TWI681817B - Fluidized bed reactor for composing trichlorosilane - Google Patents

Fluidized bed reactor for composing trichlorosilane Download PDF

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TWI681817B
TWI681817B TW106132073A TW106132073A TWI681817B TW I681817 B TWI681817 B TW I681817B TW 106132073 A TW106132073 A TW 106132073A TW 106132073 A TW106132073 A TW 106132073A TW I681817 B TWI681817 B TW I681817B
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reactor
fine particles
fluidized bed
separator
bypass valve
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TW201821156A (en
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金俊煥
朴奎學
李東昊
金吉浩
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南韓商韓華化學股份有限公司
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B04CENTRIFUGAL APPARATUS OR MACHINES FOR CARRYING-OUT PHYSICAL OR CHEMICAL PROCESSES
    • B04CAPPARATUS USING FREE VORTEX FLOW, e.g. CYCLONES
    • B04C3/00Apparatus in which the axial direction of the vortex flow following a screw-thread type line remains unchanged ; Devices in which one of the two discharge ducts returns centrally through the vortex chamber, a reverse-flow vortex being prevented by bulkheads in the central discharge duct
    • B04C3/06Construction of inlets or outlets to the vortex chamber
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J8/00Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes
    • B01J8/18Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with fluidised particles
    • B01J8/1872Details of the fluidised bed reactor
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J8/00Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes
    • B01J8/18Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with fluidised particles
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B04CENTRIFUGAL APPARATUS OR MACHINES FOR CARRYING-OUT PHYSICAL OR CHEMICAL PROCESSES
    • B04CAPPARATUS USING FREE VORTEX FLOW, e.g. CYCLONES
    • B04C3/00Apparatus in which the axial direction of the vortex flow following a screw-thread type line remains unchanged ; Devices in which one of the two discharge ducts returns centrally through the vortex chamber, a reverse-flow vortex being prevented by bulkheads in the central discharge duct
    • B04C3/04Multiple arrangement thereof
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00Silicon; Compounds thereof
    • C01B33/08Compounds containing halogen
    • C01B33/107Halogenated silanes
    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00Silicon; Compounds thereof
    • C01B33/08Compounds containing halogen
    • C01B33/107Halogenated silanes
    • C01B33/1071Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Combustion & Propulsion (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Silicon Compounds (AREA)
  • Devices And Processes Conducted In The Presence Of Fluids And Solid Particles (AREA)
  • Fluidized-Bed Combustion And Resonant Combustion (AREA)

Abstract

A fluidized bed reactor for synthesizing trichlorosilane includes: a reactor setting an internal space in which that metal grade silicon reacts with feed gas to produce trichlorosilane gas by a hydrochlorination reaction and a direct chlorination reaction; a cyclone capturing fine particles micronized from the metal grade silicon to rise in the internal space of the reactor; a bypass line connected to the reactor so as to discharge the fine particles to the outside of the reactor; a bypass valve provided in the bypass line; and a separator connected to the bypass valve to separate and treat the fine particles from discharge gas discharged from the reactor.

Description

用以合成三氯矽烷之流化床反應器 Fluidized bed reactor for synthesizing trichlorosilane

本發明提供一種用以合成三氯矽烷的流化床反應器,可以使用冶金級矽並經由氫氯化反應(hydrochlorination reaction)以及直接氯化反應(direct chlorination reaction)而產生三氯矽烷氣體。 The invention provides a fluidized bed reactor for synthesizing trichlorosilane, which can use metallurgical grade silicon and generate trichlorosilane gas through hydrochlorination reaction and direct chlorination reaction.

在已知技術中,當冶金級矽具有98%至99%的純度時,將其進行氫氯化反應(hydrochlorination reaction)以及直接氯化反應(direct chlorination reaction),能夠產生三氯矽烷。利用西門子化學沉積反應(Siemens chemical vapor deposition reaction),三氯矽烷係用來產生純度為9N至11N或純度更高的高純度多晶矽。 In the known technology, when metallurgical grade silicon has a purity of 98% to 99%, it can be subjected to hydrochlorination reaction and direct chlorination reaction to produce trichlorosilane. Using Siemens chemical vapor deposition reaction (Siemens chemical vapor deposition reaction), trichlorosilane is used to produce high-purity polycrystalline silicon with a purity of 9N to 11N or higher.

流化床反應器可以用來合成三氯矽烷氣體。流化床反應器具有能夠利用顆粒的流動來使內溫保持不變且能夠利用增加固體和氣體間的接觸來使產率提升的優點。然而,流化床反應器具有操作與維護不易的缺點。 Fluidized bed reactors can be used to synthesize trichlorosilane gas. The fluidized bed reactor has the advantages of being able to use the flow of particles to keep the internal temperature constant and to increase the yield by increasing the contact between solids and gases. However, the fluidized bed reactor has the disadvantage that it is not easy to operate and maintain.

當冶金級矽與進料氣體在反應器中完成反應時會產生三氯矽烷。至此,冶金級矽會隨著時間進行而被微粒化(micronized)並在反應器中逐漸累積。 When the metallurgical grade silicon and the feed gas complete the reaction in the reactor, trichlorosilane is produced. At this point, metallurgical grade silicon will be micronized with time and accumulate in the reactor.

少量的微細顆粒對於反應器中冶金級矽的平穩流動(smooth flow)特性具有正面的影響,但是當微細顆粒過量地累積時,可能會發生溝流(channeling)或塞流(slugging)現象。 A small amount of fine particles has a positive effect on the smooth flow characteristics of metallurgical grade silicon in the reactor, but when excessive accumulation of fine particles, channeling or slugging may occur.

當溝流或塞流現象發生時,氣體和固體之間的接觸效率(contact efficiency)會下降,對於反應性有負面的影響。再者,當不具有反應性的微細顆粒在反應器中累積時,三氯矽烷的產率將產生問題。 When the phenomenon of channel flow or plug flow occurs, the contact efficiency between gas and solid will decrease, which will have a negative effect on the reactivity. Furthermore, when fine particles that are not reactive accumulate in the reactor, the yield of trichlorosilane will cause problems.

對此,需要移除累積在反應器中的微細顆粒。然而,由於反應器的特性是將進料氣體由反應器的下部分注入,因此尺寸微小的微細顆粒將被抬升至反應器的上部分並且再次經由旋風分離器所收集,再經由返料器(dipleg)返回反應器中。 In this regard, it is necessary to remove fine particles accumulated in the reactor. However, due to the characteristic of the reactor that the feed gas is injected from the lower part of the reactor, the fine particles with small size will be lifted to the upper part of the reactor and collected again by the cyclone separator, and then by the feeder ( dipleg) Return to the reactor.

少量沒有被反應器所收集到的微細顆粒會被排出反應器外,但被排出反應器的微細顆粒的數量會小於累積在反應器中微細顆粒的數量。也就是說,因為微細顆粒會在反應器中累積,隨著反應器的操作時間越長,流化床反應器的穩定性越不佳。 A small amount of fine particles not collected by the reactor will be discharged out of the reactor, but the amount of fine particles discharged from the reactor will be smaller than the amount of fine particles accumulated in the reactor. That is to say, because fine particles will accumulate in the reactor, the longer the operating time of the reactor, the worse the stability of the fluidized bed reactor.

因此,為了移除累積在反應器中的微細顆粒,必須要停止運轉流化床反應器,造成產率下降以及經濟損失。為了能移除微細顆粒並同時避免上述損失,除了旋風分離器之外,還需要另外提供排出及控制微細顆粒的裝置以及用以分離與處理排出的微細顆粒的裝置。 Therefore, in order to remove the fine particles accumulated in the reactor, it is necessary to stop the operation of the fluidized bed reactor, resulting in a decrease in productivity and economic loss. In order to be able to remove the fine particles while avoiding the above-mentioned losses, in addition to the cyclone, it is necessary to additionally provide a device for discharging and controlling the fine particles and a device for separating and processing the discharged fine particles.

本發明是提供用以合成三氯矽烷的流化床反應器,其具有能夠將冶金級矽進行氫氯化反應以及直接氯化反應而產生三氯矽烷的優點。 The present invention is to provide a fluidized bed reactor for synthesizing trichlorosilane, which has the advantage of producing hydrochlorochlorination reaction and direct chlorination reaction of metallurgical grade silicon to produce trichlorosilane.

再者,本發明是提供用以合成三氯矽烷的流化床反應器,其具有在合成三氯矽烷時,能夠將反應器中產生的微細顆粒移除至反應器外部的優點。 Furthermore, the present invention provides a fluidized bed reactor for synthesizing trichlorosilane, which has the advantage of being able to remove fine particles generated in the reactor to the outside of the reactor when synthesizing trichlorosilane.

本發明的一實施例提供一用以合成三氯矽烷的流化床反應器,其中包含:一反應器,其具有一內部空間,使冶金級矽與進料氣體在其中進行反應,經由氫氯化反應以及直接氯化反應而產生三氯矽烷氣體;旋風分離器,用以收集自冶金級矽微粒化並在反應器的內部空間被抬升的微細顆粒;旁通線路,連接至該反應器,用以將該微細顆粒排出到該反應器的外部;旁通閥,設置於該旁通線路中;以及分離器,連接至該旁通閥,用以將該微細顆粒自該反應器排出的排出氣體分離與處理。 An embodiment of the present invention provides a fluidized bed reactor for synthesizing trichlorosilane, which includes: a reactor having an internal space in which metallurgical grade silicon reacts with feed gas through hydrogen chloride Chemical reaction and direct chlorination reaction to produce trichlorosilane gas; cyclone separator, used to collect fine particles from metallurgical grade silicon granulated and lifted in the internal space of the reactor; bypass line, connected to the reactor, Used to discharge the fine particles to the outside of the reactor; a bypass valve provided in the bypass line; and a separator connected to the bypass valve for discharging the fine particles from the reactor Gas separation and treatment.

旁通閥可以調整該旁通線路的開度(opening degree)。 The bypass valve can adjust the opening degree of the bypass line.

旁通閥的開口面積(opening area,OA)對該旋風分離器的進料面積(inlet area,IA)的比例(OA:IA)是1比1,1比5以及1比10的其中一者(OA:IA=1:1、1:5或1:10)。旁通線路以及旁通閥的材料具有高抗腐蝕性且可選自由Incoloy 800合金、Incoloy 800H合金以及Hastelloy合金的其中一種所製作。 The ratio of the opening area (OA) of the bypass valve to the inlet area (IA) of the cyclone separator (OA: IA) is one of 1 to 1, 1 to 5 and 1 to 10 (OA: IA=1:1, 1:5 or 1:10). The material of the bypass line and the bypass valve has high corrosion resistance and can be selected from one of Incoloy 800 alloy, Incoloy 800H alloy and Hastelloy alloy.

分離器可包含:腔體,連接於旁通線路;旋風分離器,設置於該腔體內;以及過濾器,設置於該旋風分離器的一進料線路。該分離器所包含的過 濾器可選自垂直過濾器、水平過濾器以及陶瓷膜的其中一種。 The separator may include: a cavity connected to the bypass line; a cyclone separator provided in the cavity; and a filter provided in a feed line of the cyclone separator. The separator contains The filter can be selected from one of a vertical filter, a horizontal filter, and a ceramic membrane.

分離器的材料係具有高抗腐蝕性,且選自由Incoloy 800合金、Incoloy 800H合金以及Hastelloy合金的其中一種所製作。 The material of the separator has high corrosion resistance and is selected from one of Incoloy 800 alloy, Incoloy 800H alloy and Hastelloy alloy.

根據本發明的一實施例,在合成三氯矽烷時,在反應器的內部空間自冶金級矽微粒化的微細顆粒會被排出到反應器的外部,藉此移除微細顆粒,因此可以穩定流化床反應器。另外,可以避免停止運轉流化床反應器,藉此,運作時間可以延長,三氯矽烷氣體的產率與冶金級矽的流動特性可以被改善,成本也可以下降。再者,在後續製程階段因為反應器內存在有微細顆粒而可能產生的問題也可以因此被避免。 According to an embodiment of the present invention, when trichlorosilane is synthesized, the fine particles that are micronized from metallurgical grade silicon in the internal space of the reactor are discharged to the outside of the reactor, thereby removing the fine particles, so that the flow can be stabilized Fluidized bed reactor. In addition, it is possible to avoid stopping the operation of the fluidized bed reactor, whereby the operation time can be extended, the yield of trichlorosilane gas and the flow characteristics of metallurgical grade silicon can be improved, and the cost can also be reduced. Furthermore, problems that may arise due to the presence of fine particles in the reactor during the subsequent process stages can also be avoided.

10‧‧‧反應器 10‧‧‧Reactor

20‧‧‧旋風分離器 20‧‧‧Cyclone

21‧‧‧進料線路 21‧‧‧ Feeding line

30‧‧‧旁通線路 30‧‧‧Bypass line

40‧‧‧旁通閥 40‧‧‧Bypass valve

50‧‧‧分離器 50‧‧‧separator

51‧‧‧腔體 51‧‧‧ Cavity

52‧‧‧旋風分離器 52‧‧‧Cyclone

53‧‧‧過濾器 53‧‧‧filter

60‧‧‧熱交換器 60‧‧‧ heat exchanger

61‧‧‧第一排出線路 61‧‧‧ First discharge line

62‧‧‧第二排出線路 62‧‧‧Second discharge line

63‧‧‧防倒流閥 63‧‧‧Anti-return valve

64‧‧‧幫浦 64‧‧‧Pump

IA‧‧‧進料面積 IA‧‧‧ Feeding area

OA‧‧‧開口面積 OA‧‧‧Opening area

P‧‧‧微細顆粒 P‧‧‧fine particles

第1圖所示為本發明一示範性實施例的用以合成三氯矽烷的流化床反應器的結構示意圖。 FIG. 1 is a schematic structural diagram of a fluidized bed reactor for synthesizing trichlorosilane according to an exemplary embodiment of the present invention.

以下詳細列舉本發明的實施例,並配合附圖詳細說明,以使所屬技術領域中具有通常知識者能夠據以實現本發明。所屬技術領域中具有通常知識者應當理解,本發明所舉的數個實施例可以在不脫離本揭露的精神下,將所揭露的實施例以不同方式進行調整以實現本發明。 The embodiments of the present invention are listed in detail below, and detailed descriptions are provided in conjunction with the accompanying drawings, so that those with ordinary knowledge in the technical field can implement the present invention accordingly. Those of ordinary skill in the art should understand that several of the embodiments of the present invention can be adjusted in different ways to achieve the present invention without departing from the spirit of the present disclosure.

須注意的是,附圖為簡化的示意圖,並不以此限制本發明。並且, 附圖中另外以符號搭配說明說明書中所述的各種組件。 It should be noted that the drawings are simplified schematic diagrams, which do not limit the present invention. and, In the drawings, symbols are used to describe various components described in the specification.

另外,為了方便說明,本發明的附圖中並非以等比例繪製各種組件的尺寸及厚度,且本發明的內容並不受限於附圖所示的內容。 In addition, for convenience of description, the size and thickness of various components are not drawn in equal proportions in the drawings of the present invention, and the content of the present invention is not limited to the content shown in the drawings.

當在本說明書中稱一部件連接到另一部件時,其包括這些部件彼此直接連接的情況,也可能包括這些部件之間還還是設置有其他元件的間接連接的情況。再者,在本說明屋中,在沒有特別描述出其他相反情況時,「包含/包括任何裝置/構件」都可以理解為這些裝置/構件的存在,但不排除其他裝置/構件的存在。 When it is said in this specification that a component is connected to another component, it includes the case where these components are directly connected to each other, and may also include the case where these components are still indirectly connected with other elements. In addition, in this description room, when there is no other contrary situation specifically described, "including/including any device/component" can be understood as the existence of these devices/components, but the existence of other devices/components is not excluded.

第1圖所示為本發明一示範性實施例的用以合成三氯矽烷的流化床反應器的結構示意圖。如第1圖所示,本發明一示範性實施例的用以合成三氯矽烷的流化床反應器(以下皆以流化床反應器指稱)包含反應器10、旋風分離器20、旁通線路30、旁通閥40以及分離器50。 FIG. 1 is a schematic structural diagram of a fluidized bed reactor for synthesizing trichlorosilane according to an exemplary embodiment of the present invention. As shown in FIG. 1, a fluidized bed reactor for synthesizing trichlorosilane (hereinafter referred to as fluidized bed reactor) according to an exemplary embodiment of the present invention includes a reactor 10, a cyclone separator 20, and a bypass Line 30, bypass valve 40, and separator 50.

反應器10具有一內部空間,在其中會進行反應。冶金級矽與進料氣體會在該內部空間經由一氫氯化(hydrochlorination)反應以及直接氯化(direct chlorination)反應而產生三氯矽烷氣體,並且隨著時間產生微粒化的微細顆粒P。 The reactor 10 has an internal space in which the reaction takes place. Metallurgical-grade silicon and feed gas will generate trichlorosilane gas through the hydrochlorination reaction and direct chlorination reaction in the internal space, and generate micronized fine particles P with time.

舉例來說,將冶金級矽被供應至反應器10的內部空間中(圖未示),並且將用以流態化(fluidizing)冶金級矽的進料氣體供應至反應器10中。進料氣體係由反應器10的下部分往上供應,以使冶金級矽流態化。 For example, metallurgical grade silicon is supplied into the internal space of the reactor 10 (not shown), and feed gas for fluidizing metallurgical grade silicon is supplied into the reactor 10. The feed gas system is supplied upward from the lower part of the reactor 10 to fluidize the metallurgical grade silicon.

當合成三氯矽烷時,反應器10中內部空間的微細顆粒P會被抬升。反應器10中的內部空間設置有一旋風分離器20,用以收集內部空間中被抬升的微細顆粒P,而部分沒有被收集的微細顆粒P通過第一排出線路61被排出至熱交換器60。 When trichlorosilane is synthesized, the fine particles P in the inner space of the reactor 10 will be lifted. A cyclone separator 20 is provided in the inner space of the reactor 10 to collect the lifted fine particles P in the inner space, and part of the fine particles P that have not been collected are discharged to the heat exchanger 60 through the first discharge line 61.

經由旋風分離器20的進料線路21所收集到的微細顆粒P會經由連接旋風分離器20的返料器22而送回反應器10的內部空間,因此可以再使用這些微細顆粒P將冶金級矽進行流體化。 The fine particles P collected through the feed line 21 of the cyclone 20 will be sent back to the internal space of the reactor 10 through the feeder 22 connected to the cyclone 20, so these fine particles P can be reused Silicon is fluidized.

旁通線路30連接反應器10的上部分,用以將在內部空間內被抬升的微細顆粒P排出到反應器10之外。也就是說,在合成三氯矽烷時,旁通線路30以及旋風分離器20可以收集反應器10的上部分中的微細顆粒P,以移除微細顆粒P。 The bypass line 30 is connected to the upper part of the reactor 10 to discharge the fine particles P lifted up in the internal space out of the reactor 10. That is, when trichlorosilane is synthesized, the bypass line 30 and the cyclone 20 can collect the fine particles P in the upper part of the reactor 10 to remove the fine particles P.

在旁通線路30中提供有旁通閥40,藉此,當需要排出微細顆粒P時,經由開/關操作以及開度(opening degree)調整操作,可以調整旁通線路30的開/關以及開度。藉此,可以不需要將反應器10停止運作也可以連續地排出微細顆粒P。 A bypass valve 40 is provided in the bypass line 30, whereby when the fine particles P need to be discharged, the opening/closing of the bypass line 30 can be adjusted and the opening/closing operation and the opening degree adjustment operation can be adjusted. Opening degree. Thereby, the fine particles P can be continuously discharged without stopping the operation of the reactor 10.

因此,用以合成三氯矽烷的反應器10的操作時間可以延長,三氯矽烷的產率能夠被提升,成本也可以下降。 Therefore, the operation time of the reactor 10 for synthesizing trichlorosilane can be extended, the yield of trichlorosilane can be increased, and the cost can also be reduced.

舉例來說,旁通線路30以及旁通閥40可以由具有高抗腐蝕性的Incoloy 800合金、Incoloy 800H合金或Hastelloy合金所製作。因此,可以有效地防止排出氣體以及微細顆粒對於旁通線路30以及旁通閥40的腐蝕。 For example, the bypass line 30 and the bypass valve 40 may be made of Incoloy 800 alloy, Incoloy 800H alloy, or Hastelloy alloy with high corrosion resistance. Therefore, it is possible to effectively prevent the exhaust gas and fine particles from corroding the bypass line 30 and the bypass valve 40.

同時,旁通閥40的開口面積(opening area,OA)對旋風分離器20的進料面積(inlet area,IA)的比例(OA:IA)是1比1,1比5以及1比10的其中一者。 At the same time, the ratio of the opening area (OA) of the bypass valve 40 to the inlet area (IA) of the cyclone 20 (OA: IA) is 1 to 1, 1 to 5 and 1 to 10. One of them.

也就是說,微細顆粒P可以被引入旋風分離器20或被移出至上部的旁通閥40。被引入旋風分離器20的進料線路21的大多數微細顆粒P會被收集並且送回至反應器10中,但部分微細顆粒P會沒有被收集到而散失,因此會通過第一排出線路61而排出。在此同時,被移至上部旁通閥40的微細顆粒P可以經由旁通線路30被排出至反應器10外部。分離器50與旁通閥40連接以分離和處理自反應器10排出的排出氣體中的微細顆粒P。 That is, the fine particles P may be introduced into the cyclone 20 or be removed to the upper bypass valve 40. Most of the fine particles P introduced into the feed line 21 of the cyclone 20 will be collected and sent back to the reactor 10, but part of the fine particles P will not be collected and lost, so it will pass through the first discharge line 61 And discharged. At the same time, the fine particles P moved to the upper bypass valve 40 can be discharged to the outside of the reactor 10 via the bypass line 30. The separator 50 is connected to the bypass valve 40 to separate and process the fine particles P in the exhaust gas discharged from the reactor 10.

在反應器10的內部空間中的旁通線路30以及旁通閥40可以和旋風分離器20分開設置,以調整自反應器10排出的微細顆粒P的排出量。也就是說,旁通閥40可以調整微細顆粒P的排出速率至大於反應器10中微細顆粒P的累積速率。 The bypass line 30 and the bypass valve 40 in the internal space of the reactor 10 may be provided separately from the cyclone 20 to adjust the discharge amount of the fine particles P discharged from the reactor 10. That is, the bypass valve 40 can adjust the discharge rate of the fine particles P to be greater than the accumulation rate of the fine particles P in the reactor 10.

如同上述,由於旁通線路30、旁通閥40以及分離器50可移除微細顆粒P,其中微細顆粒P會造成反應器10內部空間中的冶金級矽流動特性不穩定並且不具有反應性,因此能夠使反應器10延長操作而不須停止運作。藉此,可以避免停止運作反應器10所造成的經濟損失。 As mentioned above, since the bypass line 30, the bypass valve 40 and the separator 50 can remove the fine particles P, the fine particles P will cause the flow characteristics of the metallurgical grade silicon in the internal space of the reactor 10 to be unstable and not reactive Therefore, the operation of the reactor 10 can be extended without stopping the operation. Thereby, the economic loss caused by stopping the operation of the reactor 10 can be avoided.

經由調整開度以控制微細顆粒P的排出速率,旁通閥40可以穩定反應器10內部空間中的冶金級矽的流動特性。因此,經由控制微細顆粒P的排出速率可以降低不必要的產率損失。 By adjusting the opening degree to control the discharge rate of the fine particles P, the bypass valve 40 can stabilize the flow characteristics of the metallurgical grade silicon in the internal space of the reactor 10. Therefore, unnecessary loss of productivity can be reduced by controlling the discharge rate of the fine particles P.

舉例來說,分離器50可包括連接於旁通線路30的腔體51、設置在腔體51中的旋風分離器52以及設置在旋風分離器52的進料線路的過濾器53。 For example, the separator 50 may include a cavity 51 connected to the bypass line 30, a cyclone separator 52 provided in the cavity 51, and a filter 53 provided in the feed line of the cyclone separator 52.

因此,包含在排出氣體中而通過旁通線路30被引入分離器50的微細顆粒P會被設置在旋風分離器52的進料線路中的過濾器53所過濾,並且被收集在腔體51中。 Therefore, the fine particles P contained in the exhaust gas and introduced into the separator 50 through the bypass line 30 are filtered by the filter 53 provided in the feed line of the cyclone 52 and collected in the cavity 51 .

舉例來說,過濾器53可以由垂直過濾器、水平過濾器或陶瓷膜所構成,取決於旋風分離器52的進料線路的位置。 For example, the filter 53 may be composed of a vertical filter, a horizontal filter, or a ceramic membrane, depending on the position of the feed line of the cyclone 52.

舉例來說,分離器50具有高抗腐蝕性並由Incoloy 800合金、Incoloy 800H合金或Hastelloy合金所製作。因此,可以有效地防止排出氣體以及微細顆粒P對於分離器50的腐蝕。 For example, the separator 50 has high corrosion resistance and is made of Incoloy 800 alloy, Incoloy 800H alloy, or Hastelloy alloy. Therefore, corrosion of the separator 50 by the exhaust gas and the fine particles P can be effectively prevented.

自冶金級矽微粒化並在反應器10的內部空間形成的微細顆粒P的排出可以經由控制旁通閥40的開口面積來決定。因此,不具有反應性的微細顆粒P便不會在反應器10的內部空間中累積,或者所累積的微細顆粒P是在冶金級矽的流動特性不被抑制的範圍內。 The discharge of the fine particles P formed from metallurgical grade silicon and formed in the internal space of the reactor 10 can be determined by controlling the opening area of the bypass valve 40. Therefore, the fine particles P having no reactivity will not accumulate in the internal space of the reactor 10, or the accumulated fine particles P are within the range where the flow characteristics of metallurgical grade silicon are not suppressed.

根據本發明的一示範性實施例,流化床反應器還包含連接於反應器10內部空間中的旋風分離器20以及分離器50的熱交換器60。 According to an exemplary embodiment of the present invention, the fluidized bed reactor further includes a heat exchanger 60 connected to the cyclone 20 and the separator 50 in the internal space of the reactor 10.

因此,旋風分離器20係經由第一排出線路61連接於熱交換器60。在微細顆粒P被旋風分離器20收集之後,包含部分沒有被收集的微細顆粒P的高溫 排出氣體會通過第一排出線路61被排出至熱交換器60。 Therefore, the cyclone 20 is connected to the heat exchanger 60 via the first discharge line 61. After the fine particles P are collected by the cyclone 20, the high temperature containing part of the fine particles P that are not collected The exhaust gas is exhausted to the heat exchanger 60 through the first exhaust line 61.

分離器50係經由第二排出線路62連接於熱交換器60。在微細顆粒P被分離器50分離及處理後,高溫排出氣體會通過第二排出線路62被排出至熱交換器60。 The separator 50 is connected to the heat exchanger 60 via the second discharge line 62. After the fine particles P are separated and processed by the separator 50, the high-temperature exhaust gas is exhausted to the heat exchanger 60 through the second exhaust line 62.

第二排出線路62中設置有防倒流閥63(backflow prevention valve),因此當高溫排出氣體被排出至第二排出線路62時,能夠避免來自第一排出線路61以及熱交換器60的高溫排出氣體倒流至第二排出線路62。 The second exhaust line 62 is provided with a backflow prevention valve 63. Therefore, when high-temperature exhaust gas is exhausted to the second exhaust line 62, high-temperature exhaust gas from the first exhaust line 61 and the heat exchanger 60 can be avoided倒流到第二排线62。 The reverse flow to the second discharge line 62.

另外,幫浦64連接於熱交換器60的末端。當高溫排出氣體通過第一排出線路61、第二排出線路62以及熱交換器60時,幫浦64排出自高溫排出氣體冷卻的淬火氣體(quenching gas)。 In addition, the pump 64 is connected to the end of the heat exchanger 60. When the high-temperature exhaust gas passes through the first exhaust line 61, the second exhaust line 62, and the heat exchanger 60, the pump 64 exhausts the quenching gas cooled from the high-temperature exhaust gas.

如同上述,由於微細顆粒P在分離器50中被分開處理,因此能避免在反應器10的後續製程階段結構(例如熱交換器60及幫浦64等)中可能因微細顆粒P所產生的問題。 As described above, since the fine particles P are processed separately in the separator 50, problems that may be caused by the fine particles P in the subsequent process stage structure of the reactor 10 (such as the heat exchanger 60 and the pump 64, etc.) can be avoided .

舉例來說,根據一示範性實施例,當流化床反應器合成三氯矽烷時,反應器10的內部空間的上部分勢必會有散布的微細顆粒P。在這個情況下,從反應器10的旁通線路30所排出的微細顆粒P的數量係經由調整旁通閥40的開口面積而調整。以上敘述可以經由以下實驗例證實。 For example, according to an exemplary embodiment, when trichlorosilane is synthesized in a fluidized bed reactor, the upper part of the internal space of the reactor 10 is bound to have scattered fine particles P. In this case, the amount of fine particles P discharged from the bypass line 30 of the reactor 10 is adjusted by adjusting the opening area of the bypass valve 40. The above description can be verified by the following experiment.

請參考第一實驗例,當反應器10的內部空間中的冶金級矽以及進料 氣體的流動速率是0.1m/s,且旁通閥40的開口面積(OA)對旋風分離器20的進料面積(IA)的面積比例(OA:IA)為1:1時,微細顆粒P通過旁通閥40的排出速率為8.75g/min。 Please refer to the first experimental example, when the metallurgical grade silicon and the feed in the internal space of the reactor 10 When the flow rate of the gas is 0.1 m/s, and the area ratio (OA:IA) of the opening area (OA) of the bypass valve 40 to the feeding area (IA) of the cyclone 20 is 1:1, the fine particles P The discharge rate through the bypass valve 40 was 8.75 g/min.

請參考第二實驗例,當反應器10的內部空間中的冶金級矽以及進料氣體的流動速率是0.1m/s,且旁通閥40的開口面積對旋風分離器的進料面積的面積比例(OA:IA)為1:5時,微細顆粒P通過旁通閥40的排出速率為1.67g/min。 Please refer to the second experimental example, when the flow rate of the metallurgical grade silicon and the feed gas in the internal space of the reactor 10 is 0.1 m/s, and the opening area of the bypass valve 40 is the area of the feed area of the cyclone separator When the ratio (OA:IA) is 1:5, the discharge rate of the fine particles P through the bypass valve 40 is 1.67 g/min.

請參考第三實驗例,當反應器10的內部空間中的冶金級矽以及進料氣體的流動速率是0.1m/s,且旁通閥40的開口面積對旋風分離器的進料面積的面積比例(OA:IA)為1:10時,微細顆粒P通過旁通閥40的排出速率為0.3g/min。 Please refer to the third experimental example, when the flow rate of the metallurgical grade silicon and the feed gas in the internal space of the reactor 10 is 0.1 m/s, and the opening area of the bypass valve 40 is the area of the feed area of the cyclone separator When the ratio (OA:IA) is 1:10, the discharge rate of the fine particles P through the bypass valve 40 is 0.3 g/min.

參考第一實驗例至第三實驗例,能夠理解到在相同流動速率(0.1m/s)下,當面積比例(OA:IA)上升時,相比於進料面積(IA),開口面積(OA)會下降,且微細顆粒P通過旁通閥40的排出速率會下降。 With reference to the first to third experimental examples, it can be understood that at the same flow rate (0.1 m/s), when the area ratio (OA: IA) increases, compared to the feed area (IA), the opening area ( OA) will decrease, and the discharge rate of fine particles P through the bypass valve 40 will decrease.

請參考第四實驗例,當反應器10的內部空間中的冶金級矽以及進料氣體的流動速率是0.15m/s,且旁通閥40的開口面積對旋風分離器的進料面積的面積比例(OA:IA)為1:1時,微細顆粒P通過旁通閥40的排出速率為25g/min。 Please refer to the fourth experimental example, when the flow rate of the metallurgical grade silicon and the feed gas in the internal space of the reactor 10 is 0.15 m/s, and the opening area of the bypass valve 40 is the area of the feed area of the cyclone separator When the ratio (OA:IA) is 1:1, the discharge rate of the fine particles P through the bypass valve 40 is 25 g/min.

請參考第五實驗例,當反應器10的內部空間中的冶金級矽以及進料氣體的流動速率是0.15m/s,且旁通閥40的開口面積對旋風分離器的進料面積的面積比例(OA:IA)為1:5時,微細顆粒P通過旁通閥40的排出速率為8.33g/min。 Please refer to the fifth experimental example, when the flow rate of the metallurgical grade silicon and the feed gas in the internal space of the reactor 10 is 0.15 m/s, and the opening area of the bypass valve 40 is the area of the feed area of the cyclone separator When the ratio (OA:IA) is 1:5, the discharge rate of the fine particles P through the bypass valve 40 is 8.33 g/min.

請參考第六實驗例,當反應器10的內部空間中的冶金級矽以及進料氣體的流動速率是0.15m/s,且旁通閥40的開口面積對旋風分離器的進料面積的面積比例(OA:IA)為1:1時,微細顆粒P通過旁通閥40的排出速率為1.6g/min。 Please refer to the sixth experimental example, when the flow rate of the metallurgical grade silicon and the feed gas in the internal space of the reactor 10 is 0.15 m/s, and the opening area of the bypass valve 40 is the area of the feed area of the cyclone separator When the ratio (OA:IA) is 1:1, the discharge rate of the fine particles P through the bypass valve 40 is 1.6 g/min.

參考第四實驗例至第六實驗例,能夠理解到在相同流動速率(0.1m/s)下,當面積比例(OA:IA)上升時,相比於進料面積(IA),開口面積(OA)的比例會下降,且微細顆粒P通過旁通閥40的排出速率會下降。 With reference to the fourth to sixth experimental examples, it can be understood that at the same flow rate (0.1 m/s), when the area ratio (OA: IA) increases, the opening area is (compared to the feed area (IA)) OA) ratio will decrease, and the discharge rate of fine particles P through the bypass valve 40 will decrease.

在第一實驗例至第三實驗例中,流動速率為0.1m/s,在第四實驗例至第六實驗例,流動速率為0.15m/s。從以上所述,能夠理解到當流動速率上升,微細顆粒P的排出速率具有顯著的不同。 In the first to third experimental examples, the flow rate is 0.1 m/s, and in the fourth to sixth experimental examples, the flow rate is 0.15 m/s. From the above, it can be understood that when the flow rate increases, the discharge rate of the fine particles P is significantly different.

在流化床反應器的一般操作下,維持防倒流閥63以及旁通閥40同時關閉的狀態。分離器50維持和反應器10相同的內部壓力。也就是說,當不需要排出微細顆粒P時,大多數旋風分離器20所收集到的微細顆粒P會在內部空間中被再循環(re-circulated)。 Under normal operation of the fluidized bed reactor, the state in which the anti-backflow valve 63 and the bypass valve 40 are simultaneously closed is maintained. The separator 50 maintains the same internal pressure as the reactor 10. That is, when there is no need to discharge the fine particles P, most of the fine particles P collected by the cyclone 20 will be re-circulated in the internal space.

當不需要排出微細顆粒P時,反應器10的旁通閥40和防倒流閥63同時開啟,藉此排出氣體形成流向分離器50的流體。因此,微細顆粒P被排出至反應器10的外部。 When it is not necessary to discharge the fine particles P, the bypass valve 40 and the anti-backflow valve 63 of the reactor 10 are simultaneously opened, thereby exhausting the gas to form a fluid flowing to the separator 50. Therefore, the fine particles P are discharged to the outside of the reactor 10.

在此,熱交換器60係在壓力小於反應器10約1至2巴(bar)的情況下運作。因此,排出至分離器50的高溫排出氣體通過第二排出線路62以及防倒流閥63被供應至熱交換器60。幫浦64係在壓力小於熱交換器60約1至2巴(bar)的情況下運 作。取決於幫浦64的驅動,熱交換器60中所冷卻的淬火氣體可以自熱交換器60中被排出。 Here, the heat exchanger 60 is operated at a pressure lower than the reactor 10 by about 1 to 2 bar. Therefore, the high-temperature exhaust gas discharged to the separator 50 is supplied to the heat exchanger 60 through the second discharge line 62 and the backflow prevention valve 63. Pump 64 is operated at a pressure less than heat exchanger 60 by about 1 to 2 bar Make. Depending on the driving of the pump 64, the quenching gas cooled in the heat exchanger 60 may be discharged from the heat exchanger 60.

在微細顆粒P自反應器10被完全排出至分離器50之後,經由關閉防倒流閥以阻隔排出氣體被排出。接著,經由關閉反應器10的旁通閥40以阻隔排出氣體以及微細顆粒P被排出。 After the fine particles P are completely discharged from the reactor 10 to the separator 50, they are discharged by closing the anti-backflow valve to block the discharged gas. Next, the bypass valve 40 of the reactor 10 is closed to block the exhaust gas and the fine particles P from being discharged.

以上所述僅為本發明的示範性實施例而已,並不用於限制本發明,對於本領域的技術人員來說,本發明可以有各種更改和變化。凡在本發明的精神和原則之內,所作的任何修改、等同替換、改進等,均應包含在本發明的保護範圍之內。 The above are only exemplary embodiments of the present invention and are not intended to limit the present invention. For those skilled in the art, the present invention may have various modifications and changes. Any modification, equivalent replacement, improvement, etc. made within the spirit and principle of the present invention shall be included in the protection scope of the present invention.

10‧‧‧反應器 10‧‧‧Reactor

20‧‧‧旋風分離器 20‧‧‧Cyclone

21‧‧‧進料線路 21‧‧‧ Feeding line

30‧‧‧旁通線路 30‧‧‧Bypass line

40‧‧‧旁通閥 40‧‧‧Bypass valve

50‧‧‧分離器 50‧‧‧separator

51‧‧‧腔體 51‧‧‧ Cavity

52‧‧‧旋風分離器 52‧‧‧Cyclone

53‧‧‧過濾器 53‧‧‧filter

60‧‧‧熱交換器 60‧‧‧ heat exchanger

61‧‧‧第一排出線路 61‧‧‧ First discharge line

62‧‧‧第二排出線路 62‧‧‧Second discharge line

63‧‧‧防倒流閥 63‧‧‧Anti-return valve

64‧‧‧幫浦 64‧‧‧Pump

IA‧‧‧進料面積 IA‧‧‧ Feeding area

OA‧‧‧開口面積 OA‧‧‧Opening area

P‧‧‧微細顆粒 P‧‧‧fine particles

Claims (6)

一種流化床反應器(fluidized bed reactor),用以合成三氯矽烷(trichlorosilane),該流化床反應器包含:一反應器,具有一內部空間使冶金級矽與進料氣體在其中進行反應,經由一氫氯化反應(hydrochlorination reaction)以及直接氯化反應(direct chlorination reaction)而產生三氯矽烷氣體;一旋風分離器(cyclone),用以收集自該冶金級矽微粒化並在該反應器的該內部空間被抬升的微細顆粒;一旁通線路,由該反應器之外部連接至該反應器,用以將該微細顆粒排出到該反應器的外部;一旁通閥,設置於該旁通線路中;以及一分離器,設置在該反應器之外並連接至該旁通閥,用以將該微細顆粒自該反應器排出的排出氣體分離與處理(treat),以及其中該旁通閥可以調整該旁通線路的開/關以及開度(opening degree),以控制自該反應器排出至該分離器的該排出氣體的量。 A fluidized bed reactor for synthesizing trichlorosilane (trichlorosilane). The fluidized bed reactor includes: a reactor having an internal space for metallurgical grade silicon to react with feed gas therein , Through a hydrochlorination reaction (hydrochlorination reaction) and direct chlorination reaction (direct chlorination reaction) to produce trichlorosilane gas; a cyclone (cyclone), used to collect the metallurgical grade silicon particles and in the reaction Fine particles whose internal space of the reactor is lifted; a bypass line connected from the outside of the reactor to the reactor for discharging the fine particles to the outside of the reactor; a bypass valve provided on the bypass In the circuit; and a separator, which is provided outside the reactor and connected to the bypass valve, for separating and treating the exhaust gas of the fine particles discharged from the reactor, and wherein the bypass valve The opening/closing and opening degree of the bypass line can be adjusted to control the amount of the exhaust gas discharged from the reactor to the separator. 如請求項1所述的流化床反應器,其中該旁通閥的一開口面積(opening area,OA)對該旋風分離器的一進料面積(inlet area,IA)的比例(OA:IA)是1比1,1比5以及1比10的其中一者。 The fluidized bed reactor according to claim 1, wherein the ratio of an opening area (OA) of the bypass valve to an inlet area (IA) of the cyclone separator (OA: IA ) Is one of 1 to 1, 1 to 5 and 1 to 10. 如請求項1所述的流化床反應器,其中該旁通線路以及該旁通閥的材料具有高抗腐蝕性且由Incoloy 800合金、Incoloy 800H合金以及Hastelloy合金的其中一種所製作。 The fluidized bed reactor according to claim 1, wherein materials of the bypass line and the bypass valve have high corrosion resistance and are made of one of Incoloy 800 alloy, Incoloy 800H alloy, and Hastelloy alloy. 如請求項1所述的流化床反應器,其中該分離器包含:一腔體連接於該旁通線路;一旋風分離器設置於該腔體內;以及一過濾器設置於該旋風分離器的一進料線路。 The fluidized bed reactor according to claim 1, wherein the separator includes: a cavity connected to the bypass line; a cyclone separator disposed in the cavity; and a filter disposed in the cyclone separator One feed line. 如請求項1所述的流化床反應器,其中該分離器包含一過濾器,且該過濾器係選自垂直過濾器、水平過濾器以及陶瓷膜的其中一種。 The fluidized bed reactor according to claim 1, wherein the separator includes a filter, and the filter is selected from one of a vertical filter, a horizontal filter, and a ceramic membrane. 如請求項1所述的流化床反應器,其中該分離器的材料係具有高抗腐蝕性,且由Incoloy 800合金、Incoloy 800H合金以及Hastelloy合金的其中一種所製作。 The fluidized bed reactor according to claim 1, wherein the material of the separator has high corrosion resistance and is made of one of Incoloy 800 alloy, Incoloy 800H alloy, and Hastelloy alloy.
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