TWI630193B - Charge-transporting varnish, charge-transporting film, organic electroluminescence element, and method for manufacturing charge-transporting film - Google Patents

Charge-transporting varnish, charge-transporting film, organic electroluminescence element, and method for manufacturing charge-transporting film Download PDF

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TWI630193B
TWI630193B TW103133999A TW103133999A TWI630193B TW I630193 B TWI630193 B TW I630193B TW 103133999 A TW103133999 A TW 103133999A TW 103133999 A TW103133999 A TW 103133999A TW I630193 B TWI630193 B TW I630193B
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中家直樹
中澤太一
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日產化學工業股份有限公司
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    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00Organic light-emitting devices
    • H10K50/10OLEDs or polymer light-emitting diodes [PLED]
    • H10K50/14Carrier transporting layers
    • H10K50/15Hole transporting layers
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00Organic light-emitting devices
    • H10K50/10OLEDs or polymer light-emitting diodes [PLED]
    • H10K50/17Carrier injection layers
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K85/00Organic materials used in the body or electrodes of devices covered by this subclass
    • H10K85/30Coordination compounds
    • H10K85/321Metal complexes comprising a group IIIA element, e.g. Tris (8-hydroxyquinoline) gallium [Gaq3]
    • H10K85/324Metal complexes comprising a group IIIA element, e.g. Tris (8-hydroxyquinoline) gallium [Gaq3] comprising aluminium, e.g. Alq3
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K85/00Organic materials used in the body or electrodes of devices covered by this subclass
    • H10K85/30Coordination compounds
    • H10K85/341Transition metal complexes, e.g. Ru(II)polypyridine complexes
    • H10K85/342Transition metal complexes, e.g. Ru(II)polypyridine complexes comprising iridium
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K85/00Organic materials used in the body or electrodes of devices covered by this subclass
    • H10K85/60Organic compounds having low molecular weight
    • H10K85/631Amine compounds having at least two aryl rest on at least one amine-nitrogen atom, e.g. triphenylamine
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K85/00Organic materials used in the body or electrodes of devices covered by this subclass
    • H10K85/60Organic compounds having low molecular weight
    • H10K85/649Aromatic compounds comprising a hetero atom
    • H10K85/655Aromatic compounds comprising a hetero atom comprising only sulfur as heteroatom
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K85/00Organic materials used in the body or electrodes of devices covered by this subclass
    • H10K85/60Organic compounds having low molecular weight
    • H10K85/649Aromatic compounds comprising a hetero atom
    • H10K85/657Polycyclic condensed heteroaromatic hydrocarbons
    • H10K85/6572Polycyclic condensed heteroaromatic hydrocarbons comprising only nitrogen in the heteroaromatic polycondensed ring system, e.g. phenanthroline or carbazole

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Abstract

本發明係提供可以未達200℃之低溫燒成,同時在這種燒成條件下所製作的薄膜為高平坦性,且具有高電荷輸送性,適用於有機EL元件時,可發揮優異的EL元件特性的電荷輸送性清漆。 The present invention provides a film that can be fired at a low temperature of less than 200 ° C. At the same time, the film produced under such firing conditions has high flatness and high charge transport properties. When applied to organic EL elements, it can exhibit excellent EL Element-specific charge-transporting varnish.

本發明之電荷輸送性清漆係含有電荷輸送性物質、摻雜物及有機溶劑的電荷輸送性清漆,其特徵係上述摻雜物為包含雜多酸與選自鹵化四氰基苯醌二甲烷及鹵化或氰化苯醌(benzoquinone)之至少1種。 The charge-transporting varnish of the present invention is a charge-transporting varnish containing a charge-transporting substance, a dopant, and an organic solvent, and is characterized in that the dopant includes a heteropolyacid and a compound selected from the group consisting of a halogenated tetracyanobenzoquinone dimethane and At least one kind of halogenated or cyanoquinone (benzoquinone).

Description

電荷輸送性清漆、電荷輸送性薄膜、有機電致發光元件及電荷輸送性薄膜之製造方法 Charge-transporting varnish, charge-transporting film, organic electroluminescence element, and method for manufacturing charge-transporting film

本發明係有關電荷輸送性清漆、電荷輸送性薄膜、有機電致發光(以下稱為有機EL)元件、及電荷輸送性薄膜之製造方法。 The present invention relates to a method for producing a charge-transporting varnish, a charge-transporting film, an organic electroluminescence (hereinafter referred to as an organic EL) element, and a charge-transporting film.

有機EL元件中,可使用由有機化合物所構成的電荷輸送性薄膜作為發光層或電荷注入層。此電荷輸送性薄膜之形成方法,大致區分為以蒸鍍法所代表之乾式製程與以旋轉塗佈法所代表的濕式製程。乾式製程與濕式製程比較時,濕式製程可較有效率製造大面積平坦性高的薄膜,因此,在期望有機EL等之薄膜之大面積化的領域,大部分藉由濕式製程形成薄膜。 In the organic EL device, a charge-transporting thin film made of an organic compound can be used as a light-emitting layer or a charge-injection layer. The method for forming the charge transporting film is roughly divided into a dry process represented by a vapor deposition method and a wet process represented by a spin coating method. When the dry process is compared with the wet process, the wet process can more efficiently produce a thin film having a large area and a high flatness. Therefore, in the field where a large area of a film such as an organic EL film is desired, most of the films are formed by the wet process. .

有鑑於此點,本發明人等開發了以濕式製程製作可適用於各種電子裝置之電荷輸送性薄膜用的電荷輸送性清漆(參照例如專利文獻1)。 In view of this, the present inventors have developed a charge-transporting varnish for producing a charge-transporting film applicable to various electronic devices by a wet process (see, for example, Patent Document 1).

但是,近年有機EL的領域,因元件之輕量化或薄型化的潮流,而使用由有機化合物所構成之基板取代 玻璃基板,因此,要求可比以往更低溫燒成,且該情況下也可提供具有良好電荷輸送性之薄膜的清漆。 However, in recent years, in the field of organic EL, a substrate made of an organic compound has been used instead of a lighter or thinner element. Glass substrates are therefore required to be sintered at a lower temperature than in the past, and in this case, a varnish having a thin film having good charge transportability is also required.

[先前技術文獻] [Prior technical literature] [專利文獻] [Patent Literature]

[專利文獻1]日本特開2002-151272號公報 [Patent Document 1] Japanese Patent Laid-Open No. 2002-151272

本發明有鑑於上述情形而完成者,本發明之目的係提供可於未達200℃之低溫進行燒成,同時在該燒成條件下製作的薄膜為高平坦性且具有高電荷輸送性,適用於有機EL元件時,可發揮優異特性的電荷輸送性清漆。 The present invention has been completed in view of the above circumstances, and an object of the present invention is to provide a film that can be fired at a low temperature of less than 200 ° C, and has a high flatness and a high charge-transporting property, and is applicable. In the case of an organic EL device, a charge-transporting varnish having excellent characteristics can be exhibited.

本發明人等,為了達成上述目的而精心研討的結果,發現併用雜多酸與選自鹵化四氰基苯醌二甲烷及鹵化或氰化苯醌之至少1種,作為摻雜物的電荷輸送性清漆,不僅在200℃以上之高溫度,也可以未達200℃之低溫進行燒成,同時在該燒成條件下製作的薄膜為非晶質,且具有高平坦性及高電荷輸送性,及該薄膜使用於電洞注入層時,可得到可實現優異的亮度特性的有機EL元件,而完成本發明。 As a result of careful research in order to achieve the above-mentioned object, the present inventors have found that a heteropoly acid and at least one selected from the group consisting of a halogenated tetracyanobenzoquinone dimethane and a halogenated or cyanobenzoquinone are used in combination as a charge transporter The varnish can be fired not only at a high temperature above 200 ° C, but also at a low temperature below 200 ° C. At the same time, the thin film produced under this firing condition is amorphous, and has high flatness and high charge transportability. When the thin film is used in a hole injection layer, an organic EL device capable of achieving excellent brightness characteristics can be obtained, and the present invention has been completed.

換言之,本發明係提供下述電荷輸送性清漆、電荷輸送性薄膜、有機電致發光元件、及電荷輸送性薄膜之製造方法。 In other words, the present invention provides a method for producing a charge-transporting varnish, a charge-transporting film, an organic electroluminescence device, and a charge-transporting film described below.

1.一種電荷輸送性清漆,其係含有電荷輸送性物質、摻雜物及有機溶劑的電荷輸送性清漆,其特徵係上述摻雜物為包含雜多酸與選自鹵化四氰基苯醌二甲烷及鹵化或氰化苯醌之至少1種。 A charge-transporting varnish comprising a charge-transporting substance, a dopant, and an organic solvent, wherein the dopant comprises a heteropoly acid and a compound selected from the group consisting of a tetracyanobenzohalide halide. At least one of methane and halogenated or cyanobenzoquinone.

2.如前述第1項之電荷輸送性清漆,其中上述鹵化四氰基苯醌二甲烷包含氟化四氰基苯醌二甲烷。 2. The charge-transporting varnish according to the aforementioned item 1, wherein the halogenated tetracyanobenzoquinone dimethane comprises a tetrafluorinated benzoquinone dimethane.

3.如前述第1或2項之電荷輸送性清漆,其中上述雜多酸包含磷鎢酸。 3. The charge-transporting varnish according to item 1 or 2 above, wherein the heteropoly acid includes phosphotungstic acid.

4.如前述第1~3項中任一項之電荷輸送性清漆,其中上述電荷輸送性物質為苯胺衍生物或噻吩衍生物。 4. The charge-transporting varnish according to any one of items 1 to 3, wherein the charge-transporting substance is an aniline derivative or a thiophene derivative.

5.一種電荷輸送性薄膜,其特徵係使用如前述第1~4項中任一項之電荷輸送性清漆所製作。 5. A charge-transporting film characterized by using the charge-transporting varnish according to any one of items 1 to 4 above.

6.一種有機電致發光元件,其特徵係具有如前述第5項之電荷輸送性薄膜。 6. An organic electroluminescence device, comprising the charge-transporting film according to item 5 above.

7.如前述第6項之有機電致發光元件,其中上述電荷輸送性薄膜為電洞注入層或電洞輸送層。 7. The organic electroluminescent device according to the aforementioned item 6, wherein the charge transporting film is a hole injection layer or a hole transport layer.

8.一種電荷輸送性薄膜之製造方法,其特徵係將如前述第1~4項中任一項之電荷輸送性清漆塗佈於基材上,以未達200℃進行燒成。 8. A method for manufacturing a charge-transporting film, characterized in that the charge-transporting varnish according to any one of the foregoing items 1 to 4 is coated on a substrate and fired at a temperature of less than 200 ° C.

9.一種有機電致發光元件之製造方法,其特徵係使用如前述第5項之電荷輸送性薄膜。 9. A method for manufacturing an organic electroluminescence device, characterized by using the charge-transporting film as described in item 5 above.

10.一種電荷輸送性材料,其係由電荷輸送性物質及摻雜物所構成之電荷輸送性材料,其特徵係上述摻雜物為包含雜多酸與選自鹵化四氰基苯醌二甲烷及鹵化或氰化苯醌之至少1種。 10. A charge-transporting material, which is a charge-transporting material composed of a charge-transporting substance and a dopant, characterized in that the above-mentioned dopant includes a heteropoly acid and is selected from a halogenated tetracyanobenzoquinone dimethane And at least one of halogenated or cyanobenzoquinone.

11.一種電荷輸送性薄膜之平坦化方法,其係使用選自鹵化四氰基苯醌二甲烷及鹵化或氰化苯醌之至少1種之電荷輸送性薄膜之平坦化方法,其特徵係含有電荷輸送性物質、摻雜物及有機溶劑,上述摻雜物為使用含有雜多酸與選自鹵化四氰基苯醌二甲烷及鹵化或氰化苯醌之至少1種的電荷輸送性清漆。 11. A method for planarizing a charge-transporting film, which is a method for planarizing a charge-transporting film using at least one selected from the group consisting of a halogenated tetracyanobenzoquinone dimethane and a halogenated or cyanobenzoquinone, characterized in that A charge-transporting substance, a dopant, and an organic solvent. The dopant is a charge-transporting varnish containing a heteropoly acid and at least one selected from the group consisting of a halogenated tetracyanobenzoquinone dimethane and a halogenated or cyanated benzoquinone.

藉由使用包含雜多酸與選自鹵化四氰基苯醌二甲烷及鹵化或氰化苯醌之至少1種作為摻雜物之本發明之電荷輸送性清漆,不僅在200℃以上之高溫度,也可以未達200℃之低溫進行燒成,也可得到非晶質,具有高平坦性及高電荷輸送性,使用於有機EL元件之電洞注入層時,可實現優異亮度特性的薄膜。此理由尚未確定,但是推測將具有高電子受容能之鹵化四氰基苯醌二甲烷等與雜多酸一同作為摻雜物使用,可抑制僅使用任一方時所引起之薄膜之結晶化或摻雜不足的作用的緣故。 By using the charge-transporting varnish of the present invention containing a heteropoly acid and at least one selected from the group consisting of a halogenated tetracyanobenzoquinone dimethane and a halogenated or cyanobenzoquinone as a dopant, not only at a high temperature of 200 ° C or higher It can also be fired at a low temperature of less than 200 ° C. It can also be amorphous, with high flatness and high charge transportability. When used in the hole injection layer of an organic EL device, it can achieve a thin film with excellent brightness characteristics. The reason has not been determined, but it is speculated that the use of halogenated tetracyanobenzoquinone dimethane and the like with a heteropolyacid as a dopant with high electron capacity can suppress the crystallization or doping of the thin film caused by using only either Miscellaneous insufficient sake's sake.

又,藉由使用本發明之電荷輸送性清漆,即使使用旋轉塗佈法或狹縫塗佈法等、可大面積成膜之各種濕式製程時,也可再現性良好製造電荷輸送性優異的薄膜,因此, 也可充分因應近年有機EL元件領域的進展。 In addition, by using the charge-transporting varnish of the present invention, even when various wet processes capable of forming a large-area film are used, such as a spin coating method or a slit coating method, a reproducible film having excellent charge-transporting properties can be produced. Film, so It can also fully respond to the recent progress in the field of organic EL elements.

此外,由本發明之電荷輸送性清漆所得之薄膜,也可作為防靜電膜或有機薄膜太陽能電池之陽極緩衝層等使用。 In addition, the film obtained from the charge-transporting varnish of the present invention can also be used as an antistatic film or an anode buffer layer of an organic thin-film solar cell.

[實施發明的形態] [Mode for Carrying Out the Invention] [電荷輸送性清漆] [Charge-transporting varnish]

本發明之電荷輸送性清漆係含有電荷輸送性物質、摻雜物及有機溶劑,上述摻雜物包含雜多酸與選自鹵化四氰基苯醌二甲烷及鹵化或氰化苯醌之至少1種,亦即,選自鹵化四氰基苯醌二甲烷、鹵化苯醌及氰化苯醌之至少1種。 The charge-transporting varnish of the present invention contains a charge-transporting substance, a dopant, and an organic solvent. The dopant includes a heteropolyacid and at least 1 selected from the group consisting of halogenated tetracyanobenzoquinone dimethane and halogenated or cyanobenzoquinone. Species, that is, at least one selected from the group consisting of halogenated tetracyanobenzoquinone dimethane, halogenated benzoquinone, and cyanobenzoquinone.

[電荷輸送性物質] [Charge-transporting substance]

本發明之電荷輸送性清漆所含有之電荷輸送性物質係具有電荷輸送性、亦即導電性的物質,也可為其本身具有電荷輸送性,亦可為與摻雜物一同使用時,具有電荷輸送性者。特別是具有電洞輸送性的物質較佳。 The charge-transporting substance contained in the charge-transporting varnish of the present invention is a substance having a charge-transporting property, that is, a conductive material, and may also have a charge-transporting property itself, or may have a charge when used together with a dopant. Transporters. Particularly, a substance having hole transport properties is preferred.

這種電荷輸送性物質可使用在有機EL之領域等使用的電荷輸送性化合物,其具體例有寡苯胺衍生物、N,N’-二芳基聯苯胺衍生物、N,N,N’,N’-四芳基聯苯胺衍生物等之芳基胺衍生物(苯胺衍生物)、寡噻吩衍生物、噻吩并噻吩(Thienothiophene)衍生物、噻吩苯並噻吩衍生物等 之噻吩衍生物、寡吡咯等之吡咯衍生物等。 As such a charge-transporting substance, charge-transporting compounds used in the field of organic EL and the like can be used, and specific examples thereof include oligoaniline derivatives, N, N'-diarylbenzidine derivatives, N, N, N ', N'-tetraarylbenzidine derivatives, such as arylamine derivatives (aniline derivatives), oligothiophene derivatives, thienothiophene derivatives, thiophenobenzothiophene derivatives, etc. Thiophene derivatives, azole derivatives and the like.

苯胺衍生物較佳為不為苯醌二亞胺(quinonediimine)結構,亦即不具有下述式表示之部分結構的苯胺衍生物。 The aniline derivative is preferably an aniline derivative that does not have a quinonediimine structure, that is, does not have a partial structure represented by the following formula.

又,苯醌二亞胺構造係指芳香族化合物之碳環內之雙鍵減少一個,取而代之,在對位或鄰位具有2個環外雙鍵之結構(所謂的醌型結構),例如來自彼此在對位具有2個胺基之芳基二胺化合物之苯醌二亞胺結構係以下述式表示的結構。 In addition, the benzoquinone diimine structure refers to a structure in which the double bond in the carbocyclic ring of an aromatic compound is reduced by one, and instead, it has a structure with two extra-ring double bonds in the para or ortho position (so-called quinone structure). The benzoquinone diimide structure of an aryl diamine compound having two amine groups in the para position to each other is a structure represented by the following formula.

電荷輸送性物質之分子量,只要是溶解於電荷輸送性物質所使用之有機溶劑時,即無特別限定,大概為200~10,000程度,從再現性良好得到電荷輸送性更高的薄膜的觀點,較佳為300以上、更佳為400以上,從調製再現性良好提供平坦性高之薄膜的均勻的清漆的觀點,較佳為8,000以下、更佳為7,000以下、又更佳為6,000以下、又更佳為5,000以下。又,薄膜化時,防止電荷輸 送性物質彼此分離的觀點,電荷輸送性化合物較佳為無分子量分布(分散度為1)(即、單一的分子量較佳)。 The molecular weight of the charge-transporting substance is not particularly limited as long as it is dissolved in an organic solvent used for the charge-transporting substance, and is about 200 to 10,000. From the viewpoint of obtaining a film with a higher charge-transporting property, the reproducibility is good, It is preferably 300 or more, more preferably 400 or more, and from the viewpoint of providing a uniform varnish with good modulation reproducibility and a highly flat film, it is preferably 8,000 or less, more preferably 7,000 or less, still more preferably 6,000 or less, and more It is preferably below 5,000. In addition, during film formation, charge transport is prevented. From the standpoint of separation of the transmissive substances from each other, the charge-transporting compound preferably has no molecular weight distribution (the degree of dispersion is 1) (that is, a single molecular weight is preferred).

[摻雜物] [Dopant]

本發明之電荷輸送性清漆包含作為第1摻雜物之雜多酸及作為第2摻雜物之選自鹵化四氰基苯醌二甲烷及鹵化或氰化苯醌之至少1種。以下,此等統稱為摻雜物。 The charge-transporting varnish of the present invention includes a heteropoly acid as a first dopant and at least one selected from the group consisting of a halogenated tetracyanobenzoquinone dimethane and a halogenated or cyanated benzoquinone as a second dopant. Hereinafter, these are collectively referred to as dopants.

第1摻雜物的雜多酸係指代表性以式(A1)表示之Keggin型或以式(A2)表示之Dawson型之化學結構所表示,具有雜原子位於分子中心之結構,且釩(V)、鉬(Mo)、鎢(W)等之含氧酸(oxoacid)的同素聚合酸(isopoly acid)、與異種元素之含氧酸進行縮合而成的聚酸。這種異種元素之含氧酸,主要可舉例如矽(Si)、磷(P)、砷(As)的含氧酸。 The heteropoly acid of the first dopant means a chemical structure represented by a Keggin type represented by the formula (A1) or a Dawson type represented by the formula (A2), having a structure in which a heteroatom is located at the center of the molecule, and vanadium ( V), molybdenum (Mo), tungsten (W) and other oxoacid oxoacid isopoly acid (isopoly acid) polycondensation with oxoacid of different elements and polyacids. The oxyacids of such heterogeneous elements include, for example, oxyacids of silicon (Si), phosphorus (P), and arsenic (As).

雜多酸之具體例,舉例如:磷鉬酸、矽鉬酸、磷鎢酸、矽鎢酸、磷鎢鉬酸等。此等可單獨使用,亦可組合2種以上使用。又,在本發明使用的雜多酸,可以市售品取得,又,亦可藉由習知方法來合成。 Specific examples of the heteropoly acid include, for example, phosphomolybdic acid, silomomolybdic acid, phosphotungstic acid, silototungstic acid, phosphotungstic molybdic acid, and the like. These can be used alone or in combination of two or more. The heteropolyacid used in the present invention can be obtained from a commercially available product, and can also be synthesized by a conventional method.

特別是使用1種類的雜多酸時,該雜多酸較佳為磷鎢酸或磷鉬酸,更佳為磷鎢酸。又,使用2種類以上的雜多酸時,該2種類以上的雜多酸之至少一者為磷鎢酸或磷鉬酸為佳,更佳為磷鎢酸。 In particular, when one type of heteropoly acid is used, the heteropoly acid is preferably phosphotungstic acid or phosphomolybdic acid, and more preferably phosphotungstic acid. When two or more kinds of heteropoly acids are used, at least one of the two or more kinds of heteropoly acids is preferably phosphotungstic acid or phosphomolybdic acid, and more preferably phosphotungstic acid.

又,雜多酸在元素分析等的定量分析中,由一般式所示之結構,即使元素數量較多或較少者,只要是以市售品取得者,或依據習知合成方法而適當合成者時,皆可用於本發明。 In addition, in the quantitative analysis of elemental analysis such as heteropoly acid, the structure represented by the general formula is used, and even if the number of elements is large or small, as long as it is obtained from a commercially available product, or it is appropriately synthesized according to a conventional synthesis method In either case, it can be used in the present invention.

亦即,例如一般磷鎢酸係以化學式H3(PW12O40)‧nH2O表示,磷鉬酸係以化學式H3(PMo12O40)‧nH2O表示,但在定量分析中,即使此式中之P(磷)、O(氧)或W(鎢)或Mo(鉬)的數量多或少者,只要是其為以市售品取得,或依據習知合成方法而適當合成者時,皆可用於本發明。此時,本發明所規定之雜多酸的質量,非指合成物或市售品中之純粹的磷鎢酸之質量(磷鎢酸含量),而是指可以市售品取得之形態及以習知合成法可分離的形態中,包含水合水或其他雜質等狀態的全質量。 That is, for example, the general phosphotungstic acid is represented by the chemical formula H 3 (PW 12 O 40 ) ‧nH 2 O, and the phosphomolybdic acid is represented by the chemical formula H 3 (PMo 12 O 40 ) ‧nH 2 O, but in the quantitative analysis , Even if the amount of P (phosphorus), O (oxygen), W (tungsten), or Mo (molybdenum) in this formula is more or less, as long as it is obtained from a commercially available product, or according to a conventional synthesis method, it is appropriate All synthesizers can be used in the present invention. At this time, the mass of the heteropolyacid specified in the present invention does not refer to the mass of pure phosphotungstic acid (phosphotungstic acid content) in the composition or the commercially available product, but refers to the form and commercially available product. In the form that can be separated by the conventional synthesis method, it contains the full mass of hydrated water or other impurities.

第2摻雜物的鹵化四氰基苯醌二甲烷係以式(1)表示。 The halogenated tetracyanobenzoquinone dimethane of the second dopant is represented by formula (1).

式中,R1~R4各自獨立表示氫原子或鹵素原子,但是至少1個為鹵素原子。鹵素原子例如有氟原子、氯原子、溴原子、碘原子,較佳為氟原子或氯原子、更佳為氟原子。又,較佳為R1~R4之至少2個為鹵素原子、更佳為至少3個為鹵素原子、最佳為全部為鹵素原子。 In the formula, R 1 to R 4 each independently represent a hydrogen atom or a halogen atom, but at least one of them is a halogen atom. Examples of the halogen atom include a fluorine atom, a chlorine atom, a bromine atom, and an iodine atom. A fluorine atom or a chlorine atom is preferred, and a fluorine atom is more preferred. Further, it is preferred that at least two of R 1 to R 4 are halogen atoms, more preferably at least three are halogen atoms, and most preferably all of them are halogen atoms.

鹵化四氰基苯醌二甲烷,具體而言,例如有四氟四氰基苯醌二甲烷(F4TCNQ)、四氯四氰基苯醌二甲烷、2-氟四氰基苯醌二甲烷、2-氯四氰基苯醌二甲烷、2,5-二氟四氰基苯醌二甲烷、2,5-二氯四氰基苯醌二甲烷等。鹵化四氰基苯醌二甲烷特佳為F4TCNQ。 Specific examples of the halogenated tetracyanobenzoquinone dimethane include tetrafluorotetracyanobenzoquinone dimethane (F4TCNQ), tetrachlorotetracyanobenzoquinone dimethane, 2-fluorotetracyanobenzoquinone dimethane, 2 -Chlorotetracyanobenzoquinone dimethane, 2,5-difluorotetracyanobenzoquinone dimethane, 2,5-dichlorotetracyanobenzoquinone dimethane, and the like. Tetracyanobenzoquinone dimethane is particularly preferred as F4TCNQ.

另一個之第2摻雜物的鹵化或氰化苯醌係以式(2)表示。 The halogenated or cyanated benzoquinone of the other second dopant is represented by formula (2).

式中,R5~R8各自獨立表示氫原子、鹵素原子或氰基,但是至少1個為鹵素原子或氰基。鹵素原子例如有與上述相同者,較佳為氟原子或氯原子、更佳為氟原子。又,較佳為R5~R8之至少2個為鹵素原子或氰基、更佳為至少3個為鹵素原子或氰基、又更佳為全部為鹵素原子或氰基。 In the formula, R 5 to R 8 each independently represent a hydrogen atom, a halogen atom, or a cyano group, but at least one of them is a halogen atom or a cyano group. The halogen atom is, for example, the same as described above, preferably a fluorine atom or a chlorine atom, and more preferably a fluorine atom. Further, it is preferred that at least two of R 5 to R 8 are halogen atoms or cyano groups, more preferably at least three are halogen atoms or cyano groups, and still more preferably all of them are halogen atoms or cyano groups.

鹵化或氰化苯醌具體而言,例如有2,3-二氯- 5,6-二氰基-p-苯醌、三氟苯醌、四氟苯醌、四溴苯醌、四氰基苯醌等。鹵化或氰化苯醌較佳為2,3-二氯-5,6-二氰基-p-苯醌、三氟苯醌、四氟苯醌、四氰基苯醌、更佳為2,3-二氯-5,6-二氰基-p-苯醌、四氟苯醌、四氰基苯醌、又更佳為2,3-二氯-5,6-二氰基-p-苯醌。 Specific examples of halogenated or cyanobenzoquinone are 2,3-dichloro- 5,6-dicyano-p-benzoquinone, trifluorobenzoquinone, tetrafluorobenzoquinone, tetrabromobenzoquinone, tetracyanobenzoquinone, and the like. The halogenated or cyanobenzoquinone is preferably 2,3-dichloro-5,6-dicyano-p-benzoquinone, trifluorobenzoquinone, tetrafluorobenzoquinone, tetracyanobenzoquinone, more preferably 2, 3-dichloro-5,6-dicyano-p-benzoquinone, tetrafluorobenzoquinone, tetracyanobenzoquinone, and more preferably 2,3-dichloro-5,6-dicyano-p- Benzoquinone.

本發明之電荷輸送性清漆中之摻雜物之含量係依據電荷輸送性物質適宜決定者。 The content of the dopant in the charge-transporting varnish of the present invention is appropriately determined depending on the charge-transporting substance.

噻吩衍生物作為電荷輸送性物質使用時,第1摻雜物之含量係相對於由噻吩衍生物所構成之電荷輸送性物質,質量比表示,通常為0.01~100程度、更佳為0.1~50程度、又更佳為1~10程度。第2摻雜物之含量係指總固體成分(燒成後殘留之清漆所含的成分。以下相同)中,0.1~100質量%程度、更佳為1~50質量%、又更佳為5~30質量%程度。又,噻吩部位與苯胺部位共存於分子內的化合物,在摻雜物/主體(host)比之算出時,當作為噻吩衍生物。 When a thiophene derivative is used as a charge transporting substance, the content of the first dopant is a mass ratio of the charge transporting substance composed of the thiophene derivative, which is usually about 0.01 to 100, and more preferably 0.1 to 50. The degree is more preferably 1 to 10. The content of the second dopant means the total solid content (the components contained in the varnish remaining after firing. The same applies hereinafter), about 0.1 to 100% by mass, more preferably 1 to 50% by mass, and even more preferably 5 ~ 30% by mass. A compound in which a thiophene site and an aniline site coexist in the molecule is regarded as a thiophene derivative when the dopant / host ratio is calculated.

另外,苯胺衍生物作為電荷輸送性物質使用時,第1摻雜物之含量係在總固體成分中,通常為1~500質量%程度、較佳為10~200質量%程度、更佳為50~150質量%程度。又,第2摻雜物之含量係相對於由苯胺衍生物所構成之電荷輸送性物質,以當量比表示,通常為0.01~100程度、較佳為0.1~50程度、更佳為1~10程度。 When the aniline derivative is used as a charge-transporting substance, the content of the first dopant is in the total solid content, usually about 1 to 500% by mass, preferably about 10 to 200% by mass, and more preferably 50. ~ 150% by mass. The content of the second dopant is expressed in terms of an equivalent ratio to a charge-transporting substance composed of an aniline derivative, and is usually about 0.01 to 100, preferably about 0.1 to 50, and more preferably 1 to 10 degree.

本發明之電荷輸送性清漆,藉由包含第1及第2摻雜物,因此不僅在200℃以上之高溫燒成,也可在 未達200℃、有時可在180℃以下、160℃以下之低溫燒成,可提供亮度等之特性優異,不僅顯示來自銦錫氧化物(ITO)、銦鋅氧化物(IZO)所代表之透明電極之高電洞受容能,也顯示來自鋁所代表之金屬陽極之高電洞受容能的電荷輸送性優異的薄膜。 Since the charge-transporting varnish of the present invention contains the first and second dopants, it can be fired not only at a high temperature of 200 ° C or higher, but also at It can be fired at a temperature of less than 200 ° C, sometimes 180 ° C or lower and 160 ° C or lower. It can provide excellent brightness and other characteristics. It is not only derived from indium tin oxide (ITO) and indium zinc oxide (IZO). The high hole-capacitive energy of the transparent electrode also shows a thin film having excellent charge-transporting properties due to the high hole-capacitive energy of the metal anode represented by aluminum.

[有機溶劑] [Organic solvents]

調製電荷輸送性清漆時所用的有機溶劑,可使用可良好溶解電荷輸送性物質、摻雜物及後述其他成分的高溶解性溶劑。 As the organic solvent used in the preparation of the charge-transporting varnish, a highly soluble solvent that can well dissolve the charge-transporting substance, the dopant, and other components described later can be used.

這種高溶解性溶劑,可使用例如N,N-二甲基甲醯胺、N,N-二甲基乙醯胺、N-甲基吡咯烷酮、1,3-二甲基-2-咪唑啉酮、二乙二醇單甲基醚等的有機溶劑。此等溶劑可單獨使用1種或2種以上混合使用,其使用量係相對於清漆所使用的溶劑全體,可為5~100質量%。 As such a highly soluble solvent, for example, N, N-dimethylformamide, N, N-dimethylacetamide, N-methylpyrrolidone, 1,3-dimethyl-2-imidazoline can be used. Organic solvents such as ketones and diethylene glycol monomethyl ether. These solvents can be used singly or in combination of two or more kinds. The amount of the solvent used is 5 to 100% by mass based on the entire solvent used in the varnish.

又,電荷輸送性物質及摻雜物皆完全溶解於上述溶劑較佳。 Moreover, it is preferable that both the charge transporting substance and the dopant are completely dissolved in the solvent.

又,本發明中,藉由使清漆含有至少1種在25℃下具有10~200mPa.s、特別是35~150mPa.s之黏度,且在常壓(大氣壓)下沸點為50~300℃、特別是150~250℃之高黏度的機溶劑,清漆之黏度的調整變得容易,結果,可再現性良好提供平坦性高的薄膜,可因應使用的塗佈方法調製清漆。 In the present invention, the varnish is contained in at least one kind and has 10 to 200 mPa at 25 ° C. s, especially 35 ~ 150mPa. s viscosity, and a high viscosity organic solvent with a boiling point of 50 ~ 300 ° C, especially 150 ~ 250 ° C under normal pressure (atmospheric pressure), it is easy to adjust the viscosity of the varnish. As a result, it has good reproducibility and provides flatness. High film, it can be prepared according to the coating method used.

高黏度有機溶劑無特別限定,可舉例如環己 醇、乙二醇、乙二醇二縮水甘油醚、1,3-辛二醇、二乙二醇、二丙二醇、三乙二醇、三丙二醇、1,3-丁二醇、2,3-丁二醇、1,4-丁二醇、丙二醇、己二醇等。此等溶劑可單獨使用1種或混合2種以上使用。 The high-viscosity organic solvent is not particularly limited, and examples thereof include cyclohexyl Alcohol, ethylene glycol, ethylene glycol diglycidyl ether, 1,3-octanediol, diethylene glycol, dipropylene glycol, triethylene glycol, tripropylene glycol, 1,3-butanediol, 2,3- Butanediol, 1,4-butanediol, propylene glycol, hexanediol, and the like. These solvents can be used singly or in combination of two or more.

高黏度有機溶劑相對於本發明之清漆所使用之溶劑全體的添加比例,較佳為固體不析出的範圍內,在固體不析出的範圍內,添加比例較佳為5~80質量%。 The addition ratio of the high-viscosity organic solvent to the entire solvent used in the varnish of the present invention is preferably in a range where solids do not precipitate, and in a range where solids do not precipitate, the addition ratio is preferably 5 to 80% by mass.

此外,為了提高對基板之濕潤性、調整溶劑之表面張力、調整極性、調整沸點等之目的,相對於清漆所使用之溶劑全體,較佳為混合1~90質量%、更佳為混合1~50質量%之比例的其他的溶劑。 In addition, in order to improve the wettability of the substrate, adjust the surface tension of the solvent, adjust the polarity, and adjust the boiling point, etc., it is preferable to mix 1 to 90% by mass, and more preferably to mix 1 to the entire solvent used in the varnish. 50% by mass of other solvents.

這種溶劑,可舉例如乙二醇單丁基醚、二乙二醇二乙基醚、二乙二醇二甲基醚、二乙二醇單乙基醚乙酸酯、二乙二醇單丁基醚乙酸酯、二丙二醇單甲基醚、丙二醇單甲基醚乙酸酯、二乙二醇單乙基醚、二丙酮醇、γ-丁內酯、乙基乳酸酯、n-己基乙酸酯、丙二醇單甲基醚等,但不限於此等。此等溶劑可1種單獨使用或混合2種以上使用。 Examples of such a solvent include ethylene glycol monobutyl ether, diethylene glycol diethyl ether, diethylene glycol dimethyl ether, diethylene glycol monoethyl ether acetate, and diethylene glycol monoethyl ether. Butyl ether acetate, dipropylene glycol monomethyl ether, propylene glycol monomethyl ether acetate, diethylene glycol monoethyl ether, diacetone alcohol, γ-butyrolactone, ethyl lactate, n- Hexyl acetate, propylene glycol monomethyl ether, and the like, but are not limited thereto. These solvents can be used alone or in combination of two or more.

本發明之清漆之黏度係配合製作之薄膜的厚度等或固體成分濃度適宜設定者,但通常在25℃下為1~50mPa.s。 The viscosity of the varnish of the present invention is suitably set according to the thickness of the film to be produced or the solid content concentration, but it is usually 1 to 50 mPa at 25 ° C. s.

又,本發明中之電荷輸送性清漆之固體成分濃度係考量清漆之黏度及表面張力等或製作之薄膜之厚度等而適宜設定者,但通常為0.1~10.0質量%左右,若考量提升清漆之塗佈性時,較佳為0.5~5.0質量%、更佳為1.0~3.0質量 %。 The solid content concentration of the charge-transporting varnish in the present invention is appropriately set in consideration of the viscosity and surface tension of the varnish or the thickness of the film to be produced, but it is usually about 0.1 to 10.0% by mass. In the case of coatability, it is preferably 0.5 to 5.0% by mass, and more preferably 1.0 to 3.0% by mass. %.

[其他的成分] [Other ingredients]

本發明之電荷輸送性清漆可包含有機矽烷化合物。有機矽烷化合物之具體例,可列舉二烷氧基矽烷化合物、三烷氧基矽烷化合物及四烷氧基矽烷化合物。此等可1種單獨或2種以上組合使用。 The charge-transporting varnish of the present invention may contain an organosilane compound. Specific examples of the organic silane compound include a dialkoxysilane compound, a trialkoxysilane compound, and a tetraalkoxysilane compound. These can be used individually by 1 type or in combination of 2 or more types.

特別是有機矽烷化合物,較佳為含有由二烷氧基矽烷化合物及三烷氧基矽烷化合物選出之1種,更佳為含有三烷氧基矽烷化合物。 In particular, the organic silane compound preferably contains one selected from a dialkoxysilane compound and a trialkoxysilane compound, and more preferably contains a trialkoxysilane compound.

二烷氧基矽烷化合物、三烷氧基矽烷化合物及四烷氧基矽烷化合物,可舉例如以式(B1)~(B3)所表示者。 Examples of the dialkoxysilane compound, trialkoxysilane compound, and tetraalkoxysilane compound include formulas (B1) to (B3).

SiR’2(OR)2 (B1) SiR ' 2 (OR) 2 (B1)

SiR’(OR)3 (B2) SiR '(OR) 3 (B2)

Si(OR)4 (B3) Si (OR) 4 (B3)

式中,R各自獨立表示可經Z101取代之碳數1~20之烷基、可經Z101取代之碳數2~20之烯基、可經Z101取代之碳數2~20之炔基、可經Z102取代之碳數6~20之芳基或可經Z102取代之碳數2~20之雜芳基。 In the formula, R each independently represents an alkyl group may be substituted with Z 101 carbon atoms of 1 to 20, the sum may be substituted with Z 101 carbon atoms, alkenyl having 2 to 20, the sum may be substituted with Z 101 carbon atoms, alkynyl of 2 to 20 Group, an aryl group having 6 to 20 carbon atoms which may be substituted by Z 102 or a heteroaryl group having 2 to 20 carbon atoms which may be substituted by Z 102 .

R’各自獨立表示可經Z103取代之碳數1~20之烷基、可經Z103取代之碳數2~20之烯基、可經Z103取代之碳數2~20之炔基、可經Z104取代之碳數6~20之芳基或可經Z104取代之碳數2~20之雜芳基。 R 'each independently represent an alkyl group may be substituted with Z 1 of 103 to 20 carbon atoms, the substituents Z may be the 103 carbon atoms of the alkenyl group having 2 to 20, Z may be a substituted alkynyl group of 103 carbon atoms of 2 to 20, the heteroaryl may be 2 to 20 substituted aryl group of Z 104 carbon atoms, an aryl group of 6 to 20 may be substituted with Z 104 or the number of carbon atoms.

Z101表示鹵素原子、可經Z105取代之碳數6~20之芳基或可經Z105取代之碳數2~20之雜芳基。 Z 101 represents a halogen atom, an aryl group having 6 to 20 carbon atoms which may be substituted with Z 105 or a heteroaryl group having 2 to 20 carbon atoms which may be substituted with Z 105 .

Z102表示鹵素原子、可經Z105取代之碳數1~20之烷基、可經Z105取代之碳數2~20之烯基或可經Z105取代之碳數2~20之炔基。 Z 102 represents a halogen atom, an alkyl group may be substituted by Z 105 of 1 to 20 carbon atoms, the sum may be substituted with Z 105 carbon atoms of the alkenyl group having 2 to 20 or 105 may be substituted with Z alkynyl of 2 to 20 carbon atoms of the group .

Z103表示鹵素原子、可經Z105取代之碳數6~20之芳基、可經Z105取代之碳數2~20之雜芳基、環氧基環己基、環氧丙氧基、甲基丙烯醯氧基、丙烯醯氧基、脲基(-NHCONH2)、硫醇基、異氰酸酯基(-NCO)、胺基、-NHY101基或-NY102Y103基。 Z 103 represents a halogen atom, an aryl group having 6 to 20 carbon atoms which can be substituted by Z 105 , a heteroaryl group having 2 to 20 carbon atoms which can be substituted by Z 105 , epoxycyclohexyl, glycidyloxy, methyl Propylene fluorenyloxy, propylene fluorenyloxy, ureido (-NHCONH 2 ), thiol, isocyanate (-NCO), amine, -NHY 101 or -NY 102 Y 103 .

Z104表示鹵素原子、可經Z105取代之碳數1~20之烷基、可經Z105取代之碳數2~20之烯基、可經Z105取代之碳數2~20之炔基、環氧基環己基、環氧丙氧基、甲基丙烯醯氧基、丙烯醯氧基、脲基(-NHCONH2)、硫醇基、異氰酸酯基(-NCO)、胺基、-NHY101基或-NY102Y103基。 Z 104 represents a halogen atom, an alkyl group may be substituted with Z 105 of 1 to 20 carbon atoms, the substituents Z may be the 105 carbon atoms of the alkenyl group having 2 to 20, Z 105 may be substituted alkynyl of 2 to 20 carbon atoms of the group , Epoxycyclohexyl, glycidyloxy, methacryloxy, propyleneoxy, ureido (-NHCONH 2 ), thiol, isocyanate (-NCO), amine, -NHY 101 Base or -NY 102 Y 103 base.

Y101~Y103各自獨立表示可經Z105取代之碳數1~20之烷基、可經Z105取代之碳數2~20之烯基、可經Z105取代之碳數2~20之炔基、可經Z105取代之碳數6~20之芳基或可經Z105取代之碳數2~20之雜芳基。 Y 101 ~ Y 103 each independently represent an alkyl group may be substituted with Z 105 of 1 to 20 carbon atoms, the sum may be substituted with Z 105 carbon atoms of the alkenyl group having 2 to 20, carbon atoms can be substituted by Z 2 to 20 of the 105 alkynyl group, Z 105 may be a substituted aryl group of a carbon number of 6 to 20 aryl or heteroaryl group substituted by Z 105 of the 2 to 20 carbon atoms.

Z105表示鹵素原子、胺基、硝基、氰基或硫醇基。 Z 105 represents a halogen atom, an amine group, a nitro group, a cyano group, or a thiol group.

鹵素原子,列舉例如:氟原子、氯原子、溴原子、碘原子等。 Examples of the halogen atom include a fluorine atom, a chlorine atom, a bromine atom, and an iodine atom.

碳數1~20之烷基,可為直鏈狀、分支鏈狀、環狀之任一者,列舉例如甲基、乙基、n-丙基、異丙基、 n-丁基、異丁基、s-丁基、t-丁基、n-戊基、n-己基、n-庚基、n-辛基、n-壬基、n-癸基等之碳數1~20之直鏈或分支鏈狀烷基;環丙基、環丁基、環戊基、環己基、環庚基、環辛基、環壬基、環癸基、雙環丁基、雙環戊基、雙環己基、雙環庚基、雙環辛基、雙環壬基、雙環癸基等之碳數3~20之環狀烷基等。 The alkyl group having 1 to 20 carbon atoms may be any of linear, branched, and cyclic groups, and examples include methyl, ethyl, n-propyl, isopropyl, Carbon of n-butyl, isobutyl, s-butyl, t-butyl, n-pentyl, n-hexyl, n-heptyl, n-octyl, n-nonyl, n-decyl, etc. Linear or branched alkyl groups of 1 to 20; cyclopropyl, cyclobutyl, cyclopentyl, cyclohexyl, cycloheptyl, cyclooctyl, cyclononyl, cyclodecyl, bicyclobutyl, bicyclic Amyl, bicyclohexyl, bicycloheptyl, bicyclooctyl, bicyclononyl, bicyclodecyl, etc. cyclic alkyl groups having 3 to 20 carbon atoms.

碳數2~20之烯基之具體例,列舉例如乙烯基、n-1-丙烯基、n-2-丙烯基、1-甲基乙烯基、n-1-丁烯基、n-2-丁烯基、n-3-丁烯基、2-甲基-1-丙烯基、2-甲基-2-丙烯基、1-乙基乙烯基、1-甲基-1-丙烯基、1-甲基-2-丙烯基、n-1-戊烯基、n-1-癸烯基、n-1-二十烯基等。 Specific examples of the alkenyl group having 2 to 20 carbon atoms include vinyl, n-1-propenyl, n-2-propenyl, 1-methylvinyl, n-1-butenyl, and n-2- Butenyl, n-3-butenyl, 2-methyl-1-propenyl, 2-methyl-2-propenyl, 1-ethylvinyl, 1-methyl-1-propenyl, 1 -Methyl-2-propenyl, n-1-pentenyl, n-1-decenyl, n-1-icosenyl, and the like.

碳數2~20之炔基之具體例,列舉例如乙炔基、n-1-丙炔基、n-2-丙炔基、n-1-丁炔基、n-2-丁炔基、n-3-丁炔基、1-甲基-2-丙炔基、n-1-戊炔基、n-2-戊炔基、n-3-戊炔基、n-4-戊炔基、1-甲基-n-丁炔基、2-甲基-n-丁炔基、3-甲基-n-丁炔基、1,1-二甲基-n-丙炔基、n-1-己炔基、n-1-癸炔基、n-1-十五炔基、n-1-二十炔基等。 Specific examples of the alkynyl group having 2 to 20 carbon atoms include ethynyl, n-1-propynyl, n-2-propynyl, n-1-butynyl, n-2-butynyl, n -3-butynyl, 1-methyl-2-propynyl, n-1-pentynyl, n-2-pentynyl, n-3-pentynyl, n-4-pentynyl, 1-methyl-n-butynyl, 2-methyl-n-butynyl, 3-methyl-n-butynyl, 1,1-dimethyl-n-propynyl, n-1 -Hexynyl, n-1-decynyl, n-1-pentadeynyl, n-1-icosynyl and the like.

碳數6~20之芳基之具體例,列舉例如苯基、1-萘基、2-萘基、1-蒽基、2-蒽基、9-蒽基、1-菲基、2-菲基、3-菲基、4-菲基、9-菲基等。 Specific examples of the aryl group having 6 to 20 carbon atoms include phenyl, 1-naphthyl, 2-naphthyl, 1-anthryl, 2-anthryl, 9-anthryl, 1-phenanthryl, and 2-phenanthrene Radical, 3-phenanthryl, 4-phenanthryl, 9-phenanthryl and the like.

R較佳為可經Z101取代之碳數1~20之烷基、可經Z101取代之碳數2~20之烯基或可經Z102取代之碳數6~20之芳基,更佳為可經Z101取代之碳數1~6之烷基、可經Z101取代之碳數2~6之烯基或可經Z102取代之苯 基,又更佳為可經Z101取代之碳數1~4之烷基或可經Z102取代之苯基,又更佳為可經Z101取代之甲基或乙基。 R is preferably an alkyl group may be substituted by the Z 101 of 1 to 20 carbon atoms, may be substituted with the group Z 101 carbon atoms, alkenyl of 2 to 20, or it may be substituted with Z 102 carbon atoms of the aryl group having 6 to 20, more Jia Z 101 is substituted it may be an alkyl group having 1 to 6 carbon atoms, the substituents may be the Z 101 carbon atoms of the alkenyl group having 2 to 6 or, more preferably and Z 101 may be substituted by a substituted phenyl group of Z 102 An alkyl group having 1 to 4 carbon atoms or a phenyl group which may be substituted with Z 102 , and more preferably a methyl group or ethyl group which may be substituted with Z 101 .

又,R’較佳為可經Z103取代之碳數1~20之烷基或可經Z104取代之碳數6~20之芳基,更佳為可經Z103取代之碳數1~10之烷基或可經Z104取代之碳數6~14之芳基,又更佳為可經Z103取代之碳數1~6之烷基或可經Z104取代之碳數6~10之芳基,又更佳為可經Z103取代之碳數1~4之烷基或可經Z104取代之苯基。 Further, R ′ is preferably an alkyl group having 1 to 20 carbon atoms that can be substituted by Z 103 or an aryl group having 6 to 20 carbon atoms that can be substituted by Z 104 , and more preferably 1 to 20 carbon atoms that can be substituted by Z 103 . An alkyl group of 10 or an aryl group having 6 to 14 carbon atoms that can be substituted by Z 104 , and an alkyl group of 1 to 6 carbon atoms that can be substituted by Z 103 or 6 to 10 carbon atoms that can be substituted by Z 104 The aryl group is more preferably an alkyl group having 1 to 4 carbon atoms which may be substituted by Z 103 or a phenyl group which may be substituted by Z 104 .

又,複數之R可全部相同或相異,複數之R’也可全部相同或相異。 Moreover, all of the plural R's may be the same or different, and all of the plural R's may be the same or different.

Z101較佳為鹵素原子或可經Z105取代之碳數6~20之芳基,更佳為氟原子或可經Z105取代之苯基,最佳為不存在(即、非取代)。 Z 101 is preferably a halogen atom or an aryl group having 6 to 20 carbon atoms which can be substituted by Z 105 , more preferably a fluorine atom or a phenyl group which can be substituted by Z 105 , and most preferably is absent (ie, non-substituted).

又,Z102較佳為鹵素原子或可經Z105取代之碳數6~20之烷基,更佳為氟原子或可經Z105取代之碳數1~10之烷基,最佳為不存在(即、非取代)。 In addition, Z 102 is preferably a halogen atom or an alkyl group having 6 to 20 carbon atoms which may be substituted with Z 105 , more preferably a fluorine atom or an alkyl group having 1 to 10 carbon atoms which may be substituted with Z 105 , and most preferably not Exists (ie, non-substituted).

此外,Z103較佳為鹵素原子、可經Z105取代之苯基、可經Z105取代之呋喃基、環氧基環己基、環氧丙氧基、甲基丙烯醯氧基、丙烯醯氧基、脲基、硫醇基、異氰酸酯基、胺基、可經Z105取代之苯基胺基或可經Z104取代之二苯基胺基,更佳為鹵素原子,又更佳為氟原子或不存在(亦即,非取代)。 Further, Z 103 is preferably a halogen atom, a phenyl group may be substituted by Z of 105, 105 may be substituted with Z of furanyl, epoxy cyclohexyl group, glycidoxy group, Bing Xixi methyl group, an oxygen Bing Xixi Group, urea group, thiol group, isocyanate group, amine group, phenylamino group which can be substituted by Z 105 or diphenylamino group which can be substituted by Z 104 , more preferably a halogen atom, and more preferably a fluorine atom Or does not exist (ie, non-substituted).

又,Z104較佳為鹵素原子、可經Z105取代之碳數1~20之烷基、可經Z105取代之呋喃基、環氧基環己 基、環氧丙氧基、甲基丙烯醯氧基、丙烯醯氧基、脲基、硫醇基、異氰酸酯基、胺基、可經Z105取代之苯基胺基或可經Z105取代之二苯基胺基,更佳為鹵素原子,又更佳為氟原子或不存在(亦即,非取代)。 And, Z 104 is preferably a halogen atom, an alkyl group may be substituted by Z 105 of 1 to 20 carbon atoms, the substituents Z may be the 105 furanyl, epoxy cyclohexyl group, glycidoxy group, methyl Bing Xixi group, Bing Xixi group, a ureido group, a thiol group, isocyanate group, amino group, Z may be a substituted phenyl group of 105 or 105 may be substituted with Z bis phenyl group, more preferably a halogen atom, Still more preferably, a fluorine atom is absent (ie, non-substituted).

此外,Z105較佳為鹵素原子,更佳為氟原子或不存在(即、非取代)。 Further, Z 105 is preferably a halogen atom, more preferably a fluorine atom or is absent (ie, non-substituted).

以下,列舉本發明可使用之有機矽烷化合物的具體例,但是不限於此等者。 Specific examples of the organosilane compound that can be used in the present invention are listed below, but are not limited thereto.

二烷氧基矽烷化合物的具體例,可舉例如二甲基二甲氧基矽烷、二甲基二乙氧基矽烷、甲基乙基二甲氧基矽烷、二乙基二甲氧基矽烷、二乙基二乙氧基矽烷、甲基丙基二甲氧基矽烷、甲基丙基二乙氧基矽烷、二異丙基二甲氧基矽烷、苯基甲基二甲氧基矽烷、乙烯基甲基二甲氧基矽烷、3-環氧丙氧基丙基甲基二甲氧基矽烷、3-環氧丙氧基丙基甲基二乙氧基矽烷、3-(3,4-環氧基環己基)乙基甲基二甲氧基矽烷、3-甲基丙烯醯氧基丙基甲基二甲氧基矽烷、3-甲基丙烯醯氧基丙基甲基二乙氧基矽烷、3-巰基丙基甲基二甲氧基矽烷、3-胺基丙基甲基二乙氧基矽烷、N-(2-胺基乙基)胺基丙基甲基二甲氧基矽烷、3,3,3-三氟丙基甲基二甲氧基矽烷等。 Specific examples of the dialkoxysilane compound include dimethyldimethoxysilane, dimethyldiethoxysilane, methylethyldimethoxysilane, diethyldimethoxysilane, Diethyldiethoxysilane, methylpropyldimethoxysilane, methylpropyldiethoxysilane, diisopropyldimethoxysilane, phenylmethyldimethoxysilane, ethylene Methylmethyldimethoxysilane, 3-glycidoxypropylmethyldimethoxysilane, 3-glycidoxypropylmethyldiethoxysilane, 3- (3,4- (Epoxycyclohexyl) ethylmethyldimethoxysilane, 3-methacryloxypropylmethyldimethoxysilane, 3-methacryloxypropylmethyldiethoxy Silane, 3-mercaptopropylmethyldimethoxysilane, 3-aminopropylmethyldiethoxysilane, N- (2-aminoethyl) aminopropylmethyldimethoxysilane , 3,3,3-trifluoropropylmethyldimethoxysilane.

三烷氧基矽烷化合物的具體例,可舉例如甲基三甲氧基矽烷、甲基三乙氧基矽烷、乙基三甲氧基矽烷、乙基三乙氧基矽烷、丙基三甲氧基矽烷、丙基三乙氧基矽烷、丁基三甲氧基矽烷、丁基三乙氧基矽烷、戊基三 甲氧基矽烷、戊基三乙氧基矽烷、庚基三甲氧基矽烷、庚基三乙氧基矽烷、辛基三甲氧基矽烷、辛基三乙氧基矽烷、十二烷基三甲氧基矽烷、十二烷基三乙氧基矽烷、十六基三甲氧基矽烷、十六基三乙氧基矽烷、十八烷基三甲氧基矽烷、十八烷基三乙氧基矽烷、苯基三甲氧基矽烷、苯基三乙氧基矽烷、乙烯基三甲氧基矽烷、乙烯基三乙氧基矽烷、3-胺基丙基三甲氧基矽烷、3-胺基丙基三乙氧基矽烷、3-環氧丙氧基丙基三甲氧基矽烷、3-環氧丙氧基丙基三乙氧基矽烷、3-甲基丙烯醯氧基丙基三甲氧基矽烷、3-甲基丙烯醯氧基丙基三乙氧基矽烷、三乙氧基(4-(三氟甲基)苯基)矽烷、十二烷基三乙氧基矽烷、3,3,3-三氟丙基三甲氧基矽烷、(三乙氧基矽烷基)環己烷、全氟辛基乙基三乙氧基矽烷、三乙氧基氟矽烷、十三氟-1,1,2,2-四氫辛基三乙氧基矽烷、五氟苯基三甲氧基矽烷、五氟苯基三乙氧基矽烷、3-(七氟異丙氧基)丙基三乙氧基矽烷、十七氟-1,1,2,2-四氫癸基三乙氧基矽烷、三乙氧基-2-噻吩基矽烷、3-(三乙氧基矽烷基)呋喃等。 Specific examples of the trialkoxysilane compound include, for example, methyltrimethoxysilane, methyltriethoxysilane, ethyltrimethoxysilane, ethyltriethoxysilane, propyltrimethoxysilane, Propyltriethoxysilane, butyltriethoxysilane, butyltriethoxysilane, pentyltriethoxysilane Methoxysilane, pentyltriethoxysilane, heptyltrimethoxysilane, heptyltriethoxysilane, octyltrimethoxysilane, octyltriethoxysilane, dodecyltrimethoxy Silane, dodecyltriethoxysilane, hexadecyltrimethoxysilane, hexadecyltriethoxysilane, octadecyltrimethoxysilane, octadecyltriethoxysilane, phenyl Trimethoxysilane, phenyltriethoxysilane, vinyltrimethoxysilane, vinyltriethoxysilane, 3-aminopropyltrimethoxysilane, 3-aminopropyltriethoxysilane , 3-glycidoxypropyltrimethoxysilane, 3-glycidoxypropyltriethoxysilane, 3-methacryloxypropyltrimethoxysilane, 3-methylpropylene Ethoxypropyltriethoxysilane, triethoxy (4- (trifluoromethyl) phenyl) silane, dodecyltriethoxysilane, 3,3,3-trifluoropropyltrimethyl Oxysilane, (triethoxysilyl) cyclohexane, perfluorooctylethyltriethoxysilane, triethoxyfluorosilane, tridecyl-1,1,2,2-tetrahydrooctyl Triethoxysilane, pentafluorophenyltris Oxysilane, pentafluorophenyltriethoxysilane, 3- (heptafluoroisopropoxy) propyltriethoxysilane, heptafluoro-1,1,2,2-tetrahydrodecyltriethyl Oxysilane, triethoxy-2-thienylsilane, 3- (triethoxysilyl) furan, and the like.

四烷氧基矽烷化合物的具體例,可舉例如四甲氧基矽烷、四乙氧基矽烷、四丙氧基矽烷等。 Specific examples of the tetraalkoxysilane compound include tetramethoxysilane, tetraethoxysilane, and tetrapropoxysilane.

此等之中,較佳為3,3,3-三氟丙基甲基二甲氧基矽烷、三乙氧基(4-(三氟甲基)苯基)矽烷、3,3,3-三氟丙基三甲氧基矽烷、全氟辛基乙基三乙氧基矽烷、五氟苯基三甲氧基矽烷、五氟苯基三乙氧基矽烷等。 Among these, 3,3,3-trifluoropropylmethyldimethoxysilane, triethoxy (4- (trifluoromethyl) phenyl) silane, and 3,3,3- Trifluoropropyltrimethoxysilane, perfluorooctylethyltriethoxysilane, pentafluorophenyltrimethoxysilane, pentafluorophenyltriethoxysilane, etc.

本發明之電荷輸送性清漆中之有機矽烷化合 物的含量係相對於電荷輸送性物質及摻雜物的總質量,通常為0.1~50質量%左右,但若考量抑制所得到之薄膜之電荷輸送性之降低,且提高對在電洞輸送層或發光層等之陽極相反側,以接觸電洞注入層方式予以層合之層的電洞注入能時,較佳為0.5~40質量%左右、更佳為0.8~30質量%左右、又更佳為1~20質量%左右。 Organic silane compound in the charge-transporting varnish of the present invention The content of the substance is generally about 0.1 to 50% by mass relative to the total mass of the charge-transporting substance and the dopant, but if the reduction of the charge-transporting property of the obtained thin film is considered to be suppressed, and the effect on the hole-transporting layer is improved When the hole injection energy of the layer laminated on the opposite side of the anode such as the light emitting layer and the hole injection layer is preferably about 0.5 to 40% by mass, more preferably about 0.8 to 30% by mass, and more It is preferably about 1 to 20% by mass.

本發明之電荷輸送性清漆中,在不妨礙本發明之效果的範圍內,也可使用公知之其他的摻雜物。 In the charge-transporting varnish of the present invention, other known dopants may be used as long as the effect of the present invention is not impaired.

其他的摻雜物,可舉出如苯磺酸、對甲苯磺酸(tosic acid)、p-苯乙烯磺酸、2-萘磺酸、4-羥基苯磺酸、5-磺基水楊酸(Sulfosalicylic Acid)、p-十二基苯磺酸、二己基苯磺酸、2,5-二己基苯磺酸、二丁基萘磺酸、6,7-二丁基-2-萘磺酸、十二基萘磺酸、3-十二基-2-萘磺酸、己基萘磺酸、4-己基-1-萘磺酸、辛基萘磺酸、2-辛基-1-萘磺酸、己基萘磺酸、7-己基-1-萘磺酸、6-己基-2-萘磺酸、二壬基萘磺酸、2,7-二壬基-4-萘磺酸、二壬基萘二磺酸、2,7-二壬基-4,5-萘二磺酸、國際公開第2005/000832號中記載之1,4-苯并二噁烷二磺酸化合物、國際公開第2006/025342號中記載之芳基磺酸化合物、國際公開第2009/096352號中記載之芳基磺酸化合物、聚苯乙烯磺酸等之芳基碸化合物;10-樟腦磺酸等之非芳基碸化合物等。 Other dopants include benzenesulfonic acid, tosic acid, p-styrenesulfonic acid, 2-naphthalenesulfonic acid, 4-hydroxybenzenesulfonic acid, 5-sulfosalicylic acid (Sulfosalicylic Acid), p-dodecylbenzenesulfonic acid, dihexylbenzenesulfonic acid, 2,5-dihexylbenzenesulfonic acid, dibutylnaphthalenesulfonic acid, 6,7-dibutyl-2-naphthalenesulfonic acid , Dodecylnaphthalenesulfonic acid, 3-dodecyl-2-naphthalenesulfonic acid, hexylnaphthalenesulfonic acid, 4-hexyl-1-naphthalenesulfonic acid, octylnaphthalenesulfonic acid, 2-octyl-1-naphthalenesulfonic acid Acid, hexylnaphthalenesulfonic acid, 7-hexyl-1-naphthalenesulfonic acid, 6-hexyl-2-naphthalenesulfonic acid, dinonylnaphthalenesulfonic acid, 2,7-dinonyl-4-naphthalenesulfonic acid, dinonyl Naphthalene disulfonic acid, 2,7-dinonyl-4,5-naphthalenedisulfonic acid, 1,4-benzodioxane disulfonic acid compound described in International Publication No. 2005/000832, International Publication No. Arylsulfonic acid compounds described in 2006/025342, arylsulfonic acid compounds described in International Publication No. 2009/096352, and arylfluorene compounds such as polystyrenesulfonic acid; non-aromatic compounds such as 10-camphorsulfonic acid Based compounds

[電荷輸送性材料] [Charge-transporting material]

本發明之電荷輸送性材料含有電荷輸送性物質、摻雜物及有機溶劑,上述摻雜物含有雜多酸與選自鹵化四氰基苯醌二甲烷及鹵化或氰化苯醌之至少1種、亦即選自鹵化四氰基苯醌二甲烷、鹵化苯醌及氰化苯醌之至少1種。這種電荷輸送性材料顯示對有機溶劑之良好的溶解性,如上述,藉由將該電荷輸送性材料溶解於有機溶劑中,可容易製造電荷輸送性清漆。 The charge-transporting material of the present invention contains a charge-transporting substance, a dopant, and an organic solvent. The dopant contains a heteropoly acid and at least one selected from the group consisting of a halogenated tetracyanobenzoquinone dimethane and a halogenated or cyanobenzoquinone. That is, at least one selected from the group consisting of halogenated tetracyanobenzoquinone dimethane, halogenated benzoquinone, and cyanobenzoquinone. Such a charge-transporting material exhibits good solubility in an organic solvent. As described above, by dissolving this charge-transporting material in an organic solvent, a charge-transporting varnish can be easily produced.

[電荷輸送性薄膜] [Charge Transporting Film]

將本發明之電荷輸送性清漆塗佈於基材上,進行燒成,可在基材上形成電荷輸送性薄膜。 The charge-transporting varnish of the present invention is applied to a substrate and fired to form a charge-transporting film on the substrate.

清漆之塗佈方法無特別限定,例如有浸漬法、旋轉塗佈法、轉印印刷法、輥塗法、刷毛塗佈、噴墨法、噴霧法等,配合塗佈方法調節清漆黏度及表面張力較佳。 The coating method of the varnish is not particularly limited. For example, there are a dipping method, a spin coating method, a transfer printing method, a roll coating method, a bristle coating method, an inkjet method, and a spray method. Better.

又,使用本發明之清漆時,燒成環境也無特別限定,不僅在大氣環境,即使在氮等之惰性氣體或真空中,也可得到具有均勻的成膜面及高的電荷輸送性的薄膜。 In addition, when the varnish of the present invention is used, the firing environment is not particularly limited, and a thin film having a uniform film-forming surface and a high charge-transporting property can be obtained not only in the atmospheric environment but also in an inert gas such as nitrogen or in a vacuum. .

本發明之清漆具有不僅在200℃以上之高溫度,也可以未達200℃之低溫進行燒成的特徵。燒成溫度考量取得之薄膜的用途、賦予所得之薄膜之電荷輸送性的程度、溶劑之種類等,可適宜設定在100℃以上未達250℃之範圍內者,但所得之薄膜作為有機EL元件之電洞 輸送層或電洞注入層使用時,較佳為130~245℃程度,更佳為140~240℃程度。 The varnish of the present invention has the feature that it can be fired not only at a high temperature of 200 ° C or higher, but also at a low temperature of less than 200 ° C. The application of the obtained film in consideration of the firing temperature, the degree of charge transport properties imparted to the obtained film, and the type of solvent can be appropriately set within a range of 100 ° C to 250 ° C, but the obtained film is used as an organic EL device. Electric hole When the transport layer or hole injection layer is used, the temperature is preferably about 130 to 245 ° C, and more preferably about 140 to 240 ° C.

又,燒成時,為了展現更高的均勻成膜性或使在基材上進行反應之目的,可施予2階段以上的溫度變化。加熱係使用例如加熱板或烤箱等適當的機器進行即可。 In addition, during firing, a temperature change of two or more stages may be applied for the purpose of exhibiting a higher uniform film-forming property or allowing a reaction to proceed on the substrate. The heating may be performed using a suitable device such as a hot plate or an oven.

電荷輸送性薄膜之膜厚並無特別限定,在有機EL元件內作為電洞注入層使用時,較佳為5~200nm。使膜厚變化的方法,例如有使清漆中之固體成分濃度變化,或使塗佈時之基板上的溶液量變化等的方法。 The film thickness of the charge-transporting thin film is not particularly limited. When it is used as a hole injection layer in an organic EL device, it is preferably 5 to 200 nm. The method of changing the film thickness includes, for example, a method of changing the solid content concentration in the varnish, or changing the amount of the solution on the substrate during coating.

本發明之電荷輸送性薄膜係使用上述本發明之電荷輸送性清漆所製造,因此,不僅電荷輸送性,且平坦性也優異者。 The charge-transporting film of the present invention is produced using the above-described charge-transporting varnish of the present invention. Therefore, it is not only a charge-transporting film but also a flatness.

[有機EL元件] [Organic EL element]

使用本發明之電荷輸送性清漆,製作OLED元件時之使用材料或製作方法,可舉出如下述者,但不限於此等。 Examples of the materials or manufacturing methods used in the production of OLED elements using the charge-transporting varnish of the present invention include the following, but are not limited thereto.

使用之電極基板,以預先藉由洗劑、醇、純水等之液體洗淨使其淨化為佳,例如陽極基板,在使用之前進行UV臭氧處理、氧-電漿處理等之表面處理為佳。但陽極材料以有機物為主成分時,亦可不施行表面處理。 The electrode substrate used is preferably cleaned by washing with liquid such as lotion, alcohol, pure water in advance. For example, the anode substrate is preferably surface treated with UV ozone treatment, oxygen-plasma treatment, etc. before use. . However, when the anode material is mainly composed of organic matter, the surface treatment may not be performed.

具有由本發明之電荷輸送性清漆而得之薄膜所構成的電洞注入層之OLED元件之製作方法例,如以下所示。 An example of a method for manufacturing an OLED device having a hole injection layer composed of a thin film obtained from the charge-transporting varnish of the present invention is shown below.

藉由上述方法,於陽極基板上塗佈本發明之電荷輸送性清漆,經燒成,在電極上製作電洞注入層。將此導入於真空蒸鍍裝置內,依序蒸鍍電洞輸送層、發光層、電子輸送層、電子輸送層/電洞阻隔層、電子注入層、陰極金屬,作成OLED元件。此外,因應必要亦可在發光層與電洞輸送層之間設置電子阻隔層。 According to the method described above, the charge-transporting varnish of the present invention is coated on the anode substrate, and a hole injection layer is formed on the electrode after firing. This was introduced into a vacuum evaporation device, and a hole transporting layer, a light emitting layer, an electron transporting layer, an electron transporting layer / hole blocking layer, an electron injection layer, and a cathode metal were sequentially vapor-deposited to form an OLED element. In addition, if necessary, an electron blocking layer may be provided between the light emitting layer and the hole transporting layer.

陽極材料可列舉如由銦錫氧化物(ITO)、銦鋅氧化物(IZO)所代表之透明電極或由鋁所代表之金屬或此等之合金等所構成之金屬陽極,較佳為進行平坦化處理者。亦可使用具有高電荷輸送性之聚噻吩衍生物或聚苯胺衍生物。 Examples of the anode material include metal anodes composed of transparent electrodes represented by indium tin oxide (ITO), indium zinc oxide (IZO), metals represented by aluminum, or alloys thereof, and the like is preferred.化 Processor. It is also possible to use a polythiophene derivative or a polyaniline derivative having a high charge-transporting property.

此外,構成金屬陽極之其他金屬,可列舉如鈧、鈦、釩、鉻、錳、鐵、鈷、鎳、銅、鋅、鎵、釔、鋯、鈮、鉬、釕、銠、鈀、鎘、銦、鈧、鑭、鈰、鐠、釹、鉅、釤、銪、釓、鋱、鏑、鈥、鉺、銩、鐿、鉿、鉈、鎢、錸、鋨、銥、鉑、金、鈦、鉛、鉍或此等之合金等,但不限於此等。 In addition, other metals constituting the metal anode include rhenium, titanium, vanadium, chromium, manganese, iron, cobalt, nickel, copper, zinc, gallium, yttrium, zirconium, niobium, molybdenum, ruthenium, rhodium, palladium, cadmium, Indium, thallium, lanthanum, cerium, praseodymium, neodymium, giant, thorium, thorium, thorium, thorium, thorium, ', thorium, thorium, thorium, thorium, thorium, tungsten, thallium, thallium, thallium, iridium, platinum, gold, titanium, Lead, bismuth, or the like, but not limited thereto.

形成電洞輸送層的材料,可列舉例如(三苯基胺)二聚物衍生物、[(三苯基胺)二聚物]螺二聚物、N,N’-雙(萘-1-基)-N,N’-雙(苯基)-聯苯胺(α-NPD)、N,N’-雙(萘-2-基)-N,N’-雙(苯基)-聯苯胺、N,N’-雙(3-甲基苯基)-N,N’-雙(苯基)-聯苯胺、N,N’-雙(3-甲基苯基)-N,N’-雙(苯基)-9,9-螺二茀、N,N’-雙(萘-1-基)-N,N’-雙(苯基)-9,9-螺二茀、N,N’-雙(3-甲基苯基)-N,N’-雙(苯基)-9,9-二甲基-茀、 N,N’-雙(萘-1-基)-N,N’-雙(苯基)-9,9-二甲基-茀、N,N’-雙(3-甲基苯基)-N,N’-雙(苯基)-9,9-二苯基-茀、N,N’-雙(萘-1-基)-N,N’-雙(苯基)-9,9-二苯基-茀、N,N’-雙(萘-1-基)-N,N’-雙(苯基)-2,2’-二甲基聯苯胺、2,2’,7,7’-四(N,N-二苯基胺基)-9,9-螺二茀、9,9-雙[4-(N,N-雙-聯苯基-4-基-胺基)苯基]-9H-茀、9,9-雙[4-(N,N-雙-萘-2-基-胺基)苯基]-9H-茀、9,9-雙[4-(N-萘-1-基-N-苯基胺基)-苯基]-9H-茀、2,2’,7,7’-四[N-萘基(苯基)-胺基]-9,9-螺二茀、N,N’-雙(菲-9-基)-N,N’-雙(苯基)-聯苯胺、2,2’-雙[N,N-雙(聯苯基-4-基)胺基]-9,9-螺二茀、2,2’-雙(N,N-二苯基胺基)-9,9-螺二茀、二-[4-(N,N-二(p-甲苯基)胺基)-苯基]環己烷、2,2’,7,7’-四(N,N-二(p-甲苯基)胺基)-9,9-螺二茀、N,N,N’,N’-四-萘-2-基-聯苯胺、N,N,N’,N’-四-(3-甲基苯基)-3,3’-二甲基聯苯胺、N,N’-二(萘基)-N,N’-二(萘-2-基)-聯苯胺、N,N,N’,N’-四(萘基)-聯苯胺、N,N’-二(萘-2-基)-N,N’-二苯基聯苯胺-1,4-二胺、N1,N4-二苯基-N1,N4-二(m-甲苯基)苯-1,4-二胺、N2,N2,N6,N6-四苯基萘-2,6-二胺、三(4-(喹啉-8-基)苯基)胺、2,2’-雙(3-(N,N-二(p-甲苯基)胺基)苯基)聯苯、4,4’,4”-三[3-甲基苯基(苯基)胺基]三苯基胺(m-MTDATA)、4,4’,4”-三[1-萘基(苯基)胺基]三苯基胺(1-TNATA)等之三芳基胺類、5,5”-雙-{4-[雙(4-甲基苯基)胺基]苯基}-2,2’:5’,2”-三聯噻吩(BMA-3T)等的寡噻吩類等。 Examples of the material forming the hole transport layer include (triphenylamine) dimer derivatives, [(triphenylamine) dimer] spiro dimers, and N, N'-bis (naphthalene-1- Group) -N, N'-bis (phenyl) -benzidine (α-NPD), N, N'-bis (naphthalene-2-yl) -N, N'-bis (phenyl) -benzidine, N, N'-bis (3-methylphenyl) -N, N'-bis (phenyl) -benzidine, N, N'-bis (3-methylphenyl) -N, N'-bis (Phenyl) -9,9-spirobifluorene, N, N'-bis (naphthalene-1-yl) -N, N'-bis (phenyl) -9,9-spirobifluorene, N, N ' -Bis (3-methylphenyl) -N, N'-bis (phenyl) -9,9-dimethyl-fluorene, N, N'-bis (naphthalene-1-yl) -N, N ' -Bis (phenyl) -9,9-dimethyl-fluorene, N, N'-bis (3-methylphenyl) -N, N'-bis (phenyl) -9,9-diphenyl -Fluorene, N, N'-bis (naphthalene-1-yl) -N, N'-bis (phenyl) -9,9-diphenyl-fluorene, N, N'-bis (naphthalene-1-yl) ) -N, N'-bis (phenyl) -2,2'-dimethylbenzidine, 2,2 ', 7,7'-tetra (N, N-diphenylamino) -9,9 -Spirobifluorene, 9,9-bis [4- (N, N-bis-biphenyl-4-yl-amino) phenyl] -9H-fluorene, 9,9-bis [4- (N, N-bis-naphthalene-2-yl-amino) phenyl] -9H-fluorene, 9,9-bis [4- (N-naphthalene-1-yl-N-phenylamino) -phenyl]- 9H-fluorene, 2,2 ', 7,7'-tetrakis [N-naphthyl (phenyl) -amino] -9,9-spirobifluorene, N, N'-bis (phenanthrene-9-yl) -N, N'-double ( ) -Benzidine, 2,2'-bis [N, N-bis (biphenyl-4-yl) amino] -9,9-spirobifluorene, 2,2'-bis (N, N- Diphenylamino) -9,9-spirobifluorene, di- [4- (N, N-bis (p-tolyl) amino) -phenyl] cyclohexane, 2,2 ', 7, 7'-tetrakis (N, N-bis (p-tolyl) amino) -9,9-spirobifluorene, N, N, N ', N'-tetra-naphthalen-2-yl-benzidine, N , N, N ', N'-tetra- (3-methylphenyl) -3,3'-dimethylbenzidine, N, N'-bis (naphthyl) -N, N'-bis (naphthalene -2-yl) -benzidine, N, N, N ', N'-tetrakis (naphthyl) -benzidine, N, N'-bis (naphthalene-2-yl) -N, N'-diphenyl Benzidine-1,4-diamine, N 1 , N 4 -diphenyl-N 1 , N 4 -bis (m-tolyl) benzene-1,4-diamine, N 2 , N 2 , N 6 , N 6 -tetraphenylnaphthalene-2,6-diamine, tris (4- (quinolin-8-yl) phenyl) amine, 2,2'-bis (3- (N, N-bis (p -Tolyl) amino) phenyl) biphenyl, 4,4 ', 4 "-tri [3-methylphenyl (phenyl) amino] triphenylamine (m-MTDATA), 4,4' Triarylamines such as 4,4 "-tri [1-naphthyl (phenyl) amino] triphenylamine (1-TNATA), 5,5" -bis- {4- [bis (4-methyl Phenyl) amino] phenyl} -2,2 ': 5', 2 "-triptythiophene (BMA-3T) and the like.

形成發光層之材料,可列舉如參(8-羥基喹啉) 鋁(III)(Alq3)、雙(8-羥基喹啉)鋅(II)(Znq2)、雙(2-甲基-8-羥基喹啉)-4-(p-苯基苯酚根)鋁(III)(BAlq)、4,4’-雙(2,2-二苯基乙烯基)聯苯、9,10-二(萘-2-基)蒽、2-t-丁基-9,10-二(萘-2-基)蒽、2,7-雙[9,9-二(4-甲基苯基)-茀-2-基]-9,9-二(4-甲基苯基)茀、2-甲基-9,10-雙(萘-2-基)蒽、2-(9,9-旋環雙茀-2-基)-9,9-旋環雙茀、2,7-雙(9,9-旋環雙茀-2-基)-9,9-旋環雙茀、2-[9,9-二(4-甲基苯基)-茀-2-基]-9,9-二(4-甲基苯基)茀、2,2’-二芘基-9,9-旋環雙茀、1,3,5-參(芘-1-基)苯、9,9-雙[4-(芘基)苯基]-9H-茀、2,2’-聯(9,10-二苯基蒽)、2,7-二芘基-9,9-旋環雙茀、1,4-二(芘-1-基)苯、1,3-二(芘-1-基)苯、6,13-二(聯苯-4-基)稠五苯、3,9-二(萘-2-基)苝、3,10-二(萘-2-基)苝、參[4-(芘基)-苯基]胺、10,10’-二(聯苯-4-基)-9,9’-雙蒽、N,N’-二(萘-1-基)-N,N’-二苯基-[1,1’:4’,1”:4”,1”’-四聯苯基]-4,4”’-二胺、4,4’-二[10-(萘-1-基)蒽-9-基]聯苯、二苯並{[f,f’]-4,4’,7,7’-四苯基}二茚基[1,2,3-cd:1’,2’,3’-1m]苝、1-(7-(9,9’-雙蒽-10-基)-9,9-二甲基-9H-茀-2-基)芘、1-(7-(9,9’-雙蒽-10-基)-9,9-二己基-9H-茀-2-基)芘、1,3-雙(咔唑-9-基)苯、1,3,5-參(咔唑-9-基)苯、4,4’,4”-參(咔唑-9-基)三苯基胺、4,4’-雙(咔唑-9-基)聯苯(CBP)、4,4’-雙(咔唑-9-基)-2,2’-二甲基聯苯、2,7-雙(咔唑-9-基)-9,9-二甲基茀、2,2’,7,7’-肆(咔唑-9-基)-9,9-旋環雙茀、2,7-雙(咔唑-9-基)-9,9-二(p-甲苯基)茀、9,9-雙[4-(咔唑-9-基)-苯基]茀、2,7-雙(咔唑-9-基)-9,9-旋環雙茀、1,4-雙(三苯基矽烷基)苯、1,3-雙(三苯 基矽烷基)苯、雙(4-N,N-二乙基胺基-2-甲基苯基)-4-甲基苯基甲烷、2,7-雙(咔唑-9-基)-9,9-二辛基茀、4,4”-二(三苯基矽烷基)-p-三聯苯、4,4’-二(三苯基矽烷基)聯苯、9-(4-t-丁基苯基)-3,6-雙(三苯基矽烷基)-9H-咔唑、9-(4-t-丁基苯基)-3,6-二(三苯甲基)-9H-咔唑、9-(4-t-丁基苯基)-3,6-雙(9-(4-甲氧基苯基)-9H-茀-9-基)-9H-咔唑、2,6-雙(3-(9H-咔唑-9-基)苯基)吡啶、三苯基(4-(9-苯基-9H-茀-9-基)苯基)矽烷、9,9-二甲基-N,N-二苯基-7-(4-(1-苯基-1H-苯並[d]咪唑-2-基)苯基)-9H-茀-2-胺、3,5-雙(3-(9H-咔唑-9-基)苯基)吡啶、9,9-旋環雙茀-2-基-二苯基-膦氧化物、9,9’-(5-(三苯基矽烷基)-1,3-伸苯基)雙(9H-咔唑)、3-(2,7-雙(二苯基磷醯基)-9-苯基-9H-茀-9-基)-9-苯基-9H-咔唑、4,4,8,8,12,12-六(p-甲苯基)-4H-8H-12H-12C-氮雜二苯並[cd,mn]芘、4,7-二(9H-咔唑-9-基)-1,10-啡啉、2,2’-雙(4-(咔唑-9-基)苯基)聯苯、2,8-雙(二苯基磷醯基)二苯並[b,d]噻吩、雙(2-甲基苯基)二苯基矽烷、雙[3,5-二(9H-咔唑-9-基)苯基]二苯基矽烷、3,6-雙(咔唑-9-基)-9-(2-乙基-己基)-9H-咔唑、3-(二苯基磷醯基)-9-(4-(二苯基磷醯基)苯基)-9H-咔唑、3,6-雙[(3,5-二苯基)苯基]-9-苯基咔唑等,且亦可藉由與發光性摻雜物共蒸鍍形成發光層。 Materials for forming the light-emitting layer include ginseng (8-hydroxyquinoline) aluminum (III) (Alq 3 ), bis (8-hydroxyquinoline) zinc (II) (Znq 2 ), and bis (2-methyl- 8-hydroxyquinoline) -4- (p-phenylphenolate) aluminum (III) (BAlq), 4,4'-bis (2,2-diphenylvinyl) biphenyl, 9,10-bis (Naphthalene-2-yl) anthracene, 2-t-butyl-9,10-bis (naphthalene-2-yl) anthracene, 2,7-bis [9,9-bis (4-methylphenyl)- Fluoren-2-yl] -9,9-bis (4-methylphenyl) fluorene, 2-methyl-9,10-bis (naphthalene-2-yl) anthracene, 2- (9,9-cyclocyclo Bis (fluoren-2-yl) -9,9-cyclocyclobifluorene, 2,7-bis (9,9-cyclocyclobifluoren-2-yl) -9,9-cyclocyclobifluorene, 2- (9 , 9-bis (4-methylphenyl) -fluoren-2-yl] -9,9-bis (4-methylphenyl) fluorene, 2,2'-difluorenyl-9,9-cyclo Bispyrene, 1,3,5-ginsyl (fluoren-1-yl) benzene, 9,9-bis [4- (fluorenyl) phenyl] -9H-fluorene, 2,2'-bi (9,10- (Diphenylanthracene), 2,7-difluorenyl-9,9-cyclobifluorene, 1,4-bis (fluoren-1-yl) benzene, 1,3-bis (fluoren-1-yl) benzene , 6,13-bis (biphenyl-4-yl) fused pentabenzene, 3,9-bis (naphthalene-2-yl) fluorene, 3,10-bis (naphthalene-2-yl) fluorene, reference [4- (Fluorenyl) -phenyl] amine, 10,10'-bis (biphenyl-4-yl) -9,9'-bisanthracene, N, N'-bis (naphthalene-1-yl) -N, N '-Diphenyl- [1,1': 4 ', 1 ”: 4”, 1 ”'-Tetraphenyl] -4,4” '-Di , 4,4'-bis [10- (naphthalene-1-yl) anthracene-9-yl] biphenyl, dibenzo {[f, f ']-4,4', 7,7'-tetraphenyl } Diindenyl [1,2,3-cd: 1 ', 2', 3'-1m] fluorene, 1- (7- (9,9'-bisanthracene-10-yl) -9,9-di Methyl-9H-fluoren-2-yl) fluorene, 1- (7- (9,9'-bisanthracene-10-yl) -9,9-dihexyl-9H-fluoren-2-yl) fluorene, 1 , 3-Bis (carbazole-9-yl) benzene, 1,3,5-gins (carbazole-9-yl) benzene, 4,4 ', 4 "-syn (carbazole-9-yl) tribenzene Amine, 4,4'-bis (carbazole-9-yl) biphenyl (CBP), 4,4'-bis (carbazole-9-yl) -2,2'-dimethylbiphenyl, 2 , 7-bis (carbazole-9-yl) -9,9-dimethylfluorene, 2,2 ', 7,7'-(carbazole-9-yl) -9,9-cyclobicyclofluorene , 2,7-bis (carbazole-9-yl) -9,9-bis (p-tolyl) fluorene, 9,9-bis [4- (carbazole-9-yl) -phenyl] fluorene, 2,7-bis (carbazol-9-yl) -9,9-cyclobifluorene, 1,4-bis (triphenylsilyl) benzene, 1,3-bis (triphenylsilyl) benzene Bis (4-N, N-diethylamino-2-methylphenyl) -4-methylphenylmethane, 2,7-bis (carbazole-9-yl) -9,9-di Octylfluorene, 4,4 "-bis (triphenylsilyl) -p-terphenyl, 4,4'-bis (triphenylsilyl) biphenyl, 9- (4-t-butylphenyl ) -3,6-bis (triphenylsilyl) -9H-carbazole, 9- (4-t-butylphenyl) -3,6-bis (trityl) -9H-carb Azole, 9- (4-t-butylphenyl) -3,6-bis (9- (4-methoxyphenyl) -9H-fluoren-9-yl) -9H-carbazole, 2,6 -Bis (3- (9H-carbazole-9-yl) phenyl) pyridine, triphenyl (4- (9-phenyl-9H-fluoren-9-yl) phenyl) silane, 9,9-di Methyl-N, N-diphenyl-7- (4- (1-phenyl-1H-benzo [d] imidazol-2-yl) phenyl) -9H-fluoren-2-amine, 3,5 -Bis (3- (9H-carbazole-9-yl) phenyl) pyridine, 9,9-cyclobifluoren-2-yl-diphenyl-phosphine oxide, 9,9 '-(5- ( Triphenylsilyl) -1,3-phenylene) bis (9H-carbazole), 3- (2,7-bis (diphenylphosphonium) -9-phenyl-9H-fluorene-9 -Yl) -9-phenyl-9H-carbazole, 4,4,8,8,12,12-hexa (p-tolyl) -4H-8H-12H-12C-azadibenzo [cd, mn) pyrene, 4,7-bis (9H-carbazole-9-yl) -1,10-morpholine, 2,2'-bis (4- (carbazole-9-yl) phenyl) biphenyl, 2,8-bis (diphenylphosphoranyl) dibenzo [b, d] thiophene, bis (2-methylphenyl) diphenylsilane, bis [3,5-bis (9H-carbazole- 9-yl) phenyl] diphenylsilane, 3,6-bis (carbazole-9-yl) -9- (2-ethyl-hexyl) -9H-carbazole, 3- (diphenylphosphonium ) -9- (4- (diphenylphosphonium) phenyl) -9H-carbazole, 3,6-bis [(3,5-diphenyl) phenyl] -9-phenylcarbazole Etc., and also by co- Plating a light emitting layer.

發光性摻雜物可列舉如3-(2-苯並噻唑基)-7-(二乙基胺基)香豆素、2,3,6,7-四氫-1,1,7,7-四甲基-1H,5H,11H-10-(2-苯並噻唑基)喹嗪并(quinolizino)[9,9a,1gh]香豆素、喹吖啶酮、N,N’-二甲基-喹吖啶酮、三 (2-苯基吡啶)銥(III)(Ir(ppy)3)、雙(2-苯基吡啶)(乙醯丙酮)(Acetylacetonate)銥(III)(Ir(ppy)2(acac))、三[2-(p-甲苯基)吡啶]銥(III)(Ir(mppy)3)、9,10-雙[N,N-二(p-甲苯基)胺基]蒽、9,10-雙[苯基(m-甲苯基)胺基]蒽、雙[2-(2-羥基苯基)苯並噻唑(thiazolato)]鋅(II)、N10,N10,N10,N10-四(p-甲苯基)-9,9’-聯蒽(bianthracene)-10,10’-二胺、N10,N10,N10,N10-四苯基-9,9’-聯蒽-10,10’-二胺、N10,N10-二苯基-N10,N10-二萘基-9,9’-聯蒽-10,10’-二胺、4,4’-雙(9-乙基-3-咔唑伸乙烯基)-1,1’-聯苯、苝、2,5,8,11-四-t-丁基苝、1,4-雙[2-(3-N-乙基咔唑基)乙烯基]苯、4,4’-雙[4-(二-p-甲苯基胺基)苯乙烯基]聯苯、4-(二-p-甲苯基胺基)-4’-[(二-p-甲苯基胺基)苯乙烯基]茋、雙[3,5-二氟-2-(2-吡啶基)苯基-(2-羧基吡啶基)]銥(III)、4,4’-雙[4-(二苯基胺基)苯乙烯基]聯苯、雙(2,4-二氟苯基吡啶)四(1-吡唑基)硼酸酯銥(III)、N,N’-雙(萘-2-基)-N,N’-雙(苯基)-三(9,9-二甲基伸茀基)、2,7-雙{2-[苯基(m-甲苯基)胺基]-9,9-二甲基-茀-7-基}-9,9-二甲基-茀、N-(4-((E)-2-(6((E)-4-(二苯基胺基)苯乙烯基)萘-2-基)乙烯基)苯基)-N-苯基苯胺、fac-銥(III)參(1-苯基-3-甲基苯並咪唑啉-2-亞基-C,C2)、mer-銥(III)參(1-苯基-3-甲基苯並咪唑啉-2-亞基-C,C2)、2,7-雙[4-(二苯基胺基)苯乙烯基]-9,9-旋環二茀、6-甲基-2-(4-(9-(4-(6-甲基苯並[d]噻唑-2-基)苯基)蒽-10-基)苯基)苯並[d]噻唑、1,4-二[4-(N,N-二苯基)胺基]苯乙烯基苯、1,4-雙(4-(9H-咔唑-9-基)苯乙烯基)苯、(E)-6-(4-(二苯基胺基)苯乙烯基)- N,N-二苯基萘-2-胺、雙(2,4-二氟苯基吡啶)(5-(吡啶-2-基)-1H-四唑)銥(III)、雙(3-三氟甲基-5-(2-吡啶基)吡唑)((2,4-二氟苄基)二苯基亞膦酸酯)銥(III)、雙(3-三氟甲基-5-(2-吡啶基)吡唑)(苄基二苯基亞膦酸酯)銥(III)、雙(1-(2,4-二氟苄基)-3-甲基苯並咪唑鎓)(3-(三氟甲基)-5-(2-吡啶基)-1,2,4-三唑)銥(III)、雙(3-三氟甲基-5-(2-吡啶基)吡唑)(4’,6’-二氟苯基吡啶酯)銥(III)、雙(4’,6’-二氟苯基吡啶)(3,5-雙(三氟甲基)-2-(2’-吡啶基)吡咯)銥(III)、雙(4’,6’-二氟苯基吡啶)(3-(三氟甲基)-5-(2-吡啶基)-1,2,4-三唑)銥(III)、(Z)-6-三甲苯基-N-(6-三甲苯基(Mesityl)喹啉-2(1H)-亞基)喹啉-2-胺-BF2、(E)-2-(2-(4-(二甲基胺基)苯乙烯基)-6-甲基-4H-吡喃-4-亞基)丙二腈、4-(二氰基亞甲基)-2-甲基-6-久洛尼定基-9-烯基-4H-吡喃、4-(二氰基亞甲基)-2-甲基-6-(1,1,7,7-四甲基久洛尼定基-9-烯基)-4H-吡喃、4-(二氰基亞甲基)-2-t-丁基-6-(1,1,7,7-四甲基久洛尼定-4-基-乙烯基)-4H-吡喃、三(二苯甲醯基甲烷)菲繞啉銪(III)、5,6,11,12-四苯基並四苯、雙(2-苯並[b]噻吩-2-基-吡啶)(乙醯丙酮)銥(III)、三(1-苯基異喹啉)銥(III)、雙(1-苯基異喹啉)(乙醯丙酮)銥(III)、雙[1-(9,9-二甲基-9H-茀-2-基)-異喹啉](乙醯丙酮)銥(III)、雙[2-(9,9-二甲基-9H-茀-2-基)喹啉](乙醯丙酮)銥(III)、三[4,4’-二-t-丁基-(2,2’)-二吡啶]釕(III).雙(六氟磷酸酯)、三(2-苯基喹啉)銥(III)、雙(2-苯基喹啉)(乙醯丙酮)銥(III)、2,8-二-t-丁基-5,11-雙(4-t-丁基苯基)-6,12-二苯基並四苯(tetracene)、雙(2-苯基苯 並噻唑)(乙醯丙酮)銥(III)、5,10,15,20-四苯基四苯並卟啉白金、鋨(II)雙(3-三氟甲基-5-(2-吡啶)-吡唑)二甲基苯基膦、鋨(II)雙(3-(三氟甲基)-5-(4-t-丁基吡啶基)-1,2,4-三唑)二苯基甲基膦、鋨(II)雙(3-(三氟甲基)-5-(2-吡啶基)-1,2,4-三唑)二甲基苯基膦、鋨(II)雙(3-(三氟甲基)-5-(4-t-丁基吡啶基)-1,2,4-三唑)二甲基苯基膦、雙[2-(4-n-己基苯基)喹啉](乙醯丙酮)銥(III)、三[2-(4-n-己基苯基)喹啉]銥(III)、三[2-苯基-4-甲基喹啉]銥(III)、雙(2-苯基喹啉)(2-(3-甲基苯基)吡啶酯)銥(III)、雙(2-(9,9-二乙基-茀-2-基)-1-苯基-1H-苯並[d]咪唑(imidazolato))(乙醯丙酮)銥(III)、雙(2-苯基吡啶)(3-(吡啶-2-基)-2H-色烯-2-歐尼(onate))銥(III)、雙(2-苯基喹啉)(2,2,6,6-四甲基庚烷-3,5-二歐尼)銥(III)、雙(苯基異喹啉)(2,2,6,6-四甲基庚烷-3,5-二歐尼)銥(III)、銥(III)雙(4-苯基噻吩并[3,2-c]吡啶-N,C2)乙醯丙酮、(E)-2-(2-t-丁基-6-(2-(2,6,6-三甲基-2,4,5,6-四氫-1H-吡咯并[3,2,1-ij]喹啉-8-基)乙烯基)-4H-吡喃-4-亞基)丙二腈、雙(3-三氟甲基-5-(1-異喹啉基)吡唑)(甲基二苯基膦)釕、雙[(4-n-己基苯基)異喹啉](乙醯丙酮)銥(III)、白金(II)八乙基卟吩、雙(2-甲基二苯並[f,h]喹喔啉)(乙醯丙酮)銥(III)、三[(4-n-己基苯基)羥基喹啉]銥(III)等。 Examples of the light-emitting dopant include 3- (2-benzothiazolyl) -7- (diethylamino) coumarin, 2,3,6,7-tetrahydro-1,1,7,7 -Tetramethyl-1H, 5H, 11H-10- (2-benzothiazolyl) quinazino (9,9a, 1gh) coumarin, quinacridone, N, N'-dimethyl -Quinacridone, tris (2-phenylpyridine) iridium (III) (Ir (ppy) 3 ), bis (2-phenylpyridine) (acetylacetonate) iridium (III) (Ir ( ppy) 2 (acac)), tris [2- (p-tolyl) pyridine] iridium (III) (Ir (mppy) 3 ), 9,10-bis [N, N-bis (p-tolyl) amine Yl] anthracene, 9,10-bis [phenyl (m-tolyl) amino] anthracene, bis [2- (2-hydroxyphenyl) thiazolato] zinc (II), N 10 , N 10 , N 10 , N 10 -tetra (p-tolyl) -9,9'-bianthracene-10,10'-diamine, N 10 , N 10 , N 10 , N 10 -tetraphenyl -9,9'-bianthracene-10,10'-diamine, N 10 , N 10 -diphenyl-N 10 , N 10 -dinaphthyl-9,9'-bianthryl-10,10'- Diamine, 4,4'-bis (9-ethyl-3-carbazole vinylidene) -1,1'-biphenyl, fluorene, 2,5,8,11-tetra-t-butylfluorene, 1,4-bis [2- (3-N-ethylcarbazolyl) vinyl] benzene, 4,4'-bis [4- (di-p-tolylamino) styryl] biphenyl, 4- (di-p-tolylamino) -4 '-[(di-p-toluene Amine) styryl] fluorene, bis [3,5-difluoro-2- (2-pyridyl) phenyl- (2-carboxypyridyl)] iridium (III), 4,4'-bis [4 -(Diphenylamino) styryl] biphenyl, bis (2,4-difluorophenylpyridine) tetra (1-pyrazolyl) borate iridium (III), N, N'-bis ( Naphthalene-2-yl) -N, N'-bis (phenyl) -tris (9,9-dimethylarylene), 2,7-bis {2- [phenyl (m-tolyl) amine Yl] -9,9-dimethyl-fluoren-7-yl} -9,9-dimethyl-fluorene, N- (4-((E) -2- (6 ((E) -4- ( Diphenylamino) styryl) naphthalene-2-yl) vinyl) phenyl) -N-phenylaniline, fac-iridium (III), (1-phenyl-3-methylbenzimidazoline) -2-Subunit-C, C 2 ), mer-iridium (III) ginseng (1-phenyl-3-methylbenzimidazoline-2-subunit-C, C 2 ), 2,7-bis [4- (diphenylamino) styryl] -9,9-cyclodifluorene, 6-methyl-2- (4- (9- (4- (6-methylbenzo [d] Thiazol-2-yl) phenyl) anthracene-10-yl) phenyl) benzo [d] thiazole, 1,4-bis [4- (N, N-diphenyl) amino] styrylbenzene, 1,4-bis (4- (9H-carbazole-9-yl) styryl) benzene, (E) -6- (4- (diphenylamino) styryl) -N, N-di Phenylnaphthalene-2-amine, bis (2,4-difluorophenylpyridine) (5- (pyridin-2-yl) -1H-tetrazole) iridium (III), bis (3-trifluoromethyl- 5- (2-pyridine (Yl) pyrazole) ((2,4-difluorobenzyl) diphenylphosphinate) iridium (III), bis (3-trifluoromethyl-5- (2-pyridyl) pyrazole) ( Benzyl diphenyl phosphinate) iridium (III), bis (1- (2,4-difluorobenzyl) -3-methylbenzimidazolium) (3- (trifluoromethyl) -5 -(2-pyridyl) -1,2,4-triazole) iridium (III), bis (3-trifluoromethyl-5- (2-pyridyl) pyrazole) (4 ', 6'-di Fluorophenylpyridine ester) iridium (III), bis (4 ', 6'-difluorophenylpyridine) (3,5-bis (trifluoromethyl) -2- (2'-pyridyl) pyrrole) iridium (III), bis (4 ', 6'-difluorophenylpyridine) (3- (trifluoromethyl) -5- (2-pyridyl) -1,2,4-triazole) iridium (III) (Z) -6-Trisyl-N- (6-trisyl (Mesityl) quinoline-2 (1H) -subunit) quinoline-2-amine-BF 2 , (E) -2- ( 2- (4- (dimethylamino) styryl) -6-methyl-4H-pyran-4-ylidene) malononitrile, 4- (dicyanomethylene) -2-methyl -6-giuronidin-9-alkenyl-4H-pyran, 4- (dicyanomethylene) -2-methyl-6- (1,1,7,7-tetramethyljiu Lonidinyl-9-alkenyl) -4H-pyran, 4- (dicyanomethylene) -2-t-butyl-6- (1,1,7,7-tetramethyljurone N-A-4-yl-vinyl) -4H-pyran, tris (dibenzylidenemethane) phenanthroline hydrazone (III), 5,6,11,12-tetraphenyl Tetrabenzene, bis (2-benzo [b] thiophen-2-yl-pyridine) (acetamidineacetone) iridium (III), tris (1-phenylisoquinoline) iridium (III), bis (1-benzene Isoquinoline) (Ethylacetone) Iridium (III), Bis [1- (9,9-dimethyl-9H-fluoren-2-yl) -isoquinoline] (Ethylacetone) Iridium (III) , Bis [2- (9,9-dimethyl-9H-fluoren-2-yl) quinoline] (acetamidineacetone) iridium (III), tris [4,4'-di-t-butyl- ( 2,2 ')-dipyridine] ruthenium (III). Bis (hexafluorophosphate), tris (2-phenylquinoline) iridium (III), bis (2-phenylquinoline) (acetamidineacetone) iridium (III), 2,8-di-t-butyl -5,11-bis (4-t-butylphenyl) -6,12-diphenyltetrane (tetracene), bis (2-phenylbenzothiazole) (ethylacetoacetone) iridium (III ), 5,10,15,20-tetraphenyltetrabenzoporphyrin platinum, pyrene (II) bis (3-trifluoromethyl-5- (2-pyridine) -pyrazole) dimethylphenylphosphine锇 (II) bis (3- (trifluoromethyl) -5- (4-t-butylpyridyl) -1,2,4-triazole) diphenylmethylphosphine, 锇 (II) bis (3- (trifluoromethyl) -5- (2-pyridyl) -1,2,4-triazole) dimethylphenylphosphine, fluorene (II) bis (3- (trifluoromethyl)- 5- (4-t-butylpyridyl) -1,2,4-triazole) dimethylphenylphosphine, bis [2- (4-n-hexylphenyl) quinoline] (acetamidine) Iridium (III), tris [2- (4-n-hexylphenyl) quinoline] iridium (III), tris [2-phenyl-4-methylquinoline] iridium (III), bis (2-benzene Quinoline) (2- (3-methylphenyl) pyridine ester) iridium (III), bis (2- (9,9-diethyl-fluoren-2-yl) -1-phenyl-1H- Benzo [d] imidazolato) (Ethylacetone) Iridium (III), Bis (2-phenylpyridine) (3- (pyridin-2-yl) -2H-chromene-2-onine (onate )) Iridium (III), bis (2-phenylquinoline) (2,2,6,6-tetramethylheptane -3,5-dionitri) iridium (III), bis (phenylisoquinoline) (2,2,6,6-tetramethylheptane-3,5-dionitri) iridium (III), Iridium (III) bis (4-phenylthieno [3,2-c] pyridine-N, C 2 ) acetamidineacetone, (E) -2- (2-t-butyl-6- (2- ( 2,6,6-trimethyl-2,4,5,6-tetrahydro-1H-pyrrolo [3,2,1-ij] quinolin-8-yl) vinyl) -4H-pyran- 4-Subunit) malononitrile, bis (3-trifluoromethyl-5- (1-isoquinolinyl) pyrazole) (methyldiphenylphosphine) ruthenium, bis [(4-n-hexylbenzene Base) isoquinoline] (acetamidineacetone) iridium (III), platinum (II) octaethylporphine, bis (2-methyldibenzo [f, h] quinoxaline) (acetamidineacetone) iridium (III), tris [(4-n-hexylphenyl) hydroxyquinoline] iridium (III), and the like.

形成電子輸送層/電洞阻隔層的材料,可列舉例如8-羥基喹啉-鋰、2,2’,2”-(1,3,5-苄基甲苯基)-三(1-苯基-1-H-苯並咪唑)、2-(4-聯苯基)5-(4-t-丁基苯基)-1,3,4-噁二唑、2,9-二甲基-4,7-二苯基-1,10-菲繞啉、4,7-二苯基- 1,10-菲繞啉、雙(2-甲基-8-喹啉)-4-(苯基苯酚(phenolato))鋁、1,3-雙[2-(2,2’-二吡啶-6-基)-1,3,4-噁二唑-5-基]苯、6,6’-雙[5-(聯苯-4-基)-1,3,4-噁二唑-2-基]-2,2’-二吡啶、3-(4-聯苯基)-4-苯基-5-t-丁基苯基-1,2,4-三唑、4-(萘-1-基)-3,5-二苯基-4H-1,2,4-三唑、2,9-雙(萘-2-基)-4,7-二苯基-1,10-菲繞啉、2,7-雙[2-(2,2’-二吡啶-6-基)-1,3,4-噁二唑-5-基]-9,9-二甲基茀、1,3-雙[2-(4-t-丁基苯基)-1,3,4-噁二唑-5-基]苯、三(2,4,6-三甲基-3-(吡啶-3-基)苯基)硼烷、1-甲基-2-(4-(萘-2-基)苯基)-1H-咪唑[4,5f][1,10]菲繞啉、2-(萘-2-基)-4,7-二苯基-1,10-菲繞啉、苯基-二芘基膦氧化物、3,3’,5,5’-四[(m-吡啶基)-苯-3-基]聯苯、1,3,5-三[(3-吡啶基)-苯-3-基]苯、4,4’-雙(4,6-二苯基-1,3,5-三嗪-2-基)聯苯、1,3-雙[3,5-二(吡啶-3-基)苯基]苯、雙(10-羥基苯並[h]喹啉)鈹、二苯基雙(4-(吡啶-3-基)苯基)矽烷、3,5-二(芘-1-基)吡啶等。 Examples of the material forming the electron transporting layer / hole blocking layer include 8-hydroxyquinoline-lithium, 2,2 ', 2 "-(1,3,5-benzyltolyl) -tris (1-phenyl) -1-H-benzimidazole), 2- (4-biphenyl) 5- (4-t-butylphenyl) -1,3,4-oxadiazole, 2,9-dimethyl- 4,7-diphenyl-1,10-phenanthroline, 4,7-diphenyl- 1,10-phenanthroline, bis (2-methyl-8-quinoline) -4- (phenylphenol) aluminum, 1,3-bis [2- (2,2'-dipyridine- 6-yl) -1,3,4-oxadiazol-5-yl] benzene, 6,6'-bis [5- (biphenyl-4-yl) -1,3,4-oxadiazole-2 -Yl] -2,2'-dipyridine, 3- (4-biphenyl) -4-phenyl-5-t-butylphenyl-1,2,4-triazole, 4- (naphthalene- 1-yl) -3,5-diphenyl-4H-1,2,4-triazole, 2,9-bis (naphthalene-2-yl) -4,7-diphenyl-1,10-phenanthrene Ringoline, 2,7-bis [2- (2,2'-dipyridin-6-yl) -1,3,4-oxadiazol-5-yl] -9,9-dimethylfluorene, 1 , 3-bis [2- (4-t-butylphenyl) -1,3,4-oxadiazol-5-yl] benzene, tris (2,4,6-trimethyl-3- (pyridine -3-yl) phenyl) borane, 1-methyl-2- (4- (naphthalene-2-yl) phenyl) -1H-imidazole [4,5f] [1,10] phenanthroline, 2 -(Naphthalene-2-yl) -4,7-diphenyl-1,10-phenanthroline, phenyl-diamidinophosphine oxide, 3,3 ', 5,5'-tetra [(m- Pyridyl) -phenyl-3-yl] biphenyl, 1,3,5-tri [(3-pyridyl) -phenyl-3-yl] benzene, 4,4'-bis (4,6-diphenyl -1,3,5-triazin-2-yl) biphenyl, 1,3-bis [3,5-bis (pyridin-3-yl) phenyl] benzene, bis (10-hydroxybenzo [h] Quinoline) beryllium, diphenylbis (4- (pyridin-3-yl) phenyl) silane, 3,5-bis (fluoren-1-yl) pyridine, and the like.

形成電子注入層的材料,可列舉出如氧化鋰(Li2O)、氧化鎂(MgO)、氧化鋁(Al2O3)、氟化鋰(LiF)、氟化鈉(NaF)、氟化鎂(MgF2)、氟化銫(CsF)、氟化鍶(SrF2)、三氧化鉬(MoO3)、鋁、Li(acac)、乙酸鋰、苯甲酸鋰等。 Examples of the material for forming the electron injection layer include lithium oxide (Li 2 O), magnesium oxide (MgO), aluminum oxide (Al 2 O 3 ), lithium fluoride (LiF), sodium fluoride (NaF), and fluoride Magnesium (MgF 2 ), cesium fluoride (CsF), strontium fluoride (SrF 2 ), molybdenum trioxide (MoO 3 ), aluminum, Li (acac), lithium acetate, lithium benzoate, and the like.

陰極材料,可列舉出如鋁、鎂-銀合金、鋁-鋰合金、鋰、鈉、鉀、銫等。 Examples of the cathode material include aluminum, magnesium-silver alloy, aluminum-lithium alloy, lithium, sodium, potassium, and cesium.

形成電子阻隔層的材料,可列舉出如三(苯基吡唑)銥等。 Examples of the material forming the electron blocking layer include tris (phenylpyrazole) iridium.

使用本發明之電荷輸送性清漆之PLED元件的製作方法,無特別限定,可舉出如以下的方法。 The method for producing the PLED element using the charge-transporting varnish of the present invention is not particularly limited, and examples thereof include the following methods.

在上述OLED元件製作中,取代進行電洞輸送層、發光層、電子輸送層、電子注入層之真空蒸鍍操作,而藉由依序形成電洞輸送性高分子層、發光性高分子層,可製作具有以本發明之電荷輸送性清漆形成之電荷輸送性薄膜的PLED元件。 In the above-mentioned OLED device manufacturing, instead of performing a vacuum evaporation operation of a hole transporting layer, a light emitting layer, an electron transporting layer, and an electron injection layer, by sequentially forming a hole transporting polymer layer and a light emitting polymer layer, A PLED element having a charge-transporting film formed of the charge-transporting varnish of the present invention is produced.

具體而言,於陽極基板上塗佈本發明之電荷輸送性清漆,藉由上述方法製作電洞注入層,於其上依序形成電洞輸送性高分子層、發光性高分子層,並再蒸鍍陰極電極而作成PLED元件。 Specifically, an anode substrate is coated with the charge-transporting varnish of the present invention, a hole injection layer is prepared by the above method, and a hole-transporting polymer layer and a light-emitting polymer layer are sequentially formed thereon, and then A cathode electrode was evaporated to form a PLED element.

使用之陰極及陽極材料,可使用與上述OLED元件製作時相同者,並能進行相同的洗淨處理、表面處理。 The cathode and anode materials used can be the same as those used in the production of the above OLED elements, and can perform the same cleaning treatment and surface treatment.

電洞輸送性高分子層及發光性高分子層之形成法,可列舉例如對電洞輸送性高分子材料或發光性高分子材料、或對此等添加摻雜物之材料加入溶劑使其溶解,或均勻分散,而塗佈於電洞注入層或電洞輸送性高分子層上後,分別進行燒成而成膜的方法。 Methods for forming the hole-transporting polymer layer and the light-emitting polymer layer include, for example, adding a solvent to the hole-transporting polymer material or the light-emitting polymer material, or adding a dopant to the solvent to dissolve the material. Or a method of uniformly dispersing and coating on a hole injection layer or a hole-transporting polymer layer, and then firing to form a film.

電洞輸送性高分子材料,可舉出如聚[(9,9-二己基茀-2,7-二基)-co-(N,N’-雙{p-丁基苯基]-1,4-二胺基亞苯)]、聚[(9,9-二辛基茀-2,7-二基)-co-(N,N’-雙{p-丁基苯基}-1,1’-亞聯苯-4,4-二胺)]、聚[(9,9-雙{1’-戊烯-5’-基}茀-2,7-二基)-co-(N,N’-雙{p-丁基苯基]-1,4-二胺基亞苯)]、 以聚倍半矽氧烷封端之聚[N,N’-雙(4-丁基苯基)-N,N’-雙(苯基)-聯苯胺]、聚[(9,9-貳二辛基茀-2,7-二基)-co-(4,4’-(N-(p-丁基苯基))二苯基胺)]等。 Examples of hole-transporting polymer materials include poly [(9,9-dihexylfluorene-2,7-diyl) -co- (N, N'-bis {p-butylphenyl] -1 , 4-diaminophenylene)], poly [(9,9-dioctylfluorene-2,7-diyl) -co- (N, N'-bis {p-butylphenyl} -1 , 1'-biphenylene-4,4-diamine)], poly [(9,9-bis {1'-pentene-5'-yl} fluorene-2,7-diyl) -co- ( N, N'-bis {p-butylphenyl] -1,4-diaminophenylene)], Poly [N, N'-bis (4-butylphenyl) -N, N'-bis (phenyl) -benzidine], poly [(9,9- 贰) Dioctylfluorene-2,7-diyl) -co- (4,4 '-(N- (p-butylphenyl)) diphenylamine)] and the like.

發光性高分子材料,例如有聚(9,9-二烷基茀)(PDAF)等之聚茀衍生物、聚(2-甲氧基-5-(2’-乙基己氧基)-1,4-伸苯基伸乙烯基)(MEH-PPV)等之聚伸苯基伸乙烯基衍生物、聚(3-烷基噻吩)(PAT)等的聚噻吩衍生物、聚乙烯基咔唑(PVCz)等。 Light-emitting polymer materials include, for example, polyfluorene derivatives such as poly (9,9-dialkylfluorene) (PDAF), and poly (2-methoxy-5- (2'-ethylhexyloxy)- Polyphenylene vinylene derivatives such as 1,4-phenylene vinylene (MEH-PPV), polythiophene derivatives such as poly (3-alkylthiophene) (PAT), polyvinylcarbazole ( PVCz) and so on.

溶劑可列舉例如甲苯、二甲苯、氯仿等。溶解或均勻分散法,可列舉例如攪拌、加熱攪拌、超音波分散等的方法。 Examples of the solvent include toluene, xylene, and chloroform. Examples of the dissolution or uniform dispersion method include methods such as stirring, heating and stirring, and ultrasonic dispersion.

塗佈方法無特別限定,可列舉例如噴墨法、噴霧法、浸漬法、旋轉塗佈法、轉印印刷法、輥塗法、刷毛塗佈等。又,塗佈係在氮、氬等的惰性氣體下進行為佳。 The coating method is not particularly limited, and examples thereof include an inkjet method, a spray method, a dipping method, a spin coating method, a transfer printing method, a roll coating method, and a bristle coating method. The coating is preferably performed under an inert gas such as nitrogen or argon.

燒成方法可列舉例如在惰性氣體下或真空中,以烤箱或加熱板進行加熱的方法。 Examples of the firing method include a method of heating in an oven or a hot plate under an inert gas or in a vacuum.

[實施例] [Example]

以下,舉合成例、實施例及比較例,更具體說明本發明,但本發明不限於下述實施例。又,使用之裝置如下。 Hereinafter, the present invention will be described more specifically with reference to Synthesis Examples, Examples, and Comparative Examples, but the present invention is not limited to the following Examples. The equipment used is as follows.

(1)基板洗淨:長州產業(股)製 基板洗淨裝置(減壓電 漿方式) (1) Substrate cleaning: substrate cleaning equipment (reduced voltage Pulp method)

(2)清漆之塗佈:Mikasa(股)製 旋轉塗佈機MS-A100 (2) Coating of varnish: Mikasa's spin coater MS-A100

(3)膜厚測定:(股)小坂研究所製 微細形狀測定機SurfcorderET-4000 (3) Measurement of film thickness: Surfcorder ET-4000, a micro shape measuring machine manufactured by Kosaka Laboratory

(4)EL元件之製作:長州產業(股)製 多機能蒸鍍裝置系統C-E2L1G1-N (4) Production of EL elements: Multi-function vapor deposition system C-E2L1G1-N made by Changzhou Industry Co., Ltd.

(5)EL元件之亮度等的測定:(有)Tech world製I-V-L測定系統 (5) Measurement of EL element brightness, etc .: (with) I-V-L measurement system made by Tech world

(6)EL元件之壽命測量(耐久性評價):(股)E etch Sea製 有機EL亮度壽命評價系統PEL-105S (6) Lifetime measurement (durability evaluation) of EL element: Organic EL brightness life evaluation system PEL-105S made by Eetch Sea

(7)NMR測量:日本電子(股)製JNM-ECX300 FT NMR SYSTEM (7) NMR measurement: JNM-ECX300 FT NMR SYSTEM manufactured by Japan Electronics Co., Ltd.

(8)MS測量:Bruker(股)製autoflex III smartbem (8) MS measurement: Bruker (stock) autoflex III smartbem

[合成例1]噻吩衍生物2之合成 [Synthesis Example 1] Synthesis of thiophene derivative 2

藉由以下方法合成式(X1)表示之噻吩衍生物2(TP2)。 The thiophene derivative 2 (TP2) represented by the formula (X1) was synthesized by the following method.

在燒瓶內置入2,3-二氫噻吩并[3,4-b][1,4]戴 奧辛2.0g及四氫呋喃150mL,進行氮取代後,冷卻至-78℃。其中滴下正丁基鋰之正己烷溶液10mL(濃度1.64mol/L)後,-78℃下攪拌30分鐘,接著昇溫至-40℃,滴下三丁基氯錫烷5mL後,昇溫至室溫再攪拌16小時。 Put 2,3-dihydrothieno [3,4-b] [1,4] in the flask 2.0 g of aoxin and 150 mL of tetrahydrofuran were nitrogen-substituted and then cooled to -78 ° C. Among them, 10 mL of n-butyl lithium n-hexane solution (concentration 1.64 mol / L) was dropped, followed by stirring at -78 ° C for 30 minutes, and then the temperature was raised to -40 ° C. After 5 mL of tributylchlorostannane was dropped, the temperature was raised to room temperature and Stir for 16 hours.

攪拌結束後,將反應混合物濃縮,混合該濃縮液與正己烷,將其過濾。然後,將所得之濾液濃縮,得到含有三丁基(2,3-二氫噻吩并[3,4-b][1,4]戴奧辛-5-基)錫烷的混合物7.4g。 After the stirring was completed, the reaction mixture was concentrated, and the concentrated solution was mixed with n-hexane and filtered. Then, the obtained filtrate was concentrated to obtain 7.4 g of a mixture containing tributyl (2,3-dihydrothieno [3,4-b] [1,4] dioxin-5-yl) stannane.

接著,於另外的燒瓶內,置入5,5’-二溴-2,2’-二噻吩1.5g與四(三苯基膦)鈀(Pd(PPh3)4)0.27g,進行氮取代。其中加入上述含有三丁基(2,3-二氫噻吩并[3,4-b][1,4]戴奧辛-5-基)錫烷的混合物6.2g與N,N-二甲基甲醯胺20mL,昇溫至125℃,攪拌2小時。 Next, in another flask, 1.5 g of 5,5'-dibromo-2,2'-dithiophene and 0.27 g of tetrakis (triphenylphosphine) palladium (Pd (PPh 3 ) 4 ) were placed, and nitrogen substitution was performed. . To this was added 6.2 g of the above-mentioned mixture containing tributyl (2,3-dihydrothieno [3,4-b] [1,4] dioxin-5-yl) stannane and N, N-dimethylformamidine 20 mL of amine was heated to 125 ° C. and stirred for 2 hours.

攪拌結束後,放置冷卻至室溫,其中加入n-己烷進行分液,將所得之N,N-二甲基甲醯胺層滴下至離子交換水與甲醇之混合液中,進行再沉澱。 After the stirring was completed, the mixture was left to cool to room temperature, and n-hexane was added for liquid separation. The obtained N, N-dimethylformamide layer was dropped into a mixed solution of ion-exchanged water and methanol, and reprecipitated.

然後,將沉澱物藉由過濾回收,經乾燥得到TP2(收量:1.4g、收率:66%)。1H-NMR之測量結果如以下所示。 Then, the precipitate was recovered by filtration and dried to obtain TP2 (yield: 1.4 g, yield: 66%). The measurement results of 1 H-NMR are shown below.

1H-NMR(CDCL3)δ:7.11(d,J=4.2Hz,2H),7.07(d,J=4.2Hz,2H),6.23(s,2H),4.37-4.33(m,4H),4.28-4.24(m,4H)。 1 H-NMR (CDCL 3 ) δ: 7.11 (d, J = 4.2 Hz, 2H), 7.07 (d, J = 4.2 Hz, 2H), 6.23 (s, 2H), 4.37-4.33 (m, 4H), 4.28-4.24 (m, 4H).

[合成例2]噻吩衍生物3之合成 [Synthesis Example 2] Synthesis of thiophene derivative 3 (1)5-三丁基甲錫烷基(stannyl)-2,2’-雙噻吩之合成 (1) Synthesis of 5-tributylstannyl-2,2'-bisthiophene

將2,2’-雙噻吩(東京化成工業(股)製)4.0g置入反應容器中,進行氮取代後,加入四氫呋喃120mL,冷卻至-78℃。保持-78℃的狀態下,滴下正丁基鋰之正己烷溶液14.7mL(濃度1.64mol/L)後,攪拌30分鐘。於其中滴下三-n-丁基氯錫烷7.8mL(d1.20)後,攪拌10分鐘後,昇溫至室溫進行攪拌。6小時後,將反應液濃縮,所得之殘渣中加入n-己烷50mL,藉由過濾除去不溶物(塊狀物(cake)洗淨:n-己烷30mL)。將所得之濾液進行濃縮.乾燥,得到含有5-三丁基甲錫烷基-2,2’-雙噻吩之暗紅色的油12.64g。未再進行純化,本步驟之收率為100%(理論收量10.96g),算出純度(10.96/12.64×100=86.7%),作為下步驟的原料使用。 4.0 g of 2,2'-bisthiophene (manufactured by Tokyo Chemical Industry Co., Ltd.) was placed in a reaction vessel, and after nitrogen substitution, 120 mL of tetrahydrofuran was added and cooled to -78 ° C. While maintaining -78 ° C, 14.7 mL (concentration 1.64 mol / L) of n-hexane solution of n-butyllithium was dropped, followed by stirring for 30 minutes. 7.8 mL (d1.20) of tri-n-butylchlorostannane was dropped into the solution, and after stirring for 10 minutes, the temperature was raised to room temperature and stirred. After 6 hours, the reaction solution was concentrated, and 50 mL of n-hexane was added to the obtained residue, and insoluble matter was removed by filtration (cake washing: 30 mL of n-hexane). The resulting filtrate was concentrated. After drying, 12.64 g of a dark red oil containing 5-tributylstannyl-2,2'-bisthiophene was obtained. Without further purification, the yield in this step was 100% (theoretical yield 10.96 g), and the purity (10.96 / 12.64 × 100 = 86.7%) was calculated and used as the raw material in the next step.

(2)噻吩衍生物3之合成 (2) Synthesis of thiophene derivative 3

藉由以下方法合成式(X4)表示之噻吩衍生物3(TP3)。 The thiophene derivative 3 (TP3) represented by the formula (X4) was synthesized by the following method.

將三丁基苯基胺(東京化成工業(股)製)2.0g及Pd(PPh3)4 0.24g置入反應容器中,進行氮取代後,添加[1]所合成之5-三丁基甲錫烷基-2,2’-雙噻吩7.8g(純度86.7%)之二甲基甲醯胺(DMF)溶液100mL。以110℃攪拌2.5小時後,使反應液以1.5L之甲醇進行再沉澱。使漿料以室溫攪拌15小時後,進行過濾,所得之濾物中添加甲苯90mL、乙醇10mL及活性碳0.75g,在迴流條件下攪拌1小時。在熱時進行過濾,將所得之濾液在攪拌的狀態下冷卻至0℃,在0℃下繼續攪拌2小時。將漿料過濾,濾物經乾燥(80℃、2小時)得到TP3(收量1.4g、收率47%)。1H-NMR及TOF-MS之測量結果如以下所示。 2.0 g of tributylphenylamine (manufactured by Tokyo Chemical Industry Co., Ltd.) and 0.24 g of Pd (PPh 3 ) 4 were placed in a reaction vessel, and after nitrogen substitution, 5-tributylmethyltin synthesized in [1] was added. 100 mL of a dimethylformamide (DMF) solution of 7.8 g (purity 86.7%) of alkyl-2,2'-bisthiophene. After stirring at 110 ° C for 2.5 hours, the reaction solution was reprecipitated with 1.5 L of methanol. The slurry was stirred at room temperature for 15 hours, and then filtered. 90 mL of toluene, 10 mL of ethanol, and 0.75 g of activated carbon were added to the obtained filtrate, and the mixture was stirred under reflux for 1 hour. Filtration was performed while hot, and the obtained filtrate was cooled to 0 ° C with stirring, and stirring was continued at 0 ° C for 2 hours. The slurry was filtered, and the filtrate was dried (80 ° C, 2 hours) to obtain TP3 (yield: 1.4 g, yield: 47%). The measurement results of 1 H-NMR and TOF-MS are shown below.

1H-NMR(300MHz,CDCl3)δ[ppm]:7.51(d,J=8.4Hz,6H),7.13-7.22(m,18H),7.01-7.04(m,3H)。 1 H-NMR (300 MHz, CDCl 3 ) δ [ppm]: 7.51 (d, J = 8.4 Hz, 6H), 7.13-7.22 (m, 18H), 7.01-7.04 (m, 3H).

MALDI-TOF-MS m/Z found:737.29([M]+calcd:737.05) MALDI-TOF-MS m / Z found: 737.29 ([M] + calcd: 737.05)

[合成例3]噻吩衍生物4之合成 [Synthesis Example 3] Synthesis of thiophene derivative 4

藉由以下方法合成式(X2)表示之噻吩衍生物4(TP4)。 The thiophene derivative 4 (TP4) represented by the formula (X2) was synthesized by the following method.

將噻吩并噻吩(東京化成工業(股)製)2.00g及二甲基甲醯胺(DMF)30mL置入反應容器中,室溫下攪拌確認溶解後,將N-溴代丁二醯亞胺(Bromosuccinimide:NBS)6.10g(2.4eq)以粉體狀態投入。確認原料消失後,反應液中加入n-己烷及離子交換水,進行分液。將有機層以離子交換水及飽和食鹽水分別洗淨1次後,使用Na2SO4進行乾燥。減壓餾除溶劑、經乾燥,得到目的之噻吩并噻吩二溴體4.21g(收量99%)。 2.00 g of thienothiophene (manufactured by Tokyo Chemical Industry Co., Ltd.) and 30 mL of dimethylformamide (DMF) were placed in a reaction vessel, and after stirring at room temperature to confirm dissolution, N-bromosuccinimide (Bromosuccinimide: NBS) 6.10 g (2.4 eq) was charged in a powder state. After confirming the disappearance of the raw materials, n-hexane and ion-exchanged water were added to the reaction solution, and liquid separation was performed. The organic layer was washed once with ion-exchanged water and saturated brine, and then dried with Na 2 SO 4 . The solvent was distilled off under reduced pressure and dried to obtain 4.21 g of the intended thienothiophene dibromide (yield: 99%).

接著,在氮環境下,加入噻吩并噻吩二溴體1.93g、Pd(PPh3)4 0.75g(10mol%)、3-己基噻吩硼酸頻哪醇(pinacol)酯(Aldrich公司製)4.00g、二甲氧基乙烷(DME)43mL及2mol/L之K2CO3水溶液16.2mL(5eq),於加熱迴流條件下攪拌5小時使反應。反應終了後,添加n-己烷,室溫下攪拌30分鐘後,過濾除去不溶物,將濾液以離子交換水洗淨2次、以飽和食鹽水洗淨1次。使用Na2SO4乾燥後,減壓餾除溶劑,殘渣以管柱層析法分離、純化,得到TP4(收率85%)。1H-NMR之測量結果如以下所示。 Next, under a nitrogen environment, 1.93 g of thienothiophene dibromide, Pd (PPh 3 ) 4 0.75 g (10 mol%), 3-hexylthiophene borate pinacol ester (manufactured by Aldrich) 4.00 g, 43 mL of dimethoxyethane (DME) and 16.2 mL (5 eq) of a 2 mol / L K 2 CO 3 aqueous solution were stirred under reflux for 5 hours to react. After the reaction was completed, n-hexane was added, and after stirring at room temperature for 30 minutes, insoluble matters were removed by filtration, and the filtrate was washed twice with ion-exchanged water and once with saturated saline. After drying with Na 2 SO 4 , the solvent was distilled off under reduced pressure, and the residue was separated and purified by column chromatography to obtain TP4 (yield: 85%). The measurement results of 1 H-NMR are shown below.

1H-NMR(300MHz,CDCl3)δ[ppm]:7.24(s,2H), 7.21(d,J=5.1Hz,2H),6.96(d,J=5.3Hz,2H),2.79(t,J=7.4Hz,4H),1.60-1.70(m,4H),1.27-1.42(m,12H),0.88(t,J=6.9Hz,6H)。 1 H-NMR (300 MHz, CDCl 3 ) δ [ppm]: 7.24 (s, 2H), 7.21 (d, J = 5.1 Hz, 2H), 6.96 (d, J = 5.3 Hz, 2H), 2.79 (t, J = 7.4Hz, 4H), 1.60-1.70 (m, 4H), 1.27-1.42 (m, 12H), 0.88 (t, J = 6.9Hz, 6H).

[合成例4]噻吩衍生物5之合成 [Synthesis Example 4] Synthesis of thiophene derivative 5

藉由以下方法合成式(X3)表示之噻吩衍生物5(TP5)。 The thiophene derivative 5 (TP5) represented by the formula (X3) was synthesized by the following method.

氮環境下,將苯并二噻吩(東京化成工業(股)製)1.50g置入反應容器中,添加四氫呋喃(THF)50mL後,冷卻至-78℃。於其中滴下n-丁基鋰之n-己烷溶液19.2mL(濃度1.64mol/L、4eq)後,攪拌1.5小時。再於其中滴下三-n-丁基氯錫烷8.6mL(4eq),再以1小時、-78℃使反應後,移開冷卻浴,昇溫至室溫。到達室溫後,減壓餾除溶劑,將所得之漿料中之析出物過濾取得,進行乾燥得到含有目的之苯并二噻吩雙甲錫烷基體的混合物11.84g。又,未再進行純化,當本步驟之收率作為100%(理論收量6.07g),計算純度(6.07/11.84×100=51.3%),作為下步驟之原料使用。 Under a nitrogen environment, 1.50 g of benzodithiophene (manufactured by Tokyo Chemical Industry Co., Ltd.) was placed in a reaction vessel, 50 mL of tetrahydrofuran (THF) was added, and then cooled to -78 ° C. Then, 19.2 mL of an n-hexane solution of n-butyllithium (concentration of 1.64 mol / L, 4 eq) was dropped, and then stirred for 1.5 hours. Then, 8.6 mL (4 eq) of tri-n-butylchlorostannane was dropped, and after reacting at -78 ° C for 1 hour, the cooling bath was removed and the temperature was raised to room temperature. After reaching room temperature, the solvent was distilled off under reduced pressure. The precipitate in the obtained slurry was filtered and obtained, and dried to obtain 11.84 g of a mixture containing the intended benzodithiophene bistinyl body. In addition, no further purification was performed. When the yield of this step was 100% (theoretical yield 6.07 g), the calculated purity (6.07 / 11.84 × 100 = 51.3%) was used as the raw material for the next step.

接著,在氮環境下,將含有所得之苯并二噻吩雙甲錫烷基體的混合物5.92g、2-溴-3-n-己基噻吩(東京化成工業(股)製)2.15g(2.2eq)、甲苯25mL及Pd(PPh3)4 0.230g(5mol%)置入反應容器中,加熱迴流條件下,攪拌4.5小時使反應。放置冷卻至室溫後,加入氯仿及離子交換水進行分液。減壓餾除所得之有機層的溶劑,在所得之黃色漿料中加入甲醇後,濾除不溶物。對濾液進行活性碳處理後,減壓餾除溶劑,殘渣中加入乙醇與甲苯,在加熱迴流條件下攪拌,確認完全溶解後,放置冷卻至室溫。該狀態下以室溫攪拌一晚後,經濾取、乾燥得到TP5(收量1.40g、2段階收率68%)。1H-NMR及TOF-MS之測量結果如以下所示。 Next, under a nitrogen environment, 5.92 g of the mixture containing the obtained benzodithiophene dimethylstannyl body and 2.15 g (2.2 eq) of 2-bromo-3-n-hexylthiophene (manufactured by Tokyo Chemical Industry Co., Ltd.) 25 mL of toluene and 0.230 g (5 mol%) of Pd (PPh 3 ) 4 were placed in a reaction vessel, and the reaction was stirred for 4.5 hours under heating and refluxing conditions. After leaving to cool to room temperature, chloroform and ion-exchanged water were added for liquid separation. The solvent of the obtained organic layer was distilled off under reduced pressure. After adding methanol to the obtained yellow slurry, insoluble matters were filtered off. After the filtrate was subjected to activated carbon treatment, the solvent was distilled off under reduced pressure. Ethanol and toluene were added to the residue, and the mixture was stirred under heating and refluxing conditions. After confirming complete dissolution, it was allowed to cool to room temperature. After stirring at room temperature for one night in this state, TP5 was obtained by filtration and drying (yield: 1.40 g, two-stage yield: 68%). The measurement results of 1 H-NMR and TOF-MS are shown below.

1H-NMR(300MHz,CDCl3)δ[ppm]:8.16(s,2H),7.34(s,2H),7.26(d,J=5.1Hz,2H),6.98(d,J=5.1Hz,2H),2.87(t,J=8.0Hz,4H),1.63-1.74(m,4H),1.30-1.42(m,12H),0.88(t,J=6.6Hz,6H)。 1 H-NMR (300MHz, CDCl 3 ) δ [ppm]: 8.16 (s, 2H), 7.34 (s, 2H), 7.26 (d, J = 5.1Hz, 2H), 6.98 (d, J = 5.1Hz, 2H), 2.87 (t, J = 8.0Hz, 4H), 1.63-1.74 (m, 4H), 1.30-1.42 (m, 12H), 0.88 (t, J = 6.6Hz, 6H).

MALDI-TOF-MS m/Z found:521.87([M]+calcd:522.15) MALDI-TOF-MS m / Z found: 521.87 ([M] + calcd: 522.15)

[合成例5]苯胺衍生物1(AN1)之合成 [Synthesis Example 5] Synthesis of aniline derivative 1 (AN1)

藉由以下方法合成式(X5)表示之苯胺衍生物1(AN1)。 The aniline derivative 1 (AN1) represented by the formula (X5) was synthesized by the following method.

將N,N’-二苯基聯苯胺2.00g、4-溴-N,N-二苯基苯胺4.25g、Pd(dba)2 68.4mg、及tBuONa 1.49g置入反應容器中,進行氮取代後,加入甲苯20mL及另外準備之P(tBu)3之甲苯溶液1.0mL(濃度47.2g/L),在50℃下攪拌7小時使反應。冷卻至室溫後,將反應液過濾,所得之濾物以離子交換水洗淨。再進行過濾,使所得之濾物乾燥得到AN1(收量4.46g、收率91%)。TOF-MS之測量結果如以下所示。 The N, N'- diphenyl benzidine 2.00g, 4- bromo -N, N- diphenylaniline 4.25g, Pd (dba) 2 68.4mg , and t BuONa 1.49g into a reaction vessel, with nitrogen after the substitution, 20mL of toluene was added and separately prepared of P (t Bu) 3 of a toluene solution of 1.0 mL (concentration of 47.2g / L), stirred at 50 ℃ 7 hours the reaction. After cooling to room temperature, the reaction solution was filtered, and the obtained filtrate was washed with ion-exchanged water. After filtration, the obtained filtrate was dried to obtain AN1 (yield: 4.46 g, yield: 91%). The measurement results of TOF-MS are shown below.

MALDI-TOF-MS m/Z found:822.25([M]+calcd:822.37)。 MALDI-TOF-MS m / Z found: 822.25 ([M] + calcd: 822.37).

[合成例6]苯胺衍生物2(AN2)之合成 [Synthesis Example 6] Synthesis of aniline derivative 2 (AN2)

藉由以下方法合成式(X6)表示之苯胺衍生物2(AN2)。 The aniline derivative 2 (AN2) represented by the formula (X6) was synthesized by the following method.

將N,N’-二苯基聯苯胺1.00g、3-溴-9-乙基咔唑1.96g、Pd(dba)2 34.7mg、及tBuONa0.860g置入反應容器中,進行氮取代後,加入甲苯15mL及另外準備之P(tBu)3之甲苯溶液0.51mL(濃度47.2g/L),在50℃下攪拌6.5小時使反應。冷卻至室溫後,加入甲苯與飽和食鹽水進行分液。所得之有機層使用Na2SO4乾燥後,加入活性碳以室溫攪拌30分鐘。過濾除去活性碳,進行濃縮。將所得之濃縮液滴下於MeOH-AcOEt混合溶劑中,室溫下進行攪拌。將漿料溶液過濾後、進行乾燥後,使用甲苯-甲醇混合溶劑洗淨漿料。過濾後,將所得之粉末乾燥,得到AN2(收量1.87g、收率87%)。1H-NMR之測量結果如以下所示。 1.00 g of N, N'-diphenylbenzidine, 1.96 g of 3-bromo-9-ethylcarbazole, 34.7 mg of Pd (dba) 2 and 0.860 g of t BuONa were placed in a reaction vessel, and nitrogen substitution was performed. 15 mL of toluene and 0.51 mL (concentration 47.2 g / L) of a toluene solution of P ( t Bu) 3 separately were added, and the mixture was stirred at 50 ° C. for 6.5 hours to react. After cooling to room temperature, toluene and saturated brine were added for liquid separation. The obtained organic layer was dried over Na 2 SO 4 , and activated carbon was added thereto, followed by stirring at room temperature for 30 minutes. The activated carbon was removed by filtration and concentrated. The obtained concentrated liquid was dropped into a MeOH-AcOEt mixed solvent, and stirred at room temperature. After the slurry solution was filtered and dried, the slurry was washed with a toluene-methanol mixed solvent. After filtration, the obtained powder was dried to obtain AN2 (yield 1.87 g, yield 87%). The measurement results of 1 H-NMR are shown below.

1H-NMR(300MHz,DMSO-d6)δ[ppm]:8.10(d,J=7.8Hz,2H),7.99(d,J=1.8Hz,2H),7.59-7.66(m,4H),7.42-7.51(m,6H),7.23-7.29(m,7H),6.94-7.18(m,11H)。 1 H-NMR (300MHz, DMSO-d6) δ [ppm]: 8.10 (d, J = 7.8 Hz, 2H), 7.99 (d, J = 1.8 Hz, 2H), 7.59-7.66 (m, 4H), 7.42 -7.51 (m, 6H), 7.23-7.29 (m, 7H), 6.94-7.18 (m, 11H).

[2]電荷輸送性清漆之調製 [2] Modulation of charge-transporting varnish [實施例1-1] [Example 1-1]

將3,3”’-二己基-2,2’:5’,2”:5”,2”’-四聯噻吩(Sigma-Aldrich Co.LLC.製、以下稱為TP1)0.050g、磷鎢酸(PTA、關東化學(股)製)0.250g及F4TCNQ(東京化成工業(股)製)0.045g,在氮環境下溶解於1,3-二甲基-2-咪唑啉酮(DMI)3.2g中。所得之溶液中添加環己醇(CHA)4.9g及丙二醇(PG)1.6g,然後攪拌調製電荷輸送性清漆。 0.050 g of 3,3 "'-dihexyl-2,2': 5 ', 2": 5 ", 2"'-tetrathiophene (manufactured by Sigma-Aldrich Co. LLC, hereinafter referred to as TP1), phosphorus 0.250 g of tungstic acid (PTA, manufactured by Kanto Chemical Co., Ltd.) and 0.045 g of F4TCNQ (made by Tokyo Chemical Industry Co., Ltd.), dissolved in 1,3-dimethyl-2-imidazolinone (DMI) under a nitrogen environment 3.2g. To the obtained solution, 4.9 g of cyclohexanol (CHA) and 1.6 g of propylene glycol (PG) were added, and then a charge-transporting varnish was prepared by stirring.

[實施例1-2] [Example 1-2]

使TP1(0.052g)、PTA(0.258g)及F4TCNQ(0.031g)在氮環境下溶解於DMI(2g)中。所得之溶液中加入CHA(2g)及二乙二醇二甲基醚(Diglyme)6g,進行攪拌調製電荷輸送性清漆。 TP1 (0.052g), PTA (0.258g) and F4TCNQ (0.031g) were dissolved in DMI (2g) under a nitrogen environment. CHA (2g) and 6 g of diethylene glycol dimethyl ether (Diglyme) were added to the obtained solution, and it stirred and prepared the charge-transporting varnish.

[實施例1-3] [Example 1-3]

使TP1(0.052g)、PTA(0.258g)及F4TCNQ(0.031g)在氮環境下溶解於DMI(2g)中。所得之溶液中加入丙二醇單甲基醚(PGME)8g,進行攪拌調製電荷輸送性清漆。 TP1 (0.052g), PTA (0.258g) and F4TCNQ (0.031g) were dissolved in DMI (2g) under a nitrogen environment. 8 g of propylene glycol monomethyl ether (PGME) was added to the obtained solution, and the charge-transporting varnish was prepared by stirring.

[實施例1-4] [Example 1-4]

使TP1(0.052g)、PTA(0.258g)及F4TCNQ(0.031g)在氮環境下溶解於DMI(2g)中。所得之溶液中加入PGME(8g),經攪拌後,添加五氟苯基三乙氧基矽烷0.031g,再攪拌調製電荷輸送性清漆。 TP1 (0.052g), PTA (0.258g) and F4TCNQ (0.031g) were dissolved in DMI (2g) under a nitrogen environment. PGME (8 g) was added to the obtained solution, and after stirring, 0.031 g of pentafluorophenyltriethoxysilane was added, followed by stirring to prepare a charge-transporting varnish.

[實施例1-5] [Example 1-5]

使TP1(0.017g)、PTA(0.083g)及F4TCNQ(0.010g)在氮環境下溶解於DMI(0.98g)中。所得之溶液中添加二乙二醇單甲基醚(DEGME)0.49g及PGME(3.43g),進行攪拌後,添加3,3,3-三氟丙基三甲氧基矽烷0.001g及苯基三甲氧基矽烷0.009g,再攪拌調製電荷輸送性清漆。 TP1 (0.017 g), PTA (0.083 g) and F4TCNQ (0.010 g) were dissolved in DMI (0.98 g) under a nitrogen environment. 0.49 g of diethylene glycol monomethyl ether (DEGME) and PGME (3.43 g) were added to the obtained solution, and after stirring, 0.001 g of 3,3,3-trifluoropropyltrimethoxysilane and phenyltrimethyl ether were added. 0.009 g of oxysilane, and then stirred to prepare a charge-transporting varnish.

[實施例1-6] [Example 1-6]

使TP2(0.052g)、PTA(0.258g)及F4TCNQ(0.031g)在氮環境下溶解於DMI(2g)中。所得之溶液中添加CHA(2g)及Diglyme(6g),進行攪拌調製電荷輸送性清漆。 TP2 (0.052g), PTA (0.258g) and F4TCNQ (0.031g) were dissolved in DMI (2g) under a nitrogen environment. CHA (2g) and Diglyme (6g) were added to the obtained solution, and it stirred and prepared the charge-transporting varnish.

[實施例1-7] [Example 1-7]

使TP3(0.062g)、PTA(0.309g)及F4TCNQ(0.026g)在氮環境下溶解於DMI(3.6g)中。所得之溶液中添加1,3-丁二醇2.4g及Diglyme(6.0g),進行攪拌調製電荷輸送性清漆。 TP3 (0.062g), PTA (0.309g) and F4TCNQ (0.026g) were dissolved in DMI (3.6g) under a nitrogen environment. To the obtained solution, 2.4 g of 1,3-butanediol and Diglyme (6.0 g) were added, and the charge-transporting varnish was prepared by stirring.

[實施例1-8] [Example 1-8]

使TP4(0.034g)、PTA(0.170g)及F4TCNQ(0.020g)在氮環境下溶解於DMI(2g)中。所得之溶液中添加DEGME(1g)及PGME(7g),進行攪拌後添加3,3,3-三氟丙基三甲氧基矽烷0.007g及苯基三甲氧基矽烷0.014g,進行攪拌調製電荷輸送性清漆。 TP4 (0.034g), PTA (0.170g) and F4TCNQ (0.020g) were dissolved in DMI (2g) under a nitrogen environment. DEGME (1g) and PGME (7g) were added to the obtained solution, and after stirring, 0.007g of 3,3,3-trifluoropropyltrimethoxysilane and 0.014g of phenyltrimethoxysilane were added, and stirring was performed to adjust the charge transport. Sexual varnish.

[實施例1-9] [Example 1-9]

使TP5(0.034g)、PTA(0.170g)及F4TCNQ(0.031g)在氮環境下溶解於DMI(2g)中。所得之溶液中添加DEGME(1g)及PGME(7g),進行攪拌,添加3,3,3-三氟丙基三甲氧基矽烷0.007g及苯基三甲氧基矽烷0.014g,進行攪拌調製 電荷輸送性清漆。 TP5 (0.034g), PTA (0.170g) and F4TCNQ (0.031g) were dissolved in DMI (2g) under a nitrogen environment. DEGME (1g) and PGME (7g) were added to the obtained solution and stirred, and 0.007g of 3,3,3-trifluoropropyltrimethoxysilane and 0.014g of phenyltrimethoxysilane were added and stirred. Charge-transporting varnish.

[實施例1-10] [Example 1-10]

使AN1(0.046g)、PTA(0.202g)及F4TCNQ(0.156g)在氮環境下溶解於環己酮(CHN)20g中。所得之溶液中添加3,3,3-三氟丙基三甲氧基矽烷0.007g及苯基三甲氧基矽烷0.014g,進行攪拌調製電荷輸送性清漆。 AN1 (0.046 g), PTA (0.202 g), and F4TCNQ (0.156 g) were dissolved in 20 g of cyclohexanone (CHN) under a nitrogen environment. To the obtained solution, 0.007 g of 3,3,3-trifluoropropyltrimethoxysilane and 0.014 g of phenyltrimethoxysilane were added, and the charge-transporting varnish was prepared by stirring.

[實施例1-11] [Example 1-11]

使AN2(0.042g)、PTA(0.202g)及F4TCNQ(0.160g)在氮環境下溶解於CHN(20g)中。所得之溶液中添加3,3,3-三氟丙基三甲氧基矽烷0.007g及苯基三甲氧基矽烷0.014g,進行攪拌調製電荷輸送性清漆。 AN2 (0.042g), PTA (0.202g) and F4TCNQ (0.160g) were dissolved in CHN (20g) under a nitrogen environment. To the obtained solution, 0.007 g of 3,3,3-trifluoropropyltrimethoxysilane and 0.014 g of phenyltrimethoxysilane were added, and the charge-transporting varnish was prepared by stirring.

[比較例1-1] [Comparative Example 1-1]

使TP1(0.124g)及PTA(0.247g)在氮環境下溶解於DMI(4g)中。所得之溶液中添加CHA(6g)及PG(2g),進行攪拌調製電荷輸送性清漆。 TP1 (0.124 g) and PTA (0.247 g) were dissolved in DMI (4 g) under a nitrogen environment. CHA (6g) and PG (2g) were added to the obtained solution, and it stirred and prepared the charge-transporting varnish.

[比較例1-2] [Comparative Example 1-2]

在氮環境下,使用TP1(0.050g)、PTA(0.250g)及四氰基苯醌二甲烷0.045g、及DMI(3.2g)、CHA(4.9g)及PG(1.6g),嘗試調製電荷輸送性清漆。但是固體成分不溶解,無法得到可提供可用於有機EL元件之薄膜的均勻的 清漆。 In a nitrogen environment, try to modulate the charge using TP1 (0.050g), PTA (0.250g) and 0.045g of tetracyanobenzoquinone dimethane, and DMI (3.2g), CHA (4.9g) and PG (1.6g) Conveying varnish. However, the solid content does not dissolve, and it is not possible to obtain a uniform film that can be used in organic EL devices. Varnish.

[3]有機EL元件之製造及特性評價 [3] Manufacturing and characteristic evaluation of organic EL elements [實施例2-1] [Example 2-1]

使用旋轉塗佈機將實施例1-1所得之清漆塗佈於ITO基板後,以50℃乾燥5分鐘,接著在大氣環境下,以150℃進行10分鐘燒成,而在ITO基板上形成30nm之均勻薄膜。ITO基板係使用在表面上銦錫氧化物(ITO)以膜厚150nm經圖型化後之25mm×25mm×0.7t的玻璃基板,在使用前藉由O2電漿洗淨裝置(150W、30秒鐘)去除表面上的雜質。 After applying the varnish obtained in Example 1-1 on an ITO substrate using a spin coater, it was dried at 50 ° C for 5 minutes, and then fired at 150 ° C for 10 minutes in an atmospheric environment to form 30 nm on the ITO substrate. A uniform film. The ITO substrate is a glass substrate of 25mm × 25mm × 0.7t after patterning with an indium tin oxide (ITO) film thickness of 150nm on the surface. Before use, it is cleaned by an O 2 plasma cleaning device (150W, 30 Seconds) to remove impurities from the surface.

接著,使用蒸鍍裝置(真空度1.0×10-5Pa),對於形成有薄膜之ITO基板,依序層合α-NPD、Alq3、氟化鋰及鋁之薄膜,得到有機EL元件。此時,關於蒸鍍速率,其中α-NPD、Alq3及鋁為0.2nm/秒,氟化鋰為0.02nm/秒的條件下分別進行,膜厚分別為30nm、40nm、0.5nm及120nm。 Next, using an evaporation device (vacuity degree: 1.0 × 10 -5 Pa), on the ITO substrate on which the thin film was formed, thin films of α-NPD, Alq 3 , lithium fluoride, and aluminum were sequentially laminated to obtain an organic EL device. At this time, regarding the evaporation rate, α-NPD, Alq 3, and aluminum were performed at 0.2 nm / sec, and lithium fluoride was performed at 0.02 nm / sec. The film thicknesses were 30 nm, 40 nm, 0.5 nm, and 120 nm, respectively.

此外,為了防止因空氣中之氧、水等之影響所導致的特性劣化,因此有機EL元件藉由密封基板密封後,評價其特性。密封係依據以下順序施行。在氧濃度2ppm以下、露點-85℃以下之氮環境中,在密封基板之間收納有機EL元件,並藉由接著材料(Nagase Chemtex(股)製XNR5516Z-B1)貼合密封基板。此時,將捕水劑(Dynic(股)製HD-071010W-40)與有機EL元件一同收納於密封基板 內。對於已貼合之密封基板,照射UV光(波長:365nm、照射量:6000mJ/cm2)後,在80℃下施行1小時退火處理而使接著材料硬化。 In addition, in order to prevent deterioration of characteristics due to the influence of oxygen, water, and the like in the air, the organic EL element is sealed with a sealing substrate, and its characteristics are evaluated. Sealing is performed in the following order. In a nitrogen environment with an oxygen concentration of 2 ppm or less and a dew point of -85 ° C or less, an organic EL element is housed between the sealing substrates, and the sealing substrate is bonded with an adhesive material (XNR5516Z-B1 made by Nagase Chemtex). At this time, a water-capturing agent (HD-071010W-40, manufactured by Dynac Co., Ltd.) was housed in a sealed substrate together with the organic EL element. The bonded sealing substrate was irradiated with UV light (wavelength: 365 nm, irradiation amount: 6000 mJ / cm 2 ), and then annealed at 80 ° C. for 1 hour to harden the adhesive material.

[實施例2-2~2-7] [Examples 2-2 to 2-7]

除了分別使用實施例1-2~1-7所得的清漆來取代實施例1-1所得的清漆外,與實施例2-1相同的方法製作有機EL元件。 An organic EL device was fabricated in the same manner as in Example 2-1 except that the varnish obtained in Examples 1-2 to 1-7 was used instead of the varnish obtained in Example 1-1.

[實施例2-8~2-9] [Examples 2-8 to 2-9]

除了分別使用實施例1-8~1-9所得的清漆來取代實施例1-1所得的清漆,分別以160℃進行燒成取代以150℃進行燒成外,與實施例2-1相同的方法製作有機EL元件。 The varnishes obtained in Examples 1-8 to 1-9 were used instead of the varnishes obtained in Example 1-1, and were fired at 160 ° C instead of 150 ° C, respectively. Method: An organic EL device was fabricated.

[比較例2-1] [Comparative Example 2-1]

除了分別使用比較例1-1所得的清漆來取代實施例1-1所得的清漆外,與實施例2-1相同的方法製作有機EL元件。 An organic EL device was produced in the same manner as in Example 2-1, except that the varnish obtained in Comparative Example 1-1 was used instead of the varnish obtained in Example 1-1.

[實施例2-10] [Example 2-10]

除了使用實施例1-10所得的清漆來取代實施例1-1所得的清漆,使用蒸鍍裝置(真空度1.0×10-5Pa),依序形成CBP與Ir(PPy)3之薄膜及BAlq之薄膜,取代使用蒸鍍 裝置(真空度1.0×10-5Pa)形成40nm之Alq3薄膜外,與實施例2-1相同的方法製作有機EL元件。 Instead of using the varnish obtained in Example 1-10 instead of the varnish obtained in Example 1-1, a vapor deposition device (vacuity 1.0 × 10 -5 Pa) was used to sequentially form a thin film of CBP and Ir (PPy) 3 and BAlq. An organic EL device was fabricated in the same manner as in Example 2-1 except that the Alq 3 film was formed at a thickness of 40 nm using a vapor deposition apparatus (vacuity degree 1.0 × 10 -5 Pa).

CBP與Ir(PPy)3之薄膜係控制蒸鍍速率使Ir(PPy)3之濃度成為6%,共同蒸鍍CBP與Ir(PPy)3而成膜,膜厚為40nm。又,BAlq之膜厚之蒸鍍速度為0.2nm/秒,膜厚為20nm。 The thin film of CBP and Ir (PPy) 3 is controlled by the evaporation rate so that the concentration of Ir (PPy) 3 becomes 6%, and CBP and Ir (PPy) 3 are co-evaporated to form a film with a film thickness of 40 nm. The deposition rate of the BAlq film thickness was 0.2 nm / second, and the film thickness was 20 nm.

[實施例2-11] [Example 2-11]

除了使用實施例1-11所得的清漆來取代實施例1-10所得的清漆外,與實施例2-10相同的方法製作有機EL元件。 An organic EL device was produced in the same manner as in Example 2-10 except that the varnish obtained in Example 1-11 was used instead of the varnish obtained in Example 1-10.

分別測量驅動電壓5V時之實施例2-1~2-9之元件的亮度、及驅動電流0.4mA時之實施例2-10~2-11之元件的亮度。結果如表1及2所示。 The brightness of the elements of Examples 2-1 to 2-9 at a driving voltage of 5V and the brightness of the elements of Examples 2-10 to 2-11 at a driving current of 0.4 mA were measured. The results are shown in Tables 1 and 2.

如表1及2所示,藉由本發明之清漆,即使在未達200℃之低溫燒成時,也可實現具有優異的亮度特性的有機EL元件。 As shown in Tables 1 and 2, with the varnish of the present invention, an organic EL element having excellent brightness characteristics can be realized even when firing at a low temperature of less than 200C.

評價實施例2~8所得之元件的耐久性。亮度之半衰期(初期亮度5,000cd/m2)如表3所示。 The durability of the elements obtained in Examples 2 to 8 was evaluated. The half-life of luminance (initial luminance 5,000 cd / m 2 ) is shown in Table 3.

如表3所示,本發明之有機EL元件的耐久性優異。 As shown in Table 3, the organic EL device of the present invention is excellent in durability.

Claims (14)

一種電荷輸送性清漆,其係含有電荷輸送性物質、摻雜物及有機溶劑的電荷輸送性清漆,其特徵係上述摻雜物為包含雜多酸與選自鹵化四氰基苯醌二甲烷及鹵化或氰化苯醌之至少1種。A charge-transporting varnish, which is a charge-transporting varnish containing a charge-transporting substance, a dopant, and an organic solvent. At least one halogenated or cyanobenzoquinone. 如申請專利範圍第1項之電荷輸送性清漆,其中上述鹵化四氰基苯醌二甲烷包含氟化四氰基苯醌二甲烷。For example, the charge-transporting varnish according to item 1 of the patent application range, wherein the halogenated tetracyanobenzoquinone dimethane comprises tetrafluorinated benzoquinone dimethane. 如申請專利範圍第1或2項之電荷輸送性清漆,其中上述雜多酸包含磷鎢酸。For example, the charge-transporting varnish according to item 1 or 2 of the application, wherein the heteropoly acid includes phosphotungstic acid. 如申請專利範圍第3項之電荷輸送性清漆,其中上述電荷輸送性物質為苯胺衍生物或噻吩衍生物。For example, the charge-transporting varnish according to item 3 of the application, wherein the charge-transporting substance is an aniline derivative or a thiophene derivative. 如申請專利範圍第1項之電荷輸送性清漆,其中上述有機溶劑僅包含選自N,N-二甲基甲醯胺、N,N-二甲基乙醯胺、N-甲基吡咯烷酮、1,3-二甲基-2-咪唑啉酮及二乙二醇單甲基醚之至少1種的高溶解性溶劑,必要時,選自環己醇、乙二醇、乙二醇二縮水甘油醚、1,3-辛二醇、二乙二醇、二丙二醇、三乙二醇、三丙二醇、1,3-丁二醇、2,3-丁二醇、1,4-丁二醇、丙二醇及己二醇之至少1種的高黏度有機溶劑,及必要時,選自乙二醇單丁基醚、二乙二醇二乙基醚、二乙二醇二甲基醚、二乙二醇單乙基醚乙酸酯、二乙二醇單丁基醚乙酸酯、二丙二醇單甲基醚、丙二醇單甲基醚乙酸酯、二乙二醇單乙基醚、二丙酮醇、γ-丁內酯、乙基乳酸酯、n-己基乙酸酯及丙二醇單甲基醚之至少1種之其他的溶劑。For example, the charge-transporting varnish according to item 1 of the patent application scope, wherein the organic solvent only contains a member selected from N, N-dimethylformamide, N, N-dimethylacetamide, N-methylpyrrolidone, 1 A highly soluble solvent of at least one of 1,3-dimethyl-2-imidazolinone and diethylene glycol monomethyl ether, if necessary, selected from cyclohexanol, ethylene glycol, and ethylene glycol diglycidyl Ether, 1,3-octanediol, diethylene glycol, dipropylene glycol, triethylene glycol, tripropylene glycol, 1,3-butanediol, 2,3-butanediol, 1,4-butanediol, High viscosity organic solvent of at least one of propylene glycol and hexanediol, and if necessary, selected from ethylene glycol monobutyl ether, diethylene glycol diethyl ether, diethylene glycol dimethyl ether, and diethylene glycol Alcohol monoethyl ether acetate, diethylene glycol monobutyl ether acetate, dipropylene glycol monomethyl ether, propylene glycol monomethyl ether acetate, diethylene glycol monoethyl ether, diacetone alcohol, Other solvents of at least one of γ-butyrolactone, ethyl lactate, n-hexyl acetate, and propylene glycol monomethyl ether. 如申請專利範圍第1項之電荷輸送性清漆,其係進一步包含選自下述式(B1)表示之二烷氧基矽烷化合物、下述式(B2)表示之三烷氧基矽烷化合物及下述式(B3)表示之四烷氧基矽烷化合物之至少1種,SiR’2(OR)2 (B1) SiR’(OR)3 (B2) Si(OR)4 (B3)[式中,R各自獨立表示可經Z101取代之碳數1~20之烷基、可經Z101取代之碳數2~20之烯基、可經Z101取代之碳數2~20之炔基、可經Z102取代之碳數6~20之芳基或可經Z102取代之碳數2~20之雜芳基,R’各自獨立表示可經Z103取代之碳數1~20之烷基、可經Z103取代之碳數2~20之烯基、可經Z103取代之碳數2~20之炔基、可經Z104取代之碳數6~20之芳基或可經Z104取代之碳數2~20之雜芳基,Z101表示鹵素原子、可經Z105取代之碳數6~20之芳基或可經Z105取代之碳數2~20之雜芳基,Z102表示鹵素原子、可經Z105取代之碳數1~20之烷基、可經Z105取代之碳數2~20之烯基或可經Z105取代之碳數2~20之炔基,Z103表示鹵素原子、可經Z105取代之碳數6~20之芳基、可經Z105取代之碳數2~20之雜芳基、環氧基環己基、環氧丙氧基、甲基丙烯醯氧基、丙烯醯氧基、脲基(-NHCONH2)、硫醇基、異氰酸酯基(-NCO)、胺基、-NHY101基或-NY102Y103基,Z104表示鹵素原子、可經Z105取代之碳數1~20之烷基、可經Z105取代之碳數2~20之烯基、可經Z105取代之碳數2~20之炔基、環氧基環己基、環氧丙氧基、甲基丙烯醯氧基、丙烯醯氧基、脲基(-NHCONH2)、硫醇基、異氰酸酯基(-NCO)、胺基、-NHY101基或-NY102Y103基,Y101~Y103各自獨立表示可經Z105取代之碳數1~20之烷基、可經Z105取代之碳數2~20之烯基、可經Z105取代之碳數2~20之炔基、可經Z105取代之碳數6~20之芳基或可經Z105取代之碳數2~20之雜芳基,Z105表示鹵素原子、胺基、硝基、氰基或硫醇基。For example, the charge-transporting varnish according to item 1 of the patent application range further includes a dialkoxysilane compound represented by the following formula (B1), a trialkoxysilane compound represented by the following formula (B2), and Said at least one type of tetraalkoxysilane compound represented by formula (B3), SiR ' 2 (OR) 2 (B1) SiR' (OR) 3 (B2) Si (OR) 4 (B3) [wherein, R each independently represents an alkyl group may be substituted with Z 101 carbon atoms of 1 to 20, the sum may be substituted with Z 101 carbon atoms, alkenyl having 2 to 20, the sum Z 101 may be a substituted alkynyl group having a carbon number of 2 to 20, may be Z 102 substituted aryl groups having 6 to 20 carbon atoms or Z 102 substituted aryl groups having 2 to 20 carbon atoms. R 'each independently represents an alkyl group having 1 to 20 carbon atoms, which may be substituted with Z 103 . by the Z substituent of 103 carbon atoms, an alkenyl group having 2 to 20, the may be Z 103 substituted with the carbon number of an alkynyl group having 2 to 20, the may be substituted with the Z 104 carbon atoms, an aryl group having 6 to 20 in or may be substituted with the via Z 104 A heteroaryl group having 2 to 20 carbon atoms, Z 101 represents a halogen atom, an aryl group having 6 to 20 carbon atoms that can be substituted with Z 105 or a heteroaryl group having 2 to 20 carbon atoms that can be substituted with Z 105 , and Z 102 represents a halogen atom, an alkyl group may be substituted with Z 105 of 1 to 20 carbon atoms, the alkenyl group may be substituted with Z, or may be of 2 to 105 carbon atoms of 20 Z 105 is an alkynyl group having 2 to 20 carbon atoms, Z 103 represents a halogen atom, aryl group having 6 to 20 carbon atoms that can be substituted by Z 105 , and heteroaryl group having 2 to 20 carbon atoms that can be substituted by Z 105 , Epoxycyclohexyl, glycidyloxy, methacryloxy, propyleneoxy, ureido (-NHCONH 2 ), thiol, isocyanate (-NCO), amine, -NHY 101 group or a group -NY 102 Y 103, Z 104 represents a halogen atom, an alkyl group may be substituted with Z 105 of 1 to 20 carbon atoms, the alkenyl group may be substituted by Z 105 of the 2 to 20 carbon atoms, may be substituted with Z 105 Alkynyl, epoxycyclohexyl, glycidyloxy, methacryloxy, propyleneoxy, ureido (-NHCONH 2 ), thiol, isocyanate (- the NCO), amino, -NHY 101 yl group or -NY 102 Y 103, Y 101 ~ Y 103 each independently represents an alkyl group substituted by Z 105 of 1 to 20 carbon atoms, the carbon atoms may be substituted by Z 105. 2 ~ alkenyl group 20, the may be Z 105 substituted with the carbon number of an alkynyl group having 2 to 20, the can heteroaryl via Z 105 substitution of carbon atoms an aryl group having 6 to 20 in or may be substituted with Z 105 of carbon number 2 to 20 of the Z 105 represents a halogen atom, an amine group, a nitro group, a cyano group, or a thiol group. 如申請專利範圍第1或2項之電荷輸送性清漆,其中上述電荷輸送性物質為苯胺衍生物或噻吩衍生物。For example, the charge-transporting varnish according to item 1 or 2 of the application, wherein the charge-transporting substance is an aniline derivative or a thiophene derivative. 一種電荷輸送性薄膜,其特徵係使用如申請專利範圍第1~7項中任一項之電荷輸送性清漆所製作。A charge-transporting film characterized by using a charge-transporting varnish according to any one of claims 1 to 7 of the scope of patent application. 一種有機電致發光元件,其特徵係具有如申請專利範圍第8項之電荷輸送性薄膜。An organic electroluminescence device, which is characterized by having a charge-transporting film as described in item 8 of the patent application. 如申請專利範圍第9項之有機電致發光元件,其中上述電荷輸送性薄膜為電洞注入層或電洞輸送層。For example, the organic electroluminescence device according to item 9 of the application, wherein the above-mentioned charge transporting film is a hole injection layer or a hole transport layer. 一種電荷輸送性薄膜之製造方法,其特徵係將如申請專利範圍第1~7項中任一項之電荷輸送性清漆塗佈於基材上,以未達200℃進行燒成。A method for manufacturing a charge-transporting film, which is characterized in that a charge-transporting varnish according to any one of claims 1 to 7 is applied to a substrate and fired at a temperature of less than 200 ° C. 一種有機電致發光元件之製造方法,其特徵係使用如申請專利範圍第8項之電荷輸送性薄膜。A method for manufacturing an organic electroluminescence device, which is characterized by using a charge-transporting film such as the item No. 8 in the scope of patent application. 一種電荷輸送性材料,其係由電荷輸送性物質及摻雜物所構成之電荷輸送性材料,其特徵係上述摻雜物為包含雜多酸與選自鹵化四氰基苯醌二甲烷及鹵化或氰化苯醌之至少1種。A charge-transporting material, which is a charge-transporting material composed of a charge-transporting substance and a dopant, characterized in that the above-mentioned dopant includes a heteropoly acid and is selected from a halogenated tetracyanobenzoquinone dimethane and a halogenation Or at least one kind of cyanobenzoquinone. 一種電荷輸送性薄膜之平坦化方法,其係使用選自鹵化四氰基苯醌二甲烷及鹵化或氰化苯醌之至少1種之電荷輸送性薄膜之平坦化方法,其特徵係含有電荷輸送性物質、摻雜物及有機溶劑,上述摻雜物為使用含有雜多酸與選自鹵化四氰基苯醌二甲烷及鹵化或氰化苯醌之至少1種的電荷輸送性清漆。A method for planarizing a charge-transporting film, which is a method for planarizing a charge-transporting film using at least one type selected from the group consisting of a tetracyanohalogenated dichloromethane and a halogenated or cyanobenzoquinone. And a dopant, which is a charge-transporting varnish containing a heteropolyacid and at least one selected from the group consisting of a halogenated tetracyanobenzoquinone dimethane and a halogenated or cyanobenzoquinone.
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