TWI705943B - Manufacturing method of glass substrate - Google Patents
Manufacturing method of glass substrate Download PDFInfo
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- TWI705943B TWI705943B TW105119792A TW105119792A TWI705943B TW I705943 B TWI705943 B TW I705943B TW 105119792 A TW105119792 A TW 105119792A TW 105119792 A TW105119792 A TW 105119792A TW I705943 B TWI705943 B TW I705943B
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- glass
- glass ribbon
- molded body
- glass substrate
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B17/00—Forming molten glass by flowing-out, pushing-out, extruding or drawing downwardly or laterally from forming slits or by overflowing over lips
- C03B17/06—Forming glass sheets
- C03B17/064—Forming glass sheets by the overflow downdraw fusion process; Isopipes therefor
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B17/00—Forming molten glass by flowing-out, pushing-out, extruding or drawing downwardly or laterally from forming slits or by overflowing over lips
- C03B17/06—Forming glass sheets
- C03B17/068—Means for providing the drawing force, e.g. traction or draw rollers
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- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B25/00—Annealing glass products
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P40/00—Technologies relating to the processing of minerals
- Y02P40/50—Glass production, e.g. reusing waste heat during processing or shaping
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- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Re-Forming, After-Treatment, Cutting And Transporting Of Glass Products (AREA)
- Glass Compositions (AREA)
Abstract
本發明之目的在於提供一種能夠減小玻璃基板之板厚偏差之玻璃基板之製造方法。玻璃基板之製造方法具備成形步驟、搬送步驟、取得步驟、算出步驟、及調節步驟。成形步驟係向形成於成形體之上表面之供給槽溝供給熔融玻璃,使自供給槽溝之兩側溢出之熔融玻璃沿著成形體之兩側面流下,並使熔融玻璃於成形體之下端合流而成形玻璃帶。搬送步驟係使用設置於成形體之下方之輥,以特定之搬送速度朝下方搬送於成形步驟中成形之玻璃帶。取得步驟係取得與成形體之形狀相關之形狀資料。算出步驟係基於在取得步驟中取得之形狀資料,以玻璃帶之寬度方向之板厚偏差變小之方式,算出搬送速度。調節步驟係以成為於算出步驟中算出之搬送速度之方式,調節玻璃帶之搬送速度。 The object of the present invention is to provide a method for manufacturing a glass substrate that can reduce the thickness deviation of the glass substrate. The manufacturing method of a glass substrate has a shaping|molding process, a conveyance process, an acquisition process, a calculation process, and an adjustment process. The forming step is to supply molten glass to the supply groove formed on the upper surface of the molded body, so that the molten glass overflowing from both sides of the supply groove flows down the two sides of the molded body, and merges the molten glass at the lower end of the molded body And forming the glass ribbon. The conveying step uses a roller set below the forming body to convey the glass ribbon formed in the forming step downward at a specific conveying speed. The obtaining step is to obtain shape data related to the shape of the formed body. The calculation step is based on the shape data acquired in the acquisition step to calculate the conveying speed so that the thickness deviation in the width direction of the glass ribbon becomes smaller. The adjustment step is to adjust the transport speed of the glass ribbon so as to be the transport speed calculated in the calculation step.
Description
本發明係關於一種玻璃基板之製造方法。 The invention relates to a manufacturing method of a glass substrate.
用於液晶顯示器及電漿顯示器等平板顯示器(FPD)之玻璃基板對表面要求較高之平坦度。通常,此種玻璃基板係藉由溢流下拉法而製造。於溢流下拉法中,如專利文獻1(美國專利第3,338,696號)所記載般,流入成形體之上表面之槽並自槽溢出之熔融玻璃係經過成形體之兩側面而流落,並於成形體之下端合流而成形玻璃帶。所成形之玻璃帶一面朝下方被拉伸一面徐冷。冷卻後之玻璃帶被切斷成特定之尺寸,而獲得玻璃基板。 Glass substrates used in flat panel displays (FPD) such as liquid crystal displays and plasma displays require high flatness on the surface. Generally, such glass substrates are manufactured by the overflow down-draw method. In the overflow down-draw method, as described in Patent Document 1 (U.S. Patent No. 3,338,696), the molten glass that flows into the groove on the upper surface of the molded body and overflows from the groove flows down through both sides of the molded body and is formed The lower end of the body merges to form a glass ribbon. The formed glass ribbon is stretched downward while being slowly cooled. The cooled glass ribbon is cut into a specific size to obtain a glass substrate.
於溢流下拉法中,成形體設置於成形爐內之高溫氛圍下。又,於成形體施加有自重及熔融玻璃之重量所致之荷重。因此,因玻璃基板製造裝置之長年運轉,成形體因成形體之材質之熱潛變特性而逐漸潛變變形。尤其是,成形體之長邊方向之中央部容易因潛變變形而朝下方垂下撓曲。其結果,存在如下問題:自成形體之中央部溢出之熔融玻璃之量變得較自成形體之兩端部溢出之熔融玻璃之量多,成形之玻璃帶之寬度方向中央部之厚度增加,作為最終製品之玻璃基板之板厚偏差增加。 In the overflow down-draw method, the formed body is placed under a high temperature atmosphere in the forming furnace. In addition, a load due to the weight of the dead weight and the molten glass is applied to the molded body. Therefore, due to the long-term operation of the glass substrate manufacturing device, the formed body gradually creeps and deforms due to the thermal creep characteristics of the material of the formed body. In particular, the central portion in the longitudinal direction of the molded body is likely to sag downward and bend due to creep deformation. As a result, there is a problem that the amount of molten glass that overflows from the center of the molded body becomes larger than the amount of molten glass that overflows from both ends of the molded body, and the thickness of the center portion in the width direction of the molded glass ribbon increases. The thickness deviation of the glass substrate of the final product increases.
成形體之潛變變形於使用液相溫度較高之玻璃、及應變點較高 之玻璃之玻璃基板之製造步驟中,因成形體之溫度容易變高而尤其成為問題。又,近年來,隨著玻璃基板之大型化,成形體之長邊方向之尺寸不斷變長,故而潛變變形所致之成形體之撓曲有變得顯著之傾向。 The creep deformation of the formed body is when using glass with a higher liquidus temperature and a higher strain point In the manufacturing steps of the glass substrate of the glass, the temperature of the molded body tends to increase, which becomes a problem in particular. In addition, in recent years, with the increase in the size of glass substrates, the dimensions of the molded body in the longitudinal direction have been continuously increasing, and therefore, the bending of the molded body due to creep deformation tends to become significant.
因此,本發明之目的在於提供一種能夠減小玻璃基板之板厚偏差之玻璃基板之製造方法。 Therefore, the object of the present invention is to provide a method for manufacturing a glass substrate capable of reducing the thickness deviation of the glass substrate.
本發明之玻璃基板之製造方法具備成形步驟、搬送步驟、取得步驟、算出步驟、及調節步驟。成形步驟係向形成於成形體之上表面之供給槽溝供給熔融玻璃,使自供給槽溝之兩側溢出之熔融玻璃沿著成形體之兩側面流下,使於兩側面流下之熔融玻璃於成形體之下端合流而成形玻璃帶。搬送步驟係使用設置於成形體之下方之輥,將於成形步驟中成形之玻璃帶以特定之搬送速度朝下方搬送。取得步驟係取得與成形體之形狀相關之形狀資料。算出步驟係基於在取得步驟中取得之形狀資料,以使玻璃帶之寬度方向之板厚偏差變小之方式,算出搬送速度。調節步驟係以變成於算出步驟中算出之搬送速度之方式,調節玻璃帶之搬送速度。 The manufacturing method of the glass substrate of this invention has a shaping|molding process, a conveyance process, an acquisition process, a calculation process, and an adjustment process. The forming step is to supply molten glass to the supply groove formed on the upper surface of the molded body, so that the molten glass overflowing from both sides of the supply groove flows down along the two sides of the molded body, and the molten glass that flows down on both sides is formed The lower end of the body merges to form a glass ribbon. The conveying step uses rollers arranged below the forming body to convey the glass ribbon formed in the forming step downward at a specific conveying speed. The obtaining step is to obtain shape data related to the shape of the formed body. The calculation step is based on the shape data acquired in the acquisition step to calculate the conveying speed so that the thickness deviation in the width direction of the glass ribbon is reduced. The adjustment step is to adjust the transport speed of the glass ribbon so that it becomes the transport speed calculated in the calculation step.
又,於本發明之玻璃基板之製造方法中,較佳為,取得步驟係取得基於成形體之潛變變形之形狀資料。 Furthermore, in the manufacturing method of the glass substrate of the present invention, it is preferable that the obtaining step is to obtain shape data based on the creep deformation of the formed body.
又,於本發明之玻璃基板之製造方法中,較佳為,取得步驟係至少取得成形體之上表面之鉛垂方向之移位量作為形狀資料。該情形時,較佳為,算出步驟係移位量越大,則算出越大之值作為搬送速度。 Furthermore, in the manufacturing method of the glass substrate of the present invention, it is preferable that the obtaining step is to obtain at least the amount of displacement in the vertical direction of the upper surface of the molded body as the shape data. In this case, it is preferable that the larger the calculated step shift amount, the larger the calculated value is used as the transport speed.
又,於本發明之玻璃基板之製造方法中,較佳為,搬送步驟係使用夾持玻璃帶之寬度方向之兩端部之輥,一面使玻璃帶徐冷一面進行搬送,並基於在算出步驟中算出之搬送速度控制輥之旋轉速度。 Furthermore, in the method of manufacturing the glass substrate of the present invention, it is preferable that the conveying step is carried out by using rollers that hold the two ends of the glass ribbon in the width direction, while slowly cooling the glass ribbon, based on the calculation step The conveying speed calculated in the control roller rotation speed.
又,於本發明之玻璃基板之製造方法中,較佳為,取得步驟係藉由電腦模擬求出成形體之形狀之時間變化,藉此取得形狀資料。 Furthermore, in the manufacturing method of the glass substrate of the present invention, it is preferable that the obtaining step is to obtain the time change of the shape of the molded body by computer simulation, thereby obtaining the shape data.
本發明之玻璃基板之製造方法能夠減小玻璃基板之板厚偏差。 The manufacturing method of the glass substrate of the present invention can reduce the thickness deviation of the glass substrate.
1‧‧‧玻璃基板製造裝置 1‧‧‧Glass substrate manufacturing equipment
2‧‧‧熔融玻璃 2‧‧‧Molten glass
3‧‧‧玻璃帶 3‧‧‧Glass ribbon
10‧‧‧熔解槽 10‧‧‧Melt Tank
20‧‧‧澄清管 20‧‧‧Clarification tube
30‧‧‧攪拌裝置 30‧‧‧Stirring device
40‧‧‧成形裝置 40‧‧‧Forming device
50a‧‧‧移送管 50a‧‧‧Transfer tube
50b‧‧‧移送管 50b‧‧‧Transfer tube
50c‧‧‧移送管 50c‧‧‧Transfer tube
60‧‧‧上部成形空間 60‧‧‧Upper forming space
62‧‧‧成形體 62‧‧‧Form
62a‧‧‧下端 62a‧‧‧Bottom
62b‧‧‧供給槽溝 62b‧‧‧Supply groove
62c‧‧‧上表面 62c‧‧‧Upper surface
64‧‧‧上部分隔構件 64‧‧‧Upper partition member
70‧‧‧下部成形空間 70‧‧‧Lower forming space
72‧‧‧冷卻輥 72‧‧‧Cooling Roll
74‧‧‧溫度調節單元 74‧‧‧Temperature control unit
74a‧‧‧中心部冷卻單元 74a‧‧‧Central cooling unit
74b‧‧‧側部冷卻單元 74b‧‧‧Side cooling unit
76‧‧‧下部分隔構件 76‧‧‧Lower partition member
80‧‧‧徐冷空間 80‧‧‧Xuleng Space
82a‧‧‧下拉輥(輥) 82a‧‧‧Down roller (roller)
82b‧‧‧下拉輥(輥) 82b‧‧‧Down roller (roller)
82c‧‧‧下拉輥(輥) 82c‧‧‧Down roller (roller)
82d‧‧‧下拉輥(輥) 82d‧‧‧Down roller (roller)
82e‧‧‧下拉輥(輥) 82e‧‧‧Down roller (roller)
82f‧‧‧下拉輥(輥) 82f‧‧‧Down roller (roller)
82g‧‧‧下拉輥(輥) 82g‧‧‧Down roller (roller)
84a‧‧‧加熱器 84a‧‧‧Heater
84b‧‧‧加熱器 84b‧‧‧Heater
84c‧‧‧加熱器 84c‧‧‧Heater
84d‧‧‧加熱器 84d‧‧‧Heater
84e‧‧‧加熱器 84e‧‧‧Heater
84f‧‧‧加熱器 84f‧‧‧heater
84g‧‧‧加熱器 84g‧‧‧Heater
86‧‧‧隔熱構件 86‧‧‧Insulation component
91‧‧‧控制裝置 91‧‧‧Control device
98‧‧‧切斷裝置 98‧‧‧Cutting device
172‧‧‧冷卻輥驅動馬達 172‧‧‧Cooling roller drive motor
182‧‧‧下拉輥驅動馬達 182‧‧‧Down roller drive motor
198‧‧‧切斷裝置驅動馬達 198‧‧‧Cutting device drive motor
S1‧‧‧步驟 S1‧‧‧Step
S2‧‧‧步驟 S2‧‧‧Step
S3‧‧‧步驟 S3‧‧‧Step
S4‧‧‧步驟 S4‧‧‧Step
S5‧‧‧步驟 S5‧‧‧Step
S6‧‧‧步驟 S6‧‧‧Step
L‧‧‧最大上表面移位量 L‧‧‧Maximum upper surface displacement
圖1係實施形態之玻璃基板之製造方法之流程圖。 Fig. 1 is a flow chart of the manufacturing method of the glass substrate of the embodiment.
圖2係玻璃基板之製造裝置之模式圖。 Fig. 2 is a schematic diagram of a manufacturing device of a glass substrate.
圖3係成形裝置之前視圖。 Figure 3 is a front view of the forming device.
圖4係成形裝置之側視圖。 Figure 4 is a side view of the forming device.
圖5係控制裝置之方塊圖。 Figure 5 is a block diagram of the control device.
圖6係藉由取得部取得之成形體之形狀資料之一例。 Fig. 6 is an example of the shape data of the formed body obtained by the obtaining unit.
圖7係成形體之應變速度之溫度依存變化之曲線之一例。 Fig. 7 is an example of the temperature-dependent change curve of the strain rate of the formed body.
圖8係成形體之應變速度之應力依存變化之曲線之一例。 Figure 8 is an example of the stress-dependent change curve of the strain rate of the formed body.
圖9係表示成形體之最大上表面移位量、與玻璃帶之搬送速度之間之關係之曲線圖。 Fig. 9 is a graph showing the relationship between the maximum displacement of the upper surface of the formed body and the conveying speed of the glass ribbon.
(1)玻璃基板之製造裝置之構成 (1) Composition of glass substrate manufacturing equipment
一面參照圖式,一面對本發明之玻璃基板之製造方法之實施形態進行說明。圖1係表示本實施形態之玻璃基板之製造方法之一例之流程圖。 With reference to the drawings, the embodiment of the manufacturing method of the glass substrate of the present invention will be described. Fig. 1 is a flowchart showing an example of a method of manufacturing a glass substrate of this embodiment.
如圖1所示,本實施形態之玻璃基板之製造方法主要包含熔解步驟S1、澄清步驟S2、攪拌步驟S3、成形步驟S4、冷卻步驟S5、及切斷步驟S6。 As shown in FIG. 1, the manufacturing method of the glass substrate of this embodiment mainly includes melting step S1, clarification step S2, stirring step S3, forming step S4, cooling step S5, and cutting step S6.
於熔解步驟S1中,加熱玻璃原料而獲得熔融玻璃。熔融玻璃貯存於熔解槽,以具有所需溫度之方式被通電加熱。對玻璃原料添加有澄清劑。自減輕環境負擔之觀點而言,使用SnO2作為澄清劑。 In the melting step S1, the glass raw material is heated to obtain molten glass. The molten glass is stored in the melting tank and is energized and heated to have the required temperature. A clarifying agent is added to the glass raw material. From the viewpoint of reducing the burden on the environment, SnO 2 is used as a clarifying agent.
於澄清步驟S2中,於熔解步驟S1中獲得之熔融玻璃於澄清管之內部流動而除去熔融玻璃所含之氣體,藉此使熔融玻璃澄清。首先,於澄清步驟S2中,使熔融玻璃之溫度上升。添加至熔融玻璃之澄清劑因升溫而引起還原反應,釋放氧氣。熔融玻璃所含之包含CO2、N2、SO2等氣體成分之泡,吸收因澄清劑之還原反應所產生之氧氣。吸收氧氣而成長之泡向熔融玻璃之液面浮上,破泡而被消除。被消除之泡所含之氣體向澄清管內部之氣相空間釋放,並被排出至外部大氣。然後,於澄清步驟S2中,降低熔融玻璃之溫度。藉此,已還原之澄清劑引起氧化反應,吸收熔融玻璃中殘留之氧氣等氣體成分。 In the clarification step S2, the molten glass obtained in the melting step S1 flows inside the clarification pipe to remove the gas contained in the molten glass, thereby clarifying the molten glass. First, in the clarification step S2, the temperature of the molten glass is increased. The clarifier added to the molten glass causes a reduction reaction due to the temperature rise, releasing oxygen. The bubbles containing CO 2 , N 2 , SO 2 and other gas components contained in the molten glass absorb the oxygen generated by the reduction reaction of the clarifier. The bubble that has grown by absorbing oxygen floats to the surface of the molten glass, breaks the bubble and is eliminated. The gas contained in the eliminated bubbles is released into the gas phase space inside the clarification tube and discharged to the outside atmosphere. Then, in the clarification step S2, the temperature of the molten glass is lowered. Thereby, the reduced clarifying agent causes an oxidation reaction and absorbs gas components such as oxygen remaining in the molten glass.
於攪拌步驟S3中,攪拌於澄清步驟S2中被除去氣體之熔融玻璃,使熔融玻璃之成分均質化。藉此,減少成為玻璃基板之紋理等之原因之熔融玻璃之組成不均。 In the stirring step S3, the molten glass degassed in the clarification step S2 is stirred to homogenize the components of the molten glass. Thereby, the uneven composition of molten glass, which causes the texture of the glass substrate, etc., is reduced.
於成形步驟S4中,使用溢流下拉法自於攪拌步驟S3中均質化之熔融玻璃連續地成形玻璃帶。 In the forming step S4, the glass ribbon is continuously formed from the molten glass homogenized in the stirring step S3 using the overflow down-draw method.
於冷卻步驟S5中,將於成形步驟S4中成形之玻璃帶一面朝下方搬送一面使其冷卻。於冷卻步驟S5中,以玻璃帶不產生應變及翹曲之方式,一面調節玻璃帶之溫度一面使玻璃帶逐漸冷卻。 In the cooling step S5, the glass ribbon formed in the forming step S4 is conveyed downward while being cooled. In the cooling step S5, the glass ribbon is gradually cooled while adjusting the temperature of the glass ribbon in such a way that the glass ribbon does not produce strain and warpage.
於切斷步驟S6中,將於冷卻步驟S5中冷卻之玻璃帶切斷為特定之尺寸,獲得玻璃基板。其後,進行玻璃基板之端面之研削及研磨、以及玻璃基板之洗淨。其後,檢查玻璃基板之損傷等缺陷之有無,並將檢查合格之玻璃基板捆包後作為製品出貨。 In the cutting step S6, the glass ribbon cooled in the cooling step S5 is cut into a specific size to obtain a glass substrate. After that, grinding and polishing of the end face of the glass substrate and cleaning of the glass substrate are performed. After that, the glass substrate is inspected for defects such as damage, and the glass substrates that pass the inspection are packaged and shipped as products.
圖2係表示本實施形態之玻璃基板製造裝置1之一例之模式圖。玻璃基板製造裝置1具備熔解槽10、澄清管20、攪拌裝置30、成形裝置40、及移送管50a、50b、50c。移送管50a將熔解槽10與澄清管20連接。移送管50b將澄清管20與攪拌裝置30連接。移送管50c將攪拌裝置30與成形裝置40連接。
FIG. 2 is a schematic diagram showing an example of the glass substrate manufacturing apparatus 1 of this embodiment. The glass substrate manufacturing apparatus 1 includes a
於熔解步驟S1中利用熔解槽10所得之熔融玻璃2係通過移送管50a而流入澄清管20。於澄清步驟S2中利用澄清管20澄清後之熔融玻璃2通過移送管50b而流入攪拌裝置30。於攪拌步驟S3中利用攪拌裝置30攪拌之熔融玻璃2通過移送管50c流入成形裝置40。於成形步驟S4中,藉由成形裝置40而自熔融玻璃2連續地成形玻璃帶3。於冷卻步驟S5中,將玻璃帶3一面朝下方搬送一面使其冷卻。於切斷步驟S6中,將冷卻後之玻璃帶3切斷成特定之大小而獲得玻璃基板。玻璃基板之寬度為例如500mm~3500mm,長度為例如500mm~3500mm。玻璃基板之厚度為例如0.2mm~0.8mm。
The
藉由玻璃基板製造裝置1而製造之玻璃基板尤其適用於液晶顯示器、電漿顯示器、有機EL顯示器等平板顯示器(FPD)用玻璃基板。作為FPD用玻璃基板,使用無鹼玻璃、含有微量鹼之玻璃、低溫多晶矽(LTPS)用玻璃、或氧化物半導體用玻璃。作為高精細顯示器用玻璃基板,使用高溫時具有較高之黏性及較高之應變點之玻璃。例如,成為高精細顯示器用玻璃基板之原料之玻璃於1500℃具有102.5poise之黏性。 The glass substrate manufactured by the glass substrate manufacturing apparatus 1 is particularly suitable for glass substrates for flat panel displays (FPD) such as liquid crystal displays, plasma displays, and organic EL displays. As the glass substrate for FPD, alkali-free glass, glass containing a small amount of alkali, glass for low temperature polysilicon (LTPS), or glass for oxide semiconductor is used. As a glass substrate for high-definition displays, glass with higher viscosity and higher strain point at high temperature is used. For example, glass used as a raw material for glass substrates for high-definition displays has a viscosity of 10 2.5 poise at 1500°C.
於熔解槽10中,玻璃原料被熔解而獲得熔融玻璃2。玻璃原料以能夠獲得具有所需組成之玻璃基板之方式進行製備。作為玻璃基板之組成之一例,適合作為FPD用玻璃基板之無鹼玻璃含有SiO2:50質量%~70質量%、Al2O3:10質量%~25質量%、B2O3:1質量%~18質量%、MgO:0質量%~10質量%、CaO:0質量%~20質量%、SrO:0質量%~20質量%、BaO:0質量%~10質量%。此處,MgO、CaO、SrO及BaO之含量之合計為5質量%~30質量%。
In the
又,作為FPD用玻璃基板,亦可使用微量含有鹼金屬之含微量鹼之玻璃。含微量鹼之玻璃含有0.1質量%~0.5質量%之R'2O,較佳為含有0.2質量%~0.5質量%之R'2O。此處,R'係選自Li、Na及K中之至少 1種。R'2O之含量之合計亦可為未達0.1質量%。 In addition, as a glass substrate for FPD, a trace alkali-containing glass containing a trace amount of alkali metal can also be used. Trace amounts of glass-containing base containing 0.1 mass% to 0.5 mass% of R '2 O, is preferably 0.2 mass% to 0.5 mass% of R' 2 O. Here, R'is at least one selected from Li, Na, and K. R '2 O of the total content may also be less than 0.1% by mass.
又,藉由玻璃基板製造裝置1製造之玻璃基板亦可進而含有SnO2:0.01質量%~1質量%(較佳為0.01質量%~0.5質量%)、Fe2O3:0質量%~0.2質量%(較佳為0.01質量%~0.08質量%)。再者,藉由玻璃基板製造裝置1製造之玻璃基板自減輕環境負擔之觀點而言,實質上不含As2O3、Sb2O3及PbO。 In addition, the glass substrate manufactured by the glass substrate manufacturing apparatus 1 may further contain SnO 2 : 0.01% by mass to 1% by mass (preferably 0.01% by mass to 0.5% by mass), Fe 2 O 3 : 0% by mass to 0.2 Mass% (preferably 0.01% by mass to 0.08% by mass). Furthermore, the glass substrate manufactured by the glass substrate manufacturing apparatus 1 does not substantially contain As 2 O 3 , Sb 2 O 3 and PbO from the viewpoint of reducing the burden on the environment.
以具有上述組成之方式製備之玻璃原料係使用原料投入機(未圖示)而被投入至熔解槽10。原料投入機可使用螺旋送料器進行玻璃原料之投入,亦可使用鏟鬥進行玻璃原料之投入。於熔解槽10,玻璃原料被加熱至與其組成等相應之溫度而熔解。於熔解槽10,獲得例如1500℃~1600℃之高溫之熔融玻璃2。於熔解槽10,可藉由對由鉬、鉑或氧化錫等成形之至少1對電極間流通電流,而將電極間之熔融玻璃2通電加熱,又,亦可除了通電加熱外還藉由燃燒器之火焰輔助加熱玻璃原料。
The glass raw material prepared to have the above-mentioned composition is charged into the
於熔解槽10所得之熔融玻璃2自熔解槽10通過移送管50a而流入澄清管20。澄清管20及移送管50a、50b、50c係鉑製或鉑合金製之管。於澄清管20與熔解槽10同樣地設置有加熱機構。於澄清管20,使熔融玻璃2進一步升溫而澄清。例如,於澄清管20,使熔融玻璃2之溫度上升至1500℃~1700℃。
The
於澄清管20澄清之熔融玻璃2自澄清管20通過移送管50b而流入攪拌裝置30。熔融玻璃2於通過移送管50b時被冷卻。於攪拌裝置30,以較通過澄清管20之熔融玻璃2之溫度低之溫度,攪拌熔融玻璃2。例如,於攪拌裝置30,熔融玻璃2之溫度為1250℃~1450℃,熔融玻璃2之黏度為500poise~1300poise。熔融玻璃2於攪拌裝置30被攪拌而均質化。
The
於攪拌裝置30經均質化之熔融玻璃2自攪拌裝置30通過移送管50c
而流入成形裝置40。熔融玻璃2通過移送管50c時,以具有適於熔融玻璃2之成形之黏度之方式被冷卻。例如,熔融玻璃2冷卻至1200℃左右。
The
於成形裝置40,藉由溢流下拉法而自熔融玻璃2成形玻璃帶3。其次,對成形裝置40之詳細構成及動作進行說明。
In the forming
(2)成形裝置之構成 (2) The composition of the forming device
圖3係成形裝置40之前視圖。圖3表示沿著與成形裝置40成形之玻璃帶3之表面垂直之方向觀察之成形裝置40。圖4係成形裝置40之側視圖。圖4表示沿著與成形裝置40成形之玻璃帶3之表面平行之方向觀察之成形裝置40。
FIG. 3 is a front view of the forming
成形裝置40具有由包含耐火磚等耐火物之爐壁(未圖示)圍住之空間。該空間係供自熔融玻璃2成形玻璃帶3並冷卻玻璃帶3之空間。該空間係由上部成形空間60、下部成形空間70及徐冷空間80之3個空間構成。
The forming
成形步驟S4係於上部成形空間60進行。冷卻步驟S5係於下部成形空間70及徐冷空間80進行。上部成形空間60係供自攪拌裝置30經由移送管50c供給至成形裝置40之熔融玻璃2成形為玻璃帶3之空間。下部成形空間70係上部成形空間60之下方之空間,且係供玻璃帶3急冷至玻璃之徐冷點左右之空間。徐冷空間80係下部成形空間70之下方之空間,且係供玻璃帶3逐漸冷卻之空間。
The forming step S4 is performed in the upper forming
成形裝置40主要包括成形體62、上部分隔構件64、冷卻輥72、溫度調節單元74、下部分隔構件76、下拉輥82a~82g、加熱器84a~84g、隔熱構件86、切斷裝置98、及控制裝置91。其次,對成形裝置40之各構成元件進行說明。
The forming
(2-1)成形體 (2-1) Formed body
成形體62設置於上部成形空間60。成形體62用於使熔融玻璃2溢
流而成形玻璃帶3。如圖4所示,成形體62具有類似楔形之五邊形之剖面形狀。成形體62之剖面形狀之尖端相當於成形體62之下端62a。成形體62為耐火磚製。
The molded
於成形體62之上表面62c沿著成形體62之長邊方向而形成有供給槽溝62b。於成形體62之長邊方向之端部安裝有與供給槽溝62b連通之移送管50c。供給槽溝62b係形成為自與移送管50c連通之一端部朝向另一端部而逐漸變淺。
A
自攪拌裝置30送至成形裝置40之熔融玻璃2經由移送管50c而流入成形體62之供給槽溝62b。自成形體62之供給槽溝62b溢流之熔融玻璃2一面經過成形體62之兩側面一面流下,並於成形體62之下端62a附近合流。合流後之熔融玻璃2因重力朝鉛垂方向落下,而成形為板狀。藉此,於成形體62之下端62a附近,連續地形成玻璃帶3。成形之玻璃帶3於上部成形空間60流下後,一面於下部成形空間70及徐冷空間80被冷卻一面朝下方被搬送。於上部成形空間60剛成形後之玻璃帶3之溫度為1100℃以上,黏度為25000poise~350000poise。例如,於製造高精細顯示器用玻璃基板之情形時,由成形體62成形之玻璃帶3之應變點為655℃~750℃,較佳為680℃~730℃,於成形體62之下端62a附近融合之熔融玻璃2之黏度為25000poise~100000poise,較佳為32000poise~80000poise。
The
(2-2)上部分隔構件 (2-2) Upper partition member
上部分隔構件64係設置於成形體62之下端62a附近之一對板狀之隔熱構件。如圖4所示,上部分隔構件64配置於玻璃帶3之厚度方向之兩側。上部分隔構件64分隔上部成形空間60與下部成形空間70,抑制熱自上部成形空間60向下部成形空間70之移動。
The
(2-3)冷卻輥 (2-3) Cooling roll
冷卻輥72係設置於下部成形空間70之懸臂輥。冷卻輥72設置於
上部分隔構件64之正下方。如圖3所示,冷卻輥72配置於玻璃帶3之寬度方向之兩側部。如圖4所示,冷卻輥72配置於玻璃帶3之厚度方向之兩側。玻璃帶3於其寬度方向之兩側部被冷卻輥72夾持。冷卻輥72將自上部成形空間60送來之玻璃帶3冷卻。
The
於下部成形空間70,玻璃帶3之寬度方向之兩側部分別被2對冷卻輥72夾持。藉由使冷卻輥72朝玻璃帶3之兩側部之表面按壓,冷卻輥72與玻璃帶3之接觸面積變大,有效率地利用冷卻輥72冷卻玻璃帶3。冷卻輥72對玻璃帶3施加與由後述下拉輥82a~82g將玻璃帶3朝下方拉伸之力相對抗之力。再者,根據冷卻輥72之旋轉速度、及配置於最上方之下拉輥82a之旋轉速度之差,而決定玻璃帶3之厚度。
In the lower forming
冷卻輥72於內部具有空冷管。冷卻輥72藉由空冷管而一直被冷卻。冷卻輥72藉由夾持玻璃帶3之寬度方向之兩側部而與玻璃帶3接觸。藉此,熱自玻璃帶3傳遞至冷卻輥72,故而玻璃帶3之寬度方向之兩側部被冷卻。與冷卻輥72接觸而冷卻之玻璃帶3之寬度方向之兩側部之黏度為例如109.0poise以上。
The cooling
冷卻輥72與玻璃帶3之間之接觸荷重可藉由控制裝置91而控制。接觸荷重係藉由例如使用彈簧調整冷卻輥72之位置而進行控制。接觸荷重越大,則冷卻輥72按壓玻璃帶3之力越強。
The contact load between the cooling
(2-4)溫度調節單元 (2-4) Temperature adjustment unit
溫度調節單元74設置於下部成形空間70。溫度調節單元74設置於上部分隔構件64之下方、且下部分隔構件76之上方。
The
於下部成形空間70,玻璃帶3被冷卻至玻璃帶3之寬度方向之中心部之溫度降低至徐冷點左右。溫度調節單元74對下部成形空間70內被冷卻之玻璃帶3之溫度進行調節。溫度調節單元74係加熱或冷卻玻璃帶3之單元。如圖3所示,溫度調節單元74包括中心部冷卻單元74a及側部冷卻單元74b。中心部冷卻單元74a對玻璃帶3之寬度方向之中
心部之溫度進行調節。側部冷卻單元74b對玻璃帶3之寬度方向之兩側部之溫度進行調節。此處,玻璃帶3之寬度方向之中心部係指被玻璃帶3之寬度方向之兩側部夾著之區域。
In the lower forming
於下部成形空間70,如圖3所示,複數個中心部冷卻單元74a及複數個側部冷卻單元74b分別沿著玻璃帶3流下之方向即鉛垂方向而配置。中心部冷卻單元74a係以與玻璃帶3之寬度方向之中心部之表面對向之方式配置。側部冷卻單元74b係以與玻璃帶3之寬度方向之兩側部之表面對向之方式配置。
In the lower forming
溫度調節單元74被控制裝置91控制。各中心部冷卻單元74a及各側部冷卻單元74b可藉由控制裝置91獨立地控制。
The
(2-5)下部分隔構件 (2-5) Lower partition member
下部分隔構件76係設置於溫度調節單元74之下方之一對板狀之隔熱構件。如圖4所示,下部分隔構件76設置於玻璃帶3之厚度方向之兩側。下部分隔構件76於鉛垂方向分隔下部成形空間70及徐冷空間80,抑制熱自下部成形空間70向徐冷空間80之移動。
The
(2-6)下拉輥 (2-6) Pull down roller
下拉輥82a~82g係設置於徐冷空間80之懸臂輥。於徐冷空間80,下拉輥82a、下拉輥82b、……、下拉輥82f及下拉輥82g係自上方朝下方隔開間隔地配置。下拉輥82a配置於最上方,下拉輥82g配置於最下方。
The pull-down
如圖3所示,下拉輥82a~82g分別配置於玻璃帶3之寬度方向之兩側部。如圖4所示,下拉輥82a~82g分別配置於玻璃帶3之厚度方向之兩側。即,玻璃帶3之寬度方向之兩側部自上方朝下方被2對下拉輥82a、2對下拉輥82b、……、2對下拉輥82f及2對下拉輥82g夾持。
As shown in FIG. 3, the pull-down
下拉輥82a~82g一面夾持通過下部成形空間70後之玻璃帶3之寬度方向之兩端部一面旋轉,藉此朝鉛垂方向下方下拉玻璃帶3。即,
下拉輥82a~82g係用於向下方搬送玻璃帶3之輥。
The pull-down
各下拉輥82a~82g之角速度可藉由控制裝置91獨立控制。下拉輥82a~82g之角速度越大,則玻璃帶3朝下方搬送之速度越大。
The angular velocity of each pull-down
(2-7)加熱器 (2-7) Heater
加熱器84a~84g設置於徐冷空間80。如圖4所示,於徐冷空間80,加熱器84a、加熱器84b、……、加熱器84f及加熱器84g自上方朝下方隔開間隔而配置。加熱器84a~84g分別配置於玻璃帶3之厚度方向之兩側。下拉輥82a~82g分別配置於加熱器84a~84g與玻璃帶3之間。
The
加熱器84a~84g朝玻璃帶3之表面輻射熱而加熱玻璃帶3。藉由使用加熱器84a~84g,可於徐冷空間80調節朝下方搬送之玻璃帶3之溫度。藉此,加熱器84a~84g可於玻璃帶3之搬送方向對玻璃帶3形成特定之溫度分佈。
The
各加熱器84a~84g之輸出可藉由控制裝置91獨立地控制。又,加熱器84a~84g亦可沿著玻璃帶3之寬度方向被分割成複數個加熱器子單元(未圖示),各加熱器子單元之輸出可藉由控制裝置91獨立地控制。該情形時,各加熱器84a~84g根據玻璃帶3之寬度方向之位置而改變發熱量,藉此可於玻璃帶3之寬度方向形成特定之溫度分佈。
The output of each
再者,於各加熱器84a~84g附近,設置有測定徐冷空間80之氛圍溫度之熱電偶(未圖示)。熱電偶測定例如玻璃帶3之寬度方向之中心部附近之氛圍溫度、及兩側部附近之氛圍溫度。加熱器84a~84g亦可基於由熱電偶測定之徐冷空間80之氛圍溫度被控制。
Furthermore, near each
(2-8)隔熱構件 (2-8) Thermal insulation components
隔熱構件86設置於徐冷空間80。隔熱構件86設置於沿著玻璃帶3之搬送方向相鄰之2個下拉輥82a~82g之間之高度位置。如圖4所示,隔熱構件86係於玻璃帶3之厚度方向之兩側水平配置之一對隔熱板。
隔熱構件86於鉛垂方向分隔徐冷空間80,抑制徐冷空間80之鉛垂方向之熱移動。
The
隔熱構件86係以不與朝下方搬送之玻璃帶3接觸之方式設置。又,隔熱構件86係以能夠調整與玻璃帶3之表面之距離之方式設置。藉此,隔熱構件86抑制隔熱構件86之上方之空間與隔熱構件86之下方之空間之間之熱移動。
The
(2-9)切斷裝置 (2-9) Cutting device
切斷裝置98設置於徐冷空間80之下方之空間。切斷裝置98將通過徐冷空間80後之玻璃帶3按特定尺寸沿著玻璃帶3之寬度方向進行切斷。通過徐冷空間80後之玻璃帶3係被冷卻至室溫左右之平坦之玻璃帶3。
The cutting
切斷裝置98以特定之時間間隔切斷玻璃帶3。藉此,於玻璃帶3之搬送速度固定之情形時,量產具有接近最終製品之尺寸之玻璃基板。
The cutting
(2-10)控制裝置 (2-10) Control device
控制裝置91係主要包含CPU、RAM、ROM及硬碟等之電腦。圖5係控制裝置91之方塊圖。如圖5所示,控制裝置91連接冷卻輥驅動馬達172、溫度調節單元74、下拉輥驅動馬達182、加熱器84a~84g及切斷裝置驅動馬達198。冷卻輥驅動馬達172係用於控制冷卻輥72之位置及旋轉速度等之馬達。下拉輥驅動馬達182係用於獨立地控制各下拉輥82a~82g之位置及旋轉速度等之馬達。切斷裝置驅動馬達198係用於控制切斷裝置98切斷玻璃帶3之時間間隔等之馬達。控制裝置91取得各構成元件之狀態,且記憶用於控制各構成元件之程式。
The
控制裝置91可控制冷卻輥驅動馬達172,取得並調節夾持玻璃帶3之寬度方向之側部之一對冷卻輥72與玻璃帶3之間之接觸荷重。控制裝置91可控制下拉輥驅動馬達182取得旋轉之各下拉輥82a~82g之扭
矩,而調節各下拉輥82a~82g之角速度。控制裝置91可取得並調節溫度調節單元74之輸出、及各加熱器84a~84g之輸出。控制裝置91可控制切斷裝置驅動馬達198,取得並調節切斷裝置98切斷玻璃帶3之時間間隔等。
The
(3)成形裝置之動作 (3) Action of forming device
於上部成形空間60,自攪拌裝置30經由移送管50c而送至成形裝置40之熔融玻璃2,被供給至形成於成形體62之上表面62c之供給槽溝62b。自成形體62之供給槽溝62b溢流之熔融玻璃2經過成形體62之兩側面流下,並於成形體62之下端62a附近合流。於成形體62之下端62a附近,自合流之熔融玻璃2連續地成形玻璃帶3。成形之玻璃帶3被送至下部成形空間70。
In the upper forming
於下部成形空間70,玻璃帶3之寬度方向之兩側部與冷卻輥72接觸而被急冷。又,藉由溫度調節單元74調節玻璃帶3之溫度,使玻璃帶3之寬度方向中心部之溫度降低至徐冷點。藉由冷卻輥72一面朝下方被搬送一面冷卻之玻璃帶3被送至徐冷空間80。
In the lower forming
於徐冷空間80,玻璃帶3一面被下拉輥82a~82g下拉一面逐漸冷卻。玻璃帶3之溫度係以沿著玻璃帶3之寬度方向形成特定之溫度分佈之方式被加熱器84a~84g控制。於徐冷空間80,玻璃帶3之溫度係自徐冷點左右起,逐漸降低至與較應變點低200℃之溫度相比低之溫度。
In the Xu
通過徐冷空間80後之玻璃帶3進而冷卻至室溫左右,藉由切斷裝置98切斷成特定尺寸而獲得玻璃基板。其後,進行玻璃基板之端面之研磨及洗淨等。其後,將特定檢查合格之玻璃基板捆包而作為製品出貨。
The glass ribbon 3 after passing through the
(4)控制裝置之動作 (4) Action of control device
控制裝置91至少記憶包含搬送部、取得部及算出部之3個程式並
予以執行。
The
搬送部使用設置於成形體62下方之下拉輥82a~82g,將藉由成形體62成形之玻璃帶3於徐冷空間80以特定之搬送速度朝下方搬送。搬送部控制下拉輥驅動馬達182,調節各下拉輥82a~82g之旋轉速度,藉此調節玻璃帶3之搬送速度。
The conveying part uses pull-down
取得部取得與成形體62之當前形狀相關之形狀資料。具體而言,取得部基於潛變特性參數取得形狀資料。潛變特性參數係用於再現施加至成形體62之應力、成形體62之溫度、及潛變變形所致之成形體62之應變速度之間之關係之參數。此處,施加至成形體62之應力係沿著成形體62之長邊方向將成形體62壓縮之力。又,成形體62之應變速度假設為不依存於時間而固定。其次,對潛變特性參數之決定方法進行說明。
The acquiring unit acquires shape data related to the current shape of the molded
首先,測定施加至成形體62之應力為固定之條件下,成形體62之應變速度之成形體62之溫度依存變化。圖7係成形體62之應變速度之溫度依存變化之曲線之一例。圖7中,施加至成形體62之應力之大小為2.0MPa。成形體62之應變速度係藉由測定例如成形體62之4點彎曲試驗之成形體62之形狀之變化量而算出。圖7中,以黑圓表示成形體62之應變速度之測定值。
First, the temperature-dependent change of the strain rate of the formed
然後,測定成形體62之溫度為固定之條件下,成形體62之應變速度之施加至成形體62之應力依存變化。圖8係成形體62之應變速度之應力依存變化之曲線之一例。圖8中,成形體62之溫度為1250℃。成形體62之應變速度係藉由測定例如雷射測定之成形體62之形狀之變化量而算出。圖8中,以黑圓表示成形體62之應變速度之測定值。
Then, under the condition that the temperature of the formed
然後,基於以下之式(1),決定能夠再現成形體62之應變速度之溫度依存變化及應力依存變化之測定值之潛變特性參數A、B、n。
Then, based on the following equation (1), the creep characteristic parameters A, B, and n that can reproduce the measured values of the temperature-dependent change and the stress-dependent change of the strain rate of the molded
[數1]
於式(1)中,R為8.314[J/mol‧K],△H為4.500×105[J/mol],ε'為成形體62之應變速度[/hour],σ為施加至成形體62之應力[Pa],T為成形體62之溫度[K]。潛變特性參數A[/hour]、B[/Pa]及n係以藉由式(1)求出之應變速度匹配應變速度之測定值之方式決定。圖7及圖8中,基於決定之潛變特性參數而自式(1)算出之成形體62之應變速度係以空白四邊形表示。再者,圖7及圖8中使用之潛變特性參數A、B、n分別為8.648×1012[/hour]、4.491×10-9[/Pa]、9.987×10-1。
In the formula (1), R is 8.314[J/mol‧K], △H is 4.500×10 5 [J/mol], ε'is the strain rate of the formed body 62 [/hour], and σ is the application to the forming The stress [Pa] of the
再者,取得部亦可於決定潛變特性參數後,驗證潛變特性參數。潛變特性參數之驗證係以如下方式進行:例如將成形體62之應變速度之測定系統模型化,藉由電腦模擬而確認是否獲得基於決定之潛變特性參數之應變速度。
Furthermore, the acquiring unit may also verify the creep characteristic parameters after determining the creep characteristic parameters. The verification of the creep characteristic parameters is carried out in the following manner: for example, the measurement system of the strain rate of the formed
然後,取得部藉由電腦模擬,使用所決定之潛變特性參數算出特定溫度及應力下之成形體62之應變速度,並求出成形體62之形狀之時間變化,藉此取得成形體62之形狀資料。
Then, the acquisition unit uses the determined creep characteristic parameters to calculate the strain rate of the formed
圖6係藉由取得部取得之成形體62之形狀資料之一例。圖6係表示沿著與藉由成形體62成形之玻璃帶3之表面垂直之方向觀察之成形體62。於圖6中,成形體62之潛變變形較實際醒目地示出。於圖6中,以虛線示出未使用之成形體62之形狀、即潛變變形前之成形體62之形狀,且以實線示出潛變變形後之成形體62之當前形狀。
FIG. 6 is an example of the shape data of the formed
取得部自基於成形體62之潛變變形之形狀資料,至少取得作為成形體62之上表面62c之鉛垂方向之移位量之上表面移位量。於圖6中,上表面移位量係潛變變形前之上表面62c與潛變變形後之上表面
62c之間之鉛垂方向之尺寸。圖6中,示出有成形體62之長邊方向之上表面移位量之最大值即最大上表面移位量L。
The acquiring unit acquires at least the upper surface displacement amount as the displacement amount of the
算出部基於藉由取得部取得之成形體62之形狀資料,以玻璃帶3之寬度方向之板厚偏差變小之方式算出徐冷空間80內之玻璃帶3之搬送速度。玻璃帶3之寬度方向之板厚偏差越小,玻璃帶3之厚度於寬度方向越均勻。具體而言,算出部係最大上表面移位量L越大,則算出越大之值作為玻璃帶3之搬送速度。
The calculation part calculates the conveyance speed of the glass ribbon 3 in the
又,搬送部基於藉由算出部算出之玻璃帶3之搬送速度,調節各下拉輥82a~82g之旋轉速度。藉此,搬送部將玻璃帶3之搬送速度調節為藉由算出部算出之值。
Moreover, the conveyance part adjusts the rotation speed of each pull-down
控制裝置91藉由搬送部、取得部及算出部可減小於徐冷空間80朝下方搬送之玻璃帶3之寬度方向之板厚偏差。
The
(5)特徵 (5) Features
於本實施形態中,成形體62係設置於上部成形空間60之高溫之氛圍下。於玻璃帶3之成形步驟中,對成形體62施加有成形體62之重量、及供給至供給槽溝62b之熔融玻璃2之重量所致之荷重。因此,因玻璃基板製造裝置1之長年運轉,如圖6所示,成形體62因成形體62之材質之熱潛變特性而逐漸地潛變變形。尤其是,成形體62之長邊方向之中央部容易因潛變變形而朝下方垂下。圖6中,最大上表面移位量L係成形體62之長邊方向之中央部之上表面移位量。
In this embodiment, the formed
若成形體62如圖6所示潛變變形,則自成形體62之長邊方向之中央部溢出之熔融玻璃2之量多於自成形體62之長邊方向之兩端部溢出之熔融玻璃2之量。該情形時,藉由成形體62成形之玻璃帶3之寬度方向中央部之厚度增加,玻璃帶3之寬度方向中央部之厚度變得大於寬度方向兩端部之厚度。其結果,有玻璃帶3之寬度方向之板厚偏差變大,作為最終製品之玻璃基板之板厚偏差增加之虞。
If the molded
本實施形態之玻璃基板製造裝置1藉由調節各下拉輥82a~82g之旋轉速度,而調節徐冷空間80內之玻璃帶3之搬送速度,從而可減小起因於成形體62之潛變變形之玻璃帶3之寬度方向之板厚偏差。其次,對其機構進行說明。
The glass substrate manufacturing apparatus 1 of this embodiment adjusts the rotation speed of the pull-down
首先,玻璃基板製造裝置1之控制裝置91之取得部如圖6所示,取得與潛變變形之成形體62之當前形狀相關之形狀資料。然後,控制裝置91之算出部基於取得部所取得之成形體62之形狀資料,算出使徐冷空間80內朝下方搬送之玻璃帶3之寬度方向之板厚偏差變得最小之玻璃帶3之搬送速度。具體而言,算出部基於圖6所示之最大上表面移位量L,算出玻璃帶3之搬送速度。然後,控制裝置91之搬送部以實現由算出部所算出之搬送速度之方式,調節各下拉輥82a~82g之旋轉速度。藉此,控制裝置91基於潛變變形之成形體62之形狀資料,調節徐冷空間80之玻璃帶3之搬送速度。圖9係表示潛變變形之成形體62之最大上表面移位量L、與玻璃帶3之搬送速度之間之關係之曲線圖。如圖9所示,控制裝置91係成形體62之最大上表面移位量L越大,越增加各下拉輥82a~82g之旋轉速度地,調節玻璃帶3之搬送速度。成形體62之最大上表面移位量L、與玻璃帶3之搬送速度之間存在相關關係(線性關係)。
First, as shown in FIG. 6, the acquisition part of the
其次,對潛變變形之成形體62之最大上表面移位量L越大,則算出部所算出之搬送速度越大之理由進行說明。如上所述,具有最大上表面移位量L越大,則玻璃帶3之寬度方向中央部之厚度較寬度方向兩端部之厚度越大之傾向。該情形時,若提高各下拉輥82a~82g之旋轉速度,而增大徐冷空間80內之玻璃帶3之搬送速度,則徐冷空間80內之玻璃帶3之冷卻速度上升,鉛垂方向(玻璃帶3之流下方向)之玻璃帶3之收縮量亦上升。於寬度方向上之厚度最大之部分、即玻璃帶3之寬度方向中央部,玻璃帶3之收縮量最大。因玻璃帶3之寬度方向中央部
之鉛垂方向之收縮,自玻璃帶3之寬度方向中央部朝寬度方向兩端部而作用有寬度方向之張力。其結果,玻璃帶3之寬度方向兩端部之厚度變大,玻璃帶3之寬度方向中央部之厚度與寬度方向兩端部之厚度之差變小。
Next, the reason why the larger the maximum upper surface displacement amount L of the creep-deformed molded
因此,於因成形體62之潛變變形而成形體62之長邊方向之中央部朝下方垂下而撓曲之情形時,藉由增大徐冷空間80之玻璃帶3之搬送速度,可減小玻璃帶3之寬度方向之板厚偏差。其結果,玻璃基板製造裝置1可減小作為最終製品之玻璃基板之板厚偏差。
Therefore, when the center of the longitudinal direction of the molded
又,於使用液相溫度較高之玻璃、及應變點較高之玻璃之玻璃基板之製造步驟中,成形體62之潛變變形因成形體62之溫度容易變高而尤其容易成為問題。又,近年來,隨著玻璃基板之大型化,成形體之長邊方向之尺寸不斷變長,故而潛變變形所致之成形體62之撓曲有變得顯著之傾向。於本實施形態中,藉由調節各下拉輥82a~82g之旋轉速度,而調節徐冷空間80內之玻璃帶3之搬送速度,可有效地減小起因於成形體62之潛變變形之玻璃帶3之寬度方向之板厚偏差。
In addition, in the manufacturing process of a glass substrate using glass with a higher liquidus temperature and glass with a higher strain point, the creep deformation of the molded
(6)變化例 (6) Variations
(6-1)變化例A (6-1) Variation A
於實施形態中,玻璃基板製造裝置1之控制裝置91之取得部係藉由電腦模擬求出成形體62之形狀之時間變化,藉此取得與成形體62之當前形狀相關之形狀資料。但是,取得部亦可藉由其他方法取得與成形體62之當前形狀相關之形狀資料。
In the embodiment, the acquisition unit of the
例如,取得部亦可基於成形體62之形狀之實測值而取得形狀資料。該情形時,需要預先收集與成形體62之形狀之實測值相關之資料、及與成形體62之使用條件相關之資料並進行分析。成形體62之使用條件係玻璃基板製造裝置1之運轉時間、熔融玻璃2之溫度、熔融玻璃2之黏度、及上部成形空間60之溫度等與成形體62關聯之各種參
數。取得部基於成形體62之形狀之實測值相關之資料、與成形體62之使用條件相關之資料之相關關係,預測並取得當前使用之成形體62之形狀資料。
For example, the acquiring unit may also acquire shape data based on actual measured values of the shape of the molded
又,取得部亦可基於藉由成形體62成形之玻璃帶3之板厚之實測值而取得形狀資料。該情形時,取得部基於與玻璃帶3之寬度方向之板厚之實測值相關之資料,預測並取得當前使用之成形體62之形狀資料。
Moreover, the acquisition part may acquire shape data based on the actual measured value of the plate thickness of the glass ribbon 3 molded by the molded
(6-2)變化例B (6-2) Variation B
於實施形態中,玻璃基板製造裝置1之控制裝置91調節各下拉輥82a~82g之旋轉速度,而調節徐冷空間80內之玻璃帶3之搬送速度。但是,控制裝置91亦可調節各下拉輥82a~82g之旋轉速度,並且調節供給至成形體62之供給槽溝62b之熔融玻璃2之量。
In the embodiment, the
若提高徐冷空間80內之玻璃帶3之搬送速度,則藉由成形體62成形之玻璃帶3之厚度變小。另一方面,若增加供給至成形體62之供給槽溝62b之熔融玻璃2之量,則藉由成形體62成形之玻璃帶3之厚度變大。因此,控制裝置91提高各下拉輥82a~82g之旋轉速度,並且增加供給至成形體62之供給槽溝62b之熔融玻璃2之量,藉此可一面維持藉由成形體62成形之玻璃帶3之厚度,一面抑制起因於成形體62之潛變變形之玻璃帶3之寬度方向之板厚偏差之增加。
If the conveying speed of the glass ribbon 3 in the
(6-3)變化例C (6-3) Variation C
於實施形態中,玻璃基板製造裝置1之控制裝置91之算出部係使用圖6所示之最大上表面移位量L作為成形體62之形狀資料,最大上表面移位量L越大,則算出越大之值作為玻璃帶3之搬送速度。但是,算出部亦可使用與成形體62之形狀資料相關之其他參數,算出玻璃帶3之搬送速度。
In the embodiment, the calculation unit of the
例如,算出部亦可作為與成形體62之形狀資料相關之參數,基
於沿著與玻璃帶3之表面垂直之方向觀察時之成形體62之上表面62c或下端62a之曲率,算出玻璃帶3之搬送速度。例如,算出部由於成形體62之上表面62c或下端62a之曲率越大,則潛變變形所致之成形體62之撓曲量越大,故而算出越大之值作為玻璃帶3之搬送速度。
For example, the calculation part can also be used as a parameter related to the shape data of the formed
[先前技術文獻] [Prior Technical Literature]
[專利文獻]美國專利第3,338,696號 [Patent Document] US Patent No. 3,338,696
62‧‧‧成形體 62‧‧‧Form
62a‧‧‧下端 62a‧‧‧Bottom
62c‧‧‧上表面 62c‧‧‧Upper surface
L‧‧‧最大上表面移位量 L‧‧‧Maximum upper surface displacement
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CN110963675B (en) * | 2019-09-29 | 2022-06-07 | 彩虹显示器件股份有限公司 | Method for controlling forming thickness of overflow brick thin plate |
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Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2009519884A (en) * | 2005-12-15 | 2009-05-21 | ブルース テクノロジー エルエルシー | Overflow downdraw glass forming method and apparatus |
CN102933514A (en) * | 2011-03-30 | 2013-02-13 | 安瀚视特控股株式会社 | Production method for glass sheet and glass sheet production device |
CN103183464A (en) * | 2011-03-30 | 2013-07-03 | 安瀚视特控股株式会社 | Production method for glass sheet and glass sheet production device |
CN104470862A (en) * | 2012-02-29 | 2015-03-25 | 康宁股份有限公司 | Glass manufacturing apparatus and methods |
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---|---|---|---|---|
JP2009519884A (en) * | 2005-12-15 | 2009-05-21 | ブルース テクノロジー エルエルシー | Overflow downdraw glass forming method and apparatus |
CN102933514A (en) * | 2011-03-30 | 2013-02-13 | 安瀚视特控股株式会社 | Production method for glass sheet and glass sheet production device |
CN103183464A (en) * | 2011-03-30 | 2013-07-03 | 安瀚视特控股株式会社 | Production method for glass sheet and glass sheet production device |
CN104470862A (en) * | 2012-02-29 | 2015-03-25 | 康宁股份有限公司 | Glass manufacturing apparatus and methods |
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