TWI699410B - Composition for forming functional layer, method for producing composition for forming functional layer, method for producing organic EL element, organic EL device, electronic device - Google Patents

Composition for forming functional layer, method for producing composition for forming functional layer, method for producing organic EL element, organic EL device, electronic device Download PDF

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TWI699410B
TWI699410B TW105108883A TW105108883A TWI699410B TW I699410 B TWI699410 B TW I699410B TW 105108883 A TW105108883 A TW 105108883A TW 105108883 A TW105108883 A TW 105108883A TW I699410 B TWI699410 B TW I699410B
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渡辺昭太朗
森田圭介
園山卓也
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日商精工愛普生股份有限公司
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Abstract

本發明提供一種於使用液相製程時可獲得穩定之成膜性的機能層形成用組合物、機能層形成用組合物之製造方法、有機EL元件之製造方法、有機EL裝置、電子機器。 The present invention provides a composition for forming a functional layer, a method for producing a composition for forming a functional layer, a method for producing an organic EL device, an organic EL device, and an electronic device that can obtain stable film-forming properties when using a liquid phase process.

本發明之機能層形成用組合物係藉由液相製程而形成包含有機材料之機能層中之至少1層時所使用者,其特徵在於:包含機能層形成用固形物成分、具有吸電子基之第1芳香族溶劑、及具有供電子基之第2芳香族溶劑,且第2芳香族溶劑之沸點高於第1芳香族溶劑之沸點。 The composition for forming a functional layer of the present invention is used when at least one of the functional layers containing an organic material is formed by a liquid phase process, and is characterized in that it contains a solid component for forming a functional layer and has an electron withdrawing base. The first aromatic solvent and the second aromatic solvent with electron donating group, and the boiling point of the second aromatic solvent is higher than the boiling point of the first aromatic solvent.

Description

機能層形成用組合物、機能層形成用組合物之製造方法、有機EL元件之製造方法、有機EL裝置、電子機器 Composition for forming functional layer, method for producing composition for forming functional layer, method for producing organic EL element, organic EL device, electronic device

本發明係關於一種機能層形成用組合物、機能層形成用組合物之製造方法、有機EL元件之製造方法、有機EL裝置、電子機器。 The present invention relates to a composition for forming a functional layer, a method for producing a composition for forming a functional layer, a method for producing an organic EL element, an organic EL device, and an electronic device.

作為機能層形成用組合物,例如專利文獻1中揭示有藉由印刷法形成有機EL(Electro-Luminescence,電致發光)元件中之至少1層有機層時所使用之包含至少1種蒸汽壓為500Pa以下之溶劑的有機EL用塗佈液。 As a composition for forming a functional layer, for example, Patent Document 1 discloses that at least one organic layer in an organic EL (Electro-Luminescence) device is formed by a printing method. The composition contains at least one vapor pressure: Coating liquid for organic EL with solvents below 500Pa.

根據上述專利文獻1,作為印刷法,可列舉平版印刷,作為蒸汽壓為500Pa以下之溶劑,可列舉:二乙基苯、三甲基苯、三乙基苯、硝基苯。認為根據上述溶劑之構成,能夠藉由印刷法而良好地形成有機EL層。 According to the aforementioned Patent Document 1, as the printing method, lithographic printing can be cited, and as the solvent having a vapor pressure of 500 Pa or less, diethylbenzene, trimethylbenzene, triethylbenzene, and nitrobenzene can be cited. It is considered that the organic EL layer can be formed satisfactorily by the printing method based on the configuration of the above-mentioned solvent.

[先前技術文獻] [Prior Technical Literature] [專利文獻] [Patent Literature]

[專利文獻1]日本專利特開2001-155861號公報 [Patent Document 1] Japanese Patent Laid-Open No. 2001-155861

作為印刷法,可列舉自噴墨頭之噴嘴以液滴之形態噴出液體(墨水)之噴墨法。若藉由噴墨法噴出上述專利文獻1之有機EL用塗佈液,則二乙基苯、三甲基苯、三乙基苯等烷基苯由於沸點低於硝基苯,故 而存在容易變乾,易發生噴嘴堵塞等,難以確保噴出穩定性或膜平坦性之課題。 As the printing method, an inkjet method in which liquid (ink) is ejected in the form of droplets from a nozzle of an inkjet head can be cited. If the coating liquid for organic EL of Patent Document 1 is ejected by the inkjet method, alkylbenzenes such as diethylbenzene, trimethylbenzene, and triethylbenzene have a lower boiling point than nitrobenzene. However, there are problems such as easy drying and nozzle clogging, and it is difficult to ensure ejection stability or film flatness.

又,硝基苯為極性溶劑,具有作為吸電子基之硝基。若具有吸電子基之溶劑殘留於成膜後之有機EL層等機能層中,則存在因該機能層與吸電子基之相互作用而對元件特性產生影響之虞。 In addition, nitrobenzene is a polar solvent and has a nitro group as an electron withdrawing group. If a solvent having an electron withdrawing group remains in a functional layer such as an organic EL layer after film formation, the interaction between the functional layer and the electron withdrawing group may affect the device characteristics.

本發明之目的在於至少解決上述一部分課題,可作為以下之形態或應用例而實現。 The purpose of the present invention is to solve at least a part of the above-mentioned problems, which can be realized as the following forms or application examples.

[應用例]本應用例之機能層形成用組合物係藉由液相製程而形成包含有機材料之機能層中之至少1層時所使用者,其特徵在於:包含機能層形成用固形物成分、具有吸電子基之第1芳香族溶劑、及具有供電子基之第2芳香族溶劑,並且上述第2芳香族溶劑之沸點高於上述第1芳香族溶劑之沸點。 [Application example] The composition for forming a functional layer of this application example is used when at least one of the functional layers containing organic materials is formed by a liquid phase process, and is characterized in that it contains a solid component for forming a functional layer , A first aromatic solvent with an electron withdrawing group, and a second aromatic solvent with an electron donating group, and the boiling point of the second aromatic solvent is higher than the boiling point of the first aromatic solvent.

根據本應用例,於藉由液相製程而形成機能層中之至少1層時,藉由作為極性溶劑之第1芳香族溶劑而確保對固形物成分之溶解性。並且,藉由添加沸點高於第1芳香族溶劑之第2芳香族溶劑,而與不含第2芳香族溶劑之情形相比,自機能層形成用組合物(液體)中去除溶劑之乾燥緩慢地進行,因此能夠提供可獲得穩定成膜性之機能層形成用組合物。又,於機能層形成用組合物(液體)之乾燥過程中,藉由吸電子性之第1芳香族溶劑與供電子性之第2芳香族溶劑的相互作用(引力),隨著第2芳香族溶劑之蒸發,第1芳香族溶劑亦蒸發。因此,能夠減輕第1芳香族溶劑於成膜後之機能層中之殘留。即,能夠抑制因具有吸電子基之第1芳香族溶劑殘留於機能層中而對元件特性產生影響。 According to this application example, when at least one of the functional layers is formed by a liquid phase process, the first aromatic solvent as a polar solvent ensures the solubility of solid components. In addition, by adding a second aromatic solvent with a higher boiling point than the first aromatic solvent, the drying of the solvent removed from the composition (liquid) for forming a functional layer is slower than when the second aromatic solvent is not included Therefore, it is possible to provide a composition for forming a functional layer that can obtain stable film-forming properties. In addition, during the drying process of the composition (liquid) for forming a functional layer, the interaction (attractive force) between the first aromatic solvent with electron-withdrawing properties and the second aromatic solvent with electron-donating properties follows Evaporation of the group solvent, the first aromatic solvent also evaporates. Therefore, the residue of the first aromatic solvent in the functional layer after film formation can be reduced. That is, it is possible to suppress the influence of the first aromatic solvent having an electron-attracting group on the device characteristics due to remaining in the functional layer.

關於上述應用例之機能層形成用組合物,較佳為上述第1芳香族溶劑之沸點為200℃以上,上述第2芳香族溶劑之沸點為250℃以上。 藉由此種溶劑之構成,能夠提供適於作為液相製程之噴墨法的表現出噴出穩定性之機能層形成用組合物。 Regarding the composition for forming a functional layer of the application example, it is preferable that the boiling point of the first aromatic solvent is 200°C or higher, and the boiling point of the second aromatic solvent is 250°C or higher. By the composition of such a solvent, it is possible to provide a composition for forming a functional layer that is suitable for an inkjet method as a liquid phase process and exhibits ejection stability.

關於上述應用例之機能層形成用組合物,較佳為上述吸電子基為硝基。 Regarding the composition for forming a functional layer of the application example, it is preferable that the electron withdrawing group is a nitro group.

藉由此種第1芳香族溶劑之構成,對有機材料表現出較高之溶解性。 By the composition of this first aromatic solvent, it exhibits high solubility for organic materials.

關於上述應用例之機能層形成用組合物,較佳為上述供電子基為烷氧基或胺基。 Regarding the composition for forming a functional layer of the above application example, it is preferable that the electron donating group is an alkoxy group or an amino group.

藉由此種第2芳香族溶劑之構成,對有機材料表現出較低之反應性。再者,烷氧基可與苯基鍵結。 The composition of this second aromatic solvent exhibits low reactivity to organic materials. Furthermore, an alkoxy group may be bonded to a phenyl group.

關於上述應用例之機能層形成用組合物,較佳為上述第2芳香族溶劑之含有比率為10%以上且90%以下。 Regarding the composition for forming a functional layer of the application example, it is preferable that the content of the second aromatic solvent is 10% or more and 90% or less.

藉由此種溶劑之構成,於使用噴墨法時獲得優異之噴出穩定性與膜平坦性。 With the composition of this solvent, excellent ejection stability and film flatness can be obtained when the inkjet method is used.

關於上述應用例之機能層形成用組合物,更佳為上述第2芳香族溶劑之含有比率等於或高於上述第1芳香族溶劑之含有比率。 Regarding the composition for forming a functional layer of the above application example, it is more preferable that the content ratio of the second aromatic solvent is equal to or higher than the content ratio of the first aromatic solvent.

藉由此種溶劑之構成,若塗佈機能層形成用組合物後使之乾燥,則藉由使第2芳香族溶劑蒸發而能夠確實地使第1芳香族溶劑蒸發而將其去除,因此能夠防止第1芳香族溶劑殘留於機能層中。 With the composition of such a solvent, if the composition for forming a functional layer is applied and dried, the second aromatic solvent can be evaporated and the first aromatic solvent can be surely evaporated and removed. Prevent the first aromatic solvent from remaining in the functional layer.

關於上述應用例之機能層形成用組合物,其特徵在於:上述第1芳香族溶劑係選自硝基苯、2,3-二甲基硝基苯、2,4-二甲基硝基苯中之至少1種。 Regarding the composition for forming a functional layer of the application example, it is characterized in that the first aromatic solvent is selected from nitrobenzene, 2,3-dimethylnitrobenzene, and 2,4-dimethylnitrobenzene At least one of them.

關於上述應用例之機能層形成用組合物,其特徵在於:上述第2芳香族溶劑係選自三甲氧基甲苯、二苯醚、3-苯氧基甲苯、苄基苯基醚、胺基聯苯、二苯基胺中之至少1種。 The composition for forming a functional layer of the above application example is characterized in that the second aromatic solvent is selected from the group consisting of trimethoxytoluene, diphenyl ether, 3-phenoxytoluene, benzyl phenyl ether, and amino acid. At least one of benzene and diphenylamine.

藉由該等溶劑之構成,能夠相對容易地獲得溶劑。 With the composition of these solvents, solvents can be obtained relatively easily.

[應用例]本應用例之機能層形成用組合物之製造方法係藉由液相製程而形成包含有機材料之機能層中之至少1層時所使用之機能層形成用組合物之製造方法,其特徵在於包括:使機能層形成用固形物成分溶解於具有吸電子基之第1芳香族溶劑的步驟、與於溶解有上述機能層形成用固形物成分之上述第1芳香族溶劑中添加具有供電子基之第2芳香族溶劑的步驟,並且上述第2芳香族溶劑之沸點高於上述第1芳香族溶劑之沸點。 [Application example] The method for producing a composition for forming a functional layer of this application example is a method for producing a composition for forming a functional layer that is used when at least one of the functional layers containing an organic material is formed by a liquid phase process. It is characterized by comprising the steps of dissolving a solid component for forming a functional layer in a first aromatic solvent having an electron withdrawing group, and adding a solid component to the first aromatic solvent in which the solid component for forming a functional layer is dissolved The step of providing a second aromatic solvent for the electron-donating group, and the boiling point of the second aromatic solvent is higher than the boiling point of the first aromatic solvent.

根據本應用例,相較於溶解於第2芳香族溶劑,能夠使機能層形成用固形物成分更容易地溶解於第1芳香族溶劑。又,若塗佈所獲得之機能層形成用組合物後使之乾燥,則與未添加第2芳香族溶劑之情形相比,乾燥緩慢地進行,因此獲得穩定之成膜性。又,藉由吸電子性之第1芳香族溶劑與供電子性之第2芳香族溶劑的相互作用(引力),隨著第2芳香族溶劑之蒸發,第1芳香族溶劑亦蒸發,因此能夠製造第1芳香族溶劑難以殘留於所成膜之機能層中之機能層形成用組合物。 According to this application example, the solid component for forming the functional layer can be more easily dissolved in the first aromatic solvent than in the second aromatic solvent. In addition, if the obtained composition for forming a functional layer is applied and then dried, the drying progresses slowly compared to the case where the second aromatic solvent is not added, and therefore stable film-forming properties are obtained. In addition, due to the interaction (attractive force) between the electron-withdrawing first aromatic solvent and the electron-donating second aromatic solvent, as the second aromatic solvent evaporates, the first aromatic solvent also evaporates, so it can A composition for forming a functional layer in which the first aromatic solvent hardly remains in the formed functional layer is produced.

[應用例]本應用例之有機EL元件之製造方法係於一對電極間夾持有包含發光層之機能層之有機EL元件之製造方法,其特徵在於包括:於上述一對電極中之一電極上塗佈上述應用例中記載之機能層形成用組合物的步驟;使所塗佈之上述機能層形成用組合物乾燥、固化而形成上述機能層中之至少1層的步驟。 [Application example] The method for manufacturing an organic EL device of this application example is a method for manufacturing an organic EL device in which a functional layer including a light-emitting layer is sandwiched between a pair of electrodes, and is characterized by including: one of the above-mentioned pair of electrodes The step of applying the composition for forming a functional layer described in the above application example on the electrode; the step of drying and curing the applied composition for forming the functional layer to form at least one of the functional layers.

根據本應用例,能夠製造具有優異之元件特性之有機EL元件。 According to this application example, organic EL devices with excellent device characteristics can be manufactured.

關於上述應用例之有機EL元件之製造方法,較佳為上述塗佈機能層形成用組合物之步驟係藉由噴墨法於上述一電極上之膜形成區域塗佈上述機能層形成用組合物。 Regarding the manufacturing method of the organic EL device of the application example, it is preferable that the step of coating the functional layer forming composition is to coat the functional layer forming composition on the film forming area on the one electrode by an inkjet method .

藉由該方法,能夠自噴墨頭之噴嘴將所需量之組合物無浪費地噴至膜形成區域,獲得優異之膜平坦性。 With this method, the required amount of composition can be sprayed to the film formation area from the nozzle of the inkjet head without waste, and excellent film flatness can be obtained.

[應用例]本應用例之有機EL裝置之特徵在於:具備使用上述應用例中記載之有機EL元件之製造方法所製造的有機EL元件。 [Application example] The organic EL device of this application example is characterized by including an organic EL element manufactured using the organic EL element manufacturing method described in the above application example.

根據本應用例,能夠提供具有優異之光電特性之有機EL裝置。 According to this application example, an organic EL device with excellent photoelectric characteristics can be provided.

[應用例]本應用例之電子機器之特徵在於:具備上述應用例中記載之有機EL裝置。 [Application example] The electronic device of this application example is characterized by having the organic EL device described in the above application example.

根據本應用例,能夠提供具有優異之光電特性之電子機器。 According to this application example, it is possible to provide electronic equipment with excellent photoelectric characteristics.

20‧‧‧噴墨頭 20‧‧‧Inkjet head

21‧‧‧噴嘴 21‧‧‧Nozzle

50‧‧‧作為機能層形成用組合物之電洞注入層形成用墨水 50‧‧‧Ink for forming hole injection layer as a composition for forming functional layer

60‧‧‧作為機能層形成用組合物之電洞傳輸層形成用墨水 60‧‧‧Ink for forming hole transport layer as a composition for forming functional layer

70‧‧‧作為機能層形成用組合物之發光層形成用墨水 70‧‧‧Ink for forming luminescent layer as a composition for forming functional layer

100‧‧‧有機EL裝置 100‧‧‧Organic EL device

101‧‧‧元件基板 101‧‧‧Component substrate

102‧‧‧反射層 102‧‧‧Reflective layer

103‧‧‧絕緣膜 103‧‧‧Insulation film

104‧‧‧像素電極 104‧‧‧Pixel electrode

105‧‧‧對向電極 105‧‧‧Counter electrode

106‧‧‧間隔壁 106‧‧‧The next wall

106a‧‧‧作為膜形成區域之開口部 106a‧‧‧As the opening of the film formation area

110R‧‧‧子像素 110R‧‧‧sub pixel

110G‧‧‧子像素 110G‧‧‧sub pixel

110B‧‧‧子像素 110B‧‧‧Sub pixel

130‧‧‧有機EL元件 130‧‧‧Organic EL element

131‧‧‧電洞注入層 131‧‧‧hole injection layer

132‧‧‧電洞傳輸層 132‧‧‧Hole Transmission Layer

133‧‧‧發光層 133‧‧‧Light-emitting layer

134‧‧‧電子傳輸層 134‧‧‧Electron transport layer

135‧‧‧電子注入層 135‧‧‧Electron injection layer

136‧‧‧機能層 136‧‧‧Functional layer

1000‧‧‧作為電子機器之個人電腦 1000‧‧‧Personal computer as an electronic machine

1001‧‧‧本體部 1001‧‧‧Main body

1002‧‧‧鍵盤 1002‧‧‧Keyboard

1003‧‧‧顯示單元 1003‧‧‧Display unit

1004‧‧‧顯示部 1004‧‧‧Display

1100‧‧‧薄型電視(TV) 1100‧‧‧Thin TV (TV)

1101‧‧‧顯示部 1101‧‧‧Display

D‧‧‧墨水液滴 D‧‧‧ink drop

ta‧‧‧像素內平均膜厚 ta‧‧‧Average film thickness in pixel

tc‧‧‧像素內中央膜厚 tc‧‧‧The central film thickness in the pixel

圖1係表示有機EL裝置之構成的概略俯視圖。 Fig. 1 is a schematic plan view showing the structure of an organic EL device.

圖2係表示有機EL元件之構造的概略剖視圖。 Fig. 2 is a schematic cross-sectional view showing the structure of an organic EL element.

圖3(a)~(d)係表示有機EL元件之製造方法的概略剖視圖。 3(a) to (d) are schematic cross-sectional views showing a method of manufacturing an organic EL device.

圖4係表示機能層中之像素中央部之膜厚的概略剖視圖。 4 is a schematic cross-sectional view showing the film thickness of the central part of the pixel in the functional layer.

圖5(a)~(d)係表示使用高分子之電洞注入傳輸材料之情形時溶劑構成與墨水噴出性之關係之評價結果的表。 Figure 5 (a) ~ (d) are tables showing the evaluation results of the relationship between the solvent composition and the ink ejectability when a polymer hole is used to inject the transport material.

圖6(e)~(g)係表示使用高分子之電洞注入傳輸材料之情形時溶劑構成與墨水噴出性之關係之評價結果的表。 Fig. 6(e)~(g) are tables showing the evaluation results of the relationship between the solvent composition and the ink ejectability when the polymer hole is used to inject the transport material.

圖7(a)~(d)係表示使用高分子之發光材料之情形時溶劑構成與墨水噴出性之關係之評價結果的表。 Fig. 7(a)~(d) are tables showing the evaluation results of the relationship between solvent composition and ink ejectability when using polymer light-emitting materials.

圖8(e)~(g)係表示使用高分子之發光材料之情形時溶劑構成與墨水噴出性之關係之評價結果的表。 Fig. 8(e)~(g) are tables showing the evaluation results of the relationship between the solvent composition and ink ejectability when a polymer light-emitting material is used.

圖9(a)~(d)係表示使用高分子之電洞注入傳輸材料之情形時溶劑構成與膜平坦性之關係之評價結果的表。 Figure 9(a)~(d) are tables showing the evaluation results of the relationship between the solvent composition and the flatness of the film when a polymer hole is used to inject the transport material.

圖10(e)~(g)係表示使用高分子之電洞注入傳輸材料之情形時溶劑構成與膜平坦性之關係之評價結果的表。 Fig. 10(e)~(g) are tables showing the evaluation results of the relationship between the solvent composition and the flatness of the film when a polymer hole is used to inject the transport material.

圖11(a)~(d)係表示使用高分子之發光材料之情形時溶劑構成與膜平坦性之關係之評價結果的表。 Fig. 11(a)~(d) are tables showing the evaluation results of the relationship between solvent composition and film flatness in the case of using polymer light-emitting materials.

圖12(e)~(g)係表示使用高分子之發光材料之情形時溶劑構成與 膜平坦性之關係之評價結果的表。 Figure 12(e)~(g) shows the solvent composition and the Table of evaluation results of the relationship between film flatness.

圖13(a)~(d)係表示使用低分子之電洞注入傳輸材料之情形時溶劑構成與膜平坦性之關係之評價結果的表。 Fig. 13(a)~(d) are tables showing the evaluation results of the relationship between solvent composition and film flatness when low-molecular holes are used to inject the transport material.

圖14(e)~(g)係表示使用低分子之電洞注入傳輸材料之情形時溶劑構成與膜平坦性之關係之評價結果的表。 14(e)~(g) are tables showing the evaluation results of the relationship between solvent composition and film flatness when low-molecular holes are used to inject the transport material.

圖15(a)~(d)係表示使用低分子之發光材料之情形時溶劑構成與膜平坦性之關係之評價結果的表。 Fig. 15(a)~(d) are tables showing the evaluation results of the relationship between solvent composition and film flatness when low-molecular luminescent materials are used.

圖16(e)~(g)係表示使用低分子之發光材料之情形時溶劑構成與膜平坦性之關係之評價結果的表。 16(e)~(g) are tables showing the evaluation results of the relationship between the solvent composition and the flatness of the film when a low-molecular luminescent material is used.

圖17係表示比較例1~比較例3及實施例1~實施例15中之有機EL元件之元件特性之評價結果的表。 FIG. 17 is a table showing the evaluation results of the device characteristics of the organic EL devices in Comparative Example 1 to Comparative Example 3 and Example 1 to Example 15.

圖18係表示比較例4~比較例6及實施例16~實施例30中之有機EL元件之元件特性之評價結果的表。 FIG. 18 is a table showing the evaluation results of the device characteristics of organic EL devices in Comparative Example 4 to Comparative Example 6 and Example 16 to Example 30.

圖19(a)係表示作為電子機器之一例之筆記型個人電腦的概略圖,(b)係表示作為電子機器之一例之薄型電視(TV)的概略圖。 FIG. 19(a) is a schematic diagram showing a notebook personal computer as an example of an electronic device, and (b) is a schematic diagram showing a thin television (TV) as an example of an electronic device.

以下,依據圖式,對將本發明加以具體化之實施形態進行說明。再者,所使用之圖式中,將所說明之部分適當放大或縮小而顯示,以使之成為能夠識別之狀態。 Hereinafter, an embodiment embodying the present invention will be described based on the drawings. Furthermore, in the drawing used, the explained part is appropriately enlarged or reduced and displayed so that it can be recognized.

(第1實施形態) (First Embodiment)

<有機EL裝置> <Organic EL Device>

首先,參照圖1及圖2對具備本實施形態之有機EL元件之有機EL裝置進行說明。圖1係表示有機EL裝置之構成的概略俯視圖,圖2係表示有機EL元件之構造的概略剖視圖。 First, an organic EL device including the organic EL element of this embodiment will be described with reference to FIGS. 1 and 2. FIG. 1 is a schematic plan view showing the structure of an organic EL device, and FIG. 2 is a schematic cross-sectional view showing the structure of an organic EL device.

如圖1所示,本實施形態之有機EL裝置100具有配置有獲得紅(R)、綠(G)、藍(B)之發光(發光色)之子像素110R、110G、110B的元 件基板101。各子像素110R、110G、110B為大致矩形,於元件基板101之顯示區域E中配置為矩陣狀。以下,有時亦將子像素110R、110G、110B統稱為子像素110。相同發光色之子像素110於圖式上沿垂直方向(行方向或子像素110之長邊方向)排列,不同發光色之子像素110於圖式上沿水平方向(列方向或子像素110之短邊方向)以R、G、B之順序排列。即,不同發光色之子像素110R、110G、110B係以所謂條紋方式配置。再者,子像素110R、110G、110B之平面形狀與配置並不限定於此。又,所謂大致矩形,包括正方形、長方形,以及角部變圓之四角形、相對向之2個邊部成為圓弧狀之四角形。 As shown in FIG. 1, the organic EL device 100 of this embodiment has elements arranged with sub-pixels 110R, 110G, and 110B that obtain red (R), green (G), and blue (B) light emission (luminous colors). Pieces of substrate 101. The sub-pixels 110R, 110G, and 110B are substantially rectangular, and are arranged in a matrix in the display area E of the element substrate 101. Hereinafter, the sub-pixels 110R, 110G, and 110B are sometimes collectively referred to as the sub-pixels 110. The sub-pixels 110 of the same luminous color are arranged in the vertical direction (row direction or the long side direction of the sub-pixel 110) in the pattern, and the sub-pixels 110 of different luminous colors are arranged in the horizontal direction (column direction or the short side of the sub-pixel 110 in the pattern). Direction) arranged in the order of R, G, B. That is, the sub-pixels 110R, 110G, and 110B of different luminous colors are arranged in a so-called stripe pattern. Furthermore, the planar shape and arrangement of the sub-pixels 110R, 110G, and 110B are not limited to this. In addition, the term "substantially rectangular" includes a square, a rectangle, a quadrangular shape with rounded corners, and a quadrangular shape in which two opposing sides are arc-shaped.

子像素110R中設置有獲得紅色(R)發光之有機EL元件。同樣地,子像素110G中設置有獲得綠色(G)發光之有機EL元件,子像素110B中設置有獲得藍色(B)發光之有機EL元件。 The sub-pixel 110R is provided with an organic EL element that emits red (R) light. Similarly, the sub-pixel 110G is provided with an organic EL element that emits green (G) light, and the sub-pixel 110B is provided with an organic EL element that emits blue (B) light.

上述有機EL裝置100中,將獲得不同發光色之3種子像素110R、110G、110B作為1個顯示像素單元,並對各子像素110R、110G、110B進行電性控制。藉此,能夠實現全彩顯示。 In the above-mentioned organic EL device 100, three sub-pixels 110R, 110G, and 110B that obtain different luminous colors are used as a display pixel unit, and each sub-pixel 110R, 110G, and 110B is electrically controlled. In this way, full-color display can be realized.

各子像素110R、110G、110B中設置有圖2所示之有機EL元件130。有機EL元件130具有:設置於元件基板101上之反射層102、絕緣膜103、像素電極104、對向電極105、及設置於像素電極104與對向電極105之間之包含發光層133之機能層136。 The organic EL element 130 shown in FIG. 2 is provided in each of the sub-pixels 110R, 110G, and 110B. The organic EL element 130 has: a reflective layer 102 provided on the element substrate 101, an insulating film 103, a pixel electrode 104, a counter electrode 105, and a function including a light-emitting layer 133 provided between the pixel electrode 104 and the counter electrode 105 Layer 136.

像素電極104發揮作為陽極之機能,分別設置於子像素110R、110G、110B上,例如使用ITO(Indium Tin Oxide,氧化銦錫)等透明導電膜而形成。 The pixel electrode 104 functions as an anode, and is respectively provided on the sub-pixels 110R, 110G, and 110B, and is formed using a transparent conductive film such as ITO (Indium Tin Oxide), for example.

設置於像素電極104之下層的反射層102係使已透過具有光透過性之像素電極104的來自機能層136之發光再次反射至像素電極104側。反射層102係使用具有光反射性之例如鋁(Al)或銀(Ag)等金屬或其合金等而形成。因此,為了防止反射層102與像素電極104之間發生電 性短路,而設置有被覆反射層102之絕緣膜103。絕緣膜103例如使用氧化矽或氮化矽或氮氧化矽等而形成。 The reflective layer 102 disposed under the pixel electrode 104 reflects the light emitted from the functional layer 136 that has passed through the pixel electrode 104 with light permeability to the side of the pixel electrode 104 again. The reflective layer 102 is formed using a metal such as aluminum (Al) or silver (Ag), or an alloy thereof having light reflectivity. Therefore, in order to prevent the occurrence of electricity between the reflective layer 102 and the pixel electrode 104 The insulating film 103 covering the reflective layer 102 is provided. The insulating film 103 is formed using, for example, silicon oxide, silicon nitride, or silicon oxynitride.

機能層136係自像素電極104側起依序積層有電洞注入層131、電洞傳輸層132、發光層133、電子傳輸層134及電子注入層135者。尤其發光層133係對應於發光色而選擇構成材料,但此處不論發光色如何均統稱為發光層133。再者,機能層136之構成並不限定於此,除該等層以外,亦可具備控制載子(電洞或電子)移動之中間層等。 The functional layer 136 includes a hole injection layer 131, a hole transport layer 132, a light emitting layer 133, an electron transport layer 134, and an electron injection layer 135 sequentially stacked from the pixel electrode 104 side. In particular, the light-emitting layer 133 selects constituent materials according to the light-emitting color, but here, regardless of the light-emitting color, it is collectively referred to as the light-emitting layer 133. Furthermore, the configuration of the functional layer 136 is not limited to this, and in addition to these layers, an intermediate layer that controls the movement of carriers (holes or electrons) may be provided.

對向電極105發揮作為陰極之機能,以子像素110R、110G、110B所共用之共用電極之形式設置,例如使用Al(鋁)或Ag(銀)與Mg(鎂)之合金等而形成。 The counter electrode 105 functions as a cathode, and is provided in the form of a common electrode shared by the sub-pixels 110R, 110G, and 110B, and is formed using, for example, Al (aluminum) or an alloy of Ag (silver) and Mg (magnesium).

自作為陽極之像素電極104側向發光層133注入作為載子之電洞,自作為陰極之對向電極105側向發光層133注入作為載子之電子。於發光層133中,藉由所注入之電洞與電子而形成激子(exciton;電洞與電子因庫倫力而相互束縛之狀態),激子(exciton)湮滅時(電洞與電子再結合時),一部分能量成為螢光或磷光而釋出。 A hole as a carrier is injected into the light-emitting layer 133 from the side of the pixel electrode 104 as an anode, and electrons as a carrier are injected into the light-emitting layer 133 from the side of the counter electrode 105 as a cathode. In the light-emitting layer 133, excitons (exciton; a state in which holes and electrons are bound to each other due to Coulomb force) are formed by the injected holes and electrons. When the excitons are annihilated (holes and electrons recombine) Time), part of the energy is released as fluorescence or phosphorescence.

有機EL裝置100中,若以具有光透過性之方式構成對向電極105,則由於具有反射層102,故而能夠自對向電極105側提取來自發光層133之發光。此種發光方式稱為頂部發光方式。又,若去除反射層102、並以具有光反射性之方式構成對向電極105,則亦能夠設為自元件基板101側提取來自發光層133之發光之底部發光方式。本實施形態中,將有機EL裝置100設為頂部發光方式,於以下進行說明。再者,本實施形態之有機EL裝置100係於元件基板101中具備能夠分別獨立地驅動子像素110R、110G、110B各自之有機EL元件130之像素電路的主動驅動型發光裝置。像素電路可採用公知構成,因此圖2中將像素電路之圖式省略。 In the organic EL device 100, if the counter electrode 105 is configured to have light permeability, since the reflective layer 102 is provided, the light emitted from the light emitting layer 133 can be extracted from the counter electrode 105 side. This type of light emission is called top light emission. In addition, if the reflective layer 102 is removed and the counter electrode 105 is configured to have light reflectivity, it can also be a bottom emission method in which the light emitted from the light emitting layer 133 is extracted from the element substrate 101 side. In this embodiment, the organic EL device 100 is set to a top emission method, which will be described below. Furthermore, the organic EL device 100 of this embodiment is an active driving type light-emitting device having pixel circuits capable of independently driving the respective organic EL elements 130 of the sub-pixels 110R, 110G, and 110B in the element substrate 101. The pixel circuit can adopt a well-known structure, so the diagram of the pixel circuit is omitted in FIG. 2.

本實施形態中,有機EL裝置100具有間隔壁106,其與子像素 110R、110G、110B各自之有機EL元件130中之像素電極104之外緣重合,並於像素電極104上構成開口部106a。 In this embodiment, the organic EL device 100 has a partition wall 106 which is connected to the sub-pixel The outer edges of the pixel electrodes 104 in the organic EL elements 130 of 110R, 110G, and 110B overlap each other, and an opening 106a is formed on the pixel electrode 104.

本實施形態中,關於有機EL元件130之機能層136,構成機能層136之電洞注入層131、電洞傳輸層132、發光層133中之至少1層係藉由液相製程而形成。所謂液相製程係如下方法:將包含構成各層之成分與溶劑之溶液(機能層形成用組合物)塗佈於作為由間隔壁106所圍成之膜形成區域的開口部106a並加以乾燥,藉此形成各層。為了以所需膜厚形成各層,必須將特定量之機能層形成用組合物高精度地塗佈於開口部106a,本實施形態中,採用噴墨法(液滴噴出法)作為液相製程。 In this embodiment, regarding the functional layer 136 of the organic EL device 130, at least one of the hole injection layer 131, the hole transport layer 132, and the light emitting layer 133 constituting the functional layer 136 is formed by a liquid phase process. The so-called liquid phase process is a method in which a solution (composition for forming a functional layer) containing components and solvents constituting each layer is applied to the opening 106a as a film formation region surrounded by the partition wall 106 and dried, and This forms the layers. In order to form each layer with a desired film thickness, a specific amount of the composition for forming a functional layer must be applied to the opening 106a with high accuracy. In this embodiment, an inkjet method (droplet ejection method) is used as the liquid phase process.

尤其於頂部發光方式之有機EL裝置100中,較佳為構成機能層136之各層之剖面形狀為平面(平坦)。關於本實施形態之機能層形成用組合物,為了使各層之剖面形狀成為平面(平坦),而於開口部106a之整個面塗佈特定量之機能層形成用組合物並使之乾燥。為了確保使用自噴墨頭之噴嘴噴出機能層形成用組合物之噴墨法時的噴出穩定性、與開口部106a中之機能層136之膜平坦性,乃致力於研究機能層形成用組合物中之溶劑之構成。關於機能層形成用組合物之詳細構成於下文說明。 In particular, in the organic EL device 100 of the top emission method, it is preferable that the cross-sectional shape of each layer constituting the functional layer 136 is flat (flat). Regarding the composition for forming a functional layer of this embodiment, in order to make the cross-sectional shape of each layer flat (flat), a specific amount of the composition for forming a functional layer is applied to the entire surface of the opening 106a and dried. In order to ensure the ejection stability during the inkjet method using the composition for forming the functional layer from the nozzle of the inkjet head, and the film flatness of the functional layer 136 in the opening 106a, research on the composition for forming the functional layer The composition of the solvent. The detailed structure of the composition for forming a functional layer will be described below.

<有機EL元件之製造方法> <Method of Manufacturing Organic EL Device>

其次,參照圖3對作為本實施形態之發光元件的有機EL元件之製造方法進行具體說明。圖3(a)~(d)係表示有機EL元件之製造方法的概略剖視圖。再者,如上所述,驅動控制有機EL元件130之像素電路、或者反射層102或像素電極104之形成方法可採用公知方法,因而此處針對間隔壁形成步驟以降之步驟進行說明。 Next, a method of manufacturing an organic EL element as a light-emitting element of this embodiment will be specifically described with reference to FIG. 3. 3(a) to (d) are schematic cross-sectional views showing a method of manufacturing an organic EL device. Furthermore, as described above, the pixel circuit for driving and controlling the organic EL element 130, or the method for forming the reflective layer 102 or the pixel electrode 104 can be a well-known method. Therefore, the steps below are described here for the step of forming the partition wall.

本實施形態之有機EL元件130之製造方法具有間隔壁形成步驟(步驟S1)、表面處理步驟(步驟S2)、機能層形成步驟(步驟S3)、及對 向電極形成步驟(步驟S4)。 The method of manufacturing the organic EL element 130 of this embodiment has a partition wall forming step (step S1), a surface treatment step (step S2), a functional layer forming step (step S3), and The electrode formation step (step S4).

步驟S1之間隔壁形成步驟中,如圖3(a)所示,於形成有反射層102及像素電極104之元件基板101,以1μm~2μm之厚度塗佈例如包含對機能層形成用組合物表現出撥液性之撥液材料的感光性樹脂材料並加以乾燥,藉此形成感光性樹脂層。作為塗佈方法,可列舉轉印法、狹縫式塗佈法等。作為撥液材料,可列舉氟化合物或矽氧烷系化合物。作為感光性樹脂材料,可列舉負型之多官能丙烯酸系樹脂。對所形成之感光性樹脂層,使用對應於子像素110之形狀之曝光用遮罩進行曝光、顯影,而形成與像素電極104之外緣重合、並於像素電極104上構成開口部106a的間隔壁106。繼而進入步驟S2。 In the step of forming the partition wall in step S1, as shown in FIG. 3(a), the element substrate 101 on which the reflective layer 102 and the pixel electrode 104 are formed is coated with a thickness of 1 μm to 2 μm, including, for example, a composition for forming a functional layer The photosensitive resin material of the liquid repellent material exhibiting liquid repellency is dried to form a photosensitive resin layer. As a coating method, a transfer method, a slit coating method, etc. are mentioned. As the liquid repellent material, a fluorine compound or a silicone-based compound can be cited. As the photosensitive resin material, a negative polyfunctional acrylic resin can be mentioned. The formed photosensitive resin layer is exposed and developed using an exposure mask corresponding to the shape of the sub-pixel 110 to form a space overlapping the outer edge of the pixel electrode 104 and forming an opening 106a on the pixel electrode 104 Next door 106. Then go to step S2.

步驟S2之表面處理步驟中,對形成有間隔壁106之元件基板101實施表面處理。進行表面處理步驟之目的在於去除像素電極104之表面之間隔壁殘渣等無用物,以使於下一步驟中利用噴墨法(液滴噴出法)形成構成機能層136之電洞注入層131、電洞傳輸層132、發光層133時,包含機能層形成材料(固形物成分)之機能層形成用組合物於由間隔壁106所圍成之開口部106a中均勻地潤濕擴展。作為表面處理方法,本實施形態中實施準分子UV(紫外線)處理。再者,表面處理方法不限定於準分子UV處理,只要能夠使像素電極104之表面潔淨化即可,例如亦可進行利用溶劑之洗淨-乾燥步驟。又,若像素電極104之表面為潔淨狀態,則亦可不實施表面處理步驟。再者,本實施形態中,使用包含撥液材料之感光性樹脂材料形成間隔壁106,但並不限定於此,亦可使用不含撥液材料之感光性樹脂材料而形成間隔壁106後,於步驟S2中,實施使用氟系處理氣體之例如電漿處理而對間隔壁106之表面賦予撥液性,其後,實施以氧氣作為處理氣體之電漿處理,而進行使像素電極104之表面親液化之表面處理。繼而進入步驟S3。 In the surface treatment step of step S2, the element substrate 101 on which the partition wall 106 is formed is subjected to surface treatment. The purpose of the surface treatment step is to remove unnecessary materials such as the residue of the partition wall on the surface of the pixel electrode 104, so that the hole injection layer 131, which constitutes the functional layer 136, is formed by the inkjet method (droplet ejection method) in the next step. In the case of the hole transport layer 132 and the light emitting layer 133, the functional layer forming composition containing the functional layer forming material (solid component) is uniformly wetted and spread in the opening 106a surrounded by the partition wall 106. As a surface treatment method, excimer UV (ultraviolet) treatment is performed in this embodiment. Furthermore, the surface treatment method is not limited to the excimer UV treatment, as long as the surface of the pixel electrode 104 can be cleaned, for example, a washing-drying step using a solvent may also be performed. Moreover, if the surface of the pixel electrode 104 is in a clean state, the surface treatment step may not be performed. Furthermore, in this embodiment, a photosensitive resin material containing a liquid repellent material is used to form the partition wall 106, but it is not limited to this, and a photosensitive resin material that does not contain a liquid repellent material may be used to form the partition wall 106. In step S2, plasma processing using a fluorine-based processing gas is performed to impart liquid repellency to the surface of the partition wall 106, and then plasma processing using oxygen as the processing gas is performed to make the surface of the pixel electrode 104 Surface treatment for lyophilization. Then go to step S3.

步驟S3之機能層形成步驟中,首先,如圖3(b)所示,於開口部106a塗佈作為包含電洞注入材料之機能層形成用組合物的電洞注入層形成用墨水50。關於電洞注入層形成用墨水50之塗佈方法,採用自噴墨頭20之噴嘴21以液滴D之形態噴出電洞注入層形成用墨水50的噴墨法(液滴噴出法)。自噴墨頭20所噴出之液滴D之噴出量可以單位pl(微微升)進行控制,向開口部106a內噴射用特定量除以液滴D之噴出量所得之滴數的液滴D。所噴出之電洞注入層形成用墨水50因其與間隔壁106之界面張力而於開口部106a內隆起,但不會溢出。換言之,以成為不會自開口部106a溢出之程度之特定量的方式,預先對電洞注入層形成用墨水50中之電洞注入材料之濃度進行調整。繼而進入乾燥步驟。 In the functional layer forming step of step S3, first, as shown in FIG. 3(b), the hole injection layer forming ink 50 as a composition for forming a functional layer containing a hole injection material is applied to the opening 106a. As for the coating method of the ink 50 for forming the hole injection layer, an inkjet method (droplet ejection method) in which the ink 50 for forming the hole injection layer is ejected in the form of droplets D from the nozzle 21 of the inkjet head 20 is adopted. The ejection amount of the droplets D ejected from the inkjet head 20 can be controlled in units of pl (picoliter), and the number of droplets D obtained by dividing a specific amount by the ejection amount of the droplets D is ejected into the opening 106a. The ejected ink 50 for forming a hole injection layer swells in the opening 106a due to the interfacial tension between it and the partition wall 106, but does not overflow. In other words, the concentration of the hole injection material in the hole injection layer forming ink 50 is adjusted in advance so as to be a certain amount that does not overflow from the opening 106a. Then enter the drying step.

乾燥步驟中,例如採用減壓乾燥(減壓乾燥步驟),即,將塗佈有電洞注入層形成用墨水50之元件基板101放置於減壓環境中,而使溶劑自電洞注入層形成用墨水50中蒸發而乾燥。其後,於大氣壓下實施例如以180℃加熱30分鐘之焙燒處理,藉此實現固化,而如圖3(c)所示般形成電洞注入層131。電洞注入層131大致以10nm~30nm之膜厚形成,但根據下述電洞注入材料之選擇或與機能層136中其他層之關係而未必限定於此。 In the drying step, for example, vacuum drying (decompression drying step) is adopted, that is, the element substrate 101 coated with the hole injection layer forming ink 50 is placed in a reduced pressure environment, and the solvent is formed from the hole injection layer The ink 50 is evaporated and dried. Thereafter, a baking treatment such as heating at 180° C. for 30 minutes is performed under atmospheric pressure to achieve curing, and the hole injection layer 131 is formed as shown in FIG. 3(c). The hole injection layer 131 is approximately formed with a film thickness of 10 nm-30 nm, but it is not necessarily limited to this according to the selection of the hole injection material described below or the relationship with other layers in the functional layer 136.

繼而,使用作為包含電洞傳輸材料之機能層形成用組合物的電洞傳輸層形成用墨水60,而形成電洞傳輸層132。關於電洞傳輸層132之形成方法,亦與電洞注入層131同樣地採用噴墨法(液滴噴出法)進行。即,自噴墨頭20之噴嘴21以液滴D之形態向開口部106a內噴射特定量之電洞傳輸層形成用墨水60。進而,對開口部106a內所塗佈之電洞傳輸層形成用墨水60進行減壓乾燥。其後,於氮氣等惰性氣體環境下,實施例如以180℃加熱30分鐘之焙燒處理,藉此形成電洞傳輸層132。電洞傳輸層132大致以10nm~20nm之膜厚形成,但根據下述電 洞傳輸材料之選擇或與機能層136中其他層之關係而未必限定於此。又,根據與機能層136中其他層之關係,亦可將電洞注入層131與電洞傳輸層132合為一體而形成電洞注入傳輸層。 Next, the hole transport layer forming ink 60 which is a composition for forming a functional layer containing a hole transport material is used to form the hole transport layer 132. The method of forming the hole transport layer 132 is also performed by the inkjet method (droplet ejection method) in the same manner as the hole injection layer 131. In other words, the ink 60 for forming a hole transport layer is ejected from the nozzle 21 of the inkjet head 20 in the form of a droplet D into the opening 106 a. Furthermore, the ink 60 for forming a hole transport layer applied in the opening 106a is dried under reduced pressure. Thereafter, in an inert gas atmosphere such as nitrogen, a baking treatment of, for example, heating at 180° C. for 30 minutes is performed, thereby forming the hole transport layer 132. The hole transport layer 132 is approximately formed with a film thickness of 10nm to 20nm, but according to the following electrical The selection of the hole transmission material or the relationship with other layers in the functional layer 136 is not necessarily limited to this. In addition, according to the relationship with other layers in the functional layer 136, the hole injection layer 131 and the hole transport layer 132 can also be integrated to form a hole injection transport layer.

繼而,使用作為包含發光層形成材料之機能層形成用組合物的發光層形成用墨水70,而形成發光層133。關於發光層133之形成方法,亦與電洞注入層131同樣地採用噴墨法(液滴噴出法)進行。即,自噴墨頭20之噴嘴21以液滴D之形態向開口部106a內噴射特定量之發光層形成用墨水70。進而,對開口部106a內所塗佈之發光層形成用墨水70進行減壓乾燥。其後,於氮氣等惰性氣體環境下,實施例如以130℃加熱30分鐘之焙燒處理,藉此形成發光層133。發光層133大致以60nm~80nm之膜厚形成,但根據下述發光層形成材料之選擇或與機能層136中其他層之關係而未必限定於此。 Then, the light-emitting layer forming ink 70 which is a composition for forming a functional layer containing a light-emitting layer forming material is used to form the light-emitting layer 133. The method of forming the light-emitting layer 133 is also performed by the inkjet method (droplet ejection method) in the same manner as the hole injection layer 131. That is, the nozzle 21 of the inkjet head 20 ejects a specific amount of the ink 70 for forming a light-emitting layer in the form of a droplet D into the opening 106 a. Furthermore, the light-emitting layer forming ink 70 applied in the opening 106a is dried under reduced pressure. Thereafter, in an inert gas atmosphere such as nitrogen, a baking treatment is performed, for example, by heating at 130° C. for 30 minutes, thereby forming the light-emitting layer 133. The light-emitting layer 133 is formed with a film thickness of approximately 60 nm to 80 nm, but it is not necessarily limited to this according to the selection of the light-emitting layer forming material described below or the relationship with other layers in the functional layer 136.

繼而,以被覆發光層133之方式形成電子傳輸層134。作為構成電子傳輸層134之電子傳輸材料,無特別限定,為了能夠採用真空蒸鍍法等氣相製程而形成,例如可列舉:BALq、1,3,5-三(5-(4-第三丁基苯基)-1,3,4-

Figure 105108883-A0202-12-0012-31
二唑)(OXD-1)、BCP(Bathocuproine,浴銅靈)、2-(4-聯苯基)-5-(4-第三丁基苯基)-1,2,4-
Figure 105108883-A0202-12-0012-32
二唑(PBD)、3-(4-聯苯基)-5-(4-第三丁基苯基)-1,2,4-三唑(TAZ)、4,4'-雙(1,1-雙二苯基乙烯基)聯苯(DPVBi)、2,5-雙(1-萘基)-1,3,4-
Figure 105108883-A0202-12-0012-33
二唑(BND)、4,4'-雙(1,1-雙(4-甲基苯基)乙烯基)聯苯(DTVBi)、2,5-雙(4-聯苯基)-1,3,4-
Figure 105108883-A0202-12-0012-34
二唑(BBD)等。 Then, the electron transport layer 134 is formed so as to cover the light emitting layer 133. The electron transport material constituting the electron transport layer 134 is not particularly limited. In order to be formed by a gas phase process such as a vacuum evaporation method, for example, BALq, 1,3,5-tri(5-(4-third Butylphenyl)-1,3,4-
Figure 105108883-A0202-12-0012-31
Diazole) (OXD-1), BCP (Bathocuproine, bath copper spirit), 2-(4-biphenyl)-5-(4-tertiary butylphenyl)-1,2,4-
Figure 105108883-A0202-12-0012-32
Diazole (PBD), 3-(4-Biphenyl)-5-(4-tert-butylphenyl)-1,2,4-triazole (TAZ), 4,4'-bis(1, 1-bis-diphenylvinyl) biphenyl (DPVBi), 2,5-bis(1-naphthyl)-1,3,4-
Figure 105108883-A0202-12-0012-33
Diazole (BND), 4,4'-bis(1,1-bis(4-methylphenyl)vinyl)biphenyl (DTVBi), 2,5-bis(4-biphenyl)-1, 3,4-
Figure 105108883-A0202-12-0012-34
Diazole (BBD) and so on.

又,可列舉:三(8-羥基喹啉)鋁(Alq3)、

Figure 105108883-A0202-12-0012-35
二唑衍生物、
Figure 105108883-A0202-12-0012-36
唑衍生物、啡啉衍生物、蒽醌二甲烷衍生物、苯醌衍生物、萘醌衍生物、蒽醌衍生物、四氰基蒽醌二甲烷衍生物、茀衍生物、二苯基二氰基乙烯衍生物、聯苯醌衍生物、羥基喹啉衍生物等。可將該等中之1種或2種以上組合使用。 In addition, three (8-hydroxyquinoline) aluminum (Alq3),
Figure 105108883-A0202-12-0012-35
Diazole derivatives,
Figure 105108883-A0202-12-0012-36
Azole derivatives, phenanthroline derivatives, anthraquinone dimethane derivatives, benzoquinone derivatives, naphthoquinone derivatives, anthraquinone derivatives, tetracyanoanthraquinone dimethane derivatives, quinone derivatives, diphenyl dicyanide Ethylene derivatives, diphenoquinone derivatives, quinoline derivatives, etc. One or more of these can be used in combination.

電子傳輸層134大致以20nm~40nm之膜厚形成,但根據上述電 子傳輸材料之選擇或與機能層136中其他層之關係而未必限定於此。藉此,能夠將自作為陰極之對向電極105所注入之電子良好地傳輸至發光層133。再者,根據與機能層136中其他層之關係,亦可略去電子傳輸層134。 The electron transport layer 134 is approximately formed with a film thickness of 20 nm to 40 nm, but according to the above The selection of the sub-transmission material or the relationship with other layers in the functional layer 136 is not necessarily limited to this. Thereby, electrons injected from the counter electrode 105 serving as the cathode can be transported to the light emitting layer 133 well. Furthermore, according to the relationship with other layers in the functional layer 136, the electron transport layer 134 may be omitted.

繼而,以被覆電子傳輸層134之方式形成電子注入層135。作為構成電子注入層135之電子注入材料,無特別限定,為了能夠採用真空蒸鍍法等氣相製程而形成,例如可列舉鹼金屬化合物或鹼土金屬化合物。 Then, the electron injection layer 135 is formed so as to cover the electron transport layer 134. The electron injection material constituting the electron injection layer 135 is not particularly limited. In order to be able to be formed by a gas phase process such as a vacuum vapor deposition method, for example, an alkali metal compound or an alkaline earth metal compound can be mentioned.

作為鹼金屬化合物,例如可列舉:LiF、Li2CO3、LiCl、NaF、Na2CO3、NaCl、CsF、Cs2CO3、CsCl等鹼金屬鹽。又,作為鹼土金屬化合物,例如可列舉:CaF2、CaCO3、SrF2、SrCO3、BaF2、BaCO3等鹼土金屬鹽。可將該等鹼金屬化合物或鹼土金屬化合物中之1種或2種以上組合使用。 Examples of alkali metal compounds include alkali metal salts such as LiF, Li 2 CO 3 , LiCl, NaF, Na 2 CO 3 , NaCl, CsF, Cs 2 CO 3 , and CsCl. In addition, examples of alkaline earth metal compounds include alkaline earth metal salts such as CaF 2 , CaCO 3 , SrF 2 , SrCO 3 , BaF 2 , and BaCO 3 . One or two or more of these alkali metal compounds or alkaline earth metal compounds can be used in combination.

電子注入層135之膜厚無特別限定,較佳為0.01nm以上且10nm以下左右,更佳為0.1nm以上且5nm以下左右。藉此,能夠效率良好地自作為陰極之對向電極105向電子傳輸層134注入電子。 The thickness of the electron injection layer 135 is not particularly limited, but is preferably about 0.01 nm or more and 10 nm or less, and more preferably about 0.1 nm or more and 5 nm or less. Thereby, it is possible to efficiently inject electrons into the electron transport layer 134 from the counter electrode 105 serving as the cathode.

繼而,於步驟S4之對向電極形成步驟中,以被覆電子注入層135之方式形成作為陰極之對向電極105。作為對向電極105之構成材料,較佳為使用功函數較小之材料,並且,為了能夠採用真空蒸鍍法等氣相製程而形成,例如使用Li、Mg、Ca、Sr、La、Ce、Er、Eu、Sc、Y、Yb、Ag、Cu、Al、Cs、Rb、Au或包含該等之合金等,可將該等中之1種或2種以上組合(例如多層之積層體等)使用。 Then, in the counter electrode forming step of step S4, the counter electrode 105 as a cathode is formed so as to cover the electron injection layer 135. As the constituent material of the counter electrode 105, it is preferable to use a material with a small work function, and in order to be formed by a gas phase process such as a vacuum evaporation method, for example, Li, Mg, Ca, Sr, La, Ce, Er, Eu, Sc, Y, Yb, Ag, Cu, Al, Cs, Rb, Au or alloys containing them, etc., one or more of these can be combined (for example, multilayer laminates, etc.) use.

尤其如本實施形態般將有機EL裝置100設為頂部發光方式之情形時,作為對向電極105之構成材料,較佳為使用Mg、Al、Ag、Au等金屬或MgAg、MgAl、MgAu、AlAg等合金。藉由使用上述金屬或合金,能夠維持對向電極105之光透過性,且實現提高對向電極105之電 子注入效率及穩定性。 Especially when the organic EL device 100 is set to the top emission method as in this embodiment, as the constituent material of the counter electrode 105, it is preferable to use metals such as Mg, Al, Ag, Au, or MgAg, MgAl, MgAu, AlAg And other alloys. By using the above-mentioned metal or alloy, the light transmittance of the counter electrode 105 can be maintained, and the electricity of the counter electrode 105 can be improved. Sub injection efficiency and stability.

頂部發光方式時之對向電極105之膜厚無特別限定,較佳為1nm以上且50nm以下左右,更佳為5nm以上且20nm以下左右。 The film thickness of the counter electrode 105 in the top emission method is not particularly limited, but is preferably about 1 nm or more and 50 nm or less, and more preferably about 5 nm or more and 20 nm or less.

再者,於將有機EL裝置100設為底部發光方式之情形時,不要求對向電極105具有光透過性。因此,較佳地使用例如Al、Ag、AlAg、AlNd等金屬或合金。藉由使用上述金屬或合金作為對向電極105之構成材料,能夠實現提高對向電極105之電子注入效率及穩定性。 Furthermore, when the organic EL device 100 is set to the bottom emission method, the counter electrode 105 is not required to have light permeability. Therefore, metals or alloys such as Al, Ag, AlAg, and AlNd are preferably used. By using the aforementioned metal or alloy as the constituent material of the counter electrode 105, it is possible to improve the electron injection efficiency and stability of the counter electrode 105.

底部發光方式時之對向電極105之膜厚無特別限定,較佳為50nm以上且1000nm以下左右,更佳為100nm以上且500nm以下左右。 The film thickness of the counter electrode 105 in the bottom emission method is not particularly limited, but is preferably about 50 nm or more and 1000 nm or less, and more preferably about 100 nm or more and 500 nm or less.

如圖3(d)所示,藉由上述製造方法所形成之有機EL元件130若例如來自外部之水分或氧氣等浸入至其中,則損害機能層136之發光機能,出現局部發光亮度降低或不發光之暗點(dark spot)。又,存在發光壽命變短之虞。因此,為了保護有機EL元件130免受水分或氧氣等之侵害,較佳為由密封層(省略圖式)進行被覆。作為密封層,可使用例如水分或氧氣等之透過性較低之氮氧化矽(SiON)等無機絕緣材料。進而,例如可將透明玻璃等密封基板經由接著劑而貼附於形成有有機EL元件130之元件基板101,藉此密封有機EL元件130。 As shown in FIG. 3(d), if the organic EL element 130 formed by the above-mentioned manufacturing method is impregnated with moisture or oxygen from the outside, the light-emitting function of the functional layer 136 is impaired, and local light-emitting brightness is reduced or not. The dark spot of light. In addition, there is a possibility that the emission lifetime may be shortened. Therefore, in order to protect the organic EL element 130 from moisture, oxygen, etc., it is preferable to coat it with a sealing layer (illustration omitted). As the sealing layer, an inorganic insulating material such as silicon oxynitride (SiON), which has low permeability such as moisture or oxygen, can be used. Furthermore, for example, a sealing substrate such as transparent glass may be attached to the element substrate 101 on which the organic EL element 130 is formed via an adhesive, thereby sealing the organic EL element 130.

上述有機EL元件130之製造方法中,利用液相製程(噴墨法)形成機能層136中之電洞注入層131、電洞傳輸層132、發光層133,但只要利用液相製程(噴墨法)形成該等層中之1者即可,其他層可採用真空蒸鍍等氣相製程而形成。 In the above-mentioned manufacturing method of the organic EL element 130, the hole injection layer 131, the hole transport layer 132, and the light-emitting layer 133 in the functional layer 136 are formed by a liquid phase process (inkjet method), but only a liquid phase process (inkjet method) Method) It is sufficient to form one of these layers, and the other layers can be formed by a gas phase process such as vacuum evaporation.

繼而,關於電洞注入層131、電洞傳輸層132、發光層133,對可於液相製程或氣相製程中使用之構成材料進行說明。 Next, regarding the hole injection layer 131, the hole transport layer 132, and the light emitting layer 133, the constituent materials that can be used in the liquid phase process or the gas phase process are described.

[電洞注入傳輸材料(HIL及HTL材料)] [Hole injection transport materials (HIL and HTL materials)]

作為適於形成電洞注入層(HIL)131或電洞傳輸層(HTL)132之電洞注入傳輸材料,無特別限定,可單獨或組合使用各種p型高分子材料 或各種p型低分子材料。 As a hole injection and transport material suitable for forming the hole injection layer (HIL) 131 or the hole transport layer (HTL) 132, there is no particular limitation, and various p-type polymer materials can be used alone or in combination Or various p-type low-molecular-weight materials.

作為p型高分子材料(有機聚合物),例如可列舉:聚(2,7-(9,9-二-正辛基茀)-(1,4-伸苯基-((4-第二丁基苯基)亞胺基)-1,4-伸苯基))(TFB)等聚芳基胺之類的具有芳基胺骨架之芳香族胺系化合物、茀-聯噻吩共聚物之類的具有茀骨架之聚茀衍生物或茀-芳基胺共聚物之類的具有芳基胺骨架及茀骨架兩者之聚茀衍生物(PF)、聚(N-乙烯基咔唑)(PVK)、聚乙烯基芘、聚乙烯基蒽、聚噻吩、聚烷基噻吩、聚己基噻吩、聚(對苯乙炔)(PPV)、聚噻吩乙烯(poly(thienylene vinylene)、芘甲醛樹脂、乙基咔唑甲醛樹脂或其衍生物、聚甲基苯基矽烷(PMPS)等聚矽烷系、聚[雙(4-苯基)(2,4,6-三甲基苯基)胺])(PTTA)、聚[N,N'-雙(4-丁基苯基)-N,N'-雙(苯基)-聯苯胺]等。 As the p-type polymer material (organic polymer), for example, poly(2,7-(9,9-di-n-octylpyrene)-(1,4-phenylene-((4-second (Butylphenyl)imino)-1,4-phenylene))(TFB) and other aromatic amine compounds with arylamine skeleton such as polyarylamines, stilbene-bithiophene copolymers, etc. Polypyridine derivatives with a pyrene skeleton or polypyridine derivatives (PF), poly(N-vinylcarbazole) (PVK ), polyvinylpyrene, polyvinylanthracene, polythiophene, polyalkylthiophene, polyhexylthiophene, poly(p-phenylene vinylene) (PPV), poly(thienylene vinylene), pyrene formaldehyde resin, ethyl Carbazole formaldehyde resin or its derivatives, polymethyl phenyl silane (PMPS) and other polysiloxane series, poly[bis(4-phenyl)(2,4,6-trimethylphenyl)amine])(PTTA ), poly[N,N'-bis(4-butylphenyl)-N,N'-bis(phenyl)-benzidine], etc.

上述p型高分子材料亦可以與其他化合物之混合物之形式使用。作為一例,可列舉:作為含有聚噻吩之混合物的聚(3,4-乙二氧基噻吩/苯乙烯磺酸)(PEDOT/PSS)、綜研化學製造之導電性聚合物VERAZOL(商標)等、作為聚苯胺之日產化學製造之ELsource(商標)。 The aforementioned p-type polymer material can also be used in the form of a mixture with other compounds. As an example, poly(3,4-ethylenedioxythiophene/styrene sulfonic acid) (PEDOT/PSS) as a mixture containing polythiophene, conductive polymer VERAZOL (trademark) manufactured by Soken Chemical, etc., ELsource (trademark) manufactured by Nissan Chemical as a polyaniline.

作為p型低分子材料,例如可列舉:1,1-雙(4-二-對甲苯基胺基苯基)環己烷、1,1'-雙(4-二-對甲苯基胺基苯基)-4-苯基-環己烷(TAPC)之類的芳基環烷烴系化合物,4,4',4"-三甲基三苯基胺、N,N'-二苯基-N,N'-雙(3-甲基苯基)-1,1'-聯苯基-4,4'-二胺(TPD)、N,N,N',N'-四苯基-1,1'-聯苯基-4,4'-二胺、N,N'-二苯基-N,N'-雙(3-甲基苯基)-1,1'-聯苯基-4,4'-二胺(TPD1)、N,N'-二苯基-N,N'-雙(4-甲氧基苯基)-1,1'-聯苯基-4,4'-二胺(TPD2)、N,N,N',N'-四(4-甲氧基苯基)-1,1'-聯苯基-4,4'-二胺(TPD3)、N,N'-雙(1-萘基)-N,N'-二苯基-1,1'-聯苯基-4,4'-二胺(α-NPD)、三苯基胺-四聚物(TPTE)、1,3,5-三-[4-(二苯基胺基)苯](TDAPB)、三-(4-咔唑-9-基-苯基)-胺(螺環(spiro-)TAD)、三-對甲苯基胺(HTM1)、1,1-雙[(二-4-甲苯基胺基)苯基]環己烷(HTM2)、 N4,N4'-(聯苯基-4,4'-二基)雙(N4,N4',N4'-三苯基聯苯基-4,4'-二胺)(TPT1)之類的芳基胺系化合物,N,N,N',N'-四苯基-對苯二胺、N,N,N',N'-四(對甲苯基)-對苯二胺、N,N,N',N'-四(間甲苯基)-間苯二胺(PDA)、PDA-Si(Mol.Cryst.Liq.Cryst.Vol.462.pp.249-256,2007)、N,N'-二苯基-1,4-苯二胺(DPPD)之類的苯二胺系化合物,咔唑、N-異丙基咔唑、N-苯基咔唑、VB-TCA(Adv.Mater.2007,19,300-304)之類的咔唑系化合物,茋、4-二-對甲苯基胺基茋之類的茋系化合物,OxZ之類的

Figure 105108883-A0202-12-0016-26
唑系化合物,三苯基甲烷、4,4',4"-三(N-3-甲基苯基-N-苯基胺基)三苯基胺(m-MTDATA)、4,4',4"-三(N,N-(2-萘基)苯基胺基)三苯基胺(2-TNATA)、4,4',4"-三(N-咔唑基)三苯基胺(TCTA)之類的三苯基甲烷系化合物,1-苯基-3-(對二甲胺基苯基)吡唑啉之類的吡唑啉系化合物,苯炔(環己二烯)系化合物,三唑之類的三唑系化合物,咪唑之類的咪唑系化合物,1,3,4-
Figure 105108883-A0202-12-0016-28
二唑、2,5-二(4-二甲胺基苯基)-1,3,4-
Figure 105108883-A0202-12-0016-29
二唑之類的
Figure 105108883-A0202-12-0016-30
二唑系化合物,蒽、9-(4-二乙胺基苯乙烯基)蒽之類的蒽系化合物,茀酮、2,4,7-三硝基-9-茀酮、2,7-雙(2-羥基-3-(2-氯苯基胺甲醯基)-1-萘基偶氮)茀酮之類的茀酮系化合物,聚苯胺之類的苯胺系化合物,矽烷系化合物,1,4-二硫酮-3,6-二苯基-吡咯-(3,4-c)吡咯并吡咯之類的吡咯系化合物,Flowlen之類的Flowlen系化合物,卟啉、金屬四苯基卟啉之類的卟啉系化合物,喹吖啶酮之類的喹吖啶酮系化合物,酞菁、酞菁銅(CuPc)、四(第三丁基)酞菁銅、酞菁鐵之類的金屬或無金屬之酞菁系化合物,萘酚菁銅、萘酚菁氧釩、單氯萘酚菁鎵之類的金屬或無金屬之萘酚菁系化合物,N,N'-二(萘-1-基)-N,N'-二苯基-聯苯胺、N,N,N',N'-四苯基聯苯胺之類的聯苯胺系化合物等。再者,PDA-Si為了實現高分子化,於其中添加使用陽離子聚合性化合物:二甲苯雙氧雜環丁烷(東亞合成,Aron Oxetane OXT-121)、自由基聚合起始劑:脂肪族系過氧化雙乙醯基(PEROYL L,日本油脂股 份有限公司)。 Examples of p-type low-molecular materials include: 1,1-bis(4-di-p-tolylaminophenyl) cyclohexane, 1,1'-bis(4-di-p-tolylaminophenyl) Yl)-4-phenyl-cyclohexane (TAPC) and other aryl cycloalkane compounds, 4,4',4"-trimethyltriphenylamine, N,N'-diphenyl-N ,N'-bis(3-methylphenyl)-1,1'-biphenyl-4,4'-diamine (TPD), N,N,N',N'-tetraphenyl-1, 1'-biphenyl-4,4'-diamine, N,N'-diphenyl-N,N'-bis(3-methylphenyl)-1,1'-biphenyl-4, 4'-diamine (TPD1), N,N'-diphenyl-N,N'-bis(4-methoxyphenyl)-1,1'-biphenyl-4,4'-diamine (TPD2), N,N,N',N'-Tetra(4-methoxyphenyl)-1,1'-biphenyl-4,4'-diamine (TPD3), N,N'- Bis(1-naphthyl)-N,N'-diphenyl-1,1'-biphenyl-4,4'-diamine (α-NPD), triphenylamine-tetramer (TPTE) , 1,3,5-tris-[4-(diphenylamino)benzene](TDAPB), tris-(4-carbazol-9-yl-phenyl)-amine (spiro-) TAD ), tris-p-tolylamine (HTM1), 1,1-bis[(di-4-tolylamino)phenyl]cyclohexane (HTM2), N4,N4'-(biphenyl-4, 4'-diyl) bis(N4,N4',N4'-triphenylbiphenyl-4,4'-diamine)(TPT1) and other arylamine compounds, N,N,N', N'-tetraphenyl-p-phenylenediamine, N,N,N',N'-tetra(p-tolyl)-p-phenylenediamine, N,N,N',N'-tetra(m-tolyl) -M-phenylenediamine (PDA), PDA-Si (Mol.Cryst.Liq.Cryst.Vol.462.pp.249-256,2007), N,N'-diphenyl-1,4-phenylenediamine (DPPD) and other phenylenediamine compounds, carbazole, N-isopropylcarbazole, N-phenylcarbazole, VB-TCA (Adv.Mater.2007,19,300-304) Compounds, stilbene compounds such as stilbene, 4-di-p-tolylamino stilbene, OxZ and the like
Figure 105108883-A0202-12-0016-26
Azole compounds, triphenylmethane, 4,4',4"-tris(N-3-methylphenyl-N-phenylamino) triphenylamine (m-MTDATA), 4,4', 4"-tris(N,N-(2-naphthyl)phenylamino)triphenylamine (2-TNATA), 4,4',4"-tris(N-carbazolyl)triphenylamine (TCTA) and other triphenylmethane compounds, 1-phenyl-3-(p-dimethylaminophenyl) pyrazoline and other pyrazoline compounds, benzyne (cyclohexadiene) Compounds, triazole compounds such as triazole, imidazole compounds such as imidazole, 1,3,4-
Figure 105108883-A0202-12-0016-28
Diazole, 2,5-bis(4-dimethylaminophenyl)-1,3,4-
Figure 105108883-A0202-12-0016-29
Diazole and the like
Figure 105108883-A0202-12-0016-30
Diazole compounds, anthracene compounds such as anthracene, 9-(4-diethylaminostyryl)anthracene, quinone, 2,4,7-trinitro-9-quinone, 2,7- Bis(2-hydroxy-3-(2-chlorophenylaminomethanyl)-1-naphthylazo) ketone compounds such as quinones, aniline compounds such as polyaniline, silane compounds, 1,4-Dithione-3,6-diphenyl-pyrrole-(3,4-c)pyrrolopyrrole and other pyrrole compounds, Flowlen and other Flowlen compounds, porphyrin, metal tetraphenyl Porphyrin compounds such as porphyrins, quinacridone compounds such as quinacridones, phthalocyanine, copper phthalocyanine (CuPc), copper tetra(tertiary) phthalocyanine, iron phthalocyanine, etc. Metal or metal-free phthalocyanine compounds, copper naphthol cyanine, vanadyl naphthocyanine, monochloronaphthol cyanine gallium or metal-free naphthocyanine compounds, N,N'-bis(naphthalene -1-yl)-N,N'-diphenyl-benzidine, N,N,N',N'-tetraphenylbenzidine and other benzidine-based compounds. Furthermore, in order to realize high molecular weight PDA-Si, a cationic polymerizable compound: xylene dioxetane (Aron Oxetane OXT-121) and a radical polymerization initiator: aliphatic are added to it. Diacetyl peroxide (PEROYL L, Nippon Oil & Fat Co., Ltd.).

繼而,關於獲得螢光或磷光之發光材料(EML材料),針對各發光色,列舉具體例而說明。 Next, regarding the luminescent material (EML material) that obtains fluorescence or phosphorescence, specific examples will be given for each luminescent color and explained.

[紅色發光材料] [Red luminescent material]

首先,作為紅色發光材料,無特別限定,可使用各種紅色螢光材料、紅色磷光材料中之1種或將2種以上組合使用。 First, the red light-emitting material is not particularly limited, and one of various red fluorescent materials and red phosphorescent materials or a combination of two or more can be used.

作為紅色螢光材料,只要為發出紅色螢光者則無特別限定,例如可列舉:苝衍生物、銪錯合物、苯并吡喃衍生物、若丹明衍生物、苯并硫

Figure 105108883-A0202-12-0017-24
衍生物、卟啉衍生物、尼祿紅、2-(1,1-二甲基乙基)-6-(2-(2,3,6,7-四氫-1,1,7,7-四甲基-1H,5H-苯并(ij)喹
Figure 105108883-A0202-12-0017-25
-9-基)乙烯基)-4H-吡喃-4H-亞基)丙烷二腈(DCJTB)、4-(二氰基亞甲基)-2-甲基-6-(對二甲胺基苯乙烯基)-4H-吡喃(DCM)、聚[2-甲氧基-5-(2-乙基己氧基)-1,4-(1-氰基伸乙烯基伸苯基)]、聚[{9,9-二己基-2,7-雙(1-氰基伸乙烯基)伸茀基}鄰-共聚-{2,5-雙(N,N'-二苯基胺基)-1,4-伸苯基}]、聚[{2-甲氧基-5-(2-乙基己氧基)-1,4-(1-氰基伸乙烯基伸苯基)}-共聚-{2,5-雙(N,N'-二苯基胺基)-1,4-伸苯基}]等。 The red fluorescent material is not particularly limited as long as it emits red fluorescence, and examples include perylene derivatives, europium complexes, benzopyran derivatives, rhodamine derivatives, and benzosulfur.
Figure 105108883-A0202-12-0017-24
Derivatives, porphyrin derivatives, Nero Red, 2-(1,1-dimethylethyl)-6-(2-(2,3,6,7-tetrahydro-1,1,7,7 -Tetramethyl-1H,5H-benzo(ij)quine
Figure 105108883-A0202-12-0017-25
-9-yl)vinyl)-4H-pyran-4H-ylidene)propane dinitrile (DCJTB), 4-(dicyanomethylene)-2-methyl-6-(p-dimethylamino) Styryl)-4H-pyran (DCM), poly[2-methoxy-5-(2-ethylhexyloxy)-1,4-(1-cyanovinylene)], poly [{9,9-Dihexyl-2,7-bis(1-cyanovinylidene) phenylene} o-copolymer-{2,5-bis(N,N'-diphenylamino)-1 ,4-Phenylene}], poly[{2-methoxy-5-(2-ethylhexyloxy)-1,4-(1-cyano vinylene)}-copolymerization-{2 , 5-bis(N,N'-diphenylamino)-1,4-phenylene}] and the like.

作為紅色磷光材料,只要為發出紅色磷光者則無特別限定,例如可列舉:銥、釕、鉑、鋨、錸、鈀等之金屬錯合物,亦可列舉該等金屬錯合物之配位基中之至少1者具有苯基吡啶骨架、聯吡啶骨架、卟啉骨架等者。更具體而言,可列舉:三(1-苯基異喹啉)銥、雙[2-(2'-苯并[4,5-α]噻吩基)吡啶-N,C3'](乙醯丙酮)合銥(Btp2Ir(acac))、2,3,7,8,12,13,17,18-八乙基-12H,23H-卟啉-鉑(II)、面式-三(2-苯基)-雙(2-(2'-苯并[4,5-α]噻吩基)吡啶-N,C3'](乙醯丙酮)合銥(Bt2Ir(acac))、雙(2-苯基吡啶)(乙醯丙酮)合銥等。 The red phosphorescent material is not particularly limited as long as it emits red phosphorescence. Examples include metal complexes such as iridium, ruthenium, platinum, osmium, rhenium, and palladium, and coordination of these metal complexes. At least one of the groups has a phenylpyridine skeleton, a bipyridine skeleton, a porphyrin skeleton, or the like. More specifically, examples include: tris(1-phenylisoquinoline)iridium, bis[2-(2'-benzo[4,5-α]thienyl)pyridine-N,C3'](acetyl Acetone) iridium (Btp2Ir(acac)), 2,3,7,8,12,13,17,18-octaethyl-12H,23H-porphyrin-platinum(II), face-tris(2- Phenyl)-bis(2-(2'-benzo[4,5-α]thienyl)pyridine-N,C3'](acetone) iridium (Bt2Ir(acac)), bis(2-benzene Base pyridine) (acetone) and iridium.

又,紅色之發光層133中除上述紅色發光材料以外,亦可包含添加有紅色發光材料作為客體材料之主體材料。 In addition, the red light-emitting layer 133 may also include a host material added with a red light-emitting material as a guest material in addition to the above-mentioned red light-emitting material.

主體材料具有如下機能:使電洞與電子再結合而生成激子,並使該激子之能量遷移(Forster遷移或Dexter遷移)至紅色發光材料,而激發紅色發光材料。於使用上述主體材料之情形時,例如可將客體材料即紅色發光材料作為摻雜劑摻入主體材料中使用。 The host material has the function of recombining holes and electrons to generate excitons, and transferring the energy of the excitons (Forster migration or Dexter migration) to the red luminescent material to excite the red luminescent material. In the case of using the above-mentioned host material, for example, the guest material, that is, a red luminescent material, can be used as a dopant incorporated into the host material.

作為上述主體材料,只要為對所使用之紅色發光材料發揮如上所述之機能者,則無特別限定,於紅色發光材料包含紅色螢光材料之情形時,例如可列舉:稠四苯衍生物、萘衍生物、蒽衍生物之類的並苯衍生物(並苯系材料)、二苯乙烯基伸芳基衍生物、苝衍生物、二苯乙烯基苯衍生物、二苯乙烯基胺衍生物、三(8-羥基喹啉)鋁錯合物(Alq3)等羥基喹啉系金屬錯合物(BAql)、三苯基胺之四聚物等三芳基胺衍生物(TDAPB)、

Figure 105108883-A0202-12-0018-22
二唑衍生物、矽羅衍生物(SimCP、UGH3)、二咔唑衍生物(CBP、mCP、CDBP、DCB)、寡聚噻吩衍生物、苯并吡喃衍生物、三唑衍生物、苯并
Figure 105108883-A0202-12-0018-23
唑衍生物、苯并噻唑衍生物、喹啉衍生物、4,4'-雙(2,2'-二苯基乙烯基)聯苯(DPVBi)、磷衍生物(PO6)等,亦可將該等中之1種或2種以上組合使用。 The host material is not particularly limited as long as it exhibits the above-mentioned function for the red light-emitting material used. When the red light-emitting material contains a red fluorescent material, for example, fused tetrabenzene derivatives, Acene derivatives such as naphthalene derivatives, anthracene derivatives (acene-based materials), stilbene derivatives, perylene derivatives, stilbene benzene derivatives, stilbene amine derivatives, Tris (8-hydroxyquinoline) aluminum complex (Alq3) and other hydroxyquinoline metal complexes (BAql), triphenylamine tetramer and other triarylamine derivatives (TDAPB),
Figure 105108883-A0202-12-0018-22
Diazole derivatives, Silox derivatives (SimCP, UGH3), dicarbazole derivatives (CBP, mCP, CDBP, DCB), oligothiophene derivatives, benzopyran derivatives, triazole derivatives, benzo
Figure 105108883-A0202-12-0018-23
Azole derivatives, benzothiazole derivatives, quinoline derivatives, 4,4'-bis(2,2'-diphenylvinyl)biphenyl (DPVBi), phosphorus derivatives (PO6), etc. One or two or more of these are used in combination.

於使用如上所述之紅色發光材料(客體材料)及主體材料之情形時,紅色之發光層133中之紅色發光材料之含量(摻雜量)較佳為0.01~10wt%,更佳為0.1~5wt%。藉由將紅色發光材料之含量設於上述範圍內,能夠使發光效率實現最佳化。 In the case of using the red luminescent material (guest material) and host material as described above, the content (doping amount) of the red luminescent material in the red luminescent layer 133 is preferably 0.01~10wt%, more preferably 0.1~ 5wt%. By setting the content of the red luminescent material within the above range, the luminous efficiency can be optimized.

[綠色發光材料] [Green luminescent material]

作為綠色發光材料,無特別限定,例如可列舉各種綠色螢光材料及綠色磷光材料,可將該等中之1種或2種以上組合使用。 The green light-emitting material is not particularly limited. For example, various green fluorescent materials and green phosphorescent materials can be cited, and one or two or more of these can be used in combination.

作為綠色螢光材料,只要為發出綠色螢光者,則無特別限定,例如可列舉:香豆素衍生物、喹吖啶酮及其衍生物、9,10-雙[(9-乙基-3-咔唑)-伸乙烯基]-蒽、聚(9,9-二己基-2,7-伸乙烯基伸茀基)、聚[(9,9-二辛基茀-2,7-二基)-共聚-(1,4-二伸苯基-伸乙烯基-2-甲氧基-5-{2-乙 基己氧基}苯)]、聚[(9,9-二辛基-2,7-二伸乙烯基伸茀基)-鄰-共聚-(2-甲氧基-5-(2-乙氧基己氧基)-1,4-伸苯基)]、聚[(9,9-二辛基茀-2,7-二基)-鄰-共聚-(1,4-苯并-{2,1',3}-噻二唑)](F8BT)等。 The green fluorescent material is not particularly limited as long as it emits green fluorescence, and examples include coumarin derivatives, quinacridones and their derivatives, 9,10-bis[(9-ethyl- 3-carbazole)-vinylidene]-anthracene, poly(9,9-dihexyl-2,7-vinylidene), poly[(9,9-dioctylethylene-2,7-di Group)-co-(1,4-diphenylene-vinylene-2-methoxy-5-{2-ethyl Hexyloxy}benzene)], poly[(9,9-dioctyl-2,7-divinylidene)-o-copolymer-(2-methoxy-5-(2-ethoxy Hexyloxy)-1,4-phenylene)], poly[(9,9-dioctylpyrene-2,7-diyl)-o-copolymer-(1,4-benzo-{2 ,1',3}-thiadiazole)](F8BT) and so on.

作為綠色磷光材料,只要為發出綠色磷光者,則無特別限定,例如可列舉:銥、釕、鉑、鋨、錸、鈀等之金屬錯合物,具體而言,可列舉:面式-三(2-苯基吡啶)銥(Ir(ppy)3)、雙(2-苯基吡啶-N,C2')(乙醯丙酮)合銥(Ppy2Ir(acac))、面式-三[5-氟-2-(5-三氟甲基-2-吡啶)苯基-C,N]銥等。 The green phosphorescent material is not particularly limited as long as it emits green phosphorescence. Examples include metal complexes such as iridium, ruthenium, platinum, osmium, rhenium, and palladium. Specifically, they include: (2-Phenylpyridine)iridium (Ir(ppy)3), bis(2-phenylpyridine-N,C2')(acetone) iridium (Ppy2Ir(acac)), face-tris(5- Fluoro-2-(5-trifluoromethyl-2-pyridine)phenyl-C,N]iridium and the like.

又,綠色之發光層133中除上述綠色發光材料以外,亦可包含添加有綠色發光材料作為客體材料之主體材料。 In addition, the green light-emitting layer 133 may also include a host material added with a green light-emitting material as a guest material in addition to the above-mentioned green light-emitting material.

作為上述主體材料,可使用與上述紅色之發光層133中所說明之主體材料相同者。 As the host material, the same as the host material described in the red light-emitting layer 133 can be used.

[藍色發光材料] [Blue Luminescent Material]

作為藍色發光材料,例如可列舉各種藍色螢光材料及藍色磷光材料,可將該等中之1種或2種以上組合使用。 As the blue light-emitting material, for example, various blue fluorescent materials and blue phosphorescent materials can be cited, and one or two or more of these can be used in combination.

作為藍色螢光材料,只要為發出藍色螢光者,則無特別限定,例如可列舉:二苯乙烯基二胺系化合物等二苯乙烯基胺衍生物、螢蒽衍生物、芘衍生物、苝及苝衍生物、蒽衍生物、苯并

Figure 105108883-A0202-12-0019-20
唑衍生物、苯并噻唑衍生物、苯并咪唑衍生物、
Figure 105108883-A0202-12-0019-21
衍生物、菲衍生物、二苯乙烯基苯衍生物、四苯基丁二烯、4,4'-雙(9-乙基-3-咔唑伸乙烯基)-1,1'-聯苯(BCzVBi)、聚[(9,9-二辛基茀-2,7-二基)-共聚-(2,5-二甲氧基苯-1,4-二基)]、聚[(9,9-二己氧基茀-2,7-二基)-鄰-共聚-(2-甲氧基-5-{2-乙氧基己氧基}伸苯基-1,4-二基)]、聚[(9,9-二辛基茀-2,7-二基)-共聚-(乙炔基苯)]、聚[(9,9-二辛基茀-2,7-二基)-共聚-(N,N'-二苯基)-N,N'-二(對丁基苯基)-1,4-二胺基-苯]]等。 The blue fluorescent material is not particularly limited as long as it emits blue fluorescence. Examples include stilbene amine derivatives such as stilbene diamine compounds, fluoranthene derivatives, and pyrene derivatives. , Perylene and perylene derivatives, anthracene derivatives, benzo
Figure 105108883-A0202-12-0019-20
Azole derivatives, benzothiazole derivatives, benzimidazole derivatives,
Figure 105108883-A0202-12-0019-21
Derivatives, phenanthrene derivatives, stilbene benzene derivatives, tetraphenylbutadiene, 4,4'-bis(9-ethyl-3-carbazole vinylidene)-1,1'-biphenyl (BCzVBi), poly[(9,9-dioctylpyridine-2,7-diyl)-copolymer-(2,5-dimethoxybenzene-1,4-diyl)], poly[(9 ,9-Dihexyloxy-2,7-diyl)-o-co-(2-methoxy-5-{2-ethoxyhexyloxy}phenylene-1,4-diyl )], poly[(9,9-dioctyl -2,7-diyl)-co-(ethynylbenzene)], poly[(9,9-dioctyl -2,7-diyl )-Copolymerization-(N,N'-diphenyl)-N,N'-bis(p-butylphenyl)-1,4-diamino-benzene]] etc.

作為藍色磷光材料,只要為發出藍色磷光者,則無特別限定, 例如可列舉銥、釕、鉑、鋨、錸、鈀等之金屬錯合物,具體而言,可列舉:雙[4,6-二氟苯基吡啶-N,C2']-吡啶甲醯合銥(FIrpic)、三(1-苯基-3-甲基苯并咪唑啉-2-亞基-C,C2')(Ir(pmb)3)、雙(2,4-二氟苯基吡啶)(5-(吡啶-2-基)-1H-四唑)銥(FIrN4)、三[2-(2,4-二氟苯基)吡啶-N,C2']銥、雙[2-(3,5-三氟甲基)吡啶-N,C2']-吡啶甲醯合銥、雙(4,6-二氟苯基吡啶-N,C2')(乙醯丙酮)合銥等。 The blue phosphorescent material is not particularly limited as long as it emits blue phosphorescence. For example, metal complexes such as iridium, ruthenium, platinum, osmium, rhenium, palladium, etc. can be cited, specifically, bis[4,6-difluorophenylpyridine-N,C2']-picolinic acid Iridium (FIrpic), tris(1-phenyl-3-methylbenzimidazolin-2-ylidene-C,C2')(Ir(pmb)3), bis(2,4-difluorophenylpyridine) )(5-(pyridin-2-yl)-1H-tetrazole)iridium (FIrN4), tris[2-(2,4-difluorophenyl)pyridine-N,C2']iridium, bis[2-( 3,5-Trifluoromethyl)pyridine-N,C2']-pyridinecarboxamide iridium, bis(4,6-difluorophenylpyridine-N,C2')(acetone) iridium, etc.

又,藍色之發光層133中除上述藍色發光材料以外,亦可包含添加有藍色發光材料作為客體材料之主體材料。 In addition, the blue light-emitting layer 133 may also include a host material added with a blue light-emitting material as a guest material in addition to the blue light-emitting material described above.

作為上述主體材料,可使用與上述紅色之發光層133中所說明之主體材料相同者。 As the host material, the same as the host material described in the red light-emitting layer 133 can be used.

再者,本實施形態中,所謂低分子係指分子量未達1000者,所謂高分子係指分子量為1000以上、且具有由基本骨架重複而成之結構者。 In addition, in this embodiment, the term "low molecular weight" refers to those having a molecular weight of less than 1,000, and the term "high molecular weight" refers to those having a molecular weight of 1,000 or more and having a structure in which a basic skeleton is repeated.

<機能層形成用組合物> <Composition for forming functional layer>

其次,對本實施形態之機能層形成用組合物進行說明。利用液相製程(噴墨法)形成本實施形態之有機EL元件130之機能層136中之電洞注入層131、電洞傳輸層132、發光層133各者時較佳之機能層形成用組合物之基本構成如下所述。 Next, the composition for forming a functional layer of this embodiment will be described. The composition for forming a functional layer is preferable when forming each of the hole injection layer 131, the hole transport layer 132, and the light-emitting layer 133 in the functional layer 136 of the organic EL device 130 of this embodiment by a liquid phase process (inkjet method) The basic structure is as follows.

機能層形成用組合物包含機能層形成用固形物成分、具有吸電子基之第1芳香族溶劑、及具有供電子基之第2芳香族溶劑,且第2芳香族溶劑之沸點高於第1芳香族溶劑之沸點。 The composition for forming a functional layer includes a solid component for forming a functional layer, a first aromatic solvent having an electron withdrawing group, and a second aromatic solvent having an electron donating group, and the second aromatic solvent has a higher boiling point than the first The boiling point of aromatic solvents.

又,於使用噴墨法時,考慮到能夠自噴墨頭之噴嘴穩定地噴出機能層形成用組合物(噴出穩定性)、使所成膜之機能層136獲得膜平坦性,而對溶劑之選擇與含有比率進行設定。又,以包含所成膜之機能層136之有機EL元件130獲得所需元件特性之方式對溶劑之選擇與含有比率進行設定。 In addition, when the inkjet method is used, it is considered that the composition for forming the functional layer can be stably discharged from the nozzle of the inkjet head (discharge stability), so that the formed functional layer 136 can obtain film flatness. Select and set the content ratio. In addition, the selection of the solvent and the content ratio are set in such a way that the organic EL device 130 including the functional layer 136 formed into the film obtains the desired device characteristics.

<第1芳香族溶劑> <The first aromatic solvent>

具有吸電子基之第1芳香族溶劑對機能層形成用固形物成分(有機EL材料)具有優異之溶解性(良溶劑),考慮到噴出穩定性,沸點(bp)較佳為200℃以上。具體而言,可列舉:具有硝基(-NO2基)作為吸電子基之硝基苯(bp:210℃)、2,3-二甲基硝基苯(bp:245℃)、2,4-二甲基硝基苯(bp:245℃)等。 The first aromatic solvent having an electron withdrawing group has excellent solubility (good solvent) for the solid component (organic EL material) for forming a functional layer, and considering the ejection stability, the boiling point (bp) is preferably 200°C or higher. Specifically, examples include: nitrobenzene (bp: 210°C) having a nitro group (-NO 2 group) as an electron withdrawing group, 2,3-dimethylnitrobenzene (bp: 245°C), 2, 4-Dimethylnitrobenzene (bp: 245°C) and the like.

<第2芳香族溶劑> <The second aromatic solvent>

具有供電子基之第2芳香族溶劑可未必為機能層形成用固形物成分(有機EL材料)之良溶劑,較佳為沸點(bp)高於第1芳香族溶劑而為250℃以上。具體而言,可列舉:具有烷氧基(-OR基)或胺基(-NH3基)作為供電子基之α,α,4-三甲氧基甲苯(bp:253℃)、二苯醚(bp:258℃)、3-苯氧基甲苯(bp:272℃)、苄基苯基醚(bp:288℃)、胺基聯苯(bp:299℃)、二苯基胺(bp:302℃)。再者,烷氧基之R並不限於烷基,亦可為苯基。又,考慮到第2芳香族溶劑之乾燥性,沸點(bp)較佳為350℃以下。 The second aromatic solvent having an electron donating group may not necessarily be a good solvent for the solid component (organic EL material) for forming a functional layer, and preferably has a boiling point (bp) higher than that of the first aromatic solvent and 250°C or higher. Specifically, examples include α,α,4-trimethoxytoluene (bp: 253°C) and diphenyl ether having an alkoxy group (-OR group) or an amino group (-NH 3 group) as an electron donating group (bp: 258°C), 3-phenoxytoluene (bp: 272°C), benzyl phenyl ether (bp: 288°C), aminobiphenyl (bp: 299°C), diphenylamine (bp: 302°C). Furthermore, R of the alkoxy group is not limited to the alkyl group, and may be a phenyl group. Furthermore, considering the drying properties of the second aromatic solvent, the boiling point (bp) is preferably 350°C or lower.

<機能層形成用組合物之製造方法> <Method for producing composition for forming functional layer>

本實施形態之機能層形成用組合物之製造方法包括:使機能層形成用固形物成分溶解於具有吸電子基之第1芳香族溶劑的步驟、與於溶解有機能層形成用固形物成分之第1芳香族溶劑中添加具有供電子基之第2芳香族溶劑的步驟。如上所述,第1芳香族溶劑對作為機能層形成用固形物成分之有機EL材料表現出較高之溶解性,因此與使固形物成分溶解於第2芳香族溶劑相比,使固形物成分溶解於第1芳香族溶劑會使調合作業於短時間內完成。又,藉由於第1芳香族溶劑中添加沸點較高之第2芳香族溶劑,能夠製作化學性質穩定且易於操作之機能層形成用組合物。 The method for producing the composition for forming a functional layer of this embodiment includes the steps of dissolving the solid component for forming the functional layer in the first aromatic solvent having an electron withdrawing group, and dissolving the solid component for forming the organic layer The step of adding a second aromatic solvent having an electron donating group to the first aromatic solvent. As described above, the first aromatic solvent exhibits higher solubility for the organic EL material as the solid component for forming the functional layer. Therefore, compared with the solid component dissolved in the second aromatic solvent, the solid component Dissolving in the first aromatic solvent will make the blending industry complete in a short time. In addition, by adding a second aromatic solvent with a higher boiling point to the first aromatic solvent, a composition for forming a functional layer that is chemically stable and easy to handle can be produced.

繼而,對使用噴墨法之情形時之具體之噴出穩定性及膜平坦性 之評價方法與評價結果進行說明。再者,本實施形態中,由於使用噴墨法塗佈機能層形成用組合物,故而為了便於說明,以下有時亦將機能層形成用組合物簡稱為「墨水」。 Then, the specific ejection stability and film flatness when using the inkjet method The evaluation methods and evaluation results are explained. In addition, in this embodiment, since the composition for forming a functional layer is applied by an inkjet method, for convenience of description, the composition for forming a functional layer may also be abbreviated as "ink" below.

<噴出穩定性之評價> <Evaluation of ejection stability>

首先,參照圖5~圖8對噴出穩定性之評價方法與評價結果進行說明。圖5(a)~(d)及圖6(e)~(g)比表示使用高分子之電洞注入傳輸材料之情形時溶劑構成與墨水噴出性之關係之評價結果的表。圖7(a)~(d)及圖8(e)~(g)係表示使用高分子之發光材料之情形時溶劑構成與墨水噴出性之關係之評價結果的表。 First, the evaluation method and evaluation results of ejection stability will be described with reference to FIGS. 5 to 8. Figures 5(a)~(d) and Figures 6(e)~(g) compare the evaluation results of the relationship between the solvent composition and the ink ejectability when the polymer holes are injected into the transport material. Figures 7(a)~(d) and Figure 8(e)~(g) are tables showing the evaluation results of the relationship between the solvent composition and the ink ejectability when a polymer luminescent material is used.

噴墨法之情形時,經溶劑溶解之固形物成分越為高分子材料,於噴嘴內之墨水乾燥時固形物成分越容易析出。因此,列舉固形物成分為高分子材料之例而對噴出穩定性之評價方法進行說明。若於噴嘴內墨水乾燥而析出固形物成分,則噴嘴發生阻塞,因此自噴嘴噴出之液滴之噴出量變小(變少)。因此,關於本實施形態中之噴出穩定性之評價方法,於將初期之墨水噴出量設為「1」時,放置1小時後自噴嘴噴出之液滴之噴出量若位於0.99以上且1.01以下之範圍內,則記為「○(良)」,若位於0.95以上且未達0.99之範圍內,則記為「△(稍不良)」,若未達0.95,則記為「×(不良)」。如上所述,自噴墨頭之噴嘴噴出之1滴液滴之噴出量(體積)之單位為pl(微微升),為了高精度地求出墨水噴出量,實際上例如噴出數萬發之液滴而測定重量,用所測得之重量除以噴出次數(數萬發),藉此算出平均1滴之墨水噴出量。 In the case of the inkjet method, the more the solid component dissolved by the solvent is a polymer material, the easier the solid component will precipitate when the ink in the nozzle dries. Therefore, an example in which the solid component is a polymer material is used to describe the evaluation method of ejection stability. If the ink dries in the nozzle to precipitate solid components, the nozzle will be clogged, and therefore the ejection amount of the droplets ejected from the nozzle will decrease (decrease). Therefore, regarding the evaluation method of ejection stability in this embodiment, when the initial ink ejection amount is set to "1", if the ejection amount of the droplets ejected from the nozzle after being left for 1 hour is between 0.99 and 1.01 If it is within the range, it is recorded as "○ (good)", if it is above 0.95 and less than 0.99, it is recorded as "△ (slightly poor)", if it is less than 0.95, it is recorded as "× (bad)" . As mentioned above, the unit of the ejection amount (volume) of one droplet ejected from the nozzle of the inkjet head is pl (picoliter). In order to obtain the ink ejection amount with high accuracy, in fact, for example, tens of thousands of drops are ejected. The weight is measured for each drop, and the measured weight is divided by the number of ejections (tens of thousands) to calculate the average ink ejection volume per drop.

圖5(a)~(d)及圖6(e)~(g)中,作為高分子之電洞注入傳輸材料(HIL、HTL)係選自上述PVK、PF、PPV、PMPS、PTTA、聚[N,N'-雙(4-丁基苯基)-N,N'-雙(苯基)-聯苯胺]、TFB之中。又,作為第1芳香族溶劑A係選自上述硝基苯、2,3-二甲基硝基苯、2,4-二甲基硝基苯之中。又,除對上述第1芳香族溶劑A與作為第2芳香族溶劑B之上述 α,α,4-三甲氧基甲苯、二苯醚、3-苯氧基甲苯、苄基苯基醚、胺基聯苯、二苯基胺各者的組合進行評價以外,亦對上述第1芳香族溶劑A與沸點(bp)為170℃之2-甲氧基甲苯的組合進行評價。2-甲氧基甲苯具有烷氧基(甲氧基(-OCH3基))作為供電子基。 In Figure 5(a)~(d) and Figure 6(e)~(g), the hole injection transport material (HIL, HTL) as a polymer is selected from the above-mentioned PVK, PF, PPV, PMPS, PTTA, poly [N,N'-bis(4-butylphenyl)-N,N'-bis(phenyl)-benzidine], TFB. In addition, the first aromatic solvent A is selected from the above-mentioned nitrobenzene, 2,3-dimethylnitrobenzene, and 2,4-dimethylnitrobenzene. In addition, the first aromatic solvent A and the above-mentioned α,α,4-trimethoxytoluene, diphenyl ether, 3-phenoxytoluene, benzyl phenyl ether, and amine as the second aromatic solvent B are excluded. In addition to the evaluation of the combination of each of biphenyl and diphenylamine, the combination of the above-mentioned first aromatic solvent A and 2-methoxytoluene having a boiling point (bp) of 170°C was also evaluated. 2-Methoxytoluene has an alkoxy group (methoxy group (-OCH 3 group)) as an electron donating group.

第1芳香族溶劑A與第2芳香族溶劑B於混合溶劑中之含有比率(A:B)%係分為七種(0:100、10:90、30:70、50:50、70:30、90:10、100:0)進行評價。再者,本實施形態中之含有比率為體積(Vol)%,但於重量(wt)%時亦可獲得相同之評價結果。 The content ratio (A:B)% of the first aromatic solvent A and the second aromatic solvent B in the mixed solvent is divided into seven types (0:100, 10:90, 30:70, 50:50, 70: 30, 90: 10, 100:0) for evaluation. Furthermore, the content ratio in this embodiment is volume (Vol)%, but the same evaluation result can be obtained in weight (wt)%.

如圖5(a)所示,於溶劑構成為硝基苯與2-甲氧基甲苯之組合之情形時,無論於混合溶劑中之含有比率如何,墨水噴出性(噴出穩定性)之評價均為「×」。於溶劑構成為2,3-二甲基硝基苯或2,4-二甲基硝基苯與2-甲氧基甲苯之組合之情形時,混合溶劑中之含有比率為0:100、10:90時,墨水噴出性(噴出穩定性)之評價為「×」,混合溶劑中之含有比率(A:B)為30:70、50:50、70:30、90:10、100:0時,墨水噴出性(噴出穩定性)之評價為「△」。 As shown in Figure 5(a), when the solvent is composed of a combination of nitrobenzene and 2-methoxytoluene, regardless of the content ratio in the mixed solvent, the ink ejectability (ejection stability) is evaluated Is "×". When the solvent composition is 2,3-dimethylnitrobenzene or a combination of 2,4-dimethylnitrobenzene and 2-methoxytoluene, the content ratio in the mixed solvent is 0:100, 10 :At 90, the evaluation of ink ejectability (ejection stability) is "×", and the content ratio (A:B) in the mixed solvent is 30:70, 50:50, 70:30, 90:10, 100:0 When the ink ejectability (ejection stability) is evaluated as "△".

相對於此,如圖5(b)~(d)及圖6(e)~(g)所示,於將作為第1芳香族溶劑A之硝基苯、與作為第2芳香族溶劑B之α,α,4-三甲氧基甲苯、二苯醚、3-苯氧基甲苯、苄基苯基醚、胺基聯苯、二苯基胺各者加以組合之情形時,混合溶劑之含有比率(A:B)除100:0以外,墨水噴出性(噴出穩定性)之評價均為「○」。100:0時之墨水噴出性(噴出穩定性)為「×」。於將作為第1芳香族溶劑A之2,3-二甲基硝基苯或2,4-二甲基硝基苯、與作為第2芳香族溶劑B之α,α,4-三甲氧基甲苯、二苯醚、3-苯氧基甲苯、苄基苯基醚、胺基聯苯、二苯基胺各者加以組合之情形時,混合溶劑之含有比率(A:B)除100:0以外,墨水噴出性(噴出穩定性)之評價均為「○」。混合溶劑之含有比率(A:B)為100:0時之墨水噴出性(噴出穩定性)為「△」。 On the other hand, as shown in Figures 5(b)~(d) and Figure 6(e)~(g), the difference between nitrobenzene as the first aromatic solvent A and the second aromatic solvent B When α,α,4-trimethoxytoluene, diphenyl ether, 3-phenoxy toluene, benzyl phenyl ether, aminobiphenyl, and diphenylamine are combined, the content ratio of the mixed solvent (A:B) Except for 100:0, the evaluations of ink ejection properties (ejection stability) are all "○". The ink ejectability (ejection stability) at 100:0 is "×". Use 2,3-dimethylnitrobenzene or 2,4-dimethylnitrobenzene as the first aromatic solvent A, and α,α,4-trimethoxybenzene as the second aromatic solvent B When toluene, diphenyl ether, 3-phenoxytoluene, benzyl phenyl ether, amino biphenyl, and diphenyl amine are combined, the content ratio of the mixed solvent (A:B) is divided by 100:0 Otherwise, the evaluation of ink ejectability (ejection stability) is "○". When the content ratio of the mixed solvent (A:B) is 100:0, the ink ejectability (ejection stability) is "△".

圖7(a)~(d)及圖8(e)~(g)中,關於高分子之發光材料(EML),分別使用上述作為紅色發光材料之聚[{9,9-二己基-2,7-雙(1-氰基伸乙烯基)伸茀基}-鄰-共聚-{2,5-雙(N,N'-二苯基胺基)-1,4-伸苯基}](表中為便於表示而記為Red-Poly-EM)、作為綠色發光材料之聚[(9,9-二辛基茀-2,7-二基)-鄰-共聚-(1,4-苯并-{2,1',3}-噻二唑)](F8BT)(表中為便於表示而記為Green-Poly-EM)、作為藍色發光材料之聚[(9,9-二辛基茀-2,7-二基)-共聚-(N,N'-二苯基)-N,N'-二(對丁基苯基)-1,4-二胺基-苯)](表中為便於表示而記為Blue-Poly-EM)而構成墨水。第1芳香族溶劑A與第2芳香族溶劑B之選擇方法和高分子之電洞注入傳輸材料(HIL、HTL)之情形時相同。 In Fig. 7(a)~(d) and Fig. 8(e)~(g), for the polymer light-emitting material (EML), the above-mentioned poly[{9,9-dihexyl-2 ,7-bis(1-cyanoethylene vinylene) phenylene}-o-copolymer-{2,5-bis(N,N'-diphenylamino)-1,4-phenylene))( In the table, it is recorded as Red-Poly-EM for ease of presentation. As a green light-emitting material, poly[(9,9-dioctylpyri-2,7-diyl)-o-copolymer-(1,4-benzene) And-{2,1',3}-thiadiazole)](F8BT) (in the table for ease of presentation and marked as Green-Poly-EM), as a blue light-emitting material poly[(9,9-dioctyl Base -2,7-diyl)-copolymer-(N,N'-diphenyl)-N,N'-bis(p-butylphenyl)-1,4-diamino-benzene)) ( In the table, it is marked as Blue-Poly-EM for ease of presentation to form ink. The selection method of the first aromatic solvent A and the second aromatic solvent B is the same as in the case of polymer hole injection transport materials (HIL, HTL).

如圖7(a)所示,於溶劑構成為硝基苯與2-甲氧基甲苯之組合之情形時,無論於混合溶劑中之含有比率如何,墨水噴出性(噴出穩定性)之評價均為「×」。於溶劑構成為2,3-二甲基硝基苯或2,4-二甲基硝基苯與2-甲氧基甲苯之組合之情形時,混合溶劑中之含有比率(A:B)為0:100、10:90時,墨水噴出性(噴出穩定性)之評價為「×」,混合溶劑中之含有比率(A:B)為30:70、50:50、70:30、90:10、100:0時,墨水噴出性(噴出穩定性)之評價為「△」。 As shown in Figure 7(a), when the solvent is composed of a combination of nitrobenzene and 2-methoxytoluene, regardless of the content ratio in the mixed solvent, the ink ejectability (ejection stability) is evaluated Is "×". When the solvent is composed of 2,3-dimethylnitrobenzene or a combination of 2,4-dimethylnitrobenzene and 2-methoxytoluene, the content ratio (A:B) in the mixed solvent is At 0:100, 10:90, the evaluation of ink ejectability (ejection stability) is "×", and the content ratio (A:B) in the mixed solvent is 30:70, 50:50, 70:30, 90: 10. At 100:0, the ink ejectability (ejection stability) is evaluated as "△".

相對於此,如圖7(b)~(d)及圖8(e)~(g)所示,於將作為第1芳香族溶劑A之硝基苯、與作為第2芳香族溶劑B之α,α,4-三甲氧基甲苯、二苯醚、3-苯氧基甲苯、苄基苯基醚、胺基聯苯、二苯基胺各者加以組合之情形時,混合溶劑之含有比率(A:B)除100:0以外,墨水噴出性(噴出穩定性)之評價均為「○」。混合溶劑之含有比率(A:B)為100:0時之墨水噴出性(噴出穩定性)為「×」。 On the other hand, as shown in Figures 7(b)~(d) and Figure 8(e)~(g), the ratio between nitrobenzene as the first aromatic solvent A and the second aromatic solvent B When α,α,4-trimethoxytoluene, diphenyl ether, 3-phenoxy toluene, benzyl phenyl ether, aminobiphenyl, and diphenylamine are combined, the content ratio of the mixed solvent (A:B) Except for 100:0, the evaluations of ink ejection properties (ejection stability) are all "○". When the content ratio (A:B) of the mixed solvent is 100:0, the ink ejectability (ejection stability) is "×".

於將作為第1芳香族溶劑A之2,3-二甲基硝基苯或2,4-二甲基硝基苯、與作為第2芳香族溶劑B之α,α,4-三甲氧基甲苯、二苯醚、3-苯氧基甲苯、苄基苯基醚、胺基聯苯、二苯基胺各者加以組合之情形時, 混合溶劑之含有比率(A:B)除100:0以外,墨水噴出性(噴出穩定性)之評價均為「○」。混合溶劑之含有比率(A:B)為100:0時之墨水噴出性(噴出穩定性)為「△」。 Use 2,3-dimethylnitrobenzene or 2,4-dimethylnitrobenzene as the first aromatic solvent A, and α,α,4-trimethoxybenzene as the second aromatic solvent B When toluene, diphenyl ether, 3-phenoxy toluene, benzyl phenyl ether, amino biphenyl, and diphenyl amine are combined, The content ratio of the mixed solvent (A:B) except for 100:0, the evaluation of ink ejectability (ejection stability) is "○". When the content ratio of the mixed solvent (A:B) is 100:0, the ink ejectability (ejection stability) is "△".

如上述噴出穩定性之評價結果所示,於作為第2芳香族溶劑B所選擇之溶劑(2-甲氧基甲苯)之沸點(bp)為200℃以下之情形時,於1小時之放置過程中,噴嘴內墨水之乾燥進行,墨水噴出量變得不穩定(變少)。又,即便於單獨使用第1芳香族溶劑A之情形時,墨水噴出量亦變得不穩定(變少)。另一方面,於作為第2芳香族溶劑B所選擇之溶劑之沸點(bp)為250℃以上之情形時,即便經過1小時之放置後,噴嘴內墨水之乾燥亦不易進行,墨水噴出量穩定。 As shown in the above evaluation results of ejection stability, when the boiling point (bp) of the solvent (2-methoxytoluene) selected as the second aromatic solvent B is less than 200°C, leave it for 1 hour In this case, the drying of the ink in the nozzle progresses, and the amount of ink ejected becomes unstable (decreased). In addition, even when the first aromatic solvent A is used alone, the ink ejection amount becomes unstable (decreases). On the other hand, when the boiling point (bp) of the solvent selected as the second aromatic solvent B is 250°C or higher, even after 1 hour of standing, the ink in the nozzle is not easily dried and the ink ejection volume is stable .

<膜平坦性之評價> <Evaluation of Film Flatness>

其次,參照圖4、圖9~圖16對膜平坦性之評價方法與評價結果進行說明。圖4係表示機能層中之像素中央部之膜厚的概略剖視圖,圖9(a)~(d)及圖10(e)~(g)係表示使用高分子之電洞注入傳輸材料之情形時溶劑構成與膜平坦性之關係之評價結果的表。圖11(a)~(d)及圖12(ee)~(g)係表示使用高分子之發光材料之情形時溶劑構成與膜平坦性之關係之評價結果的表。圖13(a)~(d)及圖14(e)~(g)係表示使用低分子之電洞注入傳輸材料之情形時溶劑構成與膜平坦性之關係之評價結果的表。圖15(a)~(d)及圖16(e)~(g)係表示使用低分子之發光材料之情形時溶劑構成與膜平坦性之關係之評價結果的表。 Next, the evaluation method and evaluation results of film flatness will be described with reference to FIGS. 4 and 9 to 16. Figure 4 is a schematic cross-sectional view showing the film thickness of the central part of the pixel in the functional layer. Figures 9(a)~(d) and 10(e)~(g) show the case of using polymer hole injection transmission materials Table of evaluation results of the relationship between solvent composition and film flatness. Figures 11(a)~(d) and Figure 12(ee)~(g) are tables showing the evaluation results of the relationship between solvent composition and film flatness in the case of using a polymer light-emitting material. Figures 13(a)~(d) and Figure 14(e)~(g) are tables showing the evaluation results of the relationship between solvent composition and film flatness when low-molecular holes are used to inject the transport material. Figures 15(a)~(d) and Figures 16(e)~(g) are tables showing the evaluation results of the relationship between solvent composition and film flatness when low-molecular luminescent materials are used.

於噴墨法中,如上所述,藉由向由間隔壁106所圍成之開口部106a內高精度地噴射特定量之墨水,而確保所成膜之機能層之膜平坦性。又,認為墨水所含之固形物成分為高分子材料或為低分子材料亦會影響膜平坦性。具體而言,認為於開口部106a塗佈墨水並使之乾燥時,於間隔壁106之側壁成膜開始之固定位置(膜固定位置)根據固形物成分為高分子材料或為低分子材料而不同,此會對乾燥後之膜平坦 性產生影響。 In the inkjet method, as described above, a specific amount of ink is ejected into the opening 106a surrounded by the partition wall 106 with high accuracy to ensure the film flatness of the formed functional layer. In addition, it is believed that the solid components contained in the ink are high-molecular materials or low-molecular materials, which will also affect the flatness of the film. Specifically, it is considered that when ink is applied to the opening 106a and dried, the fixing position (film fixing position) at the start of film formation on the side wall of the partition wall 106 differs depending on whether the solid content is a high molecular material or a low molecular material. , This will flatten the dried film Sex has an impact.

如圖4所示,將所成膜之膜於像素電極104之中央部之膜厚設為像素內中央膜厚tc,將與像素電極104接觸之範圍內之膜厚之平均設為像素內平均膜厚ta。該等膜厚例如可利用觸針式測定裝置而測定。根據開口部106a內所塗佈之墨水之乾燥進行方式或上述固定位置,成膜後之膜剖面形狀於像素中央部或隆起或下凹。即,像素內中央膜厚tc變動。 As shown in FIG. 4, the film thickness of the formed film at the center of the pixel electrode 104 is set as the central film thickness tc in the pixel, and the average of the film thickness in the range in contact with the pixel electrode 104 is set as the average in the pixel Film thickness ta. These film thicknesses can be measured using a stylus type measuring device, for example. According to the drying process of the ink applied in the opening 106a or the above-mentioned fixed position, the cross-sectional shape of the film after film formation may be raised or recessed in the center of the pixel. That is, the central film thickness tc in the pixel varies.

關於本實施形態之膜平坦性之評價方法,於像素內平均膜厚ta為像素內中央膜厚tc之0.9倍以上且未達像素內中央膜厚tc之1.2倍之情形時,將膜平坦性之評價記為「○(良)」。此時,將因固形物成分之析出而於膜表面確認到細小凹凸時之膜平坦性記為「●(有析出)」。於像素內平均膜厚ta為像素內中央膜厚tc之1.2倍以上且未達像素內中央膜厚tc之1.3倍之情形時,將膜平坦性之評價記為「△(稍不良)」。於像素內平均膜厚ta為像素內中央膜厚tc之1.3倍以上之情形時,將膜平坦性之評價記為「×(不良)」。進而,於像素內平均膜厚ta為像素內中央膜厚tc之1.3倍以上且因固形物成分之析出而於膜表面確認到明顯凹凸之情形時,將膜平坦性之評價記為「××(不良且有析出)」。於膜表面存在明顯凹凸之情形時,若點亮有機EL元件130,則於像素內之機能層136中流通之電流不均勻,而觀察到亮度不均。再者,開口部106a內所塗佈之墨水之乾燥及焙燒條件如上述有機EL元件130之製造方法中所示。 Regarding the film flatness evaluation method of this embodiment, when the average film thickness ta in the pixel is 0.9 times or more of the center film thickness tc in the pixel and less than 1.2 times the center film thickness tc in the pixel, the film flatness The evaluation is recorded as "○ (good)". At this time, the flatness of the film when fine irregularities are confirmed on the film surface due to the precipitation of solid components is recorded as "● (precipitation)". When the average film thickness ta in the pixel is 1.2 times or more the center film thickness tc in the pixel and less than 1.3 times the center film thickness tc in the pixel, the evaluation of film flatness is recorded as "△ (slightly poor)". When the average film thickness ta in the pixel is 1.3 times or more the center film thickness tc in the pixel, the evaluation of film flatness is recorded as "x (bad)". Furthermore, when the average film thickness ta in the pixel is 1.3 times or more of the center film thickness tc in the pixel and the film surface has obvious irregularities due to the precipitation of solid components, the film flatness evaluation is recorded as "×× (Poor and precipitation)". When there are obvious concavities and convexities on the film surface, if the organic EL element 130 is turned on, the current flowing in the functional layer 136 in the pixel is not uniform, and uneven brightness is observed. Furthermore, the drying and firing conditions of the ink applied in the opening 106a are as shown in the above-mentioned manufacturing method of the organic EL device 130.

圖9(a)~(d)及圖10(e)~(g)中,作為高分子之電洞注入傳輸材料(HIL、HTL)係選自上述PVK、PF、PPV、PMPS、PTTA、聚[N,N'-雙(4-丁基苯基)-N,N'-雙(苯基)-聯苯胺]、TFB之中。又,作為第1芳香族溶劑A係選自上述硝基苯、2,3-二甲基硝基苯、2,4-二甲基硝基苯之中。又,除了對上述第1芳香族溶劑A與作為第2芳香族溶劑B之上述 α,α,4-三甲氧基甲苯、二苯醚、3-苯氧基甲苯、苄基苯基醚、胺基聯苯、二苯基胺各者的組合進行評價以外,亦對上述第1芳香族溶劑A與沸點(bp)為170℃之2-甲氧基甲苯的組合進行評價。2-甲氧基甲苯具有烷氧基(甲氧基(-OCH3基))作為供電子基。 In Figure 9(a)~(d) and Figure 10(e)~(g), the hole injection transport material (HIL, HTL) as a polymer is selected from the above-mentioned PVK, PF, PPV, PMPS, PTTA, poly [N,N'-bis(4-butylphenyl)-N,N'-bis(phenyl)-benzidine], TFB. In addition, the first aromatic solvent A is selected from the above-mentioned nitrobenzene, 2,3-dimethylnitrobenzene, and 2,4-dimethylnitrobenzene. Also, in addition to the above-mentioned first aromatic solvent A and the above-mentioned α,α,4-trimethoxytoluene, diphenyl ether, 3-phenoxytoluene, benzyl phenyl ether, and amine as the second aromatic solvent B In addition to the evaluation of the combination of each of biphenyl and diphenylamine, the combination of the above-mentioned first aromatic solvent A and 2-methoxytoluene having a boiling point (bp) of 170°C was also evaluated. 2-Methoxytoluene has an alkoxy group (methoxy group (-OCH 3 group)) as an electron donating group.

圖11(a)~(d)及圖12(e)~(g)中,關於高分子之發光材料(EML),分別使用上述作為紅色發光材料之聚[{9,9-二己基-2,7-雙(1-氰基伸乙烯基)伸茀基}-鄰-共聚-{2,5-雙(N,N'-二苯基胺基)-1,4-伸苯基}](表中為便於表示而記為Red-Poly-EM)、作為綠色發光材料之聚[(9,9-二辛基茀-2,7-二基)-鄰-共聚-(1,4-苯并-{2,1',3}-噻二唑)](F8BT)(表中為便於表示而記為Green-Poly-EM)、作為藍色發光材料之聚[(9,9-二辛基茀-2,7-二基)-共聚-(N,N'-二苯基)-N,N'-二(對丁基苯基)-1,4-二胺基-苯)](表中為便於表示而記為Blue-Poly-EM)而構成墨水。第1芳香族溶劑A與第2芳香族溶劑B之選擇方法和高分子之電洞注入傳輸材料(HIL、HTL)之情形時相同。 In Fig. 11(a)~(d) and Fig. 12(e)~(g), for the polymer light-emitting material (EML), the above-mentioned poly[{9,9-dihexyl-2 ,7-bis(1-cyanoethylene vinylene) phenylene}-o-copolymer-{2,5-bis(N,N'-diphenylamino)-1,4-phenylene))( In the table, it is recorded as Red-Poly-EM for ease of presentation. As a green light-emitting material, poly[(9,9-dioctylpyri-2,7-diyl)-o-copolymer-(1,4-benzene) And-{2,1',3}-thiadiazole)](F8BT) (in the table for ease of presentation and marked as Green-Poly-EM), as a blue light-emitting material poly[(9,9-dioctyl Base -2,7-diyl)-copolymer-(N,N'-diphenyl)-N,N'-bis(p-butylphenyl)-1,4-diamino-benzene)) ( In the table, it is marked as Blue-Poly-EM for ease of presentation to form ink. The selection method of the first aromatic solvent A and the second aromatic solvent B is the same as in the case of polymer hole injection transport materials (HIL, HTL).

第1芳香族溶劑A與第2芳香族溶劑B於混合溶劑中之含有比率(A:B)%係分為七種(0:100、10:90、30:70、50:50、70:30、90:10、100:0)進行評價。即,墨水構成與上述噴出穩定性之評價之情形時相同。 The content ratio (A:B)% of the first aromatic solvent A and the second aromatic solvent B in the mixed solvent is divided into seven types (0:100, 10:90, 30:70, 50:50, 70: 30, 90: 10, 100:0) for evaluation. That is, the ink composition is the same as in the case of the evaluation of ejection stability described above.

如圖9(a)及圖11(a)所示,於溶劑構成為硝基苯與2-甲氧基甲苯之組合、且混合溶劑之含有比率(A:B)為0:100之情形時,膜平坦性之評價為「××」。於混合溶劑之含有比率(A:B)為0:100以外之情形時,膜平坦性之評價均為「×」。於溶劑構成為2,3-二甲基硝基苯或2,4-二甲基硝基苯與2-甲氧基甲苯之組合、且混合溶劑之含有比率(A:B)為0:100之情形時,膜平坦性之評價為「××」。於混合溶劑之含有比率(A:B)為10:90、30:70、50:50、70:30、90:10、100:0之情形時,膜平坦性之評價為「△」。 As shown in Figure 9(a) and Figure 11(a), when the solvent composition is a combination of nitrobenzene and 2-methoxytoluene, and the mixed solvent content ratio (A:B) is 0:100 , The evaluation of film flatness is "××". When the content ratio (A:B) of the mixed solvent is other than 0:100, the evaluation of film flatness is "×". When the solvent composition is 2,3-dimethylnitrobenzene or a combination of 2,4-dimethylnitrobenzene and 2-methoxytoluene, and the content ratio of the mixed solvent (A:B) is 0:100 In this case, the film flatness is evaluated as "××". When the content ratio (A:B) of the mixed solvent is 10:90, 30:70, 50:50, 70:30, 90:10, 100:0, the film flatness is evaluated as "△".

相對於此,如圖9(b)~(d)及圖10(e)~(g)、圖11(b)~(d)及圖12(e)~(g)所示,於將作為第1芳香族溶劑A之硝基苯、與作為第2芳香族溶劑B之α,α,4-三甲氧基甲苯、二苯醚、3-苯氧基甲苯、苄基苯基醚、胺基聯苯、二苯基胺各者加以組合之情形時,混合溶劑之含有比率(A:B)為100:0及0:100以外之10:90、30:70、50:50、70:30、90:10時,膜平坦性之評價均為「○」。混合溶劑之含有比率(A:B)為0:100時,膜平坦性之評價為「●」,混合溶劑之含有比率(A:B)為100:0時,膜平坦性之評價為「×」。 In contrast, as shown in Figure 9(b)~(d) and Figure 10(e)~(g), Figure 11(b)~(d) and Figure 12(e)~(g), it will be Nitrobenzene as the first aromatic solvent A, and α,α,4-trimethoxytoluene, diphenyl ether, 3-phenoxytoluene, benzyl phenyl ether, amino group as the second aromatic solvent B When combining biphenyl and diphenylamine, the content ratio (A:B) of the mixed solvent is 10:90, 30:70, 50:50, 70:30 other than 100:0 and 0:100 , 90:10, the evaluation of film flatness is "○". When the mixed solvent content ratio (A:B) is 0:100, the film flatness is evaluated as "●", and when the mixed solvent content ratio (A:B) is 100:0, the film flatness is evaluated as "× ".

於將作為第1芳香族溶劑A之2,3-二甲基硝基苯或2,4-二甲基硝基苯、與作為第2芳香族溶劑B之α,α,4-三甲氧基甲苯、二苯醚、3-苯氧基甲苯、苄基苯基醚、胺基聯苯、二苯基胺各者加以組合之情形時,混合溶劑之含有比率(A:B)為100:0及0:100以外之10:90、30:70、50:50、70:30、90:10時,膜平坦性之評價均為「○」。混合溶劑之含有比率(A:B)為0:100時,膜平坦性之評價為「●」,混合溶劑之含有比率(A:B)為100:0時,膜平坦性之評價為「△」。 Use 2,3-dimethylnitrobenzene or 2,4-dimethylnitrobenzene as the first aromatic solvent A, and α,α,4-trimethoxybenzene as the second aromatic solvent B When toluene, diphenyl ether, 3-phenoxytoluene, benzyl phenyl ether, aminobiphenyl, and diphenylamine are combined, the content ratio of the mixed solvent (A:B) is 100:0 And 10:90, 30:70, 50:50, 70:30, 90:10 other than 0:100, the evaluation of film flatness is "○". When the mixed solvent content ratio (A:B) is 0:100, the film flatness is evaluated as "●", and when the mixed solvent content ratio (A:B) is 100:0, the film flatness is evaluated as "△" ".

圖13(a)~(d)及圖14(e)~(g)中,作為低分子之電洞注入傳輸材料(HIL、HTL)係選自上述VB-TCA、CuPc、TAPC、TPD、α-NPD、m-MTDATA、PDA-Si、2-TNATA、TCTA、TDAPB、螺環TAD、DPPD、DTP、HTM1、HTM2、TPT1、TPTE之中。又,作為第1芳香族溶劑A係選自上述硝基苯、2,3-二甲基硝基苯、2,4-二甲基硝基苯之中。又,除對上述第1芳香族溶劑A與作為第2芳香族溶劑B之上述α,α,4-三甲氧基甲苯、二苯醚、3-苯氧基甲苯、苄基苯基醚、胺基聯苯、二苯基胺各者的組合進行評價以外,亦對上述第1芳香族溶劑A與沸點(bp)為170℃之2-甲氧基甲苯的組合進行評價。2-甲氧基甲苯具有烷氧基(甲氧基(-OCH3基))作為供電子基。 In Figure 13(a)~(d) and Figure 14(e)~(g), the low-molecular hole injection transport material (HIL, HTL) is selected from the above-mentioned VB-TCA, CuPc, TAPC, TPD, α -Among NPD, m-MTDATA, PDA-Si, 2-TNATA, TCTA, TDAPB, spirocyclic TAD, DPPD, DTP, HTM1, HTM2, TPT1, TPTE. In addition, the first aromatic solvent A is selected from the above-mentioned nitrobenzene, 2,3-dimethylnitrobenzene, and 2,4-dimethylnitrobenzene. In addition, the first aromatic solvent A and the above-mentioned α,α,4-trimethoxytoluene, diphenyl ether, 3-phenoxytoluene, benzyl phenyl ether, and amine as the second aromatic solvent B are excluded. In addition to the evaluation of the combination of each of biphenyl and diphenylamine, the combination of the above-mentioned first aromatic solvent A and 2-methoxytoluene having a boiling point (bp) of 170°C was also evaluated. 2-Methoxytoluene has an alkoxy group (methoxy group (-OCH 3 group)) as an electron donating group.

圖15(a)~(d)及圖16(e)~(g)中,關於低分子材料之發光材料 (EML),於上述CBP、BAlq、mCP、CDBP、DCB、PO6、SimCP、UGH3、TDAPB中選擇主體材料,於Bt2Ir(acac)、Btp2Ir(acac)、PtOEP中選擇作為紅色發光材料(客體材料)之Red摻雜劑。又,於Ir(ppy)3、Ppy2Ir(acac)中選擇作為綠色發光材料(客體材料)之Green摻雜劑。又,於FIrpic、Ir(pmb)3、FIrN4中選擇作為藍色發光材料(客體材料)之Blue摻雜劑。第1芳香族溶劑A與第2芳香族溶劑B之選擇方法與低分子之電洞注入傳輸材料(HIL、HTL)之情形時相同。 In Figure 15(a)~(d) and Figure 16(e)~(g), the luminescent material of low molecular weight material (EML), select the host material from the above CBP, BAlq, mCP, CDBP, DCB, PO6, SimCP, UGH3, TDAPB, and select the red luminescent material (guest material) from Bt2Ir(acac), Btp2Ir(acac), and PtOEP The Red dopant. In addition, the Green dopant is selected from Ir(ppy)3 and Ppy2Ir(acac) as the green light-emitting material (guest material). In addition, the Blue dopant selected as the blue light-emitting material (guest material) among FIrpic, Ir(pmb)3, and FIrN4. The selection method of the first aromatic solvent A and the second aromatic solvent B is the same as in the case of the low-molecular hole injection transport material (HIL, HTL).

第1芳香族溶劑A與第2芳香族溶劑B於混合溶劑中之含有比率(A:B)%係分為七種(0:100、10:90、30:70、50:50、70:30、90:10、100:0)進行評價。即,墨水構成與上述高分子材料之評價之情形時相同。 The content ratio (A:B)% of the first aromatic solvent A and the second aromatic solvent B in the mixed solvent is divided into seven types (0:100, 10:90, 30:70, 50:50, 70: 30, 90: 10, 100:0) for evaluation. That is, the ink composition is the same as in the case of the evaluation of the above-mentioned polymer material.

如圖13(a)及圖15(a)所示,於溶劑構成為硝基苯與2-甲氧基甲苯之組合、且混合溶劑之含有比率(A:B)為0:100之情形時,膜平坦性之評價為「××」。於混合溶劑之含有比率(A:B)為0:100以外之情形時,膜平坦性之評價均為「×」。於溶劑構成為2,3-二甲基硝基苯或2,4-二甲基硝基苯與2-甲氧基甲苯之組合、且混合溶劑之含有比率(A:B)為0:100之情形時,膜平坦性之評價為「××」。於混合溶劑之含有比率(A:B)為10:90、30:70、50:50、70:30、90:10、100:0之情形時,膜平坦性之評價為「△」。 As shown in Figure 13(a) and Figure 15(a), when the solvent composition is a combination of nitrobenzene and 2-methoxytoluene, and the mixed solvent content ratio (A:B) is 0:100 , The evaluation of film flatness is "××". When the content ratio (A:B) of the mixed solvent is other than 0:100, the evaluation of film flatness is "×". When the solvent composition is 2,3-dimethylnitrobenzene or a combination of 2,4-dimethylnitrobenzene and 2-methoxytoluene, and the content ratio of the mixed solvent (A:B) is 0:100 In this case, the film flatness is evaluated as "××". When the content ratio (A:B) of the mixed solvent is 10:90, 30:70, 50:50, 70:30, 90:10, 100:0, the film flatness is evaluated as "△".

相對於此,如圖13(b)~(d)及圖14(e)~(g)、圖15(b)~(d)及圖16(e)~(g)所示,於將作為第1芳香族溶劑A之硝基苯、與作為第2芳香族溶劑B之α,α,4-三甲氧基甲苯、二苯醚、3-苯氧基甲苯、苄基苯基醚、胺基聯苯、二苯基胺各者加以組合之情形時,混合溶劑之含有比率(A:B)為100:0及0:100以外之10:90、30:70、50:50、70:30、90:10時,膜平坦性之評價均為「○」。混合溶劑之含有比率(A:B)為0:100時,膜平坦性之評價為「●」,混合溶劑之含有比率 (A:B)為100:0時,膜平坦性之評價為「×」。 In contrast, as shown in Figure 13(b)~(d) and Figure 14(e)~(g), Figure 15(b)~(d) and Figure 16(e)~(g), it will be used as Nitrobenzene as the first aromatic solvent A, and α,α,4-trimethoxytoluene, diphenyl ether, 3-phenoxytoluene, benzyl phenyl ether, amino group as the second aromatic solvent B When combining biphenyl and diphenylamine, the content ratio (A:B) of the mixed solvent is 10:90, 30:70, 50:50, 70:30 other than 100:0 and 0:100 , 90:10, the evaluation of film flatness is "○". When the content ratio of the mixed solvent (A:B) is 0:100, the film flatness is evaluated as "●", the content ratio of the mixed solvent When (A:B) is 100:0, the evaluation of film flatness is "×".

於將作為第1芳香族溶劑A之2,3-二甲基硝基苯或2,4-二甲基硝基苯、與作為第2芳香族溶劑B之α,α,4-三甲氧基甲苯、二苯醚、3-苯氧基甲苯、苄基苯基醚、胺基聯苯、二苯基胺各者加以組合之情形時,混合溶劑之含有比率(A:B)為100:0及0:100以外之10:90、30:70、50:50、70:30、90:10時,膜平坦性之評價均為「○」。混合溶劑之含有比率(A:B)為0:100時,膜平坦性之評價為「●」,混合溶劑之含有比率(A:B)為100:0時,膜平坦性之評價為「△」。即,即便墨水中之固形物成分為低分子材料,亦獲得與高分子材料之情形時相同之膜平坦性之評價。 Use 2,3-dimethylnitrobenzene or 2,4-dimethylnitrobenzene as the first aromatic solvent A, and α,α,4-trimethoxybenzene as the second aromatic solvent B When toluene, diphenyl ether, 3-phenoxytoluene, benzyl phenyl ether, aminobiphenyl, and diphenylamine are combined, the content ratio of the mixed solvent (A:B) is 100:0 And 10:90, 30:70, 50:50, 70:30, 90:10 other than 0:100, the evaluation of film flatness is "○". When the mixed solvent content ratio (A:B) is 0:100, the film flatness is evaluated as "●", and when the mixed solvent content ratio (A:B) is 100:0, the film flatness is evaluated as "△" ". That is, even if the solid component in the ink is a low-molecular material, the same film flatness evaluation as in the case of a polymer material is obtained.

如上述膜平坦性之評價結果所示,於作為第2芳香族溶劑B所選擇之溶劑(2-甲氧基甲苯)之沸點(bp)為200℃以下之情形時,於墨水之乾燥步驟中,第2芳香族溶劑B先於第1芳香族溶劑A發生蒸發,墨水之乾燥速度變快,成膜時之流平無法充分地進行,因此膜平坦性下降。另一方面,於作為第2芳香族溶劑B所選擇之溶劑之沸點(bp)為250℃以上之情形時,於墨水之乾燥步驟中,於第1芳香族溶劑A已蒸發後仍殘留有第2芳香族溶劑B,因此墨水之乾燥速度變慢,成膜時之流平充分地進行,從而膜平坦性提高。其中,於墨水中不含對固形物成分表現出較高溶解性之第1芳香族溶劑A之情形(混合溶劑之含有比率(A:B)為0:100之情形)時,於對墨水之溶解性較差之第2芳香族溶劑B之乾燥過程中,固形物成分易析出。又,於墨水中不含沸點較高之第2芳香族溶劑B之情形(混合溶劑之含有比率(A:B)為100:0之情形)時,於第1芳香族溶劑A之乾燥過程中,乾燥速度相對較快,因此成膜時之流平無法充分地進行,從而膜平坦性下降。 As shown in the evaluation result of film flatness above, when the boiling point (bp) of the solvent (2-methoxytoluene) selected as the second aromatic solvent B is less than 200°C, in the ink drying step , The second aromatic solvent B evaporates before the first aromatic solvent A, the drying speed of the ink becomes faster, and the leveling during film formation cannot be fully performed, so the flatness of the film decreases. On the other hand, when the boiling point (bp) of the solvent selected as the second aromatic solvent B is 250°C or higher, in the ink drying step, the first aromatic solvent A still remains after the first aromatic solvent A has evaporated. 2 Aromatic solvent B, so the drying speed of the ink slows down, and the leveling during film formation is fully carried out, thereby improving the flatness of the film. Among them, when the ink does not contain the first aromatic solvent A that exhibits high solubility for solid components (when the content ratio of the mixed solvent (A:B) is 0:100), the ink is During the drying process of the second aromatic solvent B, which has poor solubility, solid components are easy to precipitate. Also, when the ink does not contain the second aromatic solvent B with a higher boiling point (when the content ratio of the mixed solvent (A:B) is 100:0), during the drying process of the first aromatic solvent A , The drying speed is relatively fast, so the leveling during film formation cannot be carried out sufficiently, and the film flatness decreases.

根據上述噴出穩定性及上述膜平坦性之評價,第1芳香族溶劑A較佳為選擇沸點200℃以上者,第2芳香族溶劑B較佳為選擇沸點250 ℃以上者。又,第1芳香族溶劑A與第2芳香族溶劑B於混合溶劑中之含有比率(A:B)較佳為10:90~90:10。 Based on the evaluation of the ejection stability and the film flatness, the first aromatic solvent A preferably has a boiling point of 200°C or higher, and the second aromatic solvent B preferably has a boiling point of 250. Above ℃. In addition, the content ratio (A:B) of the first aromatic solvent A and the second aromatic solvent B in the mixed solvent is preferably 10:90 to 90:10.

其次,關於機能層形成用組合物(墨水)與有機EL元件130之元件特性的關係,列舉比較例與實施例進行說明。 Next, the relationship between the composition (ink) for forming a functional layer and the device characteristics of the organic EL device 130 will be described with reference to comparative examples and examples.

本實施形態中,作為有機EL元件130之元件特性,舉出驅動電壓、電流效率及壽命半衰時間。驅動電壓係有機EL元件130之發光亮度成為特定值時之直流電壓值,驅動電壓越小越佳。電流效率係於將有機EL元件130之發光亮度設為特定值時,用發光亮度除以所流通電流之大小所得的值(cd(燭光)/A(安培)),電流效率越大越佳。壽命半衰時間係有機EL元件130之發光亮度自特定值起直至成為半衰為止之通電時間(h),壽命半衰時間越長越佳。上述發光亮度之特定值例如設為1000cd(燭光)/m2(平方米)。 In this embodiment, the device characteristics of the organic EL device 130 include drive voltage, current efficiency, and life half-life time. The driving voltage is the DC voltage value when the light-emitting brightness of the organic EL element 130 becomes a specific value. The smaller the driving voltage, the better. The current efficiency is the value (cd (candle)/A (ampere)) obtained by dividing the luminescence brightness by the current flowing when the luminescence brightness of the organic EL element 130 is set to a specific value. The larger the current efficiency, the better. The life half-life time is the energizing time (h) from the specific value of the light-emitting brightness of the organic EL element 130 until it becomes half-life. The longer the life half-life time, the better. The specific value of the above-mentioned emission brightness is set to, for example, 1000 cd (candle light)/m 2 (square meter).

[比較例1] [Comparative Example 1]

關於比較例1之有機EL元件,使用不含第2芳香族溶劑B之墨水,利用噴墨法形成機能層136中之電洞注入層131、電洞傳輸層132、發光層133。具體而言,使用硝基苯(bp:210℃)作為第1芳香族溶劑A,使作為電洞注入材料之VB-TCA溶解於硝基苯而獲得墨水,使用所獲得之墨水而形成膜厚為10nm~30nm之電洞注入層131。又,使用使作為電洞傳輸材料之TFB溶解於硝基苯所獲得之墨水,而形成膜厚為10nm~20nm之電洞傳輸層132。進而,使用使作為獲得螢光之發光材料的F8BT(Green-Poly-EM)溶解於硝基苯所獲得之墨水,而形成膜厚為60nm~80nm之發光層133。機能層136中之其他電子傳輸層134、電子注入層135之構成如有機EL元件130之製造方法中所說明。 Regarding the organic EL device of Comparative Example 1, an ink containing no second aromatic solvent B was used, and the hole injection layer 131, the hole transport layer 132, and the light emitting layer 133 in the functional layer 136 were formed by an inkjet method. Specifically, using nitrobenzene (bp: 210°C) as the first aromatic solvent A, dissolving VB-TCA as a hole injection material in nitrobenzene to obtain an ink, and using the obtained ink to form a film thickness It is a hole injection layer 131 of 10 nm to 30 nm. In addition, an ink obtained by dissolving TFB as a hole transport material in nitrobenzene is used to form a hole transport layer 132 with a film thickness of 10 nm to 20 nm. Furthermore, using an ink obtained by dissolving F8BT (Green-Poly-EM) as a luminescent material for obtaining fluorescence in nitrobenzene, a luminescent layer 133 having a film thickness of 60 nm to 80 nm is formed. The structure of the other electron transport layer 134 and the electron injection layer 135 in the functional layer 136 is as described in the manufacturing method of the organic EL device 130.

[比較例2] [Comparative Example 2]

關於比較例2之有機EL元件,使用於溶解有固形物成分之作為第1芳香族溶劑A之硝基苯(bp:210℃)中添加作為第2芳香族溶劑B之2- 甲氧基甲苯(bp:170℃)所獲得之包含混合溶劑之墨水,而形成電洞注入層131、電洞傳輸層132、發光層133。各層之層構成材料或膜厚與比較例1相同。上述混合溶劑之含有比率(A:B)為50:50。 Regarding the organic EL device of Comparative Example 2, nitrobenzene (bp: 210°C) used as the first aromatic solvent A in which solid components are dissolved is added as the second aromatic solvent B of 2- An ink containing a mixed solvent obtained by methoxy toluene (bp: 170° C.) forms a hole injection layer 131, a hole transport layer 132, and a light emitting layer 133. The layer constituent material or film thickness of each layer is the same as in Comparative Example 1. The content ratio (A:B) of the above-mentioned mixed solvent is 50:50.

[比較例3] [Comparative Example 3]

關於比較例3之有機EL元件,使用於溶解有固形物成分之作為第1芳香族溶劑A之硝基苯(bp:210℃)中添加作為第2芳香族溶劑B之1,3,5-三乙基苯(bp:215℃)所獲得之包含混合溶劑之墨水,而形成電洞注入層131、電洞傳輸層132、發光層133。各層之層構成材料或膜厚與比較例1相同。上述混合溶劑之含有比率(A:B)為60:40。 Regarding the organic EL element of Comparative Example 3, nitrobenzene (bp: 210°C) used as the first aromatic solvent A in which solid components are dissolved is added with 1,3,5- as the second aromatic solvent B. An ink containing a mixed solvent obtained from triethylbenzene (bp: 215° C.) forms a hole injection layer 131, a hole transport layer 132, and a light emitting layer 133. The layer constituent material or film thickness of each layer is the same as in Comparative Example 1. The content ratio (A:B) of the above-mentioned mixed solvent is 60:40.

[實施例1] [Example 1]

關於實施例1之有機EL元件,使用於溶解有固形物成分之作為第1芳香族溶劑A之硝基苯(bp:210℃)中添加作為第2芳香族溶劑B之3-苯氧基甲苯(bp:272℃)所獲得之包含混合溶劑之墨水,而形成電洞注入層131、電洞傳輸層132、發光層133。各層之層構成材料或膜厚與比較例1相同。上述混合溶劑之含有比率(A:B)為10:90。 Regarding the organic EL device of Example 1, it is used to add 3-phenoxytoluene as the second aromatic solvent B to nitrobenzene (bp: 210°C) as the first aromatic solvent A in which solid components are dissolved. (bp: 272° C.) The obtained ink containing the mixed solvent forms the hole injection layer 131, the hole transport layer 132, and the light emitting layer 133. The layer constituent material or film thickness of each layer is the same as in Comparative Example 1. The content ratio (A:B) of the above-mentioned mixed solvent is 10:90.

[實施例2] [Example 2]

關於實施例2之有機EL元件,使用於溶解有固形物成分之作為第1芳香族溶劑A之硝基苯(bp:210℃)中添加作為第2芳香族溶劑B之3-苯氧基甲苯(bp:272℃)所獲得之包含混合溶劑之墨水,而形成電洞注入層131、電洞傳輸層132、發光層133。各層之層構成材料或膜厚與比較例1相同。上述混合溶劑之含有比率(A:B)為30:70。 Regarding the organic EL element of Example 2, 3-phenoxytoluene as the second aromatic solvent B is added to nitrobenzene (bp: 210°C) as the first aromatic solvent A in which solid components are dissolved. (bp: 272° C.) The obtained ink containing the mixed solvent forms the hole injection layer 131, the hole transport layer 132, and the light emitting layer 133. The layer constituent material or film thickness of each layer is the same as in Comparative Example 1. The content ratio (A:B) of the above-mentioned mixed solvent is 30:70.

[實施例3] [Example 3]

關於實施例3之有機EL元件,使用於溶解有固形物成分之作為第1芳香族溶劑A之硝基苯(bp:210℃)中添加作為第2芳香族溶劑B之3-苯氧基甲苯(bp:272℃)所獲得之包含混合溶劑之墨水,而形成電洞注入層131、電洞傳輸層132、發光層133。各層之層構成材料或膜厚 與比較例1相同。上述混合溶劑之含有比率(A:B)為50:50。 Regarding the organic EL device of Example 3, 3-phenoxytoluene as the second aromatic solvent B is added to nitrobenzene (bp: 210°C) as the first aromatic solvent A in which solid components are dissolved. (bp: 272° C.) The obtained ink containing the mixed solvent forms the hole injection layer 131, the hole transport layer 132, and the light emitting layer 133. Layer composition material or film thickness of each layer Same as Comparative Example 1. The content ratio (A:B) of the above-mentioned mixed solvent is 50:50.

[實施例4] [Example 4]

關於實施例4之有機EL元件,使用於溶解有固形物成分之作為第1芳香族溶劑A之硝基苯(bp:210℃)中添加作為第2芳香族溶劑B之3-苯氧基甲苯(bp:272℃)所獲得之包含混合溶劑之墨水,而形成電洞注入層131、電洞傳輸層132、發光層133。各層之層構成材料或膜厚與比較例1相同。上述混合溶劑之含有比率(A:B)為70:30。 Regarding the organic EL element of Example 4, 3-phenoxytoluene as the second aromatic solvent B is added to nitrobenzene (bp: 210°C) as the first aromatic solvent A in which solid components are dissolved. (bp: 272° C.) The obtained ink containing the mixed solvent forms the hole injection layer 131, the hole transport layer 132, and the light emitting layer 133. The layer constituent material or film thickness of each layer is the same as in Comparative Example 1. The content ratio (A:B) of the above-mentioned mixed solvent is 70:30.

[實施例5] [Example 5]

關於實施例5之有機EL元件,使用於溶解有固形物成分之作為第1芳香族溶劑A之硝基苯(bp:210℃)中添加作為第2芳香族溶劑B之3-苯氧基甲苯(bp:272℃)所獲得之包含混合溶劑之墨水,而形成電洞注入層131、電洞傳輸層132、發光層133。各層之層構成材料或膜厚與比較例1相同。上述混合溶劑之含有比率(A:B)為90:10。 Regarding the organic EL element of Example 5, 3-phenoxytoluene as the second aromatic solvent B is added to nitrobenzene (bp: 210°C) as the first aromatic solvent A in which solid components are dissolved. (bp: 272° C.) The obtained ink containing the mixed solvent forms the hole injection layer 131, the hole transport layer 132, and the light emitting layer 133. The layer constituent material or film thickness of each layer is the same as in Comparative Example 1. The content ratio (A:B) of the above-mentioned mixed solvent is 90:10.

上述實施例1~實施例5係使包含作為第1芳香族溶劑A之硝基苯(bp:210℃)與作為第2芳香族溶劑B之3-苯氧基甲苯(bp:272℃)的混合溶劑之含有比率(A:B)不同者。 The above-mentioned Examples 1 to 5 are made of nitrobenzene (bp: 210°C) as the first aromatic solvent A and 3-phenoxytoluene (bp: 272°C) as the second aromatic solvent B The content ratio (A:B) of the mixed solvent is different.

[實施例6] [Example 6]

關於實施例6之有機EL元件,使用於溶解有固形物成分之作為第1芳香族溶劑A之2,3-二甲基硝基苯(bp:245℃)中添加作為第2芳香族溶劑B之3-苯氧基甲苯(bp:272℃)所獲得之包含混合溶劑之墨水,而形成電洞注入層131、電洞傳輸層132、發光層133。各層之層構成材料或膜厚與比較例1相同。上述混合溶劑之含有比率(A:B)為10:90。 Regarding the organic EL device of Example 6, 2,3-dimethylnitrobenzene (bp: 245°C) used as the first aromatic solvent A in which solid components are dissolved is added as the second aromatic solvent B An ink containing a mixed solvent obtained from 3-phenoxytoluene (bp: 272°C) to form a hole injection layer 131, a hole transport layer 132, and a light emitting layer 133. The layer constituent material or film thickness of each layer is the same as in Comparative Example 1. The content ratio (A:B) of the above-mentioned mixed solvent is 10:90.

[實施例7] [Example 7]

關於實施例7之有機EL元件,使用於溶解有固形物成分之作為第1芳香族溶劑A之2,3-二甲基硝基苯(bp:245℃)中添加作為第2芳香族 溶劑B之3-苯氧基甲苯(bp:272℃)所獲得之包含混合溶劑之墨水,而形成電洞注入層131、電洞傳輸層132、發光層133。各層之層構成材料或膜厚與比較例1相同。上述混合溶劑之含有比率(A:B)為30:70。 Regarding the organic EL element of Example 7, it was used as the second aromatic compound in 2,3-dimethylnitrobenzene (bp: 245°C) as the first aromatic solvent A in which solid components were dissolved. An ink containing a mixed solvent obtained from 3-phenoxytoluene (bp: 272° C.) of solvent B forms a hole injection layer 131, a hole transport layer 132, and a light emitting layer 133. The layer constituent material or film thickness of each layer is the same as in Comparative Example 1. The content ratio (A:B) of the above-mentioned mixed solvent is 30:70.

[實施例8] [Example 8]

關於實施例8之有機EL元件,使用於溶解有固形物成分之作為第1芳香族溶劑A之2,3-二甲基硝基苯(bp:245℃)中添加作為第2芳香族溶劑B之3-苯氧基甲苯(bp:272℃)所獲得之包含混合溶劑之墨水,而形成電洞注入層131、電洞傳輸層132、發光層133。各層之層構成材料或膜厚與比較例1相同。上述混合溶劑之含有比率(A:B)為50:50。 Regarding the organic EL device of Example 8, 2,3-dimethylnitrobenzene (bp: 245°C) used as the first aromatic solvent A in which solid components are dissolved is added as the second aromatic solvent B An ink containing a mixed solvent obtained from 3-phenoxytoluene (bp: 272°C) to form a hole injection layer 131, a hole transport layer 132, and a light emitting layer 133. The layer constituent material or film thickness of each layer is the same as in Comparative Example 1. The content ratio (A:B) of the above-mentioned mixed solvent is 50:50.

[實施例9] [Example 9]

關於實施例9之有機EL元件,使用於溶解有固形物成分之作為第1芳香族溶劑A之2,3-二甲基硝基苯(bp:245℃)中添加作為第2芳香族溶劑B之3-苯氧基甲苯(bp:272℃)所獲得之包含混合溶劑之墨水,而形成電洞注入層131、電洞傳輸層132、發光層133。各層之層構成材料或膜厚與比較例1相同。上述混合溶劑之含有比率(A:B)為70:30。 Regarding the organic EL device of Example 9, 2,3-dimethylnitrobenzene (bp: 245°C) used as the first aromatic solvent A in which solid components are dissolved is added as the second aromatic solvent B An ink containing a mixed solvent obtained from 3-phenoxytoluene (bp: 272°C) to form a hole injection layer 131, a hole transport layer 132, and a light emitting layer 133. The layer constituent material or film thickness of each layer is the same as in Comparative Example 1. The content ratio (A:B) of the above-mentioned mixed solvent is 70:30.

[實施例10] [Example 10]

關於實施例10之有機EL元件,使用於溶解有固形物成分之作為第1芳香族溶劑A之2,3-二甲基硝基苯(bp:245℃)中添加作為第2芳香族溶劑B之3-苯氧基甲苯(bp:272℃)所獲得之包含混合溶劑之墨水,而形成電洞注入層131、電洞傳輸層132、發光層133。各層之層構成材料或膜厚與比較例1相同。上述混合溶劑之含有比率(A:B)為90:10。 Regarding the organic EL device of Example 10, 2,3-dimethylnitrobenzene (bp: 245°C) used as the first aromatic solvent A in which solid components are dissolved is added as the second aromatic solvent B An ink containing a mixed solvent obtained from 3-phenoxytoluene (bp: 272°C) to form a hole injection layer 131, a hole transport layer 132, and a light emitting layer 133. The layer constituent material or film thickness of each layer is the same as in Comparative Example 1. The content ratio (A:B) of the above-mentioned mixed solvent is 90:10.

上述實施例6~實施例10係使包含作為第1芳香族溶劑A之2,3-二 甲基硝基苯(bp:245℃)與作為第2芳香族溶劑B之3-苯氧基甲苯(bp:272℃)的混合溶劑之含有比率(A:B)不同者。 The above-mentioned Examples 6 to 10 are made to contain 2,3-dioxide as the first aromatic solvent A The content ratio (A:B) of the mixed solvent of methyl nitrobenzene (bp: 245°C) and 3-phenoxytoluene (bp: 272°C) as the second aromatic solvent B is different.

[實施例11] [Example 11]

關於實施例11之有機EL元件,使用於溶解有固形物成分之作為第1芳香族溶劑A之2,4-二甲基硝基苯(bp:245℃)中添加作為第2芳香族溶劑B之3-苯氧基甲苯(bp:272℃)所獲得之包含混合溶劑之墨水,而形成電洞注入層131、電洞傳輸層132、發光層133。各層之層構成材料或膜厚與比較例1相同。上述混合溶劑之含有比率(A:B)為10:90。 Regarding the organic EL device of Example 11, 2,4-dimethylnitrobenzene (bp: 245°C) used as the first aromatic solvent A in which solid components are dissolved is added as the second aromatic solvent B An ink containing a mixed solvent obtained from 3-phenoxytoluene (bp: 272°C) to form a hole injection layer 131, a hole transport layer 132, and a light emitting layer 133. The layer constituent material or film thickness of each layer is the same as in Comparative Example 1. The content ratio (A:B) of the above-mentioned mixed solvent is 10:90.

[實施例12] [Example 12]

關於實施例12之有機EL元件,使用於溶解有固形物成分之作為第1芳香族溶劑A之2,4-二甲基硝基苯(bp:245℃)中添加作為第2芳香族溶劑B之3-苯氧基甲苯(bp:272℃)所獲得之包含混合溶劑之墨水,而形成電洞注入層131、電洞傳輸層132、發光層133。各層之層構成材料或膜厚與比較例1相同。上述混合溶劑之含有比率(A:B)為30:70。 Regarding the organic EL device of Example 12, 2,4-dimethylnitrobenzene (bp: 245°C) used as the first aromatic solvent A in which solid components are dissolved is added as the second aromatic solvent B An ink containing a mixed solvent obtained from 3-phenoxytoluene (bp: 272°C) to form a hole injection layer 131, a hole transport layer 132, and a light emitting layer 133. The layer constituent material or film thickness of each layer is the same as in Comparative Example 1. The content ratio (A:B) of the above-mentioned mixed solvent is 30:70.

[實施例13] [Example 13]

關於實施例13之有機EL元件,使用於溶解有固形物成分之作為第1芳香族溶劑A之2,4-二甲基硝基苯(bp:245℃)中添加作為第2芳香族溶劑B之3-苯氧基甲苯(bp:272℃)所獲得之包含混合溶劑之墨水,而形成電洞注入層131、電洞傳輸層132、發光層133。各層之層構成材料或膜厚與比較例1相同。上述混合溶劑之含有比率(A:B)為50:50。 Regarding the organic EL device of Example 13, 2,4-dimethylnitrobenzene (bp: 245°C), which is used as the first aromatic solvent A in which solid components are dissolved, is added as the second aromatic solvent B An ink containing a mixed solvent obtained from 3-phenoxytoluene (bp: 272°C) to form a hole injection layer 131, a hole transport layer 132, and a light emitting layer 133. The layer constituent material or film thickness of each layer is the same as in Comparative Example 1. The content ratio (A:B) of the above-mentioned mixed solvent is 50:50.

[實施例14] [Example 14]

關於實施例14之有機EL元件,使用於溶解有固形物成分之作為第1芳香族溶劑A之2,4-二甲基硝基苯(bp:245℃)中添加作為第2芳香 族溶劑B之3-苯氧基甲苯(bp:272℃)所獲得之包含混合溶劑之墨水,而形成電洞注入層131、電洞傳輸層132、發光層133。各層之層構成材料或膜厚與比較例1相同。上述混合溶劑之含有比率(A:B)為70:30。 Regarding the organic EL device of Example 14, it was used as the first aromatic solvent A, 2,4-dimethylnitrobenzene (bp: 245°C) in which solid components were dissolved, and added as the second aromatic An ink containing a mixed solvent obtained from 3-phenoxytoluene (bp: 272° C.) of the group solvent B forms a hole injection layer 131, a hole transport layer 132, and a light emitting layer 133. The layer constituent material or film thickness of each layer is the same as in Comparative Example 1. The content ratio (A:B) of the above-mentioned mixed solvent is 70:30.

[實施例15] [Example 15]

關於實施例15之有機EL元件,使用於溶解有固形物成分之作為第1芳香族溶劑A之2,4-二甲基硝基苯(bp:245℃)中添加作為第2芳香族溶劑B之3-苯氧基甲苯(bp:272℃)所獲得之包含混合溶劑之墨水,而形成電洞注入層131、電洞傳輸層132、發光層133。各層之層構成材料或膜厚與比較例1相同。上述混合溶劑之含有比率(A:B)為90:10。 Regarding the organic EL device of Example 15, 2,4-dimethylnitrobenzene (bp: 245°C), which is used as the first aromatic solvent A in which solid components are dissolved, is added as the second aromatic solvent B An ink containing a mixed solvent obtained from 3-phenoxytoluene (bp: 272°C) to form a hole injection layer 131, a hole transport layer 132, and a light emitting layer 133. The layer constituent material or film thickness of each layer is the same as in Comparative Example 1. The content ratio (A:B) of the above-mentioned mixed solvent is 90:10.

上述實施例11~實施例15係使包含作為第1芳香族溶劑A之2,4-二甲基硝基苯(bp:245℃)與作為第2芳香族溶劑B之3-苯氧基甲苯(bp:272℃)的混合溶劑之含有比率(A:B)不同者。 The above-mentioned Examples 11 to 15 consist of 2,4-dimethylnitrobenzene (bp: 245°C) as the first aromatic solvent A and 3-phenoxytoluene as the second aromatic solvent B (bp: 272°C) the content ratio (A:B) of the mixed solvent is different.

關於以下之比較例與實施例中之墨水構成,使用TDAPB作為主體材料,並使用作為獲得磷光之發光材料(客體材料)的Ppy2Ir,其他構成與上述作為獲得螢光之發光材料的F8BT基本相同。 Regarding the ink composition in the following comparative examples and examples, TDAPB is used as the host material, and Ppy2Ir is used as the luminescent material (guest material) for phosphorescence. The other composition is basically the same as the above-mentioned F8BT as the luminescent material for fluorescence.

[比較例4] [Comparative Example 4]

關於比較例4之有機EL元件,使用硝基苯(bp:210℃)作為第1芳香族溶劑A,使作為電洞注入材料之VB-TCA溶解於硝基苯而獲得墨水,使用所獲得之不含第2芳香族溶劑B之墨水而形成膜厚為10nm~30nm之電洞注入層131。又,使用使作為電洞傳輸材料之TFB溶解於硝基苯所獲得之墨水,而形成膜厚為10nm~20nm之電洞傳輸層132。進而,使用使獲得磷光之上述發光材料溶解於硝基苯所獲得之墨水,而形成膜厚為60nm~80nm之發光層133。機能層136中之其他電子傳輸層134、電子注入層135之構成如有機EL元件130之製造方法 中所說明。 Regarding the organic EL element of Comparative Example 4, nitrobenzene (bp: 210°C) was used as the first aromatic solvent A, and VB-TCA as a hole injection material was dissolved in nitrobenzene to obtain an ink, and the obtained ink was used A hole injection layer 131 with a film thickness of 10 nm-30 nm is formed without the ink containing the second aromatic solvent B. In addition, an ink obtained by dissolving TFB as a hole transport material in nitrobenzene is used to form a hole transport layer 132 with a film thickness of 10 nm to 20 nm. Furthermore, using an ink obtained by dissolving the above-mentioned phosphorescent light-emitting material in nitrobenzene, a light-emitting layer 133 having a film thickness of 60 nm to 80 nm is formed. The structure of the other electron transport layer 134 and the electron injection layer 135 in the functional layer 136 is like the manufacturing method of the organic EL device 130 As explained in.

[比較例5] [Comparative Example 5]

關於比較例5之有機EL元件,使用於溶解有固形物成分之作為第1芳香族溶劑A之硝基苯(bp:210℃)中添加作為第2芳香族溶劑B之2-甲氧基甲苯(bp:170℃)所獲得之包含混合溶劑之墨水,而形成電洞注入層131、電洞傳輸層132、發光層133。各層之層構成材料或膜厚與比較例4相同。上述混合溶劑之含有比率(A:B)為50:50。 Regarding the organic EL element of Comparative Example 5, it was used in nitrobenzene (bp: 210°C) as the first aromatic solvent A in which solid components were dissolved, and 2-methoxytoluene as the second aromatic solvent B was added (bp: 170° C.) The obtained ink containing the mixed solvent forms the hole injection layer 131, the hole transport layer 132, and the light emitting layer 133. The layer constituent material or film thickness of each layer is the same as that of Comparative Example 4. The content ratio (A:B) of the above-mentioned mixed solvent is 50:50.

[比較例6] [Comparative Example 6]

關於比較例6之有機EL元件,使用於溶解有固形物成分之作為第1芳香族溶劑A之硝基苯(bp:210℃)中添加作為第2芳香族溶劑B之1,3,5-三乙基苯(bp:215℃)所獲得之包含混合溶劑之墨水,而形成電洞注入層131、電洞傳輸層132、發光層133。各層之層構成材料或膜厚與比較例4相同。上述混合溶劑之含有比率(A:B)為60:40。 Regarding the organic EL device of Comparative Example 6, 1,3,5-as the second aromatic solvent B added to nitrobenzene (bp: 210°C) as the first aromatic solvent A in which solid components are dissolved An ink containing a mixed solvent obtained from triethylbenzene (bp: 215° C.) forms a hole injection layer 131, a hole transport layer 132, and a light emitting layer 133. The layer constituent material or film thickness of each layer is the same as that of Comparative Example 4. The content ratio (A:B) of the above-mentioned mixed solvent is 60:40.

[實施例16] [Example 16]

關於實施例16之有機EL元件,使用於溶解有固形物成分之作為第1芳香族溶劑A之硝基苯(bp:210℃)中添加作為第2芳香族溶劑B之3-苯氧基甲苯(bp:272℃)所獲得之包含混合溶劑之墨水,而形成電洞注入層131、電洞傳輸層132、發光層133。各層之層構成材料或膜厚與比較例4相同。上述混合溶劑之含有比率(A:B)為10:90。 Regarding the organic EL element of Example 16, it was used to add 3-phenoxytoluene as the second aromatic solvent B to nitrobenzene (bp: 210°C) as the first aromatic solvent A in which solid components were dissolved. (bp: 272° C.) The obtained ink containing the mixed solvent forms the hole injection layer 131, the hole transport layer 132, and the light emitting layer 133. The layer constituent material or film thickness of each layer is the same as that of Comparative Example 4. The content ratio (A:B) of the above-mentioned mixed solvent is 10:90.

[實施例17] [Example 17]

關於實施例17之有機EL元件,使用於溶解有固形物成分之作為第1芳香族溶劑A之硝基苯(bp:210℃)中添加作為第2芳香族溶劑B之3-苯氧基甲苯(bp:272℃)所獲得之包含混合溶劑之墨水,而形成電洞注入層131、電洞傳輸層132、發光層133。各層之層構成材料或膜厚與比較例4相同。上述混合溶劑之含有比率(A:B)為30:70。 Regarding the organic EL device of Example 17, it was used to add 3-phenoxytoluene as the second aromatic solvent B to nitrobenzene (bp: 210°C) as the first aromatic solvent A in which solid components were dissolved. (bp: 272° C.) The obtained ink containing the mixed solvent forms the hole injection layer 131, the hole transport layer 132, and the light emitting layer 133. The layer constituent material or film thickness of each layer is the same as that of Comparative Example 4. The content ratio (A:B) of the above-mentioned mixed solvent is 30:70.

[實施例18] [Example 18]

關於實施例18之有機EL元件,使用於溶解有固形物成分之作為第1芳香族溶劑A之硝基苯(bp:210℃)中添加作為第2芳香族溶劑B之3-苯氧基甲苯(bp:272℃)所獲得之包含混合溶劑之墨水,而形成電洞注入層131、電洞傳輸層132、發光層133。各層之層構成材料或膜厚與比較例4相同。上述混合溶劑之含有比率(A:B)為50:50。 Regarding the organic EL element of Example 18, 3-phenoxytoluene as the second aromatic solvent B was added to nitrobenzene (bp: 210°C) as the first aromatic solvent A in which solid components were dissolved. (bp: 272° C.) The obtained ink containing the mixed solvent forms the hole injection layer 131, the hole transport layer 132, and the light emitting layer 133. The layer constituent material or film thickness of each layer is the same as that of Comparative Example 4. The content ratio (A:B) of the above-mentioned mixed solvent is 50:50.

[實施例19] [Example 19]

關於實施例19之有機EL元件,使用於溶解有固形物成分之作為第1芳香族溶劑A之硝基苯(bp:210℃)中添加作為第2芳香族溶劑B之3-苯氧基甲苯(bp:272℃)所獲得之包含混合溶劑之墨水,而形成電洞注入層131、電洞傳輸層132、發光層133。各層之層構成材料或膜厚與比較例4相同。上述混合溶劑之含有比率(A:B)為70:30。 Regarding the organic EL device of Example 19, 3-phenoxytoluene as the second aromatic solvent B was added to nitrobenzene (bp: 210°C) as the first aromatic solvent A in which solid components were dissolved. (bp: 272° C.) The obtained ink containing the mixed solvent forms the hole injection layer 131, the hole transport layer 132, and the light emitting layer 133. The layer constituent material or film thickness of each layer is the same as that of Comparative Example 4. The content ratio (A:B) of the above-mentioned mixed solvent is 70:30.

[實施例20] [Example 20]

關於實施例20之有機EL元件,使用於溶解有固形物成分之作為第1芳香族溶劑A之硝基苯(bp:210℃)中添加作為第2芳香族溶劑B之3-苯氧基甲苯(bp:272℃)所獲得之包含混合溶劑之墨水,而形成電洞注入層131、電洞傳輸層132、發光層133。各層之層構成材料或膜厚與比較例4相同。上述混合溶劑之含有比率(A:B)為90:10。 Regarding the organic EL element of Example 20, 3-phenoxytoluene as the second aromatic solvent B was added to nitrobenzene (bp: 210°C) as the first aromatic solvent A in which solid components were dissolved. (bp: 272° C.) The obtained ink containing the mixed solvent forms the hole injection layer 131, the hole transport layer 132, and the light emitting layer 133. The layer constituent material or film thickness of each layer is the same as that of Comparative Example 4. The content ratio (A:B) of the above-mentioned mixed solvent is 90:10.

[實施例21] [Example 21]

關於實施例21之有機EL元件,使用於溶解有固形物成分之作為第1芳香族溶劑A之2,3-二甲基硝基苯(bp:245℃)中添加作為第2芳香族溶劑B之3-苯氧基甲苯(bp:272℃)所獲得之包含混合溶劑之墨水,而形成電洞注入層131、電洞傳輸層132、發光層133。各層之層構成材料或膜厚與比較例4相同。上述混合溶劑之含有比率(A:B)為10:90。 Regarding the organic EL device of Example 21, 2,3-dimethylnitrobenzene (bp: 245°C) used as the first aromatic solvent A in which solid components are dissolved is added as the second aromatic solvent B An ink containing a mixed solvent obtained from 3-phenoxytoluene (bp: 272°C) to form a hole injection layer 131, a hole transport layer 132, and a light emitting layer 133. The layer constituent material or film thickness of each layer is the same as that of Comparative Example 4. The content ratio (A:B) of the above-mentioned mixed solvent is 10:90.

[實施例22] [Example 22]

關於實施例22之有機EL元件,使用於溶解有固形物成分之作為 第1芳香族溶劑A之2,3-二甲基硝基苯(bp:245℃)中添加作為第2芳香族溶劑B之3-苯氧基甲苯(bp:272℃)所獲得之包含混合溶劑之墨水,而形成電洞注入層131、電洞傳輸層132、發光層133。各層之層構成材料或膜厚與比較例4相同。上述混合溶劑之含有比率(A:B)為30:70。 Regarding the organic EL device of Example 22, it was used as a solid component dissolved Containment mixture obtained by adding 3-phenoxytoluene (bp: 272°C) as the second aromatic solvent B to 2,3-dimethylnitrobenzene (bp: 245°C) in the first aromatic solvent A The solvent ink forms the hole injection layer 131, the hole transport layer 132, and the light emitting layer 133. The layer constituent material or film thickness of each layer is the same as that of Comparative Example 4. The content ratio (A:B) of the above-mentioned mixed solvent is 30:70.

[實施例23] [Example 23]

關於實施例23之有機EL元件,使用於溶解有固形物成分之作為第1芳香族溶劑A之2,3-二甲基硝基苯(bp:245℃)中添加作為第2芳香族溶劑B之3-苯氧基甲苯(bp:272℃)所獲得之包含混合溶劑之墨水,而形成電洞注入層131、電洞傳輸層132、發光層133。各層之層構成材料或膜厚與比較例4相同。上述混合溶劑之含有比率(A:B)為50:50。 Regarding the organic EL device of Example 23, 2,3-dimethylnitrobenzene (bp: 245°C), which is used as the first aromatic solvent A in which solid components are dissolved, is added as the second aromatic solvent B An ink containing a mixed solvent obtained from 3-phenoxytoluene (bp: 272°C) to form a hole injection layer 131, a hole transport layer 132, and a light emitting layer 133. The layer constituent material or film thickness of each layer is the same as that of Comparative Example 4. The content ratio (A:B) of the above-mentioned mixed solvent is 50:50.

[實施例24] [Example 24]

關於實施例24之有機EL元件,使用於溶解有固形物成分之作為第1芳香族溶劑A之2,3-二甲基硝基苯(bp:245℃)中添加作為第2芳香族溶劑B之3-苯氧基甲苯(bp:272℃)所獲得之包含混合溶劑之墨水,而形成電洞注入層131、電洞傳輸層132、發光層133。各層之層構成材料或膜厚與比較例4相同。上述混合溶劑之含有比率(A:B)為70:30。 Regarding the organic EL device of Example 24, 2,3-dimethylnitrobenzene (bp: 245°C), which is used as the first aromatic solvent A in which solid components are dissolved, is added as the second aromatic solvent B An ink containing a mixed solvent obtained from 3-phenoxytoluene (bp: 272°C) to form a hole injection layer 131, a hole transport layer 132, and a light emitting layer 133. The layer constituent material or film thickness of each layer is the same as that of Comparative Example 4. The content ratio (A:B) of the above-mentioned mixed solvent is 70:30.

[實施例25] [Example 25]

關於實施例25之有機EL元件,使用於溶解有固形物成分之作為第1芳香族溶劑A之2,3-二甲基硝基苯(bp:245℃)中添加作為第2芳香族溶劑B之3-苯氧基甲苯(bp:272℃)所獲得之包含混合溶劑之墨水,而形成電洞注入層131、電洞傳輸層132、發光層133。各層之層構成材料或膜厚與比較例4相同。上述混合溶劑之含有比率(A:B)為90:10。 Regarding the organic EL device of Example 25, 2,3-dimethylnitrobenzene (bp: 245°C) used as the first aromatic solvent A in which solid components are dissolved is added as the second aromatic solvent B An ink containing a mixed solvent obtained from 3-phenoxytoluene (bp: 272°C) to form a hole injection layer 131, a hole transport layer 132, and a light emitting layer 133. The layer constituent material or film thickness of each layer is the same as that of Comparative Example 4. The content ratio (A:B) of the above-mentioned mixed solvent is 90:10.

[實施例26] [Example 26]

關於實施例26之有機EL元件,使用於溶解有固形物成分之作為第1芳香族溶劑A之2,4-二甲基硝基苯(bp:245℃)中添加作為第2芳香族溶劑B之3-苯氧基甲苯(bp:272℃)所獲得之包含混合溶劑之墨水,而形成電洞注入層131、電洞傳輸層132、發光層133。各層之層構成材料或膜厚與比較例4相同。上述混合溶劑之含有比率(A:B)為10:90。 Regarding the organic EL device of Example 26, 2,4-dimethylnitrobenzene (bp: 245°C), which is used as the first aromatic solvent A in which solid components are dissolved, is added as the second aromatic solvent B An ink containing a mixed solvent obtained from 3-phenoxytoluene (bp: 272°C) to form a hole injection layer 131, a hole transport layer 132, and a light emitting layer 133. The layer constituent material or film thickness of each layer is the same as that of Comparative Example 4. The content ratio (A:B) of the above-mentioned mixed solvent is 10:90.

[實施例27] [Example 27]

關於實施例27之有機EL元件,使用於溶解有固形物成分之作為第1芳香族溶劑A之2,4-二甲基硝基苯(bp:245℃)中添加作為第2芳香族溶劑B之3-苯氧基甲苯(bp:272℃)所獲得之包含混合溶劑之墨水,而形成電洞注入層131、電洞傳輸層132、發光層133。各層之層構成材料或膜厚與比較例4相同。上述混合溶劑之含有比率(A:B)為30:70。 Regarding the organic EL device of Example 27, 2,4-dimethylnitrobenzene (bp: 245°C), which is used as the first aromatic solvent A in which solid components are dissolved, is added as the second aromatic solvent B An ink containing a mixed solvent obtained by using 3-phenoxytoluene (bp: 272°C) to form a hole injection layer 131, a hole transport layer 132, and a light emitting layer 133. The layer constituent material or film thickness of each layer is the same as that of Comparative Example 4. The content ratio (A:B) of the above-mentioned mixed solvent is 30:70.

[實施例28] [Example 28]

關於實施例28之有機EL元件,使用於溶解有固形物成分之作為第1芳香族溶劑A之2,4-二甲基硝基苯(bp:245℃)中添加作為第2芳香族溶劑B之3-苯氧基甲苯(bp:272℃)所獲得之包含混合溶劑之墨水,而形成電洞注入層131、電洞傳輸層132、發光層133。各層之層構成材料或膜厚與比較例4相同。上述混合溶劑之含有比率(A:B)為50:50。 Regarding the organic EL element of Example 28, 2,4-dimethylnitrobenzene (bp: 245°C), which is used as the first aromatic solvent A in which solid components are dissolved, is added as the second aromatic solvent B An ink containing a mixed solvent obtained from 3-phenoxytoluene (bp: 272°C) to form a hole injection layer 131, a hole transport layer 132, and a light emitting layer 133. The layer constituent material or film thickness of each layer is the same as that of Comparative Example 4. The content ratio (A:B) of the above-mentioned mixed solvent is 50:50.

[實施例29] [Example 29]

關於實施例29之有機EL元件,使用於溶解有固形物成分之作為第1芳香族溶劑A之2,4-二甲基硝基苯(bp:245℃)中添加作為第2芳香族溶劑B之3-苯氧基甲苯(bp:272℃)所獲得之包含混合溶劑之墨水,而形成電洞注入層131、電洞傳輸層132、發光層133。各層之層構成 材料或膜厚與比較例4相同。上述混合溶劑之含有比率(A:B)為70:30。 Regarding the organic EL element of Example 29, 2,4-dimethylnitrobenzene (bp: 245°C), which is used as the first aromatic solvent A in which solid components are dissolved, is added as the second aromatic solvent B An ink containing a mixed solvent obtained from 3-phenoxytoluene (bp: 272°C) to form a hole injection layer 131, a hole transport layer 132, and a light emitting layer 133. Layer composition of each layer The material or film thickness is the same as that of Comparative Example 4. The content ratio (A:B) of the above-mentioned mixed solvent is 70:30.

[實施例30] [Example 30]

關於實施例30之有機EL元件,使用於溶解有固形物成分之作為第1芳香族溶劑A之2,4-二甲基硝基苯(bp:245℃)中添加作為第2芳香族溶劑B之3-苯氧基甲苯(bp:272℃)所獲得之包含混合溶劑之墨水,而形成電洞注入層131、電洞傳輸層132、發光層133。各層之層構成材料或膜厚與比較例4相同。上述混合溶劑之含有比率(A:B)為90:10。 Regarding the organic EL device of Example 30, 2,4-dimethylnitrobenzene (bp: 245°C) used as the first aromatic solvent A in which solid components are dissolved is added as the second aromatic solvent B An ink containing a mixed solvent obtained from 3-phenoxytoluene (bp: 272°C) to form a hole injection layer 131, a hole transport layer 132, and a light emitting layer 133. The layer constituent material or film thickness of each layer is the same as that of Comparative Example 4. The content ratio (A:B) of the above-mentioned mixed solvent is 90:10.

對本實施形態之有機EL元件之元件特性之評價方法進行說明。關於作為元件特性之驅動電壓,將比較例1之驅動電壓設為「1」,其他比較例2、3或實施例1~實施例15之驅動電壓於小於0.9之情形時記為「◎(良好)」,於為0.9以上且未達0.95之情形時記為「○(良)」,於為0.95以上且未達1.05之情形時記為「●(稍不良)」,於為1.05以上之情形時記為「×(不良)」。同樣地,將比較例4之驅動電壓設為「1」,其他比較例5、6或實施例16~實施例30之驅動電壓於小於0.9之情形時記為「◎(良好)」,於為0.9以上且未達0.95之情形時記為「○(良)」,於為0.95以上且未達1.05之情形時記為「●(稍不良)」,於為1.05以上之情形時記為「×(不良)」。 The method of evaluating the device characteristics of the organic EL device of this embodiment will be described. Regarding the driving voltage as the device characteristic, the driving voltage of Comparative Example 1 is set to "1", and the driving voltages of other Comparative Examples 2, 3, or Examples 1 to 15 are recorded as "◎ (good) when the driving voltage is less than 0.9 )", when it is 0.9 or more and less than 0.95, it is recorded as "○ (good)", when it is 0.95 or more and less than 1.05, it is recorded as "● (slightly poor)", and when it is 1.05 or more It is recorded as "× (bad)". Similarly, the driving voltage of Comparative Example 4 is set to "1", and the driving voltage of other Comparative Examples 5 and 6 or Examples 16 to 30 is marked as "◎ (good)" when the driving voltage is less than 0.9, and is If it is 0.9 or more and less than 0.95, it is recorded as "○ (good)", if it is 0.95 or more and less than 1.05, it is recorded as "● (slightly poor)", and if it is 1.05 or more, it is recorded as "× (bad)".

關於作為元件特性之電流效率,將比較例1之電流效率設為「1」,其他比較例2、3或實施例1~實施例15之電流效率於大於1.1之情形時記為「◎(良好)」,於為1.05以上且未達1.1之情形時記為「○(良)」,於為0.95以上且未達1.05之情形時記為「●(稍不良)」,於未達0.95之情形時記為「×(不良)」。同樣地,將比較例4之電流效率設為「1」,其他比較例5、6或實施例16~實施例30之電流效率於大於1.1之情形時記為「◎(良好)」,於為1.05以上且未達1.1之情形時記為 「○(良)」,於為0.95以上且未達1.05之情形時記為「●(稍不良)」,於未達0.95之情形時記為「×(不良)」。 Regarding the current efficiency as the element characteristic, the current efficiency of Comparative Example 1 is set to "1", and the current efficiency of other Comparative Examples 2, 3 or Example 1 to Example 15 is recorded as "◎ (good) when the current efficiency is greater than 1.1 )", when it is 1.05 or more and less than 1.1, it is recorded as "○ (good)", when it is 0.95 or more and less than 1.05, it is recorded as "● (slightly bad)", when it is less than 0.95 It is recorded as "× (bad)". Similarly, the current efficiency of Comparative Example 4 is set to "1", and the current efficiency of other Comparative Examples 5 and 6 or Examples 16 to 30 is marked as "◎ (good)" when the current efficiency is greater than 1.1. When 1.05 or more and less than 1.1 is recorded as "○ (good)" is recorded as "● (slightly bad)" when it is above 0.95 and less than 1.05, and "× (bad)" when it is less than 0.95.

關於作為元件特性之壽命半衰時間,將比較例1之壽命半衰時間設為「1」,其他比較例2、3或實施例1~實施例15之壽命半衰時間於大於1.5之情形時記為「◎(良好)」,於為1.0以上且未達1.5之情形時記為「○(良)」,於為0.9以上且未達1.0之情形時記為「●(稍不良)」,於未達0.9之情形時記為「×(不良)」。同樣地,將比較例4之壽命半衰時間設為「1」,其他比較例5、6或實施例16~實施例30之壽命半衰時間於大於1.5之情形時記為「◎(良好)」,於為1.0以上且未達1.5之情形時記為「○(良)」,於為0.9以上且未達1.0之情形時記為「●(稍不良)」,於未達0.9之情形時記為「×(不良)」。 Regarding the life half-life time as a component characteristic, the life half-life time of Comparative Example 1 is set to "1", and the life half-life time of other Comparative Examples 2, 3 or Examples 1 to 15 is greater than 1.5 Recorded as "◎ (good)", "○ (good)" when it is 1.0 or more and less than 1.5, and "● (slightly bad)" when it is 0.9 or more and less than 1.0, In the case of less than 0.9, it is recorded as "× (bad)". Similarly, the life half-life time of Comparative Example 4 is set to "1", and the life half-life time of other Comparative Examples 5, 6 or Examples 16 to 30 is recorded as "◎ (good) when the life half-life time is greater than 1.5 ", when it is 1.0 or more and less than 1.5, it is recorded as "○ (good)", when it is 0.9 or more and less than 1.0, it is recorded as "● (slightly poor)", when it is less than 0.9 Recorded as "× (bad)".

圖17係表示比較例1~比較例3及實施例1~實施例15中之有機EL元件之元件特性之評價結果的表,圖18係表示比較例4~比較例6及實施例16~實施例30中之有機EL元件之元件特性之評價結果的表。 Fig. 17 is a table showing the evaluation results of the device characteristics of the organic EL devices in Comparative Example 1 to Comparative Example 3 and Example 1 to Example 15, and Fig. 18 is a table showing Comparative Example 4 to Comparative Example 6 and Example 16 to implementation Table of the evaluation results of the device characteristics of the organic EL device in Example 30.

如圖17所示,於使用獲得螢光之發光材料之情形時,相對於比較例1,比較例2及比較例3之有機EL元件之元件特性,即驅動電壓、電流效率、壽命半衰時間之評價均為「●(稍不良)」。相對於此,實施例1~實施例15中,元件特性之評價為「◎(良好)」或「○(良)」。尤其於第1芳香族溶劑A與第2芳香族溶劑B於混合溶劑中之含有比率(A:B)為10:90~50:50之實施例1~實施例3、實施例6~實施例8、實施例11~實施例13中,驅動電壓、電流效率、壽命半衰時間均為「◎(良好)」。於混合溶劑之含有比率(A:B)為70:30之實施例4、實施例9、實施例14中,驅動電壓與電流效率為「◎(良好)」,壽命半衰時間為「○(良)」。進而,於混合溶劑之含有比率(A:B)為90:10之實施例5、實施例10、實施例15中,元件特性均為「○(良)」。 As shown in Figure 17, when using a luminescent material that obtains fluorescence, the device characteristics of the organic EL devices of Comparative Example 2 and Comparative Example 3, namely, driving voltage, current efficiency, and life half-life time, compared to Comparative Example 1, The evaluations are all "● (slightly bad)". On the other hand, in Examples 1 to 15, the evaluation of the device characteristics was "◎ (good)" or "○ (good)". Especially in the first aromatic solvent A and the second aromatic solvent B in the mixed solvent, the content ratio (A:B) is 10:90-50:50 Example 1~Example 3, Example 6~Example 8. In Examples 11 to 13, the driving voltage, current efficiency, and life half-life time are all "◎ (good)". In Example 4, Example 9, and Example 14 where the content ratio of the mixed solvent (A:B) is 70:30, the driving voltage and current efficiency are "◎ (good)", and the lifetime half-life time is "○( good)". Furthermore, in Example 5, Example 10, and Example 15 where the content ratio of the mixed solvent (A:B) was 90:10, the device characteristics were all "○ (good)".

如圖18所示,於使用獲得磷光之發光材料之情形時,亦獲得與 使用獲得螢光之發光材料之情形時相同之結果。具體而言,相對於比較例4,比較例5及比較例6之有機EL元件之元件特性,即驅動電壓、電流效率、壽命半衰時間之評價均為「●(稍不良)」。相對於此,於第1芳香族溶劑A與第2芳香族溶劑B於混合溶劑中之含有比率(A:B)為10:90~50:50之實施例16~實施例18、實施例21~實施例23、實施例26~實施例28中,驅動電壓、電流效率、壽命半衰時間均為「◎(良好)」。於混合溶劑之含有比率(A:B)為70:30之實施例19、實施例24、實施例29中,驅動電壓與電流效率為「◎(良好)」,壽命半衰時間為「○(良)」。進而,於混合溶劑之含有比率(A:B)為90:10之實施例20、實施例25、實施例30中,元件特性均為「○(良)」。 As shown in Figure 18, in the case of using phosphorescent light-emitting materials, the same The same result is obtained when using fluorescent materials. Specifically, with respect to Comparative Example 4, the device characteristics of the organic EL devices of Comparative Example 5 and Comparative Example 6, that is, the evaluation of driving voltage, current efficiency, and lifetime half-life time are all "● (slightly poor)". In contrast, the content ratio (A:B) of the first aromatic solvent A and the second aromatic solvent B in the mixed solvent is 10:90-50:50 in Example 16~Example 18, and Example 21 ~ In Example 23, Example 26 to Example 28, the driving voltage, current efficiency, and life half-life time are all "◎ (good)". In Example 19, Example 24, and Example 29 where the content ratio of the mixed solvent (A:B) is 70:30, the driving voltage and current efficiency are "◎ (good)", and the lifetime half-life time is "○( good)". Furthermore, in Example 20, Example 25, and Example 30 in which the content ratio (A:B) of the mixed solvent was 90:10, the device characteristics were all "○ (good)".

根據上述比較例及上述實施例中之元件特性之評價結果,若第1芳香族溶劑A與第2芳香族溶劑B於混合溶劑中之含有比率(A:B)為10:90~90:10之範圍,則任一種溶劑組合時之元件特性均比較例有所改善。進而,於混合溶劑之含有比率(A:B)為10:90、30:70、50:50之實施例中,即第2芳香族溶劑B之含有比率等於或高於第1芳香族溶劑A之含有比率之情形時,獲得更優異之元件特性之評價。關於此種評價結果,認為藉由吸電子性之第1芳香族溶劑A與供電子性之第2芳香族溶劑B的相互作用(引力),於對墨水進行乾燥、焙燒而成膜時,隨著沸點較高之第2芳香族溶劑B之蒸發,沸點較低之第1芳香族溶劑A亦蒸發。藉此,能夠減輕吸電子性之第1芳香族溶劑A於成膜後之膜中之之殘留。換言之,能夠抑制因吸電子性之第1芳香族溶劑A殘留於成膜後之膜中而對元件特性產生影響,而提供獲得所需之優異元件特性之機能層形成用組合物(墨水)。 According to the evaluation results of the device characteristics in the above-mentioned comparative example and the above-mentioned embodiment, if the content ratio (A:B) of the first aromatic solvent A and the second aromatic solvent B in the mixed solvent is 10:90~90:10 Within the range, the device characteristics of any solvent combination are improved in the comparative example. Furthermore, in an embodiment where the content ratio (A:B) of the mixed solvent is 10:90, 30:70, 50:50, that is, the content ratio of the second aromatic solvent B is equal to or higher than that of the first aromatic solvent A In the case of the content ratio, obtain more excellent device characteristics evaluation. Regarding the results of this evaluation, it is believed that the interaction (attractive force) between the first aromatic solvent A with electron-withdrawing properties and the second aromatic solvent B with electron-donating properties (attractive force), when the ink is dried and fired to form a film, is When the second aromatic solvent B with a higher boiling point evaporates, the first aromatic solvent A with a lower boiling point also evaporates. Thereby, the residue of the electron-attracting first aromatic solvent A in the film after film formation can be reduced. In other words, it is possible to suppress the effect of the electron-attracting first aromatic solvent A remaining in the film after film formation on the device characteristics, and provide a composition (ink) for forming a functional layer that obtains the required excellent device characteristics.

再者,認為比較例2之元件特性遜於比較例1之原因在於:墨水中包含沸點低於硝基苯之2-甲氧基甲苯,因此墨水之乾燥速度變快,膜平坦性下降,另外,硝基苯殘留於膜中對元件特性產生影響。比較 例5之元件特性遜於比較例4之原因亦相同。 Furthermore, it is believed that the reason why the device characteristics of Comparative Example 2 are inferior to Comparative Example 1 is that the ink contains 2-methoxytoluene, which has a boiling point lower than nitrobenzene. Therefore, the drying speed of the ink becomes faster and the film flatness decreases. , Nitrobenzene remains in the film to affect the characteristics of the device. Compare The reason why the device characteristics of Example 5 are inferior to that of Comparative Example 4 is also the same.

認為比較例3之元件特性遜於比較例1之原因在於:1,3,5-三乙基苯儘管沸點高於硝基苯,但其供電子性低於實施例中用作第2芳香族溶劑B之3-苯氧基甲苯,因此硝基苯與1,3,5-三乙基苯之相互作用較弱,硝基苯殘留於成膜後之膜中,使元件特性下降。比較例6之元件特性遜於比較例4之原因亦相同。 The reason why the device characteristics of Comparative Example 3 are inferior to that of Comparative Example 1 is believed to be that although 1,3,5-triethylbenzene has a higher boiling point than nitrobenzene, its electron donating properties are lower than those used as the second aromatic in the examples. Solvent B is 3-phenoxytoluene, so the interaction between nitrobenzene and 1,3,5-triethylbenzene is weak, and nitrobenzene remains in the film after film formation, which reduces the device characteristics. The reason why the device characteristics of Comparative Example 6 are inferior to that of Comparative Example 4 is also the same.

本實施形態中,作為具有吸電子基之第1芳香族溶劑A之較佳例,列舉了硝基苯、2,3-二甲基硝基苯、2,4-二甲基硝基苯,但作為吸電子基,除了硝基(-NO2基)以外,亦可列舉氰基(-NH3基)。認為若考慮到有機EL材料與吸電子基之相互作用,則硝基之相互作用之影響小於氰基。 In this embodiment, preferred examples of the first aromatic solvent A having an electron withdrawing group include nitrobenzene, 2,3-dimethylnitrobenzene, and 2,4-dimethylnitrobenzene. However, as the electron withdrawing group, in addition to the nitro group (-NO 2 group), a cyano group (-NH 3 group) may also be mentioned. It is believed that if the interaction between the organic EL material and the electron withdrawing group is taken into consideration, the influence of the interaction of the nitro group is less than that of the cyano group.

又,作為吸電子基,除了硝基以外,亦可列舉鹵素基(-F(氟基)、-Cl(氯基)、-Br(溴基)、-I(碘基))。然而,已知鹵素基之吸電子性強於硝基,若具有鹵素基之溶劑殘留於機能層中,則會因有機EL材料與鹵素基之相互作用而導致有機EL元件之元件特性明顯降低。換言之,認為具有硝基作為吸電子基之第1芳香族溶劑A對有機EL材料表現出相對較低之反應性。 Moreover, as the electron withdrawing group, in addition to the nitro group, halogen groups (-F (fluoro group), -Cl (chloro group), -Br (bromo group), -I (iodo group)) can also be mentioned. However, it is known that halogen groups have stronger electron withdrawing properties than nitro groups. If a solvent with halogen groups remains in the functional layer, the device characteristics of the organic EL device will be significantly reduced due to the interaction between the organic EL material and the halogen groups. In other words, it is believed that the first aromatic solvent A having a nitro group as an electron-withdrawing group exhibits relatively low reactivity with organic EL materials.

另一方面,如上述實施例所示,即便增大混合溶劑之含有比率(A:B)中之第2芳香族溶劑B之比率,亦不會對元件特性產生影響,因此認為具有烷氧基或胺基作為供電子基之第2芳香族溶劑B對有機EL材料幾乎不顯示出反應性。 On the other hand, as shown in the above examples, even if the ratio of the second aromatic solvent B in the mixed solvent content ratio (A:B) is increased, the device characteristics will not be affected, so it is considered to have an alkoxy group Or the second aromatic solvent B with an amine group as an electron-donating group shows almost no reactivity with the organic EL material.

即,即便構成機能層形成用組合物之溶劑殘留於成膜後之膜中,亦較佳為分別選擇與有機EL材料之反應性較低之第1芳香族溶劑A與第2芳香族溶劑B。又,上述實施例中,關於第1芳香族溶劑A、第2芳香族溶劑B分別選擇了1種溶劑,但不限定於此,亦可分別選擇多種溶劑。進而,混合溶劑不限定於由第1芳香族溶劑A與第2芳香族溶 劑B構成,例如為了調整墨水之黏度或表面張力,亦可包含與有機EL材料之反應性較低之其他芳香族溶劑或界面活性劑等。 That is, even if the solvent constituting the composition for forming a functional layer remains in the film after film formation, it is preferable to select the first aromatic solvent A and the second aromatic solvent B, which are less reactive with the organic EL material. . In addition, in the above-mentioned examples, one solvent was selected for each of the first aromatic solvent A and the second aromatic solvent B, but it is not limited to this, and a plurality of solvents may be selected separately. Furthermore, the mixed solvent is not limited to a mixture of the first aromatic solvent A and the second aromatic solvent. The composition of agent B, for example, in order to adjust the viscosity or surface tension of the ink, it may also include other aromatic solvents or surfactants with lower reactivity with organic EL materials.

上文中揭示了本實施形態之機能層形成用組合物(墨水)適合用於採用噴墨法形成機能層中之至少1層,但亦可應用於噴墨法以外之例如定量噴出法或旋轉塗佈法、噴塗法等液相製程。 It is disclosed above that the functional layer forming composition (ink) of the present embodiment is suitable for forming at least one of the functional layers by the inkjet method, but it can also be applied to other than the inkjet method, such as quantitative spraying or spin coating. Liquid-phase processes such as cloth method and spray method.

(第2實施形態) (Second Embodiment)

<電子機器> <Electronic Equipment>

其次,參照圖19對本實施形態之電子機器進行說明。圖19(a)係表示作為電子機器之一例之筆記型個人電腦的概略圖,圖19(b)係表示作為電子機器之一例之薄型電視(TV)的概略圖。 Next, the electronic equipment of this embodiment will be described with reference to FIG. 19. FIG. 19(a) is a schematic diagram showing a notebook personal computer as an example of electronic equipment, and FIG. 19(b) is a schematic diagram showing a thin television (TV) as an example of electronic equipment.

如圖19(a)所示,作為電子機器之個人電腦1000係由具備鍵盤1002之本體部1001、與具備顯示部1004之顯示單元1003構成,且顯示單元1003經由鉸鏈構造部可旋動地被支持於本體部1001。 As shown in Figure 19(a), a personal computer 1000 as an electronic device is composed of a main body 1001 with a keyboard 1002 and a display unit 1003 with a display unit 1004, and the display unit 1003 is rotatably rotated via a hinge structure. Supported by the main body 1001.

該個人電腦1000中,於顯示部1004搭載有上述第1實施形態之有機EL裝置100。 In the personal computer 1000, the organic EL device 100 of the first embodiment described above is mounted on the display unit 1004.

如圖19(b)所示,作為電子機器之薄型電視(TV)1100於顯示部1101搭載有上述第1實施形態之有機EL裝置100。 As shown in FIG. 19(b), a thin television (TV) 1100 as an electronic device is equipped with the organic EL device 100 of the first embodiment described above on the display portion 1101.

關於有機EL裝置100之設置於子像素110R、110G、110B之有機EL元件130,機能層136中之電洞注入層131、電洞傳輸層132、發光層133中之至少1層係使用上述第1實施形態之機能層形成用組合物,並藉由液相製程(噴墨法)而形成。因此,確保機能層136之膜平坦性,而製造具備具有優異之元件特性之有機EL元件130的有機EL裝置100。即,能夠提供具有優異之顯示品質與可靠性品質之個人電腦1000或薄型TV1100。 Regarding the organic EL element 130 provided in the sub-pixels 110R, 110G, and 110B of the organic EL device 100, at least one of the hole injection layer 131, the hole transport layer 132, and the light emitting layer 133 in the functional layer 136 uses the above-mentioned first The composition for forming a functional layer of the first embodiment is formed by a liquid phase process (inkjet method). Therefore, the film flatness of the functional layer 136 is ensured, and the organic EL device 100 having the organic EL element 130 with excellent element characteristics is manufactured. That is, it is possible to provide a personal computer 1000 or a thin TV1100 with excellent display quality and reliability quality.

搭載有機EL裝置100之電子機器不限定於上述個人電腦1000或薄型TV1100。例如可列舉智慧型手機或POS(Point Of Sale,銷售點)等 攜帶型資訊終端、導航器、閱覽器、數位相機、螢幕直視型視訊錄製器等具有顯示部之電子機器。 The electronic device equipped with the organic EL device 100 is not limited to the personal computer 1000 or the thin TV 1100 described above. Examples include smartphones or POS (Point Of Sale), etc. Electronic devices with display units, such as portable information terminals, navigators, viewers, digital cameras, and direct-screen video recorders.

再者,有機EL裝置100不限定於構成顯示部,亦可為照明裝置或對感光物進行曝光之曝光裝置。 Furthermore, the organic EL device 100 is not limited to constituting a display portion, and may be an illumination device or an exposure device that exposes photosensitive objects.

本發明不限於上述實施形態,可於不違反根據申請專利範圍及說明書全文所理解之發明之要旨或思想之範圍內進行適當變更,伴有此種變更之機能層形成用組合物及該機能層形成用組合物之製造方法以及有機EL元件之製造方法、有機EL裝置、應用有機EL裝置之電子機器亦包括在本發明之技術範圍內。除了上述實施形態以外,亦想到各種變化例。以下,列舉變化例進行說明。 The present invention is not limited to the above-mentioned embodiments, and can be appropriately modified within the scope that does not violate the gist or idea of the invention understood from the scope of the patent application and the full text of the specification, and the composition for forming a functional layer and the functional layer accompanied by such changes The manufacturing method of the forming composition, the manufacturing method of the organic EL element, the organic EL device, and the electronic equipment using the organic EL device are also included in the technical scope of the present invention. In addition to the above-mentioned embodiment, various modifications are also conceived. Hereinafter, a modified example will be described.

(變化例1)有機EL裝置100只要於子像素110R、110G、110B中之任一者中具備具有使用本發明之機能層形成用組合物所形成之機能層136的有機EL元件130即可。例如可設為於子像素110R與子像素110G中具備具有使用機能層形成用組合物所形成之機能層136的有機EL元件130,於子像素110B中具備具有利用氣相製程所形成之機能層136的有機EL元件130。 (Modification 1) The organic EL device 100 only needs to include the organic EL element 130 having the functional layer 136 formed using the functional layer forming composition of the present invention in any of the sub-pixels 110R, 110G, and 110B. For example, the sub-pixel 110R and the sub-pixel 110G can be provided with an organic EL element 130 having a functional layer 136 formed using a composition for forming a functional layer, and the sub-pixel 110B can be provided with a functional layer formed by a gas phase process. 136 organic EL element 130.

(變化例2)本發明之機能層形成用組合物不限定於用於形成包含發光層之機能層136。例如作為溶質之固形物成分(有機材料)亦可為構成有機電晶體之半導體層等之電路元件形成材料。 (Variation 2) The composition for forming a functional layer of the present invention is not limited to being used for forming the functional layer 136 including a light-emitting layer. For example, the solid component (organic material) as a solute may also be a circuit element forming material such as a semiconductor layer constituting an organic transistor.

Claims (12)

一種機能層形成用組合物,其係形成包含有機材料之機能層中之至少1層時所使用者,其特徵在於:包含機能層形成用固形物成分、具有吸電子基之第1芳香族溶劑、及具有供電子基之第2芳香族溶劑,上述第2芳香族溶劑之沸點高於上述第1芳香族溶劑之沸點,上述吸電子基為硝基。 A composition for forming a functional layer, which is used when forming at least one layer of a functional layer containing an organic material, characterized in that it contains a solid component for forming a functional layer and a first aromatic solvent with an electron withdrawing group , And a second aromatic solvent having an electron donating group, the boiling point of the second aromatic solvent is higher than the boiling point of the first aromatic solvent, and the electron withdrawing group is a nitro group. 如請求項1之機能層形成用組合物,其中上述第1芳香族溶劑之沸點為200℃以上,上述第2芳香族溶劑之沸點為250℃以上。 The composition for forming a functional layer according to claim 1, wherein the boiling point of the first aromatic solvent is 200°C or higher, and the boiling point of the second aromatic solvent is 250°C or higher. 如請求項1或2之機能層形成用組合物,其中上述供電子基為烷氧基或胺基。 The composition for forming a functional layer according to claim 1 or 2, wherein the electron donating group is an alkoxy group or an amino group. 如請求項1或2之機能層形成用組合物,其中上述第2芳香族溶劑之含有比率為10%以上且90%以下。 The composition for forming a functional layer according to claim 1 or 2, wherein the content of the second aromatic solvent is 10% or more and 90% or less. 如請求項4之機能層形成用組合物,其中上述第2芳香族溶劑之含有比率等於或高於上述第1芳香族溶劑之含有比率。 The composition for forming a functional layer according to claim 4, wherein the content ratio of the second aromatic solvent is equal to or higher than the content ratio of the first aromatic solvent. 如請求項1或2之機能層形成用組合物,其中上述第1芳香族溶劑為選自硝基苯、2,3-二甲基硝基苯、2,4-二甲基硝基苯中之至少1種。 The composition for forming a functional layer according to claim 1 or 2, wherein the above-mentioned first aromatic solvent is selected from nitrobenzene, 2,3-dimethylnitrobenzene, and 2,4-dimethylnitrobenzene At least one of them. 如請求項1或2之機能層形成用組合物,其中上述第2芳香族溶劑為選自三甲氧基甲苯、二苯醚、3-苯氧基甲苯、苄基苯基醚、胺基聯苯、二苯基胺中之至少1種。 The composition for forming a functional layer according to claim 1 or 2, wherein the second aromatic solvent is selected from trimethoxy toluene, diphenyl ether, 3-phenoxy toluene, benzyl phenyl ether, and amino biphenyl , At least one of diphenylamine. 一種機能層形成用組合物之製造方法,其係形成包含有機材料之機能層中之至少1層時所使用之機能層形成用組合物之製造方 法,其特徵在於包括:使機能層形成用固形物成分溶解於具有吸電子基之第1芳香族溶劑中的步驟、與於溶解有上述機能層形成用固形物成分之上述第1芳香族溶劑中添加具有供電子基之第2芳香族溶劑的步驟,上述第2芳香族溶劑之沸點高於上述第1芳香族溶劑之沸點,上述吸電子基為硝基。 A method for producing a composition for forming a functional layer, which is a method for producing a composition for forming a functional layer used when forming at least one of the functional layers containing an organic material The method is characterized by comprising the steps of dissolving the solid component for forming a functional layer in a first aromatic solvent having an electron withdrawing group, and dissolving the solid component for forming the functional layer in the first aromatic solvent In the step of adding a second aromatic solvent having an electron donating group, the boiling point of the second aromatic solvent is higher than the boiling point of the first aromatic solvent, and the electron withdrawing group is a nitro group. 一種有機EL元件之製造方法,其係於一對電極間夾持有包含發光層之機能層的有機EL元件之製造方法,其特徵在於包括:於上述一對電極中之一電極上塗佈如請求項1至7中任一項之機能層形成用組合物的步驟、與使所塗佈之上述機能層形成用組合物乾燥、固化而形成上述機能層中之至少1層的步驟。 A method for manufacturing an organic EL device, which is a method for manufacturing an organic EL device in which a functional layer including a light-emitting layer is sandwiched between a pair of electrodes, is characterized in that it comprises: coating one of the above-mentioned pair of electrodes such as The step of the composition for forming a functional layer according to any one of claims 1 to 7, and the step of drying and curing the applied composition for forming a functional layer to form at least one of the functional layers. 如請求項9之有機EL元件之製造方法,其中上述塗佈機能層形成用組合物之步驟係藉由噴墨法於上述一電極上之膜形成區域塗佈上述機能層形成用組合物。 The method for manufacturing an organic EL device according to claim 9, wherein the step of coating the composition for forming a functional layer is to coat the composition for forming a functional layer on the film forming area on the one electrode by an inkjet method. 一種有機EL裝置,其特徵在於:具備使用如請求項9或10之有機EL元件之製造方法所製造之有機EL元件。 An organic EL device characterized by having an organic EL element manufactured using the organic EL element manufacturing method of claim 9 or 10. 一種電子機器,其特徵在於:具備如請求項11之有機EL裝置。 An electronic device characterized by having an organic EL device as claimed in claim 11.
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