TWI697932B - Ion gun - Google Patents
Ion gun Download PDFInfo
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- TWI697932B TWI697932B TW108109709A TW108109709A TWI697932B TW I697932 B TWI697932 B TW I697932B TW 108109709 A TW108109709 A TW 108109709A TW 108109709 A TW108109709 A TW 108109709A TW I697932 B TWI697932 B TW I697932B
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- slit
- magnetic pole
- ion gun
- anode
- inclined surface
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- 230000005291 magnetic effect Effects 0.000 claims abstract description 85
- 239000000696 magnetic material Substances 0.000 claims abstract description 10
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical group [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 10
- 229910052799 carbon Inorganic materials 0.000 claims description 10
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 3
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 3
- 229910052802 copper Inorganic materials 0.000 claims description 3
- 239000010949 copper Substances 0.000 claims description 3
- 239000010936 titanium Substances 0.000 claims description 3
- 229910052719 titanium Inorganic materials 0.000 claims description 3
- 239000007787 solid Substances 0.000 claims 1
- 239000000463 material Substances 0.000 description 14
- 230000004048 modification Effects 0.000 description 13
- 238000012986 modification Methods 0.000 description 13
- 230000008859 change Effects 0.000 description 11
- 230000007423 decrease Effects 0.000 description 11
- 230000000052 comparative effect Effects 0.000 description 8
- 238000010884 ion-beam technique Methods 0.000 description 6
- 238000012423 maintenance Methods 0.000 description 5
- 230000002829 reductive effect Effects 0.000 description 5
- 230000000694 effects Effects 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- 238000005299 abrasion Methods 0.000 description 3
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- 230000004907 flux Effects 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 238000009413 insulation Methods 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- 229910000938 samarium–cobalt magnet Inorganic materials 0.000 description 2
- -1 SS400 Substances 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- PXAWCNYZAWMWIC-UHFFFAOYSA-N [Fe].[Nd] Chemical compound [Fe].[Nd] PXAWCNYZAWMWIC-UHFFFAOYSA-N 0.000 description 1
- 230000001133 acceleration Effects 0.000 description 1
- 238000007792 addition Methods 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- KPLQYGBQNPPQGA-UHFFFAOYSA-N cobalt samarium Chemical compound [Co].[Sm] KPLQYGBQNPPQGA-UHFFFAOYSA-N 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 239000002826 coolant Substances 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 239000000498 cooling water Substances 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- 239000003302 ferromagnetic material Substances 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 230000000670 limiting effect Effects 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 230000002035 prolonged effect Effects 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 238000004088 simulation Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 230000036962 time dependent Effects 0.000 description 1
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Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J27/00—Ion beam tubes
- H01J27/02—Ion sources; Ion guns
- H01J27/08—Ion sources; Ion guns using arc discharge
- H01J27/14—Other arc discharge ion sources using an applied magnetic field
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
- H01J37/08—Ion sources; Ion guns
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- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Combustion & Propulsion (AREA)
- Plasma Technology (AREA)
- Electron Sources, Ion Sources (AREA)
Abstract
Description
本發明係關於一種離子槍。The present invention relates to an ion gun.
先前,多採用使用自離子槍引出之離子束之製程,於各種裝置搭載有離子槍。一般而言,離子槍具有於形成於磁極(陰極)之狹縫與陽極(anode)之間產生電漿,將離子束通過狹縫引出至外部的構造(例如參照美國專利申請公開第2012/0187843號說明書)。Previously, the process of using ion beams drawn from ion guns was mostly adopted, and ion guns were mounted on various devices. Generally speaking, an ion gun has a structure that generates plasma between a slit formed in a magnetic pole (cathode) and an anode (anode), and leads the ion beam to the outside through the slit (for example, refer to US Patent Application Publication No. 2012/0187843 No. manual).
近年來,要求提高離子槍之磁場強度,謀求提昇被處理體之蝕刻速率之製程。然而,於此種製程中,存在如下問題:磁極容易因電漿被消耗,磁極之狹縫之間隔(間隙)擴寬,放電電流降低。又,亦有如下問題:將消耗之磁極更換為新磁極之頻度增加,維護性差。進而,亦有如下問題:伴隨磁極之消耗,產生由磁極之材料導致之污染,對使用離子槍之製程造成惡劣影響。In recent years, it is required to increase the magnetic field intensity of the ion gun, and seek to increase the etching rate of the processed body. However, in this manufacturing process, there are the following problems: the magnetic poles are easily consumed by plasma, the gap between the magnetic poles is widened, and the discharge current is reduced. In addition, there are also the following problems: the frequency of replacing the consumed magnetic poles with new ones increases, and the maintenance is poor. Furthermore, there are the following problems: with the consumption of the magnetic poles, pollution caused by the material of the magnetic poles is generated, which has a bad influence on the manufacturing process of the ion gun.
本發明係考慮此種情況而完成者,其目的在於提供一種離子槍,可抑制形成於磁極之狹縫之磨耗,藉由削減磁極之更換頻度提昇維護性,且可抑制由磁極之材料導致的污染之產生。The present invention was completed in consideration of this situation, and its purpose is to provide an ion gun that can suppress the abrasion of the slits formed in the magnetic poles, improve maintenance by reducing the frequency of replacement of the magnetic poles, and can suppress the damage caused by the material of the magnetic poles. The production of pollution.
本發明之一態樣之離子槍具備:陽極;磁極,其具有與上述陽極對向之內表面、位於上述內表面之相反側之外表面、設置於與上述陽極對應之位置之狹縫、及自上述外表面之一端朝上述狹縫之中央延伸且形成上述狹縫之一部分之外傾斜面;以及外罩,其被覆至少上述外表面及上述外傾斜面,且包含非磁性材料。An ion gun of one aspect of the present invention includes: an anode; a magnetic pole having an inner surface opposed to the anode, an outer surface located on the opposite side of the inner surface, a slit provided at a position corresponding to the anode, and Extending from one end of the outer surface toward the center of the slit and forming a part of the outer inclined surface of the slit; and an outer cover that covers at least the outer surface and the outer inclined surface and includes a non-magnetic material.
如本發明之一態樣之離子槍,其中亦可為上述磁極具有相互平行之垂直面,其等自上述外傾斜面之一端朝上述內表面延伸且形成上述狹縫之一部分;且上述外罩被覆上述垂直面。In the ion gun according to an aspect of the present invention, the magnetic poles may have vertical surfaces parallel to each other, which extend from one end of the outer inclined surface toward the inner surface and form part of the slit; and the outer cover is covered The above vertical plane.
如本發明之一態樣之離子槍,其中上述磁極亦可具有內傾斜面,其自上述內表面之一端朝上述狹縫之中央延伸且形成上述狹縫之一部分。In the ion gun according to an aspect of the present invention, the magnetic pole may also have an inner inclined surface, which extends from an end of the inner surface toward the center of the slit and forms a part of the slit.
如本發明之一態樣之離子槍,其中上述外罩亦可具備:第1被覆部,其被覆上述磁極之上述外表面;及第2被覆部,其與上述第1被覆部相連且被覆上述外傾斜面。In the ion gun according to an aspect of the present invention, the outer cover may also include: a first covering portion that covers the outer surface of the magnetic pole; and a second covering portion that is connected to the first covering portion and covers the outer surface Inclined surface.
如本發明之一態樣之離子槍,其中亦可為上述外罩具備與上述第2被覆部相連之第3被覆部,且上述第3被覆部自與上述第1被覆部及上述第2被覆部相連之部分為相反側之部分朝上述陽極延伸。In the ion gun according to an aspect of the present invention, the outer cover may be provided with a third covering part connected to the second covering part, and the third covering part is connected to the first covering part and the second covering part. The connected part is the part on the opposite side extending toward the anode.
如本發明之一態樣之離子槍,其中構成上述外罩之上述非磁性材料亦可包含選自由碳、鈦、及銅所組成之群之材料。構成上述外罩之上述非磁性材料尤其較佳為碳。 [發明之效果]In the ion gun according to one aspect of the present invention, the non-magnetic material constituting the outer cover may also include a material selected from the group consisting of carbon, titanium, and copper. The non-magnetic material constituting the outer cover is particularly preferably carbon. [Effects of Invention]
根據本發明之上述態樣,可抑制形成於磁極之狹縫之磨耗,藉由削減磁極之更換頻度提昇維護性,且可抑制由磁極之材料導致之污染之產生。According to the above aspect of the present invention, the abrasion of the slit formed in the magnetic pole can be suppressed, the maintenance performance can be improved by reducing the frequency of replacement of the magnetic pole, and the pollution caused by the material of the magnetic pole can be suppressed.
一面參照圖式一面對本發明之實施形態之離子槍進行說明。本實施形態之說明所使用之各圖式中,為了使各構件成為能夠辨識之大小而適當變更各構件之縮小比例。The ion gun of the embodiment of the present invention will be described with reference to the drawings. In the drawings used in the description of this embodiment, the reduction ratio of each member is appropriately changed in order to make each member a recognizable size.
(線性離子槍) 圖1係表示本發明之實施形態之線性離子槍(離子槍)之概略構造之立體圖。圖2係沿著圖1之A-A線之剖視圖。圖3係表示本發明之實施形態之線性離子槍之主要部分之放大剖視圖。(Linear ion gun) Fig. 1 is a perspective view showing a schematic structure of a linear ion gun (ion gun) according to an embodiment of the present invention. Fig. 2 is a cross-sectional view taken along the line A-A of Fig. 1; Fig. 3 is an enlarged cross-sectional view of the main part of the linear ion gun showing the embodiment of the present invention.
如圖1所示,線性離子槍10具備磁軛20、磁極30、陽極40、磁鐵50、外罩60、及絕緣部70。As shown in FIG. 1, the
線性離子槍10具有無需柵極電極等引出電極之簡單之構成,可使用1台高頻電源而產生電漿P及藉由離子加速而產生離子束BM。又,線性離子槍10不具有熱燈絲,故即便於氧環境下亦能夠進行長時間運轉,成本低,且具有較高之可靠性。The
再者,圖1僅表示線性離子槍10,亦可將使線性離子槍10移動或搖動之移動裝置連接於線性離子槍10。移動裝置之構造係根據使用線性離子槍10之裝置而適當選擇。Furthermore, FIG. 1 only shows the
如圖1所示,線性離子槍10具有包含直線部與曲線部之軌道形狀之開口11。於開口11,配置有於下述磁極30之狹縫31覆蓋磁極30之表面之外罩60。換言之,於開口11,外罩60露出。開口11之曲線部(轉角部分)於俯視下例如具有25 mm之曲率半徑。As shown in FIG. 1, the
(磁軛)
磁軛20係包圍磁鐵50及陽極40之鐵製之框狀構件。被磁軛20包圍之區域由磁極30覆蓋。(Yoke)
The
(磁極)
磁極30(陰極)於俯視下,例如具有全長400 mm×寬度100 mm×高度10 mm之大小。作為構成磁極30之材料,可較佳地使用強磁性體,例如使用SS400等鋼、SUS430等不鏽鋼。(magnetic pole)
The magnetic pole 30 (cathode) has a size of 400 mm in total length×100 mm in width×10 mm in height when viewed from above. As the material constituting the
如圖3所示,磁極30具有設置於與陽極40對應之位置之狹縫31。狹縫31設置於與開口11對應之位置。As shown in FIG. 3, the
進而,磁極30具有與陽極40對向之內表面32、位於內表面32之相反側之外表面33、及外傾斜面35。外傾斜面35係自與狹縫31鄰接之外表面33之端部34(一端、上端)朝狹縫31之中央向斜下方延伸之傾斜面,形成狹縫31之一部分。Furthermore, the
進而,於本實施形態中,磁極30具有相互平行之2個垂直面37。垂直面37自外傾斜面35之端部36(一端、中央端)朝內表面32向下方延伸,形成狹縫31之一部分。Furthermore, in this embodiment, the
(陽極)
陽極40(anode)係以相對於由磁鐵50產生之磁場於大致垂直之方向產生電場的方式,與磁極30之背面分開地配置。於陽極40連接有未圖示之高頻電源。(anode)
The anode 40 (anode) is arranged separately from the back surface of the
作為構成陽極40之材料,較佳為使用非磁性體。As the material constituting the
陽極40於磁軛20之內部支持於絕緣部70。The
(磁鐵)
磁鐵50包含SmCo(釤鈷)合金,於狹縫31之寬度方向產生磁場。又,NdFe(釹鐵)亦可用於磁鐵50。(magnet)
The
於磁軛20或陽極40之外周,設置有連接於冷卻水循環裝置之未圖示之水冷管。藉由使冷卻媒體於水冷管內流動而能夠防止磁極30或陽極40變形,且能夠無關於溫度地穩定驅動線性離子槍10。On the outer periphery of the
(外罩)
外罩60被覆磁極30之外表面33、磁極30之外傾斜面35、及狹縫31內之磁極30之表面(垂直面37)。(Housing)
The
外罩60具有第1被覆部61、第2被覆部62、及第3被覆部63。The
第1被覆部61被覆磁極30之外表面33。第2被覆部62與第1被覆部61相連,且被覆外傾斜面35。第3被覆部63與第2被覆部62相連,且自與第1被覆部61及第2被覆部62相連之部分A為相反側之部分B朝陽極40延伸。第3被覆部63被覆垂直面37。The first covering
於第2被覆部62及第3被覆部63嵌合於狹縫31之狀態下,外罩60藉由未圖示之緊固構件而固定於磁極30。In a state where the second covering
外罩60較理想為包含相較磁極材料不易腐蝕之材質。外罩60包含非磁性材料,具體而言,非磁性材料選自由碳、鈦、及銅所組成之群。尤其使用碳作為非磁性材料為最佳。The
關於較佳地用作外罩60之碳之特性,彎曲強度較佳為34 MPa~74 MPa,拉伸強度較佳為22 MPa~48 MPa,固有電阻較佳為11 μΩ∙m~17.5 μΩ∙m,蕭氏硬度較佳為53~87。藉由使用具備此種特性之碳,可形成適於本實施形態之外罩60。Regarding the characteristics of carbon preferably used as the
其次,對如上構成之線性離子槍10之作用進行說明。Next, the function of the
線性離子槍10配置於維持減壓環境之腔室內。於線性離子槍10中,於自未圖示之氣體供給裝置對陽極40與磁極30之間供給有Ar、O2
等氣體之狀態下,藉由高頻電源對陽極40與磁極30之間施加高頻電壓。藉此,如圖2所示,於磁極30與陽極40之間產生電漿P,自開口11引出離子束BM。The
根據本實施形態,於開口11,構成狹縫31之外傾斜面35及垂直面37由外罩60覆蓋,故磁極30於狹縫31之內部未露出。因此,可抑制因磁極30於狹縫31內曝露於電漿而導致的磁極30之消耗,從而可防止因磁極30之消耗導致之狹縫31之間隔(2個端部36間之距離)之增加。其結果,可維持狹縫31中特定之間隔,從而防止放電電流之降低。又,可使磁極30之壽命延長,減少將已使用之磁極更換成新磁極之頻度,從而可提昇維護性。進而,藉由抑制磁極30之消耗,可抑制由磁極30之材料導致之污染之產生,不會對使用離子槍之製程造成惡劣影響。According to this embodiment, in the
於本實施形態中,外罩60包含相較磁極材料不易腐蝕之材質,包含碳。碳與通常之磁極材料相比,濺鍍效率為約1/3,故可較佳地用作外罩60之材質。In this embodiment, the
(實施形態之變化例)
其次,參照圖4~圖6,對本發明之實施形態之變化例之線性離子槍進行說明。於圖4~圖6中,對與上述實施形態相同之構件標註相同符號,省略或簡化其說明。於磁極30之狹縫之構造方面、或外罩60之構造方面,以下說明之變化例與上述實施形態不同。(Examples of changes in implementation)
Next, referring to Figs. 4 to 6, a linear ion gun of a modification of the embodiment of the present invention will be described. In FIGS. 4 to 6, the same reference numerals are given to the same members as the above-mentioned embodiment, and the description thereof is omitted or simplified. With regard to the structure of the slit of the
(變化例1)
圖4係表示本發明之實施形態之變化例1之線性離子槍之主要部分之放大剖視圖。(Variation example 1)
Fig. 4 is an enlarged cross-sectional view showing the main part of the linear ion gun of
磁極30具有內傾斜面38替代上述實施形態中說明之垂直面37。內傾斜面38係自內表面32之端部39(一端、下端)朝狹縫31之中央斜向上方延伸之傾斜面,形成狹縫31之一部分。內傾斜面38於端部36與外傾斜面35相連。The
變化例1中,外罩60並未被覆內傾斜面38,內傾斜面38於開口11內露出。In
具體而言,外罩60具有第1被覆部61及第2被覆部62,不具有上述第3被覆部63。第1被覆部61被覆磁極30之外表面33。第2被覆部62與第1被覆部61相連,且被覆外傾斜面35。Specifically, the
根據本變化例1,於開口11,構成狹縫31之外傾斜面35由外罩60覆蓋,故外傾斜面35於狹縫31之內部並未露出。因此,可抑制因外傾斜面35於狹縫31內曝露於電漿而導致之磁極30之消耗,從而可防止由磁極30之消耗導致之狹縫31之間隔之增加。其結果,可維持狹縫31中特定之間隔,從而防止放電電流之降低,使磁極30之壽命延長。因此,可獲得與上述實施形態相同之效果。According to this
(變化例2) 圖5係表示本發明之實施形態之變化例2之線性離子槍之主要部分的放大剖視圖。(Variation 2) Fig. 5 is an enlarged cross-sectional view showing the main part of the linear ion gun of Modification 2 of the embodiment of the present invention.
變化例2表示使圖3所示之外罩60(實施形態1,具備第1被覆部61、第2被覆部62、及第3被覆部63之外罩60)嵌合於具備內傾斜面38之磁極30(變化例2,參照圖4)之情形。Modification 2 shows that the
(變化例3) 圖6係表示本發明之實施形態之變化例3之線性離子槍之主要部分的放大剖視圖。(Variation 3) Fig. 6 is an enlarged cross-sectional view of the main part of the linear ion gun showing the modification 3 of the embodiment of the present invention.
變化例3表示使圖4所示之外罩60(變化例1,具備第1被覆部61及第2被覆部62之外罩60)嵌合於具備垂直面37之磁極30(實施形態,參照圖3)之情形。Modification 3 shows that the
於本變化例2、3之任一者中,構成狹縫31之外傾斜面35均於開口11由外罩60覆蓋,故外傾斜面35於狹縫31之內部並未露出。因此,可抑制因外傾斜面35於狹縫31內曝露於電漿而導致之磁極30之消耗,從而可防止由磁極30之消耗導致之狹縫31之間隔之增加。其結果,可維持狹縫31中特定之間隔,從而防止放電電流之降低,使磁極30之壽命延長。因此,可獲得與上述實施形態相同之效果。In any of the modification examples 2 and 3, the outer
於上述實施形態及變化例1~3中,將彼此相對並且線對稱(相對於狹縫之中央線而線對稱)地配置之2個外傾斜面35設置於狹縫31之內部。換言之,該構造中,以端部36為頂點之彼此相對之2個角部位於狹縫31之內部。In the above-mentioned embodiment and modified examples 1 to 3, the two outer
又,圖3及圖6中,將彼此相對並且線對稱地配置之2個垂直面37設置於狹縫31之內部。該構造中,垂直面37與成為頂點之端部36相連。In addition, in FIG. 3 and FIG. 6, two
又,於圖4及圖5中,將彼此相對並且線對稱地配置之2個內傾斜面38設置於狹縫31之內部。該構造中,內傾斜面38與成為頂點之端部36相連。In addition, in FIG. 4 and FIG. 5, two inner
於此種線對稱之構造中,於狹縫31之內部即便磁極30已消耗,仍維持線對稱之形狀(相似關係),故放電電流不會降低,且可保持放電電流穩定之推移(經時變化)。In this line-symmetrical structure, even if the
其理由在於:假設認為圖4、圖5、圖6中未被外罩覆蓋之部位同等地消耗之情形時,顯然可保持如上所述之形狀之相似關係。The reason is that when it is assumed that the parts not covered by the outer cover in Figs. 4, 5, and 6 are equally consumed, it is obvious that the similar relationship of the shapes described above can be maintained.
所謂可保持形狀之相似關係與狹縫31內部所產生之磁通密度之狀況(變化)僅依存於狹縫31之間隔含義大致相同。其係指不會因狹縫31內部之磁極30之表面形狀之變化產生磁通分佈之變動。The so-called similar relationship of the shape that can be maintained is substantially the same as the state (change) of the magnetic flux density generated inside the
本發明者等人藉由模擬對狹縫31之間隔、與狹縫31內部之磁極30之表面形狀之變化雙方之貢獻度之評估進行了確認。The inventors of the present invention conducted simulations to evaluate the contribution of both the interval between the
獲得如下結果:於以離子電流之穩定化為目的之情形時,相較狹縫31之間隔之變化,保持狹縫31內部之相互對向之磁極30之形狀之相似關係對於實現離子電流之穩定化而言為支配性之因素。已確認該評估結果與下述實施例(實驗結果)匹配。The following results are obtained: when the aim is to stabilize the ion current, compared with the change in the interval of the
實施例 其次,參照圖7,並參照實施例,更具體地說明本發明之效果。Example Next, referring to FIG. 7 and embodiments, the effects of the present invention will be explained more specifically.
圖7係將表示先前之線性離子槍之比較例、與表示應用上述實施形態之外罩之線性離子槍之實施例加以比較的曲線圖,其表示放電電流伴隨運轉時間之經過之經時變化。圖7中,橫軸表示線性離子槍之運轉時間,縱軸表示放電電流之變化。具體而言,所謂放電電流之變化係指將運轉時間為0小時之情形作為基準(1,100%)之放電電流之相對變化量。FIG. 7 is a graph comparing the previous comparative example of the linear ion gun with the example of the linear ion gun using the outer cover of the above embodiment, which shows the time-dependent change of the discharge current with the passage of the operating time. In Figure 7, the horizontal axis represents the operating time of the linear ion gun, and the vertical axis represents the change in the discharge current. Specifically, the so-called change in discharge current refers to the relative change in discharge current based on the operating time of 0 hours (1, 100%).
(比較例) 於比較例之線性離子槍中,應用於磁極之狹縫未設置外罩之構造,即磁極之構成構件於狹縫露出之構造。(Comparative example) In the linear ion gun of the comparative example, it is applied to the structure where the slit of the magnetic pole is not provided with a cover, that is, the structure where the constituent member of the magnetic pole is exposed in the slit.
於比較例中,放電電流自剛開始運轉後便顯著降低。其後,至運轉時間達7.5小時為止,放電電流逐漸降低。於運轉時間經過7.5小時後,放電電流降低之現象仍在持續。當運轉時間達到50小時,放電電流之變化量成為0.71,與開始運轉前相比,放電電流降低約29%。又,於運轉時間達50小時後,對比較例之線性離子槍中之磁極消耗進行確認,結果於與本實施形態之磁極30之端部36相當之部分,確認到產生了因消耗導致之形狀變化。In the comparative example, the discharge current is significantly reduced since the start of operation. Thereafter, until the operation time reached 7.5 hours, the discharge current gradually decreased. After 7.5 hours of operation, the decrease in discharge current continues. When the operating time reaches 50 hours, the amount of change in the discharge current becomes 0.71, and the discharge current is reduced by about 29% compared to before starting the operation. In addition, after the operation time reached 50 hours, the consumption of the magnetic pole in the linear ion gun of the comparative example was confirmed. As a result, it was confirmed that the shape due to the consumption occurred in the part corresponding to the
(實施例) 於本實施例之線性離子槍中,應用上述實施形態(圖3)所示之構造。(Example) In the linear ion gun of this embodiment, the structure shown in the above embodiment (FIG. 3) is applied.
於本實施例中,自開始運轉起至運轉時間達15小時為止,放電電流穩定,未見到如比較例所示之放電電流之顯著降低。於運轉時間經過15小時後,放電電流逐漸降低。放電電流之降低持續至運轉時間達35小時為止。另一方面,當運轉時間超過35小時,未見到放電電流之降低,放電電流穩定。當運轉時間達到50小時,放電電流之變化量成為0.90,與開始運轉前相比放電電流降低約10%。In this example, the discharge current was stable from the start of operation until the operation time reached 15 hours, and no significant decrease in the discharge current as shown in the comparative example was seen. After 15 hours of running time, the discharge current gradually decreases. The decrease in discharge current continues until the operating time reaches 35 hours. On the other hand, when the operation time exceeds 35 hours, no decrease in the discharge current is seen, and the discharge current is stable. When the operating time reaches 50 hours, the amount of change in the discharge current becomes 0.90, which is about 10% lower than the discharge current before the start of operation.
對比較例與實施例進行比較後明確瞭解,於運轉時間經過50小時後,實施例可相對於比較例抑制約19%之放電電流之降低。即,將上述實施形態所示之外罩60設置於磁極30之構造有助於抑制放電電流之降低。After comparing the comparative example with the example, it is clear that after 50 hours of operation time, the example can suppress the decrease of the discharge current by about 19% compared with the comparative example. That is, the structure in which the
以上,對本發明之較佳之實施形態進行了說明,雖然已於上文作了說明,但應理解該等係本發明之例示,不應考慮作為限定者。可於不脫離本發明之範圍內進行追加、省略、替換、及其他變更。因此,本發明不應看作由上述說明限定,而是由申請專利範圍限制。Above, the preferred embodiments of the present invention have been described. Although the description has been made above, it should be understood that these are examples of the present invention and should not be considered as limiting. Additions, omissions, substitutions, and other changes can be made without departing from the scope of the present invention. Therefore, the present invention should not be regarded as limited by the above description, but by the scope of the patent application.
[產業上之可利用性] 本發明能夠廣泛應用於如下之離子槍,即,可抑制形成於磁極之狹縫之磨耗,藉由削減磁極之更換頻度而提昇維護性,且可抑制由磁極之材料導致的污染之產生。[Industrial availability] The present invention can be widely applied to ion guns that can suppress the abrasion of the slits formed in the magnetic poles, improve maintenance by reducing the frequency of replacement of the magnetic poles, and can suppress pollution caused by the material of the magnetic poles.
10‧‧‧線性離子槍(離子槍)
11‧‧‧開口
20‧‧‧磁軛
30‧‧‧磁極
31‧‧‧狹縫
32‧‧‧內表面
33‧‧‧外表面
34‧‧‧端部
35‧‧‧外傾斜面
36‧‧‧端部
37‧‧‧垂直面
38‧‧‧內傾斜面
39‧‧‧端部
40‧‧‧陽極
50‧‧‧磁鐵
60‧‧‧外罩
61‧‧‧第1被覆部
62‧‧‧第2被覆部
63‧‧‧第3被覆部
70‧‧‧絕緣部
A‧‧‧部分
B‧‧‧部分
BM‧‧‧離子束
P‧‧‧電漿10‧‧‧Linear ion gun (ion gun)
11‧‧‧
圖1係表示本發明之實施形態之線性離子槍之概略構造之立體圖。
圖2係表示本發明之實施形態之線性離子槍之概略構造之圖,且係沿著圖1所示之A-A線之剖視圖。
圖3係表示本發明之實施形態之線性離子槍之主要部分之放大剖視圖。
圖4係表示本發明之實施形態之變化例1之線性離子槍之主要部分之放大剖視圖。
圖5係表示本發明之實施形態之變化例2之線性離子槍之主要部分之放大剖視圖。
圖6係表示本發明之實施形態之變化例3之線性離子槍之主要部分之放大剖視圖。
圖7係表示說明本發明之實施例之實驗結果之曲線圖。Fig. 1 is a perspective view showing a schematic structure of a linear ion gun according to an embodiment of the present invention.
2 is a diagram showing the schematic structure of the linear ion gun of the embodiment of the present invention, and is a cross-sectional view taken along the line A-A shown in FIG. 1.
Fig. 3 is an enlarged cross-sectional view of the main part of the linear ion gun showing the embodiment of the present invention.
Fig. 4 is an enlarged cross-sectional view showing the main part of the linear ion gun of
10‧‧‧線性離子槍(離子槍) 10‧‧‧Linear ion gun (ion gun)
11‧‧‧開口 11‧‧‧Open
20‧‧‧磁軛 20‧‧‧Yoke
30‧‧‧磁極 30‧‧‧Magnetic pole
31‧‧‧狹縫 31‧‧‧Slit
32‧‧‧內表面 32‧‧‧Inner surface
40‧‧‧陽極 40‧‧‧Anode
50‧‧‧磁鐵 50‧‧‧Magnet
60‧‧‧外罩 60‧‧‧Cover
70‧‧‧絕緣部 70‧‧‧Insulation
BM‧‧‧離子束 BM‧‧‧Ion beam
P‧‧‧電漿 P‧‧‧Plasma
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WO2004010455A2 (en) * | 2002-07-23 | 2004-01-29 | Guardian Industries Corp. | Ion beam source with coated electrode |
US20080073557A1 (en) * | 2006-07-26 | 2008-03-27 | John German | Methods and apparatuses for directing an ion beam source |
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