TWI648101B - Fluid purification device - Google Patents

Fluid purification device Download PDF

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TWI648101B
TWI648101B TW106107329A TW106107329A TWI648101B TW I648101 B TWI648101 B TW I648101B TW 106107329 A TW106107329 A TW 106107329A TW 106107329 A TW106107329 A TW 106107329A TW I648101 B TWI648101 B TW I648101B
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fluid
purification device
ring wall
fluid purification
oxide
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TW201832827A (en
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李大青
陳翠敏
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青淨光能科技有限公司
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Abstract

一種流體淨化裝置,包含一第一管狀腔體,其呈中空狀並具有一中空部,環繞中空部則係為一內環壁與一外環壁所構成之供流空間,供流空間具有一流體輸入口以及一流體輸出口,一導流結構設置於內環壁與外環壁之間,用以導引一流體自流體輸入口至流體輸出口為單一流向,其中,導流結構係由一含有泡沫狀氣孔之金屬材質所組成,且導流結構穿設有一裝著孔,用以裝設至少一紫外線燈具;複數個鍍有光觸媒之透明基材沿著導流結構充填於供流空間內。 A fluid purification device comprises a first tubular cavity which is hollow and has a hollow portion. The surrounding portion is a supply space formed by an inner ring wall and an outer ring wall, and the flow space has a flow space. a fluid input port and a fluid output port, a flow guiding structure is disposed between the inner ring wall and the outer ring wall for guiding a fluid from the fluid input port to the fluid output port in a single flow direction, wherein the flow guiding structure is a metal material containing foamy pores, and the flow guiding structure is provided with a hole for mounting at least one ultraviolet lamp; a plurality of transparent substrates coated with photocatalyst are filled along the flow guiding structure in the flow space Inside.

Description

流體淨化裝置  Fluid purification device  

一種流體淨化裝置,尤其涉及一種在有限的空間內提高光觸媒比表面積與延長流體滯留時間的一種流體淨化裝置。 A fluid purification device, and more particularly to a fluid purification device for increasing the specific surface area of a photocatalyst and prolonging the residence time of a fluid in a limited space.

近年來,空氣汚染的議題備受重視,由於其對人類和生態環境有極大的負面影響。而造成空氣汚染的物質可以是固態顆粒、液態液滴、或是氣體,有天然造成的如火山噴發的菸灰,也有藉由人類活動而產生的汚染物,如汽機車排放廢氣中的一氧化碳或硫氧化物,或工廠燃燒排放的氣體等等。 In recent years, the issue of air pollution has received much attention because of its enormous negative impact on humans and the ecological environment. The substances causing air pollution may be solid particles, liquid droplets, or gases, naturally occurring soots such as volcanic eruptions, and pollutants generated by human activities, such as carbon monoxide or sulfur in exhaust gas from steam locomotives. Oxide, or gas emitted from the combustion of the factory, etc.

藉由人類活動產生的主要汙染物包括有: The main pollutants produced by human activities include:

一、硫氧化物(SOx):通常是二氧化硫,化學公式為S02。SO2由火山和其它工業過程產生。煤和石油常常含有硫,它們在燃燒時會產SO2,SO2通常在受到NO2等的催化進一步氧化,形成H2SO4,即酸雨。 1. Sulfur oxide (SOx): usually sulfur dioxide, the chemical formula is S02. SO2 is produced by volcanoes and other industrial processes. Coal and oil often contain sulfur, which produces SO2 when burned. SO2 is usually further oxidized by the oxidation of NO2 or the like to form H 2 SO 4 , that is, acid rain.

二、氫氧化物(NOx):氮氧化物,特別是高溫燃燒所產生的二氧化氮,也可以通過閃電產生。它們會形成棕色煙霧或汚染物,籠罩城市,二氧化氮是一種化學物質,公式為NO2,為最著名的空氣汚染物,這種棕紅色的氣體具有十分刺鼻的苦澀氣味。 2. Hydroxide (NOx): Nitrogen oxides, especially those produced by high-temperature combustion, can also be produced by lightning. They form brown smoke or pollutants that envelope the city. Nitrogen dioxide is a chemical with the formula NO2, the most famous air pollutant. This brown-red gas has a very pungent bitter smell.

三、一氧化碳(CO):CO是一種無色、無味、無刺激的有毒氣體。是由不完全燃燒所產生的,如天然氣、煤或木頭等,汽車或機車 排放的尾氣是一氧化碳的主要來源。 3. Carbon monoxide (CO): CO is a colorless, odorless, non-irritating toxic gas. It is produced by incomplete combustion, such as natural gas, coal or wood. The exhaust gas emitted by cars or locomotives is the main source of carbon monoxide.

四、揮發性有機物:揮發性有機汚染物是常見的汚染物。它們可能是甲烷(CH4)或是非甲烷(NMVOCs)。甲烷是極其強大的溫室氣體,導致全球變暖。其它揮發性碳氫化合有機物也是重要的溫室氣體,因為它們會產生臭氧,延長大氣中甲烷的壽命,影響則依地區空氣品質的不同而不同,芳香非甲烷苯類、甲苯、二甲苯則有致癌嫌疑,長期接觸可能會導致白血病。 4. Volatile Organic Compounds: Volatile organic pollutants are common pollutants. They may be methane (CH4) or non-methane (NMVOCs). Methane is an extremely powerful greenhouse gas that causes global warming. Other volatile hydrocarbon organics are also important greenhouse gases because they produce ozone, prolong the life of methane in the atmosphere, and the effects vary depending on the air quality of the region. Aromatic non-methane benzene, toluene, and xylene are carcinogenic. Suspect, long-term exposure may lead to leukemia.

五、有毒金屬:如鉛和汞,特別是它們的合成物。 5. Toxic metals: such as lead and mercury, especially their composites.

六、氯氟烴(CFCs):能破壞臭氧層;產生這一氣體的物質目前已經被禁用,這些氣體可以從空調、冰箱、噴霧劑等散佈,氯氟烴進入空氣後升至平流層,在此它們與其它氣體反應,破壞臭氧層,使得有害的紫外線到達地球表面,能導致皮膚癌、眼疾甚至傷害植物。 6. Chlorofluorocarbons (CFCs): can destroy the ozone layer; the substances that produce this gas have been banned. These gases can be dispersed from air conditioners, refrigerators, sprays, etc., and chlorofluorocarbons enter the air and rise to the stratosphere. They react with other gases, destroying the ozone layer, causing harmful ultraviolet rays to reach the surface of the earth, causing skin cancer, eye diseases and even damage to plants.

七、自由基:一種空中微粒,與心肺疾病有關。 Seven, free radicals: an airborne particle, related to cardiopulmonary disease.

八、氨氣(NH3):主要來自農業活動的過程,氨氣的化學方程式是NH3,通常是一種刺激性強的氣體,地面作物需要的相關營養成分,氨是肥料和滋養的先導,無論是直接還是間接,氨都是許多藥物的合成成分。氨雖然被大量使用,但確是有腐蝕性的,傷身的物質,在大氣中,氨氣與氫氧化物和硫發生反應,形成顆粒。 8. Ammonia (NH3): mainly from the process of agricultural activities, the chemical equation of ammonia is NH3, usually a irritating gas, the relevant nutrients needed for ground crops, ammonia is the leader of fertilizer and nourishment, whether it is Direct or indirect, ammonia is a synthetic component of many drugs. Although ammonia is used in a large amount, it is corrosive and injurious. In the atmosphere, ammonia reacts with hydroxides and sulfur to form particles.

九、臭氣從垃圾、汚水和工業過程中釋放出來。 9. Odor is released from garbage, sewage and industrial processes.

十、放射性廢料:由核爆炸、核事件、戰爭爆破和自然過程,如氡的放射性衰變產生。 X. Radioactive waste: produced by nuclear explosions, nuclear events, war blasts and natural processes such as radioactive decay of plutonium.

以上為主要造成污染的污染物與其產生的來源。 These are the main pollutants and their sources.

其中,以氧化亞氮(N2O)是大氣中含量最多的氫氧化物,也是氮氧化物中化學性質最穩定的一種,因為對人體沒有直接傷害,所以也就不像其他氮氧化物如NO或NO2,受到重視,但是其嚴重破壞臭氧層已受到證實。 Among them, nitrous oxide (N2O) is the most abundant hydroxide in the atmosphere, and it is also the most chemically stable of nitrogen oxides. Because it has no direct harm to the human body, it is not like other nitrogen oxides such as NO or NO2 has received attention, but its severe destruction of the ozone layer has been confirmed.

2015年聯合國於巴黎舉辦氣候峰會,該次的議題是以「抑制全球暖化」進行協議,目標是逐年減少溫室氣體排放,讓地球在2100年時暖化速度減緩,全球氣溫不會上升超過1.5℃[2015聯合國氣候峰會,維基百科];雖然各國遞交之溫室氣體減排的標準不一,但是減少溫室氣體排放是已有的共識。美國環境保護署(USEPA)明列六種氣體為減排對象,包含二氧化碳、甲烷、氧化亞氮、氫氟碳化物、全氟碳化物及六氟化硫。我國於2015年立法院第八屆第7第16次三讀通過「溫室氣體減量及管理法」,同年七月總統頒布實施,隔年環保署擬定實施細則以利後續推動,其中第十二條第三項明定「工業製程與產品使用部門溫室氣體統計及排放趨勢」;因此在半導體產業中,有相當多的製程氣體如氧化亞氮、甲烷、氫氟碳化物、全氟碳化物及六氟化硫等都會受到管制及盤點,對於業界廠務而言,無疑需要提前因應以避免遭受管制。 In 2015, the United Nations held a climate summit in Paris. The topic was to "inhibit global warming". The goal is to reduce greenhouse gas emissions year by year, so that the earth's warming rate will slow down in 2100, and global temperatures will not rise more than 1.5. °C [2015 UN Climate Summit, Wikipedia]; Although the standards for greenhouse gas emission reductions submitted by countries vary, the reduction of greenhouse gas emissions is an established consensus. The US Environmental Protection Agency (USEPA) lists six gases for emissions reductions, including carbon dioxide, methane, nitrous oxide, hydrofluorocarbons, perfluorocarbons, and sulfur hexafluoride. China adopted the "Greenhouse Gas Reduction and Management Law" in the 8th and 16th Third Reading of the 8th Legislative Yuan of the Legislative Yuan in 2015. In July of the same year, the President promulgated and implemented the regulations. The next year, the Environmental Protection Agency drafted the implementation rules for the follow-up promotion, of which Article 12 Xiang Mingding "Greenhouse Gas Statistics and Emissions Trends in the Industrial Process and Product Use Sector"; therefore, there are quite a number of process gases in the semiconductor industry such as nitrous oxide, methane, hydrofluorocarbons, perfluorocarbons and sulfur hexafluoride. It will be subject to regulation and inventory. For the industry, it is undoubtedly necessary to deal with it in advance to avoid being regulated.

常見的溫室氣體對於全球暖化的影響程度亦不相同(稱為全球暖化潛勢GWP100),C02為1,SF6為22,800,N2O為280;除此之外,N2O也是破壞大氣臭氧層的主要氣體,主要是因為N2O對真空紫外線(Vacuum UV,VUV)具有強烈的吸收能力,並分解為N2及O原子,使O原子再與臭氧O3反應生成O2而使臭氧減少,其化學式為:N2O+hv→N2+O;以及另一化學式:O+O3→2O2Common greenhouse gases have different effects on global warming (called global warming potential GWP100), C0 2 is 1, SF 6 is 22,800, and N 2 O is 280; in addition, N 2 O is also The main gas that destroys the ozone layer of the atmosphere is mainly because N 2 O has strong absorption capacity for vacuum ultraviolet (Vucuum UV, VUV) and decomposes into N 2 and O atoms, so that O atoms react with ozone O 3 to form O 2 . The ozone is reduced, and its chemical formula is: N 2 O+hv→N 2 +O; and another chemical formula: O+O 3 →2O 2 .

另外,目前空汙問題相當著名的PM2.5等議題,都是目前亟欲處理的問題。 In addition, issues such as PM2.5, which is quite famous for the current air pollution problem, are issues that are currently being dealt with.

因此,目前有很多空氣清靜設備或水源淨化處理設備等,都是希望能改善前述各種污染的問題,而目前最常用的光觸媒技術在近20年內積極的開發與應用,但仍受限於光觸媒本身需要光才會有作用,尤其是紫外線光,且污染物必須接觸到光觸媒才會被氧化還原而有效果,因此,如何在有限的空間內讓光觸媒更有效的淨化污染物乃為業界亟欲改善與努力的方向所在。 Therefore, there are many air quieting equipment or water purification treatment equipments, etc., all of which are expected to improve the various pollution problems mentioned above. At present, the most commonly used photocatalyst technology has been actively developed and applied in the past 20 years, but it is still limited by photocatalyst. It requires light to have its own effect, especially ultraviolet light, and the pollutants must be exposed to the photocatalyst to be redoxed and effective. Therefore, how to make the photocatalyst more effective in purifying pollutants in a limited space is the industry's desire The direction of improvement and hard work.

有鑒於此,本發明即在提供一種流體淨化裝置,包含一第一管狀腔體,其呈中空狀並具有一中空部,環繞中空部則係為一內環壁與一外環壁所構成之供流空間,供流空間具有一流體輸入口以及一流體輸出口,一導流結構設置於內環壁與外環壁之間,用以導引一流體自流體輸入口至流體輸出口為單一流向,其中,導流結構係由一含有泡沫狀氣孔之金屬材質所組成,且導流結構穿設有一裝著孔,用以裝設至少一紫外線燈具;複數個鍍有光觸媒之透明基材沿著導流結構充填於供流空間內。 In view of the above, the present invention provides a fluid purification device comprising a first tubular cavity which is hollow and has a hollow portion, and is surrounded by a hollow wall and an outer ring wall. a supply space, the flow space has a fluid input port and a fluid output port, and a flow guiding structure is disposed between the inner ring wall and the outer ring wall for guiding a fluid from the fluid input port to the fluid output port as a single Flow direction, wherein the flow guiding structure is composed of a metal material containing foamy pores, and the flow guiding structure is provided with a hole for mounting at least one ultraviolet lamp; a plurality of transparent substrates coated with photocatalyst The flow guiding structure is filled in the supply space.

所述之流體淨化裝置,其中,導流結構鍍有一光觸媒,其包含磷化鎵(GaP)、砷化鎵(GaAs)、氧化鋯(ZrO2)、硫化鎘(CdS)、鉭酸鉀(KTaO3)、硒化鎘(CdSe)、鈦酸鍶(SrTiO3)、氧化鈮(Nb2O5)、氧化鋅(ZnO)、氧化鐵(Fe2O3)、氧化鎢(WO3)、氧化錫(SnO2)及二氧化鈦(TiO2)中任一種或一種以上之混合物。 The fluid purification device, wherein the flow guiding structure is plated with a photocatalyst comprising gallium phosphide (GaP), gallium arsenide (GaAs), zirconium oxide (ZrO2), cadmium sulfide (CdS), potassium citrate (KTaO3) Cadmium selenide (CdSe), barium titanate (SrTiO3), niobium oxide (Nb2O5), zinc oxide (ZnO), iron oxide (Fe2O3), tungsten oxide (WO3), tin oxide (SnO2) and titanium dioxide (TiO2) Any one or more mixtures.

所述之流體淨化裝置,導流結構為複數個中空圓盤狀的第一導流層與一第二導流層所組成,第一導流層係自內環壁向外環壁延伸並保留一預設間隙,第二導流層係自外環壁向內環壁延伸並保留一預設間隙,第一導流層與第二導流層為交錯方式設置。 In the fluid purification device, the flow guiding structure is composed of a plurality of hollow disk-shaped first flow guiding layers and a second guiding layer, and the first guiding layer extends from the inner ring wall to the outer ring wall and remains. A predetermined gap, the second guiding layer extends from the outer ring wall toward the inner ring wall and retains a predetermined gap, and the first guiding layer and the second guiding layer are arranged in an staggered manner.

所述之流體淨化裝置,其中,導流結構為一含有鎳、銅、及鐵的其中任一項或一項以上之合金材料所組成。 In the fluid purification device, the flow guiding structure is composed of an alloy material containing any one or more of nickel, copper, and iron.

所述之流體淨化裝置,其中,內環壁及外環壁中任一項或兩者為可透光材質。 In the fluid purification device, any one or both of the inner ring wall and the outer ring wall are permeable materials.

所述之流體淨化裝置,其中,透明基材係至少包含一二氧化矽之石英、一玻璃、及一聚四氟乙烯之任一種或一種以上之組合物。 In the fluid purification device, the transparent substrate is composed of at least one of cerium oxide, one glass, and one polytetrafluoroethylene.

所述之流體淨化裝置,其中,透明基材係選自於由一多邊形及一圓形所組成之群組中的至少一種形狀。 In the fluid purification device, the transparent substrate is selected from at least one of a group consisting of a polygon and a circle.

所述之流體淨化裝置,其中,所述之光觸媒包含磷化鎵(GaP)、砷化鎵(GaAs)、氧化鋯(ZrO2)、硫化鎘(CdS)、鉭酸鉀(KTaO3)、硒化鎘(CdSe)、鈦酸鍶(SrTiO3)、氧化鈮(Nb2O5)、氧化鋅(ZnO)、氧化鐵(Fe2O3)、氧化鎢(WO3)、氧化錫(SnO2)及二氧化鈦(TiO2)中任一種或一種以上之混合物。 The fluid purification device, wherein the photocatalyst comprises gallium phosphide (GaP), gallium arsenide (GaAs), zirconium oxide (ZrO2), cadmium sulfide (CdS), potassium citrate (KTaO3), cadmium selenide Any one or one of (CdSe), barium titanate (SrTiO3), cerium oxide (Nb2O5), zinc oxide (ZnO), iron oxide (Fe2O3), tungsten oxide (WO3), tin oxide (SnO2), and titanium dioxide (TiO2) The above mixture.

所述之流體淨化裝置,其中,包含一第二管狀腔體,設置於第一管狀腔體之中空部內。 The fluid purification device includes a second tubular cavity disposed in a hollow portion of the first tubular cavity.

所述之流體淨化裝置,其中,第二管狀腔體包含複數個可互相組合之腔體、一前置流道入口與一前置流道出口,腔體具有互相通透之流道;前置流道出口與第一管狀腔體之流體輸入口相連通,據此,使流體 自前置流道入口依序經過腔體、而自前置流道出口輸入至第一管狀腔體之流體輸入口。 The fluid purification device, wherein the second tubular cavity comprises a plurality of mutually combinable cavities, a front flow channel inlet and a front flow channel outlet, the cavity has mutually transparent flow paths; The flow path outlet communicates with the fluid input port of the first tubular cavity, whereby fluid is input from the front flow path inlet through the cavity, and the fluid input from the front flow channel outlet to the first tubular cavity mouth.

所述之流體淨化裝置,其中,複數腔體內分別設置選自於一前置濾網模組、一高效空氣過濾模組、一矽藻土過濾模組、一電漿過濾模組以及一靜電集塵模組所構成群組中至少一個模組所組成。 The fluid purification device, wherein the plurality of chambers are respectively disposed from a pre-filter module, a high-efficiency air filter module, a diatomaceous earth filter module, a plasma filter module, and an electrostatic set At least one module of the group formed by the dust module.

所述之流體淨化裝置,其中,包含一發熱裝置設置於其中一腔體。 The fluid purification device includes a heat generating device disposed in one of the cavities.

所述之任一項流體淨化裝置,其中,包含一風機,當欲淨化之流體為一氣體時,風機係用以將氣體送至流體輸入口、或送至前置流道入口。 In any one of the fluid purification devices, the fan is included, and when the fluid to be purified is a gas, the fan is used to send the gas to the fluid input port or to the front flow channel inlet.

所述之任一項流體淨化裝置,其中,包含一泵補,當欲淨化之流體為一液體時,泵補係用以將液體送至流體輸入口、或送至前置流道入口。 In any one of the fluid purification devices, comprising a pumping device, when the fluid to be purified is a liquid, the pumping system is configured to send the liquid to the fluid input port or to the front channel inlet.

所述之任一項流體淨化裝置,其中流體包含一有機揮發化合物(VOCs)。 Any of the fluid purification devices, wherein the fluid comprises an organic volatile compound (VOCs).

所述之任一項流體淨化裝置,其中流體包含一氮氧化物(NOx)。 Any of the fluid purification devices, wherein the fluid comprises a nitrogen oxide (NOx).

1‧‧‧流體淨化裝置 1‧‧‧Fluid purification device

10‧‧‧第一管狀腔體 10‧‧‧First tubular cavity

710‧‧‧中空部 710‧‧‧ Hollow

102‧‧‧內環壁 102‧‧‧ Inner Ring Wall

103‧‧‧外環壁 103‧‧‧ outer ring wall

101‧‧‧供流空間 101‧‧‧Supply space

104‧‧‧流體輸入口 104‧‧‧ fluid input port

105‧‧‧流體輸出口 105‧‧‧ fluid outlet

20‧‧‧導流結構 20‧‧‧drain structure

30‧‧‧裝著孔 30‧‧‧With holes

60‧‧‧透明基材 60‧‧‧Transparent substrate

201‧‧‧第一導流層 201‧‧‧First diversion layer

202‧‧‧第二導流層 202‧‧‧Second diversion layer

203‧‧‧螺旋導流層 203‧‧‧Spiral diversion layer

70‧‧‧第二管狀腔體 70‧‧‧Second tubular cavity

701‧‧‧腔體 701‧‧‧ cavity

702‧‧‧前置流道入口 702‧‧‧Front runner inlet

703‧‧‧前置流道出口 703‧‧‧Front runner exit

110‧‧‧風機 110‧‧‧Fan

120‧‧‧泵補 120‧‧‧ pumping

第1圖為本發明所提出之一種流體淨化裝置之側視剖面示意圖。 1 is a side cross-sectional view of a fluid purification device proposed by the present invention.

第2圖為本發明之流體淨化裝置裝填透明基材後的側視剖面示意圖。 Fig. 2 is a side cross-sectional view showing the fluid purification device of the present invention after filling a transparent substrate.

第3圖為本發明之流體淨化裝置之俯視圖。 Figure 3 is a plan view of the fluid purification device of the present invention.

第4圖為本發明之另一實施例之螺旋導流層側視剖面示意圖。 Fig. 4 is a side cross-sectional view showing a spiral guide layer according to another embodiment of the present invention.

第5圖為本發明之流體淨化裝置另一實施態樣示意圖。 Fig. 5 is a schematic view showing another embodiment of the fluid purifying apparatus of the present invention.

第6圖為本發明之流體淨化裝置另一實施態樣示意圖。 Figure 6 is a schematic view showing another embodiment of the fluid purification device of the present invention.

由於本發明係揭露一種流體淨化裝置,其中,所使用之光觸媒使氣體或液體的氧化還原反應等相關基礎原理已為相關技術領域具有通常知識者所能明瞭,故以下文中之說明,不再作完整描述。同時,以下文中所對照之圖式,係表達與本發明特徵有關之結構示意,並未亦不需要依據實際尺寸完整繪製,盍先敘明。 Since the present invention discloses a fluid purification device in which the photocatalyst used to make a gas or liquid redox reaction and the like have been known to those skilled in the relevant art, the following description will not be made. Full description. At the same time, the drawings referred to in the following texts express the structural schematics related to the features of the present invention, and need not be completely drawn according to the actual size, which is first described.

本發明提出一種流體淨化裝置1,係用於處理一流體,在此所指的流體,是包含氣體與液體,且是包含有害物質的氣體或液體。 The present invention provides a fluid purification device 1 for treating a fluid, which is referred to as a gas and a liquid, and is a gas or liquid containing harmful substances.

請參考第1圖,為此流體淨化裝置1之側視剖面示意圖,包含一第一管狀腔體10,其呈中空狀並具有一中空部710,環繞中空部710則係為一內環壁102與一外環壁103所構成之供流空間101,此供流空間101具有一流體輸入口104以及一流體輸出口105,一導流結構20設置於內環壁102與外環壁103之間,用以導引一流體自流體輸入口104至流體輸出口105為單一流向,其中,導流結構20係由一含有泡沫狀氣孔之金屬材質所組成,據此,可以在相同大小的供流空間101之內具有更高的比表面積。 Please refer to FIG. 1 for a side cross-sectional view of the fluid purification device 1 including a first tubular cavity 10 which is hollow and has a hollow portion 710 which is an inner ring wall 102 around the hollow portion 710. The supply space 101 is formed by an outer ring wall 103 having a fluid input port 104 and a fluid output port 105. A flow guiding structure 20 is disposed between the inner ring wall 102 and the outer ring wall 103. For guiding a fluid from the fluid input port 104 to the fluid output port 105 in a single flow direction, wherein the flow guiding structure 20 is composed of a metal material containing foamy pores, according to which the flow can be of the same size. There is a higher specific surface area within the space 101.

同時,選用的金屬材質可以考量製作成形的成本或便利性而選用含有一鎳、銅、或鐵的其中之一或合金之材料所組成。同時,製作成 含有泡沫狀氣孔之金屬材質,稱之為泡沫金屬,其製作方法並不特別侷限,可以使用金屬沉積法、熔體發泡劑發泡法、氣體注入發泡法、浸漿海綿燒結法、纖維冶金法、鑄造法、燒結法、或者是濺射法等,且較佳的型態是其孔洞之間是相通的開孔泡沫金屬。 At the same time, the metal material selected may be composed of a material containing one of nickel, copper, or iron or an alloy, considering the cost or convenience of forming. At the same time, it is made into a metal material containing foamy pores, which is called foam metal. The preparation method is not particularly limited, and metal deposition method, melt foaming agent foaming method, gas injection foaming method, and immersion sponge can be used. A sintering method, a fiber metallurgy method, a casting method, a sintering method, or a sputtering method, etc., and a preferred form is an open-cell foam metal in which pores are in communication.

在本實施例中,導流結構20為複數個鍍有光觸媒之中空圓盤狀的第一導流層201與一第二導流層202所組成,第一導流層201係自內環壁102向外環壁103延伸並保留一預設間隙,而第二導流層202係自外環壁103向內環壁102延伸並保留一預設間隙,在此,第一導流層201與第二導流層202為交錯方式設置。在此,要特別說明的是,將導流結構20鍍有光觸媒,並以第一導流層201與第二導流層202的交錯設置,相較於習知的清淨機具有相同大小的供流空間101中,本發明的流體淨化裝置1之淨化效果與處理效率都較習知淨化裝置高30%以上。 In this embodiment, the flow guiding structure 20 is composed of a plurality of first guiding layer 201 coated with a photocatalytic hollow disk and a second guiding layer 202. The first guiding layer 201 is from the inner annular wall. The outer wall 103 extends and retains a predetermined gap, and the second guiding layer 202 extends from the outer ring wall 103 toward the inner ring wall 102 and retains a predetermined gap. Here, the first guiding layer 201 and The second conductivity layer 202 is arranged in an interleaved manner. Here, it should be particularly noted that the flow guiding structure 20 is plated with a photocatalyst and is interleaved with the first flow guiding layer 201 and the second guiding layer 202, and has the same size as the conventional cleaning machine. In the flow space 101, the purification effect and the treatment efficiency of the fluid purification device 1 of the present invention are both higher than that of the conventional purification device by 30% or more.

請參考第2圖,導流結構20穿設有一裝著孔30,用以裝設至少一紫外線燈具50。複數個鍍有光觸媒之透明基材60沿著導流結構20充填於供流空間101內,圖式中的箭頭方向乃指流體流動的方向,在本實施例中,流體輸入口104設置於內環壁102且位於上方靠近中空部710,使欲淨化的流體自流體輸入口104進入,沿著第一導流層201往外環壁103方向流動,並從預設間隙往下流到第二導流層202,接著往內環壁102方向流,並經過預設間隙後往一層流,如此重複前述的流向直到從流體輸出口105。 Referring to FIG. 2, the flow guiding structure 20 is provided with a mounting hole 30 for mounting at least one ultraviolet lamp 50. A plurality of photocatalyst-coated transparent substrates 60 are filled in the supply space 101 along the flow guiding structure 20. The direction of the arrow in the drawing refers to the direction in which the fluid flows. In this embodiment, the fluid input port 104 is disposed therein. The annular wall 102 is located above the hollow portion 710, so that the fluid to be purified enters from the fluid input port 104, flows along the first flow guiding layer 201 toward the outer ring wall 103, and flows downward from the preset gap to the second guiding flow. The layer 202 then flows in the direction of the inner ring wall 102 and flows through a predetermined gap to the first layer, thus repeating the aforementioned flow direction until from the fluid outlet 105.

在此,本發明所揭露的導流結構20中所使用的泡沫金屬態樣,其氣泡的孔隙大小與透明基材60彼此堆疊後的間隙,是可以進行調整的,於本實施例中,透明基材60係使用圓形的玻璃圓球,如果要其堆疊後 的間隙大於導流結構20的氣泡孔隙,則可以選用直徑較大的圓形透明基材60,據此,可以控制流體流動的效果,例如球形結構比較大時,大部分流體會從間隙比較大的透明基材60之間的間隙流動,球形結構比較小玻璃圓球,大部分流體會從導流結構20中泡沫金屬的氣泡孔隙往下一層流動。 Here, in the foam metal form used in the flow guiding structure 20 disclosed in the present invention, the pore size of the bubble and the gap after the transparent substrate 60 are stacked on each other can be adjusted. In this embodiment, the transparent The substrate 60 is a circular glass sphere. If the gap after stacking is larger than the bubble pores of the flow guiding structure 20, a circular transparent substrate 60 having a larger diameter can be selected, thereby controlling the fluid flow. The effect, for example, when the spherical structure is relatively large, most of the fluid will flow from the gap between the transparent substrates 60 having a relatively large gap, the spherical structure is relatively small glass spheres, and most of the fluid will bubble from the metal of the foam in the flow guiding structure 20. The pores flow to the next layer.

請參考第3圖,為本發明之流體淨化裝置之俯視圖,於第一管狀腔體10中,以一定的間距設置紫外線燈具50,最佳的距離為紫外線與光觸媒可作用的距離;當然,並不以此為限,考量透明基材60與紫外線燈具50數量的匹配,內環壁102或外環壁103為可透光材質,據此,於中空部710亦可設置紫外線燈具50,甚至是第一管狀腔體10的外圍沿著外環壁103都可以設置紫外線燈具50。 Please refer to FIG. 3, which is a top view of the fluid purification device of the present invention. In the first tubular cavity 10, the ultraviolet lamp 50 is disposed at a certain interval, and the optimal distance is the distance between the ultraviolet light and the photocatalyst; of course, Without limitation of this, in consideration of the matching between the transparent substrate 60 and the number of the ultraviolet lamps 50, the inner ring wall 102 or the outer ring wall 103 is a light transmissive material, and accordingly, the ultraviolet lamp 50 may be disposed in the hollow portion 710, or even An ultraviolet ray 50 can be disposed along the outer ring wall 103 at the periphery of the first tubular cavity 10.

據此,透過本發明所提出的流體淨化裝置1,以複數個鍍有光觸媒之透明基材60沿著導流結構20充填於供流空間101內,藉此不僅增加比表面積,透過紫外線燈具50沿著圓形管狀腔體的排列,加上使用鍍有光觸媒之透明基材60,使光觸媒與光接觸的面積增加,提高光觸媒的有效作用達倍數以上;同時,以往遇到比較嚴重的污染源,由於阻擋了光觸媒吸收紫外線的效率,因此也造成光觸媒無法發揮效果,而本發明的所揭露的結構,即使鍍了光觸媒的表面被污染物覆蓋,也可以藉由玻璃球背面透光的機制,讓紫外線從背面照射而使光觸媒的功能被啟動,同時,藉由導流結構20的泡沫金屬設計,其又具有荷重的效果,因此,即使供流空間101填滿了透明基材60,導流結構20也不會因此變形,因此,除了增加了在有限的供流空間101中的比表面積,也增加流體在供流空間101內的滯留時間,可以使光觸媒更完全的發揮作用,有效將流體中的污染物進行淨化。 Accordingly, through the fluid purification device 1 proposed by the present invention, a plurality of transparent substrates 60 coated with photocatalyst are filled in the supply space 101 along the flow guiding structure 20, thereby not only increasing the specific surface area, but also passing through the ultraviolet lamp 50. Along the arrangement of the circular tubular cavity and the transparent substrate 60 coated with photocatalyst, the area of contact between the photocatalyst and the light is increased, and the effective effect of the photocatalyst is increased by more than a multiple; at the same time, in the past, a relatively serious pollution source is encountered. Since the photocatalyst absorbs the ultraviolet light, the photocatalyst is not effective, and the disclosed structure can be made by the mechanism of the back surface of the glass ball even if the surface of the photocatalyst is covered with the contaminant. The ultraviolet light is irradiated from the back surface to activate the function of the photocatalyst, and at the same time, by the foam metal design of the flow guiding structure 20, it has a load-bearing effect, and therefore, even if the supply space 101 is filled with the transparent substrate 60, the flow guiding structure 20 will not be deformed as a result, therefore, in addition to increasing the specific surface area in the limited supply space 101, the fluid is also increased in the supply flow. Residence time in the 101, can be made more complete photocatalyst to function, the effective purification of contaminants in the fluid.

同時,本發明中所述之導流結構20中,由於使用一含有泡沫狀氣孔之金屬材質,如前述的泡沫金屬,此乃由於金屬材質具有比較理想的硬度,且由於具有約80%的體積是空的,因此重量很輕但是又可以承受填充透明基材60的重量,在本實施例中,其泡沫氣孔的孔隙以及玻璃圓球大小視需求而設定,藉以控制流體的方向以及流量,並控制可以讓少部分的流體自泡沫金屬往下一層導流層流動。 Meanwhile, in the flow guiding structure 20 described in the present invention, since a metal material containing foamy pores, such as the aforementioned metal foam, is used, the metal material has a relatively desirable hardness and has a volume of about 80%. It is empty, so it is light in weight but can withstand the weight of the filled transparent substrate 60. In the present embodiment, the pores of the foam pores and the size of the glass sphere are set as needed, thereby controlling the direction and flow rate of the fluid, and Control allows a small portion of the fluid to flow from the foam metal to the next layer of the baffle.

在此,要特別說明的是,透明基材60係至少包含一二氧化矽之石英、一玻璃、或一聚四氟乙烯(鐵氟龍)之其中一種成分。而其形狀係選自於由一多邊形及一圓形所組成之群組中的至少一種形狀,據此,在固定的第一管狀腔體10之空間內,可以有效增加比表面積。 Here, it is particularly noted that the transparent substrate 60 is one of at least one component of quartz, a glass, or a polytetrafluoroethylene (Teflon) containing cerium oxide. The shape is selected from at least one of a group consisting of a polygon and a circle, whereby the specific surface area can be effectively increased in the space of the fixed first tubular cavity 10.

此外,所述之光觸媒包含磷化鎵(GaP)、砷化鎵(GaAs)、氧化鋯(ZrO2)、硫化鎘(CdS)、鉭酸鉀(KTaO3)、硒化鎘(CdSe)、鈦酸鍶(SrTiO3)、氧化鈮(Nb2O5)、氧化鋅(ZnO)、氧化鐵(Fe2O3)、氧化鎢(WO3)、氧化錫(SnO2)或二氧化鈦(TiO2)其中至少一種。以目前的科技,係以二氧化鈦(TiO2)較為穩定,但是並不以此為限,未來可以視要處理的流體中,是液體還是氣體,其有害物質是屬於哪些類別,而挑選氧化能力較強、或還原能力較強的光觸媒,以達到最佳的淨化效果。在本發明中,欲淨化的流體中所含的成分包含一有機揮發化合物(VOCs)、或一氮氧化物(NOx)。 In addition, the photocatalyst comprises gallium phosphide (GaP), gallium arsenide (GaAs), zirconium oxide (ZrO2), cadmium sulfide (CdS), potassium citrate (KTaO3), cadmium selenide (CdSe), barium titanate. At least one of (SrTiO3), cerium oxide (Nb2O5), zinc oxide (ZnO), iron oxide (Fe2O3), tungsten oxide (WO3), tin oxide (SnO2) or titanium oxide (TiO2). According to the current technology, titanium dioxide (TiO2) is relatively stable, but it is not limited to this. In the future, depending on whether the fluid to be treated is a liquid or a gas, the harmful substances belong to which categories, and the selective oxidation ability is strong. , or reduce the photocatalyst with strong ability to achieve the best purification effect. In the present invention, the components contained in the fluid to be purified contain an organic volatile compound (VOCs) or a nitrogen oxide (NOx).

請參考第4圖,為本發明之另一實施例之螺旋導流層側視剖面示意圖,此實施例中,將導流結構20設計為一螺旋導流層203,且螺旋導流層203亦使用含有泡沫狀氣孔之金屬材質所組成,亦即泡沫金屬,且較佳 的方式是,使用鍍有光觸媒的泡沫金屬。據此,一樣有延長欲淨化的流體在供流空間101內滯留的時間,進而達到最佳的淨化效率與效果。 Please refer to FIG. 4, which is a side cross-sectional view of a spiral guide layer according to another embodiment of the present invention. In this embodiment, the flow guiding structure 20 is designed as a spiral guiding layer 203, and the spiral guiding layer 203 is also It is composed of a metal material containing foamy pores, that is, a metal foam, and preferably, a metal oxide plated with a photocatalyst is used. Accordingly, the same period of time in which the fluid to be purified is retained in the supply space 101 is extended, thereby achieving optimum purification efficiency and effect.

請參考第5圖,為本發明之流體淨化裝置另一實施態樣示意圖,其包含一第二管狀腔體70,設置於第一管狀腔體10之中空部710內。其中,第二管狀腔體70包含複數個可互相組合之腔體701、一前置流道入口702與一前置流道出口703,複數個腔體701具有互相通透之流道;而前置流道出口703與第一管狀腔體10之流體輸入口104相連通,據此,使欲淨化的流體自前置流道入口702依序經過複數個腔體701、而自前置流道出口703輸入至第一管狀腔體10之流體輸入口104。 Please refer to FIG. 5 , which is a schematic view of another embodiment of the fluid purification device of the present invention. The second tubular cavity 70 is disposed in the hollow portion 710 of the first tubular cavity 10 . The second tubular cavity 70 includes a plurality of cavities 701 that can be combined with each other, a front flow channel inlet 702 and a front flow channel outlet 703, and the plurality of cavities 701 have mutually transparent flow paths; The flow channel outlet 703 is in communication with the fluid input port 104 of the first tubular cavity 10, whereby the fluid to be purified is sequentially passed through the plurality of cavities 701 from the pre-flow channel inlet 702, and from the front flow channel. The outlet 703 is input to the fluid input port 104 of the first tubular cavity 10.

要特別說明的是,視欲淨化的流體特性,複數個腔體701內分別設置選自於一前置濾網模組、一高效空氣過濾模組、一矽藻土過濾模組、一電漿過濾模組以及一靜電集塵模組所構成群組中至少一個模組所組成。其中,更包含一發熱裝置(未繪)設置於複數個腔體701之其中之一,據此,可以將欲淨化的特定流體加以預熱,提高其激發態的形成,因此,發熱裝置並不特別侷限,只要有可以達到預定的溫度即可,例如,也可以利用紫外線燈具50所產生的熱能加以回收,在其中一個腔體701中,而讓經過此腔體701的流體溫度可以提高;或者,使用加熱帶的方式,圍繞於一腔體701,使此腔體701之中產生一定的溫度,而讓經過此腔體701的流體溫度可以提高。 Specifically, the plurality of cavities 701 are respectively selected from a pre-filter module, a high-efficiency air filter module, a diatomaceous earth filter module, and a plasma, depending on the fluid characteristics to be purified. The filter module and the electrostatic dust collection module comprise at least one module. Wherein, a heat generating device (not shown) is further disposed in one of the plurality of cavities 701, whereby the specific fluid to be purified can be preheated to increase the formation of the excited state, and therefore, the heat generating device does not In particular, as long as the predetermined temperature can be reached, for example, the heat generated by the ultraviolet lamp 50 can also be recovered, and in one of the cavities 701, the temperature of the fluid passing through the cavity 701 can be increased; By using a heating belt, around a cavity 701, a certain temperature is generated in the cavity 701, and the temperature of the fluid passing through the cavity 701 can be increased.

在本實施例中,包含一風機110,當欲淨化之流體為一氣體時,風機110係用以將氣體送至第一管狀腔體10的流體輸入口104、或送至第二管狀腔體70的前置流道入口702進行處理,但並不以此為限,例如,也 可以把風機110設置在流體輸出口105或前置流道出口703,利用風壓的原理,也可以達成相同的效果。 In this embodiment, a fan 110 is included. When the fluid to be purified is a gas, the fan 110 is used to send the gas to the fluid input port 104 of the first tubular cavity 10 or to the second tubular cavity. The front flow channel inlet 702 of the 70 is processed, but not limited thereto. For example, the fan 110 may be disposed at the fluid output port 105 or the front flow channel outlet 703, and the same principle can be achieved by using the principle of wind pressure. Effect.

請參考第6圖,為本發明之流體淨化裝置另一實施態樣示意圖,其包含一泵補120,當欲淨化之流體為一液體時,泵補120係用以將液體送至第一管狀腔體10的流體輸入口104、或送至第二管狀腔體70的前置流道入口702,但並不以此為限,如前所述,也可以把泵補120設置在流體輸出口105或前置流道出口703,也可以達成相同的效果。 Please refer to FIG. 6 , which is a schematic view of another embodiment of the fluid purification device of the present invention, which includes a pumping 120. When the fluid to be purified is a liquid, the pumping 120 is used to send the liquid to the first tube. The fluid input port 104 of the cavity 10 or the front flow channel inlet 702 of the second tubular cavity 70 is not limited thereto. As described above, the pumping 120 can also be disposed at the fluid outlet. 105 or the front flow path outlet 703 can achieve the same effect.

以上所述僅為本發明之較佳實施例,並非用以限定本發明之申請專利權利;同時以上的描述,對於熟知本技術領域之專門人士應可明瞭及實施,因此其他未脫離本發明所揭示之精神下所完成的等效改變或修飾,均應包含在申請專利範圍中。 The above description is only the preferred embodiment of the present invention, and is not intended to limit the patent application rights of the present invention. The above description should be understood and implemented by those skilled in the art, so that the other embodiments are not deviated from the present invention. Equivalent changes or modifications made in the spirit of the disclosure should be included in the scope of the patent application.

Claims (16)

一種流體淨化裝置,包含一第一管狀腔體,其呈中空狀並具有一中空部,環繞該中空部則係為一內環壁與一外環壁所構成之供流空間,該供流空間具有一流體輸入口以及一流體輸出口,一導流結構設置於該內環壁與該外環壁之間,用以導引一流體自該流體輸入口至該流體輸出口為單一流向,其中,該導流結構係由一含有泡沫狀氣孔之金屬材質所組成,且該導流結構穿設有一裝著孔,用以裝設至少一紫外線燈具;複數個鍍有光觸媒之透明基材沿著該導流結構充填於該供流空間內。  A fluid purification device comprises a first tubular cavity which is hollow and has a hollow portion, and surrounds the hollow portion is a supply space formed by an inner ring wall and an outer ring wall, the supply space Having a fluid input port and a fluid output port, a flow guiding structure is disposed between the inner ring wall and the outer ring wall for guiding a fluid from the fluid input port to the fluid outlet port as a single flow direction, wherein The flow guiding structure is composed of a metal material containing foamy pores, and the flow guiding structure is provided with a hole for mounting at least one ultraviolet lamp; a plurality of transparent substrates plated with photocatalyst are along The flow guiding structure is filled in the supply flow space.   如請求項1所述之流體淨化裝置,其中,該導流結構鍍有一光觸媒,其包含磷化鎵(GaP)、砷化鎵(GaAs)、氧化鋯(ZrO 2)、硫化鎘(CdS)、鉭酸鉀(KTaO 3)、硒化鎘(CdSe)、鈦酸鍶(SrTiO 3)、氧化鈮(Nb 2O 5)、氧化鋅(ZnO)、氧化鐵(Fe 2O 3)、氧化鎢(WO 3)、氧化錫(SnO 2)及二氧化鈦(TiO 2)中任一種或一種以上之混合物。 The fluid purification device of claim 1, wherein the flow guiding structure is plated with a photocatalyst comprising gallium phosphide (GaP), gallium arsenide (GaAs), zirconium oxide (ZrO 2 ), cadmium sulfide (CdS), Potassium citrate (KTaO 3 ), cadmium selenide (CdSe), barium titanate (SrTiO 3 ), bismuth oxide (Nb 2 O 5 ), zinc oxide (ZnO), iron oxide (Fe 2 O 3 ), tungsten oxide ( Any one or a mixture of one or more of WO 3 ), tin oxide (SnO 2 ), and titanium dioxide (TiO 2 ). 如請求項1所述之流體淨化裝置,該導流結構為複數個中空圓盤狀的第一導流層與一第二導流層所組成,該等第一導流層係自該內環壁向該外環壁延伸並保留一預設間隙,該等第二導流層係自該外環壁向該內環壁延伸並保留一預設間隙,該第一導流層與該第二導流層為交錯方式設置。  The fluid purification device of claim 1, wherein the flow guiding structure is composed of a plurality of hollow disk-shaped first guiding layers and a second guiding layer, wherein the first guiding layers are from the inner ring The wall extends toward the outer ring wall and retains a predetermined gap. The second baffle extends from the outer ring wall toward the inner ring wall and retains a predetermined gap, the first baffle and the second The diversion layer is arranged in an interleaved manner.   如請求項1所述之流體淨化裝置,其中,該導流結構為一含有鎳、銅、及鐵的其中任一項或一項以上之合金材料所組成。  The fluid purification device according to claim 1, wherein the flow guiding structure is composed of an alloy material containing any one or more of nickel, copper, and iron.   如請求項1所述之流體淨化裝置,其中,該內環壁及該外環壁中任一 項或兩者為可透光材質。  The fluid purification device of claim 1, wherein either or both of the inner ring wall and the outer ring wall are permeable materials.   如請求項1所述之流體淨化裝置,其中,該等透明基材係至少包含一二氧化矽之石英、一玻璃、及一聚四氟乙烯之任一種或一種以上之組合物。  The fluid purification device according to claim 1, wherein the transparent substrate comprises at least one of cerium oxide, one glass, and one polytetrafluoroethylene.   如請求項1所述之流體淨化裝置,其中,該等透明基材係選自於由一多邊形及一圓形所組成之群組中的至少一種形狀。  The fluid purification device of claim 1, wherein the transparent substrate is selected from at least one of a group consisting of a polygon and a circle.   如請求項1所述之流體淨化裝置,其中,所述之光觸媒包含磷化鎵(GaP)、砷化鎵(GaAs)、氧化鋯(ZrO 2)、硫化鎘(CdS)、鉭酸鉀(KTaO 3)、硒化鎘(CdSe)、鈦酸鍶(SrTiO 3)、氧化鈮(Nb 2O 5)、氧化鋅(ZnO)、氧化鐵(Fe 2O 3)、氧化鎢(WO 3)、氧化錫(SnO 2)及二氧化鈦(TiO 2)中任一種或一種以上之混合物。 The fluid purification device according to claim 1, wherein the photocatalyst comprises gallium phosphide (GaP), gallium arsenide (GaAs), zirconium oxide (ZrO 2 ), cadmium sulfide (CdS), potassium citrate (KTaO). 3 ), cadmium selenide (CdSe), barium titanate (SrTiO 3 ), bismuth oxide (Nb 2 O 5 ), zinc oxide (ZnO), iron oxide (Fe 2 O 3 ), tungsten oxide (WO 3 ), oxidation Any one or a mixture of one or more of tin (SnO 2 ) and titanium dioxide (TiO 2 ). 如請求項1所述之流體淨化裝置,其中,包含一第二管狀腔體,設置於該第一管狀腔體之該中空部內。  The fluid purification device of claim 1, comprising a second tubular cavity disposed in the hollow portion of the first tubular cavity.   如請求項9所述之流體淨化裝置,其中,該第二管狀腔體包含複數個可互相組合之腔體、一前置流道入口與一前置流道出口,該等腔體具有互相通透之流道;該前置流道出口與該第一管狀腔體之該流體輸入口相連通,據此,使該流體自該前置流道入口依序經過該等腔體、而自該前置流道出口輸入至該第一管狀腔體之該流體輸入口。  The fluid purification device of claim 9, wherein the second tubular cavity comprises a plurality of mutually combinable cavities, a front flow channel inlet and a front flow channel outlet, the chambers being interconnected a flow passage that communicates with the fluid input port of the first tubular cavity, whereby the fluid is sequentially passed through the cavity from the inlet of the front flow passage, and A front flow channel outlet is input to the fluid input port of the first tubular cavity.   如請求項10所述之流體淨化裝置,其中,該等腔體內分別設置選自於一前置濾網模組、一高效空氣過濾模組、一矽藻土過濾模組、一電漿過濾模組以及一靜電集塵模組所構成群組中至少一個模組所組成。  The fluid purification device of claim 10, wherein the chambers are respectively selected from a pre-filter module, a high-efficiency air filter module, a diatomaceous earth filter module, and a plasma filter module. The group and the at least one module formed by the group of the electrostatic dust collecting modules are composed.   如請求項10所述之流體淨化裝置,其中,包含一發熱裝置設置於該等腔體之其中之一。  The fluid purification device of claim 10, wherein a heat generating device is disposed in one of the cavities.   如請求項1或10中所述之任一項流體淨化裝置,其中,包含一風機,當欲淨化之該流體為一氣體時,該風機係用以將該氣體送至該流體輸入口、或送至該前置流道入口。  The fluid purification device according to any one of claims 1 to 10, wherein a fan is included, and when the fluid to be purified is a gas, the fan is used to send the gas to the fluid input port, or Send to the front runner inlet.   如請求項1或10中所述之任一項流體淨化裝置,其中,包含一泵補,當欲淨化之該流體為一液體時,該泵補係用以將該液體送至該流體輸入口、或送至該前置流道入口。  The fluid purification device according to any one of claims 1 to 10, wherein a pumping device is included, and when the fluid to be purified is a liquid, the pumping system is configured to send the liquid to the fluid input port. Or to the front runner inlet.   如請求項1至12中所述之任一項流體淨化裝置,其中該流體包含一有機揮發化合物(VOCs)。  The fluid purification device of any one of claims 1 to 12, wherein the fluid comprises an organic volatile compound (VOCs).   如請求項1至12中所述之任一項流體淨化裝置,其中該流體包含一氮氧化物(NOx)。  The fluid purification device of any one of claims 1 to 12, wherein the fluid comprises a nitrogen oxide (NOx).  
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