TWI736615B - Liquid supply device containing gas - Google Patents
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- TWI736615B TWI736615B TW106114246A TW106114246A TWI736615B TW I736615 B TWI736615 B TW I736615B TW 106114246 A TW106114246 A TW 106114246A TW 106114246 A TW106114246 A TW 106114246A TW I736615 B TWI736615 B TW I736615B
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Abstract
提供一種在設於設在儲槽下游之流路部上之減壓部正下方,抑制由含有氣體之液體所產生氣泡所做之不良情況之含有氣體之液體供應裝置。 Provided is a gas-containing liquid supply device that suppresses defects caused by bubbles generated by the gas-containing liquid directly below the decompression portion provided on the flow path portion downstream of the storage tank.
含有氣體之液體GL的供應裝置1,101係包含:儲槽21,含有既定之氣體HG,儲留施加有第1壓力P1之含有氣體之液體GL;以及流路部30,130,自流出口30o流出第2壓力P2之含有氣體之液體。流路部係具有:一個或複數個減壓部31,32,減壓含有氣體之液體之壓力;最上游管部34;最下游管部36,136;以及至少一個減壓部間管部35,當減壓部存在複數個時,連結減壓部們;減壓部間管部及最下游管部中之至少某個的延遲管部35,136,係包含延遲含有氣體之液體之到達自下游側連接到該延遲管部之下游側減壓部32或流出口30o之時間之延遲部35d,136d。 The gas-containing liquid GL supply device 1, 101 includes: a storage tank 21 containing a predetermined gas HG, storing the gas-containing liquid GL to which the first pressure P1 is applied; and the flow path portions 30, 130, which flow out the second pressure from the outlet 30o P2 liquid containing gas. The flow path section has: one or more decompression sections 31, 32 to reduce the pressure of the gas-containing liquid; the most upstream pipe section 34; the most downstream pipe section 36, 136; and at least one inter-decompression pipe section 35, when When there are multiple decompression parts, connect the decompression parts; the delay tube part 35,136 of at least one of the pipe part between the decompression parts and the most downstream pipe part includes the delay of the arrival of the liquid containing gas and is connected to the downstream side The delay part 35d, 136d of the downstream side pressure reducing part 32 or the outflow port 30o of the delay pipe part.
Description
本技術係關於一種供給選擇性地含有既定氣體之含有氣體之液體之供應裝置。 This technology relates to a supply device for supplying a gas-containing liquid that selectively contains a predetermined gas.
近年來,在溶解氫氣到水中等,以大量含有之含氫水(所謂氫氣水)中,知曉有在活體內還原做為活性氧之羥基自由基之情事,在飲用領域中,含氫水被注目。製造選擇性地含有這種含氫水等之既定氣體之含有氣體之液體之製造裝置,提案有具有種種構造之裝置(參照例如專利文獻1及2)。
In recent years, in the hydrogen-containing water (so-called hydrogen water) that contains a large amount of hydrogen in water, etc., it is known that there is a case of reducing hydroxyl radicals as active oxygen in the living body. In the drinking field, hydrogen-containing water is Attention. A production device for producing a gas-containing liquid selectively containing a predetermined gas such as hydrogen-containing water has been proposed with various structures (see, for example,
【專利文獻1】日本新型登錄第3185776號公報 [Patent Document 1] Japanese Model Registration No. 3185776
【專利文獻2】日本特開2000-447號公報 [Patent Document 2] Japanese Patent Application Laid-Open No. 2000-447
在這種製造裝置生成,被儲留在儲槽中之含氫水等之含有氣體之液體,係通過流路,被供給到設於儲槽下游之機器,被供給到例如填充含有氣體之液體到容器之填充裝置。 The hydrogen-containing water and other gas-containing liquids produced in this kind of manufacturing equipment are stored in the storage tank, and are supplied to the equipment located downstream of the storage tank through the flow path, and are supplied, for example, to fill the gas-containing liquid To the filling device of the container.
但是,當使施加有第1壓力之儲槽中的含有氣體之液體,在壓力較小之第2壓力下,自流路的流出口流出時, 當在流路中設置一個或複數個減壓部(壓力調整閥),以降低施加在液體上之壓力時,在減壓部的正下方,於液中產生大量氣泡,調整在更下游側之減壓部處之壓力變得困難,為了自含有氣體之液體抽出氣體,有時無法供給處於在液中包含期望量之氣體之狀態下之含有氣體之液體,到下游之機器(填充裝置等)。 However, when the gas-containing liquid in the storage tank to which the first pressure is applied flows out from the outflow port of the flow path under the second pressure where the pressure is lower, When one or more pressure reducing parts (pressure regulating valves) are installed in the flow path to reduce the pressure applied to the liquid, a large number of bubbles are generated in the liquid directly below the pressure reducing part, and the adjustment is further downstream. The pressure at the decompression part becomes difficult. In order to extract gas from the gas-containing liquid, sometimes it is impossible to supply the gas-containing liquid in the state where the liquid contains the desired amount of gas to the downstream equipment (filling device, etc.) .
本技術係鑑於上述問題點所研發出者,其中,其提供一種在設於設在儲槽下游之流路部上之減壓部的正下方,抑制由含有氣體之液體所產生氣泡所致之不良情況之含有氣體之液體供應裝置。 This technology was developed in view of the above-mentioned problems. Among them, it provides a method for suppressing the bubbles caused by the gas-containing liquid directly below the decompression part provided on the flow path part downstream of the storage tank. A liquid supply device containing gas for bad conditions.
用於解決上述課題之態樣,係一種含有氣體之液體供應裝置,其包括:儲槽,儲留施加在選擇性地含有既定氣體之含有氣體之液體上之壓力,被調整到第1壓力之前述含有氣體之液體;以及流路部,被連接到前述儲槽,前述含有氣體之液體流過,壓力小於前述第1壓力之第2壓力之前述含有氣體之液體,自流出口流出;其中,前述流路部具有:一個或複數個減壓部,使施加在前述含有氣體之液體上之壓力,與一次側相比較下,在二次側較低;最上游管部,連結前述儲槽與位於前述減壓部中之最上游側之最上游減壓部之間;最下游管部,連結位於前述減壓部中之最下游側之最下游減壓部與前述流出口之間;以及至少一個減壓部間管部,當前述減壓部存在複數個時,使前述減壓部們之間依照順序連結;前述減壓部間管部及前述最下游管部中之至少某個的延遲管部,係包含:延遲自上游側連接到前述減壓部中之該延遲管部之上游側減壓 部所流出之前述含有氣體之液體,通過該延遲管部,以到達自下游側連接到前述減壓部中之該延遲管部之下游側減壓部或前述流出口之時間之延遲部。 The aspect for solving the above-mentioned problem is a gas-containing liquid supply device, which includes a storage tank for storing the pressure applied to the gas-containing liquid that selectively contains a predetermined gas, and is adjusted to the first pressure The gas-containing liquid; and the flow path portion, which is connected to the storage tank through which the gas-containing liquid flows, and the gas-containing liquid whose pressure is lower than the second pressure of the first pressure flows out from the outlet; wherein, the aforementioned The flow path part has: one or more decompression parts, so that the pressure exerted on the aforementioned gas-containing liquid is lower on the secondary side compared with the primary side; the most upstream pipe part connects the aforementioned storage tank with the Between the most upstream decompression section on the most upstream side in the aforementioned decompression section; the most downstream pipe section connecting between the most downstream decompression section located on the most downstream side of the aforementioned decompression section and the aforementioned outflow port; and at least one The inter-decompression pipe section, when there are plural decompression sections, connect the decompression sections in order; the delay pipe of at least one of the inter-decompression section pipe section and the most downstream pipe section The part includes: the delay is connected from the upstream side to the upstream side of the delay tube part in the aforementioned pressure reducing part. The gas-containing liquid flowing out of the part passes through the delay pipe part to reach the downstream side pressure reducing part of the delay pipe part connected to the pressure reducing part or the time delay part of the outflow port from the downstream side.
在此含有氣體之液體供應裝置中,於流路部具有一個或複數個減壓部,而且,在流路部的減壓部間管部及最下游管部中之至少一者的延遲管部具有延遲部。 In this gas-containing liquid supply device, one or more decompression parts are provided in the flow path part, and at least one of the pipe part between the decompression parts of the flow path part and the delay pipe part of the most downstream pipe part With a delay section.
在此延遲管部中,藉自上游側連接到該延遲管部之上游側減壓部中之減壓,在該上游側減壓部正下方的該延遲管部上游域中,即使在含有氣體之液體產生很多氣泡時,該延遲管部因為包含延遲部,所以,其與不設有延遲部之情形相比較下,直到含有氣體之液體到達下游側的下游側減壓部或流出口為止,皆可使大部分或全部氣泡再度溶解到液體中,吸收氣泡。因此,可緩和在自下游側連接到該延遲管部之下游側減壓部處之減壓困難性。或者,可供給在液中包含期望量之氣體之含有氣體之液體,到設於該延遲管部下游之機器(例如填充裝置)。 In this delay tube section, by the pressure reduction in the upstream side decompression section connected to the delay tube section from the upstream side, in the upstream region of the delay tube section directly below the upstream side decompression section, even if there is gas When a lot of bubbles are generated in the liquid, the delay tube includes a delay part. Compared with the case where the delay part is not provided, the liquid containing gas reaches the downstream pressure-reducing part or the outflow port on the downstream side. Both can make most or all of the bubbles re-dissolve into the liquid and absorb the bubbles. Therefore, it is possible to alleviate the difficulty in pressure reduction at the downstream side pressure-reducing part connected to the delay tube part from the downstream side. Alternatively, a gas-containing liquid containing a desired amount of gas in the liquid may be supplied to a machine (for example, a filling device) provided downstream of the delay tube.
包含在含有氣體之液體中之既定氣體,可例舉例如氫氣、氬氣、氮氣、空氣、氧氣、臭氧、二氧化碳、氯氣、氯化氫、亞硫酸氣體、氧化氮、硫化氫、氨氣等之氣體。 The predetermined gas contained in the gas-containing liquid may, for example, be hydrogen, argon, nitrogen, air, oxygen, ozone, carbon dioxide, chlorine, hydrogen chloride, sulfurous acid gas, nitrogen oxide, hydrogen sulfide, ammonia, etc.
含有既定氣體之液體,可例舉純水、超純水、飲用水、井水、天然水等之水,或者,在水中添加糖分、鹽分等之飲料水原液、飲料原液、啤酒原液、氣泡酒原液等之酒類原液、海水、各種培養液、各種水溶液、食用油脂、奶油用油脂、人造奶油用油脂等、飲用食用之液體類。又,也可例舉酒精、甲苯、丙酮等之有機溶媒、汽油、煤油等之石油類等。 Liquids containing established gases, such as pure water, ultra-pure water, drinking water, well water, natural water, etc., or beverage water stock solution, beverage stock solution, beer stock solution, sparkling wine added with sugar, salt, etc. Alcoholic liquids such as raw liquids, seawater, various culture liquids, various aqueous solutions, edible fats and oils, fats for butter, fats for margarine, etc., liquids for drinking and eating. In addition, organic solvents such as alcohol, toluene, and acetone, and petroleum products such as gasoline and kerosene can also be cited.
儲槽只要係儲留壓力被調整到第1壓力之含有氣體之液體之槽體即可。因此,可例舉單獨儲留被調整到第1壓力之既定量之含有氣體之液體之槽體。此外,也可例舉做為接受自外部往槽體之含有氣體之液體之供給,同時使含有氣體之液體自槽體流出到流路部之暫時性之含有氣體之液體之儲留部位之儲槽。又,也可例舉自外部接受不含氣體之液體,或者,氣體含量較低之含有氣體之液體之供給,藉設置於儲槽內部或側壁等之微細氣泡產生裝置,使既定氣體成為微細氣泡以含有在液體(或者,含有氣體之液體),而且,使其溶解於液中等之後,供給提高既定氣體含量之含有氣體之液體,到設於流路部下游之機器(填充裝置等)之可兼用作含有氣體之液體之製造裝置一部份之儲槽。 The storage tank only needs to be a tank that stores a gas-containing liquid whose pressure is adjusted to the first pressure. Therefore, a tank for separately storing a predetermined amount of gas-containing liquid adjusted to the first pressure can be exemplified. In addition, it can also be exemplified as receiving the supply of gas-containing liquid from the outside to the tank body, while allowing the gas-containing liquid to flow out of the tank body to the temporary gas-containing liquid storage part of the flow path. groove. In addition, it can also be exemplified to receive gas-free liquid from the outside, or supply of gas-containing liquid with low gas content, and use a micro-bubble generating device installed in the tank or side wall to turn the predetermined gas into micro-bubbles. To be contained in the liquid (or liquid containing gas), and after dissolving it in the liquid, it is possible to supply a liquid containing gas with a predetermined gas content to the equipment (filling device, etc.) located downstream of the flow path. It is also used as a storage tank for a part of the manufacturing equipment of liquid containing gas.
減壓部也包含藉由閥體移動所做之閥部開閉,降低壓力低於一次側液壓之二次側液壓(減壓)之構件,例如在一次壓力調整閥或二次壓力調整閥(減壓閥)等之外,也包含產生壓損,以使二次側液壓低於一次側之部位(例如流量調整閥、節流孔等)。又,減壓部係利用檢出該減壓部一次側或二次側液壓之壓力偵知器之檢出結果,可使用可控制之減壓部(一次壓力調整閥或二次壓力調整閥(減壓閥)),使得此壓力偵知器所檢出之壓力成為既定值。又,也可使用以手動調整該減壓部之一次側或二次側液壓之減壓部(一次壓力調整閥或二次壓力調整閥(減壓閥))。 The pressure-reducing part also includes components that open and close the valve part by the movement of the valve body to reduce the pressure of the secondary side hydraulic pressure (reduced pressure) lower than the primary side hydraulic pressure. For example, in the primary pressure regulating valve or the secondary pressure regulating valve (reducing In addition to pressure valves), etc., it also includes parts that generate pressure loss so that the secondary side hydraulic pressure is lower than the primary side (e.g., flow control valves, orifices, etc.). In addition, the pressure reducing part uses the detection result of the pressure detector that detects the primary or secondary side hydraulic pressure of the pressure reducing part, and a controllable pressure reducing part (primary pressure regulating valve or secondary pressure regulating valve ( Pressure reducing valve)), so that the pressure detected by this pressure detector becomes the established value. In addition, a pressure reducing unit (primary pressure regulating valve or secondary pressure regulating valve (reducing valve)) to manually adjust the primary or secondary hydraulic pressure of the pressure reducing unit can also be used.
又,延遲部可例舉延遲管部之中,內徑大於其他部位之加大流路剖面積之粗管部。在此粗管部中,含有氣體之 液體之流速降低,所以,在該部分上,可延遲自上游側減壓部流出之含有氣體之液體,到達下游側減壓部或流出口之時間。又,也可例舉含有氣體之液體流過被並列配置之複數流通管內,加大流路剖面積之並列管部。而且,可例舉其他部位與流路剖面積(內徑)係相同,但是,構成為例如U字狀或蛇行狀、螺旋狀等之形態,以故意加長流路之流路延長部。在此情形下,在此流路延長部上,加長流路之部分,可延遲含有氣體之液體到達下游側減壓部或流出口之時間。而且,也可同時採用前述粗管部、並列管部及流路延長部三者中之二者或三者,例如可使粗管部構成U字狀或蛇行狀、螺旋狀之流路延長部。又,也可在一個延遲管部上,設置相同或不同種類之複數延遲部。 In addition, the delay part may be a thick tube part whose inner diameter is larger than other parts of the enlarged flow path cross-sectional area among the delay tube parts. In this thick tube, there is gas The flow rate of the liquid is reduced, so in this part, the time for the gas-containing liquid flowing out of the pressure-reducing section on the upstream side to reach the pressure-reducing section or the outlet on the downstream side can be delayed. In addition, it is also possible to exemplify a parallel pipe section that flows a liquid containing gas through a plurality of flow pipes arranged in parallel to increase the cross-sectional area of the flow path. In addition, other parts may be the same as the cross-sectional area (inner diameter) of the flow path, but the configuration is, for example, U-shaped, serpentine, spiral, etc., to deliberately lengthen the flow path extension of the flow path. In this case, by lengthening the flow path on the extension portion of the flow path, the time for the liquid containing gas to reach the downstream pressure reducing portion or outflow port can be delayed. Moreover, two or three of the aforementioned thick tube part, parallel tube part and flow path extension part can also be used at the same time. For example, the thick tube part can be formed into a U-shaped or meandering or spiral flow path extension part. . Moreover, it is also possible to provide a plurality of delay sections of the same or different types on one delay tube section.
而且,在流路部之中,減壓部間管部及最下游管部中之至少一者之延遲管部包含延遲部。因此,延遲管部係包含一個之情形,也包含複數個之情形。當延遲管部具有複數個時,有時上游側的延遲管部中之下游側減壓部,也相當於下游側的延遲管部中之上游側減壓部。 In addition, among the flow path portions, the delay tube portion of at least one of the inter-decompression-portion tube portion and the most downstream tube portion includes a delay portion. Therefore, the delay tube includes one case as well as multiple cases. When there are a plurality of delay tube parts, sometimes the downstream side pressure reducing part in the upstream side delay tube part is also equivalent to the upstream side pressure reducing part in the downstream side delay tube part.
又,減壓部係存在複數個,所以,當存在一個或複數個減壓部間管部時,最好將各減壓部間管部當作延遲管部,亦即,在各減壓部間管部分別設置延遲部。因為藉在各減壓部間管部分別設置延遲部,包含大量氣泡之含有氣體之液體,到達自下游連接於各減壓部間管部之各下游側減壓部,可抑制在各下游側減壓部無法適切減壓之情形。 In addition, there are a plurality of decompression parts. Therefore, when there are one or more inter-decompression part pipe parts, it is better to treat each decompression part pipe part as a delay pipe part, that is, in each decompression part The intermediate tube part is provided with a delay part respectively. Because the delay part is provided in the pipe between the pressure reducing parts, the gas-containing liquid containing a large number of bubbles reaches the downstream pressure reducing parts connected to the pipe between the pressure reducing parts from the downstream side, and it can be restrained from being on the downstream side. Circumstances where the decompression department cannot properly decompress.
設置於此供應裝置的流出口下游側之機器,可例 舉例如填充含氣泡液體到容器之填充裝置,或者,填充用緩衝槽體。而且,當設置填充裝置時,對應填充之含有氣體之液體及容器,只要選擇眾所周知之填充裝置以使用即可。填充含有氣體之液體之容器,可例舉玻璃瓶、保特瓶、鋼罐、鋁罐、附塞口栓之蒸煮袋、無塞口栓之蒸煮袋等之容器,只要對應液體或含有之既定氣體,適宜選擇容器即可。 The equipment installed on the downstream side of the outlet of this supply device, for example For example, a filling device for filling a liquid with bubbles into a container, or a buffer tank for filling. Moreover, when a filling device is installed, it is sufficient to select a well-known filling device for the liquid and container containing gas to be filled. Containers filled with liquids containing gas, such as glass bottles, bottles, steel cans, aluminum cans, retort bags with stoppers, retort bags without stoppers, etc., as long as they correspond to the liquid or contain the established container For gas, the container can be selected appropriately.
而且,上述含有氣體之液體供應裝置,只要做成前述延遲部係由前述延遲管部之中,流路剖面積大於其他部位之流通管所構成之粗管部之含有氣體之液體供應裝置即可。 Moreover, the above-mentioned gas-containing liquid supply device may be formed as a gas-containing liquid supply device in which the delay portion is a thick tube composed of a flow pipe whose flow path cross-sectional area is larger than that of other parts of the delay tube portion. .
在此含有氣體之液體供應裝置中,延遲部係由粗管部所構成。因此,使流過該延遲部(粗管部)所屬之延遲管部之含有氣體之液體之流速,在粗管部降低,以延遲到達下游側減壓部或流出口之時間,所以,可持續確保延遲時間,縮短延遲管部全體的長度。 In this gas-containing liquid supply device, the delay part is composed of a thick tube part. Therefore, the flow rate of the gas-containing liquid flowing through the delay tube part to which the delay part (thick tube part) belongs is reduced in the thick tube part to delay the time to reach the downstream pressure-reducing part or the outflow port, so it can continue Ensure the delay time and shorten the length of the entire delay pipe.
而且,上述任一者所述之含有氣體之液體供應裝置,只要做成前述延遲部係加長前述延遲管部流路的長度之流路延長部之含有氣體之液體供應裝置即可。 Furthermore, any of the above-mentioned gas-containing liquid supply devices may be configured as a gas-containing liquid supply device in which the delay portion is a flow path extension portion in which the length of the delay tube portion is lengthened.
在此含有氣體之液體供應裝置中,係使延遲部以加長延遲管部流路的長度之流路延長部所構成。因此,在該延遲部(流路延長部)所屬之延遲管部中,可不降低含有氣體之液體之流速,或者,持續抑制流速之降低,延遲到達下游側減壓部或流出口之時間。 In this gas-containing liquid supply device, the delay portion is constituted by a flow path extension portion that increases the length of the flow path of the delay tube portion. Therefore, in the delay tube part to which the delay part (flow path extension part) belongs, the flow rate of the liquid containing gas can be prevented from decreasing, or the decrease in the flow rate can be continuously suppressed, and the time to reach the downstream pressure reducing part or the outflow port can be delayed.
而且,上述任一者所述之含有氣體之液體供應裝置,只要做成上述既定氣體係氫氣,前述含有氣體之液體係含 有氫氣之水之含有氣體之液體供應裝置即可。 Moreover, any of the above-mentioned gas-containing liquid supply devices can be made into the above-mentioned predetermined gas system hydrogen, and the aforementioned gas-containing liquid system contains A liquid supply device containing hydrogen gas and water is sufficient.
當自供應裝置,供給含有氫氣之含氫水(所謂氫氣水)時,產生往設於此供應裝置的流出口下游側之機器(例如氫氣水之填充裝置),欲供給盡量提高氫氣含量之狀態下之含氫水(氫氣水)之期望。相對於此,在此供應裝置中,於延遲管部設置延遲部,所以,隨著減壓,在減壓部正下方之延遲管部處,即使於含氫水大量產生氫氣氣泡,也可直到含氫水到達下游側的下游側減壓部或流出口,使氣泡之大部分或全部再度溶解於含氫水中,使其吸收氣泡。而且,可緩和在該延遲管部下游側的下游側減壓部處之減壓困難性。或者,可供給包含大量氫氣在液中之含氫水,到設於該延遲管部下游之機器(氫氣水之填充裝置)等。 When the hydrogen-containing water (so-called hydrogen water) containing hydrogen is supplied from the supply device, the equipment (such as the filling device of hydrogen water) located at the downstream side of the outlet of the supply device is generated, and it is desired to supply the state of increasing the hydrogen content as much as possible The expectation of hydrogen-containing water (hydrogen water) below. On the other hand, in this supply device, a delay part is provided in the delay tube part. Therefore, as the pressure is reduced, even if a large amount of hydrogen bubbles are generated in the hydrogen-containing water at the delay tube part directly below the pressure reduction part, it can reach The hydrogen-containing water reaches the downstream pressure-reducing part or the outflow port on the downstream side, so that most or all of the bubbles are re-dissolved in the hydrogen-containing water, and the bubbles are absorbed. Furthermore, it is possible to alleviate the difficulty of decompression at the downstream side decompression part on the downstream side of the delay tube part. Alternatively, it is possible to supply hydrogen-containing water containing a large amount of hydrogen in the liquid to a machine (a filling device for hydrogen water) provided downstream of the delay tube.
WT‧‧‧水 WT‧‧‧Water
GL‧‧‧含氫水(含有氣體之液體) GL‧‧‧Hydrogen-containing water (liquid containing gas)
HG‧‧‧氫氣 HG‧‧‧Hydrogen
P1‧‧‧儲槽壓力(第1壓力) P1‧‧‧ Tank pressure (1st pressure)
P2‧‧‧流出口壓力(第2壓力) P2‧‧‧Outlet pressure (2nd pressure)
PM‧‧‧中間壓力 PM‧‧‧Intermediate pressure
1、101‧‧‧含氫水的供應裝置(含有氣體之液體供應裝置) 1. 101‧‧‧Hydrogen-containing water supply device (liquid supply device containing gas)
10‧‧‧控制部 10‧‧‧Control Department
20‧‧‧儲留部 20‧‧‧Reservation Department
21‧‧‧儲槽 21‧‧‧Storage tank
21i‧‧‧(儲槽的)流入口 21i‧‧‧(storage tank) inlet
21o‧‧‧(儲槽的)流出口 21o‧‧‧(storage tank) outlet
22‧‧‧第1壓力偵知器 22‧‧‧The first pressure detector
30、130‧‧‧流路部 30, 130‧‧‧Flow Department
30o‧‧‧(流路部的)流出口 30o‧‧‧(flow path part) outlet
31‧‧‧第1減壓部(減壓部、最上游減壓部、上游側減壓部) 31‧‧‧The first decompression section (decompression section, most upstream decompression section, upstream side decompression section)
32‧‧‧第2減壓部(減壓部、最下游減壓部、下游側減壓部、上游側減壓部) 32‧‧‧Second decompression section (decompression section, most downstream decompression section, downstream side decompression section, upstream side decompression section)
33‧‧‧中間壓力偵知器 33‧‧‧Intermediate pressure detector
34‧‧‧第1管部(最上游管部) 34‧‧‧The first pipe section (the most upstream pipe section)
35‧‧‧第2管部(減壓部間管部、延遲管部) 35‧‧‧Second pipe part (pipe part between decompression department, delay pipe part)
35d‧‧‧粗管延長部(延遲部、粗管部、流路延長部) 35d‧‧‧Thick pipe extension (delay, thick pipe, flow path extension)
35j‧‧‧上游部(延遲管部中之其他部位) 35j‧‧‧Upstream part (other parts of the delay pipe part)
35k‧‧‧下游部(延遲管部中之其他部位) 35k‧‧‧Downstream (other parts of the delay pipe)
36‧‧‧第3管部(最下游管部) 36‧‧‧The third pipe section (the most downstream pipe section)
136‧‧‧第3管部(最下游管部、延遲管部) 136‧‧‧The third pipe (the most downstream pipe, the delayed pipe)
136d‧‧‧管延長部(延遲部、流路延長部) 136d‧‧‧Pipe extension part (delay part, flow path extension part)
136j‧‧‧上游部(延遲管部中之其他部位) 136j‧‧‧Upstream part (other parts of the delay pipe part)
136k‧‧‧下游部(延遲管部中之其他部位) 136k‧‧‧Downstream (other parts of the delay pipe)
第1圖係概略表示關於實施形態,兼用作含氫水之製造,供給含氫水往填充裝置之供應裝置的構成之說明圖。 Fig. 1 is an explanatory diagram schematically showing the configuration of a supply device that also serves as the production of hydrogen-containing water and supplies the hydrogen-containing water to the filling device regarding the embodiment.
第2圖係概略表示關於變形形態,兼用作含氫水之製造,供給含氫水往填充裝置之供應裝置的構成之說明圖。 Fig. 2 is an explanatory diagram schematically showing the configuration of the supply device for the modified form, which is also used for the production of hydrogen-containing water, and the hydrogen-containing water is supplied to the filling device.
使本技術之實施形態,表示於第1圖,參照表示含氫水供應裝置的構成之說明圖以說明之。在本實施形態中,係以供應裝置1,連續製造供給含氫水GL,往填充含氫水GL到容器LP之填充裝置PI。
The embodiment of the present technology is shown in FIG. 1, and it will be described with reference to an explanatory diagram showing the structure of a hydrogen-containing water supply device. In this embodiment, the
含氫水之供應裝置1係包括:儲留部20,儲留含
氫水GL在儲槽21;流路部30,使儲留在儲槽21之含氫水GL,自流出口30o往填充裝置PI流出;以及控制部10,控制這些儲留部20及流路部30之各機器。
The hydrogen-containing
其中,如第1圖所示,儲留部20係往設於儲槽21下部之流入口21i,包括自外部(不含氫氣)供給水WT之給水幫浦41、及防止來自儲槽21之水WT逆流之逆止閥42。被供給到儲槽21之水WT,係充滿儲槽21。而且,如下所述,儲槽21係總是處於滿水狀態,對應自給水幫浦41注入儲槽21之水WT之量之含氫水GL,係自被設於儲槽21上部之流出口21o流出到流路部30。而且,給水幫浦41也可以使用另外設置之流量偵知器,以藉控制部10控制水WT的給水量(流量)。
Among them, as shown in Figure 1, the
循環水JL自設於此儲槽21下部之循環流出口21p流出,此循環水JL係通過循環幫浦24,被供給到微細氣泡產生裝置26的水流入口26w。而且,以循環壓力偵知器25檢出之循環水JL的循環水壓力PJ,係透過未圖示之信號線,被輸入到控制部10,循環幫浦24係透過未圖示之控制線,以控制部10控制,使得循環壓力偵知器25所檢出之循環水壓力PJ成為既定值(例如表壓係PJ=P1+0.2MPa)。另外,氫氣HG係透過流量調整機28,自氫氣鋼瓶HB被供給到微細氣泡產生裝置26的氣體流入口26g。此流量調整機28也透過未圖示之控制線,被控制部10控制,使得本身之氫氣HG供給壓力成為既定值。因此,在微細氣泡產生裝置26中,生成包含既定大小之微細氣泡BB之含氫水GL。
The circulating water JL flows out from the circulating
微細氣泡產生裝置26,係例如專利文獻2(日本特開2000-447號公報)所開示之迴旋式微細氣泡產生裝置,迴旋自水流入口26w注入之水WT(或含氫水GL),同時供給氫氣HG到其中心部分,在水中產生直徑為數10μm以下之多數含氫氣之微細氣泡BB之裝置。因此,包含多數微細氣泡BB之含氫水GL,係自在儲槽21側面開口之循環流入口21q,往儲槽21內被注入。
The fine
如此一來,在儲槽21中,係自此槽體21下部供給(不含氫氣)水WT,同時藉循環幫浦24及微細氣泡產生裝置26,包含多數微細氣泡BB之含氫水GL係被循環注入,所以,當經過某程度之時間後,在儲槽21內的上部,大量氫氣HG溶解,或者,與此同時地包含多數氫氣HG的微細氣泡BB之含氫水GL被常態性地儲留,僅以自流入口21i被供給之水WT之部分,含氫水GL自儲槽21的流出口21o流出到流路部30。
In this way, in the
流路部30係自儲槽21的流出口21o,到達流出口30o之部位。流路部30係在第1減壓部31、第2減壓部32之兩個減壓部之外,還具有連結儲槽21流出口21o與第1減壓部31間之第1管部34、連結第1減壓部31與第2減壓部32間之第2管部35、及連結第2減壓部32與流出口30o間之第3管部36之三個管部。
The
第1減壓部31係相當於減壓部,而且,相當於在複數個減壓部之中,位於最上游側之最上游減壓部。第2減壓部32也相當於減壓部,而且,相當於複數個減壓部之中,位於最下游側之最下游減壓部。又,第1管部34係相當於連結儲槽與做為最上游減壓部之第1減壓部31間之最上游管部。第2管部35係相當於連結第1減壓部31與第2減壓部32間之減壓部間管部。而且,第3管部36係相當於連結第2減壓部32與流出口30o間之最下游管部。
The
而且,如下所述,第2管部35係相當於延遲管部,所以,第1減壓部31係相對於做為延遲管部之第2管部35而言,也相當於自上游側連接之上游側減壓部。同樣地,第2減壓部32相對於做為延遲管部之第2管部35而言,也相當於自下游側連接之下游側減壓部。
Furthermore, as described below, the
而且,在儲槽21上部設有第1壓力偵知器22,檢出自給水幫浦41被供給,被儲留在儲槽21之水WT及含氫水GL之儲槽壓力(第1壓力)P1,透過未圖示之信號線以通知控制部10。
In addition, a
第1減壓部31係藉流出含氫水GL到二次側(下游側)的第2管部35,使一次側(上游側)壓力保持一定之構成之一次壓力調整閥。控制部10係進行第1減壓部31內之閥之開閉以控制,使得第1減壓部31的一次側,亦即,以第1壓力偵知器22檢出之儲槽21中之含氫水GL之儲槽壓力P1,保持在既定值(例如在表壓P1=0.4MPa)。因此,藉由控制部10所做之第1減壓部31的流量控制,使得儲槽21內的含氫水GL之壓力保持在儲槽壓力P1,量與自給水幫浦41被供給之水WT的量相等之含氫水GL,係自流出口21o流出。
The first
在第2管部35之中,於下游部35k設有中間壓力偵知器33,檢出流過此下游部35k(第2管部35)之含氫水
GL的中間壓力PM,透過未圖示之信號線以通知控制部10。
In the
第2減壓部32也係藉流出含氫水GL到二次側(下游側)的第3管部36,使一次側(上游側)的第2管部35中之含氫水GL壓力,保持在一定之構成之一次壓力調整閥。控制部10係進行第2減壓部32內的閥之開閉以控制,使得第2減壓部32的一次側,亦即,第2管部35中之含氫水GL之中間壓力PM保持在既定值(例如在表壓PM=0.2MPa)。因此,藉由控制部10所做之第2減壓部32之流量控制,使得第2管部35內的含氫水GL之壓力保持在中間壓力PM,與流入第2管部35之含氫水GL等量,亦即,與自流出口21o流出者等量之含氫水GL,係流出到第3管部36。
The second
而且,藉此,在第1減壓部31中,變得產生P1-PM(例如P1-PM=0.4-0.2=0.2MPa)部分之減壓。
And, by this, in the
做為第3管部36下游端之流出口30o,係連接於填充裝置PI,自流出口30o流出之含氫水GL,係在填充裝置PI內,被填充到各容器LP。而且,第3管部36中之含氫水GL的流出口壓力(第2壓力)P2,係因為在填充裝置PI中所產生之壓力損失而變動,但是,其係低於中間壓力PM之大小(例如P1=0~0.1MPa)。亦即,在第2減壓部32中,變得產生PM-P2(例如PM-P2=0.2-0~0.1=0.2~0.1MPa)之減壓。
The outflow port 30o at the downstream end of the
如此一來,在本實施形態中,於流路部30中,係使用兩個減壓部31,32,以兩段階地進行含氫水GL之減壓。
In this way, in the present embodiment, in the
而且,在通過第1減壓部31後不久之含氫水GL中,有時因為激烈之減壓(P1-PM部分之減壓),產生大量氫
氣HG之氣泡。因此,例如如第1圖中之虛線RR所示,當第1減壓部31與第2減壓部32間之第2管部35的長度(流路長)較短時,處於包含大量氣泡之狀態下之含氫水GL,到達中間壓力偵知器33,甚至到達第2減壓部32。如此一來,在中間壓力偵知器33中,無法適切檢出第2管部35中之中間壓力PM,第2減壓部32中之壓力控制變得困難。又,處於包含大量氣泡之狀態下之含氫水GL,係有時通過第2減壓部32,以到達其下游的第3管部36,甚至到達填充裝置PI。
In addition, in the hydrogen-containing water GL shortly after passing through the
當供給包含大量氣泡之含氫水GL到填充裝置PI時,在填充含氫水GL到容器LP前,或者在填充時,產生氫氣HG漏出,填充產生障礙,或者,被填充濃度低於期望氫氣濃度之含氫水GL之不良情況。 When the hydrogen-containing water GL containing a large number of bubbles is supplied to the filling device PI, before the hydrogen-containing water GL is filled into the container LP, or during filling, hydrogen gas HG is generated leaking, the filling is obstructed, or the filling concentration is lower than the expected hydrogen gas The undesirable condition of the concentration of hydrogen-containing water GL.
對此,在本實施形態之供應裝置1中,如第1圖中之實線所示,於第1減壓部31與第2減壓部32間之第2管部35上,在上游部35j及下游部35k之外,還設有粗管延長部35d。這些之中,上游部35j及下游部35k係由與第1管部34及第3管部36相同流通管材所構成,所以,內徑及流路剖面積也與這些相同。
In contrast, in the
另外,如第1圖所示,粗管延長部35d係成為由與上游部35j及下游部35k(甚至第1管部34及第3管部36)相比較下,流路剖面積(內徑)較大之流通管所構成之粗管部。具體說來,使粗管延長部35d的內徑,與上游部35j及下游部35k的內徑相比較下,係約2倍(因此流路剖面積係4倍)。使第2管部35的局部為如此之粗管延長部35d之構成,因此,
自第1減壓部31流出之含氫水GL,係可通過此粗管延長部35d,延遲到達第2減壓部32之時間。具體說來,以粗管延長部35d降低含氫水GL之流速(具體說來,係使流速降低至1/4),延遲到達第2減壓部32之時間,所以,可持續確保延遲時間,縮短粗管延長部35d全體的長度。
In addition, as shown in Fig. 1, the
而且,當使粗管延長部35d的流路剖面積(內徑)極端地加大時,當藉洗淨液之流通,洗淨流路部30的內部時,因為此粗管延長部35d,洗淨液之流速變得極端低而洗淨性降低等,有時因為粗管延長部35d太粗而產生不良情況。因此,最好使粗管延長部(粗管部)35d的流路剖面積,係第2管部35其他部分(上游部35j及下游部35k)的流路剖面積之10倍以內。
Furthermore, when the cross-sectional area (inner diameter) of the flow path of the
對此,本實施形態之粗管延長部35d,如第1圖所示,甚至形成為U字狀,自第1減壓部31往中間壓力偵知器33及第2減壓部32之流路,也成為加長流路長度之流路延長部。在本實施形態之粗管延長部35d中,具體說來,其與以第1圖之虛線RR所示流路連結之情形相比較下,構成粗管延長部35d,使得第2管部35的長度成為4倍。因此,可持續抑制此粗管延長部35d中之含氫水GL之流速降低,可延遲到達第2減壓部32之時間。
In contrast, the
亦即,在本實施形態中,於第2管部35中,藉設置粗管延長部35d,其與以第1圖的虛線RR所示之流路連結之情形相比較下,可使自第1減壓部31流出之含氫水GL到達第2減壓部32之時間,延遲16倍左右。
That is, in the present embodiment, by providing a
藉此,在本實施形態中,藉在第2管部35設置粗管延長部35d,其與在第2管部35未設有粗管延長部35d之情形相比較下,可花費時間流過第2管部35,以到達中間壓力偵知器33及第2減壓部32。因此,在此第2管部35中,於通過第1減壓部31後不久之含氫水GL中,即使因為激烈之減壓而產生大量之氫氣HG氣泡,也在含氫水GL到達中間壓力偵知器33及第2減壓部32之前,可使產生於含氫水GL內之氣泡的大部分或全部,再度溶解於含氫水GL以吸收氣泡。因此,可抑制因為氣泡而無法以中間壓力偵知器33適切檢出中間壓力PM之不良情況,可抑制第2減壓部32中之壓力控制變得困難之不良情況。又,也可防止處於包含大量氣泡之狀態下之含氫水GL,通過第2減壓部32以到達其下游的第3管部36,甚至到達填充裝置PI。
Therefore, in the present embodiment, by providing the
如此一來,在本實施形態之含氫水GL的供應裝置1中,係在第2管部35設有粗管延長部35d,藉此,在設於設在儲槽21下游上之流路部30之第1減壓部31中,可抑制由含氫水GL所產生氫氣HG氣泡所致之不良情況。
In this way, in the hydrogen-containing water
(變形形態) (Deformed form)
在上述實施形態之含氫水GL的供應裝置1中,係例示包括兩個減壓部31,32,於做為第1減壓部31與第2減壓部32間之延遲管部之第2管部35,設有做為延遲部之粗管延長部35d。
In the hydrogen-containing water
但是,如第2圖所示,與實施形態同樣地,在第2管部35設置粗管延長部(延遲部)35d之外,也可以在第2減壓部32
下游的第3管部136設置延遲部。亦即,在本變形形態中,於連結做為最下游減壓部之第2減壓部32與流出口30o間之做為最下游管部之第3管部136,也設置做為延遲部之管延長部136d之點上,係與實施形態不同。
However, as shown in FIG. 2, in the same manner as the embodiment, in addition to providing a thick tube extension portion (retardation portion) 35d in the
在本變形形態之含氫水GL的供應裝置101中,於連結第2減壓部32與流出口30o間之第3管部136,係於上游部136j及下游部136k之外,還設有內徑及流路剖面積與這些相同,但是,被形成為螺旋狀及U字狀,流路的長度加長之管延長部(流路延長部)136d。在第3管部136中,因為設有管延長部136d,其與未設有管延長部136d之情形(參照實施形態之第3管部36及第1圖)相比較下,可延遲自第2減壓部32流出之含氫水GL,通過第3管部136以到達流出口30o之時間。
In the hydrogen-containing water
因此,在本變形形態之供應裝置101中,也與實施形態相同地,即使在通過第1減壓部31後不久之含氫水GL中,產生大量氫氣HG之氣泡時,含氫水GL在到達中間壓力偵知器33及第2減壓部32之前,於第2管部35中,可使產生於含氫水GL內之氣泡大部分或全部,再度溶解於含氫水GL以吸收氣泡。因此,可抑制因為氣泡,而無法以中間壓力偵知器33適切檢出中間壓力PM之不良情況,可抑制第2減壓部32中之壓力控制變得困難之不良情況。又,也可防止處於包含大量氣泡之狀態下之含氫水GL,通過第2減壓部32以到達其下游的第3管部136,甚至到達填充裝置PI。
Therefore, in the
此外,在本變形形態之供應裝置101中,藉以第2
減壓部32之減壓,在通過此第2減壓部32後不久之含氫水GL,即使產生大量氫氣HG之氣泡,也在含氫水GL到達流出口30o前,於第3管部136中,可使產生於含氫水GL內之氣泡的大部分或全部,再度溶解於含氫水GL以吸收氣泡。因此,可防止處於包含大量氣泡之狀態下之含氫水GL,通過流出口30o以到達填充裝置PI。
In addition, in the
而且,在上述變形形態之供應裝置101中,雖然例示在第3管部136設有形成為螺旋狀及U字狀之管延長部136d之例,但是,也可以取代管延長部136d,而設置形成為蛇行狀之管延長部。又,也可以取代管延長部136d,而設置由流路剖面積大於其他部位之流通管所構成之粗管部。又,也可以取代管延長部136d,而設置與第2管部35的粗管延長部35d同樣之粗管延長部。
In addition, in the
在前面針對本發明說明過實施形態及變形形態,但是,本發明並不侷限於上述實施形態等,在不脫逸其要旨之範圍內,當然可以適宜變更以適用之。 The embodiments and modified forms of the present invention have been described above, but the present invention is not limited to the above-mentioned embodiments and the like, and it is of course possible to appropriately change and apply them within a scope that does not deviate from the gist of the present invention.
在第1圖及第2圖所示之實施形態及變形形態中,係例示自給水幫浦41供給(不含氫氣之)水WT到儲槽21之例。
In the embodiment and modification shown in FIGS. 1 and 2, an example in which water WT (without hydrogen) is supplied from the
但是,此外,也可以在給水幫浦41的上游,設置含有氫氣HG到水WT中之裝置,自給水幫浦41供給含氫水GL。在此情形中,於儲槽21中,更提高含氫水GL所含氫氣之濃度,所以,與實施形態相同地,也可以在儲槽21設置微細氣泡產生裝置26。或者,也可以不設置微細氣泡產生裝置26,而儲槽21使用暫時性儲留來自給水幫浦41之含氫水GL之槽體。而且,在實施形態中,係做成流出與來自給水幫浦41之水WT等量之含氫水GL到流路部30,連續性地自流出口30o,供給含氫水GL到填充裝置PI之供應裝置1。但是,也可以暫時積存含氫水GL在儲槽21,使積存之部分之含氫水GL通過流路部30以供給,在消耗儲槽21內的含氫水GL後,再度積存含氫水GL到儲槽21。
However, in addition, it is also possible to install a device containing hydrogen HG into the water WT upstream of the
在實施形態中,係例示在第2管部35設置做為延遲部之粗管延長部35d之例。但是,也可以使延遲部為由流路剖面積大於其他部位(上游部35j及下游部35k)之流通管所構成之粗管部,或者,由被並列配置之複數個流通管所構成之並列管部。又,也可以使延遲部以加長延遲管部(第2管部35)的流路長度之流路延長部構成。
In the embodiment, an example is exemplified in which a thick
又,在變形形態中,係例示在第2管部35設有粗管延長部35d之外,於第3管部136也設置管延長部136d之例。但是,因為使以中間壓力偵知器33檢出,且以第2減壓部32控制之中間壓力PM設定較高(例如PM=0.3MPa),而在通過第1減壓部31後不久之含氫水GL,很難產生氣泡,所以,也可以僅在第2減壓部32下游側的第3管部136設置延遲部。亦即,也可以係僅將第3管部136當作延遲管部之構成。
In addition, in the modified form, in addition to the
又,在實施形態及變形形態中,係使用兩個減壓部31,32,以使施加在含氫水GL之壓力,自儲槽壓力(第1壓力)P1減壓至流出口壓力(第2壓力)P2。但是,當欲提高儲槽壓力P1時,也可以使用三個以上之減壓部以減壓之。在此情形中,只要在連結減壓部們之間之兩個以上減壓部間管部之任一者,設置延遲部即可。因為可抑制下游側的減壓部中之壓力調整,由於在含氣泡液體混入大量氣泡而變得困難之情事。又,如上所示,也可以在兩個以上之減壓部間管部之複數個上設置延遲部。又,在兩個以上之減壓部間管部,皆設置延遲部則更佳。另外,也可以與此相反地,當儲槽壓力P1較低時,僅設置一個減壓部,在連結該減壓部與流出口之最下游管部上,與變形形態的第3管部136同樣地,設置延遲部。
In addition, in the embodiment and the modified form, two
又,在實施形態等,第1減壓部31及第2減壓部32,係皆使用使一次側壓力調整成一定之一次壓力調整閥。但是,也可以使用使二次側壓力調整成一定之二次壓力調整閥(減壓閥),以構成供應裝置。
In addition, in the embodiment and the like, both the first
PI‧‧‧填充裝置 PI‧‧‧Filling device
LP‧‧‧容器 LP‧‧‧Container
GL‧‧‧含氫水 GL‧‧‧Hydrogenated water
RR‧‧‧虛線 RR‧‧‧dotted line
WT‧‧‧水 WT‧‧‧Water
P1‧‧‧儲槽壓力(第1壓力) P1‧‧‧ Tank pressure (1st pressure)
P2‧‧‧流出口壓力(第2壓力) P2‧‧‧Outlet pressure (2nd pressure)
PM‧‧‧中間壓力 PM‧‧‧Intermediate pressure
HB‧‧‧氫氣鋼瓶 HB‧‧‧Hydrogen Cylinder
BB‧‧‧微細氣泡 BB‧‧‧Fine bubbles
HG‧‧‧氫氣 HG‧‧‧Hydrogen
JL‧‧‧循環水 JL‧‧‧Circulating water
PJ‧‧‧循環水壓力 PJ‧‧‧Circulating water pressure
1‧‧‧供應裝置 1‧‧‧Supply device
10‧‧‧控制部 10‧‧‧Control Department
20‧‧‧儲留部 20‧‧‧Reservation Department
21‧‧‧儲槽 21‧‧‧Storage tank
21i‧‧‧流入口 21i‧‧‧Inlet
21o‧‧‧流出口 21o‧‧‧Outlet
21p‧‧‧循環流出口 21p‧‧‧Circulating outlet
21q‧‧‧循環流入口 21q‧‧‧Circulating flow inlet
22‧‧‧第1壓力偵知器 22‧‧‧The first pressure detector
24‧‧‧循環幫浦 24‧‧‧Circulating pump
25‧‧‧循環壓力偵知器 25‧‧‧Circulating pressure detector
26‧‧‧微細氣泡產生裝置 26‧‧‧Micro bubble generating device
26g‧‧‧氣體流入口 26g‧‧‧Gas inlet
26w‧‧‧水流入口 26w‧‧‧Water inlet
28‧‧‧流量調整機 28‧‧‧Flow adjuster
30‧‧‧流路部 30‧‧‧Flow Department
30o‧‧‧流出口 30o‧‧‧Outlet
31‧‧‧第1減壓部
31‧‧‧
32‧‧‧第2減壓部 32‧‧‧Second Decompression Department
33‧‧‧中間壓力偵知器 33‧‧‧Intermediate pressure detector
34‧‧‧第1管部
34‧‧‧
35‧‧‧第2管部 35‧‧‧Second Pipe Department
35d‧‧‧粗管延長部 35d‧‧‧Thick pipe extension
35j‧‧‧上游部 35j‧‧‧Upstream
35k‧‧‧下游部 35k‧‧‧Downstream
36‧‧‧第3管部 36‧‧‧Part 3
41‧‧‧給水幫浦 41‧‧‧Water supply pump
42‧‧‧逆止閥 42‧‧‧Check valve
Claims (5)
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JP2009160589A (en) * | 2006-08-23 | 2009-07-23 | Panasonic Electric Works Co Ltd | Gas dissolving apparatus and method of manufacturing gas solution |
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JP2010051846A (en) * | 2008-08-26 | 2010-03-11 | Panasonic Electric Works Co Ltd | Gas dissolving apparatus |
JP2010194440A (en) * | 2009-02-24 | 2010-09-09 | Panasonic Electric Works Co Ltd | Gas-liquid mixing apparatus |
JP2013086076A (en) * | 2011-10-21 | 2013-05-13 | Panasonic Corp | Microbubble generation nozzle |
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