TWI746262B - Masks made of knitted fabrics - Google Patents
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- TWI746262B TWI746262B TW109139538A TW109139538A TWI746262B TW I746262 B TWI746262 B TW I746262B TW 109139538 A TW109139538 A TW 109139538A TW 109139538 A TW109139538 A TW 109139538A TW I746262 B TWI746262 B TW I746262B
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Abstract
一種以針織物製成的口罩,包含一針織布及二耳掛,該二耳掛與該針織布一同針織完成且分別位於該針織布兩側。該針織布由一雙層針織結構與一單層針織結構所構成,該雙層織針結構為形成該針織布的基礎,該單層針織結構定義出至少一彎摺線,該單層針織結構僅連接該雙層針織結構所屬二面層組織的其中之一,該彎摺線為一谷摺線或一山摺線是由該單層針織結構與該雙層針織結構的連接而定。本發明透過該針織布以該雙層針織結構與該單層針織結構所構成,使得該針織布得以利用該單層針織結構定義出該至少一彎摺線,令該針織布可進行收摺。A mask made of knitted fabrics includes a knitted fabric and two ear loops. The two ear loops are knitted together with the knitted fabric and are respectively located on both sides of the knitted fabric. The knitted fabric is composed of a double-layer knitted structure and a single-layer knitted structure. The double-layer knitting needle structure forms the basis of the knitted fabric. The single-layer knitted structure defines at least one bending line. The single-layer knitted structure has only The double-layer knitted structure is connected to one of the two-sided layer structures, and the bending line is a valley fold line or a mountain fold line depending on the connection between the single-layer knitted structure and the double-layer knitted structure. In the present invention, the knitted fabric is composed of the double-layer knitted structure and the single-layer knitted structure, so that the knitted fabric can use the single-layer knitted structure to define the at least one bending line, so that the knitted fabric can be folded.
Description
本發明涉及一種以針織物製成的口罩,尤指一種針織布由雙層針織結構與單層針織結構所構成的口罩。The invention relates to a mask made of knitted fabrics, in particular to a mask composed of a double-layer knitted structure and a single-layer knitted structure.
查,現有以口罩種類眾多,舉例來說有以棉布製成的布口罩,以及由日商ARAX公司所生產且以聚氨酯材料製成的Pitta Mask等。其中,以布口罩來說,此類型的口罩多以織物之間拼接的方式組成,當穿戴者帶上布口罩後布面拼接線容易與穿戴者的臉部產生摩擦,而造成穿戴者不適。另外,Pitta Mask雖為一體成型結構,然而該產品無法被隨意收摺,當穿戴者脫下此類型口罩後難降低口罩收摺後的尺寸,而不便於穿戴者收納。According to the investigation, there are many types of masks. For example, there are cloth masks made of cotton, and Pitta Mask made of polyurethane materials produced by Nissho ARAX. Among them, for cloth masks, this type of masks are mostly composed of stitching between fabrics. When the wearer wears the cloth mask, the stitching line of the cloth surface is likely to rub against the wearer's face, causing discomfort to the wearer. In addition, although Pitta Mask is an integrated structure, the product cannot be folded at will. When the wearer takes off this type of mask, it is difficult to reduce the folded size of the mask, and it is not convenient for the wearer to store it.
再者,TW I511758雖揭露一種可提高攜帶性與收納性的織物口罩,然而根據該案說明書所述內容可發現,該口罩於針織完成後須額外以超音波熔接等方式以定型形成摺痕部,造成製作程序繁瑣。此外,該口罩所使用的二耳掛亦是在口罩本體針織完成後再另外縫合於口罩本體,額外的耳掛縫合步驟令生產步驟繁瑣外,當耳掛不慎未確實接合於口罩本體上或是穿戴者大力拉扯耳掛時,都容易令耳掛與口罩本體分離。Furthermore, although TW I511758 discloses a fabric mask that can improve portability and storage, according to the description of the case, it can be found that the mask must be additionally shaped by ultrasonic welding after knitting to form a crease. , Resulting in cumbersome production procedures. In addition, the two ear loops used in the mask are also stitched to the mask body after the mask body is knitted. The extra ear loop stitching steps make the production steps cumbersome. When the ear loops are accidentally not connected to the mask body or When the wearer pulls the ear hook vigorously, it is easy to separate the ear hook from the mask body.
本發明的主要目的,在於解決習用布口罩或以聚氨酯材料製成的口罩無法被收摺的問題。The main purpose of the present invention is to solve the problem that conventional cloth masks or masks made of polyurethane materials cannot be folded.
本發明的另一目的,在於解決習用可收摺的織物口罩的製程步驟繁瑣的問題。Another object of the present invention is to solve the problem of cumbersome manufacturing steps of conventional collapsible fabric masks.
為達上述目的,本發明提供一種以針織物製成的口罩,包含一針織布以及二與該針織布一同針織完成且分別位於該針織布兩側的耳掛,該針織布由一雙層針織結構與一單層針織結構所構成,該雙層針織結構為形成該針織布的基礎,該單層針織結構定義出至少一彎摺線以令該針織布可進行收摺,該單層針織結構僅連接該雙層針織結構所屬二面層組織的其中之一,該彎摺線為一谷摺線或一山摺線是由該單層針織結構與該雙層針織結構的連接而定。To achieve the above objective, the present invention provides a mask made of knitted fabric, comprising a knitted fabric and two ear hooks which are knitted together with the knitted fabric and are respectively located on both sides of the knitted fabric. The knitted fabric is composed of a double-layer knitted fabric. Structure and a single-layer knitted structure, the double-layer knitted structure forms the basis of the knitted fabric, the single-layer knitted structure defines at least one bending line so that the knitted fabric can be folded, the single-layer knitted structure only The double-layer knitted structure is connected to one of the two-sided layer structures, and the bending line is a valley fold line or a mountain fold line depending on the connection between the single-layer knitted structure and the double-layer knitted structure.
一實施例中,該二耳掛分別為一以袋編針織形成的管狀織物,該二耳掛是以一嵌花針織與該針織布連接。In one embodiment, the two ear hooks are respectively a tubular fabric formed by bag-knitting, and the two ear hooks are connected to the knitted fabric by an intarsia knitting.
一實施例中,該單層針織結構形成複數該彎摺線,該些彎摺線包含複數間隔排列的縱向彎摺線,以及複數分別連接於任二相鄰該些縱向彎摺線之間的斜向彎摺線,每一該斜向彎摺線與其中另一該斜向彎摺線相交於其中一該縱向彎摺線上。In one embodiment, the single-layer knitted structure forms a plurality of the bending lines, the bending lines include a plurality of longitudinal bending lines arranged at intervals, and a plurality of oblique bending lines respectively connected between any two adjacent longitudinal bending lines , Each of the oblique bending lines and another of the oblique bending lines intersect on one of the longitudinal bending lines.
一實施例中,部分的該些斜向彎摺線於該針織布表面上構型出複數接連排列的菱形圖像,該些菱形圖像位於該針織布的中心者大於其餘該些菱形圖像。In one embodiment, part of the oblique bending lines form a plurality of consecutively arranged diamond-shaped images on the surface of the knitted fabric, and the diamond-shaped images located in the center of the knitted fabric are larger than the remaining diamond-shaped images.
一實施例中,該針織布在該雙層針織結構的其中一側具有一透過添紗針織加入的抗菌紗。In one embodiment, the knitted fabric has an antibacterial yarn added through knitting by adding yarn on one side of the double-layer knitted structure.
一實施例中,該抗菌紗為一石墨烯紗線。In one embodiment, the antibacterial yarn is a graphene yarn.
一實施例中,該針織布未緊鄰該二耳掛的兩相對邊形態不同。In one embodiment, the two opposite sides of the knitted fabric that are not adjacent to the two ear hooks have different shapes.
一實施例中,該二耳掛定義出兩分別連接該二耳掛且相互平行的假想線,該二假想線區分該針織布由上至下為一第一邊側區塊,一中置區塊以及一第二邊側區塊,該針織布於該第一邊側區塊靠近該針織布中線的部分以及於該第二邊側區塊靠近該針織布中線的部分是以一引返針織編織而成。In one embodiment, the two ear hooks define two imaginary lines that are connected to the two ear hooks and are parallel to each other. The two imaginary lines distinguish the knitted fabric from top to bottom as a first side area and a middle area. Block and a second side block, the part of the knitted fabric close to the center line of the knitted fabric in the first side block and the part close to the center line of the knitted fabric in the second side block is a guide Woven by back knitting.
依前述發明內容所揭,相較於習用技術,本發明具有以下特點:本發明透過該針織布上以該雙層針織結構與該單層針織結構構成,使得該針織布得以該單層針織結構為該至少一彎摺線,當該針織布未被使用時得避免無法收納而呈現凌散的狀態。According to the foregoing disclosure, compared with the conventional technology, the present invention has the following characteristics: the present invention uses the double-layer knitted structure and the single-layer knitted structure on the knitted fabric, so that the knitted fabric has the single-layer knitted structure. For the at least one bending line, when the knitted fabric is not in use, it is necessary to avoid being unable to be stored and presenting a loose state.
本發明詳細說明及技術內容,茲配合圖式說明如下:The detailed description and technical content of the present invention are described as follows in conjunction with the drawings:
請參閱圖1至圖4,本發明提供一種以針織物製成的口罩10,該口罩10包含一針織布11以及二耳掛13、14,該二耳掛13、14分別位於該針織布11兩側,該二耳掛13、14非以額外拼接方式設置於該針織布11上,而是一體成型於該針織布11上,也就是說,該二耳掛13、14與該針織布11是一同針織完成。1 to 4, the present invention provides a
進一步地,該針織布11由一雙層針織結構111與一單層針織結構112所構成。該雙層針織結構111為形成該針織布11的基礎,該雙層針織結構111包含二面層組織113、114以及一交聯該二面層組織113、114的交聯組織115,而該單層針織結構112僅具有單一面層組織116,該單層針織結構112所屬的該面層組織116僅連接該雙層針織結構111所屬的該二面層組織113、114的其中之一,且該單層針織結構112所屬的該面層組織116可與該雙層針織結構111所屬的該二面層組織113、114的其中之一為一體成型。以本文圖2來說,該單層針織結構112的該面層組織116可連接該雙層針織結構111的該面層組織113,或者是該單層針織結構112的該面層組織116亦可連接該雙層針織結構111的該面層面織114。又,由於該單層針織結構112的抗撓剛度(Flexural rigidity)小於該雙層針織結構111,故該單層針織結構112得定義出至少一彎摺線117以令該針織布11可進行收摺,該至少一彎摺線117為一谷摺線或是一山摺線是由該單層針織結構112與該雙層針織結構111的連接而定。以圖2舉例來說,假設該彎摺線117為該山摺線時,該單層針織結構112連接該雙層針織結構111所屬的該面層組織113,該彎摺線117將令該雙層針織結構111呈現倒V狀的彎摺。反之,當該彎摺線117為該谷摺線時,該單層針織結構112連接該雙層針織結構111所屬的該面層組織114時,該彎摺線117將令該雙層針織結構111呈現V字型彎摺,就如圖3所示。Furthermore, the knitted
承上,本發明透過該針織布11由該雙層針織結構111與該單層針織結構112所組成,使得該針織布11得以該單層針織結構112定義出該彎摺線117,令該針織布11得以被收摺進而提升該口罩10的便攜性。再者,本發明於針織該針織布11時同時形成出該雙層針織結構111與該單層針織結構112,也就是說,本發明在織針過程中即同時形成該彎摺線117,而不以習用額外製程步驟來形成該彎摺線117,具體簡化該針織布11的製程。In summary, the present invention uses the knitted
承上,一實施例中,該二耳掛13、14分別為一以袋編針織形成的管狀織物131,該二耳掛13、14是以一嵌花針織(Intarsia)與該針織布11連接。又,該嵌花針織的技法為該領域具通知者所熟知的技法,於此不再贅述。Continuing, in one embodiment, the two
復請參閱圖1至圖4,一實施例中,該單層針織結構112形成複數該彎摺線117,該些彎摺線117包含複數縱向彎摺線118以及複數斜向彎摺線119,該些縱向彎摺線118間隔設置,且該些縱向彎摺線118可分別為該山摺線或該谷摺線,一實施例中,該些縱向彎摺線118的至少其一更可同時由至少一谷摺線段120以及至少一山摺線段121所組成。又,該些斜向彎摺線119分別連接於任二相鄰該些縱向彎摺線118之間,且每一該斜向彎摺線119與其中另一該斜向彎摺線119相交於其中一該縱向彎摺線118上。在一實施例中,該些斜向彎摺線119可分別為該山摺線。Please refer to FIGS. 1 to 4 again. In one embodiment, the single-layer knitted
進一步地,復請參閱圖1,一實施例中,部分的該些斜向彎摺線119於該針織布11表面上構型出複數菱形圖像122,該些菱形圖像122接連排列於該針織布11的未鄰近邊緣的位置,且該些菱形圖像122位於該針織布11的中心者大於其餘該些菱形圖像122。又,餘下的該些斜向彎摺線119分別連接於其中一該菱形圖像122遠離其中另一該菱形圖像122一側。Further, please refer to FIG. 1 again. In one embodiment, part of the
再另一方面,一實施例中,本發明該針織布11為貼合穿戴者的鼻部與下巴,該針織布11未緊鄰該二耳掛13、14的兩相對邊形態不同。具體來說,該二耳掛13、14定義出兩分別連接該二耳掛13、14且相互平行的假想線132、133,該針織布11以該二假想線132、133由上至下區分出一第一邊側區塊123,一中置區塊124以及一第二側邊區塊。又,假設以圖1所繪示圖面方向表示該針織布11的方向時,該第一邊側區塊123對應穿戴者的鼻部,該第二邊側區塊125對應穿戴者的下巴,且該第一邊側區塊123的面積大於該第二邊側區塊125的面積,如此,該針織布11得以具體配合穿戴者臉部,同時穿戴者更可透過該第一邊側區塊123與該第二邊側區塊125的差異判斷該口罩10的穿戴方向。進一步地,該針織布11於該第一邊側區塊123靠近該針織布11中線126的部分以及於該第二邊側區塊125靠近該針織布11中線126的部分是以一引返針織(Partial knitting)編織而成,使得該針織布11於該第一邊側區塊123靠近該針織布11中線126的部分與於該第二邊側區塊125靠近該針織布11中線126的部分具有弧度,藉此以服貼穿戴者的鼻部與下巴。On the other hand, in an embodiment, the knitted
除此之外,一實施例中,該針織布11為提升抗菌功能,該針織布11在該雙層針織結構111的其中一側具有一抗菌紗,該抗菌紗在該針織布11針織過程中透過添紗針織加入至該針織布11中。一實施例中,該抗菌紗為一石墨烯紗線。In addition, in one embodiment, the knitted
綜上所述者,僅爲本發明的一較佳實施例而已,當不能以此限定本發明實施的範圍,即凡依本發明申請專利範圍所作的均等變化與修飾,皆應仍屬本發明的專利涵蓋範圍。In summary, it is only a preferred embodiment of the present invention. When the scope of implementation of the present invention cannot be limited by this, that is, all equal changes and modifications made in accordance with the scope of the patent application of the present invention should still belong to the present invention. The scope of patent coverage.
10:口罩 11:針織布 111:雙層針織結構 112:單層針織結構 113:面層組織 114:面層組織 115:交聯組織 116:面層組織 117:彎摺線 118:縱向彎摺線 119:斜向彎摺線 120:谷摺線段 121:山摺線段 122:菱形圖像 123:第一邊側區塊 124:中置區塊 125:第二邊側區塊 126:中線 13:耳掛 131:管狀織物 132:假想線 133:假想線 14:耳掛 10: Mask 11: knitted fabric 111: Double-layer knitted structure 112: Single-layer knitted structure 113: Surface Organization 114: Surface Organization 115: Cross-linked organization 116: Surface Organization 117: Bending line 118: Longitudinal bending line 119: Oblique bending line 120: Valley polyline segment 121: Mountain broken line segment 122: diamond image 123: The first side block 124: Center block 125: second side block 126: Midline 13: ear hook 131: Tubular fabric 132: Imaginary Line 133: Imaginary Line 14: ear hook
圖1,本發明一實施例的織物口罩正面示意圖。 圖2,本發明一實施例的未收摺時的針織布結構示意圖。 圖3,本發明一實施例的收摺後的針織布結構示意圖。 圖4,本發明一實施例的口罩收摺後示意圖。 Fig. 1 is a schematic front view of a fabric mask according to an embodiment of the present invention. Fig. 2 is a schematic diagram of the structure of the knitted fabric when it is not folded in an embodiment of the present invention. Fig. 3 is a schematic diagram of the folded knitted fabric structure according to an embodiment of the present invention. Fig. 4 is a schematic diagram of a mask after being folded in an embodiment of the present invention.
10:口罩 10: Mask
11:針織布 11: knitted fabric
117:彎摺線 117: Bending line
118:縱向彎摺線 118: Longitudinal bending line
119:斜向彎摺線 119: Oblique bending line
120:谷摺線段 120: Valley polyline segment
121:山摺線段 121: Mountain broken line segment
122:菱形圖像 122: diamond image
123:第一邊側區塊 123: The first side block
124:中置區塊 124: Center block
125:第二邊側區塊 125: second side block
126:中線 126: Midline
13:耳掛 13: ear hook
131:管狀織物 131: Tubular fabric
132:假想線 132: Imaginary Line
133:假想線 133: Imaginary Line
14:耳掛 14: ear hook
Claims (9)
Priority Applications (1)
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TW109139538A TWI746262B (en) | 2020-11-12 | 2020-11-12 | Masks made of knitted fabrics |
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TW109139538A TWI746262B (en) | 2020-11-12 | 2020-11-12 | Masks made of knitted fabrics |
Publications (2)
Publication Number | Publication Date |
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TWI746262B true TWI746262B (en) | 2021-11-11 |
TW202218710A TW202218710A (en) | 2022-05-16 |
Family
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TW109139538A TWI746262B (en) | 2020-11-12 | 2020-11-12 | Masks made of knitted fabrics |
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TW (1) | TWI746262B (en) |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20150196075A1 (en) * | 2014-01-14 | 2015-07-16 | Martha Miers | Nose cup for dental and other surgical procedures |
CN107072341A (en) * | 2014-10-31 | 2017-08-18 | 3M创新有限公司 | Respirator with Corrugated filter structure |
CN109898324A (en) * | 2019-02-27 | 2019-06-18 | 孙义柱 | A kind of elastic absorption antibacterial mask fabric |
JP2019183344A (en) * | 2018-04-13 | 2019-10-24 | ユニ・チャーム株式会社 | Disposable mask |
CN111480913A (en) * | 2020-05-18 | 2020-08-04 | 无锡太平针织有限公司 | 3D forming mask knitted by four-needle bed flat knitting machine |
-
2020
- 2020-11-12 TW TW109139538A patent/TWI746262B/en active
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20150196075A1 (en) * | 2014-01-14 | 2015-07-16 | Martha Miers | Nose cup for dental and other surgical procedures |
CN107072341A (en) * | 2014-10-31 | 2017-08-18 | 3M创新有限公司 | Respirator with Corrugated filter structure |
JP2019183344A (en) * | 2018-04-13 | 2019-10-24 | ユニ・チャーム株式会社 | Disposable mask |
CN109898324A (en) * | 2019-02-27 | 2019-06-18 | 孙义柱 | A kind of elastic absorption antibacterial mask fabric |
CN111480913A (en) * | 2020-05-18 | 2020-08-04 | 无锡太平针织有限公司 | 3D forming mask knitted by four-needle bed flat knitting machine |
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TW202218710A (en) | 2022-05-16 |
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