TWI635061B - Strengthened glass and methods for making the same by using heat treatment - Google Patents

Strengthened glass and methods for making the same by using heat treatment Download PDF

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TWI635061B
TWI635061B TW103112605A TW103112605A TWI635061B TW I635061 B TWI635061 B TW I635061B TW 103112605 A TW103112605 A TW 103112605A TW 103112605 A TW103112605 A TW 103112605A TW I635061 B TWI635061 B TW I635061B
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heat treatment
substrate
hours
treatment temperature
glass
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TW201514116A (en
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阿倫 庫瑪 瓦施亞
派翠克 肯尼斯 奎斯基
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撒克遜玻璃科技股份有限公司
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    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C21/00Treatment of glass, not in the form of fibres or filaments, by diffusing ions or metals in the surface
    • C03C21/001Treatment of glass, not in the form of fibres or filaments, by diffusing ions or metals in the surface in liquid phase, e.g. molten salts, solutions
    • C03C21/002Treatment of glass, not in the form of fibres or filaments, by diffusing ions or metals in the surface in liquid phase, e.g. molten salts, solutions to perform ion-exchange between alkali ions

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  • Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
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Abstract

本發明提供一種利用交換介質強化基板之方法,該基板具有約25.0毫米之寬度,包括具有平均離子半徑之主體鹼離子,且具有包括富處理區域及貧處理區域之維度區域;該方法包含:將該基板加熱至約250℃且最高熱處理溫度之熱處理溫度後持續約0.001-50小時之熱處理時間,其中若該熱處理溫度約325℃,則該熱處理時間約2小時,以產生經熱處理基板;及使該經熱處理基板暴露於該交換介質;其中該交換介質包括入侵鹼離子,該入侵鹼離子具有比該主體鹼離子之平均離子半徑大的平均離子半徑;且該強化基板包括深度為約1-500μm之壓縮應力層。 The invention provides a method for strengthening a substrate by using an exchange medium, the substrate having a width of about 25.0 mm, comprising a bulk alkali ion having an average ionic radius, and having a dimension region including a rich processing region and a lean processing region; the method comprising: heating the substrate to About 250 ° C and The heat treatment temperature after the heat treatment temperature of the highest heat treatment temperature is about 0.001-50 hours, wherein the heat treatment temperature About 325 ° C, the heat treatment time About 2 hours to produce a heat treated substrate; and exposing the heat treated substrate to the exchange medium; wherein the exchange medium comprises an invading alkali ion having an average ionic radius greater than an average ionic radius of the host alkali ion And the reinforcing substrate comprises a compressive stress layer having a depth of about 1 to 500 μm.

Description

強化玻璃及使用熱處理製造其之方法 Strengthened glass and method of manufacturing the same using heat treatment

本發明係關於強化玻璃及製造強化玻璃之方法。 The present invention relates to tempered glass and a method of making tempered glass.

玻璃之化學強化(亦稱為離子交換強化或化學回火)為一種藉由增加玻璃自身內之壓縮來強化所製備之玻璃物品的技術。其通常涉及將較大鹼離子引入玻璃化學結構中以置換該結構中已存在之較小鹼離子。玻璃中化學強化之常見實施藉由將含有鈉離子之玻璃基板浸沒於含有熔融鉀鹽之浴液中經由用離子半徑相對較大的鉀離子交換離子半徑相對較小的鈉離子來進行。 Chemical strengthening of glass (also known as ion exchange strengthening or chemical tempering) is a technique for strengthening the prepared glass article by increasing the compression within the glass itself. It typically involves introducing larger alkali ions into the glass chemical structure to displace the smaller alkali ions already present in the structure. A common practice for chemical strengthening in glass is carried out by immersing a glass substrate containing sodium ions in a bath containing a molten potassium salt by exchanging sodium ions having a relatively small ionic radius with potassium ions having a relatively large ionic radius.

化學強化經常用於增大玻璃中之壓縮。玻璃部分之玻璃內增加之壓縮與玻璃中增加之強度、增加之耐磨性及/或增加之耐熱震性相關。所增加之壓縮可經引入到達玻璃中之各種深度且經常在玻璃表面層內實施。化學強化通常用於處理平板玻璃。但其亦可用於處理非平板玻璃物品,如圓柱體及具更大幾何複雜性之其他形狀。 Chemical strengthening is often used to increase the compression in the glass. The increased compression in the glass portion of the glass portion is associated with increased strength in the glass, increased wear resistance, and/or increased thermal shock resistance. The increased compression can be introduced into various depths in the glass and often performed within the glass surface layer. Chemical strengthening is commonly used to treat flat glass. But it can also be used to process non-flat glass items such as cylinders and other shapes with greater geometric complexity.

平板玻璃通常利用許多已知技術製造。此等技術包括漂浮玻璃法及拉製法,諸如熔融下拉法及狹縫拉製法。然而,所製備之平板玻璃物品可在玻璃中不同位置處在其化學組成及/或結構方面具有變化。舉例而言,利用漂浮玻璃技術製造之平板玻璃經常藉由將軟化玻璃材料展塗於熔融金屬表面(諸如錫)上來製備。接著將玻璃冷卻以形 成固態平板玻璃。因此,所製備之平板玻璃經常在較接近熔融錫之側上含有較大量之錫,且錫之濃度在該側表面附近通常較大。 Flat glass is typically manufactured using a number of known techniques. Such techniques include floating glass processes and draw processes such as melt down draw and slot draw. However, the prepared flat glass articles may vary in their chemical composition and/or structure at different locations in the glass. For example, flat glass made using floating glass technology is often prepared by spreading a softened glass material onto a molten metal surface, such as tin. Then cool the glass to shape Solid glass plate. Therefore, the prepared flat glass often contains a relatively large amount of tin on the side closer to the molten tin, and the concentration of tin is usually large near the side surface.

化學強化經常用於處理在玻璃中不同位置處在化學組成及/或結構方面具有變化之玻璃。該等變化產生針對化學強化中之離子交換及/或壓縮發展相對於彼此為富處理或貧處理之位置。當化學強化用於處理該玻璃時,所引入之壓縮應力經常不均勻地分佈。 Chemical strengthening is often used to treat glass that has a change in chemical composition and/or structure at different locations in the glass. These changes result in locations where ion exchange and/or compression development in chemical strengthening is rich or lean relative to each other. When chemical strengthening is used to treat the glass, the introduced compressive stress is often unevenly distributed.

當壓縮應力不均勻分佈於經化學強化玻璃中時,此可在藉由化學強化處理之玻璃中引入彎曲力矩且隨後引入誘導曲率。藉由化學強化引入誘導曲率之作用對於寬度較小之玻璃物品尤其明顯。此情況在寬度較小(諸如小於25毫米)之平板玻璃中通常成問題,因為較薄玻璃中之彎曲力矩由化學強化引入較大曲率。寬度為2.0mm或小於2.0mm之漂浮玻璃基板,且尤其寬度為1.0mm或小於1.0mm之漂浮玻璃基板經常存在具有經由化學強化引入之高度顯著曲率的問題。 When the compressive stress is unevenly distributed in the chemically strengthened glass, this can introduce a bending moment in the glass by chemical strengthening treatment and then introduce an induced curvature. The effect of introducing induced curvature by chemical strengthening is especially pronounced for glass articles of smaller width. This situation is often problematic in flat glass with a small width, such as less than 25 mm, because the bending moment in thinner glass introduces greater curvature by chemical strengthening. A floating glass substrate having a width of 2.0 mm or less, and particularly a floating glass substrate having a width of 1.0 mm or less, often has a problem of having a highly significant curvature introduced by chemical strengthening.

誘導曲率經常為不良的,且在根據製造說明書製造要求與化學強化相關之增強之物理性質(但無顯著誘導曲率)的薄平板玻璃物品中尤其成問題。舉例而言,許多所製造電子物品(諸如用於「智慧型」手機之顯示器)中所用玻璃經常需要基本上平坦且強度及耐磨性較高的顯示玻璃。 Induced curvature is often undesirable and is particularly problematic in thin flat glass articles that require enhanced physical properties associated with chemical strengthening (but without significant induced curvature) in accordance with the manufacturing instructions. For example, the glass used in many manufactured electronic articles, such as displays for "smart" mobile phones, often requires a display glass that is substantially flat and has high strength and wear resistance.

對薄平板玻璃基板(諸如具有兩個主要表面及玻璃內化學結構或組成變化之物品)進行化學強化經常與基板之主要表面之間非等效的入侵鹼離子相互擴散及/或壓縮產生性質相關。該作用在於,玻璃中在約中間平面與距玻璃物品中間平面之距離相關的局部力在比較時並不相等,因為此等力自貧處理表面至中間平面及自富處理表面至中間平面存在。因此,玻璃中在約中間平面之淨彎曲力矩非零(亦即,在約中間平面存在應力之非零淨彎曲力矩)。因此,產生彎曲應力。 Chemical strengthening of thin flat glass substrates, such as articles having two major surfaces and variations in chemical structure or composition within the glass, is often associated with non-equivalent intrusive alkali ion interdiffusion and/or compression generation properties between the major surfaces of the substrate. . The effect is that the local forces in the glass in relation to the distance from the median plane to the median plane of the glass article are not equal when compared, since such forces are present from the lean processing surface to the intermediate plane and from the rich processing surface to the intermediate plane. Thus, the net bending moment in the glass at about the median plane is non-zero (i.e., there is a non-zero net bending moment of stress in the midplane). Therefore, bending stress is generated.

對於具有薄截面之玻璃物品,來自化學強化之彎曲應力經常在 玻璃物品中產生自平坦之撓曲。此情況在由漂浮玻璃法製造之玻璃中尤其常見。但撓曲亦在由其他方法製造之玻璃中產生,該等玻璃在玻璃內之化學結構或組成方面具有變化。使用漂浮玻璃製程製造之薄玻璃經常在化學強化之後呈現可量測的曲率。曲率方向經常於在允許入侵鹼離子相互擴散方面「較貧」之表面上為凹面且於在允許入侵鹼離子相互擴散方面「較富」之表面上為凸面。 For glass articles with thin cross sections, the bending stress from chemical strengthening is often Self-flattening deflection occurs in glass articles. This situation is especially common in glass made by the floating glass process. However, deflection is also produced in glass made by other methods which have variations in the chemical structure or composition within the glass. Thin glass made using a floating glass process often exhibits a measurable curvature after chemical strengthening. The direction of curvature is often concave on the surface that is "poor" in allowing diffusion of alkali ions to interdiffuse and is convex on the surface that is "rich" in allowing interdiffusion of alkali ions.

近年來,已作出各種努力試圖來克服與玻璃之化學強化相關之誘導曲率的問題。一種方法涉及在化學強化之前磨削並拋光玻璃基板。進行磨削及拋光以移除玻璃之化學組成及/或結構不同之部分。此方法之一實例為對利用漂浮法製造之平板玻璃進行磨削及拋光以移除含有大量錫之表面層。然而,磨削及拋光漂浮玻璃經常引入磨損且可引入其他物理缺陷。此等缺陷由與執行磨削及拋光相關之時間及費用增加而嚴重。 In recent years, various attempts have been made to overcome the problem of induced curvature associated with chemical strengthening of glass. One method involves grinding and polishing a glass substrate prior to chemical strengthening. Grinding and polishing to remove portions of the glass that differ in chemical composition and/or structure. An example of such a method is the grinding and polishing of flat glass made by a float process to remove a surface layer containing a large amount of tin. However, grinding and polishing of floating glass often introduces wear and can introduce other physical defects. These defects are severely affected by the increased time and expense associated with performing grinding and polishing.

其他方法已涉及在化學強化之前進行所製備之玻璃之二次化學處理。利用二次化學處理以求解決玻璃中不同位置處化學組成及/或結構差異。然而,二次化學處理可改變玻璃之物理性質及以其他方式劣化經由後續化學強化產生之玻璃。此外,如同磨削及拋光,二次化學處理涉及在化學強化之前進行的額外處理之時間及費用。 Other methods have involved secondary chemical treatment of the prepared glass prior to chemical strengthening. Secondary chemical treatment is utilized to address chemical composition and/or structural differences at different locations in the glass. However, secondary chemical treatment can alter the physical properties of the glass and otherwise degrade the glass produced by subsequent chemical strengthening. In addition, like grinding and polishing, the secondary chemical treatment involves the time and expense of additional processing prior to chemical strengthening.

鑒於前述,需要經化學強化玻璃及製造經化學強化玻璃之方法,其中強化玻璃具有減小之誘導曲率。亦需要強化玻璃不具有與在與玻璃化學強化相關之先前方法中應用之磨削及拋光或二次化學處理相關的缺陷。亦需要具有減小之誘導曲率之強化玻璃亦具有經化學強化玻璃之改進的物理性質,諸如較高強度、較高耐磨性及/或較高耐熱震性。 In view of the foregoing, there is a need for a method of chemically strengthening glass and making a chemically strengthened glass wherein the strengthened glass has a reduced induced curvature. There is also a need for tempered glass that does not have the drawbacks associated with grinding and polishing or secondary chemical processing applied in prior methods associated with chemical strengthening of glass. It is also desirable that the tempered glass having a reduced induced curvature also has improved physical properties of the chemically strengthened glass, such as higher strength, higher wear resistance, and/or higher thermal shock resistance.

提供此發明內容以介紹概念之選擇。下文在實施方式中結合隨 附圖式進一步描述此等概念。此發明內容不意欲識別所主張之主題的關鍵特徵或基本特徵,此發明內容亦不意欲輔助決定所主張之主題之範疇。 This summary is provided to introduce a selection of concepts. Combined with the following in the embodiment The drawings further describe such concepts. This Summary is not intended to identify key features or essential features of the claimed subject matter, and is not intended to assist in determining the scope of the claimed subject matter.

根據一實施,存在製造強化基板之方法。該方法包括提供基板。所提供之基板可具有約25.0毫米之寬度。所提供之基板之特徵可在於具有玻璃化學結構,該玻璃化學結構包括位於玻璃化學結構中之具有平均離子半徑之主體鹼離子。所提供之基板之特徵可在於具有維度區域,該等維度區域包括彼此相對安置於所提供之基板中之富處理區域(treatment-rich volume)及貧處理區域(treatment-poor volume)。該方法包括將所提供之基板加熱至熱處理溫度後持續熱處理時間以產生經熱處理基板。熱處理溫度可約250℃且最高熱處理溫度。熱處理時間可為約0.001-50小時以產生經熱處理基板,且若熱處理溫度可約325、350或400℃中之一者,則熱處理時間可約2小時。該方法可包括提供交換介質。交換介質可包括平均離子半徑比主體鹼離子之平均離子半徑大的入侵鹼離子。該方法可包括使經熱處理基板暴露於交換介質。該方法可包括在使經熱處理基板暴露於交換介質的同時進行離子交換以產生強化基板。強化基板可包括深度為約1-500μm之壓縮應力層。 According to one implementation, there is a method of manufacturing a reinforced substrate. The method includes providing a substrate. The substrate provided may have A width of about 25.0 mm. The substrate provided may be characterized by having a glass chemical structure comprising a bulk alkali ion having an average ionic radius in the glass chemical structure. The substrate provided may be characterized by having a dimensional region comprising a treatment-rich volume and a treatment-poor volume disposed opposite each other in the provided substrate. The method includes heating the provided substrate to a heat treatment temperature for a heat treatment time to produce a heat treated substrate. Heat treatment temperature About 250 ° C and The highest heat treatment temperature. The heat treatment time may be about 0.001-50 hours to produce a heat treated substrate, and if the heat treatment temperature is For one of about 325, 350 or 400 ° C, the heat treatment time can be About 2 hours. The method can include providing an exchange medium. The exchange medium can include invading alkali ions having an average ionic radius greater than the average ionic radius of the bulk alkali ions. The method can include exposing the heat treated substrate to an exchange medium. The method can include ion exchange to produce a strengthened substrate while exposing the heat treated substrate to an exchange medium. The reinforced substrate may include a compressive stress layer having a depth of about 1-500 μm.

所提供之基板較佳具有約2.0毫米之寬度。熱處理溫度較佳為約450-650℃。熱處理溫度較佳為約400-750℃。較佳若熱處理溫度約400℃,則熱處理時間約2小時。強化基板較佳具有深度為約5-200μm之壓縮應力層。進行離子交換較佳在約0.1至50小時之離子交換時間期間進行。進行離子交換較佳在約200℃至1,400℃之離子交換溫度下進行。所提供之基板較佳為平坦的。較佳的是,熱處理時間0.5小時,且若熱處理時間為約0.5-1小時,則熱處理溫度約500℃;若熱處理時間約1-3小時,則熱處理溫度約475℃;若熱處理時間約3-6小 時,則熱處理溫度約450℃;若熱處理時間約6-12小時,則熱處理溫度約425℃;若熱處理時間約12-18小時,則熱處理溫度約400℃;且若熱處理時間約18-25小時,則熱處理溫度約375℃。較佳的是,熱處理時間0.5小時,且若熱處理時間為約0.5-1小時,則熱處理溫度約575℃;若熱處理時間約1-3小時,則熱處理溫度約550℃;若熱處理時間約3-6小時,則熱處理溫度約525℃;若熱處理時間約6-12小時,則熱處理溫度約500℃;若熱處理時間約12-18小時,則熱處理溫度約475℃;且若熱處理時間約18-25小時,則熱處理溫度約450℃。較佳的是,熱處理時間0.5小時,且若熱處理時間為約0.5-1小時,則熱處理溫度約650℃;若熱處理時間約1-3小時,則熱處理溫度約625℃;若熱處理時間約3-6小時,則熱處理溫度約600℃;若熱處理時間約6-12小時,則熱處理溫度約575℃;若熱處理時間約12-18小時,則熱處理溫度約550℃;且若熱處理時間約18-25小時,則熱處理溫度約525℃。該方法較佳進一步包含將經熱處理基板冷卻至約150℃之冷卻溫度以產生冷卻之經熱處理基板;且將冷卻之經熱處理基板加熱至約250℃且最高熱處理溫度之熱處理溫度後持續約0.01-50小時之熱處理時間以產生經熱處理基板。所提供之基板較佳在該基板中之化學組成及化學結構中至少一者包含變化,且與富處理區域中相比,貧處理區域中化學組成及化學結構中之至少一者不同。交換介質較佳為液體、固體、氣體及其混合物中之一者。富處理區域及貧處理區域較佳徑向相對地安置在基板中。該方法較佳為連續製程及分批製程中之一者。所提供之基板較佳包含鹼鋁矽酸鹽玻璃及鈉鈣矽酸鹽玻璃中之一者。 The substrate provided preferably has Width of about 2.0 mm. The heat treatment temperature is preferably about 450 to 650 °C. The heat treatment temperature is preferably about 400 to 750 °C. Preferred if the heat treatment temperature Heat treatment time at about 400 ° C About 2 hours. The reinforced substrate preferably has a compressive stress layer having a depth of about 5 to 200 μm. The ion exchange is preferably carried out during an ion exchange time of from about 0.1 to 50 hours. The ion exchange is preferably carried out at an ion exchange temperature of from about 200 ° C to 1,400 ° C. The substrate provided is preferably flat. Preferably, the heat treatment time 0.5 hour, and if the heat treatment time is about 0.5-1 hour, the heat treatment temperature About 500 ° C; if heat treatment time Heat treatment temperature for about 1-3 hours About 475 ° C; if heat treatment time Heat treatment temperature for about 3-6 hours About 450 ° C; if heat treatment time Heat treatment temperature for about 6-12 hours About 425 ° C; if heat treatment time Heat treatment temperature for about 12-18 hours About 400 ° C; and if heat treatment time Heat treatment temperature for about 18-25 hours About 375 ° C. Preferably, the heat treatment time 0.5 hour, and if the heat treatment time is about 0.5-1 hour, the heat treatment temperature About 575 ° C; if heat treatment time Heat treatment temperature for about 1-3 hours About 550 ° C; if heat treatment time Heat treatment temperature for about 3-6 hours About 525 ° C; if heat treatment time Heat treatment temperature for about 6-12 hours About 500 ° C; if heat treatment time Heat treatment temperature for about 12-18 hours About 475 ° C; and if heat treatment time Heat treatment temperature for about 18-25 hours About 450 ° C. Preferably, the heat treatment time 0.5 hour, and if the heat treatment time is about 0.5-1 hour, the heat treatment temperature About 650 ° C; if heat treatment time Heat treatment temperature for about 1-3 hours About 625 ° C; if heat treatment time Heat treatment temperature for about 3-6 hours About 600 ° C; if heat treatment time Heat treatment temperature for about 6-12 hours About 575 ° C; if heat treatment time Heat treatment temperature for about 12-18 hours About 550 ° C; and if heat treatment time Heat treatment temperature for about 18-25 hours About 525 ° C. The method preferably further comprises cooling the heat treated substrate to a cooling temperature of about 150 ° C to produce a cooled heat treated substrate; and heating the cooled heat treated substrate to About 250 ° C and The heat treatment temperature of the highest heat treatment temperature is followed by a heat treatment time of about 0.01 to 50 hours to produce a heat-treated substrate. Preferably, the substrate provided comprises at least one of a chemical composition and a chemical structure in the substrate, and at least one of a chemical composition and a chemical structure in the lean region is different from that in the rich treatment region. The exchange medium is preferably one of a liquid, a solid, a gas, and a mixture thereof. The rich treatment zone and the lean treatment zone are preferably disposed diametrically opposite each other in the substrate. The method is preferably one of a continuous process and a batch process. The substrate provided preferably comprises one of an alkali aluminosilicate glass and a soda lime silicate glass.

根據另一實施,存在製造之物品。物品包括強化基板。強化基板可具有約25.0毫米之寬度。強化基板可具有深度為約1-500μm之壓縮應力層。強化基板之特徵可在於具有玻璃化學結構,該玻璃化學 結構包括位於玻璃化學結構中之鹼離子。強化基板可具有維度區域,該等維度區域包括包括基板之富表面之富處理區域及包括基板之貧表面的貧處理區域。貧處理區域之特徵可在於在化學組成及化學結構中至少一者與富處理區域不同。強化基板亦可包括基板內之主體區域,其鄰近富處理區域及貧處理區域中之至少一者。強化基板可在貧處理區域及富處理區域中之至少一者中包括金屬濃度。貧處理區域及富處理區域中之至少一者中之金屬濃度可比主體區域中之金屬濃度高約0.4莫耳%。貧處理區域中之金屬濃度可高於富處理區域中之金屬濃度。強化基板可在富處理區域及貧處理區域中之至少一者之擴散深度中包括鹼離子濃度。富處理區域及貧處理區域中之至少一者之擴散深度中之鹼離子濃度可比主體區域中之鹼離子濃度高約0.5莫耳%。 According to another implementation, there is an article of manufacture. The article includes a reinforced substrate. The reinforcing substrate may have A width of about 25.0 mm. The reinforcing substrate may have a compressive stress layer having a depth of about 1-500 μm. The strengthened substrate may be characterized by having a glass chemical structure comprising alkali ions in a glass chemical structure. The reinforced substrate can have dimensional regions including a rich processing region including a rich surface of the substrate and a lean processing region including a poor surface of the substrate. The lean treatment zone may be characterized by at least one of a chemical composition and a chemical structure being different from the rich treatment zone. The reinforced substrate can also include a body region within the substrate adjacent at least one of the rich processing region and the lean processing region. The strengthened substrate can include a metal concentration in at least one of the lean processing region and the rich processing region. The concentration of metal in at least one of the lean region and the rich region may be higher than the concentration of metal in the body region About 0.4% by mole. The metal concentration in the lean treatment zone can be higher than the metal concentration in the rich treatment zone. The strengthened substrate may include an alkali ion concentration in a diffusion depth of at least one of the rich processing region and the lean processing region. The alkali ion concentration in the diffusion depth of at least one of the rich treatment zone and the lean treatment zone may be higher than the alkali ion concentration in the bulk region About 0.5% by mole.

富處理區域及貧處理區域中之至少一者較佳具有約5至150μm之擴散深度。強化玻璃基板較佳包含大於50莫耳% SiO2。經化學強化玻璃基板較佳在擴散深度中包含總共約1至25莫耳%之Li2O+Na2O+K2O,其中該擴散深度為約5至150μm。在強化基板中在約中間平面的淨彎曲力矩較佳為約零。 At least one of the rich treatment zone and the lean treatment zone preferably has a diffusion depth of about 5 to 150 μm. The tempered glass substrate preferably comprises greater than 50 mole% SiO 2. The chemically strengthened glass substrate preferably contains a total of about 1 to 25 mol% of Li 2 O+Na 2 O+K 2 O in the diffusion depth, wherein the diffusion depth is about 5 to 150 μm. The net bending moment at about the median plane in the reinforced substrate is preferably about zero.

根據另一實施,存在製造之物品。物品包括強化基板。強化基板可具有深度為約1-500μm之壓縮應力層。強化基板可由一種製程製造。該製程包括提供基板。所提供之基板可具有約25.0毫米之寬度。所提供之基板之特徵可在於具有玻璃化學結構,該玻璃化學結構包括位於玻璃化學結構中之具有平均離子半徑之主體鹼離子。所提供之基板之特徵可在於具有維度區域,該等維度區域包括彼此相對安置於所提供之基板中之富處理區域及貧處理區域。該方法包括將所提供之基板加熱至熱處理溫度後持續熱處理時間以產生經熱處理基板。熱處理溫度可約250℃且最高熱處理溫度。熱處理時間可為約0.001-50小時或約0.01-20小時以產生經熱處理基板,且若熱處理溫度可約 325、350或400℃中之一者,則熱處理時間可約2小時。該方法可包括提供交換介質。交換介質可包括平均離子半徑比主體鹼離子之平均離子半徑大的入侵鹼離子。該方法可包括使經熱處理基板暴露於交換介質。該方法可包括在使經熱處理基板暴露於交換介質的同時進行離子交換以產生強化基板。 According to another implementation, there is an article of manufacture. The article includes a reinforced substrate. The reinforcing substrate may have a compressive stress layer having a depth of about 1-500 μm. The reinforced substrate can be fabricated by a process. The process includes providing a substrate. The substrate provided may have A width of about 25.0 mm. The substrate provided may be characterized by having a glass chemical structure comprising a bulk alkali ion having an average ionic radius in the glass chemical structure. The substrate provided may be characterized by having a dimensional region comprising a rich processing region and a lean processing region disposed opposite each other in the provided substrate. The method includes heating the provided substrate to a heat treatment temperature for a heat treatment time to produce a heat treated substrate. Heat treatment temperature About 250 ° C and The highest heat treatment temperature. The heat treatment time may be about 0.001-50 hours or about 0.01-20 hours to produce a heat treated substrate, and if the heat treatment temperature is For one of about 325, 350 or 400 ° C, the heat treatment time can be About 2 hours. The method can include providing an exchange medium. The exchange medium can include invading alkali ions having an average ionic radius greater than the average ionic radius of the bulk alkali ions. The method can include exposing the heat treated substrate to an exchange medium. The method can include ion exchange to produce a strengthened substrate while exposing the heat treated substrate to an exchange medium.

上述發明內容並不意欲描述每個實施例或每個實施。其他特徵(其性質及各種優點)描述於隨附圖式以及實例及實施例之以下實施方式中。 The above summary is not intended to describe each embodiment or every implementation. Other features, their nature and various advantages are described in the following figures, as well as the examples and embodiments below.

100‧‧‧包括熱處理之化學強化製程 100‧‧‧Chemical strengthening process including heat treatment

200‧‧‧圖式 200‧‧‧ schema

300‧‧‧利用熱處理製造具有減小之誘導曲率之強化基板的例示性製程 300‧‧‧An exemplary process for producing a reinforced substrate with reduced induced curvature by heat treatment

併入本說明書且構成本說明書之一部分的隨附圖式說明本文中所述之一或多個實施例且同時描述說明此等實施例。另外,應瞭解該等圖式僅出於實例目的呈現。在該等圖式中:圖1為說明本文中所述之實施之例示性概述的流程圖;圖2為顯示在化學強化之前利用熱處理製造之例示性強化基板之性質的圖式;及圖3為說明利用熱處理製造強化基板之例示性製程之流程圖。 One or more of the embodiments described herein are described in conjunction with the specification and are described in conjunction with the specification. In addition, it should be understood that the drawings are presented for purposes of example only. In the drawings: FIG. 1 is a flow chart illustrating an exemplary overview of the implementations described herein; FIG. 2 is a diagram showing the properties of an exemplary reinforced substrate fabricated by heat treatment prior to chemical strengthening; and FIG. A flow chart for illustrating an exemplary process for fabricating a reinforced substrate using heat treatment.

以下實施方式參照隨附圖式。不同圖式中之相同參考數字可識別相同或相似要素。 The following embodiments are referred to with the accompanying drawings. The same reference numbers in different figures may identify the same or similar elements.

概述 Overview

本發明適用於製造經化學強化玻璃,且已發現對於製造具有減小之誘導曲率之經化學強化玻璃尤其有利。根據本發明之原則,經化學強化玻璃不具有與在化學強化之前進行時利用磨削及拋光或二次化學處理製得之經化學強化玻璃相關的缺陷。雖然本發明未必限於該等應用,但使用此上下文經由各種實例之論述瞭解本發明之各種態樣。 The present invention is applicable to the manufacture of chemically strengthened glass and has been found to be particularly advantageous for the manufacture of chemically strengthened glass having a reduced induced curvature. In accordance with the principles of the present invention, chemically strengthened glass does not have the drawbacks associated with chemically strengthened glass produced by grinding and polishing or secondary chemical treatment prior to chemical strengthening. Although the present invention is not necessarily limited to such applications, various aspects of the invention are apparent from the discussion of various examples.

圖1為說明本文中所述實施之例示性概述的流程圖。假定玻璃基 板在玻璃中不同位置或「區域」處在其化學組成及/或化學結構方面具有變化。一種類型變化存在於具有更易於藉由化學強化處理之化學組成及/或化學結構之區域中。此區域為「富處理」區域。另一類型變化存在於具有較不易於藉由化學強化處理之化學組成及/或化學結構之區域中。此為「貧處理」區域。 1 is a flow chart illustrating an illustrative overview of the implementations described herein. Assumed glass base The plates vary in their chemical composition and/or chemical structure at different locations or "zones" in the glass. One type of change exists in areas that have chemical compositions and/or chemical structures that are more susceptible to chemical strengthening treatment. This area is the "rich processing" area. Another type of variation exists in areas having chemical compositions and/or chemical structures that are less susceptible to chemical strengthening treatment. This is the "poor treatment" area.

術語「富處理區域」係指在應用於玻璃基板之等同化學強化條件下相對於「貧處理區域」在化學強化期間呈現較快鹼離子相互擴散及/或較大壓縮發展之玻璃基板的區域。區域可出現在基板表面處或表面下方之空間或層中。富處理區域或貧處理區域可為其中入侵鹼離子之擴散延伸至距表面給定「擴散深度」之玻璃基板之表面層,亦稱為穿透深度或擴散層。在化學強化中,擴散深度之一部分係在壓縮應力中,稱為「壓縮應力層」或「硬化深度」。硬化深度為在標本中之壓縮應力中之擴散層的寬度。玻璃中「主體區域」為未受入侵鹼離子擴散影響之區域。主體區域可存在於玻璃區域中,處於玻璃中入侵鹼離子或其他類型離子之擴散深度下方或鄰近該擴散深度。 The term "rich treatment zone" refers to the region of the glass substrate that exhibits faster inter-alkali ion interdiffusion and/or greater compression development during chemical strengthening relative to the "lean treatment zone" under equivalent chemical strengthening conditions applied to the glass substrate. The regions may appear in spaces or layers below or below the surface of the substrate. The rich treatment zone or the lean treatment zone may be a surface layer of a glass substrate in which diffusion of invading alkali ions extends to a given "diffusion depth" from the surface, also referred to as penetration depth or diffusion layer. In chemical strengthening, one part of the diffusion depth is in the compressive stress, which is called "compressive stress layer" or "hardening depth". The depth of hardening is the width of the diffusion layer in the compressive stress in the specimen. The "body region" in the glass is an area that is not affected by the diffusion of invading alkali ions. The body region may be present in the glass region below or adjacent to the diffusion depth of the invading alkali ions or other types of ions in the glass.

根據本發明之原理,所提供之基板在化學強化之前在「熱處理」中在加熱下處理以形成「經熱處理基板」。熱處理可藉由使所提供之基板暴露於「熱處理溫度」持續「熱處理時間」來執行。在化學強化之前用於熱處理之時間及溫度的量在各種類型玻璃之情況下顯著不同。 In accordance with the principles of the present invention, the substrate provided is treated under heat in a "heat treatment" prior to chemical strengthening to form a "heat treated substrate." The heat treatment can be performed by exposing the supplied substrate to "heat treatment temperature" for "heat treatment time". The amount of time and temperature used for heat treatment prior to chemical strengthening is significantly different in the case of various types of glass.

申請人已發現藉由在化學強化之前利用熱處理製程來產生經熱處理基板,誘導曲率在經化學強化基板中減小。與熱處理相關之誘導曲率減小在較薄玻璃基板(諸如寬度為約25.0毫米或小於25.0毫米之玻璃基板)中尤其顯著。在具有在化學強化期間產生之較深硬化深度之玻璃基板中亦已證明誘導曲率明顯減小。較深硬化深度可以不同方式產生,諸如藉由針對化學強化在進行離子交換中利用延長之離子交換 時間及/或較高離子交換溫度來進行。 Applicants have discovered that by using a heat treatment process prior to chemical strengthening to create a heat treated substrate, the induced curvature is reduced in the chemically strengthened substrate. The induced curvature reduction associated with heat treatment is particularly pronounced in thinner glass substrates such as glass substrates having a width of about 25.0 mm or less. A significant reduction in induced curvature has also been demonstrated in glass substrates having a deeper depth of hardening that occurs during chemical strengthening. Deeper hardening depths can be produced in different ways, such as by utilizing extended ion exchange in ion exchange for chemical strengthening Time and / or higher ion exchange temperature to carry out.

如圖1中所示,證明包括熱處理之化學強化製程100之例示性實施。 As shown in FIG. 1, an exemplary implementation of a chemical strengthening process 100 including heat treatment is demonstrated.

在步驟102,提供「薄」玻璃基板,其具有至少兩個不同區域,亦即如上所述之富處理區域及貧處理區域。 At step 102, a "thin" glass substrate is provided having at least two distinct regions, namely a rich processing region and a lean processing region as described above.

在步驟104,藉由使玻璃暴露於溫度T持續時間段P以對所提供之基板施加熱處理。時間P可不同且可受熱處理中對於T之溫度的影響。較低T溫度可能需要較長時間P來達成誘導曲率之明顯減小。一般而言,P之最短時間段為至少約0.001小時且P之最長時間段可高達50小時或更長。一般而言,T之最低溫度為至少約250℃,且T之最高溫度可達至最高熱處理溫度。若熱處理溫度約325℃或約400℃,則熱處理時間可約2小時。熱處理溫度可為約400-750℃或約450-650℃。 At step 104, a heat treatment is applied to the provided substrate by exposing the glass to a temperature T for a period of time P. The time P can be different and can be affected by the temperature of T in the heat treatment. A lower T temperature may take a longer time P to achieve a significant reduction in induced curvature. In general, the shortest period of time for P is at least about 0.001 hours and the longest period of time for P can be as high as 50 hours or longer. In general, the minimum temperature of T is at least about 250 ° C, and the maximum temperature of T can reach the highest heat treatment temperature. If heat treatment temperature About 325 ° C or About 400 ° C, the heat treatment time can be About 2 hours. The heat treatment temperature may be about 400-750 ° C or about 450-650 ° C.

最高熱處理溫度為玻璃可變形或液化之溫度且可視玻璃及玻璃基板之類型及性質而變化。熟習此項技術者瞭解,變形由隨溫度增加而快速減小之玻璃黏度引起。因此,可使用較短熱處理時間及/或較低熱處理溫度以便避免根據本發明原理經歷熱處理之玻璃基板中的可量測變形。若採取措施防止待經歷熱處理之基板變形,諸如藉由在經歷熱處理之基板周圍添加支撐物來進行,則支撐物之存在有助於防止基板變形且增大基板之最高熱處理溫度。舉例而言,一些鈉鈣矽酸鹽玻璃基板之最高熱處理溫度為約500℃至800℃。在另一實例中,一些鋁矽酸鈉玻璃基板之最高熱處理溫度為約600℃至900℃。熟習此項技術者已知用於化學強化應用之大多數類型玻璃組合物及玻璃基板之變形溫度。 The highest heat treatment temperature is the temperature at which the glass can be deformed or liquefied and can vary depending on the type and nature of the glass and glass substrate. Those skilled in the art understand that deformation is caused by the viscosity of the glass that decreases rapidly with increasing temperature. Thus, shorter heat treatment times and/or lower heat treatment temperatures can be used in order to avoid measurable deformation in the glass substrate undergoing heat treatment in accordance with the principles of the present invention. If measures are taken to prevent deformation of the substrate to be subjected to heat treatment, such as by adding a support around the substrate subjected to heat treatment, the presence of the support helps to prevent deformation of the substrate and increase the maximum heat treatment temperature of the substrate. For example, some soda-calcium silicate glass substrates have a maximum heat treatment temperature of about 500 ° C to 800 ° C. In another example, some of the sodium aluminosilicate glass substrates have a maximum heat treatment temperature of from about 600 °C to 900 °C. The deformation temperatures of most types of glass compositions and glass substrates known for use in chemical strengthening applications are well known to those skilled in the art.

在步驟106,使經熱處理基板暴露於交換介質以用於進行離子交換,從而產生強化玻璃基板。在離子交換期間,壓縮應力層或硬化深 度在經熱處理基板中發展從而形成強化玻璃基板。當在步驟106中施用交換介質時,進行化學強化以產生誘導曲率已經減小之強化基板,因為誘導曲率之較小量測值因熱處理而產生。在不希望受任何特定理論束縛之情況下,離子交換之前的熱處理似乎減小將在其他情況下由玻璃基板之化學強化產生之誘導曲率。 At step 106, the heat treated substrate is exposed to an exchange medium for ion exchange to produce a strengthened glass substrate. Compressive stress layer or hardened depth during ion exchange The degree is developed in the heat-treated substrate to form a strengthened glass substrate. When the exchange medium is applied in step 106, chemical strengthening is performed to produce a strengthened substrate having an induced curvature that has been reduced because a smaller measurement of the induced curvature is produced by the heat treatment. Without wishing to be bound by any particular theory, the heat treatment prior to ion exchange appears to reduce the induced curvature that would otherwise be produced by chemical strengthening of the glass substrate.

出於簡明及說明目的,本發明藉由主要參照其實施例、原理及實例來描述。在以下描述中,闡述大量特定細節以便提供對實例之澈底瞭解。然而,易於顯而易見的是,實施例可在不限於此等特定細節之情況下實踐。在其他情況下,一些實施例尚未經詳細描述以免不必要地混淆該描述。此外,下文描述不同實施例。實施例可在不同組合中共同使用或執行。 The present invention has been described with reference to the embodiments, principles, and examples thereof for the purpose of illustration and description. In the following description, numerous specific details are set forth in order to provide a However, it will be readily apparent that the embodiments may be practiced without limitation to the specific details. In other instances, some embodiments have not been described in detail so as not to unnecessarily obscure the description. Further, various embodiments are described below. Embodiments may be used or executed in different combinations.

某些實施例之操作及作用可自如下文所述之實例更充分地瞭解。此等實例所基於之實施例僅為代表性的。用於說明本發明原理之此等實施例之選擇並不指示實例中未描述之材料、組分、反應物、條件、技術、組態及設計等並不適於使用,或實例中未描述之主題自隨附申請專利範圍或其等效物之範疇中排除。實例之意義可藉由將由其獲得之結果與可自測試或試驗獲得之可能結果比較來更好地瞭解,該等測試或試驗可能或可能已經被設計成充當對照實驗且提供比較之基礎。 The operation and function of certain embodiments can be more fully understood from the examples described below. The examples on which these examples are based are merely representative. The choice of such embodiments for illustrating the principles of the present invention does not indicate that the materials, components, reagents, conditions, techniques, configurations, designs, etc., which are not described in the examples, are not suitable for use, or are not described in the examples. Excluded from the scope of the accompanying patent application or its equivalent. The meaning of the examples can be better understood by comparing the results obtained therefrom with comparable results that can be obtained from testing or testing, which may or may have been designed to serve as a control experiment and provide a basis for comparison.

如本文所用,術語「基於」、「包含(comprises)」、「包含(comprising)」、「包括(includes)」、「包括(including)」、「具有(has)」、「具有(having)」或其任何其他變化形式意欲涵蓋非排他性的包含。舉例而言,包含要素清單之製程、方法、物品或裝置不必僅限於該等要素,但可包括未明確列出或該製程、方法、物品或裝置所固有之其他要素。此外,除非與此相反的明確說明,否則「或」係指包括性的或而非排他性的或。舉例而言,條件A或B由以下中之任一者得到滿 足:A為真(或存在)且B為假(或不存在)、A為假(或不存在)且B為真(或存在)、以及A及B均為真(或存在)。此外,使用「一個(種)(a或an)」來描述要素及組分。此舉僅為方便起見進行且給出描述之一般含義。此描述應解讀為包括一個(種)或至少一個(種),且單數亦包括複數,除非明顯為其他意思。 As used herein, the terms "based on", "comprises", "comprising", "includes", "including", "has", "having" Or any other variation thereof is intended to cover non-exclusive inclusions. For example, a process, method, article, or device that comprises a list of elements is not necessarily limited to those elements, but may include other elements not specifically listed or inherent to the process, method, article, or device. In addition, unless expressly stated to the contrary, "or" is meant to be inclusive or non-exclusive. For example, condition A or B is full by any of the following Foot: A is true (or exists) and B is false (or non-existent), A is false (or non-existent) and B is true (or exists), and both A and B are true (or present). In addition, "a" or "an" is used to describe elements and components. This is done for convenience only and gives the general meaning of the description. This description should be read to include one or a singular, and the singular includes the plural unless the meaning is otherwise.

本文中所用縮寫及某些術語之意義如下:「mm」意謂毫米,「μm」意謂微米(micrometer)或微米(micron),「g」意謂公克,「mg」意謂毫克,「μg」意謂微克,「L」意謂公升,「mL」意謂毫升,「cc」意謂立方公分,「cc/g」意謂立方公分/公克,「mol」意謂莫耳,「mmol」意謂毫莫耳,「wt%」意謂重量%且「mol%」意謂莫耳%。 The meanings of abbreviations and some terms used herein are as follows: "mm" means millimeter, "μm" means micrometer or micron, "g" means gram, "mg" means milligram, "μg "M" means liters, "L" means liters, "mL" means milliliters, "cc" means cubic centimeters, "cc/g" means cubic centimeters / gram, "mol" means mur, "mmol" It means nothing, "wt%" means weight% and "mol%" means mol%.

例示性基板玻璃 Exemplary substrate glass

如本文所用,「玻璃基板」可包含任何種類之離子可交換玻璃或其中離子可交換相為玻璃之玻璃-陶瓷。玻璃之實例包括鈉鈣矽酸鹽玻璃、鹼鋁矽酸鹽玻璃或鹼鋁硼矽酸鹽玻璃,但涵蓋其他玻璃組合物,包括其中玻璃形成組分不含二氧化矽,諸如三氧化二硼(硼酸鹽)、氧化磷(磷酸鹽)、氧化鋁(鋁酸鹽)等的玻璃。如本文所用,「離子可交換」意謂玻璃能夠以來自交換介質(其可為液體、固體、氣體或其混合物)之較大鹼離子(亦即「入侵鹼離子」)交換位於該玻璃之玻璃結構中(諸如在基板表面處或附近)之鹼離子(亦即「主體鹼離子」)。「離子交換速率」係指入侵離子經一段時間進入基板之量。玻璃可在玻璃中不同位置或「區域」處具有化學組成及/或化學結構變化。化學組成變化之一實例為過量金屬,諸如金屬離子或金屬之其他形式,且可包括金屬物質(諸如錫或鉛)。一實例為殘留在由漂浮玻璃法製造之平板玻璃中的金屬,諸如錫。化學結構變化之一實例為玻璃中存在元素,其中該元素可在整個不同區域中具有不同價數,諸如錫以Sn2+及Sn4+價數存在於不同區域中。在此實例中,不同形式之錫在 不同區域中形成不同化學結構。 As used herein, a "glass substrate" can comprise any type of ion exchangeable glass or a glass-ceramic in which the ion exchangeable phase is glass. Examples of glass include soda lime silicate glass, alkali aluminosilicate glass or alkali aluminoborosilicate glass, but encompass other glass compositions, including wherein the glass forming component does not contain cerium oxide, such as boron trioxide. Glass such as (borate), phosphorus oxide (phosphate), or alumina (aluminate). As used herein, "ion exchangeable" means that the glass is capable of exchanging glass located in the glass with a larger alkali ion (ie, "invasive alkali ion") from an exchange medium (which may be a liquid, a solid, a gas, or a mixture thereof). Alkali ions (ie, "host alkali ions") in the structure (such as at or near the surface of the substrate). "Ion exchange rate" refers to the amount of invading ions entering the substrate over a period of time. The glass may have chemical composition and/or chemical structural changes at various locations or "zones" in the glass. An example of a change in chemical composition is an excess of a metal, such as a metal ion or other form of metal, and may include a metallic species such as tin or lead. An example is a metal such as tin remaining in a flat glass made by a floating glass process. An example of a chemical structural change is the presence of an element in the glass, wherein the element may have different valences throughout the different regions, such as tin being present in different regions as Sn 2+ and Sn 4+ valences. In this example, different forms of tin form different chemical structures in different regions.

基板玻璃之例示性實施例包括矽酸鹽玻璃,諸如鈉鈣矽酸鹽玻璃或鋁矽酸鈉玻璃,其包括氧化鋁、至少一種鹼金屬及在一些實施例中大於50莫耳% SiO2,在其他實施例中至少58莫耳% SiO2且在其他實施例中至少60莫耳% SiO2。玻璃基板之例示性實施例包括具有例如約25、20、15、10、8、6、5、4、3、2、1、0.7、0.5、0.25及0.1mm之一或多種寬度之基板。基板玻璃之常見寬度及類型為自寬度為0.7mm之漂浮玻璃之母體片材切割的試片。例示性試片之長度及截面積可不同且在化學強化之前在基板之一部分中可為平坦或彎曲的。 Illustrative embodiments of substrate glass include silicate glass, such as soda-calcium silicate glass or sodium aluminosilicate glass, which includes aluminum oxide, at least one alkali metal, and in some embodiments, greater than 50 mole % SiO 2 , In other embodiments at least 58 mole % SiO 2 and in other embodiments at least 60 mole % SiO 2 . An exemplary embodiment of a glass substrate includes a substrate having one or more widths of, for example, about 25, 20, 15, 10, 8, 6, 5, 4, 3, 2, 1, 0.7, 0.5, 0.25, and 0.1 mm. The common width and type of substrate glass is a test piece cut from a mother sheet of floating glass having a width of 0.7 mm. The length and cross-sectional area of an exemplary test piece can vary and can be flat or curved in one portion of the substrate prior to chemical strengthening.

例示性熱處理參數 Exemplary heat treatment parameters

在不希望受任何特定理論束縛之情況下,根據本發明之原理,熱處理似乎在玻璃基板之至少貧處理區域內引起一些化學變化或反應。該變化可經由化學物質自基板周圍之氛圍或其他外部介質之擴散發生。或該化學變化或反應可自貧處理區域自身內發生。 Without wishing to be bound by any particular theory, the heat treatment appears to cause some chemical change or reaction in at least the lean region of the glass substrate in accordance with the principles of the present invention. This change can occur via diffusion of chemicals from the atmosphere surrounding the substrate or other external media. Or the chemical change or reaction can occur from within the lean treatment zone itself.

申請人已發現,熱處理製程在根據本發明原理化學強化之前時向玻璃基板施用時可經施用以達成誘導曲率之所需減小。熱處理溫度及熱處理時間可利用與玻璃基板之最高熱處理溫度及所需量之減小之誘導曲率有關的經驗關係式粗略估計。該經驗關係式為: Applicants have discovered that the heat treatment process can be applied to achieve a desired reduction in induced curvature when applied to a glass substrate prior to chemical strengthening prior to the principles of the present invention. The heat treatment temperature and heat treatment time can be roughly estimated using an empirical relationship relating to the maximum heat treatment temperature of the glass substrate and the reduced induced curvature of the desired amount. The empirical relationship is:

其中「t」為熱處理時間(小時),「n」為經驗常數,「m」為最高熱處理溫度(℃),且「T」為熱處理溫度(℃)。 Wherein "t" is the heat treatment time (hours), "n" is the empirical constant, "m" is the highest heat treatment temperature (°C), and "T" is the heat treatment temperature (°C).

因此,可針對給定熱處理溫度「T」針對具有最高熱處理溫度「m」之玻璃基板確定熱處理時間「t」。熟悉擴散科學者亦可瞭解,受 擴散影響之反應層之寬度將隨時間之平方根而增加。因此,較高溫度或較長時間段有利於誘導曲率之較高減小。在較高溫度下,較短熱處理時間可為足夠的,而在較低溫度下,可使用較長熱處理時間。 Therefore, the heat treatment time "t" can be determined for the glass substrate having the highest heat treatment temperature "m" for a given heat treatment temperature "T". Those who are familiar with the proliferation science can also understand The width of the reaction layer affected by diffusion will increase with the square root of time. Therefore, a higher temperature or a longer period of time facilitates a higher reduction in induced curvature. At higher temperatures, shorter heat treatment times may be sufficient, while at lower temperatures, longer heat treatment times may be used.

舉例而言,對於寬度小於約2mm但超過約0.25mm之鈉鈣矽酸鹽玻璃基板,「n」及「m」之適合值分別可為0.00111小時/(℃)2及600℃。因此,對於此等鈉鈣矽酸鹽玻璃基板,若熱處理時間約1小時,則所用熱處理溫度約575℃。若熱處理時間約3小時,則所用熱處理溫度約550℃。若熱處理時間約6小時,則所用熱處理溫度約525℃。若熱處理時間約12小時,則所用熱處理溫度約500℃。若熱處理時間約18小時,則所用熱處理溫度約475℃。若熱處理時間約25小時,則所用熱處理溫度約450℃。 For example, for a soda lime silicate glass substrate having a width of less than about 2 mm but more than about 0.25 mm, suitable values for "n" and "m" may be 0.00111 hours/(°C) 2 and 600 ° C, respectively. Therefore, for these soda-calcium silicate glass substrates, if heat treatment time Heat treatment temperature for about 1 hour About 575 ° C. If heat treatment time Heat treatment temperature for about 3 hours About 550 ° C. If heat treatment time Heat treatment temperature for about 6 hours About 525 ° C. If heat treatment time Heat treatment temperature for about 12 hours About 500 ° C. If heat treatment time Heat treatment temperature of about 18 hours About 475 ° C. If heat treatment time Heat treatment temperature of about 25 hours About 450 ° C.

可使用之熱處理溫度可廣泛變化且可保持恆定或為不同溫度之平均值。可用於熱處理之熱處理溫度之例示性實施例包括約250℃至1,500℃。對於一些類型鈉鈣矽酸鹽玻璃,可使用高於約450℃且較佳高於約500℃之熱處理溫度。各種類型玻璃之其他例示性熱處理溫度包括約250、300、400、500、600、700、800、900、1,000、1,100、1,200、1,300、1,400及1,500℃或更高溫度。 The heat treatment temperature that can be used can vary widely and can be kept constant or averaged over different temperatures. Illustrative examples of heat treatment temperatures that can be used for heat treatment include from about 250 °C to 1,500 °C. For some types of soda-calcium silicate glasses, heat treatment temperatures above about 450 ° C and preferably above about 500 ° C can be used. Other exemplary heat treatment temperatures for various types of glass include temperatures of about 250, 300, 400, 500, 600, 700, 800, 900, 1,000, 1, 100, 1, 200, 1, 300, 1, 400, and 1,500 ° C or higher.

可使用之熱處理時間段可廣泛變化且可為連續或不連續的。可用於熱處理之熱處理時間之例示性實施例包括約0.001至50小時。對於一些類型鈉鈣矽酸鹽玻璃,例如可使用約1至6小時之熱處理時間。各種類型玻璃之其他例示性熱處理時間包括約0.001、0.01、0.1、0.5、1、2、4、5、6、8、10、20、25及50小時或更長之時間(以小時為單位)。 The heat treatment time period that can be used can vary widely and can be continuous or discontinuous. Illustrative examples of heat treatment times that can be used for heat treatment include from about 0.001 to 50 hours. For some types of soda-calcium silicate glass, for example, a heat treatment time of about 1 to 6 hours can be used. Other exemplary heat treatment times for various types of glass include about 0.001, 0.01, 0.1, 0.5, 1, 2, 4, 5, 6, 8, 10, 20, 25, and 50 hours or longer (in hours). .

根據一例示性實施例,熱處理時間0.5小時且若熱處理時間為約0.5-1小時,則所用熱處理溫度約575℃;若熱處理時間約1-3小時,則所用熱處理溫度約550℃;若熱處理時間約3-6小時,則所用熱處 理溫度約525℃;若熱處理時間約6-12小時,則所用熱處理溫度約500℃;若熱處理時間約12-18小時,則所用熱處理溫度約475℃;且若熱處理時間約18-25小時,則所用熱處理溫度約450℃。 Heat treatment time according to an exemplary embodiment 0.5 hour and if the heat treatment time is about 0.5-1 hour, the heat treatment temperature used About 575 ° C; if heat treatment time Heat treatment temperature for about 1-3 hours About 550 ° C; if heat treatment time Heat treatment temperature for about 3-6 hours About 525 ° C; if heat treatment time Heat treatment temperature of about 6-12 hours About 500 ° C; if heat treatment time Heat treatment temperature of about 12-18 hours About 475 ° C; and if heat treatment time Heat treatment temperature of about 18-25 hours About 450 ° C.

根據另一例示性實施例,熱處理時間0.5小時且若熱處理時間為約0.5-1小時,則所用熱處理溫度約500℃;若熱處理時間約1-3小時,則所用熱處理溫度約475℃;若熱處理時間約3-6小時,則所用熱處理溫度約450℃;若熱處理時間約6-12小時,則所用熱處理溫度約425℃;若熱處理時間約12-18小時,則所用熱處理溫度約400℃;且若熱處理時間約18-25小時,則所用熱處理溫度約375℃。 Heat treatment time according to another exemplary embodiment 0.5 hour and if the heat treatment time is about 0.5-1 hour, the heat treatment temperature used About 500 ° C; if heat treatment time Heat treatment temperature for about 1-3 hours About 475 ° C; if heat treatment time Heat treatment temperature for about 3-6 hours About 450 ° C; if heat treatment time Heat treatment temperature of about 6-12 hours About 425 ° C; if heat treatment time Heat treatment temperature of about 12-18 hours About 400 ° C; and if heat treatment time Heat treatment temperature of about 18-25 hours About 375 ° C.

根據另一例示性實施例,熱處理時間0.5小時且若熱處理時間為約0.5-1小時,則所用熱處理溫度約650℃;若熱處理時間約1-3小時,則所用熱處理溫度約625℃;若熱處理時間約3-6小時,則所用熱處理溫度約600℃;若熱處理時間約6-12小時,則所用熱處理溫度約575℃;若熱處理時間約12-18小時,則所用熱處理溫度約550℃;且若熱處理時間約18-25小時,則所用熱處理溫度約525℃。 Heat treatment time according to another exemplary embodiment 0.5 hour and if the heat treatment time is about 0.5-1 hour, the heat treatment temperature used About 650 ° C; if heat treatment time Heat treatment temperature for about 1-3 hours About 625 ° C; if heat treatment time Heat treatment temperature for about 3-6 hours About 600 ° C; if heat treatment time Heat treatment temperature of about 6-12 hours About 575 ° C; if heat treatment time Heat treatment temperature of about 12-18 hours About 550 ° C; and if heat treatment time Heat treatment temperature of about 18-25 hours About 525 ° C.

例示性強化玻璃 Exemplary tempered glass

經化學強化玻璃之例示性實施例包括在諸如硝酸鉀鹽浴中強化之鈉鈣矽酸鹽玻璃及鋁矽酸鈉玻璃。製造強化玻璃之化學強化可在廣泛範圍之離子交換時間段期間在廣泛範圍之所施用離子交換溫度內執行。 Illustrative examples of chemically strengthened glass include soda lime silicate glass and sodium aluminosilicate glass that are fortified in a bath such as a potassium nitrate bath. The chemical strengthening of the fabricated tempered glass can be performed over a wide range of applied ion exchange temperatures during a wide range of ion exchange time periods.

可使用之離子交換溫度廣泛變化且可為恆定的或不同溫度之平均值。可用於進行離子交換之離子交換溫度之例示性實施例包括約200℃至1,400℃。對於一些類型鈉鈣矽酸鹽玻璃,可使用高於約400℃且較佳高於約430℃之離子交換溫度。各種類型玻璃之其他例示性離 子交換溫度包括約200、300、400、500、600、700、800、900、1,000、1,100、1,200、1,300及1,400℃或更高溫度。 The ion exchange temperature that can be used varies widely and can be an average of constant or different temperatures. Illustrative examples of ion exchange temperatures available for ion exchange include from about 200 °C to 1,400 °C. For some types of soda-calcium silicate glasses, ion exchange temperatures above about 400 ° C and preferably above about 430 ° C can be used. Other exemplary departures of various types of glass The sub-exchange temperature includes about 200, 300, 400, 500, 600, 700, 800, 900, 1,000, 1, 100, 1, 200, 1, 300, and 1,400 ° C or higher.

可使用之離子交換時間段可廣泛變化且可為連續或不連續的。可用於進行離子交換之離子交換時間之例示性實施例包括約0.1到50小時。對於一些類型鈉鈣矽酸鹽玻璃,例如可使用約1至5小時之離子交換時間。各種類型玻璃之其他例示性離子交換時間包括約0.01、0.1、0.5、1、2、4、5、6、8、10、20、25及50小時或更長之時間(以小時為單位)。 The ion exchange time period that can be used can vary widely and can be continuous or discontinuous. Illustrative examples of ion exchange times that can be used to perform ion exchange include from about 0.1 to 50 hours. For some types of soda-calcium silicate glasses, for example, ion exchange times of about 1 to 5 hours can be used. Other exemplary ion exchange times for various types of glass include about 0.01, 0.1, 0.5, 1, 2, 4, 5, 6, 8, 10, 20, 25, and 50 hours or longer (in hours).

壓縮應力之區域可變化且在例如基板玻璃表面之約5、10、20、30、40、50、60、70、80、90、100、125、150、200、300、400、500及600μm之擴散深度內發展。根據一例示性實施例,強化玻璃基板中之壓縮應力在玻璃之表面處最大(亦即,「表面壓縮」),且壓縮應力之程度可遵循經由強化玻璃中硬化深度自表面向下延伸之梯度。 The area of compressive stress can vary and is, for example, about 5, 10, 20, 30, 40, 50, 60, 70, 80, 90, 100, 125, 150, 200, 300, 400, 500, and 600 μm of the substrate glass surface. Developed within the depth of diffusion. According to an exemplary embodiment, the compressive stress in the strengthened glass substrate is greatest at the surface of the glass (ie, "surface compression"), and the degree of compressive stress may follow a gradient extending downward from the surface through the depth of hardening in the tempered glass. .

在例示性實施例中,表面壓縮應力(亦即表面壓縮)之量可在100-2,000MPa之間變化。在例示性實施例中,表面壓縮應力在強化鈉鈣矽酸鹽玻璃中可在高達約800MPa或更高範圍內且在鋁矽酸鹽玻璃中高達約1,200MPa或更高。在某些例示性實施例中,表面壓縮在強化鈉鈣矽酸鹽玻璃中為約200-650MPa且在鋁矽酸鹽玻璃中為約300-850MPa。在其他例示性實施例中,表面壓縮在強化鈉鈣矽酸鹽玻璃中為約400-600MPa且在鋁矽酸鹽玻璃中為約600-800MPa。 In an exemplary embodiment, the amount of surface compressive stress (i.e., surface compression) can vary from 100 to 2,000 MPa. In an exemplary embodiment, the surface compressive stress can be in the range of up to about 800 MPa or more in the reinforced soda lime silicate glass and up to about 1,200 MPa or more in the aluminosilicate glass. In certain exemplary embodiments, the surface compression is about 200-650 MPa in the reinforced soda lime silicate glass and about 300-850 MPa in the aluminosilicate glass. In other exemplary embodiments, the surface compression is about 400-600 MPa in the reinforced soda lime silicate glass and about 600-800 MPa in the aluminosilicate glass.

在某些例示性實施例中,強化矽酸鹽玻璃,諸如鈉鈣矽酸鹽玻璃或鋁矽酸鈉玻璃包含氧化鋁、至少一種鹼金屬及在一些實施例中大於50莫耳% SiO2,在其他實施例中至少58莫耳% SiO2且在其他實施例中至少60莫耳% SiO2。在此等實施例中,Li2O+Na2O+K2O總莫耳%諸如在與擴散深度相關之區域中為至少約1、2、5、7或8-10莫耳%且25莫耳%,較佳20莫耳%,且更佳約2、5、7、8、10、12、15或 16-18莫耳%。 In certain exemplary embodiments, the fortified bismuth glass, such as soda-calcium silicate glass or sodium aluminosilicate glass, comprises alumina, at least one alkali metal, and in some embodiments, greater than 50 mole % SiO 2 , In other embodiments at least 58 mole % SiO 2 and in other embodiments at least 60 mole % SiO 2 . In such embodiments, the total molar % of Li 2 O+Na 2 O+K 2 O is, for example, at least about 1, 2, 5, 7, or 8-10 mol% in the region associated with the depth of diffusion and 25 mol%, preferably 20% by mole, and better About 2, 5, 7, 8, 10, 12, 15, or 16-18% of the mole.

在另一例示性實施例中,鹼鋁矽酸鹽玻璃包含以下各者、基本上由以下各者組成或由以下各者組成:60-75莫耳% SiO2;5-15莫耳% Al2O3;0-12莫耳% B2O3;8-21莫耳% Na2O;0-8莫耳% K2O;0-15莫耳% MgO;及0-3莫耳% CaO。在此等實施例中,Li2O+Na2O+K2O總莫耳%諸如在與擴散深度相關之區域中為至少約1、2、5、7或8-10莫耳%且25莫耳%,較佳20莫耳%,且更佳約2、5、7、8、10、12、15或16-18莫耳%。 In another exemplary embodiment, the alkali aluminosilicate glass comprises, consists essentially of, or consists of: 60-75 mole % SiO 2 ; 5-15 mole % Al 2 O 3 ; 0-12 mol % B 2 O 3 ; 8-21 mol % Na 2 O; 0-8 mol % K 2 O; 0-15 mol % MgO; and 0-3 mol % CaO. In such embodiments, the total molar % of Li 2 O+Na 2 O+K 2 O is, for example, at least about 1, 2, 5, 7, or 8-10 mol% in the region associated with the depth of diffusion and 25 mol%, preferably 20% by mole, and better About 2, 5, 7, 8, 10, 12, 15, or 16-18% of the mole.

在另一實施例中,鹼鋁矽酸鹽玻璃基板包含以下各者、基本上由以下各者組成或由以下各者組成:60-70莫耳% SiO2;6-14莫耳% Al2O3;0-15莫耳% B2O3;0-15莫耳% Li2O;0-20莫耳% Na2O;0-10莫耳% K2O;0-15莫耳% MgO;0-10莫耳% CaO;0-5莫耳% ZrO2;0-2莫耳% SnO2;0-1莫耳% CeO2;其中約1、2、5、7、8或10-12莫耳%Li2O+Na2O+K2O約2、5、7、8、10、12、15或16-20莫耳%,諸如在與擴散深度相關之區域中,且0莫耳%MgO+CaO15莫耳%。 In another embodiment, the alkali aluminosilicate glass substrate comprises, consists essentially of, or consists of: 60-70 mole % SiO 2 ; 6-14 mole % Al 2 O 3 ; 0-15 mol % B 2 O 3 ; 0-15 mol % Li 2 O; 0-20 mol % Na 2 O; 0-10 mol % K 2 O; 0-15 mol % MgO; 0-10 mol % CaO; 0-5 mol % ZrO 2 ; 0-2 mol % SnO 2 ; 0-1 mol % CeO 2 ; of which about 1, 2 , 5, 7, 8 or 10 -12% by mole Li 2 O+Na 2 O+K 2 O About 2, 5, 7, 8, 10, 12, 15 or 16-20% of the mole, such as in the region related to the depth of diffusion, and 0% by mole MgO+CaO 15 moles %.

在一個例示實施例中,基板玻璃中之鈉離子經來自熔融浴之鉀離子置換,但具有較大原子半徑之其他鹼金屬離子(諸如銣或銫)可置換玻璃中之較小鹼金屬離子。類似地,其他鹼金屬鹽諸如(但不限於)硝酸鹽、硫酸鹽、鹵化物及其類似物可用於離子交換法。 In an exemplary embodiment, sodium ions in the substrate glass are replaced by potassium ions from the molten bath, but other alkali metal ions (such as ruthenium or osmium) having a larger atomic radius can displace the smaller alkali metal ions in the glass. Similarly, other alkali metal salts such as, but not limited to, nitrates, sulfates, halides, and the like can be used in the ion exchange process.

強化玻璃基板之例示性實施例包括具有約25、20、15、10、8、6、5、4、3、2、1、0.7、0.5、0.25及0.1mm之一或多種寬度之基板。強化基板之長度及截面積可不同。舉例而言,強化玻璃可為在連續製程中產生之片材。在另一實例中,強化玻璃可為在分批製程中產生之試片。 An illustrative embodiment of a tempered glass substrate includes A substrate of one or more widths of about 25, 20, 15, 10, 8, 6, 5, 4, 3, 2, 1, 0.7, 0.5, 0.25, and 0.1 mm. The length and cross-sectional area of the reinforced substrate may vary. For example, tempered glass can be a sheet produced in a continuous process. In another example, the tempered glass can be a test piece produced in a batch process.

在另一例示實施例中,化學強化玻璃基板可具有至少一個壓縮應力層(亦即硬化深度),其深度為約1,000、500、250、150、100、 90、80、70、60、50、45、40、35、30、25、20、15、10、5、1μm或1μm以下。 In another exemplary embodiment, the chemically strengthened glass substrate may have at least one compressive stress layer (ie, a depth of hardening) having a depth of about 1,000, 500, 250, 150, 100, 90, 80, 70, 60, 50, 45, 40, 35, 30, 25, 20, 15, 10, 5, 1 μm or less.

在另一例示實施例中,化學強化玻璃基板可具有約100MPa或100MPa以上(例如約200、300、400、500、600、700、800、900、1000、1500或2000MPa或2000MPa以上)之表面壓縮應力、約1μm或1μm以上(例如約5、10、20、25、30、35、40、45、50、55、60、65、70、75、80、85、90、95、100μm或100μm以上)之硬化深度及約1μm或1μm以上(例如約5、10、20、25、30、35、40、45、50、55、60、65、70、75、80、85、90、95、100、125或150μm或150μm以上)之擴散深度。 In another exemplary embodiment, the chemically strengthened glass substrate may have a surface compression of about 100 MPa or more (eg, about 200, 300, 400, 500, 600, 700, 800, 900, 1000, 1500, or 2000 MPa or more). Stress, about 1 μm or more (for example, about 5, 10, 20, 25, 30, 35, 40, 45, 50, 55, 60, 65, 70, 75, 80, 85, 90, 95, 100 μm or more Hardening depth of about 1 μm or more (for example, about 5, 10, 20, 25, 30, 35, 40, 45, 50, 55, 60, 65, 70, 75, 80, 85, 90, 95, 100) The diffusion depth of 125 nm or 150 μm or more.

在另一例示實施例中,化學強化玻璃基板可在至少一個表面區域或層(諸如富處理區域或貧處理區域)中具有比鄰近此等表面區域之主體區域中高的金屬量。貧處理區域及富處理區域中之至少一者中金屬濃度可比主體區域中金屬濃度高約0.4、1.0、1.5、2.0、2.5、3.0、4.0、5.0、6.0、8.0、10.0、12.0、15.0、20或25莫耳%(莫耳%)。根據一實施例,貧處理區域中金屬濃度比富處理區域中金屬濃度高。在不同區域中具有不同金屬濃度之強化玻璃之一實例為由藉由漂浮玻璃製程利用錫製備之平板玻璃基板製造的經化學強化玻璃。 In another exemplary embodiment, the chemically strengthened glass substrate can have a higher amount of metal in at least one surface region or layer, such as a rich processing region or a lean processing region, than in a body region adjacent to such surface regions. The metal concentration in at least one of the lean region and the rich region may be higher than the metal concentration in the body region About 0.4, 1.0, 1.5, 2.0, 2.5, 3.0, 4.0, 5.0, 6.0, 8.0, 10.0, 12.0, 15.0, 20 or 25 mol% (mol%). According to an embodiment, the metal concentration in the lean treatment zone is higher than the metal concentration in the rich treatment zone. An example of a tempered glass having different metal concentrations in different regions is a chemically strengthened glass made of a flat glass substrate prepared by tin using a floating glass process.

在另一例示實施例中,化學強化玻璃基板可具有鹼離子(例如入侵鹼離子及主體鹼離子)平均濃度,該平均濃度與鄰近區域(諸如主體區域)中相比在表面區域之擴散深度中為相同或不同的。表面區域可為強化玻璃中之富處理區域或貧處理區域。鹼離子之平均濃度可與鄰近區域(諸如主體區域)中鹼離子之平均濃度相同或不同。在一個例示實施例中,表面區域之擴散深度中鹼離子平均濃度比主體區域中鹼離子濃度高至約0.5莫耳%。在其他實施例中,表面區域之擴散深度中鹼離子平均濃度比鄰近表面區域之主體區域中鹼離子濃度高至約 0.4、0.3、0.2、0.1或0.05莫耳%、等於該濃度或小於該濃度。 In another exemplary embodiment, the chemically strengthened glass substrate may have an average concentration of alkali ions (eg, invading alkali ions and bulk alkali ions) that is in the diffusion depth of the surface region as compared to in adjacent regions such as the body region. Same or different. The surface area can be a rich or poorly treated area in the tempered glass. The average concentration of alkali ions may be the same or different from the average concentration of alkali ions in adjacent regions such as the body region. In an exemplary embodiment, the average concentration of alkali ions in the diffusion depth of the surface region is higher than the concentration of alkali ions in the bulk region. Up to about 0.5 mol%. In other embodiments, the average concentration of alkali ions in the diffusion depth of the surface region is higher than the concentration of alkali ions in the body region adjacent to the surface region. To about 0.4, 0.3, 0.2, 0.1 or 0.05 mol%, equal to or less than this concentration.

例示性交換介質 Exemplary exchange medium

可用於化學強化之液體交換介質之例示性實施例包括液體熔融鹽浴。熔融液浴包括在離子交換之前熔鹽之鹼金屬離子中平均離子半徑比基板玻璃中主體鹼金屬離子之平均離子半徑大的入侵鹼離子。液體熔融鹽浴之常見實例包括以鉀作為入侵鹼離子來置換基板玻璃中鈉及/或鋰主體離子之硝酸鉀。 Illustrative examples of liquid exchange media that can be used for chemical strengthening include liquid molten salt baths. The melt bath includes invading alkali ions having an average ionic radius greater than the average ionic radius of the host alkali metal ions in the substrate glass in the alkali metal ions of the molten salt prior to ion exchange. Common examples of liquid molten salt baths include potassium as the invading alkali ion to replace the potassium nitrate of the sodium and/or lithium bulk ions in the substrate glass.

入侵鹼離子之混合鹽摻合物亦可用作液體交換介質。此等摻合物可包括不同鹼金屬之鹽,較佳不同鹼金屬硝酸鹽。硝酸鹽熔融摻合物可包括至少兩種不同鹼離子,例如Na及K、或Na及Rb、或K及Rb、或K及Cs。但亦可能包括三種或四種不同鹼金屬。根據實施例之方法提供以下選擇:將離子半徑明顯大於主體鹼離子(諸如鋰或鈉離子)之半徑之入侵鹼離子有效併入所處理之玻璃物品中。 Mixed salt blends of invading alkali ions can also be used as liquid exchange media. Such blends may include salts of different alkali metals, preferably different alkali metal nitrates. The nitrate melt blend can include at least two different alkali ions, such as Na and K, or Na and Rb, or K and Rb, or K and Cs. However, it is also possible to include three or four different alkali metals. The method according to the embodiment provides the option of efficiently incorporating the invading alkali ions having an ionic radius substantially larger than the radius of the host alkali ion (such as lithium or sodium ions) into the treated glass article.

可用於化學強化之固體交換介質之例示性實施例包括可施用至玻璃基板表面之半固體糊狀物。糊狀物包括來自諸如鹽之來源的入侵鹼離子及至少一種流變劑(諸如黏土)以將離子懸浮於固體交換介質中。高嶺土為可用於製造固體交換介質之流變劑之常見實例。用高嶺土製得之糊狀物之黏度可用水及其他添加劑改質以適合將糊狀物施用至玻璃基板之施用。糊狀物之水含量可在作為固體交換介質施用之前利用升高之高溫(諸如大於120℃)蒸發。流變劑之另一實例為鋁矽酸鹽纖維。亦涵蓋其他黏土及流變劑。 Illustrative embodiments of solid exchange media that can be used for chemical strengthening include semi-solid pastes that can be applied to the surface of a glass substrate. The paste includes invading alkali ions from a source such as a salt and at least one rheological agent such as clay to suspend the ions in the solid exchange medium. Kaolin is a common example of a rheological agent that can be used to make solid exchange media. The viscosity of the paste made with kaolin can be modified with water and other additives to suit the application of the paste to the glass substrate. The water content of the paste can be evaporated using elevated elevated temperatures (such as greater than 120 °C) prior to application as a solid exchange medium. Another example of a rheological agent is an aluminosilicate fiber. Other clays and rheological agents are also covered.

除液體及固體交換介質以外,亦涵蓋氣體交換介質及其混合物。交換介質可包括影響交換介質中入侵鹼離子之離子交換速率之組成。該組成可增大或減小入侵鹼離子進入基板之離子交換速率。該組成可以許多不同方式改變,從而影響與交換介質相關之離子交換速率,諸如藉由添加會減緩離子交換速率之添加劑來改變。 In addition to liquid and solid exchange media, gas exchange media and mixtures thereof are also contemplated. The exchange medium can include a composition that affects the ion exchange rate of the invading alkali ions in the exchange medium. This composition increases or decreases the ion exchange rate of the invading alkali ions into the substrate. This composition can be varied in many different ways to affect the rate of ion exchange associated with the exchange medium, such as by the addition of additives that slow the rate of ion exchange.

實例 Instance

以下實例證明利用熱處理方法製造經化學強化玻璃之方法。 The following examples demonstrate the method of making chemically strengthened glass using a heat treatment process.

實例1 Example 1

實例1證明具有減小之誘導曲率之經化學強化鈉鈣矽酸鹽玻璃的製備。 Example 1 demonstrates the preparation of chemically strengthened soda lime silicate glass with reduced induced curvature.

樣品製備:自利用錫漂浮玻璃製程形成之母體片材切割鈉鈣矽酸鹽玻璃試片(50mm×50mm對徑及0.4mm寬)。將試片在馬弗爐(muffle furnace)中在空氣(氧化性氛圍)中在550℃下熱處理2.0小時。接著藉由將試片自馬弗爐直接浸入溫度控制至440℃之熔融KNO3之燒杯中持續8小時來對試片進行化學強化。將試片冷卻且用水沖洗以移除固化鹽。針對每個參數檢查最少兩個試片。處理後之試片撓曲使用無觸點光學測繪器自所量測之表面輪廓測定。撓曲為沿在正方形試片之相對邊緣中點之間畫出之線測定的峰至谷高度。 Sample preparation: A sodium calcium silicate glass test piece (50 mm × 50 mm diameter and 0.4 mm width) was cut from a mother sheet formed by a tin floating glass process. The test piece was heat-treated in air (oxidizing atmosphere) at 550 ° C for 2.0 hours in a muffle furnace. The test piece was then chemically strengthened by immersing the test piece directly from the muffle furnace into a beaker of molten KNO 3 controlled to a temperature of 440 ° C for 8 hours. The test piece was cooled and rinsed with water to remove the solidified salt. Check a minimum of two test strips for each parameter. The treated specimen deflection was measured from the measured surface profile using a non-contact optical plotter. Flexure is the peak-to-valley height measured along the line drawn between the midpoints of the opposite edges of the square test piece.

結果:平均撓曲相對於預處理參數在以下表1中給出,其中正撓曲指示富表面之凸曲率且負撓曲指示富表面之凹曲率。針對商業目的,諸如針對在個人電子器件及平板顯示器中之使用,可接受之撓曲目前為約0.1%線性跨距,對於50mm跨距對應於50微米。 Results: The average deflection relative to the pretreatment parameters is given in Table 1 below, where positive deflection indicates the convex curvature of the rich surface and negative deflection indicates the concave curvature of the rich surface. For commercial purposes, such as for use in personal electronic devices and flat panel displays, acceptable deflection is currently about 0.1% linear span and 50 micron for 50 mm span.

表1:熱處理(以溫度(攝氏度)及時間(小時)給出)及化學強化後之平均撓曲(微米)。 Table 1: Heat treatment (given in temperature (degrees Celsius) and time (hours)) and average deflection (micron) after chemical strengthening.

在化學強化之前在空氣中在550℃下持續2.0小時之熱處理在此情況下產生小於50微米目標之撓曲。由化學強化產生之表面壓縮及硬化深度使用橢偏儀量測。對於化學強化後之經熱處理試片,平均撓曲為42.7微米(富側凸面),平均表面壓縮對於富表面為705MPa且對於貧表 面為737MPa,平均硬化深度對於富表面為13.8微米且對於貧表面為12.4微米。 The heat treatment in air at 550 ° C for 2.0 hours prior to chemical strengthening produces a deflection of less than 50 microns target in this case. The surface compression and hardening depth resulting from chemical strengthening is measured using an ellipsometer. For the heat-strengthened test piece after chemical strengthening, the average deflection is 42.7 μm (rich side convex surface), and the average surface compression is 705 MPa for the rich surface and for the poor surface The face was 737 MPa and the average hardening depth was 13.8 microns for the rich surface and 12.4 microns for the lean surface.

不經歷熱處理但經歷等效化學強化之比較試片具有94.7微米之平均撓曲(富側凸面)。 Comparative test pieces that did not undergo heat treatment but undergo equivalent chemical strengthening had an average deflection of 94.7 microns (rich side convexity).

實例2 Example 2

實例2證明具有減小之誘導曲率之較長時間經化學強化鈉鈣矽酸鹽玻璃的製備。 Example 2 demonstrates the preparation of chemically strengthened soda-calcium silicate glass for a longer period of time with reduced induced curvature.

樣品製備:自利用錫漂浮玻璃製程形成之母體片材切割鈉鈣矽酸鹽玻璃試片(50mm×50mm對徑及0.4mm寬)。將試片在馬弗爐中在空氣(氧化性氛圍)中在550℃下熱處理0.5小時且在550℃下熱處理2.0小時。將試片冷卻至室溫,接著藉由浸入溫度控制至440℃之熔融KNO3之燒杯中持續24小時來對其進行化學強化。將試片冷卻且用水沖洗以移除固化鹽。針對每個參數檢查最少三個試片。處理後之試片撓曲使用無觸點光學測繪器自所量測之表面輪廓測定。撓曲為沿在正方形試片之相對邊緣中點之間畫出之線測定的峰至谷高度。 Sample preparation: A sodium calcium silicate glass test piece (50 mm × 50 mm diameter and 0.4 mm width) was cut from a mother sheet formed by a tin floating glass process. The test piece was heat-treated in a muffle furnace at 550 ° C for 0.5 hour in air (oxidizing atmosphere) and heat-treated at 550 ° C for 2.0 hours. The test piece was cooled to room temperature and then chemically strengthened by immersion in a beaker of molten KNO 3 controlled to a temperature of 440 ° C for 24 hours. The test piece was cooled and rinsed with water to remove the solidified salt. Check a minimum of three test strips for each parameter. The treated specimen deflection was measured from the measured surface profile using a non-contact optical plotter. Flexure is the peak-to-valley height measured along the line drawn between the midpoints of the opposite edges of the square test piece.

結果:平均撓曲相對於預處理參數在表II中給出,其中正撓曲指示富表面之凸曲率且負撓曲指示富表面之凹曲率。針對商業目的,諸如針對在個人電子器件及平板顯示器中之使用,可接受之撓曲目前為約0.1%線性跨距,對於50mm跨距對應於50微米。 Results: The average deflection is given in Table II with respect to the pretreatment parameters, where positive deflection indicates the convex curvature of the rich surface and negative deflection indicates the concave curvature of the rich surface. For commercial purposes, such as for use in personal electronic devices and flat panel displays, acceptable deflection is currently about 0.1% linear span and 50 micron for 50 mm span.

在化學強化之前在空氣中550℃持續2.0小時之熱處理參數在此情況下產生小於50微米目標之撓曲。由化學強化產生之表面壓縮及硬化深度使用橢偏儀量測。由於實例2中使用較長化學強化時間,故硬化深度明顯較大且表面壓縮量值明顯比實例1低。 The heat treatment parameters in air at 550 ° C for 2.0 hours prior to chemical strengthening produced a deflection of the target of less than 50 microns in this case. The surface compression and hardening depth resulting from chemical strengthening is measured using an ellipsometer. Since the longer chemical strengthening time was used in Example 2, the hardening depth was significantly larger and the surface compression amount was significantly lower than in Example 1.

表2:熱處理(以溫度(攝氏度)及時間(小時)給出)及化學強化後之平均撓曲(微米)。 Table 2: Heat treatment (given in temperature (degrees Celsius) and time (hours)) and average deflection (micron) after chemical strengthening.

[表2] [Table 2]

對於化學強化後550℃、2.0小時空氣熱處理條件,平均撓曲為37.3微米(富側凸面),平均表面壓縮對於富表面為582MPa且對於貧表面為596MPa,平均硬化深度對於富表面為24.8微米且對於貧表面為22.2微米。不經歷熱處理但經歷等效化學強化之佐證試片具有110.3微米之平均撓曲(富側凸面)。 For the 550 ° C, 2.0 hour air heat treatment conditions after chemical strengthening, the average deflection is 37.3 microns (rich side convex surface), the average surface compression is 582 MPa for the rich surface and 596 MPa for the lean surface, the average hardening depth is 24.8 μm for the rich surface and For a lean surface it is 22.2 microns. The test piece, which did not undergo heat treatment but undergoes equivalent chemical strengthening, had an average deflection of 110.3 microns (rich side convexity).

實例3 Example 3

實例3證明熱處理時間與減小之誘導曲率之間的經驗關係式。 Example 3 demonstrates the empirical relationship between heat treatment time and reduced induced curvature.

樣品製備:自利用錫漂浮玻璃製程形成之母體片材切割鈉鈣矽酸鹽玻璃試片(50mm×50mm對徑及0.4mm寬)。將試片在馬弗爐中在空氣(氧化性氛圍)中在525℃下熱處理持續不同持續時間,如以圖式200之x軸中時間(小時)之平方根形式顯示。將試片冷卻至室溫,接著藉由浸入溫度控制至440℃之熔融KNO3之燒杯中持續24小時來對其進行化學強化。將試片冷卻且用水沖洗以移除固化鹽。針對每個參數檢查最少三個試片。處理後之試片撓曲使用無觸點光學測繪器自所量測之表面輪廓測定。撓曲為沿在正方形試片之相對邊緣中點之間畫出之線測定的峰至谷高度。 Sample preparation: A sodium calcium silicate glass test piece (50 mm × 50 mm diameter and 0.4 mm width) was cut from a mother sheet formed by a tin floating glass process. The test piece was heat treated in a muffle furnace in air (oxidizing atmosphere) at 525 ° C for different durations, as shown by the square root of time (hours) in the x-axis of the graph 200. The test piece was cooled to room temperature and then chemically strengthened by immersion in a beaker of molten KNO 3 controlled to a temperature of 440 ° C for 24 hours. The test piece was cooled and rinsed with water to remove the solidified salt. Check a minimum of three test strips for each parameter. The treated specimen deflection was measured from the measured surface profile using a non-contact optical plotter. Flexure is the peak-to-valley height measured along the line drawn between the midpoints of the opposite edges of the square test piece.

結果:平均撓曲相對於熱處理時間之平方根在圖式200中給出,其中正撓曲指示富表面之凸曲率。針對商業目的,諸如針對在個人電子器件及平板顯示器中之使用,可接受之撓曲目前為約0.1%線性跨距,對於50mm跨距對應於50微米。 Results: The square root of the average deflection versus heat treatment time is given in Figure 200, where positive deflection indicates the convex curvature of the rich surface. For commercial purposes, such as for use in personal electronic devices and flat panel displays, acceptable deflection is currently about 0.1% linear span and 50 micron for 50 mm span.

圖式200證明在525℃下熱處理後平均撓曲(微米)相對於熱處理時間(小時)之平方根及化學強化。在針對實例玻璃試片假設600℃為最高熱處理溫度(「m」)且0.00111小時/(℃)2為經驗常數(「n」)之情況 下,可針對撓曲使用以減小至可接受值(試片長度尺寸之約0.1%)之熱處理時間「t」(小時)之間的經驗關係式大致由t=0.00111×(600-T)2小時給出,其中T為熱處理溫度(℃)。一般技術者可使用本文中顯示之經驗關係式針對其他玻璃組合物及玻璃基板發展類似熱處理溫度及熱處理時間關係。 Scheme 200 demonstrates the square root and chemical strengthening of the average deflection (micrometer) relative to the heat treatment time (hours) after heat treatment at 525 °C. For the example glass test piece, assuming that 600 ° C is the highest heat treatment temperature ("m") and 0.00111 hours / ( ° C) 2 is the empirical constant ("n"), it can be used for deflection to reduce to an acceptable value. The empirical relationship between the heat treatment time "t" (hours) (about 0.1% of the length of the test piece) is roughly given by t = 0.0011 × (600 - T) 2 hours, where T is the heat treatment temperature (°C). One of ordinary skill in the art can use the empirical relationships shown herein to develop similar heat treatment temperatures and heat treatment time relationships for other glass compositions and glass substrates.

例示性方法 Exemplary method

漂浮玻璃:在漂浮玻璃製造期間,玻璃可以小心控制方式冷卻,使得內應力減輕,此稱為「退火」。在退火之前、期間或之後,方法處理溫度及時間可改變,使得熱處理方法可線上併入。此通常包括與退火相比在高溫下使用較長時間段,其中延長之持續時間可視所選溫度而定。該熱處理可在氧化性氛圍、中性氛圍或還原氛圍或其逐步組合中進行。該曲率減小性經熱處理基板可接著按離子交換製程經化學強化,且產生較小曲率。化學強化可緊接在曲率控制處理方法之後或在稍後時間進行。 Floating glass: During the manufacture of floating glass, the glass can be cooled in a carefully controlled manner to reduce the internal stress, which is called "annealing". The process temperature and time can be varied before, during or after annealing so that the heat treatment process can be incorporated on-line. This typically involves using a longer period of time at elevated temperatures than annealing, where the extended duration may depend on the selected temperature. The heat treatment can be carried out in an oxidizing atmosphere, a neutral atmosphere or a reducing atmosphere or a stepwise combination thereof. The curvature reducing heat treated substrate can then be chemically strengthened in an ion exchange process and produce less curvature. Chemical strengthening can be performed immediately after the curvature control processing method or at a later time.

用於熱處理之溫度亦可服從待經化學強化之未加強玻璃的物理及化學性質。用於熱處理方法之溫度變化可藉由利用適合支撐系統拓寬以避免經歷熱處理之薄玻璃片中的維度扭曲。用於製造玻璃(諸如經由漂浮法製造)之製程可改變,使得曲率控制方法中之一或多者可在較高溫度下應用。 The temperature used for the heat treatment may also be subject to the physical and chemical properties of the unreinforced glass to be chemically strengthened. The temperature change for the heat treatment process can be made by widening with a suitable support system to avoid dimensional distortion in a thin glass sheet undergoing heat treatment. The process for making glass, such as by floatation, can be varied such that one or more of the curvature control methods can be applied at higher temperatures.

預熱器件:預熱器件通常在化學強化之前使用以在即將浸入熔融交換介質之前加熱玻璃物品。此類預熱有助於防止玻璃斷裂,其諸如很可能在冷玻璃物品浸沒於熱熔融交換介質中時發生。 Preheating device: The preheating device is typically used prior to chemical strengthening to heat the glass article just prior to immersion in the molten exchange medium. Such preheating helps to prevent glass breakage, such as occurs when the cold glass article is immersed in the hot melt exchange medium.

根據新發明,在如此製造之玻璃(諸如準備用於化學強化製程之漂浮玻璃)之情況下,用於預熱器件之溫度及時間可藉由增加如本文所述之時間及/或溫度而改變以達成熱處理溫度及/或熱處理時間條件,使得曲率減小性熱處理可在預熱器件中實現。 According to the new invention, in the case of glass thus produced, such as floating glass intended for use in a chemical strengthening process, the temperature and time for preheating the device can be varied by increasing the time and/or temperature as described herein. To achieve the heat treatment temperature and/or heat treatment time conditions, the curvature reduction heat treatment can be achieved in the preheating device.

在較高溫度下,亦可使用適合之支撐系統以避免薄玻璃片中之維度扭曲。該熱處理可在氧化性氛圍、中性氛圍、還原氛圍或其逐步組合中進行。該玻璃可接著直接浸沒於交換介質中以按離子交換製程執行化學強化,且產生較小曲率。 At higher temperatures, a suitable support system can also be used to avoid dimensional distortion in the thin glass sheets. The heat treatment can be carried out in an oxidizing atmosphere, a neutral atmosphere, a reducing atmosphere or a stepwise combination thereof. The glass can then be directly immersed in the exchange medium to perform chemical strengthening in an ion exchange process and produce less curvature.

分批製程:一批如此製造之漂浮玻璃可置放在適合之熔爐中且保持在充足高溫下在氧化性氛圍、中性氛圍、還原氛圍或其逐步組合內持續充足時間以達成熱處理方法。在較高溫度下,可使用適合之支撐系統以避免薄玻璃片中之維度扭曲。在冷卻之後,或在稍後時間,該玻璃可接著按離子交換製程經由例如浸沒於熔鹽中或施用含有鹽之糊狀物而經化學強化,且產生較小曲率。 Batch process: A batch of float glass thus produced can be placed in a suitable furnace and maintained at a sufficient high temperature for a sufficient period of time in an oxidizing atmosphere, a neutral atmosphere, a reducing atmosphere or a stepwise combination thereof to achieve a heat treatment process. At higher temperatures, a suitable support system can be used to avoid dimensional distortion in the thin glass sheets. After cooling, or at a later time, the glass can then be chemically strengthened in an ion exchange process via, for example, immersion in a molten salt or application of a salt-containing paste, and produces less curvature.

申請人已用前述熱處理在40% O2+60% N2、60% O2+40% N2、100% O2、純氮氣及95% N2+5% H2氛圍中執行化學強化。在每一情況下,在參考標本內觀測到撓曲減小。由化學強化產生之曲率藉由在化學強化之前在諸如氧化性氛圍、中性氛圍、還原氛圍或其逐步組合之條件下熱處理至高溫來減小。 Applicants have performed chemical strengthening in the atmosphere of 40% O 2 + 60% N 2 , 60% O 2 + 40% N 2 , 100% O 2 , pure nitrogen, and 95% N 2 + 5% H 2 using the aforementioned heat treatment. In each case, a reduction in deflection was observed within the reference specimen. The curvature produced by chemical strengthening is reduced by heat treatment to a high temperature under conditions such as an oxidizing atmosphere, a neutral atmosphere, a reducing atmosphere, or a stepwise combination thereof before chemical strengthening.

經化學強化玻璃物品之曲率可經控制,包括薄玻璃物品。所形成玻璃物品之表面可見光學及整飾(計量學)品質類似於由漂浮製造製程產生者。然而,玻璃表面不需要磨削、拋光、蝕刻或碾磨。並且,不需要向所形成之玻璃物品施用持久的表面塗層。玻璃表面之總鹼濃度不改變。因此,化學穩定性質仍然類似於利用漂浮製造製程如此製造產生之化學穩定性質。 The curvature of the chemically strengthened glass article can be controlled, including thin glass articles. The surface of the formed glass article is visible in optical and finishing (metering) quality similar to that produced by the floating manufacturing process. However, the glass surface does not require grinding, polishing, etching or milling. Also, there is no need to apply a permanent surface coating to the formed glass article. The total alkali concentration on the glass surface does not change. Therefore, the chemical stability is still similar to the chemically stable quality produced by such a manufacturing process using a floating manufacturing process.

熱處理方法可極其簡單,且可以在漂浮玻璃製造時藉由在退火之前、期間或之後審慎控制溫度及時間來執行的線上製程形式實現。熱處理方法可在化學強化之前的任何時候執行。一個實例在置放在熔融交換介質上方之預熱器中。在該配置中,曲率控制熱處理方法可在腔室中以預熱製程形式實現從而避免斷裂,或用各別預熱製程實現以 在離子交換中浸入之前避免斷裂。或者,許多玻璃物品可在保持在充足溫度下之適合熔爐中在氧化性氛圍、中性氛圍、還原氛圍或其逐步組合內經歷曲率減小性熱處理方法持續足夠時間。 The heat treatment process can be extremely simple and can be carried out in the form of an in-line process that is performed by careful control of temperature and time before, during or after annealing of the floating glass. The heat treatment method can be performed at any time before chemical strengthening. An example is in a preheater placed above a molten exchange medium. In this configuration, the curvature control heat treatment method can be implemented in the chamber in a preheating process to avoid breakage, or by a separate preheating process. Avoid rupture before immersion in ion exchange. Alternatively, many glass articles may be subjected to a curvature reduction heat treatment process for a sufficient period of time in an oxidizing atmosphere, a neutral atmosphere, a reducing atmosphere, or a stepwise combination thereof in a suitable furnace maintained at a sufficient temperature.

圖3為說明利用熱處理製造具有減小之誘導曲率之強化基板的例示性製程300的流程圖。 3 is a flow chart illustrating an exemplary process 300 for fabricating a reinforced substrate having reduced induced curvature using heat treatment.

在步驟302,提供在包括主體鹼離子之玻璃結構中具有不同區域(諸如「富處理」區域及「貧處理」區域)之玻璃基板。所提供之基板玻璃可為鈉鈣矽酸鹽玻璃或鋁矽酸鹽玻璃。該等區域可例如彼此相對地安置在基板中,且根據一實施例可徑向相對。玻璃基板可在不同區域中具有變化,諸如在化學組成及/或化學結構方面之變化。化學組成變化之一實例為位於玻璃之不同區域中之錫的量。化學結構變化之一實例為錫以不同價數Sn2+及Sn4+存在於玻璃之不同區域中。貧處理區域中化學組成及/或化學結構之變化可將其與富處理區域區分開來。 At step 302, a glass substrate having different regions (such as "rich processing" regions and "lean processing" regions) in a glass structure including a bulk alkali ion is provided. The substrate glass provided may be sodium aluminosilicate glass or aluminosilicate glass. The regions may be disposed, for example, opposite one another in the substrate, and may be diametrically opposed in accordance with an embodiment. The glass substrate can have variations in different regions, such as changes in chemical composition and/or chemical structure. An example of a change in chemical composition is the amount of tin located in different regions of the glass. An example of a chemical structural change is that tin is present in different regions of the glass with different valences Sn 2+ and Sn 4+ . Changes in chemical composition and/or chemical structure in the lean treatment zone can distinguish it from the rich treatment zone.

在步驟304,將所提供之基板玻璃在熱處理製程中加熱至溫度T1持續時間段P1。T1可在250℃至與基板玻璃可扭曲之溫度(諸如對於鈉鈣矽酸鹽玻璃高於600℃或對於鋁矽酸鈉玻璃為800℃)相關之最高熱處理溫度之間變化。時間段P1可在0.05-20小時或更長時間之間變化。 At step 304, the provided substrate glass is heated to a temperature T1 for a duration P1 during the heat treatment process. T1 can vary from 250 ° C to the highest heat treatment temperature associated with the substrate glass twistable temperature (such as above 600 ° C for soda lime silicate glass or 800 ° C for sodium aluminosilicate glass). The period P1 can vary between 0.05-20 hours or longer.

在步驟306,經熱處理基板玻璃自加熱移除且允許冷卻,諸如冷卻至環境溫度或另一溫度(諸如約150℃),從而產生冷卻之經熱處理基板。冷卻製程並不如在退火中經控制,相形之下,退火需要在預定溫度範圍下冷卻之規定時間及規定冷卻速率。根據其他例示性實施例,可省略或重複步驟306。 At step 306, the heat treated substrate glass is removed from heating and allowed to cool, such as to ambient temperature or another temperature (such as About 150 ° C), resulting in a cooled heat treated substrate. The cooling process is not controlled as in annealing. In contrast, annealing requires a specified time of cooling at a predetermined temperature range and a specified cooling rate. According to other exemplary embodiments, step 306 may be omitted or repeated.

在步驟308,將冷卻之經熱處理基板玻璃在後續熱處理製程中再次加熱至溫度T2後持續時間段P2。T2可在250℃至所需交換溫度之幾 度內之間變化,使得浸沒至熔融鹽浴中將不引起基板之熱震破裂。時間段P2可在0.05-20小時或更長時間或0.01-50小時或更長時間之間變化。作為一方案,步驟308亦可作為曲率減小性熱處理之一部分進行。根據其他例示性實施例,可省略步驟308。 At step 308, the cooled heat-treated substrate glass is again heated to a temperature T2 for a period of time P2 in a subsequent heat treatment process. T2 can be at 250 ° C to the required exchange temperature The change between degrees makes the immersion into the molten salt bath will not cause thermal shock rupture of the substrate. The period of time P2 may vary between 0.05-20 hours or more or 0.01-50 hours or more. As an option, step 308 can also be performed as part of a reduced curvature heat treatment. According to other exemplary embodiments, step 308 may be omitted.

在步驟310,將經熱處理基板浸沒於在溫度T3下之熔融KNO3之交換介質中。交換介質提供入侵鹼離子,亦即鉀。T3可自200℃至1,000℃廣泛變化,且可為例如450℃。 At step 310, the substrate is immersed in the heat-treated in a molten KNO 3 at the temperature T3 of the exchange medium. The exchange medium provides intrusive alkali ions, also known as potassium. T3 can vary widely from 200 °C to 1,000 °C and can be, for example, 450 °C.

在步驟312,浸沒之基板經歷離子交換持續時間段P3。時間段P3可自0.1至50小時廣泛變化。在離子交換期間,壓縮應力層形成於強化基板中。壓縮應力層具有約1-500μm、且在一實施例中約5-200μm之深度。來自化學強化之誘導曲率之量在強化基板中經由步驟304中之熱處理減小。根據一實施例,在強化基板中在約中間平面的淨彎曲力矩可為約零。 At step 312, the submerged substrate undergoes an ion exchange duration P3. The time period P3 can vary widely from 0.1 to 50 hours. During ion exchange, a compressive stress layer is formed in the reinforced substrate. The compressive stress layer has a depth of from about 1 to 500 μm, and in one embodiment from about 5 to 200 μm. The amount of induced curvature from chemical strengthening is reduced in the strengthened substrate via the heat treatment in step 304. According to an embodiment, the net bending moment at about the median plane in the reinforced substrate can be about zero.

儘管貫穿本發明之全部內容始終特定描述,但代表性實例在廣泛範圍之應用內具有效用,且以上論述並不意欲且不應解釋為限制性的。本文中所用術語、描述及圖式僅以說明之方式闡述且不欲為限制。熟習此項技術者認識到許多變化在本發明之原則之精神及範疇內為可能的。雖然已參照圖式描述實例,但熟習此項技術者能夠在不背離所附申請專利範圍及其等效物之範疇的情況下對所述實例作出各種修改。 The description of the present invention is intended to be useful in a wide range of applications, and the above discussion is not intended to be, and should not be construed as limiting. The terms, descriptions, and figures used herein are to be construed as illustrative only and not limiting. Those skilled in the art will recognize that many variations are possible within the spirit and scope of the principles of the invention. While the examples have been described with reference to the drawings, various modifications of the examples can be made by those skilled in the art without departing from the scope of the appended claims.

本申請案係基於2012年10月15日申請之Arun K.Varshneya之名為「Strengthened Glass and Methods for Making」的美國臨時申請案第61/714,054號及2013年10月15日申請之美國非臨時申請案第14/054,489號,該等申請案以全文引用的方式併入本文中。 This application is based on US Provisional Application No. 61/714,054, entitled "Strengthened Glass and Methods for Making" by Arun K. Varshneya, filed on October 15, 2012, and non-temporary US application on October 15, 2013. Application No. 14/054,489, the disclosure of which is incorporated herein in its entirety by reference.

工業應用性 Industrial applicability

根據本發明,可獲得具有減小之誘導曲率且具有改進之物理性 質(諸如較高強度、較高耐磨性及/或較高耐熱震性)的經化學強化玻璃以及製造該經化學強化玻璃之方法。 According to the present invention, it is possible to obtain a reduced induced curvature and improved physical properties Chemically strengthened glass, such as higher strength, higher wear resistance, and/or higher thermal shock resistance, and a method of making the chemically strengthened glass.

Claims (18)

一種製造強化基板之方法,該方法包含:提供具有包含約25.0毫米之寬度之尺寸之漂浮玻璃基板,其特徵在於具有化學組合物及包括具有平均離子半徑之主體鹼離子之玻璃化學結構,及包括彼此相對地安置於該提供之基板中之富處理區域及貧處理區域的維度區域;決定用於在化學強化後之該基板中產生減小之誘導曲率之熱處理溫度,其至少部分係基於與該基板及該化學組合物相關之最高熱處理溫度;決定用於在化學強化後之該基板中產生減小之誘導曲率之熱處理時間,其至少部分係基於該熱處理溫度及該最高熱處理溫度;將該提供之基板在熱處理中加熱至約250℃且最高熱處理溫度之熱處理溫度後持續約0.001-50小時之熱處理時間,其中若該熱處理溫度約325℃,則該熱處理時間約2小時,從而產生經熱處理基板;提供包括入侵鹼離子之交換介質,該入侵鹼離子具有比該主體鹼離子之該平均離子半徑大的平均離子半徑;使該經熱處理基板暴露於該交換介質;且在使經熱處理基板暴露於該交換介質的同時進行離子交換以化學強化該基板從而產生強化基板,其中該強化基板包括深度為約1-500μm之壓縮應力層,其中該等用於在化學強化後之該基板中產生減小之誘導曲率之熱處理溫度及熱處理時間係至少部分基於以滿足以下關係式 決定:t n.(m-T)2「t」為熱處理時間(小時),「n」為經驗常數,「m」為最高熱處理溫度(℃),且「T」為熱處理溫度(℃)。其中該強化基板在基於該熱處理之化學強化後具有減小之誘導曲率。 A method of manufacturing a reinforced substrate, the method comprising: providing an inclusion A floating glass substrate having a width of about 25.0 mm, characterized by having a chemical composition and a glass chemical structure including a bulk alkali ion having an average ionic radius, and including a rich processing region disposed in the substrate provided opposite to each other And a dimension region of the lean region; determining a heat treatment temperature for producing a reduced induced curvature in the substrate after chemical strengthening, based at least in part on a maximum heat treatment temperature associated with the substrate and the chemical composition; a heat treatment time for reducing the induced curvature in the substrate after chemical strengthening, based at least in part on the heat treatment temperature and the highest heat treatment temperature; heating the provided substrate to a heat treatment to About 250 ° C and The heat treatment temperature after the heat treatment temperature of the highest heat treatment temperature is about 0.001-50 hours, wherein the heat treatment temperature About 325 ° C, the heat treatment time Approximately 2 hours to produce a heat treated substrate; providing an exchange medium comprising an invading alkali ion having an average ionic radius greater than the average ionic radius of the host alkali ion; exposing the heat treated substrate to the exchange medium And performing ion exchange to chemically strengthen the substrate while exposing the heat-treated substrate to the exchange medium to produce a strengthened substrate, wherein the strengthened substrate comprises a compressive stress layer having a depth of about 1-500 μm, wherein the the heat treatment temperature and heat treatment time line induction of curvature of the substrate was reduced to produce the reinforced at least in part on determined to satisfy the following relation: t n . ( m - T ) 2 "t" is the heat treatment time (hour), "n" is the empirical constant, "m" is the highest heat treatment temperature (°C), and "T" is the heat treatment temperature (°C). Wherein the strengthened substrate has a reduced induced curvature after chemical strengthening based on the heat treatment. 如請求項1之方法,其中該提供之基板之寬度約2.0毫米,其中在該強化基板中之約中間平面的淨彎曲力矩約為零。 The method of claim 1, wherein the width of the substrate provided About 2.0 mm, wherein the net bending moment about the median plane in the reinforced substrate is about zero. 如請求項1之方法,其中該熱處理溫度為約450-650℃。 The method of claim 1, wherein the heat treatment temperature is about 450 to 650 °C. 如請求項1之方法,其中該熱處理溫度為約400-750℃。 The method of claim 1, wherein the heat treatment temperature is about 400 to 750 °C. 如請求項1之方法,其中若該熱處理溫度約400℃,則該熱處理時間約2小時。 The method of claim 1, wherein the heat treatment temperature About 400 ° C, the heat treatment time About 2 hours. 如請求項1之方法,其中該強化基板具有深度為約5-200μm之壓縮應力層。 The method of claim 1, wherein the reinforcing substrate has a compressive stress layer having a depth of about 5 to 200 μm. 如請求項1之方法,其中進行離子交換係在約0.1至50小時之離子交換時間期間進行。 The method of claim 1, wherein the performing the ion exchange is carried out during an ion exchange time of about 0.1 to 50 hours. 如請求項1之方法,其中進行離子交換係在約200℃至1,400℃之離子交換溫度下進行。 The method of claim 1, wherein the ion exchange is carried out at an ion exchange temperature of from about 200 ° C to 1,400 ° C. 如請求項1之方法,其中該基板為平坦的。 The method of claim 1, wherein the substrate is flat. 如請求項1之方法,其中該熱處理時間0.5小時,且若該熱處理時間為約0.5-1小時,則該熱處理溫度約500℃;若該熱處理時間約1-3小時,則該熱處理溫度約475℃;若該熱處理時間約3-6小時,則該熱處理溫度約450℃;若該熱處理時間約6-12小時,則該熱處理溫度約425℃; 若該熱處理時間約12-18小時,則該熱處理溫度約400℃;且若該熱處理時間約18-25小時,則該熱處理溫度約375℃。 The method of claim 1, wherein the heat treatment time 0.5 hours, and if the heat treatment time is about 0.5-1 hour, the heat treatment temperature About 500 ° C; if the heat treatment time About 1-3 hours, the heat treatment temperature About 475 ° C; if the heat treatment time About 3-6 hours, the heat treatment temperature About 450 ° C; if the heat treatment time About 6-12 hours, the heat treatment temperature About 425 ° C; if the heat treatment time The heat treatment temperature is about 12-18 hours About 400 ° C; and if the heat treatment time About 18-25 hours, the heat treatment temperature About 375 ° C. 如請求項1之方法,其中該熱處理時間0.5小時,且若該熱處理時間為約0.5-1小時,則該熱處理溫度約575℃;若該熱處理時間約1-3小時,則該熱處理溫度約550℃;若該熱處理時間約3-6小時,則該熱處理溫度約525℃;若該熱處理時間約6-12小時,則該熱處理溫度約500℃;若該熱處理時間約12-18小時,則該熱處理溫度約475℃;且若該熱處理時間約18-25小時,則該熱處理溫度約450℃。 The method of claim 1, wherein the heat treatment time 0.5 hours, and if the heat treatment time is about 0.5-1 hour, the heat treatment temperature About 575 ° C; if the heat treatment time About 1-3 hours, the heat treatment temperature About 550 ° C; if the heat treatment time About 3-6 hours, the heat treatment temperature About 525 ° C; if the heat treatment time About 6-12 hours, the heat treatment temperature About 500 ° C; if the heat treatment time The heat treatment temperature is about 12-18 hours About 475 ° C; and if the heat treatment time About 18-25 hours, the heat treatment temperature About 450 ° C. 如請求項1之方法,其中該熱處理時間0.5小時,且若該熱處理時間為約0.5-1小時,則該熱處理溫度約650℃;若該熱處理時間約1-3小時,則該熱處理溫度約625℃;若該熱處理時間約3-6小時,則該熱處理溫度約600℃;若該熱處理時間約6-12小時,則該熱處理溫度約575℃;若該熱處理時間約12-18小時,則該熱處理溫度約550℃;且若該熱處理時間約18-25小時,則該熱處理溫度約525℃。 The method of claim 1, wherein the heat treatment time 0.5 hours, and if the heat treatment time is about 0.5-1 hour, the heat treatment temperature About 650 ° C; if the heat treatment time About 1-3 hours, the heat treatment temperature About 625 ° C; if the heat treatment time About 3-6 hours, the heat treatment temperature About 600 ° C; if the heat treatment time About 6-12 hours, the heat treatment temperature About 575 ° C; if the heat treatment time The heat treatment temperature is about 12-18 hours About 550 ° C; and if the heat treatment time About 18-25 hours, the heat treatment temperature About 525 ° C. 如請求項1之方法,其進一步包含將該經熱處理基板冷卻至約150℃之冷卻溫度以產生冷卻之經熱處理基板;及將該冷卻之經熱處理基板加熱至約250℃且最高熱處理溫度之熱處理溫度後持續約0.01-50小時之熱處理時間,以產生該經熱處理基板。 The method of claim 1, further comprising cooling the heat treated substrate to a cooling temperature of about 150 ° C to produce a cooled heat treated substrate; and heating the cooled heat treated substrate to About 250 ° C and The heat treatment temperature of the highest heat treatment temperature is followed by a heat treatment time of about 0.01 to 50 hours to produce the heat-treated substrate. 如請求項1之方法,其中該基板在該基板中之化學組成及化學結構中之至少一者包含變化,且該貧處理區域中該化學組成及該化學結構中之至少一者與該富處理區域不同。 The method of claim 1, wherein at least one of a chemical composition and a chemical structure of the substrate in the substrate comprises a change, and at least one of the chemical composition and the chemical structure in the lean region is treated with the rich The area is different. 如請求項1之方法,其中該交換介質為液體、固體、氣體及其混 合物中之一者。 The method of claim 1, wherein the exchange medium is a liquid, a solid, a gas, and a mixture thereof One of the compounds. 如請求項1之方法,其中該富處理區域及該貧處理區域徑向相對地安置在該基板中。 The method of claim 1, wherein the rich processing region and the lean processing region are disposed diametrically opposite one another in the substrate. 如請求項1之方法,其中該方法為連續製程及分批製程中之一者。 The method of claim 1, wherein the method is one of a continuous process and a batch process. 如請求項1之方法,其中該基板包含鹼鋁矽酸鹽玻璃及鈉鈣矽酸鹽玻璃中之一者。 The method of claim 1, wherein the substrate comprises one of alkali aluminosilicate glass and sodium aluminosilicate glass.
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