TWI722580B - Far-infrared emitter - Google Patents

Far-infrared emitter Download PDF

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TWI722580B
TWI722580B TW108134372A TW108134372A TWI722580B TW I722580 B TWI722580 B TW I722580B TW 108134372 A TW108134372 A TW 108134372A TW 108134372 A TW108134372 A TW 108134372A TW I722580 B TWI722580 B TW I722580B
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far
infrared
infrared light
light beam
scattering
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TW108134372A
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TW202112413A (en
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李三良
洪綾秀
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國立臺灣科技大學
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Abstract

A far-infrared (FIR) emitter is disclosed, which includes at least one far-infrared ray source for generating a far-infrared beam, a filter unit for filtering a wavelength range of the far-infrared beam, and a beam expander unit for expanding the far-infrared beam. The FIR emitter can generate a FIR light of a specific wavelength range and cover an enlarged exposure area.

Description

遠紅外線照射器Far infrared irradiator

本發明有關於一種遠紅外線照射器,尤指一種配合濾波及擴束設計,可產生低熱能且高光功率密度的遠紅外線,且可均勻擴散至所需面積之遠紅外線照射器。The present invention relates to a far-infrared irradiator, especially a far-infrared irradiator that is designed to cooperate with filtering and beam expansion, which can generate far-infrared rays with low heat energy and high optical power density, and can evenly diffuse to a required area.

紅外線即是波長介於微波與可見光之間的電磁波,其波長之波段介於760奈米(nm)至1釐米(mm)之間,為波長比紅光長的非可見光。在室溫下,物體所發出的熱輻射大多位於此波段,可應用於工業、軍事、科學及醫學等等,例如,熱成像裝置可以檢測產生熱源的物體之溫度分佈,並作紅外線強度分析加以熱成像顯示。Infrared is an electromagnetic wave with a wavelength between microwaves and visible light. Its wavelength ranges from 760 nanometers (nm) to 1 centimeter (mm). It is invisible light with a longer wavelength than red light. At room temperature, most of the heat radiation emitted by objects is in this band, which can be used in industry, military, science and medicine, etc. For example, thermal imaging devices can detect the temperature distribution of objects that generate heat sources and analyze the intensity of infrared rays. Thermal imaging display.

由於近年環保意識逐漸提升,在環境方面的檢測,例如,氣體偵測、水質汙染等,也常用紅外線譜儀對汙染物質來做吸收量測。依波長範圍區分:近紅外線的波長範圍約0.7~2微米(μm)、中紅外線的波長範圍約3~5微米,而遠紅外線的波長主要是落在6~8微米以上的波段。現今有許多文獻指出,遠紅外線之醫療儀器釋放的遠紅外線對於生物體產生效應,可達到促進血液循環、改善新陳代謝、促使組織生長再生等作用。Due to the gradual increase in environmental protection awareness in recent years, in environmental testing, such as gas detection, water pollution, etc., infrared spectrometers are often used to measure the absorption of pollutants. According to the wavelength range: the wavelength range of near-infrared rays is about 0.7-2 microns (μm), the wavelength range of mid-infrared rays is about 3-5 microns, and the wavelength of far-infrared rays mainly falls in the wavelength band above 6-8 microns. Nowadays, many documents point out that the far-infrared rays emitted by far-infrared medical instruments have an effect on living organisms, which can promote blood circulation, improve metabolism, and promote tissue growth and regeneration.

就照護醫療使用的習知遠紅外線照射器而言,作用在於使用過後可使身體達到消除疲勞、改善血液循環及緩和肌肉痠痛等功效,其紅外線大多是利用近紅外線到遠紅外線波長製作,存在高溫及高功率消耗的問題。照射遠紅外線的升溫效應主要是因為光源的近紅外線與中紅外線造成。然而,在將遠紅外線照射器作為照護醫療使用時,理想的照護光源應為純遠紅外線,而一般利用黑體輻射所產生的紅外線皆非純遠紅外線,必須再經濾波除掉短波長紅外線。As far as the conventional far-infrared irradiator used in care and medical treatment is concerned, its function is to eliminate fatigue, improve blood circulation and relieve muscle soreness after use. Most of its infrared rays are made from near-infrared to far-infrared wavelengths, with high temperatures and high temperatures. The problem of power consumption. The heating effect of irradiating far-infrared rays is mainly caused by the near-infrared and mid-infrared rays of the light source. However, when using the far-infrared irradiator as a care and medical treatment, the ideal care light source should be pure far-infrared rays. Generally, the infrared rays generated by black body radiation are not pure far-infrared rays and must be filtered to remove short-wavelength infrared rays.

其次,習知遠紅外線照射器在使用上雖擁有較大的照射範圍,但相對體積龐大,須損耗較多能源,且使用者可能無法隨意移動。此外,習知遠紅外線照射儀常採加熱較大體積陶瓷板或碳纖維材料方式,耗能且產生高溫,長時間照射易生不適並有燙傷危險,而若只作用在局部部位時,則易造成照射區域的浪費。此外,因用以濾除部分遠紅外線波長的遠紅外線的濾波片較為昂貴,為節省成本,希望使用較小面積的遠紅外線光源經過遠紅外線光濾波器,再將輸出的光擴束以照射較大的面積。而採用較小面積遠紅外線光源,也可以節省耗能。Secondly, although the conventional far-infrared irradiator has a larger irradiation range in use, it is relatively bulky, consumes more energy, and the user may not be able to move at will. In addition, the conventional far-infrared irradiator often uses the method of heating large-volume ceramic plates or carbon fiber materials, which consumes energy and generates high temperatures. Long-term irradiation is prone to discomfort and burns. If it is only applied to a local part, it is easy to cause the irradiation area. Waste. In addition, since the filters used to filter out far-infrared rays of some far-infrared wavelengths are more expensive, in order to save costs, it is desirable to use a smaller-area far-infrared light source to pass through the far-infrared light filter, and then expand the output light to irradiate more Large area. The use of a small-area far-infrared light source can also save energy.

據此,如何能有一種可產生低耗能且高光功率密度的遠紅外線,且可均勻擴散至所需面積之『遠紅外線照射器』,是相關技術領域人士亟待解決之課題。According to this, how to have a "far-infrared irradiator" that can generate low energy consumption and high optical power density, and can evenly diffuse to the required area, is an urgent issue to be solved by those in the related art.

於一實施例中,本發明提出一種遠紅外線照射器,包含: 至少一遠紅外線光源,用以產生一第一遠紅外線光束; 一濾波單元,設置於第一遠紅外線光束之路徑中,用以將第一遠紅外線光束之一波長範圍濾除並形成一第二遠紅外線光束;以及 一擴束單元,提供第二遠紅外線光束通過,並將第二遠紅外線光束擴大形成一第三遠紅外線光束,該擴束單元為一散射結構,其包括: 一散射主體;以及 一散射部,設置於散射主體,散射部具有微結構,第二遠紅外線光束射向散射部後,被散射並擴大形成第三遠紅外線光束。 In one embodiment, the present invention provides a far-infrared irradiator, including: At least one far-infrared light source for generating a first far-infrared light beam; A filter unit arranged in the path of the first far-infrared light beam for filtering out a wavelength range of the first far-infrared light beam and forming a second far-infrared light beam; and A beam expanding unit provides the second far-infrared beam to pass through and expands the second far-infrared beam to form a third far-infrared beam. The beam expanding unit is a scattering structure and includes: A scattering subject; and A scattering part is arranged on the scattering body, and the scattering part has a micro structure. After the second far-infrared light beam is directed to the scattering part, it is scattered and expanded to form a third far-infrared light beam.

請參閱圖1所示,本發明所提供之一種遠紅外線照射器10,包含一遠紅外線光源12、一濾波單元14及一擴束單元16。Please refer to FIG. 1, a far-infrared irradiator 10 provided by the present invention includes a far-infrared light source 12, a filter unit 14 and a beam expanding unit 16.

遠紅外線光源12用以產生一第一遠紅外線光束L1。遠紅外線光源12為以加熱方式且可有效率產生遠紅外線的光源,例如加熱半導體晶片、陶瓷基板、線圈或燈絲、微機電晶片、碳纖維以及其他材料;也可以是遠紅外線發光二極體或遠紅外線雷射。遠紅外線光源12的種類不限,可依使用所需選擇適用之光源。The far-infrared light source 12 is used to generate a first far-infrared light beam L1. The far-infrared light source 12 is a light source that can efficiently generate far-infrared rays by heating, such as heating semiconductor chips, ceramic substrates, coils or filaments, micro-electromechanical chips, carbon fibers, and other materials; it may also be a far-infrared light-emitting diode or far-infrared light source. Infrared laser. The type of the far-infrared light source 12 is not limited, and a suitable light source can be selected according to the needs of use.

濾波單元14設置於第一遠紅外線光束L1之路徑中,用以將第一遠紅外線光束L1之一波長範圍濾除並形成一第二遠紅外線光束L2。濾波單元14之種類不限且可濾除的波長範圍不限,依實際所需設計,濾波單元14可濾除造成高溫之波段,可選擇濾出某一段波長或是濾除較短波長,例如可採用可濾除波長等於或小於6微米之遠紅外線光束之濾波器或濾波片。必須說明的是,本實施例設有一個遠紅外線光源12,除此之外,亦可設置複數個遠紅外線光源12,每一遠紅外線光源12皆可產生一遠紅外光束,並匯集成第一遠紅外線光束L1,而後通過濾波單元14。The filter unit 14 is disposed in the path of the first far-infrared light beam L1 to filter out a wavelength range of the first far-infrared light beam L1 to form a second far-infrared light beam L2. The type of the filter unit 14 is not limited and the range of wavelengths that can be filtered is not limited. According to actual design requirements, the filter unit 14 can filter out the high temperature band, and can choose to filter out a certain wavelength or filter out a shorter wavelength, for example Filters or filters that can filter far-infrared beams with a wavelength equal to or less than 6 microns can be used. It must be noted that this embodiment is provided with a far-infrared light source 12, in addition to that, a plurality of far-infrared light sources 12 can also be provided, and each far-infrared light source 12 can generate a far-infrared light beam and integrate it into the first far-infrared light source. The far-infrared light beam L1 then passes through the filter unit 14.

此外,圖1顯示於遠紅外線光源12與濾波單元14之間可設置一隔熱單元18,用以隔絕遠紅外線光源12與照射標的物間的熱傳導;然而,視遠紅外線光源12本身的封裝及因電性引起之熱能而定,隔熱單元18非必要元件。In addition, FIG. 1 shows that a heat insulation unit 18 can be provided between the far-infrared light source 12 and the filter unit 14 to isolate the heat conduction between the far-infrared light source 12 and the irradiation target; however, depending on the packaging and the far-infrared light source 12 itself The heat insulation unit 18 is not an essential element due to the thermal energy caused by electricity.

請參閱圖1所示,於本實施例中,擴束單元16為一散射結構,其包括散射主體161以及一散射部162,散射部162設置於散射主體161,散射部162具有微結構,散射主體161設有散射部162之面為平面1611、1612,平面1611、1612設有散射部162之面之間具有一小於180度之夾角θ。第二遠紅外線光束L2射向散射部162後,藉由微結構將第二遠紅外線光束L2散射並擴大形成第三遠紅外線光束L3,第三遠紅外線光束L3的照射面積A3大於第二遠紅外線光束L2的照射面積A2。此外,配合光學模擬設計可調整遠紅外線光源12、濾波單元14或擴束單元16之散射光路之角度,使其均勻散射至所需的照射範圍。As shown in FIG. 1, in this embodiment, the beam expanding unit 16 is a scattering structure, which includes a scattering body 161 and a scattering part 162. The scattering part 162 is disposed on the scattering body 161. The scattering part 162 has a microstructure. The surface of the main body 161 with the scattering portion 162 is a plane 1611, 1612, and the surface of the plane 1611, 1612 with the scattering portion 162 has an included angle θ less than 180 degrees. After the second far-infrared light beam L2 is directed to the scattering part 162, the second far-infrared light beam L2 is scattered and enlarged by the microstructure to form a third far-infrared light beam L3. The irradiation area A3 of the third far-infrared light beam L3 is larger than that of the second far-infrared light beam L3. The irradiation area A2 of the light beam L2. In addition, with the optical simulation design, the angle of the scattering light path of the far-infrared light source 12, the filter unit 14 or the beam expansion unit 16 can be adjusted to make it uniformly scattered to the desired irradiation range.

請參閱圖2所示,本實施例所提供之一種遠紅外線照射器20,包含一遠紅外線光源22、一濾波單元24及一擴束單元26。遠紅外線光源22產生一第一遠紅外線光束L1;濾波單元24用以將第一遠紅外線光束L1之一波長範圍濾除並形成一第二遠紅外線光束L2。擴束單元26用以將第二遠紅外線光束L2擴大形成一第三遠紅外線光束L3。Please refer to FIG. 2, a far-infrared irradiator 20 provided by this embodiment includes a far-infrared light source 22, a filtering unit 24 and a beam expanding unit 26. The far-infrared light source 22 generates a first far-infrared light beam L1; the filter unit 24 is used for filtering a wavelength range of the first far-infrared light beam L1 to form a second far-infrared light beam L2. The beam expanding unit 26 is used for expanding the second far-infrared light beam L2 to form a third far-infrared light beam L3.

擴束單元26為一散射結構,其包括散射主體261以及一散射部262,散射部262設置於散射主體261之上,散射部262具有微結構,散射主體261設有散射部262之面為凸弧面2611、2612。本實施例與圖1實施例的主要差異在於,本實施例散射主體261設有散射部262之面為凸弧面2611、2612,至於圖1散射主體161設有散射部162之面為平面1611、1612。The beam expander unit 26 is a scattering structure that includes a scattering body 261 and a scattering part 262. The scattering part 262 is disposed on the scattering body 261. The scattering part 262 has a microstructure. The scattering body 261 has a convex surface. Curved surface 2611, 2612. The main difference between this embodiment and the embodiment in FIG. 1 is that the surface of the scattering body 261 of this embodiment provided with the scattering portion 262 is a convex arc surface 2611, 2612, as for the surface of the scattering body 161 of FIG. 1 where the scattering portion 162 is provided is a flat surface 1611 , 1612.

第二遠紅外線光束L2射向散射部262後,藉由微結構將第二遠紅外線光束L2散射並擴大形成第三遠紅外線光束L3,第三遠紅外線光束L3的照射面積A3大於第二遠紅外線光束L2的照射面積A2。藉由凸弧面2611、2612之弧度設計,可使第二遠紅外線光束L2的散射角度產生變化,而擴大所形成之第三遠紅外線光束L3也能具有不同的照射面積A3。After the second far-infrared light beam L2 is directed to the scattering part 262, the second far-infrared light beam L2 is scattered and expanded by the microstructure to form a third far-infrared light beam L3. The irradiation area A3 of the third far-infrared light beam L3 is larger than that of the second far-infrared light beam. The irradiation area A2 of the light beam L2. With the arc design of the convex arc surface 2611, 2612, the scattering angle of the second far-infrared light beam L2 can be changed, and the expanded third far-infrared light beam L3 can also have a different irradiation area A3.

請參閱圖3所示,本發明所提供之一種遠紅外線照射器30,包含一遠紅外線光源32、一濾波單元34及一擴束單元36。遠紅外線光源32產生一第一遠紅外線光束L1;濾波單元34用以將第一遠紅外線光束L1之一波長範圍濾除並形成一第二遠紅外線光束L2。擴束單元36用以將第二遠紅外線光束L2擴大形成一第三遠紅外線光束L3。Please refer to FIG. 3, a far-infrared irradiator 30 provided by the present invention includes a far-infrared light source 32, a filter unit 34 and a beam expanding unit 36. The far-infrared light source 32 generates a first far-infrared light beam L1; the filter unit 34 is used for filtering a wavelength range of the first far-infrared light beam L1 to form a second far-infrared light beam L2. The beam expanding unit 36 is used for expanding the second far-infrared light beam L2 to form a third far-infrared light beam L3.

本實施例綜合了圖1與圖2實施例結構,擴束單元36為一散射結構,其包括散射主體361以及一散射部362,散射部362設置於散射主體361之上,散射部362具有微結構。散射主體361設有散射部362之面包含兩種形式,其中之一為平面3611,另一為凸弧面3612。This embodiment combines the structures of the embodiments in Figures 1 and 2. The beam expansion unit 36 is a scattering structure that includes a scattering body 361 and a scattering part 362. The scattering part 362 is disposed on the scattering body 361, and the scattering part 362 has a micro structure. The surface of the scattering body 361 provided with the scattering portion 362 includes two forms, one of which is a flat surface 3611 and the other is a convex arc surface 3612.

第二遠紅外線光束L2射向散射部362後,藉由微結構將第二遠紅外線光束L2散射並擴大形成第三遠紅外線光束L3,第三遠紅外線光束L3的照射面積A3大於第二遠紅外線光束L2的照射面積A2。藉由平面3611與凸弧面3612之搭配設計,可使第二遠紅外線光束L2的散射角度產生變化,使擴大所形成之第三遠紅外線光束L3具有不同的照射面積A3。After the second far-infrared light beam L2 is directed to the scattering part 362, the second far-infrared light beam L2 is scattered and expanded by the microstructure to form a third far-infrared light beam L3. The irradiation area A3 of the third far-infrared light beam L3 is larger than that of the second far-infrared light beam. The irradiation area A2 of the light beam L2. With the design of the flat surface 3611 and the convex arc surface 3612, the scattering angle of the second far-infrared light beam L2 can be changed, so that the expanded third far-infrared light beam L3 has a different irradiation area A3.

請參閱圖4所示,本發明所提供之一種遠紅外線照射器40,包含一遠紅外線光源42、一濾波單元44及一擴束單元46。遠紅外線光源42產生一第一遠紅外線光束L1;濾波單元44用以將第一遠紅外線光束L1之一波長範圍濾除並形成一第二遠紅外線光束L2。擴束單元46用以將第二遠紅外線光束L2擴大形成一第三遠紅外線光束L3。Please refer to FIG. 4, a far-infrared irradiator 40 provided by the present invention includes a far-infrared light source 42, a filtering unit 44 and a beam expanding unit 46. The far-infrared light source 42 generates a first far-infrared light beam L1; the filter unit 44 is used for filtering a wavelength range of the first far-infrared light beam L1 to form a second far-infrared light beam L2. The beam expanding unit 46 is used for expanding the second far-infrared light beam L2 to form a third far-infrared light beam L3.

本實施例是圖3實施例之衍生結構,擴束單元46為一散射結構,其包括散射主體461、散射部462及反射部463;散射部462設置於散射主體461之上,散射部462具有微結構,散射主體461設有散射部462之面為平面4611,反射部463為具有反射性質之凸弧面。This embodiment is a derivative structure of the embodiment in FIG. 3, the beam expander unit 46 is a scattering structure, which includes a scattering body 461, a scattering portion 462, and a reflection portion 463; the scattering portion 462 is disposed on the scattering body 461, and the scattering portion 462 has With a micro structure, the surface of the scattering body 461 with the scattering portion 462 is a flat surface 4611, and the reflecting portion 463 is a convex arc surface with reflective properties.

第二遠紅外線光束L2射向擴束單元46後,部分第二遠紅外線光束L2射向散射部462,藉由微結構散射形成散射光束L31;而另一部分第二遠紅外線光束L2射向反射部463,由反射部463反射形成反射光束L32;散射光束L31與反射光束L32匯集形成第三遠紅外線光束L3。第三遠紅外線光束L3的照射面積A3大於第二遠紅外線光束L2的照射面積A2。After the second far-infrared light beam L2 is directed to the beam expanding unit 46, a part of the second far-infrared light beam L2 is directed to the scattering part 462, and the scattered light beam L31 is formed by the microstructure scattering; and the other part of the second far-infrared light beam L2 is directed to the reflecting part 463, the reflection part 463 forms a reflected light beam L32; the scattered light beam L31 and the reflected light beam L32 converge to form a third far-infrared light beam L3. The irradiation area A3 of the third far-infrared light beam L3 is larger than the irradiation area A2 of the second far-infrared light beam L2.

請參閱圖5所示,本發明所提供之一種遠紅外線照射器50,包含一遠紅外線光源52、一濾波單元54及一擴束單元56。遠紅外線光源52產生一第一遠紅外線光束L1;濾波單元54用以將第一遠紅外線光束L1之一波長範圍濾除並形成一第二遠紅外線光束L2。擴束單元56用以將第二遠紅外線光束L2擴大形成一第三遠紅外線光束L3。Please refer to FIG. 5, a far-infrared irradiator 50 provided by the present invention includes a far-infrared light source 52, a filter unit 54 and a beam expanding unit 56. The far-infrared light source 52 generates a first far-infrared light beam L1; the filter unit 54 is used for filtering a wavelength range of the first far-infrared light beam L1 to form a second far-infrared light beam L2. The beam expanding unit 56 is used for expanding the second far-infrared light beam L2 to form a third far-infrared light beam L3.

本實施例是圖4實施例之衍生結構,擴束單元56為一散射結構,其包括散射主體561、散射部562及反射部563;散射部562設置於散射主體561之上,散射部562具有微結構,散射主體561設有散射部562之面為平面5611,本實施例與圖4實施例之差異在於本實施例之反射部563為具有反射性質之平面。This embodiment is a derivative structure of the embodiment in FIG. 4, the beam expanding unit 56 is a scattering structure, which includes a scattering body 561, a scattering part 562, and a reflection part 563; the scattering part 562 is disposed on the scattering body 561, and the scattering part 562 has In the microstructure, the surface of the scattering body 561 provided with the scattering portion 562 is a flat surface 5611. The difference between this embodiment and the embodiment in FIG. 4 is that the reflective portion 563 of this embodiment is a flat surface with reflective properties.

請參閱圖6所示,本實施例所提供之一種遠紅外線照射器60,包含一遠紅外線光源62、一濾波單元64及一擴束單元66。遠紅外線光源62產生一第一遠紅外線光束L1;濾波單元64用以將第一遠紅外線光束L1之一波長範圍濾除並形成一第二遠紅外線光束L2。擴束單元66用以將第二遠紅外線光束L2擴大形成一第三遠紅外線光束L3。Please refer to FIG. 6, a far-infrared irradiator 60 provided by this embodiment includes a far-infrared light source 62, a filter unit 64 and a beam expanding unit 66. The far-infrared light source 62 generates a first far-infrared light beam L1; the filter unit 64 is used for filtering a wavelength range of the first far-infrared light beam L1 to form a second far-infrared light beam L2. The beam expanding unit 66 is used to expand the second far-infrared light beam L2 to form a third far-infrared light beam L3.

擴束單元66為一散射結構,其包括散射主體661以及一散射部662,散射部662設置於散射主體661之上,散射部662具有微結構,散射主體661設有散射部662之面為凸弧面6611。本實施例與圖2實施例的主要差異在於,本實施例的主體661僅具有一凸弧面6611,圖2之主體261具有二凸弧面2611、2612。本實施例的主體661之凸弧面6611亦可置換為圖1、3~5之平面1611、1612、3611、4611、5611。The beam expanding unit 66 is a scattering structure, which includes a scattering body 661 and a scattering part 662. The scattering part 662 is disposed on the scattering body 661. The scattering part 662 has a microstructure. The scattering part 662 has a convex surface. Arc 6611. The main difference between this embodiment and the embodiment of FIG. 2 is that the main body 661 of this embodiment has only one convex arc surface 6611, and the main body 261 of FIG. 2 has two convex arc surfaces 2611, 2612. The convex arc surface 6611 of the main body 661 of this embodiment can also be replaced with the planes 1611, 1612, 3611, 4611, 5611 in FIGS. 1, 3 to 5.

第二遠紅外線光束L2射向散射部662後,藉由微結構將第二遠紅外線光束L2散射並擴大形成第三遠紅外線光束L3,第三遠紅外線光束L3的照射面積A3大於第二遠紅外線光束L2的照射面積A2。藉由凸弧面6611之弧度設計,可使第二遠紅外線光束L2的散射角度產生變化,而擴大所形成之第三遠紅外線光束L3也能具有不同的照射面積A3。After the second far-infrared light beam L2 is directed to the scattering part 662, the second far-infrared light beam L2 is scattered and enlarged by the microstructure to form a third far-infrared light beam L3. The irradiation area A3 of the third far-infrared light beam L3 is larger than that of the second far-infrared light beam. The irradiation area A2 of the light beam L2. With the arc design of the convex arc surface 6611, the scattering angle of the second far-infrared light beam L2 can be changed, and the expanded third far-infrared light beam L3 can also have a different irradiation area A3.

請參閱圖7所示,本發明所提供之一種遠紅外線照射器70,包含一遠紅外線光源72、一濾波單元74及一擴束單元76。遠紅外線光源72產生一第一遠紅外線光束L1;濾波單元74用以將第一遠紅外線光束L1之一波長範圍濾除並形成一第二遠紅外線光束L2。擴束單元76用以將第二遠紅外線光束L2擴大形成一第三遠紅外線光束L3。Please refer to FIG. 7, a far-infrared irradiator 70 provided by the present invention includes a far-infrared light source 72, a filter unit 74 and a beam expanding unit 76. The far-infrared light source 72 generates a first far-infrared light beam L1; the filtering unit 74 is used for filtering a wavelength range of the first far-infrared light beam L1 to form a second far-infrared light beam L2. The beam expanding unit 76 is used for expanding the second far-infrared light beam L2 to form a third far-infrared light beam L3.

於本實施例中,擴束單元76為一反射結構,其包括反射主體761及反射部762,反射部762為凸弧面,本實施例與圖6實施例的主要差異在於,本實施例的擴束單元76為一反射結構且不具有微結構。In this embodiment, the beam expanding unit 76 is a reflective structure, which includes a reflective body 761 and a reflective portion 762. The reflective portion 762 is a convex arc surface. The main difference between this embodiment and the embodiment in FIG. The beam expanding unit 76 is a reflective structure and does not have a microstructure.

第二遠紅外線光束L2射向反射部762後,被反射射出反射主體761並擴大形成第三遠紅外線光束L3,第三遠紅外線光束L3的照射面積A3大於第二遠紅外線光束L2的照射面積A2。可於反射部762設有具有反射性質之鍍膜,以加強第二遠紅外線光束L2的反射性。After the second far-infrared light beam L2 is directed to the reflecting part 762, it is reflected and emitted out of the reflective body 761 to expand to form a third far-infrared light beam L3. The irradiation area A3 of the third far-infrared light beam L3 is larger than the irradiation area A2 of the second far-infrared light beam L2 . A coating with reflective properties can be provided on the reflective portion 762 to enhance the reflectivity of the second far-infrared light beam L2.

值得說明的是,本案申請人於中華民國107年7月16日提出中華民名專利申請,申請案號數:107124431,發明名稱「遠紅外線照射器」,由於具有專利性,因此已接獲經濟部智慧財產局核准審定書,發文日期為中華民國108年8月29日。本案圖4與圖5實施例結合了上述專利發明案之擴束單元為反射結構的技術手段,且本案之散射部與反射部可為平面或凸弧面,使本案對於遠紅外線光束照射面積的變化更具多樣性。It is worth noting that the applicant in this case filed an application for a Chinese national name patent on July 16, 107, the Republic of China. The number of the application is 107124431, and the invention name is "Far Infrared Irradiator". Because of its patentability, it has already received economic The Ministry of Intellectual Property Bureau approved the review and the date of publication is August 29, 108 of the Republic of China. The embodiments of Figures 4 and 5 of the present case combine the technical means of the beam expanding unit of the above patented invention as a reflective structure, and the scattering part and the reflecting part of this case can be flat or convex arc surfaces, so that the area of the far-infrared beam irradiated by this case Changes are more diverse.

圖1至圖7所示實施例顯示本案的擴束單元具有不同的設計態樣,然其目的相同,都是在於擴大第二遠紅外線光束的照射面積。例如,欲達到體積輕巧、攜帶方便之目的而使用晶片形態的遠紅外線光源時,其產生的紅外線光束照射面積一般在5平方公釐(mm 2)以下,因此藉由擴束單元將紅外線光束擴大至所需之面積,例如,3公分x5公分,同時可產生高均勻度之光場。本案之擴束單元(例如圖1至圖7之擴束單元16、26、36、46、56、66、76)與濾波單元(例如圖1至圖7之濾波單元14、24、34、44、54、64、74)可整合成一個單元,同時提供擴束與濾波功能。 The embodiments shown in FIG. 1 to FIG. 7 show that the beam expander unit of this case has different design aspects, but the purpose is the same, which is to expand the irradiation area of the second far-infrared beam. For example, when a chip-shaped far-infrared light source is used for the purpose of lightness and portability, the irradiation area of the infrared beam generated by it is generally less than 5 square millimeters (mm 2 ), so the infrared beam is expanded by the beam expander unit To the required area, for example, 3 cm x 5 cm, at the same time it can produce a highly uniform light field. The beam expander unit of this case (for example, the beam expander unit 16, 26, 36, 46, 56, 66, 76 of Fig. 1 to Fig. 7) and the filter unit (for example, the filter unit 14, 24, 34, 44 of Fig. 1 to Fig. 7) ,54,64,74) can be integrated into a unit, while providing beam expansion and filtering functions.

綜上所述,本發明所提供之遠紅外線照射器,配合濾波鏡及擴束光路設計,可產生低熱能且高光功率密度的遠紅外線,可降低電功率的損耗,具特定波長且體積小、可將遠紅外線均勻擴散至所需面積(例如3公分x5公分)等優點,且可應用於近距離照射(小於10公分)之裝置而不致對皮膚造成傷害,適於各產業技術領域的應用或發展為低功耗且低溫光源之穿戴式或可攜式裝置,例如,具遠紅外線與微波感測器的穿載式醫療模組,可應用於洗腎瘻管之照護。In summary, the far-infrared irradiator provided by the present invention, combined with a filter and a beam expanding optical path design, can generate far-infrared rays with low heat energy and high optical power density, which can reduce the loss of electric power, has a specific wavelength, is small in size, and can be The advantages of uniformly diffusing far-infrared rays to the required area (for example, 3 cm x 5 cm), etc., and can be applied to devices that are irradiated at close distances (less than 10 cm) without causing damage to the skin. It is suitable for the application or development of various industrial technical fields Wearable or portable devices with low power consumption and low temperature light sources. For example, wearable medical modules with far infrared and microwave sensors can be used in the care of dialysis fistula.

雖然本發明已以實施例揭露如上,然其並非用以限定本發明,任何所屬技術領域中具有通常知識者,在不脫離本發明的精神和範圍內,當可作些許的更動與潤飾,故本發明的保護範圍當視後附的申請專利範圍所界定者為準。Although the present invention has been disclosed in the above embodiments, it is not intended to limit the present invention. Anyone with ordinary knowledge in the relevant technical field can make some changes and modifications without departing from the spirit and scope of the present invention. The scope of protection of the present invention shall be determined by the scope of the attached patent application.

10、20、30、40、50、60、70:遠紅外線照射器 12、22、32、42、52、62、72:遠紅外線光源 14、24、34、44、54、64、74:濾波單元 16、26、36、46、56、66、76:擴束單元 161、261、361、461、561、661:散射主體 162、262、362、462、562、662:散射部 1611、1612、3611、4611、5611:平面 2611、2612、3612、6611:凸弧面 463、563、762:反射部 761:反射主體 18:隔熱單元 A2、A3:照射面積 L1:第一遠紅外線光束 L2:第二遠紅外線光束 L3:第三遠紅外線光束 L31:散射光束 L32:反射光束 θ:夾角 10, 20, 30, 40, 50, 60, 70: far infrared irradiator 12, 22, 32, 42, 52, 62, 72: far infrared light source 14, 24, 34, 44, 54, 64, 74: filter unit 16, 26, 36, 46, 56, 66, 76: beam expander unit 161, 261, 361, 461, 561, 661: scattering subject 162, 262, 362, 462, 562, 662: Scattering part 1611, 1612, 3611, 4611, 5611: plane 2611, 2612, 3612, 6611: convex arc 463, 563, 762: reflection part 761: Reflective Subject 18: Thermal insulation unit A2, A3: Irradiation area L1: The first far-infrared beam L2: Second far infrared beam L3: The third far-infrared beam L31: Scattered beam L32: reflected beam θ: included angle

圖1為本發明之一具體實施例之結構示意圖。 圖2至圖7為本發明之不同具體實施例之結構示意圖。 Fig. 1 is a schematic structural diagram of a specific embodiment of the present invention. 2 to 7 are schematic structural diagrams of different specific embodiments of the present invention.

no

10:遠紅外線照射器 10: Far infrared irradiator

12:遠紅外線光源 12: far infrared light source

14:濾波單元 14: Filter unit

16:擴束單元 16: Expanding beam unit

161:散射主體 161: Scattering Subject

1611、1612:平面 1611, 1612: plane

162:散射部 162: Scattering part

18:隔熱單元 18: Thermal insulation unit

A2、A3:照射面積 A2, A3: Irradiation area

L1:第一遠紅外線光束 L1: The first far-infrared beam

L2:第二遠紅外線光束 L2: Second far infrared beam

L3:第三遠紅外線光束 L3: The third far-infrared beam

θ:夾角 θ: included angle

Claims (8)

一種遠紅外線照射器,包含:至少一遠紅外線光源,用以產生一第一遠紅外線光束;一濾波單元,設置於該第一遠紅外線光束之路徑中,用以將該第一遠紅外線光束之一波長範圍濾除並形成一第二遠紅外線光束;以及一擴束單元,提供該第二遠紅外線光束通過,並將該第二遠紅外線光束擴大形成一第三遠紅外線光束,該擴束單元為一散射結構,其包括:一散射主體;以及一散射部,設置於該散射主體,該散射部具有微結構,該第二遠紅外線光束射向該散射部後,被散射並擴大形成該第三遠紅外線光束;該散射主體設有該微結構之面為平面或凸弧面其中至少之一或其結合。 A far-infrared irradiator includes: at least one far-infrared light source for generating a first far-infrared light beam; a filter unit arranged in the path of the first far-infrared light beam for the first far-infrared light beam A wavelength range filters and forms a second far-infrared beam; and a beam expanding unit for providing the second far-infrared beam to pass through and expanding the second far-infrared beam to form a third far-infrared beam, the beam expanding unit It is a scattering structure, which includes: a scattering body; and a scattering part disposed on the scattering body. The scattering part has a micro structure. After the second far-infrared light beam is directed to the scattering part, it is scattered and expanded to form the first scattering part. Three far-infrared light beams; the surface of the scattering body provided with the microstructure is at least one of a flat surface or a convex arc surface or a combination thereof. 如申請專利範圍第1項所述之遠紅外線照射器,其中該散射主體設有該微結構之面為二平面,該二平面設有該散射部之面之間具有一小於180度之夾角。 The far-infrared irradiator described in the first item of the scope of patent application, wherein the surface of the scattering body provided with the microstructure is two planes, and the two planes with the scattering portion have an included angle of less than 180 degrees. 如申請專利範圍第1項所述之遠紅外線照射器,其中該散射主體更包括一反射部,該反射部具有反射性質,部分該第二遠紅外線光束射向該散射部,由該微結構散射形成散射光束;另一部分該第二遠紅外線光束射向該反射部,由該反射部反射形成反射光束;該散射光束與該反射光束匯集形成該第三遠紅外線光束。 The far-infrared irradiator described in the first item of the scope of patent application, wherein the scattering body further includes a reflecting part, the reflecting part has reflective properties, and part of the second far-infrared light beam is directed to the scattering part and is scattered by the microstructure A scattered light beam is formed; another part of the second far-infrared light beam is directed to the reflecting part and is reflected by the reflecting part to form a reflected light beam; the scattered light beam and the reflected light beam are combined to form the third far-infrared light beam. 如申請專利範圍第3項所述之遠紅外線照射器,其中該反射部為平面或凸弧面其中至少之一或其結合。 The far-infrared irradiator described in item 3 of the scope of patent application, wherein the reflecting portion is at least one of a flat surface or a convex arc surface or a combination thereof. 如申請專利範圍第1項所述之遠紅外線照射器,其中該至少一遠 紅外線光源為以加熱方式可產生遠紅外線的材料而產生,例如加熱半導體晶片、陶瓷基板、線圈或燈絲、微機電晶片、碳纖維;或為遠紅外線發光二極體或遠紅外線雷射。 The far-infrared irradiator described in item 1 of the scope of patent application, wherein the at least one far The infrared light source is produced by heating materials that can generate far infrared rays, such as heating semiconductor chips, ceramic substrates, coils or filaments, MEMS chips, carbon fibers; or far infrared light emitting diodes or far infrared lasers. 如申請專利範圍第1項所述之遠紅外線照射器,其中該濾波單元為濾除波長等於或小於6微米之遠紅外線光束之濾波器或濾波片。 The far-infrared irradiator described in the first item of the scope of patent application, wherein the filter unit is a filter or filter that filters far-infrared light beams with a wavelength equal to or less than 6 microns. 如申請專利範圍第1項所述之遠紅外線照射器,其中該至少一遠紅外線光源與該濾波單元之間設有一隔熱單元,用以隔絕該至少一遠紅外線光源與該濾波單元間的熱傳導。 The far-infrared irradiator according to the first item of the scope of patent application, wherein a heat insulation unit is provided between the at least one far-infrared light source and the filter unit to isolate the heat conduction between the at least one far-infrared light source and the filter unit . 如申請專利範圍第1項所述之遠紅外線照射器,其中該擴束單元與該濾波單元整合成一個單元,同時提供擴束與濾波功能。 In the far-infrared irradiator described in item 1 of the scope of patent application, the beam expander unit and the filter unit are integrated into one unit, and simultaneously provide beam expander and filter functions.
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