TWI721383B - Package structure with plural integrated circuit units and manufacturing method thereof - Google Patents
Package structure with plural integrated circuit units and manufacturing method thereof Download PDFInfo
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- H01L24/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L24/02—Bonding areas ; Manufacturing methods related thereto
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- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/77—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
- H01L21/78—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
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- H01L23/28—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
- H01L23/31—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape
- H01L23/3107—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape the device being completely enclosed
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- H01L24/10—Bump connectors ; Manufacturing methods related thereto
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- H01L24/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L24/10—Bump connectors ; Manufacturing methods related thereto
- H01L24/12—Structure, shape, material or disposition of the bump connectors prior to the connecting process
- H01L24/13—Structure, shape, material or disposition of the bump connectors prior to the connecting process of an individual bump connector
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- H01L2224/02—Bonding areas; Manufacturing methods related thereto
- H01L2224/023—Redistribution layers [RDL] for bonding areas
- H01L2224/0233—Structure of the redistribution layers
- H01L2224/02331—Multilayer structure
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- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/02—Bonding areas; Manufacturing methods related thereto
- H01L2224/023—Redistribution layers [RDL] for bonding areas
- H01L2224/0237—Disposition of the redistribution layers
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- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/02—Bonding areas; Manufacturing methods related thereto
- H01L2224/023—Redistribution layers [RDL] for bonding areas
- H01L2224/0237—Disposition of the redistribution layers
- H01L2224/02381—Side view
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- H—ELECTRICITY
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- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/10—Bump connectors; Manufacturing methods related thereto
- H01L2224/11—Manufacturing methods
- H01L2224/111—Manufacture and pre-treatment of the bump connector preform
Abstract
Description
本發明關於一種封裝結構及其製作方法,尤指一種具有多個積體電路單元的封裝結構及其製作方法。The present invention relates to a packaging structure and a manufacturing method thereof, in particular to a packaging structure with a plurality of integrated circuit units and a manufacturing method thereof.
隨著電子產品之微小化與多功能化,多晶粒封裝結構在許多電子產品越來越常見,其係將兩個或兩個以上的晶粒封裝在單一封裝結構中,以縮減整體體積。以覆晶封裝而言,常見的多晶粒封裝結構係將兩個以上的晶粒彼此並排地設置於同一基板上,但考量固晶機台的製程誤差以及後續封裝膠填充晶粒之間空隙的能力,並排設置晶粒之間具有一設計極限,如此一來限制封裝結構的面積而無法進一步縮小,且封裝結構的面積還會隨著晶片數量的增加而加大。有鑑於此,縮減封裝結構的體積實為業界努力的目標。With the miniaturization and multi-functionalization of electronic products, multi-die packaging structures are becoming more and more common in many electronic products. Two or more dies are packaged in a single packaging structure to reduce the overall volume. In terms of flip chip packaging, the common multi-die packaging structure is to arrange more than two dies side by side on the same substrate, but the process error of the die bonding machine and the subsequent filling of the gap between the dies with the packaging glue are considered. There is a design limit between the dies arranged side by side, which limits the area of the package structure and cannot be further reduced, and the area of the package structure will increase with the increase in the number of chips. In view of this, reducing the size of the package structure is indeed the goal of the industry's efforts.
本發明的目的在於提供一種封裝結構及其製作方法,以縮減封裝結構的體積。The purpose of the present invention is to provide a packaging structure and a manufacturing method thereof to reduce the volume of the packaging structure.
為達上述的目的,本發明提供一種封裝結構,其包括一電路載板、一第一晶粒以及一封膠體。第一晶粒設置於電路載板上,且第一晶粒包括至少兩個積體電路單元以及一虛置部分,其中虛置部分將積體電路單元分隔開,虛置部分不將積體電路單元彼此電性連接,且積體電路單元透過電路載板彼此電性連接。封膠體覆蓋於第一晶粒與電路載板上。To achieve the above objective, the present invention provides a package structure, which includes a circuit carrier, a first die, and an encapsulant. The first die is disposed on the circuit carrier, and the first die includes at least two integrated circuit units and a dummy part, wherein the dummy part separates the integrated circuit unit, and the dummy part does not divide the integrated circuit unit. The circuit units are electrically connected to each other, and the integrated circuit units are electrically connected to each other through the circuit carrier board. The molding compound covers the first die and the circuit carrier.
為達上述的目的,本發明另提供一種封裝結構的製作方法,包括提供一晶片晶圓,其中晶片晶圓包括複數個積體電路單元;切割晶片晶圓,以形成複數個第一晶粒,其中各第一晶粒包括積體電路單元中相鄰的至少兩個以及一虛置部分,虛置部分將積體電路單元分隔開,且虛置部分不將積體電路單元彼此電性連接;將第一晶粒中的一個設置於一電路載板上,其中積體電路單元係透過電路載板彼此電性連接;以及於第一晶粒與電路載板上形成一封膠體。In order to achieve the above objective, the present invention also provides a method for manufacturing a package structure, including providing a wafer wafer, wherein the wafer wafer includes a plurality of integrated circuit units; cutting the wafer wafer to form a plurality of first dies, Each first die includes at least two adjacent integrated circuit units and a dummy part, the dummy part separates the integrated circuit units, and the dummy part does not electrically connect the integrated circuit units to each other One of the first die is set on a circuit carrier, where the integrated circuit units are electrically connected to each other through the circuit carrier; and a sealant is formed on the first die and the circuit carrier.
於本發明所揭露的封裝結構及製作方法中,透過具有至少兩個積體電路單元的第一晶粒的設計,積體電路單元之間的間距可縮小,使得封裝結構的體積可有效地縮減。並且,透過此設計,封裝結構的製作成本以及製作程序均可有效地降低,進而節省成本。In the package structure and manufacturing method disclosed in the present invention, through the design of the first die having at least two integrated circuit units, the spacing between the integrated circuit units can be reduced, so that the volume of the package structure can be effectively reduced . Moreover, through this design, the manufacturing cost and manufacturing process of the package structure can be effectively reduced, thereby saving costs.
請參考第1圖至第6圖繪示本發明第一實施例製作封裝結構的方法示意圖,其中第1圖至第3圖為封裝結構於不同步驟的結構示意圖,第3圖為沿著第2圖的剖線A-A’的剖視示意圖,第4圖為本發明第一實施例的封裝結構的上視示意圖,第5圖與第6圖分別為封裝結構沿著第4圖的剖線B-B’與C-C’的剖視示意圖。本實施例所提供的製作封裝結構的方法包括下列步驟。如第1圖所示,首先,提供一晶片晶圓102,其中晶片晶圓102包括複數個積體電路單元104。具體來說,晶片晶圓102可為已形成有具有特定功能的積體電路單元104。於本實施例中,各積體電路單元104可具有相同的結構,也就是說每個積體電路單元104為具有相同功能且結構一致的功能性單元。舉例來說,各積體電路單元104可分別為一記憶體元件,例如動態隨機存取記憶體(dynamic random access memory, DRAM)、快閃記憶體(Flash)或其他適合的記憶體。Please refer to Fig. 1 to Fig. 6 for a schematic diagram of a method for manufacturing a package structure according to the first embodiment of the present invention. Fig. 1 to Fig. 3 are structural diagrams of the package structure in different steps. Fig. 4 is a schematic cross-sectional view taken along the line A-A' of the figure, Fig. 4 is a schematic top view of the package structure of the first embodiment of the present invention, Fig. 5 and Fig. 6 are respectively the package structure along the section line of Fig. A schematic cross-sectional view of B-B' and C-C'. The method for manufacturing a package structure provided in this embodiment includes the following steps. As shown in FIG. 1, first, a
於本實施例中,晶片晶圓102可具有複數個切割道(scribe line)106,分別位於兩相鄰積體電路單元104之間,用以將各積體電路單元104彼此分隔開。在形成晶片晶圓102之後,可對晶片晶圓102中的每一個積體電路單元104進行檢測,並在檢測機台中記錄每個積體電路單元104為良品或壞品,以標示每個功能正常的積體電路單元104的位置,藉此有助於後續切割出第一晶粒108。In this embodiment, the
接著,對晶片晶圓102進行切割製程,以沿著部分切割道106切割晶片晶圓102,進而形成複數個第一晶粒108。具體來說,由於各積體電路單元104可在檢測製程中得知是否為良品,因此透過機台可記錄判斷為良品的積體電路單元104的位置,使得機台中的切割程式可將判斷為良品的至少兩個相鄰的積體電路單元104視為同一第一晶粒108,並沿著第一晶粒108周圍的切割道106將第一晶粒108與晶片晶圓102的其他部分分離。舉例來說,切割道106可包括複數條沿著第一方向D1延伸的第一切割道106a、複數條沿著第二方向D2延伸的第二切割道106b以及複數個第三切割道106c,其中第一切割道106a與第二切割道106b可圍繞出第一晶粒108的範圍,且第三切割道106c位於第一晶粒108的積體電路單元104之間。在切割製程中,不會沿著第三切割道106c執行切割,因此第一晶粒108可包括虛置部分108P,對應第三切割道106c的位置,且虛置部分108P可連接第一晶粒108中相鄰的積體電路單元104。為清楚繪示第一晶粒108,本實施例的第一晶粒108包括兩相鄰的積體電路單元104,因此位於積體電路單元104之間的第三切割道106c並不會進行切割,但不以此為限。由於本實施例的第三切割道106c不需進行切割,因此相較於對每一切割道進行切割的方法而言,本實施例的切割製程可節省切割的時間,進而提升切割效率。於本實施例中,第一晶粒108的積體電路單元104可沿著積體電路單元較窄的側邊方向(如第二方向D2)排列,因此第三切割道106c可沿著第一方向D1延伸,但不限於此。於一些實施例中,第三切割道106c可依據所認定的第一晶粒108的範圍來定義,因此第三切割道106c也可沿著第二方向D2延伸,或不同的第三切割道106c可分別沿著第一方向D1與第二方向D2延伸。於一些實施例中,如第2圖所示,第一晶粒108的虛置部分108P可包括測試墊TP、對準標記AM或其他不影響最終封裝結構100的元件。於一些實施例中,測試墊TP可分別用於檢測不同積體電路單元104,但不以此為限。Next, a dicing process is performed on the
於本實施例中,切割製程可例如包括一雷射開槽(laser grooving)製程以及晶圓切割(wafer dicing)製程,其中雷射開槽製程可先將晶片晶圓102位於第一切割道106a與第二切割道106b中的部分膜層切斷,例如低介電常數(low-k)薄膜、金屬層或難用切割刀片切斷的材料,如氮化鋁、氮化鎵、氧化鋁陶瓷或碳化矽,晶圓切割製程可包括利用切割刀片將晶片晶圓102進行全切割。於一些實施例中,切割製程也可為一或多次雷射切割製程。本發明的切割製程並不以上述為限,也可為其他適合的切割製程。In this embodiment, the dicing process may include, for example, a laser grooving process and a wafer dicing process. The laser grooving process may first place the
於一些實施例中,第一晶粒108也可依據實際需求而包括三個或四個以上的積體電路單元104。於一些實施例中,第一晶粒108中的積體電路單元104也可具有不同的結構,而為不同功能性單元,例如分別為不同的記憶體元件或不同功能的積體電路。In some embodiments, the
值得說明的是,本實施例的虛置部分108P不將相鄰的積體電路單元104彼此電性連接,也就是說虛置部分108P並不具有任何線路將第一晶粒108中的積體電路單元104彼此電性連接,因此第一晶粒108中的積體電路單元104在未進行後續製程時仍為彼此絕緣。於一些實施例中,虛置部分108P也可將第一晶粒108中的積體電路單元104彼此電性連接。It is worth noting that the
如第2圖與第3圖所示,在形成第一晶粒108之後,進行固晶(die bonding)製程,將一個第一晶粒108設置於一電路載板110上,以將第一晶粒108電性連接至電路載板110,其中第一晶粒108中的積體電路單元104可透過電路載板110彼此電性連接。於本實施例中,電路載板110可包括複數個上焊墊110a、複數條內連線110b以及複數個下焊墊110c,上焊墊110a位於電路載板110面對第一晶粒108的表面110S1,下焊墊110c位於電路載板110相對於表面110S1的另一表面110S2,且內連線110b設置於上焊墊110a與下焊墊110c之間,使得上焊墊110a可透過內連線110b電性連接至下焊墊110c。本實施例的電路載板110的各上焊墊110a上可形成有對應的一凸塊112,且在固晶製程中,第一晶粒108的接墊係面對凸塊112設置,使得第一晶粒108的接墊(圖未示)可透過覆晶接合的方式與對應的凸塊112接合,從而固接於電路載板110上。本發明的第一晶粒108與電路載板110接合的方式並不限於覆晶接合,也可為其他適合的接合方式。於一些實施例中,上焊墊110a可以一對一或不以一對一的方式電連接到下焊墊110c,也就是說,上焊墊110a的數量、內連線110b的數量、下焊墊110c的數量以及其連接方式可依據實際需求來決定。於一些實施例中,凸塊112也可先分別形成在第一晶粒108的接墊上,然後在固晶製程中,凸塊112可分別與對應的上焊墊110c接合。As shown in FIGS. 2 and 3, after the
值得說明的是,由於本實施例的第一晶粒108包括至少兩個積體電路單元104,因此相較於將至少兩個各自具有一個積體電路單元的晶粒設置於電路載板的方法而言,本實施例的第一晶粒108的設計可有效地降低設置晶粒的數量與次數,進而可提升固晶製程的生產效率。It is worth noting that since the
於本實施例中,電路載板110可具有一排氣孔110h,例如設置於電路載板110的中央,以助於在進行後續封膠製程時將位於第一晶粒108與電路載板110之間的空氣透過排氣孔110h排出,從而降低氣泡產生。In this embodiment, the
如第4圖至第6圖所示,在將第一晶粒108固接於電路載板110之後,進行封膠製程,於第一晶粒108與電路載板110上形成封膠體114,以將第一晶粒108密封於電路載板110上。隨後,於各下焊墊110c下設置焊球116,以助於封裝結構100於後續製程中黏貼於其他元件或電路板上。至此,可形成本實施例的封裝結構100。封膠體114可例如包括模壓樹脂(molding compound)或其他適合的成型材料。於本實施例中,封膠體114可覆蓋第一晶粒108,但不限於此。於一些實施例中,形成封膠體114之後,可進一步將第一晶粒108上的封膠體114移除,使得第一晶粒108的上表面露出,以降低封裝結構100的厚度。於本實施例中,由於電路載板110具有排氣孔110a,因此封膠體114可填入排氣孔110a,且一部分的封膠體114可溢出於電路載板110下。於一些實施例中,於形成封膠體114與設置焊球116之間,還可選擇性於封膠體114上設置其他重佈線層、其他封裝結構或其他晶粒,但不限於此。於一些實施例中,電路載板110也可為形成於一暫時載板上的一重佈線層,在此情況下,於形成封膠體114與設置焊球116之間可移除暫時載板。As shown in FIGS. 4 to 6, after the
值得一提的是,由於本實施例的電路載板110上僅設置有單一第一晶粒108(即積體電路單元104之間並無間隙),因此在形成封膠體114時,第一晶粒108的設計可避免寬度小的空隙存在,有助於成型化合物更快速的填充第一晶粒108與電路載板110之間的空隙,進而避免積體電路單元104之間產生氣泡,以提升封裝結構100的可靠度(reliability)。並且,由於第一晶粒的設計可提高成型化合物填充第一晶粒108與電路載板110之間的空隙,因此可降低設計電路載板的排氣孔的數量,以降低製作成本。It is worth mentioning that since only a single
於本實施例中,封裝結構100可例如為底部填膠(molded under fill, MUF)類型,但不限於此。於一些實施例中,封裝結構100也可為毛細底部填膠(capillary under fill, CUF)類型,其於形成封膠體114之前,可先於第一晶粒108與電路載板110之間填入一液態封膠,以降低第一晶粒108與電路載板110之間產生氣泡(void)的機率。In this embodiment, the
值得說明的是,於本實施例的封裝結構100中,由於第一晶粒108中的積體電路單元104在切割製程中並未被分離,因此積體電路單元104之間的間距G1可接近切割道106的寬度,使得間距G1可小於固晶製程的晶粒間距的設計極限,例如小於300微米。舉例來說,間距G1可小於或等於65.6微米。如此一來,相較於封裝有各自具有一個積體電路單元的兩個晶粒的封裝結構而言,本實施例的封裝結構100的面積可有效地降低。並且,由於積體電路單元104之間的間距G1可小於晶粒間距的設計極限,因此積體電路單元104的連接路徑可縮短,進而可提升封裝結構100的電性性能,並降低耗電量。It is worth noting that in the
於本實施例中,由於本實施例的積體電路單元104的間距G1可縮小,因此電路載板110中分別電性連接不同積體電路單元104的上焊墊110a的最小間距也可縮小。具體來說,電路載板110的上焊墊110a可區分為至少兩個上焊墊群110a1、110a2,其中上焊墊群110a1、110a2分別電性連接不同的積體電路單元104,且上焊墊群110a1、110a2之間的間距G2可小於晶粒間距的設計極限。舉例來說,間距G2可小於300微米,或更進一步小於或等於65.6微米。In this embodiment, since the gap G1 of the
本發明的封裝結構及其製作方法並不以上述實施例為限,且以下將進一步描述本揭露的其他實施例。為方便比較各實施例與簡化說明,下文中將使用相同標號標註相同元件,且下文將詳述不同實施例之間的差異,並不再對相同部分作贅述。The packaging structure and manufacturing method of the present invention are not limited to the above-mentioned embodiments, and other embodiments of the present disclosure will be further described below. In order to facilitate the comparison of the various embodiments and simplify the description, the same reference numerals will be used to label the same elements below, and the differences between the different embodiments will be described in detail below, and the same parts will not be repeated.
請參考第7圖,其繪示本發明第二實施例的封裝結構的剖視示意圖。如第7圖所示,本實施例所提供的封裝結構200與第一實施例的差異在於本實施例的電路載板210可不具有排氣孔。於本實施例中,封裝結構200可選擇性包括液態封膠218,填滿第一晶粒108與電路載板210之間的空隙。具體來說,液態封膠218可較成型材料有填補能力,以降低第一晶粒108與電路載板210之間產生氣泡的機率。液態封膠218可於形成封膠體114之前填入第一晶粒108與電路載板210之間的空隙。液態封膠218可例如包括環氧樹脂(epoxy resin)。Please refer to FIG. 7, which is a schematic cross-sectional view of the package structure of the second embodiment of the present invention. As shown in FIG. 7, the difference between the
請參考第8圖,其繪示本發明第三實施例的封裝結構的剖視示意圖。如第8圖所示,本實施例所提供的封裝結構300與第一實施例的差異在於本實施例的封裝結構300還可包括一第二晶粒320,設置於第一晶粒108的虛置部分108P與封膠層114之間。具體來說,如第3圖與第8圖所示,本實施例的封裝結構300的製作方法與第一實施例的差異在於形成封膠體114之前,另於虛置部分108P上設置第二晶粒320。第二晶粒320可依據實際需求而與第一晶粒108相同或不相同。舉例來說,值得說明的是,由於第一晶粒108的積體電路單元104之間不具有空隙,因此即使在虛置部分108P上設置有第二晶粒320,成型材料依舊能快速的填滿第一晶粒108與電路載板110之間的空隙,而不會受到第二晶粒320的設置的影響。
綜上所述,於本發明所揭露的封裝結構中,透過具有至少兩個積體電路單元的第一晶粒的設計,積體電路單元之間的間距可縮小,使得封裝結構的體積可有效地縮減。並且,透過此設計,封裝結構的製作成本以及製作程序均可有效地降低,進而節省成本。
以上所述僅為本發明之較佳實施例,凡依本發明申請專利範圍所做之均等變化與修飾,皆應屬本發明之涵蓋範圍。Please refer to FIG. 8, which shows a schematic cross-sectional view of the package structure of the third embodiment of the present invention. As shown in FIG. 8, the difference between the
100、200、300:封裝結構
102:晶片晶圓
104:積體電路單元
106:切割道
106a:第一切割道
106b:第二切割道
106c:第三切割道
108:第一晶粒
108P:虛置部分
110、210:電路載板
110a:上焊墊
110a1、110a2:上焊墊群
110b:內連線
110c:下焊墊
110h:排氣孔
110S1、110S2:表面
112:凸塊
114:封膠體
116:焊球
218:液態封膠
320:第二晶粒
D1:第一方向
D2:第二方向
TP:測試墊
AM:對準標記
G1、G2:間距100, 200, 300: package structure
102: Wafer
104: Integrated Circuit Unit
106:
第1圖至第6圖繪示本發明第一實施例製作封裝結構的方法示意圖。 第7圖繪示本發明第二實施例的封裝結構的剖視示意圖。 第8圖繪示本發明第三實施例的封裝結構的剖視示意圖。Fig. 1 to Fig. 6 are schematic diagrams illustrating a method of manufacturing a package structure according to the first embodiment of the present invention. FIG. 7 is a schematic cross-sectional view of the package structure according to the second embodiment of the present invention. FIG. 8 is a schematic cross-sectional view of the package structure of the third embodiment of the present invention.
104:積體電路單元 104: Integrated Circuit Unit
108:第一晶粒 108: The first grain
108P:虛置部分 108P: Dummy part
110:電路載板 110: circuit carrier board
110a:上焊墊 110a: Upper pad
110a1、110a2:上焊墊群 110a1, 110a2: Upper pad group
110b:內連線 110b: internal connection
110c:下焊墊 110c: lower pad
110S1、110S2:表面 110S1, 110S2: surface
112:凸塊 112: bump
114:封膠體 114: Sealant
116:焊球 116: Solder Ball
G1、G2:間距 G1, G2: spacing
Claims (10)
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TW473959B (en) * | 2001-01-03 | 2002-01-21 | Siliconware Precision Industries Co Ltd | Method for packaging flip-chip ball-grid-array chip |
TW201411786A (en) * | 2012-08-03 | 2014-03-16 | Plx Technology Inc | Multiple seal-ring structure for the design, fabrication, and packaging of integrated circuits |
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TW201612965A (en) * | 2014-06-30 | 2016-04-01 | Applied Materials Inc | Wafer dicing using hybrid laser and plasma etch approach with mask application by vacuum lamination |
TW201818514A (en) * | 2016-11-14 | 2018-05-16 | 台灣積體電路製造股份有限公司 | Package structures and methods of forming the same |
US20190067157A1 (en) * | 2017-08-31 | 2019-02-28 | Taiwan Semiconductor Manufacturing Company, Ltd. | Heat Spreading Device and Method |
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TW473959B (en) * | 2001-01-03 | 2002-01-21 | Siliconware Precision Industries Co Ltd | Method for packaging flip-chip ball-grid-array chip |
TW201411786A (en) * | 2012-08-03 | 2014-03-16 | Plx Technology Inc | Multiple seal-ring structure for the design, fabrication, and packaging of integrated circuits |
US20150255361A1 (en) * | 2014-03-04 | 2015-09-10 | Amkor Technology, Inc. | Semiconductor device with thin redistribution layers |
TW201612965A (en) * | 2014-06-30 | 2016-04-01 | Applied Materials Inc | Wafer dicing using hybrid laser and plasma etch approach with mask application by vacuum lamination |
TW201818514A (en) * | 2016-11-14 | 2018-05-16 | 台灣積體電路製造股份有限公司 | Package structures and methods of forming the same |
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