TWI709810B - Projection device - Google Patents
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- TWI709810B TWI709810B TW108138559A TW108138559A TWI709810B TW I709810 B TWI709810 B TW I709810B TW 108138559 A TW108138559 A TW 108138559A TW 108138559 A TW108138559 A TW 108138559A TW I709810 B TWI709810 B TW I709810B
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本案係關於一種投影裝置,尤指一種可於暗狀態光條件下提供散熱模組之投影裝置。This case relates to a projection device, especially a projection device that can provide a heat dissipation module under dark conditions.
為因應市場需求,現行投影裝置持續追求亮度的提昇,意謂著功率的提供,亦伴隨著熱量的產生。然而,在投影裝置實際使用時,並不會持續的提供亮狀態光(on-state light)而產生投影亮畫面。當投影裝置操控提供暗狀態光(off-state light)時,投影亮畫面消失而呈現暗畫面,而投影裝置大部分的光能量將會留在光機內部。由於,傳統投影裝置的光機係採用密閉的殼體設計,故內部散熱不易,持續累積的熱量會造成內部關鍵光學元件溫度過高,進而損害或故障。In response to market demand, current projection devices continue to pursue brightness enhancement, which means the provision of power and the generation of heat. However, when the projection device is actually used, it does not continuously provide on-state light to produce a projected bright image. When the projection device is manipulated to provide off-state light, the projected bright picture disappears and presents a dark picture, and most of the light energy of the projection device will remain inside the light engine. Since the optical machine of the traditional projection device adopts a closed housing design, it is not easy to dissipate the heat inside, and the continuous accumulation of heat will cause the temperature of the key internal optical components to become too high, which will damage or malfunction.
以傳統單晶片雷射投影機(one-chip laser projector)的光機為例。當光機受操控提供暗狀態光時,光機利用一阻隔片阻隔在鏡頭(lens)與稜鏡(prism)之間,防止投影光源直接照射在鏡頭邊緣,而造成鏡頭昇溫而損壞。但受限於相對空間的限制,阻隔片的厚度微薄,擴散熱阻大,熱傳導效果不佳。再者,鏡頭與稜鏡之間因焦距等因素,不易設置散熱模組以連接至阻隔片進行熱量的逸散。因此,傳統光機處於暗狀態光操作時,無法提供有效的散熱模組,致使熱量聚積於阻隔片而無法逸散。隨著阻隔片溫度的提高,光機內部的光學元件或鄰設於阻隔片的鏡頭與稜鏡均易受影響而提高,增加故障及損壞的風險。Take the optical machine of a traditional one-chip laser projector as an example. When the optical machine is manipulated to provide dark state light, the optical machine uses a barrier to block between the lens and the prism to prevent the projection light source from directly irradiating the edge of the lens, which may cause the lens to heat up and be damaged. However, due to the limitation of relative space, the thickness of the barrier sheet is small, the heat diffusion resistance is large, and the heat conduction effect is not good. Furthermore, due to factors such as focal length between the lens and the lens, it is not easy to install a heat dissipation module to connect to the blocking plate for heat dissipation. Therefore, when the traditional optical machine is in a dark state, it cannot provide an effective heat dissipation module, so that the heat is accumulated on the barrier and cannot be dissipated. As the temperature of the barrier sheet increases, the optical components inside the optical engine or the lens and the lens adjacent to the barrier sheet are easily affected and increased, increasing the risk of failure and damage.
有鑑於此,實有必要提供一種可於暗狀態光條件下提供散熱模組之投影裝置,達到密閉光機內的散熱效果,改善關鍵光學元件的溫度,使投影裝置具有更高的發光效率與信賴性,以解決習知技術之缺失。In view of this, it is really necessary to provide a projection device that can provide a heat dissipation module under dark conditions, to achieve the heat dissipation effect in a closed optical machine, improve the temperature of key optical components, and make the projection device have higher luminous efficiency and Reliability to solve the lack of conventional technology.
本案之目的在於提供一種可於暗狀態光條件下提供散熱模組之投影裝置。藉由將至少一反射元件與散熱模組分別相對於稜鏡組的第一出光面與第二出光面而設置,可解決因空間限制而難以直接逸散暗狀態光之能量的問題,並達到密閉光機內的散熱效果,改善關鍵光學元件的溫度,使投影裝置具有更高的發光效率與信賴性。The purpose of this case is to provide a projection device that can provide a heat dissipation module under dark conditions. By arranging the at least one reflective element and the heat dissipation module respectively opposite to the first light-emitting surface and the second light-emitting surface of the set, the problem that it is difficult to directly dissipate the energy of the dark state light due to space constraints can be solved, and The heat dissipation effect in the airtight machine improves the temperature of key optical components, so that the projection device has higher luminous efficiency and reliability.
本案之另一目的在於提供一種可於暗狀態光條件下提供散熱模組之投影裝置。藉由至少一反射元件之設置,將暗狀態光導向至利於散熱的空間,再以散熱模組進行散熱。於暗狀態光行經的第二出光面上更具有一抗反射膜,以提高暗狀態光於第二出光面的穿透率,降低滯留於稜鏡中。另一方面,利用散熱模組之接收部鄰設於稜鏡的第二出光面而容置於密閉光機內,再以傳導部將熱量傳導至外部的散熱部進行散熱。由於接收部位於光機內部,具有利於暗狀態光滯留的幾何表面,幾何表面更經黑化及粗糙化處理,可提高暗狀態光之吸收率。藉由接收部吸收暗狀態光之光能並將其轉變為熱能,經傳導部傳遞至位於光機外部的散熱部進行散熱,可解決散熱模組的設置問題,同時達到逸散光機內部暗狀態光能量的散熱效果,改善關鍵光學元件的溫度,使投影裝置具有更高的發光效率與信賴性。Another objective of this case is to provide a projection device that can provide a heat dissipation module under dark conditions. Through the arrangement of at least one reflective element, the dark state light is guided to a space that is conducive to heat dissipation, and then the heat dissipation module is used for heat dissipation. There is an anti-reflection film on the second light-emitting surface of the dark state light passing through, so as to increase the penetration rate of the dark-state light on the second light-emitting surface and reduce the retention of the light in the shadow. On the other hand, the receiving part of the heat-dissipating module is arranged adjacent to the second light-emitting surface of the faucet and is accommodated in the airtight machine, and the conduction part conducts heat to the external heat-dissipating part for heat dissipation. Since the receiving part is located inside the optical engine, it has a geometric surface that is conducive to the retention of light in the dark state. The geometric surface is more blackened and roughened to increase the absorption rate of light in the dark state. The receiving part absorbs the light energy of the dark state light and converts it into heat energy, which is transferred to the heat dissipation part located outside the optical machine through the conduction part for heat dissipation, which can solve the problem of dissipating the heat dissipation module and achieve the internal dark state of the escaped optical machine The heat dissipation effect of light energy improves the temperature of key optical components, so that the projection device has higher luminous efficiency and reliability.
為達前述目的,本案提供一種投影裝置,包括稜鏡組、數位微型反射鏡元件、鏡頭、反射元件以及散熱模組。稜鏡組具有入光面、微鏡對應面、第一出光面以及第二出光面。其中微鏡對應面與第一出光面彼此相對,第一出光面與第二出光面相鄰設置,第二出光面上設置有一抗反射膜。數位微型反射鏡元件於空間上相對稜鏡組之微鏡對應面。於一光源通過稜鏡組之入光面,且導入數位微型反射鏡元件時,數位微型反射鏡元件組配提供一亮狀態光以及一暗狀態光中之一者。鏡頭於空間上相對稜鏡組之第一出光面。於數位微型反射鏡元件提供亮狀態光時,亮狀態光通過第一出光面導向鏡頭。反射元件設置於稜鏡組與鏡頭之間,且在稜鏡組面向鏡頭的方向看反射元件至少部份重疊第一出光面,其中於數位微型反射鏡元件提供暗狀態光時,暗狀態光導向反射元件,反射元件反射暗狀態光,使暗狀態光穿過第二出光面上之抗反射膜。散熱模組於空間上相對於稜鏡組之第二出光面,接收穿射出第二出光面上之抗反射膜之暗狀態光,並將暗狀態光轉換為一熱能而逸散。In order to achieve the foregoing objective, this project provides a projection device, which includes a lens set, a digital micro-mirror element, a lens, a reflective element, and a heat dissipation module. The ridge group has a light-incident surface, a micro-mirror corresponding surface, a first light-emitting surface, and a second light-emitting surface. The corresponding surface of the micromirror and the first light-emitting surface are opposite to each other, the first light-emitting surface is arranged adjacent to the second light-emitting surface, and an anti-reflection film is provided on the second light-emitting surface. The digital micro-mirror element is spatially opposed to the corresponding surface of the micro-mirror of the group. When a light source passes through the light-incident surface of the light beam assembly and the digital micro-mirror element is introduced, the digital micro-mirror element assembly provides one of a bright state light and a dark state light. The lens is spatially opposite to the first light-emitting surface of the lens group. When the digital micro-mirror element provides bright state light, the bright state light is guided to the lens through the first light-emitting surface. The reflecting element is arranged between the lens set and the lens, and the reflecting element at least partially overlaps the first light-emitting surface when viewed from the direction of the lens set facing the lens, wherein the dark state light guides when the digital micro-mirror element provides dark state light The reflective element reflects the dark state light so that the dark state light passes through the anti-reflection film on the second light-emitting surface. The heat dissipation module is spatially opposed to the second light-emitting surface of the sill group, receives and emits the dark-state light passing through the anti-reflection film on the second light-emitting surface, and converts the dark-state light into a heat energy for dissipation.
於一實施例中,散熱模組包括一接收部,其中接收部鄰設於稜鏡組之第二出光面,組配接收穿射出第二出光面上之抗反射膜之暗狀態光。In one embodiment, the heat dissipation module includes a receiving part, wherein the receiving part is adjacent to the second light-emitting surface of the stalk group, and is configured to receive the dark state light that penetrates and emits the anti-reflection film on the second light-emitting surface.
於一實施例中,接收部具有一幾何表面,幾何表面經黑化及粗糙化處理,俾利於暗狀態光滯留,提高暗狀態光之吸收率。In one embodiment, the receiving part has a geometric surface, and the geometric surface is blackened and roughened to facilitate the retention of light in the dark state and increase the absorption rate of light in the dark state.
於一實施例中,投影裝置包括一殼體,具有一容置空間,其中稜鏡組以及散熱模組之接收部容置於容置空間,光源面向入光面,微型反射鏡元件面向微鏡對應面,且鏡頭面向第一出光面。In one embodiment, the projection device includes a housing with an accommodating space, wherein the radiator assembly and the receiving part of the heat dissipation module are accommodated in the accommodating space, the light source faces the light incident surface, and the micro mirror element faces the micro mirror The corresponding surface, and the lens faces the first light-emitting surface.
於一實施例中,散熱模組更包括一傳導部以及一散熱部,傳導部連接於接收部與散熱部之間,且散熱部設置於殼體外。In one embodiment, the heat dissipation module further includes a conduction part and a heat dissipation part, the conduction part is connected between the receiving part and the heat dissipation part, and the heat dissipation part is disposed outside the casing.
於一實施例中,傳導部係選自熱導管以及銅管中之一者,散熱部係選自散熱鰭片以及半導體制冷器中之一者。In one embodiment, the conductive portion is selected from one of a heat pipe and a copper tube, and the heat dissipation portion is selected from one of a heat dissipation fin and a semiconductor refrigerator.
於一實施例中,第一出光面與第二出光面形成一夾角,夾角小於90度。In one embodiment, the first light-emitting surface and the second light-emitting surface form an included angle, and the included angle is less than 90 degrees.
於一實施例中,稜鏡組更具有一輔助反射面,其中第一出光面與輔助反射面彼此面向,且第二出光面連接於第一出光面與輔助反射面之間。In one embodiment, the set of light beams further has an auxiliary reflecting surface, wherein the first light emitting surface and the auxiliary reflecting surface face each other, and the second light emitting surface is connected between the first light emitting surface and the auxiliary reflecting surface.
於一實施例中,輔助反射面與第二出光面形成一夾角,夾角小於90度。In one embodiment, the auxiliary reflecting surface and the second light emitting surface form an included angle, and the included angle is less than 90 degrees.
於一實施例中,稜鏡組包括至少一第一稜鏡以及至少一第二稜鏡,至少一第一稜鏡以及至少一第二稜鏡之間具有一交界面,組配反射光源至數位微型反射鏡元件,並使亮狀態光與暗狀態光可穿射交界面,其中入光面與微鏡對應面位於至少一第一稜鏡,第一出光面以及第二出光面位於至少一第二稜鏡。In one embodiment, the set of ridges includes at least one first ridge and at least one second ridge, at least one first ridge and at least one second ridge has an interface between them, and the reflective light source is assembled to a digital position. Micro-mirror element, and make the light in the bright state and the light in the dark state pass through the interface, wherein the light-incident surface and the micro-mirror corresponding surface are located at at least one first beam, and the first light-emitting surface and the second light-emitting surface are located at the at least one Two 稜鏡.
於一實施例中,反射元件鄰設於第一出光面與第二出光面之相交處。In one embodiment, the reflective element is adjacent to the intersection of the first light-emitting surface and the second light-emitting surface.
於一實施例中,反射元件為一反射鍍膜,形成於第一出光面上,反射鍍膜至少部份覆蓋第一出光面。In one embodiment, the reflective element is a reflective coating formed on the first light-emitting surface, and the reflective coating at least partially covers the first light-emitting surface.
於一實施例中,反射元件為一金屬片,具有一反射面,且在稜鏡組面向鏡頭的方向上看反射面至少部份覆蓋第一出光面。In one embodiment, the reflective element is a metal sheet with a reflective surface, and the reflective surface at least partially covers the first light-emitting surface when viewed from the direction of the lens assembly facing the lens.
於一實施例中,投影裝置為一單晶片雷射投影機。In one embodiment, the projection device is a single-chip laser projector.
為達前述目的,本案另提供一種投影裝置,包括稜鏡組、數位微型反射鏡元件、反射元件以及散熱模組。稜鏡組具有入光面、微鏡對應面、第一出光面以及第二出光面,其中微鏡對應面與第一出光面彼此相對,第一出光面與第二出光面相鄰設置。數位微型反射鏡元件於空間上相對稜鏡組之微鏡對應面。於一光源通過稜鏡組之入光面,且導入數位微型反射鏡元件時,數位微型反射鏡元件組配提供一亮狀態光以及一暗狀態光中之一者,其中於數位微型反射鏡元件提供亮狀態光時,亮狀態光通過第一出光面。反射元件於空間上相對於稜鏡組之第一出光面,且在稜鏡組面向鏡頭的方向看反射元件至少部份覆蓋第一出光面,其中於數位微型反射鏡元件提供暗狀態光時,暗狀態光導向反射元件,反射元件反射暗狀態光,使暗狀態光穿過第二出光面。散熱模組於空間上相對於稜鏡組之第二出光面,接收穿射出第二出光面上之暗狀態光,並將暗狀態光轉換為一熱能而逸散。In order to achieve the foregoing objective, this project also provides a projection device, which includes a mirror group, a digital micro-mirror element, a reflective element, and a heat dissipation module. The ridge group has a light-incident surface, a micro-mirror corresponding surface, a first light-emitting surface, and a second light-emitting surface. The micro-mirror corresponding surface and the first light-emitting surface are opposite to each other, and the first light-emitting surface and the second light-emitting surface are arranged adjacent to each other. The digital micro-mirror element is spatially opposed to the corresponding surface of the micro-mirror of the group. When a light source passes through the light-incident surface of the mirror assembly and the digital micro-mirror element is introduced, the digital micro-mirror element assembly provides one of a bright state light and a dark state light, among which the digital micro-mirror element When the bright state light is provided, the bright state light passes through the first light-emitting surface. The reflective element is spatially opposed to the first light-emitting surface of the mirror group, and the reflective element at least partially covers the first light-emitting surface when viewed from the direction of the mirror group facing the lens. When the digital micro-mirror device provides dark state light, The dark state light is guided to the reflective element, and the reflective element reflects the dark state light so that the dark state light passes through the second light-emitting surface. The heat dissipation module is spatially opposed to the second light-emitting surface of the group, receives and emits the dark state light on the second light-emitting surface, and converts the dark state light into a heat energy for dissipation.
於一實施例中,投影裝置更包括一鏡頭,於空間上相對稜鏡組之第一出光面,其中於數位微型反射鏡元件提供亮狀態光時,亮狀態光通過第一出光面導向鏡頭。In one embodiment, the projection device further includes a lens, which is spatially opposed to the first light-emitting surface of the group, wherein when the digital micro-mirror element provides bright state light, the bright state light is guided to the lens through the first light-emitting surface.
於一實施例中,第二出光面上設置有一抗反射膜。In one embodiment, an anti-reflection film is provided on the second light-emitting surface.
於一實施例中,散熱模組包括一接收部、一傳導部以及一散熱部,其中接收部鄰設於稜鏡組之第二出光面,組配接收穿射出第二出光面上之抗反射膜之暗狀態光,傳導部連接於接收部與散熱部之間,且散熱部設置於殼體外。In one embodiment, the heat dissipation module includes a receiving part, a conducting part and a heat dissipating part, wherein the receiving part is adjacent to the second light-emitting surface of the group, and is configured to receive and emit the anti-reflection on the second light-emitting surface. In the dark state of the film, the conductive part is connected between the receiving part and the heat dissipation part, and the heat dissipation part is arranged outside the casing.
於一實施例中,接收部具有一幾何表面,幾何表面經黑化及粗糙化處理,俾利於暗狀態光滯留,提高暗狀態光之吸收率。In one embodiment, the receiving part has a geometric surface, and the geometric surface is blackened and roughened to facilitate the retention of light in the dark state and increase the absorption rate of light in the dark state.
於一實施例中,投影裝置包括一殼體,具有一容置空間,其中稜鏡組以及散熱模組之接收部容置於容置空間,光源面向入光面,微型反射鏡元件面向微鏡對應面,且鏡頭面向第一出光面。In one embodiment, the projection device includes a housing with an accommodating space, wherein the radiator assembly and the receiving part of the heat dissipation module are accommodated in the accommodating space, the light source faces the light incident surface, and the micro mirror element faces the micro mirror The corresponding surface, and the lens faces the first light-emitting surface.
於一實施例中,第一出光面與第二出光面形成一夾角,夾角小於90度。In one embodiment, the first light-emitting surface and the second light-emitting surface form an included angle, and the included angle is less than 90 degrees.
於一實施例中,稜鏡組更具有一輔助反射面,其中第一出光面與輔助反射面彼此面向,且第二出光面連接於第一出光面與輔助反射面之間。In one embodiment, the set of light beams further has an auxiliary reflecting surface, wherein the first light emitting surface and the auxiliary reflecting surface face each other, and the second light emitting surface is connected between the first light emitting surface and the auxiliary reflecting surface.
於一實施例中,輔助反射面與第二出光面形成一夾角,夾角小於90度。In one embodiment, the auxiliary reflecting surface and the second light emitting surface form an included angle, and the included angle is less than 90 degrees.
於一實施例中,稜鏡組包括至少一第一稜鏡以及至少一第二稜鏡,至少一第一稜鏡以及至少一第二稜鏡之間具有一交界面,組配反射光源至數位微型反射鏡元件,並使亮狀態光與暗狀態光可穿射交界面,其中入光面與微鏡對應面位於至少一第一稜鏡,第一出光面以及第二出光面位於至少一第二稜鏡。In one embodiment, the set of ridges includes at least one first ridge and at least one second ridge, at least one first ridge and at least one second ridge has an interface between them, and the reflective light source is assembled to a digital position. Micro-mirror element, and make the light in the bright state and the light in the dark state pass through the interface, wherein the light-incident surface and the micro-mirror corresponding surface are located at at least one first beam, and the first light-emitting surface and the second light-emitting surface are located at the at least one Two 稜鏡.
於一實施例中,反射元件為一反射鍍膜,形成於第一出光面上,反射鍍膜至少部份覆蓋第一出光面。In one embodiment, the reflective element is a reflective coating formed on the first light-emitting surface, and the reflective coating at least partially covers the first light-emitting surface.
於一實施例中,反射元件為一金屬片,具有一反射面,且在稜鏡組面向鏡頭的方向上看反射面至少部份覆蓋第一出光面。In one embodiment, the reflective element is a metal sheet with a reflective surface, and the reflective surface at least partially covers the first light-emitting surface when viewed from the direction of the lens assembly facing the lens.
於一實施例中,投影裝置為一單晶片雷射投影機。In one embodiment, the projection device is a single-chip laser projector.
體現本案特徵與優點的一些典型實施例將在後段的說明中詳細敘述。應理解的是本案能夠在不同的態樣上具有各種的變化,其皆不脫離本案的範圍,且其中的說明及圖式在本質上係當作說明之用,而非用於限制本案。Some typical embodiments embodying the features and advantages of this case will be described in detail in the following description. It should be understood that this case can have various changes in different aspects, all of which do not depart from the scope of the case, and the descriptions and drawings therein are essentially for illustrative purposes, not for limiting the case.
第1圖係揭示本案第一較佳實施例之投影裝置之結構示意圖。第2圖係揭示本案第一較佳實施例之投影裝置之部份結構分解圖。第3圖係揭示本案第一較佳實施例之投影裝置之入射光源的光徑示意圖。第4圖係揭示本案第一較佳實施例之投影裝置之亮狀態光的光徑示意圖。第5圖係揭示本案第一較佳實施例之投影裝置之暗狀態光的光徑示意圖。於本實施例中,投影裝置1例如是應用於一單晶片雷射投影機。投影裝置1包括稜鏡組10、數位微型反射鏡元件(Digital Micro-mirror Device,DMD) 20、鏡頭30、反射元件40、散熱模組50以及殼體60。殼體60,例如但不限於由一前蓋60a與一後蓋60b相組接而形成,具有一容置空間61。稜鏡組10容置於殼體60的容置空間61內,且稜鏡組10具有一入光面11、一微鏡對應面12、一第一出光面13以及一第二出光面14。其中微鏡對應面12與第一出光面13彼此相對,第一出光面13與第二出光面14相鄰設置,第二出光面14上例如設置有一抗反射膜16。此外,稜鏡組10容置於殼體60的容置空間61時,一光源λ0面向入光面11,微型反射鏡元件20面向微鏡對應面12,且鏡頭30面向第一出光面13。於本實施例中,數位微型反射鏡元件20於空間上相對稜鏡組10之微鏡對應面12。於光源λ0通過稜鏡組10之入光面11,且導入數位微型反射鏡元件20時(如第3圖所示),數位微型反射鏡元件20組配提供一亮狀態光(on-state light)λ1(如第4圖所示)以及一暗狀態光(off-state light)λ2(如第5圖所示)中之一者。需說明的是,於本實施例中,數位微型反射鏡元件20是在半導體晶片上布置一個由微鏡片(未圖式)所組成的矩陣,每一個微鏡片控制投影畫面中的一個像素,這些微鏡片在數位驅動訊號的控制下能夠迅速改變角度,一旦接收到相應訊號,微鏡片就會改變傾斜角度,從而使入射的光源λ0的反射方向改變。處於投影狀態的微鏡片被示為「開」(on-state),並提供亮狀態光λ1,如第4圖所示。於本實施例中,鏡頭30於空間上相對稜鏡組10之第一出光面13。於數位微型反射鏡元件20提供亮狀態光λ1時,亮狀態光λ1通過第一出光面13導向鏡頭30。另一方面,若微鏡片處於非投影狀態,則被示為「關」(off-state),轉而提供暗狀態光λ2,如第5圖所示。於本實施例中,反射元件40例如是一金屬片,設置於稜鏡組10與鏡頭30之間,且鄰設於第一出光面13與第二出光面14之相交處。反射元件40更具有一反射面41,且在稜鏡組10面向鏡頭30的方向看反射元件40,反射面41至少部份重疊稜鏡組10的第一出光面13。於數位微型反射鏡元件20提供暗狀態光λ2時,暗狀態光λ2導向反射元件40,反射元件40反射暗狀態光λ2,使暗狀態光λ2穿過第二出光面14上之抗反射膜16。於本實施例中,散熱模組50連接至殼體60,於空間上相對於稜鏡組10之第二出光面14,接收穿射出第二出光面14上之抗反射膜16之暗狀態光λ2,並將暗狀態光λ2轉換為一熱能而逸散。FIG. 1 is a schematic diagram showing the structure of the projection device of the first preferred embodiment of the present invention. Fig. 2 is an exploded view showing the partial structure of the projection device of the first preferred embodiment of the present invention. FIG. 3 is a schematic diagram showing the light path of the incident light source of the projection device according to the first preferred embodiment of the present invention. FIG. 4 is a schematic diagram showing the light path of the bright state light of the projection device of the first preferred embodiment of the present invention. FIG. 5 is a schematic diagram showing the light path of the dark state light of the projection device of the first preferred embodiment of the present invention. In this embodiment, the
於本實施例中,稜鏡組10包括至少一第一稜鏡10a以及至少一第二稜鏡10b,至少一第一稜鏡10a以及至少一第二稜鏡10b之間具有一交界面15,組配反射光源λ0至數位微型反射鏡元件20。並使數位微型反射鏡元件20受控制所反射的亮狀態光λ1可穿射交界面15而由第一出光面13導向鏡頭30,抑或使數位微型反射鏡元件20受控制所反射的暗狀態光λ2可穿射交界面15而導向反射元件40,並經第二出光面14導向散熱模組50。於本實施例中,入光面11與微鏡對應面12位於至少一第一稜鏡10a,第一出光面13以及第二出光面14位於至少一第二稜鏡10b。當然,本案並不以受限於此。值得注意的是,於暗狀態光λ2行經的第二出光面14上更具有一抗反射膜16,可進一步提高暗狀態光λ2於第二出光面14的穿透率,降低滯留於稜鏡組10中,使暗狀態光λ2可完全被散熱模組50所吸收,並轉換為一熱能而逸散。當然,本案並不以此為限,於其他實施例中,抗反射膜16亦可省略,暗狀態光λ2通過第二出光面14後,由散熱模組50所吸收。此外,第一稜鏡10a以及第二稜鏡10b之數量、尺寸以及架構稜鏡組10之方式可視實際應用需求而調變。本案並不受限於此,且不再贅述。In the present embodiment, the set of
另一方面,於本實施例中,散熱模組50包括一接收部51、一傳導部52以及一散熱部53,其中接收部51容置於殼體60的容置空間61內,且鄰設於稜鏡組10之第二出光面14及抗反射膜16,組配接收穿射出第二出光面14上之抗反射膜16之暗狀態光λ2,並將暗狀態光λ2轉換為一熱能。於本實施例中,接收部51更具有一幾何表面51a,幾何表面51a可例如經黑化及粗糙化處理,俾利於暗狀態光λ2滯留,提高暗狀態光λ2之吸收率。又於本實施例中,傳導部52可例如但不限於熱導管或銅管,穿設於殼體60且連接於接收部51與散熱部53之間。散熱部53則可例如但不限於散熱鰭片或半導體制冷器,設置於殼體60外。於本實施例中,殼體60的容置空間61容置有稜鏡組10以及散熱模組50之接收部51,光源λ0面向入光面11、數位微型反射鏡元件20面向微鏡對應面12,且鏡頭30面向第一出光面13。值得注意的是,於殼體60有限的容置空間61中,除了稜鏡組10外更容置有散熱模組50之接收部51。於本實施例中,稜鏡組10的第一出光面13與第二出光面14之間形成一夾角θ,夾角θ小於90度,故稜鏡組10容置於殼體60的容置空間61時,殼體60與稜鏡組10的第二出光面14之間仍具有足夠的容置空間61可容置散熱模組50之接收部51。換言之,本案投影裝置1藉由將散熱模組50之接收部51鄰設於稜鏡組10的第二出光面14,除了使散熱模組50之接收部51可有效吸收暗狀態光λ2之光能並將其轉變為熱能,並經傳導部52傳遞至位於殼體60外的散熱部53進行散熱外,亦可解決散熱模組50的設置問題,同時達到逸散殼體60內暗狀態光λ2能量的散熱效果,改善關鍵光學元件的溫度,使投影裝置1具有更高的發光效率與信賴性。On the other hand, in this embodiment, the
第6圖係揭示本案第二較佳實施例之投影裝置之結構示意圖。第7圖係揭示本案第二較佳實施例之投影裝置之暗狀態光的光徑示意圖。於本實施例中,投影裝置1a與第1圖至第5圖所示之投影裝置1相似,且相同的元件標號代表相同之元件、結構與功能,於此不再贅述。於本實施例中,反射元件40a為一反射鍍膜,形成於第一出光面13上,反射鍍膜至少部份覆蓋第一出光面13,則在稜鏡組10面向鏡頭30的方向上看反射元件40a,反射元件40a的反射面41a至少部份重疊第一出光面13。換言之,第一出光面13被覆蓋的部份可架構為一反射面41a。於數位微型反射鏡元件20提供暗狀態光λ2時,暗狀態光λ2導向反射元件40a,反射元件40a的反射面41a反射暗狀態光λ2,使暗狀態光λ2穿過第二出光面14上之抗反射膜16而射出,並由殼體60內之散熱模組50之接收部51吸收暗狀態光λ2,以將暗狀態光λ2轉換為熱能。暗狀態光λ2轉換為熱能後,經傳導部52傳遞至殼體60外之散熱部53而逸散。藉由將反射元件40a與散熱模組50之接收部51分別相對於稜鏡組10的第一出光面13與第二出光面14而設置,可解決因空間限制而難以直接逸散暗狀態光λ2之能量的問題,並達到例如殼體60內密閉光機內的散熱效果,改善關鍵光學元件的溫度,使投影裝置1a具有更高的發光效率與信賴性。需進一步說明的是,透過反射膜與抗反射膜之塗佈,反射面41a與第一出光面13可同時架構於稜鏡組10的同一側面,而反射面41a與第一出光面13之比例則可視實際應用需求調變。然而,本案不受限於此。FIG. 6 is a schematic diagram showing the structure of the projection device of the second preferred embodiment of the present invention. FIG. 7 is a schematic diagram showing the light path of the dark state light of the projection device of the second preferred embodiment of the present invention. In this embodiment, the
第8圖係揭示本案第三較佳實施例之投影裝置之結構示意圖。第9圖係揭示本案第三較佳實施例之投影裝置之暗狀態光的光徑示意圖。於本實施例中,投影裝置1b與第1圖至第5圖所示之投影裝置1相似,且相同的元件標號代表相同之元件、結構與功能,於此不再贅述。於本實施例中投影裝置1b包括一反射元件40a以及一輔助反射元件40b。稜鏡組10包括第一稜鏡10a以及第二稜鏡10c。第一稜鏡10a以及第二稜鏡10c之間具有一交界面15,組配反射光源λ0至數位微型反射鏡元件20。第一稜鏡10a另具有入光面11以及微鏡對應面12。第二稜鏡10c則另具有第一出光面13、第二出光面14以及輔助反射面17。其中第一出光面13與輔助反射面17彼此面向,第二出光面14連接於第一出光面13與輔助反射面17之間,輔助反射面17與第二出光面14之間形成一夾角θ,夾角θ小於90度。於本實施例中,反射元件40a與輔助反射元件40c可例如是一反射鍍膜,分別形成於第一出光面13與輔助反射面17上。於其他實施中,反射元件40a與輔助反射元件40c可例如是一金屬片,分別面向第一出光面13與輔助反射面17而設置。本案並不以此為限。於數位微型反射鏡元件20提供暗狀態光λ2時,暗狀態光λ2穿過交界面15而導向反射元件40a,反射元件40a的反射面41a反射暗狀態光λ2至輔助反射面17,再透過輔助反射元件40b的反射面41b反射暗狀態光λ2至第二出光面14,使暗狀態光λ2穿過第二出光面14上之抗反射膜16而射出,並由殼體60內之散熱模組50之接收部51吸收暗狀態光λ2,以將暗狀態光λ2轉換為熱能。暗狀態光λ2轉換為熱能後,經傳導部52傳遞至殼體60外之散熱部53而逸散。於本實施例中,藉由分別將反射元件40a與輔助反射元件40c對應設置於第一稜鏡10a的第一出光面13與第二稜鏡10c的輔助反射面17上,散熱模組50之接收部51可相對於稜鏡組10的第二出光面14而設置,且容置於容置空間61內,以解決因空間限制而難以直接逸散暗狀態光λ2之能量的問題,並達到例如殼體60內密閉光機內的散熱效果,改善關鍵光學元件的溫度,使投影裝置1b具有更高的發光效率與信賴性。需說明的是,稜鏡組10的設計可視實際應用調變,配合輔助反射元件40c之設置,散熱模組50之接收部51與稜鏡組10可最佳化地容置於殼體60的容置空間61內,有效利用殼體60的容置空間61。當然,第一稜鏡10a與第二稜鏡10c的型式、輔助反射元件40c之數量及設置位置均可視實際應用調變。本案不受於此,且不再贅述。FIG. 8 is a schematic diagram showing the structure of the projection device of the third preferred embodiment of the present invention. FIG. 9 is a schematic diagram showing the light path of the dark state light of the projection device of the third preferred embodiment of the present invention. In this embodiment, the
綜上所述,本案提供一種可於暗狀態光條件下提供散熱模組之投影裝置。藉由將至少一反射元件與散熱模組分別相對於稜鏡組的第一出光面與第二出光面而設置,可解決因空間限制而難以直接逸散暗狀態光之能量的問題,並達到密閉光機內的散熱效果,改善關鍵光學元件的溫度,使投影裝置具有更高的發光效率與信賴性。此外,藉由至少一反射元件之設置,將暗狀態光導向至利於散熱的空間,再以散熱模組進行散熱。於暗狀態光行經的第二出光面上更具有一抗反射膜,以提高暗狀態光於第二出光面的穿透率,降低滯留於稜鏡中。另一方面,利用散熱模組之接收部鄰設於稜鏡的第二出光面而容置於密閉光機內,再以傳導部將熱量傳導至外部的散熱部進行散熱。由於接收部位於光機內部,具有利於暗狀態光滯留的幾何表面,幾何表面更經黑化及粗糙化處理,可提高暗狀態光之吸收率。藉由接收部吸收暗狀態光之光能並將其轉變為熱能,經傳導部傳遞至位於光機外部的散熱部進行散熱,可解決散熱模組的設置問題,同時達到逸散光機內部暗狀態光能量的散熱效果,改善關鍵光學元件的溫度,使投影裝置具有更高的發光效率與信賴性。In summary, this project provides a projection device that can provide a heat dissipation module under dark conditions. By arranging the at least one reflective element and the heat dissipation module respectively opposite to the first light-emitting surface and the second light-emitting surface of the set, the problem that it is difficult to directly dissipate the energy of the dark state light due to space constraints can be solved, and The heat dissipation effect in the airtight machine improves the temperature of key optical components, so that the projection device has higher luminous efficiency and reliability. In addition, through the arrangement of at least one reflective element, the dark state light is guided to a space conducive to heat dissipation, and then the heat dissipation module is used for heat dissipation. There is an anti-reflection film on the second light-emitting surface of the dark state light passing through, so as to increase the penetration rate of the dark-state light on the second light-emitting surface and reduce the retention of the light in the shadow. On the other hand, the receiving part of the heat-dissipating module is arranged adjacent to the second light-emitting surface of the faucet and is accommodated in the airtight machine, and the conduction part conducts heat to the external heat-dissipating part for heat dissipation. Since the receiving part is located inside the optical engine, it has a geometric surface that is conducive to the retention of light in the dark state. The geometric surface is more blackened and roughened to increase the absorption rate of light in the dark state. The receiving part absorbs the light energy of the dark state light and converts it into heat energy, which is transferred to the heat dissipation part located outside the optical machine through the conduction part for heat dissipation, which can solve the problem of dissipating the heat dissipation module and achieve the internal dark state of the escaped optical machine The heat dissipation effect of light energy improves the temperature of key optical components, so that the projection device has higher luminous efficiency and reliability.
本案得由熟習此技術之人士任施匠思而為諸般修飾,然皆不脫如附申請專利範圍所欲保護者。This case can be modified in many ways by those who are familiar with this technology, but it is not deviated from the protection of the patent application.
1、1a、1b:投影裝置
10:稜鏡組
10a:第一稜鏡
10b、10c:第二稜鏡
11:入光面
12:微鏡對應面
13:第一出光面
14:第二出光面
15:交界面
16:抗反射膜
17:輔助反射面
20:數位微型反射鏡元件
30:鏡頭
40、40a:反射元件
41、41a、41b:反射面
40b:輔助反射元件
50:散熱模組
51:接收部
51a:幾何表面
52:傳導部
53:散熱部
60:殼體
60a:前蓋
60b:後蓋
61:容置空間
λ0:光源
λ1:亮狀態光
λ2:暗狀態光
1, 1a, 1b: projection device
10: 稜鏡
第1圖係揭示本案第一較佳實施例之投影裝置之結構示意圖。 第2圖係揭示本案第一較佳實施例之投影裝置之部份結構分解圖。 第3圖係揭示本案第一較佳實施例之投影裝置之入射光源的光徑示意圖。 第4圖係揭示本案第一較佳實施例之投影裝置之亮狀態光的光徑示意圖。 第5圖係揭示本案第一較佳實施例之投影裝置之暗狀態光的光徑示意圖。 第6圖係揭示本案第二較佳實施例之投影裝置之結構示意圖。 第7圖係揭示本案第二較佳實施例之投影裝置之暗狀態光的光徑示意圖。 第8圖係揭示本案第三較佳實施例之投影裝置之結構示意圖。 第9圖係揭示本案第三較佳實施例之投影裝置之暗狀態光的光徑示意圖。 FIG. 1 is a schematic diagram showing the structure of the projection device of the first preferred embodiment of the present invention. Fig. 2 is an exploded view showing the partial structure of the projection device of the first preferred embodiment of the present invention. FIG. 3 is a schematic diagram showing the light path of the incident light source of the projection device according to the first preferred embodiment of the present invention. FIG. 4 is a schematic diagram showing the light path of the bright state light of the projection device of the first preferred embodiment of the present invention. FIG. 5 is a schematic diagram showing the light path of the dark state light of the projection device of the first preferred embodiment of the present invention. FIG. 6 is a schematic diagram showing the structure of the projection device of the second preferred embodiment of the present invention. FIG. 7 is a schematic diagram showing the light path of the dark state light of the projection device of the second preferred embodiment of the present invention. FIG. 8 is a schematic diagram showing the structure of the projection device of the third preferred embodiment of the present invention. FIG. 9 is a schematic diagram showing the light path of the dark state light of the projection device of the third preferred embodiment of the present invention.
1:投影裝置 1: Projection device
10:稜鏡組 10: 稜鏡 group
10a:第一稜鏡 10a: The first tang
10b:第二稜鏡 10b: The second tang
11:入光面 11: Glossy surface
12:微鏡對應面 12: Micro mirror corresponding surface
13:第一出光面 13: The first glossy surface
14:第二出光面 14: The second glossy surface
15:交界面 15: Interface
16:抗反射膜 16: Anti-reflective film
20:數位微型反射鏡元件 20: Digital micro mirror element
30:鏡頭 30: lens
40:反射元件 40: reflective element
41:反射面 41: reflective surface
50:散熱模組 50: cooling module
51:接收部 51: receiving department
52:傳導部 52: Conduction part
53:散熱部 53: heat sink
60:殼體 60: shell
61:容置空間 61: accommodation space
λ0:光源 λ0: light source
λ1:亮狀態光 λ1: bright state light
λ2:暗狀態光 λ2: dark state light
Claims (12)
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TWI823068B (en) * | 2021-03-12 | 2023-11-21 | 中強光電股份有限公司 | Optical-mechanical module and projection device |
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EP2198344B1 (en) * | 2007-10-09 | 2012-08-01 | Carl Zeiss SMT GmbH | Microlithographic projection exposure apparatus |
TW201816501A (en) * | 2016-10-21 | 2018-05-01 | 揚明光學股份有限公司 | Light path adjustment mechanism and optical mechanism |
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EP2198344B1 (en) * | 2007-10-09 | 2012-08-01 | Carl Zeiss SMT GmbH | Microlithographic projection exposure apparatus |
TW201816501A (en) * | 2016-10-21 | 2018-05-01 | 揚明光學股份有限公司 | Light path adjustment mechanism and optical mechanism |
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