TWI626432B - A device for measuring the beam quality factor - Google Patents

Abstract

The invention relates to a beam quality measuring device, comprising an optical channel comprising a main channel and a plurality of shunt channels disposed on a side of the main channel, wherein the beam passing through the main channel is split by the beam splitter to each shunt channel. . The beam analyzer receives the beam of each of the shunt channels and obtains the lateral distribution width information of the beam at the position of a certain beam. In our proposed device, the beam analyzers of different shunt channels controlled by the same processor can simultaneously record the beam lateral distribution width information at different positions. The present invention provides quality parameters that can be effectively measured in real time to derive a beam.

Description

Beam quality measuring device

The invention relates to a technique for measuring the quality of a laser beam, in particular to a beam quality measuring device capable of simultaneously measuring a plurality of cross-section information on a beam.

At present, the technology of precision processing technology in the technology industry is relatively large. The laser light can be automatically controlled by computer to be applied in welding, engraving, cutting or medical surgery. Therefore, with the development of technology, the demand for laser application will be More and more, and more and more important. The output of the laser light changes with time. However, in order to ensure the quality of the laser processing, the state of the laser beam quality must be monitored in real time to maintain the stability of the laser light quality.

The laser beam quality is judged according to the beam quality parameter of the laser beam. The beam quality parameter also represents the focusing ability of the laser light, which determines the maximum light energy density that can be achieved after focusing. Referring to the first figure, in the conventional method of monitoring the quality of the laser beam, after the laser beam is emitted through the laser emitter 90, the measurer must first find the position of the light beam 94 of the laser beam, and then according to the ISO11146 specification. The optical analyzer 92 moves in the direction of light travel near the waist 94 of the laser beam to measure the lateral distribution width of at least 10 beams at the position of the waist 94, and brings the lateral distribution width of the at least 10 beams into the operational beam quality. The equations of the parameters are computed to calculate the beam quality parameters of the laser beam.

However, in the conventional measurement of the transverse distribution width of the beam of the laser beam, it is necessary to pass the optical analyzer 92 a plurality of times to measure the lateral distribution width of at least 10 beams at the position of the optical waist 94 of the laser beam, which cannot be measured. At the same time, the laser beam is continuously used for the operation, and it is a very cumbersome measurement method for the measurement personnel, which is quite time consuming. Furthermore, since the laser beam changes with time, if the measurement time is too long, the laser beam will continuously change during the measurement period, which may cause the calculated parameters to be unstable, and the calculated parameter error is improved.

In view of the above, the present invention proposes a beam quality measuring device to effectively overcome the above problems in view of the above-mentioned shortcomings of the prior art.

SUMMARY OF THE INVENTION A primary object of the present invention is to provide a beam quality measuring device that simultaneously measures beam lateral distribution width information at a plurality of different positions in a beam to estimate a beam quality parameter in a short time using a beam lateral distribution width.

Another object of the present invention is to provide a beam quality measuring device which, when measuring the lateral distribution width of a plurality of beams of a light beam, has less influence on the light beam, so that the light beam retains a certain intensity when measured. Sustainable use of light beams for work.

In order to achieve the above object, the present invention provides a beam quality measuring device, which comprises an optical channel, the optical channel includes a main channel and a plurality of shunt channels, wherein the main channel can pass a light beam, and the plurality of shunt channels are respectively set to set the main One side of the channel, and the shunt channel inlet of each shunt channel is connected to the main channel, and the main channel and the shunt channel inlet of the shunt channel are further provided with a beam splitter, and the beam splitter can split the beam into multiple split channels to each shunt channel. In the beam analyzer at the exit of the split channel, each beam analyzer can generate beam lateral distribution width information, and each beam analyzer transmits the beam lateral distribution width information to the processor electrically connected to each beam analyzer. The processor can calculate the beam quality parameter of the beam according to the lateral distribution width information of the complex beam.

The processor brings the transverse beam width information of the complex beam into a beam quality 參數 equation to generate the beam quality 光束 of the beam, wherein the beam quality 參數 equation is as follows: among them Transverse width of the beam; For the quality of the beam; The wavelength of the light beam; w ₀ is the radius of the light beam; The position in the beam that detects the lateral distribution width of the beam.

The purpose, technical content, features and effects achieved by the present invention will be more readily understood by the detailed description of the embodiments.

Please refer to the second figure, which is a schematic diagram of the beam quality measuring device of the present invention. The beam quality measuring device 1 includes a casing 10 enclosing an optical channel 20, a plurality of beamsplitters 30, and a plurality of beam analyzers 32. The optical channel 20 includes a main channel 22, and a main channel inlet 220 and a main channel outlet 222 are respectively disposed at two ends thereof, and a plurality of diverting channels 24 are respectively disposed at one side of the main channel 22, and the shunt channel inlet 240 of the branching channel 24 is provided. Interconnected with the main channel 22; the splitting ratio of the plurality of beamsplitters 30 is less than one percent, and each beam splitter 30 is disposed in the main channel 22 and located at the shunt channel inlet 240 of each of the shunt channels 24; the complex beam analyzer 32 may be a light intensity section analyzer, and beam analyzers 32 are respectively disposed at the branching channel outlets 242 of each of the branching channels 24, and may be used to receive the beam and analyze the lateral distribution width information of the beam; a processor 40 may be a computer. For example, a computer host or the like can process a message, wherein the processor 40 is electrically connected to each beam analyzer 32 to receive and store the lateral distribution width information of the beam generated by each beam analyzer 32, so that the processor 40 pairs the plurality The beam profile width information is processed to calculate the beam quality parameters.

Next, please refer to the third figure to illustrate the beam transmission mode when the beam enters the beam quality measuring device 1, wherein the beam is emitted by a beam emitter. In this embodiment, the beam emitter is a laser emitting device 50. The emitted beam is laser light, wherein the laser light emitting device 50 is disposed at the main channel inlet 220 of the main channel 22 to emit a laser beam to enter the laser beam through the main channel inlet 220 of the main channel 22 of the optical channel 20. The position of the waist of the laser beam is entered into the beam splitter 30 having a splitting ratio of less than one percent. At this time, one hundred percent of the light of the laser beam can be split and split by the characteristics of the beam splitter 30. The splitter channel 24 is projected into the beam analyzer 32 of the corresponding beam splitter 30, causing the beam analyzer 32 to analyze the beam profile width information based on this splitting. Then the laser beam is continuously projected into the next beam splitter 30', and the next beam splitter 30' is still placed at the waist of the laser beam, so that the next beam splitter 30' splits the laser beam to split the beam. The other beam profile width information is generated via the split channel 24' to the corresponding beam profiler 32'; the remaining beam splitter 30 and the beam splitter 32 beam projection method are all the same as above, and the description will not be repeated. Each of the beam analyzers 32, 32' generates beam lateral distribution width information, and transmits a plurality of beam distribution width information to a processor 40, and the processor 40 can bring the beam distribution width information into a determined beam quality. In the 參數 equation, the beam quality equation is as follows: among them Transverse width information for the beam; For the quality of the beam; The wavelength of the light beam; w ₀ is the radius of the light beam; The position in the beam that detects the lateral distribution width of the beam. The processor 40 can calculate the beam quality 參數 of the laser beam emitted by the laser light emitting device 50. At the same time, the laser beam will continue to travel straight to the main channel exit 222 of the main channel 22, and in this embodiment, a laser workpiece 60 may be disposed at the main channel outlet 222 of the main channel 22, such as an engraved article. Since the splitting ratio of the beam splitter 30 used in the embodiment is less than one percent, the quality of the laser beam finally emitted by the main channel outlet 222 is not affected, and the quality of the normal laser beam is maintained. The laser processed material 60 can be processed normally.

Since the processor 40 calculates the beam quality 參數, it is preferable to obtain at least ten beam lateral distribution width information to be calculated by substituting the beam quality 參數 equation, so that the shunt channel 24, the beam splitter 30, and the beam analysis of the present embodiment are optimal. The instrument 32 should be at least ten, which facilitates the calculation of the beam quality 处理器 by the processor 40.

In summary, the present invention utilizes the arrangement of a plurality of beamsplitters to split the optical waist position of the laser beam to the beam analyzer, so that the present invention can measure the lateral distribution width of the beam at a plurality of different positions in the beam at the same time. The information is used to estimate the quality parameter of the beam by using the lateral distribution width information of the beam in a short time, and since the beam quality measuring device of the present invention can utilize the characteristic that the beam splitter has a splitting ratio of less than one percent, the detected The laser beam can still retain the intensity of the laser beam, can be used for measurement during the measurement process, and can use the beam quality measuring device to measure the beam quality of the beam synchronously when operating the laser beam.參數, the beam quality of the beam is measured in real time, and the beam quality can be monitored at any time.

The above is only the preferred embodiment of the present invention and is not intended to limit the scope of the present invention. Therefore, any changes or modifications of the features and spirits of the present invention should be included in the scope of the present invention.

1‧‧‧beam quality measuring device

10‧‧‧shell

20‧‧‧Light channel

22‧‧‧Main channel

220‧‧‧ main entrance

222‧‧‧ main channel exit

24, 24' ‧ ‧ diversion channel

240‧‧‧Swirl channel entrance

242‧‧ ‧Diversion channel exit

30, 30’‧‧ ‧beam splitter

32, 32'‧‧‧ Beam Analyzer

40‧‧‧ processor

50‧‧‧Laser light emitting device

60‧‧‧Laser processing

90‧‧‧Laser transmitter

92‧‧‧Light Analyzer

94‧‧‧Light waist

The first figure is a schematic diagram of a conventional laser beam measuring device. The second figure is a schematic view of the apparatus of the present invention. The third figure is a schematic diagram of the state of the measuring beam of the present invention.

Claims (9)

A beam quality measuring device comprises: an optical channel comprising a main channel and a plurality of shunt channels, wherein the main channel can pass a light beam, and the shunt channels are disposed on at least one side of the main channel, and each of the shunt channels a split channel inlet is connected to the main channel; a plurality of beamsplitters are disposed on the main channel, and respectively located at the branch channel entrance of each of the shunt channels, to split the beam of the main channel into a corresponding plurality of beams In the equal-dividing channel, wherein the splitting beams have a splitting ratio of less than one percent; the plurality of beam analyzers are respectively disposed at the outlets of each of the splitting channels to receive the splitting of each of the splitting channels, Generating a transverse beam width information of the plurality of beams of the beam; and a processor coupled to the beam analyzer to generate a beam quality parameter of the beam based on laterally distributing the width information of the beams. The beam quality measuring device according to claim 1, wherein the processor brings the beam lateral distribution width information into a beam quality parameter equation to generate the beam quality parameter of the beam, and the beam quality parameter equation is as follows Shown as follows: Where w is the transverse distribution width information of the beam; the M ^{2 is} the beam quality parameter; the λ is the wavelength of the light of the beam; the w ₀ is the radius of the beam waist of the beam; the z is the detected in the beam The beam laterally distributes the position of the width information. The beam quality measuring device according to claim 1, wherein the beam splitter and the beam analyzer are at least ten. The beam quality measuring device according to claim 1, further comprising a casing covering the optical channel, The beamsplitters and the beam analyzers. The beam quality measuring device according to claim 1, wherein the beam analyzer is a light intensity section analyzer. The beam quality measuring device of claim 1, wherein the processor is a computer. The beam quality measuring device of claim 1, wherein the beam is emitted by a beam emitter. The beam quality measuring device of claim 7, wherein the beam emitter is a laser light emitting device. The beam quality measuring device of claim 1, wherein a laser processing object is disposed at a main channel outlet of the main channel.