TWI716521B - A colorant compound, and a colorant material comprising the same - Google Patents

A colorant compound, and a colorant material comprising the same Download PDF

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TWI716521B
TWI716521B TW105143389A TW105143389A TWI716521B TW I716521 B TWI716521 B TW I716521B TW 105143389 A TW105143389 A TW 105143389A TW 105143389 A TW105143389 A TW 105143389A TW I716521 B TWI716521 B TW I716521B
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韓尚旻
崔一朝
鄭恩河
李承煥
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南韓商艾瑞多斯公司
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    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09BORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B11/00Diaryl- or thriarylmethane dyes
    • C09B11/02Diaryl- or thriarylmethane dyes derived from diarylmethanes
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D277/00Heterocyclic compounds containing 1,3-thiazole or hydrogenated 1,3-thiazole rings
    • C07D277/02Heterocyclic compounds containing 1,3-thiazole or hydrogenated 1,3-thiazole rings not condensed with other rings
    • C07D277/20Heterocyclic compounds containing 1,3-thiazole or hydrogenated 1,3-thiazole rings not condensed with other rings having two or three double bonds between ring members or between ring members and non-ring members
    • C07D277/32Heterocyclic compounds containing 1,3-thiazole or hydrogenated 1,3-thiazole rings not condensed with other rings having two or three double bonds between ring members or between ring members and non-ring members with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
    • C07D277/38Nitrogen atoms
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D233/00Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, not condensed with other rings
    • C07D233/54Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, not condensed with other rings having two double bonds between ring members or between ring members and non-ring members
    • C07D233/66Heterocyclic compounds containing 1,3-diazole or hydrogenated 1,3-diazole rings, not condensed with other rings having two double bonds between ring members or between ring members and non-ring members with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
    • C07D233/90Carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D263/00Heterocyclic compounds containing 1,3-oxazole or hydrogenated 1,3-oxazole rings
    • C07D263/02Heterocyclic compounds containing 1,3-oxazole or hydrogenated 1,3-oxazole rings not condensed with other rings
    • C07D263/30Heterocyclic compounds containing 1,3-oxazole or hydrogenated 1,3-oxazole rings not condensed with other rings having two or three double bonds between ring members or between ring members and non-ring members
    • C07D263/34Heterocyclic compounds containing 1,3-oxazole or hydrogenated 1,3-oxazole rings not condensed with other rings having two or three double bonds between ring members or between ring members and non-ring members with hetero atoms or with carbon atoms having three bonds to hetero atoms with at the most one bond to halogen, e.g. ester or nitrile radicals, directly attached to ring carbon atoms
    • C07D263/48Nitrogen atoms not forming part of a nitro radical
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G73/00Macromolecular compounds obtained by reactions forming a linkage containing nitrogen with or without oxygen or carbon in the main chain of the macromolecule, not provided for in groups C08G12/00 - C08G71/00
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09BORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B57/00Other synthetic dyes of known constitution
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09BORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B69/00Dyes not provided for by a single group of this subclass
    • C09B69/10Polymeric dyes; Reaction products of dyes with monomers or with macromolecular compounds
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09BORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B69/00Dyes not provided for by a single group of this subclass
    • C09B69/10Polymeric dyes; Reaction products of dyes with monomers or with macromolecular compounds
    • C09B69/103Polymeric dyes; Reaction products of dyes with monomers or with macromolecular compounds containing a diaryl- or triarylmethane dye
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/20Filters

Abstract

A disclosure of the present invention includes novel colorant compounds based on triarylmethane structure, methods for preparing the same, and colorant materials comprising the same.

Description

著色劑化合物及含有該化合物之著色劑材料 Coloring agent compound and coloring agent material containing the compound

本申請案要求於2015年12月28日提交的韓國專利申請案號10-2015-0187985之優先權,出於所有目的將所述申請案全部內容藉由援引方式併入本申請案。如果藉由援引方式併入本申請案之任何專利案、專利申請案、以及公開物的揭露內容與本申請案之說明相衝突到了可能導致術語不清楚的程度,則本說明應該優先。 This application claims the priority of Korean Patent Application No. 10-2015-0187985 filed on December 28, 2015, and the entire content of the application is incorporated into this application by reference for all purposes. If the disclosures of any patents, patent applications, and publications incorporated into this application by reference conflict with the description of this application to the extent that the terminology is unclear, this description should take precedence.

本發明涉及基於三芳基甲烷結構之新穎著色劑化合物及其製備方法。本發明還涉及包含該著色劑化合物用於濾光片的著色劑組成物以及配備有這種濾光片之顯示裝置。 The invention relates to a novel colorant compound based on a triarylmethane structure and a preparation method thereof. The present invention also relates to a coloring agent composition containing the colorant compound for a filter and a display device equipped with the filter.

濾光片被廣泛用於各種應用,特別是用於顯示裝置中,如液晶顯示器(LCD)和有機發光顯示器(OLED)等。由於該等顯示技術的快速進展,本領域中要求進一步改善濾光片,尤其在亮度、對比度以及顏色可再現性方 面。 Optical filters are widely used in various applications, especially in display devices, such as liquid crystal displays (LCD) and organic light emitting displays (OLED). Due to the rapid development of these display technologies, further improvements in filters are required in this field, especially in terms of brightness, contrast, and color reproducibility. surface.

當形成濾光片時,經常使用具有著色劑材料的顏色組成物,該著色劑材料包含顏料和/或染料。顏料通常顯示對熱和/或環境的更好的穩定性,但與染料相比可實現的亮度往往不足。另一方面,當染料用作濾光片著色劑時,可能達到令人滿意的濾光片亮度,但其穩定性,尤其是光穩定性和熱穩定性,耐化學性和/或對比度往往不足。 When forming a filter, a color composition having a colorant material containing a pigment and/or dye is often used. Pigments generally show better stability to heat and/or the environment, but the achievable brightness is often insufficient compared to dyes. On the other hand, when dyes are used as filter colorants, satisfactory filter brightness may be achieved, but its stability, especially light stability and thermal stability, chemical resistance and/or contrast are often insufficient .

特別地,具有三芳基甲烷結構的染料被認為係用於該濾光片應用的良好的候選物。然而,其穩定性、尤其光穩定性和熱穩定性係不足夠高以經受住一個或多個濾光片製造處理。另外,顯著量的三芳基甲烷染料常常在濾光片製造中的光照射處理之後在顯影處理過程中被沖洗掉(例如,洗脫至顯影溶液中)。 In particular, dyes with a triarylmethane structure are considered to be good candidates for this filter application. However, its stability, especially light stability and thermal stability, is not high enough to withstand one or more filter manufacturing processes. In addition, a significant amount of triarylmethane dye is often washed away during the development process (for example, eluted into the development solution) after the light irradiation process in the manufacture of the filter.

本發明之目的係提供具有優異的熱穩定性的包含三芳基甲烷結構之化合物。另一個目的是提供經受住在顯示器應用中製造濾光片的高溫處理同時展示足夠的亮度和/或對比度之著色劑化合物、尤其藍色著色劑化合物。本發明的另一個目的是提供一種包含三芳基甲烷結構之化合物,該化合物在濾光片製造的顯影處理過程中沒有顯著地被沖洗掉。本發明的還另一個目的係提供具有良好的耐光性的包含三芳基甲烷結構之化合物。 The object of the present invention is to provide a compound containing a triarylmethane structure with excellent thermal stability. Another object is to provide a coloring agent compound, especially a blue coloring agent compound, which can withstand the high temperature processing used to make filters in display applications while exhibiting sufficient brightness and/or contrast. Another object of the present invention is to provide a compound containing a triarylmethane structure, which is not significantly washed away during the development process of filter manufacturing. Another object of the present invention is to provide a compound containing a triarylmethane structure with good light resistance.

的確,本發明諸位發明人已經出人意料地發現本發明之化合物顯示出出色的光穩定性和優異的耐化學性。還已發現根據本發明之化合物可以有利地用於形成具有優異亮度和/或對比度的濾光片。此外,已經發現本發明之化合物可以很好地經受住在濾光片製造的光照射處理之後的顯影處理。 Indeed, the inventors of the present invention have unexpectedly discovered that the compounds of the present invention exhibit excellent light stability and excellent chemical resistance. It has also been found that the compounds according to the present invention can be advantageously used to form filters with excellent brightness and/or contrast. In addition, it has been found that the compound of the present invention can well withstand the development process after the light irradiation process in the manufacture of the filter.

在本發明中,“烷基”應理解為具體地指代通常具有從1至20個碳原子的直鏈、支鏈、或環烴基。烷基的實例包括甲基、乙基、丙基、異丙基、丁基、異丁基、二級丁基、三級丁基、戊基、新戊基、己基、環丙基、環丁基、環戊基、以及環己基。該烷基的一些或全部氫原子可以或可以不被其他基團(如鹵素原子、胺基或羥基)所取代。 In the present invention, "alkyl" should be understood to specifically refer to a linear, branched, or cyclic hydrocarbon group usually having from 1 to 20 carbon atoms. Examples of alkyl groups include methyl, ethyl, propyl, isopropyl, butyl, isobutyl, secondary butyl, tertiary butyl, pentyl, neopentyl, hexyl, cyclopropyl, cyclobutyl Group, cyclopentyl, and cyclohexyl. Some or all of the hydrogen atoms of the alkyl group may or may not be replaced by other groups (such as halogen atoms, amine groups, or hydroxyl groups).

在本發明中,“烷氧基”應理解為具體指代單鍵鍵合至氧上的直鏈、支鏈、或環狀的烴基(Alk-O-),該烴基通常具有從1至20個碳原子,較佳的是從1至8個碳原子。 In the present invention, "alkoxy" should be understood as specifically referring to a linear, branched, or cyclic hydrocarbon group (Alk-O-) with a single bond bonded to oxygen, and the hydrocarbon group usually has from 1 to 20 Carbon atoms, preferably from 1 to 8 carbon atoms.

在本發明中,“伸烷基”應理解為具體表示從烷基衍生出的二價基團。伸烷基的代表性實例包括-(CH2)j-基團(j為從1至20,較佳的是1至10),如亞甲基(-CH2-)、伸乙基(-CH2-CH2-)和伸丙基(-CH2-CH2-CH2-)。 In the present invention, "alkylene" should be understood to specifically mean a divalent group derived from an alkyl group. Representative examples of alkylene groups include -(CH 2 ) j -groups (j is from 1 to 20, preferably 1 to 10), such as methylene (-CH 2 -), ethylene (- CH 2 -CH 2 -) and propylene (-CH 2 -CH 2 -CH 2 -).

在本發明中,“芳基”應理解為具體指代衍生自芳香環的任何官能團或取代基。具體而言,芳基可具有6至20個碳原子(較佳的是6至12個,由於其易於在低成 本下合成),其中芳基的一些或全部氫原子可以或可以不被其他基團,尤其是鹵素原子、烷基、烷氧基、芳基、芳氧基、硫代烷氧基、雜環、胺基或羥基取代。該等芳基較佳的是可隨意地取代的苯基、萘基、蒽基和菲基。 In the present invention, "aryl" should be understood to specifically refer to any functional group or substituent derived from an aromatic ring. Specifically, the aryl group may have 6 to 20 carbon atoms (preferably 6 to 12, because it is easy to form Synthesis below), in which some or all of the hydrogen atoms of the aryl group may or may not be replaced by other groups, especially halogen atoms, alkyl groups, alkoxy groups, aryl groups, aryloxy groups, thioalkoxy groups, and heterocyclic groups. , Amino or hydroxyl substitution. The aryl groups are preferably optionally substituted phenyl, naphthyl, anthryl and phenanthryl.

在本發明中,“伸芳基”應理解為具體表示從芳基衍生出的二價基團。伸芳基的代表性實例係伸苯基(-C6H4-)。 In the present invention, "arylene group" should be understood to specifically mean a divalent group derived from an aryl group. A representative example of the arylene group is phenylene (-C 6 H 4 -).

在本發明中,“雜環”應理解為具體表示具有至少一個雜原子作為其一個或多個環的成員的環狀化合物。在環上的常見的雜原子包括硫、氧和氮。該等雜環可以是或者飽和的或不飽和的、芳香族的或非芳香族的,並且可以是三員環、四員環、五員環、六員環或者七-員環。該等雜環可以進一步與其他一個或多個環系統稠合。該等雜環的實例包括吡咯啶、氧戊環(oxolane)、硫戊環(thiolane)、吡咯、呋喃、噻吩、哌啶、環氧乙烷、硫化環戊烷(thiane)、吡啶、哌喃、吡唑、咪唑以及噻喃,以及它們的衍生物。該等雜環可以進一步被其他基團取代,例如以上所定義的烷基、烷氧基、芳基、硫代烷氧基、胺基或芳氧基。 In the present invention, "heterocyclic ring" should be understood to specifically mean a cyclic compound having at least one heteroatom as a member of one or more rings. Common heteroatoms on the ring include sulfur, oxygen, and nitrogen. The heterocycles may be either saturated or unsaturated, aromatic or non-aromatic, and may be three-membered, four-membered, five-membered, six-membered, or seven-membered. These heterocyclic rings may be further fused with one or more other ring systems. Examples of such heterocyclic rings include pyrrolidine, oxolane (oxolane), thiolane (thiolane), pyrrole, furan, thiophene, piperidine, ethylene oxide, sulfide cyclopentane (thiane), pyridine, piperan , Pyrazole, imidazole and thiopyran, and their derivatives. These heterocycles can be further substituted with other groups, such as alkyl, alkoxy, aryl, thioalkoxy, amino or aryloxy as defined above.

在本發明中,“鹵代”應理解為具體表示以下化學基團的至少一個氫原子已經被鹵原子取代,該鹵原子較佳的是選自氟和氯,更較佳的是氟。如果所有氫原子已經被鹵原子取代,則該鹵代化學基團係全鹵代的。例如,“鹵代烷基”包括(全)氟代烷基,例如(全)氟代甲基、乙 基、丙基、異丙基、丁基、異丁基、二級-丁基或三級-丁基;以及例如-CF3、-C2F5、七氟異丙基(-CF(CF3)2)、六氟異丙基(-CH(CF3)2)或-CF2(CF2)4CF3In the present invention, "halo" should be understood to specifically mean that at least one hydrogen atom of the following chemical group has been replaced by a halogen atom, and the halogen atom is preferably selected from fluorine and chlorine, and more preferably fluorine. If all hydrogen atoms have been replaced by halogen atoms, the halogenated chemical group is fully halogenated. For example, "haloalkyl" includes (per)fluoroalkyl, such as (per)fluoromethyl, ethyl, propyl, isopropyl, butyl, isobutyl, secondary-butyl or tertiary- Butyl; and for example -CF 3 , -C 2 F 5 , heptafluoroisopropyl (-CF(CF 3 ) 2 ), hexafluoroisopropyl (-CH(CF 3 ) 2 ) or -CF 2 (CF 2 ) 4 CF 3 .

在本發明中,“色漿(millbase)組成物”應理解為具體指代中間組成物,該中間組成物包含至少一部分有待包含在用於形成濾光片的最終組成物中的組分。用於形成濾光片的最終組成物可藉由將該色漿組成物與其他組分組合而配製。在本發明中,該色漿組成物通常包含至少有待包含在用於形成濾光片的最終組成物中的著色劑組分。 In the present invention, "millbase composition" should be understood to specifically refer to an intermediate composition that contains at least a part of the components to be included in the final composition for forming the filter. The final composition used to form the filter can be formulated by combining the color paste composition with other components. In the present invention, the color paste composition generally contains at least a coloring agent component to be included in the final composition for forming the optical filter.

本發明的一個方面涉及具有下式(I)之化合物:

Figure 105143389-A0202-12-0005-2
One aspect of the present invention relates to compounds having the following formula (I):
Figure 105143389-A0202-12-0005-2

在本發明中,X獨立地是氧原子、-NH-、或硫原子。特別地,X較佳的是硫原子。 In the present invention, X is independently an oxygen atom, -NH-, or a sulfur atom. In particular, X is preferably a sulfur atom.

在本發明中,R11和R12各自獨立地選自由以下各項組成之群組:氫原子、可以被取代的烷基、可以被取代的芳基、以及包含至少一個不飽和碳-碳雙鍵(C=C)並且不包括酯基(O-C(=O)-)之基團。該等烷基和芳基可以 被其他基團取代。較佳的是該等烷基具有1至8個碳原子、更較佳的是1至4個碳原子。該等烷基可以被一個或多個鹵素原子(特別被氟原子)、或者被胺基取代。該等芳基可以被一個或多個鹵素原子(如氟原子)、具有1至4個碳原子的可隨意地氟化的烷基、具有1至4個碳原子的可隨意地氟化的烷氧基、以及羥基取代。該等包含至少一個不飽和碳-碳雙鍵(C=C)並且不包括酯基的基團較佳的是具有以下式:-R13-R14 (II) In the present invention, R11 and R12 are each independently selected from the group consisting of a hydrogen atom, an alkyl group that may be substituted, an aryl group that may be substituted, and at least one unsaturated carbon-carbon double bond ( C=C) and does not include ester groups (OC(=O)-) groups. These alkyl and aryl groups can Replaced by other groups. Preferably, the alkyl groups have 1 to 8 carbon atoms, more preferably 1 to 4 carbon atoms. These alkyl groups may be substituted by one or more halogen atoms (especially by fluorine atoms), or by amine groups. These aryl groups can be optionally fluorinated by one or more halogen atoms (such as fluorine atoms), optionally fluorinated alkyl groups having 1 to 4 carbon atoms, or optionally fluorinated alkyl groups having 1 to 4 carbon atoms. Oxy and hydroxy substitution. The groups containing at least one unsaturated carbon-carbon double bond (C=C) and excluding ester groups preferably have the following formula: -R13-R14 (II)

在本發明中,R14係該包含至少一個不飽和碳-碳雙鍵(C=C)之基團,特別是乙烯基(-CH=CH2)和-C(-ALK)=CH2(其中ALK選自烷基,特別是甲基),並且R13係將該R14連接到該化合物中的取代的胺基上的連接基團。R13可以是基於烷基或芳基的連接基團。可以將雜原子基團中的一個或多個(如O、S、NH、和N(CH3))插入在該CH2-CH2鍵之間。該等基於烷基或芳基的連接基團可以選自由以下各項組成之群組:伸烷基、鹵代伸烷基、伸芳基、鹵代伸芳基、雜原子、雜環基團、鹵代雜環基團、以及其任何組合。在本發明中可以是R13的組合的示例性類型包括:-伸烷基-伸芳基-、-伸烷基-伸芳基-伸烷基-、以及-伸芳基-伸烷基-伸芳基-。 In the present invention, R14 is a group containing at least one unsaturated carbon-carbon double bond (C=C), especially vinyl (-CH=CH 2 ) and -C(-ALK)=CH 2 (wherein ALK is selected from alkyl groups, especially methyl groups), and R13 is a linking group that links R14 to the substituted amine group in the compound. R13 may be a linking group based on an alkyl group or an aryl group. One or more of the heteroatom groups (such as O, S, NH, and N(CH 3 )) can be inserted between the CH 2 -CH 2 bond. The linking groups based on alkyl or aryl groups can be selected from the group consisting of: alkylene, halogenated alkylene, arylene, halogenated arylene, heteroatom, heterocyclic group , Halogenated heterocyclic groups, and any combination thereof. Exemplary types that may be a combination of R13 in the present invention include: -alkylene-arylene-, -alkylene-arylene-alkylene-, and -arylene-alkylene-alkylene Aryl-.

R13的具體實例包括-CH2-、-C2H4-、-C3H6-、-C4H8-、-C5H10-、-CH2-O-、-C2H4O-、-C3H6O-、-C2H4NH-、-C3H6NH-、-C6H4-、以及-C10H6-,但是本發明不局限於此。 Specific examples of R13 include -CH 2 -, -C 2 H 4 -, -C 3 H 6 -, -C 4 H 8 -, -C 5 H 10 -, -CH 2 -O-, -C 2 H 4 O-, -C 3 H 6 O-, -C 2 H 4 NH-, -C 3 H 6 NH-, -C 6 H 4 -, and -C 10 H 6 -, but the present invention is not limited thereto.

式](II)]之具體實例包括,但不限於:

Figure 105143389-A0202-12-0007-3
Specific examples of formula](II)] include, but are not limited to:
Figure 105143389-A0202-12-0007-3

(其中n係1或更大的整數,較佳的是1至18)。 (Wherein n is an integer of 1 or greater, preferably 1 to 18).

在本發明中,該等包含至少一個不飽和碳-碳雙鍵(C=C)並且不包括酯基的基團至少不包含(甲基)丙烯酸酯基團。該等(甲基)丙烯酸酯基團常常與顯影溶液(如KOH溶液)反應,導致該(甲基)丙烯酸酯結構的水解,並且因此可以在該顯影處理過程中被容易地沖洗掉。另外,含有該等(甲基)丙烯酸酯基團的化合物的熱穩定性不如藉由結合在本發明的化合物中的該等包含至少一個不飽和碳-碳雙鍵(C=C)並且不包括酯基的基團可獲得的熱穩定性好。 In the present invention, the groups containing at least one unsaturated carbon-carbon double bond (C=C) and not containing an ester group do not contain at least a (meth)acrylate group. The (meth)acrylate groups often react with developing solutions (such as KOH solutions), leading to hydrolysis of the (meth)acrylate structure, and therefore can be easily washed away during the development process. In addition, the thermal stability of the compound containing the (meth)acrylate groups is not as good as the one incorporated in the compound of the present invention contains at least one unsaturated carbon-carbon double bond (C=C) and does not include The ester group has good thermal stability.

在本發明中,R21獨立地選自由氫原子、烷基和芳基組成的組。該等烷基和芳基可以被其他基團取代。較佳的是該等烷基具有1至8個碳原子、更較佳的是1至4個碳原子。該等烷基可以被一個或多個鹵素原子(特別被氟原子)、或者被胺基取代。該等芳基可以被一個或多個鹵素原子(如氟原子)、具有1至4個碳原子的可隨意地氟化的烷基、具有1至4個碳原子的可隨意地氟化的烷氧基、以及羥基取代。較佳的是,R21獨立地選自被烷基或鹵素原子取代的芳基。R21的具體實例包括鹵化苯(如氟化苯和氯化苯)、烷基取代的苯、以及烷氧基取代的苯,但是本發明不局限於此。 In the present invention, R21 is independently selected from the group consisting of a hydrogen atom, an alkyl group and an aryl group. These alkyl and aryl groups may be substituted by other groups. Preferably, the alkyl groups have 1 to 8 carbon atoms, more preferably 1 to 4 carbon atoms. These alkyl groups may be substituted by one or more halogen atoms (especially by fluorine atoms), or by amine groups. These aryl groups can be optionally fluorinated by one or more halogen atoms (such as fluorine atoms), optionally fluorinated alkyl groups having 1 to 4 carbon atoms, or optionally fluorinated alkyl groups having 1 to 4 carbon atoms. Oxy and hydroxy substitution. Preferably, R21 is independently selected from aryl groups substituted with alkyl or halogen atoms. Specific examples of R21 include halogenated benzene (such as fluorinated benzene and chlorinated benzene), alkyl-substituted benzene, and alkoxy-substituted benzene, but the present invention is not limited thereto.

在本發明中,R31、R32、R33、R34、R35、R36、R37、和R38各自獨立地選自由以下各項組成之群組:氫原子、鹵素原子、烷基、烷氧基、氰基、硝基、磺醯基、以及羥基。該等烷基和烷氧基可以被其他基團取代。R34和R35可以結合在一起形成-O-、-NH-、-S-、或-SO2-。較佳的是R31至R38為氫原子。 In the present invention, R31, R32, R33, R34, R35, R36, R37, and R38 are each independently selected from the group consisting of hydrogen atom, halogen atom, alkyl group, alkoxy group, cyano group, Nitro, sulfonyl, and hydroxyl. These alkyl groups and alkoxy groups may be substituted by other groups. R34 and R35 can be combined to form -O-, -NH-, -S-, or -SO 2 -. It is preferable that R31 to R38 are hydrogen atoms.

在本發明中,R41、R42、R43、和R44各自獨立地選自由以下各項組成之群組:氫原子、烷基、芳基、以及該等包含至少一個不飽和碳-碳雙鍵(C=C)並且不包括酯基的基團。該等烷基和芳基可以被其他基團取代。其實例包括可隨意地取代的具有1至10個碳原子的烷基,例如乙基、丙基、異丙基、丁基、異丁基、二級丁基、戊基、己基、2-乙基己基、2-甲氧基乙基、2-乙氧基 乙基、2-氰乙基和2,2,2-三氟乙基,但本發明不限於此。在本發明中可以使用含氟基團,特別是被至少一個氟原子取代的烷基或芳基。R41和R42、或者R43和R44各自可以結合在一起形成環結構。這種環結構可以包含一個或多個雜原子,如氮、硫和氧。該環的實例包括以下結構,但本發明不限於此:

Figure 105143389-A0202-12-0009-4
In the present invention, R41, R42, R43, and R44 are each independently selected from the group consisting of a hydrogen atom, an alkyl group, an aryl group, and those containing at least one unsaturated carbon-carbon double bond (C =C) and does not include ester groups. These alkyl and aryl groups may be substituted by other groups. Examples thereof include optionally substituted alkyl groups having 1 to 10 carbon atoms, such as ethyl, propyl, isopropyl, butyl, isobutyl, secondary butyl, pentyl, hexyl, 2-ethyl Hexyl, 2-methoxyethyl, 2-ethoxyethyl, 2-cyanoethyl, and 2,2,2-trifluoroethyl, but the present invention is not limited thereto. Fluorine-containing groups, especially alkyl or aryl groups substituted with at least one fluorine atom, can be used in the present invention. R41 and R42, or R43 and R44 may be combined together to form a ring structure. This ring structure can contain one or more heteroatoms such as nitrogen, sulfur and oxygen. Examples of the ring include the following structures, but the present invention is not limited to this:
Figure 105143389-A0202-12-0009-4

在本發明的一個實施方式中,R41至R44係乙基。在本發明中,R41和R42中的至少一者以及R43和R44中的至少一者分別可以選自可以被取代的芳基。該等芳基的具體實例包括可以被其他基團取代的苯基團。較佳的是,R41和R42中的任一個選自可以被取代的苯基團,剩餘一個選自烷基,並且R43和R44中的任一個選自可以被取代的苯基團,剩餘一個選自烷基。 In one embodiment of the present invention, R41 to R44 are ethyl groups. In the present invention, at least one of R41 and R42 and at least one of R43 and R44 may be selected from aryl groups that may be substituted, respectively. Specific examples of such aryl groups include phenyl groups which may be substituted with other groups. Preferably, any one of R41 and R42 is selected from a phenyl group that may be substituted, the remaining one is selected from an alkyl group, and any one of R43 and R44 is selected from a phenyl group that may be substituted, and the remaining one is selected Self-alkyl.

在式](I)]中,R41、R42、R43、R44、R11和R12中的至少一者選自該等包含至少一個不飽和的碳-碳雙鍵(C=C)並且不包括酯基的基團。 In formula](I)], at least one of R41, R42, R43, R44, R11, and R12 is selected from the group consisting of at least one unsaturated carbon-carbon double bond (C=C) and does not include an ester group The group.

較佳的是,R11和R12中的任一個選自該等包含至少一個不飽和碳-碳雙鍵(C=C)並且不包括酯基的基團,並且剩餘一個選自可以被取代的烷基或可以被取代的芳基。作為該剩餘一個的R11或R12的具體實例包括烷基(特別是乙基和丙基)、鹵化苯(如氟化苯和氯化苯)、烷 基取代的苯、以及烷氧基取代的苯,但是本發明不局限於此。 Preferably, any one of R11 and R12 is selected from the group containing at least one unsaturated carbon-carbon double bond (C=C) and does not include an ester group, and the remaining one is selected from alkyl groups which may be substituted. Group or aryl group which may be substituted. Specific examples of R11 or R12 as the remaining one include alkyl (especially ethyl and propyl), halogenated benzene (such as fluorinated benzene and chlorinated benzene), alkane Group-substituted benzene and alkoxy-substituted benzene, but the present invention is not limited thereto.

在本發明中,“a”代表該相對陰離子“An”的化合價,並且如此,係1或更大的整數。“a”可以是1的整數。“a”較佳的是2或更大的整數,更較佳的是2或3,最較佳的是2。 In the present invention, "a" represents the valence of the relative anion "An", and as such, is an integer of 1 or more. "A" may be an integer of 1. "A" is preferably an integer of 2 or greater, more preferably 2 or 3, and most preferably 2.

在本發明中,“m”代表陽離子部分的數目,並且正因如此,係1或更大的整數。在該等“m”與“a”之間,總體上滿足以下等式1:m=a (等式1)。 In the present invention, "m" represents the number of cationic moieties, and because of this, it is an integer of 1 or more. Between these "m" and "a", the following equation 1 is generally satisfied: m=a (Equation 1).

在本發明中,“An”表示任何相對陰離子。該相對陰離子的類型在本發明中不受特別限制,並且可以是有機陰離子、或無機陰離子。對於此類相對陰離子的實例,可以參考日本專利申請案公開號JP 2014-108975 A,其中揭露內容藉由引用以其全文結合在此。在本發明中,Ana-較佳的是選自由以下各項組成之群組:鹵離子、硼酸根陰離子、羧酸根陰離子、硫酸根陰離子、磺酸根陰離子、磺醯亞胺陰離子、磷酸根陰離子以及其任何組合。在本發明中特別較佳的是該等包含至少一個磺酸根基團的陰離子化合物,尤其包含兩個或更多個磺酸根基團的那些。特別地,磺醯亞胺陰離子如雙(三氟甲烷)磺醯胺陰離子可以用於本發明中。在本發明的具體實施方式,該相對陰離子(An)可以包含陰離子染料或顏料化合物,該等化合物包含至少一個陰離子官能團(如羧酸根基團、硫酸根基團、 磷酸根基團、以及磺酸根基團)。染料和顏料的實例可以在PCT國際專利申請公開號WO 2012/144521 A1和日本專利申請案公開號JP 2014-108975 A中找到。不希望受任何具體理論的束縛,藉由選擇陰離子染料或者顏料化合物作為該相對陰離子(An),本發明的化合物的熱穩定性被認為能夠進一步改進(至少部分地由於其分子量的增加)。 In the present invention, "An" represents any relative anion. The type of the relative anion is not particularly limited in the present invention, and may be an organic anion, or an inorganic anion. For examples of such relative anions, you can refer to Japanese Patent Application Publication No. JP 2014-108975 A, the disclosure of which is incorporated herein by reference in its entirety. In the present invention, An a- is preferably selected from the group consisting of halide ion, borate anion, carboxylate anion, sulfate anion, sulfonate anion, sulfonylimide anion, phosphate anion And any combination thereof. Particularly preferred in the present invention are the anionic compounds containing at least one sulfonate group, especially those containing two or more sulfonate groups. In particular, sulfoximine anions such as bis(trifluoromethane)sulfonamide anions can be used in the present invention. In a specific embodiment of the present invention, the relative anion (An) may comprise anionic dye or pigment compounds, and these compounds comprise at least one anionic functional group (such as carboxylate group, sulfate group, phosphate group, and sulfonate group) ). Examples of dyes and pigments can be found in PCT International Patent Application Publication No. WO 2012/144521 A1 and Japanese Patent Application Publication No. JP 2014-108975 A. Without wishing to be bound by any specific theory, by selecting an anionic dye or pigment compound as the relative anion (An), the thermal stability of the compound of the present invention is believed to be able to be further improved (at least partly due to an increase in its molecular weight).

本發明的另一個方面涉及製備本發明的化合物之方法。此類方法包括使具有式(III)之化合物與具有下式(IV)之化合物反應:

Figure 105143389-A0202-12-0011-5
Another aspect of the invention relates to methods of preparing the compounds of the invention. Such methods include reacting a compound of formula (III) with a compound of formula (IV):
Figure 105143389-A0202-12-0011-5

Figure 105143389-A0202-12-0011-6
Figure 105143389-A0202-12-0011-6

在該等式(III)和(IV)中,X、R11、R12、R21、R31至R38、以及R41至R44各自具有與以上定義的相同的含義。必要時可以引入所希望的相對陰離子。 In the formulas (III) and (IV), X, R11, R12, R21, R31 to R38, and R41 to R44 each have the same meaning as defined above. If necessary, a desired relative anion can be introduced.

對於製備該化合物的方法的另外細節,可以參考以下實例。 For additional details of the method of preparing the compound, the following examples can be referred to.

本發明的化合物被有利地用作藍色著色劑,其中可隨意地與至少一種另外的染料或顏料結合使用。因此,本發明的另一方面提供了著色劑材料,該著色劑材料 包含根據本發明的化合物,以及隨意之至少另一種染料或顏料。染料和顏料的實例可以分別在PCT國際專利申請公開案號WO 2012/144521 A1和日本專利申請公開案號JP 2014-108975 A中找到,這兩個專利藉由引用以其全文結合在此。特別地,本發明的化合物可用作著色劑材料與藍色顏料(如ε-型銅酞菁顆粒)或紫色顏料(如顏料紫(PV)-23)結合,該顏料可隨意地包含至少一個磺酸根基團。 The compounds of the present invention are advantageously used as blue colorants, where they can optionally be used in combination with at least one additional dye or pigment. Therefore, another aspect of the present invention provides a colorant material, the colorant material Contains a compound according to the invention, and optionally at least another dye or pigment. Examples of dyes and pigments can be found in PCT International Patent Application Publication No. WO 2012/144521 A1 and Japanese Patent Application Publication No. JP 2014-108975 A, respectively, which are incorporated herein by reference in their entireties. In particular, the compound of the present invention can be used as a colorant material in combination with blue pigments (such as ε-type copper phthalocyanine particles) or purple pigments (such as pigment violet (PV)-23), and the pigment may optionally contain at least one Sulfonate group.

本發明的化合物可以適當地用於濾光片的形成。因此,本發明的還另一個方面涉及用於形成濾光片的組成物,該組成物包含根據本發明的化合物或著色劑材料。該組成物可隨意地包含至少一種選自由以下各項組成之群組的組分:顏料、染料、黏合劑、分散助劑或分散劑、可聚合單體、溶劑、抑制劑、聚合引發劑、以及它們的任何組合。 The compound of the present invention can be suitably used for the formation of an optical filter. Therefore, still another aspect of the present invention relates to a composition for forming an optical filter, the composition comprising the compound or colorant material according to the present invention. The composition can optionally contain at least one component selected from the group consisting of: pigments, dyes, binders, dispersing aids or dispersants, polymerizable monomers, solvents, inhibitors, polymerization initiators, And any combination of them.

上述組分,包括顏料、染料、黏合劑、分散助劑/分散劑、可聚合單體、溶劑、抑制劑、以及引發劑,的進一步細節可以例如在WO 2012/144521、JP 2014-108975 A、以及PCT國際專利申請公開案號WO 2013/050431的揭露內容中找到,該等揭露內容藉由引用以其全文結合在此。 Further details of the above components, including pigments, dyes, binders, dispersing aids/dispersants, polymerizable monomers, solvents, inhibitors, and initiators, can be found, for example, in WO 2012/144521, JP 2014-108975 A, And found in the disclosure of PCT International Patent Application Publication No. WO 2013/050431, which disclosure is incorporated herein by reference in its entirety.

在本發明中,用於形成濾光片的組成物可以是用於濾光片的色漿組成物。該色漿組成物較佳的是包含:(A)著色劑材料;(B)溶劑;以及(C)黏合劑,其中該著色劑材料(A)包含本發明的化合物或本發明的著色劑材 料。 In the present invention, the composition for forming the filter may be a color paste composition for the filter. The colorant composition preferably includes: (A) a colorant material; (B) a solvent; and (C) a binder, wherein the colorant material (A) contains the compound of the present invention or the colorant material of the present invention material.

本發明還涉及包含本發明的化合物或著色劑材料的濾光片。此類濾光片可藉由光刻方法來製備,尤其是藉由以下步驟:將根據本發明的色漿組成物與其他附加組分(如光阻劑(PR)材料)組合以形成用於形成濾光片的組成物,將該用於形成濾光片的組成物施加在基板上、乾燥、光照射並且用顯影溶液顯影。在該光照射處理過程中,在本發明的化合物中的不飽和碳-碳雙鍵(C=C)可以聚合並且因此形成包含衍生自本發明的化合物的重複單元的聚合物材料。因此,本發明的還另一個方面涉及包含至少一種衍生自本發明的化合物的重複單元的聚合物材料。此類聚合物材料可以被更牢固地固定在基板上,並且因此在使用顯影溶液(例如基於KOH的溶液)之顯影處理過程中不容易被沖洗掉。該等濾光片可適用於製備顯示裝置,例如液晶顯示裝置、發光顯示裝置或固態圖像傳感裝置,如電荷耦合裝置(CCD)以及類似物。 The present invention also relates to a filter comprising the compound or colorant material of the present invention. Such filters can be prepared by photolithography, especially by the following steps: the colorant composition according to the present invention is combined with other additional components (such as photoresist (PR) materials) to form The composition for forming the filter is applied to the substrate, dried, irradiated with light, and developed with a developing solution. During this light irradiation treatment, the unsaturated carbon-carbon double bond (C=C) in the compound of the present invention may polymerize and thus form a polymer material containing repeating units derived from the compound of the present invention. Therefore, yet another aspect of the present invention relates to a polymer material comprising at least one repeating unit derived from the compound of the present invention. Such polymer materials can be more firmly fixed on the substrate, and therefore are not easily washed off during the development process using a developing solution (for example, a KOH-based solution). These filters can be suitable for preparing display devices, such as liquid crystal display devices, light-emitting display devices, or solid-state image sensing devices, such as charge coupled devices (CCD) and the like.

本發明因此還涉及本發明化合物作為著色劑(較佳的是作為藍色著色劑)之用途,並且涉及本發明化合物或著色劑材料用於製備濾光片(並且特別用於形成濾光片的藍色部分)之用途。 The present invention therefore also relates to the use of the compound of the present invention as a colorant (preferably as a blue colorant), and to the use of the compound or colorant material of the present invention for the preparation of filters (and in particular for forming filters) The purpose of the blue part).

本發明的還另一個方面涉及具有下式(III)之化合物:

Figure 105143389-A0202-12-0013-7
Yet another aspect of the present invention relates to compounds having the following formula (III):
Figure 105143389-A0202-12-0013-7

在式(III)中,X、R11、R12和R21各自具有以上定義的相同的含義,並且R11和R12中的至少一者選自該等包含至少一個不飽和碳-碳雙鍵(C=C)並且不包括酯基的基團。 In formula (III), X, R11, R12 and R21 each have the same meaning as defined above, and at least one of R11 and R12 is selected from those containing at least one unsaturated carbon-carbon double bond (C=C ) And does not include ester groups.

以下實例旨在更詳細地描述本發明而無意對其進行限制。 The following examples are intended to describe the invention in more detail without intending to limit it.

實例 Instance 實例1-1:化合物1之製備 Example 1-1: Preparation of Compound 1

Figure 105143389-A0202-12-0014-8
Figure 105143389-A0202-12-0014-8

將KSCN(20g,338.35mmol)溶解於250ml丙酮中,並且將溫度冷卻至0℃。逐滴添加苯甲醯氯(37.3ml,321.43mmol)。在室溫下將該混合物攪拌持續1.5小時,並且然後使它冷卻至0℃。逐滴添加異丙胺(20g,338.35mmol),並且然後,在室溫下攪拌它持續1.5小時。將該混合物緩慢添加至1500ml的H2O中。將所產生的固體過濾並用500ml的H2O洗滌以獲得化合物1。 KSCN (20 g, 338.35 mmol) was dissolved in 250 ml of acetone, and the temperature was cooled to 0°C. Benzyl chloride (37.3ml, 321.43mmol) was added dropwise. The mixture was stirred at room temperature for 1.5 hours, and then it was cooled to 0°C. Isopropylamine (20 g, 338.35 mmol) was added dropwise, and then, it was stirred at room temperature for 1.5 hours. The mixture was slowly added to the H 2 O in 1500ml. The produced solid was filtered and washed with 500 ml of H 2 O to obtain compound 1.

實例1-2:化合物2之製備 Example 1-2: Preparation of Compound 2

Figure 105143389-A0202-12-0015-10
Figure 105143389-A0202-12-0015-10

將化合物1(30g,134.94mmol)溶解於500ml的2N NaOH中,並且回流持續15小時。在該反應完成之後,將它過濾並用500ml的H2O洗滌以獲得化合物2。 Compound 1 (30 g, 134.94 mmol) was dissolved in 500 ml of 2N NaOH, and refluxing continued for 15 hours. After the reaction was completed, it was filtered and washed with 500 ml of H 2 O to obtain compound 2.

實例1-3:化合物3之製備 Example 1-3: Preparation of Compound 3

Figure 105143389-A0202-12-0015-9
Figure 105143389-A0202-12-0015-9

將化合物2(9g,76.14mmol)、2-氯苯乙酮(12.94g,83.75mmol)、以及NaHCO3(12.97g,152.28mmol)溶解於250ml的乙腈(ACN)中,並且在60℃下將該溶液攪拌持續2小時。在該反應完成之後,將溫度冷卻至室溫。添加200ml的DCM和200ml的H2O,並且進行萃取兩次。將有機層用MgSO4乾燥並且過濾。在減壓下的濃縮之後獲得化合物3。 Compound 2 (9g, 76.14mmol), 2-chloroacetophenone (12.94g, 83.75mmol), and NaHCO 3 (12.97g, 152.28mmol) were dissolved in 250ml of acetonitrile (ACN) and heated at 60°C The solution was stirred for 2 hours. After the reaction was completed, the temperature was cooled to room temperature. Add 200 ml of DCM and 200 ml of H 2 O, and perform extraction twice. The organic layer was dried with MgSO 4 and filtered. Compound 3 was obtained after concentration under reduced pressure.

實例1-4:化合物4之製備 Example 1-4: Preparation of Compound 4

Figure 105143389-A0202-12-0016-11
Figure 105143389-A0202-12-0016-11

將化合物3(10.3g,47.17mmol)溶解於100ml的DMF中,並且將溫度冷卻至0℃。緩慢添加分成若干部分的NaH(2.07g,52.89mmol)。在室溫下將該混合物攪拌持續30分鐘,並且再次將溫度冷卻至0℃。緩慢逐滴添加4-乙烯基苄基氯(6.65ml,47.17mmol)。在室溫下將該混合物攪拌持續2小時。在該反應完成之後,將該混合物冷卻至0℃,並且緩慢逐滴添加100ml的H2O以淬滅該反應。添加300ml的EA和300ml的H2O並且進行萃取兩次。用300ml的H2O洗滌該有機層持續三次。將有機層用MgSO4乾燥並且過濾。在減壓下濃縮之後,使該殘餘物經受SiO2柱處理(Hex:EA=20:1)以獲得化合物4。 Compound 3 (10.3 g, 47.17 mmol) was dissolved in 100 ml of DMF, and the temperature was cooled to 0°C. NaH (2.07 g, 52.89 mmol) in portions was added slowly. The mixture was stirred for 30 minutes at room temperature, and the temperature was again cooled to 0°C. Slowly add 4-vinylbenzyl chloride (6.65 ml, 47.17 mmol) dropwise. The mixture was stirred for 2 hours at room temperature. After the reaction was completed, the mixture was cooled to 0°C, and 100 ml of H 2 O was slowly added dropwise to quench the reaction. Add 300 ml of EA and 300 ml of H 2 O and perform extraction twice. The organic layer was washed three times with 300 ml of H 2 O. The organic layer was dried with MgSO 4 and filtered. After concentration under reduced pressure, the residue was subjected to SiO 2 column treatment (Hex:EA=20:1) to obtain compound 4.

實例1-5:化合物5之製備 Example 1-5: Preparation of Compound 5

Figure 105143389-A0202-12-0017-12
Figure 105143389-A0202-12-0017-12

將化合物4(10.7g,31.98mmol)和4,4’-雙(二乙胺基)苯甲酮(11.41g,35.18mmol)溶解於250ml甲苯(無水的)中,並且添加POCl3(9ml,95.94mmol)。在將溫度升高至100℃之後,攪拌它持續15小時。在該反應完成之後,將溫度冷卻至室溫。在冰浴中然後將溫度冷卻至4℃,並且緩慢逐滴添加100ml的IPA用於淬滅。將200ml的H2O添加至該混合物中,並且添加300ml的DCM以萃取三次。將有機層用MgSO4乾燥並且過濾。在減壓下濃縮之後,使該殘餘物經受SiO2柱處理(DCM:EA:MeOH=5:5:1)以獲得化合物5。 Compound 4 (10.7g, 31.98mmol) and 4,4'-bis(diethylamino)benzophenone (11.41g, 35.18mmol) were dissolved in 250ml of toluene (anhydrous), and POCl 3 (9ml, 95.94mmol). After raising the temperature to 100°C, it was stirred for 15 hours. After the reaction was completed, the temperature was cooled to room temperature. Then the temperature was cooled to 4°C in an ice bath, and 100 ml of IPA was slowly added dropwise for quenching. 200 ml of H 2 O was added to the mixture, and 300 ml of DCM was added to extract three times. The organic layer was dried with MgSO 4 and filtered. After concentration under reduced pressure, the residue was subjected to SiO 2 column treatment (DCM:EA:MeOH=5:5:1) to obtain compound 5.

實例1-6:化合物6之製備 Example 1-6: Preparation of Compound 6

Figure 105143389-A0202-12-0018-13
Figure 105143389-A0202-12-0018-13

將化合物5(17.4g,25.68mmol)和雙(三氟甲烷)磺醯胺鋰鹽(11.05g,38.52mmol)溶解於250ml的MeOH中,並且在室溫下攪拌持續2小時。在攪拌下將該混合物緩慢逐滴添加至500ml的H2O中。添加300ml的DCM並且進行萃取。將有機層用MgSO4乾燥並且過濾。在減壓下的濃縮之後獲得化合物6。 Compound 5 (17.4g, 25.68mmol) and bis(trifluoromethane)sulfonamide lithium salt (11.05g, 38.52mmol) were dissolved in 250ml of MeOH, and stirred at room temperature for 2 hours. The mixture was slowly added dropwise to 500 ml of H 2 O with stirring. Add 300 ml of DCM and perform extraction. The organic layer was dried with MgSO 4 and filtered. Compound 6 was obtained after concentration under reduced pressure.

實例2-1:化合物7之製備 Example 2-1: Preparation of Compound 7

Figure 105143389-A0202-12-0018-14
Figure 105143389-A0202-12-0018-14

將4,4’-二氯二苯甲酮(10g,39.82mmol)、N-乙基苯胺(12.52ml,99.55mmol)、雙(二苯亞甲基丙酮)鈀(0)(2.29g,3.98mmol)、4,5-雙(二苯基膦基)-9,9-二甲基

Figure 105143389-A0202-12-0018-53
(2.3g,3.98mmol)、以及三級丁醇鉀(13.28g,119.46mmol)溶解於150ml甲苯(無水的)中,並且在100℃下攪拌。在該反應完成之後,將溫度冷卻至室溫。用矽 藻土過濾器過濾該混合物。將過濾的有機物添加至200ml的DCM和200ml的H2O中以萃取該有機層。將有機層用MgSO4乾燥並且過濾。在減壓下濃縮之後,使該殘餘物經受SiO2柱處理(Hex:EA=9:1)以獲得化合物7。 The 4,4'-dichlorobenzophenone (10g, 39.82mmol), N-ethylaniline (12.52ml, 99.55mmol), bis(benzylideneacetone)palladium(0) (2.29g, 3.98) mmol), 4,5-bis(diphenylphosphino)-9,9-dimethyl
Figure 105143389-A0202-12-0018-53
(2.3g, 3.98mmol) and potassium tertiary butoxide (13.28g, 119.46mmol) were dissolved in 150ml of toluene (anhydrous) and stirred at 100°C. After the reaction was completed, the temperature was cooled to room temperature. The mixture was filtered through a Celite filter. The filtered organics were added to 200 ml of DCM and 200 ml of H 2 O to extract the organic layer. The organic layer was dried with MgSO 4 and filtered. After concentration under reduced pressure, the residue was subjected to SiO 2 column treatment (Hex:EA=9:1) to obtain compound 7.

實例2-2:化合物8之製備 Example 2-2: Preparation of Compound 8

Figure 105143389-A0202-12-0019-15
Figure 105143389-A0202-12-0019-15

將化合物4(3.29g,11.17mmol)和化合物7(4.7g,11.17mmol)溶解於250ml甲苯(無水的)中,並且添加POCl3(3.12ml,33.51mmol)。在將溫度升高至100℃之後,攪拌它持續15小時。在該反應完成之後,將溫度冷卻至室溫。在冰浴中然後將溫度冷卻至4℃,並且緩慢逐滴添加10ml的IPA用於淬滅。將50ml的H2O添加至該混合物中,並且添加50ml的DCM以萃取三次。 將有機層用MgSO4乾燥並且過濾。在減壓下濃縮之後,使該殘餘物經受SiO2柱處理(DCM:EA:MeOH=5:5:1)以獲得化合物8。 Compound 4 (3.29 g, 11.17 mmol) and compound 7 (4.7 g, 11.17 mmol) were dissolved in 250 ml of toluene (anhydrous), and POCl 3 (3.12 ml, 33.51 mmol) was added. After raising the temperature to 100°C, it was stirred for 15 hours. After the reaction was completed, the temperature was cooled to room temperature. The temperature was then cooled to 4°C in an ice bath, and 10 ml of IPA was slowly added dropwise for quenching. 50 ml of H 2 O was added to the mixture, and 50 ml of DCM was added to extract three times. The organic layer was dried with MgSO 4 and filtered. After concentration under reduced pressure, the residue was subjected to SiO 2 column treatment (DCM:EA:MeOH=5:5:1) to obtain compound 8.

實例2-3:化合物9之製備 Example 2-3: Preparation of Compound 9

Figure 105143389-A0202-12-0020-16
Figure 105143389-A0202-12-0020-16

將化合物8(2.3g,3.13mmol)和雙(三氟甲烷)磺醯胺鋰鹽(1.35g,4.7mmol)溶解於30ml的MeOH中,並且在室溫下攪拌持續2小時。在攪拌下將該混合物緩慢逐滴添加至200ml的H2O中。過濾所產生的固體。將過濾的固體溶解於50ml的DCM中,並且用50ml的H2O萃取。將有機層用MgSO4乾燥並且過濾。在減壓下的濃縮之後獲得化合物9。 Compound 8 (2.3 g, 3.13 mmol) and lithium bis(trifluoromethane)sulfonamide salt (1.35 g, 4.7 mmol) were dissolved in 30 ml of MeOH, and stirred at room temperature for 2 hours. The mixture was slowly added dropwise to 200 ml of H 2 O with stirring. Filter the resulting solids. The filtered solid was dissolved in 50ml of DCM, and extracted with 50ml of H 2 O. The organic layer was dried with MgSO 4 and filtered. Compound 9 was obtained after concentration under reduced pressure.

實例3-1:化合物10之製備 Example 3-1: Preparation of Compound 10

Figure 105143389-A0202-12-0021-18
Figure 105143389-A0202-12-0021-18

將二苯甲酮(15g,59.7mmol)、N-乙基苯胺(20.25ml,119.4mmol)、Pd(OAc)2(1mol%)、配位基(1mol%)、以及KOtBu(20g,179.1mmol)溶解於150ml甲苯(無水的)中,並且將該混合物在110℃下攪拌持續2小時。在該反應完成之後,將溫度冷卻至室溫。用50ml的H2O以及100ml的DCM進行萃取。將有機層用MgSO4乾燥並且過濾。在減壓下濃縮之後,使該殘餘物經受SiO2柱處理(Hex:EA=7:1至5:1)以獲得化合物10。 Benzophenone (15g, 59.7mmol), N-ethylaniline (20.25ml, 119.4mmol), Pd(OAc) 2 (1mol%), ligand (1mol%), and KOtBu (20g, 179.1mmol) ) Was dissolved in 150 ml of toluene (anhydrous), and the mixture was stirred at 110°C for 2 hours. After the reaction was completed, the temperature was cooled to room temperature. It was extracted with 50 ml of H 2 O and 100 ml of DCM. The organic layer was dried with MgSO 4 and filtered. After concentration under reduced pressure, the residue was subjected to SiO 2 column treatment (Hex: EA=7:1 to 5:1) to obtain compound 10.

實例3-2:化合物11之製備 Example 3-2: Preparation of Compound 11

Figure 105143389-A0202-12-0021-17
Figure 105143389-A0202-12-0021-17

將KSCN(60g,615.95mmol)溶解於1000ml丙酮中,並且將溫度冷卻至0℃。逐滴添加苯甲醯氯(65ml,559.96mmol)。在室溫下將該混合物攪拌持續1.5小時,並且再次將溫度冷卻至0℃。逐滴添加鄰甲苯胺 (69.52ml,559.96mmol),並且在室溫下將該混合物攪拌持續1.5小時。將該混合物緩慢添加至3000ml的H2O中。將所得固體過濾並用1000ml的H2O洗滌以獲得化合物11。 KSCN (60 g, 615.95 mmol) was dissolved in 1000 ml of acetone, and the temperature was cooled to 0°C. Benzyl chloride (65ml, 559.96mmol) was added dropwise. The mixture was stirred at room temperature for 1.5 hours, and the temperature was cooled to 0°C again. O-toluidine (69.52 ml, 559.96 mmol) was added dropwise, and the mixture was stirred at room temperature for 1.5 hours. The mixture was slowly added to the H 2 O in 3000ml. The obtained solid was filtered and washed with 1000 ml of H 2 O to obtain compound 11.

實例3-3:化合物12之製備 Example 3-3: Preparation of Compound 12

Figure 105143389-A0202-12-0022-19
Figure 105143389-A0202-12-0022-19

將化合物11(151.38g,559.96mmol)溶解於1000ml的NaOH(4N)中並且在90℃下攪拌持續2小時。在該反應完成之後,將溫度冷卻至室溫。藉由過濾並且用1000ml的H2O洗滌獲得化合物12。 Compound 11 (151.38 g, 559.96 mmol) was dissolved in 1000 ml of NaOH (4N) and stirred at 90°C for 2 hours. After the reaction was completed, the temperature was cooled to room temperature. Compound 12 was obtained by filtration and washing with 1000 ml of H 2 O.

實例3-4:化合物13之製備 Example 3-4: Preparation of Compound 13

Figure 105143389-A0202-12-0022-20
Figure 105143389-A0202-12-0022-20

將化合物12(63.3g,380.77mmol)、2-氯苯乙酮(58.86g,380.77mmol)以及NaHCO3(79.97g,951.92mmol)溶解於1000ml的ACN中,並且在60℃下將該混 合物攪拌持續2小時。在該反應完成之後,將溫度冷卻至室溫。用500ml的H2O以及500ml的DCM進行萃取兩次。將有機層用MgSO4乾燥並且過濾。在減壓下的濃縮之後獲得化合物13。 Compound 12 (63.3 g, 380.77 mmol), 2-chloroacetophenone (58.86 g, 380.77 mmol) and NaHCO 3 (79.97 g, 951.92 mmol) were dissolved in 1000 ml of ACN, and the mixture was stirred at 60°C Lasts 2 hours. After the reaction was completed, the temperature was cooled to room temperature. Extraction was performed twice with 500 ml of H 2 O and 500 ml of DCM. The organic layer was dried with MgSO 4 and filtered. Compound 13 was obtained after concentration under reduced pressure.

實例3-5:化合物14之製備 Example 3-5: Preparation of Compound 14

Figure 105143389-A0202-12-0023-21
Figure 105143389-A0202-12-0023-21

將化合物13(100g,375.43mmol)溶解於500ml的DMF中並且將溫度冷卻至0℃。緩慢添加分成若干部分的NaH(60%)(22.52g,563.14mmol)。在室溫下將該混合物攪拌持續1小時,並且將溫度冷卻至0℃。緩慢添加4-乙烯基苄基氯(52.9ml,375.43mmol)。在室溫下攪拌該混合物。在該反應完成之後,將300ml的H2O的溫度冷卻至0℃,並且將該混合物緩慢添加至300ml的H2O中以淬滅該反應。添加300ml的EA並且進行萃取三次。用100ml的H2O洗滌該有機層三次。將有機層用MgSO4乾燥並且過濾。在減壓下濃縮之後,使該殘餘物經受SiO2柱處理(Hex:EA=40:1)以獲得化合物14。 Compound 13 (100 g, 375.43 mmol) was dissolved in 500 ml of DMF and the temperature was cooled to 0°C. Slowly add portions of NaH (60%) (22.52 g, 563.14 mmol). The mixture was stirred at room temperature for 1 hour, and the temperature was cooled to 0°C. Slowly add 4-vinylbenzyl chloride (52.9 ml, 375.43 mmol). The mixture was stirred at room temperature. After the reaction was completed, the temperature of 300 ml of H 2 O was cooled to 0° C., and the mixture was slowly added to 300 ml of H 2 O to quench the reaction. Add 300 ml of EA and perform extraction three times. The organic layer was washed three times with 100 ml of H 2 O. The organic layer was dried with MgSO 4 and filtered. After concentration under reduced pressure, the residue was subjected to SiO 2 column treatment (Hex:EA=40:1) to obtain compound 14.

實例3-6:化合物15之製備 Example 3-6: Preparation of Compound 15

Figure 105143389-A0202-12-0024-22
Figure 105143389-A0202-12-0024-22

將化合物14(19.61g,51.27mmol)和化合物10(中間體)(20g,51.27mmol)溶解於500ml甲苯(無水的)中,並且添加POCl3(14.33ml,153.81mmol)。將溫度升高至100℃並且將該混合物攪拌持續15小時。在該反應完成之後,將溫度冷卻至室溫。在冰浴中將溫度進一步冷卻至4℃並且緩慢逐滴添加100ml的IPA用於淬滅。將200ml的H2O緩慢添加至該混合物中並且用300ml的DCM進行萃取三次。將有機層用MgSO4乾燥並且過濾。在減壓下濃縮之後,使該殘餘物經受三次SiO2柱處理(第一次處理:DCM:MeOH=10:1;第二次處理:DCM:EA:MeOH=5:5:1至3:3:1;第三次處理:DCM:MeOH=15:1至10:1至7:1)以獲得化合物15。 Compound 14 (19.61 g, 51.27 mmol) and compound 10 (intermediate) (20 g, 51.27 mmol) were dissolved in 500 ml of toluene (anhydrous), and POCl 3 (14.33 ml, 153.81 mmol) was added. The temperature was increased to 100°C and the mixture was stirred for 15 hours. After the reaction was completed, the temperature was cooled to room temperature. The temperature was further cooled to 4°C in an ice bath and 100 ml of IPA was slowly added dropwise for quenching. 200 ml of H 2 O was slowly added to the mixture and extraction was performed three times with 300 ml of DCM. The organic layer was dried with MgSO 4 and filtered. After concentration under reduced pressure, the residue was subjected to three SiO 2 column treatments (first treatment: DCM:MeOH=10:1; second treatment: DCM:EA:MeOH=5:5:1 to 3: 3:1; third treatment: DCM:MeOH=15:1 to 10:1 to 7:1) to obtain compound 15.

實例3-7:化合物16之製備 Example 3-7: Preparation of compound 16

Figure 105143389-A0202-12-0025-23
Figure 105143389-A0202-12-0025-23

Figure 105143389-A0202-12-0025-24
Figure 105143389-A0202-12-0025-24

將化合物15(17g,20.01mmol)和雙(三氟甲烷)磺醯胺鋰鹽(8.61g,30.01mmol)溶解於150ml的MeOH中,並且在室溫下將該混合物攪拌持續2小時。在攪拌下將1000ml的H2O緩慢逐滴添加至該混合物中。將所得固體過濾並且溶解於200ml的DCM中。用200ml的H2O進行萃取兩次。將200ml的H2O添加至該有機層中用於洗滌。將有機層用MgSO4乾燥並且過濾。在減壓下濃縮之後,獲得化合物16。 Compound 15 (17 g, 20.01 mmol) and lithium bis(trifluoromethane)sulfonamide salt (8.61 g, 30.01 mmol) were dissolved in 150 ml of MeOH, and the mixture was stirred at room temperature for 2 hours. 1000 ml of H 2 O was slowly added dropwise to the mixture under stirring. The resulting solid was filtered and dissolved in 200 ml of DCM. The extraction was carried out twice with 200 ml of H 2 O. 200 ml of H 2 O was added to the organic layer for washing. The organic layer was dried with MgSO 4 and filtered. After concentration under reduced pressure, compound 16 was obtained.

實例4-1:化合物17之製備 Example 4-1: Preparation of Compound 17

Figure 105143389-A0202-12-0026-25
Figure 105143389-A0202-12-0026-25

將二苯甲酮(100g,398.23mmol)、鄰甲苯胺(95.7ml,796.46mmol)、Pd(OAc)2(1mol%)、配位基(1mol%)、以及KOtBu(114.8g,1194.69mmol)溶解於1000ml甲苯(無水的)中,並且將該混合物在110℃下攪拌持續2小時。在該反應完成之後,將溫度冷卻至室溫。用500ml的H2O以及500ml的DCM進行萃取。將有機層用MgSO4乾燥並且過濾。在減壓下濃縮之後,使該殘餘物經受SiO2柱處理(Hex:EA=5:1至2:1)以獲得化合物17。 Combine benzophenone (100g, 398.23mmol), o-toluidine (95.7ml, 796.46mmol), Pd(OAc) 2 (1mol%), ligand (1mol%), and KOtBu (114.8g, 1194.69mmol) Dissolved in 1000 ml of toluene (anhydrous), and the mixture was stirred at 110°C for 2 hours. After the reaction was completed, the temperature was cooled to room temperature. It was extracted with 500 ml of H 2 O and 500 ml of DCM. The organic layer was dried with MgSO 4 and filtered. After concentration under reduced pressure, the residue was subjected to SiO 2 column treatment (Hex:EA=5:1 to 2:1) to obtain compound 17.

實例4-2:化合物18(中間體)之製備 Example 4-2: Preparation of Compound 18 (Intermediate)

Figure 105143389-A0202-12-0026-26
Figure 105143389-A0202-12-0026-26

將化合物17(80g,203.82mmol)溶解於500 ml的DMF中並且將溫度冷卻至0℃。緩慢添加分成若干部分的NaH(60%)(20.38g,509.56mmol)。在室溫下將該混合物攪拌持續1小時,並且再次將溫度冷卻至0℃。緩慢添加碘甲烷(31.72ml,509.56mmol)。在室溫下攪拌該混合物。在該反應完成之後,將300ml的H2O的溫度冷卻至0℃,並且將該混合物緩慢添加至300ml的H2O中以淬滅該反應。過濾所得固體以獲得化合物18(中間體)。 Compound 17 (80 g, 203.82 mmol) was dissolved in 500 ml of DMF and the temperature was cooled to 0°C. Slowly add portions of NaH (60%) (20.38 g, 509.56 mmol). The mixture was stirred at room temperature for 1 hour, and the temperature was cooled to 0°C again. Slowly add methyl iodide (31.72ml, 509.56mmol). The mixture was stirred at room temperature. After the reaction was completed, the temperature of 300 ml of H 2 O was cooled to 0° C., and the mixture was slowly added to 300 ml of H 2 O to quench the reaction. The resulting solid was filtered to obtain compound 18 (intermediate).

實例4-3:化合物19之製備 Example 4-3: Preparation of Compound 19

Figure 105143389-A0202-12-0027-27
Figure 105143389-A0202-12-0027-27

將KSCN(60g,615.95mmol)溶解於1000ml丙酮中,並且將溫度冷卻至0℃。逐滴添加苯甲醯氯(65ml,559.96mmol)。在室溫下將該混合物攪拌持續1.5小時,並且再次將溫度冷卻至0℃。逐滴添加鄰甲苯胺(69.52ml,559.96mmol),並且在室溫下將該混合物攪拌持續1.5小時。將該混合物緩慢添加至3000ml的H2O中。將所得固體過濾並用1000ml的H2O洗滌以獲得化合物19。 KSCN (60 g, 615.95 mmol) was dissolved in 1000 ml of acetone, and the temperature was cooled to 0°C. Benzyl chloride (65ml, 559.96mmol) was added dropwise. The mixture was stirred at room temperature for 1.5 hours, and the temperature was cooled to 0°C again. O-toluidine (69.52 ml, 559.96 mmol) was added dropwise, and the mixture was stirred at room temperature for 1.5 hours. The mixture was slowly added to the H 2 O in 3000ml. The obtained solid was filtered and washed with 1000 ml of H 2 O to obtain compound 19.

實例4-4:化合物20之製備 Example 4-4: Preparation of Compound 20

Figure 105143389-A0202-12-0028-28
Figure 105143389-A0202-12-0028-28

將化合物19(151.38g,559.96mmol)溶解於1000ml的NaOH(4N)中並且在90℃下攪拌持續2小時。在該反應完成之後,將溫度冷卻至室溫。藉由過濾並且用1000ml的H2O洗滌獲得化合物20。 Compound 19 (151.38 g, 559.96 mmol) was dissolved in 1000 ml of NaOH (4N) and stirred at 90°C for 2 hours. After the reaction was completed, the temperature was cooled to room temperature. Compound 20 was obtained by filtration and washing with 1000 ml of H 2 O.

實例4-5:化合物21之製備 Example 4-5: Preparation of Compound 21

Figure 105143389-A0202-12-0028-29
Figure 105143389-A0202-12-0028-29

將化合物20(63.3g,380.77mmol)、2-氯苯乙酮(58.86g,380.77mmol)以及NaHCO3(79.97g,951.92mmol)溶解於1000ml的ACN中,並且在60℃下攪拌持續2小時。在該反應完成之後,將溫度冷卻至室溫。添加500ml的DCM和500ml的H2O,並且進行萃取兩次。將有機層用MgSO4乾燥並且過濾。在減壓下濃縮之後,獲得化合物21。 Compound 20 (63.3g, 380.77mmol), 2-chloroacetophenone (58.86g, 380.77mmol) and NaHCO 3 (79.97g, 951.92mmol) were dissolved in 1000ml of ACN, and stirred at 60°C for 2 hours . After the reaction was completed, the temperature was cooled to room temperature. 500 ml of DCM and 500 ml of H 2 O were added, and extraction was performed twice. The organic layer was dried with MgSO 4 and filtered. After concentration under reduced pressure, compound 21 was obtained.

實例4-6:化合物22之製備 Example 4-6: Preparation of Compound 22

Figure 105143389-A0202-12-0029-30
Figure 105143389-A0202-12-0029-30

將化合物21(400g,375.43mmol)溶解於500ml的DMF中並且將溫度冷卻至0℃。緩慢添加分成若干部分的NaH(60%)(22.52g,563.14mmol)。在室溫下將該混合物攪拌持續1小時,並且再次將溫度冷卻至0℃。緩慢添加4-乙烯基苄基氯(52.9ml,375.43mmol)。在室溫下攪拌該混合物。在該反應完成之後,將300ml的H2O的溫度冷卻至0℃,並且將該混合物緩慢添加至300ml的H2O中以淬滅該反應。添加300ml的EA並且進行萃取三次。用100ml的H2O洗滌該有機層三次。將有機層用MgSO4乾燥並且過濾。在減壓下濃縮之後,使該殘餘物經受SiO2柱處理(Hex:EA=40:1)以獲得化合物22。 Compound 21 (400 g, 375.43 mmol) was dissolved in 500 ml of DMF and the temperature was cooled to 0°C. Slowly add portions of NaH (60%) (22.52 g, 563.14 mmol). The mixture was stirred at room temperature for 1 hour, and the temperature was cooled to 0°C again. Slowly add 4-vinylbenzyl chloride (52.9 ml, 375.43 mmol). The mixture was stirred at room temperature. After the reaction was completed, the temperature of 300 ml of H 2 O was cooled to 0° C., and the mixture was slowly added to 300 ml of H 2 O to quench the reaction. Add 300 ml of EA and perform extraction three times. The organic layer was washed three times with 100 ml of H 2 O. The organic layer was dried with MgSO 4 and filtered. After concentration under reduced pressure, the residue was subjected to SiO 2 column treatment (Hex:EA=40:1) to obtain compound 22.

實例4-7:化合物23之製備 Example 4-7: Preparation of Compound 23

Figure 105143389-A0202-12-0030-31
Figure 105143389-A0202-12-0030-31

將化合物22(19.61g,51.27mmol)和化合物18(中間體)(20g,51.27mmol)溶解於500ml甲苯(無水的)中,並且添加POCl3(14.33ml,153.81mmol)。將溫度升高至100℃並且將該混合物攪拌持續15小時。在該反應完成之後,將溫度冷卻至室溫。在冰浴中將溫度進一步冷卻至4℃並且緩慢逐滴添加100ml的IPA用於淬滅。緩慢添加200ml的H2O並且用300ml的DCM進行萃取三次。將有機層用MgSO4乾燥並且過濾。在減壓下濃縮之後,使該殘餘物經受三次SiO2柱處理(第一次處理:DCM:MeOH=10:1;第二次處理:DCM:EA:MeOH=5:5:1至3:3:1;第三次處理:DCM:MeOH=15:1至10:1至7:1)以獲得化合物23。 Compound 22 (19.61 g, 51.27 mmol) and compound 18 (intermediate) (20 g, 51.27 mmol) were dissolved in 500 ml of toluene (anhydrous), and POCl 3 (14.33 ml, 153.81 mmol) was added. The temperature was increased to 100°C and the mixture was stirred for 15 hours. After the reaction was completed, the temperature was cooled to room temperature. The temperature was further cooled to 4°C in an ice bath and 100 ml of IPA was slowly added dropwise for quenching. 200 ml of H 2 O was added slowly and extraction was performed three times with 300 ml of DCM. The organic layer was dried with MgSO 4 and filtered. After concentration under reduced pressure, the residue was subjected to three SiO 2 column treatments (first treatment: DCM:MeOH=10:1; second treatment: DCM:EA:MeOH=5:5:1 to 3: 3:1; third treatment: DCM:MeOH=15:1 to 10:1 to 7:1) to obtain compound 23.

實例4-8:化合物24之製備 Example 4-8: Preparation of compound 24

Figure 105143389-A0202-12-0031-33
Figure 105143389-A0202-12-0031-33

將化合物23(17g,20.01mmol)和雙(三氟甲烷)磺醯胺鋰鹽(8.61g,30.01mmol)溶解於150ml的MeOH中,並且在室溫下將該混合物攪拌持續2小時。在攪拌下將1000ml的H2O緩慢逐滴添加至該混合物中。將所得固體過濾並且溶解於200ml的DCM中。用200ml的H2O進行萃取兩次。用200ml的H2O洗滌該有機層。將有機層用MgSO4乾燥並且過濾。在減壓下濃縮之後,獲得化合物24。 Compound 23 (17 g, 20.01 mmol) and lithium bis(trifluoromethane)sulfonamide salt (8.61 g, 30.01 mmol) were dissolved in 150 ml of MeOH, and the mixture was stirred at room temperature for 2 hours. 1000 ml of H 2 O was slowly added dropwise to the mixture under stirring. The resulting solid was filtered and dissolved in 200 ml of DCM. The extraction was carried out twice with 200 ml of H 2 O. The organic layer was washed with 200 ml of H 2 O. The organic layer was dried with MgSO 4 and filtered. After concentration under reduced pressure, compound 24 was obtained.

實例5-1:化合物25之製備 Example 5-1: Preparation of Compound 25

Figure 105143389-A0202-12-0031-32
Figure 105143389-A0202-12-0031-32

將4,4’-二氯二苯甲酮(15g,59.23mmol)、2,6-二甲基苯胺(14.7ml,119.46mmol)、Pd(OAc)2(1mol%)、配位基(1mol%)、以及KOtBu(17.2g,179.19mmol)溶解於200ml甲苯(無水的)中並且在110℃下攪拌10小時。在該反應完成之後,將溫度冷卻至室溫。用500ml的H2O以及500ml的DCM進行萃取。將有機層用MgSO4乾燥並且過濾。在減壓下濃縮並且用DCM和Hex重結晶之後,獲得化合物25。 Combine 4,4'-dichlorobenzophenone (15g, 59.23mmol), 2,6-dimethylaniline (14.7ml, 119.46mmol), Pd(OAc) 2 (1mol%), ligand (1mol %), and KOtBu (17.2g, 179.19mmol) were dissolved in 200ml of toluene (anhydrous) and stirred at 110°C for 10 hours. After the reaction was completed, the temperature was cooled to room temperature. It was extracted with 500 ml of H 2 O and 500 ml of DCM. The organic layer was dried with MgSO 4 and filtered. After concentration under reduced pressure and recrystallization with DCM and Hex, compound 25 was obtained.

實例5-2:化合物26(中間體)之製備 Example 5-2: Preparation of Compound 26 (Intermediate)

Figure 105143389-A0202-12-0032-34
Figure 105143389-A0202-12-0032-34

將化合物25(25g,59.44mmol)溶解於200ml的DMF中並且將溫度冷卻至0℃。緩慢添加分成若干部分的NaH(60%)(5.94g,148.61mmol)。在室溫下將該混合物攪拌持續1小時,並且再次將溫度冷卻至0℃。緩慢添加溴乙烷(11.1ml,148.61mmol)。在室溫下攪拌該混合物。在該反應完成之後,將該混合物冷卻至0℃,並且將300ml的H2O緩慢添加至該混合物中以淬滅該反應。添加300ml的EA並且進行萃取三次。用300ml的H2O洗滌該有機層三次。將有機層用MgSO4乾燥並且過濾。在減壓下濃縮之後,使該殘餘物經受SiO2柱處理(Hex: EA=10:1)以獲得化合物26。 Compound 25 (25 g, 59.44 mmol) was dissolved in 200 ml of DMF and the temperature was cooled to 0°C. Slowly add portions of NaH (60%) (5.94 g, 148.61 mmol). The mixture was stirred at room temperature for 1 hour, and the temperature was cooled to 0°C again. Bromoethane (11.1 ml, 148.61 mmol) was added slowly. The mixture was stirred at room temperature. After the reaction was completed, the mixture was cooled to 0°C, and 300 ml of H 2 O was slowly added to the mixture to quench the reaction. Add 300 ml of EA and perform extraction three times. The organic layer was washed three times with 300 ml of H 2 O. The organic layer was dried with MgSO 4 and filtered. After concentration under reduced pressure, the residue was subjected to SiO 2 column treatment (Hex: EA=10:1) to obtain compound 26.

實例5-3:化合物27之製備 Example 5-3: Preparation of Compound 27

Figure 105143389-A0202-12-0033-36
Figure 105143389-A0202-12-0033-36

將KSCN(8.81g,90.77mmol)溶解於100ml丙酮中,並且將溫度冷卻至0℃。逐滴添加苯甲醯氯(9.57m1,82.52mmol)。在室溫下將該混合物攪拌持續1.5小時,並且再次將溫度冷卻至0℃。逐滴添加2,6-二甲基苯胺(10.16ml,82.52mmol),並且在室溫下將該混合物攪拌持續1.5小時。將500ml的H2O緩慢添加至該混合物中。將所得固體過濾並用1000ml的H2O洗滌以獲得化合物27。 KSCN (8.81 g, 90.77 mmol) was dissolved in 100 ml of acetone, and the temperature was cooled to 0°C. Benzyl chloride (9.57 ml, 82.52 mmol) was added dropwise. The mixture was stirred at room temperature for 1.5 hours, and the temperature was cooled to 0°C again. 2,6-Dimethylaniline (10.16 ml, 82.52 mmol) was added dropwise, and the mixture was stirred at room temperature for 1.5 hours. 500 ml of H 2 O was slowly added to the mixture. The obtained solid was filtered and washed with 1000 ml of H 2 O to obtain compound 27.

實例5-4:化合物28之製備 Example 5-4: Preparation of Compound 28

Figure 105143389-A0202-12-0033-35
Figure 105143389-A0202-12-0033-35

將化合物27(23.46g,82.49mmol)懸浮於200ml的NaOH(4N)中並且在80℃下攪拌該混合物。在該反應完成之後,將溫度冷卻至室溫。藉由過濾並且用500ml的H2O洗滌獲得化合物28。 Compound 27 (23.46 g, 82.49 mmol) was suspended in 200 ml of NaOH (4N) and the mixture was stirred at 80°C. After the reaction was completed, the temperature was cooled to room temperature. Compound 28 was obtained by filtration and washing with 500 ml of H 2 O.

實例5-5:化合物29之製備 Example 5-5: Preparation of Compound 29

Figure 105143389-A0202-12-0034-37
Figure 105143389-A0202-12-0034-37

將化合物28(10g,54.91mmol)、2-氯苯乙酮(8.48g,54.91mmol)以及NaHCO3(11.53g,137.27mmol)溶解於100ml的ACN中,並且在60℃下將該混合物攪拌持續2小時。在該反應完成之後,將溫度冷卻至室溫。添加200ml的DCM和200ml的H2O,並且進行萃取兩次。將有機層用MgSO4乾燥並且過濾。在減壓下濃縮之後,獲得化合物29。 Compound 28 (10g, 54.91mmol), 2-chloroacetophenone (8.48g, 54.91mmol) and NaHCO 3 (11.53g, 137.27mmol) were dissolved in 100ml of ACN, and the mixture was stirred at 60°C for continuous 2 hours. After the reaction was completed, the temperature was cooled to room temperature. Add 200 ml of DCM and 200 ml of H 2 O, and perform extraction twice. The organic layer was dried with MgSO 4 and filtered. After concentration under reduced pressure, compound 29 was obtained.

實例5-6:化合物30之製備 Example 5-6: Preparation of Compound 30

Figure 105143389-A0202-12-0034-38
Figure 105143389-A0202-12-0034-38

將化合物29(4.6g,16.4mmol)溶解於100ml的DMF中並且將溫度冷卻至0℃。緩慢添加分成若干部分的NaH(60%)(0.72g,18.04mmol)。在室溫下將該混合物攪拌持續1小時,並且再次將溫度冷卻至0℃。緩慢添加4-乙烯基苄基氯(2.31ml,16.4mmol)。在室溫下攪拌該混合物。在該反應完成之後,將100ml的H2O的溫度 冷卻至0℃,並且將該混合物緩慢添加至100ml的H2O中以淬滅該反應。添加200ml的EA並且進行萃取三次。用100ml的H2O洗滌該有機層三次。將有機層用MgSO4乾燥並且過濾。在減壓下濃縮之後,使該殘餘物經受SiO2柱處理(Hex:EA=40:1)以獲得化合物30。 Compound 29 (4.6 g, 16.4 mmol) was dissolved in 100 ml of DMF and the temperature was cooled to 0°C. Slowly add portions of NaH (60%) (0.72 g, 18.04 mmol). The mixture was stirred at room temperature for 1 hour, and the temperature was cooled to 0°C again. Slowly add 4-vinylbenzyl chloride (2.31 ml, 16.4 mmol). The mixture was stirred at room temperature. After the reaction was completed, the temperature of 100 ml of H 2 O was cooled to 0° C., and the mixture was slowly added to 100 ml of H 2 O to quench the reaction. Add 200 ml of EA and perform extraction three times. The organic layer was washed three times with 100 ml of H 2 O. The organic layer was dried with MgSO 4 and filtered. After concentration under reduced pressure, the residue was subjected to SiO 2 column treatment (Hex:EA=40:1) to obtain compound 30.

實例5-7:化合物31之製備 Example 5-7: Preparation of compound 31

Figure 105143389-A0202-12-0035-39
Figure 105143389-A0202-12-0035-39

將化合物30(6g,15.05mmol)和化合物26(中間體)(7.17g,15.05mmol)溶解於100ml甲苯(無水的)中,並且添加POCl3(4.2ml,45.15mmol)。將溫度升高至100℃並且將該混合物攪拌持續15小時。在該反應完成之後,將溫度冷卻至室溫。在冰浴中將溫度進一步冷卻至4 ℃並且緩慢逐滴添加10ml的IPA用於淬滅。將200ml的H2O緩慢添加至該混合物中並且用300ml的DCM進行萃取三次。將有機層用MgSO4乾燥並且過濾。在減壓下濃縮之後,使該殘餘物經受三次SiO2柱處理(第一次處理:DCM:MeOH=10:1;第二次處理:DCM:EA:MeOH=5:5:1至3:3:1;第三次處理:DCM:MeOH=15:1至10:1至7:1)以獲得化合物31。 Compound 30 (6 g, 15.05 mmol) and compound 26 (intermediate) (7.17 g, 15.05 mmol) were dissolved in 100 ml of toluene (anhydrous), and POCl 3 (4.2 ml, 45.15 mmol) was added. The temperature was increased to 100°C and the mixture was stirred for 15 hours. After the reaction was completed, the temperature was cooled to room temperature. The temperature was further cooled to 4°C in an ice bath and 10 ml of IPA was slowly added dropwise for quenching. 200 ml of H 2 O was slowly added to the mixture and extraction was performed three times with 300 ml of DCM. The organic layer was dried with MgSO 4 and filtered. After concentration under reduced pressure, the residue was subjected to three SiO 2 column treatments (first treatment: DCM:MeOH=10:1; second treatment: DCM:EA:MeOH=5:5:1 to 3: 3:1; third treatment: DCM:MeOH=15:1 to 10:1 to 7:1) to obtain compound 31.

實例5-8:化合物32之製備 Example 5-8: Preparation of Compound 32

Figure 105143389-A0202-12-0036-40
Figure 105143389-A0202-12-0036-40

將化合物31(11g,12.33mmol)和雙(三氟甲烷)磺醯胺鋰鹽(10.62g,37.01mmol)溶解於150ml的MeOH中,並且在室溫下將該混合物攪拌持續2小時。在攪拌下將1000ml的H2O緩慢逐滴添加至該混合物中。將所得固體過濾並且溶解於200ml的DCM中。用200ml的H2O進行萃取兩次。用200ml的H2O洗滌該有機層。將有機層用MgSO4乾燥並且過濾。在減壓下濃縮之後,獲得化合物32。 Compound 31 (11 g, 12.33 mmol) and bis(trifluoromethane)sulfonamide lithium salt (10.62 g, 37.01 mmol) were dissolved in 150 ml of MeOH, and the mixture was stirred at room temperature for 2 hours. 1000 ml of H 2 O was slowly added dropwise to the mixture under stirring. The resulting solid was filtered and dissolved in 200 ml of DCM. The extraction was carried out twice with 200 ml of H 2 O. The organic layer was washed with 200 ml of H 2 O. The organic layer was dried with MgSO 4 and filtered. After concentration under reduced pressure, compound 32 was obtained.

實例6(對比):化合物(A-I-1)之製備 Example 6 (comparison): Preparation of compound (A-I-1)

根據韓國專利申請公開案號10-2014-0026284的實例1製備以下化合物(A-I-1)。 The following compound (A-I-1) was prepared according to Example 1 of Korean Patent Application Publication No. 10-2014-0026284.

Figure 105143389-A0202-12-0037-42
Figure 105143389-A0202-12-0037-42

實例7(對比):包含甲基丙烯酸酯基團的化合物的製備實例7-1:化合物33之製備 Example 7 (comparative): Preparation of compound containing methacrylate group Example 7-1: Preparation of compound 33

Figure 105143389-A0202-12-0037-41
Figure 105143389-A0202-12-0037-41

將2-羥乙基甲基丙烯酸酯(9.32ml,76.84mmol)溶解於100ml的ACN中,並且添加TEA(32.13ml,230.52mmol)。將p-TsCl(21.98g,115.26mmol)添加至30ml的ACN中,並且添加至該溶液中。在室溫下將該混合物攪拌持續3小時。在該反應完成之後,添加200ml的H2O和200ml的DCM以萃取。用1N HCl洗滌該有機層。將有機層用MgSO4乾燥並且過濾。在減壓下濃縮之後,使該殘餘物經受SiO2柱處理(Hex:EA=5:1 至3:1)以獲得化合物33。 2-Hydroxyethyl methacrylate (9.32ml, 76.84mmol) was dissolved in 100ml of ACN, and TEA (32.13ml, 230.52mmol) was added. P-TsCl (21.98 g, 115.26 mmol) was added to 30 ml of ACN, and added to the solution. The mixture was stirred at room temperature for 3 hours. After the reaction was completed, 200 ml of H 2 O and 200 ml of DCM were added for extraction. The organic layer was washed with 1N HCl. The organic layer was dried with MgSO 4 and filtered. After concentration under reduced pressure, the residue was subjected to SiO 2 column treatment (Hex: EA=5:1 to 3:1) to obtain compound 33.

實例7-2:化合物34之製備 Example 7-2: Preparation of Compound 34

Figure 105143389-A0202-12-0038-43
Figure 105143389-A0202-12-0038-43

將NaH(60%)(1.37g,34.35mmol)溶解於50ml的DMF中,並且將溫度冷卻至0℃。緩慢添加化合物3(5g,22.90mmol),並且在室溫下攪拌持續30分鐘。將該混合物冷卻至0℃,並且緩慢添加混合物33(9.76g,34.35mmol)並且在室溫下攪拌。在該反應完成之後,將該混合物冷卻至0℃,並且緩慢逐滴添加100ml的H2O以淬滅該反應。添加100ml的E.A.並且進行萃取兩次。用100ml的H2O洗滌該有機層。將有機層用MgSO4乾燥並且過濾。在減壓下濃縮之後,使該殘餘物經受SiO2柱處理(Hex:EA=18:1)以獲得化合物34。 NaH (60%) (1.37 g, 34.35 mmol) was dissolved in 50 ml of DMF, and the temperature was cooled to 0°C. Compound 3 (5 g, 22.90 mmol) was added slowly, and stirring was continued for 30 minutes at room temperature. The mixture was cooled to 0°C, and mixture 33 (9.76 g, 34.35 mmol) was slowly added and stirred at room temperature. After the reaction was completed, the mixture was cooled to 0°C, and 100 ml of H 2 O was slowly added dropwise to quench the reaction. Add 100 ml of EA and perform extraction twice. The organic layer was washed with 100 ml of H 2 O. The organic layer was dried with MgSO 4 and filtered. After concentration under reduced pressure, the residue was subjected to SiO 2 column treatment (Hex:EA=18:1) to obtain compound 34.

實例7-3:化合物35之製備 Example 7-3: Preparation of Compound 35

Figure 105143389-A0202-12-0039-44
Figure 105143389-A0202-12-0039-44

將化合物34(1.2g,3.63mmol)和4,4’-雙(二乙胺基)苯甲酮(1.76g,5.44mmol)溶解於30ml甲苯(無水的)中,並且添加POCl3(1.7ml,18.15mmol)和2.5-二-三級丁基氫醌(DTBHQ)(80mg,0.363mmol)。在將溫度升高至100℃之後,攪拌它持續15小時。在該反應完成之後,將溫度冷卻至室溫。在冰浴中然後將溫度冷卻至4℃,並且緩慢逐滴添加10ml的IPA用於淬滅。將100ml的H2O緩慢添加至該混合物中,並且添加100ml的DCM以萃取三次。將有機層用MgSO4乾燥並且過濾。在減壓下濃縮之後,使該殘餘物經受第一次SiO2柱處理(DCM:MeOH=10:1)和第二次SiO2柱處理(DCM:EA:MeOH=5:5:1至3:3:1)以獲得化合物35。 Compound 34 (1.2g, 3.63mmol) and 4,4'-bis(diethylamino)benzophenone (1.76g, 5.44mmol) were dissolved in 30ml of toluene (anhydrous), and POCl 3 (1.7ml , 18.15 mmol) and 2.5-di-tertiary butyl hydroquinone (DTBHQ) (80 mg, 0.363 mmol). After raising the temperature to 100°C, it was stirred for 15 hours. After the reaction was completed, the temperature was cooled to room temperature. The temperature was then cooled to 4°C in an ice bath, and 10 ml of IPA was slowly added dropwise for quenching. 100 ml of H 2 O was slowly added to the mixture, and 100 ml of DCM was added to extract three times. The organic layer was dried with MgSO 4 and filtered. After concentration under reduced pressure, the residue was subjected to the first SiO 2 column treatment (DCM:MeOH=10:1) and the second SiO 2 column treatment (DCM:EA:MeOH=5:5:1 to 3 : 3: 1) to obtain compound 35.

實例7-4:化合物36之製備 Example 7-4: Preparation of Compound 36

Figure 105143389-A0202-12-0040-45
Figure 105143389-A0202-12-0040-45

將化合物35(3.16g,4.69mmol)和雙(三氟甲烷)磺醯胺鋰鹽(2.02g,7.03mmol)溶解於50ml的MeOH中,並且在室溫下攪拌持續2小時。在攪拌下將該混合物緩慢逐滴添加至100ml的H2O中。將所產生的固體過濾並且溶解於50ml的DCM中,並且添加50ml的H2O以萃取兩次。將該有機層添加至50ml的H2O中並且洗滌。將有機層用MgSO4乾燥並且過濾。在減壓下的濃縮之後獲得化合物36。 Compound 35 (3.16 g, 4.69 mmol) and bis(trifluoromethane) sulfonamide lithium salt (2.02 g, 7.03 mmol) were dissolved in 50 ml of MeOH and stirred at room temperature for 2 hours. The mixture was slowly added dropwise to 100 ml of H 2 O with stirring. The produced solid was filtered and dissolved in 50 ml of DCM, and 50 ml of H 2 O was added to extract twice. The organic layer was added to 50 ml of H 2 O and washed. The organic layer was dried with MgSO 4 and filtered. Compound 36 was obtained after concentration under reduced pressure.

實例8:藍色著色劑組成物1之製備 Example 8: Preparation of blue colorant composition 1

將由實例1獲得的1.5g的化合物6、和13.5g在混合器中捏合的ε-型銅酞菁顆粒與6.75g DISPERBYK-2000(得自畢克化學公司(BYK CHEMIE))、7.5g二季戊四醇六丙烯酸酯、和120.75g的丙二醇一甲醚乙酸酯(PGMEA)一起引入到珠磨機中,並且用氧化鋯珠粒(尺寸:0.05-2mm)在40℃下研磨6至8小時,以得到該藍色著色劑色漿。使該藍色著色劑色漿與光阻劑(PR)材料(色漿: PR=30wt%:70wt%)混合以製備該藍色著色劑組成物1。 1.5 g of compound 6 obtained in Example 1, and 13.5 g of ε-type copper phthalocyanine particles kneaded in a mixer, 6.75 g of DISPERBYK-2000 (obtained from BYK CHEMIE), 7.5 g of dipentaerythritol The hexaacrylate and 120.75 g of propylene glycol monomethyl ether acetate (PGMEA) were introduced into a bead mill, and were ground with zirconia beads (size: 0.05-2mm) at 40°C for 6 to 8 hours to The blue colorant paste is obtained. Make the blue colorant paste and photoresist (PR) material (color paste: PR=30wt%: 70wt%) was mixed to prepare the blue colorant composition 1.

實例9:藍色著色劑組成物2之製備 Example 9: Preparation of blue colorant composition 2

藉由重複實例8獲得該藍色著色劑組成物2,除了使用在實例2中獲得的化合物9代替化合物6。 The blue colorant composition 2 was obtained by repeating Example 8, except that Compound 9 obtained in Example 2 was used instead of Compound 6.

實例10:藍色著色劑組成物3之製備 Example 10: Preparation of blue colorant composition 3

藉由重複實例8獲得該藍色著色劑組成物3,除了使用在實例3中獲得的化合物16代替化合物6。 The blue colorant composition 3 was obtained by repeating Example 8, except that Compound 16 obtained in Example 3 was used instead of Compound 6.

實例11:藍色著色劑組成物4之製備 Example 11: Preparation of blue colorant composition 4

藉由重複實例8獲得該藍色著色劑組成物4,除了使用在實例4中獲得的化合物24代替化合物6。 The blue colorant composition 4 was obtained by repeating Example 8, except that Compound 24 obtained in Example 4 was used instead of Compound 6.

實例12:藍色著色劑組成物5之製備 Example 12: Preparation of blue colorant composition 5

藉由重複實例8獲得該藍色著色劑組成物5,除了使用在實例5中獲得的化合物32代替化合物6。 The blue colorant composition 5 was obtained by repeating Example 8, except that Compound 32 obtained in Example 5 was used instead of Compound 6.

實例13(對比):藍色著色劑組成物6之製備 Example 13 (comparative): Preparation of blue colorant composition 6

藉由重複實例5獲得該藍色著色劑組成物6,除了使用在實例6中獲得的化合物(A-I-1)代替化合物6。 The blue colorant composition 6 was obtained by repeating Example 5, except that Compound (A-I-1) obtained in Example 6 was used instead of Compound 6.

實例14(對比):藍色著色劑組成物7之製備 Example 14 (comparative): Preparation of blue colorant composition 7

藉由重複實例5獲得該藍色著色劑組成物7, 除了使用在實例7中獲得的包含甲基丙烯酸酯基團的化合物(化合物36)代替化合物6。 The blue colorant composition 7 was obtained by repeating Example 5. Except that the compound containing a methacrylate group (Compound 36) obtained in Example 7 was used instead of Compound 6.

性能測試 Performance Testing

(1)膜的製備:將藍色著色劑組成物藉由旋塗(200-300rpm,持續15秒)塗布在玻璃基板(EAGLE-XG融合玻璃,自科寧公司(Corning)可得)上,以形成厚度大約2微米的膜並且將其在90℃下預烘烤90秒。然後,使該薄膜暴露於具有40mJ/cm2強度的光照射(UV照射)持續2秒,並且然後用KOH溶液顯影。此後,使該薄膜在230℃下經受後烘烤持續20分鐘。 (1) Preparation of film: The blue colorant composition was coated on a glass substrate (EAGLE-XG fused glass, available from Corning) by spin coating (200-300 rpm, 15 seconds), To form a film with a thickness of approximately 2 microns and pre-baked at 90°C for 90 seconds. Then, the film was exposed to light irradiation (UV irradiation) having an intensity of 40 mJ/cm 2 for 2 seconds, and then developed with a KOH solution. Thereafter, the film was subjected to post-baking at 230°C for 20 minutes.

(2)耐光性評價:使根據以上(1)製備的薄膜進一步經受400W/m2強度的光照射(UV照射)持續20小時。然後藉由使用Otsuka Photal MCPD 3000比色計在該薄膜上進行光譜法以獲得x和y顏色座標(x,y)和亮度(Y)。藉由比較光照射持續20小時之前和之後的對應值測量△Y、△x、△y、以及△E*ab。結果提供在表1中。 (2) Light resistance evaluation: The film prepared according to the above (1) was further subjected to light irradiation (UV irradiation) with an intensity of 400 W/m 2 for 20 hours. Then, spectrometry was performed on the film by using an Otsuka Photal MCPD 3000 colorimeter to obtain the x and y color coordinates (x, y) and brightness (Y). ΔY, Δx, Δy, and ΔE*ab were measured by comparing the corresponding values before and after 20 hours of light irradiation. The results are provided in Table 1.

Figure 105143389-A0202-12-0042-46
Figure 105143389-A0202-12-0042-46

(3)耐化學性評價:關於針對有機溶劑的穩定 性藉由使用N-甲基-2-吡咯啶酮(NMP)評價實例8-12和對比實例13。進一步將根據以上(1)製備的薄膜浸泡在NMP中持續15分鐘。藉由△E*ab評價針對NMP的耐化學性。結果提供在表2中。 (3) Chemical resistance evaluation: Regarding stability against organic solvents The properties were evaluated in Examples 8-12 and Comparative Example 13 by using N-methyl-2-pyrrolidone (NMP). The film prepared according to (1) above was further immersed in NMP for 15 minutes. The chemical resistance to NMP was evaluated by △E*ab. The results are provided in Table 2.

Figure 105143389-A0202-12-0043-47
Figure 105143389-A0202-12-0043-47

(4)洗脫測試:觀察在用KOH溶液顯影之前和之後的薄膜顏色。在用KOH溶液顯影(沖洗掉)之後,從藍色著色劑組成物3和4製備的薄膜顏色從深藍色變化至淺藍色,而從藍色著色劑組成物1和2製備的薄膜的深藍色顏色沒有顯著地變化或者僅僅輕微地變化。 (4) Elution test: Observe the color of the film before and after development with KOH solution. After development (rinsing off) with KOH solution, the color of the film prepared from blue colorant compositions 3 and 4 changed from dark blue to light blue, while the color of the film prepared from blue colorant compositions 1 and 2 was dark blue The color does not change significantly or only slightly.

如以上中示出的,根據本發明的化合物6、9、16、24、和32(對應於實例8-12)分別展示了超過化合物(A-I-1)之大大改進的光穩定性(△E*ab)和優異的耐化學性。此外,與顯著量的化合物(A-I-1)和化合物36被沖洗掉的事實相反,根據本發明的化合物6、9、16、24、和32在該顯影處理過程中沒有顯著地被沖洗掉。 As shown above, the compounds 6, 9, 16, 24, and 32 (corresponding to Examples 8-12) according to the present invention respectively exhibit greatly improved photostability (△E) over the compound (AI-1) *ab) and excellent chemical resistance. In addition, contrary to the fact that significant amounts of compound (A-I-1) and compound 36 were washed away, the compounds 6, 9, 16, 24, and 32 according to the present invention were not significantly washed away during the development process.

Figure 105143389-A0202-11-0002-1
Figure 105143389-A0202-11-0002-1

Claims (15)

一種具有下式(I)之化合物:
Figure 105143389-A0305-02-0046-1
其中X獨立地是氧原子、-NH-、或硫原子;R11和R12各自獨立地選自由以下各項組成之群組:氫原子、可以被一個或多個鹵素原子取代的烷基、可以被一個或多個鹵素原子取代的芳基、以及包含至少一個不飽和碳-碳雙鍵(C=C)並且不包括酯基的基團;R21獨立地選自由氫原子、可以被一個或多個鹵素原子或胺基取代的烷基、以及可以被一個或多個鹵素原子或羥基取代的芳基組成之群組;R31、R32、R33、R34、R35、R36、R37、和R38各自獨立地選自由以下各項組成之群組:氫原子、鹵素原子、可以被取代的烷基、可以被取代的烷氧基、氰基、硝基、磺醯基、以及羥基,其中該烷基及該烷氧基可以被氰基、硝基、磺醯基或羥基取代;R41、R42、R43、和R44各自獨立地選自由以下各項 組成之群組:氫原子、可以被至少一個氟原子取代的烷基、可以被至少一個氟原子取代的芳基、以及包含至少一個不飽和碳-碳雙鍵(C=C)並且不包括酯基的基團,其中R41和R42、或者R43和R44各自可以結合在一起形成環結構;其條件係R41、R42、R43、R44、R11和R12中的至少一者選自該等包含至少一個不飽和碳-碳雙鍵(C=C)並且不包括酯基的基團;An係相對陰離子;並且m係1或更大的整數;並且a係1或更大的整數;其條件係滿足以下等式:m=a (等式1)。
A compound having the following formula (I):
Figure 105143389-A0305-02-0046-1
Wherein X is independently an oxygen atom, -NH-, or a sulfur atom; R11 and R12 are each independently selected from the group consisting of: a hydrogen atom, an alkyl group which may be substituted by one or more halogen atoms, An aryl group substituted with one or more halogen atoms, and a group containing at least one unsaturated carbon-carbon double bond (C=C) and excluding an ester group; R21 is independently selected from hydrogen atoms, and may be one or more A group consisting of an alkyl group substituted with a halogen atom or an amino group, and an aryl group substituted with one or more halogen atoms or a hydroxyl group; R31, R32, R33, R34, R35, R36, R37, and R38 are each independently selected Free from the group consisting of: hydrogen atom, halogen atom, alkyl which may be substituted, alkoxy which may be substituted, cyano, nitro, sulfonyl, and hydroxyl, wherein the alkyl and the alkane The oxy group may be substituted with a cyano group, a nitro group, a sulfonyl group or a hydroxyl group; R41, R42, R43, and R44 are each independently selected from the group consisting of: a hydrogen atom, an alkane which may be substituted by at least one fluorine atom Groups, aryl groups that may be substituted by at least one fluorine atom, and groups containing at least one unsaturated carbon-carbon double bond (C=C) and excluding ester groups, wherein R41 and R42, or R43 and R44 may each be combined Together to form a ring structure; the conditions are that at least one of R41, R42, R43, R44, R11, and R12 is selected from those containing at least one unsaturated carbon-carbon double bond (C=C) and not including an ester group Group; An is a relative anion; and m is an integer of 1 or more; and a is an integer of 1 or more; its condition is to satisfy the following equation: m=a (Equation 1).
如申請專利範圍第1項之化合物,其中R11和R12中的至少一者包含該等包含至少一個不飽和碳-碳雙鍵(C=C)並且不包括酯基的基團。 Such as the compound of item 1 in the scope of the patent application, wherein at least one of R11 and R12 contains the groups containing at least one unsaturated carbon-carbon double bond (C=C) and excluding ester groups. 如申請專利範圍第1或2項之化合物,其中該等包含至少一個不飽和碳-碳雙鍵(C=C)並且不包括酯基的基團符合以下結構中的至少一者:
Figure 105143389-A0305-02-0048-2
其中n係1或更大的整數。
For example, the compound of item 1 or 2 of the scope of patent application, wherein the groups containing at least one unsaturated carbon-carbon double bond (C=C) and excluding ester groups meet at least one of the following structures:
Figure 105143389-A0305-02-0048-2
Where n is an integer of 1 or greater.
如申請專利範圍第1或2項之化合物,其中R41和R42中的至少一者以及R43和R44中的至少一者分別選自可以被至少一個氟原子取代的芳基。 Such as the compound of item 1 or 2 in the scope of patent application, wherein at least one of R41 and R42 and at least one of R43 and R44 are respectively selected from aryl groups which may be substituted by at least one fluorine atom. 如申請專利範圍第1或2項之化合物,其中X係硫原子。 For example, the compound of item 1 or 2 in the scope of patent application, wherein X is a sulfur atom. 如申請專利範圍第1或2項之化合物,其中R21係可以被一個或多個鹵素原子或羥基取代的芳基。 For example, the compound of item 1 or 2 in the scope of patent application, wherein R21 is an aryl group substituted by one or more halogen atoms or hydroxyl groups. 如申請專利範圍第1或2項之化合物,其中Ana-選自由以下各項組成之群組:鹵離子、硼酸根陰離子、羧酸根陰離子、硫酸根陰離子、磺酸根陰離子、磺醯亞胺陰離子、磷酸根陰離子以及其任何組合。 For example, the compound of item 1 or 2 in the scope of patent application, where An a- is selected from the group consisting of halide ion, borate anion, carboxylate anion, sulfate anion, sulfonate anion, sulfoximine anion , Phosphate anion and any combination thereof. 如申請專利範圍第1或2項之化合物,其中Ana-係包含至少一個磺酸根基團的陰離子化合物。 Such as the compound of item 1 or 2 in the scope of patent application, wherein An a- is an anionic compound containing at least one sulfonate group. 一種用於製備如申請專利範圍第1至8項中任一項 之化合物之方法,該方法包括使具有式(III)之化合物與具有下式(IV)之化合物反應:
Figure 105143389-A0305-02-0049-3
Figure 105143389-A0305-02-0049-4
其中X、R11、R12、R21、R31至R38、以及R41至R44各自具有與申請專利範圍第1項中所述相同的含義。
A method for preparing a compound according to any one of items 1 to 8 in the scope of the patent application, the method comprising reacting a compound of formula (III) with a compound of formula (IV):
Figure 105143389-A0305-02-0049-3
Figure 105143389-A0305-02-0049-4
Wherein X, R11, R12, R21, R31 to R38, and R41 to R44 each have the same meaning as described in item 1 of the scope of the patent application.
一種聚合物材料,該聚合物材料包含至少一種衍生自如申請專利範圍第1至8項中任一項之化合物之重複單元。 A polymer material comprising at least one repeating unit derived from any one of the compounds in the scope of the patent application from 1 to 8. 一種著色劑材料,該著色劑材料包含如申請專利範圍第1至8項中任一項之化合物或如申請專利範圍第10項之聚合物材料,以及隨意之至少另一種染料或顏料。 A coloring agent material, the coloring agent material contains the compound of any one of the scope of patent application 1 to 8 or the polymer material of the scope of patent application 10, and optionally at least another dye or pigment. 一種用於形成濾光片之組成物,該組成物包含如申請專利範圍第1至8項中任一項之化合物或如申請專利範圍第11項之著色劑材料,以及隨意之至少一種選自由以下各項組成之群組的組分:顏料、染料、黏合劑、分散助劑或分散劑、可聚合單體、溶劑、抑制劑、聚合引發劑、以及它們的任何組合。 A composition for forming a filter, the composition comprising the compound of any one of the scope of the patent application from 1 to 8 or the coloring agent material of the scope of the application 11, and at least one optional Components of the group consisting of: pigments, dyes, binders, dispersing aids or dispersants, polymerizable monomers, solvents, inhibitors, polymerization initiators, and any combination thereof. 一種用於濾光片之色漿組成物,該色漿組成物包含:(A)著色劑材料;(B)溶劑;以及(C)黏合劑,其中該著色劑材料(A)包含如申請專利範圍第1至8項中任一項之化合物或如申請專利範圍第11項之著色劑材料。 A color paste composition for an optical filter, the color paste composition comprising: (A) a colorant material; (B) a solvent; and (C) a binder, wherein the colorant material (A) contains as patented The compound of any one of items 1 to 8 or the coloring agent material of item 11 of the scope of patent application. 一種如申請專利範圍第1至8項中任一項之化合物或如申請專利範圍第11項之著色劑材料之用途,係用於製備顯示裝置的濾光片。 A use of the compound of any one of items 1 to 8 of the scope of patent application or the use of the coloring agent material of item 11 of the scope of patent application is used to prepare a filter of a display device. 一種具有下式(III)之化合物:
Figure 105143389-A0305-02-0050-5
其中X、R11、R12和R21各自具有申請專利範圍第1項中所述相同的含義,並且R11和R12中的至少一者選自該等包含至少一個不飽和碳-碳雙鍵(C=C)並且不包括酯基的基團。
A compound having the following formula (III):
Figure 105143389-A0305-02-0050-5
Wherein X, R11, R12 and R21 each have the same meaning as described in item 1 of the scope of patent application, and at least one of R11 and R12 is selected from those containing at least one unsaturated carbon-carbon double bond (C=C ) And does not include ester groups.
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