TWI595255B - Calibrated system of laser meter - Google Patents
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- TWI595255B TWI595255B TW104112648A TW104112648A TWI595255B TW I595255 B TWI595255 B TW I595255B TW 104112648 A TW104112648 A TW 104112648A TW 104112648 A TW104112648 A TW 104112648A TW I595255 B TWI595255 B TW I595255B
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Description
本發明是有關於一種鐳射尺校準系統,特別是一種可校準鐳射尺之光路徑偏差的鐳射尺校準系統。 The present invention relates to a laser calibration system, and more particularly to a laser calibration system that calibrates the optical path deviation of a laser scale.
鐳射測距裝置產品在出貨前皆須進行發射光路徑及接收光路徑的平行度調整,以及接收模組的調焦。因發射光路徑及接收光路徑的偏差程度和調焦的好壞會直接影響鐳射信號的品質,進而降低量測的精準度等性能。 The laser distance measuring device must adjust the parallelism of the transmitted light path and the received light path before the shipment, and the focusing of the receiving module. Due to the degree of deviation of the emitted light path and the received light path and the quality of the focus, the quality of the laser signal is directly affected, thereby reducing the accuracy of the measurement and the like.
因此,確實有必要對鐳射測距裝置尋求較佳的發射光路徑、接收光路徑及調焦方案。 Therefore, it is indeed necessary to find a better emission light path, a receiving light path and a focusing scheme for the laser ranging device.
有鑑於此,本發明提出一種可有效校準光路徑的鐳射尺校準系統。 In view of this, the present invention provides a laser calibration system that can effectively calibrate the optical path.
根據本發明所提出的一種鐳射尺校準系統,包括一基座、一光發射模組及一光接收模組。基座具有一軸孔、一沉孔及一容置空間,軸孔與沉孔相連通,且沉孔的孔徑大於軸孔的孔徑。光發射模組設置於沉孔內,且光發射模組以一弧形表面抵接於軸孔與沉孔之間的一接口,使光發射模組可全周式旋轉。光接 收模組則設置於容置空間內。 A laser scale calibration system according to the present invention includes a base, a light emitting module and a light receiving module. The base has a shaft hole, a counterbore and an accommodating space, and the shaft hole communicates with the counterbore, and the hole diameter of the counterbore is larger than the hole diameter of the shaft hole. The light emitting module is disposed in the counterbore, and the light emitting module abuts the interface between the shaft hole and the counterbore with an arc surface, so that the light emitting module can rotate all the way. Light connection The receiving module is set in the accommodating space.
根據本發明又提出的一種鐳射尺校準系統,其包括一基座、一光發射模組、一光接收模組及一光反射元件。基座具有一軸孔、一沉孔及一容置空間,軸孔與沉孔相連通;光發射模組設置於沉孔內,並發射一光束;光接收模組設置於容置空間內,接收自外部反射之光束;以及,光反射元件設置於一第二光軸上。其中,光束藉由光反射元件的位移,使自外部反射之光束的一光斑投射於光接收模組的一預設範圍內。 According to another aspect of the present invention, a laser calibration system includes a base, a light emitting module, a light receiving module, and a light reflecting component. The pedestal has a shaft hole, a counterbore and an accommodating space, and the shaft hole is connected with the counterbore; the light emitting module is disposed in the counterbore and emits a light beam; the light receiving module is disposed in the accommodating space and receives a light beam reflected from the outside; and the light reflecting element is disposed on a second optical axis. The light beam is projected by a displacement of the light reflecting element to project a spot of the light beam reflected from the outside into a predetermined range of the light receiving module.
根據本發明又提出的一種鐳射尺校準系統,其包括一基座、一光發射模組、一光接收模組及一光反射元件。基座具有一軸孔、一沉孔及一容置空間,軸孔與沉孔相連通;光發射模組設置於沉孔內,並發射一光束,該光束於一第一光軸上行進;光接收模組設置於容置空間內,接收於一第二光軸上行進之光束;以及,光反射元件設置於第二光軸上。其中,藉由光發射模組的旋轉,使第一光軸與第二光軸平行,且藉由光反射元件的位移,使光束的一光斑投射於光接收模組的一預設範圍內。 According to another aspect of the present invention, a laser calibration system includes a base, a light emitting module, a light receiving module, and a light reflecting component. The pedestal has a shaft hole, a counterbore and an accommodating space, and the shaft hole communicates with the counterbore; the light emitting module is disposed in the counterbore and emits a light beam, and the light beam travels on a first optical axis; The receiving module is disposed in the accommodating space and receives the light beam traveling on a second optical axis; and the light reflecting component is disposed on the second optical axis. The first optical axis is parallel to the second optical axis by the rotation of the light emitting module, and a light spot of the light beam is projected into a predetermined range of the light receiving module by displacement of the light reflecting component.
其中沉孔的孔徑大於軸孔的孔徑,且光發射模組以一弧形表面抵接於軸孔與沉孔之間的一接口。 The aperture of the counterbore is larger than the aperture of the shaft hole, and the light emitting module abuts the interface between the shaft hole and the counterbore with an arc surface.
其中光發射模組可全周式旋轉地抵接於接口。 The light emitting module can be rotated to abut the interface in a full-circle manner.
鐳射尺校準系統可更包括一調節部,調節部使光反射元件於一反射面的法線方向上位移。 The laser calibration system may further include an adjustment portion that displaces the light reflecting element in a normal direction of a reflecting surface.
鐳射尺校準系統可更包括一透鏡,其中透鏡、光反 射元件及光接收模組沿第二光軸排列 The laser calibration system can further include a lens in which the lens and the light are reversed The shooting element and the light receiving module are arranged along the second optical axis
其中光發射模組可包括一鐳射發光二極體,光接收模組可包括一崩潰光二極體。 The light emitting module may include a laser light emitting diode, and the light receiving module may include a crash light diode.
為了對本發明之上述及其他方面有更佳的瞭解,下文特舉實施例,並配合所附圖式,作詳細說明如下: In order to provide a better understanding of the above and other aspects of the present invention, the following detailed description of the embodiments and the accompanying drawings
100‧‧‧鐳射尺校準系統 100‧‧‧Laser ruler calibration system
10‧‧‧本體 10‧‧‧ Ontology
12‧‧‧夾持部 12‧‧‧Clamping Department
14‧‧‧承載部 14‧‧‧Loading Department
16‧‧‧調節部 16‧‧‧Regulatory Department
20‧‧‧基座 20‧‧‧ Pedestal
22‧‧‧軸孔 22‧‧‧Axis hole
24‧‧‧容置空間 24‧‧‧ accommodating space
26‧‧‧沉孔 26‧‧‧ counterbore
30‧‧‧光發射模組 30‧‧‧Light emitting module
40‧‧‧光接收模組 40‧‧‧Light receiving module
50‧‧‧透鏡 50‧‧‧ lens
60‧‧‧光反射元件 60‧‧‧Light reflecting elements
70‧‧‧電路板 70‧‧‧ boards
80‧‧‧電性連接埠 80‧‧‧Electrical connection埠
X1‧‧‧第一光軸 X1‧‧‧first optical axis
X2‧‧‧第二光軸 X2‧‧‧second optical axis
S210、S220、S230‧‧‧步驟 S210, S220, S230‧‧‧ steps
第1圖繪示本發明一實施例之一鐳射尺校準系統的示意圖。 FIG. 1 is a schematic diagram of a laser calibration system according to an embodiment of the invention.
第2圖繪示本發明鐳射尺校準系統之一基座的示意圖。 Figure 2 is a schematic illustration of one of the pedestals of the laser scale calibration system of the present invention.
第3圖繪示第1圖之鐳射尺校準系統的等效結構示意圖。 FIG. 3 is a schematic diagram showing the equivalent structure of the laser calibration system of FIG. 1.
第4圖繪示本發明一實施例之一光路徑校準方法的流程圖。 FIG. 4 is a flow chart showing a method for calibrating an optical path according to an embodiment of the present invention.
請同時參閱第1圖及第2圖,本實施例所提出的鐳射尺校準系統100主要包括一本體10、一基座20、一光發射模組30、一光接收模組40、一透鏡50、一光反射元件60、一電路板70及一電性連接埠80。其中,本體10用於容納其他元件;基座20可容置光發射模組30及光接收模組40;光發射模組30可朝一目標物發射一光束;光接收模組40可接收自目標物所反射的光束;透鏡50可使光束匯聚;光反射元件60可使光束改變行進方向;電路板70可承載鐳射尺校準系統100,並藉由電性連接埠80與外部裝置(未繪示)電性連接。 Please refer to FIG. 1 and FIG. 2 simultaneously. The laser calibration system 100 of the present embodiment mainly includes a body 10, a base 20, a light emitting module 30, a light receiving module 40, and a lens 50. A light reflecting element 60, a circuit board 70 and an electrical connection port 80. The body 10 is configured to receive other components; the base 20 can accommodate the light emitting module 30 and the light receiving module 40; the light emitting module 30 can emit a light beam toward a target; and the light receiving module 40 can receive the target. The light beam reflected by the object; the lens 50 can converge the light beam; the light reflecting element 60 can change the traveling direction of the light beam; the circuit board 70 can carry the laser scale calibration system 100, and is electrically connected to the external device (not shown) ) Electrical connection.
當光發射模組30朝外部的目標物發射光束時,會先 在光反射元件60的一反射面上發生反射,其後穿透透鏡50並射向目標物;接著,當光束經目標物反射後,會先穿透透鏡50再經光反射元件60產生反射後,由光接收模組40接收。 When the light emitting module 30 emits a light beam toward an external target, it will first Reflection occurs on a reflective surface of the light reflecting element 60, and then passes through the lens 50 and is directed toward the target; then, after the light beam is reflected by the target, it passes through the lens 50 and is reflected by the light reflecting element 60. Received by the light receiving module 40.
此外,本體10具有一夾持部12、一承載部14及一調節部16。具體而言,光反射元件60係藉由夾持部12夾持於本體10上,且光反射元件60的反射面可承靠在承載部14上,而調節部16則用於調節光反射元件60的位置,使光反射元件60在反射面的法線方向上位移,意即光反射元件60沿反射面的法線方向前/後移動,進而使自目標物反射的光束經由光反射元件60產生反射後,對焦於光接收模組40。再者,由於採用了光反射元件60,使得光接收模組40的電路板(未繪示)可與本體10的電路板70整合在一起,進而簡化鐳射尺校準系統100的整體結構。 In addition, the body 10 has a clamping portion 12, a carrying portion 14 and an adjusting portion 16. Specifically, the light reflecting element 60 is clamped on the body 10 by the clamping portion 12, and the reflecting surface of the light reflecting element 60 can bear on the carrying portion 14, and the adjusting portion 16 is used to adjust the light reflecting element. The position of 60 causes the light reflecting element 60 to be displaced in the normal direction of the reflecting surface, that is, the light reflecting element 60 moves forward/backward along the normal direction of the reflecting surface, thereby causing the light beam reflected from the target to pass through the light reflecting element 60. After the reflection is generated, the light is received by the light receiving module 40. Moreover, since the light reflecting component 60 is used, the circuit board (not shown) of the light receiving module 40 can be integrated with the circuit board 70 of the body 10, thereby simplifying the overall structure of the laser calibration system 100.
如第2圖所示,基座20包括一軸孔22、一容置空間24及一沉孔26。其中,光發射模組30設置於沉孔26內,光接收模組40設置於容置空間24內。 As shown in FIG. 2, the base 20 includes a shaft hole 22, an accommodating space 24, and a counterbore 26. The light emitting module 30 is disposed in the counterbore 26 , and the light receiving module 40 is disposed in the receiving space 24 .
具體而言,沉孔26的孔徑大於軸孔22的孔徑,因此,光發射模組30的一弧形表面可抵接於軸孔22與沉孔26之間的一接口處。其中,光發射模組30的弧形表面可以是一圓弧形球面。於本實施例中,光發射模組30係藉由圓弧形球面以可全周式地旋轉的方式緊配合於接口處。 Specifically, the aperture of the counterbore 26 is larger than the aperture of the shaft hole 22, and therefore, an arcuate surface of the light emitting module 30 can abut against an interface between the shaft hole 22 and the counterbore 26. The curved surface of the light emitting module 30 may be a circular arc surface. In this embodiment, the light-emitting module 30 is tightly fitted to the interface by a circular arc-shaped spherical surface that can be rotated all the way.
第3圖繪示第1圖之鐳射尺校準系統100的等效結 構示意圖。其中,由於光反射元件60的主要功用是使光束改變行進方向,因此,為了簡化並便於說明,於第3圖中省略了光反射元件60,但不用以限制本發明。 Figure 3 is a diagram showing the equivalent of the laser scale calibration system 100 of Figure 1. Schematic diagram. Here, since the main function of the light reflecting element 60 is to change the traveling direction of the light beam, the light reflecting element 60 is omitted in Fig. 3 for the sake of simplicity and convenience of explanation, but the invention is not limited thereto.
同時參照第1圖、第2圖及第3圖,沉孔26與軸孔22相連通,並由光發射模組30發射光束。其中,光束自光發射模組30射出後,其所行進的方向即是一第一光軸X1方向,具體而言,若光發射模組30於接口處進行全周式地旋轉,則會改變光束的行進方向,意即改變第一光軸X1的方向。換言之,可藉由旋轉光發射模組30而改變第一光軸X1的方向;而容置空間24則設置在由透鏡50、光反射元件60及光接收模組40所構成的一第二光軸X2上。簡言之,設置於沉孔26的光發射模組30同時也等同於設置在第一光軸X1上,而設置於容置空間24的光接收模組40則是設置在第二光軸X2上。 Referring also to FIGS. 1 , 2 , and 3 , the counterbore 26 communicates with the shaft hole 22 and emits a light beam by the light emitting module 30 . Wherein, after the light beam is emitted from the light emitting module 30, the direction in which the light beam travels is a first optical axis X1 direction. Specifically, if the light emitting module 30 rotates at the interface for full-circle rotation, it will change. The direction of travel of the beam means to change the direction of the first optical axis X1. In other words, the direction of the first optical axis X1 can be changed by rotating the light emitting module 30; and the accommodating space 24 is disposed at a second light formed by the lens 50, the light reflecting element 60, and the light receiving module 40. On axis X2. In short, the light-emitting module 30 disposed on the counterbore 26 is also disposed on the first optical axis X1, and the light-receiving module 40 disposed in the accommodating space 24 is disposed on the second optical axis X2. on.
另一方面,由於光發射模組30藉由其圓弧形球面可全周式旋轉地抵接於接口,因而第一光軸X1的方向改變時,第二光軸X2也會隨之連動。意即,當光發射模組30旋轉時,會改變光束行進的方向(即,第一光軸X1的方向),進而使自目標物反射之光束的行進方向(即,第二光軸X2的方向)改變。 On the other hand, since the light-emitting module 30 can be rotated all the way to the interface by its circular arc-shaped spherical surface, the second optical axis X2 is also interlocked when the direction of the first optical axis X1 is changed. That is, when the light emitting module 30 rotates, the direction in which the light beam travels (ie, the direction of the first optical axis X1) is changed, thereby causing the traveling direction of the light beam reflected from the target (ie, the second optical axis X2). Direction) change.
於一實施例中,光發射模組30包括一光發射元件,其中光發射元件可採用一鐳射發光二極體;光接收模組40包括一光接收元件,其中光接收元件可採用一崩潰光二極體;透鏡50可為一接收大鏡片;光反射元件60包括一光反射鏡;而光發射 模組30所發射之光束及光接收模組40所接收之光束則可以是一鐳射光。 In one embodiment, the light emitting module 30 includes a light emitting component, wherein the light emitting component can employ a laser emitting diode; the light receiving module 40 includes a light receiving component, wherein the light receiving component can employ a collapse light. Polar body; lens 50 can be a receiving large lens; light reflecting element 60 includes a light reflecting mirror; and light emission The light beam emitted by the module 30 and the light beam received by the light receiving module 40 may be a laser light.
第4圖繪示本發明一實施例之一光路徑校準方法的流程圖。須先說明的是,第4圖所揭示的光路徑校準方法可應用於第1圖的鐳射尺校準系統100,故而以下僅以第1圖所揭示之鐳射尺校準系統100做說明,但不用以限制本發明。 FIG. 4 is a flow chart showing a method for calibrating an optical path according to an embodiment of the present invention. It should be noted that the optical path calibration method disclosed in FIG. 4 can be applied to the laser calibration system 100 of FIG. 1, and therefore, only the laser calibration system 100 disclosed in FIG. 1 will be described below, but it is not necessary to Limit the invention.
同時參照第1圖、第2圖及第4圖,鐳射尺校準系統100的光發射模組30位於第一光軸X1上,光接收模組40及透鏡50則位於第二光軸X2上,校準時,須使第一光軸X1及第二光軸X2互相平行,並且使光束的一光斑投射於光接收模組40的一預設範圍內,以使光接收模組40接收到最強的光能量。 Referring to FIG. 1 , FIG. 2 and FIG. 4 , the light emitting module 30 of the laser calibration system 100 is located on the first optical axis X1 , and the light receiving module 40 and the lens 50 are located on the second optical axis X2 . During calibration, the first optical axis X1 and the second optical axis X2 are parallel to each other, and a spot of the light beam is projected into a predetermined range of the light receiving module 40, so that the light receiving module 40 receives the strongest. Light energy.
於步驟S210中,利用光發射模組30發射光束。藉此,由光發射模組30所發出的光束射向目標物,並經目標物反射後,穿透透鏡50,其後在光反射元件60的反射面上產生反射。 In step S210, the light beam is emitted by the light emitting module 30. Thereby, the light beam emitted from the light emitting module 30 is directed toward the target object, is reflected by the target object, passes through the lens 50, and then reflects on the reflecting surface of the light reflecting element 60.
於步驟S220中,粗調光發射模組30。於此步驟中,藉由全周式地調整光發射模組30改變光束的發射角度,使第一光軸X1的方向改變,連帶使第二光軸X2的方向改變,以令自目標物反射之光束穿透過透鏡50並經光反射元件60反射後,投射於光接收模組40。 In step S220, the light emitting module 30 is coarsely adjusted. In this step, the direction of the first optical axis X1 is changed by changing the emission angle of the light beam by adjusting the light emitting module 30 in a full-circle manner, and the direction of the second optical axis X2 is changed to reflect the target. The light beam passes through the lens 50 and is reflected by the light reflecting element 60, and is projected onto the light receiving module 40.
具體而言,光發射模組30可持續發射光束。並且,由目標物反射之光束會穿透透鏡50,並經由光反射元件60改變光行徑方向。此時,經由光反射元件60反射的光束未必能精準 地投射在光接收模組40上,但可藉由粗調的方式調整光發射模組30,例如是全周式地旋轉光發射模組30,以改變第一光軸X1的方向,於此同時,第二光軸X2的方向亦同步地改變。藉此,即可讓自目標物反射之光束匯聚於光接收模組40上。 In particular, the light emitting module 30 can continuously emit a light beam. Also, the light beam reflected by the target penetrates the lens 50 and changes the direction of the light path via the light reflecting element 60. At this time, the light beam reflected by the light reflecting element 60 may not be accurate. The ground is projected on the light receiving module 40, but the light emitting module 30 can be adjusted by coarse adjustment, for example, the light emitting module 30 is rotated all the way to change the direction of the first optical axis X1. At the same time, the direction of the second optical axis X2 also changes synchronously. Thereby, the light beam reflected from the target can be concentrated on the light receiving module 40.
於步驟S230中,微調光反射元件60。於此步驟中,當確定光束可匯聚於光接收模組40上之後,即可以微調的方式,調整光反射元件60,使光反射元件60於反射面的法線方向上前/後位移,以期光束經光反射元件60產生反射後,可對焦於光接收模組40,使光束的一光斑投射於光接收模組40的一預設範圍內,以使光接收模組40接收到最強的光能量。具體而言,微調光反射元件60可以是經由調整本體10上的調節部16,使得光反射元件60於反射面的法線方向上前/後位移。 In step S230, the light reflecting element 60 is finely tuned. In this step, after it is determined that the light beam can be concentrated on the light receiving module 40, the light reflecting element 60 can be adjusted in a fine adjustment manner, and the light reflecting element 60 is displaced forward/backward in the normal direction of the reflecting surface, with a view to After the light beam is reflected by the light reflecting element 60, the light receiving module 40 can be focused on the light receiving module 40, so that a light spot of the light beam is projected into a predetermined range of the light receiving module 40, so that the light receiving module 40 receives the strongest light. energy. Specifically, the fine-tuning light reflecting element 60 may be such that the light reflecting element 60 is displaced forward/backward in the normal direction of the reflecting surface via the adjusting portion 16 on the adjusting body 10.
綜上所述,雖然本發明已以實施例揭露如上,然其並非用以限定本發明。本發明所屬技術領域中具有通常知識者,在不脫離本發明之精神和範圍內,當可作各種之更動與潤飾。因此,本發明之保護範圍當視後附之申請專利範圍所界定者為準。 In conclusion, the present invention has been disclosed in the above embodiments, but it is not intended to limit the present invention. A person skilled in the art can make various changes and modifications without departing from the spirit and scope of the invention. Therefore, the scope of the invention is defined by the scope of the appended claims.
10‧‧‧本體 10‧‧‧ Ontology
30‧‧‧光發射模組 30‧‧‧Light emitting module
40‧‧‧光接收模組 40‧‧‧Light receiving module
50‧‧‧透鏡 50‧‧‧ lens
X1‧‧‧第一光軸 X1‧‧‧first optical axis
X2‧‧‧第二光軸 X2‧‧‧second optical axis
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US6751879B1 (en) * | 2002-12-06 | 2004-06-22 | Jian-Hua Pu | Laser meter |
US20040163265A1 (en) * | 2003-02-21 | 2004-08-26 | Helms David B. | Alignment device |
US6823600B1 (en) * | 2002-03-04 | 2004-11-30 | Jason Michael Vaughan | Adjustable fit laser-projecting reference tool |
TWI260403B (en) * | 2004-12-07 | 2006-08-21 | Asia Optical Co Inc | Optical axis adjusting device of laser ruler |
TWI265272B (en) * | 2005-05-25 | 2006-11-01 | Asia Optical Co Inc | Dip laser Doppler scale system and measurement method thereof |
TWI271509B (en) * | 2005-05-25 | 2007-01-21 | Asia Optical Co Inc | Laser doppler scale optical system |
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US6823600B1 (en) * | 2002-03-04 | 2004-11-30 | Jason Michael Vaughan | Adjustable fit laser-projecting reference tool |
US6751879B1 (en) * | 2002-12-06 | 2004-06-22 | Jian-Hua Pu | Laser meter |
US20040163265A1 (en) * | 2003-02-21 | 2004-08-26 | Helms David B. | Alignment device |
TWI260403B (en) * | 2004-12-07 | 2006-08-21 | Asia Optical Co Inc | Optical axis adjusting device of laser ruler |
TWI265272B (en) * | 2005-05-25 | 2006-11-01 | Asia Optical Co Inc | Dip laser Doppler scale system and measurement method thereof |
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