TWI668334B - Aluminum alloy shell and its preparation method and personal electronic devices - Google Patents

Aluminum alloy shell and its preparation method and personal electronic devices Download PDF

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TWI668334B
TWI668334B TW106145234A TW106145234A TWI668334B TW I668334 B TWI668334 B TW I668334B TW 106145234 A TW106145234 A TW 106145234A TW 106145234 A TW106145234 A TW 106145234A TW I668334 B TWI668334 B TW I668334B
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aluminum alloy
film layer
anodized film
alloy substrate
nanopore
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TW201825718A (en
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王鈺
廖重重
陳梁
章樂
代靈娜
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大陸商比亞迪股份有限公司
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    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D11/00Electrolytic coating by surface reaction, i.e. forming conversion layers
    • C25D11/02Anodisation
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D11/00Electrolytic coating by surface reaction, i.e. forming conversion layers
    • C25D11/02Anodisation
    • C25D11/022Anodisation on selected surface areas
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D11/00Electrolytic coating by surface reaction, i.e. forming conversion layers
    • C25D11/02Anodisation
    • C25D11/024Anodisation under pulsed or modulated current or potential
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D11/00Electrolytic coating by surface reaction, i.e. forming conversion layers
    • C25D11/02Anodisation
    • C25D11/04Anodisation of aluminium or alloys based thereon
    • C25D11/06Anodisation of aluminium or alloys based thereon characterised by the electrolytes used
    • C25D11/08Anodisation of aluminium or alloys based thereon characterised by the electrolytes used containing inorganic acids
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D11/00Electrolytic coating by surface reaction, i.e. forming conversion layers
    • C25D11/02Anodisation
    • C25D11/04Anodisation of aluminium or alloys based thereon
    • C25D11/12Anodising more than once, e.g. in different baths
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D11/00Electrolytic coating by surface reaction, i.e. forming conversion layers
    • C25D11/02Anodisation
    • C25D11/04Anodisation of aluminium or alloys based thereon
    • C25D11/16Pretreatment, e.g. desmutting
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D11/00Electrolytic coating by surface reaction, i.e. forming conversion layers
    • C25D11/02Anodisation
    • C25D11/04Anodisation of aluminium or alloys based thereon
    • C25D11/18After-treatment, e.g. pore-sealing
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D11/00Electrolytic coating by surface reaction, i.e. forming conversion layers
    • C25D11/02Anodisation
    • C25D11/04Anodisation of aluminium or alloys based thereon
    • C25D11/18After-treatment, e.g. pore-sealing
    • C25D11/20Electrolytic after-treatment
    • C25D11/22Electrolytic after-treatment for colouring layers
    • HELECTRICITY
    • H04ELECTRIC COMMUNICATION TECHNIQUE
    • H04MTELEPHONIC COMMUNICATION
    • H04M1/00Substation equipment, e.g. for use by subscribers
    • H04M1/02Constructional features of telephone sets
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K5/00Casings, cabinets or drawers for electric apparatus
    • H05K5/04Metal casings

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Signal Processing (AREA)
  • Other Surface Treatments For Metallic Materials (AREA)

Abstract

本發明揭露了一種鋁合金殼體及其製備方法和個人電子裝置,該鋁合金殼體包括鋁合金基體(1)和氧化膜層(2),該鋁合金基體(1)上具有狹縫(3),該氧化膜層(2)包括內層陽極氧化膜層(21)以及外層陽極氧化膜層(22);該內層陽極氧化膜層(21)具有內層陽極氧化膜層奈米孔,該外層陽極氧化膜層(22)具有外層陽極氧化膜層奈米孔,該內層陽極氧化膜層奈米孔和外層陽極氧化膜層奈米孔內各自獨立地填充有染色染料。該鋁合金殼體從殼體外側表面看為連續的金屬層,金屬層中的狹縫可用於作為天線槽。金屬層表面的氧化膜層起到了良好的遮蔽作用,使得狹縫表面不可見,殼體整潔光滑,具有較好的金屬質感。The invention discloses an aluminum alloy casing, a preparation method thereof and a personal electronic device, the aluminum alloy casing comprising an aluminum alloy base body (1) and an oxide film layer (2) having slits thereon (1) 3) the oxide film layer (2) comprises an inner anodized film layer (21) and an outer anodized film layer (22); the inner anodized film layer (21) has an inner anodized film layer nanopore The outer anodized film layer (22) has an outer anodized film layer nanopore, and the inner layer of the anodized film layer and the outer layer of the anodized film layer are each independently filled with a dyeing dye. The aluminum alloy casing is seen as a continuous metal layer from the outer surface of the casing, and the slit in the metal layer can be used as an antenna groove. The oxide film layer on the surface of the metal layer plays a good shielding effect, so that the surface of the slit is invisible, the casing is clean and smooth, and has a good metal texture.

Description

鋁合金殼體及其製備方法和個人電子裝置Aluminum alloy casing, preparation method thereof and personal electronic device

本發明涉及材料化學領域,具體地,涉及一種鋁合金殼體及其製備方法和個人電子裝置。The present invention relates to the field of material chemistry, and in particular to an aluminum alloy casing, a method of preparing the same, and a personal electronic device.

手機天線是手機上用於接收訊號的裝置,目前市面上的智慧手機多為內建天線,這就要求手機後蓋不能對訊號起遮蔽作用。金屬對於電磁波的吸收很強,wifi、2G、3G訊號射入金屬材料時會產生吸收衰減,電磁波無法到達訊號接收模組,導致訊號遮蔽。因此,對於金屬機身手機,如何解決訊號遮蔽問題是其設計製造的關鍵之一。目前,金屬機身手機多採用開天線槽並注塑的方法解決其機身訊號遮蔽的問題,如HTC ONE的上下兩條天線槽,iphone5/5s的側邊天線槽等,雖然可以防止訊號的遮蔽,但是對金屬機身的整體結構造成了一定的破壞,影響了其外觀的整潔性與連續性,同時,外殼可見的塑膠破壞了機身的整體金屬質感。The mobile phone antenna is a device for receiving signals on a mobile phone. Currently, smart phones on the market are mostly built-in antennas, which requires that the back cover of the mobile phone cannot shield the signal. Metals absorb electromagnetic waves very strongly. When wifi, 2G, and 3G signals are injected into metal materials, absorption and attenuation are generated. Electromagnetic waves cannot reach the signal receiving module, resulting in signal shielding. Therefore, for the metal body phone, how to solve the signal shielding problem is one of the keys to its design and manufacture. At present, metal body mobile phones use antenna slot and injection molding to solve the problem of body signal shielding, such as the upper and lower antenna slots of HTC ONE, the side antenna slots of iphone5/5s, etc., although it can prevent signal shielding. However, it caused certain damage to the overall structure of the metal body, affecting the cleanliness and continuity of its appearance. At the same time, the plastic visible in the outer casing destroyed the overall metal texture of the fuselage.

本發明的目的是提供一種鋁合金殼體及其製備方法和個人電子裝置,該鋁合金殼體的天線槽外觀不可見。It is an object of the present invention to provide an aluminum alloy casing, a method of manufacturing the same, and a personal electronic device in which the appearance of the antenna slot of the aluminum alloy casing is not visible.

為了實現上述目的,本發明第一方面:提供一種鋁合金殼體,該鋁合金殼體包括鋁合金基體和覆蓋在該鋁合金基體表面的氧化膜層;該鋁合金基體上具有狹縫,該狹縫在該鋁合金基體的外側表面和內側表面上分別開設有外側開口和內側開口,該氧化膜層將該狹縫的外側開口封閉;該氧化膜層包括內層陽極氧化膜層以及外層陽極氧化膜層;該內層陽極氧化膜層具有內層陽極氧化膜層奈米孔,該外層陽極氧化膜層具有外層陽極氧化膜層奈米孔,該內層陽極氧化膜層奈米孔的孔徑為30-100nm;該外層陽極氧化膜層奈米孔的孔徑為10-50nm,該內層陽極氧化膜層奈米孔的孔徑大於該外層陽極氧化膜層奈米孔的孔徑,該內層陽極氧化膜層奈米孔和外層陽極氧化膜層奈米孔內各自獨立地填充有染色染料,該染色染料包括有機染料。In order to achieve the above object, a first aspect of the present invention provides an aluminum alloy casing comprising an aluminum alloy substrate and an oxide film layer covering the surface of the aluminum alloy substrate; the aluminum alloy substrate having a slit thereon The slit has an outer opening and an inner opening respectively on the outer side surface and the inner side surface of the aluminum alloy base, and the oxide film layer closes the outer opening of the slit; the oxide film layer includes an inner anodized film layer and an outer layer anode An oxide film layer; the inner anodized film layer has an inner anodized film layer nanopore, and the outer anodized film layer has an outer anodized film layer nanopore, and the inner anodized film layer has a pore size of a nanopore 30-100 nm; the outer anodized film layer has a pore diameter of 10-50 nm, and the pore diameter of the inner anodized film layer nanohole is larger than the pore diameter of the outer anodized film layer nanopore, the inner layer anode The oxide film layer nanopore and the outer anodized film layer are each independently filled with a dyeing dye, and the dyeing dye includes an organic dye.

較佳地,該內層陽極氧化膜層奈米孔的密度為550-900個/平方微米,該外層陽極氧化膜層奈米孔的密度為200-550個/平方微米。Preferably, the density of the inner anodized film nanopore is 550-900/m 2 , and the density of the outer anodized film nanopore is 200-550/m 2 .

較佳地,該有機染料包括奧野420染料、415染料和419染料中的至少一種。Preferably, the organic dye comprises at least one of the Oku 420 dye, the 415 dye, and the 419 dye.

較佳地,該氧化膜層的色彩深度L值為0-30,顏色│A│值為0-2,顏色│B│值為0-2,染色深度大於23μm。Preferably, the oxide film layer has a color depth L value of 0-30, a color │A│ value of 0-2, a color │B│ value of 0-2, and a dyeing depth of more than 23 μm.

較佳地,該氧化膜層的硬度為320HV0.1 -500HV0.1Preferably, the oxide film layer has a hardness of 320 HV 0.1 -500 HV 0.1 .

較佳地,該內層陽極氧化膜層的厚度為1-60μmμm;該外層陽極氧化膜層的厚度為1-60μmμm。Preferably, the inner anodized film layer has a thickness of from 1 to 60 μm μm; and the outer anodized film layer has a thickness of from 1 to 60 μm.

較佳地,該狹縫的寬度為0.5-10mm,該狹縫的數量為1-10個。Preferably, the slit has a width of 0.5 to 10 mm, and the number of the slits is 1-10.

較佳地,該狹縫將該鋁合金基體分隔為彼此絕緣的至少兩塊。Preferably, the slit divides the aluminum alloy substrate into at least two pieces insulated from each other.

較佳地,該狹縫裡填充有絕緣體。Preferably, the slit is filled with an insulator.

本發明第二方面:提供一種製備鋁合金殼體的方法,該方法包括以下步驟:a、將鋁合金基體進行第一陽極氧化處理,得到第一陽極氧化處理後的鋁合金基體,該第一陽極氧化處理使得鋁合金基體覆蓋有含有外層陽極氧化膜層奈米孔的外層陽極氧化膜層,該外層陽極氧化膜層奈米孔的孔徑為10-50nm;b、將步驟a中得到的該第一陽極氧化處理後的鋁合金基體進行第一染色處理,得到第一染色處理後的鋁合金基體,該第一染色處理使得外層陽極氧化膜層奈米孔內填充有染色染料;c、將步驟b中得到的該第一染色處理後的鋁合金基體進行第二陽極氧化處理,得到第二陽極氧化處理後的鋁合金基體,該第二陽極氧化處理使得鋁合金基體覆蓋有含有內層陽極氧化膜層奈米孔的內層陽極氧化膜層,該內層陽極氧化膜層奈米孔的孔徑為30-100nm;d、將步驟c中得到的該第二陽極氧化處理後的鋁合金基體進行第二染色處理,得到第二染色處理後的鋁合金基體,該第二染色處理使得內層陽極氧化膜層奈米孔和/或外層陽極氧化膜層奈米孔內填充有染色染料;e、將步驟d中得到的該第二染色處理後的鋁合金基體中的鋁合金基體部分進行部分去除以形成狹縫,該狹縫在該鋁合金基體的外側表面和內側表面上分別開設有外側開口和內側開口,該氧化膜層將該狹縫的外側開口封閉。A second aspect of the present invention provides a method for preparing an aluminum alloy casing, the method comprising the steps of: a. performing an first anodizing treatment on the aluminum alloy substrate to obtain a first anodized aluminum alloy substrate, the first Anodizing treatment, the aluminum alloy substrate is covered with an outer anodized film layer containing an outer anodized film layer nanopore, the outer anodized film layer nanopore has a pore diameter of 10-50 nm; b, the step obtained in step a The first anodized aluminum alloy substrate is subjected to a first dyeing treatment to obtain a first dyed aluminum alloy substrate, and the first dyeing treatment causes the outer anodized film layer to be filled with a dyeing dye in the nanopore; c. The first dyed aluminum alloy substrate obtained in step b is subjected to a second anodizing treatment to obtain a second anodized aluminum alloy substrate, and the second anodizing treatment causes the aluminum alloy substrate to be covered with an inner layer anode An inner anodized film layer of an oxide film layer nanopore having a pore diameter of 30-100 nm; d, the first step obtained in step c The second anodized aluminum alloy substrate is subjected to a second dyeing treatment to obtain a second dyed aluminum alloy substrate, and the second dyeing treatment causes the inner anodized film layer nanopore and/or the outer anodized film layer. The rice hole is filled with a dyeing dye; e, the aluminum alloy base portion of the second dyed aluminum alloy substrate obtained in step d is partially removed to form a slit, and the slit is outside the aluminum alloy substrate An outer opening and an inner opening are respectively formed on the surface and the inner side surface, and the oxide film layer closes the outer opening of the slit.

較佳地,該內層陽極氧化膜層奈米孔的密度為550-900個/平方微米,該外層陽極氧化膜層奈米孔的密度為200-550個/平方微米。Preferably, the density of the inner anodized film nanopore is 550-900/m 2 , and the density of the outer anodized film nanopore is 200-550/m 2 .

較佳地,該第一陽極氧化處理包括將該鋁合金基體與含有硫酸和草酸的第一水溶液接觸,以1000重量份的該第一水溶液為基準,硫酸的含量為90-260重量份,草酸的含量為4-25重量份;該第二陽極氧化處理包括將該鋁合金基體與含有硫酸的第二水溶液接觸,以1000重量份的第二水溶液為基準,硫酸的含量為110-360重量份。Preferably, the first anodizing treatment comprises contacting the aluminum alloy substrate with a first aqueous solution containing sulfuric acid and oxalic acid, and the content of sulfuric acid is 90-260 parts by weight based on 1000 parts by weight of the first aqueous solution, oxalic acid The content is 4-25 parts by weight; the second anodizing treatment comprises contacting the aluminum alloy substrate with a second aqueous solution containing sulfuric acid, and the content of sulfuric acid is 110-360 parts by weight based on 1000 parts by weight of the second aqueous solution. .

較佳地,該第一陽極氧化處理在脈衝電流下進行,該第一陽極氧化處理的條件為:電流的脈衝波型為正向方波脈衝,占空比為30-99%,電流的頻率為100-1000Hz,電流密度為2-8A/dm2 ,電壓為30-60V,溫度為0-20℃,時間為10-80min;該第二陽極氧化處理在直流電下進行,該第二陽極氧化處理的條件為:電壓為13-20V,溫度為5-25℃,時間為5-60min。Preferably, the first anodizing treatment is performed under a pulse current, and the condition of the first anodizing treatment is: the pulse waveform of the current is a forward square wave pulse, the duty ratio is 30-99%, and the frequency of the current 100-1000 Hz, current density is 2-8 A/dm 2 , voltage is 30-60 V, temperature is 0-20 ° C, time is 10-80 min; the second anodizing treatment is performed under direct current, the second anodizing The treatment conditions are: a voltage of 13-20 V, a temperature of 5-25 ° C, and a time of 5-60 min.

較佳地,該第一染色處理包括將該第一陽極氧化處理後的鋁合金基體與有機染料接觸;第二染色處理包括將該第二陽極氧化處理後的鋁合金基體與有機染料接觸;該有機染料包括奧野420染料、415染料和419染料中的至少一種。Preferably, the first dyeing treatment comprises contacting the first anodized aluminum alloy substrate with an organic dye; and the second dyeing treatment comprises contacting the second anodized aluminum alloy substrate with an organic dye; The organic dye includes at least one of the Oku 420 dye, the 415 dye, and the 419 dye.

較佳地,該第一染色處理的條件為:溫度為25-65℃,時間為5-50min;該第二染色處理的條件為:溫度為25-65℃,時間為5-50min。Preferably, the conditions of the first dyeing treatment are: a temperature of 25-65 ° C, a time of 5-50 min; and a condition of the second dyeing treatment: a temperature of 25-65 ° C, and a time of 5-50 min.

較佳地,該外層陽極氧化膜層的色彩深度L值為0-30,顏色│A│值為0-2,顏色│B│值為0-2,染色深度大於23μm。Preferably, the outer anodized film layer has a color depth L of 0-30, a color │A│ value of 0-2, a color │B│ value of 0-2, and a dyeing depth of more than 23 μm.

較佳地,該方法還包括:將步驟d中得到的該第二染色處理後的鋁合金基體進行封孔,然後再進行步驟e的操作。Preferably, the method further comprises: sealing the second dyed aluminum alloy substrate obtained in step d, and then performing the operation of step e.

較佳地,步驟e中,先使該第二染色處理後的鋁合金基體的外側表面和部分內側表面覆蓋保護層,再將未覆蓋保護層的部分的氧化膜層和鋁合金基體去除,以形成該狹縫,該去除包括鐳雕去除、數控機床去除和化學蝕刻去除中的至少一種。Preferably, in step e, the outer surface and a portion of the inner surface of the second dyed aluminum alloy substrate are covered with a protective layer, and then the oxide film layer and the aluminum alloy substrate of the portion not covered with the protective layer are removed. The slit is formed, the removal including at least one of laser engraving removal, numerically controlled machine tool removal, and chemical etching removal.

較佳地,該方法還包括向該狹縫中填充絕緣體的步驟。Preferably, the method further includes the step of filling the slit with an insulator.

本發明第三方面:提供本發明第二方面的方法製備的鋁合金殼體。A third aspect of the invention provides an aluminum alloy casing prepared by the method of the second aspect of the invention.

本發明第四方面:提供一種個人電子裝置,該個人電子裝置包括本發明第一方面或第三方面的鋁合金殼體。According to a fourth aspect of the invention, there is provided a personal electronic device comprising the aluminum alloy casing of the first or third aspect of the invention.

通過上述技術方案,本發明提供鋁合金殼體從殼體外側表面看為連續的金屬層,金屬層中的狹縫可用於作為天線槽。金屬層表面的氧化膜層起到了良好的遮蔽作用,使得狹縫表觀不可見,殼體整潔光滑,具有較好的金屬質感。此外,氧化膜層較高的硬度使鋁合金殼體具有優良的耐磨性、抗震性和耐腐蝕性。With the above technical solution, the present invention provides that the aluminum alloy casing is a continuous metal layer as seen from the outer surface of the casing, and the slit in the metal layer can be used as an antenna groove. The oxide film layer on the surface of the metal layer plays a good shielding effect, so that the slit is not visible, the casing is clean and smooth, and has a good metal texture. In addition, the higher hardness of the oxide film layer gives the aluminum alloy casing excellent wear resistance, shock resistance and corrosion resistance.

本發明的其他特徵和優點將在隨後的具體實施方式部分予以詳細說明。Other features and advantages of the invention will be described in detail in the detailed description which follows.

以下結合附圖對本揭露的具體實施方式進行詳細說明。應當理解的是,此處所描述的具體實施方式僅用於說明和解釋本揭露,並不用於限制本揭露。The specific embodiments of the present disclosure are described in detail below with reference to the accompanying drawings. It should be understood that the specific embodiments described herein are merely illustrative of the invention and are not intended to limit the disclosure.

本發明第一方面:提供一種鋁合金殼體,該鋁合金殼體包括鋁合金基體1和覆蓋在該鋁合金基體1表面的氧化膜層2;該鋁合金基體1上具有狹縫3,該狹縫3在該鋁合金基體1的外側表面和內側表面上分別開設有外側開口4和內側開口5,該氧化膜層2將該狹縫的外側開口4封閉;該氧化膜層2可以包括至少一層的內層陽極氧化膜層21以及至少一層的外層陽極氧化膜層22;該內層陽極氧化膜層21具有內層陽極氧化膜層奈米孔,該外層陽極氧化膜層22具有外層陽極氧化膜層奈米孔,該內層陽極氧化膜層奈米孔和外層陽極氧化膜層奈米孔內各自獨立地填充有染色染料,該染色染料包括有機染料。在本發明中,在未作相反說明的情況下,鋁合金基體的“外側表面”是指用於手機等個人電子通訊裝置的後殼時遠離裝置機身的一面,“內側表面”指靠近裝置機身的一面。本發明提供的鋁合金殼體可用於手機等個人電子通訊裝置的後殼,狹縫可作為天線槽,無訊號遮蔽現象。A first aspect of the present invention provides an aluminum alloy casing comprising an aluminum alloy base 1 and an oxide film layer 2 covering the surface of the aluminum alloy base 1; the aluminum alloy base 1 has a slit 3 thereon, The slit 3 has an outer opening 4 and an inner opening 5 respectively on the outer side surface and the inner side surface of the aluminum alloy base 1, and the oxide film layer 2 closes the outer opening 4 of the slit; the oxide film layer 2 may include at least a layer of an inner anodized film layer 21 and at least one outer layer of anodized film layer 22; the inner anodized film layer 21 has an inner anodized film layer nanopore, and the outer layer anodized film layer 22 has an outer layer anodized Membrane nanopore, the inner anodized film layer nanopore and the outer anodized film layer nanopore are each independently filled with a dye, and the dye includes an organic dye. In the present invention, the "outer surface" of the aluminum alloy substrate refers to the side away from the device body when used in the rear case of a personal electronic communication device such as a mobile phone, and the "inside surface" refers to the device. One side of the fuselage. The aluminum alloy casing provided by the invention can be used for the back shell of a personal electronic communication device such as a mobile phone, and the slit can be used as an antenna slot without signal shielding.

第1圖是本發明第一方面提供的一種鋁合金殼體的一種具體實施方式的結構圖,如第1圖所示,氧化膜層2包括一層內層陽極氧化膜層21、以及一層外層陽極氧化膜層22。1 is a structural view of a specific embodiment of an aluminum alloy casing provided by the first aspect of the present invention. As shown in FIG. 1, the oxide film layer 2 includes an inner anodized film layer 21 and an outer layer anode. Oxide film layer 22.

根據本發明的第一方面,內層陽極氧化膜層奈米孔的孔徑可以為30-100nm;外層陽極氧化膜層奈米孔的孔徑可以為10-50nm,該內層陽極氧化膜層奈米孔的孔徑大於該外層陽極氧化膜層奈米孔的孔徑。該內層陽極氧化膜層奈米孔的密度可以為550-900個/平方微米,該外層陽極氧化膜層奈米孔的密度可以為200-550個/平方微米。氧化膜層內奈米孔的孔徑可以採用JSM-7600F型熱場掃描電子顯微鏡進行測定,在放大倍數為100000倍時對未封孔的陽極氧化膜進行表面拍照觀察,計算單位面積內奈米孔的平均孔徑即為氧化膜層內奈米孔的孔徑。奈米孔的密度可以採用JSM-7600F型熱場掃描電子顯微鏡進行測定,在放大倍數為20000-100000倍時,對未封孔的氧化膜進行表面拍照觀察,計算單位面積內奈米孔或奈米管的個數即為奈米孔的密度。According to the first aspect of the invention, the inner anodized film layer nanopore may have a pore diameter of 30-100 nm; the outer anodized film layer nanopore may have a pore diameter of 10-50 nm, and the inner layer anodized film layer nanometer. The pore size of the pores is larger than the pore diameter of the nanopores of the outer anodized film layer. The inner anodized film layer nanopore may have a density of 550-900 particles/square micrometer, and the outer anodized film layer nanopore may have a density of 200-550 pieces/square micrometer. The pore size of the nanopore in the oxide film layer can be measured by a JSM-7600F thermal field scanning electron microscope. The surface of the unsealed anodized film is photographed at a magnification of 100,000 times, and the nanopore per unit area is calculated. The average pore diameter is the pore diameter of the nanopore in the oxide film layer. The density of the nanopore can be measured by a JSM-7600F thermal field scanning electron microscope. When the magnification is 20000-100000 times, the unsealed oxide film is photographed on the surface to calculate the nanopore or nai per unit area. The number of rice tubes is the density of the nanopores.

根據本發明的第一方面,為了使氧化膜層具有遮蔽性,以使得狹縫表觀不可見,內層陽極氧化膜層奈米孔和外層陽極氧化膜層奈米孔內可以各自獨立地填充有染色染料。染色染料可以包括有機染料,進一步地,該有機染料可以包括奧野420染料、415染料和419染料中的至少一種。氧化膜層2填充有染色染料可以使得氧化膜層2的色彩深度L值為0-30,顏色│A│值為0-2,顏色│B│值為0-2,染色深度大於23μm。其中,色彩深度L值、顏色│A│值和顏色│B│值的含義為本領域技術人員所熟知,色彩深度L值是指顏色的深淺,顏色越深L值越小,顏色越淺L值越大;顏色│A│值是指色差計測出來的紅綠色相值的絕對值,A值為正數時代表紅色,A值為負數時代表綠色;顏色│B│值指色差計測出來的黃藍色相值的絕對值,B值為正數時代表黃色,B值為負數時代表藍色。本發明中,色彩深度L值、顏色│A│值和顏色│B│值採用戴安中國股份有限公司的ICS-90離子色譜儀進行測定。染色深度是指從氧化膜表面開始到下層奈米孔中染料均飽和或接近飽和狀態的膜層厚度。According to the first aspect of the present invention, in order to make the oxide film layer have a shielding property so that the slit is apparently invisible, the inner layer of the anodized film layer and the outer layer of the anodized film layer may be independently filled in each other. There are dyeing dyes. The dyeing dye may include an organic dye, and further, the organic dye may include at least one of the Oku 420 dye, the 415 dye, and the 419 dye. The oxide film layer 2 is filled with a dyeing dye so that the oxide film layer 2 has a color depth L value of 0-30, a color │A│ value of 0-2, a color │B│ value of 0-2, and a dyeing depth of more than 23 μm. The meanings of the color depth L value, the color │ A │ value and the color │ B │ value are well known to those skilled in the art, and the color depth L value refers to the depth of the color, and the darker the color, the smaller the L value, the lighter the color. The larger the value; the color │A│ value refers to the absolute value of the red-green phase value measured by the color difference meter. When the A value is positive, it represents red, the A value is negative, it represents green; the color │B│ value refers to the yellow color measured by the color difference meter. The absolute value of the blue phase value. When the B value is positive, it represents yellow. When the B value is negative, it represents blue. In the present invention, the color depth L value, the color │ A │ value, and the color │ B │ value are measured using an ICS-90 ion chromatograph of Dai An China Co., Ltd. The depth of dyeing refers to the thickness of the film from the surface of the oxide film to the saturation or near saturation of the dye in the lower layer of the nanopore.

本發明第一方面所提供的鋁合金殼體具有較高的硬度,其氧化膜層2的硬度可以為320HV0.1 -500HV0.1 ,耐磨性、抗震性和耐腐蝕性較好。氧化膜層的表面硬度可以採用上海奧龍星迪檢測裝置有限公司的HV-100型儀器,通過直接測量氧化膜表面硬度的方法進行測定,測試條件為:壓力1N,保壓時間10s。The aluminum alloy casing provided by the first aspect of the invention has high hardness, and the oxide film layer 2 may have a hardness of 320 HV 0.1 -500 HV 0.1 , and has good wear resistance, shock resistance and corrosion resistance. The surface hardness of the oxide film layer can be measured by directly measuring the surface hardness of the oxide film by the HV-100 type instrument of Shanghai Aolong Xingdi Testing Equipment Co., Ltd. The test conditions are: pressure 1N, holding time 10s.

根據本發明的第一方面,內層陽極氧化膜層21的厚度可以為1-60μm,較佳為5-30μm;該外層陽極氧化膜層22的厚度可以為1-60μm,較佳為5-30μm。According to the first aspect of the invention, the inner anodized film layer 21 may have a thickness of from 1 to 60 μm, preferably from 5 to 30 μm; and the outer anodized film layer 22 may have a thickness of from 1 to 60 μm, preferably 5 - 30 μm.

根據本發明的第一方面,狹縫3的寬度可以為適合作為天線槽的任意寬度,例如可以為0.5-10mm,較佳為1-3mm。狹縫3的數量和位置可以根據實際需要進行設計,例如,狹縫3的數量可以為1-10個,較佳為1-3個。狹縫3的存在可以將鋁合金基體1分隔為彼此絕緣的至少兩塊;狹縫3的存在也可以將鋁合金基體1部分分隔,分隔後的鋁合金基體1還可以為整體的一塊。為了確保個人電子通訊裝置內的天線可以接收到訊號以及保證鋁合金殼體的連續性,狹縫3裡可以填充有絕緣體,該絕緣體的種類可以為本領域常規使用的,例如可以為膠質材料等。According to the first aspect of the invention, the width of the slit 3 may be any width suitable as an antenna groove, and may be, for example, 0.5 to 10 mm, preferably 1 to 3 mm. The number and position of the slits 3 can be designed according to actual needs. For example, the number of the slits 3 can be 1-10, preferably 1-3. The presence of the slit 3 can separate the aluminum alloy base 1 into at least two pieces insulated from each other; the presence of the slit 3 can also partially partition the aluminum alloy base 1, and the separated aluminum alloy base 1 can also be a unitary piece. In order to ensure that the antenna in the personal electronic communication device can receive the signal and ensure the continuity of the aluminum alloy casing, the slit 3 can be filled with an insulator, and the type of the insulator can be conventionally used in the art, for example, a gel material or the like. .

本發明第一方面提供的鋁合金殼體,從殼體的外側表面看為連續的金屬層,金屬層中的狹縫填充絕緣體,可用於作為天線槽。金屬層表面的氧化膜層填充有染色染料,且由於內層陽極氧化膜層奈米孔的孔徑大於外層陽極氧化膜層奈米孔,使染色染料更易於且更多的沉積在內層陽極氧化膜層。氧化膜層具有一定的色彩深度,起到了良好的遮蔽作用,使得狹縫表觀不可見,殼體整潔光滑,具有較好的金屬質感。此外,氧化膜層較高的硬度使鋁合金殼體具有優良的耐磨性、抗震性和耐腐蝕性。The aluminum alloy casing provided by the first aspect of the invention is a continuous metal layer as seen from the outer side surface of the casing, and the slit in the metal layer is filled with an insulator, which can be used as an antenna groove. The oxide film layer on the surface of the metal layer is filled with the dyeing dye, and since the pore diameter of the inner anodized film layer nanopore is larger than that of the outer anodized film layer, the dyeing dye is more easily and more deposited in the inner layer anodizing. Membrane layer. The oxide film layer has a certain color depth and plays a good shielding effect, so that the slit is invisible, the casing is clean and smooth, and has a good metal texture. In addition, the higher hardness of the oxide film layer gives the aluminum alloy casing excellent wear resistance, shock resistance and corrosion resistance.

本發明第二方面:提供一種製備鋁合金殼體的方法,該方法包括以下步驟:a、將鋁合金基體進行第一陽極氧化處理,得到第一陽極氧化處理後的鋁合金基體,該第一陽極氧化處理使得鋁合金基體覆蓋有含有外層陽極氧化膜層奈米孔的外層陽極氧化膜層,該外層陽極氧化膜層奈米孔的孔徑為10-50nm;b、將步驟a中得到的該第一陽極氧化處理後的鋁合金基體進行第一染色處理,得到第一染色處理後的鋁合金基體,該第一染色處理使得外層陽極氧化膜層奈米孔內填充有染色染料;c、將步驟b中得到的該第一染色處理後的鋁合金基體進行第二陽極氧化處理,得到第二陽極氧化處理後的鋁合金基體,該第二陽極氧化處理使得鋁合金基體覆蓋有含有內層陽極氧化膜層奈米孔的內層陽極氧化膜層,該內層陽極氧化膜層奈米孔的孔徑為30-100nm;d、將步驟c中得到的該第二陽極氧化處理後的鋁合金基體進行第二染色處理,得到第二染色處理後的鋁合金基體,該第二染色處理使得內層陽極氧化膜層奈米孔和/或外層陽極氧化膜層奈米孔內填充有染色染料;e、將步驟d中得到的該第二染色處理後的鋁合金基體中的鋁合金基體部分進行部分去除以形成狹縫,該狹縫在該鋁合金基體的外側表面和內側表面上分別開設有外側開口和內側開口,該氧化膜層將該狹縫的外側開口封閉。該內層陽極氧化膜層的奈米孔的密度可以為550-900個/平方微米,該外層陽極氧化膜層的奈米孔的密度可以為200-550個/平方微米。A second aspect of the present invention provides a method for preparing an aluminum alloy casing, the method comprising the steps of: a. performing an first anodizing treatment on the aluminum alloy substrate to obtain a first anodized aluminum alloy substrate, the first Anodizing treatment, the aluminum alloy substrate is covered with an outer anodized film layer containing an outer anodized film layer nanopore, the outer anodized film layer nanopore has a pore diameter of 10-50 nm; b, the step obtained in step a The first anodized aluminum alloy substrate is subjected to a first dyeing treatment to obtain a first dyed aluminum alloy substrate, and the first dyeing treatment causes the outer anodized film layer to be filled with a dyeing dye in the nanopore; c. The first dyed aluminum alloy substrate obtained in step b is subjected to a second anodizing treatment to obtain a second anodized aluminum alloy substrate, and the second anodizing treatment causes the aluminum alloy substrate to be covered with an inner layer anode An inner anodized film layer of an oxide film layer nanopore having a pore diameter of 30-100 nm; d, the first step obtained in step c The second anodized aluminum alloy substrate is subjected to a second dyeing treatment to obtain a second dyed aluminum alloy substrate, and the second dyeing treatment causes the inner anodized film layer nanopore and/or the outer anodized film layer. The rice hole is filled with a dyeing dye; e, the aluminum alloy base portion of the second dyed aluminum alloy substrate obtained in step d is partially removed to form a slit, and the slit is outside the aluminum alloy substrate An outer opening and an inner opening are respectively formed on the surface and the inner side surface, and the oxide film layer closes the outer opening of the slit. The density of the nanopores of the inner anodized film layer may be 550-900 pieces/square micrometer, and the density of the nanopores of the outer anodized film layer may be 200-550 pieces/square micrometer.

根據本發明的第二方面,在對鋁合金基體進行第一陽極氧化處理前,可以先進行前處理,該前處理為本領域技術人員所熟知,例如可以包括鹼蝕、中和、化拋及水洗等步驟。According to a second aspect of the present invention, prior to the first anodizing treatment of the aluminum alloy substrate, a pretreatment may be performed, which is well known to those skilled in the art and may include, for example, alkali etching, neutralization, and polishing. Washing and other steps.

根據本發明的第二方面,第一陽極氧化處理可以包括將該鋁合金基體與含有硫酸和草酸的第一水溶液接觸。其中,以1000重量份的該第一水溶液為基準,硫酸的含量可以為90-260重量份,較佳為160-190重量份;草酸的含量可以為4-25重量份,較佳為6-10重量份。該第一陽極氧化處理在脈衝電流下進行,第一陽極氧化處理的條件可以為:溫度為0-20℃,電流的脈衝波型為正向方波脈衝,占空比為30-99%,電流的頻率為100-1000Hz,電流密度為2-8A/dm2 ,電壓為30-60V,時間為10-80min。實際操作時,可以在上述條件下將鋁合金基體置於容納有第一水溶液的陽極氧化槽內進行第一陽極氧化處理。According to a second aspect of the invention, the first anodizing treatment may comprise contacting the aluminum alloy substrate with a first aqueous solution containing sulfuric acid and oxalic acid. Wherein, the content of sulfuric acid may be 90-260 parts by weight, preferably 160-190 parts by weight, based on 1000 parts by weight of the first aqueous solution; the content of oxalic acid may be 4-25 parts by weight, preferably 6- 10 parts by weight. The first anodizing treatment is performed under a pulse current, and the first anodizing treatment condition may be: a temperature of 0-20 ° C, a pulse waveform of the current is a forward square wave pulse, and a duty ratio of 30-99%, The current has a frequency of 100-1000 Hz, a current density of 2-8 A/dm 2 , a voltage of 30-60 V, and a time of 10-80 min. In actual operation, the aluminum alloy substrate may be subjected to a first anodizing treatment in an anodizing bath containing the first aqueous solution under the above conditions.

根據本發明的第二方面,為了使氧化膜層具有遮蓋性,以使得狹縫表觀不可見,進行第一陽極氧化處理後可以對該第一陽極氧化處理後的鋁合金基體進行第一染色處理。第一染色處理可以包括將該第一陽極氧化處理後的鋁合金基體與有機染料接觸,該有機染料可以包括奧野420染料、415染料和419染料中的至少一種,該有機染料的濃度可以為合適的任意比例,較佳地,該有機染料的濃度為10-20g/L。第一染色處理的條件可以為:溫度為25-65℃,較佳為40-60℃,時間為5-50min,較佳為20-40min。第一染色處理使得外層陽極氧化膜層奈米孔內填充有染色染料。According to the second aspect of the present invention, in order to make the oxide film layer have opacity so that the slit is apparently invisible, the first anodizing treatment may be performed on the first anodized aluminum alloy substrate after the first anodizing treatment. deal with. The first dyeing treatment may include contacting the first anodized aluminum alloy substrate with an organic dye, and the organic dye may include at least one of the Oku 420 dye, the 415 dye, and the 419 dye, and the concentration of the organic dye may be suitable. In any ratio, preferably, the concentration of the organic dye is 10-20 g/L. The conditions of the first dyeing treatment may be: a temperature of 25 to 65 ° C, preferably 40 to 60 ° C, and a time of 5 to 50 min, preferably 20 to 40 min. The first dyeing treatment causes the outer anodized film layer to be filled with a dyeing dye in the nanopore.

根據本發明的第二方面,第二陽極氧化處理可以包括將該鋁合金基體與含有硫酸的第二水溶液接觸。其中,以1000重量份的第二水溶液為基準,硫酸的含量可以為110-360重量份,較佳為180-200重量份。該第二陽極氧化處理在直流電下進行,第二陽極氧化處理的條件可以為:電壓為13-20V,溫度為25-65℃,時間為5-50min。實際操作時,在進行第一染色處理後,可以將鋁合金基體快速轉移至容納有第二水溶液的陽極氧化槽內進行第二陽極氧化處理。鋁合金基體表面所形成的氧化膜層的硬度在320-500HV0.1According to a second aspect of the invention, the second anodizing treatment may comprise contacting the aluminum alloy substrate with a second aqueous solution containing sulfuric acid. The content of sulfuric acid may be 110-360 parts by weight, preferably 180-200 parts by weight, based on 1000 parts by weight of the second aqueous solution. The second anodizing treatment is performed under direct current, and the second anodizing treatment may be performed under the conditions of a voltage of 13-20 V, a temperature of 25-65 ° C, and a time of 5-50 min. In actual operation, after the first dyeing treatment, the aluminum alloy substrate can be quickly transferred to the anodizing bath containing the second aqueous solution for the second anodizing treatment. The hardness of the oxide film layer formed on the surface of the aluminum alloy substrate is 320-500 HV 0.1 .

根據本發明的第二方面,為了進一步提高氧化膜層的遮蓋性,進行第二陽極氧化處理後可以對該第二陽極氧化處理後的鋁合金基體進行第二染色處理。第二染色處理可以包括將該第二陽極氧化處理後的鋁合金基體與有機染料接觸,該有機染料可以包括奧野420染料、415染料和419染料中的至少一種,該有機染料的濃度可以為合適的任意比例,較佳地,該有機染料的濃度為10-20g/L。第二染色處理的條件可以為:溫度為25-65℃,較佳為40-60℃,時間為5-50min,較佳為20-40min。第二染色處理使得內層陽極氧化膜層奈米孔和/或外層陽極氧化膜層奈米孔內填充有染色染料。According to the second aspect of the present invention, in order to further improve the hiding property of the oxide film layer, the second anodizing treatment may be subjected to a second dyeing treatment on the second anodized aluminum alloy substrate. The second dyeing treatment may include contacting the second anodized aluminum alloy substrate with an organic dye, and the organic dye may include at least one of the Oku 420 dye, the 415 dye, and the 419 dye, and the concentration of the organic dye may be suitable. In any ratio, preferably, the concentration of the organic dye is 10-20 g/L. The second dyeing treatment may be carried out at a temperature of 25 to 65 ° C, preferably 40 to 60 ° C, for a period of 5 to 50 minutes, preferably 20 to 40 minutes. The second dyeing treatment causes the inner anodized film layer nanopore and/or the outer anodized film layer nanopore to be filled with a dyeing dye.

根據本發明的第二方面,步驟a到步驟d的操作可以重複多次進行,然後再進行步驟e的操作。多次染色處理可以使得該外層陽極氧化膜層的色彩深度L值為0-30,顏色│A│值為0-2,顏色│B│值為0-2,染色深度大於23μm。According to the second aspect of the invention, the operations of steps a to d can be repeated a plurality of times, and then the operation of step e is performed. The multiple dyeing treatment can make the outer anodized film layer have a color depth L of 0-30, a color │A│ value of 0-2, a color │B│ value of 0-2, and a dyeing depth of more than 23 μm.

根據本發明的第二方面,為了提高氧化膜層的防污染和抗腐蝕性能,該方法還可以包括:將步驟d中得到的該第二染色處理後的鋁合金基體進行封孔,然後再進行步驟e的操作。該封孔的方法為本領域技術人員所熟知,例如可以為高溫封孔或冷封孔,該高溫封孔可以為將該覆蓋有氧化膜層的鋁合金基體置於溫度為90-95℃的水中處理15-20min;冷封孔可以為在室溫下將該覆蓋有氧化膜層的鋁合金基體與含有氟化鎳等的封孔液接觸。該封孔較佳為高溫封孔。According to the second aspect of the present invention, in order to improve the anti-pollution and anti-corrosion performance of the oxide film layer, the method may further include: sealing the second dyed aluminum alloy substrate obtained in the step d, and then performing the sealing The operation of step e. The method for sealing the hole is well known to those skilled in the art, for example, it may be a high temperature sealing hole or a cold sealing hole, and the high temperature sealing hole may be an aluminum alloy substrate covered with an oxide film layer at a temperature of 90-95 ° C. The water is treated for 15-20 min; the cold-sealed hole may be an aluminum alloy substrate covered with an oxide film layer at room temperature in contact with a plugging liquid containing nickel fluoride or the like. The sealing hole is preferably a high temperature sealing hole.

根據本發明的第二方面,本領域技術人員可以理解的是,在陽極氧化處理的步驟,鋁合金基體的外側表面和內側表面均覆蓋有氧化膜層,因此為了使鋁合金基體形成狹縫,步驟e中,可以先使該第二染色處理後的鋁合金基體的外側表面和部分內側表面覆蓋保護層,再將未覆蓋保護層的部分的氧化膜層和鋁合金基體去除,即所去除的部分為鋁合金基體的未覆蓋保護層的部分內側表面的氧化膜層和鋁合金基體,以形成該狹縫。該保護層為採用物理方法或化學方法覆蓋在鋁合金基體表面以使覆蓋有保護層部分的氧化膜層和鋁合金基體不被破壞的物質,例如可以為油墨塗層,或矽膠膜層。該油墨可以採用市面上的常規種類,例如可以為UV油墨;該矽膠膜也可以商購得到,例如可以為購自深圳西盟特電子有限公司的GHT2545G型號的綠色矽膠保護膜。覆蓋保護層後,可以採用包括但不限於鐳雕去除、數控機床去除和化學蝕刻去除的方法對未覆蓋保護層的鋁合金基體表面的氧化膜和鋁合金基體進行去除。該鐳雕、化學蝕刻的操作步驟和條件均可以採用本領域常規使用的,例如,鐳雕的條件可以為:功率70-110,鐳射走光速度為1980-2020mm/s,頻率為10-50kHz;化學蝕刻可以包括:使鋁合金基體與含有三氯化鐵和鹽酸的蝕刻液進行接觸,其中,以100重量份的該蝕刻液為基準,三氯化鐵的含量為70-90重量份,鹽酸的含量為4-8重量份,水的含量為10-15重量份,化學蝕刻的溫度可以為20-35℃,時間可以為10-30分鐘。鐳雕、CNC可以對氧化膜層和部分鋁合金基體進行去除,化學蝕刻可以進一步去除全部的鋁合金基體。According to the second aspect of the present invention, those skilled in the art can understand that in the step of anodizing, the outer surface and the inner surface of the aluminum alloy substrate are covered with an oxide film layer, so that in order to form the slit of the aluminum alloy substrate, In the step e, the outer surface and the inner side surface of the second dyed aluminum alloy substrate may be covered with a protective layer, and then the oxide film layer and the aluminum alloy substrate of the portion not covered with the protective layer are removed, that is, removed. The portion is an oxide film layer of an inner side surface of the aluminum alloy substrate which is not covered with the protective layer and an aluminum alloy substrate to form the slit. The protective layer is a substance which is physically or chemically covered on the surface of the aluminum alloy substrate so that the oxide film layer and the aluminum alloy substrate covered with the protective layer portion are not damaged, and may be, for example, an ink coating or a silicone film layer. The ink may be of a conventional type on the market, for example, may be a UV ink; the silicone film may also be commercially available, for example, a green silicone protective film of the GHT2545G model available from Shenzhen Ximeng Electronics Co., Ltd. After the protective layer is covered, the oxide film and the aluminum alloy substrate on the surface of the aluminum alloy substrate not covered with the protective layer may be removed by a method including, but not limited to, laser engraving removal, numerically controlled machine tool removal, and chemical etching removal. The operation steps and conditions of the laser engraving and chemical etching can be used conventionally in the art. For example, the conditions of the laser engraving can be: power 70-110, laser light travel speed of 1980-2020 mm/s, frequency of 10-50 kHz; The chemical etching may include: contacting the aluminum alloy substrate with an etching solution containing ferric chloride and hydrochloric acid, wherein the content of the ferric chloride is 70-90 parts by weight based on 100 parts by weight of the etching solution, and hydrochloric acid The content is 4-8 parts by weight, the water content is 10-15 parts by weight, the chemical etching temperature may be 20-35 ° C, and the time may be 10-30 minutes. The laser engraving and CNC can remove the oxide film layer and part of the aluminum alloy substrate, and the chemical etching can further remove all the aluminum alloy substrates.

根據本發明的第二方面,去除未覆蓋保護層部分的氧化膜層和鋁合金基體後,該方法還包括向該狹縫中填充絕緣體的步驟。該絕緣體的種類可以為本領域常規使用的,例如可以為膠質材料等。為了進一步使狹縫表觀不可見,該膠質材料的顏色較佳為非透明的其他顏色。該膠質材料內還可以添加固體顆粒,以產生反光效果,進一步提高狹縫的隱蔽性,該固體顆粒可以包括金屬單質或金屬氧化物,金屬單質可以為銀和/或鋁等,金屬氧化物可以為二氧化鈦和/或三氧化二鋁。According to a second aspect of the invention, after the oxide film layer and the aluminum alloy substrate which are not covered with the protective layer portion are removed, the method further comprises the step of filling the slit with an insulator. The kind of the insulator may be conventionally used in the art, and may be, for example, a gel material or the like. In order to further make the slit apparently invisible, the color of the gelatinous material is preferably other colors that are non-transparent. Solid particles may also be added to the gel material to produce a reflective effect, which may further improve the concealability of the slit. The solid particles may include a metal element or a metal oxide, and the metal element may be silver and/or aluminum, etc., the metal oxide may It is titanium dioxide and/or aluminum oxide.

根據本發明的第二方面,向狹縫中填充膠體後,該鋁合金殼體已基本製備完成,只需再將保護層去除即可。如保護層為油墨塗層,去除保護層的方法可以為採用可以溶解油墨塗層但不會與氧化膜層、鋁合金基體及狹縫內的絕緣體發生反應的脫漆劑對鋁合金殼體進行浸泡,該脫漆劑可以商購得到,例如可以為購自東莞市四輝表面處理科技有限公司的SH-665型號的脫漆劑。According to the second aspect of the invention, after the colloid is filled into the slit, the aluminum alloy casing has been substantially prepared, and only the protective layer is removed. If the protective layer is an ink coating, the method of removing the protective layer may be performed by using a paint stripper which can dissolve the ink coating but does not react with the oxide film layer, the aluminum alloy substrate and the insulator in the slit. For immersion, the paint stripper is commercially available, for example, it can be a paint remover of SH-665 model purchased from Dongguan Sihui Surface Treatment Technology Co., Ltd.

本發明第三方面:提供本發明第二方面的方法製備的鋁合金殼體。A third aspect of the invention provides an aluminum alloy casing prepared by the method of the second aspect of the invention.

本發明第四方面:提供一種個人電子裝置,該個人電子裝置包括本發明第一方面或第三方面的鋁合金殼體。According to a fourth aspect of the invention, there is provided a personal electronic device comprising the aluminum alloy casing of the first or third aspect of the invention.

下面通過實施例對本發明做進一步說明,但並不因此而限制本發明的內容。The invention is further illustrated by the following examples, but does not limit the invention.

實施例中,氧化膜層的形態結構、氧化膜層內奈米孔的孔徑和奈米孔的密度採用日本電子株式會社生產的JSM-7600F型號掃描電子顯微鏡測定,放大倍數為100000倍。 實施例In the examples, the morphology of the oxide film layer, the pore diameter of the nanopore in the oxide film layer, and the density of the nanopore were measured by a scanning electron microscope of JSM-7600F model manufactured by JEOL Ltd., and the magnification was 100,000 times. Example

對鋁合金基體進行前處理,包括鹼蝕、中和、化拋及水洗等。然後將前處理後的鋁合金基體置於容納有含硫酸和草酸水溶液的陽極氧化槽內進行第一陽極氧化處理,以1000重量份的該水溶液為基準,硫酸的含量為180重量份,草酸的含量為8重量份,條件為:電流的脈衝波型為正向方波脈衝,占空比為80%,電流的頻率為800Hz,電流密度4A/dm2 ,溫度為10℃,時間為25min,得到厚度為15μm的外層陽極氧化膜層,外層陽極氧化膜層的奈米孔的孔徑為25nm,外層陽極氧化膜層的奈米孔密度為365個/平方微米。然後將鋁合金基體放入有機染料槽中進行第一染色處理,染料為奧野420染料,濃度為20g/L,染色處理的條件為:溫度為50℃,時間為30min。在第一染色處理結束後,將鋁合金基體及掛具快速轉移到容納有含硫酸水溶液的陽極氧化槽中進行第二陽極氧化處理,以1000重量份的該水溶液為基準,硫酸的含量為190重量份,陽極條件為:電壓為15V,溫度為19℃,時間為35min,從而在外層陽極氧化膜層和鋁合金基體之間形成厚度為15μm的內層陽極氧化膜層,內層陽極氧化膜層的奈米孔的孔徑為30nm,內層陽極氧化膜層的奈米孔密度為760個/平方微米。然後將第二陽極氧化處理後的鋁合金基體放入有機染料槽中進行第二染色處理,染料為奧野420染料,濃度為20g/L,染色處理的條件為:溫度為50℃,時間為30min。然後將鋁合金基體置於95℃的水中進行高溫封孔20min。將鋁合金基體的外側表面和部分內側表面用矽膠保護膜(購於深圳西盟特電子有限公司的GHT2545G型號的綠色矽膠保護膜)進行覆蓋形成保護層,對未覆蓋的部分進行鐳雕以去除該部分的氧化膜層及部分鋁合金基體,條件為:功率為70%,鐳射走光速度為3000mm/s,頻率為80KHz,然後將鋁合金基體置於含有蝕刻液的容器內進行化學蝕刻,蝕刻液的成分及含量為:以100重量份的該蝕刻液為基準,三氯化鐵的含量為80重量份,鹽酸的含量為8重量份,水的含量為12重量份,蝕刻的溫度為常溫,蝕刻時間為10分鐘,化學蝕刻後使未被保護層覆蓋的區域的鋁合金基體完全去除形成1個狹縫,狹縫的寬度為2mm。向狹縫內填充白色膠質材料。最後將矽膠保護膜層去除,得到本實施例提供的鋁合金殼體。本實施例製備的鋁合金殼體的氧化膜層截面掃描電子顯微鏡照片見第2圖,可見氧化膜層具有明顯的內層陽極氧化膜層和外層陽極氧化膜層的複合膜介面。外層陽極氧化膜層截面和內層陽極氧化膜層截面掃描電子顯微鏡照片見第3圖、第4圖,可見內層陽極氧化膜層具有孔徑更大的奈米孔。外層陽極氧化膜層表面和內層陽極氧化膜層底部掃描電子顯微鏡照片見第5圖和第6圖。 對比例1The aluminum alloy substrate is pretreated, including alkali etching, neutralization, chemical polishing and water washing. Then, the pretreated aluminum alloy substrate is placed in an anodizing bath containing an aqueous solution containing sulfuric acid and oxalic acid to perform a first anodizing treatment, and the content of sulfuric acid is 180 parts by weight based on 1000 parts by weight of the aqueous solution, and oxalic acid is used. The content is 8 parts by weight, the condition is: the pulse waveform of the current is a forward square wave pulse, the duty ratio is 80%, the current frequency is 800 Hz, the current density is 4 A/dm 2 , the temperature is 10 ° C, and the time is 25 min. An outer anodized film layer having a thickness of 15 μm was obtained, the outer pore anodized film layer had a pore diameter of 25 nm, and the outer anodized film layer had a nanopore density of 365 particles/square micrometer. Then, the aluminum alloy substrate is placed in an organic dye tank for the first dyeing treatment, the dye is Okuno 420 dye, the concentration is 20 g/L, and the dyeing treatment condition is: the temperature is 50 ° C, and the time is 30 min. After the first dyeing treatment is finished, the aluminum alloy substrate and the hanger are quickly transferred to an anodizing bath containing an aqueous solution containing sulfuric acid for a second anodizing treatment, and the content of sulfuric acid is 190 based on 1000 parts by weight of the aqueous solution. In parts by weight, the anode conditions are: a voltage of 15 V, a temperature of 19 ° C, and a time of 35 min, thereby forming an inner anodized film layer having a thickness of 15 μm and an inner anodized film between the outer anodized film layer and the aluminum alloy substrate. The pore size of the layer of the nanopore is 30 nm, and the density of the inner anodized film layer is 760 particles/square micrometer. Then, the second anodized aluminum alloy substrate is placed in an organic dye tank for the second dyeing treatment, the dye is Okuno 420 dye, the concentration is 20 g/L, and the dyeing treatment condition is: the temperature is 50 ° C, the time is 30 min. . The aluminum alloy substrate was then placed in water at 95 ° C for high temperature sealing for 20 min. The outer surface and part of the inner surface of the aluminum alloy substrate are covered with a silicone protective film (a green silicone protective film of GHT2545G model purchased from Shenzhen Ximeng Electronics Co., Ltd.) to form a protective layer, and the uncovered portion is subjected to laser engraving to remove The oxide film layer and part of the aluminum alloy substrate of the part are as follows: the power is 70%, the laser light travel speed is 3000 mm/s, the frequency is 80 KHz, and then the aluminum alloy substrate is placed in a container containing an etching solution for chemical etching and etching. The composition and content of the liquid are: 80 parts by weight of the etching solution, the content of ferric chloride is 80 parts by weight, the content of hydrochloric acid is 8 parts by weight, the content of water is 12 parts by weight, and the etching temperature is room temperature. The etching time was 10 minutes. After the chemical etching, the aluminum alloy substrate in the region not covered by the protective layer was completely removed to form one slit, and the width of the slit was 2 mm. Fill the slit with a white gelatinous material. Finally, the silicone protective film layer is removed to obtain the aluminum alloy casing provided in the embodiment. The scanning electron micrograph of the oxide film layer of the aluminum alloy shell prepared in this embodiment is shown in Fig. 2. It can be seen that the oxide film layer has a composite film interface of an inner anodized film layer and an outer anodized film layer. Scanning electron micrographs of the cross section of the outer anodized film layer and the cross section of the anodized film layer of the inner layer are shown in Fig. 3 and Fig. 4. It can be seen that the inner anodized film layer has a nanopore having a larger pore diameter. Scanning electron micrographs of the surface of the outer anodized film layer and the bottom of the anodized film layer are shown in Figures 5 and 6. Comparative example 1

與實施例的區別在於,本對比例不進行第二陽極氧化處理和第二染色處理的步驟。 對比例2The difference from the embodiment is that the present comparative example does not perform the steps of the second anodizing treatment and the second dyeing treatment. Comparative example 2

與實施例的區別在於,本對比例不進行第一陽極氧化處理和第一染色處理的步驟。 測試實施例The difference from the embodiment is that the present comparative example does not perform the steps of the first anodizing treatment and the first dyeing treatment. Test example

測試實施例及對比例1-2的鋁合金殼體的染色深度、色彩深度L值、顏色A值、顏色B值和硬度。結果見表1。The dyeing depth, color depth L value, color A value, color B value, and hardness of the aluminum alloy casing of the examples and Comparative Examples 1-2 were tested. The results are shown in Table 1.

染色深度的測試方法為:採用蔡司光學儀器國際貿易有限公司的Axio Imsger Alm型金相顯微鏡,通過觀察陽極氧化膜截面顏色的差異來判斷染色的深度。染色深度是指從氧化膜表面開始到下層奈米孔中染料均飽和或接近飽和狀態的膜層厚度。The test method of dyeing depth is: using Axio Imsger Alm type metallographic microscope of Zeiss Optical Instrument International Trading Co., Ltd., the depth of dyeing is judged by observing the difference of the color of the cross section of the anodized film. The depth of dyeing refers to the thickness of the film from the surface of the oxide film to the saturation or near saturation of the dye in the lower layer of the nanopore.

色彩深度L值、顏色A值和顏色B值的測試方法為:採用戴安中國股份有限公司的ICS-90離子色譜儀儀器,通過直接測量表面的方法進行測定。The test method of the color depth L value, the color A value and the color B value is: using the ICS-90 ion chromatograph instrument of Dai An China Co., Ltd., the measurement is performed by directly measuring the surface.

硬度的測試方法為:採用上海奧龍星迪檢測裝置有限公司,HV-100型儀器,通過直接測量氧化膜表面硬度的方法進行測定,測試條件為:壓力1N,保壓時間10s。The test method of hardness is: using Shanghai Aolong Xingdi Testing Equipment Co., Ltd., HV-100 type instrument, by directly measuring the surface hardness of the oxide film, the test conditions are: pressure 1N, dwell time 10s.

外觀效果的測試方法為:對製備的鋁合金殼體進行拍照,採用photoshop軟體對照片中鋁合金殼體的天線槽部位和其他部位分別進行取色,天線槽部位的顏色記為color1(R1 ,G1 ,B1 ),其他部位的顏色記為color2(R2 ,G2 ,B2 ),根據式(I)計算color1和color2的顏色分量偏差平均值V,當V介於0.8-1.2之間時則天線槽部位與其他部位的膜層顏色差異肉眼難以分辨,即天線槽不可見,反之則天線槽可見。式(I)The test method of the appearance effect is as follows: taking the photographed aluminum alloy shell to take photos, using the photoshop software to take the color of the antenna slot portion and other parts of the aluminum alloy shell in the photograph, and the color of the antenna slot portion is recorded as color1 (R 1 , G 1 , B 1 ), the color of other parts is recorded as color2(R 2 , G 2 , B 2 ), and the average value V of the color component deviation of color1 and color2 is calculated according to formula (I), when V is between 0.8 and 1.2 The difference between the color of the film layer and the other parts of the antenna is difficult to distinguish with the naked eye, that is, the antenna slot is not visible, and the antenna slot is visible. Formula (I)

然後將製備的鋁合金殼體置於水平面上,採用與水平面呈45°的光線照射鋁合金殼體表面,拍照並用photoshop軟體尋找鋁合金殼體表面是否出現陰影或者亮斑。當鋁合金殼體的天線槽部位的氧化膜層具有凸起或凹陷等不良情況時,凸起或凹陷處被光線照射呈現陰影或者亮斑,反之則無陰影或者亮斑。 表1 Then, the prepared aluminum alloy casing is placed on a horizontal surface, and the surface of the aluminum alloy casing is irradiated with light of 45° with a horizontal plane, and the photoshop software is used to find whether the surface of the aluminum alloy casing has shadows or bright spots. When the oxide film layer of the antenna groove portion of the aluminum alloy case has defects such as protrusions or depressions, the protrusions or depressions are illuminated by light to form a shadow or a bright spot, and vice versa, there is no shadow or bright spot. Table 1

可見,本發明提供的鋁合金殼體從殼體的外側表面看為連續的金屬層,金屬層表面的氧化膜層起到了良好的遮蔽作用,使得狹縫表觀不可見,殼體整潔光滑,具有較好的金屬質感。此外,氧化膜層較高的硬度使鋁合金殼體具有優良的耐磨性、抗震性和耐腐蝕性。It can be seen that the aluminum alloy casing provided by the present invention sees a continuous metal layer from the outer surface of the casing, and the oxide film layer on the surface of the metal layer plays a good shielding effect, so that the slit is invisible and the casing is clean and smooth. Has a good metal texture. In addition, the higher hardness of the oxide film layer gives the aluminum alloy casing excellent wear resistance, shock resistance and corrosion resistance.

以上結合附圖詳細描述了本發明的較佳實施方式,但是,本發明並不限於上述實施方式中的具體細節,在本發明的技術構思範圍內,可以對本發明的技術方案進行多種簡單變型,這些簡單變型均屬於本發明的保護範圍。The preferred embodiments of the present invention have been described in detail above with reference to the accompanying drawings. However, the present invention is not limited to the specific details in the above embodiments, and various simple modifications of the technical solutions of the present invention can be made within the scope of the technical idea of the present invention. These simple variations are within the scope of the invention.

另外需要說明的是,在上述具體實施方式中所描述的各個具體技術特徵,在不矛盾的情況下,可以通過任何合適的方式進行組合,為了避免不必要的重複,本發明對各種可能的組合方式不再另行說明。It should be further noted that the specific technical features described in the above specific embodiments may be combined in any suitable manner without contradiction. In order to avoid unnecessary repetition, the present invention has various possible combinations. The method will not be explained otherwise.

此外,本發明的各種不同的實施方式之間也可以進行任意組合,只要其不違背本發明的思想,其同樣應當視為本發明所揭露的內容。In addition, any combination of the various embodiments of the present invention may be carried out as long as it does not deviate from the idea of the present invention, and it should also be regarded as the disclosure of the present invention.

1‧‧‧鋁合金基體1‧‧‧Aluminum alloy matrix

2‧‧‧氧化膜層2‧‧‧Oxide film

3‧‧‧狹縫3‧‧‧Slit

4‧‧‧外側開口4‧‧‧Outside opening

5‧‧‧內側開口5‧‧‧ inside opening

21‧‧‧內層陽極氧化膜層21‧‧‧Inner anodized film

22‧‧‧外層陽極氧化膜層22‧‧‧Outer anodized film

附圖是用來提供對本揭露的進一步理解,並且構成說明書的一部分,與下面的具體實施方式一起用於解釋本揭露,但並不構成對本揭露的限制。在附圖中: 第1圖是本發明提供的鋁合金殼體的一種具體實施方式的結構圖; 第2圖為實施例製備的鋁合金殼體的內層陽極氧化膜層與外層陽極氧化膜層介面的截面掃描電子顯微鏡照片; 第3圖為實施例製備的鋁合金殼體的外層陽極氧化膜層截面掃描電子顯微鏡照片; 第4圖為實施例製備的鋁合金殼體的內層陽極氧化膜層截面掃描電子顯微鏡照片; 第5圖為實施例製備的鋁合金殼體的外層陽極氧化膜層表面掃描電子顯微鏡照片; 第6圖實施例製備的鋁合金殼體的內層陽極氧化膜層底部掃描電子顯微鏡照片。The drawings are intended to provide a further understanding of the disclosure, and are intended to be a part of the description. In the drawings: FIG. 1 is a structural view of a specific embodiment of an aluminum alloy casing provided by the present invention; FIG. 2 is an inner anodized film layer and an outer anodized film of an aluminum alloy casing prepared by the embodiment. Sectional scanning electron micrograph of the layer interface; Fig. 3 is a scanning electron micrograph of the outer layer of the anodized film layer of the aluminum alloy shell prepared in the example; Fig. 4 is an anodizing of the inner layer of the aluminum alloy shell prepared by the embodiment Scanning electron micrograph of the cross-section of the film; Fig. 5 is a scanning electron micrograph of the surface of the outer anodized film of the aluminum alloy shell prepared in the example; Fig. 6 shows the inner anodized film of the aluminum alloy shell prepared by the embodiment of Fig. Bottom scanning electron micrograph.

Claims (20)

一種鋁合金殼體,該鋁合金殼體包括一鋁合金基體和覆蓋在該鋁合金基體表面的一氧化膜層;其特徵在於,該鋁合金基體上具有一狹縫,該狹縫在該鋁合金基體的外側表面和內側表面上分別開設有外側開口和內側開口,該氧化膜層將該狹縫的外側開口封閉;該氧化膜層包括一內層陽極氧化膜層以及一外層陽極氧化膜層;該內層陽極氧化膜層具有一內層陽極氧化膜層奈米孔,該外層陽極氧化膜層具有一外層陽極氧化膜層奈米孔,該內層陽極氧化膜層奈米孔的孔徑為30-100nm;該外層陽極氧化膜層奈米孔的孔徑為10-50nm,該內層陽極氧化膜層奈米孔的孔徑大於該外層陽極氧化膜層奈米孔的孔徑,該內層陽極氧化膜層奈米孔和外層陽極氧化膜層奈米孔內各自獨立地填充有一染色染料,該染色染料包括一有機染料。An aluminum alloy casing comprising an aluminum alloy substrate and an oxide film layer covering the surface of the aluminum alloy substrate; wherein the aluminum alloy substrate has a slit on the aluminum An outer side opening and an inner side opening are respectively defined on the outer side surface and the inner side surface of the alloy base, and the oxide film layer closes the outer opening of the slit; the oxide film layer comprises an inner anodized film layer and an outer anodized film layer The inner anodized film layer has an inner anodized film layer nanopore, and the outer anodized film layer has an outer anodized film layer nanopore, and the inner layer of the anodized film layer has a pore diameter of 30-100 nm; the outer anodized film layer has a pore diameter of 10-50 nm, and the inner layer of the anodized film layer has a pore diameter larger than a pore diameter of the outer anodized film layer nanopore, and the inner layer is anodized. The film nanopore and the outer anodized film layer are each independently filled with a dyeing dye, and the dyeing dye comprises an organic dye. 如申請專利範圍第1項所述之鋁合金殼體,其中,該內層陽極氧化膜層奈米孔的密度為550-900個/平方微米,該外層陽極氧化膜層奈米孔的密度為200-550個/平方微米。The aluminum alloy casing according to claim 1, wherein the density of the inner anodized film nanopore is 550-900/mm, and the density of the outer anodized film nanopore is 200-550 / square micron. 如申請專利範圍第1項所述之鋁合金殼體,其中,該有機染料包括奧野420染料、415染料和419染料中的至少一種。The aluminum alloy casing according to claim 1, wherein the organic dye comprises at least one of the Oku 420 dye, the 415 dye, and the 419 dye. 如申請專利範圍第1項所述之鋁合金殼體,其中,該氧化膜層的色彩深度L值為0-30,顏色│A│值為0-2,顏色│B│值為0-2,染色深度大於23μm。The aluminum alloy casing according to claim 1, wherein the oxide film layer has a color depth L of 0-30, a color │A│ value of 0-2, and a color │B│ value of 0-2. The dyeing depth is greater than 23 μm. 如申請專利範圍第1項所述之鋁合金殼體,其中,該氧化膜層的硬度為320HV0.1 -500HV0.1The aluminum alloy casing according to claim 1, wherein the oxide film layer has a hardness of 320 HV 0.1 -500 HV 0.1 . 如申請專利範圍第1項所述之鋁合金殼體,其中,該內層陽極氧化膜層的厚度為1-60μm;該外層陽極氧化膜層的厚度為1-60μm。The aluminum alloy casing according to claim 1, wherein the inner anodized film layer has a thickness of from 1 to 60 μm; and the outer anodized film layer has a thickness of from 1 to 60 μm. 如申請專利範圍第1項所述之鋁合金殼體,其中,該狹縫的寬度為0.5-10mm,該狹縫的數量為1-10個。The aluminum alloy casing according to claim 1, wherein the slit has a width of 0.5 to 10 mm, and the number of the slits is 1-10. 如申請專利範圍第1項或第7項所述之鋁合金殼體,其中,該狹縫將該鋁合金基體分隔為彼此絕緣的至少兩塊。The aluminum alloy casing according to claim 1 or 7, wherein the slit divides the aluminum alloy base into at least two pieces insulated from each other. 如申請專利範圍第1項所述之鋁合金殼體,其中,該狹縫裡填充有絕緣體。The aluminum alloy casing according to claim 1, wherein the slit is filled with an insulator. 一種製備鋁合金殼體的方法,其特徵在於,該方法包括以下步驟: a、將鋁合金基體進行一第一陽極氧化處理,得到該第一陽極氧化處理後的鋁合金基體,該第一陽極氧化處理使得鋁合金基體覆蓋有含有一外層陽極氧化膜層奈米孔的外層陽極氧化膜層,該外層陽極氧化膜層奈米孔的孔徑為10-50nm; b、將步驟a中得到的該第一陽極氧化處理後的鋁合金基體進行一第一染色處理,得到第一染色處理後的鋁合金基體,該第一染色處理使得外層陽極氧化膜層奈米孔內填充有染色染料; c、將步驟b中得到的該第一染色處理後的鋁合金基體進行一第二陽極氧化處理,得到第二陽極氧化處理後的鋁合金基體,該第二陽極氧化處理使得鋁合金基體覆蓋有含有一內層陽極氧化膜層奈米孔的內層陽極氧化膜層,該內層陽極氧化膜層奈米孔的孔徑為30-100nm; d、將步驟c中得到的該第二陽極氧化處理後的鋁合金基體進行一第二染色處理,得到第二染色處理後的鋁合金基體,該第二染色處理使得內層陽極氧化膜層奈米孔和/或外層陽極氧化膜層奈米孔內填充有染色染料; e、將步驟d中得到的該第二染色處理後的一鋁合金基體中的鋁合金基體部分進行部分去除以形成一狹縫,該狹縫在該鋁合金基體的外側表面和內側表面上分別開設有外側開口和內側開口,該氧化膜層將該狹縫的外側開口封閉。A method for preparing an aluminum alloy casing, comprising the steps of: a. performing a first anodizing treatment on the aluminum alloy substrate to obtain the first anodized aluminum alloy substrate, the first anode Oxidation treatment, the aluminum alloy substrate is covered with an outer anodized film layer containing an outer anodized film nanopore, the outer anodized film layer nanopore has a pore diameter of 10-50 nm; b, the step obtained in step a The first anodized aluminum alloy substrate is subjected to a first dyeing treatment to obtain a first dyed aluminum alloy substrate, and the first dyeing treatment is such that the outer anodized film layer is filled with a dyeing dye in the nanopore; c. The first dyed aluminum alloy substrate obtained in step b is subjected to a second anodizing treatment to obtain a second anodized aluminum alloy substrate, and the second anodizing treatment causes the aluminum alloy substrate to be covered with a An inner anodized film layer of an inner anodized film layer of nanopores, the inner layer of the anodized film layer has a pore diameter of 30-100 nm; d, which is obtained in step c The second anodized aluminum alloy substrate is subjected to a second dyeing treatment to obtain a second dyed aluminum alloy substrate, and the second dyeing treatment is performed to make the inner anodized film layer nanopore and/or outer layer anode The nanopore of the oxide film layer is filled with a dyeing dye; e, the aluminum alloy substrate portion of the second dyed aluminum alloy substrate obtained in step d is partially removed to form a slit, wherein the slit is The outer side surface and the inner side surface of the aluminum alloy base body are respectively provided with an outer side opening and an inner side opening, and the oxide film layer closes the outer opening of the slit. 如申請專利範圍第10項所述之方法,其中,該內層陽極氧化膜層奈米孔的密度為550-900個/平方微米,該外層陽極氧化膜層奈米孔的密度為200-550個/平方微米。The method of claim 10, wherein the density of the inner anodized film nanopore is 550-900/m 2 , and the density of the outer anodized film nanopore is 200-550. / square micron. 如申請專利範圍第10項所述之方法,其中,該第一陽極氧化處理包括將該鋁合金基體與含有硫酸和草酸的一第一水溶液接觸,以1000重量份的該第一水溶液為基準,硫酸的含量為90-260重量份,草酸的含量為4-25重量份;該第二陽極氧化處理包括將該鋁合金基體與含有硫酸的第二水溶液接觸,以1000重量份的第二水溶液為基準,硫酸的含量為110-360重量份。The method of claim 10, wherein the first anodizing treatment comprises contacting the aluminum alloy substrate with a first aqueous solution containing sulfuric acid and oxalic acid, based on 1000 parts by weight of the first aqueous solution. The content of sulfuric acid is 90-260 parts by weight, and the content of oxalic acid is 4-25 parts by weight; the second anodizing treatment comprises contacting the aluminum alloy substrate with a second aqueous solution containing sulfuric acid, and using 1000 parts by weight of the second aqueous solution as The basis, the content of sulfuric acid is 110-360 parts by weight. 如申請專利範圍第12項所述之方法,其中,該第一陽極氧化處理在脈衝電流下進行,該第一陽極氧化處理的條件為:電流的脈衝波型為正向方波脈衝,占空比為30-99%,電流的頻率為100-1000Hz,電流密度為2-8A/dm2 ,電壓為30-60V,溫度為0-20℃,時間為10-80min;該第二陽極氧化處理在直流電下進行,該第二陽極氧化處理的條件為:電壓為13-20V,溫度為5-25℃,時間為5-60min。The method of claim 12, wherein the first anodizing treatment is performed under a pulse current, and the condition of the first anodizing treatment is: a pulse waveform of the current is a forward square wave pulse, and the duty is The ratio is 30-99%, the current frequency is 100-1000 Hz, the current density is 2-8 A/dm 2 , the voltage is 30-60 V, the temperature is 0-20 ° C, and the time is 10-80 min; the second anodizing treatment The second anodizing treatment is carried out under the conditions of a voltage of 13-20 V, a temperature of 5-25 ° C, and a time of 5-60 min. 如申請專利範圍第10項所述之方法,其中,該第一染色處理包括將該第一陽極氧化處理後的鋁合金基體與一有機染料接觸;該第二染色處理包括將該第二陽極氧化處理後的鋁合金基體與有機染料接觸;該有機染料包括奧野420染料、415染料和419染料中的至少一種。The method of claim 10, wherein the first dyeing treatment comprises contacting the first anodized aluminum alloy substrate with an organic dye; the second dyeing treatment comprises oxidizing the second anodizing The treated aluminum alloy substrate is contacted with an organic dye; the organic dye includes at least one of the Oku 420 dye, the 415 dye, and the 419 dye. 如申請專利範圍第14項所述之方法,其中,該第一染色處理的條件為:溫度為25-65℃,時間為5-50min;該第二染色處理的條件為:溫度為25-65℃,時間為5-50min。The method of claim 14, wherein the condition of the first dyeing treatment is: a temperature of 25-65 ° C, a time of 5-50 min; and a condition of the second dyeing treatment: a temperature of 25-65 °C, time is 5-50min. 如申請專利範圍第10項所述之方法,其中,該外層陽極氧化膜層的色彩深度L值為0-30,顏色│A│值為0-2,顏色│B│值為0-2,染色深度大於23μm。The method of claim 10, wherein the outer anodized film layer has a color depth L of 0-30, a color │A│ value of 0-2, and a color │B│ value of 0-2. The dyeing depth is greater than 23 μm. 如申請專利範圍第10項所述之方法,其中,該方法還包括:將步驟d中得到的該第二染色處理後的鋁合金基體進行封孔,然後再進行步驟e的操作。The method of claim 10, wherein the method further comprises: sealing the second dyed aluminum alloy substrate obtained in step d, and then performing the operation of step e. 如申請專利範圍第10項所述之方法,其中,步驟e中,先使該第二染色處理後的鋁合金基體的外側表面和部分內側表面覆蓋保護層,再將未覆蓋保護層的部分的氧化膜層和鋁合金基體去除,以形成該狹縫,該去除包括鐳雕去除、數控機床去除和化學蝕刻去除中的至少一種。The method of claim 10, wherein in step e, the outer surface and a portion of the inner surface of the second dyed aluminum alloy substrate are covered with a protective layer, and then the portion of the protective layer is not covered. The oxide film layer and the aluminum alloy substrate are removed to form the slit, and the removal includes at least one of laser engraving removal, numerically controlled machine tool removal, and chemical etching removal. 如申請專利範圍第10項所述之方法,其中,該方法還包括向該狹縫中填充絕緣體的步驟。 The method of claim 10, wherein the method further comprises the step of filling the slit with an insulator. 一種個人電子裝置,其特徵在於,該個人電子裝置包括申請專利範圍第1項至第9項中任一項所述之鋁合金殼體。A personal electronic device, comprising the aluminum alloy casing according to any one of claims 1 to 9.
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