TWI647340B - Surface-treated aluminum material and manufacturing method thereof, and joint body of surface-treated aluminum material / resin layer - Google Patents

Surface-treated aluminum material and manufacturing method thereof, and joint body of surface-treated aluminum material / resin layer Download PDF

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TWI647340B
TWI647340B TW104123084A TW104123084A TWI647340B TW I647340 B TWI647340 B TW I647340B TW 104123084 A TW104123084 A TW 104123084A TW 104123084 A TW104123084 A TW 104123084A TW I647340 B TWI647340 B TW I647340B
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oxide film
aluminum material
film layer
aluminum oxide
treated
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TW201610238A (en
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長谷川真一
三村達矢
小山高弘
村岡佑樹
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日商Uacj股份有限公司
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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B15/00Layered products comprising a layer of metal
    • B32B15/04Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material
    • B32B15/08Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B15/00Layered products comprising a layer of metal
    • B32B15/20Layered products comprising a layer of metal comprising aluminium or copper
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D11/00Electrolytic coating by surface reaction, i.e. forming conversion layers
    • C25D11/02Anodisation
    • C25D11/04Anodisation of aluminium or alloys based thereon
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D11/00Electrolytic coating by surface reaction, i.e. forming conversion layers
    • C25D11/02Anodisation
    • C25D11/04Anodisation of aluminium or alloys based thereon
    • C25D11/18After-treatment, e.g. pore-sealing

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Laminated Bodies (AREA)

Abstract

提供一涵蓋鋁材整面均為長期樹脂密著性優異的表面處理鋁材、以及此種表面處理鋁材穩定的製造方法。 Provided is a surface-treated aluminum material covering the entire surface of the aluminum material, which is excellent in long-term resin adhesion, and a stable manufacturing method of the surface-treated aluminum material.

一種表面處理鋁材及其製造方法,該表面處理鋁材之特徵在於:含有鋁材及形成於其至少任一表面的氧化皮膜;前述氧化皮膜係由形成於表面側且厚度20~500nm的多孔性鋁氧化皮膜層與形成於基質側且厚度3~30nm的障壁型鋁氧化皮膜層構成;於前述多孔性鋁氧化皮膜層形成有直徑5~30nm之小孔;且前述氧化皮膜中所含水分在10μg/cm2以下。 A surface-treated aluminum material and a manufacturing method thereof. The surface-treated aluminum material is characterized in that it contains an aluminum material and an oxide film formed on at least one of the surfaces thereof; the oxide film is formed by a porous material having a thickness of 20 to 500 nm formed on the surface side. The aluminum oxide film layer is composed of a barrier-type aluminum oxide film layer formed on the substrate side and having a thickness of 3 to 30 nm; small holes having a diameter of 5 to 30 nm are formed in the porous aluminum oxide film layer; and the water content in the foregoing oxide film It is below 10 μg / cm 2 .

Description

表面處理鋁材及其製造方法、以及該表面處理鋁材/樹脂層之接合體 Surface-treated aluminum material, manufacturing method thereof, and joint body of surface-treated aluminum material / resin layer 發明領域 Field of invention

本發明有關於一種施有表面處理之鋁材及其製造方法、以及該表面處理鋁材/樹脂層之接合體,詳細而言係有關於涵蓋鋁材整面均為長期接著性與密著性優異的表面處理鋁材、及此種表面處理鋁材穩定的製造方法、以及接著性與密著性優異的該表面處理鋁材/樹脂層之接合體。 The present invention relates to a surface-treated aluminum material, a method for manufacturing the same, and the surface-treated aluminum material / resin layer joint. Specifically, the invention relates to covering the entire surface of the aluminum material with long-term adhesion and adhesion. An excellent surface-treated aluminum material, a method for producing such a surface-treated aluminum material, and a bonded body of the surface-treated aluminum material / resin layer having excellent adhesion and adhesion.

發明背景 Background of the invention

純鋁材或鋁合金材(以下表記為「鋁材」)具有輕量且適度的機械特性,並且具有美感、成形加工性、耐蝕性等優異之特徵,因而廣泛使用在各種容器類、結構材及機械零件等。該等鋁材既可直接使用,另一方面又可藉由施以各種表面處理來附加及提升耐蝕性、耐摩耗性、樹脂密著性、親水性、撥水性、抗菌性、創意性、紅外放射性、高反射性等功能來作使用。 Pure aluminum or aluminum alloy (hereinafter referred to as "aluminum") has light weight and moderate mechanical characteristics, and has excellent characteristics such as aesthetics, formability, and corrosion resistance. Therefore, it is widely used in various containers and structural materials. And mechanical parts. These aluminum materials can be used directly, on the other hand, they can be added and improved by applying various surface treatments to improve corrosion resistance, abrasion resistance, resin adhesion, hydrophilicity, water repellency, antibacterial, creative, infrared Radioactive, highly reflective and other functions.

例如,就提升耐蝕性及耐摩耗性之表面處理法而言,常廣泛使用陽極氧化處理(所謂的anodized aluminum)。具體上係如非專利文獻1、2中所記載,將鋁材浸漬於酸性 電解液中利用直流電流進行電解處理而於鋁材表面形成厚度數~數十μm之陽極氧化皮膜,且因應用途已提出各種處理方法。 For example, an anodizing treatment (so-called anodized aluminum) is often widely used as a surface treatment method for improving corrosion resistance and abrasion resistance. Specifically, as described in Non-Patent Documents 1 and 2, an aluminum material is immersed in an acid. In the electrolytic solution, direct current is used for electrolytic treatment to form an anodic oxide film with a thickness of several to several tens of μm on the surface of the aluminum material, and various treatment methods have been proposed according to the application.

又,尤其在提升樹脂密著性之表面處理法方面,有如專利文獻1提議之鹼交流電解法。即,其係形成一氧化皮膜,該氧化皮膜係由鋁材表面之厚度20~500nm的多孔性鋁氧化皮膜層與形成於基質側之厚度3~30nm的障壁型鋁氧化皮膜層所構成,前述多孔性鋁氧化皮膜層上形成有直徑5~30nm之小孔,該鋁材表面整體之前述多孔性鋁氧化皮膜層與障壁型鋁氧化皮膜層之合計厚度的變動幅度在該合計厚度之算術平均值的±50%以內。具體上係使用鋁材之電極與相對電極,以pH9~13、液溫35~80℃且溶解鋁濃度在5ppm以上且1000ppm以下之鹼性水溶液作為電解溶液,並在頻率20~100Hz、電流密度4~50A/dm2及電解時間5~60秒鐘之條件下進行交流電解處理而獲得上述氧化皮膜。 In addition, in terms of a surface treatment method for improving the adhesion of the resin, there is an alkali alternating electrolytic method as proposed in Patent Document 1. That is, it forms an oxide film, which is composed of a porous aluminum oxide film layer with a thickness of 20 to 500 nm on the surface of the aluminum material and a barrier-type aluminum oxide film layer with a thickness of 3 to 30 nm formed on the substrate side. The porous aluminum oxide film layer has small pores with a diameter of 5 to 30 nm. The total thickness of the foregoing porous aluminum oxide film layer and the barrier-type aluminum oxide film layer on the entire surface of the aluminum material varies within the arithmetic mean of the total thickness. Within ± 50% of the value. Specifically, an aluminum electrode and a counter electrode are used. An alkaline aqueous solution having a pH of 9 to 13, a liquid temperature of 35 to 80 ° C, and a dissolved aluminum concentration of 5 ppm to 1,000 ppm is used as the electrolytic solution, and the frequency is 20 to 100 Hz and the current density. The above-mentioned oxide film is obtained by performing AC electrolytic treatment under conditions of 4 to 50 A / dm 2 and an electrolysis time of 5 to 60 seconds.

然而,即使是使用專利文獻1之技術且在相同電解條件下進行處理,仍然有在經過一長期間後看到樹脂密著性降低的情況。具體上,例如在常溫‧常壓下經過5年至10年之接合構件中,會看到源自樹脂密著性降低所造成的剝離等發生。 However, even if the technology of Patent Document 1 is used and the treatment is performed under the same electrolytic conditions, the resin adhesiveness may be reduced after a long period of time. Specifically, for example, peeling and the like caused by a decrease in adhesiveness of a resin are seen in a joint member that has been under normal temperature and pressure for 5 to 10 years.

先前技術文獻 Prior art literature 非專利文獻 Non-patent literature

非專利文獻1:鋁合金指南(Aluminium Handbook)第7版、179~190頁、2007年、一般社團法人日本鋁合金協 會(Japan Aluminium Association) Non-Patent Document 1: Aluminium Handbook 7th Edition, 179-190 pages, 2007, Japan Aluminum Alloy Association Japan Aluminium Association

非專利文獻2:日本工業規格JIS H8601、「鋁及鋁合金之陽極氧化皮膜」(1999) Non-Patent Document 2: Japanese Industrial Standard JIS H8601, "Anodic Oxide Coatings on Aluminum and Aluminum Alloys" (1999)

專利文獻 Patent literature

專利文獻1:國際公開WO2013/118870號 Patent Document 1: International Publication No. WO2013 / 118870

發明概要 Summary of invention

本發明目的在於提供一種涵蓋鋁材整面均為長期接著性及密著性優異的表面處理鋁材及此種表面處理鋁材穩定之製造方法、以及接著性與密著性優異的該表面處理鋁材/樹脂層之接合體。 The object of the present invention is to provide a surface-treated aluminum material which is excellent in long-term adhesion and adhesion over the entire surface of the aluminum material, a method for manufacturing such a surface-treated aluminum material, and a surface treatment which is excellent in adhesion and adhesion. Aluminum / resin layer joint.

本發明人等為了解決上述課題,依據專利文獻1重複改良研討的結果查明,經過一長期間後的接著性及密著性之降低係受到存在於多孔性鋁氧化皮膜層內部的極微量水分影響。而且發現,為了性能提升,藉由鹼溶液中之交流電解處理形成上述氧化皮膜後,使形成有氧化皮膜之鋁材暴露在超過150℃之氣體環境下可有效去除上述水分。 In order to solve the above-mentioned problem, the inventors of the present invention have found out from the results of repeated improvement studies of Patent Document 1 that the adhesion and the adhesiveness decrease after a long period of time are received by a very small amount of moisture existing in the porous aluminum oxide film layer. influences. Furthermore, it has been found that, for the purpose of improving performance, after forming the oxide film by alternating current electrolytic treatment in an alkaline solution, exposing the aluminum material formed with the oxide film to a gas environment exceeding 150 ° C can effectively remove the moisture.

即,本發明在項1中係設為一種表面處理鋁材,其特徵在於:含有鋁材及形成於其至少任一表面之氧化皮膜;前述氧化皮膜係由形成於表面側且厚度20~500nm的多孔性鋁氧化皮膜層與形成於基質側且厚度3~30nm的障壁型鋁氧化皮膜層構成;於前述多孔性鋁氧化皮膜層形成有 直徑5~30nm之小孔;且前述氧化皮膜中所含水分在10μg/cm2以下。 That is, in the present invention, item 1 is a surface-treated aluminum material, which is characterized in that it contains an aluminum material and an oxide film formed on at least one of the surfaces thereof; the oxide film is formed on the surface side and has a thickness of 20 to 500 nm The porous aluminum oxide film layer is composed of a barrier-type aluminum oxide film layer formed on the substrate side and having a thickness of 3 to 30 nm; small holes having a diameter of 5 to 30 nm are formed in the porous aluminum oxide film layer; The water content is 10 μg / cm 2 or less.

又,本發明在項2係設為如項1,其中前述多孔性鋁氧化皮膜層與障壁型鋁氧化皮膜層之合計厚度的變動幅度在該合計厚度之算術平均值的±50%以內。 Furthermore, in the second aspect of the present invention, as described in the first aspect, a variation range of a total thickness of the porous aluminum oxide film layer and the barrier-type aluminum oxide film layer is within ± 50% of an arithmetic mean value of the total thickness.

本發明在項3係設為一種表面處理鋁材之製造方法,係製造如項1記載之表面處理鋁材的方法,其特徵在於:使用可表面處理之鋁材電極與相對電極,以pH9~13且液溫35~85℃之鹼性水溶液作為電解溶液,在頻率10~100Hz、電流密度4~50A/dm2及電解時間5~300秒鐘之條件下進行交流電解處理,藉此於與相對電極對向之前述鋁材表面形成氧化皮膜,使已形成該氧化皮膜之鋁材暴露在超過150℃之氣體環境下。 The item 3 in the present invention is a method for manufacturing a surface-treated aluminum material, and is a method for manufacturing the surface-treated aluminum material as described in item 1, which is characterized in that a surface-treated aluminum material electrode and a counter electrode are used. 13 An alkaline aqueous solution with a liquid temperature of 35 to 85 ° C is used as an electrolytic solution. AC electrolytic treatment is performed under the conditions of a frequency of 10 to 100 Hz, a current density of 4 to 50 A / dm 2 and an electrolysis time of 5 to 300 seconds. An oxide film is formed on the surface of the foregoing aluminum material facing the opposite electrode, and the aluminum material on which the oxide film has been formed is exposed to a gas environment exceeding 150 ° C.

又,本發明在項4係設為如項3,其中前述鹼性水溶液之電解溶液含有5ppm以上且1000ppm以下之溶解鋁。 In the fourth aspect of the present invention, as described in the third aspect, the electrolytic solution of the alkaline aqueous solution contains 5 ppm or more and 1,000 ppm or less of dissolved aluminum.

本發明在項5係設為如項3或4,其中令多孔性鋁氧化皮膜層厚度為L(nm)及氣體環境溫度為T(℃)時,前述暴露在超過150℃之氣體環境下的時間t(秒)滿足t≧20×L/T之關係。又,本發明在項6係設為如項3~5之任一項,其中自交流電解處理結束起暴露在超過150℃之氣體環境下至已形成氧化皮膜之鋁材表面溫度達到150℃為止的時間在24小時以內。此外,本發明在項7係設為如項3~6之任一項,其中前述氣體環境之相對濕度在50%以下。 In the present invention, item 5 is set as item 3 or 4, wherein when the thickness of the porous aluminum oxide film layer is L (nm) and the gas environment temperature is T (° C), the aforementioned Time t (seconds) satisfies the relationship of t ≧ 20 × L / T. In the present invention, the item 6 is set to any one of items 3 to 5, wherein the temperature of the surface of the aluminum material on which the oxide film has been formed reaches 150 ° C since the end of the AC electrolytic treatment is exposed to a gas environment exceeding 150 ° C. The time is within 24 hours. In addition, in the seventh aspect, the present invention is set to any one of the third to sixth aspects, wherein the relative humidity of the gaseous environment is 50% or less.

本發明在項8係設為一種表面處理鋁材/樹脂層 之接合體,其特徵在於:於如項1或2記載之表面處理鋁材之經表面處理的表面上接合有樹脂層。 The present invention is set as a surface-treated aluminum material / resin layer in item 8 The bonded body is characterized in that a resin layer is bonded to the surface-treated surface of the surface-treated aluminum material according to item 1 or 2.

本發明在項9係設為如項8,其中使用於前述樹脂層之樹脂具有選自胺基、醯胺基、酯基、羧基、環氧基及羥基之極性官能基之至少1種。 The item 9 of the present invention is as described in item 8, wherein the resin used in the resin layer has at least one polar functional group selected from the group consisting of an amine group, a sulfonylamine group, an ester group, a carboxyl group, an epoxy group, and a hydroxyl group.

本發明在項10係設為如項9,其中前述樹脂之紅外線吸收光譜中,波數νcm-1下之吸收率以I(v)表示時,下述式1之值在0.01以上且3.0以下。 In the present invention, item 10 is set as item 9, wherein in the infrared absorption spectrum of the aforementioned resin, when the absorptivity at the wave number νcm -1 is represented by I ( v ), the value of the following formula 1 is 0.01 or more and 3.0 or less .

依據本發明,可均勻形成鋁材表面整體均對樹脂等呈長期穩定的高接著性及高密著性的氧化皮膜,因此可獲得接著性與密著性優異的表面處理鋁材、以及接著性與密著性優異的該表面處理鋁材/樹脂層之接合體。 According to the present invention, it is possible to uniformly form a long-term stable oxide film having high adhesion and high adhesion to resins and the like on the entire surface of the aluminum material. Therefore, a surface-treated aluminum material having excellent adhesion and adhesion, and adhesion and This surface-treated aluminum material / resin layer joint is excellent in adhesion.

具體上係使鋁材表面之氧化皮膜為多孔性鋁氧化皮膜層與障壁型鋁氧化皮膜層之二層結構。而且,藉由形成於鋁材之表面側、具有20~500nm之厚度且具有直徑5~30nm之小孔的多孔性鋁氧化皮膜層,可抑制其本身的內聚破壞並同時使其表面積增大,藉以提升與樹脂等接合物的接著性及密著性。又,藉由形成於鋁材之基質側且具有3~30nm之厚度的障壁型鋁氧化皮膜層,可使鋁基質與多孔 性鋁氧化皮膜層結合,使接著性及密著性提升。再者,藉由將氧化皮膜中所含水分限制在10μg/cm2以下,樹脂等接合物與多孔性鋁氧化皮膜層接觸之面積即可增大,同時可減低經過長期間後於多孔性鋁氧化皮膜內部生成之水蒸氣量,其結果可長期維持相當高的接著性及密著性。 Specifically, the oxide film on the surface of the aluminum material is a two-layer structure of a porous aluminum oxide film layer and a barrier-type aluminum oxide film layer. In addition, the porous aluminum oxide film layer formed on the surface side of the aluminum material, having a thickness of 20 to 500 nm and having pores with a diameter of 5 to 30 nm, can suppress its own cohesive failure and increase its surface area at the same time. In order to improve the adhesion and adhesion of the joint with resin and the like. In addition, by forming a barrier-type aluminum oxide film layer having a thickness of 3 to 30 nm on the substrate side of the aluminum material, the aluminum substrate and the porous aluminum oxide film layer can be combined to improve adhesion and adhesion. Furthermore, by limiting the moisture content in the oxide film to 10 μg / cm 2 or less, the area where the joints such as resin and the porous aluminum oxide film layer contact can be increased, and at the same time, the porous aluminum can be reduced after a long period of time. The amount of water vapor generated inside the oxide film can maintain a relatively high adhesion and adhesion for a long period of time.

再加上,藉由使鋁材表面整體之氧化皮膜之合計厚度的變動幅度在該合計厚度之算術平均值的±50%以內,則涵蓋鋁材表面整體均可發揮優異的接著性與密著性。 In addition, by changing the total thickness of the total thickness of the oxide film on the surface of the aluminum material to within ± 50% of the arithmetic mean of the total thickness, the entire surface of the aluminum material can exhibit excellent adhesion and adhesion. Sex.

以上述方法製得之表面處理鋁材藉著其優異的接著性於處理面被覆樹脂等接合物,因而適用於各種用途。在此,使用樹脂作為接合物時,熱硬化性樹脂及熱塑性樹脂任一種皆可適用,與本發明之形成於特定處理面的氧化皮膜相輔相成而賦予各種效果。通常,相較於鋁材,樹脂之熱膨脹率較大,因此鋁材與樹脂之接合體很容易發生界面的剝離或截斷。然而,在本發明之表面處理鋁材與樹脂之接合體中,因為其密著性高,所以因熱膨脹率差而在接合界面產生的應力會以表面處理鋁材及/或樹脂之內部應力蓄積。其結果便可抑制界面處的剝離或截斷。本發明之表面處理鋁材與熱塑性樹脂的接合體很適合作為輕量且高剛性的複合材料使用。又,本發明之表面處理鋁材與熱硬化性樹脂之接合體很適合使用於印刷配線基板用途等。 The surface-treated aluminum material obtained by the above-mentioned method is coated with a joint such as a resin on the treated surface due to its excellent adhesiveness, and is therefore suitable for various applications. Here, when a resin is used as a joint, any of a thermosetting resin and a thermoplastic resin can be applied, and various effects can be imparted in combination with the oxide film formed on a specific treatment surface of the present invention. Generally, the thermal expansion rate of the resin is larger than that of the aluminum material, so the joint of the aluminum material and the resin is prone to peel or cut off the interface. However, in the bonded body of the surface-treated aluminum material and the resin of the present invention, since the adhesiveness is high, the stress generated at the bonding interface due to the poor thermal expansion coefficient is accumulated by the internal stress of the surface-treated aluminum material and / or the resin. . As a result, peeling or cutting at the interface can be suppressed. The joint of the surface-treated aluminum material and the thermoplastic resin of the present invention is suitable for use as a lightweight and highly rigid composite material. The bonded body of the surface-treated aluminum material and the thermosetting resin of the present invention is suitable for use in printed wiring boards and the like.

此外,在本發明之表面處理鋁材之製造方法中,藉由適當設定交流電解處理條件,加上在電解處理後在適 當條件下進行加熱處理,可穩定製造上述表面處理鋁材。 In addition, in the method for manufacturing a surface-treated aluminum material of the present invention, by appropriately setting AC electrolytic treatment conditions, When the heat treatment is performed under the conditions, the above-mentioned surface-treated aluminum material can be stably produced.

圖1係用以示意說明顯示式1之分母之積分值區的紅外線吸收光譜之圖表。 FIG. 1 is a graph for schematically illustrating an infrared absorption spectrum showing an integrated value region of a denominator of Formula 1. FIG.

用以實施發明之形態 Forms used to implement the invention

以下將依序詳細說明本發明。本發明之表面處理鋁材在其表面形成有氧化皮膜,且該氧化皮膜係由形成於表面側之多孔性鋁氧化皮膜層及形成於基質側之障壁型鋁氧化皮膜層所構成。而且,於多孔性鋁氧化皮膜層形成有小孔。 Hereinafter, the present invention will be described in detail in order. The surface-treated aluminum material of the present invention has an oxide film formed on its surface, and the oxide film is composed of a porous aluminum oxide film layer formed on the surface side and a barrier-type aluminum oxide film layer formed on the substrate side. In addition, small holes are formed in the porous aluminum oxide film layer.

A.鋁材 A. Aluminum

用於本發明之鋁材可使用純鋁或鋁合金。鋁合金成分並無特別限制,可使用以JIS規定之合金為首的各種合金。就形狀而言並無特別限制,惟從可穩定形成處理皮膜的觀點來看,適宜使用平板狀之物。可因應用途適宜選擇板厚,惟從輕量化及成形性的觀點來看則以0.05~2.0mm為佳,0.1~1.0mm更佳。 As the aluminum material used in the present invention, pure aluminum or aluminum alloy can be used. The aluminum alloy composition is not particularly limited, and various alloys including alloys specified by JIS can be used. There is no particular limitation on the shape, but from the viewpoint of being capable of stably forming a treatment film, a flat plate-like thing is preferably used. The thickness can be appropriately selected according to the application, but from the viewpoint of weight reduction and formability, 0.05 to 2.0 mm is preferable, and 0.1 to 1.0 mm is more preferable.

B.氧化皮膜 B. Oxide film

用於本發明之鋁材在表面上形成有形成於表面側之多孔性鋁氧化皮膜層及形成於基質側之障壁型鋁氧化皮膜層。即,於鋁材表面設有氧化皮膜,該氧化皮膜係由多孔性鋁氧化皮膜層及障壁型鋁氧化皮膜層之二層構成。多孔性鋁氧化皮膜層可長期發揮強力的接著性及密著性,另一 方面藉著障壁型鋁氧化皮膜層可將鋁氧化皮膜層整體與鋁基質牢固地結合。 The aluminum material used in the present invention has a porous aluminum oxide film layer formed on the surface side and a barrier-type aluminum oxide film layer formed on the substrate side on the surface. That is, an oxide film is provided on the surface of the aluminum material, and the oxide film is composed of two layers of a porous aluminum oxide film layer and a barrier-type aluminum oxide film layer. The porous aluminum oxide film layer can exhibit strong adhesion and adhesion for a long time. In terms of the barrier-type aluminum oxide film layer, the entire aluminum oxide film layer can be firmly combined with the aluminum matrix.

B-1.多孔性鋁氧化皮膜層 B-1. Porous aluminum oxide film layer

多孔性鋁氧化皮膜層之厚度為20~500nm。小於20nm時厚度會不夠充分,後述之小孔結構的形成容易變得不夠充分而使接著力及密著力降低。另一方面,若超過500nm,則有多孔性鋁氧化皮膜層本身變得容易內聚破壞而降低密著力。多孔性鋁氧化皮膜層之厚度理想為50~400nm。 The thickness of the porous aluminum oxide film layer is 20 to 500 nm. When the thickness is less than 20 nm, the thickness is insufficient, and the formation of the pore structure described later is likely to be insufficient, and the adhesion and adhesion are reduced. On the other hand, if it exceeds 500 nm, the porous aluminum oxide film layer itself becomes easily cohesive and broken, thereby reducing the adhesion. The thickness of the porous aluminum oxide film layer is preferably 50 to 400 nm.

多孔性鋁氧化皮膜層具有自其表面朝向深度方向之小孔。小孔直徑為5~30nm,理想為10~20nm。該小孔係可發揮使樹脂層或接著劑等與鋁氧化皮膜之接觸面積增大,進而使其接著力及密著力增大之效果者。小孔直徑若小於5nm,接觸面積便會不足而無法獲得充分的接著力及密著力。另一方面,小孔直徑若超過30nm,多孔性鋁氧化皮膜層整體便會變得脆弱而發生內聚破壞,致接著力及密著力降低。 The porous aluminum oxide film layer has pores extending from the surface toward the depth direction. The pinhole diameter is 5 ~ 30nm, ideally 10 ~ 20nm. This pinhole system has the effect of increasing the contact area between the resin layer or the adhesive and the aluminum oxide film, and further increasing the adhesion and adhesion. If the pore diameter is less than 5 nm, the contact area will be insufficient and sufficient adhesion and adhesion cannot be obtained. On the other hand, if the diameter of the pores exceeds 30 nm, the entire porous aluminum oxide film layer becomes fragile and cohesive failure occurs, resulting in a decrease in adhesion and adhesion.

關於小孔之總孔面積相對於多孔性鋁氧化皮膜層之表面積的比並無特別限制。小孔之總孔面積相對於多孔性鋁氧化皮膜層表觀上之表面積(不考慮表面的微小凹凸等,以長度與寬度之乘積表示之面積)的比則以25~75%為佳。低於25%時,可能有接觸面積不足而無法獲得充分的接著力及密著力之情況。另一方面,若超過75%,則有多孔性鋁氧化皮膜層整體變得脆弱而發生內聚破壞,致接著力及密著力降低之情況。 The ratio of the total pore area of the small pores to the surface area of the porous aluminum oxide film layer is not particularly limited. The ratio of the total pore area of the small pores to the apparent surface area of the porous aluminum oxide film layer (the area expressed by the product of length and width irrespective of the small unevenness on the surface, etc.) is preferably 25 to 75%. If it is less than 25%, the contact area may be insufficient and sufficient adhesion and adhesion may not be obtained. On the other hand, if it exceeds 75%, the entire porous aluminum oxide film layer may become fragile and cohesive failure may occur, resulting in a decrease in adhesion and adhesion.

B-2.障壁型鋁氧化皮膜層 B-2. Barrier type aluminum oxide film layer

障壁型鋁氧化皮膜層之厚度為3~30nm。小於3nm時,以中介層而言無法對多孔性鋁氧化皮膜層與鋁基質之結合賦予充分的結合力,尤其在高溫‧多濕等嚴酷環境下的結合力會變得不夠充分。另一方面,若超過30nm,則會因其密實性使障壁型鋁氧化皮膜層變得容易內聚破壞,反而會降低接著力及密著力。而,障壁型鋁氧化皮膜層之厚度理想為5~25nm。 The thickness of the barrier-type aluminum oxide film layer is 3 to 30 nm. If it is less than 3nm, the interposer cannot provide sufficient bonding force for the bonding between the porous aluminum oxide film layer and the aluminum matrix, and the bonding force becomes insufficient in particular in severe environments such as high temperature and humidity. On the other hand, if it exceeds 30 nm, the barrier-type aluminum oxide film layer will be easily cohesive and broken due to its compactness, but the adhesion and adhesion will be reduced instead. The thickness of the barrier-type aluminum oxide film layer is preferably 5 to 25 nm.

B-3.氧化皮膜中所含之水分量 B-3. Moisture content in oxide film

氧化皮膜中可含之水分量必須在10μg/cm2以下。具體而言,自表面處理鋁材之表觀表面積部分(縱×橫)1cm2檢出之水分必須在10μg/cm2以下。若考慮氧化皮膜之結構,可推想所含水分大部分是吸附在多孔性鋁氧化皮膜層內部者。氧化皮膜中所含水分量若超過10μg/cm2,尤其在經過長期間的情況下,會產生與其水分量相當的水蒸氣,氧化皮膜便會因該水蒸氣而體積膨脹。而且,由於該體積膨脹,會產生氧化皮膜與樹脂等接合物之剝離應力,同時,原本生成於氧化皮膜與接合物之接合界面的氫鍵會解離。其結果,經過一長期間後的接著力及密著力便降低。再者,有關水分量之下限值並無特別規定,惟依照後述測定方法,0.1μg/cm2前後為檢測下限,由此可以說工業上的下限值亦在0.1μg/cm2左右。再者,氧化皮膜中所含水分量理想為6μg/cm2以下。 The amount of water that can be contained in the oxide film must be 10 μg / cm 2 or less. Specifically, the moisture detected from 1 cm 2 of the apparent surface area (vertical × horizontal) of the surface-treated aluminum material must be 10 μg / cm 2 or less. If the structure of the oxide film is considered, it can be assumed that most of the water content is adsorbed inside the porous aluminum oxide film layer. If the moisture content in the oxide film exceeds 10 μg / cm 2 , especially in the case of a long period of time, water vapor equivalent to its moisture content will be generated, and the oxide film will expand in volume due to the water vapor. In addition, due to the volume expansion, peeling stress of the oxide film and the joint such as the resin is generated, and at the same time, hydrogen bonds originally generated at the joint interface between the oxide film and the joint are dissociated. As a result, the adhesive force and adhesion force after a long period of time are reduced. Furthermore, under the relevant water content limit is not particularly specified, but in accordance with the measurement method described later, 0.1μg / cm 2 before and after the detection limit, the lower limit value can thus be said that the industry also about 0.1μg / cm 2. The moisture content in the oxide film is preferably 6 μg / cm 2 or less.

B-4.氧化皮膜的整體厚度的變動幅度 B-4. Variation of overall thickness of oxide film

氧化皮膜整體的厚度,即B-1中記載之多孔性鋁氧化皮膜層與B-2中記載之障壁型鋁氧化皮膜層的厚度合計,不論在鋁材上的任何所在作測定,其變動幅度必須在±50%以內為佳,且在±20%以內較佳。即,令鋁材表面上的任意多數處(10處以上為宜,且在該等各處以取10點以上之測定點為佳)測得之氧化皮膜整體厚度的平均值為T(nm)時,位於該等多數測定處之全部氧化皮膜的整體厚度在(0.5×T)~(1.5×T)之範圍為宜。舉例如下述方法:準備10個在同一條件下製備之試料片,針對該等各試料分別測定10點之氧化皮膜的整體厚度,並針對在同一條件下製備之試料取得合計100點的測定值。亦可列舉下述方法取而代之:例如將長方形之試驗片的縱橫向分別劃上各分割成5等分及4等分之線條,並就其交叉點(12個)附近之氧化皮膜的整體厚度分別測定10點,藉此針對同一試料取得合計120點的測定值。 The thickness of the entire oxide film, that is, the thickness of the porous aluminum oxide film layer described in B-1 and the thickness of the barrier aluminum oxide film layer described in B-2, regardless of the location on the aluminum material. It must be within ± 50%, and preferably within ± 20%. That is, when the average value of the entire thickness of the oxide film measured at any number of places on the surface of the aluminum material (more than 10 points is preferred, and more than 10 points are preferred) is T (nm) It is preferable that the overall thickness of all the oxide films located at the positions where the majority of the measurements are made is in the range of (0.5 × T) to (1.5 × T). For example, the following method is to prepare ten sample pieces prepared under the same conditions, measure the overall thickness of the oxide film at 10 points for each of these samples, and obtain a total of 100 measured values for the samples prepared under the same conditions. The following methods can also be cited instead: For example, the vertical and horizontal directions of a rectangular test piece are respectively divided into 5 and 4 lines, and the overall thickness of the oxide film near its intersection (12) By measuring 10 points, a total of 120 measured values were obtained for the same sample.

若有小於(0.5×T)之處存在,該處之氧化皮膜會變得比其周圍更薄。如此一來,在該膜薄之處,於接著劑或是應接合之樹脂層等與氧化皮膜之間便容易產生隙間,恐無法確保充分的接觸面積而使接著力及密著力降低。另一方面,一旦有超過(1.5×T)之處存在,則該處之氧化皮膜便會變得比其周圍更厚。如此一來,來自應接合之樹脂層等的應力會集中在該膜厚所在處,而有接著力及密著力相對降低之情況。 If there is a place smaller than (0.5 × T), the oxide film there will become thinner than the surrounding area. As a result, in the thin place of the film, a gap is easily generated between the adhesive or the resin layer to be bonded and the oxide film, and a sufficient contact area cannot be secured, which may reduce the adhesive force and adhesion. On the other hand, once there is a place exceeding (1.5 × T), the oxide film there becomes thicker than the surrounding area. As a result, stress from the resin layer or the like to be bonded may be concentrated at the place where the film thickness is located, and the adhesion and adhesion may be relatively reduced.

再者,在如上述之氧化皮膜的整體厚度為膜薄之處或膜厚之處,與周圍相較下其光學特性有所不同,所以可能 會目視出有茶褐色或白濁色等色調變化。 Furthermore, where the overall thickness of the oxide film is a thin film or a thick film, the optical characteristics are different from those of the surroundings, so it is possible Changes in hue such as dark brown or white turbidity are visually recognized.

C.表面處理鋁材製造方法 C. Surface treatment aluminum manufacturing method

用以製造表面具備滿足以上條件之氧化皮膜的表面處理鋁材的方法之一,可列舉下述方法:使用可表面處理之鋁材的電極與相對電極,以pH9~13且液溫35~85℃之鹼性水溶液作為電解溶液,在頻率10~100Hz、電流密度4~50A/dm2及電解時間5~300秒鐘之條件下進行交流電解處理,藉此於與相對電極對向之鋁材表面形成氧化皮膜後,暴露在超過150℃之氣體環境下。 One of the methods for producing a surface-treated aluminum material having an oxide film on the surface that satisfies the above conditions includes the following methods: using an electrode and a counter electrode of a surface-treated aluminum material, at a pH of 9 to 13, and a liquid temperature of 35 to 85 An alkaline aqueous solution at ℃ is used as an electrolytic solution, and an alternating current electrolytic treatment is performed under the conditions of a frequency of 10 to 100 Hz, a current density of 4 to 50 A / dm 2 and an electrolysis time of 5 to 300 seconds. After an oxide film is formed on the surface, it is exposed to a gas environment exceeding 150 ° C.

在交流電解處理步驟中,作為電解溶液使用之鹼性水溶液可使用磷酸鈉、磷酸氫鉀、焦磷酸鈉、焦磷酸鉀及偏磷酸鈉等磷酸鹽;氫氧化鈉及氫氧化鉀等鹼金屬氫氧化物;碳酸鈉、碳酸氫鈉、碳酸鉀等碳酸鹽;氫氧化銨;或者是該等混合物之水溶液。基於如後述必須將電解溶液之pH保持在特定範圍,故宜使用含有可期望緩衝效果之磷酸鹽系物質的鹼性水溶液。該鹼性水溶液中所含鹼成分的濃度可調整成使電解溶液之pH得以成為期望值,通常為1×10-4~1莫耳/公升,理想為1×10-3~0.8莫耳/公升。而,於該等鹼性水溶液中,可添加界面活性劑以求提升對污垢成分之去除能力。 In the step of alternating current electrolytic treatment, the alkaline aqueous solution used as the electrolytic solution may use phosphates such as sodium phosphate, potassium hydrogen phosphate, sodium pyrophosphate, potassium pyrophosphate, and sodium metaphosphate; and alkali metal hydrogen such as sodium hydroxide and potassium hydroxide Oxides; carbonates such as sodium carbonate, sodium bicarbonate, potassium carbonate; ammonium hydroxide; or aqueous solutions of these mixtures. Since it is necessary to maintain the pH of the electrolytic solution within a specific range as described later, it is preferable to use an alkaline aqueous solution containing a phosphate-based substance with a desired buffering effect. The concentration of the alkali component contained in the alkaline aqueous solution can be adjusted so that the pH of the electrolytic solution becomes a desired value, usually 1 × 10 -4 to 1 mol / liter, and ideally 1 × 10 -3 to 0.8 mol / liter . In addition, in these alkaline aqueous solutions, a surfactant can be added to improve the ability to remove dirt components.

電解溶液之pH須設為9~13,且以設為9.5~12為佳。pH低於9時,電解溶液之鹼蝕刻力會不足而使多孔性鋁氧化皮膜層之多孔質結構變得不完全。另一方面,pH若超過13,鹼蝕刻力會變得過剩而使多孔性鋁氧化皮膜層難 以成長,進而亦阻礙障壁型鋁氧化皮膜層之形成。 The pH of the electrolytic solution must be set to 9 ~ 13, and preferably 9.5 ~ 12. When the pH is lower than 9, the alkali etching force of the electrolytic solution is insufficient, and the porous structure of the porous aluminum oxide film layer becomes incomplete. On the other hand, if the pH exceeds 13, the alkali etching force becomes excessive, making it difficult for the porous aluminum oxide film layer. To grow, it also hinders the formation of barrier-type aluminum oxide film layers.

電解溶液溫度須設為35~85℃,且以設為40~70℃為佳。電解溶液溫度一旦低於35℃,因鹼蝕刻力不足而使多孔性鋁氧化皮膜層之多孔質結構變得不完全。另一方面,若超過85℃,鹼蝕刻力則會過剩而阻礙多孔性鋁氧化皮膜層及障壁型鋁氧化皮膜層兩者之成長。 The temperature of the electrolytic solution should be set to 35 ~ 85 ° C, and preferably 40 ~ 70 ° C. Once the temperature of the electrolytic solution is lower than 35 ° C, the porous structure of the porous aluminum oxide film layer becomes incomplete due to insufficient alkali etching power. On the other hand, if it exceeds 85 ° C, the alkali etching force will be excessive and hinder the growth of both the porous aluminum oxide film layer and the barrier-type aluminum oxide film layer.

在鹼交流電解中,包含多孔性鋁氧化皮膜層及障壁型鋁氧化皮膜層之氧化皮膜整體的厚度係受電量即電流密度與電解時間之積所控制,基本上,電量愈多,氧化膜整體之厚度愈增加。從此觀點來看,多孔性鋁氧化皮膜層及障壁型鋁氧化皮膜層的交流電解條件如同下述。 In alkaline AC electrolysis, the overall thickness of the oxide film including the porous aluminum oxide film layer and the barrier-type aluminum oxide film layer is controlled by the amount of electricity, that is, the product of the current density and the electrolytic time. Basically, the more the electricity, the more the entire oxide film The thickness increases. From this viewpoint, the AC electrolytic conditions of the porous aluminum oxide film layer and the barrier-type aluminum oxide film layer are as follows.

用於交流電解之頻率為10~100Hz,且理想為20~90Hz。低於10Hz時,在電分解上直流的要素會提高,結果多孔性鋁氧化皮膜層之多孔質結構之形成便會無法進行,而成為密實結構。另一方面,若超過100Hz,由於陽極與陰極之反轉會過快,氧化皮膜整體之形成會極端遲緩,致使多孔性鋁氧化皮膜層及障壁型鋁氧化皮膜層在獲得預定厚度上均變得需要極長的時間。再者,交流電解之電解波形並無特別限定,可使用正弦波、矩形波、梯形波、三角波等波形。 The frequency used for AC electrolysis is 10 ~ 100Hz, and ideally 20 ~ 90Hz. When the frequency is lower than 10 Hz, the direct current factor is increased in the electrolysis. As a result, the formation of the porous structure of the porous aluminum oxide film layer cannot be performed, and a dense structure is formed. On the other hand, if it exceeds 100 Hz, the reverse of the anode and the cathode will be too fast, and the formation of the oxide film as a whole will be extremely slow. As a result, the porous aluminum oxide film layer and the barrier-type aluminum oxide film layer will both become predetermined thicknesses. It takes an extremely long time. Furthermore, the electrolytic waveform of AC electrolysis is not particularly limited, and waveforms such as a sine wave, a rectangular wave, a trapezoidal wave, and a triangular wave can be used.

電流密度設為4~50A/dm2且理想係5~45A/dm2。電流密度低於4A/dm2時,會優先僅形成障壁型鋁氧化皮膜層,故而無法獲得多孔性鋁氧化皮膜層。另一方面,若超過50A/dm2,電流會變得過大而難以控制多孔性鋁 氧化皮膜層及障壁型鋁氧化皮膜層之厚度,容易引起處理不均。 The current density is set to 4 to 50 A / dm 2 and ideally 5 to 45 A / dm 2 . When the current density is lower than 4 A / dm 2 , only a barrier-type aluminum oxide film layer is preferentially formed, so that a porous aluminum oxide film layer cannot be obtained. On the other hand, if it exceeds 50 A / dm 2 , the current becomes too large, and it is difficult to control the thickness of the porous aluminum oxide film layer and the barrier-type aluminum oxide film layer, which may cause uneven processing.

電解時間設為5~300秒且理想係10~240秒。這是因為,在低於5秒的處理時間下,多孔性鋁氧化皮膜層及障壁型鋁氧化皮膜層之形成會過度急遽而使任一氧化皮膜層均無法充分形成,而變成由不定形鋁氧化物所構成之氧化皮膜。另一方面,若超過300秒,多孔性鋁氧化皮膜層及障壁型鋁氧化皮膜層會變得過厚,有產生再溶解之虞,進而使生產性亦降低。 The electrolysis time is set to 5 to 300 seconds and ideally 10 to 240 seconds. This is because, under a processing time of less than 5 seconds, the formation of the porous aluminum oxide film layer and the barrier-type aluminum oxide film layer is excessively rapid, so that any oxide film layer cannot be fully formed, and it becomes an amorphous aluminum. An oxide film made of oxide. On the other hand, if it exceeds 300 seconds, the porous aluminum oxide film layer and the barrier-type aluminum oxide film layer become too thick, which may cause re-dissolution, and further reduce productivity.

另外,在上述製造方法中,因縮小氧化皮膜之厚度變動此一目的,將電解溶液中所含溶解鋁濃度設為5ppm以上且1000ppm以下為佳,且以設為10ppm以上且800ppm以下較佳。溶解鋁濃度低於5ppm時,電解反應初始的氧化皮膜形成反應會急遽引發,所形成之氧化皮膜厚度將會很容易受處理步驟中之落差諸如鋁材表面的污垢狀態或鋁材的安裝狀態等影響。其結果會局部性形成厚膜的氧化皮膜。另一方面,溶解鋁濃度超過1000ppm時,電解溶液之黏度會增大,在電解步驟中鋁材表面附近的均勻對流受到妨礙,同時溶解鋁會在抑制皮膜形成上起作用。其結果會局部性形成膜薄的氧化皮膜。溶解鋁濃度若超出上述範圍,將難以使鋁材表面整體之多孔性鋁氧化皮膜層與障壁型鋁氧化皮膜層之合計厚度的變動幅度在該合計厚度之算術平均值的±50%內,結果可能會招致獲得之氧化皮膜的接著力及密著力降低。 In addition, in the above manufacturing method, for the purpose of reducing the thickness variation of the oxide film, the dissolved aluminum concentration contained in the electrolytic solution is preferably 5 ppm or more and 1000 ppm or less, and more preferably 10 ppm or more and 800 ppm or less. When the dissolved aluminum concentration is less than 5ppm, the initial oxide film formation reaction of the electrolytic reaction will be initiated sharply, and the thickness of the formed oxide film will be easily affected by the drop in the processing steps such as the state of dirt on the aluminum surface or the installation state of the aluminum influences. As a result, a thick-film oxide film is locally formed. On the other hand, when the dissolved aluminum concentration exceeds 1000 ppm, the viscosity of the electrolytic solution will increase, and the uniform convection near the surface of the aluminum material will be hindered during the electrolytic step. At the same time, the dissolved aluminum will play a role in suppressing the formation of the film. As a result, a thin oxide film is locally formed. If the dissolved aluminum concentration exceeds the above range, it will be difficult to make the total thickness of the porous aluminum oxide film layer and the barrier-type aluminum oxide film layer on the entire surface of the aluminum material change within ± 50% of the arithmetic mean of the total thickness. It may cause a decrease in adhesion and adhesion of the obtained oxide film.

用於交流電解處理之一對電極中之其中一電極為應受電解處理的鋁材。另一個相對電極則例如可使用黑鉛、鋁、鈦電極等公知電極,惟在本發明中必須使用不會對電解溶液之鹼成分或溫度產生劣化、導電性佳並且其本身不會引起電化學反應之材質者。由此點看來,相對電極宜使用黑鉛電極。此乃因為黑鉛電極為化學性穩定,且容易以低價入手,再加上藉著存在於黑鉛電極的多數氣孔之作用,可使電力線在交流電解步驟中適度擴散,因此容易使多孔性鋁氧化皮膜層及障壁型鋁氧化皮膜層一起變得更為均勻。 One of the pair of electrodes used in the AC electrolytic treatment is an aluminum material which should be subjected to electrolytic treatment. As the other counter electrode, for example, well-known electrodes such as black lead, aluminum, and titanium electrodes can be used. However, in the present invention, it is necessary to use an electrode that does not deteriorate the alkaline composition or temperature of the electrolytic solution, has good conductivity, and does not cause electrochemical problems. Material of reaction. From this point of view, a black lead electrode should be used as the counter electrode. This is because the black lead electrode is chemically stable, and it is easy to start at a low price. In addition, by virtue of the majority of pores existing in the black lead electrode, the power line can be moderately diffused in the AC electrolysis step, so it is easy to make it porous The aluminum oxide film layer and the barrier-type aluminum oxide film layer become more uniform together.

本發明中,於應受電解處理的鋁材及相對電極宜一同使用平板狀者,並宜使對向的鋁材與相對電極之相對面彼此之縱橫尺寸大致相同,在靜止狀態下將兩電極進行電解操作。此時,可於與相對電極對向之鋁材的其一表面形成氧化皮膜。在此,如亦欲於不與相對電極對向之鋁材的另一表面形成氧化皮膜,則於其一表面形成氧化皮膜後暫時結束交流電解處理,接著將另一表面重新配置成與相對電極對向再以同樣方式進行交流電解處理即可。又,在鋁材形狀為板材以外之丸棒或角材的情況下,亦同樣地藉由在電解步驟中將不與相對電極對向之表面重新配置成與相對電極對向而重複電解步驟,便可於期望的表面形成氧化皮膜。 In the present invention, it is preferable to use a flat plate shape for the aluminum material and the opposite electrode that should be subjected to electrolytic treatment, and it is desirable to make the opposite sides of the opposite aluminum material and the opposite electrode have substantially the same horizontal and vertical dimensions. Perform electrolytic operation. At this time, an oxide film may be formed on one surface of the aluminum material facing the opposite electrode. Here, if it is also desired to form an oxide film on the other surface of the aluminum material that does not oppose the opposite electrode, the AC electrolytic treatment is temporarily ended after the oxide film is formed on one surface, and then the other surface is reconfigured to be opposite to the opposite electrode. The opposite direction may be subjected to AC electrolytic treatment in the same manner. Further, when the shape of the aluminum material is a pellet bar or a corner material other than a plate, the electrolysis step is repeated by re-arranging the surface that does not face the opposite electrode to face the opposite electrode in the electrolysis step. An oxide film can be formed on a desired surface.

藉由將以上述方式製得之鋁材暴露在超過150℃之氣體環境下,可有效去除氧化皮膜中所含水分。在150℃ 以下之溫度環境下,水蒸氣無法從多孔性鋁氧化皮膜層內部脫離,因而無法去除氧化皮膜之含有水分。再者,就氣體環境而言可使用大氣、氮或氬等惰性氣體、該等惰性氣體之混合氣體、以及大氣與惰性氣體之混合氣體等,惟從經濟性觀點來看以大氣為佳。又,欲暴露之氣體環境的相對濕度在50%以下為佳,在30%以下較佳。相對濕度若超過50%,可能無法有效去除氧化皮膜中所含水分。 By exposing the aluminum material obtained in the above manner to a gas environment exceeding 150 ° C, the water content in the oxide film can be effectively removed. At 150 ℃ Under the following temperature environment, water vapor cannot be detached from the inside of the porous aluminum oxide film layer, so the moisture contained in the oxide film cannot be removed. In addition, in terms of the gas environment, the atmosphere, inert gas such as nitrogen or argon, a mixed gas of these inert gases, and a mixed gas of the atmosphere and an inert gas can be used, but the atmosphere is preferred from the viewpoint of economy. The relative humidity of the gas environment to be exposed is preferably 50% or less, and more preferably 30% or less. If the relative humidity exceeds 50%, the moisture contained in the oxide film may not be effectively removed.

又,有關暴露在超過150℃之氣體環境下的時間,在令暴露時間為t(秒)、多孔性鋁氧化皮膜層之厚度為L(nm)且氣體環境溫度為T(℃)時,宜滿足t≧20×(L/T)之關係。此乃是根據氧化皮膜中所含水分的大部分呈吸附在多孔性鋁氧化皮膜層內部之假定所設之計算式,暴露時間係與多孔性鋁氧化皮膜層厚度成正比增多或與氣體環境溫度成反比減短者。在此,係數20係以實驗決定之常數。而,有關氣體環境溫度之上限值,理想為500℃,較理想為300℃。 In addition, regarding the time of exposure to a gas environment exceeding 150 ° C, it is desirable to set the exposure time to t (seconds), the thickness of the porous aluminum oxide film layer to L (nm), and the gas ambient temperature to T (° C). Meet the relationship of t ≧ 20 × (L / T). This is a calculation formula based on the assumption that most of the moisture in the oxide film is adsorbed inside the porous aluminum oxide film layer. The exposure time is proportional to the thickness of the porous aluminum oxide film layer or increases with the ambient temperature of the gas. Reduced inversely. Here, the coefficient 20 is a constant determined experimentally. The upper limit of the ambient temperature of the gas is preferably 500 ° C, and more preferably 300 ° C.

此外,有關超過150℃之氣體環境暴露,自交流電解處理結束起暴露在超過150℃之氣體環境下至已形成氧化皮膜之鋁材的表面溫度達到150℃為止的時間,宜在24小時以內,在12小時以內較佳。藉由交流電解步驟而生成之氧化皮膜中所攝取之水分,以雖極微量但仍會伴隨時間的經過而以Al2O3‧nH2O(n為1~3之整數)固定於氫氧化鋁。以此態樣固定於氫氧化鋁的水分有時很難藉由接連實施之超過150℃之氣體環境的暴露去除。交流電解處理係經 由電解處理-水洗-乾燥之各步驟而實施,上述24小時以內的開始時間點係設為已停止電解處理之電壓施加的時間點。另一方面,上述24小時以內的結束時間點則設為在業經交流電解處理之鋁材表面已接有熱電偶等溫度計之狀態下,將之暴露在超過150℃之氣體環境下並在溫度計顯示為150℃的時間點。通常,自暴露在超過150℃之氣體環境下開始起算,約60秒左右溫度計會顯示150℃。 In addition, for exposure to a gaseous environment exceeding 150 ° C, the time from the end of the alternating current electrolytic treatment to a temperature of more than 150 ° C until the surface temperature of the aluminum material on which the oxide film has formed reaches 150 ° C, preferably within 24 hours, Preferably within 12 hours. The moisture absorbed in the oxide film produced by the AC electrolysis step is fixed to the hydroxide with Al 2 O 3 ‧ nH 2 O (n is an integer of 1 to 3) in a very small amount, but it will be accompanied by the passage of time. aluminum. The moisture fixed to aluminum hydroxide in this state is sometimes difficult to remove by successive exposure to a gaseous environment exceeding 150 ° C. The alternating-current electrolytic treatment is carried out through each step of electrolytic treatment-washing-drying, and the starting time point within 24 hours is set to the time point when the voltage application of the electrolytic treatment has been stopped. On the other hand, the end time within 24 hours is set to the state that the surface of the aluminum material subjected to AC electrolysis treatment has been connected with a thermometer such as a thermocouple, and it is exposed to a gas environment exceeding 150 ° C and displayed on the thermometer. The time point is 150 ° C. Generally, from the beginning of exposure to a gas environment exceeding 150 ° C, the thermometer will display 150 ° C in about 60 seconds.

再者,本發明之多孔性鋁氧化皮膜層及障壁型鋁氧化皮膜層的結構觀察與厚度之測定,適宜使用以穿透型電子顯微鏡(TEM)所行之截面觀察。具體上,多孔性鋁氧化皮膜層及障壁型鋁氧化皮膜層之厚度、以及多孔性鋁氧化皮膜層之小孔直徑可藉由超薄切片機製作薄片試料,進行TEM觀察來測定。 Furthermore, for the structural observation and thickness measurement of the porous aluminum oxide film layer and the barrier-type aluminum oxide film layer of the present invention, cross-sectional observation by a transmission electron microscope (TEM) is suitably used. Specifically, the thickness of the porous aluminum oxide film layer and the barrier-type aluminum oxide film layer, and the pore diameter of the porous aluminum oxide film layer can be measured by making a thin sample with an ultra-thin microtome and performing TEM observation.

又,為了測定氧化皮膜中所含水分,可使用以熱脫附譜分析裝置(TDS-MS)所行之表面微量水分測定法等。具體上係在密閉槽中放入表面處理鋁材,在升溫速度10~60℃/分下加熱至比鋁材之固相線溫度低5~10℃的溫度。然後,藉由質量分析計分析加熱中產生的氣體成分,將質量數(m/z)18之成分予以定量化來測定。 In addition, in order to measure the water content in the oxide film, a surface trace moisture measurement method using a thermal desorption spectrum analyzer (TDS-MS) can be used. Specifically, the surface-treated aluminum material is placed in a closed tank, and heated to a temperature that is 5 to 10 ° C lower than the solidus temperature of the aluminum material at a heating rate of 10 to 60 ° C / min. Then, the gas component generated during heating was analyzed with a mass spectrometer, and the component with a mass number (m / z) of 18 was quantified and measured.

本發明中,可藉由交流電解處理步驟於鋁材的至少其一表面形成氧化皮膜,之後,以暴露在超過150℃之氣體環境下來減低前述至少其一的氧化皮膜之水分。使用板材作為鋁材時,可僅將其一面製成表面處理面,或可將兩面均製成表面處理面。又,即使在以板材以外之丸棒或角 材來作為鋁材的情況下,亦同樣可對期望之面施行電解處理及超過150℃之氣體環境暴露而將該面製成表面處理面。 In the present invention, an oxide film can be formed on at least one surface of the aluminum material through an AC electrolytic treatment step, and then the moisture of at least one of the foregoing oxide films can be reduced by exposure to a gas environment exceeding 150 ° C. When using a plate as an aluminum material, only one side can be made into a surface-treated surface, or both sides can be made into a surface-treated surface. Also, even with pill sticks or angles other than plates When aluminum is used as an aluminum material, the desired surface can be similarly subjected to electrolytic treatment and exposed to a gaseous environment exceeding 150 ° C. to form the surface as a surface-treated surface.

E.表面處理鋁材/樹脂層之接合體 E. Surface-treated aluminum / resin layer joint

藉由將樹脂層接合至本發明之表面處理鋁材之經表面處理之面,可獲得表面處理鋁材/樹脂層之接合體。使用之樹脂層用樹脂可採用各種熱塑性及熱硬化性樹脂。採用熱塑性樹脂時,可藉由使經加熱而成流動狀態之樹脂接觸‧浸透至多孔性鋁氧化皮膜層,接著加以冷卻固化而形成樹脂層。亦可取代以此種加熱固化所行之方法,使接著劑接觸‧浸透至多孔性鋁氧化皮膜層,透過該接著劑將樹脂層接合至表面處理鋁材。再者,接著劑可使用液狀型或熱熔型。 By bonding the resin layer to the surface-treated surface of the surface-treated aluminum material of the present invention, a surface-treated aluminum material / resin layer bonded body can be obtained. As the resin for the resin layer, various thermoplastic and thermosetting resins can be used. When a thermoplastic resin is used, the resin can be formed by contacting ‧ the resin which has been heated to a flowing state and soaking into the porous aluminum oxide film layer, followed by cooling and solidification. Instead of heating and curing, the adhesive can be contacted and penetrated into the porous aluminum oxide film layer, and the resin layer can be bonded to the surface-treated aluminum material through the adhesive. The adhesive may be a liquid type or a hot-melt type.

與本發明之表面處理鋁材之經表面處理之面接合之樹脂層所使用的樹脂,宜具有選自胺基、醯胺基、酯基、羧基、環氧基及羥基中之極性官能基之至少1種。 The resin used in the resin layer bonded to the surface-treated surface of the surface-treated aluminum material of the present invention preferably has a polar functional group selected from the group consisting of an amine group, a amine group, an ester group, a carboxyl group, an epoxy group, and a hydroxyl group. At least one.

藉由樹脂具有上述極性官能基,不僅有因樹脂浸滲至多孔性鋁氧化皮膜油然而生的定錨效果,極性官能基與氧化皮膜還可以庫侖力及/或氫鍵力相互吸引,而有優異的一次密著性。更由於形成於本發明之表面處理鋁材之表面處理面的氧化皮膜中所含水分在10μg/cm2以下,因此水分無法阻礙作為氧化皮膜與樹脂之接合界面之接合力的庫侖力及/或氫鍵力,而有優異的二次密著性。 Since the resin has the above-mentioned polar functional group, not only does the anchoring effect occur due to the resin impregnating the porous aluminum oxide film, the polar functional group and the oxide film can also attract each other by Coulomb force and / or hydrogen bonding force, and have Excellent primary adhesion. Furthermore, since the moisture content in the oxide film formed on the surface-treated surface of the surface-treated aluminum material of the present invention is 10 μg / cm 2 or less, the moisture cannot hinder the Coulomb force and / or the bonding force of the bonding interface between the oxide film and the resin. Hydrogen bonding, and excellent secondary adhesion.

與本發明之表面處理鋁材之經表面處理之面接合之樹脂層所使用的樹脂中,式1所示之數值即樹脂中之極 性官能基的存在比率在0.01以上且3.0以下為佳。 In the resin used for the resin layer bonded to the surface-treated surface of the surface-treated aluminum material of the present invention, the value shown in Formula 1 is the extreme value in the resin. The presence ratio of the sexual functional group is preferably 0.01 or more and 3.0 or less.

式1之分子係由源自胺基、醯胺基、酯基、羧基、環氧基及羥基之紅外線吸收光譜、其光譜出現之波數範圍及橫軸所包圍之區域的積分值。即,有規定存在於樹脂中之極性官能基的存在量。又,式1之分母係由源自脂肪族烴及苯環之紅外線吸收光譜、其光譜出現之波數範圍及橫軸所包圍之區域的積分值。具體上係如圖1中示意顯示為以下區域之積分值:由源自脂肪族烴及苯環之紅外線吸收光譜之線、通過顯示波數範圍之2835cm-1及2975cm-1的兩垂線及標示波數之橫軸線所包圍之區域;以及由源自脂肪族烴及苯環之紅外線吸收光譜之線、通過顯示波數範圍之1575cm-1及1625cm-1的兩垂線及標示波數之橫軸線所包圍之區域。還有,式1之分子之積分值亦是以此相同方式求得之區域的積分值。如此一來便規定了存在於樹脂中之極性官能基以外的存在量。亦即,式1係規定樹脂中相對於上述極性官能基之骨架結構的存在比率,其值愈大,即可稱該樹脂愈富有極性成分。 The molecule of Formula 1 is an integrated value of an infrared absorption spectrum derived from an amine group, a amine group, an ester group, a carboxyl group, an epoxy group, and a hydroxyl group, a wave number range in which the spectrum appears, and a region surrounded by the horizontal axis. That is, there is a predetermined amount of polar functional groups present in the resin. In addition, the denominator of Formula 1 is an integrated value of an infrared absorption spectrum derived from an aliphatic hydrocarbon and a benzene ring, a wave number range in which the spectrum appears, and a region surrounded by the horizontal axis. Specifically, it is shown in Figure 1 as the integral value of the following areas: from the line of infrared absorption spectrum derived from aliphatic hydrocarbons and benzene rings, through the two vertical lines and labels showing the wave number range of 2835cm -1 and 2975cm -1 The area enclosed by the horizontal axis of the wave number; and the line composed of the infrared absorption spectrum derived from the aliphatic hydrocarbon and the benzene ring, passing through two perpendicular lines showing the wave number range of 1575 cm -1 and 1625 cm -1 , and the horizontal axis indicating the wave number The area enclosed. In addition, the integral value of the numerator of Formula 1 is also the integral value of the area obtained in the same manner. In this way, the amount of the polar functional group existing in the resin is specified. That is, Formula 1 specifies the existence ratio of the skeleton structure of the resin with respect to the polar functional group, and the larger the value, the more polar the resin is.

式1所示之數值若在0.01以上且3.0以下,氧化皮膜與樹脂之極性官能基的界面藉由庫侖力及/或氫鍵力接合的界面結合力便會增加,且樹脂其本身之強度會增加,因而可提升一次密著性及二次密著性。 If the value shown in Formula 1 is 0.01 or more and 3.0 or less, the interfacial bonding force of the interface between the oxide film and the polar functional group of the resin by Coulomb force and / or hydrogen bonding force will increase, and the strength of the resin itself will increase. Increased, thereby improving primary adhesion and secondary adhesion.

就熱塑性樹脂而言,例如可使用聚烯烴(聚乙烯、聚丙烯等)、聚氯乙烯、聚酯(聚對苯二甲酸乙二酯、聚對苯二甲酸丁二酯等)、聚醯胺、聚苯硫、芳香族聚醚酮(聚 醚醚酮、聚醚酮等)、聚苯乙烯、各種氟樹脂(聚四氟乙烯、聚氯三氟乙烯等)、乙烯-(甲基)丙烯酸共聚物、丙烯-(甲基)丙烯酸共聚物、丙烯酸樹脂(聚甲基丙烯酸甲酯等)、ABS樹脂、聚碳酸酯、熱塑性聚醯亞胺等。理想為聚酯、聚醯胺、乙烯-(甲基)丙烯酸共聚物、丙烯-(甲基)丙烯酸共聚物、熱塑性聚醯亞胺。 As the thermoplastic resin, for example, polyolefin (polyethylene, polypropylene, etc.), polyvinyl chloride, polyester (polyethylene terephthalate, polybutylene terephthalate, etc.), polyamine , Polyphenylene sulfide, aromatic polyetherketone (poly Ether ether ketone, polyether ketone, etc.), polystyrene, various fluororesins (polytetrafluoroethylene, polychlorotrifluoroethylene, etc.), ethylene- (meth) acrylic copolymer, propylene- (meth) acrylic copolymer , Acrylic resin (polymethyl methacrylate, etc.), ABS resin, polycarbonate, thermoplastic polyimide, etc. Preferred are polyester, polyamide, ethylene- (meth) acrylic copolymer, propylene- (meth) acrylic copolymer, and thermoplastic polyimide.

又,使用熱硬化性樹脂時,使硬化前具有流動性之狀態的樹脂接觸‧浸透至多孔性鋁氧化皮膜層,接著使其硬化即可。又,亦可取代以此種硬化所行之方法,與熱塑性樹脂同樣地使液狀型或熱熔型的接著劑接觸‧浸透至多孔性鋁氧化皮膜層,再透過該接著劑使樹脂層與表面處理鋁材接合。就熱硬化性樹脂而言,例如可使用苯酚樹脂、環氧樹脂、三聚氰胺樹脂、尿素樹脂、不飽和聚酯樹脂、醇酸樹脂、聚胺甲酸乙酯、熱硬化性聚醯亞胺等。 In the case of using a thermosetting resin, the resin having a fluid state before curing may be contacted and impregnated into the porous aluminum oxide film layer, followed by curing. Alternatively, instead of the hardening method, the liquid or hot-melt adhesive can be contacted and penetrated into the porous aluminum oxide film layer in the same manner as the thermoplastic resin, and the resin layer and the resin layer can be penetrated through the adhesive. Surface treatment aluminum bonding. Examples of the thermosetting resin include phenol resin, epoxy resin, melamine resin, urea resin, unsaturated polyester resin, alkyd resin, polyurethane, and thermosetting polyimide.

再者,上述熱可塑性樹脂或熱硬化性樹脂可單獨使用,亦可以混合多種熱塑性樹脂或混合多種熱硬化性樹脂之聚合物摻合物來使用。此外,亦可藉由添加各種填料來改善樹脂之強度或熱膨脹率等物性。具體上可使用玻璃纖維、碳纖維、聚芳醯胺纖維等各種纖維或碳酸鈣、碳酸鎂、二氧化矽、滑石、玻璃、黏土等公知填料。 The thermoplastic resin or the thermosetting resin may be used alone, or a plurality of thermoplastic resins or a polymer blend of a plurality of thermosetting resins may be used in combination. In addition, by adding various fillers, physical properties such as the strength and thermal expansion coefficient of the resin can be improved. Specifically, various fibers such as glass fibers, carbon fibers, and polyaramide fibers, or well-known fillers such as calcium carbonate, magnesium carbonate, silicon dioxide, talc, glass, and clay can be used.

實施例 Examples

以下將依據實施例及比較例具體說明本發明的適當實施形態。 Hereinafter, suitable embodiments of the present invention will be specifically described based on examples and comparative examples.

實施例1~33及比較例1~12 Examples 1 to 33 and Comparative Examples 1 to 12

作為鋁材係使用縱200mm×橫400mm×板厚1.0mm之JIS5052-H34合金的平板。使用該鋁合金板為其一之電極,於相對電極則使用具有縱300mm×橫500mm×板厚2.0mm之平板形狀的黑鉛板。使鋁合金板之一面與相對電極面對面,並於該面對面之一面表層配置兩電極以形成表面側之多孔性鋁氧化皮膜層與基質側之障壁型鋁氧化皮膜層。使用以焦磷酸鈉為主成分之鹼水溶液作為電解溶液。電解溶液之鹼成分濃度設為0.5莫耳/公升,同時藉由鹽酸及氫氧化鈉水溶液(均為濃度0.1莫耳/公升)來進行pH之調整。在表1、2中所示之電解條件下實施交流電解處理以形成多孔性鋁氧化皮膜層及障壁型鋁氧化皮膜層,同時在表1、2所示條件下進行超過150℃之大氣環境中的暴露。還有,比較例11中係將大氣環境溫度設為小於150℃,比較例12中則未進行氣體環境暴露。表中,「交流電解步驟後達到150℃的經過時間」係以已停止電解處理之電壓施加的時間點為起點算至鋁材表面達到150℃為止的時間。依上述進行,來製備於鋁材之一面形成有由多孔性鋁氧化皮膜層及障壁型鋁氧化皮膜層所構成之氧化皮膜的供試材。 As the aluminum material, a JIS5052-H34 alloy flat plate having a length of 200 mm × a width of 400 mm × a plate thickness of 1.0 mm was used. This aluminum alloy plate was used as one of the electrodes, and a black lead plate having a flat plate shape of 300 mm in length × 500 mm in width × 2.0 mm in thickness was used as the counter electrode. One surface of the aluminum alloy plate and the opposite electrode face each other, and two electrodes are arranged on the surface of the one surface to form a porous aluminum oxide film layer on the surface side and a barrier type aluminum oxide film layer on the substrate side. An alkaline aqueous solution containing sodium pyrophosphate as a main component was used as the electrolytic solution. The alkali component concentration of the electrolytic solution was set to 0.5 mol / liter, and the pH was adjusted by using hydrochloric acid and an aqueous sodium hydroxide solution (both at a concentration of 0.1 mol / liter). AC electrolytic treatment was performed under the electrolytic conditions shown in Tables 1 and 2 to form a porous aluminum oxide film layer and a barrier-type aluminum oxide film layer. At the same time, it was subjected to an atmospheric environment exceeding 150 ° C under the conditions shown in Tables 1 and 2. Of exposure. In Comparative Example 11, the atmospheric environment temperature was set to less than 150 ° C. In Comparative Example 12, no exposure to gaseous environment was performed. In the table, "elapsed time to reach 150 ° C after the AC electrolysis step" refers to the time taken until the surface of the aluminum material reaches 150 ° C, starting from the time point when the voltage application of the electrolytic treatment has been stopped. According to the above, a test material is prepared in which an oxide film composed of a porous aluminum oxide film layer and a barrier-type aluminum oxide film layer is formed on one side of the aluminum material.

[表1] [Table 1]

[表2] [Table 2]

接下來,對上述方式製備之供試材實施以TEM所行之截面觀察以及以TDS-MS所行之水分量測定。在TEM截面觀察中,為了測定多孔性鋁氧化皮膜層與障壁型鋁氧化皮膜層之厚度以及多孔性鋁氧化皮膜層的小孔直徑,係使用超薄切片機自供試材製備截面觀察用薄片試料。接著,以TEM截面觀察該薄片試料,在觀察視野(1μm×1μm)中之任意10點中,在各點測定多孔性鋁氧化皮膜層與障壁型鋁氧化皮膜層之厚度以及多孔性鋁氧化皮膜層的小孔直徑,並以各算術平均值作為測定結果。又,在TDS-MS測定中,將升溫速度設定為30℃/分,升溫至620℃後測定水分子之每單位面積的存在量。 Next, the test materials prepared in the above manner were subjected to cross-sectional observation by TEM and water content measurement by TDS-MS. In the TEM section observation, in order to determine the thickness of the porous aluminum oxide film layer and the barrier-type aluminum oxide film layer, and the pore diameter of the porous aluminum oxide film layer, a thin section slice was prepared from a test material using an ultra-thin slicer. Sample. Next, the thin sample was observed with a TEM cross section, and the thickness of the porous aluminum oxide film layer and the barrier aluminum oxide film layer and the porous aluminum oxide film were measured at each of 10 points in the observation field (1 μm × 1 μm). The pinhole diameter of the layer was determined by taking each arithmetic mean as the measurement result. In the TDS-MS measurement, the temperature increase rate was set to 30 ° C / min, and the temperature was increased to 620 ° C to measure the amount of water molecules present per unit area.

此外,為了檢查供試材整體表面之多孔性鋁氧化皮膜與障壁型鋁氧化皮膜的合計厚度變動,進行追加的截面TEM觀察。即,有別於先前製備之薄片試料另行且依同 樣方式,藉由超薄切片機另行製作9個薄片試料。然後針對該等9個薄片試料分別測定10點多孔性鋁氧化皮膜層與障壁型鋁氧化皮膜層之厚度。接著,自全部計10個之上述薄片試料之共100點的多孔性鋁氧化皮膜層與障壁型鋁氧化皮膜層之厚度測定結果,將各點之多孔性鋁氧化皮膜層與障壁型鋁氧化皮膜層之厚度相加求出合計厚度,以之為各點之氧化皮膜厚度。以此方式求出之100點的氧化皮膜厚度之最大值、最小值及算術平均值顯示於表3、4之「氧化皮膜的整體厚度」欄中。還有,亦針對該等100點之氧化皮膜厚度的變動幅度是否在算術平均值的±50%以內進行檢查。具體上,令算術平均值為T(nm)時,包含最大值及最小值的全部合計厚度均在(0.5×T)~(1.5×T)之範圍時視為○,未在範圍時則視為×。 In addition, in order to check the total thickness variation of the porous aluminum oxide film and the barrier-type aluminum oxide film on the entire surface of the test material, an additional cross-sectional TEM observation was performed. That is, it is different from the previously prepared thin sample. In the same way, another 9 thin sample samples were made by the ultra-thin microtome. Then, the thickness of the porous aluminum oxide film layer and the barrier-type aluminum oxide film layer was measured at 10 points for the 9 thin sample samples. Next, from the measurement results of the thickness of the porous aluminum oxide film layer and the barrier-type aluminum oxide film layer of a total of 100 points of all the above-mentioned thin sample samples, the porous aluminum oxide film layer and the barrier-type aluminum oxide film at each point were measured. The thicknesses of the layers are added to obtain the total thickness, which is the thickness of the oxide film at each point. The maximum, minimum, and arithmetic mean values of the thickness of the oxide film at 100 points obtained in this way are shown in the columns of "the overall thickness of the oxide film" in Tables 3 and 4. In addition, it is also checked whether the fluctuation range of the oxide film thickness at these 100 points is within ± 50% of the arithmetic mean. Specifically, when the arithmetic average value is T (nm), all the total thicknesses including the maximum value and the minimum value are considered to be ○ when they are in the range of (0.5 × T) to (1.5 × T). Is ×.

[表3] [table 3]

[表4] [Table 4]

又,評估了樹脂中之極性官能基的存在率。即,使用測定波數範圍4000cm-1~650cm-1、分解能1cm-1之傅立葉轉換型分光硬度計測出樹脂之紅外線吸收光譜。接著將所測得之紅外線吸收光譜與其光譜出現之波數範圍及橫軸包圍的區域,以1cm-1間隔利用梯形法進行數值積分求出其面積。將所得積分值代入式1算出其值,藉以評估樹脂中之極性官能基的存在率。結果顯示於表5~7。 Moreover, the existence rate of the polar functional group in the resin was evaluated. That is, the infrared absorption spectrum of the resin was measured using a Fourier transform type spectro hardness tester having a measurement wave number range of 4000 cm -1 to 650 cm -1 and a decomposition energy of 1 cm -1 . Next, the area of the measured infrared absorption spectrum and the wave number range in which the spectrum appears and the area surrounded by the horizontal axis are numerically integrated using a trapezoid method at intervals of 1 cm -1 . The obtained integrated value was substituted into Equation 1 to calculate the value, thereby evaluating the existence rate of the polar functional group in the resin. The results are shown in Tables 5-7.

此外,針對上述供試材以下述方法評估使用接著劑之密著性。 Moreover, the adhesiveness using the adhesive was evaluated about the said test material by the following method.

[一次密著性試驗] [One adhesion test]

自上述供試材準備2片已切斷為長50mm且寬25mm者。將該等2片供試材之經表面處理之面彼此沿總寬度方向於長度方向以10mm之幅度重疊,並於其間夾持樹脂層而製 備接合體。用於樹脂層之樹脂係選自市售之2液型環氧接著劑(主劑=改質環氧樹脂、硬化劑=改質聚醯亞胺、重量混合比=主劑100/硬化劑100)、聚乙烯、聚酯及乙烯-甲基丙烯酸共聚物之樹脂或其混合物。製備此種接合體之剪切試驗片。利用拉伸試驗機在100mm/分之速度下將2片供試材之長度方向的各端部沿長度方向朝反方向拉伸,依據其荷重(換算成剪切應力)與剝離狀態以下述基準評估密著性。再者,剪切試驗片係從相同的供試材製備10組試驗片並各自予以評估。 Two pieces prepared from the above test materials were cut to a length of 50 mm and a width of 25 mm. The two surface-treated surfaces of the two test materials are overlapped with each other along the total width direction and the length direction by 10 mm, and a resin layer is sandwiched therebetween. Prepare joints. The resin used for the resin layer is selected from commercially available two-component epoxy adhesives (main agent = modified epoxy resin, hardener = modified polyimide, weight mixing ratio = main agent 100 / hardener 100 ), Polyethylene, polyester and ethylene-methacrylic acid copolymer resins or mixtures thereof. A shear test piece of such an assembly was prepared. At the speed of 100 mm / min, each end of the longitudinal direction of the two pieces of test material was stretched in the opposite direction in the longitudinal direction by a tensile tester. Assess adhesion. In addition, the shear test piece was prepared from the same test material in 10 groups and evaluated each.

○:剪切應力為20N/mm2以上且接著劑層本身呈內聚破壞之狀態 ○: Shear stress is 20 N / mm 2 or more, and the adhesive layer itself is in a state of cohesive failure.

△:雖然剪切應力為20N/mm2以上,但接著劑層與供試材呈界面剝離之狀態 △: Although the shear stress is 20 N / mm 2 or more, the interface between the adhesive layer and the test material is peeled off

×:剪切應力小於20N/mm2且接著劑層與供試材呈界面剝離之狀態 ×: Shear stress is less than 20 N / mm 2 and the interface between the adhesive layer and the test material is peeled off

結果顯示於表5、6。同表中係分別顯示10組試驗片中之上述○、△、×之組數,全部為○之情況判定為合格,此以外之情況則判定為不合格。 The results are shown in Tables 5 and 6. In the same table, the numbers of the above-mentioned ○, △, and × in each of the 10 test pieces are displayed, and when all of them are ○, it is judged to be a pass;

[表5] [table 5]

[表6] [TABLE 6]

[表7] [TABLE 7]

[長期穩定性試驗] [Long-term stability test]

製作與上述一次密著性試驗同樣的剪切試驗片,在85℃環境下放置2000小時後,實施與一次密著性試驗同樣的試驗並就各自加以評估。 A shear test piece similar to the one adhesion test was prepared, and after being left in an environment of 85 ° C. for 2000 hours, the same test as the one adhesion test was performed, and each was evaluated.

○:剪切應力為20N/mm2以上且接著劑層本身呈內聚破壞之狀態 ○: Shear stress is 20 N / mm 2 or more, and the adhesive layer itself is in a state of cohesive failure.

△:雖然剪切應力為20N/mm2以上,但接著劑層與供 試材呈界面剝離之狀態 △: Although the shear stress is 20 N / mm 2 or more, the interface between the adhesive layer and the test material is peeled off

×:剪切應力小於20N/mm2且接著劑層與供試材呈界面剝離之狀態 ×: Shear stress is less than 20 N / mm 2 and the interface between the adhesive layer and the test material is peeled off

結果顯示於表5、6。於同表係分別顯示10組試驗片中之上述○、△、×之組數,惟○為5以上且×為0之情況判定為合格,其以外之情況則判定為不合格。 The results are shown in Tables 5 and 6. In the same table system, the number of the above-mentioned ○, △, and × in each of the 10 test pieces is displayed, but the case where ○ is 5 or more and × is 0 is judged as a pass, and the cases other than that are judged as unacceptable.

在實施例1~33中,由於氧化皮膜滿足本發明規定,因此一次密著性及長期穩定性均判定為合格。相對於此,在比較例1~12中則由下述理由判定為不合格。 In Examples 1 to 33, since the oxide film met the requirements of the present invention, both primary adhesion and long-term stability were judged to be acceptable. On the other hand, in Comparative Examples 1 to 12, it was judged to be unacceptable for the following reasons.

比較例1中,由於交流電解處理中電解溶液的pH過低,因此鹼蝕刻力不足。所以,多孔性鋁氧化皮膜層之小孔直徑不足,一次密著性及長期穩定性不合格。 In Comparative Example 1, since the pH of the electrolytic solution was too low during the AC electrolytic treatment, the alkali etching power was insufficient. Therefore, the pore diameter of the porous aluminum oxide film layer is insufficient, and the primary adhesion and long-term stability are unqualified.

比較例2中,由於交流電解處理中電解溶液的pH過高,因此鹼蝕刻力變得過剩。所以,多孔性鋁氧化皮膜層及障壁型鋁氧化皮膜層之厚度不足,爰此無溶解鋁之效果,合計厚度的變動幅度無法收斂在±50%以內。又,多孔性鋁氧化皮膜層之小孔直徑過大,結果,一次密著性及長期穩定性不合格。 In Comparative Example 2, since the pH of the electrolytic solution was too high during the AC electrolytic treatment, the alkali etching force became excessive. Therefore, the thickness of the porous aluminum oxide film layer and the barrier-type aluminum oxide film layer is insufficient, so there is no effect of dissolving aluminum, and the variation range of the total thickness cannot converge within ± 50%. In addition, the pore diameter of the porous aluminum oxide film layer was too large. As a result, the primary adhesion and long-term stability were unsatisfactory.

比較例3中,由於交流電解處理中電解溶液的溫度過低,因此鹼蝕刻力不足。所以,多孔性鋁氧化皮膜層之多孔質結構不完全、小孔直徑不足、且一次密著性及長期穩定性不合格。 In Comparative Example 3, since the temperature of the electrolytic solution was too low during the AC electrolytic treatment, the alkali etching force was insufficient. Therefore, the porous aluminum oxide film layer has incomplete porous structure, insufficient small pore diameter, and unsatisfactory primary adhesion and long-term stability.

比較例4中,由於交流電解處理中電解溶液的溫度過高,因此鹼蝕刻力過剩。所以,多孔性鋁皮膜層及障 壁型鋁氧化皮膜層之厚度不足,爰此無溶解鋁之效果,合計厚度的變動幅度無法收斂在±50%以內。結果,一次密著性及長期穩定性不合格。 In Comparative Example 4, since the temperature of the electrolytic solution was too high during the AC electrolytic treatment, the alkali etching force was excessive. Therefore, porous aluminum coatings and barriers The thickness of the wall-type aluminum oxide film layer is insufficient, so there is no effect of dissolving aluminum, and the fluctuation range of the total thickness cannot converge within ± 50%. As a result, the primary adhesion and long-term stability were unsatisfactory.

比較例5中,由於交流電解處理之頻率過低,因此電性狀態近似直流電解。所以,多孔性鋁氧化皮膜層之形成無法進行,障壁型鋁氧化皮膜層之厚度變得過大。所以,一次密著性及長期穩定性不合格。 In Comparative Example 5, since the frequency of the AC electrolytic treatment is too low, the electrical state is approximately DC electrolytic. Therefore, the formation of the porous aluminum oxide film layer cannot be performed, and the thickness of the barrier aluminum oxide film layer becomes too large. Therefore, the primary adhesion and long-term stability were unsatisfactory.

比較例6中,由於交流電解處理中頻率過高,因此陽極與陰極之反轉過快。所以,多孔性鋁氧化皮膜層之形成極端遲緩,其厚度不足,一次密著性及長期穩定性不合格。 In Comparative Example 6, since the frequency was too high in the AC electrolytic treatment, the anode and cathode reversed too quickly. Therefore, the formation of the porous aluminum oxide film layer is extremely slow, its thickness is insufficient, and the primary adhesion and long-term stability are unqualified.

比較例7中,由於交流電解處理中電流密度過低,因此優先形成了障壁型鋁氧化皮膜層。所以,多孔性鋁氧化皮膜層之厚度不足,一次密著性及長期穩定性不合格。 In Comparative Example 7, since the current density was too low during the AC electrolytic treatment, a barrier-type aluminum oxide film layer was preferentially formed. Therefore, the thickness of the porous aluminum oxide film layer is insufficient, and the primary adhesion and long-term stability are unacceptable.

比較例8中,由於交流電解處理中電流密度過高,因此在電解處理時於電解溶液中產生電火花等,控制變得不穩定。所以,氧化皮膜整體過剩形成,多孔性鋁氧化皮膜層及障壁型鋁氧化皮膜層之厚度過大,另一方面亦產生了氧化皮膜合計厚度極端減少的部分。爰此無溶解鋁之效果,合計厚度的變動幅度無法收斂在±50%以內。其結果一次密著性及長期穩定性即不合格。 In Comparative Example 8, since the current density was too high in the AC electrolytic treatment, electric sparks or the like were generated in the electrolytic solution during the electrolytic treatment, and the control became unstable. Therefore, the oxide film is formed as a whole in excess, and the thickness of the porous aluminum oxide film layer and the barrier-type aluminum oxide film layer is too large. On the other hand, the total thickness of the oxide film is extremely reduced.爰 There is no effect of dissolving aluminum, and the fluctuation range of the total thickness cannot converge within ± 50%. As a result, the primary adhesion and long-term stability were unacceptable.

比較例9中,由於交流電解處理中電解處理時間過短,因此多孔性鋁氧化皮膜層及障壁型鋁氧化皮膜層無 法充分形成。所以,多孔性鋁氧化皮膜層及障壁型鋁氧化皮膜層之厚度不足,一次密著性及長期穩定性不合格。 In Comparative Example 9, since the electrolytic treatment time was too short in the AC electrolytic treatment, the porous aluminum oxide film layer and the barrier-type aluminum oxide film layer were not present. Law is fully formed. Therefore, the thickness of the porous aluminum oxide film layer and the barrier-type aluminum oxide film layer is insufficient, and the primary adhesion and long-term stability are unqualified.

比較例10中,由於交流電解處理中電解處理時間過長,因此氧化膜整體過剩形成。所以,多孔性鋁氧化皮膜層及障壁型鋁氧化皮膜層變得過厚,一次密著性及長期穩定性不合格。 In Comparative Example 10, since the electrolytic treatment time was too long in the AC electrolytic treatment, the entire oxide film was excessively formed. Therefore, the porous aluminum oxide film layer and the barrier-type aluminum oxide film layer become too thick, and the primary adhesion and long-term stability are unacceptable.

比較例11及12中,由於多孔性鋁氧化皮膜層及障壁型鋁氧化皮膜層之形狀滿足本發明規定,因此一次密著性佳。然而,由於比較例11中電解處理後之氣體環境暴露的溫度過低,在比較例12中則未進行氣體環境暴露,因此無法去除氧化皮膜中所含水分,長期穩定性不合格。 In Comparative Examples 11 and 12, since the shapes of the porous aluminum oxide film layer and the barrier-type aluminum oxide film layer satisfy the requirements of the present invention, the primary adhesion is good. However, since the temperature of the gas environment exposure after the electrolytic treatment in Comparative Example 11 was too low, and the gas environment exposure was not performed in Comparative Example 12, the moisture contained in the oxide film could not be removed, and the long-term stability was unacceptable.

產業上之可利用性 Industrial availability

依據本發明,可穩定獲得涵蓋鋁材整面均為接著性及密著性優異且可長期維持該特性之表面處理鋁材、以及使用其之與樹脂層的接合體。 According to the present invention, it is possible to stably obtain a surface-treated aluminum material covering the entire surface of the aluminum material, which is excellent in adhesion and adhesion, and can maintain this characteristic for a long period of time, and a bonded body with the resin layer using the same.

Claims (7)

一種表面處理鋁材,其特徵在於:含有鋁材及形成於其至少任一表面的氧化皮膜;前述氧化皮膜係由:形成於表面側且厚度20~500nm的多孔性鋁氧化皮膜層、與形成於基質側且厚度3~30nm的障壁型鋁氧化皮膜層構成,於前述多孔性鋁氧化皮膜層形成有直徑5~30nm之小孔,且前述氧化皮膜中所含水分在10μg/cm2以下。A surface-treated aluminum material, comprising: an aluminum material and an oxide film formed on at least one of the surfaces thereof; the oxide film is composed of a porous aluminum oxide film layer formed on the surface side and having a thickness of 20 to 500 nm; and A barrier-type aluminum oxide film layer with a thickness of 3 to 30 nm is formed on the substrate side, small holes having a diameter of 5 to 30 nm are formed in the porous aluminum oxide film layer, and the moisture content in the oxide film is 10 μg / cm 2 or less. 如請求項1之表面處理鋁材,其中前述多孔性鋁氧化皮膜層與障壁型鋁氧化皮膜層之合計厚度的變動幅度在該合計厚度之算術平均值的±50%以內。For example, the surface-treated aluminum material of claim 1, wherein the variation in the total thickness of the porous aluminum oxide film layer and the barrier-type aluminum oxide film layer is within ± 50% of the arithmetic mean of the total thickness. 一種表面處理鋁材之製造方法,係製造如請求項1之表面處理鋁材的方法,其特徵在於:使用可表面處理之鋁材電極與相對電極,以pH9~13且液溫35~85℃之鹼性水溶液作為電解溶液,在頻率10~100Hz、電流密度4~50A/dm2及電解時間5~300秒鐘之條件下進行交流電解處理,藉此於與相對電極對向之前述鋁材表面形成氧化皮膜,並且,從交流電解處理結束後,至暴露於超過150℃之氣體環境而形成有氧化皮膜之鋁材表面溫度達到150℃為止的時間係在24小時以內。A method for manufacturing a surface-treated aluminum material is a method for manufacturing a surface-treated aluminum material as described in claim 1, characterized in that a surface-treated aluminum material electrode and a counter electrode are used, with a pH of 9 to 13 and a liquid temperature of 35 to 85 ° C. An alkaline aqueous solution is used as an electrolytic solution, and an alternating current electrolytic treatment is performed under the conditions of a frequency of 10 to 100 Hz, a current density of 4 to 50 A / dm 2 and an electrolysis time of 5 to 300 seconds. An oxide film is formed on the surface, and the time from the end of the AC electrolytic treatment to the surface temperature of the aluminum material where the oxide film is formed when exposed to a gas environment exceeding 150 ° C is within 24 hours. 如請求項3之表面處理鋁材之製造方法,其中前述鹼性水溶液之電解溶液含有5ppm以上且1000ppm以下之溶解鋁。The method for manufacturing a surface-treated aluminum material according to claim 3, wherein the electrolytic solution of the aforementioned alkaline aqueous solution contains 5 ppm or more and 1000 ppm or less of dissolved aluminum. 如請求項3或4之表面處理鋁材之製造方法,其令多孔性鋁氧化皮膜層厚度為L(nm)及氣體環境溫度為T(℃)時,前述暴露在超過150℃之氣體環境下的時間t(秒)滿足t≧20×(L/T)之關係。For example, if the method for manufacturing a surface-treated aluminum material according to claim 3 or 4 makes the thickness of the porous aluminum oxide film layer L (nm) and the gas environment temperature T (° C), the aforementioned exposure to a gas environment exceeding 150 ° C The time t (second) satisfies the relationship of t ≧ 20 × (L / T). 如請求項3或4之表面處理鋁材之製造方法,其中前述氣體環境之相對濕度在50%以下。For example, the method for manufacturing a surface-treated aluminum material according to claim 3 or 4, wherein the relative humidity of the aforementioned gas environment is 50% or less. 一種表面處理鋁材/樹脂層之接合體,其特徵在於:於如請求項1或2之表面處理鋁材之經表面處理的表面接合有樹脂層,前述樹脂層之樹脂具有選自胺基、醯胺基、酯基、羧基、環氧基及羥基之極性官能基之至少1種,並且,前述樹脂之紅外線吸收光譜中,波數ν cm-1下之吸收率以I(ν)表示時,下述式1在0.01以上且3.0以下: A bonded body of a surface-treated aluminum material / resin layer, characterized in that a resin layer is bonded to the surface-treated surface of the surface-treated aluminum material as claimed in claim 1 or 2, wherein the resin of the resin layer has a material selected from the group consisting of amine groups, At least one kind of polar functional group of amine group, ester group, carboxyl group, epoxy group and hydroxyl group, and in the infrared absorption spectrum of the resin, when the absorptivity at wave number ν cm -1 is expressed as I (ν) , The following formula 1 is 0.01 or more and 3.0 or less:
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