TWI688984B - Membrane assembly, examination container and electron microscope - Google Patents

Membrane assembly, examination container and electron microscope Download PDF

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TWI688984B
TWI688984B TW107142752A TW107142752A TWI688984B TW I688984 B TWI688984 B TW I688984B TW 107142752 A TW107142752 A TW 107142752A TW 107142752 A TW107142752 A TW 107142752A TW I688984 B TWI688984 B TW I688984B
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hole
support member
inspection container
inspection
main body
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TW107142752A
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Chinese (zh)
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TW201937528A (en
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黃祖緯
吳佳凌
劉鈰誼
張茂展
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台灣電鏡儀器股份有限公司
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    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/20Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials
    • G01N23/203Measuring back scattering

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  • Crystallography & Structural Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
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Abstract

An examination container includes a main body, a membrane assembly and a cover. The main body has an accommodating trough for holding sample. The membrane assembly covers an opening end of the accommodating trough. The membrane assembly includes a support body and a membrane. The support body has a first surface and a second surface, wherein the support body is flat and has a first through hole penetrating through the first surface and the second surface. The membrane is arranged on the second surface side of the support body and has a second through hole, wherein the second through hole opposites to the first through hole for passing a charged particle beam through the second through hole. The cover is detachably connected to the main body to secure the membrane assembly. The above-mentioned examination container is easy to replace and produces only a small amount of consumables. An electron microscope using the above-mentioned examination container is also disclosed.

Description

薄膜組件、檢驗容器以及電子顯微鏡Thin film assembly, inspection container and electron microscope

本發明是有關一種利用電子顯微鏡之檢驗技術,特別是一種可檢驗常壓下之樣品之薄膜組件、檢驗容器以及電子顯微鏡。 The invention relates to an inspection technique using an electron microscope, in particular to a thin film component, an inspection container and an electron microscope that can inspect samples under normal pressure.

習知之電子顯微鏡是在真空環境下檢驗樣品,因此無法檢驗常壓狀態之樣品,例如包含液態或氣態之樣品。為了克服此缺陷,目前已發展出利用帶電粒子束可穿透之薄膜來分隔真空環境以及非真空環境之電子顯微鏡,亦即薄膜至電子槍間之區域為真空環境,而薄膜至樣品間之區域則可為非真空環境。依據此結構,電子顯微鏡即能夠檢驗常壓下之樣品,例如懸浮粒子之分散狀態、反應中之氣體或活體之生物樣本等。 The conventional electron microscope tests samples in a vacuum environment, so it is impossible to test samples under normal pressure, such as samples containing liquid or gas. In order to overcome this defect, electron microscopes that use a film that can be penetrated by a charged particle beam to separate a vacuum environment and a non-vacuum environment have been developed. That is, the area between the film and the electron gun is a vacuum environment, and the area between the film and the sample is It can be a non-vacuum environment. According to this structure, the electron microscope can test samples under normal pressure, such as the dispersed state of suspended particles, gases in reaction or biological samples of living bodies, etc.

然而,無可避免地,薄膜會受到帶電粒子束的轟擊而破損或因接觸樣本而髒污。傳統上,薄膜是黏貼於塊材上,再將塊材以多個螺絲鎖固於預定位置。因此,每次更換薄膜的程序較為繁鎖且產生大量的耗材。 However, it is inevitable that the thin film will be damaged by the bombardment of the charged particle beam or dirty due to contact with the sample. Traditionally, the film is adhered to the block material, and then the block material is locked at a predetermined position with a plurality of screws. Therefore, the procedure for replacing the film each time is cumbersome and generates a lot of consumables.

有鑑於此,如何簡便地更換薄膜便是目前極需努力的目標。 In view of this, how to easily replace the film is currently the goal of great efforts.

本發明提供一種薄膜組件,其是將薄膜設置於平板狀之支撐件上,此薄膜組件即能夠一蓋體固定於一主體上而形成一檢驗容器,以供電子顯微鏡進行檢驗。因此,本發明更換薄膜時所產生之耗材量可大幅減少,且操作者能夠簡便地更換薄膜組件。 The invention provides a thin film assembly, which is provided with a thin film on a flat support. The thin film assembly can be fixed on a main body with a cover to form an inspection container for inspection by an electron microscope. Therefore, the amount of consumables generated when replacing the film of the present invention can be greatly reduced, and the operator can easily replace the film assembly.

本發明一實施例之薄膜組件包含一支撐件以及一薄膜。支撐件具有一第一表面以及相對之一第二表面,其中支撐件為平板狀,且具有一第一通孔,其貫穿第一表面以及第二表面。支撐件的材料為金屬、金屬化合物、或高分子材料之至少其中之一。薄膜設置於支撐件之第二表面側,且具有一第二通孔,其中第二通孔對應於第一通孔,且第二通孔可供一帶電粒子束通過。 The film assembly of an embodiment of the present invention includes a support and a film. The support member has a first surface and an opposite second surface, wherein the support member is flat and has a first through hole, which penetrates the first surface and the second surface. The material of the support member is at least one of metal, metal compound, or polymer material. The thin film is disposed on the second surface side of the support and has a second through hole, wherein the second through hole corresponds to the first through hole, and the second through hole can pass a charged particle beam.

本發明另一實施例之檢驗容器包含一主體、一薄膜組件以及一蓋體。主體具有一容置槽以容置樣品。薄膜組件覆蓋容置槽之一開口端。薄膜組件包含一支撐件以及一薄膜。支撐件具有一第一表面以及相對之一第二表面,其中支撐件為平板狀,且具有一第一通孔,其貫穿第一表面以及第二表面。支撐件的材料為金屬、金屬化合物、或高分子材料之至少其中之一,且支撐件之邊緣延伸至容置槽之邊緣。薄膜設置於支撐件之第二表面側,且具有一第二通孔,其中第二通孔對應於第一通孔,且第二通孔可供一帶電粒子束通過。蓋體可拆卸地與主體結合,且蓋體壓合支撐件之邊緣以緊迫並固定薄膜組件於主體上。 An inspection container according to another embodiment of the present invention includes a main body, a film assembly, and a cover. The main body has an accommodating groove to accommodate the sample. The film assembly covers one open end of the accommodating groove. The film assembly includes a support and a film. The support member has a first surface and an opposite second surface, wherein the support member is flat and has a first through hole, which penetrates the first surface and the second surface. The material of the support member is at least one of metal, metal compound, or polymer material, and the edge of the support member extends to the edge of the accommodating groove. The thin film is disposed on the second surface side of the support and has a second through hole, wherein the second through hole corresponds to the first through hole, and the second through hole can pass a charged particle beam. The cover body is detachably combined with the main body, and the cover body presses the edge of the support to tightly fix the film assembly on the main body.

本發明又一實施例之電子顯微鏡包含一檢驗腔室、一帶電粒子束產生器、一檢驗容器以及一偵測器。檢驗腔室定義出一真空環境。帶電粒子束產生器與檢驗腔室連接,用以於檢驗腔室產生一帶電粒子束。檢驗容器放置於檢驗腔室中,以接受帶電粒子束轟擊。檢驗容器包含一主體、一薄膜組件以及一蓋體。主體具有一容置槽以容置樣品。薄膜組件覆蓋容置槽之一開口端。薄膜組件包含一支撐件以及一薄膜。支撐件具有一第一表面以及相對之一第二表面,其中支撐件為平板狀,且具有一第一通孔,其貫穿第一表面以及第二表面。支撐件的材料 為金屬、金屬化合物、或高分子材料之至少其中之一,且支撐件之邊緣延伸至容置槽之邊緣。薄膜設置於支撐件之第二表面側,且具有一第二通孔,其中第二通孔對應於第一通孔,且第二通孔可供一帶電粒子束通過,以轟擊樣品。蓋體可拆卸地與主體結合,且蓋體壓合支撐件之邊緣以緊迫並固定薄膜組件於主體上。偵測器用以偵測樣品被帶電粒子束轟擊之一響應,並轉換為一電子訊號。 An electron microscope according to yet another embodiment of the present invention includes an inspection chamber, a charged particle beam generator, an inspection container, and a detector. The inspection chamber defines a vacuum environment. The charged particle beam generator is connected to the inspection chamber to generate a charged particle beam in the inspection chamber. The inspection container is placed in the inspection chamber to receive the bombardment of the charged particle beam. The inspection container includes a main body, a film assembly and a cover. The main body has an accommodating groove to accommodate the sample. The film assembly covers one open end of the accommodating groove. The film assembly includes a support and a film. The support member has a first surface and an opposite second surface, wherein the support member is flat and has a first through hole, which penetrates the first surface and the second surface. Support material It is at least one of metal, metal compound, or polymer material, and the edge of the supporting member extends to the edge of the accommodating groove. The thin film is disposed on the second surface side of the support and has a second through hole, wherein the second through hole corresponds to the first through hole, and the second through hole can pass a charged particle beam to bombard the sample. The cover body is detachably combined with the main body, and the cover body presses the edge of the support to tightly fix the film assembly on the main body. The detector is used to detect a response of the sample bombarded by the charged particle beam and convert it into an electronic signal.

以下藉由具體實施例配合所附的圖式詳加說明,當更容易瞭解本發明之目的、技術內容、特點及其所達成之功效。 The following is a detailed description with specific embodiments and accompanying drawings, so that it is easier to understand the purpose, technical content, features, and effects of the present invention.

10:檢驗容器 10: Inspection container

11:主體 11: main body

111:容置槽 111: accommodation slot

112:載台 112: stage

112a:定位梢 112a: positioning pin

112b:直立表面 112b: Upright surface

112c:樣品墊塊 112c: Sample pad

113a:流體入口 113a: fluid inlet

113b:流體出口 113b: fluid outlet

113c:控溫流體入口 113c: temperature control fluid inlet

113d:控溫流體出口 113d: temperature control fluid outlet

114:推桿 114: putter

115:控溫流道 115: temperature control runner

115a:凸部 115a: convex part

12:薄膜組件 12: Thin film module

121:支撐件 121: Support

121a:第一表面 121a: first surface

121b:第二表面 121b: Second surface

121c:第一凹槽 121c: First groove

121d:第一通孔 121d: the first through hole

121e:第二凹槽 121e: second groove

122:薄膜 122: film

122a:第二通孔 122a: second through hole

13:蓋體 13: Cover

131:開孔 131: opening

14、14a、14b:O形環 14, 14a, 14b: O-ring

15:控溫組件 15: temperature control components

21:檢驗腔室 21: Inspection chamber

22:帶電粒子束產生器 22: Charged particle beam generator

221:帶電粒子束 221: charged particle beam

222:響應 222: Response

23:偵測器 23: Detector

圖1為一分解圖,顯示本發明第一實施例之檢驗容器。 FIG. 1 is an exploded view showing the inspection container of the first embodiment of the present invention.

圖2為一組合圖,顯示本發明第一實施例之檢驗容器。 FIG. 2 is a combined diagram showing the inspection container of the first embodiment of the present invention.

圖3為一示意圖,顯示本發明一實施例之薄膜組件之局部放大結構。 FIG. 3 is a schematic diagram showing a partially enlarged structure of a thin film device according to an embodiment of the invention.

圖4為一示意圖,顯示本發明第二實施例之檢驗容器。 FIG. 4 is a schematic diagram showing an inspection container according to a second embodiment of the invention.

圖5為一示意圖,顯示本發明第三實施例之檢驗容器。 FIG. 5 is a schematic diagram showing an inspection container according to a third embodiment of the invention.

圖6為一示意圖,顯示本發明第四實施例之檢驗容器。 6 is a schematic diagram showing an inspection container according to a fourth embodiment of the invention.

圖7為一示意圖,顯示本發明第五實施例之檢驗容器。 7 is a schematic diagram showing an inspection container according to a fifth embodiment of the invention.

圖8為一示意圖,顯示本發明第六實施例之檢驗容器。 8 is a schematic diagram showing an inspection container according to a sixth embodiment of the invention.

圖9為一示意圖,顯示本發明第七實施例之檢驗容器。 9 is a schematic diagram showing an inspection container according to a seventh embodiment of the invention.

圖10為一示意圖,顯示本發明第八實施例之檢驗容器。 10 is a schematic diagram showing an inspection container according to an eighth embodiment of the present invention.

圖11為一示意圖,顯示本發明另一實施例之薄膜組件。 FIG. 11 is a schematic diagram showing a thin film assembly according to another embodiment of the invention.

圖12為一示意圖,顯示本發明又一實施例之薄膜組件。 FIG. 12 is a schematic diagram showing a thin film assembly according to another embodiment of the invention.

圖13為一示意圖,顯示本發明一實施例之電子顯微鏡。 FIG. 13 is a schematic diagram showing an electron microscope according to an embodiment of the invention.

以下將詳述本發明之各實施例,並配合圖式作為例示。除了這些詳細說明之外,本發明亦可廣泛地施行於其它的實施例中,任何所述實施例的輕易替代、修改、等效變化都包含在本發明之範圍內,並以申請專利範圍為準。在說明書的描述中,為了使讀者對本發明有較完整的瞭解,提供了許多特定細節;然而,本發明可能在省略部分或全部特定細節的前提下,仍可實施。此外,眾所周知的步驟或元件並未描述於細節中,以避免對本發明形成不必要之限制。圖式中相同或類似之元件將以相同或類似符號來表示。特別注意的是,圖式僅為示意之用,並非代表元件實際之尺寸或數量,有些細節可能未完全繪出,以求圖式之簡潔。 In the following, each embodiment of the present invention will be described in detail, together with the drawings as an example. In addition to these detailed descriptions, the present invention can also be widely implemented in other embodiments. The easy replacement, modification, and equivalent changes of any of the described embodiments are included in the scope of the present invention, and the scope of the patent application is quasi. In the description of the specification, in order to make the reader have a more complete understanding of the present invention, many specific details are provided; however, the present invention may still be implemented on the premise that some or all of the specific details are omitted. In addition, well-known steps or elements are not described in detail to avoid unnecessarily limiting the invention. The same or similar elements in the drawings will be represented by the same or similar symbols. It is important to note that the drawings are for illustrative purposes only, and do not represent the actual size or number of components. Some details may not be fully drawn for simplicity.

請參照圖1至圖3,本發明之一實施例之檢驗容器10是放置於一電子顯微鏡之一檢驗腔室中,以檢驗檢驗容器10中之一樣品。檢驗容器10包含一主體11、一薄膜組件12以及一蓋體13。主體11具有一容置槽111以容置樣品,例如懸浮粒子之分散狀態或活體之生物樣本等。於一實施例中,主體11之材料可為不銹鋼。薄膜組件12覆蓋容置槽111之一開口端,以封閉容置槽111。 1 to 3, an inspection container 10 according to an embodiment of the present invention is placed in an inspection chamber of an electron microscope to inspect a sample in the inspection container 10. The inspection container 10 includes a main body 11, a film assembly 12 and a cover 13. The main body 11 has an accommodating groove 111 for accommodating samples, such as the dispersed state of suspended particles or living biological samples. In an embodiment, the material of the body 11 may be stainless steel. The film assembly 12 covers one open end of the containing groove 111 to close the containing groove 111.

請一併參照圖3,薄膜組件12包含一支撐件121以及一薄膜122。支撐件121具有一第一表面121a以及相對之一第二表面121b。支撐件121為平板狀,且具有一第一通孔121d。於圖3所示之實施例中,支撐件121包含一薄化區域,其涵蓋第一通孔121d,以降低第一通孔121d之側壁高度。舉例而言,支撐件121之第一表面121a側可設置一第一凹槽121c。第一通孔121d則設置於第一凹槽121c之底部,如此即可降低第一通孔121d之側壁高度。需注意者,請參照圖11,支撐件121可不設置任何薄化區域,亦即第一表面121a以及第二表面121b皆沒有高度 差。可以理解的是,第一通孔121d之側壁可能阻擋訊號接收,於一實施例中,第一通孔121d之側壁高度與第一通孔121d之寬度之比值應小於等於0.7。於一實施例中,支撐件121之材料可為金屬或金屬化合物、非金屬化合物或高分子材料。舉例而言,金屬或金屬化合物可為鋁、銅、氧化鋁或不銹鋼等;非金屬化合物可為玻璃、陶瓷、氮化物、碳化物或矽化物等;高分子材料可為塑膠或橡膠等。 Please refer to FIG. 3 together. The film assembly 12 includes a support 121 and a film 122. The supporting member 121 has a first surface 121a and an opposite second surface 121b. The supporting member 121 has a flat plate shape and has a first through hole 121d. In the embodiment shown in FIG. 3, the supporting member 121 includes a thinned area covering the first through hole 121d to reduce the height of the side wall of the first through hole 121d. For example, a first groove 121c may be provided on the first surface 121a side of the support 121. The first through hole 121d is disposed at the bottom of the first groove 121c, so that the height of the side wall of the first through hole 121d can be reduced. It should be noted that referring to FIG. 11, the support 121 may not have any thinned area, that is, neither the first surface 121a nor the second surface 121b has a height difference. It can be understood that the side wall of the first through hole 121d may block signal reception. In an embodiment, the ratio of the height of the side wall of the first through hole 121d to the width of the first through hole 121d should be less than or equal to 0.7. In an embodiment, the material of the support member 121 may be a metal or a metal compound, a non-metal compound, or a polymer material. For example, the metal or metal compound may be aluminum, copper, aluminum oxide, or stainless steel; the non-metal compound may be glass, ceramics, nitride, carbide, or silicide; the polymer material may be plastic or rubber.

薄膜122設置於支撐件121之第二表面121b側,且具有一第二通孔122a。薄膜122之第二通孔122a對應於支撐件121之第一通孔121d,因此,帶電粒子束可經由第一通孔121d以及第二通孔122a進入容置槽111以轟擊樣品。本發明所屬技術領域中具有通常知識者可以理解,薄膜122還包含覆蓋第二通孔122a之膜片,以維持容置槽111之氣密性。為了圖式簡潔,故未繪示覆蓋第二通孔122a之膜片。於一實施例中,薄膜122可為一薄膜晶片,舉例而言,薄膜晶片之材料可為半導體氮化物、半導體氧化物、金屬氧化物、高分子材料、石墨、石墨烯或其它適當之材料。 The film 122 is disposed on the second surface 121b side of the support 121, and has a second through hole 122a. The second through hole 122a of the thin film 122 corresponds to the first through hole 121d of the support 121. Therefore, the charged particle beam can enter the accommodating groove 111 through the first through hole 121d and the second through hole 122a to bombard the sample. Those skilled in the art of the present invention can understand that the film 122 further includes a membrane covering the second through-hole 122a to maintain the airtightness of the containing groove 111. For simplicity, the diaphragm covering the second through hole 122a is not shown. In an embodiment, the thin film 122 may be a thin film wafer. For example, the material of the thin film wafer may be semiconductor nitride, semiconductor oxide, metal oxide, polymer material, graphite, graphene, or other suitable materials.

蓋體13則可拆卸地與主體11結合,以固定薄膜組件12。於一實施例中,蓋體13可相對於主體11旋轉而鎖合於主體11上並緊迫薄膜組件12,以防止樣品從容置槽111內洩露出來。詳細來說,參閱回圖1及圖2所示,支撐件121的邊緣可延伸至容置槽111的邊緣,而蓋體13可壓合支撐件121的邊緣以緊迫並固定薄膜組件12於主體11上。舉例而言,蓋體13以及主體11可分別設置相對應之螺紋,使蓋體13以及主體11能夠相對旋轉而鎖緊。於一實施例中,主體11以及支撐件121之間可設置一O形環14,以增加密封的效果。可以理解的是,蓋體13具有適當之開孔131,以避免阻擋支撐件121之第一通孔121d以及薄膜122之第二通孔122a。於一實施例中,蓋體13之材料可為不銹鋼。 The cover 13 is detachably combined with the main body 11 to fix the film assembly 12. In an embodiment, the cover 13 can rotate relative to the main body 11 to be locked on the main body 11 and tightly press the film assembly 12 to prevent the sample from leaking out of the accommodating groove 111. In detail, referring back to FIGS. 1 and 2, the edge of the supporting member 121 can extend to the edge of the accommodating groove 111, and the cover 13 can press the edge of the supporting member 121 to press and fix the film assembly 12 to the main body 11 on. For example, the cover body 13 and the main body 11 may be provided with corresponding screw threads, respectively, so that the cover body 13 and the main body 11 can be relatively rotated and locked. In an embodiment, an O-ring 14 may be disposed between the main body 11 and the support 121 to increase the sealing effect. It can be understood that the cover 13 has an appropriate opening 131 to avoid blocking the first through hole 121d of the support 121 and the second through hole 122a of the film 122. In an embodiment, the material of the cover 13 may be stainless steel.

依據上述結構,操作者能直接旋轉來卸除蓋體13,卸除蓋體13後即可更換薄膜組件12,因此,操作者能簡便地更換破損的薄膜12。此外,支撐件 121為一平板狀結構,薄膜122較為容易從支撐件121上取下,再黏貼新的薄膜122,因此,支撐件121能夠回收再利用,以進一步減少無法回收的耗材。 According to the above structure, the operator can directly rotate to remove the cover 13, and the film assembly 12 can be replaced after the cover 13 is removed. Therefore, the operator can easily replace the damaged film 12. In addition, the support 121 is a flat-plate structure, and the film 122 is relatively easy to remove from the support 121, and then the new film 122 is pasted. Therefore, the support 121 can be recycled and reused to further reduce unrecoverable consumables.

於一實施例中,第二通孔122a可為圓孔、方孔或狹長孔。可以理解的是,第二通孔122a為圓孔狀之薄膜122可承受較大之壓力。換言之,在相同壓力條件下,圓孔之孔徑可大於方孔之孔徑而不會導致薄膜122破損,因此,較大的圓孔可獲得較大的檢驗範圍。於一實施例中,第二通孔122a之側壁具有段差。換言之,如圖3所示,朝向支撐件12一側之第二通孔122a的開口較大,依據此結構,樣品所產生之背向散射帶電粒子可避免被薄膜122阻擋。 In one embodiment, the second through hole 122a may be a round hole, a square hole, or an elongated hole. It can be understood that the second through hole 122a is a circular hole-shaped film 122 that can withstand a relatively large pressure. In other words, under the same pressure conditions, the diameter of the round hole can be larger than the diameter of the square hole without causing damage to the membrane 122, therefore, a larger round hole can obtain a larger inspection range. In one embodiment, the side wall of the second through hole 122a has a step. In other words, as shown in FIG. 3, the opening of the second through hole 122a toward the support 12 is larger. According to this structure, the backscattering charged particles generated by the sample can be prevented from being blocked by the thin film 122.

於一實施例中,支撐件121之第二表面121b具有一第二凹槽121e。薄膜122則設置於第二凹槽121e內。需注意的是,第二凹槽121e之深度小於薄膜122之厚度。依據此結構,薄膜122略微突出於支撐件121之第二表面121b,以避免氣泡停留在第二通孔122a的位置而排擠樣品或影響檢驗。可以理解的是,在無需考量氣泡的情況下,例如觀察氣體樣品,則第二凹槽121e之深度可大於薄膜122之厚度,如圖12所示。於一實施例中,第二凹槽121e之形狀可為圓形、方形或端點為圓形之方形。 In one embodiment, the second surface 121b of the support member 121 has a second groove 121e. The film 122 is disposed in the second groove 121e. It should be noted that the depth of the second groove 121e is less than the thickness of the film 122. According to this structure, the film 122 slightly protrudes from the second surface 121b of the support 121 to avoid bubbles staying at the position of the second through hole 122a to squeeze out the sample or affect inspection. It can be understood that, without considering the bubbles, such as observing a gas sample, the depth of the second groove 121e may be greater than the thickness of the film 122, as shown in FIG. 12. In an embodiment, the shape of the second groove 121e may be a circle, a square, or a square whose endpoint is a circle.

請參照圖4,為了簡化圖式,圖4中未繪製O形環14。於一實施例中,容置槽111內可設置一載台112,其設置位置對應於薄膜122之第二通孔122a。由於帶電粒子束容易被液體吸收使得穿透深度較淺,因此,藉由設計適當高度之載台112,即可設定載台112至薄膜組件12之距離,以確保載台112上之樣品能夠被帶電粒子束轟擊,且樣品所產生之背向散射帶電粒子能夠穿透薄膜122而被偵測器所偵測。於一實施例中,容置槽111內可設置一流體入口113a以及一流體出口113b。流動態之樣品能夠經由流體入口113a進入容置槽111內,通過載台112進行檢驗後再經由流體出口113b排出。較佳者,流體入口113a以及流體出口113b至 薄膜組件12之距離大於載台112至薄膜組件12之距離。依據此結構,可避免在容置槽111之頂部產生氣泡。 Please refer to FIG. 4. In order to simplify the drawing, the O-ring 14 is not drawn in FIG. 4. In one embodiment, a stage 112 can be disposed in the receiving groove 111, and the mounting position corresponds to the second through hole 122a of the film 122. Because the charged particle beam is easily absorbed by the liquid and the penetration depth is relatively shallow, by designing the stage 112 with an appropriate height, the distance between the stage 112 and the thin film assembly 12 can be set to ensure that the sample on the stage 112 can be absorbed The charged particle beam is bombarded, and the backscattered charged particles generated by the sample can penetrate the thin film 122 and be detected by the detector. In an embodiment, a fluid inlet 113a and a fluid outlet 113b may be provided in the accommodating groove 111. The fluid sample can enter the accommodating tank 111 through the fluid inlet 113a, pass the stage 112 for inspection, and then be discharged through the fluid outlet 113b. Preferably, the fluid inlet 113a and the fluid outlet 113b to The distance between the film assembly 12 is greater than the distance between the stage 112 and the film assembly 12. According to this structure, the generation of air bubbles on the top of the accommodating groove 111 can be avoided.

請參照圖5,於一實施例中,載台112是以可拆卸的方式設置於容置槽111內。舉例而言,載台112下方設置一定位梢112a,以定位梢112a對正容置槽111內之槽孔,將載台112推入容置槽111內即可。依據此結構,操作者可更換不同高度之載台112,以調整載台112至薄膜組件12之距離。於一實施例中,載台112之周圍可設置一O形環14a,以防止樣品或流體進入容置槽111之底部。 Please refer to FIG. 5. In an embodiment, the stage 112 is detachably installed in the accommodating groove 111. For example, a positioning pin 112a is provided under the carrier 112, so that the positioning pin 112a is aligned with the slot in the receiving slot 111, and the carrier 112 can be pushed into the receiving slot 111. According to this structure, the operator can replace the stage 112 with different heights to adjust the distance between the stage 112 and the film assembly 12. In one embodiment, an O-ring 14a may be disposed around the stage 112 to prevent the sample or fluid from entering the bottom of the containing groove 111.

請參照圖6,於一實施例中,載台112包含一直立表面112b。舉例而言,載台112之頂面具有段差,如此即形成直立表面112b。依據此結構,樣品可站立抵靠於直立表面112b,以檢驗樣品之側面,例如觀察蝕刻液蝕刻樣品之深度。需注意者,直立表面112b不限定為垂直面,其亦可為一斜面,以利觀察不同角度之樣品。 Please refer to FIG. 6. In an embodiment, the stage 112 includes an upright surface 112 b. For example, the top surface of the stage 112 has a step, so that an upright surface 112b is formed. According to this structure, the sample can stand against the upright surface 112b to inspect the side of the sample, for example, to observe the depth of the etching liquid etching the sample. It should be noted that the upright surface 112b is not limited to a vertical plane, but it may also be an inclined plane to facilitate observation of samples at different angles.

請參照圖7,於一實施例中,載台112之下方可設置一推桿114,且推桿114延伸至容置槽111之外部。依據此結構,操作者可在不打開檢驗容器的情況下,利用推桿114來調整載台112之高度,亦即調整載台112至薄膜組件12之距離。舉例而言,推桿114具有一螺紋,操作者可利用適當之工具旋轉推桿114,以調整載台112至薄膜組件12之距離。於一實施例中,推桿114亦可利用電動方式驅動。 Please refer to FIG. 7. In an embodiment, a push rod 114 may be disposed under the stage 112, and the push rod 114 extends outside the accommodating groove 111. According to this structure, the operator can use the push rod 114 to adjust the height of the stage 112 without opening the inspection container, that is, the distance between the stage 112 and the film assembly 12. For example, the push rod 114 has a thread, and the operator can use a suitable tool to rotate the push rod 114 to adjust the distance between the stage 112 and the film assembly 12. In one embodiment, the push rod 114 can also be driven electrically.

請參照圖8,於一實施例中,檢驗容器可包含一樣品墊塊112c,其以可拆卸的方式設置於載台112之一頂表面。樣品墊塊112c可為一拋棄式元件,以用於檢驗高污染或不易清洗之樣品。或者,具有活性之生物樣本可在樣品墊塊112c上培養,之後將附有生物樣本之樣品墊塊112c置於載台112上觀察。可以理解的是,樣品墊塊112c亦可設置適當之圖案,以控制流體樣品之流動行為以利觀察。 Please refer to FIG. 8. In an embodiment, the inspection container may include a sample pad 112 c, which is detachably disposed on a top surface of the stage 112. The sample pad 112c may be a disposable component for testing highly contaminated or difficult-to-clean samples. Alternatively, the active biological sample can be cultured on the sample pad 112c, and then the sample pad 112c with the biological sample attached is placed on the stage 112 for observation. It can be understood that the sample pad 112c can also be provided with an appropriate pattern to control the flow behavior of the fluid sample for easy observation.

請參照圖9,於一實施例中,載台112具有一控溫流道115,其設置於載台112下方。控溫流體可從控溫流體入口113c流入控溫流道115以加熱或冷卻載台112上之樣品,再從控溫流體出口113d流出。控溫流體經加熱或冷卻可再流入控溫流道115形成一循環控溫系統。於一實施例中,控溫流道115內可設置一凸部115a,以使靠近樣品之控溫流道115頂端可充滿控溫流體。由圖9所示之實施例中可以看出,控溫流道115是由二個組件所構成,因此,設置O形環14b於適當位置以防止控溫流體洩露出來。 Please refer to FIG. 9. In one embodiment, the stage 112 has a temperature control flow channel 115, which is disposed below the stage 112. The temperature control fluid may flow into the temperature control flow channel 115 from the temperature control fluid inlet 113c to heat or cool the sample on the stage 112, and then flow out from the temperature control fluid outlet 113d. After heating or cooling, the temperature control fluid can flow into the temperature control flow channel 115 again to form a circulating temperature control system. In one embodiment, a convex portion 115a may be provided in the temperature control flow channel 115 so that the top of the temperature control flow channel 115 near the sample can be filled with temperature control fluid. It can be seen from the embodiment shown in FIG. 9 that the temperature control flow channel 115 is composed of two components. Therefore, the O-ring 14b is provided at an appropriate position to prevent the temperature control fluid from leaking out.

請參照圖10,於一實施例中,檢驗容器10可包含一控溫組件15,其設置於主體11之外側。控溫組件15可針對主體11或整個檢驗容器10進行直接加熱或冷卻,以控制樣品或檢驗環境之溫度。可以理解的是,控溫組件15能夠以較高的溫度從外部對主體11或整個檢驗容器10進行直接加熱,例如攝氏100度以上,甚至可達攝氏300度或以上。 Please refer to FIG. 10. In an embodiment, the inspection container 10 may include a temperature control component 15, which is disposed outside the main body 11. The temperature control assembly 15 can directly heat or cool the main body 11 or the entire inspection container 10 to control the temperature of the sample or the inspection environment. It can be understood that the temperature control assembly 15 can directly heat the main body 11 or the entire inspection container 10 from the outside at a relatively high temperature, for example, above 100 degrees Celsius, or even up to 300 degrees Celsius or above.

請參照圖13,本發明之一實施例之電子顯微鏡包含一檢驗腔室21、一帶電粒子束產生器22、一檢驗容器10以及一偵測器23。檢驗腔室21可定義出一真空環境。帶電粒子束產生器22與檢驗腔室21連接,以在檢驗腔室21產生一帶電粒子束221。檢驗容器10放置於檢驗腔室21中,以接受帶電粒子束221轟擊。檢驗容器10之詳細結構已如前所述,在此不再贅述。偵測器23則偵測樣品被帶電粒子束221轟擊之一響應222,並轉換為一電子訊號。可以理解的是,電子訊號經後續之訊號處理可形成一顯微影像或X光頻譜。舉例而言,偵測器23可為一帶電粒子偵測器,以偵測來自樣品之背向散射帶電粒子。或者,偵測器23可為一元素頻譜偵測器,以偵測帶電粒子束221轟擊樣品後所發出的X光訊號。電子顯微鏡之其它功能元件,例如訊號處理器、電源供應器,已為本發明所屬技術領域之通常知識者所熟知,且非為本發明之主要技術特徵,故在此不再贅述。 Referring to FIG. 13, an electron microscope according to an embodiment of the present invention includes an inspection chamber 21, a charged particle beam generator 22, an inspection container 10, and a detector 23. The inspection chamber 21 may define a vacuum environment. The charged particle beam generator 22 is connected to the inspection chamber 21 to generate a charged particle beam 221 in the inspection chamber 21. The inspection container 10 is placed in the inspection chamber 21 to receive the bombardment of the charged particle beam 221. The detailed structure of the inspection container 10 has already been described above and will not be repeated here. The detector 23 detects a response 222 of the sample being bombarded by the charged particle beam 221, and converts it into an electronic signal. It can be understood that the electronic signal can form a microscopic image or X-ray spectrum after subsequent signal processing. For example, the detector 23 may be a charged particle detector to detect backscattered charged particles from the sample. Alternatively, the detector 23 may be an elemental spectrum detector to detect the X-ray signal emitted by the charged particle beam 221 after bombarding the sample. The other functional components of the electron microscope, such as the signal processor and the power supply, are well known to those of ordinary skill in the technical field to which the present invention belongs, and are not the main technical features of the present invention, so they will not be repeated here.

另需說明的是,前述實施例是將薄膜組件12應用於密封檢驗容器10。然而,本發明之薄膜組件亦可應用密封包含帶電粒子束產生器之腔室。舉例而言,包含帶電粒子束產生器之腔室具有類似檢驗容器之主體的鎖固結構,薄膜組件12再以類似檢驗容器之蓋體之結構固定於腔室即可密封腔室。依據此結構,樣品即可在開放空間進行檢驗。 It should be further noted that the foregoing embodiment applies the film assembly 12 to the sealed inspection container 10. However, the thin film module of the present invention can also be used to seal a chamber containing a charged particle beam generator. For example, the chamber containing the charged particle beam generator has a locking structure similar to the main body of the inspection container, and the membrane assembly 12 is then fixed to the chamber with a structure similar to the lid of the inspection container to seal the chamber. According to this structure, the sample can be inspected in the open space.

綜合上述,本發明之薄膜組件、檢驗容器以及電子顯微鏡是以平板狀之支撐件固定薄膜,因此,薄膜破損或髒污後,操作者不僅易於更換薄膜組件,且僅會產生較少量的耗材。較佳者,支撐件可再回收利用,以進一步減少耗材。 In summary, the thin film assembly, inspection container and electron microscope of the present invention fix the thin film with a flat support. Therefore, after the thin film is damaged or dirty, the operator not only easily replaces the thin film assembly, but also produces less consumables . Preferably, the support can be recycled to further reduce consumables.

以上所述之實施例僅是為說明本發明之技術思想及特點,其目的在使熟習此項技藝之人士能夠瞭解本發明之內容並據以實施,當不能以之限定本發明之專利範圍,即大凡依本發明所揭示之精神所作之均等變化或修飾,仍應涵蓋在本發明之專利範圍內。 The above-mentioned embodiments are only to illustrate the technical ideas and features of the present invention, and its purpose is to enable those skilled in the art to understand the content of the present invention and implement it accordingly, but cannot limit the patent scope of the present invention, That is to say, any equivalent changes or modifications made in accordance with the spirit disclosed by the present invention should still be covered by the patent scope of the present invention.

10‧‧‧檢驗容器 10‧‧‧ Inspection container

11‧‧‧主體 11‧‧‧Main

111‧‧‧容置槽 111‧‧‧Accommodation slot

12‧‧‧薄膜組件 12‧‧‧Thin film module

121‧‧‧支撐件 121‧‧‧Support

121a‧‧‧第一表面 121a‧‧‧First surface

121b‧‧‧第二表面 121b‧‧‧Second surface

121c‧‧‧第一凹槽 121c‧‧‧First groove

13‧‧‧蓋體 13‧‧‧cover

131‧‧‧開孔 131‧‧‧opening

14‧‧‧O形環 14‧‧‧O-ring

Claims (22)

一種薄膜組件,包含:一支撐件,其具有一第一表面以及相對之一第二表面,其中該支撐件為平板狀,且具有一第一通孔,其貫穿該第一表面以及該第二表面,該支撐件的材料為金屬、金屬化合物、或高分子材料之至少其中之一;以及一薄膜,其設置於該支撐件之該第二表面側,且具有一第二通孔,其中該第二通孔對應於該第一通孔,且該第二通孔可供一帶電粒子束通過。 A film assembly includes: a support member having a first surface and an opposite second surface, wherein the support member is flat and has a first through hole that penetrates the first surface and the second surface Surface, the material of the support member is at least one of metal, metal compound, or polymer material; and a thin film, which is disposed on the second surface side of the support member and has a second through hole, wherein the The second through hole corresponds to the first through hole, and the second through hole can pass a charged particle beam. 如請求項1所述之薄膜組件,其中該支撐件具有一薄化區域,其涵蓋該第一通孔,以降低該第一通孔之側壁高度。 The thin film assembly according to claim 1, wherein the support member has a thinned area covering the first through hole to reduce the height of the side wall of the first through hole. 如請求項1所述之薄膜組件,其中該第一通孔之側壁高度與該第一通孔之寬度之比值小於等於0.7。 The thin film assembly according to claim 1, wherein the ratio of the height of the side wall of the first through hole to the width of the first through hole is 0.7 or less. 如請求項1所述之薄膜組件,其中該支撐件之該第二表面具有一第二凹槽,該薄膜設置於該第二凹槽內,且該第二凹槽之深度小於該薄膜之厚度。 The film assembly according to claim 1, wherein the second surface of the support member has a second groove, the film is disposed in the second groove, and the depth of the second groove is less than the thickness of the film . 如請求項4所述之薄膜組件,其中該第二凹槽之形狀為圓形、方形或端點為圓形之方形。 The thin-film device according to claim 4, wherein the second groove has a circular shape, a square shape, or an endpoint having a circular shape. 如請求項1所述之薄膜組件,其中該第二通孔之側壁具有段差。 The thin film assembly according to claim 1, wherein the side wall of the second through hole has a step. 如請求項1所述之薄膜組件,其中該第二通孔為圓孔、方孔或狹長孔。 The thin film assembly according to claim 1, wherein the second through hole is a round hole, a square hole or an elongated hole. 一種檢驗容器,其放置於一電子顯微鏡之一檢驗腔室以檢驗該檢驗容器中之一樣品,其中該檢驗容器包含: 一主體,其具有一容置槽以容置該樣品;一薄膜組件,其覆蓋該容置槽之一開口端,其中該薄膜組件包含:一支撐件,其具有一第一表面以及相對之一第二表面,其中該支撐件為平板狀,且具有一第一通孔,其貫穿該第一表面以及該第二表面,該支撐件的材料為金屬、金屬化合物、或高分子材料之至少其中之一,且該支撐件之邊緣延伸至該容置槽之邊緣;以及一薄膜,其設置於該支撐件之該第二表面側,且具有一第二通孔,其中該第二通孔對應於該第一通孔,且該第二通孔可供一帶電粒子束通過;以及一蓋體,其可拆卸地與該主體結合,該蓋體壓合該支撐件之邊緣以緊迫並固定該薄膜組件於該主體上。 An inspection container placed in an inspection chamber of an electron microscope to inspect a sample in the inspection container, wherein the inspection container includes: A main body, which has an accommodating groove for accommodating the sample; a thin film component, which covers an open end of the accommodating groove, wherein the thin film component includes: a support member, which has a first surface and an opposite one The second surface, wherein the support member is in the shape of a flat plate, and has a first through hole that penetrates the first surface and the second surface, and the material of the support member is at least one of metal, metal compound, or polymer material One, and the edge of the support member extends to the edge of the accommodating groove; and a film, which is disposed on the second surface side of the support member and has a second through hole, wherein the second through hole corresponds to In the first through hole, and the second through hole allows a charged particle beam to pass through; and a cover body, which is detachably combined with the main body, the cover body presses the edge of the support member to tightly and secure the The film assembly is on the main body. 如請求項8所述之檢驗容器,其中該支撐件具有一薄化區域,其涵蓋該第一通孔,以降低該第一通孔之側壁高度。 The inspection container according to claim 8, wherein the support member has a thinned area covering the first through hole to reduce the height of the side wall of the first through hole. 如請求項8所述之檢驗容器,其中該第一通孔之側壁高度與該第一通孔之寬度之比值小於等於0.7。 The inspection container according to claim 8, wherein the ratio of the height of the side wall of the first through hole to the width of the first through hole is 0.7 or less. 如請求項8所述之檢驗容器,其中該支撐件之該第二表面具有一第二凹槽,該薄膜設置於該第二凹槽內,且該第二凹槽之深度小於該薄膜之厚度。 The inspection container according to claim 8, wherein the second surface of the support member has a second groove, the film is disposed in the second groove, and the depth of the second groove is less than the thickness of the film . 如請求項8所述之檢驗容器,其中該第二通孔之側壁具有段差。 The inspection container according to claim 8, wherein the side wall of the second through hole has a step. 如請求項8所述之檢驗容器,其中該蓋體相對於該主體旋轉,以鎖合於該主體。 The inspection container according to claim 8, wherein the lid body is rotated relative to the main body to lock with the main body. 如請求項8所述之檢驗容器,其中該容置槽具有一載台,其設置位置對應於該第二通孔。 The inspection container according to claim 8, wherein the accommodating groove has a carrier, and the installation position thereof corresponds to the second through hole. 如請求項14所述之檢驗容器,其中該容置槽具有一流體入口以及一流體出口,且該流體入口以及該流體出口至該薄膜組件之距離大於該載台至該薄膜組件之距離。 The inspection container according to claim 14, wherein the accommodating tank has a fluid inlet and a fluid outlet, and the distance between the fluid inlet and the fluid outlet and the film assembly is greater than the distance from the stage to the film assembly. 如請求項14所述之檢驗容器,其中該載台可拆卸地設置於該容置槽內。 The inspection container according to claim 14, wherein the carrier is detachably disposed in the accommodating groove. 如請求項14所述之檢驗容器,其中該載台具有一直立表面,以供該樣品站立抵靠於該直立表面。 The inspection container according to claim 14, wherein the stage has an upright surface for the sample to stand against the upright surface. 如請求項14所述之檢驗容器,其中該載台至該薄膜組件之距離為可調整的。 The inspection container according to claim 14, wherein the distance from the stage to the film assembly is adjustable. 如請求項14所述之檢驗容器,更包含:一樣品墊塊,其可拆卸地設置於該載台之一頂表面。 The inspection container according to claim 14, further comprising: a sample pad, which is detachably disposed on a top surface of the stage. 如請求項14所述之檢驗容器,其中該載台具有一控溫流道,以供一控溫流體於該控溫流道內流動。 The inspection container according to claim 14, wherein the stage has a temperature control flow channel for a temperature control fluid to flow in the temperature control flow channel. 如請求項8所述之檢驗容器,更包含一控溫組件,其設置於該主體之外側。 The inspection container according to claim 8 further includes a temperature control component, which is disposed outside the main body. 一種電子顯微鏡,包含:一檢驗腔室,其定義出一真空環境;一帶電粒子束產生器,其與該檢驗腔室連接,用以於該檢驗腔室產生一帶電粒子束;一檢驗容器,其放置於該檢驗腔室中,以接受該帶電粒子束轟擊,其中該檢驗容器包含:一主體,其具有一容置槽以容置一樣品;一薄膜組件,其覆蓋該容置槽之一開口端,其中該薄膜組件包含: 一支撐件,其具有一第一表面以及相對之一第二表面,其中該支撐件為平板狀,且具有一第一通孔,其貫穿該第一表面以及該第二表面,該支撐件的材料為金屬、金屬化合物、或高分子材料之至少其中之一,且該支撐件之邊緣延伸至該容置槽之邊緣;以及一薄膜,其設置於該支撐件之該第二表面側,且具有一第二通孔,其中該第二通孔對應於該第一通孔,且該第二通孔可供該帶電粒子束通過,以轟擊該樣品;以及一蓋體,其可拆卸地與該主體結合,該蓋體壓合該支撐件之邊緣以緊迫並固定該薄膜組件於該主體上;以及一偵測器,其用以偵測該樣品被該帶電粒子束轟擊之一響應,並轉換為一電子訊號。 An electron microscope includes: an inspection chamber that defines a vacuum environment; a charged particle beam generator connected to the inspection chamber for generating a charged particle beam in the inspection chamber; and an inspection container, It is placed in the inspection chamber to receive the bombardment of the charged particle beam, wherein the inspection container includes: a main body with an accommodating groove for accommodating a sample; and a thin film component covering one of the accommodating grooves Open end, where the membrane assembly contains: A support member has a first surface and an opposite second surface, wherein the support member is flat and has a first through hole, which penetrates the first surface and the second surface, the support member The material is at least one of a metal, a metal compound, or a polymer material, and the edge of the support extends to the edge of the receiving groove; and a thin film is disposed on the second surface side of the support, and Has a second through-hole, wherein the second through-hole corresponds to the first through-hole, and the second through-hole allows the charged particle beam to pass through to bombard the sample; and a cover body, which is detachably connected The main body is combined, the cover body presses the edge of the support to tightly fix the thin film assembly on the main body; and a detector for detecting a response of the sample bombarded by the charged particle beam, and Converted to an electronic signal.
TW107142752A 2018-02-23 2018-11-29 Membrane assembly, examination container and electron microscope TWI688984B (en)

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