,獲得2.1g之化合物IM5(產率71%)。 Compound IM2 (2.7g), 1,5-dibromopentane (1.1g) (manufactured by Tokyo Chemical Industry Co., Ltd.), potassium carbonate (1.7g), DMF (20 mL) and stirred at 80°C for 2.5 hours. The reaction solution was discharged into water, and the precipitated crystals were filtered and taken out. The crystals were washed with methanol to obtain 2.1 g of compound IM5 (yield: 71%).

(化合物IM6之合成) (Synthesis of compound IM6)

將化合物IM5之合成中之1,5-二溴戊烷替換成1,6-二溴己烷(東京化成工業股份有限公司製造),除此以外,以相同之順序獲得化合物IM6(產率82%)。 In the synthesis of compound IM5, except that 1,5-dibromopentane was replaced with 1,6-dibromohexane (manufactured by Tokyo Chemical Industry Co., Ltd.), compound IM6 was obtained in the same procedure (yield: 82 %).

<製造例2> <Production Example 2>

合成化合物C1~C5。化合物C1係下述式表示之化合物。 Compounds C1~C5 were synthesized. Compound C1 is a compound represented by the following formula.

Figure 106130644-A0202-12-0034-23
Figure 106130644-A0202-12-0034-23

化合物C2~C4係下述式表示之化合物。化合物C2係下述式中之R為2,6-二-第三丁基-4-甲基環己基。化合物C3係下述式中之R為4-第三丁基環己基。化合物C4係下述式中之R為第三丁基。 Compounds C2 to C4 are compounds represented by the following formulae. In compound C2, R in the following formula is 2,6-di-tert-butyl-4-methylcyclohexyl. Compound C3 is in the following formula where R is 4-tert-butylcyclohexyl. Compound C4 wherein R in the following formula is a tert-butyl group.

Figure 106130644-A0202-12-0034-24
Figure 106130644-A0202-12-0034-24

化合物C5係下述式表示之化合物。 Compound C5 is a compound represented by the following formula.

Figure 106130644-A0202-12-0035-26
Figure 106130644-A0202-12-0035-26

以下示出獲得化合物C1~C4之反應式。將式中之p及對應之化合物示於表1。以下示出用於合成之化合物IM12、化合物IM13及化合物IM14之結構。 Reaction formulas for obtaining compounds C1 to C4 are shown below. Table 1 shows p in the formula and the corresponding compound. The structures of compound IM12, compound IM13 and compound IM14 used in the synthesis are shown below.

Figure 106130644-A0202-12-0035-25
Figure 106130644-A0202-12-0035-25

Figure 106130644-A0202-12-0035-27
Figure 106130644-A0202-12-0035-27

Figure 106130644-A0202-12-0036-28
Figure 106130644-A0202-12-0036-28

(化合物C1之合成) (Synthesis of Compound C1)

於附有冷凝管及溫度計之50mL四口燒瓶中將化合物IM6(2.0g)、與日本專利特開2000-310841號公報所記載之方法同樣地合成之化合物IM12(2.0g)、哌啶(0.06g)、乙醇(13mL)進行混合,並於75℃攪拌18小時。放置冷卻至室溫為止,對析出之結晶進行過濾而取出,並利用乙醇將其洗淨,獲得化合物C1(3.5g,產率93%)。 In a 50 mL four-neck flask with a condenser and a thermometer, compound IM6 (2.0 g), compound IM12 (2.0 g) synthesized in the same manner as the method described in Japanese Patent Laid-Open No. 2000-310841, and piperidine (0.06 g) were prepared. g) and ethanol (13 mL) were mixed and stirred at 75°C for 18 hours. It was left to cool to room temperature, the precipitated crystals were filtered and taken out, and washed with ethanol to obtain compound C1 (3.5 g, yield 93%).

LC-MS:m/z=1164([M+H]+) LC-MS: m/z=1164 ([M+H] + )

(化合物C2之合成) (Synthesis of Compound C2)

將化合物C1之合成中之化合物IM6替換成化合物IM5,除此以外,以相同之順序獲得化合物C2(產率81%)。 Compound C2 was obtained in the same order (yield 81%) except that compound IM6 in the synthesis of compound C1 was replaced with compound IM5.

LC-MS:m/z=1150([M+H]+) LC-MS: m/z=1150 ([M+H] + )

(化合物C3之合成) (Synthesis of Compound C3)

將化合物C1之合成中之化合物IM6替換成化合物IM5,將化合物IM12替換成與化合物IM12之合成同樣地獲得之化合物IM13,除此以外,以相同之順序獲得化合物C3(產率61%)。 Compound C3 was obtained in the same order (yield 61%) except that compound IM6 in the synthesis of compound C1 was replaced by compound IM5, and compound IM12 was replaced by compound IM13 obtained in the same manner as in the synthesis of compound IM12.

LC-MS:m/z=1010([M+H]+) LC-MS: m/z=1010([M+H] + )

(化合物C4之合成) (Synthesis of compound C4)

將化合物C1之合成中之化合物IM6替換成化合物IM5,將化合物IM12 替換成化合物IM14(東京化成工業股份有限公司製造),除此以外,以相同之順序獲得化合物C4(產率80%)。 Compound C4 was obtained in the same procedure (yield 80%) except that compound IM6 in the synthesis of compound C1 was replaced by compound IM5, and compound IM12 was replaced by compound IM14 (manufactured by Tokyo Chemical Industry Co., Ltd.).

LC-MS:m/z=846([M+H]+) LC-MS: m/z=846 ([M+H] + )

(化合物C5之合成) (Synthesis of compound C5)

於附有冷凝管及溫度計之25mL四口燒瓶中,將化合物IM3(1.2g)、IM12(1.5g)、哌啶(0.02g)、乙醇(4mL)之混合液於75℃攪拌1小時。放置冷卻至室溫為止,對析出之結晶進行過濾而取出。利用乙醇將獲得之結晶洗淨,獲得1.9g化合物C5(產率80%)。以下示出反應式。 In a 25 mL four-neck flask with a condenser and a thermometer, a mixture of compound IM3 (1.2 g), IM12 (1.5 g), piperidine (0.02 g) and ethanol (4 mL) was stirred at 75°C for 1 hour. It was left to cool to room temperature, and the precipitated crystals were filtered and taken out. The obtained crystals were washed with ethanol to obtain 1.9 g of compound C5 (yield 80%). The reaction formula is shown below.

LC-MS:m/z=569([M+H]+) LC-MS: m/z=569 ([M+H] + )

Figure 106130644-A0202-12-0037-30
Figure 106130644-A0202-12-0037-30

<比較製造例(比較例化合物)> <Comparative Production Example (Comparative Example Compound)>

Figure 106130644-A0202-12-0037-29
Figure 106130644-A0202-12-0037-29

(比較例化合物Z1之合成) (Synthesis of Comparative Example Compound Z1)

與日本專利特開2011-184414號公報所記載之方法同樣地獲得比較例化合物Z1。 Comparative Example Compound Z1 was obtained in the same manner as in the method described in Japanese Patent Laid-Open No. 2011-184414.

(比較例化合物Z2之合成) (Synthesis of Comparative Example Compound Z2)

與日本專利特開2014-194508號公報所記載之方法同樣地獲得比較例化合物Z2。 Comparative Example Compound Z2 was obtained in the same manner as in the method described in Japanese Patent Laid-Open No. 2014-194508.

(比較例化合物Z3之合成) (Synthesis of Comparative Example Compound Z3)

與日本專利特開2009-067973號公報所記載之方法同樣地獲得比較例化合物Z3。 Comparative Example Compound Z3 was obtained in the same manner as in the method described in Japanese Patent Laid-Open No. 2009-067973.

(比較例化合物Z4之合成) (Synthesis of Comparative Example Compound Z4)

與US2986528號公報所記載之方法同樣地獲得比較例化合物Z4。 Comparative Example Compound Z4 was obtained in the same manner as in the method described in US2986528.

對各製造例中獲得之化合物進行以下之評價。將結果示於表2。 The following evaluations were performed on the compounds obtained in each production example. The results are shown in Table 2.

<分光特性試驗> <Spectral characteristic test>

測量各化合物於氯仿中之吸收光譜,測量最大吸收波長(λmax)及400nm之克吸光係數,並藉由下述基準進行評價。 The absorption spectrum of each compound in chloroform was measured, the maximum absorption wavelength (λmax) and the gram absorption coefficient at 400 nm were measured, and evaluated by the following criteria.

測量機器:日本分光公司製造之紫外可見分光光度計V-560 Measuring machine: UV-Vis Spectrophotometer V-560 manufactured by Nippon Spectrum Corporation

A:克吸光係數為30以上 A: The gram absorption coefficient is 30 or more

B:克吸光係數為20以上且未達30 B: The gram absorption coefficient is 20 or more and less than 30

C:克吸光係數為10以上且未達20 C: The gram absorption coefficient is 10 or more and less than 20

D:克吸光係數未達10 D: The gram absorption coefficient is less than 10

<耐光性試驗> <Light fastness test>

對製造例及比較製造例中獲得之一部分化合物進行耐光性試驗。將各化合物10mg熔融於聚甲基丙烯酸酯8重量%甲苯溶液5mL中,藉由旋轉塗佈法將其塗佈於玻璃基板上並使之乾燥,藉此製作膜厚1.5μm之薄膜。 A light resistance test was performed on some of the compounds obtained in the production examples and comparative production examples. 10 mg of each compound was melted in 5 mL of a polymethacrylate 8 wt % toluene solution, applied on a glass substrate by a spin coating method, and dried to prepare a thin film having a thickness of 1.5 μm.

對所製作之薄膜連續照射96小時之氙氣燈(142klux)之光,利用分光光度計測量照射前(0小時)、照射後之薄膜的穿透率,並依據下述式(1)測量色素殘存率。 The produced film was continuously irradiated with light of a xenon lamp (142klux) for 96 hours, and the transmittance of the film before irradiation (0 hours) and after irradiation was measured with a spectrophotometer, and the remaining pigment was measured according to the following formula (1). Rate.

色素殘存率(%)={(1-T1)/(1-T0)}×100 (1) Pigment remaining rate (%)={(1-T 1 )/(1-T 0 )}×100 (1)

[其中,T0為氙氣燈照射前之穿透率,T1為氙氣燈照射後之穿透率,T0及T1為0~1] [Wherein, T 0 is the transmittance before xenon lamp irradiation, T 1 is the transmittance after xenon lamp irradiation, T 0 and T 1 are 0~1]

再者,所謂「穿透率」,表示各化合物之最大吸收波長之穿透率,色素殘存率越高,表示化合物越不易被光分解,耐光性越高。 Furthermore, the so-called "transmittance" refers to the transmittance at the maximum absorption wavelength of each compound. The higher the residual rate of the dye, the less likely the compound is to be decomposed by light, and the higher the light resistance.

耐光性係藉由下述基準進行評價。 The light resistance was evaluated according to the following criteria.

A:色素殘存率為65%以上 A: The residual rate of pigment is more than 65%

B:色素殘存率為40%以上且未達65% B: The residual rate of pigment is more than 40% and less than 65%

C:色素殘存率為10%以上且未達40% C: The residual rate of pigment is more than 10% and less than 40%

D:色素殘存率未達10% D: The residual rate of pigment is less than 10%

<耐熱性> <heat resistance>

針對製造例及比較製造例中獲得之一部分化合物,使用島津製作所股份有限公司製造之熱重量測量裝置TGA-50於下述測量條件下測量由熱分解所導致之重量減少,將自初始重量減量1%時之溫度作為分解起始溫度而進行測量。 For some of the compounds obtained in the production examples and comparative production examples, the weight loss due to thermal decomposition was measured using a thermogravimetric measuring apparatus TGA-50 manufactured by Shimadzu Corporation under the following measurement conditions, and the weight loss from the initial weight was 1 The temperature at % was measured as the decomposition initiation temperature.

(測量條件) (measurement conditions)

於試樣量5mg、升溫速度10℃/min(最高到達溫度400℃)、氮氣環境中、流量10mL/min之條件下進行測量。 The measurement was carried out under the conditions of a sample amount of 5 mg, a heating rate of 10° C./min (maximum temperature reached 400° C.), a nitrogen atmosphere, and a flow rate of 10 mL/min.

耐熱性係根據分解起始溫度並藉由下述基準進行評價。 The heat resistance was evaluated by the following criteria based on the decomposition initiation temperature.

A:250℃以上 A: Above 250℃

B:210℃以上且未達250℃ B: Above 210°C and less than 250°C

C:未達210℃ C: less than 210℃

<溶解度試驗> <Solubility Test>

針對製造例中獲得之一部分化合物,藉由以下之方法分別測量20℃之對甲苯、甲基乙基酮(MEK)及丙二醇單甲醚乙酸酯(PGMEA)之溶解度(重量%)。 For some of the compounds obtained in the production examples, the solubility (% by weight) of p-toluene, methyl ethyl ketone (MEK) and propylene glycol monomethyl ether acetate (PGMEA) at 20° C. was measured by the following method.

稱量各化合物至玻璃製試驗管中,混合溶劑並於20℃攪拌而使之溶解,目測觀察其溶液之狀態,對可溶解之重量濃度進行評價。 Each compound was weighed into a glass test tube, the solvent was mixed, stirred at 20° C. to dissolve, and the state of the solution was visually observed to evaluate the soluble weight concentration.

A:3wt%以上溶解 A: 3 wt% or more dissolved

B:1wt%以上且未達3wt%溶解 B: 1 wt% or more and less than 3 wt% dissolved

C:僅未達1wt%溶解 C: Only less than 1 wt% dissolved

Figure 106130644-A0202-12-0040-31
Figure 106130644-A0202-12-0040-31

根據上述結果得知,各製造例中所製造之化合物C1~C5於400nm附近具有最大吸收波長,於400nm具有較高之克吸光係數。該等化合物可有效地吸收400nm附近之光。化合物C1~C5對有機溶劑之溶解性良好。又,該等化合物之耐久性亦良好。例如,得知化合物C1~C2係耐光性、溶解度、耐熱性均優異,且亦可合適地應用作例如藍光屏蔽材料用之色素之化合物。比較例化合物Z1~Z2及Z4雖於363~382nm具有最大吸收波長,但400nm之克吸光係數較低。各製造例中所製造之本發明之化合物相較於比較例化合物Z1~Z2及Z4,可更有效地吸收400nm附近之光。比較例化合物Z3耐久性不足夠。 According to the above results, the compounds C1 to C5 produced in each production example have maximum absorption wavelengths near 400 nm, and high gram absorption coefficients at 400 nm. These compounds can effectively absorb light around 400 nm. Compounds C1-C5 have good solubility in organic solvents. Moreover, the durability of these compounds is also favorable. For example, it was found that compounds C1 to C2 are excellent in light resistance, solubility, and heat resistance, and can also be suitably used as compounds such as dyes for blue light shielding materials. Although the compounds Z1-Z2 and Z4 of the comparative examples have maximum absorption wavelengths at 363-382 nm, the gram absorption coefficients at 400 nm are relatively low. The compounds of the present invention produced in each production example can absorb light around 400 nm more effectively than the compounds Z1 to Z2 and Z4 of the comparative examples. The comparative example compound Z3 has insufficient durability.

Claims (6)

一種下述通式(3)表示之化合物,
Figure 106130644-A0305-02-0045-1
(通式(3)中,R1a表示氫原子、可具有取代基之碳數1~20之烷基或可具有取代基之碳數6~20之芳基,R2a表示氫原子、氰基、硝基、三氟甲基、含雜環之基、-C(O)-R7a或-SO2-R8a;R7a表示羥基或-OR71a,R8a表示鹵素原子、羥基、-OR81a、-NR82aR83a或-R84a;R71a及R81a~R84a相同或不同,表示氫原子、可具有取代基之碳數1~20之烷基或可具有取代基之碳數6~20之芳基;R3a表示氫原子、鹵素原子、氰基、可具有取代基之碳數1~20之烷基或可具有取代基之碳數6~20之芳基;R402a表示氫原子、鹵素原子、可具有取代基之碳數1~20之烷基、可具有取代基之碳數6~20之芳基、-NR406aR407a、-OR408a、氰基、-C(O)R409a、-O-C(O)R410a或-C(O)OR411a,R404a~R411a相同或不同,表示氫原子、可具有取代基之碳數1~20之烷基或可具有取代基之碳數6~20之芳基;亦可由R404a與R405a與R404a及R405a所鍵結之氮原子形成可具有取代基之4~8員之含氮雜環;R413表示下述通式(4)表示之基,
Figure 106130644-A0305-02-0046-2
(通式(4)中,Q2表示可具有取代基之碳數1~20之2價烴基,*表示與通式(3)之鍵結部位;R1b表示氫原子、可具有取代基之碳數1~20之烷基或可具有取代基之碳數6~20之芳基,R2b表示氫原子、氰基、硝基、三氟甲基、含雜環之基、-C(O)-R7b或-SO2-R8b;R7b表示羥基或-OR71b,R8b表示鹵素原子、羥基、-OR81b、-NR82bR83b或-R84b;R71b及R81b~R84b相同或不同,表示氫原子、可具有取代基之碳數1~20之烷基或可具有取代基之碳數6~20之芳基;R3b表示氫原子、鹵素原子、氰基、可具有取代基之碳數1~20之烷基或可具有取代基之碳數6~20之芳基;R402b表示氫原子、鹵素原子、可具有取代基之碳數1~20之烷基、可具有取代基之碳數6~20之芳基、-NR406bR407b、-OR408b、氰基、-C(O)R409b、-O-C(O)R410b或-C(O)OR411b,R404b~R411b相同或不同,表示氫原子、可具有取代基之碳數1~20之烷基或可具有取代基之碳數6~20之芳基;亦可由R404b與R405b與R404b及R405b所鍵結之氮原子形成可具有取代基之4~8員之含氮雜環))。
A compound represented by the following general formula (3),
Figure 106130644-A0305-02-0045-1
(In the general formula (3), R 1a represents a hydrogen atom, an alkyl group having 1 to 20 carbon atoms that may have a substituent, or an aryl group that may have a substituent group having 6 to 20 carbon atoms, and R 2a represents a hydrogen atom, a cyano group , nitro, trifluoromethyl, heterocyclic group, -C(O)-R 7a or -SO 2 -R 8a ; R 7a represents hydroxyl or -OR 71a , R 8a represents halogen atom, hydroxyl, -OR 81a , -NR 82a R 83a or -R 84a ; R 71a and R 81a to R 84a are the same or different, and represent a hydrogen atom, an alkyl group with 1 to 20 carbon atoms that may have a substituent, or a carbon number 6 that may have a substituent group Aryl group of ~20; R 3a represents a hydrogen atom, a halogen atom, a cyano group, an alkyl group with 1 to 20 carbon atoms which may have a substituent or an aryl group with 6 to 20 carbon atoms that may have a substituent; R 402a represents hydrogen Atom, halogen atom, alkyl group with 1 to 20 carbon atoms which may have a substituent, aryl group with 6 to 20 carbon atoms which may have a substituent, -NR 406a R 407a , -OR 408a , cyano group, -C(O ) R 409a , -OC(O)R 410a or -C(O)OR 411a , R 404a ~R 411a are the same or different, and represent a hydrogen atom, an alkyl group with 1 to 20 carbon atoms that may have a substituent or a substituent The aryl group of the carbon number of the base is 6~20; it can also form a nitrogen-containing heterocyclic ring with 4~8 members that can have substituents by the nitrogen atoms bonded by R 404a and R 405a and R 404a and R 405a ; R 413 represents the following The base represented by the general formula (4),
Figure 106130644-A0305-02-0046-2
(In the general formula (4), Q 2 represents a divalent hydrocarbon group with 1 to 20 carbon atoms which may have a substituent, * represents a bonding site with the general formula (3); R 1b represents a hydrogen atom, which may have a substituent Alkyl with 1 to 20 carbon atoms or aryl group with 6 to 20 carbon atoms that may have substituents, R 2b represents a hydrogen atom, a cyano group, a nitro group, a trifluoromethyl group, a group containing a heterocyclic ring, -C(O )-R 7b or -SO 2 -R 8b ; R 7b represents a hydroxyl group or -OR 71b , R 8b represents a halogen atom, a hydroxyl group, -OR 81b , -NR 82b R 83b or -R 84b ; R 71b and R 81b ~R 84b are the same or different, and represent a hydrogen atom, an alkyl group with a carbon number of 1 to 20 that may have a substituent or an aryl group with a carbon number of 6 to 20 that may have a substituent; R 3b represents a hydrogen atom, a halogen atom, a cyano group, C 1-20 alkyl group with substituent or aryl group with carbon number 6-20 which may have substituent; R 402b represents hydrogen atom, halogen atom, alkyl group with carbon number 1-20 which may have substituent, Aryl with 6-20 carbon atoms, -NR 406b R 407b , -OR 408b , cyano group, -C(O)R 409b , -OC(O)R 410b or -C(O)OR 411b , R 404b ~ R 411b are the same or different, and represent a hydrogen atom, an alkyl group with a carbon number of 1 to 20 that can have a substituent or an aryl group with a carbon number of 6 to 20 that can have a substituent; R 404b and R 405b can also be combined with The nitrogen atoms to which R 404b and R 405b are bonded form a 4- to 8-membered nitrogen-containing heterocycle which may have a substituent)).
一種下述通式(5)表示之化合物,
Figure 106130644-A0305-02-0047-3
(通式(5)中,R2c表示氫原子、氰基、硝基、三氟甲基、含雜環之基、-C(O)-R7c或-SO2-R8c,R7c表示羥基或-OR71c,R8c表示鹵素原子、羥基、-OR81c、-NR82cR83c或-R84c,R71c及R81c~R84c相同或不同,表示氫原子、可具有取代基之碳數1~20之烷基或可具有取代基之碳數6~20之芳基;R3c表示氫原子、鹵素原子、氰基、可具有取代基之碳數1~20之烷基或可具有取代基之碳數6~20之芳基;R402c及R403c相同或不同,表示氫原子、鹵素原子、可具有取代基之碳數1~20之烷基、可具有取代基之碳數6~20之芳基、-NR406cR407c、-OR408c、氰基、-C(O)R409c、-O-C(O)R410c或-C(O)OR411c,R404c~R411c相同或不同,表示氫原子、可具有取代基之碳數1~20之烷基或可具有取代基之碳數6~20之芳基;亦可由R404c與R405c與R404c及R405c所鍵結之氮原子形成可具有取代基之4~8員之含氮雜環;R501表示下述通式(6)表示之基,
Figure 106130644-A0305-02-0047-4
(通式(6)中,Q3表示可具有取代基之碳數1~20之2價烴基,*表示與通式(5)之鍵結部位;R2d表示氫原子、氰基、硝基、三氟甲基、含雜環之基、-C(O)-R7d或-SO2-R8d;R7d表示羥基或-OR71d,R8d表示鹵素原子、羥基、-OR81d、-NR82dR83d或-R84d;R71d及R81d~R84d相同或不同,表示氫原子、可具有取代基之碳數1~20之烷基或可具有取代基之碳數6~20之芳基;R3d表示氫原子、鹵素原子、氰基、可具有取代基之碳數1~20之烷基或可具有取代基之碳數6~20之芳基;R402d及R403d相同或不同,表示氫原子、鹵素原子、可具有取代基之碳數1~20之烷基、可具有取代基之碳數6~20之芳基、-NR406dR407d、-OR408d、氰基、-C(O)R409d、-O-C(O)R410d或-C(O)OR411d,R404d~R411d相同或不同,表示氫原子、可具有取代基之碳數1~20之烷基或可具有取代基之碳數6~20之芳基;亦可由R404d與R405d與R404d及R405d所鍵結之氮原子形成可具有取代基之4~8員之含氮雜環))。
A compound represented by the following general formula (5),
Figure 106130644-A0305-02-0047-3
(In the general formula (5), R 2c represents a hydrogen atom, a cyano group, a nitro group, a trifluoromethyl group, a group containing a heterocyclic ring, -C(O)-R 7c or -SO 2 -R 8c , and R 7c represents Hydroxyl or -OR 71c , R 8c represents a halogen atom, hydroxyl, -OR 81c , -NR 82c R 83c or -R 84c , R 71c and R 81c to R 84c are the same or different, represent a hydrogen atom, a carbon that may have a substituent Alkyl with 1 to 20 carbon atoms or aryl group with 6 to 20 carbon atoms that may have substituents; R 3c represents hydrogen atom, halogen atom, cyano group, alkyl group with 1 to 20 carbon atoms that may have substituents or may have The aryl group with 6~20 carbon atoms of the substituent; R 402c and R 403c are the same or different, and represent a hydrogen atom, a halogen atom, an alkyl group with a carbon number of 1~20 that may have a substituent, and a carbon number 6 that may have a substituent Aryl group of ~20, -NR 406c R 407c , -OR 408c , cyano group, -C(O)R 409c , -OC(O)R 410c or -C(O)OR 411c , R 404c ~R 411c are the same or Different, represents a hydrogen atom, an alkyl group with a carbon number of 1 to 20 that may have a substituent, or an aryl group with a carbon number of 6 to 20 that may have a substituent; it can also be bonded by R 404c and R 405c and R 404c and R 405c The nitrogen atom of R 501 represents a group represented by the following general formula (6),
Figure 106130644-A0305-02-0047-4
(In the general formula (6), Q 3 represents a divalent hydrocarbon group having 1 to 20 carbon atoms which may have a substituent, * represents a bonding site with the general formula (5); R 2d represents a hydrogen atom, a cyano group, a nitro group , trifluoromethyl, group containing heterocyclic ring, -C(O)-R 7d or -SO 2 -R 8d ; R 7d represents hydroxyl or -OR 71d , R 8d represents halogen atom, hydroxyl, -OR 81d , - NR 82d R 83d or -R 84d ; R 71d and R 81d to R 84d are the same or different, and represent a hydrogen atom, an alkyl group with 1 to 20 carbon atoms that may have a substituent, or a group of 6 to 20 carbon atoms that may have a substituent. Aryl; R 3d represents a hydrogen atom, a halogen atom, a cyano group, an alkyl group with 1 to 20 carbon atoms that may have a substituent or an aryl group with 6 to 20 carbon atoms that may have a substituent; R 402d and R 403d are the same or Different, it represents a hydrogen atom, a halogen atom, an alkyl group with 1 to 20 carbon atoms that may have a substituent, an aryl group with 6 to 20 carbon atoms that may have a substituent, -NR 406d R 407d , -OR 408d , cyano group, -C(O)R 409d , -OC(O)R 410d or -C(O)OR 411d , R 404d to R 411d are the same or different, and represent a hydrogen atom, an alkyl group having 1 to 20 carbon atoms that may have a substituent Or an aryl group with a carbon number of 6 to 20 that may have a substituent; a nitrogen-containing heterocyclic ring with 4 to 8 members that may have a substituent can also be formed from the nitrogen atoms bound by R 404d and R 405d and R 404d and R 405d ) ).
如請求項1或2之化合物,其為色素化合物。 The compound of claim 1 or 2, which is a pigment compound. 一種色素組成物,其含有下述通式(1)表示之化合物,
Figure 106130644-A0305-02-0048-5
(通式(1)中,m表示1~6之整數,Q1於m為1時表示氫原子,於m為2~6時表示2~6價之連結基,D1表示自下述通式(2)表示之化合物中脫去1個氫原子之基,於m為2~6時,多個D1可全部相同,亦可不同;
Figure 106130644-A0305-02-0049-6
(通式(2)中,R1表示氫原子、可具有取代基之烷基或可具有取代基之芳基;R2表示氫原子、氰基、硝基、三氟甲基、含雜環之基、-C(O)-R7或-SO2-R8;R7表示羥基或-OR71,R8表示鹵素原子、羥基、-OR81、-NR82R83或-R84;R71及R81~R84相同或不同,表示氫原子、可具有取代基之烷基或可具有取代基之芳基;R3表示氫原子、鹵素原子、氰基、可具有取代基之烷基或可具有取代基之芳基;R402及R403相同或不同,表示氫原子、鹵素原子、可具有取代基之烷基、可具有取代基之芳基、-NR406R407、-OR408、氰基、-C(O)R409、-O-C(O)R410或-C(O)OR411,R404~R411相同或不同,表示氫原子、可具有取代基之烷基或可具有取代基之芳基;亦可由R404與R405與R404及R405所鍵結之氮原子形成可具有取代基之4~8員之含氮雜環))。
A pigment composition comprising a compound represented by the following general formula (1),
Figure 106130644-A0305-02-0048-5
(In the general formula (1), m represents an integer of 1 to 6, Q 1 represents a hydrogen atom when m is 1, and a linking group of 2 to 6 valences when m is 2 to 6, and D 1 represents the following general In the compound represented by the formula (2), one hydrogen atom is removed, and when m is 2 to 6, a plurality of D 1 may all be the same or different;
Figure 106130644-A0305-02-0049-6
(In the general formula (2), R 1 represents a hydrogen atom, an alkyl group which may have a substituent or an aryl group which may have a substituent; R 2 represents a hydrogen atom, a cyano group, a nitro group, a trifluoromethyl group, a heterocyclic ring-containing group the base, -C(O)-R 7 or -SO 2 -R 8 ; R 7 represents hydroxyl or -OR 71 , R 8 represents halogen atom, hydroxyl, -OR 81 , -NR 82 R 83 or -R 84 ; R 71 and R 81 to R 84 are the same or different, and represent a hydrogen atom, an alkyl group that may have a substituent or an aryl group that may have a substituent; R 3 represents a hydrogen atom, a halogen atom, a cyano group, an alkane that may have a substituent R 402 and R 403 are the same or different, and represent a hydrogen atom, a halogen atom, an alkyl group that may have a substituent, an aryl group that may have a substituent, -NR 406 R 407 , -OR 408 , cyano group, -C(O)R 409 , -OC(O)R 410 or -C(O)OR 411 , R 404 to R 411 are the same or different, and represent a hydrogen atom, an alkyl group which may have a substituent or An aryl group which may have a substituent; a nitrogen-containing heterocyclic ring with 4 to 8 members which may have a substituent may also be formed from the nitrogen atom to which R 404 and R 405 and R 404 and R 405 are bonded)).
一種藍光屏蔽成形體,其含有下述通式(1)表示之化合物,
Figure 106130644-A0305-02-0049-7
(通式(1)中,m表示1~6之整數,Q1於m為1時表示氫原子,於m為2~6時表示2~6價之連結基, D1表示自下述通式(2)表示之化合物中脫去1個氫原子之基,於m為2~6時,多個D1可全部相同,亦可不同;
Figure 106130644-A0305-02-0050-8
(通式(2)中,R1表示氫原子、可具有取代基之烷基或可具有取代基之芳基;R2表示氫原子、氰基、硝基、三氟甲基、含雜環之基、-C(O)-R7或-SO2-R8;R7表示羥基或-OR71,R8表示鹵素原子、羥基、-OR81、-NR82R83或-R84;R71及R81~R84相同或不同,表示氫原子、可具有取代基之烷基或可具有取代基之芳基;R3表示氫原子、鹵素原子、氰基、可具有取代基之烷基或可具有取代基之芳基;R402及R403相同或不同,表示氫原子、鹵素原子、可具有取代基之烷基、可具有取代基之芳基、-NR406R407、-OR408、氰基、-C(O)R409、-O-C(O)R410或-C(O)OR411,R404~R411相同或不同,表示氫原子、可具有取代基之烷基或可具有取代基之芳基;亦可由R404與R405與R404及R405所鍵結之氮原子形成可具有取代基之4~8員之含氮雜環))。
A blue light shielding molded body containing a compound represented by the following general formula (1),
Figure 106130644-A0305-02-0049-7
(In the general formula (1), m represents an integer of 1 to 6, Q 1 represents a hydrogen atom when m is 1, and a linking group of 2 to 6 valences when m is 2 to 6, D 1 represents a In the compound represented by the formula (2), one hydrogen atom is removed, and when m is 2 to 6, a plurality of D 1 may all be the same or different;
Figure 106130644-A0305-02-0050-8
(In the general formula (2), R 1 represents a hydrogen atom, an alkyl group which may have a substituent or an aryl group which may have a substituent; R 2 represents a hydrogen atom, a cyano group, a nitro group, a trifluoromethyl group, a heterocyclic ring-containing group the base, -C(O)-R 7 or -SO 2 -R 8 ; R 7 represents hydroxyl or -OR 71 , R 8 represents halogen atom, hydroxyl, -OR 81 , -NR 82 R 83 or -R 84 ; R 71 and R 81 to R 84 are the same or different, and represent a hydrogen atom, an alkyl group that may have a substituent or an aryl group that may have a substituent; R 3 represents a hydrogen atom, a halogen atom, a cyano group, an alkane that may have a substituent R 402 and R 403 are the same or different, and represent a hydrogen atom, a halogen atom, an alkyl group that may have a substituent, an aryl group that may have a substituent, -NR 406 R 407 , -OR 408 , cyano group, -C(O)R 409 , -OC(O)R 410 or -C(O)OR 411 , R 404 to R 411 are the same or different, and represent a hydrogen atom, an alkyl group which may have a substituent or An aryl group which may have a substituent; a nitrogen-containing heterocyclic ring with 4 to 8 members which may have a substituent may also be formed from the nitrogen atom to which R 404 and R 405 and R 404 and R 405 are bonded)).
一種紫外線吸收劑,其含有下述通式(1)表示之化合物,
Figure 106130644-A0305-02-0050-9
(通式(1)中,m表示1~6之整數,Q1於m為1時表示氫原子,於m為2~6時表示2~6價之連結基,D1表示自下述通式(2)表示之化合物中脫去1個氫原子之基,於m為2~6時,多個D1可全部相同,亦可不同;
Figure 106130644-A0305-02-0051-10
(通式(2)中,R1表示氫原子、可具有取代基之烷基或可具有取代基之芳基;R2表示氫原子、氰基、硝基、三氟甲基、含雜環之基、-C(O)-R7或-SO2-R8;R7表示羥基或-OR71,R8表示鹵素原子、羥基、-OR81、-NR82R83或-R84;R71及R81~R84相同或不同,表示氫原子、可具有取代基之烷基或可具有取代基之芳基;R3表示氫原子、鹵素原子、氰基、可具有取代基之烷基或可具有取代基之芳基;R402及R403相同或不同,表示氫原子、鹵素原子、可具有取代基之烷基、可具有取代基之芳基、-NR406R407、-OR408、氰基、-C(O)R409、-O-C(O)R410或-C(O)OR411,R404~R411相同或不同,表示氫原子、可具有取代基之烷基或可具有取代基之芳基;亦可由R404與R405與R404及R405所鍵結之氮原子形成可具有取代基之4~8員之含氮雜環))。
An ultraviolet absorber containing a compound represented by the following general formula (1),
Figure 106130644-A0305-02-0050-9
(In the general formula (1), m represents an integer of 1 to 6, Q 1 represents a hydrogen atom when m is 1, and a linking group of 2 to 6 valences when m is 2 to 6, and D 1 represents the following general In the compound represented by the formula (2), one hydrogen atom is removed, and when m is 2 to 6, a plurality of D 1 may all be the same or different;
Figure 106130644-A0305-02-0051-10
(In the general formula (2), R 1 represents a hydrogen atom, an alkyl group which may have a substituent or an aryl group which may have a substituent; R 2 represents a hydrogen atom, a cyano group, a nitro group, a trifluoromethyl group, a heterocyclic ring-containing group the base, -C(O)-R 7 or -SO 2 -R 8 ; R 7 represents hydroxyl or -OR 71 , R 8 represents halogen atom, hydroxyl, -OR 81 , -NR 82 R 83 or -R 84 ; R 71 and R 81 to R 84 are the same or different, and represent a hydrogen atom, an alkyl group that may have a substituent or an aryl group that may have a substituent; R 3 represents a hydrogen atom, a halogen atom, a cyano group, an alkane that may have a substituent R 402 and R 403 are the same or different, and represent a hydrogen atom, a halogen atom, an alkyl group that may have a substituent, an aryl group that may have a substituent, -NR 406 R 407 , -OR 408 , cyano group, -C(O)R 409 , -OC(O)R 410 or -C(O)OR 411 , R 404 to R 411 are the same or different, and represent a hydrogen atom, an alkyl group which may have a substituent or An aryl group which may have a substituent; a nitrogen-containing heterocyclic ring with 4 to 8 members which may have a substituent may also be formed from the nitrogen atom to which R 404 and R 405 and R 404 and R 405 are bonded)).
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