TWI631398B - Display panel - Google Patents

Abstract

A display panel. The display panel includes a first substrate, a second substrate, a liquid crystal layer, a plurality of thin film transistors, a plurality of metal traces, a protective layer, a first alignment layer, and a plurality of agglomerates. The first substrate has at least one display area and a non-display area, and the non-display area is located outside the display area. The second substrate is disposed opposite to the first substrate, and the liquid crystal layer is located between the first substrate and the second substrate. The thin film transistor and the metal trace are on the first substrate, and the protective layer covers at least part of the metal trace. The first alignment layer is on the protective layer and exposes one of the first surfaces of the protective layer. The agglomerate is located at least on a portion of the first surface.

Description

Display panel

The present disclosure relates to a display panel, and in particular to a display panel having good display quality.

Liquid crystal displays have been widely used in various electronic products, such as mobile phones, notebooks, and tablet PCs. With the rapid development of the large-sized flat panel display market, they are lightweight and thin. The liquid crystal display plays a very important role, and gradually replaces the cathode ray tube (CRT) display to become the mainstream in the market.

The vertical alignment liquid crystal display panel is one of the mainstream products of the current flat panel display. However, the vertical alignment liquid crystal display panel is more likely to cause a problem of affecting display quality due to light leakage. Therefore, how to provide a vertical alignment liquid crystal display panel with good display quality is one of the subjects of the related industry.

The disclosure relates to a display panel. In the display panel of the embodiment, the agglomerates located in the non-display area make the liquid crystal molecules in the liquid crystal layer receive a better vertical alignment effect, and thus can recover faster when operated by an external force, thereby reducing light leakage and improving display. The quality of the image.

According to an embodiment of the present disclosure, a display panel is proposed. The display panel includes a first substrate, a second substrate, a liquid crystal layer, a plurality of thin film transistors, a plurality of metal traces, a protective layer, a first alignment layer, and a plurality of agglomerates. The first substrate has at least one display area and a non-display area, and the non-display area is located outside the display area. The second substrate is disposed opposite to the first substrate, and the liquid crystal layer is located between the first substrate and the second substrate. The thin film transistor and the metal trace are on the first substrate, and the protective layer covers at least part of the metal trace. The first alignment layer is on the protective layer and exposes one of the first surfaces of the protective layer. The agglomerate is located at least on a portion of the first surface.

In order to better understand the above and other aspects of the present invention, the preferred embodiments are described below, and in conjunction with the drawings, the detailed description is as follows:

100, 200‧‧‧ display panel

110‧‧‧First substrate

120‧‧‧second substrate

130‧‧‧Liquid layer

140‧‧‧film transistor

150, ML, M‧‧‧ metal trace

160‧‧‧First protective layer

161‧‧‧Second protective layer

160s‧‧‧ first surface

170‧‧‧First alignment layer

180, 180a, 180b, 180c, 180d‧‧‧ agglomerates

190, 290‧‧‧ electrode layer

270‧‧‧Second alignment layer

290s‧‧‧ second surface

291‧‧‧ Spacer components

293‧‧‧Lighting layer

293a‧‧‧light transmission area

293b‧‧‧ shading area

294‧‧‧Insulation

295‧‧‧Box glue

297‧‧‧Color filter layer

299‧‧‧ Panel drive components

310‧‧‧Nami channel

320‧‧ ‧ micron protrusion structure

701, 701a, 702, 703‧‧‧ areas

803a‧‧‧ openings

900‧‧‧ masking film

1B-1B’, 4-4’‧‧‧ hatching

A‧‧‧ display area

Part A1‧‧‧

B‧‧‧Non-display area

B1‧‧‧ periphery

C, 801, 803‧‧‧ shadow pattern

D1, D2‧‧‧ extending direction

D3‧‧‧ size

DL‧‧‧ data line

I, II, III, IV, V, VI‧‧‧ curves

P‧‧‧ pixel area

SL‧‧‧ scan line

W1‧‧‧Width

W2‧‧‧ distance

W3‧‧‧ line width

FIG. 1A is a schematic top view of a display panel according to an embodiment of the present disclosure.

Fig. 1B is a schematic cross-sectional view taken along line 1B-1B' of Fig. 1A.

FIG. 2 is a simplified exploded view of a display panel according to an embodiment of the present disclosure.

Figure 3 is a partial perspective view of the metal trace in the non-display area as shown in Figure 2.

Fig. 4 is a cross-sectional view showing the display panel of another embodiment of the present disclosure taken along line 4-4' of Fig. 1A.

FIG. 5 is a schematic top plan view of a display panel according to still another embodiment of the present disclosure.

Figure 6 is a graph showing the relationship between the aperture ratio of the mask pattern and the concentration of the reactive monomer in the embodiment of the present disclosure.

FIG. 7 is a schematic diagram showing the aperture ratio of the mask pattern relative to the afterimage phenomenon in the embodiment of the disclosure.

FIG. 8A is a schematic diagram showing a masking pattern according to an embodiment of the present disclosure.

FIG. 8B is a schematic diagram showing a masking pattern according to another embodiment of the disclosure.

According to an embodiment of the present disclosure, in the display panel, the agglomerates located in the non-display area make the liquid crystal molecules in the liquid crystal layer receive a better vertical alignment effect, and thus can recover faster when operated by an external force, thereby reducing light leakage. The phenomenon improves the quality of the displayed image. Embodiments of the present disclosure will be described in detail below with reference to the accompanying drawings. The same reference numerals are used to designate the same or similar parts. It is to be noted that the drawings have been simplified to illustrate the details of the embodiments, and the detailed description of the embodiments is for illustrative purposes only and is not intended to limit the scope of the disclosure. Those having ordinary knowledge may modify or change the structures as needed in accordance with the actual implementation.

1A is a schematic plan view of a display panel 100 according to an embodiment of the present disclosure, and FIG. 1B is a schematic cross-sectional view taken along line 1B-1B' of FIG. 1A. Referring to FIG. 1A to FIG. 1B , the display panel 100 includes a first substrate 110 , a second substrate 120 , a liquid crystal layer 130 , a plurality of thin film transistors 140 , a plurality of metal traces 150 , and at least one protective layer ( For example, a first protective layer 160 and a second protective layer 161), a first alignment layer 170, and a plurality of agglomerates 180. The first substrate 110 has at least one display area A and one non-display area B, and the non-display area B is located outside the display area A. The second substrate 120 is disposed opposite to the first substrate 110, and the liquid crystal layer 130 is located between the first substrate 110 and the second substrate 120. between. The thin film transistor 140 and the metal trace 150 are located on the first substrate 110, and the first protective layer 160 and the second protective layer 161 cover at least part of the metal trace 150. The first protective layer 160 is disposed on the second protective layer 161 , and the first protective layer 160 covers the thin film transistor 140 and the metal trace 150 . The first alignment layer 170 is located on the first protection layer 160, and the first alignment layer 170 partially covers the first protection layer 160 to expose one of the first surfaces 160s of the first protection layer 160. The agglomerate 180 is located at least on a portion of this first surface 160s. In another embodiment, the first protective layer 160 partially covers the second protective layer 161 to expose a portion of the surface of the second protective layer 161, and the agglomerate 180 is located at least on the exposed portion of the second protective layer 161. On (not shown). In still another embodiment, the first protective layer 160 partially covers the second protective layer 161 to expose a portion of the surface of the second protective layer 161 (not shown), and the agglomerate 180 is located at least in the first protective layer 160. And on the surface of the portion of the second protective layer 161 exposed.

The display area A indicates an area in which the display panel 100 is used to display an image, and the non-display area B indicates an area in which an image is not displayed. In one embodiment, as shown in FIG. 1A, the non-display area B surrounds the display area A. In the embodiment, the display area A is, for example, an area for displaying a picture in the pixel area, and the non-display area B is, for example, a fan out, but is not limited thereto, and the non-display area B may include not for displaying an image. Any area.

In an embodiment, the first protective layer 160 is in direct contact with at least one of the thin film transistor 140 and the metal trace 150. As shown in FIG. 1B, in the present embodiment, the first protective layer 160 directly contacts the thin film transistor 140 and the metal trace 150.

In an embodiment, the first protective layer 160 and the second protective layer 161 respectively comprise an inorganic dielectric material, for example, including tantalum nitride (SiN _x ), yttrium oxide (SiO _x ), and/or yttrium oxynitride (SiO _{x ).} N _y ). As shown in FIG. 1B, the first surface 160s of the first protective layer 160 exposed to the outside of the first alignment layer 170 corresponds to the non-display area B.

In the embodiment, the agglomerates 180 in the non-display area B do not have a specific arrangement and alignment direction, in other words, the agglomerates 180 are irregularly arranged on the first substrate 110. The agglomerate 180 in display area A has a specific alignment direction function to direct the liquid crystal to tilt in a particular direction. The same is the agglomerate 180, but the agglomerates 180 having different functions can be produced in different regions according to the difference between the photo-curing step in the process and whether or not the electric field is applied. Since the agglomerate 180 located in the non-display area B allows the liquid crystal molecules in the liquid crystal layer 130 to receive a better vertical alignment effect, it can recover faster when operated by an external force, and can reduce the light leakage phenomenon of the display panel 100, thereby improving Display the quality of the image.

In the embodiment, the agglomerate 180 directly contacts the liquid crystal molecules in the liquid crystal layer 130. It should be noted that the size ratio of the agglomerates 180 in the drawings is not drawn to the scale of the actual products, and is only used to clearly illustrate the contents of the embodiments, and therefore is not intended to limit the scope of the disclosure.

In the embodiment, the agglomerate 180 can be formed in a wide variety of ways. For example, in an embodiment, a UV curable monomer may be added thereto when forming the liquid crystal layer 130 or forming the first alignment layer 170, and then from the first substrate 110 side or the second substrate 120. The ultraviolet light is side-illuminated to form agglomerate 180 on the first substrate 110 (ie, at least a portion of the first surface 160s of the first protective layer 160 that is exposed outside of the first alignment layer 170) or the first alignment layer 170 on. The material of the agglomerate 180 formed by photopolymerization of the ultraviolet-curable monomer is a polymer, and the reaction conditions in different regions are different.

In one embodiment, the display panel 100 is vertically formed by a nano protrusion structure. For example, a nano-protrusion vertical aligned liquid crystal display panel can be formed by using the same monomer material as the alignment nano-protrusion structure on the surface of the agglomerate 180 and the first alignment layer 170. For example, the monomer in the display area A is polymerized under the condition of continuously providing an applied electric field to form a aligned nano-protrusion structure; and the monomer in the non-display area B is polymerized without applying an electric field. The reaction is carried out to form agglomerates 180 which are arranged in an irregular arrangement and which are arranged in an irregular manner. In this way, the aligned nano-protrusion structure in the display area A can help the liquid crystal molecules to have a specific direction alignment, and the agglomerate 180 located in the non-display area B causes the liquid crystal molecules in the liquid crystal layer 130 to receive a vertical alignment effect. Therefore, when the external force is applied, the light can be recovered quickly, and the light leakage of the display panel 100 can be reduced, thereby improving the quality of the displayed image.

The alignment of the nano-protrusion structure and the formation of the agglomerate 180 of the above-described partitions can be produced in a variety of ways. For example, the patterned design of the electrodes may be such that the substrate corresponding to the non-display area B does not have an electrode portion, and the monomer is not affected by the electric field when performing ultraviolet polymerization; or, it may be continuously provided. When the electric field is irradiated with ultraviolet light, the non-display area B is shielded by using the patterned mask, so that the monomer in the non-display area B is not subjected to ultraviolet photopolymerization when subjected to an applied electric field, and then ultraviolet light polymerization is performed after the electric field is removed. reaction.

As shown in FIG. 1B , in the embodiment, the display panel 100 further includes a plurality of spacer elements 291 disposed between the first substrate 110 and the second substrate 120 and configured to provide a gap to provide the liquid crystal layer 130 . . The plurality of spacer elements 291 can have different heights to provide spacer elements 291 of different heights as a buffer when the panel is pressed.

In an embodiment, as shown in FIG. 1B, the display panel 100 may include An electrode layer 190 is formed over at least a portion of the first substrate 110, such as a patterned electrode layer. As shown in FIG. 1B, the display panel 100 further includes another electrode layer 290 on the second substrate 120, and the display panel 100 further includes a second alignment layer 270 on the electrode layer 290, and the second alignment layer. 270 exposes one of the second surfaces 290s of the electrode layer 290, and the agglomerate 180 may be located on at least a portion of the second surface 290s, that is, the exposed second surface 290s of the electrode layer 290. In an embodiment, the electrode layer 290 on the second substrate 120 may be a patterned transparent electrode layer or a comprehensive transparent electrode layer, and the electrode layer material is, for example, ITO or IZO.

In an embodiment, the first alignment layer 170 and the second alignment layer 270 are, for example, polyimide (PI) films.

In an embodiment, as shown in FIG. 1B, the display panel 100 further includes a sealant 295. The sealant 295 is located between the first substrate 110 and the second substrate 120 and is located in a peripheral region of the non-display area B.

As shown in FIGS. 1A-1B, in the embodiment, the first alignment layer 170 does not completely cover the area within the sealant 295. Relative to when the first alignment layer 170 completely covers the first substrate 110, in this case, the sealant 295 is completely bonded to the first alignment layer 170, but the adhesion between the sealant 295 and the first alignment layer 170 is not Preferably, it is easy to cause peeling of the film. According to the embodiment of the present disclosure, since the first alignment layer 170 partially covers the first substrate 110, at least a portion of the sealant 295 can be adhered to the first substrate 110 to have a better adhesive material. The problem of film peeling of the display panel 100 can be reduced.

In this case, the agglomerate 180 is also located on the first surface 160s of the first protective layer 160 that is exposed outside the first alignment layer 170, and is located in the non-display area B. The agglomerate 180 in the inner layer allows the liquid crystal molecules in the liquid crystal layer 130 to receive a vertical alignment effect, so that it can recover faster when operated by an external force, and the light leakage phenomenon of the display panel 100 can be reduced, thereby improving the quality of the displayed image.

In the embodiment, as shown in FIG. 1B , the display panel 100 further includes a color filter layer 297 on the first substrate 110 . In another embodiment, the color filter layer may also be disposed on the second substrate 120 (not shown).

FIG. 2 is a simplified exploded view of the display panel 100 in accordance with an embodiment of the present disclosure. It is to be noted that some of the components in FIG. 2 are omitted or simplified for the purpose of clearly illustrating the contents of the embodiments, and the dimensional ratios in the drawings are not drawn to the scale of the actual products, and thus are not intended to limit the scope of the disclosure. Use. In this embodiment, the design of the side of the substrate 110/120 is closely followed (or tangled) by the sealant 295. In another embodiment, the sealant 295 may not be adjacent to the side of the substrate 110/120, or In another embodiment, the sealant 295 is only adjacent to three sides of the substrate 110, and the other side is not adjacent to the side of the substrate 110.

In an embodiment, the display panel 100 further includes at least one data line DL and at least one scan line SL. The display area A has a plurality of pixels P, and the data line DL and the scan line SL intersect to define a pixel area P. The non-display area B further includes a plurality of metal traces ML, wherein a portion of the plurality of metal traces ML and the scan line SL are formed in the same layer metal or in the same process, and the plurality of metal traces are partially formed. The ML system and the data line DL are formed in the same layer of metal or in the same process. Please refer to FIG. 1B and FIG. 2 simultaneously. Some of the metal traces ML may be located under the second protective layer 161, and the remaining metal traces ML may be located. The first protective layer 160 is under. However, the metal trace ML may also have a different configuration than that shown in Figures 1 and 2, depending on the design requirements.

Referring to FIG. 1B and FIG. 2 simultaneously, the display panel 100 further includes a light shielding layer 293. In the embodiment, the light shielding layer 293 is, for example, a black matrix (BM), and the black matrix is located on the second substrate 120. In an embodiment, the non-display area B may include a driver on panel 299, such as a gate on panel (GOP) or a data line driver circuit. The gate line driving circuit or the data line driving circuit may exist at the same time or separately separately on the panel. The figure only shows a set of gate drive circuits, and there are also multiple sets of gate drive circuits or multiple sets of data line drive circuits, depending on the design requirements.

FIG. 3 is a partial perspective view of the metal trace ML in the non-display area B as shown in FIG. 2.

In an embodiment, as shown in FIG. 3, the display panel 100 may further have a plurality of nanogrooves 310. The nanochannel 310 is located on one side of at least one of the metal traces ML in the non-display area B. As shown in FIG. 3, the nanochannel 310 is located on at least one inclined surface of the metal trace ML. In an embodiment, the nanochannels 310 may also be formed on the slopes of the two sides of the at least one metal trace ML in the non-display area B. In an embodiment, the nanochannel 310 may be formed in a region having an alignment layer in the non-display region B and a region having no alignment layer. In the embodiment, as shown in FIG. 3, the extending direction D1 of the nanochannel 310 and the extending direction D2 of the metal trace ML intersect and have an angle. In one embodiment, the angle is, for example, about 90°.

In general, the metal traces ML in the non-display area B may be easily reflective. According to the embodiment of the present disclosure, the nanochannel 310 is located on one side of the metal trace ML, particularly on the inclined surface of the metal trace ML, and can reduce the reflection of the light trace of the metal trace ML, thereby reducing the The brightness of the area, forming Good dark areas and the effect of improving light leakage. In other embodiments, the metal traces ML may have other configuration patterns, and are not limited to linear metal traces.

In one embodiment, as shown in FIG. 3, the display panel 100 may further include a plurality of submicron protrusions 320, and the submicron protrusion structures 320 are located in the non-display area B. The sub-micron protrusion structures 320 are arranged along the extending direction D2 of at least one of the metal traces ML. In other words, the plurality of sub-micron protrusion structures 320 grow along the extending direction D2 of the metal traces ML. In one embodiment, the sub-micron protrusion structure 320 can be disposed parallel to the edge of the metal trace ML. In another embodiment, the sub-micron protrusion structure 320 may also be formed on the slope of the metal trace ML. The sub-micron protrusion structure 320 has a size of less than about 1 micrometer (μm). In an embodiment, the sub-micron protrusion structure 320 is located in a region of the non-display region B that does not have an alignment layer, and the sub-micron protrusion structure 320 may be located on a region of the first surface 160s exposed by the first protection layer 160.

In the non-display area B, particularly in the area without the alignment layer, the sub-micron protrusion structure 320 is disposed along the extending direction D2 of the metal trace ML, so that the edge of the metal trace ML is less smooth and tidy, and the metal can be lowered. Trace the reflection of light from ML. In this way, the brightness of the area can be reduced, and a good dark area can be formed, thereby achieving the effect of improving the light leakage phenomenon.

Fig. 4 is a cross-sectional view showing the display panel of another embodiment of the present disclosure taken along line 4-4' of Fig. 1A. In one embodiment, as shown in FIG. 4, the light shielding layer 293 is located on the second substrate 120, and at least a portion of the light shielding layer 293 corresponds to the non-display area B. The light shielding layer 293 has a light transmitting region 293a and a light shielding region 293b, and a plurality of agglomerates are formed at the corresponding light transmitting regions 293a and corresponding to the light shielding regions 293b. The light-transmitting region 293a of the light-shielding layer 293 is used to illuminate the agglomerate 180 The hardening reaction is more complete. In an embodiment, the agglomerates are formed on the first substrate 110, and the agglomerates may be formed on the second substrate 120, so the surface roughness on the first substrate 110 and above the second substrate 120 is Formed by agglomerates. The shape of the geomorphology corresponding to different roughness has different influence on the liquid crystal tilting, and the shape of the landform with larger roughness has greater influence on the liquid crystal. As for the influence of the roughness on the liquid crystal dumping and the mode of action, the characteristics of the agglomerates in each region are different, and it depends on the range of the influence of the operating voltage. The roughness can be adjusted by using a gray scale mask or by using a mask to control the illumination level and time of the display area A and the non-display area B, respectively.

As shown in FIG. 4, in the embodiment, the agglomerate 180a corresponding to the light-transmitting region 293a generates a first surface roughness, and the agglomerate 180c corresponding to the light-shielding region 293b generates a second surface roughness, first The surface roughness is greater than the second surface roughness. In an embodiment, the first surface roughness and the second surface roughness may represent surface roughness above the first substrate 110 and above the second substrate 120.

As shown in Fig. 4, the agglomerate 180b corresponding to the display area A produces a third surface roughness. In an embodiment, the first surface roughness is greater than the third surface roughness, and the third surface roughness is greater than the second surface roughness. In one embodiment, the first surface roughness, the second surface roughness, and the third surface roughness represent surface roughness above the second substrate 120.

As shown in FIG. 4, the agglomerate 180d corresponding to the adjacent sealant 295 produces a fourth surface roughness, the fourth surface roughness being greater than the third surface roughness. In one embodiment, the third surface roughness and the fourth surface roughness represent surface roughness above the first substrate 110.

In the above embodiment, the first surface roughness, the second surface roughness, The third surface roughness and the fourth surface roughness may be at least one of a square root roughness, an average roughness, or a maximum roughness. In one embodiment, the first surface roughness, the second surface roughness, the third surface roughness, and the fourth surface roughness are represented, for example, by an average roughness.

The following examples are further described. The following series shows the measurement results of the roughness of several different regions of the display panel 100 to illustrate the characteristics of the display panel 100 of the present disclosure. However, the following examples are for illustrative purposes only and are not to be construed as limiting the implementation of the disclosure. The measurement results of the roughness of each region are shown in Table 1, wherein the measured roughness includes a root mean square roughness (Rq), an average roughness (Ra), and a maximum roughness (Rmax). The various roughnesses listed in Table 1 were measured by an atomic force microscope (AFM, machine model: VEECO Dimension-icon) in an area of 5 x 5 square microns in a selected area.

As can be seen from the results of Table 1, the agglomerates corresponding to the light-transmitting regions 293a The resulting average roughness (Ra = 20.7 nm) was greater than the average roughness (Ra = 14.1 nm) produced by the agglomerates corresponding to the light-shielding region 293b. Further, the average roughness (Ra = 15.8 nm) produced by the agglomerates corresponding to the display area A and the average roughness (Ra = 14.1 nm) generated by the agglomerates corresponding to the light-shielding regions 293b. In other words, the average roughness (first average roughness) of the light-transmitting region 293a is the largest, the average roughness (third average roughness) of the display region A is second, and the average roughness (second average roughness) of the light-blocking region 293b is obtained. ) is smaller than the previous two regions.

In addition, the agglomerate roughness (Rq=27.3 nm) and maximum roughness (Rmax=270 nm) generated by the agglomerates corresponding to the light-transmitting regions 293a of the non-display area B are respectively greater than those corresponding to the non-display area B. The agglomerates of the light-shielding zone 293b produced a square root roughness (Rq = 18.7 nm) and a maximum roughness (Rmax = 168 nm). Furthermore, the square root roughness (Rq=20.6 nm) maximum roughness (Rmax=172 nm) produced by the agglomerates corresponding to the display area A are respectively larger than the square root roughness generated by the agglomerates corresponding to the light-shielding area 293b. Degree (Rq = 18.7 nm) and maximum roughness (Rmax = 168 nm). Therefore, in the non-display area B, since the pixel operation voltage is not applied in the display area A during the operation, the roughness of the landform formed by the agglomerates of the light-shielding area 293a is used to increase the influence on the liquid crystal, so that the The agglomerate 180 in the non-display area B allows the liquid crystal molecules in the liquid crystal layer 130 to receive a vertical alignment effect, so that it can recover faster when operated by an external force, and can reduce the light leakage phenomenon of the display panel 100, thereby improving the display image. Quality. In the light-shielding region 293b, since it is a light-shielding region, the roughness of the landform formed by the agglomerate may be smaller than the roughness of the light-transmitting region 293a. The display area A has a pixel operating voltage due to its display, and the roughness is second to the roughness of the light-transmitting area 293a in the non-display area B. Therefore, the roughness of the light transmitting region 293a (the first square root roughness, the first maximum thickness The roughness is the largest, the roughness of the display area A (third-party root roughness, the third maximum roughness) is second, and the roughness of the light-shielding area 293b (the second-square root roughness, the second maximum roughness) is earlier than Both areas are small. Adjacent to the fourth surface roughness of the sealant 295, the illumination angle of the illumination sealant 295 can be adjusted, so that the fourth surface can be affected by more illumination light, so the fourth surface illumination time is longer than other regions. Therefore, the roughness of the fourth surface is larger than that of other regions.

FIG. 5 is a schematic top plan view of the display panel 200 according to an embodiment of the present disclosure. As shown in FIG. 5, the display panel 200 includes a first substrate 110, a second substrate 120, a liquid crystal layer (not shown), a shielding pattern C, and a reactive monomer (RM). The reactive single system refers to a material which is added to a liquid crystal layer and which contains a specific functional group (for example, an acrylic group) and which is irradiated with a specific wavelength light source to generate a polymerization reaction to form a polymer structure. The first substrate 110 has at least one display area A and a non-display area B. The non-display area B is located outside the display area A, and the second substrate 120 is disposed opposite to the first substrate 110. The liquid crystal layer is located between the first substrate 110 and the second substrate 120, and the reactive monomer is mixed in at least the liquid crystal layer. The shielding pattern C may be located on the first substrate 110 or the second substrate 120 and corresponds to a portion A1 of the non-display area B and the display area A adjacent to the non-display area B, that is, the shielding pattern C refers to the self-sealing rubber 295. The shielding pattern of the inner edge to the non-display area B and the display area A direction and the non-display area B and the display area A, the masking pattern on the sealant 295 (overlap) or the outer edge of the sealant 295 (not shown) It is not the shadow pattern C here. In a region corresponding to the mask pattern C, the aperture ratio of the mask pattern C is X, and the residual concentration of the reactive monomer is Y ppm, then X and Y satisfy the following formula: 2847.7e ^-3.6375X >Y >1774.1e ^-8.9014X . The aperture ratio is the ratio of the effective area through which light can penetrate.

Figure 6 is a graph showing the relationship between the aperture ratio (X) of the mask pattern and the reactive monomer concentration (Y) of the embodiment of the present disclosure. In the examples, the concentration of the reactive monomer indicates the residual amount of the reactant monomer, and the aperture ratio shows the light transmittance. In Fig. 6, curves I, II, III, IV, V, and VI respectively indicate the aperture ratio (X) of the masking pattern of the photoreaction reaction time of 30 minutes, 60 minutes, 90 minutes, 120 minutes, 150 minutes, and 180 minutes, respectively. The relationship between the residual amount of reactive monomer (Y). As shown in Figure 6, different aperture ratios can result in different reactive monomer residues; the longer the reaction time, the lower the reactant residue. When the residual amount of the reactive monomer is higher, the image sticking of the display panel is more severe, and the display quality is not good.

FIG. 7 is a schematic diagram showing the aperture ratio of the shielding pattern of the embodiment of the disclosure with respect to the image sticking phenomenon of the display panel. In Fig. 7, the checkered image is used as the test image, and the checkered pattern is continuously displayed for a certain period of time, and then the image is set to the same gray scale to compare the residual image phenomenon in each region. First, the region 701 in FIG. 7 is pasted on the mask film 900 and a checkered pattern is displayed. The mask film 900 can be used to block the range of the irradiation band (200 nm to 400 nm) which affects the polymerization reaction of the reactive monomer (RM). After the test is performed for a period of time, after the image is set to the same gray scale, the area after the partial masking film 900 is peeled off will form a pattern such as the area 701a, because the area 701 reacts to the area 701 because the aperture ratio is zero. The monomer (RM) cannot absorb the reactive band source to form a polymer structure, and thus the reactive monomer (RM) remains in a large amount, resulting in a very serious residual image in the region. The aperture ratio of the region 701 is 0, the aperture ratio of the region 703 is higher than the aperture ratio of the region 701, and the region 702 is located at the boundary of the region 701 and the region 703, and has the same aperture ratio as the region 703. As shown in Fig. 7, it can be found that the residual image of the region 701 having an aperture ratio of 0 is very strict. Heavy, relatively speaking, the residual image of the region 703 having a higher aperture ratio is relatively slight. Further, although the region 702 has the same aperture ratio as the region 703, since the unreacted reactive monomer of the region 701 diffuses to the region 702, the afterimage of the region 702 is more severe than the region 703.

In one embodiment, when the concentration of the unreacted reactive monomer is less than 400 ppm (Y<400), and the opening ratio of the shielding pattern is 10% or more and less than 100% (10) X<100), the display panel 200 has less afterimages and thus has better display quality.

In an embodiment, for example, when the display panel 200 is a large-sized panel, as shown in FIG. 5, the area covered by the shielding pattern C extends from the periphery B1 of the non-display area B toward the display area A, and the shielding pattern C extends. The distance W2 is, for example, 10 to 15 times the width W1 of the non-display area B.

In an embodiment, for example, when the display panel 200 is a small-sized panel, the area covered by the shielding pattern C extends from the periphery B1 of the non-display area B (that is, the inner edge of the sealant 295) toward the display area A. The distance W2 of the shielding pattern C is, for example, 3 cm; or the distance from the periphery B1 of the non-display area B on the opposite sides toward the display area A, and the total distance W2 of the shielding patterns of the two opposite sides is, for example, It is 6 cm. In the embodiment, when the display panel 200 is a small-sized panel, for example, a display panel applied to a mobile phone screen, the shielding pattern C may completely cover the non-display area B and the display area A.

FIG. 8A is a schematic diagram showing a masking pattern 801 according to an embodiment of the disclosure, and FIG. 8B is a schematic diagram showing a masking pattern 803 according to another embodiment of the disclosure. In an embodiment, the shielding pattern may include at least one of a plurality of metal traces or a light shielding layer. As shown in FIG. 8A, the shielding pattern 801 is, for example, A plurality of metal traces are included; as shown in FIG. 8B, the mask pattern 803 includes, for example, a light shielding layer.

As shown in FIG. 8A, in the peripheral region of the display area A, the metal trace M of the shielding pattern 801 has a line width W3 of, for example, less than 50 μm.

As shown in FIG. 8B, the shielding pattern 803 is, for example, a light shielding layer having a plurality of openings 803a, and the size D3 of the opening 803a is, for example, about 100 μm.

In conclusion, the present invention has been disclosed in the above preferred embodiments, and is not intended to limit the present invention. A person skilled in the art can make various changes and modifications without departing from the spirit and scope of the invention. Therefore, the scope of the invention is defined by the scope of the appended claims.

Claims (7)

A display panel includes: a first substrate, wherein the first substrate has at least one display area and a non-display area, the non-display area is located outside the display area; a second substrate is disposed opposite to the first substrate; a liquid crystal layer between the first substrate and the second substrate; a plurality of thin film transistors on the first substrate; a plurality of metal traces on the first substrate; a protective layer covering at least a portion of the a metal trace; a first alignment layer on the protective layer and exposing a first surface of the protective layer; a plurality of agglomerates, at least on a portion of the first surface; a light shielding layer is disposed on the second substrate and corresponds to the non-display area, the light shielding layer has a light transmitting area and a light shielding area, and corresponds to a first surface generated by the polymer particles of the display area The average roughness is different from a second surface average roughness produced by the high molecular polymer particles corresponding to the light shielding region. The display panel of claim 1, wherein the protective layer directly contacts at least one of the thin film transistors and the metal traces. The display panel of claim 1, wherein the protective layer comprises an inorganic dielectric material. The display panel of claim 1, wherein the first surface corresponds to a non-display area. The display panel of claim 1, further comprising a plurality of spacer elements between the first substrate and the second substrate and for providing a gap to set the liquid crystal layer. The display panel of claim 1, further comprising: an electrode layer on the second substrate; and a second alignment layer on the electrode layer and exposing a second surface of the electrode layer; The high molecular polymer particles are further located on at least a portion of the second surface. The display panel of claim 1, wherein the first surface average roughness generated by the high molecular polymer particles corresponding to the display area is greater than the high molecular polymerization corresponding to the light shielding area. The second surface average roughness produced by the particles.