TWI602705B - Has a high transmittance, high hardness and color multilayer film structure - Google Patents

Has a high transmittance, high hardness and color multilayer film structure Download PDF

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TWI602705B
TWI602705B TW105140123A TW105140123A TWI602705B TW I602705 B TWI602705 B TW I602705B TW 105140123 A TW105140123 A TW 105140123A TW 105140123 A TW105140123 A TW 105140123A TW I602705 B TWI602705 B TW I602705B
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color
layer
high hardness
multilayer film
hardness
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TW201821257A (en
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rong-hong Lu
Ting-Wei Huang
jun-hong Ye
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rong-hong Lu
Cai shao-ting
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具有高透光、高硬度及彩色的多層膜結構Multi-layer film structure with high light transmission, high hardness and color

本發明有關於一種多層膜結構,特別是一種具有高透光、高硬度及彩色的多層膜結構。The present invention relates to a multilayer film structure, and more particularly to a multilayer film structure having high light transmission, high hardness, and color.

隨著科技的進步,高透光及高硬度的螢幕(基板)已具有廣大的市場需求,且以應用於智慧型手機、觸控平板電腦、觸控電視、車窗及具有玻璃帷幕的大樓等。高透光硬膜設計除了要選用本身硬度夠高的材料外,還需要適當的抗反射膜層搭配才能製造高透光極高硬度的基板。With the advancement of technology, high-transmission and high-hardness screens (substrates) have been widely used in the market, and are used in smart phones, touch tablets, touch TVs, windows, and buildings with glass curtains. . In addition to the material with high hardness, the high-transmission hard film design requires a suitable anti-reflective film layer to produce a substrate with high light transmission and high hardness.

然而,能製造高透光極高硬度的基板雖然已逐漸成形,但若是在基板與太陽能電池的結合下,需要讓太陽能電池模組產生顏色的情況下,會造成太陽能電池模組的發電效率嚴重耗損。因此,前述基板的結構仍有改善的空間。However, although a substrate capable of producing a high light transmission and a high hardness has been gradually formed, if the solar cell module is required to produce color under the combination of the substrate and the solar cell, the power generation efficiency of the solar cell module is severe. Loss. Therefore, there is still room for improvement in the structure of the aforementioned substrate.

有鑒於此,本發明提供一種具有高透光、高硬度及彩色的多層膜結構,藉以達到保護太陽能電池的保護作用並提供色彩效果,且進一步改善傳統對於彩色太陽能電池所造成的發電效率嚴重損耗的問題。In view of the above, the present invention provides a multilayer film structure having high light transmittance, high hardness, and color, thereby protecting the solar cell and providing a color effect, and further improving the conventional power generation efficiency caused by the color solar cell. The problem.

本發明提供一種具有高透光、高硬度及彩色的多層膜結構,包括抗反射層、彩色硬質層與消波層。抗反射層適用於降低太陽能電池的反射率。彩色硬質層配置於反射層上,彩色硬質層具有高硬度性質之材質且產生色彩。消波層配置於彩色硬質層上,以增加抗反射層的抗反射效果並提高反射光的色彩純度。The invention provides a multilayer film structure with high light transmission, high hardness and color, including an anti-reflection layer, a color hard layer and a wave-eliminating layer. The anti-reflective layer is suitable for reducing the reflectivity of the solar cell. The colored hard layer is disposed on the reflective layer, and the colored hard layer has a material of high hardness properties and produces color. The wave absorbing layer is disposed on the color hard layer to increase the anti-reflection effect of the anti-reflection layer and improve the color purity of the reflected light.

根據本發明所揭露的具有高透光、高硬度及彩色的多層膜結構,藉由抗反射層、彩色硬質層與消波層依序堆疊配置,其中抗反射層可降低太陽能電池的反射率、彩色硬質層具有高硬度性質之材質且產生色彩,而消波層增加抗反射層的抗反射效果並提高反射光的色彩純度。如此一來,可有效地達到保護太陽能電池的保護作用並提供色彩效果,且進一步改善傳統對於彩色太陽能電池所造成的發電效率嚴重損耗的問題。According to the present invention, a multilayer film structure having high light transmittance, high hardness and color is sequentially stacked by an anti-reflection layer, a color hard layer and a wave-eliminating layer, wherein the anti-reflection layer can reduce the reflectivity of the solar cell, The colored hard layer has a material of high hardness properties and produces color, and the wave absorbing layer increases the antireflection effect of the antireflection layer and improves the color purity of the reflected light. In this way, the protection of the solar cell can be effectively achieved and the color effect can be provided, and the problem of the conventional power generation efficiency caused by the color solar cell is further improved.

以上之關於本發明內容之說明及以下之實施方式之說明用以示範與解釋本發明之精神與原理,並且提供本發明之專利申請範圍更進一步之解釋。The above description of the present invention and the following description of the embodiments of the present invention are intended to illustrate and explain the spirit and principles of the invention.

以下在實施方式中詳細敘述本發明之詳細特徵以及優點,其內容足以使任何熟習相關技藝者了解本發明之技術內容並據以實施,且根據本說明書所揭露之內容、申請專利範圍及圖式,任何熟習相關技藝者可輕易地理解本發明相關之目的及優點。以下之實施例進一步詳細說明本發明之觀點,但非以任何觀點限制本發明之範疇。The detailed features and advantages of the present invention are set forth in the Detailed Description of the Detailed Description of the <RTIgt; </ RTI> <RTIgt; </ RTI> </ RTI> </ RTI> <RTIgt; The objects and advantages associated with the present invention can be readily understood by those skilled in the art. The following examples are intended to describe the present invention in further detail, but are not intended to limit the scope of the invention.

圖1是本發明一實施例所揭露的具有高透光、高硬度及彩色的多層膜結構的示意圖。具有高透光、高硬度及彩色的多層膜結構100包括抗反射層110、彩色硬質層120與消波層130。抗反射層110適用於降低太陽能電池(未繪示)的反射率。也就是說,本實施例的抗反射層110可適於與太陽能電池黏合,以便於降低太陽能電池的反射率。1 is a schematic view showing a multilayer film structure having high light transmittance, high hardness, and color according to an embodiment of the present invention. The multilayer film structure 100 having high light transmission, high hardness, and color includes an anti-reflection layer 110, a color hard layer 120, and a wave absorbing layer 130. The anti-reflective layer 110 is suitable for reducing the reflectivity of a solar cell (not shown). That is, the anti-reflection layer 110 of the present embodiment can be adapted to be bonded to a solar cell in order to reduce the reflectivity of the solar cell.

進一步來說,其中抗反射層110例如為奈米複層結構薄膜或奈米複合結構薄膜,抗反射層110的厚度例如介於40奈米至150奈米之間,且抗反射層110的硬度例如介於8 GPa至18 GPa 之間。並且,抗反射層110的材料例如為氮化鋁、氮氧化鋁、氧化鋁、氧化矽、氮氧化矽、氮化矽、二氧化鈦中之其中之一或其組合。此外,形成抗反射層110的奈米複層結構薄膜的可見光折射率範圍例如介於1.5至2.3之間,而形成抗反射層110奈米複合結構薄膜的可見光折射率範圍介例如於1.3至2.8之間。Further, wherein the anti-reflection layer 110 is, for example, a nano-layered structure film or a nano-composite structure film, the thickness of the anti-reflection layer 110 is, for example, between 40 nm and 150 nm, and the hardness of the anti-reflection layer 110. For example between 8 GPa and 18 GPa. Moreover, the material of the anti-reflection layer 110 is, for example, one of aluminum nitride, aluminum oxynitride, aluminum oxide, cerium oxide, cerium oxynitride, cerium nitride, titanium dioxide, or a combination thereof. Further, the visible light refractive index range of the nano-multilayer structure film forming the anti-reflection layer 110 is, for example, between 1.5 and 2.3, and the visible light refractive index range of the anti-reflection layer 110 nano-composite structure film is, for example, 1.3 to 2.8. between.

彩色硬質層120配置於抗反射層110上,且彩色硬質層110具有高硬度性質之材質且產生色彩。其中,彩色硬質層120是配置於反射層110相對於太陽能電池的一側的另一側上。The color hard layer 120 is disposed on the anti-reflection layer 110, and the color hard layer 110 has a material of high hardness properties and produces color. The color hard layer 120 is disposed on the other side of the reflective layer 110 with respect to one side of the solar cell.

在本實施例中,彩色硬質層120例如為具四分之一波長之薄膜的堆疊結構,或是具四分之一波長之奇數倍厚度之薄膜的堆疊結構。進一步來說,前述具四分之一波長之薄膜的堆疊結構例如為多個具四分之一波長低折射率(1/4λ L)之薄膜與多個具四分之一波長高折射率(1/4λ H)之薄膜交互堆疊而成的。 In the present embodiment, the color hard layer 120 is, for example, a stacked structure of a film having a quarter wavelength, or a stacked structure of a film having an odd multiple of a quarter wavelength. Further, the stacked structure of the aforementioned film having a quarter wavelength is, for example, a plurality of thin films having a quarter-wavelength low refractive index (1/4λ L ) and a plurality of high refractive indices having a quarter wavelength ( 1/4λ H ) films are stacked alternately.

舉例來說,具四分之一波長低折射率(1/4λ L)之薄膜為1個,具四分之一波長高折射率(1/4λ H)之薄膜為2個,其中具四分之一波長低折射率(1/4λ L)之薄膜配置於2個具四分之一波長高折射率(1/4λ H)之薄膜之間;具四分之一波長低折射率(1/4λ L)之薄膜為2個,具四分之一波長高折射率(1/4λ H)之薄膜為3個,則堆疊順序為具四分之一波長高折射率(1/4λ H)之薄膜、具四分之一波長低折射率(1/4λ L)之薄膜、具四分之一波長高折射率(1/4λ H)之薄膜、具四分之一波長低折射率(1/4λ L)之薄膜、具四分之一波長高折射率(1/4λ H)之薄膜。其餘數量則類推。 For example, a film having a quarter-wavelength low refractive index (1/4λ L ) is one, and a film having a quarter-wavelength high refractive index (1/4λ H ) is two, with four points. One wavelength low refractive index (1/4λ L ) film is disposed between two films having a quarter-wavelength high refractive index (1/4λ H ); a quarter-wavelength low refractive index (1/ The film of 4λ L ) is two, and the film having a quarter-wavelength high refractive index (1/4λ H ) is three, and the stacking order is a quarter-wavelength high refractive index (1/4λ H ). Thin film, film with a quarter-wavelength low refractive index (1/4λ L ), film with a quarter-wavelength high refractive index (1/4λ H ), and a quarter-wavelength low refractive index (1/ A film of 4λ L ) having a quarter-wavelength high refractive index (1/4λ H ) film. The rest is analogy.

另外,使用者可視其需求自行調整堆疊結構中之薄膜的數量總和,使彩色硬質層120可產生不同的色彩,以達到使用者所想要的色彩。In addition, the user can adjust the sum of the number of films in the stack structure according to their needs, so that the color hard layer 120 can produce different colors to achieve the desired color of the user.

此外,高硬度之材質例如為氮化鋁、氮氧化鋁、氧化鋁、氧化矽、氮氧化矽、氮化矽、二氧化鈦中之其中之二或其組合。彩色硬質層120的厚度例如介於300奈米至1200奈米之間,且彩色硬質層120的硬度例如為10 GPa至30 GPa之間,彩色硬質層120的可見光的折射率範圍例如介於1.3至2.8之間。Further, the material of high hardness is, for example, two or a combination of aluminum nitride, aluminum oxynitride, aluminum oxide, cerium oxide, cerium oxynitride, cerium nitride, and titanium dioxide. The thickness of the colored hard layer 120 is, for example, between 300 nm and 1200 nm, and the hardness of the colored hard layer 120 is, for example, 10 GPa to 30 GPa, and the refractive index of the visible light layer 120 has a refractive index range of, for example, 1.3. Between 2.8.

消波層130配置於彩色硬質層120上,以增加抗反射層的抗反射效果並提高反射光的色彩純度。其中,消波層130是配置於彩色硬質層120相對於抗反射層110的一側的另一側上。The wave absorbing layer 130 is disposed on the color hard layer 120 to increase the anti-reflection effect of the anti-reflection layer and improve the color purity of the reflected light. The wave absorbing layer 130 is disposed on the other side of the side of the color hard layer 120 with respect to the anti-reflection layer 110.

在本實施例中,消波層130例如為奈米複層結構或奈米複合結構,消波層130的厚度例如介於20奈米至100奈米,消波層130的硬度例如介於8 GPa至18 GPa。並且,消波層130的材料例如為氮化鋁、氮氧化鋁、氧化鋁、氧化矽、氮氧化矽、氮化矽、二氧化鈦中之其中之一或其組合。另外,形成消波層130的奈米複層結構薄膜的可見光折射率範圍例如介於1.5至2.3之間,而形成消波層130奈米複合結構薄膜的可見光折射率範圍例如介於1.3至2.8之間。In the present embodiment, the wave absorbing layer 130 is, for example, a nano-layered structure or a nano-composite structure. The thickness of the damming layer 130 is, for example, between 20 nm and 100 nm, and the hardness of the absorbing layer 130 is, for example, 8 GPa to 18 GPa. Moreover, the material of the wave absorbing layer 130 is, for example, one of aluminum nitride, aluminum oxynitride, aluminum oxide, cerium oxide, cerium oxynitride, cerium nitride, titanium dioxide, or a combination thereof. In addition, the visible light refractive index range of the nano-structured film forming the wave-depleting layer 130 is, for example, between 1.5 and 2.3, and the visible light refractive index of the wave-forming layer 130 nano-composite structure film is, for example, between 1.3 and 2.8. between.

另外,具有高透光、高硬度及彩色的多層膜結構100還包括透明基板140。透明基板140配置於消波層130上,亦即透明基板140配置於消波層130相對於彩色硬質層120的一側的另一側。並且,透明基板140的可見光的折射率範圍例如介於1.4至1.8之間。In addition, the multilayer film structure 100 having high light transmittance, high hardness, and color further includes a transparent substrate 140. The transparent substrate 140 is disposed on the wave-eliminating layer 130, that is, the transparent substrate 140 is disposed on the other side of the side of the wave-eliminating layer 130 with respect to the color hard layer 120. Also, the refractive index of visible light of the transparent substrate 140 is, for example, between 1.4 and 1.8.

上述說明了多層膜結構100的內部組成構件及其配置關係。以下將列舉一些實驗數據來說明本實施例之多層膜結構100所可以達成的效果。The above describes the internal constituent members of the multilayer film structure 100 and their arrangement relationship. Some experimental data will be listed below to illustrate the effects that can be achieved with the multilayer film structure 100 of the present embodiment.

圖2是本發明一實施例所揭露的彩色硬質層與無彩色玻璃的反射率能譜圖。在圖2中,曲線S1表示可產生藍色色彩的彩色硬質層的反射率能譜;曲線S2表示可產生綠色色彩的彩色硬質層的反射率能譜;曲線S3表示可產生紅色的彩色硬質層的反射率能譜;曲線S4表示無彩色玻璃的反射率能譜。如圖2所示,本實施例所提供的彩色硬質層具有較好的反射率效果。2 is a reflectance spectrum of a colored hard layer and an achromatic glass according to an embodiment of the present invention. In FIG. 2, a curve S1 represents a reflectance spectrum of a color hard layer capable of generating a blue color; a curve S2 represents a reflectance spectrum of a color hard layer which can produce a green color; and a curve S3 represents a color hard layer which can generate a red color. The reflectance spectrum; curve S4 represents the reflectance spectrum of achromatic glass. As shown in FIG. 2, the color hard layer provided in this embodiment has a better reflectivity effect.

依據學理,色光的反射會造成太陽能電池發電效率的降低,因此抗反射的鍍膜設計就是要提高非色光波長範圍的穿透率。圖3是利用本發明實施例所揭露的具有彩色硬質層的多層膜結構與一般無色玻璃分別進行太陽能電池封裝的太陽能電池的外部量子效率(external quantum efficiency, EQE)的量測結果。在圖3中,曲線S5表示利用無彩色玻璃封裝的太陽能電池的外部量子效率;曲線S6表示利用藍色的彩色硬質層(藍色玻璃)封裝的太陽能電池的外部量子效率;曲線S7表示利用綠色的彩色硬質層(藍色玻璃)封裝的太陽能電池的外部量子效率;曲線S8表示利用紅色的彩色硬質層(藍色玻璃)封裝的太陽能電池的外部量子效率,並且外部量子效率變低的色光波段正如學理所預測。According to the theory, the reflection of color light will cause the solar cell power generation efficiency to decrease, so the anti-reflective coating design is to increase the transmittance of the non-chromatic light wavelength range. FIG. 3 is a measurement result of external quantum efficiency (EQE) of a solar cell packaged by a solar cell package using a multi-layer film structure having a color hard layer and a general colorless glass disclosed in an embodiment of the present invention. In FIG. 3, curve S5 represents the external quantum efficiency of a solar cell packaged with achromatic glass; curve S6 represents the external quantum efficiency of a solar cell packaged with a blue colored hard layer (blue glass); curve S7 represents the use of green External quantum efficiency of a solar cell encapsulated in a colored hard layer (blue glass); curve S8 represents an external quantum efficiency of a solar cell packaged with a red colored hard layer (blue glass), and an external quantum efficiency becomes low As the theory predicts.

圖4是利用本發明實施例所揭露的彩色硬質層封裝的彩色太陽能電池的電流電壓特性曲線的量測結果。在圖4中,曲線S9表示電壓電流特性曲線,曲線S10表示功率曲線。圖5是利用無色玻璃封裝的太陽能電池的電流電壓特性曲線量測結果。在圖5中,曲線S11表示電壓電流特性曲線,曲線S12表示功率曲線。由圖4及圖5的結果來看,利用本實施例所提供的彩色硬質層封裝的彩色太陽能電池的電流電壓特性曲線具有較好的效果。4 is a measurement result of a current-voltage characteristic curve of a color solar cell packaged with a color hard layer disclosed in an embodiment of the present invention. In Fig. 4, a curve S9 represents a voltage current characteristic curve, and a curve S10 represents a power curve. Fig. 5 is a measurement result of a current-voltage characteristic curve of a solar cell packaged with a colorless glass. In Fig. 5, a curve S11 represents a voltage-current characteristic curve, and a curve S12 represents a power curve. From the results of FIGS. 4 and 5, the current-voltage characteristic curve of the color solar cell packaged by the color hard layer provided by the present embodiment has a good effect.

表1是利用本實施例之彩色硬質層封裝的彩色太陽能電池的電性量測結果,表2利用無色玻璃封裝的太陽能電池的電性量測結果。由表1及表2中,可以看出表1的量測結果,顯示出利用本實施例之彩色硬質層封裝的彩色太陽能電池的發電效率η(%)僅僅低於0.3%,並且在創造出鮮豔色彩的同時,也保持原先太陽能電池的發電效率。 表1 利用本實施例之彩色硬質層封裝的彩色太陽能電池的電性量測結果 <TABLE border="1" borderColor="#000000" width="85%"><TBODY><tr><td> 樣本 </td><td> I<sub>sc</sub> (mA) </td><td> V<sub>oc</sub> (V) </td><td> 發電效率 Ƞ (%) </td><td> 填充因子 FF </td></tr><tr><td> 測量1 </td><td> 41.67 </td><td> 0.50 </td><td> 14.54 </td><td> 0.70 </td></tr><tr><td> 測量2 </td><td> 42.00 </td><td> 0.50 </td><td> 14.38 </td><td> 0.69 </td></tr><tr><td> 測量3 </td><td> 41.64 </td><td> 0.50 </td><td> 14.44 </td><td> 0.69 </td></tr></TBODY></TABLE>表2 利用無色玻璃封裝的太陽能電池的電性量測結果 <TABLE border="1" borderColor="#000000" width="85%"><TBODY><tr><td> 樣本 </td><td> I<sub>sc</sub> (mA) </td><td> V<sub>oc</sub> (V) </td><td> 發電效率 Ƞ (%) </td><td> 填充因子 FF </td></tr><tr><td> 測量1 </td><td> 47.91 </td><td> 0.49 </td><td> 14.84 </td><td> 0.63 </td></tr><tr><td> 測量2 </td><td> 48.52 </td><td> 0.49 </td><td> 14.83 </td><td> 0.62 </td></tr><tr><td> 測量3 </td><td> 47.74 </td><td> 0.49 </td><td> 14.81 </td><td> 0.63 </td></tr></TBODY></TABLE>Table 1 shows the electrical measurement results of the color solar cells packaged using the color hard layer of the present embodiment, and Table 2 shows the electrical measurement results of the solar cells packaged with the colorless glass. From Tables 1 and 2, the measurement results of Table 1 can be seen, showing that the power generation efficiency η (%) of the color solar cell packaged with the color hard layer of the present embodiment is only less than 0.3%, and is created. At the same time, the color efficiency of the original solar cell is maintained. Table 1 Electrical measurement results of the color solar cell packaged by the color hard layer of the present embodiment         <TABLE border="1" borderColor="#000000" width="85%"><TBODY><tr><td> sample</td><td> I<sub>sc</sub> (mA) < /td><td> V<sub>oc</sub> (V) </td><td> Power generation efficiency Ƞ (%) </td><td> Fill factor FF </td></tr>< Tr><td> Measurement 1 </td><td> 41.67 </td><td> 0.50 </td><td> 14.54 </td><td> 0.70 </td></tr><tr> <td> Measurement 2 </td><td> 42.00 </td><td> 0.50 </td><td> 14.38 </td><td> 0.69 </td></tr><tr><td > Measurement 3 </td><td> 41.64 </td><td> 0.50 </td><td> 14.44 </td><td> 0.69 </td></tr></TBODY></TABLE >Table 2 Electrical measurement results of solar cells packaged in colorless glass         <TABLE border="1" borderColor="#000000" width="85%"><TBODY><tr><td> sample</td><td> I<sub>sc</sub> (mA) < /td><td> V<sub>oc</sub> (V) </td><td> Power generation efficiency Ƞ (%) </td><td> Fill factor FF </td></tr>< Tr><td> Measurement 1 </td><td> 47.91 </td><td> 0.49 </td><td> 14.84 </td><td> 0.63 </td></tr><tr> <td> Measurement 2 </td><td> 48.52 </td><td> 0.49 </td><td> 14.83 </td><td> 0.62 </td></tr><tr><td > Measurement 3 </td><td> 47.74 </td><td> 0.49 </td><td> 14.81 </td><td> 0.63 </td></tr></TBODY></TABLE >

此外,圖6是本發明實施例之彩色硬質層與無色玻璃的表面硬度量測結果。在圖6中,是利用奈米壓痕儀進行荷重與壓痕深度測量,其中曲線S13表示本發明實施例之彩色硬質層表面硬度量測結果,曲線S14表示無色玻璃的表面硬度量測結果。由圖6可以看出,由於本實施例之彩色硬質層採用高硬度鍍膜設計,因此彩色硬質層的表面硬度也高於無色玻璃的表面硬度。Further, Fig. 6 is a measurement result of the surface hardness of the color hard layer and the colorless glass according to the embodiment of the present invention. In Fig. 6, the load and the indentation depth are measured by a nanoindenter, wherein the curve S13 represents the surface hardness measurement result of the color hard layer of the embodiment of the present invention, and the curve S14 represents the surface hardness measurement result of the colorless glass. As can be seen from FIG. 6, since the color hard layer of the present embodiment is designed with a high hardness coating, the surface hardness of the color hard layer is also higher than that of the colorless glass.

綜合上述,本發明實施例所揭露的具有高透光、高硬度及彩色的多層膜結構,藉由抗反射層、彩色硬質層與消波層依序堆疊配置,其中抗反射層可降低太陽能電池的反射率、彩色硬質層具有高硬度性質之材質且產生色彩,而消波層增加抗反射層的抗反射效果並提高反射光的色彩純度。如此一來,可有效地達到保護太陽能電池的保護作用並提供色彩效果,且進一步改善傳統對於彩色太陽能電池所造成的發電效率嚴重損耗的問題。In summary, the multi-layer film structure with high light transmittance, high hardness and color disclosed in the embodiments of the present invention is sequentially stacked by an anti-reflection layer, a color hard layer and a wave-eliminating layer, wherein the anti-reflection layer can reduce the solar cell. The reflectivity, the color hard layer has a material of high hardness properties and produces color, and the wave absorbing layer increases the anti-reflection effect of the anti-reflection layer and improves the color purity of the reflected light. In this way, the protection of the solar cell can be effectively achieved and the color effect can be provided, and the problem of the conventional power generation efficiency caused by the color solar cell is further improved.

雖然本發明以前述之實施例揭露如上,然其並非用以限定本發明。在不脫離本發明之精神和範圍內,所為之更動與潤飾,均屬本發明之專利保護範圍。關於本發明所界定之保護範圍請參考所附之申請專利範圍。Although the present invention has been disclosed above in the foregoing embodiments, it is not intended to limit the invention. It is within the scope of the invention to be modified and modified without departing from the spirit and scope of the invention. Please refer to the attached patent application for the scope of protection defined by the present invention.

100‧‧‧具有高透光、高硬度及彩色的多層膜結構100‧‧‧Multilayer film structure with high light transmission, high hardness and color

110‧‧‧抗反射層110‧‧‧Anti-reflective layer

120‧‧‧彩色硬質層120‧‧‧Color hard layer

130‧‧‧消波層130‧‧‧Wave layer

140‧‧‧透明基板140‧‧‧Transparent substrate

此處所說明的圖式用來提供對本申請的進一步理解,構成本申請的一部分,本申請的示意性實施例及其說明用於解釋本申請,並不構成對本申請的不當限定。在圖式中: 圖1是本發明一實施例所揭露的具有高透光、高硬度及彩色的多層膜結構的示意圖。 圖2是本發明一實施例所揭露的彩色硬質層與無彩色玻璃的反射率能譜圖。 圖3是利用本發明實施例所揭露的具有彩色硬質層的多層膜結構與一般無色玻璃分別進行太陽能電池封裝的太陽能電池的外部量子效率(external quantum efficiency, EQE)的量測結果。 圖4是利用本發明實施例所揭露的彩色硬質層封裝的彩色太陽能電池的電流電壓特性曲線的量測結果。 圖5是利用無色玻璃封裝的太陽能電池的電流電壓特性曲線量測結果。 圖6是本發明實施例之彩色硬質層與無色玻璃的表面硬度量測結果。The drawings are intended to provide a further understanding of the present application, and are intended to be a part of this application. In the drawings: FIG. 1 is a schematic view showing a multilayer film structure having high light transmittance, high hardness, and color according to an embodiment of the present invention. 2 is a reflectance spectrum of a colored hard layer and an achromatic glass according to an embodiment of the present invention. FIG. 3 is a measurement result of external quantum efficiency (EQE) of a solar cell packaged by a solar cell package using a multi-layer film structure having a color hard layer and a general colorless glass disclosed in an embodiment of the present invention. 4 is a measurement result of a current-voltage characteristic curve of a color solar cell packaged with a color hard layer disclosed in an embodiment of the present invention. Fig. 5 is a measurement result of a current-voltage characteristic curve of a solar cell packaged with a colorless glass. Fig. 6 is a graph showing the surface hardness measurement results of a color hard layer and a colorless glass according to an embodiment of the present invention.

100‧‧‧具有高透光、高硬度及彩色的多層膜結構 100‧‧‧Multilayer film structure with high light transmission, high hardness and color

110‧‧‧抗反射層 110‧‧‧Anti-reflective layer

120‧‧‧彩色硬質層 120‧‧‧Color hard layer

130‧‧‧消波層 130‧‧‧Wave layer

140‧‧‧透明基板 140‧‧‧Transparent substrate

Claims (9)

一種具有高透光、高硬度及彩色的多層膜結構,包括:一抗反射層,適用於降低一太陽能電池的反射率,其中該抗反射層為一奈米複層結構薄膜或一奈米複合結構薄膜;一彩色硬質層,配置於該反射層上,該彩色硬質層具有一高硬度性質之材質且產生一色彩,其中該彩色硬質層為具四分之一波長之奇數倍厚度的薄膜的堆疊結構;以及一消波層,配置於該彩色硬質層上,以增加該抗反射層的一抗反射效果並提高一反射光的色彩純度,其中該消波層為一奈米複層結構或一奈米複合結構。 A multilayer film structure having high light transmittance, high hardness and color, comprising: an anti-reflection layer suitable for reducing the reflectivity of a solar cell, wherein the anti-reflection layer is a nano-layered structure film or a nano composite a color thin layer disposed on the reflective layer, the colored hard layer having a high hardness property and producing a color, wherein the colored hard layer is a film having an odd multiple thickness of a quarter wavelength a stacking structure; and a wave absorbing layer disposed on the color hard layer to increase an anti-reflective effect of the anti-reflective layer and improve the color purity of a reflected light, wherein the wave-eliminating layer is a nano-layered structure Or a nano composite structure. 如請求項1所述的具有高透光、高硬度及彩色的多層膜結構,其中該高硬度之材質為氮化鋁、氮氧化鋁、氧化鋁、氧化矽、氮氧化矽、氮化矽、二氧化鈦中之其中之二或其組合,該彩色硬質層的厚度介於300奈米至1200奈米之間,且該彩色硬質層的硬度為10GPa至30GPa之間,該彩色硬質層的薄膜可見光的折射率範圍介於1.3至2.8之間。 The multilayer film structure having high light transmittance, high hardness and color as described in claim 1, wherein the high hardness material is aluminum nitride, aluminum oxynitride, aluminum oxide, cerium oxide, cerium oxynitride, cerium nitride, 2 or 2 of the titanium dioxide, the color hard layer has a thickness of between 300 nm and 1200 nm, and the color hard layer has a hardness of between 10 GPa and 30 GPa, and the color hard layer of the film is visible. The refractive index ranges from 1.3 to 2.8. 如請求項1所述的具有高透光、高硬度及彩色的多層膜結構,其中該抗反射層的厚度介於40奈米至150奈米之間,該抗反射層的硬度介於8GPa至18GPa之間。 The multilayer film structure having high light transmittance, high hardness and color as claimed in claim 1, wherein the antireflection layer has a thickness of between 40 nm and 150 nm, and the antireflection layer has a hardness of 8 GPa to Between 18GPa. 如請求項3所述的具有高透光、高硬度及彩色的多層膜結構,其中該抗反射層的材料為氮化鋁、氮氧化鋁、氧化鋁、氧化矽、氮氧化矽、氮化矽、二氧化鈦中之其中之一或其組合。 The multilayer film structure having high light transmittance, high hardness and color as claimed in claim 3, wherein the antireflection layer is made of aluminum nitride, aluminum oxynitride, aluminum oxide, hafnium oxide, hafnium oxynitride or tantalum nitride. One or a combination of titanium dioxide. 如請求項3所述的具有高透光、高硬度及彩色的多層膜結構,其中該奈米複層結構薄膜的可見光折射率範圍介於1.5至2.3之間,而該奈米複合結構薄膜的可見光折射率範圍介於1.3至2.8之間。 The multilayer film structure having high light transmittance, high hardness and color as claimed in claim 3, wherein the nano-multilayer structure film has a visible light refractive index ranging from 1.5 to 2.3, and the nano composite structure film The visible light refractive index ranges from 1.3 to 2.8. 如請求項1所述的具有高透光、高硬度及彩色的多層膜結構,其中該消波層的厚度介於20奈米至100奈米,該消波層的硬度介於8GPa至18GPa。 The multilayer film structure having high light transmittance, high hardness and color as claimed in claim 1, wherein the thickness of the wave-eliminating layer is between 20 nm and 100 nm, and the hardness of the wave-eliminating layer is between 8 GPa and 18 GPa. 如請求項6所述的具有高透光、高硬度及彩色的多層膜結構,其中該消波層的材料為氮化鋁、氮氧化鋁、氧化鋁、氧化矽、氮氧化矽、氮化矽、二氧化鈦中之其中之一或其組合。 The multilayer film structure having high light transmittance, high hardness and color as described in claim 6, wherein the material of the wave absorbing layer is aluminum nitride, aluminum oxynitride, aluminum oxide, cerium oxide, cerium oxynitride or cerium nitride. One or a combination of titanium dioxide. 如請求項6所述的具有高透光、高硬度及彩色的多層膜結構,其中該奈米複層結構薄膜的可見光折射率範圍介於1.5至2.3之間,而該奈米複合結構薄膜的可見光折射率範圍介於1.3至2.8之間。 The multilayer film structure having high light transmittance, high hardness and color as claimed in claim 6, wherein the nano-multilayer structure film has a visible light refractive index ranging from 1.5 to 2.3, and the nano composite structure film The visible light refractive index ranges from 1.3 to 2.8. 如請求項1所述的具有高透光、高硬度及彩色的多層膜結構,更包括:一透明基板,配置於該消波層上,其中該透明基板的可見光的折射率範圍介於1.4至1.8之間。 The multilayer film structure having high light transmittance, high hardness and color as described in claim 1, further comprising: a transparent substrate disposed on the wave absorbing layer, wherein the visible light of the transparent substrate has a refractive index ranging from 1.4 to Between 1.8.
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TW201431812A (en) * 2013-02-08 2014-08-16 Corning Inc Articles with anti-reflective high-hardness coatings and related methods
TW201516448A (en) * 2013-09-13 2015-05-01 Corning Inc Scratch-resistant articles with retained optical properties
TW201518114A (en) * 2013-09-13 2015-05-16 Corning Inc Low-color scratch-resistant articles with a multilayer optical film

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TW201431812A (en) * 2013-02-08 2014-08-16 Corning Inc Articles with anti-reflective high-hardness coatings and related methods
TW201516448A (en) * 2013-09-13 2015-05-01 Corning Inc Scratch-resistant articles with retained optical properties
TW201518114A (en) * 2013-09-13 2015-05-16 Corning Inc Low-color scratch-resistant articles with a multilayer optical film

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