TWI720093B - Display device and its manufacturing method and manufacturing device - Google Patents

Abstract

The subject of the present invention is to provide a display device, its manufacturing method, and its manufacturing device capable of suppressing the degradation of display quality due to bright spot defects. The solution is that in the display device, at least one of the first glass substrate and the second glass substrate has a dimming portion that covers the defect portion of the bright spot when viewed from the display surface side. The light-reducing part includes a colored layer whose color is different from that of the first glass substrate and the second glass substrate, and a void layer containing a plurality of voids.

Description

Display device and its manufacturing method and manufacturing device

Invention field

The present invention relates to a display device and its manufacturing method and manufacturing device.

Background of the invention

Among various display devices, for example, the liquid crystal display device drives the liquid crystal by applying an electric field generated between the pixel electrode and the common electrode to the liquid crystal layer sandwiched by a pair of substrates, thereby adjusting the penetrating pixel electrode and the common electrode. The amount of light in the area between the electrodes is used for image display.

It is known that, for example, in a liquid crystal display device, there is a problem of so-called bright point defects (also referred to as pixel defects) in which the display brightness of pixels becomes higher than desired brightness. The bright spot defect is caused by, for example, in the manufacturing process of the liquid crystal display device, foreign matter is mixed between a pair of substrates, and the foreign matter disturbs the alignment of the liquid crystal or short-circuits the pixel electrode and the common electrode.

The method of correcting the aforementioned bright spot defect has been disclosed in Patent Document 1, for example. In the method of Patent Document 1, the inside of the glass substrate is irradiated with laser light, and the colored layer is formed to cover the area where the bright spot defect occurs when viewed from a plan view, thereby reducing the amount of light transmission.

Prior art literature Patent literature

Patent Document 1: Japanese Patent Laid-Open No. 2015-175857

Summary of the invention

However, when only the colored layer is generally used as in the past, the coloring may become insufficient, and the defect of the bright spot defect may not be sufficiently corrected.

The present invention is an invention made in view of the foregoing actual situation, and it is to provide a display device, a manufacturing method thereof, and a manufacturing device capable of suppressing the degradation of display quality caused by bright spot defects.

In order to solve the aforementioned problems, a display device of one aspect of the present invention is a display device including a first glass substrate and a second glass substrate. The second glass substrate faces the first glass substrate and is located on the display surface side. The inside of at least one of the first glass substrate and the second glass substrate has a dimming portion that covers the defect portion of the bright spot as viewed from the display surface side. The dimming portion includes a colored layer, a color, and the first The glass substrate and the aforementioned second glass substrate are different; and the void layer contains a plurality of voids, and each of the plurality of voids has a diameter of 1 nm or more and 50 μm the following.

According to the aforementioned aspect of the present invention, it is possible to suppress the degradation of the display quality caused by the bright spot defect.

1.1a: Dimming part

2: Coloring layer

3: void layer

4: Ultra-short pulse laser light

5: Refractive index change layer

6: Bright spot defect correction device

7: Ultra-short pulse laser light oscillation mechanism

8: High condensing lens

30: Data line drive circuit

31: Gate line drive circuit

32: Opening

33, 1000, 1001: foreign body

34: Backlight light

90: check device

91: Calculus Department

92: mobile device

93: control device

95: Manufacturing device of display device

100: Ultraviolet or gamma (γ) rays

133: Bright spot defect department

134: Backlighting

A1, A2: line

AF: Alignment film

BM: black matrix

CF: Color filter

CIT: Common electrode

CONT: contact hole

DL: Data line

DM: Drain electrode

DP: display panel

F: Focus

GB: Glass substrate

GB1: The first glass substrate

GB2: The second glass substrate

GSN: Gate insulating film

GL: Gate line

LC: liquid crystal layer

LCD: Liquid crystal display device

OC: Coating

P: pixel

PAS: insulating film

PIT: pixel electrode

POL1, POL2: Polarizing plate

SEM: semiconductor layer

SM: Source electrode

SUB1: TFT substrate

SUB2: CF substrate

UPAS: upper insulating film

Fig. 1 is a diagram showing the overall configuration of a liquid crystal display device according to a first embodiment of the present invention.

FIG. 2 is a plan view showing the structure of a part of a display panel of the liquid crystal display device of FIG. 1. FIG.

Fig. 3 is an end view of a cut portion cut along the line A1-A2 in Fig. 2;

Fig. 4 is a cross-sectional view schematically showing an example of a bright spot defect in the liquid crystal display device of Fig. 1.

5 is a cross-sectional view showing the structure of a pixel having a dimming portion in the liquid crystal display device of the first embodiment.

Fig. 6 is a schematic diagram of the formation of the center of a non-bridging oxygen void in the interior of the glass substrate.

Figure 7 (a) and (b) are schematic diagrams of multiphoton absorption.

FIG. 8 is a diagram showing the processing phenomenon in the energy density when the ultrashort pulse laser light is condensed inside the glass substrate.

FIG. 9 is a schematic diagram showing the processing principle of the dimming part of the liquid crystal display device of FIG. 1.

Fig. 10 is a schematic diagram of the situation where the processed laser light is scattered by the gap.

11 is a cross-sectional view showing another structure of a pixel having a dimming portion in the liquid crystal display device of the first modification of the first embodiment.

Fig. 12A is a flowchart showing a method of correcting a bright spot defect in the liquid crystal display device of the second embodiment.

FIG. 12B is a block diagram of a manufacturing apparatus of a display device capable of implementing a method for correcting a bright spot defect.

FIG. 13 is a flowchart showing a method of correcting a bright spot defect in a liquid crystal display device according to a modification of the second embodiment.

Fig. 14 is a schematic diagram showing the structure of a manufacturing apparatus of a liquid crystal display device according to a second embodiment.

FIG. 15 is a schematic diagram showing the structure of a manufacturing apparatus of a liquid crystal display device according to another modification.

The form used to implement the invention

Hereinafter, embodiments of the present invention will be described with reference to the drawings.

In the following embodiments, although a liquid crystal display device is taken as an example, the display device of the present invention is not limited to a display device of a liquid crystal display device, and may be, for example, an organic EL display device or a plasma display panel.

(First Embodiment)

Fig. 1 is a plan view showing the overall structure of a liquid crystal display device LCD according to the first embodiment of the present invention.

The liquid crystal display device LCD includes: a display panel DP that displays images, a drive circuit for the display panel (data line drive circuit 30, gate line drive circuit 31) that drives the display panel DP, and a control circuit ( (Not shown in the figure), and the back light irradiated from the back side is irradiated to the display Shows the backlight 134 of the panel DP.

FIG. 2 is a plan view showing the structure of a part of the display panel DP. Fig. 3 is an end view of a cut portion cut along the line A1-A2 in Fig. 2; Furthermore, one pixel P is shown in FIG. 2 and FIG. 3.

The display panel DP includes a thin film transistor substrate SUB1 (hereinafter referred to as TFT substrate SUB1.) (first substrate) arranged on the back side, and a color filter substrate SUB2 (hereinafter referred to as TFT substrate SUB1) arranged on the display surface side and facing the TFT substrate SUB1. It is called a CF substrate SUB2.) (second substrate), and a liquid crystal layer LC sandwiched between the TFT substrate SUB1 and the CF substrate SUB2.

A plurality of data lines DL extending in the column direction and a plurality of gate lines GL extending in the row direction are formed on the TFT substrate SUB1. At the respective intersections of the plurality of data lines DL and the plurality of gate lines GL A thin film transistor TFT is formed nearby. In addition, a rectangular area surrounded by two adjacent data lines DL and two adjacent gate lines GL is defined as one pixel P. In the TFT substrate SUB1, a plurality of pixels P are arranged in a matrix.

A pixel electrode PIT (display electrode) made of a transparent (translucent) conductive film such as indium tin oxide (ITO) is formed on the pixel P. As shown in FIG. 2, the pixel electrode PIT has an opening 32 (for example, a slit), and is formed in a stripe shape. Thin film transistor TFT has a semiconductor layer SEM made of amorphous silicon (aSi) formed on the gate insulating film GSN (refer to FIG. 3), and a drain electrode DM and a source electrode SM are formed on the semiconductor layer SEM (Refer to Figure 2). The drain electrode DM is electrically connected to the data line DL. The source electrode SM and the pixel electrode PIT are electrically connected to each other through the contact hole CONT.

The layered structure of each part constituting the pixel P is not limited to The structure of the structure shown in Fig. 3 can be adapted to the conventional structure. For example, in the configuration shown in FIG. 3, in the TFT substrate SUB1, a gate line GL (refer to FIG. 2) may be formed on the first glass substrate GB1, and the gate insulating film GSN may be formed to cover the gate line GL. In addition, the data line DL is formed on the gate insulating film GSN, and the insulating film PAS is formed to cover the data line DL. In addition, a common electrode CIT (display electrode) is formed on the insulating film PAS, and the upper insulating film UPAS is formed to cover the common electrode CIT. In addition, the pixel electrode PIT is formed on the upper insulating film UPAS, and the alignment film AF is formed to cover the pixel electrode PIT. A polarizing plate POL1 (first polarizing plate) is formed on the back side of the first glass substrate GB1.

In addition, in the CF substrate SUB2, a black matrix BM (light-shielding portion) and a color filter CF (for example, the red portion, The green part, the blue part) (light-transmitting part), and the coating layer OC is formed to cover these. A polarizing plate POL2 (second polarizing plate) is formed on the display surface side of the second glass substrate GB2. Accordingly, the second glass substrate GB2 faces the first glass substrate GB1 and is positioned on the display surface side, and the liquid crystal layer LC is arranged between the first glass substrate GB1 and the second glass substrate GB2.

According to the structure shown in FIG. 3, although the liquid crystal display device LCD has a structure of a so-called IPS (In Plane Switching) method, the liquid crystal display device LCD of the first embodiment is not limited to this.

Next, the driving method of the liquid crystal display device LCD will be briefly described. The gate voltage for scanning output from the gate line drive circuit 31 is supplied to the gate line GL, and the image output from the data line drive circuit 30 is used for The data voltage is supplied to the data line DL. When the gate-on voltage is supplied to the gate line GL, the semiconductor layer SEM of the thin film transistor TFT becomes low resistance, and the data voltage supplied to the data line DL is supplied to the pixel electrode PIT through the source electrode SM. In addition, a common voltage output from a common electrode drive circuit (not shown) is supplied to the common electrode CIT. Thereby, an electric field (driving electric field) is generated between the pixel electrode PIT and the common electrode CIT, and the liquid crystal layer LC is driven by the electric field to display an image.

Here, in the manufacturing process of the liquid crystal display device LCD, a bright spot defect (pixel defect) in which the display brightness of the pixel becomes higher than the desired brightness may occur. FIG. 4 shows an example when the pixel P becomes the bright spot defect portion 133. FIG. 4 illustrates a case where foreign matter 33 such as organic matter or metal is mixed between the TFT substrate SUB1 and the CF substrate SUB2 in the manufacturing process of the liquid crystal display device LCD. In the pixel P shown in FIG. 4, the alignment of the liquid crystal is disturbed by foreign matter (mixed matter) 33, thereby causing light leakage of the backlight light 34 to become a bright spot defect portion 133 with a bright spot defect.

The liquid crystal display device LCD of the first embodiment has a structure for suppressing the aforementioned bright spot defect. Specifically, as shown in FIG. 5, the dimming part 1 which reduces the transmission amount of the backlight light 34 is formed in the inside of the 2nd glass substrate GB2 of the CF substrate SUB2. The dimming parts 1 are arranged in a plane, and are formed to cover the bright spot defect part 133 caused by the foreign matter 33 when viewed from the display surface side of the second glass substrate GB2. That is, in the inside of at least one of the first glass substrate GB1 and the second glass substrate GB2, the dimming portion 10 that covers the bright spot defect portion 133 when viewed from the display surface side is arranged. The dimming part 1 includes the color and the first glass substrate GB1 and the second glass substrate GB2 Each of the coloring layer 2 is different from the coloring layer 2 and the void layer 3 with a plurality of (that is, a plurality of) voids is formed under the coloring layer 2. The colored layer 2 is formed by the center of the non-bridging oxygen pores.

Fig. 6 is a schematic view showing the formation of the center of the non-bridging oxygen hole in the inside of the second glass substrate GB2. Figure 7 is a schematic diagram of multiphoton absorption. FIG. 8 is a diagram showing the processing phenomenon in the energy density when the ultrashort pulse laser light is internally focused on the glass substrate. FIG. 9 is a schematic diagram showing the processing principle of the light-reducing part 1. Fig. 10 is an enlarged view of the vicinity of the condensing point showing how the processed laser light is scattered by the gap.

As shown in FIG. 6, when ultraviolet rays or gamma rays (γ rays) 100 are irradiated to the non-bridging oxygen inside the glass substrate GB, one electron is released to form the center of the non-bridging oxygen hole. The center of the non-bridging oxygen hole has absorption from the ultraviolet light region to the visible light region, and is reddish-brown. Usually, this non-bridging oxygen hole center is formed by irradiating short-wavelength light such as ultraviolet rays or gamma rays, but by using a phenomenon called multiphoton absorption, it can also be formed by longer wavelengths. Light shines to form. As shown in Figure 7(a), short-wavelength light has greater energy. Under the absorption of one photon, the non-bridging oxygen will release an electron and form the center of the non-bridging oxygen hole. On the other hand, long-wavelength light has low energy, and when it is necessary to emit electrons with one photon, sufficient energy cannot be given. However, in the case of ultra-short pulse lasers such as femtosecond lasers, since the electric field is very strong, there are cases where multiple photons can be absorbed in the condensing area at the same time. This situation is called multiphoton absorption (refer to Figure 7(b)). Through multiphoton absorption, non-bridging oxygen can obtain sufficient energy for electron emission (from The energy from the basal state to the excited state), and form a non-bridging oxygen hole center. When the energy density of the condensing area is made larger spatially, it can cause the phenomenon of so-called refractive index change, or formation of voids, or formation of cracks. When a high condensing lens is used to condense the ultra-short pulse laser light 4 inside the glass substrate GB, when the pulse energy of the ultra-short pulse laser light 4 is set to an appropriate value, the focal point F will cause a diameter of 1 nm or more and 50 μm or less The tiny holes are formed (refer to the hole formation in Figure 8). Since the position of the ultrashort pulse laser light 4 and the glass substrate GB are relatively moved in the surface direction of the glass substrate GB, as shown in FIG. 9, the focus F can be moved in the surface direction while inside the glass substrate GB While irradiating the ultra-short pulse laser light 4 on the glass substrate GB, a large number of tiny holes with a diameter of 1 nm or more and 50 μm or less can be formed in the surface direction to form the void layer 3. At this time, where the glass substrate GB is closer to the surface than the focal point F, although the energy density is not high enough to form a hole, there is a region where sufficient energy is maintained at the center of the non-bridging oxygen hole. . By relatively moving the positions of the ultrashort pulse laser light 4 and the glass substrate GB in the surface direction, the area is diffused in the surface direction inside the glass substrate GB, and the colored layer 2 is formed. With respect to the dimming part 1 constituted by the colored layer 2 and the void layer 3, the backlight light 34 irradiated from the back surface of the glass substrate GB is first scattered very finely by the void layer 3. Then, since the colored layer 2 absorbs the scattered and transmitted light to reduce the light, and the light that has been dimmed comes out to the surface of the glass substrate GB, it is possible to suppress the display caused by the bright spot defect. Decrease in quality. In addition, when the positions of the ultrashort pulse laser light 4 and the glass substrate GB are relatively moved in the surface direction, the ultrashort pulse laser 4 is focused on the focal point F After the light, the light not used for processing diffuses and passes through the glass substrate GB, and irradiates the color filter CF or the liquid crystal layer LC in front of it. When the distance from the focal point F to the back of the glass substrate GB is short, the color filter CF or the liquid crystal layer LC may be irradiated before the light is sufficiently diffused and the energy density is reduced. The liquid crystal layer LC suffers from the suspicion of damage. However, the void layer 3 formed under such irradiation, as shown in FIG. 10, can scatter light that is not used for processing very finely, thereby reducing the energy density. Thereby, even if the light passing through the glass substrate GB irradiates the color filter CF or the liquid crystal layer LC, the damage to the color filter CF or the liquid crystal layer LC is minimal. Ultrashort pulse laser light 4 needs to have a pulse width, wavelength and pulse energy that can induce multiphoton absorption inside the glass substrate GB, and ideally, the wavelength is above 100 and below 10000nm, and the pulse width is above 1fs~ 100ps or less, the pulse energy is 1μJ or more and 20μJ or less. In addition, the high condensing lens preferably has an NA (numerical aperture) of 0.3 or more and 0.6 or less, and more preferably a lens with aberration correction function. By irradiating the laser light 4 under this condition to the glass substrate GB, a void layer 3 containing a large number of holes as shown in FIG. 9 can be formed at the position of the focal point F, and at a position closer to the glass substrate GB than the focal point F A colored layer 2 is formed on the surface.

According to the first embodiment, in the inside of at least one of the first glass substrate GB1 and the second glass substrate GB2, there is a dimming portion 1 that can cover the bright spot defect portion 133 when viewed from the display surface side, and the dimming portion 1 is It is composed of a colored layer 2 having a color different from that of the first glass substrate GB1 and the second glass substrate GB2, and a void layer 3 including a plurality of voids. With such a configuration, it is possible to suppress damage to the color filter CF and the liquid crystal layer LC. It can prevent damage to the display quality caused by the defect of the bright spot.

(First modification)

FIG. 11 shows another structure for suppressing the aforementioned bright spot defect in the liquid crystal display device LCD of the first modification of the first embodiment. In addition, in FIG. 11, for the sake of simplicity, although the following examples of the second modification and the third modification also exist, they are not limited to this example, and in addition to the first embodiment, There may be only any one of the first modification to the third modification, and of course any combination of these may be used.

When forming the light-reducing portion 1, a gap can be formed between the colored layer 2 (first colored layer) and the void layer 3 according to processing conditions. Since the energy density of the light irradiated to this gap is higher than when the coloring layer 2 is formed, and lower than when the gap layer 3 is formed, as shown in FIG. 8, it can be formed to maximize the refractive index (1.4~1.6) of the glass substrate GB Add 0.02 the refractive index change layer 5 (the first refractive index change layer). In other words, between the first colored layer 2 and the void layer 3, the light-reducing part 1 further includes the refractive index change layer 5 showing a refractive index larger than that of the first glass substrate GB1 and the second glass substrate GB2. Since the refractive index change layer 5 can shield the light of the bright spot defect with higher accuracy, it is possible to prevent the display quality of the display device from deteriorating.

(Second modification)

Next, a second modification of the first embodiment will be described below. It is also possible to provide the colored layer 2a (second colored layer) at a position deeper than the focal point F (void layer 3) (the first glass substrate GB1 side). At this time, the void layer 3 is located between the first colored layer 2 and the second colored layer 2a. The color of the second colored layer 2a is different from each of the first glass substrate GB1 and the second glass substrate GB2. This The reason is that the energy density of the transmitted light after the void layer 3 is formed on the focal point F is very large, and therefore the second colored layer 2a can be formed as a result of the coloring caused by the formation of the non-bridging oxygen hole center. However, since the color density of the second color layer 2a depends on the energy density, the color density of the second color layer 2a formed by transmitted light is lower than that of the first color layer 2 formed by incident light. With the second colored layer 2a formed in this way, the light-reducing ability of the light-reducing part 1 is further improved.

(3rd modification)

Next, a third modification of the first embodiment will be described below. The dimming part 1 is preferably made to further include a second refractive index change layer 5a, which is located between the void layer 3 and the second colored layer 2a and formed by forming the void layer 3 on the focal point F The latter is formed by transmitted light, and exhibits a refractive index greater than that of the first glass substrate GB1 or the second glass substrate GB2. In this case, since the increase in refractive index depends on the energy density, the refractive index of the second refractive index change layer 5a formed by transmitted light is smaller than that of the refractive index change layer 5 formed by incident light. . The difference in refractive index between the first refractive index change layer 5 and the first glass substrate GB1 and the second glass substrate GB2 is about 0.015 at the maximum. The second refractive index change layer 5 a is formed at a position closer to the foreign object 33. Therefore, even when the backlight light 34 is diffused in an oblique direction due to the influence of the foreign matter 33, it can be refracted by the second refractive index change layer 5a, and the diffusion angle of the backlight light 34 can be reduced. Thereby, the diffusion of the backlight light 34 can be suppressed, and the backlight light 34 incident on the void layer 3 can be increased compared to the case where the second refractive index change layer 5a is not formed. Therefore, the dimming capability of the dimming section 1 is improved.

Here, the second colored layer 2a of the second modification is the use wavelength It is formed by laser light having a pulse width of 2 fs or more and 90 ps or less, and a pulse energy of 2 μJ or more and 18 μJ or less. The NA of the lens that condenses the laser light is 0.35 or more and 0.55 or less.

The second refractive index change layer 5a of the third modification is formed using laser light having a wavelength of 300 nm or more and 8000 nm or less, a pulse width of 3 fs or more to 80 ps or less, and a pulse energy of 3 μJ or more and 17 μJ or less. The NA of the lens that condenses the laser light is 0.4 or more and 0.5 or less.

(4th modification)

Next, a fourth modification of the first embodiment will be described below. When the pulse energy is reduced to 1 μJ or more and 4 μJ or less to irradiate laser light, although the void layer 3 can be formed at the focal point F, the coloring layer 2 will not be formed at a position closer to the surface of the glass substrate GB than the focal point F. , Or become a thin coloring that is almost indistinguishable under visual inspection. That is, only the void layer 3 is formed alone. Even if the void layer 3 exists alone, although it has the effect of scattering the backlight light 34, it does not have the effect of dimming light. In this state, the pulse energy can be increased to 3 μJ or more and 13 μJ or less, and the laser light can be irradiated to focus on the position closer to the surface of the glass substrate GB than the single gap layer 3 to form the above-mentioned embodiment and modification Example of dimming part 1. At this time, light is condensed at the focal point F, and a so-called coloration or void formation reaction occurs in the vicinity thereof. Although the energy not used in this reaction can be diffused and irradiated to the back of the glass substrate GB, because there is a separate void layer 3 in between, the laser light will be scattered by the multiple voids of the void layer 3 and increase the energy density. reduce. Thereby, it is possible to suppress damage to the color filter CF and the liquid crystal layer LC located close to the back surface of the glass substrate GB. After processing, the gap layer 3 can be made to The dimming part 1 composed of the color layer 2 is formed at a position closer to the surface of the glass substrate GB than the single void layer.

(Other variants)

The light reduction section 1 may be formed on the first glass substrate GB1 of the TFT substrate SUB1. Moreover, the light reduction part 1 may be formed in both of the 1st glass substrate GB1 and the 2nd glass substrate GB2. That is, the dimming part 1 may be formed on at least any one of the first glass substrate GB1 of the TFT substrate SUB1 and the second glass substrate GB2 of the CF substrate SUB2.

When the light reduction part 1 is formed in both of the 1st glass substrate GB1 and the 2nd glass substrate GB2, the light reduction ability can be improved. At this time, when both of the light reduction parts 1 are formed, the amount of light reduction of the respective light reduction parts 1 may be made smaller than the case where the glass substrate GB is formed only on one of them. Therefore, the output of the ultrashort pulse laser light 4 irradiated on each glass substrate can be reduced, and it becomes difficult to become the damage to the lower layer caused by the transmitted light.

In addition, when the dimming portion 1 is formed only on the glass substrate GB of either the first glass substrate GB1 and the second glass substrate GB2, the dimming portion 1 is formed on the second glass substrate GB2. good. The reason is that the light irradiated by the bright spot defect formed by the foreign matter 33 is blocked on the display pixel side than the foreign matter 33 can improve the display quality. In particular, when the display device has a liquid crystal layer LC located between the first glass substrate GB1 and the second glass substrate GB2, and in the case where the liquid crystal layer LC contains the bright spot defect portion 133 formed by the foreign matter 33, it is suitable for the first glass substrate GB1 and the second glass substrate GB2. 2 The glass substrate GB2 forms the dimming section 1. This is to block the liquid crystal caused by foreign matter 33 The arrangement of molecules is disorderly arranged by light.

In addition, the position of the dimming portion 1 formed on the first glass substrate GB1 inside the first glass substrate GB1 and the position of the dimming portion 1 formed on the second glass substrate GB2 inside the second glass substrate GB2 , Can be the same or different. For example, the light reduction unit 1 may be formed on the backlight side inside the first glass substrate GB1, or the light reduction unit 1 may be formed on the liquid crystal layer LC side inside the second glass substrate GB2. However, it is better to form the dimming part 1 as close to the foreign object 33 as possible. As for the reason, it is because when the area of the dimming part 1 is the same, the method of forming it at a position close to the foreign matter 33 can also reduce the light diffused in the oblique direction due to the foreign matter 33.

According to the aforementioned configuration, since the brightness of the pixel that becomes the bright spot defect portion 133 can be reduced, the bright spot defect (light leakage) can be made inconspicuous. Thereby, it is possible to suppress the degradation of the display quality due to the bright spot defect, and it is possible to improve the manufacturing yield of the liquid crystal display device LCD.

(Second Embodiment)

Next, as a second embodiment of the present invention, a method of manufacturing the liquid crystal display device LCD of the first embodiment will be described. This method is demonstrated about the manufacturing method of the display device provided with the 1st glass substrate GB1, and the 2nd glass substrate GB2 which opposes the said 1st glass substrate GB1, and is located on the display surface side. The manufacturing method of this display device includes: an inspection step of performing a light-on inspection of the display device to detect bright spot defects of the pixels; and an irradiation step of irradiating the first or second glass substrate GB1 or GB2 with laser light 4 to form coloring Layer 2 and void layer 3 to cover the aforementioned bright spot defects. The laser light 4 irradiated in the foregoing irradiation step has a wavelength of 100 nm or more and 10000 nm or less, a pulse width of 1 femtosecond or more and 100 picoseconds or less, a pulse energy of 1 μJ or more and 20 μJ or less, and a NA of 0.3 or more and 0.6 The following lens condenses light.

In more detail, this manufacturing method includes the manufacturing process of the TFT substrate SUB1, the manufacturing process of the CF substrate SUB2, the bonding process of the TFT substrate SUB1 and the CF substrate SUB2, the liquid crystal injection process, the lighting inspection process of the display panel DP, and Bright spot defect correction process.

Among the aforementioned processes, the manufacturing process of the TFT substrate SUB1, the manufacturing process of the CF substrate SUB2, the bonding process of the TFT substrate SUB1 and the CF substrate SUB2, the liquid crystal injection process, and the lighting inspection process can apply conventional methods.

For example, the manufacturing process of the TFT substrate SUB1 includes a process of forming a gate line GL, a data line DL, a pixel electrode PIT, a common electrode CIT, various insulating films, and a polarizing plate POL1 on the first glass substrate GB1. The pixel P defined on the TFT substrate SUB1 may include a red pixel Pr corresponding to red, a green pixel Pg corresponding to green, and a blue pixel Pb corresponding to blue. In addition, the manufacturing process of the CF substrate SUB2 includes a process of forming the black matrix BM, the color filter CF, and the polarizing plate POL2 on the second glass substrate GB2.

Hereinafter, the lighting inspection process and the bright point defect correction process in this manufacturing method will be described.

Fig. 12A is a flowchart showing a method for correcting a bright spot defect. FIG. 12B shows the manufacturing device of the display device capable of implementing the correction method of the bright spot defect Set 95 block diagram.

The manufacturing device 95 of the display device includes at least an inspection device 90 that performs a light-on inspection of the display device to detect bright point defects of pixels, and a bright point defect correction device 6. The manufacturing device 95 may further include a control device 93 and an arithmetic unit 91. The control device 93 controls the operation of the inspection device 90, the calculation unit 91, and the bright spot defect correction device 6 respectively. The calculation unit 91 performs predetermined calculations as described later.

First, in the lighting inspection process, the inspection device 90 detects bright spot defects. For example, the inspection device 90 may turn on all the display panels DP or turn them on in a row to measure the brightness of each pixel (step S001).

Next, the inspection device 90 detects the pixel whose brightness exceeds the threshold value as a bright point defect portion 133 (pixel defect portion) (step S002). The inspection device 90 outputs the position information of the pixels detected as the bright spot defect portion 133 to the bright spot defect correction device 6 described later. The detection of the bright spot defect part 133 can also be performed by the operator's visual inspection. When the bright spot defect part 133 is detected, it can move to the bright spot defect correction process (step S030). When the bright spot defect 133 is not detected, this flow is ended.

Shown in FIG. 14 is a schematic configuration of the bright spot defect correcting device 6 for performing the bright spot defect correcting step (step S030). The bright spot defect correction device 6 includes an optical system including an ultra-short pulse laser oscillation mechanism 7 and a high-condensing lens 8.

In the second embodiment, a laser wavelength of 1552nm and a pulse width of 800fs are used as the ultrashort pulse laser oscillation mechanism 7. The laser light, come as an example.

The bright spot defect correction process (step S030) includes the processes from step S003 to step S006.

In the bright spot defect correcting process (step S030), first, the bright spot defect correcting device 6 is made to obtain the position information and shape information (for example, position, size, shape) of the pixel of the bright spot defect from the inspection device 90 (step S003).

Next, based on the obtained shape information, the calculation unit 91 calculates the shape and position information (e.g., position, size, shape) of the dimming unit 1 formed by irradiating the ultrashort pulse laser light 4 (step S004).

Next, under the control of the control device 93, based on the position information of the dimming unit 1 calculated by the calculation unit 91, the optical system such as the high condensing lens 8 of the bright spot defect correction device 6 is aligned.

Next, under the control of the control device 93, the bright spot defect correction device 6 adjusts the position of the focal point F of the ultrashort pulse laser light 4 to a desired position inside the second glass substrate GB2. The position of the focal point F is, for example, adjusted according to the size of the foreign object that causes the bright spot defect or the measured brightness value. For example, as shown in FIG. 14, the inside of the second glass substrate GB2 is adjusted so that the focal point F of the ultrashort pulse laser light 4 is aligned with the vicinity of the foreign object 33.

Next, under the control of the control device 93, the bright spot defect correction device 6 emits the ultrashort pulse laser light 4 from the ultrashort pulse laser oscillation mechanism 7. Thereby, the ultrashort pulse laser light 4 emitted from the ultrashort pulse laser oscillation mechanism 7 can be condensed on the second glass substrate GB2 by the high condensing lens 8 The internal focal point F comes to illuminate.

Next, under the control of the control device 93, when the irradiation position of the ultra-short pulse laser light 4 is moved by the moving device 92, the ultra-short pulse laser light 4 is continuously irradiated to form the dimming section 1 ( Step S005), and the bright point defect correction process (Step S030) is completed (Step S006).

According to the manufacturing method or manufacturing apparatus of the foregoing embodiment, since the existing inspection device can be used for inspection, and only defective ones are flowed to the correction process, it has the advantage of not affecting the overall process tempo.

(Modification)

Fig. 13 is a flowchart showing another method of correcting a bright spot defect as a modification of the second embodiment.

First, in the inspection device 90, the display device is turned on (step S007), and a bright spot defect is detected (step S008). In the same manner as in step S002, the inspection device 90 detects a pixel whose measured brightness exceeds the threshold value as a bright point defect portion 133 (pixel defect portion). The inspection device outputs the position information of the pixels detected as the bright spot defect portion 133 to the bright spot defect correction device 6. The detection of the bright spot defect part 133 can also be performed by the operator's visual inspection. When the bright spot defect portion 133 is detected, it is possible to move to the bright spot defect correction process (step S040). When the bright spot defect 133 is not detected, this flow is ended.

The bright spot defect correction process (step S040) includes step S009 to step S013.

In the bright spot defect correction step (step S040), first, the bright spot defect correction device 6 is caused to obtain an image of the bright spot defect from the inspection device 90. The position information and shape information (for example, position, size, shape) of the element (step S009).

Next, based on the obtained shape information, the calculation unit 91 calculates the shape and position information (e.g., position, size, shape) of the dimming unit 1 formed by irradiating the ultrashort pulse laser light 4 (step S010).

Next, under the control of the control device 93, based on the position information of the dimming unit 1 calculated by the calculation unit 91, the optical system such as the high condensing lens 8 of the bright spot defect correction device 6 is aligned.

Next, under the control of the control device 93, the bright spot defect correction device 6 adjusts the position of the focal point F of the ultrashort pulse laser light 4 to a desired position inside the second glass substrate GB2. The position of the focal point F is, for example, adjusted according to the size of the foreign object that causes the bright spot defect or the measured brightness value. For example, as shown in FIG. 14, the inside of the second glass substrate GB2 is adjusted so that the focal point F of the ultrashort pulse laser light 4 which is a high-energy beam is aimed at the vicinity of the foreign object 33.

Next, under the control of the control device 93, the bright spot defect correction device 6 emits the ultrashort pulse laser light 4 from the ultrashort pulse laser oscillation mechanism 7. Thereby, the ultrashort pulse laser light 4 emitted from the ultrashort pulse laser oscillation mechanism 7 can be irradiated by the high condensing lens 8 at the focal point F inside the second glass substrate GB2.

Next, under the control of the control device 93, when the irradiation position of the ultra-short pulse laser light 4 is moved by the moving device 92, the ultra-short pulse laser light 4 is continuously irradiated to form the dimming section 1 ( Step S011).

After the dimming portion 1 has been formed, under the control of the control device 93, the lighting inspection is performed again (step S012), and the disappearance of the bright spot defect is confirmed, and the bright spot defect correction process (step S040) is completed (step S013).

Under the control of the control device 93, if a bright spot defect is detected in the second and subsequent lighting inspection steps, the process returns to step S009, and the bright spot defect correction is performed again (from steps S009 to S011). In the correction of the bright spot defect after the second time, the shape or size of the dimming part 1 formed in the first time may be different.

In this way, in the bright point defect correction step (step S030 or S040) of the second embodiment or its modification, the glass material is colored by focusing the focus on the glass substrate GB and irradiating the high-energy beam to color the glass material. The shape of the glass substrate itself is changed. For example, there is no case where the inside or surface of the glass substrate GB is destroyed to change the shape. Therefore, the aforementioned bright spot defect correction process (step S030 or S040) can be performed in a state where the polarizing plates POL1 and POL2 are formed on, for example, the TFT substrate SUB1 and the CF substrate SUB2, that is, after the display panel DP is completed. In addition, since the dimming part 1 and the glass substrate GB are both made of the same material, there is no change in refractive index.

According to this modified example, it is possible to check whether the correction has been sufficiently performed and whether the black spots are defective due to coloring by performing a re-inspection after the correction.

(Other variants)

Furthermore, in the bright point defect correction process (step S030 or S040), it is also possible to respond to the color of the pixel corresponding to the bright point defect portion 133 that becomes the bright point defect. Color, and adjust the intensity of the ultra-short pulse laser light 4 to irradiate it. Thereby, the light-reducing part 1 is formed so that the light transmittance is different according to the color of the pixel corresponding to the bright point defect part 133. For example, the dimming portion 1 covering the bright point defect portion 133 corresponding to the green pixel may be formed so that the light transmittance of the dimming portion 1 is higher than that of pixels corresponding to other colors (for example, red pixels, blue pixels, etc.). The light transmittance of the dimming part 1 of the bright spot defect part 133 of) is lower.

In the foregoing description, although the bright spot defect is shown when the foreign matter 33 is mixed between the TFT substrate SUB1 and the CF substrate SUB2, the cause of the bright spot defect is not limited to this. It can also cause light leakage due to poor conditions of the thin film transistor TFT, or light leakage due to spacers arranged between the substrates. The bright spot defect correction method of the second embodiment or its modification can also be applied to these bright spot defects.

In addition, the mixing position of the foreign matter 33 that can cause the bright spot defect is not limited to between the TFT substrate SUB1 and the CF substrate SUB2. For example, even when foreign matter is mixed between the first glass substrate GB1 and the polarizing plate POL1, a bright spot defect may occur. In this case, the light reduction part 1 may be formed in the vicinity of the foreign matter in the inside of the 1st glass substrate GB1. In addition, when foreign matter is mixed between the second glass substrate GB2 and the polarizing plate POL2, a bright spot defect may also occur. In this case, the dimming part 1 may be formed in the vicinity of the foreign matter in the inside of the second glass substrate GB2. In this way, foreign matter may be mixed into an unspecified position of the display panel DP. Therefore, for example, as shown in FIG. 15, in one display panel DP, foreign materials 1001 and 1000 that cause bright spot defects have been mixed between the first glass substrate GB1 and the polarizing plate POL1 (first position), and the first glass substrate GB1 and the polarizing plate POL1 (first position). 2 Between the glass substrate GB2 and the polarizing plate POL2 (No. 2 position), the first dimming portion 1 may be formed in the vicinity of the foreign substance 1000 in the interior of the first glass substrate GB1 to correspond to the foreign matter 1000 in the first position, and the second dimming portion 1a may correspond to The foreign matter 1001 at the second position is formed in the vicinity of the internal foreign matter 1001 in the second glass substrate GB2. In addition, in this case, considering the work efficiency of the bright point defect correction process, both the first dimming portion 1 and the second dimming portion 1a may be formed on the display surface side of the second glass substrate GB2. In addition, the first dimming portion 1 and the second dimming portion 1a may be formed so that the transmittances are different from each other. Specifically, the second dimming portion 1a is arranged at the position shown in FIG. 15. In this case, in the pixel P, in FIG. 15, the foreign matter 1000 is present on the right side of the interface between the second glass substrate GB2 and the polarizing plate POL2, and the foreign matter 1001 is present on the first glass substrate GB1 and the polarizing plate POL1. To the left of the interface of, the foreign object 1000 and the foreign object 1001 are both smaller than the foreign object 33. In order to correct the bright spot defect caused by the foreign matter 1000 and foreign matter 1001, as shown in FIG. 15, a first dimming section 1 is provided on the liquid crystal layer LC side of the foreign matter 1000, and a second dimming unit is provided on the liquid crystal layer LC side of the foreign matter 1001. Section 1a. In this way, it is possible to more efficiently correct the bright spot defect.

Although the embodiments of the present invention have been described above, the present invention is not limited to the foregoing embodiments, and within the scope not departing from the spirit of the present invention, those with ordinary knowledge in the technical field to which the present invention pertains can implement from the foregoing. The form in which the form is suitably changed can also be included in the technical scope of this invention.

In addition, by appropriately combining any of the aforementioned various embodiments or modifications, the effects possessed by each can be exerted. Also, the combination of the embodiments or the combination of the embodiments Or the combination of the embodiment and the embodiment is possible, and the combination of the features in different embodiments or embodiments with each other is also possible.

Industrial availability

The display device of the foregoing aspect of the present invention, its manufacturing method, and its manufacturing device can suppress the degradation of display quality caused by bright spot defects, and is particularly useful for liquid crystal displays or organic EL flat panel displays with built-in display devices, and can be widely used. It is widely used in display devices, manufacturing methods and manufacturing devices of displays that require high brightness, high definition, and image quality uniformity, as well as electrical equipment or devices with display devices.

1‧‧‧Dimming part

2‧‧‧Coloring layer

3‧‧‧Void layer

33‧‧‧Foreign body

34‧‧‧Backlight

133‧‧‧Bright spot defect department

134‧‧‧Backlighting

Line A1, A2‧‧‧

AF‧‧‧Orientation film

BM‧‧‧Black matrix

CF‧‧‧Color filter

CIT‧‧‧Common electrode

DL‧‧‧Data line

GB1‧‧‧The first glass substrate

GB2‧‧‧Second glass substrate

GSN‧‧‧Gate insulation film

LC‧‧‧Liquid crystal layer

OC‧‧‧Coating

PIT‧‧‧Pixel electrode

POL1, POL2‧‧‧Polarizer

PAS‧‧‧Insulating film

SUB1‧‧‧TFT substrate

SUB2‧‧‧CF substrate

UPAS‧‧‧Upper insulating film

Claims (14)

A display device comprising: a first glass substrate; and a second glass substrate, which is located on the display surface side facing the first glass substrate, and is located inside at least one of the first glass substrate and the second glass substrate, There is a dimming portion that covers the defect of the bright spot viewed from the display surface side, and the dimming portion includes: a colored layer whose color is different from the first glass substrate and the second glass substrate; and a void layer containing a plurality of voids, The diameter of each of the plurality of voids is 1 nm or more and 50 μm or less. The display device according to claim 1, wherein the light reduction portion is formed in the second glass substrate, and the colored layer is included on the display surface side. The display device of claim 1, wherein the dimming portion further includes a refractive index change layer between the colored layer and the void layer, which exhibits a greater refraction than the first glass substrate and the second glass substrate rate. The display device of claim 3, wherein the colored layer is a first colored layer, and the light-reducing portion further includes a color, the first glass substrate, and the In the second colored layer different from the second glass substrate, the void layer is located between the first colored layer and the second colored layer. The display device of claim 4, wherein the color density of the second colored layer is lower than the color density of the first colored layer. The display device of claim 3, wherein the refractive index change layer is a first refractive index change layer, and the colored layer is a first colored layer, and the light-reducing portion further includes color, the first glass substrate, and the second The second colored layer is different from the glass substrate, and the light-reducing part further includes a second refractive index change layer located between the void layer and the second colored layer, which exhibits a higher refractive index than the first glass substrate or the second The glass substrate has a greater refractive index. The display device according to claim 6, wherein the refractive index of the second refractive index change layer is smaller than the refractive index of the first refractive index change layer. The display device according to any one of claims 1 to 7, which further has a liquid crystal layer located between the first glass substrate and the second glass substrate and containing the bright point defect portion, and the light reduction portion is formed on Inside the aforementioned second glass substrate. A method of manufacturing a display device, the display device having a first glass substrate, and a second glass substrate on the display surface side opposite to the first glass substrate, the method of manufacturing the display device having: an inspection process, performing the display device Light-up check to detect pixels The defect part of the bright spot; and the irradiation step, irradiating the first or second glass substrate with laser light, and forming a dimming part in the interior of at least one of the first glass substrate and the second glass substrate to cover the bright spot The defective portion, the dimming portion, when viewed from the display surface side, covers the bright spot defect portion and has a colored layer and a void layer. The void layer includes a plurality of voids, each of which has a diameter of 1 nm or more and 50 μm or less, in the aforementioned irradiation step The irradiated laser light is a lens having a wavelength of 100 nm or more and 10000 nm or less, a pulse width of 1 femtosecond or more and 100 picoseconds or less, a pulse energy of 1 μJ or more and 20 μJ or less, and a lens having an NA of 0.3 or more and 0.6 or less. The method for manufacturing a display device according to claim 9, wherein, in the aforementioned irradiation step, the wavelength is 200 nm or more and 9000 nm or less, the pulse width is 2 femtoseconds or more to 90 picoseconds or less, and the pulse energy is 2 μJ or more and 18 μJ or less The laser light is used as the laser light, and the light is condensed by a lens with NA of 0.35 or more and 0.55 or less to form the dimming part, the colored layer is the first colored layer, and the dimming part further includes colors and the first glass substrate And for the second colored layer different from the second glass substrate, the void layer is located between the first colored layer and the second colored layer. The manufacturing method of claim 10, wherein, in the aforementioned irradiation step, the wavelength is 300 nm or more and 8000 nm or less, and the pulse width is Laser light with a degree of 3 femtoseconds or more to 80 picoseconds and a pulse energy of 3 μJ or more and 17 μJ or less is used as the laser light, and the light is condensed by a lens with NA of 0.4 or more and 0.5 or less to form the aforementioned dimming section. The dimming part further includes a first refractive index change layer between the colored layer and the void layer, which exhibits a refractive index greater than that of the first glass substrate and the second glass substrate, and the colored layer is the first colored layer. The light-reducing portion further includes a second colored layer having a color different from that of the first glass substrate and the second glass substrate, and the light-reducing portion further includes a second colored layer located between the void layer and the second colored layer. The refractive index change layer shows a refractive index greater than that of the first glass substrate or the second glass substrate. A manufacturing device of a display device, the display device having a first glass substrate, and a second glass substrate facing the first glass substrate and located on the display surface side, the manufacturing device of the display device including: an inspection device, and performing the display device The light-up inspection to detect the bright spot defect part of the pixel; and the bright spot defect correction device, which has a position to adjust the focus inside at least one of the first glass substrate and the second glass substrate, and emits ultra-short light through the optical system The ultra-short pulse laser oscillation mechanism of pulse laser light. The ultra-short pulse laser light emitted by the aforementioned ultra-short pulse laser oscillation mechanism has a wavelength of 100nm or more and 10000nm or less, and a pulse width of 1 femtosecond or more and 100 picoseconds. Below, pulse energy is 1μJ or more and 20μJ Hereinafter, the light is condensed by a lens with NA of 0.3 or more and 0.6 or less, and the ultrashort pulse laser oscillation mechanism is configured to transmit the ultrashort pulse laser light to the first glass substrate and the second glass substrate through the optical system At least one of the inside of the focal point is positioned, and a dimming part is formed inside at least one of the first glass substrate and the second glass substrate to cover the bright spot defect detected by the inspection device, The dimming part covers the bright spot defect part and has a colored layer and a void layer when viewed from the display surface side. The void layer contains a plurality of voids, and the diameter of each void is 1 nm or more and 50 μm or less. The manufacturing device for a display device of claim 12, wherein the emitted ultrashort pulse laser light has a wavelength of 200 nm or more and 9000 nm or less, a pulse width of 2 femtoseconds or more and 90 picoseconds or less, and a pulse energy of 2 μJ or more and 18 μJ Hereinafter, the light-reducing part is formed by condensing light with a lens with NA of 0.35 or more and 0.55 or less, the colored layer is the first colored layer, and the light-reducing portion further includes colors, the first glass substrate and the second glass substrate In a different second colored layer, the void layer is located between the first colored layer and the second colored layer. The manufacturing device for a display device of claim 13, wherein the emitted ultrashort pulse laser light has a wavelength of 300 nm or more and 8000 nm or less, a pulse width of 3 femtoseconds or more and 80 picoseconds or less, and a pulse energy of 3 μJ or more and 17 μJ or less , And the NA is 0.4 or more and 0.5 or less The lower lens condenses light to form the dimming portion. The dimming portion further includes a first refractive index change layer between the colored layer and the gap layer, which is more than the first glass substrate and the second glass substrate. A greater refractive index, the colored layer is a first colored layer, the light-reducing portion further includes a second colored layer whose color is different from that of the first glass substrate and the second glass substrate, and the light-reducing portion further includes The second refractive index change layer between the void layer and the second colored layer shows a larger refractive index than the first glass substrate or the second glass substrate.

Images