TWI648905B - Standing wave phase shift concentrating device - Google Patents

Standing wave phase shift concentrating device Download PDF

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TWI648905B
TWI648905B TW106140796A TW106140796A TWI648905B TW I648905 B TWI648905 B TW I648905B TW 106140796 A TW106140796 A TW 106140796A TW 106140796 A TW106140796 A TW 106140796A TW I648905 B TWI648905 B TW I648905B
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plane
waveguide
phase shift
standing wave
distance
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TW106140796A
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TW201926787A (en
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陳建璋
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國立虎尾科技大學
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Abstract

一種駐波相移集中裝置,包含一工作腔體、一第一波導管,及一第二波導管,該工作腔體包括一第一平面、一第二平面、一第三平面,及一第四平面,該第一、二、三、四平面圍繞界定出一腔體空間,該第一波導管包括一與該第一平面連接之第一連接口,該第二波導管設置於該第二平面且與該第一波導管交錯於不同高度平面上,其包括一與該第二平面連接之第二連接口,該第一、二波導管所傳送之頻率會產生一波長,及一波峰,該第一、二波導管會駐波相移集中於該腔體空間中形成一疊加該波峰之作用區,且該作用區內的波值能量為大於等於該波峰。 A standing wave phase shift concentrating device comprises a working cavity, a first waveguide, and a second waveguide, the working cavity comprising a first plane, a second plane, a third plane, and a first a fourth plane, the first, second, third, and fourth planes define a cavity space, the first waveguide includes a first connection port connected to the first plane, and the second waveguide is disposed in the second Plane and interlaced with the first waveguide on different height planes, and includes a second connection port connected to the second plane, and the frequency transmitted by the first and second waveguides generates a wavelength and a peak. The first and second waveguides have a phase shift of the standing wave concentrated in the cavity space to form an active region overlapping the peak, and the wave energy in the active region is greater than or equal to the peak.

Description

駐波相移集中裝置 Standing wave phase shift concentrating device

本發明是有關一種集中裝置,特別是指一種駐波相移集中裝置。 The present invention relates to a concentrating device, and more particularly to a standing wave phase shift concentrating device.

目前對物件的加熱乾燥方法分為熱風乾燥法、真空乾燥法及微波乾燥法,其中,熱風乾燥法是將熱風強制吹送至物件上,以蒸發物件的水分,缺點在於物件乾燥速度慢會耗費較多能源,而真空乾燥法是利用腔室減壓使物件內部水分向表面擴散蒸發,惟,真空腔設備價格昂貴且乾燥速度慢,而無法降低乾燥成本。 At present, the heating and drying method for the object is divided into a hot air drying method, a vacuum drying method and a microwave drying method. Among them, the hot air drying method forcibly blows hot air onto the object to evaporate the moisture of the object, and the disadvantage is that the object drying speed is slower. The multi-energy, vacuum drying method uses the chamber decompression to diffuse and evaporate the moisture inside the object to the surface. However, the vacuum chamber equipment is expensive and the drying speed is slow, and the drying cost cannot be reduced.

另外,微波乾燥法的原理是將微波發送至加熱腔中,微波在加熱腔中不斷地反射共振形成駐波,而在駐波的作動下使加熱腔中之物件內的水分子產生劇烈的運動而發熱,以蒸發物件的水分,且由於過程中僅會使含水物件的溫度升高,不會加熱物件附近的空氣,因此,可大幅降低乾燥所需消耗之能量。 In addition, the principle of the microwave drying method is to send microwaves into the heating chamber, and the microwaves continuously reflect the resonance in the heating chamber to form a standing wave, and the standing waves act to cause the water molecules in the heating chamber to undergo vigorous movement. The heat is generated to evaporate the moisture of the object, and since only the temperature of the hydrated article is raised during the process, the air in the vicinity of the object is not heated, so that the energy required for drying can be greatly reduced.

惟,駐波結構的能量分佈並不均勻,其中駐波的節點位置能量幾乎為零,而駐波的波腹位置能量則最高,這樣的差異將造成了物件的加熱區域不均勻,目前 為了避免加熱不均勻的情況,會旋轉欲加熱之物件使駐波之波腹相對於物件的位置持續改變,或者是在加熱腔中設置一攪拌器,使得駐波的位置隨著攪拌的轉動改變,以達物件加熱均勻之目的,但物件旋轉的設計較難實現於連續式或大面積物件的應用。 However, the energy distribution of the standing wave structure is not uniform, in which the energy of the node position of the standing wave is almost zero, and the energy of the antinode of the standing wave is the highest, such a difference will cause the heating area of the object to be uneven. In order to avoid uneven heating, the object to be heated is rotated to continuously change the position of the antinode of the standing wave with respect to the object, or a stirrer is arranged in the heating chamber, so that the position of the standing wave changes with the rotation of the stirring. In order to achieve uniform heating of the object, the design of the object rotation is difficult to achieve in continuous or large-area applications.

上述缺點都顯現習知微波乾燥在作業過程所衍生的種種問題,長久下來,常常導致物件的不良率與成本效率無法提升等缺失,因此,現有技術確實有待提出更佳解決方案之必要性。 All of the above shortcomings show various problems arising from the conventional microwave drying process. In the long run, the defect rate and cost efficiency of the object are often not improved. Therefore, the prior art does not need to propose a better solution.

有鑑於此,本發明之目的,是提供一種駐波相移集中裝置,包含一工作腔體、一第一波導管,及一第二波導管。 In view of the above, an object of the present invention is to provide a standing wave phase shift concentrating device comprising a working cavity, a first waveguide, and a second waveguide.

該工作腔體概呈矩形,其包括一第一平面、一第二平面、一第三平面,及一第四平面,該第一平面與該第二平面對向設置,該第三平面與該第四平面對向設置且位於該第一、二平面間,該第一、二、三、四平面圍繞界定出一腔體空間,該第一波導管設置於該第一平面上,其包括一與該第一平面連接之第一連接口,該第一連接口之中心與該第三平面間具有一第一距離,以及一與該第四平面間之第二距離,該第一距離與該第二距離的比值不小於0.25並小於1。 The working cavity is substantially rectangular, and includes a first plane, a second plane, a third plane, and a fourth plane. The first plane is opposite to the second plane, and the third plane is opposite to the plane The fourth plane is oppositely disposed and located between the first and second planes, the first, second, third, and fourth planes define a cavity space, and the first waveguide is disposed on the first plane, and includes a first connection port connected to the first plane, a first distance between a center of the first connection port and the third plane, and a second distance between the first plane and the fourth plane, the first distance and the first distance The ratio of the second distance is not less than 0.25 and less than 1.

該第二波導管設置於該第二平面上且與該 第一波導管交錯於不同高度平面,其包括一與該第二平面連接之第二連接口,該第二連接口之中心與該第三平面間具有一第三距離,以及一與該第四平面間之第四距離,該第三距離與該第四距離的比值不大於4並大於1,該第一、二波導管所傳送之頻率會產生一波長,及一波峰,該第一、二波導管會駐波相移集中於該腔體空間中形成一疊加該波峰之作用區,且該作用區內的波值能量為大於等於該波峰。 The second waveguide is disposed on the second plane and The first waveguide is staggered in different height planes, and includes a second connection port connected to the second plane, a center of the second connection port and the third plane having a third distance, and a fourth a fourth distance between the planes, the ratio of the third distance to the fourth distance is not greater than 4 and greater than 1, the frequency transmitted by the first and second waveguides generates a wavelength, and a peak, the first and second The waveguide conducts a phase shift of the standing wave concentrated in the cavity space to form an active region overlapping the peak, and the wave energy in the active region is greater than or equal to the peak.

本發明的另一技術手段,是在於上述之腔體空間的長度介於1~11個波長,寬度介於1~5個波長,高度介於1.5~7個波長。 Another technical means of the present invention is that the cavity space has a length of 1 to 11 wavelengths, a width of 1 to 5 wavelengths, and a height of 1.5 to 7 wavelengths.

本發明的又一技術手段,是在於上述之腔體空間定義有一沿該第三平面中心至該第四平面中心延伸的中心線,該第一、二波導管是交錯設置於該中心線上方或下方的3個波長處,以於不同高度平面上。 Another technical means of the present invention is that the cavity space defines a center line extending along a center of the third plane to a center of the fourth plane, and the first and second waveguides are staggered above the center line or The three wavelengths below are on different height planes.

本發明的再一技術手段,是在於上述之作用區位於該中心線,其長度與寬度分別介於1~3個波長,高度為該中心線上方至下方各1個波長。 According to still another aspect of the present invention, the active area is located at the center line, and the length and the width thereof are respectively between 1 and 3 wavelengths, and the height is one wavelength from above the center line to the lower side.

本發明的另一技術手段,是在於上述之第一、二平面與該第三、四平面之比值為該第一、二平面大於等於1。 Another technical means of the present invention is that the ratio of the first and second planes to the third and fourth planes is that the first and second planes are greater than or equal to one.

本發明的又一技術手段,是在於上述之作用區之長度與寬度的比值為長度大於等於1。 Another technical means of the present invention is that the ratio of the length to the width of the active region is greater than or equal to one.

本發明的再一技術手段,是在於上述之第 一波導管之第一連接口概呈矩形,更具有一第一長度與一第一寬度,該第一長度的長度介於該第一波導管所傳送之微波的0.5~1個波長,該第一寬度的長度是小於該第一波導管所傳送之微波的0.5個波長。 A further technical means of the present invention lies in the above The first connecting port of the waveguide is substantially rectangular, and has a first length and a first width. The length of the first length is between 0.5 and 1 wavelength of the microwave transmitted by the first waveguide. The length of a width is less than 0.5 wavelengths of the microwaves transmitted by the first waveguide.

本發明的另一技術手段,是在於上述之第二波導管之第二連接口概呈矩形,更具有一第二長度與一第二寬度,該第二長度的長度介於該第二波導管所傳送之微波的0.5~1個波長,該第二寬度的長度是小於該第二波導管所傳送之微波的0.5個波長。 Another technical means of the present invention is that the second connecting port of the second waveguide is substantially rectangular, and has a second length and a second width, and the length of the second length is between the second waveguide. 0.5 to 1 wavelength of the transmitted microwave, the length of the second width being less than 0.5 wavelength of the microwave transmitted by the second waveguide.

本發明的又一技術手段,是在於上述之第一平面具有一第一開孔,該第二平面具有一對應該第一開孔設置之第二開孔,該第一、二開孔的中心位於該中心線的中點且長度是小於等於5個波長,寬度是小於等於3個波長,該第一、二開孔、該腔體空間與一外部空間相連通,該第一、二開孔可供一傳輸帶通過。 Another technical means of the present invention is that the first plane has a first opening, and the second plane has a pair of second openings that are disposed in the first opening, the centers of the first and second openings Located at a midpoint of the center line and having a length of 5 wavelengths or less and a width of 3 wavelengths or less, the first and second openings, the cavity space is connected to an external space, and the first and second openings are It can be used for a conveyor belt.

本發明的再一技術手段,是在於上述之駐波相移集中裝置更包含一設置於該工作腔體中之壓合單元,用以對該腔體空間中之工作物件進行壓合作業。 According to still another aspect of the present invention, the standing wave phase shift concentrating device further includes a nip unit disposed in the working cavity for performing a press cooperation on the working object in the cavity space.

本發明的另一技術手段,是在於上述之第一、二波導管所傳送之微波頻率介於300MHz~3GHz間。 Another technical means of the present invention is that the microwave frequency transmitted by the first and second waveguides is between 300 MHz and 3 GHz.

本發明的又一技術手段,是在於上述之第一距離等於該第四距離,且該第二距離等於該第三距離。 Another technical means of the present invention is that the first distance is equal to the fourth distance, and the second distance is equal to the third distance.

本發明之有益功效在於,藉由該第一、二 波導管上下左右交錯設置在不同高度平面上,使該第一、二波導管所發出之駐波相移集中於該腔體空間中的作用區,進一步地,透過加熱區域集中在該作用區以及該第一、二開孔的中心位於該中心線的中點,利用該傳輸帶將待處理之工作物件由該外部空間輸送至該第一、二開孔,以進入該腔體空間進行連續式的高效率乾燥製程作業,可達物件加熱集中且均勻之目的。 The beneficial effect of the present invention is that by the first and second The waveguide is staggered up and down and left and right in different height planes, so that the phase shift of the standing waves emitted by the first and second waveguides is concentrated in the active area in the cavity space, and further, the through-heating area is concentrated in the active area and The center of the first and second openings is located at a midpoint of the center line, and the working object to be processed is transported from the external space to the first and second openings by the conveyor belt to enter the cavity space for continuous operation. The high-efficiency dry process operation can achieve the purpose of concentrated and uniform heating of the object.

5‧‧‧工作腔體 5‧‧‧Working chamber

50‧‧‧腔體空間 50‧‧‧ cavity space

501‧‧‧中心線 501‧‧‧ center line

51‧‧‧第一平面 51‧‧‧ first plane

511‧‧‧第一開孔 511‧‧‧ first opening

52‧‧‧第二平面 52‧‧‧ second plane

521‧‧‧第二開孔 521‧‧‧Second opening

53‧‧‧第三平面 53‧‧‧ third plane

54‧‧‧第四平面 54‧‧‧fourth plane

6‧‧‧第一波導管 6‧‧‧First waveguide

61‧‧‧第一連接口 61‧‧‧ first connection

611‧‧‧第一長度 611‧‧‧First length

612‧‧‧第一寬度 612‧‧‧First width

7‧‧‧第二波導管 7‧‧‧Second waveguide

71‧‧‧第二連接口 71‧‧‧second connection

711‧‧‧第二長度 711‧‧‧second length

712‧‧‧第二寬度 712‧‧‧second width

8‧‧‧壓合單元 8‧‧‧Compression unit

a‧‧‧波長 A‧‧‧wavelength

b‧‧‧波峰 b‧‧‧Crest

A‧‧‧作用區 A‧‧‧Action area

B‧‧‧傳輸帶 B‧‧‧Transport belt

D1‧‧‧第一距離 D1‧‧‧First distance

D2‧‧‧第二距離 D2‧‧‧Second distance

D3‧‧‧第三距離 D3‧‧‧ third distance

D4‧‧‧第四距離 D4‧‧‧ fourth distance

X‧‧‧工作物件 X‧‧‧Working objects

圖1是一立體示意圖,說明本發明駐波相移集中裝置的第一較佳實施例;圖2是圖1的C-C剖面圖,說明該第一較佳實施例中一第一波導管的設置態樣;圖3是圖1的C-C剖面圖,說明該第一較佳實施例中一第二波導管的設置態樣;圖4是一立體示意圖,說明該第一較佳實施例中該第一波導管傳送之頻率所產生一波長,及一波峰的態樣;圖5是一示意圖,說明該第一較佳實施例中一中心線上之作用區的電場分佈態樣;及圖6是一剖面示意圖,說明本發明駐波相移集中裝置的第二較佳實施例。 1 is a perspective view showing a first preferred embodiment of the standing wave phase shift concentrating device of the present invention; FIG. 2 is a cross-sectional view taken along line CC of FIG. 1 illustrating the setting of a first waveguide in the first preferred embodiment. Figure 3 is a cross-sectional view of the CC of Figure 1 illustrating a second waveguide in the first preferred embodiment; Figure 4 is a perspective view showing the first preferred embodiment of the first preferred embodiment a wavelength generated by a waveguide transmission, and a peak pattern; FIG. 5 is a schematic diagram showing an electric field distribution pattern of an active region on a center line in the first preferred embodiment; and FIG. 6 is a BRIEF DESCRIPTION OF THE DRAWINGS A second preferred embodiment of the standing wave phase shift concentrating device of the present invention is illustrated.

有關本發明之相關申請專利特色與技術內 容,在以下配合參考圖式之較佳實施例的詳細說明中,將可清楚的呈現。 Relevant patent applications and technologies related to the present invention The detailed description of the preferred embodiments with reference to the drawings will be clearly described below.

參閱圖1、2,及3,為本發明駐波相移集中裝置的第一較佳實施例,其包含一工作腔體5、一第一波導管6,及一第二波導管7。 Referring to Figures 1, 2, and 3, a first preferred embodiment of the standing wave phase shift concentrating device of the present invention includes a working cavity 5, a first waveguide 6, and a second waveguide 7.

該工作腔體5概呈矩形,其包括一第一平面51、一第二平面52、一第三平面53,及一第四平面54,該第一平面51與該第二平面52對向設置,該第三平面53與該第四平面54對向設置且位於該第一、二平面51、52間,該第一、二、三、四平面51、52、53、54圍繞界定出一腔體空間50,且該腔體空間50定義有一沿該第三平面53的中心至該第四平面54的中心延伸的中心線501。 The working cavity 5 has a rectangular shape and includes a first plane 51 , a second plane 52 , a third plane 53 , and a fourth plane 54 . The first plane 51 is opposite to the second plane 52 . The third plane 53 is disposed opposite to the fourth plane 54 and located between the first and second planes 51, 52. The first, second, third, and fourth planes 51, 52, 53, 54 define a cavity. The body space 50 defines a centerline 501 extending along the center of the third plane 53 to the center of the fourth plane 54.

在該第一較佳實施例中,該腔體空間50的長度介於1~11個波長,寬度介於1~5個波長,高度介於1.5~7個波長,其中,該第一、二平面51、52與該第三、四平面53、54之比值為該第一、二平面51、52大於等於1。 In the first preferred embodiment, the cavity space 50 has a length of 1 to 11 wavelengths, a width of 1 to 5 wavelengths, and a height of 1.5 to 7 wavelengths, wherein the first and second wavelengths are The ratio of the planes 51, 52 to the third and fourth planes 53, 54 is greater than or equal to 1 for the first and second planes 51, 52.

進一步地,該第一平面51具有一第一開孔511,該第二平面52具有一對應該第一開孔511設置之第二開孔521,該第一、二開孔511、521的中心位於該中心線501的中點且長度是小於等於5個波長,寬度則是小等於3個波長,該第一、二開孔511、521、該腔體空間50與一外部空間相連通,藉此,該第一、二開孔511、521 可供一傳輸帶B通過,以使該工作腔體5成為一連續式的作業空間設計。 Further, the first plane 51 has a first opening 511, and the second plane 52 has a pair of second openings 521 disposed in the first opening 511, and the centers of the first and second openings 511 and 521 Located at a midpoint of the center line 501 and having a length of 5 wavelengths or less, and a width equal to 3 wavelengths, the first and second openings 511 and 521 and the cavity space 50 are connected to an external space. Thus, the first and second openings 511, 521 A conveyor belt B can be passed through to make the working chamber 5 a continuous working space design.

透過該傳輸帶B將待處理之物件由該外部空間輸送至該腔體空間50中進行微波乾燥,以進行連續式之高效率乾燥製程作業。 The object to be processed is transported from the external space to the cavity space 50 through the conveyor belt B for microwave drying to perform a continuous high-efficiency drying process.

該第一波導管6設置於該第一平面51上,較佳地,該第一波導管6是設置於該中心線501上方或下方的3個波長處,其包括一與該第一平面51連接之第一連接口61,該第一連接口61之中心與該第三平面53間具有一第一距離D1,以及一與該第四平面54間之第二距離D2,該第一距離D1與該第二距離D2的比值不小於0.25並小於1,在該第一較佳實施例中,該第一距離D1與該第二距離D2的比值為0.25,而該第一波導管6所傳送之微波頻率介於300MHz~3GHz間,於此圖式並未繪出用以產生微波之磁控管。 The first waveguide 6 is disposed on the first plane 51. Preferably, the first waveguide 6 is disposed at three wavelengths above or below the center line 501, and includes a first plane 51. a first connecting port 61, a first distance D1 between the center of the first connecting port 61 and the third plane 53, and a second distance D2 between the center and the fourth plane 54. The first distance D1 The ratio of the second distance D2 is not less than 0.25 and less than 1. In the first preferred embodiment, the ratio of the first distance D1 to the second distance D2 is 0.25, and the first waveguide 6 transmits The microwave frequency is between 300 MHz and 3 GHz, and the magnetron for generating microwaves is not depicted in this figure.

此外,該第一波導管6之第一連接口61概呈矩形,該第一連接口61可將該第一波導管6所發出之微波傳導至該腔體空間50,更具有一第一長度611與一第一寬度612,該第一長度611的長度介於該第一波導管6所傳送之微波的0.5~1個波長,該第一寬度612的長度是小於該第一波導管6所傳送之微波的0.5個波長,該第一連接口61供該第一波導管6之微波傳導。 In addition, the first connecting port 61 of the first waveguide 6 is substantially rectangular, and the first connecting port 61 can conduct the microwave emitted by the first waveguide 6 to the cavity space 50, and has a first length. 611 and a first width 612, the length of the first length 611 is between 0.5 and 1 wavelength of the microwave transmitted by the first waveguide 6, the length of the first width 612 is smaller than the length of the first waveguide 6 The first connection port 61 is for the microwave conduction of the first waveguide 6 at 0.5 wavelengths of the transmitted microwave.

該第二波導管7設置於該第二平面52上且 與該第一波導管6交錯於不同高度平面,較佳地,該第二波導管7是與該第一波導管6交錯設置於該中心線501上方或下方的3個波長處,以於不同高度平面上,其包括一與該第二平面52連接之第二連接口71,該第二連接口71之中心與該第三平面53間具有一第三距離D3,以及一與該第四平面54間之第四距離D4,該第三距離D3與該第四距離D4的比值不大於4並大於1,在該第一較佳實施例中,該第三距離D3與該第四距離D4的比值為4,而該第二波導管7所傳送之微波頻率介於300MHz~3GHz間,於此圖式並未繪出用以產生微波之磁控管。 The second waveguide 7 is disposed on the second plane 52 and And the first waveguide 6 is staggered at different height planes. Preferably, the second waveguide 7 is disposed at three wavelengths above or below the center line 501 with the first waveguide 6 to be different. a second connecting port 71 connected to the second plane 52, the center of the second connecting port 71 and the third plane 53 having a third distance D3, and a fourth plane a fourth distance D4 of the 54th, the ratio of the third distance D3 to the fourth distance D4 is not more than 4 and greater than 1, in the first preferred embodiment, the third distance D3 and the fourth distance D4 The ratio is 4, and the microwave frequency transmitted by the second waveguide 7 is between 300 MHz and 3 GHz. The figure does not depict a magnetron for generating microwaves.

於此,該第一、二波導管6、7所傳送之微波頻率在2.45GHz波長約為12公分,頻率在980MHz波長約為29公分,頻率在675MHz波長約為44公分。 Here, the first and second waveguides 6, 7 transmit a microwave frequency of about 12 cm at a wavelength of 2.45 GHz, a frequency of about 29 cm at a wavelength of 980 MHz, and a wavelength of about 44 cm at a wavelength of 675 MHz.

透過該第一、二波導管6、7不對稱之設置,可防止該第一、二波導管6、7互相干擾而影響其使用壽命。除此之外,該第一距離D1等於該第四距離D4,且該第二距離D2等於該第三距離D3,可使得該腔體空間50中的能量分佈均勻。 Through the asymmetric arrangement of the first and second waveguides 6, 7, the first and second waveguides 6, 7 can be prevented from interfering with each other and affecting the service life thereof. In addition to this, the first distance D1 is equal to the fourth distance D4, and the second distance D2 is equal to the third distance D3, so that the energy distribution in the cavity space 50 can be made uniform.

進一步地,該第二波導管7之第二連接口71概呈矩形,該第二連接口71可將該第二波導管7所發出之微波傳導至該腔體空間50,更具有一第二長度711與一第二寬度712,該第二長度711的長度介於該第二波導管7所傳送之微波的0.5~1個波長,該第二寬度712的長 度是小於該第二波導管7所傳送之微波的0.5個波長,該第二連接口71供該第二波導管7之微波傳導。 Further, the second connecting port 71 of the second waveguide 7 is substantially rectangular, and the second connecting port 71 can conduct the microwave emitted by the second waveguide 7 to the cavity space 50, and further has a second The length 711 is a second width 712, and the length of the second length 711 is between 0.5 and 1 wavelength of the microwave transmitted by the second waveguide 7, and the length of the second width 712 is long. The degree is less than 0.5 wavelengths of the microwaves transmitted by the second waveguide 7, and the second connection port 71 is for microwave conduction of the second waveguide 7.

再請參閱圖4、5,實際實施時,該第一、二波導管6、7所傳送之頻率會產生一波長a,及一波峰b,該第一、二波導管6、7會駐波相移集中於該腔體空間50中形成一疊加該波峰b之作用區A,且該作用區A內的波值能量為大於等於該波峰b。 Referring to FIG. 4 and FIG. 5, in actual implementation, the frequencies transmitted by the first and second waveguides 6 and 7 generate a wavelength a and a peak b, and the first and second waveguides 6 and 7 will form a standing wave. The phase shift is concentrated in the cavity space 50 to form an active region A superimposing the peak b, and the wave energy in the active region A is greater than or equal to the peak b.

較佳地,該作用區A位於該中心線501,其長度與寬度分別介於1~3個波長,高度為該中心線501上方至下方各1個波長距離,於此,該作用區A之長度與寬度的比值為長度大於等於1。 Preferably, the active area A is located at the center line 501, and the length and the width thereof are respectively between 1 and 3 wavelengths, and the height is one wavelength distance from the top to the bottom of the center line 501. Here, the active area A is The ratio of length to width is greater than or equal to 1.

配合參閱附件1、2,為不同高度之作用區A的電場分佈圖,由電場圖可以看到該腔體空間50中的電場分佈集中於該作用區A,並且無明顯突出的能量分佈,可使得物件被均勻的加熱及乾燥。 Referring to Annexes 1 and 2, the electric field distribution diagram of the action area A of different heights can be seen from the electric field diagram. The electric field distribution in the cavity space 50 is concentrated in the active area A, and there is no obvious outstanding energy distribution. The article is uniformly heated and dried.

藉由該第一、二波導管6、7於該第一、二平面51、52之上下左右交錯在不同高度平面設計,將該第一、二波導管6、7所發出之駐波相移集中於該腔體空間50中的作用區A,以使加熱區域集中在高度為該中心線501上方至下方各1個波長距離,及長度與寬度介於1~3個波長距離的作用區A中,進一步地,透過加熱區域集中在該作用區A以及該第一、二開孔511、521的中心位於該中心線的中點,利用該傳輸帶B將待處理之物件由該外 部空間輸送至該第一、二開孔511、521,以進入該腔體空間50中進行連續式之高效率乾燥製程作業,以達該物件加熱集中且均勻之目的。 The first and second waveguides 6, 7 are staggered at different heights on the first and second planes 51, 52, and the standing waves emitted by the first and second waveguides 6 and 7 are phase-shifted. Concentrating on the active area A in the cavity space 50, so that the heating area is concentrated on an active area A having a height ranging from 1 to 3 wavelengths above and below the center line 501, and a length and a width of 1 to 3 wavelengths. Further, the center of the active area A and the centers of the first and second openings 511 and 521 are located at the midpoint of the center line, and the object to be processed is used by the belt B. The space is transported to the first and second openings 511 and 521 to enter the cavity space 50 for continuous high-efficiency drying process to achieve the purpose of heating and concentrating the object.

參閱圖6,為本發明駐波相移集中裝置之第二較佳實施例,該第二較佳實施例與該第一較佳實施例大致相同,相同之處於此不再贅述,不同之處在於,該駐波相移集中裝置更包含一壓合單元8。 Referring to FIG. 6, a second preferred embodiment of the standing wave phase shift concentrating device of the present invention is substantially the same as the first preferred embodiment, and the same points are not described herein again. The standing wave phase shift concentrating device further comprises a pressing unit 8.

該壓合單元8設置於該工作腔體50中,用以對該腔體空間50中之工作物件X進行壓合作業。在該第二實施例中,透過於該工作腔體50中設置該壓合單元8,可作為製鞋業之鞋面與鞋底結合的壓合作業使用,實際實施時,本發明亦可應用於紙業、紡織業、玻璃等產業,端視使用需求,不應以此所揭露者為限。 The pressing unit 8 is disposed in the working cavity 50 for performing press cooperation on the working object X in the cavity space 50. In the second embodiment, the pressing unit 8 is disposed in the working cavity 50, and can be used as a press cooperative combination of the upper and the sole of the footwear industry. In actual implementation, the present invention can also be applied to The paper industry, textile industry, glass and other industries, depending on the needs of use, should not be limited to those exposed.

綜上所述,本發明駐波相移集中裝置,藉以該工作腔體5、該第一波導管6,及該第二波導管7間相互設置,將該第一、二波導管6、7上下左右交錯設置在不同高度平面,使該第一、二波導管6、7所發出之駐波相移集中於該腔體空間50中的作用區A,進一步地,透過加熱區域集中在該作用區A以及該第一、二開孔511、521的中心位於該中心線的中點,利用該傳輸帶B將待處理之工作物件X由該外部空間輸送至該第一、二開孔511、521,以進入該腔體空間50中進行連續式之高效率乾燥製程作業,可使該工作物件X加熱集中且均勻,故確實可以達成 本發明之目的。 In summary, the standing wave phase shift concentrating device of the present invention, wherein the working cavity 5, the first waveguide 6, and the second waveguide 7 are mutually arranged, the first and second waveguides 6 and 7 are arranged. The upper and lower sides are alternately arranged at different height planes, so that the phase shifts of the standing waves emitted by the first and second waveguides 6 and 7 are concentrated in the active area A in the cavity space 50, and further, the through-heating area is concentrated in the action. The center of the area A and the first and second openings 511, 521 are located at the midpoint of the center line, and the working object X to be processed is transported from the external space to the first and second openings 511 by the conveyor belt B. 521, in order to enter the cavity space 50 for continuous high-efficiency drying process, the working object X can be heated and concentrated, so it can be achieved The object of the invention.

惟以上所述者,僅為本發明之較佳實施例而已,當不能以此限定本發明實施之範圍,即大凡依本發明申請專利範圍及發明說明內容所作之簡單的等效變化與修飾,皆仍屬本發明專利涵蓋之範圍內。 The above is only the preferred embodiment of the present invention, and the scope of the invention is not limited thereto, that is, the simple equivalent changes and modifications made by the scope of the invention and the description of the invention are All remain within the scope of the invention patent.

附件1:為位於該中心線上之作用區的電場分佈態樣示意圖。 Annex 1: Schematic diagram of the electric field distribution pattern of the active area on the center line.

附件2:為不同高度之作用區的電場分佈態樣示意圖。 Annex 2: Schematic diagram of the electric field distribution pattern of the action zone at different heights.

Claims (12)

一種駐波相移集中裝置,包含:一概呈矩形之工作腔體,其包括一第一平面、一第二平面、一第三平面,及一第四平面,該第一平面與該第二平面對向設置,該第三平面與該第四平面對向設置且位於該第一、二平面間,該第一、二、三、四平面圍繞界定出一腔體空間;一設置於該第一平面上之第一波導管,其包括一與該第一平面連接之第一連接口,該第一連接口之中心與該第三平面間具有一第一距離,以及一與該第四平面間之第二距離,該第一距離與該第二距離的比值不小於0.25並小於1;及一設置於該第二平面上且與該第一波導管交錯於不同高度平面之第二波導管,其包括一與該第二平面連接之第二連接口,該第二連接口之中心與該第三平面間具有一第三距離,以及一與該第四平面間之第四距離,該第三距離與該第四距離的比值不大於4並大於1;該第一、二波導管所傳送之頻率會產生一波長,及一波峰,該第一、二波導管會駐波相移集中於該腔體空間中形成一疊加該波峰之作用區,且該作用區內的波值能量為大於等於該波峰。 A standing wave phase shift concentrating device comprises: a substantially rectangular working cavity, comprising a first plane, a second plane, a third plane, and a fourth plane, the first plane and the second plane Oppositely disposed, the third plane is disposed opposite to the fourth plane and located between the first and second planes, wherein the first, second, third, and fourth planes define a cavity space; a first waveguide on a plane, comprising a first connection port connected to the first plane, a first distance between a center of the first connection port and the third plane, and a fourth plane a second distance between the first distance and the second distance is not less than 0.25 and less than 1; and a second waveguide disposed on the second plane and interlaced with the first waveguide at different height planes The second connecting port is connected to the second plane, the third connecting port has a third distance between the center and the third plane, and a fourth distance from the fourth plane. The ratio of the three distances to the fourth distance is no more than 4 and greater than 1; The frequency transmitted by the first and second waveguides generates a wavelength and a peak, and the first and second waveguides phase shift the standing wave in the cavity space to form an active region overlapping the peak, and the action The wave energy in the zone is greater than or equal to the peak. 依據申請專利範圍第1項所述之駐波相移集中裝置,其中,該腔體空間的長度介於1~11個波長,寬度介於1~5 個波長,高度介於1.5~7個波長。 The standing wave phase shift concentrating device according to claim 1, wherein the cavity space has a length of 1 to 11 wavelengths and a width of 1 to 5 Wavelength, height between 1.5 and 7 wavelengths. 依據申請專利範圍第2項所述之駐波相移集中裝置,其中,該腔體空間定義有一沿該第三平面中心至該第四平面中心延伸的中心線,該第一、二波導管是交錯設置於該中心線上方或下方的3個波長處,以於不同高度平面上。 The standing wave phase shift concentrating device according to claim 2, wherein the cavity space defines a center line extending from a center of the third plane to a center of the fourth plane, the first and second waveguides are Interleaved at three wavelengths above or below the centerline for different height planes. 依據申請專利範圍第3項所述之駐波相移集中裝置,其中,該作用區位於該中心線,其長度與寬度分別介於1~3個波長,高度為該中心線上方至下方各1個波長。 The standing wave phase shift concentrating device according to claim 3, wherein the active region is located at the center line, and the length and the width thereof are respectively between 1 and 3 wavelengths, and the height is 1 above the center line to the lower side. Wavelengths. 依據申請專利範圍第4項所述之駐波相移集中裝置,其中,該第一、二平面與該第三、四平面之比值為該第一、二平面大於等於1。 The standing wave phase shift concentrating device according to claim 4, wherein the ratio of the first and second planes to the third and fourth planes is greater than or equal to 1 for the first and second planes. 依據申請專利範圍第5項所述之駐波相移集中裝置,其中,該作用區之長度與寬度的比值為長度大於等於1。 The standing wave phase shift concentrating device according to claim 5, wherein the ratio of the length to the width of the active region is greater than or equal to 1. 依據申請專利範圍第6項所述之駐波相移集中裝置,其中,該第一波導管之第一連接口概呈矩形,更具有一第一長度與一第一寬度,該第一長度的長度介於該第一波導管所傳送之微波的0.5~1個波長,該第一寬度的長度是小於該第一波導管所傳送之微波的0.5個波長。 The standing wave phase shift concentrating device according to the sixth aspect of the invention, wherein the first connecting port of the first waveguide is substantially rectangular, and further has a first length and a first width, the first length The length is between 0.5 and 1 wavelength of the microwave transmitted by the first waveguide, and the length of the first width is less than 0.5 wavelength of the microwave transmitted by the first waveguide. 依據申請專利範圍第7項所述之駐波相移集中裝置,其中,該第二波導管之第二連接口概呈矩形,更具有一第二長度與一第二寬度,該第二長度的長度介於該第二波導管所傳送之微波的0.5~1個波長,該第二寬度的長度 是小於該第二波導管所傳送之微波的0.5個波長。 The standing wave phase shift concentrating device according to the seventh aspect of the invention, wherein the second connecting port of the second waveguide is substantially rectangular, and further has a second length and a second width, the second length The length is between 0.5 and 1 wavelength of the microwave transmitted by the second waveguide, and the length of the second width It is less than 0.5 wavelengths of the microwaves transmitted by the second waveguide. 依據申請專利範圍第8項所述之駐波相移集中裝置,其中,該第一平面具有一第一開孔,該第二平面具有一對應該第一開孔設置之第二開孔,該第一、二開孔的中心位於該中心線的中點且長度是小於等於5個波長,寬度是小於等於3個波長,該第一、二開孔、該腔體空間與一外部空間相連通,該第一、二開孔可供一傳輸帶通過。 The standing wave phase shift concentrating device according to claim 8, wherein the first plane has a first opening, and the second plane has a pair of second openings that should be disposed in the first opening, The centers of the first and second openings are located at a midpoint of the center line and have a length of 5 wavelengths or less, a width of 3 wavelengths or less, and the first and second openings and the cavity space are connected to an external space. The first and second openings are for passage by a conveyor belt. 依據申請專利範圍第9項所述之駐波相移集中裝置,更包含一設置於該工作腔體中之壓合單元,用以對該腔體空間中之工作物件進行壓合作業。 The standing wave phase shift concentrating device according to claim 9 further includes a nip unit disposed in the working cavity for performing press cooperation on the working object in the cavity space. 依據申請專利範圍第10項所述之駐波相移集中裝置,其中,該第一、二波導管所傳送之微波頻率介於300MHz~3GHz間。 The standing wave phase shift concentrating device according to claim 10, wherein the first and second waveguides transmit microwave frequencies between 300 MHz and 3 GHz. 依據申請專利範圍第11項所述之駐波相移集中裝置,其中,該第一距離等於該第四距離,且該第二距離等於該第三距離。 The standing wave phase shift concentrating device according to claim 11, wherein the first distance is equal to the fourth distance, and the second distance is equal to the third distance.
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CN113124649B (en) * 2021-03-31 2022-09-23 北京印刷学院 Control method and device for microwave transmitting array in microwave drying system

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