TWI650526B - Measuring apparatus - Google Patents
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- TWI650526B TWI650526B TW106144350A TW106144350A TWI650526B TW I650526 B TWI650526 B TW I650526B TW 106144350 A TW106144350 A TW 106144350A TW 106144350 A TW106144350 A TW 106144350A TW I650526 B TWI650526 B TW I650526B
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Abstract
一種量測裝置,用於測量滑軌之複數待測導軌的表面幾何,包括:複數量測探頭,固定於量測探頭支撐座,量測探頭係根據待測導軌的表面幾何而被裝設於量測探頭支撐座。至少一移動裝置,在待測導軌的截面上平移量測探頭支撐座或待測導軌,使量測探頭相對於待測導軌之間具有相對位移。其中量測探頭之每一者均具有相應座標系,相應座標系彼此不相同,透過標準件將相應座標系校正到相同座標系,再以相同座標系為基準,測量待測導軌的表面幾何。A measuring device for measuring surface geometry of a plurality of rails to be tested, comprising: a multi-quantity probe fixed to the measuring probe support, the measuring probe being installed according to the surface geometry of the rail to be tested Measuring probe support. At least one mobile device shifts the probe support or the rail to be tested on the cross section of the rail to be tested, so that the measuring probe has a relative displacement with respect to the rail to be tested. Each of the measuring probes has a corresponding coordinate system, and the corresponding coordinate systems are different from each other. The corresponding coordinate system is corrected to the same coordinate system through the standard component, and the surface geometry of the test rail to be tested is measured based on the same coordinate system.
Description
本發明有關於一種滑軌的導軌幾何拘束面的形貌量測裝置。The invention relates to a topography measuring device for a geometrically constrained surface of a rail of a slide rail.
滑軌利用其導軌的幾何拘束面,配合滾珠或滾柱,將滑塊的運動方向拘束在固定方向。導軌、滾珠(柱),以及滑塊的滑溝,三者的幾何尺寸與預壓力及整體平順度有關。習知的方法是準備多種尺寸的滾珠(柱),在滑軌組裝後進行事後的摩擦力品質檢測。若上述檢測不符合需求,則重新修整尺寸或替換為其他尺寸的滾珠(柱)配合,重複進行摩擦力檢測至符合需求為止。但這樣增加製造複雜度及增加滾珠(柱)的備料尺寸,增加材料、時間和人力成本。The slide rails use the geometrically constrained surface of the guide rails to match the ball or roller to restrain the direction of movement of the slider in a fixed direction. The rails, balls (columns), and the sliding grooves of the sliders are related to the pre-stress and overall smoothness. A conventional method is to prepare balls (columns) of various sizes, and perform post-friction quality detection after assembly of the slide rails. If the above test does not meet the requirements, re-trim the size or replace it with a ball (column) fit of other sizes, and repeat the friction detection to meet the demand. However, this increases the manufacturing complexity and increases the size of the balls (columns), increasing material, time and labor costs.
其他可能的檢測方法包括:使用三次元量床(coordinate-measuring machine,CMM)、輪廓儀(profilometer)或光學式量測。但三次元量床的體積太大,不適合線上測量。輪廓儀的探針伸縮方向與掃描方向垂直的時候,探針會因側向力而卡住。光學式的測量精確度受切削油、粉塵的影響而降低。Other possible detection methods include the use of a coordinate-measuring machine (CMM), a profilometer or optical metrology. However, the volume of the three-dimensional bed is too large to be suitable for on-line measurement. When the profilometer's probe telescopic direction is perpendicular to the scanning direction, the probe will get stuck due to the lateral force. Optical measurement accuracy is reduced by the influence of cutting oil and dust.
鑒於上述問題,本發明實施例提供一種量測裝置,用於測量滑軌之複數待測導軌的表面幾何,包括:複數量測探頭,固定量測探頭支撐座,量測探頭係根據待測導軌的表面幾何而被裝設於量測探頭支撐座;至少一移動裝置,在待測導軌的截面上平移探頭支撐座或待測導軌,使探頭相對於待測導軌之間具有相對位移;其中量測探頭之每一者均具有相應座標系,相應座標系彼此不相同,透過標準件將相應座標系校正到相同座標系,再以相同座標系為基準,測量待測導軌的表面幾何。In view of the above problems, an embodiment of the present invention provides a measuring device for measuring surface geometry of a plurality of rails to be tested, including: a multi-quantity probe, a fixed-measuring probe support, and a measuring probe according to the rail to be tested. The surface geometry is mounted on the measurement probe support; at least one moving device translates the probe support or the guide rail to be tested on the cross section of the guide rail to be tested, so that the probe has a relative displacement with respect to the guide rail to be tested; Each of the measuring probes has a corresponding coordinate system, and the corresponding coordinate systems are different from each other. The corresponding coordinate system is corrected to the same coordinate system through the standard components, and the surface geometry of the test rail to be tested is measured based on the same coordinate system.
以上關於本發明內容的說明及以下實施方式的說明係用以示範與解釋本發明的原理,並且提供本發明的專利申請範圍更進一步的解釋。The above description of the present invention and the following description of the embodiments are intended to illustrate and explain the principles of the invention, and to provide a further explanation of the scope of the invention.
參考圖1,本發明實施例揭露一種量測裝置10,用於測量滑軌之複數待測導軌30的表面幾何,包括:複數量測探頭10a,固定於探頭支撐座10b;在本實施例中,量測裝置包括兩個量測探頭10a,但並非以此為限。量測探頭10a係根據導軌表面幾何而被裝設於探頭支撐座10b,例如將探頭轉成與導軌的法線方向平行的方向,藉此減少側向力的影響,但不限定法線方向安裝。 Referring to FIG. 1, an embodiment of the present invention discloses a measuring device 10 for measuring the surface geometry of a plurality of rails 30 to be tested, including: a multi-quantity probe 10a fixed to the probe support 10b; in this embodiment The measuring device includes two measuring probes 10a, but not limited thereto. The measuring probe 10a is mounted on the probe supporting base 10b according to the surface geometry of the guide rail, for example, the probe is turned into a direction parallel to the normal direction of the guide rail, thereby reducing the influence of the lateral force, but does not limit the installation in the normal direction. .
在本實施例,量測裝置10包括:至少一移動裝置10c,在待測導軌30的截面上平移量測探頭支撐座10b或待測導軌30,使量測探頭相對於該待測導軌之間具有相對位移。移動裝置10c可被設置用以讓待測導軌30移動,或被設置用於讓量測探頭10a移動。在一較佳實施例中,因滑軌長且重,不容易移動,故移動裝置10c係設置用於讓量測探頭10a移動,如圖5A所示。 In the present embodiment, the measuring device 10 includes: at least one moving device 10c, and shifts the probe support 10b or the rail to be tested 30 on the cross section of the rail 30 to be tested, so that the measuring probe is opposite to the rail to be tested. Has a relative displacement. The mobile device 10c can be configured to move the rails 30 to be tested or to move the metrology probe 10a. In a preferred embodiment, since the slide rail is long and heavy and does not easily move, the mobile device 10c is provided for moving the measurement probe 10a as shown in Fig. 5A.
本實施例之測量原理以圖2A與圖2B說明如下。在本實施例中,探頭10a為接觸式線性位移量規。接觸式線性位移量規可為磁柵、光柵、容柵、或線性差動變壓器(Linear Variable Transformer,LVDT)。在其他實施例中,量測探頭10a可為光學、氣壓或電磁原理之位移量測探頭。量測探頭10a接觸待測導軌表面並沿著待測導軌移動,待測導軌表面的幾何形貌使得量測探頭伸縮,根據量測探頭的伸縮位移的程度量測,可以得知滑軌的表面形貌。複數探頭10a之每一者均具有相應座標系,例如座標系CL或CR,該等相應座標系彼此不相同,須透過標準件20將該等相應座標系全部校正到參考一個相同座標系SL,再以相同座標系SL為基準,測量待測導軌30的表面幾何。參考圖2B,量測裝置10所測得滑軌的形貌軌跡可用模擬圓加以擬合,其中左側模擬圓的圓心和座標分別為R=0.0755和(2.529, 3.3514),右側模擬圓的圓心和座標分別為R=0.0755和(9.1414, 3.261)。藉由模擬圓圓心的距離即可得知滑軌的節圓直徑(pitch circle diameter,PCD)。The measurement principle of this embodiment will be described below with reference to FIGS. 2A and 2B. In the present embodiment, the probe 10a is a contact type linear displacement gauge. The contact linear displacement gauge can be a magnetic grid, a grating, a capacitive grid, or a linear variable transformer (LVDT). In other embodiments, the measurement probe 10a can be an optical, pneumatic or electromagnetic displacement measurement probe. The measuring probe 10a contacts the surface of the rail to be tested and moves along the rail to be tested. The geometric shape of the surface of the rail to be tested makes the measuring probe expand and contract. According to the degree of the telescopic displacement of the measuring probe, the surface of the rail can be known. Morphology. Each of the plurality of probes 10a has a corresponding coordinate system, such as a coordinate system CL or CR, and the respective coordinate systems are different from each other, and all of the corresponding coordinate systems must be corrected to the same coordinate system SL by the standard member 20, The surface geometry of the rail 30 to be tested is measured based on the same coordinate system SL. Referring to FIG. 2B, the morphological trajectory of the slide track measured by the measuring device 10 can be fitted by a simulated circle, wherein the center and coordinates of the left simulated circle are R=0.0755 and (2.529, 3.3514), respectively, and the center of the right simulated circle is The coordinates are R=0.0755 and (9.1414, 3.261). The pitch circle diameter (PCD) of the slide rail can be known by simulating the distance of the center of the circle.
圖3A、圖3B、圖3C與圖3D是本實施例的其他態樣。圖3A和圖3B是本實施例用於測量滾珠型滑軌的示意圖。圖3A顯示量測裝置用於測量具有四個滾珠滑軌(四溝型滑軌),量測裝置包括四個量測探頭,各自垂直待測導軌表面的切面,且移動裝置使得量測探頭能在待側滑軌的截面上作左右或上下相對移動。圖3B顯示量測裝置用於測量具有兩個滾珠滑軌(哥德式軌道滑軌)。量測裝置包括兩個量測探頭;或四個量測探頭,其中兩兩交錯。移動裝置使得量測探頭能在待側滑軌的截面上作左右或上下相對移動。3A, 3B, 3C and 3D are other aspects of the embodiment. 3A and 3B are schematic views of the present embodiment for measuring a ball type slide rail. 3A shows a measuring device for measuring four ball slides (four-groove type slide rails), the measuring device includes four measuring probes, each of which is perpendicular to the cut surface of the rail surface to be tested, and the moving device enables the measuring probe to Move left and right or up and down relative to the section of the side rail to be side. Figure 3B shows the measuring device for measuring with two ball slides (Gothic track slides). The measuring device comprises two measuring probes; or four measuring probes, two or two of which are staggered. The moving device enables the measuring probe to move left and right or up and down relative to the section of the side rail to be side.
圖3C和圖3D是本實施例用於測量滾柱型滑軌的示意圖。圖3C顯示量測裝置用於測量具有兩個滾柱導軌的滑軌,量測裝置包括兩個探頭;或四個探頭,其中兩兩交錯,且移動裝置使得探頭能在待側滑軌的截面上作左右或上下相對移動。圖3D顯示量測裝置用於測量具有四個滾柱滑軌,量測裝置包括四個量測探頭,且移動裝置使得探頭能在待側滑軌的截面上作左右或上下相對移動3C and 3D are schematic views of the present embodiment for measuring a roller type slide rail. Figure 3C shows the measuring device for measuring a slide rail with two roller guides, the measuring device comprising two probes; or four probes, two or two of which are staggered, and the moving device enables the probe to be in the cross section of the side rail to be side Move left and right or up and down relative to each other. Figure 3D shows the measuring device for measuring four roller slides, the measuring device comprises four measuring probes, and the moving device enables the probe to move left and right or up and down on the section of the side rail to be moved.
參考圖4A,利用待測滑軌作為固定治具,可以達到更緊湊的量測結構,本實施例更包括吸附裝置10d,吸附裝置10d為磁力吸附裝置或氣體吸附裝置。參考圖4B,本實施例更包括側邊靠面10e與側邊夾持治具10f。量測裝置以側邊靠面10e靠抵滑軌之一側;側邊夾持治具10f以夾持面10g夾持滑軌之另一側。Referring to FIG. 4A, a more compact measuring structure can be achieved by using the rail to be tested as a fixed jig. The embodiment further includes an adsorption device 10d, which is a magnetic adsorption device or a gas adsorption device. Referring to FIG. 4B, the embodiment further includes a side abutment surface 10e and a side edge clamping fixture 10f. The measuring device abuts one side of the slide rail with the side abutment surface 10e; the side gripping jig 10f holds the other side of the slide rail with the gripping surface 10g.
圖5A顯示本實施例量測裝置的剖面圖。圖5A中顯示量測探頭10a、探頭支撐座10b、移動裝置10c、側邊夾持治具10f與待側導軌30的位置相對關係。本裝置的使用次序可例為:將量測裝置10由上往下放置在滑軌,啟動吸附裝置10d,啟動側邊夾持治具10f、探頭10a伸出,開始量測。圖5B顯示本實施例量測裝置10與待測導軌30的示意圖。Fig. 5A is a cross-sectional view showing the measuring device of the embodiment. The relative positional relationship between the measuring probe 10a, the probe supporting base 10b, the moving device 10c, the side clamping jig 10f and the side rail 30 to be side is shown in FIG. 5A. The order of use of the device can be exemplified by placing the measuring device 10 on the slide rail from top to bottom, starting the adsorption device 10d, starting the side clamping jig 10f, and extending the probe 10a to start measurement. FIG. 5B is a schematic view showing the measuring device 10 and the rail 30 to be tested in the embodiment.
雖然本發明以前述之較佳實施例揭露如上,然其並非用以限定本發明,任何熟習相像技藝者,在不脫離本發明之精神和範圍內,當可作些許之更動與潤飾,因此本發明之專利保護範圍須視本說明書所附之申請專利範圍所界定者為準。While the present invention has been described above in terms of the preferred embodiments thereof, it is not intended to limit the invention, and the invention may be modified and modified without departing from the spirit and scope of the invention. The patent protection scope of the invention is subject to the definition of the scope of the patent application attached to the specification.
10‧‧‧量測裝置10‧‧‧Measurement device
10a‧‧‧量測探頭 10a‧‧‧Measurement probe
10b‧‧‧探頭支撐座 10b‧‧‧ probe support
10c‧‧‧移動裝置 10c‧‧‧Mobile devices
10d‧‧‧吸附裝置 10d‧‧‧Adsorption device
10e‧‧‧側邊靠面 10e‧‧‧ side to side
10f‧‧‧側邊夾持治具 10f‧‧‧Side clamping fixture
10g‧‧‧夾持面 10g‧‧‧ clamping surface
20‧‧‧標準件 20‧‧‧Standard parts
30‧‧‧待測導軌 30‧‧‧ rails to be tested
圖1是本發明實施例揭露之量測裝置的示意圖。 圖2A與圖2B說明本實施例之測量原理。 圖3A與圖3B說明本實施例量測探頭與滾型滑軌之間相對移動的其他態樣。 圖3C與圖3D說明本實施例量測探頭與滾柱型滑軌之間相對移動的其他態樣。 圖4A顯示本實施例的吸附裝置。 圖4B顯示本實施例的側邊靠面、夾持面與側邊夾持治具。 圖5A顯示本實施例量測裝置的剖面圖。 圖5B顯示本實施例量測裝置與滑軌的示意圖。FIG. 1 is a schematic diagram of a measuring device according to an embodiment of the present invention. 2A and 2B illustrate the measurement principle of this embodiment. 3A and 3B illustrate other aspects of the relative movement between the measuring probe and the rolling rail of the present embodiment. 3C and 3D illustrate other aspects of the relative movement between the measuring probe and the roller type slide rail of the present embodiment. Fig. 4A shows the adsorption device of this embodiment. Fig. 4B shows the side abutment, the clamping surface and the side clamping jig of the present embodiment. Fig. 5A is a cross-sectional view showing the measuring device of the embodiment. Fig. 5B is a schematic view showing the measuring device and the slide rail of the embodiment.
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Citations (7)
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TW496956B (en) * | 2000-08-07 | 2002-08-01 | Federal Mogul Friction Product | Measurement of surface wear |
TW523579B (en) * | 2001-03-30 | 2003-03-11 | Nat Inst Of Advanced Ind Scien | Method for evaluating measurement error in coordinate measuring machine and gauge for coordinate measuring machine |
JP2009168475A (en) * | 2008-01-11 | 2009-07-30 | Panasonic Corp | Shape-measuring method |
CN102057269A (en) * | 2008-11-26 | 2011-05-11 | 齐戈股份有限公司 | Scan error correction in low coherence scanning interferometry |
TWI474891B (en) * | 2010-04-02 | 2015-03-01 | Mitsubishi Heavy Ind Ltd | Calibration method of gear measuring device |
WO2017100296A1 (en) * | 2015-12-08 | 2017-06-15 | Electro Scientific Industries, Inc. | Moving sensor coordinate inspection system |
TWI621859B (en) * | 2016-08-02 | 2018-04-21 | Mpi Corp | Measurement system |
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2017
- 2017-12-18 TW TW106144350A patent/TWI650526B/en active
Patent Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
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TW496956B (en) * | 2000-08-07 | 2002-08-01 | Federal Mogul Friction Product | Measurement of surface wear |
TW523579B (en) * | 2001-03-30 | 2003-03-11 | Nat Inst Of Advanced Ind Scien | Method for evaluating measurement error in coordinate measuring machine and gauge for coordinate measuring machine |
JP2009168475A (en) * | 2008-01-11 | 2009-07-30 | Panasonic Corp | Shape-measuring method |
CN102057269A (en) * | 2008-11-26 | 2011-05-11 | 齐戈股份有限公司 | Scan error correction in low coherence scanning interferometry |
TWI474891B (en) * | 2010-04-02 | 2015-03-01 | Mitsubishi Heavy Ind Ltd | Calibration method of gear measuring device |
WO2017100296A1 (en) * | 2015-12-08 | 2017-06-15 | Electro Scientific Industries, Inc. | Moving sensor coordinate inspection system |
TWI621859B (en) * | 2016-08-02 | 2018-04-21 | Mpi Corp | Measurement system |
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