TWI671421B - Silicon deposition reactor with bottom seal arrangement - Google Patents

Abstract

The invention discloses a fluidized bed reactor system for producing high-purity silicon-coated particles. A container has: an outer shell; an insulating layer positioned inside the outer shell; a concentric inner shell positioned inside the outer shell; and a concentric gasket positioned inside the outer shell The inside of the housing and defines a reactor chamber. The inner shell and the gasket are sealed together at their bottoms by an O-ring seal arrangement to prevent gas in the reactor chamber from entering the space between the inner shell and the gasket . A central inlet nozzle produces a vertical plume of gas in the reactor chamber.

Description

Silicon deposition reactor with bottom sealed configuration

The present disclosure relates to a reactor for thermally decomposing a silicon-bearing gas in a fluidized bed in order to generate silicon-coated particles.

[Cross Reference for Related Applications]

The present invention claims the right of US Provisional Application No. 62 / 099,057 filed on December 31, 2014, which is incorporated herein by reference in its entirety.

Thermal decomposition of a silicon-bearing gas in a fluidized bed is an attractive process for producing polycrystalline silicon for the photovoltaic and semiconductor industries due to its superior quality in relation to heat transfer, large deposition surfaces, and continuous production. Compared to a Siemens-type reactor, the fluidized-bed reactor provides a significantly higher production rate with a small amount of energy consumption. The fluidized bed reactor can be continuous and highly automated in order to significantly reduce labor costs.

One such fluidized bed reactor has been described in WO2011063007 A2 and is shown in FIG. 1. In the reactor, an inner shell extends substantially vertically through the reactor and is substantially cylindrical with a substantially circular cross section. A gasket on the inside of the inner casing extends substantially vertically through the reactor and is also generally of a generally circular cross-section. Cylindrical. The gasket defines the reactor chamber and protects the inner casing from abrasion damage by silicon-coated particles. The pad is composed of one or more materials selected to avoid contamination of the silicon particles. Therefore, the gasket will protect the seed particles and product particles in the fluidized bed from being contaminated by the inner shell material and / or the container wall material.

The inner shell and the gasket of WO2011063007 A2 are separated by a gap, so that a cylindrical annular space is provided between the inner shell and the gasket. A seal is provided at the bottom of the inner housing to prevent gases and particulate materials from entering the space from the reaction chamber.

Because the inner casing and the gasket are made of different materials having different thermal expansion coefficients, and because the gas pressure in the reaction chamber during operation of the reactor is different from that of the inner casing and the gasket There is a relationship between the pressure of the gas in the space, so there will be problems.

A special problem in this system is that the seal between the inner casing and the gasket is ineffective. In this system, a typical seal configuration is a flat washer between two flat horizontal metal surfaces. This configuration can be problematic because the gasket is held in place only by friction between the flat surfaces. Fluid bed reactors generate large vibrations during operation. Therefore, when vibration and pressure surges cause the components at the bottom of the reactor to shift in the vicinity, the flat gasket will slowly slide out between the two flat metal surfaces.

Another problem is that when a certain process is turned over, the inner edge surface of a flat gasket will directly contact the silicon particles inside the reactor chamber. The gasket can overheat and fail due to direct contact with hot silicon particles. Once the innermost area of a flat gasket fails and comes off, the hot silicon particles will act on the next layer and eventually "burn through" the entire gasket, thereby destroying the integrity of the seal. This also affects product quality. Some broken washers Material enters the reactor chamber and contaminates the silicon particles contained therein.

Therefore, what is needed in the art is a sealed configuration that can operate effectively under the conditions that occur in a fluidized bed reactor for silicon deposition.

The invention discloses a fluidized bed reactor system for producing high-purity silicon-coated particles. The fluidized bed reactor systems include a liner composed of a material that will minimize particulate contamination in the fluidized bed. In the reactor, an inner shell extends substantially vertically through the reactor and is substantially cylindrical with a substantially circular cross section. A gasket inside the inner casing extends substantially vertically through the reactor and is also generally cylindrical with a generally circular cross-section. The gasket defines the reactor chamber and protects the inner casing from abrasion damage caused by contact with particles coated with silicon.

One system includes a container having: an outer shell; an insulating layer abutting an inner surface of the outer shell; and a generally cylindrical inner shell positioned inside the insulating layer and positioned in a plurality Heater inside. The advantage is that the inner casing is made of a high temperature alloy. A substantially cylindrical gasket is positioned inside the inner casing, and a cylindrical annular space is provided between the inner casing and the gasket. The pad defines a reaction chamber containing a plurality of seed particles and / or silicon-coated particles. The gasket can be made of non-contaminating materials, including but not limited to: quartz, silicon, low nickel alloy, high temperature alloy, cobalt alloy, silicon nitride, graphite, silicon carbide, molybdenum, or molybdenum alloy .

Both the inner shell and the bottom surface of the gasket are supported near the bottom of the reactor. A support assembly includes a plurality of devices that are arranged to seal the bottom of a space interposed between the inner case and the gasket so as to block gas and particulate material from entering the space. The assembly The advantage is that one or more O-rings are included between facing surfaces of adjacent steel reactor components. Each O-ring is housed in an annular channel or groove defined in the horizontal surface of a steel reactor component. The O-ring is located at a certain radially outward distance defining the surface (s) of the reactor chamber, so that the hot silicon particles located inside the chamber will not touch the O-rings. Therefore, the silicon particles will not be contaminated by contact with the O-ring. The integrity of the O-ring is maintained because the hot particles cannot touch the O-ring because the steel components absorb most of the heat and conduct it outward. The advantage is that the O-ring is provided at an upper surface and a lower surface of a steel seal ring located between the inner casing and the gasket. This steel sealing ring helps dissipate heat. Because each O-ring is located in an annular groove, the O-ring cannot slide out of the correct position.

The system further includes a reactive gas inlet nozzle, one or more inlets for fluidizing the gas, for example, a plurality of fluidizing nozzles, and at least one outlet for silicon product removal.

The foregoing summary may be more clearly understood from the following detailed description with reference to the accompanying drawings.

A ₁ ‧‧‧ central axis

10‧‧‧ fluidized bed reactor

12‧‧‧ container

15‧‧‧ reactor chamber

20‧‧‧ inlet nozzle

22‧‧‧ Central Path

24‧‧‧ circular path

40‧‧‧ fluidized gas nozzle

50‧‧‧Sampling nozzle

60‧‧‧pressure nozzle

70‧‧‧Purge gas / cooling gas nozzle

72‧‧‧Purge gas / cooling gas nozzle

80‧‧‧ outer shell

90‧‧‧ Internal Bed Heater

100‧‧‧ heater

110‧‧‧ seed nozzle

120‧‧‧ product export

130‧‧‧ Insulation

140‧‧‧Inner shell

141‧‧‧outer surface

142‧‧‧Inner surface

150‧‧‧ cushion

151‧‧‧Inner surface

152‧‧‧ surface

154‧‧‧Circular bottom surface

160‧‧‧Inner shell expansion device

165‧‧‧Expansion spring

170‧‧‧ substrate

172‧‧‧Top head

180‧‧‧feather gas

220‧‧‧ bottom seal support ring

230‧‧‧upper seal ring

240‧‧‧ annular space

241‧‧‧Expansion support body parts

242‧‧‧ Expansion support body parts

260‧‧‧ outer edge surface

262‧‧‧Inner edge surface

264‧‧‧Central opening

270‧‧‧upper

272‧‧‧below

274‧‧‧ flange

276‧‧‧ protruding surface

280‧‧‧seal ring

282‧‧‧Circular inner edge surface

284‧‧‧ opening

285‧‧‧ annular top surface

286‧‧‧ annular bottom surface

288‧‧‧circular channel

290‧‧‧O-ring

294‧‧‧Ring ring washer

296‧‧‧Ring under washer

300‧‧‧ Middle Ring

304‧‧‧Top surface

308‧‧‧open channel

310‧‧‧O-ring

A schematic cross-sectional front view of the systemized bed reactor shown in FIG. 1.

An enlarged schematic cross-sectional front view of a portion of a systemized bed reactor shown in FIG. 2 depicts an outer shell, an insulating layer, an inner shell having an inner shell expansion device, and a gasket.

FIG. 3 is an enlarged partial schematic cross-sectional front view of a portion of the fluidized bed reactor shown in FIG. 2, which depicts details of a bottom support system for the inner casing and the liner.

FIG. 4 is a partial cross-sectional view taken along line 4-4 of FIG. 3.

A fluidized bed reactor system for forming polycrystalline silicon is disclosed herein, which thermally decomposes a silicon-bearing gas and deposits silicon on fluidized silicon particles or other seed particles (for example, silica particles, Graphite particles, or quartz particles).

The silicon-coated particles thermally decompose a silicon-bearing gas in a reactor chamber and deposit silicon on the particles in a first-class bed in the chamber. Initially, the deposition was on small seed particles. Deposition continues until the particles are grown to a size suitable for commercial use, and the grown particles are then obtained.

The seed particles may have any desired composition suitable for being coated with silicon. Convenient compositions do not melt or evaporate, and do not decompose or undergo a chemical reaction under the conditions present in the reactor chamber. Examples of suitable seed particle compositions include, but are not limited to: silicon, silica, graphite, and quartz.

Silicon is deposited on these particles by decomposing the silicon-bearing gas in the group consisting of the following free choices: silane (SiH ₄ ), disilane (Si ₂ H ₆ ), higher order silane (Si _n H _{2n + 2} ), silicon dichloride (SiH ₂ Cl ₂ ), silicon trichloride (SiHCl ₃ ), silicon tetrachloride (SiCl ₄ ), silicon dibromide (SiH ₂ Br ₂ ), silicon bromide (SiH ₂ SiHBr ₃ ), silicon tetrabromide (SiBr ₄ ), silicon diiodide (SiH ₂ I ₂ ), silicon triiodide (SiHI ₃ ), silicon tetraiodide (SiI ₄ ), and mixtures thereof. The silicon-bearing gas may be mixed with one or more halogen-containing gases, as defined by any one of the following groups: chlorine (Cl ₂ ), hydrogen chloride (HCl), bromine (Br ₂ ), hydrogen bromide (HBr), iodine (I ₂ ), hydrogen iodide (HI), and mixtures thereof. The silicon carrier gas can also be mixed with one or more other gases, including hydrogen (H ₂ ) or one or more inert gases selected from the following: nitrogen (N ₂ ), helium (He), argon Gas (Ar), and neon gas (Ne). In a special embodiment, the silicon carrier gas is silane, and the silane is mixed with hydrogen.

The silicon-bearing gas and any accompanying hydrogen, halogen-containing gas, and / or inert gas will be introduced into the central chamber of a first-class chemical bed reactor and thermally decomposed inside the chamber to produce a deposit on Silicon on seed particles inside the chamber.

The general structure of a fluidized bed reactor 10 shown in FIG. 1 is a product-coated particle. The reactor of FIG. 1 is similar to the reactor of WO2011063007 A2, which is particularly suitable for silicon products produced by thermal decomposition of silane. The reactor 10 includes a container 12 that extends substantially vertically from a base 170 to a top head 172. The container 12 has a vertical central axis A ₁ and can have different cross-sectional dimensions at different heights. The reactor shown in Fig. 1 has five zones I to V of different cross-sectional dimensions.

The reactor 10 has an outer casing 80. One or more heaters 100 are positioned inside the outer casing 80 in the region IV. In some systems, the heater 100 is a radiant heater. The reactor 10 may also include an internal bed heater 90. An insulating layer 130 is positioned in the inner surface of the outer case 80. The insulating layer 130 thermally insulates the outer casing 80 and the radiant heater 100.

An inner shell 140 extends vertically through regions II to V of the reactor 10. The inner case shown in the figure is substantially cylindrical with a substantially circular cross section. The inner casing can be composed of any suitable material that can withstand the conditions inside the reactor 10 and is well suited to the high temperatures used to transfer heat into the fluidized bed. Since the pressure inside and outside the inner casing are the same, the inner casing can be thin. In some systems, the thickness of the inner casing is 5 mm to 10 mm, for example, 6 mm to 8 mm.

A removable pad 150 is positioned inside the inner case 140 between the and The inner surfaces 142 of the inner casing 140 are separated by a small distance. The gasket 150 shown in the figure is substantially cylindrical and has a substantially circular cross-section. The inner shell 140 has a concentric center and extends substantially vertically through the regions II to V. The liner 150 has an inner surface 151 which at least partially defines a reactor chamber 15.

The liner 150 may enclose the fluidized bed and separate it from other components of the reactor. Specifically, the gasket 150 protects the inner shell 140 from the friction of the silicon-coated particles and seed particles in the fluidized bed, and protects these particles from the inner shell material and / Or contamination of the container wall material.

The pad 150 is made of a material selected not to contaminate the particles, and is preferably made of a material capable of withstanding a temperature of 1600 ° F (870 ° C) and maintaining stability. Suitable materials for the pad 150 include, but are not limited to, non-contaminating materials, which include, but are not limited to: quartz, silicon, low nickel alloy, high temperature alloy, cobalt alloy, silicon nitride, graphite, silicon carbide , Molybdenum, or molybdenum alloy. In special systems, the gasket is made of silicon carbide, molybdenum, or a molybdenum alloy. The advantage of silicon carbide is that it has a low thermal expansion coefficient of 2.2-2.4x10-6 / ° F or 3.9-4.0x10-6 / ° C.

The outer shell 80 to the gasket 150 of the structure of a modified reactor system shown in FIG. 2 includes a modified bottom seal. The insulating layer 130 is disposed beside the outer casing 80 and is supported between a lower seal support ring 220 and an upper seal ring 230. The inner case 140 is positioned on the inner side of the insulating layer 130 and is supported by the lower sealing support ring 220. The inner casing 140 has an outer surface 141 and an inner surface 142. The surfaces 141 and 142 shown in the figure have concentric circles and are substantially cylindrical, except for the bottom portions of the inner shell 140 where the surfaces diverge. The pad 150 is positioned inside the inner case 140. There is a space between the inner case 140 and the pad 150 A narrow gap, for example, measured 1.5 mm horizontally in the figure to allow horizontal thermal expansion. Due to the gap, there is an annular space 240 between the bottom seal and the top of the inner case 140. In the embodiment shown in the figure, the side boundary of the annular space 240 is defined by two vertically extending concentric circular surfaces 142, 152 of a circular cylinder. The various components of the bottom seal assembly collectively provide a seal extending from the inner shell 140 to the gasket 150 to block gas from the bottom of the reactor chamber 15 from entering between the inner shell 140 and the gasket 150 between 240 and 240.

Each of the outer casing 80, the inner casing 140, and the lower sealing support ring 220 is composed of a material suitable for withstanding and heating the temperature gradient associated with cooling the product with the fluidized bed. Suitable materials include, but are not limited to: austenitic stainless steel; high temperature metal alloys, such as INCOLOY ^® alloys, INCONEL ^® alloys; and cobalt alloys, for example, RENE ^® 41.

A plurality of radiant heaters (not shown) may be disposed between the insulating layer 130 and the inner case 140.

An expansion joint system includes an inner casing expansion device 160 that extends upward from an upper surface of the inner casing 140. The inner casing expansion device 160 is capable of being compressed to allow vertical thermal expansion of the inner casing 140 during operation of the reactor 10.

The inner casing expansion device 160 shown in the figure extends between the inner casing 140 and an expansion support. The expansion support contains components 241, 242, which are firmly attached to the upper seal ring 230. The expansion joint system is adapted to the differential expansion of the inner shell 140 and the outer shell 80 of the reactor. The inner casing expansion device 160 shown in the figure is a substantially cylindrical spring-type device, and its inner diameter is the same as the inner diameter of the inner casing 140. The inner casing expansion device 160 is configured to apply a downward pressure on the inner casing 140. In a particular system, the inner casing expansion device 160 It is a spiral coil made of a flat wire or a wave spring, that is, a cylindrical stack made of wavy flat wires in a metal wire.

When the temperature inside the reactor rises, the inner shell 140 will expand and the inner shell expansion device 160 will be pushed upward and compressed. When cooled, the inner casing 140 will shrink and the inner casing expansion device 160 will expand. The inner casing expansion device 160 also applies pressure on the inner casing 140. Optionally, an expansion spring 165 may be provided above the pad 150 to accommodate the thermal expansion of the pad.

The lower end portions of the inner casing 140 and the gasket 150 are supported and sealed, so that gas does not flow from the fluidized bed into the annular space 240 between the inner casing and the gasket. The gasket 150 has an annular bottom surface 154 that is ground to be smooth and flat to help form a good bottom seal. In the system shown in the figure, the bottom surface 154 of the pad 150 extends substantially horizontally.

FIG. 3 shows the bottom seal configuration of FIG. 2 in more detail. In the configuration shown in the figure, the gasket 150 is supported by the inner casing 140 and one or more gaskets are provided between the gasket 150 and the inner casing 140 to provide an air-tight seal. A support member (for example, the lower seal support ring 220 shown in the figure) is ring-shaped, and is attached to the outer casing 80 at a height above the base 170, and is flanged from the outer casing 80 toward It extends inwardly and supports the inner case 140. The lower sealing support ring 220 has an outer edge surface 260 and an inner edge surface 262. The outer edge surface 260 faces the outer casing 80 and the inner edge surface 262 defines a central opening 264 extending substantially vertically, as shown in FIG. In the middle, the lower support ring 220 is penetrated. The inner case 140 has an upper portion 270 and a lower portion 272. The lower portion 272 shown in the figure has a flat bottom surface that falls on the sealing support ring 220. The lower portion 272 includes a flange 274, which Radially inwardly protruding from the upper portion 270, the flange 274 has a generally horizontal, upwardly-facing protruding surface 276. The pad 150 is supported by the protruding surface 276. In the advantageous configuration shown in FIG. 3, the lower portion 272 of the inner case 140 is thicker than the upper portion 270 as measured from the horizontal. The larger thickness of the lower portion 272 provides a wider base of the inner shell 140 to fall on the sealing support ring 220. The advantage is that the lower portion 272 is thick enough so that the base of the inner casing 140 can define a drilled hole to receive bolts, or can support short nails to secure the inner casing to the container, for example, to a sealing support ring 220 . In the system shown in the figure, the outer surface 141 extends outward toward the bottom of the inner shell 140 to provide additional thickness.

In the system shown in the figure, a ring-shaped member is connected to the inner case 140 to provide support for the pad 150. The annular member shown in the figure is a sealing ring 280 between the gasket 150 and the protruding surface 276. The sealing ring 280 is supported by the protruding surface 276 and the gasket 150 is received by the sealing ring. 280 support. The sealing ring 280 has a ring-shaped top surface 285 and a ring-shaped bottom surface 286. The two surfaces are substantially flat and extend substantially horizontally. The sealing ring 280 also has an annular inner edge surface 282 which defines an opening 284 extending substantially vertically, and is shown in FIG. 4 and penetrates the sealing ring 280. The sealing ring 280 may be ferritic stainless steel, for example, 410 grade stainless steel.

The top surface 285 of the sealing ring 280 defines at least one annular upward open channel. In the system shown in FIGS. 3 to 4, the top surface 285 defines a circular channel 288. An O-ring 290, sometimes referred to as an "upper O-ring", is provided in the annular upwardly-opening channel 288. The O-ring buckle is located on the surface above and below the O-ring to form a seal between the surfaces. In the alternative, a plurality of channels may be provided in the top surface 285; a plurality of O-rings may be provided between the gasket 150 and the sealing ring 280. The O-ring 290 may be made of any suitable material. In particular, O-ring 290 may be a stainless steel hollow core, or may be a perfluoro elastomeric material, e.g., DuPont ^TM Kalrez ^® perfluoroelastomer (FFKM).

The system may also include a ring-shaped intermediate ring 300, which will be clearly seen in FIG. The intermediate ring 300 shown in the figure is located between the sealing ring 280 and the protruding surface 276. The intermediate ring 300 is supported by the protruding surface 276 and the sealing ring 280 is supported by the intermediate ring 300. The intermediate ring shown in the figure has a top surface 304 which defines at least one annular upwardly-opening channel 308. An O-ring 310, sometimes also referred to as a "lower O-ring", is provided in one or more of the annular upward opening channels 308. The O-ring buckle is located on the surface above and below the O-ring to form a seal between the surfaces. In the embodiments of FIGS. 3 to 4, an O-ring 310 is provided in a channel 308. In the alternative, a plurality of channels 308 may be provided; a plurality of O-rings may be provided. The O-ring 310 may be made from a polymer, e.g., DuPont ^TM Viton ^® fluoroelastomers, or may be a perfluoro elastomeric material, e.g., DuPont ^TM Kalrez ^® perfluoroelastomer (FFKM).

In the embodiment shown in the figure, a ring-shaped upper washer 294 is located between the sealing ring 280 and the gasket 150, and is mainly used to protect the O-ring from being caused by the lower surface 154 of the contact gasket 150. Wear and tear. An annular lower washer 296 is positioned between the seal ring 280 and the protruding surface 276. Specifically, the annular upper washer 294 is located between the top surface 285 of the seal ring 280 and the gasket 150; the annular lower washer 296 is located between the bottom surface 286 and the protruding surface 276 of the seal ring 280. Such gaskets are usually unnecessary and can be omitted. However, one or both of the washers 294, 296 may be provided if necessary. The plurality of washer may be made of graphite material, e.g., GRAFOIL ^® graphite gasket material is flexible, it has sufficient rigidity such that the plurality of gasket does not slide sideways during operation of the reactor. In a system without an upper washer 294, the lower surface 154 of the gasket 150 is seated on the top surface 285 of the sealing ring 280, and the one or more O-rings 290 are in contact with the gasket 150 and the sealing ring A seal is formed between 280. In a system without a lower gasket 296, the bottom surface 286 of the seal ring 280 sits on top of the intermediate ring 300, and the one or more O-rings 310 will contact and seal the seal ring 280 with the intermediate ring 300. A seal is formed between them.

An inlet nozzle 20 is provided to inject a primary gas via a central path 22 and a secondary gas via an annular path 24 surrounding the central path 22. The advantage is that the nozzle 20 is positioned so that the silane is injected into a plume 180 near the vertical central axis A _{1 of the} reactor 10. In a special configuration, the central inlet nozzle 20 includes two substantially cylindrical tubular portions having a substantially circular cross-section. The main gas is a silicon-bearing gas, or a mixture of a silicon-bearing gas, hydrogen, and / or an inert gas (for example, helium, argon). The main gas may also contain a halogen-containing gas. The secondary gas typically has a composition that is substantially the same as the hydrogen and / or inert gas in the primary gas mixture. In a special configuration, the primary gas is a mixture of silane and hydrogen, and the secondary gas is hydrogen.

The reactor 10 shown in the figure further includes a plurality of fluidizing gas nozzles 40. Additional hydrogen and / or inert gas can be transferred into the reactor through the fluidizing nozzles 40 to provide a sufficient gas flow to fluidize the particles in the reactor bed.

The present invention also provides: a sampling nozzle 50 through which the product is sampled; and one or more pressure nozzles 60 for monitoring the pressure in the reactor, the nozzles transversely from the central inlet nozzle 20 Move away. One or more purge gas / cooling gas nozzles 70, 72 are located below the fluidization nozzle 40 and extend radially through the outer shell 80 and into the reactor 10 out of 10.

The reactor 10 has a seed nozzle 110 through which seed particles are introduced into the reactor chamber 15. The reactor 10 also has one or more product outlets 120 for removing silicon-coated particles from the reactor chamber 15.

In operation, a seed particle bed is provided inside the reactor chamber and is fluidized by the gas injected through the sole central inlet nozzle 20 and the supplemental fluidization nozzles 40. The contents of the reactor chamber 15 are heated. The silicon bearing gas decomposes and deposits seed particles of silicon in the fluidized bed. The cooling gas is introduced into the chamber 15 through the cooling gas nozzles 70 and 72.

It should be understood that the reactors shown in the figures are merely examples and should not be considered as limiting the scope of the invention. Specifically, the scope of the present invention is defined by the following patent application scope.

Claims (17)

A system for a silicon deposition reactor, comprising: a container having a base, a top head, and a tubular outer shell, the outer shell extending vertically between the base and the top head; a tubular An inner shell positioned inside the outer shell, the inner shell extending vertically and supported by the container; a tubular gasket positioned inside the inner shell, the gasket extending vertically and receiving the inner shell The cushion has an inner surface which at least partially defines a chamber. The chamber is suitable for containing a plurality of silicon particles in a first-rate bed. The inner shell has an upper portion and a lower portion. The lower portion includes a flange that projects radially inwardly with respect to the upper portion, the flange has a horizontal, upward-facing protruding surface, and the pad is supported by the protruding surface; at least one nozzle for Injecting gas into the chamber; at least one outlet for removing the gas from the chamber; and a sealing ring positioned between the gasket and the protruding surface so that the sealing ring is subjected to the protruding surface Branch And the pad is supported in the seal ring, the seal ring having an annular inner peripheral surface that defines a vertically extending through opening and the seal ring. The system according to item 1 of the scope of patent application, wherein: the sealing ring has an annular top surface and an annular bottom surface; the top surface of the sealing ring defines at least one annular upward opening channel; and an O-ring It is located in the at least one annular upward opening channel for providing a seal between the gasket and the seal ring. According to the system of claim 1, it further includes an upper gasket between the seal ring and the gasket. According to the system of claim 1, it further includes a lower gasket between the sealing ring and the protruding surface. The system according to item 4 of the patent application, wherein the lower gasket is located between the bottom surface of the seal ring and the protruding surface. According to the system of claim 1, it further includes an intermediate ring located between the sealing ring and the protruding surface, the intermediate ring is supported by the protruding surface and the sealing ring is supported by the intermediate ring. The system according to item 6 of the patent application, wherein: the intermediate ring has a ring-shaped top surface defining at least one ring-shaped open channel; and an O-ring is positioned in the at least one ring-shaped open channel. in. The system according to item 7 of the patent application scope, further comprising a lower gasket positioned between the sealing ring and the O-ring, the O-ring positioned in the at least one annular upward open channel of the intermediate ring In. A system for a silicon deposition reactor, comprising: a container having a base, a top head, and a tubular outer shell, the outer shell extending vertically between the base and the top head; a tubular An inner shell located inside the outer shell, the inner shell extending vertically, supported by the container, and having an inner surface; a tubular gasket positioned inside the inner shell, the gasket being vertical Extending, the pad has an outer surface, the outer surface is separated from the inner surface of the inner casing so that a tubular space is defined between the inner casing and the pad, the pad has an inner surface, which A chamber is defined at least in part, the chamber is suitable for containing a plurality of silicon particles in a first-rate bed, and the gasket is hermetically sealed to the inner casing by an O-ring at a position near the bottom thereof, so that the gas The space cannot be accessed from the chamber, wherein the inner casing has an upper portion and a lower portion, the lower portion includes a flange that projects radially inwardly with respect to the upper portion, and the flange has a horizontal, Protruding surface facing up, And the pad is supported by the protruding surface; at least one nozzle for injecting gas into the chamber; at least one outlet for removing gas from the chamber; and a connection to the inner casing A ring-shaped member, which is a sealing ring located between the gasket and the inner casing, the gasket is supported by the sealing ring, and the sealing ring has a ring-shaped inner edge surface, which defines a An opening extending vertically through the seal ring. A system for a silicon deposition reactor according to claim 9 in which the O-ring seal includes at least one O-ring positioned to provide a seal between the gasket and the inner housing, or A seal is provided between the gasket and the annular member connected to the inner case. The system for a silicon deposition reactor according to item 9 of the application, wherein: the seal ring has a ring-shaped top surface and a ring-shaped bottom surface; the top surface of the seal ring defines at least one ring-shaped upward opening channel; And an O-ring is located in the at least one annular upwardly-opening channel to provide a seal between the gasket and the sealing ring. The system for a silicon deposition reactor according to item 9 of the application, further comprising an upper gasket positioned between the seal ring and the gasket. According to the system of claim 9, the system further includes a lower gasket, which is positioned between the sealing ring and the inner casing. According to the system of claim 9 of the patent application scope, the system further includes an intermediate ring located between the sealing ring and the inner casing, and the sealing ring is supported by the intermediate ring. A system for a silicon deposition reactor according to item 14 of the patent application, wherein: the intermediate ring has a ring-shaped top surface defining at least one ring-shaped upward open channel; and the system further includes an O-ring, In the at least one annular upward opening channel, a seal is provided between the seal ring and the intermediate ring. According to the system of claim 15 of the patent application scope, the system further includes a lower gasket located between the sealing ring and the O-ring, and the O-ring is located in the at least one ring of the intermediate ring. Shape upward opening channel. The system of the silicon deposition reactor according to item 9 of the application, wherein the O-ring seal is located between the inner shell and the seal ring.