TWI721383B - Package structure with plural integrated circuit units and manufacturing method thereof - Google Patents

Package structure with plural integrated circuit units and manufacturing method thereof Download PDF

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TWI721383B
TWI721383B TW108107723A TW108107723A TWI721383B TW I721383 B TWI721383 B TW I721383B TW 108107723 A TW108107723 A TW 108107723A TW 108107723 A TW108107723 A TW 108107723A TW I721383 B TWI721383 B TW I721383B
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integrated circuit
die
circuit units
package structure
circuit carrier
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TW108107723A
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TW202034473A (en
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陳明志
徐宏欣
藍源富
張文馨
許獻文
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力成科技股份有限公司
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Priority to CN201910261860.3A priority patent/CN111668169A/en
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L24/02Bonding areas ; Manufacturing methods related thereto
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/70Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
    • H01L21/77Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
    • H01L21/78Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/28Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
    • H01L23/31Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape
    • H01L23/3107Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the arrangement or shape the device being completely enclosed
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L24/10Bump connectors ; Manufacturing methods related thereto
    • H01L24/11Manufacturing methods
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L24/10Bump connectors ; Manufacturing methods related thereto
    • H01L24/12Structure, shape, material or disposition of the bump connectors prior to the connecting process
    • H01L24/13Structure, shape, material or disposition of the bump connectors prior to the connecting process of an individual bump connector
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/02Bonding areas; Manufacturing methods related thereto
    • H01L2224/023Redistribution layers [RDL] for bonding areas
    • H01L2224/0233Structure of the redistribution layers
    • H01L2224/02331Multilayer structure
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/02Bonding areas; Manufacturing methods related thereto
    • H01L2224/023Redistribution layers [RDL] for bonding areas
    • H01L2224/0237Disposition of the redistribution layers
    • H01L2224/02373Layout of the redistribution layers
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/02Bonding areas; Manufacturing methods related thereto
    • H01L2224/023Redistribution layers [RDL] for bonding areas
    • H01L2224/0237Disposition of the redistribution layers
    • H01L2224/02381Side view
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/10Bump connectors; Manufacturing methods related thereto
    • H01L2224/11Manufacturing methods
    • H01L2224/111Manufacture and pre-treatment of the bump connector preform

Abstract

A package structure and a manufacturing method thereof are provided, in which the package structure includes a circuit substrate, a die and an encapsulation. The die is disposed on the circuit substrate, and the die includes at least two integrated circuit units and a dummy part, in which the dummy part separates the integrated circuit units and doesn’t electrically connect the integrated circuit units to each other, and the integrated circuit units are electrically connected to each other through the circuit substrate. The encapsulation covers the die and the circuit substrate.

Description

具有多個積體電路單元的封裝結構及其製作方法Packaging structure with multiple integrated circuit units and manufacturing method thereof

本發明關於一種封裝結構及其製作方法,尤指一種具有多個積體電路單元的封裝結構及其製作方法。The present invention relates to a packaging structure and a manufacturing method thereof, in particular to a packaging structure with a plurality of integrated circuit units and a manufacturing method thereof.

隨著電子產品之微小化與多功能化,多晶粒封裝結構在許多電子產品越來越常見,其係將兩個或兩個以上的晶粒封裝在單一封裝結構中,以縮減整體體積。以覆晶封裝而言,常見的多晶粒封裝結構係將兩個以上的晶粒彼此並排地設置於同一基板上,但考量固晶機台的製程誤差以及後續封裝膠填充晶粒之間空隙的能力,並排設置晶粒之間具有一設計極限,如此一來限制封裝結構的面積而無法進一步縮小,且封裝結構的面積還會隨著晶片數量的增加而加大。有鑑於此,縮減封裝結構的體積實為業界努力的目標。With the miniaturization and multi-functionalization of electronic products, multi-die packaging structures are becoming more and more common in many electronic products. Two or more dies are packaged in a single packaging structure to reduce the overall volume. In terms of flip chip packaging, the common multi-die packaging structure is to arrange more than two dies side by side on the same substrate, but the process error of the die bonding machine and the subsequent filling of the gap between the dies with the packaging glue are considered. There is a design limit between the dies arranged side by side, which limits the area of the package structure and cannot be further reduced, and the area of the package structure will increase with the increase in the number of chips. In view of this, reducing the size of the package structure is indeed the goal of the industry's efforts.

本發明的目的在於提供一種封裝結構及其製作方法,以縮減封裝結構的體積。The purpose of the present invention is to provide a packaging structure and a manufacturing method thereof to reduce the volume of the packaging structure.

為達上述的目的,本發明提供一種封裝結構,其包括一電路載板、一第一晶粒以及一封膠體。第一晶粒設置於電路載板上,且第一晶粒包括至少兩個積體電路單元以及一虛置部分,其中虛置部分將積體電路單元分隔開,虛置部分不將積體電路單元彼此電性連接,且積體電路單元透過電路載板彼此電性連接。封膠體覆蓋於第一晶粒與電路載板上。To achieve the above objective, the present invention provides a package structure, which includes a circuit carrier, a first die, and an encapsulant. The first die is disposed on the circuit carrier, and the first die includes at least two integrated circuit units and a dummy part, wherein the dummy part separates the integrated circuit unit, and the dummy part does not divide the integrated circuit unit. The circuit units are electrically connected to each other, and the integrated circuit units are electrically connected to each other through the circuit carrier board. The molding compound covers the first die and the circuit carrier.

為達上述的目的,本發明另提供一種封裝結構的製作方法,包括提供一晶片晶圓,其中晶片晶圓包括複數個積體電路單元;切割晶片晶圓,以形成複數個第一晶粒,其中各第一晶粒包括積體電路單元中相鄰的至少兩個以及一虛置部分,虛置部分將積體電路單元分隔開,且虛置部分不將積體電路單元彼此電性連接;將第一晶粒中的一個設置於一電路載板上,其中積體電路單元係透過電路載板彼此電性連接;以及於第一晶粒與電路載板上形成一封膠體。In order to achieve the above objective, the present invention also provides a method for manufacturing a package structure, including providing a wafer wafer, wherein the wafer wafer includes a plurality of integrated circuit units; cutting the wafer wafer to form a plurality of first dies, Each first die includes at least two adjacent integrated circuit units and a dummy part, the dummy part separates the integrated circuit units, and the dummy part does not electrically connect the integrated circuit units to each other One of the first die is set on a circuit carrier, where the integrated circuit units are electrically connected to each other through the circuit carrier; and a sealant is formed on the first die and the circuit carrier.

於本發明所揭露的封裝結構及製作方法中,透過具有至少兩個積體電路單元的第一晶粒的設計,積體電路單元之間的間距可縮小,使得封裝結構的體積可有效地縮減。並且,透過此設計,封裝結構的製作成本以及製作程序均可有效地降低,進而節省成本。In the package structure and manufacturing method disclosed in the present invention, through the design of the first die having at least two integrated circuit units, the spacing between the integrated circuit units can be reduced, so that the volume of the package structure can be effectively reduced . Moreover, through this design, the manufacturing cost and manufacturing process of the package structure can be effectively reduced, thereby saving costs.

請參考第1圖至第6圖繪示本發明第一實施例製作封裝結構的方法示意圖,其中第1圖至第3圖為封裝結構於不同步驟的結構示意圖,第3圖為沿著第2圖的剖線A-A’的剖視示意圖,第4圖為本發明第一實施例的封裝結構的上視示意圖,第5圖與第6圖分別為封裝結構沿著第4圖的剖線B-B’與C-C’的剖視示意圖。本實施例所提供的製作封裝結構的方法包括下列步驟。如第1圖所示,首先,提供一晶片晶圓102,其中晶片晶圓102包括複數個積體電路單元104。具體來說,晶片晶圓102可為已形成有具有特定功能的積體電路單元104。於本實施例中,各積體電路單元104可具有相同的結構,也就是說每個積體電路單元104為具有相同功能且結構一致的功能性單元。舉例來說,各積體電路單元104可分別為一記憶體元件,例如動態隨機存取記憶體(dynamic random access memory, DRAM)、快閃記憶體(Flash)或其他適合的記憶體。Please refer to Fig. 1 to Fig. 6 for a schematic diagram of a method for manufacturing a package structure according to the first embodiment of the present invention. Fig. 1 to Fig. 3 are structural diagrams of the package structure in different steps. Fig. 4 is a schematic cross-sectional view taken along the line A-A' of the figure, Fig. 4 is a schematic top view of the package structure of the first embodiment of the present invention, Fig. 5 and Fig. 6 are respectively the package structure along the section line of Fig. A schematic cross-sectional view of B-B' and C-C'. The method for manufacturing a package structure provided in this embodiment includes the following steps. As shown in FIG. 1, first, a chip wafer 102 is provided, where the chip wafer 102 includes a plurality of integrated circuit units 104. Specifically, the chip wafer 102 may be an integrated circuit unit 104 having a specific function formed thereon. In this embodiment, each integrated circuit unit 104 may have the same structure, that is, each integrated circuit unit 104 is a functional unit with the same function and the same structure. For example, each integrated circuit unit 104 may be a memory device, such as dynamic random access memory (DRAM), flash memory (Flash) or other suitable memory.

於本實施例中,晶片晶圓102可具有複數個切割道(scribe line)106,分別位於兩相鄰積體電路單元104之間,用以將各積體電路單元104彼此分隔開。在形成晶片晶圓102之後,可對晶片晶圓102中的每一個積體電路單元104進行檢測,並在檢測機台中記錄每個積體電路單元104為良品或壞品,以標示每個功能正常的積體電路單元104的位置,藉此有助於後續切割出第一晶粒108。In this embodiment, the wafer 102 may have a plurality of scribe lines 106, which are respectively located between two adjacent integrated circuit units 104 to separate the integrated circuit units 104 from each other. After the chip wafer 102 is formed, each integrated circuit unit 104 in the chip wafer 102 can be inspected, and each integrated circuit unit 104 can be recorded as a good product or a bad product in the inspection machine to indicate each function The normal position of the integrated circuit unit 104 helps to subsequently cut out the first die 108.

接著,對晶片晶圓102進行切割製程,以沿著部分切割道106切割晶片晶圓102,進而形成複數個第一晶粒108。具體來說,由於各積體電路單元104可在檢測製程中得知是否為良品,因此透過機台可記錄判斷為良品的積體電路單元104的位置,使得機台中的切割程式可將判斷為良品的至少兩個相鄰的積體電路單元104視為同一第一晶粒108,並沿著第一晶粒108周圍的切割道106將第一晶粒108與晶片晶圓102的其他部分分離。舉例來說,切割道106可包括複數條沿著第一方向D1延伸的第一切割道106a、複數條沿著第二方向D2延伸的第二切割道106b以及複數個第三切割道106c,其中第一切割道106a與第二切割道106b可圍繞出第一晶粒108的範圍,且第三切割道106c位於第一晶粒108的積體電路單元104之間。在切割製程中,不會沿著第三切割道106c執行切割,因此第一晶粒108可包括虛置部分108P,對應第三切割道106c的位置,且虛置部分108P可連接第一晶粒108中相鄰的積體電路單元104。為清楚繪示第一晶粒108,本實施例的第一晶粒108包括兩相鄰的積體電路單元104,因此位於積體電路單元104之間的第三切割道106c並不會進行切割,但不以此為限。由於本實施例的第三切割道106c不需進行切割,因此相較於對每一切割道進行切割的方法而言,本實施例的切割製程可節省切割的時間,進而提升切割效率。於本實施例中,第一晶粒108的積體電路單元104可沿著積體電路單元較窄的側邊方向(如第二方向D2)排列,因此第三切割道106c可沿著第一方向D1延伸,但不限於此。於一些實施例中,第三切割道106c可依據所認定的第一晶粒108的範圍來定義,因此第三切割道106c也可沿著第二方向D2延伸,或不同的第三切割道106c可分別沿著第一方向D1與第二方向D2延伸。於一些實施例中,如第2圖所示,第一晶粒108的虛置部分108P可包括測試墊TP、對準標記AM或其他不影響最終封裝結構100的元件。於一些實施例中,測試墊TP可分別用於檢測不同積體電路單元104,但不以此為限。Next, a dicing process is performed on the wafer 102 to cut the wafer 102 along a part of the dicing line 106 to form a plurality of first dies 108. Specifically, since each integrated circuit unit 104 can know whether it is a good product during the inspection process, the position of the integrated circuit unit 104 that is judged to be a good product can be recorded through the machine, so that the cutting program in the machine can be judged as At least two adjacent integrated circuit units 104 of a good product are regarded as the same first die 108, and the first die 108 is separated from other parts of the wafer 102 along the dicing path 106 around the first die 108 . For example, the cutting lane 106 may include a plurality of first cutting lanes 106a extending along the first direction D1, a plurality of second cutting lanes 106b extending along the second direction D2, and a plurality of third cutting lanes 106c, where The first scribe lane 106 a and the second scribe lane 106 b can surround the range of the first die 108, and the third scribe lane 106 c is located between the integrated circuit units 104 of the first die 108. During the cutting process, cutting is not performed along the third scribe lane 106c, so the first die 108 may include a dummy portion 108P corresponding to the position of the third scribe lane 106c, and the dummy portion 108P may be connected to the first die The adjacent integrated circuit unit 104 in 108. To clearly illustrate the first die 108, the first die 108 of this embodiment includes two adjacent integrated circuit units 104, so the third cutting lane 106c located between the integrated circuit units 104 will not be cut. , But not limited to this. Since the third cutting lane 106c of this embodiment does not need to be cut, compared to the method of cutting each cutting lane, the cutting process of this embodiment can save cutting time, thereby improving cutting efficiency. In this embodiment, the integrated circuit unit 104 of the first die 108 can be arranged along the narrower side of the integrated circuit unit (such as the second direction D2), so the third cutting lane 106c can be arranged along the first The direction D1 extends, but is not limited to this. In some embodiments, the third scribe lane 106c may be defined according to the identified range of the first die 108, so the third scribe lane 106c may also extend along the second direction D2, or a different third scribe lane 106c It can extend along the first direction D1 and the second direction D2, respectively. In some embodiments, as shown in FIG. 2, the dummy portion 108P of the first die 108 may include a test pad TP, an alignment mark AM, or other components that do not affect the final package structure 100. In some embodiments, the test pad TP can be used to test different integrated circuit units 104, but it is not limited to this.

於本實施例中,切割製程可例如包括一雷射開槽(laser grooving)製程以及晶圓切割(wafer dicing)製程,其中雷射開槽製程可先將晶片晶圓102位於第一切割道106a與第二切割道106b中的部分膜層切斷,例如低介電常數(low-k)薄膜、金屬層或難用切割刀片切斷的材料,如氮化鋁、氮化鎵、氧化鋁陶瓷或碳化矽,晶圓切割製程可包括利用切割刀片將晶片晶圓102進行全切割。於一些實施例中,切割製程也可為一或多次雷射切割製程。本發明的切割製程並不以上述為限,也可為其他適合的切割製程。In this embodiment, the dicing process may include, for example, a laser grooving process and a wafer dicing process. The laser grooving process may first place the wafer 102 on the first dicing lane 106a. Cut off from a part of the film in the second dicing channel 106b, such as low-k films, metal layers, or materials that are difficult to cut with a cutting blade, such as aluminum nitride, gallium nitride, and alumina ceramics Or silicon carbide, the wafer dicing process may include full dicing of the wafer 102 using a dicing blade. In some embodiments, the cutting process can also be one or more laser cutting processes. The cutting process of the present invention is not limited to the above, and may also be other suitable cutting processes.

於一些實施例中,第一晶粒108也可依據實際需求而包括三個或四個以上的積體電路單元104。於一些實施例中,第一晶粒108中的積體電路單元104也可具有不同的結構,而為不同功能性單元,例如分別為不同的記憶體元件或不同功能的積體電路。In some embodiments, the first die 108 may also include three or more integrated circuit units 104 according to actual requirements. In some embodiments, the integrated circuit unit 104 in the first die 108 may also have a different structure and be a different functional unit, for example, different memory devices or integrated circuits with different functions.

值得說明的是,本實施例的虛置部分108P不將相鄰的積體電路單元104彼此電性連接,也就是說虛置部分108P並不具有任何線路將第一晶粒108中的積體電路單元104彼此電性連接,因此第一晶粒108中的積體電路單元104在未進行後續製程時仍為彼此絕緣。於一些實施例中,虛置部分108P也可將第一晶粒108中的積體電路單元104彼此電性連接。It is worth noting that the dummy part 108P of this embodiment does not electrically connect adjacent integrated circuit units 104 to each other, that is to say, the dummy part 108P does not have any wiring to connect the integrated circuit unit in the first die 108. The circuit units 104 are electrically connected to each other, so the integrated circuit units 104 in the first die 108 are still insulated from each other when the subsequent process is not performed. In some embodiments, the dummy portion 108P may also electrically connect the integrated circuit units 104 in the first die 108 to each other.

如第2圖與第3圖所示,在形成第一晶粒108之後,進行固晶(die bonding)製程,將一個第一晶粒108設置於一電路載板110上,以將第一晶粒108電性連接至電路載板110,其中第一晶粒108中的積體電路單元104可透過電路載板110彼此電性連接。於本實施例中,電路載板110可包括複數個上焊墊110a、複數條內連線110b以及複數個下焊墊110c,上焊墊110a位於電路載板110面對第一晶粒108的表面110S1,下焊墊110c位於電路載板110相對於表面110S1的另一表面110S2,且內連線110b設置於上焊墊110a與下焊墊110c之間,使得上焊墊110a可透過內連線110b電性連接至下焊墊110c。本實施例的電路載板110的各上焊墊110a上可形成有對應的一凸塊112,且在固晶製程中,第一晶粒108的接墊係面對凸塊112設置,使得第一晶粒108的接墊(圖未示)可透過覆晶接合的方式與對應的凸塊112接合,從而固接於電路載板110上。本發明的第一晶粒108與電路載板110接合的方式並不限於覆晶接合,也可為其他適合的接合方式。於一些實施例中,上焊墊110a可以一對一或不以一對一的方式電連接到下焊墊110c,也就是說,上焊墊110a的數量、內連線110b的數量、下焊墊110c的數量以及其連接方式可依據實際需求來決定。於一些實施例中,凸塊112也可先分別形成在第一晶粒108的接墊上,然後在固晶製程中,凸塊112可分別與對應的上焊墊110c接合。As shown in FIGS. 2 and 3, after the first die 108 is formed, a die bonding process is performed, and a first die 108 is disposed on a circuit carrier 110 to attach the first die 108 The die 108 is electrically connected to the circuit carrier 110, and the integrated circuit units 104 in the first die 108 can be electrically connected to each other through the circuit carrier 110. In this embodiment, the circuit carrier 110 may include a plurality of upper solder pads 110a, a plurality of interconnections 110b, and a plurality of lower solder pads 110c. The upper solder pads 110a are located on the circuit carrier 110 facing the first die 108. On the surface 110S1, the lower solder pad 110c is located on the other surface 110S2 of the circuit carrier 110 opposite to the surface 110S1, and the interconnection 110b is arranged between the upper solder pad 110a and the lower solder pad 110c, so that the upper solder pad 110a can be connected through the inner The wire 110b is electrically connected to the lower bonding pad 110c. A corresponding bump 112 may be formed on each upper pad 110a of the circuit carrier 110 of this embodiment, and during the die bonding process, the pad of the first die 108 is disposed facing the bump 112, so that the first The pads (not shown) of a die 108 can be bonded to the corresponding bumps 112 by flip chip bonding, so as to be fixed on the circuit carrier 110. The bonding method of the first die 108 and the circuit carrier 110 of the present invention is not limited to flip chip bonding, and other suitable bonding methods may also be used. In some embodiments, the upper solder pad 110a may be electrically connected to the lower solder pad 110c in a one-to-one or not in a one-to-one manner, that is, the number of upper solder pads 110a, the number of interconnections 110b, and the lower solder pads 110a The number of pads 110c and their connection method can be determined according to actual needs. In some embodiments, the bumps 112 may also be formed on the pads of the first die 108 first, and then in the die bonding process, the bumps 112 may be respectively bonded to the corresponding upper pads 110c.

值得說明的是,由於本實施例的第一晶粒108包括至少兩個積體電路單元104,因此相較於將至少兩個各自具有一個積體電路單元的晶粒設置於電路載板的方法而言,本實施例的第一晶粒108的設計可有效地降低設置晶粒的數量與次數,進而可提升固晶製程的生產效率。It is worth noting that since the first die 108 of this embodiment includes at least two integrated circuit units 104, it is compared with the method of arranging at least two die each having an integrated circuit unit on the circuit carrier. In other words, the design of the first die 108 of the present embodiment can effectively reduce the number and frequency of setting the die, thereby improving the production efficiency of the die bonding process.

於本實施例中,電路載板110可具有一排氣孔110h,例如設置於電路載板110的中央,以助於在進行後續封膠製程時將位於第一晶粒108與電路載板110之間的空氣透過排氣孔110h排出,從而降低氣泡產生。In this embodiment, the circuit carrier 110 may have a vent hole 110h, for example, arranged in the center of the circuit carrier 110 to facilitate the placement of the first die 108 and the circuit carrier 110 during the subsequent molding process. The air in between is discharged through the exhaust hole 110h, thereby reducing the generation of air bubbles.

如第4圖至第6圖所示,在將第一晶粒108固接於電路載板110之後,進行封膠製程,於第一晶粒108與電路載板110上形成封膠體114,以將第一晶粒108密封於電路載板110上。隨後,於各下焊墊110c下設置焊球116,以助於封裝結構100於後續製程中黏貼於其他元件或電路板上。至此,可形成本實施例的封裝結構100。封膠體114可例如包括模壓樹脂(molding compound)或其他適合的成型材料。於本實施例中,封膠體114可覆蓋第一晶粒108,但不限於此。於一些實施例中,形成封膠體114之後,可進一步將第一晶粒108上的封膠體114移除,使得第一晶粒108的上表面露出,以降低封裝結構100的厚度。於本實施例中,由於電路載板110具有排氣孔110a,因此封膠體114可填入排氣孔110a,且一部分的封膠體114可溢出於電路載板110下。於一些實施例中,於形成封膠體114與設置焊球116之間,還可選擇性於封膠體114上設置其他重佈線層、其他封裝結構或其他晶粒,但不限於此。於一些實施例中,電路載板110也可為形成於一暫時載板上的一重佈線層,在此情況下,於形成封膠體114與設置焊球116之間可移除暫時載板。As shown in FIGS. 4 to 6, after the first die 108 is fixed to the circuit carrier 110, a molding process is performed to form a molding compound 114 on the first die 108 and the circuit carrier 110 to The first die 108 is sealed on the circuit carrier 110. Subsequently, solder balls 116 are disposed under each of the lower bonding pads 110c to help the package structure 100 to be adhered to other components or circuit boards in the subsequent manufacturing process. So far, the package structure 100 of this embodiment can be formed. The molding compound 114 may include, for example, a molding compound or other suitable molding materials. In this embodiment, the molding compound 114 can cover the first die 108, but it is not limited thereto. In some embodiments, after the molding compound 114 is formed, the molding compound 114 on the first die 108 may be further removed to expose the upper surface of the first die 108 to reduce the thickness of the package structure 100. In this embodiment, since the circuit carrier 110 has the exhaust hole 110 a, the sealing compound 114 can be filled into the exhaust hole 110 a, and a part of the sealing compound 114 can overflow under the circuit carrier 110. In some embodiments, between the formation of the molding compound 114 and the placement of the solder balls 116, other rewiring layers, other packaging structures, or other dies can be optionally provided on the molding compound 114, but it is not limited thereto. In some embodiments, the circuit carrier 110 may also be a rewiring layer formed on a temporary carrier. In this case, the temporary carrier may be removed between the formation of the sealing body 114 and the placement of the solder balls 116.

值得一提的是,由於本實施例的電路載板110上僅設置有單一第一晶粒108(即積體電路單元104之間並無間隙),因此在形成封膠體114時,第一晶粒108的設計可避免寬度小的空隙存在,有助於成型化合物更快速的填充第一晶粒108與電路載板110之間的空隙,進而避免積體電路單元104之間產生氣泡,以提升封裝結構100的可靠度(reliability)。並且,由於第一晶粒的設計可提高成型化合物填充第一晶粒108與電路載板110之間的空隙,因此可降低設計電路載板的排氣孔的數量,以降低製作成本。It is worth mentioning that since only a single first die 108 is provided on the circuit carrier 110 of this embodiment (that is, there is no gap between the integrated circuit units 104), when the molding compound 114 is formed, the first die 108 The design of the particles 108 can avoid the existence of small gaps, which helps the molding compound to fill the gaps between the first die 108 and the circuit carrier 110 more quickly, thereby avoiding the generation of bubbles between the integrated circuit unit 104 to improve The reliability of the package structure 100. In addition, since the design of the first die can increase the filling of the gap between the first die 108 and the circuit carrier 110 by the molding compound, the number of vent holes designed for the circuit carrier can be reduced to reduce the manufacturing cost.

於本實施例中,封裝結構100可例如為底部填膠(molded under fill, MUF)類型,但不限於此。於一些實施例中,封裝結構100也可為毛細底部填膠(capillary under fill, CUF)類型,其於形成封膠體114之前,可先於第一晶粒108與電路載板110之間填入一液態封膠,以降低第一晶粒108與電路載板110之間產生氣泡(void)的機率。In this embodiment, the package structure 100 may be, for example, a molded under fill (MUF) type, but it is not limited thereto. In some embodiments, the package structure 100 may also be of a capillary under fill (capillary under fill, CUF) type, which may be filled between the first die 108 and the circuit carrier 110 before the molding compound 114 is formed A liquid encapsulant is used to reduce the probability of voids generated between the first die 108 and the circuit carrier 110.

值得說明的是,於本實施例的封裝結構100中,由於第一晶粒108中的積體電路單元104在切割製程中並未被分離,因此積體電路單元104之間的間距G1可接近切割道106的寬度,使得間距G1可小於固晶製程的晶粒間距的設計極限,例如小於300微米。舉例來說,間距G1可小於或等於65.6微米。如此一來,相較於封裝有各自具有一個積體電路單元的兩個晶粒的封裝結構而言,本實施例的封裝結構100的面積可有效地降低。並且,由於積體電路單元104之間的間距G1可小於晶粒間距的設計極限,因此積體電路單元104的連接路徑可縮短,進而可提升封裝結構100的電性性能,並降低耗電量。It is worth noting that in the package structure 100 of this embodiment, since the integrated circuit units 104 in the first die 108 are not separated during the cutting process, the gap G1 between the integrated circuit units 104 can be close to The width of the scribe lane 106 makes the gap G1 smaller than the design limit of the die pitch of the die bonding process, for example, less than 300 microns. For example, the pitch G1 may be less than or equal to 65.6 microns. In this way, compared to a package structure in which two dies each having an integrated circuit unit are packaged, the area of the package structure 100 of this embodiment can be effectively reduced. Moreover, since the spacing G1 between the integrated circuit units 104 can be smaller than the design limit of the die spacing, the connection path of the integrated circuit units 104 can be shortened, thereby improving the electrical performance of the package structure 100 and reducing power consumption .

於本實施例中,由於本實施例的積體電路單元104的間距G1可縮小,因此電路載板110中分別電性連接不同積體電路單元104的上焊墊110a的最小間距也可縮小。具體來說,電路載板110的上焊墊110a可區分為至少兩個上焊墊群110a1、110a2,其中上焊墊群110a1、110a2分別電性連接不同的積體電路單元104,且上焊墊群110a1、110a2之間的間距G2可小於晶粒間距的設計極限。舉例來說,間距G2可小於300微米,或更進一步小於或等於65.6微米。In this embodiment, since the gap G1 of the integrated circuit unit 104 of this embodiment can be reduced, the minimum distance between the upper pads 110a of the circuit carrier 110 that are electrically connected to different integrated circuit units 104 can also be reduced. Specifically, the upper soldering pad 110a of the circuit carrier 110 can be divided into at least two upper soldering pad groups 110a1, 110a2, wherein the upper soldering pad groups 110a1, 110a2 are electrically connected to different integrated circuit units 104, and the upper soldering The spacing G2 between the pad groups 110a1 and 110a2 may be smaller than the design limit of the grain spacing. For example, the gap G2 may be less than 300 microns, or even further less than or equal to 65.6 microns.

本發明的封裝結構及其製作方法並不以上述實施例為限,且以下將進一步描述本揭露的其他實施例。為方便比較各實施例與簡化說明,下文中將使用相同標號標註相同元件,且下文將詳述不同實施例之間的差異,並不再對相同部分作贅述。The packaging structure and manufacturing method of the present invention are not limited to the above-mentioned embodiments, and other embodiments of the present disclosure will be further described below. In order to facilitate the comparison of the various embodiments and simplify the description, the same reference numerals will be used to label the same elements below, and the differences between the different embodiments will be described in detail below, and the same parts will not be repeated.

請參考第7圖,其繪示本發明第二實施例的封裝結構的剖視示意圖。如第7圖所示,本實施例所提供的封裝結構200與第一實施例的差異在於本實施例的電路載板210可不具有排氣孔。於本實施例中,封裝結構200可選擇性包括液態封膠218,填滿第一晶粒108與電路載板210之間的空隙。具體來說,液態封膠218可較成型材料有填補能力,以降低第一晶粒108與電路載板210之間產生氣泡的機率。液態封膠218可於形成封膠體114之前填入第一晶粒108與電路載板210之間的空隙。液態封膠218可例如包括環氧樹脂(epoxy resin)。Please refer to FIG. 7, which is a schematic cross-sectional view of the package structure of the second embodiment of the present invention. As shown in FIG. 7, the difference between the package structure 200 provided by this embodiment and the first embodiment is that the circuit carrier board 210 of this embodiment may not have vent holes. In this embodiment, the packaging structure 200 may optionally include a liquid encapsulant 218 to fill the gap between the first die 108 and the circuit carrier 210. Specifically, the liquid encapsulant 218 may have a filling capacity compared with the molding material, so as to reduce the probability of bubbles generated between the first die 108 and the circuit carrier 210. The liquid molding compound 218 can be filled into the gap between the first die 108 and the circuit carrier 210 before the molding compound 114 is formed. The liquid molding compound 218 may include epoxy resin, for example.

請參考第8圖,其繪示本發明第三實施例的封裝結構的剖視示意圖。如第8圖所示,本實施例所提供的封裝結構300與第一實施例的差異在於本實施例的封裝結構300還可包括一第二晶粒320,設置於第一晶粒108的虛置部分108P與封膠層114之間。具體來說,如第3圖與第8圖所示,本實施例的封裝結構300的製作方法與第一實施例的差異在於形成封膠體114之前,另於虛置部分108P上設置第二晶粒320。第二晶粒320可依據實際需求而與第一晶粒108相同或不相同。舉例來說,值得說明的是,由於第一晶粒108的積體電路單元104之間不具有空隙,因此即使在虛置部分108P上設置有第二晶粒320,成型材料依舊能快速的填滿第一晶粒108與電路載板110之間的空隙,而不會受到第二晶粒320的設置的影響。 綜上所述,於本發明所揭露的封裝結構中,透過具有至少兩個積體電路單元的第一晶粒的設計,積體電路單元之間的間距可縮小,使得封裝結構的體積可有效地縮減。並且,透過此設計,封裝結構的製作成本以及製作程序均可有效地降低,進而節省成本。 以上所述僅為本發明之較佳實施例,凡依本發明申請專利範圍所做之均等變化與修飾,皆應屬本發明之涵蓋範圍。Please refer to FIG. 8, which shows a schematic cross-sectional view of the package structure of the third embodiment of the present invention. As shown in FIG. 8, the difference between the package structure 300 provided by this embodiment and the first embodiment is that the package structure 300 of this embodiment may further include a second die 320 disposed on the dummy of the first die 108 Between the portion 108P and the sealing glue layer 114. Specifically, as shown in FIGS. 3 and 8, the difference between the manufacturing method of the package structure 300 of this embodiment and the first embodiment is that before the molding compound 114 is formed, a second crystal is additionally provided on the dummy portion 108P.粒320. The second die 320 may be the same as or different from the first die 108 according to actual requirements. For example, it is worth noting that since there are no gaps between the integrated circuit units 104 of the first die 108, even if the second die 320 is provided on the dummy portion 108P, the molding material can still be filled quickly. The gap between the first die 108 and the circuit carrier 110 is filled without being affected by the arrangement of the second die 320. In summary, in the package structure disclosed in the present invention, through the design of the first die having at least two integrated circuit units, the spacing between the integrated circuit units can be reduced, so that the volume of the package structure can be effectively reduced. To shrink. Moreover, through this design, the manufacturing cost and manufacturing process of the package structure can be effectively reduced, thereby saving costs. The foregoing descriptions are only preferred embodiments of the present invention, and all equivalent changes and modifications made in accordance with the scope of the patent application of the present invention should fall within the scope of the present invention.

100、200、300:封裝結構 102:晶片晶圓 104:積體電路單元 106:切割道 106a:第一切割道 106b:第二切割道 106c:第三切割道 108:第一晶粒 108P:虛置部分 110、210:電路載板 110a:上焊墊 110a1、110a2:上焊墊群 110b:內連線 110c:下焊墊 110h:排氣孔 110S1、110S2:表面 112:凸塊 114:封膠體 116:焊球 218:液態封膠 320:第二晶粒 D1:第一方向 D2:第二方向 TP:測試墊 AM:對準標記 G1、G2:間距100, 200, 300: package structure 102: Wafer 104: Integrated Circuit Unit 106: Cutting Road 106a: The first cutting pass 106b: second cutting pass 106c: third cutting lane 108: The first grain 108P: Dummy part 110, 210: Circuit carrier board 110a: Upper pad 110a1, 110a2: Upper pad group 110b: internal connection 110c: lower pad 110h: vent 110S1, 110S2: surface 112: bump 114: Sealant 116: Solder Ball 218: Liquid sealant 320: second grain D1: First direction D2: second direction TP: Test pad AM: Alignment mark G1, G2: spacing

第1圖至第6圖繪示本發明第一實施例製作封裝結構的方法示意圖。 第7圖繪示本發明第二實施例的封裝結構的剖視示意圖。 第8圖繪示本發明第三實施例的封裝結構的剖視示意圖。Fig. 1 to Fig. 6 are schematic diagrams illustrating a method of manufacturing a package structure according to the first embodiment of the present invention. FIG. 7 is a schematic cross-sectional view of the package structure according to the second embodiment of the present invention. FIG. 8 is a schematic cross-sectional view of the package structure of the third embodiment of the present invention.

104:積體電路單元 104: Integrated Circuit Unit

108:第一晶粒 108: The first grain

108P:虛置部分 108P: Dummy part

110:電路載板 110: circuit carrier board

110a:上焊墊 110a: Upper pad

110a1、110a2:上焊墊群 110a1, 110a2: Upper pad group

110b:內連線 110b: internal connection

110c:下焊墊 110c: lower pad

110S1、110S2:表面 110S1, 110S2: surface

112:凸塊 112: bump

114:封膠體 114: Sealant

116:焊球 116: Solder Ball

G1、G2:間距 G1, G2: spacing

Claims (10)

一種封裝結構,包括: 一電路載板; 一第一晶粒,設置於該電路載板上,且該第一晶粒包括至少兩個積體電路單元以及一虛置部分,其中該虛置部分將該等積體電路單元分隔開,該虛置部分不將該等積體電路單元彼此電性連接,且該等積體電路單元透過該電路載板彼此電性連接;以及 一封膠體,覆蓋於該第一晶粒與該電路載板上。A packaging structure, including: A circuit carrier board; A first die arranged on the circuit carrier, and the first die includes at least two integrated circuit units and a dummy part, wherein the dummy part separates the integrated circuit units, The dummy part does not electrically connect the integrated circuit units to each other, and the integrated circuit units are electrically connected to each other through the circuit carrier; and A sealant covering the first die and the circuit carrier. 如請求項1所述的封裝結構,其中該等積體電路單元之間的間距小於晶粒間距的設計極限。The package structure according to claim 1, wherein the spacing between the integrated circuit units is smaller than the design limit of the die spacing. 如請求項1所述的封裝結構,其中各該積體電路單元具有相同的結構。The package structure according to claim 1, wherein each of the integrated circuit units has the same structure. 如請求項1所述的封裝結構,其中各該積體電路單元分別為一記憶體元件。The package structure according to claim 1, wherein each of the integrated circuit units is a memory device. 如請求項1所述的封裝結構,其中該等積體電路單元之間的間距小於300微米。The package structure according to claim 1, wherein the distance between the integrated circuit units is less than 300 microns. 如請求項1所述的封裝結構,其中該電路載板具有兩個上焊墊群,位於該電路載板面對該第一晶粒的表面,並分別電連接不同的該等積體電路單元,且該等上焊墊群之間的最小間距小於晶粒間距的設計極限。The package structure according to claim 1, wherein the circuit carrier has two upper bonding pad groups, which are located on the surface of the circuit carrier facing the first die, and are respectively electrically connected to the different integrated circuit units And the minimum spacing between the upper bonding pad groups is smaller than the design limit of the grain spacing. 如請求項1所述的封裝結構,還包括一第二晶粒,設置於該虛置部分與該封膠體之間。The package structure according to claim 1, further comprising a second die disposed between the dummy part and the molding compound. 一種封裝結構的製作方法,包括: 提供一晶片晶圓,其中該晶片晶圓包括複數個積體電路單元; 切割該晶片晶圓,以形成複數個第一晶粒,其中各該第一晶粒包括該等積體電路單元中相鄰的至少兩個以及一虛置部分,該虛置部分將該至少兩個積體電路單元分隔開,且該虛置部分不將該等積體電路單元彼此電性連接; 將該等第一晶粒中的一個設置於一電路載板上,其中該等積體電路單元係透過該電路載板彼此電性連接;以及 於該等第一晶粒中的該個與該電路載板上形成一封膠體。A manufacturing method of an encapsulation structure, including: Provide a chip wafer, wherein the chip wafer includes a plurality of integrated circuit units; The chip wafer is diced to form a plurality of first dies, wherein each of the first dies includes at least two adjacent ones of the integrated circuit units and a dummy part, and the dummy part causes the at least two The integrated circuit units are separated, and the dummy part does not electrically connect the integrated circuit units to each other; Disposing one of the first dies on a circuit carrier, wherein the integrated circuit units are electrically connected to each other through the circuit carrier; and A sealant is formed on the one of the first dies and the circuit carrier. 如請求項8所述的封裝結構的製作方法,還包括於形成該封膠體之前,於該虛置部分上設置一第二晶粒。The manufacturing method of the package structure according to claim 8, further comprising disposing a second die on the dummy part before forming the molding compound. 如請求項8所述的封裝結構的製作方法,其中該等積體電路單元之間的間距小於固晶製程的晶片間距設計極限。The manufacturing method of the package structure according to claim 8, wherein the spacing between the integrated circuit units is smaller than the chip spacing design limit of the die bonding process.
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