TWI580739B - Anti-reflection coating composition and anti-reflection film - Google Patents

Anti-reflection coating composition and anti-reflection film Download PDF

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TWI580739B
TWI580739B TW104144327A TW104144327A TWI580739B TW I580739 B TWI580739 B TW I580739B TW 104144327 A TW104144327 A TW 104144327A TW 104144327 A TW104144327 A TW 104144327A TW I580739 B TWI580739 B TW I580739B
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coating composition
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antireflective coating
acid
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TW201723099A (en
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高怡惠
黃昱豪
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奇美實業股份有限公司
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    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D1/00Coating compositions, e.g. paints, varnishes or lacquers, based on inorganic substances
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D7/00Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
    • C09D7/40Additives
    • C09D7/60Additives non-macromolecular
    • C09D7/63Additives non-macromolecular organic
    • GPHYSICS
    • G02OPTICS
    • G02BOPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11Anti-reflection coatings
    • G02B1/113Anti-reflection coatings using inorganic layer materials only

Description

抗反射塗料組成物及抗反射膜Anti-reflective coating composition and anti-reflection film

本發明是有關於一種塗料組成物,且特別是有關於一種抗反射塗料組成物及由其製得的抗反射膜。This invention relates to a coating composition, and more particularly to an antireflective coating composition and an antireflective film made therefrom.

現今普遍使用的望遠鏡、照相機及攝影機等的鏡頭皆屬於光學元件。一般而言,光線入射於不同介質上會發生穿透、吸收、反射等現象,而過多的光線發生反射後會互相干擾。舉例而言,照相機鏡頭會因為反射光過多導致顏色黯淡,因而導致無法經由鏡頭擷取正確影像的顏色光澤。The lenses of telescopes, cameras, and cameras that are commonly used today are optical components. In general, when light is incident on different media, penetration, absorption, reflection, etc. occur, and excessive light will interfere with each other after reflection. For example, the camera lens may have a dull color due to excessive reflected light, which may result in the inability to capture the correct color of the image through the lens.

為解決前述問題,在目前習知技術中,透過在載板(例如:玻璃、塑料等材質)上形成折射率較載板之折射率低的薄膜來形成抗反射膜以降低反射率。所述具有較低折射率的薄膜可包括由具較低折射率的氟化鎂(MgF 2)經真空蒸鍍法而形成的單層膜結構,或是藉由壓合各種不同折射率薄膜所產生的多層膜結構,其中若藉由屬於真空技術的真空蒸鍍法來形成多層膜結構,將需要較高的製造成本。 In order to solve the aforementioned problems, in the prior art, an anti-reflection film is formed by forming a film having a refractive index lower than that of the carrier plate on a carrier (for example, glass, plastic, or the like) to reduce the reflectance. The film having a lower refractive index may include a single layer film structure formed by vacuum evaporation of magnesium fluoride (MgF 2 ) having a lower refractive index, or by pressing various refractive index films. The resulting multilayer film structure in which a multilayer film structure is formed by a vacuum evaporation method belonging to a vacuum technique will require a high manufacturing cost.

另外,在日本早期公開專利號H5-105424中揭露一種形成低折射率薄膜的方法,此方法是使用如旋轉塗佈法(spin coating)或含浸法(dipping)的濕塗法(wet coating),在載板上塗覆含有氟化鎂粒子的塗覆液來在載板上形成薄膜。然而,以此方法得到的薄膜卻具有非常低的機械強度且與載板間的附著力很差的缺點。In addition, a method of forming a low refractive index film by using a wet coating such as spin coating or dipping is disclosed in Japanese Laid-Open Patent Publication No. H5-105424. A coating liquid containing magnesium fluoride particles is coated on a carrier to form a film on the carrier. However, the film obtained by this method has a drawback of very low mechanical strength and poor adhesion to the carrier.

因此,開發具有良好折射率、良好機械強度、與載板間良好的附著力且製造成本低的抗反射膜是目前此領域極欲發展的目標。Therefore, development of an antireflection film having a good refractive index, good mechanical strength, good adhesion to a carrier, and low manufacturing cost is an extremely desirable target in the field.

本發明提供一種抗反射塗料組成物,其可製備出具有良好折射率、良好機械強度、與載板間良好的附著力且製造成本低的抗反射膜。The present invention provides an antireflective coating composition which can produce an antireflection film having a good refractive index, good mechanical strength, good adhesion to a carrier, and low manufacturing cost.

本發明提出一種抗反射塗料組成物,其包括0.7 wt%至2 wt%的二氧化矽微粒子、0.1 wt%至1.1 wt%的矽酸鹽化合物、0.05 wt%至20 wt%的水、79 wt%至99 wt%的有機溶劑以及陰離子,其中在所述抗反射塗料組成物中,所述陰離子的濃度範圍為大於85.1 ppm至小於132.4 ppm。The present invention provides an antireflective coating composition comprising 0.7 wt% to 2 wt% of ceria microparticles, 0.1 wt% to 1.1 wt% of a niobate compound, 0.05 wt% to 20 wt% of water, 79 wt % to 99 wt% of an organic solvent and an anion, wherein in the antireflective coating composition, the concentration of the anion ranges from more than 85.1 ppm to less than 132.4 ppm.

在本發明的一實施方式中,上述的二氧化矽微粒子至少包括由式(I)所示的烷氧基矽烷於鹼性觸媒存在下經水解縮合反應而得的化合物: R n-Si(OR1) 4-n式(I), 其中在式(I)中,R為C1~C10之經取代或非經取代的烷基、C2~C10之經取代或非經取代的烯基或C6~C10之經取代或非經取代的芳基,R1為C1~C10之經取代或非經取代的烷基,n為0~2的整數。 In one embodiment of the present invention, the cerium oxide microparticles include at least a compound obtained by hydrolysis-condensation reaction of an alkoxydecane represented by the formula (I) in the presence of a basic catalyst: R n -Si ( OR1) 4-n Formula (I), wherein in the formula (I), R is a substituted or unsubstituted alkyl group of C1 to C10, a substituted or unsubstituted alkenyl group of C2 to C10 or C6~ A substituted or unsubstituted aryl group of C10, R1 is a substituted or unsubstituted alkyl group of C1 to C10, and n is an integer of 0-2.

在本發明的一實施方式中,上述的鹼性觸媒為選自由金屬氫氧化物、氨水、烷胺類、醇胺類、氯化苄基三乙基銨及氫氧化四甲基銨所組成的族群中的至少一種。In one embodiment of the present invention, the alkaline catalyst is selected from the group consisting of metal hydroxides, ammonia water, alkylamines, alcohol amines, benzyltriethylammonium chloride, and tetramethylammonium hydroxide. At least one of the ethnic groups.

在本發明的一實施方式中,上述的矽酸鹽化合物至少包括由式(I)所示的烷氧基矽烷於酸性觸媒存在下經水解縮合反應而得的化合物: R n-Si(OR1) 4-n式(I), 其中在式(I)中,R為C1~C10之經取代或非經取代的烷基、C2~C10之經取代或非經取代的烯基或C6~C10之經取代或非經取代的芳基,R1為C1~C10之經取代或非經取代的烷基,n為0~2的整數。 In one embodiment of the present invention, the above-described tellurite compound includes at least a compound obtained by hydrolysis-condensation reaction of an alkoxydecane represented by the formula (I) in the presence of an acidic catalyst: R n -Si (OR1) 4-n Formula (I) wherein, in the formula (I), R is a substituted or unsubstituted alkyl group of C1 to C10, a substituted or unsubstituted alkenyl group of C2 to C10 or a C6~C10 The substituted or unsubstituted aryl group, R1 is a substituted or unsubstituted alkyl group of C1 to C10, and n is an integer of 0-2.

在本發明的一實施方式中,上述的酸性觸媒為選自由鹽酸、硝酸、氫氟酸、乙酸、三氟醋酸、硫酸、磷酸、硼酸、甲酸、草酸、對甲苯磺酸及烷基磺酸所組成的族群中的至少一種。In one embodiment of the present invention, the acidic catalyst is selected from the group consisting of hydrochloric acid, nitric acid, hydrofluoric acid, acetic acid, trifluoroacetic acid, sulfuric acid, phosphoric acid, boric acid, formic acid, oxalic acid, p-toluenesulfonic acid, and alkylsulfonic acid. At least one of the group consisting of.

在本發明的一實施方式中,當n為0時,上述的式(I)所示的烷氧基矽烷包括四甲氧基矽烷、四乙氧基矽烷、四丙氧基矽烷或四丁氧基矽烷;當n為1時,上述的式(I)所示的烷氧基矽烷包括甲基三甲氧基矽烷、甲基三乙氧基矽烷、甲基三苯氧基矽烷、乙基三甲氧基矽烷、乙基三乙氧基矽烷、丙基三甲氧基矽烷、丙基三乙氧基矽烷、丁基三甲氧基矽烷、丁基三乙氧基矽烷、己基三甲氧基矽烷、辛基三甲氧基矽烷、癸基三甲氧基矽烷、γ-(2-胺基乙基)胺基丙基三甲氧基矽烷、γ-甲基丙烯醯氧基丙基三甲氧基矽烷、γ-環氧丙氧基丙基三甲氧基矽烷、γ-巰基丙基三甲氧基矽烷、γ-氯丙基三甲氧基矽烷、乙烯基三甲氧基矽烷或苯基三甲氧基矽烷;當n為2時,上述的式(I)所示的烷氧基矽烷包括二甲基二甲氧基矽烷、二甲基二乙氧基矽烷、二異丙基二甲氧基矽烷、二異丁基二甲氧基矽烷、環己基甲基二甲氧基矽烷、γ-氯丙基甲基二甲氧基矽烷、γ-巰基丙基甲基二甲氧基矽烷、γ-環氧丙氧基丙基甲基二甲氧基矽烷或γ-甲基丙烯醯氧基丙基甲基二甲氧基矽烷。In one embodiment of the present invention, when n is 0, the alkoxydecane represented by the above formula (I) includes tetramethoxynonane, tetraethoxydecane, tetrapropoxydecane or tetrabutoxy Base alkane; when n is 1, the alkoxydecane represented by the above formula (I) includes methyltrimethoxydecane, methyltriethoxydecane, methyltriphenoxydecane, ethyltrimethoxy Base decane, ethyl triethoxy decane, propyl trimethoxy decane, propyl triethoxy decane, butyl trimethoxy decane, butyl triethoxy decane, hexyl trimethoxy decane, octyl trimethyl Oxydecane, mercaptotrimethoxydecane, γ-(2-aminoethyl)aminopropyltrimethoxydecane, γ-methylpropenyloxypropyltrimethoxydecane, γ-epoxypropane Oxypropyltrimethoxydecane, γ-mercaptopropyltrimethoxydecane, γ-chloropropyltrimethoxydecane, vinyltrimethoxydecane or phenyltrimethoxydecane; when n is 2, the above The alkoxydecane represented by the formula (I) includes dimethyldimethoxydecane, dimethyldiethoxydecane, diisopropyldimethoxydecane, diisobutylene. Dimethoxydecane, cyclohexylmethyldimethoxydecane, γ-chloropropylmethyldimethoxydecane, γ-mercaptopropylmethyldimethoxydecane, γ-glycidoxypropyl Methyl dimethoxy decane or γ-methyl propylene methoxy propyl methyl dimethoxy decane.

在本發明的一實施方式中,在上述的式(I)中,n為0或1。In an embodiment of the invention, in the above formula (I), n is 0 or 1.

在本發明的一實施方式中,上述的二氧化矽微粒子與矽酸鹽化合物的含量比例為5:5至7:3。In an embodiment of the invention, the content ratio of the cerium oxide microparticles to the citrate compound is from 5:5 to 7:3.

在本發明的一實施方式中,上述陰離子為選自由氯離子、硝酸根離子、氟離子、乙酸根離子、三氟醋酸根離子、硫酸根離子、磷酸根離子、硼酸根離子、甲酸根離子、草酸根離子、對甲苯磺酸根離子及烷基磺酸根離子所組成的族群中的至少一種。In one embodiment of the present invention, the anion is selected from the group consisting of chloride ions, nitrate ions, fluoride ions, acetate ions, trifluoroacetate ions, sulfate ions, phosphate ions, borate ions, formate ions, At least one of the group consisting of an oxalate ion, a p-toluenesulfonate ion, and an alkylsulfonate ion.

本發明另提出一種抗反射塗料組成物,其包括0.7 wt%至2 wt%的二氧化矽微粒子、0.1 wt%至1.1 wt%的矽酸鹽化合物、0.05 wt%至20 wt%的水、79 wt%至99 wt%的有機溶劑以及陰離子,其中在所述抗反射塗料組成物中,所述陰離子的莫耳濃度範圍為大於2.13 mM至小於3.32 mM。The present invention further provides an antireflective coating composition comprising 0.7 wt% to 2 wt% of ceria microparticles, 0.1 wt% to 1.1 wt% of a niobate compound, 0.05 wt% to 20 wt% of water, 79 A wt% to 99 wt% organic solvent and an anion, wherein in the antireflective coating composition, the anion has a molar concentration ranging from greater than 2.13 mM to less than 3.32 mM.

在本發明的一實施方式中,上述的二氧化矽微粒子與矽酸鹽化合物的含量比例為5:5至7:3。In an embodiment of the invention, the content ratio of the cerium oxide microparticles to the citrate compound is from 5:5 to 7:3.

在本發明的一實施方式中,上述陰離子為選自由氯離子、硝酸根離子、氟離子、乙酸根離子、三氟醋酸根離子、硫酸根離子、磷酸根離子、硼酸根離子、甲酸根離子、草酸根離子、對甲苯磺酸根離子及烷基磺酸根離子所組成的族群中的至少一種。In one embodiment of the present invention, the anion is selected from the group consisting of chloride ions, nitrate ions, fluoride ions, acetate ions, trifluoroacetate ions, sulfate ions, phosphate ions, borate ions, formate ions, At least one of the group consisting of an oxalate ion, a p-toluenesulfonate ion, and an alkylsulfonate ion.

本發明的抗反射膜是由上述的抗反射塗料組成物所製得。The antireflection film of the present invention is produced from the above antireflective coating composition.

在本發明的一實施方式中,上述的抗反射膜的折射率為1.3至1.48。In an embodiment of the invention, the antireflection film has a refractive index of 1.3 to 1.48.

基於上述,藉由本發明所提出的抗反射塗料組成物包括0.7 wt%至2 wt%的二氧化矽微粒子、0.1 wt%至1.1 wt%的矽酸鹽化合物、0.05 wt%至20 wt%的水、79 wt%至99 wt%的有機溶劑以及在抗反射塗料組成物中,濃度範圍為大於85.1 ppm至小於132.4 ppm的陰離子或是莫耳濃度範圍為大於2.13 mM至小於3.32 mM的陰離子,使得由其所製備出的抗反射膜能夠同時具有良好的折射率、機械強度、與載板間的附著力及穿透率。Based on the above, the antireflective coating composition proposed by the present invention comprises 0.7 wt% to 2 wt% of ceria microparticles, 0.1 wt% to 1.1 wt% of a niobate compound, and 0.05 wt% to 20 wt% of water. 79% to 99% by weight of the organic solvent and an anion in the antireflective coating composition having a concentration ranging from greater than 85.1 ppm to less than 132.4 ppm or an anion having a molar concentration ranging from greater than 2.13 mM to less than 3.32 mM, such that The antireflection film prepared therefrom can simultaneously have a good refractive index, mechanical strength, adhesion to a carrier, and transmittance.

為讓本發明的上述特徵和優點能更明顯易懂,下文特舉實施方式作詳細說明如下。The above described features and advantages of the present invention will be more apparent from the following description.

在本文中,由「一數值至另一數值」表示的範圍,是一種避免在說明書中一一列舉該範圍中的所有數值的概要性表示方式。因此,某一特定數值範圍的記載,涵蓋該數值範圍內的任意數值以及由該數值範圍內的任意數值界定出的較小數值範圍,如同在說明書中明文寫出該任意數值和該較小數值範圍一樣。In the present specification, the range represented by "a value to another value" is a schematic representation that avoids enumerating all the values in the range in the specification. Therefore, the recitation of a particular range of values is intended to include any value in the range of values and the range of values defined by any value in the range of values, as in the specification. The scope is the same.

在本文中,如果沒有指明某一基團是否經過取代,則該基團可表示經取代或未經取代的基團。例如,「烷基」可表示經取代或未經取代的烷基。另外,對某一基團冠以「C X」描述時,表示該基團之主鏈有X個碳原子。 Herein, if a group is not indicated to be substituted, the group may represent a substituted or unsubstituted group. For example, "alkyl" can mean a substituted or unsubstituted alkyl group. Further, when a group crown is described by "C X ", it means that the main chain of the group has X carbon atoms.

為了製備出具有良好折射率、良好機械強度、與載板間附著力佳且製造成本低的抗反射膜,本發明提出一種抗反射塗料組成物,其可達到上述優點。以下,特舉一實施方式作為本發明確實能夠據以實施的範例。In order to prepare an antireflection film having a good refractive index, good mechanical strength, good adhesion to a carrier, and low manufacturing cost, the present invention proposes an antireflective coating composition which can attain the above advantages. Hereinafter, an embodiment will be specifically described as an example in which the present invention can be implemented.

本發明的一實施方式提供的抗反射塗料組成物包括0.7 wt%至2 wt%的二氧化矽微粒子、0.1 wt%至1.1 wt%的矽酸鹽化合物、0.05 wt%至20 wt%的水、79 wt%至99 wt%的有機溶劑以及陰離子,其中在抗反射塗料組成物中,陰離子的濃度範圍為大於85.1 ppm至小於132.4 ppm,較佳為87 ppm至120 ppm,最佳為88 ppm至93 ppm。另外,在本實施方式中,二氧化矽微粒子與矽酸鹽化合物的含量比例可為5:5至7:3。在本實施方式中,抗反射塗料組成物的密度例如是0.89 g/cm 3An antireflective coating composition provided by an embodiment of the present invention includes 0.7 wt% to 2 wt% of ceria microparticles, 0.1 wt% to 1.1 wt% of a niobate compound, 0.05 wt% to 20 wt% of water, 79 wt% to 99 wt% of an organic solvent and an anion, wherein in the antireflective coating composition, the concentration of the anion ranges from more than 85.1 ppm to less than 132.4 ppm, preferably from 87 ppm to 120 ppm, most preferably from 88 ppm to 93 ppm. Further, in the present embodiment, the content ratio of the cerium oxide microparticles to the citrate compound may be from 5:5 to 7:3. In the present embodiment, the density of the antireflective coating composition is, for example, 0.89 g/cm 3 .

在本發明的一實施方式中,陰離子例如是選自由氯離子、硝酸根離子、氟離子、乙酸根離子、三氟醋酸根離子、硫酸根離子、磷酸根離子、硼酸根離子、甲酸根離子、草酸根離子、對甲苯磺酸根離子及烷基磺酸根離子所組成的族群中的至少一種,且較佳為氯離子、硝酸根離子、乙酸根離子、硫酸根離子、磷酸根離子、草酸根離子或烷基磺酸根離子。In an embodiment of the invention, the anion is, for example, selected from the group consisting of chloride ions, nitrate ions, fluoride ions, acetate ions, trifluoroacetate ions, sulfate ions, phosphate ions, borate ions, formate ions, At least one of a group consisting of an oxalate ion, a p-toluenesulfonate ion, and an alkylsulfonate ion, and preferably a chloride ion, a nitrate ion, an acetate ion, a sulfate ion, a phosphate ion, or an oxalate ion Or an alkyl sulfonate ion.

進一步而言,在本實施方式中,抗反射塗料組成物為在水及有機溶劑存在下,使用如下所示之式(I)所表示的烷氧基矽烷分別於鹼性觸媒及酸性觸媒下進行水解縮合反應後所得之含二氧化矽微粒子的分散液及含矽酸鹽化合物的溶液的混合物: R n-Si(OR1) 4-n式(I), 其中在式(I)中,R為C1~C10之經取代或非經取代的烷基、C2~C10之經取代或非經取代的烯基或C6~C10之經取代或非經取代的芳基,R1為C1~C10之經取代或非經取代的烷基,n為0~2的整數。從另一觀點而言,在本實施方式中,二氧化矽微粒子至少包括由上述式(I)所示的烷氧基矽烷於水、有機溶劑及鹼性觸媒存在下經水解縮合反應而得的化合物,而矽酸鹽化合物則至少包括由上述式(I)所示的烷氧基矽烷於水、有機溶劑及酸性觸媒存在下經水解縮合反應而得的化合物。也就是說,在本實施方式中,於鹼性觸媒存在下用於反應生成二氧化矽微粒子的烷氧基矽烷與於酸性觸媒存在下用於反應生成矽酸鹽化合物的烷氧基矽烷可具相同或不同的化學式,且於鹼性觸媒存在下用於反應生成二氧化矽微粒子的烷氧基矽烷與於酸性觸媒存在下用於反應生成矽酸鹽化合物的烷氧基矽烷較佳皆為n為0的式(I)所示的烷氧基矽烷。另外,式(I)所示的烷氧基矽烷中的烷氧基為可水解基團,即可以進行水解反應並且與矽鍵結的基團。 Further, in the present embodiment, the antireflective coating composition is an alkoxy decane represented by the following formula (I) in the presence of water and an organic solvent, respectively, in an alkaline catalyst and an acid catalyst. a mixture of a cerium oxide microparticle-containing dispersion obtained by a hydrolytic condensation reaction and a cerium-containing compound-containing solution: R n -Si(OR1) 4-n is a formula (I), wherein in the formula (I), R is a substituted or unsubstituted alkyl group of C1 to C10, a substituted or unsubstituted alkenyl group of C2 to C10 or a substituted or unsubstituted aryl group of C6 to C10, and R1 is a C1 to C10 The substituted or unsubstituted alkyl group, n is an integer from 0 to 2. From another point of view, in the present embodiment, the cerium oxide microparticles include at least a hydrolysis condensation reaction of the alkoxydecane represented by the above formula (I) in the presence of water, an organic solvent and an alkaline catalyst. And the phthalate compound includes at least a compound obtained by hydrolysis-condensation reaction of the alkoxydecane represented by the above formula (I) in the presence of water, an organic solvent and an acidic catalyst. That is, in the present embodiment, an alkoxydecane for reacting to form ceria granules in the presence of a basic catalyst and an alkoxy decane for reacting to form a phthalate compound in the presence of an acid catalyst Compared with alkoxydecane which can be used in the presence of an alkaline catalyst to react to form cerium oxide microparticles in the presence of an alkaline catalyst, which can have the same or different chemical formulas Most preferred are alkoxydecanes of the formula (I) wherein n is 0. Further, the alkoxy group in the alkoxydecane represented by the formula (I) is a hydrolyzable group, that is, a group which can undergo a hydrolysis reaction and is bonded to hydrazine.

值得一提的是,如上所述,含二氧化矽微粒子的分散液呈鹼性而含矽酸鹽化合物的溶液呈酸性,因此為了避免在混合該些溶液以形成抗反射塗料組成物時發生酸鹼中和而產生大量非所欲的鹽類,在本實施方式中,在混合該些溶液之前,可先使含二氧化矽微粒子的分散液通過陽離子交換樹脂,以控制其pH值在2.5至5.5之間。It is worth mentioning that, as described above, the dispersion containing cerium oxide microparticles is alkaline and the solution containing the citrate compound is acidic, so acid is generated in order to avoid the formation of the antireflective coating composition when the solutions are mixed to form an antireflective coating composition. The alkali is neutralized to produce a large amount of undesired salts. In the present embodiment, the dispersion containing the cerium oxide microparticles may be passed through a cation exchange resin to control the pH of the mixture to 2.5 before the solution is mixed. Between 5.5.

具體而言,在R的定義中,烷基包括但不限於:甲基、乙基、丙基、丁基、戊基、己基、庚基或辛基,烯基包括但不限於:乙烯基或烯丙基,而芳基包括但不限於:苯基、苯乙烯基或苯胺基;在R1的定義中,烷基包括但不限於:甲基、乙基、丙基、丁基、戊基、己基、庚基或辛基。另外,在R及R1的定義中,取代基包括但不限於:氨基、烷胺基、(甲基)丙烯醯氧基、環氧丙氧基、巰基或鹵素基,其中烷胺基例如是胺基乙基胺基,鹵素基例如是氯基。Specifically, in the definition of R, alkyl includes, but is not limited to, methyl, ethyl, propyl, butyl, pentyl, hexyl, heptyl or octyl, and alkenyl includes, but not limited to, vinyl or Allyl, and aryl includes, but is not limited to, phenyl, styryl or anilino; in the definition of R1, alkyl includes, but is not limited to, methyl, ethyl, propyl, butyl, pentyl, Hexyl, heptyl or octyl. Further, in the definition of R and R1, the substituent includes, but is not limited to, an amino group, an alkylamino group, a (meth)acryloxy group, a glycidoxy group, a decyl group or a halogen group, wherein the alkylamino group is, for example, an amine. The ethylamino group, the halogen group is, for example, a chlorine group.

在式(I)中,當n為2時,多個R可為相同或不同;而當n表示0、1或2時,多個R1可為相同或不同。In formula (I), when n is 2, a plurality of R may be the same or different; and when n represents 0, 1, or 2, a plurality of R1 may be the same or different.

另外,當n為0時,式(I)所示的烷氧基矽烷為四官能性烷氧基矽烷,例如包括但不限於:四甲氧基矽烷、四乙氧基矽烷、四丙氧基矽烷或四丁氧基矽烷;當n為1時,式(I)所示的烷氧基矽烷為三官能性烷氧基矽烷,例如包括但不限於:甲基三甲氧基矽烷、甲基三乙氧基矽烷、甲基三苯氧基矽烷、乙基三甲氧基矽烷、乙基三乙氧基矽烷、丙基三甲氧基矽烷、丙基三乙氧基矽烷、丁基三甲氧基矽烷、丁基三乙氧基矽烷、己基三甲氧基矽烷、辛基三甲氧基矽烷、癸基三甲氧基矽烷、γ-(2-胺基乙基)胺基丙基三甲氧基矽烷、γ-甲基丙烯醯氧基丙基三甲氧基矽烷、γ-環氧丙氧基丙基三甲氧基矽烷、γ-巰基丙基三甲氧基矽烷、γ-氯丙基三甲氧基矽烷、乙烯基三甲氧基矽烷、苯基三甲氧基矽烷;以及當n為2時,式(I)所示的烷氧基矽烷為二官能性烷氧基矽烷,例如包括但不限於:二甲基二甲氧基矽烷、二甲基二乙氧基矽烷、二異丙基二甲氧基矽烷、二異丁基二甲氧基矽烷、環己基甲基二甲氧基矽烷、γ-氯丙基甲基二甲氧基矽烷、γ-巰基丙基甲基二甲氧基矽烷、γ-環氧丙氧基丙基甲基二甲氧基矽烷或γ-甲基丙烯醯氧基丙基甲基二甲氧基矽烷。Further, when n is 0, the alkoxydecane represented by the formula (I) is a tetrafunctional alkoxydecane, and includes, for example but not limited to, tetramethoxydecane, tetraethoxydecane, tetrapropoxy. a decane or a tetrabutoxy decane; when n is 1, the alkoxy decane of the formula (I) is a trifunctional alkoxy decane, for example but not limited to: methyltrimethoxynonane, methyl three Ethoxy decane, methyltriphenoxydecane, ethyltrimethoxydecane, ethyltriethoxydecane, propyltrimethoxydecane, propyltriethoxydecane, butyltrimethoxydecane, Butyl triethoxydecane, hexyltrimethoxydecane, octyltrimethoxydecane, decyltrimethoxydecane, γ-(2-aminoethyl)aminopropyltrimethoxydecane, γ-甲Acryloxypropyltrimethoxydecane, γ-glycidoxypropyltrimethoxydecane, γ-mercaptopropyltrimethoxydecane, γ-chloropropyltrimethoxydecane, vinyltrimethoxy a decyl alkane, a phenyl trimethoxy decane; and when n is 2, the alkoxy decane of the formula (I) is a difunctional alkoxy decane, for example including but not Limited to: dimethyl dimethoxy decane, dimethyl diethoxy decane, diisopropyl dimethoxy decane, diisobutyl dimethoxy decane, cyclohexyl methyl dimethoxy decane, Γ-chloropropylmethyldimethoxydecane, γ-mercaptopropylmethyldimethoxydecane, γ-glycidoxypropylmethyldimethoxydecane or γ-methylpropene oxime Propyl propyl dimethoxy decane.

在本實施方式中,基於保持機械強度而言,在式(I)中,n較佳為0或1。具體而言,式(I)所示的烷氧基矽烷較佳為四乙氧基矽烷、四甲氧基矽烷、γ-環氧丙氧基丙基三甲氧基矽烷、甲基三甲氧基矽烷、γ-甲基丙烯醯氧基丙基三甲氧基矽烷。In the present embodiment, n is preferably 0 or 1 in the formula (I) based on the retention of mechanical strength. Specifically, the alkoxydecane represented by the formula (I) is preferably tetraethoxydecane, tetramethoxydecane, γ-glycidoxypropyltrimethoxydecane, methyltrimethoxydecane. , γ-methacryloxypropyltrimethoxydecane.

在本實施方式中,鹼性觸媒例如是氫氧化鈉、氫氧化鉀等金屬氫氧化物;氨水;甲胺、正丙胺、正丁胺、二甲胺、三甲胺、二乙胺、三乙胺、三丙胺、二丁胺、三丁胺、己胺、辛胺等烷胺類;二乙醇胺、三乙醇胺等醇胺類;氯化苄基三乙基銨;或氫氧化四甲基銨。In the present embodiment, the basic catalyst is, for example, a metal hydroxide such as sodium hydroxide or potassium hydroxide; ammonia water; methylamine, n-propylamine, n-butylamine, dimethylamine, trimethylamine, diethylamine, and triethylamine. An alkylamine such as an amine, tripropylamine, dibutylamine, tributylamine, hexylamine or octylamine; an alcoholamine such as diethanolamine or triethanolamine; benzyltriethylammonium chloride; or tetramethylammonium hydroxide.

在本實施方式中,作為酸性觸媒,無機酸及有機酸均適用,其中無機酸例如是鹽酸、硝酸、氫氟酸、乙酸、三氟醋酸、硫酸、磷酸或硼酸;而有機酸例如是甲酸、乙酸、草酸、對甲苯磺酸或烷基磺酸。In the present embodiment, as the acidic catalyst, both inorganic acids and organic acids are suitable, wherein the inorganic acid is, for example, hydrochloric acid, nitric acid, hydrofluoric acid, acetic acid, trifluoroacetic acid, sulfuric acid, phosphoric acid or boric acid; and the organic acid is, for example, formic acid. , acetic acid, oxalic acid, p-toluenesulfonic acid or alkylsulfonic acid.

值得一提的是,在本實施方式中,陰離子例如是來自於酸性觸媒水解後的產物,且較佳為氯離子。It is worth mentioning that in the present embodiment, the anion is, for example, a product derived from hydrolysis of an acidic catalyst, and is preferably a chloride ion.

在本實施方式中,有機溶劑的種類並無特別限制,只要可使各成分有效溶解或分散且不產生沈澱即可。具體而言,作為有機溶劑,可列舉:甲醇、乙醇、正丙醇、異丙醇、乙基賽璐蘇(ethyl cellosolve)、乙二醇、丁醇等醇系溶劑;乙酸乙酯、乙酸丁酯等酯系溶劑;丙酮、甲基乙基酮等酮系溶劑;甲苯、二甲苯等芳香族系溶劑;或二甲基甲醯胺、二甲基乙醯胺等醯胺系溶劑。前述有機溶劑可單獨使用,亦可混使用,只要可使各成分有效溶解或分散且不產生沈澱即可。In the present embodiment, the type of the organic solvent is not particularly limited as long as each component can be effectively dissolved or dispersed without precipitation. Specific examples of the organic solvent include alcoholic solvents such as methanol, ethanol, n-propanol, isopropanol, ethyl cellosolve, ethylene glycol, and butanol; ethyl acetate and butyl acetate; An ester solvent such as an ester; a ketone solvent such as acetone or methyl ethyl ketone; an aromatic solvent such as toluene or xylene; or a guanamine solvent such as dimethylformamide or dimethylacetamide. The above organic solvents may be used singly or in combination as long as the components can be effectively dissolved or dispersed without precipitation.

另外,在本實施方式中,含二氧化矽微粒子的分散液為在水及有機溶劑存在下使用烷氧基矽烷於鹼性觸媒下進行水解縮合反應後所得,其中,有機溶劑與烷氧基矽烷的莫爾比為25~55:1,較佳為30~45:1;鹼性觸媒與烷氧基矽烷的莫爾比為0.1~2.0:1,較佳為0.3~1.2:1;水與烷氧基矽烷的莫爾比為1.5~8:1,較佳為2.5~6:1。Further, in the present embodiment, the dispersion liquid containing cerium oxide microparticles is obtained by subjecting a liquid to an alkoxy group in the presence of water and an organic solvent by a hydrolysis and condensation reaction using an alkoxy decane under an alkaline catalyst. The molar ratio of decane is 25 to 55:1, preferably 30 to 45:1; the molar ratio of the basic catalyst to the alkoxydecane is 0.1 to 2.0:1, preferably 0.3 to 1.2:1; The molar ratio of water to alkoxydecane is from 1.5 to 8:1, preferably from 2.5 to 6:1.

在本實施方式中,含二氧化矽微粒子的分散液的反應溫度為40℃~100℃,較佳為55℃~90℃;反應時間為30分鐘~4小時,較佳為1小時~3小時。In the present embodiment, the reaction temperature of the dispersion containing cerium oxide microparticles is 40 ° C to 100 ° C, preferably 55 ° C to 90 ° C; and the reaction time is 30 minutes to 4 hours, preferably 1 hour to 3 hours. .

在本實施方式中,含矽酸鹽化合物的溶液為在水及有機溶劑存在下使用烷氧基矽烷於酸性觸媒下進行水解縮合反應後所得,其中,有機溶劑與烷氧基矽烷的莫爾比為5~15:1,較佳為7~12:1;酸性觸媒與烷氧基矽烷的莫爾比為0.007~0.014:1,較佳為0.009~0.012:1;水與烷氧基矽烷的莫耳比為1.5~8:1,較佳為2.5~6:1。In the present embodiment, the solution containing a phthalate compound is obtained by subjecting a solution of alkoxy decane to an acid catalyst under hydrolysis and condensation in the presence of water and an organic solvent, wherein the organic solvent and the alkoxydecane are in a molar state. The ratio is 5 to 15:1, preferably 7 to 12:1; the molar ratio of the acidic catalyst to the alkoxydecane is 0.007 to 0.014:1, preferably 0.009 to 0.012:1; water and alkoxy group. The molar ratio of decane is from 1.5 to 8:1, preferably from 2.5 to 6:1.

在本實施方式中,含矽酸鹽化合物的溶液的反應溫度為30℃~100℃,較佳為45℃~100℃;反應時間為30分鐘~5小時,較佳為2小時~3.5小時。In the present embodiment, the reaction temperature of the solution containing the citrate compound is from 30 ° C to 100 ° C, preferably from 45 ° C to 100 ° C; and the reaction time is from 30 minutes to 5 hours, preferably from 2 hours to 3.5 hours.

本發明的另一實施方式提供的抗反射塗料組成物包括0.7 wt%至2 wt%的二氧化矽微粒子、0.1 wt%至1.1 wt%的矽酸鹽化合物、0.05 wt%至20 wt%的水、79 wt%至99 wt%的有機溶劑以及陰離子,其中在抗反射塗料組成物中,陰離子的莫耳濃度範圍為大於2.13毫莫耳濃度(mM)~小於3.32毫莫耳濃度(mM),較佳為2.18毫莫耳濃度(mM)~3.0毫莫耳濃度(mM),最佳為2.21毫莫耳濃度(mM)~2.33毫莫耳濃度(mM)。值得一提的是,本實施方式的抗反射塗料組成物中各成分的相關描述已於上述實施方式中進行詳盡地說明,故於此不再贅述。Another embodiment of the present invention provides an antireflective coating composition comprising 0.7 wt% to 2 wt% of ceria microparticles, 0.1 wt% to 1.1 wt% of a niobate compound, and 0.05 wt% to 20 wt% of water. , 79 wt% to 99 wt% of an organic solvent and an anion, wherein in the antireflective coating composition, the molar concentration of the anion ranges from greater than 2.13 millimolar (mM) to less than 3.32 millimolar (mM). Preferably, it is from 2.18 millimolar (mM) to 3.0 millimolar (mM), most preferably from 2.21 millimolar (mM) to 2.33 millimolar (mM). It is to be noted that the related description of the components in the anti-reflective coating composition of the present embodiment has been described in detail in the above embodiments, and thus will not be described herein.

本發明的又一實施方式提供的抗反射膜由前述任一實施方式中的任一種抗反射塗料組成物所製得。詳細而言,所述抗反射膜的折射率例如是介於1.3至1.48之間,且較佳是1.38至1.47之間。另外,在波長為550 nm下,所述抗反射膜的穿透率例如是大於或等於93%。Another embodiment of the present invention provides an antireflection film produced by any of the antireflective coating compositions of any of the foregoing embodiments. In detail, the refractive index of the anti-reflection film is, for example, between 1.3 and 1.48, and preferably between 1.38 and 1.47. Further, the transmittance of the antireflection film is, for example, greater than or equal to 93% at a wavelength of 550 nm.

值得一提的是,如上所述,透過抗反射塗料組成物中的成分包括二氧化矽微粒子、矽酸鹽化合物、水、有機溶劑以及陰離子,且各成分具有特定的含量範圍,藉此使得由其製得的抗反射膜不但具有良好的折射率及穿透率,亦具有良好的機械強度以及與載板間的良好附著力。It is worth mentioning that, as described above, the components in the anti-reflective coating composition include cerium oxide microparticles, phthalate compounds, water, organic solvents, and anions, and each component has a specific content range, thereby The anti-reflective film produced has good refractive index and transmittance, good mechanical strength and good adhesion to the carrier.

另外,在本實施方式中,抗反射膜例如是以下列方式來製備:將抗反射塗料組成物塗佈於基材上後,進行乾燥處理。詳細而言,塗佈抗反射塗料組成物的方法可使用一般所進行的塗佈法,例如浸漬塗佈法、旋塗法、噴塗法、刷毛塗佈法、輥轉印法、網版印刷法、噴墨法或膠版印刷法。所述基材可以是玻璃基板或壓克力基板。所述乾燥處理的方法例如是使用加熱板或熱風循環式烘箱進行加熱,其中溫度條件為90至180℃,例如是100℃至180℃,以及時間條件為5至60分鐘,例如是7至45分鐘。Further, in the present embodiment, the antireflection film is prepared, for example, by applying an antireflective coating composition onto a substrate and then performing a drying treatment. Specifically, the method of applying the antireflective coating composition can be carried out by a coating method generally performed, such as a dip coating method, a spin coating method, a spray coating method, a brush coating method, a roll transfer method, or a screen printing method. , inkjet or offset printing. The substrate may be a glass substrate or an acrylic substrate. The drying treatment method is, for example, heating using a hot plate or a hot air circulating oven, wherein the temperature condition is 90 to 180 ° C, for example, 100 ° C to 180 ° C, and the time condition is 5 to 60 minutes, for example, 7 to 45. minute.

值得一提的是,由於抗反射膜不需使用特別的製程(例如蒸鍍或濺鍍等真空製程)而僅需藉由簡易的製程(即塗佈及加熱製程)即可製得,故極容易製造且製造成本低廉。It is worth mentioning that since the anti-reflection film does not need to use a special process (such as vacuum process such as evaporation or sputtering), it can be obtained by a simple process (ie, coating and heating process). Easy to manufacture and low in manufacturing cost.

下文將參照實施例1~3及比較例1~2,更具體地描述本發明的特徵。雖然描述了以下實施例1~3,但是在不逾越本發明範疇之情況下,可適當地改變所用材料、其量及比率、處理細節以及處理流程等等。因此,不應由下文所述的實施例對本發明作出限制性地解釋。 含二氧化矽微粒子的分散液 的製備 The features of the present invention will be more specifically described below with reference to Examples 1 to 3 and Comparative Examples 1 and 2. Although the following Examples 1 to 3 are described, the materials used, the amounts and ratios thereof, the processing details, the processing flow, and the like can be appropriately changed without departing from the scope of the invention. Therefore, the invention should not be construed restrictively by the examples described below. Preparation of dispersion containing cerium oxide microparticles

在容積為500毫升的三頸燒瓶中,加入311重量份的乙醇、6.93重量份的純水及19重量份的氨水(29%),並於室溫下進行攪拌10分鐘,使其混合均勻。接著,加入31.26重量份的四乙氧基矽烷,並將三頸燒瓶浸於60℃的油浴中且進行攪拌3小時,以得到呈鹼性的含二氧化矽微粒子的分散液。之後,將所述呈鹼性的含二氧化矽微粒子的分散液通過陽離子交換樹脂(產品名:SK1BH,製造商:太洋化成股份有限公司),以將其pH值控制在4.56,以得到含二氧化矽微粒子的分散液,其中二氧化矽微粒子的固含量為3%,粒徑分佈為20 nm至70 nm。In a three-necked flask having a volume of 500 ml, 311 parts by weight of ethanol, 6.93 parts by weight of pure water, and 19 parts by weight of aqueous ammonia (29%) were added, and the mixture was stirred at room temperature for 10 minutes to uniformly mix. Next, 31.26 parts by weight of tetraethoxysilane was added, and the three-necked flask was immersed in an oil bath at 60 ° C and stirred for 3 hours to obtain a basic dispersion of cerium oxide-containing fine particles. Thereafter, the alkaline cerium oxide-containing fine particle-containing dispersion was passed through a cation exchange resin (product name: SK1BH, manufacturer: Taiyang Chemical Co., Ltd.) to control its pH to 4.56 to obtain A dispersion of cerium oxide microparticles, wherein the cerium oxide microparticles have a solid content of 3% and a particle size distribution of 20 nm to 70 nm.

另外,取所述含二氧化矽微粒子的分散液10 uL,並於稀釋1000倍後,以離子層析儀(DIOEX公司,型號:ICS 1500)進行陰離子的種類以及濃度的量測。量測結果為未檢出任何陰離子。 含矽酸鹽化合物的溶液 的製備 Further, 10 uL of the dispersion containing the cerium oxide microparticles was taken, and after 1000-fold dilution, the type and concentration of anions were measured by an ion chromatograph (DIOEX, model: ICS 1500). The measurement showed that no anions were detected. Preparation of a solution containing a phthalate compound

在容積為500毫升的三頸燒瓶中,加入52.1重量份的四乙氧基矽烷及103.66重量份的乙醇,並於室溫下一邊攪拌一邊於30分鐘內添加18.7重量份的鹽酸水溶液(0.6重量份的35%鹽酸與18.1重量份的去離子水之混合水溶液)。接著,將三頸燒瓶浸於60℃的油浴中並進行攪拌2小時,以得到含矽酸鹽化合物的溶液,其中矽酸鹽化合物的固含量為11.5%,粒徑分佈為10 nm至90 nm。In a three-necked flask having a volume of 500 ml, 52.1 parts by weight of tetraethoxydecane and 103.66 parts by weight of ethanol were added, and 18.7 parts by weight of an aqueous hydrochloric acid solution (0.6 weight) was added thereto over 30 minutes while stirring at room temperature. A portion of a mixed aqueous solution of 35% hydrochloric acid and 18.1 parts by weight of deionized water). Next, the three-necked flask was immersed in an oil bath at 60 ° C and stirred for 2 hours to obtain a solution containing a phthalate compound having a solid content of 11.5% and a particle size distribution of 10 nm to 90. Nm.

另外,取所述含矽酸鹽化合物的溶液10 uL,並於稀釋1000倍後,以離子層析儀(DIOEX公司,型號:ICS 1500)進行陰離子的種類以及濃度的量測。量測結果為氯離子濃度為1725 ppm,而其他陰離子並未檢出,故含矽酸鹽化合物的溶液的陰離子濃度即為1725 ppm。 實施例 1 Further, 10 uL of the solution containing the phthalate compound was taken and diluted 1000 times, and the type and concentration of anions were measured by an ion chromatograph (DIOEX, model: ICS 1500). The measurement results showed that the chloride ion concentration was 1725 ppm, and the other anions were not detected, so the anion concentration of the solution containing the citrate compound was 1725 ppm. Example 1

將80重量份的含二氧化矽微粒子的分散液與20.87重量份的含矽酸鹽化合物的溶液相混合後,於室溫下進行攪拌3小時,以得到實施例1的抗反射塗料組成物。其中,實施例1的抗反射塗料組成物中的各成分的含量如表1所示。80 parts by weight of the dispersion containing cerium oxide fine particles was mixed with 20.87 parts by weight of a solution containing a phthalate compound, and the mixture was stirred at room temperature for 3 hours to obtain an antireflective coating composition of Example 1. The content of each component in the antireflective coating composition of Example 1 is shown in Table 1.

接著,將實施例1的抗反射塗料組成物以旋轉塗佈法塗佈在玻璃基板(產品名:康寧EXG玻璃,製造商:銳隆光電)上。之後,將玻璃基板置於烘箱中,在溫度160℃下烘烤10分鐘,以得到實施例1的抗反射膜,其中膜厚為101.8 nm。 實施例 2 Next, the antireflective coating composition of Example 1 was applied by spin coating on a glass substrate (product name: Corning EXG glass, manufacturer: Sharpon Optoelectronics). Thereafter, the glass substrate was placed in an oven and baked at a temperature of 160 ° C for 10 minutes to obtain an antireflection film of Example 1, wherein the film thickness was 101.8 nm. Example 2

將75重量份含二氧化矽微粒子的分散液與13.04重量份的含矽酸鹽化合物的溶液相混合後,於室溫下進行攪拌3小時,以得到實施例2的抗反射塗料組成物。其中,實施例2的抗反射塗料組成物中的各成分的含量如表1所示。75 parts by weight of the dispersion containing cerium oxide fine particles was mixed with 13.04 parts by weight of a solution containing a phthalate compound, and then stirred at room temperature for 3 hours to obtain an antireflective coating composition of Example 2. The content of each component in the antireflective coating composition of Example 2 is shown in Table 1.

接著,將實施例2的抗反射塗料組成物以旋轉塗佈法塗佈在玻璃基板(產品名:康寧EXG玻璃,製造商:銳隆光電)上。之後,將玻璃基板置於烘箱中,在溫度150℃下烘烤20分鐘,以得到實施例2的抗反射膜,其中膜厚為98.4nm。 實施例 3 Next, the antireflective coating composition of Example 2 was applied by spin coating on a glass substrate (product name: Corning EXG glass, manufacturer: Sharpon Optoelectronics). Thereafter, the glass substrate was placed in an oven and baked at a temperature of 150 ° C for 20 minutes to obtain an antireflection film of Example 2, wherein the film thickness was 98.4 nm. Example 3

將100重量份含二氧化矽微粒子的分散液與11.18重量份的含矽酸鹽化合物的溶液相混合後,於室溫下進行攪拌3小時,以得到實施例3的抗反射塗料組成物。其中,實施例3的抗反射塗料組成物中的各成分的含量如表1所示。After 100 parts by weight of the dispersion containing cerium oxide fine particles was mixed with 11.18 parts by weight of a solution containing a phthalate compound, the mixture was stirred at room temperature for 3 hours to obtain an antireflective coating composition of Example 3. The content of each component in the antireflective coating composition of Example 3 is shown in Table 1.

接著,將實施例3的抗反射塗料組成物以旋轉塗佈法塗佈在玻璃基板(產品名:康寧EXG玻璃,製造商:銳隆光電)上。之後,將玻璃基板置於烘箱中,在溫度160℃下烘烤20分鐘,以得到實施例3的抗反射膜,其中膜厚為100.5 nm。 比較例 1 Next, the antireflective coating composition of Example 3 was applied by spin coating on a glass substrate (product name: Corning EXG glass, manufacturer: Sharpon Optoelectronics). Thereafter, the glass substrate was placed in an oven and baked at a temperature of 160 ° C for 20 minutes to obtain an antireflection film of Example 3, in which the film thickness was 100.5 nm. Comparative example 1

將40重量份含二氧化矽微粒子的分散液與24.35重量份的含矽酸鹽化合物的溶液相混合後,於室溫下進行攪拌3小時,以得到比較例1的抗反射塗料組成物。其中,比較例1的抗反射塗料組成物中的各成分的含量如表1所示。After 40 parts by weight of the dispersion containing cerium oxide fine particles and 24.35 parts by weight of a solution containing a ceric acid compound, the mixture was stirred at room temperature for 3 hours to obtain an antireflective coating composition of Comparative Example 1. The content of each component in the antireflective coating composition of Comparative Example 1 is shown in Table 1.

接著,將比較例1的抗反射塗料組成物以旋轉塗佈法塗佈在玻璃基板(產品名:康寧EXG玻璃,製造商:銳隆光電)上。之後,將玻璃基板置於烘箱中,在溫度120℃下烘烤30分鐘,以得到比較例1的抗反射膜,其中膜厚為97.9 nm。 比較例 2 Next, the antireflective coating composition of Comparative Example 1 was applied by spin coating on a glass substrate (product name: Corning EXG Glass, manufacturer: Sharpon Optoelectronics). Thereafter, the glass substrate was placed in an oven and baked at a temperature of 120 ° C for 30 minutes to obtain an antireflection film of Comparative Example 1, in which the film thickness was 97.9 nm. Comparative example 2

將85重量份含二氧化矽微粒子的分散液與5.54重量份的含矽酸鹽化合物的溶液相混合後,於室溫下進行攪拌3小時,以得到比較例2的抗反射塗料組成物。其中,比較例2的抗反射塗料組成物中的各成分的含量如表1所示。After 85 parts by weight of the dispersion containing cerium oxide fine particles was mixed with 5.54 parts by weight of a solution containing a ceric acid compound, the mixture was stirred at room temperature for 3 hours to obtain an antireflective coating composition of Comparative Example 2. The content of each component in the antireflective coating composition of Comparative Example 2 is shown in Table 1.

接著,將比較例2的抗反射塗料組成物以旋轉塗佈法塗佈在玻璃基板(產品名:康寧EXG玻璃,製造商:銳隆光電)上。之後,將玻璃基板置於烘箱中,在溫度150℃下烘烤10分鐘,以得到比較例2的抗反射膜,其中膜厚為97.7 nm。Next, the antireflective coating composition of Comparative Example 2 was applied by spin coating on a glass substrate (product name: Corning EXG glass, manufacturer: Sharp Optoelectronics). Thereafter, the glass substrate was placed in an oven and baked at a temperature of 150 ° C for 10 minutes to obtain an antireflection film of Comparative Example 2, in which the film thickness was 97.7 nm.

以下,針對所列舉的各種物性分別對實施例1至實施例3的抗反射塗料組成物以及其抗反射膜及比較例1至比較例2的抗反射塗料組成物以及其抗反射膜進行測試及評估,並且各測試的原理詳述於下文中,且各測試的結果顯示在表1中。 陰離子濃度 Hereinafter, the antireflective coating composition of Examples 1 to 3 and the antireflection film thereof, and the antireflective coating composition of Comparative Examples 1 to 2 and the antireflection film thereof were tested for each of the enumerated physical properties. The evaluation, and the principles of each test are detailed below, and the results of each test are shown in Table 1. < anion concentration >

分別取實施例1至實施例3及比較例1至比較例2的抗反射塗料組成物10 uL,並於稀釋1000倍後以離子層析儀(DIOEX公司,型號:ICS 1500)進行陰離子的種類以及濃度的量測。另外一提的是,由於實施例1至實施例3及比較例1至比較例2的抗反射塗料組成物中皆僅偵測到氯離子,而其他種類陰離子未檢出,故表1中的陰離子濃度即為氯離子濃度。 陰離子莫耳濃度 The anti-reflective coating composition of Example 1 to Example 3 and Comparative Example 1 to Comparative Example 2 was respectively subjected to 10 uL, and after 1000-fold dilution, an anion species was carried out by an ion chromatograph (DIOEX, model: ICS 1500). And the measurement of the concentration. In addition, since only the chloride ions were detected in the antireflective coating compositions of Examples 1 to 3 and Comparative Examples 1 to 2, and other kinds of anions were not detected, the conditions in Table 1 were The anion concentration is the chloride ion concentration. < anionic molar concentration >

首先,分別取實施例1至實施例3及比較例1至比較例2的抗反射塗料組成物10 uL,並於稀釋1000倍後以離子層析儀(DIOEX公司,型號:ICS 1500)進行陰離子的種類以及濃度的量測。接著,由於實施例1至實施例3及比較例1至比較例2的抗反射塗料組成物中皆僅偵測到氯離子,故以氯離子的分子量為35.5 g/mol以及抗反射塗料組成物的密度為0.89 g/cm 3進行濃度換算。另外一提的是,在表1中的陰離子莫耳濃度即為氯離子莫耳濃度。 鉛筆硬度 First, 10 uL of the antireflective coating composition of Example 1 to Example 3 and Comparative Example 1 to Comparative Example 2 were respectively taken, and anion was carried out by ion chromatography (DIOEX, Model: ICS 1500) after 1000-fold dilution. The type and concentration measurement. Then, since only the chloride ions were detected in the antireflective coating compositions of Examples 1 to 3 and Comparative Examples 1 to 2, the molecular weight of the chloride ions was 35.5 g/mol and the antireflective coating composition was used. The density was 0.89 g/cm 3 for concentration conversion. It is also noted that the anion molar concentration in Table 1 is the chloride ion molar concentration. < pencil hardness >

依據JIS K5600-5-4的鉛筆硬度試驗,分別對由實施例1至實施例3的抗反射膜及比較例1至比較例2的抗反射膜的表面進行硬度測定。通常,抗反射膜的鉛筆硬度規格較佳為大於或等於5H,更佳為大於或等於6H。 百格密著性試驗 The surface of the antireflection film of Examples 1 to 3 and the antireflection film of Comparative Example 1 to Comparative Example 2 were each subjected to hardness measurement in accordance with the pencil hardness test of JIS K5600-5-4. Generally, the pencil hardness specification of the antireflection film is preferably greater than or equal to 5H, more preferably greater than or equal to 6H. < Hundreds of adhesion test >

首先,分別將實施例1至實施例3及比較例1至比較例2的抗反射塗料組成物以旋轉塗佈法塗佈在10 cm × 10 cm的玻璃基板(產品名:康寧EXG玻璃,製造商:銳隆光電)上。之後,將玻璃基板置於烘箱中,並依前述實施例1~3及比較例1~2中所述之各烘烤條件進行烘烤,以得到尺寸為10 cm × 10 cm的實施例1至實施例3的抗反射膜及比較例1至比較例2的抗反射膜。接著,依據JIS K5600的方法,分別對前述實施例1至實施例3的抗反射膜及比較例1至比較例2的抗反射膜的表面上,以切刀切出10格(square)×10格個的100方格。之後,將3M公司製造的600膠帶黏貼於印刷表面上,並接著予以急遽地剝離,以殘留的方格數目進行評估,其中評估標準如下: 5B:無任何方格脫落; 4B:0%<脫落的方格數量≦5%; 3B:5%<脫落的方格數量≦15%; 2B:15%<脫落的方格數量≦35%; 1B:35%<脫落的方格數量≦65%; 0B:65%<脫落的方格數量≦100%。 穿透率測試 First, the antireflective coating compositions of Examples 1 to 3 and Comparative Examples 1 to 2 were respectively applied by spin coating to a glass substrate of 10 cm × 10 cm (product name: Corning EXG glass, manufactured). Merchant: Ruilong Optoelectronics). Thereafter, the glass substrate was placed in an oven and baked according to the baking conditions described in the above Examples 1 to 3 and Comparative Examples 1 and 2 to obtain Example 1 having a size of 10 cm × 10 cm. The antireflection film of Example 3 and the antireflection film of Comparative Example 1 to Comparative Example 2. Next, according to the method of JIS K5600, the antireflection film of the above-mentioned Examples 1 to 3 and the antireflection film of Comparative Example 1 to Comparative Example 2 were respectively cut into 10 squares × 10 by a cutter. 100 squares. After that, the 600 tape manufactured by 3M Company was adhered to the printing surface, and then peeled off sharply, and the number of remaining squares was evaluated. The evaluation criteria were as follows: 5B: no square peeling off; 4B: 0% < shedding The number of squares is 5%; 3B: 5% < the number of squares falling off ≦ 15%; 2B: 15% < the number of squares falling off ≦ 35%; 1B: 35% < the number of squares falling off ≦ 65%; 0B: 65% < the number of squares dropped off ≦ 100%. < Permeability test >

使用UV/Vis光譜儀(Hitachi公司,型號:U3300),分別對實施例1至實施例3的抗反射膜及比較例1至比較例2的抗反射膜測定波長範圍為380 nm至780nm下的穿透率(%)。其中,在表1中,穿透率(%)(550nm)即表示於波長為550nm下的穿透率(%)。通常,於波長為550nm下,抗反射膜的穿透率至少要大於93%。 折射率測試 The antireflection films of Examples 1 to 3 and the antireflection films of Comparative Examples 1 to 2 were measured for the wavelength range of 380 nm to 780 nm using a UV/Vis spectrometer (Hitachi, Model: U3300), respectively. Transmittance (%). Here, in Table 1, the transmittance (%) (550 nm) represents the transmittance (%) at a wavelength of 550 nm. Generally, the antireflection film has a transmittance of at least 93% at a wavelength of 550 nm. < refractive index test >

使用薄膜量測儀(Mission Peak Optics Inc.公司,型號:MP100-ST),分別對實施例1至實施例3的抗反射膜及比較例1至比較例2的抗反射膜測定於波長為550nm下的折射率。通常,抗反射膜的折射率至少要小於1.5,較佳為介於1.3至1.45之間。   表1 <TABLE border="1" borderColor="#000000" width="85%"><TBODY><tr><td>   </td><td> 實施例1 </td><td> 實施例2 </td><td> 實施例3 </td><td> 比較例1 </td><td> 比較例2 </td></tr><tr><td> 抗反射塗料組成物 </td><td> 二氧化矽微粒子 (wt%) </td><td> 1% </td><td> 1.2% </td><td> 1.4% </td><td> 0.6% </td><td> 1.6% </td></tr><tr><td> 矽酸鹽化合物 (wt%) </td><td> 1% </td><td> 0.8% </td><td> 0.6% </td><td> 1.4% </td><td> 0.4% </td></tr><tr><td> 水 (wt%) </td><td> 10% </td><td> 10% </td><td> 10% </td><td> 10% </td><td> 10% </td></tr><tr><td> 乙醇 (wt%) </td><td> 88% </td><td> 88% </td><td> 88% </td><td> 88% </td><td> 88% </td></tr><tr><td> 陰離子濃度 (ppm) </td><td> 106.7 </td><td> 94.2 </td><td> 90.5 </td><td> 132.4 </td><td> 85.1 </td></tr><tr><td> 陰離子莫耳濃度 (mM) </td><td> 2.68 </td><td> 2.36 </td><td> 2.27 </td><td> 3.32 </td><td> 2.13 </td></tr><tr><td> 二氧化矽微粒子與矽酸鹽化合物的含量比例 </td><td> 5:5 </td><td> 6:4 </td><td> 7:3 </td><td> 3:7 </td><td> 8:2 </td></tr><tr><td> 抗反射膜物性 </td><td> 鉛筆硬度 </td><td> 7H </td><td> 7H </td><td> ≦7H </td><td> ≦5H </td><td> 5H </td></tr><tr><td> 百格測試 </td><td> 5B </td><td> 5B </td><td> 5B </td><td> 5B </td><td> 4B </td></tr><tr><td> 穿透率(%) (550 nm) </td><td> 93.4 </td><td> 93.4 </td><td> 93.9 </td><td> 93.5 </td><td> 94.7 </td></tr><tr><td> 折射率 </td><td> 1.396 </td><td> 1.392 </td><td> 1.385 </td><td> 1.434 </td><td> 1.430 </td></tr></TBODY></TABLE>The antireflection films of Examples 1 to 3 and the antireflection films of Comparative Examples 1 to 2 were measured at a wavelength of 550 nm using a film measuring instrument (Mission Peak Optics Inc., model: MP100-ST). The refractive index underneath. Generally, the antireflection film has a refractive index of at least less than 1.5, preferably between 1.3 and 1.45. Table 1         <TABLE border="1" borderColor="#000000" width="85%"><TBODY><tr><td> </td><td> Example 1 </td><td> Example 2 < /td><td> Example 3 </td><td> Comparative Example 1 </td><td> Comparative Example 2 </td></tr><tr><td> Antireflective Coating Composition</ Td><td> cerium oxide microparticles (wt%) </td><td> 1% </td><td> 1.2% </td><td> 1.4% </td><td> 0.6% < /td><td> 1.6% </td></tr><tr><td> citrate compound (wt%) </td><td> 1% </td><td> 0.8% </ Td><td> 0.6% </td><td> 1.4% </td><td> 0.4% </td></tr><tr><td> water (wt%) </td><td > 10% </td><td> 10% </td><td> 10% </td><td> 10% </td><td> 10% </td></tr><tr> <td> Ethanol (wt%) </td><td> 88% </td><td> 88% </td><td> 88% </td><td> 88% </td><td > 88% </td></tr><tr><td> Anion concentration (ppm) </td><td> 106.7 </td><td> 94.2 </td><td> 90.5 </td> <td> 132.4 </td><td> 85.1 </td></tr><tr><td> Anion molar concentration (mM) </td><td> 2.68 </td><td> 2.36 < /td><td> 2.27 </td><td> 3.32 </td><td> 2.13 </td></tr><tr><td> Content ratio of cerium oxide microparticles to citrate compound /td><td> 5:5 </td><td> 6:4 </t d><td> 7:3 </td><td> 3:7 </td><td> 8:2 </td></tr><tr><td> Anti-reflective film properties</td> <td> pencil hardness</td><td> 7H </td><td> 7H </td><td> ≦7H </td><td> ≦5H </td><td> 5H </td ></tr><tr><td> Hundreds of tests</td><td> 5B </td><td> 5B </td><td> 5B </td><td> 5B </td> <td> 4B </td></tr><tr><td> Transmittance (%) (550 nm) </td><td> 93.4 </td><td> 93.4 </td><td > 93.9 </td><td> 93.5 </td><td> 94.7 </td></tr><tr><td> Refractive Index</td><td> 1.396 </td><td> 1.392 </td><td> 1.385 </td><td> 1.434 </td><td> 1.430 </td></tr></TBODY></TABLE>

由上述表1可知,實施例1至實施例3的抗反射膜的鉛筆硬度皆為大於或等於7H,此顯示實施例1至實施例3的抗反射膜具有良好的機械強度。另外,由上述表1可知,實施例1至實施例3的抗反射膜的百格測試的評估結果皆為5B,此顯示實施例1至實施例3的抗反射膜與基板之間具有良好的附著力。另外,由上述表1可知,於波長為550nm下,實施例1至實施例3的抗反射膜的穿透率皆大於93%(93.4%、93.9%)此顯示實施例1至實施例3的抗反射膜具有良好的穿透率。另外,與比較例1至比較例2的抗反射膜相比,實施例1至實施例3的抗反射膜皆具有較低的折射率(1.385~1.396),此顯示實施例1至實施例3的抗反射膜具有較佳的抗反射能力。也就是說,由實施例1至實施例3的抗反射塗料組成物所製得的實施例1至實施例3的抗反射膜同時具有良好的機械強度、與載板間的附著力、穿透率及折射率。As is apparent from the above Table 1, the pencil hardness of the antireflection films of Examples 1 to 3 was all greater than or equal to 7H, which shows that the antireflection films of Examples 1 to 3 have good mechanical strength. In addition, as can be seen from the above Table 1, the evaluation results of the hundred-dimensional test of the antireflection films of Examples 1 to 3 were all 5B, which showed that the antireflection film of Examples 1 to 3 had a good relationship with the substrate. Adhesion. Further, as is apparent from the above Table 1, the transmittances of the antireflection films of Examples 1 to 3 were all greater than 93% (93.4%, 93.9%) at a wavelength of 550 nm. This shows the results of Examples 1 to 3. The antireflection film has a good transmittance. Further, the antireflection films of Examples 1 to 3 all had lower refractive indices (1.385 to 1.396) than the antireflection films of Comparative Examples 1 to 2, which shows Examples 1 to 3. The antireflection film has better antireflection ability. That is, the antireflection films of Examples 1 to 3 obtained from the antireflective coating compositions of Examples 1 to 3 simultaneously have good mechanical strength, adhesion to the carrier, and penetration. Rate and refractive index.

綜上所述,藉由本發明所提出的抗反射塗料組成物包括0.7 wt%至2 wt%的二氧化矽微粒子、0.1 wt%至1.1 wt%的矽酸鹽化合物、0.05 wt%至20 wt%的水、79 wt%至99 wt%的有機溶劑以及在抗反射塗料組成物中,濃度範圍為大於85.1 ppm至小於132.4 ppm的陰離子或是莫耳濃度範圍為大於2.13 mM至小於3.32 mM的陰離子,使得由其所製備出的抗反射膜能夠同時具有良好的折射率、機械強度、與載板間的附著力及穿透率。另外,由於使用本發明的抗反射塗料組成物製備抗反射膜不需使用特別的製程(例如蒸鍍或濺鍍等真空製程)即可製得,故極容易製造且製造成本低廉。In summary, the anti-reflective coating composition proposed by the present invention comprises 0.7 wt% to 2 wt% of ceria microparticles, 0.1 wt% to 1.1 wt% of a niobate compound, and 0.05 wt% to 20 wt%. Water, 79 wt% to 99 wt% organic solvent, and anions in the antireflective coating composition having a concentration ranging from greater than 85.1 ppm to less than 132.4 ppm or an anion having a molar concentration ranging from greater than 2.13 mM to less than 3.32 mM Therefore, the antireflection film prepared therefrom can simultaneously have good refractive index, mechanical strength, adhesion to the carrier, and transmittance. Further, since the antireflection film is prepared by using the antireflective coating composition of the present invention, it can be produced without using a special process (for example, a vacuum process such as evaporation or sputtering), so that it is extremely easy to manufacture and inexpensive to manufacture.

雖然本發明已以實施方式揭露如上,然其並非用以限定本發明,任何所屬技術領域中具有通常知識者,在不脫離本發明的精神和範圍內,當可作些許的更動與潤飾,故本發明的保護範圍當視後附的申請專利範圍所界定者為準。The present invention has been disclosed in the above embodiments, but it is not intended to limit the invention, and any one of ordinary skill in the art can make some changes and refinements without departing from the spirit and scope of the invention. The scope of the invention is defined by the scope of the appended claims.

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Claims (14)

一種抗反射塗料組成物,包括: 0.7 wt%至2 wt%的二氧化矽微粒子; 0.1 wt%至1.1 wt%的矽酸鹽化合物; 0.05 wt%至20 wt%的水; 79 wt%至99 wt%的有機溶劑;以及 陰離子, 其中在所述抗反射塗料組成物中,所述陰離子的濃度範圍為大於85.1 ppm至小於132.4 ppm。An antireflective coating composition comprising: 0.7 wt% to 2 wt% of cerium oxide microparticles; 0.1 wt% to 1.1 wt% of a citrate compound; 0.05 wt% to 20 wt% of water; 79 wt% to 99 a wt% organic solvent; and an anion, wherein in the antireflective coating composition, the concentration of the anion ranges from greater than 85.1 ppm to less than 132.4 ppm. 如申請專利範圍第1項所述的抗反射塗料組成物,其中所述二氧化矽微粒子至少包括由式(I)所示的烷氧基矽烷於鹼性觸媒存在下經水解縮合反應而得的化合物: R n-Si(OR1) 4-n式(I), 其中在式(I)中,R為C1~C10之經取代或非經取代的烷基、C2~C10之經取代或非經取代的烯基或C6~C10之經取代或非經取代的芳基,R1為C1~C10之經取代或非經取代的烷基,n為0~2的整數。 The anti-reflective coating composition according to claim 1, wherein the cerium oxide microparticles comprise at least a hydrolyzed condensation reaction of an alkoxydecane represented by the formula (I) in the presence of a basic catalyst. a compound: R n -Si(OR1) 4-n is a formula (I) wherein, in the formula (I), R is a substituted or unsubstituted alkyl group of C1 to C10, and a substituted or non-substituted C2 to C10 group. A substituted alkenyl group or a substituted or unsubstituted aryl group of C6-C10, R1 is a substituted or unsubstituted alkyl group of C1 to C10, and n is an integer of 0-2. 如申請專利範圍第2項所述的抗反射塗料組成物,其中所述鹼性觸媒為選自由金屬氫氧化物、氨水、烷胺類、醇胺類、氯化苄基三乙基銨及氫氧化四甲基銨所組成的族群中的至少一種。The anti-reflective coating composition according to claim 2, wherein the basic catalyst is selected from the group consisting of metal hydroxides, ammonia water, alkylamines, alcohol amines, benzyltriethylammonium chloride, and At least one of the group consisting of tetramethylammonium hydroxide. 如申請專利範圍第1項所述的抗反射塗料組成物,其中所述矽酸鹽化合物至少包括由式(I)所示的烷氧基矽烷於酸性觸媒存在下經水解縮合反應而得的化合物: R n-Si(OR1) 4-n式(I), 其中在式(I)中,R為C1~C10之經取代或非經取代的烷基、C2~C10之經取代或非經取代的烯基或C6~C10之經取代或非經取代的芳基,R1為C1~C10之經取代或非經取代的烷基,n為0~2的整數。 The anti-reflective coating composition according to claim 1, wherein the bismuth citrate compound comprises at least a hydrolysis condensation reaction of an alkoxy decane represented by the formula (I) in the presence of an acidic catalyst. Compound: R n -Si(OR1) 4-n Formula (I) wherein, in the formula (I), R is a substituted or unsubstituted alkyl group of C1 to C10, a substituted or non-substituted C2~C10 a substituted alkenyl group or a substituted or unsubstituted aryl group of C6 to C10, R1 is a substituted or unsubstituted alkyl group of C1 to C10, and n is an integer of 0-2. 如申請專利範圍第4項所述的抗反射塗料組成物,其中所述酸性觸媒為選自由鹽酸、硝酸、氫氟酸、乙酸、三氟醋酸、硫酸、磷酸、硼酸、甲酸、乙酸、草酸、對甲苯磺酸及烷基磺酸所組成的族群中的至少一種。The antireflective coating composition according to claim 4, wherein the acidic catalyst is selected from the group consisting of hydrochloric acid, nitric acid, hydrofluoric acid, acetic acid, trifluoroacetic acid, sulfuric acid, phosphoric acid, boric acid, formic acid, acetic acid, oxalic acid. At least one of the group consisting of p-toluenesulfonic acid and alkylsulfonic acid. 如申請專利範圍第2項或第4項所述的抗反射塗料組成物,其中當n為0時,式(I)所示的烷氧基矽烷包括四甲氧基矽烷、四乙氧基矽烷、四丙氧基矽烷或四丁氧基矽烷;當n為1時,式(I)所示的烷氧基矽烷包括甲基三甲氧基矽烷、甲基三乙氧基矽烷、甲基三苯氧基矽烷、乙基三甲氧基矽烷、乙基三乙氧基矽烷、丙基三甲氧基矽烷、丙基三乙氧基矽烷、丁基三甲氧基矽烷、丁基三乙氧基矽烷、己基三甲氧基矽烷、辛基三甲氧基矽烷、癸基三甲氧基矽烷、γ-(2-胺基乙基)胺基丙基三甲氧基矽烷、γ-甲基丙烯醯氧基丙基三甲氧基矽烷、γ-環氧丙氧基丙基三甲氧基矽烷、γ-巰基丙基三甲氧基矽烷、γ-氯丙基三甲氧基矽烷、乙烯基三甲氧基矽烷或苯基三甲氧基矽烷;當n為2時,式(I)所示的烷氧基矽烷包括二甲基二甲氧基矽烷、二甲基二乙氧基矽烷、二異丙基二甲氧基矽烷、二異丁基二甲氧基矽烷、環己基甲基二甲氧基矽烷、γ-氯丙基甲基二甲氧基矽烷、γ-巰基丙基甲基二甲氧基矽烷、γ-環氧丙氧基丙基甲基二甲氧基矽烷或γ-甲基丙烯醯氧基丙基甲基二甲氧基矽烷。The antireflective coating composition according to Item 2 or 4, wherein when a n is 0, the alkoxydecane represented by the formula (I) includes tetramethoxynonane, tetraethoxydecane. , tetrapropoxydecane or tetrabutoxydecane; when n is 1, the alkoxydecane represented by the formula (I) includes methyltrimethoxydecane, methyltriethoxydecane, methyltriphenyl Oxydecane, ethyltrimethoxydecane, ethyltriethoxydecane, propyltrimethoxydecane, propyltriethoxydecane, butyltrimethoxydecane, butyltriethoxydecane, hexyl Trimethoxydecane, octyltrimethoxydecane, decyltrimethoxydecane, γ-(2-aminoethyl)aminopropyltrimethoxydecane, γ-methylpropenyloxypropyltrimethoxy Baseline, γ-glycidoxypropyltrimethoxydecane, γ-mercaptopropyltrimethoxydecane, γ-chloropropyltrimethoxydecane, vinyltrimethoxydecane or phenyltrimethoxydecane When n is 2, the alkoxydecane represented by the formula (I) includes dimethyldimethoxydecane, dimethyldiethoxydecane, diisopropyldimethoxyanthracene. , diisobutyldimethoxydecane, cyclohexylmethyldimethoxydecane, γ-chloropropylmethyldimethoxydecane, γ-mercaptopropylmethyldimethoxydecane, γ-ring Oxypropoxypropylmethyldimethoxydecane or gamma-methacryloxypropylmethyldimethoxydecane. 如申請專利範圍第2項所述的抗反射塗料組成物,其中在式(I)中,n為0或1。The antireflective coating composition according to claim 2, wherein in the formula (I), n is 0 or 1. 如申請專利範圍第1項所述的抗反射塗料組成物,其中所述二氧化矽微粒子與所述矽酸鹽化合物的含量比例為5:5至7:3。The antireflective coating composition according to claim 1, wherein the content ratio of the cerium oxide microparticles to the citrate compound is from 5:5 to 7:3. 如申請專利範圍第1項所述的抗反射塗料組成物,其中所述陰離子為選自由氯離子、硝酸根離子、氟離子、乙酸根離子、三氟醋酸根離子、硫酸根離子、磷酸根離子、硼酸根離子、甲酸根離子、草酸根離子、對甲苯磺酸根離子及烷基磺酸根離子所組成的族群中的至少一種。The antireflective coating composition of claim 1, wherein the anion is selected from the group consisting of chloride ions, nitrate ions, fluoride ions, acetate ions, trifluoroacetate ions, sulfate ions, and phosphate ions. At least one of a group consisting of borate ions, formate ions, oxalate ions, p-toluenesulfonate ions, and alkylsulfonate ions. 一種抗反射塗料組成物,包括: 0.7 wt%至2 wt%的二氧化矽微粒子; 0.1 wt%至1.1 wt%的矽酸鹽化合物; 0.05 wt%至20 wt%的水; 79 wt%至99 wt%的有機溶劑;以及 陰離子, 其中在所述抗反射塗料組成物中,所述陰離子的莫耳濃度範圍為大於2.13 mM至小於3.32 mM。An antireflective coating composition comprising: 0.7 wt% to 2 wt% of cerium oxide microparticles; 0.1 wt% to 1.1 wt% of a citrate compound; 0.05 wt% to 20 wt% of water; 79 wt% to 99 a wt% organic solvent; and an anion, wherein the anion has a molar concentration ranging from greater than 2.13 mM to less than 3.32 mM in the antireflective coating composition. 如申請專利範圍第10項所述的抗反射塗料組成物,其中所述二氧化矽微粒子與所述矽酸鹽化合物的含量比例為5:5至7:3。The antireflective coating composition according to claim 10, wherein the content ratio of the cerium oxide microparticles to the citrate compound is from 5:5 to 7:3. 如申請專利範圍第10項所述的抗反射塗料組成物,其中所述陰離子為選自由氯離子、硝酸根離子、氟離子、乙酸根離子、三氟醋酸根離子、硫酸根離子、磷酸根離子、硼酸根離子、甲酸根離子、草酸根離子、對甲苯磺酸根離子及烷基磺酸根離子所組成的族群中的至少一種。The antireflective coating composition according to claim 10, wherein the anion is selected from the group consisting of chloride ion, nitrate ion, fluoride ion, acetate ion, trifluoroacetate ion, sulfate ion, and phosphate ion. At least one of a group consisting of borate ions, formate ions, oxalate ions, p-toluenesulfonate ions, and alkylsulfonate ions. 一種抗反射膜,其由如申請專利範圍第1項至第12項中任一項所述的抗反射塗料組成物所製得。An antireflection film produced by the antireflective coating composition according to any one of claims 1 to 12. 如申請專利範圍第13項所述的抗反射膜,其中所述抗反射膜的折射率為1.3至1.48。The antireflection film of claim 13, wherein the antireflection film has a refractive index of from 1.3 to 1.48.
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