TWI635270B - Interleaved acousto-optical device scanning for suppression of optical crosstalk - Google Patents

Abstract

One method of scanning samples involves forming multiple collinear scans simultaneously. Each scan is formed by an acousto-optic device (AOD) scanning one spot by one spot. The collinear scans are separated by a predetermined interval. The first plurality of scanning bands are formed by repeating the simultaneous formation of the collinear scans in a direction perpendicular to one of the plurality of collinear scans. The first plurality of scanning bands have an interval between scanning bands which is the same as the predetermined interval. A second plurality of scanning bands may be formed adjacent to the first plurality of scanning bands. Forming the second plurality of scanning bands may be performed in a direction opposite to the direction of the first plurality of scanning bands or in the same direction. An inspection system can implement this method by including a diffractive optical element (DOE) path after a magnification changer.

Description

Scanning of staggered acousto-optic device for suppressing optical crosstalk

The invention describes the scanning technology and system of an acousto-optic device for suppressing optical crosstalk.

During semiconductor fabrication, isolation and / or system defects can be formed on the wafer. Isolation defects, which are present on the wafer at a low wafer percentage, can be caused by random events, such as an increase in one of the particulate contaminants in a manufacturing environment or an increase in one of the contaminations in process chemicals used in the fabrication of the wafer. System defects, which typically exist on the wafer at a high wafer percentage, can be caused by defects on a photomask. A photomask is used to transfer a pattern of an integrated circuit layer onto a wafer using photolithography technology. Therefore, any defect on the photomask can be transferred to each wafer of the wafer together with the pattern. Automated inspection systems have been developed to inspect a wafer surface (both unpatterned and patterned). An inspection system usually includes an irradiation system and a detection system. The illumination system may include a light source (eg, a laser) for generating a light beam and a device for focusing and scanning the light beam. Defects present on the wafer surface can scatter incident light provided by an illumination system (also known as an illuminator). The detection system is configured to detect scattered light and convert the detected light into an electrical signal that can be measured, counted, and displayed. The detected signals can be analyzed by a computer program to locate and identify defects on the wafer. Exemplary inspection systems are described in the following patents: U.S. Patent 4,391,524 issued to Steigmeier et al. On July 5, 1983; U.S. Patent 4,441,124 issued to Heebner et al. On April 3, 1984; and issued on September 30, 1986 Koizumi et al., U.S. Patent 4,614,427, U.S. Patent 4,889,998, issued to Hayano, et al. On December 26, 1989, and U.S. Patent 5,317,380, issued to Allemand on May 31, 1994, all of which are incorporated herein by reference. in. Acousto-optic devices can be used for one or more components used in a state-of-the-art illumination system. For example, FIG. 1A illustrates a simplified configuration of one of an acousto-optic device (AOD) 100. The AOD 100 includes a sound transducer 121, a quartz plate 122 and an sound absorber 123. An oscillating electrical signal can drive the sound transducer 121 and cause it to vibrate. This vibration then forms an acoustic wave in the quartz plate 122. The sound absorber 123 is configured to absorb any sound waves reaching the edge of the quartz plate 122. Due to these sound waves, the incoming light 124 to the quartz plate 122 is diffracted into a plurality of directions 128, 129, and 130. The diffracted light beam is emitted from the quartz plate 122 at an angle that depends on the relative relationship between the wavelength of light and the wavelength of sound. By ramping the frequency from high to low, the portion 126 may have a higher frequency than the portion 127. Because the portion 126 has a higher frequency, it diffracts a portion of the incident beam through a steeper angle, as shown by the diffracted beam 128. Since the portion 127 has a relatively low frequency, it diffracts a portion of the incident light beam through a shallower angle, as shown by the diffracted light beam 130. Since an intermediate section portion between the portions 126 and 127 has a frequency between a higher frequency and a relatively lower frequency, it diffracts a portion of the incident light beam through an intermediate angle, such as the diffracted light beam 129 As shown. This is an example of how an AOD can be used to focus an incoming light beam 124 at position 125. Notably, AOD can operate significantly faster than mechanical devices such as mirrors. Specifically, the AOD may diffract the incoming light approximately within the time (e.g., 5 ns to 100 ns) it takes for the acoustic wave to cross the incoming beam. Thus, one scan of a specimen (eg, a wafer or a photomask) can be performed at, for example, a rate of 6.32 mm / microsecond. FIG. 1B illustrates an exemplary dual AOD illumination system 110 configured to generate a beam and scan the beam across a sample 109 (such as a wafer). A pre-scanned AOD 101 is used to deflect incident light from a light source 100 at an angle, where the angle is proportional to the frequency of a radio frequency (RF) drive source. A telephoto lens 102 is used to convert the angular scan from the pre-scanned AOD 101 into a linear scan. A stack of AOD 104 is used to focus an incident light beam in a sound propagation plane onto a scanning plane 105. This is achieved by using the transducer 104A to make the ramp through all RF frequencies faster than when all frequencies can propagate through the 啁啾 AOD 104. This rapid ramping forms a packet 104B. The radon packet 104B then propagates through the radon AOD 104 at the speed of sound. FIG. 1B shows the location of the scan packet 104B at the beginning of a light spot sweep, and FIG. 1C illustrates the location of the scan packet 104B at the end of the light spot sweep. It should be noted that during this propagation, the pre-scanned AOD 101 adjusts its RF frequency to track the radon packets in the AOD 104 so that the light beam remains incident on the radon packets 104B. A cylindrical lens 103 is used to focus the light beam in a plane perpendicular to the sound propagation plane. A relay lens 106 is used to generate a real pupil at a pupil plane 106A. A magnification changer 107 is used to adjust the size of the light spot and the length of the sweep. An objective lens 108 is used to focus the light spot onto a specimen 109, such as a wafer. FIG. 2 illustrates another exemplary irradiation system 200 using a single AOD. In the system 200, the pre-scanned AOD is replaced by a beam expander 201. Therefore, this type of illumination system is called a "flood AOD" system. In this configuration, a plurality of puppet packets 203A and 203B are generated in AOD 104. It should be noted that components having the same component symbol herein are substantially similar components and therefore their descriptions are not repeated. Each packet 203A and 203B generates its own light spot. Therefore, the objective lens 108 focuses the two light spots on the sample 109 at the same time. Although two chirped packets are shown in FIG. 2, in other embodiments, an additional chirped packet may be generated by a corresponding number of one of the light spots incident on the sample 109. It should be noted that the sample 109 is usually placed on an XY translation stage capable of bidirectional movement. In this configuration, the stage can be moved so that the focused spot (formed by the focusing optics using a diffracted beam) onto sample 109 follows adjacent continuous strips of equal width (i.e., Raster scan line) scan. US Patent 4,912,487, issued to Porter et al. On March 27, 1990 and incorporated herein by reference, describes an exemplary illumination system including a translation stage configured to provide raster scanning. FIG. 3 illustrates one conventional, exemplary AOD scanning technique that provides for the isolation of scattered light for multiple light spots. In this embodiment, four light spots are scanned during four times 301, 302, 303, and 304 (for ease of reference in FIG. 3, each light spot has a same fill pattern). These four light spots can be generated by an illumination system containing an AOD. In FIG. 3, the AOD provides a packet interval 306 (which is also related to the light spot interval and the scan line length). FIG. 4 illustrates an exemplary inspection system 400 for one of the techniques illustrated in FIG. 3. In the system 400, an AOD optical path (eg, similar to the optical path shown in FIG. 2) may include an objective lens 404 for focusing a light spot generated by the AOD onto a sample 401. The system 400 further includes a 50/50 beam splitter (or other ratio) 405 that can direct two copies of the scattered light 402 from the scanned spots on the sample 401 to the two detector arrays 408 and 409. A first collection path and mask set 406 can be configured to isolate the scattered light from a first set of light spots and provide its output to the detector array 408, and a second collection path and mask set 407 It can be configured to isolate the scattered light from a second set of light spots and provide its output to the detector array 408. It should be noted that each mask has a set of windows, each window having a predetermined width for a given PMT (photomultiplier tube) or other sensor. Referring back to FIG. 3, the first group of light points is indicated by a box with a solid line, and the second group of light points is indicated by a box with a dotted line. The lengths of the boxes correspond to a window width 305 used for the mask in FIG. 4. Thus, for example, at time 301, the scattered light from light points 310 and 312 (using a collection path and mask group 406) can be isolated from light point 311 (using a collection path and mask group 407). To ensure complete coverage, a mask overlay 307 is provided. In the scanning technique of Figure 3, two requirements must be met. First, the PMT window width 305 must be less than the desired line segment length (which is the interval between AOD (R) packets, as shown in 306). Second, the PMT window must overlap, as shown in overlap 307, but must not extend beyond the desired segment length. This requirement ensures that only one light spot is within a given mask at any time. Assuming two requirements are met, the scanning technique of FIG. 3 can provide adequate isolation of scattered light because there are never two light spots in a single box. However, this mask overlap can sometimes cause the two detector arrays to capture scattered light from the same spot, as shown by spot 313 at time 301. A similar situation occurs for the light spot 314 during time 304. This replicated information must be identified and considered during analysis, thereby increasing the complexity of the collection system. It should also be noted that sometimes a light point is not within the area designated for a mask, as shown by area 315 at time 302 and area 316 at time 303. In those cases, even if there is no light spot, information must still be retrieved, thereby wasting resources. In addition, the 50/50 beam splitter 405 undesirably reduces the light available for detection by half. To overcome this shortcoming, a laser (light source) that is twice as high power will be required, thereby increasing the cost of the inspection system. Assuming maximum power lasers have been used, a large laser will be required to verify the system using one of the 50/50 beam splitters. As shown in FIG. 2, having multiple puppet packets at the same time in the AOD will have crosstalk between high light points due to the light points being relatively close to each other. In addition, since the PMT window is smaller than the desired line segment length, more PMT is required, thereby further increasing the cost of the inspection system. FIG. 5A illustrates another exemplary AOD irradiation system 500 that can generate multiple light spots without flooding. In this embodiment, a diffractive optical element (DOE) 501 may be placed before the amplifier changer 107 to generate a plurality of light spots. Although FIG. 5A shows that three light spots are generated (different line colors indicate different light beams associated with their light spots), other embodiments may generate different numbers of light spots. FIG. 5B illustrates the effect of changing the magnification of the amplifier changer 107 on the spot size, spot interval, and scan length on the sample 109 for the illumination system 500. It should be noted that different fill colors indicate different light points (and correspond to different line colors of FIG. 5A). As shown in FIG. 5B, the large light spot 520 has an interval associated with the three positions 1, 3, and 5, and the small light spot 521 has an interval associated with the three positions 2, 3, and 4. The large light spot in position 1 is scanned to position 3, the large light spot in position 3 is scanned to position 5, and the large light spot in position 5 is scanned to position 7. In contrast, the small light spot in position 2 is scanned to position 3, the small light spot in position 3 is scanned to position 4, and the small light spot in position 4 is scanned to position 5. Having a smaller spot size (higher magnification) makes proper isolation of scattered light from multiple spots difficult. For example, FIGS. 6A and 6B illustrate 601, 602, and 603 (corresponding to the light spot shown in FIG. 5B of) three small spot at a time T ₁ and Example ₄ T between the illustrating exemplary sweep. FIG. 6B represents the scans of the light spots 601, 602, and 603 as boxes of the same color, where the boxes represent the paths of the light spots due to propagation through the 啁啾 AOD. FIG. 6B shows that there is an overlap of one of the collinear scans with different light spots (this will happen for both large and small light spots). This overlap will cause undesired light spot crosstalk. To provide proper isolation between light spots, thereby minimizing crosstalk, additional optics and technology are required. In one embodiment shown in FIGS. 7A and 7B, a stack of 705 can be used in an illumination system to form a suitable interval between light spots. US Patent 7,075,638, issued to Kvamme on July 11, 2006 and incorporated herein by reference, illustrates this irradiation system. In this system, 稜鏡 705 and additional optics, such as a spherical aberration correction lens and a transmission lens, are positioned such that scattered light from a plurality of light spots on the sample (e.g., with light spots 701, The beams associated with 702 and 703) are directed to a particular facet of 稜鏡 705, as shown in Figure 7A. The 稜鏡 705 then directs each beam to a separate detector. FIG. 7B shows scanning of light spots 701, 702, and 703 during operation of the associated inspection system. The 稜鏡 705 (which is part of the collector) utilizes an offset shown in Figures 7A and 7B (the offset is generated by a grating of a part of the illumination system) to desirably increase light spot isolation. Therefore, referring back to FIG. 6B, rotating a grating will cause the light spots 701, 702, and 703 (and their associated scans) to no longer be co-linear along the x-axis (i.e., they will instead be offset in a horizontal plane (Shift scan to form a diagonal line). Unfortunately, the 稜鏡 705 is designed for a specific magnification. Therefore, if you change the magnification, you must use another frame to add the cost and design complexity of the inspection system. The accurate detection of defects on the surface of a sample depends on the correct measurement and analysis of each light spot in the scan. Therefore, there is a need to optimize the technology and system using AOD, which ensures the isolation of these light spots, thereby minimizing crosstalk, while minimizing system complexity and cost.

The present invention describes a method for scanning a sample. In this method, a plurality of collinear scans are formed simultaneously. Each scan is formed by an acousto-optic device (AOD) scanning one spot by one spot. The collinear scans are separated by a predetermined interval. The first plurality of scanning bands are formed by repeating the simultaneous formation of the collinear scans in a direction perpendicular to one of the plurality of collinear scans. The first plurality of scanning bands have an interval between scanning bands which is the same as the predetermined interval. In one embodiment, the predetermined interval is a scan length. In another embodiment, the predetermined interval is an integer number of scan lengths. In another embodiment, an AOD parameter can be adjusted to provide an integer number of scan lengths as the predetermined interval. The method may further include forming a second plurality of scan zones adjacent to the first plurality of scan zones. In one embodiment, all of the first plurality of scanning bands adjacent to the bottom half of the first plurality of scanning bands form the second plurality of scanning bands. Forming the second plurality of scanning bands may be performed in a direction opposite to the direction of the first plurality of scanning bands or in the same direction as the direction of the first plurality of scanning bands. Describe another way to perform a scan of a sample. In this method, an adjustable magnification changer is used to provide a spot size and a first scan length, a spot separation is provided by a diffractive optical element (DOE) path, and a programmable sound is provided by a The optical device (AOD) provides a second scan length based on the first scan length. The scan can be performed using the spot size, the spot separation, and the second scan length. A test system is also described. The inspection system includes first and second AODs, a lens, a magnification changer, a first diffractive optical element (DOE) path, and a movable platform. The first AOD is configured to receive a light beam from a laser and guide the light beam at various angles along an angle scan. The transmission is configured to convert the angular scan into a linear scan. The second AOD is configured to receive the beam and generate a scan in the linear scan, the scan being a sweep of one light spot, thereby generating a plurality of collinear light spots. The magnification changer is configured to adjust the magnification of the plurality of collinear points, thereby generating a plurality of adjusted collinear points. The first DOE path is configured to duplicate the plurality of adjusted collinear light spots, thereby generating a set of collinear scans with a predetermined interval therebetween. The movable platform system is configured to fix a sample and form a first plurality by moving in a direction perpendicular to the collinear scans when generating a plurality of sets of the collinear scans on the first DOE path. Scanning tape. This movement forms the collinear scans of adjacent groups. The first plurality of scanning bands have an interval between scanning bands equal to one of the predetermined intervals. The mobile platform system is further configured to step in a direction parallel to one of the collinear scans and generate a second plurality of scan bands by virtue of the first DOE path. In one embodiment, the second plurality of scanning bands are formed adjacent to the first plurality of scanning bands. In another embodiment, the second plurality of scanning bands are formed adjacent to the first plurality of scanning bands except for a bottom half of the first plurality of scanning bands. The predetermined interval may be a scan length, an integer scan length, or a non-integer scan. In one embodiment, the second AOD is programmable to provide an adjustable scan length for one of the second plurality of scan bands. The second plurality of scanning bands may be formed in a direction opposite to the direction of the first plurality of scanning bands or in a direction same as the direction of the first plurality of scanning bands. The first DOE path is used for normal incident illumination or oblique incident illumination. In one embodiment, the inspection system further includes: a second DOE path; and a switching component configured to guide the plurality of collinear light spots to the first DOE path and the second DOE path One of them. The inspection system may further include an anamorphic beam waist repeater positioned to receive the beam from the laser and configured to allow adjustments to two independent axes. When the laser includes a barium borate laser multiplier crystal, the inspection system may further include a beam shaper having a slit. The inspection system may further include: a pupil; and one or more apodizing plates that are placed in operative relationship with the pupil and configured to project a predetermined transmission profile (e.g., on the x-axis and y On the axis) to the plurality of collinear light spots. In one embodiment, the pupil is eccentric with respect to the objective lens of the first DOE path. The inspection system may also include an incident angle mirror positioned between the magnification changer and the first DOE path. The angle of incidence mirror can be configured to adjust to an angle of incidence of the sample.

8A illustrates one modified dual AOD illumination system 800 configured to generate multiple light spots and scan across a sample 810 (such as a wafer). A pre-scanned AOD 801 is used to deflect incident light from a light source 800 at an angle, where the angle is proportional to the frequency of a radio frequency (RF) drive source. A telephoto lens 802 is used to convert the angular scan from the pre-scanned AOD 801 into a linear scan. A stack of AOD 804 is used to focus the incident light beam in the sound propagation plane onto a scanning plane 805. This is achieved by using the transducer 804A to make the ramp through all RF frequencies faster than when all frequencies can propagate through the 啁啾 AOD 804. This rapid ramping forms a packet 804B. The radon packet 804B then propagates through the radon AOD 804 at the speed of sound. The location of the radon packet 804B propagates across the radon AOD 804 during the spot sweep (see, for example, see one of Figures 1B and 1C for a similar movement). It should be noted that during this propagation, the pre-scanned AOD 801 adjusts its RF frequency to track the puppet packet in AOD 804 so that the beam remains incident on the puppet packet 804B. A cylindrical lens 803 is used to focus the light beam in a plane perpendicular to the sound propagation plane. A relay lens 806 is used to generate a real pupil at a pupil plane 806A. A magnification changer 807 is used to adjust the size of the light spot and the length of the sweep. Notably, a diffractive optical element (DOE) 808 is positioned after the magnification changer 807 and before an objective lens 809. DOE 808 uses the magnification changer 807 to form two copies of the light spot output without changing the light spot interval, as explained below. Although FIG. 8A shows that three light spots are generated by DOE 808, other embodiments may have a different number of light spots. The objective lens 809 is used to focus a plurality of light spots on the sample 810 at the same time. FIG. 8B illustrates the effect of changing the magnification of the amplifier changer 807 on the spot size and spot spacing on the sample 810 for the illumination system 800. It should be noted that different fill colors indicate different light points (and correspond to different line colors of FIG. 8A). As shown in FIG. 8B, both the large light spot 820 and the small light spot 821 may have equivalent intervals associated with the three positions 1, 3, and 5. FIG 9A illustrates three large light spots 901, 902 and 903 (corresponding to the light spot 820 shown in Figure 8B of) an exemplary scanning between times T ₁ and T ₄ in. FIG. 9A shows the sweeps of light spots 901, 902, and 903 as blocks 911, 912, and 913, respectively. Figure 9B illustrates three small point of light 921, 922 and 923 (corresponding to the light spot 821 shown in Figure 8B of) at time T ₁ and the exemplary scanning between ₄ T. FIG. 9B shows the scans of the light spots 921, 922, and 923 as boxes 931, 932, and 933, respectively. FIG. 9C shows that the large light spot 901 in position 1 is scanned to position 5, the large light spot 902 in position 9 is scanned to position 13, and the large light spot 903 in position 17 is scanned to position 21. In contrast, the small light spot 921 in position 2 is scanned to position 4, the small light spot 922 in position 10 is scanned to position 12, and the small light spot 923 in position 18 is scanned to position 20. Therefore, a scan of three small light spots can be "nested" in a scan of three large light spots. That is, scans 931, 932, and 933 may be nested in scans 911, 912, and 913, respectively. As shown in FIG. 9C, when the collection optics are designed to collect light from a low magnification configuration (large light spot), it will preset to collect light from a high magnification configuration (small light spot). FIG. 10A and FIG. 10B illustrate comparison of a light spot size and a scan size for a large light spot and a small light spot at various points in an illumination system. As shown, wafer AOD 804 (see FIG. 8) produces light spots with the same spot size and scan size; however, the magnification changer 807 changes both the spot size and scan size. In one embodiment, the size of both the large light spot and the small light spot is reduced; however, the magnification changer 807 forms a size difference between the large light spot and the small light spot at the stage. It should be noted that the magnification also changes the orientation of the image (switching the display from the position of the light spot from one side to the other during scanning), which is typical for an amplifier system. DOE 808 forms a duplicate of the light spot. As described above, the scanning position between the large light spot and the small light spot is the same, but the interval between scans is different for the large light spot and the small light spot. Specifically, the interval between small light spot scans is larger than the interval between large light spot scans. 11A to 11D illustrate one technique for scanning using the small light spot of FIG. 10B. Notably, this technique can be used for both normal incidence and oblique incidence illumination. In this embodiment, the completed scan (showing two light spots for simplicity) forms a collinear dashed line. That is, referring to FIG. 11A, scans 1101 and 1102 (formed from bottom to top in this case) have a space S1 therebetween. Therefore, a large spatial separation of one of the light beams is ensured. In one embodiment, the scans are formed vertically (as shown) and the scan bands are formed horizontally. For example, referring to FIG. 11B, the scanning strips 1111 and 1112 can be formed by repeating scanning 1101 and 1102 with a movement from left to right, respectively. After forming a scanning zone (with a corresponding space S therebetween, also referred to herein as a blank area), another group of scanning zones can be formed in such a space / blank area in a direction opposite to the direction used to form the previous group of scanning zones . For example, scanning bands 1120 and 1121 can be formed from right to left (shown as partial scanning bands for clarity), and scanning bands 1101 and 1102 can be formed from left to right (see arrows in FIG. 11A and FIG. 11B). Scanning tape obtained). In one embodiment, one of the stages of the positioning wafer may be caused to step, for example, one scan beam to form each new scan (i.e., a row of light spots). After the scanning band interleaving is completed, an additional interlaced scanning band may be formed in a manner similar to that illustrated in FIGS. 11A to 11C to provide a complete scan of the sample, as shown in FIG. 11D (which takes a 3-point DOE) As shown. It should be noted that the interval S1 can be designed to fit an integer number of scans, thereby ensuring a complete scan of one of the wafers without copying information. In one embodiment, one of the programmable AOD parameters described below with reference to FIG. 14 can be used to adjust the interval between the scanning bands. Since the interval S1 is larger than one scan length, several small vertical adjustments (for example, one scan length) can be made before a large vertical adjustment is made to form the necessary fill scan band. FIG. 12A and FIG. 12B illustrate comparison of a light spot size and a scan size for one of a large light spot and a small light spot at various points in another illumination system. In this embodiment, a programmable AOD 804A with software control can be used. If desired, this software control allows selectively generating a longer scan. However, the functions of the magnification changer 807 and DOE 808 are the same as those explained above. That is, the wafer AOD 804 (see FIG. 8) generates light spots having the same light spot size and scan size; however, the magnification changer 807 changes both the light spot size and the scan size. DOE 808 forms a copy of the light spot. Notably, by using the programmable AOD 804A, the scan size (instead of spot size) can be increased. Therefore, DOE 808 can produce scans with a small interval between them. FIG. 12C shows that the small light spot 1201 in position 1 is scanned to position 5, the small light spot 1202 in position 9 is scanned to position 13, and the small light spot 1203 in position 17 is scanned to position 21. Notably, scans 1210 (including light spot 1201), 1211 (including light spot 1202), and 1212 (including light spot 1203) have an interval between them that allows exactly one scan length. This interval can be utilized as explained below. It should be noted that when comparing FIG. 10B and FIG. 12B, the processing capacity of one inspection system including the configuration of FIG. 12B will be larger. Specifically, the actual scan rate will be the same. The scanning rate is proportional to the size of the scanning spot and the speed of the scanning spot. In FIGS. 10B and 12B, the size and speed of the light spots are the same. However, the XY stage for the configuration of FIG. 12B will be slower, that is, the setting must be longer because it still has to wait for longer scans to complete. In addition, for FIG. 12B, the height of the scanning band is relatively large, as indicated by the number of pixels in each segment shown in FIGS. 10A, 10B, 12A, and 12B. In this embodiment, it is 650 per scan. The number of pixels, except for the configuration of FIG. 12B, is 1950 pixels per scan. It should be noted that when a larger spot size is provided, a corresponding faster speed is generated, and a smaller spot size corresponds to a slower speed. Therefore, in FIGS. 10A and 10B, the amount of time it takes for a large light spot to travel its scan is the same as the amount of time it takes for a small light spot to travel its scan. However, referring to FIG. 12A and FIG. 12B, since the scan size is large (that is, the scan length is longer), compared with the time spent by a large light spot to travel its scan, the time taken by a small light spot to travel its scan is longer. Long (1950 pixels vs. 650 pixels). The throughput is based on how quickly a specific area of the wafer can be scanned, which will be determined by the scanning speed and spot size. Starting and stopping the XY stage to form a scanning strip system add-on is because the light spot scanning is not performed during their period. Therefore, by reducing the number of scanning bands and therefore the number of times the XY stage must be stopped and started, the throughput of the additional improved inspection system is reduced, as illustrated in FIG. 12B. In addition, it takes time to set up prescan AOD and various other electronic devices between scans. Therefore, even more additional items can be avoided by extending the scan, for example, as shown in Figure 12B. The peak data rate is always the rate at which a pixel is digitized when the light spot is moving. Therefore, the peak data rate is the same for any of the configurations shown in FIGS. 10A, 10B, 12A, and 12B. However, the average data rate (which is always lower than the peak data rate) will vary based on additional terms. Therefore, the configuration shown in FIG. 12B provides the fastest average data rate (and closest to the peak data rate) in the configurations shown in FIGS. 10A, 10B, 12A, and 12B. 13A to 13D illustrate one technique for scanning using the small light spot of FIG. 12B. In this embodiment, the completed scan (three light spots are shown for simplicity) also forms a collinear dashed line, with a small space between the scans. That is, referring to FIG. 13A, scans 1301 and 1302 (formed from bottom to top in this case) have a space S2 therebetween. The interval S2 is smaller than the interval S1, however, it is still ensured that a sufficient space of the light beam is separated using the interval S2. The interval S1 and the interval S2 are controlled by the scan length in the AOD, and are optimized when the interval is equal to the scan length (scan size). In one embodiment, the scans are formed vertically (as shown) and the scan bands are formed horizontally. For example, referring to FIG. 13B, the scanning strips 1310, 1311, and 1312 can be formed by repeatedly scanning 1301, 1302, and 1303 with a movement from left to right. After the scanning bands are formed with the corresponding space S2 therebetween, another group of scanning bands can be formed in such a space / blank area in a direction opposite to the direction used to form the previous group of scanning bands. For example, scanning bands 1320, 1321, and 1322 can be formed from right to left (shown as partial scanning bands for clarity), and scanning bands 1310, 1311, and 1312 can be formed in a left to right pattern (see FIG. 13A Arrow and the resulting scan band in Figure 13B). Again, one of the stages of the positioning wafer can be made to step, for example, a scanning beam. After the scanning band interleaving is completed, an additional interlaced scanning band may be formed in a manner similar to that illustrated in FIGS. 13A-13C to provide a full scan of the sample. Since the interval S2 is equal to one scan length, a small vertical adjustment (for example, one scan length or several scanning beams) can be made before a large vertical adjustment is made to form the necessary fill scan band. In one embodiment shown in FIG. 13D, the stage can step 5 scanning beams (eg, 1 2/3 of the field of view (FOV)). In another embodiment, and referring to FIG. 13B, instead of moving up one scan length after completing the scanning strips 1310, 1311, and 1312, the next and all subsequent vertical adjustments may be adjustments shown by arrows 1350. It should be noted that the filling pattern depends on the number of light spots, for example, for a 5 light spot pattern, 2 blank areas are left; for a 7 light spot pattern, 3 blank areas are left. Therefore, in general, all the first plurality of scanning bands adjacent to the bottom half of one of the first plurality of scanning bands form the second plurality of scanning bands. This fill pattern provides complete coverage, except for the space between the scanning strips 1310 and 1311. In this configuration, the scanning strip 1311 will then specify the first area of interest on the wafer. This technique can be applied to other configurations that utilize more light spots. FIG. 14 illustrates one exemplary inspection system 1400 that can isolate scattered light from multiple light spots. Notably, the system 1400 may enable normal or oblique incident illumination. As is known to those skilled in the art, some defects are best irradiated using normal incident radiation and other defects are best irradiated using oblique incident radiation. Notably, multiple collectors 1430A, 1430B, 1430C can use normal incidence or oblique incidence illumination to collect scattered light from a sample 1421, such as a wafer, without reconfiguration. Specifically, as explained in further detail below, no change in magnification is required in the collectors 1430A, 1430B, and 1430C, because the illumination optics are configured as illustrated in FIG. 9C so that all light spots overlap. In the inspection system 1400, light from a laser 1401 can be directed to an anamorphic beam waist repeater (AWR) 1402. The AWR 1402, which can include cylindrical lenses, chirps, gratings, or spherical components (motorized or non-motorized), provides the ability to adjust the spot size to take into account changes in laser beam waist parameters and system fabrication and alignment tolerances. A preferred embodiment utilizes an anamorphic assembly that allows adjustments to two independent axes. The AWR 1402 provides its output to a collimating lens 1403. The collimating lens 1403 provides its output to a beam shaper 1405. The beam shaper 1405 is used to adjust the beam size at the entrance of a pre-scanned AOD 1406. In addition, if the laser 1401 includes a laser BBO (barium borate) multiplier crystal, the beam shaper 1405 may also include a slit to adjust the beam due to the BBO crystal. This slit in the beam shaper 1405 may be implemented as a standard slit or may include one or more apodized or jagged slits to improve its function. The beam shaper 1405 provides its output to a pre-scanned AOD 1406. The pre-scanned AOD 1406 is used in a deflection mode and in conjunction with a telephoto lens 1407 and an anamorphic beam expander 1408 to position and scan the beam relative to a stack of AOD 1409. The pre-scanned AOD 1406 scans the laser beam through an angle. A lens 1407 converts the angular scan from the pre-scanned AOD 1406 into a linear translation scan. The lens 1407 may be implemented as a telescope, a beam expander, a relay lens, a focusing lens, an objective lens, or any other suitable optical component known in the art. An anamorphic beam expander 1408 is used to convert the circular output from the pre-scanned AOD 1406 and the telescope 1407 into an elliptical shape. The anamorphic beam expander 1408 may include a lenticular lens, chirped, grating, or spherical component. It should be noted that the elliptical beam provided by the anamorphic beam expander 1408 may be necessary to meet the limitations in the production of 啁啾 AOD 1409 (specifically, the height of the diffraction acoustic column).啁啾 AOD 1409 is used to focus the laser beam in the direction of sound propagation and to scan the laser beam. One of the 啁啾 AOD 1409 transducers is configured to generate a signal that is generated over a length of 啁啾 AOD 1409 and propagates from one start position to one 啁啾 packet. In a preferred embodiment, the 啁啾 AOD 1409 and the pre-scanned AOD 1406 can be software programmed to improve system throughput, as explained above in FIGS. 12A and 12B. The output of the 啁啾 AOD 1409 can be provided to the module 1410 (such as a cylindrical lens, a relay lens, multiple field diaphragms / slits, and a polarizing module). A cylindrical lens is used to focus the scanning beam on an axis perpendicular to the scanning motion of the 啁啾 AOD 1409. The relay lens is used to form a solid pupil at the positions of the downstream components 1414 and 1413 (explained below). These field diaphragms and slits are used to filter out unwanted diffraction orders from the 啁啾 AOD 1409 and pre-scanned AOD 1406 and to filter out any unwanted scattered light from other components (laser 1401 to component 1410). In addition, these slits are used as field diaphragms to accommodate changes in the required line length. The polarizing components may include components to both filter a specific polarized light and generate a specific polarized light, such as a Brewster plate polarizer, a wire grid polarizer, a stack, or any other component that provides similar functionality. These polarizing components may also include components for changing polarized light, such as half-wave plates, quarter-wave plates, or other plates that provide similar functionality. These polarizers are used to provide multiple polarizing options for inspecting substrates. The component 1410 provides its output to one or more apodes 1413. The apodization plate 1413 is used to change the shape of the optical point spread function of the system in response to the challenge provided by the sample being tested. Apodization can be achieved through the use of serrated sheet metal components, dot density components, coatings, or other methods known in the art. In one embodiment, the toe plate 1413 can have independent control of the point spread function on the X-axis and Y-axis. The apodized plate 1413 provides its output to a zero-order filter slit 1414. The slit 1414 is used to remove the zeroth order from the optical path. The zero-order slit 1414 provides its output to a magnification changer 1415. The magnification changer 1415 is used to adjust the magnification of the overall illumination optics system. As a result, the size of the light spot at the sample 1421, the speed of the light spot, and the scanning length are changed. An incident angle mirror 1416 is an adjustable mirror for changing the incident angle to the wafer. When the system magnification is small and the spot size is large, the resulting numerical aperture (NA) of the pupil is small. Therefore, the incident angle mirror 1416 can be adjusted to increase the incident angle (from the wafer normal) of the inspection beam. When the system magnification is large and the spot size is small, the incident angle mirror is positioned to reduce the incident angle of the inspection beam (from the wafer normal). This adjustability provides the benefits of filtering repetitive structures, inspection speed, and defect signal-to-noise ratio. The angle of incidence mirror 1416 provides its output to a beam splitter 1417. The beam splitter 1417 is used to select between an oblique incidence irradiation path, a normal incidence illumination path, or an oblique and normal incidence path. In the oblique incidence path, the beam splitter 1417 provides its output to a DOE 1418. DOE 1418 is used to form multiple copies of a scanning beam, as previously explained. DOE 1418 provides its output to an oblique fixed magnification 1419. The oblique fixed magnifying lens 1419 is used to image the real pupil at the position of the DOE 1418 to the incident pupil of an objective lens 1420. The objective lens 1420 is used to focus the light beam on the substrate under inspection. In the normal incidence path, the beam splitter 1417 provides its output to a turning mirror 1425. The turning mirror 1425 provides its output to a normal incident anamorphic beam expander 1426. The anamorphic beam expander 1426 may include a lenticular lens, chirped, grating, or spherical component. The anamorphic beam expander 1426 is used to expand the light beam on one axis or conversely reduce the light beam on one axis. This expansion / reduction flexibility provides the benefits of filtering repetitive structures, inspection speed, and defect signal-to-noise ratio. The anamorphic beam expander 1426 provides its output to a normal incidence DOE 1427. The normal incidence DOE 1427 is used to form multiple copies of the scanning beam, as previously explained. The normal incidence DOE 1427 provides its output to a normal incidence fixed magnifier 1428. The normal incident fixed magnifying lens 1428 is used to image the real pupil at the position of the DOE 1427 to the incident pupil of an objective lens 1422. The objective lens 1422 is used to focus the light spot on the sample for a normal incidence channel. The normal incidence fixed magnifier 1428 provides its output to a NI (normal incidence) beam shaper changer 1429 through a turning mirror. The NI beam shaper changer 1429 serves multiple functions. It has multiple plates serving as apertures, mirrors, and beam splitters. These beam splitters can be configured to have multiple ratios of transmission and reflection (e.g., 50/50, 100/0, 80/20, etc.). These beam splitters can also have multiple transmission and reflection profiles in a spatial sense to achieve various configurations of a collection channel 1430A. The collection of scattered light is not limited to light that passes through the objective lens 1422 in a normal direction. Collecting light from the wafer can also be achieved through additional collection channels 1430B and 1430C. The sample 1421 can be fixed by a movable platform 1431. In one embodiment, the movable platform 1431 may include a chuck, at least one linear motor (providing xy movement), and a spindle motor (providing rotation) (optional). The movable platform 1431 can be controlled by a central control and data acquisition computer 1432 via a motor control cable 1433. It should be noted that the movable platform 1431 is moving perpendicular to the direction of scanning (ie, the sweep of the light spot). In a preferred embodiment, the movable platform 1431 can move continuously because the scanning speed is much faster relative to the platform (for example, about a few microseconds for a scan versus several seconds for the platform). The central control and data acquisition computer 1432 can receive input from the collectors 1430A, 1430B, and 1430C. As shown in FIGS. 15A and 15B, an incident angle adjuster 1501 is used in conjunction with a magnification changer to provide a plurality of oblique incident angles to the substrate 1504. 15A illustrates an optional configuration for a low magnification, large light spot, low NA (indicated by 1502A) configuration. In this case, the adjuster 1501 is moved (shown lowered closer to the objective lens 1503) to provide a higher incidence angle to the substrate 1504. Figure 15B shows a high magnification, small light spot, high NA (indicated by 1502B) configuration with the adjuster 1501 in its normal position. This position is available for all magnification options. As explained above, the programmable AOD and the DOE positioned behind the magnification changer form a scan in a first direction (vertical in this case), while the movable platform 1431 and the central control and data acquisition The computer 1432 forms a scanning strip in a second direction (in this case, a horizontal direction) perpendicular to the first direction. The number of scanning spots is equal to the number of scanning bands. An inspection system that includes this configuration provides flexible spacing between adjacent collinear scans to eliminate light spot crosstalk. In addition, because the DOE provides spacing between light spots, an inexpensive non-imaging collector can be used. The various embodiments of the structure and method of the present invention set forth above are merely illustrative of the principles of the present invention and are not intended to limit the scope of the present invention to the specific embodiments set forth. For example, although the embodiments are described with a predetermined number of light spots, other embodiments of an illumination system or an inspection system may include a different number of light spots. Therefore, the present invention is limited only by the scope of the following patent applications and their equivalents.

100‧‧‧AOD and light source

101‧‧‧pre-scan acousto-optic device

102‧‧‧ Telephoto lens

103‧‧‧ cylindrical lens

104‧‧‧ 啁啾 Sound and Light Device

104A‧‧‧ Transducer

104B‧‧‧ 啁啾 Package

105‧‧‧scan plane

106‧‧‧ relay lens

106A‧‧‧ pupil plane

107‧‧‧Magnifier / Amplifier Changer

108‧‧‧ Objective

109‧‧‧sample

121‧‧‧ sound transducer

122‧‧‧Quartz Plate

123‧‧‧ sound absorber

124‧‧‧Incoming light / Incoming light

125‧‧‧Location

126‧‧‧part

127‧‧‧part

128‧‧‧ direction

129‧‧‧ direction

130‧‧‧ direction

200‧‧‧ irradiation system / system

201‧‧‧ Beam Expander

203A‧‧‧ 啁啾 Package

203B‧‧‧ 啁啾

301‧‧‧time

302‧‧‧time

303‧‧‧time

304‧‧‧time

305‧‧‧window width

306‧‧‧ 啁啾 packet interval

307‧‧‧ overlapping

310‧‧‧ Light Spot

311‧‧‧light spot

312‧‧‧light spot

313‧‧‧light spot

314‧‧‧light spot

315‧‧‧area

316‧‧‧area

400‧‧‧Inspection system / system

401‧‧‧sample

402‧‧‧Scattered light

404‧‧‧ Objective

405‧‧‧50 / 50 beam splitter

406‧‧‧First collection path and mask set / collection path and mask set

407‧‧‧Second collection path and mask set / collection path and mask set

408‧‧‧ Detector Array

409‧‧‧ Detector Array

500‧‧‧ acousto-optic device irradiation system / irradiation system

501‧‧‧diffractive optics (DOE)

520‧‧‧Big Light Spot

521‧‧‧small light spot

601‧‧‧small light spot / light spot

602‧‧‧small light spot / light spot

603‧‧‧small light spot / light spot

701‧‧‧light spot

702‧‧‧light spot

703‧‧‧light spot

705‧‧‧ 稜鏡

800‧‧‧ Improved dual acousto-optic device irradiation system / irradiation system / light source

801‧‧‧pre-scan acousto-optic device

802‧‧‧ Telephoto lens

803‧‧‧ cylindrical lens

804‧‧‧ 啁啾 Sound and Light Device

804A‧‧‧Transducer / programmable acousto-optic device

804B‧‧‧ 啁啾 Bag

805‧‧‧scanning plane

806‧‧‧ relay lens

806A‧‧‧ pupil plane

807‧‧‧Magnifier / Amplifier Changer

808‧‧‧ Diffractive Optical Element (DOE)

809‧‧‧ Objective

810‧‧‧sample

820‧‧‧Big Light Spot / Light Spot

821‧‧‧Small light spot / light spot

901‧‧‧big light spot / light spot

902‧‧‧big light spot / light spot

903‧‧‧big light spot / light spot

911‧‧‧box / scan

912‧‧‧box / scan

913‧‧‧box / scan

921‧‧‧small light spot / light spot

922‧‧‧Small light spot / light spot

923‧‧‧small light spot / light spot

931‧‧‧box / scan

932‧‧‧box / scan

933‧‧‧box / scan

1101‧‧‧scan / scan tape

1102‧‧‧Scan / Scan Tape

1111‧‧‧Scanning tape

1112‧‧‧Scanning tape

1120‧‧‧Scanning tape

1121‧‧‧Scanning tape

1201‧‧‧small light spot / light spot

1202‧‧‧small light spot / light spot

1203‧‧‧small light spot / light spot

1210‧‧‧Scan

1211‧‧‧Scan

1212‧‧‧Scan

1301‧‧‧Scan

1302‧‧‧Scan

1303‧‧‧Scan

1310‧‧‧Scanning tape

1311‧‧‧Scanning tape

1312‧‧‧Scanning tape

1320‧‧‧Scanning tape

1321‧‧‧Scanning tape

1322‧‧‧Scanning tape

1350‧‧‧arrow

1400‧‧‧Inspection system / system

1401‧‧‧Laser

1402‧‧‧Amorphous Beam Repeater (AWR)

1403‧‧‧Collimating lens

1405‧‧‧Beam Shaper

1406‧‧‧pre-scan acousto-optic device / pre-scan

1407‧‧‧ Telephoto lens / lens / telescope

1408‧‧‧anamorphic beam expander

1409‧‧‧ 啁啾 Sound and Light Device

1410‧‧‧components

1413‧‧‧Component / Toe Plate

1414‧‧‧component / zero-order filter slit / zero-order slit

1415‧‧‧Magnifier

1416‧‧‧incident angle mirror

1417‧‧‧Beam Splitter

1418‧‧‧ Diffractive Optical Elements

1419‧‧‧Tilt Fixed Magnifier

1420‧‧‧ Objective

1421‧‧‧Sample

1422‧‧‧ Objective / Normal Incident Objective

1425‧‧‧Steering mirror

1426‧‧‧Aberrated beam expander

1427‧‧‧normal incidence diffraction optics / diffraction optics

1428‧‧‧Normal Incident Magnifier

1429‧‧‧NI (normal incidence) beam shaper changer

1430A‧‧‧collector / collection channel

1430B‧‧‧collector / collection channel

1430C‧‧‧collector / collection channel

1431‧‧‧Mobile platform

1432‧‧‧ Central Control and Data Acquisition Computer

1433‧‧‧Motor control cable

1501‧‧‧ incident angle adjuster / adjuster

1502A‧‧‧Low NA

1502B‧‧‧High numerical aperture

1503‧‧‧ Objective

1504‧‧‧ substrate

FIG. 1A illustrates a simplified configuration of an acousto-optic device (AOD). FIG. 1B illustrates an exemplary dual AOD irradiation system configured to generate a light beam and scan the light beam across a specimen such as a wafer. FIG. 1C illustrates the position of a stack of packets at the end of a light spot sweep of the dual AOD illumination system shown in FIG. 1B. Figure 2 illustrates another exemplary irradiation system using a single AOD. FIG. 3 illustrates one conventional, exemplary AOD scanning technique that provides for the isolation of scattered light for multiple light spots. FIG. 4 illustrates an exemplary inspection system for the technique illustrated in FIG. 3. FIG. 5A illustrates another exemplary AOD irradiation system that can generate multiple light spots without flooding. FIG. 5B illustrates the effect of changing the magnification of the amplifier changer on the spot size, spot interval, and scan length for the illumination system shown in FIG. 5A. 6A and 6B illustrate an exemplary sweep of three small light spots. Figures 7A and 7B illustrate how a stack can be used with the same illumination system to form a proper isolation of one of the light spots in the collector optics. FIG. 8A illustrates a modified dual AOD irradiation system configured to generate multiple light spots and span one of a sample scan. FIG. 8B illustrates the effect of changing the magnification of the amplifier changer on the spot size and spot spacing on the sample for the illumination system shown in FIG. 8A. 9A and 9B illustrate an exemplary scan of three large light spots and three small light spots generated by the illumination system shown in FIG. 8A. FIG. 9C illustrates the superposition of the scanning of the large light spot and the small light spot shown in FIGS. 9A and 9B. FIG. 10A and FIG. 10B illustrate comparison of a light spot size and a scan size for a large light spot and a small light spot at various points in an illumination system. 11A to 11D illustrate one technique for scanning using the small light spot of FIG. 10B. 12A, 12B, and 12C illustrate comparisons of light spot sizes and scan sizes for a large light spot and a small light spot at various points in another illumination system. 13A to 13D illustrate one technique for scanning using the small light spot of FIG. 12B. FIG. 14 illustrates one exemplary inspection system that can isolate scattered light from multiple light spots. 15A and 15B illustrate how the angle of incidence can be changed in an oblique illumination system.

Claims (26)

An inspection system for inspecting a sample, the inspection system includes: a movable platform system configured to fix the sample; an irradiation system configured to simultaneously produce alignments along a collinear scan line A plurality of collinear scans, such that each scan is formed by sweeping one of a light spot of an acousto-optic device (AOD) along the collinear scan line, and the plurality of collinear scans are Guided onto the fixed sample and separated by a predetermined interval; and a controller configured to control the movable platform system such that the fixed sample is perpendicular to the collinear scan line relative to the illumination system Repeatedly step in one direction and cooperate with the generation of the plurality of collinear scans, so that by repeatedly generating the plurality of collinear scans in a direction perpendicular to the one of the collinear scan lines, a first plurality of swaths are formed ), The first plurality of scanning bands have an interval between scanning bands of one of the predetermined intervals. The inspection system of claim 1, wherein the irradiation system is further configured to generate the plurality of collinear scans simultaneously, so that each scan has a scan length, and the predetermined interval is equal to the scan length. The inspection system of claim 1, wherein the irradiation system is further configured to generate the plurality of collinear scans simultaneously, so that each scan has a scan length, and the predetermined interval is equal to an integer number of scan lengths. The inspection system of claim 3, wherein the AOD is programmable and configured such that the integer scan length can be adjusted by adjusting one of the programmable AODs. The inspection system of claim 1, wherein the controller is further configured to control the movable platform system such that the plurality of collinear scans form a second plurality of scan bands adjacent to the first plurality of scan bands. The inspection system of claim 1, wherein the controller is further configured to control the movable platform system such that the plurality of collinear scans form a border adjacent to the bottom half except for one of the first plurality of scan bands All the second plurality of scanning bands of the first plurality of scanning bands. The inspection system of claim 6, wherein the controller is further configured to control the movable platform system such that the second plurality of scanning bands are in a direction that is utilized during the formation of the first plurality of scanning bands. It is formed by moving the sample in the opposite direction. The inspection system of claim 6, wherein the controller is further configured to control the movable platform system such that the second plurality of scanning bands are in a direction that is utilized during formation of the first plurality of scanning bands It is formed by moving the sample in the same direction. A method comprising: receiving a light beam from a laser and guiding the light beam at various angles along an angle scan; converting the angle scan into a linear scan; receiving the light beam and generating a scan in the linear scan, the The scanning system sweeps one of the light spots, thereby generating a plurality of collinear light spots; adjusting the magnification of one of the plurality of collinear lights, thereby generating a plurality of adjusted collinear lights; copying the plurality of adjusted Collinear light spots, such that each adjacent pair of these collinear light spots is separated by a predetermined light spot interval, thereby simultaneously generating a group of collinear scans aligned along a collinear scan line, and the group of collinear scans having A predetermined scan interval; and forming a first plurality of scan bands by moving a sample in a direction perpendicular to one of the collinear scan lines, the moving the sample causes the collinear scans of the plurality of groups to form adjacent groups of the Iso-collinear scanning, the first plurality of scanning bands having an interval between scanning bands equal to one of the predetermined scanning intervals, whereby the copy promotion control is performed after the adjustment One of a plurality of co-linear without changing the spot size of the light spot in the predetermined interval between each adjacent pair of the light spot such collinearity. The method of claim 9, wherein moving the sample includes stepping the sample in a direction parallel to the set of collinear scans and then moving the sample in a direction perpendicular to the set of collinear scans such that the groups of the The isocollinear scan forms a second plurality of scan bands adjacent to the first plurality of scan bands. The method of claim 10, wherein generating the set of collinear scans simultaneously includes sweeping the collinear points, so that the first plurality of scanning bands and the second plurality of scanning bands have a scanning length, and the predetermined The scan interval is equal to an integer number of scan lengths. The method of claim 11, wherein stepping the sample comprises moving the sample by an adjustment distance in the direction parallel to the set of collinear scans, so that the second plurality of scan bands are adjacent to the first plurality of scans. The first plurality of scanning strips are formed outside the bottom half of one of the strips. The method of claim 10, wherein generating the set of collinear scans simultaneously includes sweeping the collinear light spots, so that the first plurality of scanning bands have a first scanning length and the second plurality of scanning bands have One of the first scan lengths is a second scan length. The method of claim 10, wherein forming the second plurality of scanning zones includes moving the sample in a direction opposite to one of directions utilized during forming the first plurality of scanning zones. The method of claim 10, wherein forming the second plurality of scanning zones includes moving the sample in the same direction as one of directions utilized during forming the first plurality of scanning zones. The method of claim 9, wherein copying the plurality of adjusted collinear spots includes shunting the plurality of adjusted collinear spots to a normal incident irradiation path or an oblique incident irradiation path. The method of claim 9, wherein copying the plurality of adjusted collinear points includes shunting the plurality of adjusted collinear points to an oblique incident illumination path. The method of claim 9, wherein copying the plurality of adjusted collinear light spots includes controlling a switching component to guide the plurality of adjusted collinear light spots to one of a normal incident illumination path and an oblique incident illumination path . The method of claim 9, further comprising making adjustments to two independent axes receiving the light beam from the laser before directing the light beam at the various angles. The method of claim 9, further comprising generating the beam using a barium borate laser doubling crystal, and passing the beam through a beam shaper having a slit. The method of claim 9, further comprising using a pupil and one or more apodization plates placed in operational relationship with the pupil to provide a predetermined transmission profile to the plurality of collinear light spots. The method of claim 21, wherein using the one or more apodization plates includes configuring the one or more apodization plates to provide an identical transmission profile on an x-axis and a y-axis. The method of claim 21, wherein using the one or more apodization plates includes configuring the one or more apodization plates to provide a different transmission profile on an x-axis and a y-axis. The method of claim 21, wherein utilizing the one or more apodization plates includes configuring the one or more apodization plates to provide a programmable transmission profile. The method of claim 21, wherein using the pupil comprises decentering the pupil relative to an objective lens of a first diffractive optical element (DOE) path. The method of claim 9, further comprising using an incident angle lens to adjust to an incident angle of the sample.