TWI685097B - Microled display and a method of forming the same - Google Patents

Microled display and a method of forming the same Download PDF

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TWI685097B
TWI685097B TW108103876A TW108103876A TWI685097B TW I685097 B TWI685097 B TW I685097B TW 108103876 A TW108103876 A TW 108103876A TW 108103876 A TW108103876 A TW 108103876A TW I685097 B TWI685097 B TW I685097B
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micro
flat layer
diode display
item
forming
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TW108103876A
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TW202030878A (en
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李杏櫻
吳炳昇
莊士緯
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啟端光電股份有限公司
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Abstract

A method of forming a micro light-emitting diode (microLED) display includes providing a substrate with a plurality of microLEDs and at least one integrated circuit disposed thereon; and forming a planarization layer to cover the microLEDs and the at least one integrated circuit. The planarization layer acts as both a light blocking layer and a corrosion-resistant layer.

Description

微發光二極體顯示器及其形成方法Micro-luminous diode display and forming method thereof

本發明係有關一種微發光二極體,特別是關於一種形成微發光二極體顯示器的方法。The present invention relates to a micro-luminescence diode, in particular to a method of forming a micro-luminescence diode display.

微發光二極體(microLED、mLED或μLED)顯示面板為平板顯示器(flat panel display)的一種,其係由尺寸等級為1~10微米之個別精微(microscopic)發光二極體所組成。相較於傳統液晶顯示面板,微發光二極體顯示面板具較大對比度及較快反應時間,且消耗較少功率。微發光二極體與有機發光二極體(OLED)雖然同樣具有低功耗的特性,但是,微發光二極體因為使用三-五族二極體技術(例如氮化鎵),因此相較於有機發光二極體具有較高的亮度(brightness)、較高的發光效能(luminous efficacy)及較長的壽命。A micro-luminescent diode (microLED, mLED or μLED) display panel is a type of flat panel display, which is composed of individual microscopic light-emitting diodes with a size level of 1-10 microns. Compared with traditional liquid crystal display panels, micro light-emitting diode display panels have greater contrast and faster response time, and consume less power. Although micro-emitting diodes and organic light-emitting diodes (OLEDs) also have the characteristics of low power consumption, micro-emitting diodes use three- to five-group diode technology (such as gallium nitride), so they are compared The organic light-emitting diodes have higher brightness, higher luminous efficacy and longer life.

第一圖顯示傳統微發光二極體顯示器100的剖面圖,於玻璃基板11上設有微發光二極體12與積體電路13。第一保護層14形成於積體電路13上,且第二保護層15全面形成於微發光二極體12與積體電路13上。由於積體電路13的高度(例如150微米)通常高於微發光二極體12的高度(例如小於10微米),因此微發光二極體顯示器100的上表面具有尖銳對比輪廓。當翻轉微發光二極體顯示器100,對其背面進行後續製程時,此尖銳對比輪廓會造成不均勻的壓力。因此,玻璃基板11易破裂或/且積體電路13會因壓力受到損害。The first figure shows a cross-sectional view of a conventional micro-light emitting diode display 100, on which a micro-light emitting diode 12 and an integrated circuit 13 are provided on a glass substrate 11. The first protective layer 14 is formed on the integrated circuit 13, and the second protective layer 15 is entirely formed on the micro-light emitting diode 12 and the integrated circuit 13. Since the height of the integrated circuit 13 (for example, 150 micrometers) is generally higher than the height of the microluminescent diode 12 (for example, less than 10 micrometers), the upper surface of the microluminescent diode display 100 has a sharp contrast profile. When the micro-luminescent diode display 100 is turned over and the subsequent process is performed on the back side, this sharp contrast profile may cause uneven pressure. Therefore, the glass substrate 11 is easily broken or/and the integrated circuit 13 is damaged due to pressure.

因此亟需提出一種新穎的方法以形成微發光二極體顯示器,以克服傳統微發光二極體顯示器的缺失。Therefore, there is an urgent need to propose a novel method to form a micro light-emitting diode display to overcome the lack of the traditional micro-light emitting diode display.

鑑於上述,本發明實施例的目的之一在於提出一種形成微發光二極體顯示器的方法,其具有簡化製程或/且具平坦上表面。In view of the above, one of the objects of the embodiments of the present invention is to provide a method for forming a micro-luminescent diode display, which has a simplified process or/and has a flat upper surface.

根據本發明實施例,形成微發光二極體顯示器的方法包含以下步驟。提供基板,其上設有複數微發光二極體與至少一積體電路。形成平坦層以覆蓋微發光二極體與積體電路。平坦層作為遮光層及防腐蝕層。According to an embodiment of the present invention, a method of forming a micro light-emitting diode display includes the following steps. A substrate is provided, on which a plurality of micro light-emitting diodes and at least one integrated circuit are provided. A flat layer is formed to cover the micro-emitting diode and the integrated circuit. The flat layer serves as a light shielding layer and an anti-corrosion layer.

第二A圖至第四B圖之剖面圖與俯視圖顯示本發明實施例之形成微發光二極體顯示器200的方法。The cross-sectional views and top views of the second to fourth B diagrams show the method of forming the micro-luminescent diode display 200 according to an embodiment of the present invention.

如第二A圖之剖面圖與第二B圖之俯視圖所示,提供基板21,其上設有微發光二極體22與至少一積體電路23。基板21可包含玻璃或其他適於支持微發光二極體22與積體電路23的材質。積體電路23可為驅動器,可使用玻璃晶片接合(chip-on-glass, COG)技術設於基板21上。雖然圖式僅顯示數個微發光二極體22,然而基板21上通常會設有非常多的微發光二極體22。在本實施例中,積體電路23的高度(例如150微米)遠大於微發光二極體21的高度(例如小於10微米)。As shown in the cross-sectional view of FIG. 2A and the top view of FIG. 2B, a substrate 21 is provided, on which a micro-luminescent diode 22 and at least one integrated circuit 23 are provided. The substrate 21 may include glass or other materials suitable for supporting the micro-luminescent diode 22 and the integrated circuit 23. The integrated circuit 23 may be a driver, and may be provided on the substrate 21 using glass-on-glass (COG) technology. Although the figure only shows a few micro-emitting diodes 22, there are usually a large number of micro-emitting diodes 22 on the substrate 21. In this embodiment, the height of the integrated circuit 23 (for example, 150 microns) is much larger than the height of the micro-emitting diode 21 (for example, less than 10 microns).

導光層221可覆蓋微發光二極體22,以利傳送微發光二極體22所產生的光線。反射層222(例如金屬)可覆蓋導光層221,以反射微發光二極體22所產生的光線。The light guide layer 221 may cover the micro-luminescent diode 22 to facilitate the transmission of light generated by the micro-luminescent diode 22. The reflective layer 222 (eg, metal) may cover the light guide layer 221 to reflect the light generated by the micro-luminescent diode 22.

如第三A圖之剖面圖與第三B圖之俯視圖所示,可形成框膠(seal frame或sealant)24於基板21上,以圍住基板21上的至少一部分微發光二極體22與積體電路23。在本實施例中,框膠24為矩形,可設於基板21的周圍,且框膠24包含第一膠材(例如有機聚合物(polymer))。本實施例之框膠24可為封閉且連續無間斷。根據本實施例的特徵之一,框膠24的高度大於積體電路23的高度。As shown in the cross-sectional view of FIG. 3A and the top view of FIG. 3B, a seal frame (sealant) 24 may be formed on the substrate 21 to surround at least a portion of the micro-luminescent diode 22 and Integrated circuit 23. In this embodiment, the sealant 24 is rectangular and can be disposed around the substrate 21, and the sealant 24 includes a first glue material (such as an organic polymer). The sealant 24 in this embodiment may be closed and continuous without interruption. According to one of the features of this embodiment, the height of the sealant 24 is greater than the height of the integrated circuit 23.

如第四A圖之剖面圖與第四B圖之俯視圖所示,框膠24所定義的內部空間可填充第二膠材(例如環氧樹脂(epoxy)或矽氧樹脂基(silicone-based)膠材),以形成平坦層25(其具有平坦上表面),其覆蓋微發光二極體22與積體電路23。平坦層25的高度大於積體電路23的高度,但小於框膠24的高度。在本實施例中,平坦層25的第二膠材可異於框膠24的第一膠材。平坦層25(或填充的第二膠材)的黏度(viscosity)小於框膠24(或填充的第一膠材)的黏度。根據本實施例的另一特徵,平坦層25(或填充的第二膠材)的(液態至固態之)縮合性(degree of condensation)足夠小,以免膠材於乾燥過程內縮,導致基板21(例如玻璃基板)變形或破裂。As shown in the cross-sectional view of the fourth diagram A and the top view of the fourth diagram B, the internal space defined by the frame glue 24 can be filled with a second glue material (such as epoxy or silicone-based) Glue) to form a flat layer 25 (which has a flat upper surface), which covers the micro-luminescent diode 22 and the integrated circuit 23. The height of the flat layer 25 is greater than the height of the integrated circuit 23, but smaller than the height of the sealant 24. In this embodiment, the second glue material of the flat layer 25 may be different from the first glue material of the sealant 24. The viscosity of the flat layer 25 (or the filled second glue) is less than the viscosity of the sealant 24 (or the filled first glue). According to another feature of this embodiment, the degree of condensation (liquid to solid) of the flat layer 25 (or the filled second glue material) is sufficiently small to prevent the glue material from shrinking during the drying process, resulting in the substrate 21 (E.g. glass substrate) deformed or broken.

值得注意的是,如果平坦層25夠黏稠(viscous),足以自限於預設空間(不會向外流動),以覆蓋微發光二極體22與積體電路23,則可以省略框膠24。It is worth noting that if the flat layer 25 is viscous enough to limit itself to a predetermined space (which does not flow outward) to cover the micro-luminescent diode 22 and the integrated circuit 23, the sealant 24 can be omitted.

根據本實施例的又一特徵,平坦層25摻雜暗色或黑色染料,使其形成暗色或黑色,作為遮光(light blocking)層以防止光線照射積體電路23。平坦層25還可作為防水(waterproof)層,以防止積體電路23受到水氣的影響。在本實施例中,平坦層25(或所填充的第二膠材)可包含模壓(molding compound)材質(例如矽氧樹脂(silicone))。According to still another feature of this embodiment, the flat layer 25 is doped with a dark or black dye to form a dark or black color as a light blocking layer to prevent light from irradiating the integrated circuit 23. The flat layer 25 can also serve as a waterproof layer to prevent the integrated circuit 23 from being affected by moisture. In this embodiment, the flat layer 25 (or the filled second glue material) may include a molding compound material (for example, silicone).

根據本實施例的再一特徵,平坦層25(或所填充的第二膠材)可作為防腐蝕(corrosion-resistant)層,以防止反射層222受到水氣或/且氧化的腐蝕。在本實施例中,平坦層25可包含室溫硫化(room-temperature-vulcanizing, RTV)材質,例如室溫硫化矽氧樹脂(RTV silicone)。According to yet another feature of this embodiment, the flat layer 25 (or the filled second glue material) can serve as a corrosion-resistant layer to prevent the reflective layer 222 from being corroded by moisture or/and oxidation. In this embodiment, the flat layer 25 may include room-temperature-vulcanizing (RTV) materials, such as RTV silicone.

根據上述實施例,形成微發光二極體顯示器200的方法較第一圖所示傳統方法來得簡化。在本實施例中,使用單一製程步驟形成單一層(亦即平坦層25),以覆蓋微發光二極體22與積體電路23。反觀第一圖,其使用二製程步驟以形成二層(亦即第一保護層14與第二保護層15)。此外,如第四A圖所示,本實施例所形成的微發光二極體顯示器200具有平坦上表面,然而第一圖的上表面具有尖銳的對比輪廓,因此會造成不均勻壓力。藉此,本實施例之基板21(例如玻璃基板)不易破裂或/且積體電路23不會因壓力受到損害。According to the above embodiment, the method of forming the micro-luminescent diode display 200 is simplified compared to the conventional method shown in the first figure. In this embodiment, a single process step is used to form a single layer (that is, a flat layer 25) to cover the micro light-emitting diode 22 and the integrated circuit 23. Looking back at the first image, it uses two process steps to form two layers (ie, the first protective layer 14 and the second protective layer 15). In addition, as shown in the fourth diagram A, the micro-luminescent diode display 200 formed in this embodiment has a flat upper surface, but the upper surface of the first diagram has a sharp contrasting contour, thus causing uneven pressure. Therefore, the substrate 21 (such as a glass substrate) of the present embodiment is not easily broken or/and the integrated circuit 23 is not damaged by pressure.

以上所述僅為本發明之較佳實施例而已,並非用以限定本發明之申請專利範圍;凡其它未脫離發明所揭示之精神下所完成之等效改變或修飾,均應包含在下述之申請專利範圍內。The above are only the preferred embodiments of the present invention and are not intended to limit the scope of the patent application of the present invention; all other equivalent changes or modifications made without departing from the spirit of the invention should be included in the following Within the scope of patent application.

100‧‧‧微發光二極體顯示器 11‧‧‧玻璃基板 12‧‧‧微發光二極體 13‧‧‧積體電路 14‧‧‧第一保護層 15‧‧‧第二保護層 200‧‧‧微發光二極體顯示器 21‧‧‧基板 22‧‧‧微發光二極體 221‧‧‧導光層 222‧‧‧反射層 23‧‧‧積體電路 24‧‧‧框膠 25‧‧‧平坦層 100‧‧‧Micro LED display 11‧‧‧Glass substrate 12‧‧‧Microluminescence diode 13‧‧‧Integrated circuit 14‧‧‧The first protective layer 15‧‧‧Second protective layer 200‧‧‧Micro LED display 21‧‧‧ substrate 22‧‧‧Microluminescence diode 221‧‧‧Light guide layer 222‧‧‧Reflective layer 23‧‧‧Integrated circuit 24‧‧‧ frame glue 25‧‧‧flat layer

第一圖顯示傳統微發光二極體顯示器的剖面圖,於玻璃基板上設有微發光二極體與積體電路。 第二A圖至第四B圖之剖面圖與俯視圖顯示本發明實施例之形成微發光二極體顯示器的方法。 The first figure shows a cross-sectional view of a conventional micro-luminescence diode display, which is provided with a micro-luminescence diode and an integrated circuit on a glass substrate. The cross-sectional view and the top view of the second to fourth B diagrams show a method of forming a micro light-emitting diode display according to an embodiment of the present invention.

200‧‧‧微發光二極體顯示器 200‧‧‧Micro LED display

21‧‧‧基板 21‧‧‧ substrate

22‧‧‧微發光二極體 22‧‧‧Microluminescence diode

221‧‧‧導光層 221‧‧‧Light guide layer

222‧‧‧反射層 222‧‧‧Reflective layer

23‧‧‧積體電路 23‧‧‧Integrated circuit

24‧‧‧框膠 24‧‧‧ frame glue

25‧‧‧平坦層 25‧‧‧flat layer

Claims (18)

一種形成微發光二極體顯示器的方法,包含:提供一基板,其上設有複數微發光二極體與至少一積體電路;及形成一平坦層以覆蓋該些微發光二極體與該至少一積體電路;其中該平坦層作為遮光層及防腐蝕層;其中該積體電路的高度大於該些微發光二極體的高度;其中該平坦層包含暗色或黑色染料,作為遮光層以防止該些微發光二極體的光線照射該積體電路。 A method for forming a micro-luminous diode display includes: providing a substrate on which a plurality of micro-luminous diodes and at least one integrated circuit are provided; and forming a flat layer to cover the micro-luminous diodes and the at least one An integrated circuit; wherein the flat layer serves as a light-shielding layer and an anti-corrosion layer; wherein the height of the integrated circuit is greater than the height of the micro-emitting diodes; wherein the flat layer contains dark or black dyes as a light-shielding layer to prevent the Light from some micro-emitting diodes illuminates the integrated circuit. 根據申請專利範圍第1項所述形成微發光二極體顯示器的方法,其中該基板包含玻璃。 The method for forming a microluminescent diode display according to item 1 of the patent application scope, wherein the substrate includes glass. 根據申請專利範圍第1項所述形成微發光二極體顯示器的方法,其中該平坦層包含室溫硫化材質。 The method for forming a micro-luminescent diode display according to item 1 of the patent application scope, wherein the flat layer includes a room temperature vulcanization material. 根據申請專利範圍第1項所述形成微發光二極體顯示器的方法,其中該平坦層包含環氧樹脂或矽氧樹脂基膠材。 The method for forming a microluminescent diode display according to item 1 of the patent application scope, wherein the flat layer comprises epoxy resin or silicone resin-based glue. 根據申請專利範圍第1項所述形成微發光二極體顯示器的方法,其中該平坦層包含模壓材質。 The method for forming a micro-luminescent diode display according to item 1 of the patent application scope, wherein the flat layer includes a molded material. 根據申請專利範圍第1項所述形成微發光二極體顯示器的方法,更包含:於形成該平坦層之前,形成一框膠以圍住該基板上的該些微發光二極體與該至少一積體電路,該框膠的高度大於該平坦層與該積體電路的高度。 The method for forming a micro light-emitting diode display according to item 1 of the scope of the patent application further includes: before forming the flat layer, forming a sealant to surround the micro-light emitting diodes and the at least one on the substrate In an integrated circuit, the height of the sealant is greater than the height of the flat layer and the integrated circuit. 根據申請專利範圍第6項所述形成微發光二極體顯示器的方法,其中該平坦層的黏度小於該框膠的黏度。 The method for forming a micro-luminescent diode display according to item 6 of the patent application scope, wherein the viscosity of the flat layer is less than the viscosity of the sealant. 根據申請專利範圍第1項所述形成微發光二極體顯示器的方法,更包含:於形成該平坦層之前,形成一導光層以覆蓋該些微發光二極體;及形成一反射層於該導光層上。 The method for forming a microluminescent diode display according to item 1 of the scope of the patent application further includes: before forming the flat layer, forming a light guide layer to cover the microluminescent diodes; and forming a reflective layer on the On the light guide layer. 根據申請專利範圍第1項所述形成微發光二極體顯示器的方法,其中該平坦層所使用的縮合性使得該平坦層於乾燥過程,該基板不會變形或破裂。 The method for forming a micro-luminescent diode display according to item 1 of the scope of the patent application, wherein the condensability of the flat layer is such that the flat layer is not deformed or cracked during the drying process. 一種微發光二極體顯示器,包含:一基板;複數微發光二極體與至少一積體電路,設於該基板上;及一平坦層,覆蓋該些微發光二極體與該至少一積體電路;其中該平坦層作為遮光層及防腐蝕層;其中該積體電路的高度大於該些微發光二極體的高度;其中該平坦層包含暗色或黑色染料,作為遮光層以防止該些微發光二極體的光線照射該積體電路。 A micro-luminescence diode display, comprising: a substrate; a plurality of micro-luminescence diodes and at least one integrated circuit, arranged on the substrate; and a flat layer covering the micro-luminescence diodes and the at least one integrated body Circuit; wherein the flat layer serves as a light-shielding layer and an anti-corrosion layer; wherein the height of the integrated circuit is greater than the height of the micro-emitting diodes; wherein the flat layer contains dark or black dyes as a light-shielding layer to prevent the micro-light emitting two Light from the polar body illuminates the integrated circuit. 根據申請專利範圍第10項所述之微發光二極體顯示器,其中該基板包含玻璃。 The micro light emitting diode display according to item 10 of the patent application scope, wherein the substrate comprises glass. 根據申請專利範圍第10項所述之微發光二極體顯示器,其中該平坦層包含室溫硫化材質。 The micro light emitting diode display according to item 10 of the patent application scope, wherein the flat layer includes a room temperature vulcanization material. 根據申請專利範圍第10項所述之微發光二極體顯示器,其中該平坦層包含環氧樹脂或矽氧樹脂基膠材。 The micro light emitting diode display according to item 10 of the patent application scope, wherein the flat layer comprises an epoxy resin or a silicone resin-based glue material. 根據申請專利範圍第10項所述之微發光二極體顯示器,其中該平坦層包含模壓材質。 The micro light-emitting diode display according to item 10 of the patent application scope, wherein the flat layer comprises a molded material. 根據申請專利範圍第10項所述之微發光二極體顯示器,更包含:一框膠,設於該基板上以圍住該些微發光二極體、該至少一積體電路與該平坦層,該框膠的高度大於該平坦層與該積體電路的高度。 The micro light-emitting diode display according to item 10 of the scope of the patent application further includes: a frame glue disposed on the substrate to enclose the micro-light emitting diodes, the at least one integrated circuit and the flat layer, The height of the sealant is greater than the height of the flat layer and the integrated circuit. 根據申請專利範圍第15項所述之微發光二極體顯示器,其中該平坦層的黏度小於該框膠的黏度。 The micro light-emitting diode display according to item 15 of the patent application scope, wherein the viscosity of the flat layer is less than the viscosity of the sealant. 根據申請專利範圍第10項所述之微發光二極體顯示器,更包含:一導光層,形成於該些微發光二極體上,但位於該平坦層下;及一反射層,形成於該導光層與該平坦層之間。 The micro light emitting diode display according to item 10 of the patent application scope further includes: a light guide layer formed on the micro light emitting diodes but under the flat layer; and a reflective layer formed on the Between the light guide layer and the flat layer. 根據申請專利範圍第10項所述之微發光二極體顯示器,其中該平坦層所使用的縮合性使得該平坦層於乾燥過程,該基板不會變形或破裂。 The micro light-emitting diode display according to item 10 of the patent application range, wherein the condensation property of the flat layer is such that the flat layer will not be deformed or cracked during the drying process.
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