TWI706050B - Device for supplying process gas in coating device - Google Patents

Abstract

The present invention relates to a device for providing process gas in a coating device. The device has a housing (1) and an evaporation device (3, 3', 3") source housing (2), with a first gas delivery line (4) that opens into the source housing (2) to generate a first gas flow (5) passing through the source housing (2) ), having a first exhaust channel (6) that discharges the first airflow (5) from the source housing (2) into the conveying pipeline (7), and has a first exhaust passage (6) that passes into the housing (1) to generate in the source The second gas delivery line (8) of the second gas flow (9) passing through the casing (1) outside the casing (2), and having the second gas flow (9) discharged from the casing (1) The second exhaust passage (10) of the conveying pipeline (7), the second exhaust passage surrounds the first exhaust passage (6), and a reverse diffusion barrier (10) is arranged in the second exhaust passage ( 11) According to the present invention, the reverse diffusion barrier (11) is constructed to enable the two particularly oppositely arranged wall sections of the exhaust channel (6) to relatively change positions.

Description

Device for supplying process gas in coating device

The present invention relates to a device for supplying process gas in a coating device. The device has an evaporation device for liquid or solid starting materials, and the evaporation device is arranged in a source housing. The aerosol with liquid or solid aerosol particles is input into the source housing through the first gas delivery pipeline. The aerosol particles are evaporated there. The steam is discharged from the source shell through the exhaust passage. The steam formed by the evaporation device is fed into the process chamber through the conveying line, the exhaust mechanism is located in the process chamber, and the steam is discharged through the exhaust mechanism so as to be condensed in the process chamber, especially on the cooled base On the substrate.

WO 2012/175128 A1 describes an evaporation device which has two heat transfer elements arranged one after the other in the flow direction of the aerosol. The two heat transfer elements are made of conductive solid foam, and the solid foam is heated by energization. WO 2012/175124 A1, WO 2010/175126 A1, DE 10 2011 051 261 A1 or DE 10 2011 051 260 A1 describe similar devices.

From US 4,769,296 and US 4,885,211, the production of light emitting diodes (OLED) composed of organic starting materials is known. In order to manufacture OLEDs, solid or liquid starting materials must be converted into a gaseous state. This is done with an evaporator.

DE 10 2014 115 497 A1 describes a device for depositing OLEDs. It describes a device for supplying process gas in a coating device, where The liquid or solid starting material is evaporated by the evaporation device. The steam carried by the carrier gas is introduced from the source shell into the conveying pipeline through the first exhaust passage. The second gas conveying line is connected to the conveying line for discharging the second gas stream, and the first gas stream containing steam is diluted with the second gas stream.

DE 10 2014 109 196 describes a device for generating steam from a solid or liquid starting material as a CVD or PVD device, in which a first gas stream is fed into a source housing through a first delivery line. The first transfer pipeline is composed of pipes, and the open ends of these pipes are in communication with the heat transfer element. Other heat transfer elements are located downstream of this heat transfer element, and these other heat transfer elements are respectively heated by energization.

US 2010/0206231 A1, US 2010/0012036 A1, JP 0800823 A, and EP 2 819 150 A2 describe a labyrinth seal or reverse diffusion barrier arranged in the exhaust pipe downstream of the process chamber of a CVD reactor to prevent Reverse diffusion to the process chamber.

The purpose of the present invention is to improve the device for supplying process gas to facilitate its use.

The solution of the present invention to achieve the above-mentioned objects first and generally consists in a device for providing process gas in a coating device, the device has a housing and is arranged in the housing and includes a device for liquid or solid starting The source housing of the material evaporating device has a first gas delivery line that passes into the source housing to generate a first gas flow through the source housing, and has a first gas delivery line that discharges the first gas flow from the source housing into the transport The first exhaust passage of the pipeline has a second gas delivery pipeline that opens into the housing to generate a second air flow through the housing outside the source housing, and has a second gas delivery line that discharges the second air flow from the housing The second exhaust passage of the conveying pipeline, the second exhaust passage encloses the first exhaust passage And a reverse diffusion barrier is arranged in the second exhaust passage.

In addition to a beneficial improvement plan for this device, the accessory item is also an original solution for this project.

The following features are used to achieve this goal independently or in combination, that is, the technical optimization of the aforementioned device: the source housing can be slightly displaced relative to the housing housing the source housing in the area of the second exhaust passage, and this point varies with The second exhaust passage changes the distance between the two oppositely arranged walls. The back diffusion barrier allows this relative displacement to occur. The reverse diffusion barrier is composed of multiple barrier elements. The first barrier element may be fixed on the source housing. The second barrier element can be fixed on the device casing surrounding the source casing. One wall of the second exhaust passage is constituted by a component of the source casing, and the other wall of the second exhaust passage is constituted by a component of the device casing. The cross section of the second exhaust passage is annular, in which the radially inner passage wall is constituted by the source casing, and the radially outer passage wall is constituted by the device casing. The first barrier wall element fixed on the source housing has a free edge, and the barrier wall element is separated from the oppositely arranged wall portion of the second exhaust channel by the free edge. The second barrier wall element is fixed on the device housing and has a free edge which is separated from the oppositely arranged wall of the exhaust channel. The two barrier elements can be relatively displaced. The present invention proposes that the two barrier elements are in contact with each other in a sealed manner. The two barrier elements can slide along the contact surface with shear force. At least one of the barrier elements may be breathable. The air-permeable barrier element may have several vent holes. The gas barrier element may be composed of an annular disc-shaped body. The first barrier element connected to the source housing has a radial inner edge and a radial outer edge. The inner edge refers to a fixed edge. The first barrier element is fixed on the source housing by the fixed edge, and the outer edge refers to Free edge. The second barrier element has a radially outer edge, the outer edge is a fixed edge, and the barrier element is fixed on the device housing by the fixed edge. The second barrier element has a free edge, and the free edge is between the second exhaust channel The oppositely arranged walls are separated. Therefore, the two preferred barrier elements are either fixed to the source housing relative to the device housing in an immovable manner, or fixed to the device housing in a movable manner relative to the source housing. The present invention proposes that the air-impermeable barrier elements are each abutted on a barrier element with a vent hole in a manner of contacting surfaces facing away from each other. The air-impermeable barrier element can be fixed on the device housing. The two barrier elements with vent holes can be fixed on the source housing. But the opposite configuration scheme can also be adopted. The barrier element may be a flat annular body, which abuts against each other in a contacting manner alternately in the flow direction of the second air flow. Such barrier elements are alternately fixed on oppositely arranged walls of the second exhaust passage, preferably alternately fixed on the source housing or the device housing. The source housing can move in a plane relative to the device housing, and the barrier element can be relatively displaced in the plane. This movement may be caused by thermal expansion when heating the evaporation device. The vent is constructed and arranged in a certain way so that it will not be closed when the barrier element is relatively displaced. The present invention specifically proposes that the distance between the vent hole of the air-permeable barrier element and the free edge of the barrier element is greater than the distance between the free edge and the fixed edge of the air-impermeable barrier element. The two barrier wall elements correspond to the relatively displaceable wall of the second exhaust passage, so that even at the extreme relative displacement position of the two walls of the exhaust passage, the vent hole will not be closed, but the relative displacement is ensured The barrier elements overlap each other. For this reason, the present invention specifically proposes that the sum of the distance between the free edge of the air-impermeable barrier element and the fixed edge and the distance between the free edge of the air-permeable barrier element and the fixed edge is greater than that of the second exhaust channel. The maximum possible distance between the walls. Thereby, it is ensured that at least two barrier elements overlap each other within the entire circumferential extension range of the second exhaust channel even when the source housing reaches the maximum displacement relative to the device housing. The source housing may have a lower end surface, and the barrier element is fixed on the lower end surface. The lower end surface surrounds the opening of the first exhaust passage, and the first airflow containing steam is discharged through the first exhaust passage. Source shell size The pipe-shaped section on the body constitutes the opening or the end edge. The radial inner wall of the pipe-shaped section constitutes the wall of the first exhaust passage. The radially outward wall of the pipe-shaped section constitutes the wall of the second exhaust passage. The clearance space is located downstream of the outlet of the first exhaust passage in the flow direction, and the clearance space surrounds the conveying pipeline annularly. The vent hole of the diffusion barrier is connected with the interstitial space. A heating device, particularly for heating the solid foam constituting the evaporation device, can be used to heat the evaporation device and the source housing to a temperature higher than the temperature maintained by the device housing. Therefore, the device has a first housing in which a vent is arranged and the temperature of the first housing can be higher than that of the second housing, which surrounds the first housing and With the flushing gas, the flushing gas is mixed in the conveying line with the airflow passing through the first housing. For this reason, to prevent the reversal from the conveying line to the volume area of the second housing surrounding the first housing A reverse diffusion barrier is provided for diffusion, and the flushing airflow constituting the second airflow must pass through the reverse diffusion barrier. The vent holes of the back diffusion barrier cause the local flow velocity to increase. The evaporator has a heat transfer element including an opening, and the conveying tube is inserted in the opening. The outlet of the conveying pipe is located in the upstream area of the second heat transfer element. An intermediate chamber can be arranged between the two heat transfer elements. Please refer to the content of DE 10 2014 109 196 for the technical solution of this kind of evaporation element, and the entire content of the case is incorporated into the disclosure content of this application. DE 10 2014 115 497 describes a transfer pipeline system by which the steam generated in the evaporation device is introduced into the process chamber of the reactor after multiple dilutions. The disclosure of this case is incorporated into the disclosure of this patent application. According to a preferred technical solution, the device has three rings, at least two of which have holes evenly distributed on the arc line, and the holes form vents. These ring systems are arranged one above the other and alternately centered inside and outside. This prevents back diffusion, and observes the center position of the source housing relative to the device housing to compensate related tolerances. Due to the uniform layout of the vent holes, a uniform fluid distribution is formed. The device is used to evaporate liquid or powdered materials It is composed of an evaporation unit arranged in the first shell. The second shell encapsulates the first shell and has shell walls, and the shell walls are separated from the walls of the first shell to form a cavity surrounding the first shell. The first casing has an exhaust passage for exhausting the first airflow containing steam. The exhaust channel forms a collection area, the formed vapor is collected in the collection area, and the evaporated material passes through the collection area to reach an interface where the second airflow is input. The second airflow is used to flush the interface so that the steam cannot flow back into the cavity of the second housing that surrounds the first housing. The reverse diffusion barrier is constructed so that the temperature change in the region of the first housing will not cause the airflow in the interface to change. Equipped with a device for gas flow control. For this, a mass flow controller or similar controller can be used. The barrier elements composed of ring elements can be stacked in matching shapes.

1‧‧‧Shell

2‧‧‧Source shell

3‧‧‧Evaporation device

3'‧‧‧evaporator

3"‧‧‧evaporator

4‧‧‧The first gas transmission pipeline

5‧‧‧First Air

6‧‧‧First exhaust passage

7‧‧‧Transportation pipeline

8‧‧‧Second gas pipeline

9‧‧‧Second Airflow

10‧‧‧Second exhaust channel

11‧‧‧Diffusion barrier

12‧‧‧Barrier element

13‧‧‧Vent

14‧‧‧Barrier element

15‧‧‧Vent

16‧‧‧Barrier element

17‧‧‧Interstitial space

18‧‧‧Cover

19‧‧‧End face

20‧‧‧Stairs

Z‧‧‧Centerline

The present invention will be described in detail below in conjunction with the accompanying drawings. Among them: Fig. 1 is a cross-sectional view of the device taken along the center Z, Fig. 2 is a cross-sectional view according to part II in Fig. 1, Fig. 3 is a cross-sectional view according to part III in Fig. 1, and Fig. 4 is taken along Fig. 1 A cross-sectional view taken along the line IV-IV in FIG. 5 is a perspective view of the device shown as a cross-section in FIG. 1, and FIG. 6 is a schematic diagram according to FIG. 2, but with an eccentric offset, and Fig. 7 is a schematic diagram according to Fig. 3 with the eccentric offset.

As described in DE 10 2014 109 196, the device depicted in the diagram is a vapor source applied to a CVD or PVD device, or as described in DE 10 2014 115 497, the device is used as a CVD or PVD device System Components.

The device uses two shells 1, 2 to rotate around the center line Z. Called the layout. The first casing constitutes the source casing 2 surrounded by the device casing, and the device casing constitutes the second casing 1. A cavity is located between the inner wall of the housing 1 and the outer wall of the source housing 2 arranged in the housing 1. The source housing 2 also has a cavity. The source housing 2 is fixed on the cover 18 of the housing 1, and the cover can be connected with the cylindrical side wall of the housing 1 or with the cylindrical side wall of the source housing 2.

The first gas delivery line 4 extends through the cover 18 into the cavity of the source housing 2. Three evaporation devices 3, 3', 3" arranged one after another in the flow direction are located in the source housing 2. The evaporation devices can be heated by energization, and the evaporation devices are composed of open-cell foam. The evaporation devices 3. 3', 3" completely fill the cross section of the cavity of the source housing 2. The aerosol with liquid or solid organic particles is input through the first gas delivery pipeline 4 and through the carrier gas flow. The aerosol is discharged from the opening of the first gas delivery pipeline 4 into one of the evaporation devices 3, 3', 3", where the aerosol particles absorb heat and evaporate. For this reason, the evaporation devices 3, 3', 3" are heated to Increased temperature T1, which is higher than the condensation temperature, that is, higher than the evaporation temperature of the organic particles. A first gas stream 5 containing vapor of evaporated aerogel particles is formed. Please refer to DE 10 2014 109 196 for the working principle of the evaporation device 3, 3', 3" and other possible technical solutions.

The first airflow 5 enters the first exhaust passage 6 through the reduced cross-sectional section, the exhaust passage having a disc-shaped cross-section and is composed of a duct-shaped outlet section of the source housing 2. The outlet section constitutes an end surface 19 surrounding the outlet of the first exhaust passage 6.

The end surface 19 is arranged opposite to the step 20 which is formed by the wall section of the housing 1. A transport line 7 is connected to the step 20, and the transport line introduces the first gas stream 5 into the process chamber of the CVD or PVD device, in which the OLED layer is deposited on the substrate on the susceptor. Please refer to DE 10 2014 115 497 for possible technical solutions of the transport pipeline system.

A second gas delivery line 8 that is offset radially outward from the first gas delivery line 4 is arranged in the cover 18, and the carrier gas or flushing gas can be fed into the surrounding source shell of the housing 1 through the second gas delivery line The cavity of the body 2 thus forms a second air flow 9 flowing from the side of the source housing 2. The second air flow 9 passes through a circular cavity, which reduces in cross section in the downstream direction and forms a second exhaust passage 10 there. The inner wall of the second exhaust passage 10 is formed by the pipe-shaped end of the source housing 2. Therefore, the pipe-shaped end constitutes the wall of the first exhaust passage 6 with its inner side and the wall of the second exhaust passage 10 with its outer side. The second exhaust passage 10 surrounds the first exhaust passage 6 annularly. The second wall of the second exhaust passage 10 is formed by a section of the housing 1. The second exhaust passage 10 is in communication with a gap space 17, and the gap space surrounds the first exhaust passage 6 and the outlet of the conveying pipeline 7 in an annular shape. The gap space extends between the end surface 19 and the step 20.

In order to prevent the vapor of the evaporated organic starting material contained in the first airflow 5 from flowing into the cooler area of the second exhaust passage 10, on the interface between the second exhaust passage 10 and the first exhaust passage 6 With a diffusion barrier 11. The diffusion barrier prevents the organic vapor from diffusing back into the cavity surrounding the source housing 2. The wall of the cavity maintains a temperature T2, which is lower than the condensation temperature of the steam, otherwise the steam may condense there.

The diffusion barrier 11 is composed of a plurality of flat annular barrier elements 12, 14, and 16. The barrier elements 12, 14, and 16 each have a fixed edge and a free edge. The barrier elements are fixed on a wall of the second exhaust channel 10 by the fixed edge, and the free edge and the second exhaust channel 10 are separated by the opposed walls. Based on this gap and because the barrier elements 12, 14, 16 assigned to different walls of the second exhaust passage 10 only abut in contact, the outlet end of the source housing 2 can be displaced relative to the housing 1. Fig. 2 shows the relative position of the source housing 2 with respect to the housing 1, at which the central axis Z of the housing 1 and the source housing 2 coincide. The above scheme refers to the difference between the source housing 2 and the housing 1 Center layout.

6 and 7 show the eccentric layout of the source housing 2 relative to the housing 1. The reason for this eccentric layout may be the mechanical deformation of the source housing 2, which is caused by the increased temperature T1 in the evaporation device 3, 3', 3". The temperature of the evaporation device 3, 3', 3" is higher than The condensation temperature of the steam is higher than the wall temperature T2 of the shell 1.

The annular disc-shaped barrier element 12 has a plurality of vent holes 13 distributed on a circular arc along the entire circumference of the barrier element 12. The vent hole 13 is adjacent to the outer wall of the source housing 2. The barrier element 12 is fixed with its fixed edge in the annular groove of the end surface 19 of the source housing 2 or the outlet section. The free edge section of the barrier element 12 is separated from the oppositely arranged wall of the second exhaust passage 10 which is formed by the housing 1.

The barrier element 14 is fixed on the radially inner wall of the second exhaust passage 10 in front of the barrier element 12 in the flow direction, and also has vent holes 15 evenly distributed on the circular circumference.

The barrier element 16 is fixed on the radial outer wall of the second exhaust passage 10 with a fixed edge section. The barrier element 16 is located between the two barrier elements 12 and 14 and forms two wide surface areas that are away from each other. Each of the wide surface areas abuts against the wide surface area of one of the barrier elements 12 and 14 in a contact manner. Therefore, the distance between the barrier elements 12 and 14 is equal to the material thickness of the barrier element 16. The barrier elements 12, 14, 16 are placed in contact and sealed against each other, and can be displaced relative to each other in a plane extending perpendicular to the center line Z, for example, from the position shown in Figure 2 and Figure 3 to Figure 6 And the position shown in Figure 7.

The air vents 13 and 15 are spaced from the free edges of the barrier elements 12 and 14 to a certain distance. This distance makes the air vents not closed by the barrier element 16 even at extreme displacement positions. Therefore, the barrier element 16 extends only a distance into the second exhaust passage. For the channel 10, the distance is less than or equal to the distance between the vents 13, 15 and the corresponding free edges of the barrier elements 12, 14. In addition, the barrier elements 12, 14, 16 also have a width that overlaps the entire circumference even when the source housing 2 reaches the maximum displacement relative to the device housing 1. For this reason, the radial distance between the vent holes 13, 15 of the air-permeable barrier elements 12, 14 and the free edge of the barrier element constitutes a first distance. The distance between the free edge of the air-impermeable barrier element 16 and the fixed edge, that is, the radial width of the barrier element, constitutes the second distance. The third distance is the distance between the free edges of the air-permeable barrier elements 12 and 14 and their fixed edges, that is, the radial width of the barrier elements in the second exhaust channel 10. The fourth distance is the maximum width of the second exhaust passage 10, that is, the maximum distance between the wall formed by the source housing 2 and the wall formed by the housing 1 of the second exhaust passage 10. The present invention specifically proposes that the first distance is greater than the second distance, and the sum of the second distance and the third distance is greater than the fourth distance.

The barrier elements 12, 14, 16 are preferably made of corrosion-resistant metal or ceramic material. The above solution refers to the barrier elements 12, 14, 16 that overlap each other in a contact and sealing manner in the free edge area, wherein the barrier elements 12, 14, 16 are circular, and the barrier element 16 is not air-permeable, and preferably In particular, the two barrier elements 12 and 14 fixedly connected to the same wall of the second exhaust passage 10 have vent holes 13 and 15 preferably staggered from each other. The second airflow 9 passes through the upstream vent 15 and enters the annular intermediate chamber, which is formed between the two barrier elements 12 and 14. The second airflow 9 passes through the vent 13 and is discharged from the intermediate chamber into the interstitial space 17, the interstitial space annularly surrounds the outlet of the conveying pipeline 7. The second air flow 9 discharged from the interstitial space 17 and the first air flow 5 discharged from the first exhaust channel 6 enter the conveying line 7 where the two air flows are mixed. The second gas stream 9 may be composed of an inert gas that is not easy to react. The first gas stream 5 contains carrier gas, especially inert carrier gas, which is input through the first gas delivery line 4, and is The steam formed in the devices 3, 3', 3". Therefore, the dilution effect can be obtained by inputting the second air stream 9 into the first air stream 5.

The foregoing embodiments are used to illustrate the inventions contained in the application as a whole. These inventions independently constitute a further solution to the prior art through at least the following feature combinations: a device for supplying process gas in a coating device, the device There is a housing 1 and a source housing 2 arranged in the housing and containing evaporation devices 3, 3', 3" for liquid or solid starting materials, and a source housing 2 that opens into the source housing 2 to pass through the source housing The first gas delivery pipeline 4 of the first gas flow 5 of the body 2 has a first exhaust channel 6 for discharging the first gas flow 5 from the source housing 2 into the conveying pipeline 7, and has a first exhaust passage 6 that passes into the housing 1 to generate in the source housing The body 2 passes through the second gas delivery pipeline 8 of the second gas flow 9 of the housing 1, and has a second exhaust passage 10 that discharges the second gas flow 9 from the housing 1 into the conveying pipeline 7. The second exhaust The passage surrounds the first exhaust passage 6 and a reverse diffusion barrier 11 is arranged in the second exhaust passage.

A device is characterized in that the reverse diffusion barrier 11 is constructed to realize the relative change of the positions of the two wall sections of the exhaust channel 6 which are arranged oppositely.

A device characterized in that the reverse diffusion barrier 11 has at least one first barrier element 12 immovably fixed on the source housing 2 and at least one second barrier element 16 immovably fixed on the housing 1, and The two barrier wall elements 12 and 16 are in contact with each other in a sealed and relatively movable manner, and at least one barrier wall element 12 and 16 is air-permeable.

A device characterized in that the gas-permeable barrier element 12 of the reverse diffusion barrier 11 has a plurality of vent holes 13.

A device characterized in that the reverse diffusion barrier 11 is airtight The barrier elements 12 and 14 with vents 13 and 15 are attached to the barrier elements 12 and 14 with vent holes 13 and 15 in contact with the surfaces facing away from each other.

A device, characterized in that the reverse diffusion barrier 11 has at least one barrier element 12, 14, the barrier element is fixed on the wall of the second exhaust channel 10 formed by the source housing 2 with a fixed edge and has a free edge , The free edge is separated from the oppositely arranged wall of the second exhaust channel 10 formed by the housing 1, and the reverse diffusion barrier has at least one barrier element 16, which is fixed in the second row with its fixed edge The air passage 10 is on the wall formed by the housing 1, and its free edge is separated from the oppositely arranged wall of the second exhaust passage 10 formed by the source housing 2.

A device characterized in that the barrier elements 12, 14, 16 are flat annular bodies, which are alternately arranged on the inner wall of the second exhaust channel 10 formed by the source housing 2 in the flow direction of the second air flow 9 The upper or second exhaust passage 10 is on the outer wall formed by the housing 1.

A device characterized in that the first distance between the air holes 13, 15 of the air-permeable barrier element 12, 14 and the free edge of the barrier element 12, 14 is greater than the second distance between the free edge of the air-impermeable barrier element 16 and its fixed edge , And the sum of the second distance and the third distance between the free edges of the air-permeable barrier elements 12, 14 and the fixed edges thereof is greater than the maximum between the two retaining barrier elements 12, 14, 16 of the second exhaust channel 10 Possible distance.

A device characterized in that a reverse diffusion barrier 11 composed of a plurality of barrier elements 12, 14, 16 is arranged on the free downstream end of the source housing 2 fixed on the cover 18 of the housing 1, and the source housing The end surface 19 is spaced from the step 20 in the vertical direction, so that the vent hole 13 of the diffusion barrier 11 communicates with the gap space 17.

A device characterized in that the free venting cross section of the diffusion barrier When the barrier element 12 is relatively displaced, it remains unchanged.

A device characterized in that the evaporation devices 3, 3', 3" can be heated to a temperature T1, which is higher than the temperature T2 of the casing 1.

A device characterized in that the evaporation devices 3, 3', 3" are composed of open-cell solid foams, which can be heated to an elevated temperature T1 in an energized manner.

A device is characterized in that the device is a component of a CVD or PVD device having a process chamber, a conveying pipeline 7 is connected to the process chamber, and a substrate is coated in the process chamber.

All the disclosed features (by themselves or in combination) are the essence of the invention. Therefore, the disclosed content of this application also includes all the content disclosed in the related/attached priority files (copy of the earlier application), and the features described in these files are also included in the scope of patent application of this application. The appendix describes the characteristics of the improvement scheme of the present invention with respect to the prior art, and its purpose is to make a divisional application on the basis of these claims.

1‧‧‧Shell

2‧‧‧Source shell

3‧‧‧Evaporation device

3'‧‧‧evaporator

3"‧‧‧evaporator

4‧‧‧The first gas transmission pipeline

5‧‧‧First Air

6‧‧‧First exhaust passage

7‧‧‧Transportation pipeline

8‧‧‧Second gas pipeline

9‧‧‧Second Airflow

10‧‧‧Second exhaust channel

11‧‧‧Diffusion barrier

12‧‧‧Barrier element

17‧‧‧Interstitial space

18‧‧‧Cover

19‧‧‧End face

20‧‧‧Stairs

Z‧‧‧Centerline

Claims (13)

A device for providing process gas in a coating device. The device has a housing (1) and an evaporation device (3, 3', 3" arranged in the housing and containing a liquid or solid starting material ) Of the source housing (2), having a first gas delivery line (4) leading into the source housing (2) to generate a first gas flow (5) passing through the source housing (2), and having the The first airflow (5) is discharged from the source housing (2) into the first exhaust passage (6) of the conveying pipeline (7), and has a first exhaust passage (6) that passes into the housing (1) to be generated in the source housing (2) A second gas delivery pipeline (8) that passes through the second gas flow (9) of the housing (1), and has a second gas delivery pipeline (8) that discharges the second gas flow (9) from the housing (1) into the delivery pipeline (7) ), the second exhaust passage surrounds the first exhaust passage (6), and a reverse diffusion barrier (11) is arranged in the second exhaust passage. The device of claim 1, wherein the reverse diffusion barrier (11) is constructed to enable the two particularly oppositely arranged wall sections of the exhaust passage (6) to relatively change positions. The device of claim 2, wherein the reverse diffusion barrier (11) has at least one first barrier element (12) immovably fixed on the source casing (2) and at least one immovably fixed The second barrier element (16) on the housing (1), wherein the two barrier elements (12, 16) are in contact with each other in a sealed and relatively displaceable manner, and at least one barrier element (12, 16) is air-permeable. The device of claim 1, wherein the gas-permeable barrier element (12) of the reverse diffusion barrier (11) has a plurality of vent holes (13). The device of claim 2, wherein the gas-impermeable barrier elements of the reverse diffusion barrier (11) are each abutted against a barrier element (12) with vent holes (13, 15) in contact with surfaces facing away from each other , 14) on. The device of claim 1, wherein the reverse diffusion barrier (11) has at least one barrier element (12, 14), and the barrier element is fixed to the second exhaust channel (10) with a fixed edge The wall formed by the source housing (2) has a free edge separated from the oppositely arranged wall formed by the housing (1) of the second exhaust passage (10), And the reverse diffusion barrier has at least one barrier element (16), the barrier element is fixed with its fixed edge on the wall of the second exhaust channel (10) formed by the housing (1), and its free The edge is separated from the oppositely arranged wall of the second exhaust channel (10) formed by the source housing (2). Such as the device of claim 2, wherein the barrier elements (12, 14, 16) are flat annular bodies, which are alternately arranged in the second exhaust passage ( 10) on the inner wall formed by the source casing (2) or on the outer wall of the second exhaust passage (10) formed by the casing (1). The device of claim 5, wherein the first distance between the vent holes (13, 15) of the air-permeable barrier element (12, 14) and the free edge of the barrier element (12, 14) is greater than that of the air-impermeable barrier element (16) The second distance between the free edge and the fixed edge, and the sum of the second distance and the third distance between the free edge and the fixed edge of the air-permeable barrier element (12, 14) is greater than the second exhaust channel ( The second of 10) maintains the maximum possible distance between the wall sections of the barrier elements (12, 14, 16). The device of claim 1, wherein the reverse diffusion barrier (11) composed of a plurality of barrier elements (12, 14, 16) is arranged on the cover of the source housing (2) and fixed to the housing (1) (18) On the upper and downstream free ends, the end surface (19) of the source housing is vertically separated from the step (20), so that the vent (13) of the diffusion barrier (11) and the gap space (17) Connected. Such as the device of claim 2, wherein the free venting cross section of the diffusion barrier remains unchanged when the barrier elements (12) are relatively displaced. Such as the device of claim 1, wherein the evaporation device (3, 3', 3") can be heated to a temperature (T1) that is higher than the temperature (T2) of the housing (1). The device of claim 1, wherein the evaporation device (3, 3', 3") is composed of open-cell solid foams, which can be heated to an elevated temperature (T1) by energization . The device of claim 1, wherein the device is a component part of a CVD or PVD device having a process chamber, the transport pipeline (7) is connected to the process chamber, and the substrate is coated in the process chamber.

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