TWI675734B - Manufacturing apparatus of plate type aerogel composites, substrate supporting apparatus for manufacturing plate type aerogel composites and manufacturing method of plate type aerogel composites - Google Patents

Manufacturing apparatus of plate type aerogel composites, substrate supporting apparatus for manufacturing plate type aerogel composites and manufacturing method of plate type aerogel composites Download PDF

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TWI675734B
TWI675734B TW107128223A TW107128223A TWI675734B TW I675734 B TWI675734 B TW I675734B TW 107128223 A TW107128223 A TW 107128223A TW 107128223 A TW107128223 A TW 107128223A TW I675734 B TWI675734 B TW I675734B
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substrate
plate
receiving portion
aerogel composition
length
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TW201930042A (en
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盧桐均
Dong Kyun Noh
安秉煜
Byeong Uk An
李斗辰
Doojin Lee
梁祜溍
Hojin Yang
李峻模
Joon Mo Lee
朴熙鍾
Hee Jong Park
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南韓商Skc股份有限公司
Skc Co., Ltd.
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J13/00Colloid chemistry, e.g. the production of colloidal materials or their solutions, not otherwise provided for; Making microcapsules or microballoons
    • B01J13/0091Preparation of aerogels, e.g. xerogels
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J13/00Colloid chemistry, e.g. the production of colloidal materials or their solutions, not otherwise provided for; Making microcapsules or microballoons
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J13/00Colloid chemistry, e.g. the production of colloidal materials or their solutions, not otherwise provided for; Making microcapsules or microballoons
    • B01J13/0052Preparation of gels

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Abstract

本發明提供一種板狀氣凝膠組成物製備裝置、板狀氣凝 膠組成物製備用基材支持裝置以及板狀氣凝膠組成物的製備方法,板狀氣凝膠組成物製備裝置包括:基材支持裝置,藉由分離部分割空間,而於空間上區分收容2個以上的基材;腔室,於內部收容基材支持裝置;及溶液供給部,向基材收容部供給溶膠溶液或清洗溶液;根據上述方法及裝置,較為簡單且有效率地以標準化尺寸製備表面良好的板狀氣凝膠組成物。 The invention provides a plate-shaped aerogel composition preparation device and a plate-shaped aerogel. Substrate support device for preparing glue composition and method for preparing plate-shaped aerogel composition. The device for preparing plate-shaped aerogel composition includes a substrate support device, which divides a space by a separation part, and divides and stores the space. 2 or more substrates; a chamber that houses a substrate support device; and a solution supply section that supplies a sol solution or a cleaning solution to the substrate storage section; according to the above method and device, it is relatively simple and efficient to standardize the size A plate-like aerogel composition having a good surface was prepared.

Description

板狀氣凝膠組成物製備裝置、板狀氣凝膠組成 物製備用基材支持裝置以及板狀氣凝膠組成物的製備方法 Plate-shaped aerogel composition preparation device, plate-shaped aerogel composition Substrate support device for product preparation and method for preparing plate-shaped aerogel composition

本發明是有關於一種板狀氣凝膠組成物製備裝置及利用其的板狀氣凝膠組成物的製備方法。 The invention relates to a device for preparing a plate-like aerogel composition and a method for preparing a plate-like aerogel composition using the same.

於1930年代初由基斯特勒(Kistler)發現的氣凝膠作為具有高孔隙率的乾燥凝膠,已知為目前導熱度最低的物質。通常,氣凝膠具有90%以上、最大約99%左右的高孔隙率,於迄今為止由人類開發的素材中具有最卓越的超隔熱性/超多孔性/超輕量性/超低介電常數等特性,因此,其為於建築物、產業、航空航天、造船等領域的節能素材、吸音材、防火材等各種領域內具有無限應用潛質的前景廣闊的素材。氣凝膠根據形態分為氈(組成物,Blanket,片狀)、粉末(Powders)、塊體(Monolith)等。 The aerogel discovered by Kistler in the early 1930s, as a dry gel with high porosity, is known as the substance with the lowest thermal conductivity at present. Generally, aerogels have a high porosity of more than 90% and a maximum of about 99%. Among the materials developed by humans so far, they have the most excellent ultra-insulation / ultra-porosity / ultra-lightweight / ultra-low dielectric Electrical constants and other characteristics, therefore, it is a promising material with unlimited application potential in various fields such as energy-saving materials, sound-absorbing materials, and fire-resistant materials in the fields of buildings, industries, aerospace, and shipbuilding. Aerogels are classified into felts (composition, Blank, flakes), powders, and monoliths according to their morphology.

氣凝膠可藉由如下方法製備:於對氧化矽前驅物溶液進行溶膠-凝膠聚合反應而製成濕凝膠後,在超臨界條件或常壓條件 下進行乾燥。考慮到粉末形態的氣凝膠的低作業性,而使用氈形態的氣凝膠,此種氈形態的氣凝膠多由應用卷對卷形態的連續製程製備。 Aerogels can be prepared by the following methods: After a sol-gel polymerization reaction is performed on the silica precursor solution to make a wet gel, the supergel is under supercritical or atmospheric conditions. Dry. Considering the low workability of powder aerogels, aerogels in the form of felts are used. Such aerogels in the form of felts are mostly prepared by a continuous process using a roll-to-roll form.

[先前技術文獻] [Prior technical literature]

[專利文獻] [Patent Literature]

韓國專利公開公報第10-2006-0025564號,凝膠片的製造方法 Korean Patent Laid-Open Publication No. 10-2006-0025564, a method for manufacturing a gel sheet

韓國專利公開公報第10-2012-0028635號,氧化矽氣凝膠複合板的製造方法 Korean Patent Publication Gazette No. 10-2012-0028635, Manufacturing method of silica aerogel composite plate

本發明的目的在於提供一種用以按照標準化尺寸製備表面良好的板狀氣凝膠組成物的板狀氣凝膠組成物製備裝置、及利用其的板狀氣凝膠組成物的製備方法。 An object of the present invention is to provide a plate-shaped aerogel composition preparation device for preparing a plate-shaped aerogel composition with a good surface according to a standardized size, and a method for preparing a plate-shaped aerogel composition using the same.

為了達成上述目的,本發明的一實施例的板狀氣凝膠組成物製備裝置包括:i)基材支持裝置(substrate supporting apparatus),藉由分離部分割空間而於空間上區分收容2個以上的基材,包括第一基材收容部、第二基材收容部及分離部,上述第一基材收容部為如下空間,即,收容第一基材,呈具有x方向長度、y方向長度及z方向長度的板狀(plate type),z方向長度值大於x方向長度值或y方向長度值,第二基材收容部為如下空間,即,與第一基材收容部相鄰,於空間上與第一基材收容部區分且 收容第二基材,分離部位於上述第一基材收容部與上述第二基材收容部之間而區分兩個空間,包括第一基材收容部與第二基材收容部的基材收容部的下端或上端開放;ii)腔室(chamber),於內部收容基材支持裝置;及iii)溶液供給部(solution supplying part),向基材收容部供給溶膠溶液(Sol solution)或清洗溶液(washing solution)。 In order to achieve the above-mentioned object, an apparatus for preparing a plate-like aerogel composition according to an embodiment of the present invention includes: i) a substrate supporting apparatus (substrate supporting apparatus), which divides and separates two or more spaces in space by dividing a space by a separation unit; The substrate includes a first substrate accommodating portion, a second substrate accommodating portion, and a separation portion. The first substrate accommodating portion is a space that accommodates the first substrate and has a length in the x direction and a length in the y direction. And the z-direction length plate type, the z-direction length value is greater than the x-direction length value or the y-direction length value, and the second substrate receiving portion is a space that is adjacent to the first substrate receiving portion and It is spatially distinguished from the first substrate containing portion and The second substrate is accommodated, and the separation portion is located between the first substrate accommodation portion and the second substrate accommodation portion to distinguish two spaces, including the substrate accommodation of the first substrate accommodation portion and the second substrate accommodation portion. The lower or upper end of the unit is open; ii) a chamber that houses the substrate support device inside; and iii) a solution supplying part that supplies a sol solution or a cleaning solution to the substrate receiving unit (washing solution).

分離部可為壁形態(wall shape),基材收容部的上端與下端開放。 The separation portion may have a wall shape, and an upper end and a lower end of the substrate receiving portion are open.

分離部可為包括正面、左側面、背面及右側面的柱形態(columnar shape),基材收容部為四周由上述柱形態的分離部包圍的空間,其上端與下端開放。 The separation portion may have a columnar shape including a front surface, a left surface, a back surface, and a right surface. The substrate receiving portion is a space surrounded by the above-mentioned column-shaped separation portion, and the upper and lower ends thereof are open.

分離部可為間隔壁狀(barrier type),阻隔流體於上述第一基材收容部與第二基材收容部之間沿x方向或y方向移動。 The separation portion may be a barrier type, and blocks fluid from moving between the first substrate receiving portion and the second substrate receiving portion in the x direction or the y direction.

分離部可為網狀(mesh type)或具有多個開口(holes、pores),容許流體於上述第一基材收容部與第二基材收容部之間沿x方向或y方向移動。 The separation portion may be a mesh type or have multiple openings (holes, pores), allowing the fluid to move in the x direction or the y direction between the first substrate receiving portion and the second substrate receiving portion.

板狀氣凝膠組成物製備裝置可更包括對基材收容部進行減壓的減壓裝置。 The plate-shaped aerogel composition preparation device may further include a decompression device that decompresses the substrate storage portion.

板狀氣凝膠組成物製備裝置可更包括位於基材支持裝置的下端而支持基材支持裝置的下端支持部。 The plate-shaped aerogel composition preparation device may further include a lower end support portion located at a lower end of the substrate support device and supporting the substrate support device.

下端支持部可容許流體於下端支持部的一面與基材收容部的下端之間沿z方向移動。 The lower end support portion allows the fluid to move in the z direction between one surface of the lower end support portion and the lower end of the substrate receiving portion.

基材收容部可具有開放的上端。 The substrate receiving portion may have an open upper end.

板狀氣凝膠組成物製備裝置可於基材支持裝置的上部更 包括上端固定部。 The plate-shaped aerogel composition preparation device can be further modified on the upper part of the substrate supporting device. Including the upper end fixing portion.

上端固定部可更包括收容藉由溶液供給部供給的溶膠溶液或清洗溶液而使其移動至基材收容部的流體收容部。 The upper-end fixing portion may further include a fluid storage portion that accommodates the sol solution or the cleaning solution supplied from the solution supply portion and moves the sol solution or the cleaning solution to the substrate storage portion.

上述板狀氣凝膠組成物製備裝置可更包括回收供給於基材支持裝置的溶膠溶液或清洗溶液的溶液收容部。 The plate-shaped aerogel composition preparation device may further include a solution storage unit that recovers the sol solution or the cleaning solution supplied to the substrate supporting device.

本發明的另一實施例的板狀氣凝膠組成物製備用基材支持裝置藉由分離部分割空間,而於空間上區分收容2個以上的基材,且包括:第一基材收容部,為如下空間,即,收容第一基材,呈具有x方向長度、y方向長度及z方向長度的板狀(plate type),上述z方向長度值大於x方向長度值或y方向長度值;第二基材收容部,為如下空間,即,與第一基材收容部相鄰,於空間上與第一基材收容部區分且收容第二基材;及分離部,位於第一基材收容部與第二基材收容部之間而區分兩個空間;且包括第一基材收容部與第二基材收容部的基材收容部的下端或上端開放。 The substrate supporting device for preparing a plate-like aerogel composition according to another embodiment of the present invention divides a space by a separation section, and divides and stores two or more substrates in space, and includes: a first substrate accommodating section Is a space that houses the first substrate in a plate type having an x-direction length, a y-direction length, and a z-direction length, and the z-direction length value is greater than the x-direction length value or the y-direction length value; The second substrate receiving portion is a space adjacent to the first substrate receiving portion, spatially distinguishing from the first substrate receiving portion and accommodating the second substrate; and a separating portion located on the first substrate. Two spaces are distinguished between the accommodating portion and the second substrate accommodating portion; and the lower end or the upper end of the substrate accommodating portion including the first substrate accommodating portion and the second substrate accommodating portion is open.

分離部可為壁形態(wall shape),上述基材收容部的上端與下端開放。 The separation portion may have a wall shape, and an upper end and a lower end of the substrate receiving portion are open.

分離部可為包括正面、左側面、背面及右側面的柱形態(columnar shape),上述基材收容部為四周由柱形態的分離部包圍的空間,其上端與下端開放。 The separation portion may have a columnar shape including a front surface, a left surface, a back surface, and a right surface. The base material receiving portion is a space surrounded by the column-shaped separation portion, and the upper and lower ends thereof are open.

分離部可為間隔壁狀(barrier type),阻隔流體於第一基材收容部與第二基材收容部之間沿x方向或y方向移動。 The separation portion may be a barrier type, and blocks fluid from moving between the first substrate receiving portion and the second substrate receiving portion in the x direction or the y direction.

分離部可為網狀(mesh type)或具有多個開口(holes、pores),容許流體於第一基材收容部與第二基材收容部之間沿x方向或y方向移動。 The separation portion may be a mesh type or have a plurality of holes (pores, pores), allowing the fluid to move between the first substrate receiving portion and the second substrate receiving portion in the x direction or the y direction.

基材支持裝置可更包括下端部,位於基材支持裝置的下端而支持收容至基材收容部的基材,容許流體於z方向上移動。 The substrate supporting device may further include a lower end portion, which is located at the lower end of the substrate supporting device and supports the substrate received in the substrate receiving portion, and allows the fluid to move in the z direction.

基材收容部可具有開放的上端。 The substrate receiving portion may have an open upper end.

基材支持裝置可更包括上端部,位於開放的上端的上部,容許流體於z方向上移動。 The substrate supporting device may further include an upper end portion, which is located above the open upper end, and allows the fluid to move in the z direction.

本發明的另一實施例的板狀氣凝膠組成物的製備方法包括:含浸步驟,向基材支持裝置供給溶膠溶液,而製備位於基材收容部內且含浸有溶膠溶液的板狀基材,即含浸基材,基材支持裝置包括2個以上的基材收容部及分離部,且於基材收容部收容有板狀基材,2個以上的基材收容部為如下空間,即,呈具有x方向長度、y方向長度及z方向長度的板狀(plate type),z方向長度值大於x方向長度值或y方向長度值,分離部於空間上區分彼此相鄰的上述基材收容部;老化步驟,誘導含浸基材中所含有的溶膠溶液凝膠化及熟化而製備凝膠化基材;裝置去除步驟,藉由基材收容部的開放的上端或下端而自凝膠化基材分離基材支持裝置;及溶劑去除步驟,自凝膠化基材去除溶劑而製備氣凝膠組成物。 A method for preparing a plate-shaped aerogel composition according to another embodiment of the present invention includes an impregnation step of supplying a sol solution to a substrate supporting device, and preparing a plate-shaped substrate located in a substrate receiving portion and impregnated with the sol solution, That is, the substrate is impregnated. The substrate supporting device includes two or more substrate storage sections and separation sections, and a plate-shaped substrate is stored in the substrate storage section. The two or more substrate storage sections are as follows. A plate type having an x-direction length, a y-direction length, and a z-direction length. The z-direction length value is greater than the x-direction length value or the y-direction length value. The separation section spatially distinguishes the above-mentioned substrate storage sections adjacent to each other. ; An aging step to induce gelation and aging of the sol solution contained in the impregnated substrate to prepare a gelled substrate; a device removal step to self-gelate the substrate through the open upper or lower end of the substrate containing portion Separating the substrate supporting device; and a solvent removing step, removing the solvent from the gelled substrate to prepare an aerogel composition.

老化步驟能夠以藉由減壓裝置將基材收容部或基材支持裝置內的壓力減壓至300Torr以下的狀態執行。 The aging step can be performed in a state where the pressure in the substrate accommodating section or the substrate supporting device is reduced to 300 Torr or less by a pressure reducing device.

基材收容部於以x方向長度值或y方向長度值中更小的值為基準值時,z方向長度值可具有上述基準值的5倍以上的值。 When the substrate storage portion uses the smaller of the x-direction length value or the y-direction length value as a reference value, the z-direction length value may have a value that is five times or more the above-mentioned reference value.

溶劑去除步驟可更包括清洗過程。清洗過程可依序進行1次清洗、2次清洗及3次清洗,1次清洗應用包括蒸餾水的1次清洗液,2次清洗應用包括丙酮的2次清洗液,3次清洗應用包括選 自由丙醇、丁醇及其組合所組成的族群中的醇的3次清洗液。 The solvent removal step may further include a washing process. The cleaning process can be performed in sequence of 1 cleaning, 2 cleanings and 3 cleanings. The 1st cleaning application includes 1st cleaning solution of distilled water, the 2nd cleaning application includes 2nd cleaning solution of acetone, and the 3th cleaning application includes selection. 3-times cleaning solution of alcohol in a group consisting of propanol, butanol, and combinations thereof.

溶劑去除步驟可更包括重組過程。重組過程可藉由如下方法進行:將以1:0.1至1:1的重量比包括有機溶劑與矽烷化合物的重組溶液應用於凝膠化基材或經過清洗過程的凝膠化基材。 The solvent removal step may further include a recombination process. The recombination process can be performed by applying a recombination solution including an organic solvent and a silane compound in a weight ratio of 1: 0.1 to 1: 1 to a gelled substrate or a gelled substrate after a cleaning process.

溶劑去除步驟為去除凝膠化基材中的溶劑的過程,可應用於凝膠化基材、經過清洗過程的凝膠化基材或經過重組步驟的凝膠化基材。溶劑去除步驟可應用常壓乾燥、超臨界乾燥來進行,或者交替地應用常壓乾燥及超臨界乾燥來進行。 The solvent removal step is a process of removing the solvent from the gelled substrate, and can be applied to the gelled substrate, the gelled substrate after the cleaning process, or the gelled substrate after the recombination step. The solvent removal step can be performed by normal pressure drying, supercritical drying, or alternately by normal pressure drying and supercritical drying.

於在溶劑去除步驟中應用常壓乾燥的情形時,可藉由如下方法進行:於利用己烷清洗凝膠化基材、經過清洗過程的凝膠化基材或經過重組步驟的凝膠化基材後,在5℃至350℃的空氣環境中放置60分鐘至600分鐘。 In the case of applying atmospheric drying in the solvent removal step, it can be performed by: cleaning the gelled substrate with hexane, the gelled substrate after the cleaning process, or the gelled substrate after the recombination step. After the material is left, it is left in an air environment at 5 ° C to 350 ° C for 60 minutes to 600 minutes.

於含浸步驟中插入至基材收容部的基材可為滿足如下條件者:以基材的x方向長度與y方向長度中更小的值為基準值,與其對應的基材收容部的x方向長度與y方向長度中更小的值為上述基準值的1.05倍至3.00倍。 The substrate inserted into the substrate receiving portion in the impregnation step may be one that satisfies the following conditions: the smaller of the x-direction length and the y-direction length of the substrate is the reference value, and the x-direction of the corresponding substrate receiving portion The smaller value between the length and the y-direction length is 1.05 to 3.00 times the above-mentioned reference value.

本發明的另一實施例的板狀氣凝膠組成物的製備方法包括:含浸步驟,於在基材支持裝置的具有流體透過性的板狀下端部上收容板狀基材後,以具有流體透過性的上端部固定基材支持裝置的上端而供給溶膠溶液,來製備位於基材收容部內且含浸有溶膠溶液的板狀基材,即含浸基材,基材支持裝置包括2個以上的基材收容部及具有流體透過性的分離部,2個以上的基材收容部為如下空間,即,呈具有x方向長度、y方向長度及z方向長度的板狀(plate type),z方向長度值大於x方向長度值或y方向長度 值,具有流體透過性的分離部於空間上區分彼此相鄰的基材收容部;老化步驟,誘導含浸基材中所含有的溶膠溶液凝膠化及熟化而製備凝膠化基材;裝置移動步驟,將基材支持裝置移動至溶劑去除裝置,基材支持裝置包括位於基材收容部內的凝膠化基材,且包括彼此結合的分離部、上端部及下端部;及溶劑去除步驟,於溶劑去除裝置中,自凝膠化基材去除溶劑而製備氣凝膠組成物。 A method for preparing a plate-shaped aerogel composition according to another embodiment of the present invention includes an impregnation step of accommodating a plate-shaped substrate on a plate-shaped lower end portion of a substrate-supporting device that has fluid permeability, so as to have a fluid. The permeable upper end portion fixes the upper end of the substrate support device and supplies a sol solution to prepare a plate-shaped substrate, ie, an impregnated substrate, which is located in the substrate storage portion and is impregnated with the sol solution. The substrate support device includes two or more substrates. Material storage section and fluid-permeable separation section, and the two or more substrate storage sections are spaces that have a plate type having a length in the x direction, a length in the y direction, and a length in the z direction, and a length in the z direction Value is greater than the length in the x direction or the length in the y direction Value, the fluid-permeable separation section spatially distinguishes adjacent substrate storage sections; the aging step induces gelation and aging of the sol solution contained in the impregnated substrate to prepare a gelled substrate; the device moves Step of moving the substrate supporting device to a solvent removing device, the substrate supporting device comprising a gelled substrate located in the substrate containing portion, and including a separation portion, an upper end portion and a lower end portion combined with each other; and a solvent removing step, in In the solvent removing device, the solvent is removed from the gelled substrate to prepare an aerogel composition.

老化步驟能夠以藉由減壓裝置將基材收容部或基材支持裝置內的壓力減壓至300Torr以下的狀態進行。 The aging step can be performed in a state where the pressure in the substrate accommodating part or the substrate supporting device is reduced to 300 Torr or less by a pressure reducing device.

基材收容部於以x方向長度值或y方向長度值中更小的值為基準值時,z方向長度值可具有基準值的5倍以上的值。 When a smaller value of the length value in the x-direction or the length value in the y-direction is used as the reference value, the length value in the z-direction may have a value that is five times or more the reference value.

溶劑去除步驟可更包括清洗過程,清洗依序進行1次清洗、2次清洗及3次清洗,1次清洗應用包括蒸餾水的1次清洗液,2次清洗應用包括丙酮的2次清洗液,3次清洗應用包括選自由丙醇、丁醇及其組合所組成的族群中的醇的3次清洗液。 The solvent removal step may further include a cleaning process. The cleaning is performed in sequence of 1 cleaning, 2 cleanings, and 3 cleanings. 1 cleaning application includes 1 cleaning solution of distilled water, 2 cleaning applications includes 2 cleaning solutions of acetone, 3 Secondary cleaning applications include three cleaning solutions of alcohols selected from the group consisting of propanol, butanol, and combinations thereof.

溶劑去除步驟可更包括重組過程,重組藉由如下方法進行:將以1:0.1至1:1的重量比包括有機溶劑與矽烷化合物的重組溶液應用於上述凝膠化基材或經過上述清洗過程的凝膠化基材。 The solvent removal step may further include a recombination process. The recombination is performed by applying a recombination solution including an organic solvent and a silane compound in a weight ratio of 1: 0.1 to 1: 1 to the above-mentioned gelled substrate or undergoing the above-mentioned cleaning process. Gelled substrate.

溶劑去除步驟為去除凝膠化基材中的溶劑的過程,可應用於凝膠化基材、經過清洗過程的凝膠化基材或經過重組步驟的凝膠化基材。溶劑去除步驟可應用常壓乾燥、超臨界乾燥來進行,或者交替地應用常壓乾燥與超臨界乾燥來進行。 The solvent removal step is a process of removing the solvent from the gelled substrate, and can be applied to the gelled substrate, the gelled substrate after the cleaning process, or the gelled substrate after the recombination step. The solvent removal step can be performed by normal pressure drying, supercritical drying, or alternately by normal pressure drying and supercritical drying.

於在溶劑去除步驟中應用常壓乾燥的情形時,可藉由如下方法進行:於利用己烷清洗凝膠化基材、經過清洗過程的凝膠化基材或經過重組步驟的凝膠化基材後,在5℃至350℃的空氣環 境中放置60分鐘至600分鐘。 In the case of applying atmospheric drying in the solvent removal step, it can be performed by: cleaning the gelled substrate with hexane, the gelled substrate after the cleaning process, or the gelled substrate after the recombination step. After the material, an air ring at 5 ° C to 350 ° C Leave in the environment for 60 minutes to 600 minutes.

於含浸步驟中插入至基材收容部的基材可為滿足如下條件者:以基材的x方向長度與y方向長度中更小的值為基準值,與其對應的基材收容部的x方向長度與y方向長度中更小的值為上述基準值的1.00倍至3.00倍。 The substrate inserted into the substrate receiving portion in the impregnation step may be one that satisfies the following conditions: the smaller of the x-direction length and the y-direction length of the substrate is the reference value, and the x-direction of the corresponding substrate receiving portion The smaller value between the length and the y-direction length is 1.00 times to 3.00 times the above-mentioned reference value.

本發明的板狀氣凝膠組成物製備裝置及利用其的板狀氣凝膠組成物的製備方法能夠以標準化尺寸製備表面良好的板狀氣凝膠組成物,其製備步驟亦較為簡單而可有效率地提供表面良好的板狀氣凝膠組成物。 The plate-shaped aerogel composition preparation device of the present invention and the method for preparing a plate-shaped aerogel composition using the same can prepare plate-shaped aerogel compositions with a good surface in a standardized size, and the preparation steps thereof are also relatively simple and feasible. Efficiently provide a plate-like aerogel composition with a good surface.

10‧‧‧基材 10‧‧‧ Substrate

20‧‧‧基材收容部 20‧‧‧ Substrate storage section

30‧‧‧分離部 30‧‧‧ Separation Department

33‧‧‧正面部 33‧‧‧ Front

34‧‧‧背面部 34‧‧‧Back

100‧‧‧基材支持裝置 100‧‧‧ substrate support device

200‧‧‧腔室 200‧‧‧ chamber

300‧‧‧溶液供給部 300‧‧‧ Solution Supply Department

310、610、710‧‧‧控制閥 310, 610, 710‧‧‧ Control Valve

400‧‧‧下端支持部 400‧‧‧ lower support

500‧‧‧上端固定部 500‧‧‧ Upper fixed part

600‧‧‧減壓裝置 600‧‧‧ Decompression device

700‧‧‧溶液回收部 700‧‧‧Solution Recovery Department

900‧‧‧板狀氣凝膠組成物製備裝置 900‧‧‧ plate-shaped aerogel composition preparation device

圖1(a)及圖1(b)是於本發明中說明的板狀基材收容部的概念圖。 1 (a) and 1 (b) are conceptual views of a plate-like substrate storage portion described in the present invention.

圖2是說明本發明的一實施例的板狀氣凝膠組成物製備裝置的概念圖。 FIG. 2 is a conceptual diagram illustrating a plate-shaped aerogel composition preparing device according to an embodiment of the present invention.

圖3是表示本發明的一實施例的基材支持裝置的構造的概念圖。 FIG. 3 is a conceptual diagram showing a structure of a substrate supporting device according to an embodiment of the present invention.

圖4(a)是沿a-a'方向觀察上述圖3中的分離部為柱形態的情形的剖面圖,圖4(b)是分離部為柱形態的情形的剖面圖。 FIG. 4 (a) is a cross-sectional view when the separation section in FIG. 3 is in the form of a column, and FIG. 4 (b) is a cross-sectional view when the separation section is in the form of a column.

圖5(a)是表示於本發明的一實施例的基材支持裝置收容有基材的情況的剖面圖,圖5(b)是表示基材支持裝置與基材分離的情況的剖面圖。 5 (a) is a cross-sectional view showing a state where a base material is stored in a base material supporting device according to an embodiment of the present invention, and FIG. 5 (b) is a cross-sectional view showing a state where the base material supporting device is separated from the base material.

以下,參考隨附圖式而詳細地對本發明的實施例進行說明,以便在本發明所屬的技術領域內具有常識者可容易地實施。 Hereinafter, embodiments of the present invention will be described in detail with reference to the accompanying drawings, so that those skilled in the art to which the present invention pertains can easily implement them.

然而,本發明能夠以各種不同的形態實現,並不限定於此處所說明的實施例。於說明書全文中,對相似的部分標註相同的符號。 However, the present invention can be implemented in various forms, and is not limited to the embodiments described herein. Throughout the description, similar parts are marked with the same symbols.

於說明書全文中,如「第一」、「第二」或“A”、“B”的用語是為了區分相同的用語而使用。 Throughout the description, terms such as "first", "second" or "A" and "B" are used to distinguish the same terms.

於說明書全文中,B位於A上是指B位於A上、或可於其等之間定位其他層而使B位於A上,並不限定地解釋為B以與A的表面接觸的方式定位。 Throughout the description, B located on A means that B is located on A, or other layers may be positioned therebetween so that B is located on A, and is not limited to interpreting B as positioned in contact with the surface of A.

於說明書全文中,馬庫什形式的表達中所包括的用語「其組合」是指選自由馬庫什形式的表達中所記載的構成要素所組成的族群中的一個以上的混合或組合,意味著包括選自由上述構成要素所組成的族群中的一個以上。 Throughout the description, the term "combination" included in the expression of the Markush form means a mixture or combination of one or more selected from the group consisting of the constituent elements described in the expression of the Markush form, meaning The author includes one or more members selected from the group consisting of the aforementioned constituent elements.

於說明書全文中,若無特別的說明,則單數的表達解釋為包括根據上下文解釋的單數或複數。 Throughout the description, unless otherwise specified, expressions in the singular number are construed to include the singular or plural number according to the context.

於說明書全文中,「進行~的步驟」或「~的步驟」並非是指「用以~的步驟」。 Throughout the description, "steps to perform ~" or "steps to ~" do not mean "steps to ~".

圖1(a)及圖1(b)是說明本發明的板狀基材收容部的概念圖,圖2是說明本發明的一實施例的板狀氣凝膠組成物製備裝置的概念圖,圖3是表示本發明的一實施例的基材支持裝置的構造的概念圖,圖4(a)是沿a-a'方向觀察上述圖3中的分離部為柱形態的情形的剖面圖,圖4(b)是分離部為柱形態的情形的 剖面圖,圖5(a)及圖5(b)是表示於本發明的一實施例的基材支持裝置收容有基材的情況的剖面圖,其中圖5(a)表示基材收容於基材支持裝置的基材收容部的狀態,圖5(b)表示基材與基材支持裝置分離的情況。以下,參照上述圖1(a)至圖5(b)而對本發明進行說明。 1 (a) and 1 (b) are conceptual diagrams illustrating a plate-like substrate storage portion of the present invention, and FIG. 2 is a conceptual diagram illustrating a plate-like aerogel composition preparing apparatus according to an embodiment of the present invention. FIG. 3 is a conceptual view showing a structure of a substrate supporting device according to an embodiment of the present invention, and FIG. 4 (a) is a cross-sectional view when the separation portion in FIG. 3 is in the form of a column when viewed along the direction aa ', Fig. 4 (b) shows the case where the separation part is in the form of a column. 5 (a) and 5 (b) are cross-sectional views showing a state where a substrate is stored in a substrate supporting device according to an embodiment of the present invention, and FIG. 5 (a) shows the substrate is stored in a substrate FIG. 5 (b) shows the state of the substrate accommodating part of the material supporting device, and the state where the substrate is separated from the substrate supporting device. Hereinafter, the present invention will be described with reference to FIGS. 1 (a) to 5 (b).

本發明的一實施例的板狀氣凝膠組成物製備裝置包括:i)基材支持裝置100(substrate supporting apparatus),藉由分離部30分割空間,而於空間上區分2個以上的基材10來收容至基材收容部20;ii)腔室200(chamber),於內部收容上述基材支持裝置100;及iii)溶液供給部300(solution supplying part),向上述基材收容部20供給溶膠溶液或清洗溶液。 An apparatus for preparing a plate-like aerogel composition according to an embodiment of the present invention includes: i) a substrate supporting apparatus 100 (substrate supporting apparatus), which divides a space by a separation unit 30 and distinguishes two or more substrates in space; 10 to be accommodated in the substrate accommodating section 20; ii) a chamber 200 (chamber) to house the substrate supporting device 100 therein; and iii) a solution supplying part 300 (solution supplying part) to supply to the substrate accommodating section 20 Sol solution or cleaning solution.

上述基材收容部20作為於製備板狀氣凝膠組成物的過程中收容基材10的空間,於上述基材支持裝置100配置2個以上、即配置多個基材收容部20。 The substrate accommodating section 20 is a space for accommodating the substrate 10 during the process of preparing the plate-shaped aerogel composition. Two or more substrate accommodating sections 20 are disposed in the substrate supporting device 100.

上述基材收容部20為具有x方向長度、y方向長度及z方向長度的板狀(plate type)空間,其特徵在於z方向長度值大於x方向長度值或y方向長度值(參照圖1(a)及圖1(b))。 The substrate accommodating portion 20 is a plate type space having a length in the x direction, a length in the y direction, and a length in the z direction, and is characterized in that the length value in the z direction is greater than the length value in the x direction or the length value in the y direction (see FIG. 1 ( a) and Figure 1 (b)).

根據上下文,上述基材收容部20包括第一基材收容部20、第二基材收容部20,如上所述,為了彼此區分上述多個基材收容部20而使用如「第一」、「第二」的區分用語來進行說明。 According to the context, the substrate storage section 20 includes a first substrate storage section 20 and a second substrate storage section 20. As described above, in order to distinguish the plurality of substrate storage sections 20 from each other, such as "first", " "Second" is used to explain.

上述基材支持裝置100包括:第一基材收容部20,收容上述第一基材10;第二基材收容部20,為如下空間,即,與上述第一基材收容部20相鄰,於空間上與上述第一基材收容部20區分且收容第二基材10;及分離部30,位於上述第一基材收容部20 與上述第二基材收容部20之間而區分兩個空間。 The substrate supporting device 100 includes: a first substrate accommodating portion 20 that accommodates the first substrate 10; and a second substrate accommodating portion 20 that is a space adjacent to the first substrate accommodating portion 20, Is spatially distinguished from the first substrate storage portion 20 and accommodates the second substrate 10; and a separation portion 30 is located at the first substrate storage portion 20 Two spaces are distinguished from the second substrate storage portion 20 described above.

分離部30於空間上區分相鄰的兩個基材收容部20,支持收容至上述基材收容部20的基材10,即便會於應用製備方法的過程中發生流體流動,亦將基材10的變形或移動限制於基材收容部20內。 The separation section 30 spatially distinguishes two adjacent substrate storage sections 20 and supports the substrate 10 stored in the substrate storage section 20 described above. Even if a fluid flow occurs during the application of the preparation method, the substrate 10 Deformation or movement is restricted within the substrate storage portion 20.

另外,於基材收容部20中進行於以下說明的基材10的含浸及凝膠化,故而於此種基材收容部20中製備的氣凝膠組成物具有如下優點:呈標準化形態,即便不另外應用主要活用於卷對卷(roll to roll)製程中的分離膜,亦具有表面平坦、氣凝膠密度較為固定等良好的特性。 In addition, since the impregnation and gelation of the substrate 10 described below is performed in the substrate accommodating section 20, the aerogel composition prepared in such a substrate accommodating section 20 has the advantage of being in a standardized form even if The separation membrane, which is mainly used in the roll-to-roll process, has good characteristics such as flat surface and relatively constant aerogel density.

基材收容部20為z方向長度值大於x方向長度值或y方向長度值的板狀(plate type)空間,故而收容至上述基材收容部的基材10的整個外形亦如上述基材收容部般呈板形態,同時以相當於板形態的厚度的面積較小之面(x-y面)位於基材收容部的最下端的形態、即「以厚度之面豎立的形態(以厚度豎立的狀態)」收容。因此,若無如分離部30的另外的支持單元,則特別是於會發生流體流動(包括溶液或空氣的流動)的基材支持裝置的內部環境中難以保持「以厚度豎立的狀態」,但於本發明中,藉由位於基材收容部20的兩側的分離部30進行支持,以使上述基材10能夠以相當於x-y面的較小之面穩定地豎立。 The substrate storage portion 20 is a plate-type space whose length in the z direction is greater than the length in the x direction or the length in the y direction. Therefore, the entire shape of the substrate 10 stored in the substrate storage portion is also the same as the substrate storage It is in the form of a plate, and at the same time, the surface (xy plane) with a smaller area equivalent to the thickness of the plate is located at the lower end of the substrate storage portion, that is, "the state of standing by the thickness (the state of standing by the thickness) ) "Containment. Therefore, if there is no other support unit such as the separation unit 30, it is difficult to maintain the "standing state with a thickness" especially in the internal environment of the substrate support device where fluid flow (including the flow of solution or air) occurs, but In the present invention, the separation portions 30 located on both sides of the substrate accommodation portion 20 are supported so that the substrate 10 can be stably stood on a smaller surface corresponding to the xy surface.

上述基材收容部20的z方向長度值大於x方向長度值或y方向長度值,故而與構成z方向長度值分別小於基材收容部的x方向長度值或y方向長度值的基材收容部的情形相比,具有多個優點。 The z-direction length value of the substrate storage portion 20 is greater than the x-direction length value or the y-direction length value, and thus the substrate storage portion constituting the z-direction length value is smaller than the x-direction length value or the y-direction length value of the substrate storage portion, respectively. Compared to the situation, there are several advantages.

首先,本發明的基材收容部20具有如下優點:有利於在面積較廣的兩個x-z面與兩個y-z面豐富地形成氣凝膠。於氣凝膠組成物製備過程中的凝膠化製程中形成的奈米氣孔不僅需良好地形成,而且於清洗或重組等製備過程中不得崩塌。形成於基材最下端的x-y面的奈米氣孔容易因於上述製備過程中發生的流體移動或基材的負荷而崩塌。本發明的基材收容部20將基材10的最下端面(x-y面)的面積本身最小化,而將奈米氣孔崩塌的可能性最小化,並將其他面的面積極大化,藉此可容易地製備於整體上具有優異的氣孔構造的氣凝膠組成物。 First of all, the substrate storage portion 20 of the present invention has the advantage that it is advantageous to form an aerogel richly on two x-z planes and two y-z planes with a wide area. Nanopores formed during the gelation process during the preparation of the aerogel composition not only need to be well formed, but must not collapse during the preparation process such as cleaning or recombination. The nano-pores on the x-y plane formed at the lowermost end of the substrate are prone to collapse due to fluid movement or load on the substrate during the above-mentioned preparation process. The substrate accommodating part 20 of the present invention minimizes the area of the lowermost end surface (xy plane) of the substrate 10 itself, minimizes the possibility of collapsing the nanopores, and maximizes the area of the other surfaces, thereby making it possible to It is easy to prepare an aerogel composition having an excellent pore structure as a whole.

另外,本發明的基材收容部20的具有較窄的面積的x-y面位於最下端面,故而與構成z方向長度值分別小於基材收容部的x方向長度值與y方向長度值的基材收容部的情形相比,亦具有可防止基材下垂的現象的優點。若按照「以較廣之面橫置的狀態」進行含浸與清洗等過程,則會產生較廣之面的中央部分沿重力方向下沈的下垂現象,為了防止此種下垂現象,需於中央部另外設置支架。然而,設置此種支架會使基材支持裝置的構造變複雜,特別是於將基材插入至上述基材收容部或去除的過程中,會降低作業性,會成為降低製備製程的效率的原因之一。 In addition, the substrate containing portion 20 of the present invention has a narrower xy plane at the lowermost end surface, and therefore constitutes a substrate whose length value in the z direction is smaller than the length value in the x direction and the length in the y direction of the substrate containing portion. Compared with the case of the accommodating part, there is also an advantage that the phenomenon that the base material can be prevented from sagging. If the process of impregnation and cleaning is performed in accordance with the "transverse state with a wider surface", a drooping phenomenon of the central portion of the wider surface sinking in the direction of gravity will occur. A stand is additionally provided. However, the provision of such a bracket complicates the structure of the substrate supporting device, and in particular, in the process of inserting or removing the substrate into the substrate accommodating portion, the workability is reduced, which may cause the efficiency of the manufacturing process to be reduced. one.

於本發明中,以上述基材收容部20的z方向長度值大於x方向長度值或y方向長度值的方式構成,因此,即便不另外應用分離膜,整個基材10的奈米氣孔崩塌的問題亦最小化,可製備氣孔構造優異、表面平坦且表面特性較為固定的氣凝膠組成物。 In the present invention, the length of the z-direction length of the substrate accommodating portion 20 is larger than the length of the x-direction or the length of the y-direction. Therefore, even if a separate membrane is not applied, the nanopores of the entire substrate 10 collapse. The problem is also minimized, and an aerogel composition having an excellent pore structure, a flat surface, and a fixed surface property can be prepared.

具體而言,上述基材收容部20於以x方向長度值或y方向長度值中更小的值為基準值時,z方向長度值可具有基準值的5 倍以上的值。更具體而言,基材收容部20於以x方向長度值或y方向長度值中更小的值為基準值時,z方向長度值可具有基準值的10倍以上的值。更具體而言,基材收容部20於以x方向長度值或y方向長度值中更小的值為基準值時,z方向長度值可具有基準值的50倍至300倍的值。於應用具有此種長度值的基材收容部的情形時,能夠以較廣的面積製備具有更優異的特性的氣凝膠組成物。 Specifically, when the substrate storage portion 20 uses a smaller value of the x-direction length value or the y-direction length value as a reference value, the z-direction length value may have a reference value of 5 Multiples. More specifically, when the substrate storage portion 20 uses the smaller of the x-direction length value or the y-direction length value as a reference value, the z-direction length value may have a value that is 10 times or more the reference value. More specifically, when the substrate storage portion 20 uses the smaller of the x-direction length value or the y-direction length value as a reference value, the z-direction length value may have a value of 50 to 300 times the reference value. When a substrate containing portion having such a length value is applied, an aerogel composition having more excellent characteristics can be prepared over a wide area.

基材收容部20於以插入至其的基材10的x方向長度值與y方向長度值中更小的值為「基材的基準值」時,與其對應的基材收容部20的x方向長度值與y方向長度值中更小的值即「基材收容部的長度值」可為上述基材的基準值的1.00倍至3.00倍,具體而言可為1.05倍至2.5倍,更具體而言可為1.05倍至2.0倍。 基材收容部20於與以上所說明的基材的基準值進行比較而對應的基材收容部的長度值為3.00倍以上的情形時,會無法由基材收容部20充分地支持基材10,於未滿1.00倍的情形時,溶膠溶液的含浸會不充分。另外,於基材收容部20與以上所說明的基材的基準值進行比較而對應的長度值為1.05倍至2.0倍的情形時,有利於製備表面平坦且表面特性較為固定的氣凝膠組成物。 When the smaller value of the x-direction length value and the y-direction length value of the substrate 10 inserted into the substrate storage portion 20 is the "base material reference value", the x direction of the substrate storage portion 20 corresponding thereto The smaller of the length value and the length value in the y direction, that is, the "length value of the substrate receiving portion" may be 1.00 times to 3.00 times the reference value of the above substrate, specifically 1.05 times to 2.5 times, and more specifically It can be 1.05 times to 2.0 times. When the substrate storage portion 20 is compared with the reference value of the substrate described above and the length of the corresponding substrate storage portion is 3.00 times or more, the substrate 10 cannot be sufficiently supported by the substrate storage portion 20 In the case of less than 1.00 times, the impregnation of the sol solution may be insufficient. In addition, when the substrate storage portion 20 is compared with the reference value of the substrate described above and the corresponding length value is 1.05 to 2.0 times, it is advantageous to prepare an aerogel composition with a flat surface and a fixed surface property. Thing.

此時,關於z方向長度,只要基材收容部的z方向長度長於基材10的z方向長度即可。另外,關於x方向長度與y方向長度中更大的值,只要基材收容部的相應長度長於基材10的相應長度即可。 In this case, the length in the z direction may be any length as long as the length in the z direction of the substrate storage portion is longer than the length in the z direction of the substrate 10. In addition, as for the larger value of the length in the x direction and the length in the y direction, the corresponding length of the substrate accommodating portion may be longer than the corresponding length of the substrate 10.

基材支持裝置100可包括兩個以上、即多個基材收容部20,於此情形時,能夠以同時大量產生的方式製備品質較為均勻的板狀氣凝膠組成物。 The substrate supporting device 100 may include two or more, that is, a plurality of substrate accommodating portions 20. In this case, a plate-shaped aerogel composition having a relatively uniform quality can be prepared in a manner of being produced in large quantities at the same time.

多個基材收容部20可藉由如下方法形成:按照固定間隔於基材支持裝置100內形成多個壁形態(wall shape)的分離部30。 於如上所述般形成壁形態的分離部30的情形時,具有更易於調節基材收容部20的寬度(x方向長度或y方向長度)的優點。 The plurality of substrate accommodating portions 20 can be formed by forming a plurality of wall shape separation portions 30 in the substrate supporting device 100 at regular intervals. In the case where the separation portion 30 having a wall shape is formed as described above, there is an advantage that it is easier to adjust the width (the length in the x direction or the length in the y direction) of the substrate storage portion 20.

多個基材收容部20可藉由如下方法形成:於上述基材支持裝置100內並排配置柱形態(columnar shape)的分離部30。上述柱形態的分離部30呈如下形態:包括正面、左側面、背面及右側面,基材收容部20位於柱的內部。於形成此種柱形態的分離部30的情形時,具有可更牢固地形成基材收容部20的優點。 The plurality of substrate accommodating portions 20 can be formed by arranging columnar shape separation portions 30 side by side in the substrate supporting device 100. The separation part 30 in the above-mentioned pillar form has a form including a front face, a left side face, a back face, and a right side face, and the substrate accommodating part 20 is located inside the pillar. In the case of forming the separation portion 30 in such a column shape, there is an advantage that the base material storage portion 20 can be formed more firmly.

包括上述壁形態的分離部30的基材支持裝置100可於與分離部30的長度方向實質上成直角的正面及背面分別定位正面部33與背面部34,正面部33與背面部34可為壁形態。正面部33與背面部34發揮限制基材向位於基材支持裝置100的基材收容部20的正面及背面移動的作用。 The substrate supporting device 100 including the separation portion 30 in the above wall form can position the front portion 33 and the back portion 34 on the front and back sides substantially at right angles to the length direction of the separation portion 30, respectively. Wall shape. The front surface portion 33 and the rear surface portion 34 play a role of restricting the movement of the substrate to the front and back surfaces of the substrate storage portion 20 located in the substrate support device 100.

具體而言,正面部33可更包括收容分離部30的一末端的收容槽(未圖示),背面部34可更包括收容分離部30的另一末端的收容槽(未圖示)。如上所述,於利用正面部33、背面部34或形成於正面部及背面部的收容槽固定分離部30的情形時,可更牢固地保持分離部30的位置。 Specifically, the front part 33 may further include a receiving groove (not shown) for receiving one end of the separation part 30, and the rear part 34 may further include a receiving groove (not shown) for receiving the other end of the separation part 30. As described above, when the separation portion 30 is fixed by the front portion 33, the back portion 34, or the accommodation grooves formed in the front portion and the back portion, the position of the separation portion 30 can be held more firmly.

另外,分離部30可藉由上端與下端開放的基材支持裝置的殼體(未圖示)彼此結合而固定。 In addition, the separation portion 30 can be fixed by coupling the housings (not shown) of the substrate supporting device with the upper and lower ends open.

基材收容部20可為上端或下端開放者,且可為上端與下端均開放者。 The substrate accommodating portion 20 may be an open end or a lower end, and may be an open end of both the upper end and the lower end.

於基材收容部20的上端開放的情形時,可藉由開放的上 端而容易地插入基材10。另外,於基材收容部20的上端開放的情形時,可藉由開放的上端而容易地向基材收容部投入溶膠溶液或清洗溶液。 When the upper end of the substrate accommodating section 20 is open, the open upper The base material 10 can be easily inserted. In addition, when the upper end of the substrate storage portion 20 is open, the sol solution or the cleaning solution can be easily poured into the substrate storage portion by the opened upper end.

於基材收容部20的下端開放的情形時,可將分離部30或基材支持裝置100與位於基材收容部20的基材10分離而容易地去除。 When the lower end of the substrate storage section 20 is open, the separation section 30 or the substrate support device 100 can be separated from the substrate 10 located in the substrate storage section 20 and easily removed.

具體而言,分離部30或基材支持裝置100可藉由在基材10位於基材收容部20的狀態下向上提昇的較為簡單的製程,使基材10按照原狀態位於腔室200內,而容易地去除位於彼此相鄰的第一基材10與第二基材之間的分離部30(參考圖5(b))。 Specifically, the separation unit 30 or the substrate supporting device 100 can make the substrate 10 be located in the chamber 200 in the original state by a relatively simple process of lifting upward in a state where the substrate 10 is located in the substrate receiving portion 20. The separation portion 30 between the first base material 10 and the second base material adjacent to each other is easily removed (see FIG. 5 (b)).

此時,基材10可為(a)已進行含浸過程的含浸基材、正在對含浸基材進行凝膠化或已完成凝膠化的凝膠化基材,亦可為(b)已進行清洗與重組的氣凝膠組成物。如上所述,於為正在製備氣凝膠組成物的基材而並非最初插入的基材的情形時,隨著製備過程的進展,對基材進行溶膠溶液的凝膠化而面積較窄的x-y面位於最下端,從而即便z方向長度值大於x方向長度值或y方向長度值,亦可於腔室200的內部穩定地保持「以厚度豎立的狀態」,此後,可簡單地進行所需製程而製備品質優異的氣凝膠組成物。 At this time, the substrate 10 may be (a) an impregnated substrate that has undergone an impregnation process, a gelled substrate that is being gelled or has been gelled, or (b) that has undergone an impregnation process. Wash and reconstitute aerogel composition. As described above, in the case where the substrate of the aerogel composition is being prepared instead of the substrate that was initially inserted, as the preparation process progresses, the substrate is subjected to gelation of the sol solution to have a narrow xy area. The surface is located at the lowermost end, so that even if the z-direction length value is greater than the x-direction length value or the y-direction length value, the "stand-up state with thickness" can be stably maintained inside the chamber 200. Thereafter, the required process can be simply performed An aerogel composition having excellent quality is prepared.

基材支持裝置100可更包括將多個壁形態的分離部30彼此連接而固定的結合單元(未圖示)。 The substrate supporting device 100 may further include a coupling unit (not shown) that connects and separates the plurality of separation portions 30 in the form of walls.

基材支持裝置100可包括連同多個壁形態的分離部30一併將正面部33與背面部34彼此連接而固定的結合單元(未圖示)。 The substrate supporting device 100 may include a coupling unit (not shown) that fixes the front portion 33 and the rear portion 34 together with the plurality of separation portions 30 in the form of walls.

基材支持裝置100可更包括將多個柱形態的分離部30彼 此連接而固定的結合單元(未圖示)。 The substrate supporting device 100 may further include a separation section 30 for separating a plurality of columns. This connection and fixing unit (not shown).

分離部30可為間隔壁狀(barrier type),具有流體不透過性。具體而言,間隔壁狀的分離部30可阻隔流體於第一基材收容部與第二基材收容部之間沿x方向或y方向移動。作為間隔壁的材料,可應用具有耐化學性的素材,具體而言,可應用不鏽鋼、經塗覆的金屬、玻璃或其組合。 The separation part 30 may be a barrier type and has fluid impermeability. Specifically, the partition-like separation portion 30 can block fluid from moving between the first substrate receiving portion and the second substrate receiving portion in the x direction or the y direction. As a material of the partition wall, a material having chemical resistance can be applied, and specifically, stainless steel, a coated metal, glass, or a combination thereof can be applied.

分離部30可為網狀(mesh type),整體呈網形狀或具有多個開口(holes、pores),具有流體透過性。具體而言,網狀的分離部30可藉由網孔或開口而容許流體於第一基材收容部與第二基材收容部之間沿x方向或y方向移動。 The separation part 30 may be a mesh type, have a mesh shape as a whole, or have a plurality of openings (holes, pores), and have fluid permeability. Specifically, the mesh-shaped separation portion 30 may allow the fluid to move in the x direction or the y direction between the first substrate receiving portion and the second substrate receiving portion through a mesh or an opening.

作為呈網狀或具有多個開口的分離部的材料,可應用具有耐化學性的素材,具體而言,可應用不鏽鋼網、經塗覆的金屬網、流體透過性玻璃纖維、耐蝕性聚合物片或其組合。 As the material of the mesh-like or separated portion having a plurality of openings, a material having chemical resistance can be applied. Specifically, a stainless steel mesh, a coated metal mesh, a fluid-permeable glass fiber, and a corrosion-resistant polymer can be applied. Tablets or combinations thereof.

基材支持裝置100可更包括下端部(未圖示),位於基材支持裝置的開放的下端而支持收容至基材收容部20的基材10,容許流體於z方向上移動。 The substrate supporting device 100 may further include a lower end portion (not shown). The substrate supporting device 100 is located at the open lower end of the substrate supporting device and supports the substrate 10 accommodated in the substrate receiving portion 20 to allow the fluid to move in the z direction.

基材支持裝置100可更包括上端部(未圖示),位於基材收容部的開放的上端,容許流體於z方向上移動。 The substrate supporting device 100 may further include an upper end portion (not shown), which is located at the open upper end of the substrate accommodating portion and allows the fluid to move in the z direction.

作為下端部或上端部的材料,可應用具有耐化學性的素材,具體而言,可應用不鏽鋼網、經塗覆的金屬網、流體透過性玻璃纖維、耐蝕性聚合物片或其組合。 As the material of the lower end portion or the upper end portion, a material having chemical resistance can be applied, and specifically, a stainless steel mesh, a coated metal mesh, a fluid-permeable glass fiber, a corrosion-resistant polymer sheet, or a combination thereof can be applied.

板狀氣凝膠組成物製備裝置900可更包括對基材收容部20進行減壓的減壓裝置600。 The plate-shaped aerogel composition preparing device 900 may further include a pressure reducing device 600 for reducing the pressure of the substrate containing portion 20.

可藉由如下方法進行利用減壓裝置600對基材收容部20 進行的減壓:僅對基材收容部20進行減壓;對包括基材收容部20的基材支持裝置100進行減壓;或將包括基材支持裝置100的腔室200的內部整體保持為減壓狀態。 The substrate storage section 20 using the pressure reducing device 600 can be performed as follows. Decompression performed: Only the substrate accommodating portion 20 is decompressed; the substrate supporting device 100 including the substrate accommodating portion 20 is decompressed; or the entire interior of the chamber 200 including the substrate supporting device 100 is maintained as Decompression state.

具體而言,減壓裝置600可連接至腔室200或基材支持裝置100而對基材收容部20進行減壓,連接可為直接連接至腔室200、直接連接至基材支持裝置100、連接至位於基材支持裝置100的下方的下端支持部400、連接至位於基材支持裝置100上的上端固定部500。 Specifically, the decompression device 600 may be connected to the chamber 200 or the substrate support device 100 to decompress the substrate accommodating portion 20. The connection may be directly connected to the chamber 200, directly connected to the substrate support device 100, It is connected to the lower end support part 400 located below the base material supporting device 100 and to the upper end fixing part 500 located on the base material supporting device 100.

減壓裝置600可與控制上述減壓程度的控制閥610連接。 The pressure reducing device 600 may be connected to a control valve 610 that controls the degree of pressure reduction.

若保持減壓狀態,則可有助於使溶膠溶液或清洗溶液快速且充分地供給至基材收容部20及滲入至基材10,可有效地去除因基材中的纖維的表面張力產生的氣泡。 Maintaining the reduced pressure can help to quickly and sufficiently supply the sol solution or the cleaning solution to the substrate accommodating portion 20 and penetrate into the substrate 10, and effectively remove the surface tension caused by the fibers in the substrate. bubble.

減壓狀態能夠以基材收容部20、基材支持裝置100的內部或腔室200內的絕對壓力為基準而為300Torr以下的減壓狀態,且可為0.001Torr至300Torr的減壓狀態、0.001Torr至100Torr的減壓狀態或0.001Torr至10Torr的減壓狀態。 The decompression state can be a decompression state of 300 Torr or less based on the absolute pressure inside the substrate accommodating section 20, the substrate support device 100, or the chamber 200, and can be a decompression state of 0.001 Torr to 300 Torr, 0.001 Torr to 100 Torr decompression state or 0.001 Torr to 10 Torr decompression state.

板狀氣凝膠組成物製備裝置900可更包括位於基材支持裝置100的下端而支持基材支持裝置100的下端支持部400。 The plate-shaped aerogel composition preparation device 900 may further include a lower end support portion 400 located at the lower end of the substrate support device 100 and supporting the substrate support device 100.

下端支持部400可與腔室200一體地配置、或單獨地配置。下端支持部400可為平板形態、或具有收容基材支持裝置100的收容槽(未圖示)的平板形態。 The lower end support portion 400 may be disposed integrally with the cavity 200 or separately. The lower end support portion 400 may be in a flat plate form or a flat plate form having a receiving groove (not shown) for receiving the substrate supporting device 100.

下端支持部400可容許流體於下端支持部400的一面與基材收容部20的下端之間沿z方向移動。具體而言,下端支持部400其本身可為網狀(mesh type)或具有多個開口(holes)。另外, 下端支持部400可於基材收容部20的下端定位至下端支持部400上的面具有狹縫、網或多個開口。 The lower end support part 400 allows fluid to move in the z direction between one surface of the lower end support part 400 and the lower end of the base material storage part 20. Specifically, the lower end support part 400 itself may be a mesh type or have a plurality of holes. In addition, The lower end support portion 400 can be positioned at the lower end of the substrate receiving portion 20 to a surface on the lower end support portion 400 with a slit, a net, or a plurality of openings.

下端支持部400可更包括可於內部移動或收容流體的流體收容部(未圖示),流體收容部藉由溶液流入部(未圖示)而與溶液供給部300彼此連接,從而可自溶液供給部接收溶膠溶液或清洗溶液而收容。收容於流體收容部的溶膠溶液或清洗溶液可藉由自溶液供給部提供的加壓、基材收容部20的減壓或加壓及減壓而導入至收容於基材收容部20的基材10。 The lower support portion 400 may further include a fluid storage portion (not shown) that can move or store a fluid therein. The fluid storage portion is connected to the solution supply portion 300 through a solution inflow portion (not shown), so that the fluid can be removed from the solution. The supply unit receives and receives the sol solution or the cleaning solution. The sol solution or the cleaning solution contained in the fluid containing section can be introduced into the substrate contained in the substrate containing section 20 by the pressure supplied from the solution supply section, the decompression of the substrate containing section 20, or the pressure and decompression. 10.

下端支持部400可更包括可於內部移動或收容流體的流體收容部(未圖示),流體收容部由減壓裝置600控制,可對流體收容部(未圖示)及與其連接的基材收容部20的空氣密度、即氣壓進行調節。具體而言,若藉由減壓裝置而使流體收容部減壓,則亦可對與下端支持部400連接而容許流體於z方向上移動的基材收容部20進行減壓。於如上所述般減壓的情形時,可將產生於基材的纖維之間的氣泡最少化。 The lower support portion 400 may further include a fluid containing portion (not shown) that can move or contain a fluid inside. The fluid containing portion is controlled by the pressure reducing device 600, and can be used for the fluid containing portion (not shown) and a substrate connected thereto. The density of the air, that is, the air pressure, of the accommodation section 20 is adjusted. Specifically, if the fluid storage section is decompressed by the pressure reducing device, the base storage section 20 connected to the lower end support section 400 and allowing the fluid to move in the z direction may be decompressed. When the pressure is reduced as described above, bubbles generated between the fibers of the substrate can be minimized.

基材收容部20具有開放的上端,板狀氣凝膠組成物製備裝置900可於基材支持裝置100的上部更包括上端固定部500。 The substrate storage portion 20 has an open upper end. The plate-shaped aerogel composition preparation device 900 may further include an upper end fixing portion 500 on the upper portion of the substrate support device 100.

上端固定部500可呈平板形態、或呈具有收容基材支持裝置100的收容槽(未圖示)的平板形態。 The upper end fixing portion 500 may be in the form of a flat plate or in the form of a flat plate having a receiving groove (not shown) for receiving the substrate supporting device 100.

上端固定部500可與基材支持裝置100結合固定、或解除結合,於上端固定部500與基材支持裝置100解除結合的情形時,上端固定部500可自基材支持裝置100去除而單獨定位。 The upper end fixing portion 500 may be fixed and released from the substrate supporting device 100. When the upper fixing portion 500 is decoupled from the substrate supporting device 100, the upper fixing portion 500 may be removed from the substrate supporting device 100 and positioned separately. .

上端固定部500的下端可容許流體於其與基材收容部20的上端之間沿z方向移動。具體而言,上端固定部500的至少一 面本身可於整體上為網狀(mesh type)或具有多個開口(holes)。 另外,上端固定部500的至少一面可於上端固定部500的與基材收容部20的上端對應的位置具有狹縫、網或多個開口。於此種情形時,即便設置有上端固定部500,流體亦可沿z方向朝向基材收容部20的上端移動,具體而言,溶液或空氣可進行移動。 The lower end of the upper end fixing portion 500 may allow the fluid to move in the z direction between the fluid and the upper end of the substrate containing portion 20. Specifically, at least one of the upper end fixing portions 500 The face itself may be a mesh type as a whole or have multiple holes. In addition, at least one side of the upper end fixing portion 500 may have a slit, a net, or a plurality of openings at a position of the upper end fixing portion 500 corresponding to the upper end of the substrate containing portion 20. In this case, even if the upper end fixing portion 500 is provided, the fluid can move toward the upper end of the substrate containing portion 20 in the z direction. Specifically, the solution or air can move.

上端固定部500可更包括於內部收容流體且使流體向基材收容部20移動的流體收容部(未圖示),流體收容部藉由溶液流入部(未圖示)而與溶液供給部300彼此連接,從而可自上述溶液供給部接收溶膠溶液或清洗溶液而收容。收容於流體收容部的溶膠溶液或清洗溶液可藉由自溶液供給部提供的加壓、基材收容部20的減壓或加壓及減壓而導入至收容於基材收容部20的基材10。 The upper end fixing portion 500 may further include a fluid storage portion (not shown) that stores fluid inside and moves the fluid toward the base material storage portion 20, and the fluid storage portion is connected to the solution supply portion 300 through a solution inflow portion (not shown). They are connected to each other, and can receive and receive a sol solution or a cleaning solution from the solution supply unit. The sol solution or the cleaning solution contained in the fluid containing section can be introduced into the substrate contained in the substrate containing section 20 by the pressure supplied from the solution supply section, the decompression of the substrate containing section 20, or the pressure and pressure. 10.

上端固定部500可更包括於內部移動或收容流體的流體收容部(未圖示),流體收容部由減壓裝置600控制,可對流體收容部(未圖示)及與其連接的基材收容部20的空氣密度、即氣壓進行調節。具體而言,若藉由減壓裝置而使流體收容部減壓,則亦可對與上端固定部500連接而容許流體於z方向上移動的基材收容部20進行減壓。於如上所述般減壓的情形時,可將於基材的纖維之間產生的氣泡最少化。 The upper fixed part 500 may further include a fluid storage part (not shown) that moves or stores fluid inside. The fluid storage part is controlled by the pressure reducing device 600 and can hold the fluid storage part (not shown) and a substrate connected thereto. The air density of the section 20, that is, the air pressure is adjusted. Specifically, if the fluid storage portion is decompressed by the pressure reduction device, the base material storage portion 20 connected to the upper end fixing portion 500 to allow the fluid to move in the z direction may be decompressed. When the pressure is reduced as described above, bubbles generated between the fibers of the substrate can be minimized.

上端固定部500發揮與多個分離部30結合而使分離部彼此固定的分離部30的結合單元的作用。如上所述,於上端固定部500發揮將多個分離部30彼此結合並固定的作用的情形時,可藉由以固定分離部30的狀態自腔室去除上端固定部500的方法,而簡單地將基材支持裝置100與基材10分離。 The upper end fixing portion 500 functions as a coupling unit of the separation portion 30 that is coupled to the plurality of separation portions 30 and fixes the separation portions to each other. As described above, when the upper-end fixing portion 500 functions to couple and fix the plurality of separation portions 30 to each other, the method of removing the upper-end fixing portion 500 from the chamber in a state where the separation portions 30 are fixed can be simply performed. The substrate supporting device 100 is separated from the substrate 10.

板狀氣凝膠組成物製備裝置900可更包括回收供給於基材支持裝置100或基材收容部20的溶膠溶液或清洗溶液的溶液回收部700。 The plate-shaped aerogel composition preparation device 900 may further include a solution recovery unit 700 that recovers the sol solution or the cleaning solution supplied to the substrate support device 100 or the substrate storage portion 20.

溶液回收部700可連接至腔室200。 The solution recovery part 700 may be connected to the chamber 200.

溶液回收部700可連接至下端支持部400。 The solution recovery part 700 may be connected to the lower end support part 400.

溶液回收部700可連接至基材支持裝置100。 The solution recovery part 700 may be connected to the substrate supporting device 100.

溶液回收部700可連接至上端固定部500。 The solution recovery part 700 may be connected to the upper end fixing part 500.

溶液回收部700可與控制流入至溶液回收部700的溶液的控制閥710連接。 The solution recovery unit 700 may be connected to a control valve 710 that controls a solution flowing into the solution recovery unit 700.

藉由溶液回收部700回收的溶膠溶液或清洗溶液可分別移動至供給溶膠溶液的溶液供給部或供給清洗溶液的溶液供給部。為了實現上述移動,可應用於通常的溶液再利用過程中所應用的製程,具體而言,可應用自所回收的溶液去除異物的過濾部(未圖示)、使溶液移動的泵(未圖示)、及控制移動的控制閥710等。 The sol solution or the cleaning solution recovered by the solution recovery unit 700 can be moved to a solution supply unit that supplies the sol solution or a solution supply unit that supplies the cleaning solution, respectively. In order to realize the above-mentioned movement, it can be applied to a process used in a general solution reuse process. Specifically, a filter (not shown) for removing foreign matter from the recovered solution, and a pump (not shown) for moving the solution can be applied. (Shown), and a control valve 710 that controls movement.

腔室200發揮如下作用:於其內部收容基材支持裝置100,於供給溶膠溶液或清洗溶液的情形時、或於對基材收容部20進行減壓的過程中密封腔室的內部。而且,腔室200的上端或下端可開放,可藉由開放的上端或下端而順利地移動基材支持裝置100或基材10。 The chamber 200 plays a role of accommodating the substrate supporting device 100 therein, and seals the inside of the chamber when a sol solution or a cleaning solution is supplied, or when the substrate accommodating portion 20 is decompressed. In addition, the upper or lower end of the chamber 200 may be opened, and the substrate supporting device 100 or the substrate 10 may be smoothly moved by the opened upper or lower end.

溶液供給部300可向基材10或基材收容部20供給溶膠溶液(Sol solution)。 The solution supply unit 300 may supply a sol solution to the substrate 10 or the substrate storage unit 20.

溶液供給部300可直接或藉由其他構成要素連接至腔室200或基材支持裝置100而藉由控制閥310供給溶膠溶液,於未直 接與腔室200連接的狀態下,可向基材支持裝置100、基材收容部20或基材10供給溶膠溶液。 The solution supply unit 300 may be connected to the chamber 200 or the substrate support device 100 directly or through other components, and the sol solution is supplied through the control valve 310. In a state of being connected to the chamber 200, the sol solution can be supplied to the substrate supporting device 100, the substrate storage portion 20, or the substrate 10.

上述連接可為直接連接至腔室200、直接連接至基材支持裝置100、連接至位於基材支持裝置100的下方的下端支持部400、連接至位於基材支持裝置100上的上端固定部500。 The above connection may be directly connected to the chamber 200, directly connected to the substrate support device 100, connected to the lower end support portion 400 located below the substrate support device 100, and connected to the upper end fixed portion 500 located on the substrate support device 100. .

溶液供給部300可向基材收容部20或基材10供給清洗溶液。 The solution supply part 300 can supply a cleaning solution to the substrate storage part 20 or the substrate 10.

溶液供給部300直接或藉由其他構成要素連接至腔室200或基材支持裝置100而藉由控制閥310供給清洗溶液,於未直接與腔室200連接的狀態下,可向基材支持裝置100、位於基材收容部20內的基材10、或呈去除分離部30的狀態的基材10供給清洗溶液。 The solution supply unit 300 is connected to the chamber 200 or the substrate support device 100 directly or through other components, and the cleaning solution is supplied through the control valve 310. The substrate supply device can be connected to the substrate support device without being directly connected to the chamber 200. 100. The substrate 10 located in the substrate storage portion 20 or the substrate 10 in a state where the separation portion 30 is removed is supplied with a cleaning solution.

上述連接可為直接連接至腔室200、直接連接至基材支持裝置100、連接至位於基材支持裝置100的下方的下端支持部400、連接至位於基材支持裝置100上的上端固定部500。 The above connection may be directly connected to the chamber 200, directly connected to the substrate support device 100, connected to the lower end support portion 400 located below the substrate support device 100, and connected to the upper end fixed portion 500 located on the substrate support device 100. .

溶液供給部300可與控制由溶液供給部300供給的溶液的控制閥310連接。 The solution supply unit 300 may be connected to a control valve 310 that controls a solution supplied by the solution supply unit 300.

於以含浸及凝膠化為目的而應用板狀氣凝膠組成物製備裝置900的情形時,溶液供給部300可用於供給溶膠溶液。 When the plate-shaped aerogel composition preparation device 900 is applied for the purpose of impregnation and gelation, the solution supply unit 300 may be used to supply a sol solution.

以清洗及重組為目的而應用板狀氣凝膠組成物製備裝置900的情形時,溶液供給部300可用於供給清洗溶液。除清洗溶液以外可更包括重組溶液,可將清洗溶液與重組溶液儲存至單獨的空間,而於即將供給溶液前藉由攪拌單元攪拌後注入,可依次供給清洗溶液與重組溶液。 When a plate-shaped aerogel composition preparation device 900 is applied for the purpose of cleaning and reorganization, the solution supply unit 300 can be used to supply a cleaning solution. In addition to the cleaning solution, a reconstituted solution may be further included. The cleaning solution and the reconstituted solution may be stored in separate spaces, and immediately after the solution is supplied by stirring by a stirring unit, the cleaning solution and the reconstituted solution may be sequentially supplied.

本發明的另一實施例的板狀氣凝膠組成物製備用的基材支持裝置100藉由分離部30分割空間,而於空間上區分收容2個以上的基材,其包括:第一基材收容部20,為如下空間,即,收容第一基材10,呈具有x方向長度、y方向長度及z方向長度的板狀,z方向長度值大於x方向長度值或y方向長度值;第二基材收容部20,為如下空間,與第一基材收容部20相鄰,於空間上與第一基材收容部20區分且收容第二基材10;及分離部30,位於第一基材收容部20與第二基材收容部20之間而區分兩個空間;且包括第一基材收容部20及第二基材收容部20的基材收容部20的下端或上端開放。 The substrate supporting device 100 for preparing a plate-like aerogel composition according to another embodiment of the present invention divides a space by a separation section 30, and divides and accommodates two or more substrates in space. The substrate includes: a first substrate The material accommodating portion 20 is a space for accommodating the first substrate 10 in a plate shape having an x-direction length, a y-direction length, and a z-direction length, and the z-direction length value is greater than the x-direction length value or the y-direction length value; The second substrate storage portion 20 is a space adjacent to the first substrate storage portion 20 and is spatially distinguished from the first substrate storage portion 20 and accommodates the second substrate 10; and the separation portion 30 is located at the first A substrate receiving portion 20 and a second substrate receiving portion 20 define two spaces; and the lower or upper ends of the substrate receiving portion 20 including the first substrate receiving portion 20 and the second substrate receiving portion 20 are open. .

具體而言,上述基材收容部20於以x方向長度值或y方向長度值中更小的值為基準值時,z方向長度值可具有基準值的5倍以上的值。更具體而言,基材收容部20於以x方向長度值或y方向長度值中更小的值為基準值時,z方向長度值可具有基準值的10倍以上的值。更具體而言,基材收容部20於以x方向長度值或y方向長度值中更小的值為基準值時,z方向長度值可具有基準值的50倍至300倍的值。於應用具有此種長度值的基材收容部的情形時,能夠以較廣的面積製備具有更優異的特性的氣凝膠組成物。 Specifically, when the substrate storage portion 20 uses the smaller of the x-direction length value or the y-direction length value as a reference value, the z-direction length value may have a value that is five times or more the reference value. More specifically, when the substrate storage portion 20 uses the smaller of the x-direction length value or the y-direction length value as a reference value, the z-direction length value may have a value that is 10 times or more the reference value. More specifically, when the substrate storage portion 20 uses the smaller of the x-direction length value or the y-direction length value as a reference value, the z-direction length value may have a value of 50 to 300 times the reference value. When a substrate containing portion having such a length value is applied, an aerogel composition having more excellent characteristics can be prepared over a wide area.

基材收容部20於以插入至其的基材10的x方向長度值與y方向長度值中更小的值為「基材的基準值」時,與其對應的基材收容部20的x方向長度值與y方向長度值中更小的值即「基材收容部的長度值」可為基材的基準值的1.00倍至3.00倍,具體而言可為1.05倍至2.5倍,更具體而言可為1.05倍至2.0倍。於基材收容部20與基材的基準值進行比較而對應的基材收容部的長度 值為3.00倍以上的情形時,會無法由基材收容部20充分地支持基材10,於未滿1.00倍的情形時,溶膠溶液的含浸會不充分。另外,於基材收容部20與基材的基準值進行比較而對應的長度值為1.05倍至2.0倍的情形時,有利於製備表面平坦且表面特性較為固定的氣凝膠組成物。 When the smaller value of the x-direction length value and the y-direction length value of the substrate 10 inserted into the substrate storage portion 20 is the "base material reference value", the x direction of the substrate storage portion 20 corresponding thereto The smaller of the length value and the y-direction length value, that is, the "length value of the substrate receiving portion" may be 1.00 to 3.00 times the reference value of the substrate, specifically 1.05 to 2.5 times, and more specifically, It can be 1.05 times to 2.0 times. The length of the substrate storage section corresponding to the reference value of the substrate storage section 20 and the substrate When the value is 3.00 times or more, the substrate 10 cannot be sufficiently supported by the substrate accommodating part 20, and when it is less than 1.00 times, the impregnation of the sol solution is insufficient. In addition, when the length of the substrate containing portion 20 and the reference value of the substrate are compared and the corresponding length value is 1.05 to 2.0 times, it is advantageous to prepare an aerogel composition having a flat surface and a fixed surface property.

分離部30可為壁形態,基材收容部20的上端與下端開放。 The separation portion 30 may be in the form of a wall, and the upper and lower ends of the substrate receiving portion 20 are open.

分離部30可為包括正面、左側面、背面及右側面的柱形態,基材收容部20為四周由柱形態的分離部30包圍的空間,其上端與下端開放。 The separation portion 30 may be in the form of a column including a front surface, a left side, a back surface, and a right side. The base material receiving portion 20 is a space surrounded by the separation portion 30 in the shape of a column, and its upper and lower ends are open.

分離部30可為間隔壁狀,阻隔流體於第一基材收容部20與第二基材收容部20之間沿x方向或y方向移動。 The separation portion 30 may be a partition wall, and blocks fluid from moving between the first substrate receiving portion 20 and the second substrate receiving portion 20 in the x direction or the y direction.

分離部30可為網狀或具有多個開口(holes),容許流體於第一基材收容部20與第二基材收容部20之間沿x方向或y方向移動。 The separation portion 30 may be mesh-shaped or have a plurality of holes, allowing the fluid to move between the first substrate receiving portion 20 and the second substrate receiving portion 20 in the x direction or the y direction.

基材支持裝置100可與對基材收容部20進行減壓的減壓裝置連接。 The substrate support device 100 can be connected to a pressure reduction device that decompresses the substrate storage portion 20.

基材支持裝置100可更包括位於基材支持裝置100的下端而支持基材支持裝置100及收容至基材支持裝置的基材10的下端部(未圖示),下端部容許流體於基材收容部20的下端沿z方向移動,具體而言,可為網狀或具有多個開口。 The substrate supporting device 100 may further include a lower end portion (not shown) for supporting the substrate supporting device 100 and the substrate 10 accommodated in the substrate supporting device at a lower end of the substrate supporting device 100, and the lower end portion allows fluid to the substrate. The lower end of the accommodating portion 20 moves in the z direction. Specifically, the receiving portion 20 may have a mesh shape or have a plurality of openings.

流體收容部由外部的減壓裝置600控制,可調節基材收容部20的空氣密度、即氣壓,特別是可進行減壓。 The fluid containing section is controlled by an external pressure reducing device 600, and the air density, that is, the air pressure, of the substrate containing section 20 can be adjusted, and in particular, the pressure can be reduced.

下端支持部400可使供給的溶膠溶液或清洗溶液移動至 基材收容部20。 The lower support part 400 can move the supplied sol solution or cleaning solution to Substrate receiving section 20.

基材支持裝置100中基材收容部20可具有開放的上端。 In the substrate supporting device 100, the substrate accommodating portion 20 may have an open upper end.

基材支持裝置100可更包括位於其開放的上端上的上端部(未圖示),上端部容許流體沿z方向朝向基材收容部20移動。 The substrate supporting device 100 may further include an upper end portion (not shown) located on the open upper end thereof, and the upper end portion allows the fluid to move toward the substrate receiving portion 20 in the z direction.

上端部可使供給的溶膠溶液或清洗溶液移動至基材收容部20。 The upper end portion can move the supplied sol solution or cleaning solution to the substrate storage portion 20.

基材支持裝置100可與回收所供給的溶膠溶液或清洗溶液的溶液回收部700連接。 The substrate supporting device 100 may be connected to a solution recovery unit 700 that recovers the supplied sol solution or cleaning solution.

以下,對上述板狀氣凝膠組成物製備裝置或板狀氣凝膠組成物製備用基材支持裝置的使用方法進行說明。 Hereinafter, a method of using the plate-shaped aerogel composition preparation device or the plate-shaped aerogel composition preparation substrate supporting device will be described.

上述基材支持裝置藉由如下方式製造:準備多個壁形態或柱形態的分離部,以具有適當的基材收容部的方式配置。此時,於柱形態的分離部的情形時,只要並排配置具有適當的基材收容部的分離部即可,於壁形態的分離部的情形時,以具有適當的基材收容部的方式配置。此時,於利用為了可更容易地於分離部之間形成適當的基材收容部空間而形成有收容槽的正面部、背面部或上述正面部及背面部兩者的情形時,可更便利地形成基材收容部。可應用固定如上所述般配置的多個分離部的結合單元。 The above-mentioned substrate supporting device is manufactured by preparing a plurality of separation sections in the form of a wall or a column, and arranging them so as to have appropriate substrate accommodating sections. In this case, in the case of a column-shaped separation section, it is only necessary to arrange the separation section having an appropriate substrate storage section side by side, and in the case of a wall-shaped separation section, it is disposed so as to have an appropriate substrate storage section. . In this case, it may be more convenient to use a front surface portion, a rear surface portion, or both the front surface portion and the rear surface portion in which a storage groove is formed in order to more easily form an appropriate substrate storage portion space between the separation portions. A substrate receiving portion is formed on the ground. A bonding unit to which a plurality of separation sections arranged as described above are fixed can be applied.

可於腔室內配置此種分離部,且可於設置於腔室內的下端支持部上配置此種分離部。此時,於下端支持部的定位分離部的部分形成有插入槽的情形時,可更容易地配置此種分離部。另外,此種分離部可於腔室外完成配置後,以藉由結合單元結合的狀態移動至腔室內。此時,可於與腔室單獨地構成的下端支持部上配置分離部,於此種情形時,下端支持部與配置於下端支持部 上的分離部可一併移動至腔室內。 Such a separation portion may be arranged in the chamber, and such a separation portion may be arranged on a lower end support portion provided in the chamber. In this case, when an insertion groove is formed in a portion of the lower support portion that positions the separation portion, such a separation portion can be more easily disposed. In addition, such a separation part can be moved into the chamber in a state of being combined by a coupling unit after the configuration is completed outside the chamber. At this time, a separation portion may be disposed on the lower end support portion which is separately formed from the chamber. In this case, the lower end support portion and the lower end support portion are disposed. The upper separation part can be moved into the chamber together.

基材支持裝置於移動至腔室前或於設置於腔室內後進行將基材插入至基材支持裝置的過程,此後選擇性地設置上端固定部。 The substrate supporting device performs the process of inserting the substrate into the substrate supporting device before moving to the chamber or after being disposed in the chamber, and thereafter, an upper end fixing portion is selectively provided.

向收容於基材支持裝置內的基材供給溶膠溶液而製成基材由溶膠溶液含浸的含浸基材。 A sol solution is supplied to a substrate accommodated in a substrate supporting device to prepare an impregnated substrate whose substrate is impregnated with the sol solution.

可自基材的上端供給溶膠溶液,亦可直接連接溶液供給部與基材支持裝置而供給溶膠溶液,溶液供給部與上端固定部連接,溶膠溶液可經由上端固定部的流體收容部向基材收容部的上端移動而含浸基材。 The sol solution can be supplied from the upper end of the substrate, or the sol solution can be directly connected to the solution supply portion and the substrate supporting device. The solution supply portion is connected to the upper fixing portion, and the sol solution can be supplied to the substrate through the fluid receiving portion of the upper fixing portion. The upper end of the storage portion moves to impregnate the substrate.

此時,下端支持部可與減壓裝置連接,可於供給溶膠溶液的同時、或於供給溶膠溶液後實施減壓而充分地進行含浸,特別是去除纖維之間的氣泡。而且,藉由此種減壓亦可獲得防止因溶膠溶液形成的奈米組織崩塌的效果。 At this time, the lower support portion may be connected to the pressure reducing device, and the impregnation may be performed sufficiently while the sol solution is supplied or after the sol solution is supplied, and the air bubbles between the fibers may be removed. In addition, the effect of preventing the collapse of the nanostructure formed by the sol solution can also be obtained by such a reduced pressure.

於如上所述般完成溶膠溶液的含浸過程後,可進行用以實現凝膠化的熟化(老化)過程。於熟化過程中、或於充分地進行熟化過程後,基材(凝膠化基材)與基材支持裝置會分離。 After the impregnation process of the sol solution is completed as described above, an aging (aging) process for achieving gelation may be performed. During the aging process or after the aging process is sufficiently performed, the substrate (the gelled substrate) is separated from the substrate supporting device.

即便發生此種分離,因基材(凝膠化基材)已進行一定程度的凝膠化而體積較最初插入的基材增加,與自基材支持裝置分離前相似地亦穩定地位於腔室內。 Even if such separation occurs, the substrate (gelated substrate) has been gelled to a certain extent and its volume is increased compared to the substrate that was originally inserted, and it is stably located in the chamber similar to that before separation from the substrate support device. .

基材支持裝置的上端或下端開放,因此,可藉由使基材(凝膠化基材)通過所開放的上端或下端的方法簡單地與基材分離。 Since the upper or lower end of the substrate supporting device is open, the substrate (gelated substrate) can be easily separated from the substrate by passing the opened upper or lower end.

可於如上所述般去除基材支持裝置的腔室內進行溶劑去 除製程。此種溶劑去除製程為去除凝膠化基材中所包括的溶劑而使濕凝膠變為氣凝膠的過程,可視需要而i)直接進行溶劑去除製程、ii)進行重組及溶劑去除製程、iii)進行清洗及溶劑去除製程、或iv)進行清洗、重組及溶劑去除製程。 Solvent removal in the chamber of the substrate support device as described above Division process. This solvent removal process is a process of removing the solvent included in the gelled substrate and turning the wet gel into an aerogel. If necessary, i) directly perform the solvent removal process, ii) perform the reorganization and the solvent removal process, iii) performing cleaning and solvent removal processes, or iv) performing cleaning, reorganization and solvent removal processes.

具體而言,於需進行清洗的情形時,可藉由溶液供給部供給清洗溶液而進行清洗及乾燥製程,於需進行重組的情形時,可藉由溶液供給部供給重組溶液而進行重組及乾燥製程。此時,亦可使清洗溶液一併包括重組溶液而同時進行氣凝膠的疏水化處理。 Specifically, when cleaning is required, the cleaning and drying process can be performed by supplying a cleaning solution from a solution supply unit, and when reorganization is required, the reorganization and drying can be performed by supplying a reconstituted solution from a solution supply unit. Process. At this time, the aerogel may be hydrophobized while the cleaning solution includes the recombination solution.

清洗溶液(或重組溶液)可自基材(凝膠化基材)的上端方向或下端方向注入供給,剩餘清洗溶液(或重組溶液)可移動至下端支持部或與腔室連接的溶液收容部而排出,或再次傳輸至溶液供給部而再利用。 The cleaning solution (or reconstituted solution) can be injected and supplied from the upper or lower direction of the substrate (gelated substrate), and the remaining cleaning solution (or reconstituted solution) can be moved to the lower support portion or the solution storage portion connected to the chamber. Then, it is discharged or re-transmitted to the solution supply unit for reuse.

以下,對上述板狀氣凝膠組成物製備裝置或板狀氣凝膠組成物製備用基材支持裝置的另一使用方法進行說明。 Hereinafter, another method of using the plate-shaped aerogel composition preparation device or the plate-shaped aerogel composition preparation substrate supporting device will be described.

於基材支持裝置配置固定分離部的過程與上述內容相同。然而,此時分離部應用可使流體沿x方向與y方向移動的呈網狀或具有多個開口的分離部。另外,分別於基材支持裝置的下端與上端設置容許流體於z方向上移動的下端部及上端部。 The process of arranging the fixed separation part in the substrate supporting device is the same as the above. However, at this time, the separation part is applied as a separation part having a net shape or having a plurality of openings, which can move the fluid in the x direction and the y direction. In addition, a lower end portion and an upper end portion that allow the fluid to move in the z direction are provided at the lower end and the upper end of the substrate supporting device, respectively.

於如上所述般應用可使流體移動的分離部且亦設置可使流體移動的下端部與上端部的情形時,使基材位於基材支持部的內部空間進行支持,但溶液或空氣可沿x、y、z方向移動。於此種情形時,可向腔室的內部整體供給溶膠溶液進行減壓過程。另外,於凝膠化過程進行一定程度後,亦可不變更腔室而進行溶劑 去除過程,但為了製程效率,可於將基材支持裝置移動至另外的清洗容器或溶劑去除用容器(或溶劑去除裝置)後進行溶劑去除製程,可視需要進行清洗及重組過程。此時,基材支持裝置除上端與下端以外,四周均具有流體透過性,因此,可直接以不去除基材支持裝置的狀態進行清洗、重組及乾燥過程。 In the case where a fluid-movable separation portion is also applied as described above, and a lower end portion and an upper end portion that are capable of moving the fluid are also provided, the substrate is located in the internal space of the substrate support portion to support it, but the solution or air Move in x, y, and z directions. In this case, the entire sol solution can be supplied to the inside of the chamber to perform the decompression process. In addition, after the gelation process has progressed to a certain degree, the solvent can also be performed without changing the chamber. Removal process, but for process efficiency, the substrate support device can be moved to another cleaning container or solvent removal container (or solvent removal device) to perform the solvent removal process, and the cleaning and recombination process can be performed as needed. At this time, the substrate supporting device is fluidly permeable all around except the upper end and the lower end. Therefore, the cleaning, recombination, and drying processes can be performed directly without removing the substrate supporting device.

本發明的又一實施例的板狀氣凝膠組成物的製備方法包括:含浸步驟,其向基材支持裝置供給溶膠溶液而製備位於基材收容部內且由溶膠溶液含浸的板狀基材,即含浸基材,基材支持裝置包括2個以上的基材收容部及分離部,且於基材收容部收容有板狀基材,2個以上的基材收容部為如下空間,即,呈具有x方向長度、y方向長度及z方向長度的板狀(plate type),z方向長度值大於x方向長度值或y方向長度值,分離部於空間上區分彼此相鄰的基材收容部;老化步驟,誘導含浸基材中所含有的溶膠溶液凝膠化及熟化而製備凝膠化基材;裝置去除步驟,藉由基材收容部的開放的上端或下端而自凝膠化基材去除基材支持裝置;及溶劑去除步驟,自凝膠化基材去除溶劑而製備氣凝膠組成物。 A method for preparing a plate-like aerogel composition according to another embodiment of the present invention includes an impregnation step of supplying a sol solution to a substrate supporting device to prepare a plate-like substrate located in a substrate receiving portion and impregnated with the sol solution. That is, the substrate is impregnated. The substrate supporting device includes two or more substrate storage sections and separation sections, and a plate-shaped substrate is stored in the substrate storage section. The two or more substrate storage sections are as follows. A plate type having an x-direction length, a y-direction length, and a z-direction length. The z-direction length value is greater than the x-direction length value or the y-direction length value. The separation section spatially distinguishes adjacent substrate storage sections; An aging step to induce gelation and maturation of the sol solution contained in the impregnated substrate to prepare a gelled substrate; a device removal step to remove the gelled substrate from the open upper or lower end of the substrate containing portion A substrate supporting device; and a solvent removing step to remove the solvent from the gelled substrate to prepare an aerogel composition.

對基材、基材收容部、基材支持裝置等的說明與上述內容重複,因此,省略其具體說明,上述內容包括於上述板狀氣凝膠組成物的製備方法的說明中。 The description of the substrate, the substrate accommodating portion, the substrate supporting device, and the like are the same as those described above, and therefore, detailed descriptions thereof are omitted, and the above contents are included in the description of the method for preparing the plate-shaped aerogel composition.

基材可應用具有x方向長度、y方向長度及z方向長度的板狀(plate type)織物、不織布、編網或其積層體,於此種情形時,可製備板狀的氣凝膠氈、氣凝膠片等。 The substrate can be a plate type fabric, a non-woven fabric, a net, or a laminate thereof having a length in the x direction, a length in the y direction, and a length in the z direction. In this case, a plate-shaped aerogel mat, Aerogel tablets and so on.

基材可單獨或與片狀基材一併應用可形成氣凝膠組成物 的發泡體、黏合劑、纖維、棉狀纖維凝集體等,於此種情形時,可根據基材收容部的尺寸及形狀製備氣凝膠組成物,具體而言,可製備板狀的氣凝膠片、氣凝膠面板、氣凝膠氈等。 The substrate can be used alone or in combination with a sheet substrate to form an aerogel composition Foams, adhesives, fibers, cotton-like fiber aggregates, etc. In this case, aerogel compositions can be prepared according to the size and shape of the substrate storage portion. Specifically, plate-shaped aerogels can be prepared. Gel sheet, aerogel panel, aerogel felt, etc.

作為基材的素材,例如可應用選自由無機纖維、有機纖維及其組合所組成的族群中的任一種。無機纖維可包括選自由玻璃纖維(glass fibers)、玻璃絨(glass wool)、岩絨(rock wool)、陶瓷絨(ceramic wool)、硼纖維(boron fibers)及其組合所組成的族群中的任一種。有機纖維可包括選自由尼龍、芳香族聚醯胺纖維、碳纖維、聚丙烯纖維、聚乙烯纖維、聚酯纖維、聚胺基甲酸酯纖維、丙烯酸纖維、聚氯乙酸乙烯酯纖維、嫘縈纖維、再生纖維(regenerated fibers)、廢纖維(waste fibers)、棉纖維、亞麻纖維及其組合所組成的族群中的任一種。 As the material of the substrate, for example, any one selected from the group consisting of inorganic fibers, organic fibers, and combinations thereof can be applied. The inorganic fiber may include any one selected from the group consisting of glass fibers, glass wool, rock wool, ceramic wool, boron fibers, and combinations thereof. One. The organic fiber may include a fiber selected from the group consisting of nylon, aromatic polyamide fibers, carbon fibers, polypropylene fibers, polyethylene fibers, polyester fibers, polyurethane fibers, acrylic fibers, polyvinyl chloride fibers, and fluorene fibers. , Regenerated fibers, waste fibers, cotton fibers, flax fibers, and combinations thereof.

基材因具有多孔性而充分地含浸溶膠溶液,且藉由凝膠化過程而發揮氣凝膠支持體的作用。包括於基材的纖維的直徑為0.01μm至200μm,具體而言,可為0.01μm至100μm、0.05μm至50μm或0.1μm至20μm。纖維的長度為0.1mm至500mm,具體而言,可為0.1mm至100mm、0.2mm至200mm或0.5mm至50mm,但並不限定於此。 The substrate is sufficiently impregnated with the sol solution due to its porosity, and functions as an aerogel support through the gelation process. The diameter of the fiber included in the substrate is 0.01 μm to 200 μm, and specifically, may be 0.01 μm to 100 μm, 0.05 μm to 50 μm, or 0.1 μm to 20 μm. The length of the fiber is 0.1 mm to 500 mm, and specifically, may be 0.1 mm to 100 mm, 0.2 mm to 200 mm, or 0.5 mm to 50 mm, but is not limited thereto.

具體而言,作為基材,可應用玻璃纖維織物或陶瓷絨。 Specifically, as the base material, glass fiber fabric or ceramic wool can be applied.

於含浸步驟中插入至基材收容部的基材可為滿足如下條件者:以基材的x方向長度與y方向長度中更小的值為基準值,與其對應的基材收容部的長度值為基準值的1.05倍至3.00倍、1.2倍至2.5倍,更具體而言為1.4倍至2.0倍。 The substrate inserted into the substrate receiving portion in the impregnation step may be one that satisfies the following conditions: the smaller of the x-direction length and the y-direction length of the substrate is the reference value, and the length value of the corresponding substrate receiving portion It is 1.05 times to 3.00 times, 1.2 times to 2.5 times, and more specifically 1.4 times to 2.0 times the reference value.

溶膠溶液可為包括選自由氧化鋯、氧化釔、氧化鉿、氧 化鋁、氧化鈦、氧化鈰、氧化矽、氧化鎂、氧化鈣、氟化鎂及氟化鈣所組成的族群中的任一者的前驅物的溶液。此時,溶劑可根據包括於溶液的前驅物的特性而選擇應用。 The sol solution may be selected from the group consisting of zirconia, yttrium oxide, hafnium oxide, oxygen A solution of a precursor of any one of the group consisting of aluminum oxide, titanium oxide, cerium oxide, silicon oxide, magnesium oxide, calcium oxide, magnesium fluoride, and calcium fluoride. In this case, the solvent can be selected and applied according to the characteristics of the precursor included in the solution.

具體而言,作為溶膠溶液,可應用氧化矽類溶膠溶液,更具體而言,可應用選自由稱為水玻璃的矽酸鈉溶液、矽酸鉀溶液及其組合所組成的族群中的任一種。 Specifically, as the sol solution, a silica-based sol solution can be applied, and more specifically, any one selected from the group consisting of a sodium silicate solution called water glass, a potassium silicate solution, and a combination thereof can be applied. .

含浸可藉由將溶膠溶液供給至基材收容部或腔室並靜置的方式進行,此種含浸過程可進行10分鐘至2小時,更具體而言,可進行10分鐘至1小時。此時,於利用減壓裝置對基材收容部或腔室內進行減壓的情形時,可更快地進行含浸。 The impregnation may be performed by supplying the sol solution to the substrate containing portion or the chamber and leaving it to stand. This impregnation process may be performed for 10 minutes to 2 hours, and more specifically, for 10 minutes to 1 hour. In this case, when the pressure is reduced by the pressure-reducing device in the substrate storage portion or the chamber, the impregnation can be performed more quickly.

老化步驟為製備將於含浸步驟中製備的含浸基材中所含有的溶膠溶液凝膠化及熟化而形成的凝膠化基材的過程。 The aging step is a process of preparing a gelled substrate formed by gelation and aging of the sol solution contained in the impregnated substrate prepared in the impregnation step.

凝膠化可於觸媒條件下進行,此時,作為觸媒可應用酸性觸媒,具體而言,可應用硫酸溶液、鹽酸溶液或乙酸溶液等。 The gelation can be performed under the conditions of the catalyst. In this case, an acid catalyst can be used as the catalyst, and specifically, a sulfuric acid solution, a hydrochloric acid solution, or an acetic acid solution can be used.

老化步驟能夠以藉由減壓裝置將基材收容部、基材支持裝置或包括基材收容部的腔室內的空間減壓至300Torr以下的狀態進行。具體而言,能夠以0.001Torr至300Torr、0.001Torr至100Torr或0.001Torr至10Torr的範圍進行減壓。於藉由此種減壓而溶膠含浸至基材時,可有效地去除因基材所包括的纖維的表面張力產生的氣泡。另外,藉由此種減壓,可將因凝膠化而形成於含浸基材的奈米組織的崩塌最小化。 The aging step can be performed in a state in which the space in the substrate accommodating section, the substrate supporting device, or the chamber including the substrate accommodating section is reduced to 300 Torr or less by a decompression device. Specifically, the pressure can be reduced in a range of 0.001 Torr to 300 Torr, 0.001 Torr to 100 Torr, or 0.001 Torr to 10 Torr. When the sol is impregnated into the base material under such reduced pressure, air bubbles generated by the surface tension of the fibers included in the base material can be effectively removed. In addition, the collapse of the nanostructure formed on the impregnated substrate due to gelation can be minimized by this reduced pressure.

此種減壓可保持10分鐘至2小時,可保持10分鐘至1小時。 This decompression can be maintained for 10 minutes to 2 hours and for 10 minutes to 1 hour.

於老化步驟中,為了可使含浸基材充分地凝膠化而形成 奈米組織,可於常壓及40℃至80℃的溫度下放置2小時至48小時來進行熟化過程,可於40℃至60℃的溫度下放置4小時至24小時來進行熟化過程。與含浸基材相比,如上所述般熟化形成的凝膠化基材形成較為堅固的奈米凝膠構造。 In the aging step, it is formed in order to sufficiently gel the impregnated substrate. The nanostructure can be aged at a normal temperature and a temperature of 40 ° C to 80 ° C for 2 to 48 hours to perform the aging process, and can be left to stand at a temperature of 40 ° C to 60 ° C for 4 to 24 hours to perform the aging process. Compared with the impregnated base material, the gelled base material formed by curing as described above has a stronger nanogel structure.

裝置去除步驟將具有此種較為堅固的奈米凝膠構造的凝膠化基材與基材支持裝置分離。於應用除流體透過性材料以外的普通的間隔壁狀材料作為基材支持裝置的分離部的情形時,為了有效率地進行後續的溶劑去除步驟,可於實施溶劑去除步驟前執行此種基材支持裝置的分離。 The device removal step separates the gelled substrate having such a relatively strong nanogel structure from the substrate supporting device. In the case where an ordinary partition-like material other than the fluid-permeable material is used as the separation part of the substrate supporting device, in order to efficiently perform the subsequent solvent removal step, such a substrate may be performed before the solvent removal step is performed. Supports separation of devices.

於進行含浸步驟及老化步驟的期間,基材上的大部分溶膠溶液變為較為堅硬的構造的凝膠,從而奈米構造不會於基材支持裝置的分離過程中過度受損或崩塌。 During the impregnation step and the aging step, most of the sol solution on the substrate becomes a gel of a relatively hard structure, so that the nanostructure is not excessively damaged or collapsed during the separation process of the substrate supporting device.

如上所述般與基材支持裝置分離的凝膠化基材於同一腔室內進行溶劑去除步驟而製備成氣凝膠組成物。 As described above, the gelled substrate separated from the substrate supporting device is subjected to a solvent removal step in the same chamber to prepare an aerogel composition.

溶劑去除步驟為不使凝膠的奈米構造崩塌或將崩塌最小化而去除奈米構造中的溶劑的過程,可為常溫過程或利用超臨界流體的過程。 The solvent removal step is a process of removing the solvent in the nanostructure without collapsing the gel structure or minimizing the collapse, and may be a normal temperature process or a process using a supercritical fluid.

具體而言,溶劑去除步驟可更包括清洗過程,於在常溫下進行清洗的情形時,清洗可依序進行1次清洗、2次清洗及3次清洗,1次清洗應用包括蒸餾水的1次清洗液,2次清洗應用包括丙酮的2次清洗液,3次清洗應用包括選自由丙醇、丁醇及其組合所組成的族群中的醇的3次清洗液。此種清洗為如下過程:去除殘留於凝膠化基材的多餘的離子,交換存在於凝膠化基材中的溶劑。 Specifically, the solvent removing step may further include a cleaning process. In the case of cleaning at normal temperature, the cleaning may be sequentially performed 1 cleaning, 2 cleanings, and 3 cleanings, and 1 cleaning application includes 1 cleaning of distilled water Liquid, the secondary cleaning application includes a secondary cleaning solution of acetone, and the third cleaning application includes a three cleaning solution of an alcohol selected from the group consisting of propanol, butanol, and combinations thereof. This cleaning is a process of removing excess ions remaining on the gelled substrate and exchanging the solvent present in the gelled substrate.

溶劑去除步驟更包括重組過程,重組可藉由如下方法進行:將以1:0.1至1:1的重量比包括有機溶劑與矽烷化合物的重組溶液應用於經清洗的凝膠化基材。包括於重組溶液的有機溶劑可應用選自由己烷、甲苯、二甲苯及其組合所組成的族群中的任一種,矽烷化合物可應用選自由三甲基氯矽烷(TMCS)、六甲基二矽氮烷(HMDS)、二甲基氯矽烷(DMCS)、甲基三氯矽烷(MTCS)及其組合所組成的族群中的任一種。具體而言,重組溶液可包括己烷及三甲基氯矽烷。 The solvent removal step further includes a recombination process. The recombination can be performed by applying a recombination solution including an organic solvent and a silane compound in a weight ratio of 1: 0.1 to 1: 1 to the cleaned gelled substrate. As the organic solvent included in the reconstituted solution, any one selected from the group consisting of hexane, toluene, xylene, and a combination thereof can be applied, and the silane compound can be applied selected from the group consisting of trimethylchlorosilane (TMCS) and hexamethyldisila Any of the groups consisting of azamethane (HMDS), dimethylchlorosilane (DMCS), methyltrichlorosilane (MTCS), and combinations thereof. Specifically, the recombination solution may include hexane and trimethylchlorosilane.

重組溶液能夠以1:0.1至1:1的重量比、1:0.1至1:0.5的重量比、1:0.2至1:0.4的重量比包括有機溶劑與矽烷化合物。於以此種含量連同有機溶劑一併應用矽烷化合物的情形時,既可充分地重組,亦可減少藥品的浪費。 The recombination solution can include an organic solvent and a silane compound in a weight ratio of 1: 0.1 to 1: 1, a weight ratio of 1: 0.1 to 1: 0.5, and a weight ratio of 1: 0.2 to 1: 0.4. When a silane compound is used together with an organic solvent at such a content, it is possible to fully recombine and reduce waste of medicines.

溶劑去除步驟為去除凝膠化基材中的溶劑的過程(乾燥過程),可應用於凝膠化基材、經過清洗過程的凝膠化基材、或經過重組步驟的凝膠化基材。溶劑去除步驟可應用常壓乾燥、超臨界乾燥來進行,或者交替地應用常壓乾燥與超臨界乾燥來進行。 The solvent removing step is a process (drying process) of removing the solvent from the gelled substrate, and can be applied to the gelled substrate, the gelled substrate after the cleaning process, or the gelled substrate after the recombination step. The solvent removal step can be performed by normal pressure drying, supercritical drying, or alternately by normal pressure drying and supercritical drying.

常壓乾燥可於5℃至350℃下進行60分鐘至600分鐘,或於20℃至250℃下進行60分鐘至240分鐘。超臨界乾燥可將二氧化碳用作超臨界流體而於約40℃至150℃的溫度條件及75bar至800bar的壓力條件下執行。 Drying under normal pressure may be performed at 5 ° C to 350 ° C for 60 minutes to 600 minutes, or at 20 ° C to 250 ° C for 60 minutes to 240 minutes. Supercritical drying can be performed using carbon dioxide as a supercritical fluid under temperature conditions of about 40 ° C to 150 ° C and pressure conditions of 75 bar to 800 bar.

於以常壓乾燥方式進行乾燥的情形時,具體而言,溶劑去除步驟的乾燥可於利用己烷清洗經重組的凝膠化基材後,在5℃至350℃的空氣環境中乾燥60分鐘至600分鐘。 In the case of drying in a normal pressure drying method, specifically, in the solvent removal step, the reconstituted gelled substrate may be washed with hexane, and then dried in an air environment at 5 ° C to 350 ° C for 60 minutes. To 600 minutes.

以此方式製備的氣凝膠組成物的利用純水(pure water) 測定的接觸角可為95度至170度、110度至160度,其可為接觸角為110度至130度的具有優異的疏水性者。 Utilization of pure water of aerogel composition prepared in this way The measured contact angle may be 95 degrees to 170 degrees, 110 degrees to 160 degrees, and it may be one having excellent hydrophobicity with a contact angle of 110 degrees to 130 degrees.

本發明的又一實施例的板狀氣凝膠組成物的製備方法包括:含浸步驟,於在基材支持裝置的具有流體透過性的板狀下端部上收容板狀基材後,以具有流體透過性的上端部固定基材支持裝置的上端而供給溶膠溶液,以製備位於基材收容部內且含浸有溶膠溶液的板狀基材,即含浸基材,基材支持裝置包括2個以上的基材收容部及具有流體透過性的分離部,2個以上的基材收容部為如下空間,即,呈具有x方向長度、y方向長度及z方向長度的板狀(plate type),z方向長度值大於x方向長度值或y方向長度值,具有流體透過性的分離部於空間上區分彼此相鄰的基材收容部;老化步驟,誘導含浸基材中所含有的溶膠溶液凝膠化及熟化而製備凝膠化基材;裝置移動步驟,將基材支持裝置移動至溶劑去除裝置,基材支持裝置包括位於基材收容部內的凝膠化基材,且包括彼此結合的分離部、上端部及下端部;及溶劑去除步驟,於溶劑去除裝置中去除凝膠化基材中所包括的溶劑而製備氣凝膠組成物。 A method for preparing a plate-shaped aerogel composition according to still another embodiment of the present invention includes an impregnation step of accommodating a plate-shaped substrate on a plate-shaped lower end portion of a substrate-supporting device having a fluid permeability, so as to have a fluid. The permeable upper end portion fixes the upper end of the substrate support device and supplies a sol solution to prepare a plate-shaped substrate located in the substrate receiving portion and impregnated with the sol solution, that is, an impregnated substrate. The substrate support device includes two or more substrates. Material storage section and fluid-permeable separation section, and the two or more substrate storage sections are spaces that have a plate type having a length in the x direction, a length in the y direction, and a length in the z direction, and a length in the z direction The value is greater than the length value in the x direction or the length value in the y direction. The fluid-permeable separating portion spatially distinguishes adjacent substrate storage portions. The aging step induces gelation and aging of the sol solution contained in the impregnated substrate. And preparing the gelled substrate; the device moving step moves the substrate support device to the solvent removal device, and the substrate support device includes the gelled substrates located in the substrate containing section and includes each other Separating bonded portion, upper portion and lower portion; and a solvent removal step, the solvent was removed gelation device included in the base composition was prepared in the airgel the solvent removed.

對上述基材、基材收容部及基材支持裝置等的說明與上述內容重複,因此,省略其詳細說明,上述內容包括於上述板狀氣凝膠組成物的製備方法的說明中。 The description of the above-mentioned substrate, the substrate storage portion, the substrate support device, and the like are the same as those described above. Therefore, detailed descriptions thereof are omitted, and the above-mentioned contents are included in the description of the method for preparing the plate-shaped aerogel composition.

與上述含浸步驟、老化步驟、溶劑去除步驟及各步驟中所包括的構成要素相關的具體說明與於上述板狀氣凝膠組成物的製備方法中進行說明的內容重複,因此,省略說明,其包括於上述板狀氣凝膠組成物的製備方法的說明中。 Specific descriptions regarding the impregnation step, the aging step, the solvent removal step, and the constituent elements included in each step are the same as those described in the method for preparing the above-mentioned plate-shaped aerogel composition. Therefore, the description is omitted, and Included in the description of the method for preparing the plate-like aerogel composition.

裝置移動步驟為將基材支持裝置自腔室移動至溶劑去除裝置的過程。於如上所述般應用裝置移動步驟而製備板狀氣凝膠組成物的情形時,基材支持裝置的分離部等在製備氣凝膠組成物的過程中持續地固定支持各步驟的基材,因此,可能會發生的氣凝膠的奈米構造的損傷最小化,而可製備氣凝膠組成物。另外,分別應用進行含浸過程的腔室及溶劑去除裝置等兩種反應器,因此,與於一個腔室內進行所有步驟的情形相比,溶膠溶液的回收、或者進行清洗或重組的情形時的清洗溶液或重組溶液的回收較為容易,假設藉由連續製程製備氣凝膠組成物時,可進一步提高製備效率。 The device moving step is a process of moving the substrate supporting device from the chamber to the solvent removing device. When the plate-shaped aerogel composition is prepared by applying the device moving step as described above, the separation part of the substrate supporting device and the like continuously fix the substrate supporting each step during the process of preparing the aerogel composition. Therefore, damage to the nanostructure of the aerogel that may occur is minimized, and an aerogel composition can be prepared. In addition, two types of reactors, such as a chamber for carrying out the impregnation process and a solvent removing device, are used. Therefore, compared with the case where all the steps are performed in one chamber, the sol solution is recovered, or the case where cleaning or recombination is performed The recovery of the solution or the reconstituted solution is relatively easy, and it is assumed that when the aerogel composition is prepared by a continuous process, the preparation efficiency can be further improved.

以上,詳細地對本發明的較佳實施例進行了說明,但本發明的申請專利範圍並不限定於此,業者利用下述發明申請專利範圍中所定義的本發明的基本概念進行的各種變形及改良形態亦屬於本發明的申請專利範圍內。 As mentioned above, the preferred embodiments of the present invention have been described in detail, but the scope of patent application of the present invention is not limited to this. The industry uses various modifications and basic concepts of the present invention as defined in the scope of the following patent application for invention. The improved form also falls within the scope of the patent application of the present invention.

Claims (20)

一種板狀氣凝膠組成物製備裝置,包括:i)基材支持裝置,包括第一基材收容部、第二基材收容部及分離部,藉由所述分離部分割空間,而於空間上區分收容2個以上的基材,所述第一基材收容部用以收容第一基材,呈具有x方向長度、y方向長度及z方向長度的板狀,z方向長度值大於x方向長度值或y方向長度值,所述第二基材收容部與所述第一基材收容部相鄰,於空間上與所述第一基材收容部區分且收容第二基材,所述分離部位於所述第一基材收容部與所述第二基材收容部之間而區分兩個空間,包括所述第一基材收容部與所述第二基材收容部的基材收容部的下端或上端開放;ii)腔室,於內部收容所述基材支持裝置;以及iii)溶液供給部,向所述基材收容部供給溶膠溶液或清洗溶液,其中所述z方向為自所述基材收容部的上端往所述基材收容部的下端延伸的方向,且所述x方向與所述y方向皆垂直於所述z方向,以及所述x方向垂直於所述y方向。A plate-shaped aerogel composition preparation device includes: i) a substrate supporting device, including a first substrate accommodating portion, a second substrate accommodating portion, and a separation portion; There are two or more substrates divided in the upper section. The first substrate accommodating part is used for accommodating the first substrate, and has a plate shape having a length in the x direction, a length in the y direction, and a length in the z direction. The length value in the z direction is greater than the x direction. A length value or a length value in the y direction, the second substrate receiving portion is adjacent to the first substrate receiving portion, is spatially distinguished from the first substrate receiving portion, and contains a second substrate, and The separation portion is located between the first substrate receiving portion and the second substrate receiving portion to distinguish two spaces, and includes a substrate receiving portion including the first substrate receiving portion and the second substrate receiving portion. The lower or upper end of the portion is open; ii) a chamber that houses the substrate support device therein; and iii) a solution supply portion that supplies a sol solution or a cleaning solution to the substrate accommodation portion, wherein the z-direction is from An upper end of the substrate receiving portion extends toward a lower end of the substrate receiving portion. Direction and the x direction and the y-direction are perpendicular to the z-direction, and the direction perpendicular to the x y direction. 如申請專利範圍第1項所述的板狀氣凝膠組成物製備裝置,其中所述分離部為壁形態,所述基材收容部的上端與下端開放。The plate-shaped aerogel composition preparation device according to item 1 of the scope of the patent application, wherein the separation portion is in the form of a wall, and the upper end and the lower end of the substrate receiving portion are open. 如申請專利範圍第1項所述的板狀氣凝膠組成物製備裝置,其中所述分離部為包括正面、左側面、背面及右側面的柱形態,所述基材收容部為四周由所述柱形態的所述分離部包圍的空間,所述基材收容部的上端與下端開放。The device for preparing a plate-shaped aerogel composition according to item 1 of the scope of patent application, wherein the separation portion is a column shape including a front surface, a left surface, a back surface, and a right surface, and the substrate storage portion is surrounded by all parts. In the space surrounded by the separation portion in the column shape, the upper end and the lower end of the substrate receiving portion are open. 如申請專利範圍第1項所述的板狀氣凝膠組成物製備裝置,其中所述分離部為間隔壁狀,阻隔流體於所述第一基材收容部與第二基材收容部之間沿x方向或y方向移動。The plate-shaped aerogel composition preparation device according to item 1 of the scope of the patent application, wherein the separation portion is a partition wall shape and blocks fluid between the first substrate receiving portion and the second substrate receiving portion. Move in the x or y direction. 如申請專利範圍第1項所述的板狀氣凝膠組成物製備裝置,其中所述分離部為網狀或具有多個開口,容許流體於所述第一基材收容部與所述第二基材收容部之間沿x方向或y方向移動。The plate-shaped aerogel composition preparation device according to item 1 of the scope of patent application, wherein the separation portion is mesh-shaped or has a plurality of openings, allowing fluid to flow between the first substrate receiving portion and the second The substrate accommodating portions move between the x direction and the y direction. 如申請專利範圍第1項所述的板狀氣凝膠組成物製備裝置,更包括對所述基材收容部進行減壓的減壓裝置。The device for preparing a plate-shaped aerogel composition according to item 1 of the scope of the patent application, further includes a decompression device for decompressing the substrate storage portion. 如申請專利範圍第2項或第3項所述的板狀氣凝膠組成物製備裝置,更包括位於所述基材支持裝置的下端而支持所述基材支持裝置的下端支持部,所述下端支持部容許流體於所述下端支持部的一面與所述基材收容部的下端之間沿z方向移動。The device for preparing a plate-shaped aerogel composition according to item 2 or item 3 of the scope of patent application, further comprising a lower end supporting portion located at a lower end of the substrate supporting device to support the substrate supporting device, said The lower end support portion allows a fluid to move in a z direction between one surface of the lower end support portion and a lower end of the substrate receiving portion. 如申請專利範圍第2項或第3項所述的板狀氣凝膠組成物製備裝置,其中所述基材收容部具有開放的上端,於所述基材支持裝置的上部更包括上端固定部。The plate-shaped aerogel composition preparation device according to item 2 or item 3 of the patent application scope, wherein the substrate receiving portion has an open upper end, and an upper end fixing portion is further included on an upper portion of the substrate supporting device. . 如申請專利範圍第8項所述的板狀氣凝膠組成物製備裝置,其中所述上端固定部更包括流體收容部,收容藉由所述溶液供給部供給的溶膠溶液或清洗溶液而使其移動至所述基材收容部。The plate-shaped aerogel composition preparation device according to item 8 of the scope of application for a patent, wherein the upper end fixing portion further includes a fluid containing portion for containing a sol solution or a cleaning solution supplied by the solution supply portion to make it Move to the said substrate storage part. 如申請專利範圍第1項所述的板狀氣凝膠組成物製備裝置,更包括回收供給於所述基材支持裝置的溶膠溶液或清洗溶液的溶液回收部。The apparatus for preparing a plate-shaped aerogel composition according to item 1 of the scope of the patent application, further includes a solution recovery unit for recovering the sol solution or the cleaning solution supplied to the substrate supporting device. 一種板狀氣凝膠組成物製備用基材支持裝置,藉由分離部分割空間,而於空間上區分收容2個以上的基材,包括:第一基材收容部,收容第一基材,呈具有x方向長度、y方向長度及z方向長度的板狀,z方向長度值大於x方向長度值或y方向長度值;第二基材收容部,與所述第一基材收容部相鄰,於空間上與所述第一基材收容部區分且收容第二基材;以及分離部,位於所述第一基材收容部與所述第二基材收容部之間而區分兩個空間,其中包括所述第一基材收容部與所述第二基材收容部的基材收容部的下端或上端開放,其中所述z方向為自所述基材收容部的上端往所述基材收容部的下端延伸的方向,且所述x方向與所述y方向皆垂直於所述z方向,以及所述x方向垂直於所述y方向。A substrate support device for preparing a plate-like aerogel composition, which divides a space by a separation portion, and divides and stores two or more substrates in space, including: a first substrate storage portion, which houses the first substrate, It has a plate shape having a length in the x direction, a length in the y direction, and a length in the z direction, and the length value in the z direction is greater than the length value in the x direction or the length in the y direction; a second substrate receiving portion is adjacent to the first substrate receiving portion Is spaced apart from the first substrate receiving portion and accommodates a second substrate in space; and a separation portion is located between the first substrate receiving portion and the second substrate receiving portion to distinguish two spaces. Wherein the lower or upper end of the substrate accommodating portion including the first substrate accommodating portion and the second substrate accommodating portion is open, and the z direction is from the upper end of the substrate accommodating portion to the base. The direction in which the lower end of the material receiving portion extends, and the x direction and the y direction are both perpendicular to the z direction, and the x direction is perpendicular to the y direction. 如申請專利範圍第11項所述的板狀氣凝膠組成物製備用基材支持裝置,其中所述分離部為壁形態,所述基材收容部的上端與下端開放。According to the substrate supporting device for preparing a plate-shaped aerogel composition according to item 11 of the scope of application for a patent, the separation portion is in the form of a wall, and an upper end and a lower end of the substrate receiving portion are open. 如申請專利範圍第11項所述的板狀氣凝膠組成物製備用基材支持裝置,其中所述分離部為包括正面、左側面、背面及右側面的柱形態,所述基材收容部為四周由所述柱形態的所述分離部包圍的空間,所述基材收容部的上端與下端開放。The substrate supporting device for preparing a plate-shaped aerogel composition according to item 11 of the scope of application for a patent, wherein the separation portion is a column shape including a front surface, a left surface, a back surface, and a right surface, and the substrate storage portion It is a space surrounded by the said separation part of the said column shape, The upper end and the lower end of the said base material accommodation part are open. 如申請專利範圍第11項所述的板狀氣凝膠組成物製備用基材支持裝置,更包括下端部,位於所述板狀氣凝膠組成物製備用基材支持裝置的下端而支持收容至所述基材收容部的基材,容許流體於z方向上移動。The substrate support device for preparing a plate-shaped aerogel composition according to item 11 of the scope of application for a patent, further comprising a lower end portion, which is located at a lower end of the substrate support device for preparing a plate-shaped aerogel composition and supports storage. The substrate to the substrate accommodating portion allows the fluid to move in the z direction. 如申請專利範圍第11項所述的板狀氣凝膠組成物製備用基材支持裝置,其中所述基材收容部具有開放的上端,所述板狀氣凝膠組成物製備用基材支持裝置更包括上端部,位於所述基材收容部的開放的上端上,容許流體於z方向上移動。The substrate supporting device for preparing a plate-like aerogel composition according to item 11 of the scope of application for a patent, wherein the substrate receiving portion has an open upper end, and the substrate-like support for preparing the plate-like aerogel composition The device further includes an upper end portion located on the open upper end of the substrate accommodating portion, allowing the fluid to move in the z direction. 一種板狀氣凝膠組成物的製備方法,包括:含浸步驟,向基材支持裝置供給溶膠溶液,以製備位於基材收容部內且含浸有所述溶膠溶液的板狀基材,所述板狀基材為含浸基材,所述基材支持裝置包括2個以上的所述基材收容部及分離部,且於所述所述基材收容部收容有所述板狀基材,2個以上的所述基材收容部為呈具有x方向長度、y方向長度及z方向長度的板狀,z方向長度值大於x方向長度值或y方向長度值,所述分離部於空間上區分彼此相鄰的所述基材收容部,其中所述z方向為自所述基材收容部的上端往所述基材收容部的下端延伸的方向,且所述x方向與所述y方向皆垂直於所述z方向,以及所述x方向垂直於所述y方向;老化步驟,誘導所述含浸基材中所含有的所述溶膠溶液凝膠化及熟化而製備凝膠化基材;裝置去除步驟,藉由所述基材收容部的開放的上端或下端而自所述凝膠化基材去除所述基材支持裝置;以及溶劑去除步驟,自所述凝膠化基材去除溶劑而製備氣凝膠組成物。A method for preparing a plate-shaped aerogel composition includes an impregnation step of supplying a sol solution to a substrate support device to prepare a plate-shaped substrate located in a substrate receiving portion and impregnated with the sol solution, the plate-shaped The substrate is an impregnated substrate, and the substrate supporting device includes two or more substrate receiving portions and separation portions, and the plate-like substrate is accommodated in the substrate receiving portion, and two or more substrates are accommodated. The substrate accommodating portion has a plate shape having an x-direction length, a y-direction length, and a z-direction length. The z-direction length value is greater than the x-direction length value or the y-direction length value. The separation portion spatially distinguishes each other from each other. In the adjacent substrate accommodating portion, the z direction is a direction extending from an upper end of the substrate accommodating portion to a lower end of the substrate accommodating portion, and the x direction and the y direction are perpendicular to each other. The z direction and the x direction are perpendicular to the y direction; an aging step, which induces gelation and aging of the sol solution contained in the impregnated substrate to prepare a gelled substrate; a device removal step Through the open upper part of the substrate receiving part Or from the lower end of the base support means for removing gelled said substrate; and a step of removing the solvent from the gel and airgel substrate removal of the solvent composition. 一種板狀氣凝膠組成物的製備方法,包括:含浸步驟,於在基材支持裝置的具有流體透過性的板狀的下端部上收容板狀基材後,以具有流體透過性的上端部固定所述基材支持裝置的上端而供給溶膠溶液,以製備位於基材收容部內且含浸有所述溶膠溶液的所述板狀基材,所述板狀基材為含浸基材,所述基材支持裝置包括2個以上的所述基材收容部及具有流體透過性的分離部,2個以上的所述基材收容部為呈具有x方向長度、y方向長度及z方向長度的板狀,z方向長度值大於x方向長度值或y方向長度值,具有流體透過性的所述分離部於空間上區分彼此相鄰的所述基材收容部,其中所述z方向為自所述基材收容部的上端往所述基材收容部的下端延伸的方向,且所述x方向與所述y方向皆垂直於所述z方向,以及所述x方向垂直於所述y方向;老化步驟,誘導所述含浸基材中所含有的所述溶膠溶液凝膠化及熟化而製備凝膠化基材;裝置移動步驟,將所述基材支持裝置移動至溶劑去除裝置,所述基材支持裝置包括位於所述基材收容部內的所述凝膠化基材,且包括彼此結合的所述分離部、所述上端部及所述下端部;以及溶劑去除步驟,於所述溶劑去除裝置中,自所述凝膠化基材去除溶劑而製備氣凝膠組成物。A method for preparing a plate-like aerogel composition includes an impregnation step of accommodating a plate-like substrate on a plate-like lower end portion of a substrate-supporting device having fluid permeability, and then using a fluid-permeable upper end portion. The upper end of the substrate supporting device is fixed to supply a sol solution to prepare the plate-shaped substrate that is located in the substrate containing portion and is impregnated with the sol solution. The plate-shaped substrate is an impregnated substrate. The material supporting device includes two or more of the substrate accommodating portion and a fluid-permeable separation portion. The two or more substrate accommodating portions are plate-shaped and have a length in the x direction, a length in the y direction, and a length in the z direction. , The z-direction length value is greater than the x-direction length value or the y-direction length value, and the separation portion having fluid permeability spatially distinguishes the substrate containing portions adjacent to each other, wherein the z direction is from the base A direction in which an upper end of the material receiving portion extends toward a lower end of the substrate receiving portion, and the x direction and the y direction are perpendicular to the z direction, and the x direction is perpendicular to the y direction; an aging step To induce the impregnated base The sol solution contained in the gel solution is gelled and aged to prepare a gelled substrate; a device moving step moves the substrate support device to a solvent removal device, and the substrate support device includes the substrate The gelled base material in the containing portion, and including the separation portion, the upper end portion, and the lower end portion combined with each other; and a solvent removing step, in the solvent removing device, from the gelation The solvent is removed from the substrate to prepare an aerogel composition. 如申請專利範圍第16項或第17項所述的板狀氣凝膠組成物的製備方法,其中所述老化步驟以藉由減壓裝置將所述基材收容部或所述基材支持裝置內的壓力減壓至300Torr以下的狀態進行。The method for preparing a plate-like aerogel composition according to item 16 or item 17 of the scope of patent application, wherein the aging step is to place the substrate receiving portion or the substrate supporting device by a pressure reducing device. The internal pressure was reduced to 300 Torr or less. 如申請專利範圍第16項或第17項所述的板狀氣凝膠組成物的製備方法,其中所述基材收容部於以所述x方向長度值或所述y方向長度值中更小的值為基準值時,所述z方向長度值具有所述基準值的5倍以上的值。The method for preparing a plate-shaped aerogel composition according to item 16 or item 17 of the scope of application for a patent, wherein the substrate accommodating portion is smaller in the x-direction length value or the y-direction length value. When the value of is a reference value, the z-direction length value has a value that is 5 times or more the reference value. 如申請專利範圍第16項或第17項所述的板狀氣凝膠組成物的製備方法,其中於所述含浸步驟中插入至所述基材收容部的基材,以所述基材的x方向長度與y方向長度中更小的值為基準值,與所述基材對應的所述基材收容部的x方向長度與y方向長度中更小的值為所述基準值的1.00倍至3.00倍。The method for preparing a plate-shaped aerogel composition according to item 16 or item 17 of the scope of application for a patent, wherein the substrate inserted into the substrate accommodating part in the impregnation step is based on the The smaller of the x-direction length and the y-direction length is a reference value, and the smaller of the x-direction length and the y-direction length of the substrate containing portion corresponding to the substrate is 1.00 times the reference value. To 3.00 times.
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