TWI573112B - Display device - Google Patents

Display device Download PDF

Info

Publication number
TWI573112B
TWI573112B TW104139446A TW104139446A TWI573112B TW I573112 B TWI573112 B TW I573112B TW 104139446 A TW104139446 A TW 104139446A TW 104139446 A TW104139446 A TW 104139446A TW I573112 B TWI573112 B TW I573112B
Authority
TW
Taiwan
Prior art keywords
signal line
line
chip package
flip chip
package structure
Prior art date
Application number
TW104139446A
Other languages
Chinese (zh)
Other versions
TW201719610A (en
Inventor
官聖洧
Original Assignee
奇景光電股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 奇景光電股份有限公司 filed Critical 奇景光電股份有限公司
Priority to TW104139446A priority Critical patent/TWI573112B/en
Application granted granted Critical
Publication of TWI573112B publication Critical patent/TWI573112B/en
Publication of TW201719610A publication Critical patent/TW201719610A/en

Links

Description

顯示裝置 Display device

本發明是有關於一種顯示裝置,且特別是有關於一種補償薄膜覆晶封裝(chip on film,COF)的特性阻抗的顯示裝置。 The present invention relates to a display device, and more particularly to a display device that compensates for the characteristic impedance of a film on film (COF).

在一些顯示裝置中,為了符合窄邊框的需求,顯示面板是透過薄膜覆晶封裝結構連接至設置有時序控制器(time controller)的電路板,而驅動晶片是設置在薄膜覆晶封裝結構上。一般來說若要量測驅動晶片的效能,則測試點應該位於驅動晶片上,但由於要在薄膜覆晶封裝結構上量測訊號並不容易,因此一般都會將測試點設置於電路板上。然而,在這兩處端點所量測到的效能並不相同,通常驅動晶片實際的效能會高於所量測的效能。因此,本領域具有通常知識者仍在尋求是否有設計能解決此問題。 In some display devices, in order to meet the requirements of a narrow bezel, the display panel is connected to a circuit board provided with a timing controller through a thin film flip chip package structure, and the driving chip is disposed on the thin film flip chip package structure. Generally speaking, if the performance of the driving chip is to be measured, the test point should be located on the driving chip, but since it is not easy to measure the signal on the film flip-chip package structure, the test point is generally set on the circuit board. However, the performance measured at these two endpoints is not the same, and the actual performance of the driven wafer is usually higher than the measured performance. Therefore, those of ordinary skill in the art are still seeking to see if there is a design that can solve this problem.

本發明的實施例提出一種顯示裝置,包括顯示面板、晶片、電路板與薄膜覆晶封裝結構。薄膜覆晶封裝結構是連接在顯示面板與電路板之間,而晶片是設置於薄膜覆 晶封裝結構上。薄膜覆晶封裝結構包括連接至晶片的第一訊號線與第二訊號線,第一訊號線與第二訊號線之間的間距大於第一訊號線與第二訊號線的線寬。 Embodiments of the present invention provide a display device including a display panel, a wafer, a circuit board, and a film flip chip package structure. The film flip chip package structure is connected between the display panel and the circuit board, and the wafer is disposed on the film cover On the crystal package structure. The thin film flip chip package structure includes a first signal line and a second signal line connected to the chip, and a spacing between the first signal line and the second signal line is greater than a line width of the first signal line and the second signal line.

在一實施例中,第一訊號線與第二訊號線之間的間距大於1.5倍的線寬。 In an embodiment, the spacing between the first signal line and the second signal line is greater than 1.5 times the line width.

在一實施例中,薄膜覆晶封裝結構還包括第一地線與第二地線。第一地線設置於第一訊號線相對於第二訊號線的另一側,第二地線設置於第二訊號線相對於第一訊號線的另一側。第一訊號線與第一間地線之間的第一間距大於上述的線寬,並且第二訊號線與第二地線之間的第二間距也大於線寬。 In an embodiment, the thin film flip chip package structure further includes a first ground line and a second ground line. The first ground line is disposed on the other side of the first signal line relative to the second signal line, and the second ground line is disposed on the other side of the second signal line relative to the first signal line. The first spacing between the first signal line and the first ground line is greater than the line width, and the second spacing between the second signal line and the second ground line is also greater than the line width.

在一實施例中,第一訊號線與第二訊號線之間的間距與薄膜覆晶封裝結構上從晶片量測至電路板的長度成正比。 In one embodiment, the spacing between the first signal line and the second signal line is proportional to the length of the thin film flip chip package from the wafer to the length of the circuit board.

在一實施例中,第一訊號線與第二訊號線之間的間距與晶片的阻抗成反比。 In one embodiment, the spacing between the first signal line and the second signal line is inversely proportional to the impedance of the wafer.

在一實施例中,在薄膜覆晶封裝結構上的每一位置上,第一訊號線與第二訊號線之間的間距與線寬皆維持不變。 In one embodiment, the spacing and line width between the first signal line and the second signal line are maintained at each position on the film flip chip package structure.

在一實施例中,薄膜覆晶封裝結構的特性阻抗大於顯示裝置的系統阻抗。 In one embodiment, the characteristic impedance of the thin film flip chip package structure is greater than the system impedance of the display device.

在一實施例中,薄膜覆晶封裝結構的特性阻抗大於100歐姆。 In one embodiment, the thin film flip chip package has a characteristic impedance greater than 100 ohms.

為讓本發明的上述特徵和優點能更明顯易懂, 下文特舉實施例,並配合所附圖式作詳細說明如下。 To make the above features and advantages of the present invention more apparent, The following specific embodiments are described in detail below with reference to the accompanying drawings.

100‧‧‧顯示裝置 100‧‧‧ display device

110‧‧‧顯示面板 110‧‧‧ display panel

120‧‧‧晶片 120‧‧‧ wafer

130‧‧‧薄膜覆晶封裝結構 130‧‧‧film flip chip package structure

140‧‧‧電路板 140‧‧‧ boards

150‧‧‧軟排線 150‧‧‧Soft cable

151‧‧‧端點 151‧‧‧Endpoint

152‧‧‧測試點 152‧‧‧Test points

160‧‧‧時序控制器 160‧‧‧Sequence Controller

210‧‧‧電壓差 210‧‧‧Voltage difference

310、340‧‧‧地線 310, 340‧‧‧ ground

320、330‧‧‧訊號線 320, 330‧‧‧ signal line

410‧‧‧電壓差 410‧‧‧voltage difference

S、S1、S2‧‧‧間距 S, S1, S2‧‧‧ spacing

W‧‧‧線寬 W‧‧‧Line width

[圖1A]是根據一實施例繪示顯示面板的側視圖。 FIG. 1A is a side view showing a display panel according to an embodiment.

[圖1B]是根據一實施例繪示顯示面板的俯視圖。 FIG. 1B is a top view showing a display panel according to an embodiment.

[圖2A]與[圖2B]描繪了從不同端點量測到的眼圖。 [Fig. 2A] and [Fig. 2B] depict eye diagrams measured from different endpoints.

[圖3]是根據一實施例繪示薄膜覆晶封裝結構上線路的示意圖。 FIG. 3 is a schematic view showing a circuit on a film flip chip package structure according to an embodiment.

[圖4]是根據一實施例繪示增加薄膜覆晶封裝結構130的特性阻抗之後的眼圖。 FIG. 4 is an eye diagram after increasing the characteristic impedance of the thin film flip chip package structure 130 according to an embodiment.

關於本文中所使用之『第一』、『第二』、...等,並非特別指次序或順位的意思,其僅為了區別以相同技術用語描述的元件或操作。 The terms "first", "second", "etc." used in this document are not intended to mean the order or the order, and are merely to distinguish between elements or operations described in the same technical terms.

圖1A是根據一實施例繪示顯示面板的側視圖。圖1B是根據一實施例繪示顯示面板的俯視圖。請參照圖1A與圖1B,顯示裝置100包括顯示面板110、晶片120、薄膜覆晶封裝結構130與電路板140。顯示裝置100可以實作為電視、手機螢幕、電腦螢幕等等,或者顯示裝置100也可以實作為半成品(例如不包括機殼),本發明並不限制將顯示裝置100實作為什麼產品。 FIG. 1A is a side view showing a display panel according to an embodiment. FIG. 1B is a top plan view of a display panel according to an embodiment. Referring to FIGS. 1A and 1B , the display device 100 includes a display panel 110 , a wafer 120 , a thin film flip chip package structure 130 , and a circuit board 140 . The display device 100 can be implemented as a television, a mobile phone screen, a computer screen, etc., or the display device 100 can also be implemented as a semi-finished product (for example, without including a casing), and the present invention does not limit what the display device 100 is.

顯示面板110可以為液晶(Liquid Crystal Display,LCD)顯示面板、有機發光二極體(Organic Light-Emitting Diode,OLED)顯示面板、或其他適合的顯示面板,本發明並不在此限。晶片120例如為閘極或源極驅動晶片,設置在薄膜覆晶封裝結構130上。薄膜覆晶封裝結構130是連接在顯示面板110與該電路板140之間。在一些實施例中,電路板140是透過軟排線(flexible flat cable,FFC)150連接至時序控制器160,但本發明並不限制電路板140的材料與設置在電路板140上的元件。 The display panel 110 can be a liquid crystal (Liquid Crystal) Display, LCD) display panel, Organic Light-Emitting Diode (OLED) display panel, or other suitable display panel, the invention is not limited thereto. The wafer 120 is, for example, a gate or source drive wafer disposed on the thin film flip chip package structure 130. The thin film flip chip package structure 130 is connected between the display panel 110 and the circuit board 140. In some embodiments, the circuit board 140 is coupled to the timing controller 160 via a flexible flat cable (FFC) 150, although the invention does not limit the material of the circuit board 140 to the components disposed on the circuit board 140.

理論上,在端點151上可以量測到晶片120的效能,但由於晶片120是設置在薄膜覆晶封裝結構130上,無法在端點151上進行量測,因此通常會選擇在測試點152量測晶片120的效能。例如,所量測到的訊號可以畫成眼圖(eye diagram),當此眼圖較為打開(open)時,表示效能較好,相反地若眼圖較為關閉(close)表示效能較差。圖2A繪示了從測試點152量測的眼圖,而圖2B繪示了晶片120實際上的眼圖,從圖2A與圖2B可以看出,在圖2B的眼圖較為打開,但圖2A的眼圖則較為關閉,這是因為一般來說電路板140上的阻抗較高(例如100歐姆),但薄膜覆晶封裝結構130與晶片120的阻抗較低,因此當訊號從高阻抗傳輸到低阻抗時會有反向的反射,造成了圖2A的現象。在此實施例中,便是要提高薄膜覆晶封裝結構130的特性阻抗,使得圖2A的問題可以獲得改善。 In theory, the performance of the wafer 120 can be measured at the end point 151, but since the wafer 120 is disposed on the thin film flip chip package 130 and cannot be measured on the end point 151, it is typically selected at the test point 152. The performance of the wafer 120 is measured. For example, the measured signal can be drawn as an eye diagram. When the eye is relatively open, it indicates better performance. Conversely, if the eye is closed, the performance is poor. 2A depicts an eye diagram measured from test point 152, and FIG. 2B depicts a virtually eye diagram of wafer 120. As can be seen from FIG. 2A and FIG. 2B, the eye diagram of FIG. 2B is relatively open, but The eye pattern of 2A is relatively closed because the impedance on the circuit board 140 is generally high (for example, 100 ohms), but the impedance of the thin film flip chip package 130 and the wafer 120 is low, so when the signal is transmitted from high impedance. There is a reverse reflection at low impedance, causing the phenomenon of Figure 2A. In this embodiment, the characteristic impedance of the film flip chip package structure 130 is increased, so that the problem of FIG. 2A can be improved.

圖3是根據一實施例繪示薄膜覆晶封裝結構上線路的示意圖,值得注意的是圖3並沒有按照實際的尺寸繪 示。請參照圖3,在此實施例中,薄膜覆晶封裝結構130上包括了第一訊號線320、第二訊號線330、第一地線310、第二地線340,這些訊號線是連接至晶片120。第一地線310是設置於第一訊號線320相對於第二訊號線330的另一側,而第二地線340是設置於第二訊號線330相對於第一訊號線320的另一側。第一訊號線320與第二訊號線330具有線寬W;第一訊號線320與第二訊號線330之間具有間距S;第一地線310與第一訊號線320之間具有間距S1(亦稱第一間距);第二訊號線330與第二地線340之間具有間距S2(亦稱第二間距)。在此實施例中,第一訊號線320與第二訊號線330具有相同的線寬,且第一間距S1與第二間距S2相同,但在其他實施例中這些數值也可以不相同,本發明並不在此限。 3 is a schematic view showing a circuit on a film flip-chip package structure according to an embodiment, it is noted that FIG. 3 is not drawn according to actual dimensions. Show. Referring to FIG. 3, in this embodiment, the thin film flip chip package structure 130 includes a first signal line 320, a second signal line 330, a first ground line 310, and a second ground line 340. The signal lines are connected to Wafer 120. The first ground line 310 is disposed on the other side of the first signal line 320 relative to the second signal line 330, and the second ground line 340 is disposed on the other side of the second signal line 330 relative to the first signal line 320. . The first signal line 320 and the second signal line 330 have a line width W; the first signal line 320 and the second signal line 330 have a spacing S; and the first ground line 310 and the first signal line 320 have a spacing S1 ( Also known as the first pitch); the second signal line 330 and the second ground line 340 have a spacing S2 (also referred to as a second spacing). In this embodiment, the first signal line 320 and the second signal line 330 have the same line width, and the first spacing S1 is the same as the second spacing S2, but in other embodiments, the values may also be different. Not limited to this.

特別的是,這些線寬與間距會與薄膜覆晶封裝結構130的特性阻抗有關。具體來說,當間距S越大時,薄膜覆晶封裝結構130的特性阻抗會越大;當線寬W越大時,薄膜覆晶封裝結構130的特性阻抗會越小;當第一間距S1與第二間距S2越大時,薄膜覆晶封裝結構130的特性阻抗會越大。因此,若增加間距S、減少線寬W、增加間距S1、S2、或其組合都可以增加薄膜覆晶封裝結構130的特性阻抗。 In particular, these line widths and pitches are related to the characteristic impedance of the film flip chip package structure 130. Specifically, when the pitch S is larger, the characteristic impedance of the film flip chip package structure 130 is larger; when the line width W is larger, the characteristic impedance of the film flip chip package structure 130 is smaller; when the first pitch S1 is The greater the second pitch S2, the greater the characteristic impedance of the thin film flip chip package structure 130. Therefore, if the pitch S is increased, the line width W is decreased, the pitch S1 is increased, or a combination thereof, the characteristic impedance of the film flip chip package structure 130 can be increased.

在一些實施例中,薄膜覆晶封裝結構130並沒有設置第一地線310與第二地線340。在這些實施例中,間距S會大於線寬W。在一些實施例中,間距S會大於1.5倍的線寬W。例如,線寬W可以為27奈米,而間距S可以為189 奈米。如果薄膜覆晶封裝結構130上設置有第一地線310與第二地線340,在一些實施例中,間距S會大於線寬W,並且間距S1、S2都會大於線寬W。例如,線寬W可以為27奈米,間距S可以為189奈米,而間距S1、S2可以為300奈米。值得注意的是,上述的線寬W、間距S、S1、S2僅為範例,本領域具有通常知識者當可透過不過量的實驗來調整出適當的線寬W與間距S、S1、S2。 In some embodiments, the thin film flip chip package structure 130 is not provided with the first ground line 310 and the second ground line 340. In these embodiments, the spacing S will be greater than the line width W. In some embodiments, the spacing S will be greater than 1.5 times the line width W. For example, the line width W can be 27 nm, and the spacing S can be 189. Nano. If the first ground line 310 and the second ground line 340 are disposed on the film flip chip package structure 130, in some embodiments, the pitch S may be greater than the line width W, and the pitches S1, S2 may be greater than the line width W. For example, the line width W may be 27 nm, the pitch S may be 189 nm, and the pitch S1, S2 may be 300 nm. It should be noted that the above-mentioned line width W, spacing S, S1, S2 are merely examples, and those skilled in the art can adjust the appropriate line width W and spacing S, S1, S2 when the experiment is not sufficient.

在上述實施例中是藉由調整線寬W與間距S、S1、S2來增加薄膜覆晶封裝結構130的特性阻抗,然而其他因素會影響所需要的調整量。例如,當晶片120的阻抗越高時,薄膜覆晶封裝結構130便不需要太高的特性阻抗,所需要的調整量會降低,因此可以設定間距S與晶片120的阻抗成反比,以避免當晶片120的阻抗較大時增加太多薄膜覆晶封裝結構130的特性阻抗,形成過度設計(over design)的情況。另外,當薄膜覆晶封裝結構130的長度(從晶片120至電路板140的長度)較小時,則薄膜覆晶封裝結構130本身的特性阻抗也會增加,所需要的調整量便會降低,因此可以設定間距S與薄膜覆晶封裝結構130上從晶片120到電路板140的長度成正比。由於薄膜覆晶封裝結構130的長度會隨著顯示裝置100的尺寸改變,因此在本實施例中會因應顯示裝置100的尺寸而調整間距S。值得注意的是,在上述增加或減少間距S的實施例中,間距S還是會大於線寬W,例如大於線寬W的1.5倍。 In the above embodiment, the characteristic impedance of the thin film flip chip package structure 130 is increased by adjusting the line width W and the pitches S, S1, S2, but other factors may affect the required adjustment amount. For example, when the impedance of the wafer 120 is higher, the thin film flip chip package structure 130 does not require too high characteristic impedance, and the required adjustment amount is lowered, so that the pitch S can be set inversely proportional to the impedance of the wafer 120 to avoid When the impedance of the wafer 120 is large, the characteristic impedance of the thin film flip chip package structure 130 is increased too much to form an over design. In addition, when the length of the film flip chip package structure 130 (the length from the wafer 120 to the circuit board 140) is small, the characteristic impedance of the film flip chip package structure 130 itself is also increased, and the required adjustment amount is reduced. Therefore, the pitch S can be set to be proportional to the length from the wafer 120 to the circuit board 140 on the thin film flip chip package structure 130. Since the length of the film flip chip package structure 130 varies with the size of the display device 100, the pitch S is adjusted in accordance with the size of the display device 100 in this embodiment. It is to be noted that in the above embodiment in which the pitch S is increased or decreased, the pitch S is still greater than the line width W, for example, greater than 1.5 times the line width W.

請參照回圖1B,在一些習知的技術中,在薄膜 覆晶封裝結構130上靠近晶片120的地方,薄膜覆晶封裝結構130上線路的間距會相對地較小。在一些實施例中,在薄膜覆晶封裝結構130的每一個位置上,上述的間距S、S1、S2與線寬W都會維持不變。但在其他實施例中,在不同的位置上也可以有不同的間距S、S1、S2與線寬W,本發明並不在此限。 Referring back to FIG. 1B, in some conventional techniques, in the film Where the flip chip package structure 130 is adjacent to the wafer 120, the pitch of the lines on the thin film flip chip package structure 130 may be relatively small. In some embodiments, the pitches S, S1, S2 and the line width W described above are maintained at each position of the film flip chip package structure 130. However, in other embodiments, different spacings S, S1, S2 and line width W may be present at different locations, and the invention is not limited thereto.

以另一個角度來說,只要增加薄膜覆晶封裝結構130的特性阻抗,都可以改善圖2A中眼圖關閉的問題。在一些實施例中,薄膜覆晶封裝結構130的特性阻抗是大於顯示裝置100的系統阻抗,例如薄膜覆晶封裝結構130的特性阻抗可以大於100歐姆。本領域具有通常知識者,當可理解如何改變上述的間距S、S1、S2與線寬W,使得薄膜覆晶封裝結構130的特性阻抗可以大於100歐姆。或者,也可以使用不同的材料,讓薄膜覆晶封裝結構130的特性阻抗大於100歐姆,例如介電常數越大的材料會有越大的特性阻抗,但本發明並不限制薄膜覆晶封裝結構130使用何種材料。 On the other hand, as long as the characteristic impedance of the film flip chip package structure 130 is increased, the problem of eye pattern closure in FIG. 2A can be improved. In some embodiments, the characteristic impedance of the thin film flip chip package structure 130 is greater than the system impedance of the display device 100. For example, the characteristic impedance of the thin film flip chip package structure 130 may be greater than 100 ohms. Those skilled in the art will understand how to vary the spacings S, S1, S2 and line width W described above such that the characteristic impedance of the thin film flip chip package 130 can be greater than 100 ohms. Alternatively, different materials may be used, so that the characteristic impedance of the film flip chip package structure 130 is greater than 100 ohms. For example, a material having a larger dielectric constant has a larger characteristic impedance, but the present invention does not limit the film flip chip package structure. 130 What materials are used.

圖4是根據一實施例繪示增加薄膜覆晶封裝結構130的特性阻抗之後的眼圖。請參照圖2A與圖4,在根據上述實施例增加薄膜覆晶封裝結構130的特性阻抗之後,可以看出同樣從測試點152量測,但圖4的電壓差410會大於圖2A的電壓差210,表示圖4的眼圖會比圖2A的眼圖較為打開。 4 is an eye diagram after increasing the characteristic impedance of the thin film flip chip package structure 130, in accordance with an embodiment. Referring to FIG. 2A and FIG. 4, after increasing the characteristic impedance of the thin film flip chip package structure 130 according to the above embodiment, it can be seen that the same is measured from the test point 152, but the voltage difference 410 of FIG. 4 is greater than the voltage difference of FIG. 2A. 210, indicating that the eye diagram of FIG. 4 is more open than the eye diagram of FIG. 2A.

雖然本發明已以實施例揭露如上,然其並非用以限定本發明,任何所屬技術領域中具有通常知識者,在不 脫離本發明的精神和範圍內,當可作些許的更動與潤飾,故本發明的保護範圍當視後附的申請專利範圍所界定者為準。 Although the present invention has been disclosed in the above embodiments, it is not intended to limit the present invention, and any one of ordinary skill in the art is not The scope of the present invention is defined by the scope of the appended claims.

130‧‧‧薄膜覆晶封裝結構 130‧‧‧film flip chip package structure

310、340‧‧‧地線 310, 340‧‧‧ ground

320、330‧‧‧訊號線 320, 330‧‧‧ signal line

S、S1、S2‧‧‧間距 S, S1, S2‧‧‧ spacing

W‧‧‧線寬 W‧‧‧Line width

Claims (8)

一種顯示裝置,包括:一顯示面板;一電路板;一薄膜覆晶封裝結構,連接在該顯示面板與該電路板之間,包括一第一訊號線與一第二訊號線;以及一晶片,設置於該薄膜覆晶封裝結構上,其中該第一訊號線與該第二訊號線連接至該晶片,該第一訊號線與該第二訊號線之間的一間距大於該第一訊號線與該第二訊號線的一線寬。 A display device comprising: a display panel; a circuit board; a film flip chip package structure, connected between the display panel and the circuit board, comprising a first signal line and a second signal line; and a chip, The first signal line and the second signal line are connected to the chip, and a distance between the first signal line and the second signal line is greater than the first signal line and The line of the second signal line is one line wide. 如申請專利範圍第1項所述之顯示裝置,其中該第一訊號線與該第二訊號線之間的該間距大於1.5倍的該線寬。 The display device of claim 1, wherein the spacing between the first signal line and the second signal line is greater than 1.5 times the line width. 如申請專利範圍第1項所述之顯示裝置,其中該薄膜覆晶封裝結構還包括一第一地線與一第二地線,該第一地線設置於該第一訊號線相對於該第二訊號線的另一側,該第二地線設置於該第二訊號線相對於該第一訊號線的另一側,該第一訊號線與該第一間地線之間的一第一間距大於該線寬,並且該第二訊號線與該第二地線之間的一第二間距大於該線寬。 The display device of claim 1, wherein the film flip chip package structure further includes a first ground line and a second ground line, wherein the first ground line is disposed on the first signal line relative to the first On the other side of the second signal line, the second ground line is disposed on the other side of the second signal line relative to the first signal line, and a first between the first signal line and the first ground line The spacing is greater than the line width, and a second spacing between the second signal line and the second ground line is greater than the line width. 如申請專利範圍第1項所述之顯示裝置,其中該第一訊號線與該第二訊號線之間的該間距與該薄膜覆晶封裝結構上從該晶片量測至該電路板的一長度成正比。 The display device of claim 1, wherein the spacing between the first signal line and the second signal line is measured from the wafer to a length of the circuit board on the film flip chip package structure. In direct proportion. 如申請專利範圍第1項所述之顯示裝置,其中該第一訊號線與該第二訊號線之間的該間距與該晶片的一阻抗成反比。 The display device of claim 1, wherein the spacing between the first signal line and the second signal line is inversely proportional to an impedance of the wafer. 如申請專利範圍第1項所述之顯示裝置,其中在該薄膜覆晶封裝結構上的每一位置上,該第一訊號線與該第二訊號線之間的該間距與該線寬皆維持不變。 The display device of claim 1, wherein the spacing between the first signal line and the second signal line and the line width are maintained at each position on the film flip chip package structure. constant. 如申請專利範圍第1項所述之顯示裝置,其中該薄膜覆晶封裝結構的一特性阻抗大於該顯示裝置的一系統阻抗。 The display device of claim 1, wherein a characteristic impedance of the thin film flip chip package structure is greater than a system impedance of the display device. 如申請專利範圍第7項所述之顯示裝置,其中該薄膜覆晶封裝結構的該特性阻抗大於100歐姆。 The display device of claim 7, wherein the characteristic impedance of the thin film flip chip package structure is greater than 100 ohms.
TW104139446A 2015-11-26 2015-11-26 Display device TWI573112B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
TW104139446A TWI573112B (en) 2015-11-26 2015-11-26 Display device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
TW104139446A TWI573112B (en) 2015-11-26 2015-11-26 Display device

Publications (2)

Publication Number Publication Date
TWI573112B true TWI573112B (en) 2017-03-01
TW201719610A TW201719610A (en) 2017-06-01

Family

ID=58766024

Family Applications (1)

Application Number Title Priority Date Filing Date
TW104139446A TWI573112B (en) 2015-11-26 2015-11-26 Display device

Country Status (1)

Country Link
TW (1) TWI573112B (en)

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW200725862A (en) * 2005-11-07 2007-07-01 Sharp Kk Integrated circuit chip package
TW201100905A (en) * 2009-06-29 2011-01-01 Au Optronics Corp Display panel and display device
TWI376020B (en) * 2007-12-12 2012-11-01 Au Optronics Corp Chip on film structure
CN103762204A (en) * 2013-12-25 2014-04-30 深圳市华星光电技术有限公司 Chip-on-film module, display panel and display

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TW200725862A (en) * 2005-11-07 2007-07-01 Sharp Kk Integrated circuit chip package
TWI376020B (en) * 2007-12-12 2012-11-01 Au Optronics Corp Chip on film structure
TW201100905A (en) * 2009-06-29 2011-01-01 Au Optronics Corp Display panel and display device
CN103762204A (en) * 2013-12-25 2014-04-30 深圳市华星光电技术有限公司 Chip-on-film module, display panel and display

Also Published As

Publication number Publication date
TW201719610A (en) 2017-06-01

Similar Documents

Publication Publication Date Title
US11296308B2 (en) Flexible display device manufacturing method and flexible display device
US11456320B2 (en) Display device, display module, and electronic device
US10345670B2 (en) Display device including light-emitting element and light-condensing means
WO2019090922A1 (en) Display panel and display apparatus
US9795031B2 (en) Wiring board, flexible display panel and display device
US20140022148A1 (en) Display device
US10515609B2 (en) Display device and operation method thereof, and electronic device
US11189648B2 (en) Array substrate and display device
WO2016150040A1 (en) Array substrate and display device
TWI649014B (en) Flexible electronic equipment and manufacturing method thereof
US20180149920A1 (en) Display device, display module, and electronic device
KR102333321B1 (en) Flexible display device
JP2017156718A5 (en)
US10674606B2 (en) Display panel and display device
TW200638097A (en) Liquid crystal display device
US20170160578A1 (en) Display panel, method of manufacturing the same and display device
KR20140068592A (en) Display device
TWI545381B (en) Display device
WO2017076153A1 (en) Array substrate and display apparatus
US10032808B2 (en) TFT substrate manufacturing method
TWI573112B (en) Display device
KR20160080741A (en) Thin Film Transistor Substrate and Display Device Using the Same
US9373683B2 (en) Thin film transistor
TWI659244B (en) Pixel structure and display device having the same
CN103680344B (en) Display device