TWI703954B - Spinal interbody implant device with integral spinal stress guidance and dispersion - Google Patents

Spinal interbody implant device with integral spinal stress guidance and dispersion Download PDF

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TWI703954B
TWI703954B TW108118868A TW108118868A TWI703954B TW I703954 B TWI703954 B TW I703954B TW 108118868 A TW108118868 A TW 108118868A TW 108118868 A TW108118868 A TW 108118868A TW I703954 B TWI703954 B TW I703954B
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ribs
vertebral body
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spine
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TW202042754A (en
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曾昌和
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曾昌和
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Abstract

一種具整體性脊椎應力引導及分散之脊椎椎體間植入物裝置,其特徵在於:該裝置被植入至一人體椎間盤位置,該裝置為一近似方型立體之一減震緩衝支架,具有四邊各一邊柱,該等邊柱又分別以一或複數個肋柱之一端相連結,及該等肋柱之另一端則共同連接一力引導件,形成該等邊柱在外圍,以該等肋柱連接,該力引導件為位於整體中間,該力引導件未與該等邊柱直接連接,而是藉由該等肋柱間接連接;該等脊椎椎體,分別或同時對該等邊柱施加各種力,該等邊柱則因連接該等肋柱,該等肋柱又共同連接該力引導件,使得該等邊柱所接受之該等脊椎椎體之各種力,經由該等肋柱平均分散傳導至該力引導件,及該力引導件又將該各種力,經由其他該等肋柱,平均分散傳導至其他該等邊柱,以及該減震緩衝支架因承受前述各種力而以產生整體性微變形方式,將相對應力緩衝分散及抵銷前述之該各種力量。 A spinal intervertebral implant device with integral spinal stress guidance and dispersion, which is characterized in that the device is implanted in a position of a human intervertebral disc, and the device is a shock-absorbing and buffering bracket of approximately square three-dimensional shape, with Each of the four sides has one side post, and the side posts are respectively connected by one end of one or more ribs, and the other end of the ribs is connected together with a force guide to form the side posts on the periphery. The ribs are connected, and the force guide is located in the middle of the whole. The force guide is not directly connected with the side columns, but indirectly connected by the ribs; the vertebral bodies are respectively or simultaneously connected to the sides The columns exert various forces, and the side columns are connected to the ribs, and the ribs are connected to the force guide together, so that the various forces of the vertebral bodies received by the side columns pass through the ribs. The column is evenly distributed and transmitted to the force guide, and the force guide transmits the various forces to the other side columns evenly through the other ribs, and the shock-absorbing and cushioning bracket is subjected to the aforementioned various forces. In order to generate the overall micro-deformation, the relative stress is buffered and dispersed and the aforementioned various forces are offset.

Description

一種具整體性脊椎應力引導及分散之脊椎椎體間植入物裝 置 A spinal interbody implant device with integral spinal stress guidance and dispersion Set

本發明係關於一種具整體性脊椎應力引導及分散之脊椎椎體間植入物裝置,其特徵在於:具該等邊柱所接受之該等脊椎椎體之各種力,經由連接之該等肋柱平均分散傳導至該力引導件,及該力引導件又將該各種力,經由其他該等肋柱,平均分散傳導至其他該等邊柱,以及該減震緩衝支架因承受前述各種力,因材質彈性及形狀設計而以產生整體性微變形方式,將相對應力緩衝分散及抵銷前述之該各種力之脊椎椎體間植入物裝置。 The present invention relates to a spinal interbody implant device with integral spinal stress guidance and dispersion. It is characterized in that it has various forces of the spinal vertebrae received by the side columns through the connected ribs. The column is evenly distributed and transmitted to the force guide, and the force guide is evenly distributed and transmitted to the other side columns through the other ribs, and the shock-absorbing and buffering bracket bears the aforementioned various forces, Due to the elasticity of the material and the design of the shape, an integral micro-deformation method is generated to buffer and disperse the relative stress and offset the aforementioned various forces.

已知的脊椎病症,除例如車禍外傷骨折所造成的脊椎傷害,癌症細胞侵蝕造成的脊椎體整個切除等病症外,其餘主要是以在脊椎體與脊椎體中間的椎間盤因為年紀、磨損或其他各種原因退化或老化,失去彈性,造成自然的椎間間隔距離改變及椎間盤突出,而使得脊椎神經受到壓迫,產生肢體麻痺感或疼痛感,臨床上稱之為的退化性脊椎神經病變的病症。 Known spine diseases, except for spine injuries caused by car accidents and fractures, and complete resection of vertebral bodies caused by cancer cell erosion, the rest are mainly due to the age, wear and tear of the intervertebral discs between the vertebral body and the vertebral body. The cause is degeneration or aging, loss of elasticity, resulting in natural intervertebral separation distance changes and intervertebral disc herniation, which makes the spinal nerves compressed, resulting in limb numbness or pain, which is clinically called degenerative spinal neuropathy.

而傳統治療前段所述的退化性脊椎神經病變的醫療方法,則是將該退化或老化的人體自然椎間盤組織整個以手術挖除,並在該已被 清空的原椎間盤位置,植入一個或多個用以支撐該椎間盤空間的人工醫療植入物,即一般所熟知的人工脊椎間椎籠Cage,或人工脊椎椎間填充塊Spacer,少數則有以人工椎間盤Artificial disc植入,填補因為原椎間盤被切除所造成的空間等的脊椎手術治療方法。 The traditional medical method for the treatment of degenerative spinal neuropathy described in the previous paragraph is to surgically remove the entire degenerated or aging human body’s natural intervertebral disc tissue. Place one or more artificial medical implants to support the intervertebral disc space, which is commonly known as artificial vertebral vertebral cage, or artificial vertebral intervertebral filling block, Spacer. A few have Artificial disc is implanted to fill the space created by the removal of the original intervertebral disc. It is a spinal surgery treatment method.

但目前已知的各種人工脊椎植入物Cage、Spacer或Artificial disc等,以手術最大宗使用的Cage植入物來說,通常都是設計成塊狀,中間一或多個空洞,而週緣則是整片包圍之結構所製成,若在實驗室裡以最新的醫學工程電腦技術加以模擬運算時,傳統的人工植入物Cage,將會因為缺乏可以整體性平均分散引導緩衝的功能設計,在該脊柱或該人工植入物所接觸的上下脊椎椎體,對該人工植入物施加(產生)下壓力、扭轉力、伸展力或剪力等各種力量時,該各種力量的傳導或分佈線,會立即且明顯的產生紅色集中通過熱區,或力量匯集集中熱點的現象,因而對被該人工植入物所接觸的該上下脊椎椎體,甚至是該整個脊椎脊柱而言,反而造成應力集中,對該脊椎椎體造成傷害的現象,而失去該脊椎間人工植入物支撐椎間盤空間的原先設定與功能。 However, the various artificial spine implants known as Cage, Spacer or Artificial disc, etc., for the Cage implant used in the largest operation, are usually designed in a block shape with one or more hollows in the middle, and a peripheral edge. It is made of a structure surrounded by a whole piece. If the latest medical engineering computer technology is used for simulation in the laboratory, the traditional artificial implant Cage will lack the functional design that can uniformly distribute the guide buffer. When the spine or the upper and lower vertebral bodies contacted by the artificial implant are applied (produced) various forces such as downward pressure, torsion, extension or shear to the artificial implant, the conduction or distribution of the various forces The line will immediately and obviously produce the phenomenon of red concentration passing through the hot zone, or the concentration of power concentration hotspots, which will cause the upper and lower vertebral bodies contacted by the artificial implant, and even the entire spine spine. Stress concentration causes damage to the vertebral body and loses the original setting and function of the intervertebral artificial implant to support the intervertebral disc space.

舉例而言,以圖1a、1b之一種人工脊椎椎間植入物來看,其整體形狀呈現「工字型」,具有一上一下之與上下脊椎椎體直接接觸之「承接盤」,並且該上下之「承接盤」則是以一類似中空之柱狀體,直接將該上下承接盤完全連接。 For example, taking the artificial spine intervertebral implant shown in Figures 1a and 1b, its overall shape presents a "I" shape, with an upper and lower "receiving disc" that directly contacts the upper and lower vertebral bodies, and The upper and lower "receiving plate" is a hollow cylindrical body that directly connects the upper and lower receiving plates.

承前段所述,若以此種與上下脊椎體直接接觸後之承接盤,又再以一中空柱,將該上下承接盤直接相連接,未經過該中空柱之中間有任何緩衝設計時,以現行最新之醫學工程電腦模擬,上段所述的各種 脊椎所產生的壓力、扭力、伸展力或剪力等等,就非常有可能會明顯且集中的通過該中空柱,並且在該等上下承接盤上,產生應力匯集的集中點,且該等承接盤亦不會有緩衝脊椎應力之設計,反而會造成反作用力強硬且集中的施加在其所接觸的該上下脊椎椎體上,而對該上下脊椎椎體造成傷害。 As mentioned in the previous paragraph, if such a receiving plate directly contacts the upper and lower vertebral bodies, a hollow column is used to directly connect the upper and lower receiving plates without any buffering design between the hollow columns. The current latest medical engineering computer simulation, the various The pressure, torsion, extension or shear force generated by the spine is very likely to pass through the hollow column obviously and concentratedly, and on the upper and lower bearing discs, a concentration point of stress concentration will be generated, and the bearing The disc does not have a design to buffer the stress of the spine. Instead, it will cause a strong and concentrated reaction force to be applied to the upper and lower vertebral bodies that it contacts, causing damage to the upper and lower vertebral bodies.

本發明是設計一種具整體性脊椎應力引導及分散之脊椎椎體間植入物裝置。欲解決前段所述的傳統椎間植入物脊椎應力集中無法分散引導及緩衝的問題,關鍵在於如何盡量平均且分散緩衝該人工植入物所承受的各種脊椎應力力量,且又能藉由中間具有一種力引導件之設計,平均且分散的引導該等力量的傳遞與緩衝,及以一減震緩衝支架因承受前述各種力量,因本發明所使用材質彈性之特性而以產生整體性微變形方式,將相對應力緩衝分散及抵銷前述之該各種力量,及又具有可彈性支撐之空間,兼具內可填充自體骨及人工骨骼替代物,可刺激骨細胞融合生長,及在骨融合期間不會對原脊椎體造成沉陷現象(Sink),甚或是造成該等脊椎體損壞等,而發明出一種新適應「具整體性脊椎應力引導及分散之脊椎椎體間植入物裝置」,以改善前述諸多問題。 The invention is to design a spinal interbody implant device with integral spinal stress guidance and dispersion. In order to solve the problem of the traditional intervertebral implant spine stress concentration cannot disperse guidance and cushioning, the key lies in how to evenly and disperse the various vertebral stress forces that the artificial implant bears, and how to use the intermediate It has a design of force guides to guide the transmission and buffering of these forces evenly and dispersedly, and a shock-absorbing and buffering bracket to withstand the aforementioned various forces and produce overall slight deformation due to the elastic characteristics of the material used in the present invention This way, the relative stress is buffered and dispersed and offset the aforementioned various forces, and there is also a space that can be elastically supported, and it can be filled with autologous bone and artificial bone substitutes, which can stimulate the fusion and growth of bone cells and fusion in bone During this period, the original vertebral body will not sink or even cause damage to the vertebral bodies. Instead, a new adaptation "spine interbody implant device with integral spinal stress guidance and dispersion" is invented. To improve many of the aforementioned problems.

故前述問題的簡單解決裝置,是以一種具整體性脊椎應力引導及分散之脊椎椎體間植入物裝置,其特徵在於:該裝置被植入至一人體椎間盤位置,該裝置為一近似方型立體之一減震緩衝支架,具有四邊各一邊柱,該等邊柱又分別以一或複數個肋柱之一端相連結,及該等肋柱之另一端則共同連接一力引導件,形成 該等邊柱在外圍,以該等肋柱連接,該力引導件為位於整體中間,該力引導件未與該等邊柱直接連接,而是藉由該等肋柱間接連接;該等脊椎椎體,分別或同時對該等邊柱施加各種力,該等邊柱則因連接該等肋柱,該等肋柱又共同連接該力引導件,使得該等邊柱所接受之該等脊椎椎體之各種力,經由該等肋柱平均分散傳導至該力引導件,及該力引導件又將該各種力,經由其他該等肋柱,平均分散傳導至其他該等邊柱,以及該減震緩衝支架因承受前述各種力,而因材質彈性以產生整體性微變形方式,將相對應力緩衝分散及抵銷前述之該各種力。 Therefore, a simple device for solving the aforementioned problems is a spinal interbody implant device with integral spinal stress guidance and dispersion. It is characterized in that the device is implanted in a human intervertebral disc position, and the device is an approximate square. A three-dimensional shock-absorbing and buffering bracket with four sides and each side column. The side columns are respectively connected by one end of one or more ribs, and the other ends of the ribs are connected together with a force guide to form The side posts are on the periphery and are connected by the ribs. The force guide is located in the middle of the whole. The force guide is not directly connected with the side posts, but is indirectly connected by the ribs; the spine The vertebral bodies apply various forces to the side posts separately or at the same time. The side posts are connected to the ribs, and the ribs are connected to the force guide, so that the spine accepted by the side posts The various forces of the vertebral body are evenly distributed and transmitted to the force guide through the ribs, and the force guide is evenly distributed and transmitted to the other side posts through the other ribs, and the The shock-absorbing and cushioning bracket bears the aforementioned various forces, and due to the elasticity of the material, it generates an overall micro-deformation method, which buffers and disperses the relative stress and offsets the aforementioned various forces.

故本發明之一目的,在提供一種具整體性脊椎應力引導及分散之脊椎椎體間植入物裝置。 Therefore, one object of the present invention is to provide a spinal interbody implant device with integral spinal stress guidance and dispersion.

本發明之另一目的,在提供一種該裝置為一近似方型立體之一減震緩衝支架,具有四邊各一邊柱,該等邊柱又分別以一或複數個肋柱之一端相連結,及該等肋柱之另一端則共同連接一力引導件,形成該等邊柱在外圍,以該等肋柱連接,該力引導件為位於整體中間,該力引導件未與該等邊柱直接連接,而是藉由該等肋柱間接連接之一種具整體性脊椎應力引導及分散之脊椎椎體間植入物裝置。 Another object of the present invention is to provide a shock-absorbing and buffering support for the device which is approximately square and has four sides and each side column, and the side columns are respectively connected by one or more ribs at one end, and The other ends of the ribs are connected together with a force guide to form the side posts on the periphery and connected by the ribs. The force guide is located in the middle of the whole, and the force guide is not directly connected to the side posts. The connection is an intervertebral implant device with integral spinal stress guidance and dispersion through the indirect connection of the ribs.

本發明之又一目的,在提供一種該裝置進一步具有:一近似方型立體成形之一減震緩衝支架,複數個側板,複數個後板及複數個多孔蓋板;各該元件間之該彈性縫可相連接成為完整環繞之一緩衝彈性縫,及所形成之一伸縮裕度,為與該人體站立時自然之伸縮方向;該裝置接觸之該脊椎椎體所產生之各該力量,均可於該緩衝彈性縫之伸縮裕度間隙產生縮小或擴大,以該肋柱將該等力量平均分散傳導,並經過該力引導件平 均分散至其他肋柱,並以整體性微變形方式將產生相對應力緩衝分散及抵銷之一種具整體性脊椎應力引導及分散之脊椎椎體間植入物裝置。 Another object of the present invention is to provide a device that further has: an approximately square three-dimensionally formed shock-absorbing and buffering support, a plurality of side plates, a plurality of back plates and a plurality of perforated cover plates; the elasticity between each element The seams can be connected to form a full-circle buffer elastic seam, and an expansion margin is formed, which is the natural expansion and contraction direction when standing with the human body; each of the forces generated by the vertebral body in contact with the device can be The gap between the expansion and contraction margins of the buffer elastic seam is reduced or expanded, and the ribs are used to evenly distribute and transmit the force, and pass through the force guide to flatten All are dispersed to other ribs, and the relative stress is buffered, dispersed and counteracted by an integral micro-deformation method. An integral spinal stress guide and dispersion intervertebral implant device.

本發明之再一目的,在提供一種該裝置外圍之邊柱,分別位於該中間力引導件之前、後、左、右、上、下,各該邊柱均與相同水平面,或相同垂直面之該另二邊柱,中間均有一間隙間隔,及形成有一彈性縫具有一伸縮裕度,使該裝置所承受之各種力量,由該伸縮裕度間隙縮小或擴大,以該等肋柱將各種力量平均分散傳導,並經過該力引導件平均分散至其他肋柱及邊柱,達到緩衝分散及抵銷之一種具整體性脊椎應力引導及分散之脊椎椎體間植入物裝置。 Another object of the present invention is to provide a side post on the periphery of the device, respectively located in front, back, left, right, up, and down of the intermediate force guide, and each side post is on the same horizontal plane or the same vertical plane. The other two side posts have a gap between them, and an elastic seam is formed with a margin of expansion and contraction, so that various forces that the device bears can be reduced or expanded by the gap between the expansion margins, and the ribs can reduce the various forces. Evenly disperse and conduct, and evenly disperse to other ribs and side columns through the force guide, to achieve cushioning, dispersion and offsetting, an integral spinal stress guide and dispersion intervertebral implant device.

故本發明之一種具整體性脊椎應力引導及分散之脊椎椎體間植入物裝置,其特徵在於:該裝置為被植入至一脊椎椎體與相鄰近之另一脊椎椎體間之原人體自然之一椎間盤位置,其可分別接觸該相鄰近之一上脊椎椎體及一下脊椎椎體;該裝置基本為一近似方型立體成形之一減震緩衝支架,具有分別位於四邊之各一邊柱,該等邊柱分別接觸該上脊椎椎體及該下脊椎椎體,及該等邊柱又分別各以一或複數個肋柱之一端相連結,及該等肋柱之另一端則共同連接一力引導件,形成該等邊柱在外圍,以該等肋柱連接,並包圍及連接該力引導件,使該力引導件成為位於整體結構中間之夾心狀結構,該力引導件未與該等邊柱直接連接,而是藉由該等肋柱間接連接;該上脊椎椎體或該下脊椎椎體,分別或同時產生對該等邊柱施加之一正下壓力或一傾斜壓力或一扭轉壓力或一伸展力或一剪力時, 該等邊柱則因連接該等肋柱,該等肋柱又共同連接該力引導件,使得該等邊柱所接受之該上脊椎椎體或該下脊椎椎體所施加之各種力量,經由該等肋柱平均分散傳導至該力引導件,及該力引導件又將該各種力量,經由其他該等肋柱,平均分散傳導至其他該等邊柱,以及該減震緩衝支架因承受前述各種力量而以產生整體性微變形方式,將相對應力緩衝分散及抵銷前述之該各種力量。 Therefore, a spinal interbody implant device with integrated spinal stress guidance and dispersion of the present invention is characterized in that the device is implanted between a spinal body and another adjacent spinal body. A natural intervertebral disc position of the human body, which can respectively contact the adjacent upper vertebral body and lower vertebral body; the device is basically an approximately square three-dimensional forming a shock-absorbing and buffering bracket, with each side located on each side Columns, the side columns contact the upper vertebral body and the lower vertebral body, and the side columns are connected by one or more ribs, and the other ends of the ribs are connected together A force guide is connected to form the side posts on the periphery, connected by the ribs, and surround and connect the force guide, so that the force guide becomes a sandwich-like structure located in the middle of the overall structure. Directly connected with the side columns, but indirectly connected by the ribs; the upper vertebral body or the lower vertebral body, respectively or at the same time, exert a positive downward pressure or an oblique pressure on the side columns Or when a torsion pressure or an extension force or a shear force, The side columns are connected to the ribs, and the ribs are connected to the force guide together, so that the upper vertebral body or the lower vertebral body received by the side columns passes through The ribs are evenly distributed and transmitted to the force guide, and the force guides transmit the various forces evenly to the other side posts through the other ribs, and the shock-absorbing and buffering bracket is subjected to the aforementioned Various forces generate overall micro-deformation to buffer and disperse the relative stress and offset the aforementioned various forces.

上述之該具整體性脊椎應力引導及分散之脊椎椎體間植入物裝置,其中該力引導件可為一方形、圓形、三角形、球形或其他形狀,最佳實施例為一環圈形力引導件,該等肋柱各為一弧形肋柱,該環圈形力引導件連結該等弧形肋柱之一端,及該等弧形肋柱之另一端,則分別連接該等邊柱。 The above-mentioned intervertebral body implant device with integral spinal stress guidance and dispersion, wherein the force guide member can be a square, circular, triangular, spherical or other shape, and the preferred embodiment is a ring-shaped force The guide member, each of the ribs is an arc rib column, the ring-shaped force guide connects one end of the arc ribs, and the other end of the arc ribs, respectively connects the side posts .

又本發明之一種具整體性脊椎應力引導及分散之脊椎椎體間植入物裝置,其特徵在於:該裝置基本為一近似方型立體成形之一減震緩衝支架,具有分別位於四邊之各一邊柱,該等邊柱分別接觸一上脊椎椎體及相鄰近之一下脊椎椎體,及該等邊柱又分別各以一或複數個肋柱之一端相連結,及該等肋柱之另一端則共同連接一力引導件,形成該等邊柱在外圍,以該等肋柱連接,並包圍及連接該力引導件,使該力引導件成為位於整體結構中間之夾心狀結構,該力引導件未與該等邊柱直接連接,而是藉由該等肋柱間接連接;接觸該上脊椎椎體之該等上邊柱,及接觸該下脊椎椎體之該等下邊柱,二者相同側之一端,各兩兩相連接一前斜導頭,及該等前斜 導頭間形成有一彈性縫;及接觸該上脊椎椎體之該等上邊柱,與接觸該下脊椎椎體之該等下邊柱,二者相同側之另一端,各兩兩相連接一後橫柱,及該等後橫柱間同樣形成一彈性縫;該裝置被植入至該上脊椎椎體及該下脊椎椎體之原人體自然之一椎間盤位置時,該等彈性縫間所形成之一伸縮裕度,為與該人體站立時自然之脊柱上下方向成相同之伸縮方向;使得該裝置接觸及接受之該等上、下脊椎椎體所分別或同時產生之一正下壓力或一傾斜壓力或一扭轉壓力或一伸展力或一剪力時,均可於該彈性縫之伸縮裕度間隙產生縮小或擴大,以該肋柱將該等力量平均分散傳導,並經過該力引導件平均分散至其他肋柱,並以因承受前述各種力量,以整體性微變形方式將產生相對應力緩衝分散及抵銷。 Another aspect of the present invention is a spinal interbody implant device with integral spinal stress guidance and dispersion. The device is characterized in that the device is basically a square-shaped three-dimensional forming a shock-absorbing and cushioning support, with each of the four sides respectively located One side column, the side columns respectively contact an upper vertebral body and an adjacent lower vertebral body, and the side columns are respectively connected by one end of one or more ribs, and the other of the ribs One end is connected together with a force guide to form the side posts on the periphery, connected by the ribs, and surround and connect the force guide, so that the force guide becomes a sandwich structure in the middle of the overall structure. The guide is not directly connected with the side columns, but indirectly connected by the ribs; the upper side columns contacting the upper vertebral body and the lower side columns contacting the lower vertebral body are the same One end of the side, each two phases are connected to a forward oblique guide head, and the forward oblique An elastic seam is formed between the guide heads; and the upper side columns contacting the upper vertebral body and the lower side columns contacting the lower vertebral body, the other end of the two on the same side, are connected in pairs to a rear transverse An elastic seam is also formed between the posterior transverse column and the upper vertebral body; when the device is implanted in the original human intervertebral disc position of the upper vertebral body and the lower vertebral body, the elastic seam is formed between An expansion margin is the same expansion and contraction direction as the natural vertical direction of the spine when the human body is standing; the upper and lower vertebral bodies that the device touches and receives respectively or simultaneously generate a down pressure or a tilt When pressure or a torsion pressure or an extension force or a shear force can be reduced or expanded in the expansion gap of the elastic seam, the ribs distribute and transmit the force equally, and the force guide is averaged Disperse to other ribs, and because of the aforementioned various forces, the relative stress will be buffered, dispersed and offset by the overall micro-deformation.

上述之該具整體性脊椎應力引導及分散之脊椎椎體間植入物裝置,其進一步具有:一近似方型立體成形之一減震緩衝支架;複數個側板;複數個後板;及複數個多孔蓋板;其特徵在於:該減震緩衝支架之左、右各一開放面,分別結合有兩兩一對之該等側板,各該左、右開放面之該等兩兩一對之側板上下間形成一彈性縫;該減震緩衝支架之該等後橫柱上,結合有兩兩一對之該等後板,及該等後板上下間形成一彈性縫; 該減震緩衝支架之上、下各一開放面,分別結合有該等多孔蓋板;前述之各該彈性縫可相連接該等前斜導頭間形成之該彈性縫,成為完整環繞該裝置四周緣之一緩衝彈性縫,使得該裝置被植入至該上脊椎椎體與相鄰近之該下脊椎椎體間之原人體自然之該椎間盤位置時,該等多孔蓋板分別接觸該上及該下脊椎椎體,該緩衝彈性縫間所形成之一伸縮裕度,為與該人體站立時自然之脊柱上下方向成相同之伸縮方向;使得該裝置接觸及接受之該等上、下脊椎椎體所產生之各該力量,均可於該緩衝彈性縫之伸縮裕度間隙產生縮小或擴大,以該肋柱將該等力量平均分散傳導,並經過該力引導件平均分散至其他肋柱,並以整體性微變形方式將產生相對應力緩衝分散及抵銷。 The above-mentioned intervertebral implant device with integral spinal stress guidance and dispersion further has: a shock-absorbing and buffering support of approximately square three-dimensional shaping; a plurality of side plates; a plurality of back plates; and a plurality of A perforated cover plate; characterized in that: the left and right sides of the shock-absorbing buffer support have an open surface, respectively, which are combined with two pairs of the side plates, and the two pairs of side plates on each of the left and right open surfaces An elastic seam is formed between the upper and lower parts; the rear horizontal columns of the shock-absorbing and buffering bracket are combined with two pairs of the rear plates, and an elastic seam is formed between the upper and lower back plates; The upper and lower open surfaces of the shock-absorbing and buffering support are respectively combined with the porous cover plates; the aforementioned elastic seams can be connected to the elastic seams formed between the front inclined guide heads to completely surround the device A buffer elastic seam on the peripheral edge, so that when the device is implanted into the natural intervertebral disc position of the original human body between the upper vertebral body and the adjacent lower vertebral body, the porous cover plates contact the upper and The lower vertebral body, a stretch margin formed between the buffer elastic seams, is the same as the upper and lower directions of the natural spine when the human body is standing; the upper and lower vertebrae that the device touches and receives Each force generated by the body can be reduced or expanded in the expansion and contraction margin gap of the buffer elastic seam, and the ribs are evenly distributed and transmitted, and the force is evenly distributed to other ribs through the force guide. And with the overall micro-deformation method, the relative stress will be buffered, dispersed and offset.

上述之該具整體性脊椎應力引導及分散之脊椎椎體間植入物裝置,其中該等側板可為一近似於人體骨骼組織之自然彈性係數及醫用X光可穿透性之材料所製成,可為一醫用聚醚醚酮聚合物或其他近似於該人體骨骼組織之自然彈性係數及醫用X光可穿透性之醫用聚合物所製成。 The above-mentioned spine interbody implant device with integral spine stress guidance and dispersion, wherein the side plates can be made of a material similar to the natural elasticity of human bone tissue and medical X-ray penetration It can be made of a medical polyetheretherketone polymer or other medical polymers similar to the natural elastic coefficient of the human bone tissue and medical X-ray permeability.

上述之該具整體性脊椎應力引導及分散之脊椎椎體間植入物裝置,其中該等多孔蓋板可以複數個螺釘與該減震緩衝支架相組合,或以卡榫或焊接方式相結合,各該多孔蓋板上穿設有大於或等於二或三十或一百以上之穿孔,形成一網狀或碎石狀或礫石狀穿孔。 In the above-mentioned intervertebral body implant device with integral spinal stress guidance and dispersion, the porous cover plates can be combined with a plurality of screws and the shock-absorbing and buffering bracket, or combined with a tenon or welding method, Each of the porous cover plates is perforated with more than or equal to two or thirty or more than one hundred perforations, forming a net or gravel or gravel perforation.

上述之該具整體性脊椎應力引導及分散之脊椎椎體間植入物裝置,其中該等後板上可設一工具孔,及可結合一植入工具,該植入工具可握持及植入該裝置至該上脊椎椎體與相鄰近之該下脊椎椎體間之原人 體自然之該椎間盤位置。 In the above-mentioned intervertebral implant device with integral spinal stress guidance and dispersion, a tool hole can be provided on the back plates, and an implantation tool can be combined, and the implantation tool can be held and implanted. A primitive person who enters the device between the upper vertebral body and the adjacent lower vertebral body The natural position of the intervertebral disc.

上述之該具整體性脊椎應力引導及分散之脊椎椎體間植入物裝置,其中該等後板以二側邊之階梯可逐漸相對靠近卡合於該後橫柱上,各該後板之另一端部可向上或向下延伸設有一固定翼,該等固定翼上設有一或多個螺孔,各該螺孔可螺合一骨釘,及螺固於該脊椎椎體內。 In the above-mentioned intervertebral body implant device with integral spinal stress guidance and dispersion, the rear plates can be gradually and relatively close to the rear transverse column with steps on two sides, and the rear plates of each The other end can be extended upwards or downwards with a fixed wing, the fixed wing is provided with one or more screw holes, each of the screw holes can be screwed with a bone nail, and screwed in the vertebral body.

上述之該具整體性脊椎應力引導及分散之脊椎椎體間植入物裝置,其中該減震緩衝支架內,可填充入自體骨或人工骨骼替代物,該自體骨或人工骨骼替代物透過該等多孔蓋板之穿孔,與該脊椎椎體表面相接觸,以利該裝置與該脊椎體相生長融合。 The above-mentioned intervertebral body implant device with integral spinal stress guidance and dispersion, wherein the shock-absorbing and buffering bracket can be filled with autologous bone or artificial bone substitute, the autologous bone or artificial bone substitute The perforations of the porous cover plates are in contact with the surface of the vertebral body to facilitate the growth and fusion of the device and the vertebral body.

及本發明還設計有另一種具整體性脊椎應力引導及分散之脊椎椎體間植入物裝置,其特徵在於:該裝置為被植入至一脊椎椎體與相鄰近之另一脊椎椎體間之原人體自然之一椎間盤位置,其可分別接觸該相鄰近之一上脊椎椎體及一下脊椎椎體;該裝置基本為一近似方型立體成形之一減震緩衝支架,具有分別位於外圍周邊之複數個邊柱,該等邊柱分別接觸該上脊椎椎體及該下脊椎椎體,及該等邊柱又分別各以一肋柱之一端相連結,及該肋柱之另一端則共同連接一力引導件,形成該等邊柱在外圍,以該肋柱連接,並包圍及連接該力引導件,使該力引導件成為位於整體結構中間之夾心狀結構,該力引導件未與該等邊柱直接連接,而是藉由該等肋柱間接連接;該等外圍周邊之邊柱,分別位於該整體結構中間之力引導件之左前上方、左前下方,右前上方、右前下方,左後上方、左後下方, 及右後上方、右後下方,各該邊柱均與相鄰近之相同水平面,或相同垂直面之該另二邊柱,中間均有一間隙間隔,該間隙形成有一彈性縫;及分別位於該左前上方、右前上方、左後上方,及右後上方之該等邊柱,則與分別位於該左前下方、右前下方、左後下方,及右後下方之該等邊柱間之彈性縫,所形成之一伸縮裕度,為與該人體站立時自然之脊柱上下方向成相同之伸縮方向;此一相同之伸縮方向,當該裝置以橫平植入放置,或直立植入放置於該原人體自然之一椎間盤位置時,其該等邊柱間之彈性縫,所形成之一伸縮裕度,仍然會為與該人體站立時自然之脊柱上下方向成相同之伸縮方向。 And the present invention also designs another spinal interbody implant device with integral spinal stress guidance and dispersion, which is characterized in that the device is implanted into a spinal body and another adjacent spinal body It is a natural intervertebral disc position of the original human body, which can respectively contact the adjacent upper vertebral body and lower vertebral body; the device is basically an approximately square three-dimensional forming a shock-absorbing and buffering bracket, with respectively located on the periphery A plurality of peripheral side columns contact the upper vertebral body and the lower vertebral body respectively, and the side columns are connected by one end of a rib, and the other end of the rib A force guide is connected together to form the side posts on the periphery, connected by the rib column, and surround and connect the force guide, so that the force guide becomes a sandwich structure in the middle of the overall structure. It is directly connected with the side posts, but indirectly connected by the rib posts; the side posts on the periphery are respectively located at the upper left front, lower left front, upper right front, and lower right front of the force guide in the middle of the overall structure. Upper left rear, lower left rear, And the upper right rear and the lower right rear, each of the side pillars is on the same horizontal plane or the same vertical side adjacent to the other two side pillars. There is a gap in between, and the gap forms an elastic seam; and they are respectively located at the left front The upper, upper right front, upper left rear, and upper right rear side posts are formed by the elastic seams between the side posts at the lower left front, lower right front, lower left rear, and lower right rear. An expansion margin is the same expansion and contraction direction as the natural vertical direction of the spine when the human body is standing; this same expansion and contraction direction, when the device is placed horizontally, or placed upright in the original human body. In an intervertebral disc position, the elastic seams between the side columns form an expansion and contraction margin, which will still be the same as the up and down direction of the natural spine when the human body is standing.

使得該裝置接觸及接受之該等上、下脊椎椎體所分別或同時產生之一正下壓力或一傾斜壓力或一扭轉壓力或一伸展力或一剪力時,均可於該彈性縫之伸縮裕度間隙產生縮小或擴大,以該肋柱將該等力量平均分散傳導,並經過該力引導件平均分散至其他肋柱,並以因承受前述各種力量,以整體性微變形方式將產生相對應力緩衝分散及抵銷。 When the upper and lower vertebral bodies contacted and received by the device generate a positive downward pressure or an oblique pressure or a torsion pressure or an extension force or a shear force, respectively or simultaneously, it can be used in the elastic seam The expansion margin gap shrinks or expands, and the ribs distribute the force evenly, and the force guides are evenly distributed to other ribs. Due to the aforementioned various forces, the overall micro-deformation will be generated. Relative stress buffer dispersion and offset.

上述之該具整體性脊椎應力引導及分散之脊椎椎體間植入物裝置,其中該等邊柱均各分別擴展成一支撐端部,可分別接觸相鄰近之該上脊椎椎體及該下脊椎椎體。 The above-mentioned intervertebral body implant device with integral vertebral stress guidance and dispersion, wherein the side columns are each expanded into a supporting end, which can respectively contact the adjacent upper vertebral body and the lower vertebral body Vertebral body.

上述之該具整體性脊椎應力引導及分散之脊椎椎體間植入物裝置,其中該等多孔蓋板可以複數個螺釘與該減震緩衝支架相組合,或以卡榫或焊接方式相結合,各該多孔蓋板上穿設有大於或等於二或三十或一百以上之穿孔,形成一網狀或碎石狀或礫石狀穿孔,網目可以為接近於300-600μ,如此的一種接觸面,為骨細胞生長的最佳孔徑,可使得原人體 脊椎體與該裝置充分接觸刺激骨細胞生長融合,又因為有完整平面壁面支撐,故不會產生骨沉降效應,可分散應力。及該等側板上同樣也穿設有多個穿孔,形成一網狀穿孔,使得該醫用X光可透視該裝置,讓醫師可以檢視該裝置與該人體脊椎體骨骼組織相生長融合之術後復原情況,並減輕該裝置整體重量,更不會產生沉降作用。 In the above-mentioned intervertebral body implant device with integral spinal stress guidance and dispersion, the porous cover plates can be combined with a plurality of screws and the shock-absorbing and buffering bracket, or combined with a tenon or welding method, Each of the porous cover plates is perforated with more than or equal to two or thirty or more than one hundred perforations to form a net-like or gravel-like or gravel-like perforation. The mesh can be close to 300-600μ, such a contact surface , Is the best pore size for bone cell growth, which can make the original human body The full contact between the vertebral body and the device stimulates the growth and fusion of bone cells, and because it is supported by a complete flat wall surface, there is no bone sedimentation effect and stress can be dispersed. The side panels are also provided with multiple perforations to form a net-like perforation, so that the medical X-ray can see through the device, allowing the doctor to inspect the growth and fusion of the device and the human vertebral body bone tissue. Restore the situation and reduce the overall weight of the device, and it will not produce settlement.

上述之該具整體性脊椎應力引導及分散之脊椎椎體間植入物裝置,其中該等上、下壁,均為一近似於完整平面之壁面設計,相較於傳統的一種人工椎籠(Cage)其中間是全摟空,僅四周圍有窄面窄邊的框邊,極易集中應力對脊椎體產生壓迫,造成該種傳統人工椎籠沉降沒入該脊椎體中。 The above-mentioned spine interbody implant device with integral vertebral stress guidance and dispersion, wherein the upper and lower walls are designed as a wall surface that approximates a complete plane, compared to a traditional artificial vertebral cage ( Cage) The middle of the cage is completely hollow, and there are only narrow sides around the frame. It is easy to concentrate stress on the vertebral body and cause this kind of traditional artificial vertebral cage to sink into the vertebral body.

上述之該具整體性脊椎應力引導及分散之脊椎椎體間植入物裝置,其中該等固定翼上設有一或多個螺孔,各該螺孔可螺合一骨釘,及螺固於該脊椎椎體內,該骨釘為具有一種二段式螺牙設計,其中第一段為自身鎖固螺牙,可使得該骨釘螺入鎖固於該螺孔及該脊椎體之皮質骨中,第二段螺牙則為脊椎體螺牙,可使得該骨釘鎖固於該脊椎體之鬆質骨中,防止該骨釘後退、脫出。又該等固定翼,可以被設計成一種傾斜狀或太極狀,可使得該等固定翼相對組合另一之該具整體性脊椎應力引導及分散之脊椎椎體間植入物裝置之固定翼。 The above-mentioned intervertebral body implant device with integral spinal stress guidance and dispersion, wherein the fixed wings are provided with one or more screw holes, and each of the screw holes can be screwed with a bone nail and screwed in In the vertebral body, the bone screw has a two-segment screw design, wherein the first segment is a self-locking screw, which allows the bone screw to be screwed into the screw hole and the cortical bone of the vertebral body, The second segment of the screw is a vertebral body screw, which can lock the bone screw in the cancellous bone of the vertebral body and prevent the bone screw from retreating and protruding. In addition, the fixed wings can be designed in an oblique shape or a Tai Chi shape, so that the fixed wings can be relatively combined with another fixed wing of the intervertebral implant device with integral spinal stress guiding and dispersion.

上述之該具整體性脊椎應力引導及分散之脊椎椎體間植入物裝置,其中該裝置之主要構件可以為一種人體骨骼組織相融合性及醫用X光可顯示性之材料,亦即可以為一種醫用鈦合金或鈷鉻鉬合金或鉭合金或其他人體骨骼組織相融合性及醫用X光可顯示性金屬或合金金屬等相同性 質之材料所製成。 The above-mentioned spine interbody implant device with integral spine stress guidance and dispersion, wherein the main component of the device can be a material with fusion of human bone tissue and medical X-ray displayability, that is, it can It is a kind of medical titanium alloy or cobalt-chromium-molybdenum alloy or tantalum alloy or other human bone tissue fusion and medical X-ray displayable metal or alloy metal, etc. Made of quality materials.

上述之該具整體性脊椎應力引導及分散之脊椎椎體間植入物裝置,其所指之前、後、左、右,係指就施行手術者之目視方向向前為前,反之為後;就施行手術者之左右二側,為左、右,向左或向右。 The aforementioned intervertebral implant device with integrated spinal stress guidance and dispersion refers to front, back, left, and right, which means that the visual direction of the person performing the operation is forward, and vice versa; The left and right sides of the person performing the operation are left, right, left or right.

而所指之上、下,則是以病人站立時,若概以病人之人體脊椎自然方向為近似之垂直方向,其脊椎橫切面為近似平行、水平或水平面時,朝向該站立病人之頭部為上及向上,反之朝向其腳部則為下及向下;或是以所指稱之物件為中心,物件之上方或下方而定義。 The above and below refer to the head of the standing patient when the patient is standing, if the natural direction of the patient’s human spine is approximately the vertical direction, and the spine cross-section is approximately parallel, horizontal or horizontal. It is up and up, otherwise it is down and down towards its feet; or it is defined by the object referred to as the center and the object above or below.

又內、外、中心、中間,則是為所指稱之某物件部位,各相關相對該物件中心點位置之平均值而定,分為物件內、外側。各所指稱之物件位置、方向,或朝向,均以圖文圖示說明及標號指示。 In addition, inside, outside, center, and middle are referred to as the position of a certain object, and each is determined by the average value of the position of the center point of the object, which is divided into the inside and outside of the object. The position, direction, or orientation of each object referred to are indicated by graphic illustrations and signs.

100‧‧‧脊椎體 100‧‧‧Spine

110‧‧‧脊錐體 110‧‧‧Spine cone

200‧‧‧人工脊椎椎間植入物 200‧‧‧ Artificial spinal intervertebral implant

210‧‧‧承接盤 210‧‧‧undertake plate

220‧‧‧承接盤 220‧‧‧undertake plate

230‧‧‧中空柱狀體 230‧‧‧hollow cylinder

300‧‧‧一種具整體性脊椎應力引導及分散之脊椎椎體間植入物裝置 300‧‧‧A spinal interbody implant device with integral spinal stress guidance and dispersion

310‧‧‧減震緩衝支架 310‧‧‧Shock Absorbing Buffer Bracket

320‧‧‧邊柱 320‧‧‧Side Post

330‧‧‧肋柱 330‧‧‧ Ribs

340‧‧‧力引導件 340‧‧‧Force guide

350‧‧‧力引導件 350‧‧‧Force guide

400‧‧‧上脊椎椎體 400‧‧‧Upper spine

410‧‧‧下脊椎椎體 410‧‧‧Lower Spine Vertebrae

420‧‧‧椎間盤 420‧‧‧Intervertebral disc

500‧‧‧一種具整體性脊椎應力引導及分散之脊椎椎體間植入物裝置 500‧‧‧A spinal interbody implant device with integral spinal stress guidance and dispersion

510‧‧‧減震緩衝支架 510‧‧‧Shock Absorbing Buffer Bracket

520‧‧‧上邊柱 520‧‧‧Upper side pillar

521‧‧‧下邊柱 521‧‧‧Lower side pillar

522‧‧‧肋柱 522‧‧‧rib column

523‧‧‧力引導件 523‧‧‧Force guide

524‧‧‧前斜導頭 524‧‧‧Front inclined head

525‧‧‧彈性縫 525‧‧‧Elastic stitch

526‧‧‧後橫柱 526‧‧‧ Rear Cross Column

527‧‧‧彈性縫 527‧‧‧Elastic stitch

530‧‧‧側板 530‧‧‧Side panel

540‧‧‧後板 540‧‧‧Back plate

550‧‧‧多孔蓋板 550‧‧‧Perforated cover

531‧‧‧彈性縫 531‧‧‧Elastic stitch

541‧‧‧彈性縫 541‧‧‧Elastic stitch

560‧‧‧緩衝彈性縫 560‧‧‧Buffer elastic seam

551‧‧‧螺釘 551‧‧‧Screw

542‧‧‧工具孔 542‧‧‧Tool hole

570‧‧‧植入工具 570‧‧‧Implant Tool

543‧‧‧二側邊階梯 543‧‧‧Two side steps

544‧‧‧固定翼 544‧‧‧Fixed Wing

545‧‧‧螺孔 545‧‧‧Screw hole

546‧‧‧骨釘 546‧‧‧Bone nail

571‧‧‧人工骨骼替代物 571‧‧‧ Artificial bone substitute

600‧‧‧一種具整體性脊椎應力引導及分散之脊椎椎體間植入物裝置 600‧‧‧A spinal interbody implant device with integral spinal stress guidance and dispersion

610‧‧‧減震緩衝支架 610‧‧‧Shock Absorbing Buffer Bracket

620‧‧‧邊柱 620‧‧‧side pillar

630‧‧‧肋柱 630‧‧‧rib column

640‧‧‧力引導件 640‧‧‧Force guide

621‧‧‧彈性縫 621‧‧‧Elastic stitch

622‧‧‧支撐端部 622‧‧‧Support end

圖1a及圖1b係一種呈工字型,具有各一上下承接盤,且以一中空柱狀體直接連接,使得各種脊椎應力,均集中通過該中空柱,並在該等上下承接盤產生集中點之傳統脊椎間醫療植入物示意圖。 Figures 1a and 1b are an I-shaped, each with an upper and lower receiving plate, and a hollow columnar body is directly connected, so that various spine stresses are concentrated through the hollow column, and concentrated on the upper and lower receiving plates Schematic diagram of traditional spinal medical implants.

圖2a係本發明一種具整體性脊椎應力引導及分散之脊椎椎體間植入物裝置之一減震緩衝支架立體構型示意圖。 Fig. 2a is a schematic diagram of a three-dimensional configuration of a shock-absorbing and buffering bracket of a spinal interbody implant device with integrated spinal stress guidance and dispersion according to the present invention.

圖2b係該具整體性脊椎應力引導及分散之脊椎椎體間植入物裝置之該減震緩衝支架之一力引導件,其另一構型立體示意圖。 Fig. 2b is a perspective view of another configuration of a force guide member of the shock-absorbing and buffering bracket of the spine interbody implant device with integral spinal stress guiding and dispersion.

圖3係本發明一種具整體性脊椎應力引導及分散之脊椎椎體間植入物裝置之另一減震緩衝支架立體構型示意圖。 Fig. 3 is a schematic view showing the three-dimensional configuration of another shock-absorbing and buffering bracket of a spinal interbody implant device with integral spinal stress guidance and dispersion according to the present invention.

圖4a係該具整體性脊椎應力引導及分散之脊椎椎體間植入物裝置,除具有該減震緩衝支架,並進一步具有複數個側板、後板及多孔蓋板以完整組合之分解示意圖。 Fig. 4a is an exploded schematic diagram of the spine interbody implant device with integral spine stress guidance and dispersion. In addition to the shock-absorbing and buffering bracket, it further has a plurality of side plates, back plates and porous cover plates in a complete combination.

圖4b係該具整體性脊椎應力引導及分散之脊椎椎體間植入物裝置之組合後傾斜視角立體之示意圖。 Fig. 4b is a three-dimensional schematic diagram of the combined spine interbody implant device with integrated spinal stress guidance and dispersion.

圖5a及圖5b係該具整體性脊椎應力引導及分散之脊椎椎體間植入物裝置之填充入一人工骨骼替代物及以一植入工具植入至一脊椎體間,及上下延伸有一固定翼,及以各一骨釘植入及螺固於該脊椎體之立體示意圖。 Figures 5a and 5b show the spine interbody implant device with integral spinal stress guidance and dispersion. It is filled with an artificial bone substitute and implanted into a vertebral body with an implant tool, and extends up and down. A three-dimensional schematic diagram of the fixed wings and each bone screw implanted and screwed on the vertebral body.

圖6a及圖6b係本發明之再一種具整體性脊椎應力引導及分散之脊椎椎體間植入物裝置之再一減震緩衝支架立體構型示意圖,及各分別擴展成一支撐端部,可分別接觸鄰近之該上下脊椎椎體之立體構型示意圖。 Fig. 6a and Fig. 6b are the three-dimensional schematic diagram of another shock-absorbing and buffering bracket of another vertebral interbody implant device with integrated spinal stress guidance and dispersion of the present invention, and each expands into a supporting end, which can A schematic diagram of the three-dimensional configuration of the adjacent upper and lower vertebral bodies in contact with each other.

參考圖1a及圖1b,一種人工脊椎椎間植入物200來看,其整體形狀呈現「工字型」,具有一上一下之與上下脊椎椎體100、110直接接觸之「承接盤210、220」,並且該上下之「承接盤210、220」則是以一類似中空之柱狀體230,直接將該上下承接盤210、220完全連接。 With reference to Figures 1a and 1b, an artificial spinal intervertebral implant 200 has an "I" shape as a whole, with an upper and lower "receiving disc 210, which is in direct contact with the upper and lower vertebral bodies 100, 110" 220", and the upper and lower "receiving plates 210, 220" are a hollow cylindrical body 230 that directly connects the upper and lower receiving plates 210, 220 completely.

承前段所述,若以此種與上下脊椎體100、110直接接觸後之承接盤210、220,又再以一中空柱230,將該上下承接盤210、220直接相 連接,未經過該中空柱230之中間有任何緩衝設計時,以現行最新之醫學工程電腦模擬,上段所述的各種脊椎所產生的壓力、扭力、伸展力或剪力等,就非常有可能會明顯且集中的通過該中空柱230,並且在該等上下承接盤210、220上,產生應力匯集的集中點,且該等承接盤210、220亦不會有緩衝脊椎應力之設計,反而會造成反作用力強硬且集中的施加在其所接觸的該上下脊椎椎體100、110上,而對該上下脊椎椎體100、110造成傷害。 As mentioned in the previous paragraph, if the supporting plates 210, 220 directly contact the upper and lower vertebral bodies 100, 110, a hollow column 230 is used to directly contact the upper and lower supporting plates 210, 220. If there is no buffer design in the middle of the hollow column 230, it is very likely that the pressure, torsion, extension or shear generated by the various vertebrae described in the previous paragraph will be affected by the latest medical engineering computer simulation. Obviously and concentratedly through the hollow column 230, and on the upper and lower receiving discs 210, 220, there is a concentration point of stress concentration, and the receiving discs 210, 220 will not have a design to buffer the spine stress, but will cause The reaction force is strongly and concentratedly applied to the upper and lower vertebral vertebral bodies 100 and 110 that it contacts, causing damage to the upper and lower vertebral vertebral bodies 100 and 110.

參考圖2a及圖2b,本發明之一種具整體性脊椎應力引導及分散之脊椎椎體間植入物裝置300,其特徵在於:該裝置300為被植入至一脊椎椎體400與相鄰近之另一脊椎椎體410間之原人體自然之一椎間盤420位置,其可分別接觸該相鄰近之一上脊椎椎體400及一下脊椎椎體410;(該上下脊椎椎體圖示,參閱圖5a及圖5b) 2a and 2b, a spinal interbody implant device 300 with integral spinal stress guidance and dispersion of the present invention is characterized in that: the device 300 is implanted into a spinal body 400 and adjacent The position of the original human intervertebral disc 420 between the other vertebral body 410, which can respectively contact the adjacent upper vertebral body 400 and the lower vertebral body 410; (the upper and lower vertebral bodies are shown, please refer to the figure 5a and Figure 5b)

該裝置300基本為一近似方型立體成形之一減震緩衝支架310,具有分別位於四邊之各一邊柱320,該等邊柱320分別接觸該上脊椎椎體400及該下脊椎椎體410,及該等邊柱320又分別各以一或複數個肋柱330之一端相連結,及該等肋柱330之另一端則共同連接一力引導件340,形成該等邊柱320在外圍,以該等肋柱330連接,並包圍及連接該力引導件340,使該力引導件340成為位於整體結構中間之夾心狀結構,該力引導件340未與該等邊柱320直接連接,而是藉由該等肋柱330間接連接;該上脊椎椎體400或該下脊椎椎體410,分別或同時產生對該等邊柱320施加之一正下壓力或一傾斜壓力或一扭轉壓力或一伸展力或一剪力時,該等邊柱320則因連接該等肋柱330,該等肋柱330又共同連接該 力引導件340,使得該等邊柱320所接受之該上脊椎椎體400或該下脊椎椎體410所施加之各種力量,經由該等肋柱330平均分散傳導至該力引導件340,及該力引導件340又將該各種力量,經由其他該等肋柱330,平均分散傳導至其他該等邊柱320,以及該減震緩衝支架310因承受前述各種力量而產生以整體性微變形方式,將相對應力緩衝分散及抵銷前述之該各種力量。 The device 300 is basically a shock-absorbing and cushioning support 310 that is approximately square-shaped, and has side posts 320 respectively located on four sides, and the side posts 320 respectively contact the upper vertebral body 400 and the lower vertebral body 410. And the side posts 320 are respectively connected by one end of one or more ribs 330, and the other end of the ribs 330 is connected together with a force guide 340 to form the side posts 320 on the periphery, The ribs 330 are connected, surround and connect the force guide 340, so that the force guide 340 becomes a sandwich structure located in the middle of the overall structure. The force guide 340 is not directly connected with the side posts 320, but Indirectly connected by the ribs 330; the upper vertebral body 400 or the lower vertebral body 410, respectively or at the same time, exert a positive downward pressure or an oblique pressure or a torsional pressure or a Under extension force or a shear force, the side posts 320 are connected to the ribs 330, and the ribs 330 are connected to the The force guide 340 enables the various forces applied by the upper vertebral body 400 or the lower vertebral body 410 received by the side columns 320 to be evenly distributed and transmitted to the force guide 340 through the ribs 330, and The force guide 340 then evenly distributes the various forces to the other side posts 320 through the other ribs 330, and the shock-absorbing support 310 is slightly deformed as a whole due to the aforementioned various forces. , To buffer and disperse the relative stress and offset the aforementioned various forces.

該具整體性脊椎應力引導及分散之脊椎椎體間植入物裝置300,其中該力引導件可為一方形350、圓形、三角形、球形或其他形狀,最佳實施例為一環圈形力引導件340,該等肋柱330各為一弧形肋柱,該環圈形力引導件340連結該等弧形肋柱330之一端,及該等弧形肋柱330之另一端,則分別連接該等邊柱320。 The spine interbody implant device 300 with integral spinal stress guidance and dispersion, wherein the force guide member can be a square 350, a circle, a triangle, a sphere, or other shapes. The preferred embodiment is a ring-shaped force The guide 340, each of the ribs 330 is an arc-shaped rib column, and the ring-shaped force guide 340 connects one end of the arc-shaped ribs 330 and the other end of the arc-shaped ribs 330, respectively Connect the side posts 320.

參考圖3,又本發明之一種具整體性脊椎應力引導及分散之脊椎椎體間植入物裝置500,其特徵在於:該裝置500基本為一近似方型立體成形之一減震緩衝支架510,具有分別位於四邊之一對上邊柱520,及一對下邊柱521,該等上下邊柱520、521分別接觸一上脊椎椎體400及相鄰近之一下脊椎椎體410,及該等上下邊柱520、521又分別各以一或複數個肋柱522之一端相連結,及該等肋柱522之另一端則共同連接一力引導件523,形成該等上下邊柱520、521在外圍,以該等肋柱522連接,並包圍及連接該力引導件523,使該力引導件523成為位於整體結構中間之夾心狀結構,該力引導件523未與該等上下邊柱520、521直接連接,而是藉由該等肋柱522間接連接;(該上下脊椎椎體圖示,參閱圖5a及圖5b) Referring to FIG. 3, a spinal interbody implant device 500 with integral spinal stress guidance and dispersion according to the present invention is characterized in that: the device 500 is basically an approximately square three-dimensional forming a shock-absorbing and buffering bracket 510 , Having a pair of upper side posts 520 and a pair of lower side posts 521 respectively located on the four sides, the upper and lower side posts 520, 521 respectively contact an upper spine vertebra 400 and an adjacent lower spine 410, and the upper and lower sides The pillars 520, 521 are respectively connected by one end of one or more ribs 522, and the other ends of the ribs 522 are connected together with a force guide 523 to form the upper and lower side pillars 520, 521 on the periphery. The ribs 522 are connected, and surround and connect the force guide 523, so that the force guide 523 becomes a sandwich structure in the middle of the overall structure. The force guide 523 is not directly connected to the upper and lower side posts 520, 521. Connected, but indirectly connected by the ribs 522; (The upper and lower vertebral body diagrams, see Figure 5a and Figure 5b)

接觸該上脊椎椎體400之該等上邊柱520,及接觸該下脊椎 椎體410之該等下邊柱521,二者相同側之一端,各兩兩相連接一前斜導頭524,及該等前斜導頭524間形成有一彈性縫525;及接觸該上脊椎椎體400之該等上邊柱520,與接觸該下脊椎椎體410之該等下邊柱521,二者相同側之另一端,各兩兩相連接一後橫柱526,及該等後橫柱526間同樣形成一彈性縫527;該裝置500被植入至該上脊椎椎體400及該下脊椎椎體410之原人體自然之一椎間盤420位置時,該等彈性縫525、527間所形成之一伸縮裕度,為與該人體站立時自然之脊柱上下方向成相同之伸縮方向;使得該裝置500接觸及接受之該等上、下脊椎椎體400、410所分別或同時產生之一正下壓力或一傾斜壓力或一扭轉壓力或一伸展力或一剪力時,均可於該彈性縫525、527之伸縮裕度間隙產生縮小或擴大,以該肋柱522將該等力量平均分散傳導,並經過該力引導件523平均分散至其他肋柱522,並以因承受前述各種力量,而以整體性微變形方式將產生相對應力緩衝分散及抵銷。 Contact the upper side posts 520 of the upper vertebral body 400, and contact the lower spine The lower side posts 521 of the vertebral body 410 have one end on the same side and are connected to an anterior oblique guide 524, and an elastic seam 525 is formed between the anterior oblique guides 524; and contact the upper vertebra The upper side posts 520 of the body 400 and the lower side posts 521 contacting the lower vertebral body 410, the other end of the same side of the two, are connected in pairs to a rear transverse column 526 and the rear transverse columns 526 An elastic seam 527 is also formed between the upper vertebral body 400 and the lower vertebral body 410. When the device 500 is implanted in the original human intervertebral disc 420, the elastic seams 525 and 527 are formed An expansion margin is the same expansion and contraction direction as the natural vertical direction of the spine when the human body is standing; one of the upper and lower spine vertebrae 400, 410 that the device 500 contacts and receives, respectively or at the same time When pressure, an inclination pressure, a torsion pressure, an extension force or a shear force, the gap between the expansion and contraction margins of the elastic seams 525 and 527 can be reduced or expanded, and the ribs 522 can evenly distribute these forces. , And spread evenly to the other ribs 522 through the force guide 523, and the relative stress will be buffered, dispersed and offset by the overall micro-deformation due to the aforementioned various forces.

參考圖4a及圖4b,該具整體性脊椎應力引導及分散之脊椎椎體間植入物裝置500,其進一步具有:一近似方型立體成形之一減震緩衝支架510;複數個側板530;複數個後板540;及複數個多孔蓋板550;其特徵在於:該減震緩衝支架510之左、右各一開放面,分別結合有兩兩一對之該等側板530,各該左、右開放面之該等兩兩一對之側 板530上下間形成一彈性縫531;該減震緩衝支架510之該等後橫柱526上,結合有兩兩一對之該等後板540,及該等後板540上下間形成一彈性縫541;該減震緩衝支架510之上、下各一開放面,分別結合有該等多孔蓋板550;前述之各該彈性縫531、541,可相連接該等前斜導頭524間形成之該彈性縫525,成為完整環繞該裝置四周緣之一緩衝彈性縫560,使得該裝置500被植入至該上脊椎椎體400與相鄰近之該下脊椎椎體410間之原人體自然之該椎間盤位置420時,該等多孔蓋板550分別接觸該上400及該下脊椎椎體410,該緩衝彈性縫560間所形成之一伸縮裕度,為與該人體站立時自然之脊柱上下方向成相同之伸縮方向;使得該裝置500接觸及接受之該等上400、下脊椎椎體410所產生之各該力量,均可於該緩衝彈性縫560之伸縮裕度間隙產生縮小或擴大,以該肋柱522將該等力量平均分散傳導,並經過該力引導件523平均分散至其他肋柱522,並以整體性微變形方式將產生將相對應力緩衝分散及抵銷。 Referring to Figures 4a and 4b, the spine interbody implant device 500 with integral spinal stress guidance and dispersion further has: a shock-absorbing and cushioning bracket 510 of approximately square three-dimensional shaping; a plurality of side plates 530; A plurality of rear plates 540; and a plurality of perforated cover plates 550; It is characterized in that: the left and right sides of the shock-absorbing and buffering support 510 have an open surface respectively, and two pairs of the side plates 530 are respectively combined with each other. The two-by-two sides of the right open face An elastic seam 531 is formed between the upper and lower sides of the plate 530; the rear horizontal columns 526 of the shock-absorbing and buffering bracket 510 are combined with two pairs of the rear plates 540, and an elastic seam is formed between the upper and lower plates 540 541; the upper and lower open surfaces of the shock-absorbing and buffering support 510 are respectively combined with the porous cover plates 550; the aforementioned elastic slits 531, 541 can be connected to the front inclined guide head 524 formed between The elastic seam 525 becomes a buffer elastic seam 560 which completely surrounds the peripheral edge of the device, so that the device 500 is implanted into the natural human body between the upper vertebral body 400 and the adjacent lower vertebral body 410 When the intervertebral disc position 420, the porous cover plates 550 contact the upper 400 and the lower vertebral body 410, respectively, and a stretch margin formed between the cushion elastic slits 560 is in line with the natural vertical direction of the spine when the human body stands. The same direction of expansion and contraction; each of the forces generated by the upper 400 and lower vertebral bodies 410 contacted and received by the device 500 can be reduced or expanded in the expansion gap of the buffer elastic seam 560. The ribs 522 evenly disperse and conduct the force, and evenly distribute the force to other ribs 522 through the force guide 523, and will generate a slight overall deformation to buffer, disperse and offset the relative stress.

該具整體性脊椎應力引導及分散之脊椎椎體間植入物裝置500,其中該等側板530可為一近似於人體骨骼組織之自然彈性係數及醫用X光可穿透性之材料所製成,可為一醫用聚醚醚酮聚合物或其他近似於該人體骨骼組織之自然彈性係數及醫用X光可穿透性之醫用聚合物所製成。 The spinal interbody implant device 500 with integral spinal stress guidance and dispersion, wherein the side plates 530 can be made of a material similar to the natural elasticity of human bone tissue and medical X-ray penetration It can be made of a medical polyetheretherketone polymer or other medical polymers similar to the natural elastic coefficient of the human bone tissue and medical X-ray permeability.

該具整體性脊椎應力引導及分散之脊椎椎體間植入物裝置500,其中該等多孔蓋板550可以複數個螺釘551與該減震緩衝支架510相組 合,或以卡榫或焊接方式相結合,各該多孔蓋板550上穿設有大於或等於二或三十或一百以上之穿孔,形成一網狀或碎石狀或礫石狀穿孔。 The spinal interbody implant device 500 with integral spinal stress guidance and dispersion, wherein the porous cover plates 550 can be combined with a plurality of screws 551 and the shock-absorbing support 510 Combined, or combined by a tenon or welding method, each of the perforated cover plates 550 is provided with more than or equal to two or thirty or more than one hundred perforations to form a net or gravel or gravel perforation.

參考圖4a、圖4b、圖5a及圖5b,該具整體性脊椎應力引導及分散之脊椎椎體間植入物裝置500,其中該等後板540上可設一工具孔542,及可結合一植入工具570,該植入工具570可握持及植入該裝置500至該上脊椎椎體400與相鄰近之該下脊椎椎體410間之原人體自然之該椎間盤420位置。 Referring to Figures 4a, 4b, 5a and 5b, the spine interbody implant device 500 with integral spinal stress guidance and dispersion, wherein a tool hole 542 can be provided on the back plates 540, and can be combined An implantation tool 570, which can hold and implant the device 500 to the position of the original human intervertebral disc 420 between the upper vertebral body 400 and the adjacent lower vertebral body 410.

該具整體性脊椎應力引導及分散之脊椎椎體間植入物裝置500,其中該等後板540以二側邊之階梯543,可逐漸相對靠近卡合於該後橫柱526上,各該後板540之另一端部可向上或向下延伸設有一固定翼544,該等固定翼544上設有一或多個螺孔545,各該螺孔545可螺合一骨釘546,及螺固於該脊椎椎體400、410內。 In the spine interbody implant device 500 with integral spine stress guidance and dispersion, the rear plates 540 with two-side steps 543 can gradually be relatively close to the rear transverse column 526, each of which The other end of the rear plate 540 can be extended upward or downward with a fixed wing 544. The fixed wings 544 are provided with one or more screw holes 545. Each screw hole 545 can be screwed with a bone nail 546 and screwed. Within the vertebral bodies 400 and 410 of the spine.

該具整體性脊椎應力引導及分散之脊椎椎體間植入物裝置500,其中該減震緩衝支架510內,可填充入一人工骨骼替代物571,該人工骨骼替代物571透過該等多孔蓋板550之穿孔,與該脊椎椎體400、410表面相接觸,以利該裝置500與該脊椎體400、410相生長融合。 The spine interbody implant device 500 with integral spine stress guidance and dispersion, wherein the shock-absorbing and buffering bracket 510 can be filled with an artificial bone substitute 571, and the artificial bone substitute 571 passes through the porous covers The perforation of the plate 550 is in contact with the surface of the vertebral bodies 400 and 410 to facilitate the growth and fusion of the device 500 and the vertebral bodies 400 and 410.

參考圖6a及圖6b,本發明還設計有另一種具整體性脊椎應力引導及分散之脊椎椎體間植入物裝置600,其特徵在於:該裝置600為被植入至一脊椎椎體400與相鄰近之另一脊椎椎體410間之原人體自然之一椎間盤420位置,其可分別接觸該相鄰近之一上脊椎椎體400及一下脊椎椎體410;(該上下脊椎椎體圖示,參閱圖5a及圖5b) 6a and 6b, the present invention also designs another spinal interbody implant device 600 with integral spinal stress guidance and dispersion, characterized in that: the device 600 is implanted into a vertebral body 400 The position of a natural intervertebral disc 420 of the original human body between another adjacent vertebral body 410, which can respectively contact the adjacent upper vertebral body 400 and the lower vertebral body 410; (the upper and lower vertebral bodies are shown , Refer to Figure 5a and Figure 5b)

該裝置600基本為一近似方型立體成形之一減震緩衝支架610,具有分別位於外圍周邊之複數個邊柱620,該等邊柱620分別接觸該上脊椎椎體400及該下脊椎椎體410,及該等邊柱620又分別各以一肋柱630之一端相連結,及該肋柱630之另一端則共同連接一力引導件640,形成該等邊柱620在外圍,以該肋柱630連接,並包圍及連接該力引導件640,使該力引導件640成為位於整體結構中間之夾心狀結構,該力引導件640未與該等邊柱620直接連接,而是藉由該等肋柱630間接連接;該等外圍周邊之邊柱620,分別位於該整體結構中間之力引導件640之左前上方、左前下方,右前上方、右前下方,左後上方、左後下方,及右後上方、右後下方,各該邊柱620均與相鄰近之相同水平面,或相同垂直面之該另二邊柱620,中間均有一間隙間隔,該間隙形成有一彈性縫621;及分別位於該左前上方、右前上方、左後上方,及右後上方之該等邊柱620,則與分別位於該左前下方、右前下方、左後下方,及右後下方之該等邊柱間620之彈性縫621,所形成之一伸縮裕度,為與該人體站立時自然之脊柱上下方向成相同之伸縮方向;此一相同之伸縮方向,當該裝置600以橫平植入放置,或直立植入放置於該原人體自然之一椎間盤420位置時,其該等邊柱620間之彈性縫621,所形成之一伸縮裕度,仍然會為與該人體站立時自然之脊柱上下方向成相同之伸縮方向。 The device 600 is basically a shock-absorbing and cushioning support 610 that is approximately square-shaped and has a plurality of side posts 620 respectively located at the outer periphery. The side posts 620 contact the upper vertebral body 400 and the lower vertebral body respectively 410, and the side posts 620 are respectively connected by one end of a rib 630, and the other end of the rib 630 is connected together with a force guide 640, forming the side posts 620 on the periphery, with the rib The column 630 is connected, and surrounds and connects the force guide 640, so that the force guide 640 becomes a sandwich structure located in the middle of the overall structure. The force guide 640 is not directly connected with the side posts 620, but through the The equal rib posts 630 are indirectly connected; the peripheral side posts 620 are respectively located at the upper left front, lower left front, upper right front, lower right front, upper left rear, lower left rear, and lower right of the force guide 640 in the middle of the overall structure. On the upper rear and lower right rear, each of the side pillars 620 is adjacent to the same horizontal plane or the same vertical plane of the other two side pillars 620, with a gap between them, and the gap forms an elastic slit 621; The side posts 620 on the upper left front, upper right front, upper left rear, and upper right rear are the elastic seams between the side posts 620 located at the lower left front, lower right front, lower left rear, and lower right rear. 621. A stretch margin formed is the same stretch direction as the natural spine vertical direction when the human body is standing; this same stretch direction, when the device 600 is placed horizontally or placed upright When the original human body is at the position of a natural intervertebral disc 420, the elastic seam 621 between the side posts 620 forms a stretch margin, which will still be the same as the vertical direction of the natural spine when the body is standing. .

並使得該裝置600接觸及接受之該等上400、下脊椎椎體410所分別或同時產生之一正下壓力或一傾斜壓力或一扭轉壓力或一伸展力或一剪力時,均可於該彈性縫621之伸縮裕度間隙產生縮小或擴大,以該肋柱 630將該等力量平均分散傳導,並經過該力引導件640平均分散至其他肋柱630,並以因承受前述各種力量,以整體性微變形方式將產生相對應力緩衝分散及抵銷。 And when the upper 400 and lower vertebral bodies 410 contacted and received by the device 600 generate a positive downward pressure, an oblique pressure, a torsional pressure, or an extension force or a shear force, respectively or simultaneously The expansion and contraction margin gap of the elastic seam 621 shrinks or expands, and the rib column 630 evenly disperses and conducts these forces, and evenly distributes them to other ribs 630 through the force guide 640, and due to the foregoing various forces, the relative stress will be buffered, dispersed and offset by the overall micro-deformation.

又該具整體性脊椎應力引導及分散之脊椎椎體間植入物裝置600,其中該等邊柱620均各分別擴展成一支撐端部622,可分別接觸相鄰近之該上脊椎椎體400及該下脊椎椎體410,可以獲得更完整且平整之支撐效果。 In addition, the vertebral interbody implant device 600 with integral vertebral stress guidance and dispersion, wherein the side posts 620 are each expanded into a supporting end 622, which can respectively contact the adjacent upper vertebral body 400 and The lower vertebral body 410 can achieve a more complete and smooth supporting effect.

300‧‧‧一種具整體性脊椎應力引導及分散之脊椎椎體間植入物裝置 300‧‧‧A spinal interbody implant device with integral spinal stress guidance and dispersion

310‧‧‧減震緩衝支架 310‧‧‧Shock Absorbing Buffer Bracket

320‧‧‧邊柱 320‧‧‧Side Post

330‧‧‧肋柱 330‧‧‧ Ribs

340‧‧‧力引導件 340‧‧‧Force guide

Claims (9)

一種具整體性脊椎應力引導及分散之脊椎椎體間植入物裝置,其特徵在於:該裝置為一方型立體成形之一減震緩衝支架,具有分別位於四邊之各一邊柱,該等邊柱分別接觸一上脊椎椎體及相鄰近之一下脊椎椎體,及該等邊柱又分別各以一或複數個肋柱之一端相連結,及該等肋柱之另一端則共同連接一力引導件,形成該等邊柱在外圍,以該等肋柱連接,並包圍及連接該力引導件,使該力引導件成為位於整體結構中間之夾心狀結構,該力引導件未與該等邊柱直接連接,而是藉由該等肋柱間接連接;接觸該上脊椎椎體之該等上邊柱,及接觸該下脊椎椎體之該等下邊柱,二者相同側之一端,各兩兩相連接一前斜導頭,及該等前斜導頭間形成有一彈性縫;及接觸該上脊椎椎體之該等上邊柱,與接觸該下脊椎椎體之該等下邊柱,二者相同側之另一端,各兩兩相連接一後橫柱,及該等後橫柱間同樣形成一彈性縫;該裝置被植入至該上脊椎椎體及該下脊椎椎體之原人體自然之一椎間盤位置時,該等彈性縫間所形成之一伸縮裕度,為與該人體站立時自然之脊柱上下方向成相同之伸縮方向; 使得該裝置接觸及接受之該等上、下脊椎椎體所分別或同時產生之一正下壓力或一傾斜壓力或一扭轉壓力或一伸展力或一剪力時,均可於該彈性縫之伸縮裕度間隙產生縮小或擴大,以該肋柱將該等力量平均分散傳導,並經過該力引導件平均分散至其他肋柱,並以因承受前述各種力量,而整體性微變形方式產生相對應力緩衝分散及抵銷;其中該力引導件可為一方形、圓形、三角形、球形、平板形、盤形、環圈形等,該等肋柱各為一弧形肋柱,該力引導件連結該等弧形肋柱之一端,及該等弧形肋柱之另一端,則分別連接該等邊柱。 A spine intervertebral implant device with integral spinal stress guidance and dispersion, characterized in that: the device is a square-shaped three-dimensional forming a shock-absorbing and buffering support, with each side column located on the four sides, and the side columns Respectively contact an upper spine vertebral body and an adjacent lower spine vertebral body, and the side columns are respectively connected by one end of one or more ribs, and the other ends of the ribs are connected together with a force guide The side posts are formed on the periphery, connected by the rib posts, and surround and connect the force guide member, so that the force guide member becomes a sandwich structure located in the middle of the overall structure, and the force guide member is not connected to the sides The columns are directly connected, but indirectly connected by the ribs; the upper side columns contacting the upper vertebral body and the lower side columns contacting the lower vertebral body have one end on the same side, two each An anterior oblique guide head is connected, and an elastic seam is formed between the anterior oblique guide heads; and the upper side columns contacting the upper vertebral body are the same as the lower side columns contacting the lower vertebral body The other end of the side is connected to a posterior transverse column in pairs, and an elastic seam is also formed between the posterior transverse columns; the device is implanted into the original human body of the upper vertebral body and the lower vertebral body. In the position of an intervertebral disc, an expansion margin formed by the elastic seams is the same as the up and down direction of the natural spine when the human body is standing; When the upper and lower vertebral bodies contacted and received by the device generate a positive downward pressure or an oblique pressure or a torsion pressure or an extension force or a shear force, respectively or simultaneously, it can be used in the elastic seam The expansion and contraction margin gap is reduced or expanded, and the ribs distribute and transmit the force evenly, and the force guides are evenly distributed to other ribs, and due to the aforementioned various forces, the overall micro-deformation is relatively Stress buffering and dispersing and offsetting; wherein the force guide can be a square, circle, triangle, spherical, flat, disc, ring, etc., each of the ribs is an arc rib, and the force guides The parts are connected to one end of the arc-shaped ribs and the other end of the arc-shaped ribs are respectively connected to the side posts. 根據申請專利範圍第1項之一種具整體性脊椎應力引導及分散之脊椎椎體間植入物裝置,其進一步具有:一方型立體成形之一減震緩衝支架;複數個側板;複數個後板;及複數個多孔蓋板;其特徵在於:該減震緩衝支架之左、右各一開放面,分別結合有兩兩一對之該等側板,各該左、右開放面之該等兩兩一對之側板上下間形成一彈性縫;該減震緩衝支架之該等後橫柱上,結合有兩兩一對之該等後板,及該等後板上下間形成一彈性縫; 該減震緩衝支架之上、下各一開放面,分別結合有該等多孔蓋板;前述之各該彈性縫可相連接該等前斜導頭間形成之該彈性縫,成為完整環繞該裝置四周緣之一緩衝彈性縫,使得該裝置被植入至該上脊椎椎體與相鄰近之該下脊椎椎體間之原人體自然之該椎間盤位置時,該等多孔蓋板分別接觸該上及該下脊椎椎體,該緩衝彈性縫間所形成之一伸縮裕度,為與該人體站立時自然之脊柱上下方向成相同之伸縮方向;使得該裝置接觸及接受之該等上、下脊椎椎體所產生之各該力量,均可於該緩衝彈性縫之伸縮裕度間隙產生縮小或擴大,以該肋柱將該等力量平均分散傳導,並經過該力引導件平均分散至其他肋柱,並以整體性微變形方式產生相對應力緩衝分散及抵銷。 According to item 1 of the scope of patent application, a spinal interbody implant device with integral spinal stress guidance and dispersion, which further has: a square-shaped three-dimensional shaping and a shock-absorbing cushioning bracket; a plurality of side plates; a plurality of back plates ; And a plurality of perforated cover plates; characterized in that: the left and right sides of the shock-absorbing cushioning support have an open surface, respectively, which are combined with two pairs of the side plates, each of the left and right open surfaces of the two An elastic seam is formed between the upper and lower sides of a pair of side plates; the rear horizontal columns of the shock-absorbing and buffering bracket are combined with two pairs of the rear plates, and an elastic seam is formed between the upper and lower back plates; The upper and lower open surfaces of the shock-absorbing and buffering support are respectively combined with the porous cover plates; the aforementioned elastic seams can be connected to the elastic seams formed between the front inclined guide heads to completely surround the device A buffer elastic seam on the peripheral edge, so that when the device is implanted into the natural intervertebral disc position of the original human body between the upper vertebral body and the adjacent lower vertebral body, the porous cover plates contact the upper and The lower vertebral body, a stretch margin formed between the buffer elastic seams, is the same as the upper and lower directions of the natural spine when the human body is standing; the upper and lower vertebrae that the device touches and receives Each force generated by the body can be reduced or expanded in the expansion and contraction margin gap of the buffer elastic seam, and the ribs are evenly distributed and transmitted, and the force is evenly distributed to other ribs through the force guide. In addition, the relative stress is buffered, dispersed and counteracted by the overall micro-deformation method. 根據申請專利範圍第2項之一種具整體性脊椎應力引導及分散之脊椎椎體間植入物裝置,其中該等側板可為一近似於人體骨骼組織之自然彈性係數及醫用X光可穿透性之材料所製成,可為一醫用聚醚醚酮聚合物或其他近似於該人體骨骼組織之自然彈性係數及醫用X光可穿透性之醫用聚合物所製成。 According to the second item of the scope of patent application, a spinal interbody implant device with integral spinal stress guidance and dispersion, wherein the side plates can have a natural elastic coefficient similar to human bone tissue and can be penetrated by medical X-rays It is made of a transparent material, which can be made of a medical polyetheretherketone polymer or other medical polymer that is similar to the natural elastic coefficient of the human bone tissue and medical X-ray permeability. 根據申請專利範圍第2項之一種具整體性脊椎應力引導及分散之脊椎椎體間植入物裝置,其中該等多孔蓋板可以複 數個螺釘與該減震緩衝支架相組合,或以卡榫或焊接方式相結合,各該多孔蓋板上穿設有複數個穿孔,形成一網狀或碎石狀或礫石狀穿孔。 According to item 2 of the scope of patent application, a spine interbody implant device with integral spine stress guidance and dispersion, wherein the porous cover plates can be restored A number of screws are combined with the shock-absorbing and buffering bracket, or combined with a tenon or welding method, and a plurality of perforations are penetrated on each of the porous cover plates to form a net-like or gravel-like or gravel-like perforation. 根據申請專利範圍第2項之一種具整體性脊椎應力引導及分散之脊椎椎體間植入物裝置,其中該等後板上可設一工具孔,及可結合一植入工具,該植入工具可握持及植入該裝置至該上脊椎椎體與相鄰近之該下脊椎椎體間之原人體自然之該椎間盤位置。 According to the second item of the scope of patent application, a spinal interbody implant device with integral spinal stress guidance and dispersion, wherein a tool hole can be provided on the back plates, and an implant tool can be combined, the implant The tool can hold and implant the device to the natural intervertebral disc position of the original human body between the upper vertebral body and the adjacent lower vertebral body. 根據申請專利範圍第2項之一種具整體性脊椎應力引導及分散之脊椎椎體間植入物裝置,其中該等後板以二側邊之階梯可逐漸相對靠近卡合於該後橫柱上,各該後板之另一端部可向上或向下延伸設有一固定翼,該等固定翼上設有一或多個螺孔,各該螺孔可螺合一骨釘,及螺固於該脊椎椎體內。 According to item 2 of the scope of patent application, a spinal interbody implant device with integral spinal stress guidance and dispersion, in which the rear plates can be gradually and relatively close to the rear transverse column with steps on two sides , The other end of each rear plate can be provided with a fixed wing extending upward or downward. The fixed wings are provided with one or more screw holes, and each screw hole can be screwed with a bone nail and screwed to the spine Vertebral body. 根據申請專利範圍第2項之一種具整體性脊椎應力引導及分散之脊椎椎體間植入物裝置,其中該減震緩衝支架內,可填充入一人工骨骼替代物,該人工骨骼替代物透過該等多孔蓋板之穿孔,與該脊椎椎體表面相接觸,以利該裝置與該脊椎體相生長融合。 According to the second item of the scope of patent application, a spine interbody implant device with integral spine stress guidance and dispersion, wherein the shock-absorbing and cushioning bracket can be filled with an artificial bone substitute, and the artificial bone substitute penetrates The perforations of the porous cover plates are in contact with the surface of the vertebral body to facilitate the growth and fusion of the device and the vertebral body. 一種具整體性脊椎應力引導及分散之脊椎椎體間植入物裝置,其特徵在於: 該裝置為被植入至一脊椎椎體與相鄰近之另一脊椎椎體間之原人體自然之一椎間盤位置,其可分別接觸該相鄰近之一上脊椎椎體及一下脊椎椎體;該裝置為一方型立體成形之一減震緩衝支架,具有分別位於外圍周邊之複數個邊柱,該等邊柱分別接觸該上脊椎椎體及該下脊椎椎體,及該等邊柱又分別各以一肋柱之一端相連結,及該肋柱之另一端則共同連接一力引導件,形成該等邊柱在外圍,以該肋柱連接,並包圍及連接該力引導件,使該力引導件成為位於整體結構中間之夾心狀結構,該力引導件未與該等邊柱直接連接,而是藉由該等肋柱間接連接;該等外圍周邊之邊柱,分別位於該整體結構中間之力引導件之左前上方、左前下方,右前上方、右前下方,左後上方、左後下方,及右後上方、右後下方,各該邊柱均與相鄰近之相同水平面,或相同垂直面之該另二邊柱,中間均有一間隙間隔,該間隙形成有一彈性縫;及分別位於該左前上方、右前上方、左後上方,及右後上方之該等邊柱,則與分別位於該左前下方、右前下方、左後下方,及右後下方之該等邊柱間之彈性縫,所形成之一伸縮裕度,為與該人體站立時自然之脊柱上下方向成相同之伸縮方向; 使得該裝置接觸及接受之該等上、下脊椎椎體所分別或同時產生之一正下壓力或一傾斜壓力或一扭轉壓力或一伸展力或一剪力時,均可於該彈性縫之伸縮裕度間隙產生縮小或擴大,以該肋柱將該等力量平均分散傳導,並經過該力引導件平均分散至其他肋柱,並以因承受前述各種力量,而整體性微變形方式產生相對應力緩衝分散及抵銷;其中該力引導件可為一方形、圓形、三角形、球形、平板形、盤形、環圈形等,該等肋柱各為一弧形肋柱,該力引導件連結該等弧形肋柱之一端,及該等弧形肋柱之另一端,則分別連接該等邊柱。 A spinal interbody implant device with integral spinal stress guidance and dispersion, which is characterized in: The device is a natural intervertebral disc position of the original human body implanted between a vertebral body and another adjacent vertebral body, and it can contact the adjacent upper vertebral body and the lower vertebral body respectively; The device is a square-shaped three-dimensional forming a shock-absorbing and buffering support, with a plurality of side posts respectively located at the outer periphery, the side posts respectively contact the upper vertebral body and the lower vertebral body, and the side posts respectively One end of a rib column is connected, and the other end of the rib column is connected together with a force guide member to form the side columns at the periphery, connected by the rib column, and surround and connect the force guide member so that the force The guide becomes a sandwich structure located in the middle of the overall structure. The force guide is not directly connected with the side posts, but indirectly connected by the ribs; the side posts on the periphery are respectively located in the middle of the overall structure The upper left front, the lower left front, the upper right front, the lower right front, the upper left rear, the lower left rear, the upper right rear, and the lower right rear of the force guide, each of the side pillars is the same horizontal plane or the same vertical plane The other two side posts have a gap in the middle, and the gap is formed with an elastic seam; and the side posts respectively located at the upper left front, upper right front, upper left rear, and upper right rear, are respectively located on the left front The elastic seams between the lower, lower right front, lower left rear, and lower right rear side columns form a stretch margin, which is the same as the natural vertical direction of the spine when the human body is standing; When the upper and lower vertebral bodies contacted and received by the device generate a positive downward pressure or an oblique pressure or a torsion pressure or an extension force or a shear force, respectively or simultaneously, it can be used in the elastic seam The expansion and contraction margin gap is reduced or expanded, and the ribs distribute and transmit the force evenly, and the force guides are evenly distributed to other ribs, and due to the aforementioned various forces, the overall micro-deformation is relatively Stress buffering and dispersing and offsetting; wherein the force guide can be a square, circle, triangle, spherical, flat, disc, ring, etc., each of the ribs is an arc rib, and the force guides The parts are connected to one end of the arc-shaped ribs and the other end of the arc-shaped ribs are respectively connected to the side posts. 根據申請專利範圍第8項之一種具整體性脊椎應力引導及分散之脊椎椎體間植入物裝置,其中該等邊柱均各分別擴展成一支撐端部,可分別接觸相鄰近之該上脊椎椎體及該下脊椎椎體。 According to item 8 of the scope of patent application, a spine interbody implant device with integral spinal stress guidance and dispersion, wherein the side columns are each expanded into a supporting end, which can respectively contact the adjacent upper vertebrae The vertebral body and the lower vertebral body.
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Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN202027749U (en) * 2011-04-01 2011-11-09 北京化工大学 Integral artificial intervertebral disc
TW201221108A (en) * 2010-09-20 2012-06-01 Synthes Gmbh Compliant implant

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW201221108A (en) * 2010-09-20 2012-06-01 Synthes Gmbh Compliant implant
CN202027749U (en) * 2011-04-01 2011-11-09 北京化工大学 Integral artificial intervertebral disc

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