TWI572416B - Automatic processing module and method for spraying process - Google Patents

Automatic processing module and method for spraying process Download PDF

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Publication number
TWI572416B
TWI572416B TW104109024A TW104109024A TWI572416B TW I572416 B TWI572416 B TW I572416B TW 104109024 A TW104109024 A TW 104109024A TW 104109024 A TW104109024 A TW 104109024A TW I572416 B TWI572416 B TW I572416B
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Taiwan
Prior art keywords
substrate
baking
sprayed
sprayed substrate
spray
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TW104109024A
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Chinese (zh)
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TW201634128A (en
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黃繼震
黃勝茂
邱智宇
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漢民科技股份有限公司
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Priority to TW104109024A priority Critical patent/TWI572416B/en
Priority to CN201610043836.9A priority patent/CN105983500B/en
Publication of TW201634128A publication Critical patent/TW201634128A/en
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Publication of TWI572416B publication Critical patent/TWI572416B/en

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    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05BSPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
    • B05B13/00Machines or plants for applying liquids or other fluent materials to surfaces of objects or other work by spraying, not covered by groups B05B1/00 - B05B11/00
    • B05B13/02Means for supporting work; Arrangement or mounting of spray heads; Adaptation or arrangement of means for feeding work
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05BSPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
    • B05B13/00Machines or plants for applying liquids or other fluent materials to surfaces of objects or other work by spraying, not covered by groups B05B1/00 - B05B11/00
    • B05B13/02Means for supporting work; Arrangement or mounting of spray heads; Adaptation or arrangement of means for feeding work
    • B05B13/0221Means for supporting work; Arrangement or mounting of spray heads; Adaptation or arrangement of means for feeding work characterised by the means for moving or conveying the objects or other work, e.g. conveyor belts
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05BSPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
    • B05B16/00Spray booths
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05DPROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D3/00Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
    • B05D3/02Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by baking

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  • Coating Apparatus (AREA)
  • Details Or Accessories Of Spraying Plant Or Apparatus (AREA)
  • Spray Control Apparatus (AREA)

Description

用於噴塗製程的自動化處理模組及方法 Automated processing module and method for spraying process

本發明係關於一種自動化模組,且特別係關於一種用於噴塗製程的自動化處理模組。 The present invention relates to an automation module, and more particularly to an automated processing module for a spray coating process.

為了使發光二極體晶片發出特定光線,製造者在製造出發光二極體晶片後,會對發光二極體晶片的表面噴塗螢光粉,以利用混光的效果使發光二極體晶片發出所需光線。舉例來說,欲使發光二極體晶片發出白光時,製造者通常係先製造出藍光發光二極體晶片,再對藍光發光二極體晶片噴塗黃色螢光粉,以使藍光二極體晶片能夠發出白光。 In order to cause the light-emitting diode wafer to emit a specific light, after the manufacturer manufactures the light-emitting diode wafer, the surface of the light-emitting diode wafer is sprayed with phosphor powder to utilize the effect of light mixing to cause the light-emitting diode wafer to be emitted. Need light. For example, when a light-emitting diode chip is to emit white light, the manufacturer usually fabricates a blue light-emitting diode wafer, and then sprays a yellow phosphor powder on the blue light-emitting diode wafer to make the blue light-emitting diode chip. Can emit white light.

一般來說,在發光二極體晶片達到色溫的目標區之前,通常需要經過多道重複的噴塗、烘烤與冷卻等製程。在不同的製程之間,必須人工地搬運發光二極體晶片至下一道製程的機台處,不僅造成時間成本與人力成本的負擔,還容易導致發光二極體晶片受污染甚至損壞。 In general, it is often necessary to perform multiple repeated spraying, baking, and cooling processes before the light-emitting diode wafer reaches the target region of color temperature. Between different processes, it is necessary to manually carry the light-emitting diode chip to the machine of the next process, which not only causes the burden of time cost and labor cost, but also easily causes the light-emitting diode chip to be contaminated or even damaged.

有鑑於此,本發明之一目的在於提供一種用於噴 塗製程的自動化處理模組與自動化處理方法,以省卻人工搬運發光二極體晶片的過程,從而降低時間成本與人力成本,並降低發光二極體晶片受污染或損壞的機率。 In view of the above, it is an object of the present invention to provide a spray for The automated processing module and automated processing method of the coating process saves the process of manually transferring the LED chip, thereby reducing the time cost and labor cost, and reducing the probability of contamination or damage of the LED chip.

為了達到上述目的,依據本發明之一實施方式,一種用於噴塗製程之自動化處理模組包含一載入裝置、一取出裝置以及一烘烤裝置。載入裝置係用以伸入一噴塗室中而將一未噴塗基材送入噴塗室中。取出裝置係用以將一已噴塗基材移出噴塗室外。烘烤裝置係用以烘烤已噴塗基材。 In order to achieve the above object, in accordance with an embodiment of the present invention, an automated processing module for a spray coating process includes a loading device, a take-up device, and a baking device. The loading device is adapted to extend into a spray booth to feed an uncoated substrate into the spray booth. The take-up device is used to move a sprayed substrate out of the spray booth. The baking device is used to bake the coated substrate.

依據本發明之另一實施方式,一種用於噴塗製程之自動化處理方法包含以下步驟。利用一載入裝置伸入一噴塗室中,而將一未噴塗基材送入噴塗室中。利用一取出裝置將一已噴塗基材從噴塗室移出噴塗室外。烘烤已噴塗基材。 According to another embodiment of the present invention, an automated processing method for a spray coating process comprises the following steps. An uncoated substrate is fed into the spray booth using a loading device that extends into a spray booth. A sprayed substrate is removed from the spray booth from the spray booth using a take-up device. Bake the sprayed substrate.

於上述實施方式中,由於可利用載入裝置將未噴塗基材送入噴塗室中,且可利用取出裝置將已噴塗基材移出噴塗室外並供後續的烘烤作業,故可省卻人工搬運基材的過程,從而降低時間成本與人力成本,並降低基材受污染或損壞的機率。 In the above embodiment, since the uncoated substrate can be fed into the spraying chamber by using the loading device, and the taken-out device can be removed from the spraying chamber by the taking-out device for subsequent baking operation, the manual handling base can be omitted. The process of materials, thereby reducing time and labor costs and reducing the chance of contamination or damage to the substrate.

以上所述僅係用以闡述本發明所欲解決的問題、解決問題的技術手段、及其產生的功效等等,本發明之具體細節將在下文的實施方式及相關圖式中詳細介紹。 The above description is only for explaining the problems to be solved by the present invention, the technical means for solving the problems, the effects thereof, and the like, and the specific details of the present invention will be described in detail in the following embodiments and related drawings.

10‧‧‧自動化處理模組 10‧‧‧Automatic processing module

20‧‧‧噴塗模組 20‧‧‧ spray module

21‧‧‧噴塗室 21‧‧‧ spraying room

22‧‧‧輸送裝置 22‧‧‧Conveyor

100‧‧‧載入裝置 100‧‧‧Loading device

110‧‧‧下層軌道 110‧‧‧lower track

120‧‧‧中層軌道 120‧‧‧Middle track

130‧‧‧上層軌道 130‧‧‧Upper track

200‧‧‧取出裝置 200‧‧‧ removal device

210‧‧‧下層軌道 210‧‧‧lower track

220‧‧‧中層軌道 220‧‧‧ middle track

230‧‧‧上層軌道 230‧‧‧Upper track

300‧‧‧烘烤裝置 300‧‧‧ baking device

310‧‧‧加熱口 310‧‧‧heating port

400‧‧‧升降裝置 400‧‧‧ lifting device

500‧‧‧阻熱蓋 500‧‧‧Resistance cover

600‧‧‧移動裝置 600‧‧‧Mobile devices

610‧‧‧承載臂 610‧‧‧ carrying arm

620‧‧‧軌道 620‧‧‧ Track

700‧‧‧冷卻裝置 700‧‧‧Cooling device

800‧‧‧加壓裝置 800‧‧‧Pressure device

A、A1、A2、A3、A4‧‧‧未噴塗基材 A, A1, A2, A3, A4‧‧‧ uncoated substrate

B、B1、B2、B3‧‧‧已噴塗基材 B, B1, B2, B3‧‧‧ sprayed substrate

C‧‧‧處理室 C‧‧‧Processing room

D1、D2、D3、D4、D5‧‧‧箭頭 D1, D2, D3, D4, D5‧‧‧ arrows

L‧‧‧發光二極體晶片 L‧‧‧Light Emitter Wafer

為讓本發明之上述和其他目的、特徵、優點與實施例能更明顯易懂,所附圖式之說明如下: 第1圖繪示依據本發明一實施方式之自動化處理模組與噴塗模組的外觀立體圖;第2圖繪示第1圖所示之自動化處理模組由一視角觀之的內部立體圖;第3圖繪示第1圖所示之自動化處理模組由另一視角觀之的內部立體圖;以及第4A至4R繪示依據本發明一實施方式之自動化處理方法的分解步驟示意圖。 The above and other objects, features, advantages and embodiments of the present invention will become more apparent and understood. 1 is an external perspective view of an automated processing module and a spray module according to an embodiment of the present invention; and FIG. 2 is an internal perspective view of the automated processing module shown in FIG. 1 from a perspective view; The figure shows an internal perspective view of the automated processing module shown in FIG. 1 from another perspective; and FIGS. 4A to 4R illustrate the decomposition steps of the automated processing method according to an embodiment of the present invention.

以下將以圖式揭露本發明之複數實施方式,為明確說明起見,許多實務上的細節將在以下敘述中一併說明。然而,熟悉本領域之技術人員應當瞭解到,在本發明部分實施方式中,這些實務上的細節並非必要的,因此不應用以限制本發明。此外,為簡化圖式起見,一些習知慣用的結構與元件在圖式中將以簡單示意的方式繪示之。另外,為了便於讀者觀看,圖式中各元件的尺寸並非依實際比例繪示。 The embodiments of the present invention are disclosed in the following drawings, and for the purpose of clarity However, it should be understood by those skilled in the art that the details of the invention are not essential to the details of the invention. In addition, some of the conventional structures and elements are shown in the drawings in a simplified schematic manner in order to simplify the drawings. In addition, the dimensions of the various elements in the drawings are not shown in actual scale for the convenience of the reader.

第1圖繪示依據本發明一實施方式之自動化處理模組10與噴塗模組20的外觀立體圖。如第1圖所示,自動化處理模組10可設置於噴塗模組20旁,以將基材送入噴塗模組20中,當噴塗模組20對基材完成噴塗作業後,自動化處理模組10可將已噴塗基材取出,並進行後續製程(如烘烤或冷卻製程),而無須人工地搬運基材。 FIG. 1 is a perspective view showing the appearance of an automated processing module 10 and a spray module 20 according to an embodiment of the present invention. As shown in FIG. 1 , the automated processing module 10 can be disposed adjacent to the spray module 20 to feed the substrate into the spray module 20 , and when the spray module 20 completes the spraying operation on the substrate, the automated processing module 10 The coated substrate can be removed and subjected to subsequent processes (such as baking or cooling processes) without the need to manually transport the substrate.

進一步來說,可參閱第2及3圖,其中第2圖繪示 第1圖所示之自動化處理模組10由一視角觀之的內部立體圖,第3圖繪示第1圖所示之自動化處理模組10由另一視角觀之的內部立體圖。如第2及3圖所示,自動化處理模組10包含載入裝置100、取出裝置200以及烘烤裝置300。載入裝置100可承載未噴塗基材A,並可伸入噴塗模組20之噴塗室(未示於本圖中)中而將未噴塗基材A送入噴塗室中。取出裝置200可將已噴塗基材B移出噴塗室外。烘烤裝置300係用以烘烤已噴塗基材B。 Further, please refer to Figures 2 and 3, wherein Figure 2 shows The automated processing module 10 shown in FIG. 1 is an internal perspective view from a perspective view, and FIG. 3 is an internal perspective view of the automated processing module 10 shown in FIG. 1 viewed from another perspective. As shown in FIGS. 2 and 3, the automated processing module 10 includes a loading device 100, a take-out device 200, and a baking device 300. The loading device 100 can carry the uncoated substrate A and can be inserted into the spray booth (not shown) of the spray module 20 to feed the uncoated substrate A into the spray booth. The take-up device 200 can move the sprayed substrate B out of the spray booth. The baking device 300 is used to bake the coated substrate B.

藉此,可利用載入裝置100將未噴塗基材A送入噴塗室中,而無須人工地搬運未噴塗基材A,相似地,亦可利用取出裝置200將已噴塗基材B移出噴塗室外,而無須人工地搬運已噴塗基材B,如此可降低時間成本與人力成本,並降低未噴塗基材A與已噴塗基材B受污染或損壞的機率。 Thereby, the unsprayed substrate A can be fed into the spray booth by the loading device 100 without manually carrying the unsprayed substrate A. Similarly, the sprayed substrate B can be removed from the spray booth by the take-up device 200. Without the manual handling of the sprayed substrate B, the time cost and labor cost can be reduced, and the probability of contamination or damage of the uncoated substrate A and the sprayed substrate B can be reduced.

於部份實施方式中,未噴塗基材A與已噴塗基材B均可為承載有至少一發光二極體晶片L的載盤,其中未噴塗基材A代表其承載的發光二極體晶片L尚未進行螢光粉的噴塗,而已噴塗基材B代表其承載的發光二極體晶片L已在噴塗模組20中噴塗上螢光粉。 In some embodiments, both the unsprayed substrate A and the sprayed substrate B can be a carrier carrying at least one light-emitting diode wafer L, wherein the uncoated substrate A represents a light-emitting diode wafer carried thereon. L has not been sprayed with phosphor powder, and the coated substrate B represents that the light-emitting diode wafer L carried by it has been sprayed with phosphor powder in the spray module 20.

於部份實施方式中,如第2圖所示,未噴塗基材A可先承載於載入裝置100上,而載入裝置100係可伸縮的,故可伸長而進入噴塗模組20(可參閱第1圖)的噴塗室中,以將未噴塗基材A送入噴塗模組20(可參閱第1圖)的噴塗室中,並置於噴塗模組20中的噴塗機台上。當未噴塗基材A放置於噴塗機台後,載入裝置100可縮回至噴塗模組20外,以利噴塗室而對 未噴塗基材A進行螢光粉噴塗作業。 In some embodiments, as shown in FIG. 2, the uncoated substrate A can be first loaded on the loading device 100, and the loading device 100 is telescopic, so that it can be extended into the spray module 20 ( Referring to the spray booth of Fig. 1), the uncoated substrate A is fed into the spray booth of the spray module 20 (see Fig. 1) and placed on the spray booth in the spray module 20. When the uncoated substrate A is placed on the spraying machine, the loading device 100 can be retracted to the outside of the spraying module 20 to facilitate the spraying chamber. The substrate A was not sprayed for the phosphor powder coating operation.

具體來說,如第2圖所示,載入裝置100可包含下層軌道110、中層軌道120以及上層軌道130。上層軌道130係疊合於中層軌道120上,且上層軌道130可相對中層軌道120而沿著X軸滑動。中層軌道120係疊合於下層軌道110上,且中層軌道120可相對下層軌道110沿著X軸滑動。因此,上層軌道130可在中層軌道120上沿著X軸朝噴塗模組20(可參閱第1圖)滑動,而中層軌道120可在下層軌道110上沿著X軸朝噴塗模組20滑動,使得載入裝置100可沿著X軸伸長而將未噴塗基材A送入噴塗模組20的噴塗室中。當未噴塗基材A送入噴塗室後,上層軌道130可在中層軌道120上沿著X軸背離噴塗模組20滑動,而中層軌道120可在下層軌道110上沿著X軸背離噴塗模組20滑動,使得載入裝置100可縮回。 Specifically, as shown in FIG. 2, the loading device 100 may include a lower track 110, a middle track 120, and an upper track 130. The upper track 130 is superposed on the middle track 120, and the upper track 130 is slidable along the X axis with respect to the middle track 120. The middle track 120 is superposed on the lower track 110, and the middle track 120 is slidable along the X axis with respect to the lower track 110. Therefore, the upper track 130 can slide along the X axis toward the spray module 20 (see FIG. 1) on the middle track 120, and the middle track 120 can slide along the X axis toward the spray module 20 on the lower track 110. The loading device 100 is allowed to elongate along the X-axis to feed the uncoated substrate A into the spray booth of the spray module 20. When the uncoated substrate A is sent into the spraying chamber, the upper rail 130 can slide away from the spraying module 20 along the X axis on the middle rail 120, and the middle rail 120 can be separated from the spraying module along the X axis on the lower rail 110. 20 slides so that the loading device 100 can be retracted.

應瞭解到,本發明實施方式係以三層的可伸縮結構做為載入裝置100的範例,但本發明並不以此為限。製造者亦可依實際需求採用四層、五層或多層的可伸縮結構來做為載入裝置100。 It should be understood that the embodiment of the present invention uses a three-layered retractable structure as an example of the loading device 100, but the invention is not limited thereto. The manufacturer can also use the four-layer, five-layer or multi-layer telescopic structure as the loading device 100 according to actual needs.

相似於載入裝置100,取出裝置200亦可包含下層軌道210、中層軌道220以及上層軌道230。上層軌道230係疊合於中層軌道220上,且上層軌道230可相對中層軌道220而沿著X軸滑動。中層軌道220係疊合於下層軌道210上,且中層軌道220可相對下層軌道210沿著X軸滑動。因此,上層軌道230可在中層軌道220上沿著X軸朝噴塗模組20(可參閱第1圖)滑動,而中層軌道220可在下層軌道210上沿著X軸朝噴塗模組 20滑動,使得取出裝置200可沿著X軸伸長而取起噴塗模組20之噴塗室中的已噴塗基材B。當已噴塗基材B被取起後,上層軌道230可在中層軌道220上沿著X軸背離噴塗模組20滑動,而中層軌道220可在下層軌道210上沿著X軸背離噴塗模組20滑動,使得取出裝置200可縮回,而將已噴塗基材B取出噴塗模組20外。 Similar to the loading device 100, the retrieval device 200 can also include a lower track 210, a middle track 220, and an upper track 230. The upper track 230 is superposed on the middle track 220, and the upper track 230 is slidable along the X axis with respect to the middle track 220. The middle track 220 is superposed on the lower track 210, and the middle track 220 is slidable along the X axis with respect to the lower track 210. Therefore, the upper track 230 can slide along the X axis toward the spray module 20 (see FIG. 1) on the middle track 220, and the middle track 220 can face the spray module along the X axis on the lower track 210. The sliding 20 causes the take-up device 200 to elongate along the X-axis to pick up the sprayed substrate B in the spray booth of the spray module 20. After the sprayed substrate B is taken up, the upper track 230 can slide away from the spray module 20 along the X axis on the middle track 220, and the middle track 220 can face away from the spray module 20 along the X axis on the lower track 210. Sliding causes the take-up device 200 to be retracted, and the sprayed substrate B is taken out of the spray module 20.

應瞭解到,本發明實施方式係以三層的可伸縮結構做為取出裝置200的範例,但本發明並不以此為限。製造者亦可依實際需求採用四層、五層或多層的可伸縮結構來做為取出裝置200。 It should be understood that the embodiment of the present invention uses a three-layered retractable structure as an example of the take-out device 200, but the invention is not limited thereto. The manufacturer can also use the four-layer, five-layer or multi-layer telescopic structure as the take-out device 200 according to actual needs.

於部份實施方式中,如第3圖所示,取出裝置200之最高位置(如上層軌道230的頂面)的水平高度係低於烘烤裝置300之最低位置的水平高度。如此一來,取出裝置200可在烘烤裝置300下方伸縮,而不會干涉到烘烤裝置300的烘烤作業。 In some embodiments, as shown in FIG. 3, the highest position of the take-up device 200 (the top surface of the upper track 230) is lower than the lowest position of the bake unit 300. In this way, the take-up device 200 can be stretched under the baking device 300 without interfering with the baking operation of the baking device 300.

為了利於烘烤裝置300烘烤已噴塗基材B,於部份實施方式中,如第3圖所示,自動化處理模組10可進一步包含升降裝置400。升降裝置400係用以將已噴塗基材B從取出裝置200抬升至烘烤裝置300,以供烘烤裝置300烘烤。具體來說,當取出裝置200取出已噴塗基材B時,取出裝置200可先內縮使得已噴塗基材B不在升降裝置400下方。接著,升降裝置400可先下降至比已噴塗基材B的水平高度更低的位置。接著,取出裝置200可伸長而將已噴塗基材B送至升降裝置400上方。接著,升降裝置400可上升,而將已噴塗基材B抬升至烘烤裝置 300。 In order to facilitate the baking of the coated substrate B by the baking device 300, in some embodiments, as shown in FIG. 3, the automated processing module 10 may further include a lifting device 400. The lifting device 400 is used to lift the sprayed substrate B from the take-up device 200 to the baking device 300 for baking by the baking device 300. Specifically, when the take-up device 200 takes out the sprayed substrate B, the take-up device 200 can be first retracted such that the sprayed substrate B is not under the lift device 400. Next, the lifting device 400 can first be lowered to a position lower than the level of the substrate B that has been sprayed. Next, the take-up device 200 can be extended to deliver the sprayed substrate B above the lift device 400. Then, the lifting device 400 can be raised, and the sprayed substrate B is raised to the baking device. 300.

於部份實施方式中,如第3圖所示,烘烤裝置300可具有加熱口310。升降裝置400可抬升已噴塗基材B並使已噴塗基材B封閉加熱口310。如此一來,不僅可提升已噴塗基材B的烘烤效果,也可防止烘烤裝置300的熱能外散。具體來說,烘烤裝置300可為具有熱源的盆狀結構,而加熱口310即為盆狀結構的開口。當已噴塗基材B封閉加熱口310時,可大量接受熱源所提供的熱能,而提升烘烤效果。 In some embodiments, as shown in FIG. 3, the toasting device 300 can have a heating port 310. The lifting device 400 can lift the sprayed substrate B and cause the sprayed substrate B to close the heating port 310. In this way, not only the baking effect of the sprayed substrate B but also the heat energy of the baking device 300 can be prevented. Specifically, the baking device 300 may be a basin-like structure having a heat source, and the heating port 310 is an opening of a basin-like structure. When the sprayed substrate B closes the heating port 310, the heat energy provided by the heat source can be received in a large amount to enhance the baking effect.

於部份實施方式中,當加熱口310下方並無已噴塗基材B時,為了防止烘烤裝置300的熱能外散,而影響到自動化處理模組10中的其他裝置,自動化處理模組10可進一步包含阻熱蓋500。阻熱蓋500可在升降裝置400尚未抬升已噴塗基材B時,封閉加熱口310,以防止烘烤裝置300的熱能外散。舉例來說,當升降裝置400尚未抬升已噴塗基材B時,阻熱蓋500可位於加熱口310下方以封閉加熱口310,當升降裝置400即將抬升已噴塗基材B時,阻熱蓋500可沿著Y軸方向離開加熱口310,以利升降裝置400將已噴塗基材B抬升至加熱口310,並封閉加熱口310。 In some embodiments, when there is no substrate B sprayed under the heating port 310, in order to prevent the thermal energy of the baking device 300 from spreading, affecting other devices in the automated processing module 10, the automated processing module 10 The heat blocking cover 500 may be further included. The heat blocking cover 500 can close the heating port 310 when the lifting device 400 has not lifted the sprayed substrate B to prevent the heat energy of the baking device 300 from being dissipated. For example, when the lifting device 400 has not lifted the sprayed substrate B, the heat blocking cover 500 may be located below the heating port 310 to close the heating port 310. When the lifting device 400 is about to lift the sprayed substrate B, the heat blocking cover 500 The heating port 310 can be separated from the Y-axis direction to facilitate the lifting device 400 to lift the sprayed substrate B to the heating port 310 and close the heating port 310.

於部份實施方式中,如第3圖所示,自動化處理模組10可進一步包含移動裝置600以及冷卻裝置700。移動裝置600可將烘烤後的已噴塗基材B移動至冷卻裝置700,而冷卻裝置700可冷卻烘烤後的已噴塗基材B。具體來說,移動裝置600可包含承載臂610與軌道620。承載臂610係設置於軌道620上,並可沿著軌道620移動。軌道620的長度方向係平行於 烘烤裝置300與冷卻裝置700的排列方向。如此一來,承載臂610可沿著軌道620的長度方向移動至烘烤裝置300取走已噴塗基材B,再將已噴塗基材B移動至冷卻裝置700。舉例來說,在本圖中,軌道620的長度方向係平行於Y軸,而烘烤裝置300與冷卻裝置700係沿著Y軸排列的。 In some embodiments, as shown in FIG. 3, the automated processing module 10 can further include a mobile device 600 and a cooling device 700. The mobile device 600 can move the baked coated substrate B to the cooling device 700, and the cooling device 700 can cool the baked coated substrate B. In particular, the mobile device 600 can include a carrier arm 610 and a track 620. The carrier arm 610 is disposed on the rail 620 and is movable along the rail 620. The length direction of the track 620 is parallel to The arrangement direction of the baking device 300 and the cooling device 700. In this way, the carrying arm 610 can be moved along the length direction of the rail 620 to the baking device 300 to take off the sprayed substrate B, and then the sprayed substrate B is moved to the cooling device 700. For example, in the figure, the length direction of the track 620 is parallel to the Y axis, and the bake unit 300 and the cooling device 700 are arranged along the Y axis.

在使用時,承載臂610可先沿著軌道620移動至烘烤裝置300下方,當已噴塗基材B烘烤後,升降裝置400可下降,而將已噴塗基材B下降至承載臂610上。接著,承載臂610可承載著已噴塗基材B,並沿著軌道620移動至冷卻裝置700上,而連帶地將已噴塗基材B移動至冷卻裝置700上,以利冷卻裝置700冷卻已噴塗基材B。 In use, the carrying arm 610 can first move along the rail 620 to below the baking device 300. When the sprayed substrate B is baked, the lifting device 400 can be lowered, and the sprayed substrate B can be lowered onto the carrying arm 610. . Next, the carrying arm 610 can carry the sprayed substrate B and move along the rail 620 to the cooling device 700, and then the sprayed substrate B is moved to the cooling device 700, so that the cooling device 700 is cooled and sprayed. Substrate B.

於部份實施方式中,如第3圖所示,冷卻裝置700可為冷卻板。當烘烤後的高溫已噴塗基材B移動至低溫的冷卻板上時,已噴塗基材B的熱能可傳遞至冷卻板上,而可實現冷卻已噴塗基材B的效果。 In some embodiments, as shown in FIG. 3, the cooling device 700 can be a cooling plate. When the high temperature sprayed substrate B after baking is moved to the low temperature cooling plate, the thermal energy of the sprayed substrate B can be transferred to the cooling plate, and the effect of cooling the sprayed substrate B can be achieved.

於部份實施方式中,如第3圖所示,自動化處理模組10還可包含處理室C以及加壓裝置800。處理室C可容納載入裝置100、取出裝置200與烘烤裝置300、升降裝置400、阻熱蓋500、移動裝置600及冷卻裝置700。換句話說,已噴塗基材B之移載、烘烤及冷卻作業均係在處理室C中進行的。加壓裝置800係用以提升處理室C中的氣壓。如此一來,即使已噴塗基材B上的螢光粉尚未完全附著於發光二極體晶片L上,由於處理室C中的氣壓可被提高,故可防止經過噴塗製程,散逸於噴塗模組20的噴塗室內的螢光粉塵飄散在處理室C中。於部 份實施方式中,加壓裝置800可為風扇,但本發明並不以此為限。 In some embodiments, as shown in FIG. 3, the automated processing module 10 can further include a processing chamber C and a pressurizing device 800. The processing chamber C can accommodate the loading device 100, the take-out device 200 and the baking device 300, the lifting device 400, the heat-resistant cover 500, the moving device 600, and the cooling device 700. In other words, the transfer, baking and cooling operations of the sprayed substrate B are carried out in the process chamber C. The pressurizing device 800 is used to raise the air pressure in the process chamber C. In this way, even if the phosphor powder on the sprayed substrate B is not completely attached to the LED wafer L, since the air pressure in the processing chamber C can be improved, the spray coating process can be prevented from being dissipated into the spray module. Fluorescent dust in the spray booth of 20 is dispersed in the process chamber C. Yubu In some embodiments, the pressing device 800 can be a fan, but the invention is not limited thereto.

第4A至4R繪示依據本發明一實施方式之自動化處理方法的分解步驟示意圖。如第4A圖所示,首先,可先將未噴塗基材A1放置於載入裝置100上。接著,在第4B圖中,載入裝置100伸入噴塗模組20的噴塗室21中,而將未噴塗基材A1送入噴塗室21中。接著,載入裝置100可縮回至噴塗室21外,而使用者可將另一未噴塗基材A2放置於載入裝置100上。 4A to 4R are schematic diagrams showing the decomposition steps of the automated processing method according to an embodiment of the present invention. As shown in FIG. 4A, first, the uncoated substrate A1 can be placed on the loading device 100 first. Next, in FIG. 4B, the loading device 100 is inserted into the spray booth 21 of the spray module 20, and the uncoated substrate A1 is fed into the spray booth 21. Next, the loading device 100 can be retracted out of the spray booth 21, and the user can place another uncoated substrate A2 on the loading device 100.

接著,於第4C圖中,噴塗模組20可對未噴塗基材A1(可參閱第4B圖)噴塗螢光粉而產生已噴塗基材B1。噴塗室21中的輸送裝置22可將已噴塗基材B1輸送至對應取出裝置200的位置。另於第4C圖中,載入裝置100可伸出而將未噴塗基材A2送至噴塗室21入口等待噴塗。 Next, in FIG. 4C, the spray module 20 can spray the phosphor powder on the unsprayed substrate A1 (see FIG. 4B) to produce the sprayed substrate B1. The transport device 22 in the spray booth 21 can transport the sprayed substrate B1 to a position corresponding to the take-up device 200. In addition, in Fig. 4C, the loading device 100 can be extended to feed the uncoated substrate A2 to the inlet of the spray booth 21 for spraying.

接著,於第4D圖中,取出裝置200可伸入噴塗室21中,而將已噴塗基材B1取出噴塗室21外,且取出裝置200的縮回可使已噴塗基材B1經過烘烤裝置300下方,而在比烘烤裝置300更遠離噴塗室21的位置等待。此時,載入裝置100可伸出而將未噴塗基材A2送入噴塗室21中進行噴塗作業,且當未噴塗基材A2送入噴塗室21後,載入裝置100可縮回至噴塗室21外,而供使用者放置另一未噴塗基材A3。 Next, in FIG. 4D, the take-up device 200 can be inserted into the spray booth 21, and the sprayed substrate B1 is taken out of the spray booth 21, and the retraction of the take-up device 200 can pass the sprayed substrate B1 through the baking device. Below 300, it waits at a position farther from the spraying chamber 21 than the baking device 300. At this time, the loading device 100 can be extended to feed the unsprayed substrate A2 into the spray booth 21 for spraying operation, and when the uncoated substrate A2 is fed into the spray booth 21, the loading device 100 can be retracted to the spray coating. Outside the chamber 21, the user places another unsprayed substrate A3.

接著,於第4E圖中,取出裝置200可伸長而將已噴塗基材B1送至烘烤裝置300下方。舉例來說,如第4F與第4G圖所示,這兩圖繪示「將已噴塗基材B1送至烘烤裝置300下方」的側視示意圖。於第4F圖中,取出裝置200係呈收縮狀態的, 使得已噴塗基材B1不位於烘烤裝置300下方。於第4G圖,取出裝置200可沿著箭頭D1的方向伸長,而將已噴塗基材B1送到烘烤裝置300下方。接著,於第4H圖中,升降裝置400可沿著箭頭D2的方向上升,而將已噴塗基材B1抬升至烘烤裝置300,使得烘烤裝置300可對已噴塗基材B1進行烘烤作業,以烘乾已噴塗基材B1上所噴塗的螢光粉漿料。 Next, in FIG. 4E, the take-up device 200 can be extended to feed the sprayed substrate B1 under the baking device 300. For example, as shown in FIGS. 4F and 4G, the two figures show a schematic side view of "sending the coated substrate B1 under the baking device 300." In FIG. 4F, the take-up device 200 is in a contracted state. The sprayed substrate B1 is not placed below the baking device 300. In Fig. 4G, the take-up device 200 can be elongated in the direction of the arrow D1 to feed the sprayed substrate B1 under the baking device 300. Next, in FIG. 4H, the lifting device 400 can be raised in the direction of the arrow D2 to lift the sprayed substrate B1 to the baking device 300, so that the baking device 300 can perform the baking operation on the sprayed substrate B1. To dry the phosphor powder sprayed on the sprayed substrate B1.

另回到第4E圖,當烘烤裝置300在對已噴塗基材B1進行烘烤作業時,噴塗模組20已對未噴塗基材A2(可參閱第4D圖)完成噴塗而產生已噴塗基材B2,並由輸送裝置22將已噴塗基材B2送至對應取出裝置200的位置。 Returning to FIG. 4E, when the baking apparatus 300 performs the baking operation on the sprayed substrate B1, the spray module 20 has completed spraying on the unsprayed substrate A2 (see FIG. 4D) to produce the sprayed base. The material B2 is conveyed by the conveying device 22 to the position corresponding to the take-out device 200.

接著,在第4I圖中,當烘烤裝置300在對已噴塗基材B1進行烘烤作業時,取出裝置200可經過已噴塗基材B1的下方,而從升降裝置400的下方沿著箭頭D3的方向朝噴塗室21(可參閱第4E圖)伸出,以取得已噴塗基材B2。由於取出裝置200係在升降裝置400下方伸縮的,故不影響已噴塗基材B1的烘烤作業。 Next, in FIG. 4I, when the baking apparatus 300 performs a baking operation on the sprayed substrate B1, the take-up apparatus 200 may pass under the sprayed substrate B1, and from the lower side of the lift apparatus 400 along the arrow D3. The direction is directed toward the spray booth 21 (see Figure 4E) to obtain the sprayed substrate B2. Since the take-up device 200 is stretched under the lifting device 400, it does not affect the baking operation of the sprayed substrate B1.

接著,在第4J圖中,取出裝置200可沿著箭頭D4的方向縮回,而將已噴塗基材B2取出至噴塗室21(可參閱第4E圖)外,並將已噴塗基材B2移動至不位於烘烤裝置300下方的位置等待。換句話說,如第4K圖所示,已噴塗基材B2可在比烘烤裝置300更遠離噴塗室21的位置等待。 Next, in FIG. 4J, the take-out device 200 can be retracted in the direction of the arrow D4, and the sprayed substrate B2 is taken out to the spray booth 21 (see FIG. 4E), and the sprayed substrate B2 is moved. Wait until the position below the baking device 300. In other words, as shown in FIG. 4K, the sprayed substrate B2 can wait at a position farther from the spray booth 21 than the baking device 300.

接著,在第4L圖中,承載臂610可沿著軌道620移動至烘烤裝置300下方。接著,如第4M圖所示,升降裝置400可沿著箭頭D5的方向下降,而下降烘烤後的已噴塗基材B1, 以將烘烤後的已噴塗基材B1送至承載臂610上。 Next, in the 4th L, the carrying arm 610 can be moved along the rail 620 below the baking device 300. Next, as shown in FIG. 4M, the lifting device 400 can be lowered in the direction of the arrow D5, and the baked substrate B1 after baking is lowered. The baked substrate B1 after baking is sent to the carrier arm 610.

接著,在第4N圖中,承載臂610可沿著軌道620將已噴塗基材B1移動至冷卻裝置700上,使得冷卻裝置700可對烘烤後的已噴塗基材B1進行冷卻作業。在第4N圖中,載入裝置100可將未噴塗基材A3送入噴塗室21後,縮回至噴塗室21外,而使用者可將另一未噴塗基材A4放置於載入裝置100上。 Next, in FIG. 4N, the carrying arm 610 can move the sprayed substrate B1 along the rail 620 onto the cooling device 700, so that the cooling device 700 can perform a cooling operation on the baked substrate B1 after baking. In FIG. 4N, the loading device 100 can feed the unsprayed substrate A3 into the spray booth 21 and retract outside the spray booth 21, and the user can place another uncoated substrate A4 on the loading device 100. on.

接著,在第4O圖中,取出裝置200可伸長而將已噴塗基材B2送至烘烤裝置300下方,而升降裝置400可藉由如第4G至4H圖的步驟將已噴塗基材B2抬升至烘烤裝置300,以使烘烤裝置300對已噴塗基材B2進行烘烤作業。在第4O圖中,噴塗模組20可對未噴塗基材A3(可參閱第4N圖)噴塗螢光粉而產生已噴塗基材B3,且輸送裝置22可將已噴塗基材B3送至對應取出裝置200的位置。在第4O圖中,載入裝置100可伸出而將未噴塗基材A4送至噴塗室21的入口等待。 Next, in FIG. 4O, the take-up device 200 can be extended to send the sprayed substrate B2 under the baking device 300, and the lifting device 400 can lift the sprayed substrate B2 by the steps as shown in Figures 4G to 4H. To the baking device 300, the baking device 300 performs a baking operation on the sprayed substrate B2. In FIG. 4O, the spray module 20 can spray the phosphor powder to the unsprayed substrate A3 (see FIG. 4N) to produce the sprayed substrate B3, and the transport device 22 can send the sprayed substrate B3 to the corresponding The position of the device 200 is taken out. In Fig. 4O, the loading device 100 can be extended to wait for the unsprayed substrate A4 to be sent to the inlet of the spray booth 21.

接著,在第4P圖中,取出裝置200可在烘烤裝置300與已噴塗基材B2的下方伸縮,而從噴塗室21取出已噴塗基材B3,並將已噴塗基材B3移動至比烘烤裝置300更遠離噴塗室21的位置等待。 Next, in FIG. 4P, the take-out device 200 can be expanded and contracted under the baking device 300 and the sprayed substrate B2, and the sprayed substrate B3 is taken out from the spray booth 21, and the sprayed substrate B3 is moved to a specific baking. The grilling device 300 waits farther away from the spray booth 21.

接著,在第4Q圖中,載入裝置100可伸長而將未噴塗基材A4送入噴塗室21中,以進行噴塗作業。接著,在第4R圖中,移動裝置600可將冷卻後的已噴塗基材B1移動至載入裝置100上,而供使用者取出。具體來說,承載臂610可帶著已噴塗基材B1沿著軌道620朝向載入裝置100移動,並將已噴 塗基材B1放置於載入裝置100上。 Next, in the 4th drawing, the loading device 100 can be stretched to feed the uncoated substrate A4 into the coating chamber 21 to perform the spraying operation. Next, in FIG. 4R, the mobile device 600 can move the cooled sprayed substrate B1 onto the loading device 100 for the user to take out. Specifically, the carrying arm 610 can move along the track 620 toward the loading device 100 with the sprayed substrate B1 and will have been sprayed The coated substrate B1 is placed on the loading device 100.

由上述步驟流程可知,本實施方式之自動處理方法不僅可無須人工地搬運基材,且最多可容許4個基材(未噴塗基材A1、A2、A3及A4)位在自動化處理模組10及噴塗模組20中,而大幅提昇處理效率。 It can be seen from the above process flow that the automatic processing method of the present embodiment can not only carry the substrate manually, but also can allow up to four substrates (the uncoated substrates A1, A2, A3 and A4) to be located in the automated processing module 10. And in the spray module 20, the processing efficiency is greatly improved.

於部份實施方式中,使用者亦可將一檢測用基材放在載入裝置100中,而當載入裝置100將檢測用基材送入噴塗室21噴塗後,載入裝置100便直接將此檢測用基材取出,而供使用者觀察螢光粉噴塗狀況是否正常。 In some embodiments, the user can also place a test substrate in the loading device 100, and when the loading device 100 feeds the test substrate into the spray booth 21, the loading device 100 directly The substrate for the test is taken out, and the user can observe whether the spray state of the phosphor powder is normal.

雖然本發明已以實施方式揭露如上,然其並非用以限定本發明,任何熟習此技藝者,在不脫離本發明之精神和範圍內,當可作各種之更動與潤飾,因此本發明之保護範圍當視後附之申請專利範圍所界定者為準。 Although the present invention has been disclosed in the above embodiments, it is not intended to limit the present invention, and the present invention can be modified and modified without departing from the spirit and scope of the present invention. The scope is subject to the definition of the scope of the patent application attached.

10‧‧‧自動化處理模組 10‧‧‧Automatic processing module

100‧‧‧載入裝置 100‧‧‧Loading device

110‧‧‧下層軌道 110‧‧‧lower track

120‧‧‧中層軌道 120‧‧‧Middle track

130‧‧‧上層軌道 130‧‧‧Upper track

200‧‧‧取出裝置 200‧‧‧ removal device

210‧‧‧下層軌道 210‧‧‧lower track

220‧‧‧中層軌道 220‧‧‧ middle track

230‧‧‧上層軌道 230‧‧‧Upper track

300‧‧‧烘烤裝置 300‧‧‧ baking device

600‧‧‧移動裝置 600‧‧‧Mobile devices

610‧‧‧承載臂 610‧‧‧ carrying arm

620‧‧‧軌道 620‧‧‧ Track

800‧‧‧加壓裝置 800‧‧‧Pressure device

A‧‧‧未噴塗基材 A‧‧‧Uncoated substrate

B‧‧‧已噴塗基材 B‧‧‧Sprayed substrate

C‧‧‧處理室 C‧‧‧Processing room

L‧‧‧發光二極體晶片 L‧‧‧Light Emitter Wafer

Claims (14)

一種用於噴塗製程之自動化處理模組,包含:一載入裝置,用以伸入一噴塗室中而將一未噴塗基材送入該噴塗室中;一取出裝置,用以將一已噴塗基材移出該噴塗室外;一烘烤裝置,用以烘烤該已噴塗基材;以及一升降裝置,用以將該已噴塗基材從該取出裝置抬升至該烘烤裝置。 An automated processing module for a spray coating process, comprising: a loading device for extending into a spray booth to feed an unsprayed substrate into the spray booth; and a take-up device for spraying a spray The substrate is removed from the spray booth; a baking device is used to bake the sprayed substrate; and a lifting device is used to lift the sprayed substrate from the take-up device to the baking device. 如請求項1所述之用於噴塗製程之自動化處理模組,其中該烘烤裝置具有一加熱口,該升降裝置係用以抬升該已噴塗基材並使該已噴塗基材封閉該加熱口。 The automatic processing module for a spraying process according to claim 1, wherein the baking device has a heating port for lifting the sprayed substrate and sealing the sprayed substrate to the heating port. . 如請求項2所述之用於噴塗製程之自動化處理模組,更包含一阻熱蓋,用以在該升降裝置尚未抬升該已噴塗基材時,封閉該加熱口。 The automatic processing module for spraying process according to claim 2, further comprising a heat blocking cover for closing the heating port when the lifting device has not lifted the sprayed substrate. 如請求項1所述之用於噴塗製程之自動化處理模組,更包含一冷卻裝置,用以冷卻烘烤後的該已噴塗基材。 The automated processing module for the spraying process of claim 1, further comprising a cooling device for cooling the baked substrate after baking. 如請求項4所述之用於噴塗製程之自動化處理模組,其中該升降裝置用以在該已噴塗基材烘烤後,下降該已噴塗基材,且該自動化處理模組更包含:一移動裝置,用以將烘烤並下降後的該已噴塗基材從該 升降裝置移動至該冷卻裝置。 The automatic processing module for the spraying process of claim 4, wherein the lifting device is configured to lower the sprayed substrate after the sprayed substrate is baked, and the automated processing module further comprises: a moving device for baking and lowering the sprayed substrate from the The lifting device moves to the cooling device. 如請求項1所述之用於噴塗製程之自動化處理模組,更包含:一處理室,容納該載入裝置、該取出裝置與該烘烤裝置;以及一加壓裝置,用以提升該處理室中的氣壓。 The automatic processing module for spraying a process according to claim 1, further comprising: a processing chamber for accommodating the loading device, the taking device and the baking device; and a pressing device for lifting the processing Air pressure in the room. 如請求項1所述之用於噴塗製程之自動化處理模組,其中該載入裝置與該取出裝置均係可伸縮的。 The automated processing module for a spray coating process of claim 1, wherein the loading device and the removal device are both telescopic. 一種用於噴塗製程之自動化處理方法,包含:利用一載入裝置伸入一噴塗室中,而將一未噴塗基材送入該噴塗室中;利用一取出裝置將一已噴塗基材從該噴塗室移出該噴塗室外;將該已噴塗基材從該取出裝置抬升至一烘烤裝置;以及烘烤該已噴塗基材。 An automated processing method for a spray coating process, comprising: using a loading device to extend into a spray booth, and feeding an unsprayed substrate into the spray booth; using a take-up device to apply a sprayed substrate from the spray chamber Spraying the chamber out of the spray booth; lifting the sprayed substrate from the take-up device to a baking device; and baking the sprayed substrate. 如請求項8所述之用於噴塗製程之自動化處理方法,其中當該已噴塗基材被抬升至該烘烤裝置時,該取出裝置係將另一已噴塗基材從該噴塗室移出該噴塗室外,並經過該被抬升的已噴塗基材下方。 An automated processing method for a spray coating process according to claim 8, wherein when the sprayed substrate is lifted to the baking device, the take-up device removes another sprayed substrate from the spray booth. Outside, and under the raised sprayed substrate. 如請求項8所述之用於噴塗製程之自動化處 理方法,其中該已噴塗基材係被抬升而封閉該烘烤裝置之一加熱口。 Automated office for spraying process as described in claim 8 The method wherein the sprayed substrate is lifted to close a heating port of the baking device. 如請求項8所述之用於噴塗製程之自動化處理方法,其中將該已噴塗基材從該取出裝置抬升至該烘烤裝置包含:在該已噴塗基材尚未被抬升時,利用一阻熱蓋封閉該烘烤裝置之一加熱口;以及在該阻熱蓋離開該加熱口後,抬升該已噴塗基材。 An automated processing method for a spray coating process according to claim 8, wherein lifting the sprayed substrate from the take-up device to the baking device comprises: utilizing a heat-resistant heat when the sprayed substrate has not been lifted The lid closes a heating port of the baking device; and after the heat blocking cover leaves the heating port, the sprayed substrate is lifted. 如請求項8所述之用於噴塗製程之自動化處理方法,更包含冷卻烘烤後的該已噴塗基材。 The automated processing method for the spray coating process of claim 8, further comprising cooling the baked substrate after baking. 如請求項12所述之用於噴塗製程之自動化處理方法,其中冷卻烘烤後之該已噴塗基材包含:下降該已噴塗基材;移動該已噴塗基材至一冷卻裝置;以及利用該冷卻裝置冷卻該已噴塗基材。 The automated processing method for a spray coating process of claim 12, wherein the sprayed substrate after cooling and baking comprises: lowering the sprayed substrate; moving the sprayed substrate to a cooling device; and utilizing the A cooling device cools the sprayed substrate. 如請求項13所述之用於噴塗製程之自動化處理方法,更包含將冷卻後的該已噴塗基材從該冷卻裝置移動至該載入裝置。 The automated processing method for a spray coating process of claim 13 further comprising moving the cooled sprayed substrate from the cooling device to the loading device.
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