TWI684071B - Exposure equipment - Google Patents

Exposure equipment Download PDF

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Publication number
TWI684071B
TWI684071B TW107122537A TW107122537A TWI684071B TW I684071 B TWI684071 B TW I684071B TW 107122537 A TW107122537 A TW 107122537A TW 107122537 A TW107122537 A TW 107122537A TW I684071 B TWI684071 B TW I684071B
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Taiwan
Prior art keywords
drawing platform
support arms
machine body
exposure
assembly
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TW107122537A
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Chinese (zh)
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TW202001430A (en
Inventor
呂俊賢
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志聖工業股份有限公司
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Priority to TW107122537A priority Critical patent/TWI684071B/en
Publication of TW202001430A publication Critical patent/TW202001430A/en
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Abstract

An exposure equipment includes a machine body and two support arms. The machine body includes an exposure unit and a pull-out platform. The pull-out platform is capable of moving relative to the machine body. When the pull-out platform is pulled out of the machine body, the pull-out platform can be correspondingly disposed on the two support arms, and the pull-out platform can rotate relative to the two support arms via pivotal components disposed on the two support arms. After rotating, the pull-out platform enables a user to easily perform a cleaning operation.

Description

曝光設備 Exposure equipment

本發明涉及一種曝光設備,特別是一種應用於電路板曝光的曝光設備。 The invention relates to an exposure device, in particular to an exposure device applied to circuit board exposure.

在現有的曝光設備中,相關人員在進行曝光底片的更換或是清潔時,由於機台內的空間狹小,因此,相關人員無法快速地進行更換或是清潔作業,且若是進行清潔作業時,亦無法有效地清潔。緣此,本發明人乃潛心研究並配合學理的運用,而提出一種設計合理且有效改善上述問題的本發明。 In the existing exposure equipment, when the relevant personnel perform the replacement or cleaning of the exposure film, due to the narrow space in the machine, the relevant personnel cannot quickly perform the replacement or cleaning operation, and if the cleaning operation is performed, It cannot be cleaned effectively. For this reason, the present inventor has devoted himself to study and cooperate with the application of theory, and proposes a reasonable design and effectively improves the above problems.

本發明的主要目的在於提供一種曝光設備,其能讓相關操作人員,輕易地對用以承載待曝光件的抽拉平台進行清潔,藉以改善現有曝光設備,相關人員無法輕易地對用以承載待曝光件的抽拉平台進行清潔的問題。 The main purpose of the present invention is to provide an exposure device that allows related operators to easily clean the drawing platform used to carry the object to be exposed, thereby improving the existing exposure equipment, and related personnel cannot easily The problem of cleaning the drawing platform of the exposed piece.

為了實現上述目的,本發明提供一種曝光設備,其包含:一機台本體及兩個支撐臂。機台本體的內部包含有一曝光空間,機台本體包含有一抽拉平台,抽拉平台位於曝光空間中,抽拉平台具有一承載面,承載面用以承載一待曝光件,機台本體設置有一曝光裝置,曝光裝置能對設置於抽拉平台上的待曝光件進行曝光;機台本體的一側具有一活動開口,曝光空間能通過活動開口與外連通;抽拉平台可活動地設置於機台本體,而抽拉平台能通過活動開口離開曝光空間。各個支撐臂的一端與機台本體相連接,兩個支撐臂彼此相面對地設置,兩個支撐臂彼此相面對的一 側面定義為一內側面,各個支撐臂設置有一導引組件、一樞接組件及一固定組件,各個支撐臂的導引組件對應位於內側面,各個支撐臂的樞接組件與固定組件相連接,而各個固定組件能透過相連接的樞接組件以相對於相對應的支撐臂旋轉。其中,當抽拉平台離開曝光空間時,抽拉平台能通過兩個導引組件的導引而整體地移動至兩個支撐臂,兩個支撐臂則能支撐完全離開機台本體的抽拉平台,兩個固定組件能受外力作用以與抽拉平台相互固定,與兩個固定組件相互固定的抽拉平台能受外力作用,而透過兩個樞接組件相對於兩個支撐臂旋轉,以使承載面朝向遠離活動開口的方向。 In order to achieve the above object, the present invention provides an exposure apparatus including: a machine body and two support arms. The inside of the machine body includes an exposure space. The machine body includes a drawing platform. The drawing platform is located in the exposure space. The drawing platform has a bearing surface for carrying a piece to be exposed. The machine body is provided with a Exposure device, the exposure device can expose the parts to be exposed on the drawing platform; one side of the machine body has an active opening, and the exposure space can communicate with the outside through the moving opening; the drawing platform can be movably set on the machine The platform body, and the drawing platform can leave the exposure space through the movable opening. One end of each support arm is connected to the machine body, the two support arms are arranged facing each other, and the two support arms face each other. The side is defined as an inner side. Each support arm is provided with a guide assembly, a pivot assembly and a fixed assembly. The guide assembly of each support arm is correspondingly located on the inner side. The pivot assembly of each support arm is connected to the fixed assembly. Each fixed component can rotate relative to the corresponding support arm through the connected pivotal component. Among them, when the drawing platform leaves the exposure space, the drawing platform can be moved to the two support arms as a whole by the guidance of the two guide components, and the two support arms can support the drawing platform completely away from the machine body , The two fixed components can be subjected to external force to fix each other with the drawing platform, and the drawing platform fixed to each other with two fixed components can be subjected to external force, and rotate relative to the two support arms through the two pivoting components, so that The bearing surface faces away from the movable opening.

本發明的有益效果可以在於:使用者可以透過兩個支撐臂及設置於其上的相關構件的配合,而將用以承載待曝光件的抽拉平台,整體拉出於機台本體,藉此,相關人員可以輕易地對抽拉平台進行清潔作業。 The beneficial effect of the present invention may be that the user can pull the drawing platform used to carry the piece to be exposed out of the machine body through the cooperation of the two supporting arms and the related components provided thereon. , Related personnel can easily clean the drawing platform.

為使能更進一步瞭解本發明的特徵及技術內容,請參閱以下有關本發明的詳細說明與附圖,然而所附圖式僅提供參考與說明用,並非用來對本發明加以限制者。 In order to further understand the features and technical contents of the present invention, please refer to the following detailed description and drawings of the present invention. However, the drawings are provided for reference and explanation only, and are not intended to limit the present invention.

1‧‧‧曝光設備 1‧‧‧Exposure equipment

10‧‧‧機台本體 10‧‧‧ machine body

10a‧‧‧曝光空間 10a‧‧‧Exposure space

101‧‧‧活動開口 101‧‧‧ opening

11‧‧‧上台框 11‧‧‧stage frame

111‧‧‧軌道結構 111‧‧‧ track structure

111a‧‧‧滑動通道 111a‧‧‧sliding channel

1111‧‧‧滾輪 1111‧‧‧Scroll wheel

112‧‧‧限位組件 112‧‧‧Limiting components

1121‧‧‧驅動器 1121‧‧‧ Driver

1122‧‧‧連接臂 1122‧‧‧ connection arm

1123‧‧‧導輪 1123‧‧‧Guide wheel

113‧‧‧限位組件 113‧‧‧Limiting components

1131‧‧‧驅動器 1131‧‧‧ Driver

1132‧‧‧連接臂 1132‧‧‧Connecting arm

1133‧‧‧導輪 1133‧‧‧Guide wheel

114‧‧‧限位組件 114‧‧‧Limiting components

1141‧‧‧驅動器 1141‧‧‧ Driver

1142‧‧‧連接臂 1142‧‧‧Connecting arm

11421‧‧‧抵頂結構 11421‧‧‧top structure

12‧‧‧下台框 12‧‧‧Lower frame

13‧‧‧上曝光單元 13‧‧‧ Upper exposure unit

14‧‧‧下曝光單元 14‧‧‧ Lower exposure unit

20‧‧‧抽拉平台 20‧‧‧Drawing platform

201‧‧‧側面 201‧‧‧Side

202‧‧‧鎖固孔 202‧‧‧Locking hole

21‧‧‧把手結構 21‧‧‧Handle structure

30‧‧‧支撐臂 30‧‧‧support arm

301‧‧‧內側面 301‧‧‧Inside

31‧‧‧輔助固定件 31‧‧‧Auxiliary fixings

32‧‧‧導引組件 32‧‧‧Guide assembly

321‧‧‧滾輪 321‧‧‧wheel

32a‧‧‧導引通道 32a‧‧‧Guide channel

33‧‧‧樞接組件 33‧‧‧Pivot assembly

34‧‧‧固定組件 34‧‧‧Fixed components

341‧‧‧延伸臂 341‧‧‧Extended arm

342‧‧‧鎖固件 342‧‧‧Lock firmware

35‧‧‧輔助支撐組件 35‧‧‧Auxiliary support assembly

36‧‧‧輔助限位組件 36‧‧‧Auxiliary limit components

361‧‧‧第一磁吸單元 361‧‧‧First magnetic suction unit

362‧‧‧第二磁吸單元 362‧‧‧Second magnetic suction unit

37‧‧‧樞接結構 37‧‧‧Pivot structure

圖1為本發明的曝光設備的示意圖。 FIG. 1 is a schematic diagram of the exposure apparatus of the present invention.

圖2為圖1的前視圖。 FIG. 2 is a front view of FIG. 1.

圖3為本發明的曝光設備的上台框的示意圖。 3 is a schematic diagram of the upper frame of the exposure apparatus of the present invention.

圖4為本發明的曝光設備的上台框的另一視角示意圖。 4 is another schematic view of the upper frame of the exposure apparatus of the present invention.

圖5、圖6及圖7為本發明的曝光設備的不同的限位組件的示意圖。 5, 6 and 7 are schematic diagrams of different limiting components of the exposure apparatus of the present invention.

圖8為本發明的曝光設備的支撐臂的示意圖。 8 is a schematic view of the support arm of the exposure apparatus of the present invention.

圖9為本發明的曝光設備的抽拉平台被抽出於機台本體而設置於兩個支撐臂上的示意圖。 9 is a schematic diagram of the drawing platform of the exposure apparatus of the present invention being drawn out of the machine body and installed on two support arms.

圖10為圖9的局部放大示意圖。 FIG. 10 is a partially enlarged schematic diagram of FIG. 9.

圖11為圖9的前視圖的局部放大示意圖。 FIG. 11 is a partially enlarged schematic view of the front view of FIG. 9.

圖12為本發明的曝光設備的支撐臂的作動示意圖。 12 is a schematic diagram of the operation of the support arm of the exposure apparatus of the present invention.

圖13為本發明的曝光設備的抽拉平台相對於兩個支撐臂旋轉的示意圖。 13 is a schematic diagram of the drawing platform of the exposure apparatus of the present invention rotating relative to two support arms.

圖14為本發明的曝光設備的兩個支撐臂的另一實施例的示意圖。 14 is a schematic diagram of another embodiment of two support arms of the exposure apparatus of the present invention.

以下係藉由特定的具體實例說明本發明之曝光設備的實施方式,熟悉此技術之人士可由本說明書所揭示之內容輕易地瞭解本發明之其他優點與功效。本發明亦可藉由其他不同的具體實例加以施行或應用,本說明書中的各項細節亦可基於不同觀點與應用,在不悖離本發明之精神下進行各種修飾與變更。又本發明之圖式僅為簡單說明,並非依實際尺寸描繪,亦即未反應出相關構成之實際尺寸,先予敘明。以下之實施方式係進一步詳細說明本發明之觀點,但並非以任何觀點限制本發明之範疇。於以下說明中,如有指出請參閱特定圖式或是如特定圖式所示,其僅是用以強調於後續說明中,所述及的相關內容大部份出現於該特定圖式中,但不限制該後續說明中僅可參考所述特定圖式。 The following describes the implementation of the exposure apparatus of the present invention by specific specific examples. Those skilled in the art can easily understand other advantages and effects of the present invention from the contents disclosed in this specification. The present invention can also be implemented or applied by other different specific examples. Various details in this specification can also be based on different viewpoints and applications, and various modifications and changes can be made without departing from the spirit of the present invention. In addition, the drawings of the present invention are only for simple description, and are not depicted according to actual sizes, that is, the actual sizes of related components are not reflected, and will be described first. The following embodiments further describe the viewpoint of the present invention in detail, but do not limit the scope of the present invention by any viewpoint. In the following description, if you are instructed to refer to a specific drawing or as shown in a specific drawing, it is only used to emphasize in the subsequent description, most of the related content mentioned in this specific drawing, However, it does not limit that only specific patterns can be referred to in the subsequent description.

請一併參閱圖1至圖4,其為本發明的曝光設備的示意圖。如圖所示,曝光設備1包含有一機台本體10及兩個支撐臂30。 Please refer to FIGS. 1 to 4 together, which are schematic diagrams of the exposure apparatus of the present invention. As shown in the figure, the exposure apparatus 1 includes a machine body 10 and two support arms 30.

機台本體10的內部包含有一曝光空間10a,機台本體10的一側具有一活動開口101,而曝光空間10a能通過活動開口101與外連通。在實際應用中,機台本體10還可以是設置有一活動門(圖未示),而相關人員可以依據需求,操作活動門以遮蔽活動開口101。其中,圖中所繪示的活動開口101的外型及其大小,僅為其中一示範態樣,其可依據需求變化。 The inside of the machine body 10 includes an exposure space 10a. One side of the machine body 10 has a movable opening 101, and the exposure space 10a can communicate with the outside through the movable opening 101. In practical applications, the machine body 10 can also be provided with a movable door (not shown), and related personnel can operate the movable door to cover the movable opening 101 according to requirements. Among them, the shape and size of the movable opening 101 shown in the figure are only one of the exemplary aspects, which can be changed according to needs.

機台本體10內設置有一上台框11、一下台框12、一上曝光單元13及一下曝光單元14;上台框11、下台框12、上曝光單元 13及下曝光單元14是對應設置於曝光空間10a中。上台框11及下台框12彼此相面對地設置,上台框11設置有一抽拉平台20,抽拉平台20用以設置曝光底片,上台框11用以設置一待曝光件(例如電路板),上曝光單元13及下曝光單元14對應設置於上台框11及下台框12的一側,而上曝光單元13及下曝光單元14能受控制,以配合曝光底片,而對待曝光單元進行曝光作業。在不同的實施例中,機台本體10可以是僅設置有上曝光單元13或是下曝光單元14,於此不加以限制。 The machine body 10 is provided with an upper stage frame 11, a lower stage frame 12, an upper exposure unit 13 and a lower exposure unit 14; an upper stage frame 11, a lower stage frame 12, an upper exposure unit 13 and the lower exposure unit 14 are correspondingly provided in the exposure space 10a. The upper stage frame 11 and the lower stage frame 12 are arranged to face each other. The upper stage frame 11 is provided with a drawing platform 20 for setting the exposure film, and the upper stage frame 11 is for setting a piece to be exposed (such as a circuit board). The upper exposure unit 13 and the lower exposure unit 14 are correspondingly disposed on one side of the upper stage frame 11 and the lower stage frame 12, and the upper exposure unit 13 and the lower exposure unit 14 can be controlled to cooperate with the exposure film, and the exposure unit is exposed. In different embodiments, the machine body 10 may be provided with only the upper exposure unit 13 or the lower exposure unit 14, which is not limited herein.

抽拉平台20能相對於上台框11,而被整體地抽拉離機台本體10。抽拉平台20能相對於上台框11活動的方式,可以是依據需求加以設計,舉例來說,如圖3所示,上台框11的一側可以是設置有兩個軌道結構111,各個軌道結構111可以是呈現為L型,而各個軌道結構111與上台框11之間形成有一滑動通道111a,而抽拉平台20(如圖9所示)的兩側邊,則能對應於兩個滑動通道111a中滑動。在實際應用中,各個軌道結構111中可以是包含有多個滾輪1111,以輔助使抽拉平台20更順暢地相對於兩個軌道結構111滑動。 The drawing platform 20 can be pulled away from the table body 10 as a whole with respect to the upper table frame 11. The manner in which the drawing platform 20 can move relative to the upper frame 11 can be designed according to requirements. For example, as shown in FIG. 3, one side of the upper frame 11 can be provided with two track structures 111, each track structure 111 may be L-shaped, and a sliding channel 111a is formed between each rail structure 111 and the upper frame 11, and the two sides of the drawing platform 20 (as shown in FIG. 9) can correspond to two sliding channels Slide in 111a. In practical applications, each rail structure 111 may include a plurality of rollers 1111 to assist the sliding platform 20 to slide relative to the two rail structures 111 more smoothly.

透過設置於上台框11的兩個軌道結構111,抽拉平台20可以是以人力的方式被抽離機台本體10。在實際應用中,抽拉平台20的一側可以是設置有把手結構21,相關人員欲將抽拉平台20抽拉出機台本體10時,即可以透過操作把手結構21,而方便地將抽拉平台20抽拉離曝光空間10a。 Through the two rail structures 111 provided on the upper table frame 11, the drawing platform 20 can be drawn away from the table body 10 in a manual manner. In practical applications, one side of the drawing platform 20 may be provided with a handle structure 21, and when a relevant person wants to draw the drawing platform 20 out of the machine body 10, the handle structure 21 can be used to conveniently draw The pulling platform 20 is pulled away from the exposure space 10a.

在不同的實施例中,抽拉平台20可以是利用兩個線性滑軌,而可活動地設置於上台框11,藉此,抽拉平台20可以是利用電子控制的方式,相對於上台框11滑動;在具體的實施中,線性滑軌的軌道可以是設置於上台框11或是抽拉平台20,可以是依據需求設計,於此不加以限制。 In different embodiments, the drawing platform 20 may use two linear slide rails, and may be movably disposed on the upper frame 11, whereby the drawing platform 20 may be electronically controlled, relative to the upper frame 11 Sliding; in a specific implementation, the track of the linear slide rail may be set on the upper frame 11 or the drawing platform 20, and may be designed according to requirements, which is not limited herein.

如圖3至圖7所示,上台框11還可以是設置多個限位組件 112、113、114,各個限位組件112、113、114可以是分別對應限制抽拉平台20相對於上台框11於垂直座標系的三個軸向(如圖4所顯示的座標中的X軸方向、Y軸方向及Z軸方向)的作動。於本實施例的圖式中,所繪示的限位組件112、113、114的個數及其設置位置,僅為其中一示範態樣,實際應用不以此為限。 As shown in FIGS. 3 to 7, the upper stage frame 11 may also be provided with multiple limit components 112, 113, 114, each of the limiting components 112, 113, 114 may be corresponding to the three axes of the vertical coordinate system of the drawing platform 20 relative to the upper frame 11 (the X axis in the coordinates shown in FIG. 4) Direction, Y axis direction and Z axis direction). In the drawings of this embodiment, the number and position of the limiting components 112, 113, 114 shown are only one of the exemplary aspects, and the actual application is not limited thereto.

具體來說,如圖4及圖5所示,用來限制抽拉平台20相對於上台框11於X軸方向的移動量的限位組件112,其可以是具有一驅動器1121、一連接臂1122及一導輪1123,驅動器1121連接連接臂1122,而驅動器1121能受控制以使連接臂1122移動,連接臂1122的末端設置有導輪1123。 Specifically, as shown in FIGS. 4 and 5, a limiting component 112 for limiting the amount of movement of the drawing platform 20 relative to the upper frame 11 in the X-axis direction may include a driver 1121 and a connecting arm 1122 And a guide wheel 1123, the driver 1121 is connected to the connecting arm 1122, and the driver 1121 can be controlled to move the connecting arm 1122, and a guide wheel 1123 is provided at the end of the connecting arm 1122.

如圖4及圖6所示,用來限制抽拉平台20相對於上台框11於Y軸方向的移動量的限位組件113,同樣可以是具有一驅動器1131、一連接臂1132及一導輪1133。當抽拉平台20,驅動器1131連接連接臂1132,導輪1133設置於連接臂1132的末端,驅動器1131能被控制而帶動連接臂1132作動。如圖4及圖7所示,用來限制抽拉平台20相對於上台框11於Z軸方向的移動量的限位組件114,可以是具有一驅動器1141及一連接臂1142,驅動器1141連接連接臂1142,連接臂1142的末端具有一抵頂結構11421,驅動器1141能被控制而使連接臂1142移動。 As shown in FIGS. 4 and 6, the limiting component 113 for limiting the amount of movement of the drawing platform 20 relative to the upper frame 11 in the Y-axis direction may also have a driver 1131, a connecting arm 1132 and a guide wheel 1133. When the platform 20 is pulled, the driver 1131 is connected to the connecting arm 1132, and the guide wheel 1133 is disposed at the end of the connecting arm 1132. The driver 1131 can be controlled to drive the connecting arm 1132 to move. As shown in FIGS. 4 and 7, the limiting component 114 for limiting the amount of movement of the drawing platform 20 relative to the upper frame 11 in the Z-axis direction may include a driver 1141 and a connecting arm 1142, and the driver 1141 is connected and connected In the arm 1142, the end of the connecting arm 1142 has an abutment structure 11421. The driver 1141 can be controlled to move the connecting arm 1142.

如圖3至圖7所示,當抽拉平台20(如圖9所示)設置於上台框11時,且抽拉平台20的兩側邊對應位於兩個滑動通道111a時,限位組件112、113的驅動器1121、1131能驅動連接臂1122、1132向抽拉平台20相鄰的兩側移動,而使導輪1123、1133對應抵頂於抽拉平台20相鄰的兩側,藉此,限制抽拉平台20相對於上台框11於X軸及Y軸方向的移動;當抽拉平台20(如圖9所示)設置於上台框11時,限位組件114的驅動器1141,同樣能驅動連接臂1142,而使連接臂1142的抵頂結構11421對應抵頂於抽拉平台20的一側,藉此,限制抽拉平台20相對於上台框11於Z軸方向的 移動。 As shown in FIGS. 3 to 7, when the drawing platform 20 (as shown in FIG. 9) is installed on the upper stage frame 11, and the two sides of the drawing platform 20 are corresponding to the two sliding channels 111 a, the limiting component 112 , 113 drives 1121, 1131 can drive the connecting arms 1122, 1132 to move to the two sides adjacent to the drawing platform 20, so that the guide wheels 1123, 1133 abut against the two sides adjacent to the drawing platform 20, thereby, Restrict the movement of the drawing platform 20 relative to the upper stage frame 11 in the X-axis and Y-axis directions; when the drawing platform 20 (as shown in FIG. 9) is set on the upper stage frame 11, the driver 1141 of the limit assembly 114 can also be driven The connecting arm 1142, so that the abutment structure 11421 of the connecting arm 1142 abuts against one side of the drawing platform 20, thereby restricting the drawing platform 20 in the Z-axis direction relative to the upper stage frame 11 mobile.

在實際應用中,上台框11可以是設置有至少一個偵測模組(圖未示),偵測模組能偵測抽拉平台20是否位於曝光空間10a(如圖1所示)。在實際應用中,偵測模組例如是紅外線偵測器,而其能用以偵測抽拉平台20相對於上台框11的位置,舉例來說,抽拉平台20對應位於上台框11的一側時,偵測模組所發出的紅外線可以是被遮蔽,藉此,與偵測模組電性連接的控制裝置,將可判斷抽拉平台20對應位於上台框11的一側。當控制裝置依據偵測模組的偵測結果,而判斷抽拉平台20位於曝光空間10a中時,控制裝置可以是對應控制多個限位組件112、113、114作動,以限制抽拉平台20於曝光空間10a中的活動範圍,即,限制抽拉平台20相對於上台框11於垂直座標系的三個軸向方向的活動範圍。關於偵測模組的實施方式及其設置位置、數量等,可依據實際需求設計,於此不加以限制。其中,所述控制裝置即是用以控制機台本體10相關構件作動的電腦設備、處理器等,其可以是設置於機台本體10中,又或者是獨立於機台本體10設置。 In practical applications, the upper stage frame 11 may be provided with at least one detection module (not shown). The detection module can detect whether the drawing platform 20 is located in the exposure space 10a (as shown in FIG. 1). In practical applications, the detection module is, for example, an infrared detector, and it can be used to detect the position of the drawing platform 20 relative to the upper frame 11. For example, the drawing platform 20 corresponds to a position on the upper frame 11. When it is on the side, the infrared rays emitted by the detection module can be shielded, whereby the control device electrically connected to the detection module can determine that the drawing platform 20 is corresponding to the side of the upper frame 11. When the control device determines that the drawing platform 20 is located in the exposure space 10a according to the detection result of the detection module, the control device may correspondingly control a plurality of limiting components 112, 113, 114 to operate to limit the drawing platform 20 The movement range in the exposure space 10a, that is, the movement range of the drawing platform 20 relative to the upper stage frame 11 in the three axial directions of the vertical coordinate system is limited. The implementation mode of the detection module and its installation position, number, etc. can be designed according to actual needs, and are not limited herein. Wherein, the control device is a computer device, a processor, etc. for controlling the movement of the relevant components of the machine body 10, which may be installed in the machine body 10, or may be installed independently of the machine body 10.

如圖1及圖8所示,機台本體10鄰近於活動開口101的附近,設置有兩個支撐臂30。各個支撐臂30的一端與機台本體10相連接,且兩個支撐臂30彼此相面對地設置,兩個支撐臂30彼此相面對的一側面定義為一內側面301。在實際應用中,各個支撐臂30可以為矩形體,且各個支撐臂30的內側面301可以對應為寬側面。 As shown in FIGS. 1 and 8, the machine body 10 is adjacent to the movable opening 101, and two support arms 30 are provided. One end of each support arm 30 is connected to the machine body 10, and the two support arms 30 are disposed to face each other, and a side surface of the two support arms 30 facing each other is defined as an inner side surface 301. In practical applications, each support arm 30 may be a rectangular body, and the inner side 301 of each support arm 30 may correspond to a wide side.

各個支撐臂30設置有一輔助固定件31、一導引組件32、一樞接組件33及一固定組件34,各個支撐臂30的導引組件32對應位於內側面301,各個支撐臂30的樞接組件33與固定組件34相連接,而各個固定組件34能透過相連接的樞接組件33以相對於相對應的支撐臂30旋轉。關於支撐臂30的長度、外型,可以是依據實際抽拉平台20的尺寸設計,不以圖中所示為限。在實際應 用中,各個支撐臂30的一端可以是固定設置於機台本體10,而兩個支撐臂30與機台本體10相連接的機械強度,是能對應承載抽拉平台20的重量。 Each supporting arm 30 is provided with an auxiliary fixing member 31, a guiding component 32, a pivoting component 33, and a fixing component 34. The guiding component 32 of each supporting arm 30 is correspondingly located on the inner side 301, and the pivoting connection of each supporting arm 30 The assembly 33 is connected to the fixed assembly 34, and each fixed assembly 34 can rotate relative to the corresponding support arm 30 through the connected pivot assembly 33. The length and shape of the support arm 30 may be designed according to the size of the actual drawing platform 20, and are not limited to those shown in the figures. Should actually In use, one end of each support arm 30 may be fixedly disposed on the machine body 10, and the mechanical strength of the two support arms 30 connected to the machine body 10 is capable of supporting the weight of the drawing platform 20.

各個支撐臂30的輔助固定件31位於支撐臂30的內側面301的一側,且輔助固定件31透過樞接組件33與支撐臂30相連接;輔助固定件31能被控制(例如是以人力的方式或是電動的方式),而透過樞接組件33相對於支撐臂30旋轉。 The auxiliary fixing member 31 of each support arm 30 is located on one side of the inner side 301 of the support arm 30, and the auxiliary fixing member 31 is connected to the support arm 30 through the pivot assembly 33; the auxiliary fixing member 31 can be controlled (for example, by human power) Way or electric way), and rotate relative to the support arm 30 through the pivot assembly 33.

各個支撐臂30的導引組件32設置於輔助固定件31相反於支撐臂30的內側面301的一側。導引組件32可以是具有兩排滾輪321,兩排滾輪321之間對應形成有一導引通道32a。各個支撐臂30所具有的滾輪321個數及其排列方式,可以是依據需求變化,舉例來說,滾輪321的個數可以是依據支撐臂30的長度而變化,但不以圖中所示為限。 The guide assembly 32 of each support arm 30 is disposed on the side of the auxiliary fixing member 31 opposite to the inner side 301 of the support arm 30. The guide assembly 32 may have two rows of rollers 321, and a guide channel 32a is formed between the two rows of rollers 321. The number and arrangement of the rollers 321 of each support arm 30 may vary according to needs. For example, the number of rollers 321 may vary according to the length of the support arm 30, but not shown in the figure as limit.

如圖9至圖11所示,抽拉平台20能被相關操作人員或是相關機械控制,而通過兩個支撐臂30上的兩個導引通道32a,整體地離開機台本體10,並移動至兩個支撐臂30,而抽拉平台20整體將可被兩個支撐臂30所支撐,而位於機台本體10外。 As shown in FIGS. 9 to 11, the drawing platform 20 can be controlled by the relevant operator or related machinery, and through the two guide channels 32a on the two support arms 30, the whole body leaves the machine body 10 and moves As far as the two support arms 30 are concerned, the drawing platform 20 as a whole can be supported by the two support arms 30 and is located outside the machine body 10.

如圖8及圖11所示,各個支撐臂30的固定組件34可以是具有一延伸臂341及一鎖固件342,延伸臂341固定設置於支撐臂30,鎖固件342與延伸臂341相連接,鎖固件342能被操作,而與抽拉平台20相對應具有一鎖固孔202相互鎖合。具體來說,如圖10及圖11所示,當抽拉平台20設置於兩個支撐臂30上時,使用者或是相關電控機構,能透過操作鎖固件342,而使鎖固件342與抽拉平台20上所具有的鎖固孔202相互鎖合,藉此,使抽拉平台20與輔助固定件31相互固定。 As shown in FIGS. 8 and 11, the fixing assembly 34 of each support arm 30 may have an extension arm 341 and a locking member 342. The extension arm 341 is fixedly disposed on the support arm 30, and the locking member 342 is connected to the extension arm 341. The locking member 342 can be operated, and has a locking hole 202 corresponding to the drawing platform 20 to lock with each other. Specifically, as shown in FIGS. 10 and 11, when the drawing platform 20 is disposed on the two support arms 30, the user or the relevant electronic control mechanism can operate the lock firmware 342 to make the lock firmware 342 and The locking holes 202 provided on the drawing platform 20 are locked with each other, thereby fixing the drawing platform 20 and the auxiliary fixing member 31 to each other.

如圖12及圖13所示,各個支撐臂30的樞接組件33可以是設置於各個支撐臂30遠離機台本體10的一端,而樞接組件33能被控制而相對於支撐臂30旋轉。當抽拉平台20設置於兩個支撐 臂30上時,抽拉平台20則可以透過兩個樞接組件33,而相對於兩個支撐臂30旋轉。如圖13所示,當抽拉平台20相對於兩個支撐臂30旋轉時,抽拉平台20的一側面將會對應位於使用者的前方,如此,相關使用者將可方便地置換設置於抽拉平台20上的曝光底片或是相關構件,且使用者亦可方便地抽拉平台20進行清潔作業。 As shown in FIGS. 12 and 13, the pivot assembly 33 of each support arm 30 may be disposed at the end of each support arm 30 away from the table body 10, and the pivot assembly 33 can be controlled to rotate relative to the support arm 30. When the pulling platform 20 is set on two supports When the arm 30 is on, the drawing platform 20 can rotate relative to the two support arms 30 through the two pivoting components 33. As shown in FIG. 13, when the drawing platform 20 rotates relative to the two support arms 30, one side of the drawing platform 20 will be correspondingly located in front of the user, so that the relevant user can easily replace the The exposure film or related components on the platform 20 are pulled, and the user can also easily pull the platform 20 for cleaning operations.

當然,在實際應用中,各個支撐臂30的樞接組件33是具有相關的固定機構,以限制樞接組件33相對於支撐臂30旋轉,亦即,使用者能再將抽拉平台20抽拉離機台本體10前,將利用相關的固定機構,以使樞接組件33無法相對於支撐臂30旋轉,而後,待抽拉平台20整體設置於兩個支撐臂30上後,才解除相關固定機構對於樞接組件33的限制,以使抽拉平台20能透過樞接組件33相對於兩個支撐臂30旋轉。 Of course, in practical applications, the pivot assembly 33 of each support arm 30 has an associated fixing mechanism to restrict the pivot assembly 33 from rotating relative to the support arm 30, that is, the user can then pull the drawing platform 20 Before leaving the machine body 10, the relevant fixing mechanism will be used to prevent the pivot assembly 33 from rotating relative to the support arm 30, and then the relevant fixing is released after the drawing platform 20 is integrally installed on the two support arms 30 The mechanism restricts the pivot assembly 33 so that the drawing platform 20 can rotate relative to the two support arms 30 through the pivot assembly 33.

如圖10及圖13所示,各個支撐臂30還可以是設置有一輔助支撐組件35,其可用以支撐相對於兩個支撐臂30旋轉後的抽拉平台20,而使抽拉平台20能更穩定地傾斜地設置於兩個支撐臂30上。所述輔助支撐組件35可以是直接固定設置於支撐臂30上,或者在特殊的應用中,也可以是在不影響抽拉平台20相對於機台本體10活動的範圍中,設置於機台本體10。 As shown in FIGS. 10 and 13, each support arm 30 may also be provided with an auxiliary support assembly 35, which can be used to support the drawing platform 20 rotated relative to the two support arms 30, so that the drawing platform 20 can be more The two support arms 30 are steadily inclined. The auxiliary support assembly 35 may be directly fixed on the support arm 30, or in special applications, or may be installed on the machine body within a range that does not affect the movement of the drawing platform 20 relative to the machine body 10 10.

如圖10及圖12所示,在實際應用中,各個支撐臂30還可以是設置有一輔助限位組件36,其包含有一第一磁吸單元361及一第二磁吸單元362,第一磁吸單元361固定設置於支撐臂30,第二磁吸單元362固定設置於輔助固定件31。如圖10所示,當抽拉平台20設置於兩個支撐臂30上時,第一磁吸單元361將會與第二磁吸單元362相互吸引,從而使抽拉平台20更穩定地設置於兩個支撐臂30。如圖12及圖13所示,當輔助固定件31及抽拉平台20受使用者操作或是相關機構操作,而透過樞接組件33相對於兩個支撐臂30旋轉時,第二磁吸單元362將會與第一磁吸單元361 相互分離。 As shown in FIGS. 10 and 12, in actual application, each supporting arm 30 may also be provided with an auxiliary limiting component 36, which includes a first magnetic attraction unit 361 and a second magnetic attraction unit 362, the first magnetic The suction unit 361 is fixed to the support arm 30, and the second magnetic suction unit 362 is fixed to the auxiliary fixture 31. As shown in FIG. 10, when the drawing platform 20 is disposed on the two support arms 30, the first magnetic attraction unit 361 and the second magnetic attraction unit 362 will attract each other, thereby making the drawing platform 20 more stable on Two support arms 30. As shown in FIGS. 12 and 13, when the auxiliary fixing member 31 and the drawing platform 20 are operated by the user or related mechanisms, and rotate relative to the two support arms 30 through the pivot assembly 33, the second magnetic attraction unit 362 will work with the first magnetic suction unit 361 Separated from each other.

請一併參閱圖1、圖9及圖13,上述實施例是以抽拉平台20對應位於上台框11的一側為例,且抽拉平台20被抽拉離機台本體10,而設置於兩個支撐臂30上時,抽拉平台20是能被操作而相對於兩個支撐臂30順時針旋轉,藉此,使抽拉平台20用以設置曝光底片的一側面201,能大致面對使用者。 Please refer to FIG. 1, FIG. 9 and FIG. 13 together. The above embodiment takes the drawing platform 20 corresponding to the side of the upper frame 11 as an example, and the drawing platform 20 is pulled away from the machine body 10 and is provided in When the two supporting arms 30 are on, the drawing platform 20 can be operated to rotate clockwise relative to the two supporting arms 30, thereby making the side of the drawing platform 20 used to set the exposure film 201 substantially facing user.

在不同的實施例中,所述抽拉平台20也可以是對應位於下台框12的一側,而所述抽拉平台20的一側面201,則可以是用以承載待曝光件。當承載有待曝光件的抽拉平台20被抽拉出機台本體10,而對應位於兩個支撐臂30上時,抽拉平台20可以是相對於兩個支撐臂30逆時針旋轉,藉此,使抽拉平台20承載有待曝光件的側面201能大致面對於使用者。 In different embodiments, the drawing platform 20 may be correspondingly located on one side of the lower stage frame 12, and a side 201 of the drawing platform 20 may be used to carry the object to be exposed. When the drawing platform 20 carrying the object to be exposed is drawn out of the machine body 10 and is correspondingly located on the two supporting arms 30, the drawing platform 20 may rotate counterclockwise relative to the two supporting arms 30, thereby, The side 201 of the drawing platform 20 carrying the object to be exposed can face the user substantially.

請參閱圖8及圖14,在實際應用中,各個支撐臂30可以透過樞接結構37,而樞接於機台本體10,而各個支撐臂30能受使用者操作或相關電控機械操作,以相對於機台本體10旋轉,而各個支撐臂30能據以於一收合位置(如圖14所示)及一展開位置(如圖1所示)之間移動。其中,當兩個支撐臂30位於收合位置時,兩個支撐臂30的內側面是面對機台本體10設置;當兩個支撐臂30位於展開位置時,兩個支撐臂30的內側面則是彼此相面對地設置。 Please refer to FIGS. 8 and 14. In actual applications, each support arm 30 can be pivotally connected to the machine body 10 through the pivot structure 37, and each support arm 30 can be operated by a user or related electronically controlled machinery. In order to rotate relative to the machine body 10, each supporting arm 30 can move between a retracted position (as shown in FIG. 14) and an expanded position (as shown in FIG. 1). Wherein, when the two support arms 30 are in the folded position, the inner sides of the two support arms 30 are arranged facing the machine body 10; when the two support arms 30 are in the deployed position, the inner sides of the two support arms 30 It is set facing each other.

具體來說,當不需使用兩個支撐臂30時,相關使用者或是相關電控機械,可以是操作兩個支撐臂30,而使兩個支撐臂30能透過樞接結構37,由圖1所示的展開位置,向機台本體10方向旋轉,據以轉換為如圖14所示的收合位置,如此,將可避免凸出於機台本體10的支撐臂30,在不預期的情況下,與相關人員或是機械發生相互碰撞的問題。 Specifically, when two support arms 30 are not needed, the relevant user or related electronically controlled machine may operate the two support arms 30 so that the two support arms 30 can pass through the pivot structure 37. 1, the unfolded position shown in FIG. 1, rotates in the direction of the machine body 10, and is converted into the folded position as shown in FIG. 14, so that the support arm 30 protruding from the machine body 10 can be avoided. In the case of a collision with related personnel or machinery.

以上所述僅為本發明的較佳可行實施例,非因此侷限本發明的專利範圍,故舉凡運用本發明說明書及圖式內容所做的等效技術變化,均包含於本發明的保護範圍內。 The above are only the preferred and feasible embodiments of the present invention, and do not limit the patent scope of the present invention. Therefore, equivalent technical changes made by using the description and drawings of the present invention are included in the protection scope of the present invention. .

1‧‧‧曝光設備 1‧‧‧Exposure equipment

10‧‧‧機台本體 10‧‧‧ machine body

10a‧‧‧曝光空間 10a‧‧‧Exposure space

101‧‧‧活動開口 101‧‧‧ opening

11‧‧‧上台框 11‧‧‧stage frame

20‧‧‧抽拉平台 20‧‧‧Drawing platform

30‧‧‧支撐臂 30‧‧‧support arm

31‧‧‧輔助固定件 31‧‧‧Auxiliary fixings

33‧‧‧樞接組件 33‧‧‧Pivot assembly

Claims (10)

一種曝光設備,其包含:一機台本體,其內部包含有一曝光空間,所述機台本體包含有一抽拉平台,所述抽拉平台位於所述曝光空間中,所述抽拉平台具有一承載面,所述承載面用以承載一待曝光件,所述機台本體設置有一曝光裝置,所述曝光裝置能對設置於所述抽拉平台上的所述待曝光件進行曝光;所述機台本體的一側具有一活動開口,所述曝光空間能通過所述活動開口與外連通;所述抽拉平台可活動地設置於所述機台本體,而所述抽拉平台能通過所述活動開口離開所述曝光空間;兩個支撐臂,各個所述支撐臂的一端與所述機台本體相連接,兩個所述支撐臂彼此相面對地設置,兩個所述支撐臂彼此相面對的一側面定義為一內側面,各個所述支撐臂設置有一導引組件、一樞接組件及一固定組件,各個所述支撐臂的所述導引組件對應位於所述內側面,各個所述支撐臂的所述樞接組件與所述固定組件相連接,而各個所述固定組件能透過相連接的所述樞接組件以相對於相對應的支撐臂旋轉;其中,當所述抽拉平台離開所述曝光空間時,所述抽拉平台能通過兩個所述導引組件的導引而整體地移動至兩個所述支撐臂,兩個所述支撐臂則能支撐完全離開所述機台本體的所述抽拉平台,兩個所述固定組件能受外力作用以與所述抽拉平台相互固定,與兩個所述固定組件相互固定的所述抽拉平台能受外力作用,而透過兩個所述樞接組件相對於兩個所述支撐臂旋轉,以使所述承載面朝向遠離所述活動開口的方向。 An exposure device comprising: a machine body, which contains an exposure space inside, the machine body contains a drawing platform, the drawing platform is located in the exposure space, and the drawing platform has a bearing Surface, the bearing surface is used to carry a piece to be exposed, the machine body is provided with an exposure device, the exposure device can expose the piece to be exposed on the drawing platform; the machine One side of the table body has a movable opening, and the exposure space can communicate with the outside through the movable opening; the drawing platform can be movably arranged on the machine body, and the drawing platform can pass through the The movable opening leaves the exposure space; two support arms, one end of each support arm is connected to the machine body, the two support arms are disposed facing each other, and the two support arms are opposite each other A facing side is defined as an inner side, each of the support arms is provided with a guide assembly, a pivot assembly and a fixed assembly, the guide assembly of each of the support arms is correspondingly located on the inner side, each The pivot assembly of the support arm is connected to the fixed assembly, and each of the fixed assemblies can rotate relative to the corresponding support arm through the connected pivot assembly; wherein, when the pumping When the pulling platform leaves the exposure space, the pulling platform can be moved to the two supporting arms as a whole by the guidance of the two guiding components, and the two supporting arms can support the complete separation from the For the drawing platform of the machine body, two of the fixing components can be subjected to external forces to fix each other with the drawing platform, and the drawing platforms that are fixed to the two fixing components can be subjected to external forces , And the two pivoting components are rotated relative to the two support arms so that the bearing surface faces away from the movable opening. 如請求項1所述的曝光設備,其中,各個所述支撐臂的所述導引組件設置有兩排滾輪,兩排所述滾輪之間形成有一導引通道;所述抽拉平台能通過兩個所述導引通道,而整體地移動至兩個所述支撐臂。 The exposure apparatus according to claim 1, wherein the guide assembly of each support arm is provided with two rows of rollers, and a guide channel is formed between the two rows of the rollers; the drawing platform can pass through two Each of the guide channels moves integrally to the two support arms. 如請求項2所述的曝光設備,其中,各個所述支撐臂具有一輔助固定件及一輔助限位組件,所述輔助固定件的一端與所述樞接組件相連接,而所述輔助固定件能透過所述樞接組件相對於所述支撐臂旋轉;兩排所述滾輪固定設置所述輔助固定件;所述輔助限位組件包含有一第一磁吸單元及一第二磁吸單元,所述第一磁吸單元固定設置於所述支撐臂,所述第二磁吸單元固定設置於所述輔助固定件,所述第一磁吸單元及所述第二磁吸單元能相互吸引,而相互吸引的所述第一磁吸單元及所述第二磁吸單元能限制所述輔助固定件透過所述樞接組件相對於所述支撐臂旋轉;各個所述支撐臂的固定組件固定設置於所述輔助固定件;其中,當所述抽拉平台透過兩個所述樞接組件相對於兩個所述支撐臂旋轉時,兩個所述輔助固定件隨所述抽拉平台一併相對於兩個所述支撐臂旋轉。 The exposure apparatus according to claim 2, wherein each of the support arms has an auxiliary fixing member and an auxiliary limiting component, one end of the auxiliary fixing member is connected to the pivotal assembly, and the auxiliary fixing The member can rotate relative to the support arm through the pivot assembly; the two rows of the rollers are fixedly arranged with the auxiliary fixing member; the auxiliary limit assembly includes a first magnetic attraction unit and a second magnetic attraction unit, The first magnetic attraction unit is fixed to the support arm, the second magnetic attraction unit is fixed to the auxiliary fixture, the first magnetic attraction unit and the second magnetic attraction unit can attract each other, The first magnetic attraction unit and the second magnetic attraction unit attracting each other can restrict the auxiliary fixing member from rotating relative to the support arm through the pivotal assembly; each fixing assembly of the support arm is fixedly arranged For the auxiliary fixing member; wherein, when the drawing platform rotates relative to the two support arms through the two pivotal assemblies, the two auxiliary fixing members are opposite to the drawing platform together The two support arms rotate. 如請求項1所述的曝光設備,其中,各個所述支撐臂具有一輔助固定件及一輔助限位組件,所述輔助固定件的一端與所述樞接組件相連接,而所述輔助固定件能透過所述樞接組件相對於所述支撐臂旋轉;所述輔助限位組件包含有一第一磁吸單元及一第二磁吸單元,所述第一磁吸單元固定設置於所述支撐臂,所述第二磁吸單元固定設置於所述輔助固定件,所述第一磁吸單元及所述第二磁吸單元能相互吸引,而相互吸引的所述第一磁吸單元及所述第二磁吸單元能限制所述輔助固定件透過所述樞接組件相對於所述支撐臂旋轉;各個 所述支撐臂的固定組件固定設置於所述輔助固定件;其中,當所述抽拉平台透過兩個所述樞接組件相對於兩個所述支撐臂旋轉時,兩個所述輔助固定件隨所述抽拉平台一併相對於兩個所述支撐臂旋轉。 The exposure apparatus according to claim 1, wherein each of the support arms has an auxiliary fixing member and an auxiliary limiting component, one end of the auxiliary fixing member is connected to the pivotal assembly, and the auxiliary fixing The component can rotate relative to the support arm through the pivot assembly; the auxiliary limit assembly includes a first magnetic attraction unit and a second magnetic attraction unit, the first magnetic attraction unit is fixedly disposed on the support Arm, the second magnetic attraction unit is fixedly arranged on the auxiliary fixing member, the first magnetic attraction unit and the second magnetic attraction unit can attract each other, and the first magnetic attraction unit and the The second magnetic attraction unit can restrict the auxiliary fixing member from rotating relative to the support arm through the pivotal assembly; The fixing assembly of the supporting arm is fixedly arranged on the auxiliary fixing member; wherein, when the drawing platform rotates relative to the two supporting arms through the two pivoting assemblies, the two auxiliary fixing members Rotate relative to the two support arms together with the drawing platform. 如請求項4所述的曝光設備,其中,各個所述輔助固定件設置有所述固定組件,各個所述固定組件包含有一鎖固件,所述抽拉平台對應具有兩個鎖固孔,各個所述鎖固件能受外力作用,而與相對應的所述鎖固孔相互鎖合,藉此所述抽拉平台能與兩個所述輔助固定件相互固定,而所述抽拉平台能受外力作用,以透過兩個所述樞接組件相對於兩個所述支撐臂旋轉。 The exposure apparatus according to claim 4, wherein each of the auxiliary fixing members is provided with the fixing assembly, each of the fixing assemblies includes a locking member, and the drawing platform has two locking holes corresponding to each The locking member can be subjected to an external force, and interlocks with the corresponding locking hole, whereby the drawing platform can be fixed to the two auxiliary fixing members, and the drawing platform can receive an external force Function to rotate relative to the two support arms through the two pivotal assemblies. 如請求項1所述的曝光設備,其中,各個所述固定組件包含有一鎖固件,所述抽拉平台對應於兩個所述鎖固件具有兩個鎖固孔;各個所述鎖固件能受外力作用而與相對應的所述鎖固孔相互鎖合。 The exposure apparatus according to claim 1, wherein each of the fixing components includes a locking member, and the drawing platform has two locking holes corresponding to the two locking members; each of the locking members can be subjected to external force To lock the corresponding locking holes with each other. 如請求項1所述的曝光設備,其中,所述機台本體內設置有多個限位組件,多個所述限位組件電性連接一控制裝置,所述控制裝置能控制多個所述限位組件作動,以限制所述抽拉平台於所述曝光空間中的活動範圍;所述控制裝置能控制多個所述限位組件作動,以使多個所述限位組件不限制所述抽拉平台於所述曝光空間中的活動範圍,藉此,所述抽拉平台能受外力作用以整體地離開所述曝光空間。 The exposure apparatus according to claim 1, wherein the machine body is provided with a plurality of limit components, the plurality of limit components are electrically connected to a control device, and the control device can control the plurality of limit devices The position component is actuated to limit the movement range of the drawing platform in the exposure space; the control device can control the actuation of the plurality of limit components so that the plurality of the limit components does not limit the extraction The movable range of the pulling platform in the exposure space, whereby the pulling platform can be externally applied to leave the exposure space as a whole. 如請求項7所述的曝光設備,其中,多個所述限位組件中的至少三個能受所述控制裝置控制,以對應限制所述抽拉平台於垂直座標系中的三軸方向的活動範圍。 The exposure apparatus according to claim 7, wherein at least three of the plurality of limit components can be controlled by the control device to correspondingly limit the three-axis direction of the drawing platform in the vertical coordinate system Range of activities. 如請求項7所述的曝光設備,其中,所述機台本體內設置有 一偵測模組,所述偵測模組電性連接所述控制裝置,所述偵測模組能偵測所述抽拉平台是否位於所述曝光空間中,當所述偵測模組偵測所述抽拉平台位於所述曝光空間中時,所述控制裝置能控制多個所述限位組件,以限制所述抽拉平台於所述曝光空間中的活動範圍。 The exposure apparatus according to claim 7, wherein the machine body is provided with A detection module, the detection module is electrically connected to the control device, the detection module can detect whether the drawing platform is located in the exposure space, when the detection module detects When the drawing platform is located in the exposure space, the control device can control a plurality of the limiting components to limit the movable range of the drawing platform in the exposure space. 如請求項1至9其中任一項所述的曝光設備,其中,兩個所述支撐臂的一端樞接於所述機台本體,各個所述支撐臂能受外力作用,以相對於所述機台本體旋轉,而各個所述支撐臂能據以於一收合位置及一展開位置之間移動;當兩個所述支撐臂位於所述收合位置時,兩個所述支撐臂的內側面面對所述機台本體設置;當兩個所述支撐臂位於所述展開位置時,兩個所述支撐臂的內側面彼此相面對地設置。 The exposure apparatus according to any one of claims 1 to 9, wherein one end of the two support arms is pivotally connected to the machine body, and each of the support arms can be subjected to an external force so as to be opposite to the The machine body rotates, and each of the support arms can move between a retracted position and a deployed position accordingly; when the two support arms are located at the retracted position, the The sides are arranged facing the machine body; when the two support arms are in the deployed position, the inner sides of the two support arms are arranged to face each other.
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Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN201201544Y (en) * 2008-04-15 2009-03-04 徐州海伦哲专用车辆有限公司 Vehicle-mounted type pulling and turning vice desk apparatus
TWM433579U (en) * 2011-12-30 2012-07-11 C Sun Mfg Ltd Withdrawal frame positioning device for glass film

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN201201544Y (en) * 2008-04-15 2009-03-04 徐州海伦哲专用车辆有限公司 Vehicle-mounted type pulling and turning vice desk apparatus
TWM433579U (en) * 2011-12-30 2012-07-11 C Sun Mfg Ltd Withdrawal frame positioning device for glass film

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