TWI673262B - Polycondensation resin and optical film formed from the resin - Google Patents

Polycondensation resin and optical film formed from the resin Download PDF

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TWI673262B
TWI673262B TW104106555A TW104106555A TWI673262B TW I673262 B TWI673262 B TW I673262B TW 104106555 A TW104106555 A TW 104106555A TW 104106555 A TW104106555 A TW 104106555A TW I673262 B TWI673262 B TW I673262B
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resin
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carbon atoms
fluorene
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TW201540702A (en
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並木慎悟
平見優一
上原久俊
林寬幸
高見芳惠
野上弘之
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日商三菱化學股份有限公司
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    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G64/00Macromolecular compounds obtained by reactions forming a carbonic ester link in the main chain of the macromolecule
    • C08G64/04Aromatic polycarbonates
    • C08G64/06Aromatic polycarbonates not containing aliphatic unsaturation
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G63/00Macromolecular compounds obtained by reactions forming a carboxylic ester link in the main chain of the macromolecule
    • C08G63/02Polyesters derived from hydroxycarboxylic acids or from polycarboxylic acids and polyhydroxy compounds
    • C08G63/12Polyesters derived from hydroxycarboxylic acids or from polycarboxylic acids and polyhydroxy compounds derived from polycarboxylic acids and polyhydroxy compounds
    • C08G63/16Dicarboxylic acids and dihydroxy compounds
    • C08G63/18Dicarboxylic acids and dihydroxy compounds the acids or hydroxy compounds containing carbocyclic rings
    • C08G63/181Acids containing aromatic rings
    • C08G63/185Acids containing aromatic rings containing two or more aromatic rings
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08JWORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J5/00Manufacture of articles or shaped materials containing macromolecular substances
    • C08J5/18Manufacture of films or sheets
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/04Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/04Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics
    • G02B1/041Lenses
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1335Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/13363Birefringent elements, e.g. for optical compensation
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00Optical elements other than lenses
    • G02B5/30Polarising elements
    • G02B5/3083Birefringent or phase retarding elements

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  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Optics & Photonics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Nonlinear Science (AREA)
  • Materials Engineering (AREA)
  • Mathematical Physics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Polarising Elements (AREA)
  • Polyesters Or Polycarbonates (AREA)
  • Manufacture Of Macromolecular Shaped Articles (AREA)

Abstract

本發明之目的在於提供一種光學物性、耐熱性、機械物性、熱穩定性等各種特性均衡良好而優異之樹脂、以及使用其所獲得之光學膜及相位差膜。本發明係關於一種樹脂,其特徵在於:其係具有包含芳香族結構之重複結構單元之聚縮合系樹脂,並且該重複結構單元中之芳香族結構之含量滿足下述式(I),具有結構單元。 An object of the present invention is to provide a resin that is well-balanced and excellent in various properties such as optical physical properties, heat resistance, mechanical physical properties, and thermal stability, and an optical film and a retardation film obtained by using the resin. The present invention relates to a resin characterized in that it is a polycondensation resin having a repeating structural unit including an aromatic structure, and the content of the aromatic structure in the repeating structural unit satisfies the following formula (I) and has a structure unit.

5≦A≦-22.5×B+38.3 (I) 5 ≦ A ≦ -22.5 × B + 38.3 (I)

其中,0.75≦B≦0.93 Among them, 0.75 ≦ B ≦ 0.93

A:構成樹脂之重複結構單元中之芳香族結構之含量[質量%] A: content of aromatic structure in the repeating structural unit constituting the resin [mass%]

B:由樹脂所製作之延伸膜於450nm下之相位差(R450)與於550nm下之相位差(R550)的比(R450/R550) B: The ratio (R450 / R550) of the retardation (R450) at 450nm to the retardation (R550) at 550nm of the stretched film made of resin

Description

聚縮合系樹脂及由該樹脂所成之光學膜 Polycondensation resin and optical film made of the same

本發明係關於一種光學物性或耐熱性、機械物性、熱穩定性等各種特性優異之樹脂、以及使用其所獲得之光學膜。 The present invention relates to a resin excellent in various properties such as optical physical properties or heat resistance, mechanical physical properties, and thermal stability, and an optical film obtained by using the resin.

本發明亦關於一種新穎之三茀二酯、含有其之寡聚茀二酯組合物、以及含有具有源自新穎三茀二酯之重複單元之聚合物的樹脂組合物、使用該樹脂組合物所獲得之延伸膜、圓偏光板及圖像顯示裝置。 The present invention also relates to a novel tertiary diester, an oligomeric oligomeric diester composition containing the same, and a resin composition containing a polymer having a repeating unit derived from the novel trimeric diester, and a resin composition using the same. The obtained stretched film, circular polarizing plate, and image display device.

本發明又關於一種新穎之寡聚茀、含有其之寡聚茀組合物、以及使用該寡聚茀所獲得之樹脂組合物。 The present invention also relates to a novel oligomeric fluorene, an oligomeric fluorene composition containing the same, and a resin composition obtained by using the oligomeric fluorene.

本發明又關於一種寡聚茀二酯、及使用其之樹脂組合物之製造方法。 The present invention also relates to a method for producing an oligomeric fluorene diester and a resin composition using the same.

近年來,光學透鏡、光學膜、光學記錄媒體等光學系統所使用之光學用透明樹脂之需求增大。其中,尤其是以液晶顯示器或有機EL顯示器為代表之薄型平板顯示器(FPD)顯著普及,於對比度或著色之改善、視角擴大、及外界光反射防止等使顯示品質提高之目的下開發出各種光學膜並加以利用。 In recent years, demand for optical transparent resins used in optical systems such as optical lenses, optical films, and optical recording media has increased. Among them, thin flat panel displays (FPDs) typified by liquid crystal displays or organic EL displays have become popular. Various optical systems have been developed for the purpose of improving display quality such as improvement in contrast or coloration, widening of viewing angles, and prevention of external light reflection. Film and use it.

於有機EL顯示器中,使用有用以防止外界光之反射之1/4波長板。為了抑制著色而使純淨之黑色顯示成為可能,對於1/4波長板所使用之相位差膜而言,要求寬頻帶之波長分散特性,即於可見區域之各波長下可獲得理想之相位差特性。 In organic EL displays, a quarter-wave plate is used to prevent reflection of external light. In order to suppress coloration and make pure black display possible, the retardation film used in a 1/4 wavelength plate requires a wide-band wavelength dispersion characteristic, that is, an ideal retardation characteristic can be obtained at each wavelength in the visible region. .

作為相當於上述相位差膜者,例如揭示有如下情況,即將雙折 射之波長分散不同之2種相位差膜以各自之遲相軸正交之方式進行積層,藉此獲得寬頻帶之相位差膜(專利文獻1)。又,亦揭示有藉由將1/2波長板與1/4波長板以各自之遲相軸成為某特定配置之方式進行積層而獲得上述寬頻帶之相位差膜的方法(專利文獻2)。進而,揭示有包含具有特定乙醯化度之乙酸纖維素的寬頻帶相位差膜(專利文獻3)、或包含含有在側鏈上具有茀環之雙酚結構之聚碳酸酯共聚物,且顯示出波長越短相位差變得越小之反波長色散性之相位差膜(專利文獻4)。 As the equivalent of the above-mentioned retardation film, for example, it is revealed that the following cases are about to be double-folded Two types of retardation films having different emission wavelength dispersions are laminated so that their respective late phase axes are orthogonal, thereby obtaining a wide-band retardation film (Patent Document 1). Also disclosed is a method of obtaining the above-mentioned wide-band retardation film by laminating the 1 / 2-wavelength plate and the 1 / 4-wavelength plate so that their respective late axes become a specific arrangement (Patent Document 2). Furthermore, a wide-band retardation film containing a cellulose acetate having a specific degree of acetylation (Patent Document 3) or a polycarbonate copolymer containing a bisphenol structure having a fluorene ring on a side chain is disclosed, and is shown. A retardation film having an inverse wavelength dispersion and a smaller retardation as the output wavelength becomes shorter (Patent Document 4).

近年來,報告有多種上述側鏈上具有茀環之樹脂,提出有運用源自茀環之光學特性或耐熱性等特徵,而可用於光學用途之材料(專利文獻5)。 In recent years, a variety of resins having a fluorene ring on the side chain have been reported, and materials that use optical characteristics or heat resistance derived from the fluorene ring have been proposed for use in optical applications (Patent Document 5).

該等樹脂中,常使用相對容易取得之單體,即9,9-雙[4-(2-羥基乙氧基)苯基]茀或9,9-雙(4-羥基-3-甲基苯基)茀(專利文獻6、7)。 Of these resins, relatively easy-to-obtain monomers are often used, namely 9,9-bis [4- (2-hydroxyethoxy) phenyl] fluorene or 9,9-bis (4-hydroxy-3-methyl) Phenyl) fluorene (Patent Documents 6 and 7).

進而,亦開發出具有新穎結構之樹脂。專利文獻8中揭示有於側鏈上具有茀環之二胺化合物,進而記載有使用其之聚醯亞胺樹脂之延伸膜。專利文獻9中揭示有使用於主鏈上不含芳香環之茀化合物的聚碳酸酯樹脂。專利文獻10中揭示有於同一分子內具有2個茀環之二羥基化合物或二酯化合物,進而記載有使用其之聚酯樹脂之延伸膜。 Furthermore, resins with novel structures have also been developed. Patent Document 8 discloses a diamine compound having a fluorene ring on a side chain, and further describes a stretched film of a polyimide resin using the same. Patent Document 9 discloses a polycarbonate resin used for a fluorene compound that does not contain an aromatic ring in the main chain. Patent Document 10 discloses a dihydroxy compound or diester compound having two fluorene rings in the same molecule, and further describes a stretched film of a polyester resin using the same.

於專利文獻11、12中揭示有如下情況:將聚碳酸酯樹脂中之具有茀環之重複單元之含量控制為特定範圍,藉此包含該聚碳酸酯樹脂之延伸膜顯示出波長越短,相位差變得越小之反波長色散性,因此作為相位差膜具有優異之性能。顯示出波長越短,相位差變得越小之所謂反波長色散性之相位差膜於可見區域之各波長下可獲得理想之相位差特性,作為圓偏光板對於圖像顯示裝置之外界光反射防止或視角修正等有用。 Patent Documents 11 and 12 disclose a case where the content of a repeating unit having a fluorene ring in a polycarbonate resin is controlled to a specific range, whereby the stretched film including the polycarbonate resin exhibits a shorter wavelength and a phase. As the difference becomes smaller, the inverse wavelength dispersion property is excellent as a retardation film. The shorter the wavelength, the smaller the retardation, the so-called inverse wavelength dispersion retardation film can obtain the ideal retardation characteristics at each wavelength in the visible region. Useful for prevention or perspective correction.

作為於側鏈上具有茀環之二羥基化合物,常使用專利文獻11或12 所記載之9,9-雙[4-(2-羥基乙氧基)苯基]茀或9,9-雙(4-羥基-3-甲基苯基)茀。專利文獻13中揭示有同一分子內具有2個茀環之二酯化合物,進而記載有使用其之聚酯樹脂。專利文獻10中揭示有同一分子內具有2個茀環之二羥基化合物或二酯化合物,進而記載有使用其之聚酯樹脂之延伸膜。 As a dihydroxy compound having a fluorene ring on the side chain, Patent Document 11 or 12 is often used The described 9,9-bis [4- (2-hydroxyethoxy) phenyl] fluorene or 9,9-bis (4-hydroxy-3-methylphenyl) fluorene. Patent Document 13 discloses a diester compound having two fluorene rings in the same molecule, and further describes a polyester resin using the same. Patent Document 10 discloses a dihydroxy compound or a diester compound having two fluorene rings in the same molecule, and further describes a stretched film of a polyester resin using the same.

已知尤其是使用具有2個茀環之二茀化合物之聚酯具備相對較高之玻璃轉移溫度與負雙折射性,因此可用於反射偏光板用途(專利文獻10)。進而,已知有併用末端之官能基不同之2種二茀化合物作為樹脂原料之情況。 It is known that a polyester using a difluorene compound having two fluorene rings has a relatively high glass transition temperature and negative birefringence, and therefore, it can be used for reflective polarizing plate applications (Patent Document 10). Furthermore, it is known to use two types of difluorene compounds having different functional groups at the ends as a resin raw material.

另一方面,於肽固相合成之胺基之保護基之用途中,已知有於末端僅具有1個反應性官能基之二茀化合物(專利文獻14、非專利文獻1)。 On the other hand, diamine compounds having only one reactive functional group at the terminal are known for the use of the protective group of the amine group synthesized by peptide solid phase (Patent Document 14, Non-Patent Document 1).

於專利文獻11、12中揭示有如下情況,即,將聚碳酸酯樹脂中之具有茀環之重複單元之含量控制為特定範圍,藉此包含該聚碳酸酯樹脂之延伸膜顯示出波長越短,相位差變得越小之反波長色散性,因此作為相位差膜具有優異之性能。顯示出波長越短,相位差變得越小之所謂反波長色散性之相位差膜於可見區域之各波長下可獲得理想之相位差特性,作為圓偏光板對於圖像顯示裝置之外界光反射防止或視角修正等有用。 Patent Documents 11 and 12 disclose a case where the content of a repeating unit having a fluorene ring in a polycarbonate resin is controlled to a specific range, whereby the stretched film including the polycarbonate resin exhibits a shorter wavelength. The smaller the retardation becomes, the lower the wavelength dispersion is, so it has excellent performance as a retardation film. The shorter the wavelength, the smaller the retardation, the so-called inverse wavelength dispersion retardation film can obtain the ideal retardation characteristics at each wavelength in the visible region. As a circular polarizer, it reflects the outer light of the image display device. Useful for prevention or perspective correction.

作為於側鏈上具有茀環之二羥基化合物,常使用專利文獻11或12所記載之9,9-雙(4-(2-羥基乙氧基)苯基)茀或9,9-雙(4-羥基-3-甲基苯基)茀。 As the dihydroxy compound having a fluorene ring on the side chain, 9,9-bis (4- (2-hydroxyethoxy) phenyl) fluorene or 9,9-bis ( 4-hydroxy-3-methylphenyl) fluorene.

另一方面,已知雖然並非反波長色散用途,但於使用特定之二酯化合物作為聚酯碳酸酯原料之情形時,就透光率之觀點而言,將該化合物所含有之氯之含量設為特定量以下(專利文獻15)。 On the other hand, it is known that although it is not used for inverse wavelength dispersion, when a specific diester compound is used as the raw material of polyester carbonate, from the viewpoint of light transmittance, the content of chlorine contained in the compound is set. It is equal to or less than a specific amount (Patent Document 15).

先前技術文獻 Prior art literature 專利文獻 Patent literature

專利文獻1:日本專利特開平5-27118號公報 Patent Document 1: Japanese Patent Laid-Open No. 5-27118

專利文獻2:日本專利特開平10-68816號公報 Patent Document 2: Japanese Patent Laid-Open No. 10-68816

專利文獻3:日本專利特開2000-137116號公報 Patent Document 3: Japanese Patent Laid-Open No. 2000-137116

專利文獻4:日本專利第3325560號公報 Patent Document 4: Japanese Patent No. 3325560

專利文獻5:日本專利特開平10-101786號公報 Patent Document 5: Japanese Patent Laid-Open No. 10-101786

專利文獻6:日本專利第5119250號公報 Patent Document 6: Japanese Patent No. 5119250

專利文獻7:日本專利第5204200號公報 Patent Document 7: Japanese Patent No. 5204200

專利文獻8:日本專利特開2008-112124號公報 Patent Document 8: Japanese Patent Laid-Open No. 2008-112124

專利文獻9:日本專利特開2008-222965號公報 Patent Document 9: Japanese Patent Laid-Open No. 2008-222965

專利文獻10:美國專利申請公開第2012/0170118號說明書 Patent Document 10: US Patent Application Publication No. 2012/0170118

專利文獻11:國際公開第2006/041190號 Patent Document 11: International Publication No. 2006/041190

專利文獻12:國際公開第2011/149073號 Patent Document 12: International Publication No. 2011/149073

專利文獻13:美國專利第3324084號公報 Patent Document 13: US Patent No. 3324084

專利文獻14:國際公開第1991/08190號 Patent Document 14: International Publication No. 1991/08190

專利文獻15:日本專利特開平2-20518號公報 Patent Document 15: Japanese Patent Laid-Open No. 2-20518

非專利文獻 Non-patent literature

非專利文獻1:Synthesis, 1992, 819. Non-Patent Document 1: Synthesis, 1992, 819.

FPD領域之發展矚目,對於相位差膜而言,要求其光學特性或品質、可靠性等進一步提高、或膜之進一步薄膜化。進而亦有材料之成本降低、或者製膜或延伸、積層等各步驟中之生產性之提高等要求。伴隨於此,要求相位差膜兼具各種特性。例如作為相位差膜所使用之材料,業界謀求如具有所需之波長色散性,並且兼具低光彈性係數、高耐熱性、熔融加工性、機械強度等各種特性,而且固有雙折射較 大,柔軟性或延伸性優異,藉由延伸可獲得較高之分子配向度的材料。 The development of the FPD field has attracted much attention. For retardation films, it is required to further improve the optical characteristics, quality, reliability, etc., or to further thin the film. Furthermore, there are also requirements for reducing the cost of materials or improving productivity in each step such as film formation, stretching, and lamination. With this, retardation films are required to have various characteristics. For example, as a material for retardation films, the industry seeks to have various characteristics such as low photoelastic coefficient, high heat resistance, melt processability, and mechanical strength if it has the required wavelength dispersion, and its inherent birefringence is relatively low. Large, excellent in flexibility or elongation. A material with a higher molecular alignment can be obtained by extension.

然而,關於如專利文獻1或專利文獻2般將相位差膜進行積層之方法,偏光板會變厚。又,存在如下問題,即,必須以遲相軸成為特定配置之方式將各相位差膜進行積層,導致偏光板之生產性或良率變差。專利文獻3或專利文獻4之相位差膜具有反波長色散性,而可以一片膜獲得寬頻帶之相位差特性,但專利文獻3之乙酸纖維素存在耐熱性不充分,又,因由吸濕引起之尺寸變化而產生圖像斑之問題。 However, regarding a method of laminating a retardation film like in Patent Document 1 or Patent Document 2, the polarizing plate becomes thick. In addition, there is a problem that the retardation films must be laminated so that the late phase becomes a specific arrangement, which results in deterioration in productivity or yield of the polarizing plate. The retardation film of Patent Document 3 or Patent Document 4 has inverse wavelength dispersion, and a film can obtain a wide-band retardation characteristic. However, the cellulose acetate of Patent Document 3 has insufficient heat resistance, and is caused by moisture absorption. The problem of image speckle caused by size change.

已知包含專利文獻4、6、7之具有茀環之聚碳酸酯樹脂之相位差膜作為顯示出反波長色散性之相位差膜或圖像顯示裝置之外界光反射防止用之圓偏光板有用。然而,本發明者等人進行研究,結果得知如下情況:關於使用9,9-雙(4-羥基-3-甲基苯基)茀之樹脂,因膜較脆,故而獲得較高之配向度之延伸較困難,關於使用9,9-雙[4-(2-羥基乙氧基)苯基]茀之樹脂,雖然延伸性相對優異,但光彈性係數略高,又,高溫下之可靠性較差。 It is known that a retardation film containing a polycarbonate resin having a fluorene ring of Patent Documents 4, 6, and 7 is useful as a retardation film exhibiting reverse wavelength dispersion or a circular polarizer for preventing external light reflection of an image display device. . However, the inventors carried out research, and as a result, they learned the following: Regarding resins using 9,9-bis (4-hydroxy-3-methylphenyl) fluorene, because the film is relatively brittle, a higher orientation is obtained. The degree of extension is difficult. Regarding resins using 9,9-bis [4- (2-hydroxyethoxy) phenyl] fluorene, although the extensibility is relatively excellent, the photoelastic coefficient is slightly higher, and it is reliable at high temperatures. Poor sex.

作為改良各種特性之方法,可考慮改變共聚合成分,或者調整比率之方法,但9,9-雙(4-羥基-3-甲基苯基)茀有耐熱性非常高,另一方面樹脂變脆之特性,從而難以一面保持適度之耐熱性,一面改善樹脂之柔軟性。又,於9,9-雙[4-(2-羥基乙氧基)苯基]茀之情形時,為了表現出所需之反波長色散性而必須含有50~70質量%左右之該等單體成分,從而藉由共聚合之分子設計之自由度較低,難以兼顧耐熱性或機械強度等特性與光學特性。 As a method for improving various characteristics, a method of changing a copolymerization component or adjusting a ratio may be considered. However, 9,9-bis (4-hydroxy-3-methylphenyl) fluorene has very high heat resistance, and on the other hand, the resin is changed. The brittle nature makes it difficult to maintain moderate heat resistance while improving the flexibility of the resin. In addition, in the case of 9,9-bis [4- (2-hydroxyethoxy) phenyl] fluorene, in order to exhibit the required reverse wavelength dispersion, it is necessary to contain about 50 to 70% by mass of these monomers. The body composition, and therefore the degree of freedom in the design of the copolymerized molecule is low, and it is difficult to take into account characteristics such as heat resistance or mechanical strength and optical characteristics.

又,使用專利文獻9所記載之含有茀環之二醇的聚碳酸酯樹脂於反波長色散性、光彈性係數、耐熱性等特性方面並不充分。關於專利文獻10所記載之聚酯,記載有如下情況:其負折射率各向異性,即延伸方向之折射率小於延伸直角方向之折射率。然而,作為相位差膜, 必須具有正折射率各向異性,而上述聚酯延伸膜並不滿足該必要條件。又,專利文獻10中亦無關於相位差之波長依存性之記載。 In addition, a polycarbonate resin using a fluorene-containing diol described in Patent Document 9 is not sufficient in terms of properties such as reverse wavelength dispersion, photoelastic coefficient, and heat resistance. Regarding the polyester described in Patent Document 10, it is described that the negative refractive index anisotropy, that is, the refractive index in the extending direction is smaller than the refractive index in the extending orthogonal direction. However, as a retardation film, It is necessary to have positive refractive index anisotropy, and the above-mentioned polyester stretched film does not satisfy the necessary condition. Further, there is no description of the wavelength dependency of the phase difference in Patent Document 10.

如上所述,先前之相位差膜難以平衡性良好地獲得反波長色散性、光學特性、耐熱性、機械強度等各種特性。為了澈底地改良相位差膜之特性,而謀求將各種特性之平衡性優異之新穎化合物用於原料。 As described above, it is difficult for the conventional retardation film to obtain various properties such as inverse wavelength dispersion, optical characteristics, heat resistance, and mechanical strength with good balance. In order to improve the characteristics of the retardation film, a novel compound having an excellent balance of various characteristics is used as a raw material.

本發明之第一目的在於解決上述課題,而提供一種光學物性或耐熱性、機械物性、熱穩定性等各種特性優異之樹脂、以及使用其所獲得之光學膜。 A first object of the present invention is to solve the above-mentioned problems, and to provide a resin excellent in various properties such as optical physical properties or heat resistance, mechanical physical properties, and thermal stability, and an optical film obtained by using the resin.

又,已知包含專利文獻11或12之具有茀環之聚碳酸酯樹脂的延伸膜作為顯示出反波長色散性之相位差膜或圖像顯示裝置之外界光反射防止用之圓偏光板有用。然而,本發明者等人進行研究,結果專利文獻11之使用9,9-雙(4-羥基-3-甲基苯基)茀之樹脂雖然具有較高之耐熱性,但為了表現出所需之反波長色散性而必須使具有茀環之重複單元之比例變高,容易成為較脆之膜,於柔軟性方面存在問題。另一方面,專利文獻12之使用9,9-雙[4-(2-羥基乙氧基)苯基]茀之樹脂雖然柔軟性優異,但為了表現出所需之反波長色散性而必須使具有茀環之重複單元之比例變高,難以兼顧耐熱性等各種物性與光學物性。因此,為了進一步改良樹脂之光學物性與耐熱性、柔軟性等各種物性,謀求將光學物性與機械強度等各種物性之平衡性優異之化合物用於原料。 Moreover, it is known that the stretched film containing the polycarbonate resin which has a fluorene ring of patent document 11 or 12 is useful as a retardation film which shows a reverse wavelength dispersion property, or a circularly polarizing plate for preventing external light reflection of an image display device. However, the present inventors conducted research, and as a result, the resin using 9,9-bis (4-hydroxy-3-methylphenyl) fluorene in Patent Document 11 has high heat resistance, but it is necessary to show In contrast to the inverse wavelength dispersion, it is necessary to increase the ratio of the repeating unit having a fluorene ring, easily become a brittle film, and there are problems in terms of flexibility. On the other hand, although the resin using 9,9-bis [4- (2-hydroxyethoxy) phenyl] fluorene in Patent Document 12 is excellent in flexibility, it is necessary to make it exhibit the required reverse wavelength dispersion property. The ratio of the repeating unit having a fluorene ring becomes high, and it is difficult to balance various physical properties such as heat resistance and optical physical properties. Therefore, in order to further improve various physical properties such as optical physical properties, heat resistance, and flexibility of the resin, a compound having excellent balance between various physical properties such as optical physical properties and mechanical strength is used as a raw material.

於專利文獻13及10中揭示有使用二茀化合物而獲得之聚酯,但其耐熱性因二茀結構而無法令人滿意。除此以外,於專利文獻13中無法用作膜且光學特性等亦不明,於專利文獻10中未進行作為相位差膜之研究,關於相位差之波長依存性亦不明。 Patent Documents 13 and 10 disclose polyesters obtained using difluorene compounds, but their heat resistance is not satisfactory due to the difluorene structure. In addition, it cannot be used as a film in Patent Document 13 and its optical characteristics and the like are not known. In Patent Document 10, no research has been conducted as a retardation film, and the wavelength dependency of the phase difference is also unknown.

本發明之第二目的在於提供一種新穎之茀化合物,其具有充分之耐熱性,且使用少量之該茀化合物製造樹脂組合物並進行膜成形時 顯示出優異之光學特性,藉此可提高樹脂設計之自由度。進而,提供一種使用新穎之茀化合物而獲得之樹脂組合物。 It is a second object of the present invention to provide a novel amidine compound which has sufficient heat resistance and uses a small amount of the amidine compound to produce a resin composition and perform film forming. It exhibits excellent optical characteristics, thereby improving the freedom of resin design. Furthermore, a resin composition obtained using a novel amidine compound is provided.

進而,作為如專利文獻10所記載般對樹脂賦予特定物性之方法,可列舉:將末端之反應性官能基不同之2種寡聚茀化合物併用之方法。然而,寡聚茀化合物之獲取困難,為了製造具有所需物性之樹脂而必須另外合成2種寡聚茀化合物作為原料,需要時間與成本,難言作為工業製品之實用性充分。 Further, as a method for imparting specific physical properties to a resin as described in Patent Document 10, a method of using two types of oligomeric fluorene compounds having different reactive functional groups at the terminals in combination can be cited. However, it is difficult to obtain an oligomeric fluorene compound. In order to produce a resin having desired physical properties, two kinds of oligomeric fluorene compounds must be synthesized as raw materials, which requires time and cost.

本發明者等人進行努力研究,結果發現,作為實用性較高,對樹脂賦予所需物性之方法,使用兩末端具有不同反應性官能基之寡聚茀化合物之方法有用。作為此種寡聚茀化合物之製造方法,可列舉如下方法:首先製造具有1個反應性官能基之寡聚茀化合物作為原料,繼而對上述寡聚茀化合物導入與上述反應性官能基不同之反應性官能基。 The present inventors conducted diligent research, and as a result, found that, as a method for imparting desired physical properties to a resin with high practicality, a method using an oligomeric fluorene compound having different reactive functional groups at both ends is useful. As a method for producing such an oligomeric fluorene compound, the following methods can be cited: first, an oligomeric fluorene compound having one reactive functional group is produced as a raw material, and then the oligomeric fluorene compound is introduced into a reaction different from the reactive functional group Sexual functional group.

作為具有1個反應性官能基之寡聚茀化合物之製造方法,例如已知有非專利文獻1所記載之方法,但該方法存在如下課題:由於難以選擇性地獲得具有1個反應性官能基之寡聚茀化合物,故而難以高效率地製造於兩末端具有不同反應性官能基之寡聚茀化合物。 As a method for producing an oligomeric fluorene compound having one reactive functional group, for example, a method described in Non-Patent Document 1 is known, but this method has the following problem: it is difficult to selectively obtain one reactive functional group Oligomeric fluorene compounds, it is difficult to efficiently produce oligomeric fluorene compounds having different reactive functional groups at both ends.

因此,本發明之第三目的在於提供一種選擇性地具有所需之反應性官能基而可適合用作光學用途之樹脂組合物之單體或單體原料的具有特定反應性官能基之寡聚茀化合物。 Therefore, a third object of the present invention is to provide an oligomer having a specific reactive functional group, which has a desired reactive functional group and can be suitably used as a monomer or monomer raw material of a resin composition for optical applications.茀 Compounds.

進而,本發明者等人對反波長色散用之樹脂組合物進行努力研究,結果發現,藉由使用特定之寡聚茀二酯化合物作為原料單體,即便樹脂中之含有比例較低,亦可高效率地表現出所需之光學特性,而可提高樹脂設計之自由度。 Furthermore, the present inventors have made intensive research on a resin composition for inverse wavelength dispersion, and as a result, they have found that by using a specific oligomeric fluorene diester compound as a raw material monomer, even if the content of the resin is low, The required optical characteristics are efficiently displayed, and the freedom of resin design can be improved.

通常,製造樹脂組合物時,為了將聚合速度或所獲得之樹脂組合物之物性設為特定者,必須嚴密地控制原料之量比。寡聚茀二酯化 合物通常為固體,為了用作樹脂組合物之原料而且控制其量比,較理想為使寡聚茀二酯化合物熔融而使用。本發明者等人進行努力研究,結果新發現如下情況:根據該化合物中所含有之金屬量,於經過熔融製程時該化合物會產生著色,而難以用作光學用途之樹脂組合物之單體。 In general, when manufacturing a resin composition, in order to set the polymerization rate or the physical properties of the obtained resin composition to a specific one, it is necessary to strictly control the amount ratio of the raw materials. Oligomeric diesterification The compound is usually a solid. In order to use the compound as a raw material for a resin composition and to control the amount thereof, it is preferable to use the oligomeric diester compound. The inventors conducted diligent research, and as a result, they found that the compound may be colored when subjected to a melting process according to the amount of metal contained in the compound, and it is difficult to use it as a monomer for a resin composition for optical applications.

另一方面,使用二酯化合物之聚酯碳酸酯樹脂之製造方法有各種,作為其一般方法,已知有藉由酯交換法而使二醇類、碳酸二芳酯及二酯類於熔融狀態下進行聚合之熔融聚縮合法。該方法存在如下問題:於使用碳酸二芳酯、與作為二酯類之二烷基酯之情形時,酯交換反應與聚碳酸酯聚合之反應速度存在較大差異,因此存在二烷基酯難以被導入至聚酯碳酸酯樹脂中之問題,從而較理想為使用二芳酯作為二酯類。又,作為製造兩末端具有芳基之寡聚茀二芳基化合物之方法,可列舉:將寡聚茀二酯化合物之兩末端取代為芳基之方法,但新發現如下情況:根據該寡聚茀二酯化合物中所含有之羧酸之量,所獲得之寡聚茀二芳基化合物中之金屬量變高,而於經過熔融製程時產生著色。 On the other hand, there are various methods for producing a polyester carbonate resin using a diester compound. As a general method thereof, it is known that a glycol, a diaryl carbonate, and a diester are melted by a transesterification method. Melt polymerization method. This method has the following problems: In the case of using a diaryl carbonate and a dialkyl ester as a diester, the transesterification reaction and the polymerization rate of the polycarbonate differ greatly, so it is difficult for the dialkyl ester to exist. Since it is introduced into polyester carbonate resin, it is more preferable to use a diaryl ester as the diester. In addition, as a method for producing an oligomeric fluorene diaryl compound having an aryl group at both ends, a method of substituting an aryl group at both ends of the oligomeric fluorene diester compound can be cited, but it has been newly found that according to the oligomerization The amount of carboxylic acid contained in the perylene diester compound, the metal content in the obtained oligomeric perylene diaryl compound becomes high, and coloration occurs during the melting process.

因此,本發明之第四目的在於提供一種寡聚茀二酯化合物,其係可適合用作光學用途之樹脂組合物之單體,且可提高樹脂設計之自由度者,且係可抑制於經過熔融製程時會產生之著色者。 Therefore, a fourth object of the present invention is to provide an oligomeric fluorene diester compound, which is suitable for use as a monomer of a resin composition for optical applications, and which can increase the freedom of resin design, and can suppress the The colorer will be produced during the melting process.

進而,本發明之目的在於提供一種寡聚茀二酯化合物,其可用作用以製造可抑制著色之寡聚茀二芳酯化合物之原料。 Furthermore, an object of the present invention is to provide an oligomeric fluorene diester compound which can be used as a raw material for producing an oligomeric fluorene diaryl ester compound capable of suppressing coloration.

本發明者等人鑒於上述第一目的而反覆進行努力研究,結果發現一種樹脂顯現優異之光學特性或機械物性,該樹脂之特徵在於:構成樹脂之重複結構單元中之芳香族結構之含量處於特定範圍,且顯現所需之波長色散性,從而完成本發明。即,本發明係以下述為主旨。 The present inventors have made diligent research in view of the above-mentioned first objective, and as a result, have found that a resin exhibits excellent optical characteristics or mechanical physical properties, and the resin is characterized in that the content of the aromatic structure in the repeating structural unit constituting the resin is at a specific level Range, and exhibit the required wavelength dispersion to complete the present invention. That is, this invention has the following summary.

[1-1] [1-1]

一種樹脂,其特徵在於:其係具有包含芳香族結構之重複結構單元之聚縮合系樹脂,且該重複結構單元中之芳香族結構之含量滿足下述式(I),且具有選自下述式(1)及式(2)所表示之結構單元中之至少1個結構單元。 A resin characterized in that it is a polycondensation resin having a repeating structural unit including an aromatic structure, and the content of the aromatic structure in the repeating structural unit satisfies the following formula (I), At least one structural unit among the structural units represented by Formula (1) and Formula (2).

5≦A≦-22.5×B+38.3 (I) 5 ≦ A ≦ -22.5 × B + 38.3 (I)

其中,0.75≦B≦0.93 Among them, 0.75 ≦ B ≦ 0.93

A:構成樹脂之重複結構單元中之芳香族結構之含量[質量%] A: content of aromatic structure in the repeating structural unit constituting the resin [mass%]

B:由樹脂所製作之延伸膜於450nm下之相位差(R450)與於550nm下之相位差(R550)的比(R450/R550) B: The ratio (R450 / R550) of the retardation (R450) at 450nm to the retardation (R550) at 550nm of the stretched film made of resin

(式(1)及(2)中,R1~R3分別獨立為直接鍵、或可具有取代基之碳數1~4之伸烷基。 (In the formulae (1) and (2), R 1 to R 3 are each independently a direct bond or an alkylene group having 1 to 4 carbon atoms which may have a substituent.)

R4~R9分別獨立為氫原子、可具有取代基之碳數1~10之烷基、可具有取代基之碳數4~10之芳基、可具有取代基之碳數1~10之醯基、可具有取代基之碳數1~10之醯氧基、可具有取代基之碳數1~10之烷氧基、可具有取代基之碳數1~10之芳氧基、可具有取代基之胺 基、可具有取代基之碳數1~10之乙烯基、可具有取代基之碳數1~10之乙炔基、具有取代基之硫原子、具有取代基之矽原子、鹵素原子、硝基、或氰基。其中,R4~R9中鄰接之至少2個基亦可相互鍵結而形成環)。 R 4 to R 9 are each independently a hydrogen atom, an alkyl group having 1 to 10 carbons that may have a substituent, an aryl group having 4 to 10 carbons that may have a substituent, and 1 to 10 carbons that may have a substituent Fluorenyl group, fluorenyloxy group having 1 to 10 carbon atoms which may have a substituent, alkoxyl group having 1 to 10 carbon atoms which may have a substituent, aryloxy group having 1 to 10 carbon atoms which may have a substituent, may have Substituent amino group, vinyl group having 1 to 10 carbon atoms which may have a substituent, ethynyl group having 1 to 10 carbon atoms which may have a substituent, sulfur atom having a substituent, silicon atom having a substituent, halogen atom , Nitro, or cyano. Among them, at least two adjacent groups in R 4 to R 9 may be bonded to each other to form a ring).

[1-2] [1-2]

一種樹脂,其特徵在於:其係具有包含芳香族結構之重複結構單元之聚縮合系樹脂,且該重複結構單元中之芳香族結構之含量滿足下述式(III),且該樹脂之玻璃轉移溫度為110℃以上且160℃以下。 A resin characterized in that it is a polycondensation resin having a repeating structural unit including an aromatic structure, and the content of the aromatic structure in the repeating structural unit satisfies the following formula (III), and the glass transition of the resin is The temperature is 110 ° C or higher and 160 ° C or lower.

5≦A≦-22.5×B+34.8 (III) 5 ≦ A ≦ -22.5 × B + 34.8 (III)

其中,0.75≦B≦0.93 Among them, 0.75 ≦ B ≦ 0.93

A:構成樹脂之重複結構單元中之芳香族結構之含量[質量%] A: content of aromatic structure in the repeating structural unit constituting the resin [mass%]

B:由樹脂所製作之延伸膜於450nm下之相位差(R450)與於550nm下之相位差(R550)的比(R450/R550) B: The ratio (R450 / R550) of the retardation (R450) at 450nm to the retardation (R550) at 550nm of the stretched film made of resin

[1-3] [1-3]

如[1-1]或[1-2]記載之樹脂,其鈉d線(589nm)下之折射率為1.49~1.56。 The resin described in [1-1] or [1-2] has a refractive index in the sodium d-line (589 nm) of 1.49 to 1.56.

[1-4] [1-4]

如[1-1]至[1-3]中任一項記載之樹脂,其儲存彈性模數為1GPa以上且2.7GPa以下。 The resin according to any one of [1-1] to [1-3], having a storage elastic modulus of 1 GPa or more and 2.7 GPa or less.

[1-5] [1-5]

如[1-1]至[1-4]中任一項記載之樹脂,其於測定溫度240℃、剪切速度91.2sec-1下之熔融黏度為700Pa‧s以上且5000Pa‧s以下。 The resin according to any one of [1-1] to [1-4], whose melt viscosity at a measurement temperature of 240 ° C. and a shear rate of 91.2 sec -1 is 700 Pa · s to 5000 Pa · s.

[1-6] [1-6]

如[1-1]至[1-5]中任一項記載之樹脂,其中上述樹脂係選自由聚碳酸酯、聚酯、聚酯碳酸酯所組成之群中之至少1種樹脂。 The resin according to any one of [1-1] to [1-5], wherein the resin is at least one resin selected from the group consisting of polycarbonate, polyester, and polyester carbonate.

[1-7] [1-7]

如[1-1]至[1-6]中任一項記載之樹脂,其中上述重複結構單元所包含之芳香族結構僅為茀。 The resin according to any one of [1-1] to [1-6], wherein the aromatic structure included in the repeating structural unit is only fluorene.

[1-8] [1-8]

如[1-1]至[1-7]中任一項記載之樹脂,其含有下述式(3)所表示之結構單元。 The resin according to any one of [1-1] to [1-7], which contains a structural unit represented by the following formula (3).

[1-9] [1-9]

一種透明膜,其含有如[1-1]至[1-8]中任一項記載之樹脂。 A transparent film containing the resin as described in any one of [1-1] to [1-8].

[1-10] [1-10]

一種相位差膜,其係藉由將如[1-9]記載之透明膜向至少一個方向進行延伸而獲得。 A retardation film is obtained by extending a transparent film as described in [1-9] in at least one direction.

[1-11] [1-11]

如[1-10]記載之相位差膜,其包含單一層,且膜厚為10μm以上且60μm以下。 The retardation film according to [1-10], which includes a single layer and has a film thickness of 10 μm or more and 60 μm or less.

本發明者等人鑒於上述第二目的而反覆進行努力研究,結果發現,特定之三茀二酯化合物具有充分之耐熱性,且使用少量之該三茀二酯化合物製造樹脂組合物並進行膜成形時顯現優異之光學特性,從而完成本發明。 The inventors of the present invention have conducted diligent research in view of the above-mentioned second object, and as a result, they have found that a specific trimer diester compound has sufficient heat resistance, and a resin composition is produced using a small amount of the trimer diester compound and a film is formed. The present invention achieves excellent optical characteristics from time to time.

即,本發明係以下述為主旨。 That is, this invention has the following summary.

[2-1] [2-1]

一種三茀二酯,其特徵在於:包含可具有取代基之3個茀單元a,且 該茀單元a之9位之碳原子彼此直接鍵結、或者經由可具有取代基之伸烷基、可具有取代基之伸芳基、或可具有取代基之伸芳烷基而鏈狀地鍵結。 A trifluorene diester, which comprises three fluorene units a which may have a substituent, and The carbon atoms at position 9 of the fluorene unit a are directly bonded to each other, or are chain-bonded via an alkylene group which may have a substituent, an alkylene group which may have a substituent, or an alkylene group which may have a substituent. Knot.

[2-2] [2-2]

如[2-1]記載之三茀二酯,其由下述通式(1)表示。 The tertiary diester described in [2-1] is represented by the following general formula (1).

(式中,R1及R2分別獨立為直接鍵、或可具有取代基之碳數1~4之伸烷基。 (In the formula, R 1 and R 2 are each independently a direct bond or an alkylene group having 1 to 4 carbon atoms which may have a substituent.

R3a及R3b分別獨立為可經取代之碳數1~10之伸烷基、可經取代之碳數4~10之伸芳基、或可經取代之碳數6~10之伸芳烷基。 R 3a and R 3b are each independently an alkylene group having 1 to 10 carbon atoms which can be substituted, an alkylene group having 4 to 10 carbon atoms which can be substituted, or an alkylene group having 6 to 10 carbon atoms which can be substituted base.

R4~R9分別獨立為氫原子、可具有取代基之碳數1~10之烷基、可具有取代基之碳數4~10之芳基、可具有取代基之碳數1~10之醯基、可具有取代基之碳數1~10之醯氧基、可具有取代基之碳數1~10之烷氧基、可具有取代基之碳數1~10之芳氧基、可具有取代基之胺基、可具有取代基之碳數1~10之乙烯基、可具有取代基之碳數1~10之乙炔基、具有取代基之硫原子、具有取代基之矽原子、鹵素原子、硝基、或氰基。其中,R4~R9中鄰接之至少2個基亦可相互鍵結而形成環)。 R 4 to R 9 are each independently a hydrogen atom, an alkyl group having 1 to 10 carbons that may have a substituent, an aryl group having 4 to 10 carbons that may have a substituent, and 1 to 10 carbons that may have a substituent Fluorenyl group, fluorenyloxy group having 1 to 10 carbon atoms which may have a substituent, alkoxyl group having 1 to 10 carbon atoms which may have a substituent, aryloxy group having 1 to 10 carbon atoms which may have a substituent, may have Substituent amino group, vinyl group having 1 to 10 carbon atoms which may have a substituent, ethynyl group having 1 to 10 carbon atoms which may have a substituent, sulfur atom having a substituent, silicon atom having a substituent, halogen atom , Nitro, or cyano. Among them, at least two adjacent groups in R 4 to R 9 may be bonded to each other to form a ring).

R10為碳數1~10之有機取代基)。 R 10 is an organic substituent having 1 to 10 carbon atoms).

[2-3] [2-3]

如[2-2]記載之三茀二酯,其中上述通式(1)中之R10為可經取代之 碳數4~10之芳基。 The tertiary diester described in [2-2], wherein R 10 in the general formula (1) is an aryl group having 4 to 10 carbon atoms which may be substituted.

[2-4] [2-4]

一種寡聚茀二酯組合物,其特徵在於:其係包含如[2-1]至[2-3]中任一項記載之三茀二酯、與二茀二酯者,且上述二茀二酯包含可具有取代基之2個茀單元b,該茀單元b之9位之碳原子彼此直接鍵結、或者經由可具有取代基之伸烷基、可具有取代基之伸芳基、或可具有取代基之伸芳烷基而鏈狀地鍵結。 An oligomeric fluorene diester composition, characterized in that the oligomeric fluorene diester composition comprises the tertiary diester described in any one of [2-1] to [2-3], and a difluorene diester; The diester contains two fluorene units b which may have a substituent, and the carbon atoms at the 9-position of the fluorene unit b are directly bonded to each other, or via an alkylene group which may have a substituent, an arylene group which may have a substituent, or The aralkyl group which may have a substituent is bonded in a chain.

[2-5] [2-5]

如[2-4]記載之寡聚茀二酯組合物,其中上述二茀二酯由下述通式(2)表示。 The oligomeric fluorene diester composition according to [2-4], wherein the difluorene diester is represented by the following general formula (2).

(式中,R1~R3分別獨立為直接鍵、或可具有取代基之碳數1~4之伸烷基。 (In the formula, R 1 to R 3 are each independently a direct bond or an alkylene group having 1 to 4 carbon atoms which may have a substituent.

R4~R9分別獨立為氫原子、可具有取代基之碳數1~10之烷基、可具有取代基之碳數4~10之芳基、可具有取代基之碳數1~10之醯基、可具有取代基之碳數1~10之醯氧基、可具有取代基之碳數1~10之烷氧基、可具有取代基之碳數1~10之芳氧基、可具有取代基之胺基、可具有取代基之碳數1~10之乙烯基、可具有取代基之碳數1~10之乙炔基、具有取代基之硫原子、具有取代基之矽原子、鹵素原子、硝基、或氰基。其中,R4~R9中鄰接之至少2個基亦可相互鍵結而形 成環)。 R 4 to R 9 are each independently a hydrogen atom, an alkyl group having 1 to 10 carbons that may have a substituent, an aryl group having 4 to 10 carbons that may have a substituent, and 1 to 10 carbons that may have a substituent Fluorenyl group, fluorenyloxy group having 1 to 10 carbon atoms which may have a substituent, alkoxyl group having 1 to 10 carbon atoms which may have a substituent, aryloxy group having 1 to 10 carbon atoms which may have a substituent, may have Substituent amino group, vinyl group having 1 to 10 carbon atoms which may have a substituent, ethynyl group having 1 to 10 carbon atoms which may have a substituent, sulfur atom having a substituent, silicon atom having a substituent, halogen atom , Nitro, or cyano. Among them, at least two adjacent groups in R 4 to R 9 may be bonded to each other to form a ring).

R10為碳數1~10之有機取代基)。 R 10 is an organic substituent having 1 to 10 carbon atoms).

[2-6] [2-6]

如[2-4]或[2-5]記載之寡聚茀二芳酯組合物,其中上述三茀二酯相對於組合物之總質量之含有比例為1質量%以上。 The oligomeric fluorene diaryl ester composition according to [2-4] or [2-5], wherein the content ratio of the above-mentioned trifluorene diester to the total mass of the composition is 1% by mass or more.

[2-7] [2-7]

一種樹脂組合物,其特徵在於:其係由具有2價之三茀作為重複單元之聚合物所成或含有該聚合物者,且上述2價之三茀包含可具有取代基之3個茀單元a,該茀單元a之9位之碳原子彼此直接鍵結、或者經由可具有取代基之伸烷基、可具有取代基之伸芳基、或可具有取代基之伸芳烷基而鏈狀地鍵結。 A resin composition, characterized in that it is made of or contains a polymer having a divalent trifluorene as a repeating unit, and the divalent trifluorene includes three trifluorene units which may have a substituent. a, the carbon atoms at position 9 of the fluorene unit a are directly bonded to each other, or are chain-like via an alkylene group which may have a substituent, an alkylene group which may have a substituent, or an alkylene group which may have a substituent Ground bond.

[2-8] [2-8]

如[2-7]記載之樹脂組合物,其中上述2價之三茀由下述通式(11)表示。 The resin composition according to [2-7], in which the divalent tris (3) is represented by the following general formula (11).

(式中,R1及R2分別獨立為直接鍵、或可具有取代基之碳數1~4之伸烷基。 (In the formula, R 1 and R 2 are each independently a direct bond or an alkylene group having 1 to 4 carbon atoms which may have a substituent.

R3a及R3b分別獨立為可經取代之碳數1~10之伸烷基、可經取代之碳數4~10之伸芳基、或可經取代之碳數6~10之伸芳烷基。 R 3a and R 3b are each independently an alkylene group having 1 to 10 carbon atoms which can be substituted, an alkylene group having 4 to 10 carbon atoms which can be substituted, or an alkylene group having 6 to 10 carbon atoms which can be substituted base.

R4~R9分別獨立為氫原子、可具有取代基之碳數1~10之烷基、可具有取代基之碳數4~10之芳基、可具有取代基之碳數1~10之醯 基、可具有取代基之碳數1~10之醯氧基、可具有取代基之碳數1~10之烷氧基、可具有取代基之碳數1~10之芳氧基、可具有取代基之胺基、可具有取代基之碳數1~10之乙烯基、可具有取代基之碳數1~10之乙炔基、具有取代基之硫原子、具有取代基之矽原子、鹵素原子、硝基、或氰基。其中,R4~R9中鄰接之至少2個基亦可相互鍵結而形成環)。 R 4 to R 9 are each independently a hydrogen atom, an alkyl group having 1 to 10 carbons that may have a substituent, an aryl group having 4 to 10 carbons that may have a substituent, and 1 to 10 carbons that may have a substituent Fluorenyl group, fluorenyloxy group having 1 to 10 carbon atoms which may have a substituent, alkoxyl group having 1 to 10 carbon atoms which may have a substituent, aryloxy group having 1 to 10 carbon atoms which may have a substituent, may have Substituent amino group, vinyl group having 1 to 10 carbon atoms which may have a substituent, ethynyl group having 1 to 10 carbon atoms which may have a substituent, sulfur atom having a substituent, silicon atom having a substituent, halogen atom , Nitro, or cyano. Among them, at least two adjacent groups in R 4 to R 9 may be bonded to each other to form a ring).

[2-9] [2-9]

如[2-7]或[2-8]記載之樹脂組合物,其進而具有2價之二茀作為重複單元,且上述2價之二茀包含可具有取代基之2個茀單元b,該茀單元b之9位之碳原子彼此直接鍵結、或者經由可具有取代基之伸烷基、可具有取代基之伸芳基、或可具有取代基之伸芳烷基而鏈狀地鍵結。 The resin composition according to [2-7] or [2-8], which further has a bivalent difluorene as a repeating unit, and the divalent bifluorene includes two fluorene units b which may have a substituent. The carbon atoms at position 9 of the fluorene unit b are directly bonded to each other, or are chain-bonded via an alkylene group which may have a substituent, an alkylene group which may have a substituent, or an alkylene group which may have a substituent. .

[2-10] [2-10]

如[2-7]至[2-9]中任一項記載之樹脂組合物,其於波長450nm下所測得之相位差(Re450)與於波長550nm下所測得之相位差(Re550)的比滿足下述式(20)。 The resin composition according to any one of [2-7] to [2-9], which has a phase difference (Re450) measured at a wavelength of 450nm and a phase difference (Re550) measured at a wavelength of 550nm The ratio satisfies the following formula (20).

Re450/Re550≦1.0 (20) Re450 / Re550 ≦ 1.0 (20)

[2-11] [2-11]

一種成形體,其特徵在於:其係將如[2-7]至[2-10]中任一項記載之樹脂組合物進行成形而獲得。 A formed article obtained by forming the resin composition according to any one of [2-7] to [2-10].

[2-12] [2-12]

一種光學構件,其特徵在於:其係由如[2-7]至[2-10]中任一項記載之樹脂組合物所成。 An optical member, which is made of the resin composition according to any one of [2-7] to [2-10].

[2-13] [2-13]

一種膜,其特徵在於:其係由如[2-7]至[2-10]中任一項記載之樹脂組合物所成。 A film comprising the resin composition according to any one of [2-7] to [2-10].

[2-14] [2-14]

一種延伸膜,其特徵在於:其係將如[2-13]記載之膜沿至少1個方向進行延伸而獲得。 An extended film characterized by being obtained by extending the film according to [2-13] in at least one direction.

[2-15] [2-15]

一種1/4λ板,其特徵在於:其係由如[2-14]記載之延伸膜所成。 A 1 / 4λ plate, characterized in that it is made of an stretched film as described in [2-14].

[2-16] [2-16]

一種圓偏光板,其特徵在於:具有如[2-15]記載之1/4λ板。 A circular polarizing plate is characterized by having a 1 / 4λ plate as described in [2-15].

[2-17] [2-17]

一種圖像顯示裝置,其特徵在於:包括如[2-16]記載之圓偏光板。 An image display device, comprising the circular polarizing plate as described in [2-16].

本發明者等人鑒於上述第三目的而反覆進行努力研究,結果發現,以具有特定之反應性官能基之烯烴化合物替換兩末端為氫之寡聚茀化合物,藉此可高選擇率且高效率地獲得所需之寡聚茀化合物,進而該寡聚茀化合物作為光學用途之樹脂組合物之單體或單體原料適合,從而完成本發明。 The inventors of the present invention have conducted diligent research in view of the above-mentioned third objective, and as a result, have found that the oligomeric fluorene compound having hydrogen at both ends thereof can be replaced with an olefin compound having a specific reactive functional group, thereby achieving high selectivity and high efficiency. To obtain the desired oligomeric fluorene compound, the oligomeric fluorene compound is suitable as a monomer or a monomer raw material of a resin composition for optical use, thereby completing the present invention.

即,本發明係以下述為主旨。 That is, this invention has the following summary.

[3-1] [3-1]

一種寡聚茀,其特徵在於:其係包含可具有取代基之2個以上之茀單元a之9位的碳原子彼此經由可具有取代基之伸烷基、可具有取代基之伸芳基、或可具有取代基之伸芳烷基而鏈狀地鍵結而成之寡聚茀結構單元(以下,稱為「寡聚茀結構單元a」)者,且於該寡聚茀結構單元a中之任一末端之茀單元a之9位的碳原子具有下述式(A)所表示之反應性官能基,另一末端之茀單元a之9位之碳原子具有氫原子。 An oligomeric fluorene is characterized in that it includes carbon atoms at the 9-position of two or more fluorene units a which may have a substituent, via an alkylene group which may have a substituent, an arylene group which may have a substituent, Or an oligomeric fluorene structural unit (hereinafter, referred to as "oligomeric fluorene structural unit a") which may be chain-bonded by an aralkyl group having a substituent, and the oligomeric fluorene structural unit a The carbon atom at the 9th position of the fluorene unit a at either end has a reactive functional group represented by the following formula (A), and the carbon atom at the 9th position of the fluorene unit a at the other end has a hydrogen atom.

[化6] [Chemical 6]

(式中,Ra~Rc分別獨立為氫原子、可經取代之碳數1~10之烷基、可經取代之碳數4~10之芳基或可經取代之碳數6~10之芳烷基,X為酯基、醯胺基、羧基、氰基、或硝基。*為與茀單元a之9位之碳原子之鍵結鍵)。 (In the formula, R a to R c are each independently a hydrogen atom, an alkyl group having 1 to 10 carbon atoms that can be substituted, an aryl group having 4 to 10 carbon atoms that can be substituted, or 6 to 10 carbon atoms that can be substituted. The aralkyl group, X is an ester group, amidino group, a carboxyl group, a cyano group, or a nitro group. * Is a bond with the carbon atom at the 9-position of the a unit of a fluorene).

[3-2] [3-2]

如[3-1]記載之寡聚茀,其由下述通式(1)表示。 The oligomeric fluorene as described in [3-1] is represented by the following general formula (1).

(式中,R3分別獨立為直接鍵、或可具有取代基之碳數1~4之伸烷基。 (In the formula, R 3 is each independently a direct bond or an alkylene group having 1 to 4 carbon atoms which may have a substituent.

R4~R9分別獨立為氫原子、可具有取代基之碳數1~10之烷基、可具有取代基之碳數4~10之芳基、可具有取代基之碳數1~10之醯基、可具有取代基之碳數1~10之醯氧基、可具有取代基之碳數1~10之烷氧基、可具有取代基之碳數1~10之芳氧基、可具有取代基之胺基、可具有取代基之碳數1~10之乙烯基、可具有取代基之碳數1~10之乙炔基、具有取代基之硫原子、具有取代基之矽原子、鹵素原子、硝基、或氰基。其中,R4~R9中鄰接之至少2個基亦可相互鍵結而形成環。 R 4 to R 9 are each independently a hydrogen atom, an alkyl group having 1 to 10 carbons that may have a substituent, an aryl group having 4 to 10 carbons that may have a substituent, and 1 to 10 carbons that may have a substituent Fluorenyl group, fluorenyloxy group having 1 to 10 carbon atoms which may have a substituent, alkoxyl group having 1 to 10 carbon atoms which may have a substituent, aryloxy group having 1 to 10 carbon atoms which may have a substituent, may have Substituent amino group, vinyl group having 1 to 10 carbon atoms which may have a substituent, ethynyl group having 1 to 10 carbon atoms which may have a substituent, sulfur atom having a substituent, silicon atom having a substituent, halogen atom , Nitro, or cyano. Among them, at least two adjacent groups in R 4 to R 9 may be bonded to each other to form a ring.

Ra~Rc分別獨立為氫原子、可經取代之碳數1~10之烷基、可經取代之碳數4~10之芳基或可經取代之碳數6~10之芳烷基。 R a to R c are each independently a hydrogen atom, an alkyl group having 1 to 10 carbon atoms which can be substituted, an aryl group having 4 to 10 carbon atoms which can be substituted or an aralkyl group having 6 to 10 carbon atoms which can be substituted .

X為酯基、醯胺基、羧基、氰基、或硝基。 X is an ester group, amidino group, a carboxyl group, a cyano group, or a nitro group.

n表示1~5之整數值)。 n represents an integer value of 1 to 5).

[3-3] [3-3]

一種寡聚茀,其特徵在於:其係包含可具有取代基之2個以上之茀單元a之9位的碳原子彼此經由可具有取代基之伸烷基、可具有取代基之伸芳基、或可具有取代基之伸芳烷基而鏈狀地鍵結而成之寡聚茀結構單元a者,且於該寡聚茀結構單元a中之任一末端之茀單元a之9位的碳原子具有下述式(A)所表示之反應性官能基,於另一末端之茀單元a之9位之碳原子具有與該反應性官能基不同之反應性官能基。 An oligomeric fluorene is characterized in that it includes carbon atoms at the 9-position of two or more fluorene units a which may have a substituent, via an alkylene group which may have a substituent, an arylene group which may have a substituent, Or an oligomeric fluorene structural unit a which may be chain-bonded by an aralkyl group having a substituent, and the carbon at the 9th position of the fluorene unit a at any terminal in the oligomeric fluorene structural unit a The atom has a reactive functional group represented by the following formula (A), and the carbon atom at the 9-position of the fluorene unit a at the other end has a reactive functional group different from the reactive functional group.

(式中,Ra~Rc分別獨立為氫原子、可經取代之碳數1~10之烷基、可經取代之碳數4~10之芳基或可經取代之碳數6~10之芳烷基,X為酯基、醯胺基、羧基、氰基、或硝基。*為與茀單元之9位之碳原子之鍵結鍵)。 (In the formula, R a to R c are each independently a hydrogen atom, an alkyl group having 1 to 10 carbon atoms that can be substituted, an aryl group having 4 to 10 carbon atoms that can be substituted, or 6 to 10 carbon atoms that can be substituted. The aralkyl group, X is an ester group, amidino group, a carboxyl group, a cyano group, or a nitro group. * Is a bond with the carbon atom at the 9-position of the fluorene unit).

[3-4] [3-4]

如[3-3]記載之寡聚茀,其由下述通式(2)表示。 The oligomeric fluorene as described in [3-3] is represented by the following general formula (2).

(式中,R3分別獨立為直接鍵、或可具有取代基之碳數1~4之伸烷基。 (In the formula, R 3 is each independently a direct bond or an alkylene group having 1 to 4 carbon atoms which may have a substituent.

R4~R9分別獨立為氫原子、可具有取代基之碳數1~10之烷基、可具有取代基之碳數4~10之芳基、可具有取代基之碳數1~10之醯 基、可具有取代基之碳數1~10之醯氧基、可具有取代基之碳數1~10之烷氧基、可具有取代基之碳數1~10之芳氧基、可具有取代基之胺基、可具有取代基之碳數1~10之乙烯基、可具有取代基之碳數1~10之乙炔基、具有取代基之硫原子、具有取代基之矽原子、鹵素原子、硝基、或氰基。其中,R4~R9中鄰接之至少2個基亦可相互鍵結而形成環。 R 4 to R 9 are each independently a hydrogen atom, an alkyl group having 1 to 10 carbons that may have a substituent, an aryl group having 4 to 10 carbons that may have a substituent, and 1 to 10 carbons that may have a substituent Fluorenyl group, fluorenyloxy group having 1 to 10 carbon atoms which may have a substituent, alkoxyl group having 1 to 10 carbon atoms which may have a substituent, aryloxy group having 1 to 10 carbon atoms which may have a substituent, may have Substituent amino group, vinyl group having 1 to 10 carbon atoms which may have a substituent, ethynyl group having 1 to 10 carbon atoms which may have a substituent, sulfur atom having a substituent, silicon atom having a substituent, halogen atom , Nitro, or cyano. Among them, at least two adjacent groups in R 4 to R 9 may be bonded to each other to form a ring.

R10為直接鍵、可經取代之碳數1~10之伸烷基、可經取代之碳數4~10之伸芳基、或可經取代之碳數6~10之伸芳烷基、或選自由可經取代之碳數1~10之伸烷基、可經取代之碳數4~10之伸芳基及可經取代之碳數6~10之伸芳烷基所組成之群中之2個以上之基由氧原子、可經取代之硫原子、可經取代之氮原子或羰基連結而成之基。 R 10 is a direct bond, an alkylene group having 1 to 10 carbon atoms that can be substituted, an alkylene group having 4 to 10 carbon atoms that can be substituted, or an alkylene group having 6 to 10 carbon atoms that can be substituted, Or selected from the group consisting of an alkylene group having 1 to 10 carbon atoms that can be substituted, an alkylene group having 4 to 10 carbon atoms that can be substituted, and an alkylene group having 6 to 10 carbon atoms that can be substituted Two or more radicals are a radical formed by bonding an oxygen atom, a sulfur atom that may be substituted, a nitrogen atom that may be substituted, or a carbonyl group.

Ra~Rc分別獨立為氫原子、可經取代之碳數1~10之烷基、可經取代之碳數4~10之芳基或可經取代之碳數6~10之芳烷基,X為酯基、醯胺基、羧基、氰基、或硝基,A為羥基、胺基、酯基、醯胺基、羧基、氰基、或硝基。 R a to R c are each independently a hydrogen atom, an alkyl group having 1 to 10 carbon atoms which can be substituted, an aryl group having 4 to 10 carbon atoms which can be substituted or an aralkyl group having 6 to 10 carbon atoms which can be substituted X is an ester group, amidino group, a carboxyl group, a cyano group, or a nitro group, and A is a hydroxyl group, an amine group, an ester group, a fluorenyl group, a carboxyl group, a cyano group, or a nitro group.

n表示1~5之整數值)。 n represents an integer value of 1 to 5).

[3-5] [3-5]

一種寡聚茀組合物,其特徵在於:其係包含如[3-1]至[3-4]中任一項記載之寡聚茀(以下,稱為「寡聚茀A」)、與具有與該寡聚茀A不同之化學結構之寡聚茀(以下,稱為「寡聚茀B」)者,且上述寡聚茀B包含可具有取代基之2個以上之茀單元b之9位的碳原子彼此經由可具有取代基之伸烷基、可具有取代基之伸芳基、或可具有取代基之伸芳烷基而鏈狀地鍵結而成之寡聚茀結構單元(以下,稱為「寡聚茀結構單元b」),於該寡聚茀結構單元b中之兩末端之茀單元b之9位的碳原子具有 下述式(B)所表示之相同之反應性官能基。 An oligomeric fluorene composition comprising the oligomeric fluorene (hereinafter referred to as "oligomeric fluorene A") as described in any one of [3-1] to [3-4], and having An oligomeric fluorene (hereinafter, referred to as "oligomeric fluorene B") having a chemical structure different from the oligomeric fluorene A, and the oligomeric fluorene B includes 9 positions of two or more fluorene units b which may have a substituent. Oligomeric fluorene structural units in which the carbon atoms are chain-bonded via an alkylene group which may have a substituent, an alkylene group which may have a substituent, or an alkylene group which may have a substituent (hereinafter, (Referred to as "oligomeric fluorene structure unit b"), the carbon atom at the 9-position of the fluorene unit b at both ends of the oligomeric fluorene structure unit b has The same reactive functional group represented by the following formula (B).

(式中,Rd~Rf分別獨立為氫原子、可經取代之碳數1~10之烷基、可經取代之碳數4~10之芳基或可經取代之碳數6~10之芳烷基,X1為酯基、醯胺基、羧基、氰基、或硝基。*為與茀單元b之9位之碳原子之鍵結鍵)。 (In the formula, Rd to Rf are each independently a hydrogen atom, an alkyl group having 1 to 10 carbon atoms that can be substituted, an aryl group having 4 to 10 carbon atoms that can be substituted, or 6 to 10 carbon atoms that can be substituted For an aralkyl group, X 1 is an ester group, amidino group, a carboxyl group, a cyano group, or a nitro group. * Is a bond with the carbon atom at the 9th position of the fluorene unit b).

[3-6] [3-6]

一種樹脂組合物,其特徵在於:其係由如[3-1]至[3-4]中任一項記載之寡聚茀之聚合物或如[3-5]記載之寡聚茀組合物之聚合物所成,或包含該聚合物。 A resin composition characterized in that it is composed of the polymer of oligomeric fluorene as described in any one of [3-1] to [3-4] or the oligomeric fluorene of [3-5] Made of, or containing, polymers.

[3-7] [3-7]

一種膜,其係由如[3-6]所記載之樹脂組合物所成。 A film made of the resin composition as described in [3-6].

[3-8] [3-8]

一種延伸膜,其係將如[3-7]記載之膜沿至少1個方向進行延伸而獲得。 A stretched film obtained by stretching the film according to [3-7] in at least one direction.

[3-9] [3-9]

一種圖像顯示裝置,其具有如[3-8]記載之延伸膜。 An image display device having the stretch film according to [3-8].

[3-10] [3-10]

一種寡聚茀之製造方法,其特徵在於:於鹼存在下,使下述式(3)所表示之寡聚茀、與下述式(4)所表示之具有吸電子性基之烯烴進行反應而獲得下述式(1)所表示之寡聚茀。 A method for producing oligomeric fluorene, comprising reacting an oligomeric fluorene represented by the following formula (3) with an olefin having an electron-withdrawing group represented by the following formula (4) in the presence of a base. Then, an oligomeric fluorene represented by the following formula (1) was obtained.

[化11] [Chemical 11]

(式中,R3分別獨立為直接鍵、或可具有取代基之碳數1~4之伸烷基。 (In the formula, R 3 is each independently a direct bond or an alkylene group having 1 to 4 carbon atoms which may have a substituent.

R4~R9分別獨立為氫原子、可具有取代基之碳數1~10之烷基、可具有取代基之碳數4~10之芳基、可具有取代基之碳數1~10之醯基、可具有取代基之碳數1~10之醯氧基、可具有取代基之碳數1~10之烷氧基、可具有取代基之碳數1~10之芳氧基、可具有取代基之胺基、可具有取代基之碳數1~10之乙烯基、可具有取代基之炭素1~10之乙炔基、具有取代基之硫原子、具有取代基之矽原子、鹵素原子、硝基、或氰基。其中,R4~R9中鄰接之至少2個基亦可相互鍵結而形成環。 R 4 to R 9 are each independently a hydrogen atom, an alkyl group having 1 to 10 carbons that may have a substituent, an aryl group having 4 to 10 carbons that may have a substituent, and 1 to 10 carbons that may have a substituent Fluorenyl group, fluorenyloxy group having 1 to 10 carbon atoms which may have a substituent, alkoxyl group having 1 to 10 carbon atoms which may have a substituent, aryloxy group having 1 to 10 carbon atoms which may have a substituent, may have Amino groups of substituents, vinyl groups having 1 to 10 carbon atoms which may have substituents, ethynyl groups of carbon 1 to 10 which may have substituents, sulfur atoms having substituents, silicon atoms having substituents, halogen atoms, Nitro, or cyano. Among them, at least two adjacent groups in R 4 to R 9 may be bonded to each other to form a ring.

Ra~Rc分別獨立為氫原子、可經取代之碳數1~10之烷基、可經取代之碳數4~10之芳基或可經取代之碳數6~10之芳烷基,X為酯基、醯胺基、羧基、氰基、或硝基。 R a to R c are each independently a hydrogen atom, an alkyl group having 1 to 10 carbon atoms which can be substituted, an aryl group having 4 to 10 carbon atoms which can be substituted or an aralkyl group having 6 to 10 carbon atoms which can be substituted X is an ester group, amidino group, a carboxyl group, a cyano group, or a nitro group.

n表示1~5之整數值)。 n represents an integer value of 1 to 5).

[3-11] [3-11]

一種寡聚茀之製造方法,其特徵在於:使[3-10]之方法中所獲得之上述式(1)所表示之寡聚茀、與具有親電子性之化合物進行反應而獲得下述式(2)所表示之寡聚茀。 A method for producing an oligomeric fluorene, which comprises reacting the oligomeric fluorene represented by the above formula (1) obtained in the method [3-10] with an electrophilic compound to obtain the following formula (2) An oligomeric puppet.

[化12] [Chemical 12]

(式中,R3分別獨立為直接鍵、或可具有取代基之碳數1~4之伸烷基。 (In the formula, R 3 is each independently a direct bond or an alkylene group having 1 to 4 carbon atoms which may have a substituent.

R4~R9分別獨立為氫原子、可具有取代基之碳數1~10之烷基、可具有取代基之碳數4~10之芳基、可具有取代基之碳數1~10之醯基、可具有取代基之碳數1~10之醯氧基、可具有取代基之碳數1~10之烷氧基、可具有取代基之碳數1~10之芳氧基、可具有取代基之胺基、可具有取代基之碳數1~10之乙烯基、可具有取代基之碳數1~10之乙炔基、具有取代基之硫原子、具有取代基之矽原子、鹵素原子、硝基、或氰基。其中,R4~R9中鄰接之至少2個基亦可相互鍵結而形成環。 R 4 to R 9 are each independently a hydrogen atom, an alkyl group having 1 to 10 carbons that may have a substituent, an aryl group having 4 to 10 carbons that may have a substituent, and 1 to 10 carbons that may have a substituent Fluorenyl group, fluorenyloxy group having 1 to 10 carbon atoms which may have a substituent, alkoxyl group having 1 to 10 carbon atoms which may have a substituent, aryloxy group having 1 to 10 carbon atoms which may have a substituent, may have Substituent amino group, vinyl group having 1 to 10 carbon atoms which may have a substituent, ethynyl group having 1 to 10 carbon atoms which may have a substituent, sulfur atom having a substituent, silicon atom having a substituent, halogen atom , Nitro, or cyano. Among them, at least two adjacent groups in R 4 to R 9 may be bonded to each other to form a ring.

R10為直接鍵、可經取代之碳數1~10之伸烷基、可經取代之碳數4~10之伸芳基、或可經取代之碳數6~10之伸芳烷基、或選自由可經取代之碳數1~10之伸烷基、可經取代之碳數4~10之伸芳基及可經取代之碳數6~10之伸芳烷基所組成之群中之2個以上之基由氧原子、可經取代之硫原子、可經取代之氮原子或羰基連結而成之基,Ra~Rc分別獨立為氫原子、可經取代之碳數1~10之烷基、可經取代之碳數4~10之芳基或可經取代之碳數6~10之芳烷基,X為酯基、醯胺基、羧基、氰基、或硝基,A為羥基、胺基、酯基、醯胺基、羧基、氰基、或硝基。 R 10 is a direct bond, an alkylene group having 1 to 10 carbon atoms that can be substituted, an alkylene group having 4 to 10 carbon atoms that can be substituted, or an alkylene group having 6 to 10 carbon atoms that can be substituted, Or selected from the group consisting of an alkylene group having 1 to 10 carbon atoms that can be substituted, an alkylene group having 4 to 10 carbon atoms that can be substituted, and an alkylene group having 6 to 10 carbon atoms that can be substituted Two or more radicals are formed by an oxygen atom, a sulfur atom that may be substituted, a nitrogen atom that may be substituted, or a carbonyl group. Ra to R c are each independently a hydrogen atom, and the number of carbons that may be substituted is 1 to An alkyl group of 10, an aryl group of 4 to 10 carbons which may be substituted or an arylalkyl group of 6 to 10 carbons which may be substituted, X is an ester group, amidino group, a carboxyl group, a cyano group, or a nitro group, A is a hydroxyl group, an amine group, an ester group, a sulfonylamino group, a carboxyl group, a cyano group, or a nitro group.

n表示1~5之整數值)。 n represents an integer value of 1 to 5).

本發明者等人鑒於上述第四目的而反覆進行努力研究,結果發現,可藉由將寡聚茀二酯化合物所含有之金屬成分之含有比例設為特 定範圍,而提高熔融狀態下之穩定性,而抑制著色。 The present inventors have conducted diligent research in view of the above-mentioned fourth objective, and as a result, have found that the content ratio of the metal component contained in the oligomeric fluorene diester compound can be specifically adjusted. A certain range to improve the stability in the molten state and suppress coloration.

進而發現,藉由使用將羧酸之含有比例設為特定範圍之寡聚茀二酯化合物作為用以製造可抑制著色之寡聚茀二芳酯化合物的原料,而可減少所獲得之二芳酯化合物中所含有之金屬成分之含有比例。 Further, it was found that by using an oligomeric fluorene diester compound having a carboxylic acid content ratio in a specific range as a raw material for producing an oligomeric fluorene diaryl ester compound capable of suppressing coloration, the obtained diaryl ester can be reduced. The content ratio of the metal component contained in the compound.

即,本發明係以下述為主旨。 That is, this invention has the following summary.

[4-1] [4-1]

一種寡聚茀二酯,其特徵在於:其係包含可具有取代基之2個以上茀單元者,且該茀單元之9位之碳原子彼此直接鍵結、或者經由可具有取代基之伸烷基、可具有取代基之伸芳基、或可具有取代基之伸芳烷基而鏈狀地鍵結,且金屬之含有比例為500質量ppm以下。 An oligomeric fluorene diester, characterized in that it comprises two or more fluorene units which may have a substituent, and the carbon atoms at the 9-position of the fluorene unit are directly bonded to each other, or via an alkylene which may have a substituent. Group, an arylene group which may have a substituent, or an aralkyl group which may have a substituent are bonded in a chain, and the content ratio of the metal is 500 mass ppm or less.

[4-2] [4-2]

如[4-1]記載之寡聚茀二酯,其中上述金屬為選自由長週期型週期表第1族、第2族、第12族、第14族、及過渡金屬所組成之群中之至少1種金屬。 The oligomeric fluorene diester as described in [4-1], wherein the metal is selected from the group consisting of long-period periodic table Group 1, Group 2, Group 12, Group 14, and transition metals At least 1 metal.

[4-3] [4-3]

如[4-1]或[4-2]記載之寡聚茀二酯,其由下述通式(1)表示。 The oligomeric fluorene diester according to [4-1] or [4-2], which is represented by the following general formula (1).

(式中,R1~R3分別獨立為直接鍵、或可具有取代基之碳數1~4之伸烷基。 (In the formula, R 1 to R 3 are each independently a direct bond or an alkylene group having 1 to 4 carbon atoms which may have a substituent.

R4~R9分別獨立為氫原子、可具有取代基之碳數1~10之烷基、 可具有取代基之碳數4~10之芳基、可具有取代基之碳數1~10之醯基、可具有取代基之碳數1~10之醯氧基、可具有取代基之碳數1~10之烷氧基、可具有取代基之碳數1~10之芳氧基、可具有取代基之胺基、可具有取代基之碳數1~10之乙烯基、可具有取代基之碳數1~10之乙炔基、具有取代基之硫原子、取代基矽原子、鹵素原子、硝基、或氰基。其中,R4~R9中鄰接之至少2個基亦可相互鍵結而形成環。 R 4 to R 9 are each independently a hydrogen atom, an alkyl group having 1 to 10 carbons that may have a substituent, an aryl group having 4 to 10 carbons that may have a substituent, and 1 to 10 carbons that may have a substituent Fluorenyl group, fluorenyloxy group having 1 to 10 carbon atoms which may have a substituent, alkoxyl group having 1 to 10 carbon atoms which may have a substituent, aryloxy group having 1 to 10 carbon atoms which may have a substituent, may have Substituent amino group, vinyl group having 1 to 10 carbon atoms which may have a substituent, ethynyl group having 1 to 10 carbon atoms which may have a substituent, sulfur atom having a substituent, a substituent shoulder A silicon atom, a halogen atom, a nitro group, or a cyano group. Among them, at least two adjacent groups in R 4 to R 9 may be bonded to each other to form a ring.

R10為碳數1~10之有機取代基。 R 10 is an organic substituent having 1 to 10 carbon atoms.

n表示1~5之整數值)。 n represents an integer value of 1 to 5).

[4-4] [4-4]

如[4-3]記載之寡聚茀二酯,其中上述通式(1)中之R10為碳數4~10之芳基。 The oligomeric fluorene diester according to [4-3], wherein R 10 in the general formula (1) is an aryl group having 4 to 10 carbon atoms.

[4-5] [4-5]

一種寡聚茀二酯,其特徵在於:其係包含可具有取代基之2個以上之茀單元者,且上述茀單元之9位之碳原子彼此直接鍵結、或者經由可具有取代基之伸烷基、可具有取代基之伸芳基、或可具有取代基之伸芳烷基而鏈狀地鍵結,且羧酸之含有比例為10質量%以下。 An oligomeric fluorene diester, which is characterized in that it includes two or more fluorene units which may have a substituent, and the carbon atoms at the 9-position of the fluorene unit are directly bonded to each other, or via an extension which may have a substituent. An alkyl group, an arylene group which may have a substituent, or an aralkyl group which may have a substituent are chain-bonded, and the content ratio of a carboxylic acid is 10 mass% or less.

[4-6] [4-6]

如[4-5]記載之寡聚茀二酯,其由下述通式(1)表示。 The oligomeric fluorene diester according to [4-5], which is represented by the following general formula (1).

(式中,R1~R3分別獨立為直接鍵、或可具有取代基之碳數1~4之伸烷基。 (In the formula, R 1 to R 3 are each independently a direct bond or an alkylene group having 1 to 4 carbon atoms which may have a substituent.

R4~R9分別獨立為氫原子、可具有取代基之碳數1~10之烷基、可具有取代基之碳數4~10之芳基、可具有取代基之碳數1~10之醯基、可具有取代基之碳數1~10之醯氧基、可具有取代基之碳數1~10之烷氧基、可具有取代基之碳數1~10之芳氧基、可具有取代基之胺基、可具有取代基之碳數1~10之乙烯基、可具有取代基之碳數1~10之乙炔基、具有取代基之硫原子、具有取代基之矽原子、鹵素原子、硝基、或氰基。其中,R4~R9中鄰接之至少2個基亦可相互鍵結而形成環。 R 4 to R 9 are each independently a hydrogen atom, an alkyl group having 1 to 10 carbons that may have a substituent, an aryl group having 4 to 10 carbons that may have a substituent, and 1 to 10 carbons that may have a substituent Fluorenyl group, fluorenyloxy group having 1 to 10 carbon atoms which may have a substituent, alkoxyl group having 1 to 10 carbon atoms which may have a substituent, aryloxy group having 1 to 10 carbon atoms which may have a substituent, may have Substituent amino group, vinyl group having 1 to 10 carbon atoms which may have a substituent, ethynyl group having 1 to 10 carbon atoms which may have a substituent, sulfur atom having a substituent, silicon atom having a substituent, halogen atom , Nitro, or cyano. Among them, at least two adjacent groups in R 4 to R 9 may be bonded to each other to form a ring.

R10為碳數1~10之有機取代基。 R 10 is an organic substituent having 1 to 10 carbon atoms.

n表示1~5之整數值)。 n represents an integer value of 1 to 5).

[4-7] [4-7]

一種寡聚茀二芳酯之製造方法,其特徵在於:以如[4-6]記載之寡聚茀二酯為原料,以芳基取代上述R10基而獲得二芳酯。 A method for producing an oligomeric fluorene diaryl ester, characterized in that the oligomeric fluorene diester as described in [4-6] is used as a raw material, and the above-mentioned R 10 group is substituted with an aryl group to obtain a diaryl ester.

[4-8] [4-8]

一種樹脂組合物之製造方法,其特徵在於:使用如[4-1]至[4-6]中任一項記載之寡聚茀二酯作為原料。 The manufacturing method of the resin composition characterized by using the oligomeric fluorene diester as described in any one of [4-1] to [4-6] as a raw material.

本發明之樹脂之光學特性、耐熱性、機械特性、可靠性等各種特性之平衡性優異。因此,本發明之樹脂可較佳地用於相位差膜等光學膜。 The resin of the present invention is excellent in balance among various characteristics such as optical characteristics, heat resistance, mechanical characteristics, and reliability. Therefore, the resin of the present invention can be preferably used for an optical film such as a retardation film.

又,本發明之新穎之茀化合物具有充分之耐熱性,且使用其製造樹脂組合物並進行膜成形時顯現優異之光學特性,藉此可提高樹脂設計之自由度。 In addition, the novel amidine compound of the present invention has sufficient heat resistance, and exhibits excellent optical characteristics when a resin composition is produced by using the amidine compound to form a film, thereby improving the freedom of resin design.

又,本發明之寡聚茀化合物係選擇性地具有所需之反應性官能 基,而可較佳地用作光學用途之樹脂組合物之單體或單體原料。 In addition, the oligomeric fluorene compound of the present invention selectively has a desired reactive function It can be preferably used as a monomer or a monomer raw material of a resin composition for optical applications.

又,本發明之寡聚茀二酯化合物可較佳地用作光學用途之樹脂組合物之單體或單體原料,又提高樹脂設計之自由度,進而可抑制可於經過熔融製程時產生之著色。 In addition, the oligomeric fluorene diester compound of the present invention can be preferably used as a monomer or a monomer raw material of a resin composition for optical applications, and also improves the degree of freedom in resin design, thereby suppressing the generation of the resin composition during the melting process. Coloring.

圖1係將實施例4-1~4-4及比較例4-1之寡聚茀二酯中之金屬含量、與加熱前後之吸光度差進行比較之圖表。 FIG. 1 is a graph comparing the metal content in the oligomeric fluorene diesters of Examples 4-1 to 4-4 and Comparative Example 4-1 with the difference in absorbance before and after heating.

圖2係表示參考例4-1及參考例4-2之寡聚茀二酯之粒徑分佈的圖表。 FIG. 2 is a graph showing particle size distributions of oligomeric fluorene diesters in Reference Examples 4-1 and 4-2.

以下,對本發明之實施形態進行詳細說明,但以下所記載之構成要件之說明係本發明之實施態樣之一例(代表例),本發明只要不超出其主旨,則並不限定於以下之內容。 Hereinafter, the embodiment of the present invention will be described in detail, but the description of the constituent elements described below is an example (representative example) of the embodiment of the present invention. The present invention is not limited to the following as long as it does not exceed the gist thereof. .

再者,本發明中所謂「重複結構單元」係樹脂中相同之結構重複出現之結構單元,且係藉由各自連結而構成該樹脂之結構單元。更具體而言,例如若為聚碳酸酯樹脂,則亦包括羰基在內而稱為重複結構單元。 In addition, the so-called "repeating structural unit" in the present invention is a structural unit in which the same structure appears repeatedly in the resin, and the structural unit of the resin is constituted by respective connection. More specifically, if it is a polycarbonate resin, it is also called a repeating structural unit including a carbonyl group.

又,所謂「結構單元」係指構成樹脂之部分結構,且係重複結構單元所包含之特定之部分結構。例如係指樹脂中相鄰之連結基所夾持之部分結構、或存在於聚合物之末端部分之聚合反應性基、與相鄰於該聚合性反應基之連結基所夾持之部分結構,更具體而言,例如若為聚碳酸酯樹脂,則將以羰基為連結基而相鄰之羰基所夾持之部分結構稱為結構單元。 In addition, the "structural unit" refers to a partial structure constituting a resin and a specific partial structure included in a repeating structural unit. For example, it refers to the part of the structure held by the adjacent linking group in the resin, or the polymerizable reactive group existing at the terminal part of the polymer, and the part of the structure held between the linking group adjacent to the polymerizable reactive group. More specifically, for example, in the case of a polycarbonate resin, a partial structure sandwiched between adjacent carbonyl groups using a carbonyl group as a linking group is referred to as a structural unit.

本發明中,「重量」係與「質量」含義相同。 In the present invention, "weight" has the same meaning as "mass".

本發明中,「可具有取代基」係與「可經取代」含義相同。 In the present invention, "may have a substituent" has the same meaning as "may be substituted".

本發明中,有將「通式」僅記載為「式」之情形。 In the present invention, the "general formula" may be described only as "formula".

《發明1》 "Invention 1"

以下,對本發明1之樹脂及膜進行詳述。 Hereinafter, the resin and film of the present invention 1 will be described in detail.

再者,以下所記載之(通)式(1)~(9)、(11)~(15)係對本發明1中之各結構進行說明者。 The following general formulae (1) to (9) and (11) to (15) describe each structure in the present invention.

本發明之第一態樣係一種樹脂,其特徵在於:其係具有包含芳香族結構之重複結構單元之聚縮合系樹脂,且該重複結構單元中之芳香族結構之含量滿足下述式(I),該樹脂具有選自下述式(1)及式(2)所表示之結構單元中之至少1個結構單元。 A first aspect of the present invention is a resin characterized in that it is a polycondensation resin having a repeating structural unit including an aromatic structure, and the content of the aromatic structure in the repeating structural unit satisfies the following formula (I ), The resin has at least one structural unit selected from the structural units represented by the following formula (1) and formula (2).

5≦A≦-22.5×B+38.3 (I) 5 ≦ A ≦ -22.5 × B + 38.3 (I)

其中,0.75≦B≦0.93 Among them, 0.75 ≦ B ≦ 0.93

A:構成樹脂之重複結構單元中之芳香族結構之含量[質量%] A: content of aromatic structure in the repeating structural unit constituting the resin [mass%]

B:由樹脂所製作之延伸膜於450nm下之相位差(R450)與於550nm下之相位差(R550)的比(R450/R550) B: The ratio (R450 / R550) of the retardation (R450) at 450nm to the retardation (R550) at 550nm of the stretched film made of resin

(式(1)及(2)中,R1~R3分別獨立為直接鍵、可具有取代基之碳數1~4之伸烷基。 (In the formulae (1) and (2), R 1 to R 3 are each independently a direct bond and an alkylene group having 1 to 4 carbon atoms which may have a substituent.

R4~R9分別獨立為氫原子、可具有取代基之碳數1~10之烷基、可具有取代基之碳數4~10之芳基、可具有取代基之碳數1~10之醯 基、可具有取代基之碳數1~10之醯氧基、可具有取代基之碳數1~10之烷氧基、可具有取代基之碳數1~10之芳氧基、可具有取代基之胺基、可具有取代基之碳數1~10之乙烯基、可具有取代基之碳數1~10之乙炔基、具有取代基之硫原子、具有取代基之矽原子、鹵素原子、硝基、或氰基。其中,R4~R9中鄰接之至少2個基亦可相互鍵結而形成環)。 R 4 to R 9 are each independently a hydrogen atom, an alkyl group having 1 to 10 carbons that may have a substituent, an aryl group having 4 to 10 carbons that may have a substituent, and 1 to 10 carbons that may have a substituent Fluorenyl group, fluorenyloxy group having 1 to 10 carbon atoms which may have a substituent, alkoxyl group having 1 to 10 carbon atoms which may have a substituent, aryloxy group having 1 to 10 carbon atoms which may have a substituent, may have Substituent amino group, vinyl group having 1 to 10 carbon atoms which may have a substituent, ethynyl group having 1 to 10 carbon atoms which may have a substituent, sulfur atom having a substituent, silicon atom having a substituent, halogen atom , Nitro, or cyano. Among them, at least two adjacent groups in R 4 to R 9 may be bonded to each other to form a ring).

本發明之第二態樣係一種樹脂,其特徵在於:其係具有包含芳香族結構之重複結構單元之聚縮合系樹脂,且該重複結構單元中之芳香族結構之含量滿足下述式(III),且該樹脂之玻璃轉移溫度為120℃以上且160℃以下。 A second aspect of the present invention is a resin characterized in that it is a polycondensation resin having a repeating structural unit including an aromatic structure, and the content of the aromatic structure in the repeating structural unit satisfies the following formula (III ), And the glass transition temperature of the resin is 120 ° C or higher and 160 ° C or lower.

5≦A≦-22.5×B+34.8 (III) 5 ≦ A ≦ -22.5 × B + 34.8 (III)

其中,0.75≦B≦0.93 Among them, 0.75 ≦ B ≦ 0.93

A:構成樹脂之重複結構單元中之芳香族結構之含量[質量%] A: content of aromatic structure in the repeating structural unit constituting the resin [mass%]

B:由樹脂所製作之延伸膜於450nm下之相位差(R450)與於550nm下之相位差(R550)的比(R450/R550) B: The ratio (R450 / R550) of the retardation (R450) at 450nm to the retardation (R550) at 550nm of the stretched film made of resin

<本發明之樹脂> <Resin of the present invention>

本發明之樹脂係聚縮合系之樹脂。所謂聚縮合系之樹脂,係表示藉由Glossary of basic terms in polymer science(IUPAC Recommendations 1996)中所定義之polycondensation而獲得之樹脂,且係藉由聚合物鏈之成長藉由分子間之縮合反應而進行之聚合而獲得之樹脂。本發明之聚縮合系之樹脂較佳為具有選自碳酸酯鍵及酯鍵中之至少1個鍵之樹脂,更具體而言,較佳為聚碳酸酯、聚酯及聚酯碳酸酯中之任一種樹脂。關於該等樹脂,可列舉如下優點:耐熱性、機械物性、熔融加工性優異,又,藉由使複數個單體進行共聚合,而容易將光學物性或耐熱性、機械物性等各種物性控制為所需之範圍。 The resin of the present invention is a polycondensation resin. The so-called polycondensation resin refers to a resin obtained by polycondensation as defined in Glossary of basic terms in polymer science (IUPAC Recommendations 1996), and is a polymer chain that grows through a condensation reaction between molecules. Resin obtained by polymerization. The polycondensation resin of the present invention is preferably a resin having at least one bond selected from carbonate bonds and ester bonds, and more specifically, polycarbonate, polyester, and polyester carbonate Either resin. These resins include advantages such as excellent heat resistance, mechanical properties, and melt processability, and by copolymerizing a plurality of monomers, it is easy to control various physical properties such as optical properties, heat resistance, and mechanical properties to The required range.

本發明之樹脂係包含芳香族結構者,作為芳香族結構,只要為 具有芳香族性之環狀結構,則設為包含任意結構者。更具體而言,可列舉:類苯芳香族環、非類苯芳香族環、雜芳香環等,其中,較佳為類苯芳香族環或雜芳香環。本發明中,關於構成樹脂之重複結構單元中之芳香族結構之含量的算出方法,於以下列舉具體之事例並進行說明。 If the resin of the present invention contains an aromatic structure, as the aromatic structure, An aromatic cyclic structure is assumed to include an arbitrary structure. More specific examples include benzene-like aromatic rings, non-benzene-like aromatic rings, and heteroaromatic rings. Among them, benzene-like aromatic rings or heteroaromatic rings are preferred. In the present invention, a method for calculating the content of the aromatic structure in the repeating structural unit constituting the resin will be described below with reference to specific examples.

[各種芳香族結構之計算上之分子量] [Calculated molecular weight of various aromatic structures]

關於本發明中之芳香族結構之分子量,包含具有芳香族性之環狀結構中之碳原子、氫原子、雜原子。鍵結於具有芳香族性之環狀結構之碳原子或雜原子並不包含於芳香族結構中。又,於乙烯基或乙炔基、羰基等鍵結於具有芳香族性之環狀結構之情形時,芳香環之共軛系擴展至該等官能基,但芳香族結構中不包含鍵結於具有芳香族性之環狀結構之取代基。 The molecular weight of the aromatic structure in the present invention includes carbon atoms, hydrogen atoms, and heteroatoms in an aromatic cyclic structure. Carbon atoms or heteroatoms bonded to an aromatic cyclic structure are not included in the aromatic structure. In addition, when vinyl, ethynyl, carbonyl and the like are bonded to an aromatic cyclic structure, the conjugated system of the aromatic ring is extended to these functional groups, but the aromatic structure does not include a bond to Substituents for aromatic cyclic structures.

[化16] [Chemical 16]

[化17] [Chemical 17]

[計算例1] [Calculation example 1]

重複結構單元之分子量:C10H8O4=192.17 Molecular weight of repeating structural unit: C 10 H 8 O 4 = 192.17

重複結構單元中之芳香族結構之分子量:C6H4=76.10 Molecular weight of aromatic structure in repeating structural unit: C 6 H 4 = 76.10

芳香族結構之含量=76.10/192.17×100=39.6[質量%] Content of aromatic structure = 76.10 / 192.17 × 100 = 39.6 [mass%]

[計算例2] [Calculation example 2]

於為重複結構單元A與重複結構單元B之共聚合樹脂,且重複結構單元A與重複結構單元B之莫耳比,即m:n=3:7之情形時。 When it is a copolymerized resin of repeating structural unit A and repeating structural unit B, and the molar ratio of repeating structural unit A and repeating structural unit B, that is, m: n = 3: 7.

重複結構單元A之分子量:C30H24O5=464.51 Molecular weight of repeating structural unit A: C 30 H 24 O 5 = 464.51

重複結構單元A中之芳香族結構之分子量:C6H4×4=304.38 Molecular weight of aromatic structure in repeating structural unit A: C 6 H 4 × 4 = 304.38

重複結構單元B之分子量:C16H14O3=254.28 Molecular weight of repeating structural unit B: C 16 H 14 O 3 = 254.28

重複結構單元B中之芳香族結構之分子量=C6H4×2=152.19 Molecular weight of aromatic structure in repeating structural unit B = C 6 H 4 × 2 = 152.19

芳香族結構之含量:(304.38×0.3+152.19×0.7)/(464.51×0.3+254.28×0.7)×100=62.3[質量%] Content of aromatic structure: (304.38 × 0.3 + 152.19 × 0.7) / (464.51 × 0.3 + 254.28 × 0.7) × 100 = 62.3 [mass%]

本發明之樹脂之特徵在於:如上述般算出之構成樹脂之重複結構單元中之芳香族結構的含量滿足下述(I)式。進而較佳為滿足下述(II)式,尤佳為滿足式(III)。 The resin of the present invention is characterized in that the content of the aromatic structure in the repeating structural unit constituting the resin calculated as described above satisfies the following formula (I). It is more preferable to satisfy the following formula (II), and it is more preferable to satisfy the formula (III).

5≦A≦-22.5×B+38.3 (I) 5 ≦ A ≦ -22.5 × B + 38.3 (I)

7≦A≦-22.5×B+37.5 (II) 7 ≦ A ≦ -22.5 × B + 37.5 (II)

8≦A≦-22.5×B+34.8 (III) 8 ≦ A ≦ -22.5 × B + 34.8 (III)

其中,0.75≦B≦0.93。 Among them, 0.75 ≦ B ≦ 0.93.

A:構成樹脂之重複結構單元中之芳香族結構之含量[質量%] A: content of aromatic structure in the repeating structural unit constituting the resin [mass%]

B:由樹脂所製作之延伸膜於450nm下之相位差(R450)與於550nm下之相位差(R550)的比(R450/R550) B: The ratio (R450 / R550) of the retardation (R450) at 450nm to the retardation (R550) at 550nm of the stretched film made of resin

於上述式(I)之R450/R550之值未達1之情形時,相位差具有反波長色散性,於用作1/4波長板之情形時,於廣泛之波長區域中可獲得接近理想之相位差特性。作為表現出該反波長色散性之方法之一,可列舉:使折射率之波長色散(波長依存性)大於聚合物鏈之主鏈成分的 成分向垂直於主鏈之方向進行配向。一般而言,芳香族之共軛系變得越長,折射率之波長色散變得越大,因此具有反波長色散性之樹脂較佳為含有芳香族結構。另一方面,於主鏈成分含有芳香族之情形時,主鏈上之芳香族成分表現出較強之正波長色散性,因此消除反波長色散性。又,通常若大量含有芳香族,則光彈性係數或折射率會變大,而作為光學物性欠佳。上述式(I)意指導入反波長色散之表現效率較高之芳香族結構,並將其他芳香族成分抑制在所需之最小限度。藉由進行上述分子設計,可獲得具有反波長色散性,並且光彈性係數或配向性等光學特性之平衡性優異之樹脂。針對具體之較佳之分子結構,於下文進行說明。 In the case where the value of R450 / R550 of the above formula (I) is less than 1, the phase difference has inverse wavelength dispersion, and when used as a quarter-wave plate, a near-ideal value can be obtained in a wide range of wavelengths. Phase difference characteristics. As one of the methods of exhibiting the inverse wavelength dispersion property, there can be mentioned a method which makes the wavelength dispersion (wavelength dependence) of the refractive index larger than that of the main chain component of the polymer chain. The components are aligned in a direction perpendicular to the main chain. In general, the longer the aromatic conjugate system becomes, the larger the wavelength dispersion of the refractive index becomes. Therefore, it is preferable that the resin having an inverse wavelength dispersion property contains an aromatic structure. On the other hand, when the main chain component contains aromatics, the aromatic components on the main chain exhibit strong positive wavelength dispersion, and therefore, reverse wavelength dispersion is eliminated. In addition, when aromatic is contained in a large amount, the photoelastic coefficient or refractive index generally increases, and the optical properties are not good. The above formula (I) is intended to guide an aromatic structure with a higher expression efficiency of inverse wavelength dispersion, and suppress other aromatic components to the required minimum. By performing the above-mentioned molecular design, a resin having inverse wavelength dispersion and excellent balance of optical characteristics such as a photoelastic coefficient or alignment can be obtained. Specific and preferred molecular structures are described below.

作為B(R450/R550)之值,係使用於使用延伸膜之評估中所測得之波長色散之值,該延伸膜係自藉由熱壓法而由樹脂所製作之未延伸膜所獲得。 The value of B (R450 / R550) is a value of wavelength dispersion measured in an evaluation using a stretched film obtained from an unstretched film made of a resin by a hot pressing method.

<寡聚茀結構單元> <Oligomerization unit>

本發明之樹脂較佳為具有選自由下述通式(1)所表示之結構單元及下述通式(2)所表示之結構單元所組成之群中的1種以上之結構單元。以下,有將該結構單元稱為寡聚茀結構單元之情況。 The resin of the present invention preferably has one or more structural units selected from the group consisting of a structural unit represented by the following general formula (1) and a structural unit represented by the following general formula (2). Hereinafter, this structural unit may be referred to as an oligomeric fluorene structural unit.

上述通式(1)及上述通式(2)中,R1~R3分別獨立為直接鍵、可具有取代基之碳數1~4之伸烷基。 In the general formula (1) and the general formula (2), R 1 to R 3 are each independently a direct bond and an alkylene group having 1 to 4 carbon atoms which may have a substituent.

R4~R9分別獨立為氫原子、可具有取代基之碳數1~10之烷基、可具有取代基之碳數4~10之芳基、可具有取代基之碳數1~10之醯基、可具有取代基之碳數1~10之醯氧基、可具有取代基之碳數1~10之烷氧基、可具有取代基之碳數1~10之芳氧基、可具有取代基之胺基、可具有取代基之碳數1~10之乙烯基、可具有取代基之碳數1~10之乙炔基、具有取代基之硫原子、具有取代基之矽原子、鹵素原子、硝基、或氰基。 R 4 to R 9 are each independently a hydrogen atom, an alkyl group having 1 to 10 carbons that may have a substituent, an aryl group having 4 to 10 carbons that may have a substituent, and 1 to 10 carbons that may have a substituent Fluorenyl group, fluorenyloxy group having 1 to 10 carbon atoms which may have a substituent, alkoxyl group having 1 to 10 carbon atoms which may have a substituent, aryloxy group having 1 to 10 carbon atoms which may have a substituent, may have Substituent amino group, vinyl group having 1 to 10 carbon atoms which may have a substituent, ethynyl group having 1 to 10 carbon atoms which may have a substituent, sulfur atom having a substituent, silicon atom having a substituent, halogen atom , Nitro, or cyano.

R1及R2中,作為「可具有取代基之碳數1~4之伸烷基」,例如可採用以下之伸烷基。亞甲基、伸乙基、正伸丙基、正伸丁基等直鏈狀之伸烷基;甲基亞甲基、二甲基亞甲基、乙基亞甲基、丙基亞甲基、(1-甲基乙基)亞甲基、1-甲基伸乙基、2-甲基伸乙基、1-乙基伸乙基、2-乙基伸乙基、1-甲基伸丙基、2-甲基伸丙基、1,1-二甲基伸乙基、2,2-二甲基伸丙基、3-甲基伸丙基等具有側鏈之伸烷基。此處,R1及R2中之側鏈之位置係由以茀環側之碳成為1位之方式進行賦予之編號進行表示。 Among R 1 and R 2 , as the "alkylene group having 1 to 4 carbon atoms which may have a substituent", for example, the following alkylene groups can be used. Methylene, ethylene, n-propyl, n-butyl, etc. linear alkylene; methylmethylene, dimethylmethylene, ethylmethylene, propylmethylene, ( 1-methylethyl) methylene, 1-methylphenyl, 2-methylphenyl, 1-ethylphenyl, 2-ethylphenyl, 1-methylphenyl, 2 -Methylene, 1,1-dimethyl, ethyl, 2,2-dimethyl, and 3-methyl, and other alkylene groups having a side chain. Here, the positions of the side chains in R 1 and R 2 are represented by numbers assigned such that the carbon on the fluorene ring side becomes one position.

R1及R2之選擇係對反波長色散性之顯現產生尤其重要之影響。上述樹脂於茀環垂直配向於主鏈方向(延伸方向)之狀態下顯現最強之反波長色散性。為了使茀環之配向狀態接近上述狀態以顯現較強之反波長色散性,較佳為採用伸烷基之主鏈上之碳數為2~3之R1及R2。於碳數為1之情形時,有意外地不顯現反波長色散性之情形。作為其主要原因,可認為:由於寡聚茀結構單元之作為連結基之碳酸酯基或酯基之位阻,從而茀環之配向被固定為並非垂直於主鏈方向之方向等。另一方面,於碳數過多之情形時,有因茀環之配向之固定變弱,從而反波長色散性變弱之虞。又,樹脂之耐熱性亦降低。 The choice of R 1 and R 2 has a particularly important effect on the appearance of the inverse wavelength dispersion. The above resin exhibits the strongest inverse wavelength dispersion property in a state where the fluorene ring is vertically aligned in the main chain direction (extending direction). In order to make the alignment state of the fluorene ring close to the above-mentioned state to exhibit strong inverse wavelength dispersion, it is preferable to use R 1 and R 2 having a carbon number of 2 to 3 on the main chain of the alkylene group. When the carbon number is 1, there may be a case where the inverse wavelength dispersion property does not appear unexpectedly. As the main reason, it can be considered that the orientation of the fluorene ring is fixed to a direction that is not perpendicular to the main chain direction due to the steric hindrance of a carbonate group or an ester group as a linking group of the oligomeric fluorene structural unit. On the other hand, when the number of carbons is too large, the fixation of the orientation of the fluorene ring may be weakened, and the reverse wavelength dispersion may be weakened. In addition, the heat resistance of the resin is also reduced.

如上述通式(1)及通式(2)所示般,R1及R2係伸烷基之一端鍵結於茀環,另一端鍵結於連結基所包含之氧原子或羰基碳中之任一者。就熱穩定性、耐熱性及反波長色散性之觀點而言,較佳為伸烷基之另一端鍵結於羰基碳。如下所述,作為具有寡聚茀結構之單體,具體而言,可認為二醇或二酯(以下,二酯設為亦包含二羧酸者)之結構,較佳為將二酯用於原料而進行聚合。 As shown in the above general formula (1) and general formula (2), one end of R 1 and R 2 is an alkylene group bonded to a fluorene ring, and the other end is bonded to an oxygen atom or a carbonyl carbon contained in the linking group. Either. From the viewpoints of thermal stability, heat resistance, and inverse wavelength dispersion, the other end of the alkylene group is preferably bonded to a carbonyl carbon. As described below, as the monomer having an oligomeric fluorene structure, specifically, a structure of a diol or a diester (hereinafter, the diester is also one containing a dicarboxylic acid) can be considered, and the diester is preferably used for The raw materials are polymerized.

又,就使製造變容易之觀點而言,較佳為R1及R2採用相同之伸烷基。 From the viewpoint of facilitating production, it is preferred that R 1 and R 2 use the same alkylene group.

R3中,作為「可具有取代基之碳數1~4之伸烷基」,例如可採用以下之伸烷基。伸乙基、伸乙基、正伸丙基、正伸丁基等直鏈狀之伸烷基;甲基亞甲基、二甲基亞甲基、乙基亞甲基、丙基亞甲基、(1-甲基乙基)亞甲基、1-甲基伸乙基、2-甲基伸乙基、1-乙基伸乙基、2-乙基伸乙基、1-甲基伸丙基、2-甲基伸丙基、1,1-二甲基伸乙基、2,2-二甲基伸丙基、3-甲基伸丙基等具有側鏈之伸烷基。 In R 3 , as the "alkylene group having 1 to 4 carbon atoms which may have a substituent", for example, the following alkylene groups can be used. Straight-chain alkylenes such as ethylene, ethylene, n-propyl, n-butyl, etc .; methylmethylene, dimethylmethylene, ethylmethylene, propylmethylene, ( 1-methylethyl) methylene, 1-methylphenyl, 2-methylphenyl, 1-ethylphenyl, 2-ethylphenyl, 1-methylphenyl, 2 -Methylene, 1,1-dimethyl, ethyl, 2,2-dimethyl, and 3-methyl, and other alkylene groups having a side chain.

R3較佳為伸烷基之主鏈上之碳數為1~2,尤佳為碳數為1。於採用主鏈上之碳數過多之R3之情形時,有如下之虞:與R1及R2同樣地茀環之固定較弱,而導致反波長色散性之降低、光彈性係數之增加、耐熱性之降低等。另一方面,主鏈上之碳數較少者之光學特性或耐熱性良好,於兩個茀環之9位以直接鍵連結之情形時,熱穩定性變差。 R 3 preferably has a carbon number of 1 to 2 on the main chain of the alkylene group, and particularly preferably has a carbon number of 1. In the case of using R 3 with too many carbon atoms on the main chain, there is a possibility that the fixation of the ring is weak like R 1 and R 2 , resulting in a decrease in inverse wavelength dispersion and an increase in photoelasticity coefficient. , Reduction of heat resistance, etc. On the other hand, the one with a smaller number of carbons on the main chain has good optical properties or heat resistance. When the 9 positions of the two fluorene rings are connected by a direct bond, the thermal stability is deteriorated.

於R1~R3中,作為伸烷基可具有之取代基,可採用以下所例示之取代基,亦可採用該等以外之取代基。選自氟原子、氯原子、溴原子及碘原子之鹵素原子;甲氧基、乙氧基等碳數1~10之烷氧基;乙醯基、苯甲醯基等碳數1~10之醯基;乙醯胺基、苯甲醯胺基等碳數1~10之醯胺基;硝基;氰基;1~3個氫原子可經上述鹵素原子、上述烷氧基、上述醯基、上述醯胺基、上述硝基、上述氰基等取代之苯基、萘基等碳數6~10之芳基。 In R 1 to R 3 , as the substituent which the alkylene group may have, the substituents exemplified below may be used, and substituents other than these may also be used. A halogen atom selected from a fluorine atom, a chlorine atom, a bromine atom, and an iodine atom; an alkoxy group having 1 to 10 carbon atoms such as a methoxy group and an ethoxy group; Fluorenyl groups; fluorenyl groups such as acetamido, benzamidine and the like having a carbon number of 1 to 10; nitro; cyano; 1 to 3 hydrogen atoms may pass through the halogen atom, the alkoxy group, and the fluorenyl group 6-6 aryl groups such as substituted phenyl groups, substituted phenyl groups, naphthyl groups, and the like, such as the amidino group, the nitro group, and the cyano group.

上述取代基之數量並無特別限定,較佳為1~3個。於取代基為2個以上之情形時,取代基之種類可相同亦可不同。於取代基之數量過多之情形時,有於聚合中抑制反應、或進行熱分解之虞。又,就連同工業上可廉價地製造之觀點而言,較佳為R1~R3未經取代。 The number of the above-mentioned substituents is not particularly limited, but is preferably 1-3. When there are two or more substituents, the kinds of the substituents may be the same or different. When there are too many substituents, there exists a possibility that reaction may be inhibited during a polymerization, or thermal decomposition may be performed. In addition, from the standpoint that it can be manufactured inexpensively industrially, R 1 to R 3 are preferably unsubstituted.

R4~R9中,作為「可具有取代基之碳數1~10之烷基」,例如可採用以下之烷基。甲基、乙基、正丙基、正丁基、正戊基、正己基、正癸基等直鏈狀之烷基;異丙基、2-甲基丙基、2,2-二甲基丙基、2-乙基己基等具有側鏈之烷基;環丙基、環戊基、環己基、環辛基等環狀之烷基。 Among R 4 to R 9 , as the "alkyl group having 1 to 10 carbon atoms which may have a substituent", for example, the following alkyl groups can be used. Linear alkyl groups such as methyl, ethyl, n-propyl, n-butyl, n-pentyl, n-hexyl, n-decyl; isopropyl, 2-methylpropyl, 2,2-dimethyl Alkyl groups having side chains such as propyl and 2-ethylhexyl; cyclic alkyl groups such as cyclopropyl, cyclopentyl, cyclohexyl, and cyclooctyl.

上述烷基之碳數較佳為4以下,更佳為2以下。若為該範圍內,則有茀環彼此之位阻難以產生,而可獲得源自茀環之所需之光學特性之傾向。 The carbon number of the alkyl group is preferably 4 or less, and more preferably 2 or less. If it is within this range, the steric hindrance of the fluorene rings is difficult to occur, and the optical characteristics required from the fluorene rings tend to be obtained.

作為上述烷基可具有之取代基,可採用以下所例示之取代基,但亦可採用該等以外之取代基。選自氟原子、氯原子、溴原子及碘原子之鹵素原子;甲氧基、乙氧基等碳數1~10之烷氧基;乙醯基、苯甲醯基等碳數1~10之醯基;乙醯胺基、苯甲醯胺基等碳數1~10之醯胺基;硝基;氰基;1~3個氫原子可經上述鹵素原子、上述烷氧基、上述醯基、上述醯胺基、上述硝基、上述氰基等取代之苯基、萘基等碳數6~10之芳基。 As the substituent which the above-mentioned alkyl group may have, the substituents exemplified below may be used, but other substituents may be used. A halogen atom selected from a fluorine atom, a chlorine atom, a bromine atom, and an iodine atom; an alkoxy group having 1 to 10 carbon atoms such as a methoxy group and an ethoxy group; Fluorenyl groups; fluorenyl groups such as acetamido, benzamidine, and the like having a carbon number of 1 to 10; nitro; cyano; 6-6 aryl groups such as substituted phenyl groups, substituted phenyl groups, naphthyl groups, and the like, such as the amidino group, the nitro group, and the cyano group.

上述取代基之數量並無特別限定,較佳為1~3個。於取代基為2個以上之情形時,取代基之種類可相同亦可不同。於上述取代基之數量過多之情形時,有於聚合中抑制反應、或進行熱分解之虞。又,就連同工業上可廉價地製造之觀點而言,較佳為R4~R9未經取代。作為上述烷基之具體例,可列舉:三氟甲基、苄基、4-甲氧基苄基、甲氧基甲基等。 The number of the above-mentioned substituents is not particularly limited, but is preferably 1-3. When there are two or more substituents, the kinds of the substituents may be the same or different. When there are too many said substituents, there exists a possibility that reaction may be suppressed during a polymerization, or thermal decomposition may advance. In addition, from the viewpoint of industrially inexpensive production, it is preferable that R 4 to R 9 are unsubstituted. Specific examples of the alkyl group include trifluoromethyl, benzyl, 4-methoxybenzyl, and methoxymethyl.

又,於R4~R9中,作為「可具有取代基之碳數4~10之芳基」,例 如可採用以下之芳基。苯基、1-萘基、2-萘基等芳基;2-吡啶基、2-噻吩基、2-呋喃基等雜芳基。 In R 4 to R 9 , as the "aryl group having 4 to 10 carbon atoms which may have a substituent", for example, the following aryl group may be used. Aryl groups such as phenyl, 1-naphthyl, and 2-naphthyl; heteroaryl groups such as 2-pyridyl, 2-thienyl, and 2-furyl.

上述芳基之碳數較佳為8以下,更佳為7以下。若為該範圍內,則有茀環彼此之位阻難以產生,而可獲得源自茀環之所需之光學特性之傾向。 The carbon number of the aryl group is preferably 8 or less, and more preferably 7 or less. If it is within this range, the steric hindrance of the fluorene rings is difficult to occur, and the optical characteristics required from the fluorene rings tend to be obtained.

R4~R9中,作為上述芳基可具有之取代基,可採用以下所例示之取代基,亦可採用該等以外之取代基。選自氟原子、氯原子、溴原子及碘原子之鹵素原子;甲基、乙基、異丙基等碳數1~10之烷基;甲氧基、乙氧基等碳數1~10之烷氧基;乙醯基、苯甲醯基等碳數1~10之醯基;乙醯胺基、苯甲醯胺基等碳數1~10之醯胺基;硝基;氰基。上述取代基之數量並無特別限定,較佳為1~3個。於取代基為2個以上之情形時,取代基之種類可相同亦可不同。又,就連同工業上可廉價地製造之觀點而言,較佳為R4~R9未經取代。 In R 4 to R 9 , as the substituent that the aryl group may have, the substituents exemplified below may be used, and substituents other than these may also be used. Halogen atom selected from fluorine atom, chlorine atom, bromine atom and iodine atom; alkyl group having 1 to 10 carbon atoms such as methyl, ethyl, isopropyl, etc .; carbon group having 1 to 10 carbon atoms such as methoxy and ethoxy Alkoxy; fluorenyl groups having 1 to 10 carbon atoms, such as ethenyl and benzamidine; fluorenyl groups having 1 to 10 carbon atoms, such as ethenylamino and benzamidine; nitro; cyano. The number of the above-mentioned substituents is not particularly limited, but is preferably 1-3. When there are two or more substituents, the kinds of the substituents may be the same or different. In addition, from the viewpoint of industrially inexpensive production, it is preferable that R 4 to R 9 are unsubstituted.

作為上述芳基之具體例,可列舉:2-甲基苯基、4-甲基苯基、3,5-二甲基苯基、4-苯甲醯基苯基、4-甲氧基苯基、4-硝基苯基、4-氰基苯基、3-三氟甲基苯基、3,4-二甲氧基苯基、3,4-亞甲基二氧基苯基、2,3,4,5,6-五氟苯基、4-甲基呋喃基等。 Specific examples of the aryl group include 2-methylphenyl, 4-methylphenyl, 3,5-dimethylphenyl, 4-benzylphenyl, and 4-methoxybenzene. Methyl, 4-nitrophenyl, 4-cyanophenyl, 3-trifluoromethylphenyl, 3,4-dimethoxyphenyl, 3,4-methylenedioxyphenyl, 2 , 3,4,5,6-pentafluorophenyl, 4-methylfuryl and the like.

又,R4~R9中,作為「可具有取代基之碳數1~10之醯基」,例如可採用以下之醯基。甲醯基、乙醯基、丙醯基、2-甲基丙醯基、2,2-二甲基丙醯基、2-乙基己醯基等脂肪族醯基;苯甲醯基、1-萘基羰基、2-萘基羰基、2-呋喃基羰基等芳香族醯基。 Among R 4 to R 9 , as the "fluorenyl group having 1 to 10 carbon atoms which may have a substituent", for example, the following fluorenyl groups may be used. Alimentary fluorenyl groups such as formamyl, acetamyl, propionyl, 2-methylpropanyl, 2,2-dimethylpropanyl, and 2-ethylhexyl; benzyl, 1 -Aromatic fluorenyl groups such as naphthylcarbonyl, 2-naphthylcarbonyl, and 2-furylcarbonyl.

上述醯基之碳數較佳為4以下,更佳為2以下。若為該範圍內,則有茀環彼此之位阻難以產生,而可獲得源自茀環之所需之光學特性之傾向。 The carbon number of the amidino group is preferably 4 or less, and more preferably 2 or less. If it is within this range, the steric hindrance of the fluorene rings is difficult to occur, and the optical characteristics required from the fluorene rings tend to be obtained.

作為上述醯基可具有之取代基,可採用以下所例示之取代基,但亦可採用該等以外之取代基。選自氟原子、氯原子、溴原子及碘原 子之鹵素原子;甲基、乙基、異丙基等碳數1~10之烷基;甲氧基、乙氧基等碳數1~10之烷氧基;乙醯胺基、苯甲醯胺基等碳數1~10之醯胺基;硝基;氰基;1~3個氫原子可經上述鹵素原子、上述烷氧基、乙醯基、苯甲醯基等碳數1~10之醯基、上述醯胺基、上述硝基、上述氰基等取代之苯基、萘基等碳數6~10之芳基。 As the substituent which the above-mentioned fluorenyl group may have, the substituents exemplified below may be used, but other substituents may be used. Selected from fluorine, chlorine, bromine and iodine Halogen atom of the child; Alkyl group having 1 to 10 carbon atoms such as methyl, ethyl, isopropyl; Alkoxy group having 1 to 10 carbon atoms such as methoxy and ethoxy; Ethylamino, benzamidine Amine groups such as amine groups having 1 to 10 carbon atoms; nitro groups; cyano groups; 1 to 3 hydrogen atoms can pass through the above halogen atoms, alkoxy groups, acetamido groups, benzamidine groups, and other carbon numbers 1 to 10 6-10 carbon atoms, such as fluorenyl group, said fluorenylamino group, said nitro group, said cyano group, substituted phenyl group, naphthyl group, etc.

上述取代基之數量並無特別限定,較佳為1~3個。於取代基為2個以上之情形時,取代基之種類可相同亦可不同。又,就連同工業上可廉價地製造之觀點而言,較佳為R4~R9未經取代。 The number of the above-mentioned substituents is not particularly limited, but is preferably 1-3. When there are two or more substituents, the kinds of the substituents may be the same or different. In addition, from the viewpoint of industrially inexpensive production, it is preferable that R 4 to R 9 are unsubstituted.

作為上述醯基之具體例,可列舉:氯乙醯基、三氟乙醯基、甲氧基乙醯基、苯氧基乙醯基、4-甲氧基苯甲醯基、4-硝基苯甲醯基、4-氰基苯甲醯基、4-三氟甲基苯甲醯基等。 Specific examples of the above-mentioned fluorenyl group include chloroethenyl, trifluoroacetamyl, methoxyacetamyl, phenoxyacetamyl, 4-methoxybenzylamyl, and 4-nitro Benzamidine, 4-cyanobenzyl, 4-trifluoromethylbenzyl and the like.

又,R4~R9中,作為「可具有取代基之碳數1~10之醯氧基」,例如可採用以下之醯氧基。甲醯基、乙醯基、丙醯基、丁醯基、丙烯醯基、甲基丙烯醯基等脂肪族醯氧基;苯甲醯基等芳香族醯氧基。 Among R 4 to R 9 , as the "fluorenyloxy group having 1 to 10 carbon atoms which may have a substituent", for example, the following fluorenyloxy group can be used. Aliphatic alkoxy groups such as formamyl, ethenyl, propionyl, butyl fluorenyl, propylene fluorenyl, methacryl fluorenyl; and aromatic fluorenyl oxy groups such as benzamyl.

上述醯基之碳數較佳為4以下,更佳為2以下。若為該範圍內,則有茀環彼此之位阻難以產生,而可獲得源自茀環之所需之光學特性之傾向。 The carbon number of the amidino group is preferably 4 or less, and more preferably 2 or less. If it is within this range, the steric hindrance of the fluorene rings is difficult to occur, and the optical characteristics required from the fluorene rings tend to be obtained.

作為上述醯氧基可具有之取代基,可採用以下所例示之取代基,但亦可採用該等以外之取代基。選自氟原子、氯原子、溴原子及碘原子之鹵素原子;甲基、乙基、異丙基等碳數1~10之烷基;甲氧基、乙氧基等碳數1~10之烷氧基;乙醯胺基、苯甲醯胺基等碳數1~10之醯胺基;硝基;1~3個氫原子可經氰基;上述鹵素原子、上述烷氧基、乙醯基、苯甲醯基等碳數1~10之醯基、上述醯胺基、上述硝基、上述氰基等取代之苯基、萘基等碳數6~10之芳基。 As the substituent which the above-mentioned fluorenyloxy group may have, the substituents exemplified below may be used, but substituents other than these may also be used. Halogen atom selected from fluorine atom, chlorine atom, bromine atom and iodine atom; alkyl group having 1 to 10 carbon atoms such as methyl, ethyl, isopropyl, etc .; carbon group having 1 to 10 carbon atoms such as methoxy and ethoxy Alkoxy; acetamido, benzamido, and other amines having 1 to 10 carbon atoms; nitro; 1 to 3 hydrogen atoms can pass through cyano; the above halogen atom, the above alkoxy, and acetamidine A fluorenyl group having 1 to 10 carbon atoms such as a phenyl group, a benzamidine group, an aryl group having 6 to 10 carbon atoms such as a substituted phenylamino group, the nitro group, and the cyano group, and a naphthyl group.

上述取代基之數量並無特別限定,較佳為1~3個。於取代基為2個以上之情形時,取代基之種類可相同亦可不同。又,就連同工業上 可廉價地製造之觀點而言,較佳為R4~R9未經取代。作為上述醯基之具體例,可列舉:氯乙醯基、三氟乙醯基、甲氧基乙醯基、苯氧基乙醯基、4-甲氧基苯甲醯基、4-硝基苯甲醯基、4-氰基苯甲醯基、4-三氟甲基苯甲醯基等。 The number of the above-mentioned substituents is not particularly limited, but is preferably 1-3. When there are two or more substituents, the kinds of the substituents may be the same or different. In addition, from the viewpoint of industrially inexpensive production, it is preferable that R 4 to R 9 are unsubstituted. Specific examples of the above-mentioned fluorenyl group include chloroethenyl, trifluoroacetamyl, methoxyacetamyl, phenoxyacetamyl, 4-methoxybenzylamyl, and 4-nitro Benzamidine, 4-cyanobenzyl, 4-trifluoromethylbenzyl and the like.

又,R4~R9中,作為「可具有取代基之碳數1~10之烷氧基或芳氧基」,例如可採用以下之烷氧基及芳氧基。甲氧基、乙氧基、異丙氧基、第三丁氧基、三氟甲氧基等烷氧基;苯氧基等芳氧基。 Among R 4 to R 9 , as the "alkoxy group or aryloxy group having 1 to 10 carbon atoms which may have a substituent", for example, the following alkoxy groups and aryloxy groups can be used. Alkoxy groups such as methoxy, ethoxy, isopropoxy, tertiary butoxy, and trifluoromethoxy; aryloxy groups such as phenoxy.

上述烷氧基及上述芳氧基中,較佳為烷氧基,烷氧基之碳數較佳為4以下,更佳為2以下。若為該範圍內,則有茀環彼此之位阻難以產生,而可獲得源自茀環之所需之光學特性之傾向。 Among the alkoxy group and the aryloxy group, an alkoxy group is preferred, and the number of carbon atoms in the alkoxy group is preferably 4 or less, more preferably 2 or less. If it is within this range, the steric hindrance of the fluorene rings is difficult to occur, and the optical characteristics required from the fluorene rings tend to be obtained.

又,R4~R9中,作為「可具有取代基之胺基」之具體結構,例如可採用以下之胺基,但亦可採用該等以外之胺基。胺基;N-甲基胺基、N,N-二甲基胺基、N-乙基胺基、N,N-二乙基胺基、N,N-甲基乙基胺基、N-丙基胺基、N,N-二丙基胺基、N-異丙基胺基、N,N-二異丙基胺基等脂肪族胺基;N-苯基胺基、N,N-二苯基胺基等芳香族胺基;甲醯胺基、乙醯胺基、癸醯胺基、苯甲醯胺基、氯乙醯胺基等醯胺基;苄氧羰基胺基、第三丁氧羰基胺基等烷氧羰基胺基。 In R 4 to R 9 , as the specific structure of the “amino group which may have a substituent”, for example, the following amine groups may be used, but other amine groups may be used. Amino groups; N-methylamino, N, N-dimethylamino, N-ethylamino, N, N-diethylamino, N, N-methylethylamino, N- Aliphatic amine groups such as propylamino, N, N-dipropylamino, N-isopropylamino, N, N-diisopropylamino; N-phenylamino, N, N- Aromatic amino groups such as diphenylamino; fluorenylamino groups such as formamidine, acetamido, decylamino, benzamidine, and chloroacetamido; benzyloxycarbonylamino, third Alkoxycarbonylamino groups such as butoxycarbonylamino.

作為上述胺基,較佳為採用不具有酸性度較高之質子,且分子量較小,具有可提高茀比率之傾向之N,N-二甲基胺基、N-乙基胺基、或N,N-二乙基胺基,更佳為採用N,N-二甲基胺基。 As the amine group, N, N-dimethylamino group, N-ethylamino group, or N which does not have a proton having a high acidity, has a small molecular weight, and has a tendency to increase the fluorene ratio is preferably used. N-diethylamino group, more preferably N, N-dimethylamino group.

又,R4~R9中,作為「可具有取代基之碳數1~10之乙烯基或乙炔基」,例如可採用以下之乙烯基及乙炔基,但亦可採用該等以外之乙烯基等。乙烯基、2-甲基乙烯基、2,2-二甲基乙烯基、2-苯基乙烯基、2-乙醯基乙烯基、乙炔基、甲基乙炔基、第三丁基乙炔基、苯基乙炔基、乙醯基乙炔基、三甲基矽烷基乙炔基。 In R 4 to R 9 , as the "vinyl or ethynyl group having 1 to 10 carbon atoms which may have a substituent", for example, the following vinyl groups and ethynyl groups may be used, but other vinyl groups may also be used. Wait. Vinyl, 2-methylvinyl, 2,2-dimethylvinyl, 2-phenylvinyl, 2-ethenylvinyl, ethynyl, methylethynyl, tert-butylethynyl, Phenylethynyl, ethenylethynyl, trimethylsilylethynyl.

上述乙烯基及上述乙炔基之碳數較佳為4以下。若為該範圍內, 則有茀環彼此之位阻難以產生,而可獲得源自茀環之所需之光學特性之傾向。又,由於茀環之共軛系變長,而變得容易獲得更強之反波長色散性。 The number of carbon atoms of the vinyl group and the ethynyl group is preferably 4 or less. If it is within this range, However, the steric hindrance of the fluorene rings is difficult to be generated, and the desired optical characteristics derived from the fluorene rings tend to be obtained. In addition, as the conjugation system of the cymbal ring becomes longer, it becomes easier to obtain stronger inverse wavelength dispersion.

又,R4~R9中,作為「具有取代基之硫原子」,例如可採用以下之含硫基,但亦可採用該等以外之含硫基。磺基;甲磺醯基、乙磺醯基、丙磺醯基、異丙基磺醯基等烷基磺醯基;苯基磺醯基、對甲苯基磺醯基等芳基磺醯基;甲基亞磺醯基、乙基亞磺醯基、丙基亞磺醯基、異丙基亞磺醯基等烷基亞磺醯基;苯基亞磺醯基、對甲苯基亞磺醯基等芳基亞磺醯基;甲硫基、乙硫基等烷硫基;苯硫基、對甲苯硫基等芳硫基;甲氧基磺醯基、乙氧基磺醯基等烷氧基磺醯基;苯氧基磺醯基等芳氧基磺醯基;胺基磺醯基;N-甲基胺基磺醯基、N-乙基胺基磺醯基、N-第三丁基胺基磺醯基、N,N-二甲基胺基磺醯基、N,N-二乙基胺基磺醯基等烷基磺醯基;N-苯基胺基磺醯基、N,N-二苯基胺基磺醯基等芳基胺基磺醯基。再者,磺基亦可與鋰、鈉、鉀、鎂、銨等形成鹽。 In R 4 to R 9 , as the "sulfur atom having a substituent", for example, the following sulfur-containing groups can be used, but other sulfur-containing groups can also be used. Sulfo groups; alkylsulfonyl groups such as methylsulfonyl, ethylsulfonyl, propylsulfonyl, isopropylsulfonyl; arylsulfonyl such as phenylsulfonyl, p-tolylsulfonyl; Alkylsulfinyl sulfenyl groups such as methylsulfinyl sulfenyl, ethylsulfinyl sulfinyl, propylsulfinyl sulfinyl, isopropylsulfinyl sulfinyl; phenylsulfinyl sulfinyl, p-tolylsulfinyl sulfinyl Isoarylsulfinyl groups; alkylthio groups such as methylthio and ethylthio; arylthio groups such as phenylthio and p-tolylthio; alkoxy groups such as methoxysulfonyl and ethoxysulfonyl Sulfonyl; aryloxysulfonyl such as phenoxysulfonyl; aminesulfonyl; N-methylaminosulfonyl, N-ethylaminosulfonyl, N-third butyl Alkylsulfonyl groups such as aminosulfonyl, N, N-dimethylaminosulfonyl, N, N-diethylaminosulfonyl; N-phenylaminosulfonyl, N, Arylaminosulfonyl groups such as N-diphenylaminosulfonyl. Furthermore, the sulfo group may form a salt with lithium, sodium, potassium, magnesium, ammonium, and the like.

上述含硫基中,較佳為採用不具有酸性度較高之質子,且分子量較小,可提高茀比率之甲基亞磺醯基、乙基亞磺醯基、或苯基亞磺醯基,更佳為採用甲基亞磺醯基。 Among the above sulfur-containing groups, methylsulfinyl, ethylsulfinyl, or phenylsulfinyl, which does not have a high acidity proton and has a small molecular weight and can increase the ratio of amidine, is preferred. It is more preferable to use methylsulfinamilide.

又,R4~R9中,作為「具有取代基之矽原子」,例如可採用以下之矽烷基。三甲基矽烷基、三乙基矽烷基等三烷基矽烷基;三甲氧基矽烷基、三乙氧基矽烷基等三烷氧基矽烷基。該等中,較佳為可穩定操作之三烷基矽烷基。 Among the R 4 to R 9 , as the "silicon atom having a substituent", for example, the following silyl groups can be used. Trialkylsilyl groups such as trimethylsilyl group and triethylsilyl group; trialkoxysilyl groups such as trimethoxysilyl group and triethoxysilyl group. Among these, a trialkylsilyl group which can be stably handled is preferable.

又,R4~R9中,作為「鹵素原子」,可採用氟原子、氯原子、溴原子、碘原子。該等中,較佳為導入相對容易,且因具有吸電子性而具有提高茀9位之反應性之傾向之氟原子、氯原子、或溴原子,更佳為採用氯原子或溴原子。 In R 4 to R 9 , as the "halogen atom", a fluorine atom, a chlorine atom, a bromine atom, and an iodine atom can be used. Among these, a fluorine atom, a chlorine atom, or a bromine atom, which is relatively easy to introduce and has a tendency to increase the reactivity at the 茀 -9 position due to its electron-withdrawing property, is more preferably a chlorine atom or a bromine atom.

又,R4~R9中所鄰接之2個基亦可相互鍵結而形成環。作為其具體例,可列舉:具有下述[A]群所例示之骨架之取代茀結構。 In addition, two adjacent groups in R 4 to R 9 may be bonded to each other to form a ring. Specific examples thereof include a substituted fluorene structure having a skeleton exemplified by the following [A] group.

[A] [A]

如上述般,將R4~R9設為如上述之特定之原子或取代基,藉此有主鏈與茀環之間、或茀環彼此之間之位阻較少,而可獲得源自茀環之所需之光學特性之傾向。 As described above, by setting R 4 to R 9 as the specific atom or substituent as described above, there is less steric hindrance between the main chain and the fluorene ring, or between the fluorene ring and each other. Tendency of the required optical characteristics of the ring.

上述寡聚茀結構單元所包含之茀環較佳為R4~R9全部為氫原子之構成、或者R4及/或R9為選自由鹵素原子、醯基、硝基、氰基、及磺基所組成之群中之任一者,且R5~R8為氫原子之構成中之任一者。於具有前者之構成之情形時,可自工業上亦廉價之茀衍生包含上述寡聚茀結構單元之化合物。又,於具有後者之構成之情形時,茀9位之反應性提高,因此有於包含上述寡聚茀結構單元之化合物之合成過程中,可適應各種衍生反應之傾向。上述茀環更佳為R4~R9全部為氫原子之構成、或者R4及/或R9為選自由氟原子、氯原子、溴原子、及硝基所組成之群中之任一者且R5~R8為氫原子之構成中之任一者,尤佳為R4~R9全部為氫原子之構成。藉由採用上述構成而可提高茀比率,且亦有茀環彼此之位阻難以產生,而可獲得源自茀環之所需之光學特性之傾向。 The fluorene ring contained in the oligomeric fluorene structure unit is preferably a structure in which all of R 4 to R 9 are hydrogen atoms, or R 4 and / or R 9 is selected from a halogen atom, a fluorenyl group, a nitro group, a cyano group, and Any of the groups consisting of a sulfo group, and R 5 to R 8 are any of the constitution of a hydrogen atom. In the case of the former constitution, a compound containing the above-mentioned oligomeric fluorene structural unit can be derived from industrially inexpensive fluorene. Moreover, in the case of having the latter constitution, the reactivity of the 茀 -position 9 is improved. Therefore, in the synthesis process of the compound containing the oligomeric fluorene structure unit, it is possible to adapt to various derivatization reactions. The fluorene ring is more preferably a structure in which all of R 4 to R 9 are hydrogen atoms, or R 4 and / or R 9 is any one selected from the group consisting of a fluorine atom, a chlorine atom, a bromine atom, and a nitro group. In addition, R 5 to R 8 are each a structure of a hydrogen atom, and particularly preferably, R 4 to R 9 are all a structure of a hydrogen atom. By adopting the above-mentioned configuration, the erbium ratio can be increased, and the steric hindrance of the erbium rings is difficult to occur, so that the optical characteristics required from the erbium rings can be obtained.

上述通式(1)及通式(2)所表示之2價之寡聚茀結構單元中,作為較佳之結構,具體而言,可列舉:具有下述[B]群所例示之骨架之結構。 Among the divalent oligomeric fluorene structural units represented by the general formula (1) and general formula (2), as a preferable structure, specifically, a structure having a skeleton exemplified by the following group [B] .

[B]群 [B] group

[化22] [Chemical 22]

本發明之寡聚茀結構單元與源自先前常用之9,9-雙[4-(2-羥基乙氧基)苯基]茀之結構單元(下述結構式(9))或源自9,9-雙(4-羥基-3-甲基苯基)茀之結構單元(下述結構式(10))進行比較,具有如下之特徵。 The oligomeric fluorene structural unit of the present invention and the structural unit derived from the commonly used 9,9-bis [4- (2-hydroxyethoxy) phenyl] fluorene (the following structural formula (9)) or derived from 9 The structural units of 9-bis (4-hydroxy-3-methylphenyl) fluorene (the following structural formula (10)) are compared and have the following characteristics.

‧先前被導入聚合物之主鏈之苯環等芳香族成分未被導入聚合物之主鏈,因此可降低光彈性係數。 ‧ Aromatic components such as benzene rings that were previously introduced into the main chain of the polymer have not been introduced into the main chain of the polymer, so the photoelastic coefficient can be reduced.

‧被導入主鏈之上述芳香族成分顯現波長越短,雙折射變得越大之正波長色散性,因此先前源自側鏈之茀環之反波長色散性被抵消,從而作為樹脂整體之反波長色散性降低。相對於此,芳香族成分未被導入主鏈,藉此可更強地顯現反波長色散性。 ‧The shorter the above-mentioned aromatic component introduced into the main chain is, the shorter the wavelength of positive light and the greater the birefringence is, the greater the positive wavelength dispersion. Therefore, the anti-wavelength dispersion of the ring from the side chain previously canceled out, so as the overall anti- Reduced wavelength dispersion. On the other hand, the aromatic component is not introduced into the main chain, whereby the inverse wavelength dispersion property can be more strongly exhibited.

‧藉由將兩個茀環導入一分子中而可賦予較高之耐熱性。 ‧ High heat resistance can be imparted by introducing two fluorene rings into one molecule.

‧因主鏈由柔軟之伸烷基鏈構成,故而可向樹脂賦予柔軟性或熔融加工性。 ‧ Since the main chain is composed of a soft alkylene chain, it can impart softness or melt processability to the resin.

本發明之樹脂含有包含碳酸酯鍵及酯鍵中之至少1種鍵結基、與上述寡聚茀結構單元之樹脂。作為具有上述鍵結基之樹脂的聚碳酸酯、聚酯及聚酯碳酸酯於耐熱性、機械特性、熔融加工性方面優異。又,具有如下優點:藉由與其他單體進行共聚合,可將上述寡聚茀結構單元相對容易地導入至樹脂中,且容易將樹脂中之寡聚茀結構單元之比率控制為所需之範圍。 The resin of the present invention contains a resin containing at least one of a carbonate bond and an ester bond and a oligomeric fluorene structural unit. Polycarbonates, polyesters, and polyester carbonates which are resins having the above-mentioned bonding group are excellent in heat resistance, mechanical properties, and melt processability. In addition, it has the advantages that by copolymerizing with other monomers, the above oligomeric fluorene structural unit can be relatively easily introduced into the resin, and the ratio of the oligomeric fluorene structural unit in the resin can be easily controlled as required range.

作為將上述寡聚茀結構單元導入至樹脂中之方法,例如可列舉:使具有上述寡聚茀結構單元之二醇或二酯、與其他二醇或二酯進行共聚合之方法。具體而言,藉由以二醇與下述通式(11)所表示之碳酸二酯之組合進行聚合,可獲得聚碳酸酯。又,藉由以二醇與二酯之組合進行聚合,可獲得聚酯。又,藉由以二醇與二酯與碳酸二酯之組合進行聚合,可獲得聚酯碳酸酯。 Examples of the method for introducing the oligomeric fluorene structural unit into the resin include a method of copolymerizing a diol or diester having the oligomeric fluorene structural unit and another diol or diester. Specifically, a polycarbonate can be obtained by polymerizing a combination of a diol and a carbonic acid diester represented by the following general formula (11). In addition, by polymerizing with a combination of a diol and a diester, a polyester can be obtained. In addition, polyester carbonate can be obtained by polymerizing a combination of a diol, a diester, and a carbonic acid diester.

[化24] [Chemical 24]

上述通式(11)中,A1及A2為分別可具有取代基之碳數1~18之脂肪族烴基、或可具有取代基之芳香族烴基,A1與A2可相同亦可不同。 In the general formula (11), A 1 and A 2 are each an aliphatic hydrocarbon group having 1 to 18 carbon atoms which may have a substituent, or an aromatic hydrocarbon group which may have a substituent. A 1 and A 2 may be the same or different. .

作為具有上述寡聚茀結構單元之單體,例如可列舉:下述通式(12)所表示之特定之二醇或下述通式(13)所表示之特定之二酯。 Examples of the monomer having the oligomeric fluorene structure unit include a specific diol represented by the following general formula (12) or a specific diester represented by the following general formula (13).

上述通式(12)及通式(13)中,R1~R3分別獨立為直接鍵、可具有取代基之碳數1~4之伸烷基。 In the general formula (12) and the general formula (13), R 1 to R 3 are each independently a direct bond and an alkylene group having 1 to 4 carbon atoms which may have a substituent.

R4~R9分別獨立為氫原子、可具有取代基之碳數1~10之烷基、可具有取代基之碳數4~10之芳基、可具有取代基之碳數1~10之醯基、可具有取代基之碳數1~10之醯氧基、可具有取代基之碳數1~10之烷氧基、可具有取代基之碳數1~10之芳氧基、可具有取代基之胺基、可具有取代基之碳數1~10之乙烯基、可具有取代基之碳數1~10之乙炔基、具有取代基之硫原子、具有取代基之矽原子、鹵素原子、硝基、或氰基。 R 4 to R 9 are each independently a hydrogen atom, an alkyl group having 1 to 10 carbons that may have a substituent, an aryl group having 4 to 10 carbons that may have a substituent, and 1 to 10 carbons that may have a substituent Fluorenyl group, fluorenyloxy group having 1 to 10 carbon atoms which may have a substituent, alkoxyl group having 1 to 10 carbon atoms which may have a substituent, aryloxy group having 1 to 10 carbon atoms which may have a substituent, may have Substituent amino group, vinyl group having 1 to 10 carbon atoms which may have a substituent, ethynyl group having 1 to 10 carbon atoms which may have a substituent, sulfur atom having a substituent, silicon atom having a substituent, halogen atom , Nitro, or cyano.

A3及A4為氫原子、或分別可具有取代基之碳數1~18之脂肪族烴 基、或可具有取代基之芳香族烴基,A3與A4可相同亦可不同。 A 3 and A 4 are each a hydrogen atom or an aliphatic hydrocarbon group having 1 to 18 carbon atoms which may have a substituent, or an aromatic hydrocarbon group which may have a substituent. A 3 and A 4 may be the same or different.

作為具有上述2價之寡聚茀結構單元之上述單體,較佳為使用上述通式(13)所表示之特定之二酯。上述特定之二酯之熱穩定性較上述通式(12)所表示之特定之二醇相對良好,又有聚合物中之茀環向較佳之方向配向,而顯現更強之反波長色散性之傾向。 As said monomer which has the said divalent oligomeric fluorene structure unit, it is preferable to use the specific diester represented by the said General formula (13). The thermal stability of the specific diester is relatively better than the specific diol represented by the general formula (12), and the fluorene ring in the polymer is aligned in a better direction, which shows a stronger anti-wavelength dispersion property. tendency.

另一方面,若將聚碳酸酯與聚酯進行比較,則藉由二醇與碳酸二酯之聚合而獲得之聚碳酸酯有耐熱性與機械特性之平衡性良好之傾向。因此,作為本發明之樹脂,尤佳為將具有寡聚茀結構單元之上述特定之二酯導入聚碳酸酯之結構中而成之聚酯碳酸酯。 On the other hand, when a polycarbonate is compared with a polyester, a polycarbonate obtained by polymerization of a diol and a carbonic acid diester tends to have a good balance between heat resistance and mechanical properties. Therefore, the resin of the present invention is particularly preferably a polyester carbonate obtained by introducing the above-mentioned specific diester having an oligomeric fluorene structural unit into the structure of a polycarbonate.

於上述通式(13)之A3與A4為氫原子、或者甲基或乙基等脂肪族烴基之情形時,有於通常所使用之聚碳酸酯之聚合條件下難以引起聚合反應之情況。因此,上述通式(13)之A3與A4較佳為芳香族烴基。 When A 3 and A 4 in the general formula (13) are a hydrogen atom or an aliphatic hydrocarbon group such as a methyl group or an ethyl group, it may be difficult to cause a polymerization reaction under the polymerization conditions of a polycarbonate generally used. . Therefore, A 3 and A 4 in the general formula (13) are preferably aromatic hydrocarbon groups.

又,於亦使用上述通式(11)所表示之碳酸二酯而進行聚合反應之情形時,若為上述通式(11)之A1、A2及上述通式(13)之A3、A4全部相同之結構,則於聚合反應中脫離之成分相同,而容易回收而進行再利用。又,就聚合反應性與再利用中之有用性之觀點而言,A1~A4尤佳為苯基。再者,於A1~A4為苯基之情形時,於聚合反應中脫離之成分為苯酚。 And when, also in the above general formula (11) represents the case where the carbonic acid diester to perform the polymerization reaction, when the general formula (11) of the A 1, A A 2, and the general formula (13) of 3, All of A 4 have the same structure, and the components detached during the polymerization reaction are the same, so they can be easily recovered and reused. From the viewpoint of polymerization reactivity and usefulness in recycling, A 1 to A 4 are particularly preferably a phenyl group. When A 1 to A 4 are phenyl, the component to be removed during the polymerization reaction is phenol.

於本發明之樹脂中,為了獲得下述之正折射率各向異性與充分之反波長色散性,而必須將上述樹脂中之上述寡聚茀結構單元之比率調節為特定之範圍。作為將上述樹脂中之上述寡聚茀結構單元之比率進行調節之方法,例如可列舉:使具有上述寡聚茀結構單元之單體與其他單體進行共聚合之方法、或將具有上述寡聚茀結構單元之樹脂與其他樹脂進行摻合之方法。就可精確地控制寡聚茀結構單元之含量,且可獲得較高之透明性,膜之面整體可獲得均勻之特性之方面而言,較佳為使具有上述寡聚茀結構單元之單體與其他單體進行共聚合之方 法。 In the resin of the present invention, in order to obtain the following positive refractive index anisotropy and sufficient inverse wavelength dispersion, it is necessary to adjust the ratio of the oligomeric fluorene structural unit in the resin to a specific range. Examples of the method for adjusting the ratio of the oligomeric fluorene structural unit in the resin include a method of copolymerizing a monomer having the oligomeric fluorene structural unit and other monomers, or a method having the oligomerization A method of blending a resin of a structural unit with another resin. In terms of accurately controlling the content of the oligomeric fluorene structure unit, and obtaining high transparency and uniformity of the entire surface of the film, it is preferable to make the monomer having the oligomeric fluorene structure unit as described above. Copolymerization with other monomers law.

關於上述樹脂中之上述寡聚茀結構單元之含量,相對於樹脂整體,較佳為1質量%以上且40質量%以下,更佳為10質量%以上且35質量%以下,進而較佳為15質量%以上且32質量%以下,尤佳為20質量%以上且30質量%以下。於寡聚茀結構單元之含量過多之情形時,有光彈性係數或可靠性變差,或無法藉由延伸而獲得較高之雙折射之虞。又,因寡聚茀結構單元佔樹脂中之比例變高,故而分子設計之範圍變窄,而於要求樹脂之改質時難以改良。另一方面,即便假設由於非常少量之寡聚茀結構單元而可獲得所需之反波長色散性,但於該情形時,根據寡聚茀之含量之略微不均而光學特性敏感地變化,因此難以以各種特性處於一定範圍內之方式進行製造。 The content of the oligomeric fluorene structure unit in the resin is preferably 1% by mass or more and 40% by mass or less, more preferably 10% by mass or more and 35% by mass or less, and more preferably 15% by mass relative to the entire resin. Mass% or more and 32 mass% or less, particularly preferably 20 mass% or more and 30 mass% or less. When the content of the oligomeric fluorene structure unit is too much, there is a possibility that the photoelastic coefficient or reliability is deteriorated, or a high birefringence cannot be obtained by extension. In addition, since the ratio of the oligomeric fluorene structure unit to the resin becomes higher, the range of the molecular design becomes narrower, and it is difficult to improve when the modification of the resin is required. On the other hand, even if it is assumed that the required inverse wavelength dispersion property can be obtained due to a very small amount of oligomeric fluorene structural units, in this case, the optical characteristics are sensitively changed depending on the slight unevenness of the content of oligomeric fluorene. It is difficult to manufacture in such a manner that various characteristics are within a certain range.

本發明之樹脂較佳為使具有上述寡聚茀結構單元之單體與其他單體進行共聚合而獲得。作為進行共聚合之其他單體,例如可列舉:二羥基化合物或二酯化合物。 The resin of the present invention is preferably obtained by copolymerizing a monomer having the oligomeric fluorene structure unit and other monomers. Examples of other monomers to be copolymerized include dihydroxy compounds and diester compounds.

本發明之樹脂就光學特性、機械特性、耐熱性等觀點而言,較佳為含有下述通式(3)之結構單元作為共聚合成分。 From the viewpoints of optical characteristics, mechanical characteristics, and heat resistance, the resin of the present invention preferably contains a structural unit of the following general formula (3) as a copolymerization component.

作為可導入上述通式(3)所表示之結構單元之二羥基化合物,可列舉:處於立體異構物之關係之異山梨酯(ISB)、異二縮甘露醇、異艾杜糖醇。該等可單獨使用1種,或組合2種以上使用。該等中,就獲取及聚合反應性之觀點而言,最佳為使用ISB。 Examples of the dihydroxy compound into which the structural unit represented by the general formula (3) can be introduced include isosorbide (ISB), isomannide, and isoiditol in a stereoisomeric relationship. These can be used individually by 1 type or in combination of 2 or more types. Among these, from the viewpoint of acquisition and polymerization reactivity, it is most preferable to use ISB.

關於上述通式(3)所表示之結構單元,較佳為於上述樹脂中含有5 質量%以上且70質量%以下,進而較佳為含有10質量%以上且65質量%以下,尤佳為含有20質量%以上且60質量%以下。若上述通式(3)所表示之結構單元之含量過少,則有耐熱性變得不充分之虞。另一方面,若上述通式(3)所表示之結構單元之含量過多,則耐熱性變得過高,而機械特性或熔融加工性變差。又,上述通式(3)所表示之結構單元為吸濕性較高之結構,因此於含量過多之情形時,有樹脂之吸水率變高,而於高濕度環境下引起尺寸變形之擔憂。 Regarding the structural unit represented by the general formula (3), it is preferable that 5 is contained in the resin. It is preferably at least 10% by mass and not more than 70% by mass, more preferably at least 10% by mass and not more than 65% by mass, and more preferably at least 20% by mass and not more than 60% by mass. When the content of the structural unit represented by the general formula (3) is too small, heat resistance may be insufficient. On the other hand, if the content of the structural unit represented by the general formula (3) is too large, the heat resistance becomes too high, and the mechanical properties or melt processability become poor. In addition, the structural unit represented by the general formula (3) is a structure having high hygroscopicity. Therefore, when the content is too large, the water absorption of the resin may increase, and there may be a fear of dimensional deformation in a high humidity environment.

又,本發明之樹脂亦可與上述通式(3)之結構單元組合,或者不使用上述通式(3)之結構而進而包含另外之結構單元。(以下,有將該結構單元稱為「其他結構單元」之情況)。 In addition, the resin of the present invention may be combined with the structural unit of the general formula (3), or may include another structural unit without using the structure of the general formula (3). (Hereinafter, this structural unit may be referred to as "other structural unit.")

作為上述之其他結構單元,尤佳為具有不含有芳香族成分之下述通式(4)~(8)所表示之結構單元。 As the other structural unit described above, a structural unit represented by the following general formulae (4) to (8) which does not contain an aromatic component is particularly preferred.

上述通式(4)中,R1-10表示可具有取代基之碳數2~20之伸烷基。 In the general formula (4), R 1-10 represents an alkylene group having 2 to 20 carbon atoms which may have a substituent.

作為可導入上述通式(4)之結構單元之二羥基化合物,例如可採用以下之二羥基化合物。乙二醇、1,3-丙二醇、1,2-丙二醇、1,4-丁二醇、1,3-丁二醇、1,2-丁二醇、1,5-庚二醇、1,6-己二醇、1,9-壬二醇、1,10-癸二醇、1,12-十二烷二醇等直鏈脂肪族烴之二羥基化合物;新戊二醇、己二醇等側鏈脂肪族烴之二羥基化合物。 As a dihydroxy compound which can introduce the structural unit of the said General formula (4), the following dihydroxy compound can be used, for example. Ethylene glycol, 1,3-propanediol, 1,2-propanediol, 1,4-butanediol, 1,3-butanediol, 1,2-butanediol, 1,5-heptanediol, 1, Dihydroxy compounds of linear aliphatic hydrocarbons, such as 6-hexanediol, 1,9-nonanediol, 1,10-decanediol, 1,12-dodecanediol; neopentyl glycol, hexanediol Dihydroxy compounds of iso-chain aliphatic hydrocarbons.

上述通式(5)中,R1-11表示可具有取代基之碳數4~20之環伸烷基。 In the general formula (5), R 1-11 represents a cycloalkylene group having 4 to 20 carbon atoms which may have a substituent.

作為可導入上述通式(5)之結構單元之二羥基化合物,例如可採用以下之二羥基化合物。1,2-環己二醇、1,4-環己二醇、1,3-金剛烷二醇、氫化雙酚A、2,2,4,4-四甲基-1,3-環丁二醇等所例示之作為脂環式烴之二級醇及三級醇之二羥基化合物。 As a dihydroxy compound which can introduce the structural unit of the said General formula (5), the following dihydroxy compound can be used, for example. 1,2-cyclohexanediol, 1,4-cyclohexanediol, 1,3-adamantanediol, hydrogenated bisphenol A, 2,2,4,4-tetramethyl-1,3-cyclobutane Diols such as diols and dihydric compounds of alicyclic hydrocarbons are exemplified.

上述通式(6)中,R1-12表示可具有取代基之碳數4~20之環伸烷基。 In the general formula (6), R 1-12 represents a cycloalkylene group having 4 to 20 carbon atoms which may have a substituent.

作為可導入上述通式(6)之結構單元之二羥基化合物,例如可採用以下之二羥基化合物。1,2-環己烷二甲醇、1,3-環己烷二甲醇、1,4-環己烷二甲醇、三環癸烷二甲醇、五環十五烷二甲醇、2,6-十氫萘二甲醇、1,5-十氫萘二甲醇、2,3-十氫萘二甲醇、2,3-降烷二甲醇、2,5-降烷二甲醇、1,3-金剛烷二甲醇、檸檬烯等自萜烯化合物衍生之二羥基化合物等所例示之作為脂環式烴之一級醇之二羥基化合物。 As a dihydroxy compound which can introduce the structural unit of the said General formula (6), the following dihydroxy compound can be used, for example. 1,2-cyclohexanedimethanol, 1,3-cyclohexanedimethanol, 1,4-cyclohexanedimethanol, tricyclodecanedimethanol, pentacyclopentadecanedimethanol, 2,6-ten Hydronaphthalene dimethanol, 1,5-decahydronaphthalene dimethanol, 2,3-decahydronaphthalene dimethanol, 2,3-norhydronaphthalene Alkanedimethanol, 2,5-nor Dihydroxy compounds such as alkanedimethanol, 1,3-adamantanedimethanol, limonene, and the like, which are dihydroxy compounds derived from terpene compounds, are exemplified as the dihydroxy compounds of alicyclic hydrocarbon primary alcohols.

上述通式(7)中,R1-13表示可具有取代基之碳數2~10之伸烷基,p為1~40之整數。 In the general formula (7), R 1-13 represents an alkylene group having 2 to 10 carbon atoms which may have a substituent, and p is an integer of 1 to 40.

作為可導入上述通式(7)之結構單元之二羥基化合物,例如可採 用以下之二羥基化合物。二乙二醇、三乙二醇、四乙二醇、聚乙二醇、聚丙二醇等氧伸烷基二醇類。 As the dihydroxy compound to which the structural unit of the general formula (7) can be introduced, for example, Use the following dihydroxy compounds. Diethylene glycol, triethylene glycol, tetraethylene glycol, polyethylene glycol, polypropylene glycol and other oxyalkylene glycols.

上述通式(8)中,R1-14表示具有可具有取代基之碳數2~20之縮醛環之基。 In the general formula (8), R 1-14 represents a group having an acetal ring having 2 to 20 carbon atoms which may have a substituent.

作為可導入上述通式(8)之結構單元之二羥基化合物,例如可採用下述結構式(14)所表示之螺二醇或下述結構式(15)所表示之二烷二醇等。 As the dihydroxy compound into which the structural unit of the general formula (8) can be introduced, for example, a spirodiol represented by the following structural formula (14) or two represented by the following structural formula (15) can be used. Alkanediols, etc.

又,除上述之二羥基化合物以外,亦可使用以下所例示之含有芳香族成分之二羥基化合物。2,2-雙(4-羥基苯基)丙烷、2,2-雙(3-甲基-4-羥基苯基)丙烷、2,2-雙(4-羥基-3,5-二甲基苯基)丙烷、2,2-雙(4-羥基-3,5-二乙基苯基)丙烷、2,2-雙(4-羥基-(3-苯基)苯基)丙烷、2,2-雙(4-羥基-(3,5-二苯基)苯基)丙烷、2,2-雙(4-羥基-3,5-二溴苯基)丙烷、雙(4-羥基苯基)甲烷、1,1-雙(4-羥基苯基)乙烷、2,2-雙(4-羥基苯基)丁 烷、2,2-雙(4-羥基苯基)戊烷、1,1-雙(4-羥基苯基)-1-苯基乙烷、雙(4-羥基苯基)二苯甲烷、1,1-雙(4-羥基苯基)-2-乙基己烷、1,1-雙(4-羥基苯基)癸烷、雙(4-羥基-3-硝基苯基)甲烷、3,3-雙(4-羥基苯基)戊烷、1,3-雙(2-(4-羥基苯基)-2-丙基)苯、1,3-雙(2-(4-羥基苯基)-2-丙基)苯、2,2-雙(4-羥基苯基)六氟丙烷、1,1-雙(4-羥基苯基)環己烷、雙(4-羥基苯基)碸、2,4'-二羥基二苯基碸、雙(4-羥基苯基)硫化物、雙(4-羥基-3-甲基苯基)硫化物、雙(4-羥基苯基)二硫化物、4,4'-二羥基二苯醚、4,4'-二羥基-3,3'-二氯二苯醚等芳香族雙酚化合物;2,2-雙(4-(2-羥基乙氧基)苯基)丙烷、2,2-雙(4-(2-羥基丙氧基)苯基)丙烷、1,3-雙(2-羥基乙氧基)苯、4,4'-雙(2-羥基乙氧基)聯苯、雙(4-(2-羥基乙氧基)苯基)碸等具有鍵結於芳香族基之醚基之二羥基化合物;9,9-雙(4-(2-羥基乙氧基)苯基)茀、9,9-雙(4-羥基苯基)茀、9,9-雙(4-羥基-3-甲基苯基)茀、9,9-雙(4-(2-羥基丙氧基)苯基)茀、9,9-雙(4-(2-羥基乙氧基)-3-甲基苯基)茀、9,9-雙(4-(2-羥基丙氧基)-3-甲基苯基)茀、9,9-雙(4-(2-羥基乙氧基)-3-異丙基苯基)茀、9,9-雙(4-(2-羥基乙氧基)-3-異丁基苯基)茀、9,9-雙(4-(2-羥基乙氧基)-3-第三丁基苯基)茀、9,9-雙(4-(2-羥基乙氧基)-3-環己基苯基)茀、9,9-雙(4-(2-羥基乙氧基)-3-苯基苯基)茀、9,9-雙(4-(2-羥基乙氧基)-3,5-二甲基苯基)茀、9,9-雙(4-(2-羥基乙氧基)-3-第三丁基-6-甲基苯基)茀、9,9-雙(4-(3-羥基-2,2-二甲基丙氧基)苯基)茀等具有茀環之二羥基化合物。 In addition to the dihydroxy compounds described above, dihydroxy compounds containing an aromatic component as exemplified below may be used. 2,2-bis (4-hydroxyphenyl) propane, 2,2-bis (3-methyl-4-hydroxyphenyl) propane, 2,2-bis (4-hydroxy-3,5-dimethyl Phenyl) propane, 2,2-bis (4-hydroxy-3,5-diethylphenyl) propane, 2,2-bis (4-hydroxy- (3-phenyl) phenyl) propane, 2, 2-bis (4-hydroxy- (3,5-diphenyl) phenyl) propane, 2,2-bis (4-hydroxy-3,5-dibromophenyl) propane, bis (4-hydroxyphenyl ) Methane, 1,1-bis (4-hydroxyphenyl) ethane, 2,2-bis (4-hydroxyphenyl) butane Alkane, 2,2-bis (4-hydroxyphenyl) pentane, 1,1-bis (4-hydroxyphenyl) -1-phenylethane, bis (4-hydroxyphenyl) diphenylmethane, 1 , 1-bis (4-hydroxyphenyl) -2-ethylhexane, 1,1-bis (4-hydroxyphenyl) decane, bis (4-hydroxy-3-nitrophenyl) methane, 3 1,3-bis (4-hydroxyphenyl) pentane, 1,3-bis (2- (4-hydroxyphenyl) -2-propyl) benzene, 1,3-bis (2- (4-hydroxybenzene ) -2-propyl) benzene, 2,2-bis (4-hydroxyphenyl) hexafluoropropane, 1,1-bis (4-hydroxyphenyl) cyclohexane, bis (4-hydroxyphenyl) Samarium, 2,4'-dihydroxydiphenylsulfonium, bis (4-hydroxyphenyl) sulfide, bis (4-hydroxy-3-methylphenyl) sulfide, bis (4-hydroxyphenyl) di Aromatic bisphenol compounds such as sulfides, 4,4'-dihydroxydiphenyl ether, 4,4'-dihydroxy-3,3'-dichlorodiphenyl ether; 2,2-bis (4- (2- Hydroxyethoxy) phenyl) propane, 2,2-bis (4- (2-hydroxypropoxy) phenyl) propane, 1,3-bis (2-hydroxyethoxy) benzene, 4,4 ' -Bis (2-hydroxyethoxy) biphenyl, bis (4- (2-hydroxyethoxy) phenyl) fluorene, and other dihydroxy compounds having ether groups bonded to aromatic groups; 9,9-bis (4- (2-hydroxyethoxy) phenyl) fluorene, 9,9-bis (4-hydroxyphenyl) fluorene, 9,9-bis (4- Methyl-3-methylphenyl) fluorene, 9,9-bis (4- (2-hydroxypropoxy) phenyl) fluorene, 9,9-bis (4- (2-hydroxyethoxy) -3 -Methylphenyl) fluorene, 9,9-bis (4- (2-hydroxypropoxy) -3-methylphenyl) fluorene, 9,9-bis (4- (2-hydroxyethoxy) -3-isopropylphenyl) fluorene, 9,9-bis (4- (2-hydroxyethoxy) -3-isobutylphenyl) fluorene, 9,9-bis (4- (2-hydroxy Ethoxy) -3-third butylphenyl) fluorene, 9,9-bis (4- (2-hydroxyethoxy) -3-cyclohexylphenyl) fluorene, 9,9-bis (4- (2-hydroxyethoxy) -3-phenylphenyl) fluorene, 9,9-bis (4- (2-hydroxyethoxy) -3,5-dimethylphenyl) fluorene, 9,9 -Bis (4- (2-hydroxyethoxy) -3-tert-butyl-6-methylphenyl) fluorene, 9,9-bis (4- (3-hydroxy-2,2-dimethyl) Dihydroxy compounds having a fluorene ring such as propoxy) phenyl) fluorene.

又,作為可用於與具有上述寡聚茀結構單元之單體之共聚合之二酯化合物,例如可採用以下所示之二羧酸等。對苯二甲酸、鄰苯二甲酸、間苯二甲酸、4,4'-二苯基二羧酸、4,4'-二苯醚二羧酸、4,4'-二苯甲酮二羧酸、4,4'-二苯氧基乙烷二羧酸、4,4'-二苯基碸二羧酸、2,6-萘二羧酸等芳香族二羧酸;1,2-環己烷二羧酸、1,3-環己烷二羧酸、1,4-環己烷二羧酸等脂環式二羧酸;丙二酸、琥珀酸、戊二酸、 己二酸、庚二酸、辛二酸、壬二酸、癸二酸等脂肪族二羧酸。再者,該等二羧酸成分可以二羧酸本身為上述聚酯碳酸酯之原料,但視製造法,亦可以甲酯體、苯酯體等二羧酸酯、或二羧酸鹵等二羧酸衍生物為原料。 Moreover, as a diester compound which can be used for copolymerization with the monomer which has the said oligomeric fluorene structure unit, the following dicarboxylic acid etc. can be used, for example. Terephthalic acid, phthalic acid, isophthalic acid, 4,4'-diphenyl dicarboxylic acid, 4,4'-diphenyl ether dicarboxylic acid, 4,4'-benzophenone dicarboxylic acid Acids, 4,4'-diphenoxyethanedicarboxylic acid, 4,4'-diphenylphosphonium dicarboxylic acid, aromatic dicarboxylic acids such as 2,6-naphthalenedicarboxylic acid; 1,2-cyclic Alicyclic dicarboxylic acids such as hexanedicarboxylic acid, 1,3-cyclohexanedicarboxylic acid, 1,4-cyclohexanedicarboxylic acid; malonic acid, succinic acid, glutaric acid, Aliphatic dicarboxylic acids such as adipic acid, pimelic acid, suberic acid, azelaic acid, and sebacic acid. In addition, the dicarboxylic acid component may be a dicarboxylic acid itself as a raw material of the above-mentioned polyester carbonate, but depending on the manufacturing method, it may be a dicarboxylic acid ester such as a methyl ester body or a phenyl ester body, or a dicarboxylic acid halide such as a dicarboxylic acid halide. A carboxylic acid derivative is used as a raw material.

就光學特性之觀點而言,較佳為使用不含有芳香族成分者作為上述所列舉之其他結構單元。若聚合物之主鏈包含芳香族成分,則如上述般抵消茀環之反波長色散性,因此必須增加寡聚茀結構單元之含量,又有光彈性係數亦變差之擔憂。藉由採用不含有芳香族成分之上述其他結構單元,而可防止如下情況,即源自該結構單元,芳香族成分被導入主鏈。 From the viewpoint of optical characteristics, it is preferable to use those that do not contain an aromatic component as the other structural units listed above. If the polymer's main chain contains aromatic components, the inverse wavelength dispersion of the fluorene ring can be offset as described above. Therefore, the content of the oligomeric fluorene structure unit must be increased, and the photoelasticity coefficient may be deteriorated. By using the other structural unit that does not contain an aromatic component, it is possible to prevent the aromatic component from being introduced into the main chain from the structural unit.

另一方面,為了確保光學特性,並且取得與耐熱性或機械特性等之平衡,有向聚合物之主鏈或側鏈導入芳香族成分有效之情形。於該情形時,例如藉由含有芳香族成分之上述其他結構單元,而可向聚合物導入芳香族成分。 On the other hand, in order to ensure optical characteristics and to achieve a balance with heat resistance or mechanical characteristics, it may be effective to introduce an aromatic component into the main chain or side chain of the polymer. In this case, an aromatic component can be introduced into the polymer by, for example, the other structural unit containing the aromatic component.

就取得各種特性之平衡之觀點而言,上述樹脂中之含有芳香族基之結構單元(其中,將上述通式(1)所表示之結構單元及上述通式(2)所表示之結構單元除外)之含量較佳為5質量%以下。 From the viewpoint of achieving a balance of various characteristics, the structural unit containing an aromatic group in the resin (except for the structural unit represented by the general formula (1) and the structural unit represented by the general formula (2) The content of) is preferably 5% by mass or less.

作為具有上述所列舉之其他結構單元之單體,尤佳為採用1,4-環己烷二甲醇、三環癸烷二甲醇、螺二醇、1,4-環己烷二羧酸(及其衍生物)。包含源自該等單體之結構單元之樹脂之光學特性或耐熱性、機械特性等之平衡性優異。 As the monomer having the other structural units listed above, it is particularly preferable to use 1,4-cyclohexanedimethanol, tricyclodecanedimethanol, spirodiol, 1,4-cyclohexanedicarboxylic acid (and Its derivative). The resin containing the structural unit derived from these monomers is excellent in balance of optical characteristics, heat resistance, mechanical characteristics, and the like.

又,於本發明中為尤佳之聚酯碳酸酯之情形時,二酯化合物之聚合反應性相對較低,因此就提高反應效率之觀點而言,較佳為不使用具有寡聚茀結構單元之二酯化合物以外之二酯化合物。 In the case of the polyester carbonate which is particularly preferred in the present invention, the polymerization reactivity of the diester compound is relatively low. Therefore, from the viewpoint of improving the reaction efficiency, it is preferable not to use an oligomeric fluorene structural unit. Diester compounds other than diester compounds.

用以導入其他結構單元之二羥基化合物或二酯化合物亦可視所獲得之樹脂之要求性能,而單獨或組合2種以上使用。樹脂中之其他 結構單元之含量較佳為1質量%以上且60質量%以下,進而較佳為5質量%以上且55質量%以下,尤佳為10質量%以上且50質量%以下。其他結構單元承擔尤其是調整樹脂之耐熱性、或者賦予柔軟性或韌性之作用,因此若含量過少,則有樹脂之機械特性或熔融加工性變差之虞,若含量過多,則有耐熱性或光學特性變差之虞。 Dihydroxy compounds or diester compounds used to introduce other structural units may also be used alone or in combination of two or more depending on the required properties of the obtained resin. Others in resin The content of the structural unit is preferably 1% by mass or more and 60% by mass or less, further preferably 5% by mass or more and 55% by mass or less, and particularly preferably 10% by mass or more and 50% by mass or less. Other structural units are responsible for adjusting the heat resistance of the resin, or imparting flexibility or toughness. Therefore, if the content is too small, the mechanical properties or melt processability of the resin may be deteriorated. If the content is too large, the heat resistance or There is a concern that the optical characteristics may deteriorate.

<本發明之樹脂之製造方法> <The manufacturing method of the resin of this invention>

適合用作本發明之樹脂之聚碳酸酯、聚酯、聚酯碳酸酯可藉由通常使用之聚合方法而製造。即,上述樹脂例如可藉由使用碳醯氯或羧醯鹵之溶液聚合法或界面聚合法、或者不使用溶劑而進行反應之熔融聚合法而進行製造。該等製造方法中,較佳為藉由因不使用溶劑或毒性較高之化合物而可降低環境負荷,又生產性亦優異之熔融聚合法而進行製造。 Polycarbonates, polyesters, and polyester carbonates suitable for use as the resin of the present invention can be produced by a commonly used polymerization method. That is, the resin can be produced, for example, by a solution polymerization method or an interfacial polymerization method using carbochlorine or carboxylic acid halide, or a melt polymerization method in which a reaction is performed without using a solvent. Among these production methods, the production is preferably performed by a melt polymerization method that can reduce the environmental load by not using a solvent or a highly toxic compound and is also excellent in productivity.

又,於聚合中使用溶劑之情形時,因由樹脂中之殘留溶劑引起之塑化效果,樹脂之玻璃轉移溫度會降低,因此於下述延伸步驟中,難以將分子配向控制為固定。又,於二氯甲烷等鹵素系之有機溶劑殘留於樹脂中之情形時,若將使用該樹脂之成形體裝入電子機器等中,則會成為腐蝕之原因。由於藉由熔融聚合法所獲得之樹脂不含有溶劑,故而對加工步驟或製品品質之穩定亦有利。 When a solvent is used for polymerization, the glass transition temperature of the resin is lowered due to the plasticizing effect caused by the residual solvent in the resin. Therefore, it is difficult to control the molecular alignment to be fixed in the following extension step. When a halogen-based organic solvent such as dichloromethane remains in the resin, if a molded body using the resin is incorporated in an electronic device or the like, it may cause corrosion. Since the resin obtained by the melt polymerization method does not contain a solvent, it is also advantageous for the stability of the processing steps or product quality.

於藉由熔融聚合法而製造上述樹脂時,將具有寡聚茀結構單元之單體、其他二醇或二酯之共聚合單體、及聚合觸媒進行混合,於熔融下進行酯交換反應,一面將脫離成分去除至系外一面提高反應率。於聚合之最後階段,於高溫、高真空之條件下進行反應直至目標之分子量。反應結束後,自反應器將熔融狀態之樹脂抽出,而獲得可用於相位差膜等成形品之樹脂原料。 When the resin is produced by a melt polymerization method, a monomer having an oligomeric fluorene structural unit, a copolymerization monomer of another diol or diester, and a polymerization catalyst are mixed, and a transesterification reaction is performed under melting. The reaction rate is improved while removing the detached components to the outside. In the final stage of polymerization, the reaction is performed under high temperature and high vacuum conditions to the target molecular weight. After the reaction is completed, the resin in a molten state is extracted from the reactor to obtain a resin raw material that can be used for a molded product such as a retardation film.

於本發明中,聚碳酸酯或聚酯碳酸酯可將至少含有寡聚茀結構單元之單體、一種以上之二羥基化合物以及碳酸二酯用於原料,使該 等進行聚縮合而獲得。 In the present invention, a polycarbonate or a polyester carbonate may use a monomer containing at least an oligomeric fluorene structural unit, one or more dihydroxy compounds, and a carbonic acid diester as raw materials. Obtained by polycondensation.

作為聚縮合反應所使用之碳酸二酯,通常可列舉上述之通式(11)所表示者。該等碳酸二酯可單獨使用1種,亦可混合2種以上使用。 Examples of the carbonic acid diester used in the polycondensation reaction include those represented by the general formula (11). These carbonic acid diesters may be used alone or in combination of two or more.

上述通式(11)中,A1及A2為分別可具有取代基之碳數1~18之脂肪族烴基、或可具有取代基之芳香族烴基,A1與A2可相同亦可不同。 In the general formula (11), A 1 and A 2 are each an aliphatic hydrocarbon group having 1 to 18 carbon atoms which may have a substituent, or an aromatic hydrocarbon group which may have a substituent. A 1 and A 2 may be the same or different. .

A1及A2較佳為經取代或未經取代之芳香族烴基,更佳為未經取代之芳香族烴基。再者,作為脂肪族烴基之取代基,可列舉:酯基、醚基、羧酸、醯胺基、鹵素原子,作為芳香族烴基之取代基,可列舉:甲基、乙基等烷基。 A 1 and A 2 are preferably a substituted or unsubstituted aromatic hydrocarbon group, and more preferably an unsubstituted aromatic hydrocarbon group. Examples of the substituent of the aliphatic hydrocarbon group include an ester group, an ether group, a carboxylic acid, an amino group, and a halogen atom. Examples of the substituent of the aromatic hydrocarbon group include an alkyl group such as a methyl group and an ethyl group.

作為上述通式(11)所表示之碳酸二酯,例如例示有碳酸二苯酯(DPC)、碳酸二甲苯酯等取代碳酸二苯酯、碳酸二甲酯、碳酸二乙酯及碳酸二第三丁酯等,較佳為碳酸二苯酯、取代碳酸二苯酯,尤佳為碳酸二苯酯。再者,碳酸二酯有含有氯化物離子等雜質之情形,而有抑制聚合反應,或使所獲得之聚碳酸酯之色相變差之情形,因此較佳為使用視需要而藉由蒸餾等進行精製者。 Examples of the carbonic acid diester represented by the general formula (11) include substituted diphenyl carbonates such as diphenyl carbonate (DPC), xylyl carbonate, dimethyl carbonate, diethyl carbonate, and di-third carbonate. Butyl ester and the like are preferably diphenyl carbonate and substituted diphenyl carbonate, and particularly preferably diphenyl carbonate. In addition, the carbonic acid diester may contain impurities such as chloride ions, and may inhibit the polymerization reaction, or may deteriorate the hue of the obtained polycarbonate. Therefore, it is preferred to use carbon dioxide diester by distillation or the like as necessary. Refiner.

聚縮合反應可藉由嚴密地調整用於反應之全部二羥基化合物、與二酯化合物之莫耳比率,而控制反應速度或所獲得之樹脂之分子量。於聚碳酸酯之情形時,較佳為將碳酸二酯相對於全部二羥基化合物之莫耳比率調整為0.90~1.10,更佳為調整為0.96~1.05,尤佳為調整為0.98~1.03。於聚酯之情形時,較佳為將全部二酯化合物相對於全部二羥基化合物之莫耳比率調整為0.70~1.10,更佳為調整為0.80~1.05,尤佳為調整為0.85~1.00。於聚酯碳酸酯之情形時,較 佳為將碳酸二酯與全部二酯化合物之合計量相對於全部二羥基化合物之莫耳比率調整為0.90~1.10,更佳為調整為0.96~1.05,尤佳為調整為0.98~1.03。 The polycondensation reaction can control the reaction speed or the molecular weight of the obtained resin by closely adjusting the molar ratio of all dihydroxy compounds and diester compounds used in the reaction. In the case of polycarbonate, the molar ratio of the carbonic acid diester to the total dihydroxy compound is preferably adjusted to 0.90 to 1.10, more preferably 0.96 to 1.05, and even more preferably 0.98 to 1.03. In the case of polyester, the molar ratio of all diester compounds to all dihydroxy compounds is preferably adjusted to 0.70 to 1.10, more preferably 0.80 to 1.05, and even more preferably 0.85 to 1.00. In the case of polyester carbonate, Preferably, the molar ratio of the total amount of the carbonic acid diester and all diester compounds to all the dihydroxy compounds is adjusted to 0.90 to 1.10, more preferably 0.96 to 1.05, and even more preferably 0.98 to 1.03.

若上述之莫耳比率上下大幅偏離,則變得無法製造所需之分子量之樹脂。又,若上述之莫耳比率變得過小,則有所製造之樹脂之羥基末端增加,而樹脂之熱穩定性變差之情形。又,若上述之莫耳比率變得過大,則有如下可能性:於相同條件下酯交換反應之速度降低,或者所製造之樹脂中之碳酸二酯或二酯化合物之殘留量增加,該殘留低分子成分於製膜時或延伸時揮發,而導致膜之缺陷。 If the above-mentioned Mohr ratio greatly deviates from top to bottom, it becomes impossible to produce a resin having a desired molecular weight. In addition, if the above-mentioned molar ratio becomes too small, the hydroxyl end of the resin produced may increase, and the thermal stability of the resin may deteriorate. In addition, if the above-mentioned molar ratio becomes too large, there is a possibility that the rate of transesterification reaction decreases under the same conditions, or the residual amount of the carbonic acid diester or diester compound in the produced resin increases, and the residual The low-molecular component is volatile during film formation or stretching, which causes defects in the film.

熔融聚合法通常以2個階段以上之多段步驟實施。聚縮合反應可使用1個聚合反應器,依序改變條件而以2個階段以上之步驟實施,亦可使用2個以上之反應器,改變各自之條件而以2個階段以上之步驟實施,就生產效率之觀點而言,係使用2個以上、較佳為3個以上之反應器而實施。聚縮合反應可為批次式、連續式、或批次式與連續式之組合中之任一種,就生產效率與品質之穩定性之觀點而言,較佳為連續式。 The melt polymerization method is usually carried out in a plurality of steps of two or more stages. The polycondensation reaction can be carried out in two steps or more using one polymerization reactor in order to change the conditions, or it can be carried out in two or more steps by changing the respective conditions using two or more reactors. From the viewpoint of production efficiency, it is carried out by using two or more reactors, preferably three or more reactors. The polycondensation reaction may be any of a batch type, a continuous type, or a combination of a batch type and a continuous type. In terms of production efficiency and quality stability, the continuous type is preferred.

聚縮合反應中,重要的是適當控制反應系統內之溫度與壓力之平衡。若溫度、壓力中之任一者過快地變化,則未反應之單體向反應系外餾出。其結果有如下情形:二羥基化合物與二酯化合物之莫耳比率變化,而無法獲得所需之分子量之樹脂。 In the polycondensation reaction, it is important to properly control the temperature and pressure balance in the reaction system. If any one of temperature and pressure changes too quickly, unreacted monomer is distilled out of the reaction system. As a result, the molar ratio of the dihydroxy compound to the diester compound changed, and a resin having a desired molecular weight could not be obtained.

又,聚縮合反應之聚合速度係藉由羥基末端與酯基末端或碳酸酯基末端之平衡而進行控制。因此,尤其是於以連續式進行聚合之情形時,若由於未反應單體之餾出而末端基之平衡變動,則有變得難以將聚合速度控制為固定,而所獲得之樹脂之分子量之變動變大之虞。樹脂之分子量係與熔融黏度相關,因此將所獲得之樹脂進行熔融製膜時,熔融黏度變動,而變得難以將膜之膜厚等品質保持為固定,而導 致膜之品質或生產性之降低。 The polymerization rate of the polycondensation reaction is controlled by the balance between the hydroxyl terminal and the ester terminal or carbonate terminal. Therefore, especially in the case of continuous polymerization, if the balance of the terminal groups changes due to the distillation of unreacted monomers, it becomes difficult to control the polymerization rate to be fixed, and the molecular weight of the obtained resin There is a risk that the changes will become larger. The molecular weight of the resin is related to the melt viscosity. Therefore, when the obtained resin is melt-formed into a film, the melt viscosity changes, and it becomes difficult to maintain the quality of the film thickness, etc. Degradation of film quality or productivity.

進而,若未反應單體餾出,則不僅末端基之平衡變動,亦有樹脂之共聚合組成亦自所需之組成偏離,而對相位差膜之光學品質亦產生影響之虞。於本發明之相位差膜中,下述之相位差之波長色散性係藉由樹脂中之寡聚茀與共聚合成分之比率而進行控制,因此若聚合中比率崩潰,則有如下之虞:變得無法獲得如設計之光學特性,或者於取得長條之膜之情形,根據膜之位置而光學特性變化,而變得無法製造固定品質之偏光板。 Furthermore, if the unreacted monomer is distilled off, not only the balance of the terminal groups changes, but also the copolymerized composition of the resin may deviate from the desired composition, and the optical quality of the retardation film may also be affected. In the retardation film of the present invention, the wavelength dispersion of the following retardation is controlled by the ratio of the oligomeric fluorene and the copolymerized component in the resin. Therefore, if the ratio collapses during polymerization, the following risks may occur: It becomes impossible to obtain the optical characteristics such as design, or in the case of obtaining a long film, the optical characteristics change depending on the position of the film, and it becomes impossible to manufacture a fixed-quality polarizing plate.

具體而言,作為第1階段之反應中之反應條件,可採用以下之條件。即,聚合反應器之內溫之最高溫度係於通常為130℃以上、較佳為150℃以上、更佳為170℃以上且通常為250℃以下、較佳為240℃以下、更佳為230℃以下之範圍內進行設定。又,聚合反應器之壓力係於通常70kPa以下(以下,所謂壓力,表示絕對壓力)、較佳為50kPa以下、更佳為30kPa以下且通常1kPa以上、較佳為3kPa以上、更佳為5kPa以上之範圍內進行設定。又,反應時間係於通常0.1小時以上、較佳為0.5小時以上且通常10小時以下、較佳為5小時以下、更佳為3小時以下之範圍內進行設定。第1階段之反應係一面將所產生之源自二酯化合物之單羥基化合物向反應系外進行蒸餾去除一面實施。例如於使用碳酸二苯酯作為碳酸二酯之情形時,於第1階段之反應中,向反應系外被蒸餾去除之單羥基化合物為苯酚。 Specifically, as the reaction conditions in the reaction in the first stage, the following conditions can be adopted. That is, the maximum internal temperature of the polymerization reactor is usually 130 ° C or higher, preferably 150 ° C or higher, more preferably 170 ° C or higher and usually 250 ° C or lower, preferably 240 ° C or lower, and more preferably 230 ° C. Set within the range below ℃. The pressure of the polymerization reactor is usually 70 kPa or less (hereinafter, the so-called pressure means absolute pressure), preferably 50 kPa or less, more preferably 30 kPa or less, and usually 1 kPa or more, preferably 3 kPa or more, and more preferably 5 kPa or more. Set within the range. The reaction time is set within a range of usually 0.1 hours or more, preferably 0.5 hours or more and usually 10 hours or less, preferably 5 hours or less, and more preferably 3 hours or less. The reaction in the first stage is carried out while distilling off the monohydroxy compound derived from the diester compound generated outside the reaction system. For example, when diphenyl carbonate is used as the carbonic acid diester, in the reaction in the first stage, the monohydroxy compound that is distilled out of the reaction system is phenol.

於第1階段之反應中,使反應壓力變得越低,越可促進聚合反應,但另一方面,未反應單體之餾出變多。為了兼顧未反應單體之餾出之抑制、與利用減壓之反應之促進,有效的是使用具備回流冷卻器之反應器。尤其是於未反應單體較多之反應初期可使用回流冷卻器。 In the reaction in the first stage, the lower the reaction pressure, the more the polymerization reaction can be promoted, but on the other hand, the distillation of unreacted monomers increases. In order to balance the suppression of the distillation of unreacted monomers and the promotion of the reaction using reduced pressure, it is effective to use a reactor equipped with a reflux cooler. In particular, a reflux cooler can be used at the initial stage of the reaction with a large amount of unreacted monomers.

關於第2階段以後之反應,係將反應系統之壓力自第1階段之壓力慢慢地降低,將接下來產生之單羥基化合物向反應系外去除,並且 最終將反應系統之壓力設為5kPa以下、較佳為3kPa以下、更佳為1kPa以下。又,內溫之最高溫度係於通常210℃以上、較佳為220℃以上且通常270℃以下、較佳為260℃以下之範圍內進行設定。又,反應時間係於通常0.1小時以上、較佳為0.5小時以上、更佳為1小時以上且通常10小時以下、較佳為5小時以下、更佳為3小時以下之範圍內進行設定。為了抑制著色或熱劣化以獲得色相或熱穩定性良好之樹脂,較佳為全部反應階段中之內溫之最高溫度為270℃以下、較佳為260℃以下、進而較佳為250℃以下。 For the reactions after the second stage, the pressure of the reaction system is gradually reduced from the pressure of the first stage, and the monohydroxy compound generated next is removed outside the reaction system, and Finally, the pressure of the reaction system is set to 5 kPa or less, preferably 3 kPa or less, and more preferably 1 kPa or less. The maximum internal temperature is set within a range of usually 210 ° C or higher, preferably 220 ° C or higher and usually 270 ° C or lower, preferably 260 ° C or lower. The reaction time is set within a range of usually 0.1 hours or more, preferably 0.5 hours or more, more preferably 1 hour or more and usually 10 hours or less, preferably 5 hours or less, and more preferably 3 hours or less. In order to suppress coloring or thermal degradation to obtain a resin with good hue or thermal stability, it is preferable that the maximum internal temperature in all reaction stages is 270 ° C or lower, preferably 260 ° C or lower, and more preferably 250 ° C or lower.

聚合時可使用之酯交換反應觸媒(以下,有僅稱為觸媒、聚合觸媒之情況)可對反應速度或聚縮合而獲得之樹脂之色調或熱穩定性產生非常大之影響。作為所使用之觸媒,只要為可滿足所製造之樹脂之透明性、色相、耐熱性、熱穩定性、及機械強度者,則無特別限定,可列舉:長週期型週期表中之1族或2族(以下,僅記載為「1族」、「2族」)之金屬化合物、鹼性硼化合物、鹼性磷化合物、鹼性銨化合物、胺系化合物等鹼性化合物。較佳為使用選自由長週期型週期表第2族之金屬及鋰所組成之群中之至少1種之金屬化合物。 Transesterification reaction catalysts (hereinafter, referred to as catalysts and polymerization catalysts) that can be used at the time of polymerization can greatly affect the color tone or thermal stability of the resin obtained by polycondensation. The catalyst used is not particularly limited as long as it satisfies the transparency, hue, heat resistance, thermal stability, and mechanical strength of the manufactured resin. Examples include Group 1 in the long-period periodic table. Or basic compounds such as metal compounds of Group 2 (hereinafter, only "Group 1", "Group 2"), basic boron compounds, basic phosphorus compounds, basic ammonium compounds, and amine compounds. It is preferable to use at least one metal compound selected from the group consisting of metals and lithium of Group 2 of the long-period periodic table.

作為上述之1族金屬化合物,例如可採用以下之化合物,但亦可採用該等以外之1族金屬化合物。例如可列舉:氫氧化鈉、氫氧化鉀、氫氧化鋰、氫氧化銫、碳酸氫鈉、碳酸氫鉀、碳酸氫鋰、碳酸氫銫、碳酸鈉、碳酸鉀、碳酸鋰、碳酸銫、乙酸鈉、乙酸鉀、乙酸鋰、乙酸銫、硬脂酸鈉、硬脂酸鉀、硬脂酸鋰、硬脂酸銫、氫硼化鈉、氫硼化鉀、氫硼化鋰、氫硼化銫、四苯基硼酸鈉、四苯基硼酸鉀、四苯基硼酸鋰、四苯基硼酸銫、苯甲酸鈉、苯甲酸鉀、苯甲酸鋰、苯甲酸銫、磷酸氫二鈉、磷酸氫二鉀、磷酸氫二鋰、磷酸氫二銫、苯基磷酸二鈉、苯基磷酸二鉀、苯基磷酸二鋰、苯基磷酸二銫、鈉、鉀、鋰、銫之醇化物、酚化物、雙酚A之二鈉鹽、二鉀鹽、二鋰鹽、二銫鹽 等。該等中,就聚合活性與所獲得之聚碳酸酯之色相之觀點而言,較佳為使用鋰化合物。 As the above-mentioned Group 1 metal compound, for example, the following compounds can be used, but other Group 1 metal compounds can also be used. Examples include sodium hydroxide, potassium hydroxide, lithium hydroxide, cesium hydroxide, sodium bicarbonate, potassium bicarbonate, lithium bicarbonate, cesium bicarbonate, sodium carbonate, potassium carbonate, lithium carbonate, cesium carbonate, and sodium acetate. , Potassium acetate, lithium acetate, cesium acetate, sodium stearate, potassium stearate, lithium stearate, cesium stearate, sodium borohydride, potassium borohydride, lithium borohydride, cesium borohydride, Sodium tetraphenylborate, potassium tetraphenylborate, lithium tetraphenylborate, cesium tetraphenylborate, sodium benzoate, potassium benzoate, lithium benzoate, cesium benzoate, disodium hydrogen phosphate, dipotassium hydrogen phosphate, phosphoric acid Dilithium hydrogen, dicesium hydrogen phosphate, disodium phenyl phosphate, dipotassium phenyl phosphate, dilithium phenyl phosphate, dicesium phenyl phosphate, sodium, potassium, lithium, alcoholates, phenolates, and bisphenol A of cesium Disodium, dipotassium, dilithium, and dicesium salts Wait. Among these, a lithium compound is preferably used from the viewpoint of polymerization activity and hue of the obtained polycarbonate.

作為上述之2族金屬化合物,例如可採用以下之化合物,但亦可採用該等以外之2族金屬化合物。例如可列舉:氫氧化鈣、氫氧化鋇、氫氧化鎂、氫氧化鍶、碳酸氫鈣、碳酸氫鋇、碳酸氫鎂、碳酸氫鍶、碳酸鈣、碳酸鋇、碳酸鎂、碳酸鍶、乙酸鈣、乙酸鋇、乙酸鎂、乙酸鍶、硬脂酸鈣、硬脂酸鋇、硬脂酸鎂、硬脂酸鍶等。該等中,較佳為使用鎂化合物、鈣化合物、鋇化合物,就聚合活性與所獲得之聚碳酸酯之色相之觀點而言,進而較佳為使用鎂化合物及/或鈣化合物,尤佳為使用鈣化合物。 As the above-mentioned Group 2 metal compound, for example, the following compounds can be used, but Group 2 metal compounds other than these can also be used. Examples include calcium hydroxide, barium hydroxide, magnesium hydroxide, strontium hydroxide, calcium bicarbonate, barium bicarbonate, magnesium bicarbonate, strontium bicarbonate, calcium carbonate, barium carbonate, magnesium carbonate, strontium carbonate, and calcium acetate. , Barium acetate, magnesium acetate, strontium acetate, calcium stearate, barium stearate, magnesium stearate, strontium stearate, etc. Among these, a magnesium compound, a calcium compound, and a barium compound are preferably used. From the viewpoint of polymerization activity and the hue of the obtained polycarbonate, a magnesium compound and / or a calcium compound is more preferably used, particularly preferably Use calcium compounds.

再者,亦可與上述之1族金屬化合物及/或2族金屬化合物一起,輔助性地併用鹼性硼化合物、鹼性磷化合物、鹼性銨化合物、胺系化合物等鹼性化合物,但尤佳為使用選自由長週期型週期表第2族之金屬及鋰所組成之群中之至少1種之金屬化合物。 In addition, basic compounds such as a basic boron compound, a basic phosphorus compound, a basic ammonium compound, and an amine-based compound may be used in combination with the above-mentioned Group 1 metal compound and / or Group 2 metal compound. Preferably, at least one kind of metal compound selected from the group consisting of metals and lithium of Group 2 of the long-period periodic table is used.

作為上述之鹼性磷化合物,例如可採用以下之化合物,但亦可採用該等以外之鹼性磷化合物。例如可列舉:三乙基膦、三-正丙基膦、三異丙基膦、三-正丁基膦、三苯基膦、三丁基膦、或四級鏻鹽等。 As the above-mentioned basic phosphorus compound, for example, the following compounds may be used, but other basic phosphorus compounds may also be used. Examples include triethylphosphine, tri-n-propylphosphine, triisopropylphosphine, tri-n-butylphosphine, triphenylphosphine, tributylphosphine, or a quaternary phosphonium salt.

作為上述之鹼性銨化合物,例如可採用以下之化合物,但亦可採用該等以外之鹼性銨化合物。例如可列舉:四甲基氫氧化銨、四乙基氫氧化銨、四丙基氫氧化銨、四丁基氫氧化銨、N,N,N-三甲基乙醇胺(膽鹼)、三甲基乙基氫氧化銨、三甲基苄基氫氧化銨、三甲基苯基氫氧化銨、三乙基甲基氫氧化銨、三乙基苄基氫氧化銨、三乙基苯基氫氧化銨、三丁基苄基氫氧化銨、三丁基苯基氫氧化銨、四苯基氫氧化銨、苄基三苯基氫氧化銨、甲基三苯基氫氧化銨、丁基三苯基氫氧化銨等。 As the above-mentioned basic ammonium compound, for example, the following compounds can be used, but other basic ammonium compounds can also be used. Examples include: tetramethylammonium hydroxide, tetraethylammonium hydroxide, tetrapropylammonium hydroxide, tetrabutylammonium hydroxide, N, N, N-trimethylethanolamine (choline), trimethyl Ethyl ammonium hydroxide, trimethylbenzyl ammonium hydroxide, trimethylphenyl ammonium hydroxide, triethylmethyl ammonium hydroxide, triethylbenzyl ammonium hydroxide, triethylphenyl ammonium hydroxide , Tributylbenzyl ammonium hydroxide, tributylphenylammonium hydroxide, tetraphenylammonium hydroxide, benzyltriphenylammonium hydroxide, methyltriphenylammonium hydroxide, butyltriphenylhydrogen Ammonium oxide, etc.

作為上述之胺系化合物,例如可採用以下之化合物,但亦可採用該等以外之胺系化合物。例如可列舉:4-胺基吡啶、2-胺基吡啶、N,N-二甲基-4-胺基吡啶、4-二乙基胺基吡啶、2-羥基吡啶、2-甲氧基吡啶、4-甲氧基吡啶、2-二甲基胺基咪唑、2-甲氧基咪唑、咪唑、2-巰基咪唑、2-甲基咪唑、胺基喹啉、胍等。 As the above-mentioned amine-based compound, for example, the following compounds can be used, but other amine-based compounds can also be used. Examples include: 4-aminopyridine, 2-aminopyridine, N, N-dimethyl-4-aminopyridine, 4-diethylaminopyridine, 2-hydroxypyridine, 2-methoxypyridine , 4-methoxypyridine, 2-dimethylaminoimidazole, 2-methoxyimidazole, imidazole, 2-mercaptoimidazole, 2-methylimidazole, aminoquinoline, guanidine, and the like.

關於上述聚合觸媒之使用量,通常聚合所使用之全部二羥基化合物每1mol為0.1μmol~300μmol、較佳為0.5μmol~100μmol。於使用選自由長週期型週期表第2族之金屬及鋰所組成之群中之至少1種之金屬化合物作為上述聚合觸媒之情形時,尤其是使用鎂化合物及/活鈣化合物作為上述聚合觸媒之情形時,使用以金屬量計,上述全部二羥基化合物每1mol為通常0.1μmol以上、較佳為0.3μmol以上、尤佳為0.5μmol以上之上述聚合觸媒。又,上述聚合觸媒之使用量可為30μmol以下,較佳為20μmol以下,尤佳為10μmol以下。 Regarding the amount of the above-mentioned polymerization catalyst, usually all the dihydroxy compounds used in the polymerization are 0.1 μmol to 300 μmol, preferably 0.5 μmol to 100 μmol. When using at least one metal compound selected from the group consisting of metals and lithium of Group 2 of the long-period periodic table as the above-mentioned polymerization catalyst, in particular, a magnesium compound and / or a living calcium compound are used as the above-mentioned polymerization. In the case of a catalyst, the above polymerization catalyst is generally used in an amount of 0.1 mol or more, preferably 0.3 mol or more, and more preferably 0.5 mol or more per 1 mol of all the dihydroxy compounds. In addition, the use amount of the polymerization catalyst may be 30 μmol or less, preferably 20 μmol or less, and particularly preferably 10 μmol or less.

又,於單體使用二酯化合物而製造聚酯或聚酯碳酸酯之情形時,亦可與上述鹼性化合物併用,或者不併用而使用鈦化合物、錫化合物、鍺化合物、銻化合物、鋯化合物、鉛化合物、鋨化合物、鋅化合物、錳化合物等酯交換觸媒。關於該等酯交換觸媒之使用量,相對於反應所使用之全部二羥基化合物1mol,以金屬量計,係於通常1μmol~1mmol之範圍內使用,較佳為5μmol~800μmol之範圍內,尤佳為10μmol~500μmol。 When a polyester or a polyester carbonate is produced by using a diester compound as a monomer, a titanium compound, a tin compound, a germanium compound, an antimony compound, or a zirconium compound may be used in combination with the basic compound described above or in combination. Transesterification catalysts such as lead compounds, osmium compounds, zinc compounds, manganese compounds, etc. Regarding the amount of these transesterification catalysts, it is used in the range of usually 1 μmol to 1 mmol, and preferably in the range of 5 μmol to 800 μmol, based on the amount of metal, relative to 1 mol of all dihydroxy compounds used in the reaction. It is preferably 10 μmol to 500 μmol.

若觸媒量過少,則聚合速度變慢,因此欲獲得所需之分子量之樹脂而不得不提高聚合溫度。因此,所獲得之樹脂之色相變差之可能性變高,又,有未反應之原料於聚合途中揮發從而二羥基化合物與二酯化合物之莫耳比率崩潰,而未達到所需之分子量之可能性。另一方面,若聚合觸媒之使用量過多,則有同時發生欠佳之副反應,而導致所獲得之樹脂之色相之變差或成形加工時之樹脂之著色的可能性。 If the amount of the catalyst is too small, the polymerization rate will be slowed. Therefore, in order to obtain a resin having a desired molecular weight, the polymerization temperature has to be increased. Therefore, there is a high possibility that the hue of the obtained resin becomes worse, and there is a possibility that the molar ratio of the dihydroxy compound to the diester compound collapses due to the volatilization of unreacted raw materials during the polymerization, and the possibility of failing to reach the required molecular weight Sex. On the other hand, if the amount of the polymerization catalyst used is too large, side reactions that are not satisfactory may occur at the same time, which may cause deterioration of the hue of the obtained resin or the coloration of the resin during the molding process.

1族金屬中,若鈉、鉀、銫大量地含於樹脂中,則有對色相產生不良影響之可能性。而且,該等金屬不僅自所使用之觸媒混入,亦有自原料或反應裝置混入之情形。不管源自何處,關於樹脂中之該等金屬之化合物之合計量,以金屬量計,上述全部二羥基化合物每1mol,較佳為2μmol以下,進而較佳為1μmol以下,更佳為0.5μmol以下。 If a large amount of sodium, potassium, and cesium is contained in the resin in the Group 1 metal, there is a possibility that the hue may be adversely affected. In addition, these metals are mixed not only from the catalyst used, but also from the raw materials or reaction devices. Regardless of the origin of the total amount of the compounds of these metals in the resin, based on the amount of metal, each 1 mol of the above-mentioned dihydroxy compounds is preferably 2 μmol or less, further preferably 1 μmol or less, and more preferably 0.5 μmol. the following.

再者,於使用上述通式(13)所表示之二酯化合物作為具有寡聚茀結構單元之單體而製造聚酯碳酸酯的情形時,較佳為使用A3及A4為芳香族烴基之上述二酯化合物,尤佳為使用A3及A4為苯基之上述二酯化合物。使用該等二酯化合物,藉此聚合反應性良好,可使所使用之觸媒之量變少,可提高所獲得之樹脂之色調或熱穩定性,又可減少樹脂中之異物。 When a polyester carbonate is produced using a diester compound represented by the general formula (13) as a monomer having an oligomeric fluorene structure unit, it is preferable to use A 3 and A 4 as aromatic hydrocarbon groups. The diester compound is particularly preferably a diester compound in which A 3 and A 4 are phenyl groups. By using these diester compounds, the polymerization reactivity is good, the amount of catalyst used can be reduced, the hue or thermal stability of the obtained resin can be improved, and foreign matter in the resin can be reduced.

本發明之樹脂可如上述般進行聚合後,通常進行冷卻固化,利用旋轉式切割器等而進行顆粒物化。顆粒物化之方法並無限定,可列舉:自最終階段之聚合反應器將樹脂以熔融狀態抽出,以股線之形態進行冷卻固化從而顆粒物化之方法;自最終階段之聚合反應器將樹脂以熔融狀態供給於單軸或雙軸擠出機,熔融擠出後進行冷卻固化從而顆粒物化之方法;或者自最終階段之聚合反應器將樹脂以熔融狀態抽出,、以股線之形態進行冷卻固化,暫時顆粒物化後,再次將樹脂供給於單軸或雙軸擠出機,熔融擠出後,進行冷卻固化從而顆粒物化之方法等。 After the resin of the present invention is polymerized as described above, it is usually cooled and solidified, and granulated by a rotary cutter or the like. There is no limitation on the method of materializing the particles, and examples include: a method in which the resin is withdrawn from the polymerization reactor in the final stage in a molten state and cooled and solidified in the form of strands to form the particles; the resin is melted from the polymerization reactor in the final stage The state is supplied to a uniaxial or biaxial extruder, and the method of cooling and solidifying after melting and extrusion to pelletize the particles; or the resin is extracted from the polymerization reactor in the final stage in a molten state, and cooled and solidified in the form of a strand. After the particles are temporarily formed, the resin is supplied to a uniaxial or biaxial extruder again, and after the melt is extruded, it is cooled and solidified to form the particles.

以上述方式獲得之樹脂之分子量可以還原黏度進行表示。若樹脂之還原黏度過低,則有成形品之機械強度變小之可能性。因此,還原黏度通常為0.20dL/g以上,較佳為0.30dL/g以上。另一方面,若樹脂之還原黏度過大,則有成形時之流動性降低,而使生產性或成形性降低之傾向。因此,還原黏度通常為1.20dL/g以下,較佳為1.00dL/g 以下,更佳為0.80dL/g以下。再者,關於還原黏度,係使用二氯甲烷作為溶劑,將聚碳酸酯濃度精確地調整為0.6g/dL,於溫度20.0℃±0.1℃下使用烏式黏度計而進行測定。 The molecular weight of the resin obtained in the above manner can be expressed by the reduced viscosity. If the reduced viscosity of the resin is too low, there is a possibility that the mechanical strength of the molded product becomes small. Therefore, the reducing viscosity is usually 0.20 dL / g or more, and preferably 0.30 dL / g or more. On the other hand, if the reducing viscosity of the resin is too large, the fluidity during molding tends to decrease, which tends to reduce productivity or moldability. Therefore, the reducing viscosity is usually 1.20dL / g or less, preferably 1.00dL / g Hereinafter, it is more preferably 0.80 dL / g or less. The reduction viscosity was measured using dichloromethane as a solvent, the polycarbonate concentration was accurately adjusted to 0.6 g / dL, and the temperature was 20.0 ° C. ± 0.1 ° C. using a black viscometer.

上述之還原黏度係與樹脂之熔融黏度相關,因此通常可將聚合反應器之攪拌動力、或輸送熔融樹脂之齒輪泵之噴出壓等用於運轉管理之指標。即,於上述之運轉機器之指示值到達目標值之階段,使反應器之壓力恢復至常壓,或者自反應器抽出樹脂,藉此使聚合反應停止。 The above-mentioned reduction viscosity is related to the melt viscosity of the resin. Therefore, the stirring power of the polymerization reactor or the discharge pressure of a gear pump that transports the molten resin can be used as an indicator for operation management. That is, at the stage where the indicated value of the above-mentioned operating machine reaches the target value, the pressure of the reactor is returned to normal pressure, or the resin is withdrawn from the reactor, thereby stopping the polymerization reaction.

本發明之樹脂之熔融黏度於溫度240℃、剪切速度91.2sec-1之測定條件下較佳為700Pa‧s以上且5000Pa‧s以下。更佳為800Pa‧s以上且4500Pa‧s以下,進而較佳為900Pa‧s以上且4000Pa‧s以下,尤佳為1000Pa‧s以上且3500Pa‧s以下。再者,熔融黏度係使用毛細管流變儀(東洋精機(股)製造)而進行測定。 The melt viscosity of the resin of the present invention is preferably 700 Pa · s or more and 5000 Pa · s or less under the measurement conditions of a temperature of 240 ° C and a shear rate of 91.2 sec -1 . More preferably, it is 800 Pa · s or more and 4500 Pa · s or less, more preferably 900 Pa · s or more and 4000 Pa · s or less, and even more preferably 1000 Pa · s or more and 3500 Pa · s or less. The melt viscosity was measured using a capillary rheometer (manufactured by Toyo Seiki Co., Ltd.).

本發明之樹脂之玻璃轉移溫度較佳為110℃以上且160℃以下,更佳為120℃以上且155℃以下。若玻璃轉移溫度過低,則有耐熱性變差之傾向,而有於膜成形後引起尺寸變化,或者相位差膜於使用條件下之品質之可靠性變差之可能性。另一方面,若玻璃轉移溫度過高,則有於膜成形時產生膜厚度之不均,或者膜變脆而延伸性變差之情形,又有損害膜之透明性之情形。 The glass transition temperature of the resin of the present invention is preferably from 110 ° C to 160 ° C, and more preferably from 120 ° C to 155 ° C. If the glass transition temperature is too low, there is a tendency that the heat resistance is deteriorated, and there is a possibility that a dimensional change is caused after the film is formed, or the reliability of the quality of the retardation film is deteriorated under the conditions of use. On the other hand, if the glass transition temperature is too high, unevenness in film thickness may occur during film formation, or the film may become brittle and the extensibility may deteriorate, and the transparency of the film may be impaired.

上述樹脂之儲存彈性模數較佳為1GPa以上且2.7GPa以下,更佳為1.1GPa以上且2.5GPa以下,進而較佳為1.2GPa以上且2.3GPa以下,尤佳為1.3GPa以上且2.2GPa以下。若儲存彈性模數為上述範圍,則膜之操作性或強度優異。儲存彈性模數之測定方法係於實施例之項中進行說明。 The storage elastic modulus of the above resin is preferably 1 GPa or more and 2.7 GPa or less, more preferably 1.1 GPa or more and 2.5 GPa or less, still more preferably 1.2 GPa or more and 2.3 GPa or less, and even more preferably 1.3 GPa or more and 2.2 GPa or less. . When the storage elastic modulus is in the above range, the film is excellent in operability or strength. The method for measuring the storage elastic modulus is described in the item of the examples.

為了獲得本發明所規定之具有特定範圍之儲存彈性模數之聚碳酸酯樹脂膜,可藉由如下方式達成,即採用本發明中所規定之具有特 定結構之聚碳酸酯樹脂,而且將適當調整其熔融黏度;或適當選擇其結構單元;或調節其結構單元之比率;或向聚碳酸酯樹脂中添加塑化劑等進行適當組合,或者選擇適當之製膜條件或延伸條件。 In order to obtain a polycarbonate resin film with a specific range of storage elastic modulus as specified in the present invention, it can be achieved by adopting Polycarbonate resin with a fixed structure, and its melt viscosity will be adjusted appropriately; or its structural units will be appropriately selected; or the ratio of its structural units will be adjusted; or a plasticizer, etc. will be added to the polycarbonate resin for an appropriate combination, or an appropriate selection will be made. Film forming conditions or extension conditions.

於聚縮合反應中使用二酯化合物之情形時,有如下之虞:副產生之單羥基化合物殘留於樹脂中,於製膜時或延伸時揮發,成為臭氣而使作業環境變差,或者污染搬送輥等而損害膜之外觀。尤其是於使用作為有用之碳酸二酯之碳酸二苯酯(DPC)之情形時,副產生之苯酚之沸點相對較高,即便藉由減壓下之反應亦未被充分去除,而容易殘留在樹脂中。 When a diester compound is used in a polycondensation reaction, there is a possibility that a by-produced monohydroxy compound remains in the resin, volatilizes during film formation or stretching, becomes an odor, degrades the working environment, or pollutes The appearance of the film is impaired by conveying rollers and the like. Especially when using diphenyl carbonate (DPC), which is a useful carbonic acid diester, the by-product phenol has a relatively high boiling point, which is not sufficiently removed even by the reaction under reduced pressure, and is likely to remain in In resin.

因此,源自本發明之樹脂中所含有之碳酸二酯之單羥基化合物較佳為1500質量ppm以下。進而較佳為1000質量ppm以下,尤佳為700質量ppm以下。再者,為了解決上述問題,單羥基化合物之含量越少越佳,但於熔融聚合法中難以使殘留於高分子中之單羥基化合物為零,為了去除該單羥基化合物而必須過大之勞力。通常可藉由將單羥基化合物之含量減少至1質量ppm而充分抑制上述問題。 Therefore, the monohydroxy compound derived from the carbonic acid diester contained in the resin of the present invention is preferably 1500 mass ppm or less. It is more preferably 1,000 mass ppm or less, and particularly preferably 700 mass ppm or less. Furthermore, in order to solve the above-mentioned problems, the smaller the content of the monohydroxy compound is, the better, but it is difficult to make the monohydroxy compound remaining in the polymer zero in the melt polymerization method, and excessive labor is required to remove the monohydroxy compound. Usually, the above-mentioned problem can be sufficiently suppressed by reducing the content of the monohydroxy compound to 1 mass ppm.

為了減少本發明之樹脂中所殘留之以源自碳酸二酯之單羥基化合物為首之低分子成分,有效的是如上述般利用擠出機對樹脂進行脫氣處理,或者將聚合最後階段之壓力設為3kPa以下、較佳為2kPa以下、進而較佳為1kPa以下。 In order to reduce the low-molecular components, such as monohydroxy compounds derived from carbonate diesters, remaining in the resin of the present invention, it is effective to degas the resin using an extruder as described above, or to reduce the pressure in the final stage of polymerization It is set to 3 kPa or less, preferably 2 kPa or less, and further preferably 1 kPa or less.

於使聚合最後階段之壓力降低之情形時,若使反應之壓力過於降低,則有分子量急劇上升,而反應之控制變困難之情形,因此較佳為將樹脂之末端基濃度設為羥基末端過剩或酯基末端過剩,使末端基平衡失衡而進行製造。其中,就熱穩定性之觀點而言,較佳為羥基末端量設為50mol/ton以下、尤其是40mol/ton以下。羥基末端量可利用1H-NMR等進行定量。羥基末端量可藉由全部二羥基化合物與全部二酯化合物之添加量之莫耳比而進行調節。 When the pressure in the last stage of the polymerization is reduced, if the pressure of the reaction is excessively reduced, the molecular weight may increase sharply, and the control of the reaction may become difficult. Therefore, it is preferable to set the concentration of the terminal group of the resin to an excess of hydroxyl terminals Or, the excess of the terminal end of the ester group causes the terminal group to be unbalanced and manufactured. Among them, from the viewpoint of thermal stability, it is preferable that the amount of the hydroxyl terminal is 50 mol / ton or less, particularly 40 mol / ton or less. The amount of the hydroxyl terminal can be quantified by 1 H-NMR or the like. The amount of the hydroxyl terminal can be adjusted by the molar ratio of the total amount of the dihydroxy compound and the total amount of the diester compound added.

於本發明之樹脂中,可視需要,為了防止成形時等分子量之降低或色相之變差而調配熱穩定劑。作為該熱穩定劑,可列舉:通常已知之受阻酚系熱穩定劑及/或磷系熱穩定劑。 In the resin of the present invention, if necessary, a heat stabilizer is blended in order to prevent a decrease in molecular weight or deterioration of hue during molding. Examples of the thermal stabilizer include a generally known hindered phenol-based thermal stabilizer and / or a phosphorus-based thermal stabilizer.

作為受阻酚系化合物,例如可採用以下之化合物。可列舉:2,6-二-第三丁基苯酚、2,4-二-第三丁基苯酚、2-第三丁基-4-甲氧基苯酚、2-第三丁基-4,6-二甲基苯酚、2,6-二-第三丁基-4-甲基苯酚、2,6-二-第三丁基-4-乙基苯酚、2,5-二-第三丁基對苯二酚、正十八烷基-3-(3',5'-二-第三丁基-4'-羥基苯基)丙酸酯、2-第三丁基-6-(3'-第三丁基-5'-甲基-2'-羥基苄基)-4-甲基苯基丙烯酸酯、2,2'-亞甲基-雙-(4-甲基-6-第三丁基苯酚)、2,2'-亞甲基-雙-(6-環己基-4-甲基苯酚)、2,2'-亞乙基-雙-(2,4-二-第三丁基苯酚)、四-[亞甲基-3-(3',5'-二-第三丁基-4'-羥基苯基)丙酸酯]-甲烷、1,3,5-三甲基-2,4,6-三-(3,5-二-第三丁基-4-羥基苄基)苯等。其中,較佳為四-[亞甲基-3-(3',5'-二-第三丁基-4'-羥基苯基)丙酸酯]-甲烷、正十八烷基-3-(3',5'-二-第三丁基-4'-羥基苯基)丙酸酯、1,3,5-三甲基-2,4,6-三-(3,5-二-第三丁基-4-羥基苄基)苯。 As the hindered phenol-based compound, for example, the following compounds can be used. Examples include: 2,6-di-third-butylphenol, 2,4-di-third-butylphenol, 2-third-butyl-4-methoxyphenol, 2-third-butyl-4, 6-dimethylphenol, 2,6-di-tertiary-butyl-4-methylphenol, 2,6-di-tertiary-butyl-4-ethylphenol, 2,5-di-tertiary-butyl Hydroquinone, n-octadecyl-3- (3 ', 5'-di-third-butyl-4'-hydroxyphenyl) propionate, 2-tert-butyl-6- (3 '-Third-butyl-5'-methyl-2'-hydroxybenzyl) -4-methylphenylacrylate, 2,2'-methylene-bis- (4-methyl-6- Tributylphenol), 2,2'-methylene-bis- (6-cyclohexyl-4-methylphenol), 2,2'-ethylene-bis- (2,4-bis-third Butylphenol), tetra- [methylene-3- (3 ', 5'-di-third-butyl-4'-hydroxyphenyl) propionate] -methane, 1,3,5-trimethyl -2,4,6-tri- (3,5-di-third-butyl-4-hydroxybenzyl) benzene and the like. Among these, tetra- [methylene-3- (3 ', 5'-di-third-butyl-4'-hydroxyphenyl) propionate] -methane, n-octadecyl-3- (3 ', 5'-di-third-butyl-4'-hydroxyphenyl) propionate, 1,3,5-trimethyl-2,4,6-tri- (3,5-di- Third butyl-4-hydroxybenzyl) benzene.

作為磷系化合物,例如可採用以下所示之亞磷酸、磷酸、亞膦酸、膦酸及該等之酯等,但亦可採用該等化合物以外之磷系化合物。例如可列舉:亞磷酸三苯基酯、亞磷酸三(壬基苯酯)、亞磷酸三(2,4-二-第三丁基苯酯)、亞磷酸十三烷基酯、亞磷酸三辛酯、亞磷酸三-十八烷基酯、亞磷酸二癸基單苯酯、亞磷酸二辛基單苯酯、亞磷酸二異丙基單苯酯、亞磷酸單丁基二苯酯、亞磷酸單癸基二苯酯、亞磷酸單辛基二苯酯、雙(2,6-二-第三丁基-4-甲基苯基)季戊四醇二亞磷酸酯、亞磷酸2,2-亞甲基雙(4,6-二-第三丁基苯基)辛酯、雙(壬基苯基)季戊四醇二亞磷酸酯、雙(2,4-二-第三丁基苯基)季戊四醇二亞磷酸酯、二硬脂基季戊四醇二亞磷酸酯、磷酸三丁酯、磷酸三乙酯、磷酸三甲酯、磷酸三苯酯、磷酸單鄰聯苯基二苯基酯、磷酸二丁酯、磷酸二辛酯、 磷酸二異丙酯、4,4'-聯伸苯二膦酸四(2,4-二-第三丁基苯酯)、苯膦酸二甲酯、苯膦酸二乙酯、苯膦酸二丙酯等。該等熱穩定劑可單獨使用1種,亦可併用2種以上。 As the phosphorus-based compound, for example, phosphorous acid, phosphoric acid, phosphinic acid, phosphonic acid, and esters thereof described below can be used, but phosphorus-based compounds other than these compounds can also be used. Examples include triphenyl phosphite, tris (nonylphenyl) phosphite, tris (2,4-di-tert-butylphenyl) phosphite, tridecyl phosphite, and tris phosphite Octyl ester, tri-octadecyl phosphite, didecyl monophenyl phosphite, dioctyl monophenyl phosphite, diisopropyl monophenyl phosphite, monobutyl diphenyl phosphite, Monodecyl diphenyl phosphite, monooctyl diphenyl phosphite, bis (2,6-di-third-butyl-4-methylphenyl) pentaerythritol diphosphite, 2,2-phosphite Methylene bis (4,6-di-third-butylphenyl) octyl ester, bis (nonylphenyl) pentaerythritol diphosphite, bis (2,4-di-third-butylphenyl) pentaerythritol Diphosphite, distearyl pentaerythritol diphosphite, tributyl phosphate, triethyl phosphate, trimethyl phosphate, triphenyl phosphate, mono-o-biphenyl diphenyl phosphate, dibutyl phosphate , Dioctyl phosphate, Diisopropyl phosphate, 4,4'-biphenylene diphosphonate tetra (2,4-di-tert-butylphenyl), dimethyl phenylphosphonate, diethyl phenylphosphonate, phenylphosphonic acid Dipropyl ester and so on. These heat stabilizers may be used individually by 1 type, and may use 2 or more types together.

此種熱穩定劑可於熔融聚合時添加於反應液,亦可使用擠出機添加於樹脂並進行混練。於藉由熔融擠出法而進行製膜之情形時,可向擠出機添加上述熱穩定劑等而進行製膜,亦可使用預先使用擠出機,向樹脂中添加上述熱穩定劑等而製成顆粒物等形狀者。 Such a heat stabilizer may be added to the reaction liquid during melt polymerization, or may be added to the resin using an extruder and kneaded. In the case of forming a film by a melt extrusion method, the film may be formed by adding the above-mentioned thermal stabilizer to the extruder, or by using the extruder in advance and adding the above-mentioned thermal stabilizer to the resin. Shaped into particles.

關於該等熱穩定劑之調配量,於將本發明所使用之樹脂設為100質量份之情形時,較佳為0.0001質量份以上,更佳為0.0005質量份以上,進而較佳為0.001質量份以上,又較佳為1質量份以下,更佳為0.5質量份以下,進而較佳為0.2質量份以下。 Regarding the blending amount of these heat stabilizers, when the resin used in the present invention is 100 parts by mass, it is preferably 0.0001 parts by mass or more, more preferably 0.0005 parts by mass or more, and even more preferably 0.001 parts by mass. The above is more preferably 1 part by mass or less, more preferably 0.5 part by mass or less, and still more preferably 0.2 part by mass or less.

於本發明之樹脂中,亦可視需要而調配以抗氧化為目的之通常已知之抗氧化劑。作為此種抗氧化劑,例如可採用以下所示之化合物,但亦可採用該等以外之化合物。例如可列舉:季戊四醇四(3-巰基丙酸酯)、季戊四醇四(3-月桂基硫代丙酸酯)、丙三醇-3-硬脂基硫代丙酸酯、三乙二醇-雙[3-(3-第三丁基-5-甲基-4-羥基苯基)丙酸酯]、1,6-己二醇-雙[3-(3,5-二-第三丁基-4-羥基苯基)丙酸酯]、季戊四醇-四[3-(3,5-二-第三丁基-4-羥基苯基)丙酸酯]、十八烷基-3-(3,5-二-第三丁基-4-羥基苯基)丙酸酯、1,3,5-三甲基-2,4,6-三(3,5-二-第三丁基-4-羥基苄基)苯、N,N-六亞甲基雙(3,5-二-第三丁基-4-羥基-苯丙醯胺)、3,5-二-第三丁基-4-羥基-苄基膦酸酯-二乙酯、異氰尿酸三(3,5-二-第三丁基-4-羥基苄酯)、4,4'-伸聯苯基二膦酸四(2,4-二-第三丁基苯基)、3,9-雙{1,1-二甲基-2-[β-(3-第三丁基-4-羥基-5-甲基苯基)丙醯氧基]乙基}-2,4,8,10-四氧雜螺(5,5)十一烷等。上述之抗氧化劑可單獨使用1種,亦可併用2種以上。關於該等抗氧化劑之調配量,於將本發明之樹脂設為100質量份之情形時,較佳為0.0001質量份以上,又較佳為 0.5質量份以上。 In the resin of the present invention, generally known antioxidants for the purpose of anti-oxidation can also be formulated as needed. As such an antioxidant, for example, compounds shown below may be used, but compounds other than these may be used. Examples include pentaerythritol tetrakis (3-mercaptopropionate), pentaerythritol tetrakis (3-laurylthiopropionate), glycerol-3-stearylthiopropionate, and triethylene glycol-bis [3- (3-Third-butyl-5-methyl-4-hydroxyphenyl) propionate], 1,6-hexanediol-bis [3- (3,5-di-third-butyl 4-hydroxyphenyl) propionate], pentaerythritol-tetrakis [3- (3,5-di-third-butyl-4-hydroxyphenyl) propionate], octadecyl-3- (3 , 5-Di-tert-butyl-4-hydroxyphenyl) propionate, 1,3,5-trimethyl-2,4,6-tri (3,5-di-tert-butyl-4 -Hydroxybenzyl) benzene, N, N-hexamethylenebis (3,5-di-third-butyl-4-hydroxy-phenylpropanamine), 3,5-di-third-butyl-4 -Hydroxy-benzylphosphonate-diethyl ester, isocyanuric tris (3,5-di-third-butyl-4-hydroxybenzyl ester), 4,4'-biphenylphenylphosphonic acid tetra ( 2,4-di-third-butylphenyl), 3,9-bis {1,1-dimethyl-2- [β- (3-third-butyl-4-hydroxy-5-methylbenzene Propyl) propanyloxy] ethyl} -2,4,8,10-tetraoxaspiro (5,5) undecane and the like. These antioxidants may be used alone or in combination of two or more. Regarding the amount of these antioxidants, when the resin of the present invention is 100 parts by mass, it is preferably 0.0001 parts by mass or more, and more preferably 0.5 mass parts or more.

進而,於本發明之樹脂中,於無損本發明之目的之範圍內,亦可含有通常所使用之紫外線吸收劑、脫模劑、抗靜電劑、滑劑、潤滑劑、塑化劑、相容劑、成核劑、阻燃劑、無機填充劑、衝擊改良劑、發泡劑、染顏料等。 Furthermore, the resin of the present invention may contain an ultraviolet absorber, a mold release agent, an antistatic agent, a slip agent, a lubricant, a plasticizer, and a compatible agent, as long as the purpose of the present invention is not impaired. Agents, nucleating agents, flame retardants, inorganic fillers, impact modifiers, foaming agents, dyes and pigments.

又,本發明之樹脂亦可以改質樹脂之機械特性或耐溶劑性等特性為目的,而製成與芳香族聚碳酸酯、芳香族聚酯、脂肪族聚酯、聚醯胺、聚苯乙烯、聚烯烴、丙烯酸、非晶質聚烯烴、ABS、AS、聚乳酸、聚丁二酸丁二酯等合成樹脂或橡膠等之1種或2種以上進行混練而成之聚合物合金。 In addition, the resin of the present invention can be modified with aromatic polycarbonate, aromatic polyester, aliphatic polyester, polyamide, and polystyrene for the purpose of improving the mechanical properties and solvent resistance of the resin. Polyolefin, acrylic, amorphous polyolefin, ABS, AS, polylactic acid, polybutylene succinate and other synthetic resins or rubber or one or more polymer alloys kneaded.

上述之添加劑或改質劑可藉由滾筒、V型攪拌器、Nautor攪拌器、班布里混合機、混練輥、擠出劑等混合機,於向本發明之樹脂混合上述成分之同時,或者以任意之順序進行混合而製造,其中,就分散性提高之觀點而言,較佳為藉由擠出機、尤其是雙軸擠出機而進行混練。 The above additives or modifiers can be mixed with the resin of the present invention by a mixer such as a roller, a V-shaped mixer, a Nautor mixer, a Banbury mixer, a kneading roller, an extruder, or It is manufactured by mixing in any order, and it is preferable to knead | mix by an extruder, especially a biaxial extruder from a viewpoint of improvement of a dispersibility.

以上述方式獲得之樹脂之雙折射較小,耐熱性及成形性亦優異,進而著色較少,且兼具較高之透明性,因此可用於光學膜或光碟、光學稜鏡、讀取透鏡等,尤其是可較佳地用作相位差膜。 The resin obtained in the above manner has small birefringence, excellent heat resistance and formability, and has less coloring, and has high transparency. Therefore, it can be used in optical films or optical discs, optical lenses, reading lenses, etc. In particular, it can be preferably used as a retardation film.

<未延伸膜之製造方法> <Manufacturing method of unstretched film>

作為使用本發明之樹脂而將未延伸膜進行製膜之方法,可採用使上述樹脂溶解於溶劑,進行澆鑄後將溶劑去除之流延法;或者不使用溶劑,使上述樹脂熔融而進行製膜之熔融製膜法。作為熔融製膜法,具體而言,有使用T型模頭之熔融擠出法、壓延成形法、熱壓法、共擠出法、共熔融法、多層擠出、吹脹成形法等。未延伸膜之製膜方法並無特別限定,但於流延法中有產生由殘留溶劑引起之問題之虞,因此較佳為熔融製膜法,其中,就之後之延伸處理之容易性而 言,較佳為使用T型模頭之熔融擠出法。 As a method for forming a non-stretched film using the resin of the present invention, a casting method in which the above-mentioned resin is dissolved in a solvent and the solvent is removed after casting, or the above-mentioned resin is melted without using a solvent to form a film Melt film forming method. Specific examples of the melt film-forming method include a melt extrusion method using a T-die, a calendering method, a hot-press method, a coextrusion method, a co-melt method, a multilayer extrusion, and an inflation molding method. The film-forming method of the unstretched film is not particularly limited, but the casting method may cause problems caused by residual solvents. Therefore, the melt-film-forming method is preferred. In other words, a melt extrusion method using a T-die is preferred.

於藉由熔融製膜法而將未延伸膜進行成形之情形時,較佳為將成形溫度設為270℃以下,更佳為設為265℃以下,尤佳為設為260℃以下。若成形溫度過高,則有由所獲得之膜中之異物或氣泡之產生引起之缺陷增加,或膜著色之可能性。其中,若成形溫度過低,則有樹脂之熔融黏度變得過高,而坯膜之成形變困難,從而變得難以製造厚度均勻之未延伸膜之可能性,因此成形溫度之下限通常為200℃以上,較佳為210℃以上,更佳為220℃以上。此處,所謂未延伸膜之成形溫度,係熔融製膜法中之成形時之溫度,通常係對擠出熔融樹脂之模具出口之溫度進行測定而獲得之值。 When the unstretched film is formed by the melt film forming method, the forming temperature is preferably 270 ° C or lower, more preferably 265 ° C or lower, and even more preferably 260 ° C or lower. If the forming temperature is too high, there may be an increase in defects caused by the generation of foreign matter or bubbles in the obtained film, or the possibility of film coloring. Among them, if the molding temperature is too low, the melt viscosity of the resin may become too high, and the formation of the blank film may become difficult, making it difficult to manufacture an unstretched film with a uniform thickness. Therefore, the lower limit of the molding temperature is usually 200. ℃ or higher, preferably 210 ℃ or higher, and more preferably 220 ℃ or higher. Here, the molding temperature of the unstretched film refers to the temperature at the time of molding in the melt film-forming method, and is generally a value obtained by measuring the temperature at the exit of the die from which the molten resin is extruded.

又,若於膜中存在異物,則於用作偏光板之情形時發現漏光等缺陷。為了將樹脂中之異物去除,較佳為如下方法:於上述之擠出機後設置聚合物過濾器,將樹脂進行過濾後,自模具擠出而將膜進行成形。此時,必須利用配管將擠出機或聚合物過濾器、模具進行連結而輸送熔融樹脂,但為了極力抑制於配管內之熱劣化,重要的是以滯留時間成為最短之方式配置各設備。又,擠出後之膜之搬送或捲取之步驟係於無塵室內進行,要求儘量注意不使異物附著於膜。 In addition, if a foreign substance is present in the film, defects such as light leakage are found when the film is used as a polarizing plate. In order to remove foreign matters from the resin, the following method is preferred: a polymer filter is installed after the above extruder, the resin is filtered, and the film is extruded from a mold to form a film. In this case, the extruder, the polymer filter, and the mold must be connected by piping to convey the molten resin. However, in order to minimize thermal degradation in the piping, it is important to arrange the equipment so that the residence time is minimized. In addition, the steps of transporting or winding the extruded film are performed in a clean room, and it is required to take care to prevent foreign matter from adhering to the film as much as possible.

關於未延伸膜之厚度,係根據延伸後之相位差膜之膜厚之設計、或延伸倍率等延伸條件而決定,但若過厚,則容易產生厚度之不均(不均勻),若過薄,則有導致延伸時之斷裂之可能性,因此通常為30μm以上,較佳為40μm以上,進而較佳為50μm以上,又通常為200μm以下,較佳為160μm以下,進而較佳為120μm以下。又,若未延伸膜存在厚度不均(不均勻),則導致相位差膜之相位差不均,因此作為相位差膜進行使用之部分之厚度較佳為設定厚度±3μm以下,進而較佳為設定厚度±2μm以下,尤佳為設定厚度±1μm以下。 The thickness of the unstretched film is determined based on the design of the film thickness of the retardation film after stretching, or the stretching conditions such as the stretching ratio. However, if it is too thick, unevenness (unevenness) in thickness is likely to occur, and if it is too thin , There is a possibility of causing breakage during elongation. Therefore, it is usually 30 μm or more, preferably 40 μm or more, more preferably 50 μm or more, and usually 200 μm or less, preferably 160 μm or less, and further preferably 120 μm or less. In addition, if the thickness of the unstretched film is uneven (uneven), the phase difference of the retardation film is caused. Therefore, the thickness of the portion used as the retardation film is preferably set to a thickness of ± 3 μm or less, and more preferably The set thickness is ± 2 μm or less, and particularly preferably the set thickness is ± 1 μm or less.

未延伸膜之長度方向之長度較佳為500m以上,進而較佳為1000 m以上,尤佳為1500m以上。就生產性或品質之觀點而言,較佳為於製造本發明之相位差膜時,連續地進行延伸,但通常於延伸開始時,為了符合特定之相位差而必須調整條件,若膜之長度過短,則調整條件後可取得之製品之量減少。再者,於本說明書中所謂「長條」意指膜之長度方向之尺寸充分大於膜之寬度方向之尺寸,且意指實際上可向長度方向捲取成捲狀程度者。更具體而言意指膜之長度方向之尺寸比寬度方向之尺寸大10倍以上。 The length of the unstretched film in the longitudinal direction is preferably 500 m or more, and more preferably 1000 m or more, particularly preferably 1500 m or more. From the viewpoint of productivity or quality, it is preferable to continuously stretch when manufacturing the retardation film of the present invention, but usually at the beginning of stretching, conditions must be adjusted in order to meet a specific retardation. Too short, the quantity of products that can be obtained after adjusting the conditions is reduced. Furthermore, in the present specification, the "long strip" means that the size in the length direction of the film is sufficiently larger than the size in the width direction of the film, and means that it can actually be rolled into a roll shape in the length direction. More specifically, it means that the dimension in the longitudinal direction of the film is 10 times or more larger than the dimension in the width direction.

以上述方式獲得之未延伸膜之內部霧度較佳為3%以下,更佳為2%以下,尤佳為1%以下。若未延伸膜之內部霧度大於上述上限值,則有如下情形,即引起光之散射,例如與偏光元件進行積層時,成為產生消偏光之原因。內部霧度之下限值並無特別限定,通常為0.1%以上。於內部霧度之測定中,將事先進行過霧度測定之附黏著劑之透明膜貼合於未延伸膜之兩面,使用去除了外部霧度之影響之狀態之樣品,將自上述樣品之測定值減去附黏著劑之透明膜之霧度值而獲得的值設為內部霧度之值。 The internal haze of the unstretched film obtained in the above manner is preferably 3% or less, more preferably 2% or less, and even more preferably 1% or less. If the internal haze of the unstretched film is greater than the above-mentioned upper limit value, there is a case where light scattering is caused, for example, when laminated with a polarizing element, it may cause depolarized light. The lower limit of the internal haze is not particularly limited, but is usually 0.1% or more. In the measurement of internal haze, a transparent film with an adhesive having been previously measured for haze is attached to both sides of an unstretched film, and a sample in a state in which the influence of external haze is removed is used to measure from the above sample. The value obtained by subtracting the haze value of the transparent film with an adhesive is the value of the internal haze.

未延伸膜之b*值較佳為3以下。若膜之b*值過大,則產生著色等問題。b*值更佳為2以下,尤佳為1以下。 The b * value of the unstretched film is preferably 3 or less. If the b * value of the film is too large, problems such as coloration occur. The b * value is more preferably 2 or less, and even more preferably 1 or less.

未延伸膜不論厚度,該膜本身之全光線透過率較佳為85%以上,進而較佳為90%以上,進而較佳為91%以上,尤佳為92%以上。若透過率為上述下限以上,則可獲得著色較少之膜,與偏光板貼合時,成為偏光度或透過率較高之圓偏光板,於用於圖像顯示裝置時,可顯現較高之顯示品位。再者,本發明之膜之全光線透過率之上限並無特別限制,通常為99%以下。 Regardless of the thickness of the unstretched film, the total light transmittance of the film itself is preferably 85% or more, more preferably 90% or more, still more preferably 91% or more, and even more preferably 92% or more. If the transmittance is above the lower limit, a film with less coloration can be obtained. When bonded to a polarizing plate, it becomes a circular polarizing plate with a high degree of polarization or transmittance. When used in an image display device, it can show a high degree. The display taste. In addition, the upper limit of the total light transmittance of the film of the present invention is not particularly limited, and is usually 99% or less.

除使上述之霧度或b*值變低外,亦可藉由使樹脂之折射率變低而抑制膜表面之反射,而可提高全光線透過率。於將本發明之樹脂用於外界光反射防止用之圓偏光板之情形時,提高全光線透過率係使外 界光之反射率降低。本發明所使用之用樹脂之鈉d線(589nm)下之折射率較佳為1.49~1.56。又,上述折射率更佳為1.50~1.55,進而較佳為1.51~1.54,尤佳為1.51~1.53。本發明中所使用之樹脂含有寡聚茀結構單元,因此與全脂肪族聚合物進行比較,折射率變高,但因共聚合成分中不使用芳香族化合物,故而可使折射率處於上述範圍內。 In addition to lowering the above-mentioned haze or b * value, the reflection of the film surface can be suppressed by reducing the refractive index of the resin, and the total light transmittance can be improved. In the case where the resin of the present invention is used for a circular polarizing plate for preventing external light reflection, improving the total light transmittance The reflectance of boundary light is reduced. The refractive index at the sodium d-line (589 nm) of the resin used in the present invention is preferably 1.49 to 1.56. The refractive index is more preferably 1.50 to 1.55, more preferably 1.51 to 1.54, and even more preferably 1.51 to 1.53. The resin used in the present invention contains an oligomeric fluorene structure unit, so the refractive index is higher than that of a full aliphatic polymer. However, since an aromatic compound is not used in the copolymerization component, the refractive index can be within the above range. .

本發明之樹脂之光彈性係數較佳為25×10-12Pa-1以下,進而較佳為20×10-12Pa-1以下,尤佳為15×10-12Pa-1以下。若光彈性係數過大,則有將相位差膜與偏光板貼合時,引起如畫面之周圍發白且模糊不清之圖像品質之降低。尤其是於用於大型之顯示裝置之情形時,該問題明顯顯現。 The photoelastic coefficient of the resin of the present invention is preferably 25 × 10 -12 Pa -1 or less, more preferably 20 × 10 -12 Pa -1 or less, and particularly preferably 15 × 10 -12 Pa -1 or less. If the photoelastic coefficient is too large, there may be a reduction in image quality such as a white and blurred image around the screen when the retardation film is bonded to the polarizing plate. This problem is particularly apparent when used in a large display device.

上述未延伸膜較佳為於下述之彎曲試驗中未脆性破壞。若為發生脆性破壞之膜,則有如下之虞,即於膜之製膜時或延伸時容易引起膜之斷裂,而使製造之良率變差。對於製成不脆性破壞之膜而言,重要的是將本發明所使用之樹脂之分子量或熔融黏度、玻璃轉移溫度設計為上述之較佳範圍。又,藉由使可賦予柔軟性之成分進行共聚合,或進行摻合而調整膜之特性之方法亦有效。 The unstretched film is preferably not brittlely broken in a bending test described below. If the film is brittlely broken, there is a concern that the film is likely to be broken during film formation or stretching, and the production yield is deteriorated. For making a film that is not brittle, it is important to design the molecular weight or melt viscosity and glass transition temperature of the resin used in the present invention to the above-mentioned preferred ranges. In addition, a method of adjusting the characteristics of the film by copolymerizing a component capable of imparting flexibility or blending it is also effective.

本發明之樹脂之飽和吸水率較佳為大於1.0質量%。若飽和吸水率大於1.0質量%,則有如下傾向,即將該膜與其他膜等進行貼合時,可容易地確保接著性。例如與偏光板貼合時,因膜為親水性,故水之接觸角亦較低,而容易自由地設計接著劑,而可進行較高之接著設計。於飽和吸水率為1.0質量%以下之情形時,成為疏水性,水之接觸角亦較高,從而接著性之設計變困難。又,有產生如下問題之傾向:膜變得容易帶電而夾帶異物,而於設置於圓偏光板、圖像顯示裝置時外觀缺陷變多。另一方面,若飽和吸水率變得大於3.0質量%,則有濕度環境下之光學特性之耐久性變差之傾向,故而欠佳。本發明之樹脂 之飽和吸水率較佳為大於1.0質量%,更佳為1.1質量%以上,又較佳為3.0質量%以下,更佳為2.5質量%以下。另一方面,根據膜或使用其之圖像顯示裝置之使用條件,亦可將飽和吸水率設為1.0質量%以下。 The saturated water absorption of the resin of the present invention is preferably greater than 1.0% by mass. When the saturated water absorption is greater than 1.0% by mass, the adhesiveness tends to be easily ensured when the film is bonded to another film or the like. For example, when bonding to a polarizing plate, the film is hydrophilic, so the contact angle of water is also low, and it is easy to design the adhesive freely, and a higher adhesive design can be performed. When the saturated water absorption is 1.0% by mass or less, it becomes hydrophobic and the contact angle of water is also high, so that the design of the adhesiveness becomes difficult. In addition, there is a tendency that the film becomes easily electrified and foreign matter is entrapped, and appearance defects are increased when the film is installed in a circularly polarizing plate or an image display device. On the other hand, when the saturated water absorption rate is greater than 3.0% by mass, the durability of the optical characteristics under a humidity environment tends to be deteriorated, which is not preferable. Resin of the present invention The saturated water absorption is preferably greater than 1.0% by mass, more preferably 1.1% by mass or more, still more preferably 3.0% by mass or less, and even more preferably 2.5% by mass or less. On the other hand, depending on the use conditions of the film or the image display device using the film, the saturated water absorption rate may be set to 1.0% by mass or less.

<相位差膜之製造方法> <Manufacturing method of retardation film>

可藉由使上述未延伸膜進行延伸配向而獲得相位差膜。作為延伸方法,可使用縱向單軸延伸、使用拉幅機等之橫向單軸延伸、或將該等組合之同時雙軸延伸、逐次雙軸延伸等公知之方法。延伸可以批次式進行,但就生產性而言,較佳為連續地進行延伸。進而與批次式相比,連續延伸者可獲得膜面內之相位差之不均較少之相位差膜。 A retardation film can be obtained by subjecting the unstretched film to stretch alignment. As the stretching method, a known method such as a longitudinal uniaxial stretching, a transverse uniaxial stretching using a tenter, or the like, a combination of simultaneous biaxial stretching, and a successive biaxial stretching can be used. The stretching may be performed in a batch manner, but in terms of productivity, the stretching is preferably performed continuously. Furthermore, compared with the batch type, a continuous stretcher can obtain a retardation film with less unevenness in the retardation within the film surface.

關於延伸溫度,相對於用作原料之樹脂之玻璃轉移溫度(Tg)為(Tg-20℃)~(Tg+30℃)之範圍,較佳為(Tg-10℃)~(Tg+20℃),進而較佳為(Tg-5℃)~(Tg+15℃)之範圍內。延伸倍率係由目標之相位差值而決定,縱、橫分別為1.2倍~4倍,更佳為1.5倍~3.5倍,進而較佳為2倍~3倍。若延伸倍率過小,則可獲得所需之配向度與配向角之有效範圍變窄。另一方面,若延伸倍率過大,則有延伸中膜斷裂,或者產生褶皺之虞。 Regarding the elongation temperature, the glass transition temperature (Tg) of the resin used as a raw material is in a range of (Tg-20 ° C) to (Tg + 30 ° C), preferably (Tg-10 ° C) to (Tg + 20 ° C) ), More preferably in the range of (Tg-5 ° C) to (Tg + 15 ° C). The extension magnification is determined by the phase difference of the target. The vertical and horizontal ratios are 1.2 to 4 times, more preferably 1.5 to 3.5 times, and even more preferably 2 to 3 times. If the extension magnification is too small, the effective range of the required alignment degree and alignment angle can be narrowed. On the other hand, if the stretching ratio is too large, the stretched intermediate film may be broken or wrinkles may occur.

延伸速度亦視目的而適當選擇,但以下述數式所表示之變形速度計,可以成為通常50%~2000%、較佳為100%~1500%、更佳為200%~1000%、尤佳為250%~500%之方式進行選擇。若延伸速度過大,則有如下可能性:導致延伸時之斷裂,或者由高溫條件下之長期使用引起之光學特性之變動變大。又,若延伸速度過小,則有如下情形:不僅生產性降低,而且為了獲得所需之相位差而必需使延伸倍率變得過大。 The elongation speed is also appropriately selected depending on the purpose, but the deformation speed meter expressed by the following formula can be usually 50% to 2000%, preferably 100% to 1500%, more preferably 200% to 1000%, and particularly preferably Choose from 250% ~ 500%. If the elongation speed is too large, there is a possibility of causing breakage during elongation or a change in optical characteristics caused by long-term use under high temperature conditions. In addition, if the elongation speed is too small, not only the productivity is reduced, but also the elongation ratio needs to be made too large in order to obtain the required phase difference.

變形速度(%/min)={延伸速度(mm/min)/坯膜之長度(mm)}×100 Deformation speed (% / min) = (Extending speed (mm / min) / length of blank film (mm)) × 100

將膜進行延伸後,亦可視需要,藉由加熱爐而進行熱固定處 理,亦可控制拉幅機之寬度,或調整輥周速而進行緩和步驟。作為熱固定處理之溫度,係於相對於未延伸膜所使用之樹脂之玻璃轉移溫度(Tg)為60℃~(Tg)、較佳為70℃~(Tg-5℃)之範圍內進行。若熱處理溫度過高,則有如下可能性:藉由延伸而獲得之分子之配向混亂,而自所需之相位差大幅降低。又,於設置緩和步驟之情形時,相對於藉由延伸而擴大之膜之寬度,收縮95%~100%,藉此可消除延伸膜所產生之應力。此時,施加於膜之處理溫度係與熱固定處理溫度相同。藉由進行如上述之熱固定處理或緩和步驟,而可控制由高溫條件下之長期使用引起之光學特性之變動。 After the film is stretched, it can also be heat-fixed by a heating furnace if necessary. It can also control the width of the tenter, or adjust the peripheral speed of the roller to perform the relaxation step. The temperature of the heat-setting treatment is performed within a range of a glass transition temperature (Tg) of 60 ° C to (Tg), preferably 70 ° C to (Tg-5 ° C) with respect to a resin used for the unstretched film. If the heat treatment temperature is too high, there is a possibility that the alignment of the molecules obtained by extension is disordered, and the required phase difference is greatly reduced. In addition, in the case of providing a relaxation step, it can shrink by 95% to 100% with respect to the width of the film expanded by stretching, thereby eliminating the stress generated by the stretched film. At this time, the processing temperature applied to the film is the same as the heat-fixing processing temperature. By performing the heat-fixing treatment or the relaxation step as described above, it is possible to control changes in optical characteristics caused by long-term use under high temperature conditions.

使用本發明之樹脂之相位差膜可藉由適當選擇、調整上述延伸步驟中之處理條件而進行製作。 The retardation film using the resin of the present invention can be produced by appropriately selecting and adjusting the processing conditions in the above-mentioned stretching steps.

使用本發明之樹脂之相位差膜較佳為波長550nm下之面內之雙折射(△n)為0.002以上,更佳為0.0025以上,尤佳為0.003以上。相位差係與膜之厚度(d)與雙折射(△n)成比例,因此可藉由將雙折射設為上述特定之範圍,而於較薄之膜顯現如設計之相位差,而可容易地製作適合薄型機器之膜。為了顯現較高之雙折射,而必須降低延伸溫度、提高延伸倍率等以提高聚合物分子之配向度,但於上述之延伸條件下膜變得容易斷裂,因此所使用之樹脂之韌性越優異越有利。 The retardation film using the resin of the present invention preferably has an in-plane birefringence (Δn) at a wavelength of 550 nm of 0.002 or more, more preferably 0.0025 or more, and even more preferably 0.003 or more. The phase difference is proportional to the thickness (d) and birefringence (△ n) of the film. Therefore, by setting the birefringence to the above-mentioned specific range, a thin film can be easily displayed as a designed phase difference. To produce thin films suitable for thin machines. In order to show higher birefringence, it is necessary to lower the stretching temperature and increase the stretching ratio to improve the alignment of the polymer molecules. However, the film becomes easy to break under the above-mentioned stretching conditions. Therefore, the more excellent the toughness of the resin used, the better advantageous.

使用本發明之樹脂之相位差膜之厚度亦取決於相位差之設計值,但厚度較佳為60μm以下。又,相位差膜之厚度更佳為50μm以下,進而較佳為45μm以下,尤佳為40μm以下。另一方面,若厚度過薄,則膜之處理變困難,而於製造中產生褶皺,或者引起斷裂,因此作為本發明之相位差膜之厚度之下限,較佳為10μm以上,更佳為15μm以上。 The thickness of the retardation film using the resin of the present invention also depends on the design value of the retardation, but the thickness is preferably 60 μm or less. The thickness of the retardation film is more preferably 50 μm or less, more preferably 45 μm or less, and even more preferably 40 μm or less. On the other hand, if the thickness is too thin, handling of the film becomes difficult, and wrinkles or cracks occur during manufacture. Therefore, the lower limit of the thickness of the retardation film of the present invention is preferably 10 μm or more, and more preferably 15 μm. the above.

關於使用本發明之樹脂之相位差膜,於波長450nm下測得之相位差(R450)相對於波長550nm下測得之相位差(R550)之比,即波長色 散(R450/R550)之值為0.75以上且0.93以下。更佳為0.78以上且0.91以下,尤佳為0.80以上且0.89以下。若上述波長色散之值為該範圍,則可獲得可見區域之較廣波長範圍下理想之相位差特性。例如製作作為1/4波長板之具有上述波長依存性之相位差膜,與偏光板進行貼合,藉此可製作圓偏光板等,而可實現色相之波長依存性較少之偏光板及顯示裝置。另一方面,於上述比率為該範圍外之情形時,產生色相之波長依存性變大,於可見區域之全部波長下光學補償消失,而由光穿過偏光板或顯示裝置引起之著色或對比度之降低等問題。 Regarding the retardation film using the resin of the present invention, the ratio of the phase difference (R450) measured at a wavelength of 450nm to the phase difference (R550) measured at a wavelength of 550nm, that is, the wavelength color The value of dispersion (R450 / R550) is 0.75 or more and 0.93 or less. It is more preferably 0.78 or more and 0.91 or less, and particularly preferably 0.80 or more and 0.89 or less. If the value of the above-mentioned wavelength dispersion is in this range, an ideal phase difference characteristic in a wide wavelength range in the visible region can be obtained. For example, making a retardation film with the above-mentioned wavelength dependency as a quarter-wave plate, and bonding it to a polarizing plate, thereby making a circular polarizing plate, etc., and realizing a polarizing plate and display with less color-dependent wavelength dependence. Device. On the other hand, when the above ratio is outside the range, the wavelength dependence of the hue becomes large, the optical compensation disappears at all wavelengths in the visible region, and the coloration or contrast caused by light passing through the polarizing plate or display device Reduction and other issues.

<使用本發明之樹脂之相位差膜之用途例> <Application example of retardation film using resin of this invention>

上述相位差膜係藉由與公知之偏光膜進行積層貼合,並切割成所需之尺寸而成為圓偏光板。此種圓偏光板例如可用於各種顯示器(液晶顯示裝置、有機EL顯示裝置、電漿顯示裝置、FED場發射顯示裝置、SED表面電場顯示裝置)之視角補償用、外界光之反射防止用、色補償用、直線偏光向圓偏振光之轉換用等。尤其是若用於有機EL顯示器之外界光反射防止用之圓偏光板,則乾淨之黑色顯示成為可能,且品質之可靠性亦優異。進而具有亦可應對今後之機器之薄型化之性能。 The retardation film is laminated and bonded to a known polarizing film, and cut into a desired size to form a circular polarizing plate. Such a circular polarizing plate can be used, for example, for viewing angle compensation of various displays (liquid crystal display device, organic EL display device, plasma display device, FED field emission display device, SED surface electric field display device), prevention of external light reflection, color Compensation, conversion of linearly polarized light to circularly polarized light, etc. In particular, if it is used as a circular polarizing plate for preventing outer-boundary light reflection of an organic EL display, a clean black display becomes possible, and the reliability of quality is excellent. Furthermore, it has the performance that can cope with the thinning of future equipment.

作為上述偏光膜,可採用於寬度方向或長度方向中之任一方向具有吸收軸之偏光膜。具體而言,可列舉:使碘或二色性染料等二色性物質吸附於聚乙烯醇系膜、部分甲縮醛化聚乙烯醇系膜、乙烯‧乙酸乙烯酯共聚物系部分皂化膜等親水性高分子膜並進行單軸延伸而成之膜、聚乙烯醇之脫水處理物或聚氯乙烯之脫鹽酸處理物等多烯系配向膜等。該等中,使碘等二色性物質吸附於聚乙烯醇系膜並進行單軸延伸而成之長條偏光膜之偏光二色比較高,故而尤佳。該等長條偏光膜之厚度並無特別限制,通常為1~80μm左右。 As the above-mentioned polarizing film, a polarizing film having an absorption axis in either the width direction or the length direction can be used. Specific examples include adsorption of a dichroic substance such as iodine or a dichroic dye onto a polyvinyl alcohol-based film, a partially methylated polyvinyl alcohol-based film, an ethylene-vinyl acetate copolymer-based partially saponified film, and the like. A film of a hydrophilic polymer film that is uniaxially stretched, a polyene-based alignment film such as a dehydrated product of polyvinyl alcohol or a dehydrochlorinated product of polyvinyl chloride. Among these, a long polarizing film obtained by adsorbing a dichroic substance such as iodine on a polyvinyl alcohol-based film and uniaxially stretching it is particularly preferable because it has a higher polarization dichroism. The thickness of these long polarizing films is not particularly limited, and is usually about 1 to 80 μm.

使碘吸附於聚乙烯醇系膜並進行單軸延伸而成之偏光膜例如可 藉由將聚乙烯醇浸漬於碘之水溶液而進行染色,並藉由延伸至原長之3~7倍而進行製作。上述之水溶液亦可視需要而含有硼酸或硫酸鋅、氯化鋅等。又,亦可將聚乙烯醇浸漬於碘化鉀等水溶液中。 A polarizing film obtained by adsorbing iodine on a polyvinyl alcohol-based film and uniaxially stretching it may be, for example, Dyeing is performed by immersing polyvinyl alcohol in an aqueous solution of iodine, and production is performed by extending to 3 to 7 times the original length. The above-mentioned aqueous solution may also contain boric acid, zinc sulfate, zinc chloride, etc., if necessary. Alternatively, polyvinyl alcohol may be immersed in an aqueous solution such as potassium iodide.

又,亦可視需要而於染色前將聚乙烯醇系膜浸漬於水並進行水洗。可藉由將聚乙烯醇系膜進行水洗而將聚乙烯醇系膜表面之污垢或抗黏連劑洗淨。進而,因聚乙烯醇系膜膨潤,故亦有防止染色之不均等不均勻之效果。延伸可於利用碘進行染色後進行,亦可一面進行染色一面進行延伸,又,亦可延伸後利用碘進行染色。亦可於硼酸或碘化鉀等水溶液中或水浴中進行延伸。 If necessary, the polyvinyl alcohol-based film may be immersed in water and washed with water before dyeing. The polyvinyl alcohol-based film can be washed with water to clean the dirt or anti-blocking agent on the surface of the polyvinyl alcohol-based film. Furthermore, since the polyvinyl alcohol-based film swells, there is also an effect of preventing unevenness and unevenness in dyeing. The stretching may be performed after dyeing with iodine, or may be extended while dyeing, or may be dyed with iodine after stretching. It can also be extended in an aqueous solution such as boric acid or potassium iodide or in a water bath.

於上述圓偏光板中,上述相位差膜之遲相軸與上述偏光膜之寬度方向所成之角度較佳為38°以上且52°以下,更佳為40°以上且50°以下,尤佳為42°以上且48°以下。於成為上述範圍外之情形時,有如下之虞:下述之外界光反射率增加,或者反射光著色,因此圖像之顯示品質降低。 In the circular polarizing plate, the angle formed by the retardation axis of the retardation film and the width direction of the polarizing film is preferably 38 ° or more and 52 ° or less, more preferably 40 ° or more and 50 ° or less, and particularly preferably It is 42 ° or more and 48 ° or less. When it is out of the above range, there is a possibility that the outer boundary light reflectance increases or the reflected light is colored, so that the display quality of the image is lowered.

上述相位差膜與上述偏光膜亦可經由黏接著劑而進行積層。作為黏接著劑,只要為不損害上述積層膜之光學特性,則可使用公知之黏接著劑。 The retardation film and the polarizing film may be laminated via an adhesive. As the adhesive, a known adhesive can be used as long as the optical characteristics of the laminated film are not impaired.

上述圓偏光板係如下構成:如上述般具備充分之光學特性,並且可較佳地用於要求精密性、薄型、均質性之機器。因此,上述圓偏光板例如可較佳地用於液晶顯示器所使用之液晶面板、或有機EL顯示器所使用之有機EL面板等。尤其是有機EL面板具備容易反射外界光之金屬層,因此容易產生外界光反射或背景之映入等問題。為了防止此種外界光反射等,有效的是將上述圓偏光板設置於發光面。 The above-mentioned circularly polarizing plate has the following structure: it has sufficient optical characteristics as described above, and can be preferably used for a machine that requires precision, thinness, and homogeneity. Therefore, the above-mentioned circular polarizing plate can be preferably used, for example, in a liquid crystal panel used in a liquid crystal display or an organic EL panel used in an organic EL display. In particular, the organic EL panel is provided with a metal layer that can easily reflect external light, so it is easy to cause problems such as external light reflection or reflection of the background. In order to prevent such external light reflection and the like, it is effective to provide the circular polarizing plate on a light emitting surface.

《發明2》 "Invention 2"

以下,對本發明2之三茀二酯、含有其之寡聚茀二酯組合物、以及含有具有源自新穎三茀二酯之重複單元之聚合物的樹脂組合物、使 用其所獲得之延伸膜、圓偏光板及圖像顯示裝置進行詳述。 Hereinafter, the tertiary diester of the present invention 2, an oligomeric oligomeric diester composition containing the same, and a resin composition containing a polymer having a repeating unit derived from the novel trimethyl diester, are used. The obtained extension film, circular polarizing plate, and image display device are used for detailed description.

再者,以下所記載之(通)式(1)、(1a)~(1e)、(2)~(11)、(21)係對本發明2中之各結構進行說明者。 The following general formulae (1), (1a) to (1e), (2) to (11), and (21) describe each structure in the present invention 2.

<1三茀二酯> <1 trimer diester>

本發明之三茀二酯包含可具有取代基之3個茀單元a。 The trifluorene diester of the present invention includes three fluorene units a which may have a substituent.

三茀二酯中茀單元a係9位之碳原子彼此直接鍵結、或者經由可具有取代基之伸烷基、可具有取代基之伸芳基、或可具有取代基之伸芳烷基而鏈狀地鍵結。 The carbon atoms at the a position of the a unit of the arsine unit in the tri-fluorene diester are directly bonded to each other, or via an alkylene group which may have a substituent, an alkylene group which may have a substituent, or an alkylene group which may have a substituent Bonded in chains.

如上所述,可認為本發明之三茀二酯成為如下者,即因茀環之積層結構而結構剛直,故而較二茀化合物具有良好之耐熱性。 As described above, the tertiary diester of the present invention is considered to have a structure that is rigid due to the laminated structure of the fluorene ring, and thus has better heat resistance than the difluorene compound.

<1.1伸烷基、伸芳基、伸芳烷基> <1.1 alkylene, alkylene, alkylene>

本發明之三茀二酯中,鍵結茀單元a之伸烷基並無特別限定,就連同提高下述之茀比率之觀點而言,其碳數通常為1以上,又通常為10以下,較佳為5以下,更佳為3以下。 In the tertiary diester of the present invention, the alkylene group bonded to the fluorene unit a is not particularly limited. From the viewpoint of increasing the ratio of fluorene described below, the number of carbon atoms is usually 1 or more, and usually 10 or less. It is preferably 5 or less, and more preferably 3 or less.

關於上述伸烷基之具體結構,於以下進行列舉,且並不限定於該等,可列舉:亞甲基、伸乙基、正伸丙基、正伸丁基、正伸戊基、正伸己基等直鏈狀之伸烷基;甲基亞甲基、二甲基亞甲基、乙基亞甲基、丙基亞甲基、丁基亞甲基、(1-甲基乙基)亞甲基、1-甲基伸乙基、2-甲基伸乙基、1-乙基伸乙基、2-乙基伸乙基、1-甲基伸丙基、2-甲基伸丙基、1,1-二甲基伸乙基、2,2-二甲基伸丙基、3-甲基伸丙基等包含側鏈之伸烷基(取代位置之數值係設為自茀環側之碳附上者);如下述[A]群所示之於脂環結構之任意2處具有直鏈狀或側鏈狀之伸烷基之鍵結鍵的脂環式伸烷基[化34] The specific structure of the above-mentioned alkylene group is enumerated below, and is not limited thereto, and examples thereof include straight chains such as methylene, ethylene, n-butylene, n-butylene, n-pentyl, and n-hexyl Shaped alkylene; methylmethylene, dimethylmethylene, ethylmethylene, propylmethylene, butylmethylene, (1-methylethyl) methylene, 1 -Methylethene, 2-Methylethene, 1-Ethylethene, 2-Ethylethene, 1-Methylethene, 2-Methylethene, 1,1-Dimethyl Methylethene, 2,2-dimethylpropane, 3-methylpropane, and other alkylene groups containing side chains (the value of the substitution position is set to the carbon attached to the ring side) ; As shown in the following [A] group, an alicyclic alkylene group having a straight or side chain alkylene bond at any two positions in the alicyclic structure [Chem. 34]

(於上述[A]群所示之各環結構中之2個鍵結鍵之取代位置為任意,且亦可2個鍵結鍵於同一碳進行取代);如下述[B]群所示之於雜環結構之任意2所具有直鏈狀或側鏈狀之伸烷基之鍵結鍵的雜環式伸烷基 (The substitution positions of the two bonding bonds in each ring structure shown in the above [A] group are arbitrary, and the two bonding bonds can also be substituted on the same carbon); as shown in the following [B] group Heterocyclic alkylene having a linear or side chain alkylene bond in any 2 of the heterocyclic structure

(於上述[B]群所示之各環結構中之2個鍵結鍵之取代位置為任意,且亦可2個鍵結鍵於同一碳進行取代)。 (The substitution positions of the two bonding bonds in each ring structure shown in the above [B] group are arbitrary, and the two bonding bonds may be substituted on the same carbon).

如上述[A]群所示之脂環結構、或如上述[B]群所示之雜環結構於任意2處所具有之直鏈狀或側鏈狀之伸烷基之鍵結鍵的具體結構係於以下進行列舉,並不限定於該等,可列舉:亞甲基、伸乙基、正伸丙基、正伸丁基、正伸戊基、正伸己基等直鏈狀之伸烷基;1-甲基伸乙基、2-甲基伸乙基、1-乙基伸乙基、2-乙基伸乙基、1-甲基伸丙基、2-甲基伸丙基、1,1-二甲基伸乙基、2,2-二甲基伸丙基、3-甲基伸丙基等包含側鏈之伸烷基(此處取代位置之數值係設為自鍵結於上述環結構之碳附上者)。作為該伸烷基可具有之取代基,可列舉:鹵素原子(例如,氟原子、氯原子、溴原子、碘原子);碳數1~10之烷氧基(例如,甲氧基、乙氧基等);碳數1~10之醯基(例如,乙醯基、苯甲醯基等);碳數1~10之醯胺基(例如,乙醯胺基、苯甲醯胺基等);硝 基;氰基;可具有選自鹵素原子(例如,氟原子、氯原子、溴原子、碘原子)、碳數1~10之烷基(例如,甲基、乙基、異丙基等)、碳數1~10之烷氧基(例如,甲氧基、乙氧基等)、碳數1~10之醯基(例如,乙醯基、苯甲醯基等)、碳數1~10之醯胺基(例如,乙醯胺基、苯甲醯胺基等)、硝基、氰基等之1~3個取代基之碳數6~10之芳基(例如,苯基、萘基等)等。該等取代基之數量並無特別限定,較佳為1~3個。於取代基為2個以上之情形時,取代基之種類可相同亦可不同。又,就連同工業上可廉價地製造之觀點而言,較佳為未經取代。 Specific structure of the alicyclic structure shown in the above-mentioned [A] group, or the straight-chain or side-chain extended alkylene bond in the heterocyclic structure shown in the above-mentioned [B] group in any two places It is listed below and is not limited to these, and examples include linear methylene, ethylidene, n-propylidene, n-butylidene, n-pentylyl, and n-hexylyl linear alkylene; 1-formyl Ethylidene, 2-methylidene, 1-ethylidene, 2-ethylidene, 1-methylidene, 2-methylidene, 1,1-dimethyl Ethylene, 2,2-dimethylpropane, 3-methylpropane, and other alkylene groups containing side chains (here the value of the substitution position is set to the carbon bond self-bonded to the above ring structure The former). Examples of the substituent which the alkylene group may have include a halogen atom (for example, a fluorine atom, a chlorine atom, a bromine atom, and an iodine atom); and an alkoxy group having 1 to 10 carbon atoms (for example, a methoxy group and an ethoxy group). Radicals, etc.); fluorenyl radicals having 1 to 10 carbon atoms (for example, ethenyl, benzamidine, etc.); fluorenyl radicals having 1 to 10 carbon atoms (for example, acetamidine, benzamidine, etc.) Nitrate Group; cyano group; may have a halogen atom (for example, fluorine atom, chlorine atom, bromine atom, iodine atom), an alkyl group having 1 to 10 carbon atoms (for example, methyl, ethyl, isopropyl, etc.), Alkoxy groups (e.g., methoxy, ethoxy, etc.) having 1 to 10 carbon atoms, fluorenyl groups (e.g., ethenyl, benzamidine, etc.) having 1 to 10 carbon atoms, Arylamino (e.g., ethylamino, benzamidine, etc.), nitro, cyano, etc. 1 to 3 substituents, 6 to 10 carbon atoms (e.g., phenyl, naphthyl, etc.) )Wait. The number of these substituents is not particularly limited, but is preferably 1 to 3. When there are two or more substituents, the kinds of the substituents may be the same or different. Moreover, it is preferable that it is unsubstituted in view of the fact that it can be manufactured inexpensively industrially.

作為可經取代之伸烷基之具體例,可列舉:環丁基亞甲基、環戊基亞甲基、環己基亞甲基、1-環己基伸丙基等烷基取代伸烷基;苯基亞甲基、1-苯基伸乙基、1-苯基伸丙基等芳基取代伸烷基;1,1,2,2-四氟伸乙基、三氯甲基亞甲基、三氟甲基亞甲基等鹵素原子取代伸烷基;2-甲氧基甲基-2-甲基伸丙基等烷氧基取代伸烷基等(取代位置之數值係設為自茀環側之碳附上者)。 Specific examples of the substituted alkylene include alkyl-substituted alkylene such as cyclobutylmethylene, cyclopentylmethylene, cyclohexylmethylene, and 1-cyclohexylpropyl; Phenylmethylene, 1-phenyleneethyl, 1-phenylenepropyl and other aryl substituted alkylenes; 1,1,2,2-tetrafluoroethylene, trichloromethylmethylene, triphenylene Halogen atoms such as fluoromethylmethylene are substituted for alkylene; alkoxy groups such as 2-methoxymethyl-2-methylpropylene are substituted for alkylene, etc. Carbon attachments).

又,於本發明之三茀二酯中,鍵結茀單元a之伸芳基並無特別限定,就連同提高下述之茀比率之觀點而言,其碳數通常為4以上,又通常為10以下,較佳為8以下,更佳為6以下。 In the tertiary diester of the present invention, the arylene group to which the fluorene unit a is bonded is not particularly limited. From the viewpoint of increasing the ratio of fluorene described below, the number of carbon atoms is usually 4 or more, and usually 10 or less, preferably 8 or less, and more preferably 6 or less.

上述伸芳基之具體結構係於以下進行列舉,並不限定於該等,可列舉:1,2-伸苯基、1,3-伸苯基、1,4-伸苯基等伸苯基;1,5-伸萘基、2,6-伸萘基等伸萘基;2,5-伸吡啶基、2,4-伸噻吩基、2,4-伸呋喃基等雜伸芳基。 The specific structure of the above-mentioned arylene group is listed below, and is not limited thereto. Examples include 1,2-phenylene, 1,3-phenylene, and 1,4-phenylene. ; 1,5-naphthyl, 2,6-naphthyl and other arylenes; 2,5-pyridyl, 2,4-thienyl, 2,4-furanyl and other heteroarylenes.

作為該等伸芳基可具有之取代基,可列舉:鹵素原子(例如,氟原子、氯原子、溴原子、碘原子);碳數1~10之烷基(例如,甲基、乙基、異丙基等);碳數1~10之烷氧基(例如,甲氧基、乙氧基等);碳數1~10之醯基(例如,乙醯基、苯甲醯基等);碳數1~10之醯胺基(例如,乙醯胺基、苯甲醯胺基等);硝基;氰基等。該等取代基之數 量並無特別限定,較佳為1~3個。於取代基為2個以上之情形時,取代基之種類可相同亦可不同。又,就連同工業上可廉價地製造之觀點而言,較佳為未經取代。 Examples of the substituent which the arylene group may have include a halogen atom (for example, a fluorine atom, a chlorine atom, a bromine atom, and an iodine atom); and an alkyl group having 1 to 10 carbon atoms (for example, methyl, ethyl, Isopropyl, etc.); alkoxy groups (e.g., methoxy, ethoxy, etc.) having 1 to 10 carbon atoms; fluorenyl groups (e.g., ethenyl, benzyl, etc.) having 1 to 10 carbon atoms; Amidino groups having 1 to 10 carbon atoms (for example, acetamido, benzamidine, etc.); nitro; cyano, and the like. Number of such substituents The amount is not particularly limited, but is preferably 1 to 3. When there are two or more substituents, the kinds of the substituents may be the same or different. Moreover, it is preferable that it is unsubstituted in view of the fact that it can be manufactured inexpensively industrially.

作為可經取代之伸芳基之具體例,可列舉:2-甲基-1,4-伸苯基、3-甲基-1,4-伸苯基、3,5-二甲基-1,4-伸苯基、3-甲氧基-1,4-伸苯基、3-三氟甲基-1,4-伸苯基、2,5-二甲氧基-1,4-伸苯基、2,3,5,6-四氟-1,4-伸苯基、2,3,5,6-四氯-1,4-伸苯基、3-硝基-1,4-伸苯基、3-氰基-1,4-伸苯基等。 Specific examples of the arylene group which may be substituted include 2-methyl-1,4-phenylene, 3-methyl-1,4-phenylene, and 3,5-dimethyl-1 1,4-phenylene, 3-methoxy-1,4-phenylene, 3-trifluoromethyl-1,4-phenylene, 2,5-dimethoxy-1,4-phenylene Phenyl, 2,3,5,6-tetrafluoro-1,4-phenylene, 2,3,5,6-tetrachloro-1,4-phenylene, 3-nitro-1,4- Phenylene, 3-cyano-1,4-phenylene and the like.

進而,於本發明之三茀二酯中,鍵結茀單元a之伸芳烷基並無特別限定,就連同提高下述之茀比率之觀點而言,、其碳數通常為6以上,又通常為10以下,較佳為9以下,更佳為8以下。 Furthermore, in the tertiary diester of the present invention, the aralkyl group to which the fluorene unit a is bonded is not particularly limited. From the viewpoint of increasing the ratio of fluorene described below, its carbon number is usually 6 or more, and It is usually 10 or less, preferably 9 or less, and more preferably 8 or less.

上述伸芳烷基之具體結構係於以下進行列舉,並不限定於該等,可列舉:如下述[C]群所示之伸芳烷基。 The specific structure of the above-mentioned aralkyl group is exemplified below, and is not limited thereto. Examples include the aralkyl group shown in the following [C] group.

作為該伸芳烷基可具有之取代基,可列舉:鹵素原子(例如,氟原子、氯原子、溴原子、碘原子);碳數1~10之烷基(例如,甲基、乙基、異丙基等);碳數1~10之烷氧基(例如,甲氧基、乙氧基等);碳數1~10之醯基(例如,乙醯基、苯甲醯基等);碳數1~10之醯胺基(例如,乙醯胺基、苯甲醯胺基等);硝基;氰基;可具有選自鹵素原子(例如,氟原子、氯原子、溴原子、碘原子)、碳數1~10之烷基(例如,甲基、乙基、異丙基等)、碳數1~10之烷氧基(例如,甲氧基、乙氧基等)、碳數1~10之醯基(例如,乙醯基苯甲醯基等)、碳數1~10之醯胺基(例如,乙醯胺基、苯甲醯胺基等)、硝基、氰基等之1~3個 取代基之碳數6~10之芳基(例如,苯基、萘基等)等。該等取代基之數量並無特別限定,較佳為1~3個。於取代基為2個以上之情形時,取代基之種類可相同亦可不同。又,就連同工業上可廉價地製造之觀點而言,較佳為未經取代。 Examples of the substituent which the aralkyl group may have include a halogen atom (for example, a fluorine atom, a chlorine atom, a bromine atom, and an iodine atom); and an alkyl group having 1 to 10 carbon atoms (for example, methyl, ethyl, Isopropyl, etc.); alkoxy groups (e.g., methoxy, ethoxy, etc.) having 1 to 10 carbon atoms; fluorenyl groups (e.g., ethenyl, benzyl, etc.) having 1 to 10 carbon atoms; Amidino groups having 1 to 10 carbon atoms (for example, acetamido, benzamidine, etc.); nitro; cyano; may have a halogen atom (for example, fluorine atom, chlorine atom, bromine atom, iodine) Atom), alkyl group with 1 to 10 carbon atoms (for example, methyl, ethyl, isopropyl, etc.), alkoxy group with 1 to 10 carbon atoms (for example, methoxy group, ethoxy group, etc.), carbon number 1 to 10 fluorenyl groups (for example, ethenyl benzamidine group, etc.), 1 to 10 carbon atoms of fluorenyl group (for example, acetamidine group, benzamidine group, etc.), nitro, cyano, etc. 1 to 3 An aryl group having 6 to 10 carbon atoms (for example, phenyl, naphthyl, etc.) as a substituent. The number of these substituents is not particularly limited, but is preferably 1 to 3. When there are two or more substituents, the kinds of the substituents may be the same or different. Moreover, it is preferable that it is unsubstituted in view of the fact that it can be manufactured inexpensively industrially.

作為可經取代之伸芳烷基之具體例,可列舉:2-甲基-1,4-苯二甲基、2,5-二甲基-1,4-苯二甲基、2-甲氧基-1,4-苯二甲基、2,5-二甲氧基-1,4-苯二甲基、2,3,5,6-四氟-1,4-苯二甲基、α,α-二甲基-1,4-苯二甲基、α,α,α',α'-四甲基-1,4-苯二甲基等。 Specific examples of the substituted aralkyl group include 2-methyl-1,4-benzenedimethyl, 2,5-dimethyl-1,4-benzenedimethyl, 2-methyl Oxy-1,4-benzenedimethyl, 2,5-dimethoxy-1,4-benzenedimethyl, 2,3,5,6-tetrafluoro-1,4-benzenedimethyl, α, α-dimethyl-1,4-xylylene, α, α, α ', α'-tetramethyl-1,4-xylylene, etc.

該等中,就連同提高茀比率,結構剛直之觀點而言,較佳為伸烷基,更佳為亞甲基、伸乙基、伸苯基、或1,4-苯二甲基,進而較佳為亞甲基。尤其是為亞甲基之情形時,因選擇性地具有1個反應性官能基之寡聚茀之合成容易,故而尤佳。 Among these, from the viewpoint of increasing the ratio of fluorene and the rigidity of the structure, it is preferably an alkylene group, more preferably a methylene group, an ethylene group, a phenylene group, or a 1,4-benzenedimethyl group. Methylene is preferred. Especially in the case of a methylene group, it is particularly preferable because the synthesis of an oligomeric fluorene having one reactive functional group is easy.

<1.2茀單元a可具有之取代基> <1.2 The substituent which the unit a may have>

於本發明之三茀二酯中,作為上述茀單元a可具有之取代基,可列舉:鹵素原子(例如,氟原子、氯原子、溴原子、碘原子);碳數1~10之烷基(例如,甲基、乙基、異丙基等);碳數1~10之烷氧基(例如,甲氧基、乙氧基等);碳數1~10之醯基(例如,乙醯基、苯甲醯基等);碳數1~10之醯胺基(例如,乙醯胺基、苯甲醯胺基等);硝基;氰基;可具有選自鹵素原子(例如,氟原子、氯原子、溴原子、碘原子)、碳數1~10之烷基(例如,甲基、乙基、異丙基等)、碳數1~10之烷氧基(例如,甲氧基、乙氧基等)、碳數1~10之醯基(例如,乙醯基、苯甲醯基等)、碳數1~10之醯胺基(例如,乙醯胺基、苯甲醯胺基等)、硝基、氰基等之1~3個取代基之碳數6~10之芳基(例如,苯基、萘基等)等。關於該等取代基之數量,並無特別限定,較佳為1~3個。於取代基為2個以上之情形時,取代基之種類可相同亦可不同。又,就連同工業上可廉價地製造之觀點而言,較佳為未經取代。 In the trifluorene diester of the present invention, examples of the substituent that the fluorene unit a may have include a halogen atom (for example, a fluorine atom, a chlorine atom, a bromine atom, and an iodine atom); an alkyl group having 1 to 10 carbon atoms (E.g., methyl, ethyl, isopropyl, etc.); alkoxy (e.g., methoxy, ethoxy, etc.) having 1 to 10 carbon atoms; fluorenyl (e.g., acetamidine) having 1 to 10 carbon atoms Group, benzamidine group, etc.); amidino group having 1 to 10 carbon atoms (for example, acetoamino group, benzamidine group, etc.); nitro group; cyano group; may have a halogen atom (for example, fluorine Atom, chlorine atom, bromine atom, iodine atom), alkyl group having 1 to 10 carbon atoms (for example, methyl, ethyl, isopropyl, etc.), alkoxy group having 1 to 10 carbon atoms (for example, methoxy group) , Ethoxy, etc.), fluorenyl groups having 1 to 10 carbons (for example, ethenyl, benzamidine, etc.), fluorenyl groups having 1 to 10 carbons (for example, acetamido, benzylamine) Aryl groups such as nitro, cyano and the like having 1 to 3 substituents and 6 to 10 carbon atoms (for example, phenyl, naphthyl, etc.). The number of such substituents is not particularly limited, but is preferably one to three. When there are two or more substituents, the kinds of the substituents may be the same or different. Moreover, it is preferable that it is unsubstituted in view of the fact that it can be manufactured inexpensively industrially.

<1.3酯基> <1.3 ester group>

本發明之三茀二酯可設為如下者:3個茀單元a中,使取代基α1及α2分別鍵結於位置於兩末端之茀單元a之9位之碳原子,且於該取代基α1及α2鍵結有酯基。於該情形時,α1與α2可相同亦可不同。又,取代基α1及α2亦可包含直接鍵,即酯基直接鍵結於茀單元a之9位之碳原子。 The trifluorene diester of the present invention can be set as follows: In the three fluorene units a, the substituents α 1 and α 2 are respectively bonded to the carbon atom at the 9-position of the fluorene unit a at the two ends, and The substituents α 1 and α 2 are bonded to an ester group. In this case, α 1 and α 2 may be the same or different. The substituents α 1 and α 2 may also include a direct bond, that is, an ester group is directly bonded to the carbon atom at the 9-position of the fluorene unit a.

作為本發明之三茀二酯所具有之酯基,並無特別限定,就連同工業上可廉價地獲取之觀點而言,,較佳為末端基為碳數1~10之有機取代基之酯基。 The ester group of the tertiary diester of the present invention is not particularly limited. From the viewpoint of industrial availability, the ester group is preferably an ester having an organic substituent having 1 to 10 carbon atoms in the terminal group. base.

碳數1~10之有機取代基之具體例係於以下進行列舉,並不限定於該等,可列舉:甲基、乙基、正丙基、正丁基、正戊基、正己基、正癸基等直鏈狀之烷基;異丙基、2-甲基丙基、2,2-二甲基丙基、2-乙基己基等包含側鏈之烷基;環丙基、環戊基、環己基、環辛基等環狀之烷基;苯基、1-萘基、2-萘基等芳基;2-吡啶基、2-噻吩基、2-呋喃基等雜芳基;苄基、2-苯基乙基、對甲氧基苄基等芳烷基等。 Specific examples of the organic substituent having 1 to 10 carbon atoms are listed below and are not limited thereto. Examples include methyl, ethyl, n-propyl, n-butyl, n-pentyl, n-hexyl, and n- Linear alkyl groups such as decyl; isopropyl, 2-methylpropyl, 2,2-dimethylpropyl, 2-ethylhexyl and other alkyl groups containing side chains; cyclopropyl, cyclopentyl Cyclic alkyl groups such as alkyl, cyclohexyl, cyclooctyl; aryl groups such as phenyl, 1-naphthyl, 2-naphthyl; heteroaryl groups such as 2-pyridyl, 2-thienyl, 2-furyl; Aralkyl groups such as benzyl, 2-phenylethyl, and p-methoxybenzyl, and the like.

該等中,就連同工業上可廉價地獲取之觀點而言,較佳為碳數1~6之烷基。於該情形時,就連同合成中容易水解而容易產生羧酸之觀點而言,碳數較佳為2以上,又,藉由將與二羥基化合物之酯交換中所產生之低沸點之醇去除而可有效率地合成聚酯及聚酯碳酸酯之觀點而言,較佳為4以下,更佳為2以下。尤佳之取代基為乙基。 Among these, an alkyl group having 1 to 6 carbon atoms is preferable from the viewpoint that it is industrially available at low cost. In this case, the carbon number is preferably 2 or more from the viewpoint of easy hydrolysis and synthesis of a carboxylic acid in the synthesis, and by removing a low-boiling-point alcohol produced by transesterification with a dihydroxy compound From the viewpoint of efficiently synthesizing polyester and polyester carbonate, it is preferably 4 or less, and more preferably 2 or less. A particularly preferred substituent is ethyl.

另一方面,於碳數6~8之芳基之情形時,酯交換反應容易進行,因此可藉由將本發明之二酯化合物與二羥基化合物、碳酸二酯一次性添加於反應器中,而於第1階段合成作為較佳之聚合物之聚酯碳酸酯,故而較佳。於該情形時,就連同分子量較小,容易進行蒸餾去除之觀點而言,碳數較佳為8以下,更佳為6以下。尤其是聚酯碳酸酯合成後,作為苯酚可蒸餾去除之苯基尤佳。又,於芳基之情形時,就 聚合時之反應性之觀點而言,較佳為使用下述之碳酸二芳酯類作為碳酸二酯,就連同可容易地去除副產物之觀點而言,更佳為酯基中之芳基、與碳酸二芳酯類中之芳基相同。 On the other hand, in the case of an aryl group having 6 to 8 carbon atoms, the transesterification reaction easily proceeds. Therefore, the diester compound, dihydroxy compound, and carbonic acid diester of the present invention can be added to the reactor at one time. In the first stage, polyester carbonate, which is a better polymer, is synthesized, so it is better. In this case, the number of carbons is preferably 8 or less, more preferably 6 or less, from the viewpoint that the molecular weight is small and the distillation is easy to remove. Especially after the synthesis of polyester carbonate, phenyl which can be distilled off by phenol is particularly preferred. In the case of aryl, From the viewpoint of reactivity at the time of polymerization, it is preferable to use the following diaryl carbonates as the carbonic acid diester, and from the viewpoint of easily removing by-products, the aryl group in the ester group, Same as aryl group in diaryl carbonates.

<1.4取代基α1及α2> <1.4 Substituents α 1 and α 2 >

作為取代基α1及α2,並無特別限定,可列舉:直接鍵、可經取代之碳數1~10之伸烷基、可經取代之碳數4~10之伸芳基、或可經取代之碳數6~10之伸芳烷基、或選自由可經取代之碳數1~10之伸烷基、可經取代之碳數4~10之伸芳基及可經取代之碳數6~10之伸芳烷基所組成之群中之2個以上之基由氧原子、可經取代之硫原子、可經取代之氮原子或羰基連結而成之基。 The substituents α 1 and α 2 are not particularly limited, and examples thereof include a direct bond, an alkylene group having 1 to 10 carbon atoms which may be substituted, an arylene group having 4 to 10 carbon atoms which may be substituted, or Substituted aralkyl groups having 6 to 10 carbons, or selected from substitutable carbon groups of 1 to 10 carbons, substitutable arylene groups of 4 to 10 carbons, and substitutable carbons Two or more groups in the group consisting of 6 to 10 aralkyl groups are groups formed by bonding oxygen atoms, sulfur atoms that may be substituted, nitrogen atoms that may be substituted, or carbonyl groups.

作為「可經取代之碳數1~10之伸烷基」,可較佳地使用作為鍵結茀單元a之伸烷基所例示者。於該情形時,就連同顯現反波長色散性之觀點而言,較佳為使用碳數為2以上者。另一方面,就連同顯現平坦分散性之觀點而言,較佳為將其碳數設為1。進而,於使反波長色散性顯現之情形時,就連同相對於主鏈容易固定茀環之配向而有效率地獲得反波長色散特性之觀點而言,碳數較佳為5以下,更佳為4以下,進而較佳為3以下,尤佳為2以下。另一方面,就連同向樹脂組合物賦予柔軟性之觀點而言,其碳數較佳為2以上,更佳為3以上,進而較佳為4以上。 As the "alkylene group having 1 to 10 carbon atoms which may be substituted", examples exemplified as the alkylene group of the bonded fluorene unit a can be preferably used. In this case, it is preferable to use a carbon number of 2 or more from the viewpoint of exhibiting inverse wavelength dispersion. On the other hand, it is preferable to set the carbon number to 1 from the viewpoint of showing flat dispersibility. Furthermore, when the inverse wavelength dispersion property is exhibited, the number of carbons is preferably 5 or less from the viewpoint of efficiently obtaining the inverse wavelength dispersion characteristics with the orientation of the fluorene ring easily fixed to the main chain. 4 or less, more preferably 3 or less, and even more preferably 2 or less. On the other hand, from the viewpoint of imparting flexibility to the resin composition, the number of carbons is preferably 2 or more, more preferably 3 or more, and even more preferably 4 or more.

作為「可經取代之碳數4~10之伸芳基」,可較佳地使用作為鍵結茀單元a之伸芳基所例示者。同樣地,作為「可經取代之碳數6~10之伸芳烷基」,可較佳地使用作為鍵結茀單元a之伸芳烷基所例示者。 As "the arylene group having 4 to 10 carbon atoms which can be substituted", those exemplified as the arylene group of the bonded fluorene unit a can be preferably used. Similarly, as the "arylene group having 6 to 10 carbon atoms which can be substituted", the exemplified as the aralkyl group as the bonded fluorene unit a can be preferably used.

「選自由可經取代之碳數1~10之伸烷基、可經取代之碳數4~10之伸芳基及可經取代之碳數6~10之伸芳烷基所組成之群中之2個以上之基由氧原子、可經取代之硫原子、可經取代之氮原子或羰基連結而成之基」之具體結構係於以下進行列舉,並不限定於該等,可列舉 如下述[D]群所示之2價之基。 "Selected from the group consisting of an alkylene group having 1 to 10 carbon atoms that can be substituted, an alkylene group having 4 to 10 carbon atoms that can be substituted, and an alkylene group having 6 to 10 carbon atoms that can be substituted The specific structure in which two or more groups are linked by an oxygen atom, a sulfur atom that may be substituted, a nitrogen atom that may be substituted, or a carbonyl group "is exemplified below, and is not limited to these. The divalent base is shown in the following [D] group.

該等中,較佳為可保持樹脂組合物之透明性與穩定性不變而賦予柔軟性之選自伸烷基、伸芳基或伸芳烷基之2個以上之基由氧原子連結而成的基,更佳為一面賦予柔軟性一面可提高樹脂組合物之玻璃轉移溫度之如下述[E]群所示之伸烷基由氧原子連結而成之基。 Among these, it is preferred that two or more groups selected from the group consisting of an alkylene group, an arylene group, or an aralkylene group are bonded by an oxygen atom while maintaining transparency and stability of the resin composition and imparting flexibility. The formed group is more preferably a group formed by bonding an oxygen atom to an alkylene group shown in the following [E] group while imparting flexibility while increasing the glass transition temperature of the resin composition.

又,就連同提高茀比率之觀點而言,於設為該等連結而成之基之情形時,較佳為將其碳數設為2以上,又較佳為設為6以下,更佳為設為4以下。 In addition, from the viewpoint of increasing the ratio of radon, in the case of using these connected bases, the number of carbons is preferably set to 2 or more, and further preferably set to 6 or less, more preferably Set it to 4 or less.

該等中,於取代基α1及α2中之至少1個為直接鍵,或者取代基α1及α2中之至少1個之碳數為2以上之情形時,茀環(茀單元a)大致垂直配向於主鏈,因此有如下傾向:即便樹脂組合物中之2價之三茀之比例為少量,亦變得容易顯現反波長色散性。於後者之情形時,就相同之觀點而言,較佳為將α1及α2兩者設為碳數2以上者。另一方面,於將取代基α1及α2兩者設為碳數1者(即,可經取代之亞甲基)之情形時,茀環(茀單元)並非大致垂直配向於主鏈而是以較大傾斜進行配向,因此 有如下傾向:即便使樹脂組合物中之2價之三茀之比例於較廣範圍內進行變化,亦容易成為於寬頻帶相位差之差較小之平面色散性。 Among these, when at least one of the substituents α 1 and α 2 is a direct bond, or when the carbon number of at least one of the substituents α 1 and α 2 is 2 or more, the fluorene ring (茀 unit a ) Is aligned approximately perpendicularly to the main chain, and therefore tends to exhibit reverse wavelength dispersion even if the ratio of divalent triad in the resin composition is small. In the latter case, from the same viewpoint, it is preferable that both α 1 and α 2 have a carbon number of 2 or more. On the other hand, in a case where both of the substituents α 1 and α 2 are set to one carbon number (that is, a methylene group which may be substituted), the fluorene ring (fluorene unit) is not aligned substantially vertically to the main chain but Orientation is performed with a large inclination, so there is a tendency that even if the ratio of the divalent triad in the resin composition is changed in a wide range, it is easy to become a plane dispersion with a small difference in wide-band phase difference. Sex.

該等中,較佳為直接鍵、可經取代之碳數1~10之伸烷基、可經取代之碳數4~10之伸芳基、或選自由可經取代之碳數1~10之伸烷基、可經取代之碳數4~10之伸芳基及可經取代之碳數6~10之伸芳烷基所組成之群中之2個以上之基由氧原子、可經取代之硫原子、可經取代之氮原子或羰基連結而成之基。 Among these, a direct bond, an alkylene group having 1 to 10 carbon atoms which can be substituted, an arylene group having 4 to 10 carbon atoms which can be substituted, or a group selected from the group consisting of 1 to 10 carbon atoms which can be substituted 2 or more of the group consisting of an alkylene group that can be substituted, an alkylene group that has 4 to 10 carbon atoms, and an alkylene group that can be substituted with 6 to 10 carbon atoms are composed of an oxygen atom, Substituted sulfur atom, a group which may be connected by a substituted nitrogen atom or a carbonyl group.

更佳為直接鍵、直鏈狀之伸烷基、包含側鏈之伸烷基、如上述[A]群所示之脂環結構之任意2處具有直鏈狀或側鏈狀之伸烷基之鍵結鍵的脂環式伸烷基、伸苯基或選自由可經取代之碳數1~10之伸烷基、可經取代之碳數4~10之伸芳基及可經取代之碳數6~10之伸芳烷基所組成之群中之2個以上之基由氧原子連結而成之基。 More preferred are a straight bond, a straight chain alkylene group, a side chain-containing alkylene group, and a linear or side chain-type alkylene group at any two positions of the alicyclic structure shown in the above [A] group. The alicyclic alkylene, phenylene, or bond selected from the group consisting of an alkylene having 1 to 10 carbon atoms that can be substituted, an alkylene having 4 to 10 carbon atoms that can be substituted, and a substituted one Two or more radicals in a group consisting of an aralkyl group having 6 to 10 carbon atoms are connected by oxygen atoms.

進而較佳為有因不具有芳香環而可達成光學膜所要求之較低光彈性係數之傾向的直接鍵、亞甲基、伸乙基、正伸丙基、正伸丁基、甲基亞甲基、1-甲基伸乙基、2-甲基伸乙基、2,2-二甲基伸丙基、2-甲氧基甲基-2-甲基伸丙基或如下述[F]群所示之脂環式伸烷基。 Further preferred are direct bonds, methylene, ethylidene, n-propylidene, n-butylidene, and methylmethylene, which have a tendency to achieve a lower photoelastic coefficient required for optical films because they do not have an aromatic ring. , 1-methylphenylethyl, 2-methylphenylethyl, 2,2-dimethylphenylpropyl, 2-methoxymethyl-2-methylphenylpropyl, or the following [F] group The alicyclic alkylene shown.

(上述[F]群所示之各環結構中之2個鍵結鍵之取代位置為任意,且亦可2個鍵結鍵於同一碳進行取代)。 (The substitution positions of the two bonding bonds in each ring structure shown in the above [F] group are arbitrary, and the two bonding bonds may be substituted on the same carbon).

進而更佳為直接鍵、亞甲基、伸乙基、正伸丙基、正伸丁基、甲基亞甲基、1-甲基伸乙基、2-甲基伸乙基、或2,2-二甲基伸丙基。尤佳為亞甲基、伸乙基、或正伸丙基。 Furthermore, it is more preferably a direct bond, methylene, ethylidene, n-propylidene, n-butylidene, methylmethylene, 1-methylidene, 2-methylidene, or 2,2- Dimethylpropane. Especially preferred are methylene, ethyl, or n-propyl.

有若鏈長較長,則玻璃轉移溫度變低之傾向,因此較佳為較短之鏈狀之基,例如碳數2以下之基。進而,有因分子結構變小,故可使重複單元中之茀環之濃度(茀比率)變高之傾向,因此可高效率地顯現所需之光學物性。又,有即便相對於樹脂組合物整體之質量以任意之質量含有,亦可為相位差之波長色散性較小之平面色散之傾向,進而亦有可以短階段且工業上廉價地導入之優勢,因此較佳為亞甲基。 If the chain length is longer, the glass transition temperature tends to be lower. Therefore, a shorter chain-like base such as a base having 2 or less carbon atoms is preferred. Furthermore, since the molecular structure becomes smaller, the concentration of the fluorene ring (fluorene ratio) in the repeating unit tends to be high, so that the required optical physical properties can be developed efficiently. In addition, even if it is contained in an arbitrary mass with respect to the entire mass of the resin composition, there is a tendency that it can be a plane dispersion with a small phase dispersion and a small wavelength dispersion, and it also has the advantage that it can be introduced in a short stage and industrially inexpensively. Therefore, methylene is preferred.

另一方面,為了改善所獲得之膜之機械強度或高溫下之可靠性,較佳為可提高樹脂組合物之玻璃轉移溫度之碳數4~10之伸芳基、或選自由可經取代之碳數1~10之伸烷基及可經取代之碳數4~10之伸芳基所組成之群中之2個以上之基由氧原子連結而成之基,更佳為1,4-伸苯基、1,5-伸萘基、2,6-伸萘基、或如下述[D2]群所示之2價之基。 On the other hand, in order to improve the mechanical strength or reliability at high temperature of the obtained film, it is preferred that the aryl group having a carbon number of 4 to 10 which can increase the glass transition temperature of the resin composition, or selected from the group consisting of An alkylene group having 1 to 10 carbon atoms and an arylene group having 4 to 10 carbon atoms that can be substituted. Two or more groups are connected by oxygen atoms, and more preferably 1,4- A phenylene group, a 1,5-naphthyl group, a 2,6-naphthyl group, or a divalent group represented by the following [D2] group.

又,於向具有反波長色散性之相位差膜進行應用之情形時,重要的是適當選擇取代基α1及α2。例如亞甲基所代表之碳數1之基出乎意料地有反波長色散性較低之傾向,因此R1及R2較佳為直接鍵、或者其中至少一者為碳數2以上之基。 When applying to a retardation film having inverse wavelength dispersion, it is important to appropriately select the substituents α 1 and α 2 . For example, a base of carbon number 1 represented by methylene has an unexpected tendency to have low inverse wavelength dispersion. Therefore, R 1 and R 2 are preferably a direct bond, or at least one of them is a base of carbon number 2 or more. .

更佳為直接鍵、可經取代之碳數2~10之伸烷基、可經取代之碳數4~10之伸芳基、或選自由可經取代之碳數1~10之伸烷基、可經取代之碳數4~10之伸芳基及可經取代之碳數6~10之伸芳烷基所組成之群中之2個以上之基由氧原子、可經取代之硫原子、可經取代之氮原子或羰基連結而成之基。 More preferably, it is a direct bond, an alkylene group having 2 to 10 carbon atoms that can be substituted, an alkylene group having 4 to 10 carbon atoms that can be substituted, or an alkylene group having 1 to 10 carbon atoms that can be substituted. 2 or more of the group consisting of an arylene group having 4 to 10 carbon atoms that can be substituted and an aralkyl group having 6 to 10 carbon atoms that can be substituted are an oxygen atom, a sulfur atom that can be substituted 2. A group which can be linked by a substituted nitrogen atom or a carbonyl group.

進而較佳為直接鍵、直鏈狀之伸烷基、包含側鏈之伸烷基、如 上述[A]群所示之脂環結構之任意2處具有直鏈狀或側鏈狀之伸烷基之鍵結鍵的脂環式伸烷基、伸苯基、或選自由可經取代之碳數1~10之伸烷基、可經取代之碳數4~10之伸芳基及可經取代之碳數6~10之伸芳烷基所組成之群中之2個以上之基由氧原子連結而成之基。 Furthermore, it is preferably a direct bond, a linear alkylene, an alkylene containing a side chain, such as The alicyclic alkylene group having a linear or side chain alkylene bond at any two positions in the alicyclic structure shown in the above-mentioned [A] group, a phenylene group, or a group selected from the group consisting of Two or more of the group consisting of an alkylene group having 1 to 10 carbon atoms, an alkylene group having 4 to 10 carbon atoms that can be substituted and an alkylene group having 6 to 10 carbon atoms that can be substituted A radical formed by the bonding of oxygen atoms.

進而更佳為因不具有芳香環而可達成光學膜所要求之較低光彈性係數之直接鍵、伸乙基、正伸丙基、正伸丁基、甲基亞甲基、1-甲基伸乙基、2-甲基伸乙基、2,2-二甲基伸丙基、2-甲氧基甲基-2-甲基伸丙基或如上述[F]群所示之脂環式伸烷基、或者可提高樹脂組合物之玻璃轉移溫度之1,4-伸苯基、選自由可經取代之碳數1~10之伸烷基及可經取代之碳數4~10之伸芳基所組成之群中之2個以上之基由氧原子連結而成之基。 Furthermore, it is more preferable because it does not have an aromatic ring, and can achieve the lower photoelastic coefficient of the direct bond required by optical films. Ethyl, n-propyl, n-butyl, methylmethylene, 1-methyl ethylene Phenylene, 2-methylethenyl, 2,2-dimethylethenyl, 2-methoxymethyl-2-methylethenyl, or alicyclic type as shown in the above [F] group Alkyl, or 1,4-phenylene which can increase the glass transition temperature of the resin composition, selected from the group consisting of an alkylene group having 1 to 10 carbon atoms which can be substituted and an aromatic compound having 4 to 10 carbon atoms which can be substituted In the group consisting of two or more groups, two or more groups are connected by oxygen atoms.

尤佳為直接鍵、伸乙基、正伸丙基、正伸丁基、甲基亞甲基、1-甲基伸乙基、2-甲基伸乙基、或2,2-二甲基伸丙基。 Especially preferred are direct bond, ethyl, n-propyl, n-butyl, methylmethylene, 1-methylethyl, 2-methylethyl, or 2,2-dimethylene base.

最佳為伸乙基、或正伸丙基。有若鏈長較長,則玻璃轉移溫度變低之傾向,因此較佳為較短之鏈狀之基,例如碳數3以下之基。進而,因分子結構變小,故可使重複單元中之茀環之濃度(茀比率)變高,因此可高效率地顯現所需之光學物性。 Ethyl or propyl is preferred. If the chain length is longer, the glass transition temperature tends to be lower. Therefore, a shorter chain-like base such as a base having 3 or less carbon atoms is preferred. Furthermore, since the molecular structure becomes smaller, the concentration (fluorene ratio) of the fluorene ring in the repeating unit can be increased, and thus the required optical physical properties can be developed efficiently.

又,取代基α1及α2相同係使製造變容易,故而較佳。 The same substituents α 1 and α 2 are preferred because they facilitate production.

<1.5具體之結構> <1.5 Specific Structure>

作為本發明之三茀二酯,具體而言,可較佳地使用下述通式(1)所表示者。 As the tertiary diester of the present invention, specifically, those represented by the following general formula (1) can be preferably used.

(式中,R1及R2分別獨立為直接鍵、或可具有取代基之碳數1~4之伸烷基。 (In the formula, R 1 and R 2 are each independently a direct bond or an alkylene group having 1 to 4 carbon atoms which may have a substituent.

R3a及R3b分別獨立為可經取代之碳數1~10之伸烷基、可經取代之碳數4~10之伸芳基、或可經取代之碳數6~10之伸芳烷基。 R 3a and R 3b are each independently an alkylene group having 1 to 10 carbon atoms which can be substituted, an alkylene group having 4 to 10 carbon atoms which can be substituted, or an alkylene group having 6 to 10 carbon atoms which can be substituted base.

R4~R9分別獨立為氫原子、可具有取代基之碳數1~10之烷基、可具有取代基之炭4~10之芳基、可具有取代基之碳數1~10之醯基、可具有取代基之碳數1~10之醯氧基、可具有取代基之碳數1~10之烷氧基、可具有取代基之碳數1~10之芳氧基、可具有取代基之胺基、可具有取代基之碳數1~10之乙烯基、可具有取代基之碳數1~10之乙炔基、具有取代基之硫原子、具有取代基之矽原子、鹵素原子、硝基、或氰基。其中,R4~R9中鄰接之至少2個基亦可相互鍵結而形成環。 R 4 to R 9 are each independently a hydrogen atom, an alkyl group having 1 to 10 carbons which may have a substituent, an aryl group having 4 to 10 carbons which may have a substituent, and 1 to 10 carbon atoms which may have a substituent Group, fluorenyloxy group having 1 to 10 carbon atoms which may have a substituent, alkoxyl group having 1 to 10 carbon atoms which may have a substituent, aryloxy group having 1 to 10 carbon atoms which may have a substituent, may have a substituent Amine group of the group, vinyl group having 1 to 10 carbons which may have a substituent, ethynyl group having 1 to 10 carbons which may have a substituent, sulfur atom having a substituent, silicon atom having a substituent, halogen atom, Nitro, or cyano. Among them, at least two adjacent groups in R 4 to R 9 may be bonded to each other to form a ring.

R10為碳數1~10之有機取代基)。 R 10 is an organic substituent having 1 to 10 carbon atoms).

再者,通式(1)中,R3a及R3b各自可相同亦可不同。又,通式(1)中各有3個之R4~R9各自可相同亦可不同。同樣地,通式(1)中有2個之R10各自可相同亦可不同。 In the general formula (1), R 3a and R 3b may be the same or different. In addition, each of R 4 to R 9 in the general formula (1) may be the same or different. Similarly, two of R 10 in the general formula (1) may be the same or different.

於上述通式(1)之R1及R2中,作為「可具有取代基之碳數1~4之伸烷基」,可較佳地使用於上述《發明1》之R1及R2之該基中所例示者。 In R 1 and R 2 of the above general formula (1), as "an alkylene group having 1 to 4 carbon atoms which may have a substituent", R 1 and R 2 of the above-mentioned "Invention 1" can be preferably used. Illustrated in the base.

同樣地,作為R3a及R3b,可較佳地使用於<1.1伸烷基、伸芳基、伸芳烷基>中所例示者。再者,於本說明書中,有將R3a及R3b與R3一併進行記載之情形。 Similarly, as R 3a and R 3b , those exemplified in <1.1 Alkenyl, Arylene, and Arylene> can be preferably used. In addition, in this specification, R 3a and R 3b may be described together with R 3 .

又,作為R10,可較佳地使用於<1.3酯基>中作為碳數1~10之有機取代基所例示者。 In addition, as R 10 , those exemplified as the organic substituent having 1 to 10 carbon atoms in <1.3 ester group> can be preferably used.

R4~R9中,「可經取代之碳數1~10之烷基」之具體結構係於以下 進行列舉,並不限定於該等,可列舉:甲基、乙基、正丙基、正丁基、正戊基、正己基、正癸基等直鏈狀之烷基;異丙基、2-甲基丙基、2,2-二甲基丙基、2-乙基己基等包含側鏈之烷基;環丙基、環戊基、環己基、環辛基等環狀之烷基。 In R 4 to R 9 , the specific structure of the "alkyl group having 1 to 10 carbon atoms which may be substituted" is listed below, and is not limited thereto. Examples include methyl, ethyl, n-propyl, Linear alkyl groups such as n-butyl, n-pentyl, n-hexyl, n-decyl; isopropyl, 2-methylpropyl, 2,2-dimethylpropyl, 2-ethylhexyl, etc. Side chain alkyl groups; cyclic alkyl groups such as cyclopropyl, cyclopentyl, cyclohexyl, and cyclooctyl.

可經取代之碳數1~10之烷基中之碳數較佳為4以下,更佳為2以下。若為該範圍內,則有茀環彼此之位阻難以產生,而可獲得源自茀環之所需之光學特性之傾向。 The number of carbon atoms in the alkyl group having 1 to 10 carbon atoms which may be substituted is preferably 4 or less, and more preferably 2 or less. If it is within this range, the steric hindrance of the fluorene rings is difficult to occur, and the optical characteristics required from the fluorene rings tend to be obtained.

作為該烷基可具有之取代基,可列舉:鹵素原子(例如,氟原子、氯原子、溴原子、碘原子);碳數1~10之烷氧基(例如,甲氧基、乙氧基等);碳數1~10之醯基(例如,乙醯基、苯甲醯基等);碳數1~10之醯胺基(例如,乙醯胺基、苯甲醯胺基等);硝基;氰基;可具有選自鹵素原子(例如,氟原子、氯原子、溴原子、碘原子)、碳數1~10之烷基(例如,甲基、乙基、異丙基等)、碳數1~10之烷氧基(例如,甲氧基、乙氧基等)、碳數1~10之醯基(例如,乙醯基、苯甲醯基等)、碳數1~10之醯胺基(例如,乙醯胺基、苯甲醯胺基等)、硝基、氰基等之1~3個取代基之碳數6~10之芳基(例如,苯基、萘基等)等。該等取代基之數量並無特別限定,較佳為1~3個。於取代基為2個以上之情形時,取代基之種類可相同亦可不同。又,就連同工業上可廉價地製造之觀點而言,較佳為未經取代。 Examples of the substituent that the alkyl group may have include a halogen atom (for example, a fluorine atom, a chlorine atom, a bromine atom, and an iodine atom); and an alkoxy group (for example, a methoxy group, an ethoxy group) having 1 to 10 carbon atoms. Etc.); fluorenyl groups having 1 to 10 carbon atoms (for example, acetofluorenyl, benzamidine, etc.); fluorenyl groups having 1 to 10 carbon atoms (for example, acetamido, benzamidine, etc.); Nitro; cyano; may have a halogen atom (for example, fluorine atom, chlorine atom, bromine atom, iodine atom), an alkyl group having 1 to 10 carbon atoms (for example, methyl, ethyl, isopropyl, etc.) , Alkoxy groups with 1 to 10 carbon atoms (for example, methoxy, ethoxy, etc.), fluorenyl groups with 1 to 10 carbon atoms (for example, ethyl fluorenyl, benzyl fluorenyl, etc.), carbon numbers 1 to 10 Sulfonylamino (for example, ethynylamine, benzamidine, etc.), nitro, cyano, etc. 1 to 3 substituents, 6-10 carbon atoms (for example, phenyl, naphthyl and many more. The number of these substituents is not particularly limited, but is preferably 1 to 3. When there are two or more substituents, the kinds of the substituents may be the same or different. Moreover, it is preferable that it is unsubstituted in view of the fact that it can be manufactured inexpensively industrially.

作為可經取代之烷基之具體例,可列舉:三氟甲基、苄基、4-甲氧基苄基、甲氧基甲基等。 Specific examples of the optionally substituted alkyl group include trifluoromethyl, benzyl, 4-methoxybenzyl, and methoxymethyl.

R4~R9中「可經取代之碳數4~10之芳基」之具體結構係於以下進行列舉,並不限定於該等,可列舉:苯基、1-萘基、2-萘基等芳基;2-吡啶基、2-噻吩基、2-呋喃基等雜芳基。 The specific structure of the "aryl group having 4 to 10 carbon atoms which may be substituted" in R 4 to R 9 is listed below and is not limited thereto. Examples include: phenyl, 1-naphthyl, and 2-naphthalene Aryl groups such as alkyl; heteroaryl groups such as 2-pyridyl, 2-thienyl, and 2-furyl.

可經取代之碳數4~10之芳基中之碳數較佳為8以下,更佳為7以下。若為該範圍內,則有茀環彼此之位阻難以產生,而可獲得源自茀 環之所需之光學特性之傾向。 The number of carbon atoms in the aryl group having 4 to 10 carbon atoms that can be substituted is preferably 8 or less, and more preferably 7 or less. If it is within this range, it is difficult for steric rings to have steric hindrance to each other, and it is possible to obtain The desired optical characteristics of the ring.

作為該芳基可具有之取代基,可列舉:鹵素原子(例如,氟原子、氯原子、溴原子、碘原子);碳數1~10之烷基(例如,甲基、乙基、異丙基等);碳數1~10之烷氧基(例如,甲氧基、乙氧基等);碳數1~10之醯基(例如,乙醯基、苯甲醯基等);碳數1~10之醯胺基(例如,乙醯胺基、苯甲醯胺基等);硝基;氰基等。該等取代基之數量並無特別限定,較佳為1~3個。於取代基為2個以上之情形時,取代基之種類可相同亦可不同。又,就連同工業上可廉價地製造之觀點而言,較佳為未經取代。 Examples of the substituent which the aryl group may have include a halogen atom (for example, a fluorine atom, a chlorine atom, a bromine atom, and an iodine atom); and an alkyl group having 1 to 10 carbon atoms (for example, methyl, ethyl, and isopropyl) Alkoxy groups (e.g., methoxy, ethoxy, etc.) having 1 to 10 carbon atoms; fluorenyl groups (e.g., ethenyl, benzyl, etc.) having 1 to 10 carbon atoms; carbon number 1 to 10 amido groups (for example, acetamido, benzamido, etc.); nitro; cyano and the like. The number of these substituents is not particularly limited, but is preferably 1 to 3. When there are two or more substituents, the kinds of the substituents may be the same or different. Moreover, it is preferable that it is unsubstituted in view of the fact that it can be manufactured inexpensively industrially.

作為可經取代之芳基之具體例,可列舉:2-甲基苯基、4-甲基苯基、3,5-二甲基苯基、4-苯甲醯基苯基、4-甲氧基苯基、4-硝基苯基、4-氰基苯基、3-三氟甲基苯基、3,4-二甲氧基苯基、3,4-亞甲基二氧基苯基、2,3,4,5,6-五氟苯基、4-甲基呋喃基等。 Specific examples of the aryl group which may be substituted include 2-methylphenyl, 4-methylphenyl, 3,5-dimethylphenyl, 4-benzylphenyl, 4-methyl Oxyphenyl, 4-nitrophenyl, 4-cyanophenyl, 3-trifluoromethylphenyl, 3,4-dimethoxyphenyl, 3,4-methylenedioxybenzene Group, 2,3,4,5,6-pentafluorophenyl, 4-methylfuryl and the like.

R4~R9中「可經取代之碳數1~10之醯基」之具體結構係於以下進行列舉,並不限定於該等,可列舉:甲醯基、乙醯基、丙醯基、2-甲基丙醯基、2,2-二甲基丙醯基、2-乙基己醯基等脂肪族醯基;苯甲醯基、1-萘基羰基、2-萘基羰基、2-呋喃基羰基等芳香族醯基。 The specific structure of the "fluorenyl group having 1 to 10 carbon atoms which can be substituted" in R 4 to R 9 is enumerated below, and is not limited thereto. Examples include methylamyl, ethylamyl, and propylamyl , 2-methylpropanyl, 2,2-dimethylpropanyl, 2-ethylhexyl, and other aliphatic fluorenyl groups; benzylfluorenyl, 1-naphthylcarbonyl, 2-naphthylcarbonyl, Aromatic fluorenyl groups such as 2-furylcarbonyl.

可經取代之碳數1~10之醯基中之碳數較佳為4以下,更佳為2以下。若為該範圍內,則有茀環彼此之位阻難以產生,而可獲得源自茀環之所需之光學特性之傾向。 The number of carbon atoms in the fluorenyl group having 1 to 10 carbon atoms that can be substituted is preferably 4 or less, and more preferably 2 or less. If it is within this range, the steric hindrance of the fluorene rings is difficult to occur, and the optical characteristics required from the fluorene rings tend to be obtained.

作為該醯基可具有之取代基,可列舉:鹵素原子(例如,氟原子、氯原子、溴原子、碘原子);碳數1~10之烷基(例如,甲基、乙基、異丙基等);碳數1~10之烷氧基(例如,甲氧基、乙氧基等);碳數1~10之醯胺基(例如,乙醯胺基、苯甲醯胺基等);硝基;氰基;可具有選自鹵素原子(例如,氟原子、氯原子、溴原子、碘原子)、碳數1~10之烷基(例如,甲基、乙基、異丙基等)、碳數1~10之烷氧基 (例如,甲氧基、乙氧基等)、碳數1~10之醯基(例如,乙醯基、苯甲醯基等)、碳數1~10之醯胺基(例如,乙醯胺基、苯甲醯胺基等)、硝基、氰基等之1~3個取代基之碳數6~10之芳基(例如,苯基、萘基等)等。該等取代基之數量並無特別限定,較佳為1~3個。於取代基為2個以上之情形時,取代基之種類可相同亦可不同。又,就連同工業上可廉價地製造之觀點而言,較佳為未經取代。 Examples of the substituent which the fluorenyl group may have include a halogen atom (for example, a fluorine atom, a chlorine atom, a bromine atom, and an iodine atom); and an alkyl group having 1 to 10 carbon atoms (for example, methyl, ethyl, and isopropyl) Groups, etc.); alkoxy groups (e.g., methoxy, ethoxy, etc.) having 1 to 10 carbon atoms; fluorenyl groups (e.g., acetoamino, benzamidine, etc.) having 1 to 10 carbon atoms ; Nitro; cyano; may have a halogen atom (for example, fluorine atom, chlorine atom, bromine atom, iodine atom), an alkyl group having 1 to 10 carbon atoms (for example, methyl, ethyl, isopropyl, etc. ), Alkoxy with 1 to 10 carbons (For example, methoxy, ethoxy, etc.), fluorenyl groups having 1 to 10 carbon atoms (for example, ethenyl, benzamidine, etc.), and fluorenyl groups having 1 to 10 carbon atoms (for example, acetamido Phenyl group, benzamidine amino group, etc.), aryl groups having 1 to 3 substituents such as nitro and cyano groups, and aryl groups having 6 to 10 carbon atoms (for example, phenyl, naphthyl, etc.). The number of these substituents is not particularly limited, but is preferably 1 to 3. When there are two or more substituents, the kinds of the substituents may be the same or different. Moreover, it is preferable that it is unsubstituted in view of the fact that it can be manufactured inexpensively industrially.

作為可經取代之醯基之具體例,可列舉:氯乙醯基、三氟乙醯基、甲氧基乙醯基、苯氧基乙醯基、4-甲氧基苯甲醯基、4-硝基苯甲醯基、4-氰基苯甲醯基、4-三氟甲基苯甲醯基等。 Specific examples of the fluorenyl group which may be substituted include chloroethylfluorenyl, trifluoroethylfluorenyl, methoxyethylfluorenyl, phenoxyethylfluorenyl, 4-methoxybenzomethylfluorenyl, 4 -Nitrobenzyl, 4-cyanobenzyl, 4-trifluoromethylbenzyl and the like.

R4~R9中「可經取代之碳數1~10之烷氧基或芳氧基」之具體結構係於以下進行列舉,並不限定於該等,可列舉:甲氧基、乙氧基、異丙氧基、第三丁氧基、三氟甲氧基、苯氧基等烷氧基;苯氧基等芳氧基。 The specific structure of the "alkoxy or aryloxy group having 1 to 10 carbon atoms which may be substituted" in R 4 to R 9 is listed below, and is not limited thereto. Examples include methoxy and ethoxy. Alkyl, isopropyloxy, tertiary butoxy, trifluoromethoxy, phenoxy and other alkoxy groups; aryloxy and other aryloxy groups.

可經取代之碳數1~10之烷氧基或芳氧基中,較佳為烷氧基,烷氧基之碳數較佳為4以下,更佳為2以下。若為該範圍內,則有茀環彼此之位阻難以產生,而可獲得源自茀環之所需之光學特性之傾向。 Among the alkoxy or aryloxy groups having 1 to 10 carbon atoms that may be substituted, alkoxy groups are preferred, and the number of carbon atoms in the alkoxy group is preferably 4 or less, more preferably 2 or less. If it is within this range, the steric hindrance of the fluorene rings is difficult to occur, and the optical characteristics required from the fluorene rings tend to be obtained.

R4~R9中「可經取代之胺基」之具體結構係於以下進行列舉,並不限定於該等,可列舉:胺基;N-甲基胺基、N,N-二甲基胺基、N-乙基胺基、N,N-二乙基胺基、N,N-甲基乙基胺基、N-丙基胺基、N,N-二丙基胺基、N-異丙基胺基、N,N-二異丙基胺基等脂肪族胺基;N-苯基胺基、N,N-二苯基胺基等芳香族胺基;甲醯胺基、乙醯胺基癸醯胺基、苯甲醯胺基、氯乙醯胺基等醯胺基;苄氧羰基胺基、第三丁氧羰基胺基等烷氧羰基胺基等。 The specific structure of the "substitutable amine group" in R 4 to R 9 is listed below, and is not limited thereto. Examples include: amine group; N-methylamino group, N, N-dimethyl Amine, N-ethylamino, N, N-diethylamino, N, N-methylethylamino, N-propylamino, N, N-dipropylamino, N- Aliphatic amine groups such as isopropylamino group, N, N-diisopropylamino group; aromatic amine groups such as N-phenylamine group, N, N-diphenylamino group; formamidine group, ethyl group Fluorenylamino groups such as fluorenylaminodecanoylamino, benzamidineamino, chloroacetamidinyl; alkoxycarbonylamino groups such as benzyloxycarbonylamino, tertiary butoxycarbonylamino, and the like.

該等中,就不具有酸性度較高之質子,分子量較小,且有可提高茀比率之傾向之方面而言,較佳為N,N-二甲基胺基、N-乙基胺基、或N,N-二乙基胺基,更佳為N,N-二甲基胺基。 Among these, N, N-dimethylamino group and N-ethylamino group are preferred in terms of not having a proton having a relatively high acidity, having a small molecular weight, and a tendency to increase the ratio of pyrene. Or N, N-diethylamino, more preferably N, N-dimethylamino.

R4~R9中「具有取代基之硫原子」之具體結構係於以下進行列舉,並不限定於該等,可列舉:磺基、甲磺醯基、乙磺醯基、丙磺醯基、異丙基磺醯基等烷基磺醯基;苯基磺醯基、對甲苯基磺醯基等芳基磺醯基;甲基亞磺醯基、乙基亞磺醯基、丙基亞磺醯基、異丙基亞磺醯基等烷基亞磺醯基;苯基亞磺醯基、對甲苯基亞磺醯基等芳基亞磺醯基;甲硫基、乙硫基等烷硫基;苯硫基、對甲苯硫基等芳硫基;甲氧基磺醯基、乙氧基磺醯基等烷氧基磺醯基;苯氧基磺醯基等芳氧基磺醯基;胺基磺醯基;N-甲基胺基磺醯基、N-乙基胺基磺醯基、N-第三丁基胺基磺醯基、N,N-二甲基胺基磺醯基、N,N-二乙基胺基磺醯基等烷基磺醯基;N-苯基胺基磺醯基、N,N-二苯基胺基磺醯基等芳基胺基磺醯基等。再者,磺基亦可與鋰、鈉、鉀、鎂、銨等形成鹽。 The specific structure of the "sulfur atom having a substituent" in R 4 to R 9 is listed below, and is not limited thereto. Examples include: sulfo, methanesulfonyl, ethylsulfonyl, and sulfonylsulfonyl , Alkylsulfonyl groups such as isopropylsulfonyl; arylsulfonyl groups such as phenylsulfonyl, p-tolylsulfonyl; methylsulfinyl, ethylsulfinyl, propylidene Alkyl sulfinyl sulfonyl groups such as sulfonyl, isopropylsulfinyl sulfinyl; arylsulfinyl phenyl sulfinyl, p-tolyl sulfinyl sulfinyl; methyl thio, ethyl thio Thio; arylthio, such as phenylthio, p-tolylthio; alkoxysulfonyl, such as methoxysulfonyl, ethoxysulfonyl; aryloxysulfonyl, such as phenoxysulfonyl ; Aminosulfonyl; N-methylaminosulfonyl, N-ethylaminosulfonyl, N-thirdbutylaminosulfonyl, N, N-dimethylaminosulfonyl Alkyl, sulfonyl groups such as N, N-diethylaminosulfonyl; arylaminosulfonyl groups such as N-phenylaminosulfonyl, N, N-diphenylaminosulfonyl Base etc. Furthermore, the sulfo group may form a salt with lithium, sodium, potassium, magnesium, ammonium, and the like.

該等中,就不具有酸性度較高之質子,分子量較小,且有可提高茀比率之傾向之方面而言,較佳為甲基亞磺醯基、乙基亞磺醯基、或苯基亞磺醯基,更佳為甲基亞磺醯基。 Among these, in terms of not having a proton having a relatively high acidity, having a small molecular weight, and a tendency to increase the ratio of pyrene, methylsulfinyl sulfenyl, ethylsulfinyl sulfinyl, or benzene is preferred. The sulfinyl sulfenyl group is more preferably a methylsulfinyl sulfinyl group.

R4~R9中作為「鹵素原子」,可列舉:氟原子、氯原子、溴原子、碘原子。 Examples of the "halogen atom" in R 4 to R 9 include a fluorine atom, a chlorine atom, a bromine atom, and an iodine atom.

該等中,就導入相對容易,且因吸電子性之取代基而有提高茀9位之反應性之傾向之方面而言,較佳為氟原子、氯原子、或溴原子,更佳為氯原子或溴原子。 Among these, a fluorine atom, a chlorine atom, or a bromine atom is preferable, and a chlorine atom or a bromine atom is more preferable because it is relatively easy to introduce and tends to increase the reactivity at the 茀 -position due to an electron-withdrawing substituent. Atom or bromine atom.

如上所述,藉由將R4~R9設為如上述之特定之原子或取代基,而有如下傾向:主鏈與茀環之間、或茀環彼此之間之位阻較少,而可獲得源自茀環之所需之光學特性。 As described above, by setting R 4 to R 9 as the specific atom or substituent as described above, there is a tendency that there is less steric hindrance between the main chain and the fluorene ring, or between the fluorene ring and each other. The required optical characteristics derived from the hafnium ring can be obtained.

該等R4~R9中,較佳為全部為氫原子、或者R4及/或R9為選自由鹵素原子、醯基、硝基、氰基、及磺基所組成之群中之任一者,且R5~R8為氫原子。於全部為氫原子之情形時,可自工業上亦廉價之茀衍生。又,於R4及/或R9為選自由鹵素原子、醯基、硝基、氰基、及磺 基所組成之群中之任一者,且R5~R8為氫原之情形時,茀9位之反應性提高,因此有可適應各種衍生反應之傾向。更佳為全部為氫原子、或者R4及/或R9為選自由氟原子、氯原子、溴原子、及硝基所組成之群中之任一者,且R5~R8為氫原子,尤佳為全部為氫原子之情形。又,藉由設為上述者而可提高茀比率,且亦有茀環彼此之位阻難以產生,而可獲得源自茀環之所需之光學特性之傾向。 Of these R 4 to R 9 , all of them are preferably hydrogen atoms, or R 4 and / or R 9 is any one selected from the group consisting of a halogen atom, a fluorenyl group, a nitro group, a cyano group, and a sulfo group. One of them, and R 5 to R 8 are hydrogen atoms. In the case where all of them are hydrogen atoms, they can be derived from industrially inexpensive osmium. When R 4 and / or R 9 is any one selected from the group consisting of a halogen atom, a fluorenyl group, a nitro group, a cyano group, and a sulfo group, and R 5 to R 8 are a hydrogen atom Since the reactivity of the 9th position is improved, there is a tendency to adapt to various derivative reactions. More preferably, all of them are a hydrogen atom, or R 4 and / or R 9 is any one selected from the group consisting of a fluorine atom, a chlorine atom, a bromine atom, and a nitro group, and R 5 to R 8 are hydrogen atoms. Especially preferred is the case where all are hydrogen atoms. In addition, it is possible to increase the erbium ratio by setting to the above, and it is also difficult to generate steric hindrance between the erbium rings, so that it is possible to obtain required optical characteristics derived from the erbium rings.

<1.6三茀二酯之具體例> <1.6 Specific Examples of Tris (III) Diester>

作為本發明之三茀二酯之具體例,可列舉:如下述[H]群所示之結構。 Specific examples of the tertiary diester of the present invention include a structure shown in the following [H] group.

[化43] [Chemical 43]

<1.7三茀二酯之物性> <1.7 Physical Properties of Tris (III) Diester>

本發明之三茀二酯之物性值並無特別限定,較佳為滿足以下所例示之物性值者。 The physical property value of the tertiary diester of the present invention is not particularly limited, and it is preferably one that satisfies the physical property values exemplified below.

關於本發明之三茀二酯中之氯含有比例,以Cl換算質量計較佳為100質量ppm以下。進而較佳為10質量ppm以下。於氯成分之含有比例較多之情形時,有使聚合反應所使用之觸媒去活化,導致聚合不再進行至所需分子量,或者反應變得不穩定而生產性變差之可能性。又,有所獲得之聚合物中亦殘留氯成分而使聚合物之熱穩定性降低之虞。 Regarding the chlorine content in the tertiary diester of the present invention, it is preferably 100 mass ppm or less in terms of Cl conversion mass. It is more preferably 10 mass ppm or less. When the content of the chlorine component is large, the catalyst used in the polymerization reaction may be deactivated, the polymerization may not proceed to the required molecular weight, or the reaction may become unstable and the productivity may be deteriorated. In addition, the chlorine component may remain in the obtained polymer, which may reduce the thermal stability of the polymer.

本發明之三茀二酯中之三茀單酯體之含有比例較佳為全部三茀化合物之質量之10質量%以下。進而較佳為2質量%以下。若三茀單酯體於聚合反應中被導入至聚合物中,則成為封端基,因此若三茀單酯體變多,則有聚合不再進行至所需分子量,或者聚合物中之低聚物等低分子成分之殘留量變多而使所獲得之聚合物之機械強度或耐熱性降低之虞。又,亦認為有如下可能性:低分子成分自成形體滲出等而使製品之品質降低。再者,所謂單酯體意指三茀二酯之末端酯基中之任意1個成為聚合反應性基以外之基者。 It is preferable that the content ratio of the tertiary monoester in the tertiary diester of the present invention is 10% by mass or less based on the mass of all the tertiary compounds. It is more preferably 2% by mass or less. If the triammonium monoester is introduced into the polymer during the polymerization reaction, it will become a capping group. Therefore, if the triammonium monoester is increased, the polymerization will no longer proceed to the required molecular weight, or the polymer will be low. The residual amount of the low-molecular component such as a polymer may increase, so that the mechanical strength or heat resistance of the obtained polymer may decrease. In addition, it is considered that there is a possibility that the low-molecular component oozes out of the molded body and the like, thereby reducing the quality of the product. The term “monoester” means that any one of the terminal ester groups of the tertiary diester becomes a group other than the polymerization-reactive group.

於本發明之三茀二酯中,有含有源自於鹼存在下使甲醛類作用而進行羥甲基化之步驟之鈉或鉀等長週期型週期表第1族金屬或者鈣等第2族金屬之可能性,該等之含有比例較佳為500質量ppm以下,更佳為200質量ppm以下,進而較佳為50質量ppm以下,尤佳為10質量ppm以下。若金屬成分較多,則有於聚合反應或對樹脂進行加工時,聚合物變得容易著色之擔憂。又,亦有所含有之金屬成分顯示出觸媒作用或觸媒去活化作用而使聚合變得不穩定之虞。 In the tertiary diester of the present invention, there is a Group 1 metal such as sodium or potassium of the long-period periodic table containing a step derived from methylolation by the action of formaldehydes in the presence of a base, or Group 2 such as calcium. The possibility of metals is preferably 500 mass ppm or less, more preferably 200 mass ppm or less, still more preferably 50 mass ppm or less, and even more preferably 10 mass ppm or less. When there are many metal components, there exists a possibility that a polymer may become colored easily at the time of a polymerization reaction or processing a resin. In addition, there is a possibility that the metal component contained in the catalyst exhibits a catalyst effect or a catalyst deactivation effect, thereby causing polymerization to become unstable.

於本發明之三茀二酯、尤其是三茀二芳酯中,有含有源自在酯交換反應觸媒存在下使碳酸二芳酯類作用而進行酯交換之步驟的鈦、銅、鐵等過渡金屬、或者鈉、鉀等長週期型週期表第1族、或者鎂、鈣等第2族金屬、或者鋅或鎘等第12族金屬、或者錫等第14族金屬之可能性,該等之含有比例較佳為500質量ppm以下,更佳為200質量ppm以下,進而較佳為50質量ppm以下,尤佳為10質量ppm以下。若金屬成分較多,則有於聚合反應或對樹脂進行加工時,聚合物變得容易著色之擔憂。又,亦有所含有之金屬成分顯示出觸媒作用或觸媒去活化作用而使聚合變得不穩定之虞。 Among the tertiary diesters, especially tristearyl diaryl esters of the present invention, there are titanium, copper, iron, etc. which are derived from the step of transesterifying by the action of diaryl carbonates in the presence of a transesterification reaction catalyst. The possibility of transition metals, or Group 1 of the long-period periodic table such as sodium or potassium, or Group 2 metals such as magnesium and calcium, or Group 12 metals such as zinc or cadmium, or Group 14 metals such as tin, etc. The content ratio is preferably 500 mass ppm or less, more preferably 200 mass ppm or less, still more preferably 50 mass ppm or less, and even more preferably 10 mass ppm or less. When there are many metal components, there exists a possibility that a polymer may become colored easily at the time of a polymerization reaction or processing a resin. In addition, there is a possibility that the metal component contained in the catalyst exhibits a catalyst effect or a catalyst deactivation effect, thereby causing polymerization to become unstable.

本發明之三茀二酯較佳為10質量%之四氫呋喃溶液之色調為50以下。進而較佳為10以下。三茀二酯有如下性質:吸收端擴展至接近可 見光之區域,因聚合或樹脂之加工而暴露於高溫下時容易著色。為了獲得色相良好之聚合物,聚合反應所使用之三茀二酯較佳為儘可能著色較少。色調由於與濃度成比例,故而亦可為於不同濃度下進行測定並標準化為10質量%濃度而獲得之值。此處,三茀二酯之色調(APHA值)可依據JIS-K0071-1(1998年),藉由將稀釋岸田化學公司製造之色度標準液(1000度)而製作之液與三茀二酯放入內徑20mm之比色管中進行比較而進行測定。 In the trimethyl diester of the present invention, the color tone of the tetrahydrofuran solution of 10% by mass is preferably 50 or less. It is more preferably 10 or less. Trimethyl diester has the following properties: the absorption end is extended to be close to Areas that see light are easily colored when exposed to high temperatures due to polymerization or resin processing. In order to obtain a polymer with a good hue, it is preferred that the tri-methylene diester used in the polymerization reaction is colored as little as possible. Since the hue is proportional to the density, it can also be a value obtained by measuring at different concentrations and normalizing it to a concentration of 10% by mass. Here, the color tone (APHA value) of the tertiary diester can be prepared by diluting the chromaticity standard solution (1000 degrees) manufactured by Kishida Chemical Co., Ltd. with Sanshidi according to JIS-K0071-1 (1998). The ester was measured in a colorimetric tube with an inner diameter of 20 mm for comparison.

本發明之三茀二酯之於熱重量測定下之5%重量減少溫度較佳為230℃以上,更佳為250℃以上。進而尤佳為270℃以上。茀係非常富電子之結構,鍵結於茀環之取代基之反應性提高,而變得容易引起熱分解。若聚合反應中使用熱分解溫度較低之三茀二酯,則有如下之虞:聚合時引起熱分解而聚合不再進行至所需分子量,或者所獲得之聚合物著色。 The 5% weight reduction temperature of the tertiary diester of the present invention under thermogravimetric measurement is preferably 230 ° C or more, and more preferably 250 ° C or more. The temperature is more preferably 270 ° C or higher. Samarium is a very electron-rich structure, and the reactivity of the substituents bonded to the samarium ring is improved, and it becomes easy to cause thermal decomposition. If a tertiary diester having a lower thermal decomposition temperature is used in the polymerization reaction, there is a possibility that thermal decomposition will be caused during the polymerization and the polymerization will no longer proceed to the desired molecular weight, or the obtained polymer will be colored.

又,本發明之三茀二酯於氮氣環境下所測得之分解溫度較佳為250℃以上,更佳為300℃以上,進而較佳為330℃以上,且通常為380℃以下。本發明之三茀二酯由於茀環之積層結構而結構剛直,因此有分解溫度滿足上述範圍之傾向。藉由如上述般分解溫度滿足上述範圍,而有可提高由三茀二酯獲得之聚酯、聚碳酸酯之熱穩定性之傾向。分解溫度例如可藉由TG-DTA(Thermo-Gravimetric-Differential Thermal Analysis,示差熱-熱重量同步測定)而進行測定。 In addition, the decomposition temperature of the tertiary diester of the present invention measured under a nitrogen environment is preferably 250 ° C or higher, more preferably 300 ° C or higher, even more preferably 330 ° C or higher, and usually 380 ° C or lower. Since the tertiary diester of the present invention has a rigid structure due to the laminated structure of the fluorene ring, the decomposition temperature tends to satisfy the above range. When the decomposition temperature satisfies the above range as described above, there is a tendency that the thermal stability of the polyester and polycarbonate obtained from the triglyceride can be improved. The decomposition temperature can be measured, for example, by TG-DTA (Thermo-Gravimetric-Differential Thermal Analysis).

進而,本發明之三茀二酯之熔點(m.p.)較佳為120℃以上,更佳為130℃以上,進而較佳為150℃以上,且通常為200℃以下。本發明之三茀二酯由於茀環之積層結構而結構剛直,因此有熔點滿足上述範圍之傾向。藉由如上述般熔點滿足上述範圍,而有可提高由三茀二酯獲得之聚酯、聚碳酸酯之玻璃轉移溫度之傾向。熔點例如可藉由TG-DTA而進行測定。 Furthermore, the melting point (m.p.) of the tertiary diester of the present invention is preferably 120 ° C or higher, more preferably 130 ° C or higher, even more preferably 150 ° C or higher, and usually 200 ° C or lower. Since the tertiary diester of the present invention has a rigid structure due to the laminated structure of the fluorene ring, the melting point tends to satisfy the above range. When the melting point satisfies the above range as described above, there is a tendency that the glass transition temperature of the polyester and polycarbonate obtained from the triglyceride can be increased. The melting point can be measured by, for example, TG-DTA.

<1.8三茀二酯之製造方法> <1.8 Manufacturing Method of Tris (III) Diester>

本發明中所使用之三茀二酯、尤其是上述通式(1)所表示之三茀二酯之製造方法並無任何限定,例如可藉由下述式所示之製造法A或製造法B等方法而進行製造。 There is no restriction on the production method of the tertiary diester used in the present invention, especially the tertiary diester represented by the general formula (1). For example, the production method A or the production method shown by the following formula can be used. B and other methods.

再者,二茀二酯可依據三茀化合物(II)之製造法,藉由調整對應於R3之試劑量而獲得二茀化合物後,於與製造法C相同之條件下進行製造。 Furthermore, the difluorene diester can be produced under the same conditions as in the production method C after adjusting the amount of reagent corresponding to R 3 to obtain the difluorene diester according to the production method of the trifluorene compound (II).

式中,R1及R2分別獨立為直接鍵、或可具有取代基之碳數1~4之伸烷基。 In the formula, R 1 and R 2 are each independently a direct bond or an alkylene group having 1 to 4 carbon atoms which may have a substituent.

R3a及R3b分別獨立為可經取代之碳數1~10之伸烷基、可經取代之碳數4~10之伸芳基、或可經取代之碳數6~10之伸芳烷基,R4~R9分別獨立為氫原子、可經取代之碳數1~10之烷基、可經取代之碳數4~10之芳基、可經取代之碳數1~10之醯基、可經取代之碳數1~10之烷氧基、可經取代之碳數1~10之芳氧基、可經取代之胺基、具有取代基之硫原子、鹵素原子、硝基或氰基。其中,R4~R9中鄰接之至少2個基亦可相互鍵結而形成環。 R 3a and R 3b are each independently an alkylene group having 1 to 10 carbon atoms which can be substituted, an alkylene group having 4 to 10 carbon atoms which can be substituted, or an alkylene group having 6 to 10 carbon atoms which can be substituted R 4 to R 9 are each independently a hydrogen atom, an alkyl group having 1 to 10 carbon atoms that can be substituted, an aryl group having 4 to 10 carbon atoms that can be substituted, and 醯 1 to 10 carbon atoms that can be substituted Group, alkoxy group having 1 to 10 carbon atoms which may be substituted, aryloxy group having 1 to 10 carbon atoms which may be substituted, amine group which may be substituted, sulfur atom having a substituent, halogen atom, nitro or Cyano. Among them, at least two adjacent groups in R 4 to R 9 may be bonded to each other to form a ring.

R10為碳數1~10之有機取代基。 R 10 is an organic substituent having 1 to 10 carbon atoms.

<1.8.1製造法A> <1.8.1 Manufacturing Method A>

製造法A係如下方法,即以茀類(I)為原料,向9-羥甲基茀類(IV) 轉化後,使藉由脫水而合成之烯烴體(V)與茀基陰離子進行反應,利用管柱精製等自寡聚茀之混合物中進行精製,而製造R3為亞甲基之三茀化合物(IIa)。再者,未經取代之9-羥甲基茀可以試劑之方式購入。此處,亦可依據製造法C之步驟(ii),自所獲得之三茀化合物(II)導入酯基而製成三茀二酯(I)。 Production method A is a method in which fluorene (I) is converted into 9-hydroxymethyl fluorene (IV) as a raw material, and an olefin (V) synthesized by dehydration is reacted with a fluorenyl anion. Purification is performed from a mixture of oligomeric fluorenes by column purification or the like to produce a tertiary hydrazone compound (IIa) in which R 3 is a methylene group. Furthermore, unsubstituted 9-hydroxymethyl hydrazone can be purchased as a reagent. Here, it is also possible to prepare a tri-methylene diester (I) by introducing an ester group from the obtained tri-methylene compound (II) according to step (ii) of the manufacturing method C.

例如已知有將9-羥甲基茀轉化為二苯并富烯(dibenzofulvene)後,藉由陰離子聚合而合成寡聚茀之混合物之方法(J.Am.Chem.Soc.,123,2001,9182-9183.)。以該等為參考,自混合物中進行精製,藉此可製造三茀化合物(II)。 For example, a method is known in which 9-hydroxymethylfluorene is converted into dibenzofulvene and then a mixture of oligomeric fluorenes is synthesized by anionic polymerization (J. Am. Chem. Soc., 123, 2001, 9182-9183.). Using these as a reference, the trifluorene compound (II) can be produced by purification from the mixture.

<1.8.2 製造法B> <1.8.2 Manufacturing Method B>

製造法B係如下方法,即進行原料之茀類(I)之交聯反應(步驟(i)),藉此合成三茀化合物(II),其後導入酯基(步驟(ii)),藉此製造三茀二酯(1)。 Production method B is a method in which a cross-linking reaction of the amidine (I) of the raw material (step (i)) is performed to synthesize a triamidine compound (II), and then an ester group is introduced (step (ii)). This produces a tris (-) diester (1).

式中,R1~R10係與式(1)中之R1~R10含義相同。 Wherein, R 1 ~ R 10 the same line with the formula R (1) 1 ~ R 10 in the meaning.

以下,將製造法B分為步驟(i)三茀化合物(II)之製造法、與步驟(ii)三茀二酯(1)之製造法而進行記載。 Hereinafter, the manufacturing method B is divided into the manufacturing method of the step (i) triamidine compound (II) and the manufacturing method of a step (ii) trimer diester (1).

<1.8.3 步驟(i):三茀化合物(II)之製造方法> <1.8.3 Step (i): Method for producing triamidine compound (II)>

式中,R3~R9係與式(1)中之R3~R9含義相同。 In the formula, R 3 ~ R 9 based formula R (1) ~ 3 in the same meaning as R 9.

以下,將步驟(i)中之三茀化合物(II)之製造方法分為R3之情形而進行記載。 Hereinafter, the production method of the stilbene compound (II) in step (i) will be described as a case where it is divided into R 3 .

<1.8.3.1 R3為直接鍵之情形:9,9':9',9"-三茀之製造方法> <1.8.3.1 When R 3 is a direct bond: 9,9 ': 9', 9 "-Mitsumi's manufacturing method>

9,9':9',9"-三茀之合成法係已知,可由茀酮合成(Eur.J.Org.Chem.1999,1979-1984.)。 The synthesis method of 9,9 ': 9', 9 "-triamidine is known and can be synthesized from fluorenone (Eur. J. Org. Chem. 1999, 1979-1984.).

<1.8.3.2步驟(ia):R3為亞甲基之情形之製造方法> <1.8.3.2 Step (ia): Production method in a case where R 3 is methylene>

下述通式(IIa)所表示之具有亞甲基交聯之三茀化合物可於鹼存在下,依據下述式所表示之反應,自茀類(I)及甲醛類進行製造。 The tertiary amidine compound having a methylene crosslinkage represented by the following general formula (IIa) can be produced from the amidines (I) and formaldehydes according to the reaction represented by the following formula in the presence of a base.

式中,R4~R9係與式(1)中之R4~R9含義相同。 In the formula, R 4 ~ R 9 based same formula (1) in the meaning of R 4 ~ R 9.

<1.8.3.2.1甲醛類> <1.8.3.2.1 Formaldehydes>

步驟(ia)中所使用之所謂甲醛類,只要為可向反應系統中供給甲醛之物質,則無特別限定,可列舉:氣狀之甲醛、甲醛水溶液、甲醛聚合而成之多聚甲醛、三烷等。就工業上廉價且因粉末狀而操作容易且可精確地稱量之觀點而言,更佳為多聚甲醛。另一方面,就工業上廉價且因液體而於添加時暴露之危險較少之觀點而言,更佳為福馬林。 The so-called formaldehydes used in step (ia) are not particularly limited as long as they can supply formaldehyde to the reaction system. Examples include gaseous formaldehyde, aqueous formaldehyde solution, paraformaldehyde polymerized by formaldehyde, and Alkanes, etc. From the viewpoint that it is industrially inexpensive and easy to handle and can be accurately weighed due to the powder form, paraformaldehyde is more preferred. On the other hand, formaldehyde is more preferred from the viewpoint that it is industrially inexpensive and has less risk of exposure during addition due to liquid.

(理論量之定義) (Definition of theoretical quantity)

於製造目標之三茀化合物(IIa)之情形時,甲醛類相對於原料之茀類(I)之理論量(莫耳比)係由2/3表示。 In the case of producing the target amidine compound (IIa), the theoretical amount (molar ratio) of formaldehydes relative to the amidine (I) of the raw material is represented by 2/3.

(不超過理論量者較佳之原因) (The reason why it is better not to exceed the theoretical amount)

於使用相對於茀類(I),超過理論量之甲醛類之情形時,有較目標之三茀化合物(IIa)進而產生茀交聯之寡聚茀化合物之傾向。可知寡聚茀化合物之茀環之數量越增加,溶解性越降低,因此於目標物中存在4個以上茀環交聯之寡聚茀化合物之情形時,而有精製負荷變大之傾向。因此,通常甲醛類之使用量較佳為成為目標之理論量之2/3倍莫耳以下。 In the case where formaldehydes are used in an amount exceeding the theoretical amount with respect to the fluorene (I), there is a tendency that the ternary hydrazone compound (IIa) is more targeted than the fluorene crosslinked oligomeric fluorene compound. It can be seen that as the number of fluorene rings of an oligomeric fluorene compound increases, the solubility decreases. Therefore, when there are more than 4 fluorene ring-linked oligomeric fluorene compounds in the target, the purification load tends to increase. Therefore, in general, the amount of formaldehyde used is preferably less than 2/3 times the target theoretical amount.

(不大幅低於理論量者較佳之原因) (Why not better than the theoretical amount)

又,可知若甲醛類之使用量大幅低於成為理論量之2/3,則有較目標之三茀化合物(IIa),茀環之交聯數較少之二茀化合物成為主生成物,或者原料之茀類(I)未反應而殘留,因此產率大幅降低之傾向。 In addition, it can be seen that if the amount of formaldehydes used is significantly lower than 2/3 of the theoretical amount, there will be more than the target triamidine compound (IIa), and a diammonium compound with a smaller number of crosslinks of the amidine ring will become the main product, The amidine (I) of the raw materials remains unreacted, and therefore the yield tends to decrease significantly.

因此,關於最佳之甲醛類之使用量,具體而言,相對於原料之茀類(I),通常為0.5倍莫耳以上,較佳為0.55倍莫耳以上,進而較佳為0.6倍莫耳以上,又通常為0.67倍莫耳以下,較佳為0.65倍莫耳以下,進而較佳為0.63倍莫耳以下。如上所述,可知根據甲醛類之使用量,主生成物之結構與生成物之比率大幅變化之情況,藉由於限制甲醛類之使用量之條件下進行使用,而有可以高產率獲得目標之三茀化合物(IIa)之傾向。 Therefore, the optimal amount of formaldehyde used is, in particular, 0.5 times mole or more, preferably 0.55 times mole or more, and more preferably 0.6 times mole relative to the raw material (I). Above the ear, it is usually 0.67 times mole or less, preferably 0.65 times mole or less, and still more preferably 0.63 times mole or less. As mentioned above, it can be seen that depending on the amount of formaldehyde used, the ratio of the structure of the main product to the product greatly changes. By using it under the condition that the amount of formaldehyde used is limited, the third target can be obtained in high yield. Tendency of the compound (IIa).

<1.8.3.2.2鹼> <1.8.3.2.2 Alkali>

作為步驟(ia)中所使用之鹼,可使用氫氧化鋰、氫氧化鈉、氫氧化鉀等鹼金屬氫氧化物、氫氧化鈣、氫氧化鋇等鹼土金屬之氫氧化物、碳酸鈉、碳酸氫鈉、碳酸鉀等鹼金屬之碳酸鹽、碳酸鎂、碳酸鈣等鹼土金屬之碳酸鹽、磷酸鈉、磷酸氫鈉、磷酸鉀等磷酸之鹼金屬鹽、正丁鋰、第三丁基鋰等有機鋰鹽、甲醇鈉、乙醇鈉、第三丁醇鉀等鹼金屬之烷醇鹽、氫化鈉或氫化鉀等氫化鹼金屬鹽、三乙基胺、二氮雜雙環十一烯等三級胺、四甲基氫氧化銨、四丁基氫氧化銨等四級氫氧化銨等。該等可單獨使用1種,亦可併用2種以上。 Examples of the base used in step (ia) include alkali metal hydroxides such as lithium hydroxide, sodium hydroxide, and potassium hydroxide; hydroxides of alkaline earth metals such as calcium hydroxide and barium hydroxide; sodium carbonate, and carbonic acid. Carbonates of alkali metals such as sodium hydrogen and potassium carbonate, carbonates of alkaline earth metals such as magnesium carbonate and calcium carbonate, alkali metal salts of phosphoric acid such as sodium phosphate, sodium hydrogen phosphate and potassium phosphate, n-butyl lithium, third butyl lithium, etc. Organic lithium salts, sodium alkoxides of alkali metals such as sodium methoxide, sodium ethoxide, and potassium tert-butoxide, alkali metal hydrides such as sodium hydride or potassium hydride, tertiary amines such as triethylamine and diazabicycloundecene , Tetramethylammonium hydroxide, Tetrabutylammonium hydroxide, etc. These may be used individually by 1 type, and may use 2 or more types together.

於均質系下進行反應之情形時,該等中,較佳為本反應中具有充分之鹼性之鹼金屬之烷氧化物,更佳為工業上廉價之甲醇鈉或乙醇鈉。此處,鹼金屬之烷氧化物可使用粉狀者,亦可使用醇溶液等液狀者。又,亦可使鹼金屬與醇進行反應而進行製備。 When the reaction is performed in a homogeneous system, among these, the alkali metal alkoxide having sufficient basicity in the reaction is preferred, and industrially inexpensive sodium methoxide or sodium ethoxide is more preferred. Here, the alkali metal alkoxide may be used in a powder form or in a liquid form such as an alcohol solution. It is also possible to prepare by reacting an alkali metal with an alcohol.

另一方面,於二層系下進行反應之情形時,該等中,較佳為本反應中具有充分之鹼性之鹼金屬氫氧化物之水溶液,更佳為工業上廉價之氫氧化鈉、或氫氧化鉀之水溶液,進而較佳為氫氧化鈉之水溶液。 On the other hand, when the reaction is performed in a two-layer system, among these, an aqueous solution of an alkali metal hydroxide having sufficient basicity in the reaction is preferable, and industrially inexpensive sodium hydroxide, Or an aqueous solution of potassium hydroxide, and more preferably an aqueous solution of sodium hydroxide.

又,關於水溶液之濃度,於使用尤佳之氫氧化鈉水溶液之情形時,若濃度較稀,則反應速度明顯降低,因此使用通常為10wt/wt%以上、較佳為25wt/wt%以上、更佳為40wt/wt%以上之水溶液。 In addition, regarding the concentration of the aqueous solution, in the case of using an especially preferred sodium hydroxide aqueous solution, if the concentration is relatively thin, the reaction rate is significantly reduced. Therefore, it is generally used at 10 wt / wt% or more, preferably 25 wt / wt% or more, More preferably, it is an aqueous solution of 40 wt / wt% or more.

於均質系下進行反應之情形時,關於鹼之使用量,相對於作為原料之茀類(I),上限並無特別限定,但若使用量過多,則有攪拌或反應後之精製負荷變大之傾向,因此通常為茀類(I)之10倍莫耳以下,較佳為5倍莫耳以下,進而較佳為1倍莫耳以下。另一方面,若鹼之使用量過少,則有反應之進行變慢之傾向,因此作為下限,通常相對於原料之茀類(I)為0.01倍莫耳以上,較佳為0.1倍莫耳以上,進而較佳為0.2倍莫耳以上。 When the reaction is carried out in a homogeneous system, the upper limit of the amount of alkali used is not particularly limited with respect to the amidine (I) as a raw material, but if the amount is too large, the purification load after stirring or reaction becomes large Therefore, it is usually 10 times or less, preferably 5 times or less, and more preferably 1 time or less. On the other hand, if the amount of alkali used is too small, the reaction tends to slow down. Therefore, as the lower limit, it is usually 0.01 times the mole or more, and preferably 0.1 times the mole or more, relative to the raw material (I). , And more preferably 0.2 times mole or more.

另一方面,於二層系下進行反應之情形時,關於鹼之使用量,相對於作為原料之茀類(I),上限並無特別限定,但若使用量過多,則有攪拌或反應後之精製負荷變大之傾向,因此通常為茀類(I)之10倍莫耳以下,較佳為5倍莫耳以下,進而較佳為2倍莫耳以下。另一方面,若鹼之使用量過少,則有反應之進行變慢之傾向,因此作為下限,通常相對於原料之茀類(I)為0.1倍莫耳以上,較佳為0.3倍莫耳以上,進而較佳為0.4倍莫耳以上。 On the other hand, in the case where the reaction is performed in a two-layer system, the upper limit of the amount of alkali used is not particularly limited with respect to the stilbene (I) as a raw material, but if the amount is too large, there may be stirring or reaction Since the refining load tends to increase, it is usually 10 times or less, preferably 5 times or less, and more preferably 2 times or less. On the other hand, if the amount of alkali used is too small, the reaction tends to slow down. Therefore, as the lower limit, it is usually 0.1 times or more, and preferably 0.3 times or more, relative to the type (I) of the material. , And more preferably 0.4 times mole or more.

<1.8.3.2.3溶劑> <1.8.3.2.3 Solvents>

步驟(ia)較理想為使用溶劑而進行。關於可使用之溶劑之具體例,作為烷基腈系溶劑,可列舉乙腈、丙腈等,作為醚系溶劑,可列舉二乙基醚、四氫呋喃、1,4-二烷、甲基環戊基醚、第三丁基甲基醚等,作為鹵素系溶劑,可列舉1,2-二氯乙烷、二氯甲烷、氯仿、1,1,2,2-四氯乙烷等,作為鹵素系芳香族烴,可列舉氯苯、1,2-二氯苯等,作為醯胺系溶劑,可列舉N,N-二甲基甲醯胺、N,N,-二甲基乙醯胺、N-甲基吡咯啶酮等,作為亞碸系溶劑,可列舉二甲基亞碸、環丁碸等,作為環狀式脂肪族烴,可列舉:環戊烷、環己烷、環庚烷、環辛烷等單環狀式脂肪族烴;作為其衍生物之甲基環戊烷、乙基環戊烷、甲基環己烷、乙基環己烷、1,2-二甲基環己烷、1,3-二甲基環己烷、1,4-二甲基環己烷、異丙基環己烷、正丙基環己烷、第三丁基環己烷、正丁基環己烷、異丁基環己烷、1,2,4-三甲基環己烷、1,3,5-三甲基環己烷等;十氫萘等多環狀式脂肪族烴;正戊烷、正己烷、正庚烷、正辛烷、異辛烷、正壬烷、正癸烷、正十二烷、正十四烷等非環狀式脂肪族烴,作為芳香族烴,可列舉甲苯、對二甲苯、鄰二甲苯、間二甲苯等,作為醇系溶劑,可列舉甲醇、乙醇、異丙醇、正丁醇、第三丁醇、己醇、辛醇、環己醇等。 Step (ia) is preferably performed using a solvent. Specific examples of usable solvents include acetonitrile and propionitrile as the alkyl nitrile solvent, and diethyl ether, tetrahydrofuran, and 1,4-dicarbonate as the ether solvent. Alkane, methylcyclopentyl ether, third butyl methyl ether, and the like. Examples of the halogen-based solvent include 1,2-dichloroethane, dichloromethane, chloroform, and 1,1,2,2-tetrachloroethane. Examples of the halogen-based aromatic hydrocarbon include chlorobenzene and 1,2-dichlorobenzene. Examples of the fluorene-based solvent include N, N-dimethylformamide and N, N, -dimethyl. Acetylamine, N-methylpyrrolidone and the like. Examples of the fluorene-based solvents include dimethyl fluorene and cyclobutane. Examples of the cyclic aliphatic hydrocarbon include cyclopentane and cyclohexane. , Monocyclic aliphatic hydrocarbons such as cycloheptane, cyclooctane; methylcyclopentane, ethylcyclopentane, methylcyclohexane, ethylcyclohexane, 1,2- Dimethylcyclohexane, 1,3-dimethylcyclohexane, 1,4-dimethylcyclohexane, isopropylcyclohexane, n-propylcyclohexane, third butylcyclohexane , N-butylcyclohexane, isobutylcyclohexane, 1,2,4-trimethylcyclohexane, 1,3,5-trimethylcyclohexane, etc .; polycyclic forms such as decalin Aliphatic hydrocarbons; n-pentane, n-hexane, n-heptane, n-octane, isooctane, n-nonane, n-decane, n-dodecane, n-tetradecane Examples of the acyclic aliphatic hydrocarbon include toluene, para-xylene, o-xylene, and meta-xylene. Examples of the alcohol-based solvent include methanol, ethanol, isopropanol, n-butanol, and Tributanol, hexanol, octanol, cyclohexanol, etc.

於均質系之反應中,就有自茀類(I)產生之陰離子之溶解性較高,而反應之進行良好之傾向之方面而言,較佳為極性溶劑之醯胺系溶劑、或亞碸系溶劑。其中,尤佳為N,N-二甲基甲醯胺。其原因在於有如下傾向,即三茀化合物(IIa)對N,N-二甲基甲醯胺之溶解性較低,目標物產生後迅速地析出,其以後之反應之進行被抑制,而目標物之選擇性提高。 In the reaction of the homogeneous system, the anion generated from the amidine (I) has high solubility, and in terms of the tendency of the reaction to proceed well, a fluorene-based solvent or a subfluorinated solvent is preferred. Department of solvents. Among them, N, N-dimethylformamide is particularly preferred. The reason is that there is a tendency that the triamidine compound (IIa) has a low solubility in N, N-dimethylformamide, and the target substance precipitates rapidly after it is generated, and the progress of subsequent reactions is suppressed, and the target Material selectivity is improved.

於二層系之反應中,就有與鹼性水溶液形成2層,自茀類(I)產生之陰離子之溶解性較高,而反應之進行良好之傾向之方面而言,較佳為極性溶劑之醚系溶劑、或鹵素系溶劑。其中,尤佳為四氫呋喃。其 原因在於有如下傾向,即三茀化合物(IIa)對四氫呋喃之溶解性較低,目標物產生後迅速地析出,其以後之反應之進行被抑制,而目標物之選擇性提高。 In the two-layer reaction, two layers are formed with an alkaline aqueous solution. The anion generated from the amidine (I) has high solubility, and a polar solvent is preferred in terms of the tendency of the reaction to proceed well. An ether-based solvent or a halogen-based solvent. Among them, tetrahydrofuran is particularly preferred. its The reason is that there is a tendency that the triamidine compound (IIa) has a low solubility in tetrahydrofuran, and the target substance precipitates rapidly after it is generated, the subsequent reaction progress is suppressed, and the selectivity of the target substance increases.

該等溶劑可單獨使用1種,亦可混合2種以上使用。 These solvents may be used alone or in combination of two or more.

作為溶劑之使用量之上限,通常使用如成為原料之茀類(I)之10倍體積量、較佳為7倍體積量、進而較佳為4倍體積量之量。另一方面,若溶劑之使用量過少,則有攪拌變困難並且反應之進行變慢之傾向,因此作為下限,通常使用如成為原料之茀類(I)之1倍體積量、較佳為2倍體積量、進而較佳為3倍體積量之量。 As the upper limit of the amount of the solvent used, an amount of 10 times the volume, preferably 7 times the volume, and more preferably 4 times the volume is used as the raw material (I). On the other hand, if the amount of the solvent used is too small, stirring tends to be difficult and the progress of the reaction tends to be slow. Therefore, as the lower limit, a volume of 1 times as much as the raw material (I) is preferably used, preferably 2 The volume-by-volume amount, and more preferably the volume-by-volume amount is 3 times.

<1.8.3.2.4反應形式> <1.8.3.2.4 Reaction Form>

進行步驟(ia)時,反應之形式可採用分批式反應,亦可採用流通式反應,亦可採用組合該等而成者,其形式並無特別限制。 When performing step (ia), the reaction may take the form of a batch reaction, a flow-through reaction, or a combination of these, and the form is not particularly limited.

<1.8.3.2.5反應條件> <1.8.3.2.5 Reaction conditions>

關於步驟(ia),為了抑制相比三茀化合物(IIa),茀環交聯之化合物之產生,較佳為於儘量低溫下進行反應。另一方面,若溫度過低,則有無法獲得充分之反應速度之可能性。 Regarding step (ia), in order to suppress the generation of the fluorene ring-crosslinked compound compared to the trifluorene compound (IIa), the reaction is preferably performed at a low temperature as much as possible. On the other hand, if the temperature is too low, a sufficient reaction rate may not be obtained.

因此,作為具體之反應溫度,通常於上限為40℃、較佳為30℃、更佳為20℃下實施。另一方面,於下限為-50℃、較佳為-20℃、更佳為0℃以上實施。 Therefore, as a specific reaction temperature, the upper limit is usually 40 ° C, preferably 30 ° C, and more preferably 20 ° C. On the other hand, the lower limit is -50 ° C, preferably -20 ° C, and more preferably 0 ° C or higher.

關於步驟(ia)中之通常之反應時間,通常下限為30分鐘,較佳為60分鐘,進而較佳為2小時,且上限並無特別限定,但通常為20小時、較佳為10小時,進而較佳為5小時。 Regarding the usual reaction time in step (ia), the lower limit is usually 30 minutes, preferably 60 minutes, and further preferably 2 hours, and the upper limit is not particularly limited, but is usually 20 hours, preferably 10 hours, It is more preferably 5 hours.

<1.8.3.2.6目標物之分離‧精製> <1.8.3.2.6 Separation and purification of target>

反應結束後,作為目標物之三茀化合物(IIa)可藉由將反應液添加於稀鹽酸等酸性水中,或者將稀鹽酸等酸性水添加於反應液中,使作為目標物之三茀化合物(IIa)析出而進行單離。 After completion of the reaction, the target compound (IIa) can be added to the reaction solution by adding the reaction solution to acidic water such as dilute hydrochloric acid, or by adding acidic water such as dilute hydrochloric acid to the reaction solution. IIa) Precipitation and single isolation.

又,反應結束後,亦可將作為目標物之三茀化合物(IIa)可溶之溶劑與水添加於反應液中而進行萃取。藉由溶劑而萃取之目標物可藉由將溶劑進行濃縮之方法、或者添加不良溶劑之方法等而進行單離。其中,有於室溫下三茀化合物(IIa)對溶劑之溶解性非常低之傾向,因此通常較佳為與酸性水進行接觸而析出之方法。 After the reaction is completed, a solvent in which the target compound (IIa) is soluble and water may be added to the reaction solution to perform extraction. The target substance extracted by the solvent can be isolated by a method of concentrating the solvent or a method of adding a poor solvent. Among them, the solubility of the tertiary amidine compound (IIa) in a solvent at room temperature tends to be very low, and therefore, a method of precipitating it in contact with acidic water is generally preferred.

所獲得之三茀化合物(IIa)亦可直接用作步驟(ii)之原料,但亦可於進行精製後用於步驟(ii)。作為精製法,可採用通常之精製法,例如再結晶、或再沈澱、萃取精製、管柱層析法等,並無限制。 The obtained stilbene compound (IIa) can also be used directly as a raw material in step (ii), but it can also be used in step (ii) after purification. As the purification method, ordinary purification methods such as recrystallization, reprecipitation, extraction purification, and column chromatography can be used without limitation.

<1.8.3.3步驟(ib):R3為直接鍵以外之情形之製造方法> <1.8.3.3 Step (ib): Manufacturing method in a case where R 3 is other than a direct bond>

下述通式(IIb)所表示之三茀化合物係以茀類(I)為原料,於烷基化劑(VIIIa)與鹼存在下,依據下述步驟(ib)所表示之反應而製造。 The tertiary amidine compound represented by the following general formula (IIb) is produced using the amidine group (I) as a raw material, in the presence of an alkylating agent (VIIIa) and a base, according to the reaction represented by the following step (ib).

式中,R3、R3a、R3b為可經取代之碳數1~10之伸烷基、可經取代之碳數4~10之伸芳基、或可經取代之碳數6~10之伸芳烷基,R4~R9係與式(1)中之R4~R9含義相同。X表示脫離基。作為脫離基之例,可列舉:鹵素原子(其中,將氟除外)、甲磺醯基、或甲苯磺醯基等。 In the formula, R 3 , R 3a , and R 3b are an alkylene group having 1 to 10 carbon atoms that can be substituted, an arylene group having 4 to 10 carbon atoms that can be substituted, or 6 to 10 carbon atoms that can be substituted. the arylene group, the same as R 4 ~ R 9 based formula R (1) 4 ~ R 9 in the meaning. X represents a radical. Examples of the leaving group include a halogen atom (excluding fluorine, among others), a methanesulfonyl group, or a tosylsulfonyl group.

三茀化合物(IIb)可藉由以使用正丁基鋰作為鹼,使茀類(I)之陰離子產生後,與烷化劑(VIIIa)進行偶合之方法(J.Am.Chem.Soc.,2007,129,8458.)為參考而進行合成。然而,於該等使用正丁基鋰之方法中,對於工業性地製造而言,有不論是在安全方面,還是在成本方面均非常困難之傾向。 The trifluorene compound (IIb) can be coupled with an alkylating agent (VIIIa) by using n-butyllithium as a base to generate anions of the fluorene (I) (J. Am. Chem. Soc., 2007, 129, 8458.) for reference. However, in these methods using n-butyllithium, for industrial production, there is a tendency that it is very difficult both in terms of safety and cost.

作為步驟(ib)中所使用之烷化劑,可列舉:二碘甲烷、1,2-二碘 乙烷、1,3-二碘丙烷、1,4-二碘丁烷、1,5-二碘戊烷、1,6-二碘己烷、二溴甲烷、1,2-二溴乙烷、1,3-二溴丙烷、1,4-二溴丁烷、1,5-二溴戊烷、1,6-二溴己烷、二氯甲烷、1,2-二氯乙烷、1,3-二氯丙烷、1,4-二氯丁烷、1,5-二氯戊烷、1,6-二氯己烷、1-溴-3-氯丙烷等直鏈狀之烷基二鹵化物(將氟原子除外)、2,2-二甲基-1,3-二氯丙烷等包含側鏈之烷基二鹵化物(將氟原子除外)、1,4-雙(溴甲基)苯、1,3-雙(溴甲基)苯等芳烷基二鹵化物(將氟原子除外)、乙二醇二甲磺酸酯、乙二醇二甲苯磺酸酯、丙二醇二甲磺酸酯、1,4-丁二醇二甲磺酸酯等二醇之二磺酸酯等。 Examples of the alkylating agent used in step (ib) include diiodomethane and 1,2-diiodo Ethane, 1,3-diiodopropane, 1,4-diiodobutane, 1,5-diiodopentane, 1,6-diiodohexane, dibromomethane, 1,2-dibromoethane, 1,3-dibromopropane, 1,4-dibromobutane, 1,5-dibromopentane, 1,6-dibromohexane, dichloromethane, 1,2-dichloroethane, 1, Dihalogenated linear alkyl groups such as 3-dichloropropane, 1,4-dichlorobutane, 1,5-dichloropentane, 1,6-dichlorohexane, and 1-bromo-3-chloropropane (Except fluorine atom), 2,2-dimethyl-1,3-dichloropropane and other alkyl dihalides containing side chains (except fluorine atom), 1,4-bis (bromomethyl) Aralkyl dihalides (excluding fluorine atoms) such as benzene, 1,3-bis (bromomethyl) benzene, ethylene glycol dimethyl sulfonate, ethylene glycol dimethyl sulfonate, propylene glycol dimethyl methanesulfonic acid Esters, diol disulfonates such as 1,4-butanediol dimethanesulfonate and the like.

<1.8.4三茀二酯(1)之製造方法> <1.8.4 Manufacturing method of tris (3) diester (1)>

以下,將下述式所示之步驟(ii)中之三茀二酯(1)之製造方法以R1之種類進行分類而進行記載。 Hereinafter, the production method of the tertiary diester (1) in the step (ii) represented by the following formula is classified by the type of R 1 and described.

式中,R1~R10係與式(1)中之R1~R10含義相同。Ri、Rii及Riii分別獨立表示氫原子、可經取代之碳數1~10之烷基、可經取代之碳數4~10之芳基、或可經取代之碳數6~10之芳烷基。 Wherein, R 1 ~ R 10 the same line with the formula R (1) 1 ~ R 10 in the meaning. R i , R ii and R iii each independently represent a hydrogen atom, an alkyl group having 1 to 10 carbon atoms that can be substituted, an aryl group having 4 to 10 carbon atoms that can be substituted, or 6 to 10 carbon atoms that can be substituted Of aralkyl.

<1.8.4.1步驟(iia):利用麥可加成之製造法> <1.8.4.1 Step (iia): Manufacturing Method by Using Michael Addition>

下述通式(1a)所表示之三茀二酯係於鹼存在下,依據下述之步驟(iia)所表示之反應,自三茀化合物(II)及α,β-不飽和酯(VI)進行製造。 The tertiary diester represented by the following general formula (1a) is based on the reaction represented by the following step (iia) in the presence of a base, from the trifluoride compound (II) and the α, β-unsaturated ester (VI ) For manufacturing.

式中,R3~R10係與式(1)中之R3~R10含義相同。Ri、Rii及Riii分別獨立表示氫原子、可經取代之碳數1~10之烷基、可經取代之碳數4~10之芳基、或可經取代之碳數6~10之芳烷基。 In the formula, 3 to the same meaning as R 10 R 10 R & lt lines 3 to the formula R (1) in the. R i , R ii and R iii each independently represent a hydrogen atom, an alkyl group having 1 to 10 carbon atoms that can be substituted, an aryl group having 4 to 10 carbon atoms that can be substituted, or 6 to 10 carbon atoms that can be substituted Of aralkyl.

<1.8.4.1.1 α,β-不飽和酯> <1.8.4.1.1 α, β-unsaturated ester>

作為反應試劑之α,β-不飽和酯係步驟(iia)中之通式(VI)所表示者,通式(VI)中,Ri、Rii及Riii分別獨立表示氫原子、碳數1~10之烷基、可經取代之碳數4~10之芳基、或可經取代之碳數6~10之芳烷基。具體而言,可列舉:甲基、乙基、正丙基、異丙基、環己基等(可為直鏈亦可為側鏈)烷基、苯基、1-萘基、2-萘基、2-噻吩基等芳基、苄基、2-苯基乙基、對甲氧基苄基等芳烷基。 The α, β-unsaturated ester system as the reaction reagent is represented by the general formula (VI) in the step (iia). In the general formula (VI), R i , R ii and R iii each independently represent a hydrogen atom and a carbon number. An alkyl group of 1 to 10, an aryl group of 4 to 10 carbons that can be substituted, or an aralkyl group of 6 to 10 carbons that can be substituted. Specific examples include: methyl, ethyl, n-propyl, isopropyl, cyclohexyl, etc. (which may be straight or side chain) alkyl, phenyl, 1-naphthyl, 2-naphthyl , Aryl such as 2-thienyl, aralkyl such as benzyl, 2-phenylethyl, and p-methoxybenzyl.

作為α,β-不飽和酯(VI),可列舉:丙烯酸甲酯、丙烯酸乙酯、丙烯酸苯酯、丙烯酸烯丙酯、丙烯酸縮水甘油酯、丙烯酸2-羥基乙酯、丙烯酸4-羥基丁酯、1,4-環己烷二甲醇單丙烯酸酯等丙烯酸酯類、甲基丙烯酸甲酯、甲基丙烯酸乙酯、甲基丙烯酸苯酯、甲基丙烯酸烯丙酯、甲基丙烯酸縮水甘油酯、甲基丙烯酸2-羥基乙酯等甲基丙烯酸酯類、2-乙基丙烯酸甲酯、2-苯基丙烯酸甲酯等α-取代不飽和酯類、肉桂酸甲酯、肉桂酸乙酯、丁烯酸甲酯、丁烯酸乙酯等β-取代不飽和酯類。其中,較佳為可直接導入聚合反應性基之下述通式(VI-1)所表示之不飽和羧酸酯。 Examples of the α, β-unsaturated ester (VI) include methyl acrylate, ethyl acrylate, phenyl acrylate, allyl acrylate, glycidyl acrylate, 2-hydroxyethyl acrylate, and 4-hydroxybutyl acrylate. Acrylates such as 1,4-cyclohexanedimethanol monoacrylate, methyl methacrylate, ethyl methacrylate, phenyl methacrylate, allyl methacrylate, glycidyl methacrylate, Methacrylic esters such as 2-hydroxyethyl methacrylate, α-substituted unsaturated esters such as methyl 2-ethylacrylate and methyl 2-phenylacrylate, methyl cinnamate, ethyl cinnamate, butyl Β-substituted unsaturated esters such as methyl enoate and ethyl butenoate. Among these, an unsaturated carboxylic acid ester represented by the following general formula (VI-1) into which a polymerization-reactive group can be directly introduced is preferred.

[化51] [Chemical 51]

(式中,R10表示碳數1~10之有機取代基,Riii表示氫原子、可經取代之碳數1~10之烷基、可經取代之碳數4~10之芳基、或可經取代之碳數6~10之芳烷基)。更佳為其所包含之丙烯酸酯類、甲基丙烯酸酯類或α-取代不飽和酯類,就反應速度與反應選擇性之觀點而言,進而較佳為Riii為氫原子或甲基之丙烯酸酯類或甲基丙烯酸酯類。R10更小者於工業上廉價且蒸餾精製亦容易,反應性亦較高,因此尤佳為丙烯酸甲酯、甲基丙烯酸甲酯、丙烯酸乙酯、甲基丙烯酸乙酯、丙烯酸苯酯、或甲基丙烯酸苯酯。 (In the formula, R 10 represents an organic substituent having 1 to 10 carbon atoms, and R iii represents a hydrogen atom, an alkyl group having 1 to 10 carbon atoms that can be substituted, an aryl group having 4 to 10 carbon atoms that can be substituted, or Arylalkyl with 6 to 10 carbon atoms that can be substituted). The acrylates, methacrylates, or α-substituted unsaturated esters contained therein are more preferable, and from the viewpoint of reaction speed and reaction selectivity, it is more preferable that R iii is a hydrogen atom or a methyl group. Acrylates or methacrylates. The smaller R 10 is industrially cheap and easy to be distilled and refined, and has high reactivity, so it is particularly preferably methyl acrylate, methyl methacrylate, ethyl acrylate, ethyl methacrylate, phenyl acrylate, or Phenyl methacrylate.

另一方面,於不飽和羧酸酯(VI-1)為具有丙烯酸2-羥基乙酯基、丙烯酸4-羥基丁酯基、1,4-環己烷二甲醇單丙烯酸酯基等羥基烷基之酯類之情形時,因可於第1階段獲得聚酯碳酸酯、聚酯之原料,故而尤佳。 On the other hand, the unsaturated carboxylic acid ester (VI-1) has a hydroxyalkyl group such as a 2-hydroxyethyl acrylate group, a 4-hydroxybutyl acrylate group, and a 1,4-cyclohexanedimethanol monoacrylate group. In the case of esters, polyester carbonate and polyester raw materials can be obtained in the first stage, which is particularly preferable.

亦可使用不同之2種以上之α,β-不飽和酯(VI),就精製之簡便性而言,較佳為使用1種之α,β-不飽和酯(VI)。 It is also possible to use two or more different α, β-unsaturated esters (VI). In terms of simplicity of purification, it is preferable to use one type of α, β-unsaturated ester (VI).

α,β-不飽和酯(VI)之聚合活性較高,因此若以高濃度存在,則有由於光、熱、酸‧鹼等外部刺激而容易進行聚合之傾向。此時,有因伴隨著較大之放熱,而變得非常危險之情形。因此,關於α,β-不飽和酯(VI)之使用量,就安全性之觀點而言,較佳為不過量地使用。通常相對於作為原料之三茀化合物(II),為10倍莫耳以下,較佳為5倍莫耳以下,進而較佳為3倍莫耳以下。下限係相對於原料以理論量計為2倍莫耳,因此通常為2倍莫耳以上。為了使反應之進行變快,不使原料或中間物殘留,α,β-不飽和酯(VI)之使用量係相對於原料之三茀化合物(II)為2.2倍莫耳以上,進而較佳為2.5倍莫耳以上。 The polymerization activity of α, β-unsaturated ester (VI) is relatively high. Therefore, if it is present at a high concentration, it tends to be easily polymerized due to external stimuli such as light, heat, acid, and alkali. At this time, there is a case where it becomes very dangerous due to a large heat release. Therefore, the use amount of the α, β-unsaturated ester (VI) is preferably not excessively used from the viewpoint of safety. It is usually 10 times or less, preferably 5 times or less, and more preferably 3 times or less, with respect to the tertiary amidine compound (II) as a raw material. The lower limit is 2 times the mole in terms of the theoretical amount of the raw material, and therefore is usually 2 times the mole or more. In order to speed up the reaction without leaving raw materials or intermediates, the amount of α, β-unsaturated ester (VI) used is 2.2 times more mols than that of the tris (3) compound (II) of the raw materials, which is more preferable. It is 2.5 times more than Mol.

<1.8.4.1.2鹼> <1.8.4.1.2 alkali>

作為鹼,可使用氫氧化鋰、氫氧化鈉、氫氧化鉀等鹼金屬氫氧化物、氫氧化鈣、氫氧化鋇等鹼土金屬之氫氧化物、碳酸鈉、碳酸氫鈉、碳酸鉀等鹼金屬之碳酸鹽、碳酸鎂、碳酸鈣等鹼土金屬之碳酸鹽、磷酸鈉、磷酸氫鈉、磷酸鉀等磷酸之鹼金屬鹽、正丁基鋰、第三丁基鋰等有機鋰鹽、甲醇鈉、乙醇鈉、第三丁醇鉀等鹼金屬之烷醇鹽、氫化鈉或氫化鉀等氫化鹼金屬鹽、三乙基胺、二氮雜雙環十一烯等三級胺、四甲基氫氧化銨、四丁基氫氧化銨、苄基三甲基氫氧化銨等四級氫氧化銨。該等可單獨使用1種,亦可併用2種以上。 As the base, alkali metal hydroxides such as lithium hydroxide, sodium hydroxide, and potassium hydroxide; hydroxides of alkaline earth metals such as calcium hydroxide and barium hydroxide; and alkali metals such as sodium carbonate, sodium bicarbonate, and potassium carbonate can be used. Carbonate, magnesium carbonate, calcium carbonate and other alkaline earth metal carbonates, sodium phosphate, sodium hydrogen phosphate, potassium phosphate and other phosphoric acid alkali metal salts, organic lithium salts such as n-butyl lithium, third butyl lithium, sodium methoxide, Alkoxides of alkali metals such as sodium ethoxide, potassium tert-butoxide, etc., alkali metal hydrides such as sodium hydride or potassium hydride, tertiary amines such as triethylamine, diazabicycloundecene, and tetramethylammonium hydroxide , Tetrabutylammonium hydroxide, benzyltrimethylammonium hydroxide, and other tertiary ammonium hydroxide. These may be used individually by 1 type, and may use 2 or more types together.

於R3為亞甲基之情形、與其以外之情形時,有三茀化合物(II)之反應性存在較大差異之傾向。因此,將R3為亞甲基之情形、與其以外之情形分開進行記載。 In the case where R 3 is a methylene group and other cases, there is a tendency that the reactivity of the stilbene compound (II) is greatly different. Therefore, the case where R 3 is methylene is described separately from the case other than R 3 .

於R3為亞甲基之情形時,三茀化合物(II)係於溶劑中,於鹼存在下容易地進行分解反應。因此,於有機層與水層之二層系中進行反應之情形時,就可抑制分解反應等副反應之方面而言,較佳為使用水溶性之無機鹼。其中,就成本、反應性之方面而言,較佳為鹼金屬之氫氧化物之水溶液,尤其是氫氧化鈉之水溶液或氫氧化鉀之水溶液更佳,進而較佳為氫氧化鈉之水溶液。 When R 3 is a methylene group, the trifluorene compound (II) is in a solvent, and a decomposition reaction is easily performed in the presence of a base. Therefore, when a reaction is performed in a two-layer system of an organic layer and an aqueous layer, a water-soluble inorganic base is preferably used in terms of suppressing side reactions such as decomposition reactions. Among these, in terms of cost and reactivity, an aqueous solution of an alkali metal hydroxide, particularly an aqueous solution of sodium hydroxide or an aqueous solution of potassium hydroxide is more preferable, and an aqueous solution of sodium hydroxide is more preferable.

又,關於水溶液之濃度,於使用尤佳之氫氧化鈉水溶液之情形時,若濃度較薄,則有反應速度明顯降低之傾向,因此尤佳為使用通常為10wt/wt%以上、較佳為30wt/wt%以上、更佳為40wt/wt%以上之水溶液。 In addition, regarding the concentration of the aqueous solution, in the case of using an especially preferred sodium hydroxide aqueous solution, if the concentration is relatively thin, the reaction rate tends to be significantly reduced. Therefore, it is particularly preferred to use 10wt / wt% or more, preferably An aqueous solution of 30 wt / wt% or more, more preferably 40 wt / wt% or more.

於R3為亞甲基以外之情形時,於有機層與水層之二層系中亦進行反應,但於使用溶解於有機層之有機鹼而進行反應之情形時,有反應迅速進行之傾向,因此較佳為使用有機鹼。該等中,較佳為於本反應中具有充分之鹼性之鹼金屬之烷氧化物,更佳為工業上廉價之甲醇鈉 或乙醇鈉。此處,鹼金屬之烷氧化物可使用粉狀者,亦可使用醇溶液等液狀者。又,亦可使鹼金屬與醇進行反應而製備。 When R 3 is other than methylene, the reaction is also performed in the two-layer system of the organic layer and the water layer. However, when the reaction is performed using an organic base dissolved in the organic layer, the reaction tends to proceed quickly. Therefore, it is preferable to use an organic base. Among these, an alkali metal alkoxide having sufficient basicity in this reaction is preferable, and industrially inexpensive sodium methoxide or sodium ethoxide is more preferable. Here, the alkali metal alkoxide may be used in a powder form or in a liquid form such as an alcohol solution. Alternatively, it may be prepared by reacting an alkali metal with an alcohol.

於R3為亞甲基之情形時,關於鹼之使用量,相對於作為原料之三茀化合物(II),上限並無特別限制,若使用量過多,則有攪拌或反應後之精製負荷變大之情形,因此於使用作為尤佳之鹼之40wt/wt%以上之氫氧化鈉水溶液之情形時,通常相對於三茀(II)為10倍體積量以下,較佳為5倍體積量以下,進而較佳為2倍體積量以下。若鹼量過少,則反應速度明顯降低,因此通常鹼相對於原料之三茀化合物(II)為0.1倍體積量以上。較佳為0.2倍體積量以上,更佳為0.5倍體積量以上。 In the case where R 3 is methylene, the upper limit of the amount of alkali used is not particularly limited with respect to the compound (II) as a raw material. If the amount is too large, the purification load after stirring or reaction may change. In most cases, when an aqueous sodium hydroxide solution of 40 wt / wt% or more, which is a particularly preferred base, is used, it is usually 10 times or less the volume, and preferably 5 times or less the volume of the tris (II). It is more preferably 2 times the volume or less. If the amount of the base is too small, the reaction rate is significantly reduced. Therefore, the amount of the base is generally 0.1 times or more the volume of the stilbene compound (II) of the raw material. It is preferably at least 0.2 times the volume, more preferably at least 0.5 times the volume.

於R3為亞甲基以外之情形時,關於鹼之使用量,相對於作為原料之三茀化合物(II),上限並無特別限制,若使用量過多,則有攪拌或反應後之精製負荷變大之情形,因此於使用作為尤佳之鹼之甲醇鈉或乙醇鈉之情形時,通常相對於三茀化合物(II)為5倍莫耳以下,較佳為2倍莫耳以下,進而較佳為1倍莫耳以下,尤佳為0.5倍莫耳以下。若鹼量過少,則有反應速度明顯降低之傾向,因此通常鹼相對於原料之三茀(II)為0.005倍莫耳以上。較佳為0.01倍莫耳以上,更佳為0.05倍莫耳以上,尤佳為0.1倍莫耳以上。 When R 3 is other than methylene, the upper limit of the amount of alkali used is not particularly limited relative to the compound (II) used as a raw material. If the amount is too large, there may be a purification load after stirring or reaction. When it becomes larger, when using sodium methoxide or sodium ethoxide as a particularly good base, it is usually 5 times or less, preferably 2 times or less, and more It is preferably less than 1 mole, particularly preferably less than 0.5 mole. If the amount of alkali is too small, the reaction rate tends to be significantly reduced. Therefore, the alkali is usually 0.005 times mole or more relative to the base (II) of the raw material. It is preferably at least 0.01 times the mole, more preferably at least 0.05 times the mole, and even more preferably at least 0.1 times the mole.

<1.8.4.1.3相間轉移觸媒> <1.8.4.1.3 Phase-to-phase transfer catalyst>

於步驟(iia)中,於有機層與水層之二層系中進行反應之情形時,為了提高反應速度,較佳為使用相間轉移觸媒。 In the case where the reaction is performed in a two-layer system of an organic layer and an aqueous layer in step (iia), in order to increase the reaction speed, it is preferable to use a phase transfer catalyst.

作為相間轉移觸媒,可列舉:氯化四甲基銨、溴化四丁基銨、氯化甲基三辛基銨、氯化甲基三癸基銨、氯化苄基三甲基銨、氯化三辛基甲基銨、碘化四丁基銨、溴化乙醯基三甲基銨、氯化苄基三乙基銨等四級銨鹽之鹵化物(氟除外)、氯化N,N-二甲基吡咯啶鎓、碘化N-乙基-N-甲基吡咯啶鎓、溴化N-丁基-N-甲基吡咯啶鎓、氯化N-苄基- N-甲基吡咯啶鎓、溴化N-乙基-N-甲基吡咯啶鎓等四級吡咯啶鎓鹽之鹵化物(氟除外)、溴化N-丁基-N-甲基嗎啉鎓、碘化N-丁基-N-甲基嗎啉鎓、溴化N-烯丙基-N-甲基嗎啉鎓等四級嗎啉鎓鹽之鹵化物(氟除外)、氯化N-甲基-N-苄基哌啶鎓、溴化N-甲基-N-苄基哌啶鎓、碘化N,N-二甲基哌啶鎓、N-甲基-N-丁基哌啶鎓乙酸鹽、碘化N-甲基-N-乙基哌啶鎓等四級哌啶鎓鹽之鹵化物(氟除外)、冠醚類等。較佳為四級銨鹽,進而較佳為溴化四丁基銨、氯化苄基三甲基銨、或氯化苄基三乙基銨。 Examples of the phase transfer catalyst include tetramethylammonium chloride, tetrabutylammonium bromide, methyltrioctylammonium chloride, methyltridecylammonium chloride, benzyltrimethylammonium chloride, Halides (except fluorine) of quaternary ammonium salts such as trioctylmethylammonium chloride, tetrabutylammonium iodide, acetamyltrimethylammonium bromide, benzyltriethylammonium chloride, etc. , N-dimethylpyrrolidinium, N-ethyl-N-methylpyrrolidinium iodide, N-butyl-N-methylpyrrolidinium bromide, N-benzyl chloride- Halides (except fluorine) of quaternary pyrrolidinium salts such as N-methylpyrrolidinium, N-ethyl-N-methylpyrrolidinium bromide, N-butyl-N-methylmorpholine bromide Halides (except fluorine) of quaternary morpholinium salts such as onium, N-butyl-N-methylmorpholinium iodide, N-allyl-N-methylmorpholinium bromide (except fluorine), N chloride -Methyl-N-benzylpiperidinium, N-methyl-N-benzylpiperidinium bromide, N, N-dimethylpiperidinium iodide, N-methyl-N-butylpiperium Halides (except fluorine) of quaternary piperidinium salts such as pyridinium acetate, N-methyl-N-ethylpiperidinium iodide, and crown ethers. A quaternary ammonium salt is preferable, and tetrabutylammonium bromide, benzyltrimethylammonium chloride, or benzyltriethylammonium chloride is more preferable.

該等可單獨使用1種,亦可併用2種以上。 These may be used individually by 1 type, and may use 2 or more types together.

關於相間轉移觸媒之使用量,若相對於作為原料之三茀化合物(II)過多,則有酯之水解或逐次麥可反應等副反應之進行變明顯之傾向,又,就成本之觀點而言,通常相對於三茀化合物(II)為5倍莫耳以下,較佳為2倍莫耳以下,進而較佳為1倍莫耳以下。若相間轉移觸媒之使用量過少,則有反應速度明顯降低之傾向,因此通常相間轉移觸媒之使用量相對於原料之三茀化合物(II)為0.01倍莫耳以上。較佳為0.1倍莫耳以上,更佳為0.5倍莫耳以上。 Regarding the use amount of the phase transfer catalyst, if it is too much relative to the compound (II), which is a raw material, there is a tendency that side reactions such as hydrolysis of esters or successive Michael reactions tend to become obvious, and from the viewpoint of cost, In other words, it is usually 5 times or less, preferably 2 times or less, and even more preferably 1 time or less with respect to the trifluorene compound (II). If the amount of the interphase transfer catalyst used is too small, the reaction rate tends to be significantly reduced. Therefore, the amount of the interphase transfer catalyst used is usually 0.01 times the mole or more of the raw material of the stilbene compound (II). It is preferably at least 0.1 times mole, more preferably at least 0.5 times mole.

<1.8.4.1.4溶劑> <1.8.4.1.4 Solvent>

步驟(iia)較理想為使用溶劑而進行。 Step (iia) is preferably performed using a solvent.

關於具體可使用之溶劑,作為烷基腈系溶劑,可列舉乙腈、丙腈等,作為酮系溶劑,可列舉丙酮、甲基乙基酮、甲基異丁基酮等,作為酯系溶劑,可列舉乙酸甲酯、乙酸乙酯、乙酸丙酯、乙酸苯酯、丙酸甲酯、丙酸乙酯、丙酸丙酯、丙酸苯酯、3-甲氧基丙酸甲酯、3-甲氧基丙酸甲酯、乳酸甲酯、乳酸乙酯等直鏈狀之酯類;γ-丁內酯、己內酯等環狀酯類;乙二醇單甲醚乙酸酯、乙二醇單乙醚乙酸酯、乙二醇單丁醚乙酸酯、丙二醇-1-單甲醚乙酸酯、丙二醇-1-單乙醚乙酸酯等醚酯類等,作為醚系溶劑,可列舉二乙醚、四氫呋喃、1,4-二 烷、甲基環戊基醚、第三丁基甲基醚等,作為鹵素系溶劑,可列舉1,2-二氯乙烷、二氯甲烷、氯仿、1,1,2,2-四氯乙烷等,作為鹵素系芳香族烴,可列舉氯苯、1,2-二氯苯等,作為醯胺系溶劑,可列舉N,N-二甲基甲醯胺、N,N,-二甲基乙醯胺等,作為亞碸系溶劑,可列舉二甲基亞碸、環丁碸等,作為環狀式脂肪族烴,可列舉環戊烷、環己烷、環庚烷、環辛烷等單環狀式脂肪族烴;作為其衍生物之甲基環戊烷、乙基環戊烷、甲基環己烷、乙基環己烷、1,2-二甲基環己烷、1,3-二甲基環己烷、1,4-二甲基環己烷、異丙基環己烷、正丙基環己烷、第三丁基環己烷、正丁基環己烷、異丁基環己烷、1,2,4-三甲基環己烷、1,3,5-三甲基環己烷等;十氫萘等多環狀式脂肪族烴;正戊烷、正己烷、正庚烷、正辛烷、異辛烷、正壬烷、正癸烷、正十二烷、正十四烷等非環狀式脂肪族烴,作為芳香族烴,可列舉:甲苯、對二甲苯、鄰二甲苯、間二甲苯等,作為芳香族雜環,可列舉吡啶等,作為醇系溶劑,可列舉甲醇、乙醇、異丙醇、正丁醇、第三丁醇、己醇、辛醇、環己醇等。 Specific solvents that can be used include acetonitrile and propionitrile as the alkyl nitrile solvent, and acetone, methyl ethyl ketone, and methyl isobutyl ketone as the ketone solvent. As the ester solvent, Examples include methyl acetate, ethyl acetate, propyl acetate, phenyl acetate, methyl propionate, ethyl propionate, propyl propionate, phenyl propionate, methyl 3-methoxypropionate, 3- Linear esters such as methyl methoxypropionate, methyl lactate, ethyl lactate; cyclic esters such as γ-butyrolactone, caprolactone; ethylene glycol monomethyl ether acetate, ethylene glycol Ether esters such as alcohol monoethyl ether acetate, ethylene glycol monobutyl ether acetate, propylene glycol-1-monomethyl ether acetate, propylene glycol-1-monoethyl ether acetate, and the like, and examples thereof include ether solvents Diethyl ether, tetrahydrofuran, 1,4-bis Alkane, methylcyclopentyl ether, third butyl methyl ether, and the like. Examples of the halogen-based solvent include 1,2-dichloroethane, dichloromethane, chloroform, and 1,1,2,2-tetrachloroethane. Examples of the halogen-based aromatic hydrocarbon include chlorobenzene and 1,2-dichlorobenzene. Examples of the fluorene-based solvent include N, N-dimethylformamide and N, N, -dimethyl. Acetylamine and the like include fluorene-based solvents such as dimethyl fluorene and cyclobutane, and examples of cyclic aliphatic hydrocarbons include cyclopentane, cyclohexane, cycloheptane, and cyclooctane. Monocyclic aliphatic hydrocarbons; methylcyclopentane, ethylcyclopentane, methylcyclohexane, ethylcyclohexane, 1,2-dimethylcyclohexane, 1, 2 3-dimethylcyclohexane, 1,4-dimethylcyclohexane, isopropylcyclohexane, n-propylcyclohexane, third butylcyclohexane, n-butylcyclohexane, isopropyl Butylcyclohexane, 1,2,4-trimethylcyclohexane, 1,3,5-trimethylcyclohexane, etc .; Polycyclic aliphatic hydrocarbons such as decalin; n-pentane, n-hexane Non-cyclic aliphatic hydrocarbons such as alkane, n-heptane, n-octane, isooctane, n-nonane, n-decane, n-dodecane, n-tetradecane Examples of the aromatic hydrocarbon include toluene, para-xylene, o-xylene, and meta-xylene. Examples of the aromatic heterocyclic ring include pyridine. Examples of the alcohol-based solvent include methanol, ethanol, isopropyl alcohol, N-butanol, tertiary butanol, hexanol, octanol, cyclohexanol and the like.

於R3為亞甲基之情形時,可知有如下傾向,即藉由使用與水相分離之溶劑而可抑制三茀化合物(II)之分解反應等副反應。進而於使用使原料之三茀化合物(II)充分溶解之溶劑之情形時,有反應之進行良好之傾向,因此較佳為使用原料之三茀化合物(II)之溶解度為0.5質量%以上之溶劑,更佳為使用溶解度為1.0質量%以上之溶劑,尤佳為使用溶解度為1.5質量%以上之溶劑。具體而言,較佳為鹵素系脂肪族烴、鹵素系芳香族烴、芳香族烴、或醚系溶劑,尤佳為二氯甲烷、氯苯、氯仿、1,2-二氯苯、四氫呋喃、1,4-二烷、或甲基環戊基醚。 When R 3 is a methylene group, it is known that by using a solvent separated from the aqueous phase, side reactions such as the decomposition reaction of the trifluorene compound (II) can be suppressed. Furthermore, in the case where a solvent that sufficiently dissolves the compound III of the raw material (II) is used, the reaction tends to proceed well. Therefore, it is preferable to use a solvent whose solubility of the compound III of the raw material (II) is 0.5% by mass or more. It is more preferable to use a solvent having a solubility of 1.0% by mass or more, and more preferably to use a solvent having a solubility of 1.5% by mass or more. Specifically, a halogen-based aliphatic hydrocarbon, a halogen-based aromatic hydrocarbon, an aromatic hydrocarbon, or an ether-based solvent is preferred, and dichloromethane, chlorobenzene, chloroform, 1,2-dichlorobenzene, tetrahydrofuran, 1,4-two Alkane, or methylcyclopentyl ether.

該等溶劑可單獨使用1種,亦可混合2種以上使用。 These solvents may be used alone or in combination of two or more.

關於溶劑之使用量,上限並無特別限制,若考慮每個反應器之目標物之產生效率,則通常使用如成為原料之三茀化合物(II)之20倍 體積量、較佳為15倍體積量、進而較佳為10倍體積量之量。另一方面,若溶劑之使用量過少,則有試劑之溶解性變差而攪拌變困難,並且反應之進行變慢之傾向,因此作為下限,通常使用如成為原料之三茀化合物(II)之1倍體積量、較佳為2倍體積量、進而較佳為4倍體積量之量。 With regard to the amount of solvent used, the upper limit is not particularly limited. If the production efficiency of the target substance in each reactor is considered, it is usually used as 20 times as much as the compound (II) of the raw material. The volume amount is preferably an amount of 15 times the volume amount, and more preferably an amount of 10 times the volume amount. On the other hand, if the amount of the solvent used is too small, the solubility of the reagent becomes worse, the stirring becomes difficult, and the progress of the reaction tends to be slow. Therefore, as the lower limit, the compound (II), which is a raw material, is generally used. An amount of 1 volume, preferably an amount of 2 volume, and further preferably an amount of 4 volume.

於R3為亞甲基以外之情形時,可知有如下傾向,即有機鹼及三茀化合物(II)之溶解性對反應速度產生較大之影響,為了確保其溶解性,較理想為使用具有一定值以上之介電常數之溶劑。作為使有機鹼及三茀化合物(II)充分溶解之溶劑,較佳為芳香族雜環、烷基腈系溶劑、醯胺系溶劑、亞碸系溶劑,尤佳為吡啶、乙腈、N,N-二甲基甲醯胺、N,N-二甲基乙醯胺、二甲基亞碸、環丁碸。該等溶劑可單獨使用1種,亦可混合2種以上使用。 When R 3 is other than methylene, it is known that the solubility of the organic base and the trifluorene compound (II) has a large influence on the reaction rate. In order to ensure the solubility, it is preferable to use Solvents with a dielectric constant above a certain value. As a solvent for sufficiently dissolving the organic base and the trifluorene compound (II), an aromatic heterocyclic ring, an alkylnitrile-based solvent, a fluorene-amine-based solvent, and a fluorene-based solvent are preferable, and pyridine, acetonitrile, N, N -Dimethylformamide, N, N-dimethylacetamide, dimethylmethane, cyclobutane. These solvents may be used alone or in combination of two or more.

關於溶劑之使用量,上限並無特別限制,若考慮每個反應器之目標物之產生效率,則通常使用如成為原料之三茀(II)之20倍體積量、較佳為15倍體積量、進而較佳為10倍體積量之量。另一方面,若溶劑之使用量過少,則有試劑之溶解性變差而攪拌變困難,並且反應之進行變慢之傾向,因此作為下限,通常使用如成為原料之三茀(II)之1倍體積量、較佳為2倍體積量、進而較佳為4倍體積量之量。 Regarding the amount of solvent used, the upper limit is not particularly limited. If the production efficiency of the target of each reactor is taken into consideration, it is usually 20 times the volume, preferably 15 times the volume. And more preferably an amount of 10 times the volume. On the other hand, if the amount of the solvent used is too small, the solubility of the reagent becomes worse, the stirring becomes difficult, and the progress of the reaction tends to be slow. Therefore, as the lower limit, it is usually used as the raw material of the third compound (II) 1 The volume-by-volume amount is preferably an amount of 2-volumes, and more preferably an amount of 4-volumes.

<1.8.4.1.5反應形式> <1.8.4.1.5 Reaction Form>

進行步驟(iia)時,反應之形式可採用分批式反應,亦可採用流通式反應,亦可採用組合該等而成者,其形式並無特別限制。 When the step (iia) is performed, the form of the reaction may be a batch reaction, a flow-through reaction, or a combination of these, and the form is not particularly limited.

關於批次式之情形時反應試劑向反應器之投入方法,於反應開始時將α,β-不飽和酯(VI)一次性添加之情形時,α,β-不飽和酯(VI)以高濃度存在,因此副反應之聚合反應容易進行。因此,較佳為於添加原料之三茀化合物(II)、相間轉移觸媒、溶劑及鹼後,少量多次地逐次添加α,β-不飽和酯(VI)。 Regarding the method of feeding the reaction reagent into the reactor in the case of batch type, when α, β-unsaturated ester (VI) is added at one time at the start of the reaction, α, β-unsaturated ester (VI) is higher The concentration is present, so that the polymerization reaction of side reactions easily proceeds. Therefore, it is preferable to add the α, β-unsaturated ester (VI) one after another in small amounts and multiple times after adding the stilbene compound (II), the phase transfer catalyst, the solvent, and the base.

<1.8.4.1.6反應條件> <1.8.4.1.6 Reaction conditions>

於步驟(iia)中,若溫度過低,則無法獲得充分之反應速度,反之若溫度過高,則有α,β-不飽和酯(VI)之聚合反應容易進行之傾向,因此溫度管理重要。因此,作為反應溫度,具體而言,通常於下限為0℃、較佳為10℃、更佳為15℃下實施。另一方面,通常於上限為40℃、較佳為30℃、更佳為20℃下實施。 In the step (iia), if the temperature is too low, a sufficient reaction rate cannot be obtained. On the other hand, if the temperature is too high, the polymerization reaction of α, β-unsaturated ester (VI) tends to proceed easily. Therefore, temperature management is important. . Therefore, as the reaction temperature, the lower limit is usually 0 ° C, preferably 10 ° C, and more preferably 15 ° C. On the other hand, the upper limit is usually 40 ° C, preferably 30 ° C, and more preferably 20 ° C.

關於步驟(iia)中之通常之反應時間,通常下限為30分鐘,較佳為1小時,進而較佳為2小時,且上限並無特別限定,通常為20小時,較佳為10小時,進而較佳為5小時。 With regard to the usual reaction time in step (iia), the lower limit is usually 30 minutes, preferably 1 hour, and further preferably 2 hours, and the upper limit is not particularly limited, and is usually 20 hours, preferably 10 hours, and further It is preferably 5 hours.

<1.8.4.1.7目標物之分離‧精製> <1.8.4.1.7 Separation and purification of target>

反應結束後,作為目標物之三茀二酯(1a)可藉由將副產生之金屬鹵化物、及殘留之無機鹼進行過濾而自反應液去除後,採用將溶劑進行濃縮之方法、或添加目標物之不良溶劑之方法等,使作為目標物之三茀二酯(1a)析出而進行單離。 After the reaction, the tertiary diester (1a) as a target can be removed from the reaction solution by filtering by-produced metal halides and residual inorganic bases, and then concentrating the solvent or adding A method of a poor solvent for the target substance, etc., is to separate and separate the tri-methylene diester (1a) as the target substance.

又,反應結束後,亦可向反應液添加酸性水與作為目標物之三茀二酯(1a)可溶之溶劑而進行萃取。藉由溶劑而萃取之目標物可藉由將溶劑進行濃縮之方法、或添加不良溶劑之方法等而進行單離。 In addition, after the reaction is completed, acid water and a solvent in which the trimer diester (1a) as a target substance is soluble may be added to the reaction solution to perform extraction. The target substance extracted by the solvent can be isolated by a method of concentrating the solvent or a method of adding a poor solvent.

作為萃取時可使用之溶劑,只要為使作為目標物之三茀二酯(1a)溶解者即可,並無特別限制,可較佳地使用甲苯、二甲苯等芳香族烴化合物、二氯甲烷、氯仿等鹵素系溶劑等1種或2種以上。 The solvent that can be used during extraction is not particularly limited as long as it dissolves the target tertiary diester (1a), and aromatic hydrocarbon compounds such as toluene and xylene, and dichloromethane can be preferably used. Or one or more halogen-based solvents such as chloroform and chloroform.

此處所獲得之三茀二酯(1a)可直接用作聚酯、或聚酯碳酸酯原料單體、或者聚碳酸酯原料單體之前驅物體等,但亦可於進行精製後使用。作為精製法,可採用通常之精製法,例如再結晶、或再沈澱、萃取精製、管柱層析法等,並無限制。又,亦可使三茀二酯(1a)溶解於適當之溶劑並利用活性碳進行處理。此時可使用之溶劑係與萃取時可使用之溶劑相同。 The tertiary diester (1a) obtained here can be directly used as a precursor of polyester, polyester carbonate raw material monomer, or polycarbonate raw material monomer, but it can also be used after purification. As the purification method, ordinary purification methods such as recrystallization, reprecipitation, extraction purification, and column chromatography can be used without limitation. Moreover, you may dissolve a trimethyl diester (1a) in an appropriate solvent, and may process with activated carbon. The solvent that can be used at this time is the same as the solvent that can be used during extraction.

<1.8.4.2 步驟(iib):利用烷基化之製造法> <1.8.4.2 Step (iib): Manufacturing method using alkylation>

三茀二酯(1b)可藉由經過三茀化合物(II)與烷化劑(VIIIb)及(VIIIc)之烷基化反應之方法而進行製造。 The trimethyl diester (1b) can be produced by a method of an alkylation reaction of the trimethyl compound (II) with an alkylating agent (VIIIb) and (VIIIc).

式中,R1~R9係與式(1)中之R1~R9含義相同。X表示脫離基。作為脫離基之例,可列舉鹵素原子(其中,將氟除外)、甲磺醯基、或甲苯磺醯基等。 Wherein, R 1 ~ R 9 the same line with the formula R (1) 1 ~ R 9 in the meaning. X represents a radical. Examples of the leaving group include a halogen atom (excluding fluorine), a methanesulfonyl group, or a tosylsulfonyl group.

茀類之烷基化反應眾所周知,例如報告有9,9-雙(溴己基)茀或9,9-雙(碘己基)茀等9,9-雙(鹵烷基)茀(J.Org.Chem.,2010,75,2714.)。根據該等見解,可藉由以三茀化合物(II)為原料而合成三茀二酯(1b)。 The alkylation reaction of amidines is well known. For example, 9,9-bis (bromohexyl) fluorene or 9,9-bis (iodohexyl) fluorene and other 9,9-bis (haloalkyl) fluorene (J. Org. Chem., 2010, 75, 2714.). Based on these findings, it is possible to synthesize a triester diester (1b) by using the killer compound (II) as a raw material.

作為步驟(iib)中所使用之烷化劑,可列舉:氯乙酸甲酯、溴乙酸甲酯、碘乙酸甲酯、氯乙酸乙酯、溴乙酸乙酯、碘乙酸乙酯、氯乙酸丙酯、氯乙酸正丁酯、氯乙酸第三丁酯、溴乙酸第三丁酯、碘乙酸第三丁酯、2-氯丙酸甲酯、2-溴丙酸甲酯、2-碘丙酸甲酯、2-氯丙酸乙酯、2-氯丙酸第三丁酯、2-溴丙酸第三丁酯、2-溴丙酸乙酯、2-碘丙酸乙酯、3-氯丁酸甲酯、3-溴丁酸甲酯、3-碘丁酸甲酯、3-氯丁酸乙酯、3-氯丁酸乙酯、3-碘丁酸乙酯、2-碘丙酸第三丁酯等鹵烷酸烷基酯、氯乙酸苯酯、溴乙酸苯酯、碘乙酸苯酯等鹵烷酸芳酯、4-氯甲基苯甲酸甲酯、4-溴甲基苯甲酸甲酯、4-氯甲基苯甲酸乙酯、4-溴甲基苯甲酸乙酯、3-氯甲基苯甲酸甲酯、3-溴甲基苯甲酸甲酯等鹵烷基苯甲酸烷基酯等。 Examples of the alkylating agent used in step (iib) include methyl chloroacetate, methyl bromoacetate, methyl iodoacetate, ethyl chloroacetate, ethyl bromoacetate, ethyl iodoacetate, and propyl chloroacetate. , N-butyl chloroacetate, third butyl chloroacetate, third butyl bromoacetate, third butyl iodoacetate, methyl 2-chloropropionate, methyl 2-bromopropionate, methyl 2-iodopropionate Esters, ethyl 2-chloropropionate, tertiary butyl 2-chloropropionate, tertiary butyl 2-bromopropionate, ethyl 2-bromopropionate, ethyl 2-iodopropionate, 3-chlorobutane Methyl ester, methyl 3-bromobutyrate, methyl 3-iodobutyrate, ethyl 3-chlorobutyrate, ethyl 3-chlorobutyrate, ethyl 3-iodobutyrate, 2-iodopropionate Alkyl alkanoates such as tributyl ester, aryl chloroacetates, phenyl bromoacetate, phenyl iodoacetate, 4-chloromethylbenzoate, 4-bromomethylbenzoate Esters, alkyl 4-halomethylbenzoates, ethyl 4-chloromethylbenzoate, ethyl 4-bromomethylbenzoate, methyl 3-chloromethylbenzoate, methyl 3-bromomethylbenzoate, etc. Wait.

<1.8.4.3通式(1c)之三茀二芳酯之製造方法(三茀二酯化合物(1)之合成後,利用酯交換反應之三茀二芳酯化合物(1c)之製造法)> <1.8.4.3 Production method of triamyl diaryl ester of general formula (1c) (production method of trimamyl diaryl ester compound (1c) after esterification reaction of triammonium diester compound (1))>

三茀二芳酯化合物(1c)可藉由經過合成三茀二酯化合物(1)之步驟(步驟(iia)、或步驟(iib),與接下來與碳酸二芳酯類(11a)之酯交換反應(步驟(iic))之方法而進行製造。 The tris-diaryl ester compound (1c) can be prepared through the step of synthesizing the tris-diester compound (1) (step (iia) or step (iib), and the subsequent ester with the diaryl carbonate (11a) It is produced by a method of an exchange reaction (step (iic)).

式中,R1~R10係與式(1)中之R1~R10含義相同。Ar1表示可經取代之碳數4~10之芳基。 Wherein, R 1 ~ R 10 the same line with the formula R (1) 1 ~ R 10 in the meaning. Ar 1 represents an aryl group having 4 to 10 carbon atoms which may be substituted.

<1.8.4.3.1通式(1c)之三茀二芳酯之製造方法(利用酯交換反應之三茀二芳酯化合物(1c)之製造法)> <1.8.4.3.1 Method for producing trisaryldiaryl ester of general formula (1c) (manufacturing method of trisaryldiaryl ester compound (1c) using transesterification reaction)>

Ar1為可經取代之碳數4~10之芳基之三茀二芳酯化合物(1c)係於酯交換觸媒存在下,依據步驟(iic)所表示之反應,自三茀二酯化合物(1)及碳酸二芳酯類(11a)進行製造。 Ar 1 is a triaryl diaryl ester compound (1c) which can be substituted with an aryl group having 4 to 10 carbon atoms. In the presence of a transesterification catalyst, according to the reaction shown in step (iic), (1) and diaryl carbonates (11a).

<1.8.4.3.1.1碳酸二芳酯類> <1.8.4.3.1.1 Diaryl carbonates>

關於作為反應試劑之碳酸二芳酯類,可列舉:碳酸二苯酯、碳酸二甲苯酯、碳酸雙(氯苯基)酯、碳酸間甲苯酯、碳酸二萘酯、碳酸雙(聯苯)酯等。其中,較佳為廉價且可工業性獲取之碳酸二苯酯。該等碳酸二芳酯可單獨使用1種,亦可混合2種以上使用。 Examples of the diaryl carbonates used as a reaction reagent include diphenyl carbonate, xylyl carbonate, bis (chlorophenyl) carbonate, m-tolyl carbonate, dinaphthyl carbonate, and bis (biphenyl) carbonate. Wait. Among them, diphenyl carbonate, which is inexpensive and commercially available, is preferred. These diaryl carbonates may be used singly or in combination of two or more kinds.

關於碳酸二芳酯類之使用量,相對於作為原料之三茀二酯(1),上限並無特別限定,若使用量過多,則有反應後之精製負荷變大之傾向,因此通常為三茀二酯之20倍莫耳以下,較佳為10倍莫耳以下,進而較佳為5倍莫耳以下。 Regarding the amount of diaryl carbonate used, the upper limit is not particularly limited with respect to the trimer diester (1) as a raw material. If the amount used is too large, the refining load after the reaction tends to increase, so it is usually three. The perylene diester is 20 times or less, preferably 10 times or less, and more preferably 5 times or less.

另一方面,若鹼之使用量過少,則有如以下所示之三茀單芳酯(1e)作為原料之三茀二酯(1)或中間物殘留之情形,因此作為下限,通常相對於原料之三茀二酯(1)為1倍莫耳以上,較佳為1.5倍莫耳以上,進而較佳為2倍莫耳以上。 On the other hand, if the amount of the base used is too small, the following may be used as the tertiary diester (1) or intermediates of the raw material, as shown below. Therefore, as the lower limit, it is usually relative to the raw material. The tertiary diester (1) is 1 times mole or more, preferably 1.5 times mole or more, and further preferably 2 times mole or more.

式中,R1~R10係與式(1)中之R1~R10含義相同。Ar1表示可經取代之碳數4~10之芳基。 Wherein, R 1 ~ R 10 the same line with the formula R (1) 1 ~ R 10 in the meaning. Ar 1 represents an aryl group having 4 to 10 carbon atoms which may be substituted.

<1.8.4.3.1.2酯交換反應觸媒> <1.8.4.3.1.2 Transesterification reaction catalyst>

作為酯交換反應觸媒,可列舉:四丁氧基鈦、四異丁氧基鈦、四甲氧基鈦、四異丙氧基鈦、四乙氧基鈦、四(2-乙基己氧基)鈦、四(十八烷氧基)鈦、四苯氧基鈦、乙醯丙酮鈦(IV)、雙(乙醯丙酮)異丙氧基鈦(IV)等鈦化合物;碳酸鋰、二丁基胺基鋰、乙醯丙酮鋰、苯酚鈉、苯酚鉀等鹼金屬化合物;乙醯丙酮鎘、碳酸鎘等鎘化合物;乙醯丙酮鋯、二茂鋯等鋯化合物;硫化鉛、氫氧化鉛、鉛酸鹽、亞鉛酸鹽、碳酸鉛、乙酸鉛、四丁基鉛、四苯基鉛、三苯基鉛、二甲氧基鉛、二苯氧基鉛等鉛化合物;乙酸銅、雙乙醯丙酮銅、油酸銅、丁基銅、二甲氧基銅、氯化銅等銅化合物;氫氧化鐵、碳酸鐵、三乙醯氧基鐵、三甲氧基鐵、三苯氧基鐵等鐵化合物;雙乙醯丙酮鋅、二乙醯氧基鋅、二甲氧基鋅、二乙氧基鋅、二苯氧基鋅等鋅化合物;氧化二正丁基錫、氧化二苯基錫、氧化二正辛基錫、二正丁基二甲醇錫、二丙烯酸二正丁基錫、二甲基丙烯酸二正丁基錫、二月桂酸二正丁基錫、四甲氧基錫、四苯氧基錫、四丁基-1,3-二乙醯氧基二錫氧烷等有 機錫化合物;乙酸鋁、甲醇鋁、乙醇鋁、苯酚鋁等鋁化合物;二氯化釩、三氯化釩、四氯化釩、硫酸釩等釩化合物;四苯基苯酚鏻等鏻鹽等。該等可單獨使用1種,亦可併用2種以上。 Examples of the transesterification catalyst include tetrabutoxytitanium, tetraisobutoxytitanium, tetramethoxytitanium, tetraisopropoxytitanium, tetraethoxytitanium, and tetrakis (2-ethylhexyloxy). Titanium compounds such as titanium, tetrakis (octadecyloxy), titanium tetraphenoxy, titanium (IV) acetoacetone, titanium (IV) bis (ethylacetone) isopropoxy titanium; lithium carbonate, lithium Alkali metal compounds such as lithium butylamino, lithium acetoacetone, sodium phenoxide, potassium phenol; cadmium compounds such as cadmium acetoacetone, cadmium carbonate; zirconium compounds such as zirconium acetoacetone, zirconocene, etc. Lead compounds such as lead, lead, lead, carbonate, lead acetate, tetrabutyl lead, tetraphenyl lead, triphenyl lead, dimethoxy lead, diphenoxy lead, etc. Copper compounds such as copper acetone acetone, copper oleate, butyl copper, dimethoxy copper, and copper chloride; iron hydroxide, iron carbonate, triethoxy iron, trimethoxy iron, and triphenoxy iron Other iron compounds; zinc compounds such as zinc diacetamate acetone, zinc diethoxylate, dimethoxyzinc, diethoxyzinc, and diphenoxyzinc; di-n-butyltin oxide, diphenyltin oxide , Di-n-octyltin oxide, di-n-butyltin methoxide, di-n-butyltin diacrylate, di-n-butyltin dimethacrylate, di-n-butyltin dilaurate, tetramethoxytin, tetraphenoxytin, Butyl-1,3-diethoxylated stannoxanes, etc. Organic tin compounds; aluminum compounds such as aluminum acetate, aluminum methoxide, aluminum ethoxide, and aluminum phenoxide; vanadium compounds such as vanadium dichloride, vanadium trichloride, vanadium tetrachloride, and vanadium sulfate; phosphonium salts such as tetraphenylphenol rhenium, and the like. These may be used individually by 1 type, and may use 2 or more types together.

該等中,就工業上廉價且具有反應操作上之優勢之方面而言,較佳為使用鏻鹽、鋰化合物、鋯化合物、有機錫化合物、或鈦化合物等,其中尤佳為有機錫化合物或鈦化合物。 Among these, it is preferable to use a sulfonium salt, a lithium compound, a zirconium compound, an organic tin compound, or a titanium compound in terms of being industrially inexpensive and having an advantage in reaction operation. Among these, an organic tin compound or Titanium compounds.

關於酯交換反應觸媒之使用量,相對於作為原料之三茀二酯(1),上限並無特別限制,若使用量過多,則有反應後之精製負荷變大之傾向,因此通常為茀之20莫耳%以下,較佳為10莫耳%以下,進而較佳為5莫耳%以下。 Regarding the amount of the transesterification catalyst used, the upper limit is not particularly limited relative to the trimer diester (1) as a raw material. If the amount used is too large, the refining load after the reaction tends to increase, so it is usually 通常20 mol% or less, preferably 10 mol% or less, and further preferably 5 mol% or less.

另一方面,若酯交換反應觸媒之使用量過少,則有反應時間變得過長之情形,因此作為下限,通常相對於原料之三茀二酯為0.1莫耳%以上,較佳為0.5莫耳%以上,進而較佳為1莫耳%以上。 On the other hand, if the amount of the transesterification reaction catalyst is too small, the reaction time may become too long. Therefore, as the lower limit, it is usually 0.1 mol% or more relative to the trimer diester of the raw material, preferably 0.5. Molar% or more, and more preferably 1 Molar% or more.

<1.8.4.3.1.3溶劑> <1.8.4.3.1.3 Solvent>

步驟(iic)中,亦可使用反應溶劑,但較佳為不使用反應溶劑,僅以原料之三茀二酯(1)、碳酸二芳酯類、及酯交換反應觸媒進行反應。然而,於原料之三茀二酯(1)、碳酸二芳酯類於常溫下為固體而難以攪拌之情形時,亦可使用反應溶劑。於使用反應溶劑之情形時,只要為可使上述原料之三茀二酯(1)、碳酸二芳酯類、及酯交換反應觸媒適宜地溶解及/或分散之溶劑,則其種類任意。 In step (iic), a reaction solvent may also be used, but it is preferred that the reaction is performed without using the reaction solvent and using only the tertiary diester (1), the diaryl carbonate, and the transesterification reaction catalyst. However, the reaction solvent may be used in the case where the tertiary diester (1) and the diaryl carbonate of the raw material are solid at normal temperature and it is difficult to stir. In the case of using a reaction solvent, any kind can be used as long as it is a solvent which can dissolve and / or disperse the tertiary diesters (1), diaryl carbonates, and transesterification reaction catalysts of the above materials appropriately.

關於具體之可使用之溶劑,作為烷基腈系溶劑,可列舉乙腈、丙腈等,作為酮系溶劑,可列舉丙酮、甲基乙基酮、甲基異丁基酮等,作為醚系溶劑,可列舉二乙基醚、四氫呋喃、1,4-二烷、甲基環戊基醚、第三丁基甲基醚等,作為鹵素系溶劑,可列舉1,2-二氯乙烷、二氯甲烷、氯仿、1,1,2,2-四氯乙烷等,作為鹵素系芳香族烴,可列舉氯苯、1,2-二氯苯等,作為醯胺系溶劑,可列舉N,N-二甲基甲 醯胺、N,N,-二甲基乙醯胺等,作為亞碸系溶劑,可列舉二甲基亞碸、環丁碸等,作為環狀式脂肪族烴,可列舉:環戊烷、環己烷、環庚烷、環辛烷等單環狀式脂肪族烴;作為其衍生物之甲基環戊烷、乙基環戊烷、甲基環己烷、乙基環己烷、1,2-二甲基環己烷、1,3-二甲基環己烷、1,4-二甲基環己烷、異丙基環己烷、正丙基環己烷、第三丁基環己烷、正丁基環己烷、異丁基環己烷、1,2,4-三甲基環己烷、1,3,5-三甲基環己烷等;十氫萘等多環狀式脂肪族烴;正戊烷、正己烷、正庚烷、正辛烷、異辛烷、正壬烷、正癸烷、正十二烷、正十四烷等非環狀式脂肪族烴,作為芳香族烴,可列舉甲苯、對二甲苯、鄰二甲苯、間二甲苯、1,3,5-三甲基苯、1,2,4-三甲基苯、1,2,3,4-四氫化萘等,作為芳香族雜環,可列舉吡啶等。 Specific solvents that can be used include acetonitrile and propionitrile as the alkyl nitrile solvent, and acetone, methyl ethyl ketone, and methyl isobutyl ketone as the ketone solvent, and ether solvents as the ketone solvent. , Including diethyl ether, tetrahydrofuran, 1,4-di Alkane, methylcyclopentyl ether, third butyl methyl ether, and the like. Examples of the halogen-based solvent include 1,2-dichloroethane, dichloromethane, chloroform, and 1,1,2,2-tetrachloroethane. Examples of the halogen-based aromatic hydrocarbon include chlorobenzene and 1,2-dichlorobenzene. Examples of the fluorene-based solvent include N, N-dimethylformamide and N, N, -dimethyl. Acetylamine and the like include fluorene-based solvents such as dimethyl fluorene and cyclobutane. Examples of the cyclic aliphatic hydrocarbon include cyclopentane, cyclohexane, cycloheptane, and cyclooctane. And other monocyclic aliphatic hydrocarbons; its derivatives are methylcyclopentane, ethylcyclopentane, methylcyclohexane, ethylcyclohexane, 1,2-dimethylcyclohexane, 1 , 3-dimethylcyclohexane, 1,4-dimethylcyclohexane, isopropylcyclohexane, n-propylcyclohexane, third butylcyclohexane, n-butylcyclohexane, Isobutylcyclohexane, 1,2,4-trimethylcyclohexane, 1,3,5-trimethylcyclohexane, etc .; polycyclic aliphatic hydrocarbons such as decahydronaphthalene; n-pentane, Non-cyclic aliphatics such as n-hexane, n-heptane, n-octane, isooctane, n-nonane, n-decane, n-dodecane, n-tetradecane Hydrocarbons, examples of aromatic hydrocarbons include toluene, para-xylene, o-xylene, m-xylene, 1,3,5-trimethylbenzene, 1,2,4-trimethylbenzene, 1,2,3 , 4-tetrahydronaphthalene, etc. Examples of the aromatic heterocyclic ring include pyridine.

本反應較佳為於通常100℃以上之高溫下進行,因此上述溶劑中,較佳為沸點為100℃以上之溶劑,即氯苯、1,2-二氯苯、三氯苯、甲苯、對二甲苯、鄰二甲苯、間二甲苯、1,3,5-三甲基苯、1,2,4-三甲基苯、1,2,3,4-四氫化萘、十氫化萘、N,N-二甲基甲醯胺、N,N-二甲基乙醯胺、二甲基亞碸、或環丁碸,就可使原料之三茀二酯(1)較佳地溶解,且沸點為130℃以上而可於更高溫下進行反應之方面而言,尤佳為1,2-二氯苯、二甲苯、1,3,5-三甲基苯、1,2,4-三甲基苯、或1,2,3,4-四氫化萘、十氫化萘。 This reaction is preferably carried out at a high temperature of generally 100 ° C or higher. Therefore, among the above solvents, solvents having a boiling point of 100 ° C or higher, that is, chlorobenzene, 1,2-dichlorobenzene, trichlorobenzene, toluene, p- Xylene, o-xylene, m-xylene, 1,3,5-trimethylbenzene, 1,2,4-trimethylbenzene, tetralin, decalin, N , N-dimethylformamide, N, N-dimethylacetamide, dimethylmethylene, or cyclobutane, the trimethyl diester (1) of the raw material can be better dissolved, and From the viewpoint that the boiling point is 130 ° C or higher and the reaction can be performed at a higher temperature, 1,2-dichlorobenzene, xylene, 1,3,5-trimethylbenzene, 1,2,4-trimethylbenzene are particularly preferred. Methylbenzene, or tetralin, decalin.

該等溶劑可單獨使用1種,亦可混合2種以上使用。 These solvents may be used alone or in combination of two or more.

關於溶劑之使用量,上限並無特別限制,若考慮每個反應器之目標物之產生效率,則通常使用如成為原料之三茀二酯(1)之15倍體積量、較佳為10倍體積量、進而較佳為5倍體積量之量。另一方面,若溶劑之使用量過少,則有試劑之溶解性變差而攪拌變困難,並且反應之進行變慢之傾向,因此作為下限,通常使用如成為原料之三茀二酯(1)之1倍體積量、較佳為2倍體積量、進而較佳為4倍體積量之量。 With regard to the amount of solvent used, the upper limit is not particularly limited. If the production efficiency of the target substance in each reactor is considered, 15 times the volume, preferably 10 times, of the tri-methylene diester (1), which is the raw material, is usually used. A volume amount, more preferably an amount of 5 times the volume amount. On the other hand, if the amount of the solvent used is too small, the solubility of the reagent becomes worse, the stirring becomes difficult, and the progress of the reaction tends to be slow. Therefore, as the lower limit, a trimer diester (1), which is a raw material, is usually used. The amount is 1 times the volume, preferably 2 times the volume, and more preferably 4 times the volume.

<1.8.4.3.1.4反應形式> <1.8.4.3.1.4 Reaction Form>

進行步驟(iic)時,反應之形式可採用分批式反應,亦可採用流通式反應,亦可採用組合該等而成者,其形式並無特別限制。 When the step (iic) is performed, the form of the reaction may be a batch reaction, a flow-through reaction, or a combination of these, and the form is not particularly limited.

<1.8.4.3.1.5反應條件> <1.8.4.3.1.5 Reaction conditions>

於步驟(iic)中,若溫度過低,則有無法獲得充分之反應速度之傾向,因此通常於下限為50℃、較佳為70℃、更佳為100℃下實施。另一方面,關於上限,係於通常250℃、較佳為200℃、更佳為180℃下實施。 In the step (iic), if the temperature is too low, a sufficient reaction rate may not be obtained. Therefore, the lower limit is usually 50 ° C, preferably 70 ° C, and more preferably 100 ° C. On the other hand, the upper limit is implemented at usually 250 ° C, preferably 200 ° C, and more preferably 180 ° C.

關於步驟(iic)中之通常之反應時間,通常下限為1小時、較佳為2小時、進而較佳為3小時,且上限並無特別限定,通常為30小時、較佳為20小時、進而較佳為10小時。 Regarding the usual reaction time in step (iic), the lower limit is usually 1 hour, preferably 2 hours, and further preferably 3 hours, and the upper limit is not particularly limited, but is usually 30 hours, preferably 20 hours, and further It is preferably 10 hours.

於步驟(iic)中,為了使平衡偏向生成物側,而亦可一面於減壓下將副產物蒸餾去除一面進行反應。關於設為減壓之情形之壓力,係於通常20kPa以下、較佳為10kPa以下、更佳為5kPa以下實施。另一方面,若減壓度過高,則有連用作試劑之碳酸二芳酯類亦昇華之可能性,因此於通常0.1kPa以上、較佳為0.5kPa以上、更佳為1.0kPa以上實施。 In step (iic), in order to shift the equilibrium to the product side, the reaction may be performed while distilling off by-products under reduced pressure. The pressure in the case of reduced pressure is usually 20 kPa or less, preferably 10 kPa or less, and more preferably 5 kPa or less. On the other hand, if the degree of reduced pressure is too high, even diaryl carbonates used as reagents may also sublime. Therefore, it is usually performed at 0.1 kPa or more, preferably 0.5 kPa or more, and more preferably 1.0 kPa or more.

<1.8.4.3.1.6目標物之分離‧精製> <1.8.4.3.1.6 Separation and purification of target>

反應結束後,作為目標物之三茀二芳酯(1c)可藉由向反應液添加不良溶劑,使上述作為目標物之三茀二芳酯(1c)析出而進行單離。 After the completion of the reaction, the tris (diaryl) ester (1c) as the target can be isolated by adding a poor solvent to the reaction solution to precipitate the tris (tri) diaryl (1c) as the target.

又,反應結束後,亦可將作為目標物之三茀二芳酯(1c)可溶之溶劑與水添加於反應液而進行萃取。藉由溶劑而萃取之目標物可藉由將溶劑進行濃縮之方法、或者添加不良溶劑之方法等而進行單離。 In addition, after the reaction is completed, a trisaryldiaryl ester (1c), which is a target substance, may be added to the reaction solution for extraction with a soluble solvent and water. The target substance extracted by the solvent can be isolated by a method of concentrating the solvent or a method of adding a poor solvent.

所獲得之三茀二芳酯(1c)亦可作為含有聚酯碳酸酯之聚碳酸酯原料、或聚酯原料而直接用於聚合。作為精製法,可採用通常之精製法,例如再結晶、或再沈澱、萃取精製、管柱層析法等,並無限制。 The obtained stilbene diaryl ester (1c) can also be directly used for polymerization as a polycarbonate raw material containing polyester carbonate or a polyester raw material. As the purification method, ordinary purification methods such as recrystallization, reprecipitation, extraction purification, and column chromatography can be used without limitation.

<2寡聚茀二酯組合物> <2 oligomeric fluorene diester composition>

本發明之寡聚茀二酯組合物包含上述之三茀二酯、與二茀二酯。藉由不僅包含三茀二酯亦包含二茀二酯,而有可簡單地將耐熱性或光學特性調整為所需者之傾向。 The oligomeric fluorene diester composition of the present invention comprises the above-mentioned trifluorene diester, and a difluorene diester. By including not only the tri-fluorene diester but also the di-fluorene diester, there is a tendency that the heat resistance or optical characteristics can be easily adjusted to a desired one.

<2.1二茀二酯> <2.1 Dimethyldiester>

本發明之寡聚茀二酯組合物所包含之二茀二酯包含可具有取代基之2個茀單元b,該茀單元b之9位之碳原子彼此直接鍵結、或者經由可具有取代基之伸烷基、可具有取代基之伸芳基、或可具有取代基之伸芳烷基而鏈狀地鍵結。 The difluorene diester contained in the oligomeric fluorene diester composition of the present invention includes two fluorene units b which may have a substituent, and the carbon atoms at the 9-position of the fluorene unit b are directly bonded to each other or may have a substituent The alkylene group, the alkylene group which may have a substituent, or the alkylene group which may have a substituent are chain-bonded.

作為茀單元b,可較佳地使用作為茀單元a所例示者。寡聚茀二酯組合物所包含之二茀二酯中之茀單元b可與所包含之三茀二酯中之茀單元a相同亦可不同。 As the fluorene unit b, those exemplified as the fluorene unit a can be preferably used. The fluorene unit b in the difluorene diester contained in the oligomeric fluorene diester composition may be the same as or different from the fluorene unit a in the trifluorene diester included.

作為鍵結茀單元b之伸烷基,可較佳地使用作為鍵結茀單元a之伸烷基所例示者。寡聚茀二酯組合物所包含之二茀二酯中之鍵結茀單元b之伸烷基可與所包含之三茀二酯中之鍵結茀單元a之伸烷基相同亦可不同。 As the alkylene group of the bonded fluorene unit b, those exemplified as the alkylene group of the bonded fluorene unit a can be preferably used. The alkylene group of the bond unit b in the diester of the oligomeric diester composition may be the same as or different from the alkylene group of the bond unit a of the tertiary diester.

同樣地,作為鍵結茀單元b之伸芳基,可較佳地使用作為鍵結茀單元a之伸芳基所例示者。寡聚茀二酯組合物所包含之二茀二酯中之鍵結茀單元b之伸芳基可與所包含之三茀二酯中之鍵結茀單元a之伸芳基相同亦可不同。 Similarly, as the arylene group of the bonded fluorene unit b, the exemplified as the arylene group of the bonded fluorene unit a can be preferably used. The arylene group of the bonded fluorene unit b in the dimer diester contained in the oligomeric fluorene diester composition may be the same as or different from the arylene group of the bonded fluorene unit a in the trimer diester included.

進而,作為鍵結茀單元b之伸芳烷基,可較佳地使用作為鍵結茀單元a之伸芳烷基所例示者。寡聚茀二酯組合物所包含之二茀二酯中之鍵結茀單元b之伸芳烷基可與所包含之三茀二酯中之鍵結茀單元a之伸芳烷基相同亦可不同。 Furthermore, as the aralkyl group of the bonded fluorene unit b, the exemplified as the aralkyl group of the bonded fluorene unit a can be preferably used. The aralkyl group of the bonded fluorene unit b in the difluorene diester contained in the oligomeric fluorene diester composition may be the same as the aralkyl group of the bonded fluorene unit a in the trimethyl diester included different.

本發明之寡聚茀二酯組合物所包含之二茀二酯可設為如下者:使取代基α3及α4分別鍵結於位置於兩末端之茀單元b之9位之碳原子, 且於該取代基α3及α4鍵結有酯基。於該情形時,α3及α4可相同亦可不同。又,取代基α3及α4亦可包含直接鍵,即酯基直接鍵結於茀單元a之9位之碳原子。作為取代基α3及α4,可較佳地使用作為取代基α1及α2所例示者。同樣地,作為酯基,可較佳地使用作為三茀二酯中之酯基所例示者。 The difluorene diester contained in the oligomeric fluorene diester composition of the present invention can be set as follows: the substituents α 3 and α 4 are respectively bonded to the carbon atom at the 9th position of the fluorene unit b at the two ends, An ester group is bonded to the substituents α 3 and α 4 . In this case, α 3 and α 4 may be the same or different. In addition, the substituents α 3 and α 4 may include a direct bond, that is, an ester group is directly bonded to the carbon atom at the 9-position of the fluorene unit a. As the substituents α 3 and α 4 , those exemplified as the substituents α 1 and α 2 can be preferably used. Similarly, as the ester group, those exemplified as the ester group in the trimethyl diester can be preferably used.

<2.2二茀二酯之具體結構> <2.2 Specific Structure of Dimethyldiester>

作為本發明之寡聚茀二酯組合物所包含之二茀二酯,具體而言,可較佳地使用下述通式(2)所表示者。 As the difluorene diester contained in the oligomeric fluorene diester composition of the present invention, specifically, those represented by the following general formula (2) can be preferably used.

式中,R1及R2分別獨立為直接鍵、或可具有取代基之碳數1~4之伸烷基。 In the formula, R 1 and R 2 are each independently a direct bond or an alkylene group having 1 to 4 carbon atoms which may have a substituent.

R3分別獨立為可經取代之碳數1~10之伸烷基、可經取代之碳數4~10之伸芳基、或可經取代之碳數6~10之伸芳烷基,R4~R9分別獨立為氫原子、可經取代之碳數1~10之烷基、可經取代之碳數4~10之芳基、可經取代之碳數1~10之醯基、可經取代之碳數1~10之醯氧基、可經取代之碳數1~10之烷氧基、可經取代之碳數1~10之芳氧基、可經取代之胺基、具有取代基之硫原子、鹵素原子、硝基或氰基。其中,R4~R9中鄰接之至少2個基亦可相互鍵結而形成環。 R 3 is independently an alkylene group having 1 to 10 carbon atoms that can be substituted, an alkylene group having 4 to 10 carbon atoms that can be substituted, or an alkylene group having 6 to 10 carbon atoms that can be substituted, R 4 to R 9 are each independently a hydrogen atom, an alkyl group having 1 to 10 carbon atoms that can be substituted, an aryl group having 4 to 10 carbon atoms that can be substituted, a fluorenyl group having 1 to 10 carbon atoms that can be substituted, and Substituted fluorenyloxy group having 1 to 10 carbon atoms, alkoxyl group having 1 to 10 carbon atoms that can be substituted, aryloxy group having 1 to 10 carbon atoms that can be substituted, amine group that can be substituted, substituted A sulfur atom, a halogen atom, a nitro group, or a cyano group. Among them, at least two adjacent groups in R 4 to R 9 may be bonded to each other to form a ring.

R10為碳數1~10之有機取代基。 R 10 is an organic substituent having 1 to 10 carbon atoms.

再者,式(2)中各有2個之R4~R9各自可相同亦可不同。同樣地, 式(2)中有2個之R10各自可相同亦可不同。 In addition, R 4 to R 9 each having two in formula (2) may be the same or different. Similarly, two R 10 in formula (2) may be the same or different.

作為上述式(2)中之R1~R10,可較佳地使用作為上述式(1)中之R1~R10所例示者。 As R 1 to R 10 in the above formula (2), those exemplified as R 1 to R 10 in the above formula (1) can be preferably used.

<2.3二茀二酯之具體例> <2.3 Specific examples of difluorene diesters>

作為本發明之寡聚茀二酯組合物所包含之二茀二酯之具體例,可列舉:如下述[I]群所示之結構。 Specific examples of the difluorene diester contained in the oligomeric fluorene diester composition of the present invention include a structure shown in the following [I] group.

[化57] [Chemical 57]

<2.4二茀二酯之物性> <2.4 Physical properties of dioxin diester>

本發明之寡聚茀二酯組合物所包含之二茀二酯之物性值並無特別限定,但較佳為滿足以下所例示之物性值者。 The physical property value of the difluorene diester contained in the oligomeric fluorene diester composition of the present invention is not particularly limited, but it is preferably one that satisfies the physical property values exemplified below.

本發明之二茀二酯於氮氣環境下所測得之分解溫度較佳為250℃以上,更佳為270℃以上,進而較佳為290℃以上,且通常為300℃以下。本發明之二茀二酯由於茀環之積層結構而結構剛直,因此有分解 溫度滿足上述範圍之傾向。藉由如上述般分解溫度滿足上述範圍,而有可提高由二茀二酯獲得之聚酯、聚碳酸酯之熱穩定性之傾向。分解溫度例如可藉由TG-DTA而進行測定。 The decomposition temperature of the diester of the present invention measured under a nitrogen environment is preferably 250 ° C or higher, more preferably 270 ° C or higher, even more preferably 290 ° C or higher, and usually 300 ° C or lower. The difluorene diester of the present invention has a rigid structure due to the laminated structure of the fluorene ring, and therefore has decomposition. The temperature tends to satisfy the above range. When the decomposition temperature satisfies the above range as described above, the thermal stability of polyesters and polycarbonates obtained from diesters tends to be improved. The decomposition temperature can be measured by, for example, TG-DTA.

進而,本發明之二茀二酯之熔點(m.p.)較佳為100℃以上,更佳為120℃以上,進而較佳為140℃以上,且通常為150℃以下。本發明之二茀二酯由於茀環之積層結構而結構剛直,因此有熔點滿足上述範圍之傾向。藉由如上述般熔點滿足上述範圍,而有可提高由二茀二酯獲得之聚酯、聚碳酸酯之熱穩定性之傾向。熔點例如可藉由TG-DTA而進行測定。 Furthermore, the melting point (m.p.) of the diester of the present invention is preferably 100 ° C or higher, more preferably 120 ° C or higher, even more preferably 140 ° C or higher, and usually 150 ° C or lower. The difluorene diester of the present invention has a rigid structure due to the laminated structure of the fluorene ring, and therefore the melting point tends to satisfy the above range. When the melting point satisfies the above range as described above, the thermal stability of polyesters and polycarbonates obtained from diesters tends to be improved. The melting point can be measured by, for example, TG-DTA.

<2.5寡聚茀二酯組合物之組成> <2.5 Composition of oligomeric fluorene diester composition>

關於本發明之寡聚茀二酯組合物所包含之三茀二酯之含有比例,並無特別限定,就連同提高耐熱性,進而以更少量之使用獲得所需之光學特性之觀點而言,相對於組合物之總質量,較佳為0.1質量%以上,更佳為0.5質量%以上,進而較佳為1質量%以上,進而更佳為3質量%以上,尤佳為5質量%以上,又通常為30質量%以下。 Regarding the content ratio of the tertiary diester contained in the oligomeric fluorene diester composition of the present invention, there is no particular limitation. From the viewpoint of improving heat resistance and obtaining the required optical characteristics in a smaller amount, With respect to the total mass of the composition, it is preferably 0.1% by mass or more, more preferably 0.5% by mass or more, still more preferably 1% by mass or more, still more preferably 3% by mass or more, and even more preferably 5% by mass or more. It is usually 30% by mass or less.

另一方面,關於寡聚茀二酯組合物所包含之二茀二酯之含有比例,並無特別限定,就柔軟性與光學特性之調整之觀點而言,相對於組合物之總質量,較佳為0.1質量%以上,更佳為0.3質量%以上,進而較佳為1質量%以上,進而更佳為3質量%以上,尤佳為5質量%以上,又,就提高耐熱性之觀點而言,較佳為50質量%以下,更佳為40質量%以下,進而較佳為30質量%以下。 On the other hand, there is no particular limitation on the content ratio of the dimer diester contained in the oligomeric dimer diester composition. From the viewpoint of adjusting the flexibility and optical characteristics, it is more than the total mass of the composition. It is preferably 0.1% by mass or more, more preferably 0.3% by mass or more, still more preferably 1% by mass or more, still more preferably 3% by mass or more, even more preferably 5% by mass or more, and from the viewpoint of improving heat resistance. In other words, it is preferably 50% by mass or less, more preferably 40% by mass or less, and still more preferably 30% by mass or less.

又,關於寡聚茀二酯組合物所包含之二茀二酯及三茀二酯之含有比例,並無特別限定,就柔軟性與光學特性之調整之觀點而言,組合物中所包含之二茀二酯與三茀二酯之莫耳比(二茀二酯之莫耳數/三茀二酯之莫耳數)較佳為0.001以上,更佳為0.003以上,進而較佳為0.01以上,進而更佳為0.03以上,尤佳為0.05以上,又,就提高耐熱 性之觀點而言,較佳為0.5以下,更佳為0.4以下,進而較佳為0.3以下。 The content ratios of the di- and di-diesters contained in the oligomeric fluorene diester composition are not particularly limited. From the viewpoint of adjusting the flexibility and optical characteristics, the content contained in the composition is not limited. The molar ratio of the diesters to diesters (the die number of diesters / the die number of diesters) is preferably 0.001 or more, more preferably 0.003 or more, and still more preferably 0.01 or more , And more preferably 0.03 or more, particularly preferably 0.05 or more, and it also improves heat resistance From the standpoint of sex, it is preferably 0.5 or less, more preferably 0.4 or less, and even more preferably 0.3 or less.

寡聚茀二酯組合物中所包含之二茀二酯、或三茀二酯之莫耳數例如可自HPLC(high performance liquid chromatography,高效液相層析法)分析之面積%,使用校正曲線而進行估算。 The molar number of the di- or di-tri-ester contained in the oligomeric di-diester composition is, for example, an area% that can be analyzed by HPLC (high performance liquid chromatography), and a calibration curve is used. And make estimates.

<3樹脂組合物> <3 resin composition>

本發明之樹脂組合物係含有具有2價之三茀作為重複單元之聚合物者。 The resin composition of the present invention is a polymer containing a trivalent difluoride as a repeating unit.

如上所述,本發明之樹脂組合物除含有具有2價之三茀作為重複單元之聚合物外,亦可含有下述之其他聚合物,又亦可含有添加劑等。又,本發明之樹脂組合物亦可為由具有2價之三茀作為重複單元之聚合物所成者。 As described above, the resin composition of the present invention may contain, in addition to a polymer having divalent trifluorene as a repeating unit, other polymers described below, and may also contain additives. In addition, the resin composition of the present invention may be made of a polymer having divalent trifluorene as a repeating unit.

<3.1 2價之三茀> <3.1 Three Price of Two Price>

本發明之樹脂組合物所包含之聚合物具有2價之三茀作為重複單元。如上所述,藉由具有2價之三茀作為重複單元,而有如下傾向,即可以該三茀之少量使用而獲得所需之光學特性,又可顯現良好之耐熱性。 The polymer contained in the resin composition of the present invention has divalent trifluorene as a repeating unit. As described above, by having a trivalent trifluorene as a repeating unit, there is a tendency that a small amount of the trifluorene can be used to obtain the required optical characteristics, and good heat resistance can be developed.

再者,本發明之樹脂組合物所包含之聚合物亦可如下述般進而具有2價之二茀作為重複單元。有將三茀與二茀兩者總稱為寡聚茀之情形。 The polymer contained in the resin composition of the present invention may further have a divalent difluorene as a repeating unit as described below. There are cases in which both tritium and dipyridine are collectively referred to as oligomeric tritium.

2價之三茀係包含可具有取代基之3個茀單元a,且該茀單元a之9位之碳原子彼此直接鍵結而成者,或者該茀單元a之9位之碳原子彼此經由可具有取代基之伸烷基、可具有取代基之伸芳基、或可具有取代基之伸芳烷基而鏈狀地鍵結而成者。 The divalent trifluorene is a product of three fluorene units a which may have a substituent, and the carbon atoms at the 9th position of the fluorene unit a are directly bonded to each other, or the carbon atoms at the 9th position of the fluorene unit a pass through each other The alkylene group which may have a substituent, the alkylene group which may have a substituent, or the alkylene group which may have a substituent are chain-bonded.

作為茀單元a,可較佳地使用作為三茀二酯之茀單元a所例示者。 As the fluorene unit a, those exemplified as the fluorene unit a as a trifluorene diester can be preferably used.

同樣地,作為鍵結茀單元a之伸烷基,可較佳地使用作為三茀二 酯之鍵結茀單元a之伸烷基所例示者。又,作為鍵結茀單元a之伸芳基,可較佳地使用作為三茀二酯之鍵結茀單元a之伸芳基所例示者。進而,作為鍵結茀單元a之伸芳烷基,可較佳地使用作為三茀二酯之鍵結茀單元a之伸芳烷基所例示者。 Similarly, as the alkylene group of the bonded fluorene unit a, it can be preferably used as The ester bond is exemplified by the alkylene group of the fluorene unit a. In addition, as the arylene group of the bonded fluorene unit a, the exemplified as the arylene group of the bonded fluorene unit a of the trifluorene diester can be preferably used. Furthermore, as the aralkyl group of the bonded fluorene unit a, the aralkyl group exemplified as the bonded fluorene unit a of the trifluorene diester can be preferably used.

關於上述2價之三茀,亦可使取代基α1及α2分別鍵結於3個茀單元a中位置於兩末端之茀單元a之9位之碳原子,且將該取代基α1及α2設為2價之基。於該情形時,α1與α2可相同亦可不同。又,取代基α1及α2亦可包含直接鍵,即將茀單元a之9位之碳原子設為2價之基。作為取代基α1及α2,可較佳地使用作為三茀二酯中之取代基α1及α2所例示者。 Regarding the above-mentioned divalent trisene, the substituents α 1 and α 2 may be respectively bonded to the carbon atoms at the 9th position of the tertiary unit a in the three tertiary units a, and the substituent α 1 And α 2 is a divalent basis. In this case, α 1 and α 2 may be the same or different. The substituents α 1 and α 2 may include a direct bond, that is, a carbon atom at the 9-position of the fluorene unit a may be a divalent group. As the substituents α 1 and α 2 , those exemplified as the substituents α 1 and α 2 in the trimethyl diester can be preferably used.

尤其是於將位置於兩末端之茀單元a之9位之碳原子設為2價之基的情形時,或者將分別鍵結於位置於兩末端之茀單元a之9位之碳原子的取代基α1及α2設為2價之基,且將α1與α2中之至少1個之碳數設為2個以上之情形時,茀環(茀單元a)大致垂直配向於主鏈,因此有如下傾向:即便樹脂組合物中之2價之寡聚茀之比例為少量,亦變得容易顯現反波長色散性。於後者之情形時,就相同之觀點而言,較佳為將α1及α2兩者設為碳數2以上者。另一方面,於將分別鍵結於兩末端之茀單元a之9位之碳原子之α1及α2設為2價之基,且將α1及α2兩者設為碳數1者(即,可經取代之亞甲基)之情形時,茀環(茀單元a)並非大致垂直配向於主鏈而是以較大傾斜進行配向,因此有如下傾向:即便使樹脂組合物中之2價之寡聚茀之比例於較廣範圍內進行變化,亦容易成為於寬頻帶相位差之差較小之平面色散性。 Especially when the carbon atom at the 9th position of the fluorene unit a at both ends is a divalent radical, or when the carbon atom at the 9th position of the fluorene unit a at both ends is substituted, respectively When the radicals α 1 and α 2 are bivalent radicals, and when the number of carbons of at least one of α 1 and α 2 is 2 or more, the fluorene ring (fluorene unit a) is aligned substantially perpendicular to the main chain. Therefore, even if the ratio of the divalent oligomeric fluorene in the resin composition is small, it tends to exhibit reverse wavelength dispersion. In the latter case, from the same viewpoint, it is preferable that both α 1 and α 2 have a carbon number of 2 or more. On the other hand, when α 1 and α 2 of the carbon atoms at the 9-position of the fluorene unit a, which are respectively bonded to both ends, are set to a divalent base, and both α 1 and α 2 are set to a carbon number of 1 (I.e., a methylene group that may be substituted), the fluorene ring (fluorene unit a) is not aligned substantially vertically to the main chain but is aligned with a large inclination. Therefore, even if the The ratio of the divalent oligomeric fluorene changes over a wide range, and it is easy to become a plane dispersion with a small difference in wideband phase difference.

如上所述,本發明之樹脂組合物含有具有以特定之碳-碳鍵將3個茀單元a之9位之碳原子彼此連結而成之重複單元的聚合物,藉此可更有效地獲得源自茀環之光學特性。 As described above, the resin composition of the present invention contains a polymer having a repeating unit in which a carbon atom at the 9-position of three fluorene units a is connected to each other by a specific carbon-carbon bond, whereby the source can be obtained more efficiently. Optical characteristics of self-loop.

作為上述2價之三茀,具體而言,可較佳地使用下述通式(11)所 表示者。 As the trivalent divalent compound, specifically, the following general formula (11) can be preferably used: Presenter.

式中,R1及R2分別獨立為直接鍵、或可具有取代基之碳數1~4之伸烷基,R3a及R3b分別獨立為可經取代之碳數1~10之伸烷基、可經取代之碳數4~10之伸芳基、或可經取代之碳數6~10之伸芳烷基,R4~R9分別獨立為氫原子、可經取代之碳數1~10之烷基、可經取代之碳數4~10之芳基、可經取代之碳數1~10之醯基、可經取代之碳數1~10之醯氧基、可經取代之碳數1~10之烷氧基、可經取代之碳數1~10之芳氧基、可經取代之胺基、具有取代基之硫原子、鹵素原子、硝基或氰基。其中,R4~R9中鄰接之至少2個基亦可相互鍵結而形成環。 In the formula, R 1 and R 2 are each independently a direct bond or an alkylene group having 1 to 4 carbon atoms which may have a substituent, and R 3a and R 3b are each independently an alkylene group having 1 to 10 carbon atoms which may be substituted. R 4 to R 9 are each independently a hydrogen atom, and a substituted carbon number 1 is a aryl group having 4 to 10 carbon atoms which may be substituted, or an aralkyl group having 6 to 10 carbon atoms which may be substituted. ~ 10 alkyl groups, aryl groups with 4 to 10 carbon atoms that can be substituted, fluorenyl groups with 1 to 10 carbon atoms that can be substituted, fluorenyloxy groups with 1 to 10 carbon atoms that can be substituted, and An alkoxy group having 1 to 10 carbon atoms, an aryloxy group having 1 to 10 carbon atoms that can be substituted, an amine group that can be substituted, a sulfur atom having a substituent, a halogen atom, a nitro group, or a cyano group. Among them, at least two adjacent groups in R 4 to R 9 may be bonded to each other to form a ring.

再者,式(11)中之R3a及R3b各自可相同亦可不同。又,式(11)中各有3個之R4~R9各自可相同亦可不同。 In addition, R 3a and R 3b in formula (11) may be the same or different. In addition, each of R 4 to R 9 in Formula (11) may be the same or different.

作為上述式(11)中之R1~R9,可較佳地使用作為上述式(1)中之R1~R9所例示者。 As R 1 to R 9 in the above formula (11), those exemplified as R 1 to R 9 in the above formula (1) can be preferably used.

<3.2 2價之二茀> <3.2 2nd Price 2nd 茀>

本發明之樹脂組合物中之聚合物亦可進而具有2價之二茀作為重複單元。藉由除含有2價之三茀外亦含有2價之二茀,而有可簡單地將耐熱性或光學特性調整為所需者之傾向。 The polymer in the resin composition of the present invention may further have divalent difluorene as a repeating unit. Since the divalent trifluoride is contained in addition to the divalent trifluoride, there is a tendency that the heat resistance or optical characteristics can be easily adjusted to a desired one.

2價之二茀係包含可具有取代基之2個茀單元b,且該茀單元b之9 位之碳原子彼此直接鍵結而成者,或者該茀單元b之9位之碳原子彼此經由可具有取代基之伸烷基、可具有取代基之伸芳基、或可具有取代基之伸芳烷基而鏈狀地鍵結而成者。 The bivalent difluorene system includes two fluorene units b which may have a substituent, and the fluorene unit b-9 The carbon atoms at the y position are directly bonded to each other, or the carbon atoms at the 9 position of the fluorene unit b are mutually via an alkylene group which may have a substituent, an alkylene group which may have a substituent, or an alkylene group which may have a substituent An aralkyl group is bonded in a chain.

作為茀單元b,可較佳地使用作為二茀二酯之茀單元b所例示者。 As the fluorene unit b, those exemplified as the fluorene unit b as a difluorene diester can be preferably used.

同樣地,作為鍵結茀單元b之伸烷基,可較佳地使用作為二茀二酯之鍵結茀單元b之伸烷基所例示者。又,作為鍵結茀單元b之伸芳基,可較佳地使用作為二茀二酯之鍵結茀單元b之伸芳基所例示者。進而,作為鍵結茀單元b之伸芳烷基,可較佳地使用作為二茀二酯之鍵結茀單元b之伸芳烷基所例示者。 Similarly, as the alkylene group of the bonded fluorene unit b, those exemplified as the alkylene group of the bonded fluorene unit b of a difluorene diester can be preferably used. In addition, as the arylene group of the bonded fluorene unit b, the exemplified as the aryl group of the bonded fluorene unit b of a difluorene diester can be preferably used. Further, as the aralkyl group of the bonded fluorene unit b, an aralkyl group exemplified as the bonded fluorene unit b of a difluorene diester can be preferably used.

關於上述2價之二茀,亦可使取代基α3及α4分別鍵結於位置兩末端之茀單元b之9位之碳原子,且將該取代基α3及α4設為2價之基。於該情形時,α3與α4可相同亦可不同。又,取代基α3及α4亦可包含直接鍵,即將茀單元b之9位之碳原子設為2價之基。作為取代基α3及α4,可較佳地使用作為二茀二酯中之取代基α3及α4所例示者。 Regarding the above-mentioned divalent difluorene, the substituents α 3 and α 4 may be respectively bonded to the carbon atom at the 9th position of the fluorene unit b at both ends of the position, and the substituents α 3 and α 4 may be made divalent. The base. In this case, α 3 and α 4 may be the same or different. In addition, the substituents α 3 and α 4 may include a direct bond, that is, a carbon atom at the 9-position of the fluorene unit b may be a divalent group. As the substituents α 3 and α 4 , those exemplified as the substituents α 3 and α 4 in the diester diester can be preferably used.

尤其是於將位置於兩末端之茀單元b之9位之碳原子設為2價之基的情形時、或者將分別鍵結於位置於兩末端之茀單元b之9位之碳原子的取代基α3及α4設為2價之基,且將α3與α4中之至少1個之碳數設為2以上之情形時,茀環(茀單元b)大致垂直配向於主鏈,因此有如下傾向:即便樹脂組合物中之2價之寡聚茀之比例為少量,亦變得容易顯現反波長色散性。於後者之情形時,就相同之觀點而言,較佳為將α3及α4兩者設為碳數2以上者。另一方面,於將分別鍵結於兩末端之茀單元b之9位之碳原子的α3及α4設為2價之基,且將α3及α4兩者設為碳數1者(即,可經取代之亞甲基)之情形時,茀環(茀單元b)並非大致垂直配向於主鏈而是以較大傾斜進行配向,因此有如下傾向:即便使樹脂組合物中之2價之寡聚茀之比例於較廣範圍內進行變化,亦容易成為 於寬頻帶相位差之差較小之平面色散性。 Especially when the carbon atom at the 9th position of the fluorene unit b at both ends is a divalent base, or when the carbon atom at the 9th position of the fluorene unit b at both ends is substituted When the bases α 3 and α 4 are bivalent bases, and the carbon number of at least one of α 3 and α 4 is 2 or more, the fluorene ring (fluorene unit b) is aligned substantially vertically to the main chain. Therefore, even if the ratio of the divalent oligomeric fluorene in the resin composition is small, it tends to easily exhibit reverse wavelength dispersion. In the latter case, from the same viewpoint, it is preferable to set both α 3 and α 4 to a carbon number of 2 or more. On the other hand, when α 3 and α 4 of the carbon atoms at the 9th position of the fluorene unit b bonded to the both ends are respectively set to a divalent base, and both α 3 and α 4 are set to a carbon number of 1 (I.e., a methylene group that may be substituted), the fluorene ring (fluorene unit b) is not aligned substantially vertically to the main chain but is aligned with a large inclination. Therefore, even if the The ratio of the divalent oligomeric fluorene changes over a wide range, and it is easy to become a plane dispersion with a small difference in wideband phase difference.

作為上述2價之二茀,具體而言,可較佳地使用下述通式(21)所表示者。 As the above-mentioned divalent difluorene, specifically, those represented by the following general formula (21) can be preferably used.

式中,R1及R2分別獨立為直接鍵、或可具有取代基之碳數1~4之伸烷基,R3分別獨立為可經取代之碳數1~10之伸烷基、可經取代之碳數4~10之伸芳基、或可經取代之碳數6~10之伸芳烷基,R4~R9分別獨立為氫原子、可經取代之碳數1~10之烷基、可經取代之碳數4~10之芳基、可經取代之碳數1~10之醯基、可經取代之碳數1~10之醯氧基、可經取代之碳數1~10之烷氧基、可經取代之碳數1~10之芳氧基、可經取代之胺基、具有取代基之硫原子、鹵素原子、硝基或氰基。其中,R4~R9中鄰接之至少2個基亦可相互鍵結而形成環。 In the formula, R 1 and R 2 are each independently a direct bond or an alkylene group having 1 to 4 carbon atoms which may have a substituent, and R 3 is independently an alkylene group having 1 to 10 carbon atoms which may be substituted. Substituted arylene groups with 4 to 10 carbon atoms, or substituted aralkyl groups with 6 to 10 carbon atoms, R 4 to R 9 are each independently a hydrogen atom, and 1 to 10 carbon atoms can be substituted. Alkyl, aryl with 4 to 10 carbons that can be substituted, fluorenyl with 1 to 10 carbons that can be substituted, fluorenyl with 1 to 10 carbons that can be substituted, 1 with carbons that can be substituted An alkoxy group of ~ 10, an aryloxy group having 1 to 10 carbon atoms that may be substituted, an amine group that may be substituted, a sulfur atom having a substituent, a halogen atom, a nitro group, or a cyano group. Among them, at least two adjacent groups in R 4 to R 9 may be bonded to each other to form a ring.

作為上述式(21)中之R1~R9,可較佳地使用作為上述式(2)中之R1~R9所例示者。 As R 1 to R 9 in the above formula (21), those exemplified as R 1 to R 9 in the above formula (2) can be preferably used.

再者,式(21)中各有2個之R4~R9各自可相同亦可不同。 Furthermore, R 4 to R 9 each having two in formula (21) may be the same or different.

<3.3聚合物> <3.3 polymer>

本發明之樹脂組合物所含有之聚合物係具有2價之三茀作為重複單元者。例如可列舉:2價之三茀彼此由任意之連結基而連結而成之聚合物。又,該聚合物亦可為具有2價之二茀、或該等以外之任意之重複單元之共聚物。 The polymer contained in the resin composition of the present invention has a trivalent difluoride as a repeating unit. For example, a polymer in which trivalent trivalent divalents are connected to each other by an arbitrary linking group can be mentioned. The polymer may be a copolymer having divalent difluorene or any repeating unit other than these.

<3.4連結基> <3.4 link base>

上述聚合物中可使用之連結基之具體結構係於以下進行列舉,並不限定於該等,可列舉:下述[J]群所示之連結基 The specific structure of the linking group that can be used in the above polymer is listed below, and is not limited thereto. Examples include the linking groups shown in the following [J] group.

(於上述[J]群所示之各連結基中,Z表示重複單元所連結之部位,Y表示與其他連結基之連結部位、或使連結基彼此結合之任意之結構單元所連結之部位),亦可併用該等連結基中之複數種。又,於連結基為非對稱之情形時,連結基亦可以任意之朝向連結於重複單元。該等中,較佳為構成耐熱性與熔融加工性或機械強度之平衡性優異之聚酯、聚碳酸酯、聚酯碳酸酯之下述[K]群所示之連結基。 (In each linking group shown in the above-mentioned [J] group, Z represents a portion connected by a repeating unit, and Y represents a linking portion with another linking group, or a portion connected by any structural unit that links the linking groups to each other) It is also possible to use a plurality of these linking bases in combination. When the linking group is asymmetric, the linking group may be linked to the repeating unit in any orientation. Among these, preferred are the linking groups represented by the following [K] group of polyesters, polycarbonates, and polyester carbonates that have excellent balance between heat resistance and melt processability or mechanical strength.

於上述[K]群所示之各連結基中,Z表示重複單元所連結之部位。 In each linking group shown in the above-mentioned [K] group, Z represents a portion to which a repeating unit is linked.

連結基可單獨使用1種,亦可併用複數種連結基。 The linking group may be used singly or in combination.

作為以連結基連結重複單元而成之聚合物,具體而言,可列 舉:聚烯烴、聚酯、聚碳酸酯、聚醯胺、聚醯亞胺、聚胺基甲酸酯、環氧樹脂、聚丙烯酸酯、聚甲基丙烯酸酯、或包含聚碸之聚合物及併用該等之聚合物,較佳為包含通常透明性較高之聚烯烴、聚酯、聚碳酸酯、環氧樹脂、或聚丙烯酸酯之聚合物,尤佳為包含耐熱性與熔融加工性或機械強度之平衡性優異之聚酯、或聚碳酸酯之聚合物,尤佳為包含通常耐熱性或耐化學品性優異之聚碳酸酯之聚合物。 As a polymer in which repeating units are connected by a linking group, specifically, Examples: Polyolefins, polyesters, polycarbonates, polyamides, polyimides, polyurethanes, epoxy resins, polyacrylates, polymethacrylates, or polymers containing polyfluorene and The polymer used in combination is preferably a polymer containing polyolefin, polyester, polycarbonate, epoxy resin, or polyacrylate, which is generally highly transparent, and particularly preferably containing heat resistance and melt processability, or A polymer of polyester or polycarbonate having excellent balance of mechanical strength is particularly preferably a polymer containing polycarbonate which is generally excellent in heat resistance or chemical resistance.

於製成併用複數種連結基之聚合物之情形時,關於連結基之組合,並無特別限定,例如可列舉:併用碳酸酯結構與酯結構作為連結基之聚合物、併用碳酸酯結構與胺基甲酸乙酯結構作為連結基之聚合物、併用酯結構與醯胺作為連結基之聚合物等,較佳為可列舉:併用碳酸酯結構與酯結構作為連結基之聚合物。此處,作為併用複數種連結基之聚合物之具體例,可列舉:聚酯碳酸酯、具有碳酸酯鍵之聚胺基甲酸酯、聚酯醯胺、聚酯醯亞胺等,該等中,較佳為耐熱性與熔融加工性或機械強度之平衡性優異之聚酯碳酸酯。於本說明書中,將具有碳酸酯鍵之聚合物稱為聚碳酸酯,除僅具有碳酸酯鍵作為連結基之聚合物外,亦包含聚酯碳酸酯(具有酯鍵與碳酸酯鍵之聚合物)、具有碳酸酯鍵之聚胺基甲酸酯等。此處,包含聚碳酸酯之聚合物中之碳酸酯鍵之比例可為任意值,為了將原因在於碳酸酯鍵之耐熱性或耐化學品性等優異之特性向樹脂組合物進行賦予,碳酸酯鍵之比例較佳為一定比例以上,全部連結基中之碳酸酯鍵之莫耳分率較佳為30%以上,更佳為50%以上,進而較佳為60%以上,尤佳為70%以上,且通常為100%以下。 When a polymer using a plurality of linking groups is produced, the combination of the linking groups is not particularly limited, and examples thereof include a polymer using a carbonate structure and an ester structure as a linking group, and a carbonate structure and an amine in combination. Polymers having a urethane structure as a linking group and polymers using an ester structure and amidine as a linking group are preferably exemplified by polymers in which a carbonate structure and an ester structure are used as a linking group. Here, as specific examples of a polymer in which a plurality of types of linking groups are used in combination, polyester carbonate, polyurethane having a carbonate bond, polyester amidamine, polyester amine, etc. Among them, polyester carbonates having excellent balance between heat resistance and melt processability or mechanical strength are preferred. In this specification, a polymer having a carbonate bond is referred to as a polycarbonate. In addition to a polymer having only a carbonate bond as a linking group, a polyester carbonate (a polymer having an ester bond and a carbonate bond) is also included. ), A polyurethane having a carbonate bond, and the like. Here, the ratio of the carbonate bond in the polymer containing polycarbonate may be an arbitrary value. In order to impart the resin composition with excellent properties such as heat resistance and chemical resistance, the carbonate bond is provided. The ratio of the bonds is preferably a certain ratio or more. The mole fraction of the carbonate bonds in all the linking groups is preferably 30% or more, more preferably 50% or more, still more preferably 60% or more, and even more preferably 70%. Above, and usually below 100%.

<3.5共聚物> <3.5 copolymer>

具有2價之三茀作為重複單元之聚合物亦可為進而包含任意之2價之有機基(其中,將2價之三茀及2價之二茀除外)作為重複單元的共聚物。於該情形時,較佳為重複單元彼此由上述之連結基連結而成 者。 The polymer having divalent trifluorene as a repeating unit may be a copolymer further containing an arbitrary divalent trivalent organic group (except for the trivalent difluoride and the divalent difluorene) as the repeating unit. In this case, it is preferable that the repeating units are connected to each other by the above-mentioned linking group. By.

共聚物中,作為亦可與2價之三茀併用之任意之2價的有機基,就連同控制為樹脂組合物所必需之光學特性及物性之範圍之觀點而言,可較佳地使用以下之通式(3)所表示之2價之有機基。於該情形時,亦可進而併用通式(3)所表示之2價之有機基以外之2價之有機基作為任意之2價的有機基。 Among the copolymers, as an arbitrary divalent organic group that can be used in combination with the trivalent trivalent, from the viewpoint of controlling the range of optical properties and physical properties necessary for the resin composition, the following can be preferably used: A divalent organic group represented by the general formula (3). In this case, a divalent organic group other than the divalent organic group represented by the general formula (3) may be used in combination as an arbitrary divalent organic group.

式中,R20表示可經取代之碳數2~20之伸烷基、可經取代之碳數4~20之伸芳基、可經取代之碳數2~100之伸烷基醚基、具有可經取代之碳數4~20之脂環結構之有機基或具有可經取代之碳數4~20之雜環結構之有機基。 In the formula, R 20 represents an alkylene group having 2 to 20 carbon atoms that can be substituted, an alkylene group having 4 to 20 carbon atoms that can be substituted, an alkylene ether group having 2 to 100 carbon atoms that can be substituted, An organic group having an alicyclic structure having 4 to 20 carbon atoms that can be substituted or an organic group having a heterocyclic structure with 4 to 20 carbon atoms that can be substituted.

於聚合物包含上述通式(3)所表示之2價之有機基之情形時,除可發揮向樹脂組合物賦予正折射率各向異性之功能外,亦有如下傾向:可將相位差之波長色散性或光彈性係數等光學物性、或者機械強度、耐熱性、熔融加工性等各種之樹脂物性控制為較佳之範圍等,即可任意地控制樹脂組合物之物性。 When the polymer contains a divalent organic group represented by the general formula (3), in addition to exerting a function of imparting positive refractive index anisotropy to the resin composition, there is also a tendency that the phase difference can be reduced. Optical properties such as wavelength dispersion and photoelasticity, or various resin properties such as mechanical strength, heat resistance, and melt processability are controlled to a preferable range, and the properties of the resin composition can be arbitrarily controlled.

再者,已知如下情況:不具有垂直配向於主鏈之芳香環,或者即便具有上述芳香環,其比例於整體中亦較少之樹脂組合物通常顯現正折射率各向異性。因係於上述通式(3)所表示之2價之有機基之重複單元中,除側鏈具有芳香環以外,全部顯現正折射率各向異性之結構,故而包含50莫耳%以上之上述通式(3)所表示之2價之有機基的樹脂組合物顯示正折射率各向異性。 Furthermore, it is known that a resin composition which does not have an aromatic ring vertically aligned with the main chain, or has the above-mentioned aromatic ring, and whose proportion is small in the whole, generally exhibits positive refractive index anisotropy. Because it is a repeating unit of a divalent organic group represented by the general formula (3) above, except that the side chain has an aromatic ring, all of them exhibit a structure with positive refractive index anisotropy. The divalent organic group resin composition represented by the general formula (3) exhibits positive refractive index anisotropy.

<3.6有機基之具體例> <3.6 Specific Examples of Organic Groups>

如上所述,通式(3)中之R20表示可經取代之碳數2~20之伸烷基、可經取代之碳數4~20之伸芳基、可經取代之碳數2~100之伸烷基醚基、具有可經取代之碳數4~20之脂環結構之有機基或具有可經取代之碳數4~20之雜環結構之有機基。 As described above, R 20 in the general formula (3) represents an alkylene group having 2 to 20 carbon atoms that can be substituted, an alkylene group having 4 to 20 carbon atoms that can be substituted, and 2 to 20 carbon atoms that can be substituted. An alkylene ether group of 100, an organic group having an alicyclic structure with 4 to 20 carbon atoms that can be substituted or an organic group having a heterocyclic structure with 4 to 20 carbon atoms that can be substituted.

「可經取代之碳數2~20之伸烷基」之具體結構係於以下進行列舉,並不限定於該等,可列舉:伸乙基、正伸丙基、正伸丁基、正伸戊基、正伸己基基等直鏈狀之伸烷基;1-甲基伸乙基、2-甲基伸乙基、1-乙基伸乙基、2-乙基伸乙基、1-甲基伸丙基、2-甲基伸丙基、2,2-二甲基伸丙基、3-甲基伸丙基等包含側鏈之伸烷基。其碳數較佳為2以上又12以下,更佳為6以下。該等中,較佳為有適當之疏水性與柔軟性,且有賦予較低之光彈性係數之傾向之下述通式(5)所表示之直鏈狀的伸烷基。 The specific structure of the "alkylene group having 2 to 20 carbon atoms which can be substituted" is listed below, and is not limited to these. Examples include: ethylene, n-propyl, n-butyl, n-pentyl, Straight-chain alkylene groups such as n-hexyl; 1-methyl-ethyl, 2-methyl-ethyl, 1-ethyl-ethyl, 2-ethyl-ethyl, 1-methyl-propyl, 2-Methenyl, 2,2-Dimethylbutanyl, 3-Methylbutanyl and the like include an alkylene group having a side chain. The carbon number is preferably 2 or more and 12 or less, and more preferably 6 or less. Among these, a linear alkylene group represented by the following general formula (5), which has appropriate hydrophobicity and flexibility and tends to impart a low photoelastic coefficient, is preferred.

(式中,R2-11表示可經取代之碳數0~18之直鏈狀伸烷基)。 (In the formula, R 2-11 represents a linear alkylene group having 0 to 18 carbon atoms which may be substituted.)

「可經取代之碳數0~18之直鏈狀伸烷基」之具體結構係於以下進行列舉,並不限定於該等,可列舉:伸乙基、正伸丙基、正伸丁基、正伸戊基、正伸己基等。其碳數較佳為2以上,又較佳為10以下,更佳為4以下。 The specific structure of the "linear alkylene group having 0 to 18 carbon atoms which can be substituted" is listed below, and is not limited to these. Examples include: ethylene, n-propyl, n-butyl, and n-butyl Pentyl, hexyl, etc. The carbon number is preferably 2 or more, more preferably 10 or less, and even more preferably 4 or less.

「可經取代之碳數4~20之伸芳基」之具體結構係於以下進行列舉,並不限定於該等,可列舉:1,2-伸苯基、1,3-伸苯基、1,4-伸苯基等伸苯基;1,5-伸萘基、2,6-伸萘基等伸萘基;2,5-伸吡啶基、2,4-伸 噻吩基、2,4-伸呋喃基等雜伸芳基。其碳數較佳為4以上又8以下,更佳為6以下。該等中,就連同工業上可廉價地獲取之觀點而言,較佳為1,2-伸苯基、1,3-伸苯基或1,4-伸苯基。 The specific structure of the "arylene having 4 to 20 carbon atoms which can be substituted" is listed below, and is not limited to these. Examples include 1,2-phenylene, 1,3-phenylene, 1,4-phenylene, etc. phenylene; 1,5-alkylene, 2,6-naphthyl, etc .; 2-phenylene, 2,4-phenylene Heteroaryl groups such as thienyl and 2,4-furanyl. The carbon number is preferably 4 or more and 8 or less, and more preferably 6 or less. Among these, 1,2-phenylene, 1,3-phenylene, or 1,4-phenylene is preferable from a viewpoint that it can be obtained industrially inexpensively.

作為「可經取代之碳數2~20之伸烷基」、「可經取代之碳數0~18之直鏈狀伸烷基」及「可經取代之碳數4~20之伸芳基」可具有之取代基,可列舉:鹵素原子(例如,氟原子、氯原子、溴原子、碘原子);碳數1~10之烷基(例如,甲基、乙基、異丙基等);碳數1~10之烷氧基(例如,甲氧基、乙氧基等);碳數1~10之醯基(例如,乙醯基、苯甲醯基等);碳數1~10之醯胺基(例如,乙醯胺基、苯甲醯胺基等);硝基;氰基;可具有選自鹵素原子(例如,氟原子、氯原子、溴原子、碘原子)、碳數1~10之烷基(例如,甲基乙基、異丙基等)、碳數1~10之烷氧基(例如,甲氧基、乙氧基等)、碳數1~10之醯基(例如,乙醯基、苯甲醯基等)、碳數1~10之醯胺基(例如,乙醯胺基、苯甲醯胺基等)、硝基、氰基等之1~3個取代基之碳數6~10之芳基(例如,苯基、萘基等)等。該等取代基之數量並無特別限定,但較佳為1~3個。於取代基為2個以上之情形時,取代基之種類可相同亦可不同。又,就連同工業上可廉價地製造之觀點而言,較佳為未經取代。 As "substitutable alkylene group with 2 to 20 carbon atoms", "substitutable linear alkylene group with 0 to 18 carbon atoms" and "substitutable alkylene group with 4 to 20 carbon atoms that can be substituted" "The substituents which may be included are: halogen atoms (for example, fluorine atom, chlorine atom, bromine atom, iodine atom); alkyl groups having 1 to 10 carbon atoms (for example, methyl, ethyl, isopropyl, etc.) ; Alkoxy groups with 1 to 10 carbons (for example, methoxy, ethoxy, etc.); Alkyl groups with 1 to 10 carbons (for example, ethyl fluorenyl, benzyl, etc.); 1 to 10 carbons Hydrazone (for example, acetamido, benzamido, etc.); nitro; cyano; may have a halogen atom (for example, fluorine atom, chlorine atom, bromine atom, iodine atom), carbon number Alkyl groups of 1 to 10 (e.g. methylethyl, isopropyl, etc.), alkoxy groups of 1 to 10 carbons (e.g., methoxy, ethoxy, etc.), and fluorenyl groups of 1 to 10 carbons (E.g., ethylamido, benzamidine, etc.), 1 to 10 carbon atoms (for example, ethylamido, benzamidine, etc.), 1 to 3 of nitro, cyano, etc. An aryl group having 6 to 10 carbon atoms (for example, phenyl, naphthyl, etc.) as a substituent. The number of these substituents is not particularly limited, but is preferably 1-3. When there are two or more substituents, the kinds of the substituents may be the same or different. Moreover, it is preferable that it is unsubstituted in view of the fact that it can be manufactured inexpensively industrially.

作為具有取代基之伸烷基之具體例,可列舉:苯基伸乙基、1-苯基伸丙基、1-環己基伸丙基、1,1,2,2-四氟伸乙基等。 Specific examples of the alkylene group having a substituent include phenylethynyl, 1-phenylethynyl, 1-cyclohexylethynyl, 1,1,2,2-tetrafluoroethynyl and the like.

作為具有取代基之伸芳基之具體例,可列舉:2-甲基-1,4-伸苯基、5-甲基-1,3-伸苯基、2,5-二甲基-1,4-伸苯基、2-甲氧基-1,4-伸苯基、2-三氟甲基-1,4-伸苯基、2,5-二甲氧基-1,4-伸苯基、2,3,5,6-四氟-1,4-伸苯基等取代伸芳基。 Specific examples of the arylene group having a substituent include 2-methyl-1,4-phenylene, 5-methyl-1,3-phenylene, and 2,5-dimethyl-1 1,4-phenylene, 2-methoxy-1,4-phenylene, 2-trifluoromethyl-1,4-phenylene, 2,5-dimethoxy-1,4-phenylene Phenyl, 2,3,5,6-tetrafluoro-1,4-phenylene, etc. are substituted for arylene.

「可經取代之碳數6~20之伸芳烷基」之具體結構係於以下進行列舉,並不限定於該等,可列舉:如下述[L]群所示之伸芳烷基。 The specific structure of the "arylene group having 6 to 20 carbon atoms which can be substituted" is listed below, and is not limited to these. Examples include the alkylene group shown in the following [L] group.

其碳數較佳為6以上,又為10以下,更佳為8以下。該等中,就連同工業上可廉價地獲取之觀點而言,較佳為鄰苯二甲基、間苯二甲基或對苯二甲基。 The carbon number is preferably 6 or more, 10 or less, and more preferably 8 or less. Among these, from the viewpoint of industrially available inexpensiveness, it is preferably o-xylylene, m-xylylene, or p-xylylene.

作為「可經取代之碳數6~20之伸芳烷基」可具有之取代基,可列舉:鹵素原子(例如,氟原子、氯原子、溴原子、碘原子);碳數1~10之烷基(例如,甲基、乙基、異丙基等);碳數1~10之烷氧基(例如,甲氧基、乙氧基等);碳數1~10之醯基(例如,乙醯基、苯甲醯基等);碳數1~10之醯胺基(例如,乙醯胺基、苯甲醯胺基等);硝基;氰基;可具有選自鹵素原子(例如,氟原子、氯原子、溴原子、碘原子)、碳數1~10之烷基(例如,甲基、乙基、異丙基等)、碳數1~10之烷氧基(例如,甲氧基、乙氧基等)、碳數1~10之醯基(例如,乙醯基、苯甲醯基等)、碳數1~10之醯胺基(例如,乙醯胺基、苯甲醯胺基等)、硝基、氰基等之1~3個取代基之碳數6~10之芳基(例如,苯基、萘基等)等。該等取代基之數量並無特別限定,較佳為1~3個。於取代基為2個以上之情形時,取代基之種類可相同亦可不同。又,就連同工業上可廉價地製造之觀點而言,較佳為未經取代。 Examples of the substituent which the "arylene group having 6 to 20 carbon atoms which may be substituted" may have: a halogen atom (for example, a fluorine atom, a chlorine atom, a bromine atom, and an iodine atom); a carbon atom having 1 to 10 carbon atoms; Alkyl (for example, methyl, ethyl, isopropyl, etc.); alkoxy (for example, methoxy, ethoxy, etc.) having 1 to 10 carbons; fluorenyl (for example, Ethanoyl, benzamidine, etc.); amidino groups having 1 to 10 carbon atoms (for example, acetoamino, benzamidine, etc.); nitro; cyano; may have a halogen atom selected (for example , Fluorine atom, chlorine atom, bromine atom, iodine atom), alkyl group having 1 to 10 carbon atoms (for example, methyl, ethyl, isopropyl, etc.), and alkoxy group having 1 to 10 carbon atoms (for example, methyl (Oxy, ethoxy, etc.), fluorenyl groups having 1 to 10 carbon atoms (for example, ethenyl, benzamidine, etc.), fluorenyl groups having 1 to 10 carbon atoms (for example, acetamido, benzyl) Sulfonylamino groups, etc.), aryl groups having 1 to 3 substituents such as nitro and cyano groups, and aryl groups having 6 to 10 carbon atoms (for example, phenyl, naphthyl, etc.). The number of these substituents is not particularly limited, but is preferably 1 to 3. When there are two or more substituents, the kinds of the substituents may be the same or different. Moreover, it is preferable that it is unsubstituted in view of the fact that it can be manufactured inexpensively industrially.

所謂「可經取代之碳數2~100之伸烷基醚基」,係具有1個以上之伸烷基與醚性氧原子之2價之基。其碳數較佳為4以上,更佳為6以上,又較佳為60以下,更佳為50以下,進而較佳為40以下,尤佳為30以下。更具體而言,可列舉:下述通式(7)[化65] The so-called "substitutable alkylene ether group having 2 to 100 carbon atoms" is a divalent group having one or more alkylene groups and etheric oxygen atoms. Its carbon number is preferably 4 or more, more preferably 6 or more, still more preferably 60 or less, more preferably 50 or less, even more preferably 40 or less, and even more preferably 30 or less. More specifically, the following formula (7):

(式中,R2-13表示可經取代之碳數2~10之伸烷基,p為1~40之整數)所表示之基、或下述通式(8) ( Wherein R 2-13 represents an alkylene group having 2 to 10 carbon atoms which can be substituted, and p is an integer of 1 to 40), or the following general formula (8)

(式中,R2-14表示可經取代之碳數2~10之伸烷基,R2-15表示可經取代之碳數12~30之伸芳基)所表示之基。 ( Wherein R 2-14 represents an alkylene group having 2 to 10 carbon atoms which can be substituted, and R 2-15 represents an alkylene group having 12 to 30 carbon atoms which can be substituted).

於通式(7)及通式(8)中,R2-13及R2-14表示可經取代之碳數2~10之伸烷基。其具體之結構係於以下進行列舉,並不限定於該等,可列舉:伸乙基、正伸丙基、正伸丁基、正伸戊基、正伸己基等直鏈狀之伸烷基;1-甲基伸乙基、2-甲基伸乙基、1-乙基伸乙基、2-乙基伸乙基、1-甲基伸丙基、2-甲基伸丙基、2,2-二甲基伸丙基、3-甲基伸丙基等包含側鏈之伸烷基(此處,取代位置之數值係設為自末端側之碳附上者)等。 In the general formula (7) and the general formula (8), R 2-13 and R 2-14 represent an alkylene group having 2 to 10 carbon atoms which may be substituted. Its specific structure is enumerated below, and is not limited to these. Examples include straight-chain alkylene groups such as ethylene, n-propyl, n-butyl, n-pentyl, and n-hexyl; 1-form Ethylidene, 2-methylidene, 1-ethylidene, 2-ethylidene, 1-methylidene, 2-methylidene, 2,2-dimethyl An alkylene group including a side chain (here, the numerical value of the substitution position is set to be attached from a carbon on the terminal side) and the like, such as propylene and 3-methyl propyl.

其碳數較佳為2以上,又為8以下,更佳為4以下。 The number of carbon atoms is preferably 2 or more, 8 or less, and more preferably 4 or less.

作為「可經取代之碳數2~100之伸烷基醚基」及「可經取代之碳數2~10之伸烷基」可具有之取代基,可列舉:鹵素原子(例如,氟原子、氯原子、溴原子、碘原子);碳數1~10之烷基(例如,甲基、乙基、異丙基等);碳數1~10之烷氧基(例如,甲氧基、乙氧基等);碳數1~10之醯基(例如,乙醯基、苯甲醯基等);碳數1~10之醯胺基(例如,乙醯胺基、苯甲醯胺基等);硝基、氰基;可具有選自鹵素原 子(例如,氟原子、氯原子、溴原子、碘原子)、碳數1~10之烷基(例如,甲基、乙基、異丙基等)、碳數1~10之烷氧基(例如,甲氧基、乙氧基等)、碳數1~10之醯基(例如,乙醯基、苯甲醯基等)、碳數1~10之醯胺基(例如,乙醯胺基、苯甲醯胺基等)、硝基、氰基等之1~3個取代基之碳數6~10之芳基(例如,苯基、萘基等)等。該等取代基之數量並無特別限定,較佳為1~3個。於取代基為2個以上之情形時,取代基之種類可相同亦可不同。又,就連同工業上可廉價地製造之觀點而言,較佳為未經取代。 Examples of the substituent which the "alkylene group having 2 to 100 carbon atoms which can be substituted" and the alkylene group having 2 to 10 carbon atoms which can be substituted include a halogen atom (for example, a fluorine atom). , Chlorine atom, bromine atom, iodine atom); alkyl groups having 1 to 10 carbon atoms (for example, methyl, ethyl, isopropyl, etc.); alkoxy groups having 1 to 10 carbon atoms (for example, methoxy, Ethoxy, etc.); fluorenyl groups having 1 to 10 carbon atoms (for example, acetamyl, benzamidine, etc.); fluorenyl groups having 1 to 10 carbon atoms (for example, acetamidine, benzamidine) Etc.); nitro, cyano; may have a halogen selected from (For example, fluorine atom, chlorine atom, bromine atom, iodine atom), alkyl group having 1 to 10 carbon atoms (for example, methyl, ethyl, isopropyl, etc.), alkoxy group having 1 to 10 carbon atoms ( For example, methoxy, ethoxy, etc.), fluorenyl groups having 1 to 10 carbons (for example, ethenyl, benzamidine, etc.), fluorenyl groups having 1 to 10 carbons (for example, acetamido) , Benzamidine amino group, etc.), aryl groups having 6 to 10 carbon atoms (for example, phenyl, naphthyl, etc.) having 1 to 3 substituents such as nitro and cyano. The number of these substituents is not particularly limited, but is preferably 1 to 3. When there are two or more substituents, the kinds of the substituents may be the same or different. Moreover, it is preferable that it is unsubstituted in view of the fact that it can be manufactured inexpensively industrially.

作為具有取代基之伸烷基之具體例,可列舉:苯基伸乙基、1-苯基伸丙基、1-環己基伸丙基、1,1,2,2-四氟伸乙基等。 Specific examples of the alkylene group having a substituent include phenylethynyl, 1-phenylethynyl, 1-cyclohexylethynyl, 1,1,2,2-tetrafluoroethynyl and the like.

該等R2-13及R2-14中,較佳為因不具有不對稱點故而單體之品質管理容易之直鏈狀之伸烷基,更佳為工業上可廉價地導入,且可賦予柔軟性與吸水性之伸乙基。 Among these R 2-13 and R 2-14 , straight chain alkylene is preferred because it does not have an asymmetry point and the quality control of the monomer is easy. It is more preferably industrially inexpensive and can be introduced. Ethylene which imparts softness and water absorption.

通式(7)中,p為1~40之整數,較佳為1以上,更佳為2以上,又較佳為30以下,更佳為20以下。 In the general formula (7), p is an integer of 1 to 40, preferably 1 or more, more preferably 2 or more, still more preferably 30 or less, and even more preferably 20 or less.

通式(8)中,R2-15表示可經取代之碳數12~30之伸芳基。其具體之結構係於以下進行列舉,並不限定於該等,就連同可使樹脂組合物之玻璃轉移溫度提高之觀點而言,可較佳地列舉如下述[M]群所示之伸芳基。 In the general formula (8), R 2-15 represents an arylene group having 12 to 30 carbon atoms which may be substituted. The specific structure is listed below, and is not limited to these. From the viewpoint of improving the glass transition temperature of the resin composition, it is preferable to mention Nobuyoshi as shown in the following [M] group. base.

作為「可經取代之碳數12~30之伸芳基」可具有之取代基,可列舉:鹵素原子(例如,氟原子、氯原子、溴原子、碘原子);碳數1~10之烷基(例如,甲基、乙基、異丙基等);碳數1~10之烷氧基(例如,甲氧基、乙氧基等);碳數1~10之醯基(例如,乙醯基、苯甲醯基等);碳數1~10之醯胺基(例如,乙醯胺基、苯甲醯胺基等);硝基;氰基;可具有選自鹵素原子(例如,氟原子、氯原子、溴原子、碘原子)、碳數1~10之烷基(例如,甲基、乙基、異丙基等)、碳數1~10之烷氧基(例如,甲氧基、乙氧基等)、碳數1~10之醯基(例如,乙醯基苯甲醯基等)、碳數1~10之醯胺基(例如,乙醯胺基、苯甲醯胺基等)、硝基、氰基等之1~3個取代基之碳數6~10之芳基(例如,苯基、萘基等)等。該等取代基之數量並無特別限定,較佳為1~3個。於取代基為2個以上之情形時,取代基之種類可相同亦可不同。又,就連同工業上可廉價地製造之觀點而言,較佳為未經取代。 Examples of the substituent which the "arylene group having 12 to 30 carbon atoms which may be substituted" may have: a halogen atom (for example, a fluorine atom, a chlorine atom, a bromine atom, and an iodine atom); an alkane having 1 to 10 carbon atoms (For example, methyl, ethyl, isopropyl, etc.); alkoxy (for example, methoxy, ethoxy, etc.) having 1 to 10 carbons; fluorenyl (for example, ethyl, 1 to 10) Fluorenyl group, benzamidine group, etc.); fluorenylamino group having 1 to 10 carbon atoms (for example, acetamidine group, benzamidine group, etc.); nitro group; cyano group; may have a halogen atom (for example, Fluorine atom, chlorine atom, bromine atom, iodine atom), alkyl group having 1 to 10 carbon atoms (for example, methyl, ethyl, isopropyl, etc.), alkoxy group having 1 to 10 carbon atoms (for example, methoxy Group, ethoxy group, etc.), fluorenyl group having 1 to 10 carbon atoms (for example, ethenyl benzamidine group, etc.), fluorenyl group having 1 to 10 carbon atoms (for example, acetamidine group, benzamidine group) Aryl groups such as nitro, cyano and the like having 1 to 3 substituents and 6 to 10 carbon atoms (for example, phenyl, naphthyl, etc.). The number of these substituents is not particularly limited, but is preferably 1 to 3. When there are two or more substituents, the kinds of the substituents may be the same or different. Moreover, it is preferable that it is unsubstituted in view of the fact that it can be manufactured inexpensively industrially.

式(7)之具體結構係於以下進行列舉,並不限定於該等,可列舉:如下述[N]群所示之伸烷基醚基 The specific structure of the formula (7) is listed below, and is not limited thereto, and examples thereof include an alkylene ether group represented by the following [N] group

(上述[N]群中,關於可為非對映異構體之結構,可為任意之非對映異構體,亦可為非對映異構體混合物)。 (In the above [N] group, the diastereomeric structure may be any diastereomer or a mixture of diastereomers).

式(8)之具體結構係於以下進行列舉,並不限定於該等,可列舉如下述[O]群所示之伸烷基醚基[化69] The specific structure of the formula (8) is listed below, and is not limited to these. Examples include alkylene ether groups represented by the following [O] group.

(上述[O]群中,關於可為非對映異構體之結構,可為任意之非對映異構體,亦可為非對映異構體混合物)。 (In the above [O] group, regarding the structure which can be a diastereomer, it can be any diastereomer or a mixture of diastereomers).

「具有可經取代之碳數4~20之脂環結構之有機基或具有可經取代之碳數4~20之雜環結構之有機基」之具體結構係於以下進行列舉,並不限定於該等,就有可提高玻璃轉移溫度,可降低光彈性係數之傾向之方面而言,可較佳地列舉:如下述[P]群所示之脂環結構或雜環結構之任意2處具有直鏈狀或側鏈狀之伸烷基之鍵結鍵的有機基。 The specific structure of the "organic group having an alicyclic structure with 4 to 20 carbon atoms that can be substituted or the heterocyclic structure with 4 to 20 carbon atoms that can be substituted" is listed below and is not limited to Among these, in terms of the tendency to increase the glass transition temperature and reduce the photoelastic coefficient, a preferable example is that the alicyclic structure or the heterocyclic structure at any two places as shown in the following [P] group has An organic group that is a linear or side chain alkylene bond.

(上述[P]群所示之各環結構中之2個鍵結鍵之取代位置為任意,且亦可2個鍵結鍵於同一碳進行取代)。此處,所謂鍵結鍵,係直接鍵、或碳數1~5之直鏈狀或側鏈狀之伸烷基,2個鍵結鍵之長度亦可不同。較佳之鍵結鍵係玻璃轉移溫度之降低較少之直接鍵、或亞甲基。 (The substitution positions of the two bonding bonds in each ring structure shown in the above-mentioned [P] group are arbitrary, and the two bonding bonds may be substituted on the same carbon). Here, the so-called bonding bond is a direct bond, or a linear or side chain-shaped alkylene having 1 to 5 carbon atoms, and the lengths of the two bonding bonds may be different. The preferred bond is a direct bond, or a methylene group, with a lower reduction in glass transition temperature.

作為「具有可經取代之碳數4~20之脂環結構之有機基或具有可經取代之碳數4~20之雜環結構之有機基」可具有之取代基,可列舉:鹵素原子(例如,氟原子、氯原子、溴原子、碘原子);碳數1~10之烷基(例如,甲基、乙基、異丙基等);碳數1~10之烷氧基(例如,甲氧基、乙氧基等);碳數1~10之醯基(例如,乙醯基、苯甲醯基等);碳數1~10之醯胺基(例如,乙醯胺基、苯甲醯基醯胺基等);硝基;氰基;可具有選自鹵素原子(例如,氟原子、氯原子、溴原子、碘原子)、碳數1~10之烷基(例如,甲基、乙基、異丙基等)、碳數1~10之烷氧基(例如,甲氧基、乙氧基等)、碳數1~10之醯基(例如,乙醯基、苯甲醯基等)、碳數1~10之醯胺基(例如,乙醯胺基、苯甲醯胺基等)、硝基、氰基等之1~3個取代基之碳數6~10之芳基(例如,苯基、萘基等)等。該等取代基之數量並無特別限定,較佳為1~3個。於取代基為2個以上之情形時,取代基之種類可相同亦可不同。又,就連同工業上可廉價地製造之觀點而言,較佳為未經取代。 Examples of the substituent which the "organic group having an alicyclic structure having 4 to 20 carbon atoms that can be substituted or an organic group having a heterocyclic structure having 4 to 20 carbon atoms that can be substituted" may include: a halogen atom ( For example, fluorine atom, chlorine atom, bromine atom, iodine atom); alkyl group having 1 to 10 carbon atoms (for example, methyl, ethyl, isopropyl, etc.); alkoxy group having 1 to 10 carbon atoms (for example, Methoxy, ethoxy, etc.); fluorenyl groups having 1 to 10 carbons (for example, ethenyl, benzamidine, etc.); fluorenyl groups having 1 to 10 carbons (for example, acetamido, benzene) Methylamino, amino, etc.); nitro; cyano; may have a halogen atom (for example, fluorine atom, chlorine atom, bromine atom, iodine atom), an alkyl group having 1 to 10 carbon atoms (for example, methyl , Ethyl, isopropyl, etc.), alkoxy groups (e.g., methoxy, ethoxy, etc.) having 1 to 10 carbon atoms, and fluorenyl groups (e.g., ethenyl, benzamidine, etc.) having 1 to 10 carbon atoms Groups), fluorenylamino groups with 1 to 10 carbon atoms (e.g., acetamidoamine, benzamidine amino groups, etc.), aryl groups with 1 to 3 carbon atoms such as nitro and cyano groups, and aromatic groups with 6 to 10 carbon atoms (E.g., phenyl, naphthyl, etc.). The number of these substituents is not particularly limited, but is preferably 1 to 3. When there are two or more substituents, the kinds of the substituents may be the same or different. Moreover, it is preferable that it is unsubstituted in view of the fact that it can be manufactured inexpensively industrially.

「具有可經取代之碳數4~20之脂環結構之有機基或具有可經取代之碳數4~20之雜環結構之有機基」之較佳的具體結構係於以下進行列舉,並不限定於該等,可列舉:有賦予較高之透明性與玻璃轉移溫度、吸水性、雙折射、較低之光彈性係數之傾向之下述通式(4) Preferred specific structures of the "organic group having an alicyclic structure with 4 to 20 carbon atoms that can be substituted or the heterocyclic structure with 4 to 20 carbon atoms that can be substituted" are enumerated below, and Without being limited to these, the following general formula (4) which tends to give higher transparency and glass transition temperature, water absorption, birefringence, and lower photoelasticity coefficient can be listed.

所表示之基、下述通式(6)[化72] The base represented by the following general formula (6) [Chem. 72]

(式中,R2-12表示可經取代之碳數4~20之環伸烷基)所表示之基、或下述通式(9) ( Wherein R 2-12 represents a cycloalkylene group having 4 to 20 carbon atoms which may be substituted), or the following general formula (9)

(式中,R2-16表示具有可經取代之碳數2~20之縮醛環之基)所表示之基。 (In the formula, R 2-16 represents a group having an acetal ring having 2 to 20 carbon atoms which may be substituted.)

通式(6)中,R2-12表示可經取代之碳數4~20之環伸烷基。其具體之結構係於以下進行列舉,並不限定於該等,就有可提高玻璃轉移溫度,可降低光彈性係數之傾向之方面而言,可較佳地列舉:如下述[Q]群所示之環伸烷基 In the general formula (6), R 2-12 represents a cycloalkylene group having 4 to 20 carbon atoms which may be substituted. The specific structure is listed below, and it is not limited to these. In terms of the tendency to increase the glass transition temperature and reduce the photoelastic coefficient, it can be preferably listed as follows: [Q] Cycloalkylene

(上述[Q]群中,關於可為非對映異構體之結構,可為任意之非對映異構體,亦可為非對映異構體混合物)。 (In the above [Q] group, the diastereomeric structure may be any diastereomer or a mixture of diastereomers).

作為「可經取代之碳數4~20之環伸烷基」可具有之取代基,可列舉:鹵素原子(例如,氟原子、氯原子、溴原子、碘原子);碳數1~10之烷基(例如,甲基、乙基、異丙基等);碳數1~10之烷氧基(例 如,甲氧基、乙氧基等);碳數1~10之醯基(例如,乙醯基、苯甲醯基等);碳數1~10之醯胺基(例如,乙醯胺基、苯甲醯基醯胺基等);硝基;氰基;可具有選自鹵素原子(例如,氟原子、氯原子、溴原子、碘原子)、碳數1~10之烷基(例如,甲基、乙基、異丙基等)、碳數1~10之烷氧基(例如,甲氧基、乙氧基等)、碳數1~10之醯基(例如,乙醯基、苯甲醯基等)、碳數1~10之醯胺基(例如,乙醯胺基、苯甲醯基醯胺基等)、硝基、氰基等之1~3個取代基之碳數6~10之芳基(例如,苯基、萘基等)等。該等取代基之數量並無特別限定,較佳為1~3個。於取代基為2個以上之情形時,取代基之種類可相同亦可不同。又,就連同工業上可廉價地製造之觀點而言,較佳為未經取代。 Examples of the substituent which the "cycloalkylene group having 4 to 20 carbon atoms which may be substituted" may have: a halogen atom (for example, a fluorine atom, a chlorine atom, a bromine atom, and an iodine atom); a carbon atom having 1 to 10 carbon atoms; Alkyl (e.g. methyl, ethyl, isopropyl, etc.); alkoxy with 1 to 10 carbons (eg (E.g., methoxy, ethoxy, etc.); fluorenyl groups having 1 to 10 carbon atoms (for example, ethenyl, benzamidine, etc.); fluorenyl groups having 1 to 10 carbon atoms (for example, acetamido) , Benzamidine, amidino, etc.); nitro; cyano; may have a halogen atom (for example, fluorine atom, chlorine atom, bromine atom, iodine atom), an alkyl group having 1 to 10 carbon atoms (for example, Methyl, ethyl, isopropyl, etc.), alkoxy groups (e.g., methoxy, ethoxy, etc.) having 1 to 10 carbon atoms, and fluorenyl groups (e.g., ethenyl, benzene, etc.) having 1 to 10 carbon atoms Formamidine groups, etc.), Amido groups having 1 to 10 carbon atoms (for example, acetoamino, benzamidine, etc.), 1 to 3 substituents such as nitro, cyano, etc., having 6 carbon atoms ~ 10 aryl groups (for example, phenyl, naphthyl, etc.) and the like. The number of these substituents is not particularly limited, but is preferably 1 to 3. When there are two or more substituents, the kinds of the substituents may be the same or different. Moreover, it is preferable that it is unsubstituted in view of the fact that it can be manufactured inexpensively industrially.

通式(6)之具體結構係於以下進行列舉,並不限定於該等,可列舉:具有如下述[R]群所示之脂環結構之有機基。 Specific structures of the general formula (6) are listed below, and are not limited thereto. Examples thereof include organic groups having an alicyclic structure represented by the following [R] group.

(上述[R]群中,關於可為非對映異構體之結構,可為任意之非對映異構體,亦可為非對映異構體混合物)。該等中,就連同工業上可廉價地獲取之觀點而言,較佳為具有下述[R-2]群所示之脂環結構之有機基。 (In the above-mentioned [R] group, regarding the structure which may be a diastereomer, it may be any diastereomer or a mixture of diastereomers). Among these, an organic group having an alicyclic structure represented by the following [R-2] group is preferable from the viewpoint that it can be obtained industrially and inexpensively.

通式(9)中,R2-16表示具有可經取代之碳數2~20之縮醛環之基。其具體之結構係於以下進行列舉,並不限定於該等,就有可提高玻璃轉移溫度與雙折射,可降低光彈性係數之傾向之方面而言,可較佳地列舉:具有如下述[S]群所示之縮醛環之基。 In the general formula (9), R 2-16 represents a group having an acetal ring having 2 to 20 carbon atoms which may be substituted. The specific structure is listed below, and is not limited to these. In terms of the tendency to increase the glass transition temperature and birefringence, and to reduce the photoelastic coefficient, it can be preferably listed as follows: S] Group of the acetal ring.

(上述[S]群中,關於可為非對映異構體之結構,亦可為任意之非對映異構體)。 (In the above-mentioned [S] group, the structure which may be a diastereomer may also be an arbitrary diastereomer).

作為「可經取代之碳數2~20之縮醛環」可具有之取代基,可列舉:鹵素原子(例如,氟原子、氯原子、溴原子、碘原子);碳數1~10之烷基(例如,甲基、乙基、異丙基等);碳數1~10之烷氧基(例如,甲氧基、乙氧基等);碳數1~10之醯基(例如,乙醯基、苯甲醯基等);碳數1~10之醯胺基(例如,乙醯胺基、苯甲醯胺基等);硝基;氰基;可具有選自鹵素原子(例如,氟原子、氯原子、溴原子、碘原子)、碳數1~10之烷基(例如,甲基、乙基、異丙基等)、碳數1~10之烷氧基(例如,甲氧基、乙氧基等)、碳數1~10之醯基(例如,乙醯基、苯甲醯基等)、碳數1~10之醯胺基(例如,乙醯胺基、苯甲醯基醯胺基等)、硝基、氰基等之1~3個取代基之碳數6~10之芳基(例如,苯基、萘基等)等。該等取代基之數量並無特別限定,較佳為1~3個。於取代基為2個以上之情形時,取代基之種類可相同亦可不同。又,就連同工業上可廉價地製造之觀點而言,較佳為未經取代。 Examples of the substituent which the "acetal ring having 2 to 20 carbon atoms which may be substituted" may have: a halogen atom (for example, a fluorine atom, a chlorine atom, a bromine atom, and an iodine atom); an alkane having 1 to 10 carbon atoms (For example, methyl, ethyl, isopropyl, etc.); alkoxy (for example, methoxy, ethoxy, etc.) having 1 to 10 carbons; fluorenyl (for example, ethyl, 1 to 10) Fluorenyl group, benzamidine group, etc.); fluorenylamino group having 1 to 10 carbon atoms (for example, acetamidine group, benzamidine group, etc.); nitro group; cyano group; may have a halogen atom (for example, Fluorine atom, chlorine atom, bromine atom, iodine atom), alkyl group having 1 to 10 carbon atoms (for example, methyl, ethyl, isopropyl, etc.), alkoxy group having 1 to 10 carbon atoms (for example, methoxy Group, ethoxy group, etc.), amidino group having 1 to 10 carbon atoms (for example, ethanoyl group, benzamidine group, etc.), amidino group having 1 to 10 carbon atoms (eg, acetamido group, benzamidine group, etc.) Sulfonylamino groups, etc.), aryl groups having 1 to 3 substituents such as nitro and cyano groups, and aryl groups having 6 to 10 carbon atoms (for example, phenyl, naphthyl, etc.). The number of these substituents is not particularly limited, but is preferably 1 to 3. When there are two or more substituents, the kinds of the substituents may be the same or different. Moreover, it is preferable that it is unsubstituted in view of the fact that it can be manufactured inexpensively industrially.

通式(3)所表示之2價之有機基中,較佳者係有因主鏈不具有芳香環、或主鏈包含較多芳香環以外之部分結構,故而可達成光學膜所要 求之較低之光彈性係數之傾向的可經取代之伸烷基、可經取代之伸烷基醚基、具有可經取代之脂環結構之有機基或具有可經取代之雜環結構之有機基。更佳為選自有賦予較高之透明性與玻璃轉移溫度、吸水性、雙折射、較低之光彈性係數之傾向之下述通式(4) Among the divalent organic groups represented by the general formula (3), the preferred ones are those in which the main chain does not have an aromatic ring, or the main chain contains a portion of structures other than aromatic rings, so that the comparison required for an optical film can be achieved. The tendency of a low photoelasticity coefficient is a substituted alkylene group, a substituted alkylene ether group, an organic group having a substituted alicyclic structure, or an organic group having a substituted heterocyclic structure. More preferably, it is selected from the following general formula (4) which tends to impart higher transparency and glass transition temperature, water absorption, birefringence, and lower photoelastic coefficient.

或有適當之疏水性與柔軟性,且有賦予較低之光彈性係數之傾向之下述通式(5) The following general formula (5), which has appropriate hydrophobicity and softness, and has a tendency to impart a low photoelastic coefficient

(式中,R2-11表示可經取代之碳數0~18之直鏈狀伸烷基)、或有賦予較高之透明性與玻璃轉移溫度、適當之柔軟性之傾向之下述通式(6) ( Wherein R 2-11 represents a linear alkylene group having 0 to 18 carbon atoms which can be substituted) or the following general formulas which tend to impart higher transparency, glass transition temperature, and appropriate flexibility Equation (6)

(式中,R2-12表示可經取代之碳數4~20之環伸烷基)、或有賦予柔軟性與吸水性、較低之光彈性係數之傾向之下述通式(7)[化81] ( Wherein R 2-12 represents a cycloalkylene group having 4 to 20 carbon atoms which may be substituted) or the following general formula (7) which tends to impart softness and water absorption and a low photoelastic coefficient [Chemical 81]

(式中,R2-13表示可經取代之碳數2~10之伸烷基,p為1~40之整數)、或有賦予較高之透明性與玻璃轉移溫度之傾向之下述通式(8) (In the formula, R 2-13 represents an alkylene group having 2 to 10 carbon atoms which can be substituted, and p is an integer of 1 to 40), or the following general formula which tends to give higher transparency and glass transition temperature Equation (8)

(式中,R2-14表示可經取代之碳數2~10之伸烷基,R2-15表示可經取代之碳數12~30之伸芳基)、或有賦予較高之透明性與玻璃轉移溫度、雙折射之傾向之下述通式(9) (In the formula, R 2-14 represents an alkylene group having 2 to 10 carbon atoms that can be substituted, and R 2-15 represents an alkylene group having 12 to 30 carbon atoms that can be substituted), or has a higher transparency Properties and the tendency of glass transition temperature and birefringence, the following general formula (9)

(式中,R2-16表示具有可經取代之碳數2~20之縮醛環之基)中之至少1種。進而較佳為有藉由賦予較高之透明性與玻璃轉移溫度、吸水性、較低之光彈性係數,從而賦予作為相位差膜之優異之物性之傾向的上述通式(4)所表示之基。 (In the formula, R 2-16 represents a group having an acetal ring having 2 to 20 carbon atoms which may be substituted.) Furthermore, it is preferred that the above-mentioned general formula (4) has a tendency to impart higher physical properties as a retardation film by providing higher transparency and glass transition temperature, water absorption, and lower photoelastic coefficient. base.

通式(3)所表示之2價之有機基可單獨使用1種,亦可併用2種以上。就減少光學物性或機械物性之每個批次之不均等品質管理之觀點而言,較佳為單獨使用1種。另一方面,就連同兼顧光學特性或機械物性之觀點而言,較佳為併用2種以上,又,通常為4種以下,較佳為 使用3種以下。 The divalent organic group represented by the general formula (3) may be used singly or in combination of two or more kinds. From the viewpoint of reducing uneven quality control for each batch of optical or mechanical properties, it is preferable to use one type alone. On the other hand, from the viewpoint of taking both optical characteristics and mechanical properties into consideration, it is preferable to use two or more types together, and it is usually four or less types, and more preferably Use 3 or less.

於併用2種以上之通式(3)所表示之2價之有機基之情形時,關於其組合,並無特別限定。例如為了賦予較高之透明性與玻璃轉移溫度、雙折射,較佳為上述通式(4)所表示之有機基、或上述通式(9)所表示之有機基,為了賦予柔軟性,較佳為上述通式(5)所表示之有機基、或上述通式(7)所表示之有機基,另一方面,為了賦予較高之透明性與玻璃轉移溫度、適當之柔軟性,較佳為上述通式(6)所表示之有機基,該等中,根據所要求之目的之組合,只要選擇對應其之有機基之組合即可。具體而言,較佳為屬於上述通式(4)所表示之有機基之源自ISB(異山梨酯)之重複單元與屬於上述通式(6)所表示之有機基之源自CHDM(1,4-環己烷二甲醇)之重複單元的組合、或者屬於上述通式(9)所表示之有機基之源自SPG(螺二醇)之重複單元與屬於上述通式(6)所表示之有機基之源自CHDM之重複單元的組合。 When two or more types of divalent organic groups represented by the general formula (3) are used in combination, the combination thereof is not particularly limited. For example, in order to impart high transparency, glass transition temperature, and birefringence, the organic group represented by the general formula (4) or the organic group represented by the general formula (9) is preferable. The organic group represented by the general formula (5) or the organic group represented by the general formula (7) is preferable. On the other hand, in order to impart high transparency, glass transition temperature, and appropriate flexibility, it is preferable. It is an organic group represented by the above-mentioned general formula (6), and among these, a combination of the organic groups corresponding to the desired purpose may be selected. Specifically, the repeating unit derived from ISB (isosorbide) belonging to the organic group represented by the general formula (4) and the CHDM (1) derived from the organic group represented by the general formula (6) are preferable. , 4-cyclohexanedimethanol), or a combination of SPG (spirodiol) -derived repeating units belonging to the organic group represented by the general formula (9) and the general formula (6) The organic group is a combination of repeating units derived from CHDM.

<3.7共聚合組成> <3.7 copolymerization composition>

如上所述,於使用至少含有2價之三茀、2價之二茀、及通式(3)所表示之2價之有機基作為重複單元之共聚物的情形時,只要為下述之顯現光學物性之範圍內,則亦可於上述共聚物中以任意之質量含有2價之三茀、2價之二茀、通式(3)所表示之2價之有機基。 As described above, when a copolymer containing at least a divalent trifluorene, a divalent difluorene, and a divalent organic group represented by the general formula (3) as a repeating unit is used, the following expressions are required: Within the range of optical physical properties, the above copolymer may contain a divalent trifluorene, a divalent difluorene, and a divalent organic group represented by the general formula (3) in any mass.

關於2價之三茀與2價之二茀之含有比例之總和,為了顯現反波長色散性,且保持熔融加工性或機械強度,較佳為相對於上述共聚物整體之質量為5質量%以上,更佳為10質量%以上,進而較佳為12質量%以上,尤佳為15質量%以上,又較佳為90質量%以下,更佳為80質量%以下,進而較佳為70質量%以下,尤佳為60質量%以下。 Regarding the sum of the content ratios of the trivalent trivalent and bivalent trivalent, in order to exhibit inverse wavelength dispersion and maintain melt processability or mechanical strength, it is preferable that the mass of the copolymer is 5% by mass or more. , More preferably 10% by mass or more, further preferably 12% by mass or more, particularly preferably 15% by mass or more, still more preferably 90% by mass or less, even more preferably 80% by mass or less, and still more preferably 70% by mass Hereinafter, it is particularly preferably 60% by mass or less.

又,就連同以更少量之使用獲得所需之光學特性之觀點而言,2價之三茀之含有比例相對於共聚物整體之質量,較佳為1質量%以上,更佳為3質量%以上,進而較佳為5質量%以上,尤佳為10質量% 以上,又較佳為50質量%以下,更佳為40質量%以下,進而較佳為30質量%以下。 In addition, from the viewpoint of obtaining the required optical characteristics with a smaller amount of use, the content ratio of the trivalent difluoride to the mass of the entire copolymer is preferably 1% by mass or more, and more preferably 3% by mass. Above, further preferably at least 5 mass%, particularly preferably at least 10 mass% The above is more preferably 50% by mass or less, more preferably 40% by mass or less, and still more preferably 30% by mass or less.

又,就賦予正折射率各向異性之觀點而言,關於通式(3)所表示之2價之有機基之較佳含有比例,相對於上述共聚物整體之質量,較佳為10質量%以上,更佳為20質量%以上,進而較佳為30質量%以上,尤佳為40質量%以上,又較佳為95質量%以下,更佳為90質量%以下,進而較佳為88質量%以下,尤佳為85質量%以下,最佳為80質量%以下。 From the viewpoint of imparting anisotropy to a positive refractive index, the preferable content ratio of the divalent organic group represented by the general formula (3) is preferably 10% by mass relative to the mass of the entire copolymer. Above, more preferably 20% by mass or more, further preferably 30% by mass or more, particularly preferably 40% by mass or more, still more preferably 95% by mass or less, even more preferably 90% by mass or less, and still more preferably 88% by mass % Or less, particularly preferably 85% by mass or less, and most preferably 80% by mass or less.

<3.8聚合物摻合物> <3.8 polymer blend>

本發明之樹脂組合物係含有具有2價之三茀作為重複單元之聚合物者。又,本發明之樹脂組合物除含有該聚合物以外,亦可進而含有其他成分。 The resin composition of the present invention is a polymer containing a trivalent difluoride as a repeating unit. The resin composition of the present invention may contain other components in addition to the polymer.

關於本發明之樹脂組合物,期待原因在於摻合物之其他效果之顯現,而亦可含有任意之聚合物作為其他成分。即,除具有2價之三茀作為重複單元之聚合物外,亦可使任意之聚合物一併存在。 Regarding the resin composition of the present invention, it is expected that the other effects of the blend are exhibited, and any polymer may be contained as other components. That is, in addition to a polymer having a trivalent trivalent divalent group as a repeating unit, any polymer may be present together.

此處,所謂一並存在意指於樹脂組合物中存在2種以上之聚合物,其方法並無特別限制,可列舉:將2種以上之聚合物以溶液之狀態、或熔融之狀態進行混合之方法、於包含1個以上聚合物之溶液中或熔融液中進行聚合之方法等。 Here, the term “coexistence” means that two or more kinds of polymers are present in the resin composition, and the method is not particularly limited. Examples thereof include mixing two or more kinds of polymers in a solution state or a molten state. A method, a method of polymerizing in a solution or a melt containing one or more polymers, and the like.

例如,可摻合具有通式(3)所表示之2價之有機基作為重複單元之聚合物,亦可摻合具有任意之重複單元之聚合物。再者,具有通式(3)所表示之2價之有機基作為重複單元之聚合物可為進而具有通式(3)以外之2價之有機基作為重複單元者,亦可為具有2種以上之通式(3)所表示之2價之有機基作為重複單元者。此處,作為通式(3)所表示之2價之有機基,可使用共聚物中較佳地例示者。 For example, a polymer having a divalent organic group represented by the general formula (3) as a repeating unit may be blended, and a polymer having an arbitrary repeating unit may be blended. The polymer having a divalent organic group represented by the general formula (3) as a repeating unit may be a polymer having a divalent organic group other than the general formula (3) as a repeating unit, or may have two types. The divalent organic group represented by the above general formula (3) is a repeating unit. Here, as the divalent organic group represented by the general formula (3), those exemplified in the copolymer can be preferably used.

尤其是就連同可較佳地用作相位差膜用之觀點而言,較佳為顯 現正折射率各向異性之聚合物或低聚物之摻合物或者使共聚物共存,就有光學性能良好,且可熔融製膜或溶液澆鑄製膜之傾向之方面而言,更佳為使熱塑性樹脂共存。作為共存者,具體而言,可列舉:聚縮合系聚合物、烯烴系聚合物、或加成聚合系聚合物,較佳為聚縮合系聚合物。作為聚縮合系聚合物,可列舉:聚酯、聚醯胺、聚酯碳酸酯、聚醯胺、聚醯亞胺等,其中較佳為聚酯或聚碳酸酯。 Especially from the viewpoint that it can be preferably used as a retardation film, Blends of polymers or oligomers with positive refractive index anisotropy or co-existence of copolymers have a good optical performance and are more likely to be melt-formed or solution-casted. Coexist a thermoplastic resin. Specific examples of the coexistent polymers include polycondensation polymers, olefin polymers, and addition polymerization polymers, and polycondensation polymers are preferred. Examples of the polycondensation polymer include polyester, polyamide, polyester carbonate, polyamide, and polyimide. Among them, polyester or polycarbonate is preferred.

更具體而言,可列舉:聚乙烯、聚丙烯等烯烴系聚合物;雙酚A或雙酚Z、具有源自異山梨酯等之結構單元之聚碳酸酯;聚對苯二甲酸乙二酯、聚對苯二甲酸丁二酯、聚萘二甲酸酯、聚二甲酸環己烷二亞甲基酯、聚對苯二甲酸環己烷二亞甲基酯等聚酯等,亦可併用該等中2種以上之聚合物。 More specifically, olefin-based polymers such as polyethylene and polypropylene; bisphenol A or bisphenol Z, polycarbonate having a structural unit derived from isosorbide, and the like; polyethylene terephthalate , Polyesters such as polybutylene terephthalate, polynaphthalate, polycyclohexane dimethylene dicarboxylate, polycyclohexane dimethylene terephthalate, etc., can also be used in combination Two or more of these polymers.

於將本發明之樹脂組合物進行膜成形之情形時,較佳為膜為光學透明,因此,所摻合之聚合物較佳為選擇折射率與具有2價之三茀作為重複單元之聚合物接近者,或具有相溶性之組合。 When the resin composition of the present invention is formed into a film, the film is preferably optically transparent. Therefore, the polymer to be blended is preferably a polymer having a refractive index and a trivalent divalent trivalent polymer as a repeating unit. Closer, or a combination with compatibility.

<3.9樹脂組合物之組成> <3.9 Composition of Resin Composition>

就連同顯現反波長色散性,且保持熔融加工性或機械強度之觀點而言,關於樹脂組合物中之2價之三茀及2價之二茀之含有比例之總和,相對於樹脂組合物整體之質量,較佳為5質量%以上,更佳為10質量%以上,進而較佳為12質量%以上,尤佳為15質量%以上,最佳為20質量%以上,又較佳為90質量%以下,更佳為80質量%以下,進而較佳為70質量%以下,尤佳為60質量%以下。又,就相同之觀點而言,關於通式(3)所表示之2價之有機基之較佳含有比例,相對於樹脂組合物整體之質量,較佳為10質量%以上,更佳為20質量%以上,進而較佳為30質量%以上,尤佳為40質量%以上,又較佳為95質量%以下,更佳為90質量%以下,進而較佳為88質量%以下,尤佳為85質量%以下,最佳為80質量%以下。 From the viewpoint of showing inverse wavelength dispersion and maintaining melt processability or mechanical strength, the sum of the content ratios of the trivalent divalent and divalent bivalent in the resin composition is relative to the entire resin composition. The mass is preferably 5 mass% or more, more preferably 10 mass% or more, still more preferably 12 mass% or more, particularly preferably 15 mass% or more, most preferably 20 mass% or more, and more preferably 90 mass. % Or less, more preferably 80% by mass or less, still more preferably 70% by mass or less, even more preferably 60% by mass or less. From the same viewpoint, the preferred content ratio of the divalent organic group represented by the general formula (3) is preferably 10% by mass or more, more preferably 20% with respect to the mass of the entire resin composition. More than mass%, more preferably 30 mass% or more, particularly preferably 40 mass% or more, still more preferably 95 mass% or less, more preferably 90 mass% or less, still more preferably 88 mass% or less, particularly preferably 85 mass% or less, and most preferably 80 mass% or less.

又,本發明之樹脂組合物亦可包含2種以上之上述通式(3)所表示之2價之有機基,例如於組合使用源自ISB(異山梨酯)之重複單元與源自CHDM(1,4-環己烷二甲醇)之重複單元的情形時,其含有比例並無特別限定,就較高之玻璃轉移溫度與雙折射、吸水率之觀點而言,以源自ISB之重複單元相對於樹脂組合物之莫耳分率計,較佳為20質量%以上,更佳為30質量%以上,進而較佳為40質量%以上,又較佳為95質量%以下,更佳為90質量%以下,進而較佳為80質量%以下。 In addition, the resin composition of the present invention may contain two or more kinds of divalent organic groups represented by the above-mentioned general formula (3). For example, a repeating unit derived from ISB (isosorbide) and a source derived from CHDM ( In the case of a repeating unit of 1,4-cyclohexanedimethanol, the content ratio is not particularly limited. From the viewpoint of higher glass transition temperature, birefringence, and water absorption, the repeating unit derived from ISB Relative to the molar fraction of the resin composition, it is preferably 20% by mass or more, more preferably 30% by mass or more, still more preferably 40% by mass or more, still more preferably 95% by mass or less, and even more preferably 90% by mass. Mass% or less, and more preferably 80 mass% or less.

又,於組合使用源自ISB之重複單元與源自CHDM之重複單元之情形時,該等含有比例並無特別限定,就柔軟性之觀點而言,以源自CHDM之重複單元相對於樹脂組合物之莫耳分率計,較佳為5質量%以上,更佳為10質量%以上,進而較佳為15質量%以上,又較佳為60質量%以下,更佳為50質量%以下,進而較佳為40質量%以下。 When the repeating unit derived from ISB and the repeating unit derived from CHDM are used in combination, the content ratio is not particularly limited. From the viewpoint of flexibility, the repeating unit derived from CHDM is combined with the resin. Molar fraction of the material is preferably 5 mass% or more, more preferably 10 mass% or more, still more preferably 15 mass% or more, still more preferably 60 mass% or less, and even more preferably 50 mass% or less. It is more preferably 40% by mass or less.

於組合使用源自SPG(螺二醇)之重複單元與源自CHDM之重複單元之情形時,該等含有比例並無特別限定,就較高之玻璃轉移溫度與雙折射、吸水率之觀點而言,以源自SPG之重複單元相對於樹脂組合物之莫耳分率計,較佳為30莫耳%以上,更佳為40莫耳%以上,進而較佳為50莫耳%以上,又較佳為95莫耳%以下,更佳為90莫耳%以下,進而較佳為85莫耳%以下。 When a repeating unit derived from SPG (spirodiol) and a repeating unit derived from CHDM are used in combination, these content ratios are not particularly limited. From the viewpoint of higher glass transition temperature, birefringence, and water absorption In other words, based on the molar fraction of the repeating unit derived from SPG relative to the resin composition, it is preferably 30 mol% or more, more preferably 40 mol% or more, and further preferably 50 mol% or more. It is preferably 95 mol% or less, more preferably 90 mol% or less, and still more preferably 85 mol% or less.

又,於組合使用源自SPG之重複單元與源自CHDM之重複單元之情形時,該等含有比例並無特別限定,就柔軟性之觀點而言,以源自CHDM之重複單元相對於樹脂組合物之莫耳分率計,較佳為5質量%以上,更佳為10質量%以上,進而較佳為15質量%以上,又較佳為60質量%以下,更佳為50質量%以下,進而較佳為40質量%以下。 When the repeating unit derived from SPG and the repeating unit derived from CHDM are used in combination, the content ratio is not particularly limited. From the viewpoint of flexibility, the repeating unit derived from CHDM is combined with the resin. Molar fraction of the material is preferably 5 mass% or more, more preferably 10 mass% or more, still more preferably 15 mass% or more, still more preferably 60 mass% or less, and even more preferably 50 mass% or less. It is more preferably 40% by mass or less.

<3.10物性值> <3.10 Physical property value>

本發明之樹脂組合物之物性值並無特別限定,較佳為滿足以下所例示之物性值。 The physical property value of the resin composition of the present invention is not particularly limited, and it is preferable to satisfy the physical property values exemplified below.

<3.20阿貝數> <3.20 Abbe number>

關於本發明之樹脂組合物,於假定攝像系光學透鏡等寬頻帶零雙折射材料之情形時,阿貝數較佳為35以下。因使用本發明之樹脂組合物而設計攝像系光學透鏡,較佳阿貝數較低者。因此,阿貝數進而較佳為30以下,尤佳為25以下,通常為15以上。 The resin composition of the present invention preferably has an Abbe number of 35 or less in the case of a wide-band zero birefringence material such as an imaging optical lens. The imaging optical lens is designed by using the resin composition of the present invention, and the one with a lower Abbe number is preferred. Therefore, the Abbe number is more preferably 30 or less, particularly preferably 25 or less, and usually 15 or more.

<3.21茀環之配向> <3.21 Orientation of the Ring>

關於本發明之樹脂組合物,源自茀環之配向之740cm-1之吸收之延伸方向與垂直方向之強度比較佳為1.2以上,更佳為1.3以上,進而較佳為1.4以上,又通常為2.0以下。於將本發明之樹脂組合物用作反波長色散膜用途之情形時,源自茀環之配向之740cm-1之吸收之延伸方向與垂直方向之強度比較高者有如下傾向:即便該樹脂組合物中所含有之具有茀環之重複單元之比例較少,亦顯現反波長色散性。再者,上述強度比可利用以下之方法進行測定。 Regarding the resin composition of the present invention, the strength of the stretching direction of absorption of 740 cm -1 derived from the alignment of the cymbal ring and the vertical direction is preferably 1.2 or more, more preferably 1.3 or more, further preferably 1.4 or more, and usually Below 2.0. When the resin composition of the present invention is used as an inverse-wavelength dispersion film, the strength of the stretching direction of the absorption of 740 cm -1 derived from the orientation of the ring is higher than that of the vertical direction, and the tendency is as follows: The proportion of the repeating unit with a fluorene ring contained in the substance is small, and the inverse wavelength dispersion is also exhibited. The intensity ratio can be measured by the following method.

首先,自本發明之樹脂組合物製作延伸膜而實施偏光ATR分析。於其分析結果中,源自羰基之配向之1245cm-1之吸收之延伸方向與垂直方向的強度比(2色比:延伸方向之強度/垂直方向之強度)為1.2以上,而確認主鏈向延伸方向配向。繼而,算出源自茀環之配向之740cm-1之吸收之延伸方向與垂直方向的強度比。 First, an stretched film was prepared from the resin composition of the present invention and subjected to polarized ATR analysis. In the analysis results, the intensity ratio of the extension direction of the absorption of 1245 cm -1 derived from the orientation of the carbonyl group to the vertical direction (2 color ratio: the strength of the extension direction / the strength of the vertical direction) is 1.2 or more, and the main chain direction is confirmed Extension direction alignment. Then, the intensity ratio of the extension direction of absorption of 740 cm -1 originating from the orientation of the cymbal ring to the vertical direction was calculated.

<3.22主鏈與茀所成之角度> <3.22 Angle formed by the main chain and 茀>

關於本發明之樹脂組合物,可預想於2價之三茀之特定構形(構象)未以間扭式構形為穩定構形之情形時,且反式構形之主鏈與茀環所成之角度為50°以上、較佳為60°以上、更佳為70°以上時,顯現反波長色散性。 Regarding the resin composition of the present invention, it is expected that when the specific configuration (conformation) of the divalent triad is not in a torsional configuration as a stable configuration, the main chain and transcyclic configuration of the trans configuration When the angle is 50 ° or more, preferably 60 ° or more, and more preferably 70 ° or more, the inverse wavelength dispersion property is exhibited.

2價之三茀之特定構形(構象)之能量計算及該構形中之茀環與主鏈所成之角度的計算可以下述方式算出。 The calculation of the energy of a specific configuration (conformation) of the divalent triad and the calculation of the angle formed by the tritium ring and the main chain in the configuration can be calculated in the following manner.

軟體係使用依據AM1法之美國Wave function公司製造之PC Spartan Pro 1.0.5(Windows(註冊商標)32bit版)。再者,聚焦判定值等關係到計算精度之輸入值全部使用該軟體之默認值。 The software system uses a PC manufactured by the US Wave function company in accordance with the AM1 law Spartan Pro 1.0.5 (Windows (registered trademark) 32bit version). In addition, all input values related to the calculation accuracy, such as the focus judgment value, use the software default values.

此處,關於2價之三茀,於聚碳酸酯樹脂組合物之情形時,係針對使重複單元之兩末端碳酸甲酯化而成之結構進行計算,於聚酯或聚酯碳酸酯樹脂組合物之情形時,係針對使重複單元之兩末端甲酯化而成之結構進行計算。 Here, in the case of a polycarbonate resin composition, the trivalent divalent trivalent is calculated based on a structure obtained by methylating both ends of a repeating unit, and is combined with a polyester or a polyester carbonate resin. In the case of a substance, the calculation is performed on a structure obtained by methylating both ends of the repeating unit.

使用AM1法,對存在於各單體之2條側鏈兩者為反式構形、與2種間扭式構形之構形之能量差進行計算。又,針對反式構形與間扭式構形(2種間扭式構形中穩定者),對主鏈與茀環所成之角度進行計算。 The AM1 method was used to calculate the energy difference between the two side chains present in each monomer in a trans configuration and a configuration with two intertwisted configurations. In addition, for the trans configuration and the intertwisted configuration (the stable of the two intertwisted configurations), the angle formed by the main chain and the loop is calculated.

再者,主鏈與茀環所成之角度係以下述方式決定。首先,將連接兩末端之甲基之碳原子彼此之直線設為主鏈方向,將穿過茀之3位、6位、9位之碳原子之平面設為茀平面。此時,與主鏈方向交叉之茀平面上之直線無限存在,但與主鏈方向之角度成為最小之茀平面上之直線唯一。將該角度設為主鏈與茀環所成之角度。 The angle formed by the main chain and the cymbal ring is determined in the following manner. First, the straight line connecting the carbon atoms of the methyl groups at the two ends is set to the main chain direction, and the plane passing through the carbon atoms at the 3rd, 6th, and 9th positions of 茀 is the 茀 plane. At this time, the straight line on the 茀 -plane crossing the direction of the main chain exists infinitely, but the straight line on the 茀 -plane where the angle with the direction of the main chain becomes the smallest. Let this angle be the angle formed by the main chain and the loop.

<3.23有機基之導入方法> <3.23 Introduction method of organic group>

作為向本發明之樹脂組合物導入上述通式(3)所表示之2價之有機基作為重複單元之方法,就所獲得之樹脂組合物之透明性或均勻性之觀點而言,較佳為:1.使具有三茀之二羥基化合物、與具有上述通式(3)所表示之有機基之下述式(21)所表示之二羥基化合物進行共聚合之方法;2.利用具有上述通式(3)所表示之有機基之下述式(21)所表示之二羥基化合物對三茀二酯化合物進行酯交換後,與具有上述通式(3)所表示之有機基之下述式(21)所表示之二羥基化合物進行共聚合之以2個階段導入之方法;3.使三茀二芳酯化合物、與具有上述通式(3)所表示之有機基之下 述式(21)所表示之二羥基化合物進行共聚合之方法;4.使具有三茀之二羥基化合物、具有上述通式(3)所表示之有機基之下述通式(28)所表示之二羧酸化合物、及具有上述通式(3)所表示之有機基之下述通式(21)所表示之二羥基化合物進行共聚合之方法。 As a method for introducing the divalent organic group represented by the above-mentioned general formula (3) as a repeating unit into the resin composition of the present invention, from the viewpoint of transparency or uniformity of the obtained resin composition, it is preferably : 1. A method of copolymerizing a dihydroxy compound having a trifluorene and a dihydroxy compound represented by the following formula (21) having an organic group represented by the general formula (3); 2. Using a compound having the general formula The organic group represented by the formula (3) is a dihydroxy compound represented by the following formula (21), after transesterification of the trimethyl diester compound, and the following formula having the organic group represented by the general formula (3) (21) A method for introducing a dihydroxy compound represented by (2) into a two-stage copolymerization method; (3) placing a tris (a) diaryl ester compound under an organic group having the general formula (3) A method for copolymerizing a dihydroxy compound represented by the formula (21); 4. a dihydroxy compound having a trifluorene and an organic group represented by the general formula (3) and represented by the following general formula (28) A method for copolymerizing a dicarboxylic acid compound and a dihydroxy compound represented by the following general formula (21) having an organic group represented by the general formula (3).

HO-R20-OH (21) HO-R 20 -OH (21)

HOCOR20-OOOH (28) HOCOR 20 -OOOH (28)

式(21)及式(28)中,R20係與上述通式(3)之R20相同。 In formulae (21) and (28), R 20 is the same as R 20 in the general formula (3).

此處,上述通式(3)所表示之2價之有機基可使用單一種類,亦可將不同種類之有機基組合使用。將不同之複數種有機基組合使用係藉由如下方式達成,即使用不同之複數種上述通式(21)所表示之二羥基化合物、及/或上述通式(28)所表示之二羧酸化合物。 Here, as the divalent organic group represented by the general formula (3), a single type may be used, or different types of organic groups may be used in combination. The use of a combination of different plural organic groups is achieved by using different plural kinds of dihydroxy compounds represented by the general formula (21) and / or dicarboxylic acids represented by the general formula (28). Compound.

<3.24相位差比> <3.24 phase difference ratio>

本發明之樹脂組合物於設想為相位差膜用途之情形時,於波長450nm下測得之相位差(Re450)與於波長550nm下測得之相位差(Re550)的比,即相位差比較佳為滿足下述式(20)。 When the resin composition of the present invention is intended to be used for a retardation film, the ratio of the phase difference (Re450) measured at a wavelength of 450nm to the phase difference (Re550) measured at a wavelength of 550nm, that is, the phase difference is better. To satisfy the following formula (20).

Re450/Re550≦1.0 (20) Re450 / Re550 ≦ 1.0 (20)

此處,所謂「本發明之樹脂組合物之相位差比滿足上述式(20)」意指成形為延伸膜時,於以下之測定條件下,於波長450nm下測得之相位差(Re450)與於波長550nm下測得之相位差(Re550)之比滿足上述式(20)。 Here, "the retardation ratio of the resin composition of the present invention satisfies the above-mentioned formula (20)" means that when formed into an stretched film, the retardation (Re450) and the retardation measured at a wavelength of 450 nm are measured under the following measurement conditions. The ratio of the phase difference (Re550) measured at a wavelength of 550 nm satisfies the above formula (20).

相位差比係利用如下方法進行測定。利用熱壓機對樹脂組合物加壓而製作膜。將該膜切割成特定之尺寸,進行自由端單軸延伸而製作延伸膜。使用相位差測定裝置(王子計測機器公司製造之KOBRA-WPR),對該延伸膜之於波長450nm下之相位差(Re450)與波長550nm下之相位差(Re550)進行測定。於相對於延伸方向,相位差比(Re450/Re550)滿足上述式(20)之情形時,該樹脂組合物顯現作為相位 差膜有用之波長色散性。 The phase difference ratio is measured by the following method. The resin composition was pressed with a hot press to produce a film. This film was cut into a specific size, and the free end was uniaxially stretched to produce a stretched film. The phase difference (Re450) at a wavelength of 450 nm and the phase difference (Re550) at a wavelength of 550 nm of this stretched film were measured using a phase difference measuring device (KOBRA-WPR manufactured by Oji Measurement Co., Ltd.). When the phase difference ratio (Re450 / Re550) with respect to the extension direction satisfies the above formula (20), the resin composition appears as a phase Differential films have useful wavelength dispersion.

本發明之樹脂組合物於設想相位差膜中反波長色散膜用途之情形時,相位差比(Re450/Re550)之上限較佳為1.0以下,更佳為未達1.0,進而較佳為0.95以下,進而更佳為0.93以下,尤佳為0.91以下。又,相位差比(Re450/Re550)之下限較佳為0以上,更佳為0.50以上,進而較佳超過0.50,進而更佳為0.70以上,尤佳為0.75以上,最佳為0.80以上。 When the use of the inverse wavelength dispersion film in the retardation film of the resin composition of the present invention is assumed, the upper limit of the retardation ratio (Re450 / Re550) is preferably 1.0 or less, more preferably less than 1.0, and still more preferably 0.95 or less. It is more preferably 0.93 or less, and even more preferably 0.91 or less. The lower limit of the phase difference ratio (Re450 / Re550) is preferably 0 or more, more preferably 0.50 or more, still more preferably 0.50 or more, still more preferably 0.70 or more, particularly preferably 0.75 or more, and most preferably 0.80 or more.

若相位差比(Re450/Re550)之值為上述範圍內,則波長越長,越顯現相位差,而可於可見區域之各波長下獲得理想之相位差特性。例如,使用由具有此種波長色散性之本發明之樹脂組合物獲得之相位差膜作為使向相互垂直之方向振動之偏光之位相進行1/4波長(90°)變化的1/4λ板,使其與偏光板進行貼合,藉此可製作圓偏光板等,而可實現於全部波長下具有外界光反射防止功能之黑色性優異之圓偏光板及圖像顯示裝置。另一方面,於相位差比(Re450/Re550)之值為上述範圍外之情形時,有如下傾向:由波長引起之褪色變大,而圓偏光板或圖像顯示裝置產生著色之問題。 If the value of the phase difference ratio (Re450 / Re550) is within the above range, the longer the wavelength, the more the phase difference will appear, and the ideal phase difference characteristic can be obtained at each wavelength in the visible region. For example, using a retardation film obtained from the resin composition of the present invention having such a wavelength dispersion property as a 1 / 4λ plate that changes the phase of polarized light that vibrates in directions perpendicular to each other by a 1/4 wavelength (90 °), By attaching it to a polarizing plate, a circular polarizing plate and the like can be produced, and a circular polarizing plate and an image display device having excellent blackness with the function of preventing external light reflection at all wavelengths can be realized. On the other hand, when the value of the phase difference ratio (Re450 / Re550) is out of the above range, there is a tendency that the discoloration caused by the wavelength becomes large, and the circular polarizing plate or the image display device has a coloring problem.

《發明3》 "Invention 3"

以下,對本發明3之寡聚茀、包含其之寡聚茀組合物、以及使用該寡聚茀而獲得之樹脂組合物進行詳述。 Hereinafter, the oligomeric fluorene of this invention 3, the oligomeric fluorene composition containing the same, and the resin composition obtained using this oligomeric fluorene are described in detail.

再者,以下所記載之(通)式(1)~(5)、(4-1)、(2a)、(2b)、(2c-1)、(2c-2)、(2d)、(7)~(9)、(11)、(A)、(A-1)、(B)係對本發明3中之各結構進行說明者。 In addition, the following general formulae (1) to (5), (4-1), (2a), (2b), (2c-1), (2c-2), (2d), ( 7) to (9), (11), (A), (A-1), and (B) are explanations of each structure in the present invention 3.

<1具有1個反應性官能基之寡聚茀化合物A1> <1 Oligomeric amidine compound A1 having one reactive functional group>

本發明之具有1個反應性官能基之寡聚茀(以下,有略記為「寡聚茀A1」之情形)包含寡聚茀結構單元a,其係可具有取代基之2個以上之茀單元a之9位之碳原子彼此經由可具有取代基之伸烷基、可具有取 代基之伸芳基、或可具有取代基之伸芳烷基而鏈狀地鍵結而成,且於該寡聚茀結構單元a中之任一末端之茀單元a之9位之碳原子具有下述式(A)所表示之反應性官能基,於另一端之茀單元a之9位之碳原子具有氫原子。 The oligomeric fluorene having one reactive functional group in the present invention (hereinafter referred to as "oligomeric fluorene A1") includes an oligomeric fluorene structural unit a, which is a fluorene unit having two or more substituents. The carbon atoms at position 9 of a each have an alkyl group which may have a substituent, A carbon atom at position 9 of the fluorene unit a at any terminal of the oligomeric fluorene structural unit a It has a reactive functional group represented by the following formula (A), and the carbon atom at the 9-position of the fluorene unit a at the other end has a hydrogen atom.

式(A)中,Ra~Rc分別獨立為氫原子、可經取代之碳數1~10之烷基、可經取代之碳數4~10之芳基或可經取代之碳數6~10之芳烷基,X為酯基、醯胺基、羧基、氰基、或硝基。*為與茀單元a之9位之碳原子之鍵結鍵。 In formula (A), R a to R c are each independently a hydrogen atom, an alkyl group having 1 to 10 carbon atoms that can be substituted, an aryl group having 4 to 10 carbon atoms that can be substituted, or 6 carbon atoms that can be substituted Aralkyl of ~ 10, X is ester, amido, carboxy, cyano, or nitro. * Is a bond to a carbon atom at position 9 of the a unit of fluorene.

如上所述,可藉由將反應性官能基設為特定結構而可工業性地獲得,進而可較佳地用作光學用途之樹脂組合物之單體之原料。 As described above, it can be obtained industrially by setting the reactive functional group to a specific structure, and it can be preferably used as a raw material for a monomer of a resin composition for optical applications.

<1.1伸烷基、伸芳基、伸芳烷基> <1.1 alkylene, alkylene, alkylene>

係與上述《發明2》之<1.1伸烷基、伸芳基、伸芳烷基>之項中所說明者相同。 It is the same as that described in the item "1.1 Alkenyl, Aryl, and Arylalkyl" in "Invention 2" above.

<1.2茀單元a可具有之取代基> <1.2 The substituent which the unit a may have>

係與上述《發明2》之<1.2茀單元a可具有之取代基>之項中所說明者相同。 It is the same as that described in the item "Substituents which the 1.2" unit a may have in the "Invention 2" above.

<1.3反應性官能基> <1.3 reactive functional group>

本發明之寡聚茀A1係於任一末端之茀單元a之9位之碳原子具有下述式(A)所表示之反應性官能基。所謂反應性官能基,不僅可為可直接用於聚合反應之基,亦可為經轉化反應而可用於聚合反應之基。 The oligomeric fluorene A1 of the present invention has a carbon atom at the 9-position of the fluorene unit a at either end having a reactive functional group represented by the following formula (A). The so-called reactive functional group is not only a group that can be used directly in a polymerization reaction, but also a group that can be used in a polymerization reaction after a conversion reaction.

[化85] [Chemical 85]

式(A)中,Ra~Rc分別獨立為氫原子、可經取代之碳數1~10之烷基、可經取代之碳數4~10之芳基或可經取代之碳數6~10之芳烷基,X為酯基、醯胺基、羧基、氰基、或硝基。*為與茀單元a之9位之碳原子之鍵結鍵。 In formula (A), R a to R c are each independently a hydrogen atom, an alkyl group having 1 to 10 carbon atoms that can be substituted, an aryl group having 4 to 10 carbon atoms that can be substituted, or 6 carbon atoms that can be substituted Aralkyl of ~ 10, X is ester, amido, carboxy, cyano, or nitro. * Is a bond to a carbon atom at position 9 of the a unit of fluorene.

上述Ra~Rc中,「可經取代之碳數1~10之烷基」之具體結構係於以下進行列舉,並不限定於該等,可列舉:甲基、乙基、正丙基、正丁基、正戊基、正己基、正癸基等直鏈狀之烷基;異丙基、2-甲基丙基、2,2-二甲基丙基、2-乙基己基等包含側鏈之烷基;環丙基、環戊基、環己基、環辛基等環狀之烷基。 R a ~ R c above, the specific structure "may be substituted with the alkyl group having 1 to 10 carbon atoms The" within the system listed below is not limited to these, include: methyl, ethyl, n-propyl Straight-chain alkyl groups such as n-butyl, n-pentyl, n-hexyl, n-decyl; isopropyl, 2-methylpropyl, 2,2-dimethylpropyl, 2-ethylhexyl, etc. Including side chain alkyl groups; cyclic alkyl groups such as cyclopropyl, cyclopentyl, cyclohexyl, cyclooctyl and the like.

可經取代之碳數1~10之烷基中之碳數較佳為4以下,又更佳為2以上。若為該範圍內,則有反應性官能基之導入容易之傾向。 The number of carbon atoms in the alkyl group having 1 to 10 carbon atoms which may be substituted is preferably 4 or less, and more preferably 2 or more. If it is in this range, introduction of a reactive functional group tends to be easy.

作為該烷基可具有之取代基,可列舉:鹵素原子(例如,氟原子、氯原子、溴原子、碘原子);碳數1~10之烷氧基(例如,甲氧基、乙氧基等);碳數1~10之醯基(例如,乙醯基、苯甲醯基等);碳數1~10之醯胺基(例如,乙醯胺基、苯甲醯胺基等);硝基;氰基;可具有選自鹵素原子(例如,氟原子、氯原子、溴原子、碘原子)、碳數1~10之烷基(例如,甲基、乙基、異丙基等)、碳數1~10之烷氧基(例如,甲氧基、乙氧基等)、碳數1~10之醯基(例如,乙醯基、苯甲醯基等)、碳數1~10之醯胺基(例如,乙醯胺基、苯甲醯基醯胺基等)、硝基、氰基等之1~3個取代基之碳數6~10之芳基(例如,苯基、萘基等)等。該等取代基之數量並無特別限定,較佳為1~3個。於取代基為2個以上之情形時,取代基之種類可相同亦可不同。又,就連同工業上可廉價地製造之觀點而言,較佳為未經取代。 Examples of the substituent that the alkyl group may have include a halogen atom (for example, a fluorine atom, a chlorine atom, a bromine atom, and an iodine atom); and an alkoxy group (for example, a methoxy group, an ethoxy group) having 1 to 10 carbon atoms. Etc.); fluorenyl groups having 1 to 10 carbon atoms (for example, acetofluorenyl, benzamidine, etc.); fluorenyl groups having 1 to 10 carbon atoms (for example, acetamido, benzamidine, etc.); Nitro; cyano; may have a halogen atom (for example, fluorine atom, chlorine atom, bromine atom, iodine atom), an alkyl group having 1 to 10 carbon atoms (for example, methyl, ethyl, isopropyl, etc.) , Alkoxy groups with 1 to 10 carbon atoms (for example, methoxy, ethoxy, etc.), fluorenyl groups with 1 to 10 carbon atoms (for example, ethyl fluorenyl, benzyl fluorenyl, etc.), carbon numbers 1 to 10 Sulfonylamino (for example, ethynylamine, benzamidine, fluorenylamino, etc.), nitro, cyano, etc. 1 to 3 substituents and 6 to 10 carbon atoms (for example, phenyl, Naphthyl, etc.). The number of these substituents is not particularly limited, but is preferably 1 to 3. When there are two or more substituents, the kinds of the substituents may be the same or different. Moreover, it is preferable that it is unsubstituted in view of the fact that it can be manufactured inexpensively industrially.

作為經取代之烷基之具體例,可列舉:三氟甲基、苄基、4-甲氧基苄基、甲氧基甲基等。 Specific examples of the substituted alkyl group include trifluoromethyl, benzyl, 4-methoxybenzyl, and methoxymethyl.

上述Ra~Rc中,「可經取代之碳數4~10之芳基」之具體結構係於以下進行列舉,並不限定於該等,可列舉:苯基、1-萘基、2-萘基等芳基;2-吡啶基、2-噻吩基、2-呋喃基等雜芳基。 R a ~ R c above, the "aryl group may be substituted with the carbon atoms of 4 to 10" in the system configuration will be specifically enumerated below, not limited to these, include: phenyl, 1-naphthyl, 2 -Aryl groups such as naphthyl; heteroaryl groups such as 2-pyridyl, 2-thienyl, 2-furyl.

可經取代之碳數4~10之芳基中之碳數較佳為8以下,更佳為7以下,又較佳為4以上,更佳為5以上。若為該範圍內,則有反應性官能基之導入變容易之傾向。 The number of carbon atoms in the aryl group having 4 to 10 carbon atoms that can be substituted is preferably 8 or less, more preferably 7 or less, still more preferably 4 or more, and even more preferably 5 or more. If it exists in this range, introduction of a reactive functional group will become easy.

作為該芳基可具有之取代基,可列舉:鹵素原子(例如,氟原子、氯原子、溴原子、碘原子);碳數1~10之烷基(例如,甲基、乙基、異丙基等);碳數1~10之烷氧基(例如,甲氧基、乙氧基等);碳數1~10之醯基(例如,乙醯基、苯甲醯基等);碳數1~10之醯胺基(例如,乙醯胺基、苯甲醯胺基等);硝基;氰基等。該等取代基之數量並無特別限定,較佳為1~3個。於取代基為2個以上之情形時,取代基之種類可相同亦可不同。又,就連同工業上可廉價地製造之觀點而言,較佳為未經取代。 Examples of the substituent which the aryl group may have include a halogen atom (for example, a fluorine atom, a chlorine atom, a bromine atom, and an iodine atom); and an alkyl group having 1 to 10 carbon atoms (for example, methyl, ethyl, and isopropyl) Alkoxy groups (e.g., methoxy, ethoxy, etc.) having 1 to 10 carbon atoms; fluorenyl groups (e.g., ethenyl, benzyl, etc.) having 1 to 10 carbon atoms; carbon number 1 to 10 amido groups (for example, acetamido, benzamido, etc.); nitro; cyano and the like. The number of these substituents is not particularly limited, but is preferably 1 to 3. When there are two or more substituents, the kinds of the substituents may be the same or different. Moreover, it is preferable that it is unsubstituted in view of the fact that it can be manufactured inexpensively industrially.

作為經取代之芳基之具體例,可列舉:2-甲基苯基、4-甲基苯基、4-氯苯基、3,5-二甲基苯基、4-苯甲醯基苯基、4-甲氧基苯基、4-硝基苯基、4-氰基苯基、3-三氟甲基苯基、3,4-二甲氧基苯基、3,4-亞甲基二氧基苯基、2,3,4,5,6-五氟苯基、4-甲基呋喃基等。 Specific examples of the substituted aryl group include 2-methylphenyl, 4-methylphenyl, 4-chlorophenyl, 3,5-dimethylphenyl, and 4-benzylphenylbenzene. Methyl, 4-methoxyphenyl, 4-nitrophenyl, 4-cyanophenyl, 3-trifluoromethylphenyl, 3,4-dimethoxyphenyl, 3,4-methylene Dioxyphenyl, 2,3,4,5,6-pentafluorophenyl, 4-methylfuryl and the like.

上述Ra~Rc中「可經取代之碳數6~10之芳烷基」之具體結構係於以下進行列舉,並不限定於該等,可列舉:苄基、2-苯基乙基、對甲氧基苄基等。 The specific structure of the "aralkyl group having 6 to 10 carbon atoms which may be substituted" in the above R a to R c is listed below and is not limited thereto. Examples include: benzyl, 2-phenylethyl , P-methoxybenzyl and the like.

可經取代之碳數6~10之芳烷基中之碳數較佳為9以下,更佳為8以下,又較佳為6以上,更佳為7以上。若為該範圍內,則有反應性官能基之導入變容易之傾向。 The number of carbon atoms in the aralkyl group having 6 to 10 carbon atoms that can be substituted is preferably 9 or less, more preferably 8 or less, still more preferably 6 or more, and even more preferably 7 or more. If it exists in this range, introduction of a reactive functional group will become easy.

作為該芳烷基可具有之取代基,可列舉:鹵素原子(例如,氟原子、氯原子、溴原子、碘原子);碳數1~10之烷基(例如,甲基、乙基、異丙基等);碳數1~10之烷氧基(例如,甲氧基、乙氧基等);碳數1~10之醯基(例如,乙醯基、苯甲醯基等);碳數1~10之醯胺基(例如,乙醯胺基、苯甲醯胺基等);硝基;氰基等。該等取代基之數量並無特別限定,較佳為1~3個。於取代基為2個以上之情形時,取代基之種類可相同亦可不同。又,就連同工業上可廉價地製造之觀點而言,較佳為未經取代。 Examples of the substituent that the aralkyl group may have include a halogen atom (for example, a fluorine atom, a chlorine atom, a bromine atom, and an iodine atom); and an alkyl group having 1 to 10 carbon atoms (for example, methyl, ethyl, iso Propyl, etc.); alkoxy groups (e.g., methoxy, ethoxy, etc.) having 1 to 10 carbon atoms; fluorenyl groups (e.g., ethenyl, benzamidine, etc.) having 1 to 10 carbon atoms; carbon 1 to 10 fluorenylamino groups (for example, acetamido, benzamidine, etc.); nitro; cyano and the like. The number of these substituents is not particularly limited, but is preferably 1 to 3. When there are two or more substituents, the kinds of the substituents may be the same or different. Moreover, it is preferable that it is unsubstituted in view of the fact that it can be manufactured inexpensively industrially.

作為經取代之芳烷基之具體例,可列舉:苄基、2-苯基乙基、對甲氧基苄基等。 Specific examples of the substituted aralkyl group include benzyl, 2-phenylethyl, and p-methoxybenzyl.

該等中,就有反應性官能基之導入變容易之傾向之方面而言,較佳為Ra及Rb為氫原子之下述通式(A-1)。進而,就工業上可廉價地獲取原料之觀點而言,Rc較佳為氫原子、或甲基,更佳為氫原子。 Among these, from the viewpoint that the introduction of a reactive functional group tends to be facilitated, the following general formula (A-1) in which R a and R b are hydrogen atoms is preferred. Furthermore, from a viewpoint that a raw material can be obtained cheaply industrially, R c is preferably a hydrogen atom or a methyl group, and more preferably a hydrogen atom.

又,X中「酯基」之具體結構並無特別限定,例如可列舉:末端基為碳數1~10之有機取代基之酯基。 The specific structure of the "ester group" in X is not particularly limited, and examples thereof include ester groups in which the terminal group is an organic substituent having 1 to 10 carbon atoms.

碳數1~10之有機取代基之具體例係於以下進行列舉,並不限定於該等,可列舉:甲基、乙基、正丙基、正丁基、正戊基、正己基、正癸基等直鏈狀之烷基;異丙基、2-甲基丙基、2,2-二甲基丙基、2-乙基己基等包含側鏈之烷基;環丙基、環戊基、環己基、環辛基等環狀之烷基;苯基、1-萘基、2-萘基等芳基;2-吡啶基、2-噻吩基、2-呋喃基等雜芳基;苄基、2-苯基乙基、對甲氧基苄基等芳烷基等。 Specific examples of the organic substituent having 1 to 10 carbon atoms are listed below and are not limited thereto. Examples include methyl, ethyl, n-propyl, n-butyl, n-pentyl, n-hexyl, and n- Linear alkyl groups such as decyl; isopropyl, 2-methylpropyl, 2,2-dimethylpropyl, 2-ethylhexyl and other alkyl groups containing side chains; cyclopropyl, cyclopentyl Cyclic alkyl groups such as alkyl, cyclohexyl, cyclooctyl; aryl groups such as phenyl, 1-naphthyl, 2-naphthyl; heteroaryl groups such as 2-pyridyl, 2-thienyl, 2-furyl; Aralkyl groups such as benzyl, 2-phenylethyl, and p-methoxybenzyl, and the like.

該等中,就連同工業上可廉價地獲取之觀點而言,較佳為碳數1 ~6之烷基。於該情形時,就連同於合成中容易水解而容易產生羧酸之觀點而言,碳數較佳為2以上,又,就藉由將與二羥基化合物之酯交換中所產生之低沸點之醇去除而可有效率地合成聚酯及聚酯碳酸酯之觀點而言,碳數較佳為4以下,更佳為2以下。尤佳之取代基為乙基。 Among these, in view of industrial availability, the carbon number is preferably 1 ~ 6 alkyl. In this case, the carbon number is preferably 2 or more from the viewpoint of being easily hydrolyzed in the synthesis to easily generate a carboxylic acid, and the low-boiling point produced by transesterification with a dihydroxy compound is preferred. From the viewpoint that alcohols can be removed and polyesters and polyester carbonates can be efficiently synthesized, the number of carbons is preferably 4 or less, and more preferably 2 or less. A particularly preferred substituent is ethyl.

另一方面,於碳數6~8之芳基之情形時,酯交換反應容易進行,因此可藉由將芳基酯化合物與二羥基化合物、碳酸二酯一次性添加於反應器中,而於第1階段合成作為較佳之聚合物之聚酯碳酸酯,故而較佳。尤其是分子量較小,於聚酯碳酸酯合成後可作為苯酚蒸餾去除之苯基尤佳。又,於芳基之情形時,就聚合時之反應性之觀點而言,較佳為使用下述之碳酸二芳酯類作為碳酸二酯,就連同可容易地去除副產物之觀點而言,更佳為酯基中之芳基、與碳酸二芳酯類中之芳基相同。 On the other hand, in the case of an aryl group having 6 to 8 carbon atoms, the transesterification reaction easily proceeds. Therefore, the aryl ester compound, the dihydroxy compound, and the carbonic acid diester can be added to the reactor at one time, and the In the first stage, polyester carbonate, which is a preferable polymer, is synthesized, and therefore, it is preferable. In particular, the molecular weight is relatively small, and the phenyl group which can be distilled off as phenol after the synthesis of polyester carbonate is particularly preferable. In the case of an aryl group, from the viewpoint of reactivity at the time of polymerization, it is preferable to use the following diaryl carbonates as the carbonic acid diester, and from the viewpoint of easily removing by-products, More preferably, the aryl group in the ester group is the same as the aryl group in the diaryl carbonates.

又,酯基可藉由還原而轉換為作為聚碳酸酯或聚酯之原料有用之醇。 In addition, the ester group can be converted into an alcohol useful as a raw material of polycarbonate or polyester by reduction.

X中「醯胺基」之具體結構並無特別限定,例如可列舉:(i)於氮原子具有2個氫原子之一級醯胺基、(ii)於氮原子具有氫原子與碳數1~10之有機取代基之二級醯胺基、(iii)於氮原子分別獨立地具有2個碳數1~10之有機取代基之三級醯胺基。作為碳數1~10之有機取代基,可較佳地使用作為「酯基」中之碳數1~10之有機取代基所例示者。 The specific structure of the "fluorenylamino group" in X is not particularly limited, and examples include: (i) a fluorenylamino group having two hydrogen atoms at the nitrogen atom, and (ii) a hydrogen atom and a carbon number of 1 to the nitrogen atom. A secondary amido group of the organic substituent of 10, and (iii) a tertiary amido group having two organic substituents having 1 to 10 carbon atoms independently at the nitrogen atom. As the organic substituent having 1 to 10 carbon atoms, those exemplified as the organic substituent having 1 to 10 carbon atoms in the "ester group" can be preferably used.

醯胺基可藉由進行還原而成為「胺基」而製成聚醯胺或聚醯亞胺之原料。該等中,就還原容易,且還原後之胺基之反應性之觀點而言,較佳為一級醯胺基、及二級醯胺基,更佳為一級醯胺基。 The amido group can be reduced to become an "amine group" and made into a raw material of polyamido or polyimide. Among these, from the standpoint of ease of reduction and the reactivity of the amine group after reduction, a primary fluorene amino group and a secondary fluorene amino group are preferred, and a primary fluorene amino group is more preferred.

作為X,就連同可直接用作聚酯或聚酯碳酸酯之原料之觀點而言,該等中,較佳為酯基或羧基,更佳為甲基酯基、乙基酯基、苯基 酯基或羧基。 As X, from the viewpoint of being directly usable as a raw material of polyester or polyester carbonate, among these, an ester group or a carboxyl group is preferred, and a methyl ester group, an ethyl ester group, and a phenyl group are more preferred. Ester or carboxyl.

<1.4具體之結構> <1.4 Specific Structure>

作為本發明之寡聚茀A1,具體而言,可較佳地使用下述通式(1)所表示者。 As the oligomeric fluorene A1 of the present invention, specifically, those represented by the following general formula (1) can be preferably used.

式(1)中,R3分別獨立為直接鍵、或可具有取代基之碳數1~4之伸烷基。 In the formula (1), R 3 is independently a direct bond or an alkylene group having 1 to 4 carbon atoms which may have a substituent.

R4~R9分別獨立為氫原子、可具有取代基之碳數1~10之烷基、可具有取代基之碳數4~10之芳基、可具有取代基之碳數1~10之醯基、可具有取代基之碳數1~10之醯氧基、可具有取代基之碳數1~10之烷氧基、可具有取代基之碳數1~10之芳氧基、可具有取代基之胺基、可具有取代基之碳數1~10之乙烯基、可具有取代基之碳數1~10之乙炔基、具有取代基之硫原子、具有取代基之矽原子、鹵素原子、硝基、或氰基。其中,R4~R9中鄰接之至少2個基亦可相互鍵結而形成環。 R 4 to R 9 are each independently a hydrogen atom, an alkyl group having 1 to 10 carbons that may have a substituent, an aryl group having 4 to 10 carbons that may have a substituent, and 1 to 10 carbons that may have a substituent Fluorenyl group, fluorenyloxy group having 1 to 10 carbon atoms which may have a substituent, alkoxyl group having 1 to 10 carbon atoms which may have a substituent, aryloxy group having 1 to 10 carbon atoms which may have a substituent, may have Substituent amino group, vinyl group having 1 to 10 carbon atoms which may have a substituent, ethynyl group having 1 to 10 carbon atoms which may have a substituent, sulfur atom having a substituent, silicon atom having a substituent, halogen atom , Nitro, or cyano. Among them, at least two adjacent groups in R 4 to R 9 may be bonded to each other to form a ring.

Ra~Rc分別獨立為氫原子、可經取代之碳數1~10之烷基、可經取代之碳數4~10之芳基或可經取代之碳數6~10之芳烷基,X為酯基、醯胺基、羧基、氰基、或硝基。 R a to R c are each independently a hydrogen atom, an alkyl group having 1 to 10 carbon atoms which can be substituted, an aryl group having 4 to 10 carbon atoms which can be substituted or an aralkyl group having 6 to 10 carbon atoms which can be substituted X is an ester group, amidino group, a carboxyl group, a cyano group, or a nitro group.

n表示1~5之整數值。 n represents an integer value from 1 to 5.

上述式(1)中,作為R3及R4~R9,可較佳地使用於上述之《發明1》之該等基中所例示者。 In the above formula (1), R 3 and R 4 to R 9 can be preferably used as exemplified in the bases of the above-mentioned "Invention 1".

<1.5具有1個反應性官能基之寡聚茀A1之具體例> <1.5 Specific examples of oligomeric fluorene A1 having one reactive functional group>

作為本發明之寡聚茀A1之具體例,可列舉:如下述[E]群所示之結構。 Specific examples of the oligomeric fluorene A1 of the present invention include a structure shown in the following [E] group.

[化89] [Chem 89]

<1.6具有1個反應性官能基之寡聚茀A1之物性> <1.6 Physical properties of oligomeric fluorene A1 having one reactive functional group>

本發明之寡聚茀A1之物性值並無特別限定,較佳為滿足以下所例示之物性值者。 The physical property value of the oligomeric fluorene A1 of the present invention is not particularly limited, and it is preferably one that satisfies the physical property values exemplified below.

關於本發明之寡聚茀A1中之氯含有比例,以Cl換算質量計較佳為100質量ppm以下。進而較佳為10質量ppm以下。於氯成分之含有比例較多之情形時,有如下可能性:於獲得寡聚茀A1作為原料之單體中亦大量地含有氯成分,而使聚合反應所使用之觸媒去活化,從而聚合不再進行至所需分子量,或者反應變得不穩定而生產性變差。又有 如下之虞:氯成分亦殘留於所獲得之聚合物中,而使聚合物之熱穩定性降低。 Regarding the chlorine content ratio in the oligomeric fluorene A1 of the present invention, it is preferably 100 mass ppm or less in terms of Cl conversion mass. It is more preferably 10 mass ppm or less. When the content of the chlorine component is large, there is a possibility that the monomer containing the oligomeric fluorene A1 as a raw material also contains a large amount of the chlorine component, and the catalyst used in the polymerization reaction is deactivated, thereby polymerizing. It no longer progresses to the desired molecular weight, or the reaction becomes unstable and the productivity deteriorates. Again There is a concern that the chlorine component also remains in the obtained polymer, thereby reducing the thermal stability of the polymer.

於本發明之寡聚茀A1中,有含有源自於鹼存在下使茀類與甲醛類作用而進行交聯反應之步驟之鈉或鉀等長週期型週期表第1族金屬或鈣等第2族金屬之可能性,該等之含有比例較佳為500質量ppm以下,更佳為200質量ppm以下,進而較佳為50質量ppm以下,尤佳為10質量ppm以下。若金屬成分較多,則有於獲得寡聚茀A1作為原料之單體中亦大量地含有金屬成分,而於聚合反應或對樹脂進行加工時,聚合物變得容易著色之擔憂。又,亦有所含有之金屬成分顯現觸媒作用或觸媒去活化作用,而聚合變得不穩定之虞。 In the oligomeric fluorene A1 of the present invention, there is a long-period type periodic table Group 1 metal such as sodium or calcium, which contains a step derived from the step of reacting fluorenes with formaldehydes in the presence of a base, such as sodium or potassium. The possibility of Group 2 metals is preferably 500 mass ppm or less, more preferably 200 mass ppm or less, still more preferably 50 mass ppm or less, and even more preferably 10 mass ppm or less. If there are many metal components, the monomer may be contained in a large amount in the monomer obtained as oligomeric fluorene A1, and the polymer may be easily colored during polymerization or processing of the resin. In addition, there is a possibility that the contained metal component exhibits a catalyst effect or a catalyst deactivation effect, and polymerization becomes unstable.

於本發明之寡聚茀A1、尤其是寡聚茀單芳基酯中,有含有源自於酯交換反應觸媒存在下使碳酸二芳酯類作用而進行酯交換之步驟之鈦、銅、鐵等過渡金屬、或者鈉、鉀等長週期型週期表第1族、或者鎂、鈣等第2族金屬、或者鋅或鎘等第12族金屬、或者錫等第14族金屬之可能性,該等之含有比例較佳為500質量ppm以下,更佳為200質量ppm以下,進而較佳為50質量ppm以下,尤佳為10質量ppm以下。若金屬成分較多,則有於獲得寡聚茀作為原料之單體中亦大量地含有金屬成分,而於聚合反應或對樹脂進行加工時,聚合物變得容易著色之擔憂。又,亦有所含有之金屬成分顯示觸媒作用或觸媒去活化作用,而聚合變得不穩定之虞。 In the oligomeric fluorene A1, especially oligomeric fluorene monoaryl esters of the present invention, there are titanium, copper, and titanium which contain a step derived from the transesterification by the action of a diaryl carbonate in the presence of a transesterification reaction catalyst. The possibility of transition metals such as iron, or Group 1 of the long-period periodic table such as sodium or potassium, or Group 2 metals such as magnesium and calcium, or Group 12 metals such as zinc or cadmium, or Group 14 metals such as tin, The content ratio of these is preferably 500 mass ppm or less, more preferably 200 mass ppm or less, still more preferably 50 mass ppm or less, and even more preferably 10 mass ppm or less. If there are many metal components, there may be a large amount of metal components contained in the monomer obtained as an oligomeric fluorene, and the polymer may be likely to be colored when the polymerization reaction or the resin is processed. In addition, there is a possibility that the metal component contained in the catalyst exhibits a catalyst action or a catalyst deactivation action, and polymerization becomes unstable.

本發明之寡聚茀A1之10質量%之四氫呋喃溶液的色調較佳為50以下。進而較佳為10以下。寡聚茀A1有如下性質:吸收端擴展至接近可見光之區域,因聚合或樹脂之加工而暴露於高溫下時容易著色。為了獲得色相良好之聚合物,聚合反應所使用之單體較佳為儘可能著色較少,就該觀點而言,作為單體原料之寡聚茀A1較佳為儘可能著色較少。色調由於與濃度成比例,故而亦可為於不同濃度下進行測定並 標準化為10質量%濃度而獲得之值。此處,寡聚茀A1之色調(APHA值)可依據JIS-K0071-1(1998年),藉由將稀釋岸田化學公司製造之色度標準液(1000度)而製作之液與寡聚茀A1放入內徑20mm之比色管中進行比較而進行測定。 The color tone of the 10% by mass tetrahydrofuran solution of the oligomeric fluorene A1 of the present invention is preferably 50 or less. It is more preferably 10 or less. Oligomeric A1 has the following properties: the absorption end is extended to a region near visible light, and it is easy to be colored when exposed to high temperature due to polymerization or resin processing. In order to obtain a polymer with a good hue, the monomer used in the polymerization reaction is preferably as small as possible. From this viewpoint, the oligomeric fluorene A1 as the monomer raw material is preferably as small as possible. Since the hue is proportional to the density, it can also be measured at different concentrations and A value obtained by normalizing to a concentration of 10% by mass. Here, the color tone (APHA value) of oligomeric fluorene A1 can be prepared by diluting a color standard solution (1000 degrees) manufactured by Kishida Chemical Co., Ltd. in accordance with JIS-K0071-1 (1998) and oligomeric fluorene A1 was measured in a colorimetric tube with an inner diameter of 20 mm for comparison.

本發明之寡聚茀A1之於熱重量測定下之5%重量減少溫度較佳為230℃以上,更佳為250℃以上。進而尤佳為270℃以上。茀係非常富電子之結構,鍵結於茀環之取代基之反應性提高,而變得容易引起熱分解。若聚合反應中使用熱分解溫度較低之單體,則有如下之虞:聚合時引起熱分解而聚合不再進行至所需分子量,或者所獲得之聚合物著色,因此作為單體原料之寡聚茀A1亦較佳為熱分解溫度較高。 The 5% weight reduction temperature of the oligomeric fluorene A1 of the present invention under thermogravimetric measurement is preferably 230 ° C or higher, more preferably 250 ° C or higher. The temperature is more preferably 270 ° C or higher. Samarium is a very electron-rich structure, and the reactivity of the substituents bonded to the samarium ring is improved, and it becomes easy to cause thermal decomposition. If a monomer with a low thermal decomposition temperature is used in the polymerization reaction, there is a risk that the thermal decomposition will be caused during the polymerization and the polymerization will not proceed to the required molecular weight, or the obtained polymer will be colored, so it is oligomerized as a monomer raw material. Polyfluorene A1 is also preferably a higher thermal decomposition temperature.

<1.7具有1個反應性官能基之寡聚茀A1之製造方法> <1.7 Production method of oligomeric fluorene A1 having one reactive functional group>

關於本發明之寡聚茀A1之製造方法,並無特別限定,例如可列舉如下方法:於鹼存在下,使下述式(3)所表示之寡聚茀、與具有下述式(4)所表示之吸電子性基之烯烴進行反應,藉此製造下述式(1)所表示之寡聚茀A1。 The manufacturing method of the oligomeric fluorene A1 of this invention is not specifically limited, For example, the method of making an oligomeric fluorene represented by the following formula (3) in the presence of a base, and having the following formula (4) is mentioned. The olefin having the electron-withdrawing group represented is reacted to produce an oligomeric fluorene A1 represented by the following formula (1).

式中,R3分別獨立為直接鍵、或可具有取代基之碳數1~4之伸烷基。 In the formula, R 3 is each independently a direct bond or an alkylene group having 1 to 4 carbon atoms which may have a substituent.

R4~R9分別獨立為氫原子、可具有取代基之碳數1~10之烷基、 可具有取代基之碳數4~10之芳基、可具有取代基之碳數1~10之醯基、可具有取代基之碳數1~10之醯氧基、可具有取代基之碳數1~10之烷氧基、可具有取代基之碳數1~10之芳氧基、可具有取代基之胺基、可具有取代基之碳數1~10之乙烯基、可具有取代基之碳數1~10之乙炔基、具有取代基之硫原子、具有取代基之矽原子、鹵素原子、硝基、或氰基。其中,R4~R9中鄰接之至少2個基亦可相互鍵結而形成環。 R 4 to R 9 are each independently a hydrogen atom, an alkyl group having 1 to 10 carbons that may have a substituent, an aryl group having 4 to 10 carbons that may have a substituent, and 1 to 10 carbons that may have a substituent Fluorenyl group, fluorenyloxy group having 1 to 10 carbon atoms which may have a substituent, alkoxyl group having 1 to 10 carbon atoms which may have a substituent, aryloxy group having 1 to 10 carbon atoms which may have a substituent, may have Substituent amino group, vinyl group having 1 to 10 carbon atoms which may have a substituent, ethynyl group having 1 to 10 carbon atoms which may have a substituent, sulfur atom having a substituent, silicon atom having a substituent, halogen atom , Nitro, or cyano. Among them, at least two adjacent groups in R 4 to R 9 may be bonded to each other to form a ring.

Ra~Rc分別獨立為氫原子、可經取代之碳數1~10之烷基、可經取代之碳數4~10之芳基或可經取代之碳數6~10之芳烷基,X為酯基、醯胺基、羧基、氰基、或硝基。 R a to R c are each independently a hydrogen atom, an alkyl group having 1 to 10 carbon atoms which can be substituted, an aryl group having 4 to 10 carbon atoms which can be substituted or an aralkyl group having 6 to 10 carbon atoms which can be substituted X is an ester group, amidino group, a carboxyl group, a cyano group, or a nitro group.

n表示1~5之整數值。 n represents an integer value from 1 to 5.

上述式(3)及(4)中,作為R3~R9、Ra~Rc、X及n,可較佳地使用上述式(1)中作為R3~R9、Ra~Rc、X及n所例示者。 The above-described formula (3) and (4), examples of R 3 ~ R 9, R a ~ R c, X , and n, may be preferably used the above-described formula (1) as R 3 ~ R 9, R a ~ R c , X, and n.

<1.7.1具有吸電子性基之烯烴> <1.7.1 Alkenes having an electron-withdrawing group>

又,作為具有上述式(4)所表示之吸電子性基之烯烴,可列舉:丙烯酸甲酯、丙烯酸乙酯、丙烯酸苯酯、丙烯酸烯丙酯、丙烯酸縮水甘油酯、丙烯酸2-羥基乙酯、丙烯酸4-羥基丁酯、1,4-環己烷二甲醇單丙烯酸酯等丙烯酸酯類、甲基丙烯酸甲酯、甲基丙烯酸乙酯、甲基丙烯酸苯酯、甲基丙烯酸烯丙酯、甲基丙烯酸縮水甘油酯、甲基丙烯酸2-羥基乙酯等甲基丙烯酸酯類、2-乙基丙烯酸甲酯、2-苯基丙烯酸甲酯等 α-置換不飽和酯類、肉桂酸甲酯、肉桂酸乙酯、丁烯酸甲酯、丁烯酸乙酯等β-取代不飽和酯類、β-硝基苯乙烯等共軛硝基烯烴類、丙烯腈等α,β-不飽和腈類、丙烯醛、甲基丙烯醛、巴豆醛等α,β-不飽和醛類。其中,較佳為可直接導入反應性官能基之下述通式(4-1)所表示之不飽和羧酸酯。 Examples of the olefin having an electron-withdrawing group represented by the formula (4) include methyl acrylate, ethyl acrylate, phenyl acrylate, allyl acrylate, glycidyl acrylate, and 2-hydroxyethyl acrylate. Acrylates such as 4-hydroxybutyl acrylate, 1,4-cyclohexanedimethanol monoacrylate, methyl methacrylate, ethyl methacrylate, phenyl methacrylate, allyl methacrylate, Methacrylic esters such as glycidyl methacrylate, 2-hydroxyethyl methacrylate, methyl 2-ethylacrylate, methyl 2-phenylacrylate, etc. α-substituted unsaturated esters, β-substituted unsaturated esters such as methyl cinnamate, ethyl cinnamate, methyl butenoate, ethyl butenoate, and conjugated nitroolefins such as β-nitrostyrene Α, β-unsaturated nitriles such as acrylonitrile and acrylonitrile, α, β-unsaturated aldehydes such as acrolein, methacrylaldehyde, and crotonaldehyde. Among them, an unsaturated carboxylic acid ester represented by the following general formula (4-1) into which a reactive functional group can be directly introduced is preferred.

[化91] [Chemical 91]

(式中,Rc係與式(4)中之Rc相同,Rg表示碳數1~10之有機取代基)。此處,作為Rg之碳數1~10之有機取代基,可較佳地使用作為「酯基」中之碳數1~10之有機取代基所例示者。 (In the formula, R c is the same as R c in Formula (4), and R g represents an organic substituent having 1 to 10 carbon atoms). Here, as the organic substituent having 1 to 10 carbon atoms in Rg , those exemplified as the organic substituent having 1 to 10 carbon atoms in the "ester group" can be preferably used.

通式(4-1)所表示之不飽和羧酸中,更佳為丙烯酸酯類、甲基丙烯酸酯類或α-取代不飽和酯類,就反應速度與反應選擇性之觀點而言,進而較佳為Rc為氫原子或甲基之丙烯酸酯類或甲基丙烯酸酯類。Rg更小者於工業上廉價且蒸餾精製亦容易,反應性亦較高,因此尤佳為丙烯酸甲酯、甲基丙烯酸甲酯、丙烯酸乙酯、甲基丙烯酸乙酯、丙烯酸苯酯、或甲基丙烯酸苯酯。 Among the unsaturated carboxylic acids represented by the general formula (4-1), acrylates, methacrylates, or α-substituted unsaturated esters are more preferred. From the viewpoint of reaction speed and reaction selectivity, Acrylates or methacrylates in which R c is a hydrogen atom or a methyl group are preferred. The smaller R g is industrially cheap and easy to be distilled and refined, and has high reactivity. Therefore, it is particularly preferably methyl acrylate, methyl methacrylate, ethyl acrylate, ethyl methacrylate, phenyl acrylate, or Phenyl methacrylate.

另一方面,於式(4-1)所表示之不飽和羧酸酯為具有丙烯酸2-羥基乙酯基、丙烯酸4-羥基丁酯基、1,4-環己烷二甲醇單丙烯酸酯基等羥基烷基之酯類之情形時,因可於第1階段獲得聚酯碳酸酯、聚酯之原料,故而尤佳。 On the other hand, the unsaturated carboxylic acid ester represented by the formula (4-1) is a 2-hydroxyethyl acrylate group, a 4-hydroxybutyl acrylate group, and a 1,4-cyclohexanedimethanol monoacrylate group. In the case of hydroxyalkyl esters, polyester carbonates and polyester raw materials can be obtained in the first stage, which is particularly preferred.

亦可使用2種以上之具有吸電子性基之烯烴,就精製之簡便性而言,較佳為使用1種具有吸電子性基之烯烴。 Two or more kinds of olefins having an electron-withdrawing group may be used. In terms of simplicity of purification, one kind of olefins having an electron-withdrawing group is preferably used.

關於具有吸電子性基之烯烴之使用量,並無特別限定,就選擇性地獲得莫耳加成物之觀點而言,較佳為0.1當量以上,更佳為0.3當量以上,進而較佳為0.5當量以上,尤佳為0.7當量以上,又較佳為2.0當量以下,更佳為1.8當量以下,進而較佳為1.5當量以下,尤佳為1.2當量以下。 The use amount of the olefin having an electron-withdrawing group is not particularly limited. From the viewpoint of selectively obtaining a mole adduct, it is preferably 0.1 equivalent or more, more preferably 0.3 equivalent or more, and even more preferably 0.5 equivalent or more, particularly preferably 0.7 equivalent or more, and more preferably 2.0 equivalent or less, more preferably 1.8 equivalent or less, still more preferably 1.5 equivalent or less, and even more preferably 1.2 equivalent or less.

<1.7.2 鹼> <1.7.2 Alkali>

作為鹼,可使用氫氧化鋰、氫氧化鈉、氫氧化鉀等鹼金屬氫氧化物、氫氧化鈣、氫氧化鋇等鹼土金屬之氫氧化物、碳酸鈉、碳酸氫 鈉、碳酸鉀等鹼金屬之碳酸鹽、碳酸鎂、碳酸鈣等鹼土金屬之碳酸鹽、磷酸鈉、磷酸水素鈉、磷酸鉀等磷酸之鹼金屬鹽、正丁基鋰、第三丁基鋰等有機鋰鹽、甲醇鈉、乙醇鈉、第三丁醇鉀等鹼金屬之烷醇鹽、氫化鈉或氫化鉀等氫化鹼金屬鹽、三乙基胺、二氮雜雙環十一烯等三級胺、四甲基氫氧化銨、四丁基氫氧化銨、苄基三甲基氫氧化銨等四級氫氧化銨。該等可單獨使用1種,亦可併用2種以上。 As the base, alkali metal hydroxides such as lithium hydroxide, sodium hydroxide, and potassium hydroxide; hydroxides of alkaline earth metals such as calcium hydroxide and barium hydroxide; sodium carbonate; and hydrogen carbonate can be used. Carbonates of alkali metals such as sodium and potassium carbonate, carbonates of alkaline earth metals such as magnesium carbonate and calcium carbonate, alkali metal salts of phosphoric acid such as sodium phosphate, sodium phosphate sodium phosphate, and potassium phosphate, n-butyl lithium, third butyl lithium, etc. Organic lithium salts, sodium alkoxides of alkali metals such as sodium methoxide, sodium ethoxide, and potassium tert-butoxide, alkali metal hydrides such as sodium hydride or potassium hydride, tertiary amines such as triethylamine and diazabicycloundecene , Tetramethylammonium hydroxide, tetrabutylammonium hydroxide, benzyltrimethylammonium hydroxide and other quaternary ammonium hydroxide. These may be used individually by 1 type, and may use 2 or more types together.

於R3為亞甲基之情形、與其以外之情形時,有式(3)所表示之寡聚茀之反應性存在較大差異之傾向。因此,將R3為亞甲基之情形、與其以外之情形分開進行記載。 When R 3 is a methylene group and other cases, there is a tendency that the reactivity of the oligomeric fluorene represented by formula (3) is greatly different. Therefore, the case where R 3 is methylene is described separately from the case other than R 3 .

於R3為亞甲基之情形時,式(3)所表示之寡聚茀係於溶劑中,於鹼存在下容易地進行分解反應。因此,於有機層與水層之二層系中進行反應之情形時,就可抑制分解反應等副反應之方面而言,較佳為使用水溶性之無機鹼。其中,就成本、反應性之方面而言,較佳為鹼金屬之氫氧化物,尤其是氫氧化鈉或氫氧化鉀更佳。 When R 3 is a methylene group, the oligomeric fluorene represented by the formula (3) is in a solvent, and a decomposition reaction is easily performed in the presence of a base. Therefore, when a reaction is performed in a two-layer system of an organic layer and an aqueous layer, a water-soluble inorganic base is preferably used in terms of suppressing side reactions such as decomposition reactions. Among these, in terms of cost and reactivity, hydroxides of alkali metals are preferred, and sodium hydroxide or potassium hydroxide is more preferred.

又,關於水溶液之濃度,於使用尤佳之氫氧化鈉水溶液之情形時,若濃度較薄,則反應速度明顯降低,因此尤佳為使用通常為5wt/wt%以上、較佳為10wt/wt%以上、更佳為25wt/wt%以上之水溶液。 Regarding the concentration of the aqueous solution, in the case of using a particularly preferred sodium hydroxide aqueous solution, if the concentration is thin, the reaction speed is significantly reduced. Therefore, it is particularly preferred to use 5wt / wt% or more, preferably 10wt / wt. % Or more, more preferably 25 wt / wt% or more of aqueous solution.

於R3為亞甲基以外之情形時,於有機層與水層之二層系中亦進行反應,但於使用溶解於有機層之有機鹼而進行反應之情形時,有反應迅速進行之傾向,因此較佳為使用有機鹼。該等中,較佳為於本反應中具有充分之鹼性之鹼金屬之烷氧化物,更佳為工業上廉價之甲醇鈉或乙醇鈉。此處,鹼金屬之烷氧化物可使用粉狀者,亦可使用醇溶液等液狀者。又,亦可使鹼金屬與醇進行反應而製備。 When R 3 is other than methylene, the reaction is also performed in the two-layer system of the organic layer and the water layer. However, when the reaction is performed using an organic base dissolved in the organic layer, the reaction tends to proceed quickly. Therefore, it is preferable to use an organic base. Among these, an alkali metal alkoxide having sufficient basicity in this reaction is preferable, and industrially inexpensive sodium methoxide or sodium ethoxide is more preferable. Here, the alkali metal alkoxide may be used in a powder form or in a liquid form such as an alcohol solution. Alternatively, it may be prepared by reacting an alkali metal with an alcohol.

於R3為亞甲基之情形時,關於鹼之使用量,相對於作為原料之式(3)所表示之寡聚茀,上限並無特別限制,若使用量過多,則有攪拌 或反應後之精製負荷變大之情形,因此於使用作為尤佳之鹼之25wt/wt%以上之氫氧化鈉水溶液之情形時,通常相對於式(3)所表示之寡聚茀為20倍體積量以下,較佳為10倍體積量以下,進而較佳為5倍體積量以下。若鹼量過少,則反應速度明顯降低,因此通常鹼相對於作為原料之式(3)所表示之寡聚茀為0.2倍體積量以上。較佳為0.5倍體積量以上,更佳為1倍體積量以上。 In the case where R 3 is a methylene group, the upper limit of the amount of the base used is not particularly limited with respect to the oligomeric fluorene represented by the formula (3) as a raw material. When the refining load becomes large, when using a sodium hydroxide aqueous solution of 25 wt / wt% or more, which is a particularly preferred base, it is usually 20 times or less the volume of the oligomeric fluorene represented by formula (3). It is preferably 10 times or less the volume, and further preferably 5 times or less the volume. If the amount of the base is too small, the reaction rate is significantly reduced. Therefore, the base is usually 0.2 times the volume of the oligomeric fluorene represented by the formula (3) as a raw material. The volume is preferably 0.5 times or more, and more preferably 1 time or more.

於R3為亞甲基以外之情形時,關於鹼之使用量,相對於作為原料之式(3)所表示之寡聚茀,上限並無特別限制,若使用量過多,則有攪拌或反應後之精製負荷變大之情形,因此於使用作為尤佳之鹼之甲醇鈉或乙醇鈉之情形時,通常相對於式(3)所表示之寡聚茀為5倍莫耳以下,較佳為2倍莫耳以下,進而較佳為1倍莫耳以下,尤佳為0.5倍莫耳以下。若鹼量過少,則反應速度明顯降低,因此通常鹼相對於作為原料之式(3)所表示之寡聚茀為0.005倍莫耳以上。較佳為0.01倍莫耳以上,更佳為0.05倍莫耳以上,尤佳為0.1倍莫耳以上。 When R 3 is other than methylene, the upper limit of the amount of base used is not particularly limited relative to the oligomeric fluorene represented by formula (3) as a raw material. If the amount of use is too large, there may be stirring or reaction. In the case where the subsequent refining load becomes large, when using sodium methoxide or sodium ethoxide, which is a particularly good base, it is usually 5 times less than the oligomeric fluorene represented by the formula (3), preferably It is preferably 2 times or less, more preferably 1 time or less, and particularly preferably 0.5 time or less. If the amount of the base is too small, the reaction rate is significantly reduced. Therefore, the base is usually 0.005 times mole or more relative to the oligomeric fluorene represented by the formula (3) as a raw material. It is preferably at least 0.01 times the mole, more preferably at least 0.05 times the mole, and even more preferably at least 0.1 times the mole.

<1.7.3相間轉移觸媒> <1.7.3 Interphase Transfer Catalyst>

於有機層與水層之二層系中進行反應之情形時,為了提高反應速度,較佳為使用相間轉移觸媒。 When the reaction is performed in a two-layer system of an organic layer and an aqueous layer, in order to increase the reaction speed, it is preferable to use a phase transfer catalyst.

作為相間轉移觸媒,可列舉:氯化四甲基銨、溴化四丁基銨、氯化甲基三辛基銨、氯化甲基三癸基銨、氯化苄基三甲基銨、氯化三辛基甲基銨、碘化四丁基銨、溴化乙醯基三甲基銨、氯化苄基三乙基銨等四級銨鹽之鹵化物(氟除外),氯化N,N-二甲基吡咯啶鎓、碘化N-乙基-N-甲基吡咯啶鎓、溴化N-丁基-N-甲基吡咯啶鎓、氯化N-苄基-N-甲基吡咯啶鎓、溴化N-乙基-N-甲基吡咯啶鎓等四級吡咯啶鎓鹽之鹵化物(氟除外),溴化N-丁基-N-甲基嗎啉鎓、碘化N-丁基-N-甲基嗎啉鎓、溴化N-烯丙基-N-甲基嗎啉鎓等四級嗎啉鎓鹽之鹵化物(氟除外),氯化N-甲基-N-苄基哌啶鎓、溴化N-甲基-N-苄基哌啶鎓、碘化 N,N-二甲基哌啶鎓、N-甲基-N-丁基哌啶鎓乙酸鹽、碘化N-甲基-N-乙基哌啶鎓等四級哌啶鎓鹽之鹵化物(氟除外),冠醚類等。較佳為四級銨鹽,進而較佳為溴化四丁基銨、氯化苄基三甲基銨、或氯化苄基三乙基銨。該等可單獨使用1種,亦可併用2種以上。 Examples of the phase transfer catalyst include tetramethylammonium chloride, tetrabutylammonium bromide, methyltrioctylammonium chloride, methyltridecylammonium chloride, benzyltrimethylammonium chloride, Halides (except fluorine) of quaternary ammonium salts such as trioctylmethylammonium chloride, tetrabutylammonium iodide, acetamyltrimethylammonium bromide, benzyltriethylammonium chloride, etc., N chloride , N-dimethylpyrrolidinium, N-ethyl-N-methylpyrrolidinium iodide, N-butyl-N-methylpyrrolidinium bromide, N-benzyl-N-formyl chloride Halides (except fluorine) of quaternary pyrrolidinium salts such as methylpyrrolidinium, N-ethyl-N-methylpyrrolidinium bromide, N-butyl-N-methylmorpholinium bromide, iodine N-butyl-N-methylmorpholinium, N-allyl-N-methylmorpholinium bromide halides (except fluorine), N-methyl chloride -N-benzylpiperidinium, N-methyl-N-benzylpiperidinium bromide, iodinated Halides of quaternary piperidinium salts such as N, N-dimethylpiperidinium, N-methyl-N-butylpiperidinium acetate, N-methyl-N-ethylpiperidinium iodide, etc. (Except fluorine), crown ethers, etc. A quaternary ammonium salt is preferable, and tetrabutylammonium bromide, benzyltrimethylammonium chloride, or benzyltriethylammonium chloride is more preferable. These may be used individually by 1 type, and may use 2 or more types together.

關於相間轉移觸媒之使用量,若相對於作為原料之式(3)所表示之寡聚茀而過多,則有酯之水解或逐次麥可反應等副反應之進行變明顯之傾向,又,就成本之觀點而言,通常相對於式(3)所表示之寡聚茀為5倍莫耳以下,較佳為2倍莫耳以下,進而較佳為1倍莫耳以下。若相間轉移觸媒之使用量過少,則有反應速度明顯降低之傾向,因此通常相間轉移觸媒之使用量相對於原料之寡聚茀為0.01倍莫耳以上。較佳為0.1倍莫耳以上,更佳為0.5倍莫耳以上。 Regarding the use amount of the phase transfer catalyst, if it is too much relative to the oligomeric fluorene represented by the formula (3) as a raw material, there is a tendency that side reactions such as hydrolysis of the ester or sequential Michael reaction become obvious, and, From the viewpoint of cost, it is usually 5 times or less, preferably 2 times or less, and more preferably 1 time or less relative to the oligomeric fluorene represented by the formula (3). If the amount of the interphase transfer catalyst used is too small, the reaction speed tends to be significantly reduced. Therefore, the amount of the interphase transfer catalyst used is usually 0.01 times more than the oligomeric fluorene of the raw material. It is preferably at least 0.1 times mole, more preferably at least 0.5 times mole.

<1.7.4溶劑> <1.7.4 Solvents>

具有上述式(4)所表示之吸電子性基之烯烴之反應較理想為使用溶劑而進行。 The reaction of the olefin having the electron-withdrawing group represented by the formula (4) is preferably performed using a solvent.

關於具體可使用之溶劑,作為烷基腈系溶劑,可列舉乙腈、丙腈等,作為酮系溶劑,可列舉丙酮、甲基乙基酮、甲基異丁基酮等,作為酯系溶劑,可列舉乙酸甲酯、乙酸乙酯、乙酸丙酯、乙酸苯酯、丙酸甲酯、丙酸乙酯、丙酸丙酯、丙酸苯酯、3-甲氧基丙酸甲酯、3-甲氧基丙酸甲酯、乳酸甲酯、乳酸乙酯等直鏈狀之酯類;γ-丁內酯、己內酯等環狀酯類;乙二醇單甲醚乙酸酯、乙二醇單乙醚乙酸酯、乙二醇單丁醚乙酸酯、丙二醇-1-單甲醚乙酸酯、丙二醇-1-單乙醚乙酸酯等醚酯類等,作為醚系溶劑,可列舉二乙醚、四氫呋喃、1,4-二烷、甲基環戊基醚、第三丁基甲基醚等,作為鹵素系溶劑,可列舉1,2-二氯乙烷、二氯甲烷、氯仿、1,1,2,2-四氯乙烷等,作為鹵素系芳香族烴,可列舉氯苯、1,2-二氯苯等,作為醯胺系溶劑,可列舉N,N-二甲基甲醯胺、N,N,-二甲基乙醯胺等,作為亞碸系溶劑,可列舉二 甲基亞碸、環丁碸等,作為環狀式脂肪族烴,可列舉:環戊烷、環己烷、環庚烷、環辛烷等單環狀式脂肪族烴;作為其衍生物之甲基環戊烷、乙基環戊烷、甲基環己烷、乙基環己烷、1,2-二甲基環己烷、1,3-二甲基環己烷、1,4-二甲基環己烷、異丙基環己烷、正丙基環己烷、第三丁基環己烷、正丁基環己烷、異丁基環己烷、1,2,4-三甲基環己烷、1,3,5-三甲基環己烷等;十氫萘等多環狀式脂肪族烴;正戊烷、正己烷、正庚烷、正辛烷、異辛烷、正壬烷、正癸烷、正十二烷、正十四烷等非環狀式脂肪族烴,作為芳香族烴,可列舉甲苯、對二甲苯、鄰二甲苯、間二甲苯等,作為芳香族雜環,可列舉吡啶等,作為醇系溶劑,可列舉甲醇、乙醇、異丙醇、正丁醇、第三丁醇、己醇、辛醇、環己醇等。 Specific solvents that can be used include acetonitrile and propionitrile as the alkyl nitrile solvent, and acetone, methyl ethyl ketone, and methyl isobutyl ketone as the ketone solvent. As the ester solvent, Examples include methyl acetate, ethyl acetate, propyl acetate, phenyl acetate, methyl propionate, ethyl propionate, propyl propionate, phenyl propionate, methyl 3-methoxypropionate, 3- Linear esters such as methyl methoxypropionate, methyl lactate, ethyl lactate; cyclic esters such as γ-butyrolactone, caprolactone; ethylene glycol monomethyl ether acetate, ethylene glycol Ether esters such as alcohol monoethyl ether acetate, ethylene glycol monobutyl ether acetate, propylene glycol-1-monomethyl ether acetate, propylene glycol-1-monoethyl ether acetate, and the like, and examples thereof include ether solvents Diethyl ether, tetrahydrofuran, 1,4-bis Alkane, methylcyclopentyl ether, third butyl methyl ether, and the like. Examples of the halogen-based solvent include 1,2-dichloroethane, dichloromethane, chloroform, and 1,1,2,2-tetrachloroethane. Examples of the halogen-based aromatic hydrocarbon include chlorobenzene and 1,2-dichlorobenzene. Examples of the fluorene-based solvent include N, N-dimethylformamide and N, N, -dimethyl. Acetylamine and the like include fluorene-based solvents such as dimethyl fluorene and cyclobutane. Examples of the cyclic aliphatic hydrocarbon include cyclopentane, cyclohexane, cycloheptane, and cyclooctane. And other monocyclic aliphatic hydrocarbons; its derivatives are methylcyclopentane, ethylcyclopentane, methylcyclohexane, ethylcyclohexane, 1,2-dimethylcyclohexane, 1 , 3-dimethylcyclohexane, 1,4-dimethylcyclohexane, isopropylcyclohexane, n-propylcyclohexane, third butylcyclohexane, n-butylcyclohexane, Isobutylcyclohexane, 1,2,4-trimethylcyclohexane, 1,3,5-trimethylcyclohexane, etc .; polycyclic aliphatic hydrocarbons such as decahydronaphthalene; n-pentane, Non-cyclic aliphatics such as n-hexane, n-heptane, n-octane, isooctane, n-nonane, n-decane, n-dodecane, n-tetradecane Examples of the hydrocarbon include toluene, para-xylene, o-xylene, and meta-xylene. Examples of the aromatic heterocyclic ring include pyridine. Examples of the alcohol-based solvent include methanol, ethanol, isopropyl alcohol, and the like. N-butanol, tertiary butanol, hexanol, octanol, cyclohexanol and the like.

於R3為亞甲基之情形時,可知有如下傾向,即藉由使用與水相分離之溶劑而可抑制式(3)所表示之寡聚茀之分解反應等副反應。進而於使用使作為原料之式(3)所表示之寡聚茀充分溶解之溶劑之情形時,就有反應之進行良好之傾向之方面而言,較佳為使用作為原料之式(3)所表示之寡聚茀之溶解度為0.5質量%以上之溶劑,更佳為使用溶解度為1.0質量%以上之溶劑,尤佳為使用溶解度為1.5質量%以上之溶劑。具體而言,較佳為鹵素系脂肪族烴、鹵素系芳香族烴、芳香族烴、或醚系溶劑,尤佳為二氯甲烷、氯苯、氯仿、1,2-二氯苯、四氫呋喃、1,4-二烷、或甲基環戊基醚。 When R 3 is a methylene group, it is known that by using a solvent separated from the water phase, side reactions such as the decomposition reaction of the oligomeric fluorene represented by the formula (3) can be suppressed. Furthermore, in the case where a solvent that sufficiently dissolves the oligomeric fluorene represented by the formula (3) is used as a raw material, it is preferable to use the formula (3) as a raw material because the reaction tends to proceed well. The solvent having an solubility of oligomeric fluorene represented by 0.5% by mass or more, more preferably a solvent having a solubility of 1.0% by mass or more, and particularly preferably a solvent having a solubility of 1.5% by mass or more. Specifically, a halogen-based aliphatic hydrocarbon, a halogen-based aromatic hydrocarbon, an aromatic hydrocarbon, or an ether-based solvent is preferred, and dichloromethane, chlorobenzene, chloroform, 1,2-dichlorobenzene, tetrahydrofuran, 1,4-two Alkane, or methylcyclopentyl ether.

另一方面,於R3為亞甲基以外之基之情形時,可知有如下傾向,即有機鹼及式(3)所表示之寡聚茀之溶解性對反應速度產生較大之影響,為了確保其溶解性,較理想為使用具有一定值以上之介電常數之溶劑。作為使有機鹼及式(3)所表示之寡聚茀充分溶解之溶劑,較佳為芳香族雜環、烷基腈系溶劑、醯胺系溶劑、亞碸系溶劑,尤佳為吡啶、乙腈、N,N-二甲基甲醯胺、N,N,-二甲基乙醯胺、二甲基亞碸、 環丁碸。 On the other hand, when R 3 is a group other than methylene, it is known that the solubility of the organic base and the oligomeric fluorene represented by the formula (3) has a large influence on the reaction rate. To ensure its solubility, it is ideal to use a solvent with a dielectric constant above a certain value. As the solvent for sufficiently dissolving the organic base and the oligomeric fluorene represented by the formula (3), an aromatic heterocyclic ring, an alkyl nitrile-based solvent, a fluorene-based solvent, and a fluorene-based solvent are preferred, and pyridine and acetonitrile are particularly preferred , N, N-dimethylformamide, N, N, -dimethylacetamide, dimethylmethane, cyclobutane.

上述溶劑可單獨使用1種,亦可混合2種以上使用。 These solvents may be used alone or in combination of two or more.

關於溶劑之使用量,上限並無特別限制,若考慮每個反應器之目標物之產生效率,則通常使用如成為作為原料之式(3)所表示之寡聚茀之20倍體積量、較佳為15倍體積量、進而較佳為10倍體積量之量。另一方面,若溶劑之使用量過少,則試劑之溶解性變差而攪拌變困難,並且反應之進行變慢,因此作為下限,通常使用如成為作為原料之式(3)所表示之寡聚茀之1倍體積量、較佳為2倍體積量、進而較佳為4倍體積量之量。 With regard to the amount of solvent used, the upper limit is not particularly limited. If the production efficiency of the target substance in each reactor is considered, a volume of 20 times the volume of the oligomeric fluorene represented by formula (3) as a raw material is generally used. It is preferably an amount of 15 times the volume, and more preferably an amount of 10 times the volume. On the other hand, if the amount of the solvent used is too small, the solubility of the reagent becomes poor and the stirring becomes difficult, and the progress of the reaction becomes slow. Therefore, as a lower limit, an oligomer represented by formula (3) as a raw material is generally used. The amount of 1 volume is preferably 2 volumes, more preferably 4 volumes.

<1.7.5反應形式> <1.7.5 Reaction Form>

反應之形式可採用分批式反應,亦可採用流通式反應,亦可採用組合該等而成者,其形式並無特別限制。 The form of the reaction may be a batch reaction, a flow-through reaction, or a combination of these, and the form is not particularly limited.

關於批次式之情形時反應試劑向反應器之投入方法,於反應開始時將具有吸電子性基之烯烴一次性添加之情形時,具有吸電子性基之烯烴以高濃度存在,因此副反應之聚合反應容易進行。因此,較佳為於添加作為原料之式(3)所表示之寡聚茀、相間轉移觸媒、溶劑及鹼後,少量多次地逐次添加具有吸電子性基之烯烴。 Regarding the method of feeding the reaction reagent into the reactor in the case of batch type, when an olefin having an electron-withdrawing group is added at a time at the start of the reaction, the olefin having an electron-withdrawing group is present at a high concentration, and therefore a side reaction occurs. The polymerization reaction is easy to proceed. Therefore, it is preferable to add an olefin having an electron-withdrawing group one by one in small amounts multiple times after adding the oligomeric fluorene, the phase transfer catalyst, the solvent, and the base represented by formula (3) as raw materials.

<1.7.6反應條件> <1.7.6 Reaction conditions>

若溫度過低,則無法獲得充分之反應速度,反之若溫度過高,則有具有吸電子性基之烯烴之聚合反應容易進行之傾向,因此溫度管理極為重要。因此,作為反應溫度,具體而言,通常於下限為0℃、較佳為10℃、更佳為15℃下實施。另一方面,通常於上限為40℃、較佳為30℃、更佳為20℃下實施。 If the temperature is too low, a sufficient reaction rate cannot be obtained. On the other hand, if the temperature is too high, the polymerization reaction of an olefin having an electron-withdrawing group tends to proceed easily. Therefore, temperature management is extremely important. Therefore, as the reaction temperature, the lower limit is usually 0 ° C, preferably 10 ° C, and more preferably 15 ° C. On the other hand, the upper limit is usually 40 ° C, preferably 30 ° C, and more preferably 20 ° C.

關於通常之反應時間,通常下限為2時間,較佳為4小時,進而較佳為6小時,且上限並無特別限定,通常為30小時,較佳為20小時,進而較佳為10小時。 As for the usual reaction time, the lower limit is usually 2 hours, preferably 4 hours, and further preferably 6 hours, and the upper limit is not particularly limited, but is usually 30 hours, preferably 20 hours, and further preferably 10 hours.

<1.7.7目標物之分離‧精製> <1.7.7 Separation and Refining of Targets>

反應結束後,作為目標物之上述式(1)所表示之寡聚茀A1可藉由將副產生之金屬鹵化物、及殘留之無機鹼進行過濾而自反應液去除後,採用將溶劑進行濃縮之方法、或添加目標物之不良溶劑之方法等,使作為目標物之上述式(1)所表示之寡聚茀A1析出。 After completion of the reaction, the oligomeric fluorene A1 represented by the above formula (1) as a target substance can be removed from the reaction solution by filtering the metal halide by-produced and the residual inorganic base, and then concentrating the solvent by using The oligomeric fluorene A1 represented by the above formula (1) as a target is precipitated by a method such as a method of adding a poor solvent of the target or the like.

又,反應結束後,亦可向反應液添加酸性水與作為目標物之上述式(1)所表示之寡聚茀A1可溶之溶劑而進行萃取。藉由溶劑而萃取之目標物可藉由將溶劑進行濃縮之方法、或添加不良溶劑之方法等而進行單離。 In addition, after the reaction is completed, acid water and an oligomeric fluorene A1 soluble solvent represented by the above formula (1) as a target substance may be added to the reaction solution to perform extraction. The target substance extracted by the solvent can be isolated by a method of concentrating the solvent or a method of adding a poor solvent.

作為萃取時可使用之溶劑,只要為作為目標物之上述式(1)所表示之寡聚茀A1溶解者即可,並無特別限制,可較佳地使用甲苯、二甲苯等芳香族烴化合物、二氯甲烷、氯仿等鹵素系溶劑等1種或2種以上。 The solvent that can be used in the extraction is not particularly limited as long as it is an oligomeric fluorene A1 represented by the above formula (1) as a target, and aromatic hydrocarbon compounds such as toluene and xylene can be preferably used , Methylene chloride, chloroform, and other halogen-based solvents, such as one or two or more.

於此處所獲得之式(1)所表示之寡聚茀A1中X為酯基之情形時,可用作聚酯、或聚酯碳酸酯原料單體之前軀物,亦可於進行精製後使用。作為精製法,可採用通常之精製法,例如再結晶、或再沈澱、萃取精製、管柱層析法等,並無限制。又,亦可使寡聚茀A1溶解於適當之溶劑並利用活性碳進行處理。此時可使用之溶劑係與萃取時可使用之溶劑相同。 In the case where X is an ester group in the oligomeric fluorene A1 represented by the formula (1) obtained here, it can be used as a precursor of a polyester or polyester carbonate raw material monomer, and can also be used after purification . As the purification method, ordinary purification methods such as recrystallization, reprecipitation, extraction purification, and column chromatography can be used without limitation. Alternatively, oligomeric fluorene A1 may be dissolved in an appropriate solvent and treated with activated carbon. The solvent that can be used at this time is the same as the solvent that can be used during extraction.

於此處所獲得之式(1)所表示之寡聚茀A1中X為羧基之情形時,可直接用作聚酯、或聚酯碳酸酯原料單體之前軀物等。又,藉由酯化反應而可向X為酯基之寡聚茀轉化。 When X in the oligomeric fluorene A1 represented by the formula (1) obtained here is a carboxyl group, it can be used directly as a precursor of a polyester or a polyester carbonate raw material monomer. In addition, it can be converted to an oligomeric fluorene in which X is an ester group by an esterification reaction.

於此處所獲得之式(1)所表示之寡聚茀A1中X為硝基或氰基之情形時,藉由氫氣環境下之利用鈀碳等方法之氫化、或利用氫化鋰鋁等還原劑之氫化還原,而可製造具有胺基之寡聚茀。又,於X為氰基之情形時,可藉由美國專利第3280169號說明書及美國專利第3324084號 說明書等方法而向X為酯基之寡聚茀轉化。 In the case where X in the oligomeric fluorene A1 represented by formula (1) obtained here is nitro or cyano, hydrogenation using a method such as palladium on carbon under a hydrogen environment, or using a reducing agent such as lithium aluminum hydride By hydrogenation reduction, oligomeric fluorenes having amine groups can be produced. When X is a cyano group, it can be determined by the specification of U.S. Patent No. 3280169 and U.S. Patent No. 3324084. To oligomeric amidines in which X is an ester group by methods such as the specification.

<2具有2個不同之反應性官能基之寡聚茀化合物A2> <2 Oligomeric amidine compound A2 having 2 different reactive functional groups>

本發明之具有2個不同之反應性官能基之寡聚茀(以下,有略記為「寡聚茀A2」之情形)係一種寡聚茀,其特徵在於:其係包含可具有取代基之2個以上之茀單元a之9位之碳原子彼此經由可具有取代基之伸烷基、可具有取代基之伸芳基、或可具有取代基之伸芳烷基而鏈狀地鍵結而成之寡聚茀結構單元a者,且於該寡聚茀結構單元a之任一末端之茀單元a之9位之碳原子具有下述式(A)所表示之反應性官能基,於另一末端之茀單元a之9位之碳原子具有與該反應性官能基不同之任意之反應性官能基。 The oligomeric fluorene having two different reactive functional groups according to the present invention (hereinafter, referred to as "oligomeric fluorene A2") is an oligomeric fluorene, which is characterized in that it contains 2 which may have a substituent. The 9 or more carbon atoms of the fluorene unit a are chain-bonded to each other via an alkylene group which may have a substituent, an alkylene group which may have a substituent, or an alkylene group which may have a substituent. The oligomeric fluorene structural unit a, and the carbon atom at the 9th position of the fluorene unit a on either end of the oligomeric fluorene structural unit a has a reactive functional group represented by the following formula (A), The 9-position carbon atom of the terminal fluorene unit a has an arbitrary reactive functional group different from the reactive functional group.

式(A)中,Ra~Rc分別獨立為氫原子、可經取代之碳數1~10之烷基、可經取代之碳數4~10之芳基或可經取代之碳數6~10之芳烷基,X為酯基、醯胺基、羧基、氰基、或硝基。*為與茀單元a之9位之碳原子之鍵結鍵。 In formula (A), R a to R c are each independently a hydrogen atom, an alkyl group having 1 to 10 carbon atoms that can be substituted, an aryl group having 4 to 10 carbon atoms that can be substituted, or 6 carbon atoms that can be substituted Aralkyl of ~ 10, X is ester, amido, carboxy, cyano, or nitro. * Is a bond to a carbon atom at position 9 of the a unit of fluorene.

作為鍵結茀單元a之伸烷基、伸芳基、及伸芳烷基,分別可較佳地採用<1.1伸烷基、伸芳基、伸芳烷基>中所例示者。 As the alkylene, arylene, and aralkyl groups of the fluorene unit a, respectively, those exemplified in <1.1 aralkylene, arylene, and aralkylene> can be preferably used.

同樣地,作為茀單元a可具有之取代基,可較佳地採用<1.2茀單元a可具有之取代基>中所例示者。 Similarly, as the substituent which the fluorene unit a may have, those exemplified in <1.2 The substituent which the fluorene unit a may have> are preferably used.

同樣地,作為式(A)中之Ra~Rc及X,分別可較佳地採用<1.3反應性官能基>中所例示者。 Similarly, as R a to R c and X in the formula (A), those exemplified in <1.3 reactive functional group> can be preferably used, respectively.

<2.1任意之反應性官能基> <2.1 any reactive functional group>

如上所述,本發明之寡聚茀A2係如下者,即於任一末端之茀單元a之9位之碳原子具有上述式(A)所表示之反應性官能基,於另一末端之茀單元a之9位之碳原子具有與該反應性官能基不同之任意之反應性官能基。 As described above, the oligomeric fluorene A2 of the present invention is such that the carbon atom at the 9 position of the fluorene unit a at any terminal has a reactive functional group represented by the above formula (A), and the fluorene at the other terminal The carbon atom at the 9-position of the unit a has an arbitrary reactive functional group different from the reactive functional group.

關於上述任意之反應性官能基,並無特別限定,亦可為未滿足式(A)之規定者,又,亦可為雖滿足式(A)之規定,但與一反應性官能基不同者。 The above-mentioned arbitrary reactive functional group is not particularly limited, and may be one that does not satisfy the requirements of formula (A), or may be one that satisfies the requirements of formula (A) but is different from one reactive functional group. .

如上所述,藉由1個寡聚茀具有2個不同之反應性官能基,而有可簡單地將源自2種反應性官能基之特定物性向樹脂進行賦予之傾向。 As described above, since one oligofluorene has two different reactive functional groups, there is a tendency that specific physical properties derived from the two reactive functional groups can be easily imparted to the resin.

上述任意之反應性官能基之具體結構列舉如下,但並不限定於該等,可列舉:羥基甲基、2-羥基乙基、3-羥基丙基、羥基丁基、2,2-二甲基-3-羥基丙基、2-甲氧基甲基-2-甲基伸丙基、4-羥基苯基、4-羥基-3-甲基苯基、4-(2-羥基乙氧基)苯基、(4-(羥基甲基)環己烷-1-基)甲基等羥基;甲氧基羰基、乙氧基羰基、苯氧基羰基、乙氧基羰基甲基、2-(乙氧基羰基)乙基、2-(甲氧基羰基)乙基、2-(苯氧基羰基)乙基、2-甲基-2-(乙氧基羰基)乙基、2-甲基-2-(甲氧基羰基)乙基、2-甲基-2-(苯氧基羰基)乙基、2-(甲氧基羰基)丙基等酯基;2-羥基乙氧基羰基、2-(2-羥基乙氧基)羰基乙基、2-甲基-2-(2-羥基乙氧基)羰基乙基、2-(2-羥基乙氧基)羰基丙基、2-(4-羥基丁氧基)羰基乙基、2-甲基-2-(4-羥基丁氧基)羰基乙基、2-[[4-(羥基甲基)環己烷-1-基]甲氧基]羰基乙基、2-甲基-2-[[4-(羥基甲基)環己烷-1-基]甲氧基]羰基乙基等羥基酯基;羧基、羧基甲基、2-羧基乙基、2-甲基-2-羧基乙基等羧基;胺基甲基、2-胺基乙基、3-胺基丙基等胺基;丙烯醯氧基甲基、甲基丙烯醯氧基甲基、2-(丙烯醯氧基)乙基、2-(甲基丙烯醯氧基)乙基、3-(丙烯醯氧基)丙基、3-(甲基丙烯醯氧基)丙基等丙烯醯基;2,3-環氧基 丙基、2,3-環氧基丙氧基甲基、2-(2,3-環氧基丙氧基)乙基等環氧基等。 Specific structures of any of the reactive functional groups mentioned above are listed below, but are not limited thereto, and examples include hydroxymethyl, 2-hydroxyethyl, 3-hydroxypropyl, hydroxybutyl, and 2,2-dimethyl Methyl-3-hydroxypropyl, 2-methoxymethyl-2-methylphenyl, 4-hydroxyphenyl, 4-hydroxy-3-methylphenyl, 4- (2-hydroxyethoxy ) Hydroxyl groups such as phenyl, (4- (hydroxymethyl) cyclohexane-1-yl) methyl; methoxycarbonyl, ethoxycarbonyl, phenoxycarbonyl, ethoxycarbonylmethyl, 2- ( (Ethoxycarbonyl) ethyl, 2- (methoxycarbonyl) ethyl, 2- (phenoxycarbonyl) ethyl, 2-methyl-2- (ethoxycarbonyl) ethyl, 2-methyl Esters such as 2- (methoxycarbonyl) ethyl, 2-methyl-2- (phenoxycarbonyl) ethyl, 2- (methoxycarbonyl) propyl; 2-hydroxyethoxycarbonyl, 2- (2-hydroxyethoxy) carbonylethyl, 2-methyl-2- (2-hydroxyethoxy) carbonylethyl, 2- (2-hydroxyethoxy) carbonylpropyl, 2- ( 4-hydroxybutoxy) carbonylethyl, 2-methyl-2- (4-hydroxybutoxy) carbonylethyl, 2-[[4- (hydroxymethyl) cyclohexane-1-yl] methyl Oxy] carbonylethyl, 2-methyl-2-[[4- (hydroxymethyl) cyclohexane-1-yl] Oxy] hydroxy ester groups such as carbonylethyl; carboxyl groups such as carboxyl, carboxymethyl, 2-carboxyethyl, 2-methyl-2-carboxyethyl; aminomethyl, 2-aminoethyl, 3- Amino groups such as aminopropyl; propylene methoxymethyl, methacryl methoxymethyl, 2- (propylene fluorenyloxy) ethyl, 2- (methacryl methoxy) ethyl, 3- (Propenyloxy) propyl, 3- (methacryloxy) propyl, and other propenyl groups; 2,3-epoxy Epoxy groups such as propyl, 2,3-epoxypropoxymethyl, 2- (2,3-epoxypropoxy) ethyl, and the like.

再者,本發明之寡聚茀A2可用作具有2價之寡聚茀作為重複單元之聚合物之原料,反應性官能基較佳為僅2處,且較佳為不包含於用以製造各種樹脂組合物之聚合條件下作為聚合反應性基發揮作用之取代基。 Furthermore, the oligomeric fluorene A2 of the present invention can be used as a raw material of a polymer having a divalent oligomeric fluorene as a repeating unit, and the reactive functional group is preferably only two, and is preferably not included in the production Under various polymerization conditions, various resin compositions serve as a substituent that functions as a polymerization-reactive group.

該等中,關於式(A)所表示之反應性官能基與另一反應性官能基之較佳組合,就可以1種寡聚茀化合物製造聚酯之方面而言,可列舉:式(A)為酯基且另一反應性官能基為羥基之組合、式(A)為羧基且另一反應性官能基為羥基之組合、及式(A)為酯基且另一反應性官能基為羥基酯基之組合。又,該段落中之酯基、羥基、羧基、及羥基酯基係與上述段落中所例示之作為反應性官能基之具體結構之酯基、羥基、羧基、及羥基酯基含義相同。 Among these, regarding a preferable combination of the reactive functional group represented by the formula (A) and another reactive functional group, in terms of producing a polyester from one oligomeric fluorene compound, the formula (A) ) Is an ester group and another reactive functional group is a hydroxy group, formula (A) is a carboxyl group and another reactive functional group is a hydroxy group, and formula (A) is an ester group and the other reactive functional group is A combination of hydroxyester groups. The ester group, the hydroxyl group, the carboxyl group, and the hydroxyl ester group in this paragraph have the same meanings as the ester group, the hydroxyl group, the carboxyl group, and the hydroxyl ester group of the specific structure as the reactive functional group illustrated in the above paragraph.

<2.2具體之結構> <2.2 Specific Structure>

作為本發明之寡聚茀A2,具體而言,可較佳地使用下述通式(2)所表示者。 As the oligomeric fluorene A2 of the present invention, specifically, those represented by the following general formula (2) can be preferably used.

式(2)中,R3分別獨立為直接鍵、或可具有取代基之碳數1~4之伸烷基。 In formula (2), R 3 is each independently a direct bond or an alkylene group having 1 to 4 carbon atoms which may have a substituent.

R4~R9分別獨立為氫原子、可具有取代基之碳數1~10之烷基、可具有取代基之碳數4~10之芳基、可具有取代基之碳數1~10之醯基、可具有取代基之碳數1~10之醯氧基、可具有取代基之碳數1~10 之烷氧基、可具有取代基之碳數1~10之芳氧基、可具有取代基之胺基、可具有取代基之碳數1~10之乙烯基、可具有取代基之碳數1~10之乙炔基、具有取代基之硫原子、具有取代基之矽原子、鹵素原子、硝基、或氰基。其中,R4~R9中鄰接之至少2個基亦可相互鍵結而形成環。 R 4 to R 9 are each independently a hydrogen atom, an alkyl group having 1 to 10 carbons that may have a substituent, an aryl group having 4 to 10 carbons that may have a substituent, and 1 to 10 carbons that may have a substituent Fluorenyl, fluorenyloxy having 1 to 10 carbons which may have a substituent, alkoxyl having 1 to 10 carbons which may have a substituent, aryloxy having 1 to 10 carbons which may have a substituent, may have Substituent amino group, vinyl group having 1 to 10 carbon atoms which may have a substituent, ethynyl group having 1 to 10 carbon atoms which may have a substituent, sulfur atom having a substituent, silicon atom having a substituent, halogen atom , Nitro, or cyano. Among them, at least two adjacent groups in R 4 to R 9 may be bonded to each other to form a ring.

R10為直接鍵、可經取代之碳數1~10之伸烷基、可經取代之碳數4~10之伸芳基、或可經取代之碳數6~10之伸芳烷基、或選自由可經取代之碳數1~10之伸烷基、可經取代之碳數4~10之伸芳基及可經取代之碳數6~10之伸芳烷基所組成之群中之2個以上之基由氧原子、可經取代之硫原子、可經取代之氮原子或羰基連結之基。 R 10 is a direct bond, an alkylene group having 1 to 10 carbon atoms that can be substituted, an alkylene group having 4 to 10 carbon atoms that can be substituted, or an alkylene group having 6 to 10 carbon atoms that can be substituted, Or selected from the group consisting of an alkylene group having 1 to 10 carbon atoms that can be substituted, an alkylene group having 4 to 10 carbon atoms that can be substituted, and an alkylene group having 6 to 10 carbon atoms that can be substituted The two or more groups are a group bonded by an oxygen atom, a sulfur atom that may be substituted, a nitrogen atom that may be substituted, or a carbonyl group.

Ra~Rc分別獨立為氫原子、可經取代之碳數1~10之烷基、可經取代之碳數4~10之芳基或可經取代之碳數6~10之芳烷基,X為酯基、醯胺基、羧基、氰基、或硝基。 R a to R c are each independently a hydrogen atom, an alkyl group having 1 to 10 carbon atoms which can be substituted, an aryl group having 4 to 10 carbon atoms which can be substituted or an aralkyl group having 6 to 10 carbon atoms which can be substituted X is an ester group, amidino group, a carboxyl group, a cyano group, or a nitro group.

A為羥基、胺基、酯基、醯胺基、羧基、氰基、或硝基。 A is a hydroxyl group, an amine group, an ester group, a sulfonylamino group, a carboxyl group, a cyano group, or a nitro group.

n表示1~5之整數值。 n represents an integer value from 1 to 5.

上述式(2)中,作為R3,可較佳地使用作為上述式(1)中之R3所例示者。 The above-described formula (2), examples of R 3, may be preferably used as (1) R in the above Formula 3 are exemplified.

進而,作為R4~R9,可較佳地使用作為上述式(1)中之R4~R9所例示者。 Further, as R 4 ~ R 9, may preferably be used as R (1) In the above formula 4 ~ R 9 are illustrated.

又,作為Ra~Rc及X,可較佳地使用作為上述式(A)中之Ra~Rc及X所例示者。 Further, as R a ~ R c and X, may preferably be used as in the above-described formula (A) R a ~ R c and X are exemplified.

作為R10,可較佳地使用於下述之<4.1 2價之寡聚茀>中作為取代基α1及α2所例示者。 As R 10 , those exemplified as the substituents α 1 and α 2 in the following <4.1 divalent oligomeric fluorene> can be preferably used.

A中之「酯基、醯胺基」可較佳地使用作為上述式(A)中之X之「酯基、醯胺基」所例示者。 The "ester group and fluorenylamino group" in A can be preferably exemplified as the "ester group and sulfonylamino group" of X in the formula (A).

又,A中「胺基」之具體結構並無特別限定,例如可列舉:(i)於氮原子具有2個氫原子之一級胺基、(ii)於氮原子具有氫原子與碳數1~10之有機取代基之二級胺基、(iii)於氮原子分別獨立地具有2個碳數1~10之有機取代基之三級胺基。作為碳數1~10之有機取代基,可較佳地使用作為上述式(A)之X之「酯基」中之碳數1~10之有機取代基所例示者。 The specific structure of the "amine group" in A is not particularly limited, and examples thereof include (i) a first-order amine group having two hydrogen atoms in a nitrogen atom, and (ii) a hydrogen atom and a carbon number of 1 to a nitrogen atom. The secondary amine group of the organic substituent of 10, (iii) the tertiary amine group of the organic atom having two carbon substituents of 1 to 10 each independently on the nitrogen atom. As the organic substituent having 1 to 10 carbon atoms, those exemplified as the organic substituent having 1 to 10 carbon atoms in the "ester group" of X in the formula (A) can be preferably used.

該等中,就可藉由使用1種本發明之寡聚茀A2而製造聚酯、聚醯胺之方面而言,A較佳為羥基或胺基,就製造容易之方面而言,A更佳為羥基。 Among these, in terms of being able to produce polyester or polyamine by using one of the oligomeric amidines A2 of the present invention, A is preferably a hydroxyl group or an amine group, and in terms of ease of production, A is more Preferred is hydroxyl.

<2.3 具有2個不同之反應性官能基之寡聚茀A2之具體例> <2.3 Specific examples of oligomeric fluorene A2 having two different reactive functional groups>

作為本發明之寡聚茀A2之具體例,可列舉:如下述[F]群所示之結構。 Specific examples of the oligomeric fluorene A2 of the present invention include a structure shown in the following [F] group.

[化94] [Chemical 94]

[化95] [Chem 95]

<2.4具有2個不同之反應性官能基之寡聚茀A2之物性> <2.4 Physical properties of oligomeric fluorene A2 having two different reactive functional groups>

係與上述<1.6具有1個反應性官能基之寡聚茀A1之物性>之項中所說明者相同。 It is the same as that described in the item <1.6 Physical properties of oligomeric fluorene A1 having one reactive functional group>.

<2.5具有2個不同之反應性官能基之寡聚茀A2之製造方法> <2.5 Manufacturing method of oligomeric fluorene A2 having two different reactive functional groups>

關於本發明之寡聚茀A2之製造方法,並無特別限定,例如可列舉如下方法:藉由使上述式(1)所表示之寡聚茀、與具有親電子性之化合物進行反應,而製造上述式(2)所表示之寡聚茀A2。 The method for producing the oligomeric fluorene A2 of the present invention is not particularly limited, and examples thereof include a method in which the oligomeric fluorene represented by the above formula (1) is reacted with an electrophilic compound to produce the oligomeric fluorene. The oligomeric fluorene A2 represented by the above formula (2).

以下,將上述式(2)所表示之寡聚茀A2之製造方法以具有親電子性之化合物之種類分為製造法A、製造法B、製造法C、製造法D而進行記載。 Hereinafter, the manufacturing method of the oligomeric fluorene A2 represented by the said Formula (2) is divided into manufacturing method A, manufacturing method B, manufacturing method C, and manufacturing method D by the type of the electrophilic compound, and is described.

<2.5.1製造法A:利用甲醛類之加成之製造方法> <2.5.1 Manufacturing method A: Manufacturing method using addition of formaldehyde>

具有羥甲基作為反應性官能基之下述式(2a)所表示之寡聚茀可於鹼存在下,依據製造法A所表示之反應而自下述式(1)所表示之寡聚茀A1及甲醛類進行製造。 The oligomeric fluorene represented by the following formula (2a) having a methylol group as a reactive functional group can be obtained from the oligomeric fluorene represented by the following formula (1) in the presence of a base in accordance with the reaction represented by the production method A. A1 and formaldehyde.

式(2a)中,R3~R9、Ra~Rc、X及n係與上述式(1)相同。 In the formula (2a), R 3 ~ R 9, R a ~ R c, X and n have the above-described system and the formula (1).

<2.5.1.1甲醛類> <2.5.1.1 Formaldehydes>

所謂製造法A中所使用之甲醛類,只要為可向反應系統中供給甲醛之物質,則無特別限定,可列舉:氣體狀之甲醛、甲醛水溶液、甲醛聚合而成之多聚甲醛、三烷等。該等中,就工業上廉價且因粉末狀而操作容易且可精確地稱量之觀點而言,尤佳為使用多聚甲醛。 The formaldehyde used in the production method A is not particularly limited as long as it can supply formaldehyde to the reaction system. Examples include gaseous formaldehyde, aqueous formaldehyde solution, paraformaldehyde polymerized by formaldehyde, and Alkanes, etc. Among these, the use of paraformaldehyde is particularly preferable from the viewpoint of being industrially inexpensive, easy to handle and accurate weighing due to the powder form.

關於甲醛類之使用量,相對於作為原料之寡聚茀A1,上限並無特別限定,若使用量過多,則有反應後之精製負荷變大之傾向,通常相對於寡聚茀A1為10倍莫耳以下,較佳為5倍莫耳以下,進而較佳為3倍莫耳以下。下限係相對於原料以理論量計為1倍莫耳,因此通常為1倍莫耳以上。為了使反應之進行變快,不使原料或中間物殘留,而亦可相對於原料之寡聚茀A1而多少過量地使用甲醛類。關於此時之較佳之甲醛類之使用量,相對於原料之寡聚茀A1為1.1倍莫耳以上,進而較佳為1.2倍莫耳以上。 Regarding the amount of formaldehyde used, the upper limit is not particularly limited with respect to oligomeric fluorene A1 as a raw material. If the amount of use is too large, the refining load after the reaction tends to increase, which is usually 10 times that of oligomeric fluorene A1. It is preferably 5 times or less, more preferably 3 times or less. The lower limit is 1 mole of the theoretical amount relative to the raw material, and therefore is usually 1 mole or more. In order to make the reaction proceed faster, the starting materials or intermediates are not left, but formaldehydes may be used in an excessive amount relative to the oligomeric A1 of the starting materials. Regarding the preferred amount of formaldehyde used at this time, it is 1.1 times or more, and more preferably 1.2 times or more, relative to the oligomeric fluorene A1 of the raw material.

<2.5.1.2鹼> <2.5.1.2 Alkali>

作為鹼,可使用氫氧化鋰、氫氧化鈉、氫氧化鉀等鹼金屬氫氧化物、氫氧化鈣、氫氧化鋇等鹼土金屬之氫氧化物、碳酸鈉、碳酸氫鈉、碳酸鉀等鹼金屬之碳酸鹽、碳酸鎂、碳酸鈣等鹼土金屬之碳酸鹽、磷酸鈉、磷酸水素鈉、磷酸鉀等磷酸之鹼金屬鹽、正丁基鋰、第三丁基鋰等有機鋰鹽、甲醇鈉、乙醇鈉、第三丁醇鉀等鹼金屬之烷醇鹽、氫化鈉或氫化鉀等氫化鹼金屬鹽、三乙基胺、二氮雜雙環十一烯等三級胺、四甲基氫氧化銨、四丁基氫氧化銨等四級氫氧化銨等。該等可單獨使用1種,亦可併用2種以上。 As the base, alkali metal hydroxides such as lithium hydroxide, sodium hydroxide, and potassium hydroxide; hydroxides of alkaline earth metals such as calcium hydroxide and barium hydroxide; and alkali metals such as sodium carbonate, sodium bicarbonate, and potassium carbonate can be used. Carbonate, magnesium carbonate, calcium carbonate and other alkaline earth metal carbonates, sodium phosphate, sodium phosphate sodium phosphate, potassium phosphate and other phosphoric acid alkali metal salts, organic lithium salts such as n-butyl lithium, third butyl lithium, sodium methoxide, Alkoxides of alkali metals such as sodium ethoxide, potassium tert-butoxide, etc., alkali metal hydrides such as sodium hydride or potassium hydride, tertiary amines such as triethylamine, diazabicycloundecene, and tetramethylammonium hydroxide , Tetrabutylammonium hydroxide, etc. These may be used individually by 1 type, and may use 2 or more types together.

該等中,較佳為於本反應中具有充分之鹼性之鹼金屬之烷氧化物,更佳為工業上廉價之甲醇鈉或乙醇鈉。此處,鹼金屬之烷氧化物可使用粉狀者,亦可使用醇溶液等液狀者。又,亦可使鹼金屬與醇進行反應而製備。 Among these, an alkali metal alkoxide having sufficient basicity in this reaction is preferable, and industrially inexpensive sodium methoxide or sodium ethoxide is more preferable. Here, the alkali metal alkoxide may be used in a powder form or in a liquid form such as an alcohol solution. Alternatively, it may be prepared by reacting an alkali metal with an alcohol.

鹼之使用量之上限並無特別限定,若使用量過多,則有反應後之精製負荷變大之傾向,相對於寡聚茀A1,可為1倍莫耳以下,較佳為0.5倍莫耳以下,進而較佳為0.2倍莫耳以下。另一方面,若鹼之使用量過少,則反應之進行變慢,因此作為下限,通常相對於原料之寡聚茀A1為0.01倍莫耳以上,較佳為0.05倍莫耳以上。 The upper limit of the amount of alkali used is not particularly limited. If the amount is too large, the refining load after the reaction tends to increase. It may be less than 1 mole, and preferably 0.5 times mole, relative to oligomeric A1. Hereinafter, it is more preferably 0.2 times mole or less. On the other hand, if the amount of alkali used is too small, the progress of the reaction is slowed. Therefore, as the lower limit, the oligomeric fluorene A1 of the raw material is usually 0.01 times mole or more, and preferably 0.05 times mole or more.

<2.5.1.3溶劑> <2.5.1.3 Solvent>

製造法A較理想為使用溶劑而進行。 Production method A is preferably performed using a solvent.

關於具體可使用之溶劑,作為烷基腈系溶劑,可列舉乙腈、丙腈等,作為酮系溶劑,可列舉丙酮、甲基乙基酮、甲基異丁基酮等,作為酯系溶劑,可列舉乙酸甲酯、乙酸乙酯、乙酸丙酯、乙酸苯酯、丙酸甲酯、丙酸乙酯、丙酸丙酯、丙酸苯酯、3-甲氧基丙酸甲酯、3-乙氧基丙酸甲酯、乳酸甲酯、乳酸乙酯等直鏈狀之酯類;γ-丁內酯、己內酯等環狀酯類;乙二醇單甲醚乙酸酯、乙二醇單乙醚乙酸酯、乙 二醇單丁醚乙酸酯、丙二醇-1-單甲醚乙酸酯、丙二醇-1-單乙醚乙酸酯等醚酯類等,作為醚系溶劑,可列舉二乙醚、四氫呋喃、1,4-二烷、甲基環戊基醚、第三丁基甲基醚等,作為鹵素系溶劑,可列舉1,2-二氯乙烷、二氯甲烷、氯仿、1,1,2,2-四氯乙烷等,作為鹵素系芳香族烴,可列舉氯苯、1,2-二氯苯等,作為醯胺系溶劑,可列舉N,N-二甲基甲醯胺、N,N,-二甲基乙醯胺等,作為亞碸系溶劑,可列舉二甲基亞碸、環丁碸等,作為環狀式脂肪族烴,可列舉:環戊烷、環己烷、環庚烷、環辛烷等單環狀式脂肪族烴;作為其衍生物之甲基環戊烷、乙基環戊烷、甲基環己烷、乙基環己烷、1,2-二甲基環己烷、1,3-二甲基環己烷、1,4-二甲基環己烷、異丙基環己烷、正丙基環己烷、第三丁基環己烷、正丁基環己烷、異丁基環己烷、1,2,4-三甲基環己烷、1,3,5-三甲基環己烷等;十氫萘等多環狀式脂肪族烴;正戊烷、正己烷、正庚烷、正辛烷、異辛烷、正壬烷、正癸烷、正十二烷、正十四烷等非環狀式脂肪族烴,作為芳香族烴,可列舉甲苯、對二甲苯、鄰二甲苯、間二甲苯等,作為芳香族雜環,可列舉吡啶等,作為醇系溶劑,可列舉甲醇、乙醇、異丙醇、正丁醇、第三丁醇、己醇、辛醇、環己醇等。 Specific solvents that can be used include acetonitrile and propionitrile as the alkyl nitrile solvent, and acetone, methyl ethyl ketone, and methyl isobutyl ketone as the ketone solvent. As the ester solvent, Examples include methyl acetate, ethyl acetate, propyl acetate, phenyl acetate, methyl propionate, ethyl propionate, propyl propionate, phenyl propionate, methyl 3-methoxypropionate, 3- Linear esters such as methyl ethoxypropionate, methyl lactate, ethyl lactate; cyclic esters such as γ-butyrolactone, caprolactone; ethylene glycol monomethyl ether acetate, ethylene glycol Ether esters such as alcohol monoethyl ether acetate, ethylene glycol monobutyl ether acetate, propylene glycol-1-monomethyl ether acetate, propylene glycol-1-monoethyl ether acetate, and the like, and examples thereof include ether solvents Diethyl ether, tetrahydrofuran, 1,4-bis Alkane, methylcyclopentyl ether, third butyl methyl ether, and the like. Examples of the halogen-based solvent include 1,2-dichloroethane, dichloromethane, chloroform, and 1,1,2,2-tetrachloroethane. Examples of the halogen-based aromatic hydrocarbon include chlorobenzene and 1,2-dichlorobenzene. Examples of the fluorene-based solvent include N, N-dimethylformamide and N, N, -dimethyl. Acetylamine and the like include fluorene-based solvents such as dimethyl fluorene and cyclobutane. Examples of the cyclic aliphatic hydrocarbon include cyclopentane, cyclohexane, cycloheptane, and cyclooctane. And other monocyclic aliphatic hydrocarbons; its derivatives are methylcyclopentane, ethylcyclopentane, methylcyclohexane, ethylcyclohexane, 1,2-dimethylcyclohexane, 1 , 3-dimethylcyclohexane, 1,4-dimethylcyclohexane, isopropylcyclohexane, n-propylcyclohexane, third butylcyclohexane, n-butylcyclohexane, Isobutylcyclohexane, 1,2,4-trimethylcyclohexane, 1,3,5-trimethylcyclohexane, etc .; polycyclic aliphatic hydrocarbons such as decahydronaphthalene; n-pentane, Non-cyclic aliphatics such as n-hexane, n-heptane, n-octane, isooctane, n-nonane, n-decane, n-dodecane, n-tetradecane Examples of the hydrocarbon include toluene, para-xylene, o-xylene, and meta-xylene. Examples of the aromatic heterocyclic ring include pyridine. Examples of the alcohol-based solvent include methanol, ethanol, isopropyl alcohol, and the like. N-butanol, tertiary butanol, hexanol, octanol, cyclohexanol and the like.

其中,就有自寡聚茀A1產生之陰離子之溶解性較高,反應之進行良好之傾向之方面而言,較佳為極性溶劑之醯胺系溶劑、或亞碸系溶劑,尤佳為N,N-二甲基甲醯胺。 Among them, in terms of the high solubility of anions generated from oligomeric fluorene A1 and the tendency of the reaction to proceed well, a fluorene-based solvent or a fluorene-based solvent is preferred, and N is particularly preferred. , N-dimethylformamide.

該等溶劑可單獨使用1種,亦可混合2種以上使用。關於溶劑之使用量,上限並無特別限制,若考慮每個反應器之目標物之產生效率,則通常使用如成為原料之寡聚茀A1之10倍體積量、較佳為7倍體積量、進而較佳為4倍體積量之量。另一方面,若溶劑之使用量過少,則有攪拌變困難並且反應之進行變慢之傾向,因此作為下限,通常使用如成為原料之寡聚茀A1之1倍體積量、較佳為2倍體積量、進 而較佳為3倍體積量之量。 These solvents may be used alone or in combination of two or more. With regard to the amount of solvent used, the upper limit is not particularly limited. If the production efficiency of the target substance in each reactor is considered, 10 times the volume, preferably 7 times the volume of oligomeric A1, which is the raw material, is usually used. It is more preferably an amount of 4 times the volume. On the other hand, if the amount of the solvent used is too small, stirring tends to be difficult and the progress of the reaction tends to be slow. Therefore, as the lower limit, the volume of the oligomeric A1, which is the raw material, is usually 1 times the volume, preferably 2 times. Volume, feed It is preferably an amount of 3 times the volume.

<2.5.1.4反應形式> <2.5.1.4 Reaction form>

進行製造法A時,反應之形式可採用分批式反應,亦可採用流通式反應,亦可採用組合該等而成者,其形式並無特別限制。 When the manufacturing method A is carried out, the reaction may be performed in a batch manner, a flow-through reaction, or a combination of these, and the form is not particularly limited.

關於批次式之情形時反應試劑向反應器之投入方法,可知於反應開始時將鹼一次性添加之情形時,分解反應容易進行,因此,較佳為於添加原料之寡聚茀A1、甲醛類、及溶劑後,少量多次地逐次添加鹼。 Regarding the method of adding the reaction reagent to the reactor in the case of batch type, it can be seen that when the base is added once at the beginning of the reaction, the decomposition reaction is easy to proceed. Therefore, it is preferable to add oligomeric A1 and formaldehyde as raw materials. After adding solvents and solvents, a small amount of alkali is added successively.

<2.5.1.5反應條件> <2.5.1.5 Reaction conditions>

關於製造法A,可知有如下傾向:若溫度過低,則無法獲得充分之反應速度,反之若溫度過高,則分解反應進行,較理想為進行溫度管理。因此,於使用作為最佳溶劑之N,N-二甲基甲醯胺與作為最佳鹼之乙醇鈉之情形時,通常於下限-50℃且上限30℃下實施。具體而言,於R3為亞甲基之情形時,關於反應溫度之上限,係於較佳為20℃、更佳為10℃下實施。另一方面,關於下限,係於較佳為-20℃、更佳為0℃以上下實施。於R3為伸乙基之情形時,關於反應溫度之上限,係於較佳為25℃、更佳為20℃下實施。關於下限,係於較佳為0℃、更佳為10℃以上下實施。 With regard to the manufacturing method A, it is found that if the temperature is too low, a sufficient reaction rate cannot be obtained, while if the temperature is too high, the decomposition reaction proceeds, and it is desirable to perform temperature management. Therefore, when using N, N-dimethylformamidine as an optimal solvent and sodium ethoxide as an optimal base, it is usually carried out at a lower limit of -50 ° C and an upper limit of 30 ° C. Specifically, when R 3 is a methylene group, the upper limit of the reaction temperature is preferably performed at 20 ° C, more preferably 10 ° C. On the other hand, the lower limit is implemented at a temperature of preferably -20 ° C, more preferably 0 ° C or higher. In the case where R 3 is ethylene, the upper limit of the reaction temperature is preferably 25 ° C., and more preferably 20 ° C. The lower limit is preferably implemented at 0 ° C, more preferably 10 ° C or higher.

<2.5.1.6目標物之分離‧精製> <2.5.1.6 Separation and purification of target>

反應結束後,作為目標物之式(2a)所表示之寡聚茀可藉由將反應液添加於稀鹽酸等酸性水中,或者將稀鹽酸等酸性水添加於反應液中,使作為目標物之式(2a)所表示之寡聚茀析出而進行單離。 After the completion of the reaction, the oligomeric fluorene represented by the formula (2a) as the target can be added to the reaction solution by adding the reaction solution to acidic water such as dilute hydrochloric acid, or the reaction solution to add the reaction solution to the target solution. The oligomeric tritium represented by the formula (2a) is precipitated and separated.

又,反應結束後,亦可將作為目標物之式(2a)所表示之寡聚茀可溶之溶劑與水添加於反應液而進行萃取。藉由溶劑而萃取之目標物可藉由將溶劑進行濃縮之方法、或添加不良溶劑之方法等而進行單離。 After completion of the reaction, an oligomeric fluorene-soluble solvent and water represented by the formula (2a) as a target substance may be added to the reaction solution to perform extraction. The target substance extracted by the solvent can be isolated by a method of concentrating the solvent or a method of adding a poor solvent.

所獲得之式(2a)所表示之寡聚茀可作為聚合物原料而直接用於聚 合,亦可於進行精製後進行聚合。作為精製法,可採用通常之精製法,例如再結晶或再沈澱、萃取精製、管柱層析法等,並無限制。 The obtained oligomeric fluorene represented by the formula (2a) can be directly used as a polymer raw material for polymerization. It can also be polymerized after purification. As the purification method, ordinary purification methods such as recrystallization or reprecipitation, extraction purification, and column chromatography can be used without limitation.

金屬成分之存在於聚合反應中成為問題之情況較多,關於長週期型週期表第1族與第2族金屬於單體中之含有比例,可設為500質量ppm以下、更佳為200質量ppm以下、進而較佳為50質量ppm以下、尤佳為10質量ppm以下。為了去除金屬成分,通常分液操作非常有效,作為目標物之式(2a)所表示之寡聚茀有僅溶解於N,N-二甲基甲醯胺或四氫呋喃等高極性溶劑之傾向,因此於二層系中進行之分液操作非常困難之情形較多。另一方面,即便針對反應停止後之析出物進行水洗、利用任意之溶劑之熱懸浮清洗等通常之精製處理,亦難以充分去除所混入之金屬成分,而有於析出物中殘留數100質量ppm左右之金屬成分之情形。作為用以去除金屬成分之良好之精製法,較佳為簡單且有效之無機鹽去除法,即使包含雜質之反應析出物溶解於N,N-二甲基甲醯胺、四氫呋喃等溶解性相對較高之溶劑後,添加於水中而進行析出之方法。 The presence of metal components is often a problem in the polymerization reaction. Regarding the long-period periodic table, the proportion of metals in Group 1 and Group 2 in the monomer can be 500 mass ppm or less, and more preferably 200 mass. ppm or less, more preferably 50 mass ppm or less, and even more preferably 10 mass ppm or less. In order to remove metal components, the liquid separation operation is usually very effective. The oligomeric fluorene represented by the formula (2a) as a target substance tends to dissolve only in highly polar solvents such as N, N-dimethylformamide or tetrahydrofuran. In many cases, the liquid separation operation in the two-layer system is very difficult. On the other hand, even if the precipitates after the reaction is stopped are subjected to ordinary purification treatments such as water washing and hot suspension washing with an arbitrary solvent, it is difficult to sufficiently remove the mixed metal components, and some 100 mass ppm remain in the precipitates. The situation of the left and right metal components. As a good refining method for removing metal components, a simple and effective inorganic salt removal method is preferred, even if the reaction precipitate containing impurities is dissolved in N, N-dimethylformamide, tetrahydrofuran, etc. A method in which a high solvent is added to water for precipitation.

<2.5.2製造法B:利用具有吸電子性基之烯烴之加成反應之製造方法> <2.5.2 Manufacturing method B: Manufacturing method using addition reaction of olefin having electron withdrawing group>

下述式(2b)所表示之寡聚茀可於鹼存在下,依據製造法B所表示之反應,自下述式(1)所表示之寡聚茀A1、及與上述式(4)不同之具有拉電子基之烯烴(4-2)進行製造。 The oligomeric fluorene represented by the following formula (2b) may be different from the oligomeric fluorene A1 represented by the following formula (1) according to the reaction represented by the manufacturing method B in the presence of a base, according to the reaction represented by the manufacturing method B: The olefin (4-2) having an electron-drawing group is produced.

式(2b)中,R3~R9、Ra~Rc、X及n係與上述式(1)相同。又,Ra2~Rc2分別獨立為氫原子、可經取代之碳數1~10之烷基、可經取代之碳數4~10之芳基或可經取代之碳數6~10之芳烷基,Xa為酯基、醯胺基、羧基、氰基、或硝基。其中,Ra~Rc及X與Ra2~Rc2及Xa至少任意一個不同。 In the formula (2b), R 3 ~ R 9, R a ~ R c, X and n have the above-described system and the formula (1). In addition, R a2 to R c2 are each independently a hydrogen atom, an alkyl group having 1 to 10 carbon atoms that can be substituted, an aryl group having 4 to 10 carbon atoms that can be substituted, or an aromatic group having 6 to 10 carbon atoms that can be substituted. Alkyl, Xa is ester, amido, carboxy, cyano, or nitro. Among them, R a to R c and X are different from at least one of R a2 to R c2 and Xa.

作為Ra2~Rc2及Xa,可較佳地採用作為式(A)中之Ra~Rc及X所例示者,於Ra~Rc及X、與Ra2~Rc2及Xa中,必須使至少任意1個不同。尤其是就連同將源自不同之反應性官能基之特定物性簡單地向樹脂進行賦予之觀點而言,較佳為式(2b)中X與Xa並不相同。 As R a2 ~ R c2 and Xa, may preferably be employed as in the formula (A) R a ~ R c and X are exemplified by, in R a ~ R c and X, and R a2 ~ R c2 and Xa in You must make at least one of them different. In particular, from the viewpoint of simply imparting specific physical properties derived from different reactive functional groups to the resin, it is preferable that X and Xa are different from each other in the formula (2b).

式(2b)所表示之寡聚茀可依據製造上述式(1)所表示之寡聚茀A1之方法而進行製造。此時,可於製造寡聚茀A1後,進行單離、精製,之後進行製造,亦可使式(3)所表示之寡聚茀與具有式(4)所表示之吸電子性基之烯烴進行反應後,繼而與具有式(4-2)所表示之吸電子性基之烯烴進行反應。 The oligomeric fluorene represented by the formula (2b) can be produced according to the method for producing the oligomeric fluorene A1 represented by the above formula (1). In this case, after the oligomeric fluorene A1 is produced, it may be isolated, refined, and then manufactured. The oligomeric fluorene represented by formula (3) and the olefin having an electron-withdrawing group represented by formula (4) may also be used. After the reaction, the reaction is further performed with an olefin having an electron-withdrawing group represented by the formula (4-2).

<2.5.3製造法C:利用寡聚茀A1之烷基化、水解反應之式(2c)所表示之寡聚茀之製造法)> <2.5.3 Manufacturing Method C: Manufacturing method of oligomeric fluorene represented by formula (2c) using alkylation and hydrolysis reaction of oligomeric fluorene A1)>

下述式(2c)所表示之寡聚茀可利用經過藉由寡聚茀A1與式(8)所表示之烷化劑之烷基化反應而合成具有式(2c-1)所表示之脫離基之寡聚茀之步驟(步驟(ia))、與繼而水解反應(步驟(iia))之方法而進行製造,又,亦可藉由經過藉由寡聚茀A1與式(9)所表示之烷化劑之烷基化反應而合成具有式(2c-2)所表示之保護基之寡聚茀的步驟(步驟(ib))、與繼而水解反應(步驟(iib))之方法等方法而進行製造。 The oligomeric fluorene represented by the following formula (2c) can be synthesized by using an alkylation reaction between the oligomeric fluorene A1 and the alkylating agent represented by the formula (8) to have a detachment represented by the formula (2c-1). The oligomeric fluorene step (step (ia)) and the subsequent hydrolysis reaction (step (ia)) can be produced, and can also be expressed by oligomeric fluorene A1 and formula (9) A method (step (ib)) for synthesizing an oligomeric fluorene having a protecting group represented by formula (2c-2), an alkylation reaction of an alkylating agent, and a method for subsequent hydrolysis reaction (step (iib)) And manufacture.

[化99] [Chemical 99]

式中,R3~R9、Ra~Rc、X及n係與上述式(1)相同。R10係與上述式(2)之R10相同。 In the formula, R 3 ~ R 9, R a ~ R c, X , and n lines of the above formula (1). R 10 is the same as R 10 in the formula (2).

又,Xb及Xc表示脫離基。作為脫離基之例,可列舉:鹵素原子(將氟除外)、甲磺醯基、或甲苯磺醯基等。 Xb and Xc represent a radical. Examples of the leaving group include a halogen atom (excluding fluorine), a methanesulfonyl group, or a tosylsulfonyl group.

T表示保護基。作為保護基之例,可列舉:甲氧基甲基、2-甲氧基乙氧基甲基、四氫哌喃基或第三丁氧基羰基、苄氧基羰基、三甲基矽烷基、或第三丁基二甲基矽烷基等。 T represents a protecting group. Examples of the protecting group include a methoxymethyl group, a 2-methoxyethoxymethyl group, a tetrahydropiperanyl group or a third butoxycarbonyl group, a benzyloxycarbonyl group, a trimethylsilyl group, Or the third butyldimethylsilyl group.

茀類之烷基化反應眾所周知,例如報告有9,9-雙(溴己基)茀或9,9-雙(碘己基)茀等9,9-雙(鹵烷基)茀(J.Org.Chem.,2010,75,2714.)。根據該等之見解,可藉由以寡聚茀A為原料而合成具有脫離基之寡聚茀。又,關於鹵素之水解,已知有較多之報告例(Bull.Korean Chem.Soc.,2008,29.2491.),可藉由該路徑而合成式(2c)所表示之寡聚茀。 The alkylation reaction of amidines is well known. For example, 9,9-bis (bromohexyl) fluorene or 9,9-bis (iodohexyl) fluorene and other 9,9-bis (haloalkyl) fluorene (J. Org. Chem., 2010, 75, 2714.). Based on these findings, an oligomeric fluorene having a leaving group can be synthesized by using oligomeric fluorene A as a raw material. Further, there are many reported examples of hydrolysis of halogens (Bull. Korean Chem. Soc., 2008, 29.2491.), And the oligomeric fluorene represented by the formula (2c) can be synthesized through this route.

作為步驟(ia)中所使用之烷化劑,可列舉:二碘甲烷、1,2-二碘乙烷、1,3-二碘丙烷、1,4-二碘丁烷、1,5-二碘戊烷、1,6-二碘己烷、二溴甲烷、1,2-二溴乙烷、1,3-二溴丙烷、1,4-二溴丁烷、1,5-二溴戊烷、1,6-二溴己烷、二氯甲烷、1,2-二氯乙烷、1,3-二氯丙烷、1,4-二氯丁烷、1,5-二氯戊烷、1,6-二氯己烷、1-溴-3-氯丙烷等直鏈狀之烷基二鹵化物(將氟原子除外)、2,2-二甲基-1,3-二氯丙烷等包含側鏈之烷基二鹵化物(將氟原子除外)、1,4-雙(溴甲基)苯、1,3-雙(溴甲基)苯等芳烷基二鹵化物(將氟原子除外)、乙二醇二甲磺酸酯、乙二醇二對甲苯磺酸酯、丙二醇二甲磺酸酯、四亞甲基二醇二甲磺酸酯等二醇之 二磺酸酯等。 Examples of the alkylating agent used in step (ia) include diiodomethane, 1,2-diiodoethane, 1,3-diiodopropane, 1,4-diiodobutane, and 1,5- Diiodopentane, 1,6-diiodohexane, dibromomethane, 1,2-dibromoethane, 1,3-dibromopropane, 1,4-dibromobutane, 1,5-dibromopentane Alkane, 1,6-dibromohexane, dichloromethane, 1,2-dichloroethane, 1,3-dichloropropane, 1,4-dichlorobutane, 1,5-dichloropentane, Linear alkyl dihalides (excluding fluorine atoms) such as 1,6-dichlorohexane and 1-bromo-3-chloropropane, 2,2-dimethyl-1,3-dichloropropane, etc. Aryl dihalides containing side chains (excluding fluorine atoms), 1,4-bis (bromomethyl) benzene, 1,3-bis (bromomethyl) benzene, etc. (Except), glycols such as ethylene glycol dimethylsulfonate, ethylene glycol di-p-toluenesulfonate, propylene glycol dimethylsulfonate, tetramethylene glycol dimethylsulfonate, etc. Disulfonate, etc.

作為步驟(ib)中所使用之烷化劑,可列舉:3-溴丙醇、2-溴丙醇、3-氯-2,2-二甲基-1-丙醇等鹵烷醇之保護化體等。 Examples of the alkylating agent used in step (ib) include protection of haloalkanols such as 3-bromopropanol, 2-bromopropanol, and 3-chloro-2,2-dimethyl-1-propanol.化 体 etc.

<2.5.4.製造法D:利用寡聚茀A1之烷基化之式(2d)所表示之寡聚茀之製造法)> <2.5.4. Manufacturing method D: Manufacturing method using oligomeric fluorene represented by formula (2d) using alkylation of oligomeric fluorene A1)>

式(2d)所表示之寡聚茀可藉由寡聚茀A1與式(10)所表示之烷化劑之烷基化反應而進行製造。 The oligomeric fluorene represented by the formula (2d) can be produced by an alkylation reaction between the oligomeric fluorene A1 and the alkylating agent represented by the formula (10).

式(10)中,Xb及R10係與上述式(8)相同。R21係與Rg相同。 In the formula (10), Xb and R 10 are the same as those in the formula (8). R 21 is the same as R g .

式(2d)中,R3~R9、Ra~Rc、X及n係與上述式(1)相同。 In the formula (2d), R 3 ~ R 9, R a ~ R c, X and n have the above-described system and the formula (1).

為式(2d)之寡聚茀,且R10為直接鍵以外者可藉由於鹼存在下,利用與作為<2.5.3製造法C>中之步驟(ia)或(iib)所記載之方法相同之方法,使寡聚茀A1與式(10)所表示之烷化劑進行烷基化反應而進行製造。 It is an oligomeric fluorene of formula (2d), and R 10 is other than a direct bond. The method described in step (ia) or (iib) in <2.5.3 Manufacturing Method C> can be used in the presence of a base. In the same manner, oligomeric fluorene A1 is produced by subjecting an alkylating agent represented by formula (10) to an alkylation reaction.

作為製造法D所使用之烷化劑,可列舉:氯乙酸甲酯、氯乙酸乙酯、氯乙酸丙酯、氯乙酸正丁酯、氯乙酸第三丁酯、溴乙酸甲酯、溴乙酸乙酯、溴乙酸第三丁酯、碘乙酸甲酯、碘乙酸乙酯、碘乙酸第三丁酯、氯丙酸甲酯、氯丙酸乙酯、氯丙酸第三丁酯、溴丙酸甲酯、溴丙酸乙酯、溴丙酸第三丁酯、碘丙酸甲酯、碘丙酸乙酯、碘丙酸第三丁酯等鹵烷酸烷基酯、4-氯甲基苯甲酸甲酯、4-溴甲基苯甲酸甲酯、4-氯甲基苯甲酸乙酯、4-溴甲基苯甲酸乙酯、3-氯甲基苯甲酸甲酯、3-溴甲基苯甲酸甲酯等鹵烷基苯甲酸烷基酯等。 Examples of the alkylating agent used in Production Method D include methyl chloroacetate, ethyl chloroacetate, propyl chloroacetate, n-butyl chloroacetate, third butyl chloroacetate, methyl bromoacetate, and ethyl bromoacetate. Ester, tert-butyl bromoacetate, methyl iodoacetate, ethyl iodoacetate, tert-butyl iodoacetate, methyl chloropropionate, ethyl chloropropionate, tert-butyl chloropropionate, methyl bromopropionate Esters, ethyl bromopropionate, third butyl bromopropionate, methyl iodopropionate, ethyl iodopropionate, third butyl iodopropionate, and other alkyl halides, 4-chloromethylbenzoic acid Methyl ester, methyl 4-bromomethylbenzoate, ethyl 4-chloromethylbenzoate, ethyl 4-bromomethylbenzoate, methyl 3-chloromethylbenzoate, 3-bromomethylbenzoate Haloalkyl benzoates, such as methyl esters, and the like.

<3寡聚茀組合物> <3 oligomeric fluorene composition>

本發明之寡聚茀組合物包含寡聚茀A1(具有1個反應性官能基之寡聚茀化合物)及/或寡聚茀A2(具有2個不同之反應性官能基之寡聚茀化合物)(以下,有將該等進行歸納而略記為「寡聚茀A」之情形)、與具有與該寡聚茀A不同之化學結構之下述之寡聚茀B。尤其是就連同控制樹脂之聚合速度或分子量等之觀點而言,較佳為包含寡聚茀A1,另一方面,就連同簡單地獲得原因在於2種以上反應性官能基之樹脂物性等之觀點而言,較佳為包含寡聚茀A2。 The oligomeric fluorene composition of the present invention comprises oligomeric fluorene A1 (oligomeric fluorene compound having 1 reactive functional group) and / or oligomeric fluorene A2 (oligomeric fluorene compound having 2 different reactive functional groups) (Hereinafter, these may be summarized and abbreviated as "oligomeric fluorene A.") and the following oligomeric fluorene B having a chemical structure different from the oligomeric fluorene A. Especially from the viewpoint of controlling the polymerization rate and molecular weight of the resin, it is preferable to include oligomeric fluorene A1. On the other hand, from the viewpoint of simply obtaining the physical properties of the resin due to two or more reactive functional groups, etc. In terms of oligomeric fluorene A2, it is preferred.

<3.1寡聚茀B> <3.1 Oligomeric B>

上述寡聚茀B包含寡聚茀結構單元(以下,稱為寡聚茀結構單元b),其係可具有取代基之2個以上之茀單元b之9位之碳原子彼此經由可具有取代基之伸烷基、可具有取代基之伸芳基、或可具有取代基之伸芳烷基而鏈狀地鍵結而成,且於該寡聚茀結構單元b中之兩末端之茀單元b之9位之碳原子具有下述式(B)所表示之相同之反應性官能基。 The oligomeric fluorene B includes an oligomeric fluorene structural unit (hereinafter referred to as an oligomeric fluorene structural unit b), which is a carbon atom at the 9 position of the fluorene unit b which may have two or more substituents, and may have a substituent through each other. An alkylene group which may have a substituent, or an aralkyl group which may have a substituent, which is chain-bonded, and is a fluorene unit b at both ends of the oligomeric fluorene structure unit b The 9-position carbon atom has the same reactive functional group represented by the following formula (B).

式(B)中,Rd~Rf分別獨立為氫原子、可經取代之碳數1~10之烷基、可經取代之碳數4~10之芳基或可經取代之碳數6~10之芳烷基,X為酯基、醯胺基、羧基、氰基、或硝基。*係與茀單元b之9位之碳原子之鍵結鍵。 In formula (B), R d to R f are each independently a hydrogen atom, an alkyl group having 1 to 10 carbon atoms that can be substituted, an aryl group having 4 to 10 carbon atoms that can be substituted, or 6 carbon atoms that can be substituted Aralkyl of ~ 10, X is ester, amido, carboxy, cyano, or nitro. * It is bonded to the carbon atom at position 9 of the fluorene unit b.

作為鍵結茀單元b之伸烷基、伸芳基、及伸芳烷基,可分別較佳地採用<1.1伸烷基、伸芳基、伸芳烷基>中所例示者。又,鍵結茀單元b之基可與寡聚茀中鍵結茀單元a之基相同,亦可不同。就連同可 同時製造之觀點而言,較佳為與寡聚茀中鍵結茀單元a之基相同。 As the alkylene group, alkylene group, and alkylene group of bonded fluorene unit b, those exemplified in <1.1 alkylene group, alkylene group, alkylene group, and the like can be preferably used, respectively. The group of the bonded fluorene unit b may be the same as or different from the group of the bonded fluorene unit a in the oligomeric fluorene. Together with From the viewpoint of simultaneous production, it is preferably the same as the base of the bond-binding unit a in the oligomeric fluorene.

同樣地,作為茀單元a可具有之取代基,可較佳地採用<1.2茀單元a可具有之取代基>中所例示者。 Similarly, as the substituent which the fluorene unit a may have, those exemplified in <1.2 The substituent which the fluorene unit a may have> are preferably used.

同樣地,作為式(B)中之Rd~Rf及X1,可分別較佳地採用<1.3反應性官能基>中作為Ra~Rc及X所例示者。又,式(B)中之Rd~Rf及X1可與寡聚茀中之式(A)之Ra~Rc及X相同,亦可不同。就連同可同時製造之觀點而言,較佳為與寡聚茀中之式(A)之Ra~Rc及X相同。 Similarly, as R d to R f and X 1 in the formula (B), those exemplified as R a to R c and X in <1.3 reactive functional group> can be preferably used, respectively. Moreover, R d to R f and X 1 in the formula (B) may be the same as or different from R a to R c and X in the formula (A) in the oligomeric fluorene. From the viewpoint of simultaneous production, it is preferably the same as R a to R c and X of the formula (A) in the oligomeric fluorene.

<3.2寡聚茀B之具體結構> <3.2 Specific Structure of Oligomeric B>

作為本發明之寡聚茀B,具體而言,可較佳地使用下述通式(7)所表示者。 As the oligomeric fluorene B of the present invention, specifically, those represented by the following general formula (7) can be preferably used.

式(7)中,R13分別獨立為直接鍵、可具有取代基之碳數1~4之伸烷基,R14~R19分別獨立為氫原子、可具有取代基之碳數1~10之烷基、可具有取代基之碳數4~10之芳基、可具有取代基之碳數1~10之醯基、可具有取代基之碳數1~10之醯氧基、可具有取代基之碳數1~10之烷氧基、可具有取代基之碳數1~10之芳氧基可具有取代基之胺基、可具有取代基之碳數1~10之乙烯基、可具有取代基之碳數1~10之乙炔基、具有取代基之硫原子、具有取代基之矽原子、鹵素原子、硝基、或氰基。其中,R14~R19中鄰接之至少2個基亦可相互鍵結而形成環。 In formula (7), R 13 is each independently a direct bond and an alkyl group having 1 to 4 carbon atoms which may have a substituent, and R 14 to R 19 are each independently a hydrogen atom and 1 to 10 carbon atoms which may have a substituent. An alkyl group, an aryl group having 4 to 10 carbon atoms which may have a substituent, a fluorenyl group having 1 to 10 carbon atoms which may have a substituent, a fluorenyl group having 1 to 10 carbon atoms which may have a substituent, may have a substituent Alkoxy groups having 1 to 10 carbon atoms, aryloxy groups having 1 to 10 carbon atoms which may have substituents, amine groups having substituents, vinyl groups having 1 to 10 carbon atoms which may have substituents, may have The acetylene group having 1 to 10 carbon atoms of the substituent, a sulfur atom having a substituent, a silicon atom having a substituent, a halogen atom, a nitro group, or a cyano group. Among them, at least two adjacent groups in R 14 to R 19 may be bonded to each other to form a ring.

Rd~Rf分別獨立為氫原子、可經取代之碳數1~10之烷基、可經 取代之碳數4~10之芳基或可經取代之碳數6~10之芳烷基,X1為酯基、醯胺基、羧基、氰基、或硝基。 R d to R f are each independently a hydrogen atom, an alkyl group having 1 to 10 carbon atoms that can be substituted, an aryl group having 4 to 10 carbon atoms that can be substituted or an aralkyl group that can be substituted with 6 to 10 carbon atoms X 1 is an ester group, amidino group, a carboxyl group, a cyano group, or a nitro group.

n表示1~5之整數值。 n represents an integer value from 1 to 5.

作為式(7)中之R13,可較佳地採用作為式(1)中之R3所例示者。同樣地,作為式(7)中之R14~R19,可較佳地採用作為式(1)中之R4~R9所例示者。又,作為式(7)中之Rd~Rf,可較佳地採用作為式(1)中之Ra~Rc所例示者。進而,作為式(7)中之X1,可較佳地採用作為式(1)中之X所例示者。作為式(7)中之n,可較佳地採用作為式(1)中之n所例示者。 As R 13 in formula (7), those exemplified as R 3 in formula (1) can be preferably used. Similarly, as R 14 to R 19 in the formula (7), those exemplified as R 4 to R 9 in the formula (1) can be preferably used. In addition, as R d to R f in the formula (7), those exemplified as R a to R c in the formula (1) can be preferably used. Furthermore, as X 1 in the formula (7), those exemplified as X in the formula (1) can be preferably used. As n in the formula (7), those exemplified as n in the formula (1) can be preferably used.

<3.3寡聚茀B之具體例> <3.3 Specific Examples of Oligomeric B>

作為本發明之寡聚茀B之具體例,可列舉如下述[G]群所示之結構。 Specific examples of the oligomeric fluorene B of the present invention include a structure shown in the following [G] group.

[化105] [Chem. 105]

<3.4含量> <3.4 content>

關於本發明之寡聚茀組合物中之上述寡聚茀A之含量,並無特別限定,就連同控制聚合物之分子量之觀點而言,較佳為0.1質量%以上,更佳為0.5質量%以上,進而更佳為1質量%以上,又較佳為60質量%以下,更佳為50質量%以下,進而更佳為40質量%以下。 The content of the oligomeric fluorene A in the oligomeric fluorene composition of the present invention is not particularly limited, and from the viewpoint of controlling the molecular weight of the polymer, it is preferably 0.1% by mass or more, more preferably 0.5% by mass Above, still more preferably 1% by mass or more, still more preferably 60% by mass or less, still more preferably 50% by mass or less, still more preferably 40% by mass or less.

關於本發明之寡聚茀組合物中之上述寡聚茀B之含量,並無特別限定,就連同提高聚合物之聚合度之觀點而言,較佳為5質量%以上,更佳為10質量%以上,進而較佳為15質量%以上。又,較佳為60質量%以下,更佳為50質量%以下,進而更佳為40質量%以下。 The content of the oligomeric fluorene B in the oligomeric fluorene composition of the present invention is not particularly limited. From the viewpoint of improving the polymerization degree of the polymer, it is preferably 5% by mass or more, and more preferably 10% by mass. % Or more, and more preferably 15% by mass or more. The content is preferably 60% by mass or less, more preferably 50% by mass or less, and even more preferably 40% by mass or less.

又,關於寡聚茀組合物所包含之寡聚茀A及寡聚茀B之含有比例,並無特別限定,就連同控制聚合物之分子量之觀點而言,組合物中所包含之寡聚茀A與寡聚茀B之莫耳比(寡聚茀A之莫耳數/寡聚茀B之莫耳數)較佳為0.001以上,更佳為0.005以上,進而較佳為0.01以 上,又,就連同提高聚合物之聚合度之觀點而言,較佳為0.05以下,更佳為0.03以下,進而較佳為0.02以下。 The content ratio of oligomeric A and oligomeric B included in the oligomeric fluorene composition is not particularly limited. From the viewpoint of controlling the molecular weight of the polymer, the oligomeric fluorene included in the composition is not limited. The molar ratio of A to oligomeric fluorene B (molar number of oligomeric fluorene A / mollar number of oligomeric fluorene B) is preferably 0.001 or more, more preferably 0.005 or more, and still more preferably 0.01 or more. From the viewpoint of improving the polymerization degree of the polymer, it is preferably 0.05 or less, more preferably 0.03 or less, and even more preferably 0.02 or less.

關於寡聚茀組合物中所包含之寡聚茀A或寡聚茀B之莫耳數,例如可自HPLC分析之面積%,使用校正曲線而進行估算。 The mole number of the oligomeric fluorene A or the oligomeric fluorene B contained in the oligomeric fluorene composition can be estimated, for example, by using a calibration curve from the area% analyzed by HPLC.

<4樹脂組合物> <4 resin composition>

使用本發明之寡聚茀而可製造樹脂組合物。 A resin composition can be produced by using the oligomeric fluorene of the present invention.

於使用寡聚茀A作為寡聚茀之情形時,例如可獲得由末端具有下述式(5)所示之結構之聚合物所成之樹脂組成物或含有該聚合物之樹脂組合物。 When oligomeric fluorene A is used as the oligomeric fluorene, for example, a resin composition made of a polymer having a structure represented by the following formula (5) at the end or a resin composition containing the polymer can be obtained.

式(5)中,R3分別獨立為直接鍵、可具有取代基之碳數1~4之伸烷基,R4~R9分別獨立為氫原子、可具有取代基之碳數1~10之烷基、可具有取代基之碳數4~10之芳基、可具有取代基之碳數t~10之醯基、可具有取代基之碳數1~10之醯氧基、可具有取代基之碳數1~10之烷氧基、可具有取代基之碳數1~10之芳氧基、可具有取代基之胺基、可具有取代基之碳數1~10之乙烯基、可具有取代基之碳數1~10之乙炔基、具有取代基之硫原子、具有取代基之矽原子、鹵素原子、硝基、或氰基。其中,R4~R9中鄰接之至少2個基亦可相互鍵結而形成環。 In formula (5), R 3 is independently a direct bond and an alkylene group having 1 to 4 carbon atoms that may have a substituent, and R 4 to R 9 are each independently a hydrogen atom and 1 to 10 carbon atoms that may have a substituent. An alkyl group, an aryl group having 4 to 10 carbons which may have a substituent, a fluorenyl group having t to 10 carbons which may have a substituent, a fluorenyl group having 1 to 10 carbons which may have a substituent, may have a substituent Alkoxy groups having 1 to 10 carbon atoms, aryloxy groups having 1 to 10 carbon atoms that may have substituents, amine groups that may have substituents, vinyl groups having 1 to 10 carbon atoms that may have substituents, may An ethynyl group having 1 to 10 carbon atoms having a substituent, a sulfur atom having a substituent, a silicon atom having a substituent, a halogen atom, a nitro group, or a cyano group. Among them, at least two adjacent groups in R 4 to R 9 may be bonded to each other to form a ring.

Ra~Rc分別獨立為氫原子、可經取代之碳數1~10之烷基、可經取代之碳數4~10之芳基或可經取代之碳數6~10之芳烷基。 R a to R c are each independently a hydrogen atom, an alkyl group having 1 to 10 carbon atoms which can be substituted, an aryl group having 4 to 10 carbon atoms which can be substituted or an aralkyl group having 6 to 10 carbon atoms which can be substituted .

X為酯基、醯胺基、羧基、氰基、或硝基。 X is an ester group, amidino group, a carboxyl group, a cyano group, or a nitro group.

n表示1~5之整數值。 n represents an integer value from 1 to 5.

*係與連結基之鍵結鍵。 * Bound with the bond of the linker.

作為式(5)中之R3~R9、Ra~Rc及n,可較佳地採用作為式(1)中之R3~R9、Ra~Rc及n所例示者。 As R 3 to R 9 , R a to R c, and n in the formula (5), those exemplified as R 3 to R 9 , R a to R c, and n in the formula (1) can be preferably used.

<4.1 2價之寡聚茀> <4.1 Divalent Oligomers>

本發明之樹脂組合物之聚合物較佳為具有2價之寡聚茀作為重複單元。 The polymer of the resin composition of the present invention is preferably a divalent oligofluorene as a repeating unit.

於該情形時,本發明之樹脂組合物除含有具有2價之寡聚茀作為重複單元之聚合物外,亦可含有下述之其他聚合物,又,亦可含有添加劑等。 In this case, the resin composition of the present invention may contain, in addition to a polymer having a divalent oligomeric fluorene as a repeating unit, other polymers described below, and may also contain additives.

關於獲得具有2價之寡聚茀作為重複單元之聚合物之方法,並無特別限定,例如於使用寡聚茀化合物A2作為寡聚茀之情形時,可獲得具有源自反應性官能基之2種以上之連結基,且具有2價之寡聚茀作為重複單元之聚合物。又,亦可藉由使用寡聚茀B而獲得具有2價之寡聚茀作為重複單元之聚合物。 The method for obtaining a polymer having a divalent oligomeric fluorene as a repeating unit is not particularly limited. For example, when an oligomeric fluorene compound A2 is used as the oligomeric fluorene, 2 having a reactive functional group-derived 2 can be obtained. A polymer having more than one linking group and having a divalent oligomeric fluorene as a repeating unit. Moreover, it is also possible to obtain a polymer having a divalent oligomeric fluorene as a repeating unit by using oligomeric fluorene B.

2價之寡聚茀係包含可具有取代基之2個以上之茀單元,且該茀單元之9位之碳原子彼此經由可具有取代基之伸烷基、可具有取代基之伸芳基、或可具有取代基之伸芳烷基而鏈狀地鍵結而成者。 The divalent oligomeric fluorene includes two or more fluorene units which may have a substituent, and the carbon atoms at the 9th position of the fluorene unit are mutually via an alkylene group which may have a substituent, an arylene group which may have a substituent, Or, an aralkyl group which may have a substituent and is chain-bonded.

作為茀單元,可較佳地使用作為寡聚茀A之茀單元a所例示者、或作為寡聚茀B之茀單元b所例示者。 As the fluorene unit, those exemplified as the fluorene unit a of the oligomeric fluorene A, or those exemplified as the fluorene unit b of the oligomeric fluorene B can be preferably used.

同樣地,作為鍵結茀單元之伸烷基,可較佳地使用作為寡聚茀A之鍵結茀單元a之伸烷基所例示者、或作為寡聚茀B之鍵結茀單元b之伸烷基所例示者。 Similarly, as the alkylene group of the bonded fluorene unit, those exemplified as the alkylene group of the bonded oligomer A of the oligomer A, or as the bonded unit oligomer B of the oligomer B Exemplified by alkylene.

又,作為鍵結茀單元之伸芳基,可較佳地使用作為寡聚茀A之鍵結茀單元a之伸芳基所例示者、或作為寡聚茀B之鍵結茀單元b之伸芳 基所例示者。 In addition, as the extended aryl group of the bonded fluorene unit, those exemplified as the extended aryl group of the bonded oligomeric unit A of the oligomeric fluorene A, or as the extended fluorene unit b of the oligomeric fluorene B Fang Base instantiator.

進而,作為鍵結茀單元之伸芳烷基,可較佳地使用作為寡聚茀A之鍵結茀單元a之伸芳烷基所例示者、或作為寡聚茀B之鍵結茀單元b之伸芳烷基所例示者。 Furthermore, as the extended aralkyl group of the bonded fluorene unit, the exemplified as the extended aralkyl group of the bonded fluorene unit A of the oligomeric fluorene A, or the bonded fluorene unit b of the oligomeric fluorene B can be preferably used. Exemplified by aralkyl.

關於上述2價之寡聚茀,係2個以上之茀單元中,使取代基α1及α2分別鍵結於位置於兩末端之茀單元之9位之碳原子,且將該取代基α1及α2設為2價之基。於該情形時,α1與α2可相同亦可不同。又,取代基α1及α2亦可包含直接鍵,即可將茀單元之9位之碳原子設為2價之基。 Regarding the divalent oligomeric fluorene described above, in the two or more fluorene units, the substituents α 1 and α 2 are respectively bonded to the carbon atom at the 9th position of the fluorene unit at both ends, and the substituent α 1 and α 2 are set to a divalent basis. In this case, α 1 and α 2 may be the same or different. In addition, the substituents α 1 and α 2 may include a direct bond, and the 9-position carbon atom of the fluorene unit may be a divalent group.

作為取代基α1及α2,並無特別限定,可列舉:直接鍵、可經取代之碳數1~10之伸烷基、可經取代之碳數4~10之伸芳基、或可經取代之碳數6~10之伸芳烷基、或選自由可經取代之碳數1~10之伸烷基、可經取代之碳數4~10之伸芳基及可經取代之碳數6~10之伸芳烷基所組成之群中之2個以上之基由氧原子、可經取代之硫原子、可經取代之氮原子或羰基所連結之基。 The substituents α 1 and α 2 are not particularly limited, and examples thereof include a direct bond, an alkylene group having 1 to 10 carbon atoms which may be substituted, an arylene group having 4 to 10 carbon atoms which may be substituted, or Substituted aralkyl groups having 6 to 10 carbons, or selected from substitutable carbon groups of 1 to 10 carbons, substitutable arylene groups of 4 to 10 carbons, and substitutable carbons Two or more groups in the group consisting of 6-10 aralkyl groups are bonded by an oxygen atom, a sulfur atom that may be substituted, a nitrogen atom that may be substituted, or a carbonyl group.

作為「可經取代之碳數1~10之伸烷基」,可較佳地使用作為鍵結茀單元a之伸烷基所例示者。於該情形時,就連同顯現反波長色散性之觀點而言,較佳為使用碳數為2以上者。另一方面,就連同顯現平面分散性之觀點而言,較佳為將其碳數設為1。進而於顯現反波長色散性之情形時,就連同使茀環之配向容易固定於主鏈,而有效率地獲得反波長色散特性之觀點而言,碳數較佳為5以下,更佳為4以下,進而較佳為3以下,尤佳為2以下。另一方面,就連同向樹脂組合物賦予柔軟性之觀點而言,其碳數較佳為2以上,更佳為3以上,進而較佳為4以上。 As the "alkylene group having 1 to 10 carbon atoms which may be substituted", examples exemplified as the alkylene group of the bonded fluorene unit a can be preferably used. In this case, it is preferable to use a carbon number of 2 or more from the viewpoint of exhibiting inverse wavelength dispersion. On the other hand, it is preferable to set the number of carbons to 1 from the viewpoint of showing planar dispersibility. Furthermore, when the inverse wavelength dispersion property is exhibited, the number of carbons is preferably 5 or less, and more preferably 4 in view of the fact that the orientation of the ring is easily fixed to the main chain and the inverse wavelength dispersion characteristics are efficiently obtained. Hereinafter, it is more preferably 3 or less, and even more preferably 2 or less. On the other hand, from the viewpoint of imparting flexibility to the resin composition, the number of carbons is preferably 2 or more, more preferably 3 or more, and even more preferably 4 or more.

作為「可經取代之碳數4~10之伸芳基」,可較佳地使用作為鍵結茀單元a之伸芳基所例示者。同樣地,作為「可經取代之碳數6~10之伸芳烷基」,可較佳地使用作為鍵結茀單元a之伸芳烷基所例示者。 As "the arylene group having 4 to 10 carbon atoms which can be substituted", those exemplified as the arylene group of the bonded fluorene unit a can be preferably used. Similarly, as the "arylene group having 6 to 10 carbon atoms which can be substituted", the exemplified as the aralkyl group as the bonded fluorene unit a can be preferably used.

「選自由可經取代之碳數1~10之伸烷基、可經取代之碳數4~10之伸芳基及可經取代之碳數6~10之伸芳烷基所組成之群中之2個以上之基由氧原子、可經取代之硫原子、可經取代之氮原子或羰基連結而成之基」之具體結構係於以下進行列舉,並不限定於該等,可列舉如下述[H]群所示之2價之基。 "Selected from the group consisting of an alkylene group having 1 to 10 carbon atoms that can be substituted, an alkylene group having 4 to 10 carbon atoms that can be substituted, and an alkylene group having 6 to 10 carbon atoms that can be substituted The specific structure in which two or more groups are bonded by an oxygen atom, a sulfur atom that may be substituted, a nitrogen atom that may be substituted, or a carbonyl group "is listed below, and is not limited to these, and may be listed as follows Let us describe the divalent basis shown by the [H] group.

該等中,較佳為保持樹脂組合物之透明性與穩定性不變而可賦予柔軟性之選自伸烷基、伸芳基或伸芳烷基中之2個以上之基由氧原子連結而成的基,更佳為可賦予柔軟性並且使樹脂組合物之玻璃轉移溫度提高之如下述[I]群所示之伸烷基由氧原子連結而成的基。 Among these, it is preferable that two or more groups selected from the group consisting of an alkylene group, an alkylene group, or an alkylene group to be imparted with flexibility while maintaining transparency and stability of the resin composition are connected by an oxygen atom. The formed group is more preferably a group in which an alkylene group represented by the following [I] group is bonded to an oxygen atom while imparting flexibility and increasing the glass transition temperature of the resin composition.

又,就連同提高茀比率之觀點而言,於設為該等所連結而成之基之情形時,較佳為將其碳數設為2以上,又較佳為設為6以下,更佳為設為4以下。 From the viewpoint of increasing the ratio of radon, in the case of using these connected bases, it is preferable to set the number of carbons to 2 or more, and more preferably to 6 or less. It is set to 4 or less.

該等中,於取代基α1及α2中之至少1個為直接鍵、或者取代基α1及α2中之至少1個碳數為2以上之情形時,茀環(茀單元)大致垂直配向於主鏈,因此有如下傾向:即便樹脂組合物中之2價之寡聚茀之比例 為少量,亦變得容易顯現反波長色散性。於後者之情形時,就相同之觀點而言,較佳為將α1及α2兩者設為碳數2以上者。另一方面,於將取代基α1及α2兩者設為碳數1者(即,可經取代之亞甲基)之情形時,茀環(茀單元)並非大致垂直配向於主鏈而是以較大傾斜進行配向,因此有如下傾向:即便使樹脂組合物中之2價之寡聚茀之比例於較廣範圍內進行變化,亦容易成為於寬頻帶相位差之差較小之平面色散性。 Among these, when at least one of the substituents α 1 and α 2 is a direct bond, or when at least one of the substituents α 1 and α 2 has a carbon number of 2 or more, the fluorene ring (fluorene unit) is roughly Since it is vertically aligned with the main chain, even if the proportion of the divalent oligomeric fluorene in the resin composition is small, the anti-wavelength dispersion property tends to develop. In the latter case, from the same viewpoint, it is preferable that both α 1 and α 2 have a carbon number of 2 or more. On the other hand, in a case where both of the substituents α 1 and α 2 are set to one carbon number (that is, a methylene group which may be substituted), the fluorene ring (fluorene unit) is not aligned substantially vertically to the main chain but Orientation is performed with a large inclination, so there is a tendency that even if the ratio of the divalent oligomeric fluorene in the resin composition is changed in a wide range, it is easy to be a plane with a small difference in phase difference in wide bands. Dispersion.

該等中,較佳為直接鍵、可經取代之碳數1~10之伸烷基、可經取代之碳數4~10之伸芳基、或選自由可經取代之碳數1~10之伸烷基、可經取代之碳數4~10之伸芳基及可經取代之碳數6~10之伸芳烷基所組成之群中之2個以上之基由氧原子、可經取代之硫原子、可經取代之氮原子或羰基連結而成之基。 Among these, a direct bond, an alkylene group having 1 to 10 carbon atoms which can be substituted, an arylene group having 4 to 10 carbon atoms which can be substituted, or a group selected from the group consisting of 1 to 10 carbon atoms which can be substituted 2 or more of the group consisting of an alkylene group that can be substituted, an alkylene group that has 4 to 10 carbon atoms, and an alkylene group that can be substituted with 6 to 10 carbon atoms are composed of an oxygen atom, Substituted sulfur atom, a group which may be connected by a substituted nitrogen atom or a carbonyl group.

更佳為直接鍵、直鏈狀之伸烷基、包含側鏈之伸烷基、如上述[A]群所示之脂環結構之任意2處具有直鏈狀或側鏈狀之伸烷基之鍵結鍵的脂環式伸烷基、伸苯基、或選自由可經取代之碳數1~10之伸烷基、可經取代之碳數4~10之伸芳基及可經取代之碳數6~10之伸芳烷基所組成之群中之2個以上之基由氧原子連結而成之基。 More preferred are a straight bond, a straight chain alkylene group, a side chain-containing alkylene group, and a linear or side chain-type alkylene group at any two positions of the alicyclic structure shown in the above [A] group. Alicyclic alkylene, phenylene, or selected from the group consisting of an alkylene group having 1 to 10 carbon atoms that can be substituted, an alkylene group having 4 to 10 carbon atoms that can be substituted, and a substituted one In the group consisting of 6 to 10 carbonized aralkyl groups, two or more groups are connected by oxygen atoms.

進而較佳為有因不具有芳香環而可達成光學膜所要求之較低光彈性係數之傾向的直接鍵、亞甲基、伸乙基、正伸丙基、正伸丁基、甲基亞甲基、1-甲基伸乙基、2-甲基伸乙基、2,2-二甲基伸丙基、2-甲氧基甲基-2-甲基伸丙基或如下述[J]群所示之脂環式伸烷基。 Further preferred are direct bonds, methylene, ethylidene, n-propylidene, n-butylidene, and methylmethylene, which have a tendency to achieve a lower photoelastic coefficient required for optical films because they do not have an aromatic ring. , 1-Methylethene, 2-Methylethene, 2,2-Dimethylpropane, 2-methoxymethyl-2-methylpropane or the following [J] group The alicyclic alkylene shown.

(上述[J]群所示之各環結構中之2個鍵結鍵之取代位置為任意,且 亦可2個鍵結鍵於同一碳進行取代)。 (The substitution positions of the two bonding bonds in each ring structure shown in the above [J] group are arbitrary, and Two bonds may be bonded to the same carbon and substituted).

進而更佳為直接鍵、亞甲基、伸乙基、正伸丙基、正伸丁基、甲基亞甲基、1-甲基伸乙基、2-甲基伸乙基、或2,2-二甲基伸丙基。尤佳為亞甲基、伸乙基、或正伸丙基。 Furthermore, it is more preferably a direct bond, methylene, ethylidene, n-propylidene, n-butylidene, methylmethylene, 1-methylidene, 2-methylidene, or 2,2- Dimethylpropane. Especially preferred are methylene, ethyl, or n-propyl.

有若鏈長較長,則玻璃轉移溫度變低之傾向,因此較佳為較短之鏈狀之基,例如碳數2以下之基。進而,有因分子結構變小,故可使重複單元中之茀環之濃度(茀比率)變高之傾向,因此可高效率地顯現所需之光學物性。又,較佳為有即便相對於樹脂組合物整體之質量以任意之質量含有,亦可為相位差之波長色散性較小之平面色散之傾向,進而亦有可以短階段且工業上廉價地導入之優勢之亞甲基。 If the chain length is longer, the glass transition temperature tends to be lower. Therefore, a shorter chain-like base such as a base having 2 or less carbon atoms is preferred. Furthermore, since the molecular structure becomes smaller, the concentration of the fluorene ring (fluorene ratio) in the repeating unit tends to be high, so that the required optical physical properties can be developed efficiently. Moreover, it is preferable that even if it is contained in an arbitrary mass with respect to the entire mass of the resin composition, it may be a plane dispersion having a small phase dispersion and a small wavelength dispersion, and it may be introduced in a short stage and industrially inexpensively. The advantage of methylene.

另一方面,為了改善所獲得之膜之機械強度或高溫下之可靠性,較佳為可提高樹脂組合物之玻璃轉移溫度之碳數4~10之伸芳基、或選自由可經取代之碳數1~10之伸烷基及可經取代之碳數4~10之伸芳基所組成之群中之2個以上之基由氧原子連結而成之基,更佳為1,4-伸苯基、1,5-伸萘基、2,6-伸萘基、或如下述[H2]群所示之2價之基。 On the other hand, in order to improve the mechanical strength or reliability at high temperature of the obtained film, it is preferred that the aryl group having a carbon number of 4 to 10 which can increase the glass transition temperature of the resin composition, or selected from the group consisting of An alkylene group having 1 to 10 carbon atoms and an arylene group having 4 to 10 carbon atoms that can be substituted. Two or more groups are connected by oxygen atoms, and more preferably 1,4- A phenylene group, a 1,5-naphthyl group, a 2,6-naphthyl group, or a divalent group represented by the following [H2] group.

又,於向具有反波長色散性之相位差膜進行應用之情形時,重要的是適當選擇取代基α1及α2。例如亞甲基所代表之碳數1之基出乎意料地有反波長色散性較低之傾向,因此R1及R2較佳為直接鍵、或者其中至少一者為碳數2以上之基。 When applying to a retardation film having inverse wavelength dispersion, it is important to appropriately select the substituents α 1 and α 2 . For example, a base of carbon number 1 represented by methylene has an unexpected tendency to have low inverse wavelength dispersion. Therefore, R 1 and R 2 are preferably a direct bond, or at least one of them is a base of carbon number 2 or more. .

更佳為直接鍵、可經取代之碳數2~10之伸烷基、可經取代之碳數4~10之伸芳基、或選自由可經取代之碳數1~10之伸烷基、可經取 代之碳數4~10之伸芳基及可經取代之碳數6~10之伸芳烷基所組成之群中之2個以上之基由氧原子、可經取代之硫原子、可經取代之氮原子或羰基連結而成之基。 More preferably, it is a direct bond, an alkylene group having 2 to 10 carbon atoms that can be substituted, an alkylene group having 4 to 10 carbon atoms that can be substituted, or an alkylene group having 1 to 10 carbon atoms that can be substituted. Available 2 or more of the group consisting of an arylene group having 4 to 10 carbon atoms and an aralkyl group having 6 to 10 carbon atoms that can be substituted include an oxygen atom, a sulfur atom that can be substituted, and Substituted nitrogen atom or carbonyl group.

進而較佳為直接鍵、直鏈狀之伸烷基、包含側鏈之伸烷基、如上述[A]群所示之脂環結構之任意2所具有直鏈狀或側鏈狀之伸烷基之鍵結鍵的脂環式伸烷基、伸苯基、或選自由可經取代之碳數1~10之伸烷基、可經取代之碳數4~10之伸芳基及可經取代之碳數6~10之伸芳烷基所組成之群中之2個以上之基由氧原子連結而成之基。 Further, a straight bond, a linear alkylene group, a linear alkylene group including a side chain, and any two of the alicyclic structures shown in the above-mentioned [A] group are preferably linear or side chain alkylene groups. Alicyclic alkylene, phenylene, or selected from the group consisting of an alkylene group having 1 to 10 carbon atoms that can be substituted, an alkylene group having 4 to 10 carbon atoms that can be substituted, and In the group consisting of substituted aralkyl groups having 6 to 10 carbon atoms, two or more groups are connected by oxygen atoms.

更佳為因不具有芳香環而可達成光學膜所要求之較低光彈性係數之直接鍵、伸乙基、正伸丙基、正伸丁基、甲基亞甲基、1-甲基伸乙基、2-甲基伸乙基、2,2-二甲基伸丙基、2-甲氧基甲基-2-甲基伸丙基或如上述[J]群所示之脂環式伸烷基、或者可提高樹脂組合物之玻璃轉移溫度之1,4-伸苯基、選自由可經取代之碳數1~10之伸烷基及可經取代之碳數4~10之伸芳基所組成之群中之2個以上之基由氧原子連結而成之基。 More preferred are direct bonds, ethylidene, n-propylidene, n-butylidene, methylmethylene, 1-methylethylidene, which do not have aromatic rings and can achieve the lower photoelastic coefficient required by optical films. , 2-methyl butyral, 2,2-dimethyl butyral, 2-methoxymethyl-2-methyl butyral or alicyclic butane as shown in the above [J] group Or 1,4-phenylene which can increase the glass transition temperature of the resin composition, selected from the group consisting of an alkylene group having 1 to 10 carbon atoms that can be substituted and an alkylene group having 4 to 10 carbon atoms that can be substituted Two or more of the groups in the group are formed by connecting oxygen atoms.

尤佳為直接鍵、伸乙基、正伸丙基、正伸丁基、甲基亞甲基、1-甲基伸乙基、2-甲基伸乙基、或2,2-二甲基伸丙基。 Especially preferred are direct bond, ethyl, n-propyl, n-butyl, methylmethylene, 1-methylethyl, 2-methylethyl, or 2,2-dimethylene base.

最佳為伸乙基、或正伸丙基。有若鏈長較長,則玻璃轉移溫度變低之傾向,因此較佳為較短之鏈狀之基,例如碳數3以下之基。進而,因分子結構變小,故可使重複單元中之茀環之濃度(茀比率)變高,因此可高效率地顯現所需之光學物性。 Ethyl or propyl is preferred. If the chain length is longer, the glass transition temperature tends to be lower. Therefore, a shorter chain-like base such as a base having 3 or less carbon atoms is preferred. Furthermore, since the molecular structure becomes smaller, the concentration (fluorene ratio) of the fluorene ring in the repeating unit can be increased, and thus the required optical physical properties can be developed efficiently.

又,取代基α1及α2相同係使製造變容易,故而較佳。 The same substituents α 1 and α 2 are preferred because they facilitate production.

如上所述,本發明之樹脂組合物有如下傾向:藉由由具有以特定之碳-碳鍵將2個以上之茀單元b之9位之碳原子彼此連結而成之重複單元之聚合物所成、或者含有該聚合物,而可更有效地獲得源自茀環之光學特性。 As described above, the resin composition of the present invention tends to be formed by a polymer having a repeating unit in which two or more carbon atoms at the 9-position of the fluorene unit b are connected to each other by a specific carbon-carbon bond. It can form or contain the polymer, so that the optical properties derived from the fluorene ring can be obtained more effectively.

作為上述2價之寡聚茀,具體而言,可較佳地使用下述通式(11)所表示者。 As the divalent oligomeric fluorene, specifically, those represented by the following general formula (11) can be preferably used.

式(11)中,R1~R3分別獨立為直接鍵、或可具有取代基之碳數1~4之伸烷基。 In Formula (11), R 1 to R 3 are each independently a direct bond or an alkylene group having 1 to 4 carbon atoms which may have a substituent.

R4~R9分別獨立為氫原子、可具有取代基之碳數1~10之烷基、可具有取代基之碳數4~10之芳基、可具有取代基之碳數1~10之醯基、可具有取代基之碳數1~1b之醯氧基、可具有取代基之碳數1~10之烷氧基、可具有取代基之碳數1~10之芳氧基、可具有取代基之胺基、可具有取代基之碳數1~10之乙烯基、可具有取代基之碳數1~10之乙炔基、具有取代基之硫原子、具有取代基之矽原子、鹵素原子、硝基、或氰基。其中,R4~R9中鄰接之至少2個基亦可相互鍵結而形成環。 R 4 to R 9 are each independently a hydrogen atom, an alkyl group having 1 to 10 carbons that may have a substituent, an aryl group having 4 to 10 carbons that may have a substituent, and 1 to 10 carbons that may have a substituent Fluorenyl, fluorenyloxy having 1 to 1b carbon having a substituent, alkoxyl having 1 to 10 carbons having a substituent, aryloxy having 1 to 10 carbons having a substituent, may have Substituent amino group, vinyl group having 1 to 10 carbon atoms which may have a substituent, ethynyl group having 1 to 10 carbon atoms which may have a substituent, sulfur atom having a substituent, silicon atom having a substituent, halogen atom , Nitro, or cyano. Among them, at least two adjacent groups in R 4 to R 9 may be bonded to each other to form a ring.

n表示1~5之整數值。 n represents an integer value from 1 to 5.

作為上述式(11)中之R1及R2,可分別較佳地使用作為取代基α1及α2所例示者。 As R 1 and R 2 in the formula (11), those exemplified as the substituents α 1 and α 2 can be preferably used, respectively.

又,作為上述式(11)中之R3~R9及n,可分別較佳地使用作為上述式(1)中之R3~R9及n所例示者。 In addition, as R 3 to R 9 and n in the above formula (11), those exemplified as R 3 to R 9 and n in the above formula (1) can be preferably used, respectively.

<4.2聚合物> <4.2 Polymer>

本發明之樹脂組合物所含有之聚合物係具有2價之寡聚茀作為重複單元者。例如可列舉:2價之寡聚茀彼此由任意之連結基所連結之聚合物。又,該聚合物亦可為具有2價之寡聚茀以外之任意重複單元 之共聚物。 The polymer contained in the resin composition of the present invention has a divalent oligofluorene as a repeating unit. Examples include divalent oligomeric polymers in which oligomeric fluorenes are linked to each other by an arbitrary linking group. The polymer may have any repeating unit other than a divalent oligomeric fluorene. Of copolymers.

<4.3連結基> <4.3 link base>

係與上述《發明2》之<3.4連結基>之項中所說明者相同。 It is the same as that described in the item "3.4 Linker" of "Invention 2" above.

<4.4共聚物> <4.4 copolymer>

具有2價之寡聚茀作為重複單元之聚合物亦可為進而包含任意之2價之有機基(其中,將2價之寡聚茀除外)作為重複單元之共聚物。於該情形時,重複單元彼此較佳為由上述之連結基連結而成者。 The polymer having a divalent oligomeric fluorene as a repeating unit may be a copolymer further containing an arbitrary divalent organic group (except for a divalent oligomeric fluorene) as a repeating unit. In this case, the repeating units are preferably formed by connecting the above-mentioned linking groups.

於共聚物中,作為亦可與2價之寡聚茀併用之任意之2價之有機基,係與上述《發明2》之<3.5共聚物>之項中所說明者相同。 In the copolymer, an arbitrary divalent organic group that can be used in combination with a divalent oligomeric fluorene is the same as that described in the item <3.5 Copolymer> of the aforementioned "Invention 2".

<4.5共聚合組成> <4.5 copolymerization composition>

係與上述《發明2》之<3.7共聚合組成>之項中所說明者相同。 It is the same as that described in the item <3.7 Copolymerization Composition> of the aforementioned "Invention 2".

<4.6樹脂組合物之組成> <4.6 Composition of Resin Composition>

係與上述《發明2》之<3.9樹脂組合物之組成>之項中所說明者相同。 It is the same as that described in the item <3.9 Resin Composition Composition> in the above-mentioned "Invention 2".

《發明4》 "Invention 4"

以下,對本發明4之寡聚茀二酯、及使用其之樹脂組合物之製造方法進行詳述。 Hereinafter, the manufacturing method of the oligomeric fluorene diester of this invention 4 and the resin composition using it is explained in full detail.

再者,以下所記載之(通)式(1)、(1a)、(1b)、(1a-I)、(1a-II)、(10e)、(I)~(V)、(IIa)、(IIb)、(VI-1)係對本發明4中之各結構進行說明者。 In addition, the following (general) formulae (1), (1a), (1b), (1a-I), (1a-II), (10e), (I) to (V), (IIa) (IIb) and (VI-1) are those who explain each structure in the fourth aspect of the present invention.

<1寡聚茀二酯A> <1 oligomeric diester A>

本發明之寡聚茀二酯(以下,有略記為「寡聚茀二酯A」之情形)包含可具有取代基之2個以上之茀單元,該茀單元之9位之碳原子彼此直接鍵結、或經由可具有取代基之伸烷基、可具有取代基之伸芳基、或可具有取代基之伸芳烷基而鏈狀地鍵結,且金屬之含有比例為500 質量ppm以下。 The oligomeric fluorene diester of the present invention (hereinafter referred to as "oligomeric fluorene diester A") includes two or more fluorene units which may have a substituent, and the carbon atoms at the 9-position of the fluorene unit are directly bonded to each other. Or a chain via an alkylene group which may have a substituent, an alkylene group which may have a substituent, or an alkylene group which may have a substituent, and the metal content ratio is 500 Mass ppm or less.

<1.1具體之結構> <1.1 Specific Structure>

作為本發明之寡聚茀二酯,具體而言,可較佳地使用下述通式(1)所表示者。 As the oligomeric fluorene diester of the present invention, specifically, those represented by the following general formula (1) can be preferably used.

式中,R1~R3分別獨立為直接鍵、或可具有取代基之碳數1~4之伸烷基。 In the formula, R 1 to R 3 are each independently a direct bond or an alkylene group having 1 to 4 carbon atoms which may have a substituent.

R4~R9分別獨立為氫原子、可具有取代基之碳數1~10之烷基、可具有取代基之碳數4~10之芳基、可具有取代基之碳數1~10之醯基、可具有取代基之碳數1~10之醯氧基、可具有取代基之碳數1~10之烷氧基、可具有取代基之碳數1~10之芳氧基、可具有取代基之胺基、可具有取代基之碳數1~10之乙烯基、可具有取代基之碳數1~10之乙炔基、具有取代基之硫原子、具有取代基之矽原子、鹵素原子、硝基、或氰基。其中,R4~R9中鄰接之至少2個基亦可相互鍵結而形成環。 R 4 to R 9 are each independently a hydrogen atom, an alkyl group having 1 to 10 carbons that may have a substituent, an aryl group having 4 to 10 carbons that may have a substituent, and 1 to 10 carbons that may have a substituent Fluorenyl group, fluorenyloxy group having 1 to 10 carbon atoms which may have a substituent, alkoxyl group having 1 to 10 carbon atoms which may have a substituent, aryloxy group having 1 to 10 carbon atoms which may have a substituent, may have Substituent amino group, vinyl group having 1 to 10 carbon atoms which may have a substituent, ethynyl group having 1 to 10 carbon atoms which may have a substituent, sulfur atom having a substituent, silicon atom having a substituent, halogen atom , Nitro, or cyano. Among them, at least two adjacent groups in R 4 to R 9 may be bonded to each other to form a ring.

R10為碳數1~10之有機取代基。 R 10 is an organic substituent having 1 to 10 carbon atoms.

n表示1~5之整數值。 n represents an integer value from 1 to 5.

上述式(1)中,作為R1及R2,可分別較佳地使用於上述《發明1》之R1及R2之相關基中所例示者。 In the above formula (1), as R 1 and R 2 , those exemplified in the related groups of R 1 and R 2 in the above-mentioned "Invention 1" can be preferably used, respectively.

同樣地,作為R3,可較佳地使用於上述《發明1》之R3之相關基中所例示者。 Similarly, as R 3 , those exemplified in the related base of R 3 in the above-mentioned "Invention 1" can be preferably used.

作為R4~R9,可較佳地使用於上述《發明1》之R4~R9之相關基 中所例示者。 As R 4 to R 9 , those exemplified in the related groups of R 4 to R 9 in the above-mentioned "Invention 1" can be preferably used.

又,作為R10,可較佳地使用於上述《發明2》之<1.3酯基>中作為有機取代基所例示者。 In addition, as R 10 , those exemplified as the organic substituent in the <1.3 ester group> of the above-mentioned "Invention 2" can be preferably used.

<1.2金屬之含量> <1.2 metal content>

關於上述金屬之含量,就使寡聚茀二酯A之熱穩定性降低而成為著色之原因之方面而言,較佳為400質量ppm以下,更佳為200質量ppm以下,進而較佳為100質量ppm以下,進而更佳為50質量ppm以下,尤佳為10ppm以下,最佳為5質量ppm以下。 The content of the above metal is preferably 400 mass ppm or less, more preferably 200 mass ppm or less, and further preferably 100 in terms of reducing the thermal stability of the oligomeric fluorene diester A and causing coloration. Mass ppm or less, more preferably 50 mass ppm or less, even more preferably 10 ppm or less, and most preferably 5 mass ppm or less.

關於上述金屬之種類,並無特別限定,因有於寡聚茀二酯製造時用作觸媒之金屬混入之可能性,故可認為係選自長週期型週期表第1族、第2族、第12族、第14族及過渡金屬之至少1種金屬。具體而言,作為第1族金屬,可列舉鋰、鈉、鉀、銫,作為第2族金屬,可列舉鎂、鈣、鋇,作為第12族金屬,可列舉鋅、鎘,作為第13族金屬,可列舉鋁,作為第14族金屬,可列舉錫、鉛,作為過渡金屬,可列舉鐵、銅、鈦、鋯、錳、鈷、釩。關於本發明之寡聚茀二酯,殘留有製造時之觸媒等,通常含有金屬。 There is no particular limitation on the type of the above-mentioned metals. Since there is a possibility that metal used as a catalyst may be mixed in the production of oligomeric fluorene diesters, it can be considered to be selected from Groups 1 and 2 of the long-period periodic table. , Group 12, Group 14 and at least one metal of a transition metal. Specifically, examples of the Group 1 metal include lithium, sodium, potassium, and cesium. Examples of the Group 2 metal include magnesium, calcium, and barium. Examples of the Group 12 metal include zinc and cadmium. Examples of the metal include aluminum, and examples of the Group 14 metal include tin and lead, and examples of the transition metal include iron, copper, titanium, zirconium, manganese, cobalt, and vanadium. Regarding the oligomeric fluorene diester of the present invention, a catalyst and the like at the time of production remain, and usually contain a metal.

於本發明之寡聚茀二酯中,有含有源自於鹼存在下使甲醛類作用而進行羥甲基化之步驟之鈉或鉀等長週期型週期表第1族金屬或者鈣等第2族金屬之可能性。又,有含有源自於酯交換反應觸媒存在下使碳酸二芳酯類作用而進行酯交換之步驟之鈦、銅、鐵等過渡金屬、或者鈉、鉀等長週期型週期表第1族、或者鎂、鈣等第2族之金屬、或者鋅或鎘等第12族金屬、或者錫等第14族金屬之可能性。 In the oligomeric fluorene diester of the present invention, there is a long-period periodic table Group 1 metal such as sodium or potassium and a second group containing calcium derived from the step of methylolating the formaldehydes in the presence of a base. Group metal possibilities. In addition, there are transition metals such as titanium, copper, iron, and the like, which are derived from a step of transesterifying a diaryl carbonate in the presence of a transesterification reaction catalyst, or a long-period periodic table such as sodium and potassium Or a Group 2 metal such as magnesium or calcium, or a Group 12 metal such as zinc or cadmium, or a Group 14 metal such as tin.

該等中,就酯交換反應觸媒之反應性之觀點而言,較佳為過渡金屬,更佳為鈦或鋯,進而較佳為鈦。 Among these, from the viewpoint of the reactivity of the transesterification catalyst, a transition metal is preferred, titanium or zirconium is more preferred, and titanium is more preferred.

作為金屬含量之測定法,例如可列舉:ICP-QMS法。 Examples of the method for measuring the metal content include an ICP-QMS method.

作為使金屬量為上述範圍之方法,例如可列舉:通常之精製 法,例如再結晶、或再沈澱、萃取精製、過濾器過濾等過濾操作、管柱層析法等。又,於利用酯交換法製造本發明之寡聚茀二酯A之情形時,重要的是預先減少原料中之水分或雜質之羧酸成分。 As a method of making the amount of metal into the above range, for example, ordinary purification For example, recrystallization, reprecipitation, extraction purification, filter filtration and other filtration operations, and column chromatography. When the oligomeric fluorene diester A of the present invention is produced by a transesterification method, it is important to reduce the water or impurities in the raw material and the carboxylic acid component in advance.

<1.3寡聚茀二酯A之製造方法> <1.3 Production method of oligomeric fluorene diester A>

關於本發明之寡聚茀之製造方法,並無特別限定,例如可藉由下述式所示之製造法A或製造法B等方法而進行製造。 The manufacturing method of the oligomeric fluorene of this invention is not specifically limited, For example, it can manufacture by the manufacturing method A or manufacturing method B shown by following formula.

此處,各結構式中,R1~R3分別獨立為直接鍵、或可具有取代基之碳數1~4之伸烷基。 Here, in each structural formula, R 1 to R 3 are each independently a direct bond or an alkylene group having 1 to 4 carbon atoms which may have a substituent.

R4~R9分別獨立為氫原子、可具有取代基之碳數1~10之烷基、可具有取代基之碳數4~10之芳基、可具有取代基之碳數1~10之醯基、可具有取代基之碳數1~10之醯氧基、可具有取代基之碳數1~10之烷氧基、可具有取代基之碳數1~10之芳氧基、可具有取代基之胺基、可具有取代基之碳數1~10之乙烯基、可具有取代基之碳數1~10之乙炔基、具有取代基之硫原子、具有取代基之矽原子、鹵素原子、硝基、或氰基。其中,R4~R9中鄰接之至少2個基亦可相互鍵結而形成環。 R 4 to R 9 are each independently a hydrogen atom, an alkyl group having 1 to 10 carbons that may have a substituent, an aryl group having 4 to 10 carbons that may have a substituent, and 1 to 10 carbons that may have a substituent Fluorenyl group, fluorenyloxy group having 1 to 10 carbon atoms which may have a substituent, alkoxyl group having 1 to 10 carbon atoms which may have a substituent, aryloxy group having 1 to 10 carbon atoms which may have a substituent, may have Substituent amino group, vinyl group having 1 to 10 carbon atoms which may have a substituent, ethynyl group having 1 to 10 carbon atoms which may have a substituent, sulfur atom having a substituent, silicon atom having a substituent, halogen atom , Nitro, or cyano. Among them, at least two adjacent groups in R 4 to R 9 may be bonded to each other to form a ring.

n表示1~5之整數值。 n represents an integer value from 1 to 5.

R10為碳數1~10之有機取代基。 R 10 is an organic substituent having 1 to 10 carbon atoms.

<1.3.1製造法A> <1.3.1 Manufacturing Method A>

製造法A係以茀類(I)為原料,向9-羥基甲基茀類(IV)轉化後,使藉由脫水而合成之烯烴體(V)與茀基陰離子進行反應,而製造R3為亞甲基之寡聚茀化合物(II)之方法。再者,未經取代之9-羥基甲基茀可作為試劑購入。可依據下述之步驟(ii),自此處所獲得之寡聚茀化台物(II)導入酯基而製成寡聚茀二酯(1)。 Production method A uses Rhenium (I) as a raw material, converts it to 9-hydroxymethylhydrazone (IV), and reacts an olefin (V) synthesized by dehydration with a fluorenyl anion to produce R 3 Method for methylene oligomeric fluorene compound (II). Furthermore, unsubstituted 9-hydroxymethylfluorene can be purchased as a reagent. The oligomeric fluorene diester (1) can be prepared by introducing an ester group from the oligomeric fluorene compound (II) obtained here according to the following step (ii).

例如,已知有將9-羥基甲基茀轉化為二苯并富烯後,藉由陰離子聚合而合成寡聚茀之混合物之方法(J.Am.Chem.Soc.,123,2001,9182-9183.)。可以該等為參考而製造寡聚茀化合物(II)。 For example, a method for converting a mixture of 9-hydroxymethylfluorene to dibenzofulvene and an oligomeric fluorene by anionic polymerization is known (J. Am. Chem. Soc., 123, 2001, 9918- 9183.). The oligomeric fluorene compound (II) can be produced using these as a reference.

<1.3.2製造法B> <1.3.2 Manufacturing Method B>

製造法B係藉由進行原料之茀類(I)之交聯反應(步驟(i))而合成寡聚茀化合物(II),其後導入酯基(步驟(ii)),藉此製造寡聚茀二酯(1)之方法。 Production method B is to produce an oligomeric fluorene compound (II) by performing a cross-linking reaction (step (i)) of the fluorene type (I) as a raw material, and then introducing an ester group (step (ii)), thereby producing an oligosaccharide. Method for polyfluorene diester (1).

上述各式中,R1~R10係與式(1)中之R1~R10同義。 In each of the above formulae, R 1 to R 10 are synonymous with R 1 to R 10 in formula (1).

以下,將製造法B分為步驟(i)寡聚茀化合物(II)之製造法、與步驟(ii)寡聚茀二酯(1)之製造法而進行記載。 Hereinafter, the manufacturing method B is divided into the manufacturing method of step (i) oligomeric fluorene compound (II), and the manufacturing method of step (ii) oligomeric fluorene diester (1).

<1.3.3步驟(i):寡聚茀化合物(II)之製造方法> <1.3.3 Step (i): Method for producing oligomeric fluorene compound (II)>

上述各式中,R3~R9及n係與上述式(1)中之R3~R9相同。 In the above formulae, R 3 to R 9 and n are the same as R 3 to R 9 in the formula (1).

以下,將步驟(i)中之寡聚茀化合物(II)之製造方法分為n及R3之情形而進行記載。 Hereinafter, the case where the manufacturing method of the oligomeric fluorene compound (II) in step (i) is divided into n and R 3 is described.

<1.3.3.1 於n=1且R3為直接鍵之情形:9,9':9',9"-三茀之製造方法> <1.3.3.1 In a case where n = 1 and R 3 is a direct bond: 9,9 ': 9', 9 "-Mitsumi's manufacturing method>

關於9,9'-雙茀之合成法,已知有複數種,可由茀酮或9-溴茀合成(J.Chem.Res.,2004,760;Tetrahedron Lett.,2007,48,6669.)。再者,9,9'-雙茀可作為試劑購入。 There are several known methods for synthesizing 9,9'-bisfluorene, which can be synthesized from fluorenone or 9-bromofluorene (J. Chem. Res., 2004,760; Tetrahedron Lett., 2007, 48, 6669.) . Furthermore, 9,9'-bipyrene can be purchased as a reagent.

<1.3.3.2 於n=2且R3為直接鍵之情形:9,9':9',9"-三茀之製造方法> <1.3.3.2 In the case where n = 2 and R 3 is a direct bond: 9,9 ': 9', 9 "-Mitsumi's manufacturing method>

關於9,9':9',9"-雙茀之合成法,已知有複數種,可由茀酮合成(Eur,J.Org.Chem.1999,1979-1984.)。 Regarding the method of synthesizing 9,9 ': 9', 9 "-bispyrene, a plurality of kinds are known and can be synthesized from fluorenone (Eur, J. Org. Chem. 1999, 1979-1984.).

<1.3.3.3 步驟(ia):R3為亞甲基之情形之製造方法> <1.3.3.3 Step (ia): Production method in a case where R 3 is methylene>

具有下述通式(IIa)所表示之亞甲基交聯之寡聚茀化合物可於鹼存在下,依據下述式所表示之反應,自茀類(I)及甲醛類進行製造。 The oligomeric fluorene compound having a methylene cross-linking represented by the following general formula (IIa) can be produced from a fluorene (I) and formaldehyde in accordance with a reaction represented by the following formula in the presence of a base.

上述各式中,R4~R9及n係與上述式(1)中之R4~R9及n含義相同。 In the above formulas, the same as R 4 ~ R 9 and n lines of (1) R in the above formula 4 ~ R 9 and n meaning.

<1.3.3.3.1 甲醛類> <1.3.3.3.1 Formaldehydes>

步驟(ia)中所使用之所謂甲醛類,只要為可向反應系統中供給甲醛之物質,則無特別限定,可列舉:氣狀之甲醛、甲醛水溶液、甲醛聚合而成之多聚甲醛、三烷等。就工業上廉價且因粉末狀而操作容易且可精確地稱量之觀點而言,更佳為多聚甲醛。另一方面,就工業上廉價且因液體而於添加時暴露之危險較少之觀點而言,更佳為福馬 林。 The so-called formaldehydes used in step (ia) are not particularly limited as long as they can supply formaldehyde to the reaction system. Examples include gaseous formaldehyde, aqueous formaldehyde solution, paraformaldehyde polymerized by formaldehyde, and Alkanes, etc. From the viewpoint that it is industrially inexpensive and easy to handle and can be accurately weighed due to the powder form, paraformaldehyde is more preferred. On the other hand, formaldehyde is more preferred from the viewpoint that it is industrially inexpensive and has less risk of exposure during addition due to liquid.

(理論量之定義) (Definition of theoretical quantity)

於製造目標之寡聚茀化合物(IIa)之情形時,甲醛類相對於原料之茀類(I)之理論量(莫耳比)係由n/(n+1)表示。 In the case of producing the target oligomeric fluorene compound (IIa), the theoretical amount (molar ratio) of formaldehydes relative to the fluorene type (I) of the raw material is represented by n / (n + 1).

(不超過理論量者較佳之原因) (The reason why it is better not to exceed the theoretical amount)

於使用相對於茀類(I),超過理論量之甲醛類之情形時,有較目標之寡聚茀化合物(IIa)進而產生茀交聯之寡聚茀化合物之傾向。可知寡聚茀化合物之茀環之數量越增加,溶解性越降低,因此於目標物中存在4個以上茀環交聯之寡聚茀化合物之情形時,有精製負荷變大之傾向。因此,通常甲醛類之使用量較佳為目的之理論量之n/(n+1)倍莫耳以下。 When the formaldehydes are used in an amount exceeding the theoretical amount with respect to the amidine (I), the target oligomeric amidine compound (IIa) tends to generate an amidine crosslinked oligomeric amidine compound. It can be seen that as the number of fluorene rings of an oligomeric fluorene compound increases, the solubility decreases. Therefore, when there are four or more fluorene rings crosslinked oligomeric fluorene compounds in the target, the purification load tends to increase. Therefore, in general, the amount of formaldehydes used is preferably n / (n + 1) times the mole of the theoretical amount for the purpose.

(不大幅低於理論量者較佳之原因) (Why not better than the theoretical amount)

又,可知若甲醛類之使用量大幅低於理論量之n/(n+1),則有較目標之三茀化合物(IIa),茀環之交聯數較少之二茀化合物成為主生成物,或者原料之茀類(I)未反應而殘留,因此產率大幅降低之傾向。 In addition, it can be seen that if the amount of formaldehydes used is significantly lower than the theoretical amount of n / (n + 1), there will be more than the target trifluorene compound (IIa), and the difluorene compound with a smaller number of crosslinks of the fluorene ring will become the main product The product (I) or the raw material (I) is left unreacted, so that the yield tends to decrease significantly.

因此,關於最佳之甲醛類之使用量,具體而言,於n=1之情形時,通常相對於茀類(I)為0.1倍莫耳以上,較佳為0.3倍莫耳以上,進而較佳為0.38倍莫耳以上,又通常為0.5倍莫耳以下,較佳為0.46倍莫耳以下,進而較佳為0.42倍莫耳以下。 Therefore, regarding the optimum amount of formaldehyde used, in the case of n = 1, it is usually 0.1 times or more, preferably 0.3 times or more, more It is preferably 0.38 times moles or more, usually 0.5 times moles or less, more preferably 0.46 times moles or less, and still more preferably 0.42 times moles or less.

又,於n=2之情形時,通常為0.5倍莫耳以上,較佳為0.55倍莫耳以上,進而較佳為0.6倍莫耳以上,又通常為0.66倍莫耳以下,較佳為0.65倍莫耳以下,進而較佳為0.63倍莫耳以下。如上所述,可知根據甲醛類之使用量,主生成物之結構與生成物之比率大幅變化之情況,藉由於限制甲醛類之使用量之條件下進行使用,而有可以高產率獲得目標之n數之寡聚茀化合物(IIa)之傾向。 In the case of n = 2, it is usually 0.5 times or more Molar, preferably 0.55 times or more Molar, further preferably 0.6 times or more Molar, and usually 0.66 times or less Molar, preferably 0.65 times or more Beam is less than or equal to 0.63, and is more preferably 0.63 or less. As mentioned above, it can be seen that depending on the amount of formaldehyde used, the ratio of the structure of the main product to the product greatly changes. By using under the condition that the amount of formaldehyde used is limited, the target n can be obtained in high yield. Number of oligomeric fluorene compounds (IIa).

<1.3.3.3.2鹼> <1.3.3.3.2 Alkali>

作為步驟(ia)中所使用之鹼,可使用氫氧化鋰、氫氧化鈉、氫氧化鉀等鹼金屬氫氧化物、氫氧化鈣、氫氧化鋇等鹼土金屬之氫氧化物、碳酸鈉、碳酸氫鈉、碳酸鉀等鹼金屬之碳酸鹽、碳酸鎂、碳酸鈣等鹼土金屬之碳酸鹽、磷酸鈉、磷酸氫鈉、磷酸鉀等磷酸之鹼金屬鹽、正丁基鋰、第三丁基鋰等有機鋰鹽、甲醇鈉、乙醇鈉、第三丁醇鉀等鹼金屬之烷醇鹽、氫化鈉或氫化鉀等氫化鹼金屬鹽、三乙基胺、二氮雜雙環十一烯等三級胺、四甲基氫氧化銨、四丁基氫氧化銨等四級氫氧化銨等。該等可單獨使用1種,亦可併用2種以上。 Examples of the base used in step (ia) include alkali metal hydroxides such as lithium hydroxide, sodium hydroxide, and potassium hydroxide; hydroxides of alkaline earth metals such as calcium hydroxide and barium hydroxide; sodium carbonate, and carbonic acid. Carbonates of alkali metals such as sodium hydrogen and potassium carbonate, carbonates of alkaline earth metals such as magnesium carbonate and calcium carbonate, alkali metal salts of phosphoric acid such as sodium phosphate, sodium hydrogen phosphate, and potassium phosphate, n-butyl lithium, and third butyl lithium And other organic lithium salts, sodium alkoxides of alkali metals such as sodium methoxide, sodium ethoxide, and potassium tert-butoxide, alkali metal salts such as sodium hydride or potassium hydride, triethylamine, diazabicycloundecene, and other tertiary Tertiary ammonium hydroxide such as amine, tetramethylammonium hydroxide and tetrabutylammonium hydroxide. These may be used individually by 1 type, and may use 2 or more types together.

於均質系下進行反應之情形時,該等中,較佳為本反應中具有充分之鹼性之鹼金屬之烷氧化物,更佳為工業上廉價之甲醇鈉或乙醇鈉。此處,鹼金屬之烷氧化物可使用粉狀者,亦可使用鹼溶液等液狀者。又,亦可使鹼金屬與醇進行反應而進行製備。 When the reaction is performed in a homogeneous system, among these, the alkali metal alkoxide having sufficient basicity in the reaction is preferred, and industrially inexpensive sodium methoxide or sodium ethoxide is more preferred. Here, the alkoxide of the alkali metal may be used in a powder form or in a liquid form such as an alkali solution. It is also possible to prepare by reacting an alkali metal with an alcohol.

另一方面,於二層系下進行反應之情形時,該等中,較佳為本反應中具有充分之鹼性之鹼金屬氫氧化物之水溶液,更佳為工業上廉價之氫氧化鈉、氫氧化鉀之水溶液。 On the other hand, when the reaction is performed in a two-layer system, among these, an aqueous solution of an alkali metal hydroxide having sufficient basicity in the reaction is preferable, and industrially inexpensive sodium hydroxide, Aqueous solution of potassium hydroxide.

又,關於水溶液之濃度,於使用尤佳之氫氧化鈉水溶液之情形時,若濃度較薄,則反應速度明顯降低,因此使用通常為10wt/wt%以上、較佳為25wt/wt%以上、更佳為40wt/wt%以上之水溶液。 In addition, regarding the concentration of the aqueous solution, in the case of using a particularly preferable sodium hydroxide aqueous solution, if the concentration is thin, the reaction speed is significantly reduced. Therefore, it is generally used at 10 wt / wt% or more, preferably 25 wt / wt% or more, More preferably, it is an aqueous solution of 40 wt / wt% or more.

於均質系下進行反應之情形時,關於鹼之使用量,相對於作為原料之茀類(I),上限並無特別限定,但若使用量過多,則有攪拌或反應後之精製負荷變大之傾向,因此通常為茀類(I)之10倍莫耳以下,較佳為5倍莫耳以下,進而較佳為1倍莫耳以下。另一方面,若鹼之使用量過少,則有反應之進行變慢之傾向,因此作為下限,通常相對於原料之茀類(I)為0.01倍莫耳以上,較佳為0.1倍莫耳以上,進而較佳為0.2倍莫耳以上。 When the reaction is carried out in a homogeneous system, the upper limit of the amount of alkali used is not particularly limited with respect to the amidine (I) as a raw material, but if the amount is too large, the purification load after stirring or reaction becomes large Therefore, it is usually 10 times or less, preferably 5 times or less, and more preferably 1 time or less. On the other hand, if the amount of alkali used is too small, the reaction tends to slow down. Therefore, as the lower limit, it is usually 0.01 times the mole or more, and preferably 0.1 times the mole or more, relative to the raw material (I). , And more preferably 0.2 times mole or more.

另一方面,於二層系下進行反應之情形時,關於鹼之使用量, 相對於作為原料之茀類(I),上限並無特別限定,但若使用量過多,則有攪拌或反應後之精製負荷變大之傾向,因此通常為茀類(I)之10倍莫耳以下,較佳為5倍莫耳以下,進而較佳為2倍莫耳以下。另一方面,若鹼之使用量過少,則有反應之進行變慢之傾向,因此作為下限,通常相對於原料之茀類(I)為0.1倍莫耳以上,較佳為0.3倍莫耳以上,進而較佳為0.4倍莫耳以上。 On the other hand, when the reaction is performed in a two-layer system, regarding the amount of alkali used, The upper limit is not particularly limited with respect to the stilbene (I) as a raw material, but if it is used in an excessive amount, the refining load after stirring or reaction tends to increase, so it is usually 10 times the mole of the stilbene (I). Hereinafter, it is preferably 5 times or less, more preferably 2 times or less. On the other hand, if the amount of alkali used is too small, the reaction tends to slow down. Therefore, as the lower limit, it is usually 0.1 times or more, and preferably 0.3 times or more, relative to the type (I) of the material. , And more preferably 0.4 times mole or more.

<1.3.3.3.3溶劑> <1.3.3.3.3 Solvents>

步驟(ia)較理想為使用溶劑而進行。關於可使用之溶劑之具體例,作為烷基腈系溶劑,可列舉乙腈、丙腈等,作為醚系溶劑,可列舉二乙基醚、四氫呋喃、1,4-二烷、甲基環戊基醚、第三丁基甲基醚等,作為鹵素系溶劑,可列舉1,2-二氯乙烷、二氯甲烷、氯仿、1,1,2,2-四氯乙烷等,作為鹵素系芳香族烴,可列舉氯苯、1,2-二氯苯等,作為醯胺系溶劑,可列舉N,N-二甲基甲醯胺、N,N,-二甲基乙醯胺、N-甲基吡咯啶酮等,作為亞碸系溶劑,可列舉二甲基亞碸、環丁碸等,作為環狀式脂肪族烴,可列舉:環戊烷、環己烷、環庚烷、環辛烷等單環狀式脂肪族烴;作為其衍生物之甲基環戊烷、乙基環戊烷、甲基環己烷、乙基環己烷、1,2-二甲基環己烷、1,3-二甲基環己烷、1,4-二甲基環己烷、異丙基環己烷、正丙基環己烷、第三丁基環己烷、正丁基環己烷、異丁基環己烷、1,2,4-三甲基環己烷、1,3,5-三甲基環己烷等;十氫萘等多環狀式脂肪族烴;正戊烷、正己烷、正庚烷、正辛烷、異辛烷、正壬烷、正癸烷、正十二烷、正十四烷等非環狀式脂肪族烴,作為芳香族烴,可列舉甲苯、對二甲苯、鄰二甲苯、間二甲苯等,作為醇系溶劑,可列舉甲醇、乙醇、異丙醇、正丁醇、第三丁醇、己醇、辛醇、環己醇等。 Step (ia) is preferably performed using a solvent. Specific examples of usable solvents include acetonitrile and propionitrile as the alkyl nitrile solvent, and diethyl ether, tetrahydrofuran, and 1,4-dicarbonate as the ether solvent. Alkane, methylcyclopentyl ether, third butyl methyl ether, and the like. Examples of the halogen-based solvent include 1,2-dichloroethane, dichloromethane, chloroform, and 1,1,2,2-tetrachloroethane. Examples of the halogen-based aromatic hydrocarbon include chlorobenzene and 1,2-dichlorobenzene. Examples of the fluorene-based solvent include N, N-dimethylformamide and N, N, -dimethyl. Acetylamine, N-methylpyrrolidone and the like. Examples of the fluorene-based solvents include dimethyl fluorene and cyclobutane. Examples of the cyclic aliphatic hydrocarbon include cyclopentane and cyclohexane. , Monocyclic aliphatic hydrocarbons such as cycloheptane, cyclooctane; methylcyclopentane, ethylcyclopentane, methylcyclohexane, ethylcyclohexane, 1,2- Dimethylcyclohexane, 1,3-dimethylcyclohexane, 1,4-dimethylcyclohexane, isopropylcyclohexane, n-propylcyclohexane, third butylcyclohexane , N-butylcyclohexane, isobutylcyclohexane, 1,2,4-trimethylcyclohexane, 1,3,5-trimethylcyclohexane, etc .; polycyclic forms such as decalin Aliphatic hydrocarbons; n-pentane, n-hexane, n-heptane, n-octane, isooctane, n-nonane, n-decane, n-dodecane, n-tetradecane Examples of the acyclic aliphatic hydrocarbon include toluene, para-xylene, o-xylene, and meta-xylene. Examples of the alcohol-based solvent include methanol, ethanol, isopropanol, n-butanol, and Tributanol, hexanol, octanol, cyclohexanol, etc.

於均質系之反應中,就有自茀類(I)產生之陰離子之溶解性較高,而反應之進行良好之傾向之方面而言,較佳為極性溶劑之醯胺系 溶劑、或亞碸系溶劑。其中,尤佳為N,N-二甲基甲醯胺。其原因在於有如下傾向,即三茀化合物(IIa)對N,N-二甲基甲醯胺之溶解性較低,目標物產生後迅速地析出,其以後之反應之進行被抑制,而目標物之選擇性提高。 Among the homogeneous reactions, the anion generated from the amidine (I) has high solubility, and the reaction proceeds well, and the ammonium system of a polar solvent is preferred. Solvent, or fluorene-based solvent. Among them, N, N-dimethylformamide is particularly preferred. The reason is that there is a tendency that the triamidine compound (IIa) has a low solubility in N, N-dimethylformamide, and the target substance precipitates rapidly after it is generated, and the progress of subsequent reactions is suppressed, and the target Material selectivity is improved.

於二層系之反應中,就有與鹼性水溶液形成2層,自茀類(I)產生之陰離子之溶解性較高,而反應之進行良好之傾向之方面而言,較佳為極性溶劑之醚系溶劑、或鹵素系溶劑。其中,尤佳為四氫呋喃。其原因在於有如下傾向,即三茀化合物(IIa)對四氫呋喃之溶解性較低,目標物產生後迅速地析出,其以後之反應之進行被抑制,而目標物之選擇性提高。 In the two-layer reaction, two layers are formed with an alkaline aqueous solution. The anion generated from the amidine (I) has high solubility, and a polar solvent is preferred in terms of the tendency of the reaction to proceed well. An ether-based solvent or a halogen-based solvent. Among them, tetrahydrofuran is particularly preferred. The reason for this is that the trifluoride compound (IIa) has a low solubility in tetrahydrofuran, and the target substance is rapidly precipitated after it is generated, the subsequent reaction progress is suppressed, and the selectivity of the target substance is improved.

該等溶劑可單獨使用1種,亦可混合2種以上使用。 These solvents may be used alone or in combination of two or more.

關於溶劑之使用量,通常使用如成為原料之茀類(I)之10倍體積量、較佳為7倍體積量、進而較佳為4倍體積量之量。另一方面,若溶劑之使用量過少,則有攪拌變困難並且反應之進行變慢之傾向,因此作為下限,通常使用如成為原料之茀類(I)之1倍體積量、較佳為2倍體積量、進而較佳為3倍體積量之量。 As for the amount of the solvent to be used, an amount of 10 times the volume, preferably 7 times the volume, and more preferably 4 times the volume is used as the raw material (I). On the other hand, if the amount of the solvent used is too small, stirring tends to be difficult and the progress of the reaction tends to be slow. Therefore, as the lower limit, a volume of 1 times as much as the raw material (I) is preferably used, preferably 2 The volume-by-volume amount, and more preferably the volume-by-volume amount is 3 times.

<1.3.3.3.4反應形式> <1.3.3.3.4 Reaction Form>

進行步驟(ia)時,反應之形式可採用分批式反應,亦可採用流通式反應,亦可採用組合該等而成者,其形式並無特別限制。 When performing step (ia), the reaction may take the form of a batch reaction, a flow-through reaction, or a combination of these, and the form is not particularly limited.

<1.3.3.3.5反應條件> <1.3.3.3.5 Reaction conditions>

關於步驟(ia),為了抑制相比三茀化合物(IIa),茀環交聯之化合物之生成,較佳為於儘量低溫下進行反應。另一方面,若溫度過低,則有無法獲得充分之反應速度之可能性。 Regarding step (ia), in order to suppress the formation of a fluorene ring-crosslinked compound compared to the trifluorene compound (IIa), it is preferable to perform the reaction at a low temperature as much as possible. On the other hand, if the temperature is too low, a sufficient reaction rate may not be obtained.

因此,作為具體之反應溫度,通常於上限為40℃、較佳為30℃、更佳為20℃下實施。另一方面,於下限為-50℃、較佳為-20℃、更佳為0℃以上實施。 Therefore, as a specific reaction temperature, the upper limit is usually 40 ° C, preferably 30 ° C, and more preferably 20 ° C. On the other hand, the lower limit is -50 ° C, preferably -20 ° C, and more preferably 0 ° C or higher.

關於步驟(ia)中之通常之反應時間,通常下限為30分鐘,較佳為60分鐘,進而較佳為2小時,且上限並無特別限定,但通常為20小時、較佳為10小時,進而較佳為5小時。 Regarding the usual reaction time in step (ia), the lower limit is usually 30 minutes, preferably 60 minutes, and further preferably 2 hours, and the upper limit is not particularly limited, but is usually 20 hours, preferably 10 hours, It is more preferably 5 hours.

<1.3.3.3.6目標物之分離‧精製> <1.3.3.3.6 Separation and purification of target>

反應結束後,作為目標物之寡聚茀化合物(IIa)可藉由將反應液添加於稀鹽酸等酸性水中,或者將稀鹽酸等酸性水添加於反應液中,使作為目標物之寡聚茀化合物(IIa)析出而進行單離。 After completion of the reaction, the target oligomeric fluorene compound (IIa) can be added to the reaction solution by adding the reaction solution to acidic water such as dilute hydrochloric acid, or by adding acidic water such as dilute hydrochloric acid to the reaction solution to make the target oligomeric fluorene Compound (IIa) is precipitated and isolated.

又,反應結束後,亦可將作為目標物之寡聚茀化合物(IIa)可溶之溶劑與水添加於反應液中而進行萃取。藉由溶劑而萃取之目標物可藉由將溶劑進行濃縮之方法、或者添加不良溶劑之方法等而進行單離。其中,有於室溫下寡聚茀化合物(IIa)對溶劑之溶解性非常低之傾向,因此通常較佳為與酸性水進行接觸而析出之方法。 After the reaction is completed, a solvent in which the oligomeric fluorene compound (IIa) as a target is soluble and water may be added to the reaction solution to perform extraction. The target substance extracted by the solvent can be isolated by a method of concentrating the solvent or a method of adding a poor solvent. Among them, the solubility of the oligomeric fluorene compound (IIa) in a solvent at room temperature tends to be very low, and therefore, a method of precipitating it by contacting with acidic water is generally preferred.

所獲得之寡聚茀化合物(IIa)亦可直接用作步驟(ii)之原料,但亦可進行精製後用於步驟(ii)。作為精製法,可採用通常之精製法,例如再結晶、或再沈澱、萃取精製、管柱層析法等,並無限制。 The obtained oligomeric fluorene compound (IIa) can also be used directly as a raw material in step (ii), but it can also be used in step (ii) after purification. As the purification method, ordinary purification methods such as recrystallization, reprecipitation, extraction purification, and column chromatography can be used without limitation.

<1.3.3.4步驟(ib):R3為直接鍵以外之情形之製造方法> <1.3.3.4 Step (ib): Manufacturing method in a case where R 3 is other than a direct bond>

下述通式(IIb)所表示之寡聚茀化合物係以茀類(I)為原料,於烷化劑(VIIIa)與鹼存在下,依據下述式(ib)所表示之反應而製造。 The oligomeric fluorene compound represented by the following general formula (IIb) is produced by using a fluorene (I) as a raw material, in the presence of an alkylating agent (VIIIa) and a base, and reacting according to the formula (ib).

上述式中之寡聚茀化合物係結構式(IIb)所表示者。 The oligomeric fluorene compound in the above formula is represented by structural formula (IIb).

上述式中,R3、R4~R9及n係與上述式(1)中之R3、R4~R9及n含義相同。X表示脫離基。作為脫離基之例,可列舉:鹵素原子(其中, 將氟除外)或甲磺醯基、或甲苯磺醯基等。 In the above formulas, R 3, and R 4 ~ R 9 and n lines (1) of the formula R 3, the same as R 4 ~ R 9 and n meaning. X represents a radical. Examples of the leaving group include a halogen atom (except fluorine), a methanesulfonyl group, or a tosylsulfonyl group.

關於寡聚茀化合物(IIb)之製造法,已知有使用正丁基鋰作為鹼,使茀類(I)之陰離子產生後,與烷化劑(VIIIa)進行偶合之方法,已知有R3為伸乙基之情形,或R3為伸丙基等之情形之製造法(Organometallics,2008,27,3924;J.Molec.Cat.A:Chem.,2004,214,187.)。又,除伸烷基以外,亦有以苯二甲基進行交聯之報告例(J.Am.Chem.Soc.,2007,129,8458.)。然而,於該等使用正丁基鋰之方法中,對於工業性地製造而言,有不論是在安全方面,還是在成本方面均非常困難之傾向。 As a method for producing an oligomeric fluorene compound (IIb), a method is known in which n-butyllithium is used as a base to generate an anion of the fluorene (I) and then couple it with an alkylating agent (VIIIa). A manufacturing method in the case where 3 is an ethyl group or a case where R 3 is a propyl group (Organometallics, 2008, 27, 3924; J. Molec. Cat. A: Chem., 2004, 214, 187.) In addition to alkylene, there are also reports of cross-linking with xylylene (J. Am. Chem. Soc., 2007, 129, 8458.). However, in these methods using n-butyllithium, for industrial production, there is a tendency that it is very difficult both in terms of safety and cost.

作為步驟(ib)中所使用之烷化劑,可列舉:二碘甲烷、1,2-二碘乙烷、1,3-二碘丙烷、1,4-二碘丁烷、1,5-二碘戊烷、1,6-二碘己烷、二溴甲烷、1,2-二溴乙烷、1,3-二溴丙烷、1,4-二溴丁烷、1,5-二溴戊烷、1,6-二溴己烷、二氯甲烷、1,2-二氯乙烷、1,3-二氯丙烷、1,4-二氯丁烷、1,5-二氯戊烷、1,6-二氯己烷、1-溴-3-氯丙烷等直鏈狀之烷基二鹵化物(將氟原子除外)、2,2-二甲基-1,3-二氯丙烷等包含側鏈之烷基二鹵化物(將氟原子除外)、1,4-雙(溴甲基)苯、1,3-雙(溴甲基)苯等芳烷基二鹵化物(將氟原子除外)、乙二醇二甲磺酸酯、乙二醇二甲苯磺酸酯、丙二醇二甲磺酸酯、1,4-丁二醇二甲磺酸酯等二醇之二磺酸酯等。 Examples of the alkylating agent used in step (ib) include diiodomethane, 1,2-diiodoethane, 1,3-diiodopropane, 1,4-diiodobutane, and 1,5- Diiodopentane, 1,6-diiodohexane, dibromomethane, 1,2-dibromoethane, 1,3-dibromopropane, 1,4-dibromobutane, 1,5-dibromopentane Alkane, 1,6-dibromohexane, dichloromethane, 1,2-dichloroethane, 1,3-dichloropropane, 1,4-dichlorobutane, 1,5-dichloropentane, Linear alkyl dihalides (excluding fluorine atoms) such as 1,6-dichlorohexane and 1-bromo-3-chloropropane, 2,2-dimethyl-1,3-dichloropropane, etc. Aryl dihalides containing side chains (excluding fluorine atoms), 1,4-bis (bromomethyl) benzene, 1,3-bis (bromomethyl) benzene, etc. Excluding), ethylene glycol dimethyl sulfonate, ethylene glycol dimethyl sulfonate, propylene glycol dimethyl sulfonate, 1,4-butanediol dimethyl sulfonate and other diol disulfonates and the like.

<1.3.4寡聚茀二酯(1)之製造方法> <1.3.4 Production method of oligomeric fluorene diester (1)>

以下,將下述式所示之步驟(ii)中之寡聚茀二酯(1)之製造方法以R1及R2之種類進行分類而進行記載。 Hereinafter, the manufacturing method of the oligomeric fluorene diester (1) in the step (ii) represented by the following formula is classified and described by the types of R 1 and R 2 .

[化118] [Chemical 118]

上述各式中,R1~R9及n係與上述式(1)中之R1~R9及n含義相同。Ri、Rii及Riii表示氫原子、可經取代之碳數1~10之烷基、可經取代之碳數4~10之芳基、或可經取代之碳數6~10之芳烷基。 In the above formulas, R 1 ~ R 9 and n have the above-described formula based R (1) in the 1 ~ R 9 and n have the same meaning. R i , R ii and R iii represent a hydrogen atom, an alkyl group having 1 to 10 carbon atoms which may be substituted, an aryl group having 4 to 10 carbon atoms which may be substituted, or an aromatic group having 6 to 10 carbon atoms which may be substituted alkyl.

<1.3.4.1步驟(iia):通式(1)中利用麥可加成之製造法> <1.3.4.1 Step (iia): Manufacturing method using Michael addition in general formula (1)>

下述通式(1a)所表示之寡聚茀二酯係於鹼存在下,依據下述之步驟(iia)所表示之反應,自寡聚茀化合物(II)及α,β-不飽和酯(VI)進行製造。 The oligomeric fluorene diester represented by the following general formula (1a) is obtained from an oligomeric fluorene compound (II) and an α, β-unsaturated ester in the presence of a base according to the reaction represented by step (iia) below. (VI) Manufacturing.

上述式中,R3~R10及n係與上述式(1)中之R3~R10及n含義相同。Ri、Rii及Riii分別獨立表示氫原子、可經取代之碳數1~10之烷基、可經取代之碳數4~10之芳基、或可經取代之碳數6~10之芳烷基。 In the above formulas, R 3 ~ R 10 and n lines and n 3 ~ R 10 and the formula R (1) in the same meaning. R i , R ii and R iii each independently represent a hydrogen atom, an alkyl group having 1 to 10 carbon atoms that can be substituted, an aryl group having 4 to 10 carbon atoms that can be substituted, or 6 to 10 carbon atoms that can be substituted Of aralkyl.

<1.3.4.1.1 α,β-不飽和酯> <1.3.4.1.1 α, β-unsaturated ester>

作為反應試劑之α,β-不飽和酯係步驟(iia)中之通式(VI)所表示者,通式(VI)中,Ri、Rii及Riii分別獨立表示氫原子、碳數1~10之烷基、可經取代之碳數4~10之芳基、或可經取代之碳數6~10之芳烷 基。具體而言,可列舉:甲基、乙基、正丙基、異丙基、環己基等(可為直鏈亦可為側鏈)烷基、苯基、1-萘基、2-萘基、2-噻吩基等芳基、苄基、2-苯基乙基、對甲氧基苄基等芳烷基。 The α, β-unsaturated ester system as the reaction reagent is represented by the general formula (VI) in the step (iia). In the general formula (VI), R i , R ii and R iii each independently represent a hydrogen atom and a carbon number. An alkyl group of 1 to 10, an aryl group of 4 to 10 carbons that can be substituted, or an aralkyl group of 6 to 10 carbons that can be substituted. Specific examples include: methyl, ethyl, n-propyl, isopropyl, cyclohexyl, etc. (which may be straight or side chain) alkyl, phenyl, 1-naphthyl, 2-naphthyl , Aryl such as 2-thienyl, aralkyl such as benzyl, 2-phenylethyl, and p-methoxybenzyl.

作為α,β-不飽和酯(VI),可列舉:丙烯酸甲酯、丙烯酸乙酯、丙烯酸苯酯、丙烯酸烯丙酯、丙烯酸縮水甘油酯、丙烯酸2-羥基乙酯、丙烯酸4-羥基丁酯、1,4-環己烷二甲醇單丙烯酸酯等丙烯酸酯類、甲基丙烯酸甲酯、甲基丙烯酸乙酯、甲基丙烯酸苯酯、甲基丙烯酸烯丙酯、甲基丙烯酸縮水甘油酯、甲基丙烯酸2-羥基乙酯等甲基丙烯酸酯類、2-乙基丙烯酸甲酯、2-苯基丙烯酸甲酯等α-取代不飽和酯類、肉桂酸甲酯、肉桂酸乙酯、丁烯酸甲酯、丁烯酸乙酯等β-取代不飽和酯類。其中,較佳為可直接導入聚合反應性基之下述通式(VI-1)所表示之不飽和羧酸酯。 Examples of the α, β-unsaturated ester (VI) include methyl acrylate, ethyl acrylate, phenyl acrylate, allyl acrylate, glycidyl acrylate, 2-hydroxyethyl acrylate, and 4-hydroxybutyl acrylate. Acrylates such as 1,4-cyclohexanedimethanol monoacrylate, methyl methacrylate, ethyl methacrylate, phenyl methacrylate, allyl methacrylate, glycidyl methacrylate, Methacrylic esters such as 2-hydroxyethyl methacrylate, α-substituted unsaturated esters such as methyl 2-ethylacrylate and methyl 2-phenylacrylate, methyl cinnamate, ethyl cinnamate, butyl Β-substituted unsaturated esters such as methyl enoate and ethyl butenoate. Among these, an unsaturated carboxylic acid ester represented by the following general formula (VI-1) into which a polymerization-reactive group can be directly introduced is preferred.

(式中,R10表示碳數1~10之有機取代基,Riii表示氫原子、可經取代之碳數1~10之烷基、可經取代之碳數4~10之芳基、或可經取代之碳數6~10之芳烷基)。更佳為其所包含之丙烯酸酯類、甲基丙烯酸酯類或α-取代不飽和酯類,就反應速度與反應選擇性之觀點而言,進而較佳為Riii為氫原子或甲基之丙烯酸酯類或甲基丙烯酸酯類。R10更小者於工業上廉價且蒸餾精製亦容易,反應性亦較高,因此進而更佳為丙烯酸甲酯、甲基丙烯酸乙酯、丙烯酸乙酯、甲基丙烯酸乙酯、丙烯酸苯酯、或甲基丙烯酸苯酯。該等中,尤佳為丙烯酸乙酯、甲基丙烯酸乙酯,其原因在於:難以水解而難以產生副產物之羧酸。 (In the formula, R 10 represents an organic substituent having 1 to 10 carbon atoms, and R iii represents a hydrogen atom, an alkyl group having 1 to 10 carbon atoms that can be substituted, an aryl group having 4 to 10 carbon atoms that can be substituted, or Arylalkyl with 6 to 10 carbon atoms that can be substituted). The acrylates, methacrylates, or α-substituted unsaturated esters contained therein are more preferable, and from the viewpoint of reaction speed and reaction selectivity, it is more preferable that R iii is a hydrogen atom or a methyl group. Acrylates or methacrylates. The smaller R 10 is industrially cheap and easy to be distilled and purified, and the reactivity is also high. Therefore, it is more preferably methyl acrylate, ethyl methacrylate, ethyl acrylate, ethyl methacrylate, phenyl acrylate, Or phenyl methacrylate. Among these, ethyl acrylate and ethyl methacrylate are particularly preferred because carboxylic acids are difficult to hydrolyze and difficult to produce by-products.

另一方面,於酯基之有機取代基為具有丙烯酸2-羥基乙酯基、丙烯酸4-羥基丁酯基、1,4-環己烷二甲醇單丙烯酸酯基等羥基烷基之酯類之情形時,因可於第1階段獲得聚酯碳酸酯、聚酯之原料,故而尤佳。 On the other hand, the organic substituents in the ester group are esters having hydroxyalkyl groups such as 2-hydroxyethyl acrylate, 4-hydroxybutyl acrylate, and 1,4-cyclohexanedimethanol monoacrylate. In this case, it is particularly preferable because raw materials of polyester carbonate and polyester can be obtained in the first stage.

亦可使用不同之2種以上之α,β-不飽和酯(VI),就精製之簡便性而言,較佳為使用1種之α,β-不飽和酯(VI)。 It is also possible to use two or more different α, β-unsaturated esters (VI). In terms of simplicity of purification, it is preferable to use one type of α, β-unsaturated ester (VI).

α,β-不飽和酯(VI)之聚合活性較高,因此若以高濃度存在,則有由於光、熱、酸‧鹼等外部刺激而容易進行聚合之傾向。此時,有因伴隨著較大之放熱,而變得非常危險之情形。因此,關於α,β-不飽和酯(VI)之使用量,就安全性之觀點而言,較佳為不過量地使用。通常相對於作為原料之寡聚茀化合物(II),為10倍莫耳以下,較佳為5倍莫耳以下,進而較佳為3倍莫耳以下。下限係相對於原料以理論量計為2倍莫耳,因此通常為2倍莫耳以上。為了使反應之進行變快,不使原料或中間物殘留,α,β-不飽和酯(VI)之使用量係相對於原料之寡聚茀化合物(II)為2.2倍莫耳以上,進而較佳為2.5倍莫耳以上。 The polymerization activity of α, β-unsaturated ester (VI) is relatively high. Therefore, if it is present at a high concentration, it tends to be easily polymerized due to external stimuli such as light, heat, acid, and alkali. At this time, there is a case where it becomes very dangerous due to a large heat release. Therefore, the use amount of the α, β-unsaturated ester (VI) is preferably not excessively used from the viewpoint of safety. It is usually 10 times or less, preferably 5 times or less, and more preferably 3 times or less relative to the oligomeric fluorene compound (II) as a raw material. The lower limit is 2 times the mole in terms of the theoretical amount of the raw material, and therefore is usually 2 times the mole or more. In order to speed up the reaction without leaving raw materials or intermediates, the amount of α, β-unsaturated ester (VI) used is 2.2 times more than the mole of the oligomeric fluorene compound (II) of the raw materials, which is It is preferably 2.5 times more than Mohr.

<1.3.4.1.2鹼> <1.3.4.1.2 alkali>

作為鹼,可使用氫氧化鋰、氫氧化鈉、氫氧化鉀等鹼金屬氫氧化物、氫氧化鈣、氫氧化鋇等鹼土金屬之氫氧化物、碳酸鈉、碳酸氫鈉、碳酸鉀等鹼金屬之碳酸鹽、碳酸鎂、碳酸鈣等鹼土金屬之碳酸鹽、磷酸鈉、磷酸氫鈉、磷酸鉀等磷酸之鹼金屬鹽、正丁基鋰、第三丁基鋰等有機鋰鹽、甲醇鈉、乙醇鈉、第三丁醇鉀等鹼金屬之烷醇鹽、氫化鈉或氫化鉀等氫化鹼金屬鹽、三乙基胺、二氮雜雙環十一烯等三級胺、四甲基氫氧化銨、四丁基氫氧化銨、苄基三甲基氫氧化銨等四級氫氧化銨。該等可單獨使用1種,亦可併用2種以上。 As the base, alkali metal hydroxides such as lithium hydroxide, sodium hydroxide, and potassium hydroxide; hydroxides of alkaline earth metals such as calcium hydroxide and barium hydroxide; and alkali metals such as sodium carbonate, sodium bicarbonate, and potassium carbonate can be used. Carbonate, magnesium carbonate, calcium carbonate and other alkaline earth metal carbonates, sodium phosphate, sodium hydrogen phosphate, potassium phosphate and other phosphoric acid alkali metal salts, organic lithium salts such as n-butyl lithium, third butyl lithium, sodium methoxide, Alkoxides of alkali metals such as sodium ethoxide, potassium tert-butoxide, etc., alkali metal hydrides such as sodium hydride or potassium hydride, tertiary amines such as triethylamine, diazabicycloundecene, and tetramethylammonium hydroxide , Tetrabutylammonium hydroxide, benzyltrimethylammonium hydroxide, and other tertiary ammonium hydroxide. These may be used individually by 1 type, and may use 2 or more types together.

於R3為亞甲基之情形、與其以外之情形時,有寡聚茀化合物(II)之反應性存在較大差異之傾向。因此,將R3為亞甲基之情形、與其以 外之情形分開進行記載。 When R 3 is a methylene group and other cases, there is a tendency that the reactivity of the oligomeric fluorene compound (II) is greatly different. Therefore, the case where R 3 is methylene is described separately from the case other than R 3 .

於R3為亞甲基之情形時,寡聚茀化合物(II)係於溶劑中,於鹼存在下容易地進行分解反應。因此,於有機層與水層之二層系中進行反應之情形時,就可抑制分解反應等副反應之方面而言,較佳為使用水溶性之無機鹼。其中,就成本、反應性之方面而言,較佳為鹼金屬之氫氧化物之水溶液,尤其是氫氧化鈉之水溶液或氫氧化鉀之水溶液更佳。又,關於水溶液之濃度,於使用尤佳之氫氧化鈉水溶液之情形時,若濃度較薄,則有反應速度明顯降低之傾向,因此尤佳為使用通常為10wt/wt%以上、較佳為30wt/wt%以上、更佳為40wt/wt%以上之水溶液。 When R 3 is a methylene group, the oligomeric fluorene compound (II) is in a solvent, and a decomposition reaction is easily performed in the presence of a base. Therefore, when a reaction is performed in a two-layer system of an organic layer and an aqueous layer, a water-soluble inorganic base is preferably used in terms of suppressing side reactions such as decomposition reactions. Among them, in terms of cost and reactivity, an aqueous solution of an alkali metal hydroxide, particularly an aqueous solution of sodium hydroxide or an aqueous solution of potassium hydroxide is more preferable. In addition, regarding the concentration of the aqueous solution, in the case of using an especially preferred sodium hydroxide aqueous solution, if the concentration is relatively thin, the reaction rate tends to be significantly reduced. Therefore, it is particularly preferred to use 10wt / wt% or more, preferably An aqueous solution of 30 wt / wt% or more, more preferably 40 wt / wt% or more.

於R3為亞甲基以外之情形時,於有機層與水層之二層系中亦進行反應,但於使用溶解於有機層之有機鹼而進行反應之情形時,反應迅速進行,因此較佳為使用有機鹼。該等中,較佳為於本反應中具有充分之鹼性之鹼金屬之烷氧化物,更佳為工業上廉價之甲醇鈉或乙醇鈉。此處,鹼金屬之烷氧化物可使用粉狀者,亦可使用醇溶液等液狀者。又,亦可使鹼金屬與醇進行反應而製備。 When R 3 is other than methylene, the reaction is also performed in the two-layer system of the organic layer and the water layer. However, when the reaction is performed using an organic base dissolved in the organic layer, the reaction proceeds quickly, so Preferably, an organic base is used. Among these, an alkali metal alkoxide having sufficient basicity in this reaction is preferable, and industrially inexpensive sodium methoxide or sodium ethoxide is more preferable. Here, the alkali metal alkoxide may be used in a powder form or in a liquid form such as an alcohol solution. Alternatively, it may be prepared by reacting an alkali metal with an alcohol.

於R3為亞甲基之情形時,關於鹼之使用量,相對於作為原料之寡聚茀化合物(II),上限並無特別限制,若使用量過多,則有攪拌或反應後之精製負荷變大之情形,因此於使用作為尤佳之鹼之40wt/wt%以上之氫氧化鈉水溶液之情形時,通常相對於寡聚茀(II)為10倍體積量以下,較佳為5倍體積量以下,進而較佳為2倍體積量以下。若鹼量過少,則反應速度明顯降低,因此通常鹼相對於原料之寡聚茀化合物(II)為0.1倍體積量以上。較佳為0.2倍體積量以上,更佳為0.5倍體積量以上。 In the case where R 3 is methylene, the upper limit of the amount of base used is not particularly limited relative to the oligomeric fluorene compound (II) as a raw material. If the amount is too large, there may be a purification load after stirring or reaction. When it becomes larger, when using an aqueous sodium hydroxide solution of 40 wt / wt% or more, which is a particularly preferred base, it is usually 10 times or less the volume of the oligomeric fluorene (II), preferably 5 times the volume. The amount is less than or equal to 2 times the volume amount. If the amount of the base is too small, the reaction rate is significantly reduced. Therefore, the amount of the base relative to the oligomeric fluorene compound (II) of the raw material is usually 0.1 times or more by volume. It is preferably at least 0.2 times the volume, more preferably at least 0.5 times the volume.

於R3為亞甲基以外之情形時,關於鹼之使用量,相對於作為原料之寡聚茀化合物(II),上限並無特別限制,若使用量過多,則有攪拌 或反應後之精製負荷變大之情形,因此於使用作為尤佳之鹼之甲醇鈉或乙醇鈉之情形時,通常相對於寡聚茀化合物(II)為5倍莫耳以下,較佳為2倍莫耳以下,進而較佳為1倍莫耳以下,尤佳為0.5倍莫耳以下。若鹼量過少,則有反應速度明顯降低之傾向,因此通常鹼相對於原料之寡聚茀(II)為0.005倍莫耳以上。較佳為0.01倍莫耳以上,更佳為0.05倍莫耳以上,尤佳為0.1倍莫耳以上。 When R 3 is other than methylene, the upper limit of the amount of base used is not particularly limited relative to the oligomeric fluorene compound (II) as a raw material. If the amount is too large, there may be purification after stirring or reaction. When the load becomes large, when using sodium methoxide or sodium ethoxide, which is a particularly preferable base, it is usually 5 times or less, preferably 2 times or less, relative to the oligomeric fluorene compound (II). It is more preferably 1 time or less, more preferably 0.5 time or less. If the amount of alkali is too small, the reaction rate tends to decrease significantly. Therefore, the oligomeric fluorene (II) of the alkali relative to the raw material is usually 0.005 times mole or more. It is preferably at least 0.01 times the mole, more preferably at least 0.05 times the mole, and even more preferably at least 0.1 times the mole.

<1.3.4.1.3相間轉移觸媒> <1.3.4.1.3 Phase-to-phase transfer catalyst>

於步驟(iia)中,於有機層與水層之二層系中進行反應之情形時,為了提高反應速度,較佳為使用相間轉移觸媒。 In the case where the reaction is performed in a two-layer system of an organic layer and an aqueous layer in step (iia), in order to increase the reaction speed, it is preferable to use a phase transfer catalyst.

作為相間轉移觸媒,可列舉:氯化四甲基銨、溴化四丁基銨、氯化甲基三辛基銨、氯化甲基三癸基銨、氯化苄基三甲基銨、氯化三辛基甲基銨、碘化四丁基銨、溴化乙醯基三甲基銨、氯化苄基三乙基銨等四級銨鹽之鹵化物(氟除外)、氯化N,N-二甲基吡咯啶鎓、碘化N-乙基-N-甲基吡咯啶鎓、溴化N-丁基-N-甲基吡咯啶鎓、氯化N-苄基-N-甲基吡咯啶鎓、溴化N-乙基-N-甲基吡咯啶鎓等四級吡咯啶鎓鹽之鹵化物(氟除外)、溴化N-丁基-N-甲基嗎啉鎓、碘化N-丁基-N-甲基嗎啉鎓、溴化N-烯丙基-N-甲基嗎啉鎓等四級嗎啉鎓鹽之鹵化物(氟除外)、氯化N-甲基-N-苄基哌啶鎓、溴化N-甲基-N-苄基哌啶鎓、碘化N,N-二甲基哌啶鎓、N-甲基-N-丁基哌啶鎓乙酸鹽、碘化N-甲基-N-乙基哌啶鎓等四級哌啶鎓鹽之鹵化物(氟除外)、冠醚類等。較佳為四級銨鹽,進而較佳為溴化四丁基銨、氯化苄基三甲基銨、或氯化苄基三乙基銨。 Examples of the phase transfer catalyst include tetramethylammonium chloride, tetrabutylammonium bromide, methyltrioctylammonium chloride, methyltridecylammonium chloride, benzyltrimethylammonium chloride, Halides (except fluorine) of quaternary ammonium salts such as trioctylmethylammonium chloride, tetrabutylammonium iodide, acetamyltrimethylammonium bromide, benzyltriethylammonium chloride, etc. , N-dimethylpyrrolidinium, N-ethyl-N-methylpyrrolidinium iodide, N-butyl-N-methylpyrrolidinium bromide, N-benzyl-N-formyl chloride Halides (except fluorine) of quaternary pyrrolidinium salts such as methylpyrrolidinium, N-ethyl-N-methylpyrrolidinium bromide, N-butyl-N-methylmorpholinium bromide, iodine Tertiary morpholinium salts such as N-butyl-N-methylmorpholinium, N-allyl-N-methylmorpholinium bromide (except fluorine), N-methyl chloride -N-benzylpiperidinium, N-methyl-N-benzylpiperidinium bromide, N, N-dimethylpiperidinium iodide, N-methyl-N-butylpiperidinium acetic acid Halides (except fluorine) of quaternary piperidinium salts such as salts, iodized N-methyl-N-ethylpiperidinium, and crown ethers. A quaternary ammonium salt is preferable, and tetrabutylammonium bromide, benzyltrimethylammonium chloride, or benzyltriethylammonium chloride is more preferable.

該等可單獨使用1種,亦可併用2種以上。 These may be used individually by 1 type, and may use 2 or more types together.

關於相間轉移觸媒之使用量,若相對於作為原料之寡聚茀化合物(II)過多,則有酯之水解或逐次麥可反應等副反應之進行變明顯之傾向,又,就成本之觀點而言,通常相對於寡聚茀化合物(II)為5倍莫 耳以下,較佳為2倍莫耳以下,進而較佳為1倍莫耳以下。若相間轉移觸媒之使用量過少,則有反應速度明顯降低之傾向,因此通常相間轉移觸媒之使用量相對於原料之寡聚茀化合物(II)為0.01倍莫耳以上。較佳為0.1倍莫耳以上,更佳為0.5倍莫耳以上。 Regarding the amount of the phase-transfer catalyst used, if the amount of the oligomeric fluorene compound (II) is too much as a raw material, side reactions such as hydrolysis of esters or successive Michael reactions tend to become apparent, and from the viewpoint of cost Generally speaking, it is 5 times more than oligomeric fluorene compound (II). Below the ear, it is preferably 2 times the mole or less, and further preferably below 1 time the mole. If the amount of the interphase transfer catalyst used is too small, the reaction rate tends to decrease significantly. Therefore, the amount of the interphase transfer catalyst used is usually 0.01 times or more moles relative to the oligomeric fluorene compound (II) of the raw material. It is preferably at least 0.1 times mole, more preferably at least 0.5 times mole.

<1.3.4.1.4溶劑> <1.3.4.1.4 Solvent>

步驟(iia)較理想為使用溶劑而進行。 Step (iia) is preferably performed using a solvent.

關於具體可使用之溶劑,作為烷基腈系溶劑,可列舉乙腈、丙腈等,作為酮系溶劑,可列舉丙酮、甲基乙基酮、甲基異丁基酮等,作為酯系溶劑,可列舉乙酸甲酯、乙酸乙酯、乙酸丙酯、乙酸苯酯、丙酸甲酯、丙酸乙酯、丙酸丙酯、丙酸苯酯、3-甲氧基丙酸甲酯、3-甲氧基丙酸甲酯、乳酸甲酯、乳酸乙酯等直鏈狀之酯類;γ-丁內酯、己內酯等環狀酯類;乙二醇單甲醚乙酸酯、乙二醇單乙醚乙酸酯、乙二醇單丁醚乙酸酯、丙二醇-1-單甲醚乙酸酯、丙二醇-1-單乙醚乙酸酯等醚酯類等,作為醚系溶劑,可列舉二乙醚、四氫呋喃、1,4-二烷、甲基環戊基醚、第三丁基甲基醚等,作為鹵素系溶劑,可列舉1,2-二氯乙烷、二氯甲烷、氯仿、1,1,2,2-四氯乙烷等,作為鹵素系芳香族烴,可列舉氯苯、1,2-二氯苯等,作為醯胺系溶劑,可列舉N,N-二甲基甲醯胺、N,N,-二甲基乙醯胺等,作為亞碸系溶劑,可列舉二甲基亞碸、環丁碸等,作為環狀式脂肪族烴,可列舉環戊烷、環己烷、環庚烷、環辛烷等單環狀式脂肪族烴;作為其衍生物之甲基環戊烷、乙基環戊烷、甲基環己烷、乙基環己烷、1,2-二甲基環己烷、1,3-二甲基環己烷、1,4-二甲基環己烷、異丙基環己烷、正丙基環己烷、第三丁基環己烷、正丁基環己烷、異丁基環己烷、1,2,4-三甲基環己烷、1,3,5-三甲基環己烷等;十氫萘等多環狀式脂肪族烴;正戊烷、正己烷、正庚烷、正辛烷、異辛烷、正壬烷、正癸烷、正十二烷、正十四烷等非環狀式脂肪族烴,作為芳香族烴,可列舉:甲苯、 對二甲苯、鄰二甲苯、間二甲苯等,作為芳香族雜環,可列舉吡啶等,作為醇系溶劑,可列舉甲醇、乙醇、異丙醇、正丁醇、第三丁醇、己醇、辛醇、環己醇等。 Specific solvents that can be used include acetonitrile and propionitrile as the alkyl nitrile solvent, and acetone, methyl ethyl ketone, and methyl isobutyl ketone as the ketone solvent. As the ester solvent, Examples include methyl acetate, ethyl acetate, propyl acetate, phenyl acetate, methyl propionate, ethyl propionate, propyl propionate, phenyl propionate, methyl 3-methoxypropionate, 3- Linear esters such as methyl methoxypropionate, methyl lactate, ethyl lactate; cyclic esters such as γ-butyrolactone, caprolactone; ethylene glycol monomethyl ether acetate, ethylene glycol Ether esters such as alcohol monoethyl ether acetate, ethylene glycol monobutyl ether acetate, propylene glycol-1-monomethyl ether acetate, propylene glycol-1-monoethyl ether acetate, and the like, and examples thereof include ether solvents Diethyl ether, tetrahydrofuran, 1,4-bis Alkane, methylcyclopentyl ether, third butyl methyl ether, and the like. Examples of the halogen-based solvent include 1,2-dichloroethane, dichloromethane, chloroform, and 1,1,2,2-tetrachloroethane. Examples of the halogen-based aromatic hydrocarbon include chlorobenzene and 1,2-dichlorobenzene. Examples of the fluorene-based solvent include N, N-dimethylformamide and N, N, -dimethyl. Acetylamine and the like include fluorene-based solvents such as dimethyl fluorene and cyclobutane, and examples of cyclic aliphatic hydrocarbons include cyclopentane, cyclohexane, cycloheptane, and cyclooctane. Monocyclic aliphatic hydrocarbons; methylcyclopentane, ethylcyclopentane, methylcyclohexane, ethylcyclohexane, 1,2-dimethylcyclohexane, 1, 2 3-dimethylcyclohexane, 1,4-dimethylcyclohexane, isopropylcyclohexane, n-propylcyclohexane, third butylcyclohexane, n-butylcyclohexane, isopropyl Butylcyclohexane, 1,2,4-trimethylcyclohexane, 1,3,5-trimethylcyclohexane, etc .; Polycyclic aliphatic hydrocarbons such as decalin; n-pentane, n-hexane Non-cyclic aliphatic hydrocarbons such as alkane, n-heptane, n-octane, isooctane, n-nonane, n-decane, n-dodecane, n-tetradecane Examples of the aromatic hydrocarbon include toluene, para-xylene, o-xylene, and meta-xylene. Examples of the aromatic heterocyclic ring include pyridine. Examples of the alcohol-based solvent include methanol, ethanol, isopropyl alcohol, N-butanol, tertiary butanol, hexanol, octanol, cyclohexanol and the like.

於R3為亞甲基之情形時,可知有如下傾向,即藉由使用與水相分離之溶劑而可抑制寡聚茀化合物(II)之分解反應等副反應。進而於使用使原料之寡聚茀化合物(II)充分溶解之溶劑之情形時,有反應之進行良好之傾向,因此較佳為使用原料之寡聚茀化合物(II)之溶解度為0.5質量%以上之溶劑,更佳為使用溶解度為1.0質量%以上之溶劑,尤佳為使用溶解度為1.5質量%以上之溶劑。具體而言,較佳為鹵素系脂肪族烴、鹵素系芳香族烴、芳香族烴、或醚系溶劑,尤佳為二氯甲烷、氯苯、氯仿、1,2-二氯苯、四氫呋喃、1,4-二烷、或甲基環戊基醚。 When R 3 is a methylene group, it is known that by using a solvent separated from the water phase, side reactions such as a decomposition reaction of the oligomeric fluorene compound (II) can be suppressed. Furthermore, when a solvent that sufficiently dissolves the oligomeric fluorene compound (II) of the raw material is used, the reaction tends to proceed well. Therefore, the solubility of the oligomeric fluorene compound (II) using the raw material is preferably 0.5% by mass or more. The solvent is more preferably a solvent having a solubility of 1.0% by mass or more, and particularly preferably a solvent having a solubility of 1.5% by mass or more. Specifically, a halogen-based aliphatic hydrocarbon, a halogen-based aromatic hydrocarbon, an aromatic hydrocarbon, or an ether-based solvent is preferred, and dichloromethane, chlorobenzene, chloroform, 1,2-dichlorobenzene, tetrahydrofuran, 1,4-two Alkane, or methylcyclopentyl ether.

該等溶劑可單獨使用1種,亦可混合2種以上使用。 These solvents may be used alone or in combination of two or more.

關於溶劑之使用量,上限並無特別限制,若考慮每個反應器之目標物之產生效率,則通常使用如成為原料之寡聚茀化合物(II)之20倍體積量、較佳為15倍體積量、進而較佳為10倍體積量之量。另一方面,若溶劑之使用量過少,則有試劑之溶解性變差而攪拌變困難,並且反應之進行變慢之傾向,因此作為下限,通常使用如成為原料之寡聚茀化合物(II)之1倍體積量、較佳為2倍體積量、進而較佳為4倍體積量之量。 The upper limit of the amount of the solvent used is not particularly limited. If the production efficiency of the target substance in each reactor is considered, the volume of the oligomeric fluorene compound (II), such as the raw material, is usually 20 times the volume, preferably 15 times. The volume amount is more preferably an amount of 10 times the volume amount. On the other hand, if the amount of the solvent used is too small, the solubility of the reagent becomes worse, the stirring becomes difficult, and the progress of the reaction tends to be slow. Therefore, as the lower limit, an oligomeric fluorene compound (II) as a raw material is usually used. The amount is 1 times the volume, preferably 2 times the volume, and more preferably 4 times the volume.

於R3為亞甲基以外之情形時,可知有如下傾向,即有機鹼及寡聚茀化合物(II)之溶解性對反應速度產生較大之影響,為了確保其溶解性,較理想為使用具有一定值以上之介電常數之溶劑。作為使有機鹼及寡聚茀化合物(II)充分溶解之溶劑,較佳為芳香族雜環、烷基腈系溶劑、醯胺系溶劑、亞碸系溶劑,尤佳為吡啶、乙腈、N,N-二甲基甲醯胺、N,N-二甲基乙醯胺、二甲基亞碸、環丁碸。 When R 3 is other than methylene, it is known that the solubility of the organic base and the oligomeric fluorene compound (II) has a large influence on the reaction rate. In order to ensure the solubility, it is more preferably used. Solvents with a dielectric constant above a certain value. As a solvent for sufficiently dissolving the organic base and the oligomeric fluorene compound (II), an aromatic heterocyclic ring, an alkyl nitrile-based solvent, a fluorene-based solvent, and a fluorene-based solvent are preferred, and pyridine, acetonitrile, N, N-dimethylformamide, N, N-dimethylacetamide, dimethylmethane, cyclobutane.

該等溶劑可單獨使用1種,亦可混合2種以上使用。 These solvents may be used alone or in combination of two or more.

關於溶劑之使用量,上限並無特別限制,若考慮每個反應器之目標物之產生效率,則通常使用如成為原料之寡聚茀(II)之20倍體積量、較佳為15倍體積量、進而較佳為10倍體積量之量。另一方面,若溶劑之使用量過少,則有試劑之溶解性變差而攪拌變困難,並且反應之進行變慢之傾向,因此作為下限,通常使用如成為原料之寡聚茀(II)之1倍體積量、較佳為2倍體積量、進而較佳為4倍體積量之量。 With regard to the amount of solvent used, the upper limit is not particularly limited. If the production efficiency of the target substance in each reactor is considered, 20 times the volume, preferably 15 times the volume of the oligomeric fluorene (II) used as the raw material is usually used. The amount is more preferably an amount of 10 times the volume. On the other hand, if the amount of the solvent used is too small, the solubility of the reagent becomes worse, the stirring becomes difficult, and the progress of the reaction tends to be slow. Therefore, as the lower limit, an oligomeric osmium (II) used as a raw material is usually used. An amount of 1 volume, preferably an amount of 2 volume, and further preferably an amount of 4 volume.

<1.3.4.1.5反應形式> <1.3.4.1.5 Reaction Form>

進行步驟(iia)時,反應之形式可採用分批式反應,亦可採用流通式反應,亦可採用組合該等而成者,其形式並無特別限制。 When the step (iia) is performed, the form of the reaction may be a batch reaction, a flow-through reaction, or a combination of these, and the form is not particularly limited.

關於批次式之情形時反應試劑向反應器之投入方法,於反應開始時將α,β-不飽和酯(VI)一次性添加之情形時,α,β-不飽和酯(VI)以高濃度存在,因此副反應之聚合反應容易進行。因此,較佳為於添加原料之寡聚茀化合物(II)、相間轉移觸媒、溶劑及鹼後,少量多次地逐次添加α,β-不飽和酯(VI)。 Regarding the method of feeding the reaction reagent into the reactor in the case of batch type, when α, β-unsaturated ester (VI) is added at one time at the start of the reaction, α, β-unsaturated ester (VI) is higher The concentration is present, so that the polymerization reaction of side reactions easily proceeds. Therefore, it is preferable to add the α, β-unsaturated ester (VI) one after another in small amounts and multiple times after adding the oligomeric fluorene compound (II), the interphase transfer catalyst, the solvent, and the base.

<1.3.4.1.6反應條件> <1.3.4.1.6 Reaction conditions>

於步驟(iia)中,若溫度過低,則無法獲得充分之反應速度,反之若溫度過高,則有α,β-不飽和酯(VI)之聚合反應之進行、或者由於水解而容易產生下述通式(1a-I)所表示之寡聚茀單酯單羧酸及(1a-II)所表示之寡聚茀二羧酸之傾向,因此較佳為進行溫度管理。因此,作為反應溫度,具體而言,通常於下限為0℃、較佳為10℃、更佳為15℃下實施。另一方面,通常於上限為40℃、較佳為30℃、更佳為20℃下實施。 In step (iia), if the temperature is too low, a sufficient reaction rate cannot be obtained; otherwise, if the temperature is too high, the polymerization reaction of α, β-unsaturated ester (VI) proceeds or is easily generated due to hydrolysis. The oligomeric fluorene monoester monocarboxylic acid represented by the following general formula (1a-I) and the oligomeric fluorene dicarboxylic acid represented by (1a-II) have a tendency to be preferably temperature-controlled. Therefore, as the reaction temperature, the lower limit is usually 0 ° C, preferably 10 ° C, and more preferably 15 ° C. On the other hand, the upper limit is usually 40 ° C, preferably 30 ° C, and more preferably 20 ° C.

[化121] [Chemical 121]

上述式中,n、R3~R10、Ri、Rii及Riii係與上述式(1a)中之n、R3~R10、Ri、Rii及Riii含義相同。 In the above formulas, n, R 3 ~ R 10 , R i, R ii , and R iii lines as in the above-described formula (1a) n, R 3 ~ R 10, R i, R ii , and R iii same meaning.

關於步驟(iia)中之通常之反應時間,通常下限為30分鐘,較佳為1小時,進而較佳為2小時,若反應時間較長,則有所產生之寡聚茀二酯(1a)水解而產生羧酸之虞,因此通常為10小時,較佳為5小時,進而較佳為2小時。 Regarding the usual reaction time in step (iia), the lower limit is usually 30 minutes, preferably 1 hour, and more preferably 2 hours. If the reaction time is longer, the oligomeric fluorene diester (1a) is generated. The possibility of generating a carboxylic acid by hydrolysis is usually 10 hours, preferably 5 hours, and even more preferably 2 hours.

<1.3.4.1.7目標物之分離‧精製> <1.3.4.1.7 Separation and purification of target>

反應結束後,作為目標物之寡聚茀二酯(1a)可藉由將副產生之金屬鹵化物、及殘留之無機鹼進行過濾而自反應液去除後,採用將溶劑進行濃縮之方法、或添加目標物之不良溶劑之方法等,使作為目標物之寡聚茀二酯(1a)析出而進行單離。 After the reaction, the target oligomeric oligomeric diester (1a) can be removed from the reaction solution by filtering by-produced metal halides and residual inorganic bases, and then concentrating the solvent, or A method such as adding a poor solvent of the target substance, etc., separates the oligomeric fluorene diester (1a) as the target substance and separates it.

又,反應結束後,亦可向反應液添加酸性水與作為目標物之寡聚茀二酯(1a)可溶之溶劑而進行萃取。藉由溶劑而萃取之目標物可藉由將溶劑進行濃縮之方法、或添加不良溶劑之方法等而進行單離。 After the completion of the reaction, acidic water and a solvent soluble in the oligomeric fluorene diester (1a) as a target substance may be added to the reaction solution to perform extraction. The target substance extracted by the solvent can be isolated by a method of concentrating the solvent or a method of adding a poor solvent.

作為萃取時可使用之溶劑,只要為作為目標物之寡聚茀二酯(1a)溶解者即可,並無特別限制,可較佳地使用甲苯、二甲苯等芳香族烴化合物、二氯甲烷、氯仿等鹵素系溶劑等1種或2種以上。 The solvent that can be used during extraction is not particularly limited as long as it dissolves the oligomeric diester (1a) as the target, and aromatic hydrocarbon compounds such as toluene and xylene, and dichloromethane can be preferably used. Or one or more halogen-based solvents such as chloroform and chloroform.

此處所獲得之寡聚茀二酯(1a)可直接用作聚酯、或聚酯碳酸酯原料單體,或者聚碳酸酯原料單體之前驅物體等,但亦可於進行精製後使用。可知尤其是於含有寡聚茀單酯單羧酸(1a-I)及寡聚茀二羧酸(1a-II)等羧酸成分作為雜質之情形時,於寡聚茀二芳酯(2)之製造時,不僅成為酯交換反應觸媒之觸媒毒,而且寡聚茀二芳酯(2)所包含之金 屬含量增加,而導致熱穩定性降低,因此較佳為進行精製操作。作為精製法,可採用通常之精製法,例如再結晶、或再沈澱、萃取精製、管柱層析法等,並無限制。萃取精製因可藉由使用鹼性之水溶液而將羧酸成分作為羧酸鹽於水層進行去除,故而較佳。更佳為使用碳酸氫鈉、碳酸鈉、碳酸鉀、氫氧化鈉、氫氧化鉀等無機鹼之水溶液,進而更佳為難以引起之水解之碳酸氫鈉、碳酸鈉、碳酸鉀等弱鹼之水溶液。又,亦可使寡聚茀二酯(1a)溶解於適當之溶劑並利用活性碳進行處理。此時可使用之溶劑係與萃取時可使用之溶劑相同。 The oligomeric fluorene diester (1a) obtained here can be used directly as a raw material for polyester or polyester carbonate raw materials, or as a precursor for polycarbonate raw material monomers, but it can also be used after purification. In particular, when carboxylic acid components such as oligomeric fluorene monoester monocarboxylic acid (1a-I) and oligomeric fluorene dicarboxylic acid (1a-II) are contained as impurities, it can be seen that the oligomeric fluorene diaryl ester (2) When it is manufactured, it not only becomes the catalyst poison of the transesterification reaction catalyst, but also the gold contained in the oligomeric diaryl ester (2) Increasing the content of the metal leads to a decrease in thermal stability, so it is preferable to perform a refining operation. As the purification method, ordinary purification methods such as recrystallization, reprecipitation, extraction purification, and column chromatography can be used without limitation. Extraction purification is preferable because a carboxylic acid component can be removed as a carboxylic acid salt in an aqueous layer by using an alkaline aqueous solution. An aqueous solution of an inorganic base such as sodium bicarbonate, sodium carbonate, potassium carbonate, sodium hydroxide, or potassium hydroxide is more preferred, and an aqueous solution of a weak base such as sodium bicarbonate, sodium carbonate, or potassium carbonate, which is difficult to cause hydrolysis, is more preferred. . The oligomeric fluorene diester (1a) may be dissolved in an appropriate solvent and treated with activated carbon. The solvent that can be used at this time is the same as the solvent that can be used during extraction.

此處所獲得之寡聚茀二酯(1a)可直接用作聚酯、或聚酯碳酸酯原料單體、或者聚碳酸酯原料單體之前軀物等。 The oligomeric fluorene diester (1a) obtained here can be used directly as a raw material for polyester, polyester carbonate raw material monomer, or polycarbonate raw material monomer.

<1.3.4.2步驟(iib):利用烷基化反應之製造方法> <1.3.4.2 Step (iib): Production method using alkylation reaction>

寡聚茀二酯(1b)可藉由經過寡聚茀化合物(II)與烷化劑(VIIIb)及(VIIIc)之烷基化反應之方法而進行製造。 The oligomeric fluorene diester (1b) can be produced by a method in which an oligomeric fluorene compound (II) is alkylated with an alkylating agent (VIIIb) and (VIIIc).

上述式中,R1~R10及n係與上述式(1)中之R1~R10及n含義相同。X表示脫離基。作為脫離基之例,可列舉鹵素原子(其中,將氟除外)、甲磺醯基、或甲苯磺醯基等。 In the above formulas, R 1 ~ R 10 and n lines of the formula R (1) in the 1 ~ R 10 and n have the same meaning. X represents a radical. Examples of the leaving group include a halogen atom (excluding fluorine), a methanesulfonyl group, or a tosylsulfonyl group.

茀類之烷基化反應眾所周知,例如報告有9,9-雙(溴己基)茀或9,9-雙(碘己基)茀等9,9-雙(鹵烷基)茀(J.Org.Chem.,2010,75,2714.)。根據該等見解,可藉由以寡聚茀化合物(II)為原料而合成寡聚茀二酯(1b)。 The alkylation reaction of amidines is well known. For example, 9,9-bis (bromohexyl) fluorene or 9,9-bis (iodohexyl) fluorene and other 9,9-bis (haloalkyl) fluorene (J. Org. Chem., 2010, 75, 2714.). Based on these findings, an oligomeric fluorene diester (1b) can be synthesized by using an oligomeric fluorene compound (II) as a raw material.

作為步驟(iib)中所使用之烷化劑,可列舉:氯乙酸甲酯、溴乙酸 甲酯、碘乙酸甲酯、氯乙酸乙酯、溴乙酸乙酯、碘乙酸乙酯、氯乙酸丙酯、氯乙酸正丁酯、氯乙酸第三丁酯、溴乙酸第三丁酯、碘乙酸第三丁酯、氯丙酸甲酯、溴丙酸甲酯、碘丙酸甲酯、氯丙酸乙酯、氯丙酸第三丁酯、溴丙酸第三丁酯、溴丙酸乙酯、碘丙酸乙酯、氯丁酸甲酯、溴丁酸甲酯、碘丁酸甲酯、氯丁酸乙酯、氯丁酸乙酯、碘丁酸乙酯、碘丙酸第三丁酯等鹵烷酸烷基酯、氯乙酸苯酯、溴乙酸苯酯、碘乙酸苯酯等鹵烷酸芳酯、4-氯甲基苯甲酸甲酯、4-溴甲基苯甲酸甲酯、4-氯甲基苯甲酸乙酯、4-溴甲基苯甲酸乙酯、3-氯甲基苯甲酸甲酯、3-溴甲基苯甲酸甲酯等鹵烷基苯甲酸烷基酯等。 Examples of the alkylating agent used in step (iib) include methyl chloroacetate and bromoacetic acid. Methyl ester, methyl iodoacetate, ethyl chloroacetate, ethyl bromoacetate, ethyl iodoacetate, propyl chloroacetate, n-butyl chloroacetate, third butyl chloroacetate, third butyl bromoacetate, iodoacetic acid Third butyl ester, methyl chloropropionate, methyl bromopropionate, methyl iodopropionate, ethyl chloropropionate, third butyl chloropropionate, third butyl bromopropionate, ethyl bromopropionate , Ethyl iodopropionate, methyl chlorobutyrate, methyl bromobutyrate, methyl iodobutyrate, ethyl chlorobutyrate, ethyl chlorobutyrate, ethyl iodobutyrate, third butyl iodopropionate Alkyl alkanoates, phenyl chloroacetate, phenyl bromoacetate, phenyl iodoacetate, etc. aryl alkanoates, such as methyl 4-chloromethylbenzoate, methyl 4-bromomethylbenzoate, 4 -Alkyl alkyl benzoates such as ethyl chloromethylbenzoate, ethyl 4-bromomethylbenzoate, methyl 3-chloromethylbenzoate, methyl 3-bromomethylbenzoate, and the like.

再者,步驟(iib)之反應結束後,較佳為將作為目標物之寡聚茀二酯(1b)進行單離‧精製。作為單離‧精製之方法,可較佳地採用<1.3.4.1.7 目標物之分離‧精製>中所記載之方法。 In addition, after the reaction in step (iib) is completed, it is preferable to separate and refine the oligomeric diester (1b) as a target. As a method of single isolation and purification, the method described in <1.3.4.1.7 Isolation and Refining of Targets> can be preferably used.

<1.3.4.3 通式(2)之寡聚茀二芳酯之製造方法(利用酯交換反應之寡聚茀二芳酯化合物(2)之製造法)> <1.3.4.3 Production method of oligomeric perylene diaryl ester of general formula (2) (production method of oligomeric perylene diaryl ester compound (2) using transesterification reaction)>

寡聚茀二芳酯化合物(2)可藉由經過寡聚茀二酯化合物(1)、與碳酸二芳酯類(11a)之酯交換反應步驟(步驟(iic))之方法而進行製造。 The oligomeric fluorene diaryl ester compound (2) can be produced by a method (step (iic)) of an oligomeric fluorene diester compound (1) and a transesterification reaction step with a diaryl carbonate (11a).

上述式中,R1~R10及n係與上述式(1)中之R1~R10及n含義相同。Ar1表示可經取代之碳數4~10之芳基。 In the above formulas, R 1 ~ R 10 and n lines of the formula R (1) in the 1 ~ R 10 and n have the same meaning. Ar 1 represents an aryl group having 4 to 10 carbon atoms which may be substituted.

<1.3.4.3.1 通式(2)之寡聚茀二芳酯之製造方法(利用酯交換反應之寡聚茀二芳酯化合物(2)之製造法)> <1.3.4.3.1 Production method of oligomeric perylene diaryl ester of general formula (2) (production method of oligomeric perylene diaryl ester compound (2) using transesterification reaction)>

Ar1為可經取代之碳數4~10之芳基之寡聚茀二芳酯化合物(2)係於酯交換觸媒存在下,依據步驟(iic)所表示之反應,自寡聚茀二酯化合物(1)、碳酸二芳酯類(11a)進行製造。 Ar 1 is an oligomeric fluorene diarylate compound (2) which can be substituted with an aryl group having 4 to 10 carbon atoms. In the presence of a transesterification catalyst, according to the reaction represented by step (iic), the An ester compound (1) and a diaryl carbonate (11a) are produced.

<1.3.4.3.1.1寡聚茀二酯化合物(1)> <1.3.4.3.1.1 Oligomeric fluorene diester compound (1)>

若寡聚茀二酯化合物(1)之羧酸之含量較多,則有羧酸成為酯交換反應觸媒之觸媒毒,而必須大量使用酯交換反應觸媒之傾向。因此,若羧酸之含量較多,則有寡聚茀二芳酯化合物(2)所包含之金屬含量增加之傾向。就寡聚茀二芳酯(2)所包含之金屬量減少之觀點而言,寡聚茀二酯化合物(1)中之羧酸之含量較佳為5質量%以下,更佳為3質量%以下,進而較佳為2質量%以下,進而更佳為1質量%以下。又,羧酸含量越少越佳,但若要設為0質量%,則有為了雜質混入之防止等而伴隨著明顯之成本上升或生產效率降低之虞。可達到維持生產性之羧酸之含量通常為0.1質量%以上。 If the content of carboxylic acid in the oligomeric fluorene diester compound (1) is large, there is a tendency that the carboxylic acid becomes a catalyst poison of the transesterification reaction catalyst, and a large amount of the transesterification reaction catalyst must be used. Therefore, if the content of carboxylic acid is large, the metal content contained in the oligomeric fluorene diaryl ester compound (2) tends to increase. From the viewpoint of reducing the amount of metal contained in the oligomeric fluorene diaryl ester (2), the content of the carboxylic acid in the oligomeric fluorene diester compound (1) is preferably 5% by mass or less, and more preferably 3% by mass. Hereinafter, it is more preferably 2% by mass or less, and still more preferably 1% by mass or less. In addition, the smaller the carboxylic acid content is, the better it is. However, if it is set to 0% by mass, there is a concern that there is a significant increase in cost or a decrease in production efficiency for the purpose of preventing the inclusion of impurities. The content of the carboxylic acid capable of maintaining productivity is usually 0.1% by mass or more.

作為寡聚茀二酯化合物(1)所包含之羧酸,例如可列舉:寡聚茀單酯單羧酸、或寡聚茀二羧酸。 Examples of the carboxylic acid contained in the oligomeric fluorene diester compound (1) include an oligomeric fluorene monoester monocarboxylic acid or an oligomeric fluorene dicarboxylic acid.

寡聚茀二酯化合物(1)所包含之寡聚茀單酯單羧酸、或寡聚茀二羧酸之莫耳數例如可自HPLC分析之面積%,使用校正曲線而進行估算。 The mole number of the oligomeric fluorene monoester monocarboxylic acid or the oligomeric fluorene dicarboxylic acid contained in the oligomeric fluorene diester compound (1) can be estimated, for example, from the area% analyzed by HPLC using a calibration curve.

<1.3.4.3.1.2碳酸二芳酯類> <1.3.4.3.1.2 Diaryl carbonates>

關於作為反應試劑之碳酸二芳酯類,可列舉:碳酸二苯酯、碳酸二甲苯酯、碳酸雙(氯苯基)酯、碳酸間甲苯酯、碳酸二萘酯、碳酸雙(聯苯)酯等。其中,較佳為廉價且可工業性獲取之碳酸二苯酯。 Examples of the diaryl carbonates used as a reaction reagent include diphenyl carbonate, xylyl carbonate, bis (chlorophenyl) carbonate, m-tolyl carbonate, dinaphthyl carbonate, and bis (biphenyl) carbonate. Wait. Among them, diphenyl carbonate, which is inexpensive and commercially available, is preferred.

該等碳酸二芳酯可單獨使用1種,亦可混合2種以上使用。 These diaryl carbonates may be used singly or in combination of two or more kinds.

關於碳酸二芳酯類之使用量,相對於作為原料之寡聚茀二酯(1),上限並無特別限定,若使用量過多,則有反應後之精製負荷變大之傾向,因此通常為寡聚茀二酯之20倍莫耳以下,較佳為10倍莫耳 以下,進而較佳為5倍莫耳以下。 Regarding the amount of diaryl carbonate used, the upper limit is not particularly limited with respect to the oligomeric fluorene diester (1) as a raw material. If the amount used is too large, the refining load after the reaction tends to increase. Less than 20 times moles of oligomeric diester, preferably 10 times moles Hereinafter, it is more preferably 5 times or less.

另一方面,若碳酸二芳酯之使用量過少,則有原料之寡聚茀二酯(1)、或作為中間物之如以下所示之寡聚茀單芳酯(10e)殘留之情形,因此作為下限,通常相對於原料之寡聚茀二酯(1)為1倍莫耳以上,較佳為1.5倍莫耳以上,進而較佳為2倍莫耳以上。 On the other hand, if the amount of diaryl carbonate used is too small, there may be cases where the oligomeric fluorene diester (1) as a raw material or the oligomeric fluorene monoaryl ester (10e) remaining as an intermediate is left, Therefore, as the lower limit, the oligomeric fluorene diester (1) with respect to the raw material is generally 1 time or more, preferably 1.5 time or more, and more preferably 2 time or more.

上述式中,R1~R10及n係與上述式(1)中之R1~R10及n含義相同。Ar1表示可經取代之碳數4~10之芳基。 In the above formulas, R 1 ~ R 10 and n lines of the formula R (1) in the 1 ~ R 10 and n have the same meaning. Ar 1 represents an aryl group having 4 to 10 carbon atoms which may be substituted.

<1.3.4.3.1.3酯交換反應觸媒> <1.3.4.3.1.3 Transesterification reaction catalyst>

作為酯交換反應觸媒,可列舉:四丁氧基鈦、四異丁氧基鈦、四甲氧基鈦、四異丙氧基鈦、四乙氧基鈦、四(2-乙基己氧基)鈦、四(十八烷氧基)鈦、四苯氧基鈦、乙醯丙酮鈦(IV)、雙(乙醯丙酮)異丙氧基鈦(IV)等鈦化合物;碳酸鋰、二丁基胺基鋰、乙醯丙酮鋰、苯酚鈉、苯酚鉀等鹼金屬化合物;乙醯丙酮鎘、碳酸鎘等鎘化合物;乙醯丙酮鋯、二茂鋯等鋯化合物;硫化鉛、氫氧化鉛、鉛酸鹽、亞鉛酸鹽、碳酸鉛、乙酸鉛、四丁基鉛、四苯基鉛、三苯基鉛、二甲氧基鉛、二苯氧基鉛等鉛化合物;乙酸銅、雙乙醯丙酮銅、油酸銅、丁基銅、二甲氧基銅、氯化銅等銅化合物;氫氧化鐵、碳酸鐵、三乙醯氧基鐵、三甲氧基鐵、三苯氧基鐵等鐵化合物;雙乙醯丙酮鋅、二乙醯氧基鋅、二甲氧基鋅、二乙氧基鋅、二苯氧基鋅等鋅化合物;氧化二正丁基錫、氧化二苯基錫、氧化二正辛基錫、二正丁基二甲醇錫、二丙烯酸二正丁基錫、二甲基丙烯酸二正丁基錫、二月桂酸二正丁基 錫、四甲氧基錫、四苯氧基錫、四丁基-1,3-二乙醯氧基二錫氧烷等有機錫化合物;乙酸鋁、甲醇鋁、乙醇鋁、苯酚鋁等鋁化合物;二氯化釩、三氯化釩、四氯化釩、硫酸釩等釩化合物;四苯基苯酚鏻等鏻鹽等。該等可單獨使用1種,亦可併用2種以上。 Examples of the transesterification catalyst include tetrabutoxytitanium, tetraisobutoxytitanium, tetramethoxytitanium, tetraisopropoxytitanium, tetraethoxytitanium, and tetrakis (2-ethylhexyloxy). Titanium compounds such as titanium, tetrakis (octadecyloxy), titanium tetraphenoxy, titanium (IV) acetoacetone, titanium (IV) bis (ethylacetone) isopropoxy titanium; lithium carbonate, lithium Alkali metal compounds such as lithium butylamino, lithium acetoacetone, sodium phenoxide, potassium phenol; cadmium compounds such as cadmium acetoacetone, cadmium carbonate; zirconium compounds such as zirconium acetoacetone, zirconocene, etc. Lead compounds such as lead, lead, lead, carbonate, lead acetate, tetrabutyl lead, tetraphenyl lead, triphenyl lead, dimethoxy lead, diphenoxy lead, etc. Copper compounds such as copper acetone acetone, copper oleate, butyl copper, dimethoxy copper, and copper chloride; iron hydroxide, iron carbonate, triethoxy iron, trimethoxy iron, and triphenoxy iron Other iron compounds; zinc compounds such as zinc diacetamate acetone, zinc diethoxylate, dimethoxyzinc, diethoxyzinc, and diphenoxyzinc; di-n-butyltin oxide, diphenyltin oxide , Di-n-octyltin oxide, Di-n-butyltin dimethanol, Di-n-butyltin diacrylate, Di-n-butyltin dimethacrylate, Di-n-butyl dilaurate Organotin compounds such as tin, tetramethoxytin, tetraphenoxytin, tetrabutyl-1,3-diethylfluorenyldistanoxane; aluminum compounds such as aluminum acetate, aluminum methoxide, aluminum ethoxide, and aluminum phenolate ; Vanadium compounds such as vanadium dichloride, vanadium trichloride, vanadium tetrachloride, and vanadium sulfate; phosphonium salts such as tetraphenylphenol rhenium and the like. These may be used individually by 1 type, and may use 2 or more types together.

該等中,就工業上廉價且有反應操作上之優勢之方面而言,較佳為使用鏻鹽、鋰化合物、鋯化合物、有機錫化合物、或鈦化合物等,其中,尤佳為有機錫化合物或鈦化合物。 Among these, it is preferable to use a sulfonium salt, a lithium compound, a zirconium compound, an organotin compound, or a titanium compound from the viewpoint of being industrially inexpensive and having advantages in reaction operation. Among them, an organotin compound is particularly preferred. Or titanium compounds.

關於酯交換反應觸媒之使用量,相對於作為原料之寡聚茀二酯(1),上限並無特別限制,若使用量過多,則有反應後之精製負荷變大之傾向,因此通常為茀之20莫耳%以下,較佳為10莫耳%以下,進而較佳為5莫耳%以下。 Regarding the amount of the transesterification reaction catalyst, the upper limit is not particularly limited with respect to the oligomeric fluorene diester (1) as a raw material. If the amount used is too large, the refining load after the reaction tends to increase, so it is usually It is preferably 20 mol% or less, preferably 10 mol% or less, and further preferably 5 mol% or less.

另一方面,若酯交換反應觸媒之使用量過少,則有反應時間變得過長之情形,因此作為下限,通常相對於原料之寡聚茀二酯為0.1莫耳%以上,較佳為0.5莫耳%以上,進而較佳為1莫耳%以上。 On the other hand, if the amount of transesterification catalyst used is too small, the reaction time may become too long. Therefore, as the lower limit, it is usually 0.1 mol% or more relative to the oligomeric oligo diester of the raw material. 0.5 mol% or more, more preferably 1 mol% or more.

<1.3.4.3.1.4溶劑> <1.3.4.3.1.4 Solvent>

步驟(iic)中,亦可使用反應溶劑,但較佳為不使用反應溶劑,僅以原料之寡聚茀二酯(1)、碳酸二芳酯類、及酯交換反應觸媒進行反應。然而,於原料之寡聚茀二酯(1)、碳酸二芳酯類於常溫下為固體而難以攪拌之情形時,亦可使用反應溶劑。於使用反應溶劑之情形時,只要為可使上述原料之寡聚茀二酯(1)、碳酸二芳酯類、及酯交換反應觸媒較佳地溶解及/或分散之溶劑,則其種類任意。 In step (iic), a reaction solvent may also be used, but it is preferred that the reaction is not performed using only the oligomeric fluorene diester (1), the diaryl carbonate, and the transesterification reaction catalyst. However, in the case where the oligomeric fluorene diester (1) and the diaryl carbonate of the raw materials are solid at normal temperature and it is difficult to stir, a reaction solvent may be used. In the case of using a reaction solvent, as long as it is a solvent capable of dissolving and / or dispersing the oligomeric fluorene diester (1), diaryl carbonates, and transesterification reaction catalysts of the above materials, Arbitrary.

關於具體之可使用之溶劑,作為烷基腈系溶劑,可列舉乙腈、丙腈等,作為酮系溶劑,可列舉丙酮、甲基乙基酮、甲基異丁基酮等,作為醚系溶劑,可列舉二乙基醚、四氫呋喃、1,4-二烷、甲基環戊基醚、第三丁基甲基醚等,作為鹵素系溶劑,可列舉1,2-二氯乙烷、二氯甲烷、氯仿、1,1,2,2-四氯乙烷等,作為鹵素系芳香族烴, 可列舉氯苯、1,2-二氯苯等,作為醯胺系溶劑,可列舉N,N-二甲基甲醯胺、N,N,-二甲基乙醯胺等,作為亞碸系溶劑,可列舉二甲基亞碸、環丁碸等,作為環狀式脂肪族烴,可列舉:環戊烷、環己烷、環庚烷、環辛烷等單環狀式脂肪族烴;作為其衍生物之甲基環戊烷、乙基環戊烷、甲基環己烷、乙基環己烷、1,2-二甲基環己烷、1,3-二甲基環己烷、1,4-二甲基環己烷、異丙基環己烷、正丙基環己烷、第三丁基環己烷、正丁基環己烷、異丁基環己烷、1,2,4-三甲基環己烷、1,3,5-三甲基環己烷等;十氫萘等多環狀式脂肪族烴;正戊烷、正己烷、正庚烷、正辛烷、異辛烷、正壬烷、正癸烷、正十二烷、正十四烷等非環狀式脂肪族烴,作為芳香族烴,可列舉甲苯、對二甲苯、鄰二甲苯、間二甲苯、1,3,5-三甲基苯、1,2,4-三甲基苯、1,2,3,4-四氫化萘等,作為芳香族雜環,可列舉吡啶等。 Specific solvents that can be used include acetonitrile and propionitrile as the alkyl nitrile solvent, and acetone, methyl ethyl ketone, and methyl isobutyl ketone as the ketone solvent, and ether solvents as the ketone solvent. , Including diethyl ether, tetrahydrofuran, 1,4-di Alkane, methylcyclopentyl ether, third butyl methyl ether, and the like. Examples of the halogen-based solvent include 1,2-dichloroethane, dichloromethane, chloroform, and 1,1,2,2-tetrachloroethane. Examples of the halogen-based aromatic hydrocarbon include chlorobenzene and 1,2-dichlorobenzene. Examples of the fluorene-based solvent include N, N-dimethylformamide and N, N, -dimethyl. Acetylamine and the like include fluorene-based solvents such as dimethyl fluorene and cyclobutane. Examples of the cyclic aliphatic hydrocarbon include cyclopentane, cyclohexane, cycloheptane, and cyclooctane. And other monocyclic aliphatic hydrocarbons; its derivatives are methylcyclopentane, ethylcyclopentane, methylcyclohexane, ethylcyclohexane, 1,2-dimethylcyclohexane, 1 , 3-dimethylcyclohexane, 1,4-dimethylcyclohexane, isopropylcyclohexane, n-propylcyclohexane, third butylcyclohexane, n-butylcyclohexane, Isobutylcyclohexane, 1,2,4-trimethylcyclohexane, 1,3,5-trimethylcyclohexane, etc .; polycyclic aliphatic hydrocarbons such as decahydronaphthalene; n-pentane, Non-cyclic fats such as n-hexane, n-heptane, n-octane, isooctane, n-nonane, n-decane, n-dodecane, n-tetradecane Hydrocarbons, examples of aromatic hydrocarbons include toluene, para-xylene, o-xylene, m-xylene, 1,3,5-trimethylbenzene, 1,2,4-trimethylbenzene, 1,2,3 , 4-tetrahydronaphthalene, etc. Examples of the aromatic heterocyclic ring include pyridine.

本反應較佳為於通常100℃以上之高溫下進行,因此上述溶劑中,較佳為沸點為100℃以上之溶劑,即氯苯、1,2-二氯苯、三氯苯、甲苯、對二甲苯、鄰二甲苯、間二甲苯、1,3,5-三甲基苯、1,2,4-三甲基苯、1,2,3,4-四氫化萘、十氫化萘、N,N-二甲基甲醯胺、N,N-二甲基乙醯胺、二甲基亞碸、或環丁碸,就可使原料之寡聚茀二酯(10b)較佳地溶解,且沸點為130℃以上而可於更高溫下進行反應之方面而言,尤佳為1,2-二氯苯、二甲苯、1,3,5-三甲基苯、1,2,4-三甲基苯、或1,2,3,4-四氫化萘、十氫化萘。 This reaction is preferably carried out at a high temperature of generally 100 ° C or higher. Therefore, among the above solvents, solvents having a boiling point of 100 ° C or higher, that is, chlorobenzene, 1,2-dichlorobenzene, trichlorobenzene, toluene, p- Xylene, o-xylene, m-xylene, 1,3,5-trimethylbenzene, 1,2,4-trimethylbenzene, tetralin, decalin, N , N-dimethylformamide, N, N-dimethylacetamide, dimethylmethane, or cyclobutane, the oligomeric fluorene diester (10b) of the raw material can be better dissolved, From the viewpoint that the boiling point is 130 ° C or higher and the reaction can be performed at a higher temperature, 1,2-dichlorobenzene, xylene, 1,3,5-trimethylbenzene, 1,2,4- Trimethylbenzene, or tetralin or decalin.

該等溶劑可單獨使用1種,亦可混合2種以上使用。 These solvents may be used alone or in combination of two or more.

關於溶劑之使用量,上限並無特別限制,若考慮每個反應器之目標物之產生效率,則通常使用如成為原料之寡聚茀二酯(1)之15倍體積量、較佳為10倍體積量、進而較佳為5倍體積量之量。另一方面,若溶劑之使用量過少,則有試劑之溶解性變差而攪拌變困難,並且反應之進行變慢之傾向,因此作為下限,通常使用如以原料之寡聚 茀二酯(1)之濃度計成為1倍體積量、較佳為2倍體積量、進而較佳為4倍體積量之量。 Regarding the amount of solvent used, the upper limit is not particularly limited. If the production efficiency of the target of each reactor is considered, 15 times the volume of the oligomeric diester (1) as the raw material is usually used, preferably 10 The volume-by-volume amount, and more preferably, the volume-by-volume amount is 5 times. On the other hand, if the amount of the solvent used is too small, the solubility of the reagent becomes poor and the stirring becomes difficult, and the progress of the reaction tends to be slow. Therefore, as the lower limit, an oligomerization using a raw material is generally used. The concentration of the perylene diester (1) is 1 volume volume, preferably 2 volume volume, and more preferably 4 volume volume.

<1.3.4.3.1.5反應形式> <1.3.4.3.1.5 Reaction Form>

進行步驟(iic)時,反應之形式可採用分批式反應,亦可採用流通式反應,亦可採用組合該等而成者,其形式並無特別限制。 When the step (iic) is performed, the form of the reaction may be a batch reaction, a flow-through reaction, or a combination of these, and the form is not particularly limited.

<1.3.4.3.1.6反應條件> <1.3.4.3.1.6 Reaction conditions>

於步驟(iic)中,若溫度過低,則有無法獲得充分之反應速度之傾向,因此通常於下限為50℃、較佳為70℃、更佳為100℃下實施。另一方面,關於上限,係於通常250℃、較佳為200℃、更佳為180℃下實施。 In the step (iic), if the temperature is too low, a sufficient reaction rate may not be obtained. Therefore, the lower limit is usually 50 ° C, preferably 70 ° C, and more preferably 100 ° C. On the other hand, the upper limit is implemented at usually 250 ° C, preferably 200 ° C, and more preferably 180 ° C.

關於步驟(iic)中之通常之反應時間,通常下限為1小時、較佳為2小時、進而較佳為3小時,且上限並無特別限定,通常為30小時、較佳為20小時、進而較佳為10小時。 Regarding the usual reaction time in step (iic), the lower limit is usually 1 hour, preferably 2 hours, and further preferably 3 hours, and the upper limit is not particularly limited, but is usually 30 hours, preferably 20 hours, and further It is preferably 10 hours.

於步驟(iic)中,為了使平衡偏向生成物側,而亦可一面於減壓下將副產物蒸餾去除一面進行反應。關於設為減壓之情形之壓力,係於通常20kPa以下、較佳為10kPa以下、更佳為5kPa以下實施。另一方面,若減壓度過高,則有連用作試劑之碳酸二芳酯類亦昇華之可能性,因此於通常0.1kPa以上、較佳為0.5kPa以上、更佳為1.0kPa以上實施。 In step (iic), in order to shift the equilibrium to the product side, the reaction may be performed while distilling off by-products under reduced pressure. The pressure in the case of reduced pressure is usually 20 kPa or less, preferably 10 kPa or less, and more preferably 5 kPa or less. On the other hand, if the degree of reduced pressure is too high, even diaryl carbonates used as reagents may also sublime. Therefore, it is usually performed at 0.1 kPa or more, preferably 0.5 kPa or more, and more preferably 1.0 kPa or more.

<1.3.4.3.1.7目標物之分離‧精製> <1.3.4.3.1.7 Separation and purification of target>

反應結束後,作為目標物之寡聚茀二芳酯(2)可藉由向反應液添加不良溶劑,使上述作為目標物之寡聚茀二芳酯(2)析出而進行單離。 After completion of the reaction, the oligomeric fluorene diaryl ester (2) as a target substance can be isolated by adding a poor solvent to the reaction solution to precipitate the oligomeric fluorene diaryl ester (2) as a target substance.

又,反應結束後,亦可將作為目標物之寡聚茀二芳酯(2)可溶之溶劑與水添加於反應液而進行萃取。藉由溶劑而萃取之目標物可藉由利用由溫度差引起之溶解度差之方法、將溶劑進行濃縮之方法、或者 添加不良溶劑之方法等而進行單離。 After the reaction is completed, a target oligomeric fluorene diaryl ester (2) -soluble solvent and water may be added to the reaction solution to perform extraction. The target substance extracted by the solvent may be a method using a difference in solubility caused by a temperature difference, a method of concentrating a solvent, or A method such as adding a poor solvent is used for single isolation.

所獲得之寡聚茀二芳酯(2)亦可作為含有聚酯碳酸酯之聚碳酸酯原料、或聚酯原料而直接用於聚合。作為精製法,可採用通常之精製法,例如再結晶、或再沈澱、萃取精製、管柱層析法等,並無限制。 The obtained oligomeric fluorene diaryl ester (2) can also be directly used for polymerization as a polycarbonate raw material containing polyester carbonate or a polyester raw material. As the purification method, ordinary purification methods such as recrystallization, reprecipitation, extraction purification, and column chromatography can be used without limitation.

於利用再結晶或再沈澱等精製法而進行精製時,關於可具體用作良溶劑之溶劑,作為烷基腈系溶劑,可列舉乙腈、丙腈等,作為酮系溶劑,可列舉丙酮、甲基乙基酮、甲基異丁基酮等,作為醚系溶劑,可列舉二乙基醚、四氫呋喃、1,4-二烷、甲基環戊基醚、第三丁基甲基醚等,作為鹵素系溶劑,可列舉1,2-二氯乙烷、二氯甲烷、氯仿、1,1,2,2-四氯乙烷等,作為鹵素系芳香族烴,可列舉氯苯、1,2-二氯苯等,作為醯胺系溶劑,可列舉N,N-二甲基甲醯胺、N,N-二甲基乙醯胺等,作為亞碸系溶劑,可列舉二甲基亞碸、環丁碸等,作為芳香族烴,可列舉甲苯、對二甲苯、鄰二甲苯、間二甲苯、1,3,5-三甲基苯、1,2,4-三甲基苯、1,2,3,4-四氫化萘等,作為芳香族雜環,可列舉吡啶等。 When purification is performed by a refining method such as recrystallization or reprecipitation, solvents that can be specifically used as good solvents include acetonitrile, propionitrile, and the like as alkonitrile solvents, and acetone and formaldehyde as the ketone solvents. Ethyl ethyl ketone, methyl isobutyl ketone and the like. Examples of ether solvents include diethyl ether, tetrahydrofuran, 1,4-di Alkane, methylcyclopentyl ether, third butyl methyl ether, and the like. Examples of the halogen-based solvent include 1,2-dichloroethane, dichloromethane, chloroform, and 1,1,2,2-tetrachloroethane. Examples of the halogen-based aromatic hydrocarbon include chlorobenzene and 1,2-dichlorobenzene. Examples of the fluorene-based solvent include N, N-dimethylformamide and N, N-dimethylethyl. Examples of fluorene-based solvents include dimethyl sulfene and cyclobutane. Examples of aromatic hydrocarbons include toluene, para-xylene, o-xylene, m-xylene, and 1,3,5-. Trimethylbenzene, 1,2,4-trimethylbenzene, 1,2,3,4-tetrahydronaphthalene, etc. Examples of the aromatic heterocyclic ring include pyridine.

寡聚茀二芳酯(2)因根據溫度之溶解度差較大,故較佳為沸點為100℃以上之甲基異丁基酮、1,4-二烷、甲基環戊基醚、第三丁基甲基醚、1,1,2,2-四氯乙烷、氯苯、1,2-二氯苯、N,N-二甲基甲醯胺、N,N-二甲基乙醯胺、二甲基亞碸、環丁碸、甲苯、對二甲苯、鄰二甲苯、間二甲苯、1,3,5-三甲基苯、1,2,4-三甲基苯、1,2,3,4-四氫化萘、吡啶。該等中,更佳為即便於酯交換觸媒存在下,於高溫下亦穩定且非鹵素系下環境負荷亦較小之芳香族烴之甲苯、對二甲苯、鄰二甲苯、間二甲苯、1,3,5-三甲基苯、1,2.4-三甲基苯。 The oligomeric arylene diaryl ester (2) has a large difference in solubility depending on the temperature, so methyl isobutyl ketone and 1,4-dimethyl ketone having a boiling point of 100 ° C or higher are preferred. Alkane, methylcyclopentyl ether, third butyl methyl ether, 1,1,2,2-tetrachloroethane, chlorobenzene, 1,2-dichlorobenzene, N, N-dimethylformamide, N, N-dimethylacetamidamine, dimethylmethylene sulfene, cyclobutane, toluene, paraxylene, o-xylene, m-xylene, 1,3,5-trimethylbenzene, 1,2, 4-trimethylbenzene, 1,2,3,4-tetrahydronaphthalene, pyridine. Of these, toluene, para-xylene, o-xylene, m-xylene, aromatic hydrocarbons which are stable at high temperatures and have a small environmental load under non-halogen systems even in the presence of transesterification catalysts, 1,3,5-trimethylbenzene, 1,2.4-trimethylbenzene.

該等良溶劑可單獨使用1種,亦可混合2種以上使用。 These good solvents can be used alone or in combination of two or more.

關於溶劑之使用量,上限並無特別限制,若考慮每個反應器之目標物之精製效率,則通常使用如成為寡聚茀二芳酯(2)之15倍質量 量、較佳為10倍質量量、進而較佳為5倍質量量之量。另一方面,若溶劑之使用量過少,則試劑之溶解性變差而攪拌變困難,並且反應之進行變慢,因此作為下限,通常使用如以寡聚茀二芳酯(2)之濃度計成為0.3倍質量量、較佳為0.5倍質量量、進而較佳為1倍質量量之量。 Regarding the amount of solvent used, the upper limit is not particularly limited. If the purification efficiency of the target of each reactor is considered, it is usually used as 15 times the mass of the oligomeric diaryl ester (2). The amount is preferably 10 times the mass amount, and more preferably 5 times the mass amount. On the other hand, if the amount of the solvent used is too small, the solubility of the reagent becomes poor and the stirring becomes difficult, and the progress of the reaction becomes slow. Therefore, as the lower limit, a concentration meter such as an oligomeric diaryl ester (2) is usually used The amount is 0.3 times the mass, preferably 0.5 times the mass, and more preferably 1 time.

於利用再結晶或再沈澱等精製法進行精製時,亦可利用根據溫度之溶解度差而僅以良溶劑進行晶析,但為了提高回收率,較佳為使用不良溶劑。關於可使用之不良溶劑之具體例,作為環狀式脂肪族烴,可列舉環戊烷、環己烷、環庚烷、環辛烷等單環狀式脂肪族烴;作為其衍生物之甲基環戊烷、乙基環戊烷、甲基環己烷、乙基環己烷、1,2-二甲基環己烷、1,3-二甲基環己烷、1,4-二甲基環己烷、異丙基環己烷、正丙基環己烷、第三丁基環己烷、正丁基環己烷、異丁基環己烷、1,2,4-三甲基環己烷、1,3,5-三甲基環己烷等;十氫萘等多環狀式脂肪族烴;正戊烷、正己烷、正庚烷、正辛烷、異辛烷、正壬烷、正癸烷、正十二烷、正十四烷等非環狀式脂肪族烴,作為醇系溶劑,可列舉甲醇、乙醇、異丙醇、正丁醇、第三丁醇、己醇、辛醇、環己醇等。 When purification is performed by a refining method such as recrystallization or reprecipitation, crystallization can be performed using only a good solvent by using a solubility difference according to temperature, but in order to improve the recovery rate, it is preferable to use a poor solvent. As a specific example of a poor solvent that can be used, examples of the cyclic aliphatic hydrocarbon include monocyclic aliphatic hydrocarbons such as cyclopentane, cyclohexane, cycloheptane, and cyclooctane; Methylcyclopentane, ethylcyclopentane, methylcyclohexane, ethylcyclohexane, 1,2-dimethylcyclohexane, 1,3-dimethylcyclohexane, 1,4-bis Methylcyclohexane, isopropylcyclohexane, n-propylcyclohexane, third butylcyclohexane, n-butylcyclohexane, isobutylcyclohexane, 1,2,4-trimethyl Cyclohexane, 1,3,5-trimethylcyclohexane, etc .; Polycyclic aliphatic hydrocarbons such as decahydronaphthalene; n-pentane, n-hexane, n-heptane, n-octane, isooctane, Non-cyclic aliphatic hydrocarbons such as n-nonane, n-decane, n-dodecane, and n-tetradecane. Examples of the alcohol-based solvent include methanol, ethanol, isopropanol, n-butanol, third butanol, Hexanol, octanol, cyclohexanol, etc.

因可去除高極性之雜質,故作為不良溶劑,較佳為甲醇、乙醇、異丙醇、正丁醇、第三丁醇、己醇、辛醇、環己醇等醇系溶劑,更佳為碳鏈較短之甲醇、乙醇。 Highly polar impurities can be removed. Therefore, as the poor solvent, alcohol solvents such as methanol, ethanol, isopropanol, n-butanol, tertiary butanol, hexanol, octanol, and cyclohexanol are more preferred. Methanol and ethanol with shorter carbon chains.

寡聚茀二芳酯(2)存在穩定形與準穩定形之多晶型。於使用良溶劑,利用溫度之溶解度差而使結晶析出之情形時,以準穩定形析出之結晶有較脆而向穩定形相變化時之微粉化之傾向。經微粉化之結晶有工業上用作樹脂原料時流動性較差,引起添加不良之可能性。另一方面,於將作為良溶劑之甲苯、對二甲苯、鄰二甲苯、間二甲苯、1,3,5-三甲基苯、1,2,4-三甲基苯、1,2,3,4-四氫化萘等芳香族烴、與作為不良溶劑之甲醇、乙醇、異丙醇、正丁醇、第三丁醇、己醇、辛 醇、環己醇等醇系溶劑組合之情形時,可獲得最初穩定形之結晶而不會引起微粉化,故而較佳。 The oligomeric fluorene diaryl esters (2) exist in stable and quasi-stable polymorphs. In the case where a good solvent is used and the crystals are precipitated due to the difference in temperature solubility, the crystals precipitated in a quasi-stable form tend to be brittle and tend to be micronized when changing to a stable form. The micronized crystal may have poor fluidity when used industrially as a resin raw material, which may cause poor addition. On the other hand, toluene, para-xylene, o-xylene, m-xylene, 1,3,5-trimethylbenzene, 1,2,4-trimethylbenzene, 1,2, Aromatic hydrocarbons such as 3,4-tetrahydronaphthalene, and methanol, ethanol, isopropanol, n-butanol, tertiary butanol, hexanol, octanol as poor solvents When an alcohol-based solvent such as an alcohol or cyclohexanol is combined, it is preferable to obtain an initially stable crystal without causing micronization.

於將作為良溶劑之芳香族烴、與作為不良溶劑之醇系溶劑組合之情形時,若醇系溶劑之添加溫度較低,則有於醇系溶劑之添加前準穩定形之結晶析出,其比例增加之傾向。因此,醇系溶劑之添加溫度通常為20℃以上,較佳為30℃以上,更佳為40℃以上,尤佳為50℃以上。 When combining an aromatic hydrocarbon as a good solvent and an alcoholic solvent as a poor solvent, if the temperature of the alcoholic solvent is low, quasi-stable crystals will precipitate before the addition of the alcoholic solvent. Increasing tendency. Therefore, the addition temperature of the alcohol-based solvent is usually 20 ° C or higher, preferably 30 ° C or higher, more preferably 40 ° C or higher, and even more preferably 50 ° C or higher.

關於寡聚茀二芳酯(2)之準穩定形之結晶,若利用粉末X射線繞射測定裝置(XRD)進行分析,則於2θ=5.6°、8.5°、11.0°、12.5°、12.9°、14.9°、16.3°、19.1°(θ=±0.2°)觀察到特徵之波峰。準穩定形之結晶較脆而容易引起相轉移,因此藉由於晶析中繼續攪拌而進行微粉化,從而引起自反應器之抽出不良、或過濾性之變差。又,準穩定形之結晶經不起衝擊,或避免由粉體流動性之降低引起之添加不良,因此較佳為於結晶中不包含該等入射角之波峰。 Regarding the quasi-stable crystals of oligomeric perylene diaryl ester (2), if the powder X-ray diffraction measurement device (XRD) is used for analysis, it will be at 2θ = 5.6 °, 8.5 °, 11.0 °, 12.5 °, 12.9 ° The characteristic peaks were observed at 14.9 °, 16.3 °, 19.1 ° (θ = ± 0.2 °). The quasi-stable crystal is relatively brittle and easily causes phase transfer. Therefore, by continuously stirring during crystallization, micronization is performed, which causes poor extraction from the reactor or deteriorates filterability. In addition, quasi-stable crystals cannot withstand impact or avoid poor addition due to reduced powder fluidity. Therefore, it is preferred that the crystals do not include peaks of these angles of incidence.

若寡聚茀二芳酯(2)之晶析所使用之良溶劑之量過少,則變得難以使寡聚茀二芳酯(2)溶解,精製效率亦降低,因此關於良溶劑之量之下限,相對於寡聚茀二芳酯(2)通常為0.3倍質量量,較佳為0.5倍質量量,更佳為0.7倍質量量,進而更佳為0.9倍質量量。又,若良溶劑之量過多,則寡聚茀二芳酯(2)向濾液之損耗增加,良率降低,因此關於良溶劑之量之上限,相對於寡聚茀二芳酯(2)為通常5倍質量量,較佳為4倍質量量,更佳為3倍質量量,進而更佳為2倍質量量。 If the amount of the good solvent used for crystallization of the oligomeric fluorene diaryl ester (2) is too small, it becomes difficult to dissolve the oligomeric fluorene diaryl ester (2), and the purification efficiency is also reduced. The lower limit is usually 0.3 times the mass, preferably 0.5 times the mass, more preferably 0.7 times the mass, and even more preferably 0.9 times the mass relative to the oligomeric fluorene diaryl ester (2). In addition, if the amount of the good solvent is too large, the loss of the oligomeric fluorene diaryl ester (2) to the filtrate increases, and the yield is reduced. Therefore, the upper limit of the amount of the good solvent is relative to the oligomeric fluorene diaryl ester (2). Usually 5 times the mass, preferably 4 times the mass, more preferably 3 times the mass, and even more preferably 2 times the mass.

若寡聚茀二芳酯(2)之晶析所使用之不良溶劑之量過少,則寡聚茀二芳酯(2)向濾液之損耗增加,而良率降低,關於不良溶劑之量之下限,相對於寡聚茀二芳酯(2)通常為2倍質量量,較佳為3倍質量量,更佳為3.5倍質量量,進而更佳為4倍質量量。又,若不良溶劑之量過多,則精製效率亦降低,而且釜效率降低而生產性降低,因此關 於不良溶劑之量之上限,相對於寡聚茀二芳酯(2)通常為10倍質量量,較佳為9倍質量量,更佳為8倍質量量,進而更佳為7倍質量量。 If the amount of the poor solvent used in the crystallization of the oligomeric arylene diaryl ester (2) is too small, the loss of the oligomeric arylene diaryl ester (2) to the filtrate increases, and the yield is reduced. About the lower limit of the amount of the poor solvent Compared with the oligomeric fluorene diaryl ester (2), it is usually 2 times the mass, preferably 3 times the mass, more preferably 3.5 times the mass, and even more preferably 4 times the mass. In addition, if the amount of the poor solvent is too large, the purification efficiency is also reduced, and the efficiency of the kettle is reduced, and the productivity is reduced. The upper limit of the amount of the poor solvent is usually 10 times the mass, preferably 9 times the mass, more preferably 8 times the mass, and even more preferably 7 times the mass relative to the oligomeric fluorene diaryl ester (2). .

若為了獲得自最初穩定形之結晶而一次性添加大量之不良溶劑,則溶解度急劇降低,而結晶一次性析出,因此結晶之尺寸難以變大。關於寡聚茀二芳酯(2),若向特定之良溶劑添加少量之特定之不良溶劑,則有溶解度提高之傾向。有利用該性質,將特定之不良溶劑分開進行添加、或者斷斷續續地供給特定之不良溶劑,藉由可使結晶尺寸變得更大之傾向。作為特定之良溶劑,較佳為甲苯、對二甲苯、鄰二甲苯、間二甲苯、1,3,5-三甲基苯、1,2,4-三甲基苯、1,2,3,4-四氫化萘等芳香族烴,更佳為工業上廉價且容易取得之甲苯、對二甲苯、鄰二甲苯、間二甲苯。作為特定之不良溶劑,較佳為甲醇、乙醇、異丙醇、正丁醇、第三丁醇、己醇、辛醇、環己醇等醇系溶劑,更佳為工業上廉價且容易取得之異丙醇、甲醇、乙醇。尤佳為作為特定之良溶劑之鄰二甲苯、與作為特定之不良溶劑之甲醇的組合。 If a large amount of a poor solvent is added at one time in order to obtain crystals from the initial stable shape, the solubility is rapidly reduced, and the crystals are precipitated at one time, so it is difficult to increase the size of the crystals. Regarding the oligomeric fluorene diaryl ester (2), if a small amount of a specific poor solvent is added to a specific good solvent, the solubility tends to increase. By using this property, a specific poor solvent is added separately, or a specific poor solvent is intermittently supplied, and the crystal size tends to become larger. As a specific good solvent, toluene, para-xylene, o-xylene, m-xylene, 1,3,5-trimethylbenzene, 1,2,4-trimethylbenzene, 1,2,3 are preferable. Aromatic hydrocarbons such as 1,4-tetrahydronaphthalene are preferably toluene, para-xylene, o-xylene, and m-xylene which are inexpensive and easily available in industry. As the specific poor solvent, alcohol-based solvents such as methanol, ethanol, isopropanol, n-butanol, tertiary butanol, hexanol, octanol, and cyclohexanol are preferred, and industrially inexpensive and easily available Isopropanol, methanol, ethanol. Particularly preferred is a combination of o-xylene as a specific good solvent and methanol as a specific poor solvent.

於將特定之不良溶劑分2次進行添加之情形時,若最初添加之特定之不良溶劑之比例過高,則不良溶劑之影響變強,而未顯現溶解度提高之效果,因此通常為40質量%以下,較佳為30質量%以下,更佳為20質量%以下。另一方面,若最初添加之特定之不良溶劑之比例過低,則未顯現不良溶劑添加效果,因此通常為5質量%以上,較佳為10質量%以上,更佳為15質量%以上。 In the case where a specific poor solvent is added in two times, if the proportion of the specific poor solvent added first is too high, the influence of the poor solvent becomes strong, and the effect of improving solubility is not exhibited. Therefore, it is usually 40% by mass. Hereinafter, it is preferably 30% by mass or less, and more preferably 20% by mass or less. On the other hand, if the proportion of the specific poor solvent added first is too low, the effect of adding a poor solvent is not exhibited, so it is usually 5 mass% or more, preferably 10 mass% or more, and more preferably 15 mass% or more.

於將特定之不良溶劑分2次進行添加之情形時,由於特定之良溶劑與特定之不良溶劑之組合,最佳之添加溫度必須進行調整,於尤佳之鄰二甲苯與甲醇之情形時,若甲醇之添加溫度較低,則有於甲醇之添加前準穩定形之結晶析出,其比例增加之傾向。因此,最初所添加之甲醇之添加溫度通常為45℃以上,較佳為50℃以上,更佳為55℃以上,進而更佳為60℃以上。接下來添加之甲醇之溫度之下限通常為0 ℃以上,較佳為5℃以上,更佳為10℃以上。另一方面,接下來添加之甲醇之溫度之上限通常為42℃以下,較佳為40℃以下,更佳為38℃以下。 In the case of adding a specific poor solvent in two times, due to the combination of the specific good solvent and the specific poor solvent, the optimal addition temperature must be adjusted. In the case of particularly preferred o-xylene and methanol, If the addition temperature of methanol is low, the quasi-stable crystals precipitate before the addition of methanol, and the proportion thereof tends to increase. Therefore, the temperature of the initial addition of methanol is usually 45 ° C or higher, preferably 50 ° C or higher, more preferably 55 ° C or higher, and even more preferably 60 ° C or higher. The lower limit of the temperature of the next methanol to be added is usually 0. Above 5 ° C, preferably above 5 ° C, more preferably above 10 ° C. On the other hand, the upper limit of the temperature of the methanol to be added next is usually 42 ° C or lower, preferably 40 ° C or lower, and more preferably 38 ° C or lower.

寡聚茀二芳酯(2)係根據晶析條件而粒子之粒徑大幅變動。若粒子之粒徑過小,則有如下傾向:於結晶之過濾步驟中變得容易引起濾布之堵塞,而過濾時間變長,或者含液率變高而寡聚茀二芳酯(2)之純度降低。又,有於用作樹脂原料時,粉體流動性變差,而引起添加不良之可能性。因此,關於寡聚茀二芳酯(2)之粒子之平均粒徑之下限,通常為50μm以上,較佳為70μm以上,更佳為90μm以上,進而更佳為130μm以上,尤佳為170μm以上。若寡聚茀二芳酯(2)之粒子之平均粒徑過大,則有用作樹脂原料時,堵塞過濾器之可能性。因此,關於寡聚茀二芳酯(2)之粒子之平均粒徑之上限,通常為2cm以下,較佳為1cm以下,更佳為0.5cm以下,進而更佳為0.3cm以下。 The oligomeric fluorene diaryl ester (2) largely varies in particle size depending on crystallization conditions. If the particle size of the particles is too small, it tends to become easy to cause clogging of the filter cloth during the crystallization filtration step, and the filtration time becomes longer, or the liquid content becomes higher and the oligomeric arylene diaryl ester (2) Reduced purity. In addition, when used as a resin raw material, powder flowability may be deteriorated, which may cause poor addition. Therefore, the lower limit of the average particle size of the particles of the oligomeric fluorene diaryl ester (2) is usually 50 μm or more, preferably 70 μm or more, more preferably 90 μm or more, still more preferably 130 μm or more, and even more preferably 170 μm or more. . If the average particle diameter of the oligomeric fluorene diaryl ester (2) is too large, the filter may be clogged when used as a resin raw material. Therefore, the upper limit of the average particle diameter of the oligomeric fluorene diaryl ester (2) is usually 2 cm or less, preferably 1 cm or less, more preferably 0.5 cm or less, and even more preferably 0.3 cm or less.

寡聚茀二芳酯(2)係根據晶析條件而粒子之粒徑大幅變動。若粒子之粒徑過小,則有如下傾向:於結晶之過濾步驟中變得容易引起濾布之堵塞,而過濾時間變長,或者含液率變高而寡聚茀二芳酯(2)之純度降低。又,有於用作樹脂原料時,粉體流動性變差,而引起添加不良之可能性。因此,關於寡聚茀二芳酯(2)之粒子之粒徑為50μm以上之累積%,通常50μm以上為50%以上,較佳為60%以上,更佳為70%以上,進而更佳為80%以上,尤佳為90%以上。 The oligomeric fluorene diaryl ester (2) largely varies in particle size depending on crystallization conditions. If the particle size of the particles is too small, it tends to become easy to cause clogging of the filter cloth in the crystallization filtration step, and the filtration time becomes longer, or the liquid content becomes higher and the oligomeric diaryl diaryl ester (2) Reduced purity. In addition, when used as a resin raw material, powder flowability may be deteriorated, which may cause poor addition. Therefore, the particle size of the particles of the oligomeric fluorene diaryl ester (2) is 50% or more of the cumulative%, usually 50% or more is 50% or more, preferably 60% or more, more preferably 70% or more, and even more preferably Above 80%, particularly preferably above 90%.

關於藉由晶析而獲得之一次結晶或一次結晶所凝集之凝集物之粒徑,係根據反應器或攪拌翼之形狀、攪拌速度、反應器之材質等各種條件而進行變化。通常若尺度變大,則有剪切力增加而變得容易被粉碎,而粒徑變小之傾向。然而,藉由依據上述之晶析條件,從而即便使用例如1m3以上之反應器,亦可獲得較佳之粒徑之寡聚茀二芳酯(2)。 The particle size of the primary crystals or aggregates aggregated by the primary crystals obtained by crystallization depends on various conditions such as the shape of the reactor or the stirring blade, the stirring speed, and the material of the reactor. Generally, as the scale becomes larger, the shearing force tends to increase and the particles tend to be crushed, and the particle size tends to become smaller. However, according to the crystallization conditions described above, even if a reactor having a size of 1 m 3 or more is used, for example, an oligomeric fluorene diaryl ester (2) having a preferable particle diameter can be obtained.

金屬之含量可藉由反覆晶析操作而減少。此時,有晶析溫度越低,目標之寡聚茀二芳酯(2)之回收量越提高,但金屬之精製效率降低之傾向。 The metal content can be reduced by repeated crystallization operations. At this time, the lower the crystallization temperature, the higher the recovery amount of the target oligomeric diaryl ester (2), but the metal purification efficiency tends to decrease.

於使用作為尤佳之酯交換反應觸媒之Ti化合物作為觸媒之情形時,有寡聚茀二芳酯(2)中之Ti之去除困難而Ti之殘留成為問題之情形。於上述情形時,較佳為向反應結束後之反應液、或使暫時單離之寡聚茀二芳酯(2)再次溶解於上述之溶劑中而成之溶液添加水,使Ti化合物去活化而向不溶性之鈦殘渣轉化後,於過濾步驟中將鈦殘渣去除。此時,於向反應結束後之反應液添加水之情形時,所精製之鈦殘渣量較多,而對過濾步驟施加較大負荷,因此有過濾性變差之傾向。因此,較佳為暫時向反應結束液添加不良溶劑,將大部分之Ti化合物去除後,使所單離之寡聚茀二芳酯(2)再溶解,利用水去活化後而進行過濾步驟。 In the case where a Ti compound, which is a particularly good transesterification catalyst, is used as the catalyst, there is a case where the removal of Ti in the oligomeric diaryl ester (2) is difficult and the residue of Ti becomes a problem. In the above case, it is preferred to add water to the reaction solution after the reaction or the solution obtained by dissolving the temporarily isolated oligomeric fluorene diaryl ester (2) in the above-mentioned solvent to deactivate the Ti compound. After converting to insoluble titanium residue, the titanium residue is removed in a filtration step. At this time, when water is added to the reaction liquid after the reaction is completed, the amount of the refined titanium residue is large, and a large load is applied to the filtration step. Therefore, the filterability tends to deteriorate. Therefore, it is preferred to temporarily add a poor solvent to the reaction completion liquid, remove most of the Ti compounds, and then re-dissolve the oligomeric arylene diaryl ester (2) that has been isolated, and then perform the filtration step after deactivation with water.

鈦殘渣之粒徑非常細小,若孔徑較大,則有未除盡鈦殘渣而混入製品中之虞。因此,過濾步驟所使用之濾材之孔徑通常為10μm以下,較佳為5μm以下,更佳為1μm以下。另一方面,若濾材之孔徑過小,則有過濾速度降低而導致步驟時間之延遲之虞。因此,作為過濾步驟所使用之濾材之孔徑,通常為0.01μm以上,較佳為0.05μm以上,更佳為0.1μm以上。又,若過濾步驟所使用之濾材之過濾面為平面,則鈦殘渣於過濾面堆積而使過濾面阻塞,因此為了縮短過濾時間,而必須過剩之過濾面積。另一方面,若過濾步驟所使用之濾材之形狀為如過濾器袋之將底面密封之筒狀形狀,則鈦殘渣於底面堆積,而自側面亦可過濾,因此可減少阻塞之危險,故而較佳。又,關於過濾步驟所使用之濾材之材質,就廉價且工業上容易取得之觀點而言,較佳為聚丙烯製、棉製及聚酯製,就耐熱性較高之觀點而言,較佳為聚酯製、棉製及鐵氟龍製,更佳為廉價且耐熱性亦較高之棉製及聚酯 製之濾材。作為過濾步驟,可列舉:抽氣過濾、離心機過濾、加壓過濾。其中,加壓過濾之過濾速度較快,故而較佳。關於加壓過濾之壓力,為了提高過濾速度,通常為0.11MPa以上,較佳為0.15MPa以上,更佳為0.20MPa以上。關於加壓過濾之上限值,雖取決於設備,但為了避免對設備造成較大之負荷,通常為5.0MPa以下,較佳為3.0MPa以下,更佳為1.0MPa以下。 The particle size of the titanium residue is very small. If the pore size is large, the titanium residue may be mixed into the product without removing the titanium residue. Therefore, the pore diameter of the filter material used in the filtration step is usually 10 μm or less, preferably 5 μm or less, and more preferably 1 μm or less. On the other hand, if the pore diameter of the filter material is too small, there is a possibility that the filtration speed is reduced and the step time may be delayed. Therefore, the pore diameter of the filter material used in the filtration step is usually 0.01 μm or more, preferably 0.05 μm or more, and more preferably 0.1 μm or more. In addition, if the filter surface of the filter material used in the filtration step is flat, titanium residue accumulates on the filter surface and blocks the filter surface. Therefore, in order to shorten the filtration time, an excessive filtration area is required. On the other hand, if the shape of the filter material used in the filtering step is a cylindrical shape that seals the bottom surface of the filter bag, the titanium residue is accumulated on the bottom surface and can be filtered from the side, so the risk of clogging can be reduced. good. The material of the filter material used in the filtration step is preferably made of polypropylene, cotton, and polyester from the viewpoint of being inexpensive and easily available industrially, and more preferably from the viewpoint of higher heat resistance. Made of polyester, cotton and Teflon, more preferably cheap cotton and polyester with high heat resistance Made of filter media. Examples of the filtration steps include suction filtration, centrifuge filtration, and pressure filtration. Among them, the filtration speed of the pressure filtration is fast, so it is preferable. Regarding the pressure of the pressure filtration, in order to increase the filtration speed, it is usually 0.11 MPa or more, preferably 0.15 MPa or more, and more preferably 0.20 MPa or more. Although the upper limit of the pressure filtration depends on the equipment, it is usually 5.0 MPa or less, preferably 3.0 MPa or less, and more preferably 1.0 MPa or less in order to avoid causing a large load on the equipment.

過濾步驟中,亦可使用過濾助劑。作為過濾助劑,可列舉:矽藻土、粉末纖維素、硫酸鎂、硫酸鈉、矽膠、活性氧化鋁、活性碳、活性白土、波來鐵、玻璃纖維、玻璃珠等。 In the filtration step, a filtering aid may also be used. Examples of the filtering aids include diatomaceous earth, powdered cellulose, magnesium sulfate, sodium sulfate, silica gel, activated alumina, activated carbon, activated clay, pole iron, glass fiber, and glass beads.

該等中,較佳為過濾面積較大,吸附之損耗較少之矽藻土、粉末纖維素、波來鐵。 Among these, diatomaceous earth, powdered cellulose, and puleoirite having a larger filtration area and less adsorption loss are preferred.

<2寡聚茀二酯B> <2 oligomeric diester B>

本發明之寡聚茀二酯(以下,有略記為「寡聚茀二酯B」之情形)包含可具有取代基之2個以上之茀單元,該茀單元之9位之碳原子彼此直接鍵結、或者經由可具有取代基之伸烷基、可具有取代基之伸芳基、或可具有取代基之伸芳烷基而鏈狀地鍵結,且羧酸之含有比例為5質量%以下。 The oligomeric fluorene diester of the present invention (hereinafter referred to as "oligomeric fluorene diester B") includes two or more fluorene units which may have a substituent, and the carbon atoms at the 9-position of the fluorene unit are directly bonded to each other. Or a chain via an alkylene group which may have a substituent, an alkylene group which may have a substituent, or an alkylene group which may have a substituent, and the content ratio of the carboxylic acid is 5% by mass or less .

作為伸烷基、伸芳基、伸芳烷基,可較佳地採用<1.1伸烷基、伸芳基、伸芳烷基>中所例示者。 As the alkylene, alkylene, and alkylene, those exemplified in <1.1 alkylene, alkylene, and alkylene> can be preferably used.

同樣地,作為茀單元,可較佳地採用<1.2茀單元可具有之取代基>中所例示者。 Similarly, as the fluorene unit, those exemplified in <1.2 substituents which a fluorene unit may have> can be preferably used.

本發明之寡聚茀二酯B可設為如下者,即使取代基α1及α2分別鍵結於位置於兩末端之茀單元之9位之碳原子,且於該取代基α1及α2鍵結有酯基。於該情形時,α1與α2可相同亦可不同。又,取代基α1及α2亦可包含直接鍵,即酯基直接鍵結於茀單元之9位之碳原子。 The oligomeric fluorene diester B of the present invention can be set as follows, even if the substituents α 1 and α 2 are respectively bonded to the carbon atom at the 9th position of the fluorene unit at both ends, and the substituents α 1 and α 2 is bonded to an ester group. In this case, α 1 and α 2 may be the same or different. The substituents α 1 and α 2 may also include a direct bond, that is, an ester group is directly bonded to a carbon atom at the 9-position of the fluorene unit.

作為酯基,可較佳地採用上述之《發明2》之<1.3酯基>中所 例示者。尤其是就有對水解之耐性變高之傾向之方面而言,上述酯基較佳為直鏈狀之烷基,更佳為甲基或乙基。 As the ester group, the <1.3 ester group> in the above-mentioned "Invention 2" can be preferably used. Instantiator. In particular, the ester group is preferably a linear alkyl group, and more preferably a methyl group or an ethyl group, in terms of a tendency to increase resistance to hydrolysis.

作為取代基α1及α2,可較佳地採用上述之《發明2》之<1.4取代基α1及α2>中所例示者。 As the substituents α 1 and α 2 , those exemplified in <1.4 Substituents α 1 and α 2 > of the aforementioned “Invention 2” can be preferably used.

又,作為寡聚茀二酯B之具體結構,可較佳地採用上述通式(1)所表示者。又,作為具體例,可列舉上述[H]群所示之結構。 As a specific structure of the oligomeric fluorene diester B, those represented by the general formula (1) can be preferably used. Moreover, as a specific example, the structure shown by the said [H] group is mentioned.

<2.1寡聚茀二酯B之物性> <2.1 Physical properties of oligomeric diester B>

如上所述,本發明之寡聚茀二酯之羧酸之含有比例為10質量%以下。藉由如上述般將羧酸之含量設為特定範圍,而有於以該寡聚茀二酯為原料而製造二芳酯之情形時,可將該二芳酯所包含之金屬量減少至特定範圍之傾向。 As described above, the content ratio of the carboxylic acid of the oligomeric fluorene diester of the present invention is 10% by mass or less. By setting the content of the carboxylic acid to a specific range as described above, when the diaryl ester is produced using the oligomeric fluorene diester as a raw material, the amount of metal contained in the diaryl ester can be reduced to a specific value. The tendency of the scope.

關於上述羧酸之含量,就減少二芳酯所包含之金屬量之觀點而言,較佳為8質量%以下,更佳為5質量%以下,進而較佳為4質量%以下,進而更佳為3質量%以下,尤佳為2質量%以下,最佳為1質量%以下。又,羧酸含量越少越佳,但若要設為0質量%,則有為了雜質混入之防止等而伴隨著明顯之成本上升或生產效率之降低之虞。可達到維持生產性之羧酸之含量通常為0.1質量%以上。 The content of the carboxylic acid is preferably 8% by mass or less, more preferably 5% by mass or less, still more preferably 4% by mass or less, from the viewpoint of reducing the amount of metal contained in the diaryl ester. It is 3% by mass or less, particularly preferably 2% by mass or less, and most preferably 1% by mass or less. In addition, the smaller the carboxylic acid content, the better. However, if it is set to 0% by mass, there is a concern that there is a significant increase in cost or a decrease in production efficiency for the purpose of preventing the inclusion of impurities. The content of the carboxylic acid capable of maintaining productivity is usually 0.1% by mass or more.

可認為上述羧酸係於寡聚茀二酯製造時藉由水解而副產生。關於上述羧酸之種類,並無特別限定,例如可列舉:寡聚茀單酯單羧酸(寡聚茀二酯中,將任意一個酯基取代為羧酸者)、寡聚茀二羧酸(寡聚茀二酯中,將2個酯基取代為羧酸者)。 It is considered that the carboxylic acid is by-produced by hydrolysis during the production of an oligomeric fluorene diester. The type of the carboxylic acid is not particularly limited, and examples thereof include oligomeric fluorene monoester monocarboxylic acid (in which an ester group is substituted with a carboxylic acid in an oligomeric fluorene diester), and oligomeric fluorene dicarboxylic acid (In the oligomeric fluorene diester, two ester groups are substituted with a carboxylic acid).

作為羧酸之含量之測定法,例如可列舉:利用高效液相層析法對單離之羧酸進行定量之方法。 Examples of a method for measuring the content of a carboxylic acid include a method of quantifying an isolated carboxylic acid by high performance liquid chromatography.

作為使羧酸量為上述範圍之方法,例如可列舉:通常之精製法,例如利用鹼水之水洗操作、再結晶、再沈澱、萃取精製、過濾器過濾等過濾操作、管柱層析法等。又,於二層系之反應下製造本發明 之寡聚茀二酯B之情形時,重要的是藉由反應溫度之低溫化、反應時間之縮短等而抑制水解反應。 Examples of the method for adjusting the amount of carboxylic acid to the above range include ordinary purification methods such as filtration operations such as washing with alkaline water, recrystallization, reprecipitation, extraction purification, filter filtration, and column chromatography. . In addition, the present invention is produced by a two-layer reaction. In the case of oligomeric fluorene diester B, it is important to suppress the hydrolysis reaction by lowering the reaction temperature and shortening the reaction time.

又,本發明之寡聚茀二酯B之其他物性值並無特別限定,較佳為滿足上述《發明3》之<1.6具有1個反應性官能基之寡聚茀A1之物性>之項所例示之物性值。 In addition, other physical property values of the oligomeric fluorene diester B of the present invention are not particularly limited, and it is preferable to satisfy the item <1.6 Physical properties of the oligomeric fluorene A1 having one reactive functional group> of the above-mentioned "Invention 3" Exemplified physical property values.

<2.2寡聚茀二酯B之製造方法> <2.2 Production method of oligomeric fluorene diester B>

關於本發明之寡聚茀B之製造方法,並無特別限定,例如可利用與<1.3.4寡聚茀二酯(1)之製造方法>所記載之方法相同之方法進行製造。 The manufacturing method of the oligomeric fluorene B of this invention is not specifically limited, For example, it can manufacture by the method similar to the method described in <1.3.4 Manufacturing method of an oligomeric fluorene diester (1)>.

實施例 Examples

以下,藉由實施例、及比較例而對本發明進一步詳細地進行說明,本發明只要不超出其主旨,則不受以下之實施例限定。 Hereinafter, the present invention will be described in more detail with reference to examples and comparative examples. The present invention is not limited to the following examples as long as it does not exceed the gist thereof.

《實施例1-1~1-6、比較例1-1~1-17》 << Examples 1-1 ~ 1-6, Comparative Examples 1-1 ~ 1-17 >>

本發明之寡聚茀單體之品質評估、及樹脂與透明膜之特性評估係藉由下述之方法進行。再者,特性評估方法並不限定於以下之方法,業者可適當進行選擇。 The quality evaluation of the oligomeric fluorene monomer and the characteristics evaluation of the resin and the transparent film of the present invention were performed by the following methods. In addition, the characteristic evaluation method is not limited to the following methods, and the operator can select appropriately.

<單體及樹脂之評估> <Evaluation of monomers and resins>

(1)茀系單體中之鋁、鈉含有率 (1) Aluminum and sodium content in actinide monomers

包含茀環之單體(以下,有稱為茀系單體之情況)中之鋁、鈉含有率係如下述般進行測定。對分析試樣進行濕式分解處理後,使用ICP-AES(HORIBA Jobin Yvon公司製造之ULTIMA 2C)而進行鋁含有率及鈉含有率之定量。又,關於鈉含有率,根據分析試樣,亦併用利用原子吸光法(VARIAN製造之Spectr AA-220P)之分析。 The aluminum and sodium content ratios in the monomer containing a fluorene ring (hereinafter, may be referred to as a fluorene-based monomer) were measured as follows. After the analysis sample was subjected to a wet decomposition treatment, ICP-AES (ULTIMA 2C manufactured by HORIBA Jobin Yvon) was used to quantify the aluminum content rate and the sodium content rate. The sodium content rate was also analyzed by an atomic absorption method (Spectr AA-220P manufactured by VARIAN) based on the analysis sample.

(2)茀系單體中之氯含有率 (2) Chlorine content in actinide monomers

茀系單體中之氯含有率係如下述般進行測定。使用三菱化學(股)製造之燃燒裝置AQF-2100M而使分析試樣燃燒,使純水吸收所產生 之氣體。其後,將吸收有氣體之純水導入日本Dionex(股)製造之離子層析儀DX-500,進行氯含有率之定量。 The chlorine content rate in the actinic monomer was measured as follows. The combustion device AQF-2100M manufactured by Mitsubishi Chemical Corporation is used to burn the analysis sample and absorb pure water. Of gas. Thereafter, the pure water having absorbed the gas was introduced into an ion chromatograph DX-500 manufactured by Japan Dionex Co., Ltd., and the chlorine content was quantified.

(3)茀系單體之熱分解溫度 (3) Thermal decomposition temperature of actinide monomer

茀系單體之玻璃轉移溫度係使用SII NanoTechnology公司製造之示差熱-熱重量同步分析裝置TG-DTA6300而進行測定。將約4mg之茀系單體放入同公司製造之鋁鍋並進行密封,於200mL/min之氮氣流下,以升溫速度10℃/min自室溫(20~30℃)升溫至600℃。根據所獲得之TG資料(熱重量資料),將試樣重量減少了5wt%之溫度設為5wt%重量減少溫度。關於含有溶劑之單體,自測定開始時之重量減少由1H-NMR估算之溶劑重量後,將重量變化消失之時間點之重量設為初期重量,將該初期重量減少了5wt%之溫度設為5wt%重量減少溫度。又,根據所獲得之TG資料(熱重量資料),將未發現重量之減少,且觀察到陡峭之吸熱波峰之該峰頂設為試樣之熔點。 The glass transition temperature of the actinic monomer was measured using a differential thermal-thermogravimetric analyzer TG-DTA6300 manufactured by SII NanoTechnology. About 4 mg of stilbene-based monomer was placed in an aluminum pan manufactured by the same company and sealed. Under a nitrogen flow of 200 mL / min, the temperature was raised from room temperature (20 to 30 ° C) to 600 ° C at a heating rate of 10 ° C / min. According to the obtained TG data (thermogravimetric data), the temperature at which the sample weight was reduced by 5 wt% was set to the 5 wt% weight reduction temperature. Regarding the monomer containing a solvent, the weight of the solvent estimated from 1 H-NMR was reduced from the weight at the start of the measurement, and the weight at the time point when the weight change disappeared was set as the initial weight. Reduce the temperature by 5 wt%. In addition, based on the obtained TG data (thermogravimetric data), the peak top of which no decrease in weight was observed and a steep endothermic peak was observed was set as the melting point of the sample.

(4)茀系單體於紫外可見區域(UV-Vis)中之吸收最大波長 (4) Absorption maximum wavelength of actinide monomer in ultraviolet-visible region (UV-Vis)

茀系單體於紫外可見區域(UV-Vis:280~800nm)中之吸收最大波長係使用島津製作所(股)製造之紫外可見吸收分光光度計UV-1650PC而進行測定。測定溶液係使用四氫呋喃作為溶劑,以茀環計濃度成為10μM之方式精密地進行製備。測定單元係使用1cm見方之石英單元,並於溫度23±5℃之環境下進行測定。於280~800nm之範圍內對測定溶液之吸收光譜進行測定,將吸收之最大值設為吸收最大波長(λmax)。 The absorption maximum wavelength of the actinide monomer in the ultraviolet-visible region (UV-Vis: 280 to 800 nm) was measured using an ultraviolet-visible absorption spectrophotometer UV-1650PC manufactured by Shimadzu Corporation. The measurement solution was prepared precisely using tetrahydrofuran as a solvent so that the concentration of the pyrene ring became 10 μM. The measurement unit is a 1 cm square quartz unit, and the measurement is performed in an environment with a temperature of 23 ± 5 ° C. The absorption spectrum of the measurement solution was measured in the range of 280 to 800 nm, and the maximum absorption was set as the absorption maximum wavelength (λ max ).

(5)樹脂之還原黏度 (5) Resin viscosity of resin

使上述樹脂溶解於二氯甲烷,而製備0.6g/dL之濃度之樹脂溶液。使用森友理化工業公司製造之烏式型黏度管,於溫度20.0℃±0.1℃下進行測定,對溶劑之通過時間t0及溶液之通過時間t進行測定。使用所獲得之t0及t之值,藉由下式(I)而求出相對黏度ηrel,進而使用所 獲得之相對黏度ηrel,藉由下式(ii)而求出比黏度ηspThe resin was dissolved in dichloromethane to prepare a resin solution having a concentration of 0.6 g / dL. Using a U-shaped viscosity tube manufactured by Morito Rika Chemical Industries, the temperature was measured at 20.0 ° C ± 0.1 ° C, and the passage time t 0 of the solvent and the passage time t of the solution were measured. Using the obtained values of t 0 and t, the relative viscosity η rel is obtained by the following formula (I), and the specific viscosity η sp is obtained by the following formula (ii) using the obtained relative viscosity η rel . .

ηrel=t/t0…(I) η rel = t / t 0 … (I)

ηsp=(η-η0)/η0rel-1…(ii) η sp = (η-η 0 ) / η 0 = η rel -1 ... (ii)

其後,用所獲得之比黏度ηsp除以濃度c(g/dL),而求出還原黏度ηsp/c。該值越高,分子量越大。 Thereafter, the obtained specific viscosity ηs p is divided by the concentration c (g / dL) to obtain the reduced viscosity η sp / c. The higher the value, the larger the molecular weight.

(6)樹脂之熔融黏度 (6) Melt viscosity of resin

使顆粒物狀之樹脂於90℃下真空乾燥5小時以上。使用乾燥之顆粒物,利用東洋精機(股)製造之毛細管流變儀進行測定。測定溫度係設為240℃,於剪切速度9.12~1824sec-1間對熔融黏度進行測定,使用91.2sec-1下之熔融黏度之值。再者,阻尼孔係使用模具徑為 1mm、長度為10mm者。 The particulate resin was dried under vacuum at 90 ° C for more than 5 hours. The dried particles were used for measurement using a capillary rheometer manufactured by Toyo Seiki Co., Ltd. Measuring a temperature of 240 deg.] C is set, at a shear rate of the melt viscosity was measured between 9.12 ~ 1824sec -1, the value of the melt viscosity under the 91.2sec -1. Furthermore, the damping hole system uses a mold diameter of 1mm, length is 10mm.

(7)樹脂之玻璃轉移溫度(Tg) (7) Glass transition temperature (Tg) of resin

上述樹脂之玻璃轉移溫度係使用SII NanoTechnology公司製造之示差掃描熱量計DSC 6220而進行測定。將約10mg之樹脂放入同公司製造之鋁鍋並進行密封,於50mL/min之氮氣流下,以升溫速度20℃/min自30℃升溫至250℃。保持溫度3分鐘後,以20℃/min之速度冷卻至30℃。於30℃下保持3分鐘,再次以20℃/min之速度升溫至200℃。根據第2次之升溫中所獲得之DSC資料,而求出外推玻璃轉移起始溫度,即將低溫側之基準線延長至高溫側之直線、與於玻璃轉移之階段狀變化部分之曲線之斜率成為最大之點所劃之切線的交點之溫度,將其設為玻璃轉移溫度。將該玻璃轉移溫度為125℃以上者評估為耐熱性優異者。 The glass transition temperature of the resin was measured using a differential scanning calorimeter DSC 6220 manufactured by SII NanoTechnology. About 10 mg of the resin was put into an aluminum pan manufactured by the same company and sealed, and the temperature was raised from 30 ° C to 250 ° C at a temperature increase rate of 20 ° C / min under a nitrogen flow of 50mL / min. After holding the temperature for 3 minutes, it was cooled to 30 ° C at a rate of 20 ° C / min. The temperature was maintained at 30 ° C for 3 minutes, and the temperature was again raised to 200 ° C at a rate of 20 ° C / min. Based on the DSC data obtained during the second temperature increase, the extrapolated glass transition starting temperature is calculated, that is, the slope of the curve extending from the low-temperature side reference line to the high-temperature side and the curve of the step-shaped change in the glass transition The temperature at the intersection of the tangent line drawn by the maximum point was set as the glass transition temperature. Those having a glass transition temperature of 125 ° C. or higher were evaluated as those having excellent heat resistance.

<未延伸膜之評估> <Evaluation of unstretched film>

(8)膜之成形 (8) Film formation

未延伸膜係藉由以下之2種方法而進行製作。 The unstretched film is produced by the following two methods.

於下述之實施例1-1、及比較例1-1~1-12中,藉由以下之程序而 進行加壓成形以製作未延伸膜。針對於90℃下真空乾燥了5小時以上之樹脂之顆粒物約4g,使用長14cm、寬14cm、厚度0.1mm之間隔片,於試樣之上下覆蓋聚醯亞胺膜,於溫度200~230℃下預熱3分鐘,於壓力40MPa之條件下加壓5分鐘後,連同間隔片取出,進行冷卻而製作膜。於該方法中,無法將膜之厚度精度設為5%以下。再者,於本說明書中,厚度精度係利用下述式進行計算。即,厚度精度係表示對膜之各位置之厚度進行測量,變動範圍之最大值或最小值與設定值之差相對於平均值之比率。 In the following Examples 1-1 and Comparative Examples 1-1 to 1-12, the following procedures were used Press forming is performed to produce an unstretched film. About 4g of resin particles dried under vacuum for more than 5 hours at 90 ℃, using spacers with a length of 14cm, a width of 14cm, and a thickness of 0.1mm, covering the sample with a polyimide film, at a temperature of 200 ~ 230 ℃ Preheat for 3 minutes, press for 5 minutes under the condition of pressure of 40 MPa, take out the spacer together with the separator, and cool it to make a film. In this method, the thickness accuracy of the film cannot be set to 5% or less. In addition, in this specification, thickness accuracy is calculated using the following formula. That is, the thickness accuracy refers to the ratio of the difference between the maximum value or minimum value of the fluctuation range and the set value to the average value when the thickness of each position of the film is measured.

厚度精度[%]=|厚度之最大值或最小值-設定值|/平均值×100 Thickness accuracy [%] = | Maximum or minimum thickness-Set value | / Average × 100

又,於下述之實施例1-2~1-6、及比較例1-13~1-17中,藉由熔融擠出法而製作長條之未延伸膜。熔融擠出法係如下述般進行。使用ISUZU化工機(股)製造之單軸擠出機(螺桿徑25mm,缸體設定溫度:220℃~240℃),將於90℃下真空乾燥了5小時以上之樹脂之顆粒物自T型模頭(寬度200mm,設定溫度:200~240℃)擠出。藉由冷卻輥(設定溫度:120~150℃)將所擠出之膜進行冷卻並且利用捲取機製成輥狀,而製作長條未延伸膜。又,於上述之方法中,可藉由調整T型模頭之開幅或冷卻輥之溫度、T型模頭與冷卻輥之距離等而實現5%以下之膜之厚度精度。 In addition, in the following Examples 1-2 to 1-6 and Comparative Examples 1-13 to 1-17, a long unstretched film was produced by a melt extrusion method. The melt extrusion method is performed as follows. Using a uniaxial extruder (screw diameter 25mm, cylinder set temperature: 220 ° C ~ 240 ° C) manufactured by ISUZU Chemical Machinery Co., Ltd., the resin particles will be vacuum dried at 90 ° C for more than 5 hours from the T-die Head (width 200mm, set temperature: 200 ~ 240 ° C) extrusion. The extruded film was cooled by a cooling roll (setting temperature: 120 to 150 ° C.) and formed into a roll shape by a winding machine to produce a long unstretched film. Moreover, in the above method, the thickness accuracy of the film below 5% can be achieved by adjusting the opening width of the T-die or the temperature of the cooling roll, the distance between the T-die and the cooling roll, and the like.

(9)折射率之測定 (9) Measurement of refractive index

自藉由上述之熱壓法或熔融擠出法而製作之未延伸膜切下長40mm、寬8mm之長方形的試片而製成測定試樣。使用589nm(D線)之干涉濾光器,藉由Atago(股)製造之多波長阿貝折射率計DR-M4/1550而對折射率nD進行測定。測定係使用單溴萘作為界面液,並於20℃下進行。 A rectangular test piece having a length of 40 mm and a width of 8 mm was cut from the unstretched film produced by the above-mentioned hot pressing method or melt extrusion method to prepare a measurement sample. Using an interference filter of 589 nm (D line), the refractive index n D was measured by a multi-wavelength Abbe refractometer DR-M4 / 1550 manufactured by Atago. The measurement was performed at 20 ° C using monobromonaphthalene as the interface liquid.

(10)全光線透過率之測定 (10) Measurement of total light transmittance

藉由上述之熔融擠出法而製作膜厚約100μm之未延伸膜,使用 日本電色工業(股)製造之濁度計COH400對全光線透過率進行測定。 An unstretched film having a film thickness of about 100 μm is prepared by the above-mentioned melt extrusion method, and used The turbidimeter COH400 manufactured by Nippon Denshoku Industries Co., Ltd. measures total light transmittance.

(11)光彈性係數 (11) Photoelastic coefficient

使用組合由He-Ne雷射、偏光元件、補償板、析光元件、光檢測器所成之雙折射測定裝置與振動型黏彈性測定裝置(Rheology公司製造之DVE-3)而成之裝置進行測定。(詳細內容係參照日本流變學會志Vol.19,p93-97(1991))。 A device combining a birefringence measuring device made of a He-Ne laser, a polarizing element, a compensation plate, a light analyzing element, and a light detector and a vibration-type viscoelasticity measuring device (DVE-3 manufactured by Rheology) Determination. (For details, refer to the Journal of the Rheological Society of Japan Vol.19, p93-97 (1991)).

自藉由上述任一種之方法而製作之未延伸膜切下寬5mm、長20mm之試樣,固定於黏彈性測定裝置,於25℃之室溫下,於頻率96Hz下對儲存彈性模數E'進行測定。同時,使出射之雷射光依序通過偏光元件、試樣、補償板、析光元件,利用光檢測器(光電二極體)進行拾取,通過鎖相放大器,針對角頻率ω或2ω之波形,求出相對於其振幅與變形之相位差,而求出應變光學係數O'。此時,偏光元件與析光元件之方向係正交,又以各自與試樣之伸長方向成π/4之角度之方式進行調整。光彈性係數C係使用儲存彈性模數E'與應變光學係數O',自下式求出。 From the unstretched film produced by any of the methods described above, a 5 mm wide and 20 mm long sample was cut and fixed to a viscoelasticity measuring device. At room temperature of 25 ° C, the modulus of storage elasticity E was measured at a frequency of 96 Hz. 'Perform the measurement. At the same time, the emitted laser light is sequentially passed through the polarizing element, the sample, the compensation plate, and the light analyzing element, and is picked up by a photodetector (photodiode), and the waveform of the angular frequency ω or 2ω is obtained through a lock-in amplifier The phase difference with respect to the amplitude and the distortion is obtained, and the strain optical coefficient O ′ is obtained. At this time, the directions of the polarizing element and the light analyzing element are orthogonal, and they are adjusted so that they each form an angle of π / 4 with the direction of elongation of the sample. The photoelastic coefficient C is obtained from the following formula using a storage elastic modulus E 'and a strain optical coefficient O'.

C=O'/E' C = O '/ E'

將該光彈性係數為20以下者評估為光彈性特性優異者。 Those with this photoelastic coefficient of 20 or less were evaluated as those with excellent photoelastic characteristics.

(12)彈性模數 (12) Elastic modulus

自利用上述之方法所取得之膜切下寬度5mm、長度50mm之長方形之試片,對儲存彈性模數(E')與損失彈性模數(E")進行測定。測定係使用TA Instruments公司製造之流變計RSA-III,於拉伸模式下,於夾頭間距離20mm、升溫速度3℃/min、頻率1Hz、變形0.1%之條件下,溫度係自0℃升溫至各樣品之玻璃轉移溫度以上,進行測定直至樣品斷裂停止。本發明中之儲存彈性模數係使用30℃下之儲存彈性模數。 A rectangular test piece having a width of 5 mm and a length of 50 mm was cut from the film obtained by the above method, and the storage elastic modulus (E ') and the loss elastic modulus (E ") were measured. The measurement was made by TA Instruments. The rheometer RSA-III, in tensile mode, under the conditions of a distance of 20mm between chucks, a heating rate of 3 ° C / min, a frequency of 1Hz, and a deformation of 0.1%, the temperature is from 0 ° C to the glass transition of each sample Above the temperature, the measurement is performed until the sample breaks. The storage elastic modulus in the present invention uses a storage elastic modulus at 30 ° C.

(13)吸水率 (13) Water absorption

藉由上述任一種方法而製作厚度100~300μm之未延伸膜,切下長100mm、寬100mm之正方形而製作試樣。使用該試樣,依據JIS K7209所記載之「塑膠之吸水率及沸騰吸水率試驗方法」而對吸水率進行測定。 An unstretched film having a thickness of 100 to 300 μm was prepared by any of the methods described above, and a square having a length of 100 mm and a width of 100 mm was cut to prepare a sample. Using this sample, the water absorption was measured in accordance with the "Test method for water absorption and boiling water absorption of plastics" described in JIS K7209.

(14)膜之韌性(彎曲試驗) (14) Toughness of the film (bending test)

藉由上述任一種方法而製作厚度100~200μm之未延伸膜,自該膜製作長度40mm、寬度10mm之長方形之試片。將老虎鉗之左右之接合面之間隔打開為40mm,將試片之兩端固定於接合面內。繼而使左右之接合面之間隔以2mm/秒以下之速度變窄,一面不使膜伸出老虎鉗之接合面外,一面將彎折成大致U字狀之膜整體於該接合面內進行壓縮。將接合面間完全密接前試片於彎曲部斷裂成2片(或3片以上之破片)之情形設為「有斷裂」,將即便接合面間完全密接,試片亦未斷裂而彎曲之情形設為「未斷裂」。針對同一種類之膜,實施試驗並反覆5次,其中將4次以上成為「有斷裂」者設為「×:脆性破壞」,將3次以下成為「有斷裂」者設為「○:未脆性破壞」,將未脆性破壞者評估為韌性優異者。 An unstretched film having a thickness of 100 to 200 μm is produced by any of the methods described above, and a rectangular test piece having a length of 40 mm and a width of 10 mm is produced from the film. The interval between the left and right joint surfaces of the vise was opened to 40 mm, and both ends of the test piece were fixed in the joint surface. Then, the interval between the left and right joining surfaces is narrowed at a speed of 2 mm / sec or less. While the film does not protrude from the joining surface of the vise, the entire film bent into a substantially U-shape is compressed within the joining surface. The case where the test piece was fractured into two pieces (or three or more pieces) at the bending portion before the full contact between the joint surfaces was set as "fractured", and the case where the test piece was not broken and was bent even if the joint surfaces were completely tightly connected. Set to "Unbroken". For the same kind of film, the test was performed and repeated 5 times. Among them, those with “breaking” 4 or more times were marked as “×: brittle fracture”, and those with “breaking” less than 3 times were “○: not brittle”. "Break", and the non-brittle failure was evaluated as the one with excellent toughness.

<相位差膜之評估> <Evaluation of retardation film>

(15)膜之延伸 (15) Extension of the film

依據上述之未延伸膜之製作方法,藉由以下之2種方法而製作相位差膜。 According to the above-mentioned method for producing an unstretched film, a retardation film is produced by the following two methods.

針對藉由熱壓法而製作之未延伸膜,藉由下述方法而進行延伸。自未延伸膜切下寬度50mm、長度125mm之膜片,使用批次式雙軸延伸裝置(Island industry公司製造之雙軸延伸裝置BIX-277-AL),以樹脂之玻璃轉移溫度+15℃之延伸溫度、300%/min之延伸速度及1.5倍之延伸倍率進行上述膜片之自由端單軸延伸而獲得延伸膜。 The unstretched film produced by the hot pressing method was stretched by the following method. Cut the film with a width of 50mm and a length of 125mm from the unstretched film. Use a batch-type biaxial stretching device (biaxial stretching device BIX-277-AL manufactured by Island industry), and use the glass transition temperature of resin + 15 ° C. The stretching temperature, the stretching speed of 300% / min, and the stretching ratio of 1.5 times were performed for uniaxial stretching of the free end of the above-mentioned film to obtain an extended film.

針對藉由熔融擠出法而製作之未延伸膜,設為300%/min之延伸 速度、2倍之延伸倍率,於樹脂之玻璃轉移溫度+10℃之延伸溫度下進行延伸,未斷裂而獲得延伸膜後,使延伸溫度1℃ 1℃地降低,於延伸中進行降溫直至膜斷裂。使用於比斷裂之溫度高1℃之延伸溫度下所取得之延伸膜,進行下述之評估。 For unstretched films made by melt extrusion, set to 300% / min stretch Speed, 2 times the stretching ratio, stretching at the glass transition temperature of the resin + 10 ° C stretching temperature, after the stretch film is obtained without breaking, the stretching temperature is lowered by 1 ° C and 1 ° C, and the temperature is reduced during stretching until the film breaks . The stretched film obtained at a stretching temperature 1 ° C higher than the breaking temperature was used for the following evaluations.

(16)延伸膜之相位差、波長色散、雙折射 (16) Phase difference, wavelength dispersion, and birefringence of stretched film

將利用上述方法所獲得之延伸膜之中央部切成寬度4cm、長度4cm,使用王子計測機器(股)製造之相位差測定裝置KOBRA-WPR,於測定波長450、500、550、590、630nm下對相位差進行測定,並對波長色散性進行測定。波長色散性係以於450nm與550nm下所測得之相位差R450與R550之比(R450/R550)表示。若R450/R550大於1,則波長色散為正,若R450/R550未達1,則成為反波長色散。於用作1/4波長板之情形時,R450/R550之理想值為0.818(450/550=0.818)。 The central portion of the stretched film obtained by the above method was cut into a width of 4 cm and a length of 4 cm, and a phase difference measuring device KOBRA-WPR manufactured by Oji Measurement Co., Ltd. was used at a measurement wavelength of 450, 500, 550, 590, and 630 nm The phase difference was measured, and the wavelength dispersion was measured. Wavelength dispersion is expressed as the ratio of the phase difference R450 to R550 (R450 / R550) measured at 450nm and 550nm. If R450 / R550 is greater than 1, the wavelength dispersion is positive, and if R450 / R550 is less than 1, it is inverse wavelength dispersion. When used as a quarter-wave plate, the ideal value of R450 / R550 is 0.818 (450/550 = 0.818).

將用自1減去R450/R550之值而獲得之值除以茀系單體之莫耳比率而獲得之值設為反波長色散之顯現性時,將該值為0.01以上者評估為反波長色散之顯現性優異者。 When the value obtained by dividing the value obtained by subtracting the value of R450 / R550 from 1 by the mole ratio of the actinide monomer is set as the visibility of the inverse wavelength dispersion, the value of 0.01 or more is evaluated as the inverse wavelength. Excellent dispersion visibility.

再者,作為本發明1之式(1)~(3)之B(R450/R550)之值,可使用於自藉由上述熱壓法而製作之未延伸膜獲得之延伸膜之評估中所測得的波長色散之值。 Furthermore, the value of B (R450 / R550) of the formulae (1) to (3) of the present invention 1 can be used for evaluation of stretched films obtained from unstretched films produced by the above-mentioned hot-pressing method The measured wavelength dispersion value.

又,使用550nm之相位差R550與延伸膜之厚度,自下式求出雙折射△n。 The birefringence Δn was obtained from the following formula using a retardation R550 of 550 nm and the thickness of the stretched film.

雙折射=R550[nm]/(膜厚度[mm]×106) Birefringence = R550 [nm] / (film thickness [mm] × 10 6 )

雙折射之值越大,表示聚合物之配向度越高。又,雙折射之值越大,越可使用以獲得所需之相位差值之膜之厚度變薄。 The larger the value of birefringence, the higher the degree of alignment of the polymer. Also, the larger the value of the birefringence, the thinner the thickness of the film that can be used to obtain the required retardation value.

<綜合評估> <Comprehensive evaluation>

將上述各種評估中沒有評估為較差者之項者評估為各種特性之平衡性優異者。 Those who did not evaluate as poor among the various evaluations described above were evaluated as those with excellent balance of various characteristics.

<單體之合成例> <Synthesis example of monomer>

以下,對樹脂之製造所使用之單體之合成方法進行說明。 Hereinafter, a method for synthesizing a monomer used for resin production will be described.

[合成例1]雙(茀-9-基)甲烷(化合物1)之合成 [Synthesis Example 1] Synthesis of bis (fluoren-9-yl) methane (compound 1)

向1L四口燒瓶中添加茀(120g,722mmol)、N,N-二甲基甲醯胺(480ml),進行氮氣置換後,冷卻至5℃以下。添加乙醇鈉(24.6g,361mmol),將多聚甲醛(8.7g,289mmol)以不超過10℃之方式少量多次地添加並進行攪拌。2小時後,滴加1N鹽酸(440ml),使反應停止。將所獲得之懸濁溶液進行抽氣過濾,利用脫鹽水(240ml)進行噴灑洗淨。其後,使所獲得之粗產物分散於脫鹽水(240ml)並攪拌1小時。將該懸濁液抽氣過濾後,利用脫鹽水(120ml)進行噴灑洗淨。使所獲得之粗產物分散於甲苯(480ml)後,使用迪恩-斯達克裝置,於加熱回流條件下進行脫水。恢復至室溫(20℃)後,進行抽氣過濾,於80℃下減壓乾燥至成為恆量,藉此獲得作為白色固體之雙(茀-9-基)甲烷(化合物1)84.0g(產率:84.5%,HPLC純度:94.0%)。化合物1之1H-NMR圖譜中之化學位移係如下所述。 Rhenium (120 g, 722 mmol) and N, N-dimethylformamidine (480 ml) were added to a 1 L four-necked flask, followed by nitrogen substitution, and then cooled to 5 ° C or lower. Sodium ethoxide (24.6 g, 361 mmol) was added, and paraformaldehyde (8.7 g, 289 mmol) was added in small amounts several times so as not to exceed 10 ° C., and stirred. After 2 hours, 1N hydrochloric acid (440 ml) was added dropwise to stop the reaction. The obtained suspension solution was suction-filtered, and spray-washed with demineralized water (240 ml). Thereafter, the obtained crude product was dispersed in desalted water (240 ml) and stirred for 1 hour. This suspension was suction-filtered, and then spray-washed with demineralized water (120 ml). The obtained crude product was dispersed in toluene (480 ml), and then dehydrated using a Dean-Stark apparatus under heating and refluxing conditions. After returning to room temperature (20 ° C), suction filtration was performed, and the solution was dried under reduced pressure at 80 ° C to a constant amount, thereby obtaining 84.0 g of bis (fluoren-9-yl) methane (compound 1) as a white solid (product Yield: 84.5%, HPLC purity: 94.0%). The chemical shift in the 1 H-NMR spectrum of Compound 1 is as follows.

1H-NMR(400MHz,CDCl3)δ 7.83(d,J=7.6Hz,4H),7.56(dd,J1=7.6Hz,J2=0.8Hz,4H),7.41(t,J=7.3Hz,4H),7.29(dt,J1=7.3Hz,J2=1.3Hz,4H),4.42(t,J=7.6Hz,2H),2.24(d,J=7.6Hz,2H). 1 H-NMR (400MHz, CDCl 3 ) δ 7.83 (d, J = 7.6Hz, 4H), 7.56 (dd, J1 = 7.6Hz, J2 = 0.8Hz, 4H), 7.41 (t, J = 7.3Hz, 4H ), 7.29 (dt, J1 = 7.3Hz, J2 = 1.3Hz, 4H), 4.42 (t, J = 7.6Hz, 2H), 2.24 (d, J = 7.6Hz, 2H).

[合成例2]雙[9-(2-乙氧基羰基乙基)茀-9-基]甲烷(化合物2)之合成 [Synthesis Example 2] Synthesis of bis [9- (2-ethoxycarbonylethyl) fluorene-9-yl] methane (Compound 2)

[化126] [Chem. 126]

向1L三口燒瓶添加上述中所獲得之雙(茀-9-基)甲烷(化合物1,80g,232.3mmol)、氯化N-苄基-N,N,N-三乙基銨(10.6g,46.5mmol)、二氯甲烷(400ml),進行氮氣置換後,於水浴中控制為15℃~20℃,添加50%氫氧化鈉水溶液(64ml),結果溶液之顏色變為淡紅色。其後,歷時5分鐘滴加丙烯酸乙酯(50.5ml,465mmol)。1小時後進一步添加丙烯酸乙酯(25.3ml,232mmol),一面藉由HPLC追蹤反應之進行一面攪拌9小時。藉由HPLC確認單加成物成為5%以下後,於冰浴中進行冷卻,於溫度平衡下滴加3N鹽酸(293ml),進行驟冷。利用水將有機層洗淨直至液性成為中性後,利用無水硫酸鎂進行乾燥,並加以過濾,將溶劑減壓蒸餾去除。使所獲得之粗產物分散於甲醇(400ml),進行30分鐘加熱回流,藉此進行熱懸浮清洗。其後,恢復至室溫(20℃),進行抽氣過濾後,於80℃下減壓乾燥至成為恆量,藉此獲得作為白色固體之雙[9-(2-乙氧基羰基乙基)茀-9-基]甲烷(化合物2)96.1g(產率:75.9%,HPLC純度:96.0%)。化合物2之1H-NMR圖譜中之化學位移係如下所述。 To a 1 L three-necked flask was added the bis (fluoren-9-yl) methane (Compound 1, 80 g, 232.3 mmol) obtained above, N-benzyl-N, N, N-triethylammonium chloride (10.6 g, 46.5 mmol) and dichloromethane (400 ml). After nitrogen substitution, the temperature was controlled to 15 ° C. to 20 ° C. in a water bath, and a 50% aqueous sodium hydroxide solution (64 ml) was added. As a result, the color of the solution became light red. Thereafter, ethyl acrylate (50.5 ml, 465 mmol) was added dropwise over 5 minutes. After 1 hour, ethyl acrylate (25.3 ml, 232 mmol) was further added, and the reaction was stirred for 9 hours while the reaction was followed by HPLC. After confirming that the single adduct was 5% or less by HPLC, the solution was cooled in an ice bath, and 3N hydrochloric acid (293 ml) was added dropwise under temperature equilibrium, followed by quenching. After the organic layer was washed with water until the liquidity became neutral, it was dried with anhydrous magnesium sulfate, filtered, and the solvent was distilled off under reduced pressure. The obtained crude product was dispersed in methanol (400 ml), and heated and refluxed for 30 minutes to perform thermal suspension washing. Thereafter, the temperature was returned to room temperature (20 ° C), and suction filtration was performed, followed by drying under reduced pressure at 80 ° C to a constant amount, thereby obtaining bis [9- (2-ethoxycarbonylethyl) as a white solid.茀 -9-yl] methane (compound 2) 96.1 g (yield: 75.9%, HPLC purity: 96.0%). The chemical shift in the 1 H-NMR spectrum of Compound 2 is as follows.

1H-NMR(400MHz,CDCl3)δ 7.03(d,J=7.6Hz,4H),6.97(dt,J1=7.6Hz,J2=1.5Hz,4H),6.82(dt,J1=7.6Hz,J2=1.3Hz,4H),6.77(d,J=7.6Hz,4H),3.88(q,J=7.1Hz,4H),3.12(s,2H),2.23(m,4H),1.13(m,4H),1.02(t,J=7.1Hz,6H). 1 H-NMR (400MHz, CDCl 3 ) δ 7.03 (d, J = 7.6Hz, 4H), 6.97 (dt, J1 = 7.6Hz, J2 = 1.5Hz, 4H), 6.82 (dt, J1 = 7.6Hz, J2 = 1.3Hz, 4H), 6.77 (d, J = 7.6Hz, 4H), 3.88 (q, J = 7.1Hz, 4H), 3.12 (s, 2H), 2.23 (m, 4H), 1.13 (m, 4H ), 1.02 (t, J = 7.1Hz, 6H).

又,化合物2之5wt%重量減少溫度(氮氣環境下)為295℃,熔點為141℃。 The 5 wt% weight reduction temperature of Compound 2 (under a nitrogen environment) was 295 ° C, and the melting point was 141 ° C.

[合成例3]雙[9-(2-苯氧基羰基乙基)茀-9-基]甲烷(化合物3)之合成 [Synthesis Example 3] Synthesis of bis [9- (2-phenoxycarbonylethyl) fluorene-9-yl] methane (Compound 3)

向1L四口燒瓶中添加上述中所獲得之雙[9-(2-乙氧基羰基乙基)茀-9-基]甲烷(化合物2,50.0g、91.80mmol)、碳酸二苯酯(98.3g,459mmol)、原鈦酸四異丙酯(1.3mL,4.59mmol),將減壓度調整為3kPa,於145℃~150℃之溫度範圍內將副產物蒸餾去除並且攪拌6小時。冷卻至90℃,利用HPLC確認反應之結束後,添加甲苯(100ml),冷卻至50℃。此處添加甲醇(250ml),冷卻至5℃後,進行抽氣過濾。使所獲得之白色固體分散於甲苯(100ml),進行30分鐘加熱回流。冷卻至50℃後,添加甲醇(200ml)。冷卻至室溫(20℃)後,進行抽氣過濾,於100℃下減壓乾燥至成為恆量,藉此獲得作為白色固體之雙[9-(2-苯氧基羰基乙基)茀-9-基]甲烷(化合物3)50g(產率:85%,HPLC純度:98.1%)。化合物3之1H-NMR圖譜中之化學位移係如下所述。 To a 1 L four-necked flask was added the bis [9- (2-ethoxycarbonylethyl) fluorene-9-yl] methane (Compound 2, 50.0 g, 91.80 mmol), diphenyl carbonate (98.3 g, 459 mmol), tetraisopropyl orthotitanate (1.3 mL, 4.59 mmol), the degree of reduced pressure was adjusted to 3 kPa, the by-products were distilled off and stirred for 6 hours at a temperature range of 145 ° C to 150 ° C. After cooling to 90 ° C and confirming the completion of the reaction by HPLC, toluene (100 ml) was added and the mixture was cooled to 50 ° C. Methanol (250 ml) was added here, and after cooling to 5 ° C, suction filtration was performed. The obtained white solid was dispersed in toluene (100 ml) and heated under reflux for 30 minutes. After cooling to 50 ° C, methanol (200 ml) was added. After cooling to room temperature (20 ° C), suction filtration was performed, and the solution was dried under reduced pressure at 100 ° C to a constant amount, thereby obtaining bis [9- (2-phenoxycarbonylethyl) 乙基 -9 as a white solid. -Yl] methane (compound 3) 50 g (yield: 85%, HPLC purity: 98.1%). The chemical shift in the 1 H-NMR spectrum of Compound 3 is as follows.

1H-NMR(400MHz,CDCl3)δ 7.23-7.28(m,4H),7.07-7.16(m,6H),7.03(dt,J1=6.9Hz,J2=2.0,4H),6.78-6.90(m,12H),3.20(s,2H),2.37(t,J=8.3Hz,4H),1.40(t,J=8.3Hz,4H). 1 H-NMR (400MHz, CDCl 3 ) δ 7.23-7.28 (m, 4H), 7.07-7.16 (m, 6H), 7.03 (dt, J1 = 6.9Hz, J2 = 2.0, 4H), 6.78-6.90 (m , 12H), 3.20 (s, 2H), 2.37 (t, J = 8.3Hz, 4H), 1.40 (t, J = 8.3Hz, 4H).

又,化合物3之5wt%重量減少溫度(氮氣環境下)為336℃,熔點為176℃。 The 5 wt% weight reduction temperature of Compound 3 (under a nitrogen atmosphere) was 336 ° C, and the melting point was 176 ° C.

[合成例4]1,2-雙(茀-9-基)乙烷(化合物4)之合成 [Synthesis Example 4] Synthesis of 1,2-bis (fluoren-9-yl) ethane (Compound 4)

向100ml四口燒瓶中添加茀(2.0g,12mmol)、四氫呋喃(35ml),進行氮氣置換後,於乙醇-乾冰浴下冷卻至-50℃以下。將1.6mol/L正丁基鋰(7.8ml,12.5mmol)以不超過-40℃之方式少量多次地添加並進行攪拌。其後,升溫至10℃,攪拌1小時後,添加1,2-二溴乙烷(0.55ml,6.4ml),進而攪拌2小時。其後,滴加1N鹽酸(0.5ml),將所產生之懸濁溶液進行抽氣過濾,水洗後,於80℃下減壓乾燥至成為恆量,藉此獲得作為白色固體之1,2-雙(茀-9-基)乙烷(化合物4)0.63g(產率:29.2%,HPLC純度:98.0%)。又,將濾液之溶劑進行減壓蒸餾去除,添加乙醇(25ml)並攪拌30分鐘。將懸濁液進行抽氣過濾,於80℃下減壓乾燥至成為恆量,藉此獲得作為白色固體之1,2-雙(茀-9-基)乙烷(化合物4)0.44g(產率:20.5%,HPLC純度:84.0%)。若與所獲得之白色固體合併,則為1.07g(產率:49.7%)。化合物4之1H-NMR圖譜中之化學位移係如下所述。 Rhenium (2.0 g, 12 mmol) and tetrahydrofuran (35 ml) were added to a 100-ml four-necked flask, followed by nitrogen substitution, and then cooled to -50 ° C or lower in an ethanol-dry ice bath. 1.6 mol / L n-butyllithium (7.8 ml, 12.5 mmol) was added in small amounts multiple times so as not to exceed -40 ° C and stirred. Then, it heated up to 10 degreeC, and after stirring for 1 hour, 1, 2- dibromoethane (0.55 ml, 6.4 ml) was added, and it stirred for 2 hours. Thereafter, 1N hydrochloric acid (0.5 ml) was added dropwise, and the resulting suspension solution was suction-filtered, washed with water, and then dried under reduced pressure at 80 ° C to a constant amount, thereby obtaining 1,2-bis as a white solid. 0.63 g of (fluoren-9-yl) ethane (compound 4) (yield: 29.2%, HPLC purity: 98.0%). The solvent of the filtrate was distilled off under reduced pressure, and ethanol (25 ml) was added and stirred for 30 minutes. The suspension was suction-filtered and dried under reduced pressure at 80 ° C. to a constant amount, thereby obtaining 0.44 g of 1,2-bis (fluoren-9-yl) ethane (compound 4) as a white solid (yield). : 20.5%, HPLC purity: 84.0%). When combined with the obtained white solid, it was 1.07 g (yield: 49.7%). The chemical shift in the 1 H-NMR spectrum of Compound 4 is as follows.

1H-NMR(400MHz,CDCl3)δ 7.75(d,J=7.6Hz,4H),7.37(dt,J1=7.6Hz,J2=0.5Hz,4H),7.27-7.34(m,8H),3.85(s,2H),1.74(t,J=2.3Hz,4H). 1 H-NMR (400MHz, CDCl 3 ) δ 7.75 (d, J = 7.6Hz, 4H), 7.37 (dt, J1 = 7.6Hz, J2 = 0.5Hz, 4H), 7.27-7.34 (m, 8H), 3.85 (s, 2H), 1.74 (t, J = 2.3Hz, 4H).

[合成例5]1,2-雙[9-(2-乙氧基羰基乙基)茀-9-基]乙烷(化合物5)之合成 [Synthesis Example 5] Synthesis of 1,2-bis [9- (2-ethoxycarbonylethyl) fluorene-9-yl] ethane (Compound 5)

向1L四口燒瓶中添加上述中所獲得之1,2-雙(茀-9-基)乙烷(化合物4,85g,237mmol)、四氫呋喃(725ml)、N,N-二甲基甲醯胺(85 ml),進行氮氣置換後,添加乙醇鈉(3.23g,47.5mmol),升溫至室溫(20℃),攪拌30分鐘。歷時2.5小時滴加丙烯酸乙酯(59.3ml,545mmol)。利用HPLC確認原料之消失後,將0.1N鹽酸(55ml)滴加於反應液,使反應停止。將四氫呋喃進行減壓蒸餾去除後,添加甲苯(425ml),利用精製水將有機層洗淨直至液性成為中性後,利用無水硫酸鎂進行乾燥,並加以過濾,將溶劑進行減壓蒸餾去除。使所獲得之粗產物分散於甲醇(400ml),進行1小時加熱回流,藉此進行熱懸浮清洗。其後,恢復至室溫(20℃),進行抽氣過濾後,於80℃下減壓乾燥至成為恆量,藉此獲得作為白色固體之1,2-雙[9-(2-乙氧基羰基乙基)茀-9-基]乙烷(化合物5)101g(產率:76.1%,HPLC純度:98.6%)。化合物5之1H-NMR圖譜中之化學位移係如下所述。 In a 1 L four-necked flask, 1,2-bis (fluoren-9-yl) ethane (Compound 4, 85 g, 237 mmol), tetrahydrofuran (725 ml), and N, N-dimethylformamide were obtained. (85 ml), after replacing with nitrogen, sodium ethoxide (3.23 g, 47.5 mmol) was added, the temperature was raised to room temperature (20 ° C), and the mixture was stirred for 30 minutes. Ethyl acrylate (59.3 ml, 545 mmol) was added dropwise over 2.5 hours. After confirming the disappearance of the raw materials by HPLC, 0.1 N hydrochloric acid (55 ml) was added dropwise to the reaction solution to stop the reaction. After tetrahydrofuran was distilled off under reduced pressure, toluene (425 ml) was added, and the organic layer was washed with purified water until the liquidity became neutral, dried over anhydrous magnesium sulfate, and filtered, and the solvent was distilled off under reduced pressure. The obtained crude product was dispersed in methanol (400 ml), and heated and refluxed for 1 hour to perform thermal suspension washing. Thereafter, the temperature was returned to room temperature (20 ° C), and suction filtration was performed, followed by drying under reduced pressure at 80 ° C to a constant amount, thereby obtaining 1,2-bis [9- (2-ethoxy) as a white solid. 101 g of carbonylethyl) fluoren-9-yl] ethane (compound 5) (yield: 76.1%, HPLC purity: 98.6%). The chemical shift in the 1 H-NMR spectrum of Compound 5 is as follows.

1H-NMR(400MHz,CDCl3)δ 7.72(d,J=7.6Hz,4H),7.36(t,J=7.6Hz,4H),7.27(t,J=7.3Hz,4H),6.97(d,J=7.3Hz,4H),3.80(q,J=7.1Hz,4H),1.93(t,J=8.6Hz,4H),1.33(t,J=8.6Hz,4H),1.23(s,4H),1.01(t,J=7.1Hz,6H). 1 H-NMR (400MHz, CDCl 3 ) δ 7.72 (d, J = 7.6Hz, 4H), 7.36 (t, J = 7.6Hz, 4H), 7.27 (t, J = 7.3Hz, 4H), 6.97 (d , J = 7.3Hz, 4H), 3.80 (q, J = 7.1Hz, 4H), 1.93 (t, J = 8.6Hz, 4H), 1.33 (t, J = 8.6Hz, 4H), 1.23 (s, 4H ), 1.01 (t, J = 7.1Hz, 6H).

又,化合物5之5wt%重量減少溫度(氮氣環境下)為306℃,熔點為150℃。 The 5 wt% weight reduction temperature of Compound 5 (under a nitrogen environment) was 306 ° C, and the melting point was 150 ° C.

[合成例6]1,2-雙[9-(2-苯氧基羰基乙基)茀-9-基]乙烷(化合物6)之合成 [Synthesis Example 6] Synthesis of 1,2-bis [9- (2-phenoxycarbonylethyl) fluorene-9-yl] ethane (Compound 6)

向1L四口燒瓶中添加利用上述方法所獲得之1,2-雙[9-(2-乙氧基羰基乙基)茀-9-基]乙烷(化合物5,100.0g,179mmol)、碳酸二苯酯 (115g,537mmol)、原鈦酸四異丙酯(2.62ml,8.95mmol),進行氮氣置換後,升溫至135℃並且攪拌24小時。途中於經過12小時之時間點、經過20小時之時間點,少量多次地追加碳酸二苯酯(38.3g,179mmol)。利用HPLC確認反應之結束後,添加甲苯(400ml),進行1小時加熱回流。冷卻至室溫(20℃)後,進行抽氣過濾。使所獲得之白色固體分散於甲苯(300ml),進行1小時加熱回流。冷卻至室溫(20℃)後,進行抽氣過濾,於80℃下減壓乾燥至成為恆量,藉此獲得作為白色固體之1,2-雙[9-(2-苯氧基羰基乙基)茀-9-基]乙烷(化合物6)82g(產率:70.0%,HPLC純度:98.0%)。化合物6之1H-NMR圖譜中之化學位移係如下所述。 To a 1 L four-necked flask, 1,2-bis [9- (2-ethoxycarbonylethyl) fluorene-9-yl] ethane (compound 5, 100.0 g, 179 mmol), carbonic acid obtained by the above method was added. After diphenyl ester (115 g, 537 mmol) and tetraisopropyl orthotitanate (2.62 ml, 8.95 mmol) were replaced with nitrogen, the temperature was raised to 135 ° C. and stirred for 24 hours. On the way, diphenyl carbonate (38.3 g, 179 mmol) was added in small amounts at a time point of 12 hours and a time point of 20 hours. After confirming the completion of the reaction by HPLC, toluene (400 ml) was added, and the mixture was heated under reflux for 1 hour. After cooling to room temperature (20 ° C), suction filtration was performed. The obtained white solid was dispersed in toluene (300 ml) and heated under reflux for 1 hour. After cooling to room temperature (20 ° C), suction filtration was performed, and the solution was dried under reduced pressure at 80 ° C until a constant amount was obtained, thereby obtaining 1,2-bis [9- (2-phenoxycarbonylethyl) as a white solid. ) 82 g of fluoren-9-yl] ethane (compound 6) (yield: 70.0%, HPLC purity: 98.0%). The chemical shift in the 1 H-NMR spectrum of compound 6 is as follows.

1H-NMR(400MHz,CDCl3)δ 7.76(d,J=7.6,4H),7.41(dt,J1=7.3,J2=1.0,4H),7.32(dt,J1=7.3,J2=1.0,4H),7.22(t,J=8.3,4H),7,11(t,J=7.6,2H),7.03(d,J=7.6,4H),6.78(d,J=8.6,4H),2.06(t,J=8.1,4H),1.60(t,J=8.1,4H),1.29(s,4H). 1 H-NMR (400MHz, CDCl 3 ) δ 7.76 (d, J = 7.6, 4H), 7.41 (dt, J1 = 7.3, J2 = 1.0, 4H), 7.32 (dt, J1 = 7.3, J2 = 1.0, 4H ), 7.22 (t, J = 8.3, 4H), 7, 11 (t, J = 7.6, 2H), 7.03 (d, J = 7.6, 4H), 6.78 (d, J = 8.6, 4H), 2.06 ( t, J = 8.1,4H), 1.60 (t, J = 8.1,4H), 1.29 (s, 4H).

又,化合物6之5wt%重量減少溫度(氮氣環境下)為337℃,熔點為232℃。 The 5 wt% weight reduction temperature of Compound 6 (under a nitrogen environment) was 337 ° C, and the melting point was 232 ° C.

[合成例7]雙[9-(3-羥基丙基)-茀-9-基]甲烷(化合物7)之合成 [Synthesis Example 7] Synthesis of bis [9- (3-hydroxypropyl) -fluoren-9-yl] methane (Compound 7)

向500ml四口燒瓶中添加合成例2中所獲得之雙[9-(2-乙氧基羰基乙基茀-9-基]甲烷(化合物2,50g,91.8mmol)、甲苯(250ml),進行氮氣取代後,於冰浴中冷卻至5℃以下,保持10℃以下並且滴加氫化雙(2-甲氧基乙氧基)鋁鈉之65wt%甲苯溶液(82.7ml,275mmol),攪 拌1小時。利用HPLC確認原料之消失後,滴加乙酸乙酯(9.9ml),並且攪拌30分鐘後,進而滴加3.1N氫氧化鈉水溶液,進行2小時攪拌。將所獲得之懸濁溶液進行抽氣過濾,利用脫鹽水(100ml)進行噴灑洗淨。其後,使所獲得之粗產物分散於脫鹽水(150ml),並攪拌30分鐘。抽氣過濾後,進行噴灑洗淨直至液性成為中性,利用甲苯(50ml)進行噴灑洗淨。使所獲得之粗產物分散於四氫呋喃(150ml),藉由進行加溫而使之溶解。使四氫呋喃溶液恢復至室溫(20℃)後,通過短矽膠通路(50g),利用四氫呋喃(350ml)進行清洗,針對所獲得之溶液,利用蒸發器將溶劑減壓蒸餾去除。使所獲得之粗產物分散於甲苯(250ml),進行30分鐘加熱回流,藉此進行熱懸浮清洗。恢復至室溫(20℃)後,進行抽氣過濾後,於80℃下減壓乾燥至成為恆量,藉此獲得作為白色固體之雙[9-(3-羥基丙基)-茀-9-基]甲烷(化合物7)35.5g(產率:83.9%,HPLC純度:99.8%)。固體中之鈉含有率、鋁含有率均未達1ppm。化合物7之1H-NMR圖譜中之化學位移係如下所述。1H-NMR(400MHz,CDCl3)δ 7.05(d,J=7.6Hz,4H),6.97(dt,J1=7.6Hz,J2=1.5Hz,4H),6.81(dt,J1=7.6Hz,J2=1.3Hz,4H),6.77(d,J=7.6Hz,4H),3.19(q,J=6.3Hz,4H),3.08(s,2H),1.94(m,4H),0.77(t,J=5.8Hz,2H),0.47(m,4H). A 500 ml four-necked flask was charged with bis [9- (2-ethoxycarbonylethylfluoren-9-yl) methane (Compound 2, 50 g, 91.8 mmol) and toluene (250 ml) obtained in Synthesis Example 2 After the nitrogen substitution, the solution was cooled to 5 ° C or lower in an ice bath, kept at 10 ° C or lower, and a 65 wt% toluene solution (82.7 ml, 275 mmol) of sodium bis (2-methoxyethoxy) aluminum hydride was added dropwise, and stirred for 1 hour After confirming the disappearance of the raw materials by HPLC, ethyl acetate (9.9 ml) was added dropwise, and after stirring for 30 minutes, a 3.1N sodium hydroxide aqueous solution was further added dropwise, followed by stirring for 2 hours. The obtained suspension solution was evacuated It was filtered and spray-washed with demineralized water (100 ml). Thereafter, the obtained crude product was dispersed in demineralized water (150 ml) and stirred for 30 minutes. After suction filtration, the spray-washing was performed until the liquidity became neutral. It was spray-washed with toluene (50 ml). The obtained crude product was dispersed in tetrahydrofuran (150 ml) and dissolved by heating. The tetrahydrofuran solution was returned to room temperature (20 ° C), and then passed through a short silicon gel. The channel (50g) was washed with tetrahydrofuran (350ml), and the obtained solution was used The solvent was removed by distillation under reduced pressure. The obtained crude product was dispersed in toluene (250 ml), and heated and refluxed for 30 minutes to perform thermal suspension washing. After returning to room temperature (20 ° C), suction filtration was performed. 35.5 g of bis [9- (3-hydroxypropyl) -fluorene-9-yl] methane (compound 7) was obtained as a white solid by drying under reduced pressure at 80 ° C under constant pressure (yield: 83.9% , HPLC purity: 99.8%). The sodium content and aluminum content in the solid were less than 1 ppm. The chemical shift in the 1 H-NMR spectrum of compound 7 is as follows. 1 H-NMR (400 MHz, CDCl 3 ) δ 7.05 (d, J = 7.6Hz, 4H), 6.97 (dt, J1 = 7.6Hz, J2 = 1.5Hz, 4H), 6.81 (dt, J1 = 7.6Hz, J2 = 1.3Hz, 4H), 6.77 (d , J = 7.6Hz, 4H), 3.19 (q, J = 6.3Hz, 4H), 3.08 (s, 2H), 1.94 (m, 4H), 0.77 (t, J = 5.8Hz, 2H), 0.47 (m , 4H).

又,化合物7之5wt%重量減少溫度(氮氣環境下)為301℃,熔點為214℃。 The 5 wt% weight reduction temperature of Compound 7 (under a nitrogen environment) was 301 ° C, and the melting point was 214 ° C.

[合成例8]1,2-雙[9-(3-羥基丙基)-茀-9-基]乙烷(化合物8)之合成 [Synthesis Example 8] Synthesis of 1,2-bis [9- (3-hydroxypropyl) -fluoren-9-yl] ethane (Compound 8)

向1L四口燒瓶中添加合成例5中所獲得之1,2-雙[9-(2-乙氧基羰基乙基)茀-9-基]乙烷(化合物5,100g,179mmol)、四氫呋喃(500ml),進行氮氣置換後,於冰浴中冷卻至5℃以下,保持15℃以下並且滴加氫化雙(2-甲氧基乙氧基)鋁鈉之65wt%甲苯溶液(161ml,537mmol),攪拌1小時。利用HPLC確認原料之消失後,滴加乙酸乙酯(32ml),攪拌45分鐘後,進而滴加3.1N氫氧化鈉水溶液(257ml),進行1小時攪拌。將四氫呋喃減壓蒸餾去除後,將所獲得之懸濁溶液進行抽氣過濾,利用脫鹽水(100ml)進行噴灑洗淨。其後,使所獲得之粗產物溶解於乙酸乙酯(700ml),利用脫鹽水(100ml)洗淨3次。利用硫酸鎂將有機層乾燥後,通過短矽膠通道(50g),利用四氫呋喃(800ml)進行沖洗,針對所獲得之溶液,利用蒸發器將溶劑減壓蒸餾去除。使所獲得之粗產物分散於甲苯(400ml),進行30分鐘加熱回流,藉此進行熱懸浮清洗。恢復至室溫(20℃)後,進行抽氣過濾,之後於100℃下減壓乾燥至成為恆量,、藉此獲得作為白色固體之1,2-雙[9-(3-羥基丙基)-茀-9-基]乙烷(化合物8)75.6g(產率:89.0%,HPLC純度:98.7%)。固體中之鈉含有率為2ppm,鋁含有率未達2ppm。化合物8之1H-NMR圖譜中之化學位移係如下所述。 In a 1 L four-necked flask, 1,2-bis [9- (2-ethoxycarbonylethyl) fluorene-9-yl] ethane (Compound 5, 100 g, 179 mmol) and tetrahydrofuran obtained in Synthesis Example 5 were added. (500 ml), after nitrogen substitution, cooled to 5 ° C or lower in an ice bath, kept at 15 ° C or lower, and a 65 wt% toluene solution of sodium bis (2-methoxyethoxy) aluminum hydride (161 ml, 537 mmol) was added dropwise. And stir for 1 hour. After confirming the disappearance of the raw materials by HPLC, ethyl acetate (32 ml) was added dropwise, and after stirring for 45 minutes, a 3.1 N sodium hydroxide aqueous solution (257 ml) was further added dropwise, followed by stirring for 1 hour. After the tetrahydrofuran was distilled off under reduced pressure, the obtained suspension solution was suction-filtered, and spray-washed with demineralized water (100 ml). Thereafter, the obtained crude product was dissolved in ethyl acetate (700 ml), and washed three times with demineralized water (100 ml). After the organic layer was dried with magnesium sulfate, it was rinsed with tetrahydrofuran (800 ml) through a short silica gel channel (50 g), and the obtained solution was distilled to remove the solvent under reduced pressure using an evaporator. The obtained crude product was dispersed in toluene (400 ml), and heated and refluxed for 30 minutes to perform thermal suspension washing. After returning to room temperature (20 ° C), suction filtration was performed, and then dried under reduced pressure at 100 ° C to a constant amount to obtain 1,2-bis [9- (3-hydroxypropyl) as a white solid. -Fluoren-9-yl] ethane (compound 8) 75.6 g (yield: 89.0%, HPLC purity: 98.7%). The content of sodium in the solid was 2 ppm, and the content of aluminum was less than 2 ppm. The chemical shift in the 1 H-NMR spectrum of Compound 8 is as follows.

1H-NMR(400MHz,DMSO-d6)δ 7.81(d,J=7.3Hz,4H),7.35(t,J=7.3Hz,4H),7.29(t,J=7.3Hz,4H),7.02(d,J=7.3Hz,4H),4.02(t,J=5.0Hz,2H),2.93(m,4H),1.59(m,4H),1.19(s,4H),0.45(m,4H). 1 H-NMR (400MHz, DMSO-d 6 ) δ 7.81 (d, J = 7.3Hz, 4H), 7.35 (t, J = 7.3Hz, 4H), 7.29 (t, J = 7.3Hz, 4H), 7.02 (d, J = 7.3Hz, 4H), 4.02 (t, J = 5.0Hz, 2H), 2.93 (m, 4H), 1.59 (m, 4H), 1.19 (s, 4H), 0.45 (m, 4H) .

又,化合物8之5wt%重量減少溫度(氮氣環境下)為312℃,熔點為253℃。 The 5 wt% weight reduction temperature of Compound 8 (under a nitrogen atmosphere) was 312 ° C, and the melting point was 253 ° C.

[合成例9]雙(9-羥基甲基茀-9-基)甲烷(化合物9)之合成 [Synthesis Example 9] Synthesis of bis (9-hydroxymethylfluorene-9-yl) methane (Compound 9)

[化133] [Chemical 133]

向500mL四口燒瓶中添加合成例1中所獲得之雙(茀-9-基)甲烷(化合物1,100g,290mmol)、N,N-二甲基甲醯胺(400ml),進行氮氣置換後,添加多聚甲醛(18.3g,610mmol)。冷卻至5℃以下後,添加乙醇鈉(0.698g,13mmol),並以不超過10℃之方式進行攪拌。1小時半後,將1N鹽酸(32ml)以不超過25℃之方式進行添加,使反應停止。進而添加水(300ml)並進行攪拌,將所獲得之懸濁溶液進行抽氣過濾,利用脫鹽水(100ml)進行噴灑洗淨。使所獲得之粗產物分散於四氫呋喃(400ml)後,進行1小時加熱回流。恢復至室溫(20℃),抽氣過濾後,於80℃下減壓乾燥至成為恆量,而獲得白色固體108g(產率:91%,HPLC純度:99.1%)。所獲得之白色固體中之鈉含有率為620ppm。其後,使白色固體向甲苯(800ml)及水(200ml)混合液中進行分散,進行1小時加熱回流,過濾分離、乾燥後,對所獲得之固體中之鈉含有率進行測定,結果為390ppm。進而,使所獲得之白色固體分散於N,N-二甲基甲醯胺(500ml),進行加溫而製成均勻之溶液後,冷卻至40℃以下,向0.03N之鹽酸(1500ml)中慢慢地滴加。將所獲得之懸濁溶液抽氣過濾,並分散於脫鹽水(200ml),攪拌1小時。將該懸濁液抽氣過濾後,利用脫鹽水(100ml)進行噴灑洗淨。使所獲得之產物分散於甲苯(800ml)後,於加熱回流下進行共沸脫水。恢復至室溫(20℃),抽氣過濾後,於100℃下減壓乾燥至成為恆量,藉此獲得作為白色固體之雙(9-羥基甲基茀-9-基)甲烷(化合物9)104g(產率87%,HPLC純度:99.8%)。固體中之鈉、氯含有率分別未達10ppm。化合物9之1H-NMR圖譜中之化學位移係如下所述。 A 500 mL four-necked flask was added with bis (fluoren-9-yl) methane (Compound 1, 100 g, 290 mmol) and N, N-dimethylformamide (400 ml) obtained in Synthesis Example 1, and nitrogen substitution was performed. Add paraformaldehyde (18.3 g, 610 mmol). After cooling to 5 ° C or lower, sodium ethoxide (0.698 g, 13 mmol) was added, and the mixture was stirred so as not to exceed 10 ° C. After 1 hour and a half, 1N hydrochloric acid (32 ml) was added so as not to exceed 25 ° C to stop the reaction. Furthermore, water (300 ml) was added and stirred, and the obtained suspension solution was suction-filtered, and spray-washed with demineralized water (100 ml). The obtained crude product was dispersed in tetrahydrofuran (400 ml), and then heated under reflux for 1 hour. The temperature was returned to room temperature (20 ° C), and after suction filtration, the solution was dried under reduced pressure at 80 ° C to a constant amount to obtain 108 g of a white solid (yield: 91%, HPLC purity: 99.1%). The sodium content in the obtained white solid was 620 ppm. Thereafter, the white solid was dispersed in a mixed solution of toluene (800 ml) and water (200 ml), heated and refluxed for 1 hour, filtered and dried, and the sodium content in the obtained solid was measured. As a result, it was 390 ppm . Furthermore, the obtained white solid was dispersed in N, N-dimethylformamide (500 ml), heated to make a uniform solution, and then cooled to 40 ° C or lower, and then poured into 0.03N hydrochloric acid (1500 ml). Add slowly. The obtained suspension solution was suction-filtered and dispersed in desalted water (200 ml), and stirred for 1 hour. This suspension was suction-filtered, and then spray-washed with demineralized water (100 ml). The obtained product was dispersed in toluene (800 ml), and then azeotropically dehydrated under heating and refluxing. The temperature was returned to room temperature (20 ° C), and after suction filtration, the solution was dried under reduced pressure at 100 ° C to a constant amount to obtain bis (9-hydroxymethylfluorene-9-yl) methane (compound 9) as a white solid. 104 g (87% yield, HPLC purity: 99.8%). The content of sodium and chlorine in the solids did not reach 10 ppm respectively. The chemical shift in the 1 H-NMR spectrum of Compound 9 is as follows.

1H-NMR(400MHz,DMSO-d6)δ 7.12(d,J=7.3Hz,4H),7.07- 6.93(m,8H),6.77(dt,J1=7.3Hz,J2=1.0Hz,4H),4.97(t,J=4.6Hz,2H),3.31(s,2H),3.23(d,J=4.3Hz,4H). 1 H-NMR (400MHz, DMSO-d 6 ) δ 7.12 (d, J = 7.3Hz, 4H), 7.07- 6.93 (m, 8H), 6.77 (dt, J1 = 7.3Hz, J2 = 1.0Hz, 4H) , 4.97 (t, J = 4.6Hz, 2H), 3.31 (s, 2H), 3.23 (d, J = 4.3Hz, 4H).

又,化合物9之UV-Vis圖譜(溶劑:THF)中之吸收最大波長λmax於263nm、292nm及304nm下存在。又,化合物9之5wt%重量減少溫度(氮氣環境下)為289℃,熔點為226℃。 The absorption maximum wavelength λ max in the UV-Vis spectrum (solvent: THF) of Compound 9 exists at 263 nm, 292 nm, and 304 nm. The 5 wt% weight reduction temperature of Compound 9 (under a nitrogen environment) was 289 ° C, and the melting point was 226 ° C.

[合成例10]1,2-雙(9-羥基甲基茀-9-基)乙烷(化合物10)之合成 [Synthesis Example 10] Synthesis of 1,2-bis (9-hydroxymethylfluoren-9-yl) ethane (Compound 10)

向1L四口燒瓶中添加合成例4中所獲得之1,2-雙(茀-9-基)乙烷(化合物4,100g,278.9mmol)、多聚甲醛(17.6g,585.8mmol)、N,N-二甲基甲醯胺(400ml),進行氮氣置換後,冷卻至10℃以下。添加乙醇鈉(1.80g,27.9mmol),升溫至室溫(20℃)並攪拌1小時。利用HPLC確認原料之消失後,向0.1N鹽酸(440ml)中滴加反應液,使反應停止。將所獲得之懸濁溶液抽氣過濾,利用脫鹽水(100ml)進行噴灑洗淨。其後,使所獲得之粗產物分散於N,N-二甲基甲醯胺(300ml),進行1小時攪拌。將該懸濁液向0.005N鹽酸(1000ml)中進行滴加,攪拌30分鐘後,進行抽氣過濾。使所獲得之粗產物分散於脫鹽水(500ml)中,進行1小時攪拌。將該懸濁液抽氣過濾後,利用脫鹽水(200ml)進行噴灑洗淨。使所獲得之粗產物分散於甲苯(500ml)後,使用迪恩-斯達克裝置,於加熱回流條件下進行脫水。恢復至室溫(20℃)後,進行抽氣過濾,於100℃下減壓乾燥至成為恆量,藉此獲得作為白色固體之1,2-雙(9-羥基甲基茀-9-基)乙烷(化合物10)112.4g(產率:96.3%,HPLC純度:99.1%)。固體中之鈉含有率未達1ppm。化合物 10之1H-NMR圖譜中之化學位移係如下所述。 In a 1 L four-necked flask, 1,2-bis (fluoren-9-yl) ethane (Compound 4, 100 g, 278.9 mmol), paraformaldehyde (17.6 g, 585.8 mmol), and N obtained in Synthesis Example 4 were added. N-dimethylformamidine (400 ml), after nitrogen substitution, and cooled to 10 ° C or lower. Sodium ethoxide (1.80 g, 27.9 mmol) was added, and the temperature was raised to room temperature (20 ° C) and stirred for 1 hour. After confirming the disappearance of the raw materials by HPLC, the reaction solution was added dropwise to 0.1N hydrochloric acid (440 ml) to stop the reaction. The obtained suspension solution was suction-filtered, and spray-washed with demineralized water (100 ml). Thereafter, the obtained crude product was dispersed in N, N-dimethylformamide (300 ml) and stirred for 1 hour. This suspension was added dropwise to 0.005N hydrochloric acid (1000 ml), and after stirring for 30 minutes, suction filtration was performed. The obtained crude product was dispersed in demineralized water (500 ml) and stirred for 1 hour. This suspension was suction-filtered, and then spray-washed with demineralized water (200 ml). The obtained crude product was dispersed in toluene (500 ml), and then dehydrated using a Dean-Stark apparatus under heating and refluxing conditions. After returning to room temperature (20 ° C), suction filtration was performed, and the solution was dried under reduced pressure at 100 ° C until a constant amount was obtained, thereby obtaining 1,2-bis (9-hydroxymethylfluorene-9-yl) as a white solid. 112.4 g of ethane (compound 10) (yield: 96.3%, HPLC purity: 99.1%). The content of sodium in the solid was less than 1 ppm. The chemical shift in the 1 H-NMR spectrum of Compound 10 is as follows.

1H-NMR(400MHz,DMSO-d6)δ 7.91(d,J=7.3Hz,4H),7.4(dt,J1=7.6Hz,J2=1.0Hz,4H),7.35(dt,J1=7.6Hz,J2=1.0Hz,4H),7.18(d,J=7.3Hz,4H),4.79(t,J=5.3Hz,2H),3.18(d,J=5.3Hz,2H),1.40(s,4H). 1 H-NMR (400MHz, DMSO-d 6 ) δ 7.91 (d, J = 7.3Hz, 4H), 7.4 (dt, J1 = 7.6Hz, J2 = 1.0Hz, 4H), 7.35 (dt, J1 = 7.6Hz , J2 = 1.0Hz, 4H), 7.18 (d, J = 7.3Hz, 4H), 4.79 (t, J = 5.3Hz, 2H), 3.18 (d, J = 5.3Hz, 2H), 1.40 (s, 4H ).

又,化合物10之UV-Vis圖譜(溶劑:THF)中之吸收最大波長λmax係於264nm、291nm及302nm存在。又,化合物10之5wt%重量減少溫度(氮氣環境下)為301℃,熔點為278℃。 The absorption maximum wavelength λ max in the UV-Vis spectrum (solvent: THF) of Compound 10 exists at 264 nm, 291 nm, and 302 nm. The 5 wt% weight reduction temperature of Compound 10 (under a nitrogen atmosphere) was 301 ° C, and the melting point was 278 ° C.

[合成例11]1,2-雙(茀-9-基)丁烷(化合物11)之合成 [Synthesis Example 11] Synthesis of 1,2-bis (fluoren-9-yl) butane (Compound 11)

向容量70ml之SUS316製高壓釜添加茀(3.5g,21mmol)、1,4-丁二醇(4.9g,54mmol)、85%KOH(1.52g,23mmol)、四乙二醇二甲醚(4.9g),於氮氣環境下,於250℃下反應8小時。冷卻後,使內容物分散於四氫呋喃及水中,利用稀鹽酸進行中和。自所獲得之懸濁溶液濾取析出粉末並進行水洗,而獲得作為白色固體之1,4-雙(茀-9-基)丁烷(化合物11)1.7g(產率:41.9%,HPLC純度:97.4%)。化合物11之1H-NMR圖譜中之化學位移係如下所述。 Sulfur (3.5 g, 21 mmol), 1,4-butanediol (4.9 g, 54 mmol), 85% KOH (1.52 g, 23 mmol), tetraethylene glycol dimethyl ether (4.9 g) Under a nitrogen environment, the reaction was performed at 250 ° C for 8 hours. After cooling, the contents were dispersed in tetrahydrofuran and water, and neutralized with dilute hydrochloric acid. The precipitated powder was filtered from the obtained suspension solution and washed with water to obtain 1.7 g of 1,4-bis (fluoren-9-yl) butane (Compound 11) as a white solid (yield: 41.9%, HPLC purity : 97.4%). The chemical shift in the 1 H-NMR spectrum of Compound 11 is as follows.

1H-NMR(400MHz,CDCl3)δ 7.72(d,J=7.6Hz,4H),7.42(m,4H),7.25-7.36(m,8H),3.89(t,J=5.8Hz,2H),1.96-1.86(m,4H),1.15-1.05(m,4H). 1 H-NMR (400MHz, CDCl 3 ) δ 7.72 (d, J = 7.6Hz, 4H), 7.42 (m, 4H), 7.25-7.36 (m, 8H), 3.89 (t, J = 5.8Hz, 2H) , 1.96-1.86 (m, 4H), 1.15-1.05 (m, 4H).

[合成例12]1,2-雙(9-羥基甲基茀-9-基)丁烷(化合物12)之合成 [Synthesis Example 12] Synthesis of 1,2-bis (9-hydroxymethylfluoren-9-yl) butane (Compound 12)

[化136] [Chemical 136]

向500mL四口燒瓶中添加上述中所獲得之1,2-雙(茀-9-基)丁烷(化合物11,37.0g,95.7mmol)、多聚甲醛(6.03g,201mmol)、N,N-二甲基甲醯胺(148ml),進行氮氣置換後,冷卻至10℃以下。添加乙醇鈉(0.65g,9.6mmol),升溫至室溫(20℃),攪拌1小時。利用HPLC確認原料之消失後,向0.1N鹽酸(162ml)中滴加反應液,使反應停止。將所獲得之懸濁溶液進行抽氣過濾,利用脫鹽水(37ml)進行噴灑洗淨。使所獲得之粗產物分散於甲苯(185ml)後,使用迪恩-斯達克裝置,於加熱回流條件下進行脫水。恢復至室溫(20℃)後,進行抽氣過濾,於80℃下進行減壓過濾直至成為恆量,藉此獲得作為白色固體之1,2-雙(9-羥基甲基茀-9-基)丁烷(化合物12)39.8g(產率:93.1%,HPLC純度:99.1%)。化合物12之1H-NMR圖譜中之化學位移係如下所述。 In a 500 mL four-necked flask, 1,2-bis (fluoren-9-yl) butane (compound 11, 37.0 g, 95.7 mmol), paraformaldehyde (6.03 g, 201 mmol), N, N obtained above were added. -Dimethylformamide (148 ml), after nitrogen substitution, and cooling to 10 ° C or lower. Sodium ethoxide (0.65 g, 9.6 mmol) was added, the temperature was raised to room temperature (20 ° C), and the mixture was stirred for 1 hour. After confirming the disappearance of the raw materials by HPLC, the reaction solution was added dropwise to 0.1N hydrochloric acid (162 ml) to stop the reaction. The obtained suspension solution was suction-filtered, and spray-washed with demineralized water (37 ml). The obtained crude product was dispersed in toluene (185 ml), and then dehydrated using a Dean-Stark apparatus under heating and refluxing conditions. After returning to room temperature (20 ° C), suction filtration was performed, and reduced pressure filtration was performed at 80 ° C until a constant amount was obtained, thereby obtaining 1,2-bis (9-hydroxymethylfluorene-9-yl) as a white solid. ) 39.8 g of butane (Compound 12) (yield: 93.1%, HPLC purity: 99.1%). The chemical shift in the 1 H-NMR spectrum of Compound 12 is as follows.

1H-NMR(400MHz,DMSO-d6)δ 7.71-7.66(m,4H),7.38-7.24(m,4H),3.71(d,J=6.3Hz,4H),1.89-1.81(m,4H),1.22(t,J=6.3Hz,2H),0.51-0.44(m,4H). 1 H-NMR (400MHz, DMSO-d 6 ) δ 7.71-7.66 (m, 4H), 7.38-7.24 (m, 4H), 3.71 (d, J = 6.3Hz, 4H), 1.89-1.81 (m, 4H ), 1.22 (t, J = 6.3Hz, 2H), 0.51-0.44 (m, 4H).

又,化合物12之UV-Vis圖譜(溶劑:THF)中之吸收最大波長λmax係於291nm及302nm中存在。又,化合物12之5wt%重量減少溫度(氮氣環境下)為314℃,熔點為212℃。 The absorption maximum wavelength λ max in the UV-Vis spectrum (solvent: THF) of Compound 12 exists at 291 nm and 302 nm. The 5 wt% weight reduction temperature of Compound 12 (under a nitrogen environment) was 314 ° C, and the melting point was 212 ° C.

[合成例13]α,α'-雙-(9-羥基甲基茀-9-基)-1,4-二甲苯(化合物13)之合成 [Synthesis Example 13] Synthesis of α, α'-bis- (9-hydroxymethylfluoren-9-yl) -1,4-xylene (Compound 13)

[化137] [Chemical 137]

向1L四口茄形燒瓶添加α,α'-雙-(茀-9-基)-1,4-二甲苯(130g,0.3mol)、多聚甲醛(18.9g、0.63mol)、N,N-二甲基甲醯胺(520ml),進行氮氣置換後,添加乙醇鈉(2.04g,0.03mol),並於室溫(20℃)下攪拌1小時。向1L燒杯添加脫鹽水520ml與1N鹽酸(45ml),攪拌時添加反應液,將反應進行驟冷。將所獲得之結晶進行抽氣過濾,利用脫鹽水(100ml)進行噴灑洗淨。使所獲得之粗產物分散於脫鹽水(500ml)後,進行抽氣過濾,利用脫鹽水(100ml)進行噴灑洗淨。使所獲得之粗產物分散於甲苯(500ml)後,使用迪恩-斯達克裝置,於加熱回流條件下進行脫水。恢復至室溫(20℃)後,進行抽氣過濾,於70℃下減壓乾燥至成為恆量,藉此獲得白色固體(化合物13)130g(產率:87%,HPLC純度:97.6%)。化合物13之1H-NMR圖譜中之化學位移係如下所述。 Add α, α'-bis- (fluoren-9-yl) -1,4-xylene (130 g, 0.3 mol), paraformaldehyde (18.9 g, 0.63 mol), N, N to a 1 L four-neck eggplant-shaped flask -Dimethylformamide (520 ml), after replacing with nitrogen, sodium ethoxide (2.04 g, 0.03 mol) was added, and the mixture was stirred at room temperature (20 ° C) for 1 hour. 520 ml of desalted water and 1 N hydrochloric acid (45 ml) were added to a 1 L beaker, and the reaction solution was added while stirring to quench the reaction. The obtained crystals were suction-filtered, and spray-washed with demineralized water (100 ml). The obtained crude product was dispersed in demineralized water (500 ml), and then subjected to suction filtration, and spray-washed with demineralized water (100 ml). The obtained crude product was dispersed in toluene (500 ml), and then dehydrated using a Dean-Stark apparatus under heating and refluxing conditions. After returning to room temperature (20 ° C), suction filtration and drying under reduced pressure at 70 ° C to a constant amount were performed to obtain 130 g of a white solid (Compound 13) (yield: 87%, HPLC purity: 97.6%). The chemical shift in the 1 H-NMR spectrum of Compound 13 is as follows.

1H-NMR(400MHz,CDCl3)δ 7.62(d,J=7.6Hz,4H),7.33(t,J=8.0Hz,4H),7.25(t,J=60Hz,4H),7.19(br,4H),6.45(s,4H),3.80(d,J=6.4Hz,4H),3.12(s,4H),1.42(t,J=6.4Hz,2H). 1 H-NMR (400MHz, CDCl 3 ) δ 7.62 (d, J = 7.6Hz, 4H), 7.33 (t, J = 8.0Hz, 4H), 7.25 (t, J = 60Hz, 4H), 7.19 (br, 4H), 6.45 (s, 4H), 3.80 (d, J = 6.4Hz, 4H), 3.12 (s, 4H), 1.42 (t, J = 6.4Hz, 2H).

又,化合物13之5wt%重量減少溫度(氮氣環境下)為327℃,熔點為198℃。 The 5 wt% weight reduction temperature of Compound 13 (under a nitrogen atmosphere) was 327 ° C, and the melting point was 198 ° C.

[合成例14]1,2-雙(9-羥基茀-9-基)乙烷(化合物14)之合成 [Synthesis Example 14] Synthesis of 1,2-bis (9-hydroxyfluorene-9-yl) ethane (Compound 14)

向1L四口燒瓶中添加利用合成例4之方法所獲得之1,2-雙(茀-9-基)乙烷(化合物4,20g,59mmol)、N,N-二甲基甲醯胺(200ml),添加亞磷酸三丁酯(37.9ml,140mmol),進行氮氣置換後,添加苄基三甲基氫氧化銨(40%甲醇溶液)(25ml),使空氣(100ml/min)與氮氣(300ml/min)之混合氣體於反應系統中進行流通。攪拌3小時後,添加苄基三甲基氫氧化銨(40%甲醇溶液)(10ml),並攪拌5小時。進而,添加苄基三甲基氫氧化銨(40%MeOH溶液)(10ml),進而攪拌1小時。添加1N鹽酸(200ml),使反應停止,添加乙酸乙酯(400ml),進行分液操作。進而,利用飽和食鹽水(100ml)將有機層洗淨3次。利用硫酸鎂使有機層乾燥後,進行過濾,將有機溶劑減壓蒸餾去除。向所獲得之懸濁溶液添加甲苯(100ml)、己烷(200ml),攪拌30分鐘後,進行抽氣過濾,於80℃下減壓乾燥至成為恆量,藉此獲得作為白色固體之1,2-雙(9-羥基茀-9-基)乙烷(化合物14)13.9g(產率:63.8%,HPLC純度:92.5%)。化合物14之1H-NMR圖譜中之化學位移係如下所述。 To a 1 L four-necked flask, 1,2-bis (fluoren-9-yl) ethane (compound 4, 20 g, 59 mmol), N, N-dimethylformamide ( 200ml), tributyl phosphite (37.9ml, 140mmol) was added, and after nitrogen substitution, benzyltrimethylammonium hydroxide (40% methanol solution) (25ml) was added, and air (100ml / min) and nitrogen ( 300ml / min) mixed gas is circulated in the reaction system. After stirring for 3 hours, benzyltrimethylammonium hydroxide (40% methanol solution) (10 ml) was added and stirred for 5 hours. Furthermore, benzyltrimethylammonium hydroxide (40% MeOH solution) (10 ml) was added, and it stirred for 1 hour. 1N hydrochloric acid (200 ml) was added to stop the reaction, and ethyl acetate (400 ml) was added to perform a liquid separation operation. Furthermore, the organic layer was washed three times with saturated saline (100 ml). The organic layer was dried with magnesium sulfate, and then filtered, and the organic solvent was distilled off under reduced pressure. Toluene (100 ml) and hexane (200 ml) were added to the obtained suspension solution, and after stirring for 30 minutes, the mixture was suction-filtered and dried under reduced pressure at 80 ° C to a constant amount to obtain 1,2 as a white solid. -13.9 g of bis (9-hydroxyfluorene-9-yl) ethane (Compound 14) (yield: 63.8%, HPLC purity: 92.5%). The chemical shift in the 1 H-NMR spectrum of Compound 14 is as follows.

1H-NMR(400MHz,CDCl3)δ 7.73(d,J=7.3Hz,4H),7.35(dt,J1=7.6Hz,J2=1.0,6H),7.26(dt,J1=7.6Hz,J2=1.0,4H),7.11(d,J=7.3Hz,4H),5.35(s,2H),1.40(s,4H). 1 H-NMR (400MHz, CDCl 3 ) δ 7.73 (d, J = 7.3Hz, 4H), 7.35 (dt, J1 = 7.6Hz, J2 = 1.0, 6H), 7.26 (dt, J1 = 7.6Hz, J2 = 1.0, 4H), 7.11 (d, J = 7.3Hz, 4H), 5.35 (s, 2H), 1.40 (s, 4H).

[合成例15]雙-{[4-(2-羥基乙氧基)苯基]茀-9-基}乙烷(化合物15)之合成 [Synthesis Example 15] Synthesis of bis-{[4- (2-hydroxyethoxy) phenyl] fluorene-9-yl} ethane (Compound 15)

向300mL四口燒瓶中添加利用上述之方法所獲得之1,2-雙(茀-9- 基)乙烷(化合物14,17g,45mmol,苯氧基乙醇(37g,267mmol),進行氮氣置換後,冷卻至10℃以下。添加三氟化硼-二乙基醚錯合物(5.6ml,45mmol),於室溫(20℃)下攪拌3小時後,進而添加三氟化硼-二乙基醚錯合物(5.6ml,45mmol)、氯仿(35ml),於40℃下攪拌4小時,於60℃下攪拌2小時。進而,添加三氟化硼-二乙基醚錯合物(5.6ml,45mmol),進行過熱回流2小時。冷卻至室溫(20℃)後,使用飽和碳酸氫鈉水溶液,進行中和後,藉由抽氣過濾而將不溶物去除。添加乙酸乙酯(120ml),利用飽和食鹽水將有機層洗淨2次,利用脫鹽水將有機層洗淨1次,利用硫酸鎂進行乾燥後,進行過濾,將有機溶劑減壓蒸餾去除。再次溶解於乙酸乙酯(150ml),添加活性碳(日本Norit股份有限公司,SXPLUS,pH值=7,2.5g),攪拌1小時後,進行矽藻土過濾,將有機溶劑減壓蒸餾去除。添加甲醇(100ml),攪拌1小時,進行抽氣過濾,於80℃下減壓乾燥至成為恆量,藉此獲得作為白色固體之雙-{[4-(2-羥基乙氧基)苯基]茀-9-基}乙烷(化合物15)15.8g(產率:56.1%,HPLC純度:86%)。化合物15之1H-NMR圖譜中之化學位移係如下所述。 A 300 mL four-necked flask was charged with 1,2-bis (fluoren-9-yl) ethane (compound 14, 17 g, 45 mmol, phenoxyethanol (37 g, 267 mmol)) obtained by the method described above, and then replaced with nitrogen. And cooled to below 10 ° C. Boron trifluoride-diethyl ether complex (5.6ml, 45mmol) was added, and after stirring at room temperature (20 ° C) for 3 hours, boron trifluoride-diethyl was further added. Ether complex (5.6 ml, 45 mmol) and chloroform (35 ml) were stirred at 40 ° C. for 4 hours and 60 ° C. for 2 hours. Furthermore, boron trifluoride-diethyl ether complex (5.6 ml) was added. , 45 mmol), refluxed for 2 hours. After cooling to room temperature (20 ° C), neutralization was performed using a saturated aqueous sodium hydrogen carbonate solution, and insoluble matter was removed by suction filtration. Ethyl acetate (120 ml) was added. The organic layer was washed twice with saturated saline, and once with demineralized saline. The organic layer was dried with magnesium sulfate, filtered, and the organic solvent was distilled off under reduced pressure. It was dissolved again in ethyl acetate (150 ml). ), Added activated carbon (Japan Norit Co., Ltd., SXPLUS, pH = 7, 2.5g), stirred for 1 hour, and then filtered through diatomaceous earth The organic solvent was distilled off under reduced pressure. Methanol (100 ml) was added, and the mixture was stirred for 1 hour, followed by suction filtration, and dried under reduced pressure at 80 ° C. to a constant amount, thereby obtaining bis-{[4- (2- Hydroxyethoxy) phenyl] fluorene-9-yl} ethane (compound 15) 15.8 g (yield: 56.1%, HPLC purity: 86%). The chemical shift in the 1 H-NMR spectrum of compound 15 is as follows As described.

1H-NMR(400MHz,CDCl3)δ 7.77(d,J=7.3Hz,4H),7.36(dt,J1=7.6Hz,J2=1.0,4H),7.22(dt,J1=Hz,J2=1.0,4H),6.92(d,J=7.6Hz,4H),6.73(d,J=9.1Hz,4H),6.59(d,J=9.1Hz,4H),3.91-3.93(m,4H),3.83-3.87(m,4H),1.92(t,J=6.3Hz,2H),1.82(s,4H), 1 H-NMR (400MHz, CDCl 3 ) δ 7.77 (d, J = 7.3Hz, 4H), 7.36 (dt, J1 = 7.6Hz, J2 = 1.0, 4H), 7.22 (dt, J1 = Hz, J2 = 1.0 , 4H), 6.92 (d, J = 7.6Hz, 4H), 6.73 (d, J = 9.1Hz, 4H), 6.59 (d, J = 9.1Hz, 4H), 3.91-3.93 (m, 4H), 3.83 -3.87 (m, 4H), 1.92 (t, J = 6.3Hz, 2H), 1.82 (s, 4H),

[合成例16]茀-9,9-二乙醇(化合物16)之合成 [Synthesis Example 16] Synthesis of 茀 -9,9-diethanol (Compound 16)

依據日本專利特開2010-261008號公報所記載之方法而進行合成。 Synthesis was performed according to the method described in Japanese Patent Laid-Open No. 2010-261008.

<樹脂之合成例及特性評估> <Resin Synthesis Examples and Characteristics Evaluation>

以下之實施例、及比較例中所使用之化合物之縮寫等係如下所述。 The abbreviations and the like of the compounds used in the following examples and comparative examples are as follows.

‧BHEPF:9,9-雙[4-(2-羥基乙氧基)苯基]-茀(Osaka Gas Chemicals(股)製造) ‧BHEPF: 9,9-bis [4- (2-hydroxyethoxy) phenyl] -fluorene (manufactured by Osaka Gas Chemicals)

‧BCF:9,9-雙(4-羥基-3-甲基苯基)-茀(Osaka Gas Chemicals(股)製造) ‧BCF: 9,9-bis (4-hydroxy-3-methylphenyl) -fluorene (manufactured by Osaka Gas Chemicals)

‧DPC:碳酸二苯酯(三菱化學(股)製造) ‧DPC: Diphenyl carbonate (manufactured by Mitsubishi Chemical Corporation)

‧ISB:異山梨酯(Roquette Freres公司製造,商品名:POLYSORB) ‧ISB: Isosorbide (manufactured by Roquette Freres, trade name: POLYSORB)

‧CHDM:1,4-環己烷二甲醇(順式、反式混合物,SK化學公司製造) ‧CHDM: 1,4-cyclohexanedimethanol (cis, trans mixture, manufactured by SK Chemicals)

‧TCDDM:三環癸烷二甲醇(OXEA公司製造) ‧TCDDM: Tricyclodecane dimethanol (manufactured by OXEA)

‧SPG:螺二醇(三菱瓦斯化學(股)製造) ‧SPG: Spirodiol (manufactured by Mitsubishi Gas Chemical Co., Ltd.)

‧BPA:2,2-雙[4-羥基苯基7丙烷(三菱化學(股)製造) ‧BPA: 2,2-bis [4-hydroxyphenyl 7 propane (manufactured by Mitsubishi Chemical Corporation)

‧PEG:聚乙二醇數平均分子量:1000(三洋化成(股)製造) ‧PEG: Number average molecular weight of polyethylene glycol: 1000 (manufactured by Sanyo Kasei Co., Ltd.)

‧CHDA:1,4-環己烷二羧酸(順式、反式混合物,Eastman Chemical公司製造) ‧CHDA: 1,4-cyclohexanedicarboxylic acid (cis, trans mixture, manufactured by Eastman Chemical)

‧DMT:對苯二甲酸二甲酯(東京化成工業(股)製造) ‧DMT: Dimethyl terephthalate (manufactured by Tokyo Chemical Industry Co., Ltd.)

[實施例1-1] [Example 1-1]

將雙[9-(2-苯氧基羰基乙基)茀-9-基]甲烷(化合物3)38.06質量份(0.059mol)、ISB 53.73質量份(0.368mol)、CHDM 9.64質量份(0.067mol)、DPC 81.28質量份(0.379mol)、及作為觸媒之乙酸鈣一水合物3.83×10-4質量份(2.17×10-6mol)投入反應容器,將反應裝置內進行減 壓氮氣置換。氮氣環境下,於150℃下攪拌約10分鐘並且使原料溶解。於反應第1階段之步驟中,歷時30分鐘升溫至220℃,於常壓下反應60分鐘。繼而歷時90分鐘將壓力自常壓減壓至13.3kPa,於13.3kPa下保持30分鐘,將所產生之苯酚向反應系外抽出。繼而於反應第二階段之步驟中,歷時15分鐘將熱媒溫度升溫至240℃,並且歷時15分鐘將壓力減壓至0.10kPa以下,將所產生之苯酚向反應系外抽出。於達到特定之攪拌轉矩後,利用氮氣恢復至常壓,使反應停止,將所產生之聚酯碳酸酯於水中擠出,將股線進行切割而獲得顆粒物。使用所獲得之聚酯碳酸酯之顆粒物,進行上述之各種評估。將評估結果示於表1。 Bis [9- (2-phenoxycarbonylethyl) fluorene-9-yl] methane (compound 3) 38.06 parts by mass (0.059 mol), ISB 53.73 parts by mass (0.368 mol), CHDM 9.64 parts by mass (0.067 mol ), 81.28 parts by mass (0.379 mol) of DPC, and 3.83 × 10 -4 parts by mass (2.17 × 10 -6 mol) of calcium acetate monohydrate as a catalyst were put into a reaction vessel, and the inside of the reaction apparatus was replaced with reduced-pressure nitrogen. Under a nitrogen atmosphere, the raw materials were stirred at 150 ° C. for about 10 minutes. In the step of the first stage of the reaction, the temperature was raised to 220 ° C over 30 minutes, and the reaction was carried out under normal pressure for 60 minutes. Then, the pressure was reduced from normal pressure to 13.3 kPa over 90 minutes, and the pressure was maintained at 13.3 kPa for 30 minutes. The generated phenol was extracted out of the reaction system. Then, in the second step of the reaction, the temperature of the heating medium was raised to 240 ° C. over 15 minutes, and the pressure was reduced to less than 0.10 kPa over 15 minutes, and the generated phenol was extracted out of the reaction system. After reaching a specific stirring torque, the nitrogen was returned to normal pressure to stop the reaction, the produced polyester carbonate was extruded in water, and the strands were cut to obtain pellets. Using the obtained pellets of polyester carbonate, various evaluations described above were performed. The evaluation results are shown in Table 1.

關於實施例1-1之聚酯碳酸酯,源自化合物3之寡聚茀結構單元之含量為27.0質量%,係少量,但相位差膜之波長色散(R450/R550)顯示0.835,反波長色散之顯現性為0.025,可理解為較高。進而,實施例1-1之聚酯碳酸酯之光彈性係數較低,玻璃轉移溫度為143℃,成為熔融加工性與耐熱性之平衡性優異之值。 Regarding the polyester carbonate of Example 1-1, the content of the oligomeric fluorene structural unit derived from Compound 3 was 27.0% by mass, which was a small amount, but the wavelength dispersion (R450 / R550) of the retardation film showed 0.835, and the reverse wavelength dispersion The visibility is 0.025, which can be understood as high. Furthermore, the polyester carbonate of Example 1-1 had a low photoelastic coefficient, a glass transition temperature of 143 ° C, and a value excellent in the balance between melt processability and heat resistance.

[比較例1-1] [Comparative Example 1-1]

使用1,2-雙[9-(2-苯氧基羰基乙基)茀-9-基]乙烷(化合物6)45.69質量份(0.070mol)、ISB 43.13質量份(0.295mol)、CHDM 15.64質量份(0.108mol)、DPC 72.36質量份(0.338mol)、乙酸鈣一水合物3.55×10-4質量份(2.02×10-6mol),除此以外,以與實施例1-1相同之方式進行合成,而獲得聚酯碳酸酯之顆粒物。使用所獲得之聚酯碳酸酯之顆粒物,進行上述之各種評估。將評估結果示於表1。 1,2-bis [9- (2-phenoxycarbonylethyl) fluorene-9-yl] ethane (compound 6) 45.69 parts by mass (0.070 mol), ISB 43.13 parts by mass (0.295 mol), CHDM 15.64 Except for parts by mass (0.108 mol), DPC 72.36 parts by mass (0.338 mol), and calcium acetate monohydrate 3.55 × 10 -4 parts by mass (2.02 × 10 -6 mol), the same as Example 1-1 was used. Synthesis was carried out in this manner to obtain pellets of polyester carbonate. Using the obtained pellets of polyester carbonate, various evaluations described above were performed. The evaluation results are shown in Table 1.

比較例1-1之聚酯碳酸酯亦反波長色散之顯現性較高,亦具有優異之機械物性,但光彈性特性較差。 The polyester carbonate of Comparative Example 1-1 also exhibited high reversibility of wavelength dispersion and had excellent mechanical properties, but its photoelastic properties were poor.

[比較例1-2] [Comparative Example 1-2]

使用雙[9-(3-羥基丙基)-茀-9-基]甲烷(化合物7)35.02質量份(0.076 mol)、ISB 40.75質量份(0.279mol)、CHDM 12.71質量份(0.088mol)、DPC 95.85質量份(0.447mol)、乙酸鈣一水合物3.90×10-4質量份(2.22×10-6mol),除此以外,以與實施例1-1相同之方式進行合成,而獲得聚碳酸酯之顆粒物。 Using bis [9- (3-hydroxypropyl) -fluoren-9-yl] methane (compound 7) 35.02 parts by mass (0.076 mol), ISB 40.75 parts by mass (0.279 mol), CHDM 12.71 parts by mass (0.088 mol), Except for DPC 95.85 parts by mass (0.447 mol) and calcium acetate monohydrate 3.90 × 10 -4 parts by mass (2.22 × 10 -6 mol), synthesis was performed in the same manner as in Example 1-1 to obtain a polymer. Carbonate particles.

使用所獲得之聚碳酸酯之顆粒物,進行上述之各種評估。將評估結果示於表1。 Using the obtained polycarbonate pellets, various evaluations described above were performed. The evaluation results are shown in Table 1.

比較例1-2之聚碳酸酯亦具有相對優異之特性,但反波長色散之顯現性較差。 The polycarbonate of Comparative Example 1-2 also has relatively excellent characteristics, but the visibility of the inverse wavelength dispersion is poor.

[比較例1-3] [Comparative Example 1-3]

使用1,2-雙[9-(3-羥基丙基)-茀-9-基]乙烷(化合物8)37.92質量份(0.080mol)、ISB 42.45質量份(0.290mol)、CHDM 8.47質量份(0.059mol)、DPC 92.84質量份(0.433mol)、乙酸鈣一水合物3.78×10-4質量份(2.15×10-6mol),除此以外,以與實施例1-1相同之方式進行合成而獲得聚碳酸酯之顆粒物。使用所獲得之聚碳酸酯之顆粒物,進行上述之各種評估。將評估結果示於表1。 1,2-bis [9- (3-hydroxypropyl) -fluoren-9-yl] ethane (compound 8) 37.92 parts by mass (0.080 mol), ISB 42.45 parts by mass (0.290 mol), and CHDM 8.47 parts by mass Except for (0.059 mol), 92.84 parts by mass (0.433 mol) of DPC, 3.78 × 10 -4 parts by mass (2.15 × 10 -6 mol) of calcium acetate monohydrate, the same procedure as in Example 1-1 was performed Synthesis to obtain polycarbonate particles. Using the obtained polycarbonate pellets, various evaluations described above were performed. The evaluation results are shown in Table 1.

比較例1-3之聚碳酸酯之反波長色散之顯現性或光彈性特性較差。 The polycarbonate of Comparative Examples 1-3 had poor visibility or photoelastic properties of inverse wavelength dispersion.

[比較例1-4] [Comparative Example 1-4]

使用雙(9-羥基甲基茀-9-基)甲烷(化合物9)28.19質量份(0.070mol)、ISB 42.45質量份(0.290mol)、CHDM 16.95質量份(0.118mol)、DPC 103.35質量份(0.482mol)、乙酸鈣一水合物1.68×10-3質量份(9.55×10-6mol),除此以外,以與實施例1-1相同之方式進行合成而獲得聚碳酸酯之顆粒物。使用所獲得之聚碳酸酯之顆粒物,進行上述之各種評估。將評估結果示於表1。 28.19 parts by mass (0.070 mol) of bis (9-hydroxymethylhydrazone-9-yl) methane (Compound 9), 42.45 parts by mass (0.290 mol), 16.95 parts by mass (0.118 mol) of CHDM, 103.35 parts by mass of DPC ( Except for 0.482 mol) and calcium acetate monohydrate (1.68 × 10 -3 parts by mass (9.55 × 10 -6 mol)), polycarbonate particles were obtained in the same manner as in Example 1-1. Using the obtained polycarbonate pellets, various evaluations described above were performed. The evaluation results are shown in Table 1.

化合物9係可導入與實施例1-1或比較例1-1~1-3中所使用之茀系單體相同之寡聚茀結構單元之化合物,使用化合物9之聚碳酸酯意外 地未顯現反波長色散性。推測其原因在於:化合物9之茀環未向垂直於延伸方向之方向配向。 Compound 9 is a compound in which the same oligomeric fluorene structure unit as the fluorene monomer used in Example 1-1 or Comparative Examples 1-1 to 1-3 can be introduced. The polycarbonate using compound 9 is unexpected. Ground does not exhibit inverse wavelength dispersion. The reason is speculated that the fluorene ring of compound 9 is not aligned in a direction perpendicular to the extending direction.

[比較例-5] [Comparative Example-5]

使用1,2-雙(9-羥基甲基茀-9-基)乙烷(化合物10)47.08質量份(0.112mol)、ISB 29.71質量份(0.203mol)、CHDM 12.71質量份(0.088mol)、DPC 87.40質量份(0.408mol)、乙酸鈣一水合物7.12×10-4質量份(4.04×10-6mol),除此以外,以與實施例1-1相同之方式進行合成而獲得聚碳酸酯之顆粒物。使用所獲得之聚碳酸酯之顆粒物,進行上述之各種評估。將評估結果示於表1。 47.08 parts by mass (0.112 mol) of 1,2-bis (9-hydroxymethylfluoren-9-yl) ethane (Compound 10), 29.71 parts by mass (0.203 mol) of ISB, 12.71 parts by mass (0.088 mol) of CHDM, Except for DPC 87.40 parts by mass (0.408 mol) and calcium acetate monohydrate 7.12 × 10 -4 parts by mass (4.04 × 10 -6 mol), synthesis was performed in the same manner as in Example 1-1 to obtain a polycarbonate. Ester particles. Using the obtained polycarbonate pellets, various evaluations described above were performed. The evaluation results are shown in Table 1.

本例之樹脂係與比較例1-4同樣地未顯現反波長色散性。 The resin system of this example did not exhibit reverse wavelength dispersion property similarly to Comparative Examples 1-4.

[比較例1-6] [Comparative Example 1-6]

使用1,2-雙(9-羥基甲基茀-9-基)丁烷(化合物12)32.13質量份(0.072mol)、ISB 43.30質量份(0.296mol)、CHDM 12.71質量份(0.088mol)、DPC 98.74質量份(0.461mol)、乙酸鈣一水合物8.04×10-4質量份(4.56×10-6mol),除此以外,以與實施例1-1相同之方式進行合成而獲得聚碳酸酯之顆粒物。使用所獲得之聚碳酸酯之顆粒物,進行上述之各種評估。將評估結果示於表1。 1,2-bis (9-hydroxymethylfluoren-9-yl) butane (Compound 12) 32.13 parts by mass (0.072 mol), ISB 43.30 parts by mass (0.296 mol), CHDM 12.71 parts by mass (0.088 mol), Except for DPC 98.74 parts by mass (0.461 mol) and calcium acetate monohydrate 8.04 × 10 -4 parts by mass (4.56 × 10 -6 mol), synthesis was performed in the same manner as in Example 1-1 to obtain a polycarbonate. Ester particles. Using the obtained polycarbonate pellets, various evaluations described above were performed. The evaluation results are shown in Table 1.

本例之樹脂係與比較例1-4同樣地未顯現反波長色散性。 The resin system of this example did not exhibit reverse wavelength dispersion property similarly to Comparative Examples 1-4.

[比較例1-7] [Comparative Example 1-7]

使用雙(9-羥基甲基茀-9-基)甲烷(化合物9)33.85質量份(0.084mol)、CHDM 28.97質量份(0.201mol)、CHDA 48.03質量份(0.279mol)、及作為觸媒之四正丁基鈦酸酯9.49×10-3質量份(2.79×10-5mol),除此以外,以與實施例1-6相同之方式進行合成而獲得聚酯之顆粒物。使用所獲得之聚酯之顆粒物,進行上述之各種評估。將評估結果示於表1。 33.85 parts by mass (0.084 mol) of bis (9-hydroxymethylfluoren-9-yl) methane (Compound 9), 28.97 parts by mass (0.201 mol) of CHDM, 48.03 parts by mass (0.279 mol) of CHDA, and a catalyst Tetra-n-butyl titanate was synthesized in the same manner as in Examples 1-6, except for 9.49 × 10 -3 parts by mass (2.79 × 10 -5 mol), to obtain a pellet of polyester. Using the pellets of the obtained polyester, various evaluations described above were performed. The evaluation results are shown in Table 1.

本例中,自比較例1-4之聚碳酸酯中所使用之化合物9合成聚酯, 但聚酯中亦未顯現反波長色散性。 In this example, a polyester was synthesized from Compound 9 used in the polycarbonates of Comparative Examples 1-4, However, the polyester does not exhibit reverse wavelength dispersion.

[比較例1-8] [Comparative Example 1-8]

使用α,α'-雙-(9-羥基甲基茀-9-基)-1,4-二甲苯(化合物13)38.00質量份(0.077mol)、ISB 33.96質量份(0.232mol)、CHDM 16.95質量份(0.118mol)、DPC 92.32質量份(0.431mol)、乙酸鈣一水合物7.52×10-4質量份(4.27×10-6mol),除此以外,以與實施例1-1相同之方式進行合成而獲得聚碳酸酯之顆粒物。使用所獲得之聚碳酸酯之顆粒物,進行上述之各種評估。將評估結果示於表1。 Α, α'-bis- (9-hydroxymethylfluoren-9-yl) -1,4-xylene (Compound 13) 38.00 parts by mass (0.077 mol), 33.96 parts by mass (0.232 mol), CHDM 16.95 Except for parts by mass (0.118 mol), DPC 92.32 parts by mass (0.431 mol), calcium acetate monohydrate 7.52 × 10 -4 parts by mass (4.27 × 10 -6 mol), and the same as those in Example 1-1 Synthesis was performed to obtain polycarbonate particles. Using the obtained polycarbonate pellets, various evaluations described above were performed. The evaluation results are shown in Table 1.

本例之樹脂係與比較例1-4同樣地未顯現反波長色散性。自比較例1-4~1-8之結果,可認為碳酸酯基或酯基所包含之羰基與茀環之距離影響反波長色散性之有無。若羰基與茀環之距離過近,則推測由於羰基之位阻而茀環無法向較佳之方向配向,而未顯現反波長色散性。 The resin system of this example did not exhibit reverse wavelength dispersion property similarly to Comparative Examples 1-4. From the results of Comparative Examples 1-4 to 1-8, it can be considered that the distance between the carbonyl group and the fluorene ring contained in the carbonate group or the ester group affects the presence or absence of inverse wavelength dispersion. If the distance between the carbonyl group and the fluorene ring is too close, it is presumed that the fluorene ring cannot be aligned in a better direction due to the steric hindrance of the carbonyl group, and the anti-wavelength dispersion property is not developed.

[比較例1-9] [Comparative Example 1-9]

使用雙-{[4-(2-羥基乙氧基)苯基]茀-9-基}乙烷(化合物15)37.46質量份(0.059mol)、ISB 39.05質量份(0.267mol)、CHDM 12.71質量份(0.088mol)、DPG 89.73質量份(0.419mol)、乙酸鈣一水合物7.31×10-4質量份(4.15×10-6mol),除此以外,以與實施例1-1相同之方式進行合成而獲得聚碳酸酯之顆粒物。使用所獲得之聚碳酸酯之顆粒物,進行上述之各種評估。將評估結果示於表1 Using bis-{[4- (2-hydroxyethoxy) phenyl] fluorene-9-yl} ethane (compound 15) 37.46 parts by mass (0.059 mol), ISB 39.05 parts by mass (0.267 mol), CHDM 12.71 parts by mass Except for parts (0.088 mol), DPG 89.73 parts by mass (0.419 mol), and calcium acetate monohydrate 7.31 × 10 -4 parts by mass (4.15 × 10 -6 mol), the same manner as in Example 1-1 was used. Synthesis was performed to obtain pellets of polycarbonate. Using the obtained polycarbonate pellets, various evaluations described above were performed. The evaluation results are shown in Table 1.

本例之樹脂之波長色散(R450/R550)之值接近1,而具有平面之波長色散性。於本例之樹脂中,推測若增加源自化合物15之結構單元之量,則顯現反波長色散性,但判斷反波長色散之顯現性較低。 The value of the wavelength dispersion (R450 / R550) of the resin in this example is close to 1, and it has flat wavelength dispersion. In the resin of this example, it is presumed that if the amount of the structural unit derived from Compound 15 is increased, the inverse wavelength dispersion is exhibited, but the inferior wavelength dispersion is judged to be low in appearance.

[比較例1-10] [Comparative Example 1-10]

使用茀-9,9-二乙醇(化合物16)32.66質量份(0.128mol)、ISB 54.34質量份(0.372mol)、DPC 109.30質量份(0.510mol)、乙酸鈣一水合物1.32×10-3質量份(7.50×10-6mol),除此以外,以與實施例1-1相同之方 式進行合成而獲得聚碳酸酯之顆粒物。使用所獲得之聚碳酸酯之顆粒物而進行上述之各種評估。將評估結果示於表1。 茀 -9,9-diethanol (Compound 16) 32.66 parts by mass (0.128 mol), ISB 54.34 parts by mass (0.372 mol), DPC 109.30 parts by mass (0.510 mol), calcium acetate monohydrate 1.32 × 10 -3 mass Except for parts (7.50 × 10 -6 mol), synthesis was performed in the same manner as in Example 1-1 to obtain pellets of polycarbonate. The above-mentioned various evaluations were performed using the obtained polycarbonate pellets. The evaluation results are shown in Table 1.

本例之樹脂顯現反波長色散性,但反波長色散性之顯現性較差,光彈性係數亦變高。又,於本例中,係聚合時或熔融製膜時之樹脂之發泡略多,而熱穩定性較差之情況。 The resin of this example exhibits inverse wavelength dispersion, but the inverse wavelength dispersion exhibits poor performance, and the photoelastic coefficient also becomes high. In addition, in this example, the resin foamed slightly during polymerization or melt-forming, and the thermal stability was poor.

[比較例1-11] [Comparative Example 1-11]

使用BHEPF 68.07質量份(0.155mol)、ISB 22.84質量份(0.156mol)、PEG 0.97質量份(9.75×10-4mol,DPC 67.60質量份(0.316mol)、乙酸鎂四水合物5.36×10-4質量份(2.50×10-6mol),除此以外,以與實施例1-1相同之方式進行合成而獲得聚碳酸酯之顆粒物。使用所獲得之聚碳酸酯之顆粒物,進行上述之各種評估。將評估結果示於表1。 68.07 parts by mass (0.155 mol) of BHEPF, 22.84 parts by mass (0.156 mol) of ISB, 0.97 parts by mass of PEG (9.75 × 10 -4 mol, 67.60 parts by mass (0.316 mol) of DPC, 5.36 × 10 -4 of magnesium acetate tetrahydrate Except for mass parts (2.50 × 10 -6 mol), a polycarbonate was obtained by synthesis in the same manner as in Example 1-1. Using the obtained polycarbonate particles, various evaluations described above were performed. The evaluation results are shown in Table 1.

本例之樹脂之源自BHEPF之結構單元之含量為67.8質量%,非常多,可理解為該結構單元之反波長色散之顯現性較差。又,光彈性係數亦成為較高之值。 The content of the structural unit derived from BHEPF of the resin in this example is 67.8% by mass, which is very large, and it can be understood that the reverse wavelength dispersion of the structural unit has poor visibility. In addition, the photoelastic coefficient becomes a higher value.

[比較例1-12] [Comparative Example 1-12]

使用BCF 41.17質量份(0.109mol)、SPG 51.59質量份(0.170mol)、DPC 63.19質量份(0.295mol)、乙酸鈣一水合物4.90×10-3質量份(2.78×10-5mol),且將最終聚合溫度設為260℃,除此以外,以與實施例1-1相同之方式進行合成而獲得聚碳酸酯之顆粒物。使用所獲得之聚碳酸酯之顆粒物,進行上述之各種評估。將評估結果示於表1。 41.17 parts by mass (0.109 mol) of BCF, 51.59 parts by mass (0.170 mol) of SPG, 63.19 parts by mass (0.295 mol) of DPC, 4.90 x 10 -3 parts by mass (2.78 x 10 -5 mol) of calcium acetate monohydrate, and A polycarbonate was obtained in the same manner as in Example 1-1 except that the final polymerization temperature was set to 260 ° C. Using the obtained polycarbonate pellets, various evaluations described above were performed. The evaluation results are shown in Table 1.

本例之樹脂雖然顯示出相對優異之光學特性,但所獲得之膜為非常脆而容易斷裂之韌性較差者。 Although the resin of this example shows relatively excellent optical characteristics, the obtained film is very brittle and easily fractured and has poor toughness.

於以下之實施例1-2~6、及比較例1-13~1-17中,使用更大型之聚合設備而合成樹脂,藉由熔融擠出法而製作長條之膜,對其各特性進行評估。此處,尤其於斷裂極限附近之條件下進行延伸,對延伸膜 之雙折射(配向性)進行評估。 In the following Examples 1-2 to 6 and Comparative Examples 1-13 to 1-17, synthetic resin was synthesized using larger polymerization equipment, and a long film was produced by the melt extrusion method, and its characteristics to evaluate. Here, the stretching is carried out especially under the conditions near the fracture limit, and the stretched film is stretched. The birefringence (alignment) is evaluated.

[實施例1-2] [Example 1-2]

使用包含具備攪拌翼及控制為100℃之回流冷卻器之縱型反應器之兩器的分批聚合裝置進行聚合。添加雙[9-(2-苯氧基羰基乙基)茀-9-基]甲烷(化合物3)36.94質量份(0.058mol)、ISB 64.02質量份(0.438mol)、DPC 82.43質量份(0.385mol)、及作為觸媒之乙酸鈣一水合物3.86×10-4質量份(2.19×10-6mol)。將反應器內進行減壓氮氣置換後,利用熱媒進行加溫,於內溫成為100℃之時間點開始攪拌。於升溫開始40分鐘後使內溫達到220℃,以保持該溫度之方式進行控制,同時開始減壓,到達220℃後於90分鐘內設為13.3kPa。將隨著聚合反應而副生成之苯酚蒸氣導入至100℃之回流冷卻器,將苯酚蒸氣中所包含之若干量之單體成分送回反應器中,未凝縮之苯酚蒸氣係導入45℃之凝縮器而加以回收。向第1反應器導入氮氣,暫時恢復至大氣壓後,將第1反應器內之經低聚物化之反應液移至第2反應器。繼而,開始第2反應器內之升溫及減壓,於50分鐘內設為內溫240℃、壓力0.2kPa。其後,進行聚合直至成為特定之攪拌動力。於達到特定動力之時間點向反應器導入氮氣而複壓,將所產生之聚酯碳酸酯於水中擠出,將股線切割而獲得顆粒物。 Polymerization was performed using a batch polymerization apparatus including two reactors with a vertical reactor having a stirring wing and a reflux cooler controlled at 100 ° C. Added bis [9- (2-phenoxycarbonylethyl) fluorene-9-yl] methane (compound 3) 36.94 parts by mass (0.058 mol), ISB 64.02 parts by mass (0.438 mol), DPC 82.43 parts by mass (0.385 mol ), And 3.86 × 10 -4 parts by mass (2.19 × 10 -6 mol) of calcium acetate monohydrate as a catalyst. After the inside of the reactor was purged with reduced-pressure nitrogen, it was heated with a heat medium, and stirring was started when the internal temperature became 100 ° C. After 40 minutes from the start of the temperature rise, the internal temperature was brought to 220 ° C, and the temperature was controlled to maintain the temperature. At the same time, the pressure was reduced. After reaching 220 ° C, it was set to 13.3 kPa in 90 minutes. The phenol vapor by-produced along with the polymerization reaction was introduced into a reflux cooler at 100 ° C, and a certain amount of monomer components contained in the phenol vapor was returned to the reactor. The uncondensed phenol vapor was introduced into the condensation at 45 ° C Device for recycling. After introducing nitrogen into the first reactor and temporarily returning to atmospheric pressure, the oligomerized reaction solution in the first reactor was transferred to the second reactor. Then, the temperature rise and pressure reduction in the second reactor were started, and the internal temperature was 240 ° C. and the pressure was 0.2 kPa in 50 minutes. Thereafter, polymerization is performed until a specific stirring power is obtained. At the time when the specific power was reached, nitrogen was introduced into the reactor and the pressure was increased. The produced polyester carbonate was extruded in water, and the strands were cut to obtain pellets.

使用上述之熔融擠出法,由所獲得之聚酯碳酸酯而製作長度3m、寬度200mm、厚度72μm之長條未延伸膜。繼而,藉由上述方法進行縱單軸延伸,於斷裂極限附近之條件下製作相位差膜。將各種評估之結果示於表2。 A long unstretched film having a length of 3 m, a width of 200 mm, and a thickness of 72 μm was produced from the obtained polyester carbonate by using the above-mentioned melt extrusion method. Then, longitudinal uniaxial stretching was performed by the method described above, and a retardation film was produced under the conditions near the breaking limit. The results of various evaluations are shown in Table 2.

本例之相位差膜顯示出反波長色散性,進而配向度、光彈性係數、耐熱性、韌性等所有特性優異。 The retardation film of this example exhibits inverse wavelength dispersion, and further has excellent properties such as alignment, photoelastic coefficient, heat resistance, and toughness.

[實施例1-3] [Example 1-3]

使用雙[9-(2-苯氧基羰基乙基)茀-9-基]甲烷(化合物3)38.06質量份 (0.059mol)、ISB 43.06質量份(0.295mol)、CHDM 20.28質量份(0.141mol)、DPC 81.46質量份(0.380mol)、乙酸鈣一水合物3.83×10-4質量份(2.18×10-6mol),且將未延伸膜之厚度設為66μm,除此以外,以與實施例1-2相同之方式製作相位差膜。將各種評估之結果示於表2。 Using bis [9- (2-phenoxycarbonylethyl) fluorene-9-yl] methane (compound 3) 38.06 parts by mass (0.059 mol), ISB 43.06 parts by mass (0.295 mol), CHDM 20.28 parts by mass (0.141 mol) ), DPC 81.46 parts by mass (0.380 mol), calcium acetate monohydrate 3.83 × 10 -4 parts by mass (2.18 × 10 -6 mol), and the thickness of the unstretched film is 66 μm. Example 1-2 produced a retardation film in the same manner. The results of various evaluations are shown in Table 2.

本例之相位差膜之雙折射之值大於實施例1-2,因此可理解為本例之相位差膜之聚合物之配向度較高。 The value of the birefringence of the retardation film of this example is larger than that of Embodiment 1-2, so it can be understood that the alignment degree of the polymer of the retardation film of this example is high.

[實施例1-4] [Example 1-4]

使用雙[9-(2-苯氧基羰基乙基)茀-9-基]甲烷(化合物3)31.02質量份(0.048mol)、ISB 43.08質量份(0.295mol)、TCDDM 25.26質量份(0.129mol)、DPC 81.26質量份(0.379mol)、乙酸鈣一水合物3.73×10-4質量份(2.12×10-6mol),且將未延伸膜之厚度設為73μm,除此以外,以與實施例1-2相同之方式製作相位差膜。將各種評估之結果示於表2。 Using bis [9- (2-phenoxycarbonylethyl) fluorene-9-yl] methane (compound 3) 31.02 parts by mass (0.048 mol), ISB 43.08 parts by mass (0.295 mol), TCDDM 25.26 parts by mass (0.129 mol ), DPC 81.26 parts by mass (0.379 mol), calcium acetate monohydrate 3.73 × 10 -4 parts by mass (2.12 × 10 -6 mol), and the thickness of the unstretched film is set to 73 μm. Example 1-2 produced a retardation film in the same manner. The results of various evaluations are shown in Table 2.

本例之相位差膜具有相對較高之配向性,且光彈性係數變低。 The retardation film of this example has relatively high alignment and a low photoelastic coefficient.

[實施例1-5] [Example 1-5]

使用雙[9-(2-苯氧基羰基乙基)茀-9-基]甲烷(化合物3)29.60質量份(0.046mol)、ISB 29.21質量份(0.200mol)、SPG 42.28質量份(0.139mol)、DPC 63.77質量份(0.298mol)、乙酸鈣一水合物1.19×10-2質量份(6.78×10-6mol),且將未延伸膜之厚度設為62μm,除此以外,以與實施例1-2相同之方式製作相位差膜。將各種評估之結果示於表2。 Using bis [9- (2-phenoxycarbonylethyl) fluorene-9-yl] methane (compound 3) 29.60 parts by mass (0.046 mol), ISB 29.21 parts by mass (0.200 mol), SPG 42.28 parts by mass (0.139 mol) ), DPC 63.77 parts by mass (0.298 mol), calcium acetate monohydrate 1.19 × 10 -2 parts by mass (6.78 × 10 -6 mol), and the thickness of the unstretched film is set to 62 μm. Example 1-2 produced a retardation film in the same manner. The results of various evaluations are shown in Table 2.

本例之相位差膜之雙折射與光彈性係數優於實施例1-2。 The birefringence and photoelastic coefficient of the retardation film of this example are better than those of Examples 1-2.

[實施例1-6] [Example 1-6]

使用雙[9-(2-苯氧基羰基乙基)茀-9-基]甲烷(化合物3)29.18質量份(0.046mol)、ISB 30.38質量份(0.208mol)、SPG 41.27質量份(0.136mol)、DPC 64.55質量份(0.298mol)、乙酸鈣一水合物1.21×10-2質量份(6.86×10-5mol),且將未延伸膜之厚度設為58μm,除此以外,以與實 施例1-2相同之方式製作相位差膜。將各種評估之結果示於表2。 Using bis [9- (2-phenoxycarbonylethyl) fluorene-9-yl] methane (compound 3) 29.18 parts by mass (0.046 mol), 30.38 parts by mass (0.208 mol), 41.27 parts by mass (0.136 mol) ), DPC 64.55 parts by mass (0.298 mol), calcium acetate monohydrate 1.21 × 10 -2 parts by mass (6.86 × 10 -5 mol), and the thickness of the unstretched film is set to 58 μm. Example 1-2 produced a retardation film in the same manner. The results of various evaluations are shown in Table 2.

本例之相位差膜之反波長色散性弱於實施例1-2,藉此可使雙折射之值大於實施例1-2,而可提高聚合物之配向度。本例之相位差膜之R450/R550之值較實施例1-2更遠離R450/R550之理想值,但於根據用途而重視膜之薄膜化之情形時,可較佳地使用實施例1-6之相位差膜。 The retardation of the retardation film of this example is weaker than that of Example 1-2, so that the value of birefringence can be greater than that of Example 1-2, and the alignment of the polymer can be improved. The value of R450 / R550 of the retardation film of this example is farther from the ideal value of R450 / R550 than that of Example 1-2. However, when the film thickness of the film is valued according to the application, Example 1- 6's retardation film.

[比較例1-13] [Comparative Example 1-13]

使用BHEPF 63.72質量份(0.145mol)、ISB 26.74質量份(0.183mol)、PEG 0.97質量份(9.75×10-4mol)、DPC 71.24質量份(0.333mol)、乙酸鎂四水合物7.06×10-4質量份(3.29×10-6mol),且將未延伸膜之厚度設為76μm,除此以外,以與實施例1-2相同之方式製作相位差膜。將各種評估之結果示於表2。 63.72 parts by mass using BHEPF (0.145mol), ISB 26.74 parts by mass (0.183mol), PEG 0.97 parts by mass (9.75 × 10 -4 mol), DPC 71.24 parts by mass (0.333mol), magnesium acetate tetrahydrate 7.06 × 10 - A retardation film was produced in the same manner as in Example 1-2 except that 4 parts by mass (3.29 × 10 -6 mol) and the thickness of the unstretched film was 76 μm. The results of various evaluations are shown in Table 2.

本例之相位差膜與實施例相比,可理解為其配向性、反波長色散之顯現性與光彈性係數較差。 Compared with the embodiment, the retardation film of this example can be understood to be inferior in alignment, inverse wavelength dispersion and photoelastic coefficient.

[比較例1-14] [Comparative Example 1-14]

使用BHEPF 68.07質量份(0.155mol)、ISB 22.84質量份(0.156mol)、PEG 0.97質量份(9.75×10-4mol)、DPC 67.60質量份(0.316mol)、乙酸鎂四水合物5.36×10-4質量份(2.50×10-6mol),且將未延伸膜之厚度設為87μm,除此以外,以與實施例1-2相同之方式製作相位差膜。將各種評估之結果示於表2。 68.07 parts by mass (0.155 mol) of BHEPF, 22.84 parts by mass (0.156 mol) of ISB, 0.97 parts by mass (9.75 × 10 -4 mol) of PEG, 67.60 parts by mass (0.316 mol) of DPC, 5.36 × 10 - magnesium acetate tetrahydrate A retardation film was produced in the same manner as in Example 1-2 except that 4 parts by mass (2.50 × 10 -6 mol) and the thickness of the unstretched film was 87 μm. The results of various evaluations are shown in Table 2.

本例之相位差膜之波長色散性較比較例1-13之波長色散性接近R450/R550之理想值,但藉由使反波長色散變強,而配向性降低,從而成為反波長色散之顯現性亦較差者。 The wavelength dispersion of the retardation film in this example is closer to the ideal value of R450 / R550 than the wavelength dispersion of Comparative Examples 1-13, but by making the inverse wavelength dispersion stronger and the alignment reduced, it becomes the manifestation of inverse wavelength dispersion. Those with poor sex.

[比較例1-15] [Comparative Example 1-15]

使用BCF 32.20質量份(0.085mol)、SPG 60.43質量份(0.199mol)、DPC 64.40質量份(0.301mol)、乙酸鈣一水合物5.00×10-3質量份 (2.84×10-5mol),且將最終聚合溫度設為260℃,將未延伸膜之厚度設為76μm,除此以外,以與實施例1-2相同之方式製作相位差膜。將各種評估之結果示於表2。 32.20 parts by mass (0.085 mol) of BCF, 60.43 parts by mass (0.199 mol) of SPG, 64.40 parts by mass (0.301 mol) of DPC, 5.00 × 10 -3 parts by mass (2.84 × 10 -5 mol) of calcium acetate monohydrate, and A retardation film was produced in the same manner as in Example 1-2 except that the final polymerization temperature was 260 ° C and the thickness of the unstretched film was 76 µm. The results of various evaluations are shown in Table 2.

本例之相位差膜具有配向性與反波長色散之顯現性較差,又膜較脆之缺點。 The retardation film of this example has the disadvantages of poor alignment and inverse wavelength dispersion, and the film is brittle.

[比較例1-16] [Comparative Example 1-16]

使用BHEPF 80.49質量份(0.184mol)、BPA 13.23質量份(0.058mol)、DPC 53.29質量份(0.249mol)、乙酸鈣一水合物2.13×10-3質量份(1.21×10-5mol),且將最終聚合溫度設為260℃,將未延伸膜之厚度設為98μm,除此以外,以與實施例1-2相同之方式製作相位差膜。將各種評估之結果示於表2。 BHEPF 80.49 parts by mass (0.184 mol), BPA 13.23 parts by mass (0.058 mol), DPC 53.29 parts by mass (0.249 mol), calcium acetate monohydrate 2.13 × 10 -3 parts by mass (1.21 × 10 -5 mol), and A retardation film was produced in the same manner as in Example 1-2 except that the final polymerization temperature was set to 260 ° C. and the thickness of the unstretched film was set to 98 μm. The results of various evaluations are shown in Table 2.

本例之相位差膜之雙折射大幅低於實施例。又,光彈性係數亦變大。因主鏈上之芳香族結構之量較多,故而用以顯現反色散性之芳香族成分之量亦必須較多,因此可認為導致光學特性之降低。 The birefringence of the retardation film of this example is significantly lower than that of the embodiment. Moreover, the photoelastic coefficient also becomes large. Since the amount of the aromatic structure on the main chain is large, the amount of the aromatic component used to express the anti-dispersion property must also be large, so it can be considered that the optical characteristics are reduced.

[比較例1-17] [Comparative Example 1-17]

使用BHEPF 86.84質量份(0.198mol)、DMT 14.95質量份(0.077mol)、DPC 28.90質量份(0.135mol)、四正丁基鈦酸酯1.35×10-2質量份(3.96×10-5mol),將最終聚合溫度設為260℃,將未延伸膜之厚度設為148μm,除此以外,以與實施例1-2相同之方式製作相位差膜。將各種評估之結果示於表2。 86.84 parts by mass (0.198 mol) of BHEPF, 14.95 parts by mass (0.077 mol) of DMT, 28.90 parts by mass (0.135 mol) of DPC, 1.35 × 10 -2 parts by mass (3.96 × 10 -5 mol) of tetra-n-butyl titanate A retardation film was produced in the same manner as in Example 1-2 except that the final polymerization temperature was 260 ° C. and the thickness of the unstretched film was 148 μm. The results of various evaluations are shown in Table 2.

本例之相位差膜之雙折射亦大幅低於實施例,光彈性係數亦變大。 The birefringence of the retardation film of this example is also significantly lower than that of the embodiment, and the photoelastic coefficient also becomes large.

《實施例2-1~2-2、參考例2-1~2-2》 "Examples 2-1 to 2-2, Reference examples 2-1 to 2-2"

本發明之三茀二酯之品質評估、及樹脂組合物與透明膜之特性評估係藉由下述方法進行。再者,特性評估方法並不限定於以下之方法,業者可適當進行選擇。 The quality evaluation of the tertiary diester of the present invention and the property evaluation of the resin composition and the transparent film were performed by the following methods. In addition, the characteristic evaluation method is not limited to the following methods, and the operator can select appropriately.

又,以下之合成例及實施例中所使用之化合物之縮寫等係如下所述。 The abbreviations and the like of the compounds used in the following Synthesis Examples and Examples are as follows.

ISB:異山梨酯(ROQUETTE FRERES公司製造,商品名:POLYSORB) ISB: Isosorbide (manufactured by ROQUETTE FRERES, trade name: POLYSORB)

DPC:碳酸二苯酯(三菱化學(股)製造) DPC: Diphenyl carbonate (manufactured by Mitsubishi Chemical Corporation)

CHDM:1,4-環己烷二甲醇(順式、反式混合物,SK化學公司製造) CHDM: 1,4-cyclohexanedimethanol (cis, trans mixture, manufactured by SK Chemicals)

SPG:螺二醇(三菱瓦斯化學(股)製造) SPG: Spirodiol (manufactured by Mitsubishi Gas Chemical Co., Ltd.)

BHEPF:9,9-雙[4-(2-羥基乙氧基)苯基]-茀(Osaka Gas Chemicals(股)製造) BHEPF: 9,9-bis [4- (2-hydroxyethoxy) phenyl] -fluorene (manufactured by Osaka Gas Chemicals)

THF:四氫呋喃(不含穩定劑,WAKO公司製造) THF: tetrahydrofuran (without stabilizer, manufactured by WAKO)

(1)寡聚茀單體之熱分解溫度(TG-DTA) (1) Thermal decomposition temperature of oligomeric fluorene monomer (TG-DTA)

寡聚茀單體之分解起始溫度、熔點係使用示差熱-熱重量同步分析裝置(SII NanoTechnology公司製造之TG-DTA 6300)進行測定。將分析試樣約4mg裝入同公司製造之鋁鍋並進行密封,於200mL/min之氮氣流下,以升溫速度10℃/min自室溫(20~30℃)升溫至600℃。根據所獲得之TG資料(熱重量資料),將減量舉動之低溫側基線外推基線與減量最大傾斜點之切線的交點溫度設為分解起始溫度。又,根據所獲得之TG資料(熱重量資料),將未發現試樣重量之減少,且觀察到陡峭之吸熱波峰之該峰頂設為試樣之熔點。 The decomposition starting temperature and melting point of the oligomeric fluorene monomer were measured using a differential thermal-thermogravimetric analyzer (TG-DTA 6300 manufactured by SII NanoTechnology). About 4 mg of the analysis sample was put into an aluminum pan manufactured by the same company and sealed, and the temperature was raised from room temperature (20 to 30 ° C) to 600 ° C at a temperature increase rate of 10 ° C / min under a nitrogen flow of 200 mL / min. According to the obtained TG data (thermogravimetric data), the temperature at the intersection of the extrapolated baseline of the low-temperature side baseline of the reduction movement and the tangent of the maximum tilt point of the reduction is set as the decomposition starting temperature. In addition, based on the obtained TG data (thermogravimetric data), the peak top of the sample where no decrease in sample weight was observed and a steep endothermic peak was observed was set as the melting point of the sample.

(2)樹脂組合物中之Na、K、Cs、Fe之含有比例 (2) Na, K, Cs, Fe content in the resin composition

將樹脂組合物試樣約0.5g準確稱量至PerkinElmer公司製造之微 波分解容器,添加97%硫酸(多摩化學製造之超高純度硫酸)2mL,設為密封狀態並於230℃下進行10分鐘微波加熱。冷卻至室溫(30℃以下)後,添加68%硝酸(多摩化學製超高純度硝酸)1.5mL,設為密封狀態並於150℃下進行10分鐘微波加熱後,再次進行冷卻直至室溫(30℃以下),添加68%硝酸2.5mL,再次設為密封狀態並於230℃下進行10分鐘微波加熱,使內容物完全分解。微波加熱器係使用PerkinElmer公司製造之Multiwave 3000,於300W至1000W間調整輸出,藉此調整溫度。冷卻至室溫(30℃以下)後,利用純水稀釋上述中所獲得之液,利用Thermo Fisher Scientific公司製造之ICP-MS進行定量。 Approximately 0.5 g of the resin composition sample was accurately weighed to a micrometer manufactured by PerkinElmer In a wave decomposition container, 2 mL of 97% sulfuric acid (ultra-high purity sulfuric acid manufactured by Tama Chemicals) was added, and the container was sealed and subjected to microwave heating at 230 ° C for 10 minutes. After cooling to room temperature (30 ° C or lower), 1.5 mL of 68% nitric acid (ultra-high purity nitric acid manufactured by Tama Chemicals) was added, the sealed state was set, and microwave heating was performed at 150 ° C for 10 minutes, followed by cooling to room temperature ( 30 ° C or lower), and added 2.5 mL of 68% nitric acid, sealed again, and microwave-heated at 230 ° C for 10 minutes to completely decompose the contents. The microwave heater is a Multiwave 3000 manufactured by PerkinElmer. The temperature is adjusted by adjusting the output between 300W and 1000W. After cooling to room temperature (30 ° C or lower), the liquid obtained in the above was diluted with pure water, and quantified by ICP-MS manufactured by Thermo Fisher Scientific.

(3)樹脂組合物中之殘留單羥基化合物 (3) Residual monohydroxy compounds in the resin composition

精確稱量樹脂組合物試樣約1g,溶解於二氯甲烷5mL後,以總量成為25mL之方式添加丙酮。利用0.2μm盤式過濾器將溶液進行過濾,利用液體層析法進行苯酚之定量後,算出含有比例。 About 1 g of a sample of the resin composition was accurately weighed, dissolved in 5 mL of dichloromethane, and acetone was added so that the total amount became 25 mL. The solution was filtered through a 0.2 μm disc filter, and quantification of phenol by liquid chromatography was performed to calculate the content ratio.

(4)膜之韌性(彎曲試驗) (4) Toughness of the film (bending test)

利用上述熱壓之方法將厚度100~200μm之膜成形,自該膜製作長度40mm、寬度10mm之長方形之試片。將老虎鉗之左右之接合面之間隔打開40mm,將試片之兩端固定為接合面內。繼而使左右之接合面之間隔以2mm/秒以下之速度變窄,不使膜伸出老虎鉗之接合面外,並且將彎曲成ㄑ字之膜整體於該接合面內進行壓縮。將接合面間完全密接前試片於彎曲部斷裂成2片(或3片以上之碎片)之情形設為「有斷裂」,將即便接合面間完全密接試片亦未斷裂而彎曲之情形設為「未斷裂」。針對相同種類之膜,反覆5次實施試驗,將其中4次以上成為「有斷裂」者設為「×:脆性破壞」,將3次以下成為「有斷裂」者設為「○:未脆性破壞」。 A film having a thickness of 100 to 200 μm is formed by the above-mentioned hot pressing method, and a rectangular test piece with a length of 40 mm and a width of 10 mm is produced from the film. Open the gap between the left and right joint surfaces by 40mm, and fix both ends of the test piece into the joint surface. Then, the interval between the left and right joining surfaces is narrowed at a speed of 2 mm / sec or less, so that the film does not protrude beyond the joining surface of the vise, and the entire film bent into a zigzag shape is compressed inside the joining surface. The case where the test piece was broken into two pieces (or three or more pieces) at the bending portion before the full contact between the joint surfaces was set as "fractured", and the case where the test piece was not broken and was bent even if the test surface was completely contacted between the joint surfaces was set. "Unbroken". For the same type of film, the test was repeated 5 times, and those who became "fractured" 4 or more times were set to "×: brittle failure", and those who were "fractured" 3 or less times were set to "○: no brittle failure ".

(5)折射率及阿貝數之測定 (5) Measurement of refractive index and Abbe number

自利用上述熱壓之方法取得之膜,切下長度40mm、寬度8mm 之長方形之試片而製成測定試樣。利用多波長阿貝折射率計(Atago股份有限公司製造之DR-M4/1550),使用波長656nm(C線)、589nm(D線)、486nm(F線)之干涉濾光器,對各波長之折射率、nC、nD、nF進行測定。測定係使用單溴萘作為界面液,並於20℃下進行。阿貝數νd係利用下式進行計算。 From the film obtained by the above hot-pressing method, cut out a length of 40mm and a width of 8mm A rectangular test piece is made into a measurement sample. Using a multi-wavelength Abbe refractometer (DR-M4 / 1550 manufactured by Atago Co., Ltd.), interference filters with wavelengths of 656 nm (C line), 589 nm (D line), and 486 nm (F line) are used. The refractive index, nC, nD, and nF were measured. The measurement was performed at 20 ° C using monobromonaphthalene as the interface liquid. The Abbe number νd is calculated using the following formula.

νd=(1-nD)/(nC-nF) νd = (1-nD) / (nC-nF)

阿貝數越大,表示折射率之波長依存性越小。 The larger the Abbe number, the smaller the wavelength dependence of the refractive index.

樹脂組合物之還原黏度、玻璃轉移溫度、熔融黏度、光彈性係數之測定係與上述之實施例1-1相同。 The reduction viscosity, glass transition temperature, melt viscosity, and photoelastic coefficient of the resin composition were measured in the same manner as in Example 1-1 described above.

<實施例2-1> <Example 2-1>

雙{[9-(2-乙氧基羰基乙基)茀-9-基]-甲基}茀(化合物3)、及雙[9-(2-乙氧基羰基乙基)茀-9-基]甲烷(化合物2)之合成 Bis {[9- (2-ethoxycarbonylethyl) fluorene-9-yl] -methyl} fluorene (Compound 3), and bis [9- (2-ethoxycarbonylethyl) fluorene-9- Of methane] methane (compound 2)

向1L可分離式燒瓶添加雙(茀-9-基)甲烷(化合物1)35.0g(102mmol)、THF 175mL,於氮氣環境下於15℃下進行攪拌。添加50wt%氫氧化鈉水溶液28.68g、氯化苄基三乙基銨4.61g(20.2mL)後,攪拌15分鐘。歷時60分鐘添加丙烯酸乙酯22.4mL(224mmol)後,於16℃下熟化2小時。進行反應結束時間點之HPLC分析,結果化合物2(13.5min)為75.3面積%,化合物3(15.2min)為8.4面積%。利用3N鹽酸進行中和後,進行分液而將水層去除。此時添加甲苯70mL,利用水105mL對有機層洗淨5次。向有機層添加甲苯35mL、THF 35mL後,保持內溫60℃以上並且加熱、減壓濃縮直至70mL。添加甲苯35mL 後,放置冷卻至45℃,添加甲醇210mL,進行雙[9-(2-乙氧基羰基乙基)茀-9-基]甲烷(化合物2)之晶析。將晶析物進行過濾,將濾液於室溫下靜置數日,藉由過濾而回收所產生之雙{[9-(2-乙氧基羰基乙基)茀-9-基]-甲基}茀(化合物3)之白色結晶。 A 1 L separable flask was charged with 35.0 g (102 mmol) of bis (fluoren-9-yl) methane (compound 1) and 175 mL of THF, and the mixture was stirred at 15 ° C. under a nitrogen atmosphere. After adding 28.68 g of a 50% by weight aqueous sodium hydroxide solution and 4.61 g (20.2 mL) of benzyltriethylammonium chloride, the mixture was stirred for 15 minutes. After adding 22.4 mL (224 mmol) of ethyl acrylate over 60 minutes, it was aged at 16 ° C. for 2 hours. When HPLC analysis was performed at the reaction end time point, Compound 2 (13.5 min) was 75.3 area%, and Compound 3 (15.2 min) was 8.4 area%. After neutralization with 3N hydrochloric acid, liquid separation was performed to remove the aqueous layer. At this time, 70 mL of toluene was added, and the organic layer was washed 5 times with 105 mL of water. After adding 35 mL of toluene and 35 mL of THF to the organic layer, the solution was heated to an internal temperature of 60 ° C. or higher and concentrated under reduced pressure to 70 mL. Add toluene 35mL Then, it was left to cool to 45 ° C, and 210 mL of methanol was added to perform crystallization of bis [9- (2-ethoxycarbonylethyl) fluorene-9-yl] methane (compound 2). The crystallized product was filtered, and the filtrate was allowed to stand at room temperature for several days, and the produced bis {[9- (2-ethoxycarbonylethyl) fluorene-9-yl] -methyl was recovered by filtration. } White crystals of hydrazone (compound 3).

雙[9-(2-乙氧基羰基乙基)茀-9-基]甲烷(化合物2):37.47g(68.7mmol,產率:67.6%),白色粉末 Bis [9- (2-ethoxycarbonylethyl) fluorene-9-yl] methane (compound 2): 37.47 g (68.7 mmol, yield: 67.6%), white powder

HPLC分析結果化合物2(13.5min):91.7面積%,化合物3(15.2min):5.2面積% HPLC analysis results Compound 2 (13.5min): 91.7% area%, Compound 3 (15.2min): 5.2 area%

1H-NMR(400MHz,CDCl3)δ 7.03(d,J=7.6Hz,4H),6.97(dt,J1=7.6Hz,J2=1.5Hz,4H),6.82(dt,J1=7.6Hz,J2=1.3Hz,4H),6.77(d,J=7.6Hz,4H),3.88(q,J=7.1Hz,4H),3.12(s,2H),2.23(m,4H),1.13(m,4H),1,02(t,J=7.1Hz,6H). 1 H-NMR (400MHz, CDCl 3 ) δ 7.03 (d, J = 7.6Hz, 4H), 6.97 (dt, J1 = 7.6Hz, J2 = 1.5Hz, 4H), 6.82 (dt, J1 = 7.6Hz, J2 = 1.3Hz, 4H), 6.77 (d, J = 7.6Hz, 4H), 3.88 (q, J = 7.1Hz, 4H), 3.12 (s, 2H), 2.23 (m, 4H), 1.13 (m, 4H ), 1,02 (t, J = 7.1Hz, 6H).

分解起始溫度(氮氣環境下):295℃ Decomposition starting temperature (under nitrogen environment): 295 ℃

m.p.:141℃ m.p .: 141 ℃

雙{[9-(2-乙氧基羰基乙基)茀-9-基]-甲基}茀(化合物3):0.20g(0.3mmol,產率:0.3%),白色結晶 Bis [[9- (2-ethoxycarbonylethyl) fluorene-9-yl] -methyl} fluorene (Compound 3): 0.20 g (0.3 mmol, yield: 0.3%), white crystals

HPLC分析結果化合物2(13.5min):3.5面積%,化合物3(15.2min):92.6面積% HPLC analysis results Compound 2 (13.5min): 3.5 area%, Compound 3 (15.2min): 92.6 area%

1H-NMR(400MHz,CDCl3)δ 6.91-6.95(m,H),6.86-6.89(m,4H),6.68-6.70(m,4H),6.62-6.65(m,2H),6.57-6.59(m,4H),6.40-6.42(m,2H),6.30-6.34(m,2H),6.22-6.24(m,2H),3.80(q,7.1Hz,4H),2.93(s,4H),2.06(m,4H),1.00(m,10H) 1 H-NMR (400MHz, CDCl 3 ) δ 6.91-6.95 (m, H), 6.86-6.89 (m, 4H), 6.68-6.70 (m, 4H), 6.62-6.65 (m, 2H), 6.57-6.59 (m, 4H), 6.40-6.42 (m, 2H), 6.30-6.34 (m, 2H), 6.22-6.24 (m, 2H), 3.80 (q, 7.1Hz, 4H), 2.93 (s, 4H), 2.06 (m, 4H), 1.00 (m, 10H)

分解起始溫度(氮氣環境下):364℃ Decomposition starting temperature (under nitrogen environment): 364 ℃

m.p.:166℃ m.p .: 166 ℃

再者,反應結束後,晶析及過濾後之HPLC均於以下之條件下實施。 After completion of the reaction, HPLC after crystallization and filtration was performed under the following conditions.

管柱:Inertsil ODS-3V 150mm×4.8mm Column: Inertsil ODS-3V 150mm × 4.8mm

溫度:40℃ Temperature: 40 ° C

溶離液條件:0-5min:四氫呋喃/水=50/50,20min:四氫呋喃/水=100/0 Dissolution conditions: 0-5min: tetrahydrofuran / water = 50/50, 20min: tetrahydrofuran / water = 100/0

流速:1.0ml/min Flow rate: 1.0ml / min

注入量:2μl Injection volume: 2μl

<實施例2-2> <Example 2-2>

雙{[9-(2-苯氧基羰基乙基)茀-9-基]-甲基}茀(化合物5)、及雙[9-(2-苯氧基羰基乙基)茀-9-基]甲烷(化合物4)之合成 Bis {[9- (2-phenoxycarbonylethyl) fluorene-9-yl] -methyl} fluorene (compound 5), and bis [9- (2-phenoxycarbonylethyl) fluorene-9- Of methane] methane (compound 4)

於1L可分離式燒瓶中,向含有雙[9-(2-乙氧基羰基乙基)茀-9-基]甲烷(化合物2,84.1g,154.5mmol)及、雙{[9-(2-乙氧基羰基乙基)茀-9-基]-甲基}茀(化合物3,3.3g,6.9mmol)之四氫呋喃/鄰二甲苯混合溶液添加碳酸二苯酯(147.5g,5685.5mmol)後,將內溫慢慢地升溫室104℃,其後,減壓至3kPa,將溶劑蒸餾去除。進行複壓,添加原鈦酸四異丙酯(2.45g,8.61mmol),再次減壓至3kPa,慢慢地升溫至184℃,將反應餾出物蒸餾去除。達到184℃後,反應3hr後,降溫至90℃,進行複壓,藉由HPLC分析而確認反應之進行。添加鄰二甲苯(144ml),降溫至41℃,結果發現結晶之析出。向40℃冷卻後,添加甲醇(356mL),進而冷卻至5℃後,進行抽氣過濾。使所獲得之粗結晶分散於鄰二甲苯(272mL),添加水(0.32g)後,升溫至80℃,並進行溶解。利用水(240mL)將有機層洗淨2次後,利用PTFE薄膜過濾器(0.5μm)進行加壓過濾(0.25MPa)。其後,利用蒸發器將溶劑110g蒸 餾去除後,降溫至50℃,結果發現結晶之析出。進而冷卻至40℃後,添加甲醇(336mL),冷卻至室溫(20℃)後,進行抽氣過濾,於80℃下減壓乾燥至成為恆量,藉此獲得作為白色固體之雙[9-(2-苯氧基羰基乙基)茀-9-基]甲烷(化合物4)59.9g(產率:55.6%,46.8mmol)、與雙{[9-(2-苯氧基羰基乙基)茀-9-基]-甲基}茀(化合物5)0.2g(產率:2.2%,0.15mmol)之混合物。 In a 1 L separable flask, bis [9- (2-ethoxycarbonylethyl) fluorene-9-yl] methane (Compound 2, 84.1 g, 154.5 mmol) and bis {[9- (2 -Ethoxycarbonylethyl) fluorene-9-yl] -methyl} fluorene (Compound 3, 3.3 g, 6.9 mmol) in a tetrahydrofuran / o-xylene mixed solution After adding diphenyl carbonate (147.5 g, 5685.5 mmol) The internal temperature was gradually raised to 104 ° C in the greenhouse, and thereafter, the pressure was reduced to 3 kPa, and the solvent was distilled off. After recompression, tetraisopropyl orthotitanate (2.45 g, 8.61 mmol) was added, the pressure was reduced to 3 kPa again, and the temperature was gradually raised to 184 ° C. to distill off the reaction distillate. After reaching 184 ° C, the reaction was carried out for 3 hours, and then the temperature was lowered to 90 ° C, followed by repressurization, and the progress of the reaction was confirmed by HPLC analysis. When ortho-xylene (144 ml) was added and the temperature was lowered to 41 ° C, precipitation of crystals was found. After cooling to 40 ° C, methanol (356 mL) was added, and after further cooling to 5 ° C, suction filtration was performed. The obtained crude crystals were dispersed in o-xylene (272 mL), water (0.32 g) was added, and then the temperature was raised to 80 ° C. to be dissolved. The organic layer was washed twice with water (240 mL), and then subjected to pressure filtration (0.25 MPa) using a PTFE membrane filter (0.5 μm). Thereafter, 110 g of the solvent was distilled using an evaporator. After removal by distillation, the temperature was lowered to 50 ° C, and as a result, precipitation of crystals was found. After further cooling to 40 ° C, methanol (336 mL) was added, and after cooling to room temperature (20 ° C), suction filtration was performed, and the solution was dried under reduced pressure at 80 ° C to a constant amount, thereby obtaining bis [9- (2-phenoxycarbonylethyl) fluorene-9-yl] methane (compound 4) 59.9 g (yield: 55.6%, 46.8 mmol), and bis {[9- (2-phenoxycarbonylethyl) A mixture of fluorene-9-yl] -methyl} fluorene (compound 5) 0.2 g (yield: 2.2%, 0.15 mmol).

HPLC分析結果化合物4(15.3min):98.17面積%、化合物5(16.5min):0.15面積% HPLC analysis results Compound 4 (15.3min): 98.17 area%, Compound 5 (16.5min): 0.15% area

再者,反應結束後,晶析及過濾後之HPLC均於以下之條件下實施。 After completion of the reaction, HPLC after crystallization and filtration was performed under the following conditions.

管柱:Inertsil ODS-3V 150mm×4.8mm Column: Inertsil ODS-3V 150mm × 4.8mm

溫度:40℃ Temperature: 40 ° C

溶離液條件:0-5min:四氫呋喃/水=50/50,20min:四氫呋喃/水=100/0 Dissolution conditions: 0-5min: tetrahydrofuran / water = 50/50, 20min: tetrahydrofuran / water = 100/0

流速:1.0ml/min Flow rate: 1.0ml / min

注入量:2μl Injection volume: 2μl

1H-NMR測定結果化合物4 1 H-NMR measurement result Compound 4

1H-NMR(400MHz,CDCl3)δ 7.23-7.28(m,4H),7.07-7.16(m,6H),7.03(dt,J1=6.9Hz,J2=2.0,4H),6.78-6.90(m,12H),3.20(s,2H),2.37(t,J=8.3Hz,4H),1.40(t,J=8.3Hz,4H). 1 H-NMR (400MHz, CDCl 3 ) δ 7.23-7.28 (m, 4H), 7.07-7.16 (m, 6H), 7.03 (dt, J1 = 6.9Hz, J2 = 2.0, 4H), 6.78-6.90 (m , 12H), 3.20 (s, 2H), 2.37 (t, J = 8.3Hz, 4H), 1.40 (t, J = 8.3Hz, 4H).

m.p.(化合物4):176℃ m.p. (Compound 4): 176 ° C

LC/MS測定結果 LC / MS measurement results

化合物4(13.1min):(Exact Mass)640 Compound 4 (13.1min): (Exact Mass) 640

(Positive)663[M+Na]+、679(M+K]+、(Negative}639[M-H]- (Positive) 663 [M + Na] + , 679 (M + K] + , (Negative) 639 [MH] -

化合物5(14.2min):(Exact Mass)818 Compound 5 (14.2min): (Exact Mass) 818

(Positive)841[M+Na]+、875[M+K]+、(Negative)817[M-H]- (Positive) 841 [M + Na] + , 875 [M + K] + , (Negative) 817 [MH] -

再者,LC-MS測定條件係於以下之條件下實施。 The LC-MS measurement conditions were performed under the following conditions.

LC系統:Agilent 1200 LC system: Agilent 1200

管柱:Inertsil ODS-3 5μm 4.6×150mm No.2EI85047 Column: Inertsil ODS-3 5μm 4.6 × 150mm No. 2EI85047

溫度:40℃ Temperature: 40 ° C

溶離液條件:0-5min:四氫呋喃/水=50/50,20min:四氫呋喃/水=100/0 Dissolution conditions: 0-5min: tetrahydrofuran / water = 50/50, 20min: tetrahydrofuran / water = 100/0

流速:1.0ml/min Flow rate: 1.0ml / min

注入量:0.2μl Injection volume: 0.2 μl

質量分析裝置:Agilent LC/MS 6130 Mass analysis device: Agilent LC / MS 6130

離子模式:AJS(Positive/Negative) Ion mode: AJS (Positive / Negative)

毛細管電壓(Capillary Voltage):4500V(P/N) Capillary Voltage: 4500V (P / N)

裂解電壓(Fragment Voltage):100V Fragment Voltage: 100V

質量範圍(Mass Range):m/z=100-1500 Mass Range: m / z = 100-1500

驅動氣體(Driving gas):N2、DG=12L/min、NP=60psi、DGT=300℃ Driving gas: N 2 , DG = 12L / min, NP = 60psi, DGT = 300 ℃

其他條件:SG=12L/min、ST=300℃、NV=1000 Other conditions: SG = 12L / min, ST = 300 ℃, NV = 1000

[聚合物之合成例] [Synthesis example of polymer]

<合成例2-1> <Synthesis Example 2-1>

將含有雙{[9-(2-乙氧基羰基乙基)茀-9-基]-甲基}茀(化合物3)0.05質量份(0.0001莫耳)之雙[9-(2-乙氧基羰基乙基)茀-9-基]甲烷(化合物2)26.44質量份(0.0489莫耳)、CHDM 10.37質量份(0.072莫耳)及作為觸媒之鈦酸四正丁酯14.65×10-3質量份(4.30×10-5莫耳)投入反應容器,於氮氣環境下,於220℃下且於常壓下反應120分鐘。繼而,歷時30分鐘將壓力減壓至13.3kPa,於13.3kPa下保持30分鐘,將所產生之乙醇向反應容器外抽出。其後,將反應液暫時冷卻至室溫(20℃),將ISB 31.43質量份(0.215莫耳)、DPC 51.66質量份(0.241莫耳)投入相同之反 應容器,於氮氣環境下,將加熱槽溫度設為150℃,視需要進行攪拌,並且使原料溶解(約10分鐘)。溶解後,於反應第1階段之步驟中歷時30分鐘升溫至220℃,於常壓下反應60分鐘。繼而歷時90分鐘將壓力自常壓減壓至13.3kPa,於13.3kPa下保持30分鐘,將所產生之苯酚向反應容器外抽出。 Bis [9- (2-ethoxy) containing 0.05 parts by mass (0.0001 moles) of bis {[9- (2-ethoxycarbonylethyl) fluorene-9-yl] -methyl} fluorene (Compound 3) Carbonylcarbonylethyl) fluoren-9-yl] methane (compound 2) 26.44 parts by mass (0.0489 moles), CHDM 10.37 parts by mass (0.072 moles) and tetra-n-butyl titanate as a catalyst 14.65 × 10 -3 A mass part (4.30 × 10 -5 mol) was put into a reaction vessel, and reacted at 220 ° C. under a nitrogen atmosphere for 120 minutes at normal pressure. Then, the pressure was reduced to 13.3 kPa over 30 minutes, and the pressure was maintained at 13.3 kPa for 30 minutes, and the generated ethanol was drawn out of the reaction vessel. Thereafter, the reaction solution was temporarily cooled to room temperature (20 ° C), and 31.43 parts by mass (0.215 moles) and 51.66 parts by mass of DPC (0.241 moles) were put into the same reaction vessel. The heating tank was placed under a nitrogen atmosphere. The temperature was set to 150 ° C., and if necessary, the raw materials were dissolved (about 10 minutes). After the dissolution, the temperature was raised to 220 ° C. over 30 minutes in the first step of the reaction, and the reaction was carried out at normal pressure for 60 minutes. Then, the pressure was reduced from normal pressure to 13.3 kPa over 90 minutes, and kept at 13.3 kPa for 30 minutes, and the generated phenol was extracted out of the reaction vessel.

繼而於反應第2階段之步驟中歷時15分鐘使加熱槽之溫度升溫至240℃,並且歷時15分鐘將壓力減壓至0.10kPa以下,將所產生之苯酚向反應容器外抽出。達到特定之轉矩後,結束反應,將所產生之聚合物於水中擠出,而獲得聚碳酸酯樹脂之顆粒物。 Then, in the step of the second stage of the reaction, the temperature of the heating tank was raised to 240 ° C for 15 minutes, and the pressure was reduced to 0.10 kPa or less for 15 minutes, and the generated phenol was drawn out of the reaction vessel. After reaching a specific torque, the reaction is ended, and the polymer produced is extruded in water to obtain pellets of polycarbonate resin.

將所獲得之樹脂組合物之玻璃轉移溫度等、進行膜成形並延伸時之延伸膜之折射率各向異性、相位差比(Re450/Re550)、膜之韌性等之測定結果示於表3。 Table 3 shows the measurement results of the glass transition temperature and the like of the obtained resin composition, refractive index anisotropy, retardation ratio (Re450 / Re550), and film toughness of the stretched film when the film is formed and stretched.

<合成例2-2> <Synthesis example 2-2>

將含有雙{[9-(2-苯氧基羰基乙基)茀-9-基]-甲基}茀(化合物5)0.1質量份(0.0001莫耳)之雙[9-(2-苯氧基羰基乙基)茀-9-基]甲烷(化合物4)29.5質量份(0.0458莫耳)、SPG 30.20質量份(0.099莫耳)、ISB 40.34質量份(0.276莫耳)、DPC 70.49質量份(0.329莫耳)及作為觸媒之乙酸鈣一水合物9.91×10-4質量份(5.63×10-6莫耳)投入反應容器,於氮氣環境下,將加熱槽溫度設為150℃,視需要進行攪拌,並且使原料溶解(約10分鐘)。溶解後,於反應第1階段之步驟中,歷時30分鐘升溫至220℃,於常壓下反應60分鐘。繼而歷時90分鐘將壓力自常壓減壓至13.3kPa,於13.3kPa下保持15分鐘,將所產生之苯酚向反應容器外抽出。 Bis [9- (2-phenoxy) containing 0.1 parts by mass (0.0001 moles) of bis {[9- (2-phenoxycarbonylethyl) fluorene-9-yl] -methyl} fluorene (Compound 5) Carbonylcarbonylethyl) fluoren-9-yl] methane (compound 4) 29.5 parts by mass (0.0458 moles), SPG 30.20 parts by mass (0.099 moles), ISB 40.34 parts by mass (0.276 moles), DPC 70.49 parts by mass ( 0.329 mol) and 9.91 × 10 -4 parts by mass (5.63 × 10 -6 mol) of calcium acetate monohydrate as a catalyst, put them into the reaction vessel, and set the temperature of the heating tank to 150 ° C in a nitrogen environment, as required Stir and dissolve the raw material (about 10 minutes). After dissolving, in the step of the first stage of the reaction, the temperature was raised to 220 ° C. over 30 minutes, and the reaction was performed at normal pressure for 60 minutes. Then, the pressure was reduced from normal pressure to 13.3 kPa over 90 minutes, and the pressure was maintained at 13.3 kPa for 15 minutes. The generated phenol was extracted out of the reaction vessel.

繼而,於反應第2階段之步驟中,歷時15分鐘使加熱槽之溫度升溫至245℃,並且歷時15分鐘將壓力減壓至0.10kPa以下,將所產生之苯酚向反應容器外抽出。達到特定之轉矩後,使反應結束,將所產生 之聚合物於水中擠出,而獲得聚酯碳酸酯之顆粒物。 Then, in the second step of the reaction, the temperature of the heating tank was raised to 245 ° C. for 15 minutes, and the pressure was reduced to less than 0.10 kPa over 15 minutes, and the generated phenol was drawn out of the reaction vessel. When a certain torque is reached, the reaction is ended and the generated The polymer was extruded in water to obtain pellets of polyester carbonate.

將所獲得之樹脂組合物之玻璃轉移溫度等、進行膜成形並延伸時之延伸膜之折射率各向異性、相位差比(Re450/Re550)、膜之韌性等之測定結果示於表3。 Table 3 shows the measurement results of the glass transition temperature and the like of the obtained resin composition, refractive index anisotropy, retardation ratio (Re450 / Re550), and film toughness of the stretched film when the film is formed and stretched.

<參考例2-1> <Reference Example 2-1>

將雙[9-(2-乙氧基羰基乙基)茀-9-基]甲烷(化合物2)22.65質量份(0.042mol)、CHDM 10.77質量份(0.075mol)及作為觸媒之鈦酸四正丁酯15.54×10-3質量份(4.57×10-5mol)投入反應容器,於氮氣環境下,於220℃下並於常壓下反應120分鐘。繼而,歷時30分鐘將壓力減壓至13.3kPa,於13.3kPa下保持30分鐘,將所產生之乙醇向反應容器外抽出。其後,將反應液暫時冷卻至室溫,將ISB 33.58質量份(0.230mol)、DPC 56.96質量份(0.266mol)投入相同之反應容器,於氮氣環境下,將加熱槽溫度設為150℃,視需要進行攪拌,並且使原料溶解(約10分鐘)。溶解後,於反應第1階段之步驟中歷時30分鐘升溫至220℃,於常壓下反應60分鐘。繼而歷時90分鐘將壓力自常壓減壓至13.3kPa,於13.3kPa下保持30分鐘,將所產生之苯酚向反應容器外抽出。 Bis [9- (2-ethoxycarbonylethyl) fluorene-9-yl] methane (compound 2) 22.65 parts by mass (0.042 mol), CHDM 10.77 parts by mass (0.075 mol), and tetratitanate as a catalyst 15.54 × 10 -3 parts by mass (4.57 × 10 -5 mol) of n-butyl ester was charged into a reaction container, and reacted at 220 ° C. and normal pressure for 120 minutes under a nitrogen environment. Then, the pressure was reduced to 13.3 kPa over 30 minutes, and the pressure was maintained at 13.3 kPa for 30 minutes, and the generated ethanol was drawn out of the reaction vessel. Thereafter, the reaction solution was temporarily cooled to room temperature, and 33.58 parts by mass (0.230 mol) of ISB and 56.96 parts by mass (0.266 mol) of DPC were put into the same reaction vessel, and the temperature of the heating bath was set to 150 ° C under a nitrogen atmosphere. If necessary, stir and dissolve the raw materials (about 10 minutes). After the dissolution, the temperature was raised to 220 ° C. over 30 minutes in the first step of the reaction, and the reaction was carried out at normal pressure for 60 minutes. Then, the pressure was reduced from normal pressure to 13.3 kPa over 90 minutes, and kept at 13.3 kPa for 30 minutes, and the generated phenol was extracted out of the reaction vessel.

繼而於反應第2階段之步驟中,歷時15分鐘使加熱槽之溫度升溫至240℃,並且歷時15分鐘將壓力減壓至0.10kPa以下,將所產生之苯酚向反應容器外抽出。達到特定之轉矩後,使反應結束,將所產生之聚合物於水中擠出,而獲得聚酯碳酸酯樹脂之顆粒物。 Then, in the second step of the reaction, the temperature of the heating tank was raised to 240 ° C. over 15 minutes, and the pressure was reduced to less than 0.10 kPa over 15 minutes, and the generated phenol was drawn out of the reaction vessel. After reaching a specific torque, the reaction is completed, and the polymer produced is extruded in water to obtain pellets of polyester carbonate resin.

將所獲得之樹脂組合物之玻璃轉移溫度等、進行膜成形並延伸時之延伸膜之折射率各向異性、相位差比(Re450/Re550)、膜之韌性等之測定結果示於表3。 Table 3 shows the measurement results of the glass transition temperature and the like of the obtained resin composition, refractive index anisotropy, retardation ratio (Re450 / Re550), and film toughness of the stretched film when the film is formed and stretched.

<參考例2-2> <Reference Example 2-2>

將9,9-雙(4-(2-羥基乙氧基)苯基)茀(BHEPF)62.40質量份(0.142mol)、ISB 28.78質量份(0.197mol)、DPC 73.40質量份(0.343mol)、及 作為觸媒之乙酸鎂四水合物7.28×10-4質量份(3.39×10-6mol)投入反應容器,於氮氣環境下,將加熱槽溫度設為150℃,視需要進行攪拌,並且使原料溶解(約10分鐘)。溶解後,於反應第1階段之步驟中,歷時30分鐘升溫至220℃,於常壓下反應60分鐘。繼而歷時90分鐘將壓力自常壓減壓至13.3kPa,於13.3kPa下保持30分鐘,將所產生之苯酚向反應容器外抽出。 9,9-bis (4- (2-hydroxyethoxy) phenyl) fluorene (BHEPF) 62.40 parts by mass (0.142 mol), ISB 28.78 parts by mass (0.197 mol), DPC 73.40 parts by mass (0.343 mol), And 7.28 × 10 -4 parts by mass (3.39 × 10 -6 mol) of magnesium acetate tetrahydrate as a catalyst was put into a reaction vessel, and the temperature of the heating tank was set to 150 ° C. under a nitrogen atmosphere, and stirred as needed, and The material was dissolved (about 10 minutes). After dissolving, in the step of the first stage of the reaction, the temperature was raised to 220 ° C. over 30 minutes, and the reaction was performed at normal pressure for 60 minutes. Then, the pressure was reduced from normal pressure to 13.3 kPa over 90 minutes, and kept at 13.3 kPa for 30 minutes, and the generated phenol was extracted out of the reaction vessel.

繼而於反應第2階段之步驟中,歷時15分鐘使加熱槽之溫度升溫至240℃,並且歷時15分鐘將壓力減壓至0.10kPa以下,將所產生之苯酚向反應容器外抽出。達到特定之轉矩後,使反應結束,將所產生之聚合物於水中擠出,而獲得聚酯碳酸酯樹脂之顆粒物。 Then, in the second step of the reaction, the temperature of the heating tank was raised to 240 ° C. over 15 minutes, and the pressure was reduced to less than 0.10 kPa over 15 minutes, and the generated phenol was drawn out of the reaction vessel. After reaching a specific torque, the reaction is completed, and the polymer produced is extruded in water to obtain pellets of polyester carbonate resin.

將所獲得之樹脂組合物之玻璃轉移溫度等、進行膜成形並延伸時之延伸膜之折射率各向異性、相位差比(Re450/Re550)、膜之韌性等之測定結果示於表3。 Table 3 shows the measurement results of the glass transition temperature and the like of the obtained resin composition, refractive index anisotropy, retardation ratio (Re450 / Re550), and film toughness of the stretched film when the film is formed and stretched.

<構象之能量及角度之計算> <Calculation of conformational energy and angle>

為了對寡聚茀之化學結構與光學特性之關係進行研究,而如下述般進行源自寡聚茀單體之重複單元之特定構形(構象)之能量計算及該構形中之茀環與主鏈所成之角度的計算。 In order to study the relationship between the chemical structure and the optical properties of oligomeric fluorene, the energy calculation of the specific configuration (conformation) derived from the repeating unit of the oligomeric fluorene monomer was performed as follows and the ring and the main in the configuration Calculation of the angle formed by the chain.

軟體係使用關於AM1法之美國Wavefunction公司製造之PC Spartan Pro 1.0.5(Windows(註冊商標)32bit版)。再者,收斂判定值等關係到計算精度之輸入值係全部使用上述軟件之預設值。 For the software system, PC Spartan Pro 1.0.5 (Windows (registered trademark) 32-bit version) manufactured by American Wavefunction Corporation about the AM1 method is used. In addition, the input values related to the calculation accuracy such as the convergence determination value are all preset values using the software described above.

針對源自下述所示之化合物3、化合物2之結構進行計算。此處,關於作為二酯單體之化合物3、化合物2,假定藉由酯交換反應而聚合而成之樹脂,對以兩酯基為甲酯之結構進行計算。 The calculation was performed on the structures derived from Compound 3 and Compound 2 shown below. Here, regarding compounds 3 and 2 as diester monomers, a resin polymerized by transesterification is assumed, and a structure in which both ester groups are methyl esters is calculated.

如下所示,以茀9位之碳原子與於鄰接之茀側與茀鍵結之碳原子之間的鍵A、與鍵結於茀之側鏈之原子與鍵結於該原子之主鏈之原子間的鍵B所成之二面角為180°(即側鏈為反式構形)、與60°及-60°(即,側鏈為2種之間扭式構形)為初期結構,藉由AM1法求出平衡結構與其能量(生成熱)。此處,於各化合物中,將具有與茀9位之碳原子鍵結之甲酯的取代基稱為側鏈。此處,為了推測各重複單元於聚合物中之立體結構,而使各化合物所存在之2條側鏈之兩者變化。即,於表4中所謂反式構形,係存在於各單體之2條側鏈之兩者為反式構形之結構,所謂間扭式構形,係存在於各單體之2條側鏈之兩者為間扭式構形之結構。又,間扭式構形有60°及-60°2種,對2條側鏈之兩者為60°及-60°之2種進行計算。 As shown below, the bond A between the carbon atom at position 茀 and the carbon atom bonded to the adjacent 茀 side and the 、 bond, the atom bonded to the side chain of 茀, and the main chain of the atom The dihedral angle formed by the interatomic bond B is 180 ° (that is, the side chain is in a trans configuration), and 60 ° and -60 ° (that is, the side chain is in a twisted configuration between the two types) is the initial structure The equilibrium structure and its energy (heat generation) are obtained by the AM1 method. Here, in each compound, a substituent having a methyl ester bonded to a carbon atom at the 茀 -position 9 is referred to as a side chain. Here, in order to estimate the three-dimensional structure of each repeating unit in the polymer, both of the two side chains existing in each compound were changed. That is, the so-called trans configuration in Table 4 refers to a structure in which two side chains of each monomer are in a trans configuration, and the so-called torsional configuration exists in two of each monomer. Both of the side chains are in a twisted configuration. In addition, there are two types of intertwisted configurations: 60 ° and -60 °, and two types of two side chains are calculated: 60 ° and -60 °.

此時,對存在於各單體之2條側鏈之兩者為反式構形、與2種間扭式構形之構象的能量差進行計算,於表4中記載將該等3種構形中最穩定者設為0(kJ/mol)時之能量差(kJ/mol)。又,於能量差為4kJ/mol以上之情形時,將能量(生成熱)較低之構形(設為0(kJ/mol)之構形)設為穩定構形。關於本計算中之AM1法之結果之妥當性,確認顯示出與於日本專利申請2013-214986號中作為更高度之計算之B3LYP/6-31G法相同之傾向。 At this time, the energy difference between the two configurations of the two side chains of each monomer which are in the trans configuration and the two intertwisted configurations is calculated. Table 4 describes these three configurations. The energy difference (kJ / mol) when the most stable shape is set to 0 (kJ / mol). When the energy difference is 4 kJ / mol or more, a configuration with a low energy (heat generation) (a configuration set to 0 (kJ / mol)) is set to a stable configuration. Regarding the validity of the results of the AM1 method in this calculation, it is confirmed that the same tendency as that of the B3LYP / 6-31G * method, which is a higher calculation in Japanese Patent Application No. 2013-214986, has been confirmed.

又,關於反式構形與2種間扭式構形,對主鏈與茀環所成之角度進行計算並記載。 In addition, regarding the trans configuration and the two intertwisted configurations, the angle formed by the main chain and the cymbal ring is calculated and recorded.

再者,主鏈與茀環所成之角度係以下述方式確定。首先,將連結兩末端之甲基之碳原子彼此的直線設為主鏈方向,將通過茀之3位、6位、9位之碳原子之平面設為茀平面。此時,與主鏈方向交叉之茀平面上之直線無限存在,但與主鏈方向之角度成為最小之茀平面上之直線唯一。將該角度設為主鏈與茀環所成之角度。此處,化合物3於分子中具有3個茀基,因此使用中心之茀環,對主鏈與茀環所成之角度進行計算。 In addition, the angle formed by the main chain and the cymbal ring is determined in the following manner. First, a straight line connecting carbon atoms of methyl groups at both ends is set as a main chain direction, and a plane passing through carbon atoms at positions 3, 6, and 9 of 茀 is set to a 茀 plane. At this time, the straight line on the 茀 -plane crossing the direction of the main chain exists infinitely, but the straight line on the 茀 -plane where the angle with the direction of the main chain becomes the smallest. Let this angle be the angle formed by the main chain and the loop. Here, Compound 3 has three fluorene groups in the molecule, so the central fluorene ring is used to calculate the angle formed by the main chain and the fluorene ring.

表4中,將化合物3及化合物2進行比較,均反式構形之能量(生成熱)與2種間扭式構形之能量(生成熱)差同等,或者反式體略微穩定。 In Table 4, when the compounds 3 and 2 are compared, the energy (generating heat) of both trans configurations is equal to the energy (generating heat) of the two intertwisted configurations, or the trans form is slightly stable.

於化合物3與化合物2之比較中,關於反式構形之主鏈與茀環所 成之角度,具有3個茀基之化合物3為84.2°,具有2個茀基之化合物2為74.6°,化合物3顯示接近90°之值。 In the comparison between compound 3 and compound 2, the main chain of trans configuration In the angle, the compound 3 having 3 fluorenyl groups is 84.2 °, the compound 2 having 2 fluorenyl groups is 74.6 °, and the compound 3 shows a value close to 90 °.

本發明者等人發現,茀環於樹脂組合物中與主鏈正交,藉此顯現其光學特性。進而於日本專利申請2013-214986號中,確認有如下情況:藉由計算而求出之穩定構形中之主鏈與茀環所成之角度與偏光ATR分析之差圖譜、及反波長色散特性相關,藉由計算而求出之角度越接近90°,越更明顯地觀察到偏光ATR分析之差圖譜,且獲得較強之反波長色散特性。於反式構形之角度為50°以上、較佳為60°以上、更佳為70°以上、尤佳為80°以上之時,可預想顯現反波長色散性,所使用之重複結構均顯現反波長色散性。 The present inventors have found that the fluorene ring is orthogonal to the main chain in the resin composition, thereby manifesting its optical characteristics. Furthermore, in Japanese Patent Application No. 2013-214986, the following cases were confirmed: the difference between the angle formed by the main chain and the ring in the stable configuration obtained by calculation and the ATR analysis of polarized light, and the inverse wavelength dispersion characteristic Correlation, the closer the angle obtained by calculation is to 90 °, the more clearly the difference spectrum of polarized ATR analysis is observed, and the stronger the inverse wavelength dispersion characteristic is obtained. When the angle of the trans configuration is 50 ° or more, preferably 60 ° or more, more preferably 70 ° or more, and even more preferably 80 ° or more, the inverse wavelength dispersion is expected to be exhibited, and the repeated structures used are all exhibited Inverse wavelength dispersion.

根據參考例2-1及參考例2-2之比較,於假定顯現反波長色散性之相位差膜用途之情形時,顯現相同之相位差比(Re450/Re550)0.90,使用二茀二酯之參考例2-1(聚酯碳酸酯)之含茀環單體遠遠少於使用BHEPF之參考例2-2(聚碳酸酯),因此可謂使用化合物2者之顯現反波長色散性之效果高於使用BHEPF者。可認為其原因在於:二茀二酯之化合物2之茀比率高於BHEPF,又與BHEPF相比,化合物2之柔軟之伸烷基鏈之比例較低而剛直,因此容易成為茀環垂直於主鏈之狀態。 According to the comparison between Reference Example 2-1 and Reference Example 2-2, when the use of a retardation film exhibiting inverse wavelength dispersion is assumed, the same retardation ratio (Re450 / Re550) of 0.90 is exhibited. Reference Example 2-1 (polyester carbonate) contains far less fluorene-containing monomers than Reference Example 2-2 (polycarbonate) using BHEPF. Therefore, it can be said that the compound 2 has a high effect of exhibiting anti-wavelength dispersion. For those who use BHEPF. It can be considered that the reason is that the ratio of fluorene of the diester of compound 2 is higher than that of BHEPF. Compared with BHEPF, the ratio of the soft alkyl group of compound 2 is low and rigid, so it is easy to become a fluorene ring perpendicular to the main State of the chain.

根據模擬結果,可認為化合物2係反式構形與間扭式構形之穩定性同等、或者反式構形較間扭式構形略穩定,相對於此,化合物3係反式構形穩定,且其存在比率較高。進而於化合物3及化合物2各自之反式構形中,主鏈與茀環所成之角度均為70°以上,而可預想顯現較高之反波長色散性。進而於化合物3中,主鏈與茀環所成之角度超過80°,可認為顯現化合物2以上之反波長色散性,因此可認為可以較化合物2少之使用量顯現與化合物2同等之反波長色散性。 According to the simulation results, it can be considered that the stability of the trans configuration of compound 2 is equal to that of the torsional configuration, or that the trans configuration is slightly more stable than that of the torsional configuration. In contrast, the trans configuration of compound 3 is stable. , And its presence ratio is high. Furthermore, in each of the trans configurations of compound 3 and compound 2, the angles formed by the main chain and the fluorene ring are both 70 ° or more, and it is expected that a high reverse wavelength dispersion property is exhibited. Furthermore, in compound 3, the angle formed by the main chain and the fluorene ring exceeds 80 °, and it can be considered that the inverse wavelength dispersion of compound 2 or more can be exhibited. Therefore, it can be considered that the inverse wavelength equivalent to compound 2 can be exhibited in a smaller amount than compound 2. Dispersion.

又,化合物3係熔點比化合物2高20℃以上,且分解起始溫度亦較高,因此假定製成樹脂之情形之玻璃轉移溫度高於使用化合物2之 樹脂,可認為熱穩定性亦較高。 In addition, the melting point of compound 3 is 20 ° C or more higher than that of compound 2, and the decomposition initiation temperature is also higher. Therefore, it is assumed that the glass transition temperature of the resin is higher than that of the compound 2 Resin is considered to have high thermal stability.

<茀比率> <茀 ration>

將源自合成例2-1中所合成之含茀環單體之重複單元之化學結構式、與茀比率進行整理並示於表5。再者,茀比率係自下述式算出。其中,下述式中之茀骨架之分子量係以碳原子13個分(不含有氫原子)進行計算。 The chemical structural formula derived from the repeating unit derived from the fluorene ring-containing monomer synthesized in Synthesis Example 2-1 and the ratio to fluorene are shown in Table 5. The 茀 ratio is calculated from the following formula. The molecular weight of the fluorene skeleton in the following formula is calculated based on 13 carbon atoms (excluding hydrogen atoms).

茀比率(%)=茀骨架之分子量/重複單元之分子量×100 茀 ratio (%) = molecular weight of 茀 skeleton / molecular weight of repeating unit × 100

如上所述,可認為可藉由提高重複單元中之茀所占之比例而高效率地顯現所需之光學特性,但因化合物2、化合物3、化合物4及化合物5之茀比率均成為70%以上,因此可認為使用該等之本發明之樹脂組合物對高效率地顯現所需之光學特性適合。相對於此,BHEPF之源自其之重複單元中之茀比率未達50%,而並未有效率地顯現所需之光學特性,可認為為了顯現所需之光學特性而必須提高具有茀之單體的使用比例。 As described above, it is considered that the required optical characteristics can be efficiently exhibited by increasing the ratio of plutonium in the repeating unit, but the plutonium ratios of compound 2, compound 3, compound 4, and compound 5 are all 70%. From the above, it can be considered that the use of the resin composition of the present invention is suitable for efficiently developing the optical characteristics required. On the other hand, the ratio of fluorene in the repeating unit derived from BHEPF is less than 50%, and the required optical characteristics are not effectively developed. It can be considered that in order to develop the required optical characteristics, it is necessary to improve the unit with fluorene. Body use ratio.

根據以上之情況,於假定顯現反波長色散性之相位差膜用途之情形時,含有本發明之具有三茀之重複單元之聚合物的樹脂組合物顯現如下情況:即便少量使用三茀二酯,亦可達成耐熱性等各種物性或正之固有雙折射、相位差比。 Based on the above, when the use of a retardation film exhibiting inverse wavelength dispersion is assumed, the resin composition containing the polymer having a trifluorene repeating unit of the present invention appears as follows: even if a trimethyl diester is used in a small amount, Various physical properties such as heat resistance or positive inherent birefringence and phase difference ratio can also be achieved.

《實施例3-1》 << Example 3-1 >>

以下之實施例中所使用之化合物之縮寫等係如下所述。 The abbreviations and the like of the compounds used in the following examples are as follows.

ISB;異山梨酯(ROQUETTE FRERES公司製造,商品名;POLYSORB) ISB; Isosorbide (manufactured by ROQUETTE FRERES, trade name; POLYSORB)

DPC;碳酸二苯酯(三菱化學(股)製造) DPC; Diphenyl carbonate (manufactured by Mitsubishi Chemical Corporation)

CHDM;1,4-環己烷二甲醇(順式、反式混合物,SK化學公司製造) CHDM; 1,4-cyclohexanedimethanol (cis, trans mixture, manufactured by SK Chemicals)

THF:四氫呋喃(不含穩定劑,WAKO公司製造) THF: tetrahydrofuran (without stabilizer, manufactured by WAKO)

[單體之實施例] [Example of monomer]

<實施例3-1>9-{[(2-乙氧基羰基乙基)茀-9-基]-甲基}茀(化合物2)之合成 <Example 3-1> Synthesis of 9-{[(2-ethoxycarbonylethyl) fluorene-9-yl] -methyl} fluorene (Compound 2)

<合成例3-1A>雙(茀-9-基)甲烷(化合物1)之合成 <Synthesis Example 3-1A> Synthesis of bis (fluoren-9-yl) methane (compound 1)

向1L四口燒瓶中添加茀(120g,722mmol)、N,N-二甲基甲醯胺(480ml),進行氮氣置換後,冷卻至5℃以下。添加乙醇鈉(24.6g,361mmol),將多聚甲醛(8.7g,289mmol)以不超過10℃之方式少量多次地進行添加,並進行攪拌。2小時後,滴加1N鹽酸(440ml),使反應停止。將所獲得之懸濁溶液進行抽氣過濾,利用脫鹽水(240ml)進行噴灑洗淨。其後,使所獲得之粗產物分散於脫鹽水(240ml),並攪拌1小時。將該懸濁液進行抽氣過濾後,利用脫鹽水(120ml)進行噴灑洗淨。使所獲得之粗產物分散於甲苯(480ml)後,使用迪恩-斯達克裝置,於加熱回流條件下進行脫水。恢復至室溫(20℃)後,進行抽氣 過濾,於80℃下減壓乾燥至成為恆量,藉此獲得作為白色固體之雙(茀-9-基)甲烷(化合物1)84.0g(產率:84.5%,HPLC純度:94.0%)。 Rhenium (120 g, 722 mmol) and N, N-dimethylformamidine (480 ml) were added to a 1 L four-necked flask, followed by nitrogen substitution, and then cooled to 5 ° C or lower. Sodium ethoxide (24.6 g, 361 mmol) was added, and paraformaldehyde (8.7 g, 289 mmol) was added in small amounts multiple times so as not to exceed 10 ° C., and stirred. After 2 hours, 1N hydrochloric acid (440 ml) was added dropwise to stop the reaction. The obtained suspension solution was suction-filtered, and spray-washed with demineralized water (240 ml). Thereafter, the obtained crude product was dispersed in desalted water (240 ml) and stirred for 1 hour. This suspension was subjected to suction filtration, and then spray-washed with demineralized water (120 ml). The obtained crude product was dispersed in toluene (480 ml), and then dehydrated using a Dean-Stark apparatus under heating and refluxing conditions. After returning to room temperature (20 ° C), pump down Filtration and drying under reduced pressure at 80 ° C. until a constant amount was obtained, thereby obtaining 84.0 g of bis (fluoren-9-yl) methane (compound 1) as a white solid (yield: 84.5%, HPLC purity: 94.0%).

1H-NMR(400MHz,CDCl3)δ 7.83(d,J=7.6Hz,4H),7.56(dd,J1=7.6Hz,J2=0.8Hz,4H),7.41(t,J=7.3Hz,4H),7.29(dt,J1=7.3Hz,J2=1.3Hz,4H),4.42(t,J=7.6Hz,2H),2.24(d,J=7.6Hz,2H). 1 H-NMR (400MHz, CDCl 3 ) δ 7.83 (d, J = 7.6Hz, 4H), 7.56 (dd, J1 = 7.6Hz, J2 = 0.8Hz, 4H), 7.41 (t, J = 7.3Hz, 4H ), 7.29 (dt, J1 = 7.3Hz, J2 = 1.3Hz, 4H), 4.42 (t, J = 7.6Hz, 2H), 2.24 (d, J = 7.6Hz, 2H).

<合成3-1B-1>9-{[(2-乙氧基羰基乙基)茀-9-基]-甲基}茀(化合物2)之合成 <Synthesis 3-1B-1> Synthesis of 9-{[(2-ethoxycarbonylethyl) fluorene-9-yl] -methyl} fluorene (Compound 2)

向1L可分離式燒瓶添加合成例3-1A中所獲得之雙(茀-9-基)甲烷(化合物1,34.0g,98.7mmol)、氯化N-苄基-N,N,N-三乙基銨(4.47g,19.6mmol)、四氫呋喃(170ml),進行氮氣置換後,將內溫控制為15℃~18℃,添加50wt/wt%氫氧化鈉水溶液(25.93g),結果溶液之色變為淡黃色。其後,歷時30分鐘滴加丙烯酸乙酯(10.7ml,103mmol)後,利用HPLC進行分析。 To a 1 L separable flask was added the bis (fluoren-9-yl) methane obtained in Synthesis Example 3-1A (Compound 1, 34.0 g, 98.7 mmol), N-benzyl-N, N, N-trichloro Ethylammonium (4.47g, 19.6mmol), tetrahydrofuran (170ml), after nitrogen substitution, the internal temperature was controlled to 15 ° C ~ 18 ° C, and a 50wt / wt% sodium hydroxide aqueous solution (25.93g) was added. As a result, the color of the solution Turns pale yellow. Thereafter, ethyl acrylate (10.7 ml, 103 mmol) was added dropwise over 30 minutes, and then analyzed by HPLC.

(HPLC條件) (HPLC conditions)

管柱:Inertsil ODS-3V 150mm×4.8mm Column: Inertsil ODS-3V 150mm × 4.8mm

溫度:40℃ Temperature: 40 ° C

溶離液條件:0~5min:四氫呋喃/水=50/50,20min:四氫呋喃/水=100/0 Dissolution conditions: 0 ~ 5min: tetrahydrofuran / water = 50/50, 20min: tetrahydrofuran / water = 100/0

流速:1.0ml/min Flow rate: 1.0ml / min

注入量:2μL Injection volume: 2 μL

(HPLC分析結果) (HPLC analysis result)

化合物1(13.9min):15面積%,化合物2(13.1min):61面積%,化合物3(13.5min):15面積% Compound 1 (13.9min): 15 area%, Compound 2 (13.1min): 61 area%, Compound 3 (13.5min): 15 area%

<合成例3-1B-2>9-{[(2-乙氧基羰基乙基)茀-9-基]-甲基}茀(化合物2) <Synthesis Example 3-1B-2> 9-{[(2-ethoxycarbonylethyl) fluorene-9-yl] -methyl} fluorene (Compound 2)

向50mL三口燒瓶添加化合物1(1.0g,2.9mmol)、氯化苄基三乙 基銨(132mg,0.58mmol)、THF(5mL),於氮氣環境下並於室溫下進行攪拌。歷時30分鐘添加丙烯酸乙酯(290mg,2.9mmol)後,於室溫下熟化3小時。於16℃下熟化1小時後,利用3N鹽酸進行中和。此處添加甲苯(5mL),利用飽和碳酸氫鈉水溶液(5mL)將甲苯相洗淨1次,利用水(5mL)將甲苯相洗淨3次。將甲苯於蒸發器中蒸餾去除後,利用矽膠層析法對殘渣進行精製,藉此獲得化合物2(0.63g,1.4mmol,產率:49%,白色結晶)。 To a 50 mL three-necked flask was added Compound 1 (1.0 g, 2.9 mmol) and benzyl triethyl chloride. Ammonium (132 mg, 0.58 mmol), THF (5 mL), and stirred at room temperature under a nitrogen atmosphere. After adding ethyl acrylate (290 mg, 2.9 mmol) over 30 minutes, it was aged at room temperature for 3 hours. After aging at 16 ° C for 1 hour, neutralization was performed with 3N hydrochloric acid. Toluene (5 mL) was added here, and the toluene phase was washed once with a saturated aqueous sodium hydrogen carbonate solution (5 mL), and the toluene phase was washed three times with water (5 mL). After toluene was distilled off in an evaporator, the residue was purified by silica gel chromatography to obtain compound 2 (0.63 g, 1.4 mmol, yield: 49%, white crystals).

1H-NMR(400MHz,CDCl3)δ 7.74-7.80(m,2H),7.53-7.56(m,4H),7.38-7.45(m,4H),7.19(t,J=7.5Hz,2H),7.03(dt,J1=7.5Hz,J2=1.0Hz,2H),6.60(d,J=7.5Hz,2H),3.93(q,J=7.0Hz,2H),3.12(t,J=4.6Hz,1H),2.73(d,J=4.6Hz,2H),2.48-2.52(m,2H),1.58-1.62(m,2H),1.10(t,J=7.0Hz,3H). 1 H-NMR (400MHz, CDCl 3 ) δ 7.74-7.80 (m, 2H), 7.53-7.56 (m, 4H), 7.38-7.45 (m, 4H), 7.19 (t, J = 7.5Hz, 2H), 7.03 (dt, J1 = 7.5Hz, J2 = 1.0Hz, 2H), 6.60 (d, J = 7.5Hz, 2H), 3.93 (q, J = 7.0Hz, 2H), 3.12 (t, J = 4.6Hz, 1H), 2.73 (d, J = 4.6Hz, 2H), 2.48-2.52 (m, 2H), 1.58-1.62 (m, 2H), 1.10 (t, J = 7.0Hz, 3H).

自合成例3-1B-1,以化合物1為原料而加成1當量之丙烯酸乙酯之情形時,丙烯酸乙酯之加成反應之速度於第一次加成與第二次加成中相同之情形時,理論上肯定以化合物1與化合物2與化合物3之比成為1:2:1之方式產生。然而,令人吃驚的是於本反應中,可知HPLC之面積比成為1:4:1,而單加成體之化合物2選擇性地產生。可認為其原因在於:化合物3係2個茀環堆疊之結構為最穩定之結構,相對於此,化合物1與化合物2係2個茀環反轉之結構為最穩定之結構,因此向化合物2加成第二個丙烯酸乙酯時,必須一個茀環反轉而進行加成。化合物1與化合物2之源自茀環之質子於1H-NMR中於δ 6.60-7.80ppm之整體性低磁場側被觀察到,相對於此,化合物3之源自茀環之質子於δ 6.77-7.03ppm之高磁場側被觀察到,而發現較強之遮蔽效果之影響,因此亦支持茀環取堆疊結構。 In the case of adding 1 equivalent of ethyl acrylate using Compound 1 as a raw material from Synthesis Example 3-1B-1, the speed of the addition reaction of ethyl acrylate is the same as that in the second addition In this case, it is theoretically certain that the ratio of Compound 1 to Compound 2 to Compound 3 becomes 1: 2: 1. However, it was surprising that in this reaction, it was found that the area ratio of HPLC became 1: 4: 1, and Compound 2 of the single adduct was selectively produced. The reason is believed to be that the structure in which the three fluorene rings of compound 3 are stacked is the most stable structure. In contrast, the structure in which the two fluorene rings of compound 1 and compound 2 are inverted is the most stable structure. When adding a second ethyl acrylate, one fluorene ring must be inverted to perform the addition. The proton ring-derived protons of compound 1 and compound 2 were observed on the δ 6.60-7.80 ppm integral low magnetic field side in 1 H-NMR. In contrast, the proton ring-derived protons of compound 3 at δ 6.77 The high magnetic field side of -7.03ppm was observed, and the strong shielding effect was found. Therefore, it is also supported to stack the ring structure.

於通常具有2處取代基導入部位之情形時,有變得難以選擇性地僅向1處導入反應性官能基之情形,但於特定之寡聚茀化合物之情形 時,可認為由於立體之反應性之不同等,而有可容易地將特定之反應性官能基選擇性地僅向1處導入之傾向,且亦可工業性地製造。 In the case where there are usually two substituent introduction sites, it may become difficult to selectively introduce a reactive functional group into only one place, but in the case of a specific oligomeric fluorene compound In this case, it may be considered that the specific reactive functional group can be easily introduced into only one place due to the difference in stereoreactivity, and it can also be produced industrially.

又,可認為於利用加成反應或取代反應而向如化合物1之寡聚茀化合物導入反應性取代基之情形時,同樣地有可選擇性地產生具有1個反應性官能基之寡聚茀之傾向,因此除丙烯酸乙酯以外,亦可廣泛地應用。 In addition, when a reactive substituent is introduced into an oligomeric fluorene compound such as compound 1 by addition reaction or substitution reaction, it is considered that an oligomeric fluorene having one reactive functional group can be selectively produced similarly. Therefore, it can be widely used in addition to ethyl acrylate.

<具有1個反應性取代基之寡聚茀之作為樹脂原料之應用> <Application of oligomeric fluorene having 1 reactive substituent as a resin raw material>

例如,可認為如化合物2之單酯體藉由用作聚酯或聚酯碳酸酯之原料,而作為末端封端劑發揮作用,因此可認為其作為聚酯或聚碳酸酯之分子量之調整劑有用。 For example, it can be considered that the monoester body of compound 2 functions as a terminal capping agent by using it as a raw material of polyester or polyester carbonate, so it can be considered as a molecular weight regulator of polyester or polycarbonate. it works.

<具有2個不同之反應性官能基之寡聚茀化合物之作為樹脂原料之應用> <Application of oligomeric fluorene compounds having two different reactive functional groups as resin raw materials>

例如,可認為如化合物2之單酯體藉由進而導入羥基作為反應性取代基,而可合成具有2個不同之反應性官能基之寡聚茀化合物,僅此可獲得茀含量較高之聚酯,因此有用。 For example, it can be considered that, as the monoester of compound 2 further introduces a hydroxyl group as a reactive substituent, an oligomeric fluorene compound having 2 different reactive functional groups can be synthesized, and only a polymer having a high fluorene content can be obtained Esters are therefore useful.

《實施例4-1~4-4、比較例4-1~4-2》 << Examples 4-1 ~ 4-4, Comparative Examples 4-1 ~ 4-2 >>

本發明之寡聚茀單體之品質評估、及樹脂組合物與透明膜之特性評估係藉由以下之方法進行。再者,特性評估方法並不限定於以下之方法,業者可適當進行選擇。 The quality evaluation of the oligomeric fluorene monomer and the property evaluation of the resin composition and the transparent film of the present invention were performed by the following methods. In addition, the characteristic evaluation method is not limited to the following methods, and the operator can select appropriately.

又,以下之合成例及實施例中所使用之化合物之縮寫等係如下所述。 The abbreviations and the like of the compounds used in the following Synthesis Examples and Examples are as follows.

ISB;異山梨酯(ROQUETTE FRERES公司製造、商品名;POLYSORB) ISB; isosorbide (manufactured by ROQUETTE FRERES, trade name; POLYSORB)

DPC;碳酸二苯酯(三菱化學(股)製造) DPC; Diphenyl carbonate (manufactured by Mitsubishi Chemical Corporation)

CHDM;1,4-環己烷二甲醇(順式、反式混合物,SK化學公司製造) CHDM; 1,4-cyclohexanedimethanol (cis, trans mixture, manufactured by SK Chemicals)

BHEPF:9,9-雙[4-(2-羥基乙氧基)苯基]-茀(Osaka Gas Chemicals(股)製造) BHEPF: 9,9-bis [4- (2-hydroxyethoxy) phenyl] -fluorene (manufactured by Osaka Gas Chemicals)

(1)寡聚茀二酯之粉末X射線繞射 (1) Powder X-ray diffraction of oligomeric diesters

寡聚茀二酯之粉末X射線繞射圖案係使用粉末X射線繞射測定裝置(Spectris PANalitical事業部X-Pert‘Pro)進行測定。 The powder X-ray diffraction pattern of the oligomeric diester was measured using a powder X-ray diffraction measurement device (Spectris PANalitical Division X-Pert 'Pro).

(2)寡聚茀二酯之粒度分佈測定 (2) Particle size distribution measurement of oligomeric fluorene diester

寡聚茀二酯之粒度分佈係使用雷射繞射‧散射式粒徑分佈測定裝置(Microtrac-bel公司製造之MT3300EX),分散於溶劑之甲醇中而進行測定。 The particle size distribution of the oligomeric diester was measured using a laser diffraction and scattering type particle size distribution measuring device (MT3300EX manufactured by Microtrac-bel) in methanol in a solvent.

(3)寡聚茀二酯之旋轉靜止角 (3) Rotation repose angle of oligomeric diester

寡聚茀二酯之旋轉靜止角係使用三輪式靜止角測定器(筒井理化學器械公司製造),利用圓筒旋轉法而進行測定。 The rotation rest angle of the oligomeric diester was measured by a cylinder rotation method using a three-wheeled rest angle measuring device (manufactured by Tsutsui Rika Chemical Co., Ltd.).

(4)寡聚茀二酯之熱穩定性評估 (4) Evaluation of thermal stability of oligomeric fluorene diesters

將寡聚茀二酯500mg添加於30mL燒瓶中,於氮氣環境下,於185℃下攪拌7小時。利用目視確認加熱前後之色調。又,製備加熱前後之寡聚茀二酯之1wt%THF溶液,使用紫外可見吸收分光光度計(島津製作所公司製造之UV-1650PC),對400nm之波長之吸光度進行測定。 500 mg of an oligomeric diester was added to a 30 mL flask, and stirred at 185 ° C. for 7 hours under a nitrogen atmosphere. Visually confirm the hue before and after heating. Further, a 1 wt% THF solution of the oligomeric fluorene diester before and after heating was prepared, and the absorbance at a wavelength of 400 nm was measured using an ultraviolet-visible absorption spectrophotometer (UV-1650PC manufactured by Shimadzu Corporation).

<實施例4-1> <Example 4-1>

<實施例4-1A>雙[9-(2-乙氧基羰基乙基)茀-9-基]甲烷(化合物2) 之合成 <Example 4-1A> bis [9- (2-ethoxycarbonylethyl) fluorene-9-yl] methane (compound 2) Synthesis

向1L可分離式燒瓶添加雙(茀-9-基)甲烷(50g,145.2mmol)、苄基三乙基三乙基氯化銨(6.6g,29.0mmol)、四氫呋喃(250mL),進行氮氣置換後,利用水浴下控制為17℃~19℃,添加50wt/vol%氫氧化鈉水溶液(26.5mL),結果溶液之顏色變為淡紅色。其後,歷時30分鐘滴加丙烯酸乙酯(15.1mL,145.2mmol)。其後,添加氯化苄基三乙基銨(6.6g,29.0mmol),進而添加丙烯酸乙酯(30.2mL,290.2mmol),利用HPLC追蹤反應之進行,並且攪拌2小時。利用HPLC確認單加成體成為2%以下後,利用冰浴進行冷卻,於溫度平衡下滴加3N鹽酸(166.4mL),進行驟冷。將水層廢棄後,添加甲苯100mL,利用飽和碳酸氫鈉水溶液(150mL)將有機層洗淨後,進而利用脫鹽水(150mL)將有機層洗淨。其後,將四氫呋喃減壓蒸餾去除後,添加甲醇(200mL),進行晶析。抽氣過濾後,於100℃下減壓乾燥至成為恆量,藉此獲得作為白色固體之雙[9-(2-乙氧基羰基乙基)茀-9-基]甲烷(化合物1)61.9g(產率:78.0%,HPLC純度:87.4面積%)。 To a 1 L separable flask, add bis (fluoren-9-yl) methane (50 g, 145.2 mmol), benzyltriethyltriethylammonium chloride (6.6 g, 29.0 mmol), and tetrahydrofuran (250 mL), and replace with nitrogen. Then, the temperature was controlled to 17 ° C. to 19 ° C. under a water bath, and a 50 wt / vol% sodium hydroxide aqueous solution (26.5 mL) was added. As a result, the color of the solution became light red. Thereafter, ethyl acrylate (15.1 mL, 145.2 mmol) was added dropwise over 30 minutes. Thereafter, benzyltriethylammonium chloride (6.6 g, 29.0 mmol) was added, and further, ethyl acrylate (30.2 mL, 290.2 mmol) was added, and the progress of the reaction was followed by HPLC, followed by stirring for 2 hours. After confirming that the single adduct was 2% or less by HPLC, the solution was cooled with an ice bath, and 3N hydrochloric acid (166.4 mL) was added dropwise under temperature equilibrium, followed by quenching. After the aqueous layer was discarded, 100 mL of toluene was added, and the organic layer was washed with a saturated sodium bicarbonate aqueous solution (150 mL), and then the organic layer was washed with demineralized water (150 mL). After that, tetrahydrofuran was distilled off under reduced pressure, and then methanol (200 mL) was added to perform crystallization. After suction filtration, it was dried under reduced pressure at 100 ° C until a constant amount was obtained, thereby obtaining 61.9 g of bis [9- (2-ethoxycarbonylethyl) fluorene-9-yl] methane (compound 1) as a white solid. (Yield: 78.0%, HPLC purity: 87.4 area%).

<HPLC條件> <HPLC conditions>

管柱:Inertsil ODS-3V 150mm×4.8mm Column: Inertsil ODS-3V 150mm × 4.8mm

溫度:40℃ Temperature: 40 ° C

溶離液條件:0-5min:四氫呋喃/水=50/50,20min:四氫呋喃/水=100/0 Dissolution conditions: 0-5min: tetrahydrofuran / water = 50/50, 20min: tetrahydrofuran / water = 100/0

流速:1.0mL/min Flow rate: 1.0mL / min

注入量:2μL Injection volume: 2 μL

HPLC分析結果化合物4(5.9min):0.0面積%(0.0質量%),化合物5(10.4min):3.0面積%(2.9質量%),化合物3(13.5min):87.4面積%(89.0質量%) HPLC analysis results Compound 4 (5.9min): 0.0 area% (0.0% by mass), Compound 5 (10.4min): 3.0 area% (2.9% by mass), Compound 3 (13.5min): 87.4% by area (89.0% by mass)

()內係表示自校正曲線算出之定量值。 () Indicates the quantitative value calculated from the calibration curve.

1H-NMR(400MHz,CDCl3)δ 7.03(d,J=7.6Hz,4H)6.97(dt,J1=7.6Hz,J2=1.5Hz,4H),6.82(dt,J1=7.6Hz,J2=1.3Hz,4H),6.77(d,J1=7.6Hz,4H),3.88(q,J=7.1Hz,4H),3.12(s,2H),2.23(m,4H),1.13(m,4H),1.02(t,J=7.1Hz,6H). 1 H-NMR (400MHz, CDCl 3 ) δ 7.03 (d, J = 7.6Hz, 4H) 6.97 (dt, J1 = 7.6Hz, J2 = 1.5Hz, 4H), 6.82 (dt, J1 = 7.6Hz, J2 = 1.3Hz, 4H), 6.77 (d, J1 = 7.6Hz, 4H), 3.88 (q, J = 7.1Hz, 4H), 3.12 (s, 2H), 2.23 (m, 4H), 1.13 (m, 4H) 1.02 (t, J = 7.1Hz, 6H).

m,p.:141℃ m, p .: 141 ℃

<實施例4-1B>雙[9-(2-苯氧基羰基乙基)茀-9-基]甲烷(化合物2)之合成 <Example 4-1B> Synthesis of bis [9- (2-phenoxycarbonylethyl) fluorene-9-yl] methane (Compound 2)

向1L四口燒瓶中添加雙[9-(2-乙氧基羰基乙基)茀-9-基]甲烷(化合物1,49.7g,91.2mmol)、碳酸二苯酯(98.3g,459mmol)、原鈦酸四異丙酯(1.3mL,4.59mmol),將減壓度調整為3~2kPa,於140℃~150℃之溫度範圍內,將副產物蒸餾去除,並且攪拌10小時。冷卻至90℃,利用HPLC確認反應之結束後,添加甲苯(100mL),冷卻至50℃。此時,添加甲醇(250mL),冷卻至室溫後,進行抽氣過濾。使所獲得之白色固體分散於甲苯(100mL),進行30分鐘加熱回流。冷卻至50℃後,添加甲醇(250mL)。冷卻至室溫(20℃)後,進行抽氣過濾,於100℃下減壓乾燥至成為恆量,藉此獲得作為白色固體之雙[9-(2-苯氧基羰基乙基)茀-9-基]甲烷(化合物2)35.2g(產率:60%,HPLC純度:98.4面積%)。 To a 1 L four-necked flask were added bis [9- (2-ethoxycarbonylethyl) fluorene-9-yl] methane (Compound 1, 49.7 g, 91.2 mmol), diphenyl carbonate (98.3 g, 459 mmol), Tetraisopropyl orthotitanate (1.3 mL, 4.59 mmol), the degree of reduced pressure was adjusted to 3 to 2 kPa, and the by-products were distilled off in a temperature range of 140 ° C to 150 ° C, and stirred for 10 hours. After cooling to 90 ° C and confirming the completion of the reaction by HPLC, toluene (100 mL) was added and the mixture was cooled to 50 ° C. At this time, methanol (250 mL) was added, and after cooling to room temperature, suction filtration was performed. The obtained white solid was dispersed in toluene (100 mL) and heated under reflux for 30 minutes. After cooling to 50 ° C, methanol (250 mL) was added. After cooling to room temperature (20 ° C), suction filtration was performed, and the solution was dried under reduced pressure at 100 ° C to a constant amount, thereby obtaining bis [9- (2-phenoxycarbonylethyl) 乙基 -9 as a white solid. -Base] methane (compound 2) 35.2 g (yield: 60%, HPLC purity: 98.4 area%).

1H-NMR(400MHz,CDCl3)δ 7.23-7.28(m,4H),7.07-7.16(m,6H),7.03(dt,J1=6.9Hz,J2=2.0,4H),6.78-6.90(m,12H),3.20(s,2H),2.37(t,J=8.3Hz,4H),1,40(t,J=8.3Hz,4H). 1 H-NMR (400MHz, CDCl 3 ) δ 7.23-7.28 (m, 4H), 7.07-7.16 (m, 6H), 7.03 (dt, J1 = 6.9Hz, J2 = 2.0, 4H), 6.78-6.90 (m , 12H), 3.20 (s, 2H), 2.37 (t, J = 8.3Hz, 4H), 1,40 (t, J = 8.3Hz, 4H).

m.p.:176℃ m.p .: 176 ℃

Ti含有比例:330質量ppm Ti content: 330 mass ppm

<實施例4-2>雙[9-(2-苯氧基羰基乙基)茀-9-基]甲烷(化合物2)之合成 <Example 4-2> Synthesis of bis [9- (2-phenoxycarbonylethyl) fluorene-9-yl] methane (compound 2)

向250LGL反應器添加碳酸二苯酯(74.9質量份),使之於120℃下 進行溶解。此時,添加雙[9-(2-乙氧基羰基乙基)茀-9-基]甲烷(化合物1,38.1質量份)、原鈦酸四異丙酯(1.0質量份),將減壓度調整為3.0kPa,將副產物蒸餾去除,並且攪拌7小時直至內溫到達185℃。利用氮氣恢復至常壓後,冷卻至90℃,利用HPLC確認反應之結束後,添加甲苯(66質量份),轉移至400LGL反應器,冷卻至50℃。此時,添加甲醇(151質量份),冷卻至5℃後,進行離心過濾。使所獲得之粗產物分散於甲苯(66質量份),進行30分鐘加熱回流。冷卻至50℃後,添加甲醇(151質量份),冷卻至22℃後,進行離心過濾。進而使所獲得之粗產物分散於甲苯(66質量份),進行30分鐘加熱回流。冷卻至50℃後,添加甲醇(151質量份),冷卻至22℃後,進行離心過濾。於80℃下減壓乾燥至成為恆量,藉此獲得作為白色固體之雙[9-(2-苯氧基羰基乙基)茀-9-基]甲烷(化合物2)27.2g(產率:61%,HPLC純度:99.5面積%)。 Diphenyl carbonate (74.9 parts by mass) was added to a 250 LGL reactor at 120 ° C. Perform dissolution. At this time, bis [9- (2-ethoxycarbonylethyl) fluorene-9-yl] methane (Compound 1, 38.1 parts by mass) and tetraisopropyl orthotitanate (1.0 parts by mass) were added, and the pressure was reduced. The degree was adjusted to 3.0 kPa, the by-products were distilled off, and stirred for 7 hours until the internal temperature reached 185 ° C. After returning to normal pressure with nitrogen, it was cooled to 90 ° C. After the completion of the reaction was confirmed by HPLC, toluene (66 parts by mass) was added, transferred to a 400LGL reactor, and cooled to 50 ° C. At this time, methanol (151 parts by mass) was added, and after cooling to 5 ° C, centrifugal filtration was performed. The obtained crude product was dispersed in toluene (66 parts by mass) and heated under reflux for 30 minutes. After cooling to 50 ° C, methanol (151 parts by mass) was added, and after cooling to 22 ° C, centrifugal filtration was performed. Further, the obtained crude product was dispersed in toluene (66 parts by mass) and heated under reflux for 30 minutes. After cooling to 50 ° C, methanol (151 parts by mass) was added, and after cooling to 22 ° C, centrifugal filtration was performed. 27.2 g of bis [9- (2-phenoxycarbonylethyl) fluorene-9-yl] methane (compound 2) was obtained as a white solid by drying under reduced pressure at 80 ° C. (yield: 61 %, HPLC purity: 99.5 area%).

Ti含有比例:40質量ppm Ti content ratio: 40 mass ppm

<實施例4-3>雙[9-(2-苯氧基羰基乙基)茀-9-基]甲烷(化合物2)之合成 <Example 4-3> Synthesis of bis [9- (2-phenoxycarbonylethyl) fluorene-9-yl] methane (compound 2)

向1L可分離式燒瓶添加實施例4-2中所獲得之雙[9-(2-苯氧基羰基乙基)茀-9-基]甲烷(化合物2,60g)、甲苯(120mL),升溫至80℃,使之溶解後,添加脫鹽水(180mL),攪拌30分鐘後,藉由分液操作而將水層廢棄。再次添加脫鹽水(180mL),攪拌30分鐘後,藉由分液操作而將水層廢棄後,將有機層進行加壓過濾(0.2MPa,ADVANTEC PTFE薄膜過濾器,孔徑0.5μm:H050A47A),將有機層添加於1L可分離式燒瓶中,進行攪拌,冷卻至40℃。此時,添加甲醇(300mL),冷卻至22℃後,進行抽氣過濾。於80℃下減壓乾燥至成為恆量,藉此獲得作為白色固體之雙[9-(2-苯氧基羰基乙基)茀-9-基]甲烷(化合物2)54.1g(產率:90%)。 To a 1 L separable flask was added the bis [9- (2-phenoxycarbonylethyl) fluorene-9-yl] methane (compound 2, 60 g) and toluene (120 mL) obtained in Example 4-2, and the temperature was raised. After dissolving at 80 ° C, demineralized water (180 mL) was added, and after stirring for 30 minutes, the aqueous layer was discarded by a liquid separation operation. Demineralized water (180 mL) was added again, and after stirring for 30 minutes, the aqueous layer was discarded by a liquid separation operation, and then the organic layer was filtered under pressure (0.2 MPa, ADVANTEC PTFE membrane filter, pore diameter 0.5 μm: H050A47A). The organic layer was added to a 1 L separable flask, stirred, and cooled to 40 ° C. At this time, methanol (300 mL) was added, and after cooling to 22 ° C, suction filtration was performed. 54.1 g of bis [9- (2-phenoxycarbonylethyl) fluorene-9-yl] methane (compound 2) was obtained as a white solid by drying under reduced pressure at 80 ° C (yield: 90). %).

Ti含有比例:<0.1質量ppm Ti content ratio: <0.1 mass ppm

<實施例4-4> <Example 4-4>

使實施例4-2中所獲得之雙[9-(2-苯氧基羰基乙基)茀-9-基]甲烷(化合物2,61.7g)溶解於氯仿,利用矽膠管柱層析法(溶離液:氯仿)進行精製。針對所獲得之氯仿溶液,利用蒸發器將氯仿減壓蒸餾去除,添加MeOH(300mL)。冷卻至室溫(20℃)後,進行抽氣過濾,於80℃下減壓乾燥至成為恆量,藉此獲得作為白色固體之雙[9-(2-苯氧基羰基乙基)茀-9-基]甲烷(化合物2)59.8g(產率:97%,HPLG純度:99.5面積%)。 The bis [9- (2-phenoxycarbonylethyl) fluorene-9-yl] methane (compound 2, 61.7 g) obtained in Example 4-2 was dissolved in chloroform, and a silica gel column chromatography ( Eluent: chloroform). With respect to the obtained chloroform solution, chloroform was distilled off under reduced pressure using an evaporator, and MeOH (300 mL) was added. After cooling to room temperature (20 ° C), suction filtration was performed, and the solution was dried under reduced pressure at 80 ° C to a constant amount, thereby obtaining bis [9- (2-phenoxycarbonylethyl) 乙基 -9 as a white solid. -Base] methane (compound 2) 59.8 g (yield: 97%, HPLG purity: 99.5 area%).

Ti含有比例:<0.1質量ppm Ti content ratio: <0.1 mass ppm

<比較例4-1>雙[9-(2-苯氧基羰基乙基)茀-9-基]甲烷(化合物2)之合成 <Comparative Example 4-1> Synthesis of bis [9- (2-phenoxycarbonylethyl) fluorene-9-yl] methane (Compound 2)

向500mL四口燒瓶中添加雙[9-(2-乙氧基羰基乙基)茀-9-基]甲烷(化合物1,35.0g,64.3mmol)、碳酸二苯酯(68.8g,321mmol)、原鈦酸四異丙酯(0.95mL,3.24mmol),將減壓度調整為2.8~3.2kPa,於135℃~150℃之溫度範圍內將副產物蒸餾去除並且攪拌6小時。冷卻至90℃,利用HPLC確認反應之結束後,添加甲苯(70mL),冷卻至50℃。此時,添加甲醇(175mL),冷卻至5℃後,進行抽氣過濾。使所獲得之白色固體分散於甲苯(70mL),進行30分鐘加熱回流。冷卻至50℃後,添加甲醇(175mL)。冷卻至室溫(20℃)後,進行抽氣過濾,於80℃下減壓乾燥至成為恆量,藉此獲得作為白色固體之雙[9-(2-苯氧基羰基乙基)茀-9-基]甲烷(化合物2)32.2g(產率:78%,HPLC純度:99.0面積%)。 To a 500 mL four-necked flask were added bis [9- (2-ethoxycarbonylethyl) fluorene-9-yl] methane (compound 1, 35.0 g, 64.3 mmol), diphenyl carbonate (68.8 g, 321 mmol), Tetraisopropyl orthotitanate (0.95 mL, 3.24 mmol), the degree of reduced pressure was adjusted to 2.8 to 3.2 kPa, the by-products were distilled off and stirred for 6 hours at a temperature range of 135 ° C to 150 ° C. After cooling to 90 ° C and confirming the completion of the reaction by HPLC, toluene (70 mL) was added and the mixture was cooled to 50 ° C. At this time, methanol (175 mL) was added, and after cooling to 5 ° C, suction filtration was performed. The obtained white solid was dispersed in toluene (70 mL) and heated under reflux for 30 minutes. After cooling to 50 ° C, methanol (175 mL) was added. After cooling to room temperature (20 ° C), suction filtration was performed, and the solution was dried under reduced pressure at 80 ° C to a constant amount, thereby obtaining bis [9- (2-phenoxycarbonylethyl) 乙基 -9 as a white solid. -Yl] methane (compound 2) 32.2 g (yield: 78%, HPLC purity: 99.0 area%).

Ti含有比例:770質量ppm Ti content ratio: 770 mass ppm

<比較例4-2> <Comparative Example 4-2>

[化146] [Chemical 146]

<比較例4-2A>雙[9-(2-甲氧基羰基乙基)茀-9-基]甲烷(化合物3)之合成 <Comparative Example 4-2A> Synthesis of bis [9- (2-methoxycarbonylethyl) fluorene-9-yl] methane (Compound 3)

向200mL四口燒瓶中添加雙(茀-9-基)甲烷(10.01g,29.06mmol)、氯化N-苄基-N,N,N-三乙基銨(1.32g,5.78mmol)、四氫呋喃(50mL),進行氮氣置換後,於水浴中控制為15~20℃,添加50%氫氧化鈉水溶液(8mL),結果溶液之顏色變為淡紅色。其後,使用冰浴將內溫控制為17~18℃,歷時3小時滴加丙烯酸甲酯(7.8mL,86mmol)。利用HPLC追蹤反應之進行,並且攪拌3小時後,利用冰浴進行冷卻,一面滴加3N鹽酸(22mL)一面以內溫不超過18℃之方式進行控制,進行驟冷。向進行分液而獲得之有機層添加甲苯(20mL),使用脫鹽水洗淨後,將溶劑減壓蒸餾去除並進行濃縮。使濃縮液恢復至室溫(20℃),添加甲醇(40mL),進行晶析。抽氣過濾後,於80℃下減壓乾燥至成為恆量,藉此獲得作為白色固體之雙[9-(2-甲氧基羰基乙基)茀-9-基]甲烷(化合物3)7.05g(產率:47.0%,HPLC純度:80.0面積%)。 To a 200 mL four-necked flask were added bis (fluoren-9-yl) methane (10.01 g, 29.06 mmol), N-benzyl-N, N, N-triethylammonium chloride (1.32 g, 5.78 mmol), and tetrahydrofuran. (50 mL), after nitrogen substitution, the temperature was controlled to 15-20 ° C. in a water bath, and a 50% aqueous sodium hydroxide solution (8 mL) was added. As a result, the color of the solution became light red. Thereafter, the internal temperature was controlled to 17 to 18 ° C. using an ice bath, and methyl acrylate (7.8 mL, 86 mmol) was added dropwise over 3 hours. The progress of the reaction was followed by HPLC, and after stirring for 3 hours, it was cooled in an ice bath, and while 3N hydrochloric acid (22 mL) was added dropwise, the internal temperature was controlled so as not to exceed 18 ° C., and quenched. To the organic layer obtained by liquid separation was added toluene (20 mL), and after washing with demineralized water, the solvent was distilled off under reduced pressure and concentrated. The concentrated solution was returned to room temperature (20 ° C), and methanol (40 mL) was added to perform crystallization. 7.05 g of bis [9- (2-methoxycarbonylethyl) fluorene-9-yl] methane (compound 3) was obtained as a white solid after suction filtration and drying under reduced pressure at 80 ° C to a constant amount. (Yield: 47.0%, HPLC purity: 80.0 area%).

<HPLC條件> <HPLC conditions>

管柱:Inertsil ODS-3V 150mm×4.8mm Column: Inertsil ODS-3V 150mm × 4.8mm

溫度:40℃ Temperature: 40 ° C

溶離液條件:0-5min:四氫呋喃/水=50/50,20min:四氫呋喃/水=100/0 Dissolution conditions: 0-5min: tetrahydrofuran / water = 50/50, 20min: tetrahydrofuran / water = 100/0

流速:1.0ml/min Flow rate: 1.0ml / min

注入量:2μL Injection volume: 2 μL

HPLC分析結果化合物4(5.9min):12.8面積%(12.8質量%),化合物6(未檢測到):未檢測到,化合物3(11.8min):80.0面積%(84.6質量%) HPLC analysis results Compound 4 (5.9min): 12.8 area% (12.8% by mass), compound 6 (not detected): Not detected, compound 3 (11.8min): 80.0% by area (84.6% by mass)

()內係表示自校正曲線算出之定量值。 () Indicates the quantitative value calculated from the calibration curve.

1H-NMR(400MHz,CDCl3)δ 7.02(m,4H),6.97(m,4H),6.84-6.76(m,8H),3.39(s,6H),3.13(s,2H),2.25(m,4H),1.15(m,4H). 1 H-NMR (400MHz, CDCl 3 ) δ 7.02 (m, 4H), 6.97 (m, 4H), 6.84-6.76 (m, 8H), 3.39 (s, 6H), 3.13 (s, 2H), 2.25 ( m, 4H), 1.15 (m, 4H).

<比較例4-2B>雙[9-(2-苯氧基羰基乙基)茀-9-基]甲烷(化合物2)之合成 <Comparative Example 4-2B> Synthesis of bis [9- (2-phenoxycarbonylethyl) fluorene-9-yl] methane (Compound 2)

向50mL三口燒瓶添加雙[9-(2-甲氧基羰基乙基)茀-9-基]甲烷(化合物3,6.0g,11.6mmol)、碳酸二苯酯(12.1g,56.6mmol)、原鈦酸四異丙酯(0.16mL,0.55mmol),升溫至145℃,並攪拌1小時。利用HPLC確認反應未進行,因此進而添加原鈦酸四異丙酯(0.32mL,1.1mmol),1小時後再次進行HPLC分析,結果確認化合物4之波峰之消失與反應之進行,因此進而於145℃下攪拌1小時。利用HPLC確認反應結束後,添加甲苯(15ml),進行1小時加熱回流。冷卻至50℃後,添加甲醇(18mL)。冷卻至室溫(20℃)後,進行抽氣過濾。使所獲得之白色固體分散於甲苯(12mL),進行1小時加熱回流。冷卻至50℃後,添加甲醇(18mL)。冷卻至室溫(20℃)後,進行抽氣過濾,於100℃下減壓乾燥至成為恆量,藉此獲得作為白色固體之雙[9-(2-苯氧基羰基乙基)茀-9-基]甲烷(化合物2)5.39g(產率:64%,HPLC純度:98.1面積%)。 To a 50 mL three-necked flask was added bis [9- (2-methoxycarbonylethyl) fluorene-9-yl] methane (compound 3, 6.0 g, 11.6 mmol), diphenyl carbonate (12.1 g, 56.6 mmol), and Tetraisopropyl titanate (0.16 mL, 0.55 mmol) was heated to 145 ° C and stirred for 1 hour. It was confirmed by HPLC that the reaction did not proceed. Therefore, tetraisopropyl orthotitanate (0.32 mL, 1.1 mmol) was further added. After 1 hour, HPLC analysis was performed again. As a result, the disappearance of the peak of Compound 4 and the progress of the reaction were confirmed. Stir for 1 hour at ℃. After confirming the completion of the reaction by HPLC, toluene (15 ml) was added, and the mixture was heated under reflux for 1 hour. After cooling to 50 ° C, methanol (18 mL) was added. After cooling to room temperature (20 ° C), suction filtration was performed. The obtained white solid was dispersed in toluene (12 mL) and heated under reflux for 1 hour. After cooling to 50 ° C, methanol (18 mL) was added. After cooling to room temperature (20 ° C), suction filtration was performed, and the solution was dried under reduced pressure at 100 ° C to a constant amount, thereby obtaining bis [9- (2-phenoxycarbonylethyl) 乙基 -9 as a white solid. -Yl] methane (compound 2) 5.39 g (yield: 64%, HPLC purity: 98.1 area%).

Ti含有比例:3300質量ppm Ti content: 3300 ppm by mass

<參考例4-1> <Reference Example 4-1>

將雙[9-(2-苯氧基羰基乙基)茀-9-基]甲烷(化合物2,1201質量份)之32.7wt%鄰二甲苯溶液於玻璃襯裡製12m3反應器中自86℃慢慢地 降溫,於達到60℃之時間點添加甲醇(551質量份),進而於達到55℃之時間點添加晶種,使結晶析出。其後,歷時5hr冷卻至40℃,歷時1hr添加甲醇(3548質量份),進而歷時5hr冷卻至21℃。利用離心過濾分10批取得結晶,利用錐形乾燥器分2批於80℃下進行乾燥直至成為恆量,藉此獲得作為白色固體之雙[9-(2-苯氧基羰基乙基)茀-9-基]甲烷(化合物2)1125質量份(回收率:94%,HPLC純度:99.8面積%)。 A 32.7 wt% o-xylene solution of bis [9- (2-phenoxycarbonylethyl) fluorene-9-yl] methane (compound 2,1201 parts by mass) in a glass-lined 12m 3 reactor was heated at 86 ° C. The temperature was gradually lowered, and methanol (551 parts by mass) was added at a time point when the temperature reached 60 ° C, and seed crystals were further added at a time point when the temperature reached 55 ° C to precipitate crystals. Then, it cooled to 40 degreeC over 5 hours, methanol (3548 mass parts) was added over 1 hour, and it cooled to 21 degreeC over 5 hours. The crystals were obtained by centrifugal filtration in 10 batches, and dried in a conical dryer at 80 ° C in two batches until a constant amount was obtained, thereby obtaining bis [9- (2-phenoxycarbonylethyl) fluorene- as a white solid. 1-125 parts by mass of 9-yl] methane (compound 2) (recovery rate: 94%, HPLC purity: 99.8 area%).

平均粒徑:178μm、50μm以上粒徑累積%:99% Average particle size: 178μm, cumulative particle size above 50μm%: 99%

旋轉靜止角:55° Rotation angle: 55 °

粉末X射線繞射圖案:2θ=6.9°、9.8°、10.3°、11.7°、12.0°、12.7°、13.3°、13.8°、15.0°、15.8°、17.3°、17.9°、18.9°、19.6° Powder X-ray diffraction pattern: 2θ = 6.9 °, 9.8 °, 10.3 °, 11.7 °, 12.0 °, 12.7 °, 13.3 °, 13.8 °, 15.0 °, 15.8 °, 17.3 °, 17.9 °, 18.9 °, 19.6 °

<參考例4-2> <Reference Example 4-2>

將雙[9-(2-苯氧基羰基乙基)茀-9-基]甲烷(化合物2,1224質量份)之32.0wt%鄰二甲苯溶液於玻璃襯裡製12m3反應器中自81℃慢慢地降溫,於達到68℃之時間點添加晶種。其後,冷卻至49℃,歷時1hr添加甲醇(4579質量份),進而歷時5hr冷卻至21℃。利用離心過濾分6批取得結晶,利用錐形乾燥器分2批於80℃下進行乾燥直至成為恆量,藉此獲得作為白色固體之雙[9-(2-苯氧基羰基乙基)茀-9-基]甲烷(化合物2)1043質量份(回收率:85%,HPLC純度:99.8面積%)。 A 32.0 wt% o-xylene solution of bis [9- (2-phenoxycarbonylethyl) fluorene-9-yl] methane (compound 2,1224 parts by mass) was placed in a glass-lined 12m 3 reactor from 81 ° C. Slowly lower the temperature and add seeds when the temperature reaches 68 ° C. Then, it cooled to 49 degreeC, methanol (4579 mass parts) was added over 1 hour, and it cooled to 21 degreeC over 5 hours. The crystals were obtained by centrifugal filtration in 6 batches, and dried in a cone dryer at 80 ° C in 2 batches until a constant amount was obtained, thereby obtaining bis [9- (2-phenoxycarbonylethyl) fluorene- as a white solid. 10-43 parts by mass of 9-yl] methane (compound 2) (recovery rate: 85%, HPLC purity: 99.8 area%).

平均粒徑:44μm、50μm以上粒徑累積%:30% Average particle size: 44μm, 50% or more cumulative particle size%: 30%

旋轉靜止角:62° Rotation angle: 62 °

<參考例4-3> <Reference Example 4-3>

將玻璃襯裡製1m3反應器進行氮氣置換後,添加雙[9-(2-苯氧基羰基乙基)茀-9-基]甲烷(化合物2,250質量份)、鄰二甲苯(450質量份),升溫至100℃以上,使之溶解。其後,冷卻至80℃,添加晶種後,於1小時內以10℃之冷卻速度冷卻至20℃,開始離心過濾。 After replacing the glass-lined 1m 3 reactor with nitrogen, bis [9- (2-phenoxycarbonylethyl) fluorene-9-yl] methane (compound 2, 250 parts by mass) and o-xylene (450 parts by mass) were added. Parts), heated to 100 ° C or higher to dissolve. Then, it cooled to 80 degreeC, and after adding a seed crystal, it cooled to 20 degreeC at the cooling rate of 10 degreeC within 1 hour, and started centrifugation filtration.

第1次離心可順利地進行過濾,但反應器中之結晶漸漸地微粉 化,從而漿料性狀戲劇性地變差,可進行過濾直至第3次離心,但其後抽出變困難,使離心過濾中斷。將直至第3次離心所獲得者於80℃下進行乾燥直至成為恆量,藉此獲得作為白色固體之雙[9-(2-苯氧基羰基乙基)茀-9-基]甲烷(化合物2)63.2質量份(回收率:25%)。 The first centrifugation allowed smooth filtration, but the crystals in the reactor gradually became fine. As a result, the slurry properties are dramatically deteriorated, and filtration can be performed until the third centrifugation, but subsequent extraction becomes difficult and the centrifugal filtration is interrupted. The obtained by the third centrifugation was dried at 80 ° C until a constant amount was obtained, thereby obtaining bis [9- (2-phenoxycarbonylethyl) fluorene-9-yl] methane (Compound 2) as a white solid. ) 63.2 parts by mass (recovery rate: 25%).

第1次離心 1st centrifugation

粉末X射線繞射圖案:2θ=5.6°、6.9°、8.5°、9.8°、10.3°、11.0°、11.7°、12.0°、12.5°、12.7°、12.9°、13.3°、13.8°、14.9°、15.0°、15.8°、17.3°、17.9°、16.3°、18.9°、19.1°、19.6° Powder X-ray diffraction pattern: 2θ = 5.6 °, 6.9 °, 8.5 °, 9.8 °, 10.3 °, 11.0 °, 11.7 °, 12.0 °, 12.5 °, 12.7 °, 12.9 °, 13.3 °, 13.8 °, 14.9 ° , 15.0 °, 15.8 °, 17.3 °, 17.9 °, 16.3 °, 18.9 °, 19.1 °, 19.6 °

平均粒徑:220μm、50μm以上粒徑累積%:88% Average particle diameter: 220μm, cumulative particle diameter above 50μm%: 88%

第3次離心 3rd centrifugation

粉末X射線繞射圖案:2θ=6.9°、9.8°、10.3°、11.7°、12.0°、12.7°、13.3°、13.8°、15.0°、15.8°、17.3°、17.9°、18.9°、19.6° Powder X-ray diffraction pattern: 2θ = 6.9 °, 9.8 °, 10.3 °, 11.7 °, 12.0 °, 12.7 °, 13.3 °, 13.8 °, 15.0 °, 15.8 °, 17.3 °, 17.9 °, 18.9 °, 19.6 °

平均粒徑:25μm、50μm以上粒徑累積%:5% Average particle size: 25μm, cumulative particle size above 50μm%: 5%

若將實施例4-1與實施例4-2進行比較,則可知藉由增加甲苯/甲醇之晶析次數,從而目標之寡聚茀二芳酯(化合物2)之Ti含量自330ppm減少至40ppm。又,若將實施例4-1與比較例4-1進行比較,則可知於比較例4-1中,藉由將甲苯/甲醇晶析溫度自室溫降低至5℃,從而產率自60%被改善為78%,但Ti之殘留量自330ppm大幅增加為770ppm而變差。又,於比較例4-2中,於使用以超過10質量%之比例含有寡聚茀二羧酸之原料之情形時,若為特定量之酯交換反應觸媒,則反應未進行,而必須追加酯交換反應觸媒。可認為其原因在於:寡聚茀二羧酸與酯交換反應觸媒之Ti化合物形成錯合物而去活化。因此,可知所獲得之寡聚茀二芳酯(化合物2)之Ti含量大幅增加。於實施例4-3中,對實施例4-2中所獲得之化合物2實施水洗步驟與加壓過濾,於實施例4-4中,利用矽膠管柱層析法對實施例4-2中所獲得之化合物進行精製,藉此可將Ti含量減少至檢測極限以下。尤其是利用水洗步驟與 加壓過濾之精製方法因成本相對較低,且亦可工業性地實施,故而可謂優異之精製方法。 Comparing Example 4-1 with Example 4-2, it can be seen that by increasing the number of crystallization times of toluene / methanol, the target oligomeric diaryl diaryl ester (compound 2) has a reduced Ti content from 330 ppm to 40 ppm. . In addition, if Example 4-1 is compared with Comparative Example 4-1, it can be seen that in Comparative Example 4-1, the toluene / methanol crystallization temperature was lowered from room temperature to 5 ° C, so that the yield was 60%. It was improved to 78%, but the residual amount of Ti was significantly increased from 330 ppm to 770 ppm and deteriorated. In Comparative Example 4-2, when a raw material containing oligomeric dicarboxylic acid was used in a proportion of more than 10% by mass, if the transesterification reaction catalyst was used in a specific amount, the reaction did not proceed and it was necessary to Added transesterification catalyst. The reason is believed to be that the oligomeric dicarboxylic acid and the Ti compound of the transesterification reaction catalyst form a complex and are deactivated. Therefore, it can be seen that the Ti content of the obtained oligomeric fluorene diaryl ester (compound 2) is greatly increased. In Example 4-3, the compound 2 obtained in Example 4-2 was subjected to a water washing step and pressure filtration. In Example 4-4, silica gel column chromatography was applied to Example 4-2. The obtained compound is refined, whereby the Ti content can be reduced below the detection limit. Especially with water washing steps and The refining method of pressure filtration is relatively excellent because it has a relatively low cost and can also be implemented industrially.

將各實施例及比較例之寡聚茀二酯中之Ti含量、與熱穩定性評估之結果進行整理並示表6。 The Ti content in the oligomeric fluorene diesters of each Example and Comparative Example and the results of thermal stability evaluation are summarized and shown in Table 6.

繼而,基於表6,對於利用加熱之熔融狀態下之結晶之色調變化進行討論。關於加熱前之色調,於實施例4-1中為略微發黃之淡黃色,但實施例4-2、實施例4-3及實施例4-4係白色。相對於此,比較例4-1、比較例4-2係自加熱前著色為黃色。進而於185℃下進行7小時加熱,結果於實施例4-3、實施例4-4中未發現著色,獲得無色透明之結晶。發現實施例4-2、實施例4-1、比較例4-1及比較例4-2有隨著Ti含量增加,而著色明顯變濃之傾向,尤其是比較例4-1、比較例4-2之加熱後之結晶為褐色。 Next, based on Table 6, the change in hue of the crystals in the molten state by heating is discussed. Regarding the color tone before heating, it was a slightly yellowish yellowish color in Example 4-1, but Example 4-2, Example 4-3, and Example 4-4 were white. In contrast, Comparative Examples 4-1 and 4-2 were colored yellow before self-heating. Further, heating was performed at 185 ° C for 7 hours. As a result, no coloring was found in Example 4-3 and Example 4-4, and colorless and transparent crystals were obtained. It was found that in Example 4-2, Example 4-1, Comparative Example 4-1, and Comparative Example 4-2, as the Ti content increased, the coloring tended to become noticeably thicker, especially Comparative Example 4-1 and Comparative Example 4 The crystals of -2 are brown after heating.

著色之詳細原因並未明確,但可認為金屬成分之螯合物化為原因之一。 The detailed reason for the coloring is not clear, but chelation of the metal component is considered to be one of the reasons.

繼而,基於圖1,根據1wt%THF溶液之400nm之吸光度變化而對加熱前後之色調變化進行討論。根據圖1,實施例4-2(40ppm)、實施例4-3(<0.1ppm)、實施例4-4(<0.1ppm)於加熱前後基本上未發現THF溶液之吸光度產生變化。於實施例4-1(330ppm)與比較例4-1(770 ppm)中,Ti含量為2倍左右,但發現其吸光度差為接近4倍之差。根據上述情況,而確認對於Ti含量對色調之影響而言,實施例4-1之330ppm與比較例4-1之770ppm之間有較大之差距。又,關於比較例4-2(3300ppm),色調之變差,又不溶成分之析出激烈,400nm之吸光度測定困難。 Then, based on FIG. 1, the change in hue before and after heating is discussed based on the change in absorbance at 400 nm of a 1% by weight THF solution. According to FIG. 1, in Example 4-2 (40 ppm), Example 4-3 (<0.1 ppm), and Example 4-4 (<0.1 ppm), no change in the absorbance of the THF solution was observed before and after heating. In Example 4-1 (330ppm) and Comparative Example 4-1 (770 In ppm), the Ti content was about 2 times, but the difference in absorbance was found to be a difference close to 4 times. Based on the above, it was confirmed that there was a large gap between the 330 ppm of Example 4-1 and the 770 ppm of Comparative Example 4-1 regarding the effect of Ti content on hue. In Comparative Example 4-2 (3300 ppm), the color tone was deteriorated, the precipitation of insoluble components was intense, and the absorbance measurement at 400 nm was difficult.

根據上述情況而顯現如下情況,即藉由使用本發明之寡聚茀二酯,從而即便於熔融狀態下色調之變化亦較少,因此可抑制可於經過熔融製程時產生之樹脂組合物之著色。 According to the above situation, there is a case where, by using the oligomeric fluorene diester of the present invention, there is less change in color tone even in a molten state, and therefore, it is possible to suppress the coloration of the resin composition that can be generated during the melting process. .

若將如圖2所示般於12m3之玻璃襯裡製反應器中進行晶析之參考例4-1與參考例4-2進行比較,則參考例4-2中所獲得之結晶之平均粒徑較小為44μm,作為粉體流動性之指標之旋轉靜止角亦顯示62°之較高值。相對於此,於參考例4-1中藉由將甲醇分割進行添加,從而結晶之平均粒徑變大為178μm,且旋轉靜止角亦改善為55°。根據以上情況而顯現如下情況:藉由使用本發明之平均粒徑較大之結晶,即便用作樹脂原料,添加性亦無問題。 Comparing Reference Example 4-1 and Reference Example 4-2 for crystallization in a 12 m 3 glass-lined reactor as shown in FIG. 2, the average grain size of the crystals obtained in Reference Example 4-2 The smaller diameter is 44 μm, and the rotation rest angle, which is an index of powder flowability, also shows a higher value of 62 °. On the other hand, in Reference Example 4-1, by adding and dividing methanol, the average particle diameter of the crystals was increased to 178 μm, and the rotation rest angle was also improved to 55 °. From the above, the following appears. By using a crystal having a large average particle diameter according to the present invention, there is no problem in the addability even if it is used as a resin raw material.

於參考例4-3中僅利用作為良溶劑之鄰二甲苯進行晶析時,明確可獲得第1次離心之乾燥後之平均粒徑較大為220μm之良好之結晶,但隨時間漿料溶液之性狀向黏性較高之濃湯狀懸濁液變化,第3次離心之乾燥後之平均粒徑微粉化至25μm。又,第3次離心以後,流動性進一步變差,因此自反應液之萃取變困難,離心過濾中斷,而再次溶解。又,針對使第1次離心所獲得者乾燥後之粉末實施XRD分析,結果觀察到2θ=5.6°、8.5°、11.0°、12.5°、12.9°、14.9°、16.3°、19.1°之波峰,自使第3次離心所獲得者乾燥而成之粉末未觀察到上述波峰。根據上述情況可明確:第1次離心之粉末含有準穩定形之結晶,隨著慢慢地向穩定形相位轉變而微粉化。 In Reference Example 4-3, when crystallization was performed using only o-xylene as a good solvent, it was clear that good crystals having an average particle size of 220 μm and larger after drying in the first centrifugation were obtained. The properties changed to a thick soup-like suspension with higher viscosity. The average particle size after drying for the third centrifugation was micronized to 25 μm. After the third centrifugation, the fluidity was further deteriorated. Therefore, extraction from the reaction solution became difficult, the centrifugal filtration was interrupted, and the solution was dissolved again. Further, XRD analysis was performed on the powder obtained by drying the powder obtained from the first centrifugation, and as a result, the peaks of 2θ = 5.6 °, 8.5 °, 11.0 °, 12.5 °, 12.9 °, 14.9 °, 16.3 °, 19.1 ° were observed. The powder obtained by drying the third centrifugation did not observe the above-mentioned peaks. According to the above situation, it is clear that the powder in the first centrifugation contains quasi-stable crystals, and gradually turns into a stable phase to be micronized.

於參考例4-1之良溶劑使用鄰二甲苯,不良溶劑使用甲醇之情形 時,2θ=5.6°、8.5°、11.0°、12.5°、12.9°、14.9°、16.3°、19.1°之波峰未被觀察到,亦未引起微粉化,因此可認為可藉由良溶劑使用鄰二甲苯所代表之芳香族烴,不良溶劑使用甲醇所代表之醇系溶劑而獲得平均粒徑較大之粒子。 When o-xylene is used as the good solvent and methanol is used as the poor solvent in Reference Example 4-1 At 2θ = 5.6 °, 8.5 °, 11.0 °, 12.5 °, 12.9 °, 14.9 °, 16.3 °, 19.1 °, the peaks were not observed and did not cause micronization. Therefore, it can be considered that the adjacent two can be used by good solvents. For aromatic hydrocarbons represented by toluene, alcohol-based solvents represented by methanol are used as poor solvents to obtain particles with a larger average particle size.

[聚合物之合成例] [Synthesis example of polymer]

<參考例4-4> <Reference Example 4-4>

將雙[9-(2-苯氧基羰基乙基)茀-9-基]甲烷(化合物2)26.63質量份(0.042莫耳)、CHDM 10.78質量份(0.075莫耳)、ISB 33.58質量份(0.230莫耳)、DPC 56.33質量份(0.263莫耳)及作為觸媒之乙酸鈣一水合物5.36×10-4質量份(3.04×10-6莫耳)投入反應容器,於氮氣環境下,將加熱槽溫度設為150℃,視需要進行攪拌,並且使原料溶解(約10分鐘)。溶解後,於反應第1階段之步驟中,歷時30分鐘升溫至220℃,於常壓下反應60分鐘。繼而歷時90分鐘將壓力自常壓減壓至13.3kPa,於13.3kPa下保持30分鐘,將所產生之苯酚向反應容器外抽出。 Bis [9- (2-phenoxycarbonylethyl) fluorene-9-yl] methane (compound 2) 26.63 parts by mass (0.042 moles), CHDM 10.78 parts by mass (0.075 moles), and ISB 33.58 parts by mass ( 0.230 moles), 56.33 parts by mass of DPC (0.263 moles), and 5.36 × 10-4 parts by mass (3.04 × 10 -6 moles) of calcium acetate monohydrate as a catalyst are put into a reaction vessel. The temperature of the heating tank was set to 150 ° C, and if necessary, the raw materials were dissolved while being stirred (about 10 minutes). After dissolving, in the step of the first stage of the reaction, the temperature was raised to 220 ° C. over 30 minutes, and the reaction was performed at normal pressure for 60 minutes. Then, the pressure was reduced from normal pressure to 13.3 kPa over 90 minutes, and kept at 13.3 kPa for 30 minutes, and the generated phenol was extracted out of the reaction vessel.

繼而於反應第2階段之步驟中,歷時15分鐘使加熱槽之溫度升溫至240℃,並且歷時15分鐘將壓力減壓至0.10kPa以下,將所產生之苯酚向反應容器外抽出。達到特定之轉矩後,使反應結束,將所產生之聚合物於水中擠出,而獲得聚碳酸酯之顆粒物。 Then, in the second step of the reaction, the temperature of the heating tank was raised to 240 ° C. over 15 minutes, and the pressure was reduced to less than 0.10 kPa over 15 minutes, and the generated phenol was drawn out of the reaction vessel. After reaching a specific torque, the reaction is completed, and the polymer produced is extruded in water to obtain polycarbonate pellets.

於表7表示將所獲得之樹脂組合物進行膜成形並進行延伸時之延伸膜之折射率各向異性、相位差比(Re450/Re550)等之測定結果。 Table 7 shows the measurement results of the refractive index anisotropy, retardation ratio (Re450 / Re550), and the like of the stretched film when the obtained resin composition is formed into a film and stretched.

<參考例4-5> <Reference Example 4-5>

將9,9-雙(4-(2-羥基乙氧基)苯基)茀(BHEPF)62.40質量份(0.142莫耳)、ISB 28.78質量份(0.197莫耳)、DPC 73.40質量份(0.343莫耳)、及作為觸媒之乙酸鎂四水合物7.28×10-4質量份(3.39×10-6莫耳)投入反應容器,於氮氣環境下,將加熱槽溫度設為150℃,視需要進行攪拌,並且使原料溶解(約10分鐘)。溶解後,於反應第1階段之步驟中,歷 時30分鐘升溫至220℃,於常壓下反應60分鐘。繼而歷時90分鐘將壓力自常壓減壓至13.3kPa,於13.3kPa下保持30分鐘,將所產生之苯酚向反應容器外抽出。 9,9-bis (4- (2-hydroxyethoxy) phenyl) fluorene (BHEPF) 62.40 parts by mass (0.142 moles), ISB 28.78 parts by mass (0.197 moles), DPC 73.40 parts by mass (0.343 moles) Ear), and 7.28 × 10 -4 parts by mass (3.39 × 10 -6 mol) of magnesium acetate tetrahydrate as a catalyst are put into the reaction vessel, and the temperature of the heating tank is set to 150 ° C. in a nitrogen atmosphere, and carried out as needed Stir and dissolve the material (about 10 minutes). After dissolving, in the step of the first stage of the reaction, the temperature was raised to 220 ° C. over 30 minutes, and the reaction was performed at normal pressure for 60 minutes. Then, the pressure was reduced from normal pressure to 13.3 kPa over 90 minutes, and kept at 13.3 kPa for 30 minutes, and the generated phenol was extracted out of the reaction vessel.

繼而於反應第2階段之步驟中,歷時15分鐘使加熱槽之溫度升溫至240℃,並且歷時15分鐘將壓力減壓至0.10kPa以下,將所產生之苯酚向反應容器外抽出。達到特定之轉矩後,使反應結束,將所產生之聚合物於水中擠出,而獲得聚碳酸酯之顆粒物。 Then, in the second step of the reaction, the temperature of the heating tank was raised to 240 ° C. over 15 minutes, and the pressure was reduced to less than 0.10 kPa over 15 minutes, and the generated phenol was drawn out of the reaction vessel. After reaching a specific torque, the reaction is completed, and the polymer produced is extruded in water to obtain polycarbonate pellets.

於表7表示將所獲得之樹脂組合物進行膜成形並進行延伸時之延伸膜之折射率各向異性、相位差比(Re450/Re550)等之測定結果。 Table 7 shows the measurement results of the refractive index anisotropy, retardation ratio (Re450 / Re550), and the like of the stretched film when the obtained resin composition is formed into a film and stretched.

自表7可知,若將參考例4-4之使用化合物2之聚酯碳酸酯與參考例4-5之使用BHEPF之聚碳酸酯進行比較,則參考例4-4者以較少之單體量,且因相位差比(Re450/Re550)同等而顯現較強之反波長色散性。進而,光彈性係數亦為一半以下之值。根據上述情況,可謂本發明之寡聚茀二酯係非常優異之單體。 It can be known from Table 7 that if the polyester carbonate using compound 2 of reference example 4-4 is compared with the polycarbonate using BHEPF of reference example 4-5, those of reference example 4-4 use less monomer. It has the same inverse wavelength dispersion as the phase difference ratio (Re450 / Re550) is the same. Furthermore, the photoelastic coefficient is also a value less than half. Based on the above, it can be said that the oligomeric fluorene diester of the present invention is a very excellent monomer.

已詳細且參照特定之實施態樣對本發明進行了說明,但對業者而言很明確,可不脫離本發明之精神及範圍而添加各種變更或修正。本申請案係基於2014年2月27日提出申請之日本專利申請(日本專利特願2014-037216)、2014年3月19日提出申請之日本專利申請(日本專利 特願2014-056873)、2014年4月4日提出申請之日本專利申請(日本專利特願2014-078068)、及2014年4月16日提出申請之日本專利申請(日本專利特願2014-084649)者,其內容係作為參照被併入本文中。 Although the present invention has been described in detail and with reference to specific embodiments, it is clear to the practitioner that various changes or modifications can be added without departing from the spirit and scope of the present invention. This application is based on a Japanese patent application filed on February 27, 2014 (Japanese Patent Application No. 2014-037216), and a Japanese patent application filed on March 19, 2014 (Japanese Patent Japanese Patent Application No. 2014-056873), Japanese Patent Application (Japanese Patent Application No. 2014-078068) filed on April 4, 2014, and Japanese Patent Application (Japanese Patent Application No. 2014-084649, filed on April 16, 2014) ), Whose content is incorporated herein by reference.

Claims (11)

一種樹脂,其特徵在於:其係具有包含芳香族結構之重複結構單元之聚縮合系樹脂,並且該重複結構單元中之芳香族結構之含量滿足下述式(I),該樹脂具有選自下述式(1)及式(2)所表示之結構單元中之至少1個結構單元,5≦A≦-22.5×B+38.3 (I)其中,0.75≦B≦0.93 A:構成樹脂之重複結構單元中之芳香族結構之含量[質量%]B:由樹脂所製作之延伸膜於450nm下之相位差(R450)與於550nm下之相位差(R550)的比(R450/R550) (式(1)及(2)中,R1~R3分別獨立為直接鍵、或可具有取代基之碳數1~4之伸烷基;R4~R9分別獨立為氫原子、可具有取代基之碳數1~10之烷基、可具有取代基之碳數4~10之芳基、可具有取代基之碳數1 ~10之醯基、可具有取代基之碳數1~10之醯氧基、可具有取代基之碳數1~10之烷氧基、可具有取代基之碳數1~10之芳氧基、可具有取代基之胺基、可具有取代基之碳數1~10之乙烯基、可具有取代基之碳數1~10之乙炔基、具有取代基之硫原子、具有取代基之矽原子、鹵素原子、硝基、或氰基;其中,R4~R9中鄰接之至少2個基亦可相互鍵結而形成環)。 A resin characterized in that it is a polycondensation resin having a repeating structural unit including an aromatic structure, and the content of the aromatic structure in the repeating structural unit satisfies the following formula (I). At least one of the structural units represented by the formulas (1) and (2), 5 ≦ A ≦ -22.5 × B + 38.3 (I) where 0.75 ≦ B ≦ 0.93 A: a repeating structure constituting a resin The content of the aromatic structure in the unit [mass%] B: the ratio (R450 / R550) of the phase difference (R450) at 450nm and the phase difference (R550) at 550nm of the stretched film made of resin (In the formulae (1) and (2), R 1 to R 3 are each independently a direct bond or an alkylene group having 1 to 4 carbon atoms which may have a substituent; R 4 to R 9 are each independently a hydrogen atom and may be Alkyl groups having 1 to 10 carbon atoms having substituents, aryl groups having 4 to 10 carbon atoms having substituents, fluorenyl groups having 1 to 10 carbon atoms having substituents, and 1 to 10 carbon atoms having substituents Alkoxy group of 10, alkoxy group of 1 to 10 carbons which may have a substituent, aryloxy group of 1 to 10 carbons which may have a substituent, amine group which may have a substituent, carbon which may have a substituent A vinyl group having 1 to 10, an ethynyl group having 1 to 10 carbons which may have a substituent, a sulfur atom having a substituent, a silicon atom having a substituent, a halogen atom, a nitro group, or a cyano group; wherein R 4 At least two adjacent groups in ~ R 9 may be bonded to each other to form a ring). 一種樹脂,其特徵在於:其係具有包含芳香族結構之重複結構單元之聚縮合系樹脂,並且該重複結構單元中之芳香族結構之含量滿足下述式(III),且該樹脂之玻璃轉移溫度為110℃以上且160℃以下,該芳香族結構係類苯芳香族環或雜芳香環,5≦A≦-22.5×B+34.8 (III)其中,0.75≦B≦0.93 A:構成樹脂之重複結構單元中之芳香族結構之含量[質量%]B:由樹脂所製作之延伸膜於450nm下之相位差(R450)與於550nm下之相位差(R550)的比(R450/R550)。 A resin characterized in that it is a polycondensation resin having a repeating structural unit including an aromatic structure, and the content of the aromatic structure in the repeating structural unit satisfies the following formula (III), and the glass transition of the resin is The temperature is 110 ° C or more and 160 ° C or less. The aromatic structure is benzene-like aromatic ring or heteroaromatic ring, 5 ≦ A ≦ -22.5 × B + 34.8 (III), among which 0.75 ≦ B ≦ 0.93 A: constituting the resin Content of the aromatic structure in the repeating structural unit [mass%] B: The ratio (R450 / R550) of the phase difference (R450) at 450 nm and the phase difference (R550) at 550 nm of the stretched film made of the resin. 如請求項1或2之樹脂,其於鈉d線(589nm)下之折射率為1.49~1.56。 If the resin of claim 1 or 2 has a refractive index under the sodium d-line (589 nm) of 1.49 to 1.56. 如請求項1或2之樹脂,其儲存彈性模數為1GPa以上且2.7GPa以下。 For example, the resin of claim 1 or 2 has a storage elastic modulus of 1 GPa or more and 2.7 GPa or less. 如請求項1或2之樹脂,其於測定溫度240℃、剪切速度91.2sec-1下之熔融黏度為700Pa‧s以上且5000Pa‧s以下。 For example, the resin of item 1 or 2 has a melt viscosity at a measurement temperature of 240 ° C and a shear rate of 91.2 sec -1 of 700 Pa · s to 5000 Pa · s. 如請求項1或2之樹脂,其中上述樹脂係選自由聚碳酸酯、聚酯、聚酯碳酸酯所組成之群中之至少1種樹脂。 The resin of claim 1 or 2, wherein the resin is at least one resin selected from the group consisting of polycarbonate, polyester, and polyester carbonate. 如請求項1或2之樹脂,其中上述重複結構單元所包含之芳香族結構僅為茀。 For example, the resin of claim 1 or 2, wherein the aromatic structure contained in the repeating structural unit is only fluorene. 如請求項1或2之樹脂,其含有下述式(3)所表示之結構單元, If the resin of claim 1 or 2 contains a structural unit represented by the following formula (3), 一種透明膜,其含有如請求項1至8中任一項之樹脂。 A transparent film containing the resin according to any one of claims 1 to 8. 一種相位差膜,其係藉由將如請求項9之透明膜沿至少1個方向進行延伸而獲得。 A retardation film is obtained by extending a transparent film as claimed in claim 9 in at least one direction. 如請求項10之相位差膜,其包含單一層,且膜厚為10μm以上且60μm以下。 For example, the retardation film of claim 10 includes a single layer and has a film thickness of 10 μm or more and 60 μm or less.
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