TWI613314B - Film forming device and partition wall structure of film forming device - Google Patents

Abstract

The present invention provides a film forming apparatus and a partition wall structure of the film forming apparatus. The partition wall structure of the present invention forms at least one film forming region inside a chamber of the film forming apparatus. The partition wall structure includes a circumferential restriction portion and a pair of partition walls. The circumferential restricting portion is connected to the partition wall, so that the relative position of the circumferential restricting portion and the partition wall is fixed. When the partition wall is installed in the chamber, the inner surface of the partition wall faces the outer peripheral surface of the film forming roller with a gap therebetween. The circumferential restricting portion forms a film forming area facing the outer peripheral surface of the film forming roller. The film forming apparatus of the present invention includes a pair of partition walls, which are fixed to the chamber, and are disposed on the two sides in the width direction of the film forming roller at positions where a gap is separated from the film forming roller. It has an outer side facing the radially outer side of the film forming roll and an inner side facing the radially inner side of the film forming roll. The baffle is installed on the outer side of the partition wall, and the inner side of the partition wall is located more than the outer peripheral surface of the film forming roll. Positioned radially inward of the film forming roller.

Description

Film forming device and partition wall structure of film forming device

The present invention relates to a film forming apparatus that forms a film on the surface of a substrate, and a partition wall structure that forms a film forming region inside a chamber in the film forming apparatus.

Conventionally, a film forming apparatus that continuously forms a film on the surface of a belt-shaped substrate wound around a film forming roll includes a film forming apparatus that forms a plurality of film forming regions inside a chamber, and can The film formation is performed under individual film formation conditions (for example, pressure, composition of material gas, etc.). In such a film forming apparatus, the pressure inside each film forming zone needs to maintain a pressure higher than the pressure outside the film forming zone while maintaining the pressure determined for each film forming zone.

Therefore, conventionally, as described in Japanese Patent Application Laid-Open No. 2014-65932, a partition wall structure is formed around the outer peripheral surface of the film-forming roller to form a plurality of film-forming regions that individually set pressures. The partition wall structure includes a plurality of partition walls that partition the interior of the chamber into a plurality of film forming regions, and a cover that covers the outer peripheral surface of the film forming roller. The plurality of partition walls are arranged to extend radially in the radial direction of the film forming roller. The end of the partition wall farther from the film forming roller is fixed On the inner wall of the chamber. A cover is fixed to an end portion of the partition wall closer to the film forming roller. The cover has a roller-opposing wall facing the outer peripheral surface of the film-forming roller, and a space at both ends in the width direction of the film-forming roller that communicates each film-forming region to the interior of the chamber, and suppresses gas to other film-forming regions. Incoming chamber communication. The roll-opposing wall and the partition wall form a film-forming area on the radially outer side of the film-forming roll of the roll-opposing wall.

On the roller-opposing wall, an opening is formed for the particles of the film-forming material to fly out from the evaporation source inside the film-forming area and face the substrate. The roller opposing wall is arranged at a position separated from the outside of the film forming roller in the radial direction. That is, a gap is formed between the surface of the roll-opposing wall that faces the radially inner side of the film-forming roll and the outer peripheral surface of the film-forming roll. When the gas in the film forming area passes through the opening of the opposite wall of the roll during the film forming process, the size of the gap can be set to limit the flow of gas leaking out of the film forming area along the outer peripheral surface of the film forming roll. . This makes it possible to individually maintain the pressure inside each film formation zone at a higher pressure than the pressure outside the film formation zone during the film formation operation.

In the film forming process, when particles of the film forming material fly out from an evaporation source inside the film forming area, the particles pass through the opening of the opposing wall of the roller and collide with the substrate on the outer peripheral surface of the film forming roller. Thereby, a thin film can be formed on the surface of a base material. In order to prevent the particles from adhering to the roll-opposing wall of the cover during film formation, a baffle having an opening is mounted on the roll-opposing wall on the side opposite to the film-forming roll, that is, the direction of the roll-opposing wall to form a film The radially outer side of the roll. The opening width of the baffle (the width in the width direction of the film forming roller) defines a range in which a thin film formed on the surface of the substrate is formed.

In the above-mentioned prior art partition wall structure, the rollers face The size of the gap between the wall and the outer peripheral surface of the film forming roller has a large relationship with the flow of gas leaking to the outside of the film forming area. Therefore, the accuracy of the relative position of the roller facing the wall relative to the outer peripheral surface of the film forming roller is Important, but it is not easy to manage this relative position with high precision.

In addition, the partition wall structure has a structure in which the cover has a roller-opposing wall and a chamber communicating portion, and the cover is fixed to a position separated from the inner wall of the chamber by a plurality of partition walls, so the structure is complicated.

Further, in the film forming apparatus of the related art described above, in the cover for forming the film forming zone, the surface of the roller opposing wall facing the radially inner side of the film forming roller is arranged with respect to the outer peripheral surface of the film forming roller. The position of the width of the gap is separated outward. Therefore, the baffle plate arranged on the surface of the roller facing wall facing the radially outer side of the film forming roller is separated from the outer peripheral surface of the roller, and the distance by which the thickness of the roller facing wall is added to the gap. Therefore, the distance between the baffle plate and the outer peripheral surface of the film forming roller is increased, and therefore, particles from the evaporation source easily diffuse to a position outside the opening width of the baffle plate after passing through the opening of the baffle plate. The amount of particles that diffuse to the outside of the opening width of the baffle and adhere to the substrate is smaller than the amount of particles that adhere to the base within the range of the opening width of the baffle. As a result, at the time of film formation, there may be a possibility that the area where the thickness of the thin film formed is thinner at the both ends of the substrate in the width direction than the opening width of the baffle. Therefore, it is difficult to improve the thickness distribution of the film.

The present invention has been made in view of the above-mentioned circumstances, and an object thereof is to provide a partition structure which can be simplified in a simplified manner. The single structure maintains high accuracy with respect to the relative position of the structural component with respect to the film forming roller.

Furthermore, an object of the present invention is to provide a film forming apparatus capable of suppressing the distance between the baffle plate and the outer peripheral surface of the film forming roller and improving the thickness distribution of the formed film.

The partition wall structure of the present invention is a partition wall structure of a film forming device, and the film forming device is continuously formed inside a chamber on a surface of a belt-shaped substrate conveyed along an outer peripheral surface of a film forming roller using a gas. A membrane, the partition wall structure forming at least one film forming area inside the chamber, characterized in that the partition wall structure includes a circumferential restricting portion and a pair of partition walls, and the pair of partition walls has a shape capable of being mounted in the chamber. And has an inner peripheral surface, and when the pair of partition walls is installed in the chamber, the inner peripheral surface faces the outer peripheral surface of the film forming roller on both sides in the width direction of the film forming roller with a gap therebetween. The circumferential restricting portion forms at least one film forming area inside the chamber facing the outer peripheral surface of the film forming roller, and the circumferential restricting portion is connected to the partition wall so that the circumferential restricting portion is in contact with the partition wall. The relative position is fixed.

In the partition wall structure, the partition wall is connected to the peripheral restricting portion, so that the relative position of the partition wall and the peripheral restricting portion is fixed, so that they can be positioned relative to the chamber of the film forming apparatus. Together with high precision. Specifically, in order to form the gap constituting the width-direction flow path by mounting the partition wall on the chamber so that the inner peripheral surface thereof faces the outer peripheral surface of the film forming roller, the partition wall needs to be relatively high with respect to the chamber. Positioning accuracy, but the aforementioned circumferential restriction is connected to the partition wall so that the relative The position is fixed with respect to the partition wall. Therefore, with the high-precision positioning of the partition wall with respect to the cavity, the positioning of the circumferential restriction portion with respect to the cavity is naturally performed with high accuracy. Compared with the case where the partition wall is positioned independently of the chamber with respect to the cavity, this positioning operation is easier, and the mounting operation of the peripheral control portion is also easier.

In addition, the partition wall structure having the above-mentioned structure is a structure in which the circumferential direction restricting portions are mounted on a pair of partition walls, and therefore the structure is simpler than the conventional partition wall structure, which is the following structure: The cover has a roller facing wall and a chamber communication portion, and the cover is fixed at a position separated from the inner wall of the chamber by a plurality of partition walls.

In addition, it is preferable that the outer peripheral surface of the film forming roller is cylindrical, the partition wall has an inner peripheral surface, and the inner peripheral surface spans the film forming roller in a state where the partition wall is mounted in the chamber. The outer peripheral surface of the cylindrical shape is opposed to the entire periphery, and the inner peripheral surface has a certain inner diameter that is larger than the outer diameter of the outer peripheral surface.

The partition wall has an inner peripheral surface having a constant inner diameter, which faces the cylindrical outer peripheral surface of the film forming roller. Therefore, when the partition wall is installed in the chamber such that the inner peripheral surface of the partition wall and the outer peripheral surface of the film forming roller are concentric, the inner peripheral surface of the partition wall and the outer peripheral surface of the film forming roller are spanned. The film roll is formed accurately with a constant width throughout the entire circumference. This makes it possible to make the amount of gas passing through the gap uniform over the entire circumference of the film forming roller.

Further, it is preferable that the partition wall is composed of a plurality of portions separated from each other so as to divide the inner peripheral surface.

According to such a scheme, the film forming roller is assembled into the chamber After that, the plural portions constituting the partition wall are fixed to the chambers, respectively, whereby the partition wall can be easily assembled in the chamber. That is, in the case where the partition wall is continuous across the entire circumference on the inner peripheral surface, it is necessary to face the partition wall with the inner peripheral surface facing the outer peripheral surface of the film forming roller before assembling the film forming roller into the chamber. The method is pre-installed on both sides of the film-forming roll, and then the film-forming roll with the partition wall installed is assembled into the chamber. Therefore, the assembling operation of the partition wall is complicated. On the other hand, in the case of the partition wall composed of a plurality of parts separated from each other as described above, the partition wall can be easily assembled into the chamber after the film forming roller is assembled into the chamber.

The partition wall may have a main body portion having a shape in which, when the partition wall is attached to the chamber, the main body portion is disposed at the width from both ends in the width direction of the film forming roller. The position separated in the direction.

According to this aspect, since the main body portion of the partition wall is disposed at a position separated from the both ends in the width direction of the film forming roller in the width direction, the diameter of the film forming roller can be made larger than the outer peripheral surface of the film forming roller. Being arranged inwardly, the thickness of the main body portion can be secured, and thereby the rigidity of the partition wall can be improved.

The partition wall may further include an extension portion that extends from the main body portion along the outer side surface and forms a gap with the outer peripheral surface of the film forming roller.

According to this aspect, the extension portion of the partition wall portion extends from the main body portion in the width direction of the film forming roller, and forms a gap with the outer peripheral surface of the film forming roller. This gap can function as a width direction flow path, thereby enabling The gas is restricted from flowing outward in the width direction of the film forming roller.

Further, it is preferable that the partition wall structure is a partition wall structure used in a film forming apparatus, the film forming apparatus has a plurality of film forming regions as the at least one film forming region, and the circumferential restricting portion has an interval row. The air exhaust plate is mounted on the pair of partition walls so as to extend in the width direction of the film forming roller so as to be sandwiched between the film forming areas. The air exhaust plate is installed at a position as described below. On the partition wall: in a state where the partition wall is installed in the chamber, a gap is formed between the section exhaust plate and the outer peripheral surface of the film forming roller, the gap forms a circumferential flow path, and the circumferential flow path restricts the aforementioned The flow of the gas in the circumferential direction of the film forming roller.

According to such a configuration, the section exhaust plate sandwiched between the film formation areas is mounted on the partition wall, and thus the partition wall can be installed on the outer periphery of the section exhaust plate and the film forming roller in a state where the partition wall is installed in the chamber. Uniform gaps are easily formed between the faces. Therefore, a circumferential flow path that restricts the flow of the gas in the circumferential direction of the film forming roller can be easily and accurately formed by the gap.

Further, it is preferable that the circumferential restricting portion further includes a differential exhaust hood which forms an exhaust passage between the film forming regions, and the differential exhaust hood can be formed with respect to the outer peripheral surface of the film forming roller. The position of the gap is mounted on the partition wall, and the differential exhaust hood is arranged on both sides in the circumferential direction of the section exhaust plate in the direction in which the section exhaust plate extends. The air hood and the section exhaust plate form a differential exhaust area as the exhaust passage between the film formation area.

According to such a scheme, the differential exhaust hood is installed in the partition In this way, a uniform gap can be easily formed with respect to the outer peripheral surface of the film forming roller. Therefore, by arranging the differential exhaust hood on both sides in the circumferential direction of the section exhaust plate, a pair of differential exhaust hoods and section exhaust plates can be easily formed as a row between the film forming regions. Differential exhaust area of the air passage.

Further, it is preferable that the circumferential restricting portion further includes a partition plate for preventing gas inside the film formation region from leaking from a path other than a width direction flow path and a circumferential flow path, and the partition plate is mounted on the partition wall.

According to such a configuration, the partition plate that prevents the gas inside the film formation area from leaking from a path other than the width direction flow path and the circumferential flow path is mounted on the partition wall, so that the partition wall installed in the chamber can be used as the partition plate. The benchmark for positioning is used. As a result, it is not necessary to adjust the positioning of the partition plate.

Further, it is preferable that the partition wall structure is a partition wall structure used in a film forming apparatus, the film forming apparatus has a plurality of film forming regions as the at least one film forming region, and the circumferential restricting portion has an interval row. A gas plate, a differential exhaust hood, and a partition plate, the interval exhaust plate is sandwiched between the film forming areas, the differential exhaust cover forms an exhaust passage between the film forming areas, and the partition plate prevents The gas inside the film forming area leaks from a path other than the width direction flow path and the circumferential flow path, and at least one of the section exhaust plate, the differential exhaust hood, and the partition plate is detachably fixed to the foregoing. On the dividing wall.

According to such a scheme, at least one of the section exhaust plate, the differential exhaust hood, and the partition plate is detachably fixed to the partition wall, so it is easy to install and disassemble these members. Therefore, maintenance and replacement of these components are easier.

The film-forming apparatus of the present invention is a film-forming apparatus that continuously forms a film on the surface of a belt-shaped substrate using a gas, and includes the above-mentioned partition wall structure, the chamber, the film-forming roller, and a baffle. The baffle is disposed inside the film forming area so as to face the outer peripheral surface of the film forming roller, and has an opening that defines a width of the film formed by the film on the surface of the substrate, and the partition wall. The baffle is mounted on the outer surface of the partition wall, and the inner side of the partition wall is located on the outer surface facing the radially outer side of the film forming roller and the inner surface facing the radially inner side of the film forming roller; The outer peripheral surface of the film-forming roll is positioned more radially inward than the film-forming roll.

The film-forming apparatus of the present invention uses the above-mentioned partition wall structure, whereby a gap allowing the gas to flow in the width direction can be formed between the partition wall and the film-forming roller, and at the same time, the outer peripheral surface of the baffle and the film-forming roller can be formed The proximity of each other improves the thickness distribution of the formed thin film. Specifically, according to the above aspect, the inner side surface of the partition wall that faces the radially inner side of the film forming roller is located closer to the radially inner side of the film forming roller than the outer peripheral surface of the film forming roller. That is, the outer peripheral surface of the film forming roll and the inner surface of the partition wall are staggered in the radial direction of the film forming roll. Further, a baffle plate disposed inside the film forming area formed inside the chamber is attached to an outer surface of the partition wall facing the radially outer side of the film forming roller. Therefore, the distance between the baffle plate and the outer peripheral surface of the film forming roller can be made closer to the distance than the thickness of the partition wall (that is, the distance between the outer side surface and the inner side surface). As a result, during the film formation, the thinner film-thickness regions that occur due to the particles of the film-forming material flying out from the evaporation source inside the film-forming region without sufficiently colliding can be changed at both ends in the width direction of the substrate. small. Therefore, improving the thickness of the film Distribution, film thickness uniformity is improved.

In addition, it is preferable that a horizontal direction along the circumferential direction of the film forming roller is formed at a portion of the film forming roller that is closer to the outer side in the width direction of the film forming roller than both end portions in the width direction of the outer peripheral surface. A groove extending across the entire circumference of the film forming roller, the partition wall has a shape capable of being inserted into the groove, the partition wall is inserted into the groove, and is disposed to separate the gap from an inner wall of the groove s position.

In such a solution, a partition wall having a shape capable of being inserted into a groove extending in the circumferential direction of the film forming roller can form a gap allowing the gas to flow in the width direction between the partition wall and the film forming roller. At the same time, the outer peripheral surface of the baffle and the film forming roller can be brought closer to each other, and the thickness distribution of the formed film can be improved. Further, the partition wall is inserted into a groove formed on the outer side in the width direction from the width direction end portion of the outer peripheral surface, so that the inner side surface of the partition wall can be positioned closer to the outer peripheral surface of the film forming roller. The position on the radially inner side of the film roll. Therefore, the thickness of the partition wall can be secured, and thereby the rigidity of the partition wall can be improved. In addition, a gap extending along the circumferential direction of the film forming roller is uniformly formed between the partition wall and the inner wall of the groove, so that the amount of gas passing through the gap can be made uniform throughout the entire circumference of the film forming roller.

In addition, the partition wall may include a main body portion and an extension portion, the main body portion may be fixed to the chamber, and may be disposed at a position separated from both ends in the width direction of the film forming roller in the width direction, and may include: In the outer side surface and the inner side surface, the extension portion extends from the main body portion along the outer side surface, forms the gap between the outer side surface and the outer peripheral surface of the film forming roller, and the baffle is mounted on the outer side surface of the main body portion. on.

According to such a configuration, the main body portion of the partition wall is disposed at a position separated from both ends in the width direction of the film forming roller in the width direction, so that the inner side surface thereof can be positioned closer to the film than the outer peripheral surface of the film forming roller. Position of the radial inside of the roller. Thereby, the baffle plate mounted on the outer surface of the main body portion can be brought close to the outer peripheral surface of the film forming roller, and the thickness distribution of the formed film can be improved. That is, the main body portion of the partition wall is disposed at a position separated from both end portions in the width direction of the film forming roller in the width direction, and the baffle is attached to the outer surface of the main body portion. Therefore, the distance between the baffle plate and the outer peripheral surface of the film forming roller can be made closer to the distance than the thickness of the main body portion (that is, the distance between the outer side surface and the inner side surface). In addition, the inner side surface of the main body portion can be positioned radially inward of the film forming roller than the outer peripheral surface of the film forming roller, the thickness of the main body portion can be ensured, and thereby the rigidity of the partition wall can be improved. Further, the extension portion of the partition wall portion extends along the outer side surface from the main body portion, and forms a gap with the outer peripheral surface of the film forming roller. This gap functions as a width direction flow path, and thereby it is possible to restrict the flow of the gas to the outside in the width direction of the film forming roller.

In addition, the film-forming apparatus of the present invention is a film-forming apparatus that continuously forms a film on the surface of a belt-shaped substrate using a gas, and is characterized by including a chamber, a film-forming roller, a circumferential restricting portion, a baffle, and a As for the partition wall, the film forming roller is rotatably installed inside the chamber, and has an outer peripheral surface capable of contacting the substrate. The pair of partition walls are fixed to the chamber, and the width of the film forming roller is The two sides in the direction are arranged at a position spaced from the film forming roller, and the circumferential restricting portion forms at least one film forming region facing the outer peripheral surface of the film forming roller inside the chamber. The baffle is disposed inside the film forming area so as to face the outer peripheral surface of the film forming roller, and has an opening that defines the width of the film formed by the film on the surface of the substrate, and the partition wall has a direction The outer surface on the radially outer side of the film forming roller and the inner surface on the radially inner side of the film forming roller, the baffle is mounted on the outer surface of the partition wall, and the inner side of the partition wall is positioned higher than the The outer peripheral surface of the film forming roller is located closer to the radially inner side of the film forming roller.

According to the present invention, a gap is formed between the partition wall and the film forming roller to allow gas to flow in the width direction. At the same time, the outer peripheral surface of the baffle and the film forming roller are brought close to each other, thereby improving the thickness distribution of the formed film. Specifically, according to the above aspect, the inner side surface of the partition wall that faces the radially inner side of the film forming roller is located closer to the radially inner side of the film forming roller than the outer peripheral surface of the film forming roller. That is, the outer peripheral surface of the film forming roll and the inner surface of the partition wall are staggered in the radial direction of the film forming roll. Further, a baffle disposed inside the film forming area formed inside the chamber is attached to an outer surface of the partition wall facing the radially outer side of the film forming roller. Therefore, the distance between the baffle plate and the outer peripheral surface of the film forming roller can be made closer to the distance than the thickness of the partition wall (that is, the distance between the outer side surface and the inner side surface). As a result, at the both ends of the substrate in the width direction at the time of film formation, the area where the film thickness is thinner can be made smaller, the distribution of the thickness of the film is improved, and the uniformity of the film thickness is improved. In addition, the partition walls fixed to the chamber are arranged on the both sides in the width direction of the film forming roller at positions separated from the film forming roller by a gap. This gap can function as a width direction flow path, and the width direction flow path restricts the flow of gas from the outer periphery of the film forming roll to the widthwise outside of the film forming roll.

In addition, it is preferable that a portion extending on the film forming roller in the widthwise outer side of the film forming roller at both ends of the outer peripheral surface in the width direction is formed to extend in the circumferential direction of the film forming roller. The partition wall has a ring shape that can be inserted into the circular groove. The partition wall is inserted into the groove and is disposed to be separated from the inner wall of the groove. The position of the aforementioned gap.

In such a solution, a simple ring-shaped partition wall can form a gap allowing the gas to flow in the width direction between the partition wall and the film forming roller, and at the same time, the baffle and the outer peripheral surface of the film forming roller can be formed. The proximity of each other improves the thickness distribution of the formed thin film. In addition, since the annular partition wall has a simple shape, it is easy to manufacture it with high accuracy. Further, the annular partition wall is inserted into an annular groove formed outside the width direction end portion of the outer peripheral surface in the width direction of the film forming roller, whereby the inner side surface of the annular partition wall can be located The outer peripheral surface of the film forming roller is positioned closer to the radially inner side of the film forming roller. Therefore, the thickness of the partition wall can be secured, and thereby the rigidity of the partition wall can be improved. In addition, since an annular gap is formed uniformly between the annular partition wall and the inner wall of the groove, the amount of gas passing through the gap can be made uniform throughout the entire circumference of the film forming roller.

Further, it is preferable that the annular partition wall is composed of a plurality of arc-shaped portions separated from each other.

According to such a scheme, after the film forming roller is assembled into the chamber, the arc-shaped portions constituting the annular partition wall are respectively fixed to the chamber, and thus the annular partition wall can be easily assembled into the chamber. on. That is, in the case of a ring-shaped partition wall continuous over the entire circumference, it is necessary to Before the film roll is assembled in the cavity, the partition wall is installed on both sides of the film forming roll, and then the film forming roll with the partition wall installed in the cavity is assembled, and the assembly operation is complicated. On the other hand, in the case of the annular partition wall composed of a plurality of arc-shaped portions separated from each other as described above, the partition wall can be easily assembled into the chamber after the film forming roller is assembled into the chamber. .

In addition, the partition wall may include a main body portion, the main body portion may be fixed to the chamber, and may be disposed at positions separated from both ends in the width direction of the film forming roller in the width direction, and may include the outer portion. In the side surface and the inner surface, the baffle is attached to the outer surface of the main body portion.

According to such a configuration, the main body portion of the partition wall is disposed at a position separated from both ends in the width direction of the film forming roller in the width direction, so that the inner side surface thereof can be positioned closer to the film than the outer peripheral surface of the film forming roller. Position of the radial inside of the roller. Thereby, the baffle plate mounted on the outer surface of the main body portion can be brought close to the outer peripheral surface of the film forming roller, and the thickness distribution of the formed film can be improved. That is, the main body portion of the partition wall is disposed at positions separated from the both end portions in the width direction of the film forming roller in the width direction, and the baffle is attached to the outer surface of the main body portion. Therefore, the distance between the baffle plate and the outer peripheral surface of the film forming roller can be made closer to the distance than the thickness of the main body portion (that is, the distance between the outer side surface and the inner side surface). In addition, the inner side surface of the main body portion can be positioned radially inward of the film forming roller than the outer peripheral surface of the film forming roller, the thickness of the main body portion can be ensured, and thereby the rigidity of the partition wall can be improved.

Preferably, the partition wall further includes an extension portion, and the extension portion extends from the main body portion along the outer side surface and is in contact with the film forming roller. A gap is formed between the aforementioned outer peripheral surfaces.

According to this aspect, the extension portion of the partition wall portion extends along the outer side surface from the main body portion, and forms a gap with the outer peripheral surface of the film forming roller. This gap functions as a width direction flow path, and thereby it is possible to restrict the flow of the gas to the outside in the width direction of the film forming roller.

In addition, it is preferable that the circumferential restricting portion is attached to the outer surface of the partition wall.

The partition wall is fixed to the chamber, and is positioned inside the chamber with high accuracy. Therefore, since the circumferential direction restriction part is attached to the outer surface of this partition wall, the circumferential direction restriction part can be arrange | positioned at the position which opposes the outer peripheral surface of a film forming roller with high precision and easily.

Further, it is preferable that the circumferential restricting portion includes a section exhaust plate facing the outer peripheral surface of the film forming roller, and the section exhaust plate is secured in a state where a gap is secured with respect to the outer peripheral surface of the film forming roller. It is fixed on the partition wall.

According to this aspect, since the section exhaust plate is fixed to the outer surface of the partition wall, it is possible to easily secure a uniform gap with respect to the peripheral surface of the film forming roller.

As described above, according to the partition wall structure of the present invention, it is possible to maintain high accuracy with respect to the relative positions of the pair of partition walls and the circumferential restricting portions with respect to the film forming roller as structural components with a simple structure.

Furthermore, according to the film forming apparatus of the present invention, it is possible to suppress the distance between the baffle plate and the outer peripheral surface of the film forming roller, and improve the thickness distribution of the formed film.

1‧‧‧ film forming device

2‧‧‧ chamber

2a‧‧‧Internal space

2b‧‧‧The first mounting section

2c‧‧‧Second mounting section

3‧‧‧film forming roller

3a‧‧‧outer surface

3b‧‧‧slot

3b1‧‧‧Width wall

3b2‧‧‧ radial wall

3c‧‧‧ both ends

4‧‧‧ partition wall structure

5‧‧‧ bezel

5a‧‧‧ opening

6‧‧‧ evaporation source

7‧‧‧ roll out

8‧‧‧ Take-up Department

11‧‧‧ film forming area

12‧‧‧ Conveying area

13‧‧‧Pump

14‧‧‧Gas supply port

15‧‧‧ pump

21‧‧‧ annular partition wall

21a‧‧‧ Outside

21A, 21B‧‧‧‧parts

21b‧‧‧ inside

21c‧‧‧Main body

21d‧‧‧Extension

22‧‧‧ weekly restriction

24‧‧‧ interval exhaust panel

24a‧‧‧ opening

25‧‧‧ Differential exhaust hood

26‧‧‧ divider

26a‧‧‧ weekly section

26b‧‧‧Width direction part

27‧‧‧ Differential exhaust zone

28‧‧‧ Clearance

31‧‧‧bearing

32‧‧‧ tube

33‧‧‧Sealing member

34‧‧‧ spacer

35‧‧‧Fixed components

36‧‧‧ Clearance

36a‧‧‧Width gap

36b‧‧‧Radial clearance

36c‧‧‧Radial Clearance

36d‧‧‧Width gap

37‧‧‧ weekly flow path

121‧‧‧ annular partition wall

121a‧‧‧ outside

121b‧‧‧ inside

FIG. 1 is a front view schematically showing an internal structure of a film forming apparatus including a partition structure according to an embodiment of the present invention.

FIG. 2 is a perspective view showing the inside of a chamber of the film forming apparatus of FIG. 1.

FIG. 3 is a perspective view of the film forming roller of FIG. 1.

FIG. 4 is a perspective view showing a film forming roller, an annular partition wall, and a section exhaust plate of FIG. 1.

FIG. 5 is an exploded perspective view of a partition wall structure showing a procedure for assembling the partition wall structure and mounting a baffle in FIG. 1.

FIG. 6 is a perspective view of the baffle and its surroundings in a state where the baffle of FIG. 5 is attached. FIG.

FIG. 7 (a) is a sectional view taken along the line VII-VII in FIG. 1, and FIG. 7 (b) is an enlarged view near the annular partition wall in FIG. 7 (a).

FIG. 8 is a cross-sectional view showing a state where the annular partition wall of FIG. 1 is fixed to the chamber.

FIG. 9 (a) is a view showing a state where a film is formed by sputtering on a substrate surface using the baffle of FIG. 8, and FIG. 9 (b) shows a state formed on the substrate surface of FIG. 9 (a) A graph showing the relationship between the thickness of the film and the position in the width direction of the substrate.

FIG. 10 is a cross-sectional view showing an arrangement of a baffle inside the film-forming region of FIG. 1.

FIG. 11 is an enlarged cross-sectional view of the vicinity of the baffle in FIG. 10.

FIG. 12 is a perspective explanatory view showing a state in which the gas inside the film-forming region of FIG. 1 is discharged toward the width direction and the circumferential direction of the film-forming roller to the outside of the film-forming region.

FIG. 13 is a cross-sectional explanatory view showing a state in which an annular partition wall suitable for a filmless roll suitable for a groove is disposed according to another embodiment of the present invention.

FIG. 14 (a) shows a comparative example of the present invention, in which a ring-shaped partition wall is arranged on the radially outer side of the outer peripheral surface of the film-forming roll, and a borrower is borrowed on the surface of the substrate in a state where a baffle is attached to the ring-shaped partition wall FIG. 14 (b) is a graph showing the state of film formation by sputtering. FIG. 14 (b) is a graph showing the relationship between the thickness of the film formed on the substrate surface in FIG. 14 (a) and the position in the width direction of the substrate.

Hereinafter, embodiments of the partition wall structure of the present invention and a film forming apparatus including the partition wall structure will be described in detail with reference to the drawings.

The film-forming apparatus 1 shown in FIGS. 1 to 2 uses a gas G on a belt-shaped substrate B in at least one (four in FIG. 1) film-forming region 11 formed of a partition structure 4. A device that continuously forms a thin film on the surface. The film forming apparatus 1 may be any apparatus that continuously forms a thin film on the surface of the substrate B using a gas G, and a film forming apparatus that performs sputtering, vacuum evaporation, plasma CVD, or the like. In the following embodiments, the film forming apparatus 1 that performs sputtering is described as an example.

This film forming apparatus 1 includes a chamber 2, a film forming roller 3 rotatably mounted inside the chamber 2, a partition wall structure 4 forming a plurality of film forming regions 11, and a baffle plate 5 disposed in each film forming region 11. And an evaporation source 6, a winding section 7 for winding the substrate B to the film forming roller 3 from a roll of the substrate B, and a winding section 8 for winding the film-formed substrate B into a roll shape.

The base material B is made of resin, metal, glass, or the like, as long as it has a thin band shape.

The chamber 2 is a hollow box having an internal space 2a. The chamber 2 is connected to pumps 13 and 15 such as a turbo molecular pump (TMP) or a vacuum pump as an exhaust mechanism.

The internal space 2a of the chamber 2 is divided into five spaces by the film forming roller 3 and the partition wall structure 4, that is, four film forming areas 11 and one conveying area 12. The four film forming areas 11 are on the film forming roller 3. The film formation region of the film formation of the substrate B was performed on the surface of the substrate. In addition, at least one film-forming region 11 is sufficient. The number of the film forming regions may be one or plural. The transport zone 12 is a non-film-forming region in which the film formation of the substrate B is not performed, and the unwinding section 7 and the winding section 8 are accommodated.

A gas supply port 14 is provided in each film formation zone 11. A gas G, such as argon or oxygen, which is used in the sputtering film formation, is supplied to each film formation region 11 through the gas supply port 14. Since the pump 13 is connected to each film-forming area 11, the pressure of each film-forming area 11 can be adjusted individually. The evaporation source 6 provided in each film-forming region 11 is selected corresponding to the type of the thin film formed in each film-forming region 11. In addition, a plurality of pumps 13 may be connected to each of the film forming regions 11, and may be arranged in a line in the width direction of the film forming rollers 3.

A pump 15 is connected to the transfer area 12. Thereby, the conveyance zone 12 is decompressed to a vacuum state or a low-pressure state. In addition, a plurality of pumps 15 may be connected to the transfer area 12.

Each of the film formation regions 11 communicates with the transporting region 12 via a width direction flow path 36 and a circumferential flow path 37 shown in FIG. 12. The dimensions of these widthwise flow paths 36 and circumferential flow paths 37 are set in accordance with the shape and mounting position of the partition wall structure 4. By setting the sizes of these width-direction flow paths 36 and circumferential flow paths 37, the amount of exhaust gas E flowing to the outside of the film formation zone 11 is limited. For example, in the case of the film forming apparatus 1 that performs sputtering, the film forming region 11 is maintained at a higher pressure than the internal pressure of the conveying region 12. In this case, for example, the pressure in the film formation zone 11 is about 0.3 to 0.5 Pa, and the pressure in the transport zone 12 is set to be a base pressure lower than the pressure, for example, about 10 ^-3 to 10 ^-4 Pa . Before the film forming process, the pressure of the entire film forming area 11 and the conveying area 12 is reduced to about 10 ^-3 to 10 ^-4 Pa by the pump 15. In addition, in the case of the film forming apparatus 1 that performs CVD, the film forming zone 11 needs to be set to a low pressure (negative pressure) lower than the internal pressure of the conveying zone 12 so that dirty gas does not flow out of the film forming zone 11. Just fine.

As shown in FIG. 3, the film forming roller 3 has a shape having a cylindrical outer peripheral surface, and specifically, both end portions have a cylindrical shape with a locally small diameter (so-called stepped cylindrical shape). That is, the film forming roller 3 has an outer peripheral surface 3a capable of contacting the base material B, and a circle formed at a portion outside the width direction D1 of the film forming roller 3 from both ends of the outer peripheral surface 3a in the width direction D1. An annular groove 3b. That is, the cylindrical outer peripheral surface of the film-forming roll 3 of the present embodiment includes the outer peripheral surface that can be brought into contact with the substrate B as described above. Part 3a and part 3b. The outer peripheral surface 3a is polished to be smooth so as not to damage the base material B. The annular groove 3 b extends across the entire circumference of the film forming roller 3 in the circumferential direction D2 of the film forming roller 3. The groove 3b in FIG. 3 is open to the outside in the width direction D1, but may be closed.

The film forming rollers 3 are each made of a metal such as stainless steel. The film forming roller 3 is rotatably mounted inside the chamber 2. That is, both end portions 3 c (see FIG. 7) of the rotation axis O of the film forming roller 3 are rotatably supported by a first support provided on a pair of opposing side walls of the chamber 2 via a bearing 31 (see FIG. 7). The mounting portion 2b and the second mounting portion 2c.

The temperature of the film forming roller 3 may be adjusted. For example, as shown in FIG. 7, the temperature of the film forming roller 3 can be adjusted by supplying and discharging the liquid medium M to a space portion (not shown) inside the film forming roller 3 through the pipe 32. By setting the film forming roller 3 to a high temperature or a low temperature, it is possible to form a film with good adhesion on the base material B with good film quality. The gap around the tube 32 is sealed by the sealing member 33.

The belt-shaped substrate B is sequentially conveyed to each of the film-forming regions 11 in a state of being wound around the outer peripheral surface 3 a of the film-forming roller 3.

As shown in FIGS. 1 to 2 and FIGS. 4 to 6, the partition wall structure 4 includes a pair of annular partition walls 21 provided on both sides in the width direction D1 of the film forming roller 3, and a pair of annular partition walls. 21 上 circle limit 22. The circumferential restricting portion 22 includes a section exhaust plate 24, a differential exhaust hood 25, and a partition plate 26 (see FIGS. 2 and 6) described later.

As shown in FIG. 4, the pair of annular partition walls 21 has a ring shape that can be inserted into an annular groove 3 b. In this embodiment, the ring shape As shown in FIG. 5, the annular partition wall 21 is formed by a plurality of arc-shaped portions 21A and 21B separated from each other.

The annular partition wall 21 is a highly rigid member that is not easily deformed by heat, and is, for example, a member having a thickness of about 10 mm made of steel or the like.

As shown in FIGS. 7 to 8, the annular partition wall 21 has an outer surface 21 a facing the radially outer side R1 of the film forming roll 3 and an inner surface 21 b facing the radially inner side R2 of the film forming roll 3. The annular partition wall 21 has a ring shape as a shape that can be attached to the chamber 2 and is fixed to a side wall of the chamber 2 via a fixing member 35 such as a bracket. The annular partition walls 21 are respectively inserted into the grooves 3 b at both ends of the film forming roller 3 so that the inner side surface 21 b is located closer to the radially inner side R2 of the film forming roller 3 than the outer peripheral surface 3 a of the film forming roller 3. Accordingly, the annular partition wall 21 is disposed at a position where a gap 36 is opened between the annular partition wall 21 and the inner wall of the groove 3 b (that is, the width-direction wall 3 b 1 and the radial wall 3 b 2). In this state, the inner peripheral surface (inner side surface 21 b) of the annular partition wall 21 is on both sides in the width direction of the film forming roller 3 when the pair of annular partition walls 21 are mounted in the chamber 2. The outer peripheral surface (the width-direction wall 3b1 of the groove 3b in FIG. 8) faces each other with a gap 36 (width-direction gap 36a).

The gap 36 includes a widthwise gap 36a between the inner side surface 21b of the annular partition wall 21 and the widthwise wall 3b1 of the groove 3b, and a radial gap 36b between the side surface of the annular partition wall 21 and the radial wall 3b2 of the groove 3b.

The gap 36 forms a width-direction flow path 36 that restricts the flow of gas from the outer peripheral surface 3 a of the film-forming roll 3 to the outside of the film-forming roll 3 in the width direction D1. In other words, the film forming roller 3 and the annular partition wall 21 A pressure barrier in the width direction of the film forming roller 3 separating each film forming area 11 from the outside thereof.

Since the annular partition wall 21 is fixed to the chamber 2, it can function as a reference for the assembly position of the circumferential restricting portion 22 while ensuring the dimensional accuracy of the gap 36.

As shown in FIG. 7 (b), the annular partition wall 21 and the width-direction wall 3b1 of the groove 3b are processed with high accuracy, so that the annular partition wall 21 and the width-direction wall 3b1 straddle the The width direction gap 36a formed over the entire circumference can set the width c1 with high accuracy. Thereby, the amount of gas passing through the width direction gap 36 a can be restricted with high accuracy across the entire circumference of the film forming roller 3.

As shown in FIG. 1 to FIG. 2 and FIG. 11 to FIG. 12, the circumferential restriction portion 22 restricts the flow of the gas in the circumferential direction D2 of the film forming roller 3, thereby forming an outer periphery facing the film forming roller 3 inside the chamber 2. At least one (four in FIG. 1) film-forming regions 11 of the surface 3 a.

The circumferential restriction portion 22 is connected such that the relative position of the circumferential restriction portion 22 and the annular partition wall 21 is fixed. Specifically, in this embodiment, the circumferential restriction portion 22 is detachably fixed to the outer side surface 21 a of the annular partition wall 21 by screwing or the like.

Specifically, the circumferential direction restricting portion 22 includes a section exhaust plate 24, a differential exhaust hood 25, and a partition plate 26. The section exhaust plate 24 is opposed to the outer peripheral surface 3a of the film forming roller 3. The air hood 25 is arranged on both sides in the circumferential direction D2 of the section exhaust plate 24. The section exhaust plate 24, the differential exhaust hood 25, and the partition plate 26 are each independently accessible by bolts or the like. It is detachably mounted on the annular partition wall 21. In addition, at least one of the section exhaust plate 24, the differential exhaust hood 25, and the partition plate 26 constituting the circumferential restriction portion 22 may be detachably fixed to the annular partition wall 21.

The section exhaust plate 24 is a plate-shaped member having an opening 24 a as shown in FIGS. 4 and 11 to 12. The section exhaust plate 24 extends in the width direction D1 of the film forming roller 3 so as to be sandwiched between the plurality of film forming regions 11 and is fixed to the outer side surfaces 21 a of the pair of annular partition walls 21 by bolts or the like. The section exhaust plate 24 is disposed in a state of being spaced apart from the outer peripheral surface 3 a of the film forming roller 3. The width of the section exhaust plate 24 is substantially the same as the width of the film forming roller 3, and is set to a size allowing a gap 28 (see FIG. 2) between the section exhaust plate 24 and the side wall of the chamber 2.

The differential exhaust hood 25 is a thin plate-like member as shown in FIGS. 1 to 2 and 5 to 6. The differential exhaust hood 25 extends in the width direction D1 of the film forming roller 3 similarly to the section exhaust plate 24, and is fixed to the pair of annular partition walls 21 with bolts or the like so as to be opposed to the outer periphery of the film forming roller 3. The surfaces 3a are arranged with a gap therebetween.

The gap between the outer peripheral surface 3a of the film forming roller 3 and the differential exhaust hood 25 and the section exhaust plate 24 described above forms a circumferential flow path 37 that allows the exhaust gas E to flow from the film forming area 11 to the circumferential direction D2. (Refer to Fig. 11 to Fig. 12).

The differential exhaust hoods 25 are arranged on both sides in the circumferential direction D2 of each of the film forming regions 11. That is, the differential exhaust hood 25 is arranged on both sides in the circumferential direction D2 of the section exhaust plate 24. Thereby, by a pair of differential exhaust hoods 25 With the section exhaust plate 24, a differential exhaust area 27 is formed between the film forming areas 11 as an exhaust passage (see FIGS. 1 to 2). The differential exhaust area 27 communicates with each film formation area 11 through the opening 24 a of the section exhaust plate 24 and the circumferential flow path 37 (see FIG. 12). The differential exhaust area 27 communicates with the transport area 12 through a gap 28 (see FIG. 2) between the section exhaust plate 24 and the side wall of the chamber 2. The dimensions of these gaps and openings 24a are set so that the pressure in the differential exhaust zone 27 is between the pressure in the conveying zone 12 and the pressure in the film forming zone 11 higher than that. With these pressure differences, as shown in FIG. 12, the exhaust gas E can flow in the order of the film formation region 11, the differential exhaust region 27, and the conveyance region 12.

Further, the differential exhaust hood 25 is also disposed at a position capable of separating the film forming area 11 and the conveying area 12 shown in FIG. 1.

As shown in FIGS. 2 and 5 to 6, the partition plate 26 is a member that prevents the gas inside the film formation zone 11 from leaking from paths other than the width direction flow path 36 and the circumferential flow path 37 (see FIG. 12). As shown in FIG. 5, the partition plate 26 has a circumferential portion 26 a extending in the circumferential direction of the film forming roller 3 and a width direction portion 26 b extending in the width direction of the film forming roller 3. The circumferential portion 26 a is arranged to cover the gap between the annular partition wall 21 and the side wall of the chamber 2 at a position outside the width direction of the film forming roller 3 than the annular partition wall 21. The circumferential portion 26a is fixed to the annular partition wall 21 by a bolt or the like. The width direction portion 26 b has a width larger than that of the film forming roller 3. The width direction portions 26b are respectively fixed to the pair of annular partition walls 21 by bolts or the like. Both end portions of the width direction portion 26 b protrude more outward in the width direction than the pair of annular partition walls 21 and abut on the chamber 2. Sidewall.

As described above, the structural members of the circumferential restricting portion 22 (that is, the section exhaust plate 24, the differential exhaust hood 25, and the partition plate 26) are mounted on the annular partition wall 21 having a high rigidity. The annular partition wall 21 is accurately positioned inside the chamber 2 as a reference. Therefore, these section exhaust plates 24, the differential exhaust hood 25, and the partition plate 26 are not required to have high rigidity, and therefore can be manufactured inexpensively using a thin plate made of aluminum or the like.

The partition wall structure 4 according to the present embodiment is composed of a pair of annular partition walls 21 having high rigidity, and a circumferential restricting portion 22 attached to the outer side surface 21a of the annular partition wall 21, and thus has a box shape with an aluminum thin plate. Compared with the case of the partition structure, it can be easily and accurately manufactured without thermal strain.

When the partition wall structure 4 is assembled, first, as shown in FIG. 8, the annular partition wall 21 is arranged such that its inner peripheral surface (inner surface 21 b) faces the outer peripheral surface (groove) of the film forming roller 3. The width direction gap 36 a constituting the width direction flow path 36 is formed by being mounted on the inner wall of the chamber 2 via the fixing member 35. Therefore, it is positioned with high accuracy with respect to the chamber 2. Next, as shown in FIG. 5, with respect to the outer side surface 21 a of the annular partition wall 21 positioned with high accuracy, in the order shown by the reference numerals 1 to 4 surrounded by circles given in FIG. 5, The partition wall structure 4 is assembled by mounting in the order of the first: section exhaust plate 24, the second: differential exhaust hood 25, and the third: partition plate 26. Then, the baffle 5 is attached to the outer side surface 21 a of the annular partition wall 21 as the fourth one.

As described above, in the partition wall structure of the present embodiment, the annular partition wall 21 and the circumferential restriction portion 22 (specifically, the section exhaust plate 24, the differential exhaust hood 25, and The partition plates 26) are connected by a screw or the like, so that the relative positions of the annular partition wall 21 and the circumferential restricting portion 22 are fixed. Therefore, these annular partition walls 21 and the circumferential restricting portion 22 can be relative to each other. The positioning of the chamber 2 of the membrane device 1 is performed together with high accuracy.

The baffle 5 is a thin plate-shaped member having an opening 5 a as shown in FIGS. 2 and 5 to 6. The width of the opening 5 a (that is, the width in the width direction D1 of the film forming roller 3) defines the width of the film formed by film formation on the surface of the substrate B.

The baffle plate 5 is disposed inside the film forming area 11 with respect to the outer peripheral surface 3 a of the film forming roller 3 while allowing a gap with the outer peripheral surface 3 a of the film forming roller 3. The baffle 5 extends in the width direction D1 of the film forming roller 3 and is fixed to the outer side surfaces 21 a of the pair of annular partition walls 21 by bolts or the like.

The baffle 5 is a component different from the partition wall structure 4 attached to the partition wall structure 4. The baffle 5 prevents the film-forming material from adhering to the partition wall structure 4 and distributes the thin film formed on the surface of the substrate B in the width direction of the substrate B uniformly. The baffle 5 is replaced for each batch process (for example, after the film formation process for one roll of the substrate B is completed).

In the present embodiment, as shown in FIG. 7 (b), a spacer 34 is provided between the baffle 5 and the annular partition wall 21. Spacer 34 The gap c3 between the baffle 5 and the annular partition wall 21 is adjusted. By selecting the spacers 34 having different thicknesses, the gap between the baffle 5 and the annular partition wall 21 can be adjusted according to the thickness of the base material B. In addition, in consideration of the thermal load of the base material B during film formation, when the gap between the baffle 5 and the base material B is desired to be enlarged, it can be adjusted by selecting the spacer 34. The spacer 34 may be omitted.

As shown in FIGS. 8 and 11 to 12, the opening 5 a of the baffle plate 5 communicates with the width direction flow path 36 and the circumferential flow path 37.

In the film forming apparatus 1, as shown in FIGS. 7 to 9, the baffle 5 is attached to the outer side surface 21 a of the annular partition wall 21. In addition, the annular partition wall 21 is inserted into the groove 3 b of the film forming roller 3, so that the inner side surface 21 b of the annular partition wall 21 is located closer to the radially inner side R2 of the film forming roller 3 than the outer peripheral surface 3 a of the film forming roller 3. Thereby, as shown in FIG. 9 (a), the distance between the baffle 5 and the outer peripheral surface 3a of the film forming roller 3 can be closer to the thickness of the annular partition wall 21 (that is, the distance between the outer side surface 21a and the inner side surface 21b, for example, about 10 mm). ) Smaller distance (for example, about 3 ~ 5mm). Thereby, the distance A1 between the baffle 5 and the base material B can be made close. In this state, when the particles P of the film-forming material generated by sputtering fly out of the range of the ablation width W of the evaporation source 6, the particles P are difficult to diffuse to the specific barrier after passing through the opening 5 a of the barrier 5. The width of the opening 5a of 5 is further outside. In more detail, in this state, the range (the range of the shadow) where the particles P are shielded by the edges of the opening 5a is narrowed, and the particles P flying out of the range of the ablation width W collide with the substrate B uniformly. The range becomes larger. Therefore, as shown in FIG. 9 (b), at the both ends of the substrate B in the width direction D1 during film formation, It is sufficient to reduce the area J1 where the film thickness is thin. As a result, the thickness distribution of the thin film can be improved, and the uniformity of the film thickness can be improved.

On the other hand, as compared with the arrangement of the annular partition wall 21 shown in FIG. 9 (a) of this embodiment, as a comparative example of the present invention, as shown in FIG. 14 (a), on the inner side surface of the annular partition wall 121 When 121b is located radially outward R1 from the outer peripheral surface 3a of the film forming roller 3, the thickness of the annular partition wall 121 plus the distance between the annular partition wall 121 and the outer peripheral surface 3a is the length of the baffle 5 and The distance of the outer peripheral surface 3a. Therefore, as the gap A2 between the baffle 5 and the base material B attached to the outer side surface 121a of the annular partition wall 121 becomes larger, as shown in FIG. The thin and uneven region J2 becomes larger. On the other hand, if the opening width of the baffle 5 is enlarged in order to enlarge the area with a uniform film thickness, there is a possibility that the sputtered particles P collide with the outer peripheral surface 3 a of the film forming roller 3 to form a film. In this case, in order to prevent the formation of a film on the outer peripheral surface 3a, it is necessary to use a substrate B having a sufficiently large width compared to the effective width of the film formation (the width capable of forming a film having a uniform thickness). On the other hand, as described above, in the arrangement of the annular partition wall 21 shown in FIG. 9 (a) of the present embodiment, the gap A1 between the baffle 5 and the base material B can be reduced, so the end portion of the base material B The non-uniform portion of the film thickness becomes narrow, and the substrate B can be effectively used.

The film forming roller 3 expands and contracts in the width direction in response to temperature changes. Therefore, the annular gap 21 and the radial gap 36b (see FIG. 8) of the radial wall 3b2 of the groove 3b of the film forming roller 3 fluctuate. Happening. For example, both ends of the rotation shaft of the film forming roller 3 shown in FIG. 7 (a) 3c is supported on the first mounting portion 2b (fixed side) of the chamber 2 so that the position in the width direction D1 of the film forming roller 3 does not change due to temperature change, and is allowed on the second mounting portion 2c side (free side). The mode of the position change in the width direction D1 is supported. In this embodiment, the width c2 of the radial gap 36b between the side wall of the annular partition wall 21 and the radial wall 3b2 of the groove 3b, which is closer to the second mounting portion 2c (free side) (see FIG. 7 (a)). It changes with temperature, but the radial gap 36b on the side closer to the first mounting portion 2b (fixed side) does not change, so the width c2 of the radial gap 36b is different on both sides in the width direction of the film forming roller 3. .

On the other hand, even if the film forming roller 3 expands and contracts in the width direction due to temperature changes, the width direction gap 36a (see FIG. 8) between the annular partition wall 21 and the width direction wall 3b1 of the groove 3b of the film forming roller 3 is not. The width c1 of the width direction gap 36a is the same on both sides of the film forming roller 3 in the width direction. Therefore, by setting the width c1 of the widthwise gap 36a to be smaller than the width c2 of the radial gap 36b, the gap 36 formed by the widthwise gap 36a and the radial gap 36b, that is, the widthwise flow path can be set. The amount of the exhaust gas E flowing in 36 is maintained uniformly on both sides in the width direction of the film forming roller 3 over the entire circumference of the film forming roller 3. That is, with the width c1 of the width direction gap 36a, the flow rate of the exhaust gas E in the width direction can be controlled (that is, the area separation function is set).

In this embodiment, the outer diameter of the annular partition wall 21 is made slightly larger than the maximum outer diameter of the film forming roller 3. Therefore, assembling the annular partition wall 21 with high accuracy, it is only necessary to assemble the baffle plate 5 and the circumferential restricting portion 22 (that is, the section exhaust plate 24, the differential exhaust hood 25, and the partition plate). 26) It can be mounted on the outer side surface 21 a of the annular partition wall 21, and the positioning of the baffle plate 5 and the circumferential restriction portion 22 is not required.

(feature)

(1) In the partition wall structure 4 of the present embodiment, the annular partition wall 21 is connected to the circumferential restricting portion 22 so that the relative position of the annular partition wall 21 and the circumferential restricting portion 22 is fixed. The positioning of the person with respect to the chamber of the film forming apparatus is performed with high accuracy. Specifically, high-precision positioning is performed as follows. That is, the annular partition wall 21 is mounted on the chamber 2 so that the inner peripheral surface (inner side surface 21a) thereof faces the outer peripheral surface (width-direction wall 3b1 of the groove 3b) of the film forming roller, thereby forming a width direction. The width direction gap 36a of the flow path 36 is positioned with high accuracy with respect to the chamber 2. The circumferential restriction portion 22 is connected to the annular partition wall 21 so that the relative position is fixed relative to the annular partition wall 21. Therefore, by positioning the annular partition wall 21 with respect to the cavity with high accuracy, the circumferential restriction The positioning of the part 22 with respect to the cavity is naturally performed with high accuracy. As a result, compared with the case where the circumferentially restricting portion 22 is positioned relative to the chamber independently of the annular partition wall 21, the positioning operation is facilitated, and the installation of the circumferentially restricting portion 22 is also easier.

In addition, the partition wall structure 4 having the above-mentioned structure has a structure in which the circumferential direction restricting portion 22 is mounted on the outer side surfaces 21 a of the pair of annular partition walls 21. Therefore, the partition wall structure 4 is lower than the structure of the conventional partition wall structure 4. Compared with the above-mentioned structure, the structure is simpler: the cover has a roller opposing wall and a chamber communication portion, The cover is fixed to a position separated from the inner wall of the chamber by a plurality of partition walls. Specifically, the partition wall structure 4 according to the present embodiment can include an annular partition wall 21 made of a ring-shaped member, a plate-shaped section exhaust plate 24, and a differential exhaust hood 25 made of a curved plate or the like. It can be made by combining simple parts. Therefore, the manufacturing cost of the partition structure 4 can be reduced.

In addition, in the partition wall structure of the present invention, it is sufficient that the partition wall is connected to the circumferential restricting portion so that the relative position of the partition wall and the circumferential restricting portion is fixed. Therefore, it is not limited to the structure in which the structural components of the circumferential direction restricting part 22 as described in the above-mentioned embodiment are each screwed to the annular partition wall 21 by a screw. For example, a configuration may be adopted in which the partition wall and the circumferential restriction portion are fixed to each other by welding or the like, or the partition wall and the circumferential restriction portion are integrally formed.

(2) In the partition wall structure 4 of the present embodiment, the annular partition wall 21 has a cylindrical outer peripheral surface (specifically, The entire circumference of the width direction wall 3b1) of the groove 3b has an inner peripheral surface (inner side surface 21b) having a constant inner diameter larger than the outer diameter of the width direction wall 3b1. Therefore, when the annular partition wall 21 is attached to the chamber 2 such that the inner side surface 21b of the annular partition wall 21 is concentric with the width direction wall 3b1 of the groove 3b of the film forming roller 3, the inner side surface of the annular partition wall 21 A width-wise gap 36a having a constant width is accurately formed between 21b and the width-direction wall 3b1 of the groove 3b of the film-forming roll 3 across the entire circumference of the film-forming roll 3. Thereby, the amount of gas passing through the width direction gap 36 a can be made uniform with respect to the circumferential direction of the film forming roller 3.

In addition, in the present embodiment, when the grooves 3 b are formed on the outer peripheral surface of the film forming roller 3, the inner side surface 21 b of the annular partition wall 21 is shown across the grooves 3 b constituting the outer peripheral surface of the film forming roller 3. An example in which the width-direction wall 3b1 is opposed to the entire circumference, but the present invention is not limited to this. In the case where no groove is formed on the outer peripheral surface of the film forming roller 3, the annular partition wall 21 may have a specific outer diameter facing across the entire periphery of the outer peripheral surface of the film forming roller 3 in a state of being mounted in the chamber 2. The inner surface 21b having a large inner diameter. In this case, a widthwise gap 36a having a constant width is also formed accurately across the entire circumference of the film forming roller 3 between the inner side surface 21b of the annular partition wall 21 and the outer peripheral surface of the film forming roller 3.

Furthermore, in the partition wall structure 4 according to the present embodiment, the ring-shaped annular partition wall 21 is composed of a plurality of arc-shaped portions 21A and 21B separated from each other. Therefore, after assembling the film-forming roller 3 into the chamber 2, the arc-shaped portions 21A and 21B constituting the annular partition wall 21 are fixed to the chamber 2, respectively, so that the ring shape can be easily fixed. The annular partition wall 21 is assembled to the chamber 2. In this case, the circumferential restriction portion 22 is connected to the annular partition wall 21 so that the relative position of the annular partition wall 21 and the circumferential restriction portion 22 is fixed. Therefore, the annular partition wall 21 and the circumferential restriction can also be performed with high accuracy. Positioning of the two parts 22. In addition, the annular partition wall 21 may have a continuous ring shape over the entire circumference.

(3) In the partition wall structure 4 according to the present embodiment, the circumferential restricting portion 22 includes a section exhaust plate 24 which is sandwiched between the film forming rollers 3 between the film forming areas 11. It is attached to the pair of annular partition walls 21 so as to extend in the width direction. A region sandwiched between the film-forming regions 11 The intermediate exhaust plate 24 is attached to the outer side surface 21 a of the annular partition wall 21, whereby the peripheral exhaust plate 24 and the outer peripheral surface 3 a of the film forming roller 3 can be installed in the state where the annular partition wall 21 is installed in the chamber 2. Easily form a uniform gap between them. Therefore, the gap can easily and accurately form a circumferential flow path 37 that restricts the flow of the gas in the circumferential direction of the film forming roller 3.

(4) In the partition wall structure 4 according to the present embodiment, the circumferential restricting portion 22 includes a differential exhaust hood 25 that forms an exhaust passage between the film forming regions 11. The differential exhaust hood 25 is mounted on the annular partition wall 21 at a position where a gap can be formed with respect to the outer peripheral surface 3 a of the film-forming roll 3, thereby making it possible to easily form a uniform gap with respect to the outer peripheral surface 3 a of the film-forming roll 3. . As a result, the differential exhaust hood 25 is disposed on both sides in the circumferential direction of the section exhaust plate 24, so that the pair of the differential exhaust hood 25 and the section exhaust plate 24 can be easily placed in the film formation area 11. A differential exhaust area is formed therebetween as an exhaust passage.

(5) In the partition wall structure 4 according to the present embodiment, the circumferential restriction portion 22 includes a partition plate 26 that prevents the gas inside the film formation zone 11 from leaking from a path other than the width direction flow path 36 and the circumferential flow path 37. The partition wall 26 is attached to the annular partition wall 21, so that the annular partition wall 21 attached to the chamber 2 can be used as a reference for positioning the partition plate 26. As a result, adjustment for the positioning of the partition plate 26 is not required.

(6) In the partition wall structure 4 of the present embodiment, at least one of the section exhaust plate 24, the differential exhaust hood 25, and the partition plate 26 constituting the circumferential restriction portion 22 is detachably fixed. The annular partition wall 21 makes it easy to install and disassemble these components. Therefore, maintenance and replacement of these components are easier.

(7) In the film forming apparatus 1 of the present embodiment, the inner side surface 21 b of the annular partition wall 21 facing the radially inner side R2 of the film forming roller 3 is located closer to the film forming roller 3 than the outer peripheral surface 3 a of the film forming roller 3. The position of the radial inside R2. That is, the outer peripheral surface 3 a of the film forming roller 3 and the inner side surface 21 b of the annular partition wall 21 are staggered in the radial direction of the film forming roller 3. Further, a baffle plate 5 disposed inside the film forming area 11 formed inside the chamber 2 is mounted on the outer side surface 21 a of the annular partition wall 21 facing the radially outer side R1 of the film forming roller 3. Therefore, the distance between the baffle 5 and the outer peripheral surface 3 a of the film forming roller 3 can be approached to a distance smaller than the thickness of the annular partition wall 21. As a result, at the both ends of the width direction D1 of the base material B during film formation, the area where the film thickness is thinner can be made smaller, the distribution of the thickness of the film can be improved, and the uniformity of the film thickness can be improved.

Further, the inner side surface 21b of the annular partition wall 21 is located closer to the radially inner side R2 of the film forming roller 3 than the outer peripheral surface 3a of the film forming roller 3. Therefore, even if the outer side surface 21a and the inner side surface 21b of the annular partition wall 21 are The distance (that is, the thickness of the annular partition wall 21) becomes larger, and interference between the annular partition wall 21 and the film forming roller 3 does not occur. Therefore, the thickness of the annular partition wall 21 can be increased to increase the rigidity of the annular partition wall 21. As a result, the size management of the width direction gap 36a formed between the inner side surface 21b of the annular partition wall 21 and the width direction wall 3b1 of the groove 3b of the film forming roller 3 can be performed with high accuracy.

The annular partition wall 21 fixed to the chamber 2 is disposed at a position spaced from the film forming roller 3 on both sides in the width direction D1 of the film forming roller 3. This gap 36 can function as a width direction flow path 36 which restricts the gas from the outer peripheral surface 3a of the film forming roller 3 to The flow outside the width direction D1 of the film forming roller 3. That is, the width direction gap 36a formed between the inner side surface 21b of the annular partition wall 21 and the width direction wall 3b1 of the groove 3b of the film forming roller 3 can function as a differential exhaust unit. While maintaining the pressure inside the film formation zone 11 higher than the pressure outside it, the gas inside the film formation zone 11 is exhausted to the outside. Since the width-wise gap 36a is on the circumferential surface side of the film-forming roll 3, the size symmetry of the width-direction gap 36a can be maintained even when the temperature of the film-forming roll 3 is changed, so that the film-forming roll can be maintained. The symmetry of the gas flow restriction performance brought by the annular partition walls 21 at both ends. Therefore, the uniformity of the exhaust gas distribution can be ensured.

(8) In addition, in the film forming apparatus 1 of the present embodiment, at both end portions of the film forming roller 3 that are closer to the outer side in the width direction D1 than the width direction D1 of the outer peripheral surface 3a, An annular groove 3 b extending in the circumferential direction D2 of the film forming roller 3 is formed. The annular partition wall 21 is inserted into the groove 3 b and is disposed at a position separated from the inner wall of the groove 3 b by a gap 36. In this configuration, a simple annular ring-shaped partition wall 21 can form a gap 36 between the ring-shaped partition wall 21 and the film forming roller 3 to allow the gas to flow in the width direction D1, and at the same time, the baffle 5 can be formed. It is close to the outer peripheral surface 3a of the film-forming roll 3, and the thickness distribution of the formed film is improved. In addition, since the annular partition wall 21 has a simple shape, it is easy to manufacture it with high accuracy. Further, the annular annular partition wall 21 is inserted into an annular groove 3b formed outside the width direction D1 from the end portion of the film forming roller 3 in the width direction D1 of the outer peripheral surface 3a. The inner side surface 21 b of the annular partition wall 21 can be positioned outside the film forming roller 3. The peripheral surface 3 a is located closer to the radially inner side R2 of the film forming roller 3. Therefore, the thickness of the annular partition wall 21 can be ensured, and thereby the rigidity of the annular partition wall 21 can be improved. In addition, an annular gap 36 is uniformly formed between the annular annular partition wall 21 and the inner wall of the groove 3 b. Therefore, the amount of gas passing through the gap 36 can be changed throughout the entire circumference of the film forming roller 3. Even.

In addition, in the present embodiment, as the partition wall for forming the width direction flow path 36 that restricts the flow of gas to the outside of the width direction D1 of the film forming roller 3, an annular partition wall 21 made of an annular member is used. The structure of the partition wall is simple, and the manufacturing of the partition wall and the assembly into the chamber 2 are easy.

Furthermore, in the case of the film forming roller 3 having the grooves 3b, the outer peripheral surface 3a as the conveyance portion of the base material B and the portions other than the grooves 3b are easy to distinguish. Therefore, when the film forming roller 3 is mounted on the chamber 2, the portion of the groove 3 b of the film forming roller 3 is held with a jig or the like, and the operation of the film forming roller 3 is easy.

(9) Furthermore, in the film forming apparatus 1 according to this embodiment, the ring-shaped annular partition wall 21 is composed of a plurality of arc-shaped portions 21A and 21B separated from each other. Therefore, after assembling the film forming roller 3 into the chamber 2, the arc-shaped portions 21A and 21B constituting the ring-shaped annular partition wall 21 are respectively fixed to the chamber 2, so that the ring can be easily assembled. The annular partition wall 21 is assembled in the chamber 2. In addition, the annular partition wall 21 may have a continuous ring shape over the entire circumference.

(10) Further, in the film forming apparatus 1 according to this embodiment, the circumferential direction restricting portion 22 is attached to the outer side surface 21 a of the annular partition wall 21. on. Therefore, the annular partition wall 21 is fixed to the chamber 2, thereby positioning with high accuracy inside the chamber 2, and further, the circumferential restricting portion 22 is mounted on the outer side surface 21 a of the annular partition wall 21, thereby, The circumferential direction restricting portion 22 can be easily and accurately disposed at a position facing the outer peripheral surface 3 a of the film forming roller 3.

(11) Further, in the film forming apparatus 1 of the present embodiment, the circumferential direction restricting portion 22 includes a section exhaust plate 24 facing the outer peripheral surface 3 a of the film forming roller 3, and the section exhaust plate 24 is facing the film formation. The outer peripheral surface 3a of the roller 3 is fixed to the outer side surface 21a of the annular partition wall 21 with a gap being secured. Therefore, the section exhaust plate 24 can easily secure a uniform gap with respect to the peripheral surface of the film forming roller 3.

(12) In addition, in the film forming apparatus 1 of the present embodiment, the partition wall structure 4 can include an annular partition wall 21 composed of an annular member, a plate-shaped section exhaust plate 24, a curved plate, and the like. A relatively simple-shaped component such as a differential exhaust hood 25 having a structure is combined and manufactured. Therefore, the manufacturing cost of the partition structure 4 can be reduced.

(Modification)

(A) In the above-mentioned embodiment, the example in which the groove 3b was formed in the both ends of the film forming roller 3 in the width direction, and the annular partition wall 21 was inserted into the groove 3b. However, the partition wall structure of the present invention and The film forming apparatus is not limited to this.

As shown in FIG. 13, in a film forming apparatus having a partition structure as another embodiment of the present invention, The cylindrical film-forming roller 3 having a groove serves as an annular partition wall constituting a partition wall structure, and an annular partition wall 21 having a main body portion 21c and an extension portion 21d is arranged at both ends in the width direction of the film-forming roller 3.

That is, the annular partition wall 21 shown in FIG. 13 includes a main body portion 21c and an extension portion 21d protruding from the main body portion 21c. The main body portion 21c and the extension portion 21d are integrally formed of a material such as steel, but may be separate components.

The main body portion 21c has a ring shape having a rectangular cross section. The main body portion 21 c includes an outer surface 21 a facing the radially outer side (upper side in FIG. 13) of the film forming roller 3 and an inner surface 21 b facing the radially inner side (lower side in FIG. 13). The main body portion 21 c is fixed to the chamber 2 via a fixing member 35. The main body portion 21 c is disposed at a position separated from the radial gap 36 c in the width direction from both end portions in the width direction of the film forming roller 3. That is, a radial gap 36 c extending in the radial direction of the film forming roller 3 is formed by the side surface of the main body portion 21 c and the widthwise end portion of the film forming roller 3.

The extension portion 21d projects from the main body portion 21c in the width direction of the film forming roller 3 and extends along the outer side surface 21a. The extension part 21d has a ring shape similarly to the main-body part 21c. The thickness of the extension portion 21d is smaller than that of the main body portion 21c. A widthwise gap 36d is formed by the inner peripheral surface of the extension portion 21d and the outer peripheral surface 3a of the film forming roller 3. The width direction gap 36d and the radial gap 36c communicating therewith can form a width direction gap 36d that restricts the flow of gas from the outer peripheral surface 3a of the film forming roll 3 to the outside in the width direction of the film forming roll 3. The baffle 5 is attached to the outer side surface 21a of the main body portion 21c by a bolt or the like. The extension portion 21d supports the shutter 5 from the film forming roller 3 side. The baffle 5 may be fixed to the extension portion 21d by a bolt or the like.

In the partition wall structure having the annular partition wall 21 shown in FIG. 13, the main body portion 21 c of the annular partition wall 21 is disposed at a position separated from the both ends in the width direction of the film forming roller 3 in the width direction. It can be arranged to protrude radially inward of the film forming roller 3 than the outer peripheral surface 3 a of the film forming roller 3, the thickness of the main body portion 21 c can be ensured, and thereby the rigidity of the annular partition wall 21 can be improved. Further, the extension portion 21 d of the annular partition wall 21 extends from the main body portion 21 c in the width direction of the film forming roller 3 and forms a width direction gap 36 d with the outer peripheral surface 3 a of the film forming roller 3. The width direction gap 36 d functions as the width direction flow path 36, whereby the flow of the gas to the outside in the width direction of the film forming roller 3 can be restricted.

Further, in the embodiment of the film forming apparatus 1 including the partition wall structure shown in FIG. 13, the main body portion 21 c of the annular partition wall 21 is disposed in the width direction from both ends in the width direction of the film forming roller 3. In the state of the upper separated position, the baffle 5 is attached to the outer surface 21a of the main body portion 21c. Therefore, the distance between the baffle 5 and the outer peripheral surface 3a of the film forming roller 3 can be made closer to the thickness of the main body portion 21c (that is, the distance between the outer side surface 21a and the inner side surface 21b). In addition, the inner side surface 21 b of the main body portion 21 c can be located radially inward of the film forming roller 3 than the outer peripheral surface 3 a of the film forming roller 3, and the thickness of the main body portion 21 c can be ensured, thereby improving the annular partition wall 21. rigidity. Further, an extension portion 21d of the annular partition wall 21 extends from the main body portion 21c along the outer side surface 21a, and a widthwise gap 36d is formed between the extension portion 21d and the outer peripheral surface 3a of the film forming roller 3. This gap functions as the width direction flow path 36, and thereby, it is possible to restrict the gas to the film forming roller. 3 flows in the width direction outside. The extension portion 21d may be omitted.

(B) The partition wall of the partition wall structure of the present invention may not have a ring shape like the annular partition wall 21 described above. As long as the partition wall has an inner peripheral surface which is arranged on both sides in the width direction of the film forming roller 3 at a position spaced apart from the outer peripheral surface of the film forming roller 3, it is possible to restrict the gas from the film forming roller 3 by the gap formation. The outer circumferential surface 3a can have various shapes in the width direction flow path flowing outward in the width direction of the film forming roller 3.

(C) In the film forming apparatus 1 of the above embodiment, the substrate B in the shape of a belt is conveyed from the unwinding section 7 to the winding section 8 via the film forming roller 3, but the conveying direction of the substrate B may be changed. The base material B is supplied from the winding unit 8 side upside down, and is wound up to the winding unit 7.

(D) In order to cool the baffle 5, the annular partition wall 21 supporting the baffle 5 may have a liquid-cooled structure cooled by a liquid refrigerant.

(E) The portion (stepped portion) having the groove 3 b of the film forming roller 3 may be manufactured separately from the other portions of the film forming roller 3 and then combined with the other portions.

1‧‧‧ film forming device

2‧‧‧ chamber

2a‧‧‧Internal space

3‧‧‧film forming roller

4‧‧‧ partition wall structure

5‧‧‧ bezel

6‧‧‧ evaporation source

7‧‧‧ roll out

8‧‧‧ Take-up Department

11‧‧‧ film forming area

12‧‧‧ Conveying area

13‧‧‧Pump

14‧‧‧Gas supply port

15‧‧‧ pump

21‧‧‧ annular partition wall

22‧‧‧ weekly restriction

24‧‧‧ interval exhaust panel

25‧‧‧ Differential exhaust hood

27‧‧‧ Differential exhaust zone

B‧‧‧ substrate

E‧‧‧Exhaust gas

G‧‧‧gas

P‧‧‧ Particle

Claims (18)

A partition wall structure is a partition wall structure of a film forming device that continuously forms a film using a gas inside a chamber on a surface of a belt-shaped substrate conveyed along an outer peripheral surface of a film forming roller. The partition wall structure has at least one film forming area inside the chamber, and is characterized by including a circumferential restricting portion and a pair of partition walls. The pair of partition walls has a shape capable of being mounted in the chamber. And has an inner peripheral surface that faces the outer peripheral surface of the film forming roller with a gap on both sides in the width direction of the film forming roller when the pair of partition walls are installed in the chamber, The circumferential restricting portion forms at least one film forming area inside the chamber facing the outer peripheral surface of the film forming roller, and the circumferential restricting portion is connected to the partition wall such that the circumferential restricting portion is in contact with the partition wall. The relative position is fixed; the outer peripheral surface of the film forming roller is cylindrical, the partition wall has an inner peripheral surface, and the inner peripheral surface crosses the film forming roller in a state where the partition wall is installed in the chamber. Cylindrical Said outer circumferential surface opposed to the entire circumference, and the inner circumferential surface having an outer diameter greater than the outer peripheral surface of the constant inner diameter. The partition wall structure according to item 1 of the scope of patent application, wherein the partition wall is composed of a plurality of parts separated from each other so as to divide the inner peripheral surface. The partition wall structure according to item 1 or 2 of the patent application scope, wherein the partition wall has a main body portion, and the main body portion has a shape in which the main body portion is covered by the partition wall when the partition wall is mounted in the chamber. It is arrange | positioned at the position separated from the both ends of the width direction of the said film-forming roll in the width direction. The partition wall structure according to item 3 of the patent application scope, wherein the partition wall further has an extension portion extending from the main body portion along the outer side surface and between the outer peripheral surface of the film forming roller and the outer peripheral surface of the film forming roller. Form a gap. The partition wall structure according to item 1 or 2 of the patent application scope, wherein the partition wall structure is a partition wall structure used in a film forming apparatus, and the film forming apparatus has a plurality of film forming regions as the at least 1 Film forming areas, the circumferentially restricting portion has a section exhaust plate, and the section exhaust plate is sandwiched between the film forming areas and is mounted on the pair of partition walls so as to extend in the width direction of the film forming roller. The section exhaust plate is mounted on the partition wall at a position where the section exhaust plate is formed between the section exhaust plate and the outer peripheral surface of the film forming roller in a state where the partition wall is mounted in the chamber. A gap that forms a circumferential flow path that restricts the flow of the gas in the circumferential direction of the film forming roller. The partition structure according to item 5 of the patent application scope, wherein In the above, the circumferential restricting portion further includes a differential exhaust hood which forms an exhaust passage between the film forming regions, and the differential exhaust hood is mounted at a position capable of forming a gap with respect to the outer peripheral surface of the film forming roller. On the partition wall, the differential exhaust hood is disposed on both sides in the circumferential direction of the section exhaust plate in the direction in which the section exhaust plate extends. Therefore, a pair of the differential exhaust hood and the section In the section exhaust plate, a differential exhaust area serving as the exhaust passage is formed between the film forming areas. The partition wall structure according to item 5 of the patent application scope, wherein the circumferential restricting portion further includes a partition plate that prevents gas in the film forming area from leaking from a path other than the width direction flow path and the circumferential flow path. The partition wall is mounted on the aforementioned partition wall. The partition wall structure according to item 1 or 2 of the patent application scope, wherein the partition wall structure is a partition wall structure used in a film forming apparatus, and the film forming apparatus has a plurality of film forming regions as the at least 1 In the film forming area, the circumferential restricting portion has a section exhaust plate, a differential exhaust hood, and a partition plate. The section exhaust plate is sandwiched between the film forming areas, and the differential exhaust hood is formed in the film formation. An exhaust passage is formed between the zones, and the partition plate prevents the gas in the film forming zone from flowing in the width direction. A path other than the road and the circumferential flow path leaks, and at least one of the section exhaust plate, the differential exhaust hood, and the partition plate can be detachably fixed to the partition wall. A film forming apparatus for continuously forming a film on a surface of a belt-shaped substrate using a gas, comprising a partition wall structure according to item 1 of the patent application scope, the chamber, the film forming roller, and A baffle, which is disposed opposite to the outer peripheral surface of the film-forming roller inside the film-forming region and has an opening that defines a width of the film formed by the film on the surface of the substrate; The partition wall has an outer surface facing the radial outer side of the film forming roller and an inner surface facing the radial inner side of the film forming roller. The baffle is attached to the outer surface of the partition wall, and the inner wall of the partition wall. The side surface is located more radially inward of the film forming roller than the outer peripheral surface of the film forming roller. The film forming apparatus according to item 9 of the scope of patent application, wherein the film forming roller is formed at a portion on the film forming roller that is closer to the outer side in the width direction than the two ends of the outer peripheral surface in the width direction. A groove extending across the entire circumference of the film forming roller along a circumferential direction of the film forming roller, the partition wall has a shape capable of being inserted into the groove, the partition wall is inserted into the groove, and is disposed between the The inner wall of the groove is separated from each other by the aforementioned gap. The film forming apparatus according to item 9 of the scope of patent application, wherein the partition wall has a main body portion and an extension portion, The main body portion is fixed to the cavity, and is disposed at a position separated from both end portions in the width direction of the film forming roller in the width direction. The main body portion includes the outer surface and the inner surface. The extension portion extends from the main body portion. Extending along the outer side surface, the gap is formed between the outer peripheral surface of the film forming roller, and the baffle is attached to the outer surface of the main body portion. A film forming apparatus for continuously forming a film on a surface of a belt-shaped substrate using a gas, comprising a chamber, a film forming roller, a circumferential restricting portion, a baffle, and a pair of partition walls. The roller is rotatably installed inside the chamber, and has an outer peripheral surface capable of contacting the substrate. The pair of partition walls is fixed to the chamber, and the two sides of the film forming roller are arranged on the two sides in the width direction. At a position where a gap is formed between the film forming rollers, the circumferential restricting portion forms at least one film forming region facing the outer peripheral surface of the film forming roller inside the chamber, and the baffle plate is in the inside of the film forming region and The outer peripheral surface of the film forming roller is oppositely disposed, and has an opening that defines a width of the film formed by the film formation on the surface of the substrate, and the partition wall has an outer portion that faces the radially outer side of the film forming roller. The side surface and the inner surface facing the radially inner side of the film forming roller, the baffle is mounted on the outer surface of the partition wall, and the inner side surface of the partition wall is located more than the outer peripheral surface of the film forming roller. It is located further inward in the radial direction of the film forming roller. The film forming apparatus according to item 12 of the scope of patent application, wherein the film forming roller is formed at a portion on the film forming roller that is closer to the outer side in the width direction than the two ends of the outer peripheral surface in the width direction. The partition wall has a ring-shaped groove extending along the circumferential direction of the film forming roller. The partition wall has a ring shape that can be inserted into the ring-shaped groove. The partition wall is inserted into the groove and is disposed in the groove. The position where the aforementioned gap is separated from the inner wall of the groove. The film forming apparatus according to claim 12 or claim 13, wherein the annular partition wall is formed of a plurality of arc-shaped portions separated from each other. The film forming apparatus according to claim 12, wherein the partition wall has a main body portion, the main body portion is fixed to the chamber, and is disposed at the width from both ends in the width direction of the film forming roller. The position separated in the direction includes the outer surface and the inner surface, and the baffle is attached to the outer surface of the main body portion. The film forming apparatus according to item 15 of the patent application scope, wherein the partition wall further has an extension portion extending from the main body portion along the outer side surface and between the outer wall surface and the outer peripheral surface of the film forming roller. Form a gap. The film forming apparatus according to item 12 or 13 of the scope of patent application, wherein the circumferential restricting portion is mounted on the outer surface of the partition wall. The film forming apparatus according to item 17 of the scope of patent application, wherein the circumferentially restricting portion has a section exhaust plate facing the outer peripheral surface of the film forming roller, and the section exhaust plate is formed with respect to the film formation. The outer peripheral surface of the roller is fixed to the partition wall in a state where a gap is secured.