TWI660296B - Touch apparatus - Google Patents

Touch apparatus Download PDF

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Publication number
TWI660296B
TWI660296B TW107105341A TW107105341A TWI660296B TW I660296 B TWI660296 B TW I660296B TW 107105341 A TW107105341 A TW 107105341A TW 107105341 A TW107105341 A TW 107105341A TW I660296 B TWI660296 B TW I660296B
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Taiwan
Prior art keywords
wires
sensing electrodes
circuit layer
transparent
display area
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TW107105341A
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Chinese (zh)
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TW201935198A (en
Inventor
李其裕
任慧敏
陳益瑩
黃彥衡
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大陸商業成科技(成都)有限公司
大陸商業成光電(深圳)有限公司
英特盛科技股份有限公司
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    • GPHYSICS
    • G06COMPUTING; CALCULATING OR COUNTING
    • G06FELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/0412Digitisers structurally integrated in a display
    • GPHYSICS
    • G06COMPUTING; CALCULATING OR COUNTING
    • G06FELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G06F3/047Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means using sets of wires, e.g. crossed wires

Abstract

一種觸控裝置包含一基板、複數感測電極、複數第一導線及複數第二導線。基板具有一顯示區及一周邊區,其中周邊區環繞顯示區。感測電極位於顯示區並包含複數第一感測電極與複數第二感測電極。第二感測電極比第一感測電極更靠近周邊區。第一導線位於周邊區,第一導線分別連接部份的第二感測電極,第一導線分別具有較為接近第二感測電極的一第一部以及與第一部相連的一第二部。第二導線位於周邊區,第一部不被第二導線覆蓋,第二部被第二導線覆蓋,第二導線的導電率高於第一導線的導電率。 A touch device includes a substrate, a plurality of sensing electrodes, a plurality of first leads, and a plurality of second leads. The substrate has a display area and a peripheral area, wherein the peripheral area surrounds the display area. The sensing electrode is located in the display area and includes a plurality of first sensing electrodes and a plurality of second sensing electrodes. The second sensing electrode is closer to the peripheral region than the first sensing electrode. The first wire is located in the peripheral area, and the first wire is connected to a part of the second sensing electrode, respectively. The first wire has a first portion closer to the second sensing electrode and a second portion connected to the first portion. The second wire is located in the peripheral area. The first part is not covered by the second wire, and the second part is covered by the second wire. The conductivity of the second wire is higher than that of the first wire.

Description

觸控裝置 Touch device

本揭露有關於觸控技術領域,且特別關於一種觸控裝置。 This disclosure relates to the field of touch technology, and more particularly to a touch device.

觸控顯示技術可以應用於電子螢幕、電腦、手機或是各種穿戴式科技的裝置中。觸控面板具有可視區及非可視區,非可視區圍繞可視區的周圍,透明的觸控感應陣列設置於可視區,以供使用者觸控且操作,而觸控面板的線路則設置在非可視區。 Touch display technology can be applied to electronic screens, computers, mobile phones or various wearable technology devices. The touch panel has a visible area and a non-visible area. The non-visible area surrounds the periphery of the visible area. A transparent touch sensing array is provided in the visible area for the user to touch and operate. The touch panel's wiring is set in the non-visible area. Viewable area.

由於穿戴式科技的設計常以微型化為目標,在產品的設計上會希望邊框能夠越窄越好。然而,窄邊框的觸控顯示裝置容易出現線路外露而影響產品的外觀。 Because the design of wearable technology often aims at miniaturization, in the design of products, it is hoped that the frame can be as narrow as possible. However, the touch display device with a narrow frame is prone to exposed lines and affects the appearance of the product.

本揭露之實施方式提供一種觸控面板,將顯示區外緣的周邊區的導線改為透明導線,如此便可同時滿足窄化邊框以及外觀美觀的設計需求。 The embodiments of the present disclosure provide a touch panel, in which the wires in the peripheral area of the outer edge of the display area are changed to transparent wires, so that the design requirements for narrowing the frame and the appearance can be met at the same time.

於部分實施方式中,一種觸控裝置包含一基板、複數感測電極、複數第一導線及複數第二導線。基板具有一顯 示區及一周邊區,其中周邊區環繞顯示區。感測電極位於顯示區並包含複數第一感測電極與複數第二感測電極。第二感測電極比第一感測電極更靠近周邊區。第一導線位於周邊區,第一導線分別連接部份的第二感測電極,第一導線分別具有較為接近第二感測電極的一第一部以及與第一部相連的一第二部。第二導線位於周邊區,第一部不被第二導線覆蓋,第二部被第二導線覆蓋,第二導線的導電率高於第一導線的導電率。 In some embodiments, a touch device includes a substrate, a plurality of sensing electrodes, a plurality of first leads, and a plurality of second leads. The substrate has a display A display area and a surrounding area, wherein the surrounding area surrounds the display area. The sensing electrode is located in the display area and includes a plurality of first sensing electrodes and a plurality of second sensing electrodes. The second sensing electrode is closer to the peripheral region than the first sensing electrode. The first wire is located in the peripheral area, and the first wire is connected to a part of the second sensing electrode, respectively. The first wire has a first portion closer to the second sensing electrode and a second portion connected to the first portion. The second wire is located in the peripheral area. The first part is not covered by the second wire, and the second part is covered by the second wire. The conductivity of the second wire is higher than that of the first wire.

於部分實施方式中,觸控裝置更包含複數第三導線及複數第四導線。第三導線位於周邊區並分別連接另一部分的第二感測電極。複數第四導線位於周邊區並連接第一感測電極,第四導線的導電率高於第三導線的導電率,第三導線位於第四導線與第二感測電極之間。 In some embodiments, the touch device further includes a plurality of third wires and a plurality of fourth wires. The third wires are located in the peripheral area and connected to the second sensing electrodes of the other parts. The plurality of fourth wires are located in the peripheral area and are connected to the first sensing electrode. The conductivity of the fourth wire is higher than that of the third wire. The third wire is located between the fourth wire and the second sensing electrode.

於部分實施方式中,第三導線的線寬大於第四導線的線寬。 In some embodiments, the line width of the third conductive line is greater than the line width of the fourth conductive line.

於部分實施方式中,第一導線及第三導線的材料相同,第二及第四導線的材料相同。 In some embodiments, the materials of the first and third wires are the same, and the materials of the second and fourth wires are the same.

於部分實施方式中,第一導線及第三導線的材料與第一及第二感測電極的材料相同。 In some embodiments, the materials of the first lead and the third lead are the same as those of the first and second sensing electrodes.

於部分實施方式中,第一導線及第三導線的材料為透明導電材料,第二導線及第四導線的材料為銅。 In some embodiments, the materials of the first and third wires are transparent conductive materials, and the materials of the second and fourth wires are copper.

於部分實施方式中,一種觸控裝置,包含一基板、一處理晶片、複數第一感測電極、複數第二感測電極、透明線路層、第一金屬線路層以及第二金屬線路層。基板具有一顯示區與一周邊區,其中周邊區環繞顯示區。處理晶片設置於基板 的一側。第一感測電極位於基板的顯示區。第二感測電極位於基板的顯示區,其中第一感測電極與處理晶片之間的距離大於或小於第二感測電極與處理晶片之間的距離。透明線路層位於基板的周邊區,其中透明線路層連接第二感測電極。第一金屬線路層位於周邊區,第一金屬線路層連接第一感測電極,其中透明線路層位於第二感測電極及第一金屬線路層之間。第二金屬線路層連接至處理晶片且部分覆蓋透明線路層。 In some embodiments, a touch device includes a substrate, a processing wafer, a plurality of first sensing electrodes, a plurality of second sensing electrodes, a transparent circuit layer, a first metal circuit layer, and a second metal circuit layer. The substrate has a display area and a peripheral area, wherein the peripheral area surrounds the display area. Processing wafer is set on the substrate The side. The first sensing electrode is located in a display area of the substrate. The second sensing electrode is located in a display area of the substrate, wherein a distance between the first sensing electrode and the processing wafer is larger or smaller than a distance between the second sensing electrode and the processing wafer. The transparent circuit layer is located in a peripheral region of the substrate, wherein the transparent circuit layer is connected to the second sensing electrode. The first metal circuit layer is located in the peripheral area. The first metal circuit layer is connected to the first sensing electrode, and the transparent circuit layer is located between the second sensing electrode and the first metal circuit layer. The second metal circuit layer is connected to the processing wafer and partially covers the transparent circuit layer.

於部分實施方式中,透明線路層分別具有較為接近第二感測電極的第一部以及與第一部相連的第二部,且其中透明線路層的第一部不位於第二金屬線路層下方,且其中透明線路層的第二部位於第二金屬線路層下方。 In some embodiments, the transparent circuit layer has a first portion closer to the second sensing electrode and a second portion connected to the first portion, and the first portion of the transparent circuit layer is not located below the second metal circuit layer. And the second part of the transparent circuit layer is located below the second metal circuit layer.

於部分實施方式中,第二金屬線路層不直接接觸第二感測電極。 In some embodiments, the second metal circuit layer does not directly contact the second sensing electrode.

於部分實施方式中,透明線路層具有複數透明導線,且其中透明導線的線寬的範圍為約0.1毫米至約0.2毫米。 In some embodiments, the transparent circuit layer has a plurality of transparent wires, and the line width of the transparent wires ranges from about 0.1 mm to about 0.2 mm.

於上述實施方式中,觸控裝置除了具有金屬導線更具有透明導線。舉例而言,由於透明導線是透明的,因此可免除被使用者看到的問題,如此一來,透明導線能夠於遠離顯示區約0.015毫米處開始設置。同時,由於周邊區上的導線數量是固定的,透過在遠離顯示區約0.4毫米以內設置透明導線,可以減少遠離顯示區約0.4毫米以外區域的導線,如此一來,上述實施方式便可達到窄化邊框的設計需求。 In the above embodiments, the touch device has a transparent wire in addition to a metal wire. For example, since the transparent wire is transparent, the problem of being seen by the user can be avoided. In this way, the transparent wire can be set about 0.015 mm away from the display area. At the same time, since the number of wires in the peripheral area is fixed, by providing transparent wires within about 0.4 mm away from the display area, it is possible to reduce the wires outside the display area by about 0.4 mm, so that the above embodiment can achieve a narrow Design requirements of the border.

以上所述僅用以闡述本發明所欲解決的問題、解決問題的技術手段、及其產生的功效等等,本發明之具體細節 將在下文的實施方式及相關圖式中詳細介紹。 The above is only used to explain the problem to be solved by the present invention, the technical means for solving the problem, and the effects produced by it, etc. The specific details of the present invention It will be described in detail in the following embodiments and related drawings.

10‧‧‧觸控裝置 10‧‧‧ touch device

100‧‧‧基板 100‧‧‧ substrate

102‧‧‧顯示區 102‧‧‧display area

104‧‧‧周邊區 104‧‧‧Peripheral area

106‧‧‧處理晶片 106‧‧‧ Handling Wafers

110‧‧‧第一感測電極 110‧‧‧first sensing electrode

112‧‧‧第二感測電極 112‧‧‧Second sensing electrode

113A‧‧‧中央線路區 113A‧‧‧Central route area

113B‧‧‧周邊線路區 113B‧‧‧ Peripheral circuit area

114‧‧‧第一導線 114‧‧‧first lead

115‧‧‧第二導線 115‧‧‧Second Lead

116‧‧‧第三導線 116‧‧‧Third Lead

118‧‧‧第五導線 118‧‧‧ fifth lead

120‧‧‧第四導線 120‧‧‧ Fourth wire

122‧‧‧接地線 122‧‧‧ ground wire

1141‧‧‧第一部 1141‧‧‧Part I

1143‧‧‧第二部 1143‧‧‧Part II

1161‧‧‧第一部 1161‧‧‧Part 1

1163‧‧‧第二部 1163‧‧‧Part II

S‧‧‧線距 S‧‧‧line spacing

W‧‧‧線寬 W‧‧‧line width

閱讀以下詳細敘述並搭配對應之圖式,可了解本揭露之多個樣態。需留意的是,圖式中的多個特徵並未依照該業界領域之標準作法繪製實際比例。事實上,所述之特徵的尺寸可以任意的增加或減少以利於討論的清晰性。 Read the following detailed description and the corresponding drawings to understand the multiple aspects of this disclosure. It should be noted that many features in the drawings are not drawn according to the standard practice in the industry. In fact, the dimensions of the features can be arbitrarily increased or decreased to facilitate the clarity of the discussion.

第1圖是根據本揭露之部份實施方式的觸控裝置的上視圖;第2圖是第1圖所示的區域V1的放大示意圖;第3圖是第1圖所示的區域V2的放大示意圖;第4圖是沿著第2圖之I-I線的剖面示意圖;以及第5圖是沿著第2圖之II-II線的剖面示意圖。 FIG. 1 is a top view of a touch device according to some embodiments of the present disclosure; FIG. 2 is an enlarged schematic view of a region V1 shown in FIG. 1; and FIG. 3 is an enlarged view of an area V2 shown in FIG. 1. 4 is a schematic cross-sectional view taken along line II of FIG. 2; and FIG. 5 is a schematic cross-sectional view taken along line II-II of FIG. 2.

以下將以圖式及詳細說明清楚說明本揭露之精神,任何所屬技術領域中具有通常知識者在瞭解本揭露之實施例後,當可由本揭露所教示之技術,加以改變及修飾,其並不脫離本揭露之精神與範圍。舉例而言,敘述「第一特徵形成於第二特徵上方或上」,於實施例中將包含第一特徵及第二特徵具有直接接觸;且也將包含第一特徵和第二特徵為非直接接觸,具有額外的特徵形成於第一特徵和第二特徵之間。此外,本揭露在多個範例中將重複使用元件標號以和/或文字。重複的目的在於簡化與釐清,而其本身並不會決定多個實施例以和 /或所討論的配置之間的關係。 The following will clearly illustrate the spirit of this disclosure with drawings and detailed descriptions. Any person with ordinary knowledge in the technical field who understands the embodiments of this disclosure can be changed and modified by the techniques taught in this disclosure. Depart from the spirit and scope of this disclosure. For example, describing "the first feature is formed on or above the second feature", in the embodiment will include the first feature and the second feature having direct contact; and will also include the first feature and the second feature as indirect The contact has additional features formed between the first feature and the second feature. In addition, the disclosure will reuse component numbers and / or text in multiple examples. The purpose of repetition is to simplify and clarify, and does not itself determine multiple embodiments and / Or the relationship between the configurations in question.

此外,方位相對詞彙,如「在…之下」、「下面」、「下」、「上方」或「上」或類似詞彙,在本文中為用來便於描述繪示於圖式中的一個元件或特徵至另外的元件或特徵之關係。方位相對詞彙除了用來描述裝置在圖式中的方位外,其包含裝置於使用或操作下之不同的方位。當裝置被另外設置(旋轉90度或者其他面向的方位),本文所用的方位相對詞彙同樣可以相應地進行解釋。 In addition, relative vocabulary such as "below", "below", "below", "above" or "up" or similar words are used in this article to facilitate the description of an element shown in the drawings Or relationship to another element or feature. In addition to describing the orientation of the device in the drawings, the term relative orientation includes different orientations of the device under use or operation. When the device is additionally set (rotated 90 degrees or other facing orientation), the relative vocabulary of orientation used in this article can also be interpreted accordingly.

第1圖是根據本揭露之部分實施方式之觸控裝置10的上視圖,第2圖是第1圖所示的區域V1的放大示意圖,第3圖是第1圖所示的區域V2的放大示意圖。參照第1圖,觸控裝置10包含基板100及設置於基板100一側的處理晶片106。於部分實施方式中,基板100的材料可為玻璃、聚甲基丙烯酸甲酯(Polymethylmethacrylate,PMMA)、聚碳酸酯樹脂(Polycarbonate,PC)、聚亞醯胺(Polyimide,PI)、藍寶石(sapphire)、矽或其他合適的透明材料。基板100具有顯示區102及環繞顯示區102的周邊區104,顯示區102為透光區,用於顯示圖像,周邊區104為非透光區,遮光層(未繪示)設置於周邊區104,用以遮蔽導線,以避免導線影響觸控裝置10的視覺效果。於部分實施方式中,處理晶片106為積體電路(integrated circuit;IC)。 FIG. 1 is a top view of a touch device 10 according to some embodiments of the present disclosure, FIG. 2 is an enlarged schematic view of a region V1 shown in FIG. 1, and FIG. 3 is an enlarged view of an area V2 shown in FIG. 1. schematic diagram. Referring to FIG. 1, the touch device 10 includes a substrate 100 and a processing wafer 106 disposed on the substrate 100 side. In some embodiments, the material of the substrate 100 may be glass, polymethylmethacrylate (PMMA), polycarbonate (PC), polyimide (PI), or sapphire. , Silicon or other suitable transparent materials. The substrate 100 has a display area 102 and a peripheral area 104 surrounding the display area 102. The display area 102 is a light-transmitting area for displaying an image. The peripheral area 104 is a non-light-transmitting area. A light-shielding layer (not shown) is disposed in the peripheral area. 104, for shielding the wires to prevent the wires from affecting the visual effect of the touch device 10. In some embodiments, the processing chip 106 is an integrated circuit (IC).

參照第2圖及第3圖,基板100包含形成於基板100上的複數第一感測電極110及複數第二感測電極112、中央線路區113A及與位於中央線路區113A相對兩側的周邊線路區 113B。於部分實施方式中,接地線122設置於周邊線路區113B並連接至外部的地線(例如處理晶片106的地線),用以達成靜電防護之功效,接地線122的材料為金屬。第一及第二感測電極110及112位於顯示區102,周邊線路區113B位於周邊區104。第二感測電極112比第一感測電極110更靠近周邊區104,第一感測電極110及第二感測電極112由中央及周邊線路區113A及113B與處理晶片106電性連接。於部分實施方式中,第一及第二感測電極110及112的材料可為氧化銦錫(Indium Tin Oxide;ITO)或其他透明導電材料。 Referring to FIG. 2 and FIG. 3, the substrate 100 includes a plurality of first sensing electrodes 110 and a plurality of second sensing electrodes 112 formed on the substrate 100, a central wiring area 113A, and peripheries opposite to the central wiring area 113A. Circuit area 113B. In some embodiments, the ground line 122 is disposed in the peripheral circuit area 113B and is connected to an external ground line (such as the ground line of the processing chip 106) to achieve the effect of electrostatic protection. The material of the ground line 122 is metal. The first and second sensing electrodes 110 and 112 are located in the display area 102, and the peripheral circuit area 113B is located in the peripheral area 104. The second sensing electrode 112 is closer to the peripheral region 104 than the first sensing electrode 110, and the first sensing electrode 110 and the second sensing electrode 112 are electrically connected to the processing chip 106 through the central and peripheral wiring regions 113A and 113B. In some embodiments, the material of the first and second sensing electrodes 110 and 112 may be Indium Tin Oxide (ITO) or other transparent conductive materials.

中央線路區113A具有第一導線114及緊鄰第一導線114的第二導線115,第一導線114的一端連接第二導線115,且另一端(未繪示)連接第二感測電極112。第二導線115不直接接觸第二感測電極112。於部分實施方式中,第一感測電極110與處理晶片106之間的距離小於第二感測電極112與處理晶片106之間的距離。於其他實施方式中,第一感測電極110與處理晶片106之間的距離大於第二感測電極112與處理晶片106之間的距離。 The central circuit region 113A has a first conductive line 114 and a second conductive line 115 adjacent to the first conductive line 114. One end of the first conductive line 114 is connected to the second conductive line 115, and the other end (not shown) is connected to the second sensing electrode 112. The second conductive line 115 does not directly contact the second sensing electrode 112. In some embodiments, the distance between the first sensing electrode 110 and the processing wafer 106 is smaller than the distance between the second sensing electrode 112 and the processing wafer 106. In other embodiments, the distance between the first sensing electrode 110 and the processing wafer 106 is greater than the distance between the second sensing electrode 112 and the processing wafer 106.

參照第4圖,第4圖為沿著第2圖之I-I線的剖面示意圖,第一導線114分別連接部份的第二感測電極112,第一導線114分別具有較為接近第二感測電極112的第一部1141以及與第一部1141相連的第二部1143,也就是說,第一導線114的第一部1141比第二部1143更靠近顯示區102,第一導線114的第一部1141不位於第二導線115下方,且第一導線114的第二部1143位於第二導線115下方,也就是說,第一導線114的 第一部1141不被第二導線115覆蓋,第二部1143被第二導線115覆蓋,換句話說,第二導線115部分地覆蓋第一導線114,且第二導線115的一端連接處理晶片106。於部分實施方式中,第一導線114的材料與第二導線115的材料不同。於部分實施方式中,第二導線115的導電率高於第一導線114的導電率。 Referring to FIG. 4, which is a schematic cross-sectional view taken along line II of FIG. 2, the first lead wires 114 are respectively connected to the second sensing electrodes 112, and the first lead wires 114 are respectively closer to the second sensing electrodes. The first part 1141 of 112 and the second part 1143 connected to the first part 1141, that is, the first part 1141 of the first wire 114 is closer to the display area 102 than the second part 1143, and the first part of the first wire 114 The portion 1141 is not located below the second conductive line 115, and the second portion 1143 of the first conductive line 114 is located below the second conductive line 115, that is, the The first portion 1141 is not covered by the second lead 115, and the second portion 1143 is covered by the second lead 115. In other words, the second lead 115 partially covers the first lead 114, and one end of the second lead 115 is connected to the processing chip 106 . In some embodiments, the material of the first wire 114 is different from the material of the second wire 115. In some embodiments, the conductivity of the second conductive line 115 is higher than the conductivity of the first conductive line 114.

第三導線116及緊鄰第三導線116的第五導線118位於周邊區104的周邊線路區113B,第三導線116的一端連接第五導線118,且另一端分別連接另一部分的第二感測電極112(見第3圖)。第五導線118不直接接觸第二感測電極112。 The third conductive line 116 and the fifth conductive line 118 adjacent to the third conductive line 116 are located in the peripheral circuit area 113B of the peripheral area 104. One end of the third conductive line 116 is connected to the fifth conductive line 118, and the other end is connected to the second sensing electrode of the other part. 112 (see Figure 3). The fifth lead 118 does not directly contact the second sensing electrode 112.

第三導線116具有第一部1161及第二部1163,參照第5圖,第5圖為沿著第2圖之II-II線的剖面示意圖,第三導線116的第一部1161不位於第五導線118下方,且第三導線116的第二部1163位於第五導線118下方,也就是說,第三導線116的第一部1161不被第五導線118覆蓋,第二部1163被第五導線118覆蓋,換句話說,第五導線118部份地覆蓋第二導線116,第三導線116的第一部1161比第二部1163更靠近顯示區102。於部分實施方式中,第三導線116的材料與第五導線118的材料不同。於部分實施方式中,第五導線118的導電率高於第三導線116的導電率。 The third wire 116 has a first portion 1161 and a second portion 1163. Referring to FIG. 5, FIG. 5 is a schematic cross-sectional view taken along the line II-II in FIG. 2. The first portion 1161 of the third wire 116 is not located in the first portion. Below the fifth wire 118, and the second portion 1163 of the third wire 116 is located below the fifth wire 118, that is, the first portion 1161 of the third wire 116 is not covered by the fifth wire 118, and the second portion 1163 is covered by the fifth The conductive line 118 covers, in other words, the fifth conductive line 118 partially covers the second conductive line 116, and the first portion 1161 of the third conductive line 116 is closer to the display area 102 than the second portion 1163. In some embodiments, the material of the third wire 116 is different from the material of the fifth wire 118. In some embodiments, the conductivity of the fifth conductive line 118 is higher than the conductivity of the third conductive line 116.

傳統技術中,基於公差考量,為了防止使用者看到金屬導線,以及滿足金屬導線與感測電極搭接寬度的需求,須自遠離顯示區102約0.4毫米處開始設置金屬導線,但在本揭露中,除了設置金屬導線外還採用了透明導線。舉例而言,由 於第三導線116是透明的,因此可免除被使用者看到的問題,如此一來,第三導線116可於遠離顯示區102約0.015毫米處開始設置。同時,由於周邊區104上的導線數量是固定的,透過在距離顯示區102約0.4毫米以內的周邊區104上設置第三導線116,可以減少距離顯示區102約0.4毫米以外區域的導線,如此便可達到窄化邊框的設計需求。 In the conventional technology, based on tolerance considerations, in order to prevent users from seeing the metal wires and to meet the requirements of the overlap width of the metal wires and the sensing electrodes, the metal wires must be set from about 0.4 mm away from the display area 102, but in this disclosure In addition to providing metal wires, transparent wires are also used. For example, by Since the third wire 116 is transparent, the problem of being seen by the user can be avoided. In this way, the third wire 116 can be set about 0.015 mm away from the display area 102. At the same time, since the number of wires on the peripheral area 104 is fixed, by setting a third wire 116 on the peripheral area 104 within 0.4 mm from the display area 102, the wires from the area outside the display area 102 by about 0.4 mm can be reduced. Can meet the design requirements of narrow borders.

第四導線120位於周邊區104的周邊線路區113B,第四導線120的一端(未繪示)連接第一感測電極110,且另一端連接處理晶片106。於部分實施方式中,第四導線120比第三導線116及第五導線118更遠離顯示區102,也就是說,第三導線116位於第二感測電極112及第四導線120之間,第五導線118亦位於第二感測電極112及第四導線120之間。於部分實施方式中,第四導線120的長度大於第三導線116的長度及第五導線118的長度的總和。第四導線120的材料與第一及第三導線114及116的材料不同。於部分實施方式中,第四導線120的導電率高於第三導線116的導電率。 The fourth conductive line 120 is located in the peripheral circuit area 113B of the peripheral area 104. One end (not shown) of the fourth conductive line 120 is connected to the first sensing electrode 110, and the other end is connected to the processing chip 106. In some embodiments, the fourth conductive line 120 is farther from the display area 102 than the third conductive line 116 and the fifth conductive line 118. That is, the third conductive line 116 is located between the second sensing electrode 112 and the fourth conductive line 120. The five wires 118 are also located between the second sensing electrode 112 and the fourth wire 120. In some embodiments, the length of the fourth conductive line 120 is greater than the sum of the length of the third conductive line 116 and the length of the fifth conductive line 118. The material of the fourth wire 120 is different from that of the first and third wires 114 and 116. In some embodiments, the electrical conductivity of the fourth conductive line 120 is higher than the electrical conductivity of the third conductive line 116.

於部分實施方式中,第一及第三導線114及116的材料相同,例如氧化銦錫或其他透明導電材料。於部分實施方式中,第一及第三導線114及116的材料與第一及第二感測電極110及112的材料相同,當第一及第二感測電極110及112的材料為氧化銦錫時,第一及第三導線114及116的材料亦為氧化銦錫。 In some embodiments, the materials of the first and third wires 114 and 116 are the same, such as indium tin oxide or other transparent conductive materials. In some embodiments, the materials of the first and third wires 114 and 116 are the same as those of the first and second sensing electrodes 110 and 112. When the materials of the first and second sensing electrodes 110 and 112 are indium oxide In the case of tin, the material of the first and third wires 114 and 116 is also indium tin oxide.

於部分實施方式中,第二、第四及第五導線115、120及118的材料可為銀、銅、鋁、金、鎳或鈦,但本揭露不 以此為限。於部分實施方式中,第二、第四及第五導線115、120及118包含相同材料。第二、第四及第五導線115、120及118可藉由網印方式或塗佈方式形成,但本揭露不以此為限。 In some embodiments, the materials of the second, fourth, and fifth wires 115, 120, and 118 may be silver, copper, aluminum, gold, nickel, or titanium, but this disclosure does not This is the limit. In some embodiments, the second, fourth, and fifth wires 115, 120, and 118 include the same material. The second, fourth, and fifth wires 115, 120, and 118 may be formed by screen printing or coating, but the disclosure is not limited thereto.

參照第3圖,第三導線116各具有一線寬W,線寬W的大小可滿足低通道阻抗。於部分實施方式中,線寬W的範圍為約0.1毫米至約0.2毫米之間。兩相鄰第三導線116之間的距離為線距S,實際運用時,將可依據設備的製程能力來調整線距S,於本實施方式中,線距S為約0.015毫米。第三導線116的數量取決於線寬W及線距S,第三導線116的數量等於0.4/(線寬W(毫米)+0.015),計算結果若有小數點,則採用無條件捨去法,且線寬W為整數。於本實施方式中,第三導線116及連接第三導線116的第五導線118是設置於位於遠離顯示區102約0.4毫米以內的周邊區104上,第四導線120位於遠離顯示區102約0.4毫米以外的周邊區104上,由於周邊區104上的導線數目是固定的,藉由在遠離顯示區102約0.4毫米內的周邊區104上設置第三導線116,可以減少位於遠離顯示區102約0.4毫米以外的周邊區104的第四導線120的數目,因此可達到窄邊框的設計需求。於部分實施方式中,當線寬W等於0.185毫米時,第三導線116的數量為2,也就是說,遠離顯示區102約0.4毫米外的周邊區104的第三導線116的數目可減少2條,而使邊框窄化。於部分實施方式中,第三導線116的線寬大於第四導線120的線寬。 Referring to FIG. 3, the third wires 116 each have a line width W, and the size of the line width W can satisfy a low channel impedance. In some embodiments, the line width W ranges from about 0.1 mm to about 0.2 mm. The distance between two adjacent third wires 116 is the line distance S. In actual use, the line distance S can be adjusted according to the process capability of the device. In this embodiment, the line distance S is about 0.015 mm. The number of the third wires 116 depends on the line width W and the line spacing S. The number of the third wires 116 is equal to 0.4 / (line width W (mm) + 0.015). If there is a decimal point in the calculation result, the unconditional rounding method is used. And the line width W is an integer. In this embodiment, the third conductive line 116 and the fifth conductive line 118 connected to the third conductive line 116 are disposed on the peripheral area 104 located within about 0.4 millimeters away from the display area 102, and the fourth conductive line 120 is located about 0.4 away from the display area 102. On the peripheral area 104 other than millimeters, since the number of wires on the peripheral area 104 is fixed, by arranging the third wire 116 on the peripheral area 104 within 0.4 mm away from the display area 102, it is possible to reduce The number of the fourth wires 120 in the peripheral area 104 beyond 0.4 mm can meet the design requirements of the narrow frame. In some embodiments, when the line width W is equal to 0.185 mm, the number of the third conductive lines 116 is two, that is, the number of the third conductive lines 116 far from the peripheral area 104 about 0.4 mm away from the display area 102 can be reduced by 2 Strips while narrowing the border. In some embodiments, the line width of the third conductive line 116 is greater than the line width of the fourth conductive line 120.

觸控裝置10除了具有金屬導線更具有透明導線。舉例而言,於部分實施方式中,當觸控裝置10的第三導線 116的材料為透明導電材料,可免除被使用者看到的問題,如此一來,第三導線116能夠於遠離顯示區102約0.015毫米處開始設置。同時,由於周邊區104上的導線數量是固定的,透過在遠離顯示區102約0.4毫米以內設置第三導線116,可以減少遠離顯示區約0.4毫米以外區域的第四導線120的數量,如此一來,上述實施方式便可達到窄化邊框的設計需求。 The touch device 10 has transparent wires in addition to metal wires. For example, in some embodiments, when the third wire of the touch device 10 is The material of 116 is a transparent conductive material, which can avoid the problem of being seen by the user. In this way, the third wire 116 can be set at a distance of about 0.015 mm away from the display area 102. At the same time, since the number of wires on the peripheral area 104 is fixed, by disposing the third wire 116 within 0.4 mm away from the display area 102, the number of fourth wires 120 away from the display area by about 0.4 mm can be reduced. Then, the foregoing implementation manner can meet the design requirement of narrowing the frame.

以上概述數個實施方式或實施例的特徵,使所屬領域中具有通常知識者可以從各個方面更加瞭解本揭露。本技術領域中具有通常知識者應可理解,且可輕易地以本揭露為基礎來設計或修飾其他製程及結構,並以此達到相同的目的及/或達到在此介紹的實施方式或實施例相同之優點。本技術領域中具有通常知識者也應了解這些相等的結構並未背離本揭露的揭露精神與範圍。在不背離本揭露的精神與範圍之前提下,可對本揭露進行各種改變、置換或修改。 The features of several implementations or examples are summarized above, so that those with ordinary knowledge in the art can better understand this disclosure from various aspects. Those with ordinary knowledge in the technical field should understand and can easily design or modify other processes and structures based on this disclosure, and thereby achieve the same purpose and / or achieve the implementation methods or embodiments described herein. The same advantages. Those of ordinary skill in the art should also understand that these equivalent structures do not depart from the spirit and scope of the disclosure. Without departing from the spirit and scope of this disclosure, various changes, substitutions or modifications can be made to this disclosure.

Claims (9)

一種觸控裝置,包含:一基板,具有一顯示區及一周邊區,其中該周邊區環繞該顯示區;複數感測電極,位於該顯示區並包含複數第一感測電極與複數第二感測電極,該些第二感測電極比該些第一感測電極更靠近該周邊區;複數第一導線,位於該周邊區,該些第一導線分別連接部份的該些第二感測電極,該些第一導線分別具有較為接近該些第二感測電極的一第一部以及與該第一部相連的一第二部;複數第二導線,位於該周邊區,該些第一部不被該些第二導線覆蓋,該些第二部被該些第二導線覆蓋,該些第二導線的導電率高於該些第一導線的導電率;複數第三導線,位於該周邊區並分別連接另一部分的該些第二感測電極;以及複數第四導線,位於該周邊區並連接該些第一感測電極,該些第四導線的導電率高於該些第三導線的導電率,該些第三導線位於該些第四導線與該些第二感測電極之間。A touch device includes: a substrate having a display area and a peripheral area, wherein the peripheral area surrounds the display area; a plurality of sensing electrodes located in the display area and including a plurality of first sensing electrodes and a plurality of second sensing areas Electrodes, the second sensing electrodes are closer to the peripheral region than the first sensing electrodes; a plurality of first wires are located in the peripheral region, and the first wires are respectively connected to the second sensing electrodes Each of the first wires has a first portion relatively close to the second sensing electrodes and a second portion connected to the first portion; a plurality of second wires are located in the peripheral area, and the first portions Not covered by the second wires, the second portions are covered by the second wires, and the conductivity of the second wires is higher than the conductivity of the first wires; the plurality of third wires are located in the peripheral area And are respectively connected to the second sensing electrodes of another part; and a plurality of fourth wires are located in the peripheral area and connected to the first sensing electrodes, and the conductivity of the fourth wires is higher than that of the third wires Conductivity, the third wire positions The plurality of wires and the fourth second sensing electrode. 如請求項1所述之觸控裝置,其中該些第三導線的線寬大於該些第四導線的線寬。The touch device according to claim 1, wherein a line width of the third conductive lines is greater than a line width of the fourth conductive lines. 如請求項1所述之觸控裝置,其中該些第一導線及該些第三導線的材料相同,該些第二及該些第四導線的材料相同。The touch device according to claim 1, wherein the materials of the first wires and the third wires are the same, and the materials of the second wires and the fourth wires are the same. 如請求項1所述之觸控裝置,其中該些第一導線及該些第三導線的材料與該些第一及該些第二感測電極的材料相同。The touch device according to claim 1, wherein the materials of the first wires and the third wires are the same as the materials of the first and the second sensing electrodes. 如請求項1所述之觸控裝置,其中該些第一導線及該些第三導線的材料為透明導電材料,該些第二導線及該些第四導線的材料為銅。The touch device according to claim 1, wherein the materials of the first wires and the third wires are transparent conductive materials, and the materials of the second wires and the fourth wires are copper. 一種觸控裝置,包含:一基板,具有一顯示區與一周邊區,其中該周邊區環繞該顯示區;一處理晶片,設置於該基板的一側;複數第一感測電極,位於該基板的該顯示區;複數第二感測電極,位於該基板的該顯示區,其中該些第一感測電極與該處理晶片之間的距離大於或小於該些第二感測電極與該處理晶片之間的距離;一透明線路層,位於該基板的該周邊區,其中該透明線路層連接該些第二感測電極;一第一金屬線路層,位於該周邊區,其中該第一金屬線路層連接該些第一感測電極,其中該透明線路層位於該些第二感測電極及該第一金屬線路層之間;以及一第二金屬線路層,連接至該處理晶片且部分覆蓋該透明線路層。A touch device includes: a substrate having a display area and a peripheral area, wherein the peripheral area surrounds the display area; a processing wafer is disposed on one side of the substrate; and a plurality of first sensing electrodes are disposed on the substrate. The display area; a plurality of second sensing electrodes located in the display area of the substrate, wherein a distance between the first sensing electrodes and the processing wafer is larger or smaller than a distance between the second sensing electrodes and the processing wafer Distance; a transparent circuit layer located in the peripheral region of the substrate, wherein the transparent circuit layer is connected to the second sensing electrodes; a first metal circuit layer located in the peripheral region, wherein the first metal circuit layer The first sensing electrodes are connected, wherein the transparent circuit layer is located between the second sensing electrodes and the first metal circuit layer; and a second metal circuit layer is connected to the processing chip and partially covers the transparent layer. Line layer. 如請求項6所述之觸控裝置,其中該透明線路層分別具有較為接近該些第二感測電極的一第一部以及與該第一部相連的一第二部,且其中該透明線路層的該第一部不位於該第二金屬線路層下方,且其中該透明線路層的該第二部位於該第二金屬線路層下方。The touch device according to claim 6, wherein the transparent circuit layer has a first portion relatively close to the second sensing electrodes and a second portion connected to the first portion, and wherein the transparent circuit The first portion of the layer is not located below the second metal circuit layer, and wherein the second portion of the transparent circuit layer is located below the second metal circuit layer. 如請求項6所述之觸控裝置,其中該第二金屬線路層不直接接觸該些第二感測電極。The touch device according to claim 6, wherein the second metal circuit layer does not directly contact the second sensing electrodes. 如請求項6所述之觸控裝置,其中該透明線路層具有複數透明導線,且其中各該些透明導線的線寬的範圍為約0.1毫米至約0.2毫米。The touch device according to claim 6, wherein the transparent circuit layer has a plurality of transparent wires, and a line width of each of the transparent wires ranges from about 0.1 mm to about 0.2 mm.
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