TWI761776B - Control device, program and grinding method of grinding device - Google Patents
Control device, program and grinding method of grinding device Download PDFInfo
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- TWI761776B TWI761776B TW109106871A TW109106871A TWI761776B TW I761776 B TWI761776 B TW I761776B TW 109106871 A TW109106871 A TW 109106871A TW 109106871 A TW109106871 A TW 109106871A TW I761776 B TWI761776 B TW I761776B
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B7/00—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor
- B24B7/07—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor involving a stationary work-table
- B24B7/075—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor involving a stationary work-table using a reciprocating grinding head mounted on a movable carriage
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B47/00—Drives or gearings; Equipment therefor
- B24B47/22—Equipment for exact control of the position of the grinding tool or work at the start of the grinding operation
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B47/00—Drives or gearings; Equipment therefor
- B24B47/20—Drives or gearings; Equipment therefor relating to feed movement
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B49/00—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation
- B24B49/003—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation involving acoustic means
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B49/00—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation
- B24B49/16—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation taking regard of the load
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B49/00—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation
- B24B49/18—Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation taking regard of the presence of dressing tools
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B51/00—Arrangements for automatic control of a series of individual steps in grinding a workpiece
Abstract
[課題] 提供一種能夠抑制工件中的熱累積並且縮短空切時間之研磨裝置的控制裝置。 [解決手段] 研磨裝置,係對於工件反覆進行:使砂輪朝向工件的表面內的其中一方向也就是進給方向做相對性的移動之進給動作、和使砂輪朝向工件的表面之與進給方向交叉之換行方向做相對性的移動之換行動作,來對於工件進行研磨加工。研磨裝置的控制裝置,係執行接觸偵知控制,在該接觸偵知控制中,係反覆進行進給動作和使砂輪靠近工件之切入動作,而不進行換行動作,直至偵知到砂輪與工件接觸為止。此外,進行研磨控制,在該進行研磨控制中,係在偵知到砂輪與工件接觸之後,反覆進行進給動作和換行動作來進行研磨加工。[Problem] To provide a control device of a polishing apparatus capable of suppressing heat accumulation in a workpiece and shortening the air cutting time. [Solution] The grinding device repeatedly performs for the workpiece: the feeding action of relatively moving the grinding wheel toward one of the directions in the surface of the workpiece, that is, the feeding direction, and the feeding of the grinding wheel toward the surface of the workpiece. The line feed direction of the direction crossing is a relatively moving line feed action to grind the workpiece. The control device of the grinding device executes the contact detection control. In the contact detection control, the feeding action and the cutting action of bringing the grinding wheel close to the workpiece are repeatedly performed, and the line feed action is not performed until the contact between the grinding wheel and the workpiece is detected. until. In addition, grinding control is performed in which grinding is performed by repeatedly performing a feeding operation and a line feed operation after detecting that the grinding wheel is in contact with the workpiece.
Description
本發明係有關一種研磨裝置的控制裝置、由研磨裝置的控制裝置執行之程式及研磨方法。 本申請案係主張基於2019年3月22日申請之日本專利申請第2019-054515號的優先權。該日本申請案的全部內容係藉由參閱而援用於本說明書中。The present invention relates to a control device of a polishing device, a program executed by the control device of the polishing device, and a polishing method. This application claims priority based on Japanese Patent Application No. 2019-054515 filed on March 22, 2019. The entire contents of the Japanese application are incorporated in this specification by reference.
作為一邊使砂輪旋轉一邊對寬度寬於砂輪寬度之工件進行研磨加工之方法,已知一種是間歇橫進研磨方法和一種是移位直進研磨方法。在間歇橫進研磨方法中,係反覆進行:使工件相對於砂輪朝向與寬度方向正交之方向移動之動作(進給動作)、和使砂輪相對於工件朝向寬度方向橫移砂輪寬度以下的長度之動作(換行動作)。在對整個面進行了研磨之後,進行使砂輪靠近工件之動作(切入動作),並進行第2層的研磨加工(專利文獻1)。在移位直進研磨方法中,係反覆進行進給動作和切入動作,直到進行研磨至目標深度為止。之後,才進行換行動作,並在尚未加工的區域反覆進行進給動作和切入動作(專利文獻2)。As a method of grinding a workpiece having a width wider than the width of the grinding wheel while rotating the grinding wheel, an intermittent traverse grinding method and a displacement straight grinding method are known. In the intermittent traverse grinding method, the operation of moving the workpiece relative to the grinding wheel in a direction perpendicular to the width direction (feeding operation), and the traverse movement of the grinding wheel relative to the workpiece in the width direction by a length equal to or less than the width of the grinding wheel are repeated. action (line break action). After grinding the entire surface, an operation (cutting operation) of bringing the grinding wheel close to the workpiece is performed, and the grinding process of the second layer is performed (Patent Document 1). In the displacement straight grinding method, the feeding operation and the cutting operation are repeatedly performed until the grinding is performed to the target depth. After that, the line feed operation is performed, and the feeding operation and the cutting operation are repeatedly performed in the unprocessed area (Patent Document 2).
在任一種研磨方法中,皆需要從砂輪尚未與工件接觸之狀態進行切入動作至接觸之狀態。將在砂輪尚未與工件接觸之狀態下,所進行的進給動作和換行動作之動作稱為空切(AIR CUT,亦即,沒有任何研磨作用的動作)。 [先前技術文獻]In any grinding method, it is necessary to perform the cutting action from the state where the grinding wheel has not yet contacted the workpiece to the state where it is in contact. When the grinding wheel is not in contact with the workpiece, the action of the feed action and the line feed action is called an air cut (AIR CUT, that is, an action without any grinding action). [Prior Art Literature]
[專利文獻1] 日本特開平5-131363號公報 [專利文獻2] 日本特開2002-307305號公報[Patent Document 1] Japanese Patent Application Laid-Open No. 5-131363 [Patent Document 2] Japanese Patent Laid-Open No. 2002-307305
[發明所欲解決之問題][Problems to be Solved by Invention]
在間歇橫進研磨方法中,在空切期間中,每次對工件的整個面進行進給動作和換行動作時,都要執行切入動作。因此,空切時間將會變長。在移位直進研磨方法中,係在空切期間中,反覆進行進給動作和切入動作,因此空切時間短於間歇橫進研磨方法的空切時間。惟,在移位直進研磨方法中,係連續地對於在1次進給動作中所研磨之區域進行研磨,所以因研磨而產生之熱很容易累積在工件上。其結果,工件有時會因熱而變形。In the intermittent traverse grinding method, during the air cutting period, the cutting operation is performed every time the feeding operation and the line changing operation are performed on the entire surface of the workpiece. Therefore, the air cut time will be longer. In the displacement straight grinding method, the feeding operation and the cutting operation are repeatedly performed during the air cutting period, so the air cutting time is shorter than the air cutting time of the intermittent traverse grinding method. However, in the displacement straight grinding method, the area to be ground in one feeding operation is continuously ground, so the heat generated by grinding is easily accumulated on the workpiece. As a result, the workpiece may be deformed by heat.
本發明的目的,係在於提供一種能夠抑制工件中的熱累積,並且可縮短空切時間之研磨裝置的控制裝置。本發明的另一目的,係在於提供一種由該控制裝置所執行之程式。本發明的又一目的,係在於提供一種能夠抑制工件中的熱累積,並且可縮短空切時間之研磨方法。 [解決問題之技術手段]An object of the present invention is to provide a control device of a grinding device capable of suppressing heat accumulation in a workpiece and shortening the air cutting time. Another object of the present invention is to provide a program executed by the control device. Another object of the present invention is to provide a grinding method capable of suppressing heat accumulation in the workpiece and shortening the air cutting time. [Technical means to solve problems]
依據本發明的其中一種觀點, 係提供一種研磨裝置的控制裝置,係對於研磨裝置進行接觸偵知控制和研磨控制, 該研磨裝置,係對於工件反覆進行:使砂輪朝向前述工件的表面內的其中一方向也就是進給方向做相對性的移動之進給動作、和使前述砂輪朝向前述工件的表面之與前述進給方向交叉之換行方向做相對性的移動之換行動作,來對於前述工件進行研磨加工, 在該接觸偵知控制中,係反覆進行前述進給動作和使前述砂輪靠近前述工件之切入動作,而不進行前述換行動作,直至偵知到前述砂輪與前述工件接觸為止, 在該研磨控制中,係在偵知到前述砂輪與前述工件接觸之後,反覆進行前述進給動作和前述換行動作來進行研磨加工。According to one aspect of the present invention, A control device for a grinding device is provided, which is used for contact detection control and grinding control for the grinding device, The grinding device repeatedly performs for the workpiece: a feeding action of relatively moving the grinding wheel toward one of the directions in the surface of the workpiece, that is, the feeding direction, and the combination of moving the grinding wheel toward the surface of the workpiece and the feeding direction. Make a relative movement of the line feed direction of the cross direction to carry out the grinding process on the aforementioned workpiece, In this contact detection control, the feeding operation and the cutting operation of bringing the grinding wheel close to the workpiece are repeatedly performed, and the line feed operation is not performed until it is detected that the grinding wheel is in contact with the workpiece. In this grinding control, after it is detected that the grinding wheel is in contact with the workpiece, the above-mentioned feed operation and the above-mentioned line feed operation are repeatedly performed to carry out the grinding process.
依據本發明的另一種觀點,係提供一種由上述研磨裝置的控制裝置所執行之程式。According to another aspect of the present invention, there is provided a program executed by the control device of the above-mentioned polishing apparatus.
依據本發明的又一種觀點, 係提供一種研磨方法,其係對於工件反覆進行:使砂輪朝向前述工件的表面內的其中一方向也就是進給方向做相對性移動之進給動作、和使前述砂輪朝向前述工件的表面之與前述進給方向交叉之換行方向做相對性的移動之換行動作,來對於前述工件進行研磨加工,且 反覆進行前述進給動作和使前述砂輪靠近前述工件之切入動作,而不進行前述換行動作,直至偵知到前述砂輪與前述工件接觸為止, 在偵知到前述砂輪與前述工件接觸之後,反覆進行前述進給動作和前述換行動作來進行研磨加工。 [發明之效果]According to another aspect of the present invention, The system provides a grinding method, which is performed repeatedly for the workpiece: the feeding action of making the grinding wheel move relatively in one of the directions in the surface of the workpiece, that is, the feeding direction, and the sum of the grinding wheel facing the surface of the workpiece. The line feed direction intersecting the feed direction performs a line feed action of relative movement to grind the workpiece, and The aforementioned feeding action and the cutting action of bringing the aforementioned grinding wheel close to the aforementioned workpiece are repeatedly performed, without performing the aforementioned switching action, until it is detected that the aforementioned grinding wheel is in contact with the aforementioned workpiece, After detecting that the grinding wheel is in contact with the workpiece, the above-mentioned feed operation and the above-mentioned line feed operation are repeatedly performed to perform grinding. [Effect of invention]
在接觸偵知控制中,並不進行換行動作,因此能夠縮短偵知到接觸為止的時間(空切時間)。在研磨控制中,係反覆進行換行動作和進給動作,因此能夠抑制因研磨而產生之熱累積在一個部位。In the contact detection control, the line feed operation is not performed, so the time until the contact is detected (air cut time) can be shortened. In the grinding control, the line feed operation and the feeding operation are repeated, so that the heat generated by grinding can be prevented from accumulating in one location.
參閱圖1~圖3對基於實施例之研磨裝置的控制裝置進行說明。
圖1係基於實施例之研磨裝置的控制裝置及由該控制裝置控制之研磨裝置的概略圖。載台11及立柱15係以能夠朝向彼此正交之方向滑動之方式支撐於機床10上。對以水平面為xy面、以鉛垂方向為z軸方向之xyz正交座標系統進行定義。1-3, the control apparatus of the grinding|polishing apparatus based on an Example is demonstrated.
FIG. 1 is a schematic diagram of a control device of a polishing apparatus according to an embodiment and a polishing apparatus controlled by the control device. The
驅動裝置41,係使載台11相對於機床10朝向x軸方向平移。驅動裝置41例如係使用電動馬達、油壓缸等。驅動裝置42,係使立柱15相對於機床10朝向y軸方向平移。驅動裝置42例如係使用電動馬達。The
載台11上安裝有卡盤12。研磨對象的工件50係固定於卡盤12。A
立柱15,係經由主軸頭16將砂輪17支撐於載台11的上方。搭載於主軸頭16之驅動裝置43,係使砂輪17以與y軸平行之旋轉軸為中心進行旋轉。驅動裝置43例如係使用電動馬達。搭載於立柱15之驅動裝置44,係使主軸頭16相對於立柱15朝向z軸方向升降。The
進行砂輪17的修整之修整裝置18,例如係設置於載台11上。再者,如在圖1中的虛線所示,亦可以將修整裝置18設置於砂輪17的正上方。藉由移動立柱15並使主軸頭16升降,能夠使砂輪17移動至修整裝置18的加工位置。能夠將砂輪17移動至修整裝置18的加工位置而進行砂輪17的修整。The
控制電路35,36,37,38,係分別依據來自控制裝置30的指令來控制驅動裝置41,42,43,44。控制裝置30,例如係由包括中央處理單元(CPU)31、記憶裝置32等之電腦所構成。記憶裝置32中儲存有用以控制研磨裝置的動作之程式。藉由CPU31執行該程式,可利用研磨裝置來進行工件50的研磨。The
接著,參閱圖2對基於實施例之控制裝置30所執行之控制進行說明。
圖2係基於實施例之控制裝置30所執行之研磨裝置的控制的流程圖。首先,控制裝置30,係藉由進行砂輪17的高度調整、砂輪17的旋轉及工件50的移動的控制,來進行第1層的研磨(步驟S01)。參閱圖3對步驟S01的動作進行詳細說明。Next, referring to FIG. 2 , the control performed by the
圖3係工件50及砂輪17的立體圖。工件50在俯視下具有矩形(正方形或長方形)形狀。首先,使砂輪17升降來將砂輪17的高度調整至不會發生過度的切入之程度。通常,為了確保充分的安全性,係將砂輪17的高度調整為砂輪17的下端位於比工件50的上表面稍微上方的位置。FIG. 3 is a perspective view of the
在工件50的寬度方向(y軸方向)上進行工件50和砂輪17的位置對準。例如,在y軸方向上,使砂輪17移動至工件50的寬度方向上的緣部落入砂輪17的寬度內且砂輪17的寬度方向上的幾乎整個區域都與工件50重疊之位置。在使砂輪17旋轉之狀態下,使工件50朝向x軸方向(進給方向)平移。將使工件50朝向進給方向移動之動作稱為進給動作。在工件50的x軸方向(長度方向)上,若工件50移動至砂輪17脫離工件50之位置(在圖3中之虛線所示之位置)的話,就使砂輪17朝向y軸方向(換行方向)移動。將使砂輪17朝向換行方向移動之動作稱為換行動作。將換行動作中的朝向換行方向上的移動距離(換行寬度)與砂輪17的寬度設定成大致相等。The positional alignment of the
接著,在進行換行動作之後,使工件50朝向與第1次進給動作中的工件50的移動方向相反之方向平移。之後,使砂輪17朝向與第1次換行動作中的砂輪17的移動方向相同之方向移動相同之距離。藉由反覆進行進給動作和換行動作,能夠用砂輪17掃描工件50的整個面。將砂輪17在不與工件50接觸之狀態下進行之掃描稱為空切。研磨係從砂輪17與工件50接觸之時點開始。在研磨開始之後,反覆進行換行動作和進給動作,直至工件50的整個區域的掃描結束為止。藉此,第1層研磨結束。Next, after the line feed operation is performed, the
接著,如圖2所示,判定是否進行砂輪17的修整(步驟S02)。例如,每進行一預定面積的研磨時就進行修整。在控制裝置30判定為要進行修整之情況下,就執行進行砂輪17的修整之控制(步驟S03)。修整結束之後,就使砂輪17升降至稍微高於最接近的研磨表面的目標高度之位置(步驟S04)。Next, as shown in FIG. 2, it is judged whether the dressing of the
因為砂輪17的磨損和由施加於砂輪17之向上的力所引起之砂輪17的機械性的損失量等的因素,實際上藉由研磨而得之工件50的表面高度並不一定是與目標表面高度(目標高度)一致。在步驟S04中,考慮到工件50的表面的目標高度與研磨後的實際高度之間的誤差,例如係將砂輪17的高度設定於:比工件50的最終研磨表面的目標高度更高出1層量的目標切入深度(研磨加工量的深度)的1倍~2倍左右之位置。Due to factors such as wear of the
之後,控制裝置30,係一邊使砂輪17旋轉,一邊進行1次進給動作(步驟S05)。在進行該進給動作期間中,係判定砂輪17是否已經與工件50接觸(步驟S06)。例如能夠藉由檢測驅動裝置43的負荷,來判定砂輪17是否已經與工件50接觸。在砂輪17尚未與工件50接觸之狀態下,砂輪17是在進行空轉,因此驅動裝置43的負荷僅為旋轉軸的摩擦等而已,負荷極小。若砂輪17與工件50接觸,則驅動裝置43的負荷將會急劇增加。驅動裝置43的負荷的大小將會反映於流經驅動裝置43的電動馬達之驅動電流的大小,因此能夠根據驅動電流的變動來判定砂輪17是否已經與工件50接觸。再者,除此之外,還可以藉由用音響感測器來檢測由接觸所產生之聲音(聲發射)來判定砂輪17是否已經與工件50接觸。After that, the
在砂輪17尚未與工件50接觸之情況下,執行砂輪17的切入動作(步驟S07)。具體而言,係使砂輪17下降相當於1次切入量之高度量。在進行切入動作之後,執行步驟S05的進給動作。亦即,對工件50的寬度方向(y軸方向)上的相同位置進行進給動作,而不進行換行動作。以此方式,控制裝置30並不進行換行動作,而是進行偵知砂輪17與工件50之間是否已經接觸之接觸偵知控制(步驟S05~步驟S07)。When the
在步驟S06中檢測出砂輪17與工件50已經接觸之情況下,就對工件50的整個面執行:反覆進行進給動作和換行動作之研磨控制(步驟S08)。具體而言,每進行1次進給動作時,就進行1次換行動作。此時,換行動作時的換行寬度係幾乎等於砂輪17的寬度。在步驟S02中判定為不執行修整之情況下,就執行砂輪17的1層量的切入動作(步驟S09),之後,執行步驟S08。When it is detected in step S06 that the grinding
在步驟S08中進行工件50的1層量的研磨之後,判定是否已經研磨至目標深度(步驟S10)。在尚未研磨至目標深度之情況下,在步驟S02中判定是否要執行修整。之後,再次執行步驟S03至步驟S10的程序。如果已經研磨至目標深度之情況下,就結束工件50的研磨加工。After polishing one layer of the
接著,參閱圖4A及圖4B來說明與習知的間歇橫進研磨方式相比較之上述實施例的優異效果。Next, referring to FIG. 4A and FIG. 4B , the superior effect of the above-mentioned embodiment compared with the conventional intermittent traverse grinding method will be described.
圖4A係表示上述實施例的步驟S04至步驟S08(圖2)的動作期間中的相對於工件50之砂輪17的移動軌跡之示意圖。在圖4A中,顯示出了在進行3層量的切入動作(步驟S07)之後砂輪17與工件50接觸之例子。又,顯示出了為了研磨工件50的整個面而進行了3次換行動作和4次進給動作之例子。FIG. 4A is a schematic diagram showing the movement locus of the
圖4A的x軸方向上的軌跡21,係表示步驟S05中的進給動作。從軌跡21的終點起迄正下方的軌跡21的始點為止之在z軸方向上的軌跡22,係表示步驟S07的切入動作。從上側開始第1~3道軌跡21,係相當於空切期間中的軌跡。最靠下側的軌跡21,係相當於砂輪17與工件50接觸時的進給動作(步驟S05)。反覆進行換行動作和進給動作之軌跡23,係表示步驟S08的研磨的動作。The
如圖4A所示,係反覆進行進給動作和切入動作,而不進行換行動作,直至砂輪17與工件50接觸為止,因此在圖4A所示之例子中,在空切期間中係進行了3次進給動作。As shown in FIG. 4A, the feeding operation and the cutting operation are repeatedly performed, and the line feed operation is not performed until the grinding
圖4B係表示習知的間歇橫進研磨方式中的相對於工件50之砂輪17的移動軌跡之示意圖。以往,在直至砂輪17與工件50接觸為止的3層量的空切期間中亦進行了換行動作。在剛進行了3層量的切入動作之隨後的進給動作中,砂輪17才與工件50接觸。因此,在空切期間中,係執行12次進給動作。FIG. 4B is a schematic diagram showing the movement track of the
藉由比較圖4A和圖4B可知,與習知的間歇橫進研磨相比,在使用基於實施例之控制裝置30(圖1)來進行研磨之情況下,在空切期間中的進給動作的次數比較少。其結果,能夠縮短空切時間。Comparing FIGS. 4A and 4B , it can be seen that, in the case where the control device 30 ( FIG. 1 ) according to the embodiment is used for grinding, the feed operation during the air cutting period is compared with the conventional intermittent traverse grinding. less frequently. As a result, the idle cut time can be shortened.
接著,說明在進行砂輪17的修整(圖2的步驟S03)之後,且在進行研磨控制(圖2的步驟S08)之前,進行空切直至砂輪17與工件50接觸為止的效果。Next, the effect of performing air cutting until the grinding
若繼續用砂輪17進行研磨的話,則砂輪17的磨損將會增加,實際上被研磨的深度將會淺於目標研磨深度。此外,從工件50施加於砂輪17之朝上的力將會因為砂輪17的砂粒崩落或砂眼堵塞而增加。其結果,向上的砂輪17的機械性的損失量將會增加。因為砂輪17的機械性的損失量的原因,實際上被研磨的深度亦會淺於目標研磨深度。If grinding with the grinding
是以,即將進行砂輪17的修整之前所研磨後之工件50的表面的實際高度會高於目標高度。目標高度雖然能夠由砂輪17的切入量求出,但難以求出實際高度。為了吸收目標高度與實際高度之差值,在進行了砂輪17的修整之後,係將砂輪17的下端設定在比目標高度更高出一定的損失量來進行空切。在本實施例中,能夠縮短不得不在進行砂輪17的修整之後執行之空切的時間。Therefore, the actual height of the surface of the
接著,參閱圖5A~圖5E來說明與習知的移位直進研磨方式相比較之上述實施例的優異效果。Next, referring to FIGS. 5A to 5E , the excellent effects of the above-mentioned embodiment compared with the conventional shifting and straight-forward polishing method will be described.
圖5A~圖5E係表示藉由習知的移位直進研磨方式,用砂輪17研磨工件50時的研磨途中階段的工件50與砂輪17之間的位置關係之剖視圖。圖5A中顯示出第1次進給動作的第1層研磨時的工件50與砂輪17之間的位置關係。用D1表示了從工件50的表面起算的切入深度。在砂輪17的換行方向(y軸方向)上,砂輪17的大部分都落在工件50上,且只有端部的極少一部分未落在工件50上。砂輪17的端部的極少一部分未落在工件50上係考慮到工件50和砂輪17的位置對準邊緣之故。5A to 5E are cross-sectional views showing the positional relationship between the workpiece 50 and the
圖5B中顯示出針對與圖5A相同之區域之進給動作中研磨最下層時的工件50與砂輪17之間的位置關係。在最近一次進給動作中出現之從表面起算的切入深度D1與圖5A的進給動作中的切入深度D1相等。藉由針對相同之區域之複數次進給動作,在工件50的被研磨之區域和未被研磨之區域的邊界形成了段差51。砂輪17的表面中與工件50接觸之區域因研磨而磨損。因此,砂輪17的表面中,在與工件50接觸之區域和未落在工件50上的區域的邊界亦形成了段差19。FIG. 5B shows the positional relationship between the workpiece 50 and the
圖5C中顯示出進行1次換行動作之後的第1層研磨時的工件50與砂輪17之間的位置關係。切入深度D1與圖5A的進給動作中的切入深度D1相等。換行寬度與砂輪17的寬度(y軸方向上的尺寸)幾乎相等。因此,形成於工件50之段差51與形成於砂輪17之段差19的y軸方向上的位置一致。以段差19為界之較高之面(距砂輪17的中心的距離較遠之面)不與工件50接觸。因此,因研磨而形成於砂輪17之段差19逐漸變高。FIG. 5C shows the positional relationship between the workpiece 50 and the
圖5D中顯示出針對與圖5C相同之區域之進給動作中研磨最下層時的工件50與砂輪17之間的位置關係。在最近一次進給動作中出現之從表面起算的切入深度D1與圖5B的進給動作中的切入深度D1相等。此時,以形成於砂輪17之段差19為界之較高之面與工件50的表面接觸,因此接觸區域會被研磨。FIG. 5D shows the positional relationship between the workpiece 50 and the
圖5E中顯示出了圖5D所示之進給動作後的工件50的表面形狀。在圖5A至圖5B的複數次進給動作中出現之表面52A與在圖5C至圖5D的複數次進給動作中出現之表面52B成為大致相同之高度。惟,會在被以形成於砂輪17之段差19為界之較高之面研磨後之位置出現了溝槽53。需要再藉由精研磨去除該溝槽53,因此精研磨所需之時間將會增加。FIG. 5E shows the surface shape of the
與之相比,在本實施例中,每進行1次進給動作時就進行換行動作。即使在第1次進給動作中在砂輪17中形成了段差19,其高度亦會低於以移位直進研磨方式的複數次進給動作所形成之段差19。又,係以在1次進給動作中所形成之段差19為界之較高之面在換行動作後的進給動作時與工件50的表面接觸。因此,段差19不會累積變高。因此,在本實施例中,能夠抑制圖5E所示之溝槽53的產生。In contrast, in the present embodiment, the line feed operation is performed every time the feed operation is performed. Even if the
又,在習知的移位直進研磨方式中,係針對工件50的相同之區域反覆進行進給動作和切入動作,所以因研磨而產生之熱累積,很容易使工件50變成高溫。相對於此,在本實施例中,在砂輪17與工件50接觸之前,係針對相同之區域反覆進行進給動作和切入動作,而不進行換行動作,但在砂輪17與工件50接觸之後,就反覆進行換行動作和進給動作。因此,能夠抑制熱累積在工件50的特定區域而可抑制工件50的過度之溫度上升。In addition, in the conventional displacement straight grinding method, the feeding operation and the cutting operation are repeatedly performed for the same area of the
接著,說明在第1層研磨(圖2的步驟S01)中未採用在空切期間中不進行換行動作之方法之效果。Next, the effect of not using the method of not performing the line feed operation during the air cutting period in the first layer polishing (step S01 in FIG. 2 ) will be described.
工件50有時會因前製程的影響而變形,導致表面的平坦度變差。要找出工件50的表面的最高之部位並非容易。若在圖3的y軸方向(寬度方向)上僅在1個部位反覆進行進給動作和切入動作來使砂輪17下降至砂輪17與工件50接觸的話,則有時切入深度會在高於檢測出接觸之部位之表面上變得過大。在本實施例中,係在第1層研磨之前對工件50的整個區域執行空切,因此能夠抑制切入深度在表面高度最高之區域變得過大的問題。The
接著,對上述實施例的變形例進行說明。
在上述實施例中,在進行第1層研磨(圖2的步驟S01)時,係對於工件50的整個區域進行了空切。如上所述,這是因為工件50的表面高度存在著不一致且不知道哪一個部分係最高之緣故。在進行研磨之前的工件50的表面大致呈平坦之情況下,亦可以在進行第1層研磨時,進行步驟S05~步驟S07的不進行換行動作之空切(接觸偵知控制)。Next, a modification of the above-described embodiment will be described.
In the above-described embodiment, when the first layer polishing (step S01 in FIG. 2 ) is performed, the entire area of the
又,在上述實施例中,雖然是在步驟S08中對於工件50的整個區域進行1層量研磨之後,在步驟S02中判定了是否要進行砂輪17的修整,但亦可以在研磨到達工件50的表面中途的時點來判定是否要進行砂輪17的修整。此時,只要在進行了砂輪17的修整之後,再從中斷研磨之部位開始步驟S04的程序即可。In addition, in the above-described embodiment, after the entire area of the
又,在上述實施例中,雖然是將步驟S08的研磨時的換行動作的換行寬度設定成與砂輪17的寬度大致相等,但亦可以設定成小於砂輪17的寬度。例如,亦可以將換行寬度設為砂輪17的寬度的約50%。In addition, in the above-mentioned embodiment, although the line feed width of the line feed operation during grinding in step S08 is set substantially equal to the width of the
又,基於上述實施例之控制裝置30,雖然是進行了研磨平板之研磨裝置的控制,但亦能夠進行研磨圓柱狀的工件的側面之研磨裝置的控制。此時,進給動作,係與使工件繞中心軸的周圍旋轉之動作對應,進給方向,係與工件的側面的周向對應。換行方向,係與工件的中心軸的方向對應。In addition, according to the
又,在上述實施例中,雖然是每進行1次進給動作時,就進行換行動作,但亦可以根據工件50的材料或切入條件,在較淺地設定針對工件50的切入深度之情況下,每進行複數次(2次或3次)的進給動作時才進行換行動作。若採用該方法,則能夠根據工件50的材質等,來高精度地進行加工。In addition, in the above-mentioned embodiment, although the line feed operation is performed every time the feed operation is performed, it is also possible to set the depth of cutting into the
接著,參閱圖6對上述實施例的又一變形例進行說明。
圖6係作為搭載有基於本變形例之控制裝置之研磨裝置的研磨對象之工件50的平面圖。在本變形例中,係將工件50的表面劃分為複數個區域55。控制裝置30,係按區域55來執行圖2所示之流程圖的程序。Next, another modification of the above-mentioned embodiment will be described with reference to FIG. 6 .
FIG. 6 is a plan view of a
在工件50之在換行方向上的尺寸較大之情況下,即使在步驟S01中針對工件50的整個區域進行了空切,有時亦會因為受到砂輪17的耐久性方面的限制,而無法一次就研磨完畢整個區域。此時,對無法研磨之區域進行之空切將會變得不必要。藉由將工件50的表面劃分為複數個區域55,能夠消除不必要之空切。When the size of the
上述實施例及變形例都只是示例而已,當然能夠局部替換或組合實施例及變形例中所揭示之構成內容。不必針對每個實施例及變形例逐一提及實施例及變形例的基於相同之構成內容之相同之作用效果。此外,本發明並不限制於上述實施例及變形例。例如,相關技術人員理應能夠進行各種變更、改良、組合等。The above-mentioned embodiments and modified examples are merely examples, and it is of course possible to partially replace or combine the constituent contents disclosed in the embodiments and modified examples. It is not necessary to mention the same functions and effects based on the same constituent content of the embodiment and the modification one by one for each embodiment and modification. In addition, the present invention is not limited to the above-described embodiments and modifications. For example, a person skilled in the art should be able to perform various changes, improvements, combinations, and the like.
10:機床
11:載台
12:卡盤
15:立柱
16:主軸頭
17:砂輪
18:修整裝置
19:段差
21,22,23,25:軌跡
30:控制裝置
31:中央處理單元(CPU)
32:記憶裝置
35,36,37,38:控制電路
41,42,43,44:驅動裝置
50:工件
51:段差
52A,52B:藉由研磨而出現之表面
53:溝槽
55:劃分工件的表面而得之區域10: Machine tools
11: Carrier
12: Chuck
15: Column
16: Spindle head
17: Grinding wheel
18: Dressing device
19:
[圖1]係基於實施例之研磨裝置的控制裝置及由該控制裝置所控制之研磨裝置的概略圖。 [圖2]係基於實施例之控制裝置所執行之研磨裝置的控制的流程圖。 [圖3]係工件及砂輪的立體圖。 [圖4A]係表示實施例的步驟S04至步驟S08(圖2)的動作期間中的相對於工件之砂輪的移動軌跡之示意圖, [圖4B]係表示習知的間歇橫進研磨方式中的相對於工件之砂輪的移動軌跡之示意圖。 [圖5A~圖5E]係表示藉由習知的移位直進研磨方式用砂輪研磨工件時的研磨途中階段的工件與砂輪之間的位置關係之剖視圖。 [圖6]係作為搭載有基於實施例的變形例之控制裝置之研磨裝置的研磨對象之工件的平面圖。Fig. 1 is a schematic diagram of a control device of a polishing apparatus according to an embodiment and a polishing apparatus controlled by the control apparatus. FIG. 2 is a flowchart of the control of the polishing apparatus performed by the control apparatus of the embodiment. [FIG. 3] It is a perspective view of a workpiece and a grinding wheel. Fig. 4A is a schematic diagram showing the movement locus of the grinding wheel relative to the workpiece during the operation period from step S04 to step S08 ( Fig. 2 ) of the embodiment, FIG. 4B is a schematic diagram showing the movement trajectory of the grinding wheel with respect to the workpiece in the conventional intermittent traverse grinding method. 5A to 5E are cross-sectional views showing the positional relationship between the workpiece and the grinding wheel in the middle stage of grinding when the workpiece is ground with the grinding wheel by the conventional displacement straight grinding method. 6 is a plan view of a workpiece to be polished as a polishing device mounted with a control device according to a modification of the embodiment.
Claims (5)
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JP2019054515A JP7098257B2 (en) | 2019-03-22 | 2019-03-22 | Grinding device controls, programs, and grinding methods |
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JP7291056B2 (en) | 2019-09-30 | 2023-06-14 | 株式会社ディスコ | Wafer polishing method |
WO2022075251A1 (en) * | 2020-10-06 | 2022-04-14 | ユアサ化成株式会社 | Polishing system |
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JP2002086354A (en) * | 2000-09-12 | 2002-03-26 | Hitachi Via Mechanics Ltd | Plane grinder |
TW201436949A (en) * | 2013-01-30 | 2014-10-01 | Komatsu Ntc Ltd | Grinding processing method |
JP2018051665A (en) * | 2016-09-27 | 2018-04-05 | 株式会社塩 | Numerical control grinding device, and control device, control method, and control program respectively therefor |
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JPS5347954B2 (en) * | 1973-03-23 | 1978-12-25 | ||
JPS62114875A (en) * | 1985-11-14 | 1987-05-26 | Mitsubishi Heavy Ind Ltd | Method of reducing feeding time on horizontal shaft type automatic surface grinder |
JPH03196950A (en) * | 1989-12-27 | 1991-08-28 | Toshiba Corp | Grinding method |
JP3210704B2 (en) * | 1991-11-06 | 2001-09-17 | 日立ビアメカニクス株式会社 | Grinding machine and traverse grinding method |
JPH0994745A (en) * | 1995-09-29 | 1997-04-08 | Hitachi Seiko Ltd | Plane traverse grinding method |
JP4764564B2 (en) | 2001-04-17 | 2011-09-07 | 株式会社岡本工作機械製作所 | Skip shift plunge grinding method for cylindrical work |
US8585467B2 (en) * | 2008-10-31 | 2013-11-19 | Corning Incorporated | Linear pressure feed grinding with voice coil |
CN102267053A (en) * | 2011-02-21 | 2011-12-07 | 天津市北闸口仪表机床厂 | Numerically controlled lathe capable of improving traveling direction of cutter |
JP2012222123A (en) * | 2011-04-08 | 2012-11-12 | Mitsubishi Electric Corp | Method for grinding semiconductor wafer |
JP5813058B2 (en) * | 2013-07-02 | 2015-11-17 | ファナック株式会社 | Numerical controller with a function for shortening the starting point path of a complex fixed cycle |
JP6887846B2 (en) * | 2017-03-28 | 2021-06-16 | 株式会社東京精密 | Grinding device |
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JP2002086354A (en) * | 2000-09-12 | 2002-03-26 | Hitachi Via Mechanics Ltd | Plane grinder |
TW201436949A (en) * | 2013-01-30 | 2014-10-01 | Komatsu Ntc Ltd | Grinding processing method |
JP2018051665A (en) * | 2016-09-27 | 2018-04-05 | 株式会社塩 | Numerical control grinding device, and control device, control method, and control program respectively therefor |
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