TWI760100B - Manufacturing method of substrate surface structure - Google Patents

Abstract

The present invention is a method for manufacturing the surface structure of a substrate, which includes combining one side of the substrate with a magnetic plate, and a metal mask is arranged on the other side of the substrate. The metal mask is provided with a plurality of openings. The magnetism of the magnetic plate can attract the metal mask. The substrate is pressed tightly between the magnetic plate and the metal mask to form a intermediate product, and then the intermediate product to be immersed in the etching solution. The etching solution erodes the position of the substrate relative to the opening, and then the product to be taken out of the etching solution. The magnetic plate and the metal mask are removed. The side of the substrate opposite to the metal mask forms multiple microstructures at positions opposite to the openings. The multiple microstructures of the substrate are used as composite functional layers with anti-reflection and anti-fouling.

Description

Manufacturing method of substrate surface structure

The present invention relates to an optical element, especially a microstructure with anti-reflection and anti-fouling provided on a substrate.

Glass has excellent optical properties, and has better resistance to physical and chemical erosion, and can be used to make high-quality optical components. When glass is applied to devices with display panels, such as mobile phones, notebook computers, etc., various interfaces will pass between the glass and the panel, and the light reflected from each interface will be coherent, and the light intensity will be higher than that of the display panel. Increase or decrease when a single interface is used. The glass itself does not have the ability of anti-reflection (enhancing penetration), therefore, in order to make the outer surface of the glass (here and hereinafter referred to as the outer surface, refers to the side of the glass facing away from the display panel) has the ability of anti-reflection , Many manufacturers make microstructures on the outer surface of the glass, which can not only maintain the excellent characteristics of the glass, but also make the surface reflect the effect.

The above-mentioned microstructure is usually called an anti-reflection layer (Anti-Reflection Layer, or anti-reflection layer), and its main function is to reduce the reflected light on the glass surface, thereby increasing the light transmission of these components, and reducing or eliminating various impurities. astigmatism. In other words, the anti-reflection layer disposed on the outer surface of the glass increases the light transmittance of the glass and reduces the reflectivity of the glass, so as to achieve the purpose of clearly seeing the display panel. The anti-reflection layer is generally arranged by using a vacuum coating process or a magnetron sputtering process to cross-stack high and low refractive index materials on the outer surface of the glass.

In addition, there are generally two types of anti-reflection layers: single-layer and multi-layer. It can be lowered further, and the penetration rate can be increased to more than 98%. If it is matched with higher-quality glass, it can almost achieve the effect of nearly 100% penetration.

However, after the glass surface is coated with a single or multi-layer anti-reflection layer, the glass surface is particularly prone to stains, and the stain will destroy the anti-reflection effect of the anti-reflection layer. The reason is that the reflective film layer is composed of a plurality of microstructures, and water, oil or other contaminants are particularly easy to enter into the pores between the microstructures, thereby reducing the effect of the anti-reflection layer.

The solution to this problem is to coat the anti-reflection layer with an oleophobic, hydrophobic anti-smudge layer (Anti-Smudge Layer), and the anti-smudge layer must be very thin so that the anti-smudge layer does not change the anti-reflection layer. optical properties. The material of the antifouling layer is mainly fluoride, and there are two processing methods, one is immersion method, the other is vacuum coating, and the most commonly used method is vacuum coating. When the anti-reflection layer is completed, a vacuum coating process can be used to coat the fluoride on the anti-reflection layer. The antifouling layer can cover the porous antireflection layer, and can reduce the contact area of water and oil with the lens, so that oil and water droplets are not easy to adhere to the surface of the antifouling layer.

Further, the antifouling layer is also composed of a plurality of microstructures, but the size of the microstructures of the antifouling layer is smaller than that of the antireflection layer, and even the size of the microstructures of the antifouling layer is as large as that of the surface of a lotus leaf. The super hydrophobicity property makes the contact angle between the water droplets falling on the antifouling layer and the contact angle thereof greater than 110 degrees, so that the water does not adhere to the antifouling layer and form small water droplets. In addition, the fine cilia make it difficult for dust and other impurities to adhere to rainwater, which is called self-cleaning. The aforementioned super hydrophobicity and self-cleaning properties are often called lotus effect. (Lotus effect).

As mentioned above, most of the manufacturers focus on the vacuum coating process. The vacuum coating process needs to go through processes such as yellow light, lithography, etching, etc. in order to achieve the purpose of setting multiple microstructures on the glass surface. A lot of chemicals (photoresist/developer) are used, and each piece of glass needs to use yellow light and development process repeatedly, so that the price of glass products with anti-reflection layer and anti-fouling layer made by the above method is not competitive and It causes environmental pollution, so it is necessary to improve this problem.

In view of the problems of the prior art, the purpose of the present invention is to provide microstructures with anti-reflection and anti-fouling properties on the substrate, but the manufacturing process of arranging the microstructures on the substrate does not require yellow light/development process, and does not need to use a large number of Chemical agents (photoresist/developer) can reduce production costs, reduce environmental pollution, and even shorten production time.

According to the purpose of the present invention, a method for manufacturing a surface structure of a substrate is provided. The metal shield is attracted by the magnetism of the magnetic plate, so that the substrate is tightly pressed between the magnetic plate and the metal shield to form a product to be prepared, and then the product to be immersed in the etching solution, so that the etching corrodes the relative opening of the substrate. position, take out the product from the etching solution, remove the magnetic plate and the metal mask, so that the side of the substrate opposite to the metal mask forms microstructures respectively at the positions opposite to the openings, and multiple microstructures on the surface of the substrate The body is used as a composite functional layer with anti-reflection and anti-fouling.

Wherein, the substrate is glass or plastic.

Wherein, each opening is distributed on the metal mask with a fixed hole distance and pore diameter, or each opening is distributed on the metal mask with a random hole distance and a fixed pore diameter within a predetermined hole distance range, so that each opening Randomly distributed over the metal mask.

Wherein, the maximum width of the center-to-center distance of any two microstructures is between 200 and 900 nanometers, the outer diameter of each microstructure is between 0.2 and 0.6 times the maximum width of the center-to-center distance of any two microstructures, and The depth of the microstructure is between 70 and 200 nanometers.

The etching solution is an acid-based inorganic solution, such as hydrofluoric acid, or the etching solution is an organic solvent, such as acetone and isopropanol.

To sum up, the present invention uses a magnetic plate and a metal mask to clamp the substrate, and only one etching process can be used to form a composite functional layer with anti-reflection and anti-fouling on the substrate. For the production of the anti-reflection layer and the anti-fouling layer, the usage of chemicals can be reduced, the production steps can be simplified, the production cost can be reduced, the environmental pollution can be reduced, and the production time can be shortened.

In order to make the objectives, technical solutions and advantages of the present invention clearer, the present invention will be further described in detail below with reference to the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are only used to explain the present invention, but not to limit the present invention.

Please refer to FIG. 1 , the present invention provides a method for manufacturing a surface structure of a substrate 1 , which includes the following steps: S101 : sandwiching the substrate 1 between the magnetic plate 2 and the metal shield 3 to form a to-be-made product 4 . The metal cover 3 is provided with a plurality of openings 30 (as shown in FIG. 2 ), and the metal cover 3 is attracted by the magnetism of the magnetic plate 2 so that the substrate 1 is tightly pressed against the magnetic plate 2 and the metal cover 3 (as shown in Figure 3); S102: Immerse the product 4 in the etching solution 5, so that the position of the substrate 1 relative to the opening 30 is eroded by etching; S103: Take out the product 4 from the etching solution 5, remove the magnetic plate 2 and the metal mask 3, so that the side of the substrate 1 opposite to the metal mask 3 forms microstructures 60 and microstructures respectively at positions opposite to the openings 30 60. A plurality of microstructures 60 on the surface of the substrate 1 constitute a composite functional layer 6 with anti-reflection and anti-fouling, wherein the microstructures 60 are pyramid-shaped, cone-shaped, trapezoidal tetrahedron or multi-stepped body, but this When the invention is actually implemented, it is not limited to this.

In the present invention, the metal mask 3 is further a fine metal mask, the metal mask 3 can be made of a ferromagnetic or ferrimagnetic metal plate, and further the metal mask 3 is made of nickel Iron alloy plate, for example: Invar alloy plate (Invar), wherein the metal plate is continuously eroded through the etching process to reduce the thickness of the metal plate for the positions where the openings 30 are to be made, and the openings 30 are formed on the metal plate, or The metal mask 3 is formed by an electroforming process, or the metal mask 3 is made by mixing resin and metal material.

Please refer to FIG. 3 , since the metal mask 3 can be made of a ferromagnetic or ferrimagnetic metal plate, when one side of the substrate 1 is combined with the magnetic plate 2 , the other side of the substrate 1 is provided with a metal mask 3 At this time, it is assumed that the side of the magnetic plate 2 opposite to the substrate 1 is the N pole of the magnetic plate 2, and the side of the metal shield 3 facing the substrate 1 will be induced and attracted by the magnetic field of the magnetic plate 2 and magnetized to the S pole. The cover 3 is surrounded by the magnetic plate 2 , further causing the substrate 1 to be sandwiched between the magnetic plate 2 and the metal cover 3 .

In the present invention, the substrate 1 is glass or plastic, and the etching solution 5 is an acid-based inorganic solution, such as hydrofluoric acid, or the etching solution 5 is an organic solvent, such as acetone and isopropanol. The acid-based inorganic solution is the etching solution 5 for glass, and the organic solvent is the etching solution 5 for plastic.

Referring to FIG. 4 , a silicon nitride layer 12 , an indium tin oxide layer 14 , a light-emitting layer 16 and an electrode layer 18 are sequentially disposed on the bottom surface of the substrate 1 without the microstructures 60 , wherein the refractive index of the substrate 1 is n= Between 1.4 and n=1.6, for example, the refractive index of glass is n=1.46, while the refractive index of plastic (eg, Polycarbonate, PC for short) is n=1.59, and the refractive index of the indium tin oxide layer 14 is about n=1.8, the refractive index of the light-emitting layer 16 is about n=1.75, the thickness of the substrate 1 is 2 mm (2 mm), the thickness of the silicon nitride layer 12 is 600 nanometers (600 nm), and the thickness of the indium tin oxide layer 14 is 200 nanometers (200 nm), the thickness of the light-emitting layer 16 is 100 nanometers (100 nm), and the refractive index of air is n=1. According to Snell's Law, n ₁ Sinθ ₁ = n ₂ Sinθ ₂ , where θ refers to the angle at which the light travels in the substrate 1 . When the critical angle is large, the light will not penetrate into another medium and cause total internal reflection. Taking the refractive index of glass n=1.46 and the refractive index of air n1 as an example, when the light passes through the silicon nitride layer 12 and the indium tin oxide layer 14 from the light-emitting layer 16 to the interior of the substrate 1 (such as glass), and the incident angle of the light is Greater than the critical angle of total reflection (43.2 degrees), the light will be totally reflected in the glass without entering another medium, resulting in poor transmittance of the light source.

Please refer to FIG. 5 , the substrate 1 produced by the manufacturing method of the present invention has a composite functional layer 6 formed by a plurality of microstructures 60 on one side, and the bottom surface of the substrate 1 is also provided with a silicon nitride layer 12 , The indium tin oxide layer 14 , the light-emitting layer 16 and the electrode layer 18 , and the thickness and refractive index of the silicon nitride layer 12 , the indium tin oxide layer 14 and the light-emitting layer 16 of the substrate 1 are the same as above. The silicon layer 12 and the indium tin oxide layer 14 reach the inside of the substrate 1 (such as glass). Due to the function of the composite functional layer 6, the light will not be totally reflected inside the substrate 1, so that the light source can pass through the substrate 1 and enter the outside. In other words, the penetration rate of the substrate 1 is improved. In addition, since the surface contact angle between the composite functional layer 6 and the water droplets is greater than 110 degrees, the substrate 1 has the characteristics of hydrophobicity and antifouling. Surface contact angle (Contact Angle) refers to the angle between the solid surface and the droplet tangent when the liquid droplet reaches the thermodynamic equilibrium on the solid surface. That is, the included angle between the substrate 1 and the water droplet is greater than 110 degrees. The related components of the touch module, such as the silicon nitride layer 12 , the indium tin oxide layer 14 , the light emitting layer 16 and the electrode layer 18 , are described here to illustrate the penetration of the light source. However, in the actual implementation of the present invention, touch The control module is limited, and any optical element that requires a substrate falls within the scope of the present invention.

In order to make the composite functional layer 6 have anti-reflection, increase transmittance, and have hydrophobicity, in the present invention, the maximum width of the center distance between any two microstructures 60 is between 200 and 900 nanometers. The outer diameter of the microstructures 60 is between 0.2 and 0.6 times the maximum width of the center-to-center distance of any two microstructures 60 , and the depth of the microstructures 60 is between 70 and 200 nanometers. In addition, if all the microstructures 60 are regularly arranged on the surface of the substrate 1, for example, arranged in a matrix, the light (image) passing through the composite functional layer 6 will be blurred. Therefore, the arrangement of the microstructures 60 for random arrangement.

Further, each opening 30 of the metal mask 3 is distributed on the metal mask 3 with a fixed hole distance W and a diameter ψ, but after the substrate 1 is eroded by the etching solution 5, the maximum width of any two microstructures 60, The outer diameter and depth are fixed, and there will be a problem of blurred images. Therefore, in the present invention, the openings 30 of the metal mask 3 are distributed on the metal mask 3 with a random hole distance W and a fixed aperture ψ within a predetermined hole distance range, so that the openings 30 are randomly distributed on the metal mask 3. Metal mask 3, or use image simulation software (such as LightTools) to arrange the microstructures 60 in an irregular manner to achieve the optical simulation result of image optimization under the aforementioned conditions, and then according to the optical simulation result The metal mask 3 arranged with the corresponding openings 30 is made, and the substrate 1 is further clamped by the metal mask 3 and the magnetic plate 2, so as to make a composite functional layer 6 on the substrate 1 that conforms to the optical simulation result, and any two The maximum width, outer diameter and depth of the microstructures 60 are within the aforementioned dimensional ranges.

Alternatively, using a spreadsheet software (eg, excel), the microstructures 60 are randomly arranged in random trial calculation conditions in the distribution positions of the openings 30 of the metal mask 3, and then the distribution positions are arranged in accordance with the aforementioned irregularities Openings 30 are provided on the metal shield 3 . Make the metal mask 3 and the magnetic plate 2 sandwich the substrate 1, and after the substrate 1 is eroded by the etching solution 5, the maximum width, outer diameter and depth of any two microstructures 60 of the composite functional layer 6 fabricated on the substrate 1 are as described above. within the size range.

According to the above, the present invention utilizes the magnetic plate 2 and the metal mask 3 to clamp the substrate 1, and can fabricate the composite functional layer 6 with anti-reflection and anti-fouling on the substrate 1 by only one etching process. The traditional substrate 1 needs to manufacture the anti-reflection layer and the anti-fouling layer separately, which reduces the usage of chemicals, simplifies the manufacturing steps, reduces the production cost, reduces the environmental pollution, and shortens the manufacturing time. In addition, in order to solve the problem of image blur caused by the regular arrangement of the microstructures 60, the distribution positions of the openings 30 on the metal mask 3 are designed in various ways, so that the openings 30 are randomly and irregularly arranged. Distributed on the metal mask 3, so that the metal mask 3 and the magnetic plate 2 sandwich the substrate 1, and after the substrate 1 is eroded by the etching solution 5, any two microstructures 60 of the composite functional layer 6 fabricated on the substrate 1 Maximum width, outer diameter and depth are within the aforementioned dimensional ranges.

The above detailed descriptions are specific descriptions of feasible embodiments of the present invention, but the foregoing embodiments are not intended to limit the patent scope of the present invention. Any equivalent implementation or modification that does not depart from the technical spirit of the present invention shall be included in the within the scope of the patent in this case.

1: Substrate 12: Silicon nitride layer 14: Indium tin oxide layer 16: Light-emitting layer 18: Electrode layer 2: Magnetic plate 3: Metal mask 30: Opening 4: Products to be prepared 5: Etching solution 6: Composite functional layer 60: Microstructures W: hole distance ψ: aperture S101~S103: Step flow

FIG. 1 is a schematic diagram of the manufacturing process of the present invention. FIG. 2 is a schematic diagram of the metal mask of the present invention. FIG. 3 is a schematic diagram of magnetic adsorption among the magnetic plate, the metal mask and the substrate of the present invention. FIG. 4 is a schematic diagram of the optical path of the substrate without microstructures. FIG. 5 is a schematic diagram of the optical path of the substrate with microstructures.

1: Substrate

2: Magnetic plate

3: Metal mask

4: Products to be prepared

5: Etching solution

6: Composite functional layer

60: Microstructures

S101~S103: Step flow

Claims (10)

A method for manufacturing a substrate surface structure, comprising the following steps: A substrate is sandwiched between a magnetic plate and a metal cover as a product to be prepared, wherein the metal cover is provided with a plurality of openings; Immerse the product to be prepared in an etching solution, so that the etching solution erodes the position of the substrate relative to the opening; Take out the product from the etching solution, remove the magnetic plate and the metal mask, a microstructure is formed at the positions of the substrate relative to the openings of the metal mask, and the plurality of microstructures are used as anti- Reflective and anti-fouling composite functional layer. The method for manufacturing a surface structure of a substrate according to claim 1, wherein the substrate is glass. The method for manufacturing a substrate surface structure as claimed in claim 1, wherein the substrate is plastic. The method for manufacturing a surface structure of a substrate as claimed in claim 1, wherein each of the openings is distributed on the metal mask with a fixed pitch and a pore size. The method for manufacturing a substrate surface structure as claimed in claim 1, wherein each of the openings is distributed on the metal mask with a random hole distance and a fixed hole diameter within a predetermined hole distance range. The method for manufacturing a substrate surface structure according to claim 1, wherein the maximum width of the center-to-center distance between any two of the microstructures is between 200 and 900 nanometers. The method for producing a substrate surface structure according to claim 2, wherein the etching solution is an acid-based inorganic solution. The method for manufacturing a substrate surface structure according to claim 3, wherein the etching solution is an organic solvent. The method for manufacturing a substrate surface structure according to claim 6, wherein the outer diameter of each of the microstructures is between 0.2 and 0.6 times the maximum width of the center-to-center distance of any two of the microstructures. The method for manufacturing a substrate surface structure according to claim 9, wherein the depth of each of the microstructures is between 70 and 200 nanometers.

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