TWI667123B - Improved intake structure for laminated manufacturing - Google Patents

Improved intake structure for laminated manufacturing Download PDF

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Publication number
TWI667123B
TWI667123B TW107143367A TW107143367A TWI667123B TW I667123 B TWI667123 B TW I667123B TW 107143367 A TW107143367 A TW 107143367A TW 107143367 A TW107143367 A TW 107143367A TW I667123 B TWI667123 B TW I667123B
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gas
unit
laminated manufacturing
improvement
flow
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TW107143367A
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TW202021784A (en
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莊蘊哲
黃重鈞
林柏伸
任國光
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國家中山科學研究院
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    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P10/00Technologies related to metal processing
    • Y02P10/25Process efficiency

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Abstract

本發明係提供一種用於積層製造之進氣道結構改良,其係為一種用於積層製造之噴頭結構改良,透過該進氣道連接一氣體產生裝置,將該氣體產生裝置所產生之氣體導引進入該加工腔體,該進氣道結構係包括一連接於該氣體產生裝置之轉換單元、一連接該轉換單元用以導流進入氣體之導流單元、一連接該導流單元並調整該進入氣體流速之整流單元,及一引導氣體至該加工腔體內之腔體進氣單元,於該整流單元內設置有複數整流片,透過複數整流片設置的位置、間距及數量,以流阻控制方式達到控制進入加工腔體氣體橫斷面流速均勻流速分佈之目的。 The present invention provides an improved intake structure for laminated manufacturing, which is a structure improvement of a nozzle for laminated manufacturing, through which a gas generating device is connected, and a gas guide generated by the gas generating device Leading into the processing chamber, the inlet structure comprises a conversion unit connected to the gas generating device, a flow guiding unit connected to the conversion unit for guiding the gas into the gas, connecting the guiding unit and adjusting the a rectifying unit that enters a gas flow rate, and a cavity intake unit that guides the gas into the processing chamber, wherein a plurality of commutator segments are disposed in the rectifying unit, and the position, the spacing and the number of the plurality of commutator segments are set to control the flow resistance The method achieves the purpose of controlling the uniform flow velocity distribution of the gas cross-section into the processing chamber.

Description

用於積層製造之進氣道結構改良 Improved intake structure for laminated manufacturing

本發明係有關於一種進氣道結構改良,更詳而言之,尤指一種用於積層製造之進氣道結構改良。 The present invention relates to an improvement in the structure of the intake port, and more particularly to an improvement in the structure of the intake port for laminate manufacturing.

積層製造(Additive Manufacturing,AM)或三維列印(Three-dimensional Printing)為目前各國極力發展的技術,於各該先進國家更不餘餘力投入,進而改變目前製造環境及強化國際競爭力的優勢,就目前積層製造技術上,主要以雷射積層製造技術為主,該技術係利用雷射作為能量來源,透過雷射熔融原理,在將三維模型分割為二維幾何形狀,以鋪層方式鋪上粉末層,再透過雷射光束提供所需能量,對該二維幾何形狀上之粉末層進行熔融成形,並利用逐漸堆疊方式,達成傳統加工無法製作之複雜結構。 Additive Manufacturing (AM) or Three-Dimensional Printing is a technology that is currently being developed in various countries. It has spared no effort in this advanced country to change the current manufacturing environment and strengthen its international competitiveness. In the current laminated manufacturing technology, mainly based on laser laminate manufacturing technology, the technology uses laser as the energy source, through the laser melting principle, the three-dimensional model is divided into two-dimensional geometric shapes, paved The powder layer, which is then passed through the laser beam to provide the required energy, melt-forms the powder layer on the two-dimensional geometry, and uses a gradual stacking method to achieve a complex structure that cannot be fabricated by conventional processing.

請參閱第1圖,係為習知用於積層製造之進氣道結構示意圖,如圖所示,該結構包括一面板1,於該面板1上設置有複數通孔11,且該通孔11複包括中央通孔111及邊緣通孔112,分別將該中央通孔111孔徑以小於該邊緣通孔112方式設置,俾使進入腔體內氣體均勻分佈之目的,然而,該種設置方式,在氣體進入進氣道時,會於該進氣道內產生擾流,且該中 央通孔111之孔徑較小,故進入進氣道的氣體受到阻礙,而產生迴流的情況發生,因此會造成進入腔體內之氣體,受到迴流及中央通孔111孔徑阻礙,而無法如預期設計,均勻進入腔體的目的。 Referring to FIG. 1 , it is a schematic diagram of a conventional intake port structure for laminated manufacturing. As shown in the figure, the structure includes a panel 1 on which a plurality of through holes 11 are disposed, and the through holes 11 are provided. The central through hole 111 and the edge through hole 112 are respectively disposed, and the hole diameter of the central through hole 111 is respectively set to be smaller than the edge through hole 112, so that the gas entering the cavity is evenly distributed. However, the setting manner is that the gas enters into the air. In the airway, a spoiler is generated in the air inlet, and the middle The aperture of the central through hole 111 is small, so the gas entering the intake passage is hindered, and the recirculation occurs, so that the gas entering the cavity is blocked by the backflow and the aperture of the central through hole 111, and cannot be designed as expected. Uniform access to the cavity.

然而,目前雷射積層製造技術面臨生產效率不佳、工件物品質不穩定、金屬材料種類受限、製作材料及設備昂貴等問題,其中,工作物品質不穩定的原因,均因於進行積層製造時,焊渣與氧化物無法有效清除,而造成工作腔體內之雜質過高,進而影響未進行熔融成形的加工區,而導致成品中含有雜質及氧化物的情況發生。 However, at present, the laser laminate manufacturing technology faces problems such as poor production efficiency, unstable workpiece quality, limited metal materials, and expensive materials and equipment. Among them, the quality of the work is unstable due to the laminated manufacturing. When the slag and oxide are not effectively removed, the impurities in the working chamber are too high, which in turn affects the processing zone where the melt is not formed, and the impurities and oxides in the finished product occur.

基於上述,目前亟需一能夠保持加工區潔淨,及避免焊渣與氧化物汙染加工區,進而提高積層製造品質及穩定度之積層製造技術。 Based on the above, there is an urgent need for a laminate manufacturing technology that can keep the processing area clean and avoid welding slag and oxide contamination of the processing area, thereby improving the quality and stability of the laminated manufacturing.

鑒於上述習知技術之缺點,本發明主要之目的在於提供一種用於積層製造之進氣道結構改良,透過改變複數整流片設置的位置、間距及數量,以流阻控制方式達到控制進入加工腔體氣體橫斷面流速均勻流速分佈之目的。 In view of the above disadvantages of the prior art, the main object of the present invention is to provide an improvement of the intake port structure for laminated manufacturing, by changing the position, spacing and quantity of the plurality of commutator segments, and controlling the flow into the machining chamber by flow resistance control. The purpose of the uniform velocity distribution of the cross-sectional flow velocity of the body gas.

本發明又一目的,係提供一種用於積層製造之進氣道結構改良,透過變更整流片於該整流單元橫斷面的位置、間距及數量,達到控制進氣結構橫斷面氣體流量之目的。 Another object of the present invention is to provide an improved intake port structure for laminated manufacturing, which can achieve the purpose of controlling the cross-sectional gas flow of the intake structure by changing the position, spacing and number of the cross-section of the rectifying unit in the cross section of the rectifying unit. .

為達上述目的,本發明係提供一種用於積層製造 之進氣道結構改良,其係為一種用於積層製造設備加工腔體之進氣道結構改良,透過該進氣道連接一氣體產生裝置,並將該氣體產生裝置所產生之氣體導引進入該加工腔體,該進氣道結構係包括一連接於該氣體產生裝置之轉換單元、一連接該轉換單元用以導流進入氣體之導流單元、一連接該導流單元並調整該進入氣體流速之整流單元,及一用以將通過整流單元之氣體,引導至該加工腔體內之腔體進氣單元,其中,該整流單元內設置有複數整流片,透過複數整流片設置的位置、間距及數量,以流阻控制方式達到控制進入加工腔體氣體橫斷面流速均勻流速分佈之目的。 In order to achieve the above object, the present invention provides a method for laminated manufacturing The improvement of the inlet structure is an improvement of the inlet structure for the processing chamber of the laminated manufacturing equipment, through which a gas generating device is connected, and the gas generated by the gas generating device is guided into The processing chamber includes a conversion unit connected to the gas generating device, a flow guiding unit connected to the conversion unit for guiding the gas into the gas, a connecting the guiding unit and adjusting the inlet gas a rectifying unit of the flow rate, and a cavity intake unit for guiding the gas passing through the rectifying unit to the cavity of the processing chamber, wherein the rectifying unit is provided with a plurality of commutator segments, and the position and spacing of the plurality of commutator segments are set And the quantity, the flow resistance control method is used to achieve the purpose of controlling the uniform flow velocity distribution of the gas cross-section into the processing chamber.

1‧‧‧面板 1‧‧‧ panel

11‧‧‧通孔 11‧‧‧through hole

111‧‧‧中孔通孔 111‧‧‧Medium hole through hole

112‧‧‧邊緣通孔 112‧‧‧Edge through hole

2‧‧‧進氣道結構 2‧‧‧ Intake structure

21‧‧‧轉換單元 21‧‧‧Conversion unit

22‧‧‧導流單元 22‧‧‧Guide unit

23‧‧‧整流單元 23‧‧‧Rectifier unit

24‧‧‧進氣單元 24‧‧‧Air intake unit

231‧‧‧整流片 231‧‧‧Rectifier

第1圖係為習知進氣道結構示意圖。 Figure 1 is a schematic view of a conventional intake port structure.

第2圖係為本發明進氣道結構示意圖。 Figure 2 is a schematic view showing the structure of the intake port of the present invention.

第3圖係為習知4分格進氣道結構流場示意圖。 Figure 3 is a schematic diagram of the flow field of a conventional 4-division air intake structure.

第4圖係為本發明整流片結構示意圖。 Figure 4 is a schematic view showing the structure of the commutator piece of the present invention.

第5圖係為本發明第一實施態樣示意圖。 Figure 5 is a schematic view of a first embodiment of the present invention.

第6圖係為本發明第一實施態樣流場示意圖。 Figure 6 is a schematic view of the flow field of the first embodiment of the present invention.

以下係藉由特定的具體實例說明本發明之實施方式,熟悉此技藝之人士可由本說明書所揭示之內容瞭解本發明之其他優點與功效。 The embodiments of the present invention are described below by way of specific examples, and those skilled in the art can understand the other advantages and advantages of the present invention from the disclosure.

請參閱第2圖,係為本發明進氣道結構示意圖,如圖所示,其係為一種用於積層製造設備加工腔體之進氣道結構改良,透過該進氣道結構2連接一氣體產生裝置(未圖示),並將該氣體產生裝置所產生之氣體導引進入該加工腔體,該進氣道結構2係包括一連接於該氣體產生裝置之轉換單元21、一連接該轉換單元21用以導流進入氣體之導流單元22、一連接該導流單元22並調整該進入氣體流速之整流單元23,及一用以將通過整流單元23之氣體,引導至該加工腔體內之腔體進氣單元24,該進氣道結構2主要特徵為:該整流單元23內設置有複數整流片231,透過複數整流片231設置的位置、間距及數量,以流阻控制方式達到控制進入加工腔體氣體橫斷面流速均勻流速分佈之目的。 Please refer to FIG. 2 , which is a schematic view of the structure of the inlet passage of the present invention. As shown in the figure, it is an improvement of the inlet structure for the processing chamber of the laminated manufacturing equipment, and a gas is connected through the inlet structure 2 . Generating a device (not shown), and guiding the gas generated by the gas generating device into the processing chamber, the inlet structure 2 includes a conversion unit 21 connected to the gas generating device, and connecting the conversion The unit 21 is configured to guide the flow guiding unit 22 into the gas, a rectifying unit 23 connecting the guiding unit 22 and adjusting the flow rate of the incoming gas, and a unit for guiding the gas passing through the rectifying unit 23 into the processing chamber. The air intake unit 24 is characterized in that: the rectifying unit 23 is provided with a plurality of rectifying pieces 231, and the position, the spacing and the number of the plurality of rectifying pieces 231 are set, and the flow resistance control mode is used to control. Enter the purpose of the uniform flow velocity distribution of the cross-section flow velocity of the gas in the processing chamber.

請參閱第3圖,係為習知4分格進氣道結構流場示意圖,對該4分格導流結構進行流場分析(圖3a),為確保該設置方式各該高度之氣流流場狀況,故分別以加工平台為基準,進行各該高度變化與流場狀況測試(圖3b~3d所示),由上圖式所揭露,習知4分隔設置進氣道結構,於測試高度5mm時(圖3b)於該進氣道入口處,產生明顯之氣流擾動狀況,當測試高度提升至10mm時(圖3c),該中間氣體流擾動現象下降,但於該進氣道兩側產生擾動狀況增加,當該測試高度調整至15mm(圖3d),該入口處之擾動現象消失,該進氣道兩側之擾動現象降低,但卻無法消除該氣體擾動的情況,故於基層製作上,容易造成積 料或分佈不均的情況,進而影響積層製造的精確度 Please refer to Fig. 3, which is a schematic diagram of the flow field of the conventional 4-divle inlet structure, and the flow field analysis of the 4-division diversion structure (Fig. 3a), in order to ensure the flow field of the height at the height of the setting mode. In the case of the situation, each height change and flow field condition test (shown in Figures 3b to 3d) is performed on the basis of the processing platform. As disclosed in the above figure, the conventional 4 is provided with the inlet structure at a test height of 5 mm. At the inlet of the inlet (Fig. 3b), a significant disturbance of the airflow is generated. When the test height is raised to 10 mm (Fig. 3c), the disturbance of the intermediate gas flow is reduced, but disturbances are generated on both sides of the inlet. The condition increases. When the test height is adjusted to 15mm (Fig. 3d), the disturbance phenomenon at the entrance disappears, the disturbance phenomenon on both sides of the inlet is reduced, but the gas disturbance cannot be eliminated, so in the production of the base layer, Easy to cause product Uneven material or distribution, which in turn affects the accuracy of laminate manufacturing

請參閱第4圖,係為本發明整流片結構示意圖,如圖所示,該轉換單元21將外部氣體導入該進氣道結構後,該導流單元22將進行入氣體細分為多股較細小流量的流體,於該整流單元23處設置有複數整流片231,透過複數整流片231設置的位置、間距及數量,以流阻控制方式控制進入氣體流場流速及流量均勻性,再將氣體透過進氣單元24傳遞至加工腔體(未圖示)內,請參閱第5圖係為本發明第一實施態樣示意圖,如圖所示,利用調整該整流片231之高度h、長度L及各該整流片231設置間距b,俾使該進入進氣道結構2內之氣體,沿該轉換單元21進入,再透過導流單元22將該進入之氣體進行分流後進入整流單元,本案發明人為提升進入氣體之均勻性,故調整該整流單元23內之整流片231,透過調整該整流片之高度、長度及分布狀況,使各該不同位置的氣流受到不同阻力作用,成為均勻氣體進入腔體,其中,本發明係透過使用測試取樣區的速度,計算該進氣結構2之均勻度分析參數Uniformity ,作為進氣結構2之設計依據,透過 模擬結果當所得數值越趨近於1,則所得流速則越均勻,於說明書中提出,以間距0.05~0.2倍長度方式設置該整流片231間距,為設置上最佳之設置範圍。 Referring to FIG. 4, it is a schematic structural view of the rectifier sheet of the present invention. As shown in the figure, after the conversion unit 21 introduces external air into the inlet structure, the flow guiding unit 22 subdivides the incoming gas into a plurality of smaller pieces. The flow of the fluid is provided at the rectifying unit 23 with a plurality of commutator segments 231. The position, the spacing and the number of the plurality of commutator segments 231 are set, and the flow velocity and flow uniformity of the gas flow field are controlled by the flow resistance control method, and then the gas is permeated. The air intake unit 24 is transmitted to the processing chamber (not shown). Referring to FIG. 5, it is a schematic diagram of the first embodiment of the present invention. As shown in the figure, the height h and the length L of the fairing 231 are adjusted. Each of the segments 231 is provided with a spacing b, so that the gas entering the inlet structure 2 enters along the conversion unit 21, and then passes through the flow guiding unit 22 to divert the incoming gas into the rectifying unit. The inventor of the present invention The uniformity of the incoming gas is increased, so that the rectifying piece 231 in the rectifying unit 23 is adjusted, and the height, length and distribution of the rectifying piece are adjusted, so that the airflow at each of the different positions is subjected to different resistance effects. Forming a uniform gas into the cavity, wherein the present invention calculates the uniformity analysis parameter Uniformity of the intake structure 2 by using the velocity of the test sampling zone As the design basis of the intake structure 2, the more the obtained value becomes closer to 1, through the simulation result, the more uniform the flow rate is obtained, and it is proposed in the specification that the pitch of the fairing 231 is set at a pitch of 0.05 to 0.2 times. Set the optimal setting range.

請參閱第6圖,係為本發明第一實施態樣流場示意圖,由上圖式所揭露,本案以進氣單元24出口100mm~500mm 高度20mm處作為測試取樣區採集取樣點的速度數據,如圖所示,於常見4分格導流結構上另增加4分隔結構(如圖6a所示),且以蜂巢分格方式設置該整流片,進行該流道內流場狀況量測,為確保該設置方式各該高度之氣流流場狀況,分別以加工平台為基準,進行各該高度變化與流場狀況測試(圖6b~6d所示),於測試高度5mm時(圖6b),如圖所示該進氣道入口處,產生之氣流擾動狀況以中線兩側較為明顯,當測試高度為10mm時(圖6c),該入口處所產生之氣體擾動狀況較5mm時明顯,但當該測試高度調整至15mm(圖6d),該入口處之擾動現象消失。 Please refer to FIG. 6 , which is a schematic diagram of a flow field according to a first embodiment of the present invention, which is disclosed by the above figure. In this case, the air intake unit 24 exits 100 mm to 500 mm. The height of 20mm is used as the test sampling area to collect the sampling point velocity data. As shown in the figure, another 4 partition structure is added to the common 4-cell diversion structure (as shown in Fig. 6a), and the rectification is set in the honeycomb division mode. For the measurement of the flow field condition in the flow channel, in order to ensure the flow field state of the height of the installation mode, the height change and the flow field condition test are respectively performed based on the processing platform (Fig. 6b~6d) Show), at the test height of 5mm (Fig. 6b), as shown in the inlet of the inlet, the resulting airflow disturbance is more obvious on both sides of the centerline. When the test height is 10mm (Fig. 6c), the entrance The gas disturbance condition generated by the space is obvious when it is 5 mm, but when the test height is adjusted to 15 mm (Fig. 6d), the disturbance at the entrance disappears.

上述之實施例僅為例示性說明本發明之特點及其功效,而非用於限制本發明之實質技術內容的範圍。任何熟習此技藝之人士均可在不違背本發明之精神及範疇下,對上述實施例進行修飾與變化。因此,本發明之權利保護範圍,應如後述之申請專利範圍所列。 The above-described embodiments are merely illustrative of the features and functions of the present invention, and are not intended to limit the scope of the technical scope of the present invention. Modifications and variations of the above-described embodiments can be made by those skilled in the art without departing from the spirit and scope of the invention. Therefore, the scope of protection of the present invention should be as set forth in the scope of the claims described below.

Claims (5)

一種用於積層製造之進氣道結構改良,其係為一種用於積層製造設備加工腔體之進氣道結構改良,透過該進氣道連接一氣體產生裝置,並將該氣體產生裝置所產生之氣體導引進入該加工腔體,該進氣道結構係包括一連接於該氣體產生裝置之轉換單元、一連接該轉換單元用以導流進入氣體之導流單元、一連接該導流單元並調整該進入氣體流速之整流單元,及一用以將通過整流單元之氣體,引導至該加工腔體內之腔體進氣單元,該進氣道結構主要特徵為:該整流單元內設置有複數整流片,該整流片自該整流單元橫斷面中央向外擴張,以等比間距方式排列,透過複數整流片設置的位置、間距及數量,使不同位置的流體受到不同的阻力作用,以流阻控制進氣量的方式達到控制進氣結構橫斷面氣體流量之目的。 An improved intake port structure for laminated manufacturing, which is an improvement of an inlet structure for a processing chamber of a laminated manufacturing apparatus, through which a gas generating device is connected and generated by the gas generating device The gas is guided into the processing chamber, the inlet structure includes a conversion unit connected to the gas generating device, a flow guiding unit connected to the conversion unit for guiding the gas into the gas, and a connecting flow guiding unit And adjusting a rectifying unit for entering the gas flow rate, and a cavity intake unit for guiding the gas passing through the rectifying unit to the cavity in the processing cavity, wherein the main structure of the inlet channel is characterized in that: the rectifying unit is provided with a plurality of The commutator piece is expanded outward from the center of the cross section of the rectifying unit, arranged in an equidistant spacing manner, and the position, the spacing and the number of the plurality of rectifying sheets are arranged, so that the fluids at different positions are subjected to different resistance effects to flow The way of controlling the amount of intake air reaches the purpose of controlling the gas flow in the cross section of the intake structure. 如申請專利範圍第1項所述之用於積層製造之進氣道結構改良,其中,該整流片設置數量與該氣體流速大小成反比方式設置。 The improvement of the intake port structure for laminated manufacturing according to claim 1, wherein the number of the fins is set inversely proportional to the magnitude of the gas flow rate. 如申請專利範圍第1項所述之用於積層製造之進氣道結構改良,其中,該整流片彼此的設置間距,係介於整流片長度的0.05~0.2倍。 The improvement of the intake port structure for laminated manufacturing according to the first aspect of the patent application, wherein the arrangement distance of the commutator pieces is 0.05 to 0.2 times the length of the commutator piece. 如申請專利範圍第1項所述之用於積層製造之進氣道結構改良,其中,該整流片設置間距係以等差方式,自該整流單元橫斷面中央向外擴張方式設置。 The improvement of the intake port structure for laminated manufacturing according to the first aspect of the invention, wherein the set-up pitch of the commutator is arranged in an equidistant manner from the center of the cross-section of the rectifying unit. 如申請專利範圍第1項所述之用於積層製造之進氣道結構改良,其中,該進氣道結構之橫斷面係為圓形、長方型、三角型及多邊型其中一種。 The improvement of the intake port structure for laminated manufacturing according to claim 1, wherein the cross section of the inlet structure is one of a circular shape, a rectangular shape, a triangular shape and a polygonal shape.
TW107143367A 2018-11-30 2018-11-30 Improved intake structure for laminated manufacturing TWI667123B (en)

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Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2015039732A1 (en) * 2013-09-20 2015-03-26 Oerlikon Surface Solutions Ag, Trübbach Gas flow device for a system for the radiation treatment of substrates
US20180126649A1 (en) * 2016-11-07 2018-05-10 Velo3D, Inc. Gas flow in three-dimensional printing
WO2018086887A1 (en) * 2016-11-11 2018-05-17 SLM Solutions Group AG Apparatus for producing a three-dimensional work piece with improved gas flow
CN208035116U (en) * 2018-02-12 2018-11-02 广州鹏东塑胶制品有限公司 A kind of plasticity machines turbulence structure

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2015039732A1 (en) * 2013-09-20 2015-03-26 Oerlikon Surface Solutions Ag, Trübbach Gas flow device for a system for the radiation treatment of substrates
US20180126649A1 (en) * 2016-11-07 2018-05-10 Velo3D, Inc. Gas flow in three-dimensional printing
WO2018086887A1 (en) * 2016-11-11 2018-05-17 SLM Solutions Group AG Apparatus for producing a three-dimensional work piece with improved gas flow
CN208035116U (en) * 2018-02-12 2018-11-02 广州鹏东塑胶制品有限公司 A kind of plasticity machines turbulence structure

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