TWI602844B - Diketopyrrolopyrrole polymers for use in organic semiconductor devices - Google Patents

Diketopyrrolopyrrole polymers for use in organic semiconductor devices Download PDF

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TWI602844B
TWI602844B TW100117463A TW100117463A TWI602844B TW I602844 B TWI602844 B TW I602844B TW 100117463 A TW100117463 A TW 100117463A TW 100117463 A TW100117463 A TW 100117463A TW I602844 B TWI602844 B TW I602844B
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TW201211099A (en
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帕斯可 賀憂茲
瑪堤斯 度琪里
那塔利亞 奇波塔娃
歐利維爾 弗瑞德瑞克 阿貝斯奇
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巴地斯顏料化工廠
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用於有機半導體裝置之二酮基吡咯并吡咯聚合物Diketoppyrrolopyrrole polymer for organic semiconductor devices

本發明係關於包含一或多個式(I)之(重複)單元之聚合物、或式(II)或(III)之聚合物,及其作為有機半導體的用途,其用於有機裝置,尤其有機光伏打裝置(太陽能電池)及光電二極體、或含有二極體及/或有機場效應電晶體之裝置中。本發明聚合物在有機溶劑中具有優良溶解性且具有優良膜形成性質。此外,在本發明聚合物用於有機場效應電晶體、有機光伏打裝置(太陽能電池)及光電二極體中時,可觀察到高能量轉換效率、優良場效應遷移率、良好開/關電流比及/或優良穩定性。The invention relates to the inclusion of one or more (I) (repeated) unit of polymer, or formula (II) or a polymer of (III) and its use as an organic semiconductor for organic devices, in particular organic photovoltaic devices (solar cells) and photodiodes, or diodes and/or organic field-effect transistors In the device. The polymer of the present invention has excellent solubility in an organic solvent and has excellent film forming properties. In addition, high energy conversion efficiency, excellent field effect mobility, and good on/off current can be observed when the polymer of the present invention is used in an organic field effect transistor, an organic photovoltaic device (solar cell), and a photodiode. Ratio and / or excellent stability.

WO 05/049695揭示基於二酮基吡咯并吡咯(DPP)之聚合物及其在PLED、有機積體電路(O-IC)、有機場效應電晶體(OFET)、有機薄膜電晶體(OTFT)、有機太陽能電池(O-SC)、或有機雷射二極體中之用途,但未揭示式I之基於DPP之特定聚合物。WO 05/049695 discloses diketopyrrolopyrrole (DPP) based polymers and their use in PLEDs, organic integrated circuits (O-IC), organic field effect transistors (OFETs), organic thin film transistors (OTFTs), The use of organic solar cells (O-SC), or organic laser diodes, but does not disclose a specific polymer based on DPP of Formula I.

較佳聚合物包含下式重複單元Preferred polymers comprise repeating units of the formula

及重複單元,其中 And repeating unit ,among them

R1及R2彼此獨立地係可雜有一或多個氧原子之C1-C25烷基,尤其C4-C12烷基,且Ar1及Ar2彼此獨立地係下式之基團:R 1 and R 2 independently of each other may be a C 1 -C 25 alkyl group having one or more oxygen atoms, especially a C 4 -C 12 alkyl group, and Ar 1 and Ar 2 are independently a group of the following formula :

,其中-Ar3-係下式之基團: , wherein -Ar 3 - is a group of the formula:

,其中 ,among them

R6係氫、C1-C18烷基、或C1-C18烷氧基,且R32係甲基、Cl、或OMe,且R8係H、C1-C18烷基、或由E取代及/或雜有D之C1-C18烷基,尤其雜有-O-之C1-C18烷基。R 6 is hydrogen, C 1 -C 18 alkyl, or C 1 -C 18 alkoxy, and R 32 is methyl, Cl, or OMe, and R 8 is H, C 1 -C 18 alkyl, or C 1 -C 18 alkyl substituted by E and/or heterozygous D, especially heterozygous -O-C 1 -C 18 alkyl.

EP2034537A2係關於包含半導體層之薄膜電晶體裝置,該半導體層包含含有由下式表示之化學結構的化合物:EP 2034537 A2 relates to a thin film transistor device comprising a semiconductor layer comprising a compound containing a chemical structure represented by the following formula:

其中X各自獨立地選自S、Se、O及NR",R"各自獨立地選自氫、視情況經取代之烴及含雜原子之基團,Z各自獨立地係視情況經取代之烴、含雜原子之基團及鹵素中之一者,d係至少為1之數,e係0至2之數;a代表至少為1之數;b代表0至20之數;且n代表至少為1之數。Wherein X is each independently selected from the group consisting of S, Se, O, and NR", and R" are each independently selected from the group consisting of hydrogen, optionally substituted hydrocarbons, and hetero atom-containing groups, and Z is independently substituted as appropriate. And one of a hetero atom-containing group and a halogen, d is at least 1 and e is 0 to 2; a represents at least 1; b represents 0 to 20; and n represents at least It is a number of one.

其中,明確揭示下列均聚物:Among them, the following homopolymers are clearly revealed:

其中n係重複單元之數量且可為約2至約5000,R'''、R""及R'''''可為相同或不同取代基,且其中該取代基獨立地選自由視情況經取代之烴基團及含雜原子之基團組成之群。Wherein n is a number of repeating units and may be from about 2 to about 5,000, and R''', R"" and R'"'' may be the same or different substituents, and wherein the substituents are independently selected from the condition A group consisting of a substituted hydrocarbon group and a hetero atom-containing group.

本發明並非指均聚物,尤其式(22)、(23)、(24)、(25)、(34)、(35)、(36)、(37)、(44)、(45)、(46)及(47)之均聚物,其明確揭示於EP2034537A2中。The present invention does not refer to homopolymers, especially formulas (22), (23), (24), (25), (34), (35), (36), (37), (44), (45), Homopolymers of (46) and (47), which are expressly disclosed in EP 2034537 A2.

EP2075274A1揭示含有高度共面重複單元之可溶性聚噻吩衍生物。TPT(噻吩-伸苯基-噻吩)單元之共面特性改良分子內結合及分子間π-π相互作用的程度。EP 2 075 274 A1 discloses soluble polythiophene derivatives containing highly coplanar repeating units. The coplanar nature of the TPT (thiophene-phenylene-thiophene) unit improves the degree of intramolecular binding and intermolecular π-π interaction.

本發明目標係提供一種聚合物,在用於有機場效應電晶體、有機光伏打裝置(太陽能電池)及光電二極體中時,該等聚合物可顯示高能量轉換效率、優良場效應遷移率、良好開/關電流比及/或優良穩定性。The object of the present invention is to provide a polymer which exhibits high energy conversion efficiency and excellent field effect mobility when used in an organic field effect transistor, an organic photovoltaic device (solar cell) and a photodiode. Good on/off current ratio and/or excellent stability.

該目標已由包含式(I)之(重複)單元的聚合物、或式(II)或(III)之聚合物得以解決,其中The target has been included (I) (repeated) unit of polymer, or formula (II) or The polymer of (III) is solved, wherein

x=0.995至0.005,y=0.005至0.995,尤其x=0.2至0.8,y=0.8至0.2,且其中x+y=1。x=0.995 to 0.005, y=0.005 to 0.995, especially x=0.2 to 0.8, y=0.8 to 0.2, and wherein x+y=1.

r=0.985至0.005,s=0.005至0.985,t=0.005至0.985,u=0.005至0.985,且其中r+s+t+u=1,r=0.985 to 0.005, s=0.005 to 0.985, t=0.005 to 0.985, u=0.005 to 0.985, and wherein r+s+t+u=1,

A係式(IV)之基團,其中a'為整數1或2,b為整數1或2,c為0、或整數1或2,d為0、或整數1或2,e為0、或整數1或2,f為0、或整數1或2,R1及R2可相同或不同且選自氫、C1-C100烷基、-COOR203;C1-C100烷基,其經一或多個鹵素原子、羥基、硝基、-CN、或C6-C18芳基取代及/或雜有-O-、-COO-、-OCO-、或-S-;C7-C100芳基烷基、胺甲醯基;C5-C12環烷基,其可經C1-C8烷基及/或C1-C8烷氧基取代1至3次;C6-C24芳基,尤其苯基或1-或2-萘基,其可經C1-C8烷基、C1-C8硫代烷氧基、及/或C1-C8烷氧基取代1至3次;或五氟苯基,R203係C1-C50烷基,尤其C4-C25烷基;Ar1及Ar1'彼此獨立地為A series a group of (IV), wherein a' is an integer 1 or 2, b is an integer 1 or 2, c is 0, or an integer 1 or 2, d is 0, or an integer 1 or 2, and e is 0, or an integer 1 Or 2, f is 0, or an integer 1 or 2, and R 1 and R 2 may be the same or different and are selected from the group consisting of hydrogen, C 1 -C 100 alkyl, -COOR 203 ; C 1 -C 100 alkyl, one via Or a plurality of halogen atoms, hydroxyl groups, nitro groups, -CN, or C 6 -C 18 aryl groups substituted and/or hetero-O-, -COO-, -OCO-, or -S-; C 7 -C 100 Arylalkyl, aminemethanyl; C 5 -C 12 cycloalkyl, which may be substituted 1 to 3 times with C 1 -C 8 alkyl and/or C 1 -C 8 alkoxy; C 6 -C a 24 aryl group, especially a phenyl or 1- or 2-naphthyl group, which may be substituted by a C 1 -C 8 alkyl group, a C 1 -C 8 thioalkoxy group, and/or a C 1 -C 8 alkoxy group 1 to 3 times; or pentafluorophenyl, R 203 is a C 1 -C 50 alkyl group, especially a C 4 -C 25 alkyl group; Ar 1 and Ar 1 ' are independently of each other ,

Ar2、Ar2'、Ar3及Ar3'彼此獨立地為Ar 2 , Ar 2 ′ , Ar 3 and Ar 3 ′ are independently of each other ,

,或具有Ar1之含義,其中X3及X4中之一者係N且另一者係CR99,R99、R104及R104'彼此獨立地為氫、鹵素,尤其F;或可視情況雜有一或多個氧或硫原子之C1-C25烷基,尤其C4-C25烷基;C7-C25芳基烷基、或C1-C25烷氧基,R105、R105'、R106及R106'彼此獨立地為氫、鹵素;可視情況雜有一或多個氧或硫原子之C1-C25烷基;C7-C25芳基烷基、或C1-C18烷氧基;R107係C7-C25芳基烷基、C6-C18芳基;經C1-C18烷基、C1-C18全氟烷基或C1-C18烷氧基取代之C6-C18芳基;C1-C25烷基;雜有-O-或-S-之C1-C25烷基;或-COOR119;R116係氫、C7-C25芳基烷基、C6-C18芳基;經C1-C18烷基、C1-C18全氟烷基或C1-C18烷氧基取代之C6-C18芳基;C1-C25烷基;雜有-O-或-S-之C1-C25烷基;或-COOR119;R119係C1-C25烷基、經E'取代及/或雜有D'之C1-C25烷基、C7-C25芳基烷基、C6-C24芳基、經G取代之C6-C24芳基、或C7-C25芳烷基,R108及R109彼此獨立地為H、C1-C25烷基、經E'取代及/或雜有D'之C1-C25烷基、C7-C25芳基烷基、C6-C24芳基、經G取代之C6-C24芳基、C2-C20雜芳基、經G取代之C2-C20雜芳基、C2-C18烯基、C2-C18炔基、C1-C18烷氧基、經E'取代及/或雜有D'之C1-C18烷氧基、或C7-C25芳烷基,或R108與R109一起形成式=CR110R111之基團,其中R110及R111彼此獨立地為H、C1-C18烷基、經E'取代及/或雜有D'之C1-C18烷基、C6-C24芳基、經G取代之C6-C24芳基、或C2-C20雜芳基或經G取代之C2-C20雜芳基,或R108與R109一起形成5或6員環,其可視情況經以下基團取代:C1-C18烷基、經E'取代及/或雜有D'之C1-C18烷基、C6-C24芳基、經G取代之C6-C24芳基、C2-C20雜芳基、經G取代之C2-C20雜芳基、C2-C18烯基、C2-C18炔基、C1-C18烷氧基、經E'取代及/或雜有D'之C1-C18烷氧基或C7-C25芳烷基,D'係-CO-、-COO-、-S-、-O-或-NR112-,E'係C1-C8硫代烷氧基、C1-C8烷氧基、CN、-NR112R113、-CONR112R113或鹵素,G係E'或C1-C18烷基,且R112及R113彼此獨立地為H;C6-C18芳基;經C1-C18烷基、或C1-C18烷氧基取代之C6-C18芳基;C1-C18烷基;或雜有-O-之C1-C18烷基,B、D及E彼此獨立地為下式之基團: Or having the meaning of Ar 1 , wherein one of X 3 and X 4 is N and the other is CR 99 , R 99 , R 104 and R 104 ' are each independently hydrogen, halogen, especially F; or visible a C 1 -C 25 alkyl group having one or more oxygen or sulfur atoms, especially a C 4 -C 25 alkyl group; a C 7 -C 25 arylalkyl group, or a C 1 -C 25 alkoxy group, R 105 , R 105 ' , R 106 and R 106 ' are, independently of each other, hydrogen, halogen; optionally, a C 1 -C 25 alkyl group having one or more oxygen or sulfur atoms; a C 7 -C 25 arylalkyl group, or C 1 -C 18 alkoxy; R 107 is C 7 -C 25 arylalkyl, C 6 -C 18 aryl; C 1 -C 18 alkyl, C 1 -C 18 perfluoroalkyl or C of 1 -C 18 alkoxy-substituted C 6 -C 18 aryl; C 1 -C 25 alkyl; -O- or -S- mixed with the C 1 -C 25 alkyl; or -COOR 119; R 116 Hydrogen, C 7 -C 25 arylalkyl, C 6 -C 18 aryl; substituted by C 1 -C 18 alkyl, C 1 -C 18 perfluoroalkyl or C 1 -C 18 alkoxy C 6 -C 18 aryl; C 1 -C 25 alkyl; hetero-O- or -S-C 1 -C 25 alkyl; or -COOR 119 ; R 119 C 1 -C 25 alkyl, C 1 -C 25 alkyl, C 7 -C 25 arylalkyl, C 6 -C 2 substituted by E' and/or misced with D' a 4 aryl group, a C 6 -C 24 aryl group substituted by G, or a C 7 -C 25 aralkyl group, and R 108 and R 109 are each independently H, C 1 -C 25 alkyl, substituted by E' and / or mixed with D' C 1 -C 25 alkyl, C 7 -C 25 arylalkyl, C 6 -C 24 aryl, G substituted C 6 -C 24 aryl, C 2 -C 20 Heteroaryl, G-substituted C 2 -C 20 heteroaryl, C 2 -C 18 alkenyl, C 2 -C 18 alkynyl, C 1 -C 18 alkoxy, E'substituted and/or hetero a C 1 -C 18 alkoxy group having D', or a C 7 -C 25 aralkyl group, or R 108 together with R 109 forming a group of the formula =CR 110 R 111 wherein R 110 and R 111 are independently of each other is H, C 1 -C 18 alkyl, E 'substituted and / or mixed with D' of C 1 -C 18 alkyl, C 6 -C 24 aryl group, substituted by the G C 6 -C 24 aryl group , or C 2 -C 20 substituted with the aryl or heteroaryl G C 2 -C 20 heteroaryl, or R 108 and R 109 form a 5- or 6-membered ring, which is optionally substituted with the following groups: C 1 - C 18 alkyl, C 1 -C 18 alkyl, C 6 -C 24 aryl, C 6 -C 24 aryl, C 2 -C 20 substituted with E' and/or D' Heteroaryl, G 2 -C 20 heteroaryl substituted by C, C 2 -C 18 alkenyl, C 2 -C 18 alkynyl, C 1 -C 18 alkoxy, C 1 -C 18 alkoxy or C 7 -C 25 aralkyl substituted by D' and/or misced with D', D'-CO-, -COO-, -S-, -O- or - NR 112 -, E' is a C 1 -C 8 thioalkoxy group, a C 1 -C 8 alkoxy group, CN, -NR 112 R 113 , -CONR 112 R 113 or a halogen, G system E' or C 1 -C 18 alkyl and R 112 and R 113 independently of each other H; C 6 -C 18 aryl; substituted with C 1 -C 18 alkyl, or C 1 -C 18 alkoxy group of C 6 -C 18 aryl; C 1 -C 18 alkyl; or heteroaryl substituted with -O- of C 1 -C 18 alkyl, B, D and E are each independently a group of the formula:

或式IV,前提係若B、D及E係式IV之基團,則其不同於A,其中k為1,l為0或1,r為0或1,z為0或1,a為整數1至5,尤其1至3,g為整數1或2,h為整數1或2,i為0、或整數1或2,j為0、或整數1或2,k為0、或整數1或2,1為0、或整數1或2,R1'及R2'彼此獨立地具有R1之含義,Ar8、Ar8'、Ar9、Ar9'、Ar10及Ar10'彼此獨立地具有Ar2之含義,Ar4、Ar5、Ar6及Ar7彼此獨立地係下式之基團:Or Formula IV, provided that B, D and E are groups of formula IV, which differ from A, where k is 1, l is 0 or 1, r is 0 or 1, z is 0 or 1, a is Integer 1 to 5, especially 1 to 3, g is an integer 1 or 2, h is an integer 1 or 2, i is 0, or an integer 1 or 2, j is 0, or an integer 1 or 2, k is 0, or an integer 1 or 2, 1 is 0, or an integer 1 or 2, and R 1 ' and R 2' independently of each other have the meaning of R 1 , Ar 8 , Ar 8 ' , Ar 9 , Ar 9 ' , Ar 10 and Ar 10' Independent of each other, has the meaning of Ar 2 , and Ar 4 , Ar 5 , Ar 6 and Ar 7 are independently of each other:

,其中X5及X6中之一者係N且另一者係CR14,Ar20係伸芳基或伸雜芳基,其各自可視情況經取代,R118具有R116之含義,R12及R12'彼此獨立地為氫、鹵素;可視情況雜有一或多個氧或硫原子之C1-C25烷基,尤其C4-C25烷基;C1-C25烷氧基、C7-C25芳基烷基、或R13係C1-C10烷基或三(C1-C8烷基)甲矽烷基,R14、R14'、R15、R15'、R17及R17'彼此獨立地為氫;或可視情況雜有一或多個氧原子之C1-C25烷基,尤其C6-C25烷基;R18及R18'彼此獨立地為氫、鹵素;可視情況雜有一或多個氧或硫原子之C1-C25烷基,尤其C4-C25烷基;C7-C25芳烷基或C1-C25烷氧基;R19係氫、C7-C25芳烷基、C6-C18芳基;經C1-C18烷基、或C1-C18烷氧基取代之C6-C18芳基;或可視情況雜有一或多個氧或硫原子之C1-C25烷基,尤其C4-C25烷基;R20及R20'彼此獨立地為氫、C7-C25芳烷基;可視情況雜有一或多個氧或硫原子之C1-C25烷基,尤其C4-C25烷基,X7係-O-、-S-、-NR115-、-Si(R117)(R117')-、-C(R120)(R120')-、-C(=O)-、 Wherein one of X 5 and X 6 is N and the other is CR 14 , Ar 20 is an aryl or heteroaryl group, each of which may be optionally substituted, R 118 has the meaning of R 116 , R 12 And R 12' are, independently of each other, hydrogen, halogen; optionally, a C 1 -C 25 alkyl group having one or more oxygen or sulfur atoms, especially a C 4 -C 25 alkyl group; a C 1 -C 25 alkoxy group, C 7 -C 25 arylalkyl, or R 13 is C 1 -C 10 alkyl or tri(C 1 -C 8 alkyl)carbyl, and R 14 , R 14' , R 15 , R 15 ' , R 17 and R 17 ' are each independently hydrogen. Or optionally, a C 1 -C 25 alkyl group having one or more oxygen atoms, especially a C 6 -C 25 alkyl group; R 18 and R 18' are independently hydrogen and halogen; and optionally one or more C 1 -C 25 alkyl, especially C 4 -C 25 alkyl; C 7 -C 25 aralkyl or C 1 -C 25 alkoxy; R 19 hydrogen, C 7 -C 25 aralkyl, C 6 -C 18 aryl; substituted with the alkyl group by C 1 -C 18, or C 1 -C 18 alkoxy, C 6 -C 18 aryl group; or heteroaryl optionally with one or more oxygen or a C 1 -C 25 alkyl group of a sulfur atom, especially a C 4 -C 25 alkyl group; R 20 and R 20' are each independently hydrogen, C 7 -C 25 aralkyl; optionally, one or more oxygen or a C 1 -C 25 alkyl group of a sulfur atom, especially a C 4 -C 25 alkyl group, an X 7 system -O-, -S-, -NR 115 -, -Si(R 117 )(R 117' )-, C(R 120 )(R 120' )-, -C(=O)-, ,

X8係-O-或-NR115-;R100及R100'彼此獨立地為H、F、C1-C18烷基、雜有O之C1-C18烷基、C1-C18烷氧基、雜有O之C1-C18烷氧基、C1-C18全氟烷基、可視情況經C1-C8烷基及/或C1-C8烷氧基取代1至3次之C6-C24芳基、可視情況經C1-C8烷基及/或C1-C8烷氧基取代1至3次之C2-C20雜芳基;R303、R304、R305及R306彼此獨立地為H、F、C1-C18烷基、雜有O之C1-C18烷基、C1-C18烷氧基、雜有O之C1-C18烷氧基、C1-C18全氟烷基、可視情況經C1-C8烷基及/或C1-C8烷氧基取代1至3次之C6-C24芳基、可視情況經C1-C8烷基及/或C1-C8烷氧基取代1至3次之C2-C20雜芳基;R307及R308彼此獨立地為H或可視情況雜有一或多個氧或硫原子之C1-C25烷基;R309、R310、R311及R312彼此獨立地為H、C1-C25烷氧基、或可視情況雜有一或多個氧或硫原子之C1-C25烷基;R101及R101'彼此獨立地為H、F、C1-C18烷基、雜有O之C1-C18烷基、C1-C18烷氧基、雜有O之C1-C18烷氧基、C1-C18全氟烷基、可視情況經C1-C8烷基及/或C1-C8烷氧基取代1至3次之C6-C24芳基、可視情況經C1-C8烷基及/或C1-C8烷氧基取代1至3次之C2-C20雜芳基;R102及R102'彼此獨立地為H、鹵素、可視情況雜有一或多個氧或硫原子之C1-C25烷基;C7-C25芳基烷基、或C1-C25烷氧基;R103及R103'彼此獨立地為氫、鹵素;可視情況雜有一或多個氧或硫原子之C1-C25烷基;可視情況經C1-C8烷基及/或C1-C8烷氧基取代1至3次之C6-C24芳基;C7-C25芳基烷基、CN、或C1-C25烷氧基;或R103及R103'一起形成環,R115及R115'彼此獨立地為氫、C6-C18芳基;經C1-C18烷基、或C1-C18烷氧基取代之C6-C18芳基;可視情況雜有一或多個氧或硫原子之C1-C25烷基,尤其C4-C25烷基;或C7-C25芳基烷基,R117及R117'彼此獨立地為C1-C35烷基、C7-C25芳基烷基、或視情況可經C1-C8烷基及/或C1-C8烷氧基取代1至3次之苯基,R120及R120'彼此獨立地為氫、可視情況雜有一或多個氧或硫原子之C1-C35烷基、或C7-C25芳基烷基,R121係H、可視情況雜有一或多個氧或硫原子之C1-C18烷基、C1-C18全氟烷基、可視情況經C1-C8烷基及/或C1-C8烷氧基取代1至3次之C6-C24芳基;可視情況經C1-C8烷基及/或C1-C8烷氧基取代1至3次之C2-C20雜芳基;或CN,前提係基團Ar1、Ar1'、Ar2、Ar2'、Ar3及Ar3'中之至少一者係;及/或基團B、D及E中之至少一者含有基團相對於含有基團之聚合物,含有基團之聚合物較佳。X 8 based -O- or -NR 115 -; R 100 and R 100 'each independently is H, F, C 1 -C 18 alkyl group, an O heteroatom of C 1 -C 18 alkyl, C 1 -C 18 alkoxy, C 1 -C 18 alkoxy with O, C 1 -C 18 perfluoroalkyl, optionally substituted by C 1 -C 8 alkyl and/or C 1 -C 8 alkoxy 1 to 3 times C 6 -C 24 aryl, optionally substituted by C 1 -C 8 alkyl and/or C 1 -C 8 alkoxy 1 to 3 C 2 -C 20 heteroaryl; R 303, R 304, R 305 and R 306 are independently H, F, C 1 -C 18 alkyl group, the O mixed with each other C 1 -C 18 alkyl, C 1 -C 18 alkoxy, mixed with O C 1 -C 18 alkoxy, C 1 -C 18 perfluoroalkyl, optionally substituted by C 1 -C 8 alkyl and/or C 1 -C 8 alkoxy 1 to 3 times C 6 - C 24 aryl, optionally substituted by C 1 -C 8 alkyl and/or C 1 -C 8 alkoxy, 1 to 3 times C 2 -C 20 heteroaryl; R 307 and R 308 are independently of each other H or optionally a C 1 -C 25 alkyl group having one or more oxygen or sulfur atoms; R 309 , R 310 , R 311 and R 312 are each independently H, C 1 -C 25 alkoxy, or visible a C 1 -C 25 alkyl group having one or more oxygen or sulfur atoms; R 101 and R 101 ' are each independently H , F., C 1 -C 18 alkyl group, an O heteroatom of C 1 -C 18 alkyl, C 1 -C 18 alkoxy, an O heteroatom of C 1 -C 18 alkoxy, C 1 -C 18 Perfluoroalkyl, optionally substituted by C 1 -C 8 alkyl and/or C 1 -C 8 alkoxy, 1 to 3 times C 6 -C 24 aryl, optionally C 1 -C 8 alkyl And/or a C 1 -C 8 alkoxy group substituted 1 to 3 times C 2 -C 20 heteroaryl; R 102 and R 102' are, independently of each other, H, halogen, optionally mixed with one or more oxygen or sulfur C 1 -C 25 alkyl; C 7 -C 25 arylalkyl, or C 1 -C 25 alkoxy; R 103 and R 103 ', independently of each other, hydrogen, halogen; optionally one or more a C 1 -C 25 alkyl group of an oxygen or sulfur atom; optionally a C 6 -C 24 aryl group substituted by a C 1 -C 8 alkyl group and/or a C 1 -C 8 alkoxy group 1 to 3 times; 7- C 25 arylalkyl, CN, or C 1 -C 25 alkoxy; or R 103 and R 103 ' together form a ring, R 115 and R 115 ' are each independently hydrogen, C 6 -C 18 aryl a C 6 -C 18 aryl group substituted by a C 1 -C 18 alkyl group or a C 1 -C 18 alkoxy group; optionally a C 1 -C 25 alkyl group having one or more oxygen or sulfur atoms, Especially C 4 -C 25 alkyl; or C 7 -C 25 arylalkyl, R 117 and R 117' are, independently of each other, C 1 -C 35 alkyl, C 7 -C 25 arylalkyl, or optionally C 1 -C 8 alkyl and/or C 1 -C 8 alkoxy Substituting 1 to 3 phenyl groups, R 120 and R 120' are each independently hydrogen, optionally having one or more oxygen or sulfur atoms, C 1 -C 35 alkyl, or C 7 -C 25 aryl alkane a group, R 121 is H, optionally a C 1 -C 18 alkyl group having one or more oxygen or sulfur atoms, a C 1 -C 18 perfluoroalkyl group, optionally a C 1 -C 8 alkyl group and/or C 1 -C 8 alkoxy substituted 1 to 3 times C 6 -C 24 aryl; optionally substituted by C 1 -C 8 alkyl and/or C 1 -C 8 alkoxy 1 to 3 times C 2 - C 20 heteroaryl; or CN, provided that at least one of the groups Ar 1 , Ar 1 ' , Ar 2 , Ar 2 ' , Ar 3 and Ar 3 ' And/or at least one of the groups B, D and E contain a group Relative to a group Polymer containing groups The polymer is preferred.

若基團直接鍵結至DPP骨架,則以下優先性適用:(ˊ代表至DPP骨架之鍵)。亦即,基團最佳。Group Direct bonding to the DPP skeleton, the following priorities apply: (ˊ represents the key to the DPP skeleton). That is, the group optimal.

若聚合物包含式(I)之(重複)單元,其中A係式(IVa)之基團且D係式(Vx)之基團,則X7較佳不同於-S-及-C(R120)(R120')-。If the polymer contains (I) (repeated) unit, where A is Group of (IVa) and D series The group of (Vx), X 7 is preferably different from -S- and -C(R 120 )(R 120' )-.

在式(Vx)之基團情形下,X7較佳係-O-、-NR115-、-Si(R117)(R117')-、-C(=O)-、In style In the case of the group of (Vx), X 7 is preferably -O-, -NR 115 -, -Si(R 117 )(R 117' )-, -C(=O)-,

,更佳-C(R120)(R120')-、,且最佳式之基團。 , more preferably -C(R 120 )(R 120 ')-, or And best The group.

在式(Vy)及(Vz)之基團的情形下,X7較佳係-O-、-S-、-NR115-、-C(R120)(R120')-、-Si(R117)(R117')-、-C(=O)-、In the case of the groups of the formulae (Vy) and (Vz), X 7 is preferably -O-, -S-, -NR 115 -, -C(R 120 )(R 120' )-, -Si( R 117 )(R 117 ')-, -C(=O)-,

,更佳-C(R120)(R120')-、,且最佳式之基團。 , more preferably -C(R 120 )(R 120 ')-, or And best The group.

本發明聚合物可有利地用於有機光伏打(PV)裝置(太陽能電池)中。The polymers of the invention can be advantageously used in organic photovoltaic (PV) devices (solar cells).

有利地,本發明聚合物、或包含本發明聚合物之有機半導體材料、層或組份可用於有機光伏打裝置(太陽能電池)及光電二極體、或有機場效應電晶體(OFET)中。Advantageously, the polymers of the invention, or organic semiconductor materials, layers or components comprising the polymers of the invention, can be used in organic photovoltaic devices (solar cells) and photodiodes, or in organic field effect transistors (OFETs).

本發明聚合物係共聚物。共聚物係衍生自一種以上單體之聚合物,例如,二聚物、三聚物、四聚物等。The polymer-based copolymer of the present invention. The copolymer is a polymer derived from more than one monomer, for example, a dimer, a trimer, a tetramer, and the like.

術語聚合物包含寡聚物以及聚合物。本發明寡聚物之重量平均分子量<4,000道爾頓。本發明聚合物之重量平均分子量較佳為4,000道爾頓或更高,尤其4,000至2,000,000道爾頓、更佳10,000至1,000,000、且最佳10,000至100,000道爾頓。根據高溫凝膠滲透層析(HT-GPC)使用聚苯乙烯標準品來測定分子量。本發明聚合物之多分散性較佳為1.01至10、更佳1.1至3.0、最佳1.5至2.5。聚合物較寡聚物更佳。The term polymer encompasses both oligomers and polymers. The oligomers of the invention have a weight average molecular weight of < 4,000 Daltons. The weight average molecular weight of the polymer of the present invention is preferably 4,000 Daltons or more, especially 4,000 to 2,000,000 Daltons, more preferably 10,000 to 1,000,000, and most preferably 10,000 to 100,000 Daltons. The molecular weight was determined using a polystyrene standard according to high temperature gel permeation chromatography (HT-GPC). The polydispersity of the polymer of the present invention is preferably from 1.01 to 10, more preferably from 1.1 to 3.0, most preferably from 1.5 to 2.5. The polymer is better than the oligomer.

R1及R2可為氫,但較佳地與氫不同。R 1 and R 2 may be hydrogen, but are preferably different from hydrogen.

R1及R2可不同,但較佳相同。較佳地,R1及R2彼此獨立地代表C1-C100烷基、可經C1-C8烷基及/或C1-C8烷氧基取代1至3次之C5-C12環烷基、可經C1-C8烷基及/或C1-C8烷氧基取代1至3次之苯基或1-或2-萘基、或-CR301R302-(CH2)u-A3,其中R301及R302代表氫、或C1-C4烷基,A3代表可經C1-C8烷基及/或C1-C8烷氧基取代1至3次之苯基或1-或2-萘基,且u代表0、1、2或3。R1及R2更佳係C1-C36烷基,例如甲基、乙基、正-丙基、異丙基、正-丁基、第二-丁基、異丁基、第三丁基、正-戊基、2-戊基、3-戊基、2,2-二甲基丙基、1,1,3,3-四甲基戊基、正-己基、1-甲基己基、1,1,3,3,5,5-六甲基己基、正-庚基、異庚基、1,1,3,3-四甲基丁基、1-甲基庚基、3-甲基庚基、正-辛基、1,1,3,3-四甲基丁基及2-乙基己基、正-壬基、癸基、十一烷基,尤其正-十二烷基、十三烷基、十四烷基、十五烷基、十六烷基、2-乙基-己基、2-丁基-己基、2-丁基-辛基、2-己基癸基、2-癸基-十四烷基、十七烷基、十八烷基、二十烷基、二十一烷基、二十二烷基、或二十四烷基。在本發明之一尤佳實施例中,R1及R2係2-己基癸基、或2-癸基-十四烷基。R 1 and R 2 may be different, but are preferably the same. Preferably, R 1 and R 2 independently of each other represent C 1 -C 100 alkyl, C 1 -C 8 alkyl and/or C 1 -C 8 alkoxy substituted 1 to 3 times C 5 - C 12 cycloalkyl, phenyl or 1- or 2-naphthyl substituted by C 1 -C 8 alkyl and/or C 1 -C 8 alkoxy for 1 to 3 times, or -CR 301 R 302 - (CH 2 ) u -A 3 , wherein R 301 and R 302 represent hydrogen or C 1 -C 4 alkyl, and A 3 represents a C 1 -C 8 alkyl group and/or a C 1 -C 8 alkoxy group Substituting 1 to 3 phenyl or 1- or 2-naphthyl, and u represents 0, 1, 2 or 3. R 1 and R 2 are more preferably C 1 -C 36 alkyl, such as methyl, ethyl, n-propyl, isopropyl, n-butyl, second-butyl, isobutyl, tert-butyl Base, n-pentyl, 2-pentyl, 3-pentyl, 2,2-dimethylpropyl, 1,1,3,3-tetramethylpentyl, n-hexyl, 1-methylhexyl 1,1,3,3,5,5-hexamethylhexyl, n-heptyl, isoheptyl, 1,1,3,3-tetramethylbutyl, 1-methylheptyl, 3- Methyl heptyl, n-octyl, 1,1,3,3-tetramethylbutyl and 2-ethylhexyl, n-decyl, decyl, undecyl, especially n-dodecyl , tridecyl, tetradecyl, pentadecyl, hexadecyl, 2-ethyl-hexyl, 2-butyl-hexyl, 2-butyl-octyl, 2-hexyldecyl, 2 - mercapto-tetradecyl, heptadecyl, octadecyl, eicosyl, icosyl, behenyl, or tetracosyl. In a particularly preferred embodiment of the invention, R 1 and R 2 are 2-hexyldecyl, or 2-mercapto-tetradecyl.

有利地,基團R1及R2可由式表示,其中m1=n1+2且m1+n124。對掌性側鏈(例如R1及R2)可為純對掌性、或外消旋側鏈,其可影響聚合物之形態Advantageously, the groups R 1 and R 2 can be of the formula Said, where m1=n1+2 and m1+n1 twenty four. The palmar side chain (eg, R 1 and R 2 ) may be pure palm or racemic side chain, which may affect the morphology of the polymer

R1'及R2'分別具有與R1及R2相同之優先性。R 1 ' and R 2' have the same priority as R 1 and R 2 , respectively.

如式所示,基團可以兩種方式佈置於聚合物鏈中。標號應包含兩種可能。As As shown, group Can be in two ways or Arranged in the polymer chain. Label There should be two possibilities.

重複單元可以兩種方式佈置於共聚物中,即。標號Repeat unit Can be arranged in the copolymer in two ways, ie . Label

應包含兩種可能(區域異構體)。 There should be two possibilities (regional isomers).

其他基團同樣適用,其可以不同方式佈置於單體及/或聚合物中。Other groups are equally suitable, which can be arranged in different ways in the monomers and/or polymers.

較佳地,Ar1及Ar1'彼此獨立地為 更佳地,Ar1及Ar1彼此獨立地為,其中最佳(ˊ代表至DPP骨架之鍵)。Ar1及Ar1'可不同,但較佳相同。Preferably, Ar 1 and Ar 1 ′ are independently of each other More preferably, Ar 1 and Ar 1 are independently of each other ,among them Best (ˊ represents the key to the DPP skeleton). Ar 1 and Ar 1 ' may be different, but are preferably the same.

在一較佳實施例中,本發明係關於聚合物,其中Ar1及Ar1'彼此獨立地為其中X3係CH且X4係N,或X3係N且X4係CH,且R116係如上文所定義。R116較佳不同於H。In a preferred embodiment, the invention is directed to a polymer wherein Ar 1 and Ar 1 ' are independently of each other Wherein X 3 is CH and X 4 is N, or X 3 is N and X 4 is CH, and R 116 is as defined above. R 116 is preferably different from H.

較佳地,Ar8及Ar8'彼此獨立地為 更佳地,Ar8及Ar8'彼此獨立地為,其中最佳(ˊ代表至DPP骨架之鍵)。Ar8及Ar8'可不同,但較佳相同。Preferably, Ar 8 and Ar 8' are independently of each other More preferably, Ar 8 and Ar 8' are independently of each other ,among them Best (ˊ represents the key to the DPP skeleton). Ar 8 and Ar 8' may be different, but are preferably the same.

若Ar1及Ar1'彼此獨立地為,則Ar2及Ar2'彼此獨立地為,其中R104不同於氫且較佳係C1-C25烷基(ˊ代表至DPP骨架之鍵、或緊跟DPP骨架之基團)。If Ar 1 and Ar 1' are independent of each other , then Ar 2 and Ar 2' are independent of each other. Wherein R 104 is different from hydrogen and is preferably C 1 -C 25 alkyl (ˊ represents a bond to the DPP backbone, or a group immediately following the DPP backbone).

若a'及c係1,且e係0且Ar1及Ar2具有相同含義;或若a'、c及e係1且Ar1及Ar2及Ar3具有相同含義;則D較佳不同於Ar1If a' and c are 1, and e is 0 and Ar 1 and Ar 2 have the same meaning; or if a', c and e are 1 and Ar 1 and Ar 2 and Ar 3 have the same meaning; In Ar 1 .

若a'及c係1,且e係0且Ar1及Ar2;或若a'、c及e係1且Ar1及Ar2及Ar3;則D較佳不同於基團If a' and c are 1, and e is 0 and Ar 1 and Ar 2 are Or if a', c, and e are 1 and Ar 1 and Ar 2 and Ar 3 are ; then D is preferably different from the group .

A較佳係式(IVa)、(IVb)、(IVc)、(IVd)、(IVe)、(IVf)、(IVg)、(IVh)、(IVi)、(IVj)或(IVk)之基團,如本申請案之技術方案3所定義。式IVa、IVc、IVe、IVg、IVh、IVi及IVk之基團更佳。式IVa、IVc、IVe、IVg、IVh及Ivi之基團最佳。A preferably is based on (IVa), (IVb), (IVc), (IVd), (IVe), (IVf), (IVg), (IVh), (IVi), (IVj) or (IVk) The group is as defined in the technical solution 3 of the present application. The groups of the formulae IVa, IVc, IVe, IVg, IVh, IVi and IVk are more preferred. The groups of formulae IVa, IVc, IVe, IVg, IVh and Ivi are optimal.

較佳地,B、D及E彼此獨立地為如技術方案4中所定義之式(Va)、(Vb)、(Vc)、(Vd)、(Ve)、(Vf)、(Vg)、(Vh)、(Vi)、(Vj)、(Vk)、(Vl)、(Vm)、(Vn)、(Vo)、(Vp)、(Vq)、(Vr)、(Vs)、(Vt)、(Vu)、(Vv)、(Vw)、(Vx)、(Vy)、(Vz)或(Va')之基團。式Va、Vb、Vc、Ve、Vf、Vh、Vi、Vj、Vk、Vl、Vm、Vn、Vo、Vp、Vq、Vr、Vs、Vu、Vv、Vw、Vx、Vy、Vz及Va'之基團更佳。式Va、Vc、Vf、Vh、Vi、Vk、Vo、Vp、Vq、Vr、Vs、Vu、Vw、Vx及Va'之基團最佳。在式Vx之基團中,式Vx"之基團最佳。Preferably, B, D and E are independently of each other as defined in the formula (Va), (Vb), (Vc), (Vd), (Ve), (Vf), (Vg), (Vh), (Vi), (Vj), (Vk), (Vl), (Vm), (Vn), (Vo), (Vp), (Vq), (Vr), (Vs), (Vt a group of (Vu), (Vv), (Vw), (Vx), (Vy), (Vz) or (Va'). Formulas Va, Vb, Vc, Ve, Vf, Vh, Vi, Vj, Vk, Vl, Vm, Vn, Vo, Vp, Vq, Vr, Vs, Vu, Vv, Vw, Vx, Vy, Vz, and Va' The group is better. The groups of the formulae Va, Vc, Vf, Vh, Vi, Vk, Vo, Vp, Vq, Vr, Vs, Vu, Vw, Vx and Va' are most preferred. In the group of formula Vx, the group of formula Vx" is optimal.

式(Vb')之基團較佳係式之基團,其中R309及R310彼此獨立地為C1-C25烷氧基。a group of the formula (Vb') is preferred A group wherein R 309 and R 310 are, independently of each other, a C 1 -C 25 alkoxy group.

在一較佳實施例中,本發明係關於包含式I,尤其Ia之(重複)單元的聚合物、或式II或III之聚合物,其中A係式IVa之基團,且D係式(Vb'),尤其之基團,其中R309及R310彼此獨立地為C1-C25烷氧基。In a preferred embodiment, the invention relates to a polymer comprising a (repeating) unit of formula I, in particular Ia, or a polymer of formula II or III, wherein A is a group of formula IVa and the formula D is (Vb'), especially A group wherein R 309 and R 310 are, independently of each other, a C 1 -C 25 alkoxy group.

式(Vc')之基團較佳係式之基團。a group of formula (Vc') is preferred The group.

式(Vd')之基團較佳係式之基團。a group of the formula (Vd') is preferably a formula The group.

在一較佳實施例中,本發明係關於包含式(I)之重複單元的聚合物,其中A係式IVa、IVc、IVe、IVg、IVh、IVi、IVj或IVk之基團,R1及R2係C1-C35烷基,尤其C8-C35烷基,R104係C1-C25烷基,尤其C4-C25烷基,其可視情況雜有一或多個氧或硫原子,D係式Va、Vb、Vc,尤其、Ve、Vf、Vh、Vi、Vj、Vk、Vl、Vm、Vn、Vo、Vp、Vq、Vr、Vs、Vu、Vv、Vw、Vx,尤其、Vy、Vz或Va'之基團。在該實施例中,式(Ia)之聚合物更佳,其中n係4(尤其10)至1000,尤其4至200,極特別地5(尤其20)至100。當前最佳者係聚合物,其中A係式IVa之基團且D係式Vx,尤其Vx"之基團,例如。該聚合物之實例係式之聚合物,其中n係4(尤其10)至1000,尤其4至200,極特別地5(尤其20)至100且R1係C1-C35烷基,尤其C8-C35烷基。該聚合物在用於太陽能電池中時顯示高能量轉換效率。In a preferred embodiment, the invention relates to inclusion a polymer of the repeating unit of (I), wherein A is a group of the formula IVa, IVc, IVe, IVg, IVh, IVi, IVj or IVk, and R 1 and R 2 are a C 1 -C 35 alkyl group, especially C 8 -C 35 alkyl, R 104 is a C 1 -C 25 alkyl group, especially a C 4 -C 25 alkyl group, which may optionally have one or more oxygen or sulfur atoms, D system of formula Va, Vb, Vc, especially , Ve, Vf, Vh, Vi, Vj, Vk, Vl, Vm, Vn, Vo, Vp, Vq, Vr, Vs, Vu, Vv, Vw, Vx, especially a group of Vy, Vz or Va'. In this embodiment, The polymer of (Ia) is more preferred, wherein n is 4 (especially 10) to 1000, especially 4 to 200, very particularly 5 (especially 20) to 100. The best currently polymer is one in which the group A is a group of formula IVa and the D is a group of formula Vx, especially Vx", for example . Example of the polymer a polymer wherein n is 4 (especially 10) to 1000, especially 4 to 200, very particularly 5 (especially 20) to 100 and R 1 is C 1 -C 35 alkyl, especially C 8 -C 35 alkyl . The polymer exhibits high energy conversion efficiency when used in a solar cell.

在另一實施例中,本發明係關於式I,尤其式Ia之聚合物,其中A係式IVa之基團且D係式Vo,尤其之基團,例如。該聚合物之實例係式之聚合物,其中n係4(尤其10)至1000,尤其4至200,極特別地5(尤其20)至100且R1係C1-C35烷基,尤其C8-C35烷基。該聚合物在用於太陽能電池中時顯示高能量轉換效率。In another embodiment, the present invention is directed to a polymer of Formula I, particularly Formula Ia, wherein A is a group of Formula IVa and D is a formula Vo, especially Group, for example . Example of the polymer a polymer wherein n is 4 (especially 10) to 1000, especially 4 to 200, very particularly 5 (especially 20) to 100 and R 1 is C 1 -C 35 alkyl, especially C 8 -C 35 alkyl . The polymer exhibits high energy conversion efficiency when used in a solar cell.

在一較佳實施例中,本發明係關於包含下式之重複單元的聚合物:(II),其中x=0.995至0.005,y=0.005至0.995,尤其x=0.2至0.8,y=0.8至0.2,且其中x+y=1;A係式IVa、IVc、IVe、IVg、IVh、IVi、IVj或IVk之基團,R1及R2係C1-C35烷基,尤其C8-C35烷基,R104係C1-C25烷基,尤其C4-C25烷基,其可視情況雜有一或多個氧或硫原子,B及D彼此獨立地為式Va、Vb、Vc,尤其Ve、Vf、Vh、Vi、Vj、Vk、Vl、Vm、Vn、Vo、Vp、Vq、Vr、Vs、Vu、Vv、Vw、Vx,尤其Vy、Vz或Va'之基團。式IIa聚合物之重量平均分子量尤其為10,000至1,000,000道爾頓,極特別地10,000至100,000道爾頓。In a preferred embodiment, the invention is directed to a polymer comprising repeating units of the formula: (II), wherein x=0.995 to 0.005, y=0.005 to 0.995, especially x=0.2 to 0.8, y=0.8 to 0.2, and wherein x+y=1; A is a formula IVa, IVc, IVe, IVg, IVh a group of IVi, IVj or IVk, R 1 and R 2 are C 1 -C 35 alkyl, especially C 8 -C 35 alkyl, R 104 is C 1 -C 25 alkyl, especially C 4 -C 25 An alkyl group which may optionally have one or more oxygen or sulfur atoms, and B and D independently of each other are of the formulae Va, Vb, Vc, especially Ve, Vf, Vh, Vi, Vj, Vk, Vl, Vm, Vn, Vo, Vp, Vq, Vr, Vs, Vu, Vv, Vw, Vx, especially a group of Vy, Vz or Va'. The weight average molecular weight of the polymer of formula IIa is especially from 10,000 to 1,000,000 Daltons, very particularly from 10,000 to 100,000 Daltons.

由式(IIa)表示之聚合物結構係經由(例如)Suzuki聚合程序獲得之聚合物產物的理想化代表。單體A、B及D同時聚合可產生由隨機排序之單元(聚(AD-stat-BD))組成的統計共聚物。By The polymer structure represented by (IIa) is an idealized representation of the polymer product obtained via, for example, the Suzuki polymerization procedure. Simultaneous polymerization of monomers A, B and D produces randomly ordered units and A statistical copolymer composed of (AD-stat-BD).

在另一較佳實施例中,本發明係關於包含下式之重複單元的聚合物:(II),其中x=0.995至0.005,y=0.005至0.995,尤其x=0.2至0.8,y=0.8至0.2,且其中x+y=1;A係如技術方案3中所定義之式IVa、IVc、IVe、IVg、IVh、IVi、IVj或IVk之基團,R104係C1-C25烷基,尤其C4-C25烷基,其可視情況雜有一或多個氧或硫原子,B係式之基團,R1及R2係C1-C35烷基,尤其C8-C35烷基,D係如上文所定義之式Va、Vb、Vc,尤其、Ve、Vf、Vh、Vi、Vj、Vk、Vl、Vm、Vn、Vo、Vp、Vq、Vr、Vs、Vu、Vv、Vw、Vx,尤其、Vy、Vz或Va'之基團。In another preferred embodiment, the invention is directed to a polymer comprising repeating units of the formula: (II), wherein x=0.995 to 0.005, y=0.005 to 0.995, especially x=0.2 to 0.8, y=0.8 to 0.2, and wherein x+y=1; A is the formula IVa as defined in the third embodiment a group of IVc, IVe, IVg, IVh, IVi, IVj or IVk, R 104 is a C 1 -C 25 alkyl group, especially a C 4 -C 25 alkyl group, which may optionally have one or more oxygen or sulfur atoms , B series a group, R 1 and R 2 are C 1 -C 35 alkyl, especially C 8 -C 35 alkyl, and D is a formula Va, Vb, Vc as defined above, especially , Ve, Vf, Vh, Vi, Vj, Vk, Vl, Vm, Vn, Vo, Vp, Vq, Vr, Vs, Vu, Vv, Vw, Vx, especially a group of Vy, Vz or Va'.

在一較佳實施例中,本發明係關於包含下式之重複單元的聚合物:(III),其中r=0.985至0.005,s=0.005至0.985,t=0.005至0.985,u=0.005至0.985,且其中r+s+t+u=1,A係式IVa、IVc、IVe、IVg、IVh、IVi、IVj或IVk之基團,R1及R2係C1-C35烷基,尤其C8-C35烷基,R104係C1-C25烷基,尤其C4-C25烷基,其可視情況雜有一或多個氧或硫原子,B、D及E彼此獨立地為式Va、Vb、Vc,尤其、Ve、Vf、Vh、Vi、Vj、Vk、Vl、Vm、Vn、Vo、Vp、Vq、Vr、Vs、Vu、Vv、Vw、Vx,尤其、Vy、Vz或Va'之基團。式IIIa聚合物之重量平均分子量尤其為10,000至1,000,000道爾頓,極特別地10,000至100,000道爾頓。In a preferred embodiment, the invention is directed to a polymer comprising repeating units of the formula: (III), where r=0.985 to 0.005, s=0.005 to 0.985, t=0.005 to 0.985, u=0.005 to 0.985, and wherein r+s+t+u=1, A is of formula IVa, IVc, IVe, a group of IVg, IVh, IVi, IVj or IVk, R 1 and R 2 are C 1 -C 35 alkyl, especially C 8 -C 35 alkyl, R 104 is C 1 -C 25 alkyl, especially C 4 -C 25 alkyl group, which may optionally have one or more oxygen or sulfur atoms, and B, D and E independently of each other are of formula Va, Vb, Vc, especially , Ve, Vf, Vh, Vi, Vj, Vk, Vl, Vm, Vn, Vo, Vp, Vq, Vr, Vs, Vu, Vv, Vw, Vx, especially a group of Vy, Vz or Va'. The weight average molecular weight of the polymer of formula IIIa is especially from 10,000 to 1,000,000 Daltons, very particularly from 10,000 to 100,000 Daltons.

在上述實施例中,式IVa、IVc、IVe、IVg、IVh及IVi之基團作為基團A最佳。In the above examples, the groups of the formulae IVa, IVc, IVe, IVg, IVh and IVi are most preferred as the group A.

由式(IIIa)表示之聚合物結構係經由(例如)Suzuki聚合程序獲得之聚合物產物的理想化代表。單體A、B、D及E同時聚合可產生由隨機排序之單元(聚(AD-stat-BD-stat-AE-stat-BE)組成的統計共聚物。By The polymer structure represented by (IIIa) is an idealized representation of the polymer product obtained via, for example, a Suzuki polymerization procedure. Simultaneous polymerization of monomers A, B, D, and E produces randomly ordered units (Statistical copolymer composed of poly(AD-stat-BD-stat-AE-stat-BE).

當前式(Ia)、(Ib)、(Ic)、(Id)、(If)、(Ig)、(Ih)、(Ii)、(Ij)、(Ik)、(Il)、(Im)、(In)、(Io)、(Ip)、(Iq)、(Ir)、(Is)、(It)、(Iu)、(Iv)、(Ix)、(Iy)、(Iz)、(Ia')、(Ib')、(Ic')、(Id')、(Ie')、(If')、(Ig')、(Ih')、(Ii')、(Ij')、(IIa)、(IIb)、(IIc)、(IId)、(IIe)、(IIf)、(IIg)、(IIh)、(IIi)及(IIj)之聚合物最佳。參照技術方案8。Current formulas (Ia), (Ib), (Ic), (Id), (If), (Ig), (Ih), (Ii), (Ij), (Ik), (Il), (Im), (In), (Io), (Ip), (Iq), (Ir), (Is), (It), (Iu), (Iv), (Ix), (Iy), (Iz), (Ia '), (Ib'), (Ic'), (Id'), (Ie'), (If'), (Ig'), (Ih'), (Ii'), (Ij'), (IIa The polymers of (IIb), (IIc), (IId), (IIe), (IIf), (IIg), (IIh), (IIi) and (IIj) are most preferred. Refer to Technical Solution 8.

R104較佳係C1-C25烷基,尤其C4-C25烷基,其可視情況雜有一或多個氧或硫原子。R 104 is preferably C 1 -C 25 alkyl, especially C 4 -C 25 alkyl, optionally having one or more oxygen or sulfur atoms.

R15、R15'、R17及R17'較佳彼此獨立地為H;或可視情況雜有一或多個氧原子之C1-C25烷基,尤其C6-C25烷基。R 15 , R 15 ' , R 17 and R 17 ' are preferably independently of each other H; or optionally a C 1 -C 25 alkyl group having one or more oxygen atoms, especially a C 6 -C 25 alkyl group.

R20及R20'較佳彼此獨立地為氫、C7-C25芳烷基;可視情況雜有一或多個氧或硫原子之C1-C25烷基,尤其C4-C25烷基。R 20 and R 20 ' are preferably, independently of one another, hydrogen, C 7 -C 25 aralkyl; optionally a C 1 -C 25 alkyl group having one or more oxygen or sulfur atoms, especially a C 4 -C 25 alkane base.

R100及R100'較佳係H。R 100 and R 100' are preferably H.

R101及R101'較佳係H、C1-C25烷基、或C1-C25烷氧基。R 101 and R 101 ' are preferably H, C 1 -C 25 alkyl, or C 1 -C 25 alkoxy.

R102及R102'較佳係H、或C1-C25烷基。R 102 and R 102' are preferably H or a C 1 -C 25 alkyl group.

R103較佳係H、或C1-C25烷基。R 103 is preferably H or a C 1 -C 25 alkyl group.

R116較佳係H、或C1-C25烷基。R 116 is preferably H, or C 1 -C 25 alkyl.

R120及R120'較佳係C1-C35烷基。R 120 and R 120' are preferably C 1 -C 35 alkyl groups.

針對式II聚合物更詳細闡釋本發明聚合物之製備。式I及III聚合物可使用針對式II聚合物之製備所述的方法製備。The preparation of the polymers of the invention is illustrated in more detail for the polymers of formula II. The polymers of formulae I and III can be prepared using the methods described for the preparation of polymers of formula II.

式II之共聚物可藉由(例如)Suzuki反應獲得。芳香族酸鹽(boronate)與鹵化物(尤其溴化物)之縮合反應(統稱為「Suzuki反應」)容許存在各種有機官能團,如N. Miyaura及A. Suzuki在Chemical Reviews,第95卷,第457-2483頁(1995)中所報告。較佳觸媒係2-二環己基膦基-2',6'-二-烷氧基聯苯/乙酸鈀(II)、三-烷基-鏻鹽/鈀(0)衍生物及三-烷基膦/鈀(0)衍生物。尤佳之觸媒係2-二環己基膦基-2',6'-二-甲氧基聯苯(sPhos)/乙酸鈀(II)及三-第三丁基四氟硼酸鏻((t-Bu)3P*HBF4)/叁(二亞苄基丙酮)二鈀(0)(Pd2(dba)3)及三-第三丁基膦(t-Bu)3P/叁(二亞苄基丙酮)二鈀(0)(Pd2(dba)3)。此反應可適用於製備高分子量聚合物及共聚物。The copolymer of formula II can be obtained, for example, by the Suzuki reaction. Aromatic The condensation reaction of a boronate with a halide (especially a bromide) (collectively referred to as "Suzuki reaction") allows for the presence of various organic functional groups such as N. Miyaura and A. Suzuki in Chemical Reviews, Vol. 95, pp. 457-2483 Reported in page (1995). Preferred catalysts are 2-dicyclohexylphosphino-2',6'-di-alkoxybiphenyl/palladium(II) acetate, tris-alkyl-phosphonium/palladium (0) derivatives and tri- Alkylphosphine/palladium (0) derivative. The preferred catalyst is 2-dicyclohexylphosphino-2',6'-di-methoxybiphenyl (sPhos) / palladium acetate (II) and tris-tert-butyl tetrafluoroborate ((t) -Bu) 3 P*HBF 4 )/叁 (dibenzylideneacetone) dipalladium (0) (Pd 2 (dba) 3 ) and tri-t-butylphosphine (t-Bu) 3 P/叁 (two Benzylideneacetone) dipalladium (0) (Pd 2 (dba) 3 ). This reaction is suitable for the preparation of high molecular weight polymers and copolymers.

為製備對應於式II之聚合物,在Pd及三苯基膦之催化作用下使式之二鹵化物與(等莫耳)量對應於式之二酸或二酸鹽反應;或使式之二鹵化物與(等莫耳)量對應於式之二酸或二酸鹽反應,其中X10係鹵素,尤其Cl、Br或I,極特別地Br,且X11在每次出現時皆獨立地為-B(OH)2、-B(OY1)2,其中Y1在每次出現時皆獨立地為C1-C10烷基且Y2在每次出現時皆獨立地為C2-C10伸烷基,例如-CY3Y4-CY5Y6-、或-CY7Y8-CY9Y10-CY11Y12-,其中Y3、Y4、Y5、Y6、Y7、Y8、Y9、Y10、Y11及Y12彼此獨立地為氫、或C1-C10烷基,尤其-C(CH3)2C(CH3)2-、-CH2C(CH3)2CH2-、或-C(CH3)2CH2C(CH3)2-,且Y13及Y14彼此獨立地為氫、或C1-C10烷基。該反應通常係在約0℃至180℃下於芳香族烴溶劑(例如甲苯或二甲苯)中實施。亦可單獨使用其他溶劑(例如二甲基甲醯胺、二噁烷、二甲氧基乙烷及四氫呋喃)、或該等溶劑與芳香族烴之混合物。使用鹼性水溶液(較佳係碳酸鈉或碳酸氫鈉、磷酸鉀、碳酸鉀或碳酸氫鉀)作為酸、酸鹽之活化劑及作為HBr清除劑。聚合反應可持續0.2至100小時。有機鹼(例如,四烷基氫氧化銨)、及相轉移觸媒(例如,TBAB)可提升硼之活性(例如,參見Leadbeater & Marco;Angew. Chem. Int. Ed. Eng. 42(2003) 1407及其中所引用之參考文獻)。反應條件之其他變化由T. I. Wallow及B. M. Novak在J. Org. Chem. 59(1994) 5034-5037、及M. Remmers,M. Schulze及G. Wegner在Macromol Rapid Commun. 17(1996) 239-252中給出。可藉由使用過量之二溴化物、二酸、或二酸鹽、或鏈終止劑來控制分子量。To prepare a polymer corresponding to formula II, under the catalysis of Pd and triphenylphosphine and The amount of dihalide and (equal moir) corresponds to of two Acid or two Acid salt reaction The amount of dihalide and (equal moir) corresponds to and of two Acid or two An acid salt reaction wherein X 10 is a halogen, especially Cl, Br or I, very particularly Br, and X 11 is independently -B(OH) 2 , -B(OY 1 ) 2 , at each occurrence, Wherein Y 1 is independently C 1 -C 10 alkyl at each occurrence and Y 2 is independently C 2 -C 10 alkyl at each occurrence, for example -CY 3 Y 4 -CY 5 Y 6 -, or -CY 7 Y 8 -CY 9 Y 10 -CY 11 Y 12 -, wherein Y 3 , Y 4 , Y 5 , Y 6 , Y 7 , Y 8 , Y 9 , Y 10 , Y 11 and Y 12 is independently of each other hydrogen, or C 1 -C 10 alkyl, especially -C(CH 3 ) 2 C(CH 3 ) 2 -, -CH 2 C(CH 3 ) 2 CH 2 -, or -C( CH 3 ) 2 CH 2 C(CH 3 ) 2 -, and Y 13 and Y 14 are each independently hydrogen or C 1 -C 10 alkyl. The reaction is usually carried out in an aromatic hydrocarbon solvent such as toluene or xylene at a temperature of from about 0 °C to 180 °C. Other solvents such as dimethylformamide, dioxane, dimethoxyethane and tetrahydrofuran, or a mixture of such solvents and aromatic hydrocarbons may also be used alone. Use an alkaline aqueous solution (preferably sodium carbonate or sodium hydrogencarbonate, potassium phosphate, potassium carbonate or potassium hydrogencarbonate) as acid, An activator of the acid salt and as a HBr scavenger. The polymerization can last from 0.2 to 100 hours. An organic base (e.g., tetraalkylammonium hydroxide), and a phase transfer catalyst (e.g., TBAB) can enhance the activity of boron (see, for example, Leadbeater &Marco; Angew. Chem. Int. Ed. Eng. 42 (2003) 1407 and references cited therein). Other changes in reaction conditions by TI Wallow and BM Novak in J. Org. Chem. 59 (1994) 5034-5037, and M. Remmers, M. Schulze and G. Wegner in Macromol Rapid Commun. 17 (1996) 239-252 Given in . By using an excess of dibromide, two Acid, or two An acid salt, or a chain terminator, to control the molecular weight.

根據WO2010/136352(歐洲專利申請案第09176497.7號)中所述之方法,聚合係在以下物質存在下實施:According to the method described in WO2010/136352 (European Patent Application No. 09176497.7), the polymerization is carried out in the presence of:

a) 觸媒/配體系統,其包含鈀觸媒及有機膦或鏻化合物,a) a catalyst/ligand system comprising a palladium catalyst and an organophosphine or ruthenium compound,

b) 鹼,b) alkali,

c) 溶劑或溶劑混合物,其特徵在於:c) a solvent or solvent mixture characterized by:

該有機膦係下式之經三取代膦:(VI)、或其鏻鹽,其中X獨立於Y地代表氮原子或C-R2"基團且Y獨立於X地代表氮原子或C-R9"基團,兩個R1"基團中每一者之R1"獨立於另一者代表選自以下基團之基團:C1-C24-烷基、C3-C20-環烷基(其尤其包括單環以及雙-環及三-環環烷基)、C5-C14-芳基(其尤其包括苯基、萘基、茀基)、C2-C13-雜芳基(其中選自N、O、S之群之雜原子的數目可為1至2),其中兩個R1"基團亦可彼此連接,且其中上述基團R1"本身可各自彼此獨立地經選自以下基團之取代基單取代或多取代:氫、C1-C20-烷基、C2-C20-烯基、C3-C8-環烷基、C2-C9-雜-烷基、C5-C10-芳基、C2-C9-雜芳基(其中來自N、O、S之群之雜原子的數目可為1至4)、C1-C20-烷氧基、C1-C10-鹵代烷基、羥基、NH-(C1-C20-烷基)、NH-(C5-C10-芳基)、N(C1-C20-烷基)2、N(C1-C20-烷基)(C5-C10-芳基)、N(C5-C10-芳基)2、N(C1-C20-烷基/C5-C10-芳基3)3 +、NH-CO-C1-C20-烷基、NH-CO-C5-C10-芳基形式之胺基、COOH及COOQ形式之羧酸根基(其中Q代表單價陽離子或C1-C8-烷基)、C1-C6-醯氧基、亞磺酸根基、SO3H及SO3Q'形式之磺酸根基(其中Q'代表單價陽離子、C1-C20-烷基、或C5-C10-芳基)、三-C1-C6-烷基甲矽烷基,其中兩個所述取代基亦可彼此橋接,R2"至R9"代表氫、烷基、烯基、環烷基、芳香族或雜芳香族芳基、O-烷基、NH-烷基、N-(烷基)2、O-(芳基)、NH-(芳基)、N-(烷基)(芳基)、O-CO-烷基、O-CO-芳基、F、Si(烷基)3、CF3、CN、CO2H、COH、SO3H、CONH2、CONH(烷基)、CON(烷基)2、SO2(烷基)、SO(烷基)、SO(芳基)、SO2(芳基)、SO3(烷基)、SO3(芳基)、S-烷基、S-芳基、NH-CO(烷基)、CO2(烷基)、CONH2、CO(烷基)、NHCOH、NHCO2(烷基)、CO(芳基)、CO2(芳基)基團,其中兩個或更多個彼此獨立之毗鄰基團亦可彼此連接從而產生縮合之環系統,且其中在R2"至R9"中,烷基代表可在每一情形下皆係直鏈或具支鏈且具有1至20個碳原子之烴基團,烯基代表可在每一情形下皆係直鏈或具支鏈且具有2至20個碳原子之單-或多-不飽和烴基團,環烷基代表具有3至20個碳原子之烴,芳基代表5至14員芳香族基團,其中芳基中之1至4個碳原子亦可由來自基團氮、氧及硫之雜原子代替從而產生5至14員雜芳香族基團,其中基團R2"至R9"亦可具有針對R1"所定義之其他取代基。The organophosphine is a trisubstituted phosphine of the formula: (VI), or a phosphonium salt thereof, wherein X is independently a Y representing a nitrogen atom or a CR 2" group and Y is independently from X to represent a nitrogen atom or a CR 9" group, each of two R 1 " groups R 1" independently of the other represents a group selected from the group consisting of C 1 -C 24 -alkyl, C 3 -C 20 -cycloalkyl (which includes, inter alia, monocyclic as well as bi-ring and tri a cyclocycloalkyl group, a C 5 -C 14 -aryl group (which includes, in particular, a phenyl group, a naphthyl group, an anthracenyl group), a C 2 -C 13 -heteroaryl group (wherein selected from the group consisting of N, O, and S) The number of heteroatoms may be 1 to 2), wherein two R 1 " groups may also be bonded to each other, and wherein the above-mentioned groups R 1 " themselves may be independently substituted with each other independently with a substituent selected from the group below or Polysubstituted: hydrogen, C 1 -C 20 -alkyl, C 2 -C 20 -alkenyl, C 3 -C 8 -cycloalkyl, C 2 -C 9 -hetero-alkyl, C 5 -C 10 - Aryl, C 2 -C 9 -heteroaryl (wherein the number of heteroatoms from the group of N, O, S can be from 1 to 4), C 1 -C 20 -alkoxy, C 1 -C 10 - Haloalkyl, hydroxy, NH-(C 1 -C 20 -alkyl), NH-(C 5 -C 10 -aryl), N(C 1 -C 20 -alkyl) 2 , N(C 1 -C 20 -alkyl)(C 5 -C 10 -aryl), N(C 5 -C 10 -aryl) 2 , N(C 1 -C 20 -alkyl/C 5 -C 10 -aryl 3 ) 3 + , NH-CO-C 1 -C 20 -alkyl, NH-CO-C 5 -C 10 -aryl a carboxylate group in the form of an amine group, COOH and COOQ (wherein Q represents a monovalent cation or a C 1 -C 8 -alkyl group), a C 1 -C 6 -decyloxy group, a sulfinate group, SO 3 H and SO a sulfonate group of the Q' form (wherein Q' represents a monovalent cation, a C 1 -C 20 -alkyl group, or a C 5 -C 10 -aryl group), a tri-C 1 -C 6 -alkylcarbenyl group, Two of the substituents may also be bridged to each other, and R 2" to R 9" represent hydrogen, alkyl, alkenyl, cycloalkyl, aromatic or heteroaromatic aryl, O-alkyl, NH-alkyl , N-(alkyl) 2 , O-(aryl), NH-(aryl), N-(alkyl)(aryl), O-CO-alkyl, O-CO-aryl, F, Si(alkyl) 3 , CF 3 , CN, CO 2 H, COH, SO 3 H, CONH 2 , CONH (alkyl), CON(alkyl) 2 , SO 2 (alkyl), SO (alkyl) , SO (aryl), SO 2 (aryl), SO 3 (alkyl), SO 3 (aryl), S-alkyl, S-aryl, NH-CO (alkyl), CO 2 (alkane) Base, CONH 2 , CO (alkyl), NHCOH, NHCO 2 (alkyl), CO (aryl), CO 2 (aryl) groups, two or more of which are independent of each other The adjacent groups may also be linked to each other to produce a condensed ring system, and wherein in R 2" to R 9" , the alkyl group may be linear or branched in each case and has from 1 to 20 a hydrocarbon group of one carbon atom, the alkenyl group representing a mono- or poly-unsaturated hydrocarbon group which may be linear or branched in each case and having 2 to 20 carbon atoms, and the cycloalkyl group has 3 to a hydrocarbon of 20 carbon atoms, the aryl group representing a 5 to 14 membered aromatic group, wherein 1 to 4 carbon atoms in the aryl group may also be replaced by a hetero atom derived from the group nitrogen, oxygen and sulfur to produce 5 to 14 members. Heteroaromatic groups wherein the groups R 2" to R 9" may also have other substituents as defined for R 1" .

有機膦及其合成闡述於WO2004101581中。Organophosphines and their synthesis are described in WO2004101581.

較佳之有機膦選自下式之經三取代膦:Preferred organophosphines are selected from the group consisting of trisubstituted phosphines of the formula:

1) R5"與R6"一起形成環2) R3"與R4"一起形成環 1) R 5" and R 6" together form a ring . 2) R 3" and R 4" together form a ring .

較佳觸媒之實例包含下列化合物:乙醯丙酮鈀(II)、二亞苄基-丙酮鈀(0)錯合物、丙酸鈀(II),Pd2(dba)3:[叁(二亞苄基丙酮)二鈀(0)],Pd(dba)2:[雙(二亞苄基丙酮)鈀(0)],Pd(PR3)2,其中PR3係式VI之經三取代膦,Pd(OAc)2:[乙酸鈀(II)]、氯化鈀(II)、溴化鈀(II)、四氯鈀酸鋰(II),PdCl2(PR3)2:其中PR3係式VI之經三取代膦;鈀(0)二烯丙基-醚錯合物、硝酸鈀(II),PdCl2(PhCN)2:[二氯雙(苄腈)鈀(II)],PdCl2(CH3CN):[二氯雙(乙腈)鈀(II)],及PdCl2(COD):[二氯(1,5-環辛二烯)鈀(II)]。Examples of preferred catalysts include the following compounds: acetamacetone palladium (II), dibenzylidene-acetone palladium (0) complex, palladium propionate (II), Pd 2 (dba) 3 : [叁 (二) Benzylideneacetone)dipalladium(0)], Pd(dba) 2 :[bis(dibenzylideneacetone)palladium(0)], Pd(PR 3 ) 2 , wherein the PR 3 system is trisubstituted by formula VI Phosphide, Pd(OAc) 2 : [palladium(II) acetate], palladium (II) chloride, palladium (II) bromide, lithium (II) tetrachloropalladate, PdCl 2 (PR 3 ) 2 : PR 3 a trisubstituted phosphine of formula VI; palladium (0) diallyl-ether complex, palladium (II) nitrate, PdCl 2 (PhCN) 2 : [dichlorobis(benzonitrile)palladium(II)], PdCl 2 (CH 3 CN): [dichlorobis(acetonitrile)palladium(II)], and PdCl 2 (COD): [dichloro(1,5-cyclooctadiene)palladium(II)].

尤佳者係PdCl2、Pd2(dba)3、Pd(dba)2、Pd(OAc)2、或Pd(PR3)2。最佳者係Pd2(dba)3及Pd(OAc)2Particularly preferred are PdCl 2 , Pd 2 (dba) 3 , Pd(dba) 2 , Pd(OAc) 2 , or Pd(PR 3 ) 2 . The best ones are Pd 2 (dba) 3 and Pd (OAc) 2 .

鈀觸媒係以催化量存在於反應混合物中。術語「催化量」係指顯著低於一當量(雜)芳香族化合物之量,基於所用(雜)芳香族化合物之當量,較佳為0.001至5 mol-%、最佳為0.001至1 mol-%。The palladium catalyst is present in the reaction mixture in a catalytic amount. The term "catalytic amount" means an amount significantly less than one equivalent of the (hetero)aromatic compound, preferably from 0.001 to 5 mol-%, most preferably from 0.001 to 1 mol, based on the equivalent of the (hetero)aromatic compound used. %.

基於所用(雜)芳香族化合物之當量,反應混合物中膦或鏻鹽之量較佳為0.001至10 mol-%、最佳為0.01至5 mol-%。Pd:膦之較佳比率為1:4。The amount of the phosphine or phosphonium salt in the reaction mixture is preferably from 0.001 to 10 mol-%, most preferably from 0.01 to 5 mol-%, based on the equivalent of the (hetero) aromatic compound used. The preferred ratio of Pd: phosphine is 1:4.

鹼可選自所有水性及非水性鹼且可為無機或有機鹼。較佳地,反應混合物中存在至少1.5當量之該鹼/硼官能團。適宜的鹼係(例如)鹼金屬及鹼土金屬之氫氧化物、羧酸鹽、碳酸鹽、氟化物及磷酸鹽(例如鈉及鉀之氫氧化物、乙酸鹽、碳酸鹽、氟化物及磷酸鹽)或亦金屬醇鹽。亦可使用鹼之混合物。鹼較佳係鋰鹽,例如,鋰醇鹽(例如,甲醇鋰及乙醇鋰)、氫氧化鋰、羧酸鋰、碳酸鋰、氟化鋰及/或磷酸鋰。The base can be selected from all aqueous and non-aqueous bases and can be inorganic or organic bases. Preferably, at least 1.5 equivalents of the base/boron functional group are present in the reaction mixture. Suitable bases are, for example, hydroxides, carboxylates, carbonates, fluorides and phosphates of alkali metals and alkaline earth metals (for example, hydroxides, acetates, carbonates, fluorides and phosphates of sodium and potassium) Or a metal alkoxide. Mixtures of bases can also be used. The base is preferably a lithium salt such as a lithium alkoxide (for example, lithium methoxide and lithium ethoxide), lithium hydroxide, lithium carboxylate, lithium carbonate, lithium fluoride and/or lithium phosphate.

當前最佳之鹼係水性LiOHxH2O(LiOH之單水合物)及(無水)LiOH。The currently best base is aqueous LiOHxH 2 O (LiOH monohydrate) and (anhydrous) LiOH.

反應通常係在約0℃至180℃、較佳20℃至160℃、更佳40℃至140℃且最佳40℃至120℃下實施。聚合反應可持續0.1小時,尤其0.2至100小時。The reaction is usually carried out at a temperature of from about 0 ° C to 180 ° C, preferably from 20 ° C to 160 ° C, more preferably from 40 ° C to 140 ° C and most preferably from 40 ° C to 120 ° C. The polymerization can last for 0.1 hours, especially 0.2 to 100 hours.

在本發明一較佳實施例中,溶劑係THF,鹼係LiOH*H2O且反應係在THF之回流溫度(約65℃)下實施。In a preferred embodiment of the invention, the solvent is THF, the base is LiOH*H 2 O and the reaction is carried out at a reflux temperature of THF (about 65 ° C).

溶劑係選自(例如)甲苯、二甲苯、苯甲醚、THF、2-甲基四氫呋喃、二噁烷、氯苯、氟苯、或包含一或多種溶劑之溶劑混合物(例如THF/甲苯)及視情況水。最佳者係THF、或THF/水。The solvent is selected from, for example, toluene, xylene, anisole, THF, 2-methyltetrahydrofuran, dioxane, chlorobenzene, fluorobenzene, or a solvent mixture (eg, THF/toluene) comprising one or more solvents and Water as appropriate. The best is THF, or THF/water.

較佳地,在以下物質存在下實施聚合:Preferably, the polymerization is carried out in the presence of:

a) 乙酸鈀(II)、或Pd2(dba)3(叁(二亞苄基丙酮)二鈀(0))及有機膦A-1至A-13,a) palladium (II) acetate, or Pd 2 (dba) 3 (yttrium (dibenzylideneacetone) dipalladium (0)) and organophosphines A-1 to A-13,

b) LiOH、或LiOHxH2O;及b) LiOH, or LiOHxH 2 O; and

c) THF、及視情況水。若使用LiOH之單水合物,則無需添加水。c) THF, and water as appropriate. If a monohydrate of LiOH is used, it is not necessary to add water.

最佳地,在以下物質存在下實施聚合:Optimally, the polymerization is carried out in the presence of:

a) 乙酸鈀(II)、或Pd2(dba)3(叁(二亞苄基丙酮)二鈀(0))a) Palladium (II) acetate, or Pd 2 (dba) 3 (叁(dibenzylideneacetone) dipalladium (0))

b) LiOHxH2O;及b) LiOHxH 2 O; and

c) THF。基於所用(雜)芳香族化合物之當量,鈀觸媒之存在量較佳為約0.5 mol-%。基於所用(雜)芳香族化合物之當量,反應混合物中膦或鏻鹽之量較佳為約2 mol-%。Pd:膦之較佳比率為約1:4。c) THF. The palladium catalyst is preferably present in an amount of about 0.5 mol-%, based on the equivalent of the (hetero) aromatic compound used. The amount of the phosphine or phosphonium salt in the reaction mixture is preferably about 2 mol-%, based on the equivalent of the (hetero)aromatic compound used. A preferred ratio of Pd: phosphine is about 1:4.

較佳地,在不存在氧之惰性條件下實施聚合反應。使用氮及(更佳)氬作為惰性氣體。Preferably, the polymerization is carried out under inert conditions in the absence of oxygen. Nitrogen and (more preferably) argon are used as the inert gas.

歐洲專利申請案第09176497.7號中所述之方法適用於大規模應用,易於獲得且可以高產率、高純度及高選擇性將起始材料轉化成相應聚合物。該方法可提供重量平均分子量為至少10,000道爾頓、更佳至少20,000道爾頓、最佳至少30,000道爾頓之聚合物。目前最佳之聚合物的重量平均分子量為30,000至80,000道爾頓。根據高溫凝膠滲透層析(HT-GPC)使用聚苯乙烯標準品來測定分子量。聚合物之多分散性較佳為1.01至10、更佳1.1至3.0、最佳1.5至2.5。The process described in European Patent Application No. 09176497.7 is suitable for large-scale applications, is readily available and can convert the starting materials to the corresponding polymers in high yield, high purity and high selectivity. The process can provide a polymer having a weight average molecular weight of at least 10,000 Daltons, more preferably at least 20,000 Daltons, and most preferably at least 30,000 Daltons. The currently preferred polymers have a weight average molecular weight of from 30,000 to 80,000 Daltons. The molecular weight was determined using a polystyrene standard according to high temperature gel permeation chromatography (HT-GPC). The polydispersity of the polymer is preferably from 1.01 to 10, more preferably from 1.1 to 3.0, most preferably from 1.5 to 2.5.

若需要,可使用單官能芳基鹵或酸芳基酯作為該等反應中之鏈終止劑,其可形成末端芳基。If necessary, use a monofunctional aryl halide or The aryl aryl esters act as chain terminators in such reactions which form terminal aryl groups.

在Suzuki反應中,可藉由控制單體進料之順序及組成來控制所得共聚物中單體單元之定序。In the Suzuki reaction, the order of the monomer units in the resulting copolymer can be controlled by controlling the order and composition of the monomer feed.

本發明聚合物亦可藉由Stille偶合來合成(例如,參見Babudri等人,J. Mater. Chem.,2004,14,11-34;J. K. Stille,Angew. Chemie Int. Ed. Engl. 1986,25,508)。為製備對應於式II之聚合物,在0℃至200℃範圍內之溫度下及含鈀觸媒存在下在惰性溶劑中使式之二鹵化物與式之化合物反應,或使式之二鹵化物與式之化合物反應,其中X21係基團-SnR207R208R209且X10係如上文所定義,其中R207、R208及R209相同或不同且係H或C1-C6烷基,其中兩個基團視情況形成共同環且該等基團視情況具支鏈或無支鏈。此處必須確保所用所有單體之總體中有機錫官能團與鹵素官能團之比率高度平衡。此外,可以證實,在反應結束時藉由使用單官能試劑進行封端來去除任何過量之反應性基團係有利的。為實施該方法,較佳地將錫化合物及鹵素化合物引入一或多種惰性有機溶劑中,且在0℃至200℃、較佳30℃至170℃之溫度下攪拌1小時至200小時、較佳5小時至150小時之時間。可藉由熟習此項技術者所習知且適用於各種聚合物之方法來純化粗產物,例如重複實施的再沉澱或甚至藉由透析來純化。The polymers of the invention may also be synthesized by Stille coupling (for example, see Babudri et al, J. Mater. Chem., 2004, 14, 11-34; JK Stille, Angew. Chemie Int. Ed. Engl. 1986, 25, 508 ). To prepare a polymer corresponding to Formula II, in an inert solvent at a temperature ranging from 0 ° C to 200 ° C and in the presence of a palladium-containing catalyst and Dihalide and formula Compound reaction, or Dihalide and formula and Reaction of a compound wherein the X 21 group is -SnR 207 R 208 R 209 and X 10 is as defined above, wherein R 207 , R 208 and R 209 are the same or different and are H or C 1 -C 6 alkyl, Two of the groups form a common ring as appropriate and the groups are optionally branched or unbranched. It must be ensured here that the ratio of organotin functional groups to halogen functional groups in the bulk of all monomers used is highly balanced. Furthermore, it can be confirmed that it is advantageous to remove any excess reactive groups by capping with a monofunctional reagent at the end of the reaction. To carry out the method, the tin compound and the halogen compound are preferably introduced into one or more inert organic solvents, and stirred at a temperature of from 0 ° C to 200 ° C, preferably from 30 ° C to 170 ° C, for from 1 hour to 200 hours, preferably. 5 hours to 150 hours. The crude product can be purified by methods well known to those skilled in the art and suitable for use with various polymers, such as reprecipitation by repeated implementation or even by dialysis.

適用於所述方法之有機溶劑係(例如)醚(例如二乙醚、二甲氧基乙烷、二乙二醇二甲基醚、四氫呋喃、二噁烷、二氧戊環、二異丙基醚及第三丁基甲基醚)、烴(例如己烷、異己烷、庚烷、環己烷、苯、甲苯及二甲苯)、醇(例如甲醇、乙醇、1-丙醇、2-丙醇、乙二醇、1-丁醇、2-丁醇及第三-丁醇)、酮(例如丙酮、乙基甲基酮及異丁基甲基酮)、醯胺(例如二甲基甲醯胺(DMF)、二甲基乙醯胺及N-甲基吡咯啶酮)、腈(例如乙腈、丙腈及丁腈)、及其混合物。Organic solvents suitable for use in the process are, for example, ethers (e.g., diethyl ether, dimethoxyethane, diethylene glycol dimethyl ether, tetrahydrofuran, dioxane, dioxolane, diisopropyl ether) And tert-butyl methyl ether), hydrocarbons (such as hexane, isohexane, heptane, cyclohexane, benzene, toluene and xylene), alcohols (such as methanol, ethanol, 1-propanol, 2-propanol, B) Glycols, 1-butanol, 2-butanol and tri-butanol), ketones (such as acetone, ethyl methyl ketone and isobutyl methyl ketone), decylamine (eg dimethylformamide (DMF)) , dimethylacetamide and N-methylpyrrolidone), nitriles (such as acetonitrile, propionitrile and butyronitrile), and mixtures thereof.

應以類似於針對Suzuki變化形式所述的方式來選擇鈀及膦組份。The palladium and phosphine components should be selected in a manner similar to that described for the Suzuki variant.

或者,本發明聚合物亦可藉由Negishi反應使用鋅試劑A-(ZnX22)2及B-(ZnX22)2(其中X22係鹵素及鹵化物)、及D-(X23)2(其中X23係鹵素或三氟甲磺酸鹽)、或使用A-(X22)2、B-(X22)2及D-(ZnX23)2來合成。例如,參見E. Negishi等人,Heterocycles 18(1982) 117-22。Alternatively, the polymer of the present invention may also be used by the Negishi reaction using zinc reagents A-(ZnX 22 ) 2 and B-(ZnX 22 ) 2 (wherein X 22 halogens and halides), and D-(X 23 ) 2 ( Wherein X 23 is a halogen or a triflate, or A-(X 22 ) 2 , B-(X 22 ) 2 and D-(ZnX 23 ) 2 are used for the synthesis. See, for example, E. Negishi et al., Heterocycles 18 (1982) 117-22.

或者,本發明聚合物亦可藉由Hiyama反應使用有機矽試劑A-(SiR210R211R212)2及B-(SiR210R211R212)2(其中R210、R211及R212相同或不同且係鹵素、或C1-C6烷基)及D-(X23)2(其中X23係鹵素或三氟甲磺酸鹽)、或使用A-(X23)2、B-(X23)2及D-(SiR210R211R212)2來合成。例如,參見T. Hiyama等人,Pure Appl. Chem. 66(1994) 1471-1478及T. Hiyama等人,Synlett(1991) 845-853。Alternatively, the polymer of the present invention may also use the organic hydrazine reagent A-(SiR 210 R 211 R 212 ) 2 and B-(SiR 210 R 211 R 212 ) 2 (wherein R 210 , R 211 and R 212 are the same by Hiyama reaction). Or different and is halogen, or C 1 -C 6 alkyl) and D-(X 23 ) 2 (wherein X 23 halogen or trifluoromethanesulfonate), or A-(X 23 ) 2 , B- (X 23 ) 2 and D-(SiR 210 R 211 R 212 ) 2 were synthesized. See, for example, T. Hiyama et al, Pure Appl. Chem. 66 (1994) 1471-1478 and T. Hiyama et al, Synlett (1991) 845-853.

(Xa)之化合物係本發明聚合物產生中之中間體,其中a、b、c、d、e、f、R1、R2、Ar1、Ar1'、Ar2、Ar2'、Ar3及Ar3'係如上文所定義且X11'在每次出現時皆獨立地為鹵素原子,極特別地為I或Br;或具有X11之含義。formula The compound of (Xa) is an intermediate in the production of the polymer of the present invention, wherein a, b, c, d, e, f, R 1 , R 2 , Ar 1 , Ar 1 ' , Ar 2 , Ar 2 ' , Ar 3 and Ar 3 ' are as defined above and X 11 ' is independently at each occurrence a halogen atom, very particularly I or Br; or has the meaning of X 11 .

(X)之化合物係新化合物且為本申請案之又一目的,其中a、b、c、d、e、f、R1、R2、Ar1、Ar1'、Ar2、Ar2'、Ar3及Ar3'係如技術方案1中所定義且X11在每次出現時皆獨立地為ZnX12、-SnR207R208R209,其中R207、R208及R209相同或不同且係H或C1-C6烷基,其中兩個基團視情況形成共同環且該等基團視情況具支鏈或無支鏈;X12係鹵素原子,極特別地為I或Br;-OS(O)2CF3、-OS(O)2-芳基,尤其、-OS(O)2CH3、-B(OH)2、-B(OH)3 -、-BF3、-B(OY1)2,其中Y1在每次出現時皆獨立地為C1-C10烷基且Y2在每次出現時皆獨立地為C2-C10伸烷基,例如-CY3Y4-CY5Y6-或-CY7Y8-CY9Y10-CY11Y12-,其中Y3、Y4、Y5、Y6、Y7、Y8、Y9、Y10、Y11及Y12彼此獨立地為氫、或C1-C10烷基,尤其-C(CH3)2C(CH3)2-、或-C(CH3)2CH2C(CH3)2-、-CH2C(CH3)2CH2-,且Y13及Y14彼此獨立地為氫或C1-C10烷基。formula The compound of (X) is a novel compound and is another object of the present application, wherein a, b, c, d, e, f, R 1 , R 2 , Ar 1 , Ar 1 ' , Ar 2 , Ar 2 ' , Ar 3 and Ar 3 ' are as defined in the first embodiment and X 11 is independently ZnX 12 , -SnR 207 R 208 R 209 at each occurrence, wherein R 207 , R 208 and R 209 are the same or different And is H or C 1 -C 6 alkyl, wherein the two groups form a common ring as appropriate and the groups are optionally branched or unbranched; X 12 is a halogen atom, very particularly I or Br ;-OS(O) 2 CF 3 , -OS(O) 2 -aryl, especially , -OS(O) 2 CH 3 , -B(OH) 2 , -B(OH) 3 - , -BF 3 , -B(OY 1 ) 2 , Wherein Y 1 is independently C 1 -C 10 alkyl at each occurrence and Y 2 is independently C 2 -C 10 alkyl at each occurrence, for example -CY 3 Y 4 -CY 5 Y 6 - or -CY 7 Y 8 -CY 9 Y 10 -CY 11 Y 12 -, wherein Y 3 , Y 4 , Y 5 , Y 6 , Y 7 , Y 8 , Y 9 , Y 10 , Y 11 and Y 12 independently of each other is hydrogen, or a C 1 -C 10 alkyl group, especially -C(CH 3 ) 2 C(CH 3 ) 2 -, or -C(CH 3 ) 2 CH 2 C(CH 3 ) 2 -, -CH 2 C(CH 3 ) 2 CH 2 -, and Y 13 and Y 14 are each independently hydrogen or C 1 -C 10 alkyl.

下文展示式X化合物之實例:Examples of compounds of formula X are shown below:

X11'、R1、R2、R116、R104及R104'係如上文所定義。X 11 ' , R 1 , R 2 , R 116 , R 104 and R 104 ' are as defined above.

R1及R2較佳係C1-C36烷基,例如甲基、乙基、正-丙基、異丙基、正-丁基、第二-丁基、異丁基、第三丁基、正-戊基、2-戊基、3-戊基、2,2-二甲基丙基、1,1,3,3-四甲基戊基、正-己基、1-甲基己基、1,1,3,3,5,5-六甲基己基、正-庚基、異庚基、1,1,3,3-四甲基丁基、1-甲基庚基、3-甲基庚基、正-辛基、1,1,3,3-四甲基丁基及2-乙基己基、正-壬基、癸基、十一烷基,尤其正-十二烷基、十三烷基、十四烷基、十五烷基、十六烷基、2-乙基-己基、2-丁基-己基、2-丁基-辛基、2-己基癸基、2-辛基-十二烷基、2-癸基-十四烷基、十七烷基、十八烷基、二十烷基、二十一烷基、二十二烷基或二十四烷基。R 1 and R 2 are preferably C 1 -C 36 alkyl, such as methyl, ethyl, n-propyl, isopropyl, n-butyl, second-butyl, isobutyl, tert-butyl Base, n-pentyl, 2-pentyl, 3-pentyl, 2,2-dimethylpropyl, 1,1,3,3-tetramethylpentyl, n-hexyl, 1-methylhexyl 1,1,3,3,5,5-hexamethylhexyl, n-heptyl, isoheptyl, 1,1,3,3-tetramethylbutyl, 1-methylheptyl, 3- Methyl heptyl, n-octyl, 1,1,3,3-tetramethylbutyl and 2-ethylhexyl, n-decyl, decyl, undecyl, especially n-dodecyl , tridecyl, tetradecyl, pentadecyl, hexadecyl, 2-ethyl-hexyl, 2-butyl-hexyl, 2-butyl-octyl, 2-hexyldecyl, 2 -octyl-dodecyl, 2-mercapto-tetradecyl, heptadecyl, octadecyl, eicosyl, icosyl, behenyl or tetracosane base.

R104及R104'可相同或不同且較佳係C1-C25烷基,尤其C4-C25烷基,其可視情況雜有一或多個氧或硫原子,R116較佳係H、或C1-C25烷基。R 104 and R 104' may be the same or different and are preferably C 1 -C 25 alkyl, especially C 4 -C 25 alkyl, which may optionally have one or more oxygen or sulfur atoms, and R 116 is preferably H. Or C 1 -C 25 alkyl.

可藉由使用可在聚合後去除之保護基團來獲得R1及/或R2係氫之聚合物(例如,參見,EP-A-0 648 770、EP-A-0 648 817、EP-A-0 742 255、EP-A-0 761 772、WO 98/32802、WO 98/45757、WO 98/58027、WO 99/01511、WO 00/17275、WO 00/39221、WO 00/63297及EP-A-1 086 984)。藉助以下方式將顏料前體轉化成其顏料形式:在習知條件(例如熱條件)下、視情況在額外觸媒(例如WO 00/36210中所述之觸媒)存在下實施破裂。A polymer of R 1 and/or R 2 -based hydrogen can be obtained by using a protecting group which can be removed after polymerization (for example, see EP-A-0 648 770, EP-A-0 648 817, EP- A-0 742 255, EP-A-0 761 772, WO 98/32802, WO 98/45757, WO 98/58027, WO 99/01511, WO 00/17275, WO 00/39221, WO 00/63297 and EP -A-1 086 984). The pigment precursor is converted to its pigment form by the following method: The rupture is carried out under conventional conditions (e.g., thermal conditions), optionally in the presence of an additional catalyst (e.g., the catalyst described in WO 00/36210).

此一保護基團之實例係式之基團,其中L係適於賦予溶解性之任何合意基團。An example of such a protecting group A group wherein L is suitable for imparting any desirable group for solubility.

L較佳係式、 之基團,其中Z1、Z2及Z3彼此獨立地為C1-C6烷基,Z4及Z8彼此獨立地為C1-C6烷基、雜有氧、硫或N(Z12)2之C1-C6烷基、或未經取代或經C1-C6烷基、C1-C6烷氧基、鹵基、氰基或硝基取代之苯基或聯苯,Z5、Z6及Z7彼此獨立地為氫或C1-C6烷基,Z9係氫、C1-C6烷基或式之基團,Z10及Z11彼此獨立地為氫、C1-C6烷基、C1-C6烷氧基、鹵素、氰基、硝基、N(Z12)2、或未經取代或經鹵基、氰基、硝基、C1-C6烷基或C1-C6烷氧基取代之苯基,Z12及Z13係C1-C6烷基,Z14係氫或C1-C6烷基,且Z15係氫、C1-C6烷基、或未經取代或經C1-C6烷基取代之苯基,Q係未經取代或經C1-C6烷氧基、C1-C6烷硫基或C2-C12二烷基胺基單取代或多取代之p,q-C2-C6伸烷基,其中p及q係不同之位置編號,X係選自由氮、氧及硫組成之群之雜原子,m'在X係氧或硫時為數字0且m在X係氮時為數字1,且L1及L2彼此獨立地為未經取代或單-或多-C1-C12烷氧基-、-C1-C12烷硫基-、-C2-C24二烷基胺基-、-C6-C12芳基氧基-、-C6-C12芳硫基-、-C7-C24烷基芳基胺基-或-C12-C24二芳基胺基取代之C1-C6烷基或[-(p',q'-C2-C6伸烷基)-Z-]n'-C1-C6烷基,n'為1至1000之數字,p'及q'係不同之位置編號,Z各自獨立地為雜原子氧、硫或C1-C12烷基取代氮,且[-C2-C6伸烷基-Z-]重複單元中之C2-C6伸烷基可相同或不同,且L1及L2可係飽和的或具有1至10之不飽和度,可無摻雜基團或在任一位置雜有1至10個選自由-(C=O)-及-C6H4-組成之群之基團,且可不具有其他取代基或具有1至10個選自由鹵素、氰基及硝基組成之群之其他取代基。最佳地,L係式之基團。L is better, a group wherein Z 1 , Z 2 and Z 3 are each independently C 1 -C 6 alkyl, and Z 4 and Z 8 are each independently C 1 -C 6 alkyl, hetero aerobic, sulfur or N ( a C 1 -C 6 alkyl group of Z 12 ) 2 or a phenyl group or a group which is unsubstituted or substituted by a C 1 -C 6 alkyl group, a C 1 -C 6 alkoxy group, a halogen group, a cyano group or a nitro group Benzene, Z 5 , Z 6 and Z 7 are each independently hydrogen or C 1 -C 6 alkyl, Z 9 -based hydrogen, C 1 -C 6 alkyl or formula a group, Z 10 and Z 11 are independently of each other hydrogen, C 1 -C 6 alkyl, C 1 -C 6 alkoxy, halogen, cyano, nitro, N(Z 12 ) 2 , or Substituted or substituted by halo, cyano, nitro, C 1 -C 6 alkyl or C 1 -C 6 alkoxy, Z 12 and Z 13 C 1 -C 6 alkyl, Z 14 Hydrogen or C 1 -C 6 alkyl, and Z 15 is hydrogen, C 1 -C 6 alkyl, or unsubstituted or substituted by C 1 -C 6 alkyl, Q is unsubstituted or C 1- C 6 alkoxy, C 1 -C 6 alkylthio or C 2 -C 12 dialkylamino mono- or poly-substituted p, qC 2 -C 6 alkyl, wherein p and q are different Position number, X is a hetero atom selected from the group consisting of nitrogen, oxygen, and sulfur, m' is a number 0 in the case of X-based oxygen or sulfur, and m is a number 1 in the case of X-based nitrogen, and L 1 and L 2 are each other Independently unsubstituted or mono- or poly-C 1 -C 12 alkoxy-, -C 1 -C 12 alkylthio-, -C 2 -C 24 dialkylamino-, -C 6 - C 12 aryloxy-, -C 6 -C 12 arylthio-, -C 7 -C 24 alkylarylamino- or -C 12 -C 24 diarylamino substituted C 1 -C 6 alkyl or [-(p', q'-C 2 -C 6 alkylene)-Z-] n' -C 1 -C 6 alkyl, n' is a number from 1 to 1000, p' and q' are different position numbers, Z are each independently a heteroatom oxygen, sulfur or a C 1 -C 12 alkyl substituted nitrogen, and a [-C 2 -C 6 -alkyl-Z-] repeating unit The C 2 -C 6 alkylene groups may be the same or different, and L 1 and L 2 may be saturated or have an unsaturation of 1 to 10, may be undoped or have 1 to 10 in any position. a group selected from the group consisting of -(C=O)- and -C 6 H 4 -, and may have no other substituents or have 1 to 10 other substitutions selected from the group consisting of halogen, cyano and nitro base. Optimally, L-style The group.

式Br─A─Br化合物之合成闡述於WO 08/000664及WO 09/047104中,或可以類似於本文所述之方法來合成。式Br─A─Br之N-芳基取代化合物可以類似於US-A-5,354,869及WO 03/022848中所述之方法來合成。The synthesis of the Br-A-Br compound is described in WO 08/000664 and WO 09/047104, or can be synthesized analogously to the methods described herein. The N-aryl substituted compounds of the formula Br-A-Br can be synthesized analogously to the methods described in US-A-5,354,869 and WO 03/022848.

鹵素係氟、氯、溴及碘。Halogen is fluorine, chlorine, bromine and iodine.

若可能,C1-C25烷基(C1-C18烷基)通常係直鏈或具支鏈烷基。實例係甲基、乙基、正-丙基、異丙基、正-丁基、第二-丁基、異丁基、第三丁基、正-戊基、2-戊基、3-戊基、2,2-二甲基丙基、1,1,3,3-四甲基戊基、正-己基、1-甲基己基、1,1,3,3,5,5-六甲基己基、正-庚基、異庚基、1,1,3,3-四甲基丁基、1-甲基庚基、3-甲基庚基、正-辛基、1,1,3,3-四甲基丁基及2-乙基己基、正-壬基、癸基、十一烷基、十二烷基、十三烷基、十四烷基、十五烷基、十六烷基、十七烷基、十八烷基、二十烷基、二十一烷基、二十二烷基、二十四烷基或二十五烷基。C1-C8烷基通常係甲基、乙基、正-丙基、異丙基、正-丁基、第二-丁基、異丁基、第三丁基、正-戊基、2-戊基、3-戊基、2,2-二甲基-丙基、正-己基、正-庚基、正-辛基、1,1,3,3-四甲基丁基及2-乙基己基。C1-C4烷基通常係甲基、乙基、正-丙基、異丙基、正-丁基、第二-丁基、異丁基、第三丁基。If possible, C 1 -C 25 alkyl (C 1 -C 18 alkyl) is usually straight-chain or branched alkyl. Examples are methyl, ethyl, n-propyl, isopropyl, n-butyl, second-butyl, isobutyl, tert-butyl, n-pentyl, 2-pentyl, 3-pentyl Base, 2,2-dimethylpropyl, 1,1,3,3-tetramethylpentyl, n-hexyl, 1-methylhexyl, 1,1,3,3,5,5-hexa Hexyl, n-heptyl, isoheptyl, 1,1,3,3-tetramethylbutyl, 1-methylheptyl, 3-methylheptyl, n-octyl, 1,1,3 , 3-tetramethylbutyl and 2-ethylhexyl, n-decyl, decyl, undecyl, dodecyl, tridecyl, tetradecyl, pentadecyl, hexadecyl Alkyl, heptadecyl, octadecyl, eicosyl, docosyl, behenyl, tetracosyl or hapentadecyl. C 1 -C 8 alkyl is usually methyl, ethyl, n-propyl, isopropyl, n-butyl, second-butyl, isobutyl, tert-butyl, n-pentyl, 2 -pentyl, 3-pentyl, 2,2-dimethyl-propyl, n-hexyl, n-heptyl, n-octyl, 1,1,3,3-tetramethylbutyl and 2- Ethylhexyl. The C 1 -C 4 alkyl group is usually methyl, ethyl, n-propyl, isopropyl, n-butyl, second-butyl, isobutyl, tert-butyl.

C2-C18烯基係直鏈或具支鏈烯基,例如乙烯基、烯丙基、甲基烯丙基、異丙烯基、2-丁烯基、3-丁烯基、異丁烯基、正-戊-2,4-二烯基、3-甲基-丁-2-烯基、正-辛-2-烯基、正-十二-2-烯基、異十二烯基、正-十二-2-烯基或正-十八-4-烯基。C 2 -C 18 alkenyl straight-chain or branched alkenyl group, such as vinyl, allyl, methallyl, isopropenyl, 2-butenyl, 3-butenyl, isobutenyl, N-penta-2,4-dienyl, 3-methyl-but-2-enyl, n-oct-2-enyl, n-dodec-2-enyl, isododecenyl, positive - Dodecan-2-alkenyl or n-octadec-4-enyl.

C2-18炔基係直鏈或具支鏈且較佳為可未經取代或經取代之C2-8炔基,例如,乙炔基、1-丙炔-3-基、1-丁炔-4-基、1-戊炔-5-基、2-甲基-3-丁炔-2-基、1,4-戊二炔-3-基、1,3-戊二炔-5-基、1-己炔-6-基、順式-3-甲基-2-戊烯-4-炔-1-基、反式-3-甲基-2-戊烯-4-炔-1-基、1,3-己二炔-5-基、1-辛炔-8-基、1-壬炔-9-基、1-癸炔-10-基或1-二十四炔-24-基。C 2-18 alkynyl is a straight or branched and preferably unsubstituted or substituted C 2-8 alkynyl group, for example, ethynyl, 1-propyn-3-yl, 1-butyne 4-yl, 1-pentyn-5-yl, 2-methyl-3-butyn-2-yl, 1,4-pentadiyn-3-yl, 1,3-pentadiyne-5- , 1-hexyn-6-yl, cis-3-methyl-2-penten-4-yn-1-yl, trans-3-methyl-2-pentene-4-yne-1 -yl, 1,3-hexadiyn-5-yl, 1-octyne-8-yl, 1-decyne-9-yl, 1-decynyl-10-yl or 1-tetradecyne-24 -base.

C1-C25烷氧基(C1-C18烷氧基)係直鏈或具支鏈烷氧基,例如甲氧基、乙氧基、正-丙氧基、異丙氧基、正-丁氧基、第二-丁氧基、第三-丁氧基、戊氧基、異戊氧基或第三-戊氧基、庚氧基、辛氧基、異辛氧基、壬氧基、癸氧基、十一烷氧基、十二烷氧基、十四烷氧基、十五烷氧基、十六烷氧基、十七烷氧基及十八烷氧基。C1-C8烷氧基之實例係甲氧基、乙氧基、正-丙氧基、異丙氧基、正-丁氧基、第二-丁氧基、異丁氧基、第三丁氧基、正-戊氧基、2-戊氧基、3-戊氧基、2,2-二甲基丙氧基、正-己氧基、正-庚氧基、正-辛氧基、1,1,3,3-四甲基丁氧基及2-乙基己氧基,較佳係C1-C4烷氧基,例如通常係甲氧基、乙氧基、正-丙氧基、異丙氧基、正-丁氧基、第二-丁氧基、異丁氧基、第三丁氧基。術語「烷硫基」意指與烷氧基相同之基團,只是醚鍵之氧原子由硫原子代替。C 1 -C 25 alkoxy (C 1 -C 18 alkoxy) is a linear or branched alkoxy group such as methoxy, ethoxy, n-propoxy, isopropoxy, positive -butoxy, second-butoxy, tert-butoxy, pentyloxy, isopentyloxy or tert-pentyloxy, heptyloxy, octyloxy, isooctyloxy, oxime Base, decyloxy, undecyloxy, dodecyloxy, tetradecyloxy, pentadecyloxy, hexadecyloxy, heptadecanyloxy and octadecyloxy. Examples of C 1 -C 8 alkoxy groups are methoxy, ethoxy, n-propoxy, isopropoxy, n-butoxy, second-butoxy, isobutoxy, third Butoxy, n-pentyloxy, 2-pentyloxy, 3-pentyloxy, 2,2-dimethylpropoxy, n-hexyloxy, n-heptyloxy, n-octyloxy 1,1,3,3-tetramethylbutoxy and 2-ethylhexyloxy, preferably C 1 -C 4 alkoxy, such as usually methoxy, ethoxy, n-propyl Oxyl, isopropoxy, n-butoxy, second-butoxy, isobutoxy, tert-butoxy. The term "alkylthio" means the same group as the alkoxy group except that the oxygen atom of the ether bond is replaced by a sulfur atom.

C1-C18全氟烷基,尤其C1-C4全氟烷基係具支鏈或無支鏈基團,例如-CF3、-CF2CF3、-CF2CF2CF3、-CF(CF3)2、-(CF2)3CF3及-C(CF3)3a C 1 -C 18 perfluoroalkyl group, especially a C 1 -C 4 perfluoroalkyl group having a branched or unbranched group, such as —CF 3 , —CF 2 CF 3 , —CF 2 CF 2 CF 3 , -CF(CF 3 ) 2 , -(CF 2 ) 3 CF 3 and -C(CF 3 ) 3 .

術語「胺甲醯基」通常係可未經取代或經取代之C1-18胺甲醯基、較佳C1-8胺甲醯基,例如,胺甲醯基、甲基胺甲醯基、乙基胺甲醯基、正-丁基胺甲醯基、第三丁基胺甲醯基、二甲基胺甲醯基氧基、嗎啉基胺甲醯基或吡咯啶基胺甲醯基。The term "aminocarboxamyl" is usually an unsubstituted or substituted C 1-18 amine carbenyl group, preferably a C 1-8 amine carbenyl group, for example, an amine carbenyl group, a methylamine carbenyl group. , ethylamine, mercapto, n-butylamine, mercapto, tert-butylamine, mercapto, dimethylamine, mercaptooxy, morpholinylcarboxamidine or pyrrolidinylamine base.

C5-C12環烷基通常係環戊基、環己基、環庚基、環辛基、環壬基、環癸基、環十一烷基、環十二烷基,較佳係可未經取代或經取代之環戊基、環己基、環庚基、或環辛基。環烷基(尤其環己基)可由可經C1-C4-烷基、鹵素及氰基取代1至3次之苯基縮合一或兩次。該等縮合環己基之實例係:C 5 -C 12 cycloalkyl is typically based cyclopentyl, cyclohexyl, cycloheptyl, cyclooctyl, nonyl, cyclodecyl, cycloalkyl undecyl, cyclododecyl, the preferred system may not Substituted or substituted cyclopentyl, cyclohexyl, cycloheptyl, or cyclooctyl. The cycloalkyl group (especially cyclohexyl) may be condensed one or two times by a phenyl group which may be substituted 1 to 3 times by a C 1 -C 4 -alkyl group, a halogen group and a cyano group. Examples of such condensed cyclohexyl groups are:

尤其,其中R151、R152、R153、R154、R155及R156彼此獨立地為C1-C8-烷基、C1-C8-烷氧基、鹵素及氰基,尤其氫。especially Wherein R 151 , R 152 , R 153 , R 154 , R 155 and R 156 are, independently of each other, C 1 -C 8 -alkyl, C 1 -C 8 -alkoxy, halogen and cyano, especially hydrogen.

C6-C24芳基(C6-C18芳基)通常係可未經取代或經取代之苯基、茚基、甘菊藍基、萘基、聯苯、不對稱引達省基(as-indacenyl)、對稱引達省基(s-indacenyl)、伸二氫苊基(acenaphthylenyl)、茀基、菲基、螢葸基、三苯基烯基、草屈基、并四苯、苉基、苝基、五苯基、稠六苯基、芘基、或蒽基,較佳係苯基、1-萘基、2-萘基、4-聯苯、9-菲基、2-或9-茀基、3-或4-聯苯。C6-C12芳基之實例係可未經取代或經取代之苯基、1-萘基、2-萘基、3-或4-聯苯、2-或9-茀基或9-菲基。C 6 -C 24 aryl (C 6 -C 18 aryl) is usually unsubstituted or substituted phenyl, fluorenyl, chamomile, naphthyl, biphenyl, asymmetrically introduced ( As-indacenyl), s-indacenyl, acenaphthylenyl, fluorenyl, phenanthryl, fluorenyl, triphenylalkenyl, oxalatyl, tetracene, fluorenyl , mercapto, pentaphenyl, hexaphenyl, anthracenyl, or anthracenyl, preferably phenyl, 1-naphthyl, 2-naphthyl, 4-biphenyl, 9-phenanthryl, 2- or 9 - mercapto, 3- or 4-biphenyl. Examples of C 6 -C 12 aryl groups are unsubstituted or substituted phenyl, 1-naphthyl, 2-naphthyl, 3- or 4-biphenyl, 2- or 9-fluorenyl or 9-phenanthrene. base.

C7-C25芳烷基通常係苄基、2-苄基-2-丙基、β-苯基-乙基、α,α-二甲基苄基、ω-苯基-丁基、ω,ω-二甲基-ω-苯基-丁基、ω-苯基-十二烷基、ω-苯基-十八烷基、ω-苯基-二十烷基或ω-苯基-二十二烷基,較佳係C7-C18芳烷基,例如苄基、2-苄基-2-丙基、β-苯基-乙基、α,α-二甲基苄基、ω-苯基-丁基、ω,ω-二甲基-ω-苯基-丁基、ω-苯基-十二烷基或ω-苯基-十八烷基,且尤佳係C7-C12芳烷基,例如苄基、2-苄基-2-丙基、β-苯基-乙基、α,α-二甲基苄基、ω-苯基-丁基、或ω,ω-二甲基-ω-苯基-丁基,其中脂肪烴基團及芳香族烴基團二者皆可未經取代或經取代。較佳實例係苄基、2-苯乙基、3-苯丙基、萘基乙基、萘基甲基、及異丙苯基。C 7 -C 25 aralkyl is usually benzyl, 2-benzyl-2-propyl, β-phenyl-ethyl, α,α-dimethylbenzyl, ω-phenyl-butyl, ω , ω-dimethyl-ω-phenyl-butyl, ω-phenyl-dodecyl, ω-phenyl-octadecyl, ω-phenyl-eicosyl or ω-phenyl- A dodecyl group, preferably a C 7 -C 18 aralkyl group, such as benzyl, 2-benzyl-2-propyl, β-phenyl-ethyl, α,α-dimethylbenzyl, Ω-phenyl-butyl, ω,ω-dimethyl-ω-phenyl-butyl, ω-phenyl-dodecyl or ω-phenyl-octadecyl, and especially C 7 -C 12 aralkyl, such as benzyl, 2-benzyl-2-propyl, β-phenyl-ethyl, α,α-dimethylbenzyl, ω-phenyl-butyl, or ω, Omega-dimethyl-omega-phenyl-butyl, wherein both the aliphatic hydrocarbon group and the aromatic hydrocarbon group may be unsubstituted or substituted. Preferred examples are benzyl, 2-phenylethyl, 3-phenylpropyl, naphthylethyl, naphthylmethyl, and cumyl.

雜芳基通常係C2-C20雜芳基,即氮、氧或硫係可能雜原子之具有5至7個環原子之環或稠合環系統,且通常係具有5至30個原子且具有至少6個共軛π-電子之不飽和雜環基團,例如噻吩基、苯并[b]噻吩基、二苯并[b,d]噻吩基、噻蒽基、呋喃基、糠基、2H-吡喃基、苯并呋喃基、異苯并呋喃基、二苯并呋喃基、苯氧基噻吩基、吡咯基、咪唑基、吡唑基、吡啶基、二吡啶基、三嗪基、嘧啶基、吡嗪基、嗒嗪基、吲嗪基、異吲哚基、吲哚基、吲唑基、嘌呤基、喹嗪基、喹啉基、異喹啉基、呔嗪基、萘啶基、喹喔啉基、喹唑啉基、啉基、喋啶基、咔唑基、哢啉基、苯并三唑基、苯并噁唑基、菲啶基、吖啶基、嘧啶基、菲咯啉基、吩嗪基、異噻唑基、吩噻嗪基、異噁唑基、呋呫基或吩噁嗪基,其可未經取代或經取代。A heteroaryl group is typically a C 2 -C 20 heteroaryl group, ie a ring or fused ring system having 5 to 7 ring atoms of a nitrogen, oxygen or sulfur-based hetero atom, and usually having 5 to 30 atoms and An unsaturated heterocyclic group having at least 6 conjugated π-electrons, such as thienyl, benzo[b]thienyl, dibenzo[b,d]thienyl, thioxyl, furyl, fluorenyl, 2H-pyranyl, benzofuranyl, isobenzofuranyl, dibenzofuranyl, phenoxythienyl, pyrrolyl, imidazolyl, pyrazolyl, pyridyl, dipyridyl, triazinyl, Pyrimidinyl, pyrazinyl, pyridazinyl, pyridazinyl, isodecyl, decyl, oxazolyl, fluorenyl, quinazinyl, quinolinyl, isoquinolinyl, pyridazinyl, naphthyridine Base, quinoxalinyl, quinazolinyl, Polinyl, acridinyl, oxazolyl, porphyrinyl, benzotriazolyl, benzoxazolyl, phenanthryl, acridinyl, pyrimidinyl, phenanthroline, phenazinyl, isothiazolyl A phenothiazine group, an isoxazolyl group, a furazyl group or a phenoxazinyl group which may be unsubstituted or substituted.

上述基團之可能取代基係C1-C8烷基、羥基、巰基、C1-C8烷氧基、C1-C8烷硫基、鹵素、鹵代-C1-C8烷基、氰基、胺甲醯基、硝基或甲矽烷基,尤其C1-C8烷基、C1-C8烷氧基、C1-C8烷硫基、鹵素、鹵代-C1-C8烷基、或氰基。Possible substituents for the above groups are C 1 -C 8 alkyl, hydroxy, decyl, C 1 -C 8 alkoxy, C 1 -C 8 alkylthio, halogen, halo-C 1 -C 8 alkyl , cyano, amine, mercapto, nitro or carboxyalkyl, especially C 1 -C 8 alkyl, C 1 -C 8 alkoxy, C 1 -C 8 alkylthio, halogen, halo-C 1 -C 8 alkyl, or cyano.

雜有一或多個O之C1-C18烷基係(例如)(CH2CH2O)1-9-Rx,其中Rx係H或C1-C10烷基;CH2-CH(ORy')-CH2-O-Ry,其中Ry係C1-C18烷基,且Ry'包含與Ry相同之定義或係H。a C 1 -C 18 alkyl group having one or more O groups, for example, (CH 2 CH 2 O) 1-9 -R x , wherein R x is H or C 1 -C 10 alkyl; CH 2 -CH (OR y' )-CH 2 -OR y , wherein R y is C 1 -C 18 alkyl, and R y ' contains the same definition or system H as R y .

若取代基(例如R18)在基團中出現一次以上,則在每次出現時其可不同。If a substituent (e.g., R 18 ) occurs more than once in a group, it may be different at each occurrence.

措辭「由G取代」意指可能存在一或多個,尤其1至3個取代基G。The phrase "substituted by G" means that one or more, especially one to three, substituents G may be present.

如上文所述,上述基團可由E'取代及/或若需要可雜有D'。當然,僅在含有至少2個由單鍵彼此連接之碳原子的基團情形下可能間雜;C6-C18芳基未被間雜;經間雜芳基烷基在烷基部分中含有單元D。由一或多個E'取代及/或雜有一或多個單元D之C1-C18烷基係(例如)(CH2CH2O)1-9-Rx,其中Rx係H或C1-C10烷基或C2-C10烷醯基(例如,CO-CH(C2H5)C4H9)、CH2-CH(ORy')-CH2-O-Ry,其中Ry係C1-C18烷基、C5-C12環烷基、苯基、C7-C15苯基烷基,且Ry'涵蓋與Ry相同之定義或係H;C1-C8伸烷基-COO-Rz,例如,CH2COORz、CH(CH3)COORz、C(CH3)2COORz,其中Rz係H、C1-C18烷基、(CH2CH2O)1-9-Rx,且Rx涵蓋上述定義;CH2CH2-O-CO-CH=CH2;CH2CH(OH)CH2-O-CO-C(CH3)=CH2As noted above, the above groups may be substituted by E' and/or may be miscible with D' if desired. Of course, it may be heterozygous only in the case of a group containing at least 2 carbon atoms bonded to each other by a single bond; the C 6 -C 18 aryl group is not hetero-hetero; the hetero-heteroarylalkyl group contains the unit D in the alkyl moiety. a C 1 -C 18 alkyl group substituted by one or more E' and/or one or more units D, for example (CH 2 CH 2 O) 1-9 -R x , wherein R x is H or C 1 -C 10 alkyl or C 2 -C 10 alkyl fluorenyl (for example, CO-CH(C 2 H 5 )C 4 H 9 ), CH 2 -CH(OR y' )-CH 2 -OR y , Wherein R y is C 1 -C 18 alkyl, C 5 -C 12 cycloalkyl, phenyl, C 7 -C 15 phenylalkyl, and R y' encompasses the same definition or system H as R y ; 1- C 8 alkylene-COO-R z , for example, CH 2 COOR z , CH(CH 3 )COOR z , C(CH 3 ) 2 COOR z , wherein R z is H, C 1 -C 18 alkyl , (CH 2 CH 2 O) 1-9 -R x , and R x encompasses the above definition; CH 2 CH 2 -O-CO-CH=CH 2 ; CH 2 CH(OH)CH 2 -O-CO-C (CH 3 )=CH 2 .

含有本發明聚合物之混合物可產生包含本發明聚合物(通常5重量%至99.9999重量%,尤其20重量%至85重量%)及至少另一材料之半導電層。其他材料可為(但不限於)本發明相同聚合物之具有不同分子量之部分、另一本發明聚合物、半導電聚合物、有機小分子、碳奈米管、富勒烯衍生物、無機顆粒(量子點、量子棒、三腳型量子(quantum tripod)、TiO2、ZnO等)、導電顆粒(Au、Ag等)、絕緣體材料(例如針對閘極介電質所述者)(PET、PS等)。Mixtures comprising the polymers of the invention can produce semiconducting layers comprising the polymers of the invention (typically from 5% to 99.999% by weight, especially from 20% to 85% by weight) and at least one other material. Other materials may be, but are not limited to, portions of the same polymer of the present invention having different molecular weights, another polymer of the present invention, semiconductive polymers, small organic molecules, carbon nanotubes, fullerene derivatives, inorganic particles (quantum dots, quantum rods, quantum tripods, TiO 2 , ZnO, etc.), conductive particles (Au, Ag, etc.), insulator materials (for example, for gate dielectrics) (PET, PS) Wait).

本發明聚合物可與(例如)歐洲專利申請案第09155919.5號、WO 09/047104、US 6,690,029、WO 2007082584及WO 2008107089中所述之小分子摻和。The polymers of the present invention can be blended with small molecules as described in, for example, European Patent Application No. 0915591 9.5, WO 09/047104, US 6,690, 029, WO 2007082584, and WO 2008107089.

WO 2007082584:WO 2007082584:

WO 2008107089:WO 2008107089:

其中Y1'及Y2'中之一者表示-CH=或=CH-且另一者表示-X'-,Y3'及Y4'中之一者表示-CH=或=CH-且另一者表示-X'-,X'係-O-、-S-、-Se-或-NR'''-,R""係具有1至20個C原子之環狀、直鏈或具支鏈烷基或烷氧基,或具有2至30個C原子之芳基,其皆視情況經氟化或全氟化,R'係H、F、Cl、Br、I、CN、具有1至20個C原子且視情況經氟化或全氟化之直鏈或具支鏈烷基或烷氧基、具有6至30個C原子且視情況經氟化或全氟化之芳基、或CO2R",其中R"係H、具有1至20個C原子且視情況經氟化之烷基、或具有2至30個C原子且視情況經氟化之芳基,R'''係H或具有1至10個C原子之環狀、直鏈或具支鏈烷基,y為0或1,x為0或1。Wherein one of Y 1 ' and Y 2 ' represents -CH= or =CH- and the other represents -X'-, and one of Y 3 ' and Y 4 ' represents -CH= or =CH- and The other represents -X'-, X'--O-, -S-, -Se- or -NR'''-, R"" is a cyclic, linear or having 1 to 20 C atoms. a branched alkyl or alkoxy group, or an aryl group having 2 to 30 C atoms, which are optionally fluorinated or perfluorinated, and R' is H, F, Cl, Br, I, CN, having 1 a linear or branched alkyl or alkoxy group of up to 20 C atoms and optionally fluorinated or perfluorinated, an aryl group having 6 to 30 C atoms and optionally fluorinated or perfluorinated, Or CO 2 R", wherein R" is H, an alkyl group having from 1 to 20 C atoms and optionally fluorinated, or an aryl group having from 2 to 30 C atoms and optionally fluorinated, R'''Line H or a cyclic, linear or branched alkyl group having 1 to 10 C atoms, y is 0 or 1, and x is 0 or 1.

聚合物可含有一個小分子、或兩個或更多個小分子化合物之混合物。The polymer may contain one small molecule or a mixture of two or more small molecule compounds.

因此,本發明亦係關於包含本發明聚合物之有機半導體材料、層或組件。Accordingly, the invention is also directed to organic semiconductor materials, layers or components comprising the polymers of the invention.

本發明聚合物可作為半導體層用於半導體裝置中。因此,本發明亦係關於包含本發明聚合物、或有機半導體材料、層或組件之半導體裝置。該半導體裝置尤其係有機光伏打(PV)裝置(太陽能電池)、光電二極體、或有機場效應電晶體。The polymer of the present invention can be used as a semiconductor layer in a semiconductor device. Accordingly, the invention is also directed to a semiconductor device comprising a polymer of the invention, or an organic semiconductor material, layer or component. The semiconductor device is in particular an organic photovoltaic (PV) device (solar cell), a photodiode, or an organic field effect transistor.

本發明聚合物可單獨或組合用作半導體裝置之有機半導體層。可藉由任一有用方式來提供層,例如,蒸氣沈積(用於分子量相對較低之材料)及印刷技術。本發明化合物可充分地溶於有機溶劑中且可進行溶液沈積及圖案化(例如,藉由旋塗、浸塗、噴墨印刷、凹版印刷、撓性印刷、膠版印刷、絲網印刷、微接觸(波)-印刷、滴注或分區澆注、或其他習知技術來實施)。The polymer of the present invention can be used singly or in combination as an organic semiconductor layer of a semiconductor device. The layer can be provided by any useful means, such as vapor deposition (for relatively low molecular weight materials) and printing techniques. The compounds of the present invention are sufficiently soluble in organic solvents and can be solution deposited and patterned (for example, by spin coating, dip coating, ink jet printing, gravure printing, flexographic printing, offset printing, screen printing, microcontacting). (wave) - printing, drip or zone casting, or other conventional techniques to implement).

本發明聚合物可用於包含複數個OTFT之積體電路、以及各種電子物件中。該等物件包括(例如)射頻識別(RFID)標籤、用於撓性顯示器(例如,用於個人電腦、行動電話、或手持式裝置)之背板、智慧卡、記憶體裝置、感測器(例如光感測器、圖像感測器、生物感測器、化學感測器、機械感測器或溫度感測器),尤其光電二極體、或安全裝置及諸如此類。The polymer of the present invention can be used in an integrated circuit comprising a plurality of OTFTs, as well as in various electronic articles. Such items include, for example, radio frequency identification (RFID) tags, backplanes for smart displays (eg, for personal computers, mobile phones, or handheld devices), smart cards, memory devices, sensors ( For example, a light sensor, an image sensor, a biosensor, a chemical sensor, a mechanical sensor or a temperature sensor), in particular a photodiode, or a security device and the like.

本發明另一態樣係包含一或多種本發明聚合物之有機半導體材料、層或組件。另一態樣係本發明聚合物或材料在有機光伏打(PV)裝置(太陽能電池)、光電二極體、或有機場效應電晶體(OFET)中之用途。另一態樣係包含本發明聚合物或材料之有機光伏打(PV)裝置(太陽能電池)、光電二極體、或有機場效應電晶體(OFET)。Another aspect of the invention is an organic semiconductor material, layer or component comprising one or more polymers of the invention. Another aspect is the use of the polymers or materials of the present invention in organic photovoltaic (PV) devices (solar cells), photodiodes, or organic field effect transistors (OFETs). Another aspect is an organic photovoltaic (PV) device (solar cell), photodiode, or organic field effect transistor (OFET) comprising a polymer or material of the invention.

本發明聚合物通常以薄有機層或膜形式用作有機半導體,較佳小於30微米厚。通常,本發明之半導電層係至多1微米(=1 μm)厚,但若需要其可更厚。對於各種電子裝置應用,該厚度亦可小於約1微米厚。舉例而言,在用於OFET中時,層厚度通常可為100 nm或更小。層之確切厚度取決於(例如)使用層之電子裝置的要求。The polymers of the invention are typically used as organic semiconductors in the form of thin organic layers or films, preferably less than 30 microns thick. Typically, the semiconducting layer of the present invention is at most 1 micron (= 1 μm) thick, but may be thicker if desired. For various electronic device applications, the thickness can also be less than about 1 micron thick. For example, when used in an OFET, the layer thickness can typically be 100 nm or less. The exact thickness of the layer depends, for example, on the requirements of the electronic device using the layer.

舉例而言,OFET中汲電極與源電極之間之活性半導體溝槽可包含本發明之層。For example, an active semiconductor trench between a germanium electrode and a source electrode in an OFET can comprise a layer of the invention.

本發明OFET裝置較佳包含:The OFET device of the present invention preferably comprises:

- 源電極,- source electrode,

- 汲電極,- 汲 electrode,

- 閘電極,- the gate electrode,

- 半導電層,- semi-conductive layer,

- 一或多個閘極絕緣體層,及- one or more gate insulator layers, and

- 視情況基板,其中半導體層包含一或多種本發明聚合物。- a substrate as appropriate, wherein the semiconducting layer comprises one or more polymers of the invention.

OFET裝置中之閘電極、源電極及汲電極及絕緣及半導電層可以任何順序佈置,前提係源電極及汲電極藉由絕緣層與閘電極分開,閘電極及半導體層二者皆接觸絕緣層,且源電極及汲電極二者皆接觸半導電層。The gate electrode, the source electrode and the germanium electrode, and the insulating and semiconductive layers in the OFET device may be arranged in any order, provided that the source electrode and the germanium electrode are separated from the gate electrode by an insulating layer, and both the gate electrode and the semiconductor layer are in contact with the insulating layer. And the source electrode and the germanium electrode are both in contact with the semiconductive layer.

較佳地,OFET包含具有第一側及第二側之絕緣體、位於該絕緣體第一側上之閘電極、位於該絕緣體第二側上且包含本發明聚合物之層、及位於該聚合物層上之汲電極及源電極。Preferably, the OFET comprises an insulator having a first side and a second side, a gate electrode on the first side of the insulator, a layer on the second side of the insulator and comprising the polymer of the invention, and the polymer layer The upper electrode and the source electrode.

OFET裝置可為頂部閘極裝置或底部閘極裝置。The OFET device can be a top gate device or a bottom gate device.

OFET裝置之適宜結構及製造方法已為熟習此項技術者所熟知且闡述於參考文獻(例如WO 03/052841)中。Suitable structures and methods of manufacture for OFET devices are well known to those skilled in the art and are described in the references (e.g., WO 03/052841).

閘極絕緣體層可包含(例如)氟聚合物,例如市售之Cytop 809M、或Cytop 107M(來自Asahi Glass)。較佳地,自包含絕緣體材料及一或多種具有一或多個氟原子之溶劑(氟溶劑)(較佳全氟溶劑)之調配物來沈積閘極絕緣體層,例如藉由旋塗、刮塗、金屬線棒塗覆、噴塗或浸塗或其他習知方法來實施。適宜全氟溶劑係(例如)FC75(購自Acros,目錄號12380)。其他適宜氟聚合物及氟溶劑在先前技術中已眾所周知,例如全氟聚合物特氟龍(Teflon) AF 1600或2400(來自DuPont)、或Fluoropel(來自Cytonix)或全氟溶劑FC 43(Acros,第12377號)。The gate insulator layer may comprise, for example, a fluoropolymer such as the commercially available Cytop 809M. Or Cytop 107M (from Asahi Glass). Preferably, the gate insulator layer is deposited from a formulation comprising an insulator material and one or more solvents (fluorine solvents) having one or more fluorine atoms (preferably perfluorosolvent), for example by spin coating or knife coating. It is carried out by metal bar coating, spraying or dip coating or other conventional methods. Suitable for perfluorinated solvent systems (for example) FC75 (purchased from Acros, catalog number 12380). Other suitable fluoropolymers and fluorosolvents are well known in the prior art, such as the perfluoropolymer Teflon AF 1600 or 2400 (from DuPont), or Fluoropel (from Cytonix) or perfluorosolvent FC 43 (Acros, No. 12377).

包含本發明聚合物之半導電層可另外包含至少另一材料。其他材料可為(但不限於)本發明另一聚合物、半導電聚合物、聚合黏合劑、不同於本發明聚合物之有機小分子、碳奈米管、富勒烯衍生物、無機顆粒(量子點、量子棒、三腳型量子、TiO2、ZnO等)、導電顆粒(Au、Ag等)、及絕緣材料(例如針對閘極介電質所述者)(PET、PS等)。如上所述,半導電層亦可由一或多種本發明聚合物及聚合黏合劑之混合物組成。本發明聚合物與聚合黏合劑之比率可在5%至95%之間有所變化。較佳地,聚合黏合劑係半晶質聚合物,例如聚苯乙烯(PS)、高密度聚乙烯(HDPE)、聚丙烯(PP)及聚甲基丙烯酸甲酯(PMMA)。使用此技術,可避免電性能發生惡化(參見WO 2008/001123A1)。The semiconducting layer comprising the polymer of the invention may additionally comprise at least one other material. Other materials may be, but are not limited to, another polymer of the present invention, a semiconductive polymer, a polymeric binder, an organic small molecule different from the polymer of the present invention, a carbon nanotube, a fullerene derivative, an inorganic particle ( Quantum dots, quantum rods, tripod type quantum, TiO 2 , ZnO, etc.), conductive particles (Au, Ag, etc.), and insulating materials (for example, for gate dielectrics) (PET, PS, etc.). As noted above, the semiconducting layer can also be comprised of a mixture of one or more of the polymers of the present invention and polymeric binders. The ratio of the polymer of the invention to the polymeric binder can vary from 5% to 95%. Preferably, the polymeric binder is a semi-crystalline polymer such as polystyrene (PS), high density polyethylene (HDPE), polypropylene (PP), and polymethyl methacrylate (PMMA). Using this technique, electrical performance deterioration can be avoided (see WO 2008/001123 A1).

本發明聚合物較佳用於有機光伏打(PV)裝置(太陽能電池)中。因此,本發明提供包含本發明聚合物之PV裝置。具有此構造之裝置亦具有整流性質,因此亦可稱作光電二極體。光敏裝置可用作自光生成電之太陽能電池及量測或檢測光之光檢測器。The polymers of the invention are preferably used in organic photovoltaic (PV) devices (solar cells). Accordingly, the present invention provides a PV device comprising the polymer of the present invention. Devices having this configuration also have rectifying properties and may therefore also be referred to as photodiodes. The photosensitive device can be used as a solar cell for generating electricity from light and a photodetector for measuring or detecting light.

有機光伏打裝置(太陽能電池)之結構闡述於(例如)C. Deibel等人,Rep. Prog. Phys. 73(2010) 096401及Christoph Brabec,Energy Environ. Sci 2.(2009) 347-303中。The structure of an organic photovoltaic device (solar cell) is described, for example, in C. Deibel et al., Rep. Prog. Phys. 73 (2010) 096401 and Christoph Brabec, Energy Environ. Sci 2. (2009) 347-303.

PV裝置按以下順序包含:The PV unit is included in the following order:

(a) 陰極(電極),(a) cathode (electrode),

(b) 視情況之過渡層,例如鹼金屬鹵化物,尤其氟化鋰,(b) a transition layer, as appropriate, such as an alkali metal halide, especially lithium fluoride,

(c) 光活性層,(c) a photoactive layer,

(d) 視情況之平滑層,(d) a smooth layer, as appropriate,

(e) 陽極(電極),(e) anode (electrode),

(f) 基板。(f) Substrate.

光活性層包含本發明聚合物。較佳地,光活性層係自本發明之共軛聚合物(作為電子供體)及受體材料(例如富勒烯,尤其官能化富勒烯PCBM)(作為電子受體)製得。如上所述,光活性層亦可含有聚合黏合劑。基於本發明聚合物及聚合黏合劑之量,本發明聚合物佔聚合黏合劑之量可在0.1重量%至99.9重量%,尤其1重量%至99重量%,極特別地5重量%至95重量%之間變化。較佳地,聚合黏合劑係半晶質聚合物,例如聚苯乙烯(PS)、高密度聚乙烯(HDPE)、聚丙烯(PP)及聚甲基丙烯酸甲酯(PMMA)。The photoactive layer comprises a polymer of the invention. Preferably, the photoactive layer is prepared from a conjugated polymer of the invention (as an electron donor) and an acceptor material (such as fullerenes, especially functionalized fullerene PCBM) (as an electron acceptor). As mentioned above, the photoactive layer may also contain a polymeric binder. The polymer of the invention may comprise from 0.1% to 99.9% by weight, in particular from 1% to 99% by weight, very particularly from 5% to 95% by weight, based on the polymer of the invention and the amount of polymeric binder. Change between %. Preferably, the polymeric binder is a semi-crystalline polymer such as polystyrene (PS), high density polyethylene (HDPE), polypropylene (PP), and polymethyl methacrylate (PMMA).

對於異質接面太陽能電池而言,活性層較佳包含重量比率為1:1至1:3之本發明聚合物與富勒烯的混合物,該富勒烯係例如[60]PCBM(=6,6-苯基-C61-丁酸甲酯)、或[70]PCBM。用於本發明中之富勒烯具有大範圍之大小(碳原子數/分子)。本文所用之術語富勒烯包括純碳之各種籠狀分子,包括巴克明斯特富勒烯(Buckminsterfullerene)(C60)及相關「球形」富勒烯以及碳奈米管。富勒烯可選自本技術中所習知者,例如C20-C1000範圍。較佳地,富勒烯選自C60-C96之範圍。最佳地,富勒烯係C60或C70,例如[60]PCBM、或[70]PCBM。亦容許使用經化學修飾之富勒烯,前提係經修飾富勒烯保持受體型及電子遷移率特性。受體材料亦可為選自由以下組成之群之材料:任一半導電聚合物(例如,本發明聚合物,前提係聚合物保持受體型及電子遷移率特性)、有機小分子、碳奈米管、無機顆粒(量子點、量子棒、三腳型量子、TiO2、ZnO等)。For a heterojunction solar cell, the active layer preferably comprises a mixture of the polymer of the invention and fullerenes in a weight ratio of 1:1 to 1:3, such as [60] PCBM (=6, 6-phenyl-C 61 -methyl butyrate), or [70] PCBM. The fullerene used in the present invention has a wide range of sizes (number of carbon atoms per molecule). The term fullerene as used herein includes various cage molecules of pure carbon, including Buckminsterfullerene (C 60 ) and related "spherical" fullerenes and carbon nanotubes. Fullerenes may be selected from those present in the conventional art, for example, range 20 -C 1000 C. Preferably, the fullerene is selected from the range of C 60 -C 96 . Most preferably, fullerene is C 60 or C 70 , such as [60] PCBM, or [70] PCBM. Chemically modified fullerenes are also permitted, provided that the modified fullerenes retain acceptor type and electron mobility characteristics. The acceptor material may also be a material selected from the group consisting of: any semiconductive polymer (for example, the polymer of the present invention, provided that the polymer retains acceptor type and electron mobility characteristics), small organic molecules, carbon nanotubes Tube, inorganic particles (quantum dots, quantum rods, tripod type quantum, TiO 2 , ZnO, etc.).

光活性層係自本發明聚合物(作為電子供體)及富勒烯,尤其官能化富勒烯PCBM(作為電子受體)製得。將該兩種組份與溶劑混合並藉由諸如以下方法以溶液形式施加至平滑層上:旋塗法、滴注法、蘭幕爾-布羅吉(Langmuir-Blodgett)(「LB」)法、噴墨印刷法及滴塗法。亦可使用橡皮輥或印刷方法來使用此一光活性層塗覆較大表面。較佳使用諸如氯苯等分散劑來代替通常所用的甲苯作為溶劑。在該等方法中,自作業便利性及成本角度考慮,真空沈積法、旋塗法、噴墨印刷法及澆注法尤佳。The photoactive layer is prepared from the polymers of the invention (as electron donors) and fullerenes, especially functionalized fullerenes PCBM (as electron acceptors). The two components are mixed with a solvent and applied to the smoothing layer as a solution by, for example, a spin coating method, a drip method, a Langmuir-Blodgett ("LB") method. , inkjet printing method and drop coating method. A light roller or printing method can also be used to coat a larger surface using this photoactive layer. A dispersant such as chlorobenzene is preferably used in place of the toluene which is usually used as a solvent. Among these methods, a vacuum deposition method, a spin coating method, an inkjet printing method, and a casting method are particularly preferable from the viewpoint of workability and cost.

在使用旋塗法、澆注法及噴墨印刷法形成層之情形下,可使用藉由將組合物溶解或分散於諸如以下適當有機溶劑中製得的濃度為0.01重量%至90重量%之溶液及/或分散液來實施塗覆:苯、甲苯、二甲苯、四氫呋喃、甲基四氫呋喃、N,N-二甲基甲醯胺、丙酮、乙腈、苯甲醚、二氯甲烷、二甲亞碸、氯苯、1,2-二氯苯及其混合物。In the case of forming a layer using a spin coating method, a casting method, and an inkjet printing method, a solution having a concentration of 0.01% by weight to 90% by weight prepared by dissolving or dispersing the composition in an appropriate organic solvent such as the following may be used. And / or dispersion to carry out coating: benzene, toluene, xylene, tetrahydrofuran, methyl tetrahydrofuran, N, N-dimethylformamide, acetone, acetonitrile, anisole, dichloromethane, dimethyl hydrazine , chlorobenzene, 1,2-dichlorobenzene and mixtures thereof.

光伏打(PV)裝置亦可由多接面太陽能電池構成,該等多接面太陽能電池在彼此的頂部經處理以在更大範圍內吸收太陽光譜。該等結構闡述於(例如)App. Phys. Let. 90,143512(2007)、Adv. Funct. Mater. 16,1897-1903(2006)、WO2004/112161及Christoph Brabec,Energy Environ. Sci 2.(2009) 347-303中。Photovoltaic photovoltaic (PV) devices can also be constructed from multi-junction solar cells that are processed on top of each other to absorb the solar spectrum over a wider range. Such structures are described, for example, in App. Phys. Let. 90, 143512 (2007), Adv. Funct. Mater. 16, 1897-1903 (2006), WO2004/112161 and Christoph Brabec, Energy Environ. Sci 2. 2009) 347-303.

所謂的'串接式太陽能電池'按以下順序包含:The so-called 'serial-type solar cells' are included in the following order:

(a) 陰極(電極),(a) cathode (electrode),

(b) 視情況之過渡層,例如鹼金屬鹵化物,尤其氟化鋰,(b) a transition layer, as appropriate, such as an alkali metal halide, especially lithium fluoride,

(c) 光活性層,(c) a photoactive layer,

(d) 視情況之平滑層,(d) a smooth layer, as appropriate,

(e) 中部電極(例如Au、Al、ZnO、TiO2等)(e) Central electrodes (eg Au, Al, ZnO, TiO 2, etc.)

(f) 視情況之用於匹配能級的額外電極,(f) additional electrodes for matching energy levels, as appropriate,

(g) 視情況之過渡層,例如鹼金屬鹵化物,尤其氟化鋰,(g) a transition layer, as appropriate, such as an alkali metal halide, especially lithium fluoride,

(h) 光活性層,(h) a photoactive layer,

(i) 視情況之平滑層,(i) a smooth layer as appropriate,

(j) 陽極(電極),(j) anode (electrode),

(k) 基板。(k) Substrate.

亦可在纖維製品上處理PV裝置,如(例如) US 20070079867及US 20060013549中所述。The PV device can also be treated on a fibrous article as described, for example, in US 20070079867 and US 20060013549.

由於具有優良之自組織性質,包含本發明聚合物之材料或膜亦可單獨或與其他材料一起用於LCD或OLED裝置中或作為配向層用於LCD或OLED裝置中,如(例如)US 2003/0021913中所述。Due to their excellent self-organizing properties, materials or films comprising the polymers of the invention may also be used alone or in combination with other materials in LCD or OLED devices or as alignment layers for use in LCD or OLED devices, such as, for example, US 2003 Said in /0021913.

所包括之下列實例僅用於闡釋本發明而並不限制申請專利範圍之範疇。除非另有說明,否則所有份數及百分比皆以重量計。The following examples are included to illustrate the invention and not to limit the scope of the patent application. All parts and percentages are by weight unless otherwise indicated.

重量平均分子量(Mw)及多分散性(Mw/Mn=PD)係藉由熱溫凝膠滲透層析(HT-GPC)測得[設備:GPC PL 220,來自Polymer實驗室(Church Stretton,UK;現為Varian),自折射率(RI)產生反應,層析條件:管柱:3「PLgel Olexis」管柱,來自Polymer實驗室(Church Stretton,UK);平均粒度為13 μm(尺寸為300×8 mm I.D.)流動相:1,2,4-三氯苯,藉由真空蒸餾純化且藉由丁羥基甲苯(BHT,200 mg/l)穩定,層析溫度:150℃;流動相流量:1 ml/min;溶質濃度:約1 mg/ml;注射體積:200 μl;檢測:RI,分子量校準程序:使用一組自Polymer實驗室(Church Stretton,UK)獲得之10份聚苯乙烯校準標準品來實施相對校準,該等聚苯乙烯之分子量介於1,930,000 Da-5,050 Da之間,亦即,PS 1,930,000、PS 1,460,000、PS 1,075,000、PS 560,000、PS 330,000、PS 96,000、PS 52,000、PS 30,300、PS 10,100、PS 5,050 Da。使用多項式校準來計算分子量。The weight average molecular weight (Mw) and polydispersity (Mw/Mn = PD) were measured by thermothermal gel permeation chromatography (HT-GPC) [equipment: GPC PL 220 from Polymer Laboratory (Church Stretton, UK) ; now Varian), reaction from refractive index (RI), chromatographic conditions: column: 3 "PLgel Olexis" column from Polymer Laboratory (Church Stretton, UK); average particle size 13 μm (size 300 ×8 mm ID) Mobile phase: 1,2,4-trichlorobenzene, purified by vacuum distillation and stabilized by butylated hydroxytoluene (BHT, 200 mg/l), chromatography temperature: 150 ° C; mobile phase flow: 1 ml/min; solute concentration: approx. 1 mg/ml; injection volume: 200 μl; assay: RI, molecular weight calibration procedure: using a set of 10 polystyrene calibration standards obtained from Polymer Laboratories (Church Stretton, UK) Relative calibration of the polystyrene, the molecular weight of the polystyrene is between 1,930,000 Da-5,050 Da, that is, PS 1,930,000, PS 1,460,000, PS 1,075,000, PS 560,000, PS 330,000, PS 96,000, PS 52,000, PS 30,300, PS 10,100, PS 5,050 Da. Polynomial calibration was used to calculate the molecular weight.

下文實例給出之所有聚合物結構皆係經由所述聚合程序獲得之聚合物產物的理想化代表。若兩種以上組份彼此發生共聚合,則聚合物中之順序端視聚合條件可為交替或無規的。All of the polymer structures given in the examples below are idealized representations of the polymer products obtained via the polymerization procedure. If two or more components are copolymerized with each other, the sequential end-view polymerization conditions in the polymer may be alternating or random.

實例Instance 實例1Example 1

a) 將20 g[88949-34-2]及25.76 g碳酸鉀懸浮於300 ml無水二甲基甲醯胺中並在氮下將混合物加熱至90℃。隨後逐滴添加79 g[1044598-79-9]。隨後將反應混合物在90℃下攪拌6h。在冷卻至室溫後,添加乙酸乙酯並用水洗滌混合物。經硫酸鎂乾燥有機相並蒸發溶劑。藉由氧化矽上管柱層析純化產物,從而獲得式1化合物。1H-NMR數據(ppm,CDCl3): 8.33 2H d,7.60 2H d,6.68 2H dxd,4.03 4H d,1.85-1.75 2H m,1.45-1.15 48H m,0.88 6H t,0.86 6H t;a) 20 g [88949-34-2] and 25.76 g of potassium carbonate were suspended in 300 ml of anhydrous dimethylformamide and the mixture was heated to 90 ° C under nitrogen. Then 79 g [1044598-79-9] was added dropwise. The reaction mixture was then stirred at 90 ° C for 6 h. After cooling to room temperature, ethyl acetate was added and the mixture was washed with water. The organic phase was dried over MgSO4 and evaporated. The product was purified by column chromatography on cerium oxide to obtain the compound of formula 1. 1 H-NMR data (ppm, CDCl 3 ): 8.33 2H d, 7.60 2H d, 6.68 2H dxd, 4.03 4H d, 1.85-1.75 2H m, 1.45-1.15 48H m, 0.88 6H t, 0.86 6H t;

b) 將6.44 g化合物1溶解於100 ml氯仿中。將混合物冷卻至-10℃且隨後添加1.99 g N-溴-琥珀醯亞胺(NBS)並將混合物於-10℃下攪拌2小時。將反應混合物用水洗滌,用硫酸鎂乾燥並蒸發溶劑。藉由氧化矽上管柱層析純化粗產物,從而獲得式2化合物。1H-NMR數據(ppm,苯-D6): 8.72 2H d,6.05 2H d,4.13 4H d,2.06-2.02 2H m,1.65-1.30 48H m,1.01 6H t,1.00 6H t;b) 6.44 g of Compound 1 was dissolved in 100 ml of chloroform. The mixture was cooled to -10 °C and then 1.99 g of N-bromo-succinimide (NBS) was added and the mixture was stirred at -10 °C for 2 hours. The reaction mixture was washed with water, dried over magnesium sulfate and evaporated. The crude product was purified by column chromatography on yttrium oxide to give the compound of formula 2. 1 H-NMR data (ppm, benzene-D 6 ): 8.72 2H d, 6.05 2H d, 4.13 4H d, 2.06-2.02 2H m, 1.65-1.30 48H m, 1.01 6H t, 1.00 6H t;

c) 在氬氣氛下向三頸反應燒瓶中添加0.5 g化合物2、0.188 g 1,4-苯二酸雙(頻哪醇)酯[99770-93-1]及51 mg乙酸鈀。向反應燒瓶中添加15 ml脫氣THF並加熱混合物以溶解起始材料。在用氬進一步脫氣後,添加27 mg 2-(二-第三丁基-膦基)-1-苯基-1H-吡咯並加熱回流反應混合物。隨後添加146 mg氫氧化鋰水合物並將反應混合物在回流下攪拌2小時。隨後將反應混合物冷卻至室溫並將產物用甲醇沉澱,過濾並用甲醇洗滌。藉由Soxhlet萃取獲得式3之聚合物。氯仿部分含有Mw為90,100且多分散性為2.69(藉由高溫GPC量測)之聚合物。c) Add 0.5 g of compound 2, 0.188 g of 1,4-benzene in a three-necked reaction flask under an argon atmosphere Acid bis(pinacol) ester [99770-93-1] and 51 mg palladium acetate. 15 ml of degassed THF was added to the reaction flask and the mixture was heated to dissolve the starting material. After further degassing with argon, 27 mg of 2-(di-tert-butyl-phosphino)-1-phenyl-1H-pyrrole was added and the reaction mixture was heated to reflux. Then 146 mg of lithium hydroxide hydrate was added and the reaction mixture was stirred at reflux for 2 hours. The reaction mixture was then cooled to room temperature and the product was precipitated with methanol, filtered and washed with methanol. The polymer of Formula 3 was obtained by Soxhlet extraction. The chloroform fraction contained a polymer having a Mw of 90,100 and a polydispersity of 2.69 (measured by high temperature GPC).

實例2Example 2

以類似於實例1c)之方式自化合物2及噻吩-二酸-頻哪醇酯[175361-81-6]開始合成式4之聚合物。Soxhlet萃取之四氫呋喃部分含有Mw為74,600且多分散性為2.26(藉由高溫GPC量測)之式4之聚合物。In a manner similar to that of Example 1c) from Compound 2 and Thiophene-II The acid-pinacol ester [175361-81-6] begins to synthesize the polymer of formula 4. The tetrahydrofuran portion of the Soxhlet extraction contained a polymer of Formula 4 having a Mw of 74,600 and a polydispersity of 2.26 (measured by high temperature GPC).

實例3Example 3

以類似於實例1c)之方式自化合物2及噻吩并噻吩-二酸-頻哪醇酯[924894-85-9]開始合成式5之聚合物。式5之粗製聚合物的Mw為8,300且多分散性為2.06(藉由高溫GPC量測)。In a manner similar to that of Example 1c) from Compound 2 and Thienothiophene-II Acid-pinacol ester [924894-85-9] began to synthesize the polymer of formula 5. The crude polymer of Formula 5 had an Mw of 8,300 and a polydispersity of 2.06 (measured by high temperature GPC).

實例4Example 4

以類似於實例1c)之方式自化合物2及二-噻吩-二酸-頻哪醇酯[239075-02-6]開始合成式6之聚合物。式6之粗製聚合物的Mw為6,300且多分散性為1.44(藉由高溫GPC量測)。In a manner similar to Example 1c) from Compound 2 and Di-thiophene-II The acid-pinacol ester [239075-02-6] began to synthesize the polymer of formula 6. The crude polymer of Formula 6 had a Mw of 6,300 and a polydispersity of 1.44 (measured by high temperature GPC).

實例5Example 5

a) 根據化合物[1220883-00-0]使式2之二溴化物與式[883742-29-8]之酸頻哪醇酯在Suzuki偶合反應中反應以產生式7化合物。1H-NMR數據(ppm,CDCl3): 8.44 2H bs,7.23 2H bs,6.94 2H bs,6.75 2H d,4.14 4H d,2.62 4H t,1.92 2H m,1.71-1.60 4H m,1.45-1.15 60H m,0.92 6H t,0.85 6H t,0.82 6H t;a) according to the compound [1220883-00-0], the dibromide of formula 2 and the formula [883742-29-8] The acid pinacol ester is reacted in a Suzuki coupling reaction to produce a compound of formula 7. 1 H-NMR data (ppm, CDCl 3 ): 8.44 2H bs, 7.23 2H bs, 6.94 2H bs, 6.75 2H d, 4.14 4H d, 2.62 4H t, 1.92 2H m, 1.71-1.60 4H m, 1.45-1.15 60H m, 0.92 6H t, 0.85 6H t, 0.82 6H t;

b) 根據化合物[1220883-03-3]利用N-溴琥珀醯亞胺(NBS)溴化式7之化合物以產生式8化合物。1H-NMR數據(ppm,CDCl3): 8.45 2H bs,7.08 2H bs,6.73 2H d,4.09 4Hd,2.57 4H t,1.93 2H m,1.70-1.55 4H m,1.48-1.15 60H m,0.90 6H t,0.84 6H t,0.83 6H t;b) bromination of a compound of formula 7 using N-bromosuccinimide (NBS) according to compound [1220883-03-3] to yield a compound of formula 8. 1 H-NMR data (ppm, CDCl 3 ): 8.45 2H bs, 7.08 2H bs, 6.73 2H d, 4.09 4Hd, 2.57 4H t, 1.93 2H m, 1.70-1.55 4H m, 1.48-1.15 60H m, 0.90 6H t , 0.84 6H t, 0.83 6H t;

c)以類似於實例1c)之方式自化合物8及噻吩-二酸-頻哪醇酯[175361-81-6]開始合成式9之聚合物。Soxhlet萃取之四氫呋喃部分含有Mw為36,200且多分散性為1.86(藉由高溫GPC量測)之式9之聚合物。c) from compound 8 and thiophene-di in a manner similar to that of Example 1c) The acid-pinacol ester [175361-81-6] begins to synthesize the polymer of formula 9. The tetrahydrofuran portion of the Soxhlet extraction contained a polymer of formula 9 having a Mw of 36,200 and a polydispersity of 1.86 (measured by high temperature GPC).

實例6Example 6

以類似於實例1c)之方式自0.8當量化合物8、0.2當量化合物[214493-03-5]及1當量噻吩-二酸-頻哪醇酯[175361-81-6]開始合成式10之聚合物。式10之粗製聚合物的Mw為11,500且多分散性為1.90(藉由高溫GPC量測)。In a similar manner to Example 1c), from 0.8 equivalents of compound 8, 0.2 equivalent of compound [214493-03-5] and 1 equivalent of thiophene-II The acid-pinacol ester [175361-81-6] begins to synthesize the polymer of formula 10. The crude polymer of Formula 10 had a Mw of 11,500 and a polydispersity of 1.90 (measured by high temperature GPC).

實例7Example 7

以類似於實例1c)之方式自0.5當量化合物8、0.5當量化合物[214493-03-5]及1當量噻吩-二酸-頻哪醇酯[175361-81-6]開始合成式11之聚合物。式11之粗製聚合物的Mw為9,900且多分散性為1.61(藉由高溫GPC量測)。In a similar manner to Example 1c), from 0.5 equivalents of compound 8, 0.5 equivalent of compound [214493-03-5] and 1 equivalent of thiophene-II The acid-pinacol ester [175361-81-6] begins to synthesize the polymer of formula 11. The crude polymer of Formula 11 had a Mw of 9,900 and a polydispersity of 1.61 (measured by high temperature GPC).

實例8Example 8

以類似於實例1c)之方式自化合物[1000623-98-2]及呋喃-二酸-頻哪醇酯[476004-83-8]開始合成式12之聚合物。Soxhlet萃取之四氫呋喃部分含有Mw為60,500且多分散性為2.28(藉由高溫GPC量測)之式12之聚合物。In a manner similar to that of Example 1c) from the compound [1000623-98-2] and furan-di The acid-pinacol ester [476004-83-8] began to synthesize the polymer of formula 12. The tetrahydrofuran portion of the Soxhlet extraction contained a polymer of formula 12 having a Mw of 60,500 and a polydispersity of 2.28 (measured by high temperature GPC).

實例9Example 9

a) 根據化合物[1220883-00-0]使式[1000623-98-2]之二溴化物及式[883742-29-8]之酸頻哪醇酯在Suzuki偶合反應中反應以產生式13之化合物。a) a dibromide of the formula [1000623-98-2] and a formula [883742-29-8] according to the compound [1220883-00-0] The acid pinacol ester is reacted in a Suzuki coupling reaction to produce a compound of formula 13.

b) 根據化合物[1220883-03-3]利用N-溴琥珀醯亞胺(NBS)溴化式13之化合物以產生式14之化合物。b) bromination of a compound of formula 13 using N-bromosuccinimide (NBS) according to compound [1220883-03-3] to yield a compound of formula 14.

c) 以類似於實例1c)之方式自化合物14及呋喃-二酸-頻哪醇酯[476004-83-8]開始合成式15之聚合物。Soxhlet萃取之四氫呋喃部分含有Mw為40,200且多分散性為2.10(藉由高溫GPC量測)之式15之聚合物。c) in a manner similar to that of Example 1c) from Compound 14 and Furan-II The acid-pinacol ester [476004-83-8] began to synthesize the polymer of formula 15. The tetrahydrofuran portion of the Soxhlet extraction contained a polymer of formula 15 having a Mw of 40,200 and a polydispersity of 2.10 (measured by high temperature GPC).

實例10Example 10

以類似於實例1c)之方式自0.8當量化合物14、0.2當量化合物[214493-03-5]及1當量呋喃-二酸-頻哪醇酯[476004-83-8]開始合成式16之聚合物。Soxhlet萃取之四氫呋喃部分含有Mw為27,100且多分散性為1.99(藉由高溫GPC量測)之式16之聚合物。In a similar manner to Example 1c), from 0.8 equivalents of compound 14, 0.2 equivalent of compound [214493-03-5] and 1 equivalent of furan-di The acid-pinacol ester [476004-83-8] began to synthesize the polymer of formula 16. The tetrahydrofuran portion of the Soxhlet extraction contained a polymer of formula 16 having a Mw of 27,100 and a polydispersity of 1.99 (measured by high temperature GPC).

實例11Example 11

以類似於實例1c)之方式自0.5當量化合物14、0.5當量化合物[214493-03-5]及1當量呋喃-二酸-頻哪醇酯[476004-83-8]開始合成式17之聚合物。Soxhlet萃取之四氫呋喃部分含有Mw為22,600且多分散性為2.00(藉由高溫GPC量測)之式17之聚合物。In a manner similar to Example 1c) from 0.5 equivalents of compound 14, 0.5 equivalents of compound [214493-03-5] and 1 equivalent of furan-di The acid-pinacol ester [476004-83-8] began to synthesize the polymer of formula 17. The tetrahydrofuran portion of the Soxhlet extraction contained a polymer of the formula 17 having a Mw of 22,600 and a polydispersity of 2.00 (measured by high temperature GPC).

實例12Example 12

以類似於實例1c)之方式自化合物[1000623-98-2]及吡咯-二酸-頻哪醇酯[476004-84-9]開始合成式18之聚合物。式18之粗製聚合物的Mw為8,500且多分散性為2.43(藉由高溫GPC量測)。In a manner similar to that of Example 1c) from the compound [1000623-98-2] and pyrrole-di The acid-pinacol ester [476004-84-9] began to synthesize the polymer of formula 18. The crude polymer of Formula 18 had an Mw of 8,500 and a polydispersity of 2.43 (measured by high temperature GPC).

實例13Example 13

以類似於實例1c)之方式自化合物14及吡咯-二酸-頻哪醇酯[476004-84-9]開始合成式19之聚合物。式19之粗製聚合物的Mw為5,000且多分散性為2.15(藉由高溫GPC量測)。In a manner similar to that of Example 1c) from Compound 14 and Pyrrole-II The acid-pinacol ester [476004-84-9] began to synthesize the polymer of formula 19. The crude polymer of Formula 19 had a Mw of 5,000 and a polydispersity of 2.15 (measured by high temperature GPC).

實例14Example 14

以類似於實例1c)之方式自0.8當量化合物14、0.2當量化合物[214493-03-5]及1當量吡咯-二酸-頻哪醇酯[476004-84-9]開始合成式20之聚合物。式20之粗製聚合物的Mw為5,500且多分散性為1.87(藉由高溫GPC量測)。In a manner similar to Example 1c) from 0.8 equivalents of compound 14, 0.2 equivalents of compound [214493-03-5] and 1 equivalent of pyrrole-di The acid-pinacol ester [476004-84-9] begins to synthesize the polymer of formula 20. The crude polymer of Formula 20 had a Mw of 5,500 and a polydispersity of 1.87 (measured by high temperature GPC).

實例15Example 15

以類似於實例1c)之方式自0.5當量化合物14、0.5當量化合物[214493-03-5]及1當量吡咯-二酸-頻哪醇酯[476004-84-9]開始合成式21之聚合物。式21之粗製聚合物的Mw為3,200且多分散性為1.77(藉由高溫GPC量測)。In a similar manner to Example 1c), from 0.5 equivalent of compound 14, 0.5 equivalent of compound [214493-03-5] and 1 equivalent of pyrrole-di The acid-pinacol ester [476004-84-9] began to synthesize the polymer of formula 21. The crude polymer of Formula 21 had a Mw of 3,200 and a polydispersity of 1.77 (measured by high temperature GPC).

應用實例1:半導電聚合物3之光伏打應用Application Example 1: Photovoltaic application of semiconductive polymer 3 基於聚合物之本體異質接面太陽能電池Polymer-based bulk heterojunction solar cell

太陽能電池具有下列結構:Al電極/LiF層/有機層(包含聚合物3)及[70]PCBM/[聚(3,4-伸乙基二氧基-噻吩)(PEDOT)與聚(苯乙烯磺酸)(PSS)]/ITO電極/玻璃基板之混合物。藉由將PEDOT-PSS層旋塗於玻璃基板上之預圖案化ITO上來製造太陽能電池。隨後自oDCB(有機層)旋塗聚合物3(1重量%):[70]PCBM(經取代C70富勒烯)之1:1.5混合物。LiF及Al在高真空下經由蔽蔭遮罩昇華。The solar cell has the following structure: Al electrode/LiF layer/organic layer (containing polymer 3) and [70]PCBM/[poly(3,4-extended ethylenedioxy-thiophene) (PEDOT) and poly(styrene) Sulfonic acid) (PSS)] / ITO electrode / glass substrate mixture. A solar cell was fabricated by spin coating a PEDOT-PSS layer onto pre-patterned ITO on a glass substrate. Subsequently, a 1:1.5 mixture of polymer 3 (1% by weight): [70] PCBM (substituted C 70 fullerene) was spin-coated from oDCB (organic layer). LiF and Al sublimate through a shadow mask under high vacuum.

太陽能電池性能Solar cell performance

在太陽光模擬器下量測太陽能電池。隨後利用外部量子效率(EQE)圖表、在AM1.5條件下估計電流。此量測獲得以下值:Jsc=8.5 mA/cm2,FF=0.58及Voc=0.82 V,且所估計的總效率為4.04%。Solar cells were measured under a solar simulator. The current was then estimated under AM 1.5 conditions using an external quantum efficiency (EQE) chart. This measurement yielded the following values: J sc = 8.5 mA/cm 2 , FF = 0.58 and V oc = 0.82 V, and the estimated total efficiency was 4.04%.

實例16Example 16

以類似於實例1c)之方式自0.96 g化合物2、508.6 g化合物22開始合成式23之聚合物。使用不同溶劑:四氫呋喃、氯仿及鄰二氯苯藉由Soxhlet萃取純化聚合物。720 mg鄰二氯苯部分含有Mw為100,000且多分散性為2.59(藉由高溫GPC量測)之式16之聚合物。The polymer of formula 23 was synthesized starting from 0.96 g of compound 2, 508.6 g of compound 22 in a manner analogous to Example 1c). The polymer was purified by Soxhlet extraction using different solvents: tetrahydrofuran, chloroform and o-dichlorobenzene. The 720 mg o-dichlorobenzene moiety contained a polymer of formula 16 having a Mw of 100,000 and a polydispersity of 2.59 (measured by high temperature GPC).

應用實例2:基於聚合物23之有機場效應電晶體Application Example 2: Airport-based transistor based on polymer 23

在所有實驗中使用具有p-Si閘極(10 cm)之底部閘極薄膜電晶體(TFT)結構。將300 nm厚之高品質熱SiO2層用作閘極絕緣體,Ci=32.6 nF/cm2電容/單元面積。藉由光微影直接在閘極氧化物上將源電極及汲電極圖案化。使用可界定具有寬度W=10 mm及各種長度L=4 m、8 m、15 m、30 m之溝槽的金源電極及汲電極。在沈積有機半導體之前,藉由以下方式來得到SiO2表面:在160℃下與六二甲基矽氮烷(HMDS)一起於飽和矽烷蒸氣中暴露2小時,以800 rpm(轉/分鐘)之旋轉速度將HMDS旋塗約1分鐘,或在60℃下使用存於甲苯中之十八烷基三氯矽烷(OTS)的0.1 m溶液將基板處理20分鐘。使用異丙醇沖洗後,將基板乾燥。A bottom gate thin film transistor (TFT) structure with a p-Si gate (10 cm) was used in all experiments. A 300 nm thick high quality thermal SiO 2 layer was used as the gate insulator with a C i = 32.6 nF/cm 2 capacitance/cell area. The source and drain electrodes are patterned directly on the gate oxide by photolithography. A gold source electrode and a germanium electrode which define a trench having a width W = 10 mm and various lengths L = 4 m, 8 m, 15 m, 30 m are used. Before depositing the organic semiconductor, the SiO 2 surface was obtained by exposure to hexamethylene decazane (HMDS) in saturated decane vapor at 160 ° C for 2 hours at 800 rpm (revolutions per minute). Spinning speed HMDS was spin coated for about 1 minute, or the substrate was treated with a 0.1 m solution of octadecyltrichlorodecane (OTS) in toluene at 60 ° C for 20 minutes. After rinsing with isopropyl alcohol, the substrate was dried.

藉由旋塗或滴注自實例16中獲得且存於鄰二氯苯之0.5%(w/w)溶液中的式23的DPP衍生物來製造半導體薄膜。以1000 rpm(轉/分鐘)之旋轉速度在環境條件中經約60秒來達成旋塗。在100℃下乾燥15分鐘後以沉澱後原樣評價該裝置。A semiconductor film was produced by spin coating or dripping a DPP derivative of the formula 23 obtained in Example 16 and stored in a 0.5% (w/w) solution of o-dichlorobenzene. Spin coating was achieved in an ambient condition at a rotational speed of 1000 rpm (revolutions per minute) over about 60 seconds. After drying at 100 ° C for 15 minutes, the device was evaluated as it was after precipitation.

鄰二氯苯中之電晶體性能Transistor properties in o-dichlorobenzene

在自動電晶體探測器(TP-10)上量測電晶體的特徵。The characteristics of the transistor were measured on an automated transistor detector (TP-10).

根據對飽和傳輸特性之平方根的線性擬合,在乾燥後可測得場效應遷移率為1.1×10-2 cm2/Vs且開/關電流比為2.7×105。閾值電壓為約2.3 V。According to a linear fit to the square root of the saturation transfer characteristic, the field effect mobility was measured to be 1.1 × 10 -2 cm 2 /Vs after drying and the on/off current ratio was 2.7 × 10 5 . The threshold voltage is approximately 2.3 V.

應用實例3:基於聚合物23之有機本體異質接面太陽能電池Application Example 3: Organic bulk heterojunction solar cell based on polymer 23

太陽能電池具有下列結構:Al電極/LiF層/有機層(包括本發明化合物)/[聚(3,4-伸乙基二氧基-噻吩)(PEDOT):聚(苯乙烯磺酸)(PSS)]/ITO電極/玻璃基板。藉由將PEDOT:PSS層旋塗於玻璃基板上之預圖案化ITO上來製造太陽能電池。隨後旋塗式23化合物(0.8重量%):[60]PCBM或[70]PCBM(經取代C60或C70富勒烯)之1:2混合物(有機層)。LiF及Al在高真空下經由蔽蔭遮罩昇華。The solar cell has the following structure: Al electrode / LiF layer / organic layer (including the compound of the present invention) / [poly(3,4-extended ethyldioxy-thiophene) (PEDOT): poly(styrenesulfonic acid) (PSS) )] / ITO electrode / glass substrate. A solar cell was fabricated by spin coating a PEDOT:PSS layer onto pre-patterned ITO on a glass substrate. Subsequently, a compound of formula 23 (0.8% by weight) was spin-coated: [60] PCBM or [70] PCBM (substituted C 60 or C 70 fullerene) 1:2 mixture (organic layer). LiF and Al sublimate through a shadow mask under high vacuum.

太陽能電池性能Solar cell performance

在太陽光模擬器下量測太陽能電池。隨後利用外部量子效率(EQE)圖表、在AM1.5條件下估計電流。此量測獲得以下值:Jsc=14.35 mA/cm2,FF=0.61及Voc=0.72 V,且所估計的總效率為6.3%。Solar cells were measured under a solar simulator. The current was then estimated under AM 1.5 conditions using an external quantum efficiency (EQE) chart. This measurement yielded the following values: J sc = 14.35 mA/cm 2 , FF = 0.61 and V oc = 0.72 V, and the estimated total efficiency was 6.3%.

實例17:聚合物26之合成Example 17: Synthesis of Polymer 26

a) 向1.05 g 24存於20 ml無水THF中之冷卻(-78℃)溶液中添加4.5 ml丁基鋰(2.5 M,存於己烷中)。將所得溶液在0℃下攪拌15分鐘並冷卻至-78℃。逐滴添加5.2 g 2-異丙氧基-4,4,5,5-四甲基-1,3,2-二氧硼,於-78℃下保持5分鐘,隨後將該溶液緩慢升溫至室溫並繼續攪拌30分鐘。藉由添加50 ml HCl(10%)來終止反應且用40 ml乙酸乙酯將產物萃取兩次。乾燥並蒸發合併之有機萃取物以產生粗製25,藉由自9:1二異丙醚:甲苯重結晶對其進行純化,獲得1.77 g白色粉末狀標題化合物。a) To a cooled (-78 ° C) solution of 1.05 g of 24 in anhydrous THF was added 4.5 ml of butyl lithium (2.5 M in hexane). The resulting solution was stirred at 0 °C for 15 minutes and cooled to -78 °C. Add 5.2 g of 2-isopropoxy-4,4,5,5-tetramethyl-1,3,2-dioxaborate dropwise It was kept at -78 ° C for 5 minutes, then the solution was slowly warmed to room temperature and stirring was continued for 30 minutes. The reaction was quenched by the addition of 50 mL HCl (10%) and the product was extracted twice with 40 mL ethyl acetate. The combined organic extracts were dried <RTI ID=0.0>

b) 在氬下將0.96 g 2、0.5 g化合物25、15 mg Pd(乙酸酯)2、76 mg 2-(二-第三丁基-膦基)-1-苯基-吡咯與60 ml四氫呋喃混合並升溫至40℃。隨後向該反應混合物中添加0.29 g氫氧化鋰溶液。隨後使反應混合物回流4小時並冷卻至室溫。使用甲醇使綠-藍色混合物沉澱並過濾。將濾液溶解於氯仿中並使用1% NaCN水溶液回流3小時。用水洗滌有機相且隨後乾燥並蒸發。用甲醇沉澱聚合物並在Soxhlet中利用THF、氯仿及二氯苯分級分離沉澱。二氯苯部分含有610 mg期望聚合物26。Mw=31,500,多分散性=1.65(由HT-GPC量測)。b) 0.96 g 2 , 0.5 g compound 25, 15 mg Pd (acetate) 2 , 76 mg 2-(di-tert-butyl-phosphino)-1-phenyl-pyrrole with 60 ml under argon The tetrahydrofuran was mixed and warmed to 40 °C. Then 0.29 g of lithium hydroxide solution was added to the reaction mixture. The reaction mixture was then refluxed for 4 hours and cooled to room temperature. The green-blue mixture was precipitated using methanol and filtered. The filtrate was dissolved in chloroform and refluxed with a 1% aqueous NaCN solution for 3 hr. The organic phase was washed with water and then dried and evaporated. The polymer was precipitated with methanol and the precipitate was fractionated using THF, chloroform and dichlorobenzene in a Soxhlet. The dichlorobenzene portion contains 610 mg of the desired polymer 26. Mw = 31,500, polydispersity = 1.65 (measured by HT-GPC).

應用實例4:基於聚合物26之有機本體異質接面太陽能電池Application Example 4: Organic Body Heterojunction Solar Cell Based on Polymer 26

太陽能電池具有下列結構:Al電極/LiF層/有機層(包括本發明化合物)/[聚(3,4-伸乙基二氧基-噻吩)(PEDOT):聚(苯乙烯磺酸)(PSS)]/ITO電極/玻璃基板。藉由將PEDOT:PSS層旋塗於玻璃基板上之預圖案化ITO上來製造太陽能電池。然後,旋塗式26化合物(1重量%):[60]PCBM或[70]PCBM(經取代C60或C70富勒烯)之1:1.5混合物(有機層)。LiF及Al在高真空下經由蔽蔭遮罩昇華。The solar cell has the following structure: Al electrode / LiF layer / organic layer (including the compound of the present invention) / [poly(3,4-extended ethyldioxy-thiophene) (PEDOT): poly(styrenesulfonic acid) (PSS) )] / ITO electrode / glass substrate. A solar cell was fabricated by spin coating a PEDOT:PSS layer onto pre-patterned ITO on a glass substrate. Then, a compound of Formula 26 (1% by weight) was spin-coated: [60] PCBM or [70] PCBM (substituted C 60 or C 70 fullerene) 1:1.5 mixture (organic layer). LiF and Al sublimate through a shadow mask under high vacuum.

太陽能電池性能Solar cell performance

在AM1.5G條件下量測太陽能電池特性。使用基於氙燈之太陽能模擬器輻照(100 mW/cm2)且裝置面積為0.09 cm2。在該等條件下,測得效率為5.07%(其中Jsc=10.90 mA/cm2,FF=0.57且Voc=0.82V)。Solar cell characteristics were measured under AM 1.5G conditions. Irradiation with a xenon-based solar simulator (100 mW/cm 2 ) and a device area of 0.09 cm 2 . Under these conditions, the measured efficiency was 5.07% (where Jsc = 10.90 mA/cm 2 , FF = 0.57 and Voc = 0.82 V).

實例18:聚合物29之合成Example 18: Synthesis of Polymer 29

a) 以類似於實例17a)之方式合成化合物28。a) Compound 28 was synthesized in a similar manner to Example 17a).

b) 以類似於實例17b)之方式合成聚合物29。b) Polymer 29 was synthesized in a similar manner to Example 17b).

實例19Example 19

a) 向200 ml第三戊醇中添加5.77 g鈉及12 mg FeCl3。隨後將混合物加熱至90℃直至所有鈉金屬均反應。隨後逐份添加8.34 g 2-呋喃腈[617-90-3]且隨後逐份添加20g[1224573-55-0]。反應混合物之顏色變為紅色。將反應混合物於90℃下攪拌過夜。將反應混合物傾倒於冰水上並過濾沉澱。用水、丙酮及甲醇及水洗滌濾餅且隨後乾燥以產生式30之化合物。1H-NMR數據(ppm,DMSO-d6): 8.21 1H d,8.06 1H d,7.96 1H dxd,7.67 1H d,7.30 1H dxd,6.84 1H d。a) Add 5.77 g of sodium and 12 mg of FeCl 3 to 200 ml of the third pentanol. The mixture was then heated to 90 ° C until all of the sodium metal reacted. Subsequently, 8.34 g of 2-furanonitrile [617-90-3] was added in portions and then 20 g [1224573-55-0] was added in portions. The color of the reaction mixture turned red. The reaction mixture was stirred at 90 ° C overnight. The reaction mixture was poured onto ice water and the precipitate was filtered. The filter cake is washed with water, acetone and methanol and water and then dried to yield a compound of formula 30. 1 H-NMR data (ppm, DMSO-d 6 ): 8.21 1H d, 8.06 1H d, 7.96 1H dxd, 7.67 1H d, 7.30 1H dxd, 6.84 1H d.

b) 以類似於實例1a)之方式用2-己基-癸基-碘化物[1044598-79-9]烷基化式30化合物以產生式31化合物。化合物31未經進一步即直接用於下一步驟。b) The compound of formula 30 is alkylated with 2-hexyl-indenyl-iodide [1044598-79-9] in a similar manner to Example 1a) to give the compound of formula 31. Compound 31 was used directly in the next step without further.

c) 以類似於實例1b)之方式用N-溴琥珀醯亞胺(NBS)溴化式31之化合物以產生式32之化合物。1H-NMR數據(ppm,CDCl3): 8.54 1H d,8.26 1H d,7.14 1H d,6.55 1H d,3.92 2H d,3.85 2H d,1.80 1H m,1.72 1H m,1.35-1.05 48H m,0.77 6H t,0.76 6H t。c) The compound of formula 31 is brominated with N-bromosuccinimide (NBS) in a similar manner to Example 1 b) to give the compound of formula 32. 1 H-NMR data (ppm, CDCl 3 ): 8.54 1H d, 8.26 1H d, 7.14 1H d, 6.55 1H d, 3.92 2H d, 3.85 2H d, 1.80 1H m, 1.72 1H m, 1.35-1.05 48H m, 0.77 6H t, 0.76 6H t.

d) 以類似於實例1c)之方式使式32之二溴化物與噻吩-二-酸-頻哪醇-酯[175361-81-6]在Suzuki偶合反應中反應以產生式33之化合物。d) the dibromide of formula 32 and thiophene-di- in a manner similar to that of Example 1c) The acid-pinacol-ester [175361-81-6] is reacted in a Suzuki coupling reaction to yield a compound of formula 33.

實例20Example 20

以類似於實例1c)之方式使式32之二溴化物與萘-二-酸-頻哪醇-酯[849543-98-2]在Suzuki偶合反應中反應以產生式34之化合物。The dibromide of formula 32 and naphthalene-di- in a manner similar to that of Example 1c) The acid-pinacol-ester [849543-98-2] is reacted in a Suzuki coupling reaction to produce a compound of formula 34.

實例21Example 21

a) 以類似於實例1a)之方式利用2-乙基-己基-碘化物[1653-16-3]烷基化二-呋喃基-二-酮-吡咯并-吡咯[88949-34-2]以產生式35之化合物。1H-NMR數據(ppm,CDCl3): 8.33 2H dxd, 7.61 2H d, 6.69 2H dxd, 4.05 4H d, 1.75 2H m, 1.45-1.25 16H m, 0.90 6H t, 0.87 6H t。a) alkylation of di-furyl-di-keto-pyrrolo-pyrrole using 2-ethyl-hexyl-iodide [1653-16-3] in a manner similar to that of Example 1a) [88949-34-2] To produce a compound of formula 35. 1 H-NMR data (ppm, CDCl 3 ): 8.33 2H dxd, 7.61 2H d, 6.69 2H dxd, 4.05 4H d, 1.75 2H m, 1.45-1.25 16H m, 0.90 6H t, 0.87 6H t.

b) 以類似於實例1b)之方式利用N-溴琥珀醯亞胺(NBS)溴化式35之化合物以產生式36之化合物。1H-NMR數據(ppm,CDCl3): 8.30 2H d,6.62 2H d,3.99 4H d,1.74 2H m,1.45-1.25 16H m,0.92 6H t,0.88 6H t。b) The compound of formula 35 is brominated with N-bromosuccinimide (NBS) in a similar manner to Example 1 b) to yield the compound of formula 36. 1 H-NMR data (ppm, CDCl 3 ): 8.30 2H d, 6.62 2H d, 3.99 4H d, 1.74 2H m, 1.45-1.25 16H m, 0.92 6H t, 0.88 6H t.

實例22Example 22

a) 以類似於實例1a)之方式利用1-十二烷基-碘化物[4292-19-7]烷基化二-呋喃基-二-酮-吡咯并-吡咯[88949-34-2]以產生式37之化合物。1H-NMR數據(ppm,CDCl3): 8.30 2H dxd,7.63 2H d,6.69 2H dxd,4.11 4H t,1.69 4H m,1.45-1.20 36H m,0.88 6H t。a) alkylation of di-furyl-di-keto-pyrrolo-pyrrole using 1-dodecyl-iodide [4292-19-7] in a manner similar to that of Example 1a) [88949-34-2] To produce a compound of formula 37. 1 H-NMR data (ppm, CDCl 3 ): 8.30 2H dxd, 7.63 2H d, 6.69 2H dxd, 4.11 4H t, 1.69 4H m, 1.45-1.20 36H m, 0.88 6H t.

b) 以類似於實例1b)之方式利用N-溴琥珀醯亞胺(NBS)溴化式37之化合物以產生式38之化合物。1H-NMR數據(ppm,CDCl3): 8.25 2H d,6.63 2H d,4.05 4H t,1.67 4H m,1.45-1.25 36H m,0.88 6H t。b) The compound of formula 37 is brominated with N-bromosuccinimide (NBS) in a similar manner to Example 1 b) to yield the compound of formula 38. 1 H-NMR data (ppm, CDCl 3 ): 8.25 2H d, 6.63 2H d, 4.05 4H t, 1.67 4H m, 1.45-1.25 36H m, 0.88 6H t.

實例23 Example 23

a) 以類似於實例1a)之方式利用2-丁基-辛基-碘化物[1256345-37-5]烷基化二-呋喃基-二-酮-吡咯并-吡咯[88949-34-2]以產生式39之化合物。1H-NMR數據(ppm,CDCl3): 8.33 2H dxd,7.60 2H d,6.69 2H dxd,4.03 4H d,1.80 2H m,1.45-1.20 32H m,0.86 6H t,0.84 6H t。a) alkylation of di-furyl-di-keto-pyrrolo-pyrrole using 2-butyl-octyl-iodide [1256345-37-5] in a manner similar to that of Example 1a) [88949-34-2 ] to produce a compound of formula 39. 1 H-NMR data (ppm, CDCl 3 ): 8.33 2H dxd, 7.60 2H d, 6.69 2H dxd, 4.03 4H d, 1.80 2H m, 1.45-1.20 32H m, 0.86 6H t, 0.84 6H t.

b) 以類似於實例1b)之方式利用N-溴琥珀醯亞胺(NBS)溴化式39之化合物以產生式40之化合物。1H-NMR數據(ppm,CDCl3): 8.29 2H d,6.62 2H d,3.98 4H d,1.78 2H m,1.45-1.20 32H m,0.87 6H t,0.84 6H t。b) The compound of formula 39 is brominated with N-bromosuccinimide (NBS) in a similar manner to Example 1 b) to yield the compound of formula 40. 1 H-NMR data (ppm, CDCl 3 ): 8.29 2H d, 6.62 2H d, 3.98 4H d, 1.78 2H m, 1.45-1.20 32H m, 0.87 6H t, 0.84 6H t.

c) 以類似於實例1c)之方式使式40之二溴化物與二-噻吩-二酸頻哪醇酯[239075-02-6]在Suzuki偶合反應中反應以產生式41之化合物。氯仿部分含有Mw為18,200且多分散性為1.61(藉由高溫GPC量測)之聚合物。c) dibromide of formula 40 and di-thiophene-di in a manner similar to that of Example 1c) The acid pinacol ester [239075-02-6] is reacted in a Suzuki coupling reaction to produce a compound of formula 41. The chloroform fraction contained a polymer having a Mw of 18,200 and a polydispersity of 1.61 (measured by high temperature GPC).

Claims (15)

一種包含一或多個式 之重複單元之聚合物,其中A係下式之基團 其中R1及R2彼此獨立地為C1-C36烷基,R104係C1-C25烷基,其可視情況雜有一或多個氧或硫原子,及D為下式之基團 其中a為整數1至5,X1及X2中之一者係N且另一者係CH,X5及X6中之一者係N且另一者係CR14,R12及R12'彼此獨立地為氫、鹵素、可視情況雜有一或多個氧或硫原子之C1-C25烷基、C1-C25烷氧基、C7-C25芳基烷基、或R13;R13係C1-C10烷基或三(C1-C8烷基)甲矽烷基,R14係C1-C25烷基,其可視情況雜有一或多個氧原子,R15及R15'彼此獨立地為H;或可視情況雜有一或多個氧原子之C1-C25烷基,R18及R18'彼此獨立地為氫、鹵素;可視情況雜有一或多個氧或硫原子之C1-C25烷基;C7-C25芳烷基或C1-C25烷氧基;R19係氫、C7-C25芳烷基、C6-C18芳基;經C1-C18烷基或C1-C18烷氧基取代之C6-C18芳基;或可視情況雜有一或多個氧或硫原子之C1-C25烷基;且 R20及R20'彼此獨立地為氫、C7-C25芳烷基;可視情況雜有一或多個氧或硫原子之C1-C25烷基,R116係氫、C7-C25芳基烷基、C6-C18芳基;經C1-C18烷基、C1-C18全氟烷基或C1-C18烷氧基取代之C6-C18芳基;C1-C25烷基;雜有-O-或-S-之C1-C25烷基;或-COOR119,R101及R101'彼此獨立地為H、F、C1-C18烷基、雜有O之C1-C18烷基、C1-C18烷氧基、雜有O之C1-C18烷氧基、C1-C18全氟烷基、可視情況經C1-C8烷基及/或C1-C8烷氧基取代1至3次之C6-C24芳基、可視情況經C1-C8烷基及/或C1-C8烷氧基取代1至3次之C2-C20雜芳基;R102及R102'彼此獨立地為H、鹵素、可視情況雜有一或多個氧或硫原子之C1-C25烷基;C7-C25芳基烷基、或C1-C25烷氧基;R119係C1-C25烷基、經E'取代及/或雜有D'之C1-C25烷基、C7-C25芳基烷基、C6-C24芳基、經G取代之C6-C24芳基、或C7-C25芳烷基;D'係-CO-、-COO-、-S-、-O-或-NR112-;E'係C1-C8硫代烷氧基、C1-C8烷氧基、CN、-NR112R113、-CONR112R113或鹵素;G係E'或C1-C18烷基;R112及R113彼此獨立地為H;C6-C18芳基;經C1-C18烷基或C1-C18烷氧基取代之C6-C18芳基;C1-C18烷基;或雜有-O-之C1-C18烷基; X7係-C(R120)(R120')-、, R120及R120'彼此獨立地為氫、可視情況雜有一或多個氧或硫原子之C1-C35烷基、或C7-C25芳基烷基;R103及R103'彼此獨立地為氫、鹵素;可視情況雜有一或多個氧或硫原子之C1-C25烷基;可視情況經C1-C8烷基及/或C1-C8烷氧基取代1至3次之C6-C24芳基;C7-C25芳基烷基、CN、或C1-C25烷氧基;或R103及R103'一起形成環;R303、R304、R305及R306彼此獨立地為H、F、C1-C18烷基、雜有O之C1-C18烷基、C1-C18烷氧基、雜有O之C1-C18烷氧基、C1-C18全氟烷基、可視情況經C1-C8烷基及/或C1-C8烷氧基取代1至3次之C6-C24芳基、可視情況經C1-C8烷基及/或C1-C8烷氧基取代1至3次之C2-C20雜芳基;及R100及R100'彼此獨立地為H、F、C1-C18烷基、雜有O之C1-C18烷基、C1-C18烷氧基、雜有O之C1-C18烷氧基、C1-C18全氟烷基、可視情況經C1-C8烷基及/或C1-C8烷氧基取代1至3次之C6-C24芳基、可視情況經C1-C8烷基及/或C1-C8烷氧基取代1至3次之C2-C20雜芳基;其限制條件為當A係式IVa基團時,D不為式Vw基團; 或一種包含一或多個式之重複單元 之聚合物,其中x=0.995至0.005,y=0.005至0.995,且其中x+y=1; A係如前所定義之式IVa、IVc、IVe、IVg、IVh、IVi、IVj或IVk之基團;B及D彼此獨立地為如前所定義之式Va、Vb、Vc、Ve、Vf、Vh、Vi、Vj、Vk、Vl、Vm、Vn、Vo、Vp、Vq、Vr、Vs、Vu、Vv、Vw、Vx、Vy、Vz或Va'基團;或 B為式, R1及R2為C1-C36烷基;D係如前所定義之式Va、Vb、Vc、Ve、Vf、Vh、Vi、Vj、Vk、Vl、Vm、Vn、Vo、Vp、Vq、Vr、Vs、Vu、Vv、Vw、Vx、Vy、Vz或Va'基團;或一種包含一或多個式 之重複單元之聚合 物,其中r=0.985至0.005,s=0.005至0.985,t=0.005至0.985,u=0.005至0.985,且其中r+s+t+u=1,A係如前所定義之式IVa、IVc、IVe、IVg、IVh、IVi、IVj或IVk之基團;B、D及E彼此獨立地為如前所定義之式Va、Vb、Vc、Ve、Vf、Vh、Vi、Vj、Vk、Vl、Vm、Vn、Vo、Vp、Vq、Vr、Vs、Vu、Vv、Vw、Vx、Vy、Vz或Va'基團。 One containing one or more a polymer of a repeating unit, wherein the group A is a group of the following formula Wherein R 1 and R 2 are each independently C 1 -C 36 alkyl, R 104 is C 1 -C 25 alkyl, which may optionally have one or more oxygen or sulfur atoms, and D is a group of the formula Where a is an integer from 1 to 5, one of X 1 and X 2 is N and the other is CH, one of X 5 and X 6 is N and the other is CR 14 , R 12 and R 12 ' Independently, each other is hydrogen, halogen, optionally a C 1 -C 25 alkyl group having one or more oxygen or sulfur atoms, a C 1 -C 25 alkoxy group, a C 7 -C 25 arylalkyl group, or R 13 ; R 13 is C 1 -C 10 alkyl or tri(C 1 -C 8 alkyl)carbyl, R 14 is C 1 -C 25 alkyl, which may optionally have one or more oxygen atoms, R 15 and R 15 ' are each independently H; or optionally a C 1 -C 25 alkyl group having one or more oxygen atoms, and R 18 and R 18 ' are each independently hydrogen or halogen; a plurality of oxygen or sulfur atoms C 1 -C 25 alkyl; C 7 -C 25 aralkyl or C 1 -C 25 alkoxy; R 19 hydrogen, C 7 -C 25 aralkyl, C 6 - a C 18 aryl group; a C 6 -C 18 aryl group substituted by a C 1 -C 18 alkyl group or a C 1 -C 18 alkoxy group; or a C 1 -C 25 group optionally having one or more oxygen or sulfur atoms Alkyl; and R 20 and R 20 ' are each independently hydrogen, C 7 -C 25 aralkyl; optionally, one or more C 1 -C 25 alkyl groups of an oxygen or sulfur atom, R 116 is hydrogen, C 7 -C 25 arylalkyl, C 6 -C 18 aryl group; by C 1 -C 18 alkyl, substituted C 1 -C 18 perfluoroalkyl group or a C 1 -C 18 alkoxy group of C 6 - - C 18 aryl group; C 1 -C 25 alkyl; -O- or -S- mixed with the C 1 -C 25 alkyl; or -COOR 119, R 101 and R 101 'each independently is H, F, C 1 -C 18 alkyl group, an O heteroatom of C 1 -C 18 alkyl C 1 -C 18 alkoxy, an O heteroatom of C 1 -C 18 alkoxy, C 1 -C 18 perfluoroalkyl group, optionally substituted with C 1 -C 8 alkyl and / or C 1 -C 8 Alkoxy substituted 1 to 3 times C 6 -C 24 aryl, optionally substituted by C 1 -C 8 alkyl and/or C 1 -C 8 alkoxy 1 to 3 times C 2 -C 20 Aryl; R 102 and R 102 ' are, independently of each other, H, halogen, optionally C 1 -C 25 alkyl having one or more oxygen or sulfur atoms; C 7 -C 25 arylalkyl, or C 1 -C 25 alkoxy; R 119 is C 1 -C 25 alkyl, substituted with E' and/or C 1 -C 25 alkyl with D', C 7 -C 25 arylalkyl, C 6 -C 24 aryl, C 6 -C 24 aryl substituted by G, or C 7 -C 25 aralkyl; D'-CO-, -COO-, -S-, -O- or -NR 112 -; E' is a C 1 -C 8 thioalkoxy group, a C 1 -C 8 alkoxy group, CN, -NR 112 R 113 , -CONR 112 R 113 or a halogen; G system E' or C 1 -C C18 alkyl; R 112 and R 113 independently of each other H; C 6 -C 18 aryl group; by C 1 -C 18 alkyl or C 1 -C 18 alkoxy group of C 6 -C 18 aryl group; C 1 -C 18 alkyl; or heteroaryl substituted with -O- of C 1 -C 18 alkyl; X 7 based -C (R 120) (R 120 ') -, , or , R 120 and R 120 ' are each independently hydrogen, optionally having one or more C 1 -C 35 alkyl groups of an oxygen or sulfur atom, or a C 7 -C 25 arylalkyl group; R 103 and R 103 ' Independently from each other, hydrogen, halogen; optionally with one or more C 1 -C 25 alkyl groups of oxygen or sulfur atoms; optionally substituted by C 1 -C 8 alkyl and/or C 1 -C 8 alkoxy 1 to 3 C 6 -C 24 aryl; C 7 -C 25 arylalkyl, CN, or C 1 -C 25 alkoxy; or R 103 and R 103' together form a ring; R 303 , R 304, R 305 and R 306 independently of each other H, F, C 1 -C 18 alkyl group, an O heteroatom of C 1 -C 18 alkyl, C 1 -C 18 alkoxy, C 1 mixed with the O -C 18 alkoxy, C 1 -C 18 perfluoroalkyl, optionally substituted by C 1 -C 8 alkyl and/or C 1 -C 8 alkoxy, 1 to 3 times C 6 -C 24 a C 2 -C 20 heteroaryl group optionally substituted 1 to 3 times with a C 1 -C 8 alkyl group and/or a C 1 -C 8 alkoxy group; and R 100 and R 100' are independently H , F., C 1 -C 18 alkyl group, an O heteroatom of C 1 -C 18 alkyl, C 1 -C 18 alkoxy, an O heteroatom of C 1 -C 18 alkoxy, C 1 -C 18 Perfluoroalkyl, optionally C 1 -C 8 alkyl and/or C 1 -C 8 alkoxy Substituting 1 to 3 C 6 -C 24 aryl, optionally C 1 -C 8 alkyl and/or C 1 -C 8 alkoxy for 1 to 3 C 2 -C 20 heteroaryl; The restriction is that when A is a group of formula IVa, D is not a group of formula Vw; or one contains one or more formulas a polymer of repeating units, wherein x = 0.995 to 0.005, y = 0.005 to 0.995, and wherein x + y = 1; A is of the formula IVa, IVc, IVe, IVg, IVh, IVi, IVj or as defined above Groups of IVk; B and D are independently of each other as defined above by the formulae Va, Vb, Vc, Ve, Vf, Vh, Vi, Vj, Vk, Vl, Vm, Vn, Vo, Vp, Vq, Vr, Vs, Vu, Vv, Vw, Vx, Vy, Vz or Va'groups; or B is a formula or R 1 and R 2 are C 1 -C 36 alkyl; D is a formula Va, Vb, Vc, Ve, Vf, Vh, Vi, Vj, Vk, Vl, Vm, Vn, Vo, Vp as defined above. , Vq, Vr, Vs, Vu, Vv, Vw, Vx, Vy, Vz or Va'groups; or one comprising one or more a polymer of the repeating unit, wherein r = 0.985 to 0.005, s = 0.005 to 0.985, t = 0.005 to 0.985, u = 0.005 to 0.985, and wherein r + s + t + u = 1, A is as defined above a group of the formula IVa, IVc, IVe, IVg, IVh, IVi, IVj or IVk; B, D and E are independently of each other as defined above by the formulae Va, Vb, Vc, Ve, Vf, Vh, Vi, a group of Vj, Vk, V1, Vm, Vn, Vo, Vp, Vq, Vr, Vs, Vu, Vv, Vw, Vx, Vy, Vz or Va'. 如請求項1之聚合物,其包含式之重複單 元,其中A及D係如請求項1中所定義,且n為4至1000。 The polymer of claim 1, which comprises A repeating unit, wherein A and D are as defined in claim 1, and n is 4 to 1000. 如請求項1或2之聚合物,其中A係如請求項1定義之式IVa、IVc或IVe之基團。 A polymer according to claim 1 or 2, wherein A is a group of formula IVa, IVc or IVe as defined in claim 1. 如請求項1或2之聚合物,其中 B係式基團,其中R1及R2彼此獨立 地為C1-C35烷基。 The polymer of claim 1 or 2, wherein the B system a group wherein R 1 and R 2 are, independently of each other, a C 1 -C 35 alkyl group. 如請求項1或2之聚合物,其中 D及E彼此獨立地為式之基 團。 The polymer of claim 1 or 2, wherein D and E are independently of each other or The group. 如請求項1或2之聚合物,其係下式之聚合物 其中R1、R2、R1'及R2'彼此獨立地為C1-C36烷基,R104係C1-C25烷基,其可視情況雜有一或多個氧或硫原子,R15為H;或可視情況雜有一或多個氧原子之C1-C25烷基,R20及R20'彼此獨立地為氫、C7-C25芳烷基;可視情況雜有一或多個氧或硫原子之C1-C25烷基,R100及R100'係H,R101及R101'彼此獨立地係H、C1-C25烷基、或C1-C25烷氧基,R102及R102'彼此獨立地係H、或C1-C25烷基,R103及R103'彼此獨立地係H、或C1-C25烷基,R116係H、或C1-C25烷基,R120及R120'彼此獨立地係C1-C35烷基,n為4至1000,及x=0.995至0.005,y=0.005至0.995,,且其中x+y=1。 A polymer according to claim 1 or 2 which is a polymer of the formula or Wherein R 1 , R 2 , R 1 ' and R 2 ' are, independently of each other, a C 1 -C 36 alkyl group, and R 104 is a C 1 -C 25 alkyl group, which may optionally have one or more oxygen or sulfur atoms, R 15 is H; or optionally a C 1 -C 25 alkyl group having one or more oxygen atoms, R 20 and R 20 ' are each independently hydrogen, C 7 -C 25 aralkyl; a plurality of C 1 -C 25 alkyl groups of oxygen or sulfur atoms, R 100 and R 100 ' are H, and R 101 and R 101 ' are each independently H, C 1 -C 25 alkyl, or C 1 -C 25 Alkoxy, R 102 and R 102 ' are each independently H or C 1 -C 25 alkyl, R 103 and R 103 ' are independently H, or C 1 -C 25 alkyl, R 116 H Or a C 1 -C 25 alkyl group, R 120 and R 120 ' are each independently C 1 -C 35 alkyl, n is 4 to 1000, and x=0.995 to 0.005, y=0.005 to 0.995, and wherein x+y=1. 如請求項6之聚合物,其為 基團,其中n為10至1000 及R1係C1-C35烷基。 The polymer of claim 6 which is a group wherein n is from 10 to 1000 and R 1 is a C 1 -C 35 alkyl group. 一種有機半導體材料,其包含如請求項1至7中任一項之聚合物。 An organic semiconductor material comprising the polymer of any one of claims 1 to 7. 一種有機半導體層,其包含如請求項1至7中任一項之聚合物。 An organic semiconductor layer comprising the polymer of any one of claims 1 to 7. 一種有機半導體組件,其包含如請求項1至7中任一項之聚合物。 An organic semiconductor component comprising the polymer of any one of claims 1 to 7. 一種半導體裝置,其包含如請求項1至7中任一項之聚合物、如請求項8之有機半導體材料、如請求項9之有機半導體層或如請求項10之有機半導體組件。 A semiconductor device comprising the polymer of any one of claims 1 to 7, the organic semiconductor material of claim 8, the organic semiconductor layer of claim 9, or the organic semiconductor component of claim 10. 如請求項11之半導體裝置,其係有機光伏打裝置、光電二極體、或有機場效應電晶體。 The semiconductor device of claim 11, which is an organic photovoltaic device, a photodiode, or an organic field effect transistor. 如請求項12之半導體裝置,其中該光伏打裝置依次包含以下各項:(a)陰極(電極),(b)視情況之過渡層,(c)光活性層,(d)視情況之平滑層,(e)陽極(電極),及(f)基板。 The semiconductor device of claim 12, wherein the photovoltaic device comprises, in order, the following: (a) a cathode (electrode), (b) a transition layer as appropriate, (c) a photoactive layer, and (d) smoothing as appropriate Layer, (e) anode (electrode), and (f) substrate. 一種製備有機半導體裝置之方法,該方法包含將存於有機溶劑中之如請求項1至7中任一項之聚合物的溶液及/或分散液施加至基板上,並去除該溶劑。 A method of producing an organic semiconductor device, which comprises applying a solution and/or a dispersion of a polymer according to any one of claims 1 to 7 to an organic solvent, and removing the solvent. 一種如請求項1至7中任一項之聚合物、如請求項8之有機半導體材料、如請求項9之有機半導體層或如請求項 10之有機半導體組件之用途,其係用於光伏打裝置、光電二極體、或有機場效應電晶體中。 A polymer according to any one of claims 1 to 7, an organic semiconductor material as claimed in claim 8, an organic semiconductor layer as claimed in claim 9, or as claimed The use of an organic semiconductor component of 10 for use in a photovoltaic device, a photodiode, or an organic field effect transistor.
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TW200922963A (en) * 2007-09-06 2009-06-01 Xerox Corp Diketopyrrolopyrrole-based polymers
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