TWI594854B - A glovebox monitoring and control system and its monitoring and control method - Google Patents

A glovebox monitoring and control system and its monitoring and control method Download PDF

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TWI594854B
TWI594854B TW104122437A TW104122437A TWI594854B TW I594854 B TWI594854 B TW I594854B TW 104122437 A TW104122437 A TW 104122437A TW 104122437 A TW104122437 A TW 104122437A TW I594854 B TWI594854 B TW I594854B
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pipe
valve
setting
hydrogen
box
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TW201702035A (en
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Ming-Sen Hu
rong-hua Su
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一種手套箱監測控制系統及其監測控制方法 Glove box monitoring and control system and monitoring and control method thereof

本發明係為一種手套箱監測控制系統及其控制方法,特別是一種針對高真空、可去氧去水之手套箱以全自動監測控制之方法及系統裝置。 The invention relates to a glove box monitoring and control system and a control method thereof, in particular to a method and a system device for fully automatic monitoring and control of a glove box for high vacuum and deoxidizable water removal.

手套箱(glove box),或另稱厭氧操作台,其係為一種可提供無水(H2O)、無氧(O2)、無有機氣體、真空之環境,將高純惰性氣體充入手套箱內,並循環過濾掉其中的活性物質、隔絕外部人員直接接觸的設備,使置於手套箱中之物料得以在隔絕水氣、氧氣與真空之環境中保存、或實驗,並可確保人員可安全的、無接觸的對物料進行實驗、操作。 Glove box, or anaerobic console, which is an environment that provides anhydrous (H 2 O), oxygen-free (O 2 ), organic-free gas, and vacuum, filling high-purity inert gas into the hand. Inside the box, and circulate the active material in it, and isolate the equipment directly in contact with the outside personnel, so that the materials placed in the glove box can be stored in the environment of moisture, oxygen and vacuum, or experiment, and the personnel can be ensured. The material can be tested and operated safely and without contact.

上述之手套箱,主要係由手套箱本體、真空系統、氣體循環交換系統與控制系統所組成,該手套箱本體並設有前艙(或傳遞箱)與隔離手套;藉此,即可提供人員於無水、無氧、真空之環境中利用隔離手套進行作業。 The above glove box is mainly composed of a glove box body, a vacuum system, a gas circulation exchange system and a control system, and the glove box body is provided with a front compartment (or a transfer box) and an isolation glove; thereby, a glove can be provided Use insulated gloves in an anhydrous, oxygen-free, vacuum environment.

惟查,由於習用之手套箱雖具有控制系統,但其係以半自動控制之方式來控制真空系統與氣體循環交換系統,其必須藉由人員逐步啟動、設定參數之方式來操作真空系統或氣體循環交換系統開始作業,使該習用手套箱必須逐步等待下一階段之參數設定完成後才可進行真空或氣體循環交換,而使實驗過程中斷,造成使用、操作上不方便之缺失;另,由 於習用之手套箱僅配備一組氣體循環交換系統,當該氣體循環交換系統中之惰性氣體用罄時,則必須停止作業,待補充或更換惰性氣體後,才可再開始作業,實有操作上不方便之缺失。 However, since the conventional glove box has a control system, it controls the vacuum system and the gas circulation exchange system in a semi-automatic manner. It must operate the vacuum system or gas circulation by gradually starting and setting parameters. The exchange system starts the operation, so that the glove box must wait for the next stage parameter setting to complete the vacuum or gas cycle exchange, and the experiment process is interrupted, resulting in the inconvenience of use and operation; The conventional glove box is only equipped with a set of gas circulation exchange system. When the inert gas in the gas circulation exchange system is used, the operation must be stopped. After the inert gas is added or replaced, the operation can be started again. Inconvenience is missing.

本發明之目的,即在於改善上述之缺失,提供一種可針對高真空、可去氧去水之手套箱以全自動監測控制之方法及系統裝置。 The object of the present invention is to improve the above-mentioned defects, and to provide a method and system device for fully automatic monitoring and control of a glove box for high vacuum and deaerator.

為達到上述目的,本發明之手套箱監測控制方法,包含有如下步驟:選擇監測控制或參數設定:選擇進行監控功能或進行監測參數之設定;選擇監控功能:可選擇進行箱體清除、前廳清除、循環清除再生、儲氫罐清除或氫氣儲存等監控功能;控制參數設定:可供使用者依操作需要設定手套箱監控時之各項控制參數;儀表參數設定:可供設計者依監測需求設定手套箱監控時各項儀表之偵測範圍;箱體清除:用以將手套箱抽真空後再罐充惰性氣體,以快速降低箱體中的水與氧含量,並且反覆多次執行,使手套箱中的水與氧之濃度達到設定之微氧微水濃度。 In order to achieve the above object, the glove box monitoring and control method of the present invention comprises the following steps: selecting monitoring control or parameter setting: selecting to perform monitoring function or setting monitoring parameters; selecting monitoring function: selecting to perform box cleaning, vestibule Monitoring functions such as cleaning, recycling, regeneration, hydrogen storage tank removal or hydrogen storage; control parameter setting: the user can set various control parameters when the glove box is monitored according to the operation requirements; instrument parameter setting: for the designer to monitor the demand Set the detection range of each meter when the glove box is monitored; the box body is cleaned: the glove box is vacuumed and then filled with inert gas to quickly reduce the water and oxygen content in the box, and repeatedly executed repeatedly, so that The concentration of water and oxygen in the glove box reaches the set micro-oxygen water concentration.

前廳清除:用以將手套箱之前廳與相連管路中的空氣抽除,使其達到設定之真空度,並使前廳與箱體達到壓力平衡。 Front hall clearing: It is used to remove the air in the front hall and the connecting pipe of the glove box to achieve the set vacuum and balance the pressure between the front hall and the box.

循環清除再生:利用二套可循環交替之清除裝置進行循環切 換,當其中一清除裝置失去清除能力轉而進行再生作業時,另一清除裝置可接續執行清除作業,使達自動切換以令二清除裝置交替進行循環清除與循環再生,提高手套箱之水氧清除效率。 Cycle-removal regeneration: use two sets of recyclable alternate cleaning devices for cyclic cutting When one of the cleaning devices loses the cleaning ability and then performs the regeneration operation, the other cleaning device can continue to perform the cleaning operation, so that the automatic switching is performed so that the two cleaning devices alternately perform the cycle cleaning and the recycling, thereby improving the water oxygen of the glove box. Clear efficiency.

儲氫罐清除:抽除儲氫罐中之氣體以達設定之真空度,以利後續進行儲放氫氣之作業。 Hydrogen storage tank removal: The gas in the hydrogen storage tank is pumped out to reach the set vacuum degree, so as to facilitate the subsequent operation of storing and releasing hydrogen gas.

氫氣儲存:依設定時間自氫氣源將氫氣輸入手套箱之儲氫罐中,並在儲氫過程中進行氫氣濃度是否過高之檢測。 Hydrogen storage: Hydrogen is introduced into the hydrogen storage tank of the glove box from the hydrogen source according to the set time, and the hydrogen concentration is detected in the hydrogen storage process.

藉由上述步驟,俾提供一種可針對高真空、可去氧去水之手套箱以全自動監測控制之方法。 Through the above steps, the present invention provides a method for fully automatic monitoring and control of a glove box for high vacuum and deaerator dewatering.

10‧‧‧手套箱 10‧‧‧Gift box

11‧‧‧箱體 11‧‧‧ cabinet

12‧‧‧前廳 12‧‧‧ front hall

13‧‧‧排氣管 13‧‧‧Exhaust pipe

14‧‧‧排除裝置 14‧‧‧Exclusion device

15‧‧‧壓力感測器 15‧‧‧ Pressure Sensor

101‧‧‧第一連接管 101‧‧‧First connecting pipe

102‧‧‧第二連接管 102‧‧‧Second connection tube

103‧‧‧第三連接管 103‧‧‧ Third connecting pipe

104‧‧‧第四連接管 104‧‧‧fourth connecting pipe

105‧‧‧第五連接管 105‧‧‧ fifth connecting tube

106‧‧‧第六連接管 106‧‧‧ sixth connecting tube

111‧‧‧平衡閥 111‧‧‧balance valve

112‧‧‧第一補充閥 112‧‧‧First supplementary valve

113‧‧‧第一後閥門 113‧‧‧First rear valve

114‧‧‧第二後閥門 114‧‧‧Second rear valve

115‧‧‧開斷閥 115‧‧‧Opening valve

116‧‧‧第三後閥門 116‧‧‧ third rear valve

20A‧‧‧第一反應槽 20A‧‧‧First reaction tank

20B‧‧‧第二反應槽 20B‧‧‧Second reaction tank

201‧‧‧第一循環管 201‧‧‧First cycle tube

202‧‧‧第二循環管 202‧‧‧Second circulation tube

203‧‧‧第三循環管 203‧‧‧ Third cycle tube

204‧‧‧第四循環管 204‧‧‧fourth circulation tube

205‧‧‧第五循環管 205‧‧‧ fifth cycle tube

206‧‧‧第六循環管 206‧‧‧ Sixth circulation tube

207‧‧‧第七循環管 207‧‧‧ seventh cycle tube

208‧‧‧第八循環管 208‧‧‧ eighth cycle tube

211‧‧‧第一入口閥 211‧‧‧First inlet valve

212‧‧‧第二補充閥 212‧‧‧Second supplementary valve

213‧‧‧第一排氣閥 213‧‧‧First exhaust valve

214‧‧‧第一出口閥 214‧‧‧First exit valve

215‧‧‧第二入口閥 215‧‧‧Second inlet valve

216‧‧‧第三補充閥 216‧‧‧ third supplementary valve

217‧‧‧第二排氣閥 217‧‧‧Second exhaust valve

218‧‧‧第二出口閥 218‧‧‧Second outlet valve

22A‧‧‧第一氫氣輸送管 22A‧‧‧First hydrogen delivery tube

22B‧‧‧第二氫氣輸送管 22B‧‧‧Second hydrogen delivery tube

221‧‧‧第一入氣閥 221‧‧‧First inlet valve

222‧‧‧第二入氣閥 222‧‧‧Second inlet valve

30‧‧‧取樣箱 30‧‧‧Sampling box

31‧‧‧銜接管 31‧‧‧Connecting pipe

32‧‧‧第一取樣管 32‧‧‧First sampling tube

321‧‧‧氧氣取樣閥 321‧‧‧Oxygen sampling valve

33‧‧‧氧氣濃度偵測器 33‧‧‧Oxygen concentration detector

34‧‧‧第二取樣管 34‧‧‧Second sampling tube

341‧‧‧水分取樣閥 341‧‧‧Water sampling valve

35‧‧‧水分濃度偵測器 35‧‧‧Water Concentration Detector

40‧‧‧氮氣源 40‧‧‧Nitrogen source

50‧‧‧氫氣源 50‧‧‧ Hydrogen source

60‧‧‧真空泵 60‧‧‧vacuum pump

70‧‧‧循環泵 70‧‧‧Circulating pump

80‧‧‧排除裝置 80‧‧‧Exclusion device

90‧‧‧3%氫氣源 90‧‧3% hydrogen source

第1圖係本發明之流程步驟圖。 Figure 1 is a flow diagram of the process of the present invention.

第2圖係本發明設定控制參數之示意圖。 Figure 2 is a schematic illustration of the set control parameters of the present invention.

第3圖係本發明設定儀表參數之示意圖。 Figure 3 is a schematic diagram of the parameters of the instrument set by the present invention.

第4圖係本發明之系統圖。 Figure 4 is a system diagram of the present invention.

第5圖係本發明之系統圖,及前廳清除之動作示意圖(一)。 Figure 5 is a system diagram of the present invention, and a schematic diagram of the action of clearing the front hall (1).

第6圖係本發明之系統圖,及前廳清除之動作示意圖(二)。 Figure 6 is a system diagram of the present invention, and a schematic diagram of the action of clearing the front hall (2).

第7圖係本發明之系統圖,及前廳清除之動作示意圖(三)。 Figure 7 is a system diagram of the present invention, and a schematic diagram of the action of clearing the front hall (3).

第8圖係本發明之系統圖,及箱體清除之動作示意圖(一)。 Figure 8 is a system diagram of the present invention, and a schematic diagram of the operation of the box cleaning (1).

第9圖係本發明之系統圖,及箱體清除之動作示意圖(二)。 Figure 9 is a system diagram of the present invention, and a schematic diagram of the action of the box cleaning (2).

第10圖係本發明之系統圖,及箱體清除之動作示意圖(三)。 Figure 10 is a system diagram of the present invention, and a schematic diagram of the operation of the box cleaning (3).

第11圖係本發明之系統圖,及箱體清除之動作示意圖(四)。 Figure 11 is a system diagram of the present invention, and a schematic diagram of the operation of the box cleaning (4).

第12圖係本發明之系統圖,及氫氣儲存之動作示意圖。 Figure 12 is a system diagram of the present invention, and a schematic diagram of the operation of hydrogen storage.

第13圖係本發明之系統圖,及儲氫罐清除之動作示意圖(一)。 Figure 13 is a system diagram of the present invention, and a schematic diagram of the operation of the hydrogen storage tank removal (1).

第14圖係本發明之系統圖,及儲氫罐清除之動作示意圖(二)。 Figure 14 is a system diagram of the present invention, and a schematic diagram of the operation of the hydrogen storage tank removal (2).

第15圖係本發明之系統圖,及循環再生之動作示意圖(一)。 Figure 15 is a system diagram of the present invention, and a schematic diagram of the operation of the cycle regeneration (1).

第16圖係本發明之系統圖,及循環再生之動作示意圖(二)。 Figure 16 is a system diagram of the present invention, and a schematic diagram of the operation of the cycle regeneration (2).

第17圖係本發明之系統圖,及循環再生之動作示意圖(三)。 Figure 17 is a system diagram of the present invention, and a schematic diagram of the operation of the cycle regeneration (3).

第18圖係本發明之系統圖,及循環再生之動作示意圖(四)。 Figure 18 is a system diagram of the present invention, and a schematic diagram of the operation of the cycle regeneration (4).

第19圖係本發明之系統圖,及循環再生之動作示意圖(五)。 Figure 19 is a system diagram of the present invention, and a schematic diagram of the operation of the cycle regeneration (5).

第20圖係本發明之系統圖,及循環再生之動作示意圖(六)。 Figure 20 is a system diagram of the present invention, and a schematic diagram of the operation of the cycle regeneration (6).

第21圖係本發明之循環清除再生功能之流程步驟圖。 Figure 21 is a flow chart showing the cycle cleaning and regeneration function of the present invention.

有關本發明為達到目的所運用之技術手段及其方法,茲謹再配合第1圖所示之流程圖、第2、3圖之參數設定示意圖、第4圖之系統圖及第5~21圖之監控控制示意圖,詳細說明如下:如第1圖所示之流程圖,本發明之手套箱監控方法,包含有如下步驟:選擇監測控制或參數設定:選擇進行監控功能或進行監測參數之設定。 Regarding the technical means and methods used in the present invention for achieving the purpose, the flow chart shown in FIG. 1 , the parameter setting diagrams of the second and third figures, the system diagram of the fourth figure, and the fifth to twenty-first figures are provided. The schematic diagram of the monitoring control is as follows: As shown in the flowchart of FIG. 1 , the glove box monitoring method of the present invention comprises the following steps: selecting monitoring control or parameter setting: selecting to perform monitoring function or setting monitoring parameters.

選擇監控功能:可選擇進行前廳清除、箱體清除、循環清除再生、儲氫罐清除或氫氣儲存等監控功能。 Select monitoring function: You can choose to perform monitoring functions such as front hall cleaning, cabinet cleaning, cycle cleaning regeneration, hydrogen storage tank removal or hydrogen storage.

控制參數設定:可供使用者依操作需要設定手套箱監測時之各項控制參數,如第2圖所示,包含有箱體清除真空度之設定、箱體清 除次數之設定、前廳清除真空度之設定、前廳平衡閥開啟時間(T1)之設定、清除後閥門關閉時真空泵持續時間(T2)之設定、進行循環清除系統切換之累計工作時間(T3)之設定、再生系統需求溫度之設定、再生系統溫度到達時燃燒氣體進入時間(T4)之設定、再生系統T4到達時清除閥開啟時間(T5)之設定、使循環系統停止工作的水分濃度之設定、使循環系統停止工作的氧氣濃度之設定、循環泵每次工作時間(T6)之設定、循環泵每次休息時間(T7)之設定、偵測真空泵壓力前之等待時間(T8)之設定、儲氫罐加壓時間(T9)之設定。 Control parameter setting: Users can set various control parameters when the glove box is monitored according to the operation requirements. As shown in Figure 2, it includes the setting of the vacuum removal degree of the box and the box clearing. The setting of the number of times, the setting of the vacuum in the front hall, the setting of the front door balancing valve opening time (T1), the setting of the vacuum pump duration (T2) when the valve is closed after clearing, and the cumulative working time of the cycle clearing system switching (T3) The setting of the regeneration system, the setting of the regeneration system demand temperature, the setting of the combustion gas entry time (T4) when the regeneration system temperature arrives, the setting of the purge valve opening time (T5) when the regeneration system T4 arrives, and the water concentration at which the circulation system is stopped. Setting, setting the oxygen concentration for stopping the circulation system, setting the circulating pump per working time (T6), setting the rest time of the circulating pump (T7), and setting the waiting time (T8) before detecting the vacuum pump pressure The setting of the hydrogen storage tank pressurization time (T9).

儀表參數設定:可供設計者依監測需求設定手套箱各監測儀表之偵測參數範圍,如第3圖所示,包含有第一清除系統溫度感測範圍之設定、第二清除系統溫度感測範圍之設定、手套箱內部溫度感測範圍之設定、初級濕度感測範圍之設定、低濕度感測範圍之設定、低氧濃度感測範圍之設定、真空泵真空壓力感測範圍之設定及氫氣爆炸指數感測範圍之設定。 Instrument parameter setting: The designer can set the detection parameter range of each monitoring instrument of the glove box according to the monitoring requirements. As shown in Fig. 3, it includes the setting of the temperature sensing range of the first cleaning system and the temperature sensing of the second cleaning system. Range setting, setting of temperature sensing range inside glove box, setting of primary humidity sensing range, setting of low humidity sensing range, setting of low oxygen concentration sensing range, setting of vacuum pump vacuum pressure sensing range and hydrogen explosion The setting of the index sensing range.

承上述,較佳之實施例是,如第1圖所示該儀表參數設定步驟進一步包含有密碼檢查之步驟,其進入時需輸入密碼,確認密碼正確後始可進行儀表參數設定之步驟,若密碼錯誤回到監測控制或參數設定選擇之步驟。 In the above preferred embodiment, the meter parameter setting step further includes the step of password checking as shown in FIG. 1 , and the password is required to enter, and the step of setting the meter parameter can be performed after confirming the password is correct. The error returns to the step of monitoring control or parameter setting selection.

箱體清除:用以將手套箱抽真空後再罐充惰性氣體,以快速降低箱體中的水與氧含量,並且反覆多次執行,使手套箱中的水與氧之濃度達到設定之微氧微水濃度。 Box cleaning: used to vacuum the glove box and then fill the tank with inert gas to quickly reduce the water and oxygen content in the box, and repeatedly perform multiple times, so that the concentration of water and oxygen in the glove box is set to a minimum. Oxygen micro water concentration.

前廳清除:用以將手套箱之前廳與相連管路中的空氣抽除, 使其達到設定之真空度,並使前廳與箱體達到壓力平衡。 Front hall clearing: used to remove air from the front hall of the glove box and the connected pipes. Make it reach the set vacuum and balance the pressure between the front hall and the cabinet.

循環清除再生:利用二套可循環交替之清除裝置進行循環切換,當其中一清除裝置失去清除能力轉而進行再生作業時,另一清除裝置可接續執行清除作業,使達自動切換以令二清除裝置交替進行循環清除與循環再生,提高手套箱之水氧清除效率。 Cycle clearing and recycling: Two sets of recyclable alternate cleaning devices are used for cyclic switching. When one of the cleaning devices loses the cleaning ability and then performs the regeneration operation, the other cleaning device can continue to perform the cleaning operation, so that the automatic switching can be performed to clear the two. The device alternately performs cycle cleaning and circulation regeneration to improve the water oxygen removal efficiency of the glove box.

儲氫罐清除:抽除儲氫罐中之氣體以達設定之真空度,以利後續進行儲放氫氣之作業。 Hydrogen storage tank removal: The gas in the hydrogen storage tank is pumped out to reach the set vacuum degree, so as to facilitate the subsequent operation of storing and releasing hydrogen gas.

氫氣儲存:依設定時間自氫氣源將氫氣輸入手套箱之儲氫罐中,並在儲氫過程中進行氫氣濃度是否過高之檢測。 Hydrogen storage: Hydrogen is introduced into the hydrogen storage tank of the glove box from the hydrogen source according to the set time, and the hydrogen concentration is detected in the hydrogen storage process.

如第4圖所示之系統圖,本發明之手套箱控制系統,包含有一手套箱本體10、第一反應槽20A、第二反應槽20B與一取樣箱30;其中:手套箱本體10(請參閱第4圖所示),係為一密閉之箱體11,箱體一側設有前廳(傳遞箱)12,箱體11與前廳(傳遞箱)12間設有一第一連接管101,該連接管101上並設有平衡閥111;箱體11藉由一第二連接管102與氮氣源40連接,該第二連接管102上並設有第一補充閥112;又,箱體11與前廳(傳遞箱)12間設有一第三連接管103,該第三連接管103上設有第一後閥門113與第二後閥門114;該箱體10內設有第一儲氫罐11A與第二儲氫罐11B,令該第一儲氫罐11A與第二儲氫罐11B係利用第四連接管104與一氫氣源50及一真空泵60連接,該第四連接管104於氫氣源50與第一儲氫罐11A、第二儲氫罐11B間設有一開斷閥115,該第四連接管104於真空泵60與第一儲氫罐11A、第二儲氫罐11B間另設有一第三後閥門116,同時,該第三連接管103與第四連接管104間設有一第五連接管105, 該第五連接管105恰對應設於第三連接管103之第一後閥門113與第二後閥門114間,並對應設於第四連接管104之第三後閥門116與真空泵60間,且該真空泵60並連接有一排放管13,排放管13另一端與排除裝置14連接;再,該箱體11連接有一第六連接管106,該第六連接管106另一端連接有一循環泵70。 As shown in FIG. 4, the glove box control system of the present invention comprises a glove box body 10, a first reaction tank 20A, a second reaction tank 20B and a sampling box 30; wherein: the glove box body 10 (please Referring to FIG. 4, it is a sealed box 11 having a front hall (transfer box) 12 on one side of the box, and a first connecting tube 101 between the box 11 and the front hall (transport box) 12. The connecting pipe 101 is provided with a balancing valve 111; the casing 11 is connected to the nitrogen source 40 by a second connecting pipe 102, and the second connecting pipe 102 is provided with a first supplementary valve 112; A third connecting pipe 103 is disposed between the 11 and the front hall (transmission box). The third connecting pipe 103 is provided with a first rear valve 113 and a second rear valve 114. The first hydrogen storage body is disposed in the casing 10. The tank 11A and the second hydrogen storage tank 11B are connected to the first hydrogen storage tank 11A and the second hydrogen storage tank 11B by a fourth connecting pipe 104, and a hydrogen source 50 and a vacuum pump 60. The fourth connecting pipe 104 is connected to A shut-off valve 115 is disposed between the hydrogen source 50 and the first hydrogen storage tank 11A and the second hydrogen storage tank 11B. The fourth connecting pipe 104 is between the vacuum pump 60 and the first hydrogen storage tank 11A and the second hydrogen storage tank 11B. After the valve 116 has a third, at the same time, the third connecting pipe 103 and the fourth connecting tube 104 is provided between a fifth connecting tube 105, The fifth connecting pipe 105 is disposed between the first rear valve 113 and the second rear valve 114 of the third connecting pipe 103, and correspondingly disposed between the third rear valve 116 of the fourth connecting pipe 104 and the vacuum pump 60, and The vacuum pump 60 is connected to a discharge pipe 13 . The other end of the discharge pipe 13 is connected to the discharge device 14 . Further, the casing 11 is connected to a sixth connecting pipe 106 . The other end of the sixth connecting pipe 106 is connected to a circulation pump 70 .

承上述,較佳之實施例是,該箱體11連接設有一壓力指示器15,該壓力指示器15得以顯示箱體11內之正壓是否充足。 In the above preferred embodiment, the casing 11 is connected to a pressure indicator 15 which indicates whether the positive pressure in the casing 11 is sufficient.

第一反應槽20A(請參閱第4圖所示),係用以反應吸附箱體10中之水分與氧氣,該第一反應槽20A利用第一循環管201與循環泵70連接,該循環泵70並藉由第六連接管106與箱體11連接,該第一循環管201上設有一第一入口閥211;又,該第一反應槽20A設有第二循環管202,該第二循環管202係與氮氣源40連接,且第二循環管202上設有第二補充閥212;再,該第一反應槽20A設有第三循環管203,該第三循環管203係連接有還原氣排除裝置80,第三循環管203上設有第一排氣閥213;另,該第一反應槽20A並藉由第四循環管204與取樣箱30連接,該第四循環管204上並設有一第一出口閥214;又,該第二循環管202並連接有第一氫氣輸送管22A,該第一氫氣輸送管22A係連接有3%氫氣源90,且該第一氫氣輸送管22A上並設有第一入氣閥221。 The first reaction tank 20A (see FIG. 4) is for reacting moisture and oxygen in the adsorption tank 10, and the first reaction tank 20A is connected to the circulation pump 70 by the first circulation pipe 201, and the circulation pump 70 is connected to the tank 11 by a sixth connecting pipe 106. The first circulating pipe 201 is provided with a first inlet valve 211. Further, the first reaction tank 20A is provided with a second circulating pipe 202. The second cycle The tube 202 is connected to the nitrogen source 40, and the second circulation tube 202 is provided with a second supplementary valve 212. Further, the first reaction tank 20A is provided with a third circulation tube 203, and the third circulation tube 203 is connected and restored. a gas exhausting device 80, a third exhaust pipe 203 is provided with a first exhaust valve 213; in addition, the first reaction tank 20A is connected to the sampling tank 30 by a fourth circulation pipe 204, and the fourth circulating pipe 204 is connected A first outlet valve 214 is provided; further, the second circulation pipe 202 is connected to the first hydrogen delivery pipe 22A, the first hydrogen delivery pipe 22A is connected with a 3% hydrogen source 90, and the first hydrogen delivery pipe 22A A first inlet valve 221 is provided on the upper side.

第二反應槽20B(請參閱第4圖所示),係用以反應吸附箱體10中之水分與氧氣,該第二反應槽20B利用第五循環管205與循環泵70連接,該第五循環管205上設有一第二入口閥215;又,該第二反應槽20B設有第六循環管206,該第六循環管206係與氮氣源40連接,且第六循環 管206上設有第三補充閥216;再,該第二反應槽20B設有第七循環管207,該第七循環管207係連接有還原氣排除裝置80,第七循環管207上設有第二排氣閥217;另,該第二反應槽20B並藉由第八循環管208與取樣箱30連接,該第八循環管208上並設有一第二出口閥218;又,該第六循環管206並連接有第二氫氣輸送管22B,該第二氫氣輸送管22B係連接有3%氫氣源90,且該第二氫氣輸送管22B上並設有第二入氣閥222。 The second reaction tank 20B (see FIG. 4) is for reacting moisture and oxygen in the adsorption tank 10, and the second reaction tank 20B is connected to the circulation pump 70 by the fifth circulation pipe 205, the fifth A second inlet valve 215 is disposed on the circulation pipe 205; further, the second reaction tank 20B is provided with a sixth circulation pipe 206 connected to the nitrogen source 40, and the sixth cycle The tube 206 is provided with a third supplemental valve 216; further, the second reaction tank 20B is provided with a seventh circulation pipe 207, and the seventh circulation pipe 207 is connected with a reducing gas removing device 80, and the seventh circulating pipe 207 is provided with a second exhaust valve 217; in addition, the second reaction tank 20B is connected to the sampling box 30 by an eighth circulation pipe 208, and a second outlet valve 218 is disposed on the eighth circulation pipe 208; The circulation pipe 206 is connected to a second hydrogen delivery pipe 22B. The second hydrogen delivery pipe 22B is connected with a 3% hydrogen source 90, and the second hydrogen delivery pipe 22B is provided with a second inlet valve 222.

取樣箱30(請參閱第4圖所示),係與第一反應槽20A及第二反應槽20B連接,且該取樣箱30並藉由一銜接管31與箱體11連接;又,該取樣箱30藉由第一取樣管32連接一氧氣濃度偵測器33,該取樣箱30並藉由第二取樣管34連接一水分濃度偵測器35,該第一取樣管32與第二取樣管34上分別設有一氧氣取樣閥321、水分取樣閥341。 The sampling box 30 (refer to FIG. 4) is connected to the first reaction tank 20A and the second reaction tank 20B, and the sampling box 30 is connected to the tank 11 by a connecting pipe 31; The tank 30 is connected to an oxygen concentration detector 33 via a first sampling tube 32. The sampling box 30 is connected to a moisture concentration detector 35 via a second sampling tube 34. The first sampling tube 32 and the second sampling tube are connected. An oxygen sampling valve 321 and a moisture sampling valve 341 are respectively disposed on the 34.

較佳之實施例是,該第二循環管202與第六循環管206可經銜接一輸氣管209形成一三通管,該輸氣管209係與氮氣源40連接,令第二補充閥212與第三補充閥216得控制氮氣源40中氮氣之輸入控制。 In a preferred embodiment, the second circulation pipe 202 and the sixth circulation pipe 206 can be connected to a gas pipe 209 to form a three-way pipe. The gas pipe 209 is connected to the nitrogen source 40, so that the second supplementary valve 212 and the second The three supplemental valves 216 are controlled to control the input of nitrogen in the nitrogen source 40.

藉由上述裝置,本系統依控制方法,包含有前廳清除、箱體清除、循環清除再生、儲氫罐清除與氫氣儲存之功能,其中: With the above device, the system includes the functions of vestibular cleaning, tank cleaning, circulation cleaning, hydrogen storage tank removal and hydrogen storage according to the control method, wherein:

(一)前廳清除:當選擇前廳清除功能後,該第二後閥門114會開啟並啟動真空泵60,利用真空泵60將前廳12內之空氣經第三連接管103、第二後閥門114、第五連接管105、排放管13至排除裝置14排出(如第5圖所示),使前廳12內部形成真空,待到達前廳平衡閥開啟之設定時間(T1)後,系統即會偵測真空泵60之真空度,藉以判斷前廳12內部之真空度是否已達所設定之前廳清除真空度,當前廳12內部之真空度到達設 定之真空度時,該第二後閥門114關閉且真空泵60持續運作至所設定之持續時間(T2)(如第6圖所示),接著關閉真空泵60並開啟平衡閥111(如第7圖所示),待到達前廳平衡閥開啟之設定時間(T1)後,即完成前廳清除,然後使系統呈待機狀態。 (1) Front hall clearing: When the front hall clearing function is selected, the second rear valve 114 opens and activates the vacuum pump 60, and the air in the front hall 12 is passed through the third connecting pipe 103 and the second rear valve 114 by the vacuum pump 60. The fifth connecting pipe 105, the discharging pipe 13 to the discharging device 14 are discharged (as shown in FIG. 5), and a vacuum is formed inside the front hall 12. After the set time (T1) of the front hall balancing valve is opened, the system will The vacuum degree of the vacuum pump 60 is detected to determine whether the vacuum inside the front hall 12 has reached the vacuum level set in the front hall, and the vacuum degree inside the current hall 12 reaches the setting. When the vacuum is constant, the second rear valve 114 is closed and the vacuum pump 60 is continuously operated for the set duration (T2) (as shown in FIG. 6), then the vacuum pump 60 is turned off and the balancing valve 111 is opened (as shown in FIG. 7). Show), after the set time (T1) of the front hall balance valve is turned on, the front hall is cleared, and then the system is in the standby state.

(二)箱體清除:當選擇箱體清除功能後,開啟第三連接管103之第一後閥門113與真空泵60,同時亦開啟第一入口閥211、第一出口閥214、第二入口閥215、第二出口閥218(如第8圖所示),使箱體11內部形成真空,並將第一循環管201、第四循環管204、第五循環管205與第八循環管208中水分及氧氣清除,待到達偵測真空泵壓力前之等待時間(T8)後,系統開始偵測真空泵60之真空度,此即為箱體11內之真空度者,待箱體11內之真空度到達所設定之箱體清除真空度後,即關閉第一後閥門113且真空泵60持續運作至所設定之持續時間(T2)(如第9圖所示),待真空泵60持續運作之時間(T2)到達後,關閉真空泵60並開啟補充閥112,使氮氣源40內所儲存之氮氣可由第二連接管102匯入箱體11中(如第10圖所示),使箱體11內形成正壓狀態,待箱體11內之正壓達到所需之壓力時,關閉補充閥112停止輸入氮氣,即完成一次箱體清除;當設定箱體清除次數為二次以上時,則重新開始該箱體清除之循環,直至到達所需之次數者;而當完成所設定之清除次數後,該第一入口閥211、第一出口閥214、第二入口閥215、第二出口閥218即會關閉,使系統呈待機狀態,在此同時,本系統並行處理箱體11之正壓監控,當箱體11內之正壓不足時,該壓力指示器15會顯示警告,系統會開啟補充閥212,使氮氣源40中之氮氣得輸入箱體11內使維持正壓狀態(如第11圖所示),待箱體11內之正壓充足時,則 關閉補充閥212以停止氮氣輸入,且壓力指示器15會停止顯示警告。 (2) Box cleaning: When the box cleaning function is selected, the first rear valve 113 of the third connecting pipe 103 and the vacuum pump 60 are opened, and the first inlet valve 211, the first outlet valve 214, and the second inlet valve are also opened. 215, a second outlet valve 218 (as shown in FIG. 8), forming a vacuum inside the casing 11, and the first circulation pipe 201, the fourth circulation pipe 204, the fifth circulation pipe 205 and the eighth circulation pipe 208 After the moisture and oxygen are removed, the system starts to detect the vacuum degree of the vacuum pump 60 after the waiting time (T8) before detecting the pressure of the vacuum pump, which is the vacuum degree in the tank 11, and the degree of vacuum in the tank 11 After the set box clear vacuum is reached, the first rear valve 113 is closed and the vacuum pump 60 is continuously operated for the set duration (T2) (as shown in FIG. 9), and the vacuum pump 60 is continuously operated (T2). After the arrival, the vacuum pump 60 is turned off and the replenishing valve 112 is turned on, so that the nitrogen stored in the nitrogen source 40 can be remitted into the tank 11 by the second connecting pipe 102 (as shown in FIG. 10), so that the inside of the casing 11 is formed. In the pressure state, when the positive pressure in the tank 11 reaches the required pressure, the supplementary valve 112 is closed to stop the input. Gas, that is, complete the box cleaning; when the number of times of setting the box is more than two, the cycle of the box clearing is restarted until the required number of times is reached; and when the set number of clearing is completed, the The first inlet valve 211, the first outlet valve 214, the second inlet valve 215, and the second outlet valve 218 are closed, so that the system is in a standby state. At the same time, the system processes the positive pressure monitoring of the tank 11 in parallel. When the positive pressure in the casing 11 is insufficient, the pressure indicator 15 will display a warning, and the system will open the supplementary valve 212 to allow the nitrogen in the nitrogen source 40 to be input into the casing 11 to maintain a positive pressure state (as shown in FIG. 11). Show), when the positive pressure in the tank 11 is sufficient, then The makeup valve 212 is closed to stop the nitrogen input, and the pressure indicator 15 stops displaying the warning.

(三)氫氣儲存:當選擇氫氣儲存功能時,如第12圖所示,該開斷閥115會開啟,使氫氣源50之氫氣得以由第四連接管104輸入箱體11中之第一儲氫罐11A與第二儲氫罐11B中並開始計時,待到達所設定儲氫罐加壓時間(T9)後,關閉開斷閥115停止氫氣輸入,即完成第一儲氫罐11A與第二儲氫罐11B之儲氫作業,然後使系統呈待機狀態。 (3) Hydrogen storage: When the hydrogen storage function is selected, as shown in Fig. 12, the breaking valve 115 is opened, so that the hydrogen of the hydrogen source 50 can be input into the first storage in the tank 11 by the fourth connecting pipe 104. The hydrogen tank 11A and the second hydrogen storage tank 11B start to count, and after reaching the set hydrogen storage tank pressurization time (T9), the opening and closing valve 115 is closed to stop the hydrogen input, that is, the first hydrogen storage tank 11A and the second are completed. The hydrogen storage operation of the hydrogen storage tank 11B, and then the system is in a standby state.

(四)儲氫罐清除:當選擇該儲氫罐清除功能後,如第13圖所示,開啟該第三後閥門116及真空泵60,令真空泵60將留存於第一儲氫罐11A與第二儲氫罐11B中之氫氣經第四連接管104、排放管13至排除裝置14排除,待到達偵測真空泵壓力前之等待時間(T8)後,系統即偵測真空泵60之壓力以判別箱體11內之真空度,當箱體11內之真空度到達所設定之箱體真空度後,第三後閥門116關閉且真空泵60持續運作至所設定之持續時間(T2)(如第14圖所示),待真空泵60持續運作之時間到達後,關閉真空泵60,即可將第一儲氫罐11A、第二儲氫罐11B中氫氣排除,完成儲氫罐清除作業者。 (4) Hydrogen storage tank removal: When the hydrogen storage tank removal function is selected, as shown in Fig. 13, the third rear valve 116 and the vacuum pump 60 are opened, so that the vacuum pump 60 will remain in the first hydrogen storage tank 11A and the first The hydrogen in the second hydrogen storage tank 11B is removed through the fourth connecting pipe 104 and the discharging pipe 13 to the removing device 14. After the waiting time (T8) before the pressure of the vacuum pump is detected, the system detects the pressure of the vacuum pump 60 to determine the box. The degree of vacuum in the body 11 is such that after the vacuum in the tank 11 reaches the set tank vacuum, the third rear valve 116 is closed and the vacuum pump 60 continues to operate for the set duration (T2) (Fig. 14). As shown in the figure, after the time when the vacuum pump 60 continues to operate, the vacuum pump 60 is turned off, and the hydrogen in the first hydrogen storage tank 11A and the second hydrogen storage tank 11B can be eliminated to complete the hydrogen storage tank cleaning operation.

(五)循環清除再生:由於本系統具有第一反應槽20A、第二反應槽20B,當選擇循環清除再生功能時,系統會先以第一反應槽20A執行循環清除作業,其會開啟第一入口閥211、第一出口閥214、取樣箱30與氧氣濃度偵測器33、水分濃度偵測器35連接之氧氣取樣閥321及水分取樣閥341(如第15圖所示),並啟動循環泵70,令箱體11內之水分及氧氣藉由循環泵70之抽引而經第六連接管106、第一循環管201由第一反應槽20A吸附,以清除箱體11內及第六連接管106、第一循環管201中之氧氣與 水分,同時,當到達所設定循環泵70每次工作時間(T6)後,關閉循環泵70、第一入口閥211、第一出口閥214、氧氣取樣閥321及水分取樣閥341,並開始計時,待到達循環泵70每次休息時間(T7)後,本系統即藉由氧氣濃度偵測器33、水分濃度偵測器35偵測第一取樣管32、第二取樣管34之氧氣濃度、水分濃度(如第16圖所示)。若氧氣濃度、水分濃度皆已到達循環系統停止工作之設定濃度後,該第一反應槽20A即完成清除作業;而若氧氣濃度、水分濃度尚未達設定濃度時,須再一次重新開始第一反應槽20A之循環清除作業,待氧氣濃度與水分濃度皆到達設定值後,始完成清除作業,然後使系統呈待機狀態。而當經過多次循環,且已到達進行循環清除系統切換之累計工作時間(T3),該氧氣濃度、水分濃度仍一直未達所設定之濃度時,其表示第一反應槽20A中的藥劑已用罄而無法再提供清除功能,此時,本系統將會啟動第二反應槽20B進行循環清除作業,令第一反應槽20A進入循環再生作業。 (5) Cycle cleaning and regeneration: Since the system has the first reaction tank 20A and the second reaction tank 20B, when the cycle clearing regeneration function is selected, the system first performs the cycle clearing operation with the first reaction tank 20A, which will open the first The inlet valve 211, the first outlet valve 214, the sampling tank 30 and the oxygen concentration detector 33, the oxygen concentration detector 35 connected to the oxygen sampling valve 321 and the moisture sampling valve 341 (as shown in Fig. 15), and start the cycle The pump 70 causes the moisture and oxygen in the tank 11 to be sucked by the circulation pump 70 through the sixth connecting pipe 106 and the first circulating pipe 201 to be adsorbed by the first reaction tank 20A to remove the inside of the casing 11 and the sixth. Connecting tube 106, oxygen in first circulation tube 201 and Moisture, at the same time, when the set circulating pump 70 reaches the working time (T6), the circulation pump 70, the first inlet valve 211, the first outlet valve 214, the oxygen sampling valve 321 and the moisture sampling valve 341 are closed, and the timing is started. After the circulator pump 70 reaches the rest time (T7), the system detects the oxygen concentration of the first sampling tube 32 and the second sampling tube 34 by the oxygen concentration detector 33 and the moisture concentration detector 35. Water concentration (as shown in Figure 16). If the oxygen concentration and the water concentration have reached the set concentration at which the circulation system stops working, the first reaction tank 20A completes the cleaning operation; and if the oxygen concentration and the water concentration have not reached the set concentration, the first reaction must be restarted again. The cycle cleaning operation of the tank 20A, after the oxygen concentration and the water concentration reach the set value, the cleaning operation is completed, and then the system is put into a standby state. And after a plurality of cycles, and has reached the cumulative working time (T3) for performing the cycle clearing system switching, the oxygen concentration and the water concentration still fail to reach the set concentration, which indicates that the agent in the first reaction tank 20A has The cleaning function can no longer be provided by the crucible. At this time, the system will start the second reaction tank 20B for the circulation cleaning operation, and the first reaction tank 20A enters the recycling operation.

當第二反應槽20B進入循環清除作業時,如第17圖所示,其會開啟第二入口閥215、第二出口閥218、取樣箱30與氧氣濃度偵測器33、水分濃度偵測器35連接之氧氣取樣閥321及水分取樣閥341,並啟動循環泵70,令箱體11內之水分及氧氣藉由循環泵70之抽引而經第六連接管106、第五循環管205由第二反應槽20B吸附,以清除箱體11內及第六連接管106、第五循環管205中之氧氣與水分;當到達所設定循環泵70每次工作時間(T6)後,關閉循環泵70、第二入口閥215、第二出口閥218、氧氣取樣閥321及水分取樣閥341,並開始計時,待到達循環泵70每次休息時間(T7)後,本系統即藉由氧氣濃度偵測器33、水分濃度偵測器35偵 測第一取樣管32、第二取樣管34之氧氣濃度、水分濃度(如第18圖所示),當氧氣濃度與水分濃度皆到達循環系統停止工作之設定濃度後,該第二反應槽20B即完成清除作業,然後使系統呈待機狀態。 When the second reaction tank 20B enters the circulation cleaning operation, as shown in FIG. 17, it opens the second inlet valve 215, the second outlet valve 218, the sampling tank 30 and the oxygen concentration detector 33, and the moisture concentration detector. 35 connected oxygen sampling valve 321 and moisture sampling valve 341, and start circulating pump 70, so that the moisture and oxygen in the tank 11 are drawn by the circulating pump 70 through the sixth connecting pipe 106 and the fifth circulating pipe 205 The second reaction tank 20B is adsorbed to remove oxygen and moisture in the tank 11 and the sixth connecting pipe 106 and the fifth circulating pipe 205; when the set circulating pump 70 reaches the working time (T6), the circulating pump is turned off. 70, the second inlet valve 215, the second outlet valve 218, the oxygen sampling valve 321 and the moisture sampling valve 341, and start timing, until the circulation pump 70 reaches the rest time (T7), the system is detected by oxygen concentration Detector 33, water concentration detector 35 The oxygen concentration and the water concentration of the first sampling tube 32 and the second sampling tube 34 are measured (as shown in FIG. 18), and the second reaction tank 20B is obtained when both the oxygen concentration and the water concentration reach the set concentration at which the circulation system stops operating. That is, the cleanup job is completed and the system is put into standby.

於該第二反應槽20B進行清除作業之同時,第一反應槽20A進入循環再生作業,系統會對第一反應槽20A開始再生加熱至所設定之再生溫度,當到達所設定之溫度時,開啟第一入氣閥221與第一排氣閥213,使3%氫氣源90中的3%氫氣經第一氫氣輸送管22A、第一入氣閥221進入第一反應槽20A中以再生其清除藥劑,並將第一反應槽20A中還原之廢氣經由第三循環管203、第一排氣閥213排出(如第19圖所示),並開始計時,當計時到再生系統溫度到達時之燃燒氣體進入時間(T4)後,關閉第一入氣閥221停止輸入3%氫氣,開啟第二補充閥212,引入氮氣源40之氮氣進入第一反應槽20A,將第一反應槽20A中之氧氣與水分由第三循環管203經第一排氣閥213排出並開始計時,待到達再生系統T4到達時清除閥之開啟時間(T5)後,關閉第一排氣閥213與第二補充閥212,即完成第一反應槽20A之循環再生作業,此時系統之循環清除作業仍以第二反應槽20B進行。 While the second reaction tank 20B is performing the cleaning operation, the first reaction tank 20A enters the recycling operation, and the system starts the regeneration and heating of the first reaction tank 20A to the set regeneration temperature, and when the set temperature is reached, the system is turned on. The first inlet valve 221 and the first exhaust valve 213 allow 3% of the hydrogen in the 3% hydrogen source 90 to enter the first reaction tank 20A through the first hydrogen delivery pipe 22A and the first inlet valve 221 to regenerate the purge. The medicament, and the exhaust gas reduced in the first reaction tank 20A is discharged through the third circulation pipe 203 and the first exhaust valve 213 (as shown in FIG. 19), and starts timing, and when the temperature reaches the regeneration system, the combustion is started. After the gas entering time (T4), the first inlet valve 221 is closed to stop the input of 3% hydrogen, the second supplemental valve 212 is opened, and the nitrogen gas introduced into the nitrogen source 40 enters the first reaction tank 20A, and the oxygen in the first reaction tank 20A is taken. And the moisture is discharged from the third circulation pipe 203 through the first exhaust valve 213 and starts counting. After the regeneration valve T4 reaches the opening time (T5) of the purge valve, the first exhaust valve 213 and the second supplementary valve 212 are closed. , that is, the recycling operation of the first reaction tank 20A is completed, When the purge cycle system is still operating the second reaction vessel and 20B.

而當第二應槽20B經過多次循環,且已到達進行循環清除系統切換之累計工作時間(T3),該氧氣濃度、水分濃度仍一直未達所設定之濃度時,其表示第二反應槽20B中的藥劑已用罄而無法再提供清除功能,此時,本系統將會啟動第一反應槽20A開始進行循環清除作業,令第二反應槽20B進入循環再生作業;接著系統即會對第二反應槽20B開始再生加熱至所設定之再生溫度,當到達所設定之溫度時,開啟第二入氣閥222與 第二排氣閥217,使3%氫氣源90中的3%氫氣經第二氫氣輸送管22B、第二入氣閥222進入第二反應槽20B中以再生其清除藥劑,並將第二反應槽20B中還原之廢氣經由第七循環管207、第二排氣閥217排出(如第20圖所示),並開始計時,當計時到再生系統溫度到達時之燃燒氣體進入時間(T4)後,關閉第二入氣閥222停止輸入3%氫氣,開啟第三補充閥216,引入氮氣源40之氮氣進入第二反應槽20B,將第二反應槽20B中之氧氣與水分由第七循環管207經第二排氣閥217排出並開始計時,待到達再生系統T4到達時清除閥之開啟時間(T5)後,關閉第二排氣閥217與第三補充閥216,即完成第二反應槽20B之循環再生作業,此時系統之循環清除作業仍以第一反應槽20A進行;因此,藉由設置有第一反應槽20A與第二反應槽20B,其可於其中一反應槽之藥劑用罄時,由另一反應槽進行清除作業,而藥劑用罄之反應槽則可同時進行循環再生作業以補充清除藥劑,完全不影響清除作業之進行。 When the second tank 20B has undergone a plurality of cycles and has reached the cumulative working time (T3) for performing the cycle clearing system switching, the oxygen concentration and the water concentration still fail to reach the set concentration, which indicates the second reaction tank. The medicament in 20B has been used and the cleaning function can no longer be provided. At this time, the system will start the first reaction tank 20A to start the circulation cleaning operation, so that the second reaction tank 20B enters the recycling operation; The second reaction tank 20B starts to regenerate and heat to the set regeneration temperature, and when the set temperature is reached, the second inlet valve 222 is opened. The second exhaust valve 217 causes 3% of the hydrogen in the 3% hydrogen source 90 to enter the second reaction tank 20B through the second hydrogen delivery tube 22B and the second inlet valve 222 to regenerate the scavenging agent and the second reaction. The reduced exhaust gas in the tank 20B is discharged through the seventh circulation pipe 207 and the second exhaust valve 217 (as shown in Fig. 20), and starts timing, when the combustion gas entering time (T4) is reached when the temperature of the regeneration system reaches the timing. The second inlet valve 222 is closed to stop the input of 3% hydrogen, the third supplemental valve 216 is opened, the nitrogen gas introduced into the nitrogen source 40 is introduced into the second reaction tank 20B, and the oxygen and moisture in the second reaction tank 20B are taken from the seventh circulation tube. 207 is discharged through the second exhaust valve 217 and starts timing. After the regeneration valve T4 reaches the opening time (T5) of the purge valve, the second exhaust valve 217 and the third supplemental valve 216 are closed, that is, the second reaction tank is completed. The recycling operation of 20B, at this time, the circulation cleaning operation of the system is still performed in the first reaction tank 20A; therefore, by providing the first reaction tank 20A and the second reaction tank 20B, it can be used for the reagent of one of the reaction tanks. When 罄, the cleaning operation is carried out by another reaction tank, and the medicinal agent is used for 清除Grooves can be simultaneously recycled to supplement the clear job agents, do not affect the operation of the cleanup.

如第21圖所示,其係本發明循環清除再生功能之流程圖,當啟動循環清除再生功能時,該第一反應槽20A執行循環清除作業,第一反應槽20A工作時間T6後,第一反應槽20A即進入休息時間T7,接著偵測水及氧之濃度是否已達設定值,若已達到設定值,該第一反應槽20A即完成清除作業並結束;當水及氧之濃度未達設定值時,則計算是否已達工作時間T3,若未達到工作時間T3,則重新進行第一反應槽20A之循環清除作業,若已達到工作時間T3,該水及氧之濃度仍未到達設定值,則代表第一反應槽20A中的藥劑已用罄而無法再提供清除功能;此時,該第一反應槽20A即進入再生階段,該第一反應槽20A即開始加熱至設定溫度,接著 引入3%氫氣以再生清除藥劑達T4時間後,接著引入氮氣進入以排除氧氣及水分達T5時間後,該第一反應槽20A即再生完成並進入待命狀態。 As shown in Fig. 21, it is a flow chart of the cycle clearing regeneration function of the present invention. When the cycle clearing regeneration function is started, the first reaction tank 20A performs a cycle cleaning operation, and after the first reaction tank 20A is operated for a time T6, the first The reaction tank 20A enters the rest time T7, and then detects whether the concentration of water and oxygen has reached the set value. If the set value has been reached, the first reaction tank 20A completes the cleaning operation and ends; when the concentration of water and oxygen is not reached When the set value is set, it is calculated whether the working time T3 has been reached. If the working time T3 is not reached, the cycle clearing operation of the first reaction tank 20A is resumed. If the working time T3 has been reached, the concentration of the water and oxygen has not yet reached the setting. The value indicates that the agent in the first reaction tank 20A has been used to provide a cleaning function; at this time, the first reaction tank 20A enters the regeneration stage, and the first reaction tank 20A starts heating to the set temperature, and then After the introduction of 3% hydrogen to regenerate the scavenging agent for T4 time, and then introducing nitrogen gas to remove oxygen and moisture for T5 time, the first reaction tank 20A is regenerated and enters a standby state.

同時,當第一反應槽20A進入再生階段時,該第二反應槽20B即同步啟動清除作業,當第二反應槽20B工作時間T6後,第二反應槽20B即進入休息時間T7,接著偵測水及氧之濃度是否已達設定值,若已達到設定值,該第二反應槽20B即完成清除作業並結束;當水及氧之濃度未達設定值時,則計算是否已達工作時間T3,若未達到工作時間T3,則重新進行第二反應槽20B之循環清除作業,若已達到工作時間T3,該水及氧之濃度仍未到達設定值,則代表第二反應槽20B中的藥劑已用罄而無法再提供清除功能;此時,該第二反應槽20B即進入再生階段,該第二反應槽20B即開始加熱至設定溫度,接著引入3%氫氣以再生清除藥劑達T4時間後,接著引入氮氣進入以排除氧氣及水分達T5時間後,該第二反應槽20B即再生完成並進入待命狀態;於此同時,該當第二反應槽20B進入再生階段時,該第一反應槽20A即同步開始進行清除作業者。 Meanwhile, when the first reaction tank 20A enters the regeneration stage, the second reaction tank 20B synchronously starts the cleaning operation. When the second reaction tank 20B is operated for the time T6, the second reaction tank 20B enters the rest time T7, and then detects. Whether the concentration of water and oxygen has reached the set value, if the set value has been reached, the second reaction tank 20B completes the cleaning operation and ends; when the concentration of water and oxygen does not reach the set value, it is calculated whether the working time T3 has been reached. If the working time T3 is not reached, the cycle cleaning operation of the second reaction tank 20B is resumed. If the working time T3 has been reached, and the concentration of the water and oxygen has not reached the set value, the agent in the second reaction tank 20B is represented. The cleaning function has been used and the cleaning function can no longer be provided; at this time, the second reaction tank 20B enters the regeneration stage, and the second reaction tank 20B starts heating to the set temperature, and then 3% hydrogen is introduced to regenerate the cleaning agent for T4 time. Then, after introducing nitrogen gas to remove oxygen and moisture for T5, the second reaction tank 20B is regenerated and enters a standby state; at the same time, when the second reaction tank 20B enters the regeneration stage, the The first reaction tank 20A is synchronized to start the cleaning operation.

由是,從以上所述可知,本發明具有如下之優點: From the above, it can be seen that the present invention has the following advantages:

(一)本發明藉由預先設定各項控制參數、儀表參數,並結合手套箱體、反應槽與取樣箱,使人員可簡單透過電腦操作、控制而成全自動化之手套箱控制系統,而不需逐次啟動、設定參數才可進行下一作業,實具有操作、使用上之方便性。 (1) The invention realizes the fully automated glove box control system by simply setting various control parameters, instrument parameters, and combining the glove box, the reaction tank and the sampling box, so that the person can simply operate and control through the computer without The next operation can be performed by starting and setting the parameters one by one, which has the convenience of operation and use.

(二)由於本發明設置有二反應槽,該二反應槽各自與循環泵、取樣箱、氮氣源、3%氫氣源連接,使形成二循環系統,當某一反應槽內之清除藥劑用罄時,即可啟動另一反應槽作清除作業,而不致使清除作 業中斷,實有使用上之方便性與實用性者。 (2) Since the present invention is provided with two reaction tanks, each of the two reaction tanks is connected with a circulation pump, a sampling tank, a nitrogen source, and a 3% hydrogen source to form a two-cycle system, and a cleaning agent in a reaction tank is used. At the same time, another reaction tank can be started for the cleaning operation without causing the removal The industry is interrupted, and it is practical and practical.

(三)又,由於本發明設置有二反應槽,該二反應槽各自與循環泵、取樣箱、氮氣源、3%氫氣源連接,使形成二循環系統,當某一反應槽內之清除藥劑用罄時,即可啟動另一反應槽作清除作業,且令藥劑用罄之反應槽進入循環再生,以補充清除藥劑,實有使用上之方便性與實用性者。 (3) Further, since the present invention is provided with two reaction tanks, each of the two reaction tanks is connected with a circulation pump, a sampling tank, a nitrogen source, and a 3% hydrogen source to form a two-cycle system, and a cleaning agent in a reaction tank When the crucible is used, another reaction tank can be started for the cleaning operation, and the reagent is used for the recycling of the reaction tank to replenish the decontamination agent, which is convenient for use and practicality.

(四)再,由於本發明可利用真空泵60將箱體11與前廳12內抽成真空,使箱體11與前廳12形成高真空狀態,而藉由循環泵70可將箱體11內之氧氣與水分抽引至反應槽清除,使箱體11內達去氧去水之效果,實具有使用上之方便性與實用性者。 (4) Further, since the vacuum pump 60 can be used to vacuum the casing 11 and the front hall 12, the casing 11 and the front hall 12 are in a high vacuum state, and the casing 11 can be used in the casing 11 by the circulation pump 70. The oxygen and water are pumped to the reaction tank to be removed, so that the effect of deoxidizing and dewatering in the tank 11 is achieved, and the utility model has the convenience and practicability of use.

(五)另,由於本系統於作業時,可同時監測箱體11內是否為正壓狀態,當正壓不足時,系統即控制氮氣源40輸入氮氣以維持箱體11內之正壓狀態,而不需以人員監測之方式來補充氮氣,實具有作業上之方便與實用者。 (5) In addition, since the system can monitor the positive pressure state in the tank 11 at the same time during operation, when the positive pressure is insufficient, the system controls the nitrogen source 40 to input nitrogen gas to maintain the positive pressure state in the tank 11 . It does not need to be supplemented with nitrogen by means of personnel monitoring, which is convenient and practical for operation.

因此,本發明確具有顯著之進步性,且其方法確為未曾有過,誠已符合發明專利要件,爰依法提出專利申請,並祈賜專利為禱,至感德便。 Therefore, the present invention does have significant progress, and its method is indeed unprecedented. Cheng has already complied with the patent requirements of the invention, and has filed a patent application according to law, and prayed for a patent as a prayer.

以上所述,僅為本發明用以說明之可行實施例,因此並不能以其限制本發明之保護範圍,舉凡熟習此技藝者依本發明說明書及申請專利範圍所為之均等變化或修飾,皆應仍屬本發明所涵蓋之保護範圍。 The above descriptions are merely illustrative of the possible embodiments of the present invention, and thus the scope of the present invention should not be construed as limiting the scope of the present invention. It is still within the scope of protection covered by the present invention.

Claims (7)

一種手套箱監測控制方法,包含有如下步驟:選擇監測控制或參數設定:選擇進行監控功能或進行監測參數之設定;選擇監控功能:可選擇進行箱體清除、前廳清除、循環清除再生、儲氫罐清除或氫氣儲存等監控功能;控制參數設定:可供使用者依操作需要設定手套箱監控時之各項控制參數;儀表參數設定:可供設計者依監測需求設定手套箱監控時各項儀表之偵測範圍;箱體清除:用以將手套箱抽真空後再罐充惰性氣體,以快速降低箱體中的水與氧含量,並且反覆多次執行,使手套箱中的水與氧之濃度達到設定之微氧微水濃度。前廳清除:用以將手套箱之前廳與相連管路中的空氣使其達到設定之真空度,並使前廳與箱體達到壓力平衡。循環清除再生:利用二套可循環交替之清除裝置進行循環切換,當其中一清除裝置失去清除能力而需再生時,另一清除裝置可接續執行清除作業,使達自動切換以令二清除裝置交替進行循環清除與循環再生,提高手套箱之水氧清除效率。儲氫罐清除:抽除儲氫罐中之氣體以達設定之真空度,以利後續進行儲放氫氣之作業。氫氣儲存:依設定時間自氫氣源將氫氣輸入手套箱之儲氫罐中,並在儲 氫過程中進行氫氣濃度是否過高之檢測。藉由上述步驟,俾提供一種可針對高真空、可去氧去水之手套箱以全自動監測控制之方法。 A glove box monitoring and control method comprises the following steps: selecting monitoring control or parameter setting: selecting a monitoring function or setting a monitoring parameter; selecting a monitoring function: selecting a box cleaning, a front hall clearing, a cycle clearing regeneration, and a storage Monitoring functions such as hydrogen tank removal or hydrogen storage; control parameter setting: Users can set various control parameters when glove box is monitored according to operation needs; Instrument parameter setting: It can be used by designers to set glove box monitoring according to monitoring requirements. Detection range of the instrument; box cleaning: used to vacuum the glove box and then fill the tank with inert gas to quickly reduce the water and oxygen content in the box, and repeatedly perform multiple times to make the water and oxygen in the glove box The concentration reaches the set micro-oxygen water concentration. Front hall clearing: used to bring the air in the front hall of the glove box and the connected pipeline to a set vacuum, and to achieve pressure balance between the front hall and the cabinet. Cycle clearing and recycling: two sets of recyclable alternate devices are used for cyclic switching. When one of the clearing devices loses the clearing capacity and needs to be regenerated, the other clearing device can continue to perform the clearing operation, so that the automatic switching is performed to make the two clearing devices alternate. Cycle cleaning and recycling are carried out to improve the water oxygen removal efficiency of the glove box. Hydrogen storage tank removal: The gas in the hydrogen storage tank is pumped out to reach the set vacuum degree, so as to facilitate the subsequent operation of storing and releasing hydrogen gas. Hydrogen storage: hydrogen is introduced into the hydrogen tank of the glove box from the hydrogen source according to the set time, and is stored in the hydrogen storage tank. The hydrogen concentration is detected during the hydrogen process. Through the above steps, the present invention provides a method for fully automatic monitoring and control of a glove box for high vacuum and deaerator dewatering. 如申請專利範圍第1項所述之手套箱監測控制方法,其中該控制參數設定包含有箱體清除真空度之設定、箱體清除次數之設定、前廳清除真空度之設定、前廳平衡閥開啟時間(T1)之設定、清除後閥門關閉時真空泵持續時間(T2)之設定、進行循環清除系統切換之累計工作時間(T3)之設定、再生系統需求溫度之設定、再生系統溫度到達時燃燒氣體進入時間(T4)之設定、再生系統T4到達時清除閥開啟時間(T5)之設定、使循環系統停止工作的水分濃度之設定、使循環系統停止工作的氧氣濃度之設定、循環泵每次工作時間(T6)之設定、循環泵每次休息時間(T7)之設定、偵測真空泵壓力前之等待時間(T8)之設定、儲氫罐加壓時間(T9)之設定。 The glove box monitoring and control method according to claim 1, wherein the control parameter setting includes setting of a vacuum degree of the box, setting of the number of times of cleaning the cabinet, setting of the vacuum of the front hall, and balancing valve of the front hall. The setting of the opening time (T1), the setting of the vacuum pump duration (T2) when the valve is closed, the setting of the cumulative working time (T3) for switching the system to be cleared by the cycle, the setting of the required temperature of the regeneration system, and the combustion of the temperature of the regeneration system. The setting of the gas entry time (T4), the setting of the purge valve opening time (T5) when the regeneration system T4 arrives, the setting of the water concentration for stopping the circulation system, the setting of the oxygen concentration for stopping the circulation system, and the circulation pump each time. The setting of the working time (T6), the setting of the rest time (T7) of the circulation pump, the setting of the waiting time (T8) before detecting the pressure of the vacuum pump, and the setting of the hydrogen storage tank pressing time (T9). 如申請專利範圍第1項所述之手套箱監測控制方法,其中該儀表參數設定包含有第一清除系統溫故感測範圍之設定、第二清除系統溫度感測範圍之設定、手套箱內部溫度感測範圍之設定、初級濕度感測範圍之設定、低濕度感測範圍之設定、低氧濃度感測範圍之設定、真空泵真空壓力感測範圍之設定及氫氣爆炸指數感測範圍之設定。 The glove box monitoring and control method according to claim 1, wherein the meter parameter setting includes a first cleaning system temperature sensing range setting, a second cleaning system temperature sensing range setting, and a glove box internal temperature. The setting of the sensing range, the setting of the primary humidity sensing range, the setting of the low humidity sensing range, the setting of the low oxygen concentration sensing range, the setting of the vacuum pump vacuum pressure sensing range, and the setting of the hydrogen explosion index sensing range. 如申請專利範圍第1項所述之手套箱監測控制方法,其中該儀表參數設定進一步包含有輸入密碼檢查之步驟。 The glove box monitoring and control method according to claim 1, wherein the meter parameter setting further comprises the step of inputting a password check. 一種手套箱監測控制系統,係用以執行上述請求項1至4任一項所述之控制方法,包含有一手套箱本體、第一反應槽、第二反應槽與一取樣箱; 其中:手套箱本體,係為一密閉之箱體,箱體一側設有前廳,箱體與前廳間設有一第一連接管,該連接管上並設有平衡閥;箱體藉由一第二連接管與氮氣源連接,該第二連接管上並設有第一補充閥;又,箱體與前廳間設有一第三連接管,該第三連接管上設有第一後閥門與第二後閥門;該箱體內設有第一儲氫罐與第二儲氫罐,令該第一儲氫罐與第二儲氫罐係利用第四連接管與一氫氣源及一真空泵連接,該第四連接管於氫氣源與第一儲氫罐、第二儲氫罐間設有一開斷閥,該第四連接管於真空泵與第一儲氫罐、第二儲氫罐間另設有一第三後閥門,同時,該第三連接管與第四連接管間設有一第五連接管,該第五連接管恰對應設於第三連接管之第一後閥門與第二後閥門間,並對應設於第四連接管之第三後閥門與真空泵間,且該真空泵並連接有一排放管,排放管另一端與排除裝置連接;再,該箱體連接有一第六連接管,該第六連接管另一端連接有一循環泵;第一反應槽,係用以反應吸附箱體中之水分與氧氣,該第一反應槽利用第一循環管與循環泵連接,該循環泵藉由第六連接管與箱體連接,該第一循環管上設有一第一入口閥;又,該第一反應槽設有第二循環管,該第二循環管係與氮氣源連接,且第二循環管上設有第二補充閥;再,該第一反應槽設有第三循環管,該第三循環管係連接有還原氣排除裝置,第三循環管上設有第一排氣閥;另,該第一反應槽並藉由第四循環管與取樣箱連接,該第四循環管上並設有一第一出口閥;又,該第二循環管並連接有第一氫氣輸送管,該第一氫氣輸送管係連接有3%氫氣源,且 該第一氫氣輸送管上並設有第一入氣閥;第二反應槽,係用以反應吸附箱體中之水分與氧氣,該第二反應槽利用第五循環管與循環泵連接,該第五循環管上設有一第二入口閥;又,該第二反應槽設有第六循環管,該第六循環管係與氮氣源連接,且第六循環管上設有第三補充閥;再,該第二反應槽設有第七循環管,該第七循環管係連接有還原氣排除裝置,第七循環管上設有第二排氣閥;另,該第一反應槽並藉由第八循環管與取樣箱連接,該第八循環管上並設有一第二出口閥;又,該第六循環管並連接有第二氫氣輸送管,該第二氫氣輸送管係連接有3%氫氣源,且該第二氫氣輸送管上並設有第二入氣閥;取樣箱,係與第一反應槽及第二反應槽連接,且該取樣箱並藉由一銜接管與箱體連接;又,該取樣箱藉由第一取樣管連接一氧氣濃度偵測器,該取樣箱並藉由第二取樣管連接一水分濃度偵測器,該第一取樣管與第二取樣管上分別設有一氧氣取樣閥、水分取樣閥;藉由上述裝置,俾提供一種高真空、去氧去水之手套箱系統。 A glove box monitoring and control system for performing the control method according to any one of the above claims 1 to 4, comprising a glove box body, a first reaction tank, a second reaction tank and a sampling box; Wherein: the glove box body is a closed box body, and an vestibule is arranged on one side of the box body, and a first connecting tube is arranged between the box body and the front hall, and the balance tube is provided with a balancing valve; a second connecting pipe is connected to the nitrogen source, and the second connecting pipe is provided with a first supplementary valve; further, a third connecting pipe is arranged between the casing and the front hall, and the third connecting pipe is provided with the first rear a valve and a second rear valve; the first hydrogen storage tank and the second hydrogen storage tank are disposed in the tank, so that the first hydrogen storage tank and the second hydrogen storage tank utilize a fourth connecting pipe and a hydrogen source and a vacuum pump Connecting, the fourth connecting pipe is provided with a breaking valve between the hydrogen source and the first hydrogen storage tank and the second hydrogen storage tank, the fourth connecting pipe is between the vacuum pump and the first hydrogen storage tank and the second hydrogen storage tank a third rear valve is disposed, and a fifth connecting pipe is disposed between the third connecting pipe and the fourth connecting pipe, and the fifth connecting pipe corresponds to the first rear valve and the second rear valve disposed in the third connecting pipe And correspondingly disposed between the third rear valve of the fourth connecting pipe and the vacuum pump, and the vacuum pump is connected with a discharge pipe to discharge The other end is connected to the removing device; further, the box is connected with a sixth connecting pipe, and the other end of the sixth connecting pipe is connected with a circulation pump; the first reaction tank is for reacting moisture and oxygen in the adsorption box, The first reaction tank is connected to the circulation pump by using a first circulation pipe, and the circulation pump is connected to the tank by a sixth connecting pipe, and the first circulation pipe is provided with a first inlet valve; further, the first reaction tank is provided with a second circulation pipe, the second circulation pipe is connected to the nitrogen source, and the second circulation pipe is provided with a second supplementary valve; further, the first reaction tank is provided with a third circulation pipe, and the third circulation pipe is connected There is a reducing gas removing device, and a third exhaust pipe is provided with a first exhaust valve; and the first reaction tank is connected to the sampling box by a fourth circulating pipe, and the fourth circulating pipe is provided with a first outlet a valve, and a second hydrogen pipe connected to the first hydrogen pipe, wherein the first hydrogen pipe is connected to a 3% hydrogen source, and a first inlet valve is disposed on the first hydrogen delivery pipe; a second reaction tank is configured to react with moisture and oxygen in the adsorption tank, and the second reaction tank is connected to the circulation pump by using a fifth circulation pipe, The second circulation pipe is provided with a second inlet valve; further, the second reaction tank is provided with a sixth circulation pipe, the sixth circulation pipe is connected with the nitrogen source, and the sixth circulation pipe is provided with a third supplementary valve; Further, the second reaction tank is provided with a seventh circulation pipe, the seventh circulation pipe is connected with a reducing gas removing device, and the seventh circulating pipe is provided with a second exhaust valve; The eighth circulation pipe is connected to the sampling box, and the eighth circulation pipe is provided with a second outlet valve; further, the sixth circulation pipe is connected with the second hydrogen delivery pipe, and the second hydrogen delivery pipe is connected with 3% a hydrogen source, and the second hydrogen delivery pipe is provided with a second inlet valve; the sampling box is connected to the first reaction tank and the second reaction tank, and the sampling box is connected to the tank by a connecting pipe And, the sampling box is connected to an oxygen concentration detector by the first sampling tube, and the sampling box is A second sample tube is connected to a moisture concentration detector, and the first sampling tube and the second sampling tube are respectively provided with an oxygen sampling valve and a moisture sampling valve; by the above device, the crucible provides a high vacuum, deoxidizing and dehydrating Glove box system. 如申請專利範圍第5項之一種手套箱之監測控制系統,其中該箱體連接設有一壓力指示器。 A monitoring and control system for a glove box according to claim 5, wherein the box is connected to a pressure indicator. 如申請專利範圍第5項所述之一種手套箱監測控制系統,其中該第二循環管與第六循環管可經銜接一輸氣管形成一三通管,該輸氣管係與氮氣源連接,令第二補充閥與第三補充閥得控制氮氣源中氮氣之輸入控制。 The glove box monitoring and control system of claim 5, wherein the second circulation pipe and the sixth circulation pipe are connected to a gas pipe to form a three-way pipe, and the gas pipe is connected with a nitrogen source, so that The second supplemental valve and the third supplemental valve are controlled to control the input of nitrogen in the nitrogen source.
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Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103337269A (en) * 2013-07-05 2013-10-02 中国原子能科学研究院 Glove box for dry method post processing
CN203973569U (en) * 2014-06-19 2014-12-03 袁洪林 A kind of glove box that can realize automatic control
CN104626209A (en) * 2014-11-19 2015-05-20 威格气体纯化科技(苏州)股份有限公司 Automatic water and oxygen adjustment method for glove box

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103337269A (en) * 2013-07-05 2013-10-02 中国原子能科学研究院 Glove box for dry method post processing
CN203973569U (en) * 2014-06-19 2014-12-03 袁洪林 A kind of glove box that can realize automatic control
CN104626209A (en) * 2014-11-19 2015-05-20 威格气体纯化科技(苏州)股份有限公司 Automatic water and oxygen adjustment method for glove box

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