TWI735421B - Laminate, production method and use method thereof, and polymide precursor solttion for lamination on alkali free glass substrate - Google Patents
Laminate, production method and use method thereof, and polymide precursor solttion for lamination on alkali free glass substrate Download PDFInfo
- Publication number
- TWI735421B TWI735421B TW105101851A TW105101851A TWI735421B TW I735421 B TWI735421 B TW I735421B TW 105101851 A TW105101851 A TW 105101851A TW 105101851 A TW105101851 A TW 105101851A TW I735421 B TWI735421 B TW I735421B
- Authority
- TW
- Taiwan
- Prior art keywords
- polyimide
- filler
- glass substrate
- layer
- paa
- Prior art date
Links
- 239000000758 substrate Substances 0.000 title claims abstract description 76
- 239000011521 glass Substances 0.000 title claims abstract description 74
- 238000000034 method Methods 0.000 title claims description 33
- 239000002243 precursor Substances 0.000 title claims description 27
- 238000004519 manufacturing process Methods 0.000 title claims description 17
- 238000003475 lamination Methods 0.000 title description 2
- 239000003513 alkali Substances 0.000 title 1
- 229920001721 polyimide Polymers 0.000 claims abstract description 181
- 239000004642 Polyimide Substances 0.000 claims abstract description 107
- 239000000945 filler Substances 0.000 claims abstract description 105
- 239000011248 coating agent Substances 0.000 claims description 42
- 238000000576 coating method Methods 0.000 claims description 42
- 239000002245 particle Substances 0.000 claims description 19
- 239000011856 silicon-based particle Substances 0.000 claims description 12
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical group [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 11
- 239000007787 solid Substances 0.000 claims description 10
- 229910052799 carbon Inorganic materials 0.000 claims description 6
- 238000001035 drying Methods 0.000 claims description 5
- 238000010438 heat treatment Methods 0.000 claims description 4
- 238000010030 laminating Methods 0.000 claims description 2
- 239000010410 layer Substances 0.000 description 46
- 239000010408 film Substances 0.000 description 44
- 239000002904 solvent Substances 0.000 description 13
- 230000000052 comparative effect Effects 0.000 description 10
- 239000000203 mixture Substances 0.000 description 10
- CBCKQZAAMUWICA-UHFFFAOYSA-N 1,4-phenylenediamine Chemical compound NC1=CC=C(N)C=C1 CBCKQZAAMUWICA-UHFFFAOYSA-N 0.000 description 9
- 230000015572 biosynthetic process Effects 0.000 description 8
- 239000002356 single layer Substances 0.000 description 8
- -1 aromatic tetracarboxylic acids Chemical class 0.000 description 7
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 6
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 6
- 238000006243 chemical reaction Methods 0.000 description 6
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 5
- 235000021355 Stearic acid Nutrition 0.000 description 5
- 239000000853 adhesive Substances 0.000 description 5
- 230000001070 adhesive effect Effects 0.000 description 5
- 150000004984 aromatic diamines Chemical class 0.000 description 5
- QIQXTHQIDYTFRH-UHFFFAOYSA-N octadecanoic acid Chemical compound CCCCCCCCCCCCCCCCCC(O)=O QIQXTHQIDYTFRH-UHFFFAOYSA-N 0.000 description 5
- OQCDKBAXFALNLD-UHFFFAOYSA-N octadecanoic acid Natural products CCCCCCCC(C)CCCCCCCCC(O)=O OQCDKBAXFALNLD-UHFFFAOYSA-N 0.000 description 5
- 239000008117 stearic acid Substances 0.000 description 5
- 238000001029 thermal curing Methods 0.000 description 5
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 4
- 229910052802 copper Inorganic materials 0.000 description 4
- 239000010949 copper Substances 0.000 description 4
- 238000005259 measurement Methods 0.000 description 4
- 150000000000 tetracarboxylic acids Chemical class 0.000 description 4
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 3
- 150000001408 amides Chemical class 0.000 description 3
- WKDNYTOXBCRNPV-UHFFFAOYSA-N bpda Chemical compound C1=C2C(=O)OC(=O)C2=CC(C=2C=C3C(=O)OC(C3=CC=2)=O)=C1 WKDNYTOXBCRNPV-UHFFFAOYSA-N 0.000 description 3
- 239000006229 carbon black Substances 0.000 description 3
- 150000004985 diamines Chemical class 0.000 description 3
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 3
- 229920000642 polymer Polymers 0.000 description 3
- VLDPXPPHXDGHEW-UHFFFAOYSA-N 1-chloro-2-dichlorophosphoryloxybenzene Chemical compound ClC1=CC=CC=C1OP(Cl)(Cl)=O VLDPXPPHXDGHEW-UHFFFAOYSA-N 0.000 description 2
- ARXJGSRGQADJSQ-UHFFFAOYSA-N 1-methoxypropan-2-ol Chemical compound COCC(C)O ARXJGSRGQADJSQ-UHFFFAOYSA-N 0.000 description 2
- HLBLWEWZXPIGSM-UHFFFAOYSA-N 4-Aminophenyl ether Chemical compound C1=CC(N)=CC=C1OC1=CC=C(N)C=C1 HLBLWEWZXPIGSM-UHFFFAOYSA-N 0.000 description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- XTHFKEDIFFGKHM-UHFFFAOYSA-N Dimethoxyethane Chemical compound COCCOC XTHFKEDIFFGKHM-UHFFFAOYSA-N 0.000 description 2
- 239000004952 Polyamide Substances 0.000 description 2
- 239000004793 Polystyrene Substances 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- XSQUKJJJFZCRTK-UHFFFAOYSA-N Urea Chemical compound NC(N)=O XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- 125000003118 aryl group Chemical group 0.000 description 2
- 239000004202 carbamide Substances 0.000 description 2
- 239000000919 ceramic Substances 0.000 description 2
- 239000003795 chemical substances by application Substances 0.000 description 2
- 229910001873 dinitrogen Inorganic materials 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000005401 electroluminescence Methods 0.000 description 2
- 238000011156 evaluation Methods 0.000 description 2
- 229910002804 graphite Inorganic materials 0.000 description 2
- 239000010439 graphite Substances 0.000 description 2
- IPCSVZSSVZVIGE-UHFFFAOYSA-N hexadecanoic acid Chemical compound CCCCCCCCCCCCCCCC(O)=O IPCSVZSSVZVIGE-UHFFFAOYSA-N 0.000 description 2
- 239000004973 liquid crystal related substance Substances 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- 229920002647 polyamide Polymers 0.000 description 2
- 238000006116 polymerization reaction Methods 0.000 description 2
- 229920002223 polystyrene Polymers 0.000 description 2
- 238000002360 preparation method Methods 0.000 description 2
- 229910010271 silicon carbide Inorganic materials 0.000 description 2
- 238000011282 treatment Methods 0.000 description 2
- UWHSPZZUAYSGTB-UHFFFAOYSA-N 1,1,3,3-tetraethylurea Chemical compound CCN(CC)C(=O)N(CC)CC UWHSPZZUAYSGTB-UHFFFAOYSA-N 0.000 description 1
- AVQQQNCBBIEMEU-UHFFFAOYSA-N 1,1,3,3-tetramethylurea Chemical compound CN(C)C(=O)N(C)C AVQQQNCBBIEMEU-UHFFFAOYSA-N 0.000 description 1
- CYSGHNMQYZDMIA-UHFFFAOYSA-N 1,3-Dimethyl-2-imidazolidinon Chemical compound CN1CCN(C)C1=O CYSGHNMQYZDMIA-UHFFFAOYSA-N 0.000 description 1
- WZCQRUWWHSTZEM-UHFFFAOYSA-N 1,3-phenylenediamine Chemical compound NC1=CC=CC(N)=C1 WZCQRUWWHSTZEM-UHFFFAOYSA-N 0.000 description 1
- QWOZZTWBWQMEPD-UHFFFAOYSA-N 1-(2-ethoxypropoxy)propan-2-ol Chemical compound CCOC(C)COCC(C)O QWOZZTWBWQMEPD-UHFFFAOYSA-N 0.000 description 1
- WOOLAEUATDXVIQ-UHFFFAOYSA-N 1-[2-(methoxymethoxy)ethoxy]ethanol Chemical compound COCOCCOC(C)O WOOLAEUATDXVIQ-UHFFFAOYSA-N 0.000 description 1
- RRQYJINTUHWNHW-UHFFFAOYSA-N 1-ethoxy-2-(2-ethoxyethoxy)ethane Chemical compound CCOCCOCCOCC RRQYJINTUHWNHW-UHFFFAOYSA-N 0.000 description 1
- JOLQKTGDSGKSKJ-UHFFFAOYSA-N 1-ethoxypropan-2-ol Chemical compound CCOCC(C)O JOLQKTGDSGKSKJ-UHFFFAOYSA-N 0.000 description 1
- SBASXUCJHJRPEV-UHFFFAOYSA-N 2-(2-methoxyethoxy)ethanol Chemical compound COCCOCCO SBASXUCJHJRPEV-UHFFFAOYSA-N 0.000 description 1
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 1
- WFSMVVDJSNMRAR-UHFFFAOYSA-N 2-[2-(2-ethoxyethoxy)ethoxy]ethanol Chemical compound CCOCCOCCOCCO WFSMVVDJSNMRAR-UHFFFAOYSA-N 0.000 description 1
- WAEVWDZKMBQDEJ-UHFFFAOYSA-N 2-[2-(2-methoxypropoxy)propoxy]propan-1-ol Chemical compound COC(C)COC(C)COC(C)CO WAEVWDZKMBQDEJ-UHFFFAOYSA-N 0.000 description 1
- DXVBKVUMBHVYEL-UHFFFAOYSA-N 2-[amino(benzyl)amino]aniline Chemical compound C=1C=CC=C(N)C=1N(N)CC1=CC=CC=C1 DXVBKVUMBHVYEL-UHFFFAOYSA-N 0.000 description 1
- POAOYUHQDCAZBD-UHFFFAOYSA-N 2-butoxyethanol Chemical compound CCCCOCCO POAOYUHQDCAZBD-UHFFFAOYSA-N 0.000 description 1
- ZNQVEEAIQZEUHB-UHFFFAOYSA-N 2-ethoxyethanol Chemical compound CCOCCO ZNQVEEAIQZEUHB-UHFFFAOYSA-N 0.000 description 1
- 229940093475 2-ethoxyethanol Drugs 0.000 description 1
- HCGFUIQPSOCUHI-UHFFFAOYSA-N 2-propan-2-yloxyethanol Chemical compound CC(C)OCCO HCGFUIQPSOCUHI-UHFFFAOYSA-N 0.000 description 1
- YFIMBOXJHRGCTH-UHFFFAOYSA-N 3,4-diaminoanthracene-1,2-dione Chemical compound C1=CC=C2C=C(C(=O)C(C(N)=C3N)=O)C3=CC2=C1 YFIMBOXJHRGCTH-UHFFFAOYSA-N 0.000 description 1
- DEQUFFZCXSTYJC-UHFFFAOYSA-N 3,4-diphenylbenzene-1,2-diamine Chemical compound C=1C=CC=CC=1C1=C(N)C(N)=CC=C1C1=CC=CC=C1 DEQUFFZCXSTYJC-UHFFFAOYSA-N 0.000 description 1
- GWHLJVMSZRKEAQ-UHFFFAOYSA-N 3-(2,3-dicarboxyphenyl)phthalic acid Chemical compound OC(=O)C1=CC=CC(C=2C(=C(C(O)=O)C=CC=2)C(O)=O)=C1C(O)=O GWHLJVMSZRKEAQ-UHFFFAOYSA-N 0.000 description 1
- NBAUUNCGSMAPFM-UHFFFAOYSA-N 3-(3,4-dicarboxyphenyl)phthalic acid Chemical compound C1=C(C(O)=O)C(C(=O)O)=CC=C1C1=CC=CC(C(O)=O)=C1C(O)=O NBAUUNCGSMAPFM-UHFFFAOYSA-N 0.000 description 1
- QCAHUFWKIQLBNB-UHFFFAOYSA-N 3-(3-methoxypropoxy)propan-1-ol Chemical compound COCCCOCCCO QCAHUFWKIQLBNB-UHFFFAOYSA-N 0.000 description 1
- ZBMISJGHVWNWTE-UHFFFAOYSA-N 3-(4-aminophenoxy)aniline Chemical compound C1=CC(N)=CC=C1OC1=CC=CC(N)=C1 ZBMISJGHVWNWTE-UHFFFAOYSA-N 0.000 description 1
- PQFRTJPVZSPBFI-UHFFFAOYSA-N 3-(trifluoromethyl)benzene-1,2-diamine Chemical compound NC1=CC=CC(C(F)(F)F)=C1N PQFRTJPVZSPBFI-UHFFFAOYSA-N 0.000 description 1
- WECDUOXQLAIPQW-UHFFFAOYSA-N 4,4'-Methylene bis(2-methylaniline) Chemical compound C1=C(N)C(C)=CC(CC=2C=C(C)C(N)=CC=2)=C1 WECDUOXQLAIPQW-UHFFFAOYSA-N 0.000 description 1
- YBRVSVVVWCFQMG-UHFFFAOYSA-N 4,4'-diaminodiphenylmethane Chemical compound C1=CC(N)=CC=C1CC1=CC=C(N)C=C1 YBRVSVVVWCFQMG-UHFFFAOYSA-N 0.000 description 1
- AIVVXPSKEVWKMY-UHFFFAOYSA-N 4-(3,4-dicarboxyphenoxy)phthalic acid Chemical compound C1=C(C(O)=O)C(C(=O)O)=CC=C1OC1=CC=C(C(O)=O)C(C(O)=O)=C1 AIVVXPSKEVWKMY-UHFFFAOYSA-N 0.000 description 1
- LFBALUPVVFCEPA-UHFFFAOYSA-N 4-(3,4-dicarboxyphenyl)phthalic acid Chemical class C1=C(C(O)=O)C(C(=O)O)=CC=C1C1=CC=C(C(O)=O)C(C(O)=O)=C1 LFBALUPVVFCEPA-UHFFFAOYSA-N 0.000 description 1
- BEKFRNOZJSYWKZ-UHFFFAOYSA-N 4-[2-(4-aminophenyl)-1,1,1,3,3,3-hexafluoropropan-2-yl]aniline Chemical compound C1=CC(N)=CC=C1C(C(F)(F)F)(C(F)(F)F)C1=CC=C(N)C=C1 BEKFRNOZJSYWKZ-UHFFFAOYSA-N 0.000 description 1
- ZYEDGEXYGKWJPB-UHFFFAOYSA-N 4-[2-(4-aminophenyl)propan-2-yl]aniline Chemical compound C=1C=C(N)C=CC=1C(C)(C)C1=CC=C(N)C=C1 ZYEDGEXYGKWJPB-UHFFFAOYSA-N 0.000 description 1
- JCRRFJIVUPSNTA-UHFFFAOYSA-N 4-[4-(4-aminophenoxy)phenoxy]aniline Chemical compound C1=CC(N)=CC=C1OC(C=C1)=CC=C1OC1=CC=C(N)C=C1 JCRRFJIVUPSNTA-UHFFFAOYSA-N 0.000 description 1
- KMKWGXGSGPYISJ-UHFFFAOYSA-N 4-[4-[2-[4-(4-aminophenoxy)phenyl]propan-2-yl]phenoxy]aniline Chemical compound C=1C=C(OC=2C=CC(N)=CC=2)C=CC=1C(C)(C)C(C=C1)=CC=C1OC1=CC=C(N)C=C1 KMKWGXGSGPYISJ-UHFFFAOYSA-N 0.000 description 1
- HYDATEKARGDBKU-UHFFFAOYSA-N 4-[4-[4-(4-aminophenoxy)phenyl]phenoxy]aniline Chemical group C1=CC(N)=CC=C1OC1=CC=C(C=2C=CC(OC=3C=CC(N)=CC=3)=CC=2)C=C1 HYDATEKARGDBKU-UHFFFAOYSA-N 0.000 description 1
- 235000021314 Palmitic acid Nutrition 0.000 description 1
- 239000002202 Polyethylene glycol Substances 0.000 description 1
- 241000872198 Serjania polyphylla Species 0.000 description 1
- 239000006087 Silane Coupling Agent Substances 0.000 description 1
- UCKMPCXJQFINFW-UHFFFAOYSA-N Sulphide Chemical compound [S-2] UCKMPCXJQFINFW-UHFFFAOYSA-N 0.000 description 1
- UMVBXBACMIOFDO-UHFFFAOYSA-N [N].[Si] Chemical compound [N].[Si] UMVBXBACMIOFDO-UHFFFAOYSA-N 0.000 description 1
- GTDPSWPPOUPBNX-UHFFFAOYSA-N ac1mqpva Chemical compound CC12C(=O)OC(=O)C1(C)C1(C)C2(C)C(=O)OC1=O GTDPSWPPOUPBNX-UHFFFAOYSA-N 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 150000001335 aliphatic alkanes Chemical class 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 239000004305 biphenyl Substances 0.000 description 1
- 239000005388 borosilicate glass Substances 0.000 description 1
- 229910021393 carbon nanotube Inorganic materials 0.000 description 1
- 239000002041 carbon nanotube Substances 0.000 description 1
- 239000006231 channel black Substances 0.000 description 1
- 238000013329 compounding Methods 0.000 description 1
- 239000007822 coupling agent Substances 0.000 description 1
- 125000006159 dianhydride group Chemical group 0.000 description 1
- 235000014113 dietary fatty acids Nutrition 0.000 description 1
- 229940019778 diethylene glycol diethyl ether Drugs 0.000 description 1
- 229940028356 diethylene glycol monobutyl ether Drugs 0.000 description 1
- XXJWXESWEXIICW-UHFFFAOYSA-N diethylene glycol monoethyl ether Chemical compound CCOCCOCCO XXJWXESWEXIICW-UHFFFAOYSA-N 0.000 description 1
- 229940075557 diethylene glycol monoethyl ether Drugs 0.000 description 1
- SBZXBUIDTXKZTM-UHFFFAOYSA-N diglyme Chemical compound COCCOCCOC SBZXBUIDTXKZTM-UHFFFAOYSA-N 0.000 description 1
- 239000003085 diluting agent Substances 0.000 description 1
- LTYMSROWYAPPGB-UHFFFAOYSA-N diphenyl sulfide Chemical compound C=1C=CC=CC=1SC1=CC=CC=C1 LTYMSROWYAPPGB-UHFFFAOYSA-N 0.000 description 1
- SZXQTJUDPRGNJN-UHFFFAOYSA-N dipropylene glycol Chemical compound OCCCOCCCO SZXQTJUDPRGNJN-UHFFFAOYSA-N 0.000 description 1
- GUVUOGQBMYCBQP-UHFFFAOYSA-N dmpu Chemical compound CN1CCCN(C)C1=O GUVUOGQBMYCBQP-UHFFFAOYSA-N 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- 239000004210 ether based solvent Substances 0.000 description 1
- 239000000194 fatty acid Substances 0.000 description 1
- 229930195729 fatty acid Natural products 0.000 description 1
- 150000004665 fatty acids Chemical class 0.000 description 1
- 230000009477 glass transition Effects 0.000 description 1
- 229910021389 graphene Inorganic materials 0.000 description 1
- 150000003949 imides Chemical class 0.000 description 1
- 150000002466 imines Chemical class 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 238000007561 laser diffraction method Methods 0.000 description 1
- 239000000314 lubricant Substances 0.000 description 1
- 229940018564 m-phenylenediamine Drugs 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002923 metal particle Substances 0.000 description 1
- 239000000178 monomer Substances 0.000 description 1
- NOUUUQMKVOUUNR-UHFFFAOYSA-N n,n'-diphenylethane-1,2-diamine Chemical compound C=1C=CC=CC=1NCCNC1=CC=CC=C1 NOUUUQMKVOUUNR-UHFFFAOYSA-N 0.000 description 1
- WQEPLUUGTLDZJY-UHFFFAOYSA-N n-Pentadecanoic acid Natural products CCCCCCCCCCCCCCC(O)=O WQEPLUUGTLDZJY-UHFFFAOYSA-N 0.000 description 1
- 239000002135 nanosheet Substances 0.000 description 1
- KQSABULTKYLFEV-UHFFFAOYSA-N naphthalene-1,5-diamine Chemical compound C1=CC=C2C(N)=CC=CC2=C1N KQSABULTKYLFEV-UHFFFAOYSA-N 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 239000012299 nitrogen atmosphere Substances 0.000 description 1
- 229920000620 organic polymer Polymers 0.000 description 1
- 150000001282 organosilanes Chemical class 0.000 description 1
- JCGNDDUYTRNOFT-UHFFFAOYSA-N oxolane-2,4-dione Chemical compound O=C1COC(=O)C1 JCGNDDUYTRNOFT-UHFFFAOYSA-N 0.000 description 1
- DYFXGORUJGZJCA-UHFFFAOYSA-N phenylmethanediamine Chemical compound NC(N)C1=CC=CC=C1 DYFXGORUJGZJCA-UHFFFAOYSA-N 0.000 description 1
- 229920001223 polyethylene glycol Polymers 0.000 description 1
- 239000002861 polymer material Substances 0.000 description 1
- 230000000379 polymerizing effect Effects 0.000 description 1
- 229920001451 polypropylene glycol Polymers 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 239000004576 sand Substances 0.000 description 1
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 239000005361 soda-lime glass Substances 0.000 description 1
- 238000005476 soldering Methods 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 125000006158 tetracarboxylic acid group Chemical group 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- BSYVTEYKTMYBMK-UHFFFAOYSA-N tetrahydrofurfuryl alcohol Chemical compound OCC1CCCO1 BSYVTEYKTMYBMK-UHFFFAOYSA-N 0.000 description 1
- 229920006259 thermoplastic polyimide Polymers 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- ZIBGPFATKBEMQZ-UHFFFAOYSA-N triethylene glycol Chemical compound OCCOCCOCCO ZIBGPFATKBEMQZ-UHFFFAOYSA-N 0.000 description 1
- 238000003466 welding Methods 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B17/00—Layered products essentially comprising sheet glass, or glass, slag, or like fibres
- B32B17/06—Layered products essentially comprising sheet glass, or glass, slag, or like fibres comprising glass as the main or only constituent of a layer, next to another layer of a specific material
- B32B17/10—Layered products essentially comprising sheet glass, or glass, slag, or like fibres comprising glass as the main or only constituent of a layer, next to another layer of a specific material of synthetic resin
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B17/00—Layered products essentially comprising sheet glass, or glass, slag, or like fibres
- B32B17/06—Layered products essentially comprising sheet glass, or glass, slag, or like fibres comprising glass as the main or only constituent of a layer, next to another layer of a specific material
- B32B17/10—Layered products essentially comprising sheet glass, or glass, slag, or like fibres comprising glass as the main or only constituent of a layer, next to another layer of a specific material of synthetic resin
- B32B17/10005—Layered products essentially comprising sheet glass, or glass, slag, or like fibres comprising glass as the main or only constituent of a layer, next to another layer of a specific material of synthetic resin laminated safety glass or glazing
- B32B17/1055—Layered products essentially comprising sheet glass, or glass, slag, or like fibres comprising glass as the main or only constituent of a layer, next to another layer of a specific material of synthetic resin laminated safety glass or glazing characterized by the resin layer, i.e. interlayer
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B27/00—Layered products comprising a layer of synthetic resin
- B32B27/06—Layered products comprising a layer of synthetic resin as the main or only constituent of a layer, which is next to another layer of the same or of a different material
- B32B27/08—Layered products comprising a layer of synthetic resin as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
- B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
- B32B27/00—Layered products comprising a layer of synthetic resin
- B32B27/18—Layered products comprising a layer of synthetic resin characterised by the use of special additives
- B32B27/20—Layered products comprising a layer of synthetic resin characterised by the use of special additives using fillers, pigments, thixotroping agents
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B32—LAYERED PRODUCTS
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Abstract
Description
本發明係關於一種積層體、特別是包括具有優異耐熱性及尺寸穩定性之聚醯亞胺層(覆膜)及無鹼玻璃基板之積層體、其製造方法及使用方法、暨無鹼玻璃基板積層用聚醯亞胺前驅體溶液(聚醯亞胺覆膜形成用聚醯亞胺前驅體溶液)。 The present invention relates to a laminated body, particularly a laminated body including a polyimide layer (film) with excellent heat resistance and dimensional stability and an alkali-free glass substrate, its manufacturing method and use method, and an alkali-free glass substrate Polyimide precursor solution for buildup (polyimide precursor solution for polyimide film formation).
習知,於液晶顯示器(LCD)、電漿顯示面板(PDP)、有機電致發光(EL,electroluminescence)顯示器(OLED)等平板顯示器(FPD)、及電子紙等電子裝置之領域中,主要使用玻璃基板上形成有電子元件者,但由於玻璃基板剛直、缺少柔軟性,故存在難以變為可撓性之問題。 Conventionally, it is mainly used in the fields of flat panel displays (FPD) such as liquid crystal displays (LCD), plasma display panels (PDP), organic electroluminescence (EL, electroluminescence) displays (OLED), and electronic devices such as electronic paper Where electronic components are formed on a glass substrate, there is a problem that it is difficult to become flexible due to the rigidity of the glass substrate and lack of flexibility.
因此,提出有將具有可撓性且具有良好之耐熱性及尺寸穩定性之聚醯亞胺等有機高分子材料與玻璃基板進行積層一體化而得之積層體用作基板的方法。 Therefore, a method has been proposed in which a laminate obtained by laminating and integrating an organic polymer material such as polyimide, which has flexibility, good heat resistance and dimensional stability, and a glass substrate, is used as a substrate.
於專利文獻1~3中提出:於玻璃基板上形成具有較低熱膨脹係數(CTE)之聚醯亞胺覆膜並積層一體化,並將其用作用以形成電子元件之基板。此處,聚醯亞胺之CTE係表示聚醯亞胺之尺寸穩定性之指標之一,越接近具有較低CTE之玻璃基板(例如,如專利文獻3中所記載之CTE為4ppm/℃以下之無鹼玻璃基 板)之CTE,則電子元件形成步驟中之高溫處理過程中,於積層體界面所產生之聚醯亞胺之應變越小,聚醯亞胺覆膜之尺寸穩定性越提高。 In Patent Documents 1 to 3, it is proposed that a polyimide film with a lower coefficient of thermal expansion (CTE) is formed on a glass substrate and laminated and integrated, and it is used as a substrate for forming electronic components. Here, the CTE of polyimine is one of the indicators of the dimensional stability of polyimine. Alkali-free glass base The CTE of the board), the smaller the strain of the polyimide generated at the interface of the laminated body during the high-temperature treatment in the electronic component formation step, the more improved the dimensional stability of the polyimide film.
作為上述低熱膨脹係數(CTE)之聚醯亞胺,已知自3,3',4,4'-聯苯四羧酸二酐(BPDA)等芳香族四羧酸類及對苯二胺(PDA)等芳香族二胺所得之聚醯亞胺之CTE較低且具有優異之耐熱性。 As the above-mentioned low thermal expansion coefficient (CTE) polyimide, it is known from 3,3',4,4'-biphenyltetracarboxylic dianhydride (BPDA) and other aromatic tetracarboxylic acids and p-phenylenediamine (PDA) ) Polyimine obtained from aromatic diamines has a low CTE and excellent heat resistance.
於此種積層有聚醯亞胺覆膜之玻璃基板中,於將玻璃基板用作載體用基板之情形時,可藉由於聚醯亞胺覆膜之表面形成電子元件後,最後自玻璃基板剝離聚醯亞胺覆膜而製成可撓性基板。 In such a glass substrate laminated with a polyimide film, when the glass substrate is used as a carrier substrate, the surface of the polyimide film can be used to form electronic components and finally peel off from the glass substrate Polyimide is coated with a film to make a flexible substrate.
[專利文獻1]日本專利特開2002-297054號公報 [Patent Document 1] Japanese Patent Laid-Open No. 2002-297054
[專利文獻2]日本專利特開2012-35583號公報 [Patent Document 2] Japanese Patent Laid-Open No. 2012-35583
[專利文獻3]日本專利特開2014-205327號公報 [Patent Document 3] Japanese Patent Laid-Open No. 2014-205327
然而,習知揭示之聚醯亞胺覆膜係難以使CTE充分變小,其尺寸穩定性並不充分。因此,存在例如自玻璃基板所剝離之聚醯亞胺覆膜易發生捲曲之問題。捲曲之曲率半徑越小,則聚醯亞胺覆膜之操作越繁雜,而於作業性上產生問題。又,聚醯亞胺覆膜自玻璃基板之剝離特性亦並不充分。 However, the polyimide coating system disclosed in the prior art is difficult to sufficiently reduce the CTE, and its dimensional stability is insufficient. Therefore, there is a problem that, for example, the polyimide film peeled from the glass substrate is likely to curl. The smaller the radius of curvature of the curl, the more complicated the operation of polyimide coating will be, which will cause problems in workability. In addition, the peeling characteristics of the polyimide film from the glass substrate are also insufficient.
因此,本發明係解決上述課題者,其目的在於提供一種積層體、該積層體之製造方法及使用方法、以及能夠形成此種聚醯亞胺覆膜之玻璃基板積層用聚醯亞胺前驅體溶液,該積層體係包含聚醯亞胺覆膜及玻璃基板者,自玻璃基板剝離聚醯亞胺覆膜時,具有良好之剝離特性,且所剝離之聚醯亞胺覆膜不易捲曲。 Therefore, the present invention solves the above-mentioned problems, and its object is to provide a laminate, a method of manufacturing and using the laminate, and a polyimide precursor for glass substrate laminates capable of forming such a polyimide film Solution, the laminated system includes polyimide film and glass substrate, when the polyimide film is peeled from the glass substrate, it has good peeling characteristics, and the peeled polyimide film is not easy to curl.
本發明者等人為解決上述課題而銳意研究,結果發現,關於上述積層體,藉由於包含玻璃基板及聚醯亞胺覆膜之積層體中將聚醯亞胺覆膜之構成設為特定者,能夠解決上述課題,從而完成本發明。 The inventors of the present invention have intensively studied to solve the above-mentioned problems, and as a result, they have found that the above-mentioned laminate has a structure of a polyimide coating as a specific one in a laminate including a glass substrate and a polyimide coating. The above-mentioned problems can be solved, and the present invention has been completed.
即,本發明係以下述內容為主旨者。 That is, the present invention has the following content as its main purpose.
(1)一種積層體,其係包含玻璃基板、及形成於該玻璃基板上之包括含填料之聚醯亞胺層之聚醯亞胺覆膜者,其特徵在於上述填料之熱膨脹係數為10ppm/℃以下。 (1) A laminated body comprising a glass substrate and a polyimide film including a polyimide layer containing a filler formed on the glass substrate, characterized in that the thermal expansion coefficient of the filler is 10 ppm/ ℃ below.
(2)如(1)記載之積層體,其中上述聚醯亞胺覆膜包括上述含填料之聚醯亞胺層、及形成於該含填料之聚醯亞胺層上之不含填料之聚醯亞胺層。 (2) The laminate according to (1), wherein the polyimide coating film includes the polyimide layer containing the filler, and the polyimide layer without filler formed on the polyimide layer containing the filler. The imine layer.
(3)如(1)或(2)記載之積層體,其中上述填料係選自由碳粒子、陶瓷粒子及矽粒子所組成之群組中之1種以上之填料。 (3) The laminate according to (1) or (2), wherein the filler is one or more fillers selected from the group consisting of carbon particles, ceramic particles, and silicon particles.
(4)一種積層體之製造方法,係(1)至(3)中任一項記載之積層體之製造方法,其特徵在於:藉由於玻璃基板上塗佈含填料之聚醯亞胺前驅體溶液並加以乾燥、進行熱處理,而形成含填料之聚醯亞胺層。 (4) A method for manufacturing a laminate, which is the method for manufacturing a laminate as described in any one of (1) to (3), characterized by coating a filler-containing polyimide precursor on a glass substrate The solution is dried and heat-treated to form a filler-containing polyimide layer.
(5)一種積層體之使用方法,其特徵在於:將(1)至(3)中任一項 記載之積層體用於電子裝置之製造。 (5) A method of using laminates, characterized in that: any one of (1) to (3) The laminated body described is used in the manufacture of electronic devices.
(6)一種玻璃基板積層用聚醯亞胺前驅體溶液,其特徵在於:含有熱膨脹係數為10ppm/℃以下之填料。 (6) A polyimide precursor solution for glass substrate lamination, characterized in that it contains a filler with a thermal expansion coefficient of 10 ppm/°C or less.
本發明之積層體之聚醯亞胺覆膜因與玻璃基板相接之聚醯亞胺覆膜之CTE充分低,故不易捲曲。即使捲曲,捲曲之曲率半徑亦充分大。又,本發明之積層體因聚醯亞胺覆膜具有良好之剝離性,故能夠適宜地用作製造平板顯示器及可撓性裝置等電子裝置時之積層體。 The polyimide coating film of the laminate of the present invention is not easy to curl because the CTE of the polyimide coating film in contact with the glass substrate is sufficiently low. Even if it is curled, the radius of curvature of the curl is sufficiently large. In addition, the laminate of the present invention can be suitably used as a laminate when manufacturing electronic devices such as flat panel displays and flexible devices because the polyimide coating film has good peelability.
以下,詳細說明本發明 Hereinafter, the present invention will be described in detail
本發明之積層體係包括玻璃基板、及聚醯亞胺覆膜者。作為玻璃基板,例如能夠使用包含鈉鈣玻璃、硼矽酸玻璃、或無鹼玻璃等之基板,該等之中,可較佳地使用無鹼玻璃基板。該等玻璃基板亦可進行矽烷偶合劑處理等公知之表面處理。 The laminated system of the present invention includes a glass substrate and a polyimide film. As the glass substrate, for example, a substrate containing soda lime glass, borosilicate glass, or alkali-free glass can be used. Among these, an alkali-free glass substrate can be preferably used. These glass substrates can also be subjected to well-known surface treatments such as silane coupling agent treatment.
作為上述玻璃基板之厚度,較佳為0.3~5.0mm。若厚度薄於0.3mm,則存在基板之處理性下降之情況。又,若厚度厚於5.0mm,則存在生產性下降之情況。 The thickness of the glass substrate is preferably 0.3 to 5.0 mm. If the thickness is thinner than 0.3mm, there may be a case where the substrate is rationally degraded. In addition, if the thickness is thicker than 5.0 mm, productivity may decrease.
本發明之積層體包含玻璃基板、及形成於該玻璃基板上之包括含填料之聚醯亞胺層之聚醯亞胺覆膜。此處,所謂含填料 之聚醯亞胺層,係指相對於聚醯亞胺層之總質量,填料含量為5質量%以上之聚醯亞胺層。所謂不含填料之聚醯亞胺層,係指填料含量未滿5質量%之聚醯亞胺層。本發明之積層體中,聚醯亞胺層所含之填料係下文詳細描述之CTE為10ppm/℃以下之填料(以下有時簡稱為「特定填料」)者。藉此,能夠確保良好之剝離性。並且因能夠充分降低該聚醯亞胺覆膜之CTE,故能夠充分防止剝離時發生捲曲。即使發生捲曲,亦能夠充分增大捲曲之曲率半徑。若聚醯亞胺覆膜不含特定填料,則因無法充分降低該聚醯亞胺覆膜之CTE,故無法充分防止剝離時發生捲曲。又,存在無法確保剝離性之情況。 The laminate of the present invention includes a glass substrate, and a polyimide coating film including a filler-containing polyimide layer formed on the glass substrate. Here, the so-called filler The polyimide layer refers to a polyimide layer with a filler content of 5% by mass or more relative to the total mass of the polyimide layer. The so-called filler-free polyimide layer refers to a polyimide layer with a filler content of less than 5% by mass. In the laminate of the present invention, the filler contained in the polyimide layer is a filler having a CTE of 10 ppm/°C or less (hereinafter sometimes referred to as "specific filler") as described in detail below. This can ensure good peelability. In addition, since the CTE of the polyimide film can be sufficiently reduced, curling during peeling can be sufficiently prevented. Even if curling occurs, the radius of curvature of the curling can be sufficiently increased. If the polyimide coating film does not contain a specific filler, the CTE of the polyimide coating film cannot be sufficiently reduced, and therefore curling during peeling cannot be sufficiently prevented. In addition, there are cases where the peelability cannot be ensured.
聚醯亞胺覆膜可僅由單層之含特定填料之聚醯亞胺層(以下有時簡稱為「層-1」)構成,亦可設為包括該層-1及不含填料之聚醯亞胺層(以下有時簡稱為「層-2」)之多層構造且將層-1直接與玻璃基板相接。聚醯亞胺層(層-1或層-2)中亦可含有通常於製造聚醯亞胺薄膜時所使用之公知之添加劑(例如,二氧化矽、氧化鋁等滑劑等)等。 The polyimide coating film can be composed of only a single polyimide layer containing specific fillers (hereinafter sometimes referred to as "layer-1"), or it can be composed of a polyimide layer that includes this layer-1 and does not contain fillers. The multi-layer structure of the imide layer (hereinafter sometimes referred to as "layer-2") directly connects the layer-1 with the glass substrate. The polyimide layer (layer-1 or layer-2) may also contain well-known additives (for example, lubricants such as silica, alumina, etc.) commonly used in the production of polyimide films.
所謂聚醯亞胺覆膜(聚醯亞胺層),係指使成為原料之四羧酸類及二胺以大致等莫耳於溶劑中反應,於玻璃基板上塗佈所得之屬於聚醯亞胺前驅體的聚醯胺酸(以下有時簡稱為「PAA」)溶液,並進行乾燥、熱硬化(醯亞胺化)而製成聚醯亞胺覆膜(聚醯亞胺層)者。此處,該自PAA所得之聚醯亞胺較佳為非熱塑性聚醯亞胺,其玻璃轉移溫度較佳為250℃以上。 The so-called polyimide film (polyimide layer) refers to the reaction of tetracarboxylic acids and diamines as raw materials in a solvent at approximately equal moles, and coating on a glass substrate is a polyimide precursor Polyamide acid (hereinafter sometimes abbreviated as "PAA") solution, dried and thermally cured (imidized) to form a polyimide film (polyimide layer). Here, the polyimide obtained from PAA is preferably a non-thermoplastic polyimide, and its glass transition temperature is preferably 250°C or higher.
本發明之積層體中,聚醯亞胺覆膜可為單層亦可為多層,較佳為使用自將芳香族四羧酸類用作四羧酸類之聚醯亞胺所得 之覆膜。此處,作為具有芳香族環之四羧酸類(四羧酸、其二酐或酯化物等),可舉例如均苯四甲酸類、3,3',4,4'-聯苯四羧酸類、2,3,3',4'-聯苯四羧酸類、2,2',3,3'-聯苯四羧酸類、4,4'-氧雙鄰苯二甲酸類、3,3',4,4'-二苯基酮四羧酸類、3,3',4,4'-二苯基碸四羧酸類、對聯三苯四羧酸類、間聯三苯四羧酸類等、及該等之混合物。 In the laminate of the present invention, the polyimide film may be a single layer or multiple layers, and it is preferable to use a polyimide obtained by using aromatic tetracarboxylic acids as tetracarboxylic acids 的膜。 The film. Here, examples of tetracarboxylic acids having an aromatic ring (tetracarboxylic acids, dianhydrides or esters thereof, etc.) include pyromellitic acids, 3,3',4,4'-biphenyltetracarboxylic acids, etc. , 2,3,3',4'-biphenyltetracarboxylic acid, 2,2',3,3'-biphenyltetracarboxylic acid, 4,4'-oxydiphthalic acid, 3,3' ,4,4'-diphenyl ketone tetracarboxylic acid, 3,3',4,4'-diphenyl tetracarboxylic acid, p-triphenyl tetracarboxylic acid, m-triphenyl tetracarboxylic acid, etc., and the And other mixtures.
該等之中,較佳為3,3',4,4'-聯苯四羧酸二酐(BPDA)、均苯四甲酸二酐(PMDA)、及該等之混合物。 Among them, 3,3',4,4'-biphenyltetracarboxylic dianhydride (BPDA), pyromellitic dianhydride (PMDA), and mixtures of these are preferred.
於聚醯亞胺覆膜為多層構造之情形時,芳香族四羧酸類之種類於層-1及層-2之聚醯亞胺中,可相同亦可不同,較佳為相同。 When the polyimide film has a multilayer structure, the types of aromatic tetracarboxylic acids in the polyimide of layer-1 and layer-2 may be the same or different, and are preferably the same.
本發明之積層體中,聚醯亞胺覆膜可為單層亦可為多層,較佳為使用自將芳香族二胺用作二胺之聚醯亞胺所得之覆膜。作為芳香族二胺,可舉例如對苯二胺(PDA)、間苯二胺、4,4'-二胺基二苯醚(ODA)、3,4'-二胺基二苯醚、4,4'-二胺基二苯醚(DADE)、4,4'-二胺基二苯甲烷、3,3'-二甲基-4,4'-二胺基二苯甲烷、2,2-雙[4-(4-胺基苯氧基)苯基]丙烷、1,2-雙(苯胺基)乙烷、二胺基二苯基碸、二胺基苯甲醯苯胺、二胺基苯甲酸酯、二胺基二苯硫醚、2,2-雙(對胺基苯基)丙烷、2,2-雙(對胺基苯基)六氟丙烷、1,5-二胺基萘、二胺基甲苯、二胺基三氟甲苯、1,4-雙(對胺基苯氧基)苯、4,4'-雙(對胺基苯氧基)聯苯、二胺基蒽醌、4,4'-雙(3-胺基苯氧基苯基)二苯基碸等、及該等之混合物。該等芳香族二胺能夠以單一成分或混合物之形式使用。 In the layered product of the present invention, the polyimide coating film may be a single layer or multiple layers, and it is preferable to use a coating film obtained from a polyimide using an aromatic diamine as a diamine. Examples of aromatic diamines include p-phenylenediamine (PDA), m-phenylenediamine, 4,4'-diaminodiphenyl ether (ODA), 3,4'-diaminodiphenyl ether, 4 ,4'-diaminodiphenyl ether (DADE), 4,4'-diaminodiphenylmethane, 3,3'-dimethyl-4,4'-diaminodiphenylmethane, 2,2 -Bis[4-(4-aminophenoxy)phenyl]propane, 1,2-bis(anilino)ethane, diaminodiphenyl benzene, diaminobenzylaniline, diamino Benzoic acid ester, diaminodiphenyl sulfide, 2,2-bis(p-aminophenyl)propane, 2,2-bis(p-aminophenyl)hexafluoropropane, 1,5-diamino Naphthalene, diaminotoluene, diaminobenzotrifluoride, 1,4-bis(p-aminophenoxy)benzene, 4,4'-bis(p-aminophenoxy)biphenyl, diaminoanthracene Quinone, 4,4'-bis(3-aminophenoxyphenyl)diphenyl sulfide, etc., and mixtures of these. These aromatic diamines can be used in the form of a single component or a mixture.
該等之中,較佳為PDA、DADE、ODA及該等之混合物。 Among them, PDA, DADE, ODA, and mixtures of these are preferred.
於聚醯亞胺覆膜為多層構造之情形時,二胺之種類於層-1及層-2之聚醯亞胺中,可相同亦可不同,較佳為相同。 When the polyimide film has a multilayer structure, the type of diamine in the polyimide of layer-1 and layer-2 may be the same or different, and preferably the same.
本發明之積層體中,使用含有CTE為10ppm/℃以下之填料之聚醯亞胺覆膜。作為此種填料,只要CTE為特定範圍內之填料則並無特別限定,可舉例如碳粒子(石墨、碳黑、奈米碳管、碳奈米片材、石墨烯等)、陶瓷粒子(氮化矽、碳化矽等)、矽粒子(CTE為4.7ppm/℃)等。由進一步提高聚醯亞胺覆膜之剝離性及進一步防止捲曲之觀點而言,較佳為碳粒子、矽粒子、或該等之混合物。該等各填料只要CTE為10ppm/℃以下即可,並不妨礙包括其他原子作為雜質。對本發明所使用之填料之CTE之下限並無特別之限制。 In the laminate of the present invention, a polyimide film containing a filler with a CTE of 10 ppm/°C or less is used. Such fillers are not particularly limited as long as the CTE is a filler within a specific range. Examples include carbon particles (graphite, carbon black, carbon nanotubes, carbon nanosheets, graphene, etc.), ceramic particles (nitrogen Silicon carbide, silicon carbide, etc.), silicon particles (CTE is 4.7ppm/℃), etc. From the viewpoint of further improving the peelability of the polyimide film and further preventing curling, carbon particles, silicon particles, or a mixture of these are preferred. As long as the CTE of each of these fillers is 10 ppm/°C or less, it does not prevent the inclusion of other atoms as impurities. There is no particular restriction on the lower limit of the CTE of the filler used in the present invention.
關於填料之CTE值,能夠參照R.E.Taylor,CINDAS Data Series on Materials Properties,Thermal Expansion of Solids,Vol 1-4,ASM International,1998、Welding,Brazing,and Soldering,Vol 6,ASM Handbook,ASM International,1993等之文獻值,填料之CTE是否為10ppm/℃以下亦能夠藉由如下之方法進行判定。即,比較CTE為10~20ppm/℃之不含填料之聚醯亞胺覆膜、及於該聚醯亞胺覆膜中含有相對於覆膜質量為30質量%之填料之聚醯亞胺覆膜的CTE,若含填料之聚醯亞胺覆膜之CTE為不含填料之聚醯亞胺覆膜之CTE以下,則判定該填料之CTE為10ppm/℃以下。反之,若含填料之聚醯亞胺覆膜之CTE超過不含填料之聚醯亞胺覆膜之CTE,則判定該填料之CTE超過10ppm/℃。例如,銅、銀等金屬粒子之CTE超過10ppm/℃,無法用作本發明之積層體之填料。 For the CTE value of the filler, please refer to RETaylor, CINDAS Data Series on Materials Properties, Thermal Expansion of Solids, Vol 1-4, ASM International, 1998, Welding, Brazil, and Soldering, Vol 6, ASM Handbook, ASM International, 1993 According to the literature value, whether the CTE of the filler is 10ppm/℃ or less can also be judged by the following method. That is, compare a polyimide coating film with no filler with a CTE of 10 to 20 ppm/°C and a polyimide coating film containing 30% by mass of filler relative to the mass of the film in the polyimide coating film. The CTE of the film, if the CTE of the polyimide film with filler is less than the CTE of the polyimide film without filler, then the CTE of the filler is determined to be less than 10 ppm/°C. Conversely, if the CTE of the polyimide film with filler exceeds the CTE of the polyimide film without filler, it is determined that the CTE of the filler exceeds 10 ppm/°C. For example, metal particles such as copper and silver have a CTE exceeding 10 ppm/°C and cannot be used as a filler for the laminate of the present invention.
特定填料之平均粒徑範圍較佳設為0.01~2μm左右。此處,平均粒徑係指藉由雷射繞射法所測得之體積基準之測定 值。特定填料之粒子形狀為不定形狀、球狀、方型、線狀等而並無限制,較佳為不定形狀。特定填料之含量相對於聚醯亞胺覆膜之總質量,較佳為設為5~50質量%,更佳為設為10~40質量%,進而較佳為設為20~30質量%。藉由如此,能夠進一步充分降低聚醯亞胺覆膜之CTE,並且能夠進一步確保良好之剝離性。所謂特定填料含量之基準「聚醯亞胺覆膜之總質量」,係指於聚醯亞胺覆膜為單層構造之情形時「構成該單層構造之聚醯亞胺覆膜的含填料之聚醯亞胺層(層-1)之總質量」,於聚醯亞胺覆膜為多層構造之情形時「構成該多層構造之聚醯亞胺覆膜的含填料之聚醯亞胺層(層-1)之總質量」。 The average particle size range of the specific filler is preferably set to about 0.01-2 μm. Here, the average particle size refers to the measurement based on the volume measured by the laser diffraction method value. The particle shape of the specific filler is indefinite, spherical, square, linear, etc., and is not limited, and it is preferably an indefinite shape. The content of the specific filler is preferably 5-50% by mass relative to the total mass of the polyimide coating, more preferably 10-40% by mass, and still more preferably 20-30% by mass. By doing so, the CTE of the polyimide film can be further reduced sufficiently, and good peelability can be further ensured. The so-called standard of specific filler content "total mass of polyimide film" refers to when the polyimide film has a single-layer structure "filler-containing polyimide film that constitutes the single-layer structure The total mass of the polyimide layer (layer-1)", when the polyimide film has a multi-layer structure, "the polyimide layer containing the filler that constitutes the polyimide film of the multi-layer structure The total mass of (layer-1)".
作為聚醯亞胺覆膜之厚度,於聚醯亞胺覆膜為單層構造之情形時,較佳為設為1~50μm。又,於聚醯亞胺覆膜為包括層-1及層-2之多層構造之情形時,作為層-1之厚度,較佳為設為0.1~5μm,更佳為設為0.5~4μm。作為層-2之厚度,較佳為設為5~50μm左右。 As the thickness of the polyimide coating film, when the polyimide coating film has a single-layer structure, it is preferably set to 1 to 50 μm. In addition, when the polyimide film has a multilayer structure including layer-1 and layer-2, the thickness of layer-1 is preferably 0.1 to 5 μm, and more preferably 0.5 to 4 μm. As the thickness of layer-2, it is preferable to set it as about 5-50 micrometers.
本發明之積層體之製造方法之特徵在於:藉由於玻璃基板上塗佈含填料之聚醯亞胺前驅體溶液並乾燥及進行熱處理,而形成含填料之聚醯亞胺層(層-1)。含填料之聚醯亞胺前驅體溶液係含有特定填料之玻璃基板積層用聚醯亞胺前驅體溶液。 The manufacturing method of the laminated body of the present invention is characterized in that the filler-containing polyimide precursor solution is coated on the glass substrate, dried and heat-treated to form a filler-containing polyimide layer (layer-1) . The filler-containing polyimide precursor solution is a polyimide precursor solution for glass substrate laminates containing specific fillers.
詳細而言,例如於聚醯亞胺覆膜具有僅由層-1構成之單層構造之情形時,該聚醯亞胺覆膜例如係藉由以下方式獲得:將於未調配特定填料之PAA溶液(以下有時簡稱為「PAA-S」)中均勻 調配特定填料而成之PAA溶液(以下有時簡稱為「PAA-F」)塗佈於玻璃基板上並進行乾燥後,使PAA熱硬化。該溶液PAA-F係相當於上述含填料之聚醯亞胺前驅體溶液者。作為塗佈後之乾燥溫度,較佳為設為80~150℃。作為熱硬化溫度,較佳為設為350~450℃,更佳為設為380~420℃。再者,熱硬化溫度越高,則有聚醯亞胺覆膜之CTE越降低,但聚醯亞胺覆膜與玻璃基板層間之接著強度越增加,剝離特性越降低之傾向。若熱硬化溫度超過450℃,則有聚醯亞胺覆膜之一部分熱分解之虞。 In detail, for example, when the polyimide film has a single-layer structure composed of only layer-1, the polyimide film is obtained, for example, by the following method: Even in the solution (hereinafter sometimes referred to as "PAA-S") A PAA solution (hereinafter sometimes referred to as "PAA-F") prepared by mixing specific fillers is coated on a glass substrate and dried, and then the PAA is thermally cured. The solution PAA-F is equivalent to the above-mentioned filler-containing polyimide precursor solution. As a drying temperature after coating, it is preferable to set it as 80-150 degreeC. The thermal curing temperature is preferably 350 to 450°C, more preferably 380 to 420°C. Furthermore, the higher the thermal curing temperature, the lower the CTE of the polyimide film, but the more the adhesion strength between the polyimide film and the glass substrate layer increases, the more the peeling characteristics tend to decrease. If the thermal curing temperature exceeds 450°C, a part of the polyimide film may be thermally decomposed.
於均勻調配有特定填料之PAA溶液中能夠調配硬脂酸、棕櫚酸等高級脂肪酸、以及其醯胺及金屬鹽等脫模劑。該等之中,較佳為硬脂酸。作為脫模劑之調配量,相對於聚醯亞胺覆膜之總質量較佳為添加0.01~2質量%,更佳為0.1~1質量%。 In the PAA solution uniformly blended with specific fillers, higher fatty acids such as stearic acid and palmitic acid, as well as release agents such as amides and metal salts can be blended. Among them, stearic acid is preferred. As the compounding amount of the release agent, it is preferable to add 0.01 to 2% by mass, and more preferably 0.1 to 1% by mass relative to the total mass of the polyimide film.
於將特定填料均勻調配於PAA-S時,只要使用行星式混合機、砂磨機、球磨機、噴射磨機、三輥研磨機、攪拌螺旋漿等公知方法均勻地混合即可。亦可於該等PAA溶液中視需要於無損本發明效果之範圍內添加各種界面活性劑及有機矽烷偶合劑般之公知添加物。又,亦可視需要於無損本發明效果之範圍內添加PAA以外之其他聚合物。 When the specific filler is uniformly blended in PAA-S, it is sufficient to uniformly mix it using known methods such as planetary mixer, sand mill, ball mill, jet mill, three-roll mill, and agitating propeller. Various well-known additives such as surfactants and organosilane coupling agents can also be added to these PAA solutions as needed within a range that does not impair the effects of the present invention. In addition, other polymers other than PAA may be added as needed within a range that does not impair the effects of the present invention.
PAA-S例如可藉由使上述芳香族四羧酸二酐與芳香族二胺以大致等莫耳於溶劑中進行聚合反應而獲得。作為上述溶劑,只要為溶解PAA之溶劑,則並無限制,例如可使用醯胺系溶劑、脲系溶劑、醚系溶劑等。 PAA-S can be obtained by, for example, polymerizing the above-mentioned aromatic tetracarboxylic dianhydride and aromatic diamine in a solvent at approximately equal moles. The solvent is not limited as long as it dissolves PAA. For example, an amide solvent, a urea solvent, an ether solvent, etc. can be used.
作為醯胺系溶劑之具體例,可列舉N-甲基-2-吡咯啶酮(NMP)、N,N-二甲基甲醯胺(DMF)、N,N-二甲基乙醯胺(DMAc) 等。又,作為脲系溶劑之具體例,可列舉四甲基脲、四乙基脲、二甲基伸乙脲、二甲基伸丙脲等。又,作為醚系溶劑之具體例,可列舉2-甲氧基乙醇、2-乙氧基乙醇、2-(甲氧基甲氧基)乙氧基乙醇、2-異丙氧基乙醇、2-丁氧基乙醇、四氫呋喃甲醇、二乙二醇、二乙二醇單甲醚、二乙二醇單乙醚、二乙二醇單丁醚、三乙二醇、三乙二醇單乙醚、四乙二醇、1-甲氧基-2-丙醇、1-乙氧基-2-丙醇、二丙二醇、二丙二醇單甲醚、二丙二醇單乙醚、三丙二醇單甲醚、聚乙二醇、聚丙二醇、四氫呋喃、二烷、1,2-二甲氧基乙烷、二乙二醇二甲醚、二乙二醇二乙醚等。該等溶劑能夠單獨使用或以混合物之形式使用。該等之中,較佳為NMP、DMAc,及該等之混合物。 Specific examples of amide-based solvents include N-methyl-2-pyrrolidone (NMP), N,N-dimethylformamide (DMF), and N,N-dimethylacetamide ( DMAc) and so on. In addition, specific examples of urea-based solvents include tetramethylurea, tetraethylurea, dimethylethylene urea, dimethyl propylene urea, and the like. In addition, as specific examples of ether solvents, 2-methoxyethanol, 2-ethoxyethanol, 2-(methoxymethoxy)ethoxyethanol, 2-isopropoxyethanol, 2 -Butoxyethanol, tetrahydrofuran methanol, diethylene glycol, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, diethylene glycol monobutyl ether, triethylene glycol, triethylene glycol monoethyl ether, four Ethylene glycol, 1-methoxy-2-propanol, 1-ethoxy-2-propanol, dipropylene glycol, dipropylene glycol monomethyl ether, dipropylene glycol monoethyl ether, tripropylene glycol monomethyl ether, polyethylene glycol , Polypropylene glycol, tetrahydrofuran, two Alkane, 1,2-Dimethoxyethane, Diethylene Glycol Dimethyl Ether, Diethylene Glycol Diethyl Ether, etc. These solvents can be used alone or in the form of a mixture. Among them, NMP, DMAc, and mixtures of these are preferred.
作為製造PAA溶液時之反應溫度,較佳為-30~70℃,更佳為-15~60℃。又,於該反應中,單體及溶劑之添加順序並無特別限制,可為任意順序。作為聚醯亞胺前驅體之固形份濃度,較佳為1~50質量%,更佳為5~30質量%。該PAA亦可部分經醯亞胺化。再者,該等PAA溶液亦可使用市售品。 As the reaction temperature when producing the PAA solution, it is preferably -30 to 70°C, more preferably -15 to 60°C. In addition, in this reaction, the order of addition of the monomers and solvents is not particularly limited, and may be in any order. The solid content concentration of the polyimide precursor is preferably 1-50% by mass, more preferably 5-30% by mass. The PAA can also be partially imidized. Furthermore, these PAA solutions can also use commercially available products.
又,例如,於聚醯亞胺覆膜具有包括層-1及層-2之多層構造之情形時,於在玻璃基板上形成該聚醯亞胺覆膜時,首先,於玻璃板上塗佈PAA-F並進行乾燥。其次,於該覆膜(層-1)上塗佈PAA-S並進行乾燥而形成層-2後,一併進行熱硬化。作為塗佈後之乾燥溫度,較佳為層-1、層-2共同設為80~150℃。又,作為熱硬化溫度,較佳設為350~450℃,更佳設為380~420℃。再者,塗佈層-1並進行乾燥後,較佳為不進行熱硬化而塗佈PAA-S。藉由如此,能夠提高層-1與層-2之界面之接著強度,製成強固地一體化之聚醯亞胺覆膜。 Also, for example, when the polyimide film has a multilayer structure including layer-1 and layer-2, when the polyimide film is formed on a glass substrate, first, coat the glass plate PAA-F and dry. Next, after coating and drying PAA-S on the coating film (layer-1) to form layer-2, thermal curing is performed together. As the drying temperature after coating, it is preferable that both layer-1 and layer-2 be set to 80 to 150°C. Moreover, as a thermal hardening temperature, 350-450 degreeC is preferable, and 380-420 degreeC is more preferable. Furthermore, after coating layer-1 and drying, it is preferable to coat PAA-S without thermal curing. In this way, the adhesive strength of the interface between layer-1 and layer-2 can be improved, and a polyimide coating film that is strongly integrated can be made.
作為對玻璃基板塗佈PAA-F及對PAA-F覆膜塗佈PAA-S之方法,能夠使用平台塗佈機(table coater)、浸漬塗佈機、棒式塗佈機、旋轉塗佈機、模嘴塗佈機、噴霧塗佈機等公知之方法,以連續式或批次式進行塗佈。 As a method of applying PAA-F to the glass substrate and coating PAA-S to the PAA-F film, a table coater, dip coater, bar coater, spin coater can be used , Nozzle coater, spray coater and other well-known methods, continuous coating or batch coating.
於本發明中,於聚醯亞胺覆膜具有單層構造之情形時亦可於層-1上進一步形成其他聚合物層,於聚醯亞胺覆膜具有多層構造之情形時亦可於層-2上進一步形成其他聚合物層。 In the present invention, when the polyimide film has a single-layer structure, another polymer layer may be further formed on layer-1, and when the polyimide film has a multi-layer structure, it may also be layered. -2 is further formed with other polymer layers.
以上述方式所得之本發明之積層體因於聚醯亞胺覆膜之表面形成電子元件後,能夠自玻璃基板容易地剝離該聚醯亞胺覆膜,故對電子裝置之製造有用。因聚醯亞胺覆膜中含有填料,故相應地與玻璃界面之接著強度變弱,能夠容易地進行剝離。又,於剝離後,形成有電子元件之聚醯亞胺覆膜充分防止捲曲。 The laminate of the present invention obtained in the above manner is useful for the manufacture of electronic devices because the polyimide coating film can be easily peeled off from the glass substrate after the electronic components are formed on the surface of the polyimide coating film. Since the polyimide film contains a filler, the adhesive strength with the glass interface becomes weak accordingly, and it can be easily peeled off. In addition, after peeling, the polyimide film on which the electronic component is formed sufficiently prevents curling.
作為電子元件,能夠使用習知用於電子裝置領域之任何電子元件。電子元件之形成方法能夠採用將聚醯亞胺覆膜(薄膜)用作可撓性基板之電子裝置領域所公知之方法。 As the electronic component, any electronic component conventionally used in the field of electronic devices can be used. The method of forming the electronic component can be a method known in the field of electronic devices that uses a polyimide film (thin film) as a flexible substrate.
作為電子裝置,可舉例如液晶顯示器(LCD)、電漿顯示面板(PDP)、有機EL顯示器(OLED)等平板顯示器(FPD),及電子紙等可撓性裝置。 Examples of electronic devices include flat panel displays (FPD) such as liquid crystal displays (LCD), plasma display panels (PDP), and organic EL displays (OLED), and flexible devices such as electronic paper.
以下根據實施例對本發明進行具體說明,但並不受該等實施例限定。 Hereinafter, the present invention will be described in detail based on examples, but it is not limited by these examples.
於玻璃製反應容器中,於氮氣環境下投入PDA(0.6莫耳)及已脫水之DMAc(聚合溶劑)並進行攪拌,從而溶解PDA。一面將該溶液利用套管冷卻至30℃以下,一面緩緩加入BPDA(0.6莫耳)後,於50℃下進行100分鐘聚合反應,藉此獲得聚醯亞胺前驅體溶液PAA-S1。PAA-S1之固形份濃度為15質量%,利用GPC所得之聚苯乙烯換算之重量平均分子量(Mw)為62000。 In a glass reaction vessel, PDA (0.6 mol) and dehydrated DMAc (polymerization solvent) were put in a nitrogen atmosphere and stirred to dissolve the PDA. While the solution was cooled to below 30°C using a sleeve, BPDA (0.6 mol) was slowly added, and polymerization was carried out at 50°C for 100 minutes, thereby obtaining a polyimide precursor solution PAA-S1. The solid content concentration of PAA-S1 is 15% by mass, and the weight average molecular weight (Mw) converted to polystyrene obtained by GPC is 62,000.
除了將「PDA(0.6莫耳)」設為「PDA(0.5莫耳)及ODA(0.1莫耳)之混合物」以外,以與PAA-S1相同之方式獲得聚醯亞胺前驅體溶液PAA-S2。PAA-S2之固形份濃度為16質量%,利用GPC所得之聚苯乙烯換算之重量平均分子量(Mw)為72000。 Except that "PDA (0.6 mol)" is set to "a mixture of PDA (0.5 mol) and ODA (0.1 mol)", the polyimide precursor solution PAA-S2 is obtained in the same manner as PAA-S1 . The solid content concentration of PAA-S2 is 16% by mass, and the weight average molecular weight (Mw) in terms of polystyrene obtained by GPC is 72,000.
於PAA-S1中加入矽粒子(平均粒徑:0.5μm、CTE:4.7ppm/℃)及已脫水之DMAc(稀釋溶劑),使用行星式混合機進行60分鐘混合處理,獲得固形份為16質量%、矽粒子含量相對於總固形份質量(矽粒子質量+聚醯亞胺換算質量)為30質量%之含填料之聚醯亞胺前驅體溶液PAA-F2。 Add silicon particles (average particle size: 0.5μm, CTE: 4.7ppm/°C) and dehydrated DMAc (diluted solvent) to PAA-S1. Use a planetary mixer for 60 minutes to mix to obtain a solid content of 16 mass. %. The content of silicon particles relative to the total solid mass (mass of silicon particles + polyimide conversion mass) is 30% by mass of the filler-containing polyimide precursor solution PAA-F2.
除了相對於總固形份質量將矽粒子含量設為20質量%以外,以與PAA-F2相同之方式獲得PAA-F3。 PAA-F3 was obtained in the same manner as PAA-F2 except that the content of silicon particles was set to 20% by mass relative to the total solid content.
除了使用石墨粒子(平均粒徑:0.3μm、CTE:0.5ppm/℃)作為填料以外,以與PAA-F2相同之方式獲得PAA-F4。 PAA-F4 was obtained in the same manner as PAA-F2 except that graphite particles (average particle diameter: 0.3 μm, CTE: 0.5 ppm/°C) were used as the filler.
使用碳黑(平均粒徑0.03μm之槽黑、CTE:0.5ppm/℃)作為填料,並相對於總固形份質量將碳黑含量設為23質量%,除此以外,以與PAA-F2相同之方式獲得PAA-F5。 Use carbon black (channel black with an average particle size of 0.03μm, CTE: 0.5ppm/°C) as a filler, and set the carbon black content to 23% by mass relative to the total solid content. Otherwise, it is the same as PAA-F2 The way to obtain PAA-F5.
於PAA-S2中加入矽粒子(平均粒徑:0.5μm、CTE:4.7ppm/℃)、硬脂酸、已脫水之DMAc(稀釋溶劑),使用行星式混合機進行60分鐘混合處理,獲得相對於總固形份質量(矽粒子質量+聚醯亞胺換算質量+硬脂酸)含有矽粒子30質量%、硬脂酸0.5質量%之聚醯亞胺前驅體溶液PAA-F6。 Add silicon particles (average particle size: 0.5μm, CTE: 4.7ppm/℃), stearic acid, dehydrated DMAc (diluent solvent) to PAA-S2, and use a planetary mixer for 60 minutes of mixing to obtain relative A polyimide precursor solution PAA-F6 containing 30% by mass of silicon particles and 0.5% by mass of stearic acid based on the total solid content (mass of silicon particles + mass of polyimide conversion + stearic acid).
除了使用銅粒子(平均粒徑:0.6μm、CTE:17ppm/℃)作為填料以外,以與PAA-F2相同之方式獲得PAA-F7。 PAA-F7 was obtained in the same manner as PAA-F2 except that copper particles (average particle diameter: 0.6 μm, CTE: 17 ppm/°C) were used as a filler.
於厚度0.7mm之無鹼玻璃基板(CTE:3.2ppm/℃)之表面上,藉由平台塗佈機塗佈含填料之聚醯亞胺前驅體溶液PAA-F2,並以130℃乾燥10分鐘,從而形成PAA覆膜。其次,於氮氣氣流下,花費2小時自100℃升溫至400℃後,以400℃進行熱處理2小時,使PAA熱硬化而醯亞胺化。藉此,獲得包括玻璃基板及厚度約15μm之含填料之聚醯亞胺覆膜之積層體A-2。 On the surface of an alkali-free glass substrate (CTE: 3.2ppm/°C) with a thickness of 0.7mm, coat the filler-containing polyimide precursor solution PAA-F2 by a platform coater and dry it at 130°C for 10 minutes , Thereby forming a PAA film. Next, the temperature was raised from 100°C to 400°C in 2 hours under a nitrogen gas stream, and then heat treatment was performed at 400°C for 2 hours to thermally harden the PAA to be imidized. Thereby, a laminate A-2 including a glass substrate and a polyimide coating film containing a filler with a thickness of about 15 μm was obtained.
自積層體A-2剝離聚醯亞胺覆膜,測定CTE,結果CTE為6.3ppm/℃。再者,CTE之測定係藉由以下方式進行:使用珀金埃爾默公司製造之TMA-7,對13mm×3mm之試樣於長度方向施加20mN之負重,測定以10℃/分鐘之升溫速度進行測定時於100℃~250℃中之尺寸變化量。將A-2之聚醯亞胺覆膜之CTE測定結果示於表1。 The polyimide coating film was peeled off from the laminate A-2, and the CTE was measured. As a result, the CTE was 6.3 ppm/°C. Furthermore, the measurement of CTE is carried out by the following method: using TMA-7 manufactured by PerkinElmer, applying a load of 20mN in the length direction of a 13mm×3mm sample, and measuring the heating rate at 10°C/min. The amount of dimensional change between 100°C and 250°C during measurement. Table 1 shows the CTE measurement results of the polyimide film of A-2.
以如下方式評價積層體A-2之聚醯亞胺覆膜與玻璃基板界面之剝離特性。即,根據JIS K6854藉由180°剝離試驗測定聚醯亞胺覆膜與玻璃基板界面之接著強度,於接著強度未滿0.1N/cm之情形時,判定界面之剝離特性為「良好」。相反地,於接著強度為0.1N/cm以上之情形時,判定剝離特性為「不良」。將A-2之剝離特性評價結果示於表1。 The peeling characteristics of the polyimide coating film of the laminate A-2 and the glass substrate interface were evaluated as follows. That is, the adhesive strength of the interface between the polyimide film and the glass substrate was measured by a 180° peel test in accordance with JIS K6854, and when the adhesive strength was less than 0.1 N/cm, the peeling characteristics of the interface were judged to be "good". Conversely, when the adhesive strength is 0.1 N/cm or more, the peeling characteristic is judged to be "bad". Table 1 shows the evaluation results of the peeling characteristics of A-2.
其次,以如下方式評價自積層體所剝離之聚醯亞胺覆膜之捲曲特性。即,測定自玻璃基板剝離並切出10cm正方之聚醯亞胺覆膜之曲率半徑。於該曲率半徑為50mm以上之情形時,判定捲曲特性為「良好」。相反地,於曲率半徑未滿50mm之情形時,判定捲曲特性為「不良」。將由A-2所得之聚醯亞胺覆膜之捲曲特性評價結果示於表1。 Next, the curling characteristics of the polyimide film peeled from the laminate were evaluated in the following manner. That is, the radius of curvature of the polyimide coating film peeled from the glass substrate and cut out in a square of 10 cm was measured. In the case where the radius of curvature is 50 mm or more, the curling characteristic is judged to be "good". Conversely, when the radius of curvature is less than 50 mm, the curling characteristic is judged to be "bad". Table 1 shows the evaluation results of the curling characteristics of the polyimide film obtained in A-2.
除了使用PAA-F3作為含填料之聚醯亞胺前驅體溶液以外,以與實施例2相同之方式獲得包括含填料之聚醯亞胺覆膜之積層體A-3。藉由與實施例2相同之方法測定或評價A-3之覆膜CTE、剝離特性、及捲曲特性並示於表1。 Except that PAA-F3 was used as the filler-containing polyimide precursor solution, a laminate A-3 including a filler-containing polyimide film was obtained in the same manner as in Example 2. The CTE, peeling characteristics, and curling characteristics of the film of A-3 were measured or evaluated by the same method as in Example 2, and are shown in Table 1.
除了使用PAA-F4作為含填料之聚醯亞胺前驅體溶液以外,以與實施例2相同之方式獲得包括含填料之聚醯亞胺覆膜之積層體A-4。藉由與實施例2相同之方法測定或評價A-4之覆膜CTE、剝離特性、及捲曲特性並示於表1。 Except that PAA-F4 was used as the filler-containing polyimide precursor solution, a laminate A-4 including a filler-containing polyimide film was obtained in the same manner as in Example 2. The CTE, peeling characteristics, and curling characteristics of the coating film of A-4 were measured or evaluated by the same method as in Example 2 and shown in Table 1.
除了使用PAA-F5作為含填料之聚醯亞胺前驅體溶液以外,以與實施例2相同之方式獲得包括含填料之聚醯亞胺覆膜之積層體 A-5。藉由與實施例2相同之方法測定或評價A-5之覆膜CTE、剝離特性、及捲曲特性並示於表1。 Except that PAA-F5 was used as the filler-containing polyimide precursor solution, a laminate including a filler-containing polyimide film was obtained in the same manner as in Example 2. A-5. The CTE, peeling characteristics, and curling characteristics of the film of A-5 were measured or evaluated by the same method as in Example 2 and shown in Table 1.
於厚度0.7mm之無鹼玻璃基板(CTE:3.2ppm/℃)之表面上,藉由平台塗佈機塗佈PAA-F6,並以130℃乾燥10分鐘,從而形成PAA覆膜。其次於氮氣氣流下,花費2小時自100℃升溫至380℃後,以380℃進行熱處理2小時,使PAA熱硬化而醯亞胺化。藉此獲得包括玻璃基板及厚度約20μm之含填料之聚醯亞胺覆膜之積層體A-6。藉由與實施例2相同之方法測定或評價A-6之覆膜CTE、剝離特性、及捲曲特性並示於表1。 On the surface of an alkali-free glass substrate (CTE: 3.2ppm/°C) with a thickness of 0.7mm, PAA-F6 was coated by a platform coater and dried at 130°C for 10 minutes to form a PAA film. Next, it took 2 hours to raise the temperature from 100°C to 380°C under a nitrogen stream, and then heat-treated at 380°C for 2 hours to thermally harden the PAA to be imidized. Thereby, a laminate A-6 including a glass substrate and a polyimide coating film containing a filler with a thickness of about 20 μm was obtained. The CTE, peeling characteristics, and curling characteristics of the film of A-6 were measured or evaluated by the same method as in Example 2 and shown in Table 1.
除了使用PAA-S1作為聚醯亞胺前驅體溶液以外,以與實施例2相同之方式獲得包括不含填料之聚醯亞胺覆膜之積層體AR-1。藉由與實施例2相同之方法測定或評價AR-1之覆膜CTE、剝離特性、及捲曲特性並示於表1。 Except for using PAA-S1 as the polyimide precursor solution, a laminate AR-1 including a filler-free polyimide film was obtained in the same manner as in Example 2. The CTE, peeling characteristics, and curling characteristics of the AR-1 film were measured or evaluated by the same method as in Example 2 and shown in Table 1.
除了使用PAA-S2作為含填料之聚醯亞胺前驅體溶液以外,以與實施例2相同之方式獲得包括含填料之聚醯亞胺覆膜之積層體AR-2。藉由與實施例2相同之方法測定或評價AR-2之覆膜CTE、剝離特性、及捲曲特性並示於表1。 Except that PAA-S2 was used as the filler-containing polyimide precursor solution, a laminate AR-2 including a filler-containing polyimide film was obtained in the same manner as in Example 2. The CTE, peeling characteristics, and curling characteristics of the AR-2 film were measured or evaluated by the same method as in Example 2 and shown in Table 1.
除了使用PAA-F7作為含填料之聚醯亞胺前驅體溶液以外,以與實施例2相同之方式獲得包括含填料之聚醯亞胺覆膜之積層體AR-7。藉由與實施例2相同之方法測定或評價AR-7之覆膜CTE、剝離特性、及捲曲特性並示於表1。 Except for using PAA-F7 as the filler-containing polyimide precursor solution, a laminate AR-7 including a filler-containing polyimide film was obtained in the same manner as in Example 2. The CTE, peeling characteristics, and curling characteristics of the AR-7 film were measured or evaluated by the same method as in Example 2 and shown in Table 1.
如表1所示,本發明之積層體A-2~A-6於與玻璃基板相接之層含有特定填料。因此,可知聚醯亞胺覆膜之剝離特性良好,且CTE較低,捲曲特性亦良好。 As shown in Table 1, the laminates A-2 to A-6 of the present invention contain a specific filler in the layer in contact with the glass substrate. Therefore, it can be seen that the peeling characteristics of the polyimide film are good, the CTE is low, and the curling characteristics are also good.
與此相對,可知因於比較例4所示之AR-7之聚醯亞胺覆膜含有填料,故剝離特性良好,但由於作為填料之銅粒子之CTE較高,故而捲曲特性不良。 On the other hand, it can be seen that since the polyimide film of AR-7 shown in Comparative Example 4 contains a filler, the peeling characteristics are good, but because the CTE of the copper particles as the filler is high, the curling characteristics are poor.
又,如比較例2、3所示,可知若為不含填料之聚醯亞胺覆膜,則剝離特性及捲曲特性均不良。 In addition, as shown in Comparative Examples 2 and 3, it can be seen that if it is a polyimide coating film that does not contain a filler, both the peeling characteristic and the curling characteristic are inferior.
於上述無鹼玻璃基板之表面上藉由平台塗佈機塗佈PAA-F2, 並以130℃乾燥10分鐘,從而形成PAA覆膜。其次,恢復至室溫(25℃),於該PAA覆膜上藉由平台塗佈機塗佈PAA-S1,並以130℃乾燥10分鐘,從而形成第2層之PAA覆膜。其次,於氮氣氣流下,花費2小時自100℃升溫至400℃後,以400℃進行熱處理2小時,使PAA熱硬化而醯亞胺化。藉此,獲得包括玻璃基板、及於該玻璃基板上依序形成層-1(含填料之聚醯亞胺層:厚度3μm)與層-2(不含填料之聚醯亞胺層:厚度20μm)所得之聚醯亞胺覆膜(厚度:23μm)的積層體L-2。藉由與實施例2相同之方法評價其剝離特性及捲曲特性並示於表2。 Coat PAA-F2 on the surface of the above-mentioned alkali-free glass substrate by a platform coater, It was dried at 130°C for 10 minutes to form a PAA film. Next, return to room temperature (25°C), apply PAA-S1 on the PAA film with a platform coater, and dry at 130°C for 10 minutes to form a second layer of PAA film. Next, the temperature was raised from 100°C to 400°C in 2 hours under a nitrogen gas stream, and then heat treatment was performed at 400°C for 2 hours to thermally harden the PAA to be imidized. Thereby, a glass substrate, and layer-1 (polyimide layer containing filler: thickness 3μm) and layer-2 (polyimide layer without filler: thickness 20μm) are formed in sequence on the glass substrate. ) The obtained laminate L-2 of polyimide film (thickness: 23 μm). The peeling characteristics and curling characteristics were evaluated by the same method as in Example 2 and shown in Table 2.
除了使用PAA-F3作為層-1形成用以外,以與實施例7相同之方式獲得包括玻璃基板、及於該玻璃基板上依序形成層-1(含填料之聚醯亞胺層:厚度3μm)與層-2(不含填料之聚醯亞胺層:厚度21μm)所得之聚醯亞胺覆膜(厚度:24μm)的積層體L-3。藉由與實施例2相同之方法評價其剝離特性及捲曲特性並示於表2。 Except that PAA-F3 was used for the formation of layer-1, a glass substrate was obtained in the same manner as in Example 7, and layer-1 was sequentially formed on the glass substrate (filler-containing polyimide layer: thickness 3μm ) A laminate L-3 of a polyimide film (thickness: 24 μm) obtained by layer-2 (polyimide layer without filler: thickness 21 μm). The peeling characteristics and curling characteristics were evaluated by the same method as in Example 2 and shown in Table 2.
除了使用PAA-F4作為層-1形成用以外,以與實施例7相同之方式獲得包括玻璃基板、及於該玻璃基板上依序形成層-1(含填料之聚醯亞胺層:厚度2μm)與層-2(不含填料之聚醯亞胺層:厚度20μm)所得之聚醯亞胺覆膜(厚度:22μm)的積層體L-4。藉由與實施例2相同之方法評價其剝離特性及捲曲特性並示於表2。 Except that PAA-F4 was used for the formation of layer-1, a glass substrate was obtained in the same manner as in Example 7, and layer-1 was sequentially formed on the glass substrate (filler-containing polyimide layer: thickness 2μm ) A laminated body L-4 of a polyimide film (thickness: 22 μm) obtained by layer-2 (polyimide layer without filler: thickness 20 μm). The peeling characteristics and curling characteristics were evaluated by the same method as in Example 2 and shown in Table 2.
除了使用PAA-F5作為層-1形成用以外,以與實施例7相同之方式獲得包括玻璃基板、及於該玻璃基板上依序形成層-1(含填料之聚醯亞胺層:厚度2μm)與層-2(不含填料之聚醯亞胺層:厚度21μm)所得之聚醯亞胺覆膜(厚度:23μm)的積層體L-5。藉由與實施例2相同之方法評價其剝離特性及捲曲特性並示於表2。 Except that PAA-F5 was used for the formation of layer-1, the same method as in Example 7 was used to obtain a glass substrate and a layer-1 (filler-containing polyimide layer: thickness 2μm) on the glass substrate. ) A laminate L-5 of a polyimide film (thickness: 23 μm) obtained by layer-2 (polyimide layer without filler: thickness 21 μm). The peeling characteristics and curling characteristics were evaluated by the same method as in Example 2 and shown in Table 2.
除了使用PAA-F6作為層-1形成用以外,以與實施例7相同之方式獲得包括玻璃基板、及於該玻璃基板上依序形成層-1(含填料之聚醯亞胺層:厚度2μm)與層-2(不含填料之聚醯亞胺層:厚度21μm)所得之聚醯亞胺覆膜(厚度:23μm)的積層體L-6。藉由與實施例2相同之方法評價其剝離特性及捲曲特性並示於表2。 Except that PAA-F6 was used for the formation of layer-1, a glass substrate was obtained in the same manner as in Example 7, and layer-1 was sequentially formed on the glass substrate (filler-containing polyimide layer: thickness 2μm ) A laminated body L-6 of a polyimide film (thickness: 23 μm) obtained by layer-2 (polyimide layer without filler: thickness 21 μm). The peeling characteristics and curling characteristics were evaluated by the same method as in Example 2 and shown in Table 2.
除了使用不含填料之PAA-S1作為層-1形成用以外,以與實施例7相同之方式獲得包括玻璃基板、及於該玻璃基板上依序形成層-1(不含填料之聚醯亞胺層:厚度3μm)及層-2(不含填料之聚醯亞胺層:厚度20μm)所得之聚醯亞胺覆膜(厚度:23μm)的積層體LR-1。藉由與實施例2相同之方法評價其剝離特性及捲曲特性並示於表2。 Except that PAA-S1 without filler was used as the formation of layer-1, a glass substrate was obtained in the same manner as in Example 7, and layer-1 (polyamide without filler) was sequentially formed on the glass substrate. Amine layer: thickness of 3μm) and layer-2 (polyimide layer without filler: thickness of 20μm) obtained polyimide film (thickness: 23μm) laminated body LR-1. The peeling characteristics and curling characteristics were evaluated by the same method as in Example 2 and shown in Table 2.
除了使用PAA-F7作為層-1形成用以外,以與實施例7相同之 方式獲得包括玻璃基板、及於該玻璃基板上依序形成層-1(含填料之聚醯亞胺層:厚度3μm)與層-2(不含填料之聚醯亞胺層:厚度20μm)所得之聚醯亞胺覆膜(厚度:23μm)的積層體LR-7後,藉由與實施例2相同之方法評價其剝離特性及捲曲特性並示於表2。 Except that PAA-F7 was used for the formation of layer-1, the same as in Example 7 The method includes the glass substrate, and the layer-1 (polyimide layer containing filler: thickness 3μm) and layer-2 (polyimide layer without filler: thickness 20μm) are sequentially formed on the glass substrate. After the polyimide-coated laminate LR-7 (thickness: 23 μm), the peeling characteristics and curling characteristics were evaluated by the same method as in Example 2 and shown in Table 2.
如表2所示,本發明之積層體L-2~L-6於與玻璃基板相接之層-1含有特定填料。因此,可知剝離特性良好,且層-1之CTE較低,捲曲特性亦良好。 As shown in Table 2, the laminates L-2 to L-6 of the present invention contain a specific filler in the layer-1 in contact with the glass substrate. Therefore, it can be seen that the peeling characteristics are good, the CTE of layer-1 is low, and the curling characteristics are also good.
相對於此,可知因於比較例6所示之LR-7之層-1含有填料,故剝離特性良好,但由於作為填料之銅粒子之CTE較高,故而捲曲特性不良。 On the other hand, it can be seen that since layer-1 of LR-7 shown in Comparative Example 6 contains a filler, the peeling characteristics are good, but since the CTE of the copper particles as the filler is high, the curling characteristics are poor.
又,根據比較例5,可知若使用不含填料之聚醯亞胺覆膜作為層-1,則即使聚醯亞胺覆膜為多層,剝離特性及捲曲特性亦均不良。 In addition, according to Comparative Example 5, it can be seen that if a polyimide film containing no filler is used as the layer-1, even if the polyimide film is multilayered, both peeling characteristics and curling characteristics are inferior.
本發明之積層體因具有良好之剝離性,且剝離之聚醯亞胺覆膜不易捲曲,故藉由於構成該積層體之聚醯亞胺覆膜之表面形成電子元件而可用於電子裝置之製造。 Since the laminate of the present invention has good peelability and the peeled polyimide film is not easy to curl, it can be used for the manufacture of electronic devices by forming electronic components on the surface of the polyimide film constituting the laminate .
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