TWI697932B - Ion gun - Google Patents

Ion gun Download PDF

Info

Publication number
TWI697932B
TWI697932B TW108109709A TW108109709A TWI697932B TW I697932 B TWI697932 B TW I697932B TW 108109709 A TW108109709 A TW 108109709A TW 108109709 A TW108109709 A TW 108109709A TW I697932 B TWI697932 B TW I697932B
Authority
TW
Taiwan
Prior art keywords
slit
magnetic pole
ion gun
anode
inclined surface
Prior art date
Application number
TW108109709A
Other languages
Chinese (zh)
Other versions
TW201941241A (en
Inventor
湯瀬琢巳
寺澤寿浩
Original Assignee
日商愛發科股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日商愛發科股份有限公司 filed Critical 日商愛發科股份有限公司
Publication of TW201941241A publication Critical patent/TW201941241A/en
Application granted granted Critical
Publication of TWI697932B publication Critical patent/TWI697932B/en

Links

Images

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J27/00Ion beam tubes
    • H01J27/02Ion sources; Ion guns
    • H01J27/08Ion sources; Ion guns using arc discharge
    • H01J27/14Other arc discharge ion sources using an applied magnetic field
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02Details
    • H01J37/04Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/08Ion sources; Ion guns

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Combustion & Propulsion (AREA)
  • Plasma Technology (AREA)
  • Electron Sources, Ion Sources (AREA)

Abstract

An ion gun includes: an anode; a magnetic pole that has an inner surface facing the anode, an outer surface located on the opposite side of the inner surface, a slit provided at a position corresponding to the anode, and an outer inclined surface extending from one end of the outer surface toward a center of the slit and forming part of the slit; and a cover that covers at least the outer surface and the outer inclined surface and is formed of a non-magnetic material.

Description

離子槍Ion gun

本發明係關於一種離子槍。The present invention relates to an ion gun.

先前,多採用使用自離子槍引出之離子束之製程,於各種裝置搭載有離子槍。一般而言,離子槍具有於形成於磁極(陰極)之狹縫與陽極(anode)之間產生電漿,將離子束通過狹縫引出至外部的構造(例如參照美國專利申請公開第2012/0187843號說明書)。Previously, the process of using ion beams drawn from ion guns was mostly adopted, and ion guns were mounted on various devices. Generally speaking, an ion gun has a structure that generates plasma between a slit formed in a magnetic pole (cathode) and an anode (anode), and leads the ion beam to the outside through the slit (for example, refer to US Patent Application Publication No. 2012/0187843 No. manual).

近年來,要求提高離子槍之磁場強度,謀求提昇被處理體之蝕刻速率之製程。然而,於此種製程中,存在如下問題:磁極容易因電漿被消耗,磁極之狹縫之間隔(間隙)擴寬,放電電流降低。又,亦有如下問題:將消耗之磁極更換為新磁極之頻度增加,維護性差。進而,亦有如下問題:伴隨磁極之消耗,產生由磁極之材料導致之污染,對使用離子槍之製程造成惡劣影響。In recent years, it is required to increase the magnetic field intensity of the ion gun, and seek to increase the etching rate of the processed body. However, in this manufacturing process, there are the following problems: the magnetic poles are easily consumed by plasma, the gap between the magnetic poles is widened, and the discharge current is reduced. In addition, there are also the following problems: the frequency of replacing the consumed magnetic poles with new ones increases, and the maintenance is poor. Furthermore, there are the following problems: with the consumption of the magnetic poles, pollution caused by the material of the magnetic poles is generated, which has a bad influence on the manufacturing process of the ion gun.

本發明係考慮此種情況而完成者,其目的在於提供一種離子槍,可抑制形成於磁極之狹縫之磨耗,藉由削減磁極之更換頻度提昇維護性,且可抑制由磁極之材料導致的污染之產生。The present invention was completed in consideration of this situation, and its purpose is to provide an ion gun that can suppress the abrasion of the slits formed in the magnetic poles, improve maintenance by reducing the frequency of replacement of the magnetic poles, and can suppress the damage caused by the material of the magnetic poles. The production of pollution.

本發明之一態樣之離子槍具備:陽極;磁極,其具有與上述陽極對向之內表面、位於上述內表面之相反側之外表面、設置於與上述陽極對應之位置之狹縫、及自上述外表面之一端朝上述狹縫之中央延伸且形成上述狹縫之一部分之外傾斜面;以及外罩,其被覆至少上述外表面及上述外傾斜面,且包含非磁性材料。An ion gun of one aspect of the present invention includes: an anode; a magnetic pole having an inner surface opposed to the anode, an outer surface located on the opposite side of the inner surface, a slit provided at a position corresponding to the anode, and Extending from one end of the outer surface toward the center of the slit and forming a part of the outer inclined surface of the slit; and an outer cover that covers at least the outer surface and the outer inclined surface and includes a non-magnetic material.

如本發明之一態樣之離子槍,其中亦可為上述磁極具有相互平行之垂直面,其等自上述外傾斜面之一端朝上述內表面延伸且形成上述狹縫之一部分;且上述外罩被覆上述垂直面。In the ion gun according to an aspect of the present invention, the magnetic poles may have vertical surfaces parallel to each other, which extend from one end of the outer inclined surface toward the inner surface and form part of the slit; and the outer cover is covered The above vertical plane.

如本發明之一態樣之離子槍,其中上述磁極亦可具有內傾斜面,其自上述內表面之一端朝上述狹縫之中央延伸且形成上述狹縫之一部分。In the ion gun according to an aspect of the present invention, the magnetic pole may also have an inner inclined surface, which extends from an end of the inner surface toward the center of the slit and forms a part of the slit.

如本發明之一態樣之離子槍,其中上述外罩亦可具備:第1被覆部,其被覆上述磁極之上述外表面;及第2被覆部,其與上述第1被覆部相連且被覆上述外傾斜面。In the ion gun according to an aspect of the present invention, the outer cover may also include: a first covering portion that covers the outer surface of the magnetic pole; and a second covering portion that is connected to the first covering portion and covers the outer surface Inclined surface.

如本發明之一態樣之離子槍,其中亦可為上述外罩具備與上述第2被覆部相連之第3被覆部,且上述第3被覆部自與上述第1被覆部及上述第2被覆部相連之部分為相反側之部分朝上述陽極延伸。In the ion gun according to an aspect of the present invention, the outer cover may be provided with a third covering part connected to the second covering part, and the third covering part is connected to the first covering part and the second covering part. The connected part is the part on the opposite side extending toward the anode.

如本發明之一態樣之離子槍,其中構成上述外罩之上述非磁性材料亦可包含選自由碳、鈦、及銅所組成之群之材料。構成上述外罩之上述非磁性材料尤其較佳為碳。 [發明之效果]In the ion gun according to one aspect of the present invention, the non-magnetic material constituting the outer cover may also include a material selected from the group consisting of carbon, titanium, and copper. The non-magnetic material constituting the outer cover is particularly preferably carbon. [Effects of Invention]

根據本發明之上述態樣,可抑制形成於磁極之狹縫之磨耗,藉由削減磁極之更換頻度提昇維護性,且可抑制由磁極之材料導致之污染之產生。According to the above aspect of the present invention, the abrasion of the slit formed in the magnetic pole can be suppressed, the maintenance performance can be improved by reducing the frequency of replacement of the magnetic pole, and the pollution caused by the material of the magnetic pole can be suppressed.

一面參照圖式一面對本發明之實施形態之離子槍進行說明。本實施形態之說明所使用之各圖式中,為了使各構件成為能夠辨識之大小而適當變更各構件之縮小比例。The ion gun of the embodiment of the present invention will be described with reference to the drawings. In the drawings used in the description of this embodiment, the reduction ratio of each member is appropriately changed in order to make each member a recognizable size.

(線性離子槍) 圖1係表示本發明之實施形態之線性離子槍(離子槍)之概略構造之立體圖。圖2係沿著圖1之A-A線之剖視圖。圖3係表示本發明之實施形態之線性離子槍之主要部分之放大剖視圖。(Linear ion gun) Fig. 1 is a perspective view showing a schematic structure of a linear ion gun (ion gun) according to an embodiment of the present invention. Fig. 2 is a cross-sectional view taken along the line A-A of Fig. 1; Fig. 3 is an enlarged cross-sectional view of the main part of the linear ion gun showing the embodiment of the present invention.

如圖1所示,線性離子槍10具備磁軛20、磁極30、陽極40、磁鐵50、外罩60、及絕緣部70。As shown in FIG. 1, the linear ion gun 10 includes a yoke 20, a magnetic pole 30, an anode 40, a magnet 50, a cover 60, and an insulating part 70.

線性離子槍10具有無需柵極電極等引出電極之簡單之構成,可使用1台高頻電源而產生電漿P及藉由離子加速而產生離子束BM。又,線性離子槍10不具有熱燈絲,故即便於氧環境下亦能夠進行長時間運轉,成本低,且具有較高之可靠性。The linear ion gun 10 has a simple structure that does not require extraction electrodes such as grid electrodes, and can use a high-frequency power source to generate plasma P and ion beam BM by ion acceleration. In addition, the linear ion gun 10 does not have a hot filament, so it can operate for a long time even in an oxygen environment, has low cost, and has high reliability.

再者,圖1僅表示線性離子槍10,亦可將使線性離子槍10移動或搖動之移動裝置連接於線性離子槍10。移動裝置之構造係根據使用線性離子槍10之裝置而適當選擇。Furthermore, FIG. 1 only shows the linear ion gun 10, and a moving device that moves or shakes the linear ion gun 10 can also be connected to the linear ion gun 10. The structure of the moving device is appropriately selected according to the device using the linear ion gun 10.

如圖1所示,線性離子槍10具有包含直線部與曲線部之軌道形狀之開口11。於開口11,配置有於下述磁極30之狹縫31覆蓋磁極30之表面之外罩60。換言之,於開口11,外罩60露出。開口11之曲線部(轉角部分)於俯視下例如具有25 mm之曲率半徑。As shown in FIG. 1, the linear ion gun 10 has an opening 11 in the shape of a track including a straight portion and a curved portion. In the opening 11, a slit 31 of the magnetic pole 30 described below is arranged to cover the surface of the magnetic pole 30 and an outer cover 60. In other words, at the opening 11, the outer cover 60 is exposed. The curved portion (corner portion) of the opening 11 has a radius of curvature of, for example, 25 mm in a plan view.

(磁軛) 磁軛20係包圍磁鐵50及陽極40之鐵製之框狀構件。被磁軛20包圍之區域由磁極30覆蓋。(Yoke) The yoke 20 is a frame-shaped member made of iron surrounding the magnet 50 and the anode 40. The area surrounded by the yoke 20 is covered by the magnetic pole 30.

(磁極) 磁極30(陰極)於俯視下,例如具有全長400 mm×寬度100 mm×高度10 mm之大小。作為構成磁極30之材料,可較佳地使用強磁性體,例如使用SS400等鋼、SUS430等不鏽鋼。(magnetic pole) The magnetic pole 30 (cathode) has a size of 400 mm in total length×100 mm in width×10 mm in height when viewed from above. As the material constituting the magnetic pole 30, a ferromagnetic material can be preferably used, for example, steel such as SS400, and stainless steel such as SUS430.

如圖3所示,磁極30具有設置於與陽極40對應之位置之狹縫31。狹縫31設置於與開口11對應之位置。As shown in FIG. 3, the magnetic pole 30 has a slit 31 provided at a position corresponding to the anode 40. The slit 31 is provided at a position corresponding to the opening 11.

進而,磁極30具有與陽極40對向之內表面32、位於內表面32之相反側之外表面33、及外傾斜面35。外傾斜面35係自與狹縫31鄰接之外表面33之端部34(一端、上端)朝狹縫31之中央向斜下方延伸之傾斜面,形成狹縫31之一部分。Furthermore, the magnetic pole 30 has an inner surface 32 facing the anode 40, an outer surface 33 on the opposite side of the inner surface 32, and an outer inclined surface 35. The outer inclined surface 35 is an inclined surface extending obliquely downward from the end 34 (one end, upper end) of the outer surface 33 adjacent to the slit 31 toward the center of the slit 31 and forms a part of the slit 31.

進而,於本實施形態中,磁極30具有相互平行之2個垂直面37。垂直面37自外傾斜面35之端部36(一端、中央端)朝內表面32向下方延伸,形成狹縫31之一部分。Furthermore, in this embodiment, the magnetic pole 30 has two perpendicular surfaces 37 parallel to each other. The vertical surface 37 extends downward from the end 36 (one end, center end) of the outer inclined surface 35 toward the inner surface 32 to form a part of the slit 31.

(陽極) 陽極40(anode)係以相對於由磁鐵50產生之磁場於大致垂直之方向產生電場的方式,與磁極30之背面分開地配置。於陽極40連接有未圖示之高頻電源。(anode) The anode 40 (anode) is arranged separately from the back surface of the magnetic pole 30 so as to generate an electric field in a direction substantially perpendicular to the magnetic field generated by the magnet 50. A high-frequency power supply (not shown) is connected to the anode 40.

作為構成陽極40之材料,較佳為使用非磁性體。As the material constituting the anode 40, a non-magnetic body is preferably used.

陽極40於磁軛20之內部支持於絕緣部70。The anode 40 is supported by the insulating part 70 inside the yoke 20.

(磁鐵) 磁鐵50包含SmCo(釤鈷)合金,於狹縫31之寬度方向產生磁場。又,NdFe(釹鐵)亦可用於磁鐵50。(magnet) The magnet 50 includes SmCo (Samarium Cobalt) alloy, and generates a magnetic field in the width direction of the slit 31. In addition, NdFe (neodymium iron) can also be used for the magnet 50.

於磁軛20或陽極40之外周,設置有連接於冷卻水循環裝置之未圖示之水冷管。藉由使冷卻媒體於水冷管內流動而能夠防止磁極30或陽極40變形,且能夠無關於溫度地穩定驅動線性離子槍10。On the outer periphery of the yoke 20 or the anode 40, a water-cooling pipe (not shown) connected to a cooling water circulation device is provided. By flowing the cooling medium in the water-cooled tube, deformation of the magnetic pole 30 or the anode 40 can be prevented, and the linear ion gun 10 can be stably driven regardless of temperature.

(外罩) 外罩60被覆磁極30之外表面33、磁極30之外傾斜面35、及狹縫31內之磁極30之表面(垂直面37)。(Housing) The outer cover 60 covers the outer surface 33 of the magnetic pole 30, the outer inclined surface 35 of the magnetic pole 30, and the surface (vertical surface 37) of the magnetic pole 30 in the slit 31.

外罩60具有第1被覆部61、第2被覆部62、及第3被覆部63。The cover 60 has a first covering portion 61, a second covering portion 62, and a third covering portion 63.

第1被覆部61被覆磁極30之外表面33。第2被覆部62與第1被覆部61相連,且被覆外傾斜面35。第3被覆部63與第2被覆部62相連,且自與第1被覆部61及第2被覆部62相連之部分A為相反側之部分B朝陽極40延伸。第3被覆部63被覆垂直面37。The first covering portion 61 covers the outer surface 33 of the magnetic pole 30. The second covering portion 62 is connected to the first covering portion 61 and covers the outer inclined surface 35. The third covering portion 63 is connected to the second covering portion 62, and extends toward the anode 40 from the portion A connected to the first covering portion 61 and the second covering portion 62 on the opposite side. The third covering portion 63 covers the vertical surface 37.

於第2被覆部62及第3被覆部63嵌合於狹縫31之狀態下,外罩60藉由未圖示之緊固構件而固定於磁極30。In a state where the second covering portion 62 and the third covering portion 63 are fitted into the slit 31, the cover 60 is fixed to the magnetic pole 30 by a fastening member not shown.

外罩60較理想為包含相較磁極材料不易腐蝕之材質。外罩60包含非磁性材料,具體而言,非磁性材料選自由碳、鈦、及銅所組成之群。尤其使用碳作為非磁性材料為最佳。The outer cover 60 preferably includes a material that is less corroded than the magnetic pole material. The outer cover 60 includes a non-magnetic material. Specifically, the non-magnetic material is selected from the group consisting of carbon, titanium, and copper. In particular, it is best to use carbon as a non-magnetic material.

關於較佳地用作外罩60之碳之特性,彎曲強度較佳為34 MPa~74 MPa,拉伸強度較佳為22 MPa~48 MPa,固有電阻較佳為11 μΩ∙m~17.5 μΩ∙m,蕭氏硬度較佳為53~87。藉由使用具備此種特性之碳,可形成適於本實施形態之外罩60。Regarding the characteristics of carbon preferably used as the outer cover 60, the bending strength is preferably 34 MPa~74 MPa, the tensile strength is preferably 22 MPa~48 MPa, and the intrinsic resistance is preferably 11 μΩ∙m~17.5 μΩ∙m , Shore hardness is preferably 53-87. By using carbon having such characteristics, the cover 60 suitable for this embodiment can be formed.

其次,對如上構成之線性離子槍10之作用進行說明。Next, the function of the linear ion gun 10 constructed as above will be described.

線性離子槍10配置於維持減壓環境之腔室內。於線性離子槍10中,於自未圖示之氣體供給裝置對陽極40與磁極30之間供給有Ar、O2 等氣體之狀態下,藉由高頻電源對陽極40與磁極30之間施加高頻電壓。藉此,如圖2所示,於磁極30與陽極40之間產生電漿P,自開口11引出離子束BM。The linear ion gun 10 is arranged in a chamber that maintains a reduced pressure environment. In the linear ion gun 10, in a state where Ar, O 2 and other gases are supplied between the anode 40 and the magnetic pole 30 from a gas supply device not shown, a high-frequency power supply is applied between the anode 40 and the magnetic pole 30 High frequency voltage. Thereby, as shown in FIG. 2, plasma P is generated between the magnetic pole 30 and the anode 40, and the ion beam BM is drawn from the opening 11.

根據本實施形態,於開口11,構成狹縫31之外傾斜面35及垂直面37由外罩60覆蓋,故磁極30於狹縫31之內部未露出。因此,可抑制因磁極30於狹縫31內曝露於電漿而導致的磁極30之消耗,從而可防止因磁極30之消耗導致之狹縫31之間隔(2個端部36間之距離)之增加。其結果,可維持狹縫31中特定之間隔,從而防止放電電流之降低。又,可使磁極30之壽命延長,減少將已使用之磁極更換成新磁極之頻度,從而可提昇維護性。進而,藉由抑制磁極30之消耗,可抑制由磁極30之材料導致之污染之產生,不會對使用離子槍之製程造成惡劣影響。According to this embodiment, in the opening 11, the inclined surface 35 and the vertical surface 37 outside the slit 31 are covered by the cover 60, so the magnetic pole 30 is not exposed inside the slit 31. Therefore, it is possible to suppress the consumption of the magnetic pole 30 caused by the exposure of the magnetic pole 30 to the plasma in the slit 31, thereby preventing the gap between the slit 31 (the distance between the two ends 36) caused by the consumption of the magnetic pole 30 increase. As a result, a specified interval in the slit 31 can be maintained, thereby preventing a decrease in the discharge current. In addition, the life of the magnetic pole 30 can be prolonged, and the frequency of replacing the used magnetic pole with a new one can be reduced, thereby improving maintenance. Furthermore, by suppressing the consumption of the magnetic pole 30, the pollution caused by the material of the magnetic pole 30 can be suppressed, and the production process using the ion gun will not be adversely affected.

於本實施形態中,外罩60包含相較磁極材料不易腐蝕之材質,包含碳。碳與通常之磁極材料相比,濺鍍效率為約1/3,故可較佳地用作外罩60之材質。In this embodiment, the outer cover 60 includes a material that is less corroded than the magnetic pole material, and includes carbon. Carbon has a sputtering efficiency of about 1/3 compared with ordinary magnetic pole materials, so it can be better used as the material of the outer cover 60.

(實施形態之變化例) 其次,參照圖4~圖6,對本發明之實施形態之變化例之線性離子槍進行說明。於圖4~圖6中,對與上述實施形態相同之構件標註相同符號,省略或簡化其說明。於磁極30之狹縫之構造方面、或外罩60之構造方面,以下說明之變化例與上述實施形態不同。(Examples of changes in implementation) Next, referring to Figs. 4 to 6, a linear ion gun of a modification of the embodiment of the present invention will be described. In FIGS. 4 to 6, the same reference numerals are given to the same members as the above-mentioned embodiment, and the description thereof is omitted or simplified. With regard to the structure of the slit of the magnetic pole 30 or the structure of the cover 60, the modified example described below is different from the above-mentioned embodiment.

(變化例1) 圖4係表示本發明之實施形態之變化例1之線性離子槍之主要部分之放大剖視圖。(Variation example 1) Fig. 4 is an enlarged cross-sectional view showing the main part of the linear ion gun of Modification 1 of the embodiment of the present invention.

磁極30具有內傾斜面38替代上述實施形態中說明之垂直面37。內傾斜面38係自內表面32之端部39(一端、下端)朝狹縫31之中央斜向上方延伸之傾斜面,形成狹縫31之一部分。內傾斜面38於端部36與外傾斜面35相連。The magnetic pole 30 has an inner inclined surface 38 instead of the vertical surface 37 described in the above embodiment. The inner inclined surface 38 is an inclined surface extending obliquely upward from the end 39 (one end, lower end) of the inner surface 32 toward the center of the slit 31 and forms a part of the slit 31. The inner inclined surface 38 is connected to the outer inclined surface 35 at the end 36.

變化例1中,外罩60並未被覆內傾斜面38,內傾斜面38於開口11內露出。In Modification 1, the outer cover 60 does not cover the inner inclined surface 38 and the inner inclined surface 38 is exposed in the opening 11.

具體而言,外罩60具有第1被覆部61及第2被覆部62,不具有上述第3被覆部63。第1被覆部61被覆磁極30之外表面33。第2被覆部62與第1被覆部61相連,且被覆外傾斜面35。Specifically, the outer cover 60 has the first covering portion 61 and the second covering portion 62 and does not have the above-mentioned third covering portion 63. The first covering portion 61 covers the outer surface 33 of the magnetic pole 30. The second covering portion 62 is connected to the first covering portion 61 and covers the outer inclined surface 35.

根據本變化例1,於開口11,構成狹縫31之外傾斜面35由外罩60覆蓋,故外傾斜面35於狹縫31之內部並未露出。因此,可抑制因外傾斜面35於狹縫31內曝露於電漿而導致之磁極30之消耗,從而可防止由磁極30之消耗導致之狹縫31之間隔之增加。其結果,可維持狹縫31中特定之間隔,從而防止放電電流之降低,使磁極30之壽命延長。因此,可獲得與上述實施形態相同之效果。According to this modification 1, in the opening 11, the outer inclined surface 35 forming the slit 31 is covered by the outer cover 60, so the outer inclined surface 35 is not exposed inside the slit 31. Therefore, the consumption of the magnetic pole 30 caused by the outer inclined surface 35 being exposed to the plasma in the slit 31 can be suppressed, and the increase of the interval between the slits 31 caused by the consumption of the magnetic pole 30 can be prevented. As a result, the specified interval in the slit 31 can be maintained, thereby preventing a decrease in the discharge current and extending the life of the magnetic pole 30. Therefore, the same effect as the above-mentioned embodiment can be obtained.

(變化例2) 圖5係表示本發明之實施形態之變化例2之線性離子槍之主要部分的放大剖視圖。(Variation 2) Fig. 5 is an enlarged cross-sectional view showing the main part of the linear ion gun of Modification 2 of the embodiment of the present invention.

變化例2表示使圖3所示之外罩60(實施形態1,具備第1被覆部61、第2被覆部62、及第3被覆部63之外罩60)嵌合於具備內傾斜面38之磁極30(變化例2,參照圖4)之情形。Modification 2 shows that the outer cover 60 shown in FIG. 3 (the outer cover 60 provided with the first covering portion 61, the second covering portion 62, and the third covering portion 63) shown in FIG. 3 is fitted to the magnetic pole provided with the inner inclined surface 38 30 (variation 2, refer to Figure 4).

(變化例3) 圖6係表示本發明之實施形態之變化例3之線性離子槍之主要部分的放大剖視圖。(Variation 3) Fig. 6 is an enlarged cross-sectional view of the main part of the linear ion gun showing the modification 3 of the embodiment of the present invention.

變化例3表示使圖4所示之外罩60(變化例1,具備第1被覆部61及第2被覆部62之外罩60)嵌合於具備垂直面37之磁極30(實施形態,參照圖3)之情形。Modification 3 shows that the outer cover 60 shown in FIG. 4 (modification 1, the outer cover 60 provided with the first covering portion 61 and the second covering portion 62) is fitted to the magnetic pole 30 provided with the vertical surface 37 (embodiment, see FIG. 3 ) Situation.

於本變化例2、3之任一者中,構成狹縫31之外傾斜面35均於開口11由外罩60覆蓋,故外傾斜面35於狹縫31之內部並未露出。因此,可抑制因外傾斜面35於狹縫31內曝露於電漿而導致之磁極30之消耗,從而可防止由磁極30之消耗導致之狹縫31之間隔之增加。其結果,可維持狹縫31中特定之間隔,從而防止放電電流之降低,使磁極30之壽命延長。因此,可獲得與上述實施形態相同之效果。In any of the modification examples 2 and 3, the outer inclined surface 35 forming the slit 31 is covered by the outer cover 60 in the opening 11, so the outer inclined surface 35 is not exposed inside the slit 31. Therefore, the consumption of the magnetic pole 30 caused by the outer inclined surface 35 being exposed to the plasma in the slit 31 can be suppressed, and the increase of the interval between the slits 31 caused by the consumption of the magnetic pole 30 can be prevented. As a result, the specified interval in the slit 31 can be maintained, thereby preventing a decrease in the discharge current and extending the life of the magnetic pole 30. Therefore, the same effect as the above-mentioned embodiment can be obtained.

於上述實施形態及變化例1~3中,將彼此相對並且線對稱(相對於狹縫之中央線而線對稱)地配置之2個外傾斜面35設置於狹縫31之內部。換言之,該構造中,以端部36為頂點之彼此相對之2個角部位於狹縫31之內部。In the above-mentioned embodiment and modified examples 1 to 3, the two outer inclined surfaces 35 arranged in line symmetry (line symmetry with respect to the center line of the slit) facing each other are provided inside the slit 31. In other words, in this structure, two corners facing each other with the end 36 as the apex are located inside the slit 31.

又,圖3及圖6中,將彼此相對並且線對稱地配置之2個垂直面37設置於狹縫31之內部。該構造中,垂直面37與成為頂點之端部36相連。In addition, in FIG. 3 and FIG. 6, two vertical surfaces 37 that are opposed to each other and arranged line symmetrically are provided inside the slit 31. In this structure, the vertical surface 37 is connected to the end 36 which becomes the apex.

又,於圖4及圖5中,將彼此相對並且線對稱地配置之2個內傾斜面38設置於狹縫31之內部。該構造中,內傾斜面38與成為頂點之端部36相連。In addition, in FIG. 4 and FIG. 5, two inner inclined surfaces 38 that are arranged line-symmetrically opposite to each other are provided inside the slit 31. In this structure, the inner inclined surface 38 is connected to the end 36 which becomes the apex.

於此種線對稱之構造中,於狹縫31之內部即便磁極30已消耗,仍維持線對稱之形狀(相似關係),故放電電流不會降低,且可保持放電電流穩定之推移(經時變化)。In this line-symmetrical structure, even if the magnetic pole 30 is consumed inside the slit 31, the line-symmetrical shape (similar relationship) is still maintained, so the discharge current will not decrease, and the discharge current can be kept stable (with time Variety).

其理由在於:假設認為圖4、圖5、圖6中未被外罩覆蓋之部位同等地消耗之情形時,顯然可保持如上所述之形狀之相似關係。The reason is that when it is assumed that the parts not covered by the outer cover in Figs. 4, 5, and 6 are equally consumed, it is obvious that the similar relationship of the shapes described above can be maintained.

所謂可保持形狀之相似關係與狹縫31內部所產生之磁通密度之狀況(變化)僅依存於狹縫31之間隔含義大致相同。其係指不會因狹縫31內部之磁極30之表面形狀之變化產生磁通分佈之變動。The so-called similar relationship of the shape that can be maintained is substantially the same as the state (change) of the magnetic flux density generated inside the slit 31 only depending on the interval of the slit 31. It means that the magnetic flux distribution will not change due to the change of the surface shape of the magnetic pole 30 inside the slit 31.

本發明者等人藉由模擬對狹縫31之間隔、與狹縫31內部之磁極30之表面形狀之變化雙方之貢獻度之評估進行了確認。The inventors of the present invention conducted simulations to evaluate the contribution of both the interval between the slits 31 and the change in the surface shape of the magnetic pole 30 inside the slit 31.

獲得如下結果:於以離子電流之穩定化為目的之情形時,相較狹縫31之間隔之變化,保持狹縫31內部之相互對向之磁極30之形狀之相似關係對於實現離子電流之穩定化而言為支配性之因素。已確認該評估結果與下述實施例(實驗結果)匹配。The following results are obtained: when the aim is to stabilize the ion current, compared with the change in the interval of the slit 31, maintaining the similar relationship of the shape of the mutually opposed magnetic poles 30 inside the slit 31 is essential for achieving the stability of the ion current Generally speaking, it is the dominant factor. It has been confirmed that this evaluation result matches the following example (experiment result).

實施例 其次,參照圖7,並參照實施例,更具體地說明本發明之效果。Example Next, referring to FIG. 7 and embodiments, the effects of the present invention will be explained more specifically.

圖7係將表示先前之線性離子槍之比較例、與表示應用上述實施形態之外罩之線性離子槍之實施例加以比較的曲線圖,其表示放電電流伴隨運轉時間之經過之經時變化。圖7中,橫軸表示線性離子槍之運轉時間,縱軸表示放電電流之變化。具體而言,所謂放電電流之變化係指將運轉時間為0小時之情形作為基準(1,100%)之放電電流之相對變化量。FIG. 7 is a graph comparing the previous comparative example of the linear ion gun with the example of the linear ion gun using the outer cover of the above embodiment, which shows the time-dependent change of the discharge current with the passage of the operating time. In Figure 7, the horizontal axis represents the operating time of the linear ion gun, and the vertical axis represents the change in the discharge current. Specifically, the so-called change in discharge current refers to the relative change in discharge current based on the operating time of 0 hours (1, 100%).

(比較例) 於比較例之線性離子槍中,應用於磁極之狹縫未設置外罩之構造,即磁極之構成構件於狹縫露出之構造。(Comparative example) In the linear ion gun of the comparative example, it is applied to the structure where the slit of the magnetic pole is not provided with a cover, that is, the structure where the constituent member of the magnetic pole is exposed in the slit.

於比較例中,放電電流自剛開始運轉後便顯著降低。其後,至運轉時間達7.5小時為止,放電電流逐漸降低。於運轉時間經過7.5小時後,放電電流降低之現象仍在持續。當運轉時間達到50小時,放電電流之變化量成為0.71,與開始運轉前相比,放電電流降低約29%。又,於運轉時間達50小時後,對比較例之線性離子槍中之磁極消耗進行確認,結果於與本實施形態之磁極30之端部36相當之部分,確認到產生了因消耗導致之形狀變化。In the comparative example, the discharge current is significantly reduced since the start of operation. Thereafter, until the operation time reached 7.5 hours, the discharge current gradually decreased. After 7.5 hours of operation, the decrease in discharge current continues. When the operating time reaches 50 hours, the amount of change in the discharge current becomes 0.71, and the discharge current is reduced by about 29% compared to before starting the operation. In addition, after the operation time reached 50 hours, the consumption of the magnetic pole in the linear ion gun of the comparative example was confirmed. As a result, it was confirmed that the shape due to the consumption occurred in the part corresponding to the end 36 of the magnetic pole 30 of this embodiment. Variety.

(實施例) 於本實施例之線性離子槍中,應用上述實施形態(圖3)所示之構造。(Example) In the linear ion gun of this embodiment, the structure shown in the above embodiment (FIG. 3) is applied.

於本實施例中,自開始運轉起至運轉時間達15小時為止,放電電流穩定,未見到如比較例所示之放電電流之顯著降低。於運轉時間經過15小時後,放電電流逐漸降低。放電電流之降低持續至運轉時間達35小時為止。另一方面,當運轉時間超過35小時,未見到放電電流之降低,放電電流穩定。當運轉時間達到50小時,放電電流之變化量成為0.90,與開始運轉前相比放電電流降低約10%。In this example, the discharge current was stable from the start of operation until the operation time reached 15 hours, and no significant decrease in the discharge current as shown in the comparative example was seen. After 15 hours of running time, the discharge current gradually decreases. The decrease in discharge current continues until the operating time reaches 35 hours. On the other hand, when the operation time exceeds 35 hours, no decrease in the discharge current is seen, and the discharge current is stable. When the operating time reaches 50 hours, the amount of change in the discharge current becomes 0.90, which is about 10% lower than the discharge current before the start of operation.

對比較例與實施例進行比較後明確瞭解,於運轉時間經過50小時後,實施例可相對於比較例抑制約19%之放電電流之降低。即,將上述實施形態所示之外罩60設置於磁極30之構造有助於抑制放電電流之降低。After comparing the comparative example with the example, it is clear that after 50 hours of operation time, the example can suppress the decrease of the discharge current by about 19% compared with the comparative example. That is, the structure in which the outer cover 60 shown in the above-mentioned embodiment is provided on the magnetic pole 30 helps to suppress the decrease in the discharge current.

以上,對本發明之較佳之實施形態進行了說明,雖然已於上文作了說明,但應理解該等係本發明之例示,不應考慮作為限定者。可於不脫離本發明之範圍內進行追加、省略、替換、及其他變更。因此,本發明不應看作由上述說明限定,而是由申請專利範圍限制。Above, the preferred embodiments of the present invention have been described. Although the description has been made above, it should be understood that these are examples of the present invention and should not be considered as limiting. Additions, omissions, substitutions, and other changes can be made without departing from the scope of the present invention. Therefore, the present invention should not be regarded as limited by the above description, but by the scope of the patent application.

[產業上之可利用性] 本發明能夠廣泛應用於如下之離子槍,即,可抑制形成於磁極之狹縫之磨耗,藉由削減磁極之更換頻度而提昇維護性,且可抑制由磁極之材料導致的污染之產生。[Industrial availability] The present invention can be widely applied to ion guns that can suppress the abrasion of the slits formed in the magnetic poles, improve maintenance by reducing the frequency of replacement of the magnetic poles, and can suppress pollution caused by the material of the magnetic poles.

10‧‧‧線性離子槍(離子槍) 11‧‧‧開口 20‧‧‧磁軛 30‧‧‧磁極 31‧‧‧狹縫 32‧‧‧內表面 33‧‧‧外表面 34‧‧‧端部 35‧‧‧外傾斜面 36‧‧‧端部 37‧‧‧垂直面 38‧‧‧內傾斜面 39‧‧‧端部 40‧‧‧陽極 50‧‧‧磁鐵 60‧‧‧外罩 61‧‧‧第1被覆部 62‧‧‧第2被覆部 63‧‧‧第3被覆部 70‧‧‧絕緣部 A‧‧‧部分 B‧‧‧部分 BM‧‧‧離子束 P‧‧‧電漿10‧‧‧Linear ion gun (ion gun) 11‧‧‧Open 20‧‧‧Yoke 30‧‧‧Magnetic pole 31‧‧‧Slit 32‧‧‧Inner surface 33‧‧‧Outer surface 34‧‧‧End 35‧‧‧Outer inclined surface 36‧‧‧End 37‧‧‧Vertical plane 38‧‧‧Inside inclined surface 39‧‧‧End 40‧‧‧Anode 50‧‧‧Magnet 60‧‧‧Cover 61‧‧‧First Covered Section 62‧‧‧Second Covered Section 63‧‧‧The third covered part 70‧‧‧Insulation Part A‧‧‧ Part B‧‧‧ BM‧‧‧Ion beam P‧‧‧Plasma

圖1係表示本發明之實施形態之線性離子槍之概略構造之立體圖。 圖2係表示本發明之實施形態之線性離子槍之概略構造之圖,且係沿著圖1所示之A-A線之剖視圖。 圖3係表示本發明之實施形態之線性離子槍之主要部分之放大剖視圖。 圖4係表示本發明之實施形態之變化例1之線性離子槍之主要部分之放大剖視圖。 圖5係表示本發明之實施形態之變化例2之線性離子槍之主要部分之放大剖視圖。 圖6係表示本發明之實施形態之變化例3之線性離子槍之主要部分之放大剖視圖。 圖7係表示說明本發明之實施例之實驗結果之曲線圖。Fig. 1 is a perspective view showing a schematic structure of a linear ion gun according to an embodiment of the present invention. 2 is a diagram showing the schematic structure of the linear ion gun of the embodiment of the present invention, and is a cross-sectional view taken along the line A-A shown in FIG. 1. Fig. 3 is an enlarged cross-sectional view of the main part of the linear ion gun showing the embodiment of the present invention. Fig. 4 is an enlarged cross-sectional view showing the main part of the linear ion gun of Modification 1 of the embodiment of the present invention. Fig. 5 is an enlarged cross-sectional view of the main part of the linear ion gun showing the modification 2 of the embodiment of the present invention. Fig. 6 is an enlarged cross-sectional view of the main part of the linear ion gun showing the modification 3 of the embodiment of the present invention. Fig. 7 is a graph showing experimental results of an embodiment of the present invention.

10‧‧‧線性離子槍(離子槍) 10‧‧‧Linear ion gun (ion gun)

11‧‧‧開口 11‧‧‧Open

20‧‧‧磁軛 20‧‧‧Yoke

30‧‧‧磁極 30‧‧‧Magnetic pole

31‧‧‧狹縫 31‧‧‧Slit

32‧‧‧內表面 32‧‧‧Inner surface

40‧‧‧陽極 40‧‧‧Anode

50‧‧‧磁鐵 50‧‧‧Magnet

60‧‧‧外罩 60‧‧‧Cover

70‧‧‧絕緣部 70‧‧‧Insulation

BM‧‧‧離子束 BM‧‧‧Ion beam

P‧‧‧電漿 P‧‧‧Plasma

Claims (5)

一種離子槍,其具備:陽極;磁極,其具有與上述陽極對向之內表面、位於上述內表面之相反側之外表面、設置於與上述陽極對應之位置之狹縫、及自上述外表面之一端朝上述狹縫之中央延伸且形成上述狹縫之一部分之外傾斜面;以及外罩,其被覆至少上述外表面及上述外傾斜面,且包含非磁性材料,其中上述外罩具備:第1被覆部,其被覆上述磁極之上述外表面;第2被覆部,其與上述第1被覆部相連且被覆上述外傾斜面;第3被覆部,其與上述第2被覆部相連,且自與上述第1被覆部及上述第2被覆部相連之部分為相反側之部分朝上述陽極延伸;其中於上述第2被覆部及上述第3被覆部嵌合於上述狹縫之狀態下,上述外罩藉由緊固構件而固定於上述磁極。 An ion gun comprising: an anode; a magnetic pole having an inner surface facing the anode, an outer surface on the opposite side of the inner surface, a slit provided at a position corresponding to the anode, and a magnetic pole from the outer surface One end extends toward the center of the slit and forms a part of the outer inclined surface of the slit; and an outer cover that covers at least the outer surface and the outer inclined surface and includes a non-magnetic material, wherein the outer cover includes: a first covering Part, which covers the outer surface of the magnetic pole; a second cover part which is connected to the first cover part and covers the outer inclined surface; a third cover part which is connected to the second cover part and is free from the first 1 The part where the covering part and the second covering part are connected is the part on the opposite side extending toward the anode; wherein, in the state where the second covering part and the third covering part are fitted into the slit, the outer cover is tightly The solid member is fixed to the above-mentioned magnetic pole. 如請求項1之離子槍,其中上述磁極具有相互平行之垂直面,其等自上述外傾斜面之一端朝上述內表面延伸且形成上述狹縫之一部分;且上述外罩被覆上述垂直面。 The ion gun of claim 1, wherein the magnetic poles have vertical surfaces parallel to each other, which extend from an end of the outer inclined surface toward the inner surface and form a part of the slit; and the outer cover covers the vertical surface. 如請求項1之離子槍,其中 上述磁極具有內傾斜面,其自上述內表面之一端朝上述狹縫之中央延伸且形成上述狹縫之一部分。 Such as the ion gun of claim 1, where The magnetic pole has an inner inclined surface extending from one end of the inner surface toward the center of the slit and forming a part of the slit. 如請求項1之離子槍,其中構成上述外罩之上述非磁性材料係選自由碳、鈦、及銅所組成之群。 The ion gun of claim 1, wherein the non-magnetic material constituting the outer cover is selected from the group consisting of carbon, titanium, and copper. 如請求項4之離子槍,其中構成上述外罩之上述非磁性材料為碳。 The ion gun of claim 4, wherein the non-magnetic material constituting the outer cover is carbon.
TW108109709A 2018-03-22 2019-03-21 Ion gun TWI697932B (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2018054700 2018-03-22
JP2018-054700 2018-03-22

Publications (2)

Publication Number Publication Date
TW201941241A TW201941241A (en) 2019-10-16
TWI697932B true TWI697932B (en) 2020-07-01

Family

ID=67987403

Family Applications (1)

Application Number Title Priority Date Filing Date
TW108109709A TWI697932B (en) 2018-03-22 2019-03-21 Ion gun

Country Status (4)

Country Link
JP (1) JP6652689B1 (en)
CN (1) CN111656481B (en)
TW (1) TWI697932B (en)
WO (1) WO2019182111A1 (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102020114162B3 (en) 2020-05-27 2021-07-22 VON ARDENNE Asset GmbH & Co. KG Ion source and method
KR20230041062A (en) * 2020-07-22 2023-03-23 캐논 아네르바 가부시키가이샤 Ion gun and vacuum processing unit
CN116134577A (en) 2020-07-22 2023-05-16 佳能安内华股份有限公司 Ion gun and vacuum processing apparatus

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2004010455A2 (en) * 2002-07-23 2004-01-29 Guardian Industries Corp. Ion beam source with coated electrode
US20080073557A1 (en) * 2006-07-26 2008-03-27 John German Methods and apparatuses for directing an ion beam source
TW201626421A (en) * 2014-12-22 2016-07-16 應用材料股份有限公司 Apparatus for inspecting a substrate, method for inspecting a substrate, large area substrate inspection apparatus

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008053116A (en) * 2006-08-25 2008-03-06 Ulvac Japan Ltd Ion gun and deposition apparatus
JP4669831B2 (en) * 2006-11-17 2011-04-13 株式会社アルバック Ion beam source and film forming apparatus provided with the same
JP2009048877A (en) * 2007-08-21 2009-03-05 Nec Electronics Corp Ion implanter
WO2011017314A2 (en) * 2009-08-03 2011-02-10 General Plasma, Inc. Closed drift ion source with symmetric magnetic field
JP2011034888A (en) * 2009-08-04 2011-02-17 Kobe Steel Ltd Ion source
WO2016017918A1 (en) * 2014-07-29 2016-02-04 (주) 화인솔루션 Ion source
KR102075157B1 (en) * 2016-07-28 2020-02-10 한국기계연구원 Ion beam source

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2004010455A2 (en) * 2002-07-23 2004-01-29 Guardian Industries Corp. Ion beam source with coated electrode
US20080073557A1 (en) * 2006-07-26 2008-03-27 John German Methods and apparatuses for directing an ion beam source
TW201626421A (en) * 2014-12-22 2016-07-16 應用材料股份有限公司 Apparatus for inspecting a substrate, method for inspecting a substrate, large area substrate inspection apparatus

Also Published As

Publication number Publication date
JPWO2019182111A1 (en) 2020-04-30
CN111656481B (en) 2021-02-05
JP6652689B1 (en) 2020-02-26
CN111656481A (en) 2020-09-11
WO2019182111A1 (en) 2019-09-26
TW201941241A (en) 2019-10-16

Similar Documents

Publication Publication Date Title
TWI697932B (en) Ion gun
US10134557B2 (en) Linear anode layer slit ion source
US20050247885A1 (en) Closed drift ion source
US20110240468A1 (en) Target utilization improvement for rotatable magnetrons
TW486713B (en) Ion source and operation method thereof
US20070034501A1 (en) Cathode-arc source of metal/carbon plasma with filtration
JP2012188751A (en) Magnetron electrode for plasma processing
JP2008053116A (en) Ion gun and deposition apparatus
TWI793656B (en) Ion gun and vacuum treatment device
EP2775805A2 (en) Non-transferred and hollow type plasma torch
JP5496223B2 (en) Arc evaporator and operating method of arc evaporator
TWI755796B (en) ion gun
JP5080294B2 (en) Ion gun and film forming apparatus
WO2017221821A1 (en) Target device and sputtering apparatus
TWI802937B (en) Ion gun and vacuum treatment device
WO2019167438A1 (en) Magnetron sputtering cathode and magnetron sputtering devise using same
JP2002140997A (en) Ion source
JP7382183B2 (en) Cavity and ground plate
JP2008305558A (en) Plasma generating device and reaction chamber used for it
US20140291149A1 (en) Anode assembly of a vacuum-arc cathode plasma source
CN117004911A (en) Column arc source magnetic field device
JP2013100605A (en) Arc vapor deposition device with strong magnetic guide for target having large surface region
KR20080074311A (en) Rectangular cathodic arc source using electrically moving magnetic field
JP2012237047A (en) Magnetron sputtering cathode and sputtering apparatus