TWI630447B - Display panel and optical sheet thereof - Google Patents
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- G—PHYSICS
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- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/1336—Illuminating devices
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133509—Filters, e.g. light shielding masks
- G02F1/133514—Colour filters
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/1336—Illuminating devices
- G02F1/133602—Direct backlight
- G02F1/133605—Direct backlight including specially adapted reflectors
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/1336—Illuminating devices
- G02F1/133602—Direct backlight
- G02F1/133606—Direct backlight including a specially adapted diffusing, scattering or light controlling members
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- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/1336—Illuminating devices
- G02F1/133614—Illuminating devices using photoluminescence, e.g. phosphors illuminated by UV or blue light
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Abstract
本發明提供一種顯示面板及其使用之光學片。光學片包括基底層、遮光層、彩色濾光結構、散射層以及第一反射層。遮光層位於基底層之上,且遮光層具有複數個開口。彩色濾光結構設置於至少部分的開口中,且彩色濾光結構包括複數量子點。散射層設置於彩色濾光結構與基底層之間。第一反射層設置在彩色濾光結構與遮光層之間。據此,透過散射層和第一反射層可以提升量子點受激發的機率,藉以提升顯示面板的光轉換效率。The invention provides a display panel and an optical sheet used by the display panel. The optical sheet includes a base layer, a light shielding layer, a color filter structure, a scattering layer, and a first reflective layer. The light-shielding layer is located on the base layer, and the light-shielding layer has a plurality of openings. The color filter structure is disposed in at least a part of the opening, and the color filter structure includes a plurality of sub-dots. The scattering layer is disposed between the color filter structure and the base layer. The first reflective layer is disposed between the color filter structure and the light-shielding layer. According to this, the probability of the quantum dots being excited can be increased through the scattering layer and the first reflective layer, thereby improving the light conversion efficiency of the display panel.
Description
本發明涉及一種量子點顯示技術,尤其是一種顯示面板及其使用之光學片。The invention relates to a quantum dot display technology, in particular to a display panel and an optical sheet used by the display panel.
量子點顯示(quantum dot display)技術,因其良好的光學性質,近來被大幅應用於各式具有顯示螢幕的電子裝置,例如智慧型手機、平板電腦、筆記型電腦及液晶電視等。對於量子點顯示技術而言,顯示面板額外設置具有多種顏色量子點的量子點強化膜在背光模組與彩色濾光片(quantum dot color filter,QDCF)之間,或者以量子點彩色濾光片取代傳統的彩色濾光片。Quantum dot display technology, due to its good optical properties, has recently been widely used in various electronic devices with display screens, such as smart phones, tablet computers, notebook computers, and LCD TVs. For quantum dot display technology, the display panel is additionally provided with a quantum dot enhanced film with multiple colors of quantum dots between the backlight module and a color dot (quantum dot color filter, QDCF), or a quantum dot color filter Replace traditional color filters.
以量子點彩色濾光片來說,其彩色濾光結構具有量子點,並且此些量子點可受入射至彩色濾光結構中的光線激發而發射出特定顏色的光線。然而,入射至彩色濾光結構中的光線中有一部分無法有效地被轉換,導致顯示面板的光利用率不彰。For a quantum dot color filter, its color filter structure has quantum dots, and these quantum dots can be excited by the light incident into the color filter structure to emit light of a specific color. However, part of the light incident on the color filter structure cannot be effectively converted, resulting in poor light utilization of the display panel.
為了解決習用技術上所面臨的問題,本發明涉及一種顯示面板及其使用之光學片,藉以提升顯示面板之光轉換效率。In order to solve the problems faced by conventional technologies, the present invention relates to a display panel and an optical sheet used by the display panel to improve the light conversion efficiency of the display panel.
在一實施例中,一種光學片,其包括基底層、遮光層、散射層、彩色濾光結構以及第一反射層。遮光層位於基底層之上,且遮光層具有複數個開口。彩色濾光結構設置於至少部分的開口中,且彩色濾光結構包括複數量子點。散射層位於彩色濾光結構與基底層之間。第一反射層設置在彩色濾光結構與遮光層之間。In one embodiment, an optical sheet includes a base layer, a light shielding layer, a scattering layer, a color filter structure, and a first reflective layer. The light-shielding layer is located on the base layer, and the light-shielding layer has a plurality of openings. The color filter structure is disposed in at least a part of the opening, and the color filter structure includes a plurality of sub-dots. The scattering layer is located between the color filter structure and the base layer. The first reflective layer is disposed between the color filter structure and the light-shielding layer.
在一實施例中,一種顯示面板,其包括第一基板、第二基板、顯示介質層、複數條訊號線、複數個主動元件、基底層、遮光層、散射層、彩色濾光結構、第一反射層以及複數畫素電極。第二基板與第一基板相對設置。顯示介質層位於第一基板與第二基板之間。訊號線位於第一基板之上。主動元件位於第一基板之上,並與訊號線電性連接。遮光層位於基底層之上,且具有複數個開口。其中,在第一基板的一垂直投影方向上,遮光層至少與部分的訊號線重疊。散射層位於基底層之上。彩色濾光結構具有複數個光轉換圖案,光轉換圖案設置於至少部分的開口中,且各光轉換圖案包括複數量子點。第一反射層設置在彩色濾光結構與遮光層之間。畫素電極與開口對應設置,並且分別與對應的主動元件電性連接。In one embodiment, a display panel includes a first substrate, a second substrate, a display medium layer, a plurality of signal lines, a plurality of active elements, a base layer, a light shielding layer, a scattering layer, a color filter structure, and a first A reflective layer and a plurality of pixel electrodes. The second substrate is disposed opposite the first substrate. The display medium layer is located between the first substrate and the second substrate. The signal line is located on the first substrate. The active component is located on the first substrate and is electrically connected to the signal line. The light shielding layer is located on the base layer and has a plurality of openings. Wherein, in a vertical projection direction of the first substrate, the light shielding layer overlaps at least part of the signal lines. The scattering layer is located on the base layer. The color filter structure has a plurality of light conversion patterns, the light conversion patterns are disposed in at least a part of the openings, and each light conversion pattern includes a plurality of sub-dots. The first reflective layer is disposed between the color filter structure and the light-shielding layer. The pixel electrodes are disposed corresponding to the openings, and are electrically connected to the corresponding active elements, respectively.
綜上,根據本發明的顯示面板及其使用之光學片,其透過入光面的散射層及彩色濾光結構與遮光層之間的反射層使光線在彩色濾光結構中有較長的光徑,藉以提升量子點受激發的機率,進而提升顯示面板的光轉換效率。於一些實施例中,散射層形成於基底層的表面上,藉此還可以適度地簡化製作工序。於一些實施例中,彩色濾光結構與遮光層之間的反射層未設置到鄰近出光面的部份,藉以避免造成環境光源的反射而致使顯示面板出現反光的現象。In summary, according to the display panel of the present invention and the optical sheet used by the display panel, the light-transmitting scattering layer and the reflective layer between the color filter structure and the light-shielding layer allow light to have a longer light in the color filter structure. Path to increase the probability of quantum dots being excited, thereby improving the light conversion efficiency of the display panel. In some embodiments, the scattering layer is formed on the surface of the base layer, so that the manufacturing process can be appropriately simplified. In some embodiments, the reflective layer between the color filter structure and the light-shielding layer is not disposed on a portion adjacent to the light-emitting surface, so as to avoid reflection of the display panel due to reflection of ambient light sources.
圖1A繪示本發明之第一實施例的光學片的局部俯視示意圖。圖1B為沿圖1A中A-A剖線所繪示的光學片的剖面示意圖。FIG. 1A is a schematic partial plan view of an optical sheet according to a first embodiment of the present invention. FIG. 1B is a schematic cross-sectional view of the optical sheet shown along a line A-A in FIG. 1A.
請參考圖1A至圖1B,光學片10包括基底層11、遮光層12、散射層13、彩色濾光結構14以及第一反射層15。Referring to FIGS. 1A to 1B, the optical sheet 10 includes a base layer 11, a light-shielding layer 12, a scattering layer 13, a color filter structure 14, and a first reflection layer 15.
在本實施例中,遮光層12位於基底層11之上,且遮光層12具有複數個開口121。其中,遮光層12包含鄰近基底層11的下表面12s1、與下表面12s1相對的上表面12s2、以及連接下表面12s1與上表面12s2的側壁12s3。遮光層12可遮蔽光線,而遮光層12的開口121則可供光線通過。In this embodiment, the light shielding layer 12 is located on the base layer 11, and the light shielding layer 12 has a plurality of openings 121. The light shielding layer 12 includes a lower surface 12s1 adjacent to the base layer 11, an upper surface 12s2 opposite to the lower surface 12s1, and a sidewall 12s3 connecting the lower surface 12s1 and the upper surface 12s2. The light-shielding layer 12 can shield light, and the opening 121 of the light-shielding layer 12 can allow light to pass through.
彩色濾光結構14設置於至少部分的開口121中,且彩色濾光結構14包括複數量子點142。需要說明的是,於此所稱之量子點142並不限於點狀的零維結構,亦可以為多維度之結構,例如:量子線、量子錐、量子柱等,為求簡便,在此通稱為量子點142。其中,透過控制量子點142的粒徑大小可以決定出光的顏色。The color filter structure 14 is disposed in at least a part of the opening 121, and the color filter structure 14 includes a plurality of sub-dots 142. It should be noted that the quantum dot 142 referred to herein is not limited to a point-like zero-dimensional structure, and may also be a multi-dimensional structure, such as a quantum wire, a quantum cone, a quantum column, etc. As the quantum dot 142. Among them, the color of the light can be determined by controlling the particle size of the quantum dots 142.
第一反射層15設置在彩色濾光結構14與遮光層12之間。散射層13位於基底層11之上。其中,彩色濾光結構14鄰近基底層11的表面為入光面14s1,而彩色濾光結構14遠離基底層11的表面為出光面14s2。散射層13至少位在彩色濾光結構14與基底層11之間。在本實施例中,散射層13可設置在彩色濾光結構14的入光面14s1上。The first reflective layer 15 is disposed between the color filter structure 14 and the light shielding layer 12. The scattering layer 13 is located on the base layer 11. The surface of the color filter structure 14 adjacent to the base layer 11 is a light incident surface 14s1, and the surface of the color filter structure 14 remote from the base layer 11 is a light exit surface 14s2. The scattering layer 13 is at least located between the color filter structure 14 and the base layer 11. In this embodiment, the scattering layer 13 may be disposed on the light incident surface 14s1 of the color filter structure 14.
於一些實施例中,彩色濾光結構14可包括複數個光轉換圖案141,並且光轉換圖案141設置於至少部分的開口121中。複數個光轉換圖案141的顏色可以相同,但不以此為限;在其他實施例中,複數個光轉換圖案141的顏色可以不相同。於一實施例中,此些光轉換圖案141會一對一設置在開口121中。光轉換圖案141與第一反射層15可填滿所設置的整個開口121。遮光層12可環繞各光轉換圖案141。In some embodiments, the color filter structure 14 may include a plurality of light conversion patterns 141, and the light conversion patterns 141 are disposed in at least a part of the opening 121. The colors of the plurality of light conversion patterns 141 may be the same, but not limited thereto; in other embodiments, the colors of the plurality of light conversion patterns 141 may be different. In one embodiment, the light conversion patterns 141 are disposed one-to-one in the opening 121. The light conversion pattern 141 and the first reflection layer 15 may fill the entire opening 121 provided. The light shielding layer 12 may surround each light conversion pattern 141.
於一實施例中,以光學片10將入射光線轉換成紅光和綠光為例。若光源為藍光,光轉換圖案141可包括紅光的光轉換圖案141與綠光的光轉換圖案141,並且一部分的開口121則不設置光轉換圖案141而是設置光穿透圖案。紅光的光轉換圖案141可將入射的藍光光線轉換成紅光以射出紅光。綠光的光轉換圖案141可將入射的藍光光線轉換成綠光以射出綠光。而光穿透圖案則是使藍光光源穿透而射出藍光。於另一實施例中,光學片10是將入射光線分別轉換成紅光、藍光和綠光為例,若光源為紫外光,光轉換圖案141可包括紅光的光轉換圖案141、藍光的光轉換圖案141與綠光的光轉換圖案141,並且分別設置於的對應的一開口121中,紅光的光轉換圖案141可將入射的紫外光轉換成紅光以射出紅光、綠光的光轉換圖案141可將入射的紫外光轉換成綠光以射出綠光、而藍光的光轉換圖案141可將入射的紫外光轉換成藍光以射出藍光。但本發明並不以此為限,光轉換圖案141所能轉換的光的顏色及/或配置數量可隨著實際應用需求而調整。In one embodiment, the optical sheet 10 converts incident light into red light and green light as an example. If the light source is blue light, the light conversion pattern 141 may include a red light conversion pattern 141 and a green light conversion pattern 141, and a part of the opening 121 is not provided with the light conversion pattern 141 but a light transmission pattern. The red light conversion pattern 141 can convert incident blue light into red light to emit red light. The green light conversion pattern 141 can convert incident blue light into green light to emit green light. The light transmission pattern allows the blue light source to penetrate and emit blue light. In another embodiment, the optical sheet 10 converts incident light into red light, blue light, and green light as an example. If the light source is ultraviolet light, the light conversion pattern 141 may include red light conversion pattern 141 and blue light. The conversion pattern 141 and the green light conversion pattern 141 are respectively disposed in corresponding openings 121. The red light conversion pattern 141 can convert incident ultraviolet light into red light to emit red and green light. The conversion pattern 141 can convert incident ultraviolet light into green light to emit green light, and the blue light conversion pattern 141 can convert incident ultraviolet light into blue light to emit blue light. However, the present invention is not limited thereto, and the color and / or configuration quantity of light that can be converted by the light conversion pattern 141 can be adjusted according to actual application requirements.
如圖1B所示,在本實施例中,第一反射層15完全覆蓋遮光層12鄰近彩色濾光結構14的整個側壁12s3。遮光層12、第一反射層15與彩色濾光結構14的光轉換圖案141沿著垂直於基底層11表面的方向具有一既定厚度。散射層13設置於彩色濾光結構14的入光面141s1與基底層11之間。其中,散射層13可以是直接鄰接彩色濾光結構14與基底層11,但並不以此為限;散射層13亦可以不直接鄰接彩色濾光結構14與基底層11。As shown in FIG. 1B, in this embodiment, the first reflective layer 15 completely covers the entire sidewall 12 s 3 of the light shielding layer 12 adjacent to the color filter structure 14. The light conversion pattern 141 of the light shielding layer 12, the first reflection layer 15 and the color filter structure 14 has a predetermined thickness along a direction perpendicular to the surface of the base layer 11. The scattering layer 13 is disposed between the light incident surface 141 s 1 of the color filter structure 14 and the base layer 11. The scattering layer 13 may be directly adjacent to the color filter structure 14 and the base layer 11, but is not limited thereto. The scattering layer 13 may not be directly adjacent to the color filter structure 14 and the base layer 11.
圖2繪示本發明之第一實施例的光學片受光照射時的局部剖面示意圖。請參考圖2,在本實施例的光學片10中,當光線L從基底層11相對於彩色濾光結構14的另一側射向光學片10並進入光學片10時,入射的光線會由散射層13散射至彩色濾光結構14的內部,藉以增加光線在彩色濾光結構14中的光徑,進而提升量子點142受光線激發的機率,因而提升光轉換效率。並且,當彩色濾光結構14中的光線射向遮光層12時,射向遮光層12的光線會先照射到第一反射層15並且被第一反射層15反射回彩色濾光結構14的內部,藉以減少光線被遮光層12吸收掉,並進一步增加光線在彩色濾光結構14中的光徑,進而提升量子點142受光線激發的機率,因而提升光轉換效率。同樣地,量子點142受光線激發而發射出的光線若是射向遮光層12時亦可被第一反射層15反射回彩色濾光結構14的內部,並且射向彩色濾光結構14的出光面14s2或透過多次反射而射向彩色濾光結構14的出光面14s2,藉以減少光線被遮光層12吸收掉。基於上述,本實施例的光學片10可以提升量子點受激發的機率,進而提升光轉換效率。FIG. 2 is a schematic partial cross-sectional view of the optical sheet according to the first embodiment of the present invention when irradiated with light. Please refer to FIG. 2. In the optical sheet 10 of this embodiment, when the light L is incident from the other side of the base layer 11 relative to the color filter structure 14 toward the optical sheet 10 and enters the optical sheet 10, the incident light is transmitted by The scattering layer 13 scatters into the inside of the color filter structure 14, thereby increasing the light path of the light in the color filter structure 14, thereby increasing the probability of the quantum dot 142 being excited by the light, thereby improving light conversion efficiency. In addition, when the light in the color filter structure 14 is directed toward the light-shielding layer 12, the light directed at the light-shielding layer 12 will first strike the first reflection layer 15 and be reflected back to the inside of the color filter structure 14 by the first reflection layer 15. In order to reduce the absorption of light by the light-shielding layer 12, and further increase the light path of the light in the color filter structure 14, the probability of the quantum dot 142 being excited by the light is increased, thereby improving the light conversion efficiency. Similarly, if the light emitted by the quantum dot 142 is excited by the light, it can be reflected by the first reflective layer 15 back to the inside of the color filter structure 14 when it is directed toward the light shielding layer 12, and it can be directed toward the light emitting surface of the color filter structure 14 14s2 or transmitted to the light emitting surface 14s2 of the color filter structure 14 through multiple reflections to reduce light being absorbed by the light shielding layer 12. Based on the above, the optical sheet 10 of this embodiment can increase the probability of the quantum dots being excited, thereby improving the light conversion efficiency.
請參考圖3A。圖3A繪示本發明之第二實施例的光學片的局部俯視示意圖。圖3B為沿圖3A中B-B剖線所繪示的光學片的剖面示意圖。圖3A與圖3B所示的第二實施例沿用第一實施例的元件標號與部分內容,其中採用相同的符號標注相同的元件,並且省略了相同技術內容的說明。關於省略部分的說明可參考前述實施例,下述實施例不再重複贅述。Please refer to FIG. 3A. 3A is a schematic partial plan view of an optical sheet according to a second embodiment of the present invention. FIG. 3B is a schematic cross-sectional view of the optical sheet shown along a line B-B in FIG. 3A. The second embodiment shown in FIGS. 3A and 3B follows the component numbers and parts of the components of the first embodiment, in which the same components are labeled with the same symbols, and the description of the same technical content is omitted. For the description of the omitted parts, reference may be made to the foregoing embodiments, and the following embodiments are not repeated.
如圖3A與圖3B所示,不同於第一實施例,在本實施例的光學片10A中, 散射層13A是設置於彩色濾光結構14與基底層11之間以及遮光層12與基底層11之間。在一示範例中,散射層13可覆蓋於基底層11鄰近彩色濾光結構14與遮光層12的整個表面,亦即全面覆蓋於基底層11的上表面11s2。因此,本實施例的光學片10A可以提升量子點受激發的機率,進而提升光轉換效率,並且可透過一次性地工藝將散射層13A製作於基底層11上,進而能適度地簡化散射層13A的製作工序。As shown in FIGS. 3A and 3B, unlike the first embodiment, in the optical sheet 10A of this embodiment, the scattering layer 13A is disposed between the color filter structure 14 and the base layer 11 and the light-shielding layer 12 and the base layer. Between 11. In an exemplary embodiment, the scattering layer 13 may cover the entire surface of the base layer 11 adjacent to the color filter structure 14 and the light-shielding layer 12, that is, the entire surface of the base layer 11 is covered on the upper surface 11 s 2. Therefore, the optical sheet 10A of this embodiment can increase the probability of the quantum dots being excited, thereby improving the light conversion efficiency, and the scattering layer 13A can be fabricated on the base layer 11 through a one-time process, which can further simplify the scattering layer 13A appropriately. Production process.
本發明的光學片並不以上述實施例為限。下文將依序介紹本發明的其它較佳實施例的光學片,且為了便於比較各實施例之相異處並簡化說明,在下文之各實施例中使用相同或近似的標號來表示相同或近似的元件,且主要針對各實施例之相異處進行說明,而不再對重覆部分進行贅述。The optical sheet of the present invention is not limited to the above embodiments. The following will sequentially introduce the optical sheets of other preferred embodiments of the present invention, and in order to facilitate the comparison of the differences between the embodiments and simplify the description, the same or similar reference numerals are used in the following embodiments to indicate the same or similar Components, and mainly describe the differences between the embodiments, and will not repeat the repeated parts.
請參考圖4A與圖4B。圖4A繪示本發明之第三實施例的光學片的局部俯視示意圖。圖4B為沿圖4A中C-C剖線所繪示的光學片的剖面示意圖。如圖4A與圖4B所示,不同於第一實施例,在本實施例的光學片10B中,第一反射層15B設置於部分的遮光層12的側壁12s3上。詳而言之,第一反射層15B設置於鄰近下表面12s1的一部分的側壁12s3上,未設置於鄰近上表面12s2的另一部分的側壁12s3上。因此,藉由上述的第一反射層15B的配置,其設置於遠離出光面14s2部分的遮光層12的側壁12s3上,環境光源(例如室內燈光或戶外太陽光等)不會直接照射到第一反射層15B,因而可以避免反光的情況。Please refer to FIG. 4A and FIG. 4B. 4A is a schematic partial plan view of an optical sheet according to a third embodiment of the present invention. FIG. 4B is a schematic cross-sectional view of the optical sheet shown along a line C-C in FIG. 4A. As shown in FIGS. 4A and 4B, unlike the first embodiment, in the optical sheet 10B of this embodiment, a first reflective layer 15B is disposed on a side wall 12 s 3 of a part of the light shielding layer 12. In detail, the first reflective layer 15B is disposed on the side wall 12s3 adjacent to a portion of the lower surface 12s1, and is not disposed on the side wall 12s3 adjacent to another portion of the upper surface 12s2. Therefore, with the above-mentioned configuration of the first reflective layer 15B, which is disposed on the side wall 12s3 of the light-shielding layer 12 away from the light-emitting surface 14s2 portion, the ambient light source (such as indoor light or outdoor sunlight, etc.) will not directly shine on the first The reflective layer 15B can prevent reflections.
請參考圖5。圖5繪示本發明之第四實施例的光學片的剖面示意圖。如圖5所示,不同於第三實施例,在本實施例的光學片10C中,散射層13C是設置於彩色濾光結構14與基底層11之間以及遮光層12與基底層11之間。在一示範例中,基底層11具有位於相反側的上表面11s2與下表面11s1,散射層13C可覆蓋於基底層11鄰近彩色濾光結構14與遮光層12的整個表面,亦即全面覆蓋於基底層11的上表面11s2。藉此,可透過一次性地將散射層13C製作於基底層11上,進而能適度地簡化散射層13的製作工序。Please refer to Figure 5. FIG. 5 is a schematic cross-sectional view of an optical sheet according to a fourth embodiment of the present invention. As shown in FIG. 5, unlike the third embodiment, in the optical sheet 10C of this embodiment, the scattering layer 13C is disposed between the color filter structure 14 and the base layer 11 and between the light shielding layer 12 and the base layer 11. . In an exemplary embodiment, the base layer 11 has an upper surface 11s2 and a lower surface 11s1 located on opposite sides, and the scattering layer 13C may cover the entire surface of the base layer 11 adjacent to the color filter structure 14 and the light-shielding layer 12, that is, the entire surface The upper surface 11s2 of the base layer 11. Thereby, the scattering layer 13C can be manufactured on the base layer 11 at one time, and the manufacturing process of the scattering layer 13 can be simplified appropriately.
請參考圖6。圖6繪示本發明之第五實施例的光學片的剖面示意圖。如圖6所示,不同於第一實施例,本實施例的光學片10D可更包括第二反射層16,並且第二反射層16位於遮光層12與基底層11之間。在本實施例中,第二反射層16連接第一反射層15D。Please refer to Figure 6. FIG. 6 is a schematic cross-sectional view of an optical sheet according to a fifth embodiment of the present invention. As shown in FIG. 6, unlike the first embodiment, the optical sheet 10D of this embodiment may further include a second reflective layer 16, and the second reflective layer 16 is located between the light shielding layer 12 and the base layer 11. In this embodiment, the second reflective layer 16 is connected to the first reflective layer 15D.
請參考圖7。圖7繪示本發明之第六實施例的光學片的剖面示意圖。如圖7所示,不同於第五實施例,在本實施例的光學片10E中, 散射層13E是設置於彩色濾光結構14與基底層11之間以及遮光層12與基底層11之間,散射層13E可透過一次性地工藝製作於基底層11上,進而能適度地簡化散射層13E的製作工序。Please refer to Figure 7. FIG. 7 is a schematic cross-sectional view of an optical sheet according to a sixth embodiment of the present invention. As shown in FIG. 7, unlike the fifth embodiment, in the optical sheet 10E of this embodiment, the scattering layer 13E is disposed between the color filter structure 14 and the base layer 11 and between the light shielding layer 12 and the base layer 11. The scattering layer 13E can be manufactured on the base layer 11 through a one-time process, so that the manufacturing process of the scattering layer 13E can be appropriately simplified.
請參考圖8。圖8繪示本發明之第七實施例的光學片的剖面示意圖。如圖8所示,不同於第五實施例,在本實施例的光學片10F中,第一反射層15F設置於部分的遮光層12的側壁12s3上。第一反射層15F設置於鄰近下表面12s1的一部分的側壁12s3上,未設置於鄰近上表面12s2的另一部分的側壁12s3上。藉此,環境光源不會直接照射到第一反射層15F,因而可以避免反光的情況。Please refer to Figure 8. FIG. 8 is a schematic cross-sectional view of an optical sheet according to a seventh embodiment of the present invention. As shown in FIG. 8, unlike the fifth embodiment, in the optical sheet 10F of this embodiment, a first reflective layer 15F is disposed on a side wall 12 s 3 of a part of the light shielding layer 12. The first reflective layer 15F is disposed on the side wall 12s3 adjacent to a portion of the lower surface 12s1, and is not disposed on the side wall 12s3 adjacent to another portion of the upper surface 12s2. Thereby, the ambient light source does not directly irradiate the first reflective layer 15F, and thus the situation of light reflection can be avoided.
請參考圖9。圖9繪示本發明之第八實施例的光學片的剖面示意圖。如圖9所示,不同於第七實施例,在本實施例的光學片10G中,散射層13G是設置於彩色濾光結構14與基底層11之間以及遮光層12與基底層11之間,散射層13G可透過一次性地工藝製作於基底層11上,進而能適度地簡化散射層13G的製作工序。Please refer to Figure 9. FIG. 9 is a schematic cross-sectional view of an optical sheet according to an eighth embodiment of the present invention. As shown in FIG. 9, unlike the seventh embodiment, in the optical sheet 10G of this embodiment, the scattering layer 13G is disposed between the color filter structure 14 and the base layer 11 and between the light shielding layer 12 and the base layer 11. The scattering layer 13G can be manufactured on the base layer 11 through a one-time process, which can further simplify the manufacturing process of the scattering layer 13G.
請繼續參閱圖6至圖9。在此些實施例中,當光線從基底層11照射向遮光層12時,光線會從第二反射層16反射回基底層11而不會被遮光層12吸收,並且反射的光線能被位於基底層11相對遮光層12的另一側的反射面(如,背光模組中的反射表面或基底層11相對遮光層12的另一側表面)再度反射,藉以增加光線入射彩色濾光結構14的機會,並進一步提升背光源的利用率,進而增加顯示面板100的光轉換效率。Please continue to refer to FIGS. 6 to 9. In these embodiments, when light is irradiated from the base layer 11 to the light shielding layer 12, the light is reflected from the second reflective layer 16 back to the base layer 11 without being absorbed by the light shielding layer 12, and the reflected light can be located on the substrate The reflective surface of layer 11 opposite to the light-shielding layer 12 (eg, the reflective surface in the backlight module or the surface of the base layer 11 opposite to the light-shielding layer 12) is reflected again, thereby increasing the incidence of light incident on the color filter structure 14. Opportunities, and further improve the utilization of the backlight source, thereby increasing the light conversion efficiency of the display panel 100.
此外,當散射層13E、13G設置於遮光層12與基底層11之間時,第二反射層16可以是位於散射層13E、13G上,即位在遮光層12與散射層13E、13G之間。In addition, when the scattering layers 13E and 13G are disposed between the light shielding layer 12 and the base layer 11, the second reflective layer 16 may be located on the scattering layers 13E and 13G, that is, between the light shielding layer 12 and the scattering layers 13E and 13G.
請參考圖10。圖10繪示本發明之第九實施例的光學片的剖面示意圖。如圖10所示,不同於第五實施例,本實施例的光學片10H可更包括第三反射層17。在本實施例中,遮光層12的下表面12s1上設置有第二反射層16,而第三反射層17與第二反射層16分別設置於基底層11的相對兩側。並且在基底層11的垂直投影方向z上,第三反射層17與遮光層12重疊,但不與彩色濾光結構14重疊。Please refer to Figure 10. FIG. 10 is a schematic cross-sectional view of an optical sheet according to a ninth embodiment of the present invention. As shown in FIG. 10, unlike the fifth embodiment, the optical sheet 10H of this embodiment may further include a third reflective layer 17. In this embodiment, a second reflective layer 16 is disposed on the lower surface 12s1 of the light shielding layer 12, and the third reflective layer 17 and the second reflective layer 16 are disposed on opposite sides of the base layer 11, respectively. In the vertical projection direction z of the base layer 11, the third reflective layer 17 overlaps the light-shielding layer 12, but does not overlap the color filter structure 14.
如圖10所示,在本實施例中,當散射層13H設置於彩色濾光結構14與基底層11之間而未設置在遮光層12與基底層11之間時,第三反射層17面向第二反射層16的表面為粗糙表面171。換而言之,當遮光層12下方無散射層13H時,第三反射層17鄰近第二反射層16的表面經表面加工成粗糙表面171,可以使第二反射層16以180度反射的光線不再被第三反射層17以180度反射,而是提供第三反射層17反射的光線可以入射至彩色濾光結構14的機會。其中,第三反射層17可為一圖案化金屬層(如,銅或鋁)並且其表面經蝕刻處理成粗糙狀。As shown in FIG. 10, in this embodiment, when the scattering layer 13H is disposed between the color filter structure 14 and the base layer 11 and is not disposed between the light shielding layer 12 and the base layer 11, the third reflective layer 17 faces The surface of the second reflective layer 16 is a rough surface 171. In other words, when there is no scattering layer 13H under the light shielding layer 12, the surface of the third reflective layer 17 adjacent to the second reflective layer 16 is surface-processed into a rough surface 171, so that the second reflective layer 16 can reflect light at 180 degrees It is no longer reflected by the third reflective layer 17 at 180 degrees, but provides an opportunity for the light reflected by the third reflective layer 17 to be incident on the color filter structure 14. Wherein, the third reflective layer 17 may be a patterned metal layer (eg, copper or aluminum) and its surface is roughened by etching.
請參考圖11。圖11繪示本發明之第十實施例的光學片的剖面示意圖。如圖11所示,不同於第九實施例,在本實施例的光學片10I中,散射層13I設置於彩色濾光結構14與基底層11之間以及遮光層12與基底層11之間,而第三反射層17朝向第二反射層16的表面172可以是平滑的反射面。換而言之,當遮光層12下方有散射層13I時,第二反射層16反射的光線因經過散射層13I的散射而較不會直接以180度反射至第三反射層17側。因此第三反射層17朝向第二反射層16的表面172可為平滑表面。但不以此為限。於又一示範例中,當散射層13I設置於彩色濾光結構14與基底層11之間以及遮光層12與基底層11之間時,第三反射層17朝向第二反射層16的表面172亦可為粗糙的,藉以增加光線的反射角度,以增加反射的光線入射彩色濾光結構14的機會。Please refer to Figure 11. FIG. 11 is a schematic cross-sectional view of an optical sheet according to a tenth embodiment of the present invention. As shown in FIG. 11, unlike the ninth embodiment, in the optical sheet 10I of this embodiment, the scattering layer 13I is disposed between the color filter structure 14 and the base layer 11 and between the light shielding layer 12 and the base layer 11. The surface 172 of the third reflective layer 17 facing the second reflective layer 16 may be a smooth reflective surface. In other words, when there is a scattering layer 13I under the light-shielding layer 12, the light reflected by the second reflection layer 16 is less likely to be directly reflected to the third reflection layer 17 side by 180 degrees because it is scattered by the scattering layer 13I. Therefore, the surface 172 of the third reflective layer 17 facing the second reflective layer 16 may be a smooth surface. But not limited to this. In another exemplary embodiment, when the scattering layer 13I is disposed between the color filter structure 14 and the base layer 11 and between the light shielding layer 12 and the base layer 11, the third reflective layer 17 faces the surface 172 of the second reflective layer 16. It can also be rough, so as to increase the reflection angle of the light to increase the chance of the reflected light entering the color filter structure 14.
請參考圖12。圖12繪示本發明之第十一實施例的光學片的剖面示意圖。如圖12所示,不同於第九實施例,在本實施例的光學片10J中,第一反射層15J設置於部分的遮光層12的側壁12s3上,藉此,環境光源不會直接照射到第一反射層15J,因而可以避免反光的情況。Please refer to Figure 12. FIG. 12 is a schematic cross-sectional view of an optical sheet according to an eleventh embodiment of the present invention. As shown in FIG. 12, unlike the ninth embodiment, in the optical sheet 10J of the present embodiment, the first reflective layer 15J is disposed on a side wall 12s 3 of a part of the light shielding layer 12, whereby the ambient light source is not directly irradiated The first reflective layer 15J can avoid reflections.
請參考圖13。圖13繪示本發明之第十二實施例的光學片的剖面示意圖。如圖13所示,不同於第十實施例,在本實施例的光學片10K中,第一反射層15K設置於部分的遮光層12的側壁12s3上,藉此,環境光源不會直接照射到第一反射層15K,因而可以避免反光的情況。Please refer to Figure 13. 13 is a schematic cross-sectional view of an optical sheet according to a twelfth embodiment of the present invention. As shown in FIG. 13, unlike the tenth embodiment, in the optical sheet 10K of this embodiment, the first reflective layer 15K is disposed on the side wall 12s3 of a part of the light-shielding layer 12, so that the ambient light source does not directly shine on The first reflective layer 15K can avoid reflections.
於一些實施例中,前述之散射層13、13A-13K可具有複數散射粒子,並且此些散射粒子可以為單一層分布或多層分布。於一些實施例中,此些散射粒子可以是利用自組裝方式組裝於基底層11上,亦可以是利用表面結構改質方式(例如沉積、蝕刻、鍍膜及/或光罩步驟等)直接對基底層11的表面(或基底層11表面的鍍膜上)加工而形成,但在此並不限制其製作方式。於一些實施例中,散射粒子的材料可為無機粒子或高分子材料。其中,無機粒子可例如二氧化鈦、氧化鋅等,但不限於此。於一些實施例中,散射粒子可為圓形、圓弧狀、錐狀、稜狀或其他幾何/非幾何構形。此外,散射粒子的粒徑可介於20 nm至200nm之間。In some embodiments, the aforementioned scattering layers 13, 13A-13K may have a plurality of scattering particles, and these scattering particles may be distributed in a single layer or a plurality of layers. In some embodiments, the scattering particles can be assembled on the base layer 11 by a self-assembly method, or can be directly applied to the substrate by a surface structure modification method (such as deposition, etching, coating, and / or photomask steps, etc.). The surface of the layer 11 (or the plating film on the surface of the base layer 11) is formed by processing, but the manufacturing method is not limited here. In some embodiments, the material of the scattering particles may be inorganic particles or polymer materials. Among them, the inorganic particles may be, for example, titanium dioxide, zinc oxide, and the like, but are not limited thereto. In some embodiments, the scattering particles can be circular, arc-shaped, cone-shaped, prismatic, or other geometric / non-geometric configurations. In addition, the particle diameter of the scattering particles may be between 20 nm and 200 nm.
於一些實施例中,前述之基底層11係透光之絕緣材質。其中,光線對於基底層11的穿透率可約為60至99%,較佳為80至99%。在一些實施例中,基底層11的材質可為聚甲基丙烯酸甲酯(Poly(methyl methacrylate),PMMA)、環氧樹脂、聚對苯二甲酸乙酯(Polyethylene terephthalate,PET)、以及聚氯乙烯(Poly Vinyl Chloride,PVC)其中至少一種,但不以此為限。In some embodiments, the aforementioned base layer 11 is a transparent insulating material. The transmittance of light to the base layer 11 may be about 60 to 99%, preferably 80 to 99%. In some embodiments, the material of the base layer 11 may be polymethyl methacrylate (PMMA), epoxy resin, polyethylene terephthalate (PET), and polyvinyl chloride. Polyethylene (Poly Vinyl Chloride, PVC) at least one, but not limited to this.
在一些實施例中,前述之遮光層12可為光阻材料,例如黑色光阻等,但不以此為限。於一些實施例中,俯視下,開口121的形狀可以是矩形,但不以此為限。於一些實施例中,開口121是以矩陣形式配置,但不以此為限。In some embodiments, the aforementioned light-shielding layer 12 may be a photoresist material, such as a black photoresist, but is not limited thereto. In some embodiments, the shape of the opening 121 may be rectangular in a plan view, but is not limited thereto. In some embodiments, the openings 121 are configured in a matrix form, but not limited thereto.
在一些實施例中,前述之量子點142可為由硒化鋅(ZnSe)、硫化鎘(CdS)、硒化鎘(CdSe)、硫化鋅(ZnS)等化合物所組成的單層或多層奈米半導體材料。並且,當量子點142為多層結構時,每一層可為相同材料,亦可為不同材料。舉例來說,以量子點142為內外雙層之結構為例,內層可為硒化鎘(CdSe),而外層則可為硫化鋅(ZnS)。另外,上述材料僅作為示例,不以此為限。另外,對於不同顏色的光轉換圖案141而言,其可以使用相同材料的量子點142,也可以使用不同材料的量子點142,不以此為限。In some embodiments, the aforementioned quantum dots 142 may be single-layered or multi-layered nanometers composed of compounds such as zinc selenide (ZnSe), cadmium sulfide (CdS), cadmium selenide (CdSe), and zinc sulfide (ZnS). semiconductors. In addition, when the quantum dot 142 has a multilayer structure, each layer may be the same material or different materials. For example, taking the structure of the quantum dot 142 as an inner and outer double layer as an example, the inner layer may be cadmium selenide (CdSe), and the outer layer may be zinc sulfide (ZnS). In addition, the above materials are merely examples, and are not limited thereto. In addition, for the light conversion patterns 141 of different colors, the quantum dots 142 of the same material may be used, or the quantum dots 142 of different materials may be used, which is not limited thereto.
於一些實施例中,前述之第二反射層16與第一反射層15、15A-15K可為相同材質,或為不同材質。In some embodiments, the aforementioned second reflective layer 16 and the first reflective layers 15 and 15A-15K may be made of the same material or different materials.
於一些實施例中,前述之第三反射層17可與第一反射層15、15A-15K及/或第二反射層16為相同材質,或為不同材質。In some embodiments, the aforementioned third reflective layer 17 may be the same material as the first reflective layer 15, 15A-15K and / or the second reflective layer 16, or may be a different material.
於一些實施例中,前述之光學片可應用於一顯示面板中。In some embodiments, the aforementioned optical sheet can be applied to a display panel.
請參考圖14與圖15。圖14繪示本發明之第一實施例的顯示面板的爆炸示意圖。圖15為圖14的顯示面板的剖面示意圖。如圖14與圖15所示,本實施例之顯示面板100包括第七實施例之光學片10F、第一基板20、第二基板30、顯示介質層40、複數條訊號線50、複數個主動元件60以及複數畫素電極70。其中,有關於光學片10F之諸等元件已於先前段落敘明,在此不再贅述,以下僅針對顯示面板100的其他元件及其與光學片10F之各元件的對應關係進行描述。另外,為了方便及清楚呈現本發明,剖面圖中並未繪示顯示面板的主動元件。Please refer to FIG. 14 and FIG. 15. FIG. 14 is an exploded view of a display panel according to the first embodiment of the present invention. FIG. 15 is a schematic cross-sectional view of the display panel of FIG. 14. As shown in FIG. 14 and FIG. 15, the display panel 100 of this embodiment includes an optical sheet 10F, a first substrate 20, a second substrate 30, a display medium layer 40, a plurality of signal lines 50, and a plurality of active devices of the seventh embodiment. Element 60 and a plurality of pixel electrodes 70. Among them, the components of the optical sheet 10F have been described in the previous paragraphs, and will not be repeated here. The following describes only the other components of the display panel 100 and their corresponding relationships with the components of the optical sheet 10F. In addition, for convenience and clarity of presenting the present invention, the active elements of the display panel are not shown in the cross-sectional view.
在本實施例中,第二基板30與第一基板20相對設置,而顯示介質層40是位於第一基板20與第二基板30之間。第一基板20與第二基板30可為硬質基板或可撓式基板例如玻璃基板、石英基板、藍寶石基板、塑膠基板或其它適合的基板。顯示介質層40可選用液晶層,但不以此為限,舉例而言,顯示介質層40也可包括其它非自發光顯示介質層例如電泳顯示介質層、或其它合適的非自發光顯示介質層例如有機電激發光顯示介質層。In this embodiment, the second substrate 30 is disposed opposite to the first substrate 20, and the display medium layer 40 is located between the first substrate 20 and the second substrate 30. The first substrate 20 and the second substrate 30 may be rigid substrates or flexible substrates such as glass substrates, quartz substrates, sapphire substrates, plastic substrates, or other suitable substrates. The display medium layer 40 may be a liquid crystal layer, but is not limited thereto. For example, the display medium layer 40 may also include other non-self-luminous display medium layers such as electrophoretic display medium layers, or other suitable non-self-luminous display medium layers For example, an organic electroluminescent display medium layer.
訊號線50與主動元件60位於第一基板20之上,並且主動元件60與訊號線50電性連接。在第一基板20的垂直投影方向z上,遮光層12至少與部分的訊號線50重疊。畫素電極70與開口121對應設置,並且分別與對應的主動元件60電性連接。The signal line 50 and the active device 60 are located on the first substrate 20, and the active device 60 is electrically connected to the signal line 50. In the vertical projection direction z of the first substrate 20, the light shielding layer 12 overlaps at least part of the signal lines 50. The pixel electrode 70 is disposed corresponding to the opening 121 and is electrically connected to the corresponding active device 60 respectively.
訊號線50可包括間隔配置的複數條資料線與間隔配置的複數條掃描線。在第一基板20的垂直投影方向z上,資料線與掃描線交錯以定義複數個畫素區域。畫素電極70分別設置於對應的畫素區域中。The signal line 50 may include a plurality of data lines arranged at intervals and a plurality of scan lines arranged at intervals. In the vertical projection direction z of the first substrate 20, the data lines and the scanning lines are staggered to define a plurality of pixel regions. The pixel electrodes 70 are respectively disposed in corresponding pixel regions.
在本實施例中,光學片10F可設置在顯示面板100的第二基板30(即對向基板)上。換言之,以顯示介質層40為界,第二基板30、遮光層12、彩色濾光結構14、第一反射層15F、第二反射層16、散射層13F與基底層11位於顯示介質層40的上方(顯示面板100的上部),而畫素電極70、訊號線50、主動元件60與第一基板20位於顯示介質層40的下方(顯示面板100的下部)。更詳而言之,基底層11設置於第二基板30與顯示介質層40之間。彩色濾光結構14設置於基底層11與第二基板30之間,並且顯示介質層40位於畫素電極70與光轉換圖案141之間。其中,散射層13F設置於彩色濾光結構14的入光面14s1,而彩色濾光結構14的出光面14s2位於第二基板30與彩色濾光結構14之間。In this embodiment, the optical sheet 10F may be disposed on the second substrate 30 (that is, the opposite substrate) of the display panel 100. In other words, with the display medium layer 40 as a boundary, the second substrate 30, the light shielding layer 12, the color filter structure 14, the first reflective layer 15F, the second reflective layer 16, the scattering layer 13F, and the base layer 11 are located on the display medium layer 40. The pixel electrode 70, the signal line 50, the active device 60, and the first substrate 20 are located below the display medium layer 40 (the lower portion of the display panel 100). More specifically, the base layer 11 is disposed between the second substrate 30 and the display medium layer 40. The color filter structure 14 is disposed between the base layer 11 and the second substrate 30, and the display medium layer 40 is located between the pixel electrode 70 and the light conversion pattern 141. The scattering layer 13F is disposed on the light incident surface 14s1 of the color filter structure 14, and the light exit surface 14s2 of the color filter structure 14 is located between the second substrate 30 and the color filter structure 14.
本發明的顯示面板並不以上述實施例為限。下文將依序介紹本發明的其它較佳實施例的顯示面板,且為了便於比較各實施例之相異處並簡化說明,在下文之各實施例中使用相同或近似的標號來表示相同或近似的元件,且主要針對各實施例之相異處進行說明,而不再對重覆部分進行贅述。The display panel of the present invention is not limited to the above embodiments. The following will sequentially introduce display panels of other preferred embodiments of the present invention, and in order to facilitate the comparison of the differences between the embodiments and simplify the description, the same or similar reference numerals are used in the following embodiments to indicate the same or similar Components, and mainly describe the differences between the embodiments, and will not repeat the repeated parts.
請參考圖16。圖16繪示本發明之第二實施例的顯示面板的剖面示意圖。如圖16所示,不同於第一實施例之顯示面板100,本實施例之顯示面板100A包括第八實施例之光學片10G。換言之,在本實施例,散射層13G是設置於彩色濾光結構14與基底層11之間以及遮光層12與基底層11之間。Please refer to Figure 16. 16 is a schematic cross-sectional view of a display panel according to a second embodiment of the present invention. As shown in FIG. 16, unlike the display panel 100 of the first embodiment, the display panel 100A of this embodiment includes an optical sheet 10G of the eighth embodiment. In other words, in this embodiment, the scattering layer 13G is disposed between the color filter structure 14 and the base layer 11 and between the light shielding layer 12 and the base layer 11.
請參考圖17。圖17繪示本發明之第三實施例的顯示面板的剖面示意圖。如圖17所示,不同於第一實施例之顯示面板100,本實施例之顯示面板100B包括第十一實施例之光學片10J。在本實施例中,光學片10J具有第三反射層17,第三反射層17設置在第一基板20(即陣列基板)上,而光學片10J的其他元件則設置在第二基板30(即對向基板)上。第三反射層17對應設置在訊號線50上。在第一基板20的垂直投影方向z上,第三反射層17與訊號線50重疊。此外,遮光層12的下表面12s1與基底層11之間未設置散射層13J,而第三反射層17面向遮光層12的表面為粗糙表面171。Please refer to Figure 17. 17 is a schematic cross-sectional view of a display panel according to a third embodiment of the present invention. As shown in FIG. 17, unlike the display panel 100 of the first embodiment, the display panel 100B of this embodiment includes an optical sheet 10J of the eleventh embodiment. In this embodiment, the optical sheet 10J has a third reflective layer 17, and the third reflective layer 17 is disposed on the first substrate 20 (ie, the array substrate), and other elements of the optical sheet 10J are disposed on the second substrate 30 (ie Opposite substrate). The third reflective layer 17 is correspondingly disposed on the signal line 50. In the vertical projection direction z of the first substrate 20, the third reflective layer 17 overlaps the signal line 50. In addition, the scattering layer 13J is not provided between the lower surface 12s1 of the light shielding layer 12 and the base layer 11, and the surface of the third reflective layer 17 facing the light shielding layer 12 is a rough surface 171.
請參考圖18。圖18繪示本發明之第四實施例的顯示面板的剖面示意圖。如圖18所示,不同於第一實施例之顯示面板100,本實施例之顯示面板100C包括第十二實施例之光學片10K。在本實施例,光學片10K具有第三反射層17,第三反射層17設置在第一基板20(即陣列基板)上,而光學片10K的其他元件則設置在第二基板30(即對向基板)上。第三反射層17對應設置在訊號線50上。在第一基板20的垂直投影方向z上,第三反射層17與訊號線50重疊。此外,遮光層12的下表面12s1與基底層11之間設置有散射層13K,而第三反射層17面向遮光層12的表面為平滑表面172(如圖18所示),但並不以此為限,其亦可為粗糙表面。Please refer to Figure 18. 18 is a schematic cross-sectional view of a display panel according to a fourth embodiment of the present invention. As shown in FIG. 18, unlike the display panel 100 of the first embodiment, the display panel 100C of this embodiment includes the optical sheet 10K of the twelfth embodiment. In this embodiment, the optical sheet 10K has a third reflective layer 17, and the third reflective layer 17 is disposed on the first substrate 20 (that is, the array substrate), and other elements of the optical sheet 10K are disposed on the second substrate 30 (that is, To the substrate). The third reflective layer 17 is correspondingly disposed on the signal line 50. In the vertical projection direction z of the first substrate 20, the third reflective layer 17 overlaps the signal line 50. In addition, a scattering layer 13K is provided between the lower surface 12s1 of the light shielding layer 12 and the base layer 11, and the surface of the third reflective layer 17 facing the light shielding layer 12 is a smooth surface 172 (as shown in FIG. 18), but this is not the case. As a limitation, it can also be a rough surface.
於一些實施例中,第一基板20與訊號線50上可覆蓋一絕緣層92a。畫素電極70和第三反射層17位於絕緣層92a上。換言之,絕緣層92a位於第一基板20以及畫素電極70和第三反射層17之間。In some embodiments, the first substrate 20 and the signal line 50 may be covered with an insulating layer 92a. The pixel electrode 70 and the third reflective layer 17 are located on the insulating layer 92a. In other words, the insulating layer 92 a is located between the first substrate 20 and the pixel electrode 70 and the third reflective layer 17.
於一些實施例中,顯示面板100、100A、100B以及100C可更包括共通電極85,並且共通電極85設置在基底層11與顯示介質層40之間。此外,共通電極85與基底層11之間可更具有一層或多層其他膜層,例如用以設置共通電極85之第三基板91等。In some embodiments, the display panels 100, 100A, 100B, and 100C may further include a common electrode 85, and the common electrode 85 is disposed between the base layer 11 and the display medium layer 40. In addition, there may be one or more other film layers between the common electrode 85 and the base layer 11, such as a third substrate 91 for providing the common electrode 85 and the like.
於一些實施例中,背光模組80可設置在第一基板20相對顯示介質層40的另一側,並且背光模組80作為顯示面板100的光源而朝第一基板20發出光線。In some embodiments, the backlight module 80 may be disposed on the other side of the first substrate 20 opposite to the display medium layer 40, and the backlight module 80 serves as a light source of the display panel 100 and emits light toward the first substrate 20.
於一些實施例中,顯示面板100、100A、100B以及100C可更包括一個或多個偏光片90a、90b。其中,偏光片90a、90b可設置在第一基板20上及/或在第二基板30上。於偏光片90a設置在第二基板30上時,偏光片90a位在基底層11與第三基板91之間。於偏光片90b設置在第一基板20上,偏光片90b位於第一基板20相對於顯示介質層40的另一側表面上,即位於第一基板20與背光模組80之間。In some embodiments, the display panels 100, 100A, 100B, and 100C may further include one or more polarizers 90a, 90b. The polarizers 90 a and 90 b may be disposed on the first substrate 20 and / or on the second substrate 30. When the polarizer 90 a is disposed on the second substrate 30, the polarizer 90 a is located between the base layer 11 and the third substrate 91. The polarizer 90 b is disposed on the first substrate 20. The polarizer 90 b is located on the other surface of the first substrate 20 relative to the display medium layer 40, that is, between the first substrate 20 and the backlight module 80.
請參考圖19。圖19繪示本發明之第五實施例的顯示面板的剖面示意圖。如圖19所示,不同於第一實施例之顯示面板100,本實施例之顯示面板100D包括第四實施例之光學片10C,而光學片10C可設置在顯示面板100D的第一基板20(即陣列基板)上。換言之,以顯示介質層40為界,第二基板30位於顯示面板100D之上部,而畫素電極70、遮光層12、彩色濾光結構14、第一反射層15C、散射層13C、基底層11、訊號線50、主動元件60與第一基板20位於顯示面板100D之下部。基底層11可為覆蓋在第一基板20與訊號線50上的絕緣層。彩色濾光結構14設置於基底層11相對於第一基板20的另一側,並且畫素電極70位於顯示介質層40與光轉換圖案141之間。彩色濾光結構14的入光面14s1位於鄰近第一基板20的一側,而彩色濾光結構14的出光面14s2位於遠離第一基板20(鄰近畫素電極70)的一側。散射層13C則設置在彩色濾光結構14的入光面14s1上。於一示範例中,畫素電極70與光轉換圖案141之間可以絕緣層92b間隔。換言之,絕緣層92b覆蓋在光學片10C(遮光層12與彩色濾光結構14)上。Please refer to Figure 19. 19 is a schematic cross-sectional view of a display panel according to a fifth embodiment of the present invention. As shown in FIG. 19, unlike the display panel 100 of the first embodiment, the display panel 100D of this embodiment includes the optical sheet 10C of the fourth embodiment, and the optical sheet 10C may be disposed on the first substrate 20 of the display panel 100D ( Ie array substrate). In other words, with the display medium layer 40 as a boundary, the second substrate 30 is located above the display panel 100D, and the pixel electrode 70, the light shielding layer 12, the color filter structure 14, the first reflective layer 15C, the scattering layer 13C, and the base layer 11 The signal line 50, the active device 60 and the first substrate 20 are located below the display panel 100D. The base layer 11 may be an insulating layer covering the first substrate 20 and the signal line 50. The color filter structure 14 is disposed on the other side of the base layer 11 opposite to the first substrate 20, and the pixel electrode 70 is located between the display medium layer 40 and the light conversion pattern 141. The light incident surface 14s1 of the color filter structure 14 is located on a side adjacent to the first substrate 20, and the light emitting surface 14s2 of the color filter structure 14 is located on a side remote from the first substrate 20 (adjacent to the pixel electrode 70). The scattering layer 13C is disposed on the light incident surface 14s1 of the color filter structure 14. In an exemplary embodiment, the pixel electrode 70 and the light conversion pattern 141 may be separated by an insulating layer 92b. In other words, the insulating layer 92b covers the optical sheet 10C (the light shielding layer 12 and the color filter structure 14).
請參考圖20。圖20繪示本發明之第六實施例的顯示面板的剖面示意圖。如圖20所示,不同於第五實施例之顯示面板100D,本實施例之顯示面板100E包括第十一實施例之光學片10J。也就是說,在本實施例,光學片10J具有第二反射層16,並且第二反射層16位於遮光層12與基底層11之間。第二反射層16連接第一反射層15J。另外,光學片10具有第三反射層17,而第三反射層17設置於第二反射層16與對應的訊號線50之間。並且,基底層11覆蓋在第一基板20與第三反射層17上。基底層11間隔第二反射層16與第三反射層17。於一示範例中,第三反射層17可直接形成在訊號線50的上表面(即訊號線50面向第二反射層16的表面)上。此外,遮光層12的下表面12s1與基底層11之間未設置散射層13J,而第三反射層17面向遮光層12的表面為粗糙表面171。Please refer to Figure 20. 20 is a schematic cross-sectional view of a display panel according to a sixth embodiment of the present invention. As shown in FIG. 20, unlike the display panel 100D of the fifth embodiment, the display panel 100E of this embodiment includes an optical sheet 10J of the eleventh embodiment. That is, in this embodiment, the optical sheet 10J has the second reflective layer 16, and the second reflective layer 16 is located between the light shielding layer 12 and the base layer 11. The second reflective layer 16 is connected to the first reflective layer 15J. In addition, the optical sheet 10 has a third reflective layer 17, and the third reflective layer 17 is disposed between the second reflective layer 16 and the corresponding signal line 50. The base layer 11 covers the first substrate 20 and the third reflective layer 17. The base layer 11 is spaced from the second reflective layer 16 and the third reflective layer 17. In an exemplary embodiment, the third reflective layer 17 may be directly formed on the upper surface of the signal line 50 (that is, the surface of the signal line 50 facing the second reflective layer 16). In addition, the scattering layer 13J is not provided between the lower surface 12s1 of the light shielding layer 12 and the base layer 11, and the surface of the third reflective layer 17 facing the light shielding layer 12 is a rough surface 171.
請參考圖21。圖21繪示本發明之第七實施例的顯示面板的剖面示意圖。如圖21所示,不同於第五實施例之顯示面板100D,本實施例之顯示面板100F包括第十二實施例之光學片10K。也就是說,在本實施例,光學片10K具有第二反射層16,並且第二反射層16位於遮光層12與基底層11之間。第二反射層16連接第一反射層15K。另外,光學片10K具有第三反射層17,而第三反射層17設置於第二反射層16與對應的訊號線50之間。並且,基底層11覆蓋在第一基板20與第三反射層17上。基底層11間隔第二反射層16與第三反射層17。於一示範例中,第三反射層17可直接形成在訊號線50的上表面(面向第二反射層16的表面)上。此外,遮光層12的下表面12s1與基底層11之間設置有散射層13K,而第三反射層17面向遮光層12的表面為平滑表面172(如圖21所示),但並不以此為限,其亦可為粗糙表面。Please refer to Figure 21. 21 is a schematic cross-sectional view of a display panel according to a seventh embodiment of the present invention. As shown in FIG. 21, unlike the display panel 100D of the fifth embodiment, the display panel 100F of this embodiment includes the optical sheet 10K of the twelfth embodiment. That is, in this embodiment, the optical sheet 10K has the second reflective layer 16, and the second reflective layer 16 is located between the light shielding layer 12 and the base layer 11. The second reflective layer 16 is connected to the first reflective layer 15K. In addition, the optical sheet 10K has a third reflective layer 17, and the third reflective layer 17 is disposed between the second reflective layer 16 and the corresponding signal line 50. The base layer 11 covers the first substrate 20 and the third reflective layer 17. The base layer 11 is spaced from the second reflective layer 16 and the third reflective layer 17. In an exemplary embodiment, the third reflective layer 17 may be directly formed on the upper surface of the signal line 50 (the surface facing the second reflective layer 16). In addition, a scattering layer 13K is provided between the lower surface 12s1 of the light shielding layer 12 and the base layer 11, and the surface of the third reflective layer 17 facing the light shielding layer 12 is a smooth surface 172 (as shown in FIG. 21), but this is not the case. As a limitation, it can also be a rough surface.
於一些實施例中,顯示面板100D、100E以及100F可更包括共通電極85,並且共通電極85設置在第二基板30與顯示介質層40之間。In some embodiments, the display panels 100D, 100E, and 100F may further include a common electrode 85, and the common electrode 85 is disposed between the second substrate 30 and the display medium layer 40.
於一些實施例中,背光模組80可設置在第一基板20相對顯示介質層40的另一側,並且背光模組80作為顯示面板100、100A~100F的光源而朝第一基板20發出光線。In some embodiments, the backlight module 80 may be disposed on the other side of the first substrate 20 opposite to the display medium layer 40, and the backlight module 80 serves as a light source of the display panels 100 and 100A to 100F to emit light toward the first substrate 20. .
於一些實施例中,顯示面板100D、100E以及100F更可包含一個或多個偏光板90a、90b。其中,偏光板90a、90b設置於第一基板20之上及/或第二基板30之上。於偏光片90a設置在第二基板30上時,偏光片90a位在第二基板30相對顯示介質層40的另一側表面上。其中,偏光片90a、第二基板30與共通電極85可依序疊合,且共通電極85鄰近於顯示介質層40。於偏光片90b設置在第一基板20上,偏光片90b位於第一基板20相對於基底層11的另一側表面上,即位於第一基板20與背光模組80之間。In some embodiments, the display panels 100D, 100E, and 100F may further include one or more polarizing plates 90a, 90b. The polarizing plates 90 a and 90 b are disposed on the first substrate 20 and / or on the second substrate 30. When the polarizer 90 a is disposed on the second substrate 30, the polarizer 90 a is located on the other surface of the second substrate 30 opposite to the display medium layer 40. The polarizer 90 a, the second substrate 30, and the common electrode 85 may be sequentially stacked, and the common electrode 85 is adjacent to the display medium layer 40. The polarizer 90 b is disposed on the first substrate 20. The polarizer 90 b is located on the other surface of the first substrate 20 relative to the base layer 11, that is, between the first substrate 20 and the backlight module 80.
應注意的是,雖然圖14至圖21所示之顯示面板100、100A~100F是以前述的部分實施例的光學片10C、 10F、10G、10J、10K的示意,但本發明不限於此,其他實施例的光學片10、10A、10B、10D、10E、10H、10I的亦可應用。It should be noted that although the display panels 100 and 100A to 100F shown in FIGS. 14 to 21 are schematic diagrams of the optical sheets 10C, 10F, 10G, 10J, and 10K of the foregoing partial embodiments, the present invention is not limited thereto. The optical sheets 10, 10A, 10B, 10D, 10E, 10H, and 10I of other embodiments can also be applied.
綜上,根據本發明的顯示面板及其使用之光學片,其透過入光面的散射層及彩色濾光結構與遮光層之間的反射層使光線在彩色濾光結構中有較長的光徑,藉以提升量子點受激發的機率,進而提升顯示面板的光轉換效率。於一些實施例中,散射層係形成於基底層的表面上,藉此還可以適度地簡化製作工序。於一些實施例中,彩色濾光結構與遮光層之間的反射層未設置到鄰近出光面的部份,藉以避免造成環境光源的反射而致使顯示面板出現反光的現象。In summary, according to the display panel of the present invention and the optical sheet used by the display panel, the light-transmitting scattering layer and the reflective layer between the color filter structure and the light-shielding layer allow light to have a longer light in the color filter structure. Path to increase the probability of quantum dots being excited, thereby improving the light conversion efficiency of the display panel. In some embodiments, the scattering layer is formed on the surface of the base layer, so that the manufacturing process can be appropriately simplified. In some embodiments, the reflective layer between the color filter structure and the light-shielding layer is not disposed on a portion adjacent to the light-emitting surface, so as to avoid reflection of the display panel due to reflection of ambient light sources.
100、100A-100F‧‧‧顯示面板 100, 100A-100F‧‧‧ display panel
10、10A-10K‧‧‧光學片 10, 10A-10K‧‧‧Optical sheet
11‧‧‧基底層 11‧‧‧ basal layer
11s1‧‧‧下表面 11s1‧‧‧ lower surface
11s2‧‧‧上表面 11s2‧‧‧upper surface
12‧‧‧遮光層 12‧‧‧ shading layer
121‧‧‧開口 121‧‧‧ opening
12s1‧‧‧下表面 12s1‧‧‧ lower surface
12s2‧‧‧上表面 12s2‧‧‧upper surface
12s3‧‧‧側壁 12s3‧‧‧ sidewall
13、13A-13K‧‧‧散射層 13, 13A-13K‧‧‧Scattering layer
14‧‧‧彩色濾光結構 14‧‧‧color filter structure
141‧‧‧光轉換圖案 141‧‧‧light conversion pattern
142‧‧‧量子點 142‧‧‧ Quantum Dots
14s1‧‧‧入光面 14s1‧‧‧Incoming surface
14s2‧‧‧出光面 14s2‧‧‧ smooth surface
15、15A-15K‧‧‧第一反射層 15, 15A-15K‧‧‧First reflective layer
16‧‧‧第二反射層 16‧‧‧Second reflective layer
17‧‧‧第三反射層 17‧‧‧ third reflective layer
171‧‧‧粗糙表面 171‧‧‧ rough surface
172‧‧‧表面 172‧‧‧ surface
20‧‧‧第一基板 20‧‧‧ the first substrate
30‧‧‧第二基板 30‧‧‧second substrate
40‧‧‧顯示介質層 40‧‧‧Display media layer
50‧‧‧訊號線 50‧‧‧ signal line
60‧‧‧主動元件 60‧‧‧Active components
70‧‧‧畫素電極 70‧‧‧pixel electrode
80‧‧‧背光模組 80‧‧‧ backlight module
85‧‧‧共通電極 85‧‧‧Common electrode
90a‧‧‧偏光片 90a‧‧‧Polarizer
90b‧‧‧偏光片 90b‧‧‧Polarizer
91‧‧‧第三基板 91‧‧‧ Third substrate
92a‧‧‧絕緣層 92a‧‧‧ Insulation
92b‧‧‧絕緣層 92b‧‧‧ insulation
L‧‧‧光線 L‧‧‧light
圖1A繪示本發明之第一實施例的光學片的局部俯視示意圖。 圖1B為沿圖1A中A-A剖線所繪示的光學片的剖面示意圖。 圖2繪示本發明之第一實施例的光學片受光照射時的局部剖面示意圖。 圖3A繪示本發明之第二實施例的光學片的局部俯視示意圖。 圖3B為沿圖3A中B-B剖線所繪示的光學片的剖面示意圖。 圖4A繪示本發明之第三實施例的光學片的局部俯視示意圖。 圖4B為沿圖4A中C-C剖線所繪示的光學片的剖面示意圖。 圖5繪示本發明之第四實施例的光學片的剖面示意圖。 圖6繪示本發明之第五實施例的光學片的剖面示意圖。 圖7繪示本發明之第六實施例的光學片的剖面示意圖。 圖8繪示本發明之第七實施例的光學片的剖面示意圖。 圖9繪示本發明之第八實施例的光學片的剖面示意圖。 圖10繪示本發明之第九實施例的光學片的剖面示意圖。 圖11繪示本發明之第十實施例的光學片的剖面示意圖。 圖12繪示本發明之第十一實施例的光學片的剖面示意圖。 圖13繪示本發明之第十二實施例的光學片的剖面示意圖。 圖14繪示本發明之第一實施例的顯示面板的爆炸示意圖。 圖15為圖14的顯示面板的剖面示意圖。 圖16繪示本發明之第二實施例的顯示面板的剖面示意圖。 圖17繪示本發明之第三實施例的顯示面板的剖面示意圖。 圖18繪示本發明之第四實施例的顯示面板的剖面示意圖。 圖19繪示本發明之第五實施例的顯示面板的剖面示意圖。 圖20繪示本發明之第六實施例的顯示面板的剖面示意圖。 圖21繪示本發明之第七實施例的顯示面板的剖面示意圖。FIG. 1A is a schematic partial plan view of an optical sheet according to a first embodiment of the present invention. FIG. 1B is a schematic cross-sectional view of the optical sheet shown along a line A-A in FIG. 1A. FIG. 2 is a schematic partial cross-sectional view of the optical sheet according to the first embodiment of the present invention when irradiated with light. 3A is a schematic partial plan view of an optical sheet according to a second embodiment of the present invention. FIG. 3B is a schematic cross-sectional view of the optical sheet shown along a line B-B in FIG. 3A. 4A is a schematic partial plan view of an optical sheet according to a third embodiment of the present invention. FIG. 4B is a schematic cross-sectional view of the optical sheet shown along a line C-C in FIG. 4A. FIG. 5 is a schematic cross-sectional view of an optical sheet according to a fourth embodiment of the present invention. FIG. 6 is a schematic cross-sectional view of an optical sheet according to a fifth embodiment of the present invention. FIG. 7 is a schematic cross-sectional view of an optical sheet according to a sixth embodiment of the present invention. FIG. 8 is a schematic cross-sectional view of an optical sheet according to a seventh embodiment of the present invention. FIG. 9 is a schematic cross-sectional view of an optical sheet according to an eighth embodiment of the present invention. FIG. 10 is a schematic cross-sectional view of an optical sheet according to a ninth embodiment of the present invention. FIG. 11 is a schematic cross-sectional view of an optical sheet according to a tenth embodiment of the present invention. FIG. 12 is a schematic cross-sectional view of an optical sheet according to an eleventh embodiment of the present invention. 13 is a schematic cross-sectional view of an optical sheet according to a twelfth embodiment of the present invention. FIG. 14 is an exploded view of a display panel according to the first embodiment of the present invention. FIG. 15 is a schematic cross-sectional view of the display panel of FIG. 14. 16 is a schematic cross-sectional view of a display panel according to a second embodiment of the present invention. 17 is a schematic cross-sectional view of a display panel according to a third embodiment of the present invention. 18 is a schematic cross-sectional view of a display panel according to a fourth embodiment of the present invention. 19 is a schematic cross-sectional view of a display panel according to a fifth embodiment of the present invention. 20 is a schematic cross-sectional view of a display panel according to a sixth embodiment of the present invention. 21 is a schematic cross-sectional view of a display panel according to a seventh embodiment of the present invention.
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CN108873465B (en) | 2018-09-04 | 2022-07-01 | 京东方科技集团股份有限公司 | Quantum dot display substrate, manufacturing method thereof and display device |
CN109031767B (en) * | 2018-09-17 | 2023-06-30 | 京东方科技集团股份有限公司 | Color film substrate, display device and manufacturing method |
CN109387975B (en) * | 2018-10-30 | 2020-11-24 | 武汉华星光电技术有限公司 | Display panel and display device thereof |
CN111341928A (en) * | 2018-11-30 | 2020-06-26 | 昆山工研院新型平板显示技术中心有限公司 | Light emitting unit, display panel and display device |
CN109491136A (en) | 2019-01-16 | 2019-03-19 | 京东方科技集团股份有限公司 | A kind of filtering structure and preparation method thereof, display device |
CN109765728B (en) * | 2019-03-29 | 2022-06-03 | 京东方科技集团股份有限公司 | Quantum dot color film, preparation method thereof, display panel and display device |
CN110098242B (en) * | 2019-05-22 | 2021-10-08 | 京东方科技集团股份有限公司 | Color film layer, preparation method thereof and display panel |
CN110262114A (en) * | 2019-06-24 | 2019-09-20 | 京东方科技集团股份有限公司 | A kind of color membrane substrates, display panel and display device |
CN110797378B (en) * | 2019-10-28 | 2021-07-06 | 深圳市华星光电半导体显示技术有限公司 | Quantum dot color film substrate, manufacturing method and display panel |
CN110596950A (en) | 2019-10-29 | 2019-12-20 | 京东方科技集团股份有限公司 | Quantum dot color filter layer, manufacturing method thereof, display panel and device |
KR20210063647A (en) | 2019-11-25 | 2021-06-02 | 엘지디스플레이 주식회사 | Light conversion film, backlight unit and display device |
CN111048693A (en) * | 2019-12-06 | 2020-04-21 | 深圳市华星光电半导体显示技术有限公司 | Quantum dot color film substrate and manufacturing method thereof |
CN115718388B (en) * | 2022-12-07 | 2024-02-09 | 武汉华星光电技术有限公司 | Display panel and display device |
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TWI599803B (en) * | 2016-03-24 | 2017-09-21 | 三星Sdi股份有限公司 | Color filter, manufacturing method thereof, and display device comprising the same |
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TW201915567A (en) | 2019-04-16 |
CN108107627B (en) | 2020-10-16 |
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