TWI588430B - Crucible temperature control device - Google Patents

Crucible temperature control device Download PDF

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TWI588430B
TWI588430B TW105136032A TW105136032A TWI588430B TW I588430 B TWI588430 B TW I588430B TW 105136032 A TW105136032 A TW 105136032A TW 105136032 A TW105136032 A TW 105136032A TW I588430 B TWI588430 B TW I588430B
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crucible
control device
temperature control
graphite conductor
graphite
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TW105136032A
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Chinese (zh)
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TW201818037A (en
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Ming June Lin
Wen Chueh Pan
Tsan Tung Chen
Meng Chiuan Yu
Shing Jian Wang
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Nat Chung-Shan Inst Of Science And Tech
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Description

坩鍋溫控裝置 Shabu-shabu temperature control device

本發明係關於一種線性蒸鍍技術,特別係指一種可調控坩鍋加熱溫度之坩鍋溫控裝置。 The invention relates to a linear evaporation technology, in particular to a crucible temperature control device capable of regulating the heating temperature of a crucible.

現行蒸鍍裝置常使用石墨作為高溫蒸鍍的加熱素材,將石墨導體以包覆式設置於坩鍋外圍,對該石墨導體通電使其產生熱量、以加熱該坩鍋。石墨導體的加熱溫度可高達1000℃以上,甚至蒸鍍銅元素時加熱溫度更高於1500℃以上,如何準確控制蒸鍍材料蒸發量實乃蒸鍍製程之重要工作。線性蒸鍍源通常是由兩組坩鍋加熱蒸鍍材料,經兩平行設置的噴嘴將蒸氣線性鍍於工件表面,因此越一致之坩鍋加熱元件及蒸鍍材料特性應是均勻蒸鍍必要條件。 In the current vapor deposition apparatus, graphite is often used as a heating material for high-temperature vapor deposition, and a graphite conductor is placed on the periphery of the crucible in a coating manner, and the graphite conductor is energized to generate heat to heat the crucible. The heating temperature of the graphite conductor can be as high as 1000 ° C or higher, and even when the copper element is heated, the heating temperature is higher than 1500 ° C. How to accurately control the evaporation amount of the evaporation material is an important work of the evaporation process. The linear evaporation source is usually heated by two sets of crucibles, and the vapor is linearly plated on the surface of the workpiece through two parallel nozzles. Therefore, the more consistent the characteristics of the crucible heating element and the evaporation material should be the necessary conditions for uniform evaporation. .

先前技術之習用線性蒸鍍源結構示意圖如圖1所示,上方是加熱噴嘴之石墨導體,下方左右兩坩鍋各有上、下兩組石墨導體,理論上在兩邊平均相同加熱條件下、應可得到良好線性蒸鍍結果,但若坩鍋材質有些許異常或是長時間操作致使其熱特性變異,則左右兩坩鍋產生之蒸氣濃度將不同、造成蒸鍍膜厚不均之結果。又,石墨導體經通電加熱後溫度將迅速增高,反之切斷電源時溫度也會迅速降低,若 要直接從電源端對石墨導體溫度做精密控制,所需的相關控制電路與裝置元件數量成本均將花費不斐,且所達到的效果僅為微調數個百分比的熱量,成本效益不佳。 The schematic diagram of the linear evaporation source structure used in the prior art is shown in Fig. 1. The upper part is the graphite conductor of the heating nozzle, and the lower left and right crucibles each have upper and lower sets of graphite conductors. Theoretically, under the same average heating conditions on both sides, Good linear vapor deposition results can be obtained. However, if the material of the crucible is slightly abnormal or the thermal characteristics of the crucible are changed for a long time, the vapor concentration generated by the left and right crucibles will be different, resulting in uneven thickness of the vapor deposition film. In addition, the temperature of the graphite conductor will increase rapidly after being heated by electricity, and the temperature will be rapidly decreased when the power is turned off. To precisely control the temperature of the graphite conductor directly from the power supply terminal, the required control circuit and the number of components of the device are costly, and the effect achieved is only to fine-tune a few percentages of heat, which is not cost effective.

為解決先前技術之缺點,本發明係提供一種坩鍋溫控裝置,係在蒸鍍裝置的石墨導體與坩鍋間設置一隔絕環,利用隔絕環遮蔽或不遮蔽石墨導體與坩鍋間的熱輻射路徑,達到調控該坩鍋實際接收的熱量大小之效果。 In order to solve the shortcomings of the prior art, the present invention provides a crucible temperature control device, which is provided with an insulating ring between the graphite conductor and the crucible of the vapor deposition device, and the insulating ring is used to shield or not shield the heat between the graphite conductor and the crucible. The radiation path achieves the effect of regulating the amount of heat actually received by the crucible.

為達上述目的及其他目的,本發明提出一種坩鍋溫控裝置,係包括:一坩鍋;一石墨導體,係包覆在該坩鍋外圍,該石墨導體朝向該坩鍋之表面具有複數溝槽;一隔絕環,係位於該坩鍋與該石墨導體間,該隔絕環係具有複數歧片,該隔絕環係可旋轉使該歧片對準或不對準該溝槽,以改變該石墨導體對該坩鍋之實際加熱面積。 To achieve the above and other objects, the present invention provides a crucible temperature control device comprising: a crucible; a graphite conductor wrapped around the crucible, the graphite conductor having a plurality of grooves toward the surface of the crucible a spacer ring between the crucible and the graphite conductor, the isolation ring having a plurality of segments that are rotatable to align or misalign the segment to change the graphite conductor The actual heating area of the crucible.

本發明之一實施例中,該歧片之面積係與該溝槽之面積相同、或小於該溝槽之面積。 In an embodiment of the invention, the area of the spacer is the same as or smaller than the area of the trench.

本發明之一實施例中,該隔絕環具有一旋轉搖臂,該旋轉搖臂連接至一控制桿。 In one embodiment of the invention, the isolation ring has a rotating rocker arm coupled to a control lever.

本發明之一實施例中,該石墨導體係使用電熱式加熱。 In one embodiment of the invention, the graphite lead system uses electrothermal heating.

本發明之一實施例中,該隔絕環係以電控元件控制其旋轉位置與動作,該電控元件係根據坩鍋的實際溫度而 改變隔絕環之旋轉位置。該電控元件係可為步進馬達。 In an embodiment of the invention, the isolation ring controls its rotational position and action by an electronic control component, which is based on the actual temperature of the crucible. Change the rotational position of the isolation ring. The electronic control component can be a stepper motor.

以上之概述與接下來的詳細說明及附圖,皆是為了能進一步說明本發明達到預定目的所採取的方式、手段及功效。而有關本發明的其他目的及優點,將在後續的說明及圖示中加以闡述。 The above summary, the following detailed description and the accompanying drawings are intended to further illustrate the manner, the Other objects and advantages of the present invention will be described in the following description and drawings.

11‧‧‧坩鍋 11‧‧‧ Shabu Shabu

12‧‧‧石墨導體 12‧‧‧ graphite conductor

121‧‧‧溝槽 121‧‧‧ trench

13‧‧‧隔絕環 13‧‧ ‧isolate ring

131‧‧‧歧片 131‧‧‧

A、B‧‧‧使用狀態局部放大圖 A, B‧‧‧Using state partial enlargement

21‧‧‧石墨導體 21‧‧‧ graphite conductor

211‧‧‧溝槽 211‧‧‧ trench

22‧‧‧隔絕環 22‧‧ ‧isolate ring

221‧‧‧歧片 221‧‧‧

23‧‧‧旋轉導環 23‧‧‧Rotating guide ring

24‧‧‧導體承座 24‧‧‧Conductor Seat

25‧‧‧旋轉搖臂 25‧‧‧Rotating rocker

251‧‧‧固定螺栓 251‧‧‧ fixing bolt

26‧‧‧支撐桿 26‧‧‧Support rod

31‧‧‧石墨導體 31‧‧‧ graphite conductor

32‧‧‧坩鍋 32‧‧‧坩锅

33‧‧‧噴嘴 33‧‧‧Nozzles

34‧‧‧控制桿 34‧‧‧Control lever

圖1係為先前技術之習用線性蒸鍍源結構示意圖。 Figure 1 is a schematic view showing the structure of a conventional linear vapor deposition source of the prior art.

圖2係為本發明之坩鍋溫控裝置結構與操作狀態示意圖。 2 is a schematic view showing the structure and operation state of the crucible temperature control device of the present invention.

圖3係為本發明之坩鍋溫控裝置另一實施例元件架構示意圖。 3 is a schematic view showing the component structure of another embodiment of the crucible temperature control device of the present invention.

圖4係為本發明應用於具有複數坩鍋之線性蒸鍍裝置之實施例示意圖。 4 is a schematic view showing an embodiment of the present invention applied to a linear vapor deposition apparatus having a plurality of crucibles.

以下係藉由特定的具體實例說明本發明之實施方式,熟悉此技藝之人士可由本說明書所揭示之內容輕易地瞭解本發明之其他優點與功效。 The embodiments of the present invention are described below by way of specific examples, and those skilled in the art can readily appreciate other advantages and functions of the present invention from the disclosure herein.

電流流經石墨導體產生高溫是坩鍋主要的溫升來源,加熱量正比於石墨導體對坩鍋的熱輻射面積,控制加熱面積可間接控制坩鍋加熱量。因此本發明於石墨導體與坩鍋間加一隔絕環,旋轉隔絕環位置可控制石墨導體對坩鍋加熱之遮蔽面積,實行坩鍋加熱微量調控。 The high temperature generated by the current flowing through the graphite conductor is the main source of temperature rise of the crucible. The heating amount is proportional to the heat radiation area of the crucible of the graphite conductor, and the heating area can control the heating amount of the crucible indirectly. Therefore, the invention adds an isolation ring between the graphite conductor and the crucible, and the position of the rotating isolation ring can control the shielding area of the graphite conductor to heat the crucible, and implement the micro-control of the crucible heating.

請參閱圖2,係為本發明之坩鍋溫控裝置之結構 與操作狀態示意圖。如圖所示,係包括:一坩鍋11;一石墨導體12,係包覆在該坩鍋11外圍,該石墨導體12朝向該坩鍋之表面具有複數溝槽121;一隔絕環13,係位於該坩鍋11與該石墨導體12間,該隔絕環13係具有複數歧片131,該隔絕環13係可旋轉使該歧片131對準或不對準該溝槽121,以改變該石墨導體12對該坩鍋11之實際加熱面積。 Please refer to FIG. 2, which is the structure of the crucible temperature control device of the present invention. And the operating state diagram. As shown in the figure, comprising: a crucible 11; a graphite conductor 12 is wrapped around the periphery of the crucible 11, the graphite conductor 12 has a plurality of grooves 121 facing the surface of the crucible; an isolation ring 13 Located between the crucible 11 and the graphite conductor 12, the isolation ring 13 has a plurality of segments 131 that are rotatable to align or misalign the segments 131 to the trenches 121 to change the graphite conductors. 12 The actual heating area of the crucible 11 .

請再次參閱圖2,圖2中A、B分別代表隔絕環13之歧片131有對準與沒對準該石墨導體溝槽121之操作狀態。A為該歧片131未對準該溝槽121,即該歧片131遮蔽了該石墨導體12的部分加熱面積,因此由該石墨導體12傳至該坩鍋11的熱量會減少,降低加熱效果而使該坩鍋11溫度降低;B為該歧片131對準該溝槽121,即該歧片131完全未遮蔽到該石墨導體12,因此該石墨導體12相對該坩鍋11具有最大的加熱面積。藉由旋轉該隔絕環13使該歧片131有遮蔽或未遮蔽到該石墨導體12,便能改變實際傳至該坩鍋11的熱量大小,進而對該坩鍋11進行溫度控制。 Referring again to FIG. 2, A and B in FIG. 2 respectively represent the operational state in which the segments 131 of the isolation ring 13 are aligned and not aligned with the graphite conductor trenches 121. A is that the chip 131 is not aligned with the groove 121, that is, the chip 131 shields a portion of the heating area of the graphite conductor 12, so that heat transferred from the graphite conductor 12 to the crucible 11 is reduced, and the heating effect is reduced. The temperature of the crucible 11 is lowered; B is that the chip 131 is aligned with the groove 121, that is, the chip 131 is completely unmasked to the graphite conductor 12, so the graphite conductor 12 has the maximum heating relative to the crucible 11. area. By rotating the insulating ring 13 to shield or dispose the chip 131 to the graphite conductor 12, the amount of heat actually transferred to the crucible 11 can be changed, thereby controlling the temperature of the crucible 11.

本發明之一實施例中,該歧片131之面積係與該溝槽121之面積相同、或小於該溝槽121之面積,意即該歧片131之面積不能大於該溝槽121之面積,以免該歧片131對準該溝槽121時,該石墨導體12還有部分的面積被該歧片131遮蔽,造成溫度控制上的誤差。 In an embodiment of the present invention, the area of the chip 131 is the same as or smaller than the area of the trench 121, that is, the area of the chip 131 cannot be larger than the area of the trench 121. In order to prevent the chip 131 from being aligned with the groove 121, a part of the area of the graphite conductor 12 is shielded by the chip 131, causing an error in temperature control.

圖3係為本發明之坩鍋溫控裝置另一實施例元件 架構示意圖,如圖所示,該實施例係包括:石墨導體21,係具有複數溝槽211;隔絕環22,該隔絕環22係具有複數歧片221;旋轉導環23,係與該隔絕環22結合,並容許該隔絕環22在其內部旋轉;導體承座24,係用於容置該石墨導體21;旋轉搖臂25,係以一固定螺栓251與該隔絕環22鎖固,使用者可藉由一控制桿(圖未示)連接至該旋轉搖臂25,利用控制桿轉動該旋轉搖臂25進而使該隔絕環22旋轉、以改變該歧片221與該溝槽211的相對位置,當該歧片221遮蔽到該石墨導體21時,會減少該石墨導體21對位於其內部的坩鍋(圖未示)的實際加熱面積,進而達到對坩鍋的溫度控制;支撐桿26,係用於支撐該坩鍋溫控裝置。 3 is a component of another embodiment of the crucible temperature control device of the present invention Schematic diagram of the structure, as shown in the figure, the embodiment includes: a graphite conductor 21 having a plurality of trenches 211; an insulating ring 22 having a plurality of segments 221; a rotating guide ring 23 and the isolation ring 22, and allows the isolation ring 22 to rotate inside thereof; the conductor socket 24 is for accommodating the graphite conductor 21; the rotating rocker arm 25 is locked by a fixing bolt 251 and the isolation ring 22, the user The rotating rocker arm 25 can be connected by a control rod (not shown), and the rotating rocker arm 25 is rotated by the control rod to rotate the insulating ring 22 to change the relative position of the segment 221 and the groove 211. When the dissection piece 221 is shielded to the graphite conductor 21, the actual heating area of the graphite conductor 21 against the crucible (not shown) located inside thereof is reduced, thereby achieving temperature control of the crucible; the support rod 26, It is used to support the crucible temperature control device.

本發明之坩鍋溫控裝置除可用於單獨的坩鍋外,亦可用於具有複數坩鍋的線性蒸鍍裝置,理想狀態下,線性蒸鍍裝置中的複數坩鍋必須具有相同的加熱速度及溫度,以保證產生的蒸鍍物蒸氣量濃度相同、使製出的薄膜膜厚平均。然而實際應用中,不同坩鍋的溫度可能受石墨導體本身材質些微差異而具有不同的加熱溫度與速度,使產出的蒸氣濃度不平均,造成膜厚不均的情況。雖然理論上可以從石墨導體的加熱電路端進行控制,然而要精細控制已加熱之高溫石墨導體溫度作些許調整(例如只調降幾個或幾十個攝氏度)非常困難,所需的程序與電子元件數量均過於龐大,得到的效益與付出不成正比。因此本發明提供一簡便可靠的坩鍋 溫度控制方法,利用本發明之坩鍋溫控裝置可在不改變石墨導體加熱狀態的前提下,對坩鍋溫度進行調控,以平衡不同坩鍋可能產生的溫度不均、影響膜厚形成的問題。本發明應用於具有複數坩鍋之線性蒸鍍裝置之實施例示意圖如圖4所示,該線性蒸鍍裝置具有通電加熱用之石墨導體31、左右兩組坩鍋32(位於該石墨導體31內側)以及連接至該坩鍋之兩噴嘴33,該坩鍋32與該噴嘴33外圍均被石墨導體包覆,每組坩鍋與石墨導體間均具有本發明提供之隔絕環(圖未示),該線性蒸鍍裝置側邊具有控制桿34,拉動該控制桿34即可使內部的隔絕環旋轉,改變隔絕環之歧片遮蔽到石墨導體的面積,進而改變石墨導體實際傳至該坩鍋的熱量。關於本發明之坩鍋溫控裝置中坩鍋、隔絕環、石墨導體與控制桿等元件之結構組成請參閱圖2、圖3及其相關說明,在此不再贅述。 The crucible temperature control device of the present invention can be used for a linear vapor deposition device having a plurality of crucibles, in addition to being used in a separate crucible. Ideally, the plurality of crucibles in the linear evaporation device must have the same heating rate and The temperature is set to ensure that the vapor deposition vapor concentration is the same, and the thickness of the produced film is averaged. However, in practical applications, the temperature of different crucibles may be slightly different from the material of the graphite conductor and have different heating temperatures and speeds, so that the vapor concentration produced is not uniform, resulting in uneven film thickness. Although theoretically it can be controlled from the heating circuit end of the graphite conductor, it is very difficult to finely control the temperature of the heated high temperature graphite conductor (for example, only a few or a few tens of degrees Celsius), the required procedures and electronics The number of components is too large, and the benefits are not directly proportional to the effort. Therefore, the present invention provides a simple and reliable crucible The temperature control method can utilize the crucible temperature control device of the invention to adjust the temperature of the crucible without changing the heating state of the graphite conductor, so as to balance the temperature unevenness which may occur in different crucibles and affect the formation of the film thickness. . A schematic diagram of an embodiment of the present invention applied to a linear vapor deposition apparatus having a plurality of crucibles is shown in FIG. 4. The linear vapor deposition apparatus has a graphite conductor 31 for electric heating, and two sets of left and right crucibles 32 (located inside the graphite conductor 31). And a nozzle 33 connected to the crucible, the crucible 32 and the periphery of the nozzle 33 are covered by a graphite conductor, and each set of crucible and graphite conductor has an isolation ring (not shown) provided by the invention. The linear vapor deposition device has a control rod 34 on the side thereof. When the control rod 34 is pulled, the inner isolation ring can be rotated, and the area of the isolation ring is shielded from the graphite conductor, thereby changing the actual transfer of the graphite conductor to the crucible. Heat. For the structural composition of the crucible, the isolation ring, the graphite conductor and the control rod in the crucible temperature control device of the present invention, please refer to FIG. 2, FIG. 3 and related descriptions, and details are not described herein again.

本發明係為一種坩鍋溫控裝置,藉由隔絕環改變石墨導體對該坩鍋的實際加熱面積,進而對坩鍋溫度作調控;本發明係可用於具有複數坩鍋的蒸鍍裝置,利用本發明之坩鍋溫控裝置可使不同坩鍋間的溫度差達到平衡,以確保薄膜蒸鍍製程的效果與良率。本發明使用之隔絕環為機械元件,控制簡單、可靠度高、製造與裝配成本低廉,可簡單應用加裝於現有的蒸鍍裝置內部,達到改善蒸鍍裝置坩鍋溫度不均之情況。本發明亦可加裝電控元件,用電子控制方式控制隔絕環的旋轉位置,並配合坩鍋的溫度監控機制作閉迴路 控制,具有高運用彈性。 The invention relates to a crucible temperature control device, which changes the actual heating area of the crucible by the graphite conductor by the isolation ring, and further regulates the temperature of the crucible; the invention can be used for the evaporation device with a plurality of crucibles, and utilizes The crucible temperature control device of the invention can balance the temperature difference between different crucibles to ensure the effect and yield of the thin film evaporation process. The insulating ring used in the invention is a mechanical component, has simple control, high reliability, low manufacturing and assembly cost, and can be easily applied to the inside of the existing vapor deposition device to improve the temperature unevenness of the vapor deposition device. The invention can also add an electronic control component, control the rotational position of the isolation ring by electronic control, and make a closed loop with the temperature monitoring machine of the crucible. Control, with high application flexibility.

上述之實施例僅為例示性說明本發明之特點及其功效,而非用於限制本發明之實質技術內容的範圍。任何熟習此技藝之人士均可在不違背本發明之精神及範疇下,對上述實施例進行修飾與變化。因此,本發明之權利保護範圍,應如後述之申請專利範圍所列。 The above-described embodiments are merely illustrative of the features and functions of the present invention, and are not intended to limit the scope of the technical scope of the present invention. Modifications and variations of the above-described embodiments can be made by those skilled in the art without departing from the spirit and scope of the invention. Therefore, the scope of protection of the present invention should be as set forth in the scope of the claims described below.

11‧‧‧坩鍋 11‧‧‧ Shabu Shabu

12‧‧‧石墨導體 12‧‧‧ graphite conductor

121‧‧‧溝槽 121‧‧‧ trench

13‧‧‧隔絕環 13‧‧ ‧isolate ring

131‧‧‧歧片 131‧‧‧

A、B‧‧‧使用狀態局部放大圖 A, B‧‧‧Using state partial enlargement

Claims (7)

一種坩鍋溫控裝置,係包括:一坩鍋;一石墨導體,係包覆在該坩鍋外圍,該石墨導體朝向該坩鍋之表面具有複數溝槽;一隔絕環,係位於該坩鍋與該石墨導體間,該隔絕環係具有複數歧片,該隔絕環係可旋轉使該歧片對準或不對準該溝槽,以改變該石墨導體對該坩鍋之實際加熱面積。 A crucible temperature control device comprises: a crucible; a graphite conductor is wrapped around the crucible, the graphite conductor has a plurality of grooves facing the crucible; an insulating ring is located in the crucible Between the graphite conductor and the graphite conductor, the isolation ring has a plurality of segments that are rotatable to align or misalign the segments to change the actual heated area of the graphite conductor to the crucible. 如請求項1所述之坩鍋溫控裝置,其中該歧片之面積係與該溝槽之面積相同、或小於該溝槽之面積。 The crucible temperature control device of claim 1, wherein the area of the chip is the same as or smaller than the area of the groove. 如請求項1所述之坩鍋溫控裝置,其中該隔絕環具有一旋轉搖臂,該旋轉搖臂連接至一控制桿。 The crucible temperature control device of claim 1, wherein the isolation ring has a rotary rocker arm coupled to a control lever. 如請求項1所述之坩鍋溫控裝置,其中該石墨導體係使用電熱式加熱。 The crucible temperature control device of claim 1, wherein the graphite guide system uses electrothermal heating. 如請求項1所述之坩鍋溫控裝置,其中該隔絕環係以一電控元件控制其旋轉位置與動作。 The crucible temperature control device of claim 1, wherein the isolation ring controls its rotational position and action by an electronic control unit. 如請求項5所述之坩鍋溫控裝置,其中該電控元件係根據該坩鍋的實際溫度改變該隔絕環之旋轉位置。 The crucible temperature control device of claim 5, wherein the electronic control unit changes a rotational position of the isolation ring according to an actual temperature of the crucible. 如請求項5所述之坩鍋溫控裝置,其中該電控元件係為步進馬達。 The crucible temperature control device of claim 5, wherein the electronic control component is a stepper motor.
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Citations (1)

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Publication number Priority date Publication date Assignee Title
CN101573816A (en) * 2007-01-05 2009-11-04 埃克民公司 Bioanode and biocathode stack assemblies

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101573816A (en) * 2007-01-05 2009-11-04 埃克民公司 Bioanode and biocathode stack assemblies

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