TWI755517B - Manufacturing method of liquid crystal element - Google Patents

Manufacturing method of liquid crystal element Download PDF

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TWI755517B
TWI755517B TW107112578A TW107112578A TWI755517B TW I755517 B TWI755517 B TW I755517B TW 107112578 A TW107112578 A TW 107112578A TW 107112578 A TW107112578 A TW 107112578A TW I755517 B TWI755517 B TW I755517B
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liquid crystal
substrate
carbon atoms
compound
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TW201903498A (en
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登政博
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日商Jsr股份有限公司
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    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1337Surface-induced orientation of the liquid crystal molecules, e.g. by alignment layers

Abstract

提供一種可在一個基板與另一個基板之間充分產生預傾角的差異的液晶元件的製造方法。藉由以下方法來製造液晶元件,所述方法包括:於第1基板及第2基板的各基板上塗佈液晶配向劑的步驟;於塗佈液晶配向劑後對第1基板及第2基板進行加熱的步驟;以及於加熱之後,將第1基板與第2基板以塗佈有液晶配向劑的面相對的方式對向配置從而構築液晶單元的步驟,且液晶配向劑含有具有藉由加熱而脫離的熱脫離性基的化合物,於對基板進行加熱的步驟中,實施對第1基板及第2基板中的一個基板,以較另一個基板更高的溫度進行加熱的高溫加熱處理。 Provided is a method of manufacturing a liquid crystal element capable of sufficiently generating a difference in pretilt angle between one substrate and the other substrate. A liquid crystal element is manufactured by the following method, the method includes: coating a liquid crystal alignment agent on each of the first substrate and the second substrate; The step of heating; and after the heating, the first substrate and the second substrate are arranged opposite to each other with the surfaces coated with the liquid crystal alignment agent facing each other to construct a liquid crystal cell, and the liquid crystal alignment agent contains a liquid crystal alignment agent having a function of being released by heating In the step of heating the substrate, the compound of the thermally releasable group is subjected to a high-temperature heat treatment in which one of the first substrate and the second substrate is heated at a higher temperature than the other substrate.

Description

液晶元件的製造方法 Manufacturing method of liquid crystal element

本發明是有關於一種液晶元件的製造方法以及液晶配向劑。 The present invention relates to a method for manufacturing a liquid crystal element and a liquid crystal alignment agent.

作為液晶元件,除以扭轉向列(Twisted Nematic,TN)型、超扭轉向列(Super Twisted Nematic,STN)型等為代表的、使用具有正介電各向異性的向列液晶的水平配向模式的液晶元件以外,亦已知有使用具有負介電各向異性的向列液晶的垂直(homeotropic)配向模式的垂直配向(Vertical Alignment)型液晶元件等各種液晶元件。該些液晶元件具備具有使液晶分子沿一定方向進行配向的功能的液晶配向膜。作為構成該液晶配向膜的材料,已知有:聚醯胺酸、聚醯亞胺、聚醯胺酸酯、聚醯胺、聚酯、聚有機矽氧烷等(參照專利文獻1~專利文獻3)。 As a liquid crystal element, a horizontal alignment mode using a nematic liquid crystal having positive dielectric anisotropy, typified by a twisted nematic (TN) type, a super twisted nematic (STN) type, and the like Various liquid crystal elements, such as a vertical alignment type liquid crystal element using a homeotropic alignment mode of nematic liquid crystal having negative dielectric anisotropy, are also known. These liquid crystal elements include a liquid crystal alignment film having a function of aligning liquid crystal molecules in a certain direction. As materials constituting the liquid crystal alignment film, polyamide, polyimide, polyamide, polyamide, polyester, polyorganosiloxane, etc. are known (refer to Patent Literature 1 to Patent Literature). 3).

作為配向處理方式之一,已知有聚合物穩定配向(Polymer Sustained Alignment,PSA)方式。PSA方式為如下技術:使設置於一對基板的間隙的液晶層中含有聚合性化合物,以於基板間施加電壓的狀態照射紫外線而使聚合性化合物聚合,藉此,顯現預傾角特性而控制液晶的配向方向。根據該技術,可實現視角的擴大及液晶分子響應的高速化,亦能夠解決多域垂直配 向(Multi-domain Vertical Alignment,MVA)型面板所具有的透射率及對比度不足的問題。 As one of the alignment treatment methods, a Polymer Sustained Alignment (PSA) method is known. The PSA method is a technique in which a polymerizable compound is contained in a liquid crystal layer provided in a gap between a pair of substrates, and the polymerizable compound is polymerized by irradiating ultraviolet rays in a state where a voltage is applied between the substrates, thereby exhibiting pretilt angle characteristics and controlling the liquid crystal orientation direction. According to this technology, it is possible to expand the viewing angle and speed up the response of liquid crystal molecules, and it is also possible to solve the problem of multi-domain vertical alignment. The problem of insufficient transmittance and contrast of the Multi-domain Vertical Alignment (MVA) type panel.

另外,近年來,伴隨著液晶面板的用途的擴大,正在進行如顯示面彎曲的曲面顯示器般複雜形狀的液晶面板的開發。關於曲面顯示器,通常,藉由將一對基板以於基板間配置有液晶層的狀態進行貼合而製作液晶單元,其後將液晶單元彎曲而製造。然而,為了製造曲面顯示器而將液晶單元彎曲,因此有時會出現在一對基板中的一個基板與另一個基板之間產生預傾角的偏差的區域。該情況下,在產生了預傾角的偏差的區域,畫面中可見暗部,有時會導致畫質下降。 In addition, in recent years, along with the expansion of the use of liquid crystal panels, development of liquid crystal panels having complex shapes such as a curved display with a curved display surface is progressing. Regarding a curved display, generally, a liquid crystal cell is produced by laminating a pair of substrates in a state in which a liquid crystal layer is arranged between the substrates, and then the liquid crystal cell is bent and produced. However, since the liquid crystal cell is bent in order to manufacture a curved display, a region where a deviation of the pretilt angle occurs between one of the pair of substrates and the other substrate may occur. In this case, in the region where the pretilt angle is uneven, dark parts are visible on the screen, and the image quality may be degraded.

考慮到所述方面,提出有使用使預傾角於一個基板的液晶配向膜與另一個基板的液晶配向膜之間不同並貼合該些基板而構築的液晶單元來製造曲面顯示器,藉此,抑制在將液晶單元彎曲時的基板間的預傾角的偏差(例如參照專利文獻4)。 In view of the above-mentioned aspects, it has been proposed to manufacture a curved display by using a liquid crystal cell constructed by laminating the liquid crystal alignment film of one substrate and the liquid crystal alignment film of the other substrate with a different pretilt angle. Variation in the pretilt angle between substrates when the liquid crystal cell is bent (for example, refer to Patent Document 4).

[現有技術文獻] [Prior Art Literature]

[專利文獻] [Patent Literature]

[專利文獻1]日本專利特開平4-153622號公報 [Patent Document 1] Japanese Patent Laid-Open No. 4-153622

[專利文獻2]日本專利特開昭56-91277號公報 [Patent Document 2] Japanese Patent Laid-Open No. 56-91277

[專利文獻3]日本專利特開平11-258605號公報 [Patent Document 3] Japanese Patent Laid-Open No. 11-258605

[專利文獻4]日本專利特開2015-26074號公報 [Patent Document 4] Japanese Patent Laid-Open No. 2015-26074

就現有的方法而言,難以在一個基板與另一個基板之間產生充分的預傾角的差。因此,擔心於應用於曲面顯示器的情況下無法充分確保畫質。 With the conventional method, it is difficult to generate a sufficient difference in pretilt angle between one substrate and the other substrate. Therefore, there is a fear that the image quality cannot be sufficiently ensured when applied to a curved display.

本發明是鑒於所述實情而成者,其目的之一在於提供一種可在一個基板與另一個基板之間充分產生預傾角的差異的液晶元件的製造方法。另外,另一目的在於提供一種可獲得一個基板與另一個基板之間的預傾角的差異足夠大的液晶元件的液晶配向劑。 The present invention has been made in view of the above-mentioned facts, and one of its objects is to provide a method of manufacturing a liquid crystal element that can sufficiently generate a difference in pretilt angle between one substrate and the other substrate. In addition, another object is to provide a liquid crystal aligning agent that can obtain a liquid crystal element having a sufficiently large difference in pretilt angle between one substrate and the other substrate.

本發明為解決所述課題而採用了以下方法。 The present invention employs the following methods in order to solve the above-mentioned problems.

<1>一種液晶元件的製造方法,其包括:於第1基板及第2基板的各基板上塗佈液晶配向劑的步驟(塗佈步驟);於塗佈所述液晶配向劑後對所述第1基板及所述第2基板進行加熱的步驟(加熱步驟);以及於所述加熱之後,將所述第1基板與所述第2基板以塗佈有所述液晶配向劑的面相對的方式對向配置從而構築液晶單元的步驟(單元構築步驟),且所述液晶配向劑含有具有藉由加熱而脫離的熱脫離性基的化合物,於所述進行加熱的步驟中,實施對所述第1基板及所述第2基板中的一個基板,以較另一個基板更高的溫度進行加熱的高溫加熱處理。 <1> A method of manufacturing a liquid crystal element, comprising: a step of coating a liquid crystal alignment agent on each of a first substrate and a second substrate (coating step); The step of heating the first substrate and the second substrate (heating step); and after the heating, the first substrate and the second substrate are opposed to the surfaces on which the liquid crystal aligning agent is applied A step of constructing a liquid crystal cell by arranging in opposite directions (a cell constructing step), wherein the liquid crystal aligning agent contains a compound having a thermally releasable group that is desorbed by heating, and in the step of heating, the One of the first substrate and the second substrate is subjected to a high-temperature heat treatment that is heated at a higher temperature than the other substrate.

<2>一種液晶配向劑,其含有具有藉由加熱而脫離的熱脫離性基的化合物,且所述熱脫離性基具有選自由下述(A)、(B)及(C)所組成 的群組中的至少一種部分結構。 <2> A liquid crystal aligning agent containing a compound having a thermally releasable group that is released by heating, and the thermally releasable group has a compound selected from the group consisting of the following (A), (B) and (C) At least one partial structure in the group of .

(A)選自由受阻胺結構、受阻酚結構及苯胺結構所組成的群組中的至少一種部分結構。 (A) At least one partial structure selected from the group consisting of a hindered amine structure, a hindered phenol structure, and an aniline structure.

(B)能夠顯現藉由光照射而產生自由基的自由基產生功能及藉由光照射而顯示出增感作用的光增感功能的至少任一種功能的基。 (B) A group capable of expressing at least any one of a radical generating function that generates radicals by light irradiation and a photosensitizing function that exhibits a sensitizing action by light irradiation.

(C)下述式(C-1)所表示的部分結構(其中,限定於碳數8以上的部分結構)。 (C) A partial structure represented by the following formula (C-1) (however, it is limited to a partial structure having 8 or more carbon atoms).

[化1]*-R22-R21-R20-R19 (C-1) [Chemical 1]*-R 22 -R 21 -R 20 -R 19 (C-1)

(式(C-1)中,R19為碳數1~30的烷基、碳數1~30的氟烷基、碳數1~30的烷氧基、碳數1~30的氟化烷氧基、可具有取代基的碳數3~10的環烷基、可具有取代基的碳數6~20的苯基、或具有類固醇骨架的碳數17~51的烴基。R20為單鍵、-O-、-COO-或-OCO-。R21為單鍵、碳數1~20的烷二基、伸苯基、伸聯苯基、伸環己基、雙伸環己基、下述式(C-1-1)所表示的基、或下述式(C-1-2)所表示的基。R22為單鍵或二價有機基。其中,當R20為單鍵時,R21為單鍵。「*」表示鍵結鍵) (In formula (C-1), R 19 is an alkyl group having 1 to 30 carbon atoms, a fluoroalkyl group having 1 to 30 carbon atoms, an alkoxy group having 1 to 30 carbon atoms, and a fluorinated alkane having 1 to 30 carbon atoms. Oxygen, optionally substituted cycloalkyl group with 3 to 10 carbon atoms, optionally substituted phenyl group with 6 to 20 carbon atoms, or hydrocarbon group with steroid skeleton with 17 to 51 carbon atoms. R 20 is a single bond , -O-, -COO- or -OCO-. R 21 is a single bond, alkanediyl with 1 to 20 carbon atoms, phenylene, biphenylene, cyclohexylene, double cyclohexylene, the following formula A group represented by (C-1-1) or a group represented by the following formula (C-1-2). R 22 is a single bond or a divalent organic group. Wherein, when R 20 is a single bond, R 21 is a single key. "*" means a bond key)

[化2]

Figure 107112578-A0305-02-0006-1
[hua 2]
Figure 107112578-A0305-02-0006-1

(式(C-1-2)中,R23為氫原子或碳數1~10的烴基。「**」表示與R22的鍵結鍵)。 (In formula (C-1-2), R 23 is a hydrogen atom or a hydrocarbon group having 1 to 10 carbon atoms. "**" represents a bond with R 22 ).

根據所述液晶配向劑,可在一個基板與另一個基板之間充分產生預傾角的差異。另外,藉由膜形成時的加熱條件的不同而於基板間產生預傾角的差異,因而,即使於一個基板與另一個基板使用相同的液晶配向劑而形成液晶配向膜的情況下,亦能夠產生基板間的充分的預傾角的差異,生產性優異。 According to the liquid crystal aligning agent, a difference in pretilt angle can be sufficiently generated between one substrate and the other substrate. In addition, a difference in pretilt angle occurs between the substrates due to the difference in the heating conditions at the time of film formation. Therefore, even when a liquid crystal alignment film is formed using the same liquid crystal aligning agent for one substrate and the other substrate, the A sufficient difference in pretilt angle between substrates is excellent in productivity.

以下,對液晶元件的製造方法進行說明。本揭示的液晶元件可藉由包括塗佈步驟、加熱步驟及單元構築步驟的方法而製造。以下,對本揭示的液晶元件的製造方法進行詳細說明。 Hereinafter, the manufacturing method of a liquid crystal element is demonstrated. The liquid crystal element of the present disclosure can be manufactured by a method including a coating step, a heating step, and a cell construction step. Hereinafter, the manufacturing method of the liquid crystal element of this disclosure is demonstrated in detail.

再者,本說明書中所謂「烴基」,是指包含鏈狀烴基、脂環式烴基及芳香族烴基。所謂「鏈狀烴基」,是指不包含環狀結構,而僅由鏈狀結構所構成的直鏈狀及分支狀的烴基。其中,鏈狀烴基可為飽和亦可為不飽和。所謂「脂環式烴基」,是指作為環結構僅包含脂環式烴的結構,而不包含芳香環結構的烴基。其中, 脂環式烴基無需僅由脂環式烴的結構所構成,亦包含其一部分中具有鏈狀結構者。所謂「芳香族烴基」,是指包含芳香環結構作為環結構的烴基。其中,無需僅由芳香環結構所構成,亦可在其一部分中包含鏈狀結構或脂環式烴的結構。 In addition, the "hydrocarbon group" in this specification means a chain hydrocarbon group, an alicyclic hydrocarbon group, and an aromatic hydrocarbon group. The "chain hydrocarbon group" refers to a straight-chain and branched hydrocarbon group that does not include a cyclic structure but consists only of a chain structure. Among them, the chain hydrocarbon group may be saturated or unsaturated. The "alicyclic hydrocarbon group" refers to a hydrocarbon group that includes only an alicyclic hydrocarbon as a ring structure, and does not include an aromatic ring structure. in, The alicyclic hydrocarbon group does not need to be composed of only the structure of the alicyclic hydrocarbon, and includes those having a chain structure in a part thereof. The "aromatic hydrocarbon group" refers to a hydrocarbon group including an aromatic ring structure as a ring structure. Among them, it is not necessary to consist only of an aromatic ring structure, and a chain structure or an alicyclic hydrocarbon structure may be included in a part thereof.

本說明書中,「四羧酸衍生物」的含義為包含四羧酸二酐、四羧酸二酯及四羧酸二酯二鹵化物。另外,「(甲基)丙烯酸酯」的含義為包含丙烯酸酯以及甲基丙烯酸酯。 In the present specification, "tetracarboxylic acid derivative" means a tetracarboxylic dianhydride, a tetracarboxylic acid diester, and a tetracarboxylic acid diester dihalide. In addition, the meaning of "(meth)acrylate" includes acrylate and methacrylate.

《塗佈步驟》 "Coating Steps"

於製造液晶元件時,首先,於包括第1基板及第2基板的一對基板的各基板面上塗佈液晶配向劑。作為基板,例如可使用包括浮法玻璃、鈉玻璃等玻璃;聚對苯二甲酸乙二酯、聚對苯二甲酸丁二酯、聚醚碸、聚碳酸酯、聚(脂環式烯烴)等塑膠的透明基板。於一對基板中的至少一者中形成有包含透明導電膜等的電極。作為透明導電膜,例如可使用包含氧化錫(SnO2)的奈塞(NESA)膜(美國PPG公司註冊商標)、包含氧化銦-氧化錫(In2O3-SnO2)的氧化銦錫(Indium Tin Oxide,ITO)膜等。於製造TN型、STN型或VA型的液晶元件時,使用兩片設置有經圖案化的透明導電膜的基板。另一方面,於製造面內切換(In-Plane-Switching,IPS)型或邊緣場切換(Fringe Field Switching,FFS)型的液晶元件時,使用設置有經圖案化為梳齒型的電極的基板、與未設置電極的對向基板。液晶配向劑對基板的塗佈能夠應用任意方法,是於電極形成面上較佳為藉由平版印刷法、旋轉塗佈法、輥塗機法、柔版 印刷法或噴墨印刷法而進行。 When manufacturing a liquid crystal element, first, a liquid crystal aligning agent is apply|coated to each board|substrate surface of a pair of board|substrates containing a 1st board|substrate and a 2nd board|substrate. As the substrate, for example, glass including float glass, soda glass, etc.; polyethylene terephthalate, polybutylene terephthalate, polyether terephthalate, polycarbonate, poly(alicyclic olefin), etc. can be used Plastic transparent substrate. An electrode including a transparent conductive film or the like is formed on at least one of the pair of substrates. As the transparent conductive film, for example, a Nessa (NESA) film containing tin oxide ( SnO 2 ) (registered trademark of U.S. PPG Corporation ) , an indium tin oxide ( Indium Tin Oxide, ITO) film and so on. When manufacturing a TN type, STN type or VA type liquid crystal element, two substrates provided with a patterned transparent conductive film are used. On the other hand, when manufacturing an In-Plane-Switching (IPS) type or Fringe Field Switching (FFS) type liquid crystal element, a substrate provided with electrodes patterned in a comb-shaped pattern is used. , and the opposite substrate without electrodes. Any method can be applied to the coating of the liquid crystal aligning agent on the substrate, and it is preferably performed on the electrode formation surface by a lithographic method, a spin coating method, a roll coater method, a flexographic printing method or an inkjet printing method.

<液晶配向劑> <Liquid crystal alignment agent>

其次,對本揭示的製造方法中所使用的液晶配向劑進行詳細說明。該液晶配向劑是將聚合物成分溶解或分散於有機溶媒中而成的聚合物組成物。 Next, the liquid crystal aligning agent used for the manufacturing method of this disclosure is demonstrated in detail. The liquid crystal aligning agent is a polymer composition obtained by dissolving or dispersing a polymer component in an organic solvent.

關於液晶配向劑中的聚合物成分,聚合物的主骨架並無特別限定,例如可列舉:將聚醯胺酸、聚醯亞胺、聚醯胺酸酯、聚醯胺、聚有機矽氧烷、聚酯、纖維素衍生物、聚縮醛、聚苯乙烯衍生物、聚(苯乙烯-苯基馬來醯亞胺)衍生物、聚(甲基)丙烯酸酯等作為主骨架的聚合物。該些中,就可藉由熱脫離性基的切斷來充分增大一對基板間產生的預傾角差的方面而言,較佳為選自由聚醯胺酸、聚醯亞胺、聚醯胺酸酯及聚有機矽氧烷所組成的群組中的至少一種。再者,作為聚合物成分,可單獨使用一種,亦可組合使用兩種以上。 Regarding the polymer component in the liquid crystal aligning agent, the main skeleton of the polymer is not particularly limited, and examples thereof include polyamide, polyimide, polyamide, polyamide, polyorganosiloxane , polyester, cellulose derivative, polyacetal, polystyrene derivative, poly(styrene-phenylmaleimide) derivative, poly(meth)acrylate, etc. as the polymer of the main skeleton. Among these, it is preferable to be selected from the group consisting of polyamide, polyimide, At least one of the group consisting of amino acid ester and polyorganosiloxane. In addition, as a polymer component, 1 type may be used individually, and 2 or more types may be used together.

本揭示的製造方法中所使用的液晶配向劑含有具有藉由加熱而脫離的熱脫離性基的化合物(以下亦稱為「化合物(P)」)。化合物(P)可為聚合物成分及其他成分的任一者,較佳為聚合物成分,特佳為選自由聚醯胺酸、聚醯胺酸酯、聚醯亞胺及聚有機矽氧烷所組成的組群中的至少一種。 The liquid crystal aligning agent used for the production method of the present disclosure contains a compound (hereinafter also referred to as "compound (P)") having a thermally detachable group which is detached by heating. The compound (P) can be any one of a polymer component and other components, preferably a polymer component, and particularly preferably selected from the group consisting of polyamic acid, polyamic acid ester, polyimide and polyorganosiloxane at least one of the group consisting of.

化合物(P)所具有的熱脫離性基若為藉由第1溫度條件下的加熱而實質上不脫離,且藉由較第1溫度條件更高的第2溫度條件下的加熱而能夠脫離的基則並無特別限定。熱脫離性基 藉由鍵結的切斷而脫離的溫度(以下亦稱為「脫離溫度」)較佳為處於100℃~300℃的範圍,更佳為處於150℃~250℃的範圍,進而佳為處於180℃~230℃的範圍,特佳為處於200℃~220℃的範圍。 The thermally detachable group possessed by the compound (P) is not substantially detached by heating under the first temperature condition, and can be detached by heating under the second temperature condition higher than the first temperature condition The basis is not particularly limited. thermally detachable group The temperature at which the bond is disconnected (hereinafter also referred to as "release temperature") is preferably in the range of 100°C to 300°C, more preferably in the range of 150°C to 250°C, and further preferably in the range of 180°C. It is the range of 200 degreeC - 220 degreeC especially preferably.

化合物(P)較佳為具有下述式(1)或式(2)所表示的部分結構作為具有熱脫離性基的部分結構。 The compound (P) preferably has a partial structure represented by the following formula (1) or formula (2) as a partial structure having a thermally releasable group.

Figure 107112578-A0305-02-0009-2
Figure 107112578-A0305-02-0009-2

(式(1)中,R1為單鍵或二價有機基。X1為單鍵、-O-、-S-或-NRII-(其中,RII為氫原子或烴基,可與R1鍵結而形成環,亦可為主鏈中所含的二價烴基)。Y1為將Y1與氧基羰基的鍵結切斷而脫離的所述熱脫離性基、或者將X1與氧基羰基的鍵結切斷而與氧基羰基同時或分別脫離的所述熱脫離性基。「*」表示鍵結鍵) (In formula (1), R 1 is a single bond or a divalent organic group. X 1 is a single bond, -O-, -S- or -NR II - (wherein, R II is a hydrogen atom or a hydrocarbon group, which can be combined with R 1 is bonded to form a ring, and may also be a divalent hydrocarbon group contained in the main chain). Y 1 is the thermally detachable group that cleaves the bond between Y 1 and the oxycarbonyl group to be detached, or X 1 The thermally detachable group that is severed from the oxycarbonyl group and simultaneously or separately from the oxycarbonyl group. "*" represents a bond)

[化4]*-R1-Y2 (2) [Chemical 4]*-R 1 -Y 2 (2)

(式(2)中,R1為單鍵或二價有機基。Y2為具有下述式(3)的結構的所述熱脫離性基。「*」表示鍵結鍵) (In formula (2), R 1 is a single bond or a divalent organic group. Y 2 is the thermally releasable group having the structure of the following formula (3). "*" represents a bond)

[化5]

Figure 107112578-A0305-02-0010-3
[hua 5]
Figure 107112578-A0305-02-0010-3

(式(3)中,X1為單鍵、-O-、-S-或-NRII-(其中,RII為氫原子或一價有機基,可與R1鍵結而形成環)。RIII為一價有機基。「**」表示與R1的鍵結鍵) (In formula (3), X 1 is a single bond, -O-, -S- or -NR II - (wherein, R II is a hydrogen atom or a monovalent organic group, which may be bonded to R 1 to form a ring). R III is a monovalent organic group. "**" represents a bond with R 1 )

所述式(1)及式(3)的X1中,作為RII的一價有機基,例如可列舉碳數1~10的一價烴基等。所述式(1)的X1中的RII較佳為氫原子或一價烴基。 In X 1 of the above-mentioned formula (1) and formula (3), the monovalent organic group of R II includes, for example, a monovalent hydrocarbon group having 1 to 10 carbon atoms. R II in X 1 of the formula (1) is preferably a hydrogen atom or a monovalent hydrocarbon group.

就於熱脫離後確保膜的透明性的觀點而言,所述式(1)及式(3)的X1較佳為單鍵、-O-或-S-。就藉由加熱的脫離性良好的方面而言,所述式(2)中的Y2較佳為鍵結於R1所具有的三級碳原子。R1的二價有機基例如可列舉二價烴基等。 From the viewpoint of securing the transparency of the film after thermal release, X 1 in the above formulas (1) and (3) is preferably a single bond, -O- or -S-. In terms of good releasability by heating, Y 2 in the above formula (2) is preferably bonded to a tertiary carbon atom which R 1 has. As a divalent organic group of R 1 , a divalent hydrocarbon group etc. are mentioned, for example.

關於化合物(P),就藉由加熱而脫離的物質比較容易揮發、容易將該物質自膜中去除的方面而言,較佳為具有所述式(1)所表示的部分結構作為具有熱脫離性基的部分結構。作為所述式(1)所表示的部分結構的具體例,可列舉下述式(1-1)所表示的部分結構、下述式(1-2)所表示的部分結構、下述式(1-3)所表示的部分結構等。 The compound (P) preferably has a partial structure represented by the above formula (1) as having a thermally detachable substance from the viewpoint that the substance desorbed by heating is relatively easily volatilized and the substance is easily removed from the film. Part of the structure of the sex base. Specific examples of the partial structure represented by the formula (1) include a partial structure represented by the following formula (1-1), a partial structure represented by the following formula (1-2), and a partial structure represented by the following formula ( 1-3) The partial structure etc. shown.

[化6]

Figure 107112578-A0305-02-0011-4
[hua 6]
Figure 107112578-A0305-02-0011-4

(式(1-1)~式(1-3)中,R31、R32、R35及R37分別獨立地為一價有機基,R33、R34、R36、R38及R39分別獨立地為氫原子或一價有機基。其中,式(1-1)中,R32與R34可鍵結而形成環結構,R33與R34可鍵結而形成環結構。式(1-3)中,R38與R39可鍵結而形成環結構。R1及X1與所述式(1)為相同含義) (In formula (1-1) to formula (1-3), R 31 , R 32 , R 35 and R 37 are each independently a monovalent organic group, R 33 , R 34 , R 36 , R 38 and R 39 Each independently is a hydrogen atom or a monovalent organic group. Wherein, in formula (1-1), R 32 and R 34 can be bonded to form a ring structure, and R 33 and R 34 can be bonded to form a ring structure. Formula ( In 1-3), R 38 and R 39 may be bonded to form a ring structure. R 1 and X 1 have the same meaning as in the formula (1))

所述式(1-1)~式(1-3)中,R31、R32、R35及R37的一價有機基較佳為碳數1~20的一價烴基。作為R33、R34、R36、R38及R39的一價有機基,例如可列舉:碳數1~40的一價烴基、於該烴基的碳-碳鍵間具有至少一個-O-、-S-、-NRV-、-CO-、-COO-、-CO-NRV-(RV為氫原子或碳數1~10的一價烴基)等含雜原子基的基、雜環基等。再者,烴基所具有的至少一個氫原子可經取代基(例如鹵素原子、羥基、氰基等)取代。 In the above formulae (1-1) to (1-3), the monovalent organic groups of R 31 , R 32 , R 35 and R 37 are preferably monovalent hydrocarbon groups having 1 to 20 carbon atoms. As the monovalent organic group of R 33 , R 34 , R 36 , R 38 and R 39 , for example, a monovalent hydrocarbon group having 1 to 40 carbon atoms having at least one -O- , -S-, -NR V -, -CO-, -COO-, -CO-NR V - (R V is a hydrogen atom or a monovalent hydrocarbon group with a carbon number of 1 to 10) and other heteroatom-containing groups, heteroatoms Ring base etc. Furthermore, at least one hydrogen atom possessed by the hydrocarbon group may be substituted with a substituent (eg, a halogen atom, a hydroxyl group, a cyano group, and the like).

作為R32與R34鍵結所形成的環結構、R33與R34鍵結所形成的環結構、以及R38與R39鍵結所形成的環結構,例如可列舉具有脂肪族環、芳香族烴環、雜環等環的結構,該些環亦可具有取代基。就可藉由熱脫離而產生極性基(羧基)的方面而言,X1較佳為單鍵。 Examples of the ring structure formed by R32 and R34 bonding, the ring structure formed by R33 and R34 bonding , and the ring structure formed by R38 and R39 bonding include, for example, aliphatic rings, aromatic The structure of a ring such as a hydrocarbon ring, a heterocyclic ring, etc., and these rings may also have a substituent. X 1 is preferably a single bond in that a polar group (carboxyl group) can be generated by thermal detachment.

將所述式(1-1)~式(1-3)分別所表示的部分結構中 的熱脫離反應分別示於下述流程1~流程3中。再者,流程1中,於X1為-O-、-S-或-NRII-的情況下,進而進行脫CO2而成為「*-R1-X1H」。 The thermal desorption reactions in the partial structures represented by the formulas (1-1) to (1-3) are shown in the following Schemes 1 to 3, respectively. In addition, in Scheme 1, when X 1 is -O-, -S- or -NR II -, CO 2 is further removed to become "*-R 1 -X 1 H".

Figure 107112578-A0305-02-0012-5
Figure 107112578-A0305-02-0012-5

Figure 107112578-A0305-02-0012-6
Figure 107112578-A0305-02-0012-6

Figure 107112578-A0305-02-0012-7
Figure 107112578-A0305-02-0012-7

關於化合物(P),就可將塗佈於基板的液晶配向劑中的溶劑去除,且在較為了保護基板而設定的上限溫度為更低溫側的溫度範圍出現脫離溫度的方面而言,該些中較佳為所述式(1)中 的Y1相對於氧基羰基而以三級碳原子進行鍵結。特佳為化合物(P)具有所述式(1-1)所表示的部分結構作為具有熱脫離性基的部分結構。再者,所述式(1-1)中,於X1為單鍵的情況下,「-C(R31R32)-CH(R33R34)」相當於熱脫離性基,於X1為-O-、-S-或-NRII-的情況下,「-COO-C(R31R32)-CH(R33R34)」相當於熱脫離性基。 Regarding the compound (P), since the solvent in the liquid crystal aligning agent applied to the substrate can be removed, and the detachment temperature appears in the temperature range where the upper limit temperature set to protect the substrate is lower than the lower temperature side, these Among them, Y 1 in the formula (1) is preferably bonded to an oxycarbonyl group with a tertiary carbon atom. It is particularly preferable that the compound (P) has a partial structure represented by the above formula (1-1) as a partial structure having a thermally releasable group. Furthermore, in the above formula (1-1), when X 1 is a single bond, "-C(R 31 R 32 )-CH(R 33 R 34 )" corresponds to a thermally releasable group, and X 1 When 1 is -O-, -S- or -NR II- , "-COO-C(R 31 R 32 )-CH(R 33 R 34 )" corresponds to a thermally releasable group.

所述式(1)中的Y1及所述式(3)中的RIII較佳為具有顯現對液晶分子賦予預傾角的功能、或藉由光照射而產生自由基的光自由基產生功能、藉由光照射而顯示出增感作用的光增感功能、阻礙聚合反應的聚合抑制劑功能等特定功能的功能性官能基。於Y1及RIII具有以上所述的功能性官能基(垂直配向性基、自由基產生基及聚合抑制劑基)的至少一種的情況下,可根據膜形成時的加熱時的溫度條件來控制形成於第1基板上的液晶配向膜及形成於第2基板上的液晶配向膜的功能的顯現程度,就該方面而言較佳。 Y 1 in the formula (1) and R III in the formula (3) preferably have a function of imparting a pretilt angle to liquid crystal molecules, or a photo-radical generating function of generating radicals by light irradiation. , A functional functional group with specific functions, such as a photosensitizing function that exhibits a sensitizing action by light irradiation, and a polymerization inhibitor function that inhibits a polymerization reaction. When Y 1 and R III have at least one of the above-mentioned functional functional groups (vertical alignment group, radical generating group, and polymerization inhibitor group), it can be determined according to the temperature conditions during heating during film formation. From this point of view, it is preferable to control the degree of expression of the functions of the liquid crystal alignment film formed on the first substrate and the liquid crystal alignment film formed on the second substrate.

(垂直配向性基) (Vertical alignment group)

垂直配向性基是對使用液晶配向劑所形成的塗膜賦予使液晶分子誘發所期望的預傾角的功能的官能基。該垂直配向性基顯示出不依存於光照射而使液晶分子垂直配向的性質。於Y1及RIII具有垂直配向性基的情況下,可藉由使液晶配向膜的垂直配向限制力發生變化,而使液晶配向膜所誘發的液晶分子的預傾角在第1基板與第2基板之間充分不同。 The vertical alignment group is a functional group that imparts a function of inducing a desired pretilt angle to liquid crystal molecules to a coating film formed using a liquid crystal alignment agent. This vertical alignment group exhibits a property of vertically aligning liquid crystal molecules independently of light irradiation. In the case where Y 1 and R III have vertical alignment groups, the pre-tilt angle of the liquid crystal molecules induced by the liquid crystal alignment film can be changed between the first substrate and the second substrate by changing the vertical alignment restraint force of the liquid crystal alignment film. Substrates are sufficiently different.

作為垂直配向性基的具體例,例如可列舉:碳數1~30的烷基、碳數1~30的氟烷基、碳數1~30的烷氧基、碳數1~30的氟化烷氧基、具有將環己烷環及苯環的至少一種環的合計兩個以上連結而成的骨架的基、具有類固醇骨架的基等。垂直配向性基較佳為具有下述式(C-1)所表示的部分結構的基。 Specific examples of the vertical alignment group include an alkyl group having 1 to 30 carbon atoms, a fluoroalkyl group having 1 to 30 carbon atoms, an alkoxy group having 1 to 30 carbon atoms, and a fluorinated group having 1 to 30 carbon atoms. An alkoxy group, a group having a skeleton formed by linking at least one of a cyclohexane ring and a benzene ring in total, a group having a steroid skeleton, and the like. The vertical alignment group is preferably a group having a partial structure represented by the following formula (C-1).

[化10]*-R22-R21-R20-R19 (C-1) [Chemical 10]*-R 22 -R 21 -R 20 -R 19 (C-1)

(式(C-1)中,R19為碳數1~30的烷基、碳數1~30的氟烷基、碳數1~30的烷氧基、碳數1~30的氟化烷氧基、可具有取代基的碳數3~10的環烷基、可具有取代基的碳數6~20的苯基、或具有類固醇骨架的碳數17~51的烴基。R20為單鍵、-O-、-COO-或-OCO-。R21為單鍵、碳數1~20的烷二基、伸苯基、伸聯苯基、伸環己基、雙伸環己基、下述式(C-1-1)所表示的基、或下述式(C-1-2)所表示的基。R22為單鍵或二價有機基。其中,當R20為單鍵時,R21為單鍵。於R20、R21及R22為單鍵,且R19為碳數1~30的烷基、碳數1~30的氟烷基、碳數1~30的烷氧基或碳數1~30的氟化烷氧基的情況下,R19具有直鏈結構。「*」表示鍵結鍵) (In formula (C-1), R 19 is an alkyl group having 1 to 30 carbon atoms, a fluoroalkyl group having 1 to 30 carbon atoms, an alkoxy group having 1 to 30 carbon atoms, and a fluorinated alkane having 1 to 30 carbon atoms. Oxygen, optionally substituted cycloalkyl group with 3 to 10 carbon atoms, optionally substituted phenyl group with 6 to 20 carbon atoms, or hydrocarbon group with steroid skeleton with 17 to 51 carbon atoms. R 20 is a single bond , -O-, -COO- or -OCO-. R 21 is a single bond, alkanediyl with 1 to 20 carbon atoms, phenylene, biphenylene, cyclohexylene, double cyclohexylene, the following formula A group represented by (C-1-1) or a group represented by the following formula (C-1-2). R 22 is a single bond or a divalent organic group. Wherein, when R 20 is a single bond, R 21 is a single bond. R 20 , R 21 and R 22 are single bonds, and R 19 is an alkyl group having 1 to 30 carbon atoms, a fluoroalkyl group having 1 to 30 carbon atoms, and an alkoxy group having 1 to 30 carbon atoms. Or in the case of a fluorinated alkoxy group having 1 to 30 carbon atoms, R 19 has a straight chain structure. "*" represents a bond)

[化11]

Figure 107112578-A0305-02-0015-8
[Chemical 11]
Figure 107112578-A0305-02-0015-8

(式(C-1-2)中,R23為氫原子或碳數1~10的烴基。「**」表示與R22的鍵結鍵) (In formula (C-1-2), R 23 is a hydrogen atom or a hydrocarbon group having 1 to 10 carbon atoms. "**" represents a bond with R 22 )

所述式(C-1)中,於R20、R21及R22為單鍵,且R19為碳數1~30的烷基、碳數1~30的氟烷基、碳數1~30的烷氧基或碳數1~30的氟化烷氧基的情況下,就使液晶分子誘發足夠高的預傾角的觀點而言,R19的直鏈結構更佳為碳數為5以上,進而佳為8以上,特佳為10以上。作為具有類固醇骨架的碳數17~51的烴基,例如可列舉膽甾烷基、膽甾烯基、羊毛甾烷基等。 In the formula (C-1), R 20 , R 21 and R 22 are single bonds, and R 19 is an alkyl group with 1 to 30 carbon atoms, a fluoroalkyl group with 1 to 30 carbon atoms, and a fluoroalkyl group with 1 to 30 carbon atoms. In the case of an alkoxy group having 30 or a fluorinated alkoxy group having 1 to 30 carbon atoms, from the viewpoint of inducing a sufficiently high pretilt angle to liquid crystal molecules, the linear structure of R 19 is more preferably a carbon number of 5 or more. , more preferably 8 or more, particularly preferably 10 or more. As a C17-C51 hydrocarbon group which has a steroid skeleton, a cholestyl group, a cholestenyl group, a lanostane group, etc. are mentioned, for example.

就對液晶分子的預傾角賦予能力高的方面而言,垂直配向性基較佳為碳數8以上的直鏈結構、具有將環己烷環及苯環的至少一種環的合計兩個以上連結而成的骨架的基、或具有類固醇骨架的基,更佳為具有將環己烷環及苯環的至少一種環的合計兩個以上連結而成的骨架的基、或具有類固醇骨架的基。 The vertical alignment group preferably has a straight-chain structure having 8 or more carbon atoms, and has a total of two or more rings that connect at least one of a cyclohexane ring and a benzene ring from the viewpoint of high ability to impart a pretilt angle to liquid crystal molecules. The group of the resulting skeleton or the group having a steroid skeleton is more preferably a group having a skeleton formed by linking at least one of at least one of a cyclohexane ring and a benzene ring in total, or a group having a steroid skeleton.

作為垂直配向性基的具體例,例如可列舉下述式(c1-1)~式(c1-10)分別所表示的基等。於所述式(1)的Y1為垂直配向性基的情況下,下述式中的R26較佳為相對於氧基羧基而以-C(RIV)2-(其中,RIV為碳數1~10的一價烴基。以下相同)進行鍵結的基,於所述式(3)的RIII為垂直配向性基的情況下,較佳為單鍵。 Specific examples of the vertical alignment group include groups represented by the following formulae (c1-1) to (c1-10), for example. In the case where Y 1 of the formula (1) is a vertical alignment group, R 26 in the following formula is preferably -C(R IV ) 2 -(wherein R IV is relative to the oxycarboxyl group) A monovalent hydrocarbon group having 1 to 10 carbon atoms. The same applies hereinafter.) When R III of the formula (3) is a vertical alignment group, it is preferably a single bond.

Figure 107112578-A0305-02-0016-9
Figure 107112578-A0305-02-0016-9

(式中,R26為單鍵或者經取代或未經取代的二價烴基。「*」表示鍵結鍵) (In the formula, R 26 is a single bond or a substituted or unsubstituted divalent hydrocarbon group. "*" represents a bond)

(自由基產生基) (radical generating group)

自由基產生基若為顯示出光自由基產生功能及光增感功能的至少任一者的官能基則並無特別限定。於Y1、RIII具有自由基產生基的情況下,可促進PSA模式下混入液晶層中的光聚合性化合物對光的反應性,藉此而可使液晶配向膜所誘發的液晶分子的預傾角在第1基板與第2基板之間充分不同。 The radical generating group is not particularly limited as long as it is a functional group that exhibits at least any one of a photoradical generating function and a photosensitizing function. When Y 1 and R III have a radical generating group, the reactivity of the photopolymerizable compound mixed into the liquid crystal layer to light in the PSA mode can be promoted, thereby enabling the prepositioning of the liquid crystal molecules induced by the liquid crystal alignment film. The inclination angle is sufficiently different between the first substrate and the second substrate.

作為自由基產生基,可使用來自公知的光自由基產生劑的官能基。作為光自由基產生劑,例如可列舉:苯烷基酮系化合 物、安息香系化合物、縮酮系化合物、苯乙酮系化合物、二苯甲酮系化合物、硫雜蒽酮系化合物、以及蒽醌系化合物等含自由基產生基的化合物。 As the radical generating group, a functional group derived from a known photoradical generating agent can be used. As a photoradical generator, for example, a phenalkyl ketone type compound can be mentioned. compounds, benzoin-based compounds, ketal-based compounds, acetophenone-based compounds, benzophenone-based compounds, thioxanthone-based compounds, and anthraquinone-based compounds and other radical generating group-containing compounds.

自由基產生基較佳為具有選自由下述式(B-1)所表示的部分結構及下述式(B-2)所表示的部分結構所組成的群組中的至少一種的基。 The radical generating group is preferably a group having at least one selected from the group consisting of a partial structure represented by the following formula (B-1) and a partial structure represented by the following formula (B-2).

Figure 107112578-A0305-02-0017-10
Figure 107112578-A0305-02-0017-10

(式(B-1)中,Ar1為可具有取代基的二價芳香環基,Ar2為可具有取代基的一價芳香環基,Ar1與Ar2可經由-O-、-S-、羰基或-NR23-(R23為氫原子或碳數1~10的烴基)而相互連結。R14為單鍵或二價有機基。「*」表示鍵結鍵) (In the formula (B-1), Ar 1 is a divalent aromatic ring group which may have a substituent, Ar 2 is a monovalent aromatic ring group which may have a substituent, and Ar 1 and Ar 2 can pass through -O-, -S -, carbonyl or -NR 23 - (R 23 is a hydrogen atom or a hydrocarbon group with 1 to 10 carbon atoms) and are connected to each other. R 14 is a single bond or a divalent organic group. "*" represents a bond)

Figure 107112578-A0305-02-0017-11
Figure 107112578-A0305-02-0017-11

(式(B-2)中,Ar3為可具有取代基的二價芳香環基。R15及R16分別獨立地為一價有機基,R15及R16可鍵結而形成環。R17為羥基或一價有機基。R18為單鍵或二價有機基。「*」表示鍵結鍵) (In formula (B-2), Ar 3 is a divalent aromatic ring group which may have a substituent. R 15 and R 16 are each independently a monovalent organic group, and R 15 and R 16 may be bonded to form a ring. R 17 is a hydroxyl group or a monovalent organic group. R 18 is a single bond or a divalent organic group. "*" represents a bond)

所述式(B-1)中的Ar1及Ar2、所述式(B-2)中的Ar3的二價芳香環基是自經取代或未經取代的芳香環的環部分去除兩個氫原子而成的基。作為芳香環,例如可列舉苯環、萘環、蒽環等,較佳為苯環。作為芳香環可具有的取代基,例如可列舉碳數1~6的烷基、烷氧基及氟烷基、氟原子、羥基等。 The divalent aromatic ring groups of Ar 1 and Ar 2 in the formula (B-1) and Ar 3 in the formula (B-2) are two groups removed from the ring moiety of the substituted or unsubstituted aromatic ring. A base made of hydrogen atoms. As an aromatic ring, a benzene ring, a naphthalene ring, an anthracene ring, etc. are mentioned, for example, Preferably it is a benzene ring. As a substituent which an aromatic ring may have, a C1-C6 alkyl group, an alkoxy group, a fluoroalkyl group, a fluorine atom, a hydroxyl group, etc. are mentioned, for example.

所述式(B-2)中的R15~R17中,作為一價有機基,例如可列舉:碳數1~20的經取代或未經取代的烷基、碳數1~20的經取代或未經取代的烷氧基、苄基、苯乙基等。作為烷基及烷氧基可具有的取代基,例如可列舉氟原子、羥基等。 Among R 15 to R 17 in the formula (B-2), as a monovalent organic group, for example, a substituted or unsubstituted alkyl group having 1 to 20 carbon atoms, and a substituted or unsubstituted alkyl group having 1 to 20 carbon atoms can be listed. Substituted or unsubstituted alkoxy, benzyl, phenethyl, etc. As a substituent which an alkyl group and an alkoxy group may have, a fluorine atom, a hydroxyl group, etc. are mentioned, for example.

所述式(B-1)中的R14及式(B-2)中的R18中,作為二價有機基,例如可列舉:碳數1~20的二價烴基、該烴基的亞甲基經-O-、-S-或-NRIV-(其中,RIV為氫原子或一價有機基。以下相同)所取代的基、該烴基的至少一個氫原子經氟原子、烷氧基等所取代的基等。作為RIV的一價有機基,較佳為碳數1~10的一價烴基。 In R 14 in the formula (B-1) and R 18 in the formula (B-2), the divalent organic group includes, for example, a divalent hydrocarbon group having 1 to 20 carbon atoms, and a methylene group of the hydrocarbon group. A group substituted by -O-, -S- or -NR IV - (wherein, R IV is a hydrogen atom or a monovalent organic group. The same applies hereinafter), at least one hydrogen atom of the hydrocarbon group is substituted by a fluorine atom, an alkoxy group etc. substituted bases, etc. The monovalent organic group of R IV is preferably a monovalent hydrocarbon group having 1 to 10 carbon atoms.

作為自由基產生基的具體例,所述式(B-1)所表示的部分結構例如可列舉下述式(B-1-1)~式(B-1-4)分別所表示的基等;所述式(B-2)所表示的部分結構例如可列舉下述式(B-2-1)~式(B-2-7)分別所表示的基等。於所述式(1)的Y1為自由基產生基的情況下,下述式中的R25較佳為相對於氧基羧基而以-C(RIV)2-進行鍵結的基,於所述式(3)的RIII為自由基產生基的情況下,較佳為單鍵。 As a specific example of the radical generating group, the partial structure represented by the formula (B-1) includes, for example, groups represented by the following formulae (B-1-1) to (B-1-4), respectively, and the like. ; The partial structure represented by the said formula (B-2), for example, the group represented by the following formula (B-2-1) ~ formula (B-2-7), etc. are mentioned, for example. In the case where Y 1 of the above formula (1) is a radical generating group, R 25 in the following formula is preferably a group bonded with -C(R IV ) 2 - with respect to the oxycarboxyl group, When R III of the said formula (3) is a radical generating group, it is preferable that it is a single bond.

[化15]

Figure 107112578-A0305-02-0019-12
[Chemical 15]
Figure 107112578-A0305-02-0019-12

(式中,R25為單鍵或二價烴基。「*」表示鍵結鍵) (In the formula, R 25 is a single bond or a divalent hydrocarbon group. "*" represents a bond)

(聚合抑制劑基) (polymerization inhibitor base)

聚合抑制劑基作為使以紫外線或熱等能量為契機而產生的過氧自由基或氫過氧化物無效化的過氧化物分解劑、或者捕捉聚合中途的自由基性中間體而抑制聚合反應進行的自由基捕捉劑來發揮功能。藉由於液晶配向膜中含有具有此種聚合抑制劑基的化合物(P),可抑制PSA模式下混入液晶層中的光聚合性化合物因光照射而發生反應。因此,可使液晶配向膜所誘發的液晶分子的預傾角在第1基板與第2基板之間充分不同。 The polymerization inhibitor group acts as a peroxide decomposer that inactivates peroxy radicals or hydroperoxides generated by energy such as ultraviolet rays or heat, or traps radical intermediates in the middle of the polymerization and inhibits the progress of the polymerization reaction free radical scavengers to function. By containing the compound (P) having such a polymerization inhibitor group in the liquid crystal alignment film, the reaction of the photopolymerizable compound mixed into the liquid crystal layer in the PSA mode by light irradiation can be suppressed. Therefore, the pretilt angle of the liquid crystal molecules induced by the liquid crystal alignment film can be sufficiently different between the first substrate and the second substrate.

聚合抑制劑基較佳為具有選自由受阻胺結構、受阻酚結構及苯胺結構所組成的群組中的至少一種的基。具體而言,受阻胺結構較佳為下述式(A-1)所表示的部分結構,受阻酚結構較佳為下述式(A-2)所表示的部分結構,苯胺結構較佳為下述式(A-3)所表示的部分結構。 The polymerization inhibitor group is preferably a group having at least one selected from the group consisting of a hindered amine structure, a hindered phenol structure, and an aniline structure. Specifically, the hindered amine structure is preferably a partial structure represented by the following formula (A-1), the hindered phenol structure is preferably a partial structure represented by the following formula (A-2), and the aniline structure is preferably the following The partial structure represented by the formula (A-3).

[化16]

Figure 107112578-A0305-02-0020-13
[Chemical 16]
Figure 107112578-A0305-02-0020-13

(式(A-1)中,R2為氫原子、碳數1~6的烷基、碳數6~20的芳基、碳數7~13的芳烷基或1,3-二氧代丁基。R3~R6分別獨立地為碳數1~6的烷基、碳數6~12的芳基或碳數7~13的芳烷基。R7為氫原子或碳數1~10的一價烴基。R8為單鍵或二價有機基。X2為單鍵、-O-、羰基或*2-CONH-。X3~X6分別獨立地為單鍵、-O-、羰基、*2-CH2-CO-、或*2-CH2-CH(OH)-。「*2」表示鍵結於哌啶環的鍵結鍵。「*」表示鍵結鍵) (In formula (A-1), R 2 is a hydrogen atom, an alkyl group having 1 to 6 carbon atoms, an aryl group having 6 to 20 carbon atoms, an aralkyl group having 7 to 13 carbon atoms, or 1,3-dioxo Butyl. R 3 ~R 6 are independently an alkyl group with 1 to 6 carbons, an aryl group with 6 to 12 carbons, or an aralkyl group with 7 to 13 carbons. R 7 is a hydrogen atom or a carbon number of 1 to 13. The monovalent hydrocarbon group of 10. R 8 is a single bond or a divalent organic group. X 2 is a single bond, -O-, carbonyl or * 2 -CONH-. X 3 to X 6 are independently a single bond, -O- , carbonyl, * 2 -CH 2 -CO-, or * 2 -CH 2 -CH(OH)-. "* 2 " represents a bond to a piperidine ring. "*" represents a bond)

Figure 107112578-A0305-02-0020-14
Figure 107112578-A0305-02-0020-14

(式(A-2)中,R9為碳數1~16的烷基、或者於該烷基的骨架鏈中具有氧原子、硫原子、羰基、酯基或將該些組合兩種以上所得的基的一價基。n為0~4的整數。R10為單鍵或二價有機基。「*」表示鍵結鍵) (In formula (A-2), R 9 is an alkyl group having 1 to 16 carbon atoms, or an oxygen atom, a sulfur atom, a carbonyl group, an ester group, or a combination of two or more of these in the skeleton chain of the alkyl group. The monovalent group of the base. n is an integer from 0 to 4. R 10 is a single bond or a divalent organic group. "*" represents a bond)

[化18]

Figure 107112578-A0305-02-0021-15
[Chemical 18]
Figure 107112578-A0305-02-0021-15

(式(A-3)中,R11及R12分別獨立地為碳數1~16的烷基、或者於該烷基的骨架鏈中具有氧原子、硫原子、羰基、酯基或將該些組合兩種以上所得的基的一價基。R13為單鍵或二價有機基。「*」表示鍵結鍵) (In formula (A-3), R 11 and R 12 are each independently an alkyl group having 1 to 16 carbon atoms, or an oxygen atom, a sulfur atom, a carbonyl group, an ester group, or the These are monovalent groups of groups obtained by combining two or more types. R 13 is a single bond or a divalent organic group. "*" represents a bonding bond)

關於所述式(A-1)的R2,作為碳數1~6的烷基,例如可列舉:甲基、乙基、丙基、丁基、戊基、己基等。 R 2 in the above formula (A-1) includes, for example, a methyl group, an ethyl group, a propyl group, a butyl group, a pentyl group, and a hexyl group as the alkyl group having 1 to 6 carbon atoms.

作為碳數6~20的芳基,例如可列舉:苯基、3-氟苯基、3-氯苯基、4-氯苯基、4-異丙基苯基、4-正丁基苯基、3-氯-4-甲基苯基、4-吡啶基、2-苯基-4-喹啉基、2-(4'-第三丁基苯基)-4-喹啉基、2-(2'-苯硫基)-4-喹啉基等;作為碳數7~13的芳烷基,例如可列舉:苄基、苯乙基等。 Examples of the aryl group having 6 to 20 carbon atoms include phenyl, 3-fluorophenyl, 3-chlorophenyl, 4-chlorophenyl, 4-isopropylphenyl, and 4-n-butylphenyl , 3-chloro-4-methylphenyl, 4-pyridyl, 2-phenyl-4-quinolinyl, 2-(4'-tert-butylphenyl)-4-quinolinyl, 2- (2'-phenylthio)-4-quinolinyl, etc.; Examples of the aralkyl group having 7 to 13 carbon atoms include a benzyl group, a phenethyl group, and the like.

作為R3~R6的碳數1~6的烷基、碳數6~12的芳基及碳數7~13的芳烷基,可應用所述R2的說明。 As the alkyl group having 1 to 6 carbon atoms, the aryl group having 6 to 12 carbon atoms, and the aralkyl group having 7 to 13 carbon atoms of R 3 to R 6 , the description of the above R 2 can be applied.

於R8為單鍵的情況下,R7較佳為碳數1~10的烷基,更佳為碳數1~5的烷基。 When R 8 is a single bond, R 7 is preferably an alkyl group having 1 to 10 carbon atoms, more preferably an alkyl group having 1 to 5 carbon atoms.

X2~X6較佳為分別為單鍵。 X 2 to X 6 are each preferably a single bond.

作為所述式(A-1)所表示的基的具體例,例如可列舉下述式(A-1-1)~式(A-1-4)分別所表示的基等。於所述式(1) 的Y1為聚合抑制劑基的情況下,下述式中的R7較佳為甲基或乙基,於所述式(3)的RIII為聚合抑制劑基的情況下,下述式中的R7較佳為氫原子。 As a specific example of the group represented by the said formula (A-1), the group etc. which are respectively represented by the following formula (A-1-1) - a formula (A-1-4) are mentioned, for example. When Y 1 in the formula (1) is a polymerization inhibitor group, R 7 in the following formula is preferably a methyl group or an ethyl group, and R III in the formula (3) is a polymerization inhibitor group In the case of , R 7 in the following formula is preferably a hydrogen atom.

Figure 107112578-A0305-02-0022-16
Figure 107112578-A0305-02-0022-16

(式中,「*」表示鍵結鍵) (In the formula, "*" represents a bond bond)

關於所述式(A-2)的R9,作為碳數1~16的烷基,可為直鏈狀及分支狀的任一者,例如可列舉:甲基、乙基、丁基、己基、辛基、癸基等。作為R9的較佳具體例,例如可列舉:第三丁基、1-甲基十五烷基、1-乙基十五烷基、辛基硫基甲基、癸基硫基甲基、十二烷基硫基甲基、十四烷基硫基甲基等。 Regarding R 9 in the above formula (A-2), the alkyl group having 1 to 16 carbon atoms may be either linear or branched, and examples thereof include a methyl group, an ethyl group, a butyl group, and a hexyl group. , octyl, decyl, etc. Preferable specific examples of R 9 include tert-butyl, 1-methylpentadecyl, 1-ethylpentadecyl, octylthiomethyl, decylthiomethyl, Dodecylthiomethyl, tetradecylthiomethyl, etc.

R9的鍵結位置並無特別限定,較佳為相對於酚性羥基而至少鍵結於鄰位。n較佳為1~4,更佳為2。 The bonding position of R 9 is not particularly limited, but it is preferably bonded to at least the ortho position with respect to the phenolic hydroxyl group. n is preferably 1 to 4, more preferably 2.

作為所述式(A-2)所表示的基的具體例,例如可列舉下述式(A-2-1)~式(A-2-4)分別所表示的基等。於所述式(1)的Y1為聚合抑制劑基的情況下,下述式中的R10較佳為相對於氧基羧基而以-C(RIV)2-進行鍵結的基,於所述式(3)的RIII為聚合抑制劑基的情況下,下述式中的R10較佳為單鍵。 As a specific example of the group represented by the said formula (A-2), the group etc. which are each represented by the following formula (A-2-1) - a formula (A-2-4) are mentioned, for example. In the case where Y 1 of the above formula (1) is a polymerization inhibitor group, R 10 in the following formula is preferably a group bonded with -C(R IV ) 2 - with respect to the oxycarboxyl group, When R III of the formula (3) is a polymerization inhibitor group, R 10 in the following formula is preferably a single bond.

Figure 107112578-A0305-02-0023-17
Figure 107112578-A0305-02-0023-17

(式中,「*」表示鍵結鍵) (In the formula, "*" represents a bond bond)

關於所述式(A-3)的R11及R12,作為碳數1~16的烷基,可為直鏈狀及分支狀的任一者。作為R11及R12的較佳具體例,例如可列舉:甲基、乙基、丙基、第三丁基等。 Regarding R 11 and R 12 in the above formula (A-3), as an alkyl group having 1 to 16 carbon atoms, either a straight chain or a branch may be used. As a preferable specific example of R11 and R12 , a methyl group, an ethyl group, a propyl group, a tertiary butyl group etc. are mentioned, for example.

作為所述式(A-3)所表示的基的具體例,例如可列舉下述式(A-3-1)~式(A-3-4)分別所表示的基等。於所述式(1)的Y1為聚合抑制劑基的情況下,下述式中的R13較佳為相對於氧基羧基而以-C(RIV)2-進行鍵結的基,於所述式(3)的RIII為聚合抑制劑基的情況下,下述式中的R13較佳為單鍵。 As a specific example of the group represented by the said formula (A-3), the group etc. which are respectively represented by the following formula (A-3-1) - a formula (A-3-4) are mentioned, for example. When Y 1 of the above formula (1) is a polymerization inhibitor group, R 13 in the following formula is preferably a group bonded with -C(R IV ) 2 - with respect to the oxycarboxyl group, In the case where R III of the formula (3) is a polymerization inhibitor group, R 13 in the following formula is preferably a single bond.

Figure 107112578-A0305-02-0023-18
Figure 107112578-A0305-02-0023-18

(式中,「*」表示鍵結鍵) (In the formula, "*" represents a bond bond)

於所述式(1)中的熱脫離性基(Y1)藉由加熱而脫離且藉此而出現羧基、胺基、醯胺基等極性基的情況下,可藉由Y1的脫離而使液晶配向膜的垂直配向限制力變化(降低)。因此,在一對基板間改變加熱條件來使Y1的脫離程度不同,藉此而可增大基板間的預傾角的差。該情況下,較佳為化合物(P)具有所述式(1)中的X1為單鍵、且R1為二價烴基的部分結構作為具有熱脫離性基的部分結構。具體而言,除所述式(1)中的Y1為垂直配向性基、自由基產生基或聚合抑制劑基的情況以外,例如可列舉具有下述式(8-1)~式(8-5)分別所表示的部分結構作為具有熱脫離性基的部分結構的情況等。 In the case where the thermally detachable group (Y 1 ) in the formula (1) is detached by heating and thereby polar groups such as a carboxyl group, an amine group, and an amide group appear, the detachment of Y 1 can be used to remove the group. The vertical alignment restraint force of the liquid crystal alignment film is changed (decreased). Therefore, the difference in the pretilt angle between the substrates can be increased by changing the heating conditions between the pair of substrates to vary the degree of detachment of Y 1 . In this case, the compound (P) preferably has a partial structure in which X 1 is a single bond and R 1 is a divalent hydrocarbon group in the formula (1) as a partial structure having a thermally releasable group. Specifically, other than the case where Y 1 in the above-mentioned formula (1) is a vertical alignment group, a radical generating group, or a polymerization inhibitor group, for example, the following formulas (8-1) to (8) are exemplified. -5) In the case where the partial structures shown respectively are partial structures having a thermally releasable group, and the like.

Figure 107112578-A0305-02-0024-19
Figure 107112578-A0305-02-0024-19

(式中,RVII為二價烴基。「*1」表示鍵結於主鏈中的原子上的鍵結鍵,「*」表示鍵結鍵) (In the formula, R VII is a divalent hydrocarbon group. "* 1 " represents a bond to an atom in the main chain, and "*" represents a bond)

化合物(P)可藉由根據主骨架而將有機化學的常法適當組合來合成。以下,對聚醯胺酸、聚醯胺酸酯、聚醯亞胺及聚有機矽氧烷各自的聚合物進行說明。 The compound (P) can be synthesized by appropriately combining conventional methods of organic chemistry according to the main skeleton. Hereinafter, the polymer of each of polyamic acid, polyamic acid ester, polyimide, and polyorganosiloxane will be described.

<聚醯胺酸> <Polyamide>

於化合物(P)為聚醯胺酸的情況下,該聚醯胺酸(以下亦稱為「聚醯胺酸(P)」)例如可藉由使四羧酸二酐與二胺化合物進行反應而獲得。該反應時,四羧酸二酐及二胺化合物的至少一者使用具有熱脫離性基的單體。就容易將熱脫離性基導入聚合物中的方面、以及單體的選擇自由度高的方面而言,較佳為合成中使用的二胺化合物的至少一部分包含具有熱脫離性基的二胺(以下亦稱為「特定二胺」)。 In the case where the compound (P) is a polyamic acid, the polyamic acid (hereinafter also referred to as "polyamic acid (P)") can be reacted with, for example, a tetracarboxylic dianhydride and a diamine compound. and obtained. At the time of this reaction, at least one of the tetracarboxylic dianhydride and the diamine compound uses a monomer having a thermally releasable group. It is preferable that at least a part of the diamine compound used in the synthesis contains a diamine ( Also referred to as "specific diamine" hereinafter).

(特定二胺) (specific diamine)

特定二胺只要具有熱脫離性基及兩個一級胺基即可,其他結構並無特別限定。特定二胺較佳為選自由下述式(4)所表示的化合物及下述式(5)所表示的化合物所組成的群組中的至少一種。該些化合物中,熱脫離性基(Y1)藉由加熱而脫離,藉此而產生極性基。 As long as the specific diamine has a thermally releasable group and two primary amine groups, other structures are not particularly limited. The specific diamine is preferably at least one selected from the group consisting of a compound represented by the following formula (4) and a compound represented by the following formula (5). In these compounds, the thermally detachable group (Y 1 ) is detached by heating, thereby generating a polar group.

Figure 107112578-A0305-02-0025-20
Figure 107112578-A0305-02-0025-20

(式(4)中,Y1為熱脫離性基) (In formula (4), Y 1 is a thermally releasable group)

[化24]

Figure 107112578-A0305-02-0026-21
[Chemical 24]
Figure 107112578-A0305-02-0026-21

(式(5)中,R46為二價有機基,R47為單鍵或二價有機基。Y3為藉由熱而脫離的保護基。t為1~3的整數,s為0或1) (In formula (5), R 46 is a divalent organic group, and R 47 is a single bond or a divalent organic group. Y 3 is a protective group that is desorbed by heat. t is an integer of 1 to 3, and s is 0 or 1)

所述式(4)的Y1較佳為具有選自由垂直配向性基、自由基產生基及聚合抑制劑基所組成的群組中的一種。關於垂直配向性基、自由基產生基及聚合抑制劑基的具體例及較佳例,可應用以上的說明。二胺基苯基所具有的兩個一級胺基較佳為相對於其他基而鍵結於2,4-位或3,5-位。 The Y 1 of the formula (4) preferably has one selected from the group consisting of a vertical alignment group, a radical generating group and a polymerization inhibitor group. The above description can be applied to specific examples and preferred examples of the vertical alignment group, the radical generating group, and the polymerization inhibitor group. It is preferable that the two primary amine groups which the diaminophenyl group has are bonded to the 2,4-position or the 3,5-position with respect to the other groups.

作為所述式(5)中的R46及R47的二價有機基,例如可列舉:碳數1~20的二價烴基;將烴基的亞甲基以-O-、-S-、-CO-、-COO-、-COS-、-NRa-、-CO-NRa-、-Si(Ra)2-(其中Ra為碳數1~12的一價烴基)、-N=N-、-SO2-等取代而成的二價基;將烴基的碳原子上鍵結的氫原子的至少一個以鹵素原子(氟原子、氯原子、溴原子、碘原子等)、羥基、氰基等取代而成的二價基等。Y3較佳為第三丁氧基羰基。t較佳為1,s較佳為0。 As the divalent organic group of R 46 and R 47 in the formula (5), for example, a divalent hydrocarbon group having 1 to 20 carbon atoms; CO-, -COO-, -COS-, -NR a -, -CO-NR a -, -Si(R a ) 2 - (wherein R a is a monovalent hydrocarbon group with 1 to 12 carbon atoms), -N= A divalent group substituted by N-, -SO 2 -, etc.; at least one of the hydrogen atoms bound to the carbon atom of the hydrocarbon group is replaced by a halogen atom (fluorine atom, chlorine atom, bromine atom, iodine atom, etc.), hydroxyl, Divalent groups, etc., substituted with cyano groups, etc. Y 3 is preferably tert-butoxycarbonyl. t is preferably 1, and s is preferably 0.

作為特定二胺的具體例,所述式(4)所表示的化合物例如可列舉下述式(4-1)~式(4-31)分別所表示的化合物等;所述式(5)所表示的化合物例如可列舉下述式(5-1)~式(5-6)分別所表示的化合物等。再者,作為特定二胺,可單獨使用該些 的一種,亦可組合使用兩種以上。 Specific examples of the specific diamine include compounds represented by the formula (4), for example, compounds represented by the following formulae (4-1) to (4-31), and the like; As a compound represented, the compound etc. which are each represented by following formula (5-1) - formula (5-6) are mentioned, for example. Furthermore, as the specific diamine, these can be used alone one, or a combination of two or more.

Figure 107112578-A0305-02-0027-22
Figure 107112578-A0305-02-0027-22

Figure 107112578-A0305-02-0027-23
Figure 107112578-A0305-02-0027-23

[化27]

Figure 107112578-A0305-02-0028-24
[Chemical 27]
Figure 107112578-A0305-02-0028-24

Figure 107112578-A0305-02-0028-25
Figure 107112578-A0305-02-0028-25

(式中,TMS表示三甲基矽烷基) (In the formula, TMS represents a trimethylsilyl group)

(其他二胺) (other diamines)

當合成聚醯胺酸(P)時,可僅使用特定二胺作為二胺化合物,但亦可將特定二胺與特定二胺以外的其他二胺一併使用。作為其 他二胺,只要不具有熱脫離性基則並無特別限定,例如可列舉:脂肪族二胺、脂環式二胺、芳香族二胺及二胺基有機矽氧烷等。作為該些的具體例,脂肪族二胺例如可列舉:間苯二甲胺、乙二胺、1,3-丙二胺、四亞甲基二胺、六亞甲基二胺等;脂環式二胺例如可列舉:對環己二胺、4,4'-亞甲基雙(環己基胺)等; 芳香族二胺例如可列舉:十二烷氧基二胺基苯、十六烷氧基二胺基苯、十八烷氧基二胺基苯、膽甾烷氧基二胺基苯、膽甾烯氧基二胺基苯、二胺基苯甲酸膽甾烷基酯、二胺基苯甲酸膽甾烯基酯、二胺基苯甲酸羊毛甾烷基酯、3,6-雙(4-胺基苯甲醯氧基)膽甾烷、3,6-雙(4-胺基苯氧基)膽甾烷、1,1-雙(4-((胺基苯基)甲基)苯基)-4-丁基環己烷、2,5-二胺基-N,N-二烯丙基苯胺、下述式(DE-1) When synthesizing the polyamic acid (P), only the specific diamine may be used as the diamine compound, but the specific diamine may be used together with other diamines other than the specific diamine. as its Other diamines are not particularly limited as long as they do not have a thermally releasable group, and examples thereof include aliphatic diamines, alicyclic diamines, aromatic diamines, and diamine organosiloxanes. As specific examples of these, aliphatic diamines include, for example, m-xylylenediamine, ethylenediamine, 1,3-propanediamine, tetramethylenediamine, hexamethylenediamine, and the like; The formula diamines include, for example, p-cyclohexanediamine, 4,4'-methylenebis(cyclohexylamine), and the like; Examples of aromatic diamines include dodecyloxydiaminobenzene, hexadecyloxydiaminobenzene, octadecyloxydiaminobenzene, cholestyalkoxydiaminobenzene, cholesteryl Alkenyloxydiaminobenzene, cholestyl diaminobenzoate, cholestyl diaminobenzoate, lanostalyl diaminobenzoate, 3,6-bis(4-amine) benzyloxy)cholestane, 3,6-bis(4-aminophenoxy)cholestane, 1,1-bis(4-((aminophenyl)methyl)phenyl) -4-butylcyclohexane, 2,5-diamino-N,N-diallylaniline, the following formula (DE-1)

Figure 107112578-A0305-02-0029-26
Figure 107112578-A0305-02-0029-26

(式(DE-1)中,XI及XII分別獨立地為單鍵、-O-、-COO-或-OCO-,RI為碳數1~3的烷二基,RII為單鍵或碳數1~3的烷二基,a為0或1,b為0~2的整數,c為1~20的整數,d為0或1。其中,a及b不會同時成為0) (In formula (DE-1), X I and X II are each independently a single bond, -O-, -COO- or -OCO-, R I is an alkanediyl group having 1 to 3 carbon atoms, and R II is a single A bond or an alkanediyl group having 1 to 3 carbon atoms, a is 0 or 1, b is an integer of 0 to 2, c is an integer of 1 to 20, and d is 0 or 1. However, a and b do not become 0 at the same time )

所表示的化合物等側鏈型二胺: 對苯二胺、4,4'-二胺基二苯基甲烷、4,4'-伸乙基二苯胺、4,4'-二胺基二苯基胺、4,4'-二胺基二苯基硫醚、4-胺基苯基-4'-胺基苯甲酸酯、4,4'-二胺基偶氮苯、3,5-二胺基苯甲酸、1,2-雙(4-胺基苯氧基)乙烷、1,5-雙(4-胺基苯氧基)戊烷、N,N'-二(4-胺基苯基)-N,N'-二甲基乙二胺、雙[2-(4-胺基苯基)乙基]己二酸、雙(4-胺基苯基)胺、N,N-雙(4-胺基苯基)甲基胺、1,4-雙(4-胺基苯基)-哌嗪、N,N'-雙(4-胺基苯基)-聯苯胺、2,2'-二甲基-4,4'-二胺基聯苯、2,2'-雙(三氟甲基)-4,4'-二胺基聯苯、4,4'-二胺基二苯基醚、2,2-雙[4-(4-胺基苯氧基)苯基]丙烷、4,4'-(伸苯基二亞異丙基)雙苯胺、1,4-雙(4-胺基苯氧基)苯、4-(4-胺基苯氧基羰基)-1-(4-胺基苯基)哌啶、4,4'-[4,4'-丙烷-1,3-二基雙(哌啶-1,4-二基)]二苯胺等非側鏈型二胺;二胺基有機矽氧烷例如可列舉:1,3-雙(3-胺基丙基)-四甲基二矽氧烷等,此外,可使用日本專利特開2010-97188號公報中記載的二胺化合物。再者,當合成聚醯胺酸(P)時,其他二胺可單獨使用一種或者組合使用兩種以上。 Side chain type diamines such as the indicated compounds: p-phenylenediamine, 4,4'-diaminodiphenylmethane, 4,4'-ethylidene diphenylamine, 4,4'-diaminodiphenylamine, 4,4'-diamine Diphenyl sulfide, 4-aminophenyl-4'-aminobenzoate, 4,4'-diaminoazobenzene, 3,5-diaminobenzoic acid, 1,2-bis (4-Aminophenoxy)ethane, 1,5-bis(4-aminophenoxy)pentane, N,N'-bis(4-aminophenoxy)-N,N'-di Methylethylenediamine, bis[2-(4-aminophenyl)ethyl]adipic acid, bis(4-aminophenyl)amine, N,N-bis(4-aminophenyl)methane amine, 1,4-bis(4-aminophenyl)-piperazine, N,N'-bis(4-aminophenyl)-benzidine, 2,2'-dimethyl-4,4 '-Diaminobiphenyl, 2,2'-bis(trifluoromethyl)-4,4'-diaminobiphenyl, 4,4'-diaminodiphenyl ether, 2,2-bis [4-(4-Aminophenoxy)phenyl]propane, 4,4'-(phenylenediisopropylidene)dianiline, 1,4-bis(4-aminophenoxy)benzene , 4-(4-aminophenoxycarbonyl)-1-(4-aminophenyl)piperidine, 4,4'-[4,4'-propane-1,3-diylbis(piperidine) -1,4-diyl)] non-side-chain diamines such as diphenylamine; diaminoorganosiloxane, for example: 1,3-bis(3-aminopropyl)-tetramethyldisiloxane alkane and the like, and the diamine compound described in Japanese Patent Laid-Open No. 2010-97188 can be used. Furthermore, when synthesizing the polyamic acid (P), other diamines may be used alone or in combination of two or more.

就充分獲得本揭示的效果的觀點而言,特定二胺的使用比例較佳為相對於合成聚醯胺酸(P)時所使用的二胺化合物的合計量而設為1莫耳%以上。更佳為5莫耳%以上,進而佳為10莫耳%以上。 From the viewpoint of sufficiently obtaining the effects of the present disclosure, the use ratio of the specific diamine is preferably 1 mol % or more with respect to the total amount of the diamine compounds used when synthesizing the polyamic acid (P). More preferably, it is 5 mol% or more, and still more preferably 10 mol% or more.

特定二胺可藉由將有機化學的常法適當組合來獲得。作為其一例,關於所述式(4)所表示的二胺,可列舉:合成代替所 述式(4)中的一級胺基而具有硝基的二硝基中間體,繼而,使用適當的還原系將所獲得的二硝基中間體的硝基進行胺基化的方法等。合成二硝基中間體的方法可根據作為目標的化合物來適當選擇,例如可列舉使具有二硝基苯基的醯氯與具有熱脫離性基的三級醇進行反應的方法等。 The specific diamine can be obtained by appropriately combining conventional methods of organic chemistry. As an example, the diamine represented by the above formula (4) includes: A dinitro intermediate having a nitro group as a primary amine group in the above formula (4), and then, a method of amination of the nitro group of the obtained dinitro intermediate using an appropriate reducing system, and the like. The method for synthesizing the dinitro intermediate can be appropriately selected according to the target compound, and examples thereof include a method of reacting acyl chloride having a dinitrophenyl group with a tertiary alcohol having a thermally releasable group.

另外,關於所述式(5)所表示的二胺,例如可藉由使具有「-NH-CO-」的二胺與二碳酸二-第三丁酯於二甲基胺基吡啶等強鹼的存在下進行反應來合成。其中,特定二胺的合成方法並不限定於以上方法。 In addition, as for the diamine represented by the above formula (5), for example, diamine having "-NH-CO-" and di-tert-butyl dicarbonate can be prepared by using a strong base such as dimethylaminopyridine. The reaction was carried out in the presence of . However, the synthesis method of the specific diamine is not limited to the above method.

(四羧酸二酐) (tetracarboxylic dianhydride)

聚醯胺酸(P)的合成中使用的四羧酸二酐並無特別限定,例如可列舉:脂肪族四羧酸二酐、脂環式四羧酸二酐、芳香族四羧酸二酐等。作為該些的具體例,脂肪族四羧酸二酐例如可列舉:乙二胺四乙酸二酐等;脂環式四羧酸二酐例如可列舉:1,2,3,4-環丁烷四羧酸二酐、1,3-二甲基-1,2,3,4-環丁烷四羧酸二酐、2,3,5-三羧基環戊基乙酸二酐、5-(2,5-二氧代四氫呋喃-3-基)-3a,4,5,9b-四氫萘并[1,2-c]呋喃-1,3-二酮、5-(2,5-二氧代四氫呋喃-3-基)-8-甲基-3a,4,5,9b-四氫萘并[1,2-c]呋喃-1,3-二酮、5-(2,5-二氧代四氫-3-呋喃基)-3-甲基-3-環己烯-1,2-二羧酸酐、3,5,6-三羧基-2-羧基甲基降冰片烷-2:3,5:6-二酐、2,4,6,8-四羧基雙環[3.3.0]辛烷-2:4,6:8-二酐、環己烷四羧酸二酐、環戊烷四羧酸二酐等; 芳香族四羧酸二酐例如可列舉:均苯四甲酸二酐、4,4'-(六氟亞異丙基)二鄰苯二甲酸酐、對伸苯基雙(偏苯三甲酸單酯酐)、乙二醇雙(偏苯三甲酸酐酯)、1,3-丙二醇雙(偏苯三酸酐酯)、3,3',4,4'-二苯甲酮四羧酸酐等,此外,可使用日本專利特開2010-97188號公報中記載的四羧酸二酐。再者,四羧酸二酐可單獨使用一種或者組合使用兩種以上。 The tetracarboxylic dianhydride used for the synthesis of polyamic acid (P) is not particularly limited, and examples thereof include aliphatic tetracarboxylic dianhydride, alicyclic tetracarboxylic dianhydride, and aromatic tetracarboxylic dianhydride. Wait. As specific examples of these, aliphatic tetracarboxylic dianhydrides include, for example, ethylenediaminetetraacetic acid dianhydride, and the like; alicyclic tetracarboxylic dianhydrides include, for example, 1,2,3,4-cyclobutane Tetracarboxylic dianhydride, 1,3-dimethyl-1,2,3,4-cyclobutanetetracarboxylic dianhydride, 2,3,5-tricarboxycyclopentylacetic dianhydride, 5-(2 ,5-dioxotetrahydrofuran-3-yl)-3a,4,5,9b-tetrahydronaphtho[1,2-c]furan-1,3-dione, 5-(2,5-dioxo Tetrahydrofuran-3-yl)-8-methyl-3a,4,5,9b-tetrahydronaphtho[1,2-c]furan-1,3-dione, 5-(2,5-dioxo Tetrahydro-3-furyl)-3-methyl-3-cyclohexene-1,2-dicarboxylic anhydride, 3,5,6-tricarboxy-2-carboxymethylnorbornane-2:3 ,5: 6-dianhydride, 2,4,6,8-tetracarboxybicyclo[3.3.0]octane-2:4,6:8-dianhydride, cyclohexanetetracarboxylic dianhydride, cyclopentane Tetracarboxylic dianhydride, etc.; Examples of the aromatic tetracarboxylic dianhydride include pyromellitic dianhydride, 4,4'-(hexafluoroisopropylidene)diphthalic anhydride, p-phenylene bis(trimellitic acid monoester) anhydride), ethylene glycol bis(trimellitic anhydride), 1,3-propanediol bis(trimellitic anhydride), 3,3',4,4'-benzophenone tetracarboxylic anhydride, etc. In addition, Japanese The tetracarboxylic dianhydride described in Japanese Patent Laid-Open No. 2010-97188. In addition, tetracarboxylic dianhydride can be used individually by 1 type or in combination of 2 or more types.

(聚醯胺酸的合成) (Synthesis of Polyamide)

聚醯胺酸(P)可藉由使如所述般的四羧酸二酐與二胺化合物視需要與分子量調整劑(例如,酸單酐、單胺化合物、單異氰酸酯化合物等)一併進行反應而獲得。被供於聚醯胺酸(P)的合成反應的四羧酸二酐與二胺化合物的使用比例較佳為相對於二胺化合物的胺基1當量而四羧酸二酐的酸酐基成為0.2當量~2當量的比例。 Polyamic acid (P) can be carried out by combining the above-mentioned tetracarboxylic dianhydride and diamine compound with a molecular weight modifier (for example, acid monoanhydride, monoamine compound, monoisocyanate compound, etc.) if necessary obtained by the reaction. The use ratio of the tetracarboxylic dianhydride and the diamine compound to be used in the synthesis reaction of the polyamic acid (P) is preferably 0.2 for the acid anhydride group of the tetracarboxylic dianhydride relative to 1 equivalent of the amine group of the diamine compound. The ratio of equivalents to 2 equivalents.

聚醯胺酸(P)的合成反應較佳為於有機溶媒中進行。此時的反應溫度較佳為-20℃~150℃,反應時間較佳為0.1小時~24小時。作為反應所使用的有機溶媒,例如可列舉:非質子性極性溶媒、酚系溶媒、醇、酮、酯、醚、鹵化烴、烴等。特佳的有機溶媒使用選自由N-甲基-2-吡咯啶酮、N,N-二甲基乙醯胺、N,N-二甲基甲醯胺、二甲基亞碸、γ-丁內酯、四甲基脲、六甲基磷醯三胺、間甲酚、二甲酚以及鹵化酚所組成的群組中的一種以上作為溶媒,或者為該些的一種以上與其他有機溶媒(例如,丁基賽珞蘇、二乙二醇二乙醚等)的混合物。有機溶媒的使用量較佳為設 為相對於反應溶液的總量而四羧酸二酐及二胺化合物的合計量成為0.1質量%~50質量%的量。將聚醯胺酸(P)溶解而成的反應溶液可直接供於液晶配向劑的製備,亦可將反應溶液中所含的聚醯胺酸(P)分離之後供於液晶配向劑的製備。 The synthesis reaction of polyamide (P) is preferably carried out in an organic solvent. The reaction temperature at this time is preferably -20°C to 150°C, and the reaction time is preferably 0.1 hour to 24 hours. As an organic solvent used for a reaction, an aprotic polar solvent, a phenol type solvent, alcohol, ketone, ester, ether, halogenated hydrocarbon, hydrocarbon etc. are mentioned, for example. The particularly preferred organic solvent is selected from N-methyl-2-pyrrolidone, N,N-dimethylacetamide, N,N-dimethylformamide, dimethylsulfoxide, γ-butylene One or more of the group consisting of lactone, tetramethylurea, hexamethylphosphoric triamine, m-cresol, xylenol and halogenated phenols are used as solvents, or one or more of these and other organic solvents ( For example, a mixture of butyl silosol, diethylene glycol diethyl ether, etc.). The use amount of the organic solvent is preferably set to The total amount of the tetracarboxylic dianhydride and the diamine compound is an amount of 0.1% by mass to 50% by mass relative to the total amount of the reaction solution. The reaction solution obtained by dissolving the polyamic acid (P) can be directly used for the preparation of the liquid crystal alignment agent, or the polyamic acid (P) contained in the reaction solution can be separated and then used for the preparation of the liquid crystal alignment agent.

<聚醯胺酸酯> <Polyurethane>

作為化合物(P)的聚醯胺酯例如可藉由使具有熱脫離性基的四羧酸二酯與二胺化合物進行反應而獲得。四羧酸二酯與二胺的反應較佳為於脫水觸媒及鹼的存在下,於有機溶媒中進行。提供給反應的四羧酸二酯與二胺的使用比例較佳為相對於二胺的胺基1當量,四羧酸二酯的羧基成為0.2當量~2當量的比例。 The polyamide ester as the compound (P) can be obtained, for example, by reacting a tetracarboxylic acid diester and a diamine compound having a thermally releasable group. The reaction of the tetracarboxylic acid diester and the diamine is preferably carried out in an organic solvent in the presence of a dehydration catalyst and a base. The use ratio of the tetracarboxylic acid diester and the diamine to be used for the reaction is preferably a ratio of 0.2 to 2 equivalents of the carboxyl group of the tetracarboxylic acid diester with respect to 1 equivalent of the amine group of the diamine.

當四羧酸二酯與二胺反應時,亦可併用選自由四羧酸二酐及不具有熱脫離性基的四羧酸二酯所組成的群組中的至少一種化合物。該情況下,相對於聚醯胺酸酯的合成中使用的四羧酸二酯及四羧酸二酐的合計,四羧酸二酐及不具有熱脫離性基的四羧酸二酯的使用比例(於使用兩種以上的情況下為其合計量)較佳為設為50莫耳%以下,更佳為設為40莫耳%以下,進而佳為設為30莫耳%以下。 When the tetracarboxylic acid diester and the diamine are reacted, at least one compound selected from the group consisting of a tetracarboxylic dianhydride and a tetracarboxylic acid diester having no thermally detachable group may be used in combination. In this case, the use of the tetracarboxylic dianhydride and the tetracarboxylic acid diester having no thermal releasable group relative to the total of the tetracarboxylic acid diester and the tetracarboxylic dianhydride used in the synthesis of the polyamic acid ester The ratio (the total amount when two or more types are used) is preferably 50 mol % or less, more preferably 40 mol % or less, and still more preferably 30 mol % or less.

作為反應中所使用的有機溶媒,可列舉作為聚醯胺酸(P)的合成中所使用者而例示的有機溶媒。作為反應中所使用的脫水觸媒,例如可列舉:鹵化4-(4,6-二甲氧基-1,3,5-三嗪-2-基)-4-甲基嗎啉、羰基咪唑、二環己基碳二醯亞胺、磷系縮合劑等。相對於四羧酸二酯1莫耳,該些脫水觸媒的使用比例較佳為設為2 莫耳~3莫耳。作為鹼,例如可較佳地使用吡啶、三乙胺等三級胺。相對於二胺1莫耳,鹼的使用比例較佳為設為2莫耳~4莫耳。再者,所述反應亦可以促進反應的進行為目的而於路易斯酸的存在下進行。作為路易斯酸,例如可列舉氯化鋰等鹵化鋰等。反應溫度較佳為-20℃~150℃,反應時間較佳為0.1小時~24小時。 As the organic solvent used for the reaction, the organic solvents exemplified as those used in the synthesis of polyamic acid (P) can be mentioned. Examples of the dehydration catalyst used in the reaction include halogenated 4-(4,6-dimethoxy-1,3,5-triazin-2-yl)-4-methylmorpholine, carbonylimidazole , Dicyclohexylcarbodiimide, phosphorus-based condensing agent, etc. Relative to 1 mole of tetracarboxylic acid diester, the use ratio of these dehydration catalysts is preferably set to 2 mol ~ 3 mol. As the base, for example, tertiary amines such as pyridine and triethylamine can be preferably used. The use ratio of the base is preferably 2 mol to 4 mol relative to 1 mol of the diamine. In addition, the reaction may be performed in the presence of a Lewis acid for the purpose of promoting the progress of the reaction. As a Lewis acid, lithium halides, such as lithium chloride, etc. are mentioned, for example. The reaction temperature is preferably -20°C to 150°C, and the reaction time is preferably 0.1 hour to 24 hours.

以如上方式獲得的反應溶液可直接供於液晶配向劑的製備,亦可將反應溶液中所含的聚醯胺酸酯分離之後供於液晶配向劑的製備。聚醯胺酸酯的分離及純化可依據公知的方法來進行。 The reaction solution obtained in the above manner can be directly used for the preparation of the liquid crystal aligning agent, or the polyamic acid ester contained in the reaction solution can be separated and then used for the preparation of the liquid crystal aligning agent. The isolation and purification of the polyamic acid ester can be performed according to a known method.

再者,除使四羧酸二酯與二胺進行反應的方法以外,作為化合物(P)的聚醯胺酯例如亦可藉由使聚醯胺酸(P)與酯化劑(例如甲醇或乙醇、N,N-二甲基甲醯胺二乙基乙酸酯等)進行反應的方法、使具有熱脫離性基的四羧酸二酯二鹵化物與二胺化合物進行反應的方法等而獲得。 Furthermore, in addition to the method of reacting the tetracarboxylic acid diester with the diamine, the polyamide ester as the compound (P) can be prepared by, for example, making the polyamide acid (P) and an esterification agent (such as methanol or A method for reacting ethanol, N,N-dimethylformamide diethyl acetate, etc.), a method for reacting a tetracarboxylic acid diester dihalide having a thermally releasable group, and a diamine compound, etc. get.

<聚醯亞胺> <Polyimide>

作為化合物(P)的聚醯亞胺是具有熱脫離性基的聚合物。該聚醯亞胺例如可藉由將如所述般合成的聚醯胺酸(P)脫水閉環且醯亞胺化而獲得。聚醯亞胺可為將作為其前驅物的聚醯胺酸(P)所具有的醯胺酸結構全部進行脫水閉環而成的完全醯亞胺化物,亦可為僅將醯胺酸結構的一部分脫水閉環而使醯胺酸結構與醯亞胺環結構併存的部分醯亞胺化物。聚醯亞胺較佳為其醯亞胺化率為40%~100%,更佳為60%~90%。該醯亞胺化率是以百分率來表示醯亞胺環結構的數量相對於聚醯亞胺的醯胺酸結構的數量與 醯亞胺環結構的數量的合計而言所佔的比例。此處,醯亞胺環的一部分亦可為異醯亞胺環。 The polyimide as the compound (P) is a polymer having a thermally releasable group. This polyimide can be obtained, for example, by dehydrating and ring-closing the polyimide (P) synthesized as described above, followed by imidization. The polyimide may be a complete imide obtained by dehydrating and ring-closing all the amide structures of the polyamide (P), which is a precursor thereof, or only a part of the amide structure. A partial amide imide compound in which an amide acid structure and an amide ring structure coexist by dehydration and ring closure. The polyimide preferably has an imidization rate of 40% to 100%, more preferably 60% to 90%. The imidization rate is expressed as a percentage with respect to the number of imide ring structures relative to the number of imide structures of polyimide and The ratio of the total number of imide ring structures. Here, a part of the imide ring may be an isoimide ring.

聚醯胺酸(P)的脫水閉環較佳為藉由如下方法進行:將聚醯胺酸溶解於有機溶媒中,於該溶液中添加脫水劑及脫水閉環觸媒並視需要進行加熱。脫水劑例如可使用乙酸酐、丙酸酐、三氟乙酸酐等酸酐。相對於聚醯胺酸的醯胺酸結構的1莫耳,脫水劑的使用量較佳為設為0.01莫耳~20莫耳。作為脫水閉環觸媒,例如可使用吡啶、三甲吡啶、二甲吡啶、三乙胺等三級胺。相對於所使用的脫水劑1莫耳,脫水閉環觸媒的使用量較佳為設為0.01莫耳~10莫耳。作為所使用的有機溶媒,可列舉作為聚醯胺酸(P)的合成中所使用者而例示的有機溶媒。脫水閉環反應的反應溫度較佳為0℃~180℃,反應時間較佳為1.0小時~120小時。如此獲得的含有聚醯亞胺的反應溶液可直接供於液晶配向劑的製備,亦可將聚醯亞胺分離之後供於液晶配向劑的製備。 The dehydration and ring closure of the polyamide acid (P) is preferably performed by the following method: dissolving the polyamide acid in an organic solvent, adding a dehydrating agent and a dehydration ring closure catalyst to the solution, and heating as necessary. As the dehydrating agent, acid anhydrides such as acetic anhydride, propionic anhydride, and trifluoroacetic anhydride can be used, for example. The amount of the dehydrating agent used is preferably 0.01 mol to 20 mol with respect to 1 mol of the amide structure of the polyamide acid. As the dehydration ring-closure catalyst, for example, tertiary amines such as pyridine, collidine, lutidine, and triethylamine can be used. The amount of the dehydration closed-loop catalyst used is preferably 0.01 mol to 10 mol relative to 1 mol of the dehydrating agent used. As the organic solvent to be used, the organic solvent exemplified as the one used for the synthesis of the polyamic acid (P) can be mentioned. The reaction temperature of the dehydration ring-closure reaction is preferably 0°C to 180°C, and the reaction time is preferably 1.0 hours to 120 hours. The polyimide-containing reaction solution obtained in this way can be directly used for the preparation of a liquid crystal alignment agent, or the polyimide can be separated and then used for the preparation of a liquid crystal alignment agent.

當製成濃度為10重量%的溶液時,聚醯胺酸、聚醯胺酸酯以及聚醯亞胺的溶液黏度較佳為具有10mPa.s~800mPa.s的溶液黏度者,更佳為具有15mPa.s~500mPa.s的溶液黏度者。再者,溶液黏度(mPa.s)是對於使用該些聚合物的良溶媒(例如,γ-丁內酯、N-甲基-2-吡咯啶酮等)所製備的濃度10質量%的聚合物溶液,使用E型旋轉黏度計於25℃下測定的值。 When made into a solution with a concentration of 10% by weight, the viscosity of the solution of polyamide, polyamide ester and polyimide is preferably 10mPa. s~800mPa. s of the solution viscosity, it is better to have 15mPa. s~500mPa. s is the solution viscosity. In addition, the solution viscosity (mPa.s) is for a polymer with a concentration of 10% by mass prepared using a good solvent for these polymers (eg, γ-butyrolactone, N-methyl-2-pyrrolidone, etc.). solution, measured at 25°C using an E-type rotational viscometer.

聚醯胺酸、聚醯胺酸酯以及聚醯亞胺的藉由凝膠滲透層析法(Gel Penetration Chromatography,GPC)測定的聚苯乙烯換 算的重量平均分子量(Mw)較佳為1,000~500,000,更佳為5,000~100,000。由Mw與藉由GPC測定的聚苯乙烯換算的數量平均分子量(Mn)之比表示的分子量分佈(Mw/Mn)較佳為15以下,更佳為10以下。再者,液晶配向劑所含有的聚醯胺酸、聚醯胺酸酯以及聚醯亞胺可僅為一種,亦可組合兩種以上。 Determination of polystyrene exchange by gel permeation chromatography (Gel Penetration Chromatography, GPC) of polyamides, polyamides and polyimides The calculated weight average molecular weight (Mw) is preferably 1,000 to 500,000, more preferably 5,000 to 100,000. The molecular weight distribution (Mw/Mn) represented by the ratio of Mw to the number average molecular weight (Mn) in terms of polystyrene measured by GPC is preferably 15 or less, more preferably 10 or less. In addition, the polyamic acid, polyamic acid ester, and polyimide contained in the liquid crystal aligning agent may be only one type, or two or more types may be combined.

<聚有機矽氧烷> <Polyorganosiloxane>

具有熱脫離性基的聚有機矽氧烷(以下亦稱為「特定聚有機矽氧烷」)例如可藉由使水解性的矽烷化合物進行水解.縮合而獲得。具體而言,可列舉下述[1]或[2]:[1]將具有環氧基的水解性的矽烷化合物(ms-1)、或者該矽烷化合物(ms-1)與其他矽烷化合物的混合物進行水解縮合而合成含環氧基的聚有機矽氧烷,繼而使所獲得的含環氧基的聚有機矽氧烷、與具有熱脫離性基的羧酸(以下亦稱為「特定羧酸」)進行反應的方法;[2]使具有熱脫離性基的水解性的矽烷化合物(ms-2)、或者該矽烷化合物(ms-2)與其他矽烷化合物的混合物進行水解縮合的方法等。該些方法中,方法[1]簡便,而且可提高聚有機矽氧烷中的光配向性基的導入率,就該方面而言較佳。 The polyorganosiloxane having a thermally releasable group (hereinafter also referred to as "specific polyorganosiloxane") can be hydrolyzed by, for example, a hydrolyzable silane compound. obtained by condensation. Specifically, the following [1] or [2] can be mentioned: [1] A hydrolyzable silane compound (ms-1) having an epoxy group, or a combination of the silane compound (ms-1) and another silane compound The mixture is hydrolyzed and condensed to synthesize an epoxy-containing polyorganosiloxane, and then the obtained epoxy-containing polyorganosiloxane and a carboxylic acid having a thermally releasable group (hereinafter also referred to as "specific carboxylate") are synthesized. [2] A method of hydrolyzing a hydrolyzable silane compound (ms-2) having a thermally releasable group, or a mixture of the silane compound (ms-2) and other silane compounds, etc. . Among these methods, the method [1] is simple and can improve the introduction rate of the photoalignment group in the polyorganosiloxane, and is preferred in this respect.

作為矽烷化合物(ms-1)的具體例,例如可列舉:3-縮水甘油氧基丙基三甲氧基矽烷、3-縮水甘油氧基丙基三乙氧基矽烷、3-縮水甘油氧基丙基甲基二甲氧基矽烷、3-縮水甘油氧基丙基甲基二乙氧基矽烷、2-(3,4-環氧環己基)乙基三甲氧基矽烷、2-(3,4- 環氧環己基)乙基三乙氧基矽烷、3-(3,4-環氧環己基)丙基三甲氧基矽烷等。作為矽烷化合物(ms-1),可單獨使用該些中的一種或者混合使用兩種以上。 Specific examples of the silane compound (ms-1) include, for example, 3-glycidoxypropyltrimethoxysilane, 3-glycidoxypropyltriethoxysilane, and 3-glycidoxypropyl Alkylmethyldimethoxysilane, 3-glycidoxypropylmethyldiethoxysilane, 2-(3,4-epoxycyclohexyl)ethyltrimethoxysilane, 2-(3,4 - Epoxycyclohexyl)ethyltriethoxysilane, 3-(3,4-epoxycyclohexyl)propyltrimethoxysilane, etc. As the silane compound (ms-1), one of these can be used alone, or two or more of them can be used in combination.

其他矽烷化合物只要是顯示出水解性的矽烷化合物則並無特別限制,例如可列舉:四甲氧基矽烷、甲基三甲氧基矽烷、3-巰基丙基三甲氧基矽烷、3-胺基丙基三甲氧基矽烷、3-(甲基)丙烯醯氧基丙基三甲氧基矽烷、3-(甲基)丙烯醯氧基丙基三乙氧基矽烷、乙烯基三甲氧基矽烷、對苯乙烯基三甲氧基矽烷、三甲氧基矽烷基丙基丁二酸酐等。其他矽烷化合物可單獨使用一種或者組合使用兩種以上。 The other silane compound is not particularly limited as long as it is a silane compound showing hydrolyzability, and examples thereof include tetramethoxysilane, methyltrimethoxysilane, 3-mercaptopropyltrimethoxysilane, and 3-aminopropyl trimethoxysilane, 3-(meth)acryloyloxypropyltrimethoxysilane, 3-(meth)acryloyloxypropyltriethoxysilane, vinyltrimethoxysilane, p-benzene Vinyl trimethoxy silane, trimethoxy silyl propyl succinic anhydride, etc. Other silane compounds may be used alone or in combination of two or more.

矽烷化合物的水解.縮合反應可藉由使如上所述的矽烷化合物的一種或者兩種以上與水、較佳為於適當的觸媒及有機溶媒的存在下反應而進行。 Hydrolysis of silane compounds. The condensation reaction can be performed by reacting one or more of the above-mentioned silane compounds with water, preferably in the presence of a suitable catalyst and an organic solvent.

所述方法[1]中,就不僅能夠將光配向性基充分導入至聚合物中,而且抑制因環氧基為過剩量而引起的副反應的觀點而言,含環氧基的聚有機矽氧烷的環氧當量較佳為100g/莫耳~10,000g/莫耳。水解.縮合反應時,相對於矽烷化合物(合計量)1莫耳,水的使用比例較佳為0.5莫耳~100莫耳,更佳為1莫耳~30莫耳。 In the above-mentioned method [1], the epoxy group-containing polyorganosilicon is not only capable of sufficiently introducing photoalignment groups into the polymer, but also suppresses side reactions caused by excess epoxy groups. The epoxy equivalent of the oxane is preferably 100 g/mol to 10,000 g/mol. hydrolysis. During the condensation reaction, the use ratio of water is preferably 0.5 mol to 100 mol, more preferably 1 mol to 30 mol, relative to 1 mol of the silane compound (total amount).

作為水解.縮合反應時使用的觸媒,例如可列舉酸、鹼金屬化合物、有機鹼、鈦化合物、鋯化合物等。觸媒的使用量根據觸媒的種類、溫度等反應條件等而不同,應適當地設定,例如相對於矽烷化合物的合計量,較佳為0.01倍莫耳~3倍莫耳。作 為所述水解.縮合反應時使用的有機溶媒,例如可列舉烴、酮、酯、醚、醇等。該些中,較佳為使用非水溶性或難水溶性的有機溶媒。相對於反應中所使用的矽烷化合物的合計100質量份,有機溶媒的使用比例較佳為10質量份~10,000質量份,更佳為50質量份~1,000質量份。 as hydrolysis. Examples of catalysts used in the condensation reaction include acids, alkali metal compounds, organic bases, titanium compounds, zirconium compounds, and the like. The amount of the catalyst used varies depending on the type of the catalyst, reaction conditions such as temperature, and the like, and should be appropriately set. For example, it is preferably 0.01 to 3 moles relative to the total amount of the silane compound. do for the hydrolysis. Examples of the organic solvent used in the condensation reaction include hydrocarbons, ketones, esters, ethers, alcohols, and the like. Among these, it is preferable to use a water-insoluble or poorly water-soluble organic solvent. The usage ratio of the organic solvent is preferably 10 parts by mass to 10,000 parts by mass, more preferably 50 parts by mass to 1,000 parts by mass, with respect to 100 parts by mass in total of the silane compound used in the reaction.

所述水解.縮合反應較佳為藉由例如油浴等進行加熱而實施。水解.縮合反應時,較佳為將加熱溫度設為130℃以下,且較佳為將加熱時間設為0.5小時~12小時。於反應結束後,對自反應液分離取出的有機溶媒層視需要利用乾燥劑進行乾燥後去除溶媒,藉此可獲得作為目標的聚有機矽氧烷。再者,聚有機矽氧烷的合成方法並不限定於所述水解.縮合反應,例如,可藉由使水解性矽烷化合物於草酸及醇的存在下反應的方法等而進行。 The hydrolysis. The condensation reaction is preferably carried out by heating with, for example, an oil bath or the like. hydrolysis. In the condensation reaction, the heating temperature is preferably 130° C. or lower, and the heating time is preferably 0.5 to 12 hours. After the completion of the reaction, the organic solvent layer separated from the reaction solution is dried with a desiccant if necessary, and the solvent is removed, whereby the target polyorganosiloxane can be obtained. Furthermore, the synthesis method of polyorganosiloxane is not limited to the hydrolysis. The condensation reaction can be performed, for example, by a method of reacting a hydrolyzable silane compound in the presence of oxalic acid and alcohol.

於所述方法[1]中,使藉由所述反應而獲得的含環氧基的聚有機矽氧烷繼而與特定羧酸進行反應。藉此,含環氧基的聚有機矽氧烷所具有的環氧基與羧酸進行反應,可獲得具有熱脫離性基的聚有機矽氧烷。特定羧酸只要具有熱脫離性基則並無特別限定,較佳為使用具有所述式(1-1)所表示的部分結構的羧酸。特定羧酸可單獨使用一種或者組合使用兩種以上。 In the method [1], the epoxy group-containing polyorganosiloxane obtained by the reaction is then reacted with a specific carboxylic acid. Thereby, the epoxy group which the epoxy-group-containing polyorganosiloxane has reacts with a carboxylic acid, and the polyorganosiloxane which has a thermally releasable group can be obtained. The specific carboxylic acid is not particularly limited as long as it has a thermally releasable group, and a carboxylic acid having a partial structure represented by the above formula (1-1) is preferably used. A specific carboxylic acid can be used individually by 1 type or in combination of 2 or more types.

特定羧酸較佳為下述式(6)所表示的羧酸。作為其具體例,例如可列舉下述式(6-1)~式(6-24)分別所表示的化合物等。作為R50的二價有機基,例如可列舉碳數1~20的二價烴基、雜環基等。 The specific carboxylic acid is preferably a carboxylic acid represented by the following formula (6). Specific examples thereof include compounds represented by the following formulae (6-1) to (6-24), for example. As a divalent organic group of R <50 >, a C1-C20 divalent hydrocarbon group, a heterocyclic group, etc. are mentioned, for example.

Figure 107112578-A0305-02-0039-27
Figure 107112578-A0305-02-0039-27

(式(6)中,R50為二價有機基,Y1為熱脫離性基) (In formula (6), R 50 is a divalent organic group, and Y 1 is a thermally releasable group)

Figure 107112578-A0305-02-0039-28
Figure 107112578-A0305-02-0039-28

Figure 107112578-A0305-02-0039-29
Figure 107112578-A0305-02-0039-29

[化33]

Figure 107112578-A0305-02-0040-30
[Chemical 33]
Figure 107112578-A0305-02-0040-30

再者,當含環氧基的聚有機矽氧烷與特定羧酸進行反應時,亦可併用不具有熱脫離性基的羧酸(其他羧酸)。所使用的其他羧酸並無特別限制,例如可列舉(甲基)丙烯酸、(甲基)丙烯酸甲酯等。再者,其他羧酸可單獨使用一種或者組合使用兩種以上。 Furthermore, when the epoxy group-containing polyorganosiloxane is reacted with a specific carboxylic acid, a carboxylic acid (other carboxylic acid) which does not have a thermally releasable group may be used in combination. There is no restriction|limiting in particular as other carboxylic acid used, For example, (meth)acrylic acid, methyl (meth)acrylate, etc. are mentioned. In addition, other carboxylic acid may be used individually by 1 type or in combination of 2 or more types.

當含環氧基的聚有機矽氧烷與羧酸進行反應時,相對於含環氧基的聚有機矽氧烷所具有的環氧基的合計1莫耳,羧酸的使用比例(於使用兩種以上的情況下為其合計量)較佳為設為0.001莫耳~0.99莫耳,更佳為設為0.01莫耳~0.9莫耳。相對於含環氧基的聚有機矽氧烷所具有的環氧基的合計1莫耳,特定羧酸的使用比例(於使用兩種以上的情況下為其合計量)較佳為設為0.001莫耳以上,更佳為設為0.01莫耳~0.8莫耳。 When the epoxy group-containing polyorganosiloxane is reacted with a carboxylic acid, the proportion of the carboxylic acid used relative to the total 1 mole of the epoxy groups contained in the epoxy group-containing polyorganosiloxane In the case of two or more kinds, the total amount) is preferably 0.001 mol to 0.99 mol, more preferably 0.01 mol to 0.9 mol. The use ratio of the specific carboxylic acid (the total amount when two or more types are used) is preferably set to 0.001 with respect to 1 mole of the total epoxy groups contained in the epoxy group-containing polyorganosiloxane. Molar or more, more preferably 0.01 mol to 0.8 mol.

含環氧基的聚有機矽氧烷與羧酸的反應較佳為於觸媒及有機溶媒的存在下進行。作為觸媒,例如可使用有機鹼、作為促進環氧化合物的反應的所謂的硬化促進劑而公知的化合物等。其中,較佳為三級有機胺或者四級有機胺。相對於含環氧基的聚 有機矽氧烷100質量份,觸媒的使用比例較佳為0.01質量份~100質量份,更佳為0.1質量份~20質量份。 The reaction of the epoxy group-containing polyorganosiloxane with the carboxylic acid is preferably carried out in the presence of a catalyst and an organic solvent. As the catalyst, for example, an organic base, a compound known as a so-called curing accelerator that accelerates the reaction of an epoxy compound, and the like can be used. Among them, a tertiary organic amine or a quaternary organic amine is preferable. relative to epoxy-containing For 100 parts by mass of organosiloxane, the use ratio of the catalyst is preferably 0.01 parts by mass to 100 parts by mass, more preferably 0.1 parts by mass to 20 parts by mass.

作為所述反應中使用的有機溶媒,例如可列舉:烴、醚、酯、酮、醯胺、醇等。該些中,就原料及產物的溶解性、以及產物的純化的容易度的觀點而言,較佳為選自由醚、酯及酮所組成的群組中的至少一種,作為特佳的溶媒的具體例,可列舉:2-丁酮、2-己酮、甲基異丁基酮及乙酸丁酯等。該有機溶媒較佳為以固體成分濃度(反應溶液中的溶媒以外的成分的合計質量相對於溶液的總質量而言所佔的比例)成為0.1質量%以上的比例來使用,更佳為以成為5質量%~50質量%的比例來使用。 Examples of the organic solvent used in the reaction include hydrocarbons, ethers, esters, ketones, amides, alcohols, and the like. Among these, at least one selected from the group consisting of ethers, esters and ketones is preferred from the viewpoints of solubility of raw materials and products, and easiness of purification of products, as particularly preferred solvents. Specific examples include 2-butanone, 2-hexanone, methyl isobutyl ketone, butyl acetate, and the like. The organic solvent is preferably used in such a ratio that the solid content concentration (the ratio of the total mass of the components other than the solvent in the reaction solution to the total mass of the solution) becomes 0.1 mass % or more, more preferably It is used in a ratio of 5% by mass to 50% by mass.

所述反應中的反應溫度較佳為0℃~200℃,反應時間較佳為1.0小時~50小時。反應結束後,較佳為將自反應液中分離取出的有機溶媒層以水洗滌。含有光配向性聚有機矽氧烷的反應溶液可直接供於液晶配向劑的製備,亦可將反應溶液中所含的光配向性聚有機矽氧烷分離之後供於液晶配向劑的製備。 The reaction temperature in the reaction is preferably 0°C to 200°C, and the reaction time is preferably 1.0 hour to 50 hours. After the completion of the reaction, the organic solvent layer separated from the reaction solution is preferably washed with water. The reaction solution containing the photoalignment polyorganosiloxane can be directly used for the preparation of the liquid crystal alignment agent, or the photoalignment polyorganosiloxane contained in the reaction solution can be separated and then used for the preparation of the liquid crystal alignment agent.

關於特定聚有機矽氧烷,藉由GPC測定的聚苯乙烯換算的重量平均分子量(Mw)較佳為處於100~50,000的範圍,更佳為處於200~10,000的範圍。若特定聚有機矽氧烷的重量平均分子量處於所述範圍,則於製造液晶配向膜時容易處理,另外所獲得的膜具有充分的材料強度及特性。 About a specific polyorganosiloxane, the polystyrene conversion weight average molecular weight (Mw) measured by GPC, Preferably it exists in the range of 100-50,000, More preferably, it exists in the range of 200-10,000. When the weight-average molecular weight of the specific polyorganosiloxane is in the above-mentioned range, it is easy to handle when producing a liquid crystal alignment film, and the obtained film has sufficient material strength and properties.

《其他成分》 "Other Ingredients"

本揭示的液晶配向劑亦可視需要而含有化合物(P)以外的其 他成分。作為該其他成分,例如可列舉:不具有熱脫離性基的聚合物(以下亦稱為「其他聚合物」)、於分子內具有至少一個環氧基的化合物、官能性矽烷化合物、金屬螯合化合物、硬化促進劑、界面活性劑、填充劑、分散劑等。該些的調配比例可於無損本揭示的效果的範圍內根據各化合物而適當選擇。 The liquid crystal aligning agent of the present disclosure may also contain other than the compound (P) as necessary. his ingredients. Examples of the other components include polymers without thermally detachable groups (hereinafter also referred to as "other polymers"), compounds having at least one epoxy group in the molecule, functional silane compounds, and metal chelates. Compounds, hardening accelerators, surfactants, fillers, dispersants, etc. The compounding ratio of these can be suitably selected according to each compound within the range which does not impair the effect of this disclosure.

其他聚合物可出於抑制電壓保持率的降低的目的、或達成液晶配向性的提升的目的而使用。其他聚合物的主骨架並無特別限定,較佳為選自由聚醯胺酸、聚醯胺酸酯以及聚醯亞胺所組成的群組中的至少一種。作為液晶配向劑中的聚合物成分的較佳態樣,可列舉以下的(i)及(ii)。 Other polymers can be used for the purpose of suppressing the decrease in the voltage holding ratio or for the purpose of improving the alignment of liquid crystals. The main skeleton of the other polymer is not particularly limited, and is preferably at least one selected from the group consisting of polyamic acid, polyamic acid ester, and polyimide. As a preferable aspect of the polymer component in a liquid crystal aligning agent, the following (i) and (ii) are mentioned.

(i)聚合物成分僅含有選自由聚醯胺酸、聚醯胺酸酯以及聚醯亞胺所組成的組群中的至少一種聚合物,且該聚合物具有熱脫離性基的態樣。 (i) The polymer component contains only at least one polymer selected from the group consisting of polyamic acid, polyamic acid ester, and polyimide, and the polymer has a thermally releasable group.

(ii)聚合物成分含有選自由聚醯胺酸、聚醯胺酸酯以及聚醯亞胺所組成的組群中的至少一種聚合物(Q)及聚有機矽氧烷,聚合物(Q)不具有熱脫離性基,且聚有機矽氧烷具有熱脫離性基的態樣。 (ii) The polymer component contains at least one polymer (Q) and polyorganosiloxane selected from the group consisting of polyamic acid, polyamic acid ester and polyimide, and polymer (Q) A form in which the polyorganosiloxane does not have a thermally releasable group and has a thermally releasable group.

於將其他聚合物調配於液晶配向劑中的情況下,相對於液晶配向劑中的總聚合物量,其調配比例較佳為1質量%~95質量%,更佳為5質量%~90質量%,進而佳為15質量%~80質量%。 When other polymers are prepared in the liquid crystal alignment agent, the blending ratio is preferably 1% by mass to 95% by mass, more preferably 5% by mass to 90% by mass relative to the total amount of polymers in the liquid crystal alignment agent. , more preferably 15% by mass to 80% by mass.

<溶劑> <Solvent>

本揭示的液晶配向劑是作為將化合物(P)及視需要使用的其 他成分於適當的溶媒中分散或溶解而成的液狀的組成物而製備。 The liquid crystal aligning agent of the present disclosure is a compound (P) and other compounds used as needed. It is prepared as a liquid composition in which other components are dispersed or dissolved in an appropriate solvent.

作為所使用的有機溶媒,例如可列舉:N-甲基-2-吡咯啶酮、N-乙基-2-吡咯啶酮、1,2-二甲基-2-咪唑啶酮、γ-丁內酯、γ-丁內醯胺、N,N-二甲基甲醯胺、N,N-二甲基乙醯胺、4-羥基-4-甲基-2-戊酮、乙二醇單甲醚、乳酸丁酯、乙酸丁酯、甲氧基丙酸甲酯、乙氧基丙酸乙酯、乙二醇甲醚、乙二醇乙醚、乙二醇-正丙醚、乙二醇-異丙醚、乙二醇-正丁醚(丁基賽珞蘇)、乙二醇二甲醚、乙二醇乙醚乙酸酯、二乙二醇二甲醚、二乙二醇二乙醚、二乙二醇單甲醚、二乙二醇單乙醚、二乙二醇單甲醚乙酸酯、二乙二醇單乙醚乙酸酯、二異丁基酮、丙酸異戊酯、異丁酸異戊酯、二異戊醚、碳酸伸乙酯、碳酸伸丙酯等。該些可單獨使用或者混合使用兩種以上。 As the organic solvent to be used, for example, N-methyl-2-pyrrolidone, N-ethyl-2-pyrrolidone, 1,2-dimethyl-2-imidazolidinone, γ-butane can be mentioned. Lactone, γ-butyrolactone, N,N-dimethylformamide, N,N-dimethylacetamide, 4-hydroxy-4-methyl-2-pentanone, ethylene glycol mono Methyl ether, butyl lactate, butyl acetate, methyl methoxypropionate, ethyl ethoxypropionate, ethylene glycol methyl ether, ethylene glycol ethyl ether, ethylene glycol-n-propyl ether, ethylene glycol- Isopropyl ether, ethylene glycol-n-butyl ether (butyl silosol), ethylene glycol dimethyl ether, ethylene glycol ethyl ether acetate, diethylene glycol dimethyl ether, diethylene glycol diethyl ether, diethylene glycol Ethylene glycol monomethyl ether, diethylene glycol monoethyl ether, diethylene glycol monomethyl ether acetate, diethylene glycol monoethyl ether acetate, diisobutyl ketone, isoamyl propionate, isobutyric acid Isoamyl ester, diisoamyl ether, ethylene carbonate, propyl carbonate, etc. These can be used alone or in combination of two or more.

關於液晶配向劑中的固體成分濃度(液晶配向劑的溶媒以外的成分的合計質量在液晶配向劑的總質量中所佔的比例),可考慮黏性、揮發性等而適當選擇,較佳為1質量%~10質量%的範圍。即,將液晶配向劑如後述般塗佈於基板表面,較佳為進行加熱,藉此而形成作為液晶配向膜的塗膜或者成為液晶配向膜的塗膜。此時,於固體成分濃度未滿1質量%的情況下,塗膜的膜厚變得過小,難以獲得良好的液晶配向膜。另一方面,於固體成分濃度超過10質量%的情況下,存在如下傾向:塗膜的膜厚變得過大,難以獲得良好的液晶配向膜,另外,液晶配向劑的黏性增大而塗佈性降低。 The solid content concentration in the liquid crystal aligning agent (the ratio of the total mass of the components other than the solvent of the liquid crystal aligning agent to the total mass of the liquid crystal aligning agent) can be appropriately selected in consideration of viscosity, volatility, and the like, and is preferably The range of 1 mass % to 10 mass %. That is, the liquid crystal alignment agent is applied on the surface of the substrate as described later, preferably by heating, to form a coating film as a liquid crystal alignment film or a coating film as a liquid crystal alignment film. At this time, when the solid content concentration is less than 1 mass %, the film thickness of the coating film becomes too small, and it becomes difficult to obtain a favorable liquid crystal alignment film. On the other hand, when the solid content concentration exceeds 10 mass %, there is a tendency that the film thickness of the coating film becomes too large, making it difficult to obtain a good liquid crystal aligning film, and the viscosity of the liquid crystal aligning agent increases and the coating Decreased sex.

相對於液晶配向劑中的固體成分(溶媒以外的成分)的合計100質量份,液晶配向劑中的化合物(P)的含有比例較佳為10質量份以上,更佳為20質量份以上,進而佳為30質量份以上。 The content ratio of the compound (P) in the liquid crystal aligning agent is preferably 10 parts by mass or more, more preferably 20 parts by mass or more, with respect to 100 parts by mass in total of the solid content (components other than the solvent) in the liquid crystal aligning agent, and further Preferably it is 30 mass parts or more.

《加熱步驟》 "Heating Steps"

塗佈液晶配向劑後,出於防止所塗佈的液晶配向劑的流掛及確保塗膜的均勻性等目的,較佳為實施預加熱(預烘烤)。預烘烤溫度較佳為30℃~150℃,更佳為50℃~120℃。預烘烤時間較佳為0.25分鐘~10分鐘,更佳為1分鐘~5分鐘。其後,將溶劑完全去除,視需要以將聚合物中存在的醯胺酸結構熱醯亞胺化的目的而實施煅燒(後烘烤)。此時的煅燒溫度(後烘烤溫度)較佳為80℃~300℃,後烘烤時間較佳為5分鐘~200分鐘。再者,第1基板及第2基板的後烘烤時間彼此可相同亦可不同。 After the liquid crystal aligning agent is applied, it is preferable to perform preheating (prebaking) for the purpose of preventing sagging of the applied liquid crystal aligning agent and ensuring the uniformity of the coating film. The prebaking temperature is preferably 30°C to 150°C, more preferably 50°C to 120°C. The pre-baking time is preferably 0.25 minutes to 10 minutes, more preferably 1 minute to 5 minutes. After that, the solvent is completely removed, and if necessary, calcination (post-baking) is performed for the purpose of thermal imidization of the amide acid structure present in the polymer. The calcination temperature (post-baking temperature) at this time is preferably 80° C. to 300° C., and the post-baking time is preferably 5 minutes to 200 minutes. In addition, the post-baking time of a 1st board|substrate and a 2nd board|substrate may mutually be the same or different.

當對塗佈有液晶配向劑的基板進行加熱時,實施對第1基板及第2基板中的一個基板,以較另一個基板更高的溫度進行加熱的高溫加熱處理。所述塗佈步驟中使用有含有化合物(P)的液晶配向劑,因而可根據加熱時的溫度條件,使第1基板及第2基板上所形成的液晶配向膜中的熱脫離性基的脫離程度彼此不同。藉此,對於第1基板及第2基板,可在基板間顯現出不同的預傾角。再者,所述加熱步驟中,亦可出於增大所述熱脫離性基的脫離程度的差的目的,將第1基板及第2基板中實施高溫加熱處理的基板的加熱時間設定得較另一者更長。 When the substrate to which the liquid crystal aligning agent is applied is heated, a high-temperature heat treatment in which one of the first substrate and the second substrate is heated at a higher temperature than the other substrate is performed. Since the liquid crystal aligning agent containing the compound (P) is used in the coating step, the thermally releasable groups in the liquid crystal aligning films formed on the first substrate and the second substrate can be released according to the temperature conditions during heating. The degrees differ from each other. As a result, the first substrate and the second substrate can exhibit different pretilt angles between the substrates. Furthermore, in the heating step, in order to increase the difference in the degree of detachment of the thermally detachable group, the heating time of the substrate to be subjected to the high-temperature heat treatment among the first substrate and the second substrate may be set longer. The other is longer.

關於第1基板及第2基板的加熱,對於第1基板及第2 基板中不實施高溫加熱處理的基板(例如第1基板),藉由化合物(P)所具有的熱脫離性基實質上不脫離的第1溫度條件來進行;對於實施高溫加熱處理的基板(例如第2基板),藉由較第1溫度條件更高的溫度、且化合物(P)所具有的熱脫離性基能夠脫離的第2溫度條件來進行。就充分增大一對基板間的預傾角的差的觀點而言,第2溫度條件下的加熱溫度較佳為較第1溫度條件高20℃以上的溫度。一對基板間的加熱溫度的差更佳為30℃以上,進而佳為40℃~100℃。 Regarding the heating of the first substrate and the second substrate, for the first substrate and the second substrate Among the substrates, the substrate (for example, the first substrate) that is not subjected to high-temperature heat treatment is subjected to the first temperature condition in which the thermally detachable group possessed by the compound (P) is not substantially released; for the substrate that is subjected to high-temperature heat treatment (for example, The second substrate) is carried out under the second temperature condition which is higher than the first temperature condition and in which the thermally detachable group of the compound (P) can be detached. From the viewpoint of sufficiently increasing the difference in the pretilt angle between the pair of substrates, the heating temperature under the second temperature condition is preferably a temperature higher than that of the first temperature condition by 20° C. or more. The difference in heating temperature between a pair of substrates is more preferably 30°C or more, and more preferably 40°C to 100°C.

具體而言,就基板的耐熱溫度或溶劑的沸點等觀點而言,第1溫度條件較佳為80℃~210℃,更佳為130℃~200℃,進而佳為150℃~180℃。第2溫度條件較佳為180℃~300℃,更佳為200℃~250℃,進而佳為200℃~230℃。 Specifically, the first temperature condition is preferably 80°C to 210°C, more preferably 130°C to 200°C, and still more preferably 150°C to 180°C from the viewpoint of the heat resistance temperature of the substrate and the boiling point of the solvent. The second temperature condition is preferably 180°C to 300°C, more preferably 200°C to 250°C, and still more preferably 200°C to 230°C.

使第1基板及第2基板的加熱溫度不同的態樣並無特別限定,例如可列舉以下方法。 The aspect which makes the heating temperature of a 1st board|substrate and a 2nd board|substrate different is not specifically limited, For example, the following method is mentioned.

[1]於藉由規定的預烘烤溫度進行預烘烤後,以較預烘烤溫度更高的溫度進行後烘烤,此時,對第1基板及第2基板中的一個基板於第1溫度條件下進行後烘烤,對另一個基板於第2溫度條件下進行後烘烤的方法。 [1] After pre-baking at a predetermined pre-baking temperature, post-baking is performed at a temperature higher than the pre-baking temperature, and at this time, one of the first substrate and the second substrate is A method of post-baking under the first temperature condition and post-baking the other substrate under the second temperature condition.

[2]於藉由規定的預烘烤溫度進行預烘烤後,對第1基板及第2基板,於較預烘烤溫度更高的第1溫度條件下、即第1基板及第2基板以相同的條件進行後烘烤,並且於後烘烤後,僅對第1基板及第2基板中的一個基板,於第2溫度條件下進一步進行加熱的 方法。 [2] After pre-baking at a predetermined pre-baking temperature, the first substrate and the second substrate are subjected to a first temperature condition higher than the pre-baking temperature, that is, the first substrate and the second substrate Post-baking is performed under the same conditions, and after the post-baking, only one of the first substrate and the second substrate is further heated under the second temperature condition method.

該些方法中,就製造液晶元件時可盡可能減少步驟數的方面而言,較佳為方法[1]。藉由此種加熱處理而形成的膜的膜厚較佳為0.001μm~1μm。 Among these methods, the method [1] is preferable in that the number of steps can be reduced as much as possible when manufacturing a liquid crystal element. The film thickness of the film formed by such heat treatment is preferably 0.001 μm to 1 μm.

<接觸步驟> <Contact step>

當製造液晶元件時,於後烘烤之後且構築液晶單元前,亦可更包括至少使經高溫加熱的基板中的液晶配向劑的塗佈面與水或包含有機溶媒的液體接觸的接觸步驟。藉由進行此種接觸步驟,可將藉由加熱處理而脫離的化合物自膜中去除,就所獲得的液晶元件中可抑制顯示不良的方面而言較佳。此處,作為有機溶媒,例如可列舉:甲醇、乙醇、1-丙醇、異丙醇、1-甲氧基-2-丙醇乙酸酯、丁基賽珞蘇、乳酸乙酯、丙酮、甲基乙基酮、甲基異丁基酮、環己酮。該些中,接觸步驟中所使用的溶媒較佳為水、異丙醇及該些的混合物。 When manufacturing a liquid crystal element, after post-baking and before constructing a liquid crystal cell, a contact step of at least contacting the coating surface of the liquid crystal aligning agent in the substrate heated at high temperature with water or a liquid containing an organic solvent may be further included. By carrying out such a contact process, the compound released by the heat treatment can be removed from the film, which is preferable in that display failure can be suppressed in the obtained liquid crystal element. Here, as the organic solvent, for example, methanol, ethanol, 1-propanol, isopropanol, 1-methoxy-2-propanol acetate, butyl cylosol, ethyl lactate, acetone, Methyl ethyl ketone, methyl isobutyl ketone, cyclohexanone. Among these, the solvent used in the contacting step is preferably water, isopropanol and a mixture of these.

作為液晶配向膜與溶媒的接觸方法,例如可列舉:噴霧(spray)處理、沖淋處理、浸漬處理、覆液處理等,但並不限定於該些。此時,為了使液晶配向膜與溶媒充分地接觸,亦有效的是:例如進行多次對基板上的液晶配向膜供給溶媒以及接觸這一系列處理、或者對溶媒進行攪拌或震盪。液晶配向膜與溶媒的接觸時間並無特別限定,例如為5秒~15分鐘。亦可出於將所接觸的液體自液晶配向膜去除的目的而於接觸步驟之後進一步進行塗膜的加熱處理。 As a contact method of a liquid crystal aligning film and a solvent, a spray process, a shower process, a dipping process, a liquid coating process, etc. are mentioned, for example, However, It is not limited to these. At this time, in order to make the liquid crystal alignment film and the solvent fully contact, it is also effective to, for example, perform a series of processes of supplying and contacting the liquid crystal alignment film on the substrate with the solvent multiple times, or stirring or shaking the solvent. The contact time between the liquid crystal alignment film and the solvent is not particularly limited, but is, for example, 5 seconds to 15 minutes. For the purpose of removing the contacted liquid from the liquid crystal alignment film, a heat treatment of the coating film may be further performed after the contacting step.

《單元構築步驟》 "Unit Construction Steps"

本步驟中,準備兩片形成有液晶配向膜的基板,並於對向配置的兩片基板間配置液晶,藉此而製造液晶單元。於製造液晶單元時,例如可列舉:以液晶配向膜對向的方式隔著間隙將兩片基板對向配置,並使用密封劑將兩片基板的周邊部貼合,於基板表面與密封劑所包圍的單元空隙內注入填充液晶從而形成液晶層,其後將注入孔密封的方法;利用液晶滴注(one drop filling,ODF)方式的方法等。作為密封劑,例如可使用含有硬化劑以及作為間隔物的氧化鋁球的環氧樹脂等。作為液晶,可列舉向列液晶以及層列液晶,其中較佳為向列液晶。 In this step, a liquid crystal cell is manufactured by preparing two substrates on which the liquid crystal alignment film is formed, and disposing liquid crystal between the two substrates arranged to face each other. When manufacturing a liquid crystal cell, for example, two substrates are arranged to face each other through a gap so that the liquid crystal alignment films face each other, and the peripheral parts of the two substrates are bonded together using a sealant, and the surface of the substrate is placed on the surface of the substrate with the sealant. A method of injecting and filling liquid crystal into the enclosed cell space to form a liquid crystal layer, and then sealing the injection hole; a method of using a liquid crystal drop filling (one drop filling, ODF) method, and the like. As the sealing agent, for example, epoxy resin containing a curing agent and alumina balls as spacers can be used. Examples of the liquid crystal include nematic liquid crystals and smectic liquid crystals, and among them, nematic liquid crystals are preferred.

於製造PSA方式的液晶元件時,於使液晶層中存在液晶性化合物及光聚合性化合物之後,且於液晶單元的構築後,以於一對基板所具有的導電膜間施加電壓的狀態對液晶單元進行光照射處理。作為液晶性化合物,可較佳地使用具有負介電各向異性的向列液晶。作為光聚合性化合物,例如可使用具有(甲基)丙烯醯基、乙烯基等能夠進行自由基聚合的官能基的化合物。相對於液晶性化合物及光聚合性化合物的合計量,光聚合性化合物的調配比例較佳為設為0.05質量%~0.8質量%。 When a liquid crystal element of the PSA system is produced, after the liquid crystal compound and the photopolymerizable compound are allowed to exist in the liquid crystal layer, and after the construction of the liquid crystal cell, a voltage is applied to the liquid crystal between the conductive films included in the pair of substrates. The unit is subjected to light irradiation treatment. As the liquid crystal compound, a nematic liquid crystal having negative dielectric anisotropy can be preferably used. As the photopolymerizable compound, for example, a compound having a functional group capable of radical polymerization, such as a (meth)acryloyl group and a vinyl group, can be used. It is preferable that the compounding ratio of a photopolymerizable compound shall be 0.05 mass % - 0.8 mass % with respect to the total amount of a liquid crystal compound and a photopolymerizable compound.

於PSA處理中,作為照射至液晶單元的光,例如可使用包含150nm~800nm的波長的光的紫外線或可見光線。其中,較佳為包含300nm~400nm的波長的光的紫外線。作為照射光的光源,例如使用低壓水銀燈、高壓水銀燈、金屬鹵化物燈、準分子 雷射器等。作為光的照射量,較佳為1J/m2~10J/m2,更佳為2J/m2~8J/m2In the PSA treatment, as the light to be irradiated to the liquid crystal cell, for example, ultraviolet rays or visible rays including light having a wavelength of 150 nm to 800 nm can be used. Among them, ultraviolet rays containing light having a wavelength of 300 nm to 400 nm are preferred. As a light source for irradiating light, for example, a low-pressure mercury lamp, a high-pressure mercury lamp, a metal halide lamp, an excimer laser or the like is used. The irradiation amount of light is preferably 1 J/m 2 to 10 J/m 2 , more preferably 2 J/m 2 to 8 J/m 2 .

於應用於曲面顯示器時,可藉由使以上所獲得的液晶單元彎曲而製造。此處,於藉由使液晶單元彎曲而製造曲面顯示器的情況下,有時會出現在一對基板中的一個基板與另一個基板之間產生預傾角的偏差,液晶的配向產生混亂的區域。該情況下,擔心在產生了配向混亂的區域在畫面中出現暗部,引起畫質下降。關於該方面,就本揭示的液晶元件而言,對於彎曲前的液晶單元,能夠在基板間產生足夠大的傾斜差。例如,預先將一對基板中的一個基板側的傾斜角設為大致垂直,將另一個基板側的傾斜角設為更小的角度。因此,即便於使液晶單元彎曲的情況下,亦能夠抑制基板間的預傾角的偏差。即,根據本揭示的製造方法,可充分產生基板間的傾斜差,藉此,即便在應用於曲面顯示器的情況下亦可充分確保畫質。另外,當在第1基板及第2基板上形成液晶配向膜時,使用相同的液晶配向劑即可,能夠以簡便的方法達成所述效果。 When applied to a curved display, it can be manufactured by bending the liquid crystal cell obtained above. Here, when a curved display is manufactured by bending a liquid crystal cell, a pretilt angle may vary between one substrate and the other of the pair of substrates, and a region in which the alignment of the liquid crystal is disturbed may occur. In this case, there is a fear that a dark part will appear in the screen in the area where the alignment disorder has occurred, and the image quality may be degraded. In this respect, in the liquid crystal element of the present disclosure, a sufficiently large difference in inclination can be generated between the substrates in the liquid crystal cell before bending. For example, the inclination angle of one substrate side of the pair of substrates is set to be substantially vertical, and the inclination angle of the other substrate side is set to a smaller angle in advance. Therefore, even when the liquid crystal cell is bent, the variation of the pretilt angle between the substrates can be suppressed. In other words, according to the manufacturing method of the present disclosure, the difference in inclination between the substrates can be sufficiently generated, whereby the image quality can be sufficiently ensured even when applied to a curved display. Moreover, when forming a liquid crystal alignment film on a 1st board|substrate and a 2nd board|substrate, it is sufficient to use the same liquid crystal aligning agent, and the said effect can be achieved by a simple method.

繼而,視需要於液晶單元的外側表面貼合偏光板,製作液晶元件。作為偏光板,可列舉利用乙酸纖維素保護膜夾持被稱為「H膜」的偏光膜而成的偏光板、或者包括H膜其本身的偏光板,所述H膜是一邊使聚乙烯醇延伸配向一邊吸收碘而成。 Next, a polarizing plate is bonded to the outer surface of a liquid crystal cell as needed, and a liquid crystal element is produced. Examples of the polarizing plate include a polarizing plate in which a polarizing film called "H film" is sandwiched between a cellulose acetate protective film, or a polarizing plate including an H film itself, which is made of polyvinyl alcohol while mixing polyvinyl alcohol. The extension alignment is formed by absorbing iodine on one side.

關於所獲得的液晶元件,較佳為由形成於第1基板上的液晶配向膜所誘發的液晶分子的預傾角、與由形成於第2基板上 的液晶配向膜所誘發的液晶分子的預傾角的差(以下亦稱為「傾斜差」)為0.8°以上。此時,於應用於曲面顯示器的情況下可充分獲得抑制畫質的降低的效果,因而較佳。就此種觀點而言,一對基板間的預傾角的差更佳為1.0°以上,進而佳為1.5°~5.0°,特佳為1.8°~4.0°。 The obtained liquid crystal element is preferably the pretilt angle of the liquid crystal molecules induced by the liquid crystal alignment film formed on the first substrate and the pretilt angle of the liquid crystal molecules formed on the second substrate. The difference in the pretilt angle of the liquid crystal molecules induced by the liquid crystal alignment film (hereinafter also referred to as "tilt difference") is 0.8° or more. In this case, when applied to a curved display, the effect of suppressing the degradation of the image quality can be sufficiently obtained, which is preferable. From such a viewpoint, the difference in the pretilt angle between the pair of substrates is more preferably 1.0° or more, more preferably 1.5° to 5.0°, and particularly preferably 1.8° to 4.0°.

本揭示的液晶元件可有效地應用於各種用途,例如可用於時鐘、便攜型遊戲機、文字處理機、筆記型個人電腦、汽車導航系統、攝錄像機、個人數位助理(Personal Digital Assistant,PDA)、數位相機、行動電話、智慧型手機、各種監視器、液晶電視、資訊顯示器等各種顯示裝置、或者調光膜等中。另外,本揭示的液晶元件亦可適用於相位差膜。 The liquid crystal element of the present disclosure can be effectively used in various applications such as clocks, portable game machines, word processors, notebook personal computers, car navigation systems, camcorders, personal digital assistants (PDAs), Digital cameras, mobile phones, smart phones, various monitors, LCD TVs, information displays and other display devices, or dimming films, etc. In addition, the liquid crystal element of the present disclosure can also be applied to a retardation film.

[實施例] [Example]

以下,藉由實施例進一步進行具體說明,但本發明並不限定於該些實施例。 Hereinafter, the present invention is not limited to these examples, although it will be described in more detail with reference to the examples.

本實施例中聚合物的重量平均分子量Mw、聚醯亞胺的醯亞胺化率、溶液黏度及環氧當量藉由以下的方法而測定。 The weight average molecular weight Mw of the polymer, the imidization rate of the polyimide, the solution viscosity, and the epoxy equivalent in this Example were measured by the following methods.

[重量平均分子量Mw] [Weight Average Molecular Weight Mw]

重量平均分子量Mw為藉由以下條件的凝膠滲透層析法所測定的聚苯乙烯換算值。 The weight average molecular weight Mw is a polystyrene conversion value measured by gel permeation chromatography under the following conditions.

管柱:東曹(Tosoh)(股)製造,TSKgel IGRCXLII String: Tosoh Co., Ltd., TSKgel IGRCXLII

溶劑:四氫呋喃 Solvent: Tetrahydrofuran

溫度:40℃ Temperature: 40℃

壓力:68kgf/cm2 Pressure: 68kgf/cm 2

[聚醯亞胺的醯亞胺化率] [Imidation rate of polyimide]

將聚醯亞胺的溶液投入至純水中,將所獲得沈澱於室溫下充分進行減壓乾燥後溶解於氘化二甲基亞碸中,將四甲基矽烷作為基準物質而於室溫下測定氫譜核磁共振(1H-nuclear magnetic resonance,1H-NMR)。根據所獲得的1H-NMR光譜,利用下述數式(1)所表示的式子來求出醯亞胺化率[%]。 The solution of polyimide was poured into pure water, the obtained precipitate was fully dried under reduced pressure at room temperature, and then dissolved in deuterated dimethyl sulfite, and measured at room temperature using tetramethylsilane as a reference material. Hydrogen spectrum nuclear magnetic resonance ( 1 H-nuclear magnetic resonance, 1 H-NMR). From the obtained 1 H-NMR spectrum, the imidization rate [%] was determined by the formula represented by the following numerical formula (1).

醯亞胺化率[%]=(1-A1/A2×α)×100…(1) Imidization rate [%]=(1-A 1 /A 2 ×α)×100…(1)

(數式(1)中,A1為在化學位移10ppm附近出現的源自NH基的質子的峰值面積,A2為源自其他質子的峰值面積,α為聚合物的前軀物(聚醯胺酸)中的其他質子相對於NH基的一個質子的個數比例) (In the formula (1), A 1 is the peak area of a proton derived from an NH group appearing in the vicinity of a chemical shift of 10 ppm, A 2 is a peak area derived from other protons, and α is a precursor of the polymer (polyamide The ratio of the number of other protons in the amine acid) to one proton of the NH group)

[聚合物溶液的溶液黏度] [Solution viscosity of polymer solution]

使用規定的溶媒,且使用E型旋轉黏度計,於25℃下對調整為聚合物濃度10質量%的溶液測定聚合物溶液的溶液黏度(mPa.s)。 Using a predetermined solvent, the solution viscosity (mPa·s) of the polymer solution was measured at 25°C using an E-type rotational viscometer for a solution adjusted to a polymer concentration of 10% by mass.

[環氧當量] [Epoxy equivalent]

依據JIS C2105的「鹽酸-甲基乙基酮法」來測定。 Measured according to the "hydrochloric acid-methyl ethyl ketone method" of JIS C2105.

以下例子中使用的主要化合物的結構與略稱如下。 The structures and abbreviations of the main compounds used in the following examples are as follows.

(四羧酸二酐) (tetracarboxylic dianhydride)

t-1:2,3,5-三羧基環戊基乙酸二酐 t-1: 2,3,5-tricarboxycyclopentylacetic dianhydride

t-2:1,2,3,4-環丁烷四羧酸二酐 t-2: 1,2,3,4-cyclobutanetetracarboxylic dianhydride

t-3:雙環[3,3,0]辛烷-2,4,6,8-四羧酸二酐 t-3: Bicyclo[3,3,0]octane-2,4,6,8-tetracarboxylic dianhydride

t-4:均苯四甲酸二酐 t-4: pyromellitic dianhydride

Figure 107112578-A0305-02-0051-31
Figure 107112578-A0305-02-0051-31

(特定二胺) (specific diamine)

DA-1~DA-5:下述式(DA-1)~式(DA-5)分別所表示的化合物 DA-1 to DA-5: compounds represented by the following formulae (DA-1) to (DA-5), respectively

Figure 107112578-A0305-02-0051-32
Figure 107112578-A0305-02-0051-32

(其他二胺) (other diamines)

d-1~d-13:下述式(d-1)~式(d-13)分別所表示的化合物 d-1 to d-13: compounds represented by the following formulae (d-1) to (d-13), respectively

Figure 107112578-A0305-02-0052-33
Figure 107112578-A0305-02-0052-33

(特定羧酸及其他羧酸) (Specific Carboxylic Acids and Other Carboxylic Acids)

特定羧酸CA-6~CA-10:下述式(CA-6)~式(CA-10)分別所表示的化合物 Specific carboxylic acids CA-6 to CA-10: compounds represented by the following formulae (CA-6) to (CA-10), respectively

其他羧酸c-1~c-2:下述式(c-1)及式(c-2)分別所表示的化合物 Other carboxylic acids c-1 to c-2: compounds represented by the following formulas (c-1) and (c-2), respectively

[化37]

Figure 107112578-A0305-02-0053-34
[Chemical 37]
Figure 107112578-A0305-02-0053-34

(矽烷化合物) (Silane compound)

Figure 107112578-A0305-02-0053-35
Figure 107112578-A0305-02-0053-35

<特定二胺的合成> <Synthesis of specific diamine>

[合成例1] [Synthesis Example 1]

依據下述流程來合成化合物(DA-1)。 Compound (DA-1) was synthesized according to the following scheme.

‧合成例1-1:化合物(1-1-1)的合成 ‧Synthesis Example 1-1: Synthesis of Compound (1-1-1)

[化39]

Figure 107112578-A0305-02-0054-36
[Chemical 39]
Figure 107112578-A0305-02-0054-36

於燒杯中加入甲醇50mL,一邊進行冰冷一邊加入硫酸5mL。於具備回流管的容量500mL的茄型燒瓶中加入化合物(1-1-a)16.50g、四氫呋喃150mL、以及之前製備的硫酸的甲醇溶液總量,進行14小時加熱回流。將反應溶液濃縮而使液量為一半左右,利用乙酸乙酯200mL加以稀釋後,利用飽和碳酸氫鈉水150mL洗滌1次,並利用蒸餾水150mL洗滌3次。合併水相,利用乙酸乙酯150mL萃取1次。合併有機相並利用硫酸鎂加以乾燥後,將溶媒蒸餾去除,使其乾固,獲得化合物(1-1-1)的粗產物17.17g。 50 mL of methanol was added to the beaker, and 5 mL of sulfuric acid was added while cooling with ice. 16.50 g of compound (1-1-a), 150 mL of tetrahydrofuran, and the total amount of the methanol solution of sulfuric acid prepared before were added to a 500 mL-capacity eggplant-shaped flask equipped with a reflux tube, followed by heating under reflux for 14 hours. The reaction solution was concentrated to about half of the liquid volume, diluted with 200 mL of ethyl acetate, washed once with 150 mL of saturated sodium bicarbonate water, and three times with 150 mL of distilled water. The aqueous phases were combined and extracted once with 150 mL of ethyl acetate. After the organic phases were combined and dried over magnesium sulfate, the solvent was distilled off and dried to obtain 17.17 g of a crude product of compound (1-1-1).

‧合成例1-2:化合物(1-1-2)的合成 ‧Synthesis Example 1-2: Synthesis of Compound (1-1-2)

Figure 107112578-A0305-02-0054-37
Figure 107112578-A0305-02-0054-37

於具備回流管、氮氣導入管及滴加漏斗的容量300mL的三口燒瓶中放入化合物(1-1-1)13.72g並進行氮氣置換,加入脫水四氫呋喃40mL使其溶解。於滴加漏斗中準備甲基氯化鎂(約1M四氫呋喃溶液)120mL,一邊進行冰冷一邊歷時約1.5小時滴加至化合物(1-1-1)的溶液中。滴加完畢後進行升溫,於70℃下 攪拌1小時。於容量2L的三角燒瓶中準備乙酸乙酯400mL及硫酸氫鈉的5重量%水溶液400mL,加入放置冷卻後的反應液並劇烈地進行攪拌。將水層去除後,進而利用蒸餾水300mL對有機相進行3次洗滌,利用硫酸鎂加以乾燥後,將溶媒蒸餾去除,使其乾固,獲得化合物(1-1-2)的粗產物13.05g。 13.72 g of compound (1-1-1) was placed in a three-necked flask with a capacity of 300 mL provided with a reflux tube, a nitrogen gas introduction tube, and a dropping funnel, followed by nitrogen substitution, and 40 mL of dehydrated tetrahydrofuran was added and dissolved. 120 mL of methylmagnesium chloride (about 1 M tetrahydrofuran solution) was prepared in a dropping funnel, and was added dropwise to the solution of compound (1-1-1) over about 1.5 hours while cooling with ice. After the dropwise addition, the temperature was increased, and the temperature was 70 °C. Stir for 1 hour. In a 2-L conical flask, 400 mL of ethyl acetate and 400 mL of a 5 wt % aqueous solution of sodium hydrogen sulfate were prepared, and the reaction solution after being left to cool was added and vigorously stirred. After removing the aqueous layer, the organic phase was further washed three times with 300 mL of distilled water, and dried with magnesium sulfate, and then the solvent was distilled off and dried to obtain 13.05 g of a crude product of compound (1-1-2).

‧合成例1-3:化合物(1-1-3)的合成 ‧Synthesis Example 1-3: Synthesis of Compound (1-1-3)

Figure 107112578-A0305-02-0055-38
Figure 107112578-A0305-02-0055-38

於具備氮氣導入管及滴加漏斗的容量300mL的三口燒瓶中放入化合物(1-1-2)12.53g、氫化鈉(60重量%、分散於液態石蠟中)1.92g並對系統中進行氮氣置換,加入脫水四氫呋喃40mL使其溶解。於滴加漏斗中準備使3,5-二硝基苯甲醯氯11.03g溶解於脫水四氫呋喃20mL中所得的液體,一邊進行冰冷一邊歷時約1小時進行滴加。滴加完畢後,於室溫下攪拌2小時。將沈澱過濾分離後,將濾液濃縮至一半以下的液量。於其中加入乙酸乙酯150mL加以稀釋後,利用蒸餾水200mL洗滌3次。利用硫酸鎂使有機相乾燥後,將溶媒蒸餾去除。使所獲得的固體溶解於少量的乙酸乙酯中,並利用大量的己烷使其再沈澱。收集沈澱並 使其乾燥,獲得化合物(1-1-3)的粗產物20.06g。 12.53 g of compound (1-1-2) and 1.92 g of sodium hydride (60% by weight, dispersed in liquid paraffin) were put into a three-necked flask with a nitrogen introduction tube and a dropping funnel with a capacity of 300 mL, and the system was subjected to nitrogen gas. Substitution, 40 mL of dehydrated tetrahydrofuran was added and dissolved. A liquid obtained by dissolving 11.03 g of 3,5-dinitrobenzyl chloride in 20 mL of dehydrated tetrahydrofuran was prepared in a dropping funnel, and it was added dropwise over about 1 hour while cooling with ice. After the dropwise addition, the mixture was stirred at room temperature for 2 hours. After the precipitate was separated by filtration, the filtrate was concentrated to less than half of the liquid volume. To this, 150 mL of ethyl acetate was added and diluted, and then washed three times with 200 mL of distilled water. After drying the organic phase with magnesium sulfate, the solvent was distilled off. The obtained solid was dissolved in a small amount of ethyl acetate and reprecipitated with a large amount of hexane. collect sediment and It was dried to obtain 20.06 g of a crude product of compound (1-1-3).

‧合成例1-4:化合物(DA-1)的合成 ‧Synthesis Example 1-4: Synthesis of Compound (DA-1)

Figure 107112578-A0305-02-0056-39
Figure 107112578-A0305-02-0056-39

於具備氮氣導入管及滴加漏斗的容量1000mL的三口燒瓶中加入化合物(1-1-3)19.14g、鋅(粉末)23.04g、氯化銨7.42g,並對系統中進行氮氣置換。於其中加入四氫呋喃200mL、乙醇100mL進行攪拌。一邊對溶液進行冰冷一邊滴加蒸餾水25mL後,於室溫下攪拌4小時。將不溶物過濾分離,加入乙酸乙酯500mL後,利用蒸餾水300mL洗滌3次。利用硫酸鎂使有機層乾燥後,將溶媒蒸餾去除,使其乾固,藉此而獲得化合物(DA-1)的粗產物10.71g。於後續的聚合反應中使用藉由再結晶而純化所得者。 19.14 g of compound (1-1-3), 23.04 g of zinc (powder), and 7.42 g of ammonium chloride were added to a three-necked flask having a nitrogen introduction tube and a dropping funnel with a capacity of 1000 mL, and the system was replaced with nitrogen. To this, 200 mL of tetrahydrofuran and 100 mL of ethanol were added and stirred. While cooling the solution with ice, 25 mL of distilled water was added dropwise, followed by stirring at room temperature for 4 hours. The insoluble matter was separated by filtration, 500 mL of ethyl acetate was added, and the mixture was washed three times with 300 mL of distilled water. After drying the organic layer with magnesium sulfate, 10.71 g of a crude product of compound (DA-1) was obtained by distilling off the solvent and making it dry. The resultant purified by recrystallization was used in the subsequent polymerization reaction.

[合成例2] [Synthesis Example 2]

依據下述流程來合成化合物(DA-2)。 Compound (DA-2) was synthesized according to the following scheme.

‧合成例2-1:化合物(1-2-1)的合成 ‧Synthesis Example 2-1: Synthesis of Compound (1-2-1)

[化43]

Figure 107112578-A0305-02-0057-40
[Chemical 43]
Figure 107112578-A0305-02-0057-40

於具備回流管及滴加漏斗的容量200mL的茄型燒瓶中放入化合物(1-2-a)8.61g、蒸餾水35mL、氯化銅(I)0.99g、乙醛12mL,加熱至70℃。使用滴加漏斗,歷時30分鐘滴加30%過氧化氫水16mL。滴加完畢後,於90℃下攪拌2小時。放置冷卻後,於利用飽和硫代硫酸鈉水溶液對過氧化物進行處理後,加入飽和碳酸氫鈉水直至反應液的pH成為11。利用乙酸乙酯30mL對反應液進行2次萃取,合併有機層並利用硫酸鎂加以乾燥後,將溶媒蒸餾去除,使其乾固,獲得化合物(1-2-1)的粗產物8.30g。 Compound (1-2-a) 8.61 g, distilled water 35 mL, copper chloride (I) 0.99 g, and acetaldehyde 12 mL were placed in a 200 mL eggplant-shaped flask equipped with a reflux tube and a dropping funnel, and heated to 70°C. Using a dropping funnel, 16 mL of 30% hydrogen peroxide water was added dropwise over 30 minutes. After the dropwise addition, the mixture was stirred at 90°C for 2 hours. After standing to cool, the peroxide was treated with a saturated aqueous sodium thiosulfate solution, and then saturated aqueous sodium bicarbonate was added until the pH of the reaction solution became 11. The reaction solution was extracted twice with 30 mL of ethyl acetate, and the organic layers were combined and dried over magnesium sulfate, and then the solvent was distilled off and dried to obtain 8.30 g of a crude product of compound (1-2-1).

‧合成例2-2:化合物(1-2-2)的合成 ‧Synthesis Example 2-2: Synthesis of Compound (1-2-2)

Figure 107112578-A0305-02-0057-42
Figure 107112578-A0305-02-0057-42

於具備回流管、氮氣導入管及滴加漏斗的容量300mL的三口燒瓶中放入化合物(1-2-1)8.06g並進行氮氣置換,加入脫水四氫呋喃25mL使其溶解。於滴加漏斗中準備乙基溴化鎂(約1M四氫呋喃溶液)100mL,一邊進行冰冷一邊歷時1小時進行滴加。滴加完畢後,於室溫下攪拌1小時。於容量2L的三角燒 瓶中準備乙酸乙酯200mL與硫酸氫鈉的5質量%水溶液200mL,加入放置冷卻後的反應液並劇烈地進行攪拌。將水層去除後,進而利用蒸餾水150mL對有機相進行3次洗滌,利用硫酸鎂加以乾燥後,將溶媒蒸餾去除,使其乾固,獲得化合物(1-2-2)的粗產物8.53g。 8.06 g of compound (1-2-1) was placed in a three-necked flask with a capacity of 300 mL provided with a reflux tube, a nitrogen gas introduction tube, and a dropping funnel, followed by nitrogen replacement, and 25 mL of dehydrated tetrahydrofuran was added and dissolved. 100 mL of ethylmagnesium bromide (about 1 M tetrahydrofuran solution) was prepared in a dropping funnel, and it was dripped over 1 hour while cooling with ice. After the dropwise addition, the mixture was stirred at room temperature for 1 hour. 2L triangular roast In the bottle, 200 mL of ethyl acetate and 200 mL of a 5 mass % aqueous solution of sodium hydrogen sulfate were prepared, and the reaction solution after being left to cool was added and vigorously stirred. After removing the aqueous layer, the organic phase was further washed three times with 150 mL of distilled water, and dried with magnesium sulfate, and then the solvent was distilled off and dried to obtain 8.53 g of a crude product of compound (1-2-2).

‧合成例2-3:化合物(DA-2)的合成 ‧Synthesis Example 2-3: Synthesis of Compound (DA-2)

Figure 107112578-A0305-02-0058-43
Figure 107112578-A0305-02-0058-43

將原料變更為化合物(1-2-2),除此以外,以與所述合成例1-3相同的方法合成化合物(1-2-3)。使用所獲得的二硝基體,以與合成例1-4相同的方法合成化合物(DA-2)。 Compound (1-2-3) was synthesized in the same manner as in Synthesis Example 1-3, except that the starting material was changed to Compound (1-2-2). Using the obtained dinitro compound, compound (DA-2) was synthesized in the same manner as in Synthesis Example 1-4.

[合成例3] [Synthesis Example 3]

起始原料使用4-苯甲醯基苯甲酸,藉由進行與合成例1-1~合成例1-4相同的反應而合成化合物(DA-3)。再者,4-苯甲醯基苯甲酸具有酮結構,因而第一階段的產物為二甲基縮酮體,但藉由第二階段的利用酸所進行的後處理而得到脫保護從而恢復為酮 結構。 The compound (DA-3) was synthesized by performing the same reaction as in Synthesis Example 1-1 to Synthesis Example 1-4 using 4-benzylbenzoic acid as a starting material. Furthermore, 4-benzylbenzoic acid has a ketone structure, so the product in the first stage is a dimethyl ketal, but it is deprotected by post-treatment with an acid in the second stage and restored to ketone structure.

Figure 107112578-A0305-02-0059-44
Figure 107112578-A0305-02-0059-44

[合成例4] [Synthesis Example 4]

依據下述流程來合成化合物(DA-4)。 Compound (DA-4) was synthesized according to the following scheme.

‧合成例4-1:化合物(1-4-1)的合成 ‧Synthesis Example 4-1: Synthesis of Compound (1-4-1)

Figure 107112578-A0305-02-0059-45
Figure 107112578-A0305-02-0059-45

於具備回流管的容量1000mL的茄型燒瓶中放入豔佳固(Irgacure)2959(巴斯夫(BASF)公司製造,苯烷基酮系光聚合起始劑)11.26g、二鉻酸吡啶鎓(pyridinium dichromate,PDC)65.92g、二甲基甲醯胺150mL,於室溫下攪拌18小時。利用乙 酸乙酯500mL將反應液稀釋,利用5%氫氧化鈉水溶液300mL進行萃取。利用乙酸乙酯100mL對水層進行洗滌而將有機層去除後,於水層中加入鹽酸,將pH調整為3。利用乙酸乙酯200mL萃取2次。合併有機層並利用硫酸鎂加以乾燥後,將溶媒蒸餾去除,使其乾固,藉此而獲得化合物(1-4-1)的粗產物9.39g。 11.26 g of Irgacure 2959 (manufactured by BASF, phenalkyl ketone-based photopolymerization initiator), pyridinium dichromate (pyridinium dichromate) were placed in a 1000 mL eggplant-shaped flask equipped with a reflux tube dichromate, PDC) 65.92 g, dimethylformamide 150 mL, and stirred at room temperature for 18 hours. use B The reaction solution was diluted with 500 mL of ethyl acetate, and extracted with 300 mL of a 5% aqueous sodium hydroxide solution. After the aqueous layer was washed with 100 mL of ethyl acetate and the organic layer was removed, hydrochloric acid was added to the aqueous layer to adjust pH to 3. Extracted twice with 200 mL of ethyl acetate. After the organic layers were combined and dried over magnesium sulfate, the solvent was distilled off and dried to obtain 9.39 g of a crude product of compound (1-4-1).

‧合成例4-2:化合物(DA-4)的合成 ‧Synthesis Example 4-2: Synthesis of Compound (DA-4)

Figure 107112578-A0305-02-0060-46
Figure 107112578-A0305-02-0060-46

原料使用化合物(1-4-1)並進行與合成例1-1相同的反應,藉此而合成甲基酯體。使氫化鈉作用於所獲得的酯體後,與碘甲烷(methyl iodide)進行反應,藉此而使三級醇部位為甲基醚。對所獲得的化合物進行與合成例1-2~合成例1-4相同的反應,藉此而合成化合物(DA-4)。 Using compound (1-4-1) as a raw material, and performing the same reaction as in Synthesis Example 1-1, a methyl ester body was synthesized. After making sodium hydride act on the obtained ester body, it reacts with methyl iodide (methyl iodide), and the tertiary alcohol part is made into a methyl ether. Compound (DA-4) was synthesized by subjecting the obtained compound to the same reaction as in Synthesis Example 1-2 to Synthesis Example 1-4.

<特定羧酸的合成> <Synthesis of specific carboxylic acid>

[合成例5] [Synthesis Example 5]

依據下述流程來合成化合物(CA-6)。 Compound (CA-6) was synthesized according to the following scheme.

‧合成例5-1:化合物(6-1-1)的合成 ‧Synthesis Example 5-1: Synthesis of Compound (6-1-1)

Figure 107112578-A0305-02-0061-47
Figure 107112578-A0305-02-0061-47

於合成例1-3中,將3,5-二硝基苯甲醯氯變更為對(氯羰基)苯甲酸甲酯,除此以外,藉由與合成例1-3相同的方法而合成化合物(6-1-1)。 A compound was synthesized in the same manner as in Synthesis Example 1-3, except that 3,5-dinitrobenzyl chloride was changed to methyl p-(chlorocarbonyl)benzoate in Synthesis Example 1-3. (6-1-1).

‧合成例5-2:化合物(CA-6)的合成 ‧Synthesis Example 5-2: Synthesis of Compound (CA-6)

Figure 107112578-A0305-02-0061-48
Figure 107112578-A0305-02-0061-48

於具備回流管的容量100mL的茄型燒瓶中放入化合物(6-1-1)7.39g、氫氧化鋰一水合物1.38g、四氫呋喃40mL、甲醇10mL、蒸餾水10mL,於室溫下攪拌2小時。利用乙酸乙酯200mL將反應液稀釋,利用5%硫酸氫鈉水溶液100mL進行中和 後,利用蒸餾水100mL對有機層進行3次洗滌。利用硫酸鎂使有機層乾燥後,將溶媒蒸餾去除,使其乾固。於所獲得的固體中加入乙酸乙酯100mL並進行攪拌,將不溶物過濾分離後,加入己烷進行再結晶,藉此而獲得化合物(CA-6)3.02g。 In a 100 mL eggplant-shaped flask equipped with a reflux tube, 7.39 g of compound (6-1-1), 1.38 g of lithium hydroxide monohydrate, 40 mL of tetrahydrofuran, 10 mL of methanol, and 10 mL of distilled water were placed, and stirred at room temperature for 2 hours. . The reaction solution was diluted with 200 mL of ethyl acetate, and neutralized with 100 mL of 5% aqueous sodium bisulfate solution. Then, the organic layer was washed three times with 100 mL of distilled water. After drying the organic layer with magnesium sulfate, the solvent was distilled off, and it was made to dry. To the obtained solid, 100 mL of ethyl acetate was added and stirred, and the insoluble matter was separated by filtration, and then hexane was added for recrystallization to obtain 3.02 g of compound (CA-6).

[合成例6] [Synthesis Example 6]

對合成例2~合成例4中合成的三種中間體分別進行與合成例5相同的反應,藉此而合成化合物(CA-7)~化合物(CA-9)。 Compound (CA-7) to compound (CA-9) were synthesized by performing the same reaction as in Synthesis Example 5 with respect to the three intermediates synthesized in Synthesis Example 2 to Synthesis Example 4, respectively.

Figure 107112578-A0305-02-0062-49
Figure 107112578-A0305-02-0062-49

Figure 107112578-A0305-02-0062-50
Figure 107112578-A0305-02-0062-50

Figure 107112578-A0305-02-0062-51
Figure 107112578-A0305-02-0062-51

<聚醯胺酸及聚醯亞胺的合成> <Synthesis of polyimide and polyimide>

[合成例7] [Synthesis Example 7]

將作為四羧酸二酐的2,3,5-三羧基環戊基乙酸二酐100莫耳份、以及作為二胺的膽甾烷氧基-2,4-二胺基苯20莫耳份、4,4'-[4,4'-丙烷-1,3-二基雙(哌啶-1,4-二基)]二苯胺10莫耳份、對苯二胺10莫耳份及4,4'-二胺基二苯基醚30莫耳份溶解於N-甲基-2-吡咯啶酮(N-Methyl-2-Pyrrolidone,NMP)中,於室溫下反應4小時,獲得含有10質量%的聚醯胺酸(將其設為聚合物(P-1))的溶液。該聚醯胺酸溶液的溶液黏度為43.8mPa.s。 100 mol parts of 2,3,5-tricarboxycyclopentylacetic acid dianhydride as tetracarboxylic dianhydride and 20 mol parts of cholestanoloxy-2,4-diaminobenzene as diamine , 10 mol parts of 4,4'-[4,4'-propane-1,3-diylbis(piperidine-1,4-diyl)] diphenylamine, 10 mol parts of p-phenylenediamine and 4 , 30 mol parts of ,4'-diaminodiphenyl ether was dissolved in N-Methyl-2-Pyrrolidone (N-Methyl-2-Pyrrolidone, NMP), and reacted at room temperature for 4 hours to obtain a solution containing A 10 mass % solution of polyamic acid (this is referred to as polymer (P-1)). The solution viscosity of the polyamide acid solution is 43.8mPa. s.

[合成例8] [Synthesis Example 8]

將作為四羧酸二酐的2,3,5-三羧基環戊基乙酸二酐50莫耳份、及1,2,3,4-環丁烷四羧酸二酐50莫耳份、以及作為二胺的膽甾烷氧基-2,4-二胺基苯10莫耳份、4,4'-[4,4'-丙烷-1,3-二基雙(哌啶-1,4-二基)]二苯胺10莫耳份、4,4'-二胺基二苯基醚30莫耳份、化合物(d-10)10莫耳份及2,2'-三氟甲基-4,4'-二胺基聯苯20莫耳份溶解於N-甲基-2-吡咯啶酮(NMP)中,於室溫下反應4小時,獲得含有10質量%的聚醯胺酸的溶液。 50 mol parts of 2,3,5-tricarboxycyclopentylacetic acid dianhydride as tetracarboxylic dianhydride, 50 mol parts of 1,2,3,4-cyclobutanetetracarboxylic dianhydride, and 10 mol parts of cholestanoloxy-2,4-diaminobenzene as diamine, 4,4'-[4,4'-propane-1,3-diylbis(piperidine-1,4 -Diyl)] 10 mol parts of diphenylamine, 30 mol parts of 4,4'-diaminodiphenyl ether, 10 mol parts of compound (d-10) and 2,2'-trifluoromethyl- 20 mol parts of 4,4'-diaminobiphenyl was dissolved in N-methyl-2-pyrrolidone (NMP) and reacted at room temperature for 4 hours to obtain 10% by mass of polyamic acid. solution.

繼而,於所獲得的聚醯胺酸溶液中追加NMP,製成聚醯胺酸濃度為7重量%的溶液,並逐次添加相對於所使用的四羧酸二酐的總量而分別為1.3倍莫耳的吡啶及乙酸酐,於110℃下進行4小時脫水閉環反應。於脫水閉環反應後,藉由將系統內的溶媒利用新的NMP進行溶媒置換,獲得含有16質量%的醯亞胺化率約為50% 的聚醯亞胺(將其設為「聚合物(P-2)」)的溶液。 Next, NMP was added to the obtained polyamic acid solution to prepare a solution having a polyamic acid concentration of 7 wt %, and were added successively by 1.3 times the total amount of the tetracarboxylic dianhydride used. Molar pyridine and acetic anhydride were dehydrated and ring-closed at 110°C for 4 hours. After the dehydration ring-closure reaction, the solvent in the system was replaced with new NMP to obtain an imidization rate of about 50% containing 16% by mass. of polyimide (referred to as "polymer (P-2)").

[合成例10、合成例11、合成例14] [Synthesis Example 10, Synthesis Example 11, Synthesis Example 14]

將四羧酸二酐及二胺的種類及使用量設為如下述表1所記載般,除該方面以外,以與合成例7相同的方式分別合成聚醯胺酸(聚合物(P-4)、聚合物(P-5)、聚合物(Q-3))。 Except that the kind and usage amount of tetracarboxylic dianhydride and diamine were as described in the following Table 1, in the same manner as in Synthesis Example 7, respectively, polyamic acid (polymer (P-4) was synthesized in the same manner as in Synthesis Example 7. ), polymer (P-5), polymer (Q-3)).

[合成例9、合成例12、合成例13、合成例15] [Synthesis Example 9, Synthesis Example 12, Synthesis Example 13, Synthesis Example 15]

將四羧酸二酐及二胺的種類及使用量變更為如下述表1所記載般,除該方面以外,以與合成例8相同的方式分別合成聚醯亞胺(聚合物(P-3)、聚合物(Q-1)、聚合物(Q-2)、聚合物(Q-4))。 Except for changing the kind and usage amount of tetracarboxylic dianhydride and diamine as described in the following Table 1, in the same manner as in Synthesis Example 8, respectively, polyimide (polymer (P-3) was synthesized. ), polymer (Q-1), polymer (Q-2), polymer (Q-4)).

Figure 107112578-A0305-02-0064-52
Figure 107112578-A0305-02-0064-52

<聚醯胺酸酯的合成> <Synthesis of Polyamide>

[合成例16] [Synthesis Example 16]

將3,5-二硝基苯甲醯氯變更為2,3,5-三羧基環戊基乙酸二酐,除此以外,藉由與所述合成例1-3相同的方法而合成四羧酸二酯(將其設為「化合物(AE-1)」)。 Tetracarboxylate was synthesized in the same manner as in Synthesis Example 1-3, except that 3,5-dinitrobenzyl chloride was changed to 2,3,5-tricarboxycyclopentylacetic dianhydride Acid diester (this is referred to as "compound (AE-1)").

Figure 107112578-A0305-02-0065-53
Figure 107112578-A0305-02-0065-53

繼而,將化合物(AE-1)20莫耳份、2,3,5-三羧基環戊基乙酸二酐40莫耳份、以及2,3,5-三羧基環戊基乙酸二酐與乙醇的反應產物(將其設為「化合物(es-1)」)40莫耳份溶解於N-甲基-2-吡咯啶酮(NMP)中後,於其中加入作為二胺的膽甾烷氧基-2,4-二胺基苯10莫耳份、4,4'-[4,4'-丙烷-1,3-二基雙(哌啶-1,4-二基)]二苯胺10莫耳份、對苯二胺40莫耳份及4,4'-二胺基二苯基醚40莫耳份,使其溶解。於該溶液中添加氯化4-(4,6-二甲氧基-1,3,5-三嗪-2-基)-4-甲基嗎啉(DMT-MM、15±2質量%水合物)300莫耳份,於室溫下進行4小時反應,獲得含有聚合物(E-1)作為聚醯胺酸酯的溶液。對於聚合物溶液,於20℃下靜置3日,結果並未凝膠化,保存穩定性良好。 Next, 20 mol parts of compound (AE-1), 40 mol parts of 2,3,5-tricarboxycyclopentylacetic acid dianhydride, 2,3,5-tricarboxycyclopentylacetic acid dianhydride and ethanol were mixed 40 mol parts of the reaction product (referred to as "compound (es-1)") was dissolved in N-methyl-2-pyrrolidone (NMP), and cholestanol as a diamine was added thereto. Alkyl-2,4-diaminobenzene 10 mol parts, 4,4'-[4,4'-propane-1,3-diylbis(piperidine-1,4-diyl)]diphenylamine 10 40 mol parts of p-phenylenediamine, and 40 mol parts of 4,4'-diaminodiphenyl ether were dissolved. To this solution was added 4-(4,6-dimethoxy-1,3,5-triazin-2-yl)-4-methylmorpholine chloride (DMT-MM, 15±2 mass % hydrated 300 mol parts of compound), and reacted at room temperature for 4 hours to obtain a solution containing the polymer (E-1) as a polyamic acid ester. When the polymer solution was left to stand at 20°C for 3 days, it did not gel, and the storage stability was good.

[合成例17] [Synthesis Example 17]

將四羧酸衍生物及二胺的種類及使用量設為如下述表2所記載般,除此以外,以與合成例16相同的方式獲得含有聚合物(F-1)的溶液。 A polymer (F-1)-containing solution was obtained in the same manner as in Synthesis Example 16, except that the types and usage amounts of the tetracarboxylic acid derivative and the diamine were as described in Table 2 below.

Figure 107112578-A0305-02-0066-54
Figure 107112578-A0305-02-0066-54

<聚有機矽氧烷的合成> <Synthesis of polyorganosiloxane>

[合成例18] [Synthesis Example 18]

於具備攪拌機、溫度計、滴加漏斗及回流冷卻管的反應容器中,添加作為水解性矽烷化合物的2-(3,4-環氧環己基)乙基三甲氧基矽烷(所述式(sa-1)所表示的化合物)100.0g、作為溶媒的甲基異丁基酮500g、以及作為觸媒的三乙胺10.0g,於室溫下混合。於其中,自滴加漏斗歷時30分鐘滴加去離子水100g後,一邊在回流下進行混合一邊於80℃下進行6小時的反應。反應結束後,提取出有機層,藉由0.2質量%的硝酸銨水溶液將其洗滌至洗滌後的水成為中性為止後,於減壓下蒸餾去除溶媒及水,藉此而以黏稠透明液體的形式獲得具有環氧基的聚有機矽氧烷。測定該含環氧基的聚有機矽氧烷的環氧當量,結果為186g/當量。 2-(3,4-epoxycyclohexyl)ethyltrimethoxysilane (the formula (sa- 1) 100.0 g of the compound represented by 1), 500 g of methyl isobutyl ketone as a solvent, and 10.0 g of triethylamine as a catalyst were mixed at room temperature. In this, after adding 100 g of deionized water dropwise over 30 minutes from the dropping funnel, the reaction was performed at 80° C. for 6 hours while mixing under reflux. After the completion of the reaction, the organic layer was extracted and washed with a 0.2 mass % ammonium nitrate aqueous solution until the washed water became neutral, and then the solvent and water were distilled off under reduced pressure to obtain a viscous transparent liquid. In the form of polyorganosiloxane with epoxy groups. The epoxy equivalent of this epoxy group-containing polyorganosiloxane was measured and found to be 186 g/equivalent.

繼而,於200mL的三口燒瓶中,添加以上所獲得的含環氧基的聚有機矽氧烷10.0g、作為溶媒的甲基異丁基酮30.28g、作為羧酸的4-(4-戊基環己基)苯甲酸3.10g(相對於含環氧基的聚有機矽氧烷所具有的矽原子而相當於20莫耳%)、化合物(CA-10)2.51g(相對於含環氧基的聚有機矽氧烷所具有的矽原子而相當於 20莫耳%)、以及作為觸媒的尤卡特(UCAT)18X(商品名,桑艾譜羅(San-Apro)(股)製造)0.10g,於100℃、48小時的攪拌下進行反應。反應結束後,於反應混合物中加入乙酸乙酯,將所獲得的溶液水洗3次,並將溶劑蒸餾去除,藉此而獲得具有預傾角顯現性基的聚有機矽氧烷(S-1)13.6g。所獲得的聚合物的重量平均分子量Mw為1107。 Next, in a 200 mL three-necked flask, 10.0 g of the epoxy-group-containing polyorganosiloxane obtained above, 30.28 g of methyl isobutyl ketone as a solvent, and 4-(4-pentyl as a carboxylic acid) were added. Cyclohexyl)benzoic acid 3.10 g (equivalent to 20 mol % with respect to the silicon atom of epoxy-containing polyorganosiloxane), compound (CA-10) 2.51 g (relative to epoxy-containing polyorganosiloxane) The silicon atom of polyorganosiloxane is equivalent to 20 mol%) and 0.10 g of UCAT 18X (trade name, manufactured by San-Apro Co., Ltd.) as a catalyst, and reacted at 100° C. under stirring for 48 hours. After the completion of the reaction, ethyl acetate was added to the reaction mixture, the obtained solution was washed three times with water, and the solvent was distilled off to obtain a polyorganosiloxane (S-1) 13.6 having a pretilt angle developing group. g. The weight average molecular weight Mw of the obtained polymer was 1107.

[合成例19~合成例23] [Synthesis Example 19 to Synthesis Example 23]

將羧酸的種類及使用量設為如下述表3所記載般,除此以外,以與合成例18相同的方式獲得聚合物(S-2)~聚合物(S-5)、聚合物(R-1)。再者,表3中,單體的數值表示相對於含環氧基的聚有機矽氧烷的聚合中所使用的單體的合計而言的使用比例(莫耳%)。羧酸的數值表示相對於含環氧基的聚有機矽氧烷所具有的矽原子而言的羧酸的使用比例(莫耳%)。 Except having made the kind and usage amount of carboxylic acid as described in following Table 3, it carried out similarly to Synthesis Example 18 to obtain polymer (S-2) - polymer (S-5), polymer ( R-1). In addition, in Table 3, the numerical value of a monomer shows the usage ratio (mol%) with respect to the sum total of the monomers used for superposition|polymerization of epoxy-group-containing polyorganosiloxane. The numerical value of the carboxylic acid represents the usage ratio (mol %) of the carboxylic acid with respect to the silicon atom which the epoxy group-containing polyorganosiloxane has.

Figure 107112578-A0305-02-0067-55
Figure 107112578-A0305-02-0067-55

[實施例1] [Example 1]

(1)液晶配向劑的製備 (1) Preparation of liquid crystal alignment agent

使用合成例14中獲得的聚合物(Q-3)的溶液及合成例18中獲得的聚合物(S-1),以調配比率為聚合物(Q-3):聚合物(S-1)=90:10(固體成分換算質量比)的方式調配聚合物(Q-3)與聚合物(S-1),並且利用NMP及丁基賽珞蘇(BC)進行稀釋,獲得固體成分濃度為4.0質量%、溶劑組成比為NMP:BC=45:55(質量比)的溶液。利用孔徑為0.2μm的過濾器對該溶液進行過濾,藉此而製備液晶配向劑(W-1)。 Using the solution of the polymer (Q-3) obtained in Synthesis Example 14 and the polymer (S-1) obtained in Synthesis Example 18, the compounding ratio was polymer (Q-3):polymer (S-1) The polymer (Q-3) and the polymer (S-1) were prepared in a manner of =90:10 (solid content conversion mass ratio), and were diluted with NMP and butyl cylosol (BC) to obtain a solid content concentration of 4.0 mass %, the solvent composition ratio is a solution of NMP:BC=45:55 (mass ratio). This solution was filtered with a filter having a pore size of 0.2 μm to prepare a liquid crystal aligning agent (W-1).

(2)液晶組成物的製備 (2) Preparation of liquid crystal composition

相對於10g的向列液晶(默克(Merck)公司製造,MLC-6608),添加5質量%的下述式(L1-1)所表示的液晶性化合物以及0.3質量%的下述式(L2-1)所表示的光聚合性化合物並進行混合,藉此而獲得液晶組成物LC1。 5 mass % of the liquid crystal compound represented by the following formula (L1-1) and 0.3 mass % of the following formula (L2 The photopolymerizable compound represented by -1) is mixed to obtain a liquid crystal composition LC1.

Figure 107112578-A0305-02-0068-56
Figure 107112578-A0305-02-0068-56

(3)液晶顯示元件的製造 (3) Manufacture of liquid crystal display element

使用液晶配向膜印刷機(日本寫真印刷(股)製造),將以上所製備的液晶配向劑(W-1)塗佈於分別具有包括ITO電極的導電膜的兩片玻璃基板的各電極面上,於80℃的加熱板上進行2分鐘加熱(預烘烤)後,於加熱板上進行30分鐘加熱(後烘烤),形 成平均膜厚為0.1μm的塗膜。其中,於後烘烤時,對於兩片基板中的一個基板(設為「基板A」),將後烘烤溫度設為180℃,對於另一個基板(設為「基板B」),將後烘烤溫度設為230℃。藉由該些操作,獲得一對(兩片)具有塗膜的基板。再者,所使用的電極的圖案為與PSA模式中的電極圖案種類相同的圖案。 Using a liquid crystal alignment film printer (manufactured by Nippon Photo Printing Co., Ltd.), the liquid crystal alignment agent (W-1) prepared above was coated on each electrode surface of two glass substrates each having a conductive film including an ITO electrode , after 2 minutes of heating (pre-baking) on a hot plate at 80 °C, and 30 minutes of heating (post-baking) on a hot plate, the shape A coating film with an average film thickness of 0.1 μm was formed. Among them, in the post-baking, for one of the two substrates (referred to as "substrate A"), the post-baking temperature was set to 180°C, and for the other substrate (referred to as "substrate B"), the post-baking temperature was The baking temperature was set to 230°C. Through these operations, a pair (two sheets) of substrates having a coating film were obtained. In addition, the pattern of the electrode used is the same pattern as that of the electrode pattern in the PSA mode.

繼而,對一對基板的具有液晶配向膜的各個外緣塗佈加入有直徑為5.5μm的氧化鋁球的環氧樹脂黏接劑後,以液晶配向膜面相對的方式重疊壓接,使黏接劑硬化。繼而,經由液晶注入口將以上所製備的液晶組LC1填充於一對基板間後,利用丙烯酸系光硬化黏接劑將液晶注入口密封,藉此而製造液晶單元。其後,於液晶單元的導電膜間施加頻率為60Hz的10V交流電,並且於液晶受到驅動的狀態下,利用使用金屬鹵素燈作為光源的紫外線照射裝置,以5J/m2的照射量照射紫外線。再者,該照射量為使用以365nm的波長為基準進行測量的光量計所測定的值。 Then, after coating the outer edges of the pair of substrates with the liquid crystal alignment film and adding an epoxy resin adhesive with alumina balls with a diameter of 5.5 μm, the liquid crystal alignment film faces are overlapped and crimped to make the adhesive. Adhesive hardening. Next, after filling the liquid crystal group LC1 prepared above between a pair of substrates through a liquid crystal injection port, the liquid crystal injection port was sealed with an acrylic photocurable adhesive, thereby producing a liquid crystal cell. Then, 10V alternating current with a frequency of 60Hz was applied between the conductive films of the liquid crystal cell, and while the liquid crystal was driven, ultraviolet rays were irradiated with an irradiation dose of 5 J/m 2 using an ultraviolet irradiation device using a metal halide lamp as a light source. In addition, this irradiation amount is the value measured using the photometer which measures based on the wavelength of 365 nm.

(4)預傾角的測定 (4) Determination of pre-tilt angle

針對所述(3)中所獲得的液晶顯示元件,分別測定基板A以及基板B的預傾角。預傾角的測定依據非專利文獻「T.J.謝弗等人.應用物理期刊.第19卷,p.2013(1980)(T.J.Scheffer et.al.J.Appl.Phys.vo.19,p.2013(1980))」所記載的方法,藉由使用He-Ne雷射光的結晶旋轉法來測定液晶分子相對於基板面的傾斜角的值,並將其設為預傾角[°]。其結果為:基板A(低溫煅燒)的預傾角為89.3°,基板B(高溫煅燒)的預傾角為88.4°,兩者的 預傾角的差為0.9°。 For the liquid crystal display element obtained in the above (3), the pretilt angles of the substrate A and the substrate B were measured, respectively. The measurement of the pretilt angle is based on the non-patent literature "TJ Scheffer et al. Journal of Applied Physics. Vol.19, p.2013 (1980) (TJ Scheffer et.al.J.Appl.Phys.vo.19, p.2013 ( 1980))", the value of the inclination angle of the liquid crystal molecules with respect to the substrate surface was measured by the crystal rotation method using He-Ne laser light, and it was set as the pretilt angle [°]. As a result, the pretilt angle of the substrate A (low-temperature firing) was 89.3°, and the pretilt angle of the substrate B (high-temperature firing) was 88.4°. The difference in pretilt angle is 0.9°.

[實施例2~實施例13、比較例1~比較例3] [Example 2 to Example 13, Comparative Example 1 to Comparative Example 3]

如下述表4所示般變更液晶配向劑所含有的聚合物的種類、基板的煅燒溫度(後烘烤溫度)、以及對液晶單元的UV照射量,除此以外,以與實施例1相同的方式製備液晶配向劑並形成液晶配向膜,並且製造液晶顯示元件來測定預傾角。將評價結果示於下述表4中。再者,實施例2~實施例9及比較例2~比較例4中將聚合物成分設為一種。實施例10~實施例13及比較例1中,使兩種聚合物(聚合物I及聚合物II)以聚合物I:聚合物II=90:10(固體成分換算質量比)的調配比率含有於液晶配向劑中。實施例5中,對基板B於180℃下進行後烘烤後,於230℃下進一步進行加熱(二階段加熱)。 As shown in Table 4 below, the same procedures as in Example 1 were performed except that the type of polymer contained in the liquid crystal aligning agent, the firing temperature (post-baking temperature) of the substrate, and the amount of UV irradiation to the liquid crystal cell were changed. A liquid crystal alignment agent was prepared and a liquid crystal alignment film was formed, and a liquid crystal display element was manufactured to measure the pretilt angle. The evaluation results are shown in Table 4 below. In addition, in Example 2 - Example 9 and Comparative Example 2 - Comparative Example 4, the polymer component was used as one type. In Examples 10 to 13 and Comparative Example 1, two kinds of polymers (polymer I and polymer II) were contained in a compounding ratio of polymer I:polymer II=90:10 (mass ratio in terms of solid content) in liquid crystal alignment agents. In Example 5, after post-baking the board|substrate B at 180 degreeC, it further heated at 230 degreeC (two-stage heating).

Figure 107112578-A0305-02-0071-57
Figure 107112578-A0305-02-0071-57

根據以上結果而確認到:藉由使用含有化合物(P)的液晶配向劑於一對基板的表面形成液晶配向膜,並且實施對一個基板以較另一個基板更高的溫度進行加熱的處理,而可於一對基板間充分增大預傾角的差。 From the above results, it was confirmed that by forming a liquid crystal alignment film on the surfaces of a pair of substrates using a liquid crystal aligning agent containing the compound (P), and heating one substrate at a higher temperature than the other substrate, the The difference in pretilt angle can be sufficiently increased between a pair of substrates.

Claims (10)

一種液晶元件的製造方法,其包括:於第1基板及第2基板的各基板上塗佈液晶配向劑的步驟;於塗佈所述液晶配向劑後對所述第1基板及所述第2基板進行加熱的步驟;以及於所述加熱之後,將所述第1基板與所述第2基板以塗佈有所述液晶配向劑的面相對的方式對向配置從而構築液晶單元的步驟,且所述液晶配向劑含有具有藉由加熱而脫離的熱脫離性基的化合物,於所述進行加熱的步驟中,實施對所述第1基板及所述第2基板中的一個基板,以較另一個基板更高的溫度進行加熱的高溫加熱處理。 A method of manufacturing a liquid crystal element, comprising: coating a liquid crystal alignment agent on each of a first substrate and a second substrate; and applying the liquid crystal alignment agent to the first substrate and the second substrate a step of heating a substrate; and a step of constructing a liquid crystal cell by arranging the first substrate and the second substrate so as to face each other so that the surfaces on which the liquid crystal aligning agent is applied are opposed to each other after the heating, and The liquid crystal aligning agent contains a compound having a thermally releasable group that is detached by heating, and in the heating step, one of the first substrate and the second substrate is subjected to a higher temperature than the other. A higher temperature substrate is heated by a high temperature heat treatment. 如申請專利範圍第1項所述的液晶元件的製造方法,其中於所述高溫加熱處理中,對所述一個基板以較所述另一個基板高20℃以上的溫度進行加熱。 The method for producing a liquid crystal element according to claim 1, wherein in the high-temperature heat treatment, the one substrate is heated at a temperature 20° C. or more higher than the other substrate. 如申請專利範圍第1項或第2項所述的液晶元件的製造方法,其中於構築所述液晶單元後,更包括於對所述液晶單元施加電壓的狀態下進行光照射的步驟。 The method for producing a liquid crystal element according to claim 1 or claim 2, further comprising a step of irradiating light with a voltage applied to the liquid crystal cell after the liquid crystal cell is constructed. 如申請專利範圍第1項或第2項所述的液晶元件的製造方法,其中由形成於所述第1基板上的液晶配向膜所誘發的液晶分子的預傾角、與由形成於所述第2基板上的液晶配向膜所誘 發的液晶分子的預傾角的差為0.8°以上。 The method for manufacturing a liquid crystal element according to claim 1 or claim 2, wherein the pretilt angle of liquid crystal molecules induced by the liquid crystal alignment film formed on the first substrate and the pretilt angle of the liquid crystal molecules formed on the first substrate 2 Induced by the liquid crystal alignment film on the substrate The difference between the pretilt angles of the liquid crystal molecules produced is 0.8° or more. 如申請專利範圍第1項或第2項所述的液晶元件的製造方法,其中於所述加熱之後且所述液晶單元的構築前,更包括至少使所述第1基板及所述第2基板中經實施所述高溫加熱處理的基板中的所述液晶配向劑的塗佈面與水或包含有機溶媒的液體接觸的步驟。 The method for producing a liquid crystal element according to claim 1 or claim 2, further comprising forming at least the first substrate and the second substrate after the heating and before the construction of the liquid crystal cell. In the step of contacting the coating surface of the liquid crystal aligning agent in the substrate subjected to the high temperature heat treatment with water or a liquid containing an organic solvent. 如申請專利範圍第1項或第2項所述的液晶元件的製造方法,其中具有所述熱脫離性基的化合物為選自由聚醯胺酸、聚醯胺酸酯、聚醯亞胺及聚有機矽氧烷所組成的群組中的至少一種。 The method for producing a liquid crystal element according to claim 1 or claim 2, wherein the compound having the thermally releasable group is selected from the group consisting of polyamic acid, polyamic acid ester, polyimide, and polyamide At least one of the group consisting of organosiloxanes. 如申請專利範圍第1項或第2項所述的液晶元件的製造方法,其中具有所述熱脫離性基的化合物具有下述式(1)所表示的部分結構或下述式(2)所表示的部分結構:
Figure 107112578-A0305-02-0073-58
式(1)中,R1為單鍵或二價有機基;X1為單鍵、-O-、-S-或-NRII-,其中,RII為氫原子或烴基,可與R1鍵結而形成環,亦可為主鏈中所含的二價烴基;Y1為將Y1與氧基羰基的鍵結切斷而脫離的所述熱脫離性基、或者將X1與氧基羰基的鍵結切斷而與氧基羰基同時或分別脫離的所述熱脫離性基;「*」表示鍵結鍵, *-R1-Y2 (2)式(2)中,R1為單鍵或二價有機基;Y2為具有下述式(3)的結構的所述熱脫離性基;「*」表示鍵結鍵,
Figure 107112578-A0305-02-0074-59
式(3)中,X1為單鍵、-O-、-S-或-NRII-,其中,RII為氫原子或一價有機基,可與R1鍵結而形成環;RIII為一價有機基;「**」表示與R1的鍵結鍵。
The method for producing a liquid crystal element according to claim 1 or claim 2, wherein the compound having the thermally releasable group has a partial structure represented by the following formula (1) or the following formula (2) Part of the structure represented:
Figure 107112578-A0305-02-0073-58
In formula (1), R 1 is a single bond or a divalent organic group; X 1 is a single bond, -O-, -S- or -NR II -, wherein R II is a hydrogen atom or a hydrocarbon group, which can be combined with R 1 bond to form a ring, and may also be a divalent hydrocarbon group contained in the main chain; Y 1 is the thermally detachable group that cuts off the bond between Y 1 and the oxycarbonyl group, or X 1 and oxygen The thermally detachable group that is severed from the bond of the oxycarbonyl group and simultaneously or separately from the oxycarbonyl group; "*" represents a bond, *-R 1 -Y 2 (2) In formula (2), R 1 is a single bond or a divalent organic group; Y 2 is the thermally detachable group having the structure of the following formula (3); "*" represents a bonding bond,
Figure 107112578-A0305-02-0074-59
In formula (3), X 1 is a single bond, -O-, -S- or -NR II -, wherein R II is a hydrogen atom or a monovalent organic group, which can be bonded to R 1 to form a ring; R III is a monovalent organic group; "**" represents a bond with R 1 .
如申請專利範圍第1項或第2項所述的液晶元件的製造方法,其中所述熱脫離性基具有下述式(C-1)所表示的部分結構:*-R22-R21-R20-R19 (C-1)式(C-1)中,R19為碳數1~30的烷基、碳數1~30的氟烷基、碳數1~30的烷氧基、碳數1~30的氟化烷氧基、可具有取代基的碳數3~10的環烷基、可具有取代基的碳數6~20的苯基、或具有類固醇骨架的碳數17~51的烴基;R20為單鍵、-O-、-COO-或-OCO-;R21為單鍵、碳數1~20的烷二基、伸苯基、伸聯苯基、 伸環己基、雙伸環己基、下述式(C-1-1)所表示的基、或下述式(C-1-2)所表示的基;R22為單鍵或二價有機基;其中,當R20為單鍵時,R21為單鍵;於R20、R21及R22為單鍵,且R19為碳數1~30的烷基、碳數1~30的氟烷基、碳數1~30的烷氧基或碳數1~30的氟化烷氧基的情況下,R19具有直鏈結構;「*」表示鍵結鍵,
Figure 107112578-A0305-02-0075-60
式(C-1-2)中,R23為氫原子或碳數1~10的烴基;「**」表示與R22的鍵結鍵。
The method for producing a liquid crystal element according to claim 1 or claim 2, wherein the thermally releasable group has a partial structure represented by the following formula (C-1): *-R 22 -R 21 - R 20 -R 19 (C-1) In formula (C-1), R 19 is an alkyl group having 1 to 30 carbon atoms, a fluoroalkyl group having 1 to 30 carbon atoms, an alkoxy group having 1 to 30 carbon atoms, Fluorinated alkoxy group with 1 to 30 carbon atoms, cycloalkyl group with 3 to 10 carbon atoms that may have a substituent, phenyl group with 6 to 20 carbon atoms that may have a substituent, or 17 to 17 carbon atoms with a steroid skeleton The hydrocarbon group of 51; R 20 is a single bond, -O-, -COO- or -OCO-; R 21 is a single bond, alkanediyl with carbon number 1~20, phenylene, biphenylene, cyclohexylene , a dicyclohexylene group, a group represented by the following formula (C-1-1), or a group represented by the following formula (C-1-2); R 22 is a single bond or a divalent organic group; wherein, When R 20 is a single bond, R 21 is a single bond; when R 20 , R 21 and R 22 are single bonds, and R 19 is an alkyl group with 1 to 30 carbon atoms, a fluoroalkyl group with 1 to 30 carbon atoms, In the case of an alkoxy group having 1 to 30 carbon atoms or a fluorinated alkoxy group having 1 to 30 carbon atoms, R 19 has a straight chain structure; "*" represents a bond,
Figure 107112578-A0305-02-0075-60
In formula (C-1-2), R 23 is a hydrogen atom or a hydrocarbon group having 1 to 10 carbon atoms; "**" represents a bond with R 22 .
如申請專利範圍第1項或第2項所述的液晶元件的製造方法,其中所述熱脫離性基具有選自由受阻胺結構、受阻酚結構及苯胺結構所組成的群組中的至少一種。 The method for producing a liquid crystal element according to claim 1 or claim 2, wherein the thermally releasable group has at least one selected from the group consisting of a hindered amine structure, a hindered phenol structure, and an aniline structure. 如申請專利範圍第1項或第2項所述的液晶元件的製造方法,其中所述熱脫離性基具有能夠顯現藉由光照射而產生自由基的自由基產生功能及藉由光照射而顯示出增感作用的光增感功能的至少任一種功能的基。 The method for producing a liquid crystal element according to claim 1 or claim 2, wherein the thermally releasable group has a radical generating function capable of generating radicals by light irradiation, and display by light irradiation A base for at least any one of the photosensitizing functions that exhibit sensitization.
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